WO2018025673A1 - Nitrogenous-compound-containing polyketone composition, polyketone cured product, optical element, and image display device - Google Patents

Nitrogenous-compound-containing polyketone composition, polyketone cured product, optical element, and image display device Download PDF

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WO2018025673A1
WO2018025673A1 PCT/JP2017/026540 JP2017026540W WO2018025673A1 WO 2018025673 A1 WO2018025673 A1 WO 2018025673A1 JP 2017026540 W JP2017026540 W JP 2017026540W WO 2018025673 A1 WO2018025673 A1 WO 2018025673A1
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group
polyketone
carbon atoms
hydrocarbon group
general formula
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PCT/JP2017/026540
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French (fr)
Japanese (ja)
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石川 洋平
菜々子 有馬
松谷 寛
前山 勝也
恵子 工藤
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日立化成株式会社
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Priority to JP2018531837A priority Critical patent/JPWO2018025673A1/en
Priority to KR1020197006295A priority patent/KR20190036554A/en
Publication of WO2018025673A1 publication Critical patent/WO2018025673A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/18Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or their halogen derivatives only
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Definitions

  • the present invention relates to a polyketone composition containing a nitrogen-containing compound, a polyketone cured product, an optical element, and an image display device.
  • An aromatic polyketone having an aromatic ring and a carbonyl group in the main chain has excellent heat resistance and mechanical properties and is used as an engineering plastic.
  • Most of the polymers belonging to the aromatic polyketone are aromatic polyether ketones polymerized using a nucleophilic aromatic substitution reaction, and have an ether bond in the main chain.
  • aromatic polyketone having no ether bond in the main chain is superior in heat resistance and chemical resistance to aromatic polyether ketone (for example, Patent Document 1 and Patent Document 2).
  • an aromatic polyketone when used as a film, it may be desired to have a high elongation in addition to transparency, heat resistance and chemical resistance.
  • the present invention has been made in view of the above-mentioned present situation.
  • a cured film is used, the polyketone composition, the polyketone cured product, and the polyketone cured product that are excellent in heat resistance, transparency, and chemical resistance and exhibit a high elongation rate. It is an object to provide an optical element and an image display apparatus having the above.
  • the means for solving the above problems include the following embodiments.
  • a polyketone containing a structural unit represented by the following general formula (I) in the main chain and A nitrogen-containing compound having a nitrogen atom and at least one group selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group bonded to the nitrogen atom, Containing a polyketone composition.
  • each X independently represents a divalent group having 1 to 50 carbon atoms that may have a substituent, and each Y independently has a substituent.
  • each X independently includes a bivalent group having 6 to 50 carbon atoms including an aromatic ring.
  • each X is independently a divalent group represented by at least one selected from the group consisting of the following general formulas (II-1) to (II-3)
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms
  • each R 2 independently represents a substituted group.
  • each m independently represents an integer of 0 to 3.
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms
  • each R 2 independently represents a substituted group.
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms
  • R 2 represents Each independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent
  • R 3 and R 4 each independently represents a carbon atom which may have a hydrogen atom or a substituent.
  • m independently represents an integer of 0 to 3
  • n independently represents an integer of 0 to 4
  • p independently represents an integer of 0 to 2, respectively.
  • each R 5 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and n is each independently an integer of 0 to 4 Indicates.
  • ⁇ 6> The polyketone composition according to any one of ⁇ 1> to ⁇ 5>, wherein in the general formula (I), Y has 6 to 30 carbon atoms.
  • ⁇ 7> The polyketone composition according to any one of ⁇ 1> to ⁇ 6>, wherein the nitrogen-containing compound has a total number of hydroxymethyl groups and alkoxymethyl groups bonded to nitrogen atoms of 2 to 6. object.
  • a cured polyketone which is a cured product of the polyketone composition according to any one of ⁇ 1> to ⁇ 9>.
  • ADVANTAGE OF THE INVENTION when it is set as a cured film, it is excellent in heat resistance, transparency, and chemical resistance, and shows the high elongation rate, the polyketone composition and polyketone hardened
  • the content of each component in the composition is the total of the plurality of substances present in the composition unless there is a specific indication when there are a plurality of substances corresponding to each component in the composition. Mean content.
  • the term “layer” or “film” includes only a part of the region in addition to the case where the layer or film is formed over the entire region. The case where it is formed is also included.
  • a plurality of aromatic rings are non-conjugated to each other or weakly conjugated to each other” means that two aromatic rings are via an ether bond or a methylene bond, or 2,2′-substituted It means that conjugation between aromatic rings is suppressed by being twisted moderately like biphenyl.
  • excellent transparency means that the transmittance of visible light (transmittance of visible light having a wavelength of 400 nm) is 80% or more (in terms of a film thickness of 1 ⁇ m).
  • heat resistance means that the thermal decomposition temperature of the member containing polyketone is 400 ° C. or higher.
  • “high elongation” means that the elongation at break of the formed film is 5% or more.
  • “chemical resistance of the cured film” means that the polyketone film does not peel from the base material even when the film-like polyketone cured product (polyketone film) formed on the silicon substrate is exposed to a chemical solution. Does not dissolve.
  • the polyketone composition of the present embodiment binds to a polyketone (hereinafter, also referred to as “specific polyketone”) containing a structural unit represented by the following general formula (I) in the main chain, a nitrogen atom, and the nitrogen atom.
  • a nitrogen-containing compound having a hydroxymethyl group or an alkoxymethyl group hereinafter also referred to as “specific nitrogen-containing compound”.
  • each X independently represents an optionally substituted divalent group having 1 to 50 carbon atoms
  • each Y independently represents a substituent.
  • n represents an integer of 3 to 1000.
  • the polyketone composition of this embodiment is excellent in heat resistance, transparency, and chemical resistance when it is used as a cured film by having the above-described configuration, and exhibits a high elongation rate.
  • the reason is not clear, but is presumed as follows. Since the specific polyketone contains a carbonyl group in the main chain, it is excellent in heat resistance and transparency. In addition, since the main chain of the specific polyketone is formed with almost C—C bonds, the molecular chain itself is stable against a chemical solution. And it is thought that the nitrogen atom in a specific nitrogen-containing compound acts, the cohesion force of specific polyketone becomes strong, and elongation rate when a polyketone composition is used as a cured film becomes large.
  • the specific nitrogen-containing compound functions as a crosslinking agent
  • the polyketone main chains are cross-linked, and as a result, the specific polyketone is entangled with each other. Conceivable. Therefore, by using a polyketone composition in which a specific nitrogen-containing compound is combined with a specific polyketone, when it is a cured film, it is excellent in heat resistance, transparency and chemical resistance, and can exhibit a higher elongation. Conceivable.
  • each component will be described.
  • the polyketone composition contains a specific polyketone.
  • the specific polyketone contains a structural unit represented by the following general formula (I) in the main chain.
  • each X independently represents a divalent group having 1 to 50 carbon atoms which may have a substituent.
  • Y independently represents a divalent hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
  • n represents an integer of 3 to 1000.
  • the number of carbon atoms of the divalent group represented by X is 1 to 50, preferably 1 to 30, and more preferably 1 to 24.
  • the substituent that X may have is not particularly limited, and specific examples include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, an acyl group having 2 to 5 carbon atoms, and the like.
  • the divalent group represented by X is preferably a hydrocarbon group, and more preferably contains an aromatic ring. When X has an aromatic ring, higher heat resistance tends to be realized.
  • X preferably contains a divalent group having 6 to 50 carbon atoms including an aromatic ring from the viewpoint of achieving high heat resistance.
  • the aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a naphthacene ring, a chrysene ring, a pyrene ring, a triphenylene ring, a pentacene ring, and a benzopyrene ring.
  • X preferably contains a plurality of aromatic rings, and the plurality of aromatic rings are non-conjugated with each other or are divalent groups having a weak conjugated relationship (hereinafter also referred to as “specific aromatic ring groups”). ) Is more preferable. Thereby, good diacylation can be realized at a low reaction temperature during the synthesis of the polyketone, and the polyketone has a high molecular weight and excellent heat resistance.
  • the specific aromatic ring group preferably has 12 to 50 carbon atoms.
  • a plurality of aromatic rings are non-conjugated with each other or have a weak conjugated relationship
  • a plurality of aromatic rings are bonded via an ether bond or a methylene bond; It means that conjugation between aromatic rings is suppressed by steric hindrance by a substituent such as 2′-substituted biphenyl.
  • X includes divalent groups represented by the following general formulas (II-1) to (II-3).
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms
  • each R 2 independently represents a substituted group.
  • the part with a wavy line means a bond. The same applies thereafter.
  • the hydrocarbon group represented by R 1 has 1 to 30 carbon atoms, preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms.
  • the carbon number of the hydrocarbon group does not include the carbon number of the substituent. The same applies thereafter.
  • Examples of the hydrocarbon group represented by R 1 include a saturated aliphatic hydrocarbon group, an unsaturated aliphatic hydrocarbon group, and an alicyclic hydrocarbon group.
  • saturated aliphatic hydrocarbon group represented by R 1 examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, and n-pentyl.
  • Group, isopentyl group, sec-pentyl group, neo-pentyl group, t-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-icosanyl group Examples include an n-triacontanyl group.
  • the saturated aliphatic hydrocarbon group may have an alicyclic hydrocarbon group described below at the terminal portion.
  • Examples of the unsaturated aliphatic hydrocarbon group represented by R 1 include an alkenyl group such as a vinyl group and an allyl group, and an alkynyl group such as an ethynyl group. Further, the unsaturated aliphatic hydrocarbon group may have an alicyclic hydrocarbon group to be described later at its terminal portion.
  • Examples of the alicyclic hydrocarbon group represented by R 1 include cycloalkyl groups such as cyclohexyl group, cycloheptyl group, cyclooctyl group and norbornyl group, and cycloalkenyl groups such as cyclohexenyl group.
  • the alicyclic hydrocarbon group may have at least one selected from the group consisting of a saturated aliphatic hydrocarbon group and an unsaturated aliphatic hydrocarbon group in the alicyclic ring.
  • the substituent that the hydrocarbon group represented by R 1 may have is not particularly limited, and examples thereof include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
  • each R 2 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
  • the hydrocarbon group represented by R 2 preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms.
  • Examples of the hydrocarbon group having 1 to 30 carbon atoms represented by R 2 include those similar to the hydrocarbon group having 1 to 30 carbon atoms exemplified for R 1 .
  • examples of the substituent that the hydrocarbon group represented by R 2 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
  • each m independently represents an integer of 0 to 3, preferably an integer of 0 to 2, and more preferably 0 or 1.
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a substituted group.
  • each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms
  • R 2 represents Each independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent
  • R 3 and R 4 each independently represents a carbon atom which may have a hydrogen atom or a substituent.
  • m independently represents an integer of 0 to 3
  • n independently represents an integer of 0 to 4
  • p independently represents an integer of 0 to 2, respectively.
  • R 3 and R 4 in the general formula (III-1) are preferably a hydrocarbon group having 1 to 5 carbon atoms which may have a substituent from the viewpoint of heat resistance.
  • Examples of the hydrocarbon group having 1 to 30 carbon atoms represented by R 3 and R 4 include the same hydrocarbon groups having 1 to 30 carbon atoms as exemplified for R 1 in the general formula (II-1). It is done.
  • Examples of the substituent that R 3 and R 4 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
  • N in the general formulas (III-2) and (III-3) each independently represents an integer of 0 to 4, preferably an integer of 0 to 2, and more preferably 0 or 1.
  • P in the general formulas (III-4), (III-5) and (III-7) each independently represents an integer of 0 to 2, and is preferably 0 or 1.
  • R 1, R 2, and m in formula (II-2), is the same as R 1, R 2, and m in Formula (II-1).
  • each R 5 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and n is each independently an integer of 0 to 4 Indicates.
  • the hydrocarbon group represented by R 5 preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms.
  • the hydrocarbon group having 1 to 30 carbon atoms represented by R 5 include the same hydrocarbon groups having 1 to 30 carbon atoms as exemplified for R 1 in formula (II-1).
  • the substituent that R 5 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
  • each n independently represents an integer of 0 to 4, preferably an integer of 1 to 4, more preferably an integer of 1 to 3, or 1 or 2. More preferably.
  • each Y independently represents a divalent hydrocarbon group having 1 to 30 carbon atoms which may have a substituent.
  • the hydrocarbon group represented by Y has 1 to 30 carbon atoms, preferably 4 to 30 carbon atoms, and more preferably 6 to 30 carbon atoms from the viewpoint of heat resistance.
  • the hydrocarbon group represented by Y preferably contains a saturated hydrocarbon group from the viewpoint of transparency.
  • the saturated hydrocarbon group may be a saturated aliphatic hydrocarbon group or a saturated alicyclic hydrocarbon group.
  • the hydrocarbon group represented by Y preferably includes a saturated alicyclic hydrocarbon group. Since the alicyclic hydrocarbon group is bulky as compared with the aliphatic hydrocarbon group having the same carbon number, it tends to be excellent in solubility in a nitrogen-containing compound and a solvent while maintaining high heat resistance and transparency.
  • the hydrocarbon group represented by Y may include a plurality of types of saturated aliphatic hydrocarbon groups or a plurality of types of saturated alicyclic hydrocarbon groups. Y may contain a combination of a saturated aliphatic hydrocarbon group and a saturated alicyclic hydrocarbon group.
  • the saturated aliphatic hydrocarbon group represented by Y has 1 to 30 carbon atoms, and preferably 3 to 30 carbon atoms.
  • Saturated aliphatic hydrocarbon groups include methylene, ethylene, trimethylene, methylethylene, tetramethylene, 1-methyltrimethylene, 2-methyltrimethylene, ethylethylene, 1,1-dimethylethylene Group, 1,2-dimethylethylene group, pentylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1-ethyltrimethylene group, 2-ethyltrimethylene group, 1,1-dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, propylethylene group, ethylmethylethylene group, hexylene group, 1-methylpentylene group, 2-methylpentylene group, 3-methylpentylene group 1-ethyltetramethylene group, 2-ethyltetramethylene group, 1-propyltrimethylene
  • the saturated aliphatic hydrocarbon group is preferably a hexylene group, a methylpentylene group, an ethyltetramethylene group, a propyltrimethylene group, a butylethylene group, a dimethyltetramethylene group, a trimethyltrimethylene group, Examples thereof include an ethylmethyltrimethylene group, a heptylene group, an octylene group, a nonylene group, a decylene group, an icosanylene group, and a triacontanilene group.
  • the saturated alicyclic hydrocarbon group represented by Y has 3 to 30 carbon atoms, preferably 4 to 30 carbon atoms, more preferably 6 to 30 carbon atoms.
  • the saturated alicyclic hydrocarbon group includes a cyclopropane skeleton, a cyclobutane skeleton, a cyclopentane skeleton, a cyclohexane skeleton, a cycloheptane skeleton, a cyclooctane skeleton, a cubane skeleton, a norbornane skeleton, and a tricyclo [5.2.1.0] decane skeleton.
  • the saturated alicyclic hydrocarbon group is preferably a cyclohexane skeleton, a cycloheptane skeleton, a cyclooctane skeleton, a cubane skeleton, a norbornane skeleton, a tricyclo [5.2.1.0] decane skeleton, or an adamantane skeleton.
  • divalent groups such as a diadamantane skeleton, a bicyclo [2.2.2] octane skeleton, and a decahydronaphthalene skeleton.
  • Examples of the substituent that the hydrocarbon group represented by Y may have include an amino group, an oxo group, a hydroxyl group, and a halogen atom.
  • Y preferably contains at least a divalent group represented by at least one selected from the group consisting of the following general formula (IV) and the following general formulas (V-1) to (V-3). More preferably, it contains at least a divalent hydrocarbon group represented by the general formula (IV).
  • the hydrogen atom of the skeleton may be substituted with a hydrocarbon group, an amino group, an oxo group, a hydroxyl group or a halogen atom, respectively.
  • each Z independently represents a single bond or a divalent saturated hydrocarbon group having 1 to 10 carbon atoms which may have a substituent.
  • each Z is preferably independently a divalent saturated hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, from the viewpoint of heat resistance. Therefore, Z is preferably a divalent saturated hydrocarbon group having 1 to 5 carbon atoms.
  • Examples of the divalent saturated hydrocarbon group represented by Z include a methylene group, an ethylene group, a trimethylene group, a methylethylene group, a tetramethylene group, a 1-methyltrimethylene group, a 2-methyltrimethylene group, an ethylethylene group, 1,1-dimethylethylene group, 1,2-dimethylethylene group, pentylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1-ethyltrimethylene group, 2-ethyltrimethylene group, 1,1 -Dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, propylethylene group, ethylmethylethylene group, hexylene group, 1-methylpentylene group, 2-methylpentylene group, 3-methylpentylene group, 1-ethyltetramethylene group, 2-ethyltetramethylene group, 1-propyltrimethyl group Tylene group, 2-propylt
  • Examples of the substituent that Z may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
  • the carbon number of the divalent saturated hydrocarbon group of Z does not include the carbon number of the substituent.
  • the divalent group represented by the general formula (V-3) may be the following general formula (VI-1).
  • Y may include both the general formula (IV) and at least one divalent group selected from the group consisting of the general formulas (V-1) to (V-3).
  • the general formula (IV) and the mass ratio ((IV) :( V-1) to (V-3)) of the total content of general formulas (V-1) to (V-3) is not particularly limited. From the viewpoints of heat resistance and elongation, the mass ratio is preferably 5:95 to 95: 5, and more preferably 5:95 to 90:10 from the viewpoint of heat resistance and solubility.
  • the specific polyketone may be a commercially available product or may be synthesized by a known method.
  • the weight average molecular weight (Mw) of the specific polyketone is preferably 500 or more in terms of polystyrene standard GPC (gel permeation chromatograph) from the viewpoint of maintaining heat resistance. From the viewpoint of solubility in a nitrogen compound and a solvent, it is more preferably 10,000 to 1,000,000. When higher heat resistance is required, the weight average molecular weight (Mw) is more preferably 20,000 to 1,000,000.
  • the weight average molecular weight (Mw) of the specific polyketone refers to a value measured by the method described in Examples.
  • Specific polyketone may be used individually by 1 type, and may be used in combination of 2 or more type. Moreover, the polyketone composition may contain other polyketones other than the specific polyketone. Hereinafter, the specific polyketone and other polyketones may be collectively referred to as “polyketone”. From the viewpoint of heat resistance, transparency, and chemical resistance when a cured film is used, the content of the specific polyketone relative to the total amount of polyketone is preferably 50% by mass or more, and preferably 60% by mass or more. More preferably, it is more preferably 70% by mass or more.
  • the total content of polyketone is 50 to 99 parts by mass with respect to 100 parts by mass of the total amount of polyketone and nitrogen-containing compound. It is preferably 50 parts by mass to 95 parts by mass.
  • the polyketone composition of the present embodiment contains a nitrogen-containing compound (specific nitrogen-containing compound) having a nitrogen atom and a hydroxymethyl group or an alkoxymethyl group bonded to the nitrogen atom.
  • the specific nitrogen-containing compound is preferably a compound having both a hydroxymethyl group and an alkoxymethyl group, or a compound having no hydroxymethyl group and having an alkoxymethyl group, more preferably a compound having no hydroxymethyl group and having an alkoxymethyl group. preferable.
  • the total number of hydroxymethyl groups and alkoxymethyl groups contained in the molecule of the specific nitrogen-containing compound is not particularly limited as long as it is 1 or more.
  • the total number of hydroxymethyl groups and alkoxymethyl groups contained in the molecule is preferably 2 to 6, and 4 to 6 from the viewpoint of elongation and chemical resistance when used as a cured film. It is more preferable.
  • the number of carbon atoms of the alkoxy group in the alkoxymethyl group is preferably 1-30, more preferably 1-15, still more preferably 1-10, and particularly preferably 1-3. 1 is very particularly preferred.
  • Specific nitrogen-containing compounds include compounds represented by the following general formulas (VII-1) and (VII-2).
  • A represents an n-valent organic group
  • W 1 and W 2 are each independently a hydrogen atom or the following general formula (VIII-1) or (VIII-2)
  • N represents 2 or 3.
  • at least one is a group represented by the following general formula (VIII-1) or (VIII-2), 2 of the plurality of W 1 and W 2
  • the above is preferably a group represented by the following general formula (VIII-1) or (VIII-2).
  • R 1 represents an alkyl group having 1 to 30 carbon atoms which may have a substituent.
  • the alkyl group represented by R 1 preferably has 1 to 30 carbon atoms, more preferably 1 to 15 carbon atoms, still more preferably 1 to 10 carbon atoms, and particularly preferably 1 to 3 carbon atoms. 1 is very preferable.
  • examples of the organic group represented by A include groups represented by the following general formulas (IX-1) and (IX-2).
  • W 3 to W 6 are each independently a hydrogen atom or a group represented by general formula (VIII-1) or (VIII-2). However, among the W 3 ⁇ W 6, at least one is a group represented by the following general formula (VIII-1) or (VIII-2), 2 or more of W 3 ⁇ W 6 is the following A group represented by the general formula (VIII-1) or (VIII-2) is preferable.
  • Examples of the specific nitrogen-containing compound include compounds represented by the following general formulas (X-1) to (X-3).
  • each R 1 independently represents an alkyl group having 1 to 30 carbon atoms which may have a substituent. Details of R 1, is the same as R 1 in the general formula (VIII-2).
  • the specific nitrogen-containing compound may be a monomer or an oligomer, or a mixture of a monomer and an oligomer.
  • oligomers include those formed by self-reaction of monomers.
  • the specific nitrogen-containing compound may be used alone or in combination of two or more.
  • the content of the specific nitrogen-containing compound is from 1 part by mass to 50 parts per 100 parts by mass of the total amount of the polyketone and the specific nitrogen-containing compound from the viewpoint of heat resistance, transparency, and chemical resistance when used as a cured film.
  • the mass is preferably 5 parts by mass, more preferably 5 parts by mass to 50 parts by mass, and still more preferably 5 parts by mass to 20 parts by mass.
  • the polyketone composition may further contain a thermal latent acid generator.
  • the thermal latent acid generator is a compound that generates an acid by heating.
  • the polyketone composition contains a thermal latent acid generator, the crosslinking reaction by the specific nitrogen-containing compound is promoted, and a stronger cured product can be obtained, so that the chemical resistance of the cured film tends to be improved. .
  • Examples of the acid generated from the thermal latent acid generator include aryl sulfonic acids such as p-toluenesulfonic acid and benzenesulfonic acid, and paroxyls such as ( ⁇ ) -10-camphorsulfonic acid, trifluoromethanesulfonic acid, and nonafluorobutanesulfonic acid.
  • aryl sulfonic acids such as p-toluenesulfonic acid and benzenesulfonic acid
  • paroxyls such as ( ⁇ ) -10-camphorsulfonic acid, trifluoromethanesulfonic acid, and nonafluorobutanesulfonic acid.
  • alkyl sulfonic acids such as fluoroalkyl sulfonic acid, methane sulfonic acid, ethane sulfonic acid, and butane sulfonic acid.
  • the thermal latent acid generator may be used alone or in combination of two or more.
  • the content of the thermal latent acid generator is preferably 0.05 to 30 parts by mass with respect to 100 parts by mass of the total amount of the polyketone, the nitrogen-containing compound, and the thermal latent acid generator. More preferably, it is from 20 parts by weight to 20 parts by weight, and even more preferably from 0.2 to 10 parts by weight.
  • the polyketone composition may further contain a solvent.
  • the solvent is not particularly limited as long as it dissolves or disperses each component.
  • Solvents include ⁇ -butyrolactone, ethyl lactate, propylene glycol monomethyl ether acetate, butyl acetate, benzyl acetate, n-butyl acetate, ethoxyethyl propionate, 3-methylmethoxypropionate, N-methyl-2-pyrrolidone, N-cyclohexyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, hexamethylphosphorylamide, tetramethylene sulfone, diethyl ketone, diisobutyl ketone, methyl amyl ketone, cyclopentanone, cyclohexanone, propylene glycol monomethyl Ether, propylene glycol monopropyl ether, propylene glycol
  • the content of the solvent is 5 mass with respect to 100 mass parts of the total amount of the polyketone, the nitrogen-containing compound, and the latent thermal acid generator contained as necessary, and the solvent. Part to 95 parts by weight, preferably 10 parts to 90 parts by weight.
  • the polyketone composition may further contain other additives.
  • additives include adhesion assistants, surfactants, leveling agents, antioxidants, and UV degradation inhibitors.
  • the polyketone cured product of the present embodiment is a cured product of the polyketone composition of the present embodiment.
  • the polyketone cured product can be produced, for example, by the following method.
  • First, the polyketone composition is applied to at least a part of the surface of the substrate to form a composition layer.
  • the method for applying the polyketone composition to the substrate is not particularly limited as long as the composition layer can be formed in an arbitrary shape at an arbitrary location on the substrate. Examples of the method for applying the polyketone composition to the substrate include an immersion method, a spray method, a screen printing method, a spin coating method, a spin coating method, and a bar coating method.
  • the base material to which the polyketone composition is applied is not particularly limited, and glass, semiconductor, metal oxide insulator (titanium oxide, silicon oxide, etc.), inorganic materials such as silicon nitride, triacetyl cellulose, transparent polyimide, polycarbonate, Examples thereof include a transparent substrate composed of a transparent resin such as an acrylic polymer and a cycloolefin resin.
  • the shape of the substrate is not particularly limited, and may be a plate shape or a film shape. Since the polyketone composition of the present embodiment exhibits a high elongation when it is used as a cured film and is excellent in chemical resistance, it can be suitably used as a coating material for a substrate, a molded product, and the like.
  • the polyketone composition When the polyketone composition contains a solvent, it may be dried before and after curing.
  • the drying method is not particularly limited, and examples thereof include a heat treatment method using an apparatus such as a hot plate or an oven.
  • the drying conditions are not particularly limited as long as the solvent in the polyketone composition is sufficiently volatilized, and is usually about 50 to 150 ° C. for about 1 to 90 minutes.
  • the curing method is not particularly limited and can be cured by heat treatment or the like.
  • ovens such as box dryers, hot air conveyor dryers, quartz tube furnaces, hot plates, rapid thermal annealing, vertical diffusion furnaces, infrared curing furnaces, electron beam curing furnaces, microwave curing furnaces, etc. Can be used.
  • the atmosphere for curing may be selected from the air or an inert atmosphere such as nitrogen, and is preferably performed in a nitrogen atmosphere from the viewpoint of preventing oxidation of the polyketone composition.
  • the temperature and time of the heat treatment for curing can be arbitrarily set in consideration of the composition conditions, work efficiency, etc., and are usually about 60 minutes to 200 ° C. for about 30 minutes to 2 hours.
  • the obtained polyketone cured product can be used as a substrate with a polyketone cured product with the substrate attached, and can be used after being peeled off from the substrate, if necessary.
  • the polyketone cured product may be provided on at least a part of the surface of the base material, and may be provided on only one surface of the base material or on both surfaces.
  • the polyketone cured product may have a single-layer structure or a multi-layer structure in which two or more layers are laminated.
  • the optical element and the image display device of the present embodiment each have the polyketone cured product of the present embodiment.
  • the polyketone cured product applied to the optical element and the image display device may be the above-described base material with a polyketone cured product.
  • a base material is a transparent base material, it can use suitably for an optical element.
  • the transparent substrate include those exemplified in the production of the polyketone cured product.
  • Optical element and image display device for example, paste the base material side of the base material with polyketone cured product to the application location such as LCD (Liquid Crystal Display), ELD (Electro Luminescence Display) etc. via adhesive, adhesive, etc. Can be obtained.
  • LCD Liquid Crystal Display
  • ELD Electro Luminescence Display
  • the polyketone cured product and various optical elements such as a polarizing plate using the polyketone can be preferably used for various image display devices such as a liquid crystal display device.
  • the image display device may have the same configuration as the conventional image display device except that the polyketone cured product of the present embodiment is used.
  • the image display device is a liquid crystal display device, by appropriately assembling each component such as a liquid crystal cell, an optical element such as a polarizing plate, and an illumination system (backlight, etc.) as necessary, and incorporating a drive circuit, etc. Can be manufactured.
  • the liquid crystal cell is not particularly limited, and various types such as a TN type, an STN type, and a ⁇ type can be used.
  • OA equipment such as desktop personal computers, notebook personal computers, and copiers, mobile phones, watches, digital cameras, personal digital assistants (PDAs), portable devices such as portable game machines, video cameras, televisions, and electronic devices.
  • PDAs personal digital assistants
  • Household electrical equipment such as a range, back monitor, car navigation system monitor, in-vehicle equipment such as car audio, display equipment such as information monitors for commercial stores, security equipment such as monitoring monitors, nursing care such as nursing monitors Examples thereof include medical devices and medical devices such as medical monitors.
  • ⁇ Polyketone composition Components (A) to (D) were blended in the proportions shown in Tables 1 to 4 and filtered through a PTFE (polytetrafluoroethylene) filter to obtain polyketone compositions of Examples and Comparative Examples.
  • the numerical value in the parenthesis represents the blending ratio (part by mass, solid content ratio). “-” Indicates that the component is not contained.
  • Each component in Tables 1 to 4 is as follows.
  • the resulting polyketone PK-1 had a weight average molecular weight of 20,000 and a number average molecular weight of 8,000. In addition, a weight average molecular weight and a number average molecular weight are measured and calculated by the method described later. The weight average molecular weight (Mw) and number average molecular weight (Mn) of polyketone PK-2 to polyketone PK-15 described later were also measured in the same manner.
  • Synthesis Example 2 Synthesis of Polyketone PK-2
  • Polyketone PK-2 was obtained in the same manner as in Example 1, except that 10 mmol of 2,2′-dimethoxybiphenyl and 13 mmol of 1,3-adamantanedicarboxylic acid were used as monomers. It was.
  • the resulting polyketone PK-2 had a weight average molecular weight of 280,000 and a number average molecular weight of 44,000.
  • Synthesis Example 4 Synthesis of Polyketone PK-4 Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantane dicarboxylic acid and 5 mmol of cis-1,4-cyclohexanedicarboxylic acid were used as monomers. In the same manner as above, polyketone PK-4 was obtained. The resulting polyketone PK-4 had a weight average molecular weight of 36,000 and a number average molecular weight of 12,000.
  • Synthesis Example 6 Synthesis of Polyketone PK-6
  • the polyketone was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of dodecanedioic acid were used as monomers.
  • PK-6 was obtained.
  • the resulting polyketone PK-6 had a weight average molecular weight of 39,000 and a number average molecular weight of 12,000.
  • Synthesis Example 7 Synthesis of Polyketone PK-7 A polyketone was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of hexanedioic acid were used as monomers. PK-7 was obtained. The resulting polyketone PK-7 had a weight average molecular weight of 39,000 and a number average molecular weight of 12,000.
  • Synthesis Example 8 Synthesis of Polyketone PK-8 Except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid and 5 mmol of cis-1,4-cyclohexanedicarboxylic acid were used, the same procedure as in Example 1 was performed. Polyketone PK-8 was obtained. The resulting polyketone PK-8 had a weight average molecular weight of 45,000 and a number average molecular weight of 11,000.
  • Synthesis Example 11 Synthesis of Polyketone PK-11 Example 1 was used except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of decalin-2,6-dicarboxylic acid were used as monomers. Similarly, polyketone PK-11 was obtained. The resulting polyketone PK-11 had a weight average molecular weight of 33,000 and a number average molecular weight of 10,000.
  • Synthesis Example 12 Synthesis of Polyketone PK-12 As a monomer, 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of norbornane dicarboxylic acid (2,4-, 2,5-mixture) A polyketone PK-12 was obtained in the same manner as in Example 1 except that it was used. The resulting polyketone PK-12 had a weight average molecular weight of 27,000 and a number average molecular weight of 9,200.
  • Synthesis Example 13 Synthesis of Polyketone PK-13 Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of trans-2,3-norbornane dicarboxylic acid were used as monomers. In the same manner as above, polyketone PK-13 was obtained. The resulting polyketone PK-13 had a weight average molecular weight of 26,000 and a number average molecular weight of 8,100.
  • a polyketone cured product was prepared by the following method, and a sample for evaluation described later was prepared.
  • the molecular weight (weight average molecular weight and number average molecular weight) of the polyketone was measured by GPC method using tetrahydrofuran (THF) as an eluent, and was determined in terms of standard polystyrene. Details are as follows.

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Abstract

A polyketone composition contains a polyketone and a nitrogenous compound. The polyketone comprises a structural unit represented by general formula (I) in a main chain thereof. The nitrogenous compound contains a nitrogen atom and at least one group selected from the group consisting of a hydroxymethyl group and a alkoxymethyl group that will bind to the nitrogen atom. In formula (I), each X independently represents an optionally substituted divalent group comprising 1–50 carbon atoms, each Y independently represents an optionally substituted divalent hydrocarbon group comprising 1–30 carbon atoms, and n represents an integer from 3 to 1000.

Description

含窒素化合物を含有するポリケトン組成物、ポリケトン硬化物、光学素子及び画像表示装置Polyketone composition, polyketone cured product, optical element and image display device containing nitrogen-containing compound
 本発明は、含窒素化合物を含有するポリケトン組成物、ポリケトン硬化物、光学素子及び画像表示装置に関する。 The present invention relates to a polyketone composition containing a nitrogen-containing compound, a polyketone cured product, an optical element, and an image display device.
 主鎖に芳香環とカルボニル基とを有する芳香族ポリケトンは、優れた耐熱性と機械特性を有しており、エンジニアリングプラスチックとして利用されている。芳香族ポリケトンに属する高分子のほとんどは、求核芳香族置換反応を利用して重合された芳香族ポリエーテルケトンであり、主鎖にエーテル結合を有している。これに対し、主鎖にエーテル結合を有していない芳香族ポリケトンは、芳香族ポリエーテルケトンよりもさらに優れた耐熱性及び耐薬品性に優れることが知られている(例えば、特許文献1及び特許文献2参照)。 An aromatic polyketone having an aromatic ring and a carbonyl group in the main chain has excellent heat resistance and mechanical properties and is used as an engineering plastic. Most of the polymers belonging to the aromatic polyketone are aromatic polyether ketones polymerized using a nucleophilic aromatic substitution reaction, and have an ether bond in the main chain. On the other hand, it is known that an aromatic polyketone having no ether bond in the main chain is superior in heat resistance and chemical resistance to aromatic polyether ketone (for example, Patent Document 1 and Patent Document 2).
 近年、脂環式ジカルボン酸と2,2’-ジアルコキシビフェニル化合物とをFriedel-Craftsアシル化により直接重合することで、高い透明性と耐熱性を両立した芳香族ポリケトンが得られることが報告され(例えば、特許文献3参照)、光学部品への応用が期待されている。 Recently, it has been reported that an aromatic polyketone having both high transparency and heat resistance can be obtained by directly polymerizing alicyclic dicarboxylic acid and 2,2′-dialkoxybiphenyl compound by Friedel-Crafts acylation. (For example, refer to Patent Document 3), application to optical components is expected.
 芳香族ポリケトン等の樹脂材料を光学部品に応用する際には、無機材料では得られない特性として、例えば、無機材料に比べて、軽量さ及び柔軟さが期待される。樹脂材料の適応先としては、例えば、軽量さを活かしたコート材、ガラス代替材等、及び柔軟さを活かしたフレキシブルディスプレイ等が挙げられる。なかでも、フレキシブルディスプレイへの適用の実現は、近年特に注目されている。 When applying a resin material such as an aromatic polyketone to an optical component, lightness and flexibility are expected as characteristics that cannot be obtained with an inorganic material, for example, as compared with an inorganic material. Examples of the application destination of the resin material include a coating material that utilizes light weight, a glass substitute material, and a flexible display that utilizes flexibility. In particular, realization of application to flexible displays has attracted particular attention in recent years.
特開昭62-7730号公報JP-A-62-273030 特開2005-272728号公報JP 2005-272728 A 特開2013-53194号公報JP 2013-53194 A
 さらに、芳香族ポリケトンを膜としたときには、透明性、耐熱性及び耐薬品性に加え、高い伸び率を有することが望まれる場合がある。 Furthermore, when an aromatic polyketone is used as a film, it may be desired to have a high elongation in addition to transparency, heat resistance and chemical resistance.
 本発明は、上記現状に鑑みなされたものであり、硬化膜としたときに、耐熱性、透明性及び耐薬品性に優れ、高い伸び率を示すポリケトン組成物及びポリケトン硬化物、並びにポリケトン硬化物を有する光学素子及び画像表示装置を提供することを目的とする。 The present invention has been made in view of the above-mentioned present situation. When a cured film is used, the polyketone composition, the polyketone cured product, and the polyketone cured product that are excellent in heat resistance, transparency, and chemical resistance and exhibit a high elongation rate. It is an object to provide an optical element and an image display apparatus having the above.
 上記課題を解決するための手段には、以下の実施態様が含まれる。 The means for solving the above problems include the following embodiments.
<1> 下記一般式(I)で表される構造単位を主鎖に含むポリケトン、並びに、
 窒素原子と、前記窒素原子と結合するヒドロキシメチル基及びアルコキシメチル基からなる群より選択される少なくとも1種の基と、を有する含窒素化合物、
 を含有するポリケトン組成物。
<1> a polyketone containing a structural unit represented by the following general formula (I) in the main chain, and
A nitrogen-containing compound having a nitrogen atom and at least one group selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group bonded to the nitrogen atom,
Containing a polyketone composition.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 一般式(I)中、Xは、それぞれ独立に、置換基を有していてもよい炭素数1~50の2価の基を示し、Yは、それぞれ独立に、置換基を有していてもよい炭素数1~30の2価の炭化水素基を示し、nは3~1000の整数を示す。 In the general formula (I), each X independently represents a divalent group having 1 to 50 carbon atoms that may have a substituent, and each Y independently has a substituent. Represents a divalent hydrocarbon group having 1 to 30 carbon atoms, and n represents an integer of 3 to 1000.
<2> 前記一般式(I)において、Xが、それぞれ独立に、芳香環を含む炭素数6~50の2価の基を含む、<1>に記載のポリケトン組成物。 <2> The polyketone composition according to <1>, wherein, in the general formula (I), each X independently includes a bivalent group having 6 to 50 carbon atoms including an aromatic ring.
<3> 前記一般式(I)において、Xが、それぞれ独立に、下記一般式(II-1)~(II-3)からなる群より選択される少なくとも1種で表される2価の基を含む、<1>又は<2>に記載のポリケトン組成物。 <3> In the general formula (I), each X is independently a divalent group represented by at least one selected from the group consisting of the following general formulas (II-1) to (II-3) The polyketone composition according to <1> or <2>.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 一般式(II-1)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示す。 In general formula (II-1), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a substituted group. A hydrocarbon group having 1 to 30 carbon atoms which may have a group, and each m independently represents an integer of 0 to 3.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 一般式(II-2)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示し、Zは、酸素原子又は下記一般式一般式(III-1)~(III-7)で表される2価の基を示す。 In general formula (II-2), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a substituted group. A hydrocarbon group having 1 to 30 carbon atoms which may have a group, m independently represents an integer of 0 to 3, and Z represents an oxygen atom or the following general formula (III-1) ) To (III-7).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 一般式(III-1)~(III-7)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、R及びRは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を表す。mは、それぞれ独立に、0~3の整数を示し、nは、それぞれ独立に、0~4の整数を示し、pは、それぞれ独立に、0~2の整数を示す。 In general formulas (III-1) to (III-7), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and R 2 represents Each independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 3 and R 4 each independently represents a carbon atom which may have a hydrogen atom or a substituent. Represents a hydrocarbon group of 1 to 30. m independently represents an integer of 0 to 3, n independently represents an integer of 0 to 4, and p independently represents an integer of 0 to 2, respectively.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 一般式(II-3)中、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、nは、それぞれ独立に、0~4の整数を示す。 In general formula (II-3), each R 5 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and n is each independently an integer of 0 to 4 Indicates.
<4> 前記一般式(I)において、Yが、2価の飽和炭化水素基を含む、<1>~<3>のいずれか1項に記載のポリケトン組成物。 <4> The polyketone composition according to any one of <1> to <3>, wherein Y in the general formula (I) includes a divalent saturated hydrocarbon group.
<5> 前記一般式(I)において、Yが、2価の飽和脂環式炭化水素基を含む、<4>に記載のポリケトン組成物。 <5> The polyketone composition according to <4>, wherein, in the general formula (I), Y includes a divalent saturated alicyclic hydrocarbon group.
<6> 前記一般式(I)において、Yの炭素数が6~30である、<1>~<5>のいずれか1項に記載のポリケトン組成物。 <6> The polyketone composition according to any one of <1> to <5>, wherein in the general formula (I), Y has 6 to 30 carbon atoms.
<7> 前記含窒素化合物は、窒素原子と結合するヒドロキシメチル基及びアルコキシメチル基の総数が、2個~6個である、<1>~<6>のいずれか1項に記載のポリケトン組成物。 <7> The polyketone composition according to any one of <1> to <6>, wherein the nitrogen-containing compound has a total number of hydroxymethyl groups and alkoxymethyl groups bonded to nitrogen atoms of 2 to 6. object.
<8> 熱潜在酸発生剤をさらに含有する、<1>~<7>のいずれか1項に記載のポリケトン組成物。 <8> The polyketone composition according to any one of <1> to <7>, further containing a thermal latent acid generator.
<9> 溶剤をさらに含有する、<1>~<8>のいずれか1項に記載のポリケトン組成物。 <9> The polyketone composition according to any one of <1> to <8>, further containing a solvent.
<10> <1>~<9>のいずれか1項に記載のポリケトン組成物の硬化物である、ポリケトン硬化物。 <10> A cured polyketone, which is a cured product of the polyketone composition according to any one of <1> to <9>.
<11> <10>に記載のポリケトン硬化物を有する光学素子。 <11> An optical element having the polyketone cured product according to <10>.
<12> <10>に記載のポリケトン硬化物を有する画像表示装置。 <12> An image display device having the polyketone cured product according to <10>.
 本発明によれば、硬化膜としたときに、耐熱性、透明性及び耐薬品性に優れ、高い伸び率を示すポリケトン組成物及びポリケトン硬化物、並びにポリケトン硬化物を有する光学素子及び画像表示装置を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, when it is set as a cured film, it is excellent in heat resistance, transparency, and chemical resistance, and shows the high elongation rate, the polyketone composition and polyketone hardened | cured material, and the optical element and image display apparatus which have polyketone hardened | cured material Can be provided.
 以下、本発明について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。以下の実施形態において、その構成要素(要素ステップ等も含む)は、特に明示した場合を除き、必須ではない。数値及びその範囲についても同様であり、本発明を制限するものではない。 Hereinafter, the present invention will be described in detail. However, the present invention is not limited to the following embodiments. In the following embodiments, the components (including element steps and the like) are not essential unless otherwise specified. The same applies to numerical values and ranges thereof, and the present invention is not limited thereto.
 本開示において「~」を用いて示された数値範囲は、「~」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 本開示において組成物中の各成分の含有率は、組成物中に各成分に該当する物質が複数種存在する場合、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率を意味する。
 本開示において「層」又は「膜」との語には、当該層又は膜が存在する領域を観察したときに、当該領域の全体に形成されている場合に加え、当該領域の一部にのみ形成されている場合も含まれる。
In the present disclosure, numerical ranges indicated using “to” indicate ranges including numerical values described before and after “to” as the minimum value and the maximum value, respectively.
In the numerical ranges described stepwise in the present disclosure, the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical description. . Further, in the numerical ranges described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the values shown in the examples.
In the present disclosure, the content of each component in the composition is the total of the plurality of substances present in the composition unless there is a specific indication when there are a plurality of substances corresponding to each component in the composition. Mean content.
In the present disclosure, the term “layer” or “film” includes only a part of the region in addition to the case where the layer or film is formed over the entire region. The case where it is formed is also included.
 本開示において「複数の芳香環は相互に非共役であるか、相互の共役関係が弱い」とは、2つの芳香環がエーテル結合若しくはメチレン結合を介していること、又は2,2’-置換ビフェニルのように適度にねじれていることで、芳香環どうしの共役が抑えられることをいう。 In the present disclosure, “a plurality of aromatic rings are non-conjugated to each other or weakly conjugated to each other” means that two aromatic rings are via an ether bond or a methylene bond, or 2,2′-substituted It means that conjugation between aromatic rings is suppressed by being twisted moderately like biphenyl.
 本開示において「優れた透明性」とは、可視光の透過性(波長400nmの可視光の透過性)が80%以上(膜厚1μm換算)であることを意味する。 In the present disclosure, “excellent transparency” means that the transmittance of visible light (transmittance of visible light having a wavelength of 400 nm) is 80% or more (in terms of a film thickness of 1 μm).
 本開示において「耐熱性」とは、ポリケトンを含む部材において熱分解温度が400℃以上であることを意味する。 In the present disclosure, “heat resistance” means that the thermal decomposition temperature of the member containing polyketone is 400 ° C. or higher.
 本開示において「高い伸び率」とは、形成した膜の破断伸び率が5%以上であることを意味する。 In the present disclosure, “high elongation” means that the elongation at break of the formed film is 5% or more.
 本開示において「硬化膜の耐薬品性」とは、シリコン基板上に形成した膜状のポリケトン硬化物(ポリケトン膜)を薬液に暴露しても、ポリケトン膜が基材から剥れず、且つポリケトン膜が溶解しないことを意味する。 In the present disclosure, “chemical resistance of the cured film” means that the polyketone film does not peel from the base material even when the film-like polyketone cured product (polyketone film) formed on the silicon substrate is exposed to a chemical solution. Does not dissolve.
<ポリケトン組成物>
 本実施形態のポリケトン組成物は、下記一般式(I)で表される構造単位を主鎖に含むポリケトン(以下、「特定ポリケトン」ともいう)、並びに、窒素原子と、前記窒素原子と結合するヒドロキシメチル基又はアルコキシメチル基と、を有する含窒素化合物(以下、「特定含窒素化合物」ともいう)、を含有する。
<Polyketone composition>
The polyketone composition of the present embodiment binds to a polyketone (hereinafter, also referred to as “specific polyketone”) containing a structural unit represented by the following general formula (I) in the main chain, a nitrogen atom, and the nitrogen atom. A nitrogen-containing compound having a hydroxymethyl group or an alkoxymethyl group (hereinafter also referred to as “specific nitrogen-containing compound”).
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 一般式(I)中、Xは、それぞれ独立に、置換基を有していてもよい炭素数1~50の2価の基を表し、Yは、それぞれ独立に、置換基を有していてもよい炭素数1~30の2価の炭化水素基を表し、nは3~1000の整数を表す。 In general formula (I), each X independently represents an optionally substituted divalent group having 1 to 50 carbon atoms, and each Y independently represents a substituent. Represents a divalent hydrocarbon group having 1 to 30 carbon atoms, and n represents an integer of 3 to 1000.
 本実施形態のポリケトン組成物は、上記構成とすることで、硬化膜としたときに、耐熱性、透明性及び耐薬品性に優れ、高い伸び率を示す。その理由は、明らかではないが以下のように推測される。
 特定ポリケトンは、主鎖にカルボニル基を含むため、耐熱性及び透明性に優れる。また、特定ポリケトンは、主鎖がほぼC-C結合で形成されるため、分子鎖自身は薬液に対して安定である。そして、特定含窒素化合物中の窒素原子が作用して特定ポリケトンの凝集力が強くなり、ポリケトン組成物を硬化膜としたときの伸び率が大きくなると考えられる。なお、特定含窒素化合物が架橋剤として機能する場合には、ポリケトン主鎖どうしが架橋し、その結果、特定ポリケトンどうしの絡み合いが多くなることから、硬化膜としたときの伸び率がより大きくなると考えられる。
 そのため、特定ポリケトンに特定含窒素化合物を組み合わせたポリケトン組成物を用いることで、硬化膜としたときに、耐熱性、透明性及び耐薬品性に優れ、さらに高い伸び率を示すことが可能になると考えられる。
 以下、各成分について説明する。
The polyketone composition of this embodiment is excellent in heat resistance, transparency, and chemical resistance when it is used as a cured film by having the above-described configuration, and exhibits a high elongation rate. The reason is not clear, but is presumed as follows.
Since the specific polyketone contains a carbonyl group in the main chain, it is excellent in heat resistance and transparency. In addition, since the main chain of the specific polyketone is formed with almost C—C bonds, the molecular chain itself is stable against a chemical solution. And it is thought that the nitrogen atom in a specific nitrogen-containing compound acts, the cohesion force of specific polyketone becomes strong, and elongation rate when a polyketone composition is used as a cured film becomes large. In the case where the specific nitrogen-containing compound functions as a crosslinking agent, the polyketone main chains are cross-linked, and as a result, the specific polyketone is entangled with each other. Conceivable.
Therefore, by using a polyketone composition in which a specific nitrogen-containing compound is combined with a specific polyketone, when it is a cured film, it is excellent in heat resistance, transparency and chemical resistance, and can exhibit a higher elongation. Conceivable.
Hereinafter, each component will be described.
(A)ポリケトン
 ポリケトン組成物は、特定ポリケトンを含有する。特定ポリケトンは、下記一般式(I)で表される構造単位を主鎖に含む。
(A) Polyketone The polyketone composition contains a specific polyketone. The specific polyketone contains a structural unit represented by the following general formula (I) in the main chain.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 一般式(I)中、Xは、それぞれ独立に、置換基を有していてもよい炭素数1~50の2価の基を表す。Yは、それぞれ独立に、置換基を有していてもよい炭素数1~30の2価の炭化水素基を表す。nは3~1000の整数を表す。なお、2価の基又は2価の炭化水素基が置換基を有する場合、2価の基の炭素数には、置換基の炭素数を含めないものとする。以降、同様である。 In the general formula (I), each X independently represents a divalent group having 1 to 50 carbon atoms which may have a substituent. Y independently represents a divalent hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. n represents an integer of 3 to 1000. When the divalent group or the divalent hydrocarbon group has a substituent, the carbon number of the divalent group does not include the carbon number of the substituent. The same applies thereafter.
 Xで表される2価の基の炭素数は、1~50であり、1~30であることが好ましく、1~24であることがさらに好ましい。 The number of carbon atoms of the divalent group represented by X is 1 to 50, preferably 1 to 30, and more preferably 1 to 24.
 Xが有し得る置換基は、特に限定されず、具体的には、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。 The substituent that X may have is not particularly limited, and specific examples include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, an acyl group having 2 to 5 carbon atoms, and the like.
 Xで表される2価の基は、炭化水素基であることが好ましく、芳香環を含むことがより好ましい。Xが芳香環を有すると、より高い耐熱性を実現できる傾向にある。 The divalent group represented by X is preferably a hydrocarbon group, and more preferably contains an aromatic ring. When X has an aromatic ring, higher heat resistance tends to be realized.
 Xは、高い耐熱性を実現する観点から、芳香環を含む炭素数6~50の2価の基を含むことが好ましい。芳香環としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ナフタセン環、クリセン環、ピレン環、トリフェニレン環、ペンタセン環、ベンゾピレン環等が挙げられる。 X preferably contains a divalent group having 6 to 50 carbon atoms including an aromatic ring from the viewpoint of achieving high heat resistance. Examples of the aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a naphthacene ring, a chrysene ring, a pyrene ring, a triphenylene ring, a pentacene ring, and a benzopyrene ring.
 さらに、Xは、複数の芳香環を含むことが好ましく、複数の芳香環は相互に非共役であるか、又は相互の共役関係が弱い2価の基(以下、「特定芳香環基」ともいう)であることがより好ましい。これにより、ポリケトン合成時に低い反応温度で良好なジアシル化を実現することができ、分子量が高く耐熱性に優れるポリケトンとなる。特定芳香環基は、炭素数が12~50であることが好ましい。 Furthermore, X preferably contains a plurality of aromatic rings, and the plurality of aromatic rings are non-conjugated with each other or are divalent groups having a weak conjugated relationship (hereinafter also referred to as “specific aromatic ring groups”). ) Is more preferable. Thereby, good diacylation can be realized at a low reaction temperature during the synthesis of the polyketone, and the polyketone has a high molecular weight and excellent heat resistance. The specific aromatic ring group preferably has 12 to 50 carbon atoms.
 ここで、「複数の芳香環は相互に非共役であるか、又は相互の共役関係が弱い」とは、複数の芳香環がエーテル結合若しくはメチレン結合を介して結合していること、又は2,2’-置換ビフェニルのように置換基による立体障害により、芳香環どうしの共役が抑えられることをいう。 Here, “a plurality of aromatic rings are non-conjugated with each other or have a weak conjugated relationship” means that a plurality of aromatic rings are bonded via an ether bond or a methylene bond; It means that conjugation between aromatic rings is suppressed by steric hindrance by a substituent such as 2′-substituted biphenyl.
 Xとしては、下記一般式(II-1)~(II-3)で表される2価の基等が挙げられる。 X includes divalent groups represented by the following general formulas (II-1) to (II-3).
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 一般式(II-1)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示す。波線を付した部分は、結合手を意味する。以降、同様である。 In general formula (II-1), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a substituted group. A hydrocarbon group having 1 to 30 carbon atoms which may have a group, and each m independently represents an integer of 0 to 3. The part with a wavy line means a bond. The same applies thereafter.
 耐熱性の観点から、Rで表される炭化水素基の炭素数は、1~30であり、1~10であることが好ましく、1~6であることがより好ましい。なお、炭化水素基が置換基を有する場合、炭化水素基の炭素数には、置換基の炭素数を含めないものとする。以降、同様である。 From the viewpoint of heat resistance, the hydrocarbon group represented by R 1 has 1 to 30 carbon atoms, preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms. When the hydrocarbon group has a substituent, the carbon number of the hydrocarbon group does not include the carbon number of the substituent. The same applies thereafter.
 Rで表される炭化水素基としては、飽和脂肪族炭化水素基、不飽和脂肪族炭化水素基、脂環式炭化水素基等が挙げられる。 Examples of the hydrocarbon group represented by R 1 include a saturated aliphatic hydrocarbon group, an unsaturated aliphatic hydrocarbon group, and an alicyclic hydrocarbon group.
 Rで表される飽和脂肪族炭化水素基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、n-ペンチル基、イソペンチル基、sec-ペンチル基、neo-ペンチル基、t-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、n-ノニル基、n-デシル基、n-イコサニル基、n-トリアコンタニル基等が挙げられる。また、飽和脂肪族炭化水素基は、その末端部分に後述の脂環式炭化水素基を有するものであってもよい。 Examples of the saturated aliphatic hydrocarbon group represented by R 1 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, and n-pentyl. Group, isopentyl group, sec-pentyl group, neo-pentyl group, t-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-icosanyl group, Examples include an n-triacontanyl group. In addition, the saturated aliphatic hydrocarbon group may have an alicyclic hydrocarbon group described below at the terminal portion.
 Rで表される不飽和脂肪族炭化水素基としては、ビニル基、アリル基等のアルケニル基、エチニル基等のアルキニル基などが挙げられる。また、不飽和脂肪族炭化水素基は、その末端部分に後述の脂環式炭化水素基を有するものであってもよい。 Examples of the unsaturated aliphatic hydrocarbon group represented by R 1 include an alkenyl group such as a vinyl group and an allyl group, and an alkynyl group such as an ethynyl group. Further, the unsaturated aliphatic hydrocarbon group may have an alicyclic hydrocarbon group to be described later at its terminal portion.
 Rで表される脂環式炭化水素基としては、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、ノルボルニル基等のシクロアルキル基、シクロヘキセニル基等のシクロアルケニル基などが挙げられる。また、脂環式炭化水素基は、その脂環に、飽和脂肪族炭化水素基及び不飽和脂肪族炭化水素基からなる群より選択される少なくとも1種を有するものであってもよい。 Examples of the alicyclic hydrocarbon group represented by R 1 include cycloalkyl groups such as cyclohexyl group, cycloheptyl group, cyclooctyl group and norbornyl group, and cycloalkenyl groups such as cyclohexenyl group. The alicyclic hydrocarbon group may have at least one selected from the group consisting of a saturated aliphatic hydrocarbon group and an unsaturated aliphatic hydrocarbon group in the alicyclic ring.
 Rで表される炭化水素基が有し得る置換基は、特に限定されず、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。 The substituent that the hydrocarbon group represented by R 1 may have is not particularly limited, and examples thereof include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
 一般式(II-1)中、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を表す。耐熱性の観点から、Rで表される炭化水素基の炭素数は、1~10であることが好ましく、1~5であることがより好ましい。 In general formula (II-1), each R 2 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. From the viewpoint of heat resistance, the hydrocarbon group represented by R 2 preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms.
 Rで表される炭素数1~30の炭化水素基としては、Rで例示した炭素数1~30の炭化水素基と同様のものが挙げられる。また、Rで表される炭化水素基が有し得る置換基としては、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。 Examples of the hydrocarbon group having 1 to 30 carbon atoms represented by R 2 include those similar to the hydrocarbon group having 1 to 30 carbon atoms exemplified for R 1 . In addition, examples of the substituent that the hydrocarbon group represented by R 2 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
 一般式(II-1)中、mは、それぞれ独立に、0~3の整数を示し、0~2の整数であることが好ましく、0又は1であることがより好ましい。 In general formula (II-1), each m independently represents an integer of 0 to 3, preferably an integer of 0 to 2, and more preferably 0 or 1.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 一般式(II-2)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示し、Zは酸素原子又は下記一般式一般式(III-1)~(III-7)で表される2価の基を示す。 In general formula (II-2), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents a substituted group. A hydrocarbon group having 1 to 30 carbon atoms which may have a group; m independently represents an integer of 0 to 3; Z is an oxygen atom or the following general formula (III-1): And a divalent group represented by (III-7).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 一般式(III-1)~(III-7)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、R及びRは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を表す。mは、それぞれ独立に、0~3の整数を示し、nは、それぞれ独立に、0~4の整数を示し、pは、それぞれ独立に、0~2の整数を示す。 In general formulas (III-1) to (III-7), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and R 2 represents Each independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 3 and R 4 each independently represents a carbon atom which may have a hydrogen atom or a substituent. Represents a hydrocarbon group of 1 to 30. m independently represents an integer of 0 to 3, n independently represents an integer of 0 to 4, and p independently represents an integer of 0 to 2, respectively.
 一般式(III-1)におけるR及びRは、耐熱性の観点から、置換基を有していてもよい炭素数1~5の炭化水素基であることが好ましい。R及びRで表される炭素数1~30の炭化水素基としては、一般式(II-1)中のRで例示した炭素数1~30の炭化水素基と同様のものが挙げられる。また、R及びRが有し得る置換基としては、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。 R 3 and R 4 in the general formula (III-1) are preferably a hydrocarbon group having 1 to 5 carbon atoms which may have a substituent from the viewpoint of heat resistance. Examples of the hydrocarbon group having 1 to 30 carbon atoms represented by R 3 and R 4 include the same hydrocarbon groups having 1 to 30 carbon atoms as exemplified for R 1 in the general formula (II-1). It is done. Examples of the substituent that R 3 and R 4 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
 一般式(III-2)及び(III-3)におけるnは、それぞれ独立に、0~4の整数を示し、0~2の整数であることが好ましく、0又は1であることがより好ましい。
 一般式(III-4)、(III-5)及び(III-7)におけるpは、それぞれ独立に、0~2の整数を示し、0又は1であることが好ましい。
N in the general formulas (III-2) and (III-3) each independently represents an integer of 0 to 4, preferably an integer of 0 to 2, and more preferably 0 or 1.
P in the general formulas (III-4), (III-5) and (III-7) each independently represents an integer of 0 to 2, and is preferably 0 or 1.
 一般式(II-2)中のR、R、及びmのそれぞれの詳細は、一般式(II-1)中のR、R、及びmと同様である。 Each of the details of the R 1, R 2, and m in formula (II-2), is the same as R 1, R 2, and m in Formula (II-1).
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 一般式(II-3)中、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、nは、それぞれ独立に、0~4の整数を示す。
 耐熱性の観点から、Rで表される炭化水素基の炭素数は、1~10であることが好ましく、1~5であることがより好ましい。
 Rで表される炭素数1~30の炭化水素基としては、一般式(II-1)中のRで例示した炭素数1~30の炭化水素基と同様のものが挙げられる。また、Rが有し得る置換基としては、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。
In general formula (II-3), each R 5 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and n is each independently an integer of 0 to 4 Indicates.
From the viewpoint of heat resistance, the hydrocarbon group represented by R 5 preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms.
Examples of the hydrocarbon group having 1 to 30 carbon atoms represented by R 5 include the same hydrocarbon groups having 1 to 30 carbon atoms as exemplified for R 1 in formula (II-1). Examples of the substituent that R 5 may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms.
 一般式(II-3)中、nは、それぞれ独立に、0~4の整数を示し、1~4の整数であることが好ましく、1~3の整数であることがより好ましく、1又は2であることがさらに好ましい。 In general formula (II-3), each n independently represents an integer of 0 to 4, preferably an integer of 1 to 4, more preferably an integer of 1 to 3, or 1 or 2. More preferably.
 一般式(I)において、Yは、それぞれ独立に、置換基を有していてもよい炭素数1~30の2価の炭化水素基を表す。Yで表される炭化水素基の炭素数は、1~30であり、4~30であることが好ましく、耐熱性の観点からは、6~30であることがより好ましい。 In the general formula (I), each Y independently represents a divalent hydrocarbon group having 1 to 30 carbon atoms which may have a substituent. The hydrocarbon group represented by Y has 1 to 30 carbon atoms, preferably 4 to 30 carbon atoms, and more preferably 6 to 30 carbon atoms from the viewpoint of heat resistance.
 Yで表される炭化水素基は、透明性の観点から、飽和炭化水素基を含むことが好ましい。飽和炭化水素基は、飽和脂肪族炭化水素基であっても、飽和脂環式炭化水素基であってもよい。より高い耐熱性と透明性の両立の観点から、Yで表される炭化水素基は、飽和脂環式炭化水素基を含むことが好ましい。脂環式炭化水素基は、炭素数が同じ脂肪族炭化水素基に比べて嵩高いため、高い耐熱性と透明性を維持したまま、含窒素化合物及び溶剤への溶解性に優れる傾向にある。
 また、Yで表される炭化水素基は、複数種の飽和脂肪族炭化水素基、又は、複数種の飽和脂環式炭化水素基を含んでいてもよい。また、Yは、飽和脂肪族炭化水素基と、飽和脂環式炭化水素基と、を組み合わせて含んでいてもよい。
The hydrocarbon group represented by Y preferably contains a saturated hydrocarbon group from the viewpoint of transparency. The saturated hydrocarbon group may be a saturated aliphatic hydrocarbon group or a saturated alicyclic hydrocarbon group. From the viewpoint of achieving both higher heat resistance and transparency, the hydrocarbon group represented by Y preferably includes a saturated alicyclic hydrocarbon group. Since the alicyclic hydrocarbon group is bulky as compared with the aliphatic hydrocarbon group having the same carbon number, it tends to be excellent in solubility in a nitrogen-containing compound and a solvent while maintaining high heat resistance and transparency.
Moreover, the hydrocarbon group represented by Y may include a plurality of types of saturated aliphatic hydrocarbon groups or a plurality of types of saturated alicyclic hydrocarbon groups. Y may contain a combination of a saturated aliphatic hydrocarbon group and a saturated alicyclic hydrocarbon group.
 Yで表される飽和脂肪族炭化水素基の炭素数は、1~30であり、3~30であることが好ましい。
 飽和脂肪族炭化水素基としては、メチレン基、エチレン基、トリメチレン基、メチルエチレン基、テトラメチレン基、1-メチルトリメチレン基、2-メチルトリメチレン基、エチルエチレン基、1,1-ジメチルエチレン基、1,2-ジメチルエチレン基、ペンチレン基、1-メチルテトラメチレン基、2-メチルテトラメチレン基、1-エチルトリメチレン基、2-エチルトリメチレン基、1,1-ジメチルトリメチレン基、2,2-ジメチルトリメチレン基、1,2-ジメチルトリメチレン基、プロピルエチレン基、エチルメチルエチレン基、ヘキシレン基、1-メチルペンチレン基、2-メチルペンチレン基、3-メチルペンチレン基、1-エチルテトラメチレン基、2-エチルテトラメチレン基、1-プロピルトリメチレン基、2-プロピルトリメチレン基、ブチルエチレン基、1,1-ジメチルテトラメチレン基、2,2-ジメチルテトラメチレン基、1,2-ジメチルテトラメチレン基、1,3-ジメチルテトラメチレン基、1,4-ジメチルテトラメチレン基、1,2,3-トリメチルトリメチレン基、1,1,2-トリメチルトリメチレン基、1,1,3-トリメチルトリメチレン基、1,2,2-トリメチルトリメチレン基、1-エチル-1-メチルトリメチレン基、2-エチル-2-メチルトリメチレン基、1-エチル-2-メチルトリメチレン基、2-エチル-1-メチルトリメチレン基、2,2-エチルメチルトリメチレン基、ヘプチレン基、オクチレン基、ノニレン基、デシレン基、イコサニレン基、トリアコンタニレン基等が挙げられる。
The saturated aliphatic hydrocarbon group represented by Y has 1 to 30 carbon atoms, and preferably 3 to 30 carbon atoms.
Saturated aliphatic hydrocarbon groups include methylene, ethylene, trimethylene, methylethylene, tetramethylene, 1-methyltrimethylene, 2-methyltrimethylene, ethylethylene, 1,1-dimethylethylene Group, 1,2-dimethylethylene group, pentylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1-ethyltrimethylene group, 2-ethyltrimethylene group, 1,1-dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, propylethylene group, ethylmethylethylene group, hexylene group, 1-methylpentylene group, 2-methylpentylene group, 3-methylpentylene group 1-ethyltetramethylene group, 2-ethyltetramethylene group, 1-propyltrimethylene group, 2 Propyl trimethylene group, butyl ethylene group, 1,1-dimethyltetramethylene group, 2,2-dimethyltetramethylene group, 1,2-dimethyltetramethylene group, 1,3-dimethyltetramethylene group, 1,4-dimethyl Tetramethylene group, 1,2,3-trimethyltrimethylene group, 1,1,2-trimethyltrimethylene group, 1,1,3-trimethyltrimethylene group, 1,2,2-trimethyltrimethylene group, 1- Ethyl-1-methyltrimethylene group, 2-ethyl-2-methyltrimethylene group, 1-ethyl-2-methyltrimethylene group, 2-ethyl-1-methyltrimethylene group, 2,2-ethylmethyltrimethylene group Group, heptylene group, octylene group, nonylene group, decylene group, icosanylene group, triacontanilene group and the like.
 耐熱性の観点から、飽和脂肪族炭化水素基としては、好ましくは、ヘキシレン基、メチルペンチレン基、エチルテトラメチレン基、プロピルトリメチレン基、ブチルエチレン基、ジメチルテトラメチレン基、トリメチルトリメチレン基、エチルメチルトリメチレン基、ヘプチレン基、オクチレン基、ノニレン基、デシレン基、イコサニレン基、トリアコンタニレン基等が挙げられる。 From the viewpoint of heat resistance, the saturated aliphatic hydrocarbon group is preferably a hexylene group, a methylpentylene group, an ethyltetramethylene group, a propyltrimethylene group, a butylethylene group, a dimethyltetramethylene group, a trimethyltrimethylene group, Examples thereof include an ethylmethyltrimethylene group, a heptylene group, an octylene group, a nonylene group, a decylene group, an icosanylene group, and a triacontanilene group.
 Yで表される飽和脂環式炭化水素基の炭素数は、3~30であり、4~30であることが好ましく、6~30であることがより好ましい。
 飽和脂環式炭化水素基としては、シクロプロパン骨格、シクロブタン骨格、シクロペンタン骨格、シクロヘキサン骨格、シクロヘプタン骨格、シクロオクタン骨格、キュバン骨格、ノルボルナン骨格、トリシクロ[5.2.1.0]デカン骨格、アダマンタン骨格、ジアダマンタン骨格、ビシクロ[2.2.2]オクタン骨格、デカヒドロナフタレン骨格等を有する2価の基が挙げられる。
The saturated alicyclic hydrocarbon group represented by Y has 3 to 30 carbon atoms, preferably 4 to 30 carbon atoms, more preferably 6 to 30 carbon atoms.
The saturated alicyclic hydrocarbon group includes a cyclopropane skeleton, a cyclobutane skeleton, a cyclopentane skeleton, a cyclohexane skeleton, a cycloheptane skeleton, a cyclooctane skeleton, a cubane skeleton, a norbornane skeleton, and a tricyclo [5.2.1.0] decane skeleton. , A divalent group having an adamantane skeleton, a diadamantane skeleton, a bicyclo [2.2.2] octane skeleton, a decahydronaphthalene skeleton, or the like.
 耐熱性の観点から、飽和脂環式炭化水素基として、好ましくは、シクロヘキサン骨格、シクロヘプタン骨格、シクロオクタン骨格、キュバン骨格、ノルボルナン骨格、トリシクロ[5.2.1.0]デカン骨格、アダマンタン骨格、ジアダマンタン骨格、ビシクロ[2.2.2]オクタン骨格、デカヒドロナフタレン骨格等の2価の基が挙げられる。 From the viewpoint of heat resistance, the saturated alicyclic hydrocarbon group is preferably a cyclohexane skeleton, a cycloheptane skeleton, a cyclooctane skeleton, a cubane skeleton, a norbornane skeleton, a tricyclo [5.2.1.0] decane skeleton, or an adamantane skeleton. And divalent groups such as a diadamantane skeleton, a bicyclo [2.2.2] octane skeleton, and a decahydronaphthalene skeleton.
 Yで表される炭化水素基が有し得る置換基としては、アミノ基、オキソ基、水酸基、ハロゲン原子等が挙げられる。 Examples of the substituent that the hydrocarbon group represented by Y may have include an amino group, an oxo group, a hydroxyl group, and a halogen atom.
 Yは、下記一般式(IV)及び下記一般式(V-1)~(V-3)からなる群より選択される少なくとも1種で表される2価の基を少なくとも含むことが好ましく、下記一般式(IV)で表される2価の炭化水素基を少なくとも含むことがより好ましい。 Y preferably contains at least a divalent group represented by at least one selected from the group consisting of the following general formula (IV) and the following general formulas (V-1) to (V-3). More preferably, it contains at least a divalent hydrocarbon group represented by the general formula (IV).
Figure JPOXMLDOC01-appb-C000017

 
Figure JPOXMLDOC01-appb-C000017

 
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 一般式(IV)におけるアダマンタン骨格の水素原子、一般式(V-1)におけるシクロヘキサン骨格の水素原子、一般式(V-2)におけるデカリン骨格の水素原子、及び一般式(V-3)におけるノルボルナン骨格の水素原子は、それぞれ炭化水素基、アミノ基、オキソ基、水酸基又はハロゲン原子で置換されていてもよい。また、一般式(IV)中、Zは、それぞれ独立に、単結合、又は、置換基を有していてもよい炭素数1~10の2価の飽和炭化水素基を表す。
 柔軟な硬化膜が得られる観点からは、Zは、それぞれ独立に、置換基を有していてもよい炭素数1~10の2価の飽和炭化水素基であることが好ましく、耐熱性の観点から、Zは炭素数1~5の2価の飽和炭化水素基であることが好ましい。
Hydrogen atom of adamantane skeleton in general formula (IV), hydrogen atom of cyclohexane skeleton in general formula (V-1), hydrogen atom of decalin skeleton in general formula (V-2), and norbornane in general formula (V-3) The hydrogen atom of the skeleton may be substituted with a hydrocarbon group, an amino group, an oxo group, a hydroxyl group or a halogen atom, respectively. In general formula (IV), each Z independently represents a single bond or a divalent saturated hydrocarbon group having 1 to 10 carbon atoms which may have a substituent.
From the viewpoint of obtaining a flexible cured film, each Z is preferably independently a divalent saturated hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, from the viewpoint of heat resistance. Therefore, Z is preferably a divalent saturated hydrocarbon group having 1 to 5 carbon atoms.
 Zで表される2価の飽和炭化水素基としては、メチレン基、エチレン基、トリメチレン基、メチルエチレン基、テトラメチレン基、1-メチルトリメチレン基、2-メチルトリメチレン基、エチルエチレン基、1,1-ジメチルエチレン基、1,2-ジメチルエチレン基、ペンチレン基、1-メチルテトラメチレン基、2-メチルテトラメチレン基、1-エチルトリメチレン基、2-エチルトリメチレン基、1,1-ジメチルトリメチレン基、2,2-ジメチルトリメチレン基、1,2-ジメチルトリメチレン基、プロピルエチレン基、エチルメチルエチレン基、ヘキシレン基、1-メチルペンチレン基、2-メチルペンチレン基、3-メチルペンチレン基、1-エチルテトラメチレン基、2-エチルテトラメチレン基、1-プロピルトリメチレン基、2-プロピルトリメチレン基、ブチルエチレン基、1,1-ジメチルテトラメチレン基、2,2-ジメチルテトラメチレン基、1,2-ジメチルテトラメチレン基、1,3-ジメチルテトラメチレン基、1,4-ジメチルテトラメチレン基、1,2,3-トリメチルトリメチレン基、1,1,2-トリメチルトリメチレン基、1,1,3-トリメチルトリメチレン基、1,2,2-トリメチルトリメチレン基、1-エチル-1-メチルトリメチレン基、2-エチル-2-メチルトリメチレン基、1-エチル-2-メチルトリメチレン基、2-エチル-1-メチルトリメチレン基、ヘプチレン基、オクチレン基、ノニレン基、デシレン基等が挙げられる。 Examples of the divalent saturated hydrocarbon group represented by Z include a methylene group, an ethylene group, a trimethylene group, a methylethylene group, a tetramethylene group, a 1-methyltrimethylene group, a 2-methyltrimethylene group, an ethylethylene group, 1,1-dimethylethylene group, 1,2-dimethylethylene group, pentylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1-ethyltrimethylene group, 2-ethyltrimethylene group, 1,1 -Dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, propylethylene group, ethylmethylethylene group, hexylene group, 1-methylpentylene group, 2-methylpentylene group, 3-methylpentylene group, 1-ethyltetramethylene group, 2-ethyltetramethylene group, 1-propyltrimethyl group Tylene group, 2-propyltrimethylene group, butylethylene group, 1,1-dimethyltetramethylene group, 2,2-dimethyltetramethylene group, 1,2-dimethyltetramethylene group, 1,3-dimethyltetramethylene group, 1,4-dimethyltetramethylene group, 1,2,3-trimethyltrimethylene group, 1,1,2-trimethyltrimethylene group, 1,1,3-trimethyltrimethylene group, 1,2,2-trimethyltrimethyl group Methylene group, 1-ethyl-1-methyltrimethylene group, 2-ethyl-2-methyltrimethylene group, 1-ethyl-2-methyltrimethylene group, 2-ethyl-1-methyltrimethylene group, heptylene group, Examples include octylene group, nonylene group, decylene group and the like.
 Zが有し得る置換基としては、ハロゲン原子、炭素数1~5のアルコキシ基、炭素数2~5のアシル基等が挙げられる。なお、Zが置換基を有する場合、Zの2価の飽和炭化水素基の炭素数には置換基の炭素数を含めないものとする。 Examples of the substituent that Z may have include a halogen atom, an alkoxy group having 1 to 5 carbon atoms, and an acyl group having 2 to 5 carbon atoms. When Z has a substituent, the carbon number of the divalent saturated hydrocarbon group of Z does not include the carbon number of the substituent.
 一般式(V-3)で表される2価の基は、下記一般式(VI-1)であってもよい。 The divalent group represented by the general formula (V-3) may be the following general formula (VI-1).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 Yは、上記一般式(IV)と、上記一般式(V-1)~(V-3)からなる群より選択される少なくとも1種の2価の基と、の両方を含んでもよい。Yが、上記一般式(IV)と、上記一般式(V-1)~(V-3)からなる群より選択される少なくとも1種の基と、の両方を含むとき、一般式(IV)の含有量と、一般式(V-1)~(V-3)の総含有量との質量比((IV):(V-1)~(V-3))は特に限定されない。耐熱性及び伸び率の観点から、前記質量比は5:95~95:5であることが好ましく、耐熱性及び溶解性の観点から、5:95~90:10であることがより好ましい。 Y may include both the general formula (IV) and at least one divalent group selected from the group consisting of the general formulas (V-1) to (V-3). When Y includes both the general formula (IV) and at least one group selected from the group consisting of the general formulas (V-1) to (V-3), the general formula (IV) And the mass ratio ((IV) :( V-1) to (V-3)) of the total content of general formulas (V-1) to (V-3) is not particularly limited. From the viewpoints of heat resistance and elongation, the mass ratio is preferably 5:95 to 95: 5, and more preferably 5:95 to 90:10 from the viewpoint of heat resistance and solubility.
 特定ポリケトンは、市販品であっても、公知の方法によって合成されたものであってもよい。 The specific polyketone may be a commercially available product or may be synthesized by a known method.
 特定ポリケトンの重量平均分子量(Mw)は、耐熱性を維持する観点から、ポリスチレン換算の標準GPC(ゲル浸透クロマトグラフ、gel permeation chromatography)で500以上であることが好ましく、より高い耐熱性と、含窒素化合物及び溶剤への溶解性の観点から、10,000~1,000,000であることがより好ましい。さらに高い耐熱性が必要な場合には、重量平均分子量(Mw)は、20,000~1,000,000であることがさらに好ましい。特定ポリケトンの重量平均分子量(Mw)は、実施例に記載の方法で測定した値をいう。 The weight average molecular weight (Mw) of the specific polyketone is preferably 500 or more in terms of polystyrene standard GPC (gel permeation chromatograph) from the viewpoint of maintaining heat resistance. From the viewpoint of solubility in a nitrogen compound and a solvent, it is more preferably 10,000 to 1,000,000. When higher heat resistance is required, the weight average molecular weight (Mw) is more preferably 20,000 to 1,000,000. The weight average molecular weight (Mw) of the specific polyketone refers to a value measured by the method described in Examples.
 特定ポリケトンは、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
 また、ポリケトン組成物は、特定ポリケトン以外の他のポリケトンを含んでいてもよい。以降、特定ポリケトンと他のポリケトンを総称して「ポリケトン」という場合がある。硬化膜としたときの耐熱性、透明性、及び耐薬品性の観点からは、ポリケトンの総量に対する特定ポリケトンの含有率は、50質量%以上であることが好ましく、60質量%以上であることがより好ましく、70質量%以上であることがさらに好ましい。
Specific polyketone may be used individually by 1 type, and may be used in combination of 2 or more type.
Moreover, the polyketone composition may contain other polyketones other than the specific polyketone. Hereinafter, the specific polyketone and other polyketones may be collectively referred to as “polyketone”. From the viewpoint of heat resistance, transparency, and chemical resistance when a cured film is used, the content of the specific polyketone relative to the total amount of polyketone is preferably 50% by mass or more, and preferably 60% by mass or more. More preferably, it is more preferably 70% by mass or more.
 硬化膜としたときの耐熱性、透明性及び耐薬品性の観点から、ポリケトンの総含有量は、ポリケトン及び含窒素化合物の合計量100質量部に対して、50質量部~99質量部であることが好ましく、50質量部~95質量部であることがより好ましい。 From the viewpoint of heat resistance, transparency and chemical resistance when used as a cured film, the total content of polyketone is 50 to 99 parts by mass with respect to 100 parts by mass of the total amount of polyketone and nitrogen-containing compound. It is preferably 50 parts by mass to 95 parts by mass.
<特定含窒素化合物>
 本実施形態のポリケトン組成物は、窒素原子と、前記窒素原子と結合するヒドロキシメチル基又はアルコキシメチル基と、を有する含窒素化合物(特定含窒素化合物)を含有する。
 特定含窒素化合物は、ヒドロキシメチル基とアルコキシメチル基の両方を有する化合物又はヒドロキシメチル基を有さずアルコキシメチル基を有する化合物が好ましく、ヒドロキシメチル基を有さずアルコキシメチル基を有する化合物がより好ましい。
<Specific nitrogen-containing compounds>
The polyketone composition of the present embodiment contains a nitrogen-containing compound (specific nitrogen-containing compound) having a nitrogen atom and a hydroxymethyl group or an alkoxymethyl group bonded to the nitrogen atom.
The specific nitrogen-containing compound is preferably a compound having both a hydroxymethyl group and an alkoxymethyl group, or a compound having no hydroxymethyl group and having an alkoxymethyl group, more preferably a compound having no hydroxymethyl group and having an alkoxymethyl group. preferable.
 特定含窒素化合物の分子中に含まれるヒドロキシメチル基及びアルコキシメチル基の総数は、1個以上であれば特に制限されない。分子中に含まれるヒドロキシメチル基及びアルコキシメチル基の総数は、2個~6個であることが好ましく、硬化膜としたときの伸び率及び耐薬品性の観点から、4個~6個であることがより好ましい。 The total number of hydroxymethyl groups and alkoxymethyl groups contained in the molecule of the specific nitrogen-containing compound is not particularly limited as long as it is 1 or more. The total number of hydroxymethyl groups and alkoxymethyl groups contained in the molecule is preferably 2 to 6, and 4 to 6 from the viewpoint of elongation and chemical resistance when used as a cured film. It is more preferable.
 アルコキシメチル基におけるアルコキシ基の炭素数は、1~30であることが好ましく、1~15であることがより好ましく、1~10であることがさらに好ましく、1~3であることが特に好ましく、1であることが極めて好ましい。 The number of carbon atoms of the alkoxy group in the alkoxymethyl group is preferably 1-30, more preferably 1-15, still more preferably 1-10, and particularly preferably 1-3. 1 is very particularly preferred.
 特定含窒素化合物としては、下記一般式(VII-1)及び(VII-2)で表される化合物が挙げられる。 Specific nitrogen-containing compounds include compounds represented by the following general formulas (VII-1) and (VII-2).
Figure JPOXMLDOC01-appb-C000022

 
Figure JPOXMLDOC01-appb-C000022

 
 一般式(VII-1)中、Aはn価の有機基を表し、W及びWは、それぞれ独立に、水素原子又は下記一般式(VIII-1)若しくは(VIII-2)で表される基であり、nは2又は3を表す。但し、複数のW及びWのうち、少なくとも1つは、下記一般式(VIII-1)又は(VIII-2)で表される基であり、複数のW及びWのうちの2以上が、下記一般式(VIII-1)又は(VIII-2)で表される基であることが好ましい。 In general formula (VII-1), A represents an n-valent organic group, and W 1 and W 2 are each independently a hydrogen atom or the following general formula (VIII-1) or (VIII-2) N represents 2 or 3. However, among the plurality of W 1 and W 2, at least one is a group represented by the following general formula (VIII-1) or (VIII-2), 2 of the plurality of W 1 and W 2 The above is preferably a group represented by the following general formula (VIII-1) or (VIII-2).
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 一般式(VIII-2)中、Rは置換基を有していてもよい炭素数1~30のアルキル基を表す。Rで表されるアルキル基の炭素数は、1~30であることが好ましく、1~15であることがより好ましく、1~10であることがさらに好ましく、1~3であることが特に好ましく、1であることが極めて好ましい。 In general formula (VIII-2), R 1 represents an alkyl group having 1 to 30 carbon atoms which may have a substituent. The alkyl group represented by R 1 preferably has 1 to 30 carbon atoms, more preferably 1 to 15 carbon atoms, still more preferably 1 to 10 carbon atoms, and particularly preferably 1 to 3 carbon atoms. 1 is very preferable.
 一般式(VII-1)中、Aで表される有機基としては、例えば、下記一般式(IX-1)及び(IX-2)で表される基が挙げられる。 In the general formula (VII-1), examples of the organic group represented by A include groups represented by the following general formulas (IX-1) and (IX-2).
Figure JPOXMLDOC01-appb-C000024

 
Figure JPOXMLDOC01-appb-C000024

 
 一般式(VII-2)中、W~Wは、それぞれ独立に、水素原子又は上記一般式(VIII-1)又は(VIII-2)で表される基である。但し、W~Wのうち、少なくとも1つは、下記一般式(VIII-1)又は(VIII-2)で表される基であり、W~Wのうちの2以上が、下記一般式(VIII-1)又は(VIII-2)で表される基であることが好ましい。 In general formula (VII-2), W 3 to W 6 are each independently a hydrogen atom or a group represented by general formula (VIII-1) or (VIII-2). However, among the W 3 ~ W 6, at least one is a group represented by the following general formula (VIII-1) or (VIII-2), 2 or more of W 3 ~ W 6 is the following A group represented by the general formula (VIII-1) or (VIII-2) is preferable.
 特定含窒素化合物としては、下記一般式(X-1)~(X-3)で表される化合物を例示することができる。 Examples of the specific nitrogen-containing compound include compounds represented by the following general formulas (X-1) to (X-3).
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 一般式(X-1)~(X-3)中、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30のアルキル基を表す。Rの詳細は、一般式(VIII-2)におけるRと同様である。 In the general formulas (X-1) to (X-3), each R 1 independently represents an alkyl group having 1 to 30 carbon atoms which may have a substituent. Details of R 1, is the same as R 1 in the general formula (VIII-2).
 特定含窒素化合物は、単量体又はオリゴマーであってもよく、単量体とオリゴマーの混合物であってもよい。オリゴマーとしては、例えば、単量体が自己反応して形成されるものが挙げられる。 The specific nitrogen-containing compound may be a monomer or an oligomer, or a mixture of a monomer and an oligomer. Examples of oligomers include those formed by self-reaction of monomers.
 特定含窒素化合物は1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。特定含窒素化合物の含有量は、硬化膜としたときの耐熱性、透明性、及び耐薬品性の観点から、ポリケトン及び特定含窒素化合物の合計量100質量部に対して、1質量部~50質量部であることが好ましく、5質量部~50質量部であることがより好ましく、5質量部~20質量部であることがさらに好ましい。 The specific nitrogen-containing compound may be used alone or in combination of two or more. The content of the specific nitrogen-containing compound is from 1 part by mass to 50 parts per 100 parts by mass of the total amount of the polyketone and the specific nitrogen-containing compound from the viewpoint of heat resistance, transparency, and chemical resistance when used as a cured film. The mass is preferably 5 parts by mass, more preferably 5 parts by mass to 50 parts by mass, and still more preferably 5 parts by mass to 20 parts by mass.
<熱潜在酸発生剤>
 ポリケトン組成物は、さらに熱潜在酸発生剤を含有してもよい。熱潜在酸発生剤は、加熱により酸を発生する化合物である。ポリケトン組成物が熱潜在酸発生剤を含有すると、特定含窒素化合物による架橋反応が促進され、より強固な硬化物を得ることが可能となるため、硬化膜の耐薬品性が向上する傾向にある。
<Heat latent acid generator>
The polyketone composition may further contain a thermal latent acid generator. The thermal latent acid generator is a compound that generates an acid by heating. When the polyketone composition contains a thermal latent acid generator, the crosslinking reaction by the specific nitrogen-containing compound is promoted, and a stronger cured product can be obtained, so that the chemical resistance of the cured film tends to be improved. .
 熱潜在酸発生剤から発生する酸としては、p-トルエンスルホン酸、ベンゼンスルホン酸等のアリールスルホン酸、(±)-10-カンファースルホン酸、トリフルオロメタンスルホン酸、ノナフルオロブタンスルホン酸等のパーフルオロアルキルスルホン酸、メタンスルホン酸、エタンスルホン酸、ブタンスルホン酸等のアルキルスルホン酸などが挙げられる。 Examples of the acid generated from the thermal latent acid generator include aryl sulfonic acids such as p-toluenesulfonic acid and benzenesulfonic acid, and paroxyls such as (±) -10-camphorsulfonic acid, trifluoromethanesulfonic acid, and nonafluorobutanesulfonic acid. Examples thereof include alkyl sulfonic acids such as fluoroalkyl sulfonic acid, methane sulfonic acid, ethane sulfonic acid, and butane sulfonic acid.
 熱潜在酸発生剤は、1種を単独で使用してもよく、2種以上を組み合わせて使用してもよい。熱潜在酸発生剤の含有量は、ポリケトン、含窒素化合物、及び熱潜在酸発生剤の合計量100質量部に対して、0.05質量部~30質量部であることが好ましく、0.1質量部~20質量部であることがより好ましく、0.2質量部~10質量部であることがさらに好ましい。 The thermal latent acid generator may be used alone or in combination of two or more. The content of the thermal latent acid generator is preferably 0.05 to 30 parts by mass with respect to 100 parts by mass of the total amount of the polyketone, the nitrogen-containing compound, and the thermal latent acid generator. More preferably, it is from 20 parts by weight to 20 parts by weight, and even more preferably from 0.2 to 10 parts by weight.
<溶剤>
 ポリケトン組成物は、さらに溶剤を含有してもよい。溶剤は、各成分を溶解又は分散するものであれば特に制限されない。溶剤としては、γ-ブチロラクトン、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、酢酸ブチル、酢酸ベンジル、n-ブチルアセテート、エトキシエチルプロピオネート、3-メチルメトキシプロピオネート、N-メチル-2-ピロリドン、N-シクロヘキシル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、ヘキサメチルホスホリルアミド、テトラメチレンスルホン、ジエチルケトン、ジイソブチルケトン、メチルアミルケトン、シクロペンタノン、シクロヘキサノン、プロピレングリコールモノメチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、キシレン、メシチレン、エチルベンゼン、プロピルベンゼン、クメン、ジイソプロピルベンゼン、ヘキシルベンゼン、アニソール、ジグライム、ジメチルスルホキシド、クロロホルム、ジクロロメタン、ジクロロエタン、クロロベンゼン等が挙げられる。これらの溶剤は1種を単独で使用してもよく、又は2種以上を組み合わせて使用してもよい。
<Solvent>
The polyketone composition may further contain a solvent. The solvent is not particularly limited as long as it dissolves or disperses each component. Solvents include γ-butyrolactone, ethyl lactate, propylene glycol monomethyl ether acetate, butyl acetate, benzyl acetate, n-butyl acetate, ethoxyethyl propionate, 3-methylmethoxypropionate, N-methyl-2-pyrrolidone, N-cyclohexyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, hexamethylphosphorylamide, tetramethylene sulfone, diethyl ketone, diisobutyl ketone, methyl amyl ketone, cyclopentanone, cyclohexanone, propylene glycol monomethyl Ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, xylene, mesitylene, ether Rubenzen, propylbenzene, cumene, diisopropylbenzene, hexyl benzene, anisole, diglyme, dimethyl sulfoxide, chloroform, dichloromethane, dichloroethane, chlorobenzene and the like. These solvents may be used alone or in combination of two or more.
 ポリケトン組成物が溶剤を含有する場合、溶剤の含有量は、ポリケトン、含窒素化合物、並びに、必要に応じて含有する潜在熱酸発生剤、及び溶剤の合計量100質量部に対して、5質量部~95質量部であることが好ましく、10質量部~90質量部であることがより好ましい。 When the polyketone composition contains a solvent, the content of the solvent is 5 mass with respect to 100 mass parts of the total amount of the polyketone, the nitrogen-containing compound, and the latent thermal acid generator contained as necessary, and the solvent. Part to 95 parts by weight, preferably 10 parts to 90 parts by weight.
<その他の添加剤>
 ポリケトン組成物は、さらにその他の添加剤を含有してもよい。その他の添加剤としては、接着助剤、界面活性剤、レベリング剤、酸化防止剤、紫外線劣化防止剤等が挙げられる。
<Other additives>
The polyketone composition may further contain other additives. Examples of other additives include adhesion assistants, surfactants, leveling agents, antioxidants, and UV degradation inhibitors.
<ポリケトン硬化物>
 本実施形態のポリケトン硬化物は、本実施形態のポリケトン組成物の硬化物である。
 ポリケトン硬化物は、例えば、以下の方法で作製することができる。まず、ポリケトン組成物を基材の表面の少なくとも一部に付与して組成物層を形成する。ポリケトン組成物を基材に付与する方法としては、組成物層を基材上の任意の場所に任意の形状で形成可能な手法であれば特に限定されない。ポリケトン組成物を基材に付与する方法としては、例えば、浸漬法、スプレー法、スクリーン印刷法、回転塗布法、スピンコート法、及びバーコート法が挙げられる。
<Polyketone cured product>
The polyketone cured product of the present embodiment is a cured product of the polyketone composition of the present embodiment.
The polyketone cured product can be produced, for example, by the following method. First, the polyketone composition is applied to at least a part of the surface of the substrate to form a composition layer. The method for applying the polyketone composition to the substrate is not particularly limited as long as the composition layer can be formed in an arbitrary shape at an arbitrary location on the substrate. Examples of the method for applying the polyketone composition to the substrate include an immersion method, a spray method, a screen printing method, a spin coating method, a spin coating method, and a bar coating method.
 ポリケトン組成物を付与する基材は特に限定されず、ガラス、半導体、金属酸化物絶縁体(酸化チタン、酸化ケイ素等)、窒化ケイ素等の無機材料、トリアセチルセルロース、透明ポリイミド、ポリカルボナート、アクリル系ポリマー、シクロオレフィン樹脂などの透明樹脂で構成される透明基材を例示することができる。基材の形状は特に限定されず、板状又はフィルム状であってもよい。本実施形態のポリケトン組成物は、硬化膜としたときに高い伸び率を示し、耐薬品性に優れるため、基材のコート材、成形品等として好適に用いることができる。 The base material to which the polyketone composition is applied is not particularly limited, and glass, semiconductor, metal oxide insulator (titanium oxide, silicon oxide, etc.), inorganic materials such as silicon nitride, triacetyl cellulose, transparent polyimide, polycarbonate, Examples thereof include a transparent substrate composed of a transparent resin such as an acrylic polymer and a cycloolefin resin. The shape of the substrate is not particularly limited, and may be a plate shape or a film shape. Since the polyketone composition of the present embodiment exhibits a high elongation when it is used as a cured film and is excellent in chemical resistance, it can be suitably used as a coating material for a substrate, a molded product, and the like.
 ポリケトン組成物が溶剤を含有する場合には、硬化前後に乾燥を行ってもよい。乾燥方法は特に限定されず、例えば、ホットプレート、オーブン等の装置を用いて熱処理する方法が挙げられる。乾燥の条件は、ポリケトン組成物中の溶剤が充分に揮散する条件であれば特に制限はなく、通常、50℃~150℃で、1分間~90分間程度である。 When the polyketone composition contains a solvent, it may be dried before and after curing. The drying method is not particularly limited, and examples thereof include a heat treatment method using an apparatus such as a hot plate or an oven. The drying conditions are not particularly limited as long as the solvent in the polyketone composition is sufficiently volatilized, and is usually about 50 to 150 ° C. for about 1 to 90 minutes.
 組成物層を形成した後、硬化してポリケトン硬化物を得る。硬化方法は特に制限されず、熱処理等により硬化することができる。熱処理による硬化は、箱型乾燥機、熱風式コンベアー型乾燥機、石英チューブ炉、ホットプレート、ラピッドサーマルアニール、縦型拡散炉、赤外線硬化炉、電子線硬化炉、マイクロ波硬化炉等のオーブンを用いて行なうことができる。 After forming the composition layer, it is cured to obtain a polyketone cured product. The curing method is not particularly limited and can be cured by heat treatment or the like. For curing by heat treatment, ovens such as box dryers, hot air conveyor dryers, quartz tube furnaces, hot plates, rapid thermal annealing, vertical diffusion furnaces, infrared curing furnaces, electron beam curing furnaces, microwave curing furnaces, etc. Can be used.
 硬化する際の雰囲気は、大気中又は窒素等の不活性雰囲気中のいずれを選択してもよく、ポリケトン組成物の酸化を防ぐ観点から、窒素雰囲気下で行なうことが好ましい。
 硬化のための熱処理の温度及び時間は、組成条件、作業効率等を鑑みて、任意に設定でき、通常、60℃~200℃で30分~2時間程度である。
The atmosphere for curing may be selected from the air or an inert atmosphere such as nitrogen, and is preferably performed in a nitrogen atmosphere from the viewpoint of preventing oxidation of the polyketone composition.
The temperature and time of the heat treatment for curing can be arbitrarily set in consideration of the composition conditions, work efficiency, etc., and are usually about 60 minutes to 200 ° C. for about 30 minutes to 2 hours.
 得られたポリケトン硬化物は、基材を付けたままポリケトン硬化物付基材として用いることもでき、必要に応じて、基材から剥がして用いることもできる。
 ポリケトン硬化物付基材において、ポリケトン硬化物は、基材の表面の少なくとも一部に設けられていればよく、基材の一方の面のみに設けられても、両面に設けられてもよい。また、ポリケトン硬化物は、一層の単層構造であっても、二層以上が積層された複数層構造であってもよい。
The obtained polyketone cured product can be used as a substrate with a polyketone cured product with the substrate attached, and can be used after being peeled off from the substrate, if necessary.
In the base material with a polyketone cured product, the polyketone cured product may be provided on at least a part of the surface of the base material, and may be provided on only one surface of the base material or on both surfaces. The polyketone cured product may have a single-layer structure or a multi-layer structure in which two or more layers are laminated.
<光学素子及び画像表示装置>
 本実施形態の光学素子及び画像表示装置は、それぞれ本実施形態のポリケトン硬化物を有する。光学素子及び画像表示装置に適用されるポリケトン硬化物は、上述のポリケトン硬化物付基材であってもよい。また、基材が透明基材であれば、光学素子に好適に用いることができる。透明基材としては、ポリケトン硬化物の製造で例示したものが挙げられる。
<Optical element and image display device>
The optical element and the image display device of the present embodiment each have the polyketone cured product of the present embodiment. The polyketone cured product applied to the optical element and the image display device may be the above-described base material with a polyketone cured product. Moreover, if a base material is a transparent base material, it can use suitably for an optical element. Examples of the transparent substrate include those exemplified in the production of the polyketone cured product.
 光学素子及び画像表示装置は、例えば、ポリケトン硬化物付基材における基材側を、粘着剤、接着剤等を介してLCD(液晶ディスプレイ)、ELD(エレクトロルミネッセンスディスプレイ)等の適用箇所に貼り付けて得ることができる。 Optical element and image display device, for example, paste the base material side of the base material with polyketone cured product to the application location such as LCD (Liquid Crystal Display), ELD (Electro Luminescence Display) etc. via adhesive, adhesive, etc. Can be obtained.
 ポリケトン硬化物及びこれを用いた偏光板等の各種光学素子は、液晶表示装置等の各種画像表示装置に好ましく用いることができる。画像表示装置は、本実施形態のポリケトン硬化物を用いる以外は、従来の画像表示装置と同様の構成であってよい。画像表示装置が液晶表示装置である場合は、液晶セル、偏光板等の光学素子、及び必要に応じ照明システム(バックライト等)等の各構成部品を適宜に組み立てて駆動回路を組み込むことなどにより製造できる。液晶セルとしては、特に制限されず、TN型、STN型、π型等の様々なタイプを使用できる。 The polyketone cured product and various optical elements such as a polarizing plate using the polyketone can be preferably used for various image display devices such as a liquid crystal display device. The image display device may have the same configuration as the conventional image display device except that the polyketone cured product of the present embodiment is used. When the image display device is a liquid crystal display device, by appropriately assembling each component such as a liquid crystal cell, an optical element such as a polarizing plate, and an illumination system (backlight, etc.) as necessary, and incorporating a drive circuit, etc. Can be manufactured. The liquid crystal cell is not particularly limited, and various types such as a TN type, an STN type, and a π type can be used.
 画像表示装置の用途としては、デスクトップパソコン、ノートパソコン、コピー機等のOA機器、携帯電話、時計、デジタルカメラ、携帯情報端末(PDA)、携帯ゲーム機等の携帯機器、ビデオカメラ、テレビ、電子レンジ等の家庭用電気機器、バックモニター、カーナビゲーションシステム用モニター、カーオーディオ等の車載用機器、商業店舗用インフォメーション用モニター等の展示機器、監視用モニター等の警備機器、介護用モニタ等の介護機器、及び医療用モニター等の医療機器などが挙げられる。 Applications of image display devices include OA equipment such as desktop personal computers, notebook personal computers, and copiers, mobile phones, watches, digital cameras, personal digital assistants (PDAs), portable devices such as portable game machines, video cameras, televisions, and electronic devices. Household electrical equipment such as a range, back monitor, car navigation system monitor, in-vehicle equipment such as car audio, display equipment such as information monitors for commercial stores, security equipment such as monitoring monitors, nursing care such as nursing monitors Examples thereof include medical devices and medical devices such as medical monitors.
 日本国特許出願2016-153622号の開示は、その全体が参照により本開示に取り込まれる。
 本開示における全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本開示中に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2016-153622 is incorporated herein by reference in its entirety.
All references, patent applications, and technical standards in this disclosure are included in this disclosure to the same extent as if individual references, patent applications, and technical standards were specifically and individually stated to be incorporated by reference. Incorporated by reference.
 以下、本実施形態を実施例により具体的に説明するが、本実施形態はこれらの実施例に限定されるものではない。 Hereinafter, the present embodiment will be specifically described by way of examples, but the present embodiment is not limited to these examples.
<ポリケトン組成物>
 (A)成分~(D)成分を、表1~4に示した割合で配合し、PTFE(ポリテトラフルオロエチレン)製のフィルターで濾過し、実施例及び比較例のポリケトン組成物を得た。括弧内の数値は、配合比(質量部、固形分比)を表す。「-」はその成分を含有しないことを表す。表1~4中の各成分は、以下に示すものである。
<Polyketone composition>
Components (A) to (D) were blended in the proportions shown in Tables 1 to 4 and filtered through a PTFE (polytetrafluoroethylene) filter to obtain polyketone compositions of Examples and Comparative Examples. The numerical value in the parenthesis represents the blending ratio (part by mass, solid content ratio). “-” Indicates that the component is not contained. Each component in Tables 1 to 4 is as follows.
(A)成分
(合成例1)ポリケトンPK-1の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolとcis-1,4-シクロヘキサンジカルボン酸10mmolが入ったフラスコに、五酸化二リン及びメタンスルホン酸の混合液(質量比1:10)を30ml加え、60℃で撹拌した。反応後、内容物をメタノール500ml中に投じ、生成した析出物を濾取した。得られた固体を蒸留水とメタノールで洗浄した後、乾燥し、ポリケトンPK-1を得た。
 得られたポリケトンPK-1の重量平均分子量は20,000、数平均分子量は8,000であった。なお、重量平均分子量及び数平均分子量は、後述の方法で測定し、算出したものである。後述のポリケトンPK-2~ポリケトンPK-15の重量平均分子量(Mw)及び数平均分子量(Mn)についても同様の方法で測定した。
Component (A) (Synthesis Example 1) Synthesis of Polyketone PK-1 As a monomer, a flask containing 10 mmol of 2,2′-dimethoxybiphenyl and 10 mmol of cis-1,4-cyclohexanedicarboxylic acid was charged with diphosphorus pentoxide and methanesulfone. 30 ml of an acid mixture (mass ratio 1:10) was added and stirred at 60 ° C. After the reaction, the content was poured into 500 ml of methanol, and the produced precipitate was collected by filtration. The obtained solid was washed with distilled water and methanol and then dried to obtain polyketone PK-1.
The resulting polyketone PK-1 had a weight average molecular weight of 20,000 and a number average molecular weight of 8,000. In addition, a weight average molecular weight and a number average molecular weight are measured and calculated by the method described later. The weight average molecular weight (Mw) and number average molecular weight (Mn) of polyketone PK-2 to polyketone PK-15 described later were also measured in the same manner.
(合成例2)ポリケトンPK-2の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタンジカルボン酸13mmolを用いた以外は実施例1と同様にして、ポリケトンPK-2を得た。得られたポリケトンPK-2の重量平均分子量は280,000であり、数平均分子量は44,000であった。
Synthesis Example 2 Synthesis of Polyketone PK-2 Polyketone PK-2 was obtained in the same manner as in Example 1, except that 10 mmol of 2,2′-dimethoxybiphenyl and 13 mmol of 1,3-adamantanedicarboxylic acid were used as monomers. It was. The resulting polyketone PK-2 had a weight average molecular weight of 280,000 and a number average molecular weight of 44,000.
(合成例3)ポリケトンPK-3の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸10mmolを用いた以外は実施例1と同様にして、ポリケトンPK-3を得た。得られたポリケトンPK-3の重量平均分子量は42,000であり、数平均分子量は12,000であった。
Synthesis Example 3 Synthesis of Polyketone PK-3 Polyketone PK-3 was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl and 10 mmol of 1,3-adamantanediacetic acid were used as monomers. It was. The resulting polyketone PK-3 had a weight average molecular weight of 42,000 and a number average molecular weight of 12,000.
(合成例4)ポリケトンPK-4の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタンジカルボン酸5mmolとcis-1,4-シクロヘキサンジカルボン酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-4を得た。得られたポリケトンPK-4の重量平均分子量は36,000であり、数平均分子量は12,000であった。
Synthesis Example 4 Synthesis of Polyketone PK-4 Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantane dicarboxylic acid and 5 mmol of cis-1,4-cyclohexanedicarboxylic acid were used as monomers. In the same manner as above, polyketone PK-4 was obtained. The resulting polyketone PK-4 had a weight average molecular weight of 36,000 and a number average molecular weight of 12,000.
(合成例5)ポリケトンPK-5の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタンジカルボン酸5mmolとドデカン二酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-5を得た。得られたポリケトンPK-5の重量平均分子量は36,000であり、数平均分子量は13,000であった。
(Synthesis Example 5) Synthesis of Polyketone PK-5 A polyketone was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanedicarboxylic acid and 5 mmol of dodecanedioic acid were used as monomers. PK-5 was obtained. The resulting polyketone PK-5 had a weight average molecular weight of 36,000 and a number average molecular weight of 13,000.
(合成例6)ポリケトンPK-6の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとドデカン二酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-6を得た。得られたポリケトンPK-6の重量平均分子量は39,000であり、数平均分子量は12,000であった。
Synthesis Example 6 Synthesis of Polyketone PK-6 The polyketone was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of dodecanedioic acid were used as monomers. PK-6 was obtained. The resulting polyketone PK-6 had a weight average molecular weight of 39,000 and a number average molecular weight of 12,000.
(合成例7)ポリケトンPK-7の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとヘキサン二酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-7を得た。得られたポリケトンPK-7の重量平均分子量は39,000であり、数平均分子量は12,000であった。
Synthesis Example 7 Synthesis of Polyketone PK-7 A polyketone was obtained in the same manner as in Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of hexanedioic acid were used as monomers. PK-7 was obtained. The resulting polyketone PK-7 had a weight average molecular weight of 39,000 and a number average molecular weight of 12,000.
(合成例8)ポリケトンPK-8の合成
 2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとcis-1,4-シクロヘキサンジカルボン酸5mmol用いた以外は実施例1と同様にして、ポリケトンPK-8を得た。得られたポリケトンPK-8の重量平均分子量は45,000であり、数平均分子量は11,000であった。
Synthesis Example 8 Synthesis of Polyketone PK-8 Except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid and 5 mmol of cis-1,4-cyclohexanedicarboxylic acid were used, the same procedure as in Example 1 was performed. Polyketone PK-8 was obtained. The resulting polyketone PK-8 had a weight average molecular weight of 45,000 and a number average molecular weight of 11,000.
(合成例9)ポリケトンPK-9の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとtrans-1,4-シクロヘキサンジカルボン酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-9を得た。得られたポリケトンPK-9の重量平均分子量は37,000、数平均分子量は10,000であった。 
(Synthesis Example 9) Synthesis of Polyketone PK-9 Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of trans-1,4-cyclohexanedicarboxylic acid were used as monomers. In the same manner as above, polyketone PK-9 was obtained. The resulting polyketone PK-9 had a weight average molecular weight of 37,000 and a number average molecular weight of 10,000.
(合成例10)ポリケトンPK-10の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolと1,4-シクロヘキサンジカルボン酸(cisとtransの混合体、cis:trans(モル比)=7:3)5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-10を得た。得られたポリケトンPK-10の重量平均分子量は33,000であり、数平均分子量は11,000であった。
Synthesis Example 10 Synthesis of Polyketone PK-10 As monomers, 2,2′-dimethoxybiphenyl 10 mmol, 1,3-adamantanediacetic acid 5 mmol and 1,4-cyclohexanedicarboxylic acid (mixture of cis and trans, cis: trans (Molar ratio) = 7: 3) Polyketone PK-10 was obtained in the same manner as in Example 1 except that 5 mmol was used. The resulting polyketone PK-10 had a weight average molecular weight of 33,000 and a number average molecular weight of 11,000.
(合成例11)ポリケトンPK-11の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとデカリン-2,6-ジカルボン酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-11を得た。得られたポリケトンPK-11の重量平均分子量は33,000であり、数平均分子量は10,000であった。
Synthesis Example 11 Synthesis of Polyketone PK-11 Example 1 was used except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of decalin-2,6-dicarboxylic acid were used as monomers. Similarly, polyketone PK-11 was obtained. The resulting polyketone PK-11 had a weight average molecular weight of 33,000 and a number average molecular weight of 10,000.
(合成例12)ポリケトンPK-12の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとノルボルナンジカルボン酸(2,4-、2,5-混合体)5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-12を得た。得られたポリケトンPK-12の重量平均分子量は27,000であり、数平均分子量は9,200であった。
Synthesis Example 12 Synthesis of Polyketone PK-12 As a monomer, 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of norbornane dicarboxylic acid (2,4-, 2,5-mixture) A polyketone PK-12 was obtained in the same manner as in Example 1 except that it was used. The resulting polyketone PK-12 had a weight average molecular weight of 27,000 and a number average molecular weight of 9,200.
(合成例13)ポリケトンPK-13の合成
 モノマとして、2,2’-ジメトキシビフェニル10mmolと1,3-アダマンタン二酢酸5mmolとtrans-2,3-ノルボルナンジカルボン酸5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-13を得た。得られたポリケトンPK-13の重量平均分子量は26,000であり、数平均分子量は8,100であった。
Synthesis Example 13 Synthesis of Polyketone PK-13 Example 1 except that 10 mmol of 2,2′-dimethoxybiphenyl, 5 mmol of 1,3-adamantanediacetic acid, and 5 mmol of trans-2,3-norbornane dicarboxylic acid were used as monomers. In the same manner as above, polyketone PK-13 was obtained. The resulting polyketone PK-13 had a weight average molecular weight of 26,000 and a number average molecular weight of 8,100.
(合成例14)ポリケトンPK-14の合成
 モノマとして、2,2’-ビス(2-メトキシフェニル)プロパン10mmolと1,3-アダマンタン二酢酸5mmolと1,4-シクロヘキサンジカルボン酸(cisとtransの混合体、cis:trans(モル比)=7:3)5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-14を得た。得られたポリケトンPK-14の重量平均分子量は28,000であり、数平均分子量は8,300であった。
Synthesis Example 14 Synthesis of Polyketone PK-14 As monomers, 2,2′-bis (2-methoxyphenyl) propane 10 mmol, 1,3-adamantanediacetic acid 5 mmol and 1,4-cyclohexanedicarboxylic acid (of cis and trans Polyketone PK-14 was obtained in the same manner as in Example 1 except that 5 mmol of the mixture, cis: trans (molar ratio) = 7: 3) was used. The resulting polyketone PK-14 had a weight average molecular weight of 28,000 and a number average molecular weight of 8,300.
(合成例15)ポリケトンPK-15の合成
 モノマとして、ジフェニルエーテル10mmolと1,3-アダマンタン二酢酸5mmolと1,4-シクロヘキサンジカルボン酸(cisとtransの混合体、cis:trans(モル比)=7:3)5mmolを用いた以外は実施例1と同様にして、ポリケトンPK-15を得た。得られたポリケトンPK-15の重量平均分子量は27,000であり、数平均分子量は8,000であった。
Synthesis Example 15 Synthesis of Polyketone PK-15 As monomers, 10 mmol of diphenyl ether, 5 mmol of 1,3-adamantanediacetic acid and 1,4-cyclohexanedicarboxylic acid (mixture of cis and trans, cis: trans (molar ratio) = 7) : 3) A polyketone PK-15 was obtained in the same manner as in Example 1 except that 5 mmol was used. The resulting polyketone PK-15 had a weight average molecular weight of 27,000 and a number average molecular weight of 8,000.
(B)成分
 B1:下記式(XII)で表される化合物
Figure JPOXMLDOC01-appb-C000026

 
(B) Component B1: Compound represented by the following formula (XII)
Figure JPOXMLDOC01-appb-C000026

 B2:下記式(XIII)で表される化合物
Figure JPOXMLDOC01-appb-C000027

 
B2: Compound represented by the following formula (XIII)
Figure JPOXMLDOC01-appb-C000027

B3:下記式(XIV)で表される化合物
Figure JPOXMLDOC01-appb-C000028

 
B3: Compound represented by the following formula (XIV)
Figure JPOXMLDOC01-appb-C000028

B4:下記式(XV)で表される化合物
Figure JPOXMLDOC01-appb-C000029

 
B4: Compound represented by the following formula (XV)
Figure JPOXMLDOC01-appb-C000029

 B5:下記式(XVI)で表される化合物(エポキシ当量188)
Figure JPOXMLDOC01-appb-C000030
B5: Compound represented by the following formula (XVI) (epoxy equivalent 188)
Figure JPOXMLDOC01-appb-C000030
 B6:下記式(XVII)で表される化合物
Figure JPOXMLDOC01-appb-C000031

 
B6: Compound represented by the following formula (XVII)
Figure JPOXMLDOC01-appb-C000031

 B7:トリグリシジル-p-アミノフェノール B7: Triglycidyl-p-aminophenol
(B’)成分
 B’1:下記式(XVIII)で表される化合物
Figure JPOXMLDOC01-appb-C000032

 
(B ′) Component B′1: Compound represented by the following formula (XVIII)
Figure JPOXMLDOC01-appb-C000032

(C)成分
 C1:下記式(XVIV)で表される化合物
Figure JPOXMLDOC01-appb-C000033

 
(C) Component C1: Compound represented by the following formula (XVIV)
Figure JPOXMLDOC01-appb-C000033

 C2:下記式(XX)で表される化合物
Figure JPOXMLDOC01-appb-C000034

 
C2: Compound represented by the following formula (XX)
Figure JPOXMLDOC01-appb-C000034

(D)成分
 D1:N-メチル-2-ピロリドン
(D) Component D1: N-methyl-2-pyrrolidone
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000037

 
Figure JPOXMLDOC01-appb-T000037

 
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000038
<評価用サンプルの作製>
 得られたポリケトン組成物を用いて、以下の方法によりポリケトン硬化物を作製し、後述の評価用のサンプルを準備した。
<Preparation of sample for evaluation>
Using the obtained polyketone composition, a polyketone cured product was prepared by the following method, and a sample for evaluation described later was prepared.
(1)耐薬品性試験用サンプル
 シリコン基板にポリケトン組成物をスピンコート法により塗布した。得られたシリコン基板を120℃に加熱したホットプレート上で3分間乾燥した。さらに、乾燥後のシリコン基板をイナートガスオーブン(光洋サーモシステム(株))を用いて窒素気流下、200℃で1時間熱処理することで、ポリケトン硬化物付シリコン基板を得て、これを耐薬品性試験用サンプルとした。
(1) Sample for chemical resistance test A polyketone composition was applied to a silicon substrate by a spin coating method. The obtained silicon substrate was dried for 3 minutes on a hot plate heated to 120 ° C. Furthermore, the silicon substrate after drying is heat-treated at 200 ° C. for 1 hour in a nitrogen stream using an inert gas oven (Koyo Thermo System Co., Ltd.) to obtain a silicon substrate with a cured polyketone, which is chemically resistant. It was set as the sample for a test.
(2)透過率測定用サンプル
 ガラス基板にポリケトン組成物をスピンコート法により塗布した。得られたガラス基板を(1)と同様に乾燥し、熱処理して、ポリケトン硬化物付ガラス基板を得て、これを透過率測定用サンプルとした。
(2) Sample for transmittance measurement A polyketone composition was applied to a glass substrate by a spin coating method. The obtained glass substrate was dried in the same manner as (1) and heat-treated to obtain a glass substrate with a polyketone cured product, which was used as a transmittance measurement sample.
(3)熱分解温度測定用サンプル
 ポリケトン組成物をアルミカップに滴下し、(1)と同様に乾燥し、熱処理して、アルミカップ内に成形されたポリケトン硬化物(ポリケトン成形体)を得た。このポリケトン成形体をアルミカップから剥がして、これを熱分解温度測定用サンプルとした。
(3) Sample for measuring pyrolysis temperature A polyketone composition was dropped into an aluminum cup, dried in the same manner as in (1), and heat-treated to obtain a cured polyketone (polyketone molded product) molded in the aluminum cup. . The polyketone molded body was peeled off from the aluminum cup, and this was used as a sample for measuring the thermal decomposition temperature.
(4)伸び率測定用サンプル
 ポリケトン組成物をバーコート法によりポリイミドフィルム上に塗布し、(1)と同様に乾燥し、熱処理して、ポリケトン硬化物付きポリイミドフィルムを得た。このポリケトン硬化物をポリイミドフィルムから剥がし、ポリケトン硬化物(ポリケトン膜)を得て、これを伸び率測定用サンプルとした。
(4) Sample for measuring elongation rate The polyketone composition was applied onto a polyimide film by a bar coating method, dried in the same manner as (1), and heat-treated to obtain a polyimide film with a cured polyketone. This polyketone cured product was peeled from the polyimide film to obtain a polyketone cured product (polyketone film), which was used as a sample for measuring elongation.
<ポリケトンの分子量測定>
 ポリケトンの分子量(重量平均分子量及び数平均分子量)は、溶離液としてテトラヒドロフラン(THF)を用いて、GPC法によって測定し、標準ポリスチレン換算にて求めた。詳細は次のとおりである。
<Measurement of molecular weight of polyketone>
The molecular weight (weight average molecular weight and number average molecular weight) of the polyketone was measured by GPC method using tetrahydrofuran (THF) as an eluent, and was determined in terms of standard polystyrene. Details are as follows.
・装置名:Ecosec HLC-8320GPC(東ソー(株))
・カラム:TSKgel Supermultipore HZ-M(東ソー(株))
・検出器:UV検出器、RI検出器併用
・流速:0.4ml/min
-Device name: Ecosec HLC-8320GPC (Tosoh Corporation)
Column: TSKgel Supermultipore HZ-M (Tosoh Corporation)
・ Detector: UV detector and RI detector combined ・ Flow rate: 0.4 ml / min
<耐薬品性試験>
 ポリケトン硬化物付シリコン基板を個片化して試験片を作製した。試験片をそれぞれ、以下の条件(a)及び(b)で薬液に浸漬した。浸漬中にポリケトン硬化物であるポリケトン膜が溶解するか、又はポリケトン膜がシリコン基板から剥離するかを観察した。観察結果を表5及び表6に示す。本試験において、溶解及び剥離が見られない場合は「変化なし」とした。
<Chemical resistance test>
The silicon substrate with a polyketone cured product was separated into individual test pieces. Each test piece was immersed in the chemical solution under the following conditions (a) and (b). It was observed whether the polyketone film, which is a polyketone cured product, was dissolved during the immersion, or whether the polyketone film was peeled off from the silicon substrate. The observation results are shown in Tables 5 and 6. In this test, when dissolution and peeling were not observed, it was set as “no change”.
 条件(a);ジメチルスルホキシド(DMSO)と2-エタノールアミン(2AE)と(DMSO:2AEは体積比で7:3)の混合液を60℃に加熱し、試験片を30分間浸漬した。
 条件(b);23℃の0.5質量%のフッ酸(HF)水溶液に試験片を30分間浸漬した。
Condition (a): A mixed solution of dimethyl sulfoxide (DMSO), 2-ethanolamine (2AE) and (DMSO: 2AE is 7: 3 by volume) was heated to 60 ° C., and the test piece was immersed for 30 minutes.
Condition (b): The test piece was immersed in a 0.5% by mass hydrofluoric acid (HF) aqueous solution at 23 ° C. for 30 minutes.
<透過率測定>
 ポリケトン硬化物付ガラス基板の400nmにおける可視光の透過率を、分光光度計(V-570、日本分光(株))を用いた紫外可視吸収スペクトル法によって測定した。ポリケトン硬化物を有さないガラス基板をリファレンスとして、膜厚1μmに換算した膜の透過率を表5及び表6に示す。
<Transmittance measurement>
The visible light transmittance at 400 nm of the glass substrate with a cured polyketone was measured by an ultraviolet-visible absorption spectrum method using a spectrophotometer (V-570, JASCO Corporation). Tables 5 and 6 show the transmittance of the film converted to a film thickness of 1 μm using a glass substrate having no polyketone cured product as a reference.
<熱分解温度測定>
 熱重量天秤TG-DTA6300((株)日立ハイテクサイエンス((株)日立ハイテクノロジーズ))を用いて、ポリケトン硬化物の重量減少を測定した。加熱により重量が大きく減少する曲線の接線の交点を熱分解温度と定義する。その結果を表5及び表6に示す。
<Pyrolysis temperature measurement>
The weight loss of the cured polyketone was measured using a thermogravimetric balance TG-DTA6300 (Hitachi High-Tech Science Co., Ltd. (Hitachi High-Technologies Corporation)). The intersection of the tangents of the curves where the weight is greatly reduced by heating is defined as the pyrolysis temperature. The results are shown in Tables 5 and 6.
<伸び率測定>
 引張試験機(AUTOGRAPH EZ-TEST EZ-S、(株)島津製作所製)を用いて、ポリケトン硬化物(ポリケトン膜)を5mm/minの速度で引張り試験を行い、伸び率を測定した。その結果を表5及び表6に示す。
<Elongation measurement>
Using a tensile tester (AUTOGRAPH EZ-TEST EZ-S, manufactured by Shimadzu Corporation), the polyketone cured product (polyketone film) was subjected to a tensile test at a speed of 5 mm / min, and the elongation was measured. The results are shown in Tables 5 and 6.
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000040
 実施例のポリケトン組成物から得られるポリケトン硬化物は、耐薬品性、透明性及び耐熱性に優れ、さらに高い伸び率を有することが分かった。
 一方、特定含窒素化合物を含有しない比較例1~3では、耐薬品性に劣り、伸び率も低くなっていた。また、特定含窒素化合物の代わりにエポキシ化合物を含む比較例4~13では、耐薬品性、透明性及び耐熱性については実施例と同等であったが、伸び率が低いことが分かった。
It turned out that the polyketone hardened | cured material obtained from the polyketone composition of an Example is excellent in chemical resistance, transparency, and heat resistance, and also has a high elongation rate.
On the other hand, Comparative Examples 1 to 3 not containing a specific nitrogen-containing compound were inferior in chemical resistance and had a low elongation. In Comparative Examples 4 to 13 containing an epoxy compound instead of the specific nitrogen-containing compound, the chemical resistance, transparency and heat resistance were the same as those in the example, but it was found that the elongation was low.

Claims (12)

  1.  下記一般式(I)で表される構造単位を主鎖に含むポリケトン、並びに、
     窒素原子と、前記窒素原子と結合するヒドロキシメチル基及びアルコキシメチル基からなる群より選択される少なくとも1種の基と、を有する含窒素化合物、
     を含有するポリケトン組成物。
    Figure JPOXMLDOC01-appb-C000001

     
    〔一般式(I)中、Xは、それぞれ独立に、置換基を有していてもよい炭素数1~50の2価の基を示し、Yは、それぞれ独立に、置換基を有していてもよい炭素数1~30の2価の炭化水素基を示し、nは3~1000の整数を示す。〕
    A polyketone containing a structural unit represented by the following general formula (I) in the main chain, and
    A nitrogen-containing compound having a nitrogen atom and at least one group selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group bonded to the nitrogen atom,
    Containing a polyketone composition.
    Figure JPOXMLDOC01-appb-C000001


    [In general formula (I), each X independently represents a divalent group having 1 to 50 carbon atoms which may have a substituent, and Y each independently has a substituent. Represents a divalent hydrocarbon group having 1 to 30 carbon atoms, and n represents an integer of 3 to 1000. ]
  2.  前記一般式(I)において、Xが、それぞれ独立に、芳香環を含む炭素数6~50の2価の基を含む、請求項1に記載のポリケトン組成物。 The polyketone composition according to claim 1, wherein, in the general formula (I), each X independently contains a bivalent group having 6 to 50 carbon atoms including an aromatic ring.
  3.  前記一般式(I)において、Xが、それぞれ独立に、下記一般式(II-1)~(II-3)からなる群より選択される少なくとも1種で表される2価の基を含む、請求項1又は請求項2に記載のポリケトン組成物。
    Figure JPOXMLDOC01-appb-C000002

     
    〔一般式(II-1)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示す。〕
    Figure JPOXMLDOC01-appb-C000003

    〔一般式(II-2)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、mは、それぞれ独立に、0~3の整数を示し、Zは、酸素原子又は下記一般式一般式(III-1)~(III-7)で表される2価の基を示す。〕
    Figure JPOXMLDOC01-appb-C000004

    〔一般式(III-1)~(III-7)中、Rは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を示し、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、R及びRは、それぞれ独立に、水素原子又は置換基を有していてもよい炭素数1~30の炭化水素基を表す。mは、それぞれ独立に、0~3の整数を示し、nは、それぞれ独立に、0~4の整数を示し、pは、それぞれ独立に、0~2の整数を示す。〕
    Figure JPOXMLDOC01-appb-C000005

    〔一般式(II-3)中、Rは、それぞれ独立に、置換基を有していてもよい炭素数1~30の炭化水素基を示し、nは、それぞれ独立に、0~4の整数を示す。〕
    In the general formula (I), each X independently contains a divalent group represented by at least one selected from the group consisting of the following general formulas (II-1) to (II-3): The polyketone composition according to claim 1 or 2.
    Figure JPOXMLDOC01-appb-C000002


    [In General Formula (II-1), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents A hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and each m independently represents an integer of 0 to 3. ]
    Figure JPOXMLDOC01-appb-C000003

    [In General Formula (II-2), each R 1 independently represents a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 30 carbon atoms, and each R 2 independently represents A hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, m independently represents an integer of 0 to 3, and Z represents an oxygen atom or a compound represented by the following general formula (III- 1) to divalent groups represented by (III-7). ]
    Figure JPOXMLDOC01-appb-C000004

    [In the general formulas (III-1) to (III-7), each R 1 independently represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 2 Each independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and R 3 and R 4 may each independently have a hydrogen atom or a substituent. This represents a hydrocarbon group having 1 to 30 carbon atoms. m independently represents an integer of 0 to 3, n independently represents an integer of 0 to 4, and p independently represents an integer of 0 to 2, respectively. ]
    Figure JPOXMLDOC01-appb-C000005

    [In General Formula (II-3), each R 5 independently represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, and n represents each independently 0 to 4 Indicates an integer. ]
  4.  前記一般式(I)において、Yが、2価の飽和炭化水素基を含む、請求項1~請求項3のいずれか1項に記載のポリケトン組成物。 The polyketone composition according to any one of claims 1 to 3, wherein, in the general formula (I), Y contains a divalent saturated hydrocarbon group.
  5.  前記一般式(I)において、Yが、2価の飽和脂環式炭化水素基を含む、請求項4に記載のポリケトン組成物。 The polyketone composition according to claim 4, wherein, in the general formula (I), Y contains a divalent saturated alicyclic hydrocarbon group.
  6.  前記一般式(I)において、Yの炭素数が6~30である、請求項1~請求項5のいずれか1項に記載のポリケトン組成物。 The polyketone composition according to any one of claims 1 to 5, wherein in the general formula (I), Y has 6 to 30 carbon atoms.
  7.  前記含窒素化合物は、窒素原子と結合するヒドロキシメチル基及びアルコキシメチル基の総数が、2個~6個である、請求項1~請求項6のいずれか1項に記載のポリケトン組成物。 The polyketone composition according to any one of claims 1 to 6, wherein the nitrogen-containing compound has a total number of hydroxymethyl groups and alkoxymethyl groups bonded to nitrogen atoms of 2 to 6.
  8.  熱潜在酸発生剤をさらに含有する、請求項1~請求項7のいずれか1項に記載のポリケトン組成物。 The polyketone composition according to any one of claims 1 to 7, further comprising a thermal latent acid generator.
  9.  溶剤をさらに含有する、請求項1~請求項8のいずれか1項に記載のポリケトン組成物。 The polyketone composition according to any one of claims 1 to 8, further comprising a solvent.
  10.  請求項1~請求項9のいずれか1項に記載のポリケトン組成物の硬化物である、ポリケトン硬化物。 A cured product of a polyketone, which is a cured product of the polyketone composition according to any one of claims 1 to 9.
  11.  請求項10に記載のポリケトン硬化物を有する光学素子。 An optical element having the polyketone cured product according to claim 10.
  12.  請求項10に記載のポリケトン硬化物を有する画像表示装置。 An image display device comprising the polyketone cured product according to claim 10.
PCT/JP2017/026540 2016-08-04 2017-07-21 Nitrogenous-compound-containing polyketone composition, polyketone cured product, optical element, and image display device WO2018025673A1 (en)

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