WO2018058501A1 - 负型光阻组成物及其用途 - Google Patents

负型光阻组成物及其用途 Download PDF

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WO2018058501A1
WO2018058501A1 PCT/CN2016/101019 CN2016101019W WO2018058501A1 WO 2018058501 A1 WO2018058501 A1 WO 2018058501A1 CN 2016101019 W CN2016101019 W CN 2016101019W WO 2018058501 A1 WO2018058501 A1 WO 2018058501A1
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powder
niobium
tin
vanadium
zirconium
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PCT/CN2016/101019
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English (en)
French (fr)
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林文福
许铭案
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许铭案
林文福
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Priority to PCT/CN2016/101019 priority Critical patent/WO2018058501A1/zh
Publication of WO2018058501A1 publication Critical patent/WO2018058501A1/zh

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

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  • the present invention relates to a substrate, and more particularly to a negative photoresist composition and use thereof.
  • the first technique is laser engraving, which produces different reflections at different angles by engraving the same pattern at different depths on the substrate.
  • the second technique is to fill the negative photoresist with a pigment, and after the negative photoresist is exposed and developed, a permanent pattern of a specific pattern is formed to become a colored pattern.
  • the third technique is to use a thin film process technology to form a convex semi-spherical three-dimensional pattern on a substrate, and then cover a three-dimensional pattern with a reflective film layer to form a reflection at different angles in a portion of the convex semi-spherical pattern. It constitutes a color perception at different angles, even a laser-like vision.
  • the above different technical practices can not simultaneously achieve the results of synchronization in reflection, refraction and color.
  • the use of the first laser technology the production process is cumbersome and low-capacity; the second technique can only achieve a monochromatic effect, can not achieve the reflection or refraction effect at different angles; use the third film process Technology, its cost is high, and can not achieve color change effects at different angles.
  • the technical problem to be solved by the present invention is how to develop a material that simultaneously changes the color, reflection or refraction of the appearance of the product.
  • the present invention provides a negative photoresist composition
  • a negative photoresist composition comprising:
  • a sheet-like structure powder wherein the sheet-like structure powder accounts for 0.5%-80% by weight of the negative-type photoresist composition, and the monomer of the sheet-like structure powder is a sheet-like structure, and the length is between 0.2 ⁇ m and 10 ⁇ m. between;
  • the negative photoresist composition is formed on a substrate to form a permanent pattern to change the reflectivity of the substrate, so that the substrate can exhibit different colors or metallic luster at different angles.
  • the material of the flake structure powder is selected from the group consisting of: flake metal powder, flake metal oxide powder, flake metal nitride powder, flake metal boride powder, mica, silicon oxide or a mixture thereof; wherein the flake is Metal powder is gold, silver, copper, aluminum, titanium, zirconium, Chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, a single flake metal powder of manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum or tin, or any combination thereof; the flake metal oxide powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, One of chromium, molybdenum,
  • the flaky metal boride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium , tin, magnesium, calcium
  • the flaky metal boride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum
  • nickel, palladium platinum
  • vanadium, niobium, tantalum indium, t
  • the negative photoresist composition can be fabricated into a hardened pattern having a product resolution of between 10 micrometers and 200 micrometers by a lithography process.
  • the main structure of the negative photoresist is selected from the group consisting of an acrylic structure, a polyurethane structure, an epoxy structure, a melamine structure, and a phenolic structure.
  • the negative photoresist composition changes the refractive index of the substrate.
  • the negative photoresist composition changes the color of the substrate.
  • the invention also provides a negative photoresist composition
  • a negative photoresist composition comprising:
  • a sheet-like structure powder wherein the sheet-like structure powder accounts for 0.5%-80% by weight of the negative-type photoresist composition, and the monomer of the sheet-like structure powder is a sheet-like structure, and the length is between 0.2 ⁇ m and 10 ⁇ m. between;
  • the negative photoresist composition is formed on a substrate to form a permanent pattern to change the refractive index of the substrate, so that the substrate can exhibit different colors or metallic luster at different angles.
  • the material of the flake structure powder is selected from the group consisting of: flake metal powder, flake metal oxide powder, flake metal nitride powder, flake metal boride powder, mica, silicon oxide or a mixture thereof; wherein the flake is
  • the metal powder may be gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, surface modified gold, Silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, tin, single flake metal powder, or any combination of the above;
  • the metal oxide powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molyb
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, , Manganese, iron, cobalt, nickel, palladium, One of platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium or cerium oxide powder, or any combination of the above;
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, , Manganese, iron, cobalt, nickel, palladium, One of platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium, niobium nitride powders, surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, One of cobalt, nickel, palladium
  • the negative photoresist composition can be fabricated into a hardened pattern having a product resolution of between 10 micrometers and 200 micrometers by a lithography process.
  • the main structure of the negative photoresist is selected from the group consisting of an acrylic structure, a polyurethane structure, an epoxy structure, a melamine structure, and a phenolic structure.
  • the negative photoresist composition changes the color of the substrate.
  • the invention also provides a negative photoresist composition
  • a negative photoresist composition comprising:
  • a sheet-like structure powder wherein the sheet-like structure powder accounts for 0.5%-80% by weight of the negative-type photoresist composition, and the monomer of the sheet-like structure powder is a sheet-like structure, and the length is between 0.2 ⁇ m and 10 ⁇ m. between;
  • the negative photoresist composition is formed on a substrate to form a permanent pattern to change the color of the substrate, so that the substrate can exhibit different colors or metallic luster at different angles.
  • the material of the flake structure powder is selected from the group consisting of: flake metal powder, flake metal oxide powder, flake metal nitride powder, flake metal boride powder, mica, silicon oxide or a mixture thereof; wherein the flake is
  • the metal powder may be gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, surface modified gold, Silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, tin, single flake metal powder, or any combination of the above;
  • the metal oxide powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molyb
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, One of manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, One of calcium or cerium oxide powder, or any combination of the above;
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, One of manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium, niobium nitride powders, surface modified gold, silver, copper, aluminum, titanium, zirconium One of chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum,
  • One of the boride powders surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin
  • the negative photoresist composition can be fabricated into a hardened pattern having a product resolution of between 10 micrometers and 200 micrometers by a lithography process.
  • the main structure of the negative photoresist is selected from the group consisting of an acrylic structure, a polyurethane structure, an epoxy structure, a melamine structure, and a phenolic structure.
  • the present invention also provides a method of forming a pattern having a color change effect on a substrate, comprising:
  • the negative photoresist composition comprising a negative photoresist and a flake structure powder, wherein the flake structure powder occupies the negative photoresist composition
  • the weight percentage is between 0.5% and 80%, and the monomer of the flake structure powder is a sheet-like structure, and the length is between 0.2 um and 10 um;
  • the substrate forming the pattern is imaged with a developer to form the pattern.
  • the material of the flake structure powder is selected from the group consisting of: flake metal powder, flake metal oxide powder, flake metal nitride powder, flake metal boride powder, mica, silicon oxide or a mixture thereof; wherein the flake is
  • the metal powder may be gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, surface modified gold, Silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, tin, single flake metal powder, or any combination of the above;
  • the metal oxide powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molyb
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, One of manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, One of calcium or cerium oxide powder, or any combination of the above;
  • the flaky metal nitride powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, One of manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium, niobium nitride powders, surface modified gold, silver, copper, aluminum, titanium, zirconium One of chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum,
  • the resolution of the pattern is between 10 microns and 200 microns.
  • the main structure of the negative photoresist is selected from the group consisting of an acrylic structure, a polyurethane structure, an epoxy structure, a melamine structure, and a phenolic structure.
  • the invention provides a negative-type photoresist composition and a use thereof, which are doped into a negative-type photoresist by using a sheet-like structure powder, and are doped into a negative-type photoresist by a sheet-like structure powder, for coating, After exposure and development process, it is hardened into a specific pattern.
  • the pattern has the characteristics of multi-angle reflection, multi-angle refraction and different color changes, which enables a new generation of various types of products to have special technical effects that can express special color effects.
  • FIG. 1A and 1B are schematic views showing the reflection effect of different pattern structures of the negative photoresist composition of the present invention.
  • FIG. 2 is a flow chart of a method of forming a pattern having a color change effect on a substrate according to the present invention.
  • the present invention utilizes a sheet-like structure powder to be doped into a negative-type photoresist, which is doped into a negative-type photoresist by a sheet-like structure powder, and hardens after coating, exposure, and development processes.
  • the pattern has the characteristics of multi-angle reflection, multi-angle refraction and different color changes, which enables a new generation of various types of products to have special technical effects that can express special color effects.
  • the negative photoresist composition of the present invention comprises: a negative photoresist and a flake structure powder.
  • the weight of the sheet-like structure powder is between 0.5% and 80% by weight of the negative-type photoresist composition
  • the monomer of the sheet-like structure powder is a sheet-like structure with a length of between 0.2 ⁇ m and 10 ⁇ m; wherein
  • the negative photoresist composition is formed on a substrate to form a permanent pattern to change the reflectivity, refractive index, and color of the substrate, so that the substrate can exhibit different colors or metallic luster at different angles.
  • the material of the flake structure powder may be any one of the following options or a combination thereof: flake metal powder, flake metal oxide powder, flake metal nitride powder, flake metal boride powder, mica, silicon oxide or Its mixture.
  • the flake metal powder may be a single piece of gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, or the like.
  • Metal powder surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, tin, etc.
  • the flake metal oxide powder may be silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium
  • One of the flake metal oxide powders such as lanthanum, cerium, tin, magnesium, calcium and barium, surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt
  • sheet metal oxide powders such as nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium, barium, or the like; or a composition of a plurality of sheet metal oxides; flake metal nitrogen
  • the powder is selected from the group consisting of silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, co
  • sheet metal nitride powders surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum,
  • sheet metal nitride powders such as indium, tin, magnesium, calcium, barium, or a plurality of sheet nitrides; sheet metal boride powder may It is a sheet metal boride such as silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium, calcium or strontium.
  • One of the powders surface modified gold, silver, copper, aluminum, titanium, zirconium, chromium, molybdenum, tungsten, manganese, iron, cobalt, nickel, palladium, platinum, vanadium, niobium, tantalum, indium, tin, magnesium
  • One of flaky metal boride powders such as calcium or strontium, or a plurality of flaky boride compounds.
  • the negative photoresist composition can be fabricated into a hardened pattern having a product resolution of between 10 micrometers and 200 micrometers by a lithography process.
  • the main structure of the negative photoresist is selected from the group consisting of an acrylic structure (Acrylic base), a polyurethane (PU base) structure, an epoxy base, a polycyanamide base, and a phenolic resin. Structure (phenol aldehyde base).
  • FIG. 1A is a pattern in which a negative photoresist composition of the present invention is formed into a circular shape.
  • the circular-shaped pattern 20a is made of a negative-type photoresist composition and hardened, and includes a hardened negative-type photoresist 21 and a sheet-like structure powder 40, which are formed on the circular-shaped pattern 20a.
  • a protective layer 30 is formed; and FIG.
  • the bump-shaped pattern 20b is made of a negative photoresist composition and hardened, and includes The cured negative photoresist 21 and the sheet-like structure powder 40 are formed with a protective layer 30 on the formed bump-shaped pattern 20b.
  • the sheet-like structure powder 40 among the negative-type photoresist compositions formed on the substrate 10, after receiving the incident light in the same direction, is in the form of a sheet, regardless of the shape. Any arrangement of structural powders reflects light rays into reflected rays 51, 52, 53 in different directions. In addition, since the thickness of the sheet-like structure powder is different, a part of the light is refracted, and thus different refraction effects and color variability can be exhibited. Thus, the appearance of the product produced by using the negative photoresist composition of the present invention will exhibit special technical effects of different colors or metallic colors due to reflection, refraction or color change.
  • a flow chart of a method for forming a pattern having a color change effect on a substrate of the present invention comprises the following steps:
  • Step 101 Applying a negative photoresist composition to a substrate, the negative photoresist composition comprising a negative photoresist and a flake structure powder, the flake structure powder occupying the negative photoresist
  • the weight percentage of the composition is between 0.5% and 80%
  • the monomer of the flake structure powder is a sheet-like structure with a length of between 0.2 ⁇ m and 10 ⁇ m.
  • Step 102 Form a pattern on the substrate having the negative resist composition by exposure.
  • Step 103 The substrate forming the pattern is imaged with a developer to form the pattern.
  • the negative photoresist composition of the present invention can be patterned onto the substrate via the coating, exposure, and development processes of steps 101-103.
  • the substrate may be any substrate having a hardened photoresist composition using the process of the present invention after the hardening process of the above process.
  • the pattern has the characteristics of many different changes in reflection, refraction or color, and can exhibit different technical effects of different colors or metallic luster at different angles.

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  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)

Abstract

一种负型光阻组成物及其用途,负型光阻组成物包含:负型光阻剂(21)与片状结构粉末(40);其中,片状结构粉末(40)占负型光阻组成物的重量百分比为0.5%-80%之间,片状结构粉末(40)的单体为片状结构,长介于0.2μm-10μm之间;其中,负型光阻组成物用于形成于基材(10)上而形成永久图案,以改变基材(10)的反射率,使基材(10)于不同角度可呈现不同颜色或金属光泽。

Description

负型光阻组成物及其用途 技术领域
本发明关于一种基板,特别关于一种负型光阻组成物及其用途。
背景技术
一般来讲,在电子产品外壳的外观设计上(例如手机、电视、平板计算机等),若要在颜色、反射等面向上有特殊的效果,多半会采用几种方式。第一种技术是激光雕刻技术,通过在基板上的不同深度,刻上相同的图案,就会产生不同角度的不同反射效果。第二种技术是在负型光阻剂当中填入颜料,让负型光阻剂于曝光显影过后,形成特定图案的永久材而成为有颜色的图案。第三种技术是运用薄膜制程技术,通过于基板上制作凸块半圆球立体图案,再于立体图案上覆盖一反光薄膜层,即可于凸块半圆球立体图案的部分,于不同角度形成反射,构成不同角度的颜色感觉,甚至类似激光雕刻的视觉。
以上不同的技术作法,并无法同时达到同步在反射、折射与颜色上都有效果的结果。特别是,运用第一种的激光技术,其制作过程麻烦且产能较低;运用第二种技术只能达到单色的效果,无法达到不同角度的反射或折射效果;运用第三种的薄膜制程技术,其成本较高,且不能达到不同角度的颜色改变效果。
在目前电子产品外观的各种特殊效果的需求下,如何能开发出一种同时可改变产品外观的颜色、反射或折射的效果的材料,成为电子产品技术开发的重要方向。
技术问题
本发明所要解决的技术问题是:如何能开发出一种同时可改变产品外观的颜色、反射或折射的效果的材料。
技术解决方案
为了解决上述技术问题,本发明提供一种负型光阻组成物,包含:
一负型光阻剂;及
片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的反射率,使该基材于不同角度可呈现不同颜色或金属光泽。
该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末是金、银、铜、铝、钛、锆、 铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构和酚醛结构。
负型光阻组成物改变该基材的折射率。
该负型光阻组成物改变该基材的颜色。
本发明还提供一种负型光阻组成物,包含:
一负型光阻剂;及
片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的折射率,使该基材于不同角度可呈现不同颜色或金属光泽。
该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、 铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
该负型光阻组成物并改变该基材的颜色。
本发明还提供一种负型光阻组成物,包含:
一负型光阻剂;及
片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的颜色,使该基材于不同角度可呈现不同颜色或金属光泽。
该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末系选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
本发明还提供一种形成具有色泽变化效果图案于基材的方法,包含:
将一负型光阻组成物涂布于一基材上,该负型光阻组成物包含一负型光阻剂及片状结构粉末,该片状结构粉末占该负型光阻组成物之重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
以曝光方式于具有该负型光阻组成物的该基材上形成一图案;及
将形成该图案的该基材以一显影剂成像以形成该图案。
该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
该图案的分辨率介于10微米至200微米之间。
该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
有益效果
本发明提供一种负型光阻组成物及其用途,运用片状结构粉末掺杂于负型光阻剂当中,借由片状结构粉末掺杂于负型光阻剂当中,于涂布、曝光、显影制程后硬化为特定图案,该图案即具有多角度反射、多角度折射与不同颜色变化的特性,可让新一代的各类型产品具有可表现特殊色泽效果的特殊技术功效。
附图说明
图1A、1B为本发明的负型光阻组成物的不同图案架构的反射效果示意图。
图2为本发明的形成具有色泽变化效果图案于基材的方法流程图。
符号说明:
10  基板;
20a  圆体形状的图案;
20b  凸块形状的图案;
21  负型光阻剂;
30  保护层;
40  片状结构粉末;
51、52、53  反射光线。
本发明的实施方式
根据本发明的实施例,本发明运用片状结构粉末掺杂于负型光阻剂当中,借由片状结构粉末掺杂于负型光阻剂当中,于涂布、曝光、显影制程后硬化为特定图案,该图案即具有多角度反射、多角度折射与不同颜色变化的特性,可让新一代的各类型产品具有可表现特殊色泽效果的特殊技术功效。
本发明的负型光阻组成物包含:负型光阻剂及片状结构粉末。其中,片状结构粉末占负型光阻组成物的重量百分比为0.5%-80%之间,片状结构粉末的单体为片状结构,长介于0.2um-10um之间;其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的反射率、折射率、颜色,使该基材于不同角度可呈现不同颜色或金属光泽。
其中,片状结构粉末的材料可以是以下几种任选或者其组合:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物。其中,片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡等单一片状金属粉末,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡等单一片状金属粉末,或者,多种片状金属粉末的组成;片状金属氧化物粉末可以是银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡等片状金属氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡等片状金属氧化物粉末其中之一,或者多种以上的片状金属氧化物的组成;片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡等片状金属氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡等片状金属氮化物粉末其中之一,或者多种以上的片状氮化物的组成;片状金属硼化物粉末可以 是银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡等片状金属硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡等片状金属硼化物粉末其中之一,或者多种以上的片状硼化物的组成。
此外,负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
负型光阻剂的主体结构选自丙烯酸结构(压克力结构,Acrylic base)、聚氨酯(Polyurethane base,PU base)结构、环氧结构(epoxy base)、聚氰胺结构(polycyanamide base)、酚醛结构(phenol aldehyde base)。
请参考图1A、1B,本发明的负型光阻组成物制作于一基板的两个不同图案结构的实施例,图1A是将本发明的负型光阻组成物制作为圆体形状的图案20a,圆体形状的图案20a由负型光阻组成物制作而硬化而成,当中包含了硬化后的负型光阻剂21以及片状结构粉末40,制作好的圆体形状的图案20a上形成一层保护层30;而图1B则将本发明的负型光阻组成物制作为一般凸块形状,凸块形状的图案20b由负型光阻组成物制作而硬化而成,当中包含了硬化后的负型光阻剂21以及片状结构粉末40,制作好的凸块形状的图案20b上形成一层保护层30。
由图1A、1B的实施例可以发现,无论制作为哪个形状,制作于基板10上的负型光阻组成物当中的片状结构粉末40,于接受到相同方向的入射光后,由于片状结构粉末的任意排列,将光线反射为不同方向的反射光线51、52、53。此外,由于片状结构粉末的厚薄度不一,导致部分光线被折射,因而可呈现不同的折射效果,以及颜色的变化性。于是,运用本发明的负型光阻组成物所制作的产品外观,将会因反射、折射或颜色变化而呈现不同角度有不同颜色或金属色泽的特殊技术功效。
接下来,请参考图2,本发明的形成具有色泽变化效果图案于基材的方法流程图,包含以下步骤:
步骤101:将一负型光阻组成物涂布于一基材上,该负型光阻组成物包含一负型光阻剂及片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间。
步骤102:以曝光方式于具有该负型光阻组成物的该基材上形成一图案。
步骤103:将形成该图案的该基材以一显影剂成像以形成该图案。
经由步骤101-103的涂布、曝光、显影制程,即可将本发明的负型光阻组成物形成一图案于基材上。此基材可以是任何基材,具有运用本发明的负型光阻组成物经过以上制程所制程的硬化后的 图案,就具有可以在反射、折射或颜色上的多种不同变化的特色,并于不同角度可呈现不同颜色或金属光泽的特殊技术功效。
以上所述实施例仅是为充分说明本发明而所举的较佳的实施例,本发明的保护范围不限于此。本技术领域的技术人员在本发明基础上所作的等同替代或变换,均在本发明的保护范围之内。本发明的保护范围以权利要求书为准。

Claims (19)

  1. 一种负型光阻组成物,其特征在于,包含:
    一负型光阻剂;及
    片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
    其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的反射率,使该基材于不同角度可呈现不同颜色或金属光泽。
  2. 如权利要求1所述的负型光阻组成物,其特征在于,该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
  3. 如权利要求1所述的负型光阻组成物,其特征在于,该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
  4. 如权利要求1所述的负型光阻组成物,其特征在于,该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构和酚醛结构。
  5. 如权利要求1所述的负型光阻组成物,其特征在于,负型光阻组成物改变该基材的折射率。
  6. 如权利要求1或5所述的负型光阻组成物,其特征在于,该负型光阻组成物改变该基材的颜色。
  7. 一种负型光阻组成物,其特征在于,包含:
    一负型光阻剂;及
    片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
    其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的折射率,使该基材于不同角度可呈现不同颜色或金属光泽。
  8. 如权利要求7所述的负型光阻组成物,其特征在于,该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
  9. 如权利要求7所述的负型光阻组成物,其特征在于,该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
  10. 如权利要求7所述的负型光阻组成物,其特征在于,该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
  11. 如权利要求7所述之负型光阻组成物,其特征在于,该负型光阻组成物并改变该基材的颜色。
  12. 一种负型光阻组成物,其特征在于,包含:
    一负型光阻剂;及
    片状结构粉末,该片状结构粉末占该负型光阻组成物的重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
    其中,该负型光阻组成物用于形成于一基材上而形成一永久图案,以改变该基材的颜色,使该基材于不同角度可呈现不同颜色或金属光泽。
  13. 如权利要求12所述的负型光阻组成物,其特征在于,该片状结构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末系选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
  14. 如权利要求12所述的负型光阻组成物,其特征在于,该负型光阻组成物可借由微影制程制作成产品分辨率介于10微米至200微米之间的硬化图案。
  15. 如权利要求12所述的负型光阻组成物,其特征在于,该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
  16. 一种形成具有色泽变化效果图案于基材的方法,其特征在于,包含:
    将一负型光阻组成物涂布于一基材上,该负型光阻组成物包含一负型光阻剂及片状结构粉末,该片状结构粉末占该负型光阻组成物之重量百分比为0.5%-80%之间,该片状结构粉末的单体为片状结构,长介于0.2um-10um之间;
    以曝光方式于具有该负型光阻组成物的该基材上形成一图案;及
    将形成该图案的该基材以一显影剂成像以形成该图案。
  17. 如权利要求16所述的形成具有色泽变化效果图案于基材的方法,其特征在于,该片状结 构粉末的材料选自:片状金属粉末、片状金属氧化物粉末、片状金属氮化物粉末、片状金属硼化物粉末、云母、氧化硅或其混和物;其中,该片状金属粉末可以是金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡单一片状金属粉末,或以上的任意组合;该片状金属氧化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、锡、镁、钙、钡氧化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氧化物粉末其中之一,或以上的任意组合;该片状金属氮化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡氮化物粉末其中之一,或以上的任意组合;该片状金属硼化物粉末选自银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,表面改质的金、银、铜、铝、钛、锆、铬、钼、钨、锰、铁、钴、镍、钯、铂、钒、铌、铑、铟、锡、镁、钙、钡硼化物粉末其中之一,或以上的任意组合。
  18. 如权利要求16所述的形成具有色泽变化效果图案于基材的方法,其特征在于,该图案的分辨率介于10微米至200微米之间。
  19. 如权利要求16所述的形成具有色泽变化效果图案于基材的方法,其特征在于,该负型光阻剂的主体结构选自丙烯酸结构、聚氨酯结构、环氧结构、聚氰胺结构、酚醛结构。
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102169995A (zh) * 2006-12-15 2011-08-31 东京应化工业株式会社 负极基材
CA2371760C (en) * 1999-05-14 2013-06-25 Ifire Technology Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties
TWM519808U (zh) * 2015-07-16 2016-04-01 許銘案 具彩色光阻圖案之裝置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2371760C (en) * 1999-05-14 2013-06-25 Ifire Technology Inc. Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties
CN102169995A (zh) * 2006-12-15 2011-08-31 东京应化工业株式会社 负极基材
TWM519808U (zh) * 2015-07-16 2016-04-01 許銘案 具彩色光阻圖案之裝置

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