CN106772747B - Optical film and manufacturing method thereof - Google Patents
Optical film and manufacturing method thereof Download PDFInfo
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- CN106772747B CN106772747B CN201611219228.5A CN201611219228A CN106772747B CN 106772747 B CN106772747 B CN 106772747B CN 201611219228 A CN201611219228 A CN 201611219228A CN 106772747 B CN106772747 B CN 106772747B
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- G—PHYSICS
- G02—OPTICS
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- G02B5/00—Optical elements other than lenses
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- G02B5/26—Reflecting filters
Abstract
The invention discloses an optical film and a manufacturing method thereof. The optical filmThe method comprises the following steps: the particle layer comprises a plurality of particles, and the value range of the particle distance is
λ 1 To
λ 1 The value range of the optical thickness of the dielectric layer is
λ 2 To
λ 2 And the refractive index of the particle layer is greater than or less than that of the dielectric layer. The optical film can strongly reflect light with one or two central wavelengths, does not influence light waves with other wave bands, and can realize narrow-band filtering.
Description
Technical Field
The invention belongs to the technical field of optical films, and particularly relates to an optical film and a manufacturing method thereof.
Background
In order to increase the reflection rate of the optical device for the light wave or the light wave with a specific wavelength, people often stick an optical film or add a layer of optical film on the surface of the optical device, and the strong reflection for the light wave or the light wave with a specific wavelength is realized through the effect of the optical film, that is, the filtering function for the light wave or the light wave with a specific wavelength is realized. For example, paste on the cell-phone screen and prevent the blue light membrane, prevent that the blue light membrane can reflect the high energy blue light of LED light source transmission in the cell-phone, be about to the high energy blue light and strain, the blue light of the cell-phone screen transmission that significantly reduces to reach the purpose that reduces the blue light and injure eyes.
The existing optical film is generally formed by combining medium layers with alternating high and low refractive indexes, and can play a role in strongly reflecting light waves with a certain specific wavelength, but when the existing optical film reflects light waves with the specific wavelength, light waves with other wavelengths near the light waves with the specific wavelength are often reflected by a part of the light waves, namely the optical film has a wider filtering bandwidth for the light waves with the specific wavelength, so that the color of light emitted by the optical film has the problems of deviation and the like, and the display effect is seriously influenced.
Disclosure of Invention
The embodiment of the invention aims to provide an optical film and a manufacturing method thereof, so as to solve the technical problems that the filter bandwidth of the optical film in the prior art is wide and the like.
A preferred embodiment of the present invention provides an optical film for reflecting light of a certain wavelength band, comprising: the particle layer structure comprises a substrate, and a dielectric layer and a particle layer which are alternately arranged on the substrate; the particle layer comprises a plurality of particles, and the value range of the particle distance is
To is that
The value range of the optical thickness of the dielectric layer is
To
And the particle layer has a refractive index greater than or less than that of the dielectric layer, wherein λ 1 And λ 2 The center wavelength of the first band of wavelengths and the center wavelength of the second band of wavelengths, respectively.
In the optical film according to the preferred embodiment of the present invention, the light of the first wavelength band has a central wavelength λ 1 With the central wavelength lambda of the light of the second wavelength band 2 Are equal.
In the optical film according to a preferred embodiment of the present invention, one layer contacting the substrate is the particle layer, and the outermost layer away from the substrate is the particle layer or the dielectric layer.
In the optical film according to the preferred embodiment of the present invention, one layer contacting the substrate is the dielectric layer, and the outermost layer away from the substrate is the particle layer or the dielectric layer.
In the optical film according to the preferred embodiment of the present invention, the particles have a diameter smaller than that of the optical film
In the optical film according to the preferred embodiment of the present invention, the light of the first wavelength band has a central wavelength λ 1 And a center wavelength λ of the second band of wavelengths 2 The value of (a) is in the range of 100 nm to 2000 μm.
In the optical film according to the preferred embodiment of the present invention, the material used for the particles and the dielectric layer includes magnesium oxide, yttrium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, aluminum oxide, siO x 、TiO x And/or NbO x 。
In the optical film according to a preferred embodiment of the present invention, the substrate includes a metal substrate, a glass substrate, a quartz substrate, a rubber substrate, or a plastic substrate.
The preferred embodiment of the present invention also provides a method for manufacturing an optical film, which includes:
a substrate, and
the dielectric layer and the particle layer are alternately manufactured on the substrate; the particle layer comprises a plurality of particles, and the value range of the particle distance is
To
The value range of the optical thickness of the dielectric layer is
To
And the particle layer has a refractive index greater than or less than that of the dielectric layer, wherein λ 1 And λ 2 The center wavelength of the first band of wavelengths and the center wavelength of the second band of wavelengths, respectively.
In the method for manufacturing an optical film according to the preferred embodiment of the present invention, the method for alternately manufacturing the dielectric layer and the granular layer includes a vacuum film-forming process, a sol-gel film-forming process, and/or a self-organized film-forming process; wherein the vacuum film forming process comprises physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating and epitaxial growth; the precision error of the inter-particle distance is not more than 5% of the inter-particle distance; the precision error of the optical thickness is not more than 5% of the optical thickness.
Compared with the prior art, the preferred embodiment of the invention provides an optical film and a manufacturing method thereof. The optical film is characterized in that a dielectric layer and a particle layer are alternately arranged on a substrate, wherein the particle layer comprises a plurality of particles, and the value range of the distance between the particles is
To is that
The value range of the optical thickness of the dielectric layer is
To
The refractive index of the particle layer is greater than or less than that of the dielectric layer, where 1 And λ 2 The center wavelength of the first band of wavelengths and the center wavelength of the second band of wavelengths, respectively. The optical film can be used for strongly reflecting the light of the first waveband and the light of the second waveband at the same time, does not influence light waves of other wavebands, and performs narrow-band filtering on the light of the first waveband and the light of the second waveband at the same time; especially when the center wavelength of the light of the first wavelength band is equal to the center wavelength of the light of the second wavelength band, narrow-band filtering of the light of one specific wavelength band can be achieved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic diagram of a first optical film according to a preferred embodiment of the present disclosure;
FIG. 2 is a schematic diagram of a second optical film according to a preferred embodiment of the present invention;
FIG. 3 is a schematic diagram of a third optical film according to a preferred embodiment of the present invention;
fig. 4 is a schematic structural diagram of a fourth optical film according to a preferred embodiment of the present invention.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth such as the particular system architecture, interfaces, techniques, etc., in order to provide a thorough understanding of the embodiments of the invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.
It should be noted that, in the drawings referred to in this specification, the same reference numerals are used for the same components.
Example one
Referring to fig. 1, fig. 1 is a schematic structural diagram of a first optical film according to a preferred embodiment of the present invention. The optical film in the preferred embodiment can be used for reflecting light in a certain waveband and allowing light in other wavebands to pass through, i.e. filtering light in a certain waveband, and for example, the optical film can be attached to the surface of an LED display to play a role in reducing transmission of blue light; or the method can be used for selecting the light wave of a certain specific wave band in the light waves and separating the light waves through reflection so as to obtain the light wave of the certain specific wave band. Here, the specific use of the optical film in the present preferred embodiment will not be limited.
The optical film in the present preferred embodiment includes: a substrate 10, a particle layer 11 and a dielectric layer 12. The part shown by the dotted line box in fig. 1 is a particle layer 11, and the particle layer 11 includes a plurality of particles 111, that is, the particle layer 11 is composed of a plurality of particles 111 distributed on the substrate 10.
Specifically, the particle layer 11 and the dielectric layer 12 are alternately disposed on the substrate 10, as shown in fig. 1. In the direction from the substrate 10 to the dielectric layer 12, the first layer in contact with the substrate 10 is the particle layer 11, the first dielectric layer 12 is on the first particle layer 11, and the first dielectric layer 12 fills the gaps between the particles 111. On top of the first dielectric layer 12 is a second granular layer 11 and so on until the structure shown in figure 1 is formed.
The spacing between the particles L may range from
To
The optical thickness of the dielectric layer may be in the range of
To
And the refractive index of the particle layer 11 is greater than or less than that of the dielectric layer 12, where 1 And λ 2 The center wavelength of the first band of wavelengths and the center wavelength of the second band of wavelengths, respectively. In fig. 1, d is the physical thickness of the dielectric layer.
In one embodiment, the precision of the inter-particle spacing is not more than 5% of the inter-particle spacing; the precision error of the optical thickness is not more than 5% of the optical thickness.
In practical applications, the value of the inter-particle distance L may be greater than the optical thickness of the dielectric layer, may also be smaller than the optical thickness of the dielectric layer, or may also be equal to the optical thickness of the dielectric layer, which is not limited herein. The optical film can be used for strongly reflecting the light with the central wavelength of the light with the first waveband and the light with the central wavelength of the light with the second waveband at the same time, and simultaneously, does not influence the light waves with other wavebands, thereby realizing the effect of narrow-band filtering. In a preferred embodiment, the interparticle distance is given by
The optical thickness of the dielectric layer is selected from
In a preferred embodiment, the first band of wavelengths is centered on a wavelength λ 1 With the central wavelength lambda of the light of the second wavelength band 2 And are equal. That is, the optical film is used for centering a center wavelength of λ 1 Narrow band filtering of the light. For example, when the center wavelength λ of the first band of light 1 With the central wavelength lambda of the light of the second wavelength band 2 When the light source is 440 nanometers, the optical film only can strongly reflect the high-energy blue light with the central wavelength of 440 nanometers, namely, the high-energy blue light is subjected to narrow-band filtering. When the optical film is attached to a screen of a mobile phone, when light emitted by an LED light source in the mobile phone is incident to the optical film, 90% of high-energy blue light in the LED light source is reflected by the optical film, namely most of the high-energy blue light is filtered, so that the transmitted light emitted from the optical film only contains a small amount of blue light of about 10%, and the damage of the high-energy blue light to eyes is reduced. Meanwhile, the optical film adopts a structure that the particle layers 11 and the medium layers 12 are alternately arranged, and the distance between the particles is 110 nanometers
Make the bandwidth that blue light was filtered to this blooming very narrow to avoid also filtering the light of other colours when filtering the blue light, under the circumstances of guaranteeing display effect, can reduce the injury of high energy blue light to eyes.
Of course, in other preferred embodiments, the center wavelength λ of the first band of wavelengths light 1 With the central wavelength lambda of the light of the second wavelength band 2 Or may not be equal. When the central wavelength λ of the first band light 1 With the central wavelength lambda of the light of the second wavelength band 2 When they are not equal, the optical film can perform narrow-band filtering on light with two central wavelengths, such as the central wavelength λ of the light with the first wavelength band 1 Taking the central wavelength lambda of the light with the wavelength of 440 nanometers and the second wave band 2 The thickness of the optical film is 700 nanometers, so that the optical film can simultaneously strongly reflect high-energy blue light and red light to realize the blue light and red lightNarrow band filtering of the light.
In a preferred embodiment, the first band of light has a center wavelength λ 1 And a center wavelength λ of the second band of wavelengths 2 The value range of (A) is 100 nm to 2000 μm, and in practical application, the value range can be determined according to the central wavelength λ of the first band light 1 And a central wavelength λ of the second band of wavelengths 2 The spacing of the particles 111 and the thickness of the dielectric layer 12 are designed to achieve strong reflection of light of a certain central wavelength or two central wavelengths. Meanwhile, the size of the particles 111 should not be too large, and the diameter of the particles 111 is generally smaller than
And the sizes of the plurality of particles may not be exactly the same. When the particle layer 11 is composed of only one layer of particles 111, the diameter of the particles 111 is the thickness of the particle layer 11.
In addition, the materials used for the particles 111 and the dielectric layer 12 include magnesium oxide, yttrium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, aluminum oxide, siO x 、TiO x 、NbO x One or more of them. In addition, siO x A compound formed of two elements, silicon (Si) and oxygen (O), for example, silicon and oxygen may generate a compound in a non-predetermined compositional ratio during the production of the compound by a chemical vapor deposition process. When the formulation is SiO, the composition ratio of silicon and oxygen is ideally 1. Thus, a compound generated from silicon and oxygen may be abbreviated as SiO x And x represents the composition ratio of oxygen to silicon, such as x being 1.2.TiO 2 x And NbO x Of (2) and SiO x Similarly, no further description is provided herein.
Of course, other materials not listed above may be used for the particles 111 and the dielectric layer 12, and there is no particular limitation as long as the refractive index of the particle layer 11 is greater than or less than that of the dielectric layer 12. For example, when magnesium oxide is used for the particle layer 11, zinc sulfide may be used for the dielectric layer 12 so that the refractive index of the particle layer 11 is smaller than that of the dielectric layer 12. Of course, zinc sulfide may be used for the particle layer 11, and magnesium oxide may be used for the dielectric layer 12, so that the refractive index of the particle layer 11 is larger than that of the dielectric layer 12.
Of course, different material may be used for different particle layers 11 or different medium layers 12, for example, in the particle layer 11 in fig. 1, a part of the particle layer 11 is made of magnesium oxide, another part of the particle layer 11 is made of yttrium oxide, and similarly, in the medium layer 12, a part of the medium layer 12 is made of zinc sulfide, and another part of the medium layer 12 is made of zinc selenide, so that the refractive index of the particle layer 11 is smaller than that of the medium layer 12. The specific materials of the particle layer 11 and the dielectric layer 12 may be selected according to actual needs, and are not particularly limited herein.
In the present preferred embodiment, the substrate 10 is a transparent substrate, such as a glass substrate or a quartz substrate, so that light passing through the optical film can be transmitted through the substrate 10, or incident light can be made incident into the particle layer 11 and the dielectric layer 12 through the substrate 10. When the optical film is used, incident light may be incident from the substrate 10 to the dielectric layer 12, or may be incident from the dielectric layer 12 to the substrate 10. The same technical effect can be achieved no matter from which direction the light enters.
Of course, in other embodiments, the substrate 10 may be a rubber substrate, a plastic substrate, a metal substrate, etc., and different substrates 10 may be selected according to the actual application of the optical film. For example, when the optical film is used to reflect a wavelength of light in the visible light band, the substrate 10 may be a glass substrate or a quartz substrate; when the optical film is used to reflect a wavelength of light of a microwave band, the substrate 10 may be a ceramic substrate, a rubber substrate, or a plastic substrate; when the optical film does not need to transmit light waves, the substrate 10 may be a metal substrate.
It should be noted that the structure of the optical film shown in fig. 1 is only one of the structures, that is, the layer contacting the substrate 10 is the particle layer 11, and the outermost layer away from the substrate 10 is the dielectric layer 12. The structure of the optical film of the present invention may also be other structures such as those shown in fig. 2 to 4. Referring to fig. 2 to 4, fig. 2, 3 and 4 are schematic structural diagrams of a second optical film, a third optical film and a fourth optical film, respectively, according to a preferred embodiment of the present invention.
In the structure of the second optical film shown in fig. 2, one layer contacting the substrate 10 is the particle layer 11, and the outermost layer away from the substrate 10 is also the particle layer 11. In the structure of the third optical film shown in fig. 3, one layer contacting the substrate 10 is the dielectric layer 12, and the outermost layer away from the substrate 10 is also the dielectric layer 12. In the structure of the fourth optical film shown in fig. 4, one layer contacting the substrate 10 is a dielectric layer 12, and the outermost layer away from the substrate 10 is a particle layer 11.
It should be noted that fig. 1 to 4 only illustrate the approximate positional relationship of the particles 111, and are not used to limit the specific arrangement of the plurality of particles 111 in the present invention. It can be understood that, in the actual manufacturing process of the particle layer 11, it is impossible to ensure that the plurality of particles 111 in each particle layer 11 are regularly arranged in the same distribution manner, and the plurality of particles 111 in each particle layer 11 may be irregularly arranged as long as the distance between the particles 111 is substantially equal.
In the optical film in the preferred embodiment, the dielectric layer and the particle layer are alternately arranged on the substrate, wherein the particle layer is composed of a plurality of particles, and the value range of the particle distance is
To is that
The optical thickness of the dielectric layer has a value range of
To is that
The refractive index of the particle layer is greater than or less than the refractive index of the dielectric layer. The optical film can be used for strongly reflecting light with one central wavelength or two central wavelengths at the same time, and does not influence light waves with other wave bands, so that the effect of narrow-band filtering can be realized.
Example two
The preferred embodiment provides a method for manufacturing an optical film, the optical film manufactured by the method can be used for reflecting light of a certain waveband, and allowing light of other wavebands to pass through, namely filtering the light of the certain waveband, and for example, the optical film can be attached to the surface of an LED display to play a role in reducing blue light transmission; or the method can be used for selecting the light wave of a certain specific wave band in the light waves and separating the light waves through reflection so as to obtain the light wave of the certain specific wave band. Here, the specific use of the optical film will not be limited.
The manufacturing method of the optical film comprises the following steps:
a substrate, and
the particle layer comprises a plurality of particles, and the spacing between the particles is in a value range
To
The value range of the optical thickness of the dielectric layer is
To is that
And the particle layer has a refractive index greater than or less than that of the dielectric layer, wherein λ 1 And λ 2 The center wavelength of the first band of wavelengths and the center wavelength of the second band of wavelengths, respectively.
The method of manufacturing the optical film will be described in detail below.
First, a substrate is selected, which may be selected according to the actual use of the optical film. When the optical film is used for reflecting a wavelength of light in a visible light waveband, the substrate can be a glass substrate or a quartz substrate, so that the light passing through the optical film can penetrate through the substrate, or the incident light can enter the particle layer and the dielectric layer through the substrate; when the optical film is used to reflect a wavelength of a microwave band, the substrate may be a ceramic substrate, a rubber substrate, or a plastic substrate; when the optical film does not need to transmit light waves, the substrate may be a metal substrate. Here, the kind of the substrate is not particularly limited.
And secondly, depositing the granular layer and the dielectric layer on the substrate in turn by a chemical vapor deposition method so as to form a dielectric layer and a granular layer structure which are alternately placed on the substrate. Of course, in other embodiments, a vacuum film forming process with controllable size manufacturing precision, a sol-gel film forming process, a self-organized film forming process, and a free combination process among the above processes may also be adopted; the vacuum film forming process comprises physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating, epitaxial growth and the like.
Specifically, in the preferred embodiment, by precisely controlling the deposition time, deposition speed, etc., a particle layer is deposited on the substrate, the particle layer comprises a plurality of particles distributed on the substrate surface, and the distance between the particles is controlled
To is that
The diameter of the particles is less than
The size of the particles may vary. Wherein λ is 1 Is the central wavelength, λ, of light in the first wavelength band 1 The value of (a) is in the range of 100 nm to 2000 μm.
After the first particle layer is manufactured, a first dielectric layer is manufactured. It will be appreciated that the material of the first dielectric layer will fill the voids between the particles due to the gaps between the particles. And forming a first dielectric layer by accurately controlling the deposition time, the deposition speed and other manufacturing parameters. Generally, the optical thickness of the dielectric layer ranges from
To
Wherein λ is 2 Is the central wavelength, λ, of the second band of light 2 The value of (a) is in the range of 100 nm to 2000 μm.
In the embodiment of the invention, the precision error of the particle spacing is not more than 5 percent of the particle spacing; the precision error of the optical thickness is not more than 5% of the optical thickness.
After the first medium layer is manufactured, a second granular layer is continuously deposited on the first medium layer, and the like is carried out until the last medium layer or granular layer is manufactured, and at the moment, the optical film consisting of the substrate, the medium layers and the granular layers which are alternately arranged on the substrate is manufactured.
In the process of manufacturing the optical film, the material of the particles and the material of the dielectric layer can be magnesium oxide, yttrium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride and SiO x 、TiO x 、NbO x One or more of various materials such as aluminum oxide, etc., and other materials not listed may also be used as long as the refractive index of the particle layer is greater than or less than that of the dielectric layer, and the specific material is not limited herein. For example, when magnesium oxide is used for the particle layer, zinc sulfide may be used for the dielectric layer so that the refractive index of the particle layer is smaller than that of the dielectric layer. Of course, the particle layer may also be made of zinc sulfide and the dielectric layer may be made of magnesium oxide, so that the refractive index of the particle layer is greater than that of the dielectric layer. In addition, different particle layers or different medium layers can also be made of different materials, for example, in the particle layer, one part of the particle layer is made of magnesium oxide, the other part of the particle layer is made of yttrium oxide, and similarly, in the medium layer, one part of the medium layer is made of zinc sulfide, and the other part of the medium layer is made of zinc selenide, so that the refractive index of the particle layer is smaller than that of the medium layer. The specific materials of the particle layer and the dielectric layer may be selected according to actual needs, and are not specifically limited herein.
In addition, the above-described manufacturing method is only one of the manufacturing methods of the optical film, and in other embodiments, the optical film may be manufactured by using other steps. For example, a substrate is taken, and parameters such as deposition time, deposition speed and the like are controlled to form a substrate, wherein a dielectric layer is deposited on the substrate, a first granular layer is deposited on the first dielectric layer, and a second dielectric layer is deposited on the first granular layer, wherein the second dielectric layer fills gaps among granules in the first granular layer. And repeating the steps until the last granular layer or the last dielectric layer is manufactured, and manufacturing the optical film consisting of the substrate, the dielectric layers and the granular layers which are alternately arranged on the substrate.
The method of making in the preferred embodiment forms an optical film by alternately making dielectric and particle layers on a substrate. The method has simple manufacturing process, and can manufacture the optical film provided by the invention, wherein the optical film can strongly reflect light waves of a certain specific waveband, does not influence light waves of other wavebands, and can realize narrow-band filtering.
The above-mentioned embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. An optical film for reflecting light in a wavelength band, comprising: the particle layer is arranged on the substrate in an alternating mode; the particle layer comprises a plurality of particles, and the spacing between the particles is in the range of
To is that
Taking the optical thickness of the dielectric layerA value range of
To
And the refractive index of the particle layer is greater than or less than that of the dielectric layer, wherein lambda 1 And λ 2 The central wavelength of the first wave band light and the central wavelength of the second wave band light respectively, and the optical film can simultaneously align the central wavelength of the first wave band light and the central wavelength of the second wave band light to be lambda 1 Of a first band of light and a central wavelength of λ 2 The second wavelength band light of (2) is strongly reflected without affecting the wavelength band light near the first wavelength band light and the second wavelength band light.
2. The optical film of claim 1, wherein the first band of light has a center wavelength λ 1 With the central wavelength lambda of the light of the second wavelength band 2 And are equal.
3. The optical film of claim 1, wherein the layer contacting the substrate is the particle layer and the outermost layer away from the substrate is the particle layer or the dielectric layer.
4. The optical film of claim 1, wherein the layer contacting the substrate is the dielectric layer and the outermost layer away from the substrate is the particle layer or the dielectric layer.
5. The optical film of claim 1, wherein the particles have a diameter less than
6. The optical film according to claim 5, wherein the first wavelength band light has a center wavelength λ 1 And the center wavelength of the second band of lightλ 2 The value of (a) is in the range of 100 nm to 2000 μm.
7. The optical film of claim 1, wherein the particles and the dielectric layer are made of a material selected from the group consisting of magnesium oxide, yttrium oxide, zinc sulfide, zinc selenide, gallium arsenide, magnesium fluoride, calcium fluoride, aluminum oxide, siO x 、TiO x And/or NbO x 。
8. The optical film according to claim 1, wherein the substrate comprises a metal substrate, a glass substrate, a quartz substrate, a rubber substrate, or a plastic substrate.
9. A method of making an optical film, comprising:
a substrate, and
the dielectric layer and the particle layer are alternately manufactured on the substrate; the particle layer comprises a plurality of particles, and the spacing between the particles is in the range of
To is that
The value range of the optical thickness of the dielectric layer is
To
And the refractive index of the particle layer is greater than or less than that of the dielectric layer, wherein lambda 1 And λ 2 The central wavelength of the first wave band light and the central wavelength of the second wave band light respectively, and the optical film can simultaneously align the central wavelength of the first wave band light and the central wavelength of the second wave band light to be lambda 1 Of a first band of light and a central wavelength of λ 2 Does not reflect the light of the wavelength band near the first wavelength band light and the second wavelength band lightThe light has an influence.
10. The method of claim 9, wherein the alternating dielectric and particle layers are formed by a vacuum deposition process, a sol-gel film deposition process, and/or a self-assembled film deposition process; wherein the vacuum film forming process comprises physical/chemical vapor deposition, evaporation coating, magnetron sputtering coating, ion plating and epitaxial growth; the precision error of the inter-particle distance is not more than 5% of the inter-particle distance; the precision error of the optical thickness is not more than 5% of the optical thickness.
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| PCT/CN2017/080748 WO2018120521A1 (en) | 2016-12-26 | 2017-04-17 | Optical film and manufacturing method therefor |
| JP2019536042A JP6760678B2 (en) | 2016-12-26 | 2017-04-17 | Optical film and its manufacturing method |
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| CN107144901B (en) * | 2017-06-19 | 2020-04-07 | 深圳市光科全息技术有限公司 | Optical slurry film preparation method and optical film |
| TWI781296B (en) * | 2018-02-28 | 2022-10-21 | 日商參天製藥股份有限公司 | Ophthalmic composition containing Diquafosol and a cationic polymer |
| CN110889478A (en) * | 2019-11-12 | 2020-03-17 | 深圳市光科全息技术有限公司 | Infrared scattering film, preparation method thereof, infrared scattering commodity and identification system |
| CN111323960A (en) * | 2020-04-07 | 2020-06-23 | Tcl华星光电技术有限公司 | Light-transmitting substrate and display device |
| CN114690289A (en) * | 2022-03-18 | 2022-07-01 | Tcl华星光电技术有限公司 | Optical film layer, manufacturing method thereof, polarizer and display panel |
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| JP4356779B2 (en) * | 2007-07-13 | 2009-11-04 | 豊田合成株式会社 | Infrared reflecting material, infrared reflecting laminate, infrared reflecting structure, and method for producing the same |
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| CN1492616A (en) * | 2002-10-23 | 2004-04-28 | 鸿富锦精密工业（深圳）有限公司 | Film filter |
| CN101269917A (en) * | 2007-03-21 | 2008-09-24 | 鸿富锦精密工业（深圳）有限公司 | Glass with low radiation |
| EP3067197A1 (en) * | 2013-11-04 | 2016-09-14 | Materials Vision Co., Ltd. | Multi-layer coating system using voids for heat shielding system and method for manufacturing same |
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| JP2020503563A (en) | 2020-01-30 |
| JP6760678B2 (en) | 2020-09-23 |
| CN106772747A (en) | 2017-05-31 |
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