WO2017133104A1 - 电致变色结构及其形成方法 - Google Patents

电致变色结构及其形成方法 Download PDF

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Publication number
WO2017133104A1
WO2017133104A1 PCT/CN2016/081231 CN2016081231W WO2017133104A1 WO 2017133104 A1 WO2017133104 A1 WO 2017133104A1 CN 2016081231 W CN2016081231 W CN 2016081231W WO 2017133104 A1 WO2017133104 A1 WO 2017133104A1
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Prior art keywords
conductive layer
layer
conductive
electrode
forming
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PCT/CN2016/081231
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English (en)
French (fr)
Inventor
刘钧
裴世铀
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无锡威迪变色玻璃有限公司
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Priority claimed from CN201620118707.7U external-priority patent/CN205643982U/zh
Priority claimed from CN201610084091.0A external-priority patent/CN107045242A/zh
Application filed by 无锡威迪变色玻璃有限公司 filed Critical 无锡威迪变色玻璃有限公司
Publication of WO2017133104A1 publication Critical patent/WO2017133104A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/155—Electrodes

Definitions

  • the present invention relates to the field of glass technology, and in particular to an electrochromic structure and a method of forming the same.
  • Electrochromism means that the properties of the material such as reflectance, transmittance, and absorptivity can be reversibly changed according to the magnitude and polarity of the electric field under the action of an applied electric field.
  • the electrochromic structure is formed on the surface of the glass to form an electrochromic glass, and the control of the light transmission property of the glass can be realized by voltage control.
  • the energy consumption of buildings accounts for nearly 40% of the total energy consumption: the loss of heat from windows with poor isolation performance accounts for 10% to 30% of the heat loss in the winter of the building; Light inside the building increases the amount of energy needed for indoor cooling. It is estimated that the annual energy loss in the United States due to building glazing is about $20 billion.
  • the electrochromic glass can control the amount of light transmitted by the glass and the amount of glare, and can optimize the amount of light transmitted through the glass and the amount of heat transmitted through the glass to maintain comfortable indoor conditions, thereby reducing energy consumption for maintaining the temperature of the building room. Therefore, with the rapid development of material technology, electrochromic glass has gradually been applied to automotive anti-glare mirrors, automotive sunroofs, high-speed rail windows, aircraft windows, curtain wall glass of high-end buildings. Moreover, with the gradual reduction of the comprehensive use cost, electrochromic glass can gradually replace Low-e glass, and is widely used in energy-saving and environmentally-friendly intelligent buildings.
  • the problem addressed by the present invention is to provide an electrochromic structure and a method of forming the same to improve the performance of electrochromic glass.
  • an electrochromic structure comprising:
  • a substrate the surface of the substrate is formed with a first conductive layer; a color changing functional layer is located on the surface of the first conductive layer; a second conductive layer is located on the surface of the color changing functional layer; and the first electrode is the same as the second conductive layer
  • One side of the color changing functional layer the first electrode is electrically isolated from the second conductive layer, and is electrically connected to the first conductive layer through the second conductive layer and the color changing functional layer in sequence; the second electrode, The side of the same color changing functional layer as the second conductive layer is electrically connected to the second conductive layer.
  • the first conductive layer comprises a first isolation region and a first conduction region electrically isolated from each other, the number of the first isolation regions being one or more; the number of the first conductive regions is one or a plurality of; the first electrode is electrically connected to the first conductive layer of the first conductive region.
  • the electrochromic structure further includes: a first trench penetrating the first conductive layer, the first trench dividing the first conductive layer into a plurality of first isolation regions and a plurality of The first conduction zone.
  • the first trench extends in a zigzag shape, and the plurality of first isolation regions communicate with each other to form a comb shape; the plurality of first conductive regions communicate with each other to form a first isolation region.
  • the first trench has a width ranging from 1 micrometer to 50 micrometers.
  • the first isolation region has a width ranging from 1 micrometer to 500 micrometers
  • the first conductive region has a width ranging from 1 centimeters to 500 centimeters.
  • the second conductive layer includes a second isolation region and a second conduction region electrically isolated from each other, the number of the second isolation regions is one or more, and the number of the second conductive regions is one or a plurality of; the first electrode is located on a surface of the second conductive layer of the second isolation region; the second electrode is located on a surface of the second conductive layer of the second conductive region, the first electrode and the plurality of The two electrodes are staggered.
  • projections of the second isolation region and the first isolation region on the surface of the substrate are offset from each other.
  • the second electrode and the first isolation region are located corresponding to each other.
  • the electrochromic structure further includes: a second trench penetrating the second conductive layer, the second trench dividing the second conductive layer into a plurality of second isolation regions and a plurality of Second conduction zone.
  • the second trench extends in a zigzag shape, and the plurality of second isolation regions communicate with each other to form a comb shape; the plurality of second conductive regions communicate with each other to form a second isolation region.
  • the comb shape matches the shape of the comb.
  • the second trench has a width ranging from 1 micrometer to 50 micrometers.
  • the second isolation region has a width ranging from 1 micrometer to 500 micrometers
  • the second conductive region has a width ranging from 1 centimeter to 500 centimeters.
  • the second conductive layer includes a second isolation region and a second conductive region electrically isolated from each other; the first electrode is located on a surface of the second conductive layer of the second isolation region; The surface of the second conductive layer of the second conductive region, the first electrode and the plurality of second electrodes are staggered.
  • the color changing functional layer comprises one or more functional layers, each functional layer comprising an electrochromic layer, an ion storage layer, and an ion conducting layer between the electrochromic layer and the ion storage layer.
  • the substrate is a light transmissive material.
  • the substrate comprises a glass substrate or a flexible substrate.
  • the electrochromic structure further comprises a barrier layer between the substrate and the first conductive layer.
  • the material of the first conductive layer and/or the second conductive layer comprises a transparent conductive oxide.
  • the present invention also provides a method for forming an electrochromic structure, comprising:
  • the surface of the substrate is formed with a first conductive layer; forming a color-changing functional layer on a surface of the first conductive layer; forming a second conductive layer on a surface of the color-changing functional layer; forming a surface on the surface of the second conductive layer a first electrode, the first electrode is electrically isolated from the second conductive layer and sequentially electrically connected to the first conductive layer through the second conductive layer and the color changing functional layer; forming a surface on the surface of the second conductive layer a second electrode electrically connected to the second conductive layer.
  • the forming method further includes: forming a first trench penetrating the first conductive layer, the first trench dividing the first conductive layer into a first isolation region and a first conductive region; The first electrode is electrically connected to the first conductive layer of the first conductive region.
  • the first trench extends in a zigzag shape to form a plurality of first isolation regions and a plurality of first conductive regions, wherein the plurality of first isolation regions communicate with each other to form a comb shape;
  • the first conductive regions are in communication with one another to form a comb shape that cooperates with the comb teeth of the first isolation region.
  • the forming method further includes: forming a second trench penetrating the second conductive layer, the second trench dividing the second conductive layer into a second isolation region and a second conductive region;
  • the first electrode is located on a surface of the second conductive layer of the second isolation region;
  • the second electrode is located on a surface of the second conductive layer of the second conductive region.
  • the second trench extends in a zigzag shape to form a plurality of second conductive regions and a plurality of second isolation regions, wherein the plurality of second isolation regions communicate with each other to form a comb shape;
  • the second conductive regions are in communication with each other to form a comb shape that cooperates with the comb pattern of the second isolation region.
  • the first trench and/or the second trench are formed by laser scribing.
  • forming the first electrode includes: forming a third trench sequentially penetrating the second conductive layer and the color changing functional layer; filling the third trench with a conductive material to form the first electrode.
  • the third trench is formed by laser scribing.
  • the third trench has a width ranging from 1 micrometer to 50 micrometers.
  • the first electrode and/or the second electrode are respectively formed by screen printing, vacuum thermal evaporation coating, vacuum magnetron sputtering coating, vacuum ion source coating or inkjet printing.
  • the forming method further includes: forming a barrier layer covering the surface of the substrate before forming the first conductive layer.
  • forming the color changing functional layer comprises: forming one or more functional layers, the functional layer comprising an electrochromic layer, an ion storage layer, and an ion conductive layer between the electrochromic layer and the ion storage layer.
  • Embodiments of the present invention make it easier to apply a voltage to the electrochromic structure by having both the first electrode and the second electrode on the surface of the second conductive layer.
  • the first electrode and the second electrode of the embodiment of the present invention are both plural, so that the uniformity of the electric field between the first conductive layer and the second conductive layer can be improved by adjusting the electrode distribution, thereby improving the color changing function.
  • the uniformity of discoloration of the layer improves the problem of slow discoloration of the electrochromic structure, thereby facilitating the expansion of the area of the electrochromic glass, and making the discoloration of the large-area electrochromic glass faster and more uniform.
  • the projections of the second isolation region and the first isolation region on the surface of the substrate are offset from each other, and the second electrode and the first conductive layer are reduced by staggering the positions of the first electrode and the second electrode. The possibility of leakage or short circuit between them increases the stability of the electrochromic structure and prolongs the service life of the electrochromic glass.
  • the second electrode of the embodiment of the present invention corresponds to the first isolation region, and passes through the isolation region. It is possible to prevent the leakage or short-circuit problem caused by the breakdown of the conductive layer caused by the excessive voltage of the second electrode.
  • Figure 1 is a top plan view of an electrochromic structure
  • FIG. 2 is a top plan view of an electrochromic structure
  • Figure 3 is a top plan view of an electrochromic structure
  • FIG. 4 is a schematic flow chart of an embodiment of a method for forming an electrochromic structure of the present invention
  • FIG. 15 are schematic structural views showing the intermediate structure of each step of an embodiment of the method for forming an electrochromic structure of the present invention.
  • a driving arrangement structure of an electrochromic glass is disclosed in Chinese Patent No. CN104898345A (refer to Figs. 1 to 3).
  • the electrochromic structure includes: a first conductive layer 11 and a second conductive layer 12 for forming an electric field, and is used for electrically connecting the first conductive layer 11 and the second conductive layer 12 to a power source.
  • the first electrode 23 and the second electrode 24 in the electrochromic structure are respectively located on both sides of the first conductive layer 21 and the second conductive layer 22, as shown in the electrochromic structure in FIG.
  • the first electrode 33 and the second electrode 34 are located on both sides of the first conductive layer 31 and the second conductive layer 32, respectively.
  • the first electrode and the second electrode are both disposed on the four side edges of the electrochromic layer. Due to the formation of a transparent oxide guide of the first conductive layer and the second conductive layer The conductivity of the body is poor, and a higher voltage drop is formed in the first conductive layer and the second conductive layer during the voltage application, thereby causing the voltage of the central region of the first conductive layer and the second conductive layer to be lower than the edge.
  • the voltage of the region causes the electrochromic structure to have discoloration unevenness during the discoloration process, and the discoloration speed is inconsistent, thereby limiting the area of the electrochromic glass, and it is difficult to meet the requirements of the large-area electrochromic glass.
  • FIG. 4 is a flow chart showing an embodiment of a method for forming an electrochromic structure of the present invention.
  • FIG. 15 are schematic structural views showing the intermediate structure of each step of an embodiment of the method for forming an electrochromic structure of the present invention.
  • a substrate 100 is provided, the surface of which is formed with a first conductive layer 110.
  • the substrate 100 is used to provide a physical support platform.
  • the substrate 100 includes a first face and a second face opposite the first face.
  • the substrate 100 can be a flexible substrate or a rigid substrate.
  • the substrate 100 may be a light transmissive material.
  • the substrate 100 is glass.
  • the first conductive layer 110 is formed on a first side or a second side of the substrate 100, and the first conductive layer 110 is used to apply a voltage to form an electric field.
  • the material of the first conductive layer 110 includes Transparent Conductive Oxide (TCO).
  • TCO Transparent Conductive Oxide
  • the first conductive layer 110 may be indium tin oxide (ITO), zinc tin oxide (IZO), zinc aluminum oxide (AZO), fluorine doped tin oxide (FTO), gallium doped tin oxide (GTO), etc.
  • One or more of the materials; or a conductive transparent nitride including one or more of titanium nitride, titanium oxynitride, tantalum nitride, and yttrium oxynitride; or transparent conductive Graphene material; may also be other transparent metal or alloy materials.
  • the thickness of the first conductive layer 110 ranges from 10 nanometers to 1000 nanometers.
  • the first conductive layer 110 has a thickness ranging from 300 nanometers to 600 nanometers.
  • the electrochromic structure is further The barrier layer 101 is disposed between the substrate 100 and the first conductive layer 110, so the forming method may further include forming a barrier layer 101 covering the surface of the substrate 100 before forming the first conductive layer 110.
  • the substrate 100 is soda glass
  • the barrier layer 101 is two in order to prevent the sodium ions in the soda glass from diffusing into the first conductive layer 110 to lower the electrical conductivity of the first conductive layer 110.
  • a sodium ion barrier layer composed of one or more of materials such as silicon oxide, silicon nitride, silicon oxynitride, and aluminum oxide.
  • the material of the substrate 100 is glass
  • the electrochromic glass can be formed by directly pressing the glass on the formed electrochromic structure, which can simplify the structure of the electrochromic glass and reduce the electrochromic glass. the weight of.
  • the number of electrochromic structures is not limited.
  • the electrochromic structure can be sandwiched between two glasses to form an electrochromic structure, thereby reducing the requirements on the process machine. Reduce manufacturing costs.
  • a color-changing functional layer 120 on the surface of the first conductive layer 110 is formed.
  • the first conductive layer 110 includes a first isolation region 110i and a first conduction electrically isolated from each other.
  • the area 110t is one or more of the first isolation regions 110i, and the number of the first conductive regions 110t is one or more.
  • the first isolation region 110i has a width ranging from 1 micrometer to 500 micrometers, and the first conductive region 110t has a width ranging from 1 centimeters to 500 centimeters.
  • the first isolation region 110i has a width ranging from 5 micrometers to 50 micrometers, and the first conductive region 110t has a width ranging from 5 centimeters. ⁇ 50 cm.
  • the electrochromic structure further includes: a first trench 111 penetrating through the first conductive layer 110, the first isolation region 110i and the first conductive region 110t The isolation is performed by the first trench 111.
  • the first trench 111 penetrating the first conductive layer 110 may be formed before the color changing functional layer 120 is formed.
  • the first trenches 111 may extend along a plurality of shapes, and the plurality of first isolation regions 110i are formed to form a comb shape, and the plurality of first conductive regions 110t are connected to form a comb shape.
  • the combs formed by the first conductive regions 110t and the comb-shaped comb teeth formed by the plurality of first isolation regions 110i compensate each other.
  • the first isolation region 110i has a width (comb width) ranging from 5 cm to 50 cm, between the adjacent comb teeth being a first conductive region 110t, and the first conductive region 110t has a width ranging from 5 cm to 50 cm.
  • the first trench 111 has a width ranging from 1 micrometer to 50 micrometers.
  • the first trench 111 has a width ranging from 2 micrometers to 10 micrometers to improve insulation between the first isolation region 110i and the first conductive region 110t.
  • the first trench 111 may be formed in the first conductive layer 110 by laser scribing.
  • the first trench 111 may be formed by a visible light laser scribing process or an infrared laser scribing process.
  • a constant power output or a pulse power output can be used in the laser scribing process.
  • the first trench 111 is formed by pulse laser scribing, the pulse frequency ranges from 5 kHz to 500 kHz, and the laser power ranges from 0.1 watt to 10 watts. In some embodiments, the laser power ranges from 0.5 watts to 5 watts. It should be noted that the first trench 111 is formed by laser scribing, and the specific method for forming the first trench 111 is not limited.
  • the forming method further includes: Clean up the dust residue to obtain a clean process surface.
  • a color changing functional layer 120 on the surface of the first conductive layer 110 is formed.
  • the color changing functional layer 120 is used to change color under voltage control.
  • Color change function The layer 120 includes one or more functional layers, and the step of forming the color changing functional layer 120 includes forming one or more functional layers including an electrochromic layer, an ion storage layer, and an electrochromic layer and ions. An ion conducting layer between the storage layers.
  • the electrochromic layer is used for redox reaction under the action of an external electric field, and the color changes, and may be a cathodic electrochromic metal oxide, that is, a metal oxide whose color changes after ion implantation, such as under-oxidation.
  • a cathodic electrochromic metal oxide that is, a metal oxide whose color changes after ion implantation, such as under-oxidation.
  • Tungsten WO x , 2.7 ⁇ x ⁇ 3
  • titanium oxide TiO 2
  • vanadium oxide V 2 O 5
  • niobium oxide Nb 2 O 5
  • molybdenum oxide MoO 3
  • the electrochromic layer has a thickness ranging from 10 nm to 1000 nm.
  • the electrochromic layer has a thickness ranging from 300 nm to 600 nm.
  • the ion conductive layer is used for transporting ions, and may be Li 2 O, Li 2 O 2 , Li 3 N, LiI, LiF, SiO 2 , Al 2 O 3 , Nb 2 O 3 , LiTaO 3 , LiNbO 3 , La 2 TiO 7, Li 2 WO 4, oxygen-rich tungsten oxide (WO x, 3 ⁇ x ⁇ 3.5), HWO 3, ZrO 2, HfO 2, LaTiO3, SrTiO 3, BaTiO 3, LiPO 3 one kind or like materials Kind.
  • the ion conductive layer has a thickness ranging from 10 nm to 300 nm.
  • the ion conductive layer has a thickness ranging from 20 nanometers to 150 nanometers.
  • the ion storage layer is used for storing electrical corresponding ions, maintaining the ion balance of the whole system, and may be an anodic electrochromic metal oxide, that is, a metal oxide whose color changes after the precipitation of ions, such as vanadium oxide (V 2 O).
  • anodic electrochromic metal oxide that is, a metal oxide whose color changes after the precipitation of ions, such as vanadium oxide (V 2 O).
  • the ion storage layer has a thickness ranging from 10 nm to 1000 nm.
  • the ion storage layer has a thickness ranging from 10 nm to 1000 nm.
  • the ion storage layer has a thickness ranging from 10 nm to 1000 nm.
  • the step of forming the functional layer in the embodiment of the present invention includes: moving away from the substrate In the direction of 100, an electrochromic layer, an ion conductive layer, and an ion storage layer are sequentially formed; or an ion storage layer, an ion conductive layer, and an electrochromic layer are sequentially formed in a direction away from the substrate 100.
  • the functional layer can be formed by a film deposition process such as chemical vapor deposition, physical vapor deposition, and atomic layer deposition.
  • the color changing functional layer 120 is also filled in the first trench 111.
  • a second conductive layer 130 on the surface of the color-changing functional layer 120 is formed.
  • the second conductive layer 130 is used to apply a voltage to form an electric field.
  • the material of the second conductive layer 130 also includes a Transparent Conductive Oxide (TCO).
  • TCO Transparent Conductive Oxide
  • the second conductive layer 130 may be indium tin oxide (ITO), zinc tin oxide (IZO), zinc aluminum oxide (AZO), fluorine doped tin oxide (FTO), gallium doped tin oxide (GTO), or the like.
  • One or more of the materials; or a conductive transparent nitride including one or more of titanium nitride, titanium oxynitride, tantalum nitride, and yttrium oxynitride; or transparent conductive Graphene material may also be other transparent metal or alloy materials.
  • the thickness of the second conductive layer 130 ranges from 10 nanometers to 1000 nanometers.
  • the second conductive layer 130 has a thickness ranging from 300 nanometers to 600 nanometers.
  • the second conductive layer 130 may be formed by a film deposition process such as chemical vapor deposition, physical vapor deposition, and atomic layer deposition.
  • first electrode on a surface of the second conductive layer
  • first electrode is electrically isolated from the second conductive layer and sequentially electrically connected to the first conductive layer through the second conductive layer and the color changing functional layer
  • second electrode Forming a second electrode on a surface of the second conductive layer, the second electrode being electrically connected to the second conductive layer.
  • FIG. 10 a schematic plan view of the intermediate structure of the electrochromic structure is given, and FIG. 11 is a cross-sectional structural view taken along line BB of FIG.
  • the second conductive layer 130 includes a second isolation region 130i and a second conductive region 130t electrically isolated from each other.
  • the number of the second isolation regions 130i is plural, and the number of the second conductive regions 130t is plural.
  • the second isolation region 130i and the second conductive region 130t are isolated by the second trench 132.
  • a second trench 132 may be formed through the second conductive layer 130, and the second trench 132 may be along the “several”
  • the plurality of second isolation regions 130i are formed to form a comb shape, and the plurality of second conductive regions 130t are connected to each other to form a comb shape, and the plurality of second conductive regions 130t are formed into a comb shape.
  • the comb-shaped comb teeth formed by the second isolation regions 130i compensate each other, and the width of the second isolation region 130i (comb width of the comb) ranges from 5 micrometers to 50 micrometers, and the second conductive region between adjacent comb teeth 130t, the width of the second conductive region 130t ranges from 5 cm to 50 cm.
  • the projections of the second isolation region 130i and the first isolation region 110i on the surface of the substrate 100 are staggered from each other, that is, the second isolation.
  • the projection of the region 130i and the first isolation region 110i on the surface of the substrate 100 does not overlap.
  • the second trench 132 has a width ranging from 1 micrometer to 50 micrometers.
  • the second trench 132 has a width ranging from 2 micrometers to 10 micrometers to improve insulation between the second isolation region 130i and the second conductive region 130t.
  • the second trench 132 may be formed in the second conductive layer 130 by laser scribing.
  • the second trench 132 may be formed by a laser laser scribing process or an infrared laser scribing process.
  • a constant power output or a pulse power output can be used in the laser scribing process.
  • the second trench 132 is formed by pulse laser scribing, the pulse frequency ranges from 5 kHz to 500 kHz, and the laser power ranges from 0.1 watt to 10 watts. In some embodiments, the laser power ranges from 0.5 watts to 5 watts. It should be noted that the method of forming the second trench 132 by laser scribing is only an example, and the specific method for forming the second trench 132 is not limited in the present invention.
  • the forming method may further include cleaning dust residue and improving the electro-induced The manufacturing yield of the color-changing structure.
  • FIGS. 12 and 14 are schematic plan views
  • FIG. 13 is a line along the CC line in FIG.
  • FIG. 15 is a cross-sectional view taken along line DD of FIG. 14.
  • a third trench 133 is formed through the second conductive layer 130 and the color changing functional layer 120 in sequence.
  • the third trench 133 has a width ranging from 1 micrometer to 50 micrometers. In order to reduce the process difficulty and improve the manufacturing yield, the third trench 133 may have a width ranging from 2 micrometers to 10 micrometers.
  • the third trench 133 may be formed by laser scribing.
  • the third trench 133 may be formed by a visible light laser scribing process or an infrared laser scribing process.
  • a constant power output or a pulse power output can be used in the laser scribing process.
  • the third trench 133 is formed by pulse laser scribing, the pulse frequency ranges from 5 kHz to 500 kHz, and the laser power ranges from 0.1 watt to 10 watts. In some embodiments, the laser power ranges from 0.5 watts to 5 watts. It should be noted that the method of forming the third trench 133 by means of laser scribing is only an example, and the specific method for forming the third trench 133 is not limited in the present invention.
  • the forming method may further include cleaning dust residue to improve the manufacturing yield of the electrochromic structure.
  • the third trench 133 is filled with a conductive material to form the first electrode 141; at the second conductive A second electrode 142 is formed on the surface of the layer 130, and the second electrode 142 is electrically connected to the second conductive layer 130 in the second isolation region 130i.
  • the second electrode 142 may be formed in the same step as the first electrode 141.
  • the first electrode 141 and the second electrode 142 are respectively used for the first conductive
  • the layer 110 and the second conductive layer 130 are loaded with a voltage signal to form an electric field between the first conductive layer 110 and the second conductive layer 130 to achieve control of the color of the color changing functional layer 120.
  • the electrical isolation between the second isolation region 130i and the second conductive region 130t achieves electrical isolation between the first electrode 141 and the second electrode 142 such that the first electrode 141 and the second electrode 142 are both
  • the first electrode 141 and the second electrode 142 can be uniformly distributed on the surface of the electrochromic structure, so that the first conductive layer 110 and the second conductive layer can be improved.
  • the uniformity of the electric field between the layers 130 improves the uniformity of discoloration of the discoloration functional layer 120, improves the problem of slow discoloration of the electrochromic structure, and further expands the area of the electrochromic glass to make large-area electrochromic glass. The color change is faster and more uniform.
  • the electrical isolation between the first isolation region 110i and the first conductive region 110t can improve the electrical isolation between the first electrode 141 and the first conductive layer 110 of the first isolation region 110i.
  • improve the yield of the electrochromic structure improve the performance of the electrochromic structure, and prolong the service life of the electrochromic structure.
  • the positions of the second electrode 142 and the first isolation region 110i correspond to each other, and the first isolation region 110i is isolated from the first conductive region 110t, where electrical isolation can be further improved to reduce the risk of breakdown.
  • the material of the first electrode 141 and the second electrode 142 may be metal.
  • the first electrode 141 or the second electrode 142 may be formed by screen printing, vacuum thermal evaporation coating, vacuum magnetron sputtering coating, vacuum ion source plating, inkjet printing, or the like.
  • the formed first electrode 141 may be parallel to the second trench 132, and the second electrode 142 may be opposite to the first trench. 111 are parallel to each other. Further, the first electrode 141 and the second electrode 142 may be parallel to each other.
  • the first electrodes 141 When the number of the first electrodes 141 is greater than one, the first electrodes 141 may be parallel to each other; when the number of the second electrodes 142 is greater than 1, the second electrodes 142 can also be parallel to each other.
  • the second electrode 142 and the first electrode 141 are arranged in a crosswise manner, that is, when the electrochromic structure includes a plurality of first electrodes When the 141 or the plurality of second electrodes 142 are present, the first electrodes 141 are evenly distributed between the adjacent second electrodes 142, or the second electrodes 142 are evenly distributed between the adjacent first electrodes 141.
  • the number of the first electrodes 141 is two, and the number of the second electrodes 142 is three.
  • a first electrode 141 is disposed between the adjacent second electrodes 142, and a distance between the first electrodes 141 and the adjacent second electrodes 142 is equal;
  • a second electrode 142 is disposed between adjacent first electrodes 141, and The distance between the second electrode 142 and the adjacent first electrode 141 is equal.
  • the number of electrodes can be arranged according to the size of the actual electrochromic structure.
  • a pair of first and second electrodes may be disposed within a certain range. That is, in the above embodiment, the first conductive layer and the second conductive layer may be divided into a corresponding plurality of isolation regions and a plurality of conductive regions. In fact, if the area is not large, they may be set to only one, respectively. That is, there are only one pair of first and second electrodes, but the first electrode and the second electrode are both located on one side of the electrochromic layer. In some embodiments, the first conductive layer may not even be isolated, and only the second conductive layer is divided into a plurality of isolation regions and a plurality of conductive regions, which may solve the problem of uniform electrochromism under a large area.
  • the first conductive layer 110, the electrochromic layer 120, the second conductive layer 130, and the first electrode 141 and the second electrode 142 are all located on the substrate 100.
  • the electrochromic structure may further include the first conductive layer 110, the electrochromic layer 120, the second conductive layer 130, and the first electrode 141 and the first side respectively located on the substrate 100. Two electrodes 142.
  • the present invention also provides an electrochromic structure.
  • FIG. 14 and FIG. 15 a schematic structural view of an embodiment of the electrochromic structure of the present invention is shown, wherein FIG. 14 is a plan view of the electrochromic structure.
  • Figure 15 is a cross-sectional view taken along line DD of Figure 14.
  • the electrochromic structure includes a substrate 100 having a first conductive layer 110 formed on a surface thereof.
  • the color changing functional layer 120 is located on the surface of the first conductive layer 110; the second conductive layer 130 is located on the surface of the color changing functional layer; the first electrode 141 and the second conductive layer 130 belong to the side of the color changing functional layer.
  • the first electrode 141 is electrically isolated from the second conductive layer 130 and electrically connected to the first conductive layer 110 through the second conductive layer 130 and the color changing functional layer 120 in sequence; on the surface of the second conductive layer 130
  • the second electrode 142 is electrically connected to the second conductive layer 130.
  • the embodiment of the present invention can make it easier to apply voltage to the electrochromic structure by making the first electrode and the second electrode both on the surface of the second conductive layer.
  • the first electrode and the second electrode of the embodiment of the present invention are both plural, so that the uniformity of the electric field between the first conductive layer and the second conductive layer can be improved by adjusting the electrode distribution, thereby improving the color changing function.
  • the uniformity of discoloration of the layer improves the problem of slow discoloration of the electrochromic structure, thereby facilitating the expansion of the area of the electrochromic glass, and making the discoloration of the large-area electrochromic glass faster and more uniform.

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  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
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  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

一种电致变色结构及其形成方法，其中电致变色结构包括：基底（100）；第一导电层（110）；变色功能层（120）；第二导电层（130）；第一电极（141），与第二导电层（130）同属变色功能层（120）的一侧，第一电极（141）与第二导电层（130）电隔离、且依次贯穿第二导电层（130）和变色功能层（120）与第一导电层（110）电连接；第二电极（142），与第二导电层（130）同属变色功能层（120）的一侧，与第二导电层（130）电连接。通过使第一电极（141）和第二电极（142）均位于第二导电层（130）表面，且第一电极（141）和第二电极（142）均为多个，从而能够通过调节电极分布来提高第一导电层（110）和第二导电层（130）之间电场的均匀程度，从而能够提高变色功能层（120）的变色均匀度，改善电致变色结构变色速度慢的问题，进而有利于扩大电致变色玻璃的面积，使大面积电致变色玻璃的变色更快、更均匀。

Description

电致变色结构及其形成方法
本申请要求2016年2月6日提交中国专利局，申请号为201610084091.0、名称为“电致变色结构及其形成方法”，以及申请号为201620118707.7、名称为“电致变色结构”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明涉及玻璃技术领域，特别涉及一种电致变色结构及其形成方法。
背景技术
电致变色是指在外加电场的作用下，材料的反射率、透射率以及吸收率等特性能够根据电场的大小与极性发生可逆的变化。在玻璃表面设置电致变色结构形成电致变色玻璃，能够通过电压控制实现对玻璃透光性能的控制。
根据美国绿色建筑委员会报告，建筑物的能量消耗占整体能源消耗的近40％：隔离性能不好的窗户所损失的热量占建筑物冬季热损失的10％～30％；而夏天穿透窗户进入建筑物内部的光线，则增加室内制冷所需要的能量。据估算，美国每年由于建筑物玻璃窗而造成的能量损失价值约200亿美元。
电致变色玻璃可以控制玻璃的透光量和眩光量，可以对玻璃的透光量及透过玻璃的热量进行优化，保持室内条件舒适，从而能够减少维持建筑物室内温度的能量消耗。因此，随着材料技术的飞速发展，电致变色玻璃已经开始逐步应用于汽车防眩光反射镜、汽车天窗、高铁窗户、飞机窗户、高档大厦的幕墙玻璃等领域。而且随着综合使用成本的逐步降低，电致变色玻璃能够逐步替代Low-e玻璃，在节能环保的智能建筑中得到广泛的应用。
随着电致变色玻璃在建筑领域应用的扩大，大面积电致变色玻璃的需求将越来越多。但是现有技术中大面积的电致变色玻璃往往存在变色不均匀、变色速度慢等性能问题。
发明内容
本发明解决的问题是提供一种电致变色结构及其形成方法，以改善提高电致变色玻璃的性能。
为解决上述问题，本发明提供一种电致变色结构，包括：
基底，所述基底表面形成有第一导电层；变色功能层，位于所述第一导电层表面；第二导电层，位于所述变色功能层表面；第一电极，与第二导电层同属所述变色功能层的一侧，所述第一电极与所述第二导电层电隔离、且依次贯穿所述第二导电层和变色功能层与所述第一导电层电连接；第二电极，与第二导电层同属所述变色功能层的一侧，与所述第二导电层电连接。
可选的，所述第一导电层包括相互电隔离的第一隔离区和第一传导区，所述第一隔离区的数量为一个或多个；所述第一传导区的数量为一个或多个；所述第一电极与所述第一传导区的所述第一导电层电连接。
可选的，所述电致变色结构还包括：贯穿所述第一导电层的第一沟槽，所述第一沟槽将所述第一导电层分为多个第一隔离区和多个第一传导区。
可选的，所述第一沟槽呈“几”字形延伸，所述多个第一隔离区相互连通，形成梳子形状；所述多个第一传导区相互连通，形成和第一隔离区的梳齿相配合的梳子形状。
可选的，所述第一沟槽的宽度范围为1微米～50微米。
可选的，所述第一隔离区的宽度范围为1微米～500微米，所述第一传导区的宽度范围为1厘米～500厘米。
可选的，所述第二导电层包括相互电隔离的第二隔离区和第二传导区，所述第二隔离区的数量为一个或多个，所述第二传导区的数量一个或为多个；所述第一电极位于第二隔离区的所述第二导电层表面；所述第二电极位于第二传导区的所述第二导电层表面，所述第一电极和多个第二电极交错排列。
可选的，所述第二隔离区和所述第一隔离区在所述基底表面的投影相互错开。
可选的，所述第二电极和所述第一隔离区位置相互对应。
可选的，所述电致变色结构还包括：贯穿所述第二导电层的第二沟槽，所述第二沟槽将所述第二导电层分为多个第二隔离区和多个第二传导区。
可选的，所述第二沟槽呈“几”字形延伸，所述多个第二隔离区相互连通，形成梳子形状；所述多个第二传导区相互连通，形成与第二隔离区的梳齿图形相配合的梳子形状。
可选的，所述第二沟槽的宽度范围为1微米～50微米。
可选的，所述第二隔离区的宽度范围为1微米～500微米范围内，所述第二传导区的宽度范围为1厘米～500厘米。
可选的，所述第二导电层包括相互电隔离的第二隔离区和第二传导区；所述第一电极位于第二隔离区的所述第二导电层表面；所述第二电极位于第二传导区的所述第二导电层表面，所述第一电极和多个第二电极交错排列。
可选的，所述变色功能层包括一个或多个功能层，每个功能层包括电致变色层、离子存储层以及位于电致变色层和离子存储层之间的离子传导层。
可选的，所述基底为透光材料。
可选的，所述基底包括玻璃基底或柔性基底。
可选的，所述电致变色结构还包括位于所述基底和所述第一导电层之间的阻挡层。
可选的，所述第一导电层和/或所述第二导电层的材料包括透明导电氧化物。
相应的，本发明还提供一种电致变色结构的形成方法，包括：
提供基底，所述基底表面形成有第一导电层；形成位于所述第一导电层表面的变色功能层；形成位于所述变色功能层表面的第二导电层；形成位于第二导电层表面的第一电极，所述第一电极与所述第二导电层电隔离且依次贯穿所述第二导电层和变色功能层与所述第一导电层电连接；形成位于第二导电层表面的第二电极，所述第二电极与所述第二导电层电连接。
可选的，所述形成方法还包括：形成贯穿所述第一导电层的第一沟槽，所述第一沟槽将所述第一导电层分为第一隔离区和第一传导区；所述第一电极与所述第一传导区的第一导电层电连接。
可选的，所述第一沟槽呈“几”字形延伸，形成多个第一隔离区和多个第一传导区，所述多个第一隔离区相互连通形成梳子形状；所述多个第一传导区相互连通，形成和第一隔离区的梳齿相配合的梳子形状。
可选的，所述形成方法还包括：形成贯穿所述第二导电层的第二沟槽，所述第二沟槽将所述第二导电层分为第二隔离区和第二传导区；所述第一电极位于第二隔离区的所述第二导电层表面；所述第二电极位于第二传导区的所述第二导电层表面。
可选的，所述第二沟槽呈“几”字形延伸，形成多个第二传导区和多个第二隔离区，所述多个第二隔离区相互连通，形成梳子形状；所述多个第二传导区相互连通，形成与第二隔离区的梳齿图形相配合的梳子形状。
可选的，所述第一沟槽和/或第二沟槽通过激光划线的方式形成。
可选的，形成第一电极包括：形成依次贯穿所述第二导电层和所述变色功能层的第三沟槽；向所述第三沟槽内填充导电材料以形成所述第一电极。
可选的，所述第三沟槽通过激光划线的方式形成。
可选的，所述第三沟槽的宽度范围为1微米～50微米。
可选的，所述第一电极和/或第二电极分别通过丝网印刷、真空热蒸镀镀膜、真空磁控溅射镀膜、真空离子源镀膜或喷墨打印的方式形成。
可选的，所述形成方法还包括：在形成第一导电层之前，形成覆盖基底表面的阻挡层。
可选的，形成所述变色功能层包括：形成一个或多个功能层，所述功能层包括电致变色层、离子存储层以及位于电致变色层和离子存储层之间的离子传导层。
与现有技术相比，本发明的技术方案具有以下优点：
本发明实施例通过使使第一电极和第二电极均位于第二导电层表面，能够使得对于所述电致变色结构施加电压更为方便。而且，本发明实施例的第一电极和第二电极均为多个，从而能够通过调节电极分布来提高第一导电层和第二导电层之间电场的均匀程度，从而能够提高所述变色功能层的变色均匀度，改善电致变色结构变色速度慢的问题，进而有利于扩大电致变色玻璃的面积，使大面积电致变色玻璃的变色更快、更均匀。
进一步地，本发明实施例的第二隔离区和第一隔离区在所述基底表面的投影相互错开，通过使第一电极和第二电极位置错开，降低了第二电极与第一导电层之间出现漏电或短路的可能，提高了所述电致变色结构的稳定性，延长了所述电致变色玻璃的使用寿命。
此外，本发明实施例的第二电极和第一隔离区对应，通过隔离区， 可以防止第二电极电压过大导致导电层被击穿造成的漏电或短路问题。
附图说明
图1是一种电致变色结构的俯视示意图；
图2是一种电致变色结构的俯视示意图；
图3是一种电致变色结构的俯视示意图；
图4是本发明电致变色结构的形成方法一实施例的流程示意图；
图5至图15是本发明电致变色结构的形成方法一实施例各个步骤中间结构的结构示意图。
具体实施方式
由背景技术可知，现有技术中大面积的电致变色玻璃存在变色不均匀、变色速度慢等性能问题。现结合现有技术中电致变色玻璃中电致变色结构的结构分析其性能问题的原因：
专利号为CN104898345A的中国专利中公开了一种电致变色玻璃的驱动布置结构(参考图1至图3)。
如图1所示，所述电致变色结构包括：用于形成电场的第一导电层11和第二导电层12、用于实现第一导电层11和第二导电层12与电源电连接的第一电极13和第二电极14以及位于第一导电层11和第二导电层12之间的变色功能层。
如图2所示，所述电致变色结构中的第一电极23和第二电极24分别位于第一导电层21和第二导电层22的两侧，如图3所述电致变色结构中的第一电极33和第二电极34分别位于第一导电层31和第二导电层32的两侧。
上述三种电致变色结构中，第一电极和第二电极均设置于电致变色层的四侧边缘。由于形成第一导电层和第二导电层的透明氧化物导 体的电导率较差，在加载电压的过程中会在第一导电层和第二导电层内形成较高的电压降，从而造成第一导电层和第二导电层中心区域的电压低于边缘区域的电压，从而引起电致变色结构在变色过程出现变色不均匀，变色速度不一致的问题，由此也限制了电致变色玻璃的面积，难以满足大面积电致变色玻璃的要求。
下面结合附图对本发明的具体实施例做详细的说明。
图4是本发明电致变色结构的形成方法一实施例的流程示意图。
图5至图15是本发明电致变色结构的形成方法一实施例各个步骤中间结构的结构示意图。
参考图4中步骤S100，结合参考图5，提供基底100，所述基底100表面形成有第一导电层110。
所述基底100用于提供物理支撑平台。所述基底100包括第一面和与所述第一面相对的第二面。所述基底100可以是柔性基底也可以是刚性基底。所述基底100可以为透光材料。在一些实施例中，所述基底100为玻璃。
所述第一导电层110形成于所述基底100的第一面或第二面上，所述第一导电层110用于加载电压以形成电场。所述第一导电层110的材料包括透明导电氧化物(Transparent Conductive Oxide,TCO)。具体的，所述第一导电层110可以为氧化铟锡(ITO)、氧化锌锡(IZO)、氧化锌铝(AZO)、氟掺氧化锡(FTO)、镓掺杂氧化锡(GTO)等材料中的一种或多种；也可以是导电的透明氮化物包括氮化钛、氮氧化钛、氮化钽以及氧氮化钽等材料中的一种或多种；也可以是透明导电的石墨烯材料；还可以是其他透明的金属或合金材料。所述第一导电层110的厚度范围为10纳米～1000纳米。可选的，在一些实施例中，所述第一导电层110的厚度范围为300纳米～600纳米。
需要说明的是，为了避免杂质离子扩散进入所述第一导电层110，从而影响所述第一导电层110的导电性能，因此所述电致变色结构还 包括位于所述基底100和所述第一导电层110之间的阻挡层101，所以所述形成方法还可以包括：在形成第一导电层110之前，形成覆盖基底100表面的阻挡层101。
在一些实施例中，所述基底100为钠玻璃，为了避免钠玻璃中的钠离子扩散进入第一导电层110而使所述第一导电层110的电导率降低，所述阻挡层101为二氧化硅、氮化硅、氮氧化硅、氧化铝等材料中一种或多种构成的钠离子阻挡层。
在一些实施例中，所述基底100的材料为玻璃，可以直接在所形成的电致变色结构上压合玻璃构成电致变色玻璃，能够简化电致变色玻璃的结构，减小电致变色玻璃的重量。
所述电致变色结构的数量不做限定，在另一些实施例中，可以通过将所述电致变色结构夹合于两块玻璃之间形成电致变色结构，从而降低对工艺机台的要求，降低制造成本。
参考图6至图8，形成位于所述第一导电层110表面的变色功能层120。
参考图6和图7，其中图6是所述电致变色结构的中间结构的俯视示意图，图7是图6中沿AA线的剖视结构示意图。为了提高第一导电层110与后续所形成第二电极之间的电隔离性，避免出现漏电或短路的问题，所述第一导电层110包括相互电隔离的第一隔离区110i和第一传导区110t，所述第一隔离区110i的数量为一个或多个，所述第一传导区110t的数量为一个或多个。
所述第一隔离区110i的宽度范围为1微米～500微米，所述第一传导区110t的宽度范围为1厘米～500厘米。为了提高所述电致变色结构的变色均匀性和变色速度，可选的，所述第一隔离区110i的宽度范围为5微米～50微米，所述第一传导区110t的宽度范围为5厘米～50厘米。
参考图4中步骤S110，并结合参考图6和图7，为简化器件结构， 降低工艺难度，本发明一些实施例中，所述电致变色结构还包括：贯穿所述第一导电层110的第一沟槽111，所述第一隔离区110i和所述第一传导区110t之间通过第一沟槽111进行隔离。
具体地，可以在形成变色功能层120之前，形成贯穿所述第一导电层110的第一沟槽111。所述第一沟槽111可以为沿“几”字形延伸，这样形成的多个第一隔离区110i之间连通形成梳状，多个第一传导区110t之间连通形成梳状，所述多个第一传导区110t形成的梳状与多个第一隔离区110i形成的梳状的梳齿相互补偿。所述第一隔离区110i宽度(梳齿宽度)范围为5厘米～50厘米，相邻梳齿之间为第一传导区110t，第一传导区110t的宽度范围为5厘米～50厘米。所述第一沟槽111的宽度范围为1微米～50微米。可选的，所述第一沟槽111的宽度范围为2微米～10微米以提高所述第一隔离区110i和第一传导区110t之间的绝缘性。
所述第一沟槽111可以通过激光划线的方式在所述第一导电层110内形成。具体的，可以通过可见光激光划线工艺或红外光激光划线工艺形成所述第一沟槽111。此外，激光划线工艺过程中可以采用恒定功率输出也可以采用脉冲功率输出。可选的，在一些实施例中，通过脉冲激光划线方式形成所述第一沟槽111，所述脉冲频率范围为5KHz～500KHz，激光功率范围为0.1瓦～10瓦。一些实施例中，激光功率范围为0.5瓦～5瓦。需要说明的是，通过激光划线的方式形成所述第一沟槽111的做法仅为一示例，本发明对形成所述第一沟槽111的具体方法不做限定。
需要说明的是，参考图4中步骤S111，在一些实施例中，在形成所述第一沟槽111的步骤之后，在形成所述变色功能层120的步骤之前，所述形成方法还包括：清理粉尘残余，以获得清洁的工艺表面。
参考图4中步骤S200，并结合参考图8，形成位于所述第一导电层110表面的变色功能层120。
所述变色功能层120用于在电压控制下变化颜色。所述变色功能 层120包括一个或多个功能层，形成所述变色功能层120的步骤包括：形成一个或多个功能层，所述功能层包括电致变色层、离子存储层以及位于电致变色层和离子存储层之间的离子传导层。
其中，所述电致变色层用于在外加电场作用下发生氧化还原反应，颜色发生变化，可以为阴极电致变色金属氧化物，即离子注入后颜色发生变化的金属氧化物，如欠氧氧化钨(WOx，2.7<x<3)、氧化钛(TiO2)、氧化钒(V2O5)、氧化铌(Nb2O5)、氧化钼(MoO3)、氧化钽(Ta2O5)等材料中的一种或多种；也可以是锂、钠、钾、钒或钛掺杂的阴极电致变色金属氧化物。具体的，所述电致变色层的厚度范围为10纳米～1000纳米。可选的，所述电致变色层的厚度范围为300纳米～600纳米。
所述离子传导层用于传输离子，可以为Li2O、Li2O2、Li3N、LiI、LiF、SiO2、Al2O3、Nb2O3、LiTaO3、LiNbO3、La2TiO7、Li2WO4、富氧氧化钨(WOx，3<x<3.5)、HWO3、ZrO2、HfO2、LaTiO3、SrTiO3、BaTiO3、LiPO3等材料中的一种或多种。具体的，所述离子传导层的厚度范围为10纳米～300纳米。可选的，所述离子传导层的厚度范围为20纳米～150纳米。
所述离子存储层用于存储电性相应的离子，保持整个体系的离子平衡，可以为阳极电致变色金属氧化物，即离子析出后颜色发生变化的金属氧化物，如氧化钒(V2O5)、氧化铬(Cr2O3)、氧化锰(Mn2O3)、氧化铁(Fe2O3)、氧化钴(Co2O3)、氧化镍(Ni2O3)、氧化铱(IrO2)、氧化镍钨、氧化镍钒、氧化镍钛、氧化镍铌、氧化镍钼、氧化镍钽等材料中的一种或多种；也可以是混合金属氧化物LixNiyMzOa，其中0<x<10，0<y<1，0<z<10，(0.5x+1+0.5y+z)<a<(0.5x+1+0.5y+3.5z)，其中M可以是Al、Cr、Zr、W、V、Nb、Hf、Y、Mn等金属元素。具体的，所述离子存储层厚度范围为10纳米～1000纳米。可选的，所述离子存储层厚度范围为100纳米～300纳米。
此外，本发明实施例的形成所述功能层的步骤包括：沿远离基底 100的方向，依次形成电致变色层、离子传导层以及离子存储层；或者沿远离基底100的方向，依次形成离子存储层、离子传导层以及电致变色层。具体的，可以通过化学气相沉积、物理气相沉积以及原子层沉积等膜层沉积工艺形成所述功能层。
需要说明的是，所述变色功能层120还填充于所述第一沟槽111内。
参考图4中步骤S300，并结合参考图9，形成位于所述变色功能层120表面的第二导电层130。
所述第二导电层130用于加载电压以形成电场。所述第二导电层130的材料也包括透明导电氧化物(Transparent Conductive Oxide,TCO)。具体的，所述第二导电层130可以为氧化铟锡(ITO)、氧化锌锡(IZO)、氧化锌铝(AZO)、氟掺氧化锡(FTO)、镓掺杂氧化锡(GTO)等材料中的一种或多种；也可以是导电的透明氮化物包括氮化钛、氮氧化钛、氮化钽以及氧氮化钽等材料中的一种或多种；也可以是透明导电的石墨烯材料；还可以是其他透明的金属或合金材料。所述第二导电层130的厚度范围为10纳米～1000纳米。可选的，在一些实施例中，所述第二导电层130的厚度范围为300纳米～600纳米。具体的，可以通过化学气相沉积、物理气相沉积以及原子层沉积等膜层沉积工艺形成所述第二导电层130。
之后，形成位于第二导电层表面的第一电极，所述第一电极与所述第二导电层电隔离且依次贯穿所述第二导电层和变色功能层与所述第一导电层电连接；形成位于第二导电层表面的第二电极，所述第二电极与所述第二导电层电连接。下面结合参考图10至图15加以详细说明。
参考图10，给出所述电致变色结构中间结构的俯视示意图，图11是图10中沿BB线的剖视结构示意图。所述第二导电层130包括相互电隔离的第二隔离区130i和第二传导区130t，所述第二隔离区130i的数量为多个，所述第二传导区130t的数量为多个。
为简化器件结构，降低工艺难度，本发明一些实施例中，所述第二隔离区130i和所述第二传导区130t之间通过第二沟槽132进行隔离。具体地，参考图4中步骤S310，可以在形成所述第二导电层130之后，形成贯穿所述第二导电层130的第二沟槽132，所述第二沟槽132可以为沿“几”字形延伸，这样形成的多个第二隔离区130i之间连通形成梳状，多个第二传导区130t之间连通形成梳状，所述多个第二传导区130t形成的梳状与多个第二隔离区130i形成的梳状的梳齿相互补偿，所述第二隔离区130i宽度(梳子的梳齿宽度)范围为5微米～50微米，相邻梳齿之间为第二传导区130t，第二传导区130t的宽度范围为5厘米～50厘米范围内。
需要说明的是，以避免出现漏电、短路等电路问题，所述第二隔离区130i和所述第一隔离区110i在所述基底100表面的投影相互错开，也就是说，所述第二隔离区130i和所述第一隔离区110i在所述基底100表面的投影不重叠。
所述第二沟槽132的宽度范围为1微米～50微米。可选的，所述第二沟槽132的宽度范围为2微米～10微米以提高所述第二隔离区130i和第二传导区130t之间的绝缘性。
所述第二沟槽132可以通过激光划线的方式在所述第二导电层130内形成。具体的，可以通过可将光激光划线工艺或红外光激光划线工艺形成所述第二沟槽132。此外，激光划线工艺过程中可以采用恒定功率输出也可以采用脉冲功率输出。可选的，在一些实施例中，通过脉冲激光划线方式形成所述第二沟槽132，所述脉冲频率范围为5KHz～500KHz，激光功率范围为0.1瓦～10瓦。一些实施例中，激光功率范围为0.5瓦～5瓦。需要说明的是，通过激光划线的方式形成所述第二沟槽132的做法仅为一示例，本发明对形成所述第二沟槽132的具体方法不做限定。
需要说明的是，参考图4中步骤S311，在形成所述第二沟槽132的步骤之后，所述形成方法还可以包括清理粉尘残余，提高所述电致 变色结构的制造良品率。
图12至图15示出形成位于第二导电层130表面的第一电极141和第二电极142的中间结构的示意图，其中图12和图14是俯视示意图，图13是图12中沿CC线的剖视结构示意图，图15是图14中沿DD线的剖视图。
参考图4中步骤S410，并结合参考图12和图13，首先形成依次贯穿所述第二导电层130和所述变色功能层120的第三沟槽133。
所述第三沟槽133的宽度范围为1微米～50微米。为了降低工艺难度，提高制造良品率，可选的，所述第三沟槽133的宽度范围为2微米～10微米范围内。
所述第三沟槽133可以通过激光划线的方式形成。具体的，可以通过可见光激光划线工艺或红外光激光划线工艺形成所述第三沟槽133。此外，激光划线工艺过程中可以采用恒定功率输出也可以采用脉冲功率输出。可选的，在一些实施例中，通过脉冲激光划线方式形成所述第三沟槽133，所述脉冲频率范围为5KHz～500KHz，激光功率范围为0.1瓦～10瓦。一些实施例中，激光功率范围为0.5瓦～5瓦。需要说明的是，通过激光划线的方式形成所述第三沟槽133的做法仅为一示例，本发明对形成所述第三沟槽133的具体方法不做限定。
需要说明的是，参考图4中步骤S411，在形成所述第三沟槽133的步骤之后，所述形成方法还可以包括清理粉尘残余，以提高所述电致变色结构的制造良品率。
参考图4中步骤S420，参考图14和图15，在形成第三沟槽133之后，向所述第三沟槽133内填充导电材料，形成所述第一电极141；在所述第二导电层130表面形成第二电极142，所述第二电极142与第二隔离区130i内的所述第二导电层130电连接。所述第二电极142可以与第一电极141在同一步骤中形成。
所述第一电极141和所述第二电极142用于分别向所述第一导电 层110和第二导电层130加载电压信号，从而使第一导电层110和第二导电层130之间形成电场，以实现对变色功能层120颜色的控制。
所述第二隔离区130i和所述第二传导区130t之间的电隔离实现了所述第一电极141和第二电极142之间的电隔离，使第一电极141和第二电极142均能位于所述第二导电层130的表面，使所述第一电极141和所述第二电极142能够均匀分布在所述电致变色结构表面，从而能够提高第一导电层110和第二导电层130之间电场的均匀程度，提高所述变色功能层120的变色均匀度，改善电致变色结构变色速度慢的问题，进而有利于扩大电致变色玻璃的面积，使大面积电致变色玻璃的变色更快、更均匀。
同时，所述第一隔离区110i和所述第一传导区110t之间的电隔离，能够提高所述第一电极141与第一隔离区110i的所述第一导电层110之间的电隔离，降低漏电、短路等电路问题出现的可能，提高制造所述电致变色结构的良品率，改善所述电致变色结构的性能，延长所述电致变色结构的使用寿命。
此外，所述第二电极142和所述第一隔离区110i位置相互对应，而第一隔离区110i与第一传导区110t隔离，这里可以进一步提高电隔离，降低击穿风险。
所述第一电极141和第二电极142的材料可以为金属。所述第一电极141或所述第二电极142可以通过丝网印刷、真空热蒸镀镀膜、真空磁控溅射镀膜、真空离子源镀膜、喷墨打印等方式形成。
为了简化器件结构，提高制造良品率，本发明一些实施例中，所形成的第一电极141可以与所述第二沟槽132相互平行，所述第二电极142可以与所述第一沟槽111相互平行。此外，所述第一电极141和所述第二电极142之间也可以相互平行。
所述第一电极141的数量大于1个时，所述第一电极141之间可以相互平行；在所述第二电极142的数量大于1时，所述第二电极 142之间也可以相互平行。
此外，为了提高第一电极141和第二电极142之间电场的均匀性，所述第二电极142和第一电极141之间交叉排列，即当所述电致变色结构包括多个第一电极141或多个第二电极142时，所述第一电极141均匀分布于相邻第二电极142之间，或者所述第二电极142均匀分布于相邻第一电极141之间。
如图15所示的实例中，所述第一电极141的数量为2个，所述第二电极142的数量为3个。相邻第二电极142之间设置一个第一电极141，且所述第一电极141到相邻第二电极142的距离相等；相邻第一电极141之间设置一个第二电极142，且所述第二电极142到相邻第一电极141的距离相等。
在其他实施中，电极的数量可以根据实际电致变色结构的面积大小进行安排。在一些实施例中，可以在一定范围内设置一对第一电极和第二电极。即在上述实施例中，所述第一导电层和第二导电层可以被分成了对应的多个隔离区和多个传导区，实际上，若面积不大，他们可以分别仅设置为一个，即只有1对的第一电极和第二电极，但是第一电极和第二电极均位于电致变色层的一侧。在一些实施例中，所述第一导电层甚至可以不被隔离，仅第二导电层被分割成多个隔离区和多个传导区，可以解决大面积下电致变色均匀的问题。
需要说明的是，在本发明的一些实施例中，所述第一导电层110、电致变色层120、第二导电层130以及第一电极141和第二电极142都位于所述基底100的一侧，但是这种做法仅为一示例，本发明对此不做限定。在本发明其他实施例中，所述电致变色结构还可以包括分别位于基底100两侧的所述第一导电层110、电致变色层120、第二导电层130以及第一电极141和第二电极142。
相应的，本发明还提供一种电致变色结构，参考图14和图15，示出了本发明电致变色结构一实施例的结构示意图，其中图14是所述电致变色结构的俯视图，图15是图14中沿DD线的剖视图。
所述电致变色结构包括：基底100，所述基底100表面形成有第一导电层110。变色功能层120，位于所述第一导电层110表面；第二导电层130，位于所述变色功能层表面；第一电极141，与第二导电层130同属所述变色功能层一侧，所述第一电极141与所述第二导电层130电隔离、且依次贯穿所述第二导电层130和变色功能层120与所述第一导电层110电连接；位于第二导电层130表面的第二电极142，所述第二电极142与所述第二导电层130电连接。
综上，本发明实施例通过使第一电极和第二电极均位于第二导电层表面，能够使得对于所述电致变色结构施加电压更为方便。而且，本发明实施例的第一电极和第二电极均为多个，从而能够通过调节电极分布来提高第一导电层和第二导电层之间电场的均匀程度，从而能够提高所述变色功能层的变色均匀度，改善电致变色结构变色速度慢的问题，进而有利于扩大电致变色玻璃的面积，使大面积电致变色玻璃的变色更快、更均匀。
虽然本发明披露如上，但本发明并非限定于此。任何本领域技术人员，在不脱离本发明的精神和范围内，均可作各种更动与修改，因此本发明的保护范围应当以权利要求所限定的范围为准。

Claims (31)

  1. 一种电致变色结构，其特征在于，包括：
    基底，所述基底表面形成有第一导电层；
    变色功能层，位于所述第一导电层表面；
    第二导电层，位于所述变色功能层表面；
    第一电极，与第二导电层同属所述变色功能层的一侧，所述第一电极与所述第二导电层电隔离、且依次贯穿所述第二导电层和变色功能层与所述第一导电层电连接；
    第二电极，与第二导电层同属所述变色功能层的一侧，与所述第二导电层电连接。
  2. 如权利要求1所述的电致变色结构，其特征在于，所述第一导电层包括相互电隔离的第一隔离区和第一传导区，所述第一隔离区的数量为一个或多个；所述第一传导区的数量为一个或多个；
    所述第一电极与所述第一传导区的所述第一导电层电连接。
  3. 如权利要求2所述的电致变色结构，其特征在于，所述电致变色结构还包括：贯穿所述第一导电层的第一沟槽，所述第一沟槽将所述第一导电层分为多个第一隔离区和多个第一传导区。
  4. 如权利要求3所述的电致变色结构，其特征在于，所述第一沟槽呈“几”字形延伸，所述多个第一隔离区相互连通，形成梳子形状；
    所述多个第一传导区相互连通，形成和第一隔离区的梳齿相配合的梳子形状。
  5. 如权利要求3所述的电致变色结构，其特征在于，所述第一沟槽的宽度范围为1微米～50微米。
  6. 如权利要求2所述的电致变色结构，其特征在于，所述第一 隔离区的宽度范围为1微米～500微米，所述第一传导区的宽度范围为1厘米～500厘米。
  7. 如权利要求2所述的电致变色结构，其特征在于，所述第二导电层包括相互电隔离的第二隔离区和第二传导区，所述第二隔离区的数量为一个或多个，所述第二传导区的数量一个或为多个；
    所述第一电极位于第二隔离区的所述第二导电层表面；
    所述第二电极位于第二传导区的所述第二导电层表面，所述第一电极和多个第二电极交错排列。
  8. 如权利要求7所述的电致变色结构，其特征在于，所述第二隔离区和所述第一隔离区在所述基底表面的投影相互错开。
  9. 如权利要求7所述的电致变色结构，其特征在于，所述第二电极和所述第一隔离区位置相互对应。
  10. 如权利要求7所述的电致变色结构，其特征在于，所述电致变色结构还包括：贯穿所述第二导电层的第二沟槽，所述第二沟槽将所述第二导电层分为多个第二隔离区和多个第二传导区。
  11. 如权利要求10所述的电致变色结构，其特征在于，所述第二沟槽呈“几”字形延伸，所述多个第二隔离区相互连通，形成梳子形状；
    所述多个第二传导区相互连通，形成与第二隔离区的梳齿图形相配合的梳子形状。
  12. 如权利要求10所述的电致变色结构，其特征在于，所述第二沟槽的宽度范围为1微米～50微米。
  13. 如权利要求7所述的电致变色结构，其特征在于，所述第二隔离区的宽度范围为1微米～500微米范围内，所述第二传导区的宽度范围为1厘米～500厘米。
  14. 如权利要求1所述的电致变色结构，其特征在于，所述第二导电层包括相互电隔离的第二隔离区和第二传导区；
    所述第一电极位于第二隔离区的所述第二导电层表面；
    所述第二电极位于第二传导区的所述第二导电层表面，所述第一电极和多个第二电极交错排列。
  15. 如权利要求1所述的电致变色结构，其特征在于，所述变色功能层包括一个或多个功能层，每个功能层包括电致变色层、离子存储层以及位于电致变色层和离子存储层之间的离子传导层。
  16. 如权利要求1所述的电致变色结构，其特征在于，所述基底为透光材料。
  17. 如权利要求1所述的电致变色结构，其特征在于，所述基底包括玻璃基底或柔性基底。
  18. 如权利要求1所述的电致变色结构，其特征在于，所述电致变色结构还包括位于所述基底和所述第一导电层之间的阻挡层。
  19. 如权利要求1所述的电致变色结构，其特征在于，所述第一导电层和/或所述第二导电层的材料包括透明导电氧化物。
  20. 一种电致变色结构的形成方法，其特征在于，包括：
    提供基底，所述基底表面形成有第一导电层；
    形成位于所述第一导电层表面的变色功能层；
    形成位于所述变色功能层表面的第二导电层；
    形成位于第二导电层表面的第一电极，所述第一电极与所述第二导电层电隔离且依次贯穿所述第二导电层和变色功能层与所述第一导电层电连接；
    形成位于第二导电层表面的第二电极，所述第二电极与所述第二导电层电连接。
  21. 如权利要求20所述的形成方法，其特征在于，所述形成方法还包括：形成贯穿所述第一导电层的第一沟槽，所述第一沟槽将所述第一导电层分为第一隔离区和第一传导区；
    所述第一电极与所述第一传导区的第一导电层电连接。
  22. 如权利要求21所述的形成方法，其特征在于，所述第一沟槽呈“几”字形延伸，形成多个第一隔离区和多个第一传导区，所述多个第一隔离区相互连通形成梳子形状；所述多个第一传导区相互连通，形成和第一隔离区的梳齿相配合的梳子形状。
  23. 如权利要求21所述的形成方法，其特征在于，所述形成方法还包括：形成贯穿所述第二导电层的第二沟槽，所述第二沟槽将所述第二导电层分为第二隔离区和第二传导区；
    所述第一电极位于第二隔离区的所述第二导电层表面；
    所述第二电极位于第二传导区的所述第二导电层表面。
  24. 如权利要求23所述的形成方法，其特征在于，所述第二沟槽呈“几”字形延伸，形成多个第二传导区和多个第二隔离区，所述多个第二隔离区相互连通，形成梳子形状；所述多个第二传导区相互连通，形成与第二隔离区的梳齿图形相配合的梳子形状。
  25. 如权利要求23所述的形成方法，其特征在于，所述第一沟槽和/或第二沟槽通过激光划线的方式形成。
  26. 如权利要求20所述的形成方法，其特征在于，形成第一电极包括：
    形成依次贯穿所述第二导电层和所述变色功能层的第三沟槽；
    向所述第三沟槽内填充导电材料以形成所述第一电极。
  27. 如权利要求26所述的形成方法，其特征在于，所述第三沟槽通过激光划线的方式形成。
  28. 如权利要求26所述的形成方法，其特征在于，所述第三沟槽的宽度范围为1微米～50微米。
  29. 如权利要求20所述的形成方法，其特征在于，所述第一电极和/或第二电极分别通过丝网印刷、真空热蒸镀镀膜、真空磁控溅射镀膜、真空离子源镀膜或喷墨打印的方式形成。
  30. 如权利要求20所述的形成方法，其特征在于，所述形成方法还包括：在形成第一导电层之前，形成覆盖基底表面的阻挡层。
  31. 如权利要求20所述的形成方法，其特征在于，形成所述变色功能层包括：形成一个或多个功能层，所述功能层包括电致变色层、离子存储层以及位于电致变色层和离子存储层之间的离子传导层。
PCT/CN2016/081231 2016-02-06 2016-05-06 电致变色结构及其形成方法 WO2017133104A1 (zh)

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