WO2017121128A1 - Procédé et dispositif de commutation d'étage d'arc par vecteur de double étage de pièce à usiner à sustentation magnétique par acier magnétique dynamique basés sur une masse d'équilibrage rotative - Google Patents

Procédé et dispositif de commutation d'étage d'arc par vecteur de double étage de pièce à usiner à sustentation magnétique par acier magnétique dynamique basés sur une masse d'équilibrage rotative Download PDF

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Publication number
WO2017121128A1
WO2017121128A1 PCT/CN2016/097504 CN2016097504W WO2017121128A1 WO 2017121128 A1 WO2017121128 A1 WO 2017121128A1 CN 2016097504 W CN2016097504 W CN 2016097504W WO 2017121128 A1 WO2017121128 A1 WO 2017121128A1
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Prior art keywords
workpiece
stage
workpiece stage
exposure
plane
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PCT/CN2016/097504
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English (en)
Chinese (zh)
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刘永猛
谭久彬
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哈尔滨工业大学
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Priority to GB1719532.2A priority Critical patent/GB2556219B/en
Publication of WO2017121128A1 publication Critical patent/WO2017121128A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass

Definitions

  • the invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for a vector arc return conversion table of a movable magnetic steel magnetic floating double workpiece table based on a rotary balance quality.
  • the lithography machine is one of the most important ultra-precision equipment in the manufacture of very large scale integrated circuits.
  • the workpiece stage which is the key subsystem of the lithography machine, largely determines the resolution, engraving precision and yield of the lithography machine.
  • Yield is one of the main goals of the development of lithography machines. Under the condition of satisfying the resolution and the precision of the engraving, it is the development direction of the workpiece table technology to improve the operating efficiency of the workpiece table and improve the productivity of the lithography machine.
  • the most direct way to improve the efficiency of the workpiece table is to increase the motion acceleration and speed of the workpiece table. However, to ensure the original accuracy, the speed and acceleration cannot be increased without limit.
  • the initial workpiece stage has only one silicon wafer carrier.
  • the lithography machine can only process one silicon wafer at a time, and all processes are serially processed, resulting in low production efficiency. For this reason, a double workpiece stage technology has been proposed, which is also the mainstream technical means for improving the production efficiency of the lithography machine.
  • the double workpiece table technology is provided with two stations and two workpiece stages for exposure and pretreatment on the workpiece table.
  • the exposure and measurement adjustment can be processed in parallel, which greatly shortens the time and improves the production efficiency.
  • the current representative product is the lithography machine based on Twinscan technology or double workpiece table technology of ASML Company of the Netherlands.
  • the double workpiece table technology involves the problem that the workpiece table is switched between two stations.
  • the efficiency of changing the stage directly affects the operating efficiency of the workpiece table of the lithography machine, that is, the yield of the lithography machine.
  • How to reduce the interference of channel change to other systems under the condition of shortening the channel change time has been the focus of research.
  • the workpiece stage is linearly driven in the exposure and pre-processing steps.
  • each workpiece table has two exchangeable units to realize two stages.
  • Chinese patent CN101694560 proposes a two-station exchange system driven by an air bearing support permanent magnet plane motor.
  • the workpiece table is driven by a plane motor and supported by air flotation, which avoids the separation of the drive unit from the workpiece stage during the above-mentioned channel changing process.
  • the problem is that the running resistance of the workpiece table is reduced, the driving current of the planar motor is reduced, and the heat dissipation problem is reduced.
  • the conversion conversion scheme has a unique advantage over the linear conversion scheme. Therefore, the double workpiece stage technology using the return conversion table has appeared.
  • the Chinese patent CN101071275 adopts the method of rotating the whole abutment to realize the transposition of the double workpiece table, which simplifies the system structure, and at the same time, the two workpiece stages move without overlapping areas, thereby avoiding the collision safety hazard.
  • the rotation of the workpiece table by rotating the entire abutment has a large moment of inertia, the difficulty of precise positioning of the high-power rotary motor and the large temperature rise caused by the temperature rise of the system, and the large radius of gyration makes the main structure of the lithography machine significantly increase.
  • Chinese patent CN102495528 uses a rotary adapter to complete the conversion of the two workpiece stages in the abutment center.
  • the change of the stage is divided into three beats, which improves the efficiency of the change of the stage.
  • the structure of the return switch mechanism is complicated and the rotary positioning accuracy is low.
  • the position measurement accuracy of the workpiece table directly affects the positioning accuracy of the workpiece table of the lithography machine, which in turn affects the minimum line width of the lithography machine.
  • the workpiece table has a high speed during the movement process, and the measurement scheme must meet the requirements of high-speed measurement and precision.
  • a plurality of laser interferometers are used to realize the position measurement of a workpiece table, and the laser interferometer has high measurement precision. Long working distance, but measuring light path is too long, very sensitive to errors caused by humidity and air turbulence, and cost high.
  • the present invention proposes a method and a device for a vector arc returning table of a movable magnetic steel magnetic floating double workpiece table based on a rotary balance quality, so as to achieve a rapid arc change of the workpiece table and a reduction of the arc.
  • a method for changing a circular arc of a movable magnetic steel magnetic floating double workpiece table based on a rotary balance quality characterized in that the method comprises the following steps: initial working state, the first workpiece stage of the measuring position is in a pre-aligned state, and the exposure position is The second workpiece table is in an exposed state; the first step is to measure the position of the first workpiece table after the pre-alignment is completed, and the moving magnet is driven to move to the predetermined position of the measuring position changing station A and charged and waited, after the exposure of the second workpiece stage is completed.
  • the moving magnet is driven to move to the predetermined position C of the exposure position; in the second step, the first workpiece stage and the second workpiece stage are moved counterclockwise along the circular path by the planar motor vector control, and the phases of the two workpiece stages during the movement No change occurs, the moving position is measured by the plane grating.
  • the stage is changed.
  • the first workpiece stage is subjected to wafer lithography exposure at the exposure position, and the second workpiece stage is subjected to the wafer upper sheet and the silicon wafer pre-alignment operation at the measurement position; the third step is to measure the second workpiece stage pre-measurement.
  • the moving magnet is driven to move to the predetermined position A' of the measuring position and charged and waited.
  • the moving magnet is driven to move to the predetermined position C of the exposure position; the fourth step, The second workpiece stage and the first workpiece stage move clockwise along the circular arc path by the planar motor vector control, and when the second workpiece stage is driven by the moving magnetic steel to the predetermined position of the exposure position C, the first workpiece stage is driven by the moving magnetic steel.
  • the completion includes two One duty cycle of the sub-switching operation is completed by wireless communication during measurement, exposure and channel change.
  • a movable arc steel magnetic floating double workpiece table vector arc changing device based on the balance balance quality characterized in that the device comprises a support frame, a balance mass, a first workpiece table, a second workpiece table, a wireless charging transmitter,
  • the balance mass is located above the support frame, the macro-motion plane motor stator is mounted on the plane on the balance mass, the lower part of the balance mass is fixed with the rotary shaft, the balance mass and the support frame, the rotary shaft and the support frame.
  • the air-floating support is used, and the balance mass can be rotated around the center of the rotary shaft; the first workpiece stage and the second workpiece stage are arranged above the macro-motion plane motor, and the first workpiece stage and the second workpiece stage are operated at the measurement position.
  • the six-degree-of-freedom magnetic floating micro-motion table consists of Chuck, suction cup, micro-motor, anti-collision frame, macro-motion plane motor mover, plane grating read head, leveling focus sensor, wireless
  • the electric receiver is composed of a wireless communication transceiver
  • the micro-motor is composed of a micro-motion plane motor mover and a gravity compensator mover
  • the suction cup is mounted on Chuck, and four Chucks are installed at four corners.
  • Planar grating read head and four leveling focus sensors Chuck is fixed on the micro motor, and a crash frame is installed around the micro motor.
  • the macro plane motor mover is installed under the crash frame, and the macro plane The motor mover is composed of a staggered arrangement of magnetic steel arrays, and the macro-motion plane motor stator is composed of a coil array of adult-shaped arrays, and the coil arrays have air gaps therebetween.
  • the arc vector changing method is proposed, and the arc vector changing device is designed.
  • the vector channel changing strategy is adopted to optimize the existing multi-beat linear changing table of the double workpiece table into a single-beat fast changing platform, with fewer starts and stops and less stable links.
  • the arc path planning shortens the channel changing path, and the rotary impact is small.
  • the stability time is short, and the real-time measurement system monitoring of the exchange process ensures the macro/micro positioning accuracy during the channel change process, and directly traces the source to the laser wavelength, finally achieving the high efficiency and high precision of the channel change.
  • a method of exchanging workpiece stations for wireless power and wireless communication without cable interference is proposed, and a dual workpiece table device for wireless power and wireless communication is designed.
  • the device Based on the magnetic floating magnetic drive, the device uses wireless power supply and wireless signal transmission to realize wireless transmission and control of two micro-motion station power and communication signals, making the overall structure compact and more importantly eliminating cables and signal lines.
  • the influence of cable disturbance on the positioning accuracy of the double workpiece table enables wireless power supply, wireless communication data transmission and cableless binding. This is the innovation and outstanding advantages of the present invention.
  • a large-stroke magnetic drive method based on a moving magnetic steel maglev plane motor is proposed, and a corresponding vector plane motor device is designed.
  • High-efficiency vector control is realized by composite current drive, which realizes the synthesis and decomposition of six-degree-of-freedom vector force. It has the characteristics of large motion range, high thrust density, good dynamic characteristics, high winding utilization, uniform temperature distribution and small thermal deformation. It adopts dynamic magnetic steel drive, wireless communication data transmission, no cable binding, simple structure and high positioning accuracy, which is the innovation and outstanding advantages of the present invention.
  • Figure 1 is a schematic diagram of a single-beat optimization planning arc quick change schedule.
  • Fig. 2 is a schematic view showing the overall structure of a movable arc steel magnetic floating double workpiece table vector arc changing device based on the balance quality of the rotary balance.
  • Figure 3 is a cross-sectional view of the dual workpiece stage system.
  • Figure 4 is a schematic view showing the structure of a six-degree-of-freedom magnetic floating micro-motion stage.
  • Figure 5 is a schematic diagram of an integrated mechanism of a micro-motion plane motor mover and a gravity compensator.
  • Figure 6 is a schematic diagram of the arrangement of the macro-motion plane motor mover magnetic array
  • Fig. 7 is a schematic view showing the arrangement of a stator coil array of a macro plane motor.
  • the part number 1-support frame; 2-balance mass system; 3-macro plane motor stator; 4a-first workpiece table; 4b-second workpiece table; 5a-measurement plane grating; 5b-exposure plane Grating; 9-air gap; 10-turn axis; 11-measurement position; 12-exposure position; 401-Chuck; 402-suction cup; 403-micro motor; 404-anti-collision frame; 405-macro plane motor mover 406-plane grating readhead; 407-leveling focus sensor; 408-micro-motion plane motor mover; 409-gravity compensator mover; 411-magnetic steel array; 412-coil array; 413-wireless charging receiver ;414-Wireless communication transceiver.
  • a method for changing a circular arc of a movable magnetic steel magnetic floating double workpiece table based on a rotary balance quality characterized in that the method comprises the following steps: initial working state, the first workpiece stage of the measuring position is in a pre-aligned state, and the exposure position is The second workpiece table is in an exposed state; the first step is to measure the position of the first workpiece table after the pre-alignment is completed, and the moving magnet is driven to move to the predetermined position of the measuring position changing station A and charged and waited, after the exposure of the second workpiece stage is completed.
  • the moving magnet is driven to move to the predetermined position C of the exposure position; in the second step, the first workpiece stage and the second workpiece stage are moved counterclockwise along the circular path by the planar motor vector control, and the phases of the two workpiece stages during the movement No change, the position of the motion is measured by a plane grating, when the first workpiece stage is made of a moving magnet
  • the driving motion is moved to the predetermined position C of the exposure position, and the second workpiece table is driven by the moving magnet to the predetermined position D of the measuring position, the table changing is finished, the first workpiece table is subjected to wafer lithography exposure at the exposure position, and the second workpiece stage is
  • the measurement position is performed on the wafer upper sheet and the silicon wafer pre-alignment operation; in the third step, after the second workpiece stage is pre-aligned, the movable magnetic steel is driven to move to the predetermined position of the measurement position change station A' and charged and waited.
  • the moving magnet is driven to move to the predetermined position C of the exposure position; in the fourth step, the second workpiece stage and the first workpiece stage are clockwisely moved along the circular path by the planar motor vector control.
  • the workpiece table is driven by the moving magnet to the predetermined position of the exposure position C.
  • the first workpiece table is driven by the moving magnet to the predetermined position D of the measuring position, the changing of the stage ends, and the second workpiece stage of the exposure position enters the exposure state, and the measuring position
  • the first workpiece stage performs the upper and lower sheets and the pre-alignment operation.
  • the system returns to the initial working state, and a working cycle including two switching operations is completed, and the wireless communication method is used in the process of measurement, exposure and channel change. to make.
  • a movable arc steel magnetic floating double workpiece table vector arc changing device based on the balance balance quality characterized in that the device comprises a support frame 1, a balance mass 2, a first workpiece table 4a, a second workpiece table 4b, and a wireless device
  • the charging transmitter 30 is located above the support frame 1.
  • the macro-plane motor 3 is mounted on a plane on the balancing mass 2, and the lower portion of the balancing mass 2 is fixed to the rotating shaft 10, and the mass is balanced.
  • the balance mass 2 can be rotated around the center of the rotary shaft 10; the first workpiece table 4a and the second workpiece table 4b are arranged in the macro motion plane Above the motor stator 3, the first workpiece stage 4a and the second workpiece stage 4b run between the measurement position 11 and the exposure position 12, and the measurement bit planes are respectively mounted on the upper planes of the first workpiece stage 4a and the second workpiece stage 4b.
  • the grating 5a and the exposure plane grating 5b; the first workpiece stage 4a and the second workpiece stage 4b are six-degree-of-freedom magnetic floating micro-motion stage, and the six-degree-of-freedom magnetic floating micro-motion stage is composed of Chuck401, suction cup 402, micro-motor 403, and Impact frame 404, macro motion plane motor 405, a planar grating read head 406, a leveling focus sensor 407, a wireless charging receiver 413, a wireless communication transceiver 414, the micro motor 403 is integrated by the micro motion plane motor mover 408 and the gravity compensator mover 409 Constructed together, the suction cup 402 Mounted on Chuck 401, four plane grating readheads 406 and four leveling focus sensors 407 are mounted on the four corners of Chuck 401.
  • Chuck 401 is fixed on the micro motor 403, and a crash frame 404 is installed around the micro motor 403.
  • the macro plane motor mover 405 is mounted under the crash frame 404, the macro plane motor mover 405 is formed by the magnetic steel array 411 staggered, and the macro plane motor stator 3 is formed by the coil array 412 in an adult shape.
  • An air gap 9 is included between the coil arrays 412.
  • the workflow of the present invention is as follows:
  • the first workpiece stage 4a is driven by the planar motor to the change position A, waiting for the second workpiece stage 4b to complete exposure at the exposure position 12, and the second workpiece stage 4b is exposed by the plane motor after the exposure is completed.
  • the driving motion is changed to the changing position B, and then the first workpiece table 4a and the second workpiece table 4b are rotated counterclockwise by the plane motor vector control to complete the channel changing operation; after the channel changing is completed, the first workpiece table 4a is exposed to the exposure position.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un procédé et un dispositif de commutation d'étage d'arc par vecteur de double étage de pièce à usiner à sustentation magnétique par acier magnétique dynamique basés sur une masse d'équilibrage rotative, qui se rapportent au domaine technique des appareils de fabrication de semi-conducteurs. Le dispositif comprend un cadre de support (1), un bloc de masse d'équilibrage (2), un arbre rotatif (10), des étages de pièce à usiner à sustentation magnétique (4a, 4b), un dispositif de mesure d'étage de pièce à usiner, et un dispositif d'entraînement d'étage de pièce à usiner. Deux étages de pièce à usiner travaillent entre un emplacement de mesure (11) et un emplacement d'exposition (12). Des réseaux plans (5a, 5b) servent à mesurer les positions des étages de pièce à usiner. Les étages de pièce à usiner sont entraînés à l'aide d'un moteur plan à sustentation magnétique. Pendant le processus de commutation de double étage de pièce à usiner, le moteur plan sert à entraîner les deux étages de pièce à usiner, de manière à obtenir une commutation d'étage d'arc à un seul battement rapide. Le procédé et le dispositif résolvent le problème posé par un système de commutation d'étage existant qui présente de nombreux battements, une piste longue, de nombreuses liaisons arythmiques et une longue durée de stabilisation, ce qui permet de réduire les liaisons de commutation d'étage, de raccourcir le temps de commutation d'étage, et d'améliorer le rendement d'une machine de photogravure.
PCT/CN2016/097504 2016-01-14 2016-08-31 Procédé et dispositif de commutation d'étage d'arc par vecteur de double étage de pièce à usiner à sustentation magnétique par acier magnétique dynamique basés sur une masse d'équilibrage rotative WO2017121128A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1719532.2A GB2556219B (en) 2016-01-14 2016-08-31 Vector arc revolve transposition method for moving magnetic steel magnetic levitated dual-table system based on revolve balance mass and device thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610023027.1 2016-01-14
CN201610023027.1A CN105629676A (zh) 2016-01-14 2016-01-14 基于回转平衡质量的动磁钢磁浮双工件台矢量圆弧换台方法及装置

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WO2017121128A1 true WO2017121128A1 (fr) 2017-07-20

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CN105629676A (zh) * 2016-01-14 2016-06-01 哈尔滨工业大学 基于回转平衡质量的动磁钢磁浮双工件台矢量圆弧换台方法及装置
CN109254502B (zh) * 2018-11-14 2019-07-16 哈尔滨工业大学 基于气磁悬浮和动磁钢的扫描曝光装置
CN109870881B (zh) * 2019-03-20 2021-06-15 哈尔滨工业大学 宏微组合式长行程精密运动平台
CN111830789B (zh) * 2019-04-17 2021-07-02 上海微电子装备（集团）股份有限公司 平衡质量装置及光刻设备
CN112130425B (zh) * 2020-09-30 2022-10-14 上海集成电路研发中心有限公司 一种光刻装置
CN112902832B (zh) * 2021-01-19 2023-08-25 上海集成电路装备材料产业创新中心有限公司 柱形光栅干涉仪及读数头总成装置
CN113745138B (zh) * 2021-09-03 2024-03-22 上海隐冠半导体技术有限公司 磁浮装置和微动台

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