WO2017092667A1 - 一种光学防伪元件及使用该光学防伪元件的光学防伪产品 - Google Patents

一种光学防伪元件及使用该光学防伪元件的光学防伪产品 Download PDF

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WO2017092667A1
WO2017092667A1 PCT/CN2016/107950 CN2016107950W WO2017092667A1 WO 2017092667 A1 WO2017092667 A1 WO 2017092667A1 CN 2016107950 W CN2016107950 W CN 2016107950W WO 2017092667 A1 WO2017092667 A1 WO 2017092667A1
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layer
security element
optical security
region
element according
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PCT/CN2016/107950
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English (en)
French (fr)
Inventor
朱军
张宝利
叶中东
胡春华
李欣毅
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中钞特种防伪科技有限公司
中国印钞造币总公司
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Priority to US15/765,285 priority Critical patent/US10308062B2/en
Priority to EP16869977.5A priority patent/EP3351399A4/en
Publication of WO2017092667A1 publication Critical patent/WO2017092667A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D15/00—Printed matter of special format or style not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/342—Moiré effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/21—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose for multiple purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/364—Liquid crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44F—SPECIAL DESIGNS OR PICTURES
    • B44F1/00—Designs or pictures characterised by special or unusual light effects

Definitions

  • the present invention relates to the field of optical anti-counterfeiting, and in particular to an optical security element and an optical anti-counterfeiting product using the optical anti-counterfeiting element.
  • optical anti-counterfeiting technology is widely used in various high-security or high-value-added printed matter such as banknotes, cards, and product packaging, and has achieved very good results.
  • CN101563640, CN101443692, CN101120139, CN101346244, US5712731, US0034082, US4765656, US4892336, CN1271106, CN1552589, etc. disclose the same type of security elements with microlens arrays and microtexture arrays on both surfaces of the substrate, wherein, the micro-textographic array is located near the focal plane of the microlens array, and the moiré effect of the micro-image array is used to reproduce a pattern having a certain depth of field or exhibiting a dynamic effect.
  • the micro-text image array and its background need to have sufficient color or brightness contrast, that is, the micro-text image array needs to be colored. Since the required micro-text structure is very fine (about a few micrometers), and the limit printing stroke of general printing technology is above 20 microns, the general printing technology cannot meet the fineness requirement.
  • micro-nano structure as disclosed in the patent document US20030179364, which discloses the use of a large aspect ratio optical absorption structure to achieve black micro-texture coloring.
  • US Pat. No. 6,100,307,705 A1 discloses the use of nanoparticle-filled or stepped metal nanostructures. The coloring of microtext.
  • An object of the present invention is to provide an optical security element and an optical anti-counterfeiting product using the same, which are characterized by being easily identifiable and difficult to forge.
  • the present invention provides an optical security element comprising: a substrate comprising mutually opposing first and second surfaces; a sampled composite layer on the first surface of the substrate; a microimage layer on the second surface of the substrate, the microimage layer comprising a first region and a second region, the first region being at least partially covered with a plating layer, and the second region comprising at least two sub-regions
  • Each sub-region is at least partially covered with a color functional layer, the color functional layer in each sub-region and the plating layer in the first region have respective different color features, and the micro-image layer can be sampled by the sampling and synthesis layer and Synthesize to form an image.
  • the present invention also provides an optical security product using the above optical security element.
  • the micro image layer is formed by a plating layer having different color characteristics and a plurality of color function layers, the micro image layer will have information of a plurality of colors, so that the sampled and synthesized image has multicolor characteristics. And solve the problem of single color of such products;
  • optical security element according to the present invention can be mass-produced by using a general-purpose device in the field, and the process is highly feasible.
  • Figure 1a is a cross-sectional view of an optical security element in accordance with one embodiment of the present invention.
  • 1b is a schematic diagram showing an arrangement of a sample synthesis layer and a micro image layer of an optical security element according to an embodiment of the present invention
  • FIG. 1c and 1d are schematic diagrams showing optical characteristics of an optical security element according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a fabrication step of a plating layer in a micro image layer of an optical security element according to an embodiment of the present invention
  • FIG. 3 is a schematic view showing another manufacturing step of a plating layer in a micro image layer of an optical security element according to an embodiment of the present invention
  • Figure 4 is a step of further fabricating the color functional layer in the second region based on the fabrication steps shown in Figure 3.
  • 5a to 5d are schematic views of an embodiment of a partial advantageous effect that the optical security element according to the present invention can bring;
  • FIG. 6 is a schematic cross-sectional view of an optical security element that forms a reflective layer on a sampled composite layer in accordance with an embodiment of the present invention.
  • an optical security element includes a substrate 2, a sample synthesis layer 21, and a micro image layer 22.
  • the substrate 2 includes a first surface 31 and a second surface 32 that are opposed to each other.
  • the sample synthesis layer 21 is located on the first surface 31 of the substrate 2.
  • the microimage layer 22 is located on a second surface 32 of the substrate 2, the microimage layer 22 comprising a first region and a second region, the first region being at least partially covered with a plating layer 221, the second region comprising at least two a sub-region, each of which is at least partially covered with a color functional layer (for example, two sub-regions are shown in FIG.
  • the color functional layers (222, 223) and the plating layer 221 in the first region have respective different color features, and the micro image layer 22 can be sampled and synthesized by the sampling composite layer 21 to form an image. That is, the plating layer 221 in the first region and the color functional layers 222, 223 in the second region collectively form the micro image layer 22.
  • a specific embodiment of the optical security element according to the present invention may be that the sampling composite layer 22 adopts a spherical microlens array having a diameter of 21 ⁇ m, and the microlens array is The arrangement is arranged in a rectangular shape (as shown in Fig. 1b(a)), the arrangement period is 23 ⁇ m, the height of the microlens is 7 ⁇ m, and the thickness of the substrate 2 is 20 ⁇ m.
  • the plating layer 221 is a 40 nm thick metal Al layer, and the color functional layers 222 and 223 are red and green nano inks, respectively.
  • FIG. 1b(b) A top view of the microimage layer 22 composed of the plating layer 221 and the color functional layers 222, 223 is as shown in FIG. 1b(b), wherein the Al plating layer 221 forms the background (ie, the first region) of the micro image layer 22, and the red color
  • the functional layer 222 and the green color functional layer 223 regionally form a stroke (second region) of the micro image layer 22, and the arrangement period of the composed "B" micro image array and the microlens array in the sampling synthesis layer 22
  • the arrangement period is uniform, but the array orientation of the micro image array and the microlens array has a difference of 0.3 degrees.
  • the optical features shown that is, when tilting or rotating the optical security element, the human eye will be able to observe that the sampled composite image "B" is capable of forming a dynamic color feature, ie the image background exhibits a silvery white color of the metal Al,
  • the stroke portion of "B” has two colors, especially in the process of moving the sampled synthesized text from the sub-region where the red color function layer 222 is located to the sub-region where the green color function layer 223 is located, the color of the text "B". It will change from red to green.
  • the sample synthesis layer 21 can be formed from at least one of a microwell array, a microgrid array, a microlens array, and other microsampling tools capable of imaging the microimage layer 22.
  • the microwell array, the microgrid array, and the microlens array may be a non-periodic array, a random array, a periodic array, and a local periodicity respectively composed of a plurality of microporous units, microgrid units, and microlens units. Arrays or any combination of them.
  • the microlens unit may be a refractive microlens, a diffractive microlens or a combination thereof, wherein the refractive microlens may be a geometrical optics selected from a spherical surface, a parabolic surface, an ellipsoidal microlens, a cylindrical microlens, a polygon or any other geometric shape.
  • the microlens or any combination thereof, the diffractive microlens can be selected from a harmonic diffractive microlens, a planar diffractive microlens, and a Fresnel zone plate. Among them, in addition to the Fresnel zone plate, the specific form of other microlenses may be selected as a continuous curved surface type or a step type lens as a microlens unit.
  • the microwell array, microgrid array, and microlens array may exhibit at least one of a square arrangement, a rectangular arrangement, a hexagonal arrangement, and other quadrilateral or polygonal arrangement.
  • other arrangements such as a circular arrangement and an elliptical arrangement, are also possible.
  • FIG. 1b(a) exemplarily shows that the arrangement of the microlens arrays is arranged in a rectangular shape
  • FIG. 1b(b) exemplarily shows the plating layer 221 and the color functional layer 222 in the optical security element shown in FIG. 1a.
  • the micro image layer 22 composed of the color function layer 223 is a periodic array when the letter "B" is arranged in a rectangle.
  • the micro image layer 22 may be a non-periodic array composed of a plurality of micro image units, a random array, a periodic array, a local periodic array or they are defined according to the sampling synthesis layer 21 and the effect desired to be realized. Any combination of them ensures that the sample synthesis layer 21 can sample and synthesize the micro image layer 22 to form an image.
  • the arrangement period of the microlens array is preferably the same as the arrangement period of the micro image array in the micro image layer 22.
  • the array relative angle of error between the microlens array and the microimage array is preferably in the range of -0.3 degrees to 0.3 degrees.
  • the formed image features can be sinking, floating, dynamic, zooming, rotating, multi-channel conversion, continuous depth of field change graphics, three-dimensional graphics, continuous multi-frame animation, etc.
  • For the combination of one or more effects please refer to “Microlens Array Display Technology Research” (Micro-Nano Electronic Technology, 2003, No. 6, p. 29), and “Microlens Array Display Technology Research” (Tenth The 1st National Conference on Electron Beam and Ion Beam Photonic Beams, October 2001, p. 226).
  • the optical security element of the present invention is capable of providing a more novel and rich optical security feature such as the optical security features shown in Figures 1c and 1d.
  • the periodic or partial periodic sampling synthesis layer 21 and the micro image layer 22 in the optical security element according to the present invention may have an image period of 10 ⁇ m to 200 ⁇ m, preferably 15 ⁇ m to 50 ⁇ m; sampling synthesis layers (eg, microlens arrays)
  • the focal length of the layer 21 may be from 10 ⁇ m to 200 ⁇ m, preferably from 15 ⁇ m to 40 ⁇ m; the processing depth of the sample synthesis layer (for example, the microlens array layer) 21 is preferably less than 15 ⁇ m, more preferably from 0.5 ⁇ m to 10 ⁇ m.
  • the difference between the thickness of the substrate 2 and the focal length of the sampling and synthesizing layer 21 is preferably less than 8 ⁇ m, and more preferably the difference is less than 3 ⁇ m.
  • the sampling and synthesizing layer 21 can be obtained by micro-nano processing such as optical exposure, electron beam exposure, or the like, and can also be realized by a process such as hot-melt reflow, and mass-copying by means of processing such as ultraviolet casting, molding, and nanoimprinting.
  • the plating layer 221 in the optical security element according to the present invention may be a single layer metal plating layer, a multilayer metal plating layer, a single layer dielectric layer, a multilayer dielectric layer, an interference type multilayer film structure, or the like.
  • the color functional layers 222 and 223 may be inks, pigments, dyes, optically variable inks, liquid crystal light-changing layers, co-extruded light-changing films, single-layer metal plating, multi-layer metal plating, single-layer dielectric layers, multilayer dielectric layers, interference At least one of a type of multilayer film structure or the like.
  • the plating layer 221 and the color functional layers 222 and 223 have respective different color characteristics, thereby forming a contrast to achieve the function of the colored micro image layer 22.
  • the interference type multilayer film structure may be any one of the following three types of interference type multi-layer plating layers or any combination thereof: an absorption layer (for example, may be a translucent metal layer), a low refractive index dielectric layer, and a reflective layer.
  • An interference type multilayer film structure (simply described as "absorber layer / low refractive index dielectric layer / reflective layer” structure) is sequentially stacked, wherein the absorption layer is in contact with the second surface 32; by a high refractive index dielectric layer, low refraction
  • An interference type multilayer film structure in which a dielectric layer and a high refractive index dielectric layer are sequentially stacked; and an interference type formed by sequentially stacking an absorption layer (for example, a translucent metal layer), a high refractive index dielectric layer, and a reflective layer
  • the film structure (simply described as "absorbent layer/high refractive index dielectric layer/reflective layer” structure) in which the absorption layer is in contact with the second surface 32.
  • the material may be ZnS, TiN, TiO 2 , TiO, Ti 2 O 3 , Ti 3 O 5 , Ta 2 O 5 , Nb 2 O 5 , CeO 2 , Bi 2 O 3 , Cr 2 O 3 , Fe 2 O 3 , HfO 2 , ZnO, etc.
  • the low refractive index medium having a refractive index of less than 1.7 may be MgF 2 , SiO 2 or the like
  • the material of the reflective layer may be a metal such as Al, Cu, Ni, Cr, Ag, Fe, Sn, Au, Pt or a mixture and alloy thereof;
  • the material of the semi-transparent metal layer (or the absorption layer) may be Al, Cr, Ni, Metals such as Cu, Co, Ti, V, W, Sn, Si, Ge, or mixtures and alloys thereof.
  • the above-described interference type multilayer film structure can form a Fabry-Perot cavity, which has a selective effect on incident white light, so that the emitted light only contains certain wavelength bands to form a specific color; when the incident angle changes, The relative optical path changes, and the interference band also changes, causing the color presented to the observer to change accordingly, thereby forming a light-changing effect.
  • the plating layer 221 and the color functional layers 222 and 223 is at least one of a single metal plating layer, a multilayer metal plating layer, a single layer dielectric layer, a multilayer dielectric layer, and an interference type multilayer film structure
  • It can be formed by physical and/or chemical deposition methods including, for example, but not limited to, thermal evaporation, magnetron sputtering, MOCVD, molecular beam epitaxy, and the like.
  • the second area shown in Figure 1a has two sub-areas.
  • the second region of the micro image layer 22 may include more than two sub-regions, and each sub-region may have different color features, and the color features of the sub-regions may be combined with the color features of the plating layer 221.
  • the micro image layer 22 and the sampled composite image are made to have colored image features.
  • a method of preparing an optical security element according to the present invention is exemplarily described below in conjunction with FIG.
  • the method of forming the plating layer 221 can be referred to the Chinese patent CN104647936A, and only two of the preparation methods are exemplified herein. It should be understood that the method is only a specific description of the embodiments of the optical security element of the present invention and is not intended to limit the scope of the invention in any way.
  • the preparation method shown in Fig. 2 is aimed at preparing the optical security element shown in Fig. 1a.
  • a sampling synthesis layer 21 is prepared on the first surface 31 of the substrate 2 and a sinusoidal-wavelength grating structure 41 is prepared on the second region on the second surface 32 of the substrate 2, the period of the grating structure being The first region on the second surface 32 is a flat region at 245 nm and a depth of 150 nm.
  • an Al layer having a thickness of 60 nm (referenced to the thickness on the first region) is directly deposited on the second surface 32 of the substrate 2, and then a thickness of 50 nm is deposited on the Al layer (the thickness on the first region is Referring to Si, and then immersing the entire structure in NaOH solution (temperature 40 ° C, concentration 5%) for 18 seconds, the Si layer and the Al layer formed on the second region disappeared completely one after another, and Al formed on the first region The layer is still present, thereby forming a plating layer 221.
  • the sub-wavelength grating structure 41 employed in the second region has a higher aspect ratio, so that the surface area per unit apparent area is much larger than that of the first region, thereby ensuring homogenous coverage under the same deposition conditions.
  • the thickness of the deposited layer of the second region is thinner, so that when the NaOH solution completely dissolves the Si layer on the second region, the Si layer formed on the first region is still not completely dissolved, under
  • the NaOH solution completely dissolves the Al layer on the second region, the Si layer on the first region still exists and protects the Al layer it covers from the corrosion of the NaOH solution.
  • the sub-wavelength grating 41 described above can be obtained by micro-nano processing such as optical exposure, electron beam exposure, etc., and is mass-produced by processing methods such as ultraviolet casting, molding, and nanoimprinting.
  • Fig. 3 shows another method of preparing the optical security element shown in Fig. 1a.
  • a structure in which the second region is convex with respect to the first region is prepared on the second surface 32 of the substrate 2, and the second region is 1.5 ⁇ m higher than the first region, while sampling is prepared on the first surface 31 of the substrate 2.
  • an Al layer 51 having a thickness of 60 nm (referenced to the thickness on the first region) is directly deposited on the second surface 32, and then a polyester material 52 having a thickness of 1.5 ⁇ m is coated on the Al layer, and then the entire structure is After being immersed in a NaOH solution (temperature 40 ° C, concentration 5%) for 30 seconds, the polyester material layer and the Al layer formed on the second region completely disappeared one after another, and the Al layer formed on the first region still exists, thereby forming Plating layer 221 in Figure 1a.
  • a NaOH solution temperature 40 ° C, concentration 5%
  • the coated polycarbonate layer tends to converge into the downward concave region due to the leveling property of the material during the coating process, so that the first region
  • the polycarbonate layer is thicker relative to the second region, so the Al layer surface of the second region has a relatively thin polycarbonate layer that is more susceptible to corrosion when immersed in a NaOH solution. This precisely forms the desired plating 221 so that the image background of the microimage layer 22 of the optical security element shown in Figure 1a can be formed.
  • the above polyester material 52 as a protective layer can be realized, for example, by means of general printing, coating or deposition, and in fact there can be more material preferred solutions, which can be, for example, opaque, translucent or fully transparent coatings.
  • the protective layer is a polymer, especially a polymer comprising cellulose.
  • the polymer forming the protective layer may include a mixture of nitrocellulose (preferably nitroalcohol) and a resin (such as gum arabic and rosin) added to enhance the subsequent treatment of the protective layer.
  • the main resin is a resin material of polyester, the resin material comprising the following components: (1) about 20% by weight to about 30% by weight of a main resin, the resin being a polyester having a hydroxyl value of more than 120
  • the polyester is a branched hydroxy polyester having a viscosity of 25000 ⁇ 5000 mPa ⁇ s; (2) about 10 wt% to about 25 wt% of nitrocellulose, and the nitrocellulose is nitrogen content ⁇ 12.4% Low nitrogen nitrocellulose; (3) from about 5 wt% to about 25 wt% of a crosslinker, the crosslinker being an isocyanate oligomer; and (4) from about 20 wt% to about 60 wt% of a solvent.
  • FIG. 4 is a method of fabricating the sampling synthesis layer 21 and the plating layer 221 shown in FIG. Continuation.
  • FIG. 4 is a method of fabricating the sampling synthesis layer 21 and the plating layer 221 shown in FIG. Continuation.
  • the last step in Figure 3 is shown in Figure 4.
  • a multicolor set printer sleeve is used on the plating layer 221 formed on the second surface 32 of the substrate 2.
  • the red and green nano inks were printed to a thickness of 2 ⁇ m to form two regions 61, 62, respectively.
  • the two regions shown in Figure 4 are directly connected.
  • the two regions can be adjusted to be crossed or separated according to the process level or design requirements.
  • the red and green nano inks as the color function layers 222 and 223 cover not only the first region in the micro image layer 22 but also the second region in the micro image layer 22.
  • the entire structure is immersed in a solvent, and the choice of the solvent depends on the selection of a protective layer mainly composed of a polycarbonate.
  • the auxiliary agent of the protective layer is selected as a fat-soluble or alcohol-soluble material, the solvent is selected accordingly.
  • Lipids such as ethyl acetate
  • alcohols such as isopropanol).
  • an alcohol-soluble material is used as an auxiliary agent of the protective layer, and the solvent is selected as isopropyl alcohol.
  • the solvent is selected as isopropyl alcohol.
  • the portion of the plating layer 221 (Al layer) is eroded to the protective layer by the immersed isopropanol, so that the protective layer is dissolved and the nano ink insoluble in isopropyl alcohol is peeled off together.
  • the color functional layers 222 and 223 cover only the two sub-regions of the second region, while the first region has only the plating layer 221, thus completing the preparation of the optical security element shown in FIG. 1a.
  • the plating layer 221 is made of a transparent or translucent material such as ZnS, Al 2 O 3 , MgF 2 , SiO 2 , cryolite, etc.
  • the color functional layer in the first region is not removed, it will be made in the final optical security element.
  • the human eye observes the color of the first region jointly provided by the plating layer 221 and the color functional layer covered by the surface thereof through the sampling synthetic layer 21. If the designer does not agree with the color, the step shown in FIG. 4 can be used to cover the first The color functional layer in one area is removed.
  • the color functional layer in the first region may not be removed, because even if the color functional layer in the first region is not removed, the first region and the first region can be made due to the presence of the plating layer 221 There is a difference in color characteristics between the sub-regions of the two regions.
  • the plating layer 221 is made of an opaque coating such as Al or Cu, it will block the color functional layer coated on the first region, so that the color functional layer in the first region does not affect the sampling and synthesis layer.
  • the optical security element according to the present invention adopts the previously described structure, it will have a variety of rich and interesting beneficial optical security features, so that the optical security element of the present invention has stronger anti-counterfeiting capability and is more easily recognized by the public.
  • the beneficial optical anti-counterfeiting effect that can be achieved by the optical security element according to the present invention will be described below with reference to Figures 5a - 5d.
  • Figures 5a - 5d show an embodiment of an optical security element according to the invention having a total of 5 regions from 71 to 75, and Figure 5a shows a top view of the optical security element, the parts being schematically marked in the figure
  • the relationship is that each region adopts a spherical microlens array arranged in a rectangular shape as the sampling and synthesizing layer 21, and the diameter of the microlens is 25 ⁇ m.
  • the arrangement period of the microlens array was 27 ⁇ m
  • the height of the microlens was 10.2 ⁇ m
  • the thickness of the substrate 2 was 19 ⁇ m.
  • the micro image layer content of the area 71 is the text "A", the arrangement period is 27 ⁇ m, and the relative error angle of the array between the microlens array and the microlens array is +0.4 degrees;
  • the micro image layer content of the area 72 is the character "B", the arrangement period is 27 ⁇ m, and the relative error angle between the array and the microlens array is -0.3 degrees;
  • the micro image layer content of the area 73 is the character "B", the arrangement period is 27 ⁇ m, and the relative error angle of the array between the microlens array and the microlens array is +0.3 degrees;
  • the micro image layer of the area 74 is identical to the content and arrangement of the area 73;
  • the micro image layer contents of the area 75 are the characters "C” and "D", which are arranged as shown in the enlarged schematic area 751, and are equally divided into two parts 752 and 753 by the area directly under each microlens. , part 752 is used to place the array containing the text "D”, and part 753 is used to place the array containing the text "C”.
  • both the characters "D” and “C” arrays are arranged with a period of 27 ⁇ m and a relative angle of error of +0.3 degrees with the microlens array, and the above two arrays are divided by regions 752 and 753. Interspersed in the microimage layer 22 of the region 75.
  • the micro image layer 22 in the regions 71 to 75 uses Al having a thickness of 60 nm as the plating layer 221, and the plating layer 221 is used as the background of the micro image layer content text or image.
  • the plating layer 221 and the color functional layer of each region may be It is any part of the pattern in the micro image layer, and may be the text or the image itself, or it may be an image or a part of its background, such as the "/" stroke portion of the text "A".
  • a red nano ink is used in the region 71 as a color functional layer (not shown) of the sub-region in the second region, that is, a stroke portion of the character "A" in the region 71;
  • a green metallic ink is used in the region 72 as a color functional layer (not shown) of the sub-region in the second region, that is, a stroke portion of the character "B" in the region 72;
  • a light-varying ink for example, a magenta that is purchased from Sicpa, and a green color OVI ink
  • a color functional layer not shown
  • a liquid crystal light-changing material (gold-colored, cholesteric liquid crystal light-changing material observed obliquely) is used as a color functional layer (not shown) of the sub-region in the second region, that is, the text in the region 74 The stroke part of "B";
  • a light-depositing layer composed of Cr/SiO 2 /Al (4 nm/360 nm/50 nm) is used as a color functional layer (not shown) of the sub-region in the second region, that is, the characters "C" and "in the region 75".
  • the color characteristic of the light-depositing layer is green (front) to blue (tilted), and the Cr layer is on the second surface side of the substrate 2.
  • Figures 5b and 5c show the optical characteristics of the optical security element formed in accordance with the above configuration.
  • the regions 71-75 will appear to be orthogonal along the line of sight (or The movement or switching of a color or light-changing pattern in the vertical direction.
  • the characters in each of the regions 71 to 75 will have a moving phenomenon of the color or light-changed sampled composite image shown in FIG. 5b in the direction indicated by the arrow, wherein:
  • the golden background "B" of the white background in the area 74 moves upward, and as the angle of rotation increases, the golden text stroke turns green;
  • the white background green text "C” in the area 75 moves upward, and as the rotation angle increases, the green text stroke turns blue, and the text is switched to the upwardly moving text "D".
  • the micro image layer in each of the regions 71 to 75 in the embodiment shown in FIG. 5 is an array period and an array circumference of the microlens array.
  • the same pattern arrangement in fact, can be selected according to the design needs of the array cycle of the two.
  • the relative error angle of the array may be between -2 degrees and +2 degrees, thereby determining the dynamic amplitude of the sampled composite image.
  • the switching characteristics of the two patterns "C" and “D” of the region 75 in FIG. 5 may also be referred to as “dual channel” features.
  • the area under the microlens unit may be divided into two or more according to design requirements.
  • the selected plurality of patterns may be associated with each other, such as a plurality of frame patterns in an effect of zooming, panning, zooming, etc. of an image, or a set of animations or multi-frame movies.
  • the optical security element according to the present invention may further include a reflective layer 9 on the surface of the sampling synthesis layer 21 such that the viewing direction of the human eye is at the base.
  • the second surface 32 side of the material 2, that is, the sample synthesis layer 21 samples and synthesizes the micro image layer 22, and the imaged content of the sample synthesis layer 21 is reflected by the reflective layer 9 into the human eye.
  • the structure and manufacturing method of the optical security element of the sampling and synthesizing layer 21 with the reflective layer 9 please refer to the Chinese patent CN104118236, the entire contents of which are incorporated herein by reference.
  • At least one of the color functional layers 222 and 223 and the plating layer 221 is preferably translucent or transparent such that light can pass through the micro image layer 22 and be projected into the human eye.
  • the optical security element according to the invention may further comprise a base material 2 formed on the first surface 31 of the substrate 2, on the second surface 32 of the substrate 2, Diffractive light-varying characteristics, interference light-varying characteristics, micro-nano structure features, printing features, in at least one of the first region, the second region, the sampling and synthesizing layer 21, and the surface of the micro-image layer 22, Partial metallization features and one or more of the magnetic, optical, electrical, and radioactive features used for machine reading.
  • a fluorescent material (not shown) may be added to the optical security element of the present invention to have a fluorescent characteristic.
  • the fluorescent material can form a fluorescent pattern by, for example, printing. For example, replacing a liquid crystal light-changing material as a color functional layer with a fluorescent material will realize that the fluorescent pattern can satisfy the conditions of sampling synthesis, thereby forming a sample-synthesized fluorescent pattern.
  • the substrate 2 may be at least partially transparent or a colored dielectric layer.
  • the substrate 2 may be a single transparent dielectric film, such as a PET film, a PVC film, etc., or a transparent dielectric film having a functional coating (such as an embossing layer) on the surface. It can also be a composite multilayer film.
  • the optical security element according to the invention is particularly suitable for making a windowed security thread.
  • the thickness of the security thread is not more than 50 ⁇ m.
  • the security paper with the window security thread is used for anti-counterfeiting of various high-security products such as banknotes, passports, and securities.
  • optical security element according to the present invention can also be used as a label, logo, wide strip, transparent window, film, etc., and can be adhered to various articles by various bonding mechanisms. For example, transfer to high security products such as banknotes and credit cards and high value-added products.
  • Another aspect of the present invention provides a product with the optical security element, including but not limited to various types of high security products and high value-added products such as banknotes, credit cards, passports, and securities, and various types of wrapping paper. , packing boxes, etc.

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Abstract

公开了一种光学防伪元件以及使用光学防伪元件的光学防伪产品，光学防伪元件包括：基材（2），基材（2）包括相互对立的第一表面（31）和第二表面（32）；位于基材（2）的第一表面（31）上的采样合成层（21）；以及位于基材（2）的第二表面（32）上的微图像层（22），微图像层（22）包括第一区域和第二区域，第一区域中至少部分覆盖有镀层（221），第二区域包含至少两个子区域，每个子区域中至少部分覆盖有颜色功能层（222，223），各个子区域中的颜色功能层（222，223）以及第一区域中的镀层（221）具有各自不同的颜色特征，而且微图像层（22）能够被采样合成层（21）所采样并合成从而形成图像。其具有易识别且难伪造的特点。

Description

一种光学防伪元件及使用该光学防伪元件的光学防伪产品 技术领域
本发明涉及光学防伪领域，尤其涉及一种光学防伪元件及使用该光学防伪元件的光学防伪产品。
背景技术
为了防止利用扫描和复印等手段产生的伪造，钞票、证卡和产品包装等各类高安全或高附加值印刷品中广泛采用了光学防伪技术，并且取得了非常好的效果。
CN101563640、CN101443692、CN101120139、CN101346244、US5712731、US0034082、US4765656、US4892336、CN1271106、CN1552589等专利文献中公开了同一类在基材的两个表面上分别带有微透镜阵列和微图文阵列的防伪元件，其中，微图文阵列位于微透镜阵列的焦平面附近，通过微透镜阵列对微图文阵列的莫尔放大作用来再现具有一定景深或呈现动态效果的图案。
为保证莫尔放大的图案在不同的环境光源条件下都易于识别，微图文阵列和其背景需要有足够的颜色或亮度的对比度，即需对微图文阵列进行着色。由于所需的微图文结构非常精细(约几个微米)，而一般印刷技术的极限印刷笔画在20微米以上，因此一般印刷技术无法满足该精细度的要求。
目前文献中有两类着色的方法。一类方法如CN1906547A等专利文献中所公开：在微图文区域形成一定深度的凹陷，利用刮涂工艺将着色材料填充至凹陷中，而微图文区域之外的多余材料被基本刮除。为实现较好的着色，这种方法对微图文的线条宽度和凹陷深度，以及二者匹配关系有较大的限制。
另一类办法是利用微纳结构，如专利文献US20030179364公开了利用大深宽比的光学吸收结构实现黑色的微图文着色，专利文献US20100307705A1公开了利用纳米颗粒填充或台阶型的金属纳米结构实现微图文的着色。
以上两种着色方法在不同方面存在缺陷：US20030179364公开的结构不能实现彩色化的着色；US20100307705A1利用的台阶型结构和镀层对所述结构的平面覆盖方式难以在生产中实现。
发明内容
本发明的目的在于提供一种光学防伪元件以及使用该光学防伪元件的光学防伪产品，其具有易识别且难伪造的特点。
本发明提供一种光学防伪元件，该光学防伪元件包括：基材，该基材包括相互对立的第一表面和第二表面；位于所述基材的第一表面上的采样合成层；以及位于所述基材的第二表面上的微图像层，该微图像层包括第一区域和第二区域，所述第一区域中至少部分覆盖有镀层，所述第二区域包含至少两个子区域，每个子区域中至少部分覆盖有颜色功能层，各个子区域中的颜色功能层以及第一区域中的镀层具有各自不同的颜色特征，而且所述微图像层能够被所述采样合成层所采样并合成从而形成图像。
本发明还提供一种采用上述光学防伪元件的光学防伪产品。
根据本发明的光学防伪元件和光学防伪产品具有如下优势：
(1)由于微图像层是由具有不同颜色特征的镀层以及多个颜色功能层共同形成的，所以该微图像层将具有多个颜色的信息，从而使得采样合成后的图像具有多色特征，并解决了此类产品颜色单一的问题；
(2)由于镀层和多个颜色功能层的颜色特征可以任意定义，从而决定了采样合成后的图像具有颜色间的强烈对比度；
(3)由于采样合成的图像的多色特征可以与采样合成的图像相呼应，因此形成了新颖的光学防伪特征，其易于识别，且能够产生更强的公众吸引力和更高的抗伪造能力；
(4)根据本发明的光学防伪元件可以利用本领域通用设备进行批量生产，工艺可行性强。
附图说明
图1a是根据本发明一个实施方式的光学防伪元件的剖面图；
图1b是根据本发明一个实施方式的光学防伪元件的采样合成层和微图像层的排列方式的示意图；
图1c和图1d是根据本发明一个实施方式的光学防伪元件的光学特征示意图；
图2是根据本发明一个实施方式的光学防伪元件的微图像层中的镀层的一种制作步骤的示意图；
图3是根据本发明一个实施方式的光学防伪元件的微图像层中的镀层的另一制作步骤的示意图；
图4是在图3所示制作步骤的基础上进一步制作第二区域中的颜色功能层的步骤 的示意图；
图5a～5d是根据本发明的光学防伪元件能够带来的部分有益效果的实施例的示意图；以及
图6是根据本发明一种实施方式的在采样合成层上形成反射层的光学防伪元件的剖面示意图。
具体实施方式
下面将结合附图来详细说明根据本发明的光学防伪元件及使用该光学防伪元件的光学防伪产品。应当理解，所述附图和详细描述只是对本发明优选实施方式的描述，并非以任何方式来限制本发明的保护范围。并且，本领域技术人员应当理解，所有附图中的灰度以及尺寸比例仅为示意性的，不代表实际的颜色和尺寸比例。
如图1a所示，根据本发明一种实施方式的光学防伪元件包括基材2、采样合成层21和微图像层22。基材2包括相互对立的第一表面31和第二表面32。采样合成层21位于基材2的第一表面31上。微图像层22位于基材2的第二表面32上，该微图像层22包括第一区域和第二区域，所述第一区域中至少部分覆盖有镀层221，所述第二区域包含至少两个子区域，每个子区域中至少部分覆盖有颜色功能层(例如在图1a中示出了两个子区域，这两个子区域中分别覆盖有颜色功能层222和颜色功能层223)，各个子区域中的颜色功能层(222，223)以及第一区域中的镀层221具有各自不同的颜色特征，而且所述微图像层22能够被所述采样合成层21所采样并合成从而形成图像。也即，第一区域中的镀层221、第二区域中的颜色功能层222、223共同形成了微图像层22。
以图1a所示的第二区域具有两个子区域为例，根据本发明的光学防伪元件的一个具体实施例可以为：采样合成层22采用了21μm直径的球面微透镜阵列，该微透镜阵列的排列呈矩形排列(如图1b(a)所示)、排列周期为23微米，微透镜高度为7μm，基材2的厚度为20μm。镀层221为40nm厚的金属Al层，颜色功能层222、223分别为红色和绿色的纳米油墨。镀层221、颜色功能层222、223所组成的微图像层22的俯视图如图1b(b)所示，其中，Al镀层221形成了微图像层22的背景(即第一区域)，红色的颜色功能层222和绿色的颜色功能层223区域化地形成微图像层22的笔画(第二区域)，并且所组成的“B”微图像阵列的排列周期与采样合成层22中的微透镜阵列的排列周期一致，但微图像阵列和微透镜阵列的阵列取向具有0.3度的差异。基于以上配置，将形成如图1c(倾斜光学防伪元件的情况)和图1d(旋转光学防伪元件的情况) 所示的光学特征，也即，当倾斜或者旋转该光学防伪元件时，人眼将可以观察到采样合成的图像“B”能够形成彩色的动态特征，即图像背景呈现金属Al的银白色，而“B”的笔画部分则有两种颜色，特别是当采样合成的文字从红色颜色功能层222所在的子区域移动到绿色颜色功能层223所在的子区域的过程中，文字“B”的颜色将从红色变成绿色。
以上是结合图1b和图1c所示的实施例对采样合成层21、微图像层22、镀层221、颜色功能层222、223以及所获得的防伪特征进行了示例性的描述，事实上，根据本发明的光学防伪元件的各部分拥有更多的优选和组合方案。以下将进行详细描述。
在根据本发明的一个优选实施方式中，采样合成层21可以由微孔阵列、微栅格阵列、微透镜阵列和能够对微图像层22进行成像的其他微采样工具中的至少一者形成。其中，微孔阵列、微栅格阵列和微透镜阵列可以是分别由多个微孔单元、微栅格单元和微透镜单元构成的非周期性阵列、随机性阵列、周期性阵列、局部周期性阵列或它们的任意组合。微透镜单元可以为折射型微透镜、衍射型微透镜或它们的组合，其中折射型微透镜可以选取球面、抛物面、椭球面微透镜、柱面微透镜、多边形或其它任意几何形状的基于几何光学的微透镜或它们的任意组合，衍射型微透镜可以选取谐衍射微透镜、平面衍射微透镜、菲涅尔波带片。其中，除菲涅尔波带片外，其它微透镜的具体形式可以选择为连续曲面型或阶梯型透镜作为微透镜单元。
优选地，所述微孔阵列、微栅格阵列和微透镜阵列可以呈现正方形排列、矩形排列、六边形排列、以及其它四边形或多边形排列方式中的至少一种排列方式。另外，其他排列方式，例如圆形排列方式、椭圆形排列方式也是可行的。例如，图1b(a)示例性地示出了微透镜阵列的排列呈矩形排列，图1b(b)示例性地示出了图1a所示的光学防伪元件中由镀层221、颜色功能层222和颜色功能层223所构成的微图像层22为矩形排列的字母“B”时的周期性阵列。
优选地，微图像层22可以是依据采样合成层21及所需实现的效果而定义的由多个微图像单元构成的非周期性阵列、随机性阵列、周期性阵列、局部周期性阵列或它们的任意组合，从而保证采样合成层21能够对微图像层22进行采样合成从而形成图像。例如，以采样合成层21是微透镜阵列层为例，则微透镜阵列的排列周期优选与微图像层22中的微图像阵列的排列周期相同。另外，所述微透镜阵列与所述微图像阵列之间的阵列相对错角优选位于-0.3度至0.3度的范围内。所形成的图像特征可以为下沉、上浮、动感、缩放、旋转、多通道转换、连续景深变化图形、三维图形、连续多帧动画等 之一或多个效果的组合特征，具体可参考《微透镜阵列显示技术研究》(微纳电子技术2003年第6期，第29页)，及《微透镜列阵显示技术研究》(第十一届全国电子束·离子束光子束学术年会，2001年10月刊，第226页)等文献。事实上，本发明所述的光学防伪元件能够提供诸如图1c和1d所示光学防伪特征等更为新颖而丰富的光学防伪特征。
优选地，根据本发明的光学防伪元件中的周期性或局部周期性采样合成层21和微图像层22的图像周期可以为10μm至200μm，优选为15μm至50μm；采样合成层(例如微透镜阵列层)21的焦距可以为10μm至200μm，优选为15μm至40μm；采样合成层(例如微透镜阵列层)21的加工深度优选小于15μm，更优选为0.5μm至10μm。另外，基材2的厚度与采样合成层21的焦距之差优选为小于8μm，更优选地所述差值为小于3μm。
优选地，采样合成层21可以通过光学曝光、电子束曝光等微纳加工方式获得，还可以结合热熔回流等工艺来实现，通过紫外浇铸、模压、纳米压印等加工方式进行批量复制。
优选地，根据本发明的光学防伪元件中的镀层221可以为单层金属镀层、多层金属镀层、单层介质层、多层介质层、干涉型多层膜结构等。颜色功能层222和223可以为油墨、颜料、染料、光变油墨、液晶光变层、共挤光变膜、单层金属镀层、多层金属镀层、单层介质层、多层介质层、干涉型多层膜结构等中的至少一者。镀层221与颜色功能层222以及223具有各自不同的颜色特征，从而形成反差以实现彩色的微图像层22的功能。其中，干涉型多层膜结构可以为以下三类干涉型多层镀层中的任意一种或其任意组合：由吸收层(例如，可以为半透明金属层)、低折射率介质层和反射层依次堆叠形成的干涉型多层膜结构(简单描述为“吸收层/低折射率介质层/反射层”结构)，其中吸收层与第二表面32相接触；由高折射率介质层、低折射率介质层和高折射率介质层依次堆叠形成的干涉型多层膜结构；以及由吸收层(例如，可以为半透明金属层)、高折射率介质层和反射层依次堆叠形成的干涉型多层膜结构(简单描述为“吸收层/高折射率介质层/反射层”结构)，其中，吸收层与第二表面32相接触。在根据本发明的实施方式中，对于折射率大于等于1.7的高折射率介质层，其材料可以是ZnS、TiN、TiO2、TiO、Ti2O3、Ti3O5、Ta2O5、Nb2O5、CeO2、Bi2O3、Cr2O3、Fe2O3、HfO2、ZnO等，折射率小于1.7的低折射率介质可以是MgF2、SiO2等；金属镀层或反射层的材料可以是Al、Cu、Ni、Cr、Ag、Fe、Sn、Au、Pt等金属或其混合物和合金；半透明金属层(或吸收层) 的材料可以是Al、Cr、Ni、Cu、Co、Ti、V、W、Sn、Si、Ge等金属或其混合物和合金。另外，在本发明的实施方式中，高折射率可以指1.7-3范围内的折射率，低折射率可以指小于1.7的折射率。
上述的干涉型多层膜结构能够形成法布里-泊罗谐振腔，其对入射的白光具有选择作用，使得出射光线只包含某些波段，从而形成特定的颜色；当入射角度变化时，与之相对的光程发生变化，干涉波段也发生变化，从而导致呈现给观测者的颜色也随之变化，从而形成光变效果。
当镀层221、颜色功能层222、223中的至少一者为单层金属镀层、多层金属镀层、单层介质层、多层介质层、干涉型多层膜结构中的至少一者时，其可以通过物理和/或化学沉积的方法形成，例如包括但不限于热蒸发、磁控溅射、MOCVD、分子束外延等手段。
应当说明的是，虽然图1a中所示的第二区域具有两个子区域。但是，实际上，微图像层22的第二区域中可以包含2个以上的子区域，而且各个子区域可以拥有不同的颜色特征，将这些子区域的颜色特征与镀层221的颜色特征相结合，使得微图像层22及采样合成图像具有彩色的图像特征。
下面结合图2示例性地描述制备根据本发明的光学防伪元件的方法。形成镀层221的方法可以参照中国专利CN104647936A，这里仅示例性地给出其中两种制备方法。应当理解，所述方法仅仅是对本发明所述光学防伪元件的实施方式的特定描述，并非以任何方式来限制本发明的范围。
图2所示的制备方法是以制备图1a所示的光学防伪元件为目标的。首先，在基材2的第一表面31上制备采样合成层21并在基材2的第二表面32上的第二区域上制备正弦型一维亚波长光栅结构41，该光栅结构的周期为245nm、深度为150nm，第二表面32上的第一区域为平坦区域。然后，在基材2的第二表面32上直接沉积厚度为60nm(以第一区域上的厚度为参考)的Al层，然后在Al层上沉积厚度为50nm(以第一区域上的厚度为参考)的Si，然后将整个结构置于NaOH溶液中(温度40℃，浓度5％)浸泡18秒，则第二区域上形成的Si层和Al层相继完全消失，第一区域上形成的Al层仍然存在，从而形成了镀层221。在该方案中，第二区域采用的亚波长光栅结构41具有较高的结构深宽比，因此其单位表观面积上的表面积远大于第一区域，从而保证了在相同沉积条件下同形覆盖地沉积Al层或Si层时第二区域的沉积层厚度更薄，从而当NaOH溶液将第二区域上的Si层完全溶解时，形成在第一区域上的Si层仍未完全溶解，在下 一阶段，当NaOH溶液将第二区域上的Al层完全溶解时，第一区域上的Si层仍然存在并对其所覆盖的Al层起到保护其免受NaOH溶液腐蚀的作用。这样就精确地形成了所需的镀层221，从而能够形成图1a所示光学防伪元件的微图像层22的图像背景。
优选地，上述的亚波长光栅41可以通过光学曝光、电子束曝光等微纳加工方式获得，通过紫外浇铸、模压、纳米压印等加工方式进行批量复制。
图3示出了另外一种制备图1a所示的光学防伪元件的方法。首先，在基材2的第二表面32上制备第二区域相对第一区域上凸的结构，第二区域较第一区域高出1.5μm，同时在基材2的第一表面31上制备采样合成层21。然后，在第二表面32上直接沉积厚度为60nm(以第一区域上的厚度为参考)的Al层51，然后在Al层上涂覆厚度为1.5μm的聚酯材料52，然后将整个结构置于NaOH溶液中(温度40℃，浓度5％)浸泡30秒，则第二区域上形成的聚酯材料层和Al层相继完全消失，第一区域上形成的Al层仍然存在，从而形成了图1a中的镀层221。在该方案中，由于第一区域相对第二区域下凹1.5μm，因此涂覆的聚碳酸酯层由于涂覆过程中材料的流平性而倾向于向下凹区域汇聚，使得第一区域的聚碳酸酯层相对第二区域更厚，因此第二区域的Al层表面具有相对薄的聚碳酸酯层，从而在浸入NaOH溶液时更容易被腐蚀。这样就精确地形成了所需的镀层221，从而能够形成图1a所示光学防伪元件的微图像层22的图像背景。
以上聚酯材料52作为保护层可以例如采用通用的印刷、涂布或者沉积等手段实现，并且实际上可以有更多的材料优选方案，其可例如为不透明、半透明或全透明的涂层。优选地，保护层为聚合物，尤其是包含纤维素的聚合物。例如，形成保护层的聚合物可以包括硝基纤维素(优选为硝基醇)与所加入的用以提高保护层的耐后续处理性的树脂(如阿拉伯树胶和松香)等的混合物。在一种优选方案中，主树脂为聚酯的树脂材料，所述树脂材料包含以下组分：(1)约20wt％-约30wt％的主树脂，所述树脂为羟值大于120的聚酯，所述聚酯为支链化羟基聚酯，黏度为25000±5000mPa.s；(2)约10wt％-约25wt％的硝基纤维素，所述硝基纤维素为含氮量<12.4％的低氮硝化纤维；(3)约5wt％-约25wt％的交联剂，所述交联剂为异氰酸酯低聚体；以及(4)约20wt％-约60wt％的溶剂。
以下结合图4示例性地描述制备图1a所示光学防伪元件中的颜色功能层222和颜色功能层223的方法，该制作步骤是图3所示的制作完采样合成层21和镀层221的方法的延续。为了便于理解，图4中示出了图3中的最后一个步骤。在制作完采样合成层21和镀层221之后，在基材2的第二表面32上形成的镀层221上采用多色组印刷机套 印红色和绿色纳米油墨，厚度均为2μm，从而分别形成两个区域61、62。图4所示两区域直接相接，当然也可以根据工艺水平或者设计需要来调整两个区域以使其交叉或者分离。此时，红色和绿色的纳米油墨作为颜色功能层222和223不仅覆盖微图像层22中的第一区域，而且还覆盖微图像层22中的第二区域。然后，将整个结构浸入溶剂中，该溶剂的选择依赖于以聚碳酸酯为主树脂的保护层的选择，当该保护层的助剂选择为脂溶性或者醇溶性材料时，相应地溶剂选择为脂类(例如乙酸乙酯)或者醇类(例如异丙醇)。在本实施例中采用醇溶性材料作为所述保护层的助剂，溶剂选择为异丙醇，在浸泡的过程中，所述红色纳米油墨及绿色纳米油墨覆盖的第一区域的部分，即覆盖在镀层221(Al层)的部分由于被浸入的异丙醇侵蚀至保护层，从而使保护层溶解后连带不溶于异丙醇的纳米油墨共同剥离。最终，颜色功能层222及223均仅覆盖第二区域的两个子区域，而在第一区域仅有镀层221，至此即完成图1a所示光学防伪元件的制备。
需要说明的是，虽然在图4所示的制备过程中将第一区域中的颜色功能层去除，但是，实际上，根据设计的需要也可以不必去除第一区域中的颜色功能层。
例如当镀层221采用ZnS、Al2O3、MgF2、SiO2、冰晶石等透明或半透明材料时，如果不去除第一区域中的颜色功能层，那么在最终的光学防伪元件中将使人眼透过采样合成层21观察到第一区域由镀层221和其表面覆盖的颜色功能层共同提供的颜色，如果设计者不认同该颜色，那么可以利用图4所示的步骤将覆盖在第一区域中的颜色功能层去除。如果设计者认同该颜色，那么也可以不去除第一区域中的颜色功能层，因为即便不去除所述第一区域中的颜色功能层，由于镀层221的存在，还是能够使得第一区域和第二区域的各子区域之间具有颜色特征上的区别。
再例如，若镀层221采用Al、Cu等不透明的镀层，那么其将对第一区域上涂覆的颜色功能层起到遮挡的作用，使得第一区域中的颜色功能层并不影响采样合成层21的采样合成过程，此时也可以选择不去除第一区域中的颜色功能层。
由于根据本发明的光学防伪元件采用了前面描述的结构，因此其将具备多种丰富而有趣的有益光学防伪特征，使得本发明的光学防伪元件拥有更强的抗伪造能力，更加易于大众识别。以下将结合图5a～5d来描述根据本发明的光学防伪元件能够实现的有益光学防伪效果。
图5a～5d给出了根据本发明的光学防伪元件的一个实施例，其拥有71～75总共5个区域，图5a给出了该光学防伪元件的俯视图，图中示意性地标出了各部分的关系，各区域均采用矩形排列的球面微透镜阵列作为采样合成层21，微透镜的直径为25μm， 微透镜阵列的排列周期为27μm，微透镜的高度为10.2μm，基材2的厚度为19μm。而且：
区域71的微图像层内容为文字“A”，其排列周期为27μm，且其与微透镜阵列之间的阵列相对错角为+0.4度；
区域72的微图像层内容为文字“B”，其排列周期为27μm，且其与微透镜阵列之间的阵列相对错角为-0.3度；
区域73的微图像层内容为文字“B”，其排列周期为27μm，且其与微透镜阵列之间的阵列相对错角为+0.3度；
区域74的微图像层与区域73的内容及排列方式一致；
区域75的微图像层内容为文字“C”和“D”，其排列如放大示意区751所示，相应的在每个微透镜的正下方被面积平均化地分为752和753两个部分，其中752部分用于放置含有文字“D”的阵列，753部分用于放置含有文字“C”的阵列。在本实施例中，文字“D”和“C”阵列均采用周期为27μm并且与微透镜阵列间的相对错角为+0.3度的排列，以上两个阵列被区域752和753以分割及相互穿插的方式结合在区域75的微图像层22中。
同时，区域71～75中的微图像层22采用厚度为60nm的Al作为镀层221，并将镀层221作为微图像层内容文字或图像的背景，事实上，镀层221以及各区域的颜色功能层可以是微图像层中图案的任意部分，也可以是文字或图像本身，也可以是图像或者其背景的一部分，例如文字“A”的“/”笔画部分。
区域71中采用红色纳米油墨作为第二区域中该子区域的颜色功能层(未示出)，即区域71中文字“A”的笔画部分；
区域72中采用绿色金属油墨作为第二区域中该子区域的颜色功能层(未示出)，即区域72中文字“B”的笔画部分；
区域73中采用光变油墨(例如采购自Sicpa公司的正面观察为洋红色，倾斜观察为绿色的OVI油墨)作为第二区域中该子区域的颜色功能层(未示出)，即区域73中文字“B”的笔画部分；
区域74中采用液晶光变材料(正面观察为金色，倾斜观察为绿色的胆甾型液晶光变材料)作为第二区域中该子区域的颜色功能层(未示出)，即区域74中文字“B”的笔画部分；
区域75中采用Cr/SiO2/Al(4nm/360nm/50nm)组成的光变镀层作为第二区域中该 子区域的颜色功能层(未示出)，即区域75中文字“C”及“D”的笔画部分，所述光变镀层的颜色特征为绿色(正面)变蓝色(倾斜)，且Cr层在基材2的第二表面一侧。
图5b及5c给出了按照以上配置形成的光学防伪元件的光学特征，当旋转、平移或倾斜光学防伪元件的过程中，区域71～75中将呈现沿着视线的变化方向相正交(或垂直)方向的彩色或光变图案的移动或切换现象。具体来说，例如沿着转轴81旋转样品过程中，71～75各区域中文字将发生图5b所示的彩色或光变的采样合成图像沿着箭头所指方向的移动现象，其中：
区域71中白色背景红色笔画的文字“A”向上移动；
区域72中白色背景绿色笔画的文字“B”向下移动；
区域73中白色背景洋红色笔画的文字“B”向上移动，随着旋转角度的增大，洋红色的文字笔画变为绿色；
因此，当区域72中绿色文字“B”移动到区域72与73的交界处时，区域73中的洋红色文字“B”也向该交界处移动，产生类似两个文字“B”的“湮灭”特征，并且“湮灭”过程中区域73中的洋红色文字将改变为与区域72中文字相同的绿色。
区域74中白色背景金色文字“B”向上移动，随着旋转角度的增大，金色的文字笔画变为绿色；
因此，当区域73中的文字在区域72和73交界处发生“湮灭”特征的同时，区域74中金色文字“B”向区域73和74的交界处移动，该移动过程与区域73中的文字“B”同步。当区域74中文字“B”到达区域73和74的交界处后，区域73中的文字“B”将出现在该交界处，从而“补全”区域74中文字“B”实际缺失的部分，从而使人眼感受到区域74中的文字“B”越过73与74的交界，并且其颜色改变为洋红色。同时，在旋转角度持续增大的过程中，区域74和区域73中的文字“B”都将变为绿色，使得上述人眼感受到的动态文字的颜色(金色和洋红色)及颜色变化(金色变化为洋红色)过程都突然发生改变(均改变为绿色)。
区域75中白色背景绿色文字“C”向上移动，随着旋转角度的增大，绿色的文字笔画变为蓝色，同时文字将切换为向上移动的文字“D”。
以上实施例中不仅给出了几个具体的有益的光学防伪特征的实现方法。同时也证明了采用镀层221及不同颜色功能层222、223的区域间光学结构的强烈耦合以及进一步带来的光学特征的强烈耦合。
图5所示实施例中71～75各区域中的微图像层是阵列周期与微透镜阵列的阵列周 期相同的图案排列，事实上可以根据设计需要选择二者的阵列周期不同。优选地，所述阵列相对错角可以在-2度至+2度间，从而决定所述采样合成图像的动感幅度。
图5中区域75的“C”和“D”两个图案的切换特征也可以称之为“双通道”特征，事实上，可以根据设计需要将微透镜单元下方的面积分为两个或更多个部分，用于填充不同的微图像信息，从而实现多个图案的切换即“多通道特征”。所选择的多个图案之间可以有关联，例如呈现某个图像的放大、平移、缩放等效果中的若干帧图案，也可以是一组动画或多帧电影。
在根据本发明的又一优选实施方式中，如图6所示，根据本发明的光学防伪元件还可以包括位于采样合成层21的表面上的反射层9，从而使得人眼的观察方向在基材2的第二表面32一侧，也即，采样合成层21对微图像层22进行采样合成之后由反射层9将采样合成层21的成像内容反射到人眼中。关于带有反射层9的采样合成层21的光学防伪元件的结构、制作方法请参照中国专利CN104118236，其内容全部被引用到本专利中。
另外，当采用图6所示配置时，颜色功能层222及223和镀层221中的至少一者优选为半透明或透明，以使得光线能够透过微图像层22并投射到人眼中。
在根据本发明的又一优选实施方式中，根据本发明的光学防伪元件还可以包括形成于基材2中、基材2的第一表面31上、基材2的第二表面32上、所述第一区域中、所述第二区域中、采样合成层21中、微图像层22的表面上的至少一者中的衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征以及用于机读的磁、光、电、放射性特征中的一种或多种特征。例如，可以在本发明的光学防伪元件中添加荧光材料(未示出)，从而使其带有荧光特征。该荧光材料可以通过例如印刷方式形成荧光图案。例如，将作为颜色功能层的液晶光变材料替换为荧光材料，将实现荧光图案能够满足采样合成的条件，从而形成采样合成荧光图案。
此外，基材2可以是至少局部透明的，也可以是有色的介质层。在一种优选方案中，所述基材2可以是一层单一的透明介质薄膜，例如PET膜、PVC膜等，当然也可以是表面带有功能涂层(比如压印层)的透明介质薄膜，还可以是经过复合而成的多层膜。
根据本发明的光学防伪元件特别适合制作成开窗安全线。所述安全线的厚度不大于50μm。带有所述开窗安全线的防伪纸用于钞票、护照、有价证券等各类高安全产品的防伪。
根据本发明的光学防伪元件也可用作标签、标识、宽条、透明窗口、覆膜等，可以通过各种粘结机理粘附在各种物品上。例如转移到钞票、信用卡等高安全产品和高附加值产品上。
本发明另一方面提供了带有所述光学防伪元件的产品，所述产品包括但不限于钞票、信用卡、护照、有价证券等各类高安全产品及高附加值产品，以及各类包装纸、包装盒等。
以上仅示例性地描述了本发明的某些优选实施方案。但是，本发明并不限于上述实施方式中的具体细节，在本发明的技术构思范围内，可以对本发明的技术方案进行多种简单变型，这些简单变型均属于本发明的保护范围。
另外需要说明的是，在上述具体实施方式中所描述的各个具体技术特征，在不矛盾的情况下，可以通过任何合适的方式进行组合。为了避免不必要的重复，本发明对各种可能的组合方式不再另行说明。
此外，本发明的各种不同的实施方式之间也可以进行任意组合，只要其不违背本发明的思想，其同样应当视为本发明所公开的内容。

Claims (20)

  1. 一种光学防伪元件，该光学防伪元件包括：
    基材，该基材包括相互对立的第一表面和第二表面；
    位于所述基材的第一表面上的采样合成层；以及
    位于所述基材的第二表面上的微图像层，该微图像层包括第一区域和第二区域，所述第一区域中至少部分覆盖有镀层，所述第二区域包含至少两个子区域，每个子区域中至少部分覆盖有颜色功能层，各个子区域中的颜色功能层以及第一区域中的镀层具有各自不同的颜色特征，而且所述微图像层能够被所述采样合成层所采样并合成从而形成图像。
  2. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层由微孔阵列、微栅格阵列和微透镜阵列中的至少一者形成。
  3. 根据权利要求2所述的光学防伪元件，其中，所述微孔阵列、微栅格阵列和微透镜阵列为分别由多个微孔单元、微栅格单元和微透镜单元构成的周期性阵列、非周期性阵列、随机性阵列、局部周期性阵列中的任意一者或其组合。
  4. 根据权利要求3所述的光学防伪元件，其中，所述微孔阵列、微栅格阵列和微透镜阵列呈现正方形排列、矩形排列、六边形排列、圆形排列、椭圆形排列以及其它四边形或多边形排列方式中的至少一种排列方式。
  5. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层和所述微图像层的图像周期为10μm至200μm。
  6. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层和所述微图像层的图像周期为15μm至50μm。
  7. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层的焦距为10μm至200μm。
  8. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层的焦距为15μm至40μm。
  9. 根据权利要求1所述的光学防伪元件，其中，所述采样合成层的加工深度小于15μm。
  10. 根据权利要求9所述的光学防伪元件，其中，所述加工深度为0.5μm至10μm。
  11. 根据权利要求1所述的光学防伪元件，其中，所述基材的厚度与所述采样合成层的焦距之差小于8μm。
  12. 根据权利要求1所述的光学防伪元件，其中，所述基材的厚度与所述采样合成层的焦距之差小于3μm。
  13. 根据权利要求3所述的光学防伪元件，其中，所述微孔阵列、微栅格阵列和微透镜阵列的阵列周期与所述微图像层之间的阵列周期相同或不同，且阵列相对错角位于-2度至2度的范围内。
  14. 根据权利要求1所述的光学防伪元件，其中，所述镀层或者颜色功能层位于所述微图像层中的图案、图案背景或者二者中任意一者的一部分中。
  15. 根据权利要求1至14中任一权利要求所述的光学防伪元件，该光学防伪元件还包括覆盖在所述镀层上的与各个子区域中的颜色功能层的颜色特征相同或不同的颜色功能层。
  16. 根据权利要求1至15中任一权利要求所述的光学防伪元件，其中，所述镀层为单层金属镀层、多层金属镀层、单层介质层、多层介质层、干涉型多层膜结构中的至少一者。
  17. 根据权利要求1至15中任一权利要求所述的光学防伪元件，其中，所述颜色功能层为油墨、颜料、染料和光变油墨、液晶光变层、单层金属镀层、多层金属镀层、 单层介质层、多层介质层、干涉型多层膜结构中的至少一者。
  18. 根据权利要求1至17中任一权利要求所述的光学防伪元件，该光学防伪元件还包括位于所述采样合成层表面上的反射层，而且各个所述子区域中的颜色功能层以及所述第一区域中的镀层中的至少一者为半透明或透明。
  19. 根据权利要求1至18中任一权利要求所述的光学防伪元件，该光学防伪元件还包括形成于所述基材中、所述基材的第一表面上、所述基材的第二表面上、所述第一区域中、所述第二区域中、所述采样合成层中、所述微图像层的表面上的至少一者中的衍射光变特征、干涉光变特征、微纳结构特征、印刷特征、部分金属化特征以及用于机读的磁、光、电、放射性特征中的一种或多种特征。
  20. 一种采用根据权利要求1至19中任一项权利要求所述的光学防伪元件的光学防伪产品。
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