WO2018145955A3 - Electrical contacting method and power module - Google Patents
Electrical contacting method and power module Download PDFInfo
- Publication number
- WO2018145955A3 WO2018145955A3 PCT/EP2018/052292 EP2018052292W WO2018145955A3 WO 2018145955 A3 WO2018145955 A3 WO 2018145955A3 EP 2018052292 W EP2018052292 W EP 2018052292W WO 2018145955 A3 WO2018145955 A3 WO 2018145955A3
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- WIPO (PCT)
- Prior art keywords
- contact
- component
- contact layer
- power module
- electrical contacting
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- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/32235—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the layer connector connecting to a via metallisation of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/831—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83909—Post-treatment of the layer connector or bonding area
- H01L2224/8392—Applying permanent coating, e.g. protective coating
Abstract
In a method for electrically contacting a component (10) (e.g. a substrate) with at least one electrical contact (30), an open-cell contact layer is additively formed on the at least one contact (30), in particular using a nozzle (55). The contact layer can be in tangled form (160), a folded weave (wire) (260) or foam crumbs (360) which are left behind after the evaporation of a carrier liquid (355) from a paste applied to the component (10), said paste comprising particles (of a mixture of granular material (360) in the form of foam crumbs (360) and the carrier liquid (355)). The contact layer can be then electrically contacted with the contact (30) by electroplating (especially electrochemically or without external current). A power module (50) can have a cooling channel in which a power component is provided together with the contact layer used to contact said component, and a cooling fluid, in particular a coolant liquid or coolant gas can flow through the cooling channel.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102017201979 | 2017-02-08 | ||
DE102017201979.4 | 2017-02-08 | ||
DE102017001248 | 2017-02-09 | ||
DE102017001248.2 | 2017-02-09 | ||
DE102017211619.6 | 2017-07-07 | ||
DE102017211619.6A DE102017211619A1 (en) | 2017-02-08 | 2017-07-07 | Method for electrical contacting and power module |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2018145955A2 WO2018145955A2 (en) | 2018-08-16 |
WO2018145955A3 true WO2018145955A3 (en) | 2018-11-29 |
Family
ID=62910398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2018/052292 WO2018145955A2 (en) | 2017-02-08 | 2018-01-30 | Electrical interconnection method and performance module |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102017211619A1 (en) |
WO (1) | WO2018145955A2 (en) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1198001A2 (en) * | 1994-11-15 | 2002-04-17 | Formfactor, Inc. | Method of testing and mounting devices using a resilient contact structure |
DE102004048529A1 (en) * | 2003-10-23 | 2005-05-25 | Luk Lamellen Und Kupplungsbau Beteiligungs Kg | Electronic device for driving brushless motor, has semiconductor chip with one contact side bonded to metallic conductor portion through solid soldering agent layer whose softening temperature is used as device operating temperature |
WO2006068643A1 (en) * | 2004-12-20 | 2006-06-29 | Semiconductor Components Industries, L.L.C. | Semiconductor package structure having enhanced thermal dissipation characteristics |
US20060279932A1 (en) * | 2005-06-14 | 2006-12-14 | International Business Machines Corporation | Compliant thermal interface structure utilizing spring elements with fins |
DE102009003294A1 (en) * | 2009-05-20 | 2010-11-25 | Robert Bosch Gmbh | Control device for controlling hydraulic transmission of motor vehicle, has spring elastic elements arranged between base plate and bearing surface of heat sink, and formed of contact surfaces or metallic contact points |
US20100328896A1 (en) * | 2009-06-30 | 2010-12-30 | General Electric Company | Article including thermal interface element and method of preparation |
EP2270852A2 (en) * | 2009-06-30 | 2011-01-05 | General Electric Company | Thermal interface element and article including the same |
EP2775511A1 (en) * | 2011-10-31 | 2014-09-10 | Hitachi, Ltd. | Semiconductor device and manufacturing method thereof |
US20160225730A1 (en) * | 2013-10-09 | 2016-08-04 | Waseda University | Electrode connection structure and electrode connection method |
WO2016193038A1 (en) * | 2015-06-01 | 2016-12-08 | Siemens Aktiengesellschaft | Method for electrically contacting a component by means of galvanic connection of an open-pored contact piece, and corresponding component module |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004057497B4 (en) | 2004-11-29 | 2012-01-12 | Siemens Ag | A heat exchange device and method of making the heat exchange device, and a device and heat exchange device assembly and method of making the assembly |
US8835299B2 (en) | 2012-08-29 | 2014-09-16 | Infineon Technologies Ag | Pre-sintered semiconductor die structure |
DE202013012008U1 (en) | 2013-09-03 | 2014-12-16 | Deutsches Zentrum für Luft- und Raumfahrt e.V. | Cooling system for electronic components |
DE102014201306A1 (en) | 2014-01-24 | 2015-07-30 | Siemens Aktiengesellschaft | Power electronics module with 3D-made cooler |
EP2985788B1 (en) | 2014-08-14 | 2017-10-04 | ABB Technology Oy | Power semiconductor module and method for cooling power semiconductor module |
-
2017
- 2017-07-07 DE DE102017211619.6A patent/DE102017211619A1/en not_active Withdrawn
-
2018
- 2018-01-30 WO PCT/EP2018/052292 patent/WO2018145955A2/en active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1198001A2 (en) * | 1994-11-15 | 2002-04-17 | Formfactor, Inc. | Method of testing and mounting devices using a resilient contact structure |
DE102004048529A1 (en) * | 2003-10-23 | 2005-05-25 | Luk Lamellen Und Kupplungsbau Beteiligungs Kg | Electronic device for driving brushless motor, has semiconductor chip with one contact side bonded to metallic conductor portion through solid soldering agent layer whose softening temperature is used as device operating temperature |
WO2006068643A1 (en) * | 2004-12-20 | 2006-06-29 | Semiconductor Components Industries, L.L.C. | Semiconductor package structure having enhanced thermal dissipation characteristics |
US20060279932A1 (en) * | 2005-06-14 | 2006-12-14 | International Business Machines Corporation | Compliant thermal interface structure utilizing spring elements with fins |
DE102009003294A1 (en) * | 2009-05-20 | 2010-11-25 | Robert Bosch Gmbh | Control device for controlling hydraulic transmission of motor vehicle, has spring elastic elements arranged between base plate and bearing surface of heat sink, and formed of contact surfaces or metallic contact points |
US20100328896A1 (en) * | 2009-06-30 | 2010-12-30 | General Electric Company | Article including thermal interface element and method of preparation |
EP2270852A2 (en) * | 2009-06-30 | 2011-01-05 | General Electric Company | Thermal interface element and article including the same |
EP2775511A1 (en) * | 2011-10-31 | 2014-09-10 | Hitachi, Ltd. | Semiconductor device and manufacturing method thereof |
US20160225730A1 (en) * | 2013-10-09 | 2016-08-04 | Waseda University | Electrode connection structure and electrode connection method |
WO2016193038A1 (en) * | 2015-06-01 | 2016-12-08 | Siemens Aktiengesellschaft | Method for electrically contacting a component by means of galvanic connection of an open-pored contact piece, and corresponding component module |
Also Published As
Publication number | Publication date |
---|---|
DE102017211619A1 (en) | 2018-08-09 |
WO2018145955A2 (en) | 2018-08-16 |
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