WO2018009027A1 - Electromagnetic wave plasma torch - Google Patents

Electromagnetic wave plasma torch Download PDF

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Publication number
WO2018009027A1
WO2018009027A1 PCT/KR2017/007308 KR2017007308W WO2018009027A1 WO 2018009027 A1 WO2018009027 A1 WO 2018009027A1 KR 2017007308 W KR2017007308 W KR 2017007308W WO 2018009027 A1 WO2018009027 A1 WO 2018009027A1
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Prior art keywords
plasma
mode
electromagnetic
resonator
circular
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PCT/KR2017/007308
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French (fr)
Korean (ko)
Inventor
홍용철
Original Assignee
한국기초과학지원연구원
주식회사 엔팩
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Publication of WO2018009027A1 publication Critical patent/WO2018009027A1/en

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    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44BBUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B11/00Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts
    • A44B11/25Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts with two or more separable parts
    • A44B11/28Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts with two or more separable parts with hooks engaging end-pieces on the strap
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A41D13/1161Means for fastening to the user's head
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41FGARMENT FASTENINGS; SUSPENDERS
    • A41F9/00Belts, girdles, or waistbands for trousers or skirts
    • A41F9/02Expansible or adjustable belts or girdles ; Adjustable fasteners comprising a track and a slide member
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44BBUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B11/00Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts
    • A44B11/02Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts frictionally engaging surface of straps
    • A44B11/06Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts frictionally engaging surface of straps with clamping devices
    • A44B11/065Buckles; Similar fasteners for interconnecting straps or the like, e.g. for safety belts frictionally engaging surface of straps with clamping devices with strap tightening means
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44DINDEXING SCHEME RELATING TO BUTTONS, PINS, BUCKLES OR SLIDE FASTENERS, AND TO JEWELLERY, BRACELETS OR OTHER PERSONAL ADORNMENTS
    • A44D2200/00General types of fasteners
    • A44D2200/10Details of construction

Definitions

  • the present invention relates to an electromagnetic plasma torch, and more particularly, to improve the efficiency of a conventional plasma torch, rectangular waveguide (TE 10 mode), circular resonator (TM 0m0 mode), circular waveguide (TM 01 mode), coaxial resonator
  • the present invention relates to an electromagnetic plasma torch capable of various plasma treatments in a (TEM mode) mode, and in particular to enable plasma natural ignition in a coaxial resonator (TEM mode) mode.
  • Plasma torches using electromagnetic waves are widely used in various fields such as exhaust gas treatment, chemical vapor deposition, and surface modification.
  • Republic of Korea Patent No. 10-1166444 relates to a plasma source gas torch generated by electromagnetic waves and its application, the purpose is to generate a pure plasma torch by heating the plasma source gas with electromagnetic waves and to generate the gas, liquid Or it is proposed to produce a synthesis gas raw material by supplying a hydrocarbon compound in the solid state.
  • Republic of Korea Patent No. 10-0375423 discloses a soot removal technology using a microwave plasma.
  • Republic of Korea Patent No. 10-1475822 relates to a large-capacity electromagnetic plasma torch, a technique that can provide a large-capacity plasma torch to solve the problem of plasma volume limited to a specific frequency which is a disadvantage of the conventional plasma torch disclosed It is.
  • the conventional electromagnetic plasma torch has a problem that is limited to only the TE 10 mode or the TE 20 mode, which is a dominant mode.
  • the present invention can be variously plasma treatment in the rectangular waveguide (TE 10 mode), circular resonator (TM 0m0 mode), circular waveguide (TM 01 mode), coaxial resonator (TEM mode) mode
  • TE 10 mode rectangular waveguide
  • TM 0m0 mode circular resonator
  • TM 01 mode circular waveguide
  • TEM mode coaxial resonator
  • an object of the present invention is to provide an electromagnetic plasma torch that enables natural plasma ignition in a coaxial resonator (TEM mode) mode.
  • Electromagnetic plasma torch for achieving the above object;
  • a microwave generator for transmitting microwaves to the plasma generator;
  • a plasma source gas injection unit for injecting a plasma source gas into the plasma generation unit.
  • a microwave transmission line for transmitting microwaves to the plasma generator;
  • a circular resonator provided in the plasma generation unit, provided at the end of the microwave transmission line of the TE 10 mode to induce a magnetic field, and converting the induced magnetic field into a TM 0m0 mode inducing an electric field in the center to generate a plasma. It is characterized by including.
  • Electromagnetic plasma torch according to the present invention is capable of natural ignition has the effect of eliminating the trouble of maintenance, such as electrode replacement and electrode contamination removal by the generation of electrodeless plasma.
  • FIG. 1 is a block diagram of an electromagnetic plasma torch according to the present invention.
  • FIG. 2 is a view related to the electromagnetic plasma torch of the first embodiment according to the present invention.
  • FIG. 3 is a view related to electromagnetic plasma torch of a second embodiment according to the present invention.
  • FIG. 4 is a view related to an electromagnetic plasma torch of a third embodiment according to the present invention.
  • FIG 5 is a view related to the electromagnetic plasma torch of the fourth embodiment according to the present invention.
  • FIG. 1 is a block diagram of an electromagnetic plasma torch according to the present invention.
  • Korean Patent Publication No. 10-1475822 which is a previous registered patent of the present inventors with respect to the plasma torch device.
  • the electromagnetic plasma torch includes a power supply unit 100, a microwave generation unit 200, a microwave transmission line (waveguide) 300, a plasma generation unit 400, and a material supply unit. 500, a plasma source gas injection unit 600, a reaction unit 700, and an ignition unit 800.
  • the power supply unit 100 is composed of a full-wave voltage multiplier, a pulse and direct current (DC) device is configured to supply power to the microwave generator 200.
  • a pulse and direct current (DC) device is configured to supply power to the microwave generator 200.
  • the microwave generator 200 receives the power from the power supply unit 100, a magnetron for oscillating electromagnetic waves of the 10MHz to 10GHz band is used. Preferably, the microwave generator 200 oscillates 915MHz and 2.45GHz electromagnetic waves.
  • the microwave transmission line 300 is a waveguide, and is configured to transmit the microwaves oscillated by the microwave generator 200 to the plasma generator 400.
  • the plasma generator 400 is installed to penetrate the end of the microwave transmission line 300 to provide a space in which plasma is generated by electromagnetic waves input through the microwave transmission line 300 which is a waveguide.
  • the plasma generator 400 vertically penetrates the waveguide 300.
  • the plasma generating unit 400 optionally includes one or more of the configurations of the circular resonator 410, the circular waveguide 420, and / or the coaxial resonator 430, which will be described later. As it is.
  • the material supply unit 500 is a component for supplying a reaction material for removing fuel reforming, syngas production, and soot by reacting with the plasma generated by the plasma generating unit 400.
  • the plasma source gas injection unit 600 is configured to inject a plasma source gas into the plasma generator 150 in a swirl form.
  • the reaction unit 700 is a configuration in which the plasma source gas and the reaction material supplied by the material supply unit 500 react with the plasma generation of the plasma generation unit 400.
  • the ignition unit 800 is disposed to ignite at a peak portion of the electric field distribution in the discharge tube included in the plasma generator 400.
  • microwaves pass through the microwave transmission line 300 so that an electric field is distributed at an end portion thereof.
  • the microwaves pass through a rectangular waveguide, as shown in the left side of FIG. Likewise, the dominant mode TE 10 electric field is formed.
  • the dominant mode TE 10 electric field has the strongest electric field in the center of the plasma generating unit 400 and the strength of the electric field decreases as it goes around the discharge tube. There is a problem that the workpiece is pushed around the discharge tube.
  • the electromagnetic plasma torch according to the present invention may include only the circular resonator 410 as shown in FIG. 1 or 2.
  • the microwave transmission line 300 which is a rectangular waveguide
  • the circular resonator 410 constituting the plasma generator 400 is used by the circular resonator 410.
  • the mode is switched to 0m0 .
  • the TE 10 mode electric field induces a magnetic field in the circular resonator 410, and the induced magnetic field induces a strong electric field in the center of the circular resonator 410. .
  • the plasma generator 400 when ignited by the external ignition unit 800 shown in FIG. 1, the plasma generator 400 generates plasma by the induced strong electric field.
  • the plasma source gas injection unit 600 is provided at a lower end of the circular resonator 410, and a discharge tube communicating with the circular resonator 410 is provided.
  • the plasma source gas is injected into the discharge tube in the form of swirl.
  • the resonance frequency is higher than 2.45 GHz due to the discharge tube dielectric constant inside the circular resonator 410. Becomes small.
  • the diameter D f of the circular resonator 410 is preferably smaller than the diameter D 0 when the resonance frequency of 2.45 GHz to compensate for the smaller resonance frequency.
  • the TE 10 mode electromagnetic wave is converted into TM 0m0 mode (m is a positive integer) by the circular resonator 410 of the plasma generator 400.
  • m is equal to or greater than the TM 020 mode of 2 or more
  • the electric field exhibits the lowest electric field strength in the central portion, and the electric field intensity is distributed higher toward the outside, that is, the central pressure of the plasma generator 400 is increased. The lowering of the pressure around the circumference solved the problem of the workpiece being pushed around the discharge tube.
  • the plasma generating unit 400 As described above, as the electric field is distributed, the plasma generating unit 400 generates the same effect as when it is located in a null line in Korean Patent Publication No. 10-1475822, which is the previous patent of the present inventor. Done.
  • the plasma generator 400 further includes a circular waveguide 420 at an output end of the circular resonator 410, and the circular waveguide 420 is formed in the circular shape.
  • the magnetic field output from the resonator 410 is converted into a cylindrical waveguide electric field distribution of TM 01 mode, as shown in FIGS. 3 (c) and 3 (d).
  • the circular waveguide 420 When the circular waveguide 420 is installed on the circular resonator 410, the circular waveguide 420 generates plasma without loss.
  • the circular waveguide 420 may serve as a support for injecting a target material such as a hydrocarbon fuel, material powder, and the like.
  • the plasma generator 400 further includes a coaxial resonator 430 on one side of the circular resonator 310, and the coaxial resonator 430.
  • An electric field is generated in an outward direction perpendicular to the center electrode disposed at the center of the coaxial resonator 430, and synthesized with the magnetic field formed in the circular resonator 410.
  • the electromagnetic wave introduced by the microwave transmission line 300 in the TE 10 mode is primarily as a strong electric field is induced at the tip of the center electrode of the coaxial resonator 430 which is responsible for the coaxial mode, as shown in FIG. 4C. To generate a plasma.
  • a sufficient discharge voltage is formed by the main microwave generated by the microwave generator 200, thereby enabling natural ignition of the plasma.
  • the coaxial resonator 430 is a plasma in Embodiment 1 described above Simultaneously performs the function of the plasma source gas injection unit 600 for injecting the source gas in a swirl form.
  • Plasma is generated inside the circular resonator 410 at the same time as the plasma flows into the circular resonator 410 at the tip of the center electrode of the coaxial resonator 430 due to the strong electric field and the swirl gas in the coaxial mode. 100% is absorbed by the plasma of the circular resonator 410 without going to the coaxial resonator 430.
  • the internal electrode of the coaxial resonator 430 may be damaged by the plasma of the circular resonator 410, it is preferable to leave a predetermined distance.
  • the center electrode of the coaxial resonator 430 can be placed far away, so that a separate electromagnetic wave source is installed in the coaxial resonator 430. It is desirable to.
  • the plasma generating unit 400 passes through the microwave transmission line 300 and includes a circular resonator 410 at an end thereof.
  • the circular waveguide 420 and the coaxial resonator 430 are both provided at the front and rear ends of the circular resonator 410, respectively.
  • the gas flowing into the coaxial line is a gas such as air, steam, oxygen, etc., and the length of the plasma (jet type) is increased by separating the swirl gas. This is to introduce an ignition plasma into the resonator 410.
  • the coaxial resonator 430 spontaneously ignites by the microwave together with gas injection through the coaxial line.
  • an ignition plasma is generated, and the main plasma is formed by the reaction material supplied from the material supply unit 500 and the plasma source gas injected from the plasma source gas injection unit 600 by the ignition plasma.
  • the circular resonator 410 converts the electric field formed in the dominant mode into a magnetic field, thereby allowing an even distribution of the workpiece.

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Spectroscopy & Molecular Physics (AREA)
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Abstract

The electromagnetic wave plasma torch according to the present invention comprises: a plasma generation unit; a microwave generation unit for transmitting microwaves to the plasma generation unit; a plasma source gas injection unit for injecting a plasma source gas into the plasma generation unit; a microwave transmission line for the transmission of the microwaves to the plasma generation unit; a circular resonator which is provided in the plasma generation unit, is provided at an end of the microwave transmission line in TE10 mode so as to induce a magnetic field, and converts to TM0m0 mode in which the induced magnetic field induces an electric field to a central part, thereby generating plasma; and a circular waveguide in TM01 mode so that the plasma generated by interactions in TE10 mode, TM0m0 mode, and/or coaxial mode absorbs all electromagnetic waves so as to allow for plasma generation without any loss, thereby enabling natural ignition, thus electrodelessly generating plasma, and having the effect of reducing inconvenience arising from maintenance, such as electrode replacement and electrode contaminant removal. (Representative Drawing) Fig. 5

Description

전자파 플라즈마 토치Electromagnetic plasma torch
본 발명은 전자파 플라즈마 토치에 관한 것으로써, 더욱 상세하게는 종래의 플라즈마 토치의 효율 향상을 위해 rectangular waveguide(TE10 mode), circular resonator(TM0m0 mode), circular waveguide(TM01 mode), coaxial resonator(TEM mode)모드로 다양하게 플라즈마 처리가 가능하고, 특히 coaxial resonator(TEM mode)모드로 플라즈마 자연점화를 가능하게 하는 전자파 플라즈마 토치에 관한 것이다.The present invention relates to an electromagnetic plasma torch, and more particularly, to improve the efficiency of a conventional plasma torch, rectangular waveguide (TE 10 mode), circular resonator (TM 0m0 mode), circular waveguide (TM 01 mode), coaxial resonator The present invention relates to an electromagnetic plasma torch capable of various plasma treatments in a (TEM mode) mode, and in particular to enable plasma natural ignition in a coaxial resonator (TEM mode) mode.
전자파를 이용한 플라즈마 토치는 배기가스 처리, 화학 기상 증착, 표면 개질 등 여러 분야에 광범위하게 사용된다.Plasma torches using electromagnetic waves are widely used in various fields such as exhaust gas treatment, chemical vapor deposition, and surface modification.
대한민국 등록특허 제10-1166444호는 전자파로 발생한 플라즈마 소스 가스 토치 및 그 응용에 관한 것으로, 그 목적은 플라즈마 소스 가스를 전자파로 가열하여 순수한 플라즈마 토치를 발생하고 발생된 플라즈마 소스 가스 플라즈마에 기체, 액체 또는 고체 상태의 탄화수소 화합물을 공급하여 합성가스 원료를 생산함을 제시하고 있다.Republic of Korea Patent No. 10-1166444 relates to a plasma source gas torch generated by electromagnetic waves and its application, the purpose is to generate a pure plasma torch by heating the plasma source gas with electromagnetic waves and to generate the gas, liquid Or it is proposed to produce a synthesis gas raw material by supplying a hydrocarbon compound in the solid state.
대한민국 등록특허 제10-0375423호는 마이크로웨이브 플라즈마를 이용한 매연 제거 기술이 개시되어 있다.Republic of Korea Patent No. 10-0375423 discloses a soot removal technology using a microwave plasma.
또한, 대한민국 등록특허 제10-1475822호는 대용량 전자파 플라즈마 토치에 관한 것으로, 종래 플라즈마 토치의 단점인 특정 주파수에 제한된 플라즈마 볼륨의 문제를 해결하여 대용량의 츨라즈마 토치를 제공할 수 있는 기술이 개시되어 있다.In addition, the Republic of Korea Patent No. 10-1475822 relates to a large-capacity electromagnetic plasma torch, a technique that can provide a large-capacity plasma torch to solve the problem of plasma volume limited to a specific frequency which is a disadvantage of the conventional plasma torch disclosed It is.
다만, 종래의 전자파 플라즈마 토치들은 도미넌트 모드인 TE10 모드 또는 TE20 모드에 만 한정되는 문제점이 있었다.However, the conventional electromagnetic plasma torch has a problem that is limited to only the TE 10 mode or the TE 20 mode, which is a dominant mode.
(선행기술문헌)(Prior art document)
(특허문헌)(Patent literature)
대한민국 등록특허공보 제10-1475822호(2014. 12. 17)Republic of Korea Patent Publication No. 10-1475822 (2014. 12. 17)
상술한 바와 같은 문제점을 해결하기 위해 본 발명은 rectangular waveguide(TE10 mode), circular resonator(TM0m0 mode), circular waveguide(TM01 mode), coaxial resonator(TEM mode)모드로 다양하게 플라즈마 처리가 가능하고, 특히 coaxial resonator(TEM mode)모드로 플라즈마 자연점화를 가능하게 하는 전자파 플라즈마 토치의 제공을 목적으로 한다.In order to solve the problems as described above, the present invention can be variously plasma treatment in the rectangular waveguide (TE 10 mode), circular resonator (TM 0m0 mode), circular waveguide (TM 01 mode), coaxial resonator (TEM mode) mode In particular, an object of the present invention is to provide an electromagnetic plasma torch that enables natural plasma ignition in a coaxial resonator (TEM mode) mode.
상술한 목적을 달성하기 위한 본 발명에 따른 전자파 플라즈마 토치는 플라즈마 발생부; 플라즈마 발생부로 마이크로웨이브를 전송하는 마이크로웨이브 발생부; 및 플라즈마 발생부에 플라즈마 소스 가스를 주입하는 플라즈마 소스 가스 주입부; 플라즈마 발생부로 마이크로웨이브를 전송하기 위한 마이크로웨이브 전송라인; 및 플라즈마 발생부에 구비되어, TE10 모드의 마이크로웨이브 전송라인 종단부에 구비되어 자기장을 유도하고, 유도된 자기장이 중심부에 전기장을 유도하여 플라즈마를 발생시키는 TM0m0모드로 변환하는 원형 공진기;를 포함하는 것을 특징으로 한다.Electromagnetic plasma torch according to the present invention for achieving the above object; A microwave generator for transmitting microwaves to the plasma generator; And a plasma source gas injection unit for injecting a plasma source gas into the plasma generation unit. A microwave transmission line for transmitting microwaves to the plasma generator; And a circular resonator provided in the plasma generation unit, provided at the end of the microwave transmission line of the TE 10 mode to induce a magnetic field, and converting the induced magnetic field into a TM 0m0 mode inducing an electric field in the center to generate a plasma. It is characterized by including.
본 발명에 따른 전자파 플라즈마 토치는 자연점화가 가능해 무전극 플라즈마 발생으로 전극 교체와 전극 오염 물질 제거와 같은 유지보수에 따른 번거로움을 해소할 수 있는 효과가 있다.Electromagnetic plasma torch according to the present invention is capable of natural ignition has the effect of eliminating the trouble of maintenance, such as electrode replacement and electrode contamination removal by the generation of electrodeless plasma.
도 1은 본 발명에 따른 전자파 플라즈마 토치의 블록도,1 is a block diagram of an electromagnetic plasma torch according to the present invention;
도 2는 본 발명에 따른 제1 실시예의 전자파 플라즈마 토치관련 도면, 2 is a view related to the electromagnetic plasma torch of the first embodiment according to the present invention;
도 3은 본 발명에 따른 제2 실시예의 전자파 플라즈마 토치관련 도면, 3 is a view related to electromagnetic plasma torch of a second embodiment according to the present invention;
도 4는 본 발명에 따른 제3 실시예의 전자파 플라즈마 토치관련 도면, 및4 is a view related to an electromagnetic plasma torch of a third embodiment according to the present invention, and
도 5는 본 발명에 따른 제4 실시예의 전자파 플라즈마 토치관련 도면이다.5 is a view related to the electromagnetic plasma torch of the fourth embodiment according to the present invention.
이하, 첨부 도면을 참조하여 본 발명의 실시예를 보다 상세하게 설명하고자 한다. 이에 앞서, 본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정하여 해석되어서는 아니 되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여, 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.Hereinafter, with reference to the accompanying drawings will be described in detail an embodiment of the present invention. Prior to this, terms or words used in the present specification and claims should not be construed as being limited to the ordinary or dictionary meanings, and the inventors should properly explain the concept of terms in order to best explain their own inventions. Based on the principle that it can be defined, it should be interpreted as meaning and concept corresponding to the technical idea of the present invention.
따라서, 본 명세서에 기재된 실시예와 도면에 도시된 구성은 본 발명의 가장 바람직한 일 실시예에 불과할 뿐이고 본 발명의 기술적 사상을 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 있을 수 있음을 이해하여야 한다.Therefore, the embodiments described in the specification and the drawings shown in the drawings are only the most preferred embodiment of the present invention and do not represent all of the technical idea of the present invention, various modifications that can be replaced at the time of the present application It should be understood that there may be equivalents and variations.
도 1은 본 발명에 따른 전자파 플라즈마 토치의 블록도 이다.1 is a block diagram of an electromagnetic plasma torch according to the present invention.
참고로, 플라즈마 토치 장치에 관하여 본 특허 발명자의 이전 등록 특허인 대한민국 등록특허공보 제10-1475822호가 참조된다.For reference, reference is made to Korean Patent Publication No. 10-1475822, which is a previous registered patent of the present inventors with respect to the plasma torch device.
도 1에 도시된 바와 같이, 본 발명에 따른 전자파 플라즈마 토치는 전원공급부(100), 마이크로웨이브 발생부(200), 마이크로웨이브 전송라인(도파관)(300), 플라즈마 발생부(400), 재료공급부(500), 플라즈마 소스 가스주입부(600), 반응부(700), 및 점화부(800)를 포함한다.As shown in FIG. 1, the electromagnetic plasma torch according to the present invention includes a power supply unit 100, a microwave generation unit 200, a microwave transmission line (waveguide) 300, a plasma generation unit 400, and a material supply unit. 500, a plasma source gas injection unit 600, a reaction unit 700, and an ignition unit 800.
상기 전원공급부(100)는 전파전압배율기와 펄스 및 직류(DC)장치로 구성되어 상기 마이크로웨이브 발생부(200)로 전력을 공급하도록 구성된다.The power supply unit 100 is composed of a full-wave voltage multiplier, a pulse and direct current (DC) device is configured to supply power to the microwave generator 200.
상기 마이크로웨이브 발생부(200)는 상기 전원공급부(100)로부터 전력을 공급받아, 10MHz 내지 10GHz 대역의 전자파를 발진하는 마그네트론이 사용된다. 바람직하게는 상기 마이크로웨이브 발생부(200)는 915MHz와 2.45GHz 전자파를 발진한다.The microwave generator 200 receives the power from the power supply unit 100, a magnetron for oscillating electromagnetic waves of the 10MHz to 10GHz band is used. Preferably, the microwave generator 200 oscillates 915MHz and 2.45GHz electromagnetic waves.
상기 마이크로웨이브 전송라인(300)은 도파관으로서, 상기 마이크로웨이브 발생부(200)에서 발진된 마이크로웨이브를 플라즈마 발생부(400)로 전송하도록 구성된다.The microwave transmission line 300 is a waveguide, and is configured to transmit the microwaves oscillated by the microwave generator 200 to the plasma generator 400.
상기 플라즈마 발생부(400)는 마이크로웨이브 전송라인(300)의 종단에 관통 설치되어 도파관인 마이크로웨이브 전송라인(300)을 통해 입력되는 전자파에 의해 플라즈마가 생성되는 공간을 제공하도록 구성된다. 이 경우 바람직하게 상기 플라즈마 발생부(400)는 상기 도파관(300)을 수직으로 관통한다.The plasma generator 400 is installed to penetrate the end of the microwave transmission line 300 to provide a space in which plasma is generated by electromagnetic waves input through the microwave transmission line 300 which is a waveguide. In this case, preferably, the plasma generator 400 vertically penetrates the waveguide 300.
상기 플라즈마 발생부(400)는 원형 공진기(410), 원형 도파관(420), 및/또는 동축선 공진기(430) 구성중, 하나 이상의 구성을 선택적으로 포함하는데, 포함하는 구성에 따른 실시예는 후술된 바와 같다. The plasma generating unit 400 optionally includes one or more of the configurations of the circular resonator 410, the circular waveguide 420, and / or the coaxial resonator 430, which will be described later. As it is.
상기 재료공급부(500)는 상기 플라즈마 발생부(400)에서 발생되는 플라즈마와 반응하여 연료개질, 합성가스 생산 및 매연 등을 제거하기 위한 반응재료를 공급하기 위한 구성이다.The material supply unit 500 is a component for supplying a reaction material for removing fuel reforming, syngas production, and soot by reacting with the plasma generated by the plasma generating unit 400.
상기 플라즈마 소스 가스주입부(600)는 상기 플라즈마 발생부(150)에 플라즈마 소스 가스를 스월형태로 주입하기 위한 구성이다.The plasma source gas injection unit 600 is configured to inject a plasma source gas into the plasma generator 150 in a swirl form.
상기 반응부(700)는 상기 플라즈마 발생부(400)의 플라즈마 발생에 따라 상기 플라즈마 소스 가스와 상기 재료공급부(500)에 의해 공급된 반응재료가 반응하는 구성이다.The reaction unit 700 is a configuration in which the plasma source gas and the reaction material supplied by the material supply unit 500 react with the plasma generation of the plasma generation unit 400.
상기 점화부(800)는 상기 플라즈마 발생부(400)에 포함된 방전관 내의 전기장 분포의 피크 부분에 점화되도록 배치된다.The ignition unit 800 is disposed to ignite at a peak portion of the electric field distribution in the discharge tube included in the plasma generator 400.
상술한 구성에서, 마이크로웨이브가 상기 마이크로웨이브 전송라인(300)을 통과하여 종단부에 전기장이 분포하게 되는데, 상기 마이크로웨이브가 직사각형 도파관을 통과하는 경우, 도 2(d)의 좌측에 도시된 바와 같이 도미넌트 모드 TE10 전기장를 형성한다.In the above-described configuration, microwaves pass through the microwave transmission line 300 so that an electric field is distributed at an end portion thereof. When the microwaves pass through a rectangular waveguide, as shown in the left side of FIG. Likewise, the dominant mode TE 10 electric field is formed.
상술한 바와 같은 도미넌트 모드 TE10 전기장은 플라즈마 발생부(400)의 중심부 전기장이 가장 세고 방전관 둘레로 갈수록 전기장의 세기가 약해지며, 중심부의 압력이 둘레부의 압력보다 훨씬 세기 때문에 피처리물을 공급할 경우 피처리물이 방전관 둘레로 밀려나는 문제점이 발생한다.As described above, the dominant mode TE 10 electric field has the strongest electric field in the center of the plasma generating unit 400 and the strength of the electric field decreases as it goes around the discharge tube. There is a problem that the workpiece is pushed around the discharge tube.
즉, 피처리물의 주입이 어려웠고 따라서 그 처리 역시 어려움이 항상 존재하였다.In other words, it was difficult to inject the object, and therefore, there was always difficulty in the treatment.
상술한 바와 같은 문제점과 어려움을 해결하기 위해, 본 발명에 따른 전자파 플라즈마 토치는 상기 플라즈마 발생부(400)가 도 1 또는 도 2에 도시된 바와 같이 원형 공진기(410)만을 포함할 수 있다.In order to solve the problems and difficulties described above, the electromagnetic plasma torch according to the present invention may include only the circular resonator 410 as shown in FIG. 1 or 2.
직사각형의 도파관인 상기 마이크로웨이브 전송라인(300)을 통해 TE10 모드의 전자파가 상기 플라즈마 발생부(400)로 전달되면, 상기 플라즈마 발생부(400)를 구성하는 상기 원형 공진기(410)에 의해 TM0m0 모드로 변환된다.When the electromagnetic wave of TE 10 mode is transmitted to the plasma generator 400 through the microwave transmission line 300, which is a rectangular waveguide, the circular resonator 410 constituting the plasma generator 400 is used by the circular resonator 410. The mode is switched to 0m0 .
즉, 도 2(d)에 도시된 바와 같이 상기 TE10 모드의 전기장이 상기 원형 공진기(410)안에서 자기장을 유도하며, 유도된 상기 자기장이 상기 원형 공진기(410)안에서 중심부에 강한 전기장을 유도한다.That is, as shown in FIG. 2 (d), the TE 10 mode electric field induces a magnetic field in the circular resonator 410, and the induced magnetic field induces a strong electric field in the center of the circular resonator 410. .
결과적으로, 도 1에 도시된 외부의 점화부(800)로 점화되면, 상기 플라즈마 발생부(400)는 상기 유도된 강한 전기장에 의해 플라즈마를 발생시킨다.As a result, when ignited by the external ignition unit 800 shown in FIG. 1, the plasma generator 400 generates plasma by the induced strong electric field.
한편, 상기 원형 공진기(410) 하단부에 상기 플라즈마 소스 가스주입부(600)가 구비되어 있고, 상기 원형 공진기(410)와 연통되는 방전관이 설치되어있어, 상기 플라즈마 소스 가스주입부(600)는 상기 방전관으로 플라즈마 소스 가스를 스월형태로 주입한다.The plasma source gas injection unit 600 is provided at a lower end of the circular resonator 410, and a discharge tube communicating with the circular resonator 410 is provided. The plasma source gas is injected into the discharge tube in the form of swirl.
이때, 상기 마이크로웨이브 전송라인(300)을 통해 TE10 모드의 전자파가 2.45GHz의 주파수로 상기 원형 공진기(410) 안으로 들어오면, 상기 원형 공진기(410) 내부의 방전관 유전율 때문에 공명 주파수가 2.45GHz보다 작게 된다.In this case, when the microwave of TE 10 mode enters the circular resonator 410 at a frequency of 2.45 GHz through the microwave transmission line 300, the resonance frequency is higher than 2.45 GHz due to the discharge tube dielectric constant inside the circular resonator 410. Becomes small.
따라서 이때, 상기 공명 주파수가 작게 되는 것을 보상하기 위해 상기 원형 공진기(410)의 직경(Df)은 2.45GHz의 공명주파수일 때의 직경(D0) 보다 작게 형성되는 것이 바람직하다.Therefore, in this case, the diameter D f of the circular resonator 410 is preferably smaller than the diameter D 0 when the resonance frequency of 2.45 GHz to compensate for the smaller resonance frequency.
참고로, 본 실시예를 보다 일반적으로 표현하면, 상기 TE10 모드의 전자파는 상기 플라즈마 발생부(400)의 상기 원형 공진기(410)에 의해 TM0m0 모드(m은 양의 정수)로 변환되는 것으로 표현할 수 있는데, m이 2 이상인 TM020 모드 이상인 경우에 상기 전기장은 중심부분에서 가장 낮은 전기장 세기를 나타내며, 외측으로 갈수록 상기 전기장의 세기가 높게 분포 즉, 상기 플라즈마 발생부(400)의 중심부 압력이 둘레부의 압력보다 낮아지도록 하여 피처리물이 방전관 둘레로 밀려나는 문제점을 해결하였다. For reference, more generally, the TE 10 mode electromagnetic wave is converted into TM 0m0 mode (m is a positive integer) by the circular resonator 410 of the plasma generator 400. When m is equal to or greater than the TM 020 mode of 2 or more, the electric field exhibits the lowest electric field strength in the central portion, and the electric field intensity is distributed higher toward the outside, that is, the central pressure of the plasma generator 400 is increased. The lowering of the pressure around the circumference solved the problem of the workpiece being pushed around the discharge tube.
상술한 바와 같이 전기장이 분포함에 따라 상기 플라즈마 발생부(400)가 본 특허 발명자의 이전 등록 특허인 대한민국 등록특허공보 제10-1475822호에서 널(null)라인에 위치했을 때와 동일한 효과를 발생하게 된다.As described above, as the electric field is distributed, the plasma generating unit 400 generates the same effect as when it is located in a null line in Korean Patent Publication No. 10-1475822, which is the previous patent of the present inventor. Done.
다른 실시예로 도 1 또는 도 3에 도시된 바와 같이, 상기 플라즈마 발생부(400)는 상기 원형 공진기(410) 출력단에 원형 도파관(420)을 더 구비하는데, 상기 원형 도파관(420)은 상기 원형 공진기(410)에서 출력되는 자기장을 도 3(c) 및 도 3(d)에 도시된 바와 같이, TM01모드의 원통형의 도파관 전기장 분포로 전환한다.In another embodiment, as shown in FIG. 1 or 3, the plasma generator 400 further includes a circular waveguide 420 at an output end of the circular resonator 410, and the circular waveguide 420 is formed in the circular shape. The magnetic field output from the resonator 410 is converted into a cylindrical waveguide electric field distribution of TM 01 mode, as shown in FIGS. 3 (c) and 3 (d).
무엇보다, 상기 마이크로웨이브 전송라인(300)에 의한 TE10모드와 상기 원형 공진기(410)에 의한 TM0m0모드의 상호 작용에 의해 발생된 플라즈마 전자파를 100% 흡수하지 못한다면, loss가 생기게 되는데, 이때, 상기 원형 공진기(410) 상단에, 상기 원형 도파관(420)을 설치하면, 상기 원형 도파관(420)은 loss없이 플라즈마를 발생시키게 된다.Above all, if the plasma electromagnetic wave generated by the interaction between the TE 10 mode by the microwave transmission line 300 and the TM 0m0 mode by the circular resonator 410 is not absorbed 100%, a loss occurs. When the circular waveguide 420 is installed on the circular resonator 410, the circular waveguide 420 generates plasma without loss.
한편, 상기 원형 도파관(420)은 탄화수소체 연료, 재료 분말 등의 피처리물을 주입할 수 있는 지지체로 작용할 수 있다.On the other hand, the circular waveguide 420 may serve as a support for injecting a target material such as a hydrocarbon fuel, material powder, and the like.
이때, 플라즈마의 볼륨을 확대하기 위해 TE10모드의 상기 마이크로웨이브 전송라인(300)으로 유입되는 최대 파워에 한계가 있는 경우, 별도의 전자파 소스를 TM01모드의 상기 원형 도파관(420)에 설치하여 전자파를 유입시켜, 상기 원형 공진기(410)로부터 유입되는 플라즈마에 TM01모드의 전자파 에너지를 공급하여 볼륨을 확대하는 것이 바람직하다.At this time, when the maximum power flowing into the microwave transmission line 300 of the TE 10 mode to increase the volume of the plasma has a limit, by installing a separate electromagnetic wave source in the circular waveguide 420 of the TM 01 mode It is preferable to increase the volume by supplying electromagnetic waves and supplying electromagnetic energy of TM 01 mode to the plasma flowing from the circular resonator 410.
또 다른 실시예로 도 1 또는 도 4에 도시된 바와 같이, 상기 플라즈마 발생부(400)는 동축선 공진기(430)를 상기 원형 공진기(310) 일측에 더 구비하는데, 상기 동축선 공진기(430)는 상기 동축선 공진기(430)의 중심에 배치된 중심전극과 수직하게 바깥방향으로 전기장을 발생시켜, 상기 원형 공진기(410)에서 형성된 자기장과 합성시킨다.In another embodiment, as shown in FIG. 1 or 4, the plasma generator 400 further includes a coaxial resonator 430 on one side of the circular resonator 310, and the coaxial resonator 430. An electric field is generated in an outward direction perpendicular to the center electrode disposed at the center of the coaxial resonator 430, and synthesized with the magnetic field formed in the circular resonator 410.
TE10모드의 상기 마이크로웨이브 전송라인(300)에 의해 유입되는 전자파는 도 4c에 도시된 바와 같이, 동축 모드를 담당하는 동축선 공진기(430)의 중심전극 팁에서 강한 전기장이 유도됨에 따라 1차적으로 플라즈마를 발생시킨다.The electromagnetic wave introduced by the microwave transmission line 300 in the TE 10 mode is primarily as a strong electric field is induced at the tip of the center electrode of the coaxial resonator 430 which is responsible for the coaxial mode, as shown in FIG. 4C. To generate a plasma.
이때, 본 실시예의 경우 상기 마이크로웨이브 발생부(200)에서 발생하는 메인 마이크로웨이브에 의해 충분한 방전 전압이 형성되어 플라즈마의 자연점화가 가능하다.At this time, in the present embodiment, a sufficient discharge voltage is formed by the main microwave generated by the microwave generator 200, thereby enabling natural ignition of the plasma.
한편, 도 5b에 도시된 바와 같이, 상기 동축선 공진기(430)의 중심에 배치된 중심전극을 통해 스월형태의 가스가 공급됨에 따라, 상기 동축선 공진기(430)는 상술한 실시예 1에서 플라즈마 소스 가스를 스월형태로 주입하는 상기 플라즈마 소스 가스주입부(600)의 기능을 동시에 수행한다.On the other hand, as shown in Figure 5b, as the swirl-type gas is supplied through the center electrode disposed in the center of the coaxial resonator 430, the coaxial resonator 430 is a plasma in Embodiment 1 described above Simultaneously performs the function of the plasma source gas injection unit 600 for injecting the source gas in a swirl form.
동축모드에서의 강한 전기장과 스월가스에 의해 상기 동축선 공진기(430)의 중심전극 팁에서 플라즈마가 상기 원형 공진기(410) 안으로 유입되는 것과 동시에 상기 원형 공진기(410) 내부에서 플라즈마가 발생하며, 전자파는 상기 동축선 공진기(430)로 가지않고 상기 원형 공진기(410)의 플라즈마에 의해 100% 흡수된다.Plasma is generated inside the circular resonator 410 at the same time as the plasma flows into the circular resonator 410 at the tip of the center electrode of the coaxial resonator 430 due to the strong electric field and the swirl gas in the coaxial mode. 100% is absorbed by the plasma of the circular resonator 410 without going to the coaxial resonator 430.
이때, 상기 동축선 공진기(430)의 내부전극이 상기 원형 공진기(410)의 플라즈마에 의해 손상을 입을 수 있으므로 소정 거리를 두는 것이 바람직하다.At this time, since the internal electrode of the coaxial resonator 430 may be damaged by the plasma of the circular resonator 410, it is preferable to leave a predetermined distance.
또한, 이때 고출력 작동시, 손상이 더 심하므로, 동축모드에 별도의 전자파를 유입시키면 상기 동축 공진기(430)의 중심전극을 멀리 둘 수 있으므로, 별도의 전자파 소스를 상기 동축 공진기(430)에 설치하는 것이 바람직하다.In addition, since the damage is more severe at the time of high power operation, when a separate electromagnetic wave is introduced into the coaxial mode, the center electrode of the coaxial resonator 430 can be placed far away, so that a separate electromagnetic wave source is installed in the coaxial resonator 430. It is desirable to.
마지막 실시예에 따른 전자파 플라즈마 토치는 도 1 또는 도 5에 도시된 바와 같이, 상기 플라즈마 발생부(400)는 상기 마이크로웨이브 전송라인(300)을 통과하여 종단부에 상기 원형 공진기(410)가 구비되고, 상기 원형 공진기(410) 전후단에 각각 상기 원형 도파관(420)과 상기 동축선 공진기(430)가 모두 함께 구비된 구조이다.As shown in FIG. 1 or FIG. 5, the plasma generating unit 400 passes through the microwave transmission line 300 and includes a circular resonator 410 at an end thereof. The circular waveguide 420 and the coaxial resonator 430 are both provided at the front and rear ends of the circular resonator 410, respectively.
상술한 동축모드에서 언급하고, 도 5b에 도시된 바와 같이, 동축선 내부로 유입되는 가스는 공기, 스팀, 산소, 등의 가스로 스월가스와 별도로 플라즈마의 길이(젯형태)를 길게하여 상기 원형 공진기(410) 내부로 점화용 플라즈마를 유입시키 위함이다.As mentioned in the coaxial mode described above, as shown in FIG. 5B, the gas flowing into the coaxial line is a gas such as air, steam, oxygen, etc., and the length of the plasma (jet type) is increased by separating the swirl gas. This is to introduce an ignition plasma into the resonator 410.
상기 마이크로웨이브 발생부(200)에서 발진된 마이크로웨이브가 상기 마이크로웨이브 전송라인(300)을 통해 전달되면, 상기 동축선 공진기(430)에서 동축선을 통한 가스주입과 함께 상기 마이크로웨이브에 의해 자연점화되어 점화 플라즈마(ignition plasma)가 발생되고, 상기 점화 플라즈마에 의해 상기 재료공급부(500)에서 공급되는 반응재료와 상기 플라즈마 소스 가스주입부(600)에서 주입되는 플라즈마 소스 가스에 의한 메인 플라즈마가 이루어진다.When the microwave oscillated by the microwave generator 200 is transmitted through the microwave transmission line 300, the coaxial resonator 430 spontaneously ignites by the microwave together with gas injection through the coaxial line. Thus, an ignition plasma is generated, and the main plasma is formed by the reaction material supplied from the material supply unit 500 and the plasma source gas injected from the plasma source gas injection unit 600 by the ignition plasma.
이때, 상기 원형 공진기(410)는 상기 도미넌트 모드로 형성된 전기장을 자기장으로 변환함으로써,상기 피처리물의 고른 분포가 이루어질 수 있도록 한다.In this case, the circular resonator 410 converts the electric field formed in the dominant mode into a magnetic field, thereby allowing an even distribution of the workpiece.
이상과 같이, 본 발명은 비록 한정된 실시예와 도면에 의해 설명되었으나, 본 발명은 이것에 의해 한정되지 않으며 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에 의해 본 발명의 기술 사상과 하기에 기재될 청구범위의 균등 범위 내에서 다양한 수정 및 변형이 가능함은 물론이다.As described above, although the present invention has been described by means of a limited embodiment and drawings, the present invention is not limited thereto and by those skilled in the art to which the present invention pertains, Of course, various modifications and variations are possible within the scope of equivalents of the claims to be described.
(부호의 설명)(Explanation of the sign)
100 : 전원공급부100: power supply
200 : 마이크로웨이브 발생부200: microwave generating unit
300 : 마이크로웨이브 전송라인300: microwave transmission line
400 : 플라즈마 발생부400: plasma generating unit
410 : 원형 공진기410: circular resonator
420 : 원형 도파관420: circular waveguide
430 : 동축선 공진기430: coaxial resonator
500 : 재료공급부500: material supply unit
600 : 플라즈마 소스 가스주입부600: plasma source gas injection unit
700 : 반응부700: reaction part
800 : 점화부800: ignition unit

Claims (12)

  1. 플라즈마 발생부(400);A plasma generator 400;
    상기 플라즈마 발생부(400)로 마이크로웨이브를 전송하는 마이크로웨이브 발생부(200); 및 A microwave generator 200 for transmitting microwaves to the plasma generator 400; And
    상기 플라즈마 발생부(400)에 플라즈마 소스 가스를 주입하는 플라즈마 소스 가스 주입부(600);A plasma source gas injector 600 for injecting a plasma source gas into the plasma generator 400;
    상기 플라즈마 발생부(400)로 마이크로웨이브를 전송하기 위한 마이크로웨이브 전송라인(300); 및A microwave transmission line 300 for transmitting microwaves to the plasma generator 400; And
    상기 플라즈마 발생부(400)에 구비되어, TE10 모드의 상기 마이크로웨이브 전송라인(300) 종단부에 구비되어 자기장을 유도하고, 유도된 상기 자기장이 중심부에 전기장을 유도하여 플라즈마를 발생시키는 TM0m0모드로 변환하는 원형 공진기(410);를 포함하는 것을 특징으로 하는 전자파 플라즈마 토치.TM 0m0 which is provided in the plasma generator 400, is provided at the end of the microwave transmission line 300 of the TE 10 mode to induce a magnetic field, the induced magnetic field induces an electric field in the center to generate a plasma Electromagnetic plasma torch comprising a; circular resonator (410) to convert to mode.
  2. 제 1항에 있어서, The method of claim 1,
    상기 플라즈마 발생부(400)에The plasma generator 400
    중심에 배치되는 중심전극을 포함하고 상기 TE10 모드에 의해 유입되는 전자파가 상기 중심전극의 팁에서 전기장이 유도됨에 따라 플라즈마를 발생시키는 동축모드로 변환하는 동축선 공진기(430)가 더 포함되는 것을 특징으로 하는 전자파 플라즈마 토치.It further includes a coaxial resonator 430 including a central electrode disposed in the center and converts the electromagnetic wave introduced by the TE 10 mode into the coaxial mode for generating a plasma as the electric field is induced at the tip of the center electrode Electromagnetic plasma torch.
  3. 제 1항 또는 제2항에 있어서,The method according to claim 1 or 2,
    상기 플라즈마 발생부(400)에The plasma generator 400
    상기 TE10 모드, 상기 TM0m0모드, 및/또는 상기 동축모드의 상호작용에 의해 발생된 플라즈마가 전자파를 모두 흡수하여 손실(loss)없이 플라즈마 발생이 가능하도록 TM01모드의 원형 도파관(420)이 더 포함되는 것을 특징으로 하는 전자파 플라즈마 토치.The circular waveguide 420 of the TM 01 mode is configured such that the plasma generated by the interaction of the TE 10 mode, the TM 0m0 mode, and / or the coaxial mode absorbs electromagnetic waves and thus generates plasma without loss. Electromagnetic plasma torch, further comprising.
  4. 제 1항에 있어서, The method of claim 1,
    상기 플라즈마 발생부(400)는The plasma generator 400
    외부의 점화부(800)에 의해 점화되어 유도된 전기장에 의해 플라즈마를 발생시키는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that for generating a plasma by the electric field induced by ignition by the external ignition unit (800).
  5. 제 2항에 있어서,The method of claim 2,
    상기 플라즈마 발생부(400)는 The plasma generator 400
    상기 마이크로웨이브 발생부(200)에서 발생하는 메인 마이크로웨이브에 의해 방전 전압이 형성되어 자연점화로 플라즈마를 발생시키는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that the discharge voltage is formed by the main microwave generated by the microwave generator 200 generates a plasma by natural ignition.
  6. 제 3항에 있어서, The method of claim 3, wherein
    상기 원형 도파관(420)은 The circular waveguide 420 is
    탄화수소체 연료, 재료 분말에 해당되는 피처리물을 주입할 수 있는 지지체로 작용하는 것을 특징으로 하는 전자파 플라즈마 토치.An electromagnetic plasma torch, which serves as a support for injecting a target material corresponding to a hydrocarbon fuel and a material powder.
  7. 제 1항에 있어서, The method of claim 1,
    상기 원형 공진기(410)의 직경(Df)은 특정주파수에 대한 공명주파수일 때의 직경(D0) 보다 작게 형성되는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that the diameter (D f ) of the circular resonator (410) is formed smaller than the diameter (D 0 ) when the resonance frequency for a particular frequency.
  8. 제 3항에 있어서,The method of claim 3, wherein
    상기 원형 도파관(420)에 별도의 전자파 소스를 설치하여 전자파를 추가 유입시켜, 상기 원형 공진기(410)로부터 유입되는 플라즈마에 TM01모드의 전자파 에너지를 공급하여 볼륨을 확대하는 것을 특징으로 하는 전자파 플라즈마 토치.By installing a separate electromagnetic wave source in the circular waveguide 420, the electromagnetic wave is further introduced, and the electromagnetic wave plasma of the TM 01 mode is supplied to the plasma flowing from the circular resonator 410 to expand the volume. torch.
  9. 제 2항에 있어서,The method of claim 2,
    상기 동축선 공진기(430)는 The coaxial resonator 430 is
    플라즈마 소스 가스를 스월형태로 주입하는 상기 플라즈마 소스 가스주입부(600)의 기능을 동시에 수행하는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that simultaneously performing the function of the plasma source gas injection unit 600 for injecting a plasma source gas in the form of swirl.
  10. 제 9항에 있어서,The method of claim 9,
    상기 동축선 공진기(430)는The coaxial resonator 430 is
    스월가스와 별도로 플라즈마의 길이(젯형태)를 길게하여 상기 원형 공진기(410) 내부로 점화용 플라즈마를 유입시키는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that the ignition plasma is introduced into the circular resonator (410) by lengthening the length of the plasma (jet type) separately from the swirl gas.
  11. 제 2항에 있어서,The method of claim 2,
    상기 동축선 공진기(430)의 상기 중심전극 팁에서 발생한 플라즈마가 상기 원형 공진기(410) 안으로 유입되고, 상기 전자파가 상기 원형 공진기(410)의 플라즈마에 의해 모두 흡수되는 것을 특징으로 하는 전자파 플라즈마 토치.Electromagnetic plasma torch, characterized in that the plasma generated at the tip of the center electrode of the coaxial resonator 430 is introduced into the circular resonator (410), the electromagnetic wave is all absorbed by the plasma of the circular resonator (410).
  12. 제 1항 또는 제 3항에 있어서,The method according to claim 1 or 3,
    상기 원형 공진기(410)에 의해 변환되는 상기 TM0m0 모드에서 상기 m은 양의 정수인 것을 특징으로 하는 전자파 플라즈마 토치.The TM 0m0 transformed by the circular resonator 410 Wherein in the mode m is a positive integer.
PCT/KR2017/007308 2016-07-08 2017-07-07 Electromagnetic wave plasma torch WO2018009027A1 (en)

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