WO2016068586A1

WO2016068586A1 - Fire chamber, plasma generator, and plasma generating method

Info

Publication number: WO2016068586A1
Application number: PCT/KR2015/011394
Authority: WO
Inventors: 최도현
Original assignee: 주식회사 뉴파워 프라즈마
Priority date: 2014-10-27
Filing date: 2015-10-27
Publication date: 2016-05-06
Also published as: KR20160049220A; KR101718515B1; TW201628053A

Abstract

A fire chamber of the present invention comprises: a hollow fire chamber body that has a plasma ignition region; a gas flow channel connected to the plasma ignition region and a plasma discharge channel of a plasma chamber; and an ignition plasma source that ignites plasma in the plasma ignition region, wherein a plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel after the ignition of the plasma in the plasma ignition region so that plasma is generated in the plasma chamber. After plasma is ignited in the plasma ignition region of the fire chamber, a plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel so that plasma is generated in the plasma chamber. Accordingly, the initial plasma ignition is not performed in the plasma discharge channel, which reduces particles caused by damage to the inside of the plasma chamber due to an arc discharge that may be generated during the initial plasma ignition.

Description

Fire chamber, plasma generator, plasma generation method

The present invention relates to a plasma generator and a plasma generating method, and more particularly, to a fire chamber for generating a plasma, a plasma generator having the same, and a plasma generating method.

Plasma discharges are used for gas excitation to generate active gases containing ions, free radicals, atoms, molecules. The active gas is widely used in various fields, and typically, variously used in semiconductor manufacturing processes such as etching, deposition, cleaning, and ashing.

In recent years, wafers and LCD glass substrates for the manufacture of semiconductor devices are becoming larger. Therefore, there is a demand for a plasma source having a high controllability with respect to plasma ion energy and having a large-area processing capacity. The use of remote plasma in semiconductor manufacturing processes using plasma is known to be very useful. For example, it is usefully used in cleaning process chambers and ashing processes for photoresist strips. However, as the size of the substrate to be processed increases, the volume of the process chamber is also increasing, and a plasma source capable of sufficiently remotely supplying high density active gas is required.

In the remote plasma generator, various plasma sources are used according to the plasma generation method. For example, inductively coupled plasma sources, capacitively coupled plasma sources, microwave plasma sources, and the like are used in remote plasma generators. In the case of an inductively coupled plasma source, a method employing a transformer is particularly called a transformer coupled plasma. The remote plasma generator using a transformer coupled plasma source has a structure in which a magnetic core having a primary winding coil is mounted on a chamber body of a toroidal structure.

On the other hand, the initial ignition performance is a very important factor in the remote plasma generator. Failure or delay of initial ignition renders the process inoperable in the process chamber in which the remote plasma generator is mounted. As a result, research and development efforts on the initial ignition technology are continuously made in the remote plasma generator. However, there is a situation in which a remote plasma generator having a high initial ignition capability has not been provided under various conditions such as gas flow rate, gas flow rate, type of process gas, and plasma generation capacity. In addition, the ignition technology of the remote plasma generator thus far is such that arc discharge for initial ignition is made by an electrode which is capacitively coupled directly to the plasma channel formed inside the plasma chamber body of the remote plasma generator. This inevitably provides a problem that the interior of the plasma chamber body may be damaged. It can also cause particles due to internal damage.

It is an object of the present invention to reduce the generation of internal particles due to arc discharge, which can be generated in the plasma ignition step by not igniting the plasma directly in the plasma discharge channel formed in the plasma chamber of the plasma generator. The present invention provides a fire chamber capable of independently igniting a plasma, a plasma generator having the same, and a plasma generating method using the same.

One aspect of the present invention for achieving the above technical problem relates to a fire chamber. The fire chamber of the present invention comprises: a hollow fire chamber body having a plasma ignition region; A gas flow channel connected to the plasma ignition region and a plasma discharge channel of a plasma chamber; And an ignition plasma source for igniting a plasma in the plasma ignition region, wherein after the plasma is ignited in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to supply the plasma. Plasma is generated in the chamber.

In one embodiment, the ignition plasma source comprises a capacitively coupled electrode for inducing a plasma discharge capacitively coupled to the plasma ignition region.

In one embodiment, the Fire chamber body includes an opening and an insulating window disposed in the opening, wherein the capacitive coupling electrode is provided on the insulating window outside the plasma ignition region.

In one embodiment, the ignition plasma source comprises an induction antenna coil for inducing a plasma discharge inductively coupled to the plasma ignition region.

In one embodiment, the Fire chamber includes a dielectric window, and the induction antenna coil is installed over the insulating window outside of the plasma ignition region.

In one embodiment, the ignition plasma source comprises a light source for igniting the plasma by irradiating light to the plasma ignition region.

In one embodiment, the Fire chamber comprises a light transmissive window, wherein the light source is installed above the light transmissive window outside of the plasma ignition region.

In one embodiment, the fire chamber includes a gas inlet through which gas is supplied, and gas introduced into the plasma ignition region through the gas inlet is supplied to the plasma discharge channel through the gas distribution channel.

In one embodiment, the Fire chamber is provided with gas introduced into the plasma discharge channel through the gas flow channel.

Another aspect of the invention relates to a plasma generator. According to another aspect of the present invention, a plasma generator includes: a hollow plasma chamber having a plasma discharge channel; A main plasma source for generating plasma in the plasma discharge channel; And a fire chamber comprising a hollow fire chamber body having a plasma ignition region, a gas flow channel connected to said plasma ignition region and said plasma discharge channel, and an ignition plasma source for igniting a plasma in said plasma ignition region. After plasma ignition in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma discharge channel.

In one embodiment, the main plasma source is a transformer coupled plasma source.

In one embodiment, the main plasma source is an inductively coupled plasma source.

In one embodiment, the main plasma source is a capacitively coupled plasma source.

In one embodiment, the main plasma source is a microwave plasma source.

Another aspect of the invention is a plasma generating method. Plasma generating method according to another aspect of the present invention comprises the steps of: plasma ignition in the Fire chamber; Flowing the plasma gas through a gas flow path connected between the Fire chamber and the plasma chamber; And generating plasma in the plasma chamber.

In one embodiment, when plasma is generated in the plasma chamber, the ignition plasma source for the Fire chamber is turned off.

In one embodiment, the ignition plasma source for the fire chamber remains on in a section maintained after the plasma is generated in the plasma chamber.

According to the fire chamber and the plasma generator of the present invention, after the plasma is ignited in the plasma ignition region of the fire chamber, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma chamber. Therefore, since the initial plasma ignition is not performed in the plasma discharge channel, particle generation due to damage to the inside of the plasma chamber body is reduced by arcuate discharge that may occur during the initial ignition.

1 is a schematic diagram showing an overall configuration of a plasma processing system according to a preferred embodiment of the present invention.

2 is a view showing a cross-sectional structure of the plasma chamber.

3 and 4 are exploded perspective and sectional views showing the structure of the fire chamber.

5 is a partial cross-sectional view showing a modification of the electrode mounting structure of the fire chamber.

6 to 8 show variations of the gas flow holes of the fire chamber.

9 is a view showing a modification of the fire chamber in which two capacitive coupling electrodes are installed.

10-12 show variations of the fire chamber.

13 to 15 are diagrams showing examples of the gas supply paths of the fire chamber and the plasma generator.

17 to 21 are diagrams showing plasma generators that may be employed in the plasma generator of the present invention.

22 and 23 are flowcharts illustrating the generation method of the present invention.

In order to fully understand the present invention, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Embodiment of the present invention may be modified in various forms, the scope of the invention should not be construed as limited to the embodiments described in detail below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape of the elements in the drawings and the like may be exaggerated to emphasize a more clear description. It should be noted that the same configuration in each drawing is shown with the same reference numerals. Detailed descriptions of well-known functions and configurations that are determined to unnecessarily obscure the subject matter of the present invention are omitted.

1 is a schematic view showing an overall configuration of a plasma processing system according to a preferred embodiment of the present invention, and FIG. 2 is a diagram showing a cross-sectional structure of a plasma chamber.

Referring to FIG. 1, a plasma processing system according to a preferred embodiment of the present invention includes a process chamber 10, a plasma generator 20, and a fire chamber 30. Initial plasma ignition takes place in the fire chamber 30. Subsequently, the plasma gas generated inside the fire chamber 30 is supplied to the plasma generator 20 through the gas flow channel 40 to generate plasma in the plasma generator 20. The plasma gas generated in the plasma generator 20 is remotely supplied to the process chamber 10 through the adapter 42.

Referring to FIG. 2, the plasma generator 20 has a transformer coupled plasma source structure in which a plasma chamber 21 having an annular plasma discharge channel 22 and a transformer 23 are coupled to each other. In this embodiment, the main plasma source mounted to the plasma generator 20 illustrates a transformer coupled plasma source, but various types of plasma sources may be employed as described below.

The plasma chamber 21 has a plasma chamber body 24 that forms an annular discharge channel 22. The plasma chamber body 24 includes one or more insulating gaps 26 when composed of a conductor material. For example, four insulation gaps 26 may be provided when four hollow discharge tubes are combined in an annular structure. If the plasma chamber body 24 is made of a non-conductive material, it does not have an insulating gap 26. One or more magnetic cores 25 that make up the transformer 23 are mounted to be crosslinked to the annular plasma chamber body 24. The primary winding coil (not shown) is wound around the magnetic core 25. The plasma generated in the plasma discharge channel 22 forms the secondary side of the transformer 23. The plasma chamber body 24 is provided with a gas outlet 27 and a gas flow hole 28.

Referring to FIGS. 3 and 4, the fire chamber 30 has a hollow fire chamber body 32 having a plasma ignition region 31. The fire chamber body 32 is assembled with an upper plate 32a and a lower body 32b with an o-ring (not shown) therebetween. A gas flow hole 33 is formed in the lower body 32b to form a gas flow channel 40 connected to the plasma ignition region 31 and the plasma discharge channel 22 of the plasma chamber 21. An opening 34 is formed in the upper plate 32a, and an insulating window 35 is provided in the opening 34 with the O-ring 37 interposed therebetween. The capacitive coupling electrode 36 is provided on the insulating window 35 outside the plasma ignition region 31. The capacitive coupling electrode 36 functions as an ignition plasma source for igniting the plasma in the plasma ignition region 31. The gas flow hole 28 of the plasma chamber 21 and the gas flow hole 33 of the fire chamber 30 constitute a gas flow channel 40 connecting the plasma ignition region 31 and the plasma discharge channel.

In the plasma processing system as described above, after the plasma is ignited in the plasma ignition region 31 of the fire chamber 30, the plasma gas is transferred from the plasma ignition region 31 to the plasma discharge channel 22 through the gas flow channel 40. Supplied to generate plasma in the plasma chamber 21. Since the initial plasma ignition is not performed in the plasma discharge channel 22, the generation of particles due to damage inside the plasma chamber body 24 is reduced by the arcous discharge that may be generated during the initial ignition.

The fire chamber body 32 is made of a conductive material and is capacitively coupled with the capacitive coupling electrode 36 and the insulating window 35 interposed therebetween. At this time, in order to prevent arc discharge from occurring outside the fire chamber 30, as shown in FIG. 5, an insulating window 35 is installed to block the opening 33 and an O-ring at an edge thereof. 37 and an insulating protective ring 38 are configured. The capacitive coupling electrode 36 is provided thereon. Alternatively, although not shown in the drawing, an insulating cover may be installed to completely surround the capacitive coupling electrode 36.

6 to 8 show variations of the gas flow holes of the fire chamber.

5 and 6, the gas flow hole 33 of the fire chamber body 32 constituting the gas flow channel 40 may have a porous hole structure. The porous holes of the gas flow holes 33 can be arranged in parallel to the plasma discharge channels 22 or perpendicular to the plasma discharge channels 22. It is also possible for the plasma discharge channel 22 and the opening 34 of the fire chamber 30 to face or deflect.

Referring to FIG. 9, the fire chamber 30 according to the modification may be installed such that two capacitive coupling electrodes 36 face each other. In this case, the two capacitive coupling electrodes 36 may be supplied with alternating current power having the same phase or with alternating current power having different phases, respectively.

10-12 show variations of the fire chamber.

10 and 11, the ignition plasma source provided in the fire chamber 30 may be modified in various ways. For example, as shown in FIG. 10, an induction antenna coil 39 may be mounted to the Fire chamber body 32 in a helical fashion. Alternatively, one side of the fire chamber body 32 may be mounted in a spiral shape. When the ignition plasma source is configured as an inductively coupled plasma source as described above, a dielectric window (not shown) is installed in the fire chamber body 32. Alternatively, the fire chamber body 32 may be entirely composed of a dielectric material.

Referring to FIG. 12, the ignition plasma source of the fire chamber 30 may be a structure that is ignited by light. In this case, the fire chamber 30 is provided with a light transmissive window 46 and a light source 47 for irradiating light to the plasma ignition region 31 of the fire chamber 30 thereon.

Referring to FIG. 13, the process gas supplied from the gas supply source (not shown) is supplied to the plasma generator 20 through the first gas supply channel 43 in which the gas valve 44 is installed and the gas flow channel 30 is closed. A portion of the fire chamber 30 may be supplied through the fire chamber 30. In this case, as shown in FIG. 14, a gas valve 45 may be added to the gas flow channel 40. The gas valve 45 may be opened in the plasma ignition operation section and may be closed when the plasma ignition is completed.

Referring to FIG. 15, a process gas supplied from a gas supply source (not shown) may be supplied to the Fire chamber 30 through the first gas supply channel 43 in which the gas valve 44 is installed. The gas supplied to the fire chamber 30 is again supplied to the plasma generator 20 through the gas flow channel 40.

Referring to FIG. 16, process gas supplied from a gas supply source (not shown) is supplied to the fire chamber 30 through the first gas supply channel 43 in which the gas valve 44 is installed, and together with the gas valve 49. Is supplied to the plasma generator 20 through the second gas supply channel 45 is installed. In this case, in the plasma ignition operation section, the process valves are simultaneously supplied to the fire chamber 30 and the plasma chamber 20, and after the plasma is ignited, the

gas valves

43 and 49 are supplied to supply the process gas only to the plasma generator. Switching operation can be performed.

Referring to FIG. 17, the plasma generator 20 may employ a transformer coupled plasma source having a transformer 23 coupled to the plasma chamber 22 as a main plasma source. The primary winding coil 29 of the transformer 23 is connected to the AC switching power supply 50 to receive AC power for plasma generation. The ignition controller 52 supplies ignition power to the ignition plasma source provided in the fire chamber 30. The power supplied from the ignition controller 52 may be supplied from the AC switching power supply 50 or may include a separate power supply source.

Referring to FIG. 18, the plasma generator 20 may employ a transformer coupled plasma source having a transformer 23 coupled to a plasma chamber 22 in which yarn ends are connected to the process chamber 10 as a main plasma source.

Referring to FIGS. 19 and 20, the plasma generator 20 may employ an inductively coupled plasma source in which an induction antenna coil 29 is mounted in the plasma chamber 22 as a main plasma source. In this case, the plasma chamber 22 includes a dielectric window (not shown). Alternatively, the plasma chamber 22 may be made of a dielectric material.

Referring to FIG. 21, the plasma generator 20 may employ a microwave plasma source having the microwave generator 60 as a main plasma source. In this case, the plasma chamber 21 may be configured as a waveguide.

22 and 23 are flowcharts illustrating a plasma generating method of the present invention.

Referring to FIG. 22, a process of generating plasma using the Fire chamber 30 and the plasma generator 20 of the present invention is controlled by a controller (not shown). In step S10, the ignition controller 52 for plasma ignition is driven in the fire chamber 30. In step S12, it is determined whether or not plasma ignition has occurred in the fire chamber 30. When the plasma ignition is performed in the fire chamber chamber 30, the plasma ignition is maintained in the fire chamber 30 in step S14. Subsequently, in step S16, it is determined whether the plasma is ignited and generated in the plasma generator 20. When plasma is generated in the plasma generator 20, the plasma ignition is turned off in the fire chamber in step S18.

As another example, the plasma ignition of the fire chamber 30 may be maintained as shown in FIG. 23 even after the plasma is generated in the plasma generator 20. That is, a section in which the ignition plasma source for the fire chamber 30 is maintained in an on state may be present in a section maintained after the plasma is generated in the plasma chamber 21.

Embodiments of the fire chamber, the plasma generator, and the plasma generating method of the present invention described above are merely exemplary, and those skilled in the art to which the present invention pertains have various modifications and equivalent embodiments. You can see that it is possible. Therefore, it will be understood that the present invention is not limited only to the form mentioned in the above detailed description. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims. It is also to be understood that the present invention includes all modifications, equivalents, and substitutes within the spirit and scope of the invention as defined by the appended claims.

Description of Codes:

10: process chamber 20: plasma generator

21: plasma chamber 22: plasma discharge channel

23: transformer 24: plasma chamber body

25: magnetic core 26: insulation gap

27: gas outlet 28: gas flow hole

29: primary winding coil 30: Fire chamber

31: plasma ignition region 32: fire chamber body

33: gas flow hole 34: opening

35: insulating window 36: capacitive coupling electrode

37: O-ring 38: Protective ring

39: induction antenna coil 40: gas flow channel

42: adapter 43: first gas supply channel

44, 45, 49: gas valve 46: light transmitting window

47: light source 48: second gas supply channel

50: AC switching power supply 52: ignition controller

54: induction antenna coil 60: microwave generator

Claims

A hollow fire chamber body having a plasma ignition region;

A gas flow channel connected to the plasma ignition region and a plasma discharge channel of a plasma chamber; And

An ignition plasma source for igniting a plasma in the plasma ignition region,

And after the plasma is ignited in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma chamber.
The method of claim 1,

And the ignition plasma source comprises a capacitively coupled electrode for inducing a plasma discharge capacitively coupled to the plasma ignition region.
The method of claim 2,

The fire chamber body includes an opening and an insulating window installed in the opening,

And the capacitive coupling electrode is disposed on the insulating window outside the plasma ignition region.
The method of claim 1,

And wherein the ignition plasma source comprises an induction antenna coil for inducing a plasma discharge inductively coupled to the plasma ignition region.
The method of claim 4, wherein

The fire chamber comprises a dielectric window,

And the induction antenna coil is installed on the insulating window outside of the plasma ignition region.
The method of claim 1,

The ignition plasma source comprises a light source for irradiating light to the plasma ignition region to ignite the plasma.
The method of claim 6,

The fire chamber comprises a light transmissive window,

And the light source is installed on the light transmissive window outside of the plasma ignition region.
The method of claim 1,

The fire chamber includes a gas inlet through which gas is supplied;

And a gas introduced into the plasma ignition region through the gas inlet is supplied to the plasma discharge channel through the gas distribution channel.
The method of claim 1,

The fire chamber is characterized in that the fire chamber receives the gas flowing into the plasma discharge channel through the gas flow channel.
A hollow plasma chamber having a plasma discharge channel;

A main plasma source for generating plasma in the plasma discharge channel; And

A fire chamber comprising a hollow fire chamber body having a plasma ignition region, a gas flow channel connected to said plasma ignition region and said plasma discharge channel, and an ignition plasma source for igniting a plasma in said plasma ignition region;

And after plasma ignition in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma discharge channel.
The method of claim 10,

And the main plasma source is a transformer coupled plasma source.
The method of claim 10,

And the main plasma source is an inductively coupled plasma source.
The method of claim 10,

And the main plasma source is a capacitively coupled plasma source.
The method of claim 10,

And the main plasma source is a microwave plasma source.
Plasma ignition is performed in a Fire chamber;

Flowing the plasma gas through a gas flow path connected between the Fire chamber and the plasma chamber; And

And generating a plasma in the plasma chamber.
The method of claim 15,

And when the plasma is generated in the plasma chamber, the ignition plasma source for the fire chamber is turned off.
The method of claim 15,

And a section in which the ignition plasma source for the fire chamber maintains an on state in a section maintained after the plasma is generated in the plasma chamber.