WO2018167126A1 - Revêtement antireflet - Google Patents

Revêtement antireflet Download PDF

Info

Publication number
WO2018167126A1
WO2018167126A1 PCT/EP2018/056344 EP2018056344W WO2018167126A1 WO 2018167126 A1 WO2018167126 A1 WO 2018167126A1 EP 2018056344 W EP2018056344 W EP 2018056344W WO 2018167126 A1 WO2018167126 A1 WO 2018167126A1
Authority
WO
WIPO (PCT)
Prior art keywords
angle
incidence
layer
layers
color
Prior art date
Application number
PCT/EP2018/056344
Other languages
German (de)
English (en)
Inventor
Dirk Apitz
Ulf Brauneck
Sébastien BOURQUIN
Original Assignee
Schott Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Ag filed Critical Schott Ag
Priority to CN201880018479.8A priority Critical patent/CN110431122B/zh
Priority to CH01151/19A priority patent/CH714955B8/de
Publication of WO2018167126A1 publication Critical patent/WO2018167126A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant

Definitions

  • Antireflecting layer systems are state of the art today and are used in a variety of ways. Fields of application include image glazing, optical components such as lenses e.g. for cameras. These applications are not exposed to heavy mechanical stress.
  • EP 2 492 251 B1 describes the production of anti-reflective
  • Hard material layer of S13N4 is introduced with an admixture of aluminum. Since watches and in particular so-called loupes for the date display, which are glued to the glass, are often mechanically stressed by scratching, the use of conventional anti-reflective layer systems is not useful, since they can be completely removed due to mechanical stress and the reflection of the substrate material is formed.
  • the hard AR system based on the development according to EP 2 492 251 B1 provides an antireflection system which is mechanically much more durable than conventional optical coatings.
  • Abrasion resistance of the layer system and thus cause only a small change in the layer thicknesses.
  • Described glass-ceramic substrates which are coated with carbon-doped silicon nitride.
  • WO 2009/010180 A1 and DE 10 2008 054 139 A1 describe aluminum-doped SiN or SiON layers having scratch-resistant action as individual layers.
  • DE 10 2016 125 689 A1 and DE 10 2014 104 798 A1 describe AR systems with a modified composition of the high-index layer, wherein the layers according to DE 10 2016 125 689 A1 are amorphous, while the layers according to FIG
  • scratch-resistant antireflective coatings are deposited by sputtering.
  • the antireflection coatings described in the prior art are designed for flat documents. If the surface is not flat, the angle of the surface normal to the sputtering source changes locally. This leads to a directional
  • Thickness variation of the individual layers This changes the optical properties.
  • the aim of the invention is therefore to provide an antireflection system which can be deposited on non-planar substrates and still has good optical properties.
  • the layer system is as insensitive as possible to a partial abrasion of the uppermost layer.
  • the abrasion can be done with an abrasion test, z. B. the modified Bayer test, based on ASTM F735-11, but preferably with 2 kg of corundum sand and 8000 cycles are tested.
  • This modified Bayer test is also described in the abovementioned publications DE 10 2016 125 689 A1 and DE 10 2014 104 798 A1, the disclosure of which is also made the subject of the present application in this regard. By such a test of the top (last) layer of
  • Antireflective coating typically removes more than ten nanometers of material. This amount of material also corresponds to more than ten percent of the typical layer thicknesses
  • Coatings causes such material removal at the topmost layer.
  • the average layer thickness can be reduced by the Bayer test from 100 nm to 80 nm. Many scratches occur, but if the reflectance spectrum is measured over a large area (eg on an area of 5x5 mm 2 ), the abraded coating can be given a macroscopic resulting reflectivity or a macroscopic resultant
  • the invention is based on the idea to compare or select layer sequences with each other in the design of the layer system that the smallest possible change in optical parameters in terms of color of the residual reflection, their angular dependence and especially the intensity of the residual reflection, if the layer thicknesses the positions are changed by the same percentage.
  • the invention provides a transparent element comprising
  • a multilayer antireflective coating comprising at least six layers, wherein high refractive index layers alternate with lower refractive index layers, and wherein
  • the higher refractive index layers have greater hardness than the lower refractive index layers, and wherein the uppermost layer of the multilayer antireflective coating is a lower refractive index layer, and wherein
  • the substrate has at least two surface areas which differ in their inclination, wherein
  • the antireflection coating covers the surface areas of different inclination, and wherein for the antireflection coating on the surface areas at least one of the following features applies:
  • the difference is to be understood in terms of amount.
  • the terms "higher refractive index” and “lower refractive index” are to be understood as a comparison relative to each other.
  • a layer with a higher refractive index is understood to be a layer whose refractive index is higher than a layer having a lower refractive index, without the quantification of the absolute values of the refractive indices.
  • the integrated reflectivity is referred to, after this with the sensitivity curve of the human eye with sufficient brightness (daytime vision) was weighted.
  • the standard light source D65 was used as the light source according to ISO standard 3664, a radiation distribution with a color temperature of 6504 Kelvin.
  • the layer thickness of the antireflection coating depends on the inclination of the various
  • the color of the residual reflection under an angle of incidence arccos (k) differs from the color below 0 °
  • the substrate has a flat central area and a chamfer, or more generally an edge area, wherein the antireflection coating covers both the center area and the chamfer or edge area, wherein the layer thicknesses of the layers of the antireflection coating on the Be reduced chamfer or the edge region with respect to the layer thicknesses in the center region.
  • this reduction can be uniform in that all layers are reduced in thickness by the same percentage.
  • the invention can be between the surface normal of Bevel or edge region and the surface normal of the center region an angle of at least 20 ° are included.
  • it is also intended for chamfers with an angle of 30 ° to 80 ° including cases of chamfered at 45 ° and 60 ° chamfers.
  • the antireflection coating is also optimized for this angle with respect to the color of the residual reflection and / or the photopic reflectivity. If, for example, a chamfer with a specific angle (for example 45 °) to a flat central surface is provided, the layer system can be optimized such that the difference of the color values ⁇ , ⁇ is minimal or at least equal for an equally large angle of incidence of light (ie also 45 °) is less than 0.05, preferably less than 0.03.
  • the middle area can z. B. color neutral. If a design were to be limited to the middle area only and leave the effect on the chamfer to chance, the chamfer could, for example, be coated after coating. B. have an orange residual reflection color. Now, in another embodiment, the design color of center region and edge region (eg, the chamfer) may differ and the center region z. B. color neutral and the chamfer be performed bluish.
  • the layers of the antireflective coating are given.
  • the antireflective coating may also be designed so that the color of the residual reflection at 0 ° incidence angle is evenly reduced by at least 10%
  • the design z. B. be limited to the two coating angles 0 ° and 45 °, while the viewing angle over the entire range of 0 ° to 45 ° should be included in the design.
  • the layer system according to the invention can be further optimized in such a way that not only is the insensitivity of the optical properties to one
  • a transparent element comprising a transparent substrate and on this substrate a multilayer antireflection coating according to the invention, wherein the layers are selected with respect to their refractive indices in terms of thickness, that with a reduction of the layer thickness of the uppermost layer by 10% or 10 nm, depending on which of these cases gives the lower remaining layer thickness, so that the layer thickness after the
  • Reduction in the first case is still 0.9 times the original layer thickness, and at the same layer thickness of the remaining layers at least one of the following features applies:
  • the layer system is further designed so that in the
  • Refractive indices selected in terms of their thickness so that the color of the residual reflection at 45 ° angle of incidence at 10% reduced layer thicknesses of all layers of the color below
  • the layer system can also be further tuned to the effect that at least in one area of the surface the transparent element has at least one of the following features, preferably also several, in particular also all features:
  • the photopic reflectivity at 0 ° angle of incidence is less than 1, 5%, preferably less than 1%, in particular less than 0.8%
  • the maximum of the reflectivity in the wavelength range between 450 nm and 700 nm under 0 C angle of incidence is less than 1.5%
  • the absolute value of the difference of the photopic reflectivity at 30 ° incidence angle to the photopic reflectivity at 0 ° incidence angle is less than 0.5%, preferably less than 0.3%, more preferably less than 0.1%,
  • the absolute value of the difference of the photopic reflectivity at an angle of incidence of 45 ° to the photopic reflectivity at an angle of incidence of 0 ° is less than 0.5%, preferably less than 0.3%, particularly preferably less than 0.1%,
  • the average reflectivity, averaged in the wavelength range between 450 nm and 700 nm at 0 ° angle of incidence, is less than 1.5%, preferably less than 1.0%
  • the absolute value of the difference of the average reflectivities below 30 ° incidence angle and below 0 ° incidence angle, averaged in the wavelength range between 450 nm and 700 nm, is less than 0.5%, preferably less than 0.3%, more preferably less than 0.1 %
  • the absolute value of the difference between the average reflectivities at 45 ° incidence and at 0 ° incidence, averaged over the wavelength range between 450 nm and 700 nm, is less than 0,5%
  • the absolute value of the difference between the maxima of the reflectivities in the wavelength range between 450 nm and 700 nm at 30 ° incidence angle and at 0 ° incidence angle is less than 0.5%, preferably less than 0.3%, more preferably less than 0.1%,
  • the absolute amount of the difference of the maxima of the reflectivities in the wavelength range between 450 nm and 700 nm at 45 ° incidence angle and at 0 ° incidence angle is less than 0.5%, preferably less than 0.3%, more preferably less than 0.1%.
  • the average reflectivity is the average value of the reflectivity in the wavelength range from 450 to 700 nm.
  • the coating can even fulfill at least one of the following features:
  • the photopic reflectivity at 0 ° angle of incidence is less than 1%, preferably less than 0.8%,
  • the absolute value of the difference of the photopic reflectivity at 30 ° incidence angle to the photopic reflectivity at 0 ° incidence angle is less than 0.1%
  • Wavelength range between 450 nm and 700 nm at 30 ° incidence angle
  • the absolute value of the difference of the photopic reflectivity at an angle of incidence of 45 ° to the photopic reflectivity below 0 ° incidence angle is less than 0.2%
  • Wavelength range between 450 nm and 700 nm at 45 ° incidence angle
  • the average reflectivity, averaged in the wavelength range between 450 nm and 700 nm at 0 ° angle of incidence is less than 1, 0%.
  • the layer system is designed so that visually differ as little as possible under a given angle to the transparent element, the surfaces with the different inclinations. Accordingly, at least one further area of the surface should be present, which is arranged at an angle to the previously described area with the properties described above (eg a chamfer or curvature) and on which all layers with a different thickness are deposited during the coating process and at least one of the following features, preferably also several, in particular all features:
  • angle of incidence is in the case of the inclination angle of the two
  • z. B reflectivity spectrum, photopic (integrated) reflectivity, residual reflection color, etc.
  • targets can be defined for different angles and weighted in their importance or prioritization.
  • Such targets can with values z. For example, as links such as “less than” or “as close as possible”. Colors are defined as "as close as possible to" the desired color location, reflectivities as "less than” a desired limit.
  • deviations can then be penalized and with these penalizations the layer thicknesses of the design can be optimized in such a way that the least possible penalization is achieved. With weights, deviations of different parameters can enter into the penalization with different degrees of intensity. So z. B. the
  • the weights are adjusted in the process so that desired results of the coating characteristics are achieved.
  • At least two, preferably a plurality of designs are defined, wherein the layer thicknesses and layer materials are selected such that they correspond to one another
  • Inclination angle correspond.
  • z. B a main area of a surface and arranged at angles other areas simultaneously coated normal to the main surface, wherein on the other areas, the layer thicknesses and, where appropriate, the refractive indices of the different layers are changed in comparison to the parameters for the main area, then the other layer designs should reflect just these changed coating conditions.
  • Materials where d1, d2, ... are the layer thicknesses on a first surface area and the L and H are the two materials (with low and high refractive indices L1 and H1) could be a coating design for a first area of a surface (B1)
  • [L1] denotes a layer with a low refractive index
  • [H1] a layer with a high refractive index
  • d1 - d7 the respective layer thicknesses of these layers.
  • a design B2 with a different thickness and modified refractive indices of the layers can now be z. B. describe as follows
  • the factor 0.71 approximates the cosine of 45 ° and it is assumed that the design refers to a surface area that is at 45 ° to the coating direction. The exact factor can be determined in preliminary tests since different coating processes and deposition systems can result in individual layer reductions.
  • this factor can be increased to 1.
  • the factors determined may also differ for a range of layer material to layer material.
  • the different refractive indices of one layer material in each case relate to identical coating materials which, however, when deposited at different angles, also develop different refractive indices.
  • At least three, more preferably still more designs are defined, with at least two designs differing in all layer thicknesses (for
  • the method now comprises defining the targets for each of these designs and adapting all the designs simultaneously (by changing the layer thicknesses d1, d2,...), The designs still differing only by the same layer thickness differences.
  • the targets for the different coating designs may differ and be weighted differently. So z. For example, the residual reflection color or the reflectivity for the design, where the last layer is reduced in thickness by 40 nm, will be weighted less important than for the design in which the last layer is not reduced in thickness.
  • Residual reflection paint with reduction of the thickness of the last layer keep more constant and another solution the more photopic reflectivity.
  • antireflection coatings which at least six layers (50, 51, 52, 53, 54, 55, 56), wherein high refractive index layers (51, 53, 55 ) alternate with lower refractive index layers (50, 52, 54, 56), the higher refractive index layers (51, 53, 55) having greater hardness than the lower refractive index layers (50, 52, 54, 56), and wherein the uppermost layer (56, 60) of the multilayer antireflective coating (5) is a lower refractive index layer, taking into account the refractive index of the substrate (3) of at least one of the parameters
  • the two antireflection coatings differ with respect to the layer thicknesses of all layers, such that the layer thicknesses of all layers in an antireflection coating by a common factor, which has a value of at most 0.9,
  • the color of the residual reflection under a light incidence angle arccos (k) differs from the color below 0 °
  • the color of the residual reflection under an angle of incidence arccos (k) differs from the color below 0 °
  • the color of the residual reflection and the photopic reflectivity for vertical incidence of light i. determined at 0 ° light incidence angle.
  • a larger number of designs can also be brought into the simultaneous fitting process, e.g. for example, four designs where the second in the last layer thickness is reduced by 10% as just described, a third, with 20%
  • Layer thickness reduction and a fourth with 30% layer thickness reduction are very good adaptation of the layer design.
  • a particularly good adaptation of the layer design can also be obtained on continuously curved surfaces. If one of the conditions is not met, according to the invention, at any rate, searches continue among the solutions found. Furthermore, it is typically necessary to optimize the weights and values of the targets so that customizing the designs generates solutions that meet or best meet the desired conditions.
  • this search can also be continued if a suitable pair of antireflection coatings (5, 6) has already been found, either in order to fulfill further conditions already mentioned above, or also to find the best possible layer system .
  • a plurality of pairs can be checked for the above-mentioned conditions (namely, the difference of the color of the residual reflection at 0 ° angle of incidence and / or the difference of the photopic reflectivity at 0 ° angle of incidence) and among the examined pairs the layer system for the Deposition are selected in which the smallest difference of the color of the residual reflection below 0 °
  • Light incident angle and / or the smallest difference of the photopic reflectivity is below 0 ° light incidence angle and then this layer system is deposited.
  • Coatings (5, 6) can be made as to whether there are other conditions, namely in particular the features already listed above. Thus, it is provided in a development of the invention that the antireflection coating (5) is selected so that
  • the invention is suitable for inorganic substrates.
  • a preferred substrate is sapphire.
  • This substrate is particularly high quality, hard and transparent, so that here the advantages of the invention, namely to provide a high-quality, hard and abrasion-resistant insensitive anti-reflective coating system come especially to advantage.
  • other (single) crystals such as CaF2, or
  • Glass ceramics or glasses such as soda-lime glass, borosilicate glass,
  • Aluminosilicate glass, lithium aluminosilicate glass or optical glasses are used, for example glasses with the trade names NBK7, D263 or B270 (sold by SCHOTT AG).
  • Particularly suitable for the layers with a high refractive index are silicon nitride (S13N4), aluminum nitride (AIN), aluminum oxide (Al2O3), as well as oxynitrides (Al w Si x NyOz) and mixtures of the materials mentioned. These materials not only have a high refractive index, but also a high hardness.
  • the nitrides in particular aluminum nitride and silicon nitride may be mentioned as suitable layer materials. The materials may be doped, or may not be in pure form.
  • aluminum nitride with a silicon content eg between 0.05 and 0.25
  • silicon with a proportion of aluminum egain between 0.05 and 0.25, for example
  • the lower refractive index layers have, in particular, a refractive index in the range from 1.3 to 1.6, preferably 1.45 to 1.5, at a wavelength of 550 nm
  • the layers with higher refractive index have a refractive index at a wavelength of 550 nm Range of 1.8 to 2.3, preferably 1.95 to 2.1.
  • the invention is particularly suitable for small substrates.
  • the substrate has
  • an edge length or a diameter of less than 200 mm Preferably, an edge length or a diameter of less than 150 mm, in particular of less than 100 mm, especially less than 50 mm.
  • Such a surface can be uniformly coated with a PVD process.
  • the substrate is coated over its entire surface on at least one side, so that no masks are used.
  • the antireflective coating is preferably seamless as a result of the simultaneous coating of the areas, as shown in FIG. All layers of the antireflection coating are preferably coated in one operation, without the substrate having to be taken out of the coating chamber in the meantime. In particular, it is also intended to coat several substrates simultaneously.
  • Fig. 1 shows a transparent element with a six-layer antireflection coating.
  • Fig. 2 shows a transparent element with an antireflection coating with a seven-layer antireflection coating.
  • Fig. 3 shows a transparent element with an antireflection coating on a non-planar surface.
  • Fig. 4 schematically shows various shapes of substrates.
  • Fig. 6 shows color loci of the color of the residual reflectivity for different incident light angles on a land and a major surface of an antireflection coating according to the invention.
  • Fig. 7 shows three diagrams (a), (b), (c), which for a plurality of antireflection coatings, the ratio of the layer thicknesses of the uppermost to the third uppermost layer is shown.
  • Layer thicknesses of the two uppermost is applied to the product of the layer thicknesses of the underlying pair of layers for two different substrates.
  • FIG. 9 shows two diagrams in which the ratio of the layer thickness of the thickest low-index layer to the layer thickness of the lowest high-index layer are shown for a multiplicity of exemplary embodiments.
  • the ratio of the difference between the layer thickness of the thickest and the thinnest layer to the sum of the layer thicknesses of these layers is shown for a large number of antireflection coatings on a sapphire substrate with a chamfer angle of 30 °.
  • Fig. 11 shows two graphs with values of the ratio of the standard deviation of the layer thicknesses to the layer thickness of the thickest layer.
  • Fig. 1 shows two partial images (a) and (b).
  • the partial image (a) shows an example of a transparent element 1 according to the invention.
  • the transparent element 1 comprises a transparent, in particular inorganic, substrate 3, for example made of glass.
  • a multilayer antireflection coating 5 is deposited on the substrate 3.
  • This has at least six layers 51, 52, 53, 54, 55, 56.
  • the layers 51, 53, 55 are high-refractive and the layers 52, 54, 56 have a low refractive index, so that the layers 51, 53, 55 have a higher refractive index than the layers 52, 54, 55.
  • the layer materials are characterized by different hatchings.
  • layers with a higher refractive index 51, 53, 55 alternate with layers 52, 54, 56 with a lower refractive index.
  • a high hardness and resistance of the antireflection coating 5 is in particular caused by the layers 51, 53, 55 with higher refractive index, which has a greater hardness than that
  • the layer 56 forms the uppermost layer 60 of the antireflection coating and is a low refractive index layer.
  • the transparent element 1 shown in partial image (b) now differs from the element 1 according to partial image (a) only in that in the antireflection coating 6 the layer thicknesses of all the layers 51-56 are each by a factor, accordingly by the same percentage are reduced. It results in a reduction Ad of
  • the ratio of the reduction Ad to the total layer thickness D also applies to the layer thicknesses of the individual layers.
  • Each of the layers 51-56 is thus reduced in its thickness by a factor Ad / D.
  • Ad / D the antireflection coating 5 according to the invention according to partial image (a) is partially deposited on a surface area inclined to the coating source.
  • the layer thicknesses of the layers 51-54 can now be selected according to the invention so that given a refractive index of the layer materials and the substrate with a decrease in the layer thickness according to the change between the two partial images (a), (b) the color of the residual reflection and / or Reflectivity of the surface remains virtually unchanged.
  • Another, alternative or in particular additional criterion is the photopic reflectivity under different light incidence angles. In this case, the photopic reflectivity at 0 ° incidence angle with reduced layer thicknesses according to partial image (b) of the photopic reflectivity at 0 ° angle of incidence at undiminished
  • Layer thickness D at least 0.1 * d, ie at least 10%.
  • the photopic reflectivity of the antireflection coating 5 (weighted with the sensitivity curve of the human eye) at 0 ° angle of incidence is less than 1.5% (eg also less than 2%, preferably less than 1.5%, especially preferably less than 1.0%, very particularly preferably less than 0.8%).
  • the photopic reflectivity of the antireflective coating 5 at 30 ° angle of incidence differs from the value below 0 ° angle of incidence by less than 0.2%, more preferably by less than 0.1%.
  • the photopic reflectivity of the antireflection coating 5 at 45 ° angle of incidence differs from the value below 0 ° angle of incidence by less than 0.2%, more preferably by less than 0.1%.
  • Wavelength range between z. B. 450 nm and 700 nm) at 0 ° angle of incidence is less than 1, 5%, preferably less than 1, 25%, more preferably less than 1, 0%.
  • Angle of incidence differs from the value below 0 ° angle of incidence by less than 0.5%, preferably by less than 0.2%, more preferably by less than 0.1%.
  • the average reflectivity of the antireflection coating 5 at 45 ° angle of incidence differs from the value below 0 ° angle of incidence by less than 0.5%, preferably by less than 0.2%, more preferably by less than 0.1 %.
  • the absolute reflectivity (maximum in the wavelength range between, for example, 450 nm and 700 nm) is less than 2%, preferably less than 1.5%, particularly preferably less than 1.0%, at an angle of incidence of 0 °.
  • the absolute reflectivity at 30 ° angle of incidence differs from the value below 0 ° angle of incidence by less than 0.5%, preferably by less than 0.2%, more preferably by less than 0.1%.
  • the absolute reflectivity at 45 ° angle of incidence differs from the value below 0 ° angle of incidence by less than 0.5, preferably by less than 0.2%, more preferably by less than 0.1%.
  • the layer thickness of the antireflection coating 5 according to the invention 5 is reduced by 10%, preferably by 20%, more preferably by 30%, most preferably by 40%, or even by 50%, so that an antireflection coating 6 is obtained, as example Sectionsent (b) of FIG. 1, the following features can be present individually or in combination: m) The color of the residual reflection of the antireflection coating 6 with uniformly reduced layer thicknesses of all layers at 0 ° angle of incidence differs from the color of the antireflection coating 5 undiminished layer thicknesses of all layers below 0 °
  • the antireflection coating 5 consists of a total of six layers, with the lowermost layer 51 being a high-index layer.
  • Such Layer system is favorable if the refractive index of the substrate is significantly lower than the refractive index of the higher refractive layers.
  • refractive index greater than 1.65 it is advantageous to provide a lower refractive layer 50 in contact with the substrate.
  • Fig. 2 Such an example is shown in Fig. 2, also with a partial image (a) with undiminished layer thicknesses of all layers and a partial image (b) with a similar anti-reflection coating 6, but in which all layers by the same percentage, or by the same factor are reduced in thickness.
  • FIG. 2 is based on the fact that a substrate 3 is coated with an antireflection coating 5 according to the invention, wherein the substrate 3 has a refractive index above 1.65, wherein the bottom layer 50 is a layer with a lower refractive index ,
  • the substrate 3 of this embodiment is a sapphire.
  • the transparent element may then be, for example, a watch glass or a magnifier for a watch glass, as used to increase the date display.
  • other (single) crystals such as, for example, CaF 2 or glass ceramics, for example soda-lime glass, borosilicate glass, aluminosilicate glass, lithium aluminosilicate glass, optical glasses, for example glasses with the trade names NBK 7, can be used as the substrate material. D263 or B270.
  • Fig. 3 shows an important application for the invention.
  • the layer system is particularly suitable for non-planar surfaces of substrates by the inventive design of the layer thicknesses.
  • the substrate 3 may in particular have an edge region whose inclination differs from a flat central region.
  • a typical case of such a surface area 32 is a chamfer 31.
  • Embodiment of the invention is generally provided, without limitation to the illustrated example, that the antireflective coating 5 both the center region as the first
  • the total layer thickness d 'of the antireflection coating 5 in the edge region is smaller than the layer thickness d in the flat central region.
  • Border area and the surface normal of the center area an angle of at least 20 ° is included.
  • Beam direction oriented surface come.
  • the modified density then typically involves a somewhat different refractive index despite a similar or constant composition of the layer material. This effect can already be taken into account in the design of the layer system.
  • Example 4 shows three examples of further substrates 3 with surface regions 30, 32 of different inclination.
  • the various surface areas are generally subdivided into main and secondary areas, the scale being the proportion of the total area.
  • the area ratio of the minor surface is less than 50%, preferably less than 30%, in particular less than 10%, or even less than 5%.
  • the inclination of the major surfaces in Examples (a), (b), (c) is parallel to the opposite side surface of the generally disk-shaped substrate 3.
  • a surface region 32 may also be domed, in particular dome-shaped. This changes the inclination in this
  • Surface area 32 continuous. Also a total arched, for example as a lens However, formed substrate may be provided. Edge regions as surface regions 32 with an inclination differing from the main surface can be formed as a chamfer or flat surface, or even curved, as likewise illustrated in example (a).
  • the surface area 30 is subdivided into a plurality of terraced areas.
  • the transitions between the height levels form surface regions 32 with a different inclination, which in turn may be constant or varies continuously in the form of a curvature.
  • the main surface has one or more depressions, the transition also being formed here by differently inclined edge regions 32.
  • An edge area can also be curved convexly as shown.
  • Main surface is a good anti-reflection especially important.
  • the average reflectivity in the visible spectral range in particular also the photopic reflectivity, should preferably be less than 5%, more preferably less than 3%, most preferably less than 1.5%.
  • Main surface also defines the color of the residual reflection perceptible to the viewer.
  • the antireflection coating may generally be designed such that the average or average reflectivity on the minor surface is higher by a factor of 2 to 5 than on the major surface, but the photopic reflectivity is still lower than that of the uncoated substrate.
  • the average reflectivity at 0 ° incidence of light ie vertical incidence of light 7.5% to 8%, at 45 ° light incidence 30% to 50%.
  • the layer system is more specific
  • the layer system is designed so that differently inclined surface areas in each case have, for example, vertical light incidence as the same colors of the residual reflection and / or reflectivity as low as possible.
  • the case occurs that the light incident angle of the light varies depending on the inclination of the surface area. Therefore, according to the invention, it is also provided that the antireflection coating 5 has at least one of the following features:
  • Embodiments are also combined with each other.
  • an antireflection coating can be applied to both sides of a disc-shaped substrate.
  • the antireflection coatings can then also have different colors of the residual reflection.
  • the invention is furthermore not limited to six- or seven-ply coatings, as shown by way of example in FIGS. 1 and 2. It can also be provided more layers, such. 9 layers in example 2 described below.
  • the antireflective coating 5 has at most twenty, particularly preferably at most fifteen, layers in order to limit the production costs and to obtain the abrasion resistance.
  • Example 1 is a theoretical or calculated example of an antireflection coating (7 layers) on sapphire:
  • the fitting process leads to the following theoretical solution for a system which is to be color neutral and antireflective on the main surface 1, which remains color neutral and slightly reflective under viewing angle, and retains this property if the top layer is damaged by abrasion.
  • a second surface which has an angle of 45 ° to the first surface and if this second Area viewed from one direction, which is normal to the first surface +/- 10 °, then this second surface appears color-neutral and less reflective than uncoated.
  • Color locus deviation y from the target is below 20 ° 0.000
  • photopic reflectivity is below 0 ° 0.82%
  • Color locus CIE y is considered below 0 ° 0.293
  • the surface 2 thus corresponds to a chamfer inclined at 45 ° with respect to a flat central region.
  • the embodiment shows that with the layer system with the above-mentioned thicknesses of the layers 1 to 7 (corresponding to the layers 50-56 in FIG. 2) also has good antireflection properties on the bevel and the color locations differ only slightly.
  • Example 2 is an antireflective (AR) design on sapphire (9 layers).
  • the substrate has a chamfer of 60 °, which, viewed normal to the main surface +/- 10 ° (ie even below 60 ° +/- 10 °) is also color neutral and less reflective.
  • the abrasion test used was the modified Bayer test described at the beginning, in which 2 kg of corundum sand (Al 2 O 3) was rubbed 8000 times at 150 cycles / minute due to its inertia over a 100 mm reciprocating substrate.
  • Color locus CIE y is considered below 30 ° 0.289 0.280
  • Color locus deviation y from the target is below 45 ° 0.021
  • Color locus deviation y from the target is below 45 ° 0.017
  • Color locus deviation y from the target is below 60 ° 0.026 Color locus CIE x considers below 50 ° 0.282
  • Color locus deviation y from the target is below 70 ° 0.002
  • FIGS. 5 and 6 show as color locus diagrams in the CIE 1931 color space two examples of color values of the residual reflection at different light incidence angles for
  • the chamfer is angled at 55 ° to the main surface.
  • the antireflective coating covers the major surface and the chamfer.
  • the layer thicknesses of the example of FIG. 5 on the main surface are in the
  • the layer thicknesses ascend from the lowest to the highest layer on the main surface:
  • the color values of the main surface are shown as dots in the diagrams of FIGS. 5 and 6, and the values of the chamfer as open triangles. Furthermore, the y color values are entered in the diagrams.
  • Antireflection coating the change in color values between bevel and main surface as a whole small, with little change in the color depending on the angle of light incidence occurs. All values are close together in the color locus diagram of FIG.
  • Comparative example are approximately widened along a line.
  • the layer thicknesses of the layers apply in particular at a wavelength of 550 nm in the range of 1, 3 to 1, 6, preferably 1, 45 to 1, 5 for the layers with a lower refractive index and a refractive index at a wavelength of 550 nm in the range of 1.8 to 2.3, preferably 1.95 to 2.1 for the higher refractive index layers.
  • One characteristic of suitable coatings is the ratio of the layer thicknesses of the uppermost layer to the third uppermost layer, these are generally the uppermost layer of lower refractive index and the second uppermost layer of lower refractive index.
  • the ratio of the layer thickness of According to one embodiment of the invention, the uppermost layer to the layer thickness of the third uppermost layer is in a range of 0.5 to 8.5, preferably in the range of 2 to 8, more preferably in the range of 3 to 8, without limitation to the exemplary embodiments.
  • 7 shows three diagrams (a), (b), (c) in which the abovementioned ratio for a multiplicity of optimized antireflection coatings is shown. In each case the ratio is plotted on the ordinate of the diagrams, each point in the diagrams represents an antireflection coating.
  • Graph (a) plots the ratio for coatings, that for a sapphire substrate with a 55 ° angled facet as the second surface area versus the major surface as the first surface area.
  • Diagram (b) shows further examples, here the coatings for a borosilicate glass and an under 55 ° angled facet are optimized.
  • the examples of diagram (c) are optimized coatings for a sapphire substrate with a 30 ° angled facet. As can be seen, the ratios are in the range of 0.5 to 8 for all three configurations, with only one example having a very thick third uppermost layer in diagram (b) having a ratio of less than 2.
  • the ratio of the product of the layer thicknesses of the uppermost pair of layers to the product of the layer thicknesses of the second uppermost pair of layers in FIG one of the ranges from 8 to 22 or 60 to 140.
  • the layer thickness here is in the range of 8 to 140, excluding a range between 22 and 60.
  • the aforementioned ratio V would be formed by (layer thickness layer 56 x layer layer layer 55) / (layer layer layer 54 x layer layer layer 53).
  • FIG. 8 shows two diagrams (a), (b) in which a plurality of
  • the antireflection coatings correspond to those of the diagrams (a) and (b) of FIG. 7.
  • graph (a) shows the ratio for the facet being angled at a 55 ° angled sapphire substrate and (b) the ratio for the antireflective coatings optimized on a borosilicate glass substrate with a 55 ° angled facet.
  • At least one of Antireflective coatings of the pair of antireflective coatings for which at least one of the parameters of residual reflection color and photopic reflectivity is calculated selected to satisfy at least one of the following conditions:
  • Layer thickness of the third uppermost layer is in a range of 0.5 to 8.5, preferably in the range of 2 to 8, particularly preferably in the range of 3 to 8,
  • the ratio of the product of the layer thicknesses of the uppermost pair of layers to the product of the layer thicknesses of the second uppermost pair of layers is in one of the ranges from 8 to 22 or 60 to 140.
  • Coating of differently inclined surfaces also has the ratio of the thickest high and low refractive layers.
  • 9 shows two diagrams in which, for a large number of exemplary embodiments, the ratio of the layer thickness of the thickest low-index layer to the layer thickness of the lowest high-index layer is shown.
  • Diagram (a) shows the relationship for a variety of embodiments on a sapphire substrate, with the embodiments optimized for either facets of 30 ° or 55 ° angles.
  • Graph (b) shows the values of the ratio for antireflective coatings optimized for a borosilicate glass substrate with a facet angled at 55 °. It can be seen that in both cases the values contain an area in which no coatings with favorable properties occur. It will not
  • an advantageous feature of inventive antireflection coatings can be defined as follows: The ratio of the layer thickness of the thickest layer under the layers with a lower refractive index to the layer thickness of the thickest layer under the layers with higher
  • the ratio of the difference between the layer thickness of the thickest and the thinnest layer to the sum of the layer thicknesses of these layers is shown for a large number of antireflection coatings on a sapphire substrate with a chamfer angle of 30 °.
  • the values of this ratio are similar for the other systems discussed here as examples, ie antireflective coatings on sapphire and borosilicate glass with a chamfer angle of 55 ° each. Without limiting to the embodiments shown, according to one embodiment of the invention, the value of this ratio (dmax-dmin) /
  • Fig. 11 shows two diagrams with values of this ratio.
  • Diagram (a) shows the values for the embodiments on a sapphire substrate and diagram (b) for a borosilicate glass substrate, each with a chamfer angle of 55 °.
  • the values for the embodiments on a sapphire substrate with a bevel angled at 30 ° lie between the maximum values in the diagrams (a) and (b).
  • Embodiment of the invention provides that the ratio of standard deviation of the layer thicknesses of the layers to the layer thickness of the thickest layer of the antireflection coating in a range of 0.25 to 0.45. Again, a corresponding
  • An antireflection coating on a sapphire substrate with a chamfer angle of 55 ° has the following layer thicknesses, wherein the data (h) and (I) designate high-index or low-index layers, respectively:
  • An antireflection coating on a sapphire substrate with a chamfer angle of 30 ° has the following layer thicknesses, wherein the statements (h) and (I) designate high- or low-index layers, respectively:
  • An antireflection coating on a borosilicate glass substrate with a chamfer angle of 55 ° has the following layer thicknesses, wherein the data (h) and (I) designate high- and low-index layers, respectively:
  • the invention can be used wherever special requirements are placed on the mechanical properties of antireflection coatings.
  • the invention can also be used in the field of architecture, consumer electronics and optical components.
  • the invention is particularly suitable for cover glasses of smartphones, smartwatches, notebooks, LCD displays, eyeglasses, 3D glasses, head-up displays.

Abstract

L'invention vise à fournir un système antireflet le moins sensible possible sur des surfaces irrégulières, en termes de propriétés optiques. A cet effet, un élément transparent (1) comporte un substrat (3) transparent et sur ledit substrat (1), un revêtement antireflet (5) multicouche comprenant au moins six couches, des couches à indice de réfraction élevé (51, 53, 55) alternant avec des couches à faible indice de réfraction (50, 52, 54, 56) et les couches à indice de réfraction élevé (51, 53, 55) présentant une dureté plus élevée que celle des couches présentant un faible indice de réfraction (50, 52, 54), et la couche supérieure (56, 60) du revêtement antireflet multicouche (5) étant une couche à faible indice de réfraction. Le substrat présente au moins deux zones superficielles (30, 32) qui se différencient en termes d'inclinaison, le revêtement antireflet (5) recouvrant les zones superficielles (30, 32) de différente inclinaison et au moins une des caractéristiques suivantes s'appliquant au revêtement antireflet (5) sur les zones superficielles (30, 32) : les couleurs de la réflexion résiduelle à un angle d'incidence de 0° pour une épaisseur de couche réduite ne diffèrent respectivement pas les unes des autres de plus de Δx=0.05, Δy=0.05, de préférence pas de plus de Δx=0.03, Δy=0.03, particulièrement de préférence pas de plus de Δx=0.02, Δy=0.02, dans l'espace chromatique CIE xyz, les réflectivités photopiques à un angle d'incidence de 0° pour une épaisseur des couches superficielles (30, 32) ne diffèrent pas les unes des autres de plus de ΔR_ph=1.5 %.
PCT/EP2018/056344 2017-03-14 2018-03-14 Revêtement antireflet WO2018167126A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201880018479.8A CN110431122B (zh) 2017-03-14 2018-03-14 抗反射涂层
CH01151/19A CH714955B8 (de) 2017-03-14 2018-03-14 Antireflex-Beschichtung.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017105372.7A DE102017105372B4 (de) 2017-03-14 2017-03-14 Transparentes Element mit einer Antireflex-Beschichtung und Verfahren zu dessen Herstellung
DE102017105372.7 2017-03-14

Publications (1)

Publication Number Publication Date
WO2018167126A1 true WO2018167126A1 (fr) 2018-09-20

Family

ID=61691476

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2018/056344 WO2018167126A1 (fr) 2017-03-14 2018-03-14 Revêtement antireflet

Country Status (4)

Country Link
CN (1) CN110431122B (fr)
CH (1) CH714955B8 (fr)
DE (1) DE102017105372B4 (fr)
WO (1) WO2018167126A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3858606B1 (fr) * 2020-01-28 2022-09-07 Cnbm Research Institute For Advanced Glass Materials Group Co., Ltd. Élément de façade colorée à structure de vitre composite
CN113629156B (zh) * 2021-08-11 2023-10-27 无锡中微晶园电子有限公司 适用于光电探测器的颜色均一性调节方法
CN116969691A (zh) * 2022-04-22 2023-10-31 荣耀终端有限公司 抗划伤减反射玻璃、电子设备的显示屏及电子设备

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20106167U1 (de) 2001-04-07 2001-06-21 Schott Glas Kochfeld mit einer Glaskeramikplatte als Kochfläche
EP1453770B1 (fr) 2001-12-11 2008-10-15 Eurokera Plaques de vitroceramique, plans de cuisson comportant lesdites plaques et procedes de fabrication desdites plaques
WO2009010180A1 (fr) 2007-07-16 2009-01-22 Schott Ag Article en verre ou vitrocéramique revêtu de matériau dur et son procédé de fabrication
DE102008054139A1 (de) 2008-10-31 2010-05-12 Schott Ag Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung und Verfahren zu dessen Herstellung
EP2628818A1 (fr) * 2012-02-14 2013-08-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Objet avec revêtement anti-réfléchissant et son procédé de fabrication
EP2708922A2 (fr) * 2012-09-14 2014-03-19 Ricoh Imaging Company, Ltd. Revêtement antireflet, élément optique comprenant celui-ci et équipement optique comprenant ledit élément optique
DE102014104798A1 (de) 2014-04-03 2015-10-08 Schott Ag Harte anti-Reflex-Beschichtungen sowie deren Herstellung und Verwendung
US20150323705A1 (en) * 2014-05-12 2015-11-12 Corning Incorporated Durable and scratch-resistant anti-reflective articles
DE102014108058A1 (de) * 2014-06-06 2015-12-17 Schott Ag Optisches Element mit hoher Kratzbeständigkeit
EP2492251B1 (fr) 2011-02-23 2017-01-04 Schott Ag Substrat doté d'un revêtement anti-réfléchissant et son procédé de fabrication
US20170066684A1 (en) * 2015-09-08 2017-03-09 Corning Incorporated Optical coatings including buffer layers
US20180011225A1 (en) * 2016-07-11 2018-01-11 Corning Incorporated Coatings of non-planar substrates and methods for the production thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2856173B2 (ja) * 1996-09-17 1999-02-10 日本電気株式会社 反射防止構造とパターン形成方法
FR2793889B1 (fr) 1999-05-20 2002-06-28 Saint Gobain Vitrage Substrat transparent a revetement anti-reflets
EP1148037A1 (fr) 2000-04-19 2001-10-24 Blösch Holding AG Procédé pour la fabrication d'une couche antireflective sur glace de montre
JP4887612B2 (ja) * 2004-10-20 2012-02-29 日油株式会社 減反射材及びそれを用いた電子画像表示装置
JP2011149710A (ja) * 2010-01-19 2011-08-04 Seiko Epson Corp 時計用カバーガラス、及び時計
US9588266B2 (en) * 2011-05-17 2017-03-07 Canon Denshi Kabushiki Kaisha Optical filter and optical apparatus
CN105359005B (zh) * 2013-07-05 2018-01-12 埃西勒国际通用光学公司 包括在可见光区具有极低反射的抗反射涂层的光学制品
KR20220084430A (ko) * 2014-05-23 2022-06-21 코닝 인코포레이티드 감소된 스크래치 및 지문 가시성을 갖는 저 명암의 반사-방지 제품
CN104216034B (zh) * 2014-09-02 2016-04-06 西安应用光学研究所 一种用于大曲率透镜表面的0.532微米与1.064微米倍频减反射膜
DE202015104722U1 (de) 2015-09-04 2015-09-16 Schott Ag Kratzfeste Antireflexbeschichtung
DE102016125689A1 (de) 2016-12-23 2018-06-28 Schott Ag Substrat umfassend Anti-Reflex-Beschichtungssystem mit Hartstoffbeschichtung sowie Verfahren zu dessen Herstellung

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20106167U1 (de) 2001-04-07 2001-06-21 Schott Glas Kochfeld mit einer Glaskeramikplatte als Kochfläche
EP1453770B1 (fr) 2001-12-11 2008-10-15 Eurokera Plaques de vitroceramique, plans de cuisson comportant lesdites plaques et procedes de fabrication desdites plaques
WO2009010180A1 (fr) 2007-07-16 2009-01-22 Schott Ag Article en verre ou vitrocéramique revêtu de matériau dur et son procédé de fabrication
DE102008054139A1 (de) 2008-10-31 2010-05-12 Schott Ag Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung und Verfahren zu dessen Herstellung
EP2492251B1 (fr) 2011-02-23 2017-01-04 Schott Ag Substrat doté d'un revêtement anti-réfléchissant et son procédé de fabrication
EP2628818A1 (fr) * 2012-02-14 2013-08-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Objet avec revêtement anti-réfléchissant et son procédé de fabrication
EP2708922A2 (fr) * 2012-09-14 2014-03-19 Ricoh Imaging Company, Ltd. Revêtement antireflet, élément optique comprenant celui-ci et équipement optique comprenant ledit élément optique
DE102014104798A1 (de) 2014-04-03 2015-10-08 Schott Ag Harte anti-Reflex-Beschichtungen sowie deren Herstellung und Verwendung
US20150323705A1 (en) * 2014-05-12 2015-11-12 Corning Incorporated Durable and scratch-resistant anti-reflective articles
DE102014108058A1 (de) * 2014-06-06 2015-12-17 Schott Ag Optisches Element mit hoher Kratzbeständigkeit
US20170066684A1 (en) * 2015-09-08 2017-03-09 Corning Incorporated Optical coatings including buffer layers
US20180011225A1 (en) * 2016-07-11 2018-01-11 Corning Incorporated Coatings of non-planar substrates and methods for the production thereof

Also Published As

Publication number Publication date
CN110431122A (zh) 2019-11-08
CH714955B1 (fr) 2018-09-22
CN110431122B (zh) 2022-03-18
DE102017105372B4 (de) 2022-05-25
DE102017105372A1 (de) 2018-09-20
CH714955B8 (de) 2022-03-15

Similar Documents

Publication Publication Date Title
EP2324376B1 (fr) Verre de lunettes avec revêtement antireflet de couleur neutre et procédé de fabrication associé
DE60020374T2 (de) Verfahren zur Herstellung eines entspiegelten Artikels
DE3941859C1 (fr)
DE69913264T2 (de) Anti-Reflektionsglas mit Farbunterdrückung
DE3928939C2 (de) Mehrschichtiger reflektierender Spiegel
DE102015114877B4 (de) Kratzfeste Antireflexbeschichtung und mobiles elektronisches Gerät
DE10056286B4 (de) Substrat für Flüssigkristallanzeigeelemente
EP0564709A1 (fr) Substrat transparent revêtu, son emploi, procédé de fabrication des revêtements et dispositif pour la mise en oeuvre d'un tel procédé et oxynitrure d'hafnium
WO2018167126A1 (fr) Revêtement antireflet
EP3657222A1 (fr) Système de couches et élément optique avec un système de couches
EP3850406B1 (fr) Élément optique comportant un empilement d'ensembles de couches et procédé de fabrication dudit élément optique
DE3009533A1 (de) Verfahren zur herstellung eines reflexverminderndenmehrschichtenbelages und optischer koerper mit reflexverminderndem mehrschichtenbelag
DE102016125689A1 (de) Substrat umfassend Anti-Reflex-Beschichtungssystem mit Hartstoffbeschichtung sowie Verfahren zu dessen Herstellung
EP1749222A1 (fr) Miroir dielectrique a haute reflexion et son procede de production
DE102017104523B4 (de) Verfahren zur Herstellung eines transparenten Elements mit einer Antireflex-Beschichtung mit stabiler Reflektivität und Farbe unter Winkel und unter Abrasion sowie nach dem Verfahren hergestelltes transparentes Element
EP3997513B1 (fr) Verre de lunettes à effet filtrant pour lumière bleue et lunettes
DE2240302B2 (de) Optischer mehrschichtiger Antireflexbelag
DE102020122475A1 (de) Element umfassend ein transparentes Substrat und eine Mehrlagen-Verschleißschutzschicht mit angepasster Reflexion und Verfahren zu dessen Herstellung
DE10042913B4 (de) Antireflexfilm und damit beschichtetes optisches Element
WO2010048975A1 (fr) Revêtement d'oxyde d'hafnium
DE102020207504B4 (de) Farbensehen-korrekturlinse und optische komponente
DD298850A5 (de) Vielschicht-entspiegelungsbelag
EP4078249A1 (fr) Procédé pour faire fonctionner un système de revêtement pour réaliser des systèmes de couches
WO2005033750A2 (fr) Systeme optique pour reduire la reflexion de substrats optiques transparents
DE102008003363B4 (de) Rückseitenspiegel

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18711891

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 18711891

Country of ref document: EP

Kind code of ref document: A1