WO2017104562A1 - Solder powder, method for manufacturing same, and method for preparing solder paste using this powder - Google Patents
Solder powder, method for manufacturing same, and method for preparing solder paste using this powder Download PDFInfo
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- WO2017104562A1 WO2017104562A1 PCT/JP2016/086694 JP2016086694W WO2017104562A1 WO 2017104562 A1 WO2017104562 A1 WO 2017104562A1 JP 2016086694 W JP2016086694 W JP 2016086694W WO 2017104562 A1 WO2017104562 A1 WO 2017104562A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/17—Metallic particles coated with metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
- B23K35/0244—Powders, particles or spheres; Preforms made therefrom
- B23K35/025—Pastes, creams, slurries
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
- B23K35/302—Cu as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/40—Making wire or rods for soldering or welding
Definitions
- the ratio of the activator is less than the lower limit value, the solder powder may not be melted and a sufficient bonding strength may not be obtained.
- the upper limit value is exceeded, the activator may become solder powder during storage. This may cause a problem that the storage stability of the solder paste is lowered.
- a viscosity stabilizer may be added to the solder flux. Examples of the viscosity stabilizer include polyphenols that can be dissolved in a solvent, phosphoric acid compounds, sulfur compounds, tocophenols, tocophenol derivatives, ascorbic acid, and ascorbic acid derivatives. If there are too many viscosity stabilizers, problems such as a decrease in the meltability of the solder powder may occur.
- the amount of solder flux mixed when preparing the solder paste is preferably such that the proportion of the flux in 100% by mass of the prepared paste is 5 to 30% by mass. If it is less than the lower limit, it becomes difficult to form a paste due to insufficient flux, while if it exceeds the upper limit, the content of the flux in the paste is too high and the content of metal is reduced, and solder bumps of the desired size when melting the solder This is because it becomes difficult to obtain.
- solder paste is made of the above-described solder powder of the present invention, melting at the time of reflow is fast and excellent in meltability, and after reflow, the melting solder powder forms an intermetallic compound having a high melting point, Since heat resistance increases, remelting due to heat hardly occurs. For this reason, the solder paste of the present invention can be suitably used for mounting electronic parts and the like exposed to a high temperature atmosphere.
- the supernatant was discarded, and 100 mL of water was added thereto, followed by stirring for 10 minutes at a rotational speed of 300 rpm, and washing was performed four times. . Finally, this is dried in a vacuum dryer, the average particle size is 1.1 ⁇ m, copper is the central core, nickel is the first coating layer (diffusion prevention layer), and tin is the second coating layer. Solder powder formed on each (outermost layer) was obtained.
- polyvinyl alcohol 500 polyvinyl alcohol having an average molecular weight of 500
- copper powder having an average particle size of 0.18 ⁇ m is dispersed.
- the dispersion was added and stirred at a rotational speed of 500 rpm for 10 minutes to obtain a dispersion in which nickel-coated copper powder having nickel deposited on the surface of the copper powder was dispersed.
- the dispersion was allowed to stand for 60 minutes, and the produced powder was allowed to settle.
- the ratio of the thickness of the diffusion prevention layer and the radius of the central core exceeds 0.51
- the nickel ratio becomes too high and the meltability of the solder powder is lowered, so that the bonding strength may be impossible.
- the coating layer made of tin was formed by barrel plating
- a large amount of strongly agglomerated powder was generated. Therefore, the average particle size of the solder powder obtained using the laser diffraction scattering method was measured by SEM observation. While the value greatly different from the average particle size of the solder powder obtained was obtained, a good printed film could not be obtained, and the bonding strength could not be measured in any sample.
- the present invention can be suitably used for producing solder powder that can be stored for a long period of time. Moreover, it can utilize suitably for mounting of electronic components, especially mounting of electronic components exposed to a high temperature atmosphere.
Abstract
Description
中心核の形成のために銅粉末を使用する。先ず、図1のステップS1及びS2に示すように、銅粉末と分散剤を溶媒に添加混合して銅粉末が分散する第1分散液を調製し、これにニッケルを含む化合物を添加混合して銅粉末が分散し、ニッケルを含む化合物が溶解した第1溶解液を調製する。この銅粉末は、0.1μm以上27μm以下の平均粒径を有することが好ましい。この下限値未満では、ハンダ粉末の平均粒径が1μm未満になり易く、比表面積が高くなり、粉末の表面酸化層の影響によりハンダの溶融性が低下する。また上限値を超えると、ハンダ粉末の平均粒径が30μmを超え易くなる。30μmを越えると、バンプを形成する場合においてバンプのコプラナリティが低下するという不具合を生じ、また、パターン表面をハンダでコートする場合に塗布ムラが生じ、パターン全面を均一にコートできないという不具合を生じる。銅粉末の平均粒径は2~20μmであることが更に好ましい。この銅粉末は、還元反応による化学的手法で得られる他、アトマイズ法のような物理的手法によって得られる。なお、本明細書において、粉末の平均粒径とは、レーザー回折散乱法を用いた粒度分布測定装置(堀場製作所社製、レーザー回折/散乱式粒子径分布測定装置LA-950)にて測定した体積累積中位径(Median径、D50)をいう。 [Method for producing solder powder]
Copper powder is used for the formation of the central core. First, as shown in steps S1 and S2 of FIG. 1, a first dispersion in which copper powder is dispersed is prepared by adding and mixing copper powder and a dispersant to a solvent, and a compound containing nickel is added and mixed therein. A first solution in which the copper powder is dispersed and the nickel-containing compound is dissolved is prepared. The copper powder preferably has an average particle size of 0.1 μm or more and 27 μm or less. Below this lower limit, the average particle size of the solder powder tends to be less than 1 μm, the specific surface area becomes high, and the meltability of the solder is lowered due to the influence of the surface oxide layer of the powder. If the upper limit is exceeded, the average particle size of the solder powder tends to exceed 30 μm. When the thickness exceeds 30 μm, there is a problem that the coplanarity of the bump is lowered when the bump is formed, and there is a problem that coating unevenness occurs when the pattern surface is coated with solder, and the entire pattern cannot be coated uniformly. The average particle size of the copper powder is more preferably 2 to 20 μm. This copper powder can be obtained not only by a chemical method using a reduction reaction but also by a physical method such as an atomizing method. In the present specification, the average particle diameter of the powder was measured by a particle size distribution measuring apparatus using a laser diffraction / scattering method (manufactured by Horiba, Ltd., laser diffraction / scattering particle diameter distribution measuring apparatus LA-950). Volume cumulative median diameter (Median diameter, D 50 ).
図2に示すように、上記方法で作製されたハンダ粉末10は、中心核の銅核11をニッケルからなる拡散防止層12が被覆してなる金属粉末13が錫層14で被覆される。このハンダ粉末は、このように、銅からなる中心核が、融点の低い錫層の被覆層で被覆された構造になっているため、リフロー時の溶融性に優れる。また、粉末を構成する一つの金属粒子内において、銅と錫が含まれるため、リフロー時の溶融ムラや組成ズレが起こりにくく、高い接合強度が得られる。更に、ハンダ粉末が中心核と被覆層の間にニッケルからなる拡散防止層を有するため、銅の錫への拡散及び錫の銅への拡散を防止することができる。更に、リフロー後は、Cu3Sn、Cu6Sn5、Ni3Sn、Ni3Sn2、Ni3Sn4、NiSn3、(Ni,Cu)3Sn4、(Ni,Cu)6Sn5等の融点の高い金属間化合物及び銅からなる接合層が形成されるため、リフロー後、再溶融及び接合強度の低下が起こりにくく、特に高温雰囲気に晒される電子部品等に好適に実装される。 [Solder powder]
As shown in FIG. 2, the
ここから The
from here
上記方法で作製されたハンダ粉末は、ハンダ用フラックスと混合してペースト化して得られるハンダ用ペーストの材料として好適に用いられる。ハンダ用ペーストの調製は、ハンダ粉末とハンダ用フラックスとを所定の割合で混合してペースト化することにより行われる。ハンダ用ペーストの調製に用いられるハンダ用フラックスは、特に限定されないが、溶剤、ロジン、チキソ剤及び活性剤等の各成分を混合して調製されたフラックスを用いることができる。 [Solder paste and its preparation method]
The solder powder produced by the above method is suitably used as a material for a solder paste obtained by mixing with a solder flux to form a paste. The solder paste is prepared by mixing solder powder and solder flux at a predetermined ratio to form a paste. The solder flux used for the preparation of the solder paste is not particularly limited, but a flux prepared by mixing components such as a solvent, rosin, thixotropic agent and activator can be used.
上記方法で調製されたハンダ用ペーストを用いてシリコンチップ、LEDチップ等の電子部品を各種放熱基板、FR4(Flame Retardant Type 4)基板、コバール等の基板に実装するには、ピン転写法にて上記基板の所定位置にハンダ用ペーストを転写するか、又は印刷法により所定位置にハンダ用ペーストを印刷する。次いで、転写又は印刷されたペースト上に電子部品であるチップ素子を搭載する。この状態で、リフロー炉にて窒素雰囲気中、250~400℃の温度で、5~120分間保持して、ハンダ粉末をリフローする。場合によっては、チップと基板とを加圧しながら接合してもよい。これにより、チップ素子と基板とを接合させて接合体を得て、電子部品を基板に実装する。 [Electronic component mounting method and joint using solder paste]
To mount electronic parts such as silicon chips and LED chips on various heat dissipation boards, FR4 (Flame Retardant Type 4) boards, and Kovar boards using the solder paste prepared by the above method, use the pin transfer method. The solder paste is transferred to a predetermined position of the substrate, or the solder paste is printed at a predetermined position by a printing method. Next, a chip element which is an electronic component is mounted on the transferred or printed paste. In this state, the solder powder is reflowed by holding in a reflow furnace in a nitrogen atmosphere at a temperature of 250 to 400 ° C. for 5 to 120 minutes. In some cases, the chip and the substrate may be joined while being pressed. Thus, the chip element and the substrate are bonded to obtain a bonded body, and the electronic component is mounted on the substrate.
先ず、水50mLに硫酸ニッケル(II)を4.35×10-3mol、ホスフィン酸ナトリウムを9.66×10-4mol、クエン酸ナトリウムを3.29×10-4molを加え、スターラーを用いて回転速度300rpmにて5分間攪拌し、溶解液を調製した。この溶解液を硫酸にてpHを5.0に調整した後、分散剤としてポリビニルアルコール500(平均分子量が500のポリビニルアルコール)を0.2g加え、更に回転速度300rpmにて10分間攪拌した。次いで、この溶解液に、水50mLに分散剤としてポリビニルアルコール500(平均分子量が500のポリビニルアルコール)を0.2g溶解し、かつ、平均粒径が0.18μmの銅粉末3.40gを分散させた分散液を添加し、回転速度500rpmにて10分間攪拌し、銅粉末表面にニッケルを析出させたニッケル被覆銅粉末が分散する分散液を得た。この分散液を60分間静置して生成した粉末を沈降させた後、上澄み液を捨て、ここに水100mLを加えて回転速度300rpmにて10分間攪拌する操作を4回繰返し、洗浄を行った。最後にこれを真空乾燥機にて乾燥することにより、銅を中心核に、ニッケルを第1被覆層(拡散防止層)とする粉末を得た。 <Example 1>
First, 4.35 × 10 −3 mol of nickel (II) sulfate, 9.66 × 10 −4 mol of sodium phosphinate and 3.29 × 10 −4 mol of sodium citrate are added to 50 mL of water, and a stirrer is added. The mixture was stirred at a rotational speed of 300 rpm for 5 minutes to prepare a solution. After adjusting the pH of this solution to 5.0 with sulfuric acid, 0.2 g of polyvinyl alcohol 500 (polyvinyl alcohol having an average molecular weight of 500) was added as a dispersant, and the mixture was further stirred at a rotation speed of 300 rpm for 10 minutes. Next, 0.2 g of polyvinyl alcohol 500 (polyvinyl alcohol having an average molecular weight of 500) as a dispersant is dissolved in 50 mL of water in this solution, and 3.40 g of copper powder having an average particle size of 0.18 μm is dispersed. The dispersion was added and stirred at a rotational speed of 500 rpm for 10 minutes to obtain a dispersion in which nickel-coated copper powder having nickel deposited on the surface of the copper powder was dispersed. The dispersion was allowed to stand for 60 minutes, and the produced powder was allowed to settle. Then, the supernatant was discarded, and 100 mL of water was added thereto, followed by stirring for 10 minutes at a rotational speed of 300 rpm, and washing was performed four times. . Finally, this was dried with a vacuum dryer to obtain a powder having copper as the central core and nickel as the first coating layer (diffusion prevention layer).
実施例2~28、比較例1~55においても、用いる銅粉末の粒径及び銅粉末の添加量、硫酸ニッケル(II)及び硫酸錫(II)の添加量、並びに他成分の割合を調整することにより、所定の銅中心核の半径、ニッケル拡散防止層及び錫最外層の厚さ、更には所定の粒径のハンダ粉末に制御したこと以外は、実施例1と同様にしてハンダ粉末を得た。 <Examples 2 to 28, Comparative Examples 1 to 55>
Also in Examples 2 to 28 and Comparative Examples 1 to 55, the particle diameter of the copper powder to be used, the addition amount of the copper powder, the addition amounts of nickel (II) sulfate and tin (II) sulfate, and the ratio of other components are adjusted. Thus, a solder powder was obtained in the same manner as in Example 1 except that the predetermined copper central core radius, the thickness of the nickel diffusion preventing layer and the tin outermost layer, and the solder powder having a predetermined particle diameter were controlled. It was.
先ず、水50mLに硫酸ニッケル(II)を4.35×10-3mol、ホスフィン酸ナトリウムを9.66×10-4mol、クエン酸ナトリウムを3.29×10-4molを加え、スターラーを用いて回転速度300rpmにて5分間攪拌し、溶解液を調製した。この溶解液を硫酸にてpHを5.0に調整した後、分散剤としてポリビニルアルコール500(平均分子量が500のポリビニルアルコール)を0.2g加え、更に回転速度300rpmにて10分間攪拌した。次いで、この溶解液に、水50mLに分散剤としてポリビニルアルコール500(平均分子量が500のポリビニルアルコール)を0.2g溶解し、かつ、平均粒径が0.18μmの銅粉末3.40gを分散させた分散液を添加し、回転速度500rpmにて10分間攪拌し、銅粉末表面にニッケルを析出させたニッケル被覆銅粉末が分散する分散液を得た。この分散液を60分間静置して生成した粉末を沈降させた後、上澄み液を捨て、ここに水100mLを加えて回転速度300rpmにて10分間攪拌する操作を4回繰返し、洗浄を行った。最後にこれを真空乾燥機にて乾燥することにより、銅を中心核に、ニッケルを第1被覆層(拡散防止層)とする粉末を得た。 <Comparative Example 56>
First, 4.35 × 10 −3 mol of nickel (II) sulfate, 9.66 × 10 −4 mol of sodium phosphinate and 3.29 × 10 −4 mol of sodium citrate are added to 50 mL of water, and a stirrer is added. The mixture was stirred at a rotational speed of 300 rpm for 5 minutes to prepare a solution. After adjusting the pH of this solution to 5.0 with sulfuric acid, 0.2 g of polyvinyl alcohol 500 (polyvinyl alcohol having an average molecular weight of 500) was added as a dispersant, and the mixture was further stirred at a rotation speed of 300 rpm for 10 minutes. Next, 0.2 g of polyvinyl alcohol 500 (polyvinyl alcohol having an average molecular weight of 500) as a dispersant is dissolved in 50 mL of water in this solution, and 3.40 g of copper powder having an average particle size of 0.18 μm is dispersed. The dispersion was added and stirred at a rotational speed of 500 rpm for 10 minutes to obtain a dispersion in which nickel-coated copper powder having nickel deposited on the surface of the copper powder was dispersed. The dispersion was allowed to stand for 60 minutes, and the produced powder was allowed to settle. Then, the supernatant was discarded, and 100 mL of water was added thereto, followed by stirring for 10 minutes at a rotational speed of 300 rpm, and washing was performed four times. . Finally, this was dried with a vacuum dryer to obtain a powder having copper as the central core and nickel as the first coating layer (diffusion prevention layer).
比較例57~65においても、用いる銅粉末の粒径及び銅粉末の添加量、硫酸ニッケル(II)及び硫酸錫(II)の添加量、並びに他成分の割合及び処理条件を調整することにより、所定の銅中心核の半径、ニッケル拡散防止層及び錫最外層の厚さ、更には所定の粒径のハンダ粉末に制御したこと以外は、比較例56と同様にしてハンダ粉末を得た。 <Comparative Examples 57 to 65>
Also in Comparative Examples 57 to 65, by adjusting the particle size of the copper powder to be used and the addition amount of the copper powder, the addition amount of nickel (II) sulfate and tin (II) sulfate, the ratio of other components and the treatment conditions, A solder powder was obtained in the same manner as in Comparative Example 56, except that the predetermined radius of the copper core, the thickness of the nickel diffusion preventing layer and the outermost tin layer, and the solder powder having a predetermined particle diameter were controlled.
実施例1~28及び比較例1~65で得られたハンダ粉末について、次に述べる方法により、ハンダ粉末の銅の含有割合[質量%]、平均粒径[μm]、銅からなる中心核の平均半径[μm]、ニッケルからなる拡散防止層の平均厚さ[μm]、錫からなる被覆層の平均厚さ[μm]を測定した。これらの結果を以下の表1~表5に示す。また、これらのハンダ粉末を用いてハンダ用ペーストをそれぞれ調製し、リフロー時の最大保持温度を変えたときの接合強度を評価した。これらの結果を以下の表6~表10に示す。なお、銅からなる中心核の平均半径と、ニッケルからなる拡散防止層の平均厚さと、錫からなる被覆層の平均厚さとの和をハンダ粉末の平均半径とした。 <Comparison test and evaluation>
For the solder powders obtained in Examples 1 to 28 and Comparative Examples 1 to 65, the copper content of the solder powder [% by mass], the average particle size [μm], The average radius [μm], the average thickness [μm] of the diffusion preventing layer made of nickel, and the average thickness [μm] of the coating layer made of tin were measured. These results are shown in Tables 1 to 5 below. In addition, solder pastes were prepared using these solder powders, and the bonding strength when the maximum holding temperature during reflow was changed was evaluated. These results are shown in Tables 6 to 10 below. The sum of the average radius of the central core made of copper, the average thickness of the diffusion preventing layer made of nickel, and the average thickness of the coating layer made of tin was taken as the average radius of the solder powder.
Claims (4)
- 銅粉末の第1分散液を調製する工程と、
ニッケルの金属塩を前記銅粉末の第1分散液に添加混合して前記ニッケルの金属塩が溶解し前記銅粉末が分散する第1溶解液を調製する工程と、
前記第1溶解液のpHを調整する工程と、
前記pH調整した第1溶解液に第1還元剤を添加混合することにより、ニッケルイオンが還元され、析出したニッケルが銅粉末を被覆して分散する第2分散液を調製する工程と、
前記第2分散液を固液分離し、前記固液分離した固形分を乾燥して銅核をニッケルからなる拡散防止層が被覆してなる金属粉末を作製する工程と、
前記金属粉末の第3分散液を調製する工程と、
錫の金属塩を前記金属粉末の第3分散液に添加混合して前記錫の金属塩が溶解し前記金属粉末が分散する第2溶解液を調製する工程と、
前記第2溶解液のpHを調整する工程と、
前記pH調整した第2溶解液に第2還元剤を添加混合することにより、錫イオンが還元され、析出した錫が前記金属粉末を被覆して分散する第4分散液を調製する工程と、
前記第4分散液を固液分離し、前記固液分離した固形分を乾燥して前記金属粉末が錫層で被覆されたハンダ粉末を作製する工程と
を含むハンダ粉末の製造方法。 Preparing a first dispersion of copper powder;
Adding a nickel metal salt to the first dispersion of copper powder to prepare a first solution in which the nickel metal salt is dissolved and the copper powder is dispersed;
Adjusting the pH of the first solution;
A step of preparing a second dispersion in which nickel ions are reduced by adding and mixing the first reducing agent to the pH-adjusted first solution, and the deposited nickel covers and disperses the copper powder;
Solid-liquid separation of the second dispersion, drying the solid-solid separated solids to produce a metal powder having a copper core coated with a diffusion preventing layer made of nickel;
Preparing a third dispersion of the metal powder;
Adding and mixing a tin metal salt to the third dispersion of the metal powder to prepare a second solution in which the metal salt of the tin is dissolved and the metal powder is dispersed;
Adjusting the pH of the second solution;
A step of preparing a fourth dispersion in which tin ions are reduced by adding and mixing a second reducing agent to the pH-adjusted second solution, and the deposited tin covers and disperses the metal powder;
Solid-liquid separation of the fourth dispersion, and drying the solid-liquid separated solid to produce a solder powder coated with the tin powder with the metal powder. - 銅核をニッケルからなる拡散防止層が被覆してなる金属粉末が錫層で被覆されたハンダ粉末において、
前記ハンダ粉末の平均粒径が1μm以上30μm以下であり、
前記ハンダ粉末の全体量100質量%に対し、銅の含有割合が2質量%以上70質量%以下であり、
前記ニッケルからなる拡散防止層の厚さが前記銅核の半径を1とするときに0.04以上0.51以下の比率である
ことを特徴とするハンダ粉末。 In the solder powder in which the metal powder formed by coating the copper core with the diffusion preventing layer made of nickel is coated with the tin layer,
The average particle size of the solder powder is 1 μm or more and 30 μm or less,
The total content of the solder powder is 100% by mass, and the copper content is 2% by mass or more and 70% by mass or less.
Solder powder characterized in that the thickness of the diffusion preventing layer made of nickel is a ratio of 0.04 or more and 0.51 or less when the radius of the copper nucleus is 1. - 請求項1記載の方法により製造されたハンダ粉末或いは請求項2記載のハンダ粉末とハンダ用フラックスを混合してペースト化することによりハンダ用ペーストを製造する方法。 A method for producing a solder paste by mixing the solder powder produced by the method of claim 1 or the solder powder of claim 2 and a solder flux into a paste.
- 請求項3記載の方法により製造されたハンダ用ペーストを用いて電子部品を実装する方法。 A method for mounting an electronic component using the solder paste manufactured by the method according to claim 3.
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