WO2017128576A1 - Ltps显示面板及其制作方法 - Google Patents

Ltps显示面板及其制作方法 Download PDF

Info

Publication number
WO2017128576A1
WO2017128576A1 PCT/CN2016/083565 CN2016083565W WO2017128576A1 WO 2017128576 A1 WO2017128576 A1 WO 2017128576A1 CN 2016083565 W CN2016083565 W CN 2016083565W WO 2017128576 A1 WO2017128576 A1 WO 2017128576A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
color
display panel
layer
black matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2016/083565
Other languages
English (en)
French (fr)
Inventor
虞晓江
乐文志
申智渊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to US15/112,431 priority Critical patent/US20180067367A1/en
Publication of WO2017128576A1 publication Critical patent/WO2017128576A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0231—Manufacture or treatment of multiple TFTs using masks, e.g. half-tone masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices

Definitions

  • the present invention relates to the field of display technologies, and in particular, to an LTPS display panel and a method of fabricating the same.
  • LCDs liquid crystal displays
  • Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become mainstream in display devices.
  • liquid crystal display devices which include an LTPS display panel and a backlight module.
  • the working principle of the liquid crystal display panel is to place liquid crystal molecules in two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates, and the liquid crystal molecules are controlled to change direction by energizing or not, and the light of the backlight module is changed. Refracted to produce a picture.
  • a liquid crystal display panel comprises a CF (Color Filter) substrate, a thin film transistor (TFT) substrate, a liquid crystal (LC) sandwiched between the color filter substrate and the thin film transistor substrate, and a sealant frame ( Sealant),
  • the molding process generally includes: front array (Array) process (film, yellow, etching and stripping), middle cell (Cell) process (TFT substrate and CF substrate bonding) and rear module assembly Process (drive IC and printed circuit board is pressed).
  • the front Array process mainly forms a TFT substrate to control the movement of liquid crystal molecules;
  • the middle Cell process mainly adds liquid crystal between the TFT substrate and the CF substrate;
  • the rear module assembly process is mainly to drive the IC to press and print the circuit.
  • the integration of the plates drives the liquid crystal molecules to rotate and display images.
  • Low Temperature Poly Silicon is a liquid crystal display technology widely used in small and medium-sized electronic products.
  • Conventional amorphous silicon materials have an electron mobility of about 0.5-1.0 cm 2 /VS, while low-temperature polysilicon has an electron mobility of 30-300 cm 2 /VS. Therefore, the low-temperature polycrystalline silicon liquid crystal display has many advantages such as high resolution, fast reaction speed, and high aperture ratio.
  • LTPS display panels have been widely used in high-end mobile phones and tablets. IPHONE 6S mobile phones, LG G4 mobile phones, Kindle Fire Hdx tablet computers and other products all use LTPS display panels. However, some LTPS display panels may have a large-view character bias. When the user tilts the LTPS display panel from a larger viewing angle, the panel display is deviated from the normal color level.
  • the LTPS display panel includes a color filter substrate 100 and an array substrate 200.
  • the color filter substrate 100 includes a first substrate 110 and is disposed on the a black matrix 120 and a color photoresist layer 130 on the first substrate 110, and a flat layer 140 disposed on the color photoresist layer 130; wherein the black matrix 120 includes a plurality of black shading strips having a flat surface 121.
  • the color photoresist layer 130 includes a plurality of color resist blocks 103.
  • the array substrate 200 includes a second substrate 210 and is disposed on the second substrate 210 and the color resists.
  • the block 103 corresponds to a plurality of pixel units 220.
  • An object of the present invention is to provide an LTPS display panel.
  • the edge of the black matrix is provided with a convex portion, which can better block light leakage between adjacent pixel units when viewed at a large angle, can reduce the large-view role deviation, and improve LTPS.
  • the display quality of the display panel is provided.
  • Another object of the present invention is to provide a method for fabricating an LTPS display panel, which adopts a halftone mask process to form a black matrix, and the edge of the black matrix is provided with a convex portion, which can better block adjacent positions when viewed at a large angle. Light leakage between the pixel units, thereby reducing the bias of the large-view character and improving the display quality of the LTPS display panel.
  • the present invention provides an LTPS display panel including a color filter substrate and an array substrate, the color film substrate including a first substrate, a black matrix and colored light disposed on the first substrate a resist layer, and a flat layer disposed on the color photoresist layer;
  • the black matrix includes a plurality of horizontal and longitudinal black shading strips, and the black shading strip includes a flat portion disposed on the first base substrate and a protrusion disposed on opposite sides of the flat portion
  • the color photoresist layer includes a plurality of first, second, and third color blocking blocks separated by the black matrix;
  • the array substrate includes a second substrate, and is disposed on the second a plurality of pixel units disposed on the base substrate and corresponding to the plurality of first, second, and third color resist blocks.
  • the height of the convex portion is smaller than the height of the flat portion, and the width of the convex portion is smaller than the width of the flat portion.
  • the first base substrate is a glass substrate; the material of the black matrix is a black positive type photoresist; and the material of the flat layer is an organic photoresist.
  • the first, second, and third color block blocks are red, green, and blue block blocks.
  • the pixel unit includes a thin film transistor layer and a pixel electrode disposed on the thin film transistor layer, the thin film transistor layer includes a gate, a source and a drain, and an active layer, and the active layer is made of low temperature polysilicon. .
  • the invention also provides a method for manufacturing an LTPS display panel, comprising the following steps:
  • Step 1 providing a first substrate, and coating a black photoresist layer on the first substrate;
  • the black matrix comprising a plurality of horizontal and vertical black shading strips, the black shading strips being disposed on the first a flat portion on the base substrate and a convex portion provided on both sides of the flat portion;
  • Step 2 sequentially applying first, second, and third color resists on the black matrix and the first substrate, and patterning them by a photolithography process to obtain spacing by the black matrix a plurality of first, second, and third color blocking blocks to form a color photoresist layer, and forming a flat layer on the color photoresist layer to obtain a color film substrate;
  • Step 3 providing an array substrate, the array substrate comprising a second substrate, and a plurality of first, second, and third portions disposed on the second substrate and the color photoresist layer a color blocking block corresponding to a plurality of pixel units;
  • the array substrate and the color film substrate are aligned into a box to obtain an LTPS display panel.
  • the black photoresist layer is made of a black positive-type photoresist
  • the half-tone mask is provided with a partial light-transmissive region for defining the flat portion, and is used to define a A completely opaque region of the raised portion.
  • the height of the convex portion is smaller than the height of the flat portion, and the width of the convex portion is smaller than the width of the flat portion
  • the first substrate is a glass substrate; the material of the flat layer is an organic photoresist; and the first, second, and third color blocks are red, green, and blue blocks in any order. Permutations.
  • the pixel unit includes a thin film transistor layer and a pixel electrode disposed on the thin film transistor layer, the thin film transistor layer includes a gate, a source and a drain, and an active layer, and the active layer is made of low temperature polysilicon. .
  • the present invention also provides an LTPS display panel comprising a color film substrate and an array substrate, the color film substrate comprising a first substrate, a black matrix and a color photoresist layer disposed on the first substrate, and a flat layer disposed on the color photoresist layer;
  • the black matrix includes a plurality of horizontal and longitudinal black shading strips, and the black shading strip includes a flat portion disposed on the first base substrate and disposed on both sides of the flat portion. a plurality of first, second, and third color blocking blocks separated by the black matrix;
  • the array substrate includes a second substrate, and is disposed on a plurality of pixel units disposed on the second substrate and corresponding to the plurality of first, second, and third color blocking blocks;
  • the height of the convex portion is smaller than the height of the flat portion, and the width of the convex portion is smaller than the width of the flat portion;
  • the first base substrate is a glass substrate; the material of the black matrix is a black positive type photoresist; and the material of the flat layer is an organic photoresist.
  • the LTPS display panel of the present invention has a convex portion at the edge of the black matrix, which can ensure that the light emitted from the pixel unit of the array substrate is only from the color block corresponding to the pixel unit in the color filter substrate. Wearing out does not cause light leakage between adjacent pixel units, thereby reducing the bias of the large-view character and improving the display quality of the LTPS display panel.
  • the method for fabricating the LTPS display panel of the present invention adopts a halftone mask process to form a black matrix, and the edge of the black matrix is provided with a convex portion, which can better block light leakage between adjacent pixel units when viewed at a large angle. , thereby reducing the bias of the big view and improving the display quality of the LTPS display panel.
  • FIG. 1 is a schematic structural view of a conventional LTPS display panel
  • FIG. 2 is a schematic structural view of an LTPS display panel of the present invention and a schematic diagram of step 3 of the method for fabricating the LTPS display panel of the present invention
  • 3-4 is a schematic diagram of step 1 of a method for fabricating an LTPS display panel of the present invention
  • FIG. 5 is a schematic diagram of step 2 of the method for fabricating the LTPS display panel of the present invention.
  • the present invention provides an LTPS display panel including a color filter substrate 10 and an array substrate 20, the color filter substrate 10 including a first substrate substrate 11 and a first substrate substrate. a black matrix 12 and a color photoresist layer 13 on the board 11, and a flat layer 14 provided on the color photoresist layer 13;
  • the black matrix 12 includes a plurality of horizontal and longitudinal black shading strips 102.
  • the black shading strips 102 include a flat portion 103 disposed on the first base substrate 11 and disposed on the flat portion 103. a raised portion 104 on both sides;
  • the color resist layer 13 includes a plurality of first, second, and third color blocking blocks 131, 132, 133 spaced apart by the black matrix 12;
  • 20 includes a second substrate 21 and a plurality of pixels disposed on the second substrate 21 and corresponding to the plurality of first, second, and third color blocking blocks 131, 132, and 133 Unit 22.
  • the first base substrate 11 is a transparent substrate, preferably a glass substrate.
  • the material of the black matrix 12 is a black positive type photoresist.
  • the height of the convex portion 104 is much smaller than the height of the flat portion 103, and the width of the convex portion 104 is much smaller than the width of the flat portion 103.
  • the first, second, and third color block blocks 131, 132, and 133 are red, green, and blue block blocks arranged in an arbitrary order.
  • the material of the flat layer 14 is an organic photoresist.
  • the pixel unit 22 includes a thin film transistor layer and a pixel electrode disposed on the thin film transistor layer, and the thin film transistor layer includes a gate, a source and a drain, and an active layer, and the active layer
  • the material is low temperature polysilicon.
  • the present invention provides a method for fabricating the above LTPS display panel, including the following steps:
  • Step 1 as shown in FIG. 3, a first substrate substrate 11 is provided, and a black photoresist layer 30 is coated on the first substrate substrate 11;
  • the black photoresist layer 30 is exposed and developed by using a halftone mask to obtain a black matrix 12, and the black matrix 12 includes a plurality of horizontal and vertical black shading strips 102.
  • the black light-shielding strip 102 includes a flat portion 103 provided on the first base substrate 11 and a convex portion 104 provided on both sides of the flat portion 103.
  • the first base substrate 11 is a transparent substrate, preferably a glass substrate.
  • the material of the black photoresist layer 30 is a black positive type photoresist, and the half color
  • the dimming cover is provided with a partially transparent region for defining the flat portion 103, and a completely opaque region for defining the convex portion 104.
  • the height of the convex portion 104 is much smaller than the height of the flat portion 103, and the width of the convex portion 104 is much smaller than the width of the flat portion 103, so that the volume of the convex portion 104 is Smaller, it has little effect on the coating and coverage of the color resist on the black matrix 12.
  • Step 2 sequentially coating the first, second, and third color resists on the black matrix 12 and the first base substrate 11, and patterning them by a photolithography process.
  • a plurality of first, second, and third color blocking blocks 131, 132, and 133 spaced apart by the black matrix 12 are formed to form a color photoresist layer 13, and a flat layer 14 is formed on the color photoresist layer 13.
  • a color film substrate 10 is produced.
  • the first, second, and third color block blocks 131, 132, and 133 are red, green, and blue block blocks arranged in an arbitrary order.
  • the material of the flat layer 14 is an organic photoresist.
  • the array substrate 20 includes a second substrate substrate 21, and is disposed on the second substrate substrate 21 and the color photoresist layer 13 a plurality of first, second, and third color blocking blocks 131, 132, 133 corresponding to a plurality of pixel units 22;
  • the array substrate 20 and the color filter substrate 10 are aligned into a box to obtain an LTPS display panel.
  • the pixel unit 22 includes a thin film transistor layer and a pixel electrode disposed on the thin film transistor layer, and the thin film transistor layer includes a gate, a source and a drain, and an active layer, and the active layer
  • the material is low temperature polysilicon.
  • the LTPS display panel is formed by using a halftone mask process to form a black matrix 12, and the edge of the black matrix 12 is provided with a convex portion 104, which can better block between adjacent pixel units when viewed at a large angle. Light leakage, which reduces the bias of the large-view character and improves the display quality of the LTPS display panel.
  • the edge of the black matrix is provided with a convex portion, which can ensure that the light emitted from the pixel unit of the array substrate is only worn from the color block corresponding to the pixel unit in the color filter substrate.
  • the light leakage between adjacent pixel units is not caused, thereby reducing the bias of the large-view character and improving the display quality of the LTPS display panel.
  • the method for fabricating the LTPS display panel of the present invention adopts a halftone mask process to form a black matrix, and the edge of the black matrix is provided with a convex portion, which can better block light leakage between adjacent pixel units when viewed at a large angle. , thereby reducing the bias of the big view and improving the display quality of the LTPS display panel.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

一种LTPS显示面板及其制作方法。所述LTPS显示面板，黑色矩阵（12）的边缘设有凸起部（104），能够保证从阵列基板（20）的像素单元（22）射出的光线仅从彩膜基板（10）中对应于该像素单元（22）的色阻块（131、132、133）中穿出，不会造成相邻像素单元（22）之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。所述LTPS显示面板的制作方法，采用一道半色调光罩制程形成黑色矩阵（12），所述黑色矩阵（12）的边缘设有凸起部（104），能较好的遮挡大角度观看时相邻像素单元（22）之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。

Description

LTPS显示面板及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种LTPS显示面板及其制作方法。
背景技术
随着显示技术的发展，液晶显示器(Liquid Crystal Display，LCD)等平面显示装置因具有高画质、省电、机身薄及应用范围广等优点，而被广泛的应用于手机、电视、个人数字助理、数字相机、笔记本电脑、台式计算机等各种消费性电子产品，成为显示装置中的主流。
现有市场上的液晶显示装置大部分为背光型液晶显示器，其包括LTPS显示面板及背光模组(backlight module)。液晶显示面板的工作原理是在两片平行的玻璃基板当中放置液晶分子，两片玻璃基板中间有许多垂直和水平的细小电线，通过通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
通常液晶显示面板由彩膜(CF，Color Filter)基板、薄膜晶体管(TFT，Thin Film Transistor)基板、夹于彩膜基板与薄膜晶体管基板之间的液晶(LC，Liquid Crystal)及密封胶框(Sealant)组成，其成型工艺一般包括：前段阵列(Array)制程(薄膜、黄光、蚀刻及剥膜)、中段成盒(Cell)制程(TFT基板与CF基板贴合)及后段模组组装制程(驱动IC与印刷电路板压合)。其中，前段Array制程主要是形成TFT基板，以便于控制液晶分子的运动；中段Cell制程主要是在TFT基板与CF基板之间添加液晶；后段模组组装制程主要是驱动IC压合与印刷电路板的整合，进而驱动液晶分子转动，显示图像。
低温多晶硅(Low Temperature Poly Silicon，LTPS)是广泛用于中小电子产品中的一种液晶显示技术。传统的非晶硅材料的电子迁移率约0.5-1.0cm2/V.S，而低温多晶硅的电子迁移率可达30-300cm2/V.S。因此，低温多晶硅液晶显示器具有高解析度、反应速度快、高开口率等诸多优点。目前，LTPS显示面板在高端手机、平板电脑上已获得广泛应用，IPHONE 6S手机、LG G4手机、Kindle Fire Hdx平板电脑等产品均使用LTPS显示面板。然而，部分LTPS显示面板会出现大视角色偏的情况，用户从较大视角倾斜着看LTPS显示面板时会发现面板的显示偏离了正常的颜色水平。
如图1所示，为现有的LTPS显示面板的结构示意图，所述LTPS显示面板包括彩膜基板100和阵列基板200，所述彩膜基板100包括第一衬底基板110、设于所述第一衬底基板110上的黑色矩阵120和彩色光阻层130、以及设于所述彩色光阻层130上的平坦层140；其中，所述黑色矩阵120包括数条表面平坦的黑色遮光条121，所述彩色光阻层130包括数个色阻块103；所述阵列基板200包括第二衬底基板210、及设于所述第二衬底基板210上且与所述数个色阻块103对应设置的数个像素单元220，如图1所示，当人眼从较大角度观看显示面板时，从阵列基板200的一个像素单元220透过的光会从彩膜基板100上的两个色阻块103中透出，使得相邻像素单元之间产生漏光，使人眼感受到色偏。因此，有必要提供一种LTPS显示面板，以解决该技术问题。
发明内容
本发明的目的在于提供一种LTPS显示面板，黑色矩阵的边缘设有凸起部，能较好的遮挡大角度观看时相邻像素单元之间的漏光，可减小大视角色偏，改善LTPS显示面板的显示品质。
本发明的目的还在于提供一种LTPS显示面板的制作方法，采用一道半色调光罩制程形成黑色矩阵，所述黑色矩阵的边缘设有凸起部，能较好的遮挡大角度观看时相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。
为实现上述目的，本发明提供一种LTPS显示面板，包括彩膜基板和阵列基板，所述彩膜基板包括第一衬底基板、设于所述第一衬底基板上的黑色矩阵和彩色光阻层、以及设于所述彩色光阻层上的平坦层；
其中，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上方的凸起部；所述彩色光阻层包括被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块；所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述数个第一、第二、及第三色阻块对应设置的数个像素单元。
所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度。
所述第一衬底基板为玻璃基板；所述黑色矩阵的材料为黑色的正型光刻胶；所述平坦层的材料为有机光阻。
所述第一、第二、及第三色阻块为红色、绿色、及蓝色阻块按任意顺 序的排列组合。
所述像素单元包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
本发明还提供一种LTPS显示面板的制作方法，包括如下步骤：
步骤1、提供第一衬底基板，在所述第一衬底基板上涂布黑色光刻胶层；
采用一半色调光罩对所述黑色光刻胶层进行曝光、显影，得到黑色矩阵，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上方的凸起部；
步骤2、在所述黑色矩阵、及第一衬底基板上依次涂布第一、第二、及第三色阻，并采用光刻制程对其进行图案化，得到被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块，形成彩色光阻层，在所述彩色光阻层上形成平坦层，制得一彩膜基板；
步骤3、提供一阵列基板，所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述彩色光阻层的数个第一、第二、及第三色阻块对应设置的数个像素单元；
将所述阵列基板与彩膜基板对位成盒，得到一LTPS显示面板。
所述步骤1中，所述黑色光刻胶层的材料为黑色的正型光刻胶，所述半色调光罩上设有用来定义所述平坦部的部分透光区域、及用来定义所述凸起部的完全不透光区域。
所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度
所述第一衬底基板为玻璃基板；所述平坦层的材料为有机光阻；所述第一、第二、及第三色阻块为红色、绿色、及蓝色阻块按任意顺序的排列组合。
所述像素单元包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
本发明还提供一种LTPS显示面板，包括彩膜基板和阵列基板，所述彩膜基板包括第一衬底基板、设于所述第一衬底基板上的黑色矩阵和彩色光阻层、以及设于所述彩色光阻层上的平坦层；
其中，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上 方的凸起部；所述彩色光阻层包括被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块；所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述数个第一、第二、及第三色阻块对应设置的数个像素单元；
其中，所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度；
其中，所述第一衬底基板为玻璃基板；所述黑色矩阵的材料为黑色的正型光刻胶；所述平坦层的材料为有机光阻。
本发明的有益效果：本发明的LTPS显示面板，黑色矩阵的边缘设有凸起部，能够保证从阵列基板的像素单元射出的光线仅从彩膜基板中对应于该像素单元的色阻块中穿出，不会造成相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。本发明的LTPS显示面板的制作方法，采用一道半色调光罩制程形成黑色矩阵，所述黑色矩阵的边缘设有凸起部，能较好的遮挡大角度观看时相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为现有的LTPS显示面板的结构示意图；
图2本发明的LTPS显示面板的结构示意图暨本发明的LTPS显示面板的制作方法的步骤3的示意图；
图3-4为本发明的LTPS显示面板的制作方法的步骤1的示意图；
图5为本发明的LTPS显示面板的制作方法的步骤2的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2，本发明提供一种LTPS显示面板，包括彩膜基板10和阵列基板20，所述彩膜基板10包括第一衬底基板11、设于所述第一衬底基 板11上的黑色矩阵12和彩色光阻层13、以及设于所述彩色光阻层13上的平坦层14；
其中，所述黑色矩阵12包括数条横向与纵向排列的黑色遮光条102，所述黑色遮光条102包括设于所述第一衬底基板11上的平坦部103及设于所述平坦部103两侧上方的凸起部104；所述彩色光阻层13包括被所述黑色矩阵12间隔开的数个第一、第二、及第三色阻块131、132、133；所述阵列基板20包括第二衬底基板21、及设于所述第二衬底基板21上且与所述数个第一、第二、及第三色阻块131、132、133对应设置的数个像素单元22。
具体的，所述第一衬底基板11为透明基板，优选为玻璃基板。
具体的，所述黑色矩阵12的材料为黑色的正型光刻胶。
具体的，所述凸起部104的高度远远小于所述平坦部103的高度，所述凸起部104的宽度远远小于所述平坦部103的宽度。
具体的，所述第一、第二、及第三色阻块131、132、133为红色、绿色、及蓝色阻块按任意顺序的排列组合。
具体的，所述平坦层14的材料为有机光阻。
具体的，所述像素单元22包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
如图2所示，当人眼从较大角度观看该LTPS显示面板时，由于所述黑色矩阵12的边缘设有凸起部104，能够遮挡大视角下相邻像素之间的漏光，保证从阵列基板20的像素单元22射出的光线仅从所述彩膜基板10中对应于该像素单元22的色阻块131/132/133中穿出，从而减小大视角色偏，改善LTPS显示面板的显示品质。
请参阅图2-5，本发明提供一种上述LTPS显示面板的制作方法，包括如下步骤：
步骤1、如图3所示，提供第一衬底基板11，在所述第一衬底基板11上涂布黑色光刻胶层30；
如图4所示，采用一半色调光罩对所述黑色光刻胶层30进行曝光、显影，得到黑色矩阵12，所述黑色矩阵12包括数条横向与纵向排列的黑色遮光条102，所述黑色遮光条102包括设于所述第一衬底基板11上的平坦部103及设于所述平坦部103两侧上方的凸起部104。
具体的，所述第一衬底基板11为透明基板，优选为玻璃基板。
具体的，所述黑色光刻胶层30的材料为黑色的正型光刻胶，所述半色 调光罩上设有用来定义所述平坦部103的部分透光区域、及用来定义所述凸起部104的完全不透光区域。
具体的，所述凸起部104的高度远远小于所述平坦部103的高度，所述凸起部104的宽度远远小于所述平坦部103的宽度，从而所述凸起部104的体积较小，对色阻在黑色矩阵12上的涂布及覆盖影响不大。
步骤2、如图5所示，在所述黑色矩阵12、及第一衬底基板11上依次涂布第一、第二、及第三色阻，并采用光刻制程对其进行图案化，得到被所述黑色矩阵12间隔开的数个第一、第二、及第三色阻块131、132、133，形成彩色光阻层13，在所述彩色光阻层13上形成平坦层14，制得一彩膜基板10。
具体的，所述第一、第二、及第三色阻块131、132、133为红色、绿色、及蓝色阻块按任意顺序的排列组合。
具体的，所述平坦层14的材料为有机光阻。
步骤3、如图2所示，提供一阵列基板20，所述阵列基板20包括第二衬底基板21、及设于所述第二衬底基板21上且与所述彩色光阻层13的数个第一、第二、及第三色阻块131、132、133对应设置的数个像素单元22；
将所述阵列基板20与彩膜基板10对位成盒，得到一LTPS显示面板。
具体的，所述像素单元22包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
上述LTPS显示面板的制作方法，采用一道半色调光罩制程形成黑色矩阵12，所述黑色矩阵12的边缘设有凸起部104，能较好的遮挡大角度观看时相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。
综上所述，本发明的LTPS显示面板，黑色矩阵的边缘设有凸起部，能够保证从阵列基板的像素单元射出的光线仅从彩膜基板中对应于该像素单元的色阻块中穿出，不会造成相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。本发明的LTPS显示面板的制作方法，采用一道半色调光罩制程形成黑色矩阵，所述黑色矩阵的边缘设有凸起部，能较好的遮挡大角度观看时相邻像素单元之间的漏光，从而减小大视角色偏，改善LTPS显示面板的显示品质。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (13)

  1. 一种LTPS显示面板，包括彩膜基板和阵列基板，所述彩膜基板包括第一衬底基板、设于所述第一衬底基板上的黑色矩阵和彩色光阻层、以及设于所述彩色光阻层上的平坦层；
    其中，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上方的凸起部；所述彩色光阻层包括被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块；所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述数个第一、第二、及第三色阻块对应设置的数个像素单元。
  2. 如权利要求1所述的LTPS显示面板，其中，所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度。
  3. 如权利要求1所述的LTPS显示面板，其中，所述第一衬底基板为玻璃基板；所述黑色矩阵的材料为黑色的正型光刻胶；所述平坦层的材料为有机光阻。
  4. 如权利要求1所述的LTPS显示面板，其中，所述第一、第二、及第三色阻块为红色、绿色、及蓝色阻块按任意顺序的排列组合。
  5. 如权利要求1所述的LTPS显示面板，其中，所述像素单元包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
  6. 一种LTPS显示面板的制作方法，包括如下步骤：
    步骤1、提供第一衬底基板，在所述第一衬底基板上涂布黑色光刻胶层；
    采用一半色调光罩对所述黑色光刻胶层进行曝光、显影，得到黑色矩阵，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上方的凸起部；
    步骤2、在所述黑色矩阵、及第一衬底基板上依次涂布第一、第二、及第三色阻，并采用光刻制程对其进行图案化，得到被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块，形成彩色光阻层，在所述彩色光阻层上形成平坦层，制得一彩膜基板；
    步骤3、提供一阵列基板，所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述彩色光阻层的数个第一、第二、及第三色阻块 对应设置的数个像素单元；
    将所述阵列基板与彩膜基板对位成盒，得到一LTPS显示面板。
  7. 如权利要求6所述的LTPS显示面板的制作方法，其中，所述步骤1中，所述黑色光刻胶层的材料为黑色的正型光刻胶，所述半色调光罩上设有用来定义所述平坦部的部分透光区域、及用来定义所述凸起部的完全不透光区域。
  8. 如权利要求6所述的LTPS显示面板的制作方法，其中，所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度。
  9. 如权利要求6所述的LTPS显示面板的制作方法，其中，所述第一衬底基板为玻璃基板；所述平坦层的材料为有机光阻；所述第一、第二、及第三色阻块为红色、绿色、及蓝色阻块按任意顺序的排列组合。
  10. 如权利要求6所述的LTPS显示面板的制作方法，其中，所述像素单元包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
  11. 一种LTPS显示面板，包括彩膜基板和阵列基板，所述彩膜基板包括第一衬底基板、设于所述第一衬底基板上的黑色矩阵和彩色光阻层、以及设于所述彩色光阻层上的平坦层；
    其中，所述黑色矩阵包括数条横向与纵向排列的黑色遮光条，所述黑色遮光条包括设于所述第一衬底基板上的平坦部及设于所述平坦部两侧上方的凸起部；所述彩色光阻层包括被所述黑色矩阵间隔开的数个第一、第二、及第三色阻块；所述阵列基板包括第二衬底基板、及设于所述第二衬底基板上且与所述数个第一、第二、及第三色阻块对应设置的数个像素单元；
    其中，所述凸起部的高度小于所述平坦部的高度，所述凸起部的宽度小于所述平坦部的宽度；
    其中，所述第一衬底基板为玻璃基板；所述黑色矩阵的材料为黑色的正型光刻胶；所述平坦层的材料为有机光阻。
  12. 如权利要求11所述的LTPS显示面板，其中，所述第一、第二、及第三色阻块为红色、绿色、及蓝色阻块按任意顺序的排列组合。
  13. 如权利要求11所述的LTPS显示面板，其中，所述像素单元包括薄膜晶体管层、及设于所述薄膜晶体管层上的像素电极，所述薄膜晶体管层包括栅极、源漏极、及有源层，所述有源层的材料为低温多晶硅。
PCT/CN2016/083565 2016-01-29 2016-05-26 Ltps显示面板及其制作方法 Ceased WO2017128576A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/112,431 US20180067367A1 (en) 2016-01-29 2016-05-26 Ltps display panel and manufacture method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610063832.7 2016-01-29
CN201610063832.7A CN105487284A (zh) 2016-01-29 2016-01-29 Ltps显示面板及其制作方法

Publications (1)

Publication Number Publication Date
WO2017128576A1 true WO2017128576A1 (zh) 2017-08-03

Family

ID=55674361

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2016/083565 Ceased WO2017128576A1 (zh) 2016-01-29 2016-05-26 Ltps显示面板及其制作方法

Country Status (3)

Country Link
US (1) US20180067367A1 (zh)
CN (1) CN105487284A (zh)
WO (1) WO2017128576A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105487284A (zh) * 2016-01-29 2016-04-13 武汉华星光电技术有限公司 Ltps显示面板及其制作方法
CN105892162A (zh) * 2016-06-13 2016-08-24 京东方科技集团股份有限公司 显示装置及其制作方法
KR102733664B1 (ko) * 2016-08-22 2024-11-22 삼성디스플레이 주식회사 액정 표시 장치 및 이의 제조 방법
US10712602B2 (en) * 2016-08-24 2020-07-14 Panasonic Intellectual Property Management Co., Ltd. Optical drive
CN106353944A (zh) * 2016-11-04 2017-01-25 京东方科技集团股份有限公司 阵列基板及其制造方法、显示面板、显示装置
CN107065279A (zh) * 2017-03-14 2017-08-18 惠科股份有限公司 一种显示面板及其制程和显示装置
CN108490678A (zh) * 2018-03-28 2018-09-04 武汉华星光电技术有限公司 彩膜基板及其制作方法、液晶面板
CN110456545B (zh) 2019-07-29 2021-04-02 武汉华星光电技术有限公司 液晶显示面板及基板制作方法
CN113156700A (zh) 2021-02-24 2021-07-23 捷开通讯(深圳)有限公司 一种显示面板、制备显示面板的方法及电子设备
CN113267924B (zh) * 2021-05-07 2023-01-10 惠州市华星光电技术有限公司 显示面板和显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090050906A1 (en) * 2007-07-18 2009-02-26 Au Optronics Corporation Photo Detector and a Display Panel having the Same
US20100045912A1 (en) * 2008-08-25 2010-02-25 Au Optronics Corporation Display panel and manufacturing method thereof
CN202182998U (zh) * 2011-08-18 2012-04-04 京东方科技集团股份有限公司 液晶面板及显示设备
CN103941466A (zh) * 2014-03-06 2014-07-23 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置
CN103984148A (zh) * 2014-05-28 2014-08-13 京东方科技集团股份有限公司 彩膜基板及其制备方法、显示面板和显示装置
CN104834124A (zh) * 2015-04-07 2015-08-12 武汉华星光电技术有限公司 彩色滤光基板和液晶面板
CN105487284A (zh) * 2016-01-29 2016-04-13 武汉华星光电技术有限公司 Ltps显示面板及其制作方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070072158A (ko) * 2005-12-30 2007-07-04 엘지.필립스 엘시디 주식회사 액정 표시 장치용 컬러 필터 기판 및 이의 제조 방법
KR20080046892A (ko) * 2006-11-23 2008-05-28 삼성전자주식회사 액정표시장치와 그 제조방법
CN101556349A (zh) * 2008-04-11 2009-10-14 北京京东方光电科技有限公司 彩色滤光片及其制作方法
CN102681246B (zh) * 2012-04-12 2014-12-17 京东方科技集团股份有限公司 一种彩膜基板及其制造方法、以及液晶显示器

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090050906A1 (en) * 2007-07-18 2009-02-26 Au Optronics Corporation Photo Detector and a Display Panel having the Same
US20100045912A1 (en) * 2008-08-25 2010-02-25 Au Optronics Corporation Display panel and manufacturing method thereof
CN202182998U (zh) * 2011-08-18 2012-04-04 京东方科技集团股份有限公司 液晶面板及显示设备
CN103941466A (zh) * 2014-03-06 2014-07-23 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置
CN103984148A (zh) * 2014-05-28 2014-08-13 京东方科技集团股份有限公司 彩膜基板及其制备方法、显示面板和显示装置
CN104834124A (zh) * 2015-04-07 2015-08-12 武汉华星光电技术有限公司 彩色滤光基板和液晶面板
CN105487284A (zh) * 2016-01-29 2016-04-13 武汉华星光电技术有限公司 Ltps显示面板及其制作方法

Also Published As

Publication number Publication date
CN105487284A (zh) 2016-04-13
US20180067367A1 (en) 2018-03-08

Similar Documents

Publication Publication Date Title
WO2017128576A1 (zh) Ltps显示面板及其制作方法
US6692983B1 (en) Method of forming a color filter on a substrate having pixel driving elements
CN107039352B (zh) Tft基板的制作方法及tft基板
US10094962B2 (en) Color filter array substrate, method for fabricating the same and display device
JP4982189B2 (ja) カラーフィルター基板及びこれを備えた液晶表示パネル
WO2017008369A1 (zh) Coa型液晶显示面板及其制作方法
WO2019184769A1 (zh) 液晶显示面板、其制作方法及显示装置
WO2016086539A1 (zh) 液晶面板及其制作方法
US9946108B2 (en) Display panel and manufacture method thereof
US20190219865A1 (en) Bps array substrate and manufacturing method thereof
WO2017101204A1 (zh) 液晶显示装置
WO2018176629A1 (zh) 显示面板及其制造方法
WO2017124673A1 (zh) 阵列基板的制作方法及液晶显示面板
CN105974728A (zh) 光罩及彩膜基板的制作方法
US20190049804A1 (en) Active switch array substrate, manufacturing method therfor, and display panel
CN109188764B (zh) 液晶显示面板及其制作方法
WO2020228168A1 (zh) 阵列基板及其制作方法
WO2016155141A1 (zh) 一种偏光片、其制作方法、液晶显示面板及显示装置
US20180275466A1 (en) Display panel and lcd panel and lcd apparatus using the same
US20160313604A1 (en) Display substrate, manufacturing method thereof and display device
WO2019085292A1 (zh) 主动开关阵列基板及其制造方法和液晶面板
JP2004094217A (ja) 液晶表示器の自己位置合わせ画素電極の製造方法
US10503034B2 (en) Manufacturing method of a TFT substrate and structure
US10365518B2 (en) Methods for manufacturing display panel and display apparatus
US20190049803A1 (en) Active switch array substrate, manufacturing method therefor same, and display device using same

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 15112431

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16887458

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 16887458

Country of ref document: EP

Kind code of ref document: A1