WO2018117636A1 - Metal laminate and method for manufacturing same - Google Patents

Metal laminate and method for manufacturing same Download PDF

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Publication number
WO2018117636A1
WO2018117636A1 PCT/KR2017/015122 KR2017015122W WO2018117636A1 WO 2018117636 A1 WO2018117636 A1 WO 2018117636A1 KR 2017015122 W KR2017015122 W KR 2017015122W WO 2018117636 A1 WO2018117636 A1 WO 2018117636A1
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WO
WIPO (PCT)
Prior art keywords
metal
fluorine
based film
laminate
core layer
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PCT/KR2017/015122
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French (fr)
Korean (ko)
Inventor
신주호
김진웅
김용욱
Original Assignee
주식회사 두산
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Publication of WO2018117636A1 publication Critical patent/WO2018117636A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/085Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/02Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/12Layered products comprising a layer of synthetic resin next to a fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • B32B27/322Layered products comprising a layer of synthetic resin comprising polyolefins comprising halogenated polyolefins, e.g. PTFE
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/06Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/10Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/02Composition of the impregnated, bonded or embedded layer
    • B32B2260/021Fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/04Impregnation, embedding, or binder material
    • B32B2260/046Synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/306Resistant to heat

Definitions

  • the present invention relates to a metal laminated plate and a method for manufacturing the same, and provides a metal laminated plate for a printed circuit board and a method for manufacturing the same that can be stably operated in a high frequency band.
  • Metal laminates manufactured using epoxy resins of a metal laminate for manufacturing a printed circuit board may be impregnated with an epoxy resin in a glass fabric, drying the impregnated fibers to remove other organic solvents, and curing the resin.
  • the fluorine-based resin is a thermoplastic resin and has a non-adhesive property that does not adhere well to other materials due to physically very low surface energy, so that the fluorine resin and the conductive metal foil are usually directly attached. Since it was difficult, the method of directly laminating the conductive metal foil on the resin as described above could not be used.
  • thermosetting resin having a low melting point on various heat-resistant polymer insulating fluorine resins such as polytetrafluoroethylene (PTFE) resin and resin impregnated with polytetrafluoroethylene in glass fiber tissues for adhesion of fluorine resin with other materials.
  • PTFE polytetrafluoroethylene
  • An adhesive film or an adhesive is placed and the conductive metal foil is compressed and cured under heating / pressurization as a medium to be laminated.
  • the present invention is to develop a metal laminated plate for a printed circuit board that can reduce the manufacturing cost according to the simplification of the manufacturing process as well as excellent overall physical properties including low loss coefficient, low dielectric constant, heat resistance suitable for high frequency band.
  • an object of the present invention is to provide a metal laminated plate having excellent low dielectric constant and heat resistance and a method of manufacturing the same. It is done.
  • the present invention is to produce a laminate by impregnating a material having a high heat resistance on the fiber substrate and then ply-up the fluorine-based film, by laminating a conductive metal foil on the laminate and then integrated by high temperature compression in a short time. It is an object of the present invention to provide a metal laminate and a method of manufacturing the same, which exhibit high adhesion between metal foil and film and low dielectric properties.
  • the present invention provides a metal laminated plate to which a low dielectric constant material is applied, and a manufacturing method thereof.
  • the present invention provides a high heat resistant core layer comprising a fibrous substrate; Fluorine-based film laminated on both sides of the core layer; And a metal foil laminated on the fluorine-based film, wherein the fluorine-based film provides a metal laminate, characterized in that it comprises a filler (filler).
  • the fluorine-based film is a fluoropolymer film selected from the group consisting of polytetrafluoroethylene (PTFE), fluoro and ethylene-propylene copolymers and fluorocarbon backbones with perfluoroalkoxy side chains. And, preferably, a perfluoro alkoxy (PFA) film.
  • PTFE polytetrafluoroethylene
  • PFA perfluoro alkoxy
  • the filler in the fluorine-based film may be included in an amount of 10 to 70% by weight.
  • the filler is one of silica (silica), titanium dioxide (TiO 2 ), alumina (Al 2 O 3 ), potassium titanate (K 2 O 6 TiO 2 ), barium oxide (BaO) Can be.
  • the core layer may include a resin layer cured by impregnating the fiber substrate in a high heat resistant resin composition.
  • the high heat resistant resin composition is bisphenol A (bisphenol A) epoxy, aromatic naphthalene epoxy, biphenyl aralkyl type epoxy, isocyanurate epoxy, cresol noblec (cresol) novlac) type epoxy resin, and high heat resistant epoxy resin.
  • the fiber substrate may be spread glass fibers (Spread G / F).
  • the spread glass fibers are glass fibers; And an inorganic binder.
  • the metal foil is preferably copper foil having a roughness Rz in the range of 0.5 to 5.0 ⁇ m.
  • the coefficient of thermal expansion (CTE) of the metal laminate is preferably 5 to 40 ppm.
  • the peel strength (P / S) of the metal foil to the fluorine-based film in the metal laminate is preferably in the range of 0.8 to 1.5 kgf / cm.
  • the present invention comprises the steps of (a) impregnating a fiber substrate in the high heat-resistant resin composition and then semi-curing to prepare a core layer, and (b) sequentially stacking a fluorine-based film and a metal foil on the upper and lower surfaces of the core layer, respectively. Then, it provides a method for producing a metal laminate comprising the step of integrating into a high temperature compression process.
  • the present invention comprises the steps of (a) laminating a fluorine-based film on the upper and lower surfaces of the core layer, respectively, and (b) laminating metal foils on the upper and lower surfaces of the laminate, respectively, and then integrated into a high temperature compression process. It provides a method for producing a metal laminate comprising the step of.
  • the core layer may include glass fiber.
  • the high temperature compression process is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 °C.
  • the metal laminate according to the present invention satisfies a low loss factor, low dielectric properties, heat resistance, and adhesion stability at the same time, the printed circuit board using the same may exhibit excellent high frequency characteristics, good heat resistance, and adhesive stability.
  • the manufacturing method of the metal laminated plate according to the present invention is inexpensive processing cost by integrating by high temperature compression in a short time, and because the unique intrinsic properties can be used as it is by minimizing the change in electrical and mechanical properties of low dielectric constant material, high frequency band It is possible to produce a metal laminated plate having a low loss coefficient, which has excellent electrical characteristics, which can operate very stably.
  • the metal laminate of the present invention is a component of a printed circuit board used in a mobile communication device that handles high-frequency signals of 1 GHz or more, network-based electronic devices such as base station devices, servers, routers, and various electrical and electronic devices such as large computers. It can be usefully used as.
  • FIG. 1 is a cross-sectional view of a metal laminate according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of a metal laminate according to another embodiment of the present invention.
  • the present invention is to provide a metal laminated plate that can be usefully used in printed circuit boards, especially printed circuit boards for ultra-high frequency applications.
  • a core layer including a fiber substrate, a fluorine-based film laminated on both sides of the core layer, and a metal foil laminated on the fluorine-based film, the fluorine-based film on the core layer
  • a metal laminated plate bonded by high temperature compression.
  • the core layer means a prepreg including a fiber base, and preferably means a high heat resistant prepreg formed by impregnating a fiber base in the high heat resistant resin composition.
  • the metal laminate according to the present invention is a high heat-resistant prepreg; A fluorine-based film having a low dielectric constant; And a structure in which a metal foil having low roughness is laminated, and by securing adhesion stability of each layer, the effects of low loss coefficient, low dielectric property, heat resistance, and adhesion stability can be simultaneously given to the printed circuit board using the metal laminate. Can be.
  • FIG. 1 schematically shows a cross section of a metal laminate 100 according to an embodiment of the present invention.
  • the metal laminate 100 includes a prepreg 110 including a fiber base, a fluorine-based film 130 laminated on both surfaces of the prepreg, and a metal foil laminated on the fluorine-based film ( 170).
  • the prepreg 110 of the present invention includes a fiber substrate and a resin layer cured by impregnating the fiber substrate with the high heat resistant resin composition.
  • the high heat resistant resin composition may be a resin varnish dissolved or dispersed in a solvent.
  • the fibrous substrate may be arbitrarily bent, and may be used in the art of a conventional inorganic fiber substrate, organic fiber substrate, or a mixed form thereof. What is necessary is just to select the above-mentioned fiber base material based on the use or performance to be used.
  • Examples of the substrate used in the present invention include inorganic fibers such as E-glass, D-glass, S-glass, NE-glass, T-glass, and Q-glass, and organic fibers such as polyimide, polyamide, polyester, and the like. Mixtures, etc. are selected based on the intended use or performance.
  • Non-limiting examples of fiber substrates that can be used include glass fibers (inorganic fibers) such as E-glass, D-glass, S-glass, NE-glass, T-glass, Q-glass, and the like; Organic fibers such as glass paper, glass fiber nonwoven fabric, glass cloth, aramid fiber, aramid paper, polyimide, polyamide, polyester, aromatic polyester, fluororesin, and the like; Carbon fibers, paper, inorganic fibers, or a mixture of one or more thereof.
  • the fiber base may be formed of a woven or nonwoven fabric made of the aforementioned fibers, roving, chopped strand mat, surfacing mat, metal fiber, carbon fiber, mineral fiber, or the like. Woven fabrics, nonwoven fabrics, mats, etc. may be mentioned.
  • this base materials can be used individually or in mixture of 2 or more types.
  • the stiffness and dimensional stability of the prepreg can be improved.
  • the thickness of this fibrous substrate is not particularly limited and may be, for example, in the range of about 0.01 mm to 0.3 mm.
  • the high heat resistant resin composition is used to form the prepreg 110, and the prepreg 110 may include a resin layer cured by impregnating the fiber base in the high heat resistant resin composition.
  • the high heat resistant resin composition used in the present invention is not particularly limited as long as it is a composition excellent in heat resistance known in the art, but is not particularly limited in terms of its chemical composition.
  • bisphenol A epoxy, aromatic naphthalene epoxy, and biphenyl are used. It is preferable to include at least one of an alkyl (biphenyl aralkyl) type epoxy, an isocyanurate epoxy, a cresol novlac type epoxy resin, and a high heat resistant epoxy resin.
  • the prepreg refers to a sheet-like material obtained by coating a fibrous substrate with a resin composition or by impregnating the fibrous substrate with a resin composition and curing it to B-stage (semicured state) by heating.
  • the prepreg 110 of the present invention may be prepared by known solvent methods known in the art.
  • the solvent method is a method of drying after impregnating a fibrous substrate with a resin composition varnish formed by dissolving the resin composition for prepreg formation in an organic solvent.
  • a resin varnish is generally used.
  • the method of impregnating a fiber base material in the said resin composition the method of immersing a base material in a resin varnish, the method of apply
  • the fiber base material is immersed in a resin varnish, since the impregnation property of the resin composition with respect to a fiber base material can be improved, it is preferable.
  • the prepreg 110 of this invention can be manufactured by impregnating the said heat resistant resin composition with the sheet-like fiber base material or glass base material which consists of a fiber, and semi-hardening by heating.
  • the heat resistant resin composition may be prepared by a resin varnish.
  • ketones such as acetone, methyl ethyl ketone, cyclohexanone, an acetic acid, such as ethyl acetate, butyl acetate, a cellosolve acetate, a propylene glycol monomethyl ether acetate, and a carbitol acetate
  • Carbitols such as esters, cellosolves and butyl carbitol
  • aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran and the like.
  • You may use an organic solvent 1 type or in combination of 2 or more types.
  • the prepreg 110 of the present invention may be formed through an additional drying process after impregnating the substrate in the resin varnish, wherein the drying may be performed at 20 to 200 °C.
  • the prepreg 110 of the present invention is impregnated with the substrate in the high heat-resistant resin varnish and heat-dried for 1 to 10 minutes at a temperature in the range of 70 to 170 °C, the prepreg of the semi-cured state (B-Stage) Legs can be prepared.
  • the metal laminate 100 includes a fluorine-based film 130 laminated on both surfaces of the prepreg 110 as a material having a low dielectric constant.
  • low dielectric constant materials usable in the present invention include fluoropolymers selected from the group consisting of polytetrafluoroethylene (PTFE), fluoro and ethylene-propylene copolymers, and fluorocarbon backbones with perfluoroalkoxy side chains.
  • PTFE polytetrafluoroethylene
  • fluoro and ethylene-propylene copolymers fluorocarbon backbones with perfluoroalkoxy side chains.
  • fluoropolymers selected from the group consisting of polytetrafluoroethylene (PTFE), fluoro and ethylene-propylene copolymers, and fluorocarbon backbones with perfluoroalkoxy side chains.
  • PTFE polytetrafluoroethylene
  • PFA perfluoro alkoxy
  • Prior art has been prepared by impregnating polytetrafluoroethylene (PTFE) resin into glass fiber 5-6 times, high temperature / high pressure press process, but the present invention impregnates glass fiber with high heat-resistant resin, high temperature / Manufacturing through high pressure compression process has the advantage of reducing the productivity, manufacturing process cost.
  • PTFE polytetrafluoroethylene
  • CTE coefficient of thermal expansion
  • a material having a low dielectric constant such as perfluoro alkoxy (PFA), such as a fluororesin
  • PFA perfluoro alkoxy
  • the fluoro-based film 130 is preferably a perfluoro alkoxy (PFA) film, the fluorine-based film 130 may include a filler.
  • PFA perfluoro alkoxy
  • the filler is included in the fluorine-based film, it may have an effect of improving the properties such as G / F impregnation, productivity, thermal expansion coefficient (CTE) of the fluorine-based film.
  • Non-limiting examples of the filler at least one of silica (silica), titanium dioxide (TiO 2 ), alumina (Al 2 O 3 ), potassium titanate (K 2 O 6 TiO 2 ), barium oxide (BaO) Among these, silica is preferable.
  • the filler may be included in an amount of 10 to 70% by weight in the fluorine-based film, for example, it is preferably included in an amount of 40% by weight.
  • the content of the filler in the fluorine-based film is less than 40% by weight can not exhibit a CTE (Z-axis) improvement effect, when included in an amount exceeding 70% by weight is a problem that the film is not formed.
  • the thickness of the fluorine-based film 130 is not particularly limited, but may be in the range of 25 to 125 ⁇ m, preferably 50 ⁇ m.
  • the metal laminate 100 includes a metal foil 170 laminated on the laminate 150 of the prepreg 110 and the fluorine-based film 130.
  • the metal foil 170 may be made of a conventional metal or alloy known in the art without limitation. At this time, when the metal foil is a copper foil, the metal laminated plate 100 according to the present invention can be used as a copper foil laminate. Preferably, the metal foil 170 is copper foil.
  • the said copper foil includes all the copper foils manufactured by the rolling method and the electrolytic method.
  • the copper foil may be subjected to rust prevention treatment in order to prevent the surface from being oxidized and corroded.
  • the metal foil 170 may have a predetermined surface roughness Rz formed on one surface in contact with the fluorine-based film 130.
  • the surface roughness (Rz) is preferably in the range of 0.5 to 5.0 ⁇ m. If the surface roughness is less than 0.5 ⁇ m, the adhesion between the metal foil 170 and the fluorine-based film 130 is insufficient.
  • the thickness of the metal foil 170 is not particularly limited, but may be used less than 7 ⁇ m in consideration of the thickness and mechanical properties of the final product, preferably may be in the range of 3 to 7 ⁇ m. Examples of copper foil that can be used include CFL (TZA_B, HFZ_B), Mitsui (HSVSP, MLS-G), Nikko (RTCHP), Furukawa, ILSIN and the like.
  • a prepreg 110 impregnated by impregnation with a high heat resistant varnish as described above; Fluorine-based film 130; And the metal laminated plate 100 formed by integrally stacked at a high temperature and high pressure after the metal foil 170 is sequentially stacked may have a coefficient of thermal expansion (CTE) of 5 to 40 range.
  • CTE coefficient of thermal expansion
  • the peel strength (P / S) of the metal foil 170 to the fluorine-based film 130 in the metal laminate 100 may be in the range of 0.8 to 1.5 kgf / cm.
  • An embodiment of the present invention includes a method of manufacturing a metal laminate plate formed by laminating the prepreg and the fluorine-based film described above to form a laminate, and then laminating the metal foil on the laminate and molding the same by a high temperature compression process. .
  • the method of manufacturing a metal laminate 100 comprises the steps of (a) manufacturing a prepreg 110 by impregnating a glass fiber in the high heat-resistant resin composition and then semi-curing; (b) sequentially stacking the fluorine-based film 130 and the metal foil 170 on both surfaces of the prepreg 110, and then performing a high temperature compression process to integrate them.
  • the high temperature compression process of step (b) is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 °C.
  • one embodiment of the present invention includes a multilayer printed circuit board, preferably a multilayer printed circuit board, including at least one selected from the group consisting of the core layer, the fluorine-based film, and the metal foil described above.
  • the printed circuit board refers to a printed circuit board laminated by one or more layers by a plating through hole method, a buildup method, or the like, and may be manufactured by a conventional method known in the art. As a preferable example thereof, it can be manufactured by opening a hole in the metal laminated plate 100 according to the present invention to perform through hole plating, and then forming a circuit by etching a metal foil including a plating film.
  • the metal laminate 200 according to another embodiment of the present invention is the same except that the structure of the core layer and the lamination method of the fluorine-based film are different from those of the metal laminate plate 100 described above with reference to FIG. 1. Therefore, the description of the same configuration is omitted for the sake of brevity of the specification.
  • a metal laminate comprising a core layer including a fiber substrate, a fluorine-based film laminated on both sides of the core layer, and a metal foil laminated on the fluorine-based film.
  • the core layer means a fiber base, preferably glass fiber (Spread G / F).
  • FIG. 2 is a schematic cross-sectional view of the metal laminate 200 according to another embodiment of the present invention.
  • the metal laminate 200 may include a fiber base 210, a fluorine-based film 230 laminated on both sides of the fiber base, and a metal foil 270 stacked on the fluorine-based film. Can be.
  • the fiber substrate 210 may be arbitrarily bent, may be used in the art of conventional flexible inorganic fiber substrates, organic fiber substrates, or a mixture thereof. What is necessary is just to select the above-mentioned fiber base material based on the use or performance to be used.
  • the fiber substrate 210 it is preferable to use spread G / F as the fiber substrate 210.
  • the spread glass fibers are glass fibers; And an inorganic binder.
  • Spread glass fibers can be prepared by a conventional method, for example, after stirring the glass fiber and the inorganic binder solution to form a mixed solution, to remove the water from the mixed solution to obtain an extract and then to compress and dry the extract It can be prepared by the method.
  • the inorganic binder is not particularly limited, but may be an aluminum compound produced by neutralizing an acidic solution (eg, aluminum sulfate) and a basic solution (eg, sodium hydroxide) containing aluminum.
  • an acidic solution eg, aluminum sulfate
  • a basic solution eg, sodium hydroxide
  • the metal laminate 200 includes a fluorine-based film 230 laminated on both surfaces of the fiber substrate 210 as a low dielectric constant material.
  • the fluorine-based film 230 in the form of a film so as not to impair the excellent electrical properties and high heat resistance of the material having a low dielectric constant
  • an example of the fluorine-based film used is perfluoro alkoxy ( PFA) films are preferred.
  • the prepreg 110 and the fluorine-based film 130 may be formed by laminating the fluorine-based film 130 on the prepreg 110 in a semi-cured state in which the high heat-resistant resin composition is impregnated with the fiber substrate.
  • the laminate 150 is formed.
  • the laminate 250 of the fiber base 210 and the fluorine film 230 is laminated by stacking the fluorine-based film 230 on both sides of the fiber base 210 by a press process. To form.
  • the metal laminate 200 includes a metal foil 270 laminated on the laminate 250 of the fiber base 210 and the fluorine-based film 230. At this time, the metal foil 270 is laminated on the laminate 250 and then integrated by a high temperature compression process to form the metal laminate 200.
  • Another embodiment of the present invention includes a method of manufacturing a metal laminated plate that is formed by sequentially laminating the above-described fiber substrate and the fluorine-based film to form a laminate, and then laminating metal foils and molding them by a high temperature compression process.
  • the manufacturing method of the metal laminate 200 (a) to prepare a laminate 250 by laminating the fluorine-based film 230 on the upper and lower surfaces of the fiber base 210, respectively. Making; And (b) stacking the metal foils 270 on the upper and lower surfaces of the laminate, and then integrating the same into a high temperature compression process.
  • the high temperature compression process of step (b) is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 °C.
  • another embodiment of the present invention includes a laminated printed circuit board, preferably a multilayer printed circuit board, including at least one selected from the group consisting of the fiber substrate, the fluorine-based film, and the metal foil.
  • the metal laminate may be prepared from the core layer, the fluorine-based film, and the metal foil according to the present invention.
  • These metal laminates not only had low dielectric constant and dielectric loss, but also had a low coefficient of thermal expansion (CTE) and good adhesion stability (see Table 1 below). Therefore, the metal laminate of the present invention is a network printed circuit board used in mobile communication devices that handle high frequency signals of 1 GHz or more, network-based electronic devices such as base station devices, servers, routers, and various electrical and electronic devices such as large computers. It can be usefully used as a component.
  • a high heat resistant resin composition was prepared with a high heat resistant epoxy resin composition and a resin varnish was prepared.
  • the prepared resin varnish was impregnated with a glass fiber having a thickness of 1 to 2 ⁇ m, and then dried at 165 ° C. for 1 to 10 minutes to prepare a prepreg in a semi-cured state.
  • a 50 ⁇ m (0.05T) thick perfluoro alkoxy (PFA) film (40 wt% silica) was laminated on both sides of the prepreg to obtain a laminate.
  • a copper foil laminated plate was obtained in the same manner as in Example 1 except that a polytetrafluoro film (50 wt%) was used.
  • PFA perfluoro alkoxy
  • the copper foil of 18 micrometers thickness was laminated
  • the prepared 25 ⁇ m-thick glass fibers were impregnated with a polytetrafluoroemulsion three times or more, and then dried at 165 ° C. for 3 to 10 minutes to prepare a polytetrafluoro prepreg.
  • Modulus of elasticity (Young Modulus, MPa): Measured using a UTM equipment in accordance with the test standard of IPC TM-650 2.4.4 / ASTM D3039.
  • Elongation (Elong,%): Measured using UTM equipment according to the test standard of IPC TM-650 2.4.4 / ASTM D3039.
  • TGA Ash% (Air) TGA (Thermogravimetric) was measured according to the test standard of IPC TM-650.2.4.24.6.
  • Dielectric constant (Dk) Measured using a material analyzer in accordance with the test standard of IPC TM-650.2.5.5.1.
  • Dielectric loss (Df) measured using a material analyzer in accordance with the test standard of IPC TM-650.2.5.5.1.
  • Example 2 Example 3 Filler Type - SC-2500SQ SC-2500SQ SC-2500SQ Film appearance Good Good bow Good Molding appearance Good Good bow Good Tensile strength (MPa) 40 85 74 86 Modulus of elasticity (MPa) 2017 2792 2902 2654 Elongation (%) 10 6 5 6 CTE (x / y, ppm) 27 18 12 17 CTE (z, ppm) 200 35 27 34 P / S (Hoz) 1.3 ⁇ 3.4 1.2 1.05 1.25 TGA Ash% (Air) - 39 48 39 S / F @ 288 > 10 minutes > 10 minutes > 10 minutes > 10 minutes > 10 minutes 10 minutes 10 Ghz Dk 2.2 2.76 2.85 2.78 Df 0.001 0.0012 0.0014 0.0012

Abstract

The present invention provides a metal laminate and a method for manufacturing the same. The metal laminate comprises: a core layer including a fiber material; and a fluorine-based film laminated on both sides of the core layer; a metal foil laminated on the fluorine-based film, wherein the fluorine-based film comprises a filler. The present invention can provide a metal laminate for ultra-high frequencies which exhibits excellent low dielectric loss characteristics, good heat resistance, adhesion stability, etc. at the same time.

Description

금속적층판 및 이의 제조방법Metal laminate and its manufacturing method
본 발명은 금속적층판 및 이의 제조방법에 관한 것으로서, 고주파수 대역에서 안정적인 작동이 가능한 인쇄회로기판용 금속적층판 및 이의 제조방법을 제공한다.The present invention relates to a metal laminated plate and a method for manufacturing the same, and provides a metal laminated plate for a printed circuit board and a method for manufacturing the same that can be stably operated in a high frequency band.
최근 반도체 기판, 인쇄회로기판, EMC(Epoxy molding Compound) 등과 같은 전자 부품 및 정보 통신 기기의 신호대역이 높아지는 경향을 나타내고 있다. 전기 신호의 전송 손실은 유전 정접 및 주파수와 비례한다. 따라서 주파수가 높은 만큼 전송 손실은 커지고 신호의 감쇠를 불러 신호 전송의 신뢰성 저하가 생긴다. 또한 전송 손실이 열로 변환되어 발열의 문제도 야기될 수 있다. 그렇기 때문에 고주파 영역에서는 유전 정접이 매우 작은 절연 재료를 필요로 한다.Recently, signal bands of electronic components such as semiconductor substrates, printed circuit boards, and epoxy molding compounds (EMCs) and information communication devices have increased. The transmission loss of the electrical signal is proportional to the dielectric tangent and frequency. Therefore, the higher the frequency, the greater the transmission loss and the attenuation of the signal, resulting in a lower reliability of the signal transmission. In addition, transfer loss may be converted into heat, which may cause heat generation problems. Thus, in the high frequency range, dielectric materials with very small dielectric tangents are required.
또한, 현재 반도체 기기 및 PCB 분야에서의 고집적화, 고미세화, 고성능화 등에 대한 요구가 높아지므로, 반도체 기기의 집적 및 인쇄 회로기판의 고밀도화 동시에 배선의 간격의 간결성이 요구되는 상황으로 점차 변화되고 있다. 이러한 특성을 만족시키기 위해서는 전송 속도를 빠르게 하는 저유전율과 전송 손실을 감소시키기 위한 저 유전손실 물질을 사용하는 것이 바람직하다.In addition, since the demand for high integration, high microdefinition, high performance, and the like in the semiconductor device and PCB field is increasing, the situation is gradually changing to a situation in which integration of semiconductor devices and high density of printed circuit boards and simplicity of wiring intervals are required. In order to satisfy these characteristics, it is desirable to use a low dielectric constant material for increasing the transmission speed and a low dielectric loss material for reducing the transmission loss.
일반적인 인쇄회로기판을 제조하기 위한 금속적층판 중 에폭시 수지를 이용하여 제조되는 금속적층판은 유리 직물에 에폭시 수지를 함침시키는 단계, 함침된 섬유를 건조시켜 기타 유기 용매를 제거하는 단계, 수지를 경화시킬 수 있도록 반경화 상태로 전환시키기 위한 프리프레그 생성 단계, 및 전도성 금속박을 적층시키는 단계로 제조된다.Metal laminates manufactured using epoxy resins of a metal laminate for manufacturing a printed circuit board may be impregnated with an epoxy resin in a glass fabric, drying the impregnated fibers to remove other organic solvents, and curing the resin. A prepreg generation step for switching to the semi-cured state, and a step of laminating the conductive metal foil.
한편, 불소계 수지를 이용하여 금속적층판을 제조하는 경우에는, 불소계 수지가 열가소성 수지이면서 물리적으로 매우 낮은 표면 에너지로 인해 다른 물질과 잘 붙지 않는 비점착성을 가지고 있어서 통상 불소 수지와 전도성 금속박을 직접적으로 붙이기 어렵기 때문에 상기와 같이 수지에 전도성 금속박을 직접 적층시키는 방법을 사용할 수 없었다.On the other hand, when manufacturing a metal laminate using a fluorine-based resin, the fluorine-based resin is a thermoplastic resin and has a non-adhesive property that does not adhere well to other materials due to physically very low surface energy, so that the fluorine resin and the conductive metal foil are usually directly attached. Since it was difficult, the method of directly laminating the conductive metal foil on the resin as described above could not be used.
불소계 수지와 다른 물질과의 접착을 위해 지금까지는, 폴리테트라플루오로에틸렌(PTFE) 수지 및 유리 섬유 조직에 폴리테트라플루오로 에틸렌이 함침된 수지 등의 각종 내열성 고분자 절연 불소계 수지 위에 용융점이 낮은 열경화성 수지, 접착 필름 또는 접착제를 놓고 이를 매개체로 전도성 금속박을 가열/가압하에서 압축 경화시켜 적층하는 방법을 채택하고 있다.The thermosetting resin having a low melting point on various heat-resistant polymer insulating fluorine resins such as polytetrafluoroethylene (PTFE) resin and resin impregnated with polytetrafluoroethylene in glass fiber tissues for adhesion of fluorine resin with other materials. , An adhesive film or an adhesive is placed and the conductive metal foil is compressed and cured under heating / pressurization as a medium to be laminated.
그러나, 이 같은 방법에서는, 3회 이상의 함침 과정을 실시함에 따라 고분자 절연 수지 특유의 장점인 내열성이 떨어지는 문제점이 있으며, 350℃에서 24시간 이상의 장시간 동안 고온 압축을 실시하여야 하므로 공정 비용이 높아진다는 문제점이 있다.However, in such a method, there is a problem that the heat resistance, which is a characteristic of the polymer insulating resin, is inferior as three or more impregnation processes are performed, and the process cost increases because high temperature compression must be performed at 350 ° C. for at least 24 hours. There is this.
본 발명은 고주파수 대역에 적합한 적은 손실계수와 저유전율 특성, 및 내열성을 비롯한 전반적인 물성이 우수할 뿐 아니라, 제조 공정의 간소화에 따른 제조 경비 절감이 가능한 인쇄회로기판용 금속적층판을 개발하고자 한다.The present invention is to develop a metal laminated plate for a printed circuit board that can reduce the manufacturing cost according to the simplification of the manufacturing process as well as excellent overall physical properties including low loss coefficient, low dielectric constant, heat resistance suitable for high frequency band.
이를 위해, 본 발명에서는 고내열성 프리프레그 상에 저유전율을 갖는 소재 및 전도성 금속박을 적층시킨 후 단시간에 고온 압착으로 일체화시킴으로써, 저유전율 특성 및 내열성이 우수한 금속적층판 및 이의 제조방법을 제공하는 것을 목적으로 한다.To this end, in the present invention, by laminating a material having a low dielectric constant and a conductive metal foil on a high heat resistant prepreg and then integrating it by high temperature compression in a short time, an object of the present invention is to provide a metal laminated plate having excellent low dielectric constant and heat resistance and a method of manufacturing the same. It is done.
또한 본 발명은 섬유 기재 상에 고내열성을 갖는 소재를 함침 후 불소계 필름을 적층(Ply-up)하여 적층체를 제조하고, 상기 적층체 상에 전도성 금속박을 적층시킨 후 단시간에 고온 압착으로 일체화시킴으로써, 금속박과 필름의 밀착성이 높은 동시에 낮은 유전특성을 발휘하는 금속적층판 및 이의 제조방법을 제공하는 것을 목적으로 한다.In addition, the present invention is to produce a laminate by impregnating a material having a high heat resistance on the fiber substrate and then ply-up the fluorine-based film, by laminating a conductive metal foil on the laminate and then integrated by high temperature compression in a short time. It is an object of the present invention to provide a metal laminate and a method of manufacturing the same, which exhibit high adhesion between metal foil and film and low dielectric properties.
상기 목적을 달성하기 위하여 본 발명은, 저유전율 소재를 적용한 금속적층판 및 이의 제조방법을 제공한다.In order to achieve the above object, the present invention provides a metal laminated plate to which a low dielectric constant material is applied, and a manufacturing method thereof.
본 발명은 섬유 기재를 포함하는 고내열성 코어(core)층; 상기 코어층의 양면에 적층된 불소계 필름; 및 상기 불소계 필름상에 적층된 금속박을 포함하고, 이때 상기 불소계 필름은 충진제(filler)를 포함하는 것을 특징으로 하는 금속적층판을 제공한다.The present invention provides a high heat resistant core layer comprising a fibrous substrate; Fluorine-based film laminated on both sides of the core layer; And a metal foil laminated on the fluorine-based film, wherein the fluorine-based film provides a metal laminate, characterized in that it comprises a filler (filler).
본 발명의 일례에 따르면, 상기 불소계 필름은 폴리테트라플루오로에틸렌(PTFE), 플루오로와 에틸렌-프로필렌 공중합체 및 퍼플루오로알콕시 측쇄를 가진 플루오로탄소 중추로 이루어진 군으로부터 선택된 플루오로중합체 필름일 수 있으며, 바람직하게는 퍼플루오로 알콕시(PFA) 필름일 수 있다.According to one embodiment of the present invention, the fluorine-based film is a fluoropolymer film selected from the group consisting of polytetrafluoroethylene (PTFE), fluoro and ethylene-propylene copolymers and fluorocarbon backbones with perfluoroalkoxy side chains. And, preferably, a perfluoro alkoxy (PFA) film.
본 발명의 일례에 따르면, 상기 불소계 필름에서 상기 충진제는 10 내지 70 중량%의 함량으로 포함될 수 있다.According to an example of the present invention, the filler in the fluorine-based film may be included in an amount of 10 to 70% by weight.
본 발명의 일례에 따르면, 상기 충진제는 실리카(silica), 이산화티타늄(TiO2), 알루미나(Al2O3), 티타늄산칼륨(K2O6TiO2), 산화 바륨(BaO) 중 하나일 수 있다.According to one embodiment of the present invention, the filler is one of silica (silica), titanium dioxide (TiO 2 ), alumina (Al 2 O 3 ), potassium titanate (K 2 O 6 TiO 2 ), barium oxide (BaO) Can be.
본 발명의 일례에 따르면, 상기 코어층은 고내열성 수지 조성물에 상기 섬유 기재를 함침시켜 경화된 수지층을 포함할 수 있다.According to an example of the present invention, the core layer may include a resin layer cured by impregnating the fiber substrate in a high heat resistant resin composition.
본 발명의 일례에 따르면, 상기 고내열성 수지 조성물은 비스페놀 A(bisphenol A)형 에폭시, 방향족 나프탈렌 에폭시, 비페닐 아르알킬(biphenyl aralkyl)형 에폭시, 이소시아누레이트(isocyanurate) 에폭시, 크레졸 노블락(cresol novlac)형 에폭시 수지, 고내열성 에폭시 수지 중 하나 이상을 포함할 수 있다.According to one embodiment of the present invention, the high heat resistant resin composition is bisphenol A (bisphenol A) epoxy, aromatic naphthalene epoxy, biphenyl aralkyl type epoxy, isocyanurate epoxy, cresol noblec (cresol) novlac) type epoxy resin, and high heat resistant epoxy resin.
본 발명의 일례에 따르면, 상기 섬유 기재는 스프레드 유리 섬유(Spread G/F)일 수 있다. 여기서, 스프레드 유리 섬유는 유리 섬유; 및 무기 바인더를 포함할 수 있다.According to one embodiment of the present invention, the fiber substrate may be spread glass fibers (Spread G / F). Here, the spread glass fibers are glass fibers; And an inorganic binder.
본 발명의 일례에 따르면, 상기 금속박은 0.5 내지 5.0㎛ 범위의 조도(Rz)를 갖는 동박인 것이 바람직하다.According to one example of the invention, the metal foil is preferably copper foil having a roughness Rz in the range of 0.5 to 5.0 μm.
본 발명의 일례에 따르면, 상기 금속적층판의 열팽창계수(CTE)는 5 내지 40 ppm인 것이 바람직하다.According to one embodiment of the invention, the coefficient of thermal expansion (CTE) of the metal laminate is preferably 5 to 40 ppm.
본 발명의 일례에 따르면, 상기 금속적층판에서 불소계 필름에 대한 금속박의 박리 강도(P/S)는 0.8 내지 1.5 kgf/cm 범위인 것이 바람직하다.According to an example of the present invention, the peel strength (P / S) of the metal foil to the fluorine-based film in the metal laminate is preferably in the range of 0.8 to 1.5 kgf / cm.
또한, 본 발명은 (a) 고내열성 수지 조성물에 섬유 기재를 함침한 후 반경화시켜 코어층을 제조하는 단계, 및 (b) 상기 코어층의 상하면 상에 각각 불소계 필름 및 금속박을 순차적으로 적층한 후, 고온 압축 공정으로 일체화시키는 단계를 포함하는 금속적층판의 제조방법을 제공한다.In addition, the present invention comprises the steps of (a) impregnating a fiber substrate in the high heat-resistant resin composition and then semi-curing to prepare a core layer, and (b) sequentially stacking a fluorine-based film and a metal foil on the upper and lower surfaces of the core layer, respectively. Then, it provides a method for producing a metal laminate comprising the step of integrating into a high temperature compression process.
아울러, 본 발명은 (a) 코어층의 상하면 상에 각각 불소계 필름을 적층하여 적층체를 형성하는 단계, 및 (b) 상기 적층체의 상하면 상에 각각 금속박을 적층한 후, 고온 압축 공정으로 일체화시키는 단계를 포함하는 금속적층판의 제조방법을 제공한다. 여기서, 상기 코어층은 유리 섬유를 포함할 수 있다.In addition, the present invention comprises the steps of (a) laminating a fluorine-based film on the upper and lower surfaces of the core layer, respectively, and (b) laminating metal foils on the upper and lower surfaces of the laminate, respectively, and then integrated into a high temperature compression process. It provides a method for producing a metal laminate comprising the step of. Here, the core layer may include glass fiber.
본 발명의 일례에 따르면, 상기 고온 압축 공정은 270 내지 400℃의 온도에서 10분 내지 3시간 동안 실시하는 것이 바람직하다.According to one embodiment of the invention, the high temperature compression process is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 ℃.
본 발명에 따른 금속적층판은 낮은 손실계수, 저유전 특성, 내열성 및 접착안정성을 동시에 만족시키므로, 이를 이용한 인쇄회로기판은 우수한 고주파 특성과 양호한 내열성, 접착안정성을 나타낼 수 있다.Since the metal laminate according to the present invention satisfies a low loss factor, low dielectric properties, heat resistance, and adhesion stability at the same time, the printed circuit board using the same may exhibit excellent high frequency characteristics, good heat resistance, and adhesive stability.
또한, 본 발명에 따른 금속적층판의 제조방법은, 단시간에 고온 압착으로 일체화시킴으로써 가공 단가가 저렴하며, 저유전율 소재의 전기적, 기계적 특성 변화를 최소화하여 특유의 고유 성질을 그대로 이용할 수 있기 때문에 고주파 대역에서 매우 안정적으로 동작할 수 있는 전기적 특성이 우수한, 저 손실계수를 갖는 금속적층판을 제조할 수 있다.In addition, the manufacturing method of the metal laminated plate according to the present invention is inexpensive processing cost by integrating by high temperature compression in a short time, and because the unique intrinsic properties can be used as it is by minimizing the change in electrical and mechanical properties of low dielectric constant material, high frequency band It is possible to produce a metal laminated plate having a low loss coefficient, which has excellent electrical characteristics, which can operate very stably.
따라서 본 발명의 금속적층판은 1 GHz 이상의 고주파 신호를 취급하는 이동체 통신기기나 그 기지국 장치, 서버, 라우터 등의 네트워크 관련 전자기기 및 대형 컴퓨터 등의 각종 전기전자 기기에 사용되는 인쇄회로기판의 부품 용도로서 유용하게 사용될 수 있다.Therefore, the metal laminate of the present invention is a component of a printed circuit board used in a mobile communication device that handles high-frequency signals of 1 GHz or more, network-based electronic devices such as base station devices, servers, routers, and various electrical and electronic devices such as large computers. It can be usefully used as.
도 1은 본 발명의 일 실시예에 따른 금속적층판의 단면도이다.1 is a cross-sectional view of a metal laminate according to an embodiment of the present invention.
도 2는 본 발명의 다른 일 실시예에 따른 금속적층판의 단면도이다.2 is a cross-sectional view of a metal laminate according to another embodiment of the present invention.
[부호의 설명][Description of the code]
100, 200: 금속 적층판100, 200: metal laminate
110: 프리프레그110: prepreg
210: 섬유 기재210: fiber substrate
130, 230: 불소계 필름130, 230: fluorine-based film
170, 270: 금속박170 and 270: metal foil
이하, 첨부된 도면을 참조하여 본 발명의 실시예를 설명한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명에 제한되지는 않으며 본 발명은 후술할 청구항의 범주에 의해 정의될 뿐이다.Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention. However, this is presented as an example, by which the present invention is not limited, and the present invention is defined only by the scope of the claims to be described later.
본 발명은 인쇄회로기판, 특히 초고주파 용도의 인쇄회로기판에 유용하게 사용될 수 있는 금속적층판을 제공하고자 한다.The present invention is to provide a metal laminated plate that can be usefully used in printed circuit boards, especially printed circuit boards for ultra-high frequency applications.
도 1을 참조하여 본 발명의 일 실시예에 따른 금속적층판 및 이의 제조방법에 대하여 설명한다.Referring to Figure 1 will be described a metal laminated plate and a method of manufacturing the same according to an embodiment of the present invention.
본 발명의 일 실시예에서, 섬유 기재를 포함하는 코어(core)층, 상기 코어층의 양면에 적층된 불소계 필름, 및 상기 불소계 필름상에 적층된 금속박을 포함하며, 상기 코어층에 상기 불소계 필름을 고온 압축시켜 접합시킨 금속적층판을 제공한다.In one embodiment of the present invention, a core layer including a fiber substrate, a fluorine-based film laminated on both sides of the core layer, and a metal foil laminated on the fluorine-based film, the fluorine-based film on the core layer Provided is a metal laminated plate bonded by high temperature compression.
여기서, 상기 코어층은 섬유 기재를 포함하는 프리프레그를 의미하며, 바람직하게는 고내열성 수지 조성물에 섬유 기재를 함침시켜 형성된 고내열성 프리프레그를 의미한다.Here, the core layer means a prepreg including a fiber base, and preferably means a high heat resistant prepreg formed by impregnating a fiber base in the high heat resistant resin composition.
본 발명에 따른 상기 금속적층판은 고내열성 프리프레그; 저유전율을 갖는 불소계 필름; 및 저조도를 갖는 금속박이 적층된 구조를 포함하며, 각 층의 접착안정성을 확보함으로써, 상기 금속적층판이 사용된 인쇄회로기판에 낮은 손실계수, 저유전 특성, 내열성 및 접착안정성의 효과를 동시에 부여할 수 있다.The metal laminate according to the present invention is a high heat-resistant prepreg; A fluorine-based film having a low dielectric constant; And a structure in which a metal foil having low roughness is laminated, and by securing adhesion stability of each layer, the effects of low loss coefficient, low dielectric property, heat resistance, and adhesion stability can be simultaneously given to the printed circuit board using the metal laminate. Can be.
도 1은 본 발명의 일 실시예에 따른 금속적층판(100)의 단면을 개략적으로 나타낸 것이다.1 schematically shows a cross section of a metal laminate 100 according to an embodiment of the present invention.
먼저, 도 1을 참조하면, 상기 금속적층판(100)은 섬유 기재를 포함하는 프리프레그(110), 상기 프리프레그의 양면에 적층된 불소계 필름(130), 및 상기 불소계 필름상에 적층된 금속박(170)을 포함할 수 있다.First, referring to FIG. 1, the metal laminate 100 includes a prepreg 110 including a fiber base, a fluorine-based film 130 laminated on both surfaces of the prepreg, and a metal foil laminated on the fluorine-based film ( 170).
본 발명의 프리프레그(110)는 섬유 기재 및 상기 섬유 기재를 고내열성 수지 조성물에 함침시켜 경화된 수지층을 포함한다. 여기서, 상기 고내열성 수지 조성물은 용매에 용해되거나 분산된 형태의 수지 바니시일 수도 있다.The prepreg 110 of the present invention includes a fiber substrate and a resin layer cured by impregnating the fiber substrate with the high heat resistant resin composition. Here, the high heat resistant resin composition may be a resin varnish dissolved or dispersed in a solvent.
상기 섬유 기재는 임의로 절곡 가능한, 가요성을 갖는 당 업계의 통상적인 무기물 섬유 기재, 유기물 섬유 기재, 또는 이들의 혼합 형태 등을 사용할 수 있다. 사용하는 용도 또는 성능을 기준으로, 전술한 섬유 기재를 선택하면 된다.The fibrous substrate may be arbitrarily bent, and may be used in the art of a conventional inorganic fiber substrate, organic fiber substrate, or a mixed form thereof. What is necessary is just to select the above-mentioned fiber base material based on the use or performance to be used.
본 발명에서 사용 기재의 예로는 E-glass, D-glass, S-glass, NE-glass, T-glass 및 Q-glass 등의 무기물 섬유, 폴리이미드, 폴리아미드, 폴리에스테르 등의 유기물의 섬유 및 혼합물등이 있으며, 사용하는 용도 또는 성능을 기준으로 선택하면 된다.Examples of the substrate used in the present invention include inorganic fibers such as E-glass, D-glass, S-glass, NE-glass, T-glass, and Q-glass, and organic fibers such as polyimide, polyamide, polyester, and the like. Mixtures, etc. are selected based on the intended use or performance.
사용 가능한 섬유 기재의 비제한적인 예를 들면, E-glass, D-glass, S-glass, NE-glass, T-glass, Q-glass 등과 같은 유리 섬유 (무기물 섬유); 유리 페이퍼, 유리 섬유 부직포 (glass web), 유리 직물(glass cloth), 아라미드 섬유, 아라미드 페이퍼(aramid paper), 폴리이미드, 폴리아미드, 폴리에스터, 방향족 폴리에스테르, 불소 수지 등과 같은 유기 섬유; 탄소 섬유, 종이, 무기 섬유 또는 이들의 1종 이상의 혼합 형태 등이 있다. 상기 섬유 기재의 형태는 전술한 섬유 등으로 이루어진 직포나 부직포, 로빙(roving), ?h프트 스트랜드 매트(chopped strand mat), 서페이싱 매트(surfacing mat), 금속 섬유, 카본 섬유, 광물 섬유 등으로 이루어진 직포, 부직포, 매트류 등을 들 수 있다. 이들 기재는 단독 또는 2종 이상 혼용할 수 있다. 강화된 섬유 기재를 혼용하는 경우 프리프레그의 강성, 치수 안정성을 향상시킬 수 있다. 이러한 섬유 기재의 두께는 특별히 한정되지 않으며, 예를 들어 약 0.01 ㎜ 내지 0.3 ㎜ 범위일 수 있다.Non-limiting examples of fiber substrates that can be used include glass fibers (inorganic fibers) such as E-glass, D-glass, S-glass, NE-glass, T-glass, Q-glass, and the like; Organic fibers such as glass paper, glass fiber nonwoven fabric, glass cloth, aramid fiber, aramid paper, polyimide, polyamide, polyester, aromatic polyester, fluororesin, and the like; Carbon fibers, paper, inorganic fibers, or a mixture of one or more thereof. The fiber base may be formed of a woven or nonwoven fabric made of the aforementioned fibers, roving, chopped strand mat, surfacing mat, metal fiber, carbon fiber, mineral fiber, or the like. Woven fabrics, nonwoven fabrics, mats, etc. may be mentioned. These base materials can be used individually or in mixture of 2 or more types. In the case of using a reinforced fiber substrate, the stiffness and dimensional stability of the prepreg can be improved. The thickness of this fibrous substrate is not particularly limited and may be, for example, in the range of about 0.01 mm to 0.3 mm.
상기 고내열성 수지 조성물은 프리프레그(110) 형성에 사용되는 것으로서, 상기 프리프레그(110)는 고내열성 수지 조성물에 상기 섬유 기재를 함침시켜 경화된 수지층을 포함할 수 있다.The high heat resistant resin composition is used to form the prepreg 110, and the prepreg 110 may include a resin layer cured by impregnating the fiber base in the high heat resistant resin composition.
본 발명에서 이용되는 고내열성 수지 조성물은 당업계에 공지된 내열성이 우수한 조성물이면 그 화학적 구성에 대해서는 특별히 제한되는 것이 아니지만, 예를 들면 비스페놀 A(bisphenol A)형 에폭시, 방향족 나프탈렌 에폭시, 비페닐 아르알킬(biphenyl aralkyl)형 에폭시, 이소시아누레이트(isocyanurate) 에폭시, 크레졸 노블락(cresol novlac)형 에폭시 수지, 고내열성 에폭시 수지 중 하나 이상을 포함하는 것이 바람직하다.The high heat resistant resin composition used in the present invention is not particularly limited as long as it is a composition excellent in heat resistance known in the art, but is not particularly limited in terms of its chemical composition. For example, bisphenol A epoxy, aromatic naphthalene epoxy, and biphenyl are used. It is preferable to include at least one of an alkyl (biphenyl aralkyl) type epoxy, an isocyanurate epoxy, a cresol novlac type epoxy resin, and a high heat resistant epoxy resin.
일반적으로 프리프레그는, 섬유 기재에 수지 조성물을 코팅하거나 또는 섬유 기재를 수지 조성물에 함침시킨 후, 가열에 의해 B-stage(반경화 상태)까지 경화시켜 얻은 시트 형상의 재료를 지칭한다. 전술한 방법 이외에, 본 발명의 프리프레그(110)는 당 업계에 알려진 공지의 솔벤트법에 의해 제조될 수 있다.In general, the prepreg refers to a sheet-like material obtained by coating a fibrous substrate with a resin composition or by impregnating the fibrous substrate with a resin composition and curing it to B-stage (semicured state) by heating. In addition to the methods described above, the prepreg 110 of the present invention may be prepared by known solvent methods known in the art.
솔벤트법은 프리프레그 형성용 수지 조성물을 유기 용매에 용해시켜 형성된 수지 조성물 바니시에 섬유 기재를 함침시킨 후 건조하는 방법이다. 이러한 솔벤트법을 채용하는 경우 일반적으로 수지 바니시를 이용한다. 상기 수지 조성물에 섬유 기재를 함침시키는 방법의 일례를 들면, 기재를 수지 바니시에 침지하는 방법, 수지 바니시를 각종 코터에 의해 기재에 도포하는 방법, 수지 바니시를 스프레이에 의해 기재에 분사하는 방법 등을 들 수 있다. 이때 섬유 기재를 수지 바니시에 침지하는 경우 섬유 기재에 대한 수지 조성물의 함침성을 향상시킬 수 있어 바람직하다.The solvent method is a method of drying after impregnating a fibrous substrate with a resin composition varnish formed by dissolving the resin composition for prepreg formation in an organic solvent. In the case of employing such a solvent method, a resin varnish is generally used. As an example of the method of impregnating a fiber base material in the said resin composition, the method of immersing a base material in a resin varnish, the method of apply | coating a resin varnish to a base material by various coaters, the method of spraying a resin varnish to a base material by spraying, etc. Can be mentioned. At this time, when the fiber base material is immersed in a resin varnish, since the impregnation property of the resin composition with respect to a fiber base material can be improved, it is preferable.
본 발명의 프리프레그(110)는 섬유로 이루어지는 시트상 섬유 기재나 글라스 기재를 당해 내열성 수지 조성물에 함침시키고, 가열에 의해 반경화시킴으로써 제조될 수 있다. 이때 상기 내열성 수지 조성물은 수지 바니시로 조제된 것일 수 있다.The prepreg 110 of this invention can be manufactured by impregnating the said heat resistant resin composition with the sheet-like fiber base material or glass base material which consists of a fiber, and semi-hardening by heating. In this case, the heat resistant resin composition may be prepared by a resin varnish.
상기 수지 바니시를 조제하는 경우 유기 용제의 예를 들면, 아세톤, 메틸에틸케톤, 시클로헥사논 등의 케톤류, 아세트산에틸, 아세트산부틸, 셀로솔브아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 카비톨아세테이트 등의 아세트산 에스테르류, 셀로솔브, 부틸카비톨 등의 카비톨류, 톨루엔, 크실렌 등의 방향족 탄화수소류, 디메틸포름아미드, 디메틸아세트아미드, N-메틸피롤리돈, 테트라히드로푸란 등을 들 수 있다. 유기 용제는 1종을 사용하거나 2종 이상을 조합하여 사용하여도 좋다.When preparing the said resin varnish, For example, ketones, such as acetone, methyl ethyl ketone, cyclohexanone, an acetic acid, such as ethyl acetate, butyl acetate, a cellosolve acetate, a propylene glycol monomethyl ether acetate, and a carbitol acetate Carbitols such as esters, cellosolves and butyl carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran and the like. You may use an organic solvent 1 type or in combination of 2 or more types.
본 발명의 프리프레그(110)는 상기 수지 바니시에 상기 기재를 함침시킨 후, 추가적으로 건조 과정을 거쳐 형성될 수 있고, 이때 상기 건조는 20 내지 200℃에서 이루어질 수 있다. 일례로, 본 발명의 프리프레그(110)는 상기 고내열성 수지 바니시에 상기 기재를 함침시키고 70 내지 170℃ 범위의 온도에서 1 내지 10분 동안 가열 건조함으로써, 반경화(B-Stage) 상태의 프리프레그를 제조할 수 있다.The prepreg 110 of the present invention may be formed through an additional drying process after impregnating the substrate in the resin varnish, wherein the drying may be performed at 20 to 200 ℃. For example, the prepreg 110 of the present invention is impregnated with the substrate in the high heat-resistant resin varnish and heat-dried for 1 to 10 minutes at a temperature in the range of 70 to 170 ℃, the prepreg of the semi-cured state (B-Stage) Legs can be prepared.
본 발명의 일 실시예에 따른 금속적층판(100)은 저유전율을 갖는 소재로서 상기 프리프레그(110)의 양면에 적층된 불소계 필름(130)을 포함한다.The metal laminate 100 according to an embodiment of the present invention includes a fluorine-based film 130 laminated on both surfaces of the prepreg 110 as a material having a low dielectric constant.
본 발명에서 사용 가능한 저유전율을 갖는 소재의 예로는 폴리테트라플루오로에틸렌(PTFE), 플루오로와 에틸렌-프로필렌 공중합체 및 퍼플루오로알콕시 측쇄를 가진 플루오로탄소 중추로 이루어진 군으로부터 선택된 플루오로중합체 필름을 들 수 있으며, 그 중에서 퍼플루오로 알콕시(PFA) 필름이 바람직하다.Examples of low dielectric constant materials usable in the present invention include fluoropolymers selected from the group consisting of polytetrafluoroethylene (PTFE), fluoro and ethylene-propylene copolymers, and fluorocarbon backbones with perfluoroalkoxy side chains. A film is mentioned, Among them, a perfluoro alkoxy (PFA) film is preferable.
종래 선행기술은 유리 섬유에 폴리테트라플루오로에틸렌(PTFE) 수지를 5~6회 함침, 고온/고압 압축(press) 공정을 통하여 제조하였으나, 본 발명은 유리 섬유에 고내열성 수지를 함침, 고온/고압 압축 공정을 통하여 제조하여 생산성, 제조 공정 비용을 줄일 수 있는 장점이 있다. 또한 불소계 필름에 충진제를 충진한 후 적층하여 제조하므로 열 팽창계수(CTE) 특성이 우수한 장점이 있다.Prior art has been prepared by impregnating polytetrafluoroethylene (PTFE) resin into glass fiber 5-6 times, high temperature / high pressure press process, but the present invention impregnates glass fiber with high heat-resistant resin, high temperature / Manufacturing through high pressure compression process has the advantage of reducing the productivity, manufacturing process cost. In addition, since the filler is prepared by laminating the filler in the fluorine-based film, there is an advantage in that the coefficient of thermal expansion (CTE) is excellent.
이에, 본 발명에서는 퍼플루오로 알콕시(PFA) 등의 저유전율을 갖는 소재, 예컨대 불소 수지를 섬유 기재에 함침하여 프리프레그로 제조하는 것이 아니라, 앞서 제조된 프리프레그(110) 상에 필름 형태로 적층함으로써, 프리프레그(110)와 불소계 필름(130)의 적층체(150)를 형성하는 것을 특징으로 한다.Thus, in the present invention, a material having a low dielectric constant, such as perfluoro alkoxy (PFA), such as a fluororesin, is not formed into a prepreg by impregnating a fibrous substrate, but in a film form on the prepreg 110 prepared above. By laminating | stacking, the laminated body 150 of the prepreg 110 and the fluorine-type film 130 is formed.
전술한 바와 같이, 상기 불소계 필름(130)으로는 퍼플루오로 알콕시(PFA) 필름이 바람직하며, 상기 불소계 필름(130)은 충진제를 포함할 수 있다.As described above, the fluoro-based film 130 is preferably a perfluoro alkoxy (PFA) film, the fluorine-based film 130 may include a filler.
상기 충진제는 상기 불소계 필름에 포함되어, 상기 불소계 필름의 G/F 함침성, 생산성, 열 팽창계수(CTE)등의 특성을 개선하는 효과를 가질 수 있다.The filler is included in the fluorine-based film, it may have an effect of improving the properties such as G / F impregnation, productivity, thermal expansion coefficient (CTE) of the fluorine-based film.
상기 충진제의 비제한적인 예로는, 실리카(silica), 이산화티타늄(TiO2), 알루미나(Al2O3), 티타늄산칼륨(K2O6TiO2), 산화 바륨(BaO) 중 적어도 하나를 들 수 있으며, 이 중에서 실리카가 바람직하다.Non-limiting examples of the filler, at least one of silica (silica), titanium dioxide (TiO 2 ), alumina (Al 2 O 3 ), potassium titanate (K 2 O 6 TiO 2 ), barium oxide (BaO) Among these, silica is preferable.
상기 충진제는, 상기 불소계 필름에서 10 내지 70 중량%의 함량으로 포함될 수 있으며, 예컨대 40중량% 함량으로 포함되는 것이 바람직하다. 상기 불소계 필름에서의 상기 충진제의 함량이 40 중량% 미만인 경우에는 CTE(Z축) 개선 효과를 나타낼 수 없으며, 70 중량% 초과하는 함량으로 포함되는 경우에는 필름이 형성되지 않는 문제점이 발생된다.The filler may be included in an amount of 10 to 70% by weight in the fluorine-based film, for example, it is preferably included in an amount of 40% by weight. When the content of the filler in the fluorine-based film is less than 40% by weight can not exhibit a CTE (Z-axis) improvement effect, when included in an amount exceeding 70% by weight is a problem that the film is not formed.
상기 불소계 필름(130)의 두께는 특별히 제한되지 않으나, 25 내지 125 ㎛ 범위, 바람직하게는 50 ㎛일 수 있다.The thickness of the fluorine-based film 130 is not particularly limited, but may be in the range of 25 to 125 μm, preferably 50 μm.
본 발명의 일 실시예에 따른 금속적층판(100)은 상기 프리프레그(110)와 불소계 필름(130)의 적층체(150)에 적층된 금속박(170)을 포함한다.The metal laminate 100 according to an embodiment of the present invention includes a metal foil 170 laminated on the laminate 150 of the prepreg 110 and the fluorine-based film 130.
상기 금속박(170)은 당업계에 알려진 통상의 금속 또는 합금으로 이루어진 것을 제한 없이 사용할 수 있다. 이때 상기 금속박이 동박인 경우, 본 발명에 따른 금속적층판(100)을 동박 적층판으로 사용할 수 있다. 바람직하게는 금속박(170)은 동박이다.The metal foil 170 may be made of a conventional metal or alloy known in the art without limitation. At this time, when the metal foil is a copper foil, the metal laminated plate 100 according to the present invention can be used as a copper foil laminate. Preferably, the metal foil 170 is copper foil.
상기 동박은 압연법 및 전해법으로 제조되는 모든 동박을 포함한다. 여기서, 동박은 표면이 산화 부식되는 것을 방지하기 위해서, 녹방지 처리되어 있을 수 있다.The said copper foil includes all the copper foils manufactured by the rolling method and the electrolytic method. Here, the copper foil may be subjected to rust prevention treatment in order to prevent the surface from being oxidized and corroded.
상기 금속박(170)은 상기 불소계 필름(130)과 접하는 일면 상에 소정의 표면 조도(Rz)가 형성될 수도 있다. 이때 표면조도(Rz)는 0.5 내지 5.0 ㎛ 범위인 것이 바람직하다. 표면조도가 0.5 ㎛ 미만이면 금속박(170)과 불소계 필름(130)과의 접착성이 불충분하게 된다. 또한 상기 금속박(170)의 두께는 특별히 제한되지 않으나, 최종물의 두께와 기계적 특성을 고려하여 7 ㎛ 미만인 것을 사용할 수 있으며, 바람직하게는 3 내지 7 ㎛ 범위일 수 있다. 사용 가능한 동박의 예로는, CFL (TZA_B, HFZ_B), Mitsui (HSVSP, MLS-G), Nikko (RTCHP), Furukawa, ILSIN 등이 있다.The metal foil 170 may have a predetermined surface roughness Rz formed on one surface in contact with the fluorine-based film 130. At this time, the surface roughness (Rz) is preferably in the range of 0.5 to 5.0 ㎛. If the surface roughness is less than 0.5 μm, the adhesion between the metal foil 170 and the fluorine-based film 130 is insufficient. In addition, the thickness of the metal foil 170 is not particularly limited, but may be used less than 7 ㎛ in consideration of the thickness and mechanical properties of the final product, preferably may be in the range of 3 to 7 ㎛. Examples of copper foil that can be used include CFL (TZA_B, HFZ_B), Mitsui (HSVSP, MLS-G), Nikko (RTCHP), Furukawa, ILSIN and the like.
전술한 바에 따라 고내열성 바니시에 함침시켜 반경화된 프리프레그(110); 불소계 필름(130); 및 금속박(170)이 순차적으로 적층된 후 고온 고압으로 일체화되어 형성된 금속적층판(100)은 5 내지 40 범위의 열 팽창계수(CTE)를 가질 수 있다.A prepreg 110 impregnated by impregnation with a high heat resistant varnish as described above; Fluorine-based film 130; And the metal laminated plate 100 formed by integrally stacked at a high temperature and high pressure after the metal foil 170 is sequentially stacked may have a coefficient of thermal expansion (CTE) of 5 to 40 range.
또한, 상기 금속적층판(100)에서 불소계 필름(130)에 대한 금속박(170)의 박리 강도(P/S)는 0.8 내지 1.5 kgf/cm 범위일 수 있다.In addition, the peel strength (P / S) of the metal foil 170 to the fluorine-based film 130 in the metal laminate 100 may be in the range of 0.8 to 1.5 kgf / cm.
본 발명의 일 실시예는 전술한 프리프레그 및 불소계 필름을 적층하여 적층체를 형성한 후에, 상기 적층체 상에 상기 금속박을 적층하고 고온 압축 공정으로 성형하여 형성하는 금속박적층판의 제조방법을 포함한다.An embodiment of the present invention includes a method of manufacturing a metal laminate plate formed by laminating the prepreg and the fluorine-based film described above to form a laminate, and then laminating the metal foil on the laminate and molding the same by a high temperature compression process. .
보다 구체적으로, 본 발명의 일 실시예에 따른 금속적층판(100)의 제조방법은 (a) 고내열성 수지 조성물에 유리 섬유를 함침한 후 반경화시켜 프리프레그(110)를 제조하는 단계; (b) 상기 프리프레그(110)의 양면 상에 각각 불소계 필름(130) 및 금속박(170)을 순차적으로 적층한 후 고온 압축 공정을 실시하여 일체화시키는 단계를 포함할 수 있다. 이때 상기 (b)단계의 고온 압축 공정은 270 내지 400℃의 온도에서 10분 내지 3시간 동안 실시하는 것이 바람직하다.More specifically, the method of manufacturing a metal laminate 100 according to an embodiment of the present invention comprises the steps of (a) manufacturing a prepreg 110 by impregnating a glass fiber in the high heat-resistant resin composition and then semi-curing; (b) sequentially stacking the fluorine-based film 130 and the metal foil 170 on both surfaces of the prepreg 110, and then performing a high temperature compression process to integrate them. At this time, the high temperature compression process of step (b) is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 ℃.
아울러, 본 발명의 일 실시예는 전술한 코어층, 불소계 필름, 및 금속박으로 구성된 군으로부터 선택되는 1종 이상을 포함하여 적층 성형된 인쇄회로기판, 바람직하게는 다층 인쇄회로기판을 포함한다.In addition, one embodiment of the present invention includes a multilayer printed circuit board, preferably a multilayer printed circuit board, including at least one selected from the group consisting of the core layer, the fluorine-based film, and the metal foil described above.
본 발명에서 인쇄회로기판이란, 도금 스루홀법이나 빌드업법 등에 의해 1층 이상 적층한 인쇄회로기판을 지칭하며, 당 업계에 알려진 통상의 방법에 의해 제조될 수 있다. 이의 바람직한 일례를 들면, 본 발명에 따른 금속적층판(100)에 구멍을 개구하여 스루홀도금을 행한 후, 도금막을 포함하는 금속박을 에칭 처리하여 회로를 형성함으로써 제조될 수 있다.In the present invention, the printed circuit board refers to a printed circuit board laminated by one or more layers by a plating through hole method, a buildup method, or the like, and may be manufactured by a conventional method known in the art. As a preferable example thereof, it can be manufactured by opening a hole in the metal laminated plate 100 according to the present invention to perform through hole plating, and then forming a circuit by etching a metal foil including a plating film.
이하, 도 2를 참조하여 본 발명의 다른 일 실시예에 따른 금속적층판 및 이의 제조방법에 대하여 설명한다.Hereinafter, a metal laminated plate and a method of manufacturing the same according to another embodiment of the present invention will be described with reference to FIG. 2.
본 발명의 다른 일 실시예에 따른 금속적층판(200)은, 도 1에서 전술한 금속적층판(100)에 비해 코어층의 구성 및 불소계 필름의 적층 방식이 상이하다는 점을 제외하고는 동일하다. 따라서 동일한 구성에 대해서는 명세서의 간결성을 위해 중복 설명은 생략한다.The metal laminate 200 according to another embodiment of the present invention is the same except that the structure of the core layer and the lamination method of the fluorine-based film are different from those of the metal laminate plate 100 described above with reference to FIG. 1. Therefore, the description of the same configuration is omitted for the sake of brevity of the specification.
본 발명의 다른 일 실시예에서, 섬유 기재를 포함하는 코어(core)층, 상기 코어층의 양면에 적층된 불소계 필름, 및 상기 불소계 필름상에 적층된 금속박을 포함하는 금속적층판을 제공한다.In another embodiment of the present invention, there is provided a metal laminate comprising a core layer including a fiber substrate, a fluorine-based film laminated on both sides of the core layer, and a metal foil laminated on the fluorine-based film.
여기서, 상기 코어층은 섬유 기재를 의미하며, 바람직하게는 유리섬유 (Spread G/F)를 의미한다.Here, the core layer means a fiber base, preferably glass fiber (Spread G / F).
도 2는 본 발명의 다른 일 실시예에 따른 금속적층판(200)의 단면을 개략적으로 나타낸 것이다.2 is a schematic cross-sectional view of the metal laminate 200 according to another embodiment of the present invention.
본 발명의 다른 일 실시예에 따른 금속적층판(200)은 섬유 기재(210), 상기 섬유 기재의 양면에 적층된 불소계 필름(230), 및 상기 불소계 필름상에 적층된 금속박(270)을 포함할 수 있다.The metal laminate 200 according to another embodiment of the present invention may include a fiber base 210, a fluorine-based film 230 laminated on both sides of the fiber base, and a metal foil 270 stacked on the fluorine-based film. Can be.
상기 섬유 기재(210)는 임의로 절곡 가능한, 가요성을 갖는 당 업계의 통상적인 무기물 섬유 기재, 유기물 섬유 기재, 또는 이들의 혼합 형태 등을 사용할 수 있다. 사용하는 용도 또는 성능을 기준으로, 전술한 섬유 기재를 선택하면 된다.The fiber substrate 210 may be arbitrarily bent, may be used in the art of conventional flexible inorganic fiber substrates, organic fiber substrates, or a mixture thereof. What is necessary is just to select the above-mentioned fiber base material based on the use or performance to be used.
본 발명의 다른 일 실시예에서는, 섬유 기재(210)로서 스프레드 유리 섬유(spread G/F)를 사용하는 것이 바람직하다. 상기 스프레드 유리 섬유는 유리 섬유; 및 무기 바인더를 포함할 수 있다.In another embodiment of the present invention, it is preferable to use spread G / F as the fiber substrate 210. The spread glass fibers are glass fibers; And an inorganic binder.
스프레드 유리 섬유는 통상적으로 사용하는 방법으로 제조될 수 있으며, 예컨대 유리 섬유와 무기 바인더 용액을 교반하여 혼합 용액을 만든 후에, 상기 혼합 용액으로부터 물을 제거하여 추출물을 얻은 다음 상기 추출물을 압축, 건조시키는 방법으로 제조될 수 있다.Spread glass fibers can be prepared by a conventional method, for example, after stirring the glass fiber and the inorganic binder solution to form a mixed solution, to remove the water from the mixed solution to obtain an extract and then to compress and dry the extract It can be prepared by the method.
여기서, 상기 무기 바인더는 특별히 제한되지는 않지만, 알루미늄을 포함하는 산성 용액(예컨대, 황산 알루미늄)과 염기성 용액(예컨대, 수산화나트륨)을 중화시켜 생성되는 알루미늄 화합물일 수 있다.Here, the inorganic binder is not particularly limited, but may be an aluminum compound produced by neutralizing an acidic solution (eg, aluminum sulfate) and a basic solution (eg, sodium hydroxide) containing aluminum.
본 발명의 다른 일 실시예에 따른 금속적층판(200)은 저유전율 소재로서 상기 섬유 기재(210)의 양면에 적층된 불소계 필름(230)을 포함한다.The metal laminate 200 according to another embodiment of the present invention includes a fluorine-based film 230 laminated on both surfaces of the fiber substrate 210 as a low dielectric constant material.
구체적으로, 본 발명에서는 전술한 바와 같이 저유전율을 갖는 소재의 우수한 전기적 특성, 높은 내열성이 손상되지 않도록 필름 형태인 불소계 필름(230)으로 사용되며, 사용되는 불소계 필름의 예로는 퍼플루오로 알콕시(PFA) 필름이 바람직하다.Specifically, in the present invention, as described above, it is used as the fluorine-based film 230 in the form of a film so as not to impair the excellent electrical properties and high heat resistance of the material having a low dielectric constant, an example of the fluorine-based film used is perfluoro alkoxy ( PFA) films are preferred.
앞서 설명한 본 발명의 일 실시예에서는 고내열성 수지 조성물에 섬유 기재를 함침시킨 반경화 상태의 프리프레그(110) 상에 불소계 필름(130)을 적층시킴으로써 프리프레그(110)와 불소계 필름(130)의 적층체(150)를 형성한다.In the above-described embodiment of the present invention, the prepreg 110 and the fluorine-based film 130 may be formed by laminating the fluorine-based film 130 on the prepreg 110 in a semi-cured state in which the high heat-resistant resin composition is impregnated with the fiber substrate. The laminate 150 is formed.
이에 비해, 본 발명의 다른 실시예에서는 섬유 기재(210)의 양면에 불소계 필름(230)을 압축(Press) 공정에 의해 적층함으로써 섬유 기재(210)와 불소계 필름(230)의 적층체(250)를 형성한다.On the contrary, in another embodiment of the present invention, the laminate 250 of the fiber base 210 and the fluorine film 230 is laminated by stacking the fluorine-based film 230 on both sides of the fiber base 210 by a press process. To form.
본 실시예에서, 금속적층판(200)은 상기 섬유 기재(210)와 불소계 필름(230)의 적층체(250)에 적층된 금속박(270)을 포함한다. 이때, 상기 금속박(270)이 상기 적층체(250)에 적층된 후에 고온 압착 공정에 의해 일체화되어 금속적층판(200)이 형성된다.In the present embodiment, the metal laminate 200 includes a metal foil 270 laminated on the laminate 250 of the fiber base 210 and the fluorine-based film 230. At this time, the metal foil 270 is laminated on the laminate 250 and then integrated by a high temperature compression process to form the metal laminate 200.
본 발명의 다른 일 실시예는 전술한 섬유 기재 및 불소계 필름을 순차적으로 적층하여 적층체를 형성한 후에, 금속박을 적층하고 고온 압축 공정으로 성형하여 형성하는 금속적층판의 제조방법을 포함한다.Another embodiment of the present invention includes a method of manufacturing a metal laminated plate that is formed by sequentially laminating the above-described fiber substrate and the fluorine-based film to form a laminate, and then laminating metal foils and molding them by a high temperature compression process.
보다 구체적으로, 본 발명의 다른 일 실시예에 따른 금속적층판(200)의 제조방법은 (a) 섬유 기재(210)의 상하면 상에 각각 불소계 필름(230)을 적층하여 적층체(250)를 준비하는 단계; 및 (b) 적층체의 상하면 상에 각각 금속박(270)을 적층한 후, 고온 압축 공정으로 일체화시키는 단계를 포함할 수 있다. 이때 상기 (b)단계의 고온 압축 공정은 270 내지 400℃의 온도에서 10분 내지 3시간 동안 실시하는 것이 바람직하다.More specifically, the manufacturing method of the metal laminate 200 according to another embodiment of the present invention (a) to prepare a laminate 250 by laminating the fluorine-based film 230 on the upper and lower surfaces of the fiber base 210, respectively. Making; And (b) stacking the metal foils 270 on the upper and lower surfaces of the laminate, and then integrating the same into a high temperature compression process. At this time, the high temperature compression process of step (b) is preferably carried out for 10 minutes to 3 hours at a temperature of 270 to 400 ℃.
아울러, 본 발명의 다른 일 실시예는 상기 섬유 기재, 불소계 필름, 및 금속박으로 구성된 군으로부터 선택되는 1종 이상을 포함하여 적층 성형된 인쇄회로기판, 바람직하게는 다층 인쇄회로기판을 포함한다.In addition, another embodiment of the present invention includes a laminated printed circuit board, preferably a multilayer printed circuit board, including at least one selected from the group consisting of the fiber substrate, the fluorine-based film, and the metal foil.
이상에서 설명한 바와 같이, 금속적층판은 본 발명에 따른 코어층, 불소계 필름, 및 금속박으로부터 제조될 수 있다. 이들 금속적층판은 낮은 유전율과 유전 손실을 가질 뿐만 아니라, 낮은 열 팽창계수(CTE) 및 우수한 접착 안정성을 동시에 가짐을 알 수 있었다(하기 표 1 참고). 따라서 본 발명의 금속적층판은 1 GHz 이상의 고주파 신호를 취급하는 이동체 통신기기나 그 기지국 장치, 서버, 라우터 등의 네트워크 관련 전자기기 및 대형 컴퓨터 등의 각종 전기전자 기기에 사용되는 네트워크용 인쇄회로기판의 부품 용도로서 유용하게 사용될 수 있다.As described above, the metal laminate may be prepared from the core layer, the fluorine-based film, and the metal foil according to the present invention. These metal laminates not only had low dielectric constant and dielectric loss, but also had a low coefficient of thermal expansion (CTE) and good adhesion stability (see Table 1 below). Therefore, the metal laminate of the present invention is a network printed circuit board used in mobile communication devices that handle high frequency signals of 1 GHz or more, network-based electronic devices such as base station devices, servers, routers, and various electrical and electronic devices such as large computers. It can be usefully used as a component.
이하 본 발명을 실시예를 통해 구체적으로 설명하나, 하기 실시예 및 실험예는 본 발명의 한 형태를 예시하는 것에 불과할 뿐이며, 본 발명의 범위가 하기 실시예 및 실험예에 의해 제한되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to Examples, but the following Examples and Experimental Examples are merely illustrative of one embodiment of the present invention, and the scope of the present invention is not limited to the following Examples and Experimental Examples.
[실시예 1]Example 1
1. 프리프레그의 제조1. Preparation of Prepregs
고내열성 에폭시 수지 조성으로 고내열성 수지 조성물을 제조하고 수지 바니시를 준비하였다.A high heat resistant resin composition was prepared with a high heat resistant epoxy resin composition and a resin varnish was prepared.
상기 준비된 수지 바니시에 1~2㎛ 두께의 유리 섬유를 함침시킨 후, 165℃에서 1~10분간 건조시켜 반경화 상태의 프리프레그를 제조하였다.The prepared resin varnish was impregnated with a glass fiber having a thickness of 1 to 2 μm, and then dried at 165 ° C. for 1 to 10 minutes to prepare a prepreg in a semi-cured state.
2. 동박적층판의 제조2. Manufacture of Copper Clad Laminates
상기 프리프레그의 양면에 50㎛(0.05T) 두께의 퍼플루오로 알콕시(PFA) 필름 (40wt% 실리카)을 적층하여 적층체를 얻었다.A 50 µm (0.05T) thick perfluoro alkoxy (PFA) film (40 wt% silica) was laminated on both sides of the prepreg to obtain a laminate.
상기 적층체의 양면에 18 ㎛ 두께의 동박을 적층한 후 320℃에서 2.5시간 프레스하여 0.16 mm두께의 동박적층판을 얻었다.18 micrometer-thick copper foil was laminated | stacked on both surfaces of the said laminated body, and it pressed at 320 degreeC for 2.5 hours, and obtained the copper clad laminated board of 0.16 mm thickness.
[실시예 2]Example 2
폴리테트라플루오로 필름(50wt%)을 사용한 점을 제외하고는 실시예 1과 동일한 방법으로 실시하여 동박적층판을 얻었다.A copper foil laminated plate was obtained in the same manner as in Example 1 except that a polytetrafluoro film (50 wt%) was used.
[실시예 3]Example 3
1. 적층체의 제조1. Preparation of laminate
준비된 25 ㎛ 두께의 유리섬유 의 양면에 50 ㎛ 두께의 퍼플루오로 알콕시(PFA)(40wt% 실리카)을 순차적으로 적층하여 적층체를 얻었다.50 µm thick perfluoro alkoxy (PFA) (40 wt% silica) was sequentially laminated on both sides of the prepared 25 µm thick glass fibers to obtain a laminate.
2. 동박적층판의 제조2. Manufacture of Copper Clad Laminates
상기 적층체의 양면에 18㎛ 두께의 동박을 적층한 후 320℃에서 2.5시간 프레스하여 0.16 mm두께의 동박적층판을 얻었다.The copper foil of 18 micrometers thickness was laminated | stacked on both surfaces of the said laminated body, and it pressed at 320 degreeC for 2.5 hours, and obtained the copper clad laminated board of 0.16 mm thickness.
[비교예 1]Comparative Example 1
1. 프리프레그의 제조1. Preparation of Prepregs
준비된 25 ㎛ 두께의 유리 섬유를 폴리테트라플루오로 에멀젼에 3회 이상 함침시킨 후, 165℃에서 3~10분간 건조하여 폴리테트라플루오로 프리프레그를 제조하였다.The prepared 25 μm-thick glass fibers were impregnated with a polytetrafluoroemulsion three times or more, and then dried at 165 ° C. for 3 to 10 minutes to prepare a polytetrafluoro prepreg.
2. 동박적층판의 제조2. Manufacture of Copper Clad Laminates
상기 폴리테트라플루오로 프리프레그의 양면에 18 ㎛ 두께의 동박을 적층한 후 350℃에서 24시간이상 프레스하여 0.16 mm두께의 동박적층판을 얻었다.18 micrometer-thick copper foil was laminated | stacked on both surfaces of the said polytetrafluoro prepreg, and it pressed at 350 degreeC for 24 hours or more, and obtained the copper foil laminated board of 0.16 mm thickness.
[실험예] Experimental Example
불소계 필름 및 동박적층판의 물성Properties of Fluorine-Based Films and Copper Clad Laminates
실시예 1~3 및 비교예 1에서 제조된 불소계 필름 및 동박적층판에 대하여 하기 실험을 수행하였으며, 그 결과를 하기 표 1에 나타내었다.The following experiments were performed on the fluorine-based films and copper foil laminates prepared in Examples 1 to 3 and Comparative Example 1, and the results are shown in Table 1 below.
[측정 조건][Measuring conditions]
1. 인장 강도(Tensile Strength, MPa): IPC TM-650 2.4.4/ASTM D3039의 시험 규격에 준하여 UTM 장비를 이용하여 측정하였다.1. Tensile Strength (MPa): Measured using UTM equipment according to the test standard of IPC TM-650 2.4.4 / ASTM D3039.
2. 탄성률(Young Modulus, MPa): IPC TM-650 2.4.4/ASTM D3039의 시험 규격에 준하여 UTM 장비를 이용하여 측정하였다.2. Modulus of elasticity (Young Modulus, MPa): Measured using a UTM equipment in accordance with the test standard of IPC TM-650 2.4.4 / ASTM D3039.
3. 연신률(Elong, %): IPC TM-650 2.4.4/ASTM D3039의 시험 규격에 준하여 UTM 장비를 이용하여 측정하였다.3. Elongation (Elong,%): Measured using UTM equipment according to the test standard of IPC TM-650 2.4.4 / ASTM D3039.
4. 열 팽창계수(CTE, ppm): IPC-650 2.4.41 의 시험 규격에 준하여 TMA (Thermo Mechanical Analyzer) 장비를 이용하여 측정하였다.4. Thermal expansion coefficient (CTE, ppm): measured using a TMA (Thermo Mechanical Analyzer) equipment in accordance with the test standard of IPC-650 2.4.41.
5. 박리 강도(P/S, Hoz): IPC TM-650.2.4.8의 시험 규격에 준하여 접착력 측정기로 측정하였다.5. Peel strength (P / S, Hoz): Measured by an adhesive force meter in accordance with the test standard of IPC TM-650.2.4.8.
6. TGA Ash% (Air): IPC TM-650.2.4.24.6의 시험 규격에 준하여 TGA (Thermogravimetric) 측정하였다.6. TGA Ash% (Air): TGA (Thermogravimetric) was measured according to the test standard of IPC TM-650.2.4.24.6.
7. S/F@288: 288℃의 납조에서 5㎝X 5㎝의 크기로 절단한 적층체를 넣은 후, 10분간 외관 변화를 육안으로 확인하였다.7. S / F @ 288: After putting the laminated body cut | disconnected in the magnitude | size of 5cmX5cm in the solder bath of 288 degreeC, the external appearance change was visually confirmed for 10 minutes.
8. 유전율(Dk): IPC TM-650.2.5.5.1의 시험 규격에 준하여 물질 분석기(Material Analyzer)를 이용하여 측정하였다.8. Dielectric constant (Dk): Measured using a material analyzer in accordance with the test standard of IPC TM-650.2.5.5.1.
9. 유전손실(Df): IPC TM-650.2.5.5.1의 시험 규격에 준하여 물질 분석기를 이용하여 측정하였다.9. Dielectric loss (Df): measured using a material analyzer in accordance with the test standard of IPC TM-650.2.5.5.1.
비교예Comparative example 실시예 1Example 1 실시예 2Example 2 실시예 3Example 3
충진제 타입Filler Type -- SC-2500SQSC-2500SQ SC-2500SQSC-2500SQ SC-2500SQSC-2500SQ
필름 외관Film appearance 양호Good 양호Good 이물bow 양호Good
성형 외관Molding appearance 양호Good 양호Good 이물bow 양호Good
인장 강도 (MPa)Tensile strength (MPa) 4040 8585 7474 8686
탄성률 (MPa)Modulus of elasticity (MPa) 20172017 27922792 29022902 26542654
연신률 (%)Elongation (%) 1010 66 55 66
CTE (x/y, ppm)CTE (x / y, ppm) 2727 1818 1212 1717
CTE (z, ppm)CTE (z, ppm) 200200 3535 2727 3434
P/S (Hoz)P / S (Hoz) 1.3~3.41.3 ~ 3.4 1.21.2 1.051.05 1.251.25
TGA Ash% (Air)TGA Ash% (Air) -- 3939 4848 3939
S/F@288S / F @ 288 >10분> 10 minutes >10분> 10 minutes >10분> 10 minutes >10분> 10 minutes
10Ghz10 Ghz DkDk 2.22.2 2.762.76 2.852.85 2.782.78
DfDf 0.0010.001 0.00120.0012 0.00140.0014 0.00120.0012
실험 결과, 본 발명의 불소계 필름은 우수한 모듈러스(Modulus) 특성과 치수 안정성 등을 동시에 나타낸다는 것을 알 수 있었다(상기 표 1 참조).As a result of the experiment, it was found that the fluorine-based film of the present invention simultaneously exhibited excellent modulus characteristics and dimensional stability (see Table 1 above).

Claims (15)

  1. 섬유 기재를 포함하는 코어(core)층;A core layer comprising a fibrous substrate;
    상기 코어층의 양면에 적층된 불소계 필름; 및Fluorine-based film laminated on both sides of the core layer; And
    상기 불소계 필름상에 적층된 금속박Metal foil laminated on the fluorine-based film
    을 포함하고, 상기 불소계 필름은 충진제(filler)를 포함하는 금속적층판.To include, The fluorine-based film is a metal laminate comprising a filler (filler).
  2. 제1항에 있어서,The method of claim 1,
    상기 불소계 필름은 폴리테트라플루오로에틸렌(PTFE), 플루오로와 에틸렌-프로필렌 공중합체 및 퍼플루오로알콕시 측쇄를 가진 플루오로탄소 중추로 이루어진 군으로부터 선택된 플루오로중합체 필름인 금속적층판.The fluorine-based film is a metal laminated plate is a fluoropolymer film selected from the group consisting of polytetrafluoroethylene (PTFE), a fluoro and ethylene-propylene copolymer and a fluorocarbon backbone having a perfluoroalkoxy side chain.
  3. 제1항에 있어서,The method of claim 1,
    상기 불소계 필름은 퍼플루오로 알콕시(PFA) 필름인 금속적층판.Wherein the fluorine-based film is a perfluoro alkoxy (PFA) film metal laminate plate.
  4. 제1항에 있어서,The method of claim 1,
    상기 불소계 필름에서 상기 충진제는 10 내지 70 중량%의 함량으로 포함되는 금속적층판.In the fluorine-based film, the filler is a metal laminate comprising a content of 10 to 70% by weight.
  5. 제1항에 있어서,The method of claim 1,
    상기 충진제는 실리카(silica), 이산화티타늄(TiO2), 알루미나(Al2O3), 티타늄산칼륨(K2O6TiO2), 산화 바륨(BaO) 중 하나인 금속적층판.The filler is one of silica (silica), titanium dioxide (TiO 2 ), alumina (Al 2 O 3 ), potassium titanate (K 2 O 6 TiO 2 ), barium oxide (BaO).
  6. 제1항에 있어서The method of claim 1
    상기 코어층은 고내열성 수지 조성물에 섬유 기재를 함침시켜 경화된 수지층을 포함하는 금속적층판.The core layer is a metal laminated plate comprising a resin layer cured by impregnating a high temperature resistant resin composition with a fiber substrate.
  7. 제6항에 있어서,The method of claim 6,
    상기 고내열성 수지 조성물은 비스페놀 A(bisphenol A)형 에폭시, 방향족 나프탈렌 에폭시, 비페닐 아르알킬(biphenyl aralkyl)형 에폭시, 이소시아누레이트(isocyanurate) 에폭시, 크레졸 노블락(cresol novlac)형 에폭시 수지, 고내열성 에폭시 수지 중 하나 이상을 포함하는 금속적층판.The high heat resistance resin composition is bisphenol A (bisphenol A) type epoxy, aromatic naphthalene epoxy, biphenyl aralkyl type epoxy, isocyanurate epoxy, cresol novlac type epoxy resin, high A metal laminate comprising at least one of heat resistant epoxy resins.
  8. 제1항에 있어서,The method of claim 1,
    상기 섬유 기재는 스프레드 유리섬유(Spread G/F)인 금속적층판.The fiber substrate is a spread glass fiber (Spread G / F) metal laminate.
  9. 제8항에 있어서,The method of claim 8,
    상기 스프레드 유리 섬유는 유리 섬유; 및 무기 바인더를 포함하는 금속적층판.The spread glass fibers are glass fibers; And an inorganic binder.
  10. 제1항에 있어서,The method of claim 1,
    상기 금속박은 0.5 내지 5.0㎛ 범위의 조도(Rz)를 갖는 동박인 금속적층판.The metal foil is a metal laminated plate is a copper foil having a roughness (Rz) in the range of 0.5 to 5.0㎛.
  11. 제1항에 있어서,The method of claim 1,
    상기 금속적층판의 열팽창계수(CTE)는 5 내지 40인 금속적층판.The coefficient of thermal expansion (CTE) of the metal laminated plate is 5 to 40 metal laminated plate.
  12. 제1항에 있어서,The method of claim 1,
    상기 금속적층판에서 불소계 필름에 대한 금속박의 박리 강도(P/S)는 0.8 내지 1.2 kgf/cm인 금속적층판.Peeling strength (P / S) of the metal foil to the fluorine-based film in the metal laminated plate is 0.8 to 1.2 kgf / cm metal laminated plate.
  13. (a) 고내열성 수지 조성물에 섬유 기재를 함침한 후 반경화시켜 코어층을 제조하는 단계; 및(a) impregnating a fibrous substrate in the high heat resistant resin composition and then semi-curing to prepare a core layer; And
    (b) 상기 코어층의 상하면 상에 각각 불소계 필름 및 금속박을 순차적으로 적층한 후, 고온 압축 공정으로 일체화시키는 단계(b) stacking fluorine-based films and metal foils sequentially on the upper and lower surfaces of the core layer, and then integrating the same by a high-temperature compression process;
    를 포함하는 제1항 내지 제12항 중 어느 한 항에 따른 금속적층판의 제조방법.The method of manufacturing a metal laminate according to any one of claims 1 to 12.
  14. (a) 코어층의 상하면 상에 각각 불소계 필름을 적층하여 적층체를 형성하는 단계; 및(a) forming a laminate by laminating fluorine-based films on the upper and lower surfaces of the core layer, respectively; And
    (b) 상기 적층체의 상하면 상에 각각 금속박을 적층한 후, 고온 압축 공정으로 일체화시키는 단계(b) stacking metal foils on the upper and lower surfaces of the laminate, and then integrating them by a high temperature compression process;
    를 포함하며, 상기 코어층은 스프레드 유리 섬유를 포함하는 제1항 내지 제12항 중 어느 한 항에 따른 금속적층판의 제조방법.The method according to any one of claims 1 to 12, wherein the core layer comprises a spread glass fiber.
  15. 제13항 또는 제14항에 있어서,The method according to claim 13 or 14,
    상기 고온 압축 공정은 270 내지 400℃의 온도에서 10분 내지 3시간 동안 실시하는 금속적층판의 제조방법.The high temperature compression process is a method of manufacturing a metal laminated plate is carried out for 10 minutes to 3 hours at a temperature of 270 to 400 ℃.
PCT/KR2017/015122 2016-12-23 2017-12-20 Metal laminate and method for manufacturing same WO2018117636A1 (en)

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