WO2017121127A1 - 基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法及装置 - Google Patents

基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法及装置 Download PDF

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WO2017121127A1
WO2017121127A1 PCT/CN2016/097503 CN2016097503W WO2017121127A1 WO 2017121127 A1 WO2017121127 A1 WO 2017121127A1 CN 2016097503 W CN2016097503 W CN 2016097503W WO 2017121127 A1 WO2017121127 A1 WO 2017121127A1
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workpiece
stage
workpiece stage
exposure
plane
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PCT/CN2016/097503
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English (en)
French (fr)
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刘永猛
谭久彬
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哈尔滨工业大学
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Definitions

  • the invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for a vector arc return conversion table of a movable magnetic steel magnetic floating double workpiece table based on planar grating measurement.
  • the lithography machine is one of the most important ultra-precision equipment in the manufacture of very large scale integrated circuits.
  • the workpiece stage which is the key subsystem of the lithography machine, largely determines the resolution, engraving precision and yield of the lithography machine.
  • Yield is one of the main goals of the development of lithography machines. Under the condition of satisfying the resolution and the precision of the engraving, it is the development direction of the workpiece table technology to improve the operating efficiency of the workpiece table and improve the productivity of the lithography machine.
  • the most direct way to improve the efficiency of the workpiece table is to increase the motion acceleration and speed of the workpiece table. However, to ensure the original accuracy, the speed and acceleration cannot be increased without limit.
  • the initial workpiece stage has only one silicon wafer carrier.
  • the lithography machine can only process one silicon wafer at a time, and all processes are serially processed, resulting in low production efficiency. For this reason, a double workpiece stage technology has been proposed, which is also the mainstream technical means for improving the production efficiency of the lithography machine.
  • the double workpiece table technology is provided with two stations and two workpiece stages for exposure and pretreatment on the workpiece table.
  • the exposure and measurement adjustment can be processed in parallel, which greatly shortens the time and improves the production efficiency.
  • the current representative product is the lithography machine based on Twinscan technology or double workpiece table technology of ASML Company of the Netherlands.
  • the double workpiece table technology involves the problem that the workpiece table is switched between two stations.
  • the efficiency of changing the stage directly affects the operating efficiency of the workpiece table of the lithography machine, that is, the yield of the lithography machine.
  • How to reduce the interference of channel change to other systems under the condition of shortening the channel change time has been the focus of research.
  • the workpiece stage is linearly driven in the exposure and pre-processing steps.
  • each workpiece table has two exchangeable units to realize two stages.
  • Chinese patent CN101694560 proposes a two-station exchange system driven by an air bearing support permanent magnet plane motor.
  • the workpiece table is driven by a plane motor and supported by air flotation, which avoids the separation of the drive unit from the workpiece stage during the above-mentioned channel changing process.
  • the problem is that the running resistance of the workpiece table is reduced, the driving current of the planar motor is reduced, and the heat dissipation problem is reduced.
  • the conversion conversion scheme has a unique advantage over the linear conversion scheme. Therefore, the double workpiece stage technology using the return conversion table has appeared.
  • the Chinese patent CN101071275 adopts the method of rotating the whole abutment to realize the transposition of the double workpiece table, which simplifies the system structure, and at the same time, the two workpiece stages move without overlapping areas, thereby avoiding the collision safety hazard.
  • the rotation of the workpiece table by rotating the entire abutment has a large moment of inertia, the difficulty of precise positioning of the high-power rotary motor and the large temperature rise caused by the temperature rise of the system, and the large radius of gyration makes the main structure of the lithography machine significantly increase.
  • Chinese patent CN102495528 uses a rotary adapter to complete the conversion of the two workpiece stages in the abutment center.
  • the change of the stage is divided into three beats, which improves the efficiency of the change of the stage.
  • the structure of the return switch mechanism is complicated and the rotary positioning accuracy is low.
  • the position measurement accuracy of the workpiece table directly affects the positioning accuracy of the workpiece table of the lithography machine, which in turn affects the minimum line width of the lithography machine.
  • the workpiece table has a high speed during the movement process, and the measurement scheme must meet the requirements of high-speed measurement and precision.
  • a plurality of laser interferometers are used to realize the position measurement of a workpiece table, and the laser interferometer has high measurement precision. Long working distance, but measuring light path is too long, very sensitive to errors caused by humidity and air turbulence, and cost Higher.
  • the present invention proposes a method and a device for a vector arc returning table of a movable magnetic steel magnetic floating double workpiece table based on planar grating measurement, so as to achieve a single arc fast arc changing platform of the workpiece table and reduce The purpose of changing the stage, shortening the time of changing the stage, and effectively improving the productivity of the lithography machine.
  • the object of the present invention is achieved by a method for measuring a circular arc table of a movable magnetic steel maglev dual workpiece stage based on a planar grating, the method comprising the following steps: initial working state, the first workpiece stage of the measuring position is pre-aligned State, the second workpiece stage of the exposure position is in an exposure state; the first step is to measure the position of the first workpiece stage after the pre-alignment is completed, and the moving magnet is driven to move to the predetermined position of the measurement position changing station A and charged and waited, and the exposure position is second.
  • the moving magnet is driven to move to the predetermined position of the exposure position C; in the second step, the first workpiece stage and the second workpiece stage are moved counterclockwise along the circular path by the planar motor vector control, during the movement, two The phase of the workpiece table does not change, and the moving position is measured by the plane grating.
  • the first workpiece table is driven by the moving magnet to the predetermined position of the exposure position C
  • the second workpiece table is driven by the moving magnet to the predetermined position of the measuring position.
  • the stage When D is changed, the stage is finished, the first workpiece stage is exposed by the wafer in the exposure position, and the second workpiece stage is in the measurement position for the wafer upper wafer and the silicon wafer pre-alignment operation; the third step is to measure After the second workpiece stage is pre-aligned, the moving magnet is driven to move to the predetermined position of the measuring position changing station A' and charged and waited. After the exposure of the first workpiece stage is completed, the moving magnet is driven to move to the predetermined position of the exposure position.
  • the second workpiece stage and the first workpiece stage move clockwise along the circular arc path by the planar motor vector control, and when the second workpiece stage is driven by the moving magnetic steel to the exposure position predetermined position C, the first workpiece stage
  • the moving magnet is driven to move to the predetermined position D of the measuring position, the changing of the stage ends, the second workpiece stage of the exposure position enters the exposure state, and the first workpiece stage of the measuring position is subjected to the upper and lower sheets and the pre-alignment operation, and the system returns to the initial work. State, completed a work cycle with two channel changes, completed by wireless communication during measurement, exposure and channel change.
  • a vector arc changing device for measuring a moving magnetic steel magnetic floating double workpiece table based on a plane grating, the device comprising a supporting frame, a balancing mass, a first workpiece table, a second workpiece table, a wireless charging transmitter, the balance quality
  • the block is located above the support frame, the macro-motion plane motor stator is mounted on a plane on the balance mass, and the first workpiece stage and the second workpiece stage are disposed above the macro-motion plane motor stator, the first workpiece stage and the second workpiece stage.
  • a measuring plane plane grating and an exposure bit plane grating are respectively mounted on the upper surface of the first workpiece stage and the second workpiece stage; the support frame is moved in parallel by the plane leaf spring and the electromagnetic damper
  • the compensation mechanism is connected to the balance mass, and the planar leaf spring is composed of a pair of X-direction leaf springs, a pair of Y-direction leaf springs, a Z-direction leaf spring and an Rz flexible hinge, and
  • the copper plate is installed in the strong magnetic field of the air gap, and the copper plate is fixed on the support frame and the damper
  • the back plate and the balance mass are fixed, and the X, Y-direction and Rz rotation can be generated with respect to the upper and lower back plates;
  • the first workpiece table and the second workpiece table are six-degree-of-freedom maglev micro-motion table, the six free
  • the magnetic floating micro-motion stage is composed of a Chuck, a suction cup, a micro-motor, a crash frame, a macro-motion plane motor mover, a plane grating read head, a leveling focus sensor, a wireless charging receiver, and a wireless communication transceiver.
  • the moving motor is composed of a micro-motion plane motor mover and a gravity compensator mover.
  • the suction cup is mounted on Chuck, and four flat grating readout heads and four leveling focus sensors are mounted on the four corners of Chuck.
  • Chuck is fixed on the micro-motor, and a crash frame is installed around the micro-motor.
  • the macro-motion plane motor mover is installed under the crash frame, and the macro-motion plane motor mover is composed of a magnetic steel array staggered. Moving plane motor stator Coil array are arranged in a herringbone configuration.
  • the arc vector changing method is proposed, and the arc vector changing device is designed.
  • Vector exchange policy The existing multi-beat linear change platform of the double workpiece table is optimized to be a single-beat fast change platform, with fewer starts and stops and less stable links.
  • the arc path planning shortens the channel change path, and the rotary impact is small and the stabilization time is short.
  • the exchange process real-time measurement system monitoring ensures the macro/micro positioning accuracy during the channel change process, and directly traces the source to the laser wavelength, finally achieving the high efficiency and high precision of the channel change. This is one of the innovations and outstanding advantages of the present invention.
  • a method of exchanging workpiece stations without cable interference for wireless power and wireless communication is proposed, and a dual workpiece table device for wireless power supply and wireless communication is designed.
  • the device Based on the magnetic floating magnetic drive, the device uses wireless power supply and wireless signal transmission to realize wireless transmission and control of two micro-motion station power and communication signals, making the overall structure compact and more importantly eliminating cables and signal lines.
  • the influence of cable disturbance on the positioning accuracy of the double workpiece table enables wireless power supply, wireless communication data transmission and cableless binding. This is the innovation and outstanding advantage of the present invention.
  • High-efficiency vector control is realized by composite current drive, which realizes the synthesis and decomposition of six-degree-of-freedom vector force. It has the characteristics of large motion range, high thrust density, good dynamic characteristics, high winding utilization, uniform temperature distribution and small thermal deformation. It adopts dynamic magnetic steel drive, wireless communication data transmission, no cable binding, simple structure and high positioning accuracy, which is the innovation and outstanding advantages of the present invention.
  • a measurement method based on planar grating is proposed, and a corresponding planar grating measuring device is designed.
  • the laser interferometer system satisfies the measurement requirements of the lithography system at the measurement speed, and because the measurement noise is small, the measurement accuracy is higher than that of the laser interferometer, especially avoiding the plane reflection on the chuck platform.
  • the manufacturing difficulty and high cost and quality of the right angle mirror of the mirror are too high, which is the innovation and outstanding advantages of the present invention.
  • the passive compensation method and the impulse balance method are proposed, and the passive compensation mechanism and the balance mass mechanism based on the parallel combination of the planar leaf spring and the electromagnetic damper are designed.
  • the mechanism can achieve a balanced mass X direction, Y-direction, Z-direction, and Rz motion compensation, which reduces the complexity of the mechanism and reduces the difficulty of control and implementation with respect to the active compensation structure, which is the innovation point and the outstanding advantage of the present invention.
  • Figure 1 is a schematic diagram of a single-beat optimization planning arc quick change schedule.
  • Fig. 2 is a schematic view showing the overall structure of a vector arc changing device for measuring a moving magnetic steel magnetic floating double workpiece table based on a plane grating.
  • Figure 3 is a cross-sectional view of the dual workpiece stage system.
  • FIG. 4 is a schematic view showing the assembly structure of the motion compensation mechanism and the balance mass.
  • Figure 5 is a schematic view of a planar leaf spring structure.
  • Figure 6 is a schematic view of an electromagnetic damping structure.
  • Fig. 7 is a schematic view showing the arrangement of magnetic steel of the electromagnetic damper.
  • Figure 8 is a schematic view showing the structure of a six-degree-of-freedom magnetic floating micro-motion stage.
  • Figure 9 is a schematic diagram of an integrated mechanism of a micro-motion plane motor mover and a gravity compensator.
  • Fig. 10 is a schematic view showing the arrangement of a macro-motion plane motor mover magnetic rigid array.
  • Figure 11 is a schematic view showing the arrangement of the stator coil array of the macro plane motor.
  • the part number 1-support frame; 2-balance mass system; 3-macro plane motor stator; 4a-first workpiece table; 4b-second workpiece table; 5a-measurement plane grating; 5b-exposure plane Grating; 11-measurement position; 12-exposure position; 13-parallel leaf spring; 14-electromagnetic damper; 21-damper upper back plate; 22-copper plate; 23-stainless steel column; 24a-Y permanent magnet array; 24b-X permanent magnet array; 25-damper lower back plate; 26-X direction leaf spring; 27-Y direction leaf spring; 28-Z direction leaf spring; 29-Rz flexible hinge; 401-Chuck; 402-suction cup ; 403-micro-motor; 404-crash box; 405-macro plane motor mover; 406-plane grating readhead; 407-leveling focus sensor; 408-micro-motion plane motor mover; 409-gravity compensation Movables; 411-magnetic steel array; 41
  • a method for measuring a circular arc of a moving coil maglev double workpiece table based on a planar grating comprising the following steps: initial working state, the first workpiece stage of the measuring position is Pre-aligned state, the second workpiece stage of the exposure position is in an exposure state; the first step is to measure the position of the first workpiece table after the pre-alignment is completed, and the moving magnet is driven to move to the predetermined position of the measuring position changing station A and charged and waited, the exposure After the second workpiece stage is exposed, the moving magnet is driven to move to the predetermined position C of the exposure position; in the second step, the first workpiece stage and the second workpiece stage are moved counterclockwise along the circular path by the planar motor vector control during the movement process.
  • the phase of the two workpiece stages does not change, and the moving position is measured by the plane grating.
  • the first workpiece stage is driven by the moving magnet to the predetermined position of the exposure position C
  • the second workpiece stage is driven by the moving magnet to measure
  • the position is at the predetermined position D
  • the channel change is completed, the first workpiece stage is subjected to wafer lithography exposure at the exposure position, and the second workpiece stage is subjected to the wafer upper sheet and the silicon wafer pre-alignment at the measurement position.
  • the third step after the second workpiece table is pre-aligned, the moving magnet is driven to move to the predetermined position of the measuring position changing station A' and charged and waited.
  • the magnetic field is moved.
  • the steel drive moves to the exposure position to change the predetermined position C; in the fourth step, the second workpiece stage and the first workpiece stage move clockwise along the circular path by the planar motor vector control, and when the second workpiece stage is driven by the moving magnetic steel to The exposure position is at a predetermined position C.
  • the table change is finished, the second workpiece stage of the exposure position enters the exposure state, and the first workpiece stage of the measurement position is subjected to the upper and lower sheets and the pre-alignment.
  • the quasi-operation when the system returns to the initial working state, completes a working cycle including two switching operations, and uses wireless communication in the process of measurement, exposure and channel change.
  • a vector arc changing device for measuring a moving magnetic steel magnetic floating double workpiece table based on a plane grating, the device comprising a supporting frame 1, a balancing mass 2, a first workpiece table 4a, a second workpiece table 4b, and a wireless charging transmitter 30
  • the balance mass 2 is located above the support frame 1
  • the macro plane motor stator 3 is mounted on a plane on the balance mass 2
  • the first workpiece stage 4a and the second workpiece stage 4b are disposed on the macro plane motor
  • the first workpiece stage 4a and the second workpiece stage 4b are disposed above the macro-motion plane motor stator 3
  • the first workpiece stage 4a and the second workpiece stage 4b are operated at the measurement position 11 and the exposure position.
  • a measurement plane grating 5a and an exposure plane grating 5b are respectively mounted on the upper surface of the first workpiece stage 4a and the second workpiece stage 4b;
  • the support frame 1 is composed of a planar leaf spring 13 and an electromagnetic damper 14 in parallel
  • the motion compensation mechanism is coupled to the balance mass 2, which is composed of a pair of X-direction leaf springs 26, a pair of Y-direction leaf springs 27, a Z-direction leaf spring 28, and an Rz flexible hinge 29.
  • the electromagnetic damper 14 is composed of a damper upper back plate 21, a damper lower back plate 25, a Y-direction permanent magnet array 24a and an X-direction permanent magnet array 24b, a copper plate 22 and a stainless steel column 23, wherein the damper upper back plate 21
  • the damper lower back plate 25 is connected by a stainless steel column 23, and the Y, X-direction permanent magnet arrays 24a, 24b are mounted between the damper and the lower back plates 21, 25, and form a strong magnetic field between the air gaps.
  • a copper plate 22 is installed in the strong magnetic field, and the copper plate 22 is fixed on the support frame 1, and the back plate 21 on the damper is The balance mass 2 is fixed, and the X, Y direction translation and Rz rotation can be generated with respect to the upper and lower back plates 21, 25;
  • the first workpiece stage 4a and the second workpiece stage 4b are six-degree-of-freedom magnetic floating micro-motion stage,
  • the six-degree-of-freedom magnetic floating micro-motion stage is composed of a Chuck 401, a suction cup 402, a micro-motor 403, a crash frame 404, a macro-motion plane motor mover 405, a plane grating read head 406, a leveling focus sensor 407, and a wireless charging receiver. 413.
  • the wireless communication transceiver 414 is composed of a micro-motion plane motor mover 408 and a gravity compensator mover 409.
  • the suction cup 402 is mounted on the Chuck 401, and the Chuck 401 has four corners.
  • Four plane grating read heads 406 and four leveling focus sensors 407 are mounted thereon, and the Chuck 401 is fixed on the micro motor 403.
  • a crash frame 404 is mounted around the micro motor 403.
  • the sub-405 is mounted below the crash frame 404, the macro-motion plane motor mover 405 is formed by staggered arrangement of the magnetic steel arrays 411, and the macro-motion planar motor stator 3 is constituted by a coil array 412 in an adult-shaped arrangement.
  • the working flow of the invention is as follows: after the pre-alignment of the measuring position 11 is completed, the first workpiece stage 4a is driven by the planar motor to the changing position A, waiting for the second workpiece stage 4b to complete the exposure at the exposure position 12, the second work After the exposure of the table 4b is completed by the plane motor to the table changing position B, the first workpiece table 4a and the second workpiece table 4b are rotated counterclockwise along the circular path by the plane motor vector control to complete the channel changing operation; The first workpiece stage 4a is moved toward the exposure position 12 to expose the exposure position 12, and the second workpiece stage 4b is moved toward the measurement position 11 to perform the upper sheet and pre-alignment operation at the measurement position 11; the silicon wafer pre-alignment is completed first.
  • the second workpiece stage 4b moves to the measurement position changing table position A', waits for the first workpiece stage 4a to complete the exposure and moves to the changing position B', and then the second workpiece stage 4b and the first workpiece stage 4a are controlled by the planar motor vector Clockwise movement along the circular arc path completes the second change of the stage; after the completion of the change, the first workpiece stage 4a moves toward the measurement position 11, and the second workpiece stage 4b moves to the exposure position 12, thus completing a complete duty cycle. .

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Abstract

基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法及装置，属于半导体制造装备技术。这种装置包括支撑框架（1）、平衡质量块（2）、无线充电和无线通讯磁浮工件台（4a、4b）、工件台测量装置、工件台驱动装置，两个工件台工作于测量位（11）和曝光位（12）之间，采用平面光栅（5a、5b）对工件台位置进行测量，采用平面片簧（13）和电磁阻尼器（14）组成的被动补偿结构对平衡质量块（2）进行运动补偿，工件台采用磁悬浮平面电机驱动，双工件台交换过程中，采用平面电机驱动两个工件台实现单节拍弧线快速换台。这种方法和装置解决了现有换台方案节拍多、轨迹长、起停环节多、稳定时间长、线缆扰动大问题，减少了换台环节，缩短了换台时间，提高了光刻机的产率。

Description

基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法及装置 技术领域
本发明属于半导体制造装备技术领域，主要涉及一种基于平面光栅测量的动磁钢磁浮双工件台矢量圆弧回转换台方法及装置。
背景技术
光刻机是极大规模集成电路制造中重要的超精密装备之一。作为光刻机关键子系统的工件台在很大程度上决定了光刻机的分辨率、套刻精度和产率。
产率是光刻机发展的主要追求目标之一。在满足分辨率和套刻精度的条件下，提高工件台运行效率进而提高提高光刻机产率是工件台技术的发展方向。提高工件台运行效率最直接的方式就是提高工件台的运动加速度和速度，但是为保证原有精度，速度和加速度不能无限制提高。最初的工件台只有一个硅片承载装置，光刻机一次只能处理一个硅片，全部工序串行处理，生产效率低。为此有人提出了双工件台技术，这也是目前提高光刻机生产效率的主流技术手段。双工件台技术在工件台上设有曝光、预处理两个工位和两个工件台，曝光和测量调整可并行处理，大大缩短了时间，提高了生产效率。目前的代表产品为荷兰ASML公司基于Twinscan技术即双工件台技术的光刻机。
提高双工件台的运行效率是目前光刻机工件台技术的发展目标之一。双工件台技术的牵扯到工件台在两个工位之间切换的问题，换台效率直接影响到光刻机工件台的运行效率即光刻机的产率。如何在尽可能缩短换台时间的条件下减小换台对其他系统的干扰一直是研究的重点。在传统双台切换过程中，工件台在曝光和预处理工序中一样为直线驱动，双台专利US2001/0004105A1和W098/40791中，每个工件台有两个可交换配合的单元来实现双台的交换，在不 提高工件台运动速度的前提下提高了产率，但由于工件台与导轨之间采用耦合连接方式，在换台过程中工件台与驱动单元会出现短暂的分离，对工件台的定位精度产生较大影响。同时运动单元和导轨较长，运动质量较大，对于运动速度和加速度的提高都产生不利影响。中国专利CN101609265提出了一种平面电机驱动的硅片台多台交换系统，平面电机定子设置在基台顶部，动子设置在硅片台底部，相对于直线电机驱动不存在工件台和驱动单元的分离；中国专利CN101694560中提出了一种采用气浮支撑永磁平面电机驱动的双台交换系统，工件台采用平面电机驱动并通过气浮支撑，避免了前述换台过程中驱动单元与工件台分离问题，减小了工件台运行阻力，减小了平面电机驱动电流，减小了散热问题。
上述专利换台时采用直线换台方案，回转换台方案较直线换台方案有独特优势，因此出现了采用回转换台的双工件台技术。中国专利CN101071275采用回转整个基台的方式实现双工件台的换位，简化了系统结构，同时两个工件台运动无重叠区域，避免了碰撞安全隐患。但是通过回转整个基台实现工件台换位存在转动惯量大，大功率回转电机精密定位困难和发热量大引起系统温升等问题，同时回转半径大，使光刻机主机结构显著增大。中国专利CN102495528在基台中心采用一种回转转接台完成双工件台换台，换台分为三个节拍，提高了换台效率，但回转换台机构结构复杂，回转定位精度较低。
工件台的位置测量精度直接影响到光刻机工件台的定位精度，进而影响到光刻机的最小线宽。工件台在运动过程中速度较大，测量方案必须满足高速测量和精度要求，在美国专利US6498350B2和US20100279232A1中采用多个激光干涉仪来实现一个工件台的位置测量，采用激光干涉仪测量精度高、工作距离长，但是测量光路过长，对湿度和空气紊流所引起误差非常敏感，而且成本 较高。
发明内容
针对上述现有技术的不足，本发明提出了一种基于平面光栅测量的动磁钢磁浮双工件台矢量圆弧回转换台方法及装置，达到实现工件台单节拍快速弧线换台、减少换台环节、缩短换台时间、有效提高了光刻机产率的目的。
本发明的目的是这样实现的：一种基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法，该方法包括以下步骤：初始工作状态，测量位第一工件台处于预对准状态，曝光位第二工件台处于曝光状态；第一步，测量位第一工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A并充电和等待，曝光位第二工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C；第二步，第一工件台与第二工件台通过平面电机矢量控制沿圆弧轨迹逆时针运动，在运动过程中，两个工件台的相位不发生变化，运动位置由平面光栅进行测量，当第一工件台由动磁钢驱动运动到曝光位预定位置C、第二工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，第一工件台在曝光位进行硅片光刻曝光，第二工件台在测量位进行硅片上片及硅片预对准操作；第三步，测量位第二工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A'并充电和等待，曝光位第一工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C；第四步，第二工件台与第一工件台通过平面电机矢量控制沿圆弧轨迹顺时针运动，当第二工件台由动磁钢驱动运动到曝光位预定位置C、第一工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，曝光位第二工件台进入曝光状态，测量位第一工件台进行上下片及预对准操作，此时系统回到初始工作状态，完成了包含两次换台操作的一个工作周期，在测量、曝光和换台过程中采用无线通讯方式完成。
一种基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台装置，该装置包括支撑框架、平衡质量块、第一工件台、第二工件台、无线充电发射器，所述平衡质量块位于支撑框架上方，宏动平面电机定子安装在平衡质量块上的平面上，第一工件台和第二工件台配置在宏动平面电机定子上方，所述第一工件台和第二工件台运行于测量位和曝光位之间，在第一工件台和第二工件台上平面上分别安装测量位平面光栅和曝光位平面光栅；支撑框架通过由平面片簧和电磁阻尼器并行组成的运动补偿机构与平衡质量块相连接，所述平面片簧由1对X向片簧、1对Y向片簧、1个Z向片簧和1个Rz柔性铰链组成，电磁阻尼器由阻尼器上背板、阻尼器下背板、Y向永磁铁阵列和X向永磁铁阵列、紫铜板和不锈钢立柱装配构成，其中阻尼器上背板和阻尼器下背板通过不锈钢立柱相连接，Y、X向永磁铁阵列安装于阻尼器上、下背板之间，并在气隙间构成强磁场，在气隙强磁场中安装紫铜板，紫铜板固定于支撑框架上，阻尼器上背板与平衡质量块固定，相对于上、下背板紫铜板可以产生X、Y向平动和Rz转动；第一工件台和第二工件台为六自由度磁浮微动台，所述六自由度磁浮微动台由Chuck、吸盘、微动电机、防撞框、宏动平面电机动子、平面光栅读数头、调平调焦传感器、无线充电接收器、无线通讯收发器组成，所述微动电机由微动平面电机动子与重力补偿器动子集成在一起构成，所述吸盘安装在Chuck上，Chuck四个角上安装有四个平面光栅读数头和四个调平调焦传感器，Chuck固定在微动电机上，在微动电机四周安装有防撞框，所述宏动平面电机动子安装在防撞框下方，宏动平面电机动子由磁钢阵列交错排布构成，宏动平面电机定子由线圈阵列成人字形排布构成。
本发明具有以下创新点和突出优点：
1)提出圆弧矢量换台方法，并设计了圆弧矢量换台装置。采用矢量换台策 略将双工件台现有的多节拍直线换台优化为单节拍快速换台，起停次数少、稳定环节少；同时采用弧线轨迹规划缩短了换台路径，回转冲击小、稳定时间短，同时交换过程实时测量系统监测，确保换台过程中宏/微定位精度，直接溯源到激光波长，最终实现了换台的高效率和高精度两个特性的兼顾。这是本发明的创新点和突出优点之一。
2)提出了无线通电和无线通信的无线缆干扰的工件台交换方法，并设计了无线通电和无线通信的双工件台装置。该装置在磁浮磁驱的基础上，采用无线通电和无线信号传输方式，实现两个微动台电源和通讯信号的无线传输和控制，使得整体结构紧凑，更重要的是消除了电缆和信号线缆扰动对双工件台定位精度的影响，实现了无线供电、无线通信数据的传输和无线缆束缚。这是本发明的创新点和突出优点之二。
3)提出基于动磁钢磁浮平面电机驱动方法，并设计了相应的矢量平面电机装置。采用复合电流驱动实现高功效矢量控制，实现六自由度矢量力的合成和分解，具有运动范围大、推力密度大、动态特性好、绕组利用率高、温度分布均匀、热变形小等特点，同时采用动磁钢驱动、无线通信数据传输，无线缆束缚，结构简单，定位精度高，这是本发明的创新点和突出优点之三。
4)提出基于平面光栅的测量方法，并设计了相应的平面光栅测量装置。和平面光栅测量系统相比较，激光干涉仪系统在测量速度上满足了光刻机系统的测量需求，同时由于其测量噪声小，测量精度高于激光干涉仪，特别是回避了chuck台上平面反射镜的直角反射镜的制造难度与高成本和质量、惯量过大的风险，这是本发明的创新点和突出优点之四。
5)提出被动补偿方法和冲量平衡方法，并设计了基于平面片簧和电磁阻尼器并行组成的被动补偿机构和平衡质量机构。该机构可以实现平衡质量块X向、 Y向、Z向、Rz运动补偿，相对于主动补偿结构，降低了机构的复杂程度，减小了控制和实施难度，这是本发明的创新点和突出优点之五。
附图说明
图1是单节拍优化规划弧线快速换台流程示意图。
图2是基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台装置总体结构示意图。
图3是双工件台系统的剖视图。
图4是运动补偿机构与平衡质量块装配结构示意图。
图5是平面片簧结构示意图。
图6是电磁阻尼结构示意图。
图7是电磁阻尼器磁钢排布示意图。
图8是六自由度磁浮微动台结构示意图。
图9是微动平面电机动子与重力补偿器集成机构示意图。
图10是宏动平面电机动子磁刚阵列排布示意图。
图11是宏动平面电机定子线圈阵列排布示意图。
图中件号：1-支撑框架；2-平衡质量系统；3-宏动平面电机定子；4a-第一工件台；4b-第二工件台；5a-测量位平面光栅；5b-曝光位平面光栅；11-测量位；12-曝光位；13-平行片簧；14-电磁阻尼器；21-阻尼器上背板；22-紫铜板；23-不锈钢立柱；24a-Y向永磁铁阵列；24b-X向永磁铁阵列；25-阻尼器下背板；26-X向片簧；27-Y向片簧；28-Z向片簧；29-Rz柔性铰链；401-Chuck；402-吸盘；403-微动电机；404-防撞框；405-宏动平面电机动子；406-平面光栅读数头；407-调平调焦传感器；408-微动平面电机动子；409-重力补偿器动子；411-磁钢阵列；412-线圈阵列；413-无线充电接收器；414-无线通讯收发器。
具体实施方式
下面结合附图对本发明实施方案作进一步详细说明：一种基于平面光栅测量动线圈磁浮双工件台矢量圆弧换台方法，该方法包括以下步骤：初始工作状态，测量位第一工件台处于预对准状态，曝光位第二工件台处于曝光状态；第一步，测量位第一工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A并充电和等待，曝光位第二工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C；第二步，第一工件台与第二工件台通过平面电机矢量控制沿圆弧轨迹逆时针运动，在运动过程中，两个工件台的相位不发生变化，运动位置由平面光栅进行测量，当第一工件台由动磁钢驱动运动到曝光位预定位置C、第二工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，第一工件台在曝光位进行硅片光刻曝光，第二工件台在测量位进行硅片上片及硅片预对准操作；第三步，测量位第二工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A'并充电和等待，曝光位第一工件台曝光完毕后由动磁钢驱动运动到曝光位换台预定位置C；第四步，第二工件台与第一工件台通过平面电机矢量控制沿圆弧轨迹顺时针运动，当第二工件台由动磁钢驱动运动到曝光位预定位置C、第一工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，曝光位第二工件台进入曝光状态，测量位第一工件台进行上下片及预对准操作，此时系统回到初始工作状态，完成了包含两次换台操作的一个工作周期，在测量、曝光和换台过程中采用无线通讯方式完成。
一种基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台装置，该装置包括支撑框架1、平衡质量块2、第一工件台4a、第二工件台4b，无线充电发射器30，所述平衡质量块2位于支撑框架1上方，宏动平面电机定子3安装在平衡质量块2上的平面上，第一工件台4a和第二工件台4b配置在宏动平面电机 定子(3)上方，所述第一工件台4a和第二工件台4b配置在宏动平面电机定子3上方，所述第一工件台4a和第二工件台4b运行于测量位11和曝光位12之间，在第一工件台4a和第二工件台4b上平面上分别安装测量位平面光栅5a和曝光位平面光栅5b；支撑框架1通过由平面片簧13和电磁阻尼器14并行组成的运动补偿机构与平衡质量块2相连接，所述平面片簧13由1对X向片簧26、1对Y向片簧27、1个Z向片簧28和1个Rz柔性铰链29组成，电磁阻尼器14由阻尼器上背板21、阻尼器下背板25、Y向永磁铁阵列24a和X向永磁铁阵列24b、紫铜板22和不锈钢立柱23装配构成，其中阻尼器上背板21和阻尼器下背板25通过不锈钢立柱23相连接，Y、X向永磁铁阵列24a、24b安装于阻尼器上、下背板21、25之间，并在气隙间构成强磁场，在气隙强磁场中安装紫铜板22，紫铜板22固定于支撑框架1上，阻尼器上背板21与平衡质量块2固定，相对于上、下背板21、25紫铜板22可以产生X、Y向平动和Rz转动；第一工件台4a和第二工件台4b为六自由度磁浮微动台，所述六自由度磁浮微动台由Chuck401、吸盘402、微动电机403、防撞框404、宏动平面电机动子405、平面光栅读数头406、调平调焦传感器407，无线充电接收器413、无线通讯收发器414组成，所述微动电机403由微动平面电机动子408与重力补偿器动子409集成在一起构成，所述吸盘402安装在Chuck 401上，Chuck 401四个角上安装有四个平面光栅读数头406和四个调平调焦传感器407，Chuck 401固定在微动电机403上，在微动电机403四周安装有防撞框404，所述宏动平面电机动子405安装在防撞框404下方，宏动平面电机动子405由磁钢阵列411交错排布构成，宏动平面电机定子3由线圈阵列412成人字形排布构成。
本发明工作流程如下：第一工件台4a在测量位11预对准完毕后由平面电机动驱动运动到换台位置A，等待第二工件台4b在曝光位12完成曝光，第二工 件台4b完成曝光后由平面电机驱动运动到换台位置B，然后第一工件台4a与第二工件台4b通过平面电机矢量控制沿圆弧轨迹逆时针运动完成换台操作；换台完成后，第一工件台4a向曝光位12运动在曝光位12进行曝光，第二工件台4b向测量位11运动在测量位11进行上片和预对准操作；率先完成硅片预对准完毕的第二工件台4b运动到测量位换台位置A'，等待第一工件台4a完成曝光后运动到换台位置B'，然后，第二工件台4b与第一工件台4a通过平面电机矢量控制沿圆弧轨迹顺时针运动，完成第二次换台；换台完成后，第一工件台4a向测量位11运动，第二工件台4b向曝光位12运动，这样完成了一次完整的工作周期。

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  1. 一种基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台方法，其特征在于该方法包括以下步骤：初始工作状态，测量位第一工件台处于预对准状态，曝光位第二工件台处于曝光状态；第一步，测量位第一工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A并充电和等待，曝光位第二工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C；第二步，第一工件台与第二工件台通过平面电机矢量控制沿圆弧轨迹逆时针运动，在运动过程中，两个工件台的相位不发生变化，运动位置由平面光栅进行测量，当第一工件台由动磁钢驱动运动到曝光位预定位置C、第二工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，第一工件台在曝光位进行硅片光刻曝光，第二工件台在测量位进行硅片上片及硅片预对准操作；第三步，测量位第二工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A'并充电和等待，曝光位第一工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C；第四步，第二工件台与第一工件台通过平面电机矢量控制沿圆弧轨迹顺时针运动，当第二工件台由动磁钢驱动运动到曝光位预定位置C、第一工件台由动磁钢驱动运动到测量位预定位置D时，换台结束，曝光位第二工件台进入曝光状态，测量位第一工件台进行上下片及预对准操作，此时系统回到初始工作状态，完成了包含两次换台操作的一个工作周期，在测量、曝光和换台过程中采用无线通讯方式完成。
  2. 一种基于平面光栅测量动磁钢磁浮双工件台矢量圆弧换台装置，其特征在于该装置包括支撑框架(1)、平衡质量块(2)、第一工件台 (4a)、第二工件台(4b)，所述平衡质量块(2)位于支撑框架(1)上方，宏动平面电机定子(3)安装在平衡质量块(2)上的平面上，第一工件台(4a)和第二工件台(4b)配置在宏动平面电机定子(3)上方，所述第一工件台(4a)和第二工件台(4b)运行于测量位(11)和曝光位(12)之间，在第一工件台(4a)和第二工件台(4b)上平面上分别安装测量位平面光栅(5a)和曝光位平面光栅(5b)；支撑框架(1)通过由平面片簧(13)和电磁阻尼器(14)并行组成的运动补偿机构与平衡质量块(2)相连接，所述平面片簧(13)由1对X向片簧(26)、1对Y向片簧(27)、1个Z向片簧(28)和1个Rz柔性铰链(29)组成，电磁阻尼器(14)由阻尼器上背板(21)、阻尼器下背板(25)、Y向永磁铁阵列(24a)和X向永磁铁阵列(24b)、紫铜板(22)和不锈钢立柱(23)装配构成，其中阻尼器上背板(21)和阻尼器下背板(25)通过不锈钢立柱(23)相连接，Y、X向永磁铁阵列(24a、24b)安装于阻尼器上、下背板(21、25)之间，并在气隙间构成强磁场，在气隙强磁场中安装紫铜板(22)，紫铜板(22)固定于支撑框架(1)上，阻尼器上背板(21)与平衡质量块(2)固定，相对于上、下背板(21、25)紫铜板(22)可以产生X、Y向平动和Rz转动；第一工件台(4a)和第二工件台(4b)为六自由度磁浮微动台，所述六自由度磁浮微动台由Chuck(401)、吸盘(402)、微动电机(403)、防撞框(404)、宏动平面电机动子(405)、平面光栅读数头(406)、调平调焦传感器(407)、无线充电接收器(413)、无线通讯收发器(414)组成，所述微动电机(403)由微动平面电机 动子(408)与重力补偿器动子(409)集成在一起构成，所述吸盘(402)安装在Chuck(401)上，Chuck(401)四个角上安装有四个平面光栅读数头(406)和四个调平调焦传感器(407)，Chuck(401)固定在微动电机(403)上，在微动电机(403)四周安装有防撞框(404)，所述宏动平面电机动子(405)安装在防撞框(404)下方，宏动平面电机动子(405)由磁钢阵列(411)交错排布构成，宏动平面电机定子(3)由线圈阵列(412)成人字形排布构成。
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