WO2017156951A1 - Silicon wafer securing apparatus - Google Patents

Silicon wafer securing apparatus Download PDF

Info

Publication number
WO2017156951A1
WO2017156951A1 PCT/CN2016/091832 CN2016091832W WO2017156951A1 WO 2017156951 A1 WO2017156951 A1 WO 2017156951A1 CN 2016091832 W CN2016091832 W CN 2016091832W WO 2017156951 A1 WO2017156951 A1 WO 2017156951A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon wafer
base
width
height
tailgate
Prior art date
Application number
PCT/CN2016/091832
Other languages
French (fr)
Chinese (zh)
Inventor
林瀚琪
Original Assignee
张甘霖
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 张甘霖 filed Critical 张甘霖
Publication of WO2017156951A1 publication Critical patent/WO2017156951A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Silicon Compounds (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A silicon wafer securing apparatus, used for securing a silicon wafer (100) whilst weighing said silicon wafer (100), the securing apparatus comprising a base (1), the edge of a first end (11) of the base (1) protruding upward and being provided with a front baffle (2), and the edge of the second end (12) of the base (1) opposite the first end (11) protruding upward and being provided with a rear baffle (3), the top face (31) of the rear baffle (3) having an oblique shape, and the outer side face (32) of the rear baffle (3) being higher than the inner side face (33); when a silicon wafer (100) is secured on the present securing apparatus, the bottom end (101) of the silicon wafer (100) is supported by the base (1) and is pressed onto the front baffle (2), the back face (102) of the silicon wafer (100) being pressed onto the oblique top face (31) and being supported by the rear baffle (3). The present silicon wafer securing apparatus increases silicon wafer (100) weighing accuracy; using the present apparatus can also reduce contamination of the silicon wafer (100) by an electronic scale.

Description

一种硅片固定装置Silicon wafer fixing device 技术领域Technical field
本发明涉及太阳能电池制造技术领域,尤其是一种在称量硅片的重量时用于固定硅片的硅片固定装置。The invention relates to the technical field of solar cell manufacturing, in particular to a silicon wafer fixing device for fixing a silicon wafer when weighing the silicon wafer.
背景技术Background technique
太阳能光伏发电因其清洁、安全、便利、高效等特点,已成为世界各国普遍关注和重点发展的新兴产业。因此,深入研究和利用太阳能资源,对缓解资源危机、改善生态环境具有十分重要的意义。Due to its clean, safe, convenient and efficient characteristics, solar photovoltaic power generation has become an emerging industry with universal attention and key development in the world. Therefore, in-depth study and utilization of solar energy resources is of great significance for alleviating resource crises and improving the ecological environment.
在太阳能电池的生产过程中,制绒与刻蚀工序均需要对硅片加工前后的重量进行称量,来监控工艺的稳定性。现有技术中,通常是直接将硅片放置在电子秤上进行称量,在称量过程中,硅片与电子称台面直接接触,容易发生滑动,造成称量误差。同时,硅片直接与电子称台面接触,易造成硅片表面污染,影响太阳能电池光电转换效率。针对称量误差现有的现有解决方式为:重复称量多次,取平均值,这种方式给员工工作带来了复杂性,大大降低了生产工作效率。针对称量时造成的表面污染的现有解决方式为:增加擦拭电子称台面的频率,减少污染源,这种方式增加了员工的工作内容,且效果不明显。In the production process of solar cells, both the texturing and etching processes need to weigh the weight before and after processing of the silicon wafer to monitor the stability of the process. In the prior art, the silicon wafer is usually placed directly on the electronic scale for weighing. During the weighing process, the silicon wafer is in direct contact with the electronic scale surface, which is prone to slippage and causes weighing error. At the same time, the silicon wafer is directly in contact with the surface of the electronic scale, which is likely to cause surface contamination of the silicon wafer and affect the photoelectric conversion efficiency of the solar cell. The existing solution to the weighing error is to repeat the weighing multiple times and take the average value. This method brings complexity to the work of the employees and greatly reduces the production efficiency. The existing solution to the surface contamination caused by weighing is to increase the frequency of wiping the electronic weighing table and reduce the pollution source. This method increases the work content of the employees, and the effect is not obvious.
发明内容Summary of the invention
有鉴于此,本发明提供了一种硅片固定装置,在称量硅片的重量时,先使用该固定装置固定硅片,然后再放置到电子秤上称量,提高了称量的准确性;同时使用该装置还可以减少电子秤对硅片的污染。In view of this, the present invention provides a silicon wafer fixing device. When weighing the silicon wafer, the fixing device is used to fix the silicon wafer, and then placed on the electronic scale for weighing, thereby improving the accuracy of weighing. At the same time, the use of the device can also reduce the contamination of the silicon scale by the electronic scale.
为了达到上述的目的,本发明采用了如下的技术方案:In order to achieve the above object, the present invention adopts the following technical solutions:
一种硅片固定装置,用于在称量硅片的重量时对所述硅片进行固定,其中,所述固定装置包括底座,所述底座的第一端边缘向上凸起设置有前挡板,所述底座的与第一端相对的第二端边缘向上凸起设置有后挡板,所述后挡板的顶面呈倾斜状,所述后挡板的外侧面高于内侧面;将所述硅片固定在所述固定装置上时,所述硅片的底端被所述底座支撑且顶压在所述前挡板上,所述硅片的背面顶压在所述倾斜状的顶面上被所述后挡板支撑。 A silicon wafer fixing device for fixing the silicon wafer when weighing the silicon wafer, wherein the fixing device comprises a base, and the first end edge of the base is convexly provided with a front bezel a second end edge of the base opposite to the first end is upwardly provided with a tailgate, a top surface of the tailgate is inclined, and an outer side surface of the tailgate is higher than an inner side; When the silicon wafer is fixed on the fixing device, the bottom end of the silicon wafer is supported by the base and pressed against the front baffle, and the back surface of the silicon wafer is pressed against the inclined shape. The top surface is supported by the tailgate.
其中,所述底座、前挡板和后挡板分别为平板状结构或网格镂空状结构。Wherein, the base, the front baffle and the rear baffle are respectively a flat structure or a mesh hollow structure.
其中,所述底座、前挡板和后挡板为一体状结构。Wherein, the base, the front baffle and the rear baffle are integrally formed.
其中,所述后挡板的顶面与外侧面的夹角为25~35°。Wherein, the angle between the top surface and the outer side surface of the tailgate is 25 to 35 degrees.
其中,所述底座的宽度为70±5mm,长度为50±5mm,高度为10±2mm。Wherein, the base has a width of 70±5 mm, a length of 50±5 mm, and a height of 10±2 mm.
其中,所述前挡板的宽度为3±1mm,高度为6±2mm。Wherein, the front baffle has a width of 3±1 mm and a height of 6±2 mm.
其中,所述后挡板的宽度为10±2mm,高度为80±5mm。Wherein, the back baffle has a width of 10±2 mm and a height of 80±5 mm.
在一个其中技术方案中,所述底座的宽度为70mm,长度为50mm,高度为10mm;所述前挡板的宽度为2mm,高度为5mm,长度与所述底座的宽度相等;所述后挡板的宽度为10mm,高度为80mm,长度与所述底座的宽度相等;所述后挡板的顶面与外侧面的夹角为31°。In one embodiment, the base has a width of 70 mm, a length of 50 mm, and a height of 10 mm; the front baffle has a width of 2 mm and a height of 5 mm, and the length is equal to the width of the base; The width of the plate is 10 mm, the height is 80 mm, and the length is equal to the width of the base; the angle between the top surface and the outer side of the tailgate is 31°.
本发明提供的硅片固定装置,在称量硅片的重量时,先使用该固定装置固定硅片,然后再放置到电子秤上称量,可以避免硅片发生滑动,提高了称量的准确性。进一步地,硅片呈倾斜状地固定在所述固定装置中,硅片与固定装置的接触面积小,在称量的过程中可以减小对硅片的污染。The silicon wafer fixing device provided by the invention firstly fixes the silicon wafer by using the fixing device when weighing the weight of the silicon wafer, and then placing it on the electronic scale for weighing, thereby avoiding sliding of the silicon wafer and improving the accuracy of weighing. Sex. Further, the silicon wafer is fixed in the fixing device in an inclined manner, and the contact area between the silicon wafer and the fixing device is small, and the contamination of the silicon wafer can be reduced during the weighing process.
附图说明DRAWINGS
图1是本发明提供的硅片固定装置的结构示意图;1 is a schematic structural view of a silicon wafer fixing device provided by the present invention;
图2是本发明提供的硅片固定装置中装载有硅片的示例性图示。2 is an exemplary illustration of a silicon wafer holding device provided with the present invention loaded with a silicon wafer.
具体实施方式detailed description
下面结合具体实施例,进一步阐述本发明。应理解,这些实施例仅用于说明本发明而不用于限制本发明的范围。此外应理解,在阅读了本发明讲授的内容之后,本领域技术人员可以对本发明作各种改动或修改,这些等价形式同样落于本申请所附权利要求书所限定的范围。The invention is further illustrated below in conjunction with specific embodiments. It is to be understood that the examples are not intended to limit the scope of the invention. In addition, it should be understood that various changes and modifications may be made by those skilled in the art in the form of the present invention.
在此,还需要说明的是,为了避免因不必要的细节而模糊了本发明,在附图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤,而省略了与本发明关系不大的其他细节。In this context, it is also to be noted that in order to avoid obscuring the invention by unnecessary detail, only the structures and/or processing steps closely related to the solution according to the invention are shown in the drawings, and the Other details that are not relevant to the present invention.
本发明实施例提供了一种硅片固定装置,参阅图1和图2,该固定装置主要是用于在称量硅片100的重量时对所述硅片100进行固定。具体第地,如图1所示,所述固定装置包括底座1,所述底座1的第一端11边缘向上凸起设置有 前挡板2,所述底座1的与第一端11相对的第二端12边缘向上凸起设置有后挡板3,所述后挡板3的顶面31呈倾斜状,所述后挡板3的外侧面32高于内侧面33。参阅图2,将所述硅片100固定在所述固定装置上时,所述硅片100的底端101被所述底座1支撑且顶压在所述前挡板2上,所述硅片100的背面102顶压在所述倾斜状的顶面31上被所述后挡板3支撑。The embodiment of the present invention provides a silicon wafer fixing device. Referring to FIG. 1 and FIG. 2, the fixing device is mainly used for fixing the silicon wafer 100 when weighing the silicon wafer 100. Specifically, as shown in FIG. 1 , the fixing device includes a base 1 , and the first end 11 of the base 1 has an edge protruding upwardly. The front baffle 2, the edge of the second end 12 of the base 1 opposite to the first end 11 is convexly disposed with a tailgate 3, and the top surface 31 of the tailgate 3 is inclined, the rear block The outer side 32 of the plate 3 is higher than the inner side 33. Referring to FIG. 2, when the silicon wafer 100 is fixed on the fixing device, the bottom end 101 of the silicon wafer 100 is supported by the base 1 and pressed against the front baffle 2, the silicon wafer The back surface 102 of the 100 is pressed against the inclined top surface 31 by the tailgate 3.
在称量硅片的重量时,先使用该固定装置固定硅片,然后再放置到电子秤上称量,可以避免硅片发生滑动,提高了称量的准确性。进一步地,硅片呈倾斜状地固定在所述固定装置中,硅片与固定装置的接触面积小,在称量的过程中可以减小对硅片的污染。When weighing the weight of the silicon wafer, the fixing device is used to fix the silicon wafer, and then placed on the electronic scale for weighing, thereby avoiding sliding of the silicon wafer and improving the accuracy of weighing. Further, the silicon wafer is fixed in the fixing device in an inclined manner, and the contact area between the silicon wafer and the fixing device is small, and the contamination of the silicon wafer can be reduced during the weighing process.
在本实施例中,如图1所示,所述底座1的宽度D1为70mm,长度L1为50mm,高度H1为10mm。所述前挡板2的宽度D2为2mm,高度H2为5mm,长度与所述底座1的宽度D1相等。所述后挡板3的宽度D3为10mm,高度H3为80mm,长度与所述底座1的宽度D1相等。所述后挡板3的顶面31与外侧面32的夹角α为31°。In the present embodiment, as shown in FIG. 1, the base 1 has a width D1 of 70 mm, a length L1 of 50 mm, and a height H1 of 10 mm. The front baffle 2 has a width D2 of 2 mm, a height H2 of 5 mm, and a length equal to the width D1 of the base 1. The tailgate 3 has a width D3 of 10 mm, a height H3 of 80 mm, and a length equal to the width D1 of the base 1. The angle α between the top surface 31 and the outer side surface 32 of the tailgate 3 is 31°.
需要说明的是,以上所述底座1、前挡板2和后挡板3的长、宽、高的具体参数仅是作为一个具体的例子进行说明,在另外的一些实施例中还可以取其他的数值。其中,所述底座1的宽度D1取值在70±5mm的范围内,长度L1取值在50±5mm的范围内,高度取值在10±2mm的范围内;所述前挡板2的宽度D2取值在3±1mm的范围内,高度H2取值在6±2mm的范围内,其长度也可以是大于或小于所述底座1的宽度D1;所述后挡板3的宽度D3取值在10±2mm的范围内,高度H3取值在80±5mm的范围内,其长度也可以是大于或小于所述底座1的宽度D1;所述后挡板3的顶面31与外侧面32的夹角α取值在25~35°的范围内。It should be noted that the specific parameters of the length, width and height of the base 1, the front baffle 2 and the tailgate 3 described above are only described as a specific example, and in other embodiments, other parameters may be taken. The value. Wherein, the width D1 of the base 1 is in the range of 70±5 mm, the length L1 is in the range of 50±5 mm, and the height is in the range of 10±2 mm; the width of the front baffle 2 The value of D2 is in the range of 3±1 mm, the height H2 is in the range of 6±2 mm, and the length may be greater or smaller than the width D1 of the base 1; the width D3 of the tailgate 3 is In the range of 10±2 mm, the height H3 is in the range of 80±5 mm, and the length may also be greater or smaller than the width D1 of the base 1; the top surface 31 and the outer side 32 of the tailgate 3 The angle α is in the range of 25 to 35°.
其中,如图1所示,本实施例中,所述底座1、前挡板2和后挡板3分别为平板状结构。当然在另外的一些实施例中,所述底座1、前挡板2和后挡板3也可以是分别设计为网格镂空状结构,这样既可以减轻固定装置的重量,还可以节省材料。当然,也可以是将底座1、前挡板2和后挡板3的其中一个或两个结构设计为平板状结构,其余的设计为网格镂空状结构。As shown in FIG. 1 , in the embodiment, the base 1 , the front baffle 2 and the rear baffle 3 respectively have a flat structure. Of course, in other embodiments, the base 1, the front baffle 2 and the tailgate 3 may also be designed as a mesh hollow structure, which can reduce the weight of the fixing device and save material. Of course, one or both of the structure of the base 1, the front baffle 2 and the tailgate 3 may be designed as a flat structure, and the rest of the design is a mesh hollow structure.
其中,如图1所示,本实施例中,所述底座1、前挡板2和后挡板3为一体状结构。当然在另外的一些实施例中,所述底座1、前挡板2和后挡板3也可以是分体结构,然后各部分再通过紧固件(例如螺纹件)固定连接。 As shown in FIG. 1 , in the embodiment, the base 1 , the front baffle 2 and the rear baffle 3 have an integral structure. Of course, in other embodiments, the base 1, the front baffle 2, and the tailgate 3 may also be separate structures, and then the portions are then fixedly coupled by fasteners (eg, screws).
综上所述,本发明提供的硅片固定装置,在称量硅片的重量时,先使用该固定装置固定硅片,然后再放置到电子秤上称量,提高了称量的准确性,同时可以减少对硅片的污染。在硅片称量的过程中,减轻了作业员工的工作负担,提高了工作效率。In summary, the silicon wafer fixing device provided by the present invention first uses the fixing device to fix the silicon wafer when weighing the silicon wafer, and then puts it on the electronic scale for weighing, thereby improving the accuracy of weighing. At the same time, it can reduce the contamination of the silicon wafer. In the process of weighing silicon wafers, the workload of the workers is reduced, and work efficiency is improved.
以上所述仅是本申请的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本申请的保护范围。 The above description is only a specific embodiment of the present application, and it should be noted that those skilled in the art can also make several improvements and retouchings without departing from the principles of the present application. It should be considered as the scope of protection of this application.

Claims (18)

  1. 一种硅片固定装置,用于在称量硅片的重量时对所述硅片进行固定,其中,所述固定装置包括底座,所述底座的第一端边缘向上凸起设置有前挡板,所述底座的与第一端相对的第二端边缘向上凸起设置有后挡板,所述后挡板的顶面呈倾斜状,所述后挡板的外侧面高于内侧面;将所述硅片固定在所述固定装置上时,所述硅片的底端被所述底座支撑且顶压在所述前挡板上,所述硅片的背面顶压在所述倾斜状的顶面上被所述后挡板支撑。A silicon wafer fixing device for fixing the silicon wafer when weighing the silicon wafer, wherein the fixing device comprises a base, and the first end edge of the base is convexly provided with a front bezel a second end edge of the base opposite to the first end is upwardly provided with a tailgate, a top surface of the tailgate is inclined, and an outer side surface of the tailgate is higher than an inner side; When the silicon wafer is fixed on the fixing device, the bottom end of the silicon wafer is supported by the base and pressed against the front baffle, and the back surface of the silicon wafer is pressed against the inclined shape. The top surface is supported by the tailgate.
  2. 根据权利要求1所述的硅片固定装置,其中,所述底座、前挡板和后挡板分别为平板状结构或网格镂空状结构。The silicon wafer fixing device according to claim 1, wherein the base, the front bezel, and the rear baffle are respectively a flat plate structure or a mesh hollow structure.
  3. 根据权利要求1所述的硅片固定装置,其中,所述底座、前挡板和后挡板为一体状结构。The silicon wafer holding device according to claim 1, wherein the base, the front bezel, and the rear baffle are of a unitary structure.
  4. 根据权利要求1所述的硅片固定装置,其中,所述后挡板的顶面与外侧面的夹角为25~35°。The silicon wafer fixing device according to claim 1, wherein an angle between a top surface and an outer side surface of the tailgate is 25 to 35°.
  5. 根据权利要求1所述的硅片固定装置,其中,所述底座的宽度为70±5mm,长度为50±5mm,高度为10±2mm。The silicon wafer holding device according to claim 1, wherein the base has a width of 70 ± 5 mm, a length of 50 ± 5 mm, and a height of 10 ± 2 mm.
  6. 根据权利要求1所述的硅片固定装置,其中,所述前挡板的宽度为3±1mm,高度为6±2mm。The silicon wafer holding device according to claim 1, wherein the front baffle has a width of 3 ± 1 mm and a height of 6 ± 2 mm.
  7. 根据权利要求1所述的硅片固定装置,其中,所述后挡板的宽度为10±2mm,高度为80±5mm。The silicon wafer holding device according to claim 1, wherein the tailgate has a width of 10 ± 2 mm and a height of 80 ± 5 mm.
  8. 根据权利要求1所述的硅片固定装置,其中,所述底座的宽度为70mm,长度为50mm,高度为10mm;所述前挡板的宽度为2mm,高度为5mm,长度与所述底座的宽度相等;所述后挡板的宽度为10mm,高度为80mm,长度与所述底座的宽度相等;所述后挡板的顶面与外侧面的夹角为31°。The silicon wafer fixing device according to claim 1, wherein the base has a width of 70 mm, a length of 50 mm, and a height of 10 mm; and the front baffle has a width of 2 mm and a height of 5 mm, and the length of the base is The width of the tailgate is 10 mm, the height is 80 mm, and the length is equal to the width of the base; the angle between the top surface and the outer side of the tailgate is 31°.
  9. 根据权利要求2所述的硅片固定装置,其中,所述后挡板的顶面与外侧面的夹角为25~35°。The silicon wafer fixing device according to claim 2, wherein an angle between a top surface and an outer side surface of the tailgate is 25 to 35 degrees.
  10. 根据权利要求2所述的硅片固定装置,其中,所述底座的宽度为70±5mm,长度为50±5mm,高度为10±2mm。The silicon wafer holding device according to claim 2, wherein the base has a width of 70 ± 5 mm, a length of 50 ± 5 mm, and a height of 10 ± 2 mm.
  11. 根据权利要求2所述的硅片固定装置,其中,所述前挡板的宽度为 3±1mm,高度为6±2mm。The silicon wafer fixture of claim 2, wherein the width of the front bezel is 3±1mm, height is 6±2mm.
  12. 根据权利要求2所述的硅片固定装置,其中,所述后挡板的宽度为10±2mm,高度为80±5mm。The silicon wafer holding device according to claim 2, wherein the tailgate has a width of 10 ± 2 mm and a height of 80 ± 5 mm.
  13. 根据权利要求2所述的硅片固定装置,其中,所述底座的宽度为70mm,长度为50mm,高度为10mm;所述前挡板的宽度为2mm,高度为5mm,长度与所述底座的宽度相等;所述后挡板的宽度为10mm,高度为80mm,长度与所述底座的宽度相等;所述后挡板的顶面与外侧面的夹角为31°。The silicon wafer fixing device according to claim 2, wherein the base has a width of 70 mm, a length of 50 mm, and a height of 10 mm; and the front baffle has a width of 2 mm and a height of 5 mm, and the length of the base is The width of the tailgate is 10 mm, the height is 80 mm, and the length is equal to the width of the base; the angle between the top surface and the outer side of the tailgate is 31°.
  14. 根据权利要求3所述的硅片固定装置,其中,所述后挡板的顶面与外侧面的夹角为25~35°。The silicon wafer fixing device according to claim 3, wherein an angle between a top surface and an outer side surface of the tailgate is 25 to 35°.
  15. 根据权利要求3所述的硅片固定装置,其中,所述底座的宽度为70±5mm,长度为50±5mm,高度为10±2mm。The silicon wafer holding device according to claim 3, wherein the base has a width of 70 ± 5 mm, a length of 50 ± 5 mm, and a height of 10 ± 2 mm.
  16. 根据权利要求3所述的硅片固定装置,其中,所述前挡板的宽度为3±1mm,高度为6±2mm。The silicon wafer holding device according to claim 3, wherein the front baffle has a width of 3 ± 1 mm and a height of 6 ± 2 mm.
  17. 根据权利要求3所述的硅片固定装置,其中,所述后挡板的宽度为10±2mm,高度为80±5mm。The silicon wafer holding device according to claim 3, wherein the tailgate has a width of 10 ± 2 mm and a height of 80 ± 5 mm.
  18. 根据权利要求3所述的硅片固定装置,其中,所述底座的宽度为70mm,长度为50mm,高度为10mm;所述前挡板的宽度为2mm,高度为5mm,长度与所述底座的宽度相等;所述后挡板的宽度为10mm,高度为80mm,长度与所述底座的宽度相等;所述后挡板的顶面与外侧面的夹角为31°。 The silicon wafer fixing device according to claim 3, wherein the base has a width of 70 mm, a length of 50 mm, and a height of 10 mm; and the front baffle has a width of 2 mm and a height of 5 mm, and the length of the base is The width of the tailgate is 10 mm, the height is 80 mm, and the length is equal to the width of the base; the angle between the top surface and the outer side of the tailgate is 31°.
PCT/CN2016/091832 2016-03-15 2016-07-27 Silicon wafer securing apparatus WO2017156951A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201620197373.7 2016-03-15
CN201620197373.7U CN205452259U (en) 2016-03-15 2016-03-15 Fixing device for silicon piece

Publications (1)

Publication Number Publication Date
WO2017156951A1 true WO2017156951A1 (en) 2017-09-21

Family

ID=56602807

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2016/091832 WO2017156951A1 (en) 2016-03-15 2016-07-27 Silicon wafer securing apparatus

Country Status (2)

Country Link
CN (1) CN205452259U (en)
WO (1) WO2017156951A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282670A (en) * 2002-03-27 2003-10-03 Dainippon Screen Mfg Co Ltd Substrate holding arm, substrate transport device, substrate processing device, and substrate holding method
CN201364885Y (en) * 2009-01-13 2009-12-16 中芯国际集成电路制造(上海)有限公司 Identifying tool
CN204885097U (en) * 2015-08-18 2015-12-16 珠海宏光照明器材有限公司 A device that is used for solid brilliant bonding wire of LED to inspect

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282670A (en) * 2002-03-27 2003-10-03 Dainippon Screen Mfg Co Ltd Substrate holding arm, substrate transport device, substrate processing device, and substrate holding method
CN201364885Y (en) * 2009-01-13 2009-12-16 中芯国际集成电路制造(上海)有限公司 Identifying tool
CN204885097U (en) * 2015-08-18 2015-12-16 珠海宏光照明器材有限公司 A device that is used for solid brilliant bonding wire of LED to inspect

Also Published As

Publication number Publication date
CN205452259U (en) 2016-08-10

Similar Documents

Publication Publication Date Title
CN102703989A (en) Monocrystal-like solar battery texturing process
TW201129680A (en) Acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
CN102969392B (en) A kind of single-sided polishing technique of solar energy single crystal silion cell
Calle et al. Long-term stability of Al2O3 passivated black silicon
WO2017156951A1 (en) Silicon wafer securing apparatus
WO2011076108A1 (en) Horizontal graphite boat
Ma et al. Texturization and rounded process of silicon wafers for heterojunction with intrinsic thin-layer solar cells
CN204720435U (en) A kind of solar cell plate clamp
CN211125619U (en) Tray fixed knot constructs based on electrostatic absorption
CN204982045U (en) Board -like PE CVD equipment
CN208240706U (en) A kind of novel solar cell slices
CN204497205U (en) A kind of film magazine reducing contamination sheet
CN201540900U (en) Clip for shipping silicone chips
CN217158152U (en) Tray for solar cell film formation
CN205774794U (en) A kind of graphite frame being applicable to board-like PECVD and bogey
Nakamura et al. Texturization control for fabrication of high efficiency mono crystalline si solar cell
CN204668280U (en) Detect tool
CN216245147U (en) Device for fixing infrared radiator in vacuum drying container
CN213692079U (en) Liner device for producing thin-film solar cell
CN203774346U (en) Composite back electrode for silicon thin-film solar cell
CN209963035U (en) Silicon chip bearing disc and silicon chip bearing device
CN203910775U (en) Novel vacuum chuck
CN215815815U (en) Adjustable bearing box device for reworked battery piece after film coating
CN201796934U (en) Bearing basket for silicon chip wool making
CN215094793U (en) Single crystal silicon rod cuts positioning jig for integrated circuit

Legal Events

Date Code Title Description
NENP Non-entry into the national phase

Ref country code: DE

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16894112

Country of ref document: EP

Kind code of ref document: A1

122 Ep: pct application non-entry in european phase

Ref document number: 16894112

Country of ref document: EP

Kind code of ref document: A1