WO2017119717A1 - Appareil source de rayons x émettant un champ électrique - Google Patents

Appareil source de rayons x émettant un champ électrique Download PDF

Info

Publication number
WO2017119717A1
WO2017119717A1 PCT/KR2017/000102 KR2017000102W WO2017119717A1 WO 2017119717 A1 WO2017119717 A1 WO 2017119717A1 KR 2017000102 W KR2017000102 W KR 2017000102W WO 2017119717 A1 WO2017119717 A1 WO 2017119717A1
Authority
WO
WIPO (PCT)
Prior art keywords
junction
electrode
insulating spacer
ray source
band portion
Prior art date
Application number
PCT/KR2017/000102
Other languages
English (en)
Korean (ko)
Inventor
염경태
임병직
Original Assignee
주식회사바텍
(주)바텍이우홀딩스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사바텍, (주)바텍이우홀딩스 filed Critical 주식회사바텍
Publication of WO2017119717A1 publication Critical patent/WO2017119717A1/fr

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering

Definitions

  • the present invention relates to a field emission X-ray source device, and more particularly, a field emission X-ray source device that emits X-rays by colliding the accelerated electrons emitted from the electron emission source on the cold cathode side with a target on the anode electrode side in a vacuum atmosphere. It is about.
  • a conventional X-ray source device used in a medical institution for diagnosing a disease uses a tungsten hot cathode as an electron emission source for generating X-rays, and emits electrons by heating a tungsten filament at a high voltage and anodes the emitted electrons. It has a structure that generates an X-ray by colliding with a target on the electrode side.
  • the tungsten filament-based hot cathode X-ray source device consumes a lot of power to generate electrons, and the X-ray emission efficiency is extremely low because the generated electrons are randomly emitted from the tungsten surface having a spiral structure.
  • an interval of a certain time is required for heating and cooling tungsten filaments, and it is difficult to emit X-rays in the form of pulses.
  • the electron emission method is an electric field emission method, which is different from the conventional hot electron emission method.
  • the field emission X-ray source device can emit electrons with a lower voltage than the tungsten filament-based hot cathode X-ray source device, and the electrons directed toward the target on the anode electrode side because the emitted electrons travel along the longitudinal direction of the carbon nanotubes. X-ray emission efficiency is very high because of its excellent orientation.
  • Field emission X-ray sources known so far include an electron emitter installed on a cathode electrode and a gate electrode disposed adjacent thereto in an insulating spacer, the gate electrode and And to emit electrons by an electric field formed between the electron emission sources.
  • the gate electrode has a mesh plate shape or a metal plate shape in which a plurality of holes are arranged according to an arrangement of electron emission sources.
  • the present invention is directed to a field emission X-ray source apparatus configured to meet the above technical requirements, and to allow an overlapping junction having a relatively superior bonding force than a butt joint at a junction between a metal electrode and a ceramic insulating spacer.
  • the purpose is.
  • an electrically insulating tubular structure having a metallized junction outer surface along the outer surface adjacent to its distal end; And a metal structure coupled to an end of the insulating spacer, the metal electrode having a bonding band portion brazed to overlap at least a portion of the outer surface of the junction; It includes.
  • the junction band portion may overlap at least a portion of the distal end and the outer side surface of the insulating spacer.
  • the insulating spacer may further include a brazing filler interposed between at least one of the junction band portion, the junction outer surface, and the junction band portion.
  • the outer surface of the junction may have a smaller outer diameter than the rest of the insulating spacer.
  • the metal electrode includes a cathode electrode having an electron emission source and an anode electrode having an X-ray target, and a gate electrode disposed therebetween, wherein the insulating spacer includes a first insulating spacer between the anode electrode and the gate electrode and the It may include a second insulating spacer between the gate electrode and the cathode electrode.
  • a field emission X-ray source device a metal structure, a metal having a junction band portion protruding from the outer surface of the electrode bottom surface and the electrode bottom surface to a predetermined width in a direction perpendicular to the bottom surface electrode; And an tubular structure having electrical insulation, wherein the insulating spacer has a junction outer surface at least a portion of the outer surface of the distal end thereof overlaps the inner surface of the junction band portion; Includes, the bonding band portion and the bonding outer surface is bonded by a brazing filler.
  • a field emission X-ray source device comprising: an insulating spacer having an outer surface close to an end thereof, the insulating spacer having a junction outer surface metallized by a predetermined width in a longitudinal direction; And a metal structure disposed adjacent to an end of the insulating spacer, the metal electrode having a bonding band portion brazed to overlap at least a portion of the outer surface of the junction.
  • the junction band portion may extend from the outside of the bottom surface of the electrode contacting the end of the insulating spacer in the metal electrode by a predetermined width in the length direction of the insulating spacer.
  • the junction outer surface and the junction band portion have a predetermined junction gap, and the junction gap may be filled with a brazing filler.
  • the junction gap may also be filled with a brazing filler between the end surface of the insulating spacer adjacent to the junction outer surface and the bottom surface of the electrode.
  • the width of the junction band portion may be narrower than the width of the metalized outer surface of the junction.
  • the outer surface of the junction may have a smaller outer diameter than the rest of the insulating spacer.
  • the metal electrode includes a cathode electrode having an electron emission source and an anode electrode having an X-ray target, and a gate electrode disposed therebetween, wherein the insulating spacer includes a first insulating spacer between the anode electrode and the gate electrode and the It may include a second insulating spacer between the gate electrode and the cathode electrode.
  • a field emission X-ray source device a metal structure, a metal having a junction band portion protruding from the outer surface of the electrode bottom surface and the electrode bottom surface to a predetermined width in a direction perpendicular to the bottom surface electrode; And an electrically insulating tubular structure, the insulating spacer having a portion proximate the distal end inserted with a predetermined gap between an outer surface thereof and an inner surface of the joining band portion; It includes, wherein the predetermined gap is filled with the brazing filler by capillary action has a configuration bonded.
  • a field emission X-ray source apparatus which is configured such that an overlapping junction having a relatively superior bonding force than a butt joint can be made at a junction between a metal electrode and a ceramic insulating spacer.
  • the excellent bonding force can maintain the inside of the device at a high level of vacuum, as well as improve the durability of the device.
  • the field emission X-ray source device has a structure that can accurately align the components without a separate jig when aligning the components before vacuum brazing in the bonding process, it is more advantageous to improve the productivity of the device have.
  • FIG. 1 is a cross-sectional view of a field emission X-ray source device according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of a field emission X-ray source device according to an embodiment of the present invention.
  • FIG 3 shows a coupling structure between a metal electrode and an insulating spacer in a field emission X-ray source device according to an embodiment of the present invention.
  • FIG. 4 shows an example of a brazing filler member applicable to the embodiment of FIG. 3.
  • FIG. 1 is a cross-sectional view of a field emission X-ray source device according to an embodiment of the present invention.
  • the field emission X-ray source device includes tubular insulating spacers 10 and 11 and metal electrodes bonded to both ends of the insulating spacers 10 and 11.
  • the metal electrode includes an anode electrode 20 and a cathode electrode 40 disposed opposite to the anode electrode 20.
  • An X-ray target 21 is provided on the anode electrode 20, and an electron emission source 41 is disposed on the cathode electrode 40.
  • the electron emission source 41 may be provided on a separate substrate and coupled to the cathode electrode 40, or may be directly formed on the surface of the cathode electrode 40.
  • the electron emission source 41 may be formed using a plurality of nanostructures such as carbon nanotubes.
  • a plurality of carbon nanotubes are grown directly on the surface of the substrate or the cathode electrode 40 by using chemical vapor deposition (CVD), or a carbon nanotube paste is coated. It may be formed by a method such as post-firing.
  • a getter electrode may be provided adjacent to the cathode electrode 40. The getter electrode functions to capture the gas generated inside the field emission X-ray source device during aging or operation to maintain the degree of vacuum.
  • the tubular insulating spacers 10 and 11 may be made of an insulating material such as ceramic, glass, or silicon.
  • the tubular insulating spacers 10 and 11 may be made of a material such as alumina (Al 2 O 3) ceramics.
  • the insulating spacers 10 and 11 are made of an insulating material, the anode electrode 20 and the cathode electrode 40 are electrically insulated from each other in the field emission X-ray source device.
  • the gate electrode 50 may be disposed between the cathode electrode 40 and the anode electrode 20.
  • the gate electrode 50 is disposed close to the electron emission source 41 to form an electric field for initiating electron emission.
  • the gate electrode 50 may include a thin metal plate or a metal mesh in which a plurality of holes are formed to allow the electron beam to pass therethrough.
  • the gate electrode 50 may be extended along the electron beam traveling direction to perform a function of a focusing electrode which forms an electric field for focusing an electron beam accelerated toward the anode electrode toward the center thereof.
  • the one disposed between the anode electrode 20 and the gate electrode 50 is called a first insulating spacer 10
  • positioned between 40 is called 2nd insulating spacer 11.
  • the anode electrode 20 and the gate electrode 50 are joined to have airtightness through both ends of the first insulating spacer 10 and through vacuum brazing.
  • the insulating spacer 10 is made of a nonmetallic material such as alumina ceramics, it is difficult to bond the anode electrode 20 and the gate electrode 50 which are metal electrodes.
  • the portion close to the end of the insulating spacer 10 may be metallized to improve the bonding property.
  • the portion where the gate electrode 50 and the cathode electrode 40 are joined to both end portions of the second insulating spacer 11.
  • Metallizing the surface of the ceramic material is useful for bonding between the metal and the ceramic material because it improves wettability with respect to the molten metal, ie, the molten brazing filler.
  • a junction outer surface 111 metallized (M1) by a predetermined width in the longitudinal direction is provided on an outer surface close to the end of the second insulating spacer 11.
  • the cathode electrode 40 has a brazed junction band portion 401 extending from an outer end of the electrode bottom surface 402 to overlap at least a portion of the junction outer surface 111.
  • the joining outer surface 111 and the joining band portion 401 have a predetermined joining gap d.
  • the joining gap d is filled with a brazing filler B1 to sandwich the joining gap d between them. The parts are joined together.
  • the joining gap d needs to be a gap that can be filled by capillary action when the brazing filler material disposed around the joining gap d is melted in the brazing joining process.
  • the junction gap between them may be 0.15 mm to 0.30 mm.
  • the junction gap may vary depending on the fluidity of the brazing alloy.
  • thermal expansion of the bonding base material at the brazing temperature should be considered. To this end, it is necessary to also consider the difference in thermal expansion coefficient between the metal electrode and the ceramic insulating spacer.
  • the cathode electrode 40 may be made of copper, for example, and has a higher thermal expansion rate than that of the second insulating spacer 11 of ceramic material. Therefore, the size of the junction gap d may be narrower than the above-described range before the brazing filler B1 is filled at room temperature.
  • the arrangement in which the joining band part 401 made of metal surrounds the circumference of the joining outer surface 111 made of ceramic material is advantageous when considering the difference in thermal expansion rate between two different materials.
  • the junction band 401 is thermally expanded at the brazing temperature, the junction gap d is cooled again after being filled with the brazing filler B1 and contracted, thereby compressing the junction outer surface 111 and increasing airtightness. Because there is.
  • the width of the junction band portion 401 may be narrower than the width of the junction outer surface 111 metallized (M1).
  • the outer surface 111 of the junction may have a smaller outer diameter than the rest of the insulating spacer 11. This structure inserts a portion of the bonding outer surface 111 of the insulating spacer 11 into the bonding band portion 401 before performing the brazing bonding process, and places a linear brazing filler material on the exposed portion. It is also advantageous for increasing work efficiency such as winding.
  • FIG. 2 is a cross-sectional view of a field emission X-ray source device according to an embodiment of the present invention.
  • This embodiment is mostly the same as the embodiment described with reference to FIG. 1 above, but has other features at the junction.
  • the metallized surface M2 is applied to the junction end surface 112 facing the electrode bottom surface 402 of the cathode electrode 40.
  • the junction gap between the junction outer side surface 111 and the junction band portion 401 as well as between the junction end surface 112 and the electrode bottom surface 112, and this portion is a brazing filler B2. It has a structure filled with). This structure helps to increase the bonding area, improving the bonding strength, airtightness and durability.
  • FIG 3 shows a coupling structure between a metal electrode and an insulating spacer in a field emission X-ray source device according to an embodiment of the present invention.
  • the junction band portion 401 is disposed around the bottom surface 402 of the cathode electrode 40 to form a concave groove that fits the tube-shaped second insulating spacer 11.
  • a portion of the metallized junction outer surface 111 overlaps with the junction band portion 401 by inserting a junction portion of the second insulating spacer 11, that is, a portion of the junction end surface 112 downward, into this portion.
  • the brazing filler member B0 may be sandwiched between the electrode bottom surface 402 and the junction end surface 112, and is out of the case when the second insulating spacer 11 is inserted into the cathode electrode 40.
  • the coupling structure as described above may be applied not only to the junction portion of the cathode electrode 40 and the second insulation spacer 11 described above, but also to other portions to which the insulation spacer and the metal electrode are joined.
  • the alignment of the positions between the metal electrodes and the metal electrodes and the insulating spacers is important.
  • the above-described coupling structure is a simple jig for assembling the components for the vacuum brazing process. Also allows for alignment.
  • the point where the junction outer surface 111 is metalized (metalized) also improves the wettability to the brazing filler as well as the metal and metal abuts during assembly and smoothly inserted.
  • FIG. 4 shows an example of a brazing filler member applicable to the embodiment of FIG. 3.
  • the brazing filler member may be provided in various forms in an assembly step for vacuum brazing.
  • Figure 4 (a) is a band-shaped or cylindrical wound brazing filler material (Ba), (b) a wire-shaped brazing filler shape material (Bb), (c) a round washer shape brazing Filler shape material (Bc), and (d) shows the appearance of a broken washer-shaped brazing filler (Bd).
  • blazing filler shape materials mentioned here any other form may be employed as long as it can fill all of the above-mentioned joining gaps between the joining outer surface and the joining band portion in the brazing process.
  • the present invention relates to a field emission X-ray source device, and can be applied to a field emission X-ray source device that emits X-rays by colliding the accelerated electrons emitted from the electron emission source on the cold cathode side to a target on the anode electrode side in a vacuum atmosphere.
  • the field emission X-ray source device may be used for a portable X-ray imaging apparatus used for X-ray diagnosis or nondestructive testing.

Abstract

L'invention concerne un appareil source de rayons X émettant un champ électrique. Une partie de jonction de celui-ci entre une électrode métallique et un élément d'espacement isolant utilise un joint à recouvrement ayant une excellente adhérence qui est relativement meilleure que celle d'un joint bout à bout, et l'appareil est formé de façon à être capable d'aligner avec précision les éléments constitutifs sans gabarit séparé lors de l'alignement des éléments constitutifs avant le brasage sous vide. L'appareil source de rayons X émettant un champ électrique selon la présente invention comprend : un élément d'espacement isolant qui est une structure en forme de tube isolée électriquement et qui présente une surface de jonction externe, une largeur prédéterminée d'une surface extérieure voisine de son extrémité étant métallisée dans le sens de la longueur; et une électrode métallique qui est une structure métallique disposée au voisinage d'une extrémité de l'élément d'espacement isolant et qui possède une partie de brasage à bande de jonction qui est reliée à une ou plusieurs parties de la surface de jonction externe et la ou les chevauche.
PCT/KR2017/000102 2016-01-05 2017-01-04 Appareil source de rayons x émettant un champ électrique WO2017119717A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020160000839A KR101830844B1 (ko) 2016-01-05 2016-01-05 전계 방출 엑스선 소스 장치
KR10-2016-0000839 2016-01-05

Publications (1)

Publication Number Publication Date
WO2017119717A1 true WO2017119717A1 (fr) 2017-07-13

Family

ID=59274431

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2017/000102 WO2017119717A1 (fr) 2016-01-05 2017-01-04 Appareil source de rayons x émettant un champ électrique

Country Status (2)

Country Link
KR (1) KR101830844B1 (fr)
WO (1) WO2017119717A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI718582B (zh) * 2019-04-04 2021-02-11 南韓商奧爽樂股份有限公司 X 射線產生裝置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102340337B1 (ko) * 2017-08-16 2021-12-16 (주) 브이에스아이 초소형 원통형 엑스선 튜브 제조 방법
KR102131665B1 (ko) * 2018-12-21 2020-07-08 주식회사 씨에이티빔텍 듀얼 엑스레이 소스유닛 및 듀얼 엑스레이장치
KR102384352B1 (ko) * 2019-08-07 2022-04-07 (주) 브이에스아이 전자빔 발생장치
KR102477781B1 (ko) * 2020-10-30 2022-12-16 주식회사 씨에이티빔텍 전자방출 소스 및 이를 포함하는 엑스레이장치
KR20240001736A (ko) 2022-06-24 2024-01-04 주식회사 나노엑스코리아 에미터 칩 교환이 가능한 엑스레이 튜브

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180660A (ja) * 1995-12-25 1997-07-11 Hamamatsu Photonics Kk 透過型ｘ線管
US20070076849A1 (en) * 2005-09-30 2007-04-05 Moxtek,Inc X-ray tube cathode with reduced unintended electrical field emission
KR20100102039A (ko) * 2009-03-10 2010-09-20 우시오덴키 가부시키가이샤 세라믹제 방전 램프 및 세라믹제 방전 램프의 제조 방법
US20120235565A1 (en) * 2009-11-30 2012-09-20 Panasonic Corporation Magnetron and apparatus that uses microwaves
US20140056406A1 (en) * 2012-08-21 2014-02-27 Canon Kabushiki Kaisha Radiation generating tube, radiation generating unit, and radiation image taking system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180660A (ja) * 1995-12-25 1997-07-11 Hamamatsu Photonics Kk 透過型ｘ線管
US20070076849A1 (en) * 2005-09-30 2007-04-05 Moxtek,Inc X-ray tube cathode with reduced unintended electrical field emission
KR20100102039A (ko) * 2009-03-10 2010-09-20 우시오덴키 가부시키가이샤 세라믹제 방전 램프 및 세라믹제 방전 램프의 제조 방법
US20120235565A1 (en) * 2009-11-30 2012-09-20 Panasonic Corporation Magnetron and apparatus that uses microwaves
US20140056406A1 (en) * 2012-08-21 2014-02-27 Canon Kabushiki Kaisha Radiation generating tube, radiation generating unit, and radiation image taking system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI718582B (zh) * 2019-04-04 2021-02-11 南韓商奧爽樂股份有限公司 X 射線產生裝置

Also Published As

Publication number Publication date
KR20170081867A (ko) 2017-07-13
KR101830844B1 (ko) 2018-02-21

Similar Documents

Publication Publication Date Title
WO2017119717A1 (fr) Appareil source de rayons x émettant un champ électrique
JP5896649B2 (ja) ターゲット構造体及びｘ線発生装置
US9048059B2 (en) Stacked x-ray tube apparatus using spacer
JP6415250B2 (ja) Ｘ線発生管、ｘ線発生装置及びｘ線撮影システム
WO2005098893A1 (fr) Tube a rayon x de penetration et procéde de fabrication
TWI749520B (zh) Ｘ射線產生裝置及ｘ射線攝影裝置
JP6311165B2 (ja) 電子エミッターのための二重管支持体
US20170316911A1 (en) X-ray generating apparatus and radiography system using the same
JP6456172B2 (ja) 陽極及びこれを用いたｘ線発生管、ｘ線発生装置、ｘ線撮影システム
KR102288924B1 (ko) 원통형 엑스선 튜브 및 그 제조 방법
JP5122742B2 (ja) Ｘ線管の高電圧絶縁体の電気応力緩和の方法及び設計
KR20160102744A (ko) 전계 방출 엑스선 소스 장치
KR102295279B1 (ko) 전계 방출 엑스선 소스 장치 및 그 제조 방법
JP6659167B2 (ja) 電子銃を備えたｘ線発生管及びｘ線撮影装置
KR102340337B1 (ko) 초소형 원통형 엑스선 튜브 제조 방법
JP2020526867A (ja) 小型電離放射線源
KR102384352B1 (ko) 전자빔 발생장치
WO2018092939A1 (fr) Dispositif source de rayons x à émission de champ
JP2013109937A (ja) Ｘ線管及びその製造方法
KR102288932B1 (ko) 엑스선 튜브 및 그 제조 방법
KR20160102749A (ko) 전계 방출 엑스선 소스 장치
US20220406557A1 (en) X-Ray Tube Anode with Integrated Collimator
JP6602121B2 (ja) 電流導入端子、該電流導入端子を備えた電子銃、該電子銃を備えたｘ線発生管及び該ｘ線発生管を備えたｘ線撮影装置
KR20240002247A (ko) 아킹 방지 구조물을 가지는 엑스레이 튜브
KR102335130B1 (ko) 유리튜브 하우징을 갖는 탄소나노튜브 ｘ선 소스 및 그 제조방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17736090

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17736090

Country of ref document: EP

Kind code of ref document: A1