KR101364444B1 - Hybride plasma reactor - Google Patents

Abstract

The hybrid plasma reactor of the present invention includes a reactor body having a plasma discharge space and a gas inlet and a gas outlet, an induction antenna coupled to the plasma formed in the plasma discharge space, a transformer coupled to the plasma, and wound around a magnetic core. And a hybrid plasma source having a winding coil, and an AC switching power supply for supplying plasma generating power to the induction antenna and the primary winding coil. Since the hybrid plasma reactor of the present invention induces plasma discharge using an inductively coupled plasma transformer and a transformer coupled plasma source, the hybrid plasma reactor has a wide operating range from the low pressure region to the high pressure region. The inductively coupled plasma source easily generates and maintains plasma ignition even in the low pressure region, and the transformer coupled plasma source can generate a large amount of plasma without damaging the reactor even in the high pressure region. The hybrid plasma reactor of the present invention can effectively operate two plasma sources as one power source, and can selectively drive only one or mixed driving in a structure in which an inductively coupled plasma transformer and a transformer coupled plasma source are mixed. Do.

Description

Hybrid Plasma Reactor {HYBRIDE PLASMA REACTOR}

The present invention relates to a plasma reactor for generating an active gas containing ions, free radicals, atoms and molecules by plasma discharge and performing plasma treatment on solids, powders, gases, etc. with the active gas. The present invention relates to a hybrid plasma reactor that generates plasma in combination using a plasma source and a transformer coupled plasma source.

Plasma discharges are used in gas excitation to generate active gases including ions, free radicals, atoms, and molecules. The active gas is widely used in various fields, and typically, variously used in semiconductor manufacturing processes such as etching, deposition, cleaning, and ashing.

In recent years, wafers and LCD glass substrates for manufacturing semiconductor devices have become larger. Thus, there is a demand for a plasma source that has a high controllability against plasma ion energy, has a large area processing capability, and is easy to expand. The use of remote plasma in a semiconductor manufacturing process using plasma is known to be very useful. For example, in cleaning process chambers or in ashing processes for photoresist strips. However, as the substrate to be processed becomes larger, the volume of the process chamber is also increased, and a plasma source capable of sufficiently supplying high-density active gas remotely is required.

Remote plasma reactors (also called remote plasma generators) use a transformer coupled plasma source and an inductively coupled plasma source. A remote plasma reactor using a transformer coupled plasma source has a structure in which a magnetic core having a primary winding is mounted on a reactor body of a toroidal structure. A remote plasma reactor using an inductively coupled plasma source has a structure in which an inductively coupled antenna is mounted on a reactor body of a hollow tube structure.

In the case of a remote plasma reactor having a transformer coupled plasma source, it is difficult to maintain plasma ignition or ignited plasma in a low pressure atmosphere because it operates in a relatively high pressure atmosphere. In the case of a remote plasma reactor having an inductively coupled plasma plasma source, it is possible to operate in a relatively low pressure atmosphere due to its characteristics, but to operate in a high pressure atmosphere, the power supply must be increased, but in this case, the inside of the reactor body may be damaged by ion bombardment. .

However, there is a need for a remote plasma reactor that operates efficiently at low or high pressure according to various requirements of the semiconductor manufacturing process. However, a conventional remote plasma reactor employing either a combined plasma source or an inductively coupled plasma source could not be appropriately responded. .

It is an object of the present invention to provide a hybrid plasma reactor in which an inductively coupled plasma transformer and a transformer coupled plasma source are mixed to have a wide operating range from a low pressure region to a high pressure region.

Another object of the present invention is to provide a hybrid plasma reactor in which an inductively coupled plasma source and a transformer coupled plasma source are mixed to generate and maintain plasma ignition easily in a low pressure region and to generate a large amount of plasma without damaging the reactor in a high pressure region. have.

It is still another object of the present invention to provide a hybrid plasma reactor in which an inductively coupled plasma source and a transformer coupled plasma source are effectively operated as one power source.

It is still another object of the present invention to provide a hybrid plasma reactor capable of selectively driving only one of the structures in which the inductively coupled plasma transformer and the transformer coupled plasma source are mixed.

One aspect of the present invention for achieving the above technical problem relates to a hybrid plasma reactor. The hybrid plasma reactor of the present invention includes a reactor body having a plasma discharge space and a gas inlet and a gas outlet; A hybrid plasma source having an induction antenna coupled to the plasma formed in the plasma discharge space and a primary winding coil wound on a magnetic core and transformer coupled to the plasma; And an AC switching power supply for supplying plasma generation power to the induction antenna and the primary winding coil.

In one embodiment, the reactor body includes a dielectric window configured between the induction antenna and the plasma discharge space.

In one embodiment, it comprises a vacuum insulating member configured between the dielectric window and the reactor body.

In one embodiment, the plasma discharge space has an annular plasma discharge path continuous by the reactor body and the dielectric window.

In one embodiment, the plasma is initially ignited by an inductively coupled discharge by the induction antenna.

In one embodiment, the plasma is maintained by an inductively coupled plasma discharge by the induction antenna when the plasma discharge region is in a first atmospheric pressure state, the second atmospheric pressure state wherein the plasma discharge region is higher than the first atmospheric pressure Is maintained by the inductively coupled plasma discharge by the induction antenna and the transformer-coupled plasma discharge by the primary winding coil.

In one embodiment, the plasma is maintained by an inductively coupled plasma discharge by the induction antenna when the plasma discharge region is in a first atmospheric pressure state, the second atmospheric pressure state wherein the plasma discharge region is higher than the first atmospheric pressure Is maintained by a transformer coupled plasma discharge by the primary winding coil.

In one embodiment, the induction antenna and the primary winding coil are connected in series to the AC switching power supply.

In one embodiment, the induction antenna and the primary winding coil are connected in parallel to the AC switching power supply.

Since the hybrid plasma reactor of the present invention induces plasma discharge using an inductively coupled plasma transformer and a transformer coupled plasma source, the hybrid plasma reactor has a wide operating range from the low pressure region to the high pressure region. The inductively coupled plasma source easily generates and maintains plasma ignition even in the low pressure region, and the transformer coupled plasma source can generate a large amount of plasma without damaging the reactor even in the high pressure region. The hybrid plasma reactor of the present invention can effectively operate two plasma sources as one power source, and can selectively drive only one or mixed driving in a structure in which an inductively coupled plasma transformer and a transformer coupled plasma source are mixed. Do.

1 is a block diagram showing the overall configuration of a hybrid plasma reactor of the present invention and a plasma processing system having the same.
Figure 2a is a graph showing the ignition process of the hybrid plasma reactor of the present invention.
2b graphically illustrates the operating characteristics of the hybrid plasma reactor of the present invention.
3 is a perspective view showing the appearance of a hybrid plasma reactor according to a preferred embodiment of the present invention.
4 is an exploded perspective view of an inductively coupled plasma source of the hybrid plasma reactor of FIG. 3.
5 is a cross-sectional view of the hybrid plasma reactor of FIG. 3.
6 is a partial exploded assembly diagram of a hybrid plasma reactor equipped with a plate-shaped induction antenna.
FIG. 7 is a perspective view of a plate induction antenna for describing an electrical connection structure of the plate induction antenna of FIG. 6.
8 and 9 illustrate various modified structures of the plate-shaped induction antenna of FIG. 6.
10 to 14 illustrate various embodiments of an electrical connection structure between an inductively coupled plasma source and a transformer coupled plasma source of the hybrid plasma reactor of FIG. 3.
15 is a perspective view of an alternative hybrid plasma reactor having a plurality of inductively coupled plasma sources.
FIG. 16 is a diagram illustrating an electrical connection structure of a plurality of inductively coupled plasma sources and a transformer coupled plasma source of the hybrid plasma reactor of FIG. 15.
17 is a perspective view of another alternative hybrid plasma reactor having two inductively coupled plasma sources and one transformer coupled plasma source.
18 is a cross-sectional view of the hybrid plasma reactor of FIG. 17.
19 to 22 illustrate various embodiments of an electrical connection structure of two inductively coupled plasma sources and one transformer coupled plasma source of the hybrid plasma reactor of FIG. 17.
Figure 23 is a schematic cross-sectional view of the reactor body for explaining the correlation structure of the inner diameter for each reactor body position in the hybrid plasma reactor of the present invention.
FIG. 24 illustrates an interconnect structure for vacuum insulation of a reactor body dielectric window in a hybrid plasma reactor of the present invention.

For a better understanding of the present invention, a preferred embodiment of the present invention will be described with reference to the accompanying drawings. The embodiments of the present invention may be modified into various forms, and the scope of the present invention should not be construed as being limited to the embodiments described in detail below. The present embodiments are provided to enable those skilled in the art to more fully understand the present invention. Therefore, the shapes and the like of the elements in the drawings can be exaggeratedly expressed to emphasize a clearer description. It should be noted that the same components are denoted by the same reference numerals in the drawings. Detailed descriptions of well-known functions and constructions which may be unnecessarily obscured by the gist of the present invention are omitted.

1 is a block diagram showing the overall configuration of a hybrid plasma reactor of the present invention and a plasma processing system having the same.

Referring to FIG. 1, the hybrid plasma reactor 10 (hereinafter, abbreviated as plasma reactor) of the present invention is installed outside the process chamber 40 to remotely supply plasma to the process chamber 40. The plasma reactor 10 has a hybrid plasma source 20. The hybrid plasma source 20 has a transformer coupled plasma source 25 that is transformer coupled with an inductively coupled plasma source 21 that is inductively coupled with a plasma generated in the plasma reactor 10. The plasma reactor 10 generates a mixture of inductively coupled plasma and transformer-coupled plasma by the hybrid plasma source 20 to stably at a wide range of atmospheric pressure conditions ranging from low pressure of 1 torr or lower to high pressure of 10 torr or higher. It can generate a plasma. The plasma reactor 10 has a reactor body 11 that provides a plasma discharge space. The reactor body 11 has a gas inlet 12 and a gas outlet 16. The gas outlet 16 is connected to the chamber gas inlet 47 of the process chamber 40 through the adapter 48. The plasma gas generated in the plasma reactor 10 is supplied to the process chamber 40 through the adapter 48.

The process chamber 40 is provided with a substrate support 42 for supporting the substrate 44 to be processed therein. The substrate support 42 may be electrically connected to one or more bias power sources 70, 72 through an impedance matcher 74. The adapter 48 may have an insulation section for electrical insulation, and may have a cooling channel for preventing overheating. The process chamber 40 has a baffle 46 for plasma gas distribution between the substrate support 42 and the chamber gas inlet 47 therein. The baffle 46 allows the plasma gas introduced through the chamber gas inlet 47 to be uniformly distributed and diffused to the substrate to be processed. The substrate 44 to be processed is, for example, a silicon wafer substrate for producing a semiconductor device or a glass substrate for producing a liquid crystal display or a plasma display.

The hybrid plasma source 20 operates by receiving a radio frequency from the power supply 30. The power supply 30 includes an AC switching power supply 32 and a power control circuit 33 and a voltage source 31 that are provided with one or more switching semiconductor devices to generate radio frequency . The one or more switching semiconductor devices include, for example, one or more switching transistors. The voltage supply 31 converts an AC voltage input from the outside into a constant voltage and supplies it to the AC switching power supply 32. The AC switching power supply source 32 operates under the control of the control circuit 33 and generates a radio frequency.

The control circuit 33 controls the operation of the AC switching power supply 32 to control the voltage and current of the radio frequency. Control of the control circuit 33 is based on electrical or optical parameter values associated with at least one of the hybrid plasma source 20 and the hybrid plasma generated inside the reactor body 11. For this purpose, the control circuit 33 is equipped with a measuring circuit for measuring the electrical or optical parameter values. For example, a measurement circuit for measuring the electrical and optical parameters of a plasma includes a current probe and an optical detector. The measurement circuit for measuring the electrical parameters of the hybrid plasma source 20 measures the drive current, the drive voltage, the average power and the maximum power of the hybrid plasma source 20, the voltage generated from the voltage source 31, and the like.

The control circuit 33 continuously monitors the associated electrical or optical parameter values through the measurement circuit and controls the alternating switching power supply 32 in comparison with the measured value and the reference value based on the normal operation, Thereby controlling the current. Although not specifically shown, the power supply source 30 is provided with a protection circuit for preventing electrical damage which may be caused by an abnormal operating environment. The power supply source 30 is connected to a system control unit 60 that controls the plasma processing system. The power supply source 30 provides operating status information of the plasma reactor 10 to the system control unit 60. The system controller 60 generates a control signal for controlling the overall operation process of the plasma processing system to control the operation of the plasma reactor 10 and the process chamber 40.

The plasma reactor 10 and the power supply 30 have a physically separated structure. That is, the plasma reactor 10 and the power supply source 30 are electrically connected to each other by the radio frequency supply cable 35. This separation structure of the plasma reactor 10 and the power supply 30 provides for ease of maintenance and installation. However, the plasma reactor 10 and the power supply 30 may be provided in an integrated structure.

Figure 2a is a graph showing the ignition process of the hybrid plasma reactor of the present invention, Figure 2b is a graph showing the operating characteristics of the hybrid plasma reactor of the present invention.

Referring to FIG. 2A, the hybrid plasma reactor 10 of the present invention is characterized by being ignited by an inductively coupled plasma source 21 at initial ignition and subsequently ignited by a transformer coupled plasma source 25 after initial ignition. . Thus, the plasma reactor 10 does not have a separate ignition circuit. The circuit configuration is simplified by not providing a separate ignition circuit in the plasma reactor 10. In addition, there is an advantage in that it is possible to reduce the pollution generated during the ignition process that has been generated when the conventional ignition circuit is provided inside the reactor body (11).

Referring to FIG. 2B, the hybrid plasma reactor 10 of the present invention may maintain the plasma ignition state by driving only the inductively coupled plasma source 21 alone under low pressure of 1 torr or less. Under high pressure conditions of 10 torr or more, the inductively coupled plasma source 21 and the transformer coupled plasma source 25 are simultaneously driven to maintain plasma ignition. Conventionally, in the case of a plasma reactor using only a transformer-coupled plasma source, it is difficult to maintain plasma ignition at low pressure, whereas the plasma reactor 10 of the present invention can operate at a wide range of atmospheric pressure conditions because plasma ignition can be maintained at low pressure and high pressure. It can be characterized.

This operating feature can be usefully used in connection with the process going on in the process chamber 40. For example, atmospheric pressure conditions of the plasma reactor 10 may vary according to various process characteristics such as the process chamber 40 and the case of the self-cleaning process. At this time, the plasma reactor 10 operates only one or both of the inductively coupled plasma source 21 and the transformer coupled plasma source 25 depending on the air pressure conditions, thereby appropriately suitable for the process processed in the process chamber 40. I can cope.

Figure 3 is a perspective view showing the appearance of the hybrid plasma reactor according to a preferred embodiment of the present invention, Figure 4 is an exploded perspective view of the inductively coupled plasma source of the hybrid plasma reactor of FIG. And FIG. 5 is a cross-sectional view of the hybrid plasma reactor of FIG. 3.

3 to 5, the hybrid plasma reactor 10a according to the preferred embodiment has a continuous annular structure in which the dielectric window 13 and the reactor body 11 of the hollow tube structure are combined. At the outer circumference of the dielectric window 13, an induction antenna 22 constituting the inductively coupled plasma source 21 is wound. Although not shown in the figure, a hollow protective tube is provided which completely surrounds the dielectric window 13 and the induction antenna 22. The reactor body 11 is equipped with one or more magnetic cores 26 with primary windings 27 that make up the transformer coupled plasma source 25. As shown in the figure, the magnetic core 26 has a ring-shaped structure and may be dividedly mounted in two regions of the reactor body 11. The primary winding 27 is commonly wound on the magnetic core 26 divided into two regions. The reactor body 11 and the dielectric window 13 are coupled to each other with the vacuum insulating ring 14 interposed therebetween.

The reactor body 11 may be made of a conductor material, for example aluminum. Alternatively, it may be composed of an insulator material such as quartz. In the case of being made of a conductor material, it is preferable to use an anodized one. In the case of the conductive material, it may be very useful to use a composite material, for example, a composite material composed of aluminum covalently bonded with carbon nanotube. Such a composite material has a strength that is approximately three times or more than that of conventional aluminum, and the weight is light compared to the strength. Although not shown in detail, the reactor body 11 is provided with a cooling channel therein to prevent overheating. Alternatively, a separate cooling cover covering the reactor body 11 may be provided. Separate cooling means may also be provided to prevent overheating of electrical components such as the magnetic core 26, the primary winding 27, and the induction antenna 22.

A gas inlet 12 is provided at the top of the reactor body 11 and a gas outlet 16 is provided at the bottom. In this embodiment, two gas inlets 12 are provided near both ends of the dielectric window 13. The gas outlet 16 is connected to the process chamber 40 through the adapter 48. Gas entering through the two gas inlets 12 flows along an annular path formed by the reactor body 11 and the dielectric window 13 and is exhausted through the gas outlet 16 at the bottom.

Induction antenna 22 and primary winding 27 are connected in series to power supply 30. When a radio frequency is supplied from the power source 30 to the induction antenna 22 and the primary winding 27, induced electromotive force is transferred to the gas flowing along the annular path to initiate plasma discharge. At this time, the initial ignition is generated by electromotive force induced by the induction antenna 22 inside the dielectric window 13. After initial ignition, the plasma discharge is diffused along the annular path by electromotive force induced inside the reactor body 11 by the primary winding 27 wound on the magnetic core 27.

The hybrid plasma reactor 10a of the present invention does not need to have a separate ignition electrode inside the reactor body 11 since the initial ignition is generated by the induction antenna 22 constituting the inductively coupled plasma source 21. . In addition, since the initial ignition is formed by the induction antenna 22, the initial ignition and maintenance are very easy even at low atmospheric pressure conditions. In addition, since the plasma discharge is continued by the transformer coupled plasma source 25 under high atmospheric pressure conditions, it is also very easy to generate a large amount of plasma.

FIG. 6 is a partial exploded view of a hybrid plasma reactor equipped with a plate induction antenna, and FIG. 7 is a perspective view of a plate induction antenna for explaining an electrical connection structure of the plate induction antenna of FIG. 6. 8 and 9 illustrate various modified structures of the plate-shaped induction antenna of FIG. 6.

Referring to FIG. 6, the inductively coupled plasma source 21a provided in the plasma reactor 10a may be configured as a plate-shaped induction antenna 22a having a cylindrical structure. Cylindrical dielectric windows 13a-1 and 13a-2 are provided inside and outside the plate-shaped induction antenna 22a, respectively. The plate-shaped induction antenna 22a having a cylindrical structure has a discontinuous cylindrical structure, one end of which is connected to the power supply 30 as illustrated in FIG. 7, and the other end of which is electrically connected to the primary winding 27, thereby turning one turn. Function as an antenna). Alternatively, as shown in FIG. 8, two plate-shaped induction antennas 22a-1 and 22a-2 may be separated to function as two-turn antennas. Alternatively, as shown in FIG. 9, the plate induction antenna 22b may be wound several times together with the insulating member 23 to function as an antenna of the lottery ticket. As such, the inductive antennas 22, 22a, 22b constituting the inductively coupled plasma source 21 may be variously modified based on the present invention.

10 to 14 illustrate various embodiments of an electrical connection structure between an inductively coupled plasma source and a transformer coupled plasma source of the hybrid plasma reactor of FIG. 3.

Referring to FIG. 10, the inductively coupled plasma source 21 and the transformer coupled plasma source 25 provided in the hybrid plasma reactor 10 of the present invention operate by receiving a radio frequency from a power supply source 30. The induction antenna 22 of the inductively coupled plasma source 21 and the primary winding 27 of the transformer coupled plasma source 25 may have a structure connected in series with the power supply 30. When the radio frequency is supplied from the power source 30, the induction electric field E1 is generated inside the reactor body 11 from the magnetic field H1 generated by the induction antenna 22, and together with the magnetic core 26. Another induction electric field E2 is generated inside the reactor body 11 from the magnetic field (not shown) generated in the primary winding 27 wound at. As such, plasma discharge is generated inside the reactor body 11 by electric fields E1 and E2 respectively induced by the induction antenna 22 and the primary winding 27.

The electrical scheme in which the induction antenna 22 and the primary winding 27 are connected to the power source 30 may be variously modified as follows. For example, as shown in FIG. 11, the primary winding 27 is first connected to the power supply 30, and then the inductive antenna 21 is connected to the electrical connection structure. Alternatively, as shown in FIG. 12, the induction antenna 22 and the primary winding 27 may be connected in parallel with respect to the power supply 30. Alternatively, as shown in FIG. 13, the switching circuit 50 connected to the ground may be connected to the connection node of the induction antenna 22 and the primary winding 27. In this case, the switching circuit 50 selectively connects the connection node to ground. Therefore, when the switching circuit 50 is turned on and the connection node is connected to the ground, only the inductively coupled plasma source 21 is driven. When the switching circuit 50 is turned off, the inductively coupled plasma source 21 and the transformer-coupled plasma source 25 are Driven simultaneously. Alternatively, as shown in FIG. 14, the induction antenna 22 and the primary winding 27 may be connected in parallel through the first and second switching circuits 51 and 52 which respectively connect to the power supply 30. . In this case, the inductively coupled plasma source 21 and the transformer-coupled plasma source 25 are driven simultaneously or selectively either or both are driven depending on the switching operation of the first and second switching circuits 51 and 52. Can be stopped.

15 is a perspective view of an alternative hybrid plasma reactor having a plurality of inductively coupled plasma sources, and FIG. 16 illustrates an electrical connection structure of a plurality of inductively coupled plasma sources and a transformer coupled plasma source of the hybrid plasma reactor of FIG. 15. to be.

15 and 16, the hybrid plasma reactor 10b according to the modification includes a plurality of inductively coupled plasma sources 21-1 to 21-4 and one transformer coupled plasma source 25. The plurality of inductively coupled plasma sources 21-1 to 21-4 are configured by winding induction antennas 22-1 to 22-4 on dielectric windows installed in various parts of the reactor body 11. As shown in FIG. 16, the plurality of induction antennas 22-1 to 22-4 respectively induce a plasma discharge by inducing a plurality of electric fields E 1-1 to E 1-4 inside the reactor body 11. Let's do it. Although the plurality of induction antennas 22-1 to 22-4 and one primary winding 27 basically illustrate a structure connected in series, those skilled in the art will be able to perform various modifications based on the present invention. It may also include a configuration of a switching circuit for selectively operating any one.

17 is a perspective view of another alternative hybrid plasma reactor having two inductively coupled plasma sources and one transformer coupled plasma source, and FIG. 18 is a cross-sectional view of the hybrid plasma reactor of FIG. 19 to 22 show various embodiments of an electrical connection structure of two inductively coupled plasma sources and one transformer coupled plasma source of the hybrid plasma reactor of FIG. 17.

17 and 18, the hybrid plasma reactor 10c according to another modification of the present invention includes one transformer coupled plasma source 25b and two inductively coupled plasma sources 21-1 and 21-2. It is the case with. The two inductively coupled plasma sources 21-1 and 21-2 are symmetrically installed in the reactor body 11 having an annular structure, and a transformer coupled plasma source 25b is installed therebetween. In such a structure, the electrical connection structure of one primary winding 27b and the two induction antennas 22-1 and 22-2 may have various electrical connection structures in series or parallel, as shown in FIGS. 19 to 22. Can have In addition, although not shown in the drawings, it may include a switching circuit configuration for selectively operating any one.

Figure 23 is a schematic cross-sectional view of the reactor body for explaining the correlation structure of the inner diameter for each reactor body position in the hybrid plasma reactor of the present invention.

Referring to FIG. 23, the reactor body 11 is connected with the dielectric window 13 to provide a hollow annular path. The gas flowing from the top of the reactor body 11 flows through the branched upper path 11a, merges into the exhaust path 11c through the lower path 11b, and finally exhausts through the gas outlet 16. At this time, it is preferable that the inner diameter W_a of the upper path 11a, the inner diameter W_b of the lower path 11b and the inner diameter W_c of the exhaust path W_c gradually become narrower. This change in the inner diameter ratio may be set in consideration of the flow rate and gas decomposition rate of the internal gas flow of the reactor body (11).

FIG. 24 illustrates an interconnect structure for vacuum insulation of a reactor body dielectric window in a hybrid plasma reactor of the present invention.

Referring to FIG. 24, a vacuum insulation ring 14 is provided between the reactor body 11 and the dielectric window 13 for proper vacuum insulation. In this case, the vacuum insulation ring 14 may be composed of two members 14-1 and 14-2. One is the elastic member 14-1 and the other is the inelastic member 14-2. The elastic member 14-1 is used for substantial vacuum insulation and is installed close to the outer region of the reactor body 11, and the inelastic member 14-2 is installed close to the inner plasma discharge region of the reactor body 11. . Therefore, the elastic member 14-1 can be prevented from being deteriorated by high heat plasma gas.

The embodiment of the hybrid plasma reactor of the present invention described above is merely exemplary, and those skilled in the art will appreciate that various modifications and other equivalent embodiments are possible therefrom. Could be. Accordingly, it is to be understood that the present invention is not limited to the above-described embodiments. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims. It is also to be understood that the invention includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.

10, 10a, 10b, 10c: hybrid plasma reactor
11: reactor body 12: gas inlet
13: dielectric window 14: vacuum insulation ring
16: gas outlet 20: hybrid plasma source
21, 21a, 21-1 to 21-4: Inductively Coupled Plasma Sources
22, 22a, 22b, 22-1 to 22-4: induction antenna
23: insulation layer 25, 25b: transformer coupled plasma source
26, 26b: magnetic core 27, 27b: primary winding
30: power source 31: voltage source
32: AC switching power supply 33: switching control circuit
34: measuring circuit 35: power supply cable
40: process chamber 42: substrate support
44: substrate to be processed 46: baffle
47: chamber gas inlet 48: adapter
50, 51, 52: switching circuit 60: system control unit
62: system control signal 70, 72: bias power source
74: impedance matcher E1: induction electric field
E1: Induction electric field H1: Induction magnetic field
w_a, w_b, w_c: inner diameter

Claims (9)

A reactor body forming a plasma discharge space having a continuous annular structure with a dielectric window coupled to the top, the reactor body having a gas inlet formed at the top and a gas outlet formed at the bottom;
An induction antenna wound around an outer periphery of the dielectric window to inductively couple with a plasma formed in the plasma discharge space to form an inductively coupled plasma source, and a transformer of the dielectric window to be coupled to a plasma formed in the plasma discharge space; A hybrid plasma source comprising a primary winding coil wound around a magnetic core mounted to a reactor body in a lower position to form a transformer coupled plasma source; And
An AC switching power supply for supplying plasma generation power to the induction antenna and the primary winding coil,
The plasma may be initially ignited by an inductively coupled discharge by the inductive antenna, and then subsequently ignited by a transformer coupled plasma source comprising the primary winding coil,
The plasma is
Is maintained by inductively coupled plasma discharge by the induction antenna when the plasma discharge region is in a first atmospheric pressure state,
When the plasma discharge region is in a second atmospheric pressure state higher than the first atmospheric pressure, the plasma discharge region is maintained by the inductively coupled plasma discharge by the induction antenna and the transformer-coupled plasma discharge by the primary winding coil or by the primary winding coil. Hybrid plasma reactor maintained by a transformer coupled plasma discharge. delete The method of claim 1,
And a vacuum insulation member disposed between the dielectric window and the reactor body. delete delete delete delete The method of claim 1,
And the induction antenna and the primary winding coil are connected in series to the AC switching power supply. The method of claim 1,
And the induction antenna and the primary winding coil are connected in parallel to the alternating current switching power supply.

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