WO2018121322A1 - Flexible display device and manufacturing method therefor - Google Patents

Flexible display device and manufacturing method therefor Download PDF

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Publication number
WO2018121322A1
WO2018121322A1 PCT/CN2017/116916 CN2017116916W WO2018121322A1 WO 2018121322 A1 WO2018121322 A1 WO 2018121322A1 CN 2017116916 W CN2017116916 W CN 2017116916W WO 2018121322 A1 WO2018121322 A1 WO 2018121322A1
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WO
WIPO (PCT)
Prior art keywords
conductive layer
display device
flexible display
hole
bending
Prior art date
Application number
PCT/CN2017/116916
Other languages
French (fr)
Chinese (zh)
Inventor
胡坤
冯浩
袁波
蔡世星
张婷婷
宋艳芹
林立
胡思明
朱晖
Original Assignee
昆山工研院新型平板显示技术中心有限公司
昆山国显光电有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from CN201710774762.0A external-priority patent/CN108257971B/en
Application filed by 昆山工研院新型平板显示技术中心有限公司, 昆山国显光电有限公司 filed Critical 昆山工研院新型平板显示技术中心有限公司
Priority to EP17885656.3A priority Critical patent/EP3564998A4/en
Priority to JP2019520113A priority patent/JP7312104B2/en
Priority to KR1020197010450A priority patent/KR20190045353A/en
Publication of WO2018121322A1 publication Critical patent/WO2018121322A1/en
Priority to US16/318,295 priority patent/US20190237490A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H01L27/1244Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1218Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42384Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78603Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
    • H01L29/78648Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133305Flexible substrates, e.g. plastics, organic film
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10Substrates, e.g. flexible substrates
    • H10K77/111Flexible substrates

Definitions

  • the present invention relates to display technology, and in particular to a flexible display device and a method of fabricating the same.
  • the flexible display device refers to a display device in which the display panel is bendable and deformable, and includes various types such as a flexible organic electroluminescence display device (OLED), a flexible electrophoretic display device (EPD), and a flexible liquid crystal display device (LCD).
  • OLED organic electroluminescence display device
  • EPD flexible electrophoretic display device
  • LCD liquid crystal display device
  • a fragile TFT Thin Film Transistor
  • the broken TFT may affect the display effect of the flexible display device or directly cause the flexible display device to malfunction. It has been found that the brittle TFT cracks are mainly concentrated on the thicker conductive layer around the screen, especially in the flexible foldable direction of the conductive layer.
  • the conductive layer is punched to release stress; the plurality of conductive layers are disposed, and the contact holes are used to connect them to each other; and the electrode material is replaced.
  • the above-described conventional technical solutions for enhancing the mechanical reliability of the conductive layer are not satisfactory.
  • the present invention provides a flexible display device and a method of fabricating the same to solve the problem that the conductive layer is susceptible to cracking or even breakage during bending or folding of the flexible display device in the prior art.
  • an embodiment of the present invention provides a flexible display device including: a flexible substrate and a conductive layer formed on the flexible substrate, wherein the conductive layer is provided with at least one recessed region.
  • the conductive layer constitutes a power line on the flexible substrate.
  • the longest one of all the sides of the recessed area or the longest one of the side lines connecting the two sides of the recessed side and the curved side of the flexible display device The direction of the fold is the same.
  • the recessed area comprises a through hole and/or a blind hole.
  • the conductive layer and the flexible substrate are divided into a bending zone and a non-bending zone along the extending direction, and at least one recessed zone is disposed in the bending zone of the conductive layer; wherein the thickness of the conductive layer of the bending zone Greater than the thickness of the conductive layer of the non-bending zone.
  • the upper or lower edge of the non-stretching direction of the bend region of the conductive layer is collinear with the same side edge of the conductive layer of the non-bending region.
  • the upper and lower edges of the non-stretching direction of the bend region of the conductive layer are not collinear with the same side edge of the conductive layer of the non-bending region.
  • the flexible display device adopts a thin film transistor structure, wherein the conductive layer is electrically connected to the source electrode, the drain electrode, the gate electrode, the cathode or the anode of the flexible display device; or the conductive layer constitutes a source of the flexible display device Electrode, drain electrode, gate electrode, cathode or anode.
  • the flexible display device adopts a thin film transistor structure
  • the conductive layer constitutes a top gate and/or a bottom gate in a gate electrode of the flexible display device
  • the gate electrode includes: disposed above the channel layer of the thin film transistor structure a top gate; and a bottom gate disposed under the channel layer; wherein the top gate is provided with at least one recessed region, and the projection of the recessed region on the top gate on a plane parallel to the channel layer is planarly on the plane Covered by the projection; and/or, the bottom gate is provided with at least one recessed area, and the projection of the recessed area on the bottom gate on the plane is covered by the projection of the top gate on the plane.
  • the projected shape of the recessed area on the top gate on the plane is the same as the projected shape of the bottom gate on the plane; and/or the projected shape of the recessed area on the bottom gate on the plane and The shape of the top grid projection on the plane is the same.
  • At least one of the recessed regions of the conductive layer is filled with an organic material.
  • the at least one recessed region is disposed in one or more rows along the direction of the bend line of the flexible display device.
  • the plurality of rows of recessed regions are aligned or staggered.
  • the ratio of the cross-sectional width in the line width direction of one recessed region of the same column or the cross-sectional width in the line width direction of the plurality of recessed regions in the same column and the line width of the conductive layer is less than or equal to 1/. 2.
  • the ratio of the minimum spacing between two adjacent recessed regions in the same row and the side or side connecting lines consistent with the bending direction of the flexible display device is greater than or equal to 1/2 and less than or equal to 2.
  • the projection of the shape of the at least one recessed area on a plane parallel to the flexible substrate or a plane perpendicular to the flexible substrate comprises a combination of one or more of the following shapes: rectangle, Triangle, trapezoid, diamond, circle, ellipse, sinusoidal, twisted and zigzag.
  • the protective layer is disposed on the conductive layer, and the ratio of the aperture of the recessed region covered by the protective layer to the width of the conductive layer is less than 0.1.
  • the ratio of the aperture of the recessed region of the conductive layer not covered by the protective layer to the width of the conductive layer is greater than 0.08.
  • an embodiment of the present invention further provides a method for manufacturing a flexible display device.
  • the method for manufacturing a flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width of the conductive layer according to a power line resistance requirement Data of the recessed area; forming a power line on the flexible substrate according to the line width of the conductive layer and the data of the recessed area.
  • an embodiment of the present invention further provides a method for fabricating a flexible display device.
  • the flexible display device is a thin film transistor structure
  • the method for preparing a gate electrode of the thin film transistor structure includes: fabricating a bottom gate; and sequentially forming a bottom on the bottom gate a gate insulating layer and a channel layer; and sequentially forming a top gate insulating layer and a top gate over the channel layer; wherein the top gate is provided with at least one recessed region, and the recessed region on the top gate is in a plane parallel to the channel layer
  • the projection on the upper surface is covered by the projection of the bottom gate on the plane; and/or the bottom gate is provided with at least one recessed area, and the projection of the recessed area on the bottom gate on the plane is covered by the projection of the top gate on the plane.
  • a flexible display device includes a flexible substrate and a conductive layer formed on the flexible substrate, and the conductive layer is provided with at least one recessed region.
  • the flexible display device provided by the embodiment of the present invention prevents the conductive layer from being cracked or broken during the bending or folding process by providing a conductive layer on the flexible substrate and providing at least one recessed region on the conductive layer, thereby improving conductivity. The quality and reliability of the layer when it is bent.
  • FIG. 1 is a schematic structural view of a flexible display device according to a first embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a flexible display device according to Embodiment 2 of the present invention.
  • FIG 3 is a schematic structural view of a flexible display device according to a third embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a flexible display device according to Embodiment 4 of the present invention.
  • FIG. 5 is a schematic structural view of a flexible display device according to Embodiment 5 of the present invention.
  • FIG. 6 is a schematic structural view of a flexible display device according to Embodiment 6 of the present invention.
  • Fig. 7a is a schematic structural view showing a structure of a thin film transistor of a flexible display device according to a seventh embodiment of the present invention.
  • FIG. 7b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 7 of the present invention.
  • Embodiment 8a is a schematic structural view of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention.
  • FIG. 8b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention.
  • FIG. 9 is a flow chart showing the fabrication of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 9 of the present invention.
  • FIG. 10 is a schematic diagram showing a bending line experimental data broken line of the flexible display device according to Embodiment 10 of the present invention.
  • FIG. 11 is a schematic diagram showing a bending line of experimental data of a flexible display device according to Embodiment 11 of the present invention.
  • the flexible display device includes: a flexible substrate 10 and a power line 11 formed on the flexible substrate 10; the power line 11 includes a conductive layer 110 having a through hole 111 thereon.
  • the through hole 111 can disperse the stress generated when the power cord 11 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
  • the material of the conductive layer 110 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide.
  • the material selected for the conductive layer 110 is only required to be electrically conductive.
  • the longest one of all the sides of the through hole 111 or the longest one of the side lines of the two sides of the connecting side of the through hole 111 and the bending direction of the power line 11 Consistent.
  • the side refers to any side of the shape of the through hole
  • the side line refers to the line between any two points on any side of the through hole.
  • the bending direction refers to the axial direction in which the power cord 11 is bent, that is, the direction in which the stress is transmitted when the power cord 11 is bent; further, the bending direction of the power cord 11 is generated when the power cord 11 is bent.
  • the bend line is vertical.
  • the flexible display device has a rectangular shape, and the bending operation is performed along the long side, that is, the two short sides are gradually approached or overlapped, and the bending direction is the axial direction where the long side is located.
  • the through hole 111 has a rectangular shape. Further, the long side of the rectangular through hole (ie, the longest side) coincides with the bending direction of the power line 11, that is, the long side of the rectangular through hole is consistent with the bending direction of the flexible display device. Thereby, the through hole 111 can be made to better disperse the stress generated when the power supply line 11 is bent.
  • a row of through holes 111 is disposed on the conductive layer 110 having a width of 200 ⁇ m to 500 ⁇ m, and one or more rows of through holes 111 are evenly distributed on the conductive layer 110, thereby ensuring a certain number of through holes. The better stress generated when the power line 11 is bent is bent, and the quality and reliability of the conductive layer 110 can be ensured.
  • the conductive layer 110 when the line width of the conductive layer 110 is less than 500 ⁇ m, the conductive layer 110 has a row of through holes 111; when the line width of the conductive layer 110 is greater than or equal to 500 ⁇ m and less than 1000 ⁇ m, the conductive layer 110 has two rows of through holes 111; When the line width of the conductive layer 110 is greater than or equal to 1000 ⁇ m and less than 1500 ⁇ m, the conductive layer 110 has three rows of through holes 111; when the line width of the conductive layer 110 is 1500 ⁇ m or more and less than 2000 ⁇ m, the conductive layer 110 has four rows of through holes 111. .
  • the conductive layer 110 has a wider line width (greater than 2000 ⁇ m)
  • more rows of through holes 111 may be disposed on the conductive layer 110.
  • the number of the through holes 111 in this embodiment is seven, and the seven through holes 111 are arranged in a line.
  • the cross-sectional width of one through hole 111 of the same column in the line width direction or the sum of the cross-sectional widths of the plurality of through holes 111 in the same width in the line width direction and the line width of the conductive layer 110 is less than or equal to 1/2.
  • the ratio of the short side a1 of the rectangular through hole 111 to the line width a2 of the conductive layer 110 is less than or equal to 1/2.
  • the ratio of the minimum spacing a3 between the adjacent two through holes 111 in the same row and the longest side or the longest side connecting line (here, the long side a4 of the rectangular through hole 111) is greater than or equal to 1/2 and less than or equal to 2.
  • the embodiment further provides a manufacturing method of the flexible display device.
  • the manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via.
  • forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement)
  • the obtained through hole data such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
  • the flexible display device includes: a flexible substrate 20 and a power line 21 formed on the flexible substrate 20; the power line 21 includes a conductive layer 210 having a through hole 211 therein.
  • the through hole 211 can disperse the stress generated when the power cord 21 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
  • the material of the conductive layer 210 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer formed by compounding a plurality of metal materials; it may also be a transparent material such as indium tin oxide.
  • the material selected for the conductive layer 210 is only required to be electrically conductive.
  • the longest one of all the sides of the through hole 211 or the longest one of the side lines of the two sides of the connecting side of the through hole 211 and the bending direction of the power line 21 Consistent.
  • the shape of the through hole 211 is elliptical.
  • the long axis of the elliptical through hole ie, the longest side line
  • the long axis of the elliptical through hole is consistent with the bending direction of the power line 21, that is, the long axis of the elliptical through hole is consistent with the bending direction of the flexible display device,
  • the through hole 211 can be made to better disperse the stress generated when the power source wire 21 is bent.
  • a row of through holes 211 is disposed on the conductive layer 210 having a width of 200 ⁇ m to 500 ⁇ m, and one or more rows of through holes 211 are evenly distributed on the conductive layer 210, thereby ensuring a certain number of through holes. The better stress generated when the power line 21 is bent is bent, and the quality and reliability of the conductive layer 210 can be ensured.
  • the number of the through holes 211 is 14, and the 14 through holes 211 are arranged in a plurality of rows (specifically, arranged in two rows), and are arranged in a plurality of rows.
  • the ratio of the cross-sectional width in the line width direction of one through hole 211 in the same row or the cross-sectional width in the line width direction of the plurality of through holes 211 in the same column to the line width of the conductive layer 210 is less than or equal to 1/2.
  • the sum of the minor axes b1 of the two elliptical through holes 211 of the same column is 2*b1 (that is, the sum of the maximum cross-sectional widths of the plurality of through holes 211 of the same column in the line width direction) and the conductive
  • the ratio of the line width b2 of the layer 210 is 1/2 or less.
  • the ratio of the minimum distance b3 between the adjacent two through holes 211 in the same row and the longest side or the longest side line is larger than Equal to 1/2 and less than or equal to 2.
  • the embodiment further provides a manufacturing method of the flexible display device.
  • the manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via.
  • forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement)
  • the obtained through hole data such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
  • the flexible display device includes a flexible substrate 30 and a power line 31 formed on the flexible substrate 30.
  • the power line 31 includes a conductive layer 310 having a through hole 311 therein.
  • the through hole 311 can disperse the stress generated when the power line 31 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power line when bent.
  • the material of the conductive layer 310 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide.
  • the material selected for the conductive layer 310 may be of a conductive property.
  • the longest one of all the sides of the through hole 311 or the longest one of the side lines of the two sides of the connecting side of the through hole 311 and the bending direction of the power line 31 Consistent.
  • the shape of the through hole 311 is elliptical.
  • the long axis of the elliptical through hole ie, the longest side line
  • the long axis of the elliptical through hole is consistent with the bending direction of the power line 31
  • the long axis of the elliptical through hole is consistent with the bending direction of the flexible display device, whereby, the through hole 311 can be made to better disperse the stress generated when the power source wire 31 is bent.
  • a row of through holes 311 is disposed on the conductive layer 310 having a width of 200 ⁇ m to 500 ⁇ m, and one or more rows of through holes 311 are evenly distributed on the conductive layer 310, thereby ensuring a certain number of through holes. The better stress generated when the power line 31 is bent is bent, and the quality and reliability of the conductive layer 310 can be ensured.
  • the number of the through holes 311 is twelve, and the twelve through holes 311 are arranged in a plurality of rows (specifically, two rows are arranged), and are arranged in a plurality of rows.
  • the ratio of the cross-sectional width in the line width direction of one through hole 311 of the same column or the cross-sectional width in the line width direction of the plurality of through holes 311 in the same column is less than or equal to 1/2 of the line width of the conductive layer 310.
  • the cross-sectional width of the through hole 311 in the line width direction here, the short axis c1 of the elliptical through hole 311 and the line of the conductive layer 310.
  • the ratio of the width c2 is less than or equal to 1/2; or, when there are two through holes 311 in the same column, that is, the sum of the cross-sectional widths of the two through holes 311 in the line width direction (here, the cross-sectional width c5 and the cross-sectional width c6)
  • the sum of the sum and the line width c2 of the conductive layer 310 is 1/2 or less.
  • the ratio of the minimum pitch c3 between the adjacent two through holes 311 in the same row and the longest side or the longest side line (in this case, the long axis c4 of the elliptical through hole 311) is larger than Equal to 1/2 and less than or equal to 2.
  • the embodiment further provides a manufacturing method of the flexible display device.
  • the manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via.
  • forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement)
  • the obtained through hole data such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
  • the flexible display device includes a flexible substrate 40 and a power supply line 41 formed on the flexible substrate 40.
  • the power supply line 41 includes a conductive layer 410 having a through hole 411 therein.
  • the through hole 411 can disperse the stress generated when the power cord 41 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
  • the material of the conductive layer 410 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide.
  • the material selected for the conductive layer 410 is only required to be electrically conductive.
  • the longest one of all the sides of the through hole 411 or the longest one of the side lines of the two sides of the connecting side of the through hole 411 and the bending direction of the power line 41 Consistent.
  • the shape of the through hole 411 is a diamond shape.
  • the long diagonal line of the diamond-shaped through hole ie, the longest side line
  • the long diagonal line of the diamond-shaped through hole is consistent with the bending direction of the power line 41, that is, the long diagonal line of the diamond-shaped through hole is consistent with the bending direction of the flexible display device.
  • the through hole 411 can be made to better disperse the stress generated when the power source wire 41 is bent.
  • a row of through holes 411 is disposed on the conductive layer 410 having a width of 200 ⁇ m to 500 ⁇ m, and one or more rows of through holes 411 are evenly distributed on the conductive layer 410, thereby ensuring a certain number of through holes. The better stress generated when the power line 41 is bent is bent, and the quality and reliability of the conductive layer 410 can be ensured.
  • the number of the through holes 411 is one, and one through hole 411 is located at an intermediate position of the conductive layer 410.
  • the ratio of the cross-sectional width in the line width direction of one through hole 411 of the same column or the cross-sectional width in the line width direction of the plurality of through holes 411 in the same column and the line width of the conductive layer 410 is 1/2 or less.
  • the ratio of the short diagonal line d1 of the rhombic through hole 411 to the line width d2 of the conductive layer 410 is 1/2 or less.
  • the embodiment further provides a manufacturing method of the flexible display device.
  • the manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via.
  • forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement)
  • the obtained through hole data such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
  • the through hole may have other shapes, such as a circular shape, a square shape, an irregular shape, etc.
  • the shape of the through hole is a regular shape, thereby facilitating the passage of the power line resistance requirement.
  • Hole data such as the specific shape, size, number of rows and number of through holes, are manufactured.
  • the through holes on the conductive layer of the flexible display device may also be recessed regions of other shapes (for example, a blind hole, a region where the through hole and the blind hole are mixed), and the recessed region of the present invention
  • the specific shape is not limited.
  • the flexible display device adopts a thin film transistor structure, wherein the conductive layer is electrically connected to the source electrode, the drain electrode, the gate electrode, the cathode or the anode of the flexible display device; or the conductive layer constitutes the source electrode of the flexible display device , drain electrode, gate electrode, cathode or anode.
  • the conductive layer provided by the embodiment of the present invention is provided with a recessed region capable of dispersing bending stress, when the conductive layer constitutes different conductive portions of the flexible display device, the bending resistance of the different conductive portions is resisted. Performance will improve.
  • the present invention does not limit the specific portion of the flexible display device that constitutes the conductive layer.
  • the recessed region (for example, a through hole or a blind hole) of the conductive layer of the flexible display device provided by any of the above embodiments of the present invention may be filled with an organic material to facilitate buffering the bending stress of the flexible display device.
  • the projection of the shape of the at least one recessed area on a plane parallel to the flexible substrate or a plane perpendicular to the flexible substrate comprises a combination of one or more of the following shapes: rectangle, Triangle, trapezoid, diamond, circle, ellipse, sinusoidal, twisted and zigzag.
  • the recessed regions are disposed in a plurality of different shapes to fully disperse the stress of the conductive layer, thereby further dispersing the stress influence of the flexible display device provided by the embodiment of the present invention.
  • FIG. 5 is a schematic structural view of a flexible display device according to Embodiment 5 of the present invention.
  • a flexible display device according to a fifth embodiment of the present invention includes a conductive layer 4, an insulating layer 2, and a flexible layer which are sequentially arranged in a top-down direction (from top to bottom as shown in FIG. 5).
  • the substrate 3, the conductive layer 4, the insulating layer 2 and the flexible substrate 3 which are stacked in the top-down direction are divided into a bending zone N2 and a non-bending zone N1 in the extending direction, and the thickness of the conductive layer 4 of the bending zone N2
  • the lower edge of the conductive layer 4 (where the lower edge is the lower edge of the stacking direction as shown in FIG.
  • the upper edge is an upper edge of the stacking direction as shown in FIG. 5) and is lower than the upper edge of the conductive layer 4 of the non-bending region N1 in the horizontal direction (wherein the upper edge is in the stacking direction as shown in FIG. 5) edge).
  • extension direction mentioned in the embodiment of the present invention refers to the horizontal direction, that is, the left-right direction shown in FIG. 5, and the non-extension direction refers to the vertical direction, that is, the up-and-down direction shown in FIG.
  • the flexible display device provided by the embodiment of the present invention may not include the insulating layer 2.
  • the resistance of the conductive layer before the improvement is:
  • S1 W*h1
  • W represents the width of the conductive layer
  • L represents the length of the conductive layer
  • h1 represents the thickness of the conductive layer
  • S1 represents the cross-sectional area of the conductive layer
  • represents the density value of the conductive layer
  • R1 represents the conductive layer. resistance.
  • the improved conductive layer resistance is:
  • L1 represents the length of the conductive layer in the bending zone
  • L2 and L3 represent thickening
  • S1 represents the cross-sectional area of the conductive layer of the corresponding bending zone
  • S2 and S3 represent the cross-section of the conductive layer of the corresponding thickened non-bending zone area.
  • the flexible display device divides the flexible display device into a bending region and a non-bending region along the extending direction, and sets the thickness of the conductive layer of the bending region to be larger than the thickness of the conductive layer of the non-bending region.
  • the method achieves the purpose of reducing the resistance value of the conductive layer of the flexible display device without affecting the bending performance of the bending region of the flexible display device, and provides a necessary condition for applying the flexible display device to the large-screen foldable mobile terminal. .
  • the upper edge of the conductive layer 4 of the bending region N2 (where the upper edge is the upper edge of the stacking direction as shown in FIG. 5) and the non-bending region may also be used.
  • the upper edge of the conductive layer 4 of N1 (wherein the upper edge is the upper edge of the stacking direction as shown in FIG. 5) is on the same horizontal line (ie, the collinear line), and the lower edge of the conductive layer 4 of the bent region N2 (where The lower edge is a lower edge of the stacking direction as shown in FIG. 5) the lower edge of the conductive layer 4 which is higher in the horizontal direction than the non-bending region N1 (wherein the lower edge is in the stacking direction as shown in FIG.
  • the purpose of the lower edge) to achieve the thickness of the conductive layer 4 of the bending region N2 is greater than the thickness of the conductive layer 4 of the non-bending region N1, so as to sufficiently increase the adaptability and expandability of the flexible display device provided by the embodiment of the present invention.
  • the conductive layer 4 in the embodiment of the present invention is provided as a metal layer so that the conductive layer 4 can better exert a conductive effect.
  • the material of the conductive layer 4 may be made of a conductive plastic or a conductive rubber, which is not limited in the present invention.
  • FIG. 6 is a schematic structural view of a flexible display device according to Embodiment 6 of the present invention.
  • the sixth embodiment of the present invention is extended on the basis of the fifth embodiment of the present invention.
  • the sixth embodiment of the present invention is substantially the same as the fifth embodiment. The differences will be described below, and the details are not described again.
  • the upper edge of the conductive layer 4 of the non-bending area N1 of the flexible display device according to the sixth embodiment of the present invention (wherein the upper edge is the upper edge of the stacked arrangement direction as shown in FIG. 6)
  • the extending direction ie, the horizontal direction
  • the lower edge (wherein the lower edge is the lower edge of the stacking direction as shown in FIG. 6) is lower in the extending direction (ie, the horizontal direction) than the lower edge of the conductive layer 4 of the bending region N2 (wherein the lower edge is as The lower edge of the stacking direction shown in Fig. 6).
  • the flexible display device provides that the upper edge of the conductive layer 4 of the non-bending region N1 is set to be higher than the upper edge of the conductive layer 4 of the bending region N2 in the extending direction (ie, the horizontal direction).
  • the lower edge of the conductive layer 4 of the non-bending region N1 is disposed in a manner that is shorter than the lower edge of the conductive layer 4 of the bending region N2 in the extending direction (ie, the horizontal direction), that is, the conductive layer 4 from the non-bending region N1.
  • the manner of increasing the thickness of the conductive layer 4 of the non-bending area N1 at both ends of the non-extension direction respectively achieves better reduction of the resistance value of the conductive layer 4 of the flexible display device without affecting the flexible display device.
  • the upper edge and/or the lower edge of the conductive layer 4 of the non-bending area N1 and the upper edge and/or the lower edge of the conductive layer 4 of the corresponding bending area N2 may also be collinear. Ok, it is not mandatory to be a horizontal line.
  • the upper edge and/or the lower edge of the conductive layer 4 of the bending region N2 are The shape of the zigzag or the wavy shape is sufficient to sufficiently improve the scalability and adaptability of the flexible display device provided by the embodiment of the present invention.
  • Fig. 7a is a schematic structural view showing a structure of a thin film transistor of a flexible display device according to a seventh embodiment of the present invention.
  • 7b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 7 of the present invention.
  • the gate electrode 1 of the thin film transistor structure may include a top gate 71 disposed over the channel layer 72 of the thin film transistor structure and a bottom gate 73 disposed under the channel layer 72.
  • the top gate 71 is provided with at least one through hole 711.
  • a projection 811 of the via 711 on the top gate 71 on a plane 82 parallel to the channel layer 72 is covered by a projection 83 of the bottom gate 73 on the plane 82.
  • the gate electrode 1 is designed to include a bottom gate 73 and a top gate 71 disposed on both sides of the channel layer 72, and the top gate 71 is provided with at least one through hole 711 and forms a complementary structure with the bottom gate 73.
  • the through holes on the top gate 71 can disperse the stress concentration generated when the gate electrode 1 is bent or deformed, enhance the bending resistance of the gate electrode 1, and can effectively prevent the bending or fracture failure of the thin film transistor structure. Meanwhile, since the top gate 71 and the bottom gate 73 form a complementary structure, although the top gate 71 has a via hole 711, the channel layer region corresponding to the via hole 711 of the top gate 71 is disposed in the channel layer region.
  • the gate electrode 1 provided with the top gate 71 and the bottom gate 73 complementarily disposed does not affect the performance parameters of the thin film transistor structure (for example, the aspect ratio of the thin film transistor structure).
  • the gate electrode 1 of the thin film transistor structure may include a top gate 71 disposed over the channel layer 72 of the thin film transistor structure and a bottom gate 73 disposed under the channel layer 72.
  • the bottom gate 73 is provided with at least one through hole 711.
  • a projection 811 of the via 711 on the bottom gate 73 on a plane 82 parallel to the channel layer 72 is covered by a projection 81 of the top gate 71 on a plane 82 parallel to the channel layer 72.
  • the structure of the gate electrode 1 provided by the embodiment of the present invention is not limited thereto, and the gate electrode 1 may be configured such that the top gate 71 and the bottom gate 73 are each provided with at least one through hole 711.
  • the projection 811 of the through hole 711 on the top gate 71 on the plane 82 parallel to the channel layer 72 is covered by the projection 83 of the bottom gate 73 on the plane 82, and the through hole 711 on the bottom gate 73 is in the channel Projection 811 on plane 82 parallel to layer 72 may be covered by projection 81 of top grid 71 on plane 82.
  • the present invention is described by way of example in which the through-holes 711 are disposed on the top gate 71.
  • the embodiment of the present invention does not specifically limit the through-holes 711 disposed on the top gate 71 or the bottom gate 73.
  • the shape of the projection 811 of the via 711 on the top gate 71 on the plane 82 parallel to the channel layer 72 may be parallel to the bottom gate 73 in the channel layer 72.
  • the shape of the projection 83 on the plane 82 is the same.
  • the projection 811 of the top gate 71 on the plane 82 parallel to the channel layer 72 and the projection 83 of the bottom gate 73 on the plane 82 parallel to the channel layer 72 are the smallest. Therefore, the performance of the thin film transistor structure can be improved to some extent.
  • the projection 811 of the top gate 71 on the plane 82 parallel to the channel layer 72 and the bottom gate 73 on the plane 82 parallel to the channel layer 72 are allowed in view of process variations and misalignment between the layers.
  • the projection 83 has an overlapping area.
  • the bottom gate insulating layer 731 may further include a hollow region or at least one opening, and the hollow region or the at least one opening may be filled with an organic material 732 to ensure the bottom gate insulating layer.
  • the flatness of the upper channel layer 72 is 731; at the same time, it is more advantageous to buffer the bending stress by filling the at least one opening with the organic material 732 having better bending resistance.
  • the top gate insulating layer 712 may also include a hollowed out region or at least one opening, and the hollowed out region or at least one of the openings may also be filled with the organic material 732.
  • the hollowed-out region of the bottom gate insulating layer 731 is shaped to be complementary to the bottom gate 73.
  • the shape of the hollow region of the top gate insulating layer 712 / the bottom gate insulating layer 731 or the position of the opening provided by the embodiment of the present invention is not limited to that shown in FIG. 7a, and the top gate insulating layer 712 is used in the embodiment of the present invention.
  • the shape of the hollow region of the bottom gate insulating layer 731 and the position and number of the openings are not particularly limited.
  • FIG. 7b shows that the number of the through holes 711 of the top gate 71 is one, the through holes 711 of the top gate 71 provided by the embodiment of the present invention may be plural.
  • the plurality of through holes 711 may be arranged in a row or a plurality of rows.
  • the number of the through holes 711 and the specific arrangement manner are not limited in the embodiment of the present invention.
  • the seventh and eighth embodiments of the present invention solve the display failure caused by stress concentration in the conventional thin film transistor structure during bending deformation by providing a recessed region in the gate electrode of the thin film transistor structure in the flexible display device. The problem.
  • FIG. 9 is a flow chart showing the fabrication of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 9 of the present invention.
  • a ninth embodiment of the present invention provides a method for fabricating a gate electrode of a thin film transistor structure, and the method for fabricating the gate electrode 1 may include:
  • S11 Making a bottom gate 73.
  • at least one through hole 711 is required to be formed on the bottom gate 73 when the bottom gate 73 is formed, and the projection of the through hole 711 on the plane 82 parallel to the channel layer 72 should be on the plane 82 of the top gate 71 which is subsequently prepared. Covered by the projection.
  • the bottom gate 73 can be fabricated on a substrate, and the material and internal structure of the substrate are not limited in the present invention.
  • a bottom gate insulating layer 731 and a channel layer 72 are sequentially formed over the bottom gate 73.
  • the bottom gate insulating layer 731 is used to form insulation between the bottom gate 73 and the channel layer 72.
  • a top gate insulating layer 712 and a top gate 71 are formed on the channel layer 72.
  • at least one through hole 711 can be formed on the top gate 71 when the top gate 71 is fabricated, and the projection of the through hole 711 on the plane 82 should be projected by the bottom gate 73 on the plane 82 parallel to the channel layer 72. cover.
  • the gate electrode 1 includes a bottom gate 73 and a top gate 71 disposed on both sides of the channel layer 72, and at least one through hole 711 is disposed on the top gate 71 and/or the bottom gate 73.
  • the top gate 71 and the bottom gate 73 form a complementary structure. This can enhance the bending resistance of the gate electrode 1 while ensuring the electrical properties of the thin film transistor structure.
  • FIG. 10 is a schematic diagram showing a bending line experimental data broken line of the flexible display device according to Embodiment 10 of the present invention.
  • the power line used in the bending performance experiment is a metal wire having a width of 500 ⁇ m, and the conductive layer is covered with no protective layer (ie, the non-AA area of the power supply line is the test portion, and the non-display area is).
  • the horizontal axis of the coordinate in FIG. 10 represents the through hole diameter of the power supply line
  • the vertical axis represents the bending endurance life of the power supply line.
  • a bending line of the bending performance experimental data shown in FIG. 10 is formed by testing the bending life of the unprotected power supply line at different apertures of the through hole.
  • the bending endurance life of the power supply line is approximately equal to the bending endurance life when the through hole aperture is 0 ⁇ m, and the through hole diameter of the power supply line is greater than 40 ⁇ m.
  • the bending life of the power cord increases linearly; when the through hole diameter of the power cord is equal to 50 ⁇ m, the bending life of the power cord is significantly higher than that of the through hole with a hole diameter of 0 ⁇ m.
  • the through hole diameter of the power supply line is less than 40 ⁇ m, since the through hole diameter is too small, the through hole itself may expand and break as a starting point of the crack, thereby reducing the stability of the flexible display device provided by the embodiment of the present invention, and thus the power supply.
  • the through hole diameter of the wire is less than 40 ⁇ m, the bending resistance of the flexible display device is poor.
  • the purpose of improving the bending life of the unprotected power line can be achieved by providing a through hole on the power line.
  • the a/w value of the power line uncovered layer area is greater than 0.1 so that the bending life of the unprotected power line can be significantly improved.
  • the power line width w 10 ⁇ m, and the power line is not covered by any other layer (such as an organic layer), the through hole aperture of the power line is higher than 0.8 ⁇ m, preferably, The pore diameter is higher than 1 ⁇ m.
  • the through holes formed on the power line can be replaced with blind holes to avoid the influence of the preparation process of the through holes on the performance of other structures of the flexible display device.
  • the flexible display device provided by the embodiment of the present invention may be a case where only a through hole or a blind hole is used, or a case where a through hole and a blind hole coexist.
  • the through hole or the blind hole may be a rectangular hole, a triangular hole, a trapezoidal hole, a diamond hole, a circular hole, an elliptical hole or an irregular hole, etc., when a through hole or a blind hole When it is a square hole or a circular hole, the aperture a is the side length or the diameter. When the through hole or the blind hole is an irregular hole, the aperture a is the shortest side or all the connections of all the sides of the irregular hole. The length of the shortest side of the side lines of the two sides.
  • the tenth embodiment of the present invention provides a through hole and/or a blind hole in a metal wire of a non-protective layer covering area in the flexible display device, and defines a ratio of a hole diameter and a hole hole diameter to a metal wire width ratio, The bending life of the metal wire in the unprotected layer coverage area is improved.
  • the power line used in the bending performance test is a metal wire having a width of 500 ⁇ m, and the conductive layer is covered with a protective layer (ie, the test portion is the AA area of the power supply line, the display area).
  • the horizontal axis of the coordinate in FIG. 11 represents the through hole diameter of the power supply line
  • the vertical axis represents the bending endurance life of the power supply line.
  • a bending line of the bending performance experimental data shown in FIG. 11 is formed by repeatedly testing the bending resistance life of the power line having the protective layer at different apertures of the through hole.
  • the bending endurance life of the power supply line is approximately equal to the bending endurance life when the through hole aperture is 0 ⁇ m, and the through hole diameter of the power supply line is less than 50 ⁇ m.
  • the flexural life of the power cord is higher than the flexural life of the through hole with a hole diameter of 0 ⁇ m; when the through hole diameter of the power cord is between 5 ⁇ m and 35 ⁇ m, the bending life of the power cord is significantly higher than the through hole diameter of 0 ⁇ m. The bending life of the time.
  • the a/w value of the power line covered by the protective layer region is less than 0.1, it is possible to improve the bending life of the power line having the protective layer by opening the through hole on the power line.
  • the a/w value of the power line covered by the protective layer region is in the range of 0.01-0.07, so that the bending life of the power line with the protective layer can be significantly improved.
  • the a/w value of the protective layer covered by the power line is in the range of 0.01-0.04 in order to increase the bending life of the protective layer power line by 500%.
  • the power line width w 400 ⁇ m
  • the power line has a pillar layer (ie, a protective layer) coated
  • the through hole aperture of the power line is less than 40 ⁇ m, so as to be able to pass the power supply.
  • a through hole is opened on the line to improve the bending life of the power line with the protective layer.
  • the power line width w 400 ⁇ m
  • the power line is coated with a pillar layer (ie, a protective layer)
  • the through hole aperture value ranges from 4 ⁇ m to 16 ⁇ m, so that the protective layer is powered.
  • the bending life of the wire is increased by 500%.
  • the through holes formed on the power line can be replaced with blind holes to avoid the performance of other structures of the flexible display device during the preparation process of the through holes. influences. That is to say, the flexible display device provided by the embodiment of the present invention may be a case where only a through hole or a blind hole is used, or a case where a through hole and a blind hole coexist.
  • the through hole or the blind hole may be a rectangular hole, a triangular hole, a trapezoidal hole, a diamond hole, a circular hole, an elliptical hole or an irregular hole, etc., when the through hole or the blind hole
  • the aperture a is a side length or a diameter.
  • the aperture a is the longest one of all the sides of the irregular hole or The length of the longest side of all the side lines connecting the two sides of the side.
  • the eleventh embodiment of the present invention provides a through hole and/or a blind hole in a metal wire having a protective layer covering area in the flexible display device, and defines a ratio of a hole diameter and a metal hole width ratio of the through hole and/or the blind hole The bending life of the metal wire having the protective layer coverage area is improved.
  • the flexible wire ie, power line
  • the flexible wire is applied to the anode and cathode structure to improve the bending life of the anode and cathode structures.

Abstract

A flexible display device and a manufacturing method therefor. The flexible display device comprises a flexible substrate (10) and an electrically conductive layer (110) formed on the flexible substrate. At least one recessed region (111) is arranged on the electrically conductive layer. Because of existence of the recessed region, the electrically conductive layer is free of cracks or is prevented from being broken in the process in which the flexible display device is bent or folded, thereby improving the quality and reliability of the electrically conductive layer when the electrically conductive layer is bent.

Description

柔性显示装置及其制造方法Flexible display device and method of manufacturing same 技术领域Technical field
本发明涉及显示技术,特别涉及一种柔性显示装置及其制造方法。The present invention relates to display technology, and in particular to a flexible display device and a method of fabricating the same.
发明背景Background of the invention
柔性显示装置是指显示面板可弯曲变形的显示装置,其包括柔性有机电致发光显示装置(OLED)、柔性电泳显示装置(EPD)、柔性液晶显示装置(LCD)等多种类型。作为新一代的显示器件,因其具有薄而轻、高对比度、快速响应、宽视角、高亮度、全彩色等优点,因此在手机、个人数字助理(PDA)、数码相机、车载显示、笔记本电脑、壁挂电视以及军事领域等具有十分广泛的应用前景。The flexible display device refers to a display device in which the display panel is bendable and deformable, and includes various types such as a flexible organic electroluminescence display device (OLED), a flexible electrophoretic display device (EPD), and a flexible liquid crystal display device (LCD). As a new generation of display devices, because of its thin, light, high contrast, fast response, wide viewing angle, high brightness, full color, etc., it is used in mobile phones, personal digital assistants (PDAs), digital cameras, car displays, notebook computers. , wall-mounted TV and military fields have a very broad application prospects.
柔性显示装置在弯曲或者折叠过程中,脆性的TFT(Thin Film Transistor,薄膜晶体管)极易发生断裂,断裂的TFT会影响柔性显示装置的显示效果或直接导致柔性显示装置无法正常工作。研究发现,脆性的TFT的断裂主要集中在屏体周边较粗的导电层上,特别是在导电层的柔性可折叠方向。In a flexible display device, a fragile TFT (Thin Film Transistor) is easily broken during bending or folding, and the broken TFT may affect the display effect of the flexible display device or directly cause the flexible display device to malfunction. It has been found that the brittle TFT cracks are mainly concentrated on the thicker conductive layer around the screen, especially in the flexible foldable direction of the conductive layer.
现有技术中针对易断裂的导电层有多种增强导电层力学可靠性的方案,比如:导电层打孔以释放应力;设置多层导电层,并利用接触孔使之相互连接;更换电极材料,如石墨烯、纳米银线等;降低导电层的宽度并提高导电层的平滑度。但是,上述现有的增强导电层力学可靠性的技术方案的效果均不理想。In the prior art, for the easily breakable conductive layer, there are various solutions for enhancing the mechanical reliability of the conductive layer, for example, the conductive layer is punched to release stress; the plurality of conductive layers are disposed, and the contact holes are used to connect them to each other; and the electrode material is replaced. Such as graphene, nano silver wire, etc.; reduce the width of the conductive layer and improve the smoothness of the conductive layer. However, the above-described conventional technical solutions for enhancing the mechanical reliability of the conductive layer are not satisfactory.
发明内容Summary of the invention
有鉴于此,本发明提供一种柔性显示装置及其制造方法,以解决现有技术中的柔性显示装置在弯曲或者折叠过程中,导电层容易产生裂纹甚至断裂的问题。In view of this, the present invention provides a flexible display device and a method of fabricating the same to solve the problem that the conductive layer is susceptible to cracking or even breakage during bending or folding of the flexible display device in the prior art.
第一方面,本发明一实施例提供一种柔性显示装置,柔性显示装置包括:柔性基底及形成于柔性基底上的导电层,导电层上设置有至少一个凹陷区域。In a first aspect, an embodiment of the present invention provides a flexible display device including: a flexible substrate and a conductive layer formed on the flexible substrate, wherein the conductive layer is provided with at least one recessed region.
在本发明一实施例中,导电层构成柔性基底上的电源线。In an embodiment of the invention, the conductive layer constitutes a power line on the flexible substrate.
在本发明一实施例中,凹陷区域的所有侧边中最长的一条侧边或者凹陷区域的连接侧边两点的侧边连线中最长的一条侧边连线与柔性显示装置的弯折方向一致。In an embodiment of the invention, the longest one of all the sides of the recessed area or the longest one of the side lines connecting the two sides of the recessed side and the curved side of the flexible display device The direction of the fold is the same.
在本发明一实施例中,凹陷区域包括通孔和/或盲孔。In an embodiment of the invention, the recessed area comprises a through hole and/or a blind hole.
在本发明一实施例中,导电层和柔性基底沿延展方向分为弯折区和非弯折区,至少一个凹陷区域设置在导电层的弯折区;其中,弯折区的导电层的厚度大于非弯折区的导电层的厚度。In an embodiment of the invention, the conductive layer and the flexible substrate are divided into a bending zone and a non-bending zone along the extending direction, and at least one recessed zone is disposed in the bending zone of the conductive layer; wherein the thickness of the conductive layer of the bending zone Greater than the thickness of the conductive layer of the non-bending zone.
在本发明一实施例中,导电层的弯折区的非延展方向的上边缘或下边缘与非弯折区的导电层的同一侧边缘共线。In an embodiment of the invention, the upper or lower edge of the non-stretching direction of the bend region of the conductive layer is collinear with the same side edge of the conductive layer of the non-bending region.
在本发明一实施例中,导电层的弯折区的非延展方向的上边缘和下边缘与非 弯折区的导电层的同一侧边缘均不共线。In an embodiment of the invention, the upper and lower edges of the non-stretching direction of the bend region of the conductive layer are not collinear with the same side edge of the conductive layer of the non-bending region.
在本发明一实施例中,柔性显示装置采用薄膜晶体管结构,其中导电层与柔性显示装置的源电极、漏电极、栅电极、阴极或阳极电性连接;或,导电层构成柔性显示装置的源电极、漏电极、栅电极、阴极或阳极。In an embodiment of the invention, the flexible display device adopts a thin film transistor structure, wherein the conductive layer is electrically connected to the source electrode, the drain electrode, the gate electrode, the cathode or the anode of the flexible display device; or the conductive layer constitutes a source of the flexible display device Electrode, drain electrode, gate electrode, cathode or anode.
在本发明一实施例中,柔性显示装置采用薄膜晶体管结构,导电层构成柔性显示装置的栅电极中的顶栅和/或底栅,栅电极包括:设置在薄膜晶体管结构的沟道层上方的顶栅;以及设置在沟道层下方的底栅;其中,顶栅上设置有至少一个凹陷区域,顶栅上的凹陷区域在与沟道层平行的平面上的投影被底栅在平面上的投影所覆盖;和/或,底栅上设置有至少一个凹陷区域,底栅上的凹陷区域在平面上的投影被顶栅在平面上的投影所覆盖。In an embodiment of the invention, the flexible display device adopts a thin film transistor structure, and the conductive layer constitutes a top gate and/or a bottom gate in a gate electrode of the flexible display device, and the gate electrode includes: disposed above the channel layer of the thin film transistor structure a top gate; and a bottom gate disposed under the channel layer; wherein the top gate is provided with at least one recessed region, and the projection of the recessed region on the top gate on a plane parallel to the channel layer is planarly on the plane Covered by the projection; and/or, the bottom gate is provided with at least one recessed area, and the projection of the recessed area on the bottom gate on the plane is covered by the projection of the top gate on the plane.
在本发明一实施例中,顶栅上的凹陷区域在平面上的投影形状和底栅在平面上的投影的形状相同;和/或,底栅上的凹陷区域在平面上的投影的形状和顶栅在平面上的投影的形状相同。In an embodiment of the invention, the projected shape of the recessed area on the top gate on the plane is the same as the projected shape of the bottom gate on the plane; and/or the projected shape of the recessed area on the bottom gate on the plane and The shape of the top grid projection on the plane is the same.
在本发明一实施例中,导电层的至少一个凹陷区域中填充有机材料。In an embodiment of the invention, at least one of the recessed regions of the conductive layer is filled with an organic material.
在本发明一实施例中,至少一个凹陷区域沿柔性显示装置的弯折线方向呈一行或多行设置。In an embodiment of the invention, the at least one recessed region is disposed in one or more rows along the direction of the bend line of the flexible display device.
在本发明一实施例中,多行设置的凹陷区域对齐排列或者交错排列。In an embodiment of the invention, the plurality of rows of recessed regions are aligned or staggered.
在本发明一实施例中,同一列的一个凹陷区域在线宽方向上的截面宽度或者同一列的多个凹陷区域在线宽方向上的截面宽度之和与导电层的线宽之比小于等于1/2。In an embodiment of the invention, the ratio of the cross-sectional width in the line width direction of one recessed region of the same column or the cross-sectional width in the line width direction of the plurality of recessed regions in the same column and the line width of the conductive layer is less than or equal to 1/. 2.
在本发明一实施例中,同一行中相邻两个凹陷区域之间的最小间距和与柔性显示装置的弯折方向一致的侧边或侧边连线之比大于等于1/2且小于等于2。In an embodiment of the invention, the ratio of the minimum spacing between two adjacent recessed regions in the same row and the side or side connecting lines consistent with the bending direction of the flexible display device is greater than or equal to 1/2 and less than or equal to 2.
在本发明一实施例中,至少一个凹陷区域所构成的形状在与柔性基底平行的平面或与柔性基底垂直的平面上的投影包括以下几种形状中的一种或多种的组合:矩形、三角形、梯形、菱形、圆形、椭圆形、正弦波形、麻花型和锯齿形。In an embodiment of the invention, the projection of the shape of the at least one recessed area on a plane parallel to the flexible substrate or a plane perpendicular to the flexible substrate comprises a combination of one or more of the following shapes: rectangle, Triangle, trapezoid, diamond, circle, ellipse, sinusoidal, twisted and zigzag.
在本发明一实施例中,包括设置于导电层上的保护层,导电层被保护层覆盖的凹陷区域的孔径与导电层的宽度之比小于0.1。In an embodiment of the invention, the protective layer is disposed on the conductive layer, and the ratio of the aperture of the recessed region covered by the protective layer to the width of the conductive layer is less than 0.1.
在本发明一实施例中,导电层的未被保护层覆盖的凹陷区域的孔径与导电层的宽度之比大于0.08。In an embodiment of the invention, the ratio of the aperture of the recessed region of the conductive layer not covered by the protective layer to the width of the conductive layer is greater than 0.08.
第二方面,本发明一实施例还提供一种柔性显示装置的制造方法,柔性显示装置的制造方法包括:形成柔性基底;确定电源线电阻需求;根据电源线电阻需求得到导电层的线宽及凹陷区域的数据;根据导电层的线宽及凹陷区域的数据在柔性基底上形成电源线。In a second aspect, an embodiment of the present invention further provides a method for manufacturing a flexible display device. The method for manufacturing a flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width of the conductive layer according to a power line resistance requirement Data of the recessed area; forming a power line on the flexible substrate according to the line width of the conductive layer and the data of the recessed area.
第三方面,本发明一实施例还提供一种柔性显示装置的制作方法,柔性显示装置为薄膜晶体管结构,薄膜晶体管结构的栅电极的制备方法包括:制作底栅;在底栅上方依次制作底栅绝缘层和沟道层;以及在沟道层上方依次制作顶栅绝缘层和顶栅;其中,顶栅上设置有至少一个凹陷区域,顶栅上的凹陷区域在与沟道层平行的平面上的投影被底栅在平面上的投影所覆盖;和/或,底栅上设置有至少一个凹陷区域,底栅上的凹陷区域在平面上的投影被顶栅在平面上的投影所覆盖。In a third aspect, an embodiment of the present invention further provides a method for fabricating a flexible display device. The flexible display device is a thin film transistor structure, and the method for preparing a gate electrode of the thin film transistor structure includes: fabricating a bottom gate; and sequentially forming a bottom on the bottom gate a gate insulating layer and a channel layer; and sequentially forming a top gate insulating layer and a top gate over the channel layer; wherein the top gate is provided with at least one recessed region, and the recessed region on the top gate is in a plane parallel to the channel layer The projection on the upper surface is covered by the projection of the bottom gate on the plane; and/or the bottom gate is provided with at least one recessed area, and the projection of the recessed area on the bottom gate on the plane is covered by the projection of the top gate on the plane.
本发明实施例提供的柔性显示装置包括柔性基底及形成于柔性基底上的导电 层,导电层上设置有至少一个凹陷区域。本发明实施例提供的柔性显示装置通过在柔性基底上设置导电层,并导电层上设置至少一个凹陷区域的方式避免了柔性显示装置在弯曲或者折叠过程中导电层产生裂纹或者断裂,提高了导电层在弯折时的质量与可靠性。A flexible display device according to an embodiment of the invention includes a flexible substrate and a conductive layer formed on the flexible substrate, and the conductive layer is provided with at least one recessed region. The flexible display device provided by the embodiment of the present invention prevents the conductive layer from being cracked or broken during the bending or folding process by providing a conductive layer on the flexible substrate and providing at least one recessed region on the conductive layer, thereby improving conductivity. The quality and reliability of the layer when it is bent.
附图简要说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是本发明实施例一的柔性显示装置的结构示意图。1 is a schematic structural view of a flexible display device according to a first embodiment of the present invention.
图2是本发明实施例二的柔性显示装置的结构示意图。2 is a schematic structural view of a flexible display device according to Embodiment 2 of the present invention.
图3是本发明实施例三的柔性显示装置的结构示意图。3 is a schematic structural view of a flexible display device according to a third embodiment of the present invention.
图4是本发明实施例四的柔性显示装置的结构示意图。4 is a schematic structural view of a flexible display device according to Embodiment 4 of the present invention.
图5是本发明实施例五的柔性显示装置的结构示意图。FIG. 5 is a schematic structural view of a flexible display device according to Embodiment 5 of the present invention.
图6是本发明实施例六的柔性显示装置的结构示意图。FIG. 6 is a schematic structural view of a flexible display device according to Embodiment 6 of the present invention.
图7a是本发明实施例七的柔性显示装置的薄膜晶体管结构的结构示意图。Fig. 7a is a schematic structural view showing a structure of a thin film transistor of a flexible display device according to a seventh embodiment of the present invention.
图7b是本发明实施例七的柔性显示装置的薄膜晶体管结构的栅电极的投影示意图。7b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 7 of the present invention.
图8a是本发明实施例八的柔性显示装置的薄膜晶体管结构的结构示意图。8a is a schematic structural view of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention.
图8b是本发明实施例八的柔性显示装置的薄膜晶体管结构的栅电极的投影示意图。8b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention.
图9是本发明实施例九的柔性显示装置的薄膜晶体管结构的栅电极的制作流程示意图。9 is a flow chart showing the fabrication of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 9 of the present invention.
图10是本发明实施例十的柔性显示装置的弯折性能实验数据折线示意图。FIG. 10 is a schematic diagram showing a bending line experimental data broken line of the flexible display device according to Embodiment 10 of the present invention.
图11是本发明实施例十一的柔性显示装置的弯折性能实验数据折线示意图。11 is a schematic diagram showing a bending line of experimental data of a flexible display device according to Embodiment 11 of the present invention.
实施本发明的方式Mode for carrying out the invention
为使本发明的目的、技术手段和优点更加清楚明白,以下结合附图对本发明作进一步详细说明。根据下面说明和权利要求书,本发明的优点和特征将更清楚。需说明的是,附图均采用非常简化的形式且均使用非精准的比例,仅用以方便、明晰地辅助说明本发明实施例的目的。In order to make the objects, technical means and advantages of the present invention more comprehensible, the present invention will be further described in detail below with reference to the accompanying drawings. Advantages and features of the present invention will be apparent from the description and appended claims. It should be noted that the drawings are in a very simplified form and all use non-precise proportions, and are only for convenience and clarity to assist the purpose of the embodiments of the present invention.
【实施例一】[Embodiment 1]
图1是本发明实施例一的柔性显示装置的结构示意图。如图1所示,柔性显示装置包括:柔性基底10及形成于柔性基底10上的电源线11;电源线11包括导电层110,导电层110上具有通孔111。通过通孔111可以分散电源线11弯折时产生的应力,从而避免柔性显示装置在弯曲或者折叠过程中电源线产生裂纹或者断裂,提高了电源线在弯折时的质量与可靠性。1 is a schematic structural view of a flexible display device according to a first embodiment of the present invention. As shown in FIG. 1, the flexible display device includes: a flexible substrate 10 and a power line 11 formed on the flexible substrate 10; the power line 11 includes a conductive layer 110 having a through hole 111 thereon. The through hole 111 can disperse the stress generated when the power cord 11 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
在本申请实施例中,导电层110的材料可以是铝金属、铜金属等金属材料;其也可以是多种金属材料复合而成的复合金属层;其还可以是氧化铟锡等透明材质导电层。导电层110所选材料只要达到能够导电的性质即可。In the embodiment of the present application, the material of the conductive layer 110 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide. Floor. The material selected for the conductive layer 110 is only required to be electrically conductive.
优选的,通孔111的所有侧边中最长的一条侧边或者通孔111的所有连接侧边两点的侧边连线中最长的一条侧边连线与电源线11的弯折方向一致。可以理解 的是,侧边是指通孔形状的任意一条边,侧边连线是指通孔的任意侧边上任意两点间的连线。在此,弯折方向指电源线11发生弯折的轴向,也即电源线11发生弯折时应力的传递方向;进一步的,电源线11的弯折方向与电源线11弯折时产生的弯折线垂直。例如,柔性显示装置的形状为长方形,弯折操作是沿着长边进行弯折,即两条短边逐渐靠近或者重叠,此时弯折方向即为长边所在的轴向。Preferably, the longest one of all the sides of the through hole 111 or the longest one of the side lines of the two sides of the connecting side of the through hole 111 and the bending direction of the power line 11 Consistent. It can be understood that the side refers to any side of the shape of the through hole, and the side line refers to the line between any two points on any side of the through hole. Here, the bending direction refers to the axial direction in which the power cord 11 is bent, that is, the direction in which the stress is transmitted when the power cord 11 is bent; further, the bending direction of the power cord 11 is generated when the power cord 11 is bent. The bend line is vertical. For example, the flexible display device has a rectangular shape, and the bending operation is performed along the long side, that is, the two short sides are gradually approached or overlapped, and the bending direction is the axial direction where the long side is located.
请继续参考图1,在本申请实施例中,通孔111的形状为长方形。进一步的,长方形通孔的长边(即最长的侧边)与所述电源线11的弯折方向一致,也即所述长方形通孔的长边与所述柔性显示装置的弯折方向一致由此,可以使得通孔111更好的分散电源线11弯折时产生的应力。Referring to FIG. 1 , in the embodiment of the present application, the through hole 111 has a rectangular shape. Further, the long side of the rectangular through hole (ie, the longest side) coincides with the bending direction of the power line 11, that is, the long side of the rectangular through hole is consistent with the bending direction of the flexible display device. Thereby, the through hole 111 can be made to better disperse the stress generated when the power supply line 11 is bent.
较佳的,每200μm~500μm宽度的导电层110上设置有一行通孔111,一行或者多行通孔111均匀的分布于导电层110上,由此,既能够保证一定的通孔数量,从而较好的分散电源线11弯折时产生的应力,又能够保证导电层110的质量与可靠性。例如,当导电层110的线宽小于500μm时,导电层110上具有一行通孔111;当导电层110的线宽大于等于500μm且小于1000μm时,导电层110上具有两行通孔111;当导电层110的线宽大于等于1000μm且小于1500μm时,导电层110上具有三行通孔111;当导电层110的线宽大于等于1500μm且小于2000μm时,导电层110上具有四行通孔111。进一步的,当导电层110具有更宽的线宽(大于2000μm)时,导电层110上还可以设置有更多行的通孔111。通过导电层110线宽与通孔111行数的合理选择与匹配,既能够提高电源线11的抗弯折能力,又能够使得电源线11具有较佳的导电能力。本实施例的通孔111的数量为7个,7个通孔111呈一行排列。Preferably, a row of through holes 111 is disposed on the conductive layer 110 having a width of 200 μm to 500 μm, and one or more rows of through holes 111 are evenly distributed on the conductive layer 110, thereby ensuring a certain number of through holes. The better stress generated when the power line 11 is bent is bent, and the quality and reliability of the conductive layer 110 can be ensured. For example, when the line width of the conductive layer 110 is less than 500 μm, the conductive layer 110 has a row of through holes 111; when the line width of the conductive layer 110 is greater than or equal to 500 μm and less than 1000 μm, the conductive layer 110 has two rows of through holes 111; When the line width of the conductive layer 110 is greater than or equal to 1000 μm and less than 1500 μm, the conductive layer 110 has three rows of through holes 111; when the line width of the conductive layer 110 is 1500 μm or more and less than 2000 μm, the conductive layer 110 has four rows of through holes 111. . Further, when the conductive layer 110 has a wider line width (greater than 2000 μm), more rows of through holes 111 may be disposed on the conductive layer 110. Through the reasonable selection and matching of the line width of the conductive layer 110 and the number of rows of the through holes 111, the bending resistance of the power line 11 can be improved, and the power line 11 can have better conductivity. The number of the through holes 111 in this embodiment is seven, and the seven through holes 111 are arranged in a line.
较佳的,同一列的一个通孔111在线宽方向上的截面宽度或者同一列的多个通孔111在线宽方向上的截面宽度之和与导电层110的线宽之比小于等于1/2。在本申请实施例中,即长方形通孔111的短边a1和导电层110的线宽a2之比小于等于1/2。进一步的,同一行中相邻两个通孔111之间的最小间距a3和最长的侧边或最长的侧边连线之比(在此即长方形通孔111的长边a4)大于等于1/2且小于等于2。由此,既能够提高电源线11的抗弯折能力,又能够使得电源线11具有较佳的导电能力。Preferably, the cross-sectional width of one through hole 111 of the same column in the line width direction or the sum of the cross-sectional widths of the plurality of through holes 111 in the same width in the line width direction and the line width of the conductive layer 110 is less than or equal to 1/2. . In the embodiment of the present application, the ratio of the short side a1 of the rectangular through hole 111 to the line width a2 of the conductive layer 110 is less than or equal to 1/2. Further, the ratio of the minimum spacing a3 between the adjacent two through holes 111 in the same row and the longest side or the longest side connecting line (here, the long side a4 of the rectangular through hole 111) is greater than or equal to 1/2 and less than or equal to 2. Thereby, the bending resistance of the power cord 11 can be improved, and the power cord 11 can be made to have better electrical conductivity.
相应的,本实施例还提供一种柔性显示装置的制造方法,柔性显示装置的制造方法包括:形成柔性基底;确定电源线电阻需求;根据电源线电阻需求得到导电层的线宽及通孔的数据;根据导电层的线宽及通孔的数据在柔性基底上形成电源线。其中,在柔性基底上形成电源线可以包括:先形成特定线宽的导线层(即根据电源线电阻需求得到的导电层的线宽),然后对导电层进行打孔(即根据电源线电阻需求得到的通孔的数据,如通孔形状、大小、行数与数量等对导电层进行打孔)。Correspondingly, the embodiment further provides a manufacturing method of the flexible display device. The manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via. Wherein, forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement) The obtained through hole data, such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
【实施例二】[Embodiment 2]
图2是本发明实施例二的柔性显示装置的结构示意图。如图2所示,柔性显示装置包括:柔性基底20及形成于柔性基底20上的电源线21;电源线21包括导电层210,导电层210上具有通孔211。通过通孔211可以分散电源线21弯折时产生的应力,从而避免柔性显示装置在弯曲或者折叠过程中电源线产生裂纹或 者断裂,提高了电源线在弯折时的质量与可靠性。2 is a schematic structural view of a flexible display device according to Embodiment 2 of the present invention. As shown in FIG. 2, the flexible display device includes: a flexible substrate 20 and a power line 21 formed on the flexible substrate 20; the power line 21 includes a conductive layer 210 having a through hole 211 therein. The through hole 211 can disperse the stress generated when the power cord 21 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
在本申请实施例中,导电层210的材料可以是铝金属、铜金属等金属材料;其也可以是多种金属材料复合而成的复合金属层;其还可以是氧化铟锡等透明材质导电层。导电层210所选材料只要达到能够导电的性质即可。In the embodiment of the present application, the material of the conductive layer 210 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer formed by compounding a plurality of metal materials; it may also be a transparent material such as indium tin oxide. Floor. The material selected for the conductive layer 210 is only required to be electrically conductive.
优选的,通孔211的所有侧边中最长的一条侧边或者通孔211的所有连接侧边两点的侧边连线中最长的一条侧边连线与电源线21的弯折方向一致。请继续参考图2,在本申请实施例中,通孔211的形状为椭圆形。进一步的,椭圆形通孔的长轴(即最长的侧边连线)与电源线21的弯折方向一致,也即椭圆形通孔的长轴与柔性显示装置的弯折方向一致,由此,可以使得通孔211更好的分散电源线21弯折时产生的应力。Preferably, the longest one of all the sides of the through hole 211 or the longest one of the side lines of the two sides of the connecting side of the through hole 211 and the bending direction of the power line 21 Consistent. With continued reference to FIG. 2, in the embodiment of the present application, the shape of the through hole 211 is elliptical. Further, the long axis of the elliptical through hole (ie, the longest side line) is consistent with the bending direction of the power line 21, that is, the long axis of the elliptical through hole is consistent with the bending direction of the flexible display device, Thereby, the through hole 211 can be made to better disperse the stress generated when the power source wire 21 is bent.
较佳的,每200μm-500μm宽度的导电层210上设置有一行通孔211,一行或者多行通孔211均匀的分布于导电层210上,由此,既能够保证一定的通孔数量,从而较好的分散电源线21弯折时产生的应力,又能够保证导电层210的质量与可靠性。在本申请实施例中,通孔211的数量为14个,14个通孔211呈多行排列(具体为两行排列),并且呈多行对齐排列。Preferably, a row of through holes 211 is disposed on the conductive layer 210 having a width of 200 μm to 500 μm, and one or more rows of through holes 211 are evenly distributed on the conductive layer 210, thereby ensuring a certain number of through holes. The better stress generated when the power line 21 is bent is bent, and the quality and reliability of the conductive layer 210 can be ensured. In the embodiment of the present application, the number of the through holes 211 is 14, and the 14 through holes 211 are arranged in a plurality of rows (specifically, arranged in two rows), and are arranged in a plurality of rows.
较佳的,同一列的一个通孔211在线宽方向上的截面宽度或者同一列的多个通孔211在线宽方向上的截面宽度之和与导电层210的线宽之比小于等于1/2。在本申请实施例中,即同一列的两个椭圆形通孔211的短轴b1之和2*b1(即同一列的多个通孔211在线宽方向上的最大截面宽度之和)和导电层210的线宽b2之比小于等于1/2。进一步的,同一行中相邻两个通孔211之间的最小间距b3和最长的侧边或最长的侧边连线之比(在此即椭圆形通孔211的长轴b4)大于等于1/2且小于等于2。由此,既能够提高电源线21的抗弯折能力,又能够使得电源线21具有较佳的导电能力。Preferably, the ratio of the cross-sectional width in the line width direction of one through hole 211 in the same row or the cross-sectional width in the line width direction of the plurality of through holes 211 in the same column to the line width of the conductive layer 210 is less than or equal to 1/2. . In the embodiment of the present application, the sum of the minor axes b1 of the two elliptical through holes 211 of the same column is 2*b1 (that is, the sum of the maximum cross-sectional widths of the plurality of through holes 211 of the same column in the line width direction) and the conductive The ratio of the line width b2 of the layer 210 is 1/2 or less. Further, the ratio of the minimum distance b3 between the adjacent two through holes 211 in the same row and the longest side or the longest side line (in this case, the long axis b4 of the elliptical through hole 211) is larger than Equal to 1/2 and less than or equal to 2. Thereby, the bending resistance of the power cord 21 can be improved, and the power cord 21 can be made to have better electrical conductivity.
相应的,本实施例还提供一种柔性显示装置的制造方法,柔性显示装置的制造方法包括:形成柔性基底;确定电源线电阻需求;根据电源线电阻需求得到导电层的线宽及通孔的数据;根据导电层的线宽及通孔的数据在柔性基底上形成电源线。其中,在柔性基底上形成电源线可以包括:先形成特定线宽的导线层(即根据电源线电阻需求得到的导电层的线宽),然后对导电层进行打孔(即根据电源线电阻需求得到的通孔的数据,如通孔的形状、大小、行数与数量等对导电层进行打孔)。Correspondingly, the embodiment further provides a manufacturing method of the flexible display device. The manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via. Wherein, forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement) The obtained through hole data, such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
【实施例三】[Embodiment 3]
图3是本发明实施例三的柔性显示装置的结构示意图。如图3所示,柔性显示装置包括:柔性基底30及形成于柔性基底30上的电源线31;电源线31包括导电层310,导电层310上具有通孔311。通过通孔311可以分散电源线31弯折时产生的应力,从而避免柔性显示装置在弯曲或者折叠过程中电源线产生裂纹或者断裂,提高了电源线在弯折时的质量与可靠性。3 is a schematic structural view of a flexible display device according to a third embodiment of the present invention. As shown in FIG. 3, the flexible display device includes a flexible substrate 30 and a power line 31 formed on the flexible substrate 30. The power line 31 includes a conductive layer 310 having a through hole 311 therein. The through hole 311 can disperse the stress generated when the power line 31 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power line when bent.
在本申请实施例中,导电层310的材料可以是铝金属、铜金属等金属材料;其也可以是多种金属材料复合而成的复合金属层;其还可以是氧化铟锡等透明材质导电层。导电层310所选材料只要达到能够导电的性质即可。In the embodiment of the present application, the material of the conductive layer 310 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide. Floor. The material selected for the conductive layer 310 may be of a conductive property.
优选的,通孔311的所有侧边中最长的一条侧边或者通孔311的所有连接侧 边两点的侧边连线中最长的一条侧边连线与电源线31的弯折方向一致。请继续参考图3,在本申请实施例中,通孔311的形状为椭圆形。进一步的,椭圆形通孔的长轴(即最长的侧边连线)与电源线31的弯折方向一致,也即椭圆形通孔的长轴与柔性显示装置的弯折方向一致,由此,可以使得通孔311更好的分散电源线31弯折时产生的应力。Preferably, the longest one of all the sides of the through hole 311 or the longest one of the side lines of the two sides of the connecting side of the through hole 311 and the bending direction of the power line 31 Consistent. Referring to FIG. 3, in the embodiment of the present application, the shape of the through hole 311 is elliptical. Further, the long axis of the elliptical through hole (ie, the longest side line) is consistent with the bending direction of the power line 31, that is, the long axis of the elliptical through hole is consistent with the bending direction of the flexible display device, Thereby, the through hole 311 can be made to better disperse the stress generated when the power source wire 31 is bent.
较佳的,每200μm-500μm宽度的导电层310上设置有一行通孔311,一行或者多行通孔311均匀的分布于导电层310上,由此,既能够保证一定的通孔数量,从而较好的分散电源线31弯折时产生的应力,又能够保证导电层310的质量与可靠性。在本申请实施例中,通孔311的数量为12个,12个通孔311呈多行排列(具体为两行排列),并且呈多行交错排列。Preferably, a row of through holes 311 is disposed on the conductive layer 310 having a width of 200 μm to 500 μm, and one or more rows of through holes 311 are evenly distributed on the conductive layer 310, thereby ensuring a certain number of through holes. The better stress generated when the power line 31 is bent is bent, and the quality and reliability of the conductive layer 310 can be ensured. In the embodiment of the present application, the number of the through holes 311 is twelve, and the twelve through holes 311 are arranged in a plurality of rows (specifically, two rows are arranged), and are arranged in a plurality of rows.
较佳的,同一列的一个通孔311在线宽方向上的截面宽度或者同一列的多个通孔311在线宽方向上的截面宽度之和与导电层310的线宽之比小于等于1/2。在本申请实施例中,当同一列中只有一个通孔311时,即一个通孔311在线宽方向上的截面宽度(在此为椭圆形通孔311的短轴c1)和导电层310的线宽c2之比小于等于1/2;或者,当同一列中有两个通孔311时,即两个通孔311在线宽方向上的截面宽度之和(在此为截面宽度c5与截面宽度c6之和)与导电层310的线宽c2之比小于等于1/2。进一步的,同一行中相邻两个通孔311之间的最小间距c3和最长的侧边或最长的侧边连线之比(在此即椭圆形通孔311的长轴c4)大于等于1/2且小于等于2。由此,既能够提高电源线31的抗弯折能力,又能够使得电源线31具有较佳的导电能力。Preferably, the ratio of the cross-sectional width in the line width direction of one through hole 311 of the same column or the cross-sectional width in the line width direction of the plurality of through holes 311 in the same column is less than or equal to 1/2 of the line width of the conductive layer 310. . In the embodiment of the present application, when there is only one through hole 311 in the same column, that is, the cross-sectional width of the through hole 311 in the line width direction (here, the short axis c1 of the elliptical through hole 311) and the line of the conductive layer 310. The ratio of the width c2 is less than or equal to 1/2; or, when there are two through holes 311 in the same column, that is, the sum of the cross-sectional widths of the two through holes 311 in the line width direction (here, the cross-sectional width c5 and the cross-sectional width c6) The sum of the sum and the line width c2 of the conductive layer 310 is 1/2 or less. Further, the ratio of the minimum pitch c3 between the adjacent two through holes 311 in the same row and the longest side or the longest side line (in this case, the long axis c4 of the elliptical through hole 311) is larger than Equal to 1/2 and less than or equal to 2. Thereby, the bending resistance of the power supply line 31 can be improved, and the power supply line 31 can have a better electrical conductivity.
相应的,本实施例还提供一种柔性显示装置的制造方法,柔性显示装置的制造方法包括:形成柔性基底;确定电源线电阻需求;根据电源线电阻需求得到导电层的线宽及通孔的数据;根据导电层的线宽及通孔的数据在柔性基底上形成电源线。其中,在柔性基底上形成电源线可以包括:先形成特定线宽的导线层(即根据电源线电阻需求得到的导电层的线宽),然后对导电层进行打孔(即根据电源线电阻需求得到的通孔的数据,如通孔的形状、大小、行数与数量等对导电层进行打孔)。Correspondingly, the embodiment further provides a manufacturing method of the flexible display device. The manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via. Wherein, forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement) The obtained through hole data, such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
【实施例四】[Embodiment 4]
图4是本发明实施例四的柔性显示装置的结构示意图。如图4所示,柔性显示装置包括:柔性基底40及形成于柔性基底40上的电源线41;电源线41包括导电层410,导电层410上具有通孔411。通过通孔411可以分散电源线41弯折时产生的应力,从而避免柔性显示装置在弯曲或者折叠过程中电源线产生裂纹或者断裂,提高了电源线在弯折时的质量与可靠性。4 is a schematic structural view of a flexible display device according to Embodiment 4 of the present invention. As shown in FIG. 4, the flexible display device includes a flexible substrate 40 and a power supply line 41 formed on the flexible substrate 40. The power supply line 41 includes a conductive layer 410 having a through hole 411 therein. The through hole 411 can disperse the stress generated when the power cord 41 is bent, thereby preventing the power line from being cracked or broken during the bending or folding process of the flexible display device, thereby improving the quality and reliability of the power cord when bent.
在本申请实施例中,导电层410的材料可以是铝金属、铜金属等金属材料;其也可以是多种金属材料复合而成的复合金属层;其还可以是氧化铟锡等透明材质导电层。导电层410所选材料只要达到能够导电的性质即可。In the embodiment of the present application, the material of the conductive layer 410 may be a metal material such as aluminum metal or copper metal; it may also be a composite metal layer composed of a plurality of metal materials; it may also be a transparent material such as indium tin oxide. Floor. The material selected for the conductive layer 410 is only required to be electrically conductive.
优选的,通孔411的所有侧边中最长的一条侧边或者通孔411的所有连接侧边两点的侧边连线中最长的一条侧边连线与电源线41的弯折方向一致。请继续参考图4,在本申请实施例中,通孔411的形状为菱形。进一步的,菱形通孔的长对角线(即最长的侧边连线)与电源线41的弯折方向一致,也即菱形通孔的长对 角线与柔性显示装置的弯折方向一致,由此,可以使得通孔411更好的分散电源线41弯折时产生的应力。Preferably, the longest one of all the sides of the through hole 411 or the longest one of the side lines of the two sides of the connecting side of the through hole 411 and the bending direction of the power line 41 Consistent. Referring to FIG. 4, in the embodiment of the present application, the shape of the through hole 411 is a diamond shape. Further, the long diagonal line of the diamond-shaped through hole (ie, the longest side line) is consistent with the bending direction of the power line 41, that is, the long diagonal line of the diamond-shaped through hole is consistent with the bending direction of the flexible display device. Thereby, the through hole 411 can be made to better disperse the stress generated when the power source wire 41 is bent.
较佳的,每200μm-500μm宽度的导电层410上设置有一行通孔411,一行或者多行通孔411均匀的分布于导电层410上,由此,既能够保证一定的通孔数量,从而较好的分散电源线41弯折时产生的应力,又能够保证导电层410的质量与可靠性。在此,通孔411的数量为一个,一个通孔411位于导电层410的中间位置。进一步的,同一列的一个通孔411在线宽方向上的截面宽度或者同一列的多个通孔411在线宽方向上的截面宽度之和与导电层410的线宽之比小于等于1/2。在本申请实施例中,即菱形通孔411的短对角线d1和导电层410的线宽d2之比小于等于1/2。由此,既能够提高电源线41的抗弯折能力,又能够使得电源线41具有较佳的导电能力。Preferably, a row of through holes 411 is disposed on the conductive layer 410 having a width of 200 μm to 500 μm, and one or more rows of through holes 411 are evenly distributed on the conductive layer 410, thereby ensuring a certain number of through holes. The better stress generated when the power line 41 is bent is bent, and the quality and reliability of the conductive layer 410 can be ensured. Here, the number of the through holes 411 is one, and one through hole 411 is located at an intermediate position of the conductive layer 410. Further, the ratio of the cross-sectional width in the line width direction of one through hole 411 of the same column or the cross-sectional width in the line width direction of the plurality of through holes 411 in the same column and the line width of the conductive layer 410 is 1/2 or less. In the embodiment of the present application, the ratio of the short diagonal line d1 of the rhombic through hole 411 to the line width d2 of the conductive layer 410 is 1/2 or less. Thereby, the bending resistance of the power supply line 41 can be improved, and the power supply line 41 can be made to have better electrical conductivity.
相应的,本实施例还提供一种柔性显示装置的制造方法,柔性显示装置的制造方法包括:形成柔性基底;确定电源线电阻需求;根据电源线电阻需求得到导电层的线宽及通孔的数据;根据导电层的线宽及通孔的数据在柔性基底上形成电源线。其中,在柔性基底上形成电源线可以包括:先形成特定线宽的导线层(即根据电源线电阻需求得到的导电层的线宽),然后对导电层进行打孔(即根据电源线电阻需求得到的通孔的数据,如通孔形状、大小、行数与数量等对导电层进行打孔)。Correspondingly, the embodiment further provides a manufacturing method of the flexible display device. The manufacturing method of the flexible display device includes: forming a flexible substrate; determining a power line resistance requirement; and obtaining a line width and a through hole of the conductive layer according to the power line resistance requirement. Data; a power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the via. Wherein, forming the power line on the flexible substrate may include: first forming a wire layer of a specific line width (ie, a line width of the conductive layer obtained according to the power line resistance requirement), and then punching the conductive layer (ie, according to the power line resistance requirement) The obtained through hole data, such as the shape, size, number of rows, and number of through holes, are used to punch the conductive layer.
在本发明提供的柔性显示装置中,通孔还可以为其他形状,例如圆形、正方形、不规则图形等,较佳的,通孔的形状为规则形状,从而便于根据电源线电阻需求得到通孔的数据,如通孔的具体形状、大小、行数与数量等进行生产制造。In the flexible display device provided by the present invention, the through hole may have other shapes, such as a circular shape, a square shape, an irregular shape, etc. Preferably, the shape of the through hole is a regular shape, thereby facilitating the passage of the power line resistance requirement. Hole data, such as the specific shape, size, number of rows and number of through holes, are manufactured.
应当理解,本发明实施例所提供的柔性显示装置的导电层上的通孔也可以为其他形状的凹陷区域(例如盲孔,通孔和盲孔混合的区域),本发明对该凹陷区域的具体形状不做限定。It should be understood that the through holes on the conductive layer of the flexible display device provided by the embodiments of the present invention may also be recessed regions of other shapes (for example, a blind hole, a region where the through hole and the blind hole are mixed), and the recessed region of the present invention The specific shape is not limited.
在本发明一实施例中,柔性显示装置采用薄膜晶体管结构,其中导电层与柔性显示装置的源电极、漏电极、栅电极、阴极或阳极电性连接;或者导电层构成柔性显示装置的源电极、漏电极、栅电极、阴极或阳极。由此可见,由于本发明实施例所提供的导电层上设有可分散弯折应力的凹陷区域,因此当该导电层构成了柔性显示装置的不同导电部分时,这些不同导电部分的抗弯折性能就会有所提高。然而本发明对该导电层构成了柔性显示装置的具体哪些部分并不做限定。In an embodiment of the invention, the flexible display device adopts a thin film transistor structure, wherein the conductive layer is electrically connected to the source electrode, the drain electrode, the gate electrode, the cathode or the anode of the flexible display device; or the conductive layer constitutes the source electrode of the flexible display device , drain electrode, gate electrode, cathode or anode. It can be seen that, since the conductive layer provided by the embodiment of the present invention is provided with a recessed region capable of dispersing bending stress, when the conductive layer constitutes different conductive portions of the flexible display device, the bending resistance of the different conductive portions is resisted. Performance will improve. However, the present invention does not limit the specific portion of the flexible display device that constitutes the conductive layer.
应当理解,本发明上述任一实施例提供的柔性显示装置的导电层的凹陷区域(例如通孔或盲孔)内均可填充有机材料,以有利于缓冲柔性显示装置的弯折应力。It should be understood that the recessed region (for example, a through hole or a blind hole) of the conductive layer of the flexible display device provided by any of the above embodiments of the present invention may be filled with an organic material to facilitate buffering the bending stress of the flexible display device.
在本发明一实施例中,至少一个凹陷区域所构成的形状在与柔性基底平行的平面或与柔性基底垂直的平面上的投影包括以下几种形状中的一种或多种的组合:矩形、三角形、梯形、菱形、圆形、椭圆形、正弦波形、麻花型和锯齿形。本发明实施例将凹陷区域设置为多种不同形状能够充分做到分散导电层应力的作用,从而进一步分散本发明实施例提供的柔性显示装置的应力影响。In an embodiment of the invention, the projection of the shape of the at least one recessed area on a plane parallel to the flexible substrate or a plane perpendicular to the flexible substrate comprises a combination of one or more of the following shapes: rectangle, Triangle, trapezoid, diamond, circle, ellipse, sinusoidal, twisted and zigzag. In the embodiment of the present invention, the recessed regions are disposed in a plurality of different shapes to fully disperse the stress of the conductive layer, thereby further dispersing the stress influence of the flexible display device provided by the embodiment of the present invention.
【实施例五】[Embodiment 5]
图5是本发明实施例五的柔性显示装置的结构示意图。如图5所示,本发明 第五实施例提供的柔性显示装置包括依次沿自上而下方向(如图5所示的自上而下方向)层叠排列的导电层4、绝缘层2和柔性基底3,沿自上而下方向层叠排列的导电层4、绝缘层2和柔性基底3被沿延展方向划分成弯折区N2和非弯折区N1,弯折区N2的导电层4的厚度大于非弯折区N1的导电层4的厚度,即弯折区N2的导电层4的下边缘(其中,下边缘为如图5所示的层叠设置方向的下边缘)和非弯折区N1的导电层4的下边缘(其中,下边缘为如图5所示的层叠设置方向的下边缘)处于同一水平线(即共线)上,弯折区N2的导电层4的上边缘(其中,上边缘为如图5所示的层叠设置方向的上边缘)沿水平方向低于非弯折区N1的导电层4的上边缘(其中,上边缘为如图5所示的层叠设置方向的上边缘)。FIG. 5 is a schematic structural view of a flexible display device according to Embodiment 5 of the present invention. As shown in FIG. 5, a flexible display device according to a fifth embodiment of the present invention includes a conductive layer 4, an insulating layer 2, and a flexible layer which are sequentially arranged in a top-down direction (from top to bottom as shown in FIG. 5). The substrate 3, the conductive layer 4, the insulating layer 2 and the flexible substrate 3 which are stacked in the top-down direction are divided into a bending zone N2 and a non-bending zone N1 in the extending direction, and the thickness of the conductive layer 4 of the bending zone N2 The thickness of the conductive layer 4 larger than the non-bending area N1, that is, the lower edge of the conductive layer 4 of the bending area N2 (where the lower edge is the lower edge of the stacking direction as shown in FIG. 5) and the non-bending area N1 The lower edge of the conductive layer 4 (where the lower edge is the lower edge of the stacking direction as shown in FIG. 5) is on the same horizontal line (ie, the collinear line), and the upper edge of the conductive layer 4 of the bent portion N2 (where The upper edge is an upper edge of the stacking direction as shown in FIG. 5) and is lower than the upper edge of the conductive layer 4 of the non-bending region N1 in the horizontal direction (wherein the upper edge is in the stacking direction as shown in FIG. 5) edge).
注意,本发明实施例中所提及的延展方向指的是水平方向,即图5所示的左右方向,非延展方向指的是垂直方向,即图5所示的上下方向。Note that the extension direction mentioned in the embodiment of the present invention refers to the horizontal direction, that is, the left-right direction shown in FIG. 5, and the non-extension direction refers to the vertical direction, that is, the up-and-down direction shown in FIG.
应当理解,本发明实施例提供的柔性显示装置亦可以不包括绝缘层2。It should be understood that the flexible display device provided by the embodiment of the present invention may not include the insulating layer 2.
本发明实施例的理论基础如下所述。The theoretical basis of the embodiment of the present invention is as follows.
改进前的导电层电阻为:The resistance of the conductive layer before the improvement is:
R1=ρL/S1   (1)R1=ρL/S1 (1)
在公式(1)中,S1=W*h1,W表示导电层宽度,L表示导电层长度,h1表示导电层厚度,S1表示导电层横截面面积,ρ表示导电层密度值,R1表示导电层电阻。In formula (1), S1=W*h1, W represents the width of the conductive layer, L represents the length of the conductive layer, h1 represents the thickness of the conductive layer, S1 represents the cross-sectional area of the conductive layer, ρ represents the density value of the conductive layer, and R1 represents the conductive layer. resistance.
改进后的导电层电阻为:The improved conductive layer resistance is:
Figure PCTCN2017116916-appb-000001
Figure PCTCN2017116916-appb-000001
在公式(2)中,横截面积S1=W*h1,S2=W*(h1+h2),S1=S3,S1<S2,L1表示弯折区的导电层长度,L2和L3表示加厚的非弯折区的导电层长度,L1+L2+L3=L,S1表示对应的弯折区的导电层横截面面积,S2和S3表示对应的加厚的非弯折区的导电层横截面面积。In formula (2), the cross-sectional area S1=W*h1, S2=W*(h1+h2), S1=S3, S1<S2, L1 represents the length of the conductive layer in the bending zone, and L2 and L3 represent thickening The length of the conductive layer of the non-bending zone, L1+L2+L3=L, S1 represents the cross-sectional area of the conductive layer of the corresponding bending zone, and S2 and S3 represent the cross-section of the conductive layer of the corresponding thickened non-bending zone area.
改进前后的电阻大小对比为:The comparison of the resistance before and after the improvement is:
Figure PCTCN2017116916-appb-000002
Figure PCTCN2017116916-appb-000002
在公式(3)中,L-L1>0,
Figure PCTCN2017116916-appb-000003
因此得出R1>R1′。
In formula (3), L-L1>0,
Figure PCTCN2017116916-appb-000003
Therefore, it is found that R1>R1'.
综上,通过上述分析可得出,增加厚度后,导电层的电阻可以有效地降低。In summary, it can be concluded from the above analysis that the electrical resistance of the conductive layer can be effectively reduced after the thickness is increased.
本发明第五实施例提供的柔性显示装置通过将柔性显示装置沿延展方向划分成弯折区和非弯折区,并设置弯折区的导电层厚度大于非弯折区的导电层的厚度的方式,实现了既降低柔性显示装置的导电层的电阻值又不影响柔性显示装置的弯折区的弯折性能的目的,为将柔性显示装置应用到大屏可折叠的移动终端提供了必要条件。The flexible display device according to the fifth embodiment of the present invention divides the flexible display device into a bending region and a non-bending region along the extending direction, and sets the thickness of the conductive layer of the bending region to be larger than the thickness of the conductive layer of the non-bending region. The method achieves the purpose of reducing the resistance value of the conductive layer of the flexible display device without affecting the bending performance of the bending region of the flexible display device, and provides a necessary condition for applying the flexible display device to the large-screen foldable mobile terminal. .
应当理解,在本发明第一实施例中,亦可以是弯折区N2的导电层4的上边缘(其中,上边缘为如图5所示的层叠设置方向的上边缘)和非弯折区N1的导电层4的上边缘(其中,上边缘为如图5所示的层叠设置方向的上边缘)处于同一水平线(即共线)上,弯折区N2的导电层4的下边缘(其中,下边缘为如图5所示的层叠设置方向的下边缘)在水平方向高于非弯折区N1的导电层4的下边缘(其中,下边缘为如图5所示的层叠设置方向的下边缘),从而达到弯折区N2的导电层4的厚度大于非弯折区N1的导电层4的厚度的目的,以充分增加本发明实施例提供的柔性显示装置的适应性和可扩展性。It should be understood that in the first embodiment of the present invention, the upper edge of the conductive layer 4 of the bending region N2 (where the upper edge is the upper edge of the stacking direction as shown in FIG. 5) and the non-bending region may also be used. The upper edge of the conductive layer 4 of N1 (wherein the upper edge is the upper edge of the stacking direction as shown in FIG. 5) is on the same horizontal line (ie, the collinear line), and the lower edge of the conductive layer 4 of the bent region N2 (where The lower edge is a lower edge of the stacking direction as shown in FIG. 5) the lower edge of the conductive layer 4 which is higher in the horizontal direction than the non-bending region N1 (wherein the lower edge is in the stacking direction as shown in FIG. 5) The purpose of the lower edge) to achieve the thickness of the conductive layer 4 of the bending region N2 is greater than the thickness of the conductive layer 4 of the non-bending region N1, so as to sufficiently increase the adaptability and expandability of the flexible display device provided by the embodiment of the present invention. .
此外,应当注意,弯折区N2和非弯折区N1具体设置范围以及设置点位可根据实际情况自由设置,本发明实施例在此不作限定。In addition, it should be noted that the specific setting range of the bending zone N2 and the non-bending zone N1 and the setting point can be freely set according to the actual situation, which is not limited herein.
优选地,将本发明实施例中的导电层4设置为金属层,以便导电层4能够更好地发挥导电作用。Preferably, the conductive layer 4 in the embodiment of the present invention is provided as a metal layer so that the conductive layer 4 can better exert a conductive effect.
应当理解,导电层4的材质亦可以设置为导电塑料或导电橡胶等材质,本发明对此不作限定。It should be understood that the material of the conductive layer 4 may be made of a conductive plastic or a conductive rubber, which is not limited in the present invention.
【实施例六】[Embodiment 6]
图6是本发明实施例六的柔性显示装置的结构示意图。在本发明第五实施例的基础上延伸出本发明第六实施例,本发明第六实施例与第五实施例基本相同,下面着重叙述不同之处,相同之处不再赘述。如图6所示,本发明第六实施例提供的柔性显示装置的非弯折区N1的导电层4的上边缘(其中,上边缘为如图6所示的层叠设置方向的上边缘)沿延展方向(即水平方向)高于弯折区N2的导电层4的上边缘(其中,上边缘为如图6所示的层叠设置方向的上边缘),并且非弯折区N1的导电层4的下边缘(其中,下边缘为如图6所示的层叠设置方向的下边缘)沿延展方向(即水平方向)低于弯折区N2的导电层4的下边缘(其中,下边缘为如图6所示的层叠设置方向的下边缘)。FIG. 6 is a schematic structural view of a flexible display device according to Embodiment 6 of the present invention. The sixth embodiment of the present invention is extended on the basis of the fifth embodiment of the present invention. The sixth embodiment of the present invention is substantially the same as the fifth embodiment. The differences will be described below, and the details are not described again. As shown in FIG. 6, the upper edge of the conductive layer 4 of the non-bending area N1 of the flexible display device according to the sixth embodiment of the present invention (wherein the upper edge is the upper edge of the stacked arrangement direction as shown in FIG. 6) The extending direction (ie, the horizontal direction) is higher than the upper edge of the conductive layer 4 of the bending region N2 (wherein the upper edge is the upper edge of the stacking direction as shown in FIG. 6), and the conductive layer 4 of the non-bending region N1 The lower edge (wherein the lower edge is the lower edge of the stacking direction as shown in FIG. 6) is lower in the extending direction (ie, the horizontal direction) than the lower edge of the conductive layer 4 of the bending region N2 (wherein the lower edge is as The lower edge of the stacking direction shown in Fig. 6).
本发明第六实施例提供的柔性显示装置通过将非弯折区N1的导电层4的上边缘设置为沿延展方向(即水平方向)高于弯折区N2的导电层4的上边缘、将非弯折区N1的导电层4的下边缘设置为沿延展方向(即水平方向)低于弯折区N2的导电层4的下边缘的方式,即从非弯折区N1的导电层4的非延展方向(即垂直方向)两端分别增加非弯折区N1的导电层4的厚度的方式,更好地实现了既降低柔性显示装置的导电层4的电阻值又不影响柔性显示装置的弯折区N2的弯折性能的目的。The flexible display device according to the sixth embodiment of the present invention provides that the upper edge of the conductive layer 4 of the non-bending region N1 is set to be higher than the upper edge of the conductive layer 4 of the bending region N2 in the extending direction (ie, the horizontal direction). The lower edge of the conductive layer 4 of the non-bending region N1 is disposed in a manner that is shorter than the lower edge of the conductive layer 4 of the bending region N2 in the extending direction (ie, the horizontal direction), that is, the conductive layer 4 from the non-bending region N1. The manner of increasing the thickness of the conductive layer 4 of the non-bending area N1 at both ends of the non-extension direction (ie, the vertical direction) respectively achieves better reduction of the resistance value of the conductive layer 4 of the flexible display device without affecting the flexible display device. The purpose of the bending performance of the bending zone N2.
应当理解,本发明上述实施例描述的柔性显示装置的非弯折区N1的导电层4的上边缘和/或下边缘和对应的弯折区N2的导电层4的上边缘和/或下边缘处于同一水平线的情况中,非弯折区N1的导电层4的上边缘和/或下边缘和对应的弯折区N2的导电层4的上边缘和/或下边缘亦可以只需共线就好,并不强制要求是水平线。It should be understood that the upper edge and/or the lower edge of the conductive layer 4 of the non-bending region N1 of the flexible display device described in the above embodiment of the present invention and the upper edge and/or the lower edge of the conductive layer 4 of the corresponding bent region N2. In the case of the same horizontal line, the upper edge and/or the lower edge of the conductive layer 4 of the non-bending area N1 and the upper edge and/or the lower edge of the conductive layer 4 of the corresponding bending area N2 may also be collinear. Ok, it is not mandatory to be a horizontal line.
在本发明一实施例中,弯折区N2的导电层4的上边缘和/或下边缘(其中,上边缘和下边缘为如图6所示的层叠设置方向的上边缘和下边缘)为锯齿形或波浪形等形状,以充分提高本发明实施例提供的柔性显示装置的可扩展性和适应性。In an embodiment of the present invention, the upper edge and/or the lower edge of the conductive layer 4 of the bending region N2 (where the upper edge and the lower edge are the upper and lower edges of the stacking direction as shown in FIG. 6) are The shape of the zigzag or the wavy shape is sufficient to sufficiently improve the scalability and adaptability of the flexible display device provided by the embodiment of the present invention.
【实施例七和实施例八】[Embodiment 7 and Embodiment 8]
图7a是本发明实施例七的柔性显示装置的薄膜晶体管结构的结构示意图。图7b是本发明实施例七的柔性显示装置的薄膜晶体管结构的栅电极的投影示意图。如图7a所示,薄膜晶体管结构的栅电极1可包括设置在薄膜晶体管结构的沟道层72上方的顶栅71以及设置在沟道层72下方的底栅73。其中,顶栅71上设置有至少一个通孔711。参考图7b,顶栅71上的通孔711在与沟道层72平行的平面82上的投影811被底栅73在平面82上的投影83所覆盖。Fig. 7a is a schematic structural view showing a structure of a thin film transistor of a flexible display device according to a seventh embodiment of the present invention. 7b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 7 of the present invention. As shown in FIG. 7a, the gate electrode 1 of the thin film transistor structure may include a top gate 71 disposed over the channel layer 72 of the thin film transistor structure and a bottom gate 73 disposed under the channel layer 72. The top gate 71 is provided with at least one through hole 711. Referring to FIG. 7b, a projection 811 of the via 711 on the top gate 71 on a plane 82 parallel to the channel layer 72 is covered by a projection 83 of the bottom gate 73 on the plane 82.
栅电极1被设计成包括设置在沟道层72两侧的底栅73与顶栅71,顶栅71设置至少一个通孔711,并与底栅73形成互补结构。顶栅71上的通孔可以分散栅电极1发生弯折或变形时产生的应力集中,增强栅电极1的抗折弯性能,可有效防止薄膜晶体管结构的折弯或断裂失效。同时,由于顶栅71和底栅73形成了互补式结构,虽然顶栅71上有通孔711,但是顶栅71的通孔711所对应的沟道层区域的被设置在该沟道层区域下方的底栅73所覆盖,沟道层72中仍然是可以形成连续的导电沟道。因此,采用顶栅71和底栅73互补设置的栅电极1不会影响薄膜晶体管结构的性能参数(例如:薄膜晶体管结构的长宽比)。The gate electrode 1 is designed to include a bottom gate 73 and a top gate 71 disposed on both sides of the channel layer 72, and the top gate 71 is provided with at least one through hole 711 and forms a complementary structure with the bottom gate 73. The through holes on the top gate 71 can disperse the stress concentration generated when the gate electrode 1 is bent or deformed, enhance the bending resistance of the gate electrode 1, and can effectively prevent the bending or fracture failure of the thin film transistor structure. Meanwhile, since the top gate 71 and the bottom gate 73 form a complementary structure, although the top gate 71 has a via hole 711, the channel layer region corresponding to the via hole 711 of the top gate 71 is disposed in the channel layer region. Covered by the lower bottom gate 73, a continuous conductive channel can still be formed in the channel layer 72. Therefore, the gate electrode 1 provided with the top gate 71 and the bottom gate 73 complementarily disposed does not affect the performance parameters of the thin film transistor structure (for example, the aspect ratio of the thin film transistor structure).
图8a是本发明实施例八的柔性显示装置的薄膜晶体管结构的结构示意图。图8b是本发明实施例八的柔性显示装置的薄膜晶体管结构的栅电极的投影示意图。参考图8a和图8b,薄膜晶体管结构的栅电极1可包括设置在薄膜晶体管结构的沟道层72上方的顶栅71以及设置在沟道层72下方的底栅73。其中,底栅73上设置有至少一个通孔711。参考图8b,底栅73上的通孔711在与沟道层72平行的平面82上的投影811被顶栅71在与沟道层72平行的平面82上的投影81所覆盖。8a is a schematic structural view of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention. 8b is a schematic view showing the projection of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 8 of the present invention. Referring to FIGS. 8a and 8b, the gate electrode 1 of the thin film transistor structure may include a top gate 71 disposed over the channel layer 72 of the thin film transistor structure and a bottom gate 73 disposed under the channel layer 72. The bottom gate 73 is provided with at least one through hole 711. Referring to FIG. 8b, a projection 811 of the via 711 on the bottom gate 73 on a plane 82 parallel to the channel layer 72 is covered by a projection 81 of the top gate 71 on a plane 82 parallel to the channel layer 72.
然而,应当理解本发明实施例提供的栅电极1的结构不限于此,栅电极1的结构还可以是顶栅71和底栅73均设置有至少一个通孔711。只要顶栅71上的通孔711在与沟道层72平行的平面82上的投影811被底栅73在平面82上的投影83所覆盖,并且底栅73上的通孔711在与沟道层72平行的平面82上的投影811被顶栅71在平面82上的投影81所覆盖即可。在后续的实施例中,本发明仅仅以通孔711设置在顶栅71为例进行阐述,然而本发明实施例对通孔711设置在顶栅71还是底栅73上不做具体限定。However, it should be understood that the structure of the gate electrode 1 provided by the embodiment of the present invention is not limited thereto, and the gate electrode 1 may be configured such that the top gate 71 and the bottom gate 73 are each provided with at least one through hole 711. As long as the projection 811 of the through hole 711 on the top gate 71 on the plane 82 parallel to the channel layer 72 is covered by the projection 83 of the bottom gate 73 on the plane 82, and the through hole 711 on the bottom gate 73 is in the channel Projection 811 on plane 82 parallel to layer 72 may be covered by projection 81 of top grid 71 on plane 82. In the following embodiments, the present invention is described by way of example in which the through-holes 711 are disposed on the top gate 71. However, the embodiment of the present invention does not specifically limit the through-holes 711 disposed on the top gate 71 or the bottom gate 73.
继续参考图7a和图7b,在一个实施例中,顶栅71上的通孔711在与沟道层72平行的平面82上的投影811的形状可与底栅73在与沟道层72平行的平面82上的投影83的形状相同。此时,顶栅71在与沟道层72平行的平面82上的投影811与底栅73在与沟道层72平行的平面82上的投影83重叠区域最小。因此,薄膜晶体管结构的性能可得到一定程度的提高。然而应当理解,考虑到工艺偏差以及层间有错位的情况,允许顶栅71在与沟道层72平行的平面82上的投影811与底栅73在与沟道层72平行的平面82上的投影83有重叠区域。With continued reference to FIGS. 7a and 7b, in one embodiment, the shape of the projection 811 of the via 711 on the top gate 71 on the plane 82 parallel to the channel layer 72 may be parallel to the bottom gate 73 in the channel layer 72. The shape of the projection 83 on the plane 82 is the same. At this time, the projection 811 of the top gate 71 on the plane 82 parallel to the channel layer 72 and the projection 83 of the bottom gate 73 on the plane 82 parallel to the channel layer 72 are the smallest. Therefore, the performance of the thin film transistor structure can be improved to some extent. It should be understood, however, that the projection 811 of the top gate 71 on the plane 82 parallel to the channel layer 72 and the bottom gate 73 on the plane 82 parallel to the channel layer 72 are allowed in view of process variations and misalignment between the layers. The projection 83 has an overlapping area.
在一进一步实施例中,如图8a所示,底栅绝缘层731可进一步包括镂空区域或至少一个开孔,该镂空区域或至少一个开孔中可填充有机材料732,以保证底栅绝缘层731上方沟道层72的平整度;同时,通过在该至少一个开孔中填入抗弯折性能更好的有机材料732也会更有利于缓冲弯折应力。然而应当理解,顶栅绝缘层712也可包括镂空区域或至少一个开孔,该镂空区域或至少一个开孔中也可 填充有机材料732。虽然在图8a所示的实施例中,底栅绝缘层731的镂空区域的形状正好与底栅73互补。然而应当理解,本发明实施例所提供的顶栅绝缘层712/底栅绝缘层731的镂空区域的形状或开孔的位置并不仅限于图7a所示,本发明实施例对顶栅绝缘层712/底栅绝缘层731的镂空区域的形状以及开孔的位置和数量不做具体限定。In a further embodiment, as shown in FIG. 8a, the bottom gate insulating layer 731 may further include a hollow region or at least one opening, and the hollow region or the at least one opening may be filled with an organic material 732 to ensure the bottom gate insulating layer. The flatness of the upper channel layer 72 is 731; at the same time, it is more advantageous to buffer the bending stress by filling the at least one opening with the organic material 732 having better bending resistance. It should be understood, however, that the top gate insulating layer 712 may also include a hollowed out region or at least one opening, and the hollowed out region or at least one of the openings may also be filled with the organic material 732. Although in the embodiment shown in FIG. 8a, the hollowed-out region of the bottom gate insulating layer 731 is shaped to be complementary to the bottom gate 73. However, it should be understood that the shape of the hollow region of the top gate insulating layer 712 / the bottom gate insulating layer 731 or the position of the opening provided by the embodiment of the present invention is not limited to that shown in FIG. 7a, and the top gate insulating layer 712 is used in the embodiment of the present invention. The shape of the hollow region of the bottom gate insulating layer 731 and the position and number of the openings are not particularly limited.
尽管图7b示出了顶栅71的通孔711的数量是一个,然而本发明实施例提供的顶栅71的通孔711还可以多个,当顶栅71设置有多个通孔711时,多个通孔711可呈一行或几行排列,本发明实施例对通孔711的数量以及具体排布方式不做限定。Although FIG. 7b shows that the number of the through holes 711 of the top gate 71 is one, the through holes 711 of the top gate 71 provided by the embodiment of the present invention may be plural. When the top gate 71 is provided with a plurality of through holes 711, The plurality of through holes 711 may be arranged in a row or a plurality of rows. The number of the through holes 711 and the specific arrangement manner are not limited in the embodiment of the present invention.
综上可知,本发明第七和第八实施例通过在柔性显示装置中的薄膜晶体管结构的栅电极设置凹陷区域,解决了现有薄膜晶体管结构在折弯变形时,由于应力集中导致的显示失效的问题。In summary, the seventh and eighth embodiments of the present invention solve the display failure caused by stress concentration in the conventional thin film transistor structure during bending deformation by providing a recessed region in the gate electrode of the thin film transistor structure in the flexible display device. The problem.
【实施例九】[Embodiment 9]
图9是本发明实施例九的柔性显示装置的薄膜晶体管结构的栅电极的制作流程示意图。如图9所示,本发明第九实施例提供了一种薄膜晶体管结构的栅电极的制作方法,该制备栅电极1的方法可包括:9 is a flow chart showing the fabrication of a gate electrode of a thin film transistor structure of a flexible display device according to Embodiment 9 of the present invention. As shown in FIG. 9, a ninth embodiment of the present invention provides a method for fabricating a gate electrode of a thin film transistor structure, and the method for fabricating the gate electrode 1 may include:
S11:制作底栅73。其中,在制作底栅73时需要在底栅73上制备至少一个通孔711,通孔711在与沟道层72平行的平面82上的投影应被后续制备的顶栅71在平面82上的投影所覆盖。应当理解,底栅73可被制备在一个衬底上,本发明对该衬底的材质和内部结构不做限定。S11: Making a bottom gate 73. Wherein, at least one through hole 711 is required to be formed on the bottom gate 73 when the bottom gate 73 is formed, and the projection of the through hole 711 on the plane 82 parallel to the channel layer 72 should be on the plane 82 of the top gate 71 which is subsequently prepared. Covered by the projection. It should be understood that the bottom gate 73 can be fabricated on a substrate, and the material and internal structure of the substrate are not limited in the present invention.
S12:在底栅73上方依次制作底栅绝缘层731和沟道层72。底栅绝缘层731用于形成底栅73与沟道层72之间的绝缘。S12: A bottom gate insulating layer 731 and a channel layer 72 are sequentially formed over the bottom gate 73. The bottom gate insulating layer 731 is used to form insulation between the bottom gate 73 and the channel layer 72.
S13:在沟道层72上制作顶栅绝缘层712和顶栅71。其中,在制作顶栅71时可在顶栅71上制备至少一个通孔711,通孔711在与平面82上的投影应被底栅73在与沟道层72平行的平面82上的投影所覆盖。S13: A top gate insulating layer 712 and a top gate 71 are formed on the channel layer 72. Wherein, at least one through hole 711 can be formed on the top gate 71 when the top gate 71 is fabricated, and the projection of the through hole 711 on the plane 82 should be projected by the bottom gate 73 on the plane 82 parallel to the channel layer 72. cover.
通过本实施例提供的栅电极1的制作方法,栅电极1包括设置在沟道层72两侧的底栅73与顶栅71,顶栅71和/或底栅73上设置至少一个通孔711,顶栅71与底栅73形成互补结构。这样可以增强栅电极1的抗折弯性能,并同时保证薄膜晶体管结构的电学性能。Through the manufacturing method of the gate electrode 1 provided in this embodiment, the gate electrode 1 includes a bottom gate 73 and a top gate 71 disposed on both sides of the channel layer 72, and at least one through hole 711 is disposed on the top gate 71 and/or the bottom gate 73. The top gate 71 and the bottom gate 73 form a complementary structure. This can enhance the bending resistance of the gate electrode 1 while ensuring the electrical properties of the thin film transistor structure.
【实施例十】[Embodiment 10]
图10是本发明实施例十的柔性显示装置的弯折性能实验数据折线示意图。本发明第十实施例进行弯折性能实验时采用的电源线为宽度500μm的金属线、其导电层无保护层覆盖(即测试部分为电源线的非AA区,非显示区域)。如图10所示,图10中的坐标横轴表示电源线的通孔孔径,坐标纵轴表示电源线的耐弯折寿命。本发明实施例的弯折性能实验中,通过多次测试无保护层的电源线在通孔的不同孔径下的耐弯折寿命,形成了图10所示的弯折性能实验数据折线示意图。FIG. 10 is a schematic diagram showing a bending line experimental data broken line of the flexible display device according to Embodiment 10 of the present invention. In the tenth embodiment of the present invention, the power line used in the bending performance experiment is a metal wire having a width of 500 μm, and the conductive layer is covered with no protective layer (ie, the non-AA area of the power supply line is the test portion, and the non-display area is). As shown in FIG. 10, the horizontal axis of the coordinate in FIG. 10 represents the through hole diameter of the power supply line, and the vertical axis represents the bending endurance life of the power supply line. In the bending performance experiment of the embodiment of the present invention, a bending line of the bending performance experimental data shown in FIG. 10 is formed by testing the bending life of the unprotected power supply line at different apertures of the through hole.
通过分析图10可得知,电源线的通孔孔径等于40μm时,电源线的耐弯折寿命约等于通孔孔径为0μm时的耐弯折寿命,并且电源线的通孔孔径大于40μm后,电源线的耐弯折寿命呈直线上升趋势;电源线的通孔孔径等于50μm时,电源线的耐弯折寿命明显高于通孔孔径为0μm时的耐弯折寿命。It can be seen from analysis of FIG. 10 that when the through hole diameter of the power supply line is equal to 40 μm, the bending endurance life of the power supply line is approximately equal to the bending endurance life when the through hole aperture is 0 μm, and the through hole diameter of the power supply line is greater than 40 μm. The bending life of the power cord increases linearly; when the through hole diameter of the power cord is equal to 50 μm, the bending life of the power cord is significantly higher than that of the through hole with a hole diameter of 0 μm.
此外,电源线的通孔孔径小于40μm时,由于通孔孔径过小,通孔本身可能作为裂纹的起始点发生扩展并断裂,从而降低本发明实施例提供的柔性显示装置的稳定性,因此电源线的通孔孔径小于40μm时柔性显示装置的耐弯折性能较差。In addition, when the through hole diameter of the power supply line is less than 40 μm, since the through hole diameter is too small, the through hole itself may expand and break as a starting point of the crack, thereby reducing the stability of the flexible display device provided by the embodiment of the present invention, and thus the power supply. When the through hole diameter of the wire is less than 40 μm, the bending resistance of the flexible display device is poor.
由于电源线的宽度w=500μm,通过分析图10可得知,当a=40μm时,a/w=0.08;当a=50μm时,a/w=0.1。Since the width of the power supply line is w = 500 μm, it can be seen from analysis of Fig. 10 that a/w = 0.08 when a = 40 μm and a / w = 0.1 when a = 50 μm.
综上可知,电源线无保护层区域覆盖的a/w值大于0.08时,能够实现通过在电源线上开设通孔的方式来提高无保护层的电源线的耐弯折寿命的目的。In summary, when the a/w value of the unprotected layer area of the power line is greater than 0.08, the purpose of improving the bending life of the unprotected power line can be achieved by providing a through hole on the power line.
优选地,使电源线无保护层区域覆盖的a/w值大于0.1,以便能够显著提高无保护层的电源线的耐弯折寿命。Preferably, the a/w value of the power line uncovered layer area is greater than 0.1 so that the bending life of the unprotected power line can be significantly improved.
举例说明,在本发明一实施例中,电源线宽度w=10μm,电源线上无任何其他层(如有机层等)覆盖,则电源线上的通孔孔径高于0.8μm,优选地,通孔孔径高于1μm。For example, in an embodiment of the invention, the power line width w=10 μm, and the power line is not covered by any other layer (such as an organic layer), the through hole aperture of the power line is higher than 0.8 μm, preferably, The pore diameter is higher than 1 μm.
应当理解,在本发明实施例十中所描述的柔性显示装置中,电源线上开设的通孔均可替换为盲孔,以避免通孔的制备过程对柔性显示装置的其他结构的性能产生影响。也就是说,本发明实施例提供的柔性显示装置中既可以是只有通孔或盲孔的情况,又可以是通孔和盲孔共存的情况。It should be understood that in the flexible display device described in Embodiment 10 of the present invention, the through holes formed on the power line can be replaced with blind holes to avoid the influence of the preparation process of the through holes on the performance of other structures of the flexible display device. . That is to say, the flexible display device provided by the embodiment of the present invention may be a case where only a through hole or a blind hole is used, or a case where a through hole and a blind hole coexist.
应当理解,在本发明实施例十中,通孔或盲孔可以为矩形孔、三角形孔、梯形孔、菱形孔、圆形孔、椭圆形孔或不规则形孔等,当通孔或盲孔为正方形孔或圆形孔时,孔径a为边长或直径,当通孔或盲孔为不规则形孔时,孔径a为不规则形孔的所有侧边中最短的一条侧边或所有连接侧边两点的侧边连线中最短的一条侧边的长度。It should be understood that in the tenth embodiment of the present invention, the through hole or the blind hole may be a rectangular hole, a triangular hole, a trapezoidal hole, a diamond hole, a circular hole, an elliptical hole or an irregular hole, etc., when a through hole or a blind hole When it is a square hole or a circular hole, the aperture a is the side length or the diameter. When the through hole or the blind hole is an irregular hole, the aperture a is the shortest side or all the connections of all the sides of the irregular hole. The length of the shortest side of the side lines of the two sides.
本发明第十实施例通过在柔性显示装置中的无保护层覆盖区域的金属线上开设通孔和/或盲孔,并限定通孔和/或盲孔的孔径与金属线宽度比值的方式,提高了无保护层覆盖区域的金属线的耐弯折寿命。The tenth embodiment of the present invention provides a through hole and/or a blind hole in a metal wire of a non-protective layer covering area in the flexible display device, and defines a ratio of a hole diameter and a hole hole diameter to a metal wire width ratio, The bending life of the metal wire in the unprotected layer coverage area is improved.
【实施例十一】[Embodiment 11]
图11是本发明实施例十一的柔性显示装置的弯折性能实验数据折线示意图。本发明第十一实施例进行弯折性能实验时采用的电源线为宽度500μm的金属线、其导电层有保护层覆盖(即测试部分为电源线的AA区,显示区域)。如图11所示,图11中的坐标横轴表示电源线的通孔孔径,坐标纵轴表示电源线的耐弯折寿命。本发明实施例的弯折性能实验中,通过多次测试有保护层的电源线在通孔的不同孔径下的耐弯折寿命,形成了图11所示的弯折性能实验数据折线示意图。11 is a schematic diagram showing a bending line of experimental data of a flexible display device according to Embodiment 11 of the present invention. In the eleventh embodiment of the present invention, the power line used in the bending performance test is a metal wire having a width of 500 μm, and the conductive layer is covered with a protective layer (ie, the test portion is the AA area of the power supply line, the display area). As shown in FIG. 11, the horizontal axis of the coordinate in FIG. 11 represents the through hole diameter of the power supply line, and the vertical axis represents the bending endurance life of the power supply line. In the bending performance experiment of the embodiment of the present invention, a bending line of the bending performance experimental data shown in FIG. 11 is formed by repeatedly testing the bending resistance life of the power line having the protective layer at different apertures of the through hole.
通过分析图11可得知,电源线的通孔孔径等于50μm时,电源线的耐弯折寿命约等于通孔孔径为0μm时的耐弯折寿命,并且电源线的通孔孔径小于50μm时,电源线的耐弯折寿命均高于通孔孔径为0μm时的耐弯折寿命;电源线的通孔孔径范围处于5μm-35μm时,电源线的耐弯折寿命明显高于通孔孔径为0μm时的耐弯折寿命。It can be seen from analysis of FIG. 11 that when the through hole diameter of the power supply line is equal to 50 μm, the bending endurance life of the power supply line is approximately equal to the bending endurance life when the through hole aperture is 0 μm, and the through hole diameter of the power supply line is less than 50 μm. The flexural life of the power cord is higher than the flexural life of the through hole with a hole diameter of 0 μm; when the through hole diameter of the power cord is between 5 μm and 35 μm, the bending life of the power cord is significantly higher than the through hole diameter of 0 μm. The bending life of the time.
由于电源线的宽度w=500μm,通过分析图11可得知,当a=50μm时,a/w=0.1;Since the width of the power supply line w=500 μm, it can be known from analysis of FIG. 11 that when a=50 μm, a/w=0.1;
当a=5μm时,a/w=0.01;当a=20μm时,a/w=0.04;当a=35μm时,a/w=0.07。When a = 5 μm, a / w = 0.01; when a = 20 μm, a / w = 0.04; when a = 35 μm, a / w = 0.07.
综上可知,电源线有保护层区域覆盖的a/w值小于0.1时,能够实现通过在电源线上开设通孔的方式来提高有保护层的电源线的耐弯折寿命的目的。In summary, when the a/w value of the power line covered by the protective layer region is less than 0.1, it is possible to improve the bending life of the power line having the protective layer by opening the through hole on the power line.
优选地,使电源线有保护层区域覆盖的a/w值范围处于0.01-0.07内,以便能够显著提高有保护层的电源线的耐弯折寿命。Preferably, the a/w value of the power line covered by the protective layer region is in the range of 0.01-0.07, so that the bending life of the power line with the protective layer can be significantly improved.
优选地,使电源线有保护层区域覆盖的a/w值范围处于0.01-0.04内,以便使有保护层的电源线的耐弯折寿命提高500%。Preferably, the a/w value of the protective layer covered by the power line is in the range of 0.01-0.04 in order to increase the bending life of the protective layer power line by 500%.
举例说明,在本发明一实施例中,电源线宽度w=400μm,电源线上有pillar层(即保护层)涂覆,则电源线上的通孔孔径低于40μm,以便能够实现通过在电源线上开设通孔的方式来提高有保护层的电源线的耐弯折寿命的目的。For example, in an embodiment of the present invention, the power line width w=400 μm, and the power line has a pillar layer (ie, a protective layer) coated, and the through hole aperture of the power line is less than 40 μm, so as to be able to pass the power supply. A through hole is opened on the line to improve the bending life of the power line with the protective layer.
优选地,在本发明一实施例中,电源线宽度w=400μm,电源线上有pillar层(即保护层)涂覆,通孔孔径值的范围为4μm-16μm,以便使有保护层的电源线的耐弯折寿命提高500%。Preferably, in an embodiment of the invention, the power line width w=400 μm, the power line is coated with a pillar layer (ie, a protective layer), and the through hole aperture value ranges from 4 μm to 16 μm, so that the protective layer is powered. The bending life of the wire is increased by 500%.
应当理解,在本发明实施例十一中所描述的柔性显示装置中,电源线上开设的通孔均可替换为盲孔,以避免通孔的制备过程对柔性显示装置的其他结构的性能产生影响。也就是说,本发明实施例提供的柔性显示装置中既可以是只有通孔或盲孔的情况,又可以是通孔和盲孔共存的情况。It should be understood that in the flexible display device described in the eleventh embodiment of the present invention, the through holes formed on the power line can be replaced with blind holes to avoid the performance of other structures of the flexible display device during the preparation process of the through holes. influences. That is to say, the flexible display device provided by the embodiment of the present invention may be a case where only a through hole or a blind hole is used, or a case where a through hole and a blind hole coexist.
应当理解,在本发明实施例十一中,通孔或盲孔可以为矩形孔、三角形孔、梯形孔、菱形孔、圆形孔、椭圆形孔或不规则形孔等,当通孔或盲孔为正方形孔或圆形孔时,孔径a为边长或直径,当通孔或盲孔为不规则形孔时,孔径a为不规则形孔的所有侧边中最长的一条侧边或所有连接侧边两点的侧边连线中最长的一条侧边的长度。It should be understood that, in the eleventh embodiment of the present invention, the through hole or the blind hole may be a rectangular hole, a triangular hole, a trapezoidal hole, a diamond hole, a circular hole, an elliptical hole or an irregular hole, etc., when the through hole or the blind hole When the hole is a square hole or a circular hole, the aperture a is a side length or a diameter. When the through hole or the blind hole is an irregular hole, the aperture a is the longest one of all the sides of the irregular hole or The length of the longest side of all the side lines connecting the two sides of the side.
本发明第十一实施例通过在柔性显示装置中的有保护层覆盖区域的金属线上开设通孔和/或盲孔,并限定通孔和/或盲孔的孔径与金属线宽度比值的方式,提高了有保护层覆盖区域的金属线的耐弯折寿命。The eleventh embodiment of the present invention provides a through hole and/or a blind hole in a metal wire having a protective layer covering area in the flexible display device, and defines a ratio of a hole diameter and a metal hole width ratio of the through hole and/or the blind hole The bending life of the metal wire having the protective layer coverage area is improved.
在本发明一实施例中,将本发明上述实施例提供的柔性导线(即电源线)应用到阴阳极结构中,以便提高阴阳极结构的耐弯折寿命。In an embodiment of the invention, the flexible wire (ie, power line) provided by the above embodiment of the present invention is applied to the anode and cathode structure to improve the bending life of the anode and cathode structures.
以上仅为本发明的较佳实施例而已,并非用于限定本发明的保护范围。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above are only the preferred embodiments of the present invention and are not intended to limit the scope of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and scope of the present invention are intended to be included within the scope of the present invention.

Claims (15)

  1. 一种柔性显示装置,其特征在于,所述柔性显示装置包括:柔性基底及形成于所述柔性基底上的导电层,所述导电层上设置有至少一个凹陷区域。A flexible display device, comprising: a flexible substrate and a conductive layer formed on the flexible substrate, the conductive layer being provided with at least one recessed region.
  2. 如权利要求1所述的柔性显示装置,其特征在于,所述导电层构成所述柔性基底上的电源线。A flexible display device according to claim 1, wherein said conductive layer constitutes a power supply line on said flexible substrate.
  3. 如权利要求1所述的柔性显示装置,其特征在于,所述凹陷区域的所有侧边中最长的一条侧边或者所述凹陷区域的所有连接侧边两点的侧边连线中最长的一条侧边连线与所述柔性显示装置的弯折方向一致。The flexible display device according to claim 1, wherein the longest one of all the sides of the recessed area or the longest one of the two sides of all the connected sides of the recessed area One of the side wires is aligned with the bending direction of the flexible display device.
  4. 如权利要求1至3中任一所述的柔性显示装置,其特征在于,所述凹陷区域包括通孔和/或盲孔。A flexible display device according to any one of claims 1 to 3, wherein the recessed area comprises a through hole and/or a blind hole.
  5. 如权利要求1所述的柔性显示装置,其特征在于,所述导电层和所述柔性基底沿延展方向分为弯折区和非弯折区,所述至少一个凹陷区域设置在所述导电层的弯折区;The flexible display device according to claim 1, wherein said conductive layer and said flexible substrate are divided into a bent portion and a non-bent portion in an extending direction, and said at least one recessed portion is disposed on said conductive layer Bending zone;
    其中,所述弯折区的所述导电层的厚度大于所述非弯折区的所述导电层的厚度。Wherein the thickness of the conductive layer of the bending zone is greater than the thickness of the conductive layer of the non-bending zone.
  6. 根据权利要求1所述的柔性显示装置,其特征在于,所述柔性显示装置采用薄膜晶体管结构,其中所述导电层与所述柔性显示装置的源电极、漏电极、栅电极、阴极或阳极电性连接;或,所述导电层构成所述柔性显示装置的源电极、漏电极、栅电极、阴极或阳极。The flexible display device according to claim 1, wherein the flexible display device employs a thin film transistor structure, wherein the conductive layer and the source electrode, the drain electrode, the gate electrode, the cathode or the anode of the flexible display device Or the conductive layer constitutes a source electrode, a drain electrode, a gate electrode, a cathode or an anode of the flexible display device.
  7. 如权利要求1所述的柔性显示装置,其特征在于,所述导电层的所述至少一个凹陷区域中填充有机材料。A flexible display device according to claim 1, wherein said at least one recessed region of said conductive layer is filled with an organic material.
  8. 如权利要求1所述的柔性显示装置,其特征在于,所述至少一个凹陷区域沿所述柔性显示装置的弯折线方向呈一行或多行设置。A flexible display device according to claim 1, wherein said at least one recessed region is disposed in one or more rows along a direction of a bending line of said flexible display device.
  9. 如权利要求8所述的柔性显示装置,其特征在于,多行设置的所述凹陷区域对齐排列或者交错排列。The flexible display device according to claim 8, wherein the plurality of rows of the recessed regions are aligned or staggered.
  10. 如权利要求9所述的柔性显示装置,其特征在于,同一列的一个凹陷区域在线宽方向上的截面宽度或者同一列的多个凹陷区域在线宽方向上的截面宽度之和与所述导电层的线宽之比小于等于1/2。The flexible display device according to claim 9, wherein a cross-sectional width in a line width direction of one recessed region of the same column or a cross-sectional width in a line width direction of a plurality of recessed regions in the same column and the conductive layer The line width ratio is less than or equal to 1/2.
  11. 如权利要求9所述的柔性显示装置,其特征在于,同一行中相邻两个凹陷区域之间的最小间距和与所述柔性显示装置的弯折方向一致的侧边或侧边连线之比大于等于1/2且小于等于2。A flexible display device according to claim 9, wherein a minimum pitch between adjacent two recessed regions in the same row and a side or side line which coincides with a bending direction of said flexible display device The ratio is greater than or equal to 1/2 and less than or equal to 2.
  12. 如权利要求1所述的柔性显示装置,其特征在于,所述至少一个凹陷区域所构成的形状在与所述柔性基底平行的平面或与所述柔性基底垂直的平面上的投影包括以下几种形状中的一种或多种的组合:矩形、三角形、梯形、菱形、圆形、椭圆形、正弦波形、麻花型和锯齿形。The flexible display device according to claim 1, wherein the projection of the shape of the at least one recessed area on a plane parallel to the flexible substrate or a plane perpendicular to the flexible substrate comprises the following A combination of one or more of the shapes: rectangular, triangular, trapezoidal, diamond, circular, elliptical, sinusoidal, twisted, and zigzag.
  13. 如权利要求1所述的柔性显示装置,其特征在于,包括设置于所述导电层上的保护层,所述导电层被所述保护层覆盖的所述凹陷区域的孔径与所述导电层的宽度之比小于0.1。A flexible display device according to claim 1, comprising a protective layer disposed on said conductive layer, said conductive layer being covered by said protective layer, said aperture of said recessed region and said conductive layer The ratio of widths is less than 0.1.
  14. 如权利要求1所述的柔性显示装置,其特征在于,包括设置于所述导电层上的保护层,所述导电层的未被所述保护层覆盖的所述凹陷区域的孔径与所述导电层的宽度之比大于0.08。A flexible display device according to claim 1, comprising a protective layer disposed on said conductive layer, an aperture of said recessed region of said conductive layer not covered by said protective layer, and said conductive The ratio of the width of the layers is greater than 0.08.
  15. 一种如权利要求2所述的柔性显示装置的制造方法,其特征在于,包括:A method of manufacturing a flexible display device according to claim 2, comprising:
    形成柔性基底;Forming a flexible substrate;
    确定电源线电阻需求;Determine the power line resistance requirements;
    根据电源线电阻需求得到导电层的线宽及凹陷区域的数据;Obtaining data of the line width and the recessed area of the conductive layer according to the power line resistance requirement;
    根据导电层的线宽及凹陷区域的数据在柔性基底上形成电源线。A power line is formed on the flexible substrate based on the line width of the conductive layer and the data of the recessed area.
PCT/CN2017/116916 2016-12-27 2017-12-18 Flexible display device and manufacturing method therefor WO2018121322A1 (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110212089A (en) * 2019-05-15 2019-09-06 武汉华星光电半导体显示技术有限公司 Flexible OLED display panel
CN111199685A (en) * 2018-11-19 2020-05-26 群创光电股份有限公司 Splicing device and electronic device
CN111430437A (en) * 2020-04-21 2020-07-17 Oppo广东移动通信有限公司 Flexible display screen, electronic equipment and method for manufacturing flexible display screen
CN111508972A (en) * 2020-04-21 2020-08-07 武汉华星光电半导体显示技术有限公司 Flexible array substrate, flexible display panel and preparation method thereof
CN111816613A (en) * 2020-06-29 2020-10-23 合肥维信诺科技有限公司 Display panel manufacturing method and display panel mother board
WO2020237963A1 (en) * 2019-05-31 2020-12-03 武汉华星光电半导体显示技术有限公司 Display panel and display device
CN112582433A (en) * 2020-12-25 2021-03-30 厦门天马微电子有限公司 Display panel and display device
CN113516918A (en) * 2021-06-09 2021-10-19 荣耀终端有限公司 Laminated display module and electronic equipment
CN111816613B (en) * 2020-06-29 2024-04-19 合肥维信诺科技有限公司 Manufacturing method of display panel and display panel motherboard

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1679189A (en) * 2002-07-03 2005-10-05 荷兰能源建设基金中心 Anode-supported fuel cell
CN1828871A (en) * 2006-02-08 2006-09-06 广辉电子股份有限公司 Method for making picture element structure
CN103559944A (en) * 2013-09-27 2014-02-05 南昌欧菲光科技有限公司 Foldable conducting film and display

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1679189A (en) * 2002-07-03 2005-10-05 荷兰能源建设基金中心 Anode-supported fuel cell
CN1828871A (en) * 2006-02-08 2006-09-06 广辉电子股份有限公司 Method for making picture element structure
CN103559944A (en) * 2013-09-27 2014-02-05 南昌欧菲光科技有限公司 Foldable conducting film and display

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111199685A (en) * 2018-11-19 2020-05-26 群创光电股份有限公司 Splicing device and electronic device
CN111199685B (en) * 2018-11-19 2023-04-07 群创光电股份有限公司 Splicing device and electronic device
CN110212089A (en) * 2019-05-15 2019-09-06 武汉华星光电半导体显示技术有限公司 Flexible OLED display panel
CN110212089B (en) * 2019-05-15 2022-07-29 武汉华星光电半导体显示技术有限公司 Flexible OLED display panel
WO2020237963A1 (en) * 2019-05-31 2020-12-03 武汉华星光电半导体显示技术有限公司 Display panel and display device
CN111508972A (en) * 2020-04-21 2020-08-07 武汉华星光电半导体显示技术有限公司 Flexible array substrate, flexible display panel and preparation method thereof
CN111430437B (en) * 2020-04-21 2023-03-03 Oppo广东移动通信有限公司 Flexible display screen, electronic equipment and method for manufacturing flexible display screen
CN111430437A (en) * 2020-04-21 2020-07-17 Oppo广东移动通信有限公司 Flexible display screen, electronic equipment and method for manufacturing flexible display screen
CN111816613A (en) * 2020-06-29 2020-10-23 合肥维信诺科技有限公司 Display panel manufacturing method and display panel mother board
CN111816613B (en) * 2020-06-29 2024-04-19 合肥维信诺科技有限公司 Manufacturing method of display panel and display panel motherboard
CN112582433A (en) * 2020-12-25 2021-03-30 厦门天马微电子有限公司 Display panel and display device
CN112582433B (en) * 2020-12-25 2022-08-19 厦门天马微电子有限公司 Display panel and display device
CN113516918A (en) * 2021-06-09 2021-10-19 荣耀终端有限公司 Laminated display module and electronic equipment
CN113516918B (en) * 2021-06-09 2022-04-29 荣耀终端有限公司 Laminated display module and electronic equipment

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