WO2018120521A1

WO2018120521A1 - Optical film and manufacturing method therefor

Info

Publication number: WO2018120521A1
Application number: PCT/CN2017/080748
Authority: WO
Inventors: 郭滨刚
Original assignee: 深圳市光科全息技术有限公司
Priority date: 2016-12-26
Filing date: 2017-04-17
Publication date: 2018-07-05
Also published as: CN106772747A; JP2020503563A; CN106772747B; JP6760678B2

Abstract

An optical film and a manufacturing method therefor. The optical film comprises a substrate (10), and dielectric layer (12)s and granular layers (11) alternately arranged on the substrate (10); each granular layer (11) comprises multiple granules (111); a value range of the distance between the granules (111) is from λ₁/8 to λ₁/2, a value range of the optical thickness of each dielectric layer (12) is from λ₂/8 to λ₂/2, and the refractive index of the granular layer (11) is greater than or smaller than that of the dielectric layer (12). The optical film can strongly reflect light having one or two center wavelengths, and can implement narrow band filtering without affecting optical waves of other bands.

Description

Description: An optical film and a method of manufacturing the same

Technical field

[0001] The present invention belongs to the technical field of optical films, and in particular, to an optical film and a method for fabricating the same.

Background technique

[0002] In order to increase the reflectivity of an optical device to light waves or light waves of a specific wavelength, an optical film is often attached to the surface of the optical device or an optical film is plated, and the light wave or a specific light is realized by the action of the optical film. The strong reflection of wavelength light waves, that is, the filtering function of light waves or light waves of a specific wavelength. For example, the anti-blue film is attached to the screen of the mobile phone, and the anti-blue film can reflect the high-energy blue light emitted by the LED light source in the mobile phone, that is, the high-energy blue light is filtered out, and the blue light transmitted by the screen of the mobile phone is greatly reduced, thereby reducing the damage of the blue light to the eyes. .

[0003] Existing optical films are generally composed of alternating dielectric layers of high and low refractive indices, which can provide strong reflection of light waves of a specific wavelength, but existing optical films are reflecting specific wavelengths. The light wave is often reflected off a part of the light wave of other wavelengths near the specific wavelength light wave, that is, the optical film has a wide filtering bandwidth for the light wave of the specific wavelength, so that the color of the light emitted through the optical film is deviated, and the like. Affect the display effect.

technical problem

An object of the embodiments of the present invention is to provide an optical film and a method for fabricating the same, which are to cope with technical problems such as wide filtering bandwidth of optical films in the prior art.

Problem solution

Technical solution

[0005] A preferred embodiment of the present invention provides an optical film for reflecting light of a certain wavelength band, comprising: a substrate, a dielectric layer and a granular layer alternately disposed on the substrate; and the granular layer includes a plurality of particles The particle spacing ranges from λ 8 to λ 2 , and the optical thickness of the dielectric layer ranges from λ ₂ /8 to λ ₂ 12 , and the refractive index of the granular layer is greater than or less than The refractive index of the dielectric layer, wherein λ ^ Π λ ₂ is the center wavelength of the first band of light and the center wavelength of the second band of light, respectively.

[0006] In the optical film of the preferred embodiment of the present invention, the center wavelength λ of the first wavelength band and the second wave The center wavelength λ _{2 of the} segment light is equal.

In an optical film according to a preferred embodiment of the present invention, a layer contacting the substrate is the particle layer, and an outermost layer away from the substrate is the particle layer or the dielectric layer.

In an optical film according to a preferred embodiment of the present invention, a layer contacting the substrate is the dielectric layer, and an outermost layer away from the substrate is the particle layer or the dielectric layer.

In an optical film according to a preferred embodiment of the present invention, the particles have a diameter smaller than λ J4 .

[0010] In the optical film according to a preferred embodiment of the present invention, the center wavelength λ of the first wavelength band light and the center wavelength of the second wavelength band person ₂ range from 100 nanometers to 2000 micrometers.

[0011] In the optical film according to a preferred embodiment of the present invention, the material used for the particles and the dielectric layer includes magnesium oxide, cerium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, Calcium fluoride, alumina, SiO x, TiO ^NbO xo

[0012] In the optical film of the preferred embodiment of the invention, the substrate comprises a metal substrate, a glass substrate, a quartz substrate, a rubber substrate or a plastic substrate.

[0013] A preferred embodiment of the present invention further provides a method of fabricating an optical film, including:

[0014] a substrate, and

[0015] a dielectric layer and a particle layer alternately fabricated on the substrate; the particle layer includes a plurality of particles, and the particle spacing ranges from λ ₂ /8 to λ ₂ /2, and the particle layer The refractive index is greater than or less than the refractive index of the dielectric layer, wherein λ ^ Π λ ₂ is the center wavelength of the first band of light and the center wavelength of the second band of light, respectively.

[0016] In the method for fabricating an optical film according to a preferred embodiment of the present invention, the method for alternately fabricating the dielectric layer and the particle layer includes a vacuum film forming process, a sol-gel film forming process, and/or a thin film forming process; wherein the vacuum film forming process comprises physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating, epitaxial growth; the precision error of the particle spacing is not greater than the particle spacing 5 %; the accuracy error of the optical thickness is not more than 5% of the optical thickness.

Advantageous effects of the invention

Beneficial effect

[0017] Compared with the prior art, a preferred embodiment of the present invention provides an optical film and a method of fabricating the same. The optical film has a dielectric layer and a particle layer alternately disposed on a substrate, wherein the particle layer includes a plurality of particles, and The particle spacing ranges from λ to λ,12, and the optical thickness of the dielectric layer ranges from λ ₂ /8 to λ 2/2, and the refractive index of the granular layer is greater than or less than the refractive index of the texture layer, wherein , λ ^ Π λ ₂ are the center wavelength of the first band light and the center wavelength of the second band light, respectively. The optical film can strongly reflect the light of the first band and the second band at the same time, without affecting the light waves of other bands, that is, the narrow band filtering of the light of the first band and the second band; especially when the first The center wavelength of the band light is equal to the center wavelength of the second band of light, and narrowband filtering of light in a particular band can be achieved.

Brief description of the drawing

DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings to be used in the embodiments or the prior art description will be briefly described below. Obviously, the drawings in the following description are merely Some embodiments of the present invention may also be used to obtain other drawings based on these drawings without departing from the skilled artisan.

1 is a schematic structural view of a first optical film according to a preferred embodiment of the present invention;

2 is a schematic structural view of a second optical film according to a preferred embodiment of the present invention;

3 is a schematic structural view of a third optical film according to a preferred embodiment of the present invention;

4 is a schematic structural view of a fourth optical film according to a preferred embodiment of the present invention.

Embodiments of the invention

[0023] In the following description, for purposes of illustration and description However, it will be apparent to those skilled in the art that the present invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the invention.

[0024] It should be noted that in the drawings referred to in the present specification, the same components will be denoted by the same reference numerals.

[0025] Embodiment 1

Please refer to FIG. 1. FIG. 1 is a schematic structural view of a first optical film according to a preferred embodiment of the present invention. The optical film in the preferred embodiment can be used to reflect light of a certain wavelength band, and let light of other wavelength bands pass through, that is, filter light of a certain wavelength band, for example, can be attached to the surface of the LED display to reduce the transmission of blue light; It can be used to select the light wave of a specific wavelength band in the light wave and separate it by reflection to obtain the light wave of a specific wavelength band. Here, the specific use of the optical film in the preferred embodiment will not be limited.

The optical film in the preferred embodiment includes: a substrate 10, a particle layer 11, and a dielectric layer 12. The portion shown by the broken line in Fig. 1 is the particle layer 11, and the particle layer 11 includes a plurality of particles 111, that is, the particle layer 11 is composed of a plurality of particles 111 distributed on the substrate 10.

[0028] Specifically, the particle layer 11 and the dielectric layer 12 are alternately disposed on the substrate 10 as shown in FIG. In the direction of the substrate 10 to the dielectric layer 12, the first layer in contact with the substrate 10 is a granular layer 11, the first dielectric layer 12 is a first dielectric layer 12, and the first dielectric layer 12 is filled with particles. 111 gaps. On the first dielectric layer 12 is a second granular layer 11, and so on, until a structure as shown in Fig. 1 is formed.

[0029] L is the particle spacing may be in the range [lambda], / 8 to [lambda], / 2, the range of the optical thickness of the dielectric layer may be a _2/8 to human _2/2, and the refractive index of the particle layer 11 It is larger or smaller than the refractive index of the dielectric layer 12, wherein λ ^ Π λ ₂ is the center wavelength of the first band light and the center wavelength of the second band light, respectively. In Figure 1, d is the physical thickness of the dielectric layer. In the fabrication of the dielectric layer 12, the physical thickness d of the dielectric layer 12 has a tolerance range of plus or minus 5 nm.

[0030] In one embodiment, the accuracy error of the particle pitch is not more than 5% of the particle pitch; the accuracy of the optical thickness is not more than 5% of the optical thickness.

[0031] In practical applications, the value of the particle spacing L may be greater than the optical thickness of the dielectric layer, or may be smaller than the optical thickness of the dielectric layer, or may be equal to the optical thickness of the dielectric layer, and is not specifically limited herein. The optical film can strongly reflect the center wavelength of the first wavelength light and the center wavelength of the second wavelength light, and does not affect the light waves of other wavelength bands, thereby achieving the effect of narrow band filtering. In a preferred embodiment, the particle spacing is taken as human, /4, and the optical thickness of the dielectric layer is taken to be λ ₂ /4.

[0032] In a preferred embodiment, the center wavelength λ of the first band of light is equal to the center wavelength λ _{2 of the} second band of light. That is, the optical film is used for narrowband filtering of light having a center wavelength. For example, when the center wavelength λ of the first band of light and the center wavelength λ _{2 of the} second band of light are both 440 nm, the optical film will only strongly reflect high-energy blue light having a center wavelength of 440 nm, that is, high-energy blue light. Perform narrowband filtering. When the optical film is attached to the screen of the mobile phone, when the light emitted by the LED light source in the mobile phone is incident on the optical film, the optical film reflects 90% of the high-energy blue light in the LED light source, that is, filters out most of the high-energy blue light, so that the optical Membrane The transmitted transmitted light contains only a small amount of blue light of about 10%, thereby reducing the damage of high-energy blue light to the eyes. At the same time, since the optical film adopts a structure in which the particle layer 11 and the dielectric layer 12 are alternately arranged, and the particle spacing is 110 nm (λ, /4), the bandwidth of the optical film for filtering blue light is narrow, thereby avoiding The same color that filters out the blue light also filters out other colors of light, which can reduce the damage of high-energy blue light to the eyes while ensuring the display effect.

[0033] Of course, in this embodiment, the center wavelength band light of the first person, and the center wavelength of the light of the second wavelength band may not be equal to ₂ In other preferred embodiments. When the center wavelength λ of light of the first wavelength band, the center wavelength band of the second person is not equal to ₂ inches of light, the optical film can realize the central wavelength of light two narrow band filters, for example, the center wavelength of the first wavelength band of the light ^ λ 440 nm, the center wavelength band of light of the second person ₂ takes 700 nm, so that the optical film can be high-energy blue and red with a strong reflection inch, to achieve narrowband filtering of blue and red light.

[0034] In a preferred embodiment, the center wavelength λ of the first band of light and the center wavelength λ ₂ of the second band of light range from 100 nanometers to 2000 micrometers. In practical applications, the first wavelength band may be used. The center wavelength λ of the light and the center wavelength λ ₂ of the second band light design the pitch of the particles 111 and the thickness of the dielectric layer 12, thereby achieving strong reflection of light of a certain central wavelength or two central wavelengths. In the same way, the size of the particles 111 should not be too large. Generally, the diameter of the particles 111 is smaller than λ, /4, and the sizes of the plurality of particles may not be completely the same. When the particle layer 11 consists of only one layer of particles 111, the diameter of the particles 111 is the thickness of the particle layer 11.

[0035] In addition, the materials used for the particles 111 and the dielectric layer 12 include magnesium oxide, cerium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, aluminum oxide, SiO _x , TiO _x , One or several of NbO _x . It should be noted that SiO _{x is} a compound formed of two elements of silicon (Si) and oxygen (0). For example, in the process of fabricating the compound by chemical vapor deposition, silicon and oxygen may be generated according to a ratio of non-preset components. Compound. When the formulation is SiO吋, the ratio of silicon to oxygen is ideally 1:1, but when the silicon content is high, the ratio of silicon to oxygen may be higher than 1:1. Therefore, a compound formed of silicon and oxygen can be abbreviated as SiO _x , and x represents a composition ratio of oxygen to silicon, such as X being 1.2. The TiO NbO _x case is similar to SiO x and will not be described here.

[0036] Of course, the particles 111 and the dielectric layer 12 may also be other materials not listed above, and are not particularly limited as long as the refractive index of the particle layer 11 is greater or smaller than the refractive index of the dielectric layer 12. For example, when the particle layer 11 is made of magnesium oxide, the dielectric layer 12 may be made of zinc sulfide, so that the refractive index of the particle layer 11 Less than the refractive index of the dielectric layer 12. Of course, the granular layer 11 may also be made of zinc sulfide, and the dielectric layer 12 may be made of magnesium oxide such that the refractive index of the granular layer 11 is greater than the refractive index of the dielectric layer 12.

[0037] Of course, different layers of the particle layer 11 or different layers of the dielectric layer 12 may also adopt different materials. For example, in the particle layer 11 in FIG. 1, a part of the particle layer 11 is made of magnesium oxide, and another part of the particle layer 11 is oxidized. Similarly, in the dielectric layer 12, a part of the dielectric layer 12 is made of zinc sulfide, and the other part of the dielectric layer 12 is made of zinc selenide, so that the refractive index of the granular layer 11 is smaller than the refractive index of the dielectric layer 12. The specific materials of the particle layer 11 and the dielectric layer 12 can be selected according to actual needs, and are not specifically limited herein.

[0038] In the preferred embodiment, the substrate 10 is a transparent substrate, such as a glass substrate or a quartz substrate, etc., so that light passing through the optical film can be transmitted through the substrate 10, or incident light can be passed through the substrate 10 It is incident into the particle layer 11 and the dielectric layer 12. In the use of the optical film 入射, incident light may be incident from the direction of the substrate 10 to the dielectric layer 12, or may be incident from the dielectric layer 12 to the direction of the substrate 10. The same technical effect can be achieved no matter which direction is incident.

[0039] Of course, in other embodiments, the substrate 10 may also be a rubber substrate, a plastic substrate, a metal substrate, etc., and different substrates 10 may be selected according to the practical application of the optical film. For example, when the optical film is used to reflect a certain wavelength of light in the visible light band, the substrate 10 may be a glass substrate or a quartz substrate; when the optical film is used to reflect a certain wavelength of light in the microwave band, the substrate 10 may be a ceramic substrate or a rubber. Substrate or plastic substrate; When the optical film does not need to transmit light waves, the substrate 10 may be a metal substrate.

It should be noted that the structure of the optical film shown in FIG. 1 is only one of them, that is, a layer contacting the substrate 10 is a particle layer 11, and an outermost layer away from the substrate 10 is a dielectric layer 12. The structure of the optical film of the present invention may also be other structures such as the structures shown in Figs. 2 to 4. Referring to Figures 2 to 4, Figures 2, 3 and 4 are schematic views showing the structure of the second, third and fourth optical films respectively provided in accordance with a preferred embodiment of the present invention.

In the structure of the second optical film shown in FIG. 2, one layer contacting the substrate 10 is a particle layer 11, and the outermost layer away from the substrate 10 is also a particle layer 11. In the structure of the third optical film shown in Fig. 3, one layer contacting the substrate 10 is the dielectric layer 12, and the outermost layer away from the substrate 10 is also the dielectric layer 12. In the structure of the fourth optical film shown in Fig. 4, one layer contacting the substrate 10 is a dielectric layer 12, and the outermost layer away from the substrate 10 is a granular layer.

[0042] It should be noted that FIGS. 1 to 4 only illustrate the approximate positional relationship of the particles 111, and cannot be used for limitation. The specific arrangement of the plurality of particles 111 in the present invention. It can be understood that, in the process of actually fabricating the granular layer 11, it is impossible to ensure that the plurality of particles 111 in each of the granular layers 11 are aligned in the same distribution manner, and the plurality of particles 111 in each of the granular layers 11 can be The irregular arrangement is as long as the pitch of the particles 111 is substantially equal.

[0043] In the optical film of the preferred embodiment, the dielectric layer and the granular layer are alternately disposed on the substrate, wherein the granular layer has a plurality of particles, and the particle spacing ranges from the range of the human to the human, and the optical of the dielectric layer the thickness range of ₂ human / human 8 _2/2, the refractive index of the particle layer is greater than or less than the refractive index of the substance layer. The optical film can strongly reflect light of one center wavelength or two center wavelengths at the same time, and does not affect the light waves of other wavelength bands, thereby achieving the effect of narrow band filtering.

[0044] Embodiment 2

[0045] The preferred embodiment provides a method for fabricating an optical film. The optical film produced by the method can be used to reflect light of a certain wavelength band, and let light of other wavelength bands pass through, that is, filter light of a certain wavelength band, for example, It is attached to the surface of the L ED display to reduce the transmission of blue light. It can also be used to select the light wave of a specific wavelength band in the light wave and separate it by reflection to obtain the light wave of a specific wavelength band. Here, the specific use of the optical film will not be limited.

[0046] The manufacturing method of the optical film comprises:

[0047] a substrate, and

[0048] a dielectric layer and a particle layer alternately fabricated on the substrate, the particle layer comprising a plurality of particles, the particle spacing ranges from λ 8 to λ 2 , and the optical thickness of the dielectric layer is taken The value ranges from λ ₂ /8 to λ ₂ 12 , and the refractive index of the particle layer is greater than or less than the refractive index of the dielectric layer, wherein λ ^ Π λ ₂ is the center wavelength and the second wavelength of the first band of light, respectively The center wavelength of the light.

[0049] The method of fabricating the optical film will be described in detail below.

[0050] First, a substrate is selected, which can be selected according to the actual use of the optical film. When the optical film is used to reflect a certain wavelength of light in the visible light band, the substrate may be a glass substrate or a quartz substrate, so that the light passing through the optical film can pass through the substrate, or the incident light can be incident on the particle layer and the medium through the substrate. In the layer; when the optical film is used to reflect a certain wavelength of light in the microwave band, the substrate may be a ceramic substrate, a rubber substrate or a plastic substrate; when the optical film does not need to transmit light waves, the substrate may be a metal substrate. Here, the type of the substrate is not specifically limited. [0051] Next, the particle layer and the dielectric layer are sequentially alternately deposited by chemical vapor deposition on the substrate, thereby forming alternating dielectric layers and particle layer structures on the substrate. Of course, in other embodiments, a vacuum film forming process with a controllable size and precision, a sol-gel film forming process, a self-organized film forming process, and a free combination process between the above processes may also be employed. The vacuum film forming process includes physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating, epitaxial growth, and the like.

[0052] Specifically, in the preferred embodiment, the parameters are prepared by precisely controlling the deposition time, deposition speed, etc., and a layer of particles is first deposited on the substrate, the particle layer includes a plurality of particles, and the plurality of particles are distributed On the surface of the substrate, and the particle spacing is controlled in humans to humans, the diameter of the particles is smaller than that of humans, and the size of the particles may be different. Wherein, it is the center wavelength of the first band of light, and ranges from 100 nanometers to 2000 micrometers.

[0053] After the first layer of particles is formed, a first layer of the dielectric layer is formed. It will be appreciated that due to the presence of gaps between the particles, the material of the first dielectric layer will fill the voids between the particles. The first dielectric layer is formed by precisely controlling the deposition time, deposition speed, and the like. Generally, the range of the optical thickness of the dielectric layer ₂ is a human / human 8 _2/2, wherein, a center wavelength [lambda] ₂ of the second wavelength band of light, [lambda] ₂ is in the range 100 nm to 2000 microns.

In the embodiment of the present invention, the accuracy error of the particle pitch is not more than 5% of the particle pitch; the accuracy error of the optical thickness is not more than 5% of the optical thickness.

[0055] after the first dielectric layer is completed, a second layer of particles is continuously deposited on the first dielectric layer, and so on, until the last dielectric layer or particle layer is completed, and then, An optical film composed of a substrate and a dielectric layer and a particle layer alternately disposed on the substrate.

[0056] In the process of fabricating the optical film, both the material of the particle and the material of the dielectric layer may be magnesium oxide, cerium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, SiO _x , One or more of TiO _x , NbO _x , alumina , etc., other materials not listed may be used, as long as the refractive index of the particle layer is greater or smaller than the refractive index of the dielectric layer, the specific material There are no restrictions here. For example, when the particle layer is made of magnesium oxide, the dielectric layer may be made of zinc sulfide such that the refractive index of the particle layer is smaller than the refractive index of the dielectric layer. Of course, the granular layer may also be made of zinc sulfide, and the dielectric layer is made of magnesium oxide such that the refractive index of the granular layer is greater than the refractive index of the dielectric layer. In addition, different layers of particles or different layers of dielectric layers may also be made of different materials. For example, in the granular layer, some of the granular layers are made of magnesium oxide, and the other part of the granular layer is made of cerium oxide. Similarly, in the dielectric layer, a part of the dielectric layer. Using zinc sulfide, another part The dielectric layer is made of zinc selenide such that the refractive index of the particle layer is smaller than the refractive index of the dielectric layer. The specific materials of the granular layer and the dielectric layer can be selected according to actual needs, and are not specifically limited herein.

Further, it should be noted that the above-described production method is only one of the methods for producing an optical film, and in other embodiments, the optical film may be produced by other steps. For example, taking a substrate, making parameters by controlling the deposition time, deposition rate, etc., depositing a dielectric layer on the substrate, depositing a first particle layer on the first dielectric layer, and then depositing the first granular layer on the first dielectric layer. A second dielectric layer is deposited thereon, wherein the second dielectric layer fills the interstitial spaces in the first granular layer. By analogy, until the final layer of particles or dielectric layer is completed, an optical film consisting of a substrate and a dielectric layer and a particle layer alternately disposed on the substrate will be fabricated.

[0058] In the manufacturing method of the preferred embodiment, an optical film is formed by alternately forming a dielectric layer and a particle layer on a substrate. The optical film provided by the invention can be produced by the method, and the optical film can strongly reflect light waves of a specific wavelength band, and does not affect other wavelength light waves, and can realize narrow-band filtering.

The above described embodiments are merely illustrative of the technical solutions of the present invention, and are not intended to be limiting; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that The technical solutions described in the foregoing embodiments are modified, or some of the technical features are equivalently replaced; and the modifications or substitutions do not deviate from the spirit and scope of the technical solutions of the embodiments of the present invention. .

Claims

Claim

An optical film for reflecting light of a certain wavelength band, comprising: a substrate, a dielectric layer and a particle layer alternately disposed on the substrate; the particle layer comprises a plurality of particles, and the spacing of the particles is taken The value ranges from λ to λ J2, and the optical thickness of the dielectric layer ranges from λ ₂ /8 to λ ₂ /2, and the refractive index of the granular layer is greater than or less than the refractive index of the dielectric layer, wherein , λ ^ Π λ ₂ are the center wavelength of the first band light and the center wavelength of the second band light, respectively.

The optical film according to claim 1, wherein a center wavelength λ of the first wavelength band light is equal to a center wavelength λ _{2 of the} second wavelength band light.

The optical film according to claim 1, wherein a layer contacting the substrate is the particle layer, and an outermost layer away from the substrate is the particle layer or the dielectric layer. The optical film according to claim 1, wherein a layer contacting the substrate is the dielectric layer, and an outermost layer remote from the substrate is the particle layer or the dielectric layer. The optical film according to claim 1, wherein the particles have a diameter of less than /4.

The optical film according to claim 5, wherein a center wavelength λ of the first wavelength band light and a center wavelength λ ₂ of the second wavelength band light have a value ranging from 100 nm to 2000 μm according to claim 1. The optical film according to the invention, wherein the material used for the particles and the dielectric layer comprises magnesium oxide, cerium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, aluminum oxide, SiO _x , 110 _!4 and / or ^0 _!4 .

The optical film according to claim 1, wherein the substrate comprises a metal substrate

, glass substrate, quartz substrate, rubber substrate or plastic substrate.

A method for fabricating an optical film, comprising:

a substrate, and

a dielectric layer and a granular layer alternately formed on the substrate; the granular layer comprises a plurality of particles, the particle spacing ranges from J2, and the optical thickness of the dielectric layer ranges from λ ₂ / 8 to λ ₂ /2, and the refractive index of the particle layer is greater than or less than the medium The refractive index of the layer, wherein λ ^ Π λ ₂ is the center wavelength of the light of the first wavelength band and the center wavelength of the light of the second wavelength band, respectively.

[Claim 10] The method for fabricating an optical film according to claim 9, wherein the method of alternately fabricating the dielectric layer and the particle layer comprises a vacuum film forming process, a sol-gel film forming process, and And a self-organizing film forming process; wherein the vacuum film forming process comprises physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating, epitaxial growth; the precision error of the particle spacing is not greater than 5% of the particle pitch; the optical thickness has an accuracy error of no more than 5% of the optical thickness.