WO2018016929A1 - Therapeutic rf energy transmitter and method for controlling same - Google Patents

Therapeutic rf energy transmitter and method for controlling same Download PDF

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Publication number
WO2018016929A1
WO2018016929A1 PCT/KR2017/007947 KR2017007947W WO2018016929A1 WO 2018016929 A1 WO2018016929 A1 WO 2018016929A1 KR 2017007947 W KR2017007947 W KR 2017007947W WO 2018016929 A1 WO2018016929 A1 WO 2018016929A1
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Prior art keywords
impedance
impedance converter
treatment
energy
reflected wave
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PCT/KR2017/007947
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French (fr)
Korean (ko)
Inventor
고광천
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주식회사 루트로닉
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Publication of WO2018016929A1 publication Critical patent/WO2018016929A1/en

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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/40Applying electric fields by inductive or capacitive coupling ; Applying radio-frequency signals
    • A61N1/403Applying electric fields by inductive or capacitive coupling ; Applying radio-frequency signals for thermotherapy, e.g. hyperthermia
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/18Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/18Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves
    • A61B18/1815Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves using microwaves
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/02Details
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/02Details
    • A61N1/025Digital circuitry features of electrotherapy devices, e.g. memory, clocks, processors
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/02Details
    • A61N1/04Electrodes
    • A61N1/06Electrodes for high-frequency therapy
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/02Details
    • A61N1/08Arrangements or circuits for monitoring, protecting, controlling or indicating
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/40Applying electric fields by inductive or capacitive coupling ; Applying radio-frequency signals
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B2018/00315Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body for treatment of particular body parts
    • A61B2018/00452Skin
    • A61B2018/00458Deeper parts of the skin, e.g. treatment of vascular disorders or port wine stains
    • A61B2018/00464Subcutaneous fat, e.g. liposuction, lipolysis
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B2018/00636Sensing and controlling the application of energy
    • A61B2018/00642Sensing and controlling the application of energy with feedback, i.e. closed loop control
    • A61B2018/00648Sensing and controlling the application of energy with feedback, i.e. closed loop control using more than one sensed parameter
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B2018/00636Sensing and controlling the application of energy
    • A61B2018/00696Controlled or regulated parameters
    • A61B2018/00767Voltage
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/18Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves
    • A61B18/1815Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves using microwaves
    • A61B2018/183Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by applying electromagnetic radiation, e.g. microwaves using microwaves characterised by the type of antenna

Definitions

  • the present invention relates to an RF energy delivery device for treatment and a control method of the RF energy delivery device for treatment, and more particularly, to transfer the RF energy to the treatment location by using an antenna structure that is electrically spaced apart from the treatment location.
  • the present invention relates to an RF energy delivery device and a control method thereof.
  • Subcutaneous fat is formed by the accumulation of fat cells distributed in the subcutaneous layer.
  • Subcutaneous fat when mature, has a much larger volume than normal cells, of which 95% is made up of fat.
  • Adipose cells contain less water than other cells, so when they absorb energy they are heated to a higher temperature than other cells and are selectively killed. Therefore, various techniques for treating obesity by applying an energy source such as RF energy to fat cells have been proposed, which is also disclosed in Korean Patent No. 1483588.
  • Obesity treatment using the RF energy has a different therapeutic effect depending on various variables such as the treatment environment, the characteristics, shape, and location of the treatment tissue.
  • the conventional device has a disadvantage in that the treatment proceeds without considering these various variables, the deviation occurs in the treatment effect, and damage the skin of the patient.
  • the present invention is to provide an RF energy delivery device and a control method for the treatment that can control the RF energy delivery circuit in consideration of the characteristics of the patient and the characteristics of the treatment environment in order to solve the above problems.
  • the present invention RF energy generating unit
  • the first circuit is connected to the RF energy generating unit, including a first impedance converter, configured to receive power from the first circuit
  • a second circuit including a second impedance converter, a transmitter connected to the second circuit to deliver RF energy to the patient, and a reflected wave reflected to the RF energy generator according to a tissue characteristic or position of the patient.
  • It provides an RF energy transfer device for treatment comprising a control unit for adjusting the impedance of the first impedance converter and the second impedance converter so that.
  • the controller measures the magnitude of the reflected reflected wave while adjusting and adjusting the impedance values of the first impedance converter and the second impedance converter, and the value of the first impedance converter that the magnitude of the reflected wave is equal to or less than a reference value. And adjust the impedance of the first impedance converter and the second impedance converter by one of a combination of the values of the second impedance converter.
  • the reference value may range from 1.3 to 1.7 voltage standing wave ratio.
  • the control unit may reflect the reflected wave according to the impedance change in the corresponding combination among the plurality of combinations. You can choose the one with the smallest change rate. Specifically, the smallest change rate of the reflected wave according to the impedance change of the second impedance converter may be selected.
  • control unit monitors the change in the magnitude of the reflected wave while the RF energy is transmitted through the transfer unit and the treatment is in progress, and when the magnitude of the reflected wave exceeds a reference value, the first impedance conversion unit or the second impedance conversion unit It is also possible to adjust the impedance.
  • the first impedance converter may adjust the impedance of the second impedance converter in a fixed state so that the magnitude of the reflected wave is equal to or less than a reference value.
  • the first impedance converter and the impedance converter may be configured to vary respective capacitances.
  • the first impedance converter may be configured such that a plurality of capacitors having different capacitances are arranged in parallel and alternatively connected by a switching element, and the second impedance converter may be configured as a variable capacitor.
  • the setting of the impedance may include monitoring a magnitude of a reflected wave reflected by the RF energy generator while varying impedances of the first impedance converter and the second impedance, wherein the magnitude of the reflected wave is equal to or less than a reference value. Extracting impedance combinations of the first impedance conversion unit and the second impedance conversion unit, selecting one impedance combination in consideration of a reflected wave change rate according to an impedance among the extracted plurality of impedance combinations, and selecting the impedance combination as the selected impedance combination; The method may include setting a first impedance converter and a second impedance converter.
  • the first impedance conversion unit or the second impedance conversion unit Furthermore, monitoring whether the magnitude of the reflected wave increases during the treatment while the RF energy is supplied and when the magnitude of the reflected wave increases during the treatment, the first impedance conversion unit or the second impedance conversion unit. It is also possible to further comprise the step of adjusting the impedance.
  • the optimal RF transmission circuit in consideration of the characteristics of the patient and the treatment environment to proceed with the treatment, it is possible to proceed effectively for a predetermined time.
  • FIG. 1 is a perspective view of an RF energy delivery device for treatment according to the present invention
  • FIG. 2 is a block diagram showing the main configuration of the RF energy transfer device of FIG.
  • FIG. 3 is a view showing a treatment state by the RF energy delivery device of FIG.
  • FIG. 4 is a circuit diagram schematically showing the RF circuit of FIG.
  • FIG. 5 is a circuit diagram illustrating a first impedance converter of FIG. 4;
  • FIG. 6 is a perspective view illustrating a second impedance converter of FIG. 4;
  • FIG. 10 is a flowchart illustrating a control method of the RF energy transmitting device of FIG. 1;
  • FIG. 11 is a flowchart illustrating detailed steps of an impedance setting step of FIG. 10.
  • FIG. 12 is a flowchart illustrating another example of the control method of FIG. 10.
  • the present embodiment will be described with reference to a device for reducing body fat by transmitting RF energy, but this is an example and the present invention is not limited thereto.
  • the RF energy can be applied to various devices for carrying out treatment by delivering RF energy to the treatment site.
  • the RF energy delivery device for treatment in accordance with the present invention.
  • the RF energy delivery device according to the present invention comprises a body portion 100, the connection portion 200 and the applicator 300.
  • Body portion 100 forms the main appearance of the device, the inside is provided with various components for operating the device.
  • a power supply unit (not shown) connected to an external power source may be provided to supply power therein.
  • An RF generator 430 for generating RF energy and an electric circuit for transmitting the same may be provided.
  • Control circuits for controlling various components may be provided.
  • the outer surface of the body portion 100 may be provided with an interface 120 for the user to manipulate or display various information to the user.
  • the applicator 300 is configured to be adjacent to the treatment site of the patient to apply RF energy to the treatment location of the patient.
  • the applicator 300 is configured to include an applicator body 310, the RF transmission unit 460, the cooling unit 330, the sensor unit 320, etc., each configuration will be described in detail below.
  • connection part 200 is configured to mechanically connect the body part 100 and the applicator 300, and may be configured as a link structure having a plurality of joints. Thereby, the position of the applicator can be adjusted to the treatment position of the patient, and the position during the treatment can be fixed.
  • Various cables (not shown) are disposed inside the connection part 200 to electrically connect the body part 100 and the applicator 300 and to transmit control-related signals generated from one side to the other side.
  • FIG. 2 is a block diagram showing the main configuration of the RF energy transfer device of FIG.
  • various configurations of the apparatus will be described in more detail with reference to FIG. 2.
  • the body part 100 includes a power supply 110, an RF generator 430, an interface 120, a data storage 130, and a controller 140.
  • the applicator 300 includes an RF transmission unit 460, a sensor unit 320, and a cooling unit 330.
  • the power supply unit 110 is connected to an external power source. In addition, it is connected to various components inside the apparatus including the RF generator, the interface, and the cooling unit to supply power.
  • the RF generator 430 generates RF energy by using the power applied from the power supply 110.
  • the RF generator 430 according to the present exemplary embodiment is configured to generate RF energy having a frequency of 27.12 MHz, and in addition to the frequency of the ISM band such as 13.553 to 13.567 MHz, 26.975 to 27.283 MHz, and 40.66 to 40.70 MHz. It can be configured to generate a corresponding RF energy.
  • the RF energy generated by the RF generator 430 is transmitted to the RF transmitter 460 through the RF circuit unit 400 and transferred to the treatment site of the patient.
  • the configuration of the RF circuit unit 400 will be described in more detail below.
  • the interface 120 is provided on the outer surface of the body portion 100, the user sets the treatment mode, etc., and is configured to display various information to the user.
  • the interface 120 is connected to the control unit 140, transmits a control signal input from the user to the control unit, and displays various treatment information collected / operated from the control unit 140 to the user through the interface 120.
  • the interface 120 may be variously configured using various input devices such as a control panel and a touch screen, and various display devices including a display and a speaker.
  • the interface 120 of the present embodiment is configured using a touch screen, a user inputs setting information by touching the touch screen, and various treatment information may be displayed to the user through a screen of the touch screen. have.
  • the data storage unit 130 stores various information necessary for driving the device, and may store various algorithms corresponding to user input items or information detected during treatment. Therefore, the controller 140 may control each component of the device based on the information stored in the data storage unit 130.
  • the RF transmitter 460 provided in the applicator 300 receives the RF energy generated from the RF generator 430, and delivers to the treatment position of the patient.
  • the RF transmitter 460 is provided with a plurality of antenna structures and is disposed to be electrically spaced from the treatment position to transmit RF energy to the treatment position in a non-contact manner.
  • the term "electrically spaced apart” means that the portion where the RF energy is transmitted and the treatment location are electrically spaced apart and do not come into contact with each other. Therefore, the air gap may be formed without any configuration between the delivery unit and the treatment position, or a separate spacer member (not shown) made of an electrically insulating material may be disposed between the delivery unit and the treatment position to maintain a gap. It may be a structure arranged to be interposed in.
  • the RF transmitter 460 of this embodiment is composed of two antenna structures disposed on both sides of the applicator body 310.
  • the two RF transmitters are disposed on both sides of the treatment position such that the path of progression of the RF during treatment passes through the treatment position.
  • the treatment location absorbs the energy and the treatment is performed while the temperature is increased.
  • the RF transmitter 460 has a planar structure having a predetermined area, and may be configured to have a corresponding area in consideration of the area of the treatment location.
  • the sensor unit 320 is configured to include a temperature sensor for sensing the temperature of the treatment position during treatment. Thereby, it can prevent that a treatment position rises too much during treatment, and thermal damage arises on a skin surface.
  • the sensor unit 320 may be configured as an infrared sensor so that the temperature of the surface of the skin may be measured while not in contact with the treatment position.
  • the cooling unit 330 is configured to cool the skin surface to prevent the skin surface from overheating during treatment.
  • the cooling unit 330 is controlled to selectively drive during the treatment process based on the temperature information detected by the sensor unit 320.
  • the cooling unit 330 may be configured using various cooling structures, and the cooling unit 330 of the present embodiment is configured using a cooling fan structure to cool the skin surface without contacting the treatment position.
  • control unit 140 is a configuration for controlling the operation of various components of the device, such as the output of the RF generator, the impedance of the RF circuit, the operation of the cooling unit.
  • the controller 140 receives the setting information input by the user through the interface 120, and controls various components by referring to contents previously stored in the data storage unit 130.
  • the information detected by the sensor unit 320 during the treatment is transmitted to the controller 140, and the controller 140 controls the operation contents of the device to reflect the information and proceed to the optimal treatment.
  • FIG. 3 is a diagram illustrating a treatment state by the RF energy delivery device of FIG. 1.
  • the treatment is performed by transmitting RF energy to the treatment position of the patient P while two RF transmitting units 460 are spaced apart from the treatment position.
  • Treatment is aimed at reducing subcutaneous fat at the treatment site.
  • the controller 140 transmits the RF energy to the treatment position through the RF transmitter 460 to increase the temperature of the subcutaneous fat to a treatment temperature range of 45 degrees to 50 degrees Celsius for a predetermined time.
  • the treatment content may be designed in various ways, but the controller 140 according to the present embodiment may divide the treatment process into three sections and proceed with the treatment.
  • the RF energy of the high power is transmitted through the RF transmitter 460 to rapidly increase the temperature of the subcutaneous fat from the normal temperature to the temperature adjacent to the treatment temperature.
  • the RF energy is delivered to the output lower than the second section to control the temperature of the subcutaneous fat to be maintained in the treatment temperature range. have.
  • the cooling unit 330 is driven to selectively cool the skin surface.
  • control content is an example, and in addition to this, it is also possible to design in various ways.
  • the RF circuit unit 400 includes an RF supply unit 410 and an RF output unit 420.
  • the RF supply unit 410 is composed of an RF generator 430 and a first circuit 440 connected to the RF generator.
  • the first circuit 440 includes a first impedance converter 441 that can adjust the impedance of the RF supply unit 410.
  • the RF output unit 420 includes a second circuit 450 configured to transmit power from the first circuit 440 and an RF transmitter 460 connected to the second circuit to transfer RF energy to a treatment position. It is composed.
  • the second circuit 450 includes a second impedance converter 451 that can adjust the impedance of the RF output unit 420.
  • the RF generator 430 and the first circuit 440 is provided in the body portion 100 of the device, the second circuit 450 from the body portion 100 via the connection portion 200 to the applicator 300 Is configured to reach, the RF transmitter 460 may be installed in the applicator (300).
  • the present invention is not limited thereto, and the installation positions of the respective configurations may be variously changed and implemented such that the RF generator, the first circuit, and the second circuit are all provided with an applicator.
  • the circuit means not only an electrical path that is directly connected, but a trans structure by an induction method includes an electrical path that is indirectly connected by an induction method. Therefore, in FIG. 4, the first circuit or the second circuit is illustrated as constituting one closed loop. However, this is for convenience of description and the first circuit or the second circuit may be indirectly using its own trans structure. It is also possible to configure to form an electrical path.
  • RF energy generated from the RF supply unit 410 is transferred to the RF output unit 420 through a power transmission structure such as a transformer, and the transferred RF energy is transmitted through the RF transmission unit 460. Delivered to the treatment site.
  • a power transmission structure such as a transformer
  • RF energy is reflected to the RF supply unit 410.
  • the reflected wave is large in size, sufficient RF energy may not be transmitted to the treatment position through the RF transmitter 460. Therefore, there is a disadvantage that the target therapeutic effect is not seen or the treatment time is delayed.
  • the first circuit 440 and the second circuit 450 in the design of the device is generally designed to minimize the reflected wave, the device according to the present invention, the impedance through the RF transmission unit 460, such as patient characteristics, etc.
  • the structure is greatly variable depending on the treatment environment. That is, the total impedance on the RF output side is determined differently according to the volume, shape, tissue characteristics and separation distance of the patient's subcutaneous fat, humidity and temperature of the treatment environment. Therefore, the present invention includes a first impedance converter 441 in the first circuit 440 and a second impedance converter 451 in the second circuit 450 to be reflected to the RF supply unit 410. Each impedance can be adjusted to reduce the reflected wave. Thereby, the RF circuit is configured to reflect the characteristics of the treatment environment at each treatment, so that effective treatment can be performed.
  • FIG. 5 is a circuit diagram illustrating the first impedance converter of FIG. 4, and FIG. 6 is a perspective view illustrating the second impedance converter of FIG. 4.
  • the first impedance converter 441 and the second impedance converter 451 of the present exemplary embodiment may be configured to adjust capacitance values. Such a configuration may be configured using various kinds of devices.
  • the first impedance converter 441 may have a structure in which a plurality of capacitors C1 to C6 having different capacitance values are arranged in parallel.
  • the switching element S is provided to be alternatively connected to the plurality of capacitors to intermittently adjust the impedance value of the first impedance converter 441 (hereinafter referred to as 'first impedance') by adjusting the connection position of the switching element. It is possible to adjust with.
  • the second impedance converter 451 may be configured as a variable capacitor.
  • the variable capacitor of the second impedance converter 451 is configured such that one side plate 451a constituting the capacitor is rotatable 180 degrees.
  • the variable capacitor controls the rotation angle of the rotatable one side electrode plate 451a to continuously change the impedance value (hereinafter referred to as 'second impedance') by changing the size of the area that is opposed to the fixed other side electrode plate 451b. It is possible to adjust.
  • the first impedance converter 441 comprises a plurality of capacitors having a large difference in capacitance values to configure a relatively large range of capacitance values
  • the second impedance converter 451 has a capacitance
  • the variable range of values can be configured to be relatively small.
  • the configuration of the first impedance converter 441 and the second impedance converter 451 is an example, and may be configured by using various electric elements.
  • the controller 140 performs the treatment using the apparatus according to the present embodiment, so that the impedance value of the first impedance converter and the second impedance converter may be reduced to reduce the magnitude of the reflected wave transmitted to the RF generator 430.
  • Set negative impedance value Specifically, the control unit 140 monitors the magnitude of the reflected wave in the RF circuit unit 400 according to each combination while adjusting to all combinations of impedances that can be combined by the first impedance value and the second impedance value.
  • the impedance combination of the first impedance converter 441 and the second impedance converter 451 may be set by selecting an appropriate impedance combination according to the monitored result.
  • FIG. 7 is a graph showing the magnitude of the reflected wave with respect to the impedance change.
  • the first impedance converter 441 is fixed to the first capacitor C1 to rotate the one side plate of the second impedance converter 451 by 180 degrees to vary the second impedance value. This shows the magnitude of the reflected wave.
  • the controller 140 monitors the magnitude of the reflected wave according to each impedance combination.
  • each of the six capacitors C1 to C2, as well as the first capacitor C1 is the second impedance converter. By converting the impedance value of 451, the magnitude of the reflected wave according to all possible combinations is monitored.
  • the controller 140 may extract impedance combinations in which the magnitude of the reflected wave is equal to or less than a preset reference value.
  • the reference value may be set in various ways.
  • the reference value may be set by a voltage standing wave ratio (VSWR).
  • VSWR voltage standing wave ratio
  • the reference value may be set in a range in which the voltage standing wave ratio is 1.3 to 1.7.
  • the reference value is assumed to be a state in which the voltage standing wave ratio is 1.5.
  • FIG. 7 is a graph in which the value of the first impedance converter is fixed to C1, more combinations may be extracted as the first impedance converter 441 is converted to C2 to C6.
  • the controller 140 may select one of the extracted impedance combinations and set values of the first impedance converter 441 and the second impedance converter 451.
  • FIG. 8 and 9 are graphs showing two examples of extracted impedance combinations.
  • the controller 140 may select the impedance combination having the lowest value of the voltage standing wave ratio among the extracted impedance combinations as the set impedance, but in this embodiment, the set impedance is considered in consideration of the change rate of the voltage standing wave ratio to the impedance among the extracted impedance combinations. Choose.
  • FIG. 8 shows the lowest voltage standing wave ratio, when the impedance is changed, the ratio of the reflected wave may be greatly increased to exceed the reference value.
  • FIG. 9 shows a higher voltage standing wave compared to FIG. 8, but the reflected wave is maintained below the reference value without relatively increasing the magnitude of the reflected wave even when the impedance is changed.
  • the treatment position is finely moved while the patient is correcting the posture, or the RF output unit 420 is caused by a change in temperature or humidity in the treatment environment.
  • the impedance can vary.
  • the impedance combination of FIG. 9 compared to FIG. 8 has an advantage of exhibiting more uniform treatment performance even if the impedance changes during treatment. Therefore, in the present embodiment, the impedance combination having the smallest change rate of the reflected wave according to the impedance change among the impedance combinations satisfying the reference value or less is selected as the set impedance combination.
  • the first impedance converter 441 and the second impedance converter 451 may be set to a combination of set impedances to perform a treatment operation.
  • the controller 140 may continuously monitor the magnitude of the reflected wave reflected to the RF supply unit 410 while the treatment is in progress.
  • the impedance value of the RF output unit 420 may be changed by various causes during treatment, and in some cases, the magnitude of the reflected wave may exceed the reference value.
  • the controller 140 may adjust the impedance value from the set impedance combination to reduce the magnitude of the reflected wave to a reference value or less.
  • the impedance of the first impedance converter 441 may be adjusted, and only the impedance of the second impedance converter 451 may be adjusted. have.
  • the controller 140 adjusts the impedance of the second impedance converter 451.
  • the control unit 140 monitors the magnitude of the reflected wave while rotating in the direction of increasing and decreasing the impedance value of the second impedance converter 451, respectively, and then converts the second impedance in the direction of decreasing the magnitude of the reflected wave.
  • the impedance of the unit 451 may be adjusted. As such, by adjusting the second impedance value such that the magnitude of the reflected wave is less than or equal to the reference value, a uniform treatment effect can be seen despite the change in the treatment environment.
  • FIG. 10 is a flowchart illustrating a method of controlling the RF energy transmitting device of FIG. 1
  • FIG. 11 is a flowchart illustrating a sequence of impedance setting in FIG. 10 in more detail.
  • the RF generator 430 When the position of the patient is fixed, the RF generator 430 is operated to generate RF energy (S20), and the generated RF energy passes through the RF circuit unit 400 to the treatment position of the patient through the RF transmitter 460. It is delivered (S30). At this time, the RF circuit unit 400 does not effectively transmit RF energy to the treatment position without the impedance setting considering the characteristics of the patient. Therefore, the controller 140 controls the first impedance converter 441 and the second impedance converter 451 to set the impedance (S40).
  • the magnitude of the reflected wave is monitored while changing the combination of the first impedance value and the second impedance value (S41).
  • the switching element S of the first impedance converter 441 changes the position of the capacitor to be switched, and the second impedance converter 451 rotates the one side plate 451a, in all possible combinations.
  • the magnitude of the reflected wave can be monitored for.
  • a step of extracting a plurality of impedance combinations in which the magnitude of the reflected wave is equal to or less than a reference value is performed (S42).
  • an impedance combination having the smallest change rate of the reflected wave according to the impedance change rate is selected as the set impedance combination (S43).
  • the controller 140 sets the impedance values of the first impedance converter 441 and the second impedance converter 451 to the set impedance combination (S44), so that the characteristics of the patient, etc.
  • the optimal RF circuit is considered.
  • the RF energy generated by the RF generator 430 is transferred to the treatment position through the RF transmitter 460 to proceed with the treatment (S50).
  • the subcutaneous fat of the patient absorbs the RF energy, the temperature rises, and the fat volume is reduced as fat cells are killed.
  • the controller 140 continuously monitors the magnitude of the reflected wave transmitted to the RF supply unit 410 (S60), and determines whether the magnitude of the monitored reflected wave exceeds the reference value (S70).
  • the reference value in this step may be the same value as the reference value in step S42, but may be determined based on a value larger than the reference value in step S42 (for example, VSWR is 1.6).
  • the controller 140 performs the step of adjusting the impedance (S80). In this step, the controller 140 may reset the impedance while converting both the impedance values of the first impedance converter 441 and the second impedance converter 451, but in the present embodiment, the first impedance value is reset. In the fixed state, only the second impedance value can be adjusted. Therefore, the controller may adjust the second impedance value such that the magnitude of the reflected wave is less than or equal to the reference value, and then continue treatment.
  • control unit 140 continues the treatment, and when the set treatment time is over (S90) ends the treatment by ending the RF energy delivery can do.
  • the impedance setting step S40 is configured to be performed as a continuous step of the treatment process.
  • the step S120 of generating test RF energy distinguished from the treatment RF is performed and the test is performed.
  • the setting of the impedance using RF energy may be performed (S130).
  • the impedance may be configured to generate a treatment RF energy (S140) to proceed with the treatment.
  • the test RF energy may be configured to have a lower output than the initial output (the output of the first section) of the therapeutic RF energy.
  • the reflected wave may be continuously monitored during the treatment to be controlled in a manner of adjusting the impedance when the size of the reflected wave increases during the treatment.
  • the RF energy delivery device and control method thereof according to the present invention can improve the therapeutic effect by optimizing the RF delivery circuit in consideration of the characteristics of the patient and the treatment environment. Furthermore, even when an event due to movement of the patient occurs during treatment, the RF transmission circuit is adjusted by reflecting this in real time, thereby providing a uniform treatment performance.

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Abstract

The present invention relates to a therapeutic RF energy transmitter and a method for controlling the therapeutic RF energy transmitter. The therapeutic RF energy transmitter comprises: an RF energy generating unit; a first circuit connected to the RF energy generating unit and comprising a first impedance conversion unit; a second circuit for receiving transmission of power from the first circuit and comprising a second impedance conversion unit; a transmission unit connected to the second circuit and for transmitting RF energy to a patient; and a control unit for controlling the impedance of the first impedance conversion unit and the second impedance conversion unit so as to enable reduction of reflected waves reflected toward the RF energy generating unit in accordance with the tissue properties or location of the patient.

Description

치료를 위한 RF 에너지 전달 장치 및 이의 제어방법RF energy delivery device for therapy and control method thereof
본 발명은 치료를 위한 RF 에너지 전달 장치 및 치료를 위한 RF 에너지 전달 장치의 제어방법에 관한 것으로, 보다 상세하게는 치료 위치와 전기적으로 이격 설치되는 안테나 구조를 이용하여 RF 에너지를 치료 위치로 전달하는 RF 에너지 전달 장치 및 이의 제어방법에 관한 것이다.The present invention relates to an RF energy delivery device for treatment and a control method of the RF energy delivery device for treatment, and more particularly, to transfer the RF energy to the treatment location by using an antenna structure that is electrically spaced apart from the treatment location. The present invention relates to an RF energy delivery device and a control method thereof.
최근 당뇨병, 고혈압 및 혈관 장애와 같은 성인병이 현대사회의 심각한 사회문제로 대두되고 있다. 이러한 성인병의 원인 중 하나는 비만으로 알려져 있으며, 비만 치료을 위해 운동 및 칼로리 섭취의 억제를 통해 체내 대사를 활성화시켜 체내 지방을 연소시키는 것이 일반적이나, 치료적 방식으로 체내 지방을 줄이는 기술 또한 다양하게 소개되고 있다.Recently, adult diseases such as diabetes, hypertension and vascular disorders have emerged as serious social problems in modern society. One of the causes of adult diseases is known as obesity, and it is common to burn body fat by activating metabolism through suppression of exercise and calorie intake for the treatment of obesity, but various techniques for reducing body fat in a therapeutic manner are also introduced. It is becoming.
피하 지방은 피부하층에 분포하는 지방 세포가 축적되어 형성된다. 피하 지방은 성숙 시 일반 세포에 비해 미우 큰 부피를 갖게 되며, 이러한 부피 중 95% 정도가 지방으로 구성된다. 지방 세포는 다른 세포에 비해, 적은 수분을 포함하고 있어 에너지를 흡수하면 다른 세포에 비해 높은 온도로 가열되어 선택적으로 사멸된다. 따라서, RF 에너지와 같은 에너지원을 지방 세포에 인가하여 비만을 치료하는 기술이 다양하게 제안되고 있으며, 이는 한국등록특허 제1482788호에서도 개시되어 있다.Subcutaneous fat is formed by the accumulation of fat cells distributed in the subcutaneous layer. Subcutaneous fat, when mature, has a much larger volume than normal cells, of which 95% is made up of fat. Adipose cells contain less water than other cells, so when they absorb energy they are heated to a higher temperature than other cells and are selectively killed. Therefore, various techniques for treating obesity by applying an energy source such as RF energy to fat cells have been proposed, which is also disclosed in Korean Patent No. 1483588.
이러한 RF 에너지를 이용한 비만 치료는 환자에 따른 치료 조직의 특성, 형상, 위치 뿐 아니라 치료 환경 등의 다양한 변수에 의해 치료 효과가 상이하다. 다만, 종래의 장치는 이러한 다양한 변수를 고려하지 않고 치료를 진행함으로써, 치료 효과에서 편차가 발생하고, 환자의 피부에 손상을 입히는 단점이 있었다.Obesity treatment using the RF energy has a different therapeutic effect depending on various variables such as the treatment environment, the characteristics, shape, and location of the treatment tissue. However, the conventional device has a disadvantage in that the treatment proceeds without considering these various variables, the deviation occurs in the treatment effect, and damage the skin of the patient.
본 발명은 상기한 문제점을 해결하기 위하여, 환자의 특성 및 치료 환경의 특성을 고려하여 RF 에너지 전달 회로를 제어할 수 있는 치료를 위한 RF 에너지 전달 장치 및 이의 제어 방법을 제공하기 위함이다.The present invention is to provide an RF energy delivery device and a control method for the treatment that can control the RF energy delivery circuit in consideration of the characteristics of the patient and the characteristics of the treatment environment in order to solve the above problems.
상기한 본 발명의 목적을 달성하기 위해, 본 발명은, RF 에너지 발생부, 상기 RF 에너지 발생부와 연결되고, 제1 임피던스 변환부를 포함하는 제1 회로, 상기 제1 회로로부터 전력을 전달받도록 구성되며, 제2 임피던스 변환부를 포함하는 제2 회로, 상기 제2 회로에 연결되어 환자에 RF 에너지를 전달하는 전달부 및 환자의 조직 특성 또는 위치에 따라 상기 RF 에너지 발생부 측으로 반사되는 반사파를 줄일 수 있도록 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하는 제어부를 포함하는 치료를 위한 RF 에너지 전달 장치를 제공한다.In order to achieve the above object of the present invention, the present invention, RF energy generating unit, the first circuit is connected to the RF energy generating unit, including a first impedance converter, configured to receive power from the first circuit And a second circuit including a second impedance converter, a transmitter connected to the second circuit to deliver RF energy to the patient, and a reflected wave reflected to the RF energy generator according to a tissue characteristic or position of the patient. It provides an RF energy transfer device for treatment comprising a control unit for adjusting the impedance of the first impedance converter and the second impedance converter so that.
여기서, 제어부는 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스 값을 조합하여 조절하면서 상기 반사되는 반사파의 크기를 측정하고, 상기 반사파의 크기가 기준값 이하가 되는 상기 제1 임피던스 변환부 값 및 상기 제2 임피던스 변환부 값의 조합 중 하나로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하도록 구성된다. Here, the controller measures the magnitude of the reflected reflected wave while adjusting and adjusting the impedance values of the first impedance converter and the second impedance converter, and the value of the first impedance converter that the magnitude of the reflected wave is equal to or less than a reference value. And adjust the impedance of the first impedance converter and the second impedance converter by one of a combination of the values of the second impedance converter.
기준값은 전압 정재파비(voltage standing wave ratio)가 1.3 내지 1.7 범위일 수 있다.The reference value may range from 1.3 to 1.7 voltage standing wave ratio.
이때, 상기 반사파의 크기가 기준값 이하가 되는 상기 제1 임피던스 변환부 값 및 상기 제2 임피던스 변환부 값의 조합이 복수인 경우, 상기 제어부는 상기 복수의 조합 중 해당 조합에서 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 것을 선택할 수 있다. 구체적으로, 제2 임피던스 변환부의 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 것을 선택할 수 있다.In this case, when there are a plurality of combinations of the first impedance converting unit value and the second impedance converting unit value in which the magnitude of the reflected wave is equal to or less than a reference value, the control unit may reflect the reflected wave according to the impedance change in the corresponding combination among the plurality of combinations. You can choose the one with the smallest change rate. Specifically, the smallest change rate of the reflected wave according to the impedance change of the second impedance converter may be selected.
나아가, 제어부는 상기 전달부를 통해 RF 에너지가 전달되어 치료가 진행되는 동안 상기 반사파의 크기 변화를 모니터링하고, 상기 반사파의 크기가 기준값을 초과하는 경우 상기 제1 임피던스 변환부 또는 상기 제2 임피던스 변환부의 임피던스를 조절하는 것도 가능하다. 구체적으로, 상기 반사파의 크기가 기준값 이하가 되도록 상기 제1 임피던스 변환부는 고정시킨 상태에서 상기 제2 임피던스 변환부의 임피던스를 조절할 수 있다.Further, the control unit monitors the change in the magnitude of the reflected wave while the RF energy is transmitted through the transfer unit and the treatment is in progress, and when the magnitude of the reflected wave exceeds a reference value, the first impedance conversion unit or the second impedance conversion unit It is also possible to adjust the impedance. Specifically, the first impedance converter may adjust the impedance of the second impedance converter in a fixed state so that the magnitude of the reflected wave is equal to or less than a reference value.
제1 임피던스 변환부 및 상기 임피던스 변환부는 각각의 정전 용량값(capacitance)을 가변할 수 있도록 구성될 수 있다. 일 예로, 제1 임피던스 변환부는 상이한 용량을 갖는 복수의 캐패시터가 병렬로 배치되어 스위칭 소자에 의해 택일적으로 연결되도록 구성되며, 제2 임피던스 변환부는 가변 캐패시터로 구성될 수 있다.The first impedance converter and the impedance converter may be configured to vary respective capacitances. For example, the first impedance converter may be configured such that a plurality of capacitors having different capacitances are arranged in parallel and alternatively connected by a switching element, and the second impedance converter may be configured as a variable capacitor.
한편, 전술한 본 발명의 목적은, 제1 회로와 연결된 RF 에너지 발생부를 통해 RF 에너지를 공급하는 단계, 상기 제1 회로로부터 전력을 전달 받을 수 있도록 구성된 제2 회로에 연결되는 전달부를 통해 환자의 치료 위치로 RF 에너지를 전달하는 단계 및 상기 RF 에너지 발생부로 반사되는 반사파를 줄일 수 있도록 상기 제1 회로의 제1 임피던스 변환부 및 상기 제2 회로의 제2 임피던스 변환부의 임피던스를 설정하는 단계를 포함하는 치료를 위한 RF 에너지 전달 장치의 제어방법에 의해서도 달성될 수 있다.On the other hand, the object of the present invention described above, the step of supplying the RF energy through the RF energy generation unit connected to the first circuit, the patient through the transmission unit connected to the second circuit configured to receive power from the first circuit Delivering RF energy to a treatment location and setting impedances of the first impedance converter of the first circuit and the second impedance converter of the second circuit to reduce reflected waves reflected by the RF energy generator; It can also be achieved by a method of controlling the RF energy delivery device for the treatment.
여기서, 상기 임피던스를 설정하는 단계는, 상기 제1 임피던스 변환부 및 상기 제2 임피던스의 임피던스를 변화시키면서 상기 RF 에너지 발생부로 반사되는 반사파의 크기를 모니터링하는 단계, 상기 반사파의 크기가 기준값 이하인 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스 조합들을 추출하는 단계, 상기 추출된 복수의 임피던스 조합 중 임피던스에 따른 반사파 변화율을 고려하여 하나의 임피던스 조합을 선택하는 단계 및 상기 선택된 임피던스 조합으로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부를 세팅하는 단계를 포함할 수 있다.The setting of the impedance may include monitoring a magnitude of a reflected wave reflected by the RF energy generator while varying impedances of the first impedance converter and the second impedance, wherein the magnitude of the reflected wave is equal to or less than a reference value. Extracting impedance combinations of the first impedance conversion unit and the second impedance conversion unit, selecting one impedance combination in consideration of a reflected wave change rate according to an impedance among the extracted plurality of impedance combinations, and selecting the impedance combination as the selected impedance combination; The method may include setting a first impedance converter and a second impedance converter.
나아가, 상기 RF 에너지가 공급되면서 치료가 진행되는 동안 상기 반사파의 크기가 증가하는지 여부를 모니터링하는 단계 및 상기 치료 중 상기 반사파의 크기가 증가하는 경우 상기 제1 임피던스 변환부 또는 상기 제2 임피던스 변환부의 임피던스를 조절하는 단계를 더 포함하여 구성되는 것도 가능하다.Furthermore, monitoring whether the magnitude of the reflected wave increases during the treatment while the RF energy is supplied and when the magnitude of the reflected wave increases during the treatment, the first impedance conversion unit or the second impedance conversion unit. It is also possible to further comprise the step of adjusting the impedance.
본 발명에 의할 경우, 환자의 특성 및 치료 환경을 고려하여 최적의 RF 전달 회로를 설정하여 치료를 진행함으로써, 정해진 시간 동안 효과적으로 치료를 진행하는 것이 가능하다.According to the present invention, by setting the optimal RF transmission circuit in consideration of the characteristics of the patient and the treatment environment to proceed with the treatment, it is possible to proceed effectively for a predetermined time.
또한, 치료 중 환자가 이동하거나, 치료 환경이 변화하는 등을 고려하여 RF 전달 회로를 지속적으로 제어함으로써, 치료 효과를 향상시킬 수 있는 장점이 있다.In addition, by continuously controlling the RF transmission circuit in consideration of the movement of the patient during the treatment, changes in the treatment environment, there is an advantage that can improve the treatment effect.
도 1은 본 발명에 따른 치료를 위한 RF 에너지 전달 장치의 사시도,1 is a perspective view of an RF energy delivery device for treatment according to the present invention,
도 2는 도 1의 RF 에너지 전달 장치의 주요 구성을 도시한 블록도,2 is a block diagram showing the main configuration of the RF energy transfer device of FIG.
도 3은 도 1의 RF 에너지 전달 장치에 의한 치료 상태를 도시한 도면,3 is a view showing a treatment state by the RF energy delivery device of FIG.
도 4는 도 1의 RF 회로를 개략적으로 도시한 회로도,4 is a circuit diagram schematically showing the RF circuit of FIG.
도 5는 도 4의 제1 임피던스 변환부를 도시한 회로도,5 is a circuit diagram illustrating a first impedance converter of FIG. 4;
도 6은 도 4의 제2 임피던스 변환부를 도시한 사시도,6 is a perspective view illustrating a second impedance converter of FIG. 4;
도 7은 임피던스 변화에 대한 반사파의 크기를 나타낸 그래프,7 is a graph showing the magnitude of the reflected wave with respect to the impedance change;
도 8 및 도 9는 추출된 임피던스 조합의 두 예를 도시한 그래프,8 and 9 are graphs showing two examples of extracted impedance combinations,
도 10은 도 1의 RF 에너지 전달 장치의 제어 방법을 도시한 순서도,10 is a flowchart illustrating a control method of the RF energy transmitting device of FIG. 1;
도 11은 도 10에서 임피던스 설정 단계의 세부 단계를 도시한 순서도이고,FIG. 11 is a flowchart illustrating detailed steps of an impedance setting step of FIG. 10.
도 12는 도 10의 제어 방법의 다른 예를 도시한 순서도이다.12 is a flowchart illustrating another example of the control method of FIG. 10.
이하에서는 도면을 참고하여 본 발명의 실시예에 따른 치료용 RF 에너지 전달 장치 및 이의 제어방법에 대해 구체적으로 설명하도록 한다. 아래의 설명에서 각 구성요소의 위치관계는 원칙적으로 도면을 기준으로 설명한다. 그리고 도면은 설명의 편의를 위해 발명의 구조를 단순화하거나 필요할 경우 과장하여 표시될 수 있다. 따라서 본 발명이 이에 한정되는 것은 아니며 이 이외에도 각종 장치를 부가하거나, 변경 또는 생략하여 실시할 수 있음은 물론이다.Hereinafter, a therapeutic RF energy delivery device and a control method thereof according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the following description, the positional relationship of each component is explained based on the drawings in principle. In addition, the drawings may be displayed by simplifying the structure of the invention or by exaggerating if necessary for the convenience of description. Therefore, the present invention is not limited thereto, and various other devices may be added, modified or omitted.
또한, 본 실시예는 RF 에너지를 전달하여 체내 지방을 줄이는 장치를 중심으로 설명하나, 이는 일 예이며 본 발명이 이에 한정되는 것은 아니다. 이 이외에도, RF 에너지를 치료 부위에 전달하여 치료를 진행하는 다양한 장치에 적용될 수 있음을 밝혀둔다.In addition, the present embodiment will be described with reference to a device for reducing body fat by transmitting RF energy, but this is an example and the present invention is not limited thereto. In addition, it is noted that the RF energy can be applied to various devices for carrying out treatment by delivering RF energy to the treatment site.
도 1은 본 발명에 따른 치료를 위한 RF 에너지 전달 장치의 사시도이다. 도시된 바와 같이, 본 발명에 따른 RF 에너지 전달 장치는 몸체부(100), 연결부(200) 및 어플리케이터(300)를 포함하여 구성된다.1 is a perspective view of an RF energy delivery device for treatment in accordance with the present invention. As shown, the RF energy delivery device according to the present invention comprises a body portion 100, the connection portion 200 and the applicator 300.
몸체부(100)는 장치의 주요 외관을 형성하며, 내부에는 장치를 동작하기 위한 각종 구성요소가 구비된다. 외부 전원과 연결되어 내부에 전원을 공급하는 전원 공급부(미도시)가 구비될 수 있으며, RF 에너지를 발생시키기 위한 RF 발생부(430) 및 이를 전달하기 위한 전기 회로가 구비될 수 있고, 이 이외에도 각종 구성요소를 제어하기 위한 제어 회로 등이 구비될 수 있다. 몸체부(100)의 외면에는 사용자가 조작하거나, 사용자에게 각종 정보를 표시하기 위한 인터페이스(120)가 구비될 수 있다. Body portion 100 forms the main appearance of the device, the inside is provided with various components for operating the device. A power supply unit (not shown) connected to an external power source may be provided to supply power therein. An RF generator 430 for generating RF energy and an electric circuit for transmitting the same may be provided. Control circuits for controlling various components may be provided. The outer surface of the body portion 100 may be provided with an interface 120 for the user to manipulate or display various information to the user.
어플리케이터(300)는 환자의 치료 부위와 인접하도록 배치되어 환자의 치료 위치로 RF 에너지를 인가하는 구성이다. 어플리케이터(300)는 어플리케이터 바디(310), RF 전달부(460), 냉각부(330), 센서부(320) 등을 포함하여 구성되며, 각 구성은 아래에서 구체적으로 설명한다.The applicator 300 is configured to be adjacent to the treatment site of the patient to apply RF energy to the treatment location of the patient. The applicator 300 is configured to include an applicator body 310, the RF transmission unit 460, the cooling unit 330, the sensor unit 320, etc., each configuration will be described in detail below.
연결부(200)는 몸체부(100)와 어플리케이터(300)를 기구적으로 연결하는 구성으로, 복수의 관절을 갖는 링크 구조로 구성될 수 있다. 이에 의해, 환자의 치료 위치로 어플리케이터의 위치를 조절하고, 치료 중 위치를 고정시킬 수 있다. 연결부(200)의 내부에는 각종 케이블(미도시)이 배치되어, 몸체부(100)와 어플리케이터(300)를 전기적으로 연결하며, 일측에서 발생되는 제어 관련 신호를 타측으로 전송할 수 있도록 구성된다.The connection part 200 is configured to mechanically connect the body part 100 and the applicator 300, and may be configured as a link structure having a plurality of joints. Thereby, the position of the applicator can be adjusted to the treatment position of the patient, and the position during the treatment can be fixed. Various cables (not shown) are disposed inside the connection part 200 to electrically connect the body part 100 and the applicator 300 and to transmit control-related signals generated from one side to the other side.
도 2는 도 1의 RF 에너지 전달 장치의 주요 구성을 도시한 블록도이다. 이하에서는 도 2를 참조하여 장치의 각종 구성에 대해 보다 구체적으로 설명한다.2 is a block diagram showing the main configuration of the RF energy transfer device of FIG. Hereinafter, various configurations of the apparatus will be described in more detail with reference to FIG. 2.
도 2에 도시된 바와 같이, 몸체부(100)는 전원 공급부(110), RF 발생부(430), 인터페이스(120), 데이터 저장부(130) 및 제어부(140)를 포함하여 구성된다. 그리고, 어플리케이터(300)는 RF 전달부(460), 센서부(320) 및 냉각부(330)를 포함하여 구성된다.As shown in FIG. 2, the body part 100 includes a power supply 110, an RF generator 430, an interface 120, a data storage 130, and a controller 140. In addition, the applicator 300 includes an RF transmission unit 460, a sensor unit 320, and a cooling unit 330.
전원 공급부(110)는 외부 전원과 연결되는 구성이다. 그리고, RF 발생부, 인터페이스, 냉각부를 비롯한 장치 내부의 각종 구성 요소와 연결되어 전원을 공급한다.The power supply unit 110 is connected to an external power source. In addition, it is connected to various components inside the apparatus including the RF generator, the interface, and the cooling unit to supply power.
RF 발생부(430)는 전원 공급부(110)에서 인가되는 전원을 이용하여 RF 에너지를 발생시킨다. 본 실시예에 따른 RF 발생부(430)는 27.12MHz의 주파수를 갖는 RF 에너지를 발생시키도록 구성되며, 이 이외에도 13.553~13.567MHz, 26.975~27.283MHz, 40.66~40.70MHz 등과 같이 ISM 대역의 주파수에 해당하는 RF 에너지를 발생시키도록 구성할 수 있다.The RF generator 430 generates RF energy by using the power applied from the power supply 110. The RF generator 430 according to the present exemplary embodiment is configured to generate RF energy having a frequency of 27.12 MHz, and in addition to the frequency of the ISM band such as 13.553 to 13.567 MHz, 26.975 to 27.283 MHz, and 40.66 to 40.70 MHz. It can be configured to generate a corresponding RF energy.
RF 발생부(430)에서 발생되는 RF 에너지는 RF 회로부(400)를 통해 RF 전달부(460)로 전송되어 환자의 치료 부위로 전달된다. 이러한 RF 회로부(400)의 구성은 이하에서 보다 구체적으로 설명하도록 한다.The RF energy generated by the RF generator 430 is transmitted to the RF transmitter 460 through the RF circuit unit 400 and transferred to the treatment site of the patient. The configuration of the RF circuit unit 400 will be described in more detail below.
한편, 인터페이스(120)는 전술한 바와 같이, 몸체부(100)의 외면에 구비되어, 사용자가 치료 모드 등을 설정하고, 사용자에게 각종 정보를 표시하는 구성이다. 이러한 인터페이스(120)는 제어부(140)와 연결되어, 사용자로부터 입력되는 제어 신호를 제어부로 전송하고, 제어부(140)로부터 수집/연산되는 각종 치료 정보를 인터페이스(120)를 통해 사용자에게 표시한다. 인터페이스(120)는 컨트롤 패널, 터치 스크린과 같은 다양한 입력 장치와 디스플레이, 스피커 등을 포함하는 각종 표시 장치를 이용하여 다양하게 구성할 수 있다. 일 예로서, 본 실시예의 인터페이스(120)는 터치 스크린을 이용하여 구성되며, 사용자는 터치 스크린을 터치하는 방식으로 설정 정보를 입력하고, 각종 치료 정보는 터치 스크린의 화면을 통해 사용자에게 표시될 수 있다.On the other hand, the interface 120, as described above, is provided on the outer surface of the body portion 100, the user sets the treatment mode, etc., and is configured to display various information to the user. The interface 120 is connected to the control unit 140, transmits a control signal input from the user to the control unit, and displays various treatment information collected / operated from the control unit 140 to the user through the interface 120. The interface 120 may be variously configured using various input devices such as a control panel and a touch screen, and various display devices including a display and a speaker. As an example, the interface 120 of the present embodiment is configured using a touch screen, a user inputs setting information by touching the touch screen, and various treatment information may be displayed to the user through a screen of the touch screen. have.
데이터 저장부(130)는 장치의 구동시 필요한 다양한 정보를 저장하는 구성으로, 사용자의 입력 사항 또는 치료 중 감지되는 정보에 대응되는 다양한 알고리즘을 저장할 수 있다. 따라서, 제어부(140)는 데이터 저장부(130)에 저장된 정보에 근거하여 장치의 각 구성을 제어할 수 있다.The data storage unit 130 stores various information necessary for driving the device, and may store various algorithms corresponding to user input items or information detected during treatment. Therefore, the controller 140 may control each component of the device based on the information stored in the data storage unit 130.
한편, 어플리케이터(300)에 구비되는 RF 전달부(460)는 RF 발생부(430)에서 발생되는 RF 에너지를 전달받아, 환자의 치료위치로 전달한다. RF 전달부(460)는 복수의 안테나 구조로 구비되고, 치료 위치와 전기적으로 이격되도록 배치되어 비접촉 방식으로 치료 위치에 RF 에너지를 전달한다. 여기서, '전기적으로 이격'되는 '비접촉'방식이라 함은 RF 에너지가 송출되는 부분과 치료 위치가 전기적으로 이격되고 접촉하지 않는다는 것을 의미한다. 따라서, 전달부와 치료 위치의 사이에는 별도의 구성 없이 에어갭이 형성되는 구조일 수 있으며, 또는 전기절연성의 물질로 구성된 별도의 스페이서(미도시) 부재가 간격 유지를 위해 전달부와 치료 위치 사이에 개재되도록 배치된 구조일 수도 있다.On the other hand, the RF transmitter 460 provided in the applicator 300 receives the RF energy generated from the RF generator 430, and delivers to the treatment position of the patient. The RF transmitter 460 is provided with a plurality of antenna structures and is disposed to be electrically spaced from the treatment position to transmit RF energy to the treatment position in a non-contact manner. Here, the term "electrically spaced apart" means that the portion where the RF energy is transmitted and the treatment location are electrically spaced apart and do not come into contact with each other. Therefore, the air gap may be formed without any configuration between the delivery unit and the treatment position, or a separate spacer member (not shown) made of an electrically insulating material may be disposed between the delivery unit and the treatment position to maintain a gap. It may be a structure arranged to be interposed in.
본 실시예의 RF 전달부(460)는 어플리케이터 바디(310)의 양측에 배치되는 2개의 안테나 구조로 구성된다. 2개의 RF 전달부는, 치료 중 RF의 진행 경로가 치료 위치를 통과하도록, 치료 위치의 양측에 배치된다. RF 전달부(460)로부터 RF 에너지가 전달되면, 치료 위치가 에너지를 흡수하여 온도가 상승하면서 치료가 이루어진다. 이러한 RF 전달부(460)는 소정 면적을 갖는 평면 구조로 구성되며, 치료 위치의 면적을 고려하여 이에 상응하는 면적을 갖도록 구성할 수 있다.The RF transmitter 460 of this embodiment is composed of two antenna structures disposed on both sides of the applicator body 310. The two RF transmitters are disposed on both sides of the treatment position such that the path of progression of the RF during treatment passes through the treatment position. When the RF energy is transmitted from the RF transmitter 460, the treatment location absorbs the energy and the treatment is performed while the temperature is increased. The RF transmitter 460 has a planar structure having a predetermined area, and may be configured to have a corresponding area in consideration of the area of the treatment location.
한편, 센서부(320)는 치료 중 치료 위치의 온도를 감지하는 온도 센서를 포함하여 구성된다. 이에 의해, 치료 중 치료 위치가 지나치게 상승하여 피부 표면에 열적 손상이 발생하는 것을 방지할 수 있다. 일 예로, 센서부(320)는 적외선 센서로 구성되어 치료 위치와 접촉하지 않은 상태에서 피부 표면의 온도를 측정할 수 있도록 구성될 수 있다. On the other hand, the sensor unit 320 is configured to include a temperature sensor for sensing the temperature of the treatment position during treatment. Thereby, it can prevent that a treatment position rises too much during treatment, and thermal damage arises on a skin surface. For example, the sensor unit 320 may be configured as an infrared sensor so that the temperature of the surface of the skin may be measured while not in contact with the treatment position.
냉각부(330)는 치료 중 피부 표면이 과열되는 것을 방지할 수 있도록, 피부 표면을 냉각시키는 구성이다. 냉각부(330)는 센서부(320)에서 감지되는 온도 정보에 근거하여, 치료 프로세스 중 선택적으로 구동하도록 제어된다. 냉각부(330)는 다양한 냉각 구조를 이용하여 구성할 수 있으며, 본 실시예의 냉각부(330)는 치료 위치에 접촉하지 않은 상태에서 피부 표면을 냉각시킬 수 있도록 냉각팬 구조를 이용하여 구성된다.The cooling unit 330 is configured to cool the skin surface to prevent the skin surface from overheating during treatment. The cooling unit 330 is controlled to selectively drive during the treatment process based on the temperature information detected by the sensor unit 320. The cooling unit 330 may be configured using various cooling structures, and the cooling unit 330 of the present embodiment is configured using a cooling fan structure to cool the skin surface without contacting the treatment position.
한편, 제어부(140)는 RF 발생부의 출력, RF 회로의 임피던스, 냉각부의 동작 여부 등 장치의 각종 구성 요소의 동작을 제어하는 구성이다. 제어부(140)는 사용자가 인터페이스(120)를 통해 입력한 설정 정보를 전달받고, 데이터 저장부(130)에 기 저장된 내용을 참조하여, 각종 구성요소를 제어한다. 또한, 치료 중 센서부(320)에서 감지되는 정보는 제어부(140)로 전달되며, 제어부(140)는 이를 반영하여 최적의 치료를 진행할 수 있도록 장치의 동작 내용을 제어한다.On the other hand, the control unit 140 is a configuration for controlling the operation of various components of the device, such as the output of the RF generator, the impedance of the RF circuit, the operation of the cooling unit. The controller 140 receives the setting information input by the user through the interface 120, and controls various components by referring to contents previously stored in the data storage unit 130. In addition, the information detected by the sensor unit 320 during the treatment is transmitted to the controller 140, and the controller 140 controls the operation contents of the device to reflect the information and proceed to the optimal treatment.
도 3은 도 1의 RF 에너지 전달 장치에 의한 치료 상태를 도시한 도면이다. 전술한 바와 같이, 본 실시예에 따른 장치는 두 개의 RF 전달부(460)가 치료 위치에 이격 배치된 상태에서 RF 에너지를 환자(P)의 치료 위치에 전달하는 방식으로 치료가 진행된다. 치료는 치료 위치의 피하 지방을 줄이기 위한 목적으로 이루어진다. 피하 지방(P의 빗금친 영역)은 섭씨 45도 이상의 온도로 소정 시간 동안 유지됨에 따라 지방 세포의 사멸 등의 원인으로 인해 피하 지방의 체적이 줄어든다. 따라서, 제어부(140)는 RF 전달부(460)를 통해 RF 에너지를 치료 위치에 전달하여 피하 지방의 온도를 소정 시간 동안 섭씨 45도 내지 50도의 치료 온도 범위로 상승시킴으로써 치료를 진행한다.3 is a diagram illustrating a treatment state by the RF energy delivery device of FIG. 1. As described above, in the apparatus according to the present embodiment, the treatment is performed by transmitting RF energy to the treatment position of the patient P while two RF transmitting units 460 are spaced apart from the treatment position. Treatment is aimed at reducing subcutaneous fat at the treatment site. As the subcutaneous fat (hatched area of P) is maintained at a temperature of 45 degrees Celsius or more for a predetermined time, the volume of the subcutaneous fat decreases due to the death of fat cells and the like. Therefore, the controller 140 transmits the RF energy to the treatment position through the RF transmitter 460 to increase the temperature of the subcutaneous fat to a treatment temperature range of 45 degrees to 50 degrees Celsius for a predetermined time.
이러한 치료 내용은 다양한 방식으로 설계될 수 있으나, 본 실시예에 따른 제어부(140)는 치료 프로세스를 3개의 구간으로 구분하여 치료를 진행할 수 있다. 우선, 제1 구간에서는 RF 전달부(460)를 통해 높은 출력의 RF 에너지를 전달하여 피하 지방의 온도를 정상 온도로부터 치료 온도에 인접한 온도까지 급속으로 상승시키고, 제2 구간에서는 제1 구간보다 낮은 출력으로 RF 에너지를 전달하여 피하 지방의 온도를 치료 온도까지 완만하게 상승시키며, 제3 구간에서는 제2 구간보다 낮은 출력으로 RF 에너지를 전달하여 피하 지방의 온도를 치료 온도 범위에서 유지하도록 제어할 수 있다. 그리고, 센서부(320)를 통해 피부 온도가 지나치게 상승하면, 냉각부(330)를 구동하여 피부 표면을 선택적으로 냉각시키도록 구동한다. 이에 의할 경우, 피하 지방의 온도가 실질적인 치료가 이루어지는 치료 온도 범위에 도달하는 시간을 줄임으로서, 전체 치료 시간을 줄일 수 있는 장점이 있다. 다만, 이러한 제어 내용은 일 예로서, 이 이외에도 다양한 방식으로 설계하는 것도 가능하다.The treatment content may be designed in various ways, but the controller 140 according to the present embodiment may divide the treatment process into three sections and proceed with the treatment. First, in the first section, the RF energy of the high power is transmitted through the RF transmitter 460 to rapidly increase the temperature of the subcutaneous fat from the normal temperature to the temperature adjacent to the treatment temperature. By transmitting RF energy to the output, the temperature of the subcutaneous fat is gradually raised to the treatment temperature, and in the third section, the RF energy is delivered to the output lower than the second section to control the temperature of the subcutaneous fat to be maintained in the treatment temperature range. have. When the skin temperature rises excessively through the sensor unit 320, the cooling unit 330 is driven to selectively cool the skin surface. In this case, by reducing the time for the temperature of the subcutaneous fat to reach the treatment temperature range where the actual treatment is made, there is an advantage that can reduce the overall treatment time. However, the control content is an example, and in addition to this, it is also possible to design in various ways.
도 4는 도 1의 RF 회로를 개략적으로 도시한 회로도이다. 도 4에 도시된 바와 같이, RF 회로부(400)는 RF 공급부(410) 및 RF 출력부(420)를 포함하여 구성된다.4 is a circuit diagram schematically illustrating the RF circuit of FIG. 1. As shown in FIG. 4, the RF circuit unit 400 includes an RF supply unit 410 and an RF output unit 420.
RF 공급부(410)는 RF 발생부(430) 및 RF 발생부와 연결되는 제1 회로(440)로 구성된다. 제1 회로(440)는 RF 공급부(410)의 임피던스를 조절할 수 있는 제1 임피던스 변환부(441)를 포함하여 구성된다.The RF supply unit 410 is composed of an RF generator 430 and a first circuit 440 connected to the RF generator. The first circuit 440 includes a first impedance converter 441 that can adjust the impedance of the RF supply unit 410.
RF 출력부(420)는 제1 회로(440)부터 전력 전달 가능하게 구성되는 제2 회로(450) 및 제2 회로와 연결되어 RF 에너지를 치료 위치로 전달하는 RF 전달부(460)를 포함하여 구성된다. 제2 회로(450)는 RF 출력부(420)의 임피던스를 조절할 수 있는 제2 임피던스 변환부(451)를 포함하여 구성된다.The RF output unit 420 includes a second circuit 450 configured to transmit power from the first circuit 440 and an RF transmitter 460 connected to the second circuit to transfer RF energy to a treatment position. It is composed. The second circuit 450 includes a second impedance converter 451 that can adjust the impedance of the RF output unit 420.
여기서, RF 발생부(430) 및 제1 회로(440)는 장치의 몸체부(100)에 구비되며, 제2 회로(450)는 몸체부(100)로부터 연결부(200)를 거쳐 어플리케이터(300)에 이르도록 구성되며, RF 전달부(460)는 어플리케이터(300)에 설치될 수 있다. 다만, 본 발명이 이에 한정되는 것은 아니며, RF 발생부, 제1 회로, 제2 회로가 모두 어플리케이터가 구비되도록 구성하는 등, 각 구성의 설치 위치는 다양하게 변경하여 실시할 수 있다.Here, the RF generator 430 and the first circuit 440 is provided in the body portion 100 of the device, the second circuit 450 from the body portion 100 via the connection portion 200 to the applicator 300 Is configured to reach, the RF transmitter 460 may be installed in the applicator (300). However, the present invention is not limited thereto, and the installation positions of the respective configurations may be variously changed and implemented such that the RF generator, the first circuit, and the second circuit are all provided with an applicator.
여기서, 회로라 함은 직접적으로 연결되는 전기적 경로를 뿐 아니라, 유도 방식에 의해 트랜스 구조은 유도 방식으로 간접적으로 연결되는 전기적 경로를 포함하는 의미이다. 따라서, 도 4에서 제1 회로 또는 제2 회로는 각각 하나의 폐루프를 구성하는 것으로 도시되어 있으나, 이는 설명의 편의를 위한 것으로 제1 회로 또는 제2 회로는 자체적인 트랜스 구조 등을 이용하여 간접적인 전기적 경로를 구성하도록 구성하는 것도 가능하다.Here, the circuit means not only an electrical path that is directly connected, but a trans structure by an induction method includes an electrical path that is indirectly connected by an induction method. Therefore, in FIG. 4, the first circuit or the second circuit is illustrated as constituting one closed loop. However, this is for convenience of description and the first circuit or the second circuit may be indirectly using its own trans structure. It is also possible to configure to form an electrical path.
이러한 RF 회로부(400)는 RF 공급부(410) 측에서 발생되는 RF 에너지가 트랜스 등의 전력 전달 구조를 통해 RF 출력부(420)로 전달되며, 전달된 RF 에너지는 RF 전달부(460)를 통해 치료 위치로 전달된다. 다만, RF 회로부(400)에서 RF 공급부(410)와 RF 출력부(420) 측의 임피던스 매칭이 이루어지지 않은 경우, RF 공급부(410) 측으로 RF 에너지가 반사된다. 이처럼 반사되는 반사파의 크기가 큰 경우, RF 전달부(460)를 통해 충분한 RF 에너지가 치료 위치로 전달되지 못한다. 따라서, 목표하는 치료 효과를 볼 수 없거나, 치료 시간이 지연되는 단점이 있다. 나아가, 반사파의 크기가 증가할 경우, RF 발생부(430)를 손상시키는 문제를 일으킬 수도 있다. 따라서, 이러한 반사파를 최소화하기 위해 장치 설계시 제1 회로(440)와 제2 회로(450)를 설계하는 것이 일반적이나, 본 발명에 따른 장치는 RF 전달부(460)를 통한 임피던스가 환자 특성 등의 치료 환경에 따라 크게 가변적인 구조이다. 즉, 환자의 피하 지방의 체적, 형상, 조직 특성 및 이격 거리, 그리고 치료 환경의 습도 및 온도 등에 따라 RF 출력부 측의 전체 임피던스가 상이하게 결정된다. 따라서, 본 발명은 제1 회로(440)에 제1 임피던스 변환부(441)를 구비하고, 제2 회로(450)에 제2 임피던스 변환부(451)를 구비하여, RF 공급부(410) 측으로 반사되는 반사파를 줄일 수 있도록 각 임피던스를 조절할 수 있도록 구성한다. 이에 의해, 치료시마다 치료 환경의 특성을 반영하여 RF 회로를 구성함으로써, 효과적인 치료를 진행할 수 있다.In the RF circuit unit 400, RF energy generated from the RF supply unit 410 is transferred to the RF output unit 420 through a power transmission structure such as a transformer, and the transferred RF energy is transmitted through the RF transmission unit 460. Delivered to the treatment site. However, when impedance matching between the RF supply unit 410 and the RF output unit 420 is not performed in the RF circuit unit 400, RF energy is reflected to the RF supply unit 410. When the reflected wave is large in size, sufficient RF energy may not be transmitted to the treatment position through the RF transmitter 460. Therefore, there is a disadvantage that the target therapeutic effect is not seen or the treatment time is delayed. In addition, when the size of the reflected wave increases, it may cause a problem of damaging the RF generator 430. Therefore, the first circuit 440 and the second circuit 450 in the design of the device is generally designed to minimize the reflected wave, the device according to the present invention, the impedance through the RF transmission unit 460, such as patient characteristics, etc. The structure is greatly variable depending on the treatment environment. That is, the total impedance on the RF output side is determined differently according to the volume, shape, tissue characteristics and separation distance of the patient's subcutaneous fat, humidity and temperature of the treatment environment. Therefore, the present invention includes a first impedance converter 441 in the first circuit 440 and a second impedance converter 451 in the second circuit 450 to be reflected to the RF supply unit 410. Each impedance can be adjusted to reduce the reflected wave. Thereby, the RF circuit is configured to reflect the characteristics of the treatment environment at each treatment, so that effective treatment can be performed.
도 5는 도 4의 제1 임피던스 변환부를 도시한 회로도이고, 도 6은 도 4의 제2 임피던스 변환부를 도시한 사시도이다. 본 실시예의 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)는 정전 용량값(capacitance)을 조절할 수 있도록 구성되며, 이러한 구성은 다양한 종류의 소자를 이용하여 구성될 수 있다.FIG. 5 is a circuit diagram illustrating the first impedance converter of FIG. 4, and FIG. 6 is a perspective view illustrating the second impedance converter of FIG. 4. The first impedance converter 441 and the second impedance converter 451 of the present exemplary embodiment may be configured to adjust capacitance values. Such a configuration may be configured using various kinds of devices.
일 예로, 도 5에 도시된 바와 같이, 제1 임피던스 변환부(441)는 상이한 용량값을 갖는 복수의 캐패시터(C1 내지 C6)가 병렬로 배치되는 구조로 구성될 수 있다. 스위칭 소자(S)는 복수개의 캐패시터에 택일적으로 연결되도록 구비되어, 스위칭 소자의 연결 위치를 조절함으로써 제1 임피던스 변환부(441)의 임피던스 값(이하, '제1 임피던스'라 함)을 단속적으로 조절하는 것이 가능하다.For example, as illustrated in FIG. 5, the first impedance converter 441 may have a structure in which a plurality of capacitors C1 to C6 having different capacitance values are arranged in parallel. The switching element S is provided to be alternatively connected to the plurality of capacitors to intermittently adjust the impedance value of the first impedance converter 441 (hereinafter referred to as 'first impedance') by adjusting the connection position of the switching element. It is possible to adjust with.
제2 임피던스 변환부(451)는 가변 캐패시터로 구성될 수 있다. 일 예로, 도 6에 도시된 바와 같이, 제2 임피던스 변환부(451)의 가변 캐패시터는 캐패시터를 구성하는 일측 극판(451a)이 180도 회전 가능하도록 구성된다. 이러한 가변 캐패시터는 회전 가능한 일측 극판(451a)의 회전 각도를 제어하여, 고정된 타측 극판(451b)과 상대하는 면적의 크기를 변화시킴으로써 임피던스 값(이하, '제2 임피던스'라 함)을 연속적으로 조절하는 것이 가능하다.The second impedance converter 451 may be configured as a variable capacitor. For example, as illustrated in FIG. 6, the variable capacitor of the second impedance converter 451 is configured such that one side plate 451a constituting the capacitor is rotatable 180 degrees. The variable capacitor controls the rotation angle of the rotatable one side electrode plate 451a to continuously change the impedance value (hereinafter referred to as 'second impedance') by changing the size of the area that is opposed to the fixed other side electrode plate 451b. It is possible to adjust.
여기서, 제1 임피던스 변환부(441)는 정전 용량값의 차이가 큰 복수의 캐패시터를 포함하여 구성하여 정전 용량값의 가변 범위를 상대적으로 크게 구성하고, 제2 임피던스 변환부(451)는 정전 용량값의 가변 범위를 상대적으로 작게 구성할 수 있다. 다만, 이러한 제1 임피던스 변환부(441)와 제2 임피던스 변환부(451)의 구성은 일 예이며, 이 이외에도 다양한 전기 소자를 이용하여 구성하는 것도 가능하다.Here, the first impedance converter 441 comprises a plurality of capacitors having a large difference in capacitance values to configure a relatively large range of capacitance values, and the second impedance converter 451 has a capacitance The variable range of values can be configured to be relatively small. However, the configuration of the first impedance converter 441 and the second impedance converter 451 is an example, and may be configured by using various electric elements.
한편, 제어부(140)는 본 실시예에 따른 장치를 이용하여 치료를 진행함에 있어, RF 발생부(430) 측으로 전달되는 반사파의 크기를 줄일 수 있도록 제1 임피던스 변환부의 임피던스 값 및 제2 임피던스 변환부의 임피던스 값을 설정한다. 구체적으로, 제어부(140)는 제1 임피던스 값과 제2 임피던스 값에 의해 조합 가능한 모든 임피던스 조합으로 조절하면서, 각 조합에 따른 RF 회로부(400)에서의 반사파의 크기를 모니터링 한다. 그리고, 모니터링된 결과에 따라 적합한 임피던스 조합을 선택하여 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)의 임피던스 값을 설정할 수 있다.In the meantime, the controller 140 performs the treatment using the apparatus according to the present embodiment, so that the impedance value of the first impedance converter and the second impedance converter may be reduced to reduce the magnitude of the reflected wave transmitted to the RF generator 430. Set negative impedance value. Specifically, the control unit 140 monitors the magnitude of the reflected wave in the RF circuit unit 400 according to each combination while adjusting to all combinations of impedances that can be combined by the first impedance value and the second impedance value. The impedance combination of the first impedance converter 441 and the second impedance converter 451 may be set by selecting an appropriate impedance combination according to the monitored result.
도 7은 임피던스 변화에 대한 반사파의 크기를 나타낸 그래프이다. 구체적으로, 도 7은 제1 임피던스 변환부(441)를 제1 캐패시터(C1)에 고정시킨 상태에서, 제2 임피던스 변환부(451)의 일측 극판을 180도 회전시켜 제2 임피던스 값을 가변시킴에 따라 반사되는 반사파의 크기를 나타낸 것이다. 제어부(140)는 이와 같이 각 임피던스 조합에 따른 반사파의 크기를 모니터링하며, 제1 임피던스 변환부의 경우 제1 캐패시터(C1) 뿐 아니라 6개의 모든 캐패시터(C1 내지 C2)에 대해 각각 제2 임피던스 변환부(451)의 임피던스 값을 변환시켜, 가능한 모든 조합에 따른 반사파의 크기를 모니터링 한다.7 is a graph showing the magnitude of the reflected wave with respect to the impedance change. Specifically, in FIG. 7, the first impedance converter 441 is fixed to the first capacitor C1 to rotate the one side plate of the second impedance converter 451 by 180 degrees to vary the second impedance value. This shows the magnitude of the reflected wave. In this way, the controller 140 monitors the magnitude of the reflected wave according to each impedance combination. In the case of the first impedance converter, each of the six capacitors C1 to C2, as well as the first capacitor C1, is the second impedance converter. By converting the impedance value of 451, the magnitude of the reflected wave according to all possible combinations is monitored.
모니터링 결과, 제어부(140)는 반사파의 크기가 기 설정된 기준값 이하로 나타난, 임피던스 조합들을 추출할 수 있다. 기준값은 다양한 방식으로 설정될 수 있으며, 일 예로 전압 정재파비(VSWR, voltage standing wave ratio)로 기준값을 설정할 수 있다. 구체적으로, 기준값은 전압 정재파비가 1.3 내지 1.7인 범위에서 설정할 수 있으며, 본 실시예에서는 전압 정재파비가 1.5인 상태를 기준값으로 한다. As a result of the monitoring, the controller 140 may extract impedance combinations in which the magnitude of the reflected wave is equal to or less than a preset reference value. The reference value may be set in various ways. For example, the reference value may be set by a voltage standing wave ratio (VSWR). Specifically, the reference value may be set in a range in which the voltage standing wave ratio is 1.3 to 1.7. In this embodiment, the reference value is assumed to be a state in which the voltage standing wave ratio is 1.5.
도 7에 의할 경우, 두 개의 임피던스 조합(P1, P2)이 기준값 이하의 반사파가 발생되는 케이스로 추출된다. 다만, 도 7은 제1 임피던스 변환부의 값이 C1으로 고정된 상태의 그래프이므로, 제1 임피던스 변환부(441)가 C2 내지 C6로 변환됨에 따라 보다 많은 조합이 추출될 수 있다. 제어부(140)는 추출된 임피던스 조합 중 적합한 하나를 택일하여 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)의 값을 설정할 수 있다.According to FIG. 7, two impedance combinations P1 and P2 are extracted as cases in which reflected waves below the reference value are generated. However, since FIG. 7 is a graph in which the value of the first impedance converter is fixed to C1, more combinations may be extracted as the first impedance converter 441 is converted to C2 to C6. The controller 140 may select one of the extracted impedance combinations and set values of the first impedance converter 441 and the second impedance converter 451.
도 8 및 도 9는 추출된 임피던스 조합의 두 예를 도시한 그래프이다. 제어부(140)는 추출된 임피던스 조합 중 전압 정재파비가 가장 낮은 값을 갖는 임피던스 조합을 설정 임피던스로 선택할 수도 있으나, 본 실시예에서는 추출된 임피던스 조합 중 임피던스 대비 전압 정재파비의 변화율을 고려하여 설정 임피던스를 선택한다. 도 8은 가장 낮은 전압 정재파비를 나타내지만, 임피던스가 변화하는 경우 반사파의 비율이 크게 증가하여 기준값을 초과할 수 있다. 반면, 도 9는 도 8과 비교하여 높은 전압 정재파피를 나타내나 임피던스가 변화하더라도 반사파의 크기는 상대적으로 크게 증가하지 않으면서 기준값 이하를 유지하게 된다. 8 and 9 are graphs showing two examples of extracted impedance combinations. The controller 140 may select the impedance combination having the lowest value of the voltage standing wave ratio among the extracted impedance combinations as the set impedance, but in this embodiment, the set impedance is considered in consideration of the change rate of the voltage standing wave ratio to the impedance among the extracted impedance combinations. Choose. Although FIG. 8 shows the lowest voltage standing wave ratio, when the impedance is changed, the ratio of the reflected wave may be greatly increased to exceed the reference value. On the other hand, FIG. 9 shows a higher voltage standing wave compared to FIG. 8, but the reflected wave is maintained below the reference value without relatively increasing the magnitude of the reflected wave even when the impedance is changed.
본 실시예에 따른 장치를 이용하여 치료를 진행하는 동안, 환자가 자세를 고쳐잡으면서 치료 위치가 미세하게 이동하거나, 치료 환경의 온도 또는 습도 변화 등의 원인에 의해 RF 출력부(420)측의 임피던스는 변화할 수 있다. 이 경우, 도 8 대비 도 9의 임피던스 조합이 치료 중 임피던스가 변화하더라도 보다 균일한 치료 성능을 나타낼 수 있는 장점이 있다. 따라서, 본 실시예서는 기준값 이하를 만족하는 임피던스 조합 중 임피던스 변화에 따른 반사파의 변화율이 가장 적은 임피던스 조합을 설정 임피던스 조합으로 선택한다. 그리고, 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)를 설정 임피던스 조합으로 설정하여, 치료 동작을 수행할 수 있다.During the treatment using the apparatus according to the present embodiment, the treatment position is finely moved while the patient is correcting the posture, or the RF output unit 420 is caused by a change in temperature or humidity in the treatment environment. The impedance can vary. In this case, the impedance combination of FIG. 9 compared to FIG. 8 has an advantage of exhibiting more uniform treatment performance even if the impedance changes during treatment. Therefore, in the present embodiment, the impedance combination having the smallest change rate of the reflected wave according to the impedance change among the impedance combinations satisfying the reference value or less is selected as the set impedance combination. The first impedance converter 441 and the second impedance converter 451 may be set to a combination of set impedances to perform a treatment operation.
나아가, 제어부(140)는 치료가 진행되는 동안 RF 공급부(410) 측으로 반사되는 반사파의 크기를 지속적으로 모니터링할 수 있다. 전술한 바와 같이, 치료 중 다양한 원인에 의해 RF 출력부(420)측의 임피던스 값이 변화하고, 일부의 경우에는 반사파의 크기가 기준값을 초과할 수 있다. 이 경우, 제어부(140)는 반사파의 크기를 기준값 이하로 낮출 수 있도록, 설정된 임피던스 조합으로부터 임피던스 값을 조절할 수 있다. 다만, 치료 중 발생되는 RF 출력부(420)의 임피던스 변화는 상대적으로 미세하므로, 제1 임피던스 변환부(441)의 임피던스는 고정된 상태에서, 제2 임피던스 변환부(451)의 임피던스만을 조절할 수 있다.In addition, the controller 140 may continuously monitor the magnitude of the reflected wave reflected to the RF supply unit 410 while the treatment is in progress. As described above, the impedance value of the RF output unit 420 may be changed by various causes during treatment, and in some cases, the magnitude of the reflected wave may exceed the reference value. In this case, the controller 140 may adjust the impedance value from the set impedance combination to reduce the magnitude of the reflected wave to a reference value or less. However, since the impedance change of the RF output unit 420 generated during the treatment is relatively minute, the impedance of the first impedance converter 441 may be adjusted, and only the impedance of the second impedance converter 451 may be adjusted. have.
구체적으로, 치료 중 반사파의 크기가 기준값 이상인 것으로 모니터링되면, 제어부(140)는 제2 임피던스 변환부(451)의 임피던스를 조절한다. 이때, 제어부(140)는 제2 임피던스 변환부(451)의 임피던스 값을 증가하는 방향 및 감소하는 방향으로 각각 회전시키면서 반사파의 크기를 모니터링 한 후, 반사파의 크기가 감소되는 방향으로 제2 임피던스 변환부(451)의 임피던스를 조절할 수 있다. 이처럼, 반사파의 크기가 다시 기준값 이하가 되도록 제2 임피던스 값을 조절함으로써, 치료 환경 변화에도 불구하고 균일한 치료 효과를 볼 수 있다.In detail, when the magnitude of the reflected wave during the treatment is monitored to be greater than or equal to the reference value, the controller 140 adjusts the impedance of the second impedance converter 451. At this time, the control unit 140 monitors the magnitude of the reflected wave while rotating in the direction of increasing and decreasing the impedance value of the second impedance converter 451, respectively, and then converts the second impedance in the direction of decreasing the magnitude of the reflected wave. The impedance of the unit 451 may be adjusted. As such, by adjusting the second impedance value such that the magnitude of the reflected wave is less than or equal to the reference value, a uniform treatment effect can be seen despite the change in the treatment environment.
이하에서는 도 10 및 도 11을 참조하여 본 실시예에 따른 RF 에너지 전달장치의 제어방법에 대해 구체적으로 설명한다. 도 10은 도 1의 RF 에너지 전달 장치의 제어 방법을 도시한 순서도이고, 도 11은 도 10에서 임피던스 설정 단계의 순서를 보다 구체적으로 도시한 순서도이다.Hereinafter, a method of controlling the RF energy transmitting apparatus according to the present embodiment will be described in detail with reference to FIGS. 10 and 11. FIG. 10 is a flowchart illustrating a method of controlling the RF energy transmitting device of FIG. 1, and FIG. 11 is a flowchart illustrating a sequence of impedance setting in FIG. 10 in more detail.
도 10에 도시된 바와 같이, 치료 동작을 진행하기 위해, 우선 어플리케이터(300)에 대한 환자의 위치를 고정시키는 단계를 수행한다(S10). 본 단계에서 환자의 치료 위치(예를 들어, 복부)는 2개의 RF 전달부(460)가 치료 위치의 양측에 이격 배치되도록 한다.As shown in Figure 10, in order to proceed with the treatment operation, first performing a step of fixing the position of the patient with respect to the applicator (300) (S10). The treatment location (eg, abdomen) of the patient at this stage allows the two RF transmitters 460 to be spaced apart on both sides of the treatment location.
환자의 위치가 고정되면, RF 발생부(430)를 동작시켜 RF 에너지를 발생시킨다(S20), 발생된 RF 에너지는 RF 회로부(400)를 거쳐 RF 전달부(460)를 통해 환자의 치료 위치로 전달된다(S30). 이때, RF 회로부(400)는 환자의 특성을 고려한 임피던스 설정이 이루어지지 않은 상태로 RF 에너지가 치료 위치로 효과적으로 전달되지 않는다. 따라서, 제어부(140)는 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)를 제어하여 임피던스를 설정하는 단계를 수행한다(S40).When the position of the patient is fixed, the RF generator 430 is operated to generate RF energy (S20), and the generated RF energy passes through the RF circuit unit 400 to the treatment position of the patient through the RF transmitter 460. It is delivered (S30). At this time, the RF circuit unit 400 does not effectively transmit RF energy to the treatment position without the impedance setting considering the characteristics of the patient. Therefore, the controller 140 controls the first impedance converter 441 and the second impedance converter 451 to set the impedance (S40).
임피던스 설정 단계(S40)는, 우선 제1 임피던스 값 및 제2 임피던스 값의 조합을 변화시키면서 반사파의 크기를 모니터링하는 단계를 수행한다(S41). 이때, 제1 임피던스 변환부(441)의 스위칭 소자(S)는 스위칭 되는 캐패시터의 위치를 변경하고, 제2 임피던스 변환부(451)는 일측 극판(451a)을 회전시키는 방식으로, 조합 가능한 모든 경우에 대해서 반사파의 크기를 모니터링할 수 있다.In the impedance setting step S40, first, the magnitude of the reflected wave is monitored while changing the combination of the first impedance value and the second impedance value (S41). At this time, the switching element S of the first impedance converter 441 changes the position of the capacitor to be switched, and the second impedance converter 451 rotates the one side plate 451a, in all possible combinations. The magnitude of the reflected wave can be monitored for.
전술한 단계를 통해, 각 조합에 대한 반사파의 크기를 모니터링한 후, 반사파의 크기가 기준값 이하가 되는 복수의 임피던스 조합들을 추출하는 단계를 수행한다(S42). 그리고, 추출된 임피던스 조합 중 임피던스 변화율에 따른 반사파의 변화율이 가장 작은 임피던스 조합을 설정 임피던스 조합으로 선택한다(S43).Through the above-described steps, after monitoring the magnitude of the reflected wave for each combination, a step of extracting a plurality of impedance combinations in which the magnitude of the reflected wave is equal to or less than a reference value is performed (S42). Among the extracted impedance combinations, an impedance combination having the smallest change rate of the reflected wave according to the impedance change rate is selected as the set impedance combination (S43).
이와 같이, 설정 임피던스 조합이 결정되면, 제어부(140)는 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)의 임피던스 값을 설정된 임피던스 조합으로 설정(S44)함으로써, 환자의 특성 등을 고려한 최적의 RF 회로를 구성한다.As such, when the set impedance combination is determined, the controller 140 sets the impedance values of the first impedance converter 441 and the second impedance converter 451 to the set impedance combination (S44), so that the characteristics of the patient, etc. The optimal RF circuit is considered.
이와 같이, 임피던스 설정 단계(S40)가 완료되면, RF 발생부(430)에서 발생되는 RF 에너지를 RF 전달부(460)를 통해 치료 위치로 전달하여 치료를 진행한다(S50). 본 단계에 의해, 환자의 피하 지방은 RF 에너지를 흡수하여 온도가 상승하고, 지방 세포가 사멸되면서 지방의 체적이 줄어들게 된다.As such, when the impedance setting step S40 is completed, the RF energy generated by the RF generator 430 is transferred to the treatment position through the RF transmitter 460 to proceed with the treatment (S50). By this step, the subcutaneous fat of the patient absorbs the RF energy, the temperature rises, and the fat volume is reduced as fat cells are killed.
한편, 치료가 진행되는 동안 제어부(140)는 RF 공급부(410)로 전달되는 반사파의 크기를 지속적으로 모니터링 하고(S60), 모니터링된 반사파의 크기가 기준값을 초과하는지 여부를 판단한다(S70). 본 단계의 기준값은 S42 단계의 기준값과 동일한 값일 수도 있으나, S42 단계의 기준값 보다 큰 값(예를 들어, VSWR이 1.6)을 기준으로 판단할 수도 있다.On the other hand, while the treatment is in progress, the controller 140 continuously monitors the magnitude of the reflected wave transmitted to the RF supply unit 410 (S60), and determines whether the magnitude of the monitored reflected wave exceeds the reference value (S70). The reference value in this step may be the same value as the reference value in step S42, but may be determined based on a value larger than the reference value in step S42 (for example, VSWR is 1.6).
만약, 치료 중 모니터링 된 반사파의 크기가 기준값을 초과하는 경우, 제어부(140)는 임피던스를 조절하는 단계를 수행한다(S80). 본 단계에서, 제어부(140)는 제1 임피던스 변환부(441) 및 제2 임피던스 변환부(451)의 임피던스 값을 모두 변환시키면서 임피던스를 재 설정하는 것도 가능하나, 본 실시예에서는 제1 임피던스 값은 고정시킨 상태에서, 제2 임피던스 값만을 조절할 수 있다. 따라서, 제어부는 반사파의 크기가 기준값 이하가 되도록 제2 임피던스 값을 조절한 후, 계속해서 치료를 진행할 수 있다.If the magnitude of the monitored reflected wave during the treatment exceeds the reference value, the controller 140 performs the step of adjusting the impedance (S80). In this step, the controller 140 may reset the impedance while converting both the impedance values of the first impedance converter 441 and the second impedance converter 451, but in the present embodiment, the first impedance value is reset. In the fixed state, only the second impedance value can be adjusted. Therefore, the controller may adjust the second impedance value such that the magnitude of the reflected wave is less than or equal to the reference value, and then continue treatment.
반면, 치료 중 모니터링 된 반사파의 크기가 기준값 이하를 유지하는 경우, 제어부(140)는 지속적으로 치료를 진행하고, 설정된 치료 시간이 종료된 경우(S90) RF 에너지를 전달하는 것을 종료함으로써 치료를 종료할 수 있다.On the other hand, if the magnitude of the monitored reflected wave during the treatment is maintained below the reference value, the control unit 140 continues the treatment, and when the set treatment time is over (S90) ends the treatment by ending the RF energy delivery can do.
다만, 도 10의 순서도에서는 임피던스 설정 단계(S40)를 치료 프로세스의 연속된 단계로서 수행하도록 구성하였으나, 도 12과 같이 치료 RF와 구분되는 테스트 RF 에너지를 발생시키는 단계(S120)를 수행하고, 테스트 RF 에너지를 이용하여 임피던스를 설정하는 단계(S130)를 수행할 수 있다. 그리고, 임피던스가 설정된 후 치료 RF에너지를 발생(S140)하여 치료를 진행하도록 구성될 수 있다. 이때, 테스트 RF 에너지는 치료 RF 에너지의 초기 출력(제1 구간의 출력) 보다 낮은 출력을 갖도록 구성할 수 있다. 이후, 도 12에서도, 치료 진행 중 반사파를 지속적으로 모니터링하여, 치료 중 반사파의 크기가 증가할 경우 임피던스를 조절하는 방식으로 제어될 수 있다.However, in the flowchart of FIG. 10, the impedance setting step S40 is configured to be performed as a continuous step of the treatment process. However, as shown in FIG. 12, the step S120 of generating test RF energy distinguished from the treatment RF is performed and the test is performed. The setting of the impedance using RF energy may be performed (S130). Then, the impedance may be configured to generate a treatment RF energy (S140) to proceed with the treatment. In this case, the test RF energy may be configured to have a lower output than the initial output (the output of the first section) of the therapeutic RF energy. Thereafter, in FIG. 12, the reflected wave may be continuously monitored during the treatment to be controlled in a manner of adjusting the impedance when the size of the reflected wave increases during the treatment.
이상에서 설명한 바와 같이, 본 발명에 따른 RF 에너지 전달 장치 및 이의 제어 방법은 환자의 특성 및 치료 환경을 고려하여 RF 전달 회로를 최적화시킴으로써 치료 효과를 향상시킬 수 있다. 나아가, 치료 중 환자의 이동 등에 의한 이벤트가 발생하는 경우에도, 이를 실시간으로 반영하여 RF 전달 회로를 조절함으로써, 균일한 치료 성능을 보일 수 있는 장점이 있다.As described above, the RF energy delivery device and control method thereof according to the present invention can improve the therapeutic effect by optimizing the RF delivery circuit in consideration of the characteristics of the patient and the treatment environment. Furthermore, even when an event due to movement of the patient occurs during treatment, the RF transmission circuit is adjusted by reflecting this in real time, thereby providing a uniform treatment performance.
이상, 본 발명의 일 실시예에 대해 상세하게 기술하였으나, 본 발명이 상기 실시예에 한정되는 것은 아니다. 본 발명이 속하는 기술 분야에 대해 통상의 지식을 가진 사람이면, 첨부된 청구범위에 정의된 본 발명의 기술적 특징의 범위를 벗어나지 않으면서 본 발명을 여러 가지로 변형 또는 변경하여 실시할 수 있음은 밝혀둔다.As mentioned above, although one Example of this invention was described in detail, this invention is not limited to the said Example. It will be apparent to those skilled in the art that the present invention may be modified or modified in various ways without departing from the scope of the technical features of the invention as defined in the appended claims. Put it.

Claims (21)

  1. RF 에너지 발생부;RF energy generator;
    상기 RF 에너지 발생부와 연결되고, 제1 임피던스 변환부를 포함하는 제1 회로;A first circuit connected to the RF energy generator and including a first impedance converter;
    상기 제1 회로로부터 전력을 전달받도록 구성되며, 제2 임피던스 변환부를 포함하는 제2 회로;A second circuit configured to receive power from the first circuit, the second circuit including a second impedance converter;
    상기 제2 회로에 연결되어 환자에 RF 에너지를 전달하는 전달부; 및A transmission unit connected to the second circuit to transfer RF energy to a patient; And
    환자의 조직 특성 또는 위치에 따라 상기 RF 에너지 발생부 측으로 반사되는 반사파를 줄일 수 있도록 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하는 제어부;를 포함하는 치료를 위한 RF 에너지 전달 장치.And a control unit configured to adjust impedances of the first impedance converter and the second impedance converter to reduce reflected waves reflected to the RF energy generator according to a tissue characteristic or position of a patient. .
  2. 제1항에 있어서,The method of claim 1,
    상기 전달부는 환자와 전기적으로 이격되도록 배치되며, 안테나 방식으로 환자의 환부에 RF 에너지를 전달하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.The delivery unit is arranged to be electrically spaced apart from the patient, RF energy delivery device for treatment, characterized in that for transmitting the RF energy to the affected part of the patient in an antenna manner.
  3. 제2항에 있어서,The method of claim 2,
    상기 전달부는 상기 환자의 피하 지방층으로 RF 에너지를 전달하여, 상기 피하 지방층을 감소시키는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.And the delivery unit delivers RF energy to the subcutaneous fat layer of the patient, thereby reducing the subcutaneous fat layer.
  4. 제1항에 있어서,The method of claim 1,
    상기 제어부는 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스 값을 조합하여 조절하면서 상기 반사되는 반사파의 크기를 측정하고, The controller measures the magnitude of the reflected reflected wave while adjusting the combined impedance values of the first impedance converter and the second impedance converter,
    상기 반사파의 크기가 기준값 이하가 되는 상기 제1 임피던스 변환부 값 및 상기 제2 임피던스 변환부 값의 조합 중 하나로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.And treating the impedance of the first impedance converter and the second impedance converter by one of a combination of the first impedance converter and the second impedance converter such that the magnitude of the reflected wave is equal to or less than a reference value. RF energy delivery device.
  5. 제4항에 있어서,The method of claim 4, wherein
    상기 기준값은 전압 정재파비(voltage standing wave ratio)가 1.3 내지 1.7 범위인 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.Said reference value being a voltage standing wave ratio in the range of 1.3 to 1.7.
  6. 제4항에 있어서,The method of claim 4, wherein
    상기 반사파의 크기가 기준값 이하가 되는 상기 제1 임피던스 변환부 값 및 상기 제2 임피던스 변환부 값의 조합이 복수인 경우, 상기 제어부는 상기 복수의 조합 중 해당 조합에서 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 것을 선택하고,When there are a plurality of combinations of the first impedance converter and the second impedance converter, in which the magnitude of the reflected wave is equal to or less than a reference value, the controller determines a rate of change of the reflected wave according to the impedance change in the corresponding combination among the plurality of combinations. Choose the smallest one,
    상기 선택된 조합으로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.RF energy transfer device for treatment, characterized in that for adjusting the impedance of the first impedance converter and the second impedance converter in the selected combination.
  7. 제6항에 있어서,The method of claim 6,
    상기 제어부는 상기 복수의 조합 중 상기 제2 임피던스 변환부의 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 것을 선택하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.And the control unit selects one of the plurality of combinations having the smallest change rate of the reflected wave according to the impedance change of the second impedance converter.
  8. 제1항에 있어서,The method of claim 1,
    상기 제어부는 상기 전달부를 통해 RF 에너지가 전달되어 치료가 진행되는 동안 상기 반사파의 크기 변화를 모니터링하고,The control unit monitors the change in the magnitude of the reflected wave while the RF energy is transmitted through the transmission unit during the treatment,
    상기 반사파의 크기가 기준값을 초과하는 경우 상기 제1 임피던스 변환부 또는 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.RF energy transfer device for treatment, characterized in that for adjusting the impedance of the first impedance converter or the second impedance converter when the magnitude of the reflected wave exceeds a reference value.
  9. 제2항에 있어서,The method of claim 2,
    상기 제어부는 치료 중 상기 반사파의 크기가 기준값을 초과하는 경우, 상기 반사파의 크기가 기준값 이하가 되도록 상기 제1 임피던스 변환부는 고정시킨 상태에서 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.When the magnitude of the reflected wave exceeds a reference value during the treatment, the controller adjusts the impedance of the second impedance converter in a state where the first impedance converter is fixed so that the magnitude of the reflected wave is equal to or less than the reference value. RF energy delivery device.
  10. 제1항에 있어서,The method of claim 1,
    상기 제1 임피던스 변환부 및 상기 임피던스 변환부는 각각의 정전 용량값(capacitance)을 가변할 수 있도록 구성되는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.The first impedance converter and the impedance converter is configured to vary the capacitance of each capacitance (capacitance) RF energy delivery device for treatment, characterized in that.
  11. 제10항에 있어서,The method of claim 10,
    상기 제1 임피던스 변환부는 상이한 용량을 갖는 복수의 캐패시터가 병렬로 배치되어 스위칭 소자에 의해 택일적으로 연결되도록 구성되며,The first impedance converter is configured such that a plurality of capacitors having different capacitances are arranged in parallel and alternatively connected by a switching element.
    상기 제2 임피던스 변환부는 가변 캐패시터로 구성되는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.The second impedance converter is RF energy delivery device for treatment, characterized in that consisting of a variable capacitor.
  12. 제1 회로와 연결된 RF 에너지 발생부를 통해 RF 에너지를 공급하는 단계;Supplying RF energy through an RF energy generator connected to the first circuit;
    상기 제1 회로로부터 전력을 전달 받을 수 있도록 구성된 제2 회로에 연결되는 전달부를 통해 환자의 치료 위치로 RF 에너지를 전달하는 단계; 및Delivering RF energy to a treatment location of a patient via a delivery unit coupled to a second circuit configured to receive power from the first circuit; And
    상기 RF 에너지 발생부로 반사되는 반사파를 줄일 수 있도록 상기 제1 회로의 제1 임피던스 변환부 및 상기 제2 회로의 제2 임피던스 변환부의 임피던스를 설정하는 단계;를 포함하는 치료를 위한 RF 에너지 전달 장치의 제어방법.Setting an impedance of the first impedance converter of the first circuit and the second impedance converter of the second circuit so as to reduce the reflected waves reflected by the RF energy generator; Control method.
  13. 제12항에 있어서,The method of claim 12,
    상기 전달부는 환자와 전기적으로 이격 배치되는 안테나로 구성되며, 환자의 피하 지방층으로 RF 에너지를 전달하여 상기 피하 지방층을 감소시키는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.The transmission unit is configured to be electrically spaced apart from the patient, the control method of the RF energy delivery device for the treatment, characterized in that for transmitting the RF energy to the subcutaneous fat layer of the patient to reduce the subcutaneous fat layer.
  14. 제12항에 있어서,The method of claim 12,
    상기 임피던스를 설정하는 단계는 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 가변시키면서, 상기 반사파의 크기가 기준값 이하가 되는 임피던스의 조합들 중 하나로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 설정하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.The setting of the impedance may include varying impedances of the first impedance converter and the second impedance converter, and using one of combinations of impedances in which the magnitude of the reflected wave is equal to or less than a reference value. Control method of the RF energy transfer device for treatment, characterized in that for setting the impedance of the impedance converter.
  15. 제14항에 있어서,The method of claim 14,
    상기 기준값은 전압 정재파비(voltage standing wave ratio)가 1.3 내지 1.7 범위인 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.And the reference value is a voltage standing wave ratio in the range of 1.3 to 1.7.
  16. 제14항에 있어서,The method of claim 14,
    상기 임피던스를 설정하는 단계는, 상기 반사파의 크기가 기준값 이하가 되는 상기 임피던스의 조합이 복수인 경우, 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 조합으로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.The setting of the impedance may include the first impedance converter and the second impedance as a combination having the smallest change rate of the reflected wave according to the impedance change when there are a plurality of combinations of impedances in which the magnitude of the reflected wave is equal to or less than a reference value. Control method of the RF energy transfer device for the treatment, characterized in that for adjusting the impedance of the converter.
  17. 제16항에 있어서,The method of claim 16,
    상기 임피던스를 설정하는 단계는, 상기 복수의 조합 중, 상기 제2 임피던스 변환부의 임피던스 변화에 따른 상기 반사파의 변화율이 가장 작은 것을 선택하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.The setting of the impedance may include selecting the smallest change rate of the reflected wave according to the change of the impedance of the second impedance converter of the plurality of combinations.
  18. 제12항에 있어서, 상기 임피던스를 설정하는 단계는, The method of claim 12, wherein setting the impedance comprises:
    상기 제1 임피던스 변환부 및 상기 제2 임피던스의 임피던스를 변화시키면서 상기 RF 에너지 발생부로 반사되는 반사파의 크기를 모니터링하는 단계;Monitoring magnitudes of reflected waves reflected to the RF energy generator while changing impedances of the first impedance converter and the second impedance;
    상기 반사파의 크기가 기준값 이하인 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부의 임피던스 조합들을 추출하는 단계;Extracting impedance combinations of the first impedance converter and the second impedance converter of which the magnitude of the reflected wave is equal to or less than a reference value;
    상기 추출된 복수의 임피던스 조합 중 임피던스에 따른 반사파 변화율을 고려하여 하나의 임피던스 조합을 선택하는 단계; 및Selecting one impedance combination from the extracted plurality of impedance combinations in consideration of a reflection wave change rate according to impedance; And
    상기 선택된 임피던스 조합으로 상기 제1 임피던스 변환부 및 상기 제2 임피던스 변환부를 세팅하는 단계를 포함하는 치료를 위한 RF 에너지 전달 장치의 제어방법.And setting the first impedance converter and the second impedance converter with the selected impedance combination.
  19. 제12항에 있어서,The method of claim 12,
    상기 RF 에너지가 공급되면서 치료가 진행되는 동안 상기 반사파의 크기가 증가하는지 여부를 모니터링하는 단계; 및Monitoring whether the magnitude of the reflected wave increases during treatment while the RF energy is supplied; And
    상기 치료 중 상기 반사파의 크기가 증가하는 경우 상기 제1 임피던스 변환부 또는 상기 제2 임피던스 변환부의 임피던스를 조절하는 단계를 더 포함하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.And adjusting the impedance of the first impedance converter or the second impedance converter when the magnitude of the reflected wave increases during the treatment.
  20. 제19항에 있어서,The method of claim 19,
    치료 중 상기 반사파의 크기가 기준값 이상으로 증가하는 것으로 모니터링 되면, 상기 반사파의 크기가 기준값 이하가 되도록 상기 제1 임피던스 변환부는 고정시킨 상태에서 상기 제2 임피던스 변환부의 임피던스를 조절하는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치의 제어방법.If the magnitude of the reflected wave is monitored to increase by more than the reference value during the treatment, the treatment characterized in that for adjusting the impedance of the second impedance converter in a fixed state so that the magnitude of the reflected wave is less than the reference value RF energy transmission device control method for.
  21. 제12항에 있어서,The method of claim 12,
    상기 제1 임피던스 변환부 및 상기 임피던스 변환부는 각각의 정전 용량값(capacitance)을 가변할 수 있도록 구성되는 것을 특징으로 하는 치료를 위한 RF 에너지 전달 장치.The first impedance converter and the impedance converter is configured to vary the capacitance of each capacitance (capacitance) RF energy delivery device for treatment, characterized in that.
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