WO2018228403A1 - Device for measuring remaining amount of target material - Google Patents

Device for measuring remaining amount of target material Download PDF

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Publication number
WO2018228403A1
WO2018228403A1 PCT/CN2018/090929 CN2018090929W WO2018228403A1 WO 2018228403 A1 WO2018228403 A1 WO 2018228403A1 CN 2018090929 W CN2018090929 W CN 2018090929W WO 2018228403 A1 WO2018228403 A1 WO 2018228403A1
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WO
WIPO (PCT)
Prior art keywords
track
remaining amount
measuring
thimble
measurement
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PCT/CN2018/090929
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French (fr)
Chinese (zh)
Inventor
边松林
张勋泽
肖亮
宣增志
关召军
丁文兵
张方馨
Original Assignee
京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Publication of WO2018228403A1 publication Critical patent/WO2018228403A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/02Measuring arrangements characterised by the use of mechanical techniques for measuring length, width or thickness
    • G01B5/06Measuring arrangements characterised by the use of mechanical techniques for measuring length, width or thickness for measuring thickness

Definitions

  • the present disclosure relates to the field of vacuum magnetron plating, and in particular to a target remaining measuring device.
  • the technology generally uses a magnetron sputtering device to bombard a target through an argon (Ar) atom to deposit target particles on the surface of the substrate to achieve deposition.
  • the purpose of film formation is a commonly used magnetron sputtering equipment. Since the magnet behind the target generates a magnetic field, the rate of film formation can be improved to some extent.
  • the target is ion etched to form a sputtering channel. Once the channel is broken, the target is scrapped, resulting in low target utilization.
  • an etched curve is formed on the surface of the target due to the bombardment of ions, that is, an etched region having a non-uniform depth is formed on the surface of the target.
  • the target may be broken down and cannot be used. Therefore, determining the residual amount of the residual target etching and adjusting the target use period according to the remaining amount of the residual target etching has a positive significance for improving the use efficiency of the target and improving the yield of the product; the residual amount of the residual target etching is Refers to the thickness of the remaining target where the used target is etched most.
  • the conventional residual target etching amount measuring tool simulates a target etching curve by using a pin 100 having a high friction coefficient; in a specific operation, the pin 100 is perpendicular to the target with a certain force. The surface is pressed against the target. When the pin 100 is removed from the target to be measured, the simulated target etching curve is retained, and then drawn on the coordinate paper along the direction of the pin 100 to draw the pin 100. Etching the curve, and finally using the coordinate paper to read the residual amount of residual target etching, that is, the minimum remaining amount of the target.
  • the measurement is performed by using the above-mentioned residual target etching amount measuring tool, which is cumbersome and time consuming, and the friction coefficient of the pin 100 is reduced after the use of the residual target etching amount measuring tool for a long time, and thus the pin 100 is often provided.
  • the paper cannot guarantee the real-time vertical and the contact between the nib and the pin 100 during the drawing process, causing the pin 100 to move, etc., which may cause a large measurement error.
  • the measurement steps of the above-mentioned residual target etching amount measuring tool are cumbersome, and the measurement result error is large, and thus it is easy to cause the measurement of the remaining amount of the residual target etching to be inaccurate, resulting in too late or too early replacement of the target, too late replacement Targets can cause target breakdown, and too early replacement of target targets can cause target waste.
  • an embodiment of the present disclosure provides a target remaining amount measuring device, including:
  • the main body is provided with a plurality of measuring tracks arranged in sequence along the first direction; each measuring track extends in the second direction, and the second direction is perpendicular to the first direction;
  • each thimble extending in a second direction, and the first end is located in a measurement track corresponding thereto and is limited to a thimble corresponding to the measurement track a first end side; each thimble is free to move along its corresponding measuring track and can partially extend out of the measuring track;
  • each slider is slidably disposed in the measurement track along a measurement track corresponding thereto; static friction between each slider and the measurement track The force is greater than its own gravity;
  • a main ruler is disposed on the main body and is provided with a tick mark arranged in a second direction.
  • the above target remaining amount measuring device may have the following operational steps:
  • the target remaining amount measuring device is vertically placed above the target to be tested, specifically, the thimble can extend out of one end of the measuring track, that is, the second end of the thimble (opposite the first end) is disposed toward the surface of the residual target Since each thimble is free to move along its corresponding measuring track and its first end is limited to the measuring track, at this time, due to gravity, each thimble will partially extend out of the measuring track and will not detach Measuring the track; subsequently, adjusting the slider in each measuring track to contact the first end of the thimble;
  • each thimble can be measured along The track moves relatively upwardly. Further, the first end of each thimble can jack up the slider in the corresponding measuring track; since the moving distance of each thimble along the measuring track upward corresponds to the distribution of the surface height of the target, The first ends of the plurality of thimbles are distributed along the etching curve of the target, that is, the sliders jacked up by the first end of the thimble are also distributed along the etching curve of the target;
  • the device can be removed from the residual target, at which time the thimble will return to the initial position due to gravity, and each slider will remain stationary due to the static friction between the measuring track, ie At this time, the plurality of sliders will still be distributed along the etching curve of the target; at this time, the number of scales corresponding to the slider at the lowermost end can be read by the main ruler mounted on the main body, and The number of ticks is the minimum of the amount of target etching remaining.
  • the steps of measuring the amount of the residual target etching are simple, and there is no problem such as a missing thimble or a large measurement structure error caused by a manual drawing etching curve, and the measurement result is relatively accurate.
  • the target remaining amount measuring device further includes: a pair of scales extending in the first direction and slidably mounted on the main body or the main ruler in the second direction.
  • the target remaining amount measuring device further includes: a homing ruler extending in the first direction and slidably mounted on the main body along the plurality of measuring tracks, the homing ruler Provided on a side of the plurality of sliders facing away from the plurality of ejector pins; when the homing ruler slides along the plurality of measurement trajectories, the sliders in each of the measurement trajectories can be pushed toward the thimble.
  • the main body is provided with a track slit that allows the homing ruler to slide along the plurality of measuring tracks; the homing ruler is slidable along the track slit to push each measuring track The inner slider moves toward the ejector pin.
  • the target remaining amount measuring device further includes: a first adjustment knob for driving the alignment ruler to slide in a second direction; and/or for driving the home ruler edge The plurality of second adjustment knobs that measure the track slide.
  • the target remaining amount measuring device further includes: two limiting posts, the two limiting posts are respectively disposed at two ends of the body in the first direction; each limit The column extends in the second direction and is slidably mounted on the main body in the second direction; two locking mechanisms are in one-to-one correspondence with the two limiting posts, and each locking mechanism is used to limit the corresponding The post is relatively fixed to the body.
  • the main ruler is slidably mounted on the main body in a second direction.
  • the target remaining amount measuring device further includes a grip fixedly mounted to the main body for gripping.
  • each of the measurement rails includes a rail portion and an end portion at one end of the rail portion, the end portion being provided with an opening that allows the thimble portion to protrude from the measurement rail.
  • each thimble includes a stem portion and a head forming a first end of the thimble; a radial dimension of the head portion is greater than a radial dimension of an end opening of the measuring rail, and is smaller than The inner diameter dimension of the rail portion of the measuring track; the radial dimension of the stem portion is smaller than the radial dimension of the end opening of the measuring rail.
  • the ejector pin has a radial dimension of 0.4 mm or less; the end opening of the measuring rail has a radial dimension of 0.5 mm or less.
  • FIG. 1 is a schematic structural view of a target remaining amount measuring device of the related art
  • FIG. 2 is a schematic structural view of a target remaining amount measuring device in a state in which all thimbles and sliders are homing according to an embodiment of the present disclosure
  • FIG. 3 is a schematic structural diagram of a target remaining amount measuring device according to an embodiment of the present disclosure
  • FIG. 4 is a schematic structural diagram of a target remaining amount measuring device in a reading state after measurement according to an embodiment of the present disclosure
  • FIG. 5 is a schematic structural diagram of a target remaining amount measuring device in a process of homing a slider according to an embodiment of the present disclosure
  • FIG. 6 is a schematic diagram of a matching structure between each measuring track and a thimble corresponding thereto and a slider in a target remaining amount measuring device according to an embodiment of the present disclosure
  • FIG. 7 is a schematic diagram of a matching structure between a plurality of measuring tracks and a home leveling device in a target remaining amount measuring device according to an embodiment of the present disclosure.
  • a target remaining amount measuring device includes:
  • the main body 1 is provided with a plurality of measuring tracks 10 arranged in a first direction x; each measuring track 10 extends along a second direction y, the second direction y is perpendicular to the first direction x;
  • each of the thimbles 2 extending in the second direction y, and a first end thereof being located in the corresponding measuring rail 10; and each thimble 2
  • the corresponding measuring track 10 is free to move, and part can extend out of the measuring track 10;
  • the plurality of sliders 3 are in one-to-one correspondence with the plurality of measuring rails 10; each of the sliders 3 is slidably disposed in the measuring rail 10 along the corresponding measuring rail 10 thereof, and is specifically limited to correspond to the measuring rail 10
  • the first end side of the thimble 2, as shown in Figures 2-5, the slider 3 is located above the first end of the thimble 2; the static friction between each slider 3 and its corresponding measuring track 10 is greater than its Self gravity
  • a main rule 4 is disposed on the main body 1 and is provided with a scale line arranged in the second direction y.
  • the end portion of the thimble 2 located in the corresponding measuring rail 10 is referred to as a first end; when the thimble 2 is measured, the measuring rail 10 is extended to contact the target to be tested. One end is called the second end.
  • the above target remaining amount measuring device may have the following operational steps:
  • the target remaining amount measuring device is vertically placed above the target to be tested.
  • the thimble 2 can extend out of one end of the measuring track 10, that is, the second end of the thimble 2 (with One end is opposite to the residual target surface; since each thimble 2 is free to move longitudinally along its corresponding measuring track 10, and its first end is confined within the measuring track 10, and at this time, due to gravity, each The ejector pins 2 will partially extend out of the measuring track 10 and will not detach from the measuring track 10; subsequently, the slider 3 in each measuring track 10 is adjusted to be in contact with the first end of the thimble 2;
  • each thimble 2 protrudes out of the second end of the measuring rail 10 to contact the surface of the residual target, and the target remaining measuring device is pressed downward.
  • the first end of each thimble 2 can lift the slider 3 in its corresponding measuring track 10; since each thimble 2 is along the measuring track 10
  • the upward moving distance corresponds to the distribution of the surface height of the target.
  • first ends of the plurality of thimbles 2 are distributed along the etching curve of the target, that is, the slider 3 which is jacked up by the first end of the thimble 2 is also along
  • the etching curve of the target is distributed, that is, the shape of the line of all the sliders 3 corresponds to the shape of the etching curve of the target;
  • the device can be removed from the residual target, at which time the thimble 2 will be homed due to gravity (ie, partially protruding out of the measuring track 10 and not leaving the measuring track 10). And each slider 3 is kept stationary due to the static friction between it and the measuring rail 10, that is, the shape of the wiring of the plurality of sliders 3 still corresponds to the etching curve of the target. Further, at this time, the number of scales corresponding to the slider 3 located at the lowermost end can be read by the main ruler 4 attached to the main body 1, and the minimum value of the remaining amount of the target etching can be obtained based on the number of scales.
  • the step of measuring the etch amount of the residual target is simple, and there is no problem that the stylus 2 is missing, or the measurement structure error is large due to the artificial drawing etching curve, and the measurement result is relatively accurate.
  • the main body 1 may be a plate-like structure extending along the first direction x and the second direction y;
  • the main rule 4 is also a plate-like structure extending in the first direction x and the second direction y and overlapping the main body 1, that is, the main ruler 4 can be stacked in a direction perpendicular to the outer surface of the plate-like structure. Placed on the front or rear surface of the body 1;
  • the main body 1 and the main ruler 4 may be fixed by a transparent adhesive.
  • the main body 1 is prepared by using a transparent material in order to observe the number of ticks corresponding to the slider 3 and the reading slider 3 in the measuring track 10;
  • the main ruler 4 may also be made of a transparent material so that the number of ticks corresponding to the slider 3 and the reading slider 3 in the measuring track 10 can be observed from either side of the main body 1 or the main ruler 4. .
  • each measuring rail 10 includes a rail portion 11 and an end portion 12 at one end of the rail portion 11, from which the second end of the thimble 2 can be from the end of the rail portion 11. 12 extends out of the track portion 11, i.e., the end portion 12 is provided with an opening 120 that allows the second end of the thimble 2 to extend out of the measuring track 10.
  • the inner diameter a of the rail portion 11 of the measuring rail 10 is 1 mm or less.
  • the diameter b of the opening 120 of the end portion 12 of the measuring rail 10 is less than or equal to 0.5 mm.
  • each thimble 2 includes a stem portion 21 and a head portion 22 at one end of the stem portion 21, the head portion 22 forming a first end of the thimble 2; wherein the head portion
  • the diameter c of 22 is larger than the diameter b of the opening 120 of the end portion 12 of the measuring rail 10 and smaller than the inner diameter a of the rail portion 11 of the measuring rail 10; the diameter d of the rod portion 21 is smaller than the diameter of the opening 120 of the end portion 12 of the measuring rail 10 b, so that the thimble 2 can slide along the rail portion 11 during the measurement but does not slip out of the opening 120 of the end portion 12 of the rail 10.
  • the diameter 21 of the stem portion 21 of the thimble 2 is less than or equal to 0.4 mm; the diameter c of the head portion 22 of the thimble 2 is greater than 0.5 mm and less than 1 mm.
  • each slider 3 and its corresponding measuring rail 10 have an interference fit, and the slider 3 has a high friction coefficient design, that is, a slider.
  • the coefficient of friction between the material of the outer periphery of 3 and the material of the inner wall of the measuring rail 10 is large to ensure that the slider 3 does not automatically fall back as the thimble 2 falls when the thimble 2 falls.
  • the target remaining amount measuring device may further include a pair of scales 5; specifically, the pair of scales 5 are along the first The direction x extends and is slidably mounted on the main rule 4 or the body 1 in the second direction y.
  • the alignment rule 5 can be moved in the second direction y to be aligned with the slider 3, thereby viewing the alignment of the alignment rule 5
  • the scale of the main ruler 4, thereby obtaining the reading of the slider 3, can ensure the accuracy of the reading, thereby further ensuring the accuracy of the measurement result.
  • the target remaining amount measuring device may further include a home ruler 6; specifically, the home ruler 6 Extending in a first direction x and slidably mounted on the body 1 along a plurality of measuring rails 10; the homening ruler 6 is disposed on a side of the plurality of sliders 3 facing away from the plurality of thimbles 2 as it is measured along multiple As the track 10 slides down, the slider 3 within each measuring track 10 can be pushed toward the thimble 2 to home the slider 3 within each measuring track 10.
  • each slider 3 can be homed by adjusting the home ruler 6, that is, each slider 3 is pushed to the end 12 of the measuring track 10, and with the thimble The first end of the contact is in contact for the next use; at this time, the first end of the slider 3 and the thimble 2 in each measuring track 10 are located at the end 12 of the measuring track 10, ie each measuring track 10 Both the slider 3 and the thimble 2 are in the home state.
  • the homing rule 6 can be slidably mounted on the main body 1 along a plurality of measuring rails 10 , and can be realized in the following manner: the main body 1 is provided with a track slit 13 .
  • the track slot 13 extends along the plurality of measuring tracks 10, and connects each of the two adjacent measuring tracks 10, and further, the home ruler 6 can pass through each of the measuring tracks 10 through the track gap 13;
  • the home ruler 6 is slidable along the track gap 13 between the plurality of measuring tracks 10 and pushes the slider 3 in each measuring track 10 toward the thimble 2.
  • the target remaining amount measuring device may further include two limiting columns 7; specifically, the two limiting columns 7 Separately disposed at two ends of the main body 1 in the first direction x, and each of the limiting posts 7 extends along the second direction y; that is, the two limiting posts 7 are respectively located in the first direction of the plurality of measuring rails 10
  • the first and last sides of x are arranged in parallel with the thimble 2.
  • the two limiting posts 7 are used to set a maximum protrusion amount of the plurality of thimbles 2 with respect to the end portions 12 of the plurality of measuring rails 10, the set length and each thimble 2 under the action of gravity
  • the length of the outer extension measuring rail 10 is the same; that is, the one end of the two limiting post 7 with respect to the plurality of measuring rails 10, and the second end of each thimble 2 protrudes out of the measuring rail 10 by gravity.
  • the position of the time is horizontally aligned, in other words, the length of extension of each of the limit posts relative to the end of the measuring track is substantially the same as the length of the thimble that naturally extends out of the measuring track under the force of gravity.
  • the target remaining amount measuring device provided by the embodiment of the present disclosure is pressed against the target to the copper back plate of the target column 7 contacting the target material (the copper back plate is used for carrying the target material, and is located away from the target material)
  • the force can be stopped and the device can be picked up; because at this time, all the thimbles 2 can be ensured to have sufficient contact with the target etching surface, that is, all the thimbles 2 have successfully simulated the target.
  • the distribution of the etching curve of the material therefore, the positioning of the two limiting columns 7 can make the measurement operation process more convenient and the measurement efficiency can be further improved.
  • the set length of the two limiting posts 7 with respect to the end 12 of the plurality of measuring rails 10 needs to be greater than or equal to the initial of the target. Thickness, specifically, target initial thickness data will be reflected in the technical report of each set of targets. Before the machine is installed, the initial thickness of each set of targets should be doubled to ensure that the limit column 7 is relative to The length of the end 12 of the plurality of measuring rails 10 is greater than or equal to the initial thickness of the target.
  • each of the limiting posts 7 is slidably mounted on the main body 1 in the second direction y, that is, each of the limiting posts 7 can be opposite to the main body 1 along the extending direction thereof.
  • the telescopic adjustment is made such that the length of the limiting post 7 is adjustable to be suitable for the target to be tested having different initial thicknesses, and can be retracted when not in use for storage.
  • the target remaining amount measuring device may further include two locking mechanisms corresponding to the two limiting posts 7 in one-to-one relationship, and the limiting post 7 is telescopically adjusted relative to the main body 1 in the extending direction thereof. Thereafter, the limit post 7 and the main body 1 can be locked by a locking mechanism for measurement.
  • the target remaining amount measuring device provided by the embodiment of the present disclosure can be retracted from the end portion of the measuring rail 10 with respect to the end portion 12 of the measuring rail 10 when the target remaining amount measuring device is not in use, and the thimble 2 can also be Retracted into the respective measuring track 10, so that the volume of the entire device is greatly reduced, which is convenient for storage;
  • the device before using the device for measurement, the device can be placed vertically so that all the thimbles 2 naturally extend out of their measurement track 10 under the force of gravity, and the slider 3 is returned to the position by the home ruler 6. Or, the slider 3 and the thimble 2 are homaged directly by the homing ruler 6 (it is to be noted that the state in which the thimble 2 is homing is the same as the state in which the thimble 2 is placed vertically when the device is placed, that is, all are extended).
  • the track 10 is measured and the first end is constrained by the end 12 of the measuring track 10 so as not to detach from the measuring track 10); then, the two limiting posts 7 are adjusted to slide in the second direction y to be relative to the measuring track
  • the one end of the end portion 12 of the 10 is horizontally aligned with the one end (second end) of the ejector pin 2 which protrudes from the measuring rail 10, and then the measuring operation is performed.
  • the target remaining amount measuring apparatus may further include at least one of the following:
  • a first adjusting knob 51 for driving the aligning ruler 5 to slide in the second direction y with respect to the main ruler 4;
  • a second adjustment knob 61 for driving the home ruler 6 to slide along the plurality of measurement rails 10;
  • a third adjusting button (not shown) for driving the two limiting posts 7 to respectively extend and slide in the second direction y with respect to the main body 1.
  • the first adjustment knob 51, the second adjustment knob 61, and the third adjustment knob may be disposed at a side edge of the main ruler 4 in the x direction or at a side edge of the plurality of measurement rails 10 in the x direction.
  • the main ruler 4 is slidably mounted on the main body 1 in the second direction y; Before the measurement is performed by using the target remaining amount measuring device provided by the embodiment of the present disclosure, all the sliders 3 can be returned by using the homing ruler 6, and then the main ruler 4 is moved to make the zero-cut line and all the sliders. 3 aligning, so that all the readings of the slider 3 are zeroed; further, the residual target etching margin information can be directly obtained through the reading on the main ruler 4 after the measurement is taken, that is, the residual target etching residue can be directly read out. Quantity to further increase the measurement speed.
  • the target remaining amount measuring device may further include a handle 8 fixedly mounted on the main body 1 for the user to hold.
  • the handle 8 is mounted to one end of the plurality of measuring rails 10 away from the end 12, and the grip 8 extends in the first direction x.
  • the measurement operating conditions of all the sliders need to be consistent in each measurement, and therefore, the ends of the plurality of measurement tracks need to be aligned in the first direction;
  • the lengths of the multiple thimbles are also exactly the same; and the matching arrangement between each measuring track and its corresponding thimble and slider is also identical.

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Abstract

A device for measuring the remaining amount of a target material, comprising: a main body, which is provided with a plurality of measuring tracks that are arranged along a first direction, wherein each measuring track extends along a second direction, the second direction being perpendicular to the first direction; a plurality of ejector pins, which correspond one-to-one to the plurality of measuring tracks, each ejector pin extending along the second direction, and a first end of each ejector pin being limited within the measuring track corresponding thereto, wherein each ejector pin may move freely along the measuring track and may partly extend out from the measuring track; a plurality of sliding blocks, which correspond one-to-one to the plurality of measuring tracks, wherein each sliding block may be disposed within a measuring track so as to slide along the measuring track corresponding thereto, and each sliding block is limited to a side of a first end of an ejector pin, the static friction between each sliding block and measuring track being greater than the gravity thereof; and a main ruler, which is disposed on the main body and which is provided with scale lines that are arranged along the second direction. The measurement steps for the foregoing device for measuring the remaining amount of a target material are simple, and measurement results are accurate.

Description

靶材余量测量装置Target remaining measuring device
相关申请Related application
本申请要求保护在2017年6月13日提交的申请号为201710442063.6的中国专利申请的优先权,该申请的全部内容以引用的方式结合到本文中。The present application claims the priority of the Chinese Patent Application No. PCT Application No.
技术领域Technical field
本公开涉及真空磁控镀膜技术领域,特别涉及一种靶材余量测量装置。The present disclosure relates to the field of vacuum magnetron plating, and in particular to a target remaining measuring device.
背景技术Background technique
在薄膜晶体管(TFT)及液晶显示器制造领域,经常采用物理气相沉积技术,该技术工艺一般是利用磁控溅射设备通过氩(Ar)原子轰击靶材使靶材粒子沉积在基板表面以达到沉积成膜的目的。立式磁控溅射设备是目前比较常用的一种磁控溅射设备,由于靶材后方的磁铁产生磁场,可以一定程度上提高成膜的速率。靶材经离子刻蚀形成溅射沟道,此沟道一旦击穿,靶材即报废,导致靶材利用率低。也就是说,在磁控溅射成膜过程中,由于离子的轰击靶材表面会形成凹凸不平的刻蚀曲线,即导致靶材表面形成深度不均匀的刻蚀区域。当刻蚀最深处超过靶材厚度时,会导致靶材击穿而无法使用。因此确定残靶刻蚀剩余量、并根据残靶刻蚀剩余量来相应调整靶材使用周期,对于提高靶材的使用效率、提升产品的良率具有积极意义;上述残靶刻蚀剩余量是指使用过的靶材被刻蚀最多处剩余靶材的厚度。In the field of thin film transistor (TFT) and liquid crystal display manufacturing, physical vapor deposition technology is often used. The technology generally uses a magnetron sputtering device to bombard a target through an argon (Ar) atom to deposit target particles on the surface of the substrate to achieve deposition. The purpose of film formation. The vertical magnetron sputtering equipment is a commonly used magnetron sputtering equipment. Since the magnet behind the target generates a magnetic field, the rate of film formation can be improved to some extent. The target is ion etched to form a sputtering channel. Once the channel is broken, the target is scrapped, resulting in low target utilization. That is to say, in the magnetron sputtering film formation process, an etched curve is formed on the surface of the target due to the bombardment of ions, that is, an etched region having a non-uniform depth is formed on the surface of the target. When the deepest part of the etch exceeds the thickness of the target, the target may be broken down and cannot be used. Therefore, determining the residual amount of the residual target etching and adjusting the target use period according to the remaining amount of the residual target etching has a positive significance for improving the use efficiency of the target and improving the yield of the product; the residual amount of the residual target etching is Refers to the thickness of the remaining target where the used target is etched most.
如图1所示,传统的残靶刻蚀量测量工具是利用具有高摩擦系数的排针100模拟靶材刻蚀曲线;具体操作时,需以一定的作用力将排针100垂直于靶材表面压向靶材,当排针100从被测靶材上移开时,会保留模拟的靶材刻蚀曲线,再在坐标纸上沿排针100的走向画出被排针100模拟出的刻蚀曲线,最后利用坐标纸读出残靶刻蚀剩余量,即靶材最小剩余量。利用上述残靶刻蚀量测量工具进行测量,步骤繁琐,耗时长,并且,上述残靶刻蚀量测量工具在长时间使用后,其排针100摩擦系数会降低,进而经常会有排针100掉落,从而导致排针 100数目过少,进而导致模拟的刻蚀曲线不够准确;另外,由于需要在坐标纸上用笔画出模拟刻蚀曲线进行读数,因此,笔尖本身的厚度、笔尖与坐标纸不能保证实时垂直以及画线过程中笔尖与排针100接触导致排针100移动等情况,均会导致较大的测量误差。综上,上述残靶刻蚀量测量工具的测量步骤繁琐,且测量结果误差较大,进而容易造成因残靶刻蚀剩余量测量不准确而导致太晚或太早更换靶材,太晚更换靶材会导致靶材击穿现象,太早更换靶材靶材会造成靶材浪费现象。As shown in FIG. 1 , the conventional residual target etching amount measuring tool simulates a target etching curve by using a pin 100 having a high friction coefficient; in a specific operation, the pin 100 is perpendicular to the target with a certain force. The surface is pressed against the target. When the pin 100 is removed from the target to be measured, the simulated target etching curve is retained, and then drawn on the coordinate paper along the direction of the pin 100 to draw the pin 100. Etching the curve, and finally using the coordinate paper to read the residual amount of residual target etching, that is, the minimum remaining amount of the target. The measurement is performed by using the above-mentioned residual target etching amount measuring tool, which is cumbersome and time consuming, and the friction coefficient of the pin 100 is reduced after the use of the residual target etching amount measuring tool for a long time, and thus the pin 100 is often provided. Dropping, resulting in too few pin headers 100, resulting in an inaccurate simulated etch curve; in addition, due to the need to draw a simulated etch curve on the coordinate paper for reading, the thickness of the nib itself, the nib and coordinates The paper cannot guarantee the real-time vertical and the contact between the nib and the pin 100 during the drawing process, causing the pin 100 to move, etc., which may cause a large measurement error. In summary, the measurement steps of the above-mentioned residual target etching amount measuring tool are cumbersome, and the measurement result error is large, and thus it is easy to cause the measurement of the remaining amount of the residual target etching to be inaccurate, resulting in too late or too early replacement of the target, too late replacement Targets can cause target breakdown, and too early replacement of target targets can cause target waste.
公开内容Public content
有鉴于此,本公开一实施例提出了一种靶材余量测量装置,包括:In view of this, an embodiment of the present disclosure provides a target remaining amount measuring device, including:
主体,设有沿第一方向依次排列的多个测量轨道;每个测量轨道沿第二方向延伸,所述第二方向垂直于所述第一方向;The main body is provided with a plurality of measuring tracks arranged in sequence along the first direction; each measuring track extends in the second direction, and the second direction is perpendicular to the first direction;
多个顶针,与所述多个测量轨道一一对应;每个顶针沿第二方向延伸,且第一端限位于与其对应的测量轨道内、且限位于与所述测量轨道相对应的顶针的第一端一侧;每个顶针可沿与其对应的测量轨道自由移动、且可部分伸出所述测量轨道;a plurality of thimbles corresponding to the plurality of measurement tracks; each thimble extending in a second direction, and the first end is located in a measurement track corresponding thereto and is limited to a thimble corresponding to the measurement track a first end side; each thimble is free to move along its corresponding measuring track and can partially extend out of the measuring track;
多个滑块,与所述多个测量轨道一一对应;每个滑块可沿与其对应的测量轨道滑动地设置于所述测量轨道内;每个滑块与所述测量轨道之间的静摩擦力大于其自身重力;a plurality of sliders corresponding to the plurality of measurement tracks; each slider is slidably disposed in the measurement track along a measurement track corresponding thereto; static friction between each slider and the measurement track The force is greater than its own gravity;
一主尺,设置于所述主体上,且设有沿第二方向排列的刻度线。A main ruler is disposed on the main body and is provided with a tick mark arranged in a second direction.
上述靶材余量测量装置可以具有如下操作步骤:The above target remaining amount measuring device may have the following operational steps:
首先,将该靶材余量测量装置垂直置于待测残靶上方,具体地,将顶针可伸出测量轨道的一端、即顶针的第二端(与第一端相对)朝向残靶表面设置;由于每个顶针可沿与其对应的测量轨道自由移动、且其第一端被限位于测量轨道内,进而此时,由于重力作用,每个顶针将部分伸出测量轨道外、且不会脱离测量轨道;随后,将每个测量轨道中的滑块调至与顶针的第一端接触;First, the target remaining amount measuring device is vertically placed above the target to be tested, specifically, the thimble can extend out of one end of the measuring track, that is, the second end of the thimble (opposite the first end) is disposed toward the surface of the residual target Since each thimble is free to move along its corresponding measuring track and its first end is limited to the measuring track, at this time, due to gravity, each thimble will partially extend out of the measuring track and will not detach Measuring the track; subsequently, adjusting the slider in each measuring track to contact the first end of the thimble;
然后,竖直向下慢慢移动该装置至顶针伸出测量轨道外的第二端与残靶表面接触,并对该靶材余量测量装置向下施加压力,以使每个顶针可以沿测量轨道相对向上移动,进而,每个顶针的第一端可以将与其对应的测量轨道内的滑块顶起;由于每个顶针沿测量轨道向上的 移动距离与靶材表面高度的分布相对应,进而,多个顶针的第一端会沿着靶材的刻蚀曲线分布,即被顶针第一端顶起的滑块也是沿着靶材的刻蚀曲线进行分布;Then, slowly moving the device vertically downward to the second end of the thimble extending out of the measuring track to contact the surface of the residual target, and applying pressure to the target remaining measuring device so that each thimble can be measured along The track moves relatively upwardly. Further, the first end of each thimble can jack up the slider in the corresponding measuring track; since the moving distance of each thimble along the measuring track upward corresponds to the distribution of the surface height of the target, The first ends of the plurality of thimbles are distributed along the etching curve of the target, that is, the sliders jacked up by the first end of the thimble are also distributed along the etching curve of the target;
最后,可以将该装置从残靶上拿开,此时顶针会因重力作用而回到初始位置,而每个滑块则会由于与测量轨道之间的静摩擦力的作用而保持不动,即此时多个滑块将仍然沿着靶材的刻蚀曲线进行分布;进而此时,可以通过安装于主体上的主尺读出位于最下端的滑块所对应的刻度数,并可以根据该刻度数获得靶材刻蚀剩余量的最小值。Finally, the device can be removed from the residual target, at which time the thimble will return to the initial position due to gravity, and each slider will remain stationary due to the static friction between the measuring track, ie At this time, the plurality of sliders will still be distributed along the etching curve of the target; at this time, the number of scales corresponding to the slider at the lowermost end can be read by the main ruler mounted on the main body, and The number of ticks is the minimum of the amount of target etching remaining.
上述残靶刻蚀量测量的步骤很简单,且不存在顶针缺失、或者人工绘画刻蚀曲线而导致的测量结构误差较大等问题,测量结果比较精确。The steps of measuring the amount of the residual target etching are simple, and there is no problem such as a missing thimble or a large measurement structure error caused by a manual drawing etching curve, and the measurement result is relatively accurate.
根据本公开的一个方面,所述靶材余量测量装置还包括:一对位尺,沿第一方向延伸,且可沿第二方向滑动地安装于所述主体或主尺上。According to an aspect of the present disclosure, the target remaining amount measuring device further includes: a pair of scales extending in the first direction and slidably mounted on the main body or the main ruler in the second direction.
根据本公开的一个方面,所述靶材余量测量装置还包括:一归位尺,沿第一方向延伸,且可沿多个测量轨道滑动地安装于所述主体上,所述归位尺设置于所述多个滑块背离所述多个顶针的一侧;当所述归位尺沿多个测量轨道滑动时,可推动每个测量轨道内的滑块朝向顶针移动。According to an aspect of the present disclosure, the target remaining amount measuring device further includes: a homing ruler extending in the first direction and slidably mounted on the main body along the plurality of measuring tracks, the homing ruler Provided on a side of the plurality of sliders facing away from the plurality of ejector pins; when the homing ruler slides along the plurality of measurement trajectories, the sliders in each of the measurement trajectories can be pushed toward the thimble.
根据本公开的一个方面,所述主体上设有允许所述归位尺沿所述多个测量轨道滑动的轨道缝隙;所述归位尺可沿所述轨道缝隙滑动、以推动每个测量轨道内的滑块朝向顶针移动。According to an aspect of the present disclosure, the main body is provided with a track slit that allows the homing ruler to slide along the plurality of measuring tracks; the homing ruler is slidable along the track slit to push each measuring track The inner slider moves toward the ejector pin.
根据本公开的一个方面,所述靶材余量测量装置还包括:用于驱动所述对位尺沿第二方向滑动的第一调节钮;和/或,用于驱动所述归位尺沿所述多个测量轨道滑动的第二调节钮。According to an aspect of the present disclosure, the target remaining amount measuring device further includes: a first adjustment knob for driving the alignment ruler to slide in a second direction; and/or for driving the home ruler edge The plurality of second adjustment knobs that measure the track slide.
根据本公开的一个方面,所述靶材余量测量装置还包括:两个限位柱,所述两个限位柱分别设置于所述主体沿第一方向上的两端;每个限位柱沿第二方向延伸、且可沿第二方向滑动地安装于所述主体上;两个锁定机构,与所述两个限位柱一一对应,每个锁定机构用于将与其对应的限位柱与所述主体之间相对固定。According to an aspect of the present disclosure, the target remaining amount measuring device further includes: two limiting posts, the two limiting posts are respectively disposed at two ends of the body in the first direction; each limit The column extends in the second direction and is slidably mounted on the main body in the second direction; two locking mechanisms are in one-to-one correspondence with the two limiting posts, and each locking mechanism is used to limit the corresponding The post is relatively fixed to the body.
根据本公开的一个方面,所述主尺可沿第二方向滑动地安装于所述主体上。According to an aspect of the present disclosure, the main ruler is slidably mounted on the main body in a second direction.
根据本公开的一个方面,所述靶材余量测量装置还包括固定安装于所述主体上、用于把持的握柄。According to an aspect of the present disclosure, the target remaining amount measuring device further includes a grip fixedly mounted to the main body for gripping.
根据本公开的一个方面,每个测量轨道包括轨道部和位于所述轨道部一端的端部,所述端部设有允许所述顶针部分伸出所述测量轨道的开口。According to an aspect of the present disclosure, each of the measurement rails includes a rail portion and an end portion at one end of the rail portion, the end portion being provided with an opening that allows the thimble portion to protrude from the measurement rail.
根据本公开的一个方面,每个顶针包括杆部和形成所述顶针的第一端的头部;所述头部的径向尺寸大于所述测量轨道的端部开口的径向尺寸、且小于所述测量轨道的轨道部的内径尺寸;所述杆部的径向尺寸小于所述测量轨道的端部开口的径向尺寸。According to an aspect of the present disclosure, each thimble includes a stem portion and a head forming a first end of the thimble; a radial dimension of the head portion is greater than a radial dimension of an end opening of the measuring rail, and is smaller than The inner diameter dimension of the rail portion of the measuring track; the radial dimension of the stem portion is smaller than the radial dimension of the end opening of the measuring rail.
根据本公开的一个方面,所述顶针的杆部径向尺寸小于等于0.4mm;所述测量轨道的端部开口的径向尺寸小于等于0.5mm。According to an aspect of the present disclosure, the ejector pin has a radial dimension of 0.4 mm or less; the end opening of the measuring rail has a radial dimension of 0.5 mm or less.
附图说明DRAWINGS
图1为相关技术的靶材余量测量装置的结构示意图;1 is a schematic structural view of a target remaining amount measuring device of the related art;
图2为本公开实施例提供的一种靶材余量测量装置在所有顶针和滑块都归位的状态下的结构示意图;2 is a schematic structural view of a target remaining amount measuring device in a state in which all thimbles and sliders are homing according to an embodiment of the present disclosure;
图3为本公开实施例提供的一种靶材余量测量装置在测量状态下的结构示意图;FIG. 3 is a schematic structural diagram of a target remaining amount measuring device according to an embodiment of the present disclosure;
图4为本公开实施例提供的一种靶材余量测量装置在测量后读数状态下的结构示意图;4 is a schematic structural diagram of a target remaining amount measuring device in a reading state after measurement according to an embodiment of the present disclosure;
图5为本公开实施例提供的一种靶材余量测量装置在将滑块归位过程中的结构示意图;FIG. 5 is a schematic structural diagram of a target remaining amount measuring device in a process of homing a slider according to an embodiment of the present disclosure;
图6为本公开实施例提供的一种靶材余量测量装置中每个测量轨道和与其对应的顶针以及滑块之间的配合结构示意图;FIG. 6 is a schematic diagram of a matching structure between each measuring track and a thimble corresponding thereto and a slider in a target remaining amount measuring device according to an embodiment of the present disclosure;
图7为本公开实施例提供的一种靶材余量测量装置中多个测量轨道与归位尺之间的配合结构示意图。FIG. 7 is a schematic diagram of a matching structure between a plurality of measuring tracks and a home leveling device in a target remaining amount measuring device according to an embodiment of the present disclosure.
具体实施方式detailed description
下面将结合本公开实施例中的附图,对本公开实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本公开一部分实施例,而不是全部的实施例。基于本公开中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例, 都属于本公开保护的范围。The technical solutions in the embodiments of the present disclosure are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present disclosure. It is obvious that the described embodiments are only a part of the embodiments of the present disclosure, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are the scope of the disclosure.
请参考图2~图7。Please refer to Figures 2-7.
如图2~图5所示,本公开实施例提供的一种靶材余量测量装置,包括:As shown in FIG. 2 to FIG. 5, a target remaining amount measuring device according to an embodiment of the present disclosure includes:
主体1,该主体1内设有沿第一方向x依次排列的多个测量轨道10;每个测量轨道10沿第二方向y延伸,该第二方向y垂直于第一方向x;a main body 1, the main body 1 is provided with a plurality of measuring tracks 10 arranged in a first direction x; each measuring track 10 extends along a second direction y, the second direction y is perpendicular to the first direction x;
多个顶针2,与多个测量轨道10一一对应;每个顶针2沿第二方向y延伸,且其第一端限位于与其对应的测量轨道10内;并且,每个顶针2可沿与其对应的测量轨道10自由移动,而且部分可伸出测量轨道10外;a plurality of thimbles 2, one-to-one corresponding to the plurality of measuring rails 10; each of the thimbles 2 extending in the second direction y, and a first end thereof being located in the corresponding measuring rail 10; and each thimble 2 The corresponding measuring track 10 is free to move, and part can extend out of the measuring track 10;
多个滑块3,与多个测量轨道10一一对应;每个滑块3可沿与其对应的测量轨道10滑动地设置于该测量轨道10内、且具体限位于与该测量轨道10相对应的顶针2的第一端一侧,如图2-5所示,滑块3位于顶针2的第一端的上方;每个滑块3和与其对应的测量轨道10之间的静摩擦力大于其自身重力;The plurality of sliders 3 are in one-to-one correspondence with the plurality of measuring rails 10; each of the sliders 3 is slidably disposed in the measuring rail 10 along the corresponding measuring rail 10 thereof, and is specifically limited to correspond to the measuring rail 10 The first end side of the thimble 2, as shown in Figures 2-5, the slider 3 is located above the first end of the thimble 2; the static friction between each slider 3 and its corresponding measuring track 10 is greater than its Self gravity
一主尺4,设置于主体1上,且设有沿第二方向y排列的刻度线。A main rule 4 is disposed on the main body 1 and is provided with a scale line arranged in the second direction y.
需要说明的是,在本文中,为了叙述方便,将顶针2限位于相应测量轨道10内的端部称为第一端;将顶针2测量时伸出测量轨道10以与待测靶材接触的一端称为第二端。It should be noted that, for convenience of description, the end portion of the thimble 2 located in the corresponding measuring rail 10 is referred to as a first end; when the thimble 2 is measured, the measuring rail 10 is extended to contact the target to be tested. One end is called the second end.
上述靶材余量测量装置可以具有如下操作步骤:The above target remaining amount measuring device may have the following operational steps:
首先,如图2所示,将该靶材余量测量装置垂直置于待测残靶上方,具体地,将顶针2可伸出测量轨道10的一端、即顶针2的第二端(与第一端相对)朝向残靶表面设置;由于每个顶针2可沿与其对应的测量轨道10纵向地自由移动、且其第一端被限位于测量轨道10内,进而此时,由于重力作用,每个顶针2将部分伸出测量轨道10外、且不会脱离测量轨道10;随后,将每个测量轨道10中的滑块3调至与顶针2的第一端接触;First, as shown in FIG. 2, the target remaining amount measuring device is vertically placed above the target to be tested. Specifically, the thimble 2 can extend out of one end of the measuring track 10, that is, the second end of the thimble 2 (with One end is opposite to the residual target surface; since each thimble 2 is free to move longitudinally along its corresponding measuring track 10, and its first end is confined within the measuring track 10, and at this time, due to gravity, each The ejector pins 2 will partially extend out of the measuring track 10 and will not detach from the measuring track 10; subsequently, the slider 3 in each measuring track 10 is adjusted to be in contact with the first end of the thimble 2;
然后,如图3所示,竖直向下慢慢移动该装置直至顶针2伸出测量轨道10外的第二端与残靶表面接触,并对该靶材余量测量装置向下施加压力,以使每个顶针2可以沿测量轨道10相对向上移动,进而,每个顶针2的第一端可以将与其对应的测量轨道10中的滑块3顶起; 由于每个顶针2沿测量轨道10向上的移动距离与靶材表面高度的分布相对应,进而,多个顶针2的第一端会沿着靶材的刻蚀曲线分布,即被顶针2第一端顶起的滑块3也是沿着靶材的刻蚀曲线进行分布,即所有滑块3的连线的形状对应于靶材的刻蚀曲线的形状;Then, as shown in FIG. 3, the device is slowly moved vertically downward until the thimble 2 protrudes out of the second end of the measuring rail 10 to contact the surface of the residual target, and the target remaining measuring device is pressed downward. In order that each thimble 2 can be moved relatively upward along the measuring track 10, the first end of each thimble 2 can lift the slider 3 in its corresponding measuring track 10; since each thimble 2 is along the measuring track 10 The upward moving distance corresponds to the distribution of the surface height of the target. Further, the first ends of the plurality of thimbles 2 are distributed along the etching curve of the target, that is, the slider 3 which is jacked up by the first end of the thimble 2 is also along The etching curve of the target is distributed, that is, the shape of the line of all the sliders 3 corresponds to the shape of the etching curve of the target;
最后,如图4所示,可以将该装置从残靶上拿开,此时顶针2会因重力作用而归位(即部分伸出测量轨道10外、且不会脱离测量轨道10的状态),而每个滑块3则会由于其与测量轨道10之间的静摩擦力的作用而保持不动,即此时多个滑块3的连线的形状仍然对应于靶材的刻蚀曲线的形状;进而此时,可以通过安装于主体1上的主尺4读出位于最下端的滑块3所对应的刻度数,并可以根据该刻度数获得靶材刻蚀剩余量的最小值。Finally, as shown in FIG. 4, the device can be removed from the residual target, at which time the thimble 2 will be homed due to gravity (ie, partially protruding out of the measuring track 10 and not leaving the measuring track 10). And each slider 3 is kept stationary due to the static friction between it and the measuring rail 10, that is, the shape of the wiring of the plurality of sliders 3 still corresponds to the etching curve of the target. Further, at this time, the number of scales corresponding to the slider 3 located at the lowermost end can be read by the main ruler 4 attached to the main body 1, and the minimum value of the remaining amount of the target etching can be obtained based on the number of scales.
上述残靶刻蚀量测量的步骤很简单,且不存在顶针2缺失、或者人工绘画刻蚀曲线而导致的测量结构误差较大等问题,测量结果比较精确。The step of measuring the etch amount of the residual target is simple, and there is no problem that the stylus 2 is missing, or the measurement structure error is large due to the artificial drawing etching curve, and the measurement result is relatively accurate.
如图2~图5所示,一种具体的实施例中,主体1可以为沿第一方向x和第二方向y延展的板状结构;As shown in FIG. 2 to FIG. 5, in a specific embodiment, the main body 1 may be a plate-like structure extending along the first direction x and the second direction y;
进一步地,主尺4也为沿第一方向x和第二方向y延展的板状结构、且与主体1叠置,即主尺4可沿着垂直于该板状结构的外表面的方向叠置于主体1的前表面或后表面上;Further, the main rule 4 is also a plate-like structure extending in the first direction x and the second direction y and overlapping the main body 1, that is, the main ruler 4 can be stacked in a direction perpendicular to the outer surface of the plate-like structure. Placed on the front or rear surface of the body 1;
可选地,主体1与主尺4可以通过透明胶粘合固定。Alternatively, the main body 1 and the main ruler 4 may be fixed by a transparent adhesive.
具体地,主体1采用透明材料制备,以便于观察测量轨道10内的滑块3和读取滑块3所对应的刻度数;Specifically, the main body 1 is prepared by using a transparent material in order to observe the number of ticks corresponding to the slider 3 and the reading slider 3 in the measuring track 10;
可选地,主尺4也可以采用透明材料制备,以便于从主体1或主尺4中的任一侧都可以观察测量轨道10内的滑块3和读取滑块3所对应的刻度数。Alternatively, the main ruler 4 may also be made of a transparent material so that the number of ticks corresponding to the slider 3 and the reading slider 3 in the measuring track 10 can be observed from either side of the main body 1 or the main ruler 4. .
如图6所示,在一种具体的实施例中,每个测量轨道10包括轨道部11和位于轨道部11一端的端部12,顶针2的第二端可以从该轨道部11的端部12伸出轨道部11,即,该端部12设有允许顶针2的第二端伸出该测量轨道10的开口120。As shown in FIG. 6, in a specific embodiment, each measuring rail 10 includes a rail portion 11 and an end portion 12 at one end of the rail portion 11, from which the second end of the thimble 2 can be from the end of the rail portion 11. 12 extends out of the track portion 11, i.e., the end portion 12 is provided with an opening 120 that allows the second end of the thimble 2 to extend out of the measuring track 10.
根据本公开的一个方面,测量轨道10的轨道部11的内径a小于等于1mm。According to an aspect of the present disclosure, the inner diameter a of the rail portion 11 of the measuring rail 10 is 1 mm or less.
根据本公开的一个方面,测量轨道10的端部12的开口120的直 径b小于等于0.5mm。According to an aspect of the present disclosure, the diameter b of the opening 120 of the end portion 12 of the measuring rail 10 is less than or equal to 0.5 mm.
如图6所示,在一种具体的实施例中,每个顶针2包括杆部21和位于杆部21一端的头部22,该头部22形成顶针2的第一端;其中,头部22的直径c大于测量轨道10的端部12的开口120的直径b、且小于测量轨道10的轨道部11的内径a;杆部21的直径d小于测量轨道10的端部12开口120的直径b,以使得在测量时顶针2能够沿轨道部11滑动但不至于从轨道10的端部12的开口120滑出。As shown in Figure 6, in a particular embodiment, each thimble 2 includes a stem portion 21 and a head portion 22 at one end of the stem portion 21, the head portion 22 forming a first end of the thimble 2; wherein the head portion The diameter c of 22 is larger than the diameter b of the opening 120 of the end portion 12 of the measuring rail 10 and smaller than the inner diameter a of the rail portion 11 of the measuring rail 10; the diameter d of the rod portion 21 is smaller than the diameter of the opening 120 of the end portion 12 of the measuring rail 10 b, so that the thimble 2 can slide along the rail portion 11 during the measurement but does not slip out of the opening 120 of the end portion 12 of the rail 10.
根据本公开的一个方面,顶针2的杆部21直径d小于等于0.4mm;顶针2的头部22直径c大于0.5mm且小于1mm。According to an aspect of the present disclosure, the diameter 21 of the stem portion 21 of the thimble 2 is less than or equal to 0.4 mm; the diameter c of the head portion 22 of the thimble 2 is greater than 0.5 mm and less than 1 mm.
如图2~图6所示,在一种具体的实施例中,每个滑块3和与其对应的测量轨道10之间为过盈配合,且滑块3为高摩擦系数设计,即滑块3的外周缘的材料和测量轨道10的内壁材料之间的摩擦系数较大,以保证当顶针2下落时、滑块3不会随着顶针2的下落而自动回落。As shown in FIG. 2 to FIG. 6 , in a specific embodiment, each slider 3 and its corresponding measuring rail 10 have an interference fit, and the slider 3 has a high friction coefficient design, that is, a slider. The coefficient of friction between the material of the outer periphery of 3 and the material of the inner wall of the measuring rail 10 is large to ensure that the slider 3 does not automatically fall back as the thimble 2 falls when the thimble 2 falls.
如图2~图5所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置还可以包括一对位尺5;具体地,该对位尺5沿第一方向x延伸,且可沿第二方向y滑动地安装于主尺4或者主体1上。As shown in FIG. 2 to FIG. 5, in a specific embodiment, the target remaining amount measuring device provided by the embodiment of the present disclosure may further include a pair of scales 5; specifically, the pair of scales 5 are along the first The direction x extends and is slidably mounted on the main rule 4 or the body 1 in the second direction y.
如图4所示,在读取滑块3所对应的刻度数时,可以通过沿第二方向y移动该对位尺5、使其与滑块3对齐,进而查看该对位尺5所对齐的主尺4的刻度、从而获得滑块3的读数,上述方式可以保证读数的精准性,进而进一步保证测量结果的精确性。As shown in FIG. 4, when the number of ticks corresponding to the slider 3 is read, the alignment rule 5 can be moved in the second direction y to be aligned with the slider 3, thereby viewing the alignment of the alignment rule 5 The scale of the main ruler 4, thereby obtaining the reading of the slider 3, can ensure the accuracy of the reading, thereby further ensuring the accuracy of the measurement result.
如图2~图5、图7所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置还可以包括一归位尺6;具体地,该归位尺6沿第一方向x延伸,且可沿多个测量轨道10滑动地安装于主体1上;该归位尺6设置于多个滑块3背离多个顶针2的一侧,当其沿多个测量轨道10向下滑动时,可推动每个测量轨道10内的滑块3朝向顶针2移动,以将每个测量轨道10内的滑块3归位。As shown in FIG. 2 to FIG. 5 and FIG. 7 , in a specific embodiment, the target remaining amount measuring device provided by the embodiment of the present disclosure may further include a home ruler 6; specifically, the home ruler 6 Extending in a first direction x and slidably mounted on the body 1 along a plurality of measuring rails 10; the homening ruler 6 is disposed on a side of the plurality of sliders 3 facing away from the plurality of thimbles 2 as it is measured along multiple As the track 10 slides down, the slider 3 within each measuring track 10 can be pushed toward the thimble 2 to home the slider 3 within each measuring track 10.
如图5所示,具体地,在测量结束后,可以通过调节归位尺6将每个滑块3归位,即将每个滑块3推至测量轨道10的端部12处、并与顶针2的第一端接触,以便于下次使用;此时,每个测量轨道10内的滑块3和顶针2的第一端都位于测量轨道10的端部12处,即每个测量轨道10内的滑块3和顶针2都处于归位状态。As shown in FIG. 5, in particular, after the end of the measurement, each slider 3 can be homed by adjusting the home ruler 6, that is, each slider 3 is pushed to the end 12 of the measuring track 10, and with the thimble The first end of the contact is in contact for the next use; at this time, the first end of the slider 3 and the thimble 2 in each measuring track 10 are located at the end 12 of the measuring track 10, ie each measuring track 10 Both the slider 3 and the thimble 2 are in the home state.
如图7所示,在一种具体的实施例中,归位尺6可沿多个测量轨 道10滑动地安装于主体1上,可以采用下述方式实现:主体1上设有轨道缝隙13,该轨道缝隙13沿多个测量轨道10延伸,且使每相邻的两个测量轨道10之间相连通,进而,归位尺6可通过该轨道缝隙13穿过每个测量轨道10;且,归位尺6可沿多个测量轨道10之间的轨道缝隙13滑动,并推动每个测量轨道10内的滑块3朝向顶针2移动。As shown in FIG. 7 , in a specific embodiment, the homing rule 6 can be slidably mounted on the main body 1 along a plurality of measuring rails 10 , and can be realized in the following manner: the main body 1 is provided with a track slit 13 . The track slot 13 extends along the plurality of measuring tracks 10, and connects each of the two adjacent measuring tracks 10, and further, the home ruler 6 can pass through each of the measuring tracks 10 through the track gap 13; The home ruler 6 is slidable along the track gap 13 between the plurality of measuring tracks 10 and pushes the slider 3 in each measuring track 10 toward the thimble 2.
如图2~图5所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置还可以包括两个限位柱7;具体地,该两个限位柱7分别设置于主体1沿第一方向x上的两端、且每个限位柱7沿第二方向y延伸;即,该两个限位柱7分别位于多个测量轨道10的沿第一方向x的首尾两侧,且与顶针2并行设置。As shown in FIG. 2 to FIG. 5, in a specific embodiment, the target remaining amount measuring device provided by the embodiment of the present disclosure may further include two limiting columns 7; specifically, the two limiting columns 7 Separately disposed at two ends of the main body 1 in the first direction x, and each of the limiting posts 7 extends along the second direction y; that is, the two limiting posts 7 are respectively located in the first direction of the plurality of measuring rails 10 The first and last sides of x are arranged in parallel with the thimble 2.
进一步地,该两个限位柱7用于对多个顶针2相对于多个测量轨道10的端部12的最大伸出量进行设定,该设定长度与每个顶针2在重力作用下自然伸出测量轨道10外的长度相同;即该两个限位柱7相对于多个测量轨道10伸出的一端,与每个顶针2的第二端在重力作用下伸出测量轨道10外时的位置水平对齐,换言之,每个限位柱相对于测量轨道的端部的伸出长度与顶针在重力作用下自然伸出测量轨道外的长度基本相同。进而,测量时,将本公开实施例提供的靶材余量测量装置向靶材按压至限位柱7接触靶材的铜背板(铜背板用于承载靶材,且位于靶材的背离顶针2的一侧)时,即可以停止施力并可以将装置拿起;因为此时,即可以保证所有顶针2都已与靶材刻蚀表面充分接触,即所有顶针2已成功模拟了靶材的刻蚀曲线分布情况;因此,通过上述两个限位柱7的定位,可以使测量操作过程更加便捷,且可以进一步提高测量效率。Further, the two limiting posts 7 are used to set a maximum protrusion amount of the plurality of thimbles 2 with respect to the end portions 12 of the plurality of measuring rails 10, the set length and each thimble 2 under the action of gravity The length of the outer extension measuring rail 10 is the same; that is, the one end of the two limiting post 7 with respect to the plurality of measuring rails 10, and the second end of each thimble 2 protrudes out of the measuring rail 10 by gravity. The position of the time is horizontally aligned, in other words, the length of extension of each of the limit posts relative to the end of the measuring track is substantially the same as the length of the thimble that naturally extends out of the measuring track under the force of gravity. Further, when measuring, the target remaining amount measuring device provided by the embodiment of the present disclosure is pressed against the target to the copper back plate of the target column 7 contacting the target material (the copper back plate is used for carrying the target material, and is located away from the target material) When one side of the ejector pin 2), the force can be stopped and the device can be picked up; because at this time, all the thimbles 2 can be ensured to have sufficient contact with the target etching surface, that is, all the thimbles 2 have successfully simulated the target. The distribution of the etching curve of the material; therefore, the positioning of the two limiting columns 7 can make the measurement operation process more convenient and the measurement efficiency can be further improved.
当然,为了保证限位柱7能够接触到靶材的铜背板,该两个限位柱7相对于多个测量轨道10的端部12伸出的设定长度,需大于等于靶材的初始厚度,具体地,靶材初始厚度数据在每一套靶材的技术报告中会有体现,在上机前,需要对每套靶材的初始厚度进行复量,以确保限位柱7相对于多个测量轨道10的端部12伸出的长度大于等于靶材的初始厚度。Of course, in order to ensure that the limiting post 7 can contact the copper backing plate of the target, the set length of the two limiting posts 7 with respect to the end 12 of the plurality of measuring rails 10 needs to be greater than or equal to the initial of the target. Thickness, specifically, target initial thickness data will be reflected in the technical report of each set of targets. Before the machine is installed, the initial thickness of each set of targets should be doubled to ensure that the limit column 7 is relative to The length of the end 12 of the plurality of measuring rails 10 is greater than or equal to the initial thickness of the target.
如图2~图5所示,可选地,每个限位柱7可沿第二方向y滑动地安装于主体1上,即,每个限位柱7可沿其延伸方向相对于主体1伸缩调节,以使限位柱7的长度可调,以适用于具有不同初始厚度的待 测靶材,同时在不用时可以缩回收起,以便于收纳。As shown in FIG. 2 to FIG. 5, optionally, each of the limiting posts 7 is slidably mounted on the main body 1 in the second direction y, that is, each of the limiting posts 7 can be opposite to the main body 1 along the extending direction thereof. The telescopic adjustment is made such that the length of the limiting post 7 is adjustable to be suitable for the target to be tested having different initial thicknesses, and can be retracted when not in use for storage.
进一步地,本公开实施例提供的靶材余量测量装置还可以包括与两个限位柱7一一对应的两个锁定机构,当限位柱7沿其延伸方向相对于主体1伸缩调节到位后,可通过锁定机构将限位柱7与主体1之间进行锁定,以进行测量。Further, the target remaining amount measuring device provided by the embodiment of the present disclosure may further include two locking mechanisms corresponding to the two limiting posts 7 in one-to-one relationship, and the limiting post 7 is telescopically adjusted relative to the main body 1 in the extending direction thereof. Thereafter, the limit post 7 and the main body 1 can be locked by a locking mechanism for measurement.
根据上述设置,本公开实施例提供的靶材余量测量装置在不用时,其两个限位柱7相对于测量轨道10端部12伸出的部分可以缩回收起,其顶针2也可以都缩回至各自的测量轨道10内,从而整个装置的体积大大缩小,便于存放;According to the above arrangement, the target remaining amount measuring device provided by the embodiment of the present disclosure can be retracted from the end portion of the measuring rail 10 with respect to the end portion 12 of the measuring rail 10 when the target remaining amount measuring device is not in use, and the thimble 2 can also be Retracted into the respective measuring track 10, so that the volume of the entire device is greatly reduced, which is convenient for storage;
如图2所示,在使用该装置进行测量前,可以先将装置垂直放置、以使所有顶针2在重力作用下自然伸出其测量轨道10,并通过归位尺6将滑块3归位;或者,直接通过归位尺6将滑块3和顶针2一起归位(需要说明的是,顶针2归位的状态与顶针2在装置垂直放置时的状态相同,即都是,部分伸出测量轨道10,且第一端被测量轨道10的端部12限位从而不会脱离测量轨道10);然后,调节两个限位柱7沿第二方向y滑动、以使其相对于测量轨道10端部12伸出的一端与顶针2伸出测量轨道10的一端(第二端)水平对齐,进而再进行测量操作。As shown in Fig. 2, before using the device for measurement, the device can be placed vertically so that all the thimbles 2 naturally extend out of their measurement track 10 under the force of gravity, and the slider 3 is returned to the position by the home ruler 6. Or, the slider 3 and the thimble 2 are homaged directly by the homing ruler 6 (it is to be noted that the state in which the thimble 2 is homing is the same as the state in which the thimble 2 is placed vertically when the device is placed, that is, all are extended The track 10 is measured and the first end is constrained by the end 12 of the measuring track 10 so as not to detach from the measuring track 10); then, the two limiting posts 7 are adjusted to slide in the second direction y to be relative to the measuring track The one end of the end portion 12 of the 10 is horizontally aligned with the one end (second end) of the ejector pin 2 which protrudes from the measuring rail 10, and then the measuring operation is performed.
如图2~图5所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置还可以包括以下至少一项:As shown in FIG. 2 to FIG. 5, in a specific embodiment, the target remaining amount measuring apparatus provided by the embodiment of the present disclosure may further include at least one of the following:
用于驱动对位尺5相对于主尺4沿第二方向y滑动的第一调节钮51;a first adjusting knob 51 for driving the aligning ruler 5 to slide in the second direction y with respect to the main ruler 4;
用于驱动归位尺6沿多个测量轨道10滑动的第二调节钮61;和a second adjustment knob 61 for driving the home ruler 6 to slide along the plurality of measurement rails 10; and
用于驱动两个限位柱7分别相对于主体1沿第二方向y伸缩滑动的第三调节钮(图未示)。A third adjusting button (not shown) for driving the two limiting posts 7 to respectively extend and slide in the second direction y with respect to the main body 1.
可选地,上述第一调节钮51、第二调节钮61和第三调节钮可以设置于主尺4的x方向的侧边缘处或多个测量轨道10的x方向的侧边缘处。Alternatively, the first adjustment knob 51, the second adjustment knob 61, and the third adjustment knob may be disposed at a side edge of the main ruler 4 in the x direction or at a side edge of the plurality of measurement rails 10 in the x direction.
如图2~图5所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置中,主尺4可沿第二方向y滑动地安装于主体1上;进而,在采用本公开实施例提供的靶材余量测量装置进行测量前,可以先利用归位尺6将所有滑块3归位,然后移动主尺4、以使其零刻线与所有滑块3对齐,以实现所有滑块3的读数归零;进而,在测量后 读数时即可以通过主尺4上的读数直接获得残靶刻蚀余量信息,即可以直接读出残靶刻蚀余量,以进一步提高测量速度。As shown in FIG. 2 to FIG. 5, in a specific embodiment, in the target remaining amount measuring device provided by the embodiment of the present disclosure, the main ruler 4 is slidably mounted on the main body 1 in the second direction y; Before the measurement is performed by using the target remaining amount measuring device provided by the embodiment of the present disclosure, all the sliders 3 can be returned by using the homing ruler 6, and then the main ruler 4 is moved to make the zero-cut line and all the sliders. 3 aligning, so that all the readings of the slider 3 are zeroed; further, the residual target etching margin information can be directly obtained through the reading on the main ruler 4 after the measurement is taken, that is, the residual target etching residue can be directly read out. Quantity to further increase the measurement speed.
如图2~图5所示,在一种具体的实施例中,本公开实施例提供的靶材余量测量装置还可以包括固定安装于主体1上、便于用户把持的握柄8。可选地,该握柄8安装于多个测量轨道10远离端部12的一端,且该握柄8沿第一方向x延伸。As shown in FIG. 2 to FIG. 5, in a specific embodiment, the target remaining amount measuring device provided by the embodiment of the present disclosure may further include a handle 8 fixedly mounted on the main body 1 for the user to hold. Optionally, the handle 8 is mounted to one end of the plurality of measuring rails 10 away from the end 12, and the grip 8 extends in the first direction x.
需要说明的是,根据残靶余量测量的原理可知,每次测量中,所有滑块的测量操作条件需要保持一致,因此,上述多个测量轨道的端部都需要沿第一方向一致对齐;多个顶针的长度也都完全一致;并且,每个测量轨道和与其对应的顶针、滑块之间的配合设置情况也都完全一致。It should be noted that, according to the principle of residual target remaining measurement, the measurement operating conditions of all the sliders need to be consistent in each measurement, and therefore, the ends of the plurality of measurement tracks need to be aligned in the first direction; The lengths of the multiple thimbles are also exactly the same; and the matching arrangement between each measuring track and its corresponding thimble and slider is also identical.
显然,本领域的技术人员可以对本公开实施例进行各种改动和变型而不脱离本公开的精神和范围。这样,倘若本公开的这些修改和变型属于本公开权利要求及其等同技术的范围之内,则本公开也意图包含这些改动和变型在内。It will be apparent to those skilled in the art that various modifications and changes can be made in the embodiments of the present disclosure without departing from the spirit and scope of the disclosure. Thus, it is intended that the present invention cover the modifications and the modifications

Claims (14)

  1. 一种靶材余量测量装置,包括:A target remaining amount measuring device includes:
    一主体,设有沿第一方向依次排列的多个测量轨道;每个测量轨道沿第二方向延伸,所述第二方向垂直于所述第一方向;a body having a plurality of measurement tracks arranged in sequence along the first direction; each measurement track extending in a second direction, the second direction being perpendicular to the first direction;
    多个顶针,与所述多个测量轨道一一对应;每个顶针沿第二方向延伸,且每个顶针的第一端限位于与其对应的测量轨道内;每个顶针可沿与其对应的测量轨道自由移动、且可部分伸出所述测量轨道;a plurality of thimbles, one-to-one corresponding to the plurality of measurement tracks; each thimble extending in a second direction, and a first end of each thimble is located in a corresponding measurement track; each thimble can be measured along its corresponding The track is free to move and partially protrudes from the measuring track;
    多个滑块,与所述多个测量轨道一一对应;每个滑块可沿与其对应的测量轨道滑动地设置于所述测量轨道内、且限位于与所述测量轨道相对应的顶针的第一端一侧;每个滑块与所述测量轨道之间的静摩擦力大于其自身重力;a plurality of sliders corresponding to the plurality of measurement tracks; each slider is slidably disposed in the measurement track along a measurement track corresponding thereto and is limited to a thimble corresponding to the measurement track a first end side; a static friction between each slider and the measuring track is greater than its own gravity;
    一主尺,设置于所述主体上,且设有沿第二方向排列的刻度线。A main ruler is disposed on the main body and is provided with a tick mark arranged in a second direction.
  2. 根据权利要求1所述的靶材余量测量装置,还包括:The target remaining amount measuring device according to claim 1, further comprising:
    一对位尺,沿第一方向延伸,且可沿第二方向滑动地安装于所述主体或主尺上。A pair of scales extending in the first direction and slidably mounted on the body or the main ruler in the second direction.
  3. 根据权利要求1所述的靶材余量测量装置,还包括:The target remaining amount measuring device according to claim 1, further comprising:
    一归位尺,沿第一方向延伸,且可沿多个测量轨道滑动地安装于所述主体中,所述归位尺设置于所述多个滑块背离所述多个顶针的一侧;当所述归位尺沿多个测量轨道滑动时,可推动每个测量轨道内的滑块朝向顶针移动。a homing ruler extending in the first direction and slidably mounted in the main body along a plurality of measuring tracks, the locating ruler being disposed on a side of the plurality of sliding blocks facing away from the plurality of thimbles; When the home ruler slides along a plurality of measurement tracks, the slider within each measurement track can be pushed toward the thimble.
  4. 根据权利要求3所述的靶材余量测量装置,其中,The target remaining amount measuring device according to claim 3, wherein
    所述主体中设有允许所述归位尺沿所述多个测量轨道滑动的轨道缝隙;The main body is provided with a track gap allowing the homing ruler to slide along the plurality of measuring tracks;
    所述归位尺可沿所述轨道缝隙滑动、以推动每个测量轨道内的滑块朝向顶针移动。The homing ruler is slidable along the track slit to urge the slider within each measurement track to move toward the thimble.
  5. 根据权利要求3所述的靶材余量测量装置,还包括下列中的至少一项:The target remaining amount measuring device according to claim 3, further comprising at least one of the following:
    用于驱动所述对位尺沿第二方向滑动的第一调节钮;和a first adjustment button for driving the alignment ruler to slide in the second direction; and
    用于驱动所述归位尺沿所述多个测量轨道滑动的第二调节钮。a second adjustment knob for driving the home ruler to slide along the plurality of measurement tracks.
  6. 根据权利要求1所述的靶材余量测量装置,还包括:The target remaining amount measuring device according to claim 1, further comprising:
    两个限位柱,所述两个限位柱分别设置于所述主体沿第一方向上 的两端处;每个限位柱沿第二方向延伸、且可沿第二方向滑动地安装于所述主体上。Two limiting pillars respectively disposed at two ends of the main body in the first direction; each of the limiting pillars extending in the second direction and slidably mounted in the second direction On the body.
  7. 根据权利要求6所述的靶材余量测量装置,其中每个限位柱相对于测量轨道的端部的伸出长度与顶针在重力作用下自然伸出测量轨道外的长度基本相同。The target remaining amount measuring device according to claim 6, wherein the extension length of each of the limit posts relative to the end of the measurement track is substantially the same as the length of the ejector pin naturally extending out of the measurement track by gravity.
  8. 根据权利要求6所述的靶材余量测量装置,还包括:The target remaining amount measuring device according to claim 6, further comprising:
    两个锁定机构,与所述两个限位柱一一对应,每个锁定机构用于将与其对应的限位柱与所述主体进行固定。Two locking mechanisms are in one-to-one correspondence with the two limiting posts, and each locking mechanism is configured to fix the corresponding limiting post with the main body.
  9. 根据权利要求1~8任一项所述的靶材余量测量装置,其中,所述主尺可沿第二方向滑动地安装于所述主体上。The target remaining amount measuring device according to any one of claims 1 to 8, wherein the main ruler is slidably attached to the main body in a second direction.
  10. 根据权利要求1~8任一项所述的靶材余量测量装置,还包括固定安装于所述主体上、用于把持的握柄。The target remaining amount measuring device according to any one of claims 1 to 8, further comprising a grip fixedly attached to the main body for gripping.
  11. 根据权利要求1~8任一项所述的靶材余量测量装置,其中,The target remaining amount measuring device according to any one of claims 1 to 8, wherein
    每个测量轨道包括轨道部和位于所述轨道部一端的端部,所述端部设有允许所述顶针部分伸出所述测量轨道的开口。Each measurement track includes a track portion and an end at one end of the track portion, the end portion being provided with an opening that allows the thimble portion to extend out of the measurement track.
  12. 根据权利要求11所述的靶材余量测量装置,其中,The target remaining amount measuring device according to claim 11, wherein
    每个顶针包括杆部和形成所述顶针的第一端的头部;所述头部的径向尺寸大于所述测量轨道的端部开口的径向尺寸、且小于所述测量轨道的轨道部的内径尺寸;所述杆部的径向尺寸小于所述测量轨道的端部开口的径向尺寸。Each thimble includes a stem portion and a head forming a first end of the thimble; a radial dimension of the head portion is greater than a radial dimension of an end opening of the measuring rail and less than a rail portion of the measuring rail The inner diameter dimension; the radial dimension of the stem portion is smaller than the radial dimension of the end opening of the measuring rail.
  13. 根据权利要求12所述的靶材余量测量装置,其中,The target remaining amount measuring device according to claim 12, wherein
    所述顶针的杆部径向尺寸小于等于0.4mm;The rod portion has a radial dimension of 0.4 mm or less;
    所述测量轨道的端部开口的径向尺寸小于等于0.5mm。The radial extent of the end opening of the measuring track is less than or equal to 0.5 mm.
  14. 根据权利要求7所述的靶材余量测量装置,其中,The target remaining amount measuring device according to claim 7, wherein
    每个限位柱相对于所述测量轨道的端部伸出的长度,大于等于待测靶材的初始厚度。The length of each of the limiting posts extending relative to the end of the measuring track is greater than or equal to the initial thickness of the target to be tested.
PCT/CN2018/090929 2017-06-13 2018-06-13 Device for measuring remaining amount of target material WO2018228403A1 (en)

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