WO2017128779A1 - 显示基板及其制作方法、显示装置 - Google Patents

显示基板及其制作方法、显示装置 Download PDF

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Publication number
WO2017128779A1
WO2017128779A1 PCT/CN2016/102955 CN2016102955W WO2017128779A1 WO 2017128779 A1 WO2017128779 A1 WO 2017128779A1 CN 2016102955 W CN2016102955 W CN 2016102955W WO 2017128779 A1 WO2017128779 A1 WO 2017128779A1
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Prior art keywords
region
alignment film
alignment
pixel
display substrate
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Ceased
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PCT/CN2016/102955
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English (en)
French (fr)
Inventor
蒋学兵
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to US15/537,184 priority Critical patent/US10203556B2/en
Publication of WO2017128779A1 publication Critical patent/WO2017128779A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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    • G02F1/133761—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different pretilt angles
    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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    • G—PHYSICS
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
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    • G—PHYSICS
    • G02—OPTICS
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
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Definitions

  • Embodiments of the present invention relate to a display substrate, a method of fabricating the same, and a display device.
  • the display panel of the TFT-LCD is formed by a thin film transistor array substrate and a counter substrate pair, and liquid crystal molecules are filled between the array substrate and the counter substrate.
  • the array substrate includes horizontally and vertically intersecting gate lines 10' and data lines 20', and a plurality of pixel units are defined by the gate lines 10' and the data lines 20', and are formed on the plurality of pixel units.
  • An alignment film (not shown) for providing a certain pretilt angle to the liquid crystal molecules.
  • Each of the pixel units includes a thin film transistor ("TFT", not shown in the drawing) and a pixel electrode 1'.
  • TFT thin film transistor
  • the TFT controls a driving electric field between the pixel electrode 1' and the common electrode, thereby controlling the twist of the liquid crystal molecules and realizing the screen display.
  • the FFS mode Compared with other display modes, the FFS mode has a wide viewing angle and high transmittance, and has been widely used in high-end displays.
  • each slit on the pixel electrode 1' extends in the same direction to form a single domain driving electric field. Due to the planar torsion of the liquid crystal molecules, the left and right color shifts of the plane are severe.
  • a dual domain structure is currently employed on some products, and each slit on the pixel electrode 1' extends in two directions. It is presented in a zigzag shape.
  • the dual domain structure has a two-domain driving electric field with respect to the single domain structure, which contributes to color shift compensation.
  • the current dual domain structure bends the data line 20' in the pixel region, so that the total length of the data line 20' becomes large, increasing the transmission resistance.
  • the data line 20' needs to be widened or thickened, but this causes a problem that the aperture ratio becomes small, the alignment film is poorly rubbed, and the like.
  • a display substrate includes a plurality of pixel regions in which an alignment film that provides a pretilt angle for liquid crystal molecules is disposed.
  • the surface of the alignment film has a plurality of orientation grooves extending in at least two directions.
  • the display substrate is an array substrate, and the display substrate further includes a pixel electrode located in the pixel region, the pixel electrode having a plurality of slits, each of the slits extending in the same direction.
  • the display substrate further includes a plurality of gate lines and a plurality of data lines that are cross-distributed for defining the plurality of pixel regions, each of the data lines extending in the same direction.
  • the alignment grooves of the surface of the alignment film are in a zigzag shape.
  • the alignment film includes a first region and a second region
  • the orientation trench includes a plurality of first alignment trenches located in the first region and a plurality of locations in the second region a second orientation trench extending in a first direction, the second orientation trench extending in a second direction.
  • the display substrate is a counter substrate.
  • the alignment film is a photo-alignment film.
  • a display device includes the display substrate as described above.
  • a method of fabricating a display substrate includes a plurality of pixel regions, and the fabrication method includes the step of forming an alignment film for providing a pretilt angle for liquid crystal molecules in a plurality of pixel regions.
  • the step of forming the alignment film includes forming a plurality of alignment grooves extending in at least two directions on the surface of the alignment film of each of the pixel regions.
  • the display substrate is an array substrate
  • the manufacturing method further includes: forming a pixel electrode in the pixel region, and forming a plurality of slits on the pixel electrode, each of the slits being in the same direction extend.
  • the manufacturing method further includes: forming a plurality of gate lines and a plurality of data lines that are cross-distributed for defining the pixel regions, each of the data lines extending in the same direction.
  • the alignment film is a photo-alignment film, and the alignment film includes a first region and a second region in each pixel region; and an alignment groove extending in at least two directions is formed on an alignment film surface of each pixel region
  • the groove includes: the first linearly polarized light whose polarization direction is the first direction passes through the first mask pattern Exposing and developing the first region, forming a first alignment trench in the first region, the first mask pattern having a light-transmitting strip extending in a first direction; and a polarization direction being a second direction
  • the second linearly polarized light exposes the second region through the second mask pattern, and develops to form a second orientation trench in the second region, the second mask pattern having a transparent shape extending in the second direction Light stripes.
  • the alignment film is a photo-alignment film, and the alignment film includes a first region and a second region in each pixel region; and an alignment groove extending in at least two directions is formed on an alignment film surface of each pixel region
  • the trench includes: the first incident light of the first wavelength is exposed to the first region through the first mask pattern, and the first alignment trench is formed in the first region, the first mask pattern having a a light-transmitting strip extending in a direction; a second incident light of a second wavelength is exposed to the second region through a second mask pattern, and a second orientation trench is formed in the second region, the second mask
  • the film pattern has light transmissive stripes extending in the second direction.
  • the first mask pattern and the second mask pattern share the same substrate; when the first region is exposed, the second mask pattern is blocked; and the second region is exposed The first mask pattern is blocked.
  • FIG. 1 is a schematic structural view of an array substrate in a single domain display mode in the prior art
  • FIG. 2 is a schematic structural view of an array substrate in a dual domain display mode in the prior art
  • FIG. 3 is a schematic structural view of an array substrate in a dual domain display mode when the alignment film is not illustrated in the embodiment of the present invention
  • FIG. 4 is a schematic structural view of an array substrate in a dual domain display mode when an alignment film is schematically illustrated in an embodiment of the present invention
  • Figure 5 is a view showing the structure of an alignment film in each pixel region
  • 6 and 7 are views showing the manufacturing process of the alignment film in the embodiment of the present invention.
  • liquid crystal display technology it is necessary to form an alignment film on the inner surface of the array substrate and the opposite substrate, respectively, for providing a pretilt angle for the liquid crystal molecules, so that the liquid crystal molecules are arranged according to a certain rule.
  • the display substrate provided by the embodiment of the present invention is an array substrate or an opposite substrate including an alignment film.
  • the surface of the alignment film has a plurality of orientation grooves extending in at least two directions in each pixel region. Providing liquid crystal molecules with pretilt angles in different directions, achieving multi-domain display mode, contributing to color shift compensation and improving display quality. Since the alignment film is a transparent material and is located in the entire display area, the multi-domain display structure of the embodiment of the present invention does not affect the aperture ratio of the pixel and does not affect other structures of the display substrate.
  • the technical solution of the embodiment of the present invention is specifically described below by taking the display substrate as a thin film transistor array substrate as an example.
  • the technical solutions of the embodiments of the present invention are applicable not only to the thin film transistor array substrate but also to other display substrates having an alignment film, such as a counter substrate, other types of array substrates, and package substrates.
  • the thin film transistor array substrate in the embodiment of the present invention includes a gate line 10 and a data line 20 for defining a plurality of pixel regions.
  • Each of the pixel regions includes a thin film transistor (not shown) and a pixel electrode 1 .
  • the gate electrode of the thin film transistor is electrically connected or integrally formed with the gate line 10
  • the source electrode is electrically connected or integrally formed with the data line 20 .
  • the drain electrode is electrically connected to the pixel electrode 1.
  • the thin film transistor functions as a switching device that controls transmission of a data signal to the pixel electrode 1 to form an electric field that drives deflection of the liquid crystal molecules between the pixel electrode 1 and the common electrode (not shown) to effect display.
  • the array substrate further includes an alignment film 2 for providing a pretilt angle for the liquid crystal molecules to align the liquid crystal molecules according to a certain rule.
  • the surface of the alignment film 2 has a plurality of alignment grooves 21 extending in at least two directions such that liquid crystal molecules corresponding to each pixel region have at least two squares
  • the pretilt angle of the direction such as the first liquid crystal molecules 100 and the second liquid crystal molecules 101 in FIG. 3, has pretilt angles in different directions, thereby realizing a multi-domain display mode, contributing to color shift compensation, and improving display quality. Since the alignment film 2 is a transparent material and is located throughout the display region, the multi-domain display structure does not affect the aperture ratio of the pixel and does not affect other structures of the array substrate.
  • the multi-domain display mode is realized by the alignment film 2.
  • each slit 3 may be disposed to extend in the same direction.
  • each data line 20 can be disposed to extend in the same direction while ensuring the pixel aperture ratio, which is different from the multi-domain display in the prior art.
  • the structure needs to bend the data line 20, and the linear data line 20 has the shortest length and the minimum transmission resistance, which ensures the charging efficiency of the pixel.
  • the width of the data line 20 is small and does not affect the aperture ratio of the pixel.
  • the alignment trenches 21 on the alignment film 2 may be formed by a rubbing process, a photoalignment process, or other alignment processes, which is not limited herein.
  • the alignment film 2 is a photo-alignment film such as a polyimide film.
  • each pixel region is divided into a plurality of sub-pixel regions in a certain direction.
  • each of the alignment grooves 21 of the surface of the alignment film 2 extends in the same direction, and all the orientation grooves 21 extend in the same direction to simplify the structure of the alignment film 2 and the alignment process thereof, and also enable the liquid crystal The rules of arrangement of molecules.
  • the certain direction may be parallel to the extending direction of the gate line 10, or may be parallel to the extending direction of the data line 20, or any other direction.
  • the certain direction is set to be parallel to the extending direction of the data line 20.
  • each pixel region is divided into a first sub-pixel region and a second sub-pixel region, and each of the alignment grooves 21 located on the surface of the alignment film 2 in the first sub-pixel region extends in the first direction. And all the orientation grooves 21 extend in the same direction; each of the alignment grooves 21 located on the surface of the alignment film 2 in the second sub-pixel region extends in the second direction, and all the orientation grooves 21 extend in the same direction. That is, in each pixel region, the alignment film 2 includes a first region 200 corresponding to the first sub-pixel region position and a second region 201 corresponding to the second sub-pixel region position, and the orientation trench 21 includes a plurality of first regions.
  • first direction and the second direction are not parallel.
  • the surface of the alignment film 2 has a plurality of alignment grooves 21 extending in at least two directions, and the display is improved in order to ensure that all liquid crystal molecules in each pixel region have a pretilt angle.
  • the alignment groove 21 of the alignment film 2 it is necessary to provide the alignment groove 21 of the alignment film 2 to cover the entire pixel area as much as possible.
  • the alignment trenches 21 of the surface of the alignment film 2 are arranged in a line shape in each pixel region, so that liquid crystal molecules having different pretilt angles are arranged. continuous.
  • the orientation groove 21 may be a straight line shape or a curved line shape.
  • the alignment trenches 21 may be regularly distributed in the pixel region or may be irregularly distributed in the pixel region.
  • the orientation grooves 21 of the surface of the alignment film 2 in each pixel region are arranged in a straight line shape, and the shape is simple and convenient to implement. Further, each pixel region may be divided into a plurality of sub-pixel regions in a certain direction. In each sub-pixel region, each of the alignment grooves 21 on the surface of the alignment film 2 extends in the same direction, and all the orientation grooves The groove 21 extends in the same direction. As shown in FIG. 5, in each pixel region, the surface of the alignment film 2 has a plurality of linearly-line-shaped alignment grooves 21 arranged in parallel, and all the orientation grooves 21 are along the certain direction.
  • the extension simplifies the structure of the alignment film 2 and its orientation process, and enables all liquid crystal molecules in the pixel region to have a pretilt angle.
  • the certain direction may be parallel to the extending direction of the gate line 10, or may be parallel to the extending direction of the data line 20, or any other direction.
  • the certain direction is set to be parallel to the extending direction of the data line 20.
  • the thin film transistor array substrate in the embodiment of the present invention includes:
  • Each pixel area includes:
  • each slit 3 extends in the same direction.
  • the gate electrode of the thin film transistor is electrically connected or integrally formed with the gate line 10.
  • the source electrode is electrically connected or integrally formed with the data line 20, and the drain electrode is electrically connected to the pixel electrode 1.
  • the embodiment of the invention further provides a method for fabricating the above thin film transistor array substrate, and the manufacturing method comprises:
  • An alignment film for providing a pretilt angle to the liquid crystal molecules is formed.
  • the step of forming the alignment film includes forming a plurality of alignment grooves extending in at least two directions on the surface of the alignment film of each of the pixel regions.
  • the alignment film formed by the above steps has a plurality of orientation grooves extending in at least two directions corresponding to the surface of each pixel region, and provides liquid crystal molecules with pretilt angles in different directions, thereby realizing a multi-domain display mode, which contributes to Color shift compensation to improve display quality. Since the alignment film is a transparent material and is located in the entire display region, the multi-domain display structure does not affect the aperture ratio of the pixel and does not affect other structures of the array substrate.
  • the multi-domain display mode is implemented by the alignment film 2, and the step of forming the pixel electrode includes:
  • a pixel electrode is formed in the pixel region, and a plurality of slits are formed on the pixel electrode, each of the slits extending in the same direction.
  • the data lines may be arranged to extend in the same direction while ensuring the pixel aperture ratio, which is different from the multi-domain display structure in the prior art.
  • Line 20 the linear data line 20 has the shortest length and the minimum transmission resistance ensures the charging efficiency of the pixel.
  • the width of the data line 20 is small and does not affect the aperture ratio of the pixel.
  • the alignment film in the embodiment of the present invention is a photo-alignment film
  • the process of forming the orientation trench on the surface of the alignment film is:
  • the alignment film 2 includes a first region 200 and a second region 201, and the alignment trench 21 includes a plurality of first alignment trenches located in the first region 200 and a plurality of second regions. a second orientation trench of the region 201, the first alignment trench extends in a first direction, the second alignment trench extends in a second direction, and the first alignment trench is respectively formed by two photoalignment processes and The second orientation groove.
  • the step of forming a plurality of orientation grooves 21 extending in at least two directions on the surface of the alignment film 2 of each pixel region includes:
  • the first linearly polarized light having the polarization direction of the first direction is exposed to the first region 200 through the first mask pattern, and developed to form a first alignment trench in the first region 200.
  • the second linearly polarized light whose polarization direction is the second direction is exposed to the second region 201 through the second mask pattern, developed, and the second alignment trench is formed in the second region 201.
  • the second mask pattern has light transmissive stripes extending in the second direction.
  • the step of forming a plurality of orientation grooves extending in at least two directions on the surface of the alignment film of each pixel region comprises:
  • the first incident light of the first wavelength is exposed to the first region 200 through the first mask pattern, and the first alignment trench is formed in the first region 200, the first mask pattern. Having a light-transmitting strip extending in a first direction;
  • the second incident light of the second wavelength is exposed to the second region 201 through the second mask pattern, and the second alignment trench is formed in the second region 201, the second mask pattern having the edge Light-transmitting stripes extending in the second direction.
  • the first alignment trench of the first region 200 and the second alignment trench of the second region 201 are respectively formed by selecting linearly polarized light that transmits different polarization directions.
  • the first alignment trench of the first region 200 and the second alignment trench of the second region 201 are respectively formed by selecting light rays that pass through different wavelengths.
  • the first mask pattern and the second mask pattern share the same substrate, that is, the first mask pattern and the second mask pattern are formed on the same substrate, so that in the actual process,
  • the exposure of the first area 200 and the second area 201 only needs to be aligned once, shortening the time, and reducing the cost.
  • blocking the light to pass through the second mask pattern by selecting a method of transmitting light to achieve the purpose of blocking the second mask pattern; and performing the second region 201 During exposure, light is blocked from passing through the first mask pattern by selecting a way to transmit light to achieve the purpose of blocking the first mask pattern.
  • the substrate is a transparent substrate such as a glass substrate, a quartz substrate, an organic resin substrate, or the like.
  • the manufacturing method in the above two embodiments is suitable for forming an orientation trench having two or more different extending directions on the surface of the alignment film.
  • the embodiment of the invention further provides a display device comprising the above array substrate, which can ensure the aperture ratio and the charging rate of the pixel while realizing the multi-domain display mode.
  • the display device may be any product or component having a display function such as a display panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a display panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the display device further includes an opposite substrate, and the opposite substrate also includes an alignment film.
  • the alignment method can be formed on the alignment film of the opposite substrate by using the fabrication method in the embodiment of the present invention, and each image In the element region, the alignment film surface of the opposite substrate has a plurality of alignment grooves extending in at least two directions.
  • Other structures of the opposite substrate such as a black matrix, a flat layer, etc., may be formed by a prior art fabrication process and will not be described in detail herein.
  • the orientation direction of the alignment film on the opposite substrate matches the alignment direction of the alignment film on the array substrate.
  • the alignment film is a photo-alignment film
  • the same mask plate can be used to simultaneously align the corresponding regions of the opposite substrate and the array substrate, thereby reducing production cost and shortening process time.

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Abstract

一种显示基板及其制作方法、显示装置。显示基板包括多个像素区域，多个像素区域中设置有为液晶分子提供预倾角的配向膜(2)。每一像素区域中，配向膜(2)的表面具有多个沿至少两个方向延伸的取向沟槽(21)。可以实现多畴显示模式，有助于色偏补偿，提高显示装置的显示品质。由于配向膜(2)为透明材料，因此不会影响像素的开口率，也不会对显示基板的其他结构产生影响。

Description

显示基板及其制作方法、显示装置 技术领域
本发明的实施例涉及一种显示基板及其制作方法、显示装置。
背景技术
随着制造技术的发展，薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，简称“TFT-LCD”)因其具有功耗低、制造成本低以及无辐射等优点，已经取代传统的显像管显示器而成为显示器的主流。TFT-LCD的显示面板由薄膜晶体管阵列基板和对向基板对盒形成，在阵列基板和对向基板之间填充有液晶分子。结合图1和图2所示，阵列基板包括横纵交叉的栅线10’和数据线20’，由栅线10’和数据线20’限定多个像素单元，在多个像素单元上形成有配向膜(图中未示出)，用于为液晶分子提供一定的预倾角。每个像素单元包括薄膜晶体管(Thin Film Transistor，简称“TFT”，图中未示出)和像素电极1’。TFT作为开关器件，控制像素电极1’和公共电极之间产生驱动电场，从而控制液晶分子的扭转，实现画面显示。
相比于其它的显示模式，FFS模式视角广，透过率高，目前已经被广泛使用于高端的显示器中。
在FFS显示模式中，如图1所示，传统的单畴(single domain)结构中，像素电极1’上的每一狭缝沿同一方向延伸，形成单畴驱动电场。由于液晶分子的平面扭转原因，会导致平面左右色偏现象严重。为了改善传统单畴显示模式的色偏问题，如图2所示，目前在某些产品上面开始采用双畴(dual domain)的结构，像素电极1’上的每一狭缝沿两个方向延伸以呈现为折线形。相对于单畴结构，双畴结构具有两畴驱动电场，有助于色偏补偿。为保证高的开口率，目前双畴结构都将数据线20’在像素区域弯曲，这样使得数据线20’总长度变大，增加了传输电阻。为了保证像素单元的充电效率，需将数据线20’变宽或者变厚，但是这样会导致开口率变小、配向膜摩擦不良等相关不良问题。
发明内容
根据本发明的实施例，提供一种显示基板。该显示基板包括多个像素区域，所述多个像素区域中设置有为液晶分子提供预倾角的配向膜。每一像素区域中，所述配向膜的表面具有多个沿至少两个方向延伸的取向沟槽。
例如，所述显示基板为阵列基板，并且所述显示基板还包括位于所述像素区域中的像素电极，所述像素电极具有多条狭缝，每一所述狭缝沿同一方向延伸。
例如，所述显示基板还包括交叉分布的多条栅线和多条数据线，用于限定所述多个像素区域，每一所述数据线沿同一方向延伸。
例如，每一像素区域中，所述配向膜表面的取向沟槽为折线形。
例如，每一像素区域中，所述配向膜包括第一区域和第二区域，所述取向沟槽包括多个位于所述第一区域的第一取向沟槽和多个位于所述第二区域的第二取向沟槽，所述第一取向沟槽沿第一方向延伸，所述第二取向沟槽沿第二方向延伸。
例如，所述显示基板为对向基板。
例如，所述配向膜为光配向膜。
根据本发明的实施例，提供一种显示装置。该显示装置包括如上所述的显示基板。
根据本发明的实施例，提供一种显示基板的制作方法。所述显示基板包括多个像素区域，所述制作方法包括在多个像素区域中形成用于为液晶分子提供预倾角的配向膜的步骤。形成配向膜的步骤包括：在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽。
例如，所述显示基板为阵列基板，并且所述制作方法还包括：在所述像素区域中形成像素电极，并在所述像素电极上形成多条狭缝，每一所述狭缝沿同一方向延伸。
例如，所述制作方法还包括：形成交叉分布的多条栅线和多条数据线，用于限定所述像素区域，每一所述数据线沿同一方向延伸。
例如，所述配向膜为光配向膜，每一像素区域中所述配向膜包括第一区域和第二区域；在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽包括：偏振方向为第一方向的第一线性偏振光透过第一掩膜图形 对所述第一区域进行曝光，显影，在所述第一区域形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；偏振方向为第二方向的第二线性偏振光透过第二掩膜图形对所述第二区域进行曝光，显影，在所述第二区域形成第二取向沟槽，所述第二掩膜图形具有沿第二方向延伸的透光条纹。
例如，所述配向膜为光配向膜，每一像素区域中所述配向膜包括第一区域和第二区域；在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽包括：第一波长的第一入射光透过第一掩膜图形对所述第一区域进行曝光，在所述第一区域形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；第二波长的第二入射光透过第二掩膜图形对所述第二区域进行曝光，在所述第二区域形成第二取向沟槽，所述第二掩膜图形具有沿第二方向延伸的透光条纹。
例如，所述第一掩膜图形和第二掩膜图形共用同一基底；所述对所述第一区域进行曝光时，遮挡所述第二掩膜图形；所述对所述第二区域进行曝光时，遮挡所述第一掩膜图形。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。
图1表示现有技术中单畴显示模式的阵列基板的结构示意图；
图2表示现有技术中双畴显示模式的阵列基板的结构示意图；
图3表示本发明实施例中不示意配向膜时双畴显示模式的阵列基板的结构示意图；
图4表示本发明实施例中示意配向膜时双畴显示模式的阵列基板的结构示意图；
图5表示每一像素区域中配向膜的结构示意图；
图6和图7表示本发明实施例中配向膜的制作过程示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
在液晶显示技术中，需要在对盒设置的阵列基板和对向基板的内侧表面分别形成配向膜，用于为液晶分子提供预倾角，使液晶分子按一定规则排列。
本发明实施例提供的显示基板即为包括配向膜的阵列基板或对向基板，通过设置每一像素区域中，所述配向膜的表面具有多个沿至少两个方向延伸的取向沟槽，来为液晶分子提供不同方向的预倾角，实现多畴显示模式，有助于色偏补偿，提高显示品质。由于配向膜为透明材料，位于整个显示区域，因此，本发明实施例的多畴显示结构不会影响像素的开口率，也不会对显示基板的其他结构产生影响。
下面将结合附图，对本发明的实施例作进一步详细描述。以下实施例用于说明本发明，但不用来限制本发明的范围。
下面以所述显示基板为薄膜晶体管阵列基板为例，来具体介绍本发明实施例的技术方案。
需要说明的是，本发明实施例的技术方案不仅适用于薄膜晶体管阵列基板，也适用于其他具有配向膜的显示基板，如：对向基板、其他类型的阵列基板、封装基板。
结合图3-图5所示，本发明实施例中的薄膜晶体管阵列基板包括栅线10和数据线20，用于限定多个像素区域。每个像素区域包括薄膜晶体管(图中未示出)和像素电极1，所述薄膜晶体管的栅电极与栅线10电性连接或一体形成，源电极与数据线20电性连接或一体形成，漏电极与像素电极1电性连接。所述薄膜晶体管作为开关器件，控制对像素电极1传输数据信号，从而在像素电极1和公共电极(未示出)之间形成驱动液晶分子偏转的电场，以实现显示。
所述阵列基板还包括配向膜2，用于为液晶分子提供预倾角，使液晶分子按一定规则排列。每一像素区域中，配向膜2的表面具有多个沿至少两个方向延伸的取向沟槽21，使得每一像素区域对应的液晶分子具有至少两个方 向的预倾角，如图3中的第一液晶分子100和第二液晶分子101具有不同方向的预倾角，从而实现多畴显示模式，有助于色偏补偿，提高显示品质。由于配向膜2为透明材料，位于整个显示区域，因此，上述多畴显示结构不会影响像素的开口率，也不会对阵列基板的其他结构产生影响。
本发明实施例中通过配向膜2来实现多畴显示模式，则当像素电极1上具有多条狭缝3时，可以设置每一狭缝3沿同一方向延伸。进一步地，由于像素电极1上的每一狭缝3沿同一方向延伸，则在保证像素开口率的同时，可以设置每一数据线20沿同一方向延伸，不同于现有技术中的多畴显示结构需要弯折数据线20，直线形的数据线20具有最短的长度，传输电阻最小，保证了像素的充电效率。而且数据线20的宽度较小，不会影响像素的开口率。
例如，配向膜2上的取向沟槽21可以通过摩擦工艺、光配向工艺或其他取向工艺形成，在此不做限定。当通过光配向工艺形成取向沟槽21时，配向膜2为光配向膜，如：聚酰亚胺膜。
例如，在某一方向上，将每一像素区域分割成多个子像素区域。每一子像素区域中，配向膜2表面的每一取向沟槽21沿同一方向延伸，且所有取向沟槽21的延伸方向相同，以简化配向膜2的结构及其取向工艺，还能够使得液晶分子的排列规则。所述某一方向可以平行于栅线10的延伸方向，也可以平行于数据线20的延伸方向，或其他任一方向。例如，本发明实施例中设置所述某一方向平行于数据线20的延伸方向。以双畴显示模式为例，每一像素区域分割成第一子像素区域和第二子像素区域，位于第一子像素区域中的配向膜2表面的每一取向沟槽21沿第一方向延伸，且所有取向沟槽21的延伸方向相同；位于第二子像素区域中的配向膜2表面的每一取向沟槽21沿第二方向延伸，且所有取向沟槽21的延伸方向相同。即，每一像素区域中，配向膜2包括与第一子像素区域位置对应的第一区域200和与第二子像素区域位置对应的第二区域201，取向沟槽21包括多个位于第一区域200的第一取向沟槽和多个位于第二区域201的第二取向沟槽，每一所述第一取向沟槽沿第一方向延伸，每一所述第二取向沟槽沿第二方向延伸。其中，第一方向和第二方向不平行。
每一像素区域中，配向膜2的表面具有多个沿至少两个方向延伸的取向沟槽21，为了保证每一像素区域中的所有液晶分子都具有预倾角，提高显示 质量，需要设置配向膜2的取向沟槽21尽可能得覆盖整个像素区域。为了实现上述目的，结合图4和图5所示，本发明实施例中设置每一像素区域中，配向膜2表面的取向沟槽21为折线形，使得具有不同方向预倾角的液晶分子排布连续。例如，取向沟槽21可以为直线折线形或曲线折线形。取向沟槽21可以规则分布在所述像素区域中，也可以不规则分布在所述像素区域中。
本发明实施例中，设置每一像素区域中配向膜2表面的取向沟槽21为直线折线形，形状简单，便于实现。进一步地，还可以在某一方向上，将每一像素区域分割分割成多个子像素区域，每一子像素区域中，配向膜2表面的每一取向沟槽21沿同一方向延伸，且所有取向沟槽21的延伸方向相同，则结合图5所示，每一像素区域中，配向膜2表面具有多个平行设置的直线折线形取向沟槽21，且所有取向沟槽21沿所述某一方向延伸，简化了配向膜2的结构及其取向工艺，还能够使得像素区域中的所有液晶分子都具有预倾角。所述某一方向可以平行于栅线10的延伸方向，也可以平行于数据线20的延伸方向，或其他任一方向。例如，本发明实施例中设置所述某一方向平行于数据线20的延伸方向。
如图4所示，本发明实施例中的薄膜晶体管阵列基板包括：
横纵交叉分布的栅线10和数据线20，限定多个像素区域；
覆盖所有像素区域的配向膜2，每一像素区域中配向膜2的表面具有多个平行设置的直线折线形取向沟槽21，且所有取向沟槽21沿数据线20的延伸方向延伸；
每个像素区域包括：
薄膜晶体管(图中未示出)和像素电极1，像素电极1上具有多条狭缝3时，每一狭缝3沿同一方向延伸。所述薄膜晶体管的栅电极与栅线10电性连接或一体形成，源电极与数据线20电性连接或一体形成，漏电极与像素电极1电性连接。
本发明实施例还提供一种上述薄膜晶体管阵列基板的制作方法，所述制作方法包括：
形成交叉分布的栅线和数据线，用于限定多个像素区域；
在每个像素区域形成薄膜晶体管和像素电极；
形成用于为液晶分子提供预倾角的配向膜。
例如，形成配向膜的步骤包括：在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽。
通过上述步骤形成的配向膜，其对应每一像素区域的表面具有多个沿至少两个方向延伸的取向沟槽，为液晶分子提供不同方向的预倾角，从而实现多畴显示模式，有助于色偏补偿，提高显示品质。由于配向膜为透明材料，位于整个显示区域，因此，上述多畴显示结构不会影响像素的开口率，也不会对阵列基板的其他结构产生影响。
本发明实施例中通过配向膜2来实现多畴显示模式，则形成所述像素电极的步骤包括：
在所述像素区域中形成像素电极，并在所述像素电极上形成多条狭缝，每一所述狭缝沿同一方向延伸。
进一步地，由于像素电极上的狭缝沿同一方向延伸，则在保证像素开口率的同时，可以设置所述数据线沿同一方向延伸，不同于现有技术中的多畴显示结构需要弯折数据线20，直线形的数据线20具有最短的长度，传输电阻最小，保证了像素的充电效率。而且数据线20的宽度较小，不会影响像素的开口率。
例如，本发明实施例中的配向膜为光配向膜，在配向膜的表面形成取向沟槽的过程为：
结合图5所示，每一像素区域中，配向膜2包括第一区域200和第二区域201，取向沟槽21包括多个位于第一区域200的第一取向沟槽和多个位于第二区域201的第二取向沟槽，所述第一取向沟槽沿第一方向延伸，所述第二取向沟槽沿第二方向延伸，通过两个光配向过程来分别形成第一取向沟槽和第二取向沟槽。
在一个具体的实施方式中例如，在每一像素区域的配向膜2表面形成多个沿至少两个方向延伸的取向沟槽21的步骤包括：
如图6所示，偏振方向为第一方向的第一线性偏振光透过第一掩膜图形对第一区域200进行曝光，显影，在第一区域200形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；
如图7所示，偏振方向为第二方向的第二线性偏振光透过第二掩膜图形对第二区域201进行曝光，显影，在第二区域201形成第二取向沟槽，所述 第二掩膜图形具有沿第二方向延伸的透光条纹。
在另一个具体的实施方式中，在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽的步骤包括：
如图6所示，第一波长的第一入射光透过第一掩膜图形对第一区域200进行曝光，在所述第一区域200形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；
如图7所示，第二波长的第二入射光透过第二掩膜图形对第二区域201进行曝光，在第二区域201形成第二取向沟槽，所述第二掩膜图形具有沿第二方向延伸的透光条纹。
在上述第一个具体实施方式中通过选择透过不同偏振方向的线性偏振光来分别形成第一区域200的第一取向沟槽和第二区域的201的第二取向沟槽。在上述第二个具体实施方式中通过选择透过不同波长的光线来分别形成第一区域200的第一取向沟槽和第二区域的201的第二取向沟槽。
例如，所述第一掩膜图形和第二掩膜图形共用同一基底，即，所述第一掩膜图形和所述第二掩膜图形制作在同一基底上，这样在实际工艺过程中，对第一区域200和第二区域201的曝光只需进行一次对位，缩短时间，降低成本。在对第一区域200进行曝光时，通过选择透过光线的方式阻挡光线透过所述第二掩膜图形，以达到遮挡所述第二掩膜图形的目的；而在对第二区域201进行曝光时，通过选择透过光线的方式阻挡光线透过所述第一掩膜图形，以达到遮挡所述第一掩膜图形的目的。所述基底为透明基底，如：玻璃基底、石英基底、有机树脂基底等。
需要说明的是，上述两个具体实施方式中的制作方法适用于在配向膜的表面形成具有两个及两个以上不同延伸方向的取向沟槽的制作。
本发明实施例中还提供一种显示装置，包括上述的阵列基板，在实现多畴显示模式的同时，还能够保证像素的开口率和充电率。
例如，所述显示装置可以为：显示面板、电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
所述显示装置还包括对向基板，所述对向基板也包括配向膜，可以采用本发明实施例中的制作方法在对向基板的配向膜上形成取向沟槽，且每一像 素区域中，对向基板的配向膜表面具有多个沿至少两个方向延伸的取向沟槽。对向基板的其他结构，如：黑矩阵、平坦层等，可以采用现有技术中的制作工艺来形成，在此不再详述。
可以理解的是，对向基板上的配向膜的取向方向与阵列基板上的配向膜的取向方向配合。当配向膜为光配向膜时，可以采用同一掩膜板同时对对向基板和阵列基板的对应区域进行配向，以降低生产成本，缩短工艺时间，
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2016年1月26日递交的第201610053267.6号中国专利申请的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (14)

  1. 一种显示基板，包括多个像素区域，所述多个像素区域中设置有为液晶分子提供预倾角的配向膜，其中，每一像素区域中，所述配向膜的表面具有多个沿至少两个方向延伸的取向沟槽。
  2. 根据权利要求1所述的显示基板，其中，所述显示基板为阵列基板，并且所述显示基板还包括位于所述像素区域中的像素电极，所述像素电极具有多条狭缝，每一所述狭缝沿同一方向延伸。
  3. 根据权利要求2所述的显示基板，其中，所述显示基板还包括交叉分布的多条栅线和多条数据线，用于限定所述多个像素区域，每一所述数据线沿同一方向延伸。
  4. 根据权利要求1所述的显示基板，其中，每一像素区域中，所述配向膜表面的取向沟槽为折线形。
  5. 根据权利要求4所述的显示基板，其中，每一像素区域中，所述配向膜包括第一区域和第二区域，所述取向沟槽包括多个位于所述第一区域的第一取向沟槽和多个位于所述第二区域的第二取向沟槽，所述第一取向沟槽沿第一方向延伸，所述第二取向沟槽沿第二方向延伸。
  6. 根据权利要求1所述的显示基板，其中，所述显示基板为对向基板。
  7. 根据权利要求1所述的显示基板，其中，所述配向膜为光配向膜。
  8. 一种显示装置，包括权利要求1-7任一项所述的显示基板。
  9. 一种显示基板的制作方法，所述显示基板包括多个像素区域，所述制作方法包括在多个像素区域中形成用于为液晶分子提供预倾角的配向膜的步骤，其中，形成配向膜的步骤包括：
    在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽。
  10. 根据权利要求9所述的制作方法，其中，所述显示基板为阵列基板，并且所述制作方法还包括：在所述像素区域中形成像素电极，并在所述像素电极上形成多条狭缝，每一所述狭缝沿同一方向延伸。
  11. 根据权利要求10所述的制作方法，其中，所述制作方法还包括：
    形成交叉分布的多条栅线和多条数据线，用于限定所述像素区域，每一 所述数据线沿同一方向延伸。
  12. 根据权利要求9所述的制作方法，其中，所述配向膜为光配向膜，每一像素区域中所述配向膜包括第一区域和第二区域；
    在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽包括：
    偏振方向为第一方向的第一线性偏振光透过第一掩膜图形对所述第一区域进行曝光，显影，在所述第一区域形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；
    偏振方向为第二方向的第二线性偏振光透过第二掩膜图形对所述第二区域进行曝光，显影，在所述第二区域形成第二取向沟槽，所述第二掩膜图形具有沿第二方向延伸的透光条纹。
  13. 根据权利要求9所述的制作方法，其中，所述配向膜为光配向膜，每一像素区域中所述配向膜包括第一区域和第二区域；
    在每一像素区域的配向膜表面形成多个沿至少两个方向延伸的取向沟槽包括：
    第一波长的第一入射光透过第一掩膜图形对所述第一区域进行曝光，在所述第一区域形成第一取向沟槽，所述第一掩膜图形具有沿第一方向延伸的透光条纹；
    第二波长的第二入射光透过第二掩膜图形对所述第二区域进行曝光，在所述第二区域形成第二取向沟槽，所述第二掩膜图形具有沿第二方向延伸的透光条纹。
  14. 根据权利要求12或13所述的制作方法，其中，所述第一掩膜图形和第二掩膜图形共用同一基底；
    所述对所述第一区域进行曝光时，遮挡所述第二掩膜图形；
    所述对所述第二区域进行曝光时，遮挡所述第一掩膜图形。
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