WO2017094251A1 - Method for producing soluble cross-linked polymer - Google Patents

Method for producing soluble cross-linked polymer Download PDF

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WO2017094251A1
WO2017094251A1 PCT/JP2016/004985 JP2016004985W WO2017094251A1 WO 2017094251 A1 WO2017094251 A1 WO 2017094251A1 JP 2016004985 W JP2016004985 W JP 2016004985W WO 2017094251 A1 WO2017094251 A1 WO 2017094251A1
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meth
acrylate
monomer
polymerization initiator
organic solvent
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PCT/JP2016/004985
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French (fr)
Japanese (ja)
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顕夫 田村
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富士フイルム株式会社
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Publication of WO2017094251A1 publication Critical patent/WO2017094251A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/04Polymerisation in solution
    • C08F2/06Organic solvent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof

Definitions

  • the present invention relates to a method for producing a soluble cross-linked polymer.
  • a hard coat film having a hard coat layer is provided on a support in order to prevent damage to the display surface.
  • Many of such films are produced by laminating coating films.
  • a leveling agent such as a fluorine-containing polymer is usually added to the hard coat layer composition in order to enhance the homogeneity of the coating film of the hard coat layer itself.
  • the surface of the hard coat layer is hydrophobized by the hydrophobicity of the leveling agent, and the recoatability (lamination property) is lowered. Therefore, a specific fluorosurfactant or a fluorine-containing polymer is added for the purpose of improving the uniform coatability on the substrate during coating and improving the recoatability after coating.
  • even a coating composition containing them does not have sufficient uniformity and recoatability of the coating film itself.
  • dendritic polymers such as hyperbranched polymers and dendrimers
  • Such highly branched polymers have properties different from ordinary linear polymers, such as low melt viscosity, low melt viscosity, and high solubility, and are expected to be applied as surfactants and surface modifiers.
  • the properties of the polymer itself and the properties of the coating film surface formed by adding the polymer and the interface of the laminated film when the coating film is laminated are also important.
  • a method for producing a hyperbranched polymer there is a method of radical polymerization of a system containing a vinyl monomer, but it is difficult to control the molecular weight, and an insoluble and infusible polymer may be produced. Therefore, an initiator-incorporated radical polymerization in which a monomer is polymerized in the presence of a high concentration radical polymerization initiator has been proposed.
  • Patent Document 1 discloses that a monomer A having two or more radically polymerizable double bonds in the molecule is a polymerization initiator in an amount of 5 mol% to 200 mol% with respect to 1 mol of the monomer A in an organic solvent.
  • a method of polymerizing under reflux at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B in the presence of B is disclosed. It is described that according to this production method, the molecular weight can be controlled by a simple method, and the weight average molecular weight can be controlled within a range that can be dissolved in a solvent.
  • Patent Document 2 discloses a monomer (A) having one radical polymerizable unsaturated double bond and a monomer (B) having two or more radical polymerizable unsaturated double bonds (A ) And (B), a method of polymerizing in the presence of 15 to 170 mol% of a polymerization initiator (C) is disclosed. According to this production method, it is described that a three-dimensional polymer having a volume average particle diameter of 1 nm to 300 nm can be easily obtained.
  • the present inventor uses a hyperbranched polymer obtained by the method described in Patent Document 1 as a surface modification to a coating composition for producing a hard coat layer used in an image display device such as a liquid crystal display device.
  • a hyperbranched polymer obtained by the method described in Patent Document 1 as a surface modification to a coating composition for producing a hard coat layer used in an image display device such as a liquid crystal display device.
  • the composition was used as a coating film
  • lumpy defects caused by impurities were generated on the surface of the cured film.
  • a highly branched polymer is added to the coating composition as a surface modifier or the like, it is required to suppress the generation of impurities at a higher level (mainly below the detection limit).
  • the present invention has been made in view of the above circumstances, and when a highly branched polymer is used as an additive for a coating composition, an insoluble component is hardly generated, the compatibility with the coating composition is good, and It is an object of the present invention to provide a method for producing a soluble cross-linked polymer in which, when the composition is used as a coating film, the uneven defects are satisfactorily reduced.
  • the present inventors thought that the above-mentioned lumpy defects were caused by undesired by-products, mainly impurity components below the detection limit. And it was speculated that the cause of the generation of impurities may be temperature control in the polymerization reaction under reflux. That is, when the monomer solution is added dropwise at reflux, the temperature of the mixed system may become constant at a temperature that is not the temperature at which the target polymer is formed, and as a result, a higher molecular weight polymer is formed when the temperature is lowered. As the temperature increases, a low molecular weight polymer is produced. Therefore, the present inventor found that the non-reflux method was used instead of the recirculation method which was thought to have good temperature control. The present invention has been reached.
  • the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% to 200 mol with respect to 1 mol of the monomer A in the first organic solvent.
  • the polymerization is carried out under non-refluxing at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B.
  • the monomer A may be polymerized by dropping a solution containing the monomer A, the polymerization initiator B and the second organic solvent into the first organic solvent.
  • the solution may further contain a monomer C having one radical polymerizable double bond in the molecule, and the monomer A and the monomer C are polymerized by dropping this solution into the first organic solvent. Also good.
  • the weight average molecular weight of the soluble cross-linked polymer is preferably 1,000 to 300,000 in terms of polystyrene by gel permeation chromatography.
  • the weight average molecular weight of the soluble cross-linked polymer is preferably 1,000 to 50,000 in terms of polystyrene by gel permeation chromatography.
  • the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% to 200 mol with respect to 1 mol of the monomer A in the first organic solvent.
  • Polymerization is carried out in a non-reflux state at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B in the presence of a polymerization initiator B in an amount of% or less. According to this method, the generation of impurities can be suppressed satisfactorily.
  • the obtained polymer when used as an additive in a coating composition, it is possible to obtain a film having good compatibility with the coating composition and having well-formed defects. This is presumed to be because the production of a trace amount of impurities could be suppressed by setting the non-reflux to polymerize at a temperature lower than the boiling point.
  • a method for producing the soluble cross-linked polymer of the present invention will be described. The following description may be made based on representative embodiments of the present invention, but the present invention is not limited to such embodiments.
  • a numerical range expressed using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
  • the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% or more to 200 mol% with respect to 1 mol of the monomer A in the first organic solvent.
  • the presence of mol% of the amount of the polymerization initiator B, 10-hour half-life temperature of the polymerization initiator B (hereinafter, may be described as T 10.) from 20 ° C. or higher high temperature (hereinafter, the polymerization temperature T And may be polymerized under non-reflux.
  • Monomer A is a polyfunctional monomer having two or more radically polymerizable double bonds in the molecule.
  • Examples of the polyfunctional monomer used for the monomer A include 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol (meth) acrylate, and ethylene glycol di (meth) acrylate.
  • Monomer A may be a polyfunctional acrylate compound having three or more (meth) acryloyl groups in the molecule.
  • Specific examples include KAYARAD DPHA, DPHA-2C, PET-30, TMPTA, TPA-320, TPA-330, RP-1040, T-1420, and D from Nippon Kayaku Co., Ltd. -310, DPCA-20, DPCA-30, DPCA-60, GPO-303, Osaka Organic Chemical Industry Co., Ltd. V # 400, V # 36095D, etc. Can be mentioned.
  • UV-1400B Purple light UV-1400B, UV-1700B, UV-6300B, UV-7550B, UV-7600B, UV-7605B, UV-7610B, UV-7620EA, UV-7630B, UV-7630B, UV-7640B UV-6630B, UV-7000B, UV-7510B, UV-7461TE, UV-3000B, UV-3200B, UV-3210EA, UV-3310EA, UV-3310EA, UV-3310B, UV-3500BA UV-3520TL, UV-3700B, UV-6100B, UV-6640B, UV-2000B, UV-2010B, UV-2250EA, UV-2250EA (manufactured by Nippon Synthetic Chemical Co., Ltd.), UL-503LN (manufactured by Kyoeisha Chemical Co., Ltd.), Unidic 17-80 17-813, V-4030, V-4000BA (Dainippon Ink Chemical Co., Ltd.), EB-1290K, EB-220, EB-5129,
  • the polymerization initiator B is present in an amount of 5 mol% or more and 200 mol% or less with respect to 1 mol of the monomer A.
  • the amount of the polymerization initiator B is set to 5 mol% or more and 200 mol% or less, it is possible to produce a soluble cross-linked polymer with good molecular weight control.
  • a dent-like defect can be reduced favorably.
  • polymerization initiator B examples include an azo polymerization initiator, a peroxide polymerization initiator, a redox polymerization initiator using a peroxide polymerization initiator and a reducing agent in combination, and a mixture of two or more of the above.
  • an oil-soluble azo polymerization initiator is preferable.
  • 2,2′-azobisisobutyronitrile and dimethyl 2,2′-azobisisobutyrate are particularly preferable.
  • the following oil-soluble peroxide polymerization initiators are preferably used.
  • ketone peroxide methyl ethyl peroxide, methyl isobutyl peroxide, acetylacetone peroxide, cyclohexanone peroxide, etc.
  • Hydroperoxide (1,1,3,3-tetramethylbutyl peroxide, cumene hydroperoxide, t-butyl hydroperoxide, etc.
  • Diacyl peroxide isobutyryl peroxide, bis-3,5,5-trimethylhexanoyl peroxide, lauroyl peroxide, benzoyl peroxide, etc.
  • Dialkyl peroxide dicumyl peroxide, 2,5-dimethyl-2,5-di- (t-butylperoxyhexane), 1,3-bis (t-butylperoxyisopropyl) benzene, t-butylcumi
  • ketone peroxide preferred are (1) ketone peroxide, (2) hydroperoxide, (4) dialkyl peroxide and (6) alkyl perester, and particularly preferred are methyl ethyl ketone peroxide and cumene hydroperoxide. Oxides, di-t-butyl peroxide and t-butyl peroxybenzoate.
  • An oil-soluble redox polymerization initiator is used as the redox polymerization initiator.
  • peroxide polymerization initiators include oils such as hydroperoxides (t-butylhydroxyperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (such as lauroyl peroxide), and diacyl peroxides (benzoyl peroxide, etc.). Examples thereof include soluble peroxides.
  • Reducing agents include oil-soluble reducing agents such as tertiary amines (triethylamine, tributylamine, etc.), naphthenates, mercaptans (mercaptoethanol, lauryl mercaptan, etc.), organometallic compounds (triethylaluminum, triethylboron, diethylzinc, etc.) Etc.
  • oil-soluble reducing agents such as tertiary amines (triethylamine, tributylamine, etc.), naphthenates, mercaptans (mercaptoethanol, lauryl mercaptan, etc.), organometallic compounds (triethylaluminum, triethylboron, diethylzinc, etc.) Etc.
  • examples of preferable specific combinations of the peroxide polymerization initiator and the reducing agent include cumene hydroperoxide-triethylaluminum, benzoyl peroxide-
  • the monomer A having two or more radical polymerizable double bonds in the molecule is polymerized in a first organic solvent under non-reflux.
  • the first organic solvent used for the polymerization reaction include the following organic solvents.
  • aromatic hydrocarbon solvents such as benzene, toluene, xylene, ethylbenzene, tetralin; aliphatic or alicyclic hydrocarbon solvents such as n-hexane, n-heptane, mineral spirit, cyclohexane; methyl chloride, bromide Halogen solvents such as methyl, methyl iodide, methylene dichloride, chloroform, carbon tetrachloride, trichloroethylene, perchloroethylene, orthodichlorobenzene; ethyl acetate, butyl acetate, methoxybutyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol Ester or ester ether solvents such as monomethyl ether acetate; diethyl ether, tetrahydrofuran, 1,4-dioxane, ethyl cell
  • an organic solvent having a boiling point of 90 ° C. to 200 ° C. under atmospheric pressure for example, toluene, xylene, orthodichlorobenzene, butyl acetate, dioxane, N, N-dimethylformamide, N, N-dimethylacetamide.
  • organic solvent having a boiling point of 90 ° C. to 200 ° C. under atmospheric pressure
  • Propylene glycol monomethyl ether propylene glycol monomethyl ether acetate, n-propanol, methyl isobutyl ketone, and cyclohexanone.
  • the amount of the organic solvent is preferably 0.3 to 100 parts by mass, more preferably 0.5 to 50 parts by mass with respect to 1 part by mass of the monomer A from the viewpoint of good temperature control.
  • the manufacturing method of the present invention the monomer A, the polymerization initiator B, and the solution containing the second organic solvent, kept at a higher temperature T than the 10-hour half-life temperature T 10 20 ° C. or more polymerization initiator B It is preferable to polymerize by dropping into the first organic solvent.
  • the tip of the dropping tube is exposed to the refluxing liquid that has reached the boiling point, and polymerization may proceed in the dropping tube, which may generate a polymer insoluble in the matrix.
  • the raw material solution under non-refluxing as in the present invention, since there is no such problem, the generation of insoluble components can be suppressed.
  • the use of the dropping method in the polymerization under non-refluxing makes it easier to control the molecular weight.
  • the said organic solvent can be used as a 2nd solvent used for a solution.
  • the solution may further contain a monomer C having one radical polymerizable double bond in the molecule, and by dropping this solution into the first organic solvent, the monomer A and Monomer C may be copolymerized. By copolymerizing with a monofunctional monomer, the molecular weight distribution of the polymer can be stabilized.
  • a monomer C having one radical polymerizable double bond in the molecule by dropping this solution into the first organic solvent, the monomer A and Monomer C may be copolymerized.
  • the molecular weight distribution of the polymer can be stabilized.
  • preferred specific examples of the monomer C will be described.
  • the monomer C include, for example, styrene compounds such as styrene and ⁇ -methylstyrene; acrylonitrile compounds such as acrylonitrile and methacrylonitrile; N-vinyl compounds such as N-vinylformamide; (meth) acrylamide, N -Methylol (meth) acrylamide, diacetone (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, (meth) acryloylmorpholine, (meth) (Meth) acrylamide compounds such as acrylamide; methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate,
  • the monomer C may have a fluorine atom.
  • Monomer C having a fluorine atom is particularly useful as a surfactant and a surface modifier.
  • the monomer C having a fluorine atom one in which a part of the substituents of the monomer C is substituted with fluorine can be used. Specific examples are shown below.
  • polymerization method In the method for producing a soluble cross-linked polymer of the present invention, monomer A is polymerized in the presence of polymerization initiator B in a non-refluxing manner.
  • the polymerization reaction is carried out under normal pressure, under pressure and under pressure, or under reduced pressure, and is preferably carried out under normal pressure in view of simplicity of apparatus and operation. Further, preferably carried out in an atmosphere of inert gas such as N 2.
  • the first organic solvent since in the 10-hour half-life temperature T 10 than 20 ° C. or more higher than the temperature T of the polymerization initiator B is intended to be polymerized in a non-reflux, the first organic solvent, the polymerization temperature T An organic solvent having a temperature exceeding the boiling point is used.
  • Such a combination of the organic solvent and the polymerization initiator B can be appropriately selected from the specific examples of the organic solvent and the polymerization initiator B.
  • a first organic solvent by a 10-hour half-life temperature T 10 than 20 ° C. or more higher than the temperature T of the polymerization initiator B, the polymerization initiator decomposition quickly proceeds, the initiator fragment radical polymerization product of B It is possible to control the molecular weight so that the termination reaction with the growth terminal radical proceeds without stagnation and is soluble in the coating composition.
  • the weight average molecular weight Mw of the soluble crosslinked polymer obtained by the production method of the present invention is 1,000 to 300,000 in terms of polystyrene by gel permeation chromatography. From the viewpoint of compatibility with the coating composition, 1,000 to 50,000 is preferable.
  • the weight average molecular weight Mw and the number average molecular weight Mn can be measured by the methods described in Examples described later. Further, Mw / Mn as an index of molecular weight distribution is preferably 1.30 to 10.00, and more preferably 1.50 to 6.00.
  • the polymers (1) and (2) having a fluorine atom are useful as additives such as surface modifiers.
  • Table 1 lists materials used in the synthesis examples and comparative synthesis examples, their blend ratios, and molecular weights.
  • TSKgel SuperHZM-H TSKgel SuperHZ4000
  • TSKgel SuperHZ200 manufactured by Tosoh Corporation
  • T is the temperature of the organic solvent on the side to be dropped, that represents the polymerization temperature
  • T 10 represents a 10-hour half-life temperature of the polymerization initiator.
  • TT 10 indicates these differences.
  • the compounds 102 to 111 that are the polymers of the present invention and the compounds H101 to H104 that are the polymers of the comparative examples are described below.
  • the hyperbranched polymers obtained by polymerization under non-refluxing of the present invention for example, the polymers of Synthesis Example 1 and Synthesis Example 3, were polymerized under reflux.
  • Comparative Synthesis Example 3 and Comparative Synthesis Example The molecular weight is small and the variation in molecular weight is small compared to each polymer of 1. Further, from Synthesis Example 1 and Synthesis Example 10, a highly branched polymer having a smaller molecular weight and a smaller molecular weight variation can be obtained by copolymerizing a monofunctional monomer. Further, Comparative Synthesis Example 4 in which TT 10 is less than 20 ° C. has a large weight average molecular weight and a large variation in molecular weight even when polymerization is performed under non-reflux.
  • Compound 1 was synthesized by the method described in Example 1 of Japanese Patent No. 4841935. The structural formula of Compound 1 is shown below.
  • a hard coat film was prepared by using a coating liquid for hard coat layers A-1 to A-15 using a 25 ⁇ m-thick triacetyl cellulose film “TJ25” (manufactured by Fuji Film) unwound in a roll form. . Specifically, each coating solution was applied on a support at a conveying speed of 30 m / min by a die coating method using a slot die described in Example 1 of JP-A-2006-122889, and 150 ° C. at 150 ° C.
  • the coating layer was cured by irradiating the ultraviolet ray to form a hard coat layer, and then wound up.
  • the produced hard coat film was evaluated by the following evaluation method.
  • the film thickness of the hard coat layer was calculated by measuring the film thickness of a hard coat film produced using a contact-type film thickness meter, and subtracting the thickness of the support measured in the same manner. In all the hard coat films, the film thickness of the hard coat layer was 6.0 ⁇ m.
  • the hard coat layer used in the liquid crystal display device is examined.
  • the present invention is not limited to the hard coat layer, and the production method of the present invention is also used for producing other optical films that require high reliability.
  • the produced polymer can be used as an additive.
  • the method for producing a soluble cross-linked polymer of the present invention it is possible to obtain a highly branched polymer that suppresses the generation of impurities and has good compatibility with the matrix.
  • the compatibility with the coating composition is good, so that a film having a good surface shape in which the occurrence of bumpy defects is suppressed is formed. Obtainable.

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Abstract

[Problem] To provide a method for producing a soluble cross-linked polymer that is highly compatible with coating compositions, and that satisfactorily reduces pimple defects on a coating film when used as an additive. [Solution] A monomer A having two or more radical polymerizable double bonds per molecule is polymerized in a first organic solvent in the presence of a polymerization initiator B in an amount of 5 mol% to 200 mol% per mole of the monomer A,at a temperature that is at least 20˚C higher than the 10-hour half-life temperature of the polymerization initiator B, without refluxing.

Description

可溶性架橋型ポリマーの製造方法Method for producing soluble cross-linked polymer
 本発明は、可溶性架橋型ポリマーの製造方法に関する。 The present invention relates to a method for producing a soluble cross-linked polymer.
 液晶表示装置(LCD)等の画像表示装置では、表示面への傷付きを防止するために、支持体上にハードコート層を有するハードコートフィルムが設けられている。このようなフィルムは、塗膜の積層によって作製されるものが多い。ハードコート層組成物には通常、ハードコート層自体の塗膜の均質性を高めるため、含フッ素ポリマーなどのレベリング剤が添加されている。しかし、このレベリング剤の疎水性によってハードコート層表面は疎水化し、リコート性(積層性)が低下する。そこで、塗工時における基材に対する均質塗布性および塗工後のリコート性向上を目的として、特定のフッ素系界面活性剤または含フッ素ポリマーが添加されている。しかし、これらを含有する塗布組成物でも塗膜自体の均質性とリコート性の両立が十分でない。 In an image display device such as a liquid crystal display device (LCD), a hard coat film having a hard coat layer is provided on a support in order to prevent damage to the display surface. Many of such films are produced by laminating coating films. A leveling agent such as a fluorine-containing polymer is usually added to the hard coat layer composition in order to enhance the homogeneity of the coating film of the hard coat layer itself. However, the surface of the hard coat layer is hydrophobized by the hydrophobicity of the leveling agent, and the recoatability (lamination property) is lowered. Therefore, a specific fluorosurfactant or a fluorine-containing polymer is added for the purpose of improving the uniform coatability on the substrate during coating and improving the recoatability after coating. However, even a coating composition containing them does not have sufficient uniformity and recoatability of the coating film itself.
 近年、高分岐ポリマーおよびデンドリマー等、いわゆる3次元樹木状ポリマー(デンドリティックポリマーとも称される)が注目されている。このような高分岐ポリマーは、低溶融粘度、低溶解粘度、および高い溶解性等、通常の線状ポリマーとは異なる性質を有しており、界面活性剤や表面改質剤としての応用が期待されている。その場合、ポリマー自身の性状とともに、そのポリマーが添加されて形成される塗膜表面および塗膜を積層した場合の積層膜の界面の特性も重要である。 In recent years, so-called three-dimensional dendritic polymers (also called dendritic polymers) such as hyperbranched polymers and dendrimers have attracted attention. Such highly branched polymers have properties different from ordinary linear polymers, such as low melt viscosity, low melt viscosity, and high solubility, and are expected to be applied as surfactants and surface modifiers. Has been. In that case, the properties of the polymer itself and the properties of the coating film surface formed by adding the polymer and the interface of the laminated film when the coating film is laminated are also important.
 高分岐ポリマーの製造方法として、ビニルモノマーを含む系をラジカル重合させる方法があるが、分子量の制御が難しく、不溶不融のポリマーが生成される場合がある。そこで、高濃度のラジカル重合開始剤の存在下でモノマーを重合させる開始剤組み込みラジカル重合が提案されている。 As a method for producing a hyperbranched polymer, there is a method of radical polymerization of a system containing a vinyl monomer, but it is difficult to control the molecular weight, and an insoluble and infusible polymer may be produced. Therefore, an initiator-incorporated radical polymerization in which a monomer is polymerized in the presence of a high concentration radical polymerization initiator has been proposed.
 例えば、特許文献1には、分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、有機溶媒中でモノマーA1モルに対して5モル%乃至200モル%の量の重合開始剤Bの存在下で、重合開始剤Bの10時間半減期温度より20℃以上高い温度で還流下重合させる方法が開示されている。この製造方法によれば、簡便な方法で、分子量を制御することが可能であり、しかも重量平均分子量を溶媒に溶解できる範囲に制御可能であることが記載されている。 For example, Patent Document 1 discloses that a monomer A having two or more radically polymerizable double bonds in the molecule is a polymerization initiator in an amount of 5 mol% to 200 mol% with respect to 1 mol of the monomer A in an organic solvent. A method of polymerizing under reflux at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B in the presence of B is disclosed. It is described that according to this production method, the molecular weight can be controlled by a simple method, and the weight average molecular weight can be controlled within a range that can be dissolved in a solvent.
 また、特許文献2には、ラジカル重合性不飽和二重結合を1個有する単量体(A)およびラジカル重合性不飽和二重結合を2個以上有する単量体(B)を、(A)と(B)の合計モルに対して15モル%以上170モル%以下の重合開始剤(C)の存在下で重合させる方法が開示されている。この製造方法によれば、体積平均粒子径が1nm以上300nm以下の三次元ポリマーを簡便に得られることが記載されている。 Patent Document 2 discloses a monomer (A) having one radical polymerizable unsaturated double bond and a monomer (B) having two or more radical polymerizable unsaturated double bonds (A ) And (B), a method of polymerizing in the presence of 15 to 170 mol% of a polymerization initiator (C) is disclosed. According to this production method, it is described that a three-dimensional polymer having a volume average particle diameter of 1 nm to 300 nm can be easily obtained.
特許第5773159号公報Japanese Patent No. 5773159 特許第4009700号公報Japanese Patent No. 4009700
 本発明者は、上記特許文献1に記載の方法によって得られた高分岐ポリマーを、一例として、液晶表示装置等の画像表示装置に用いるハードコート層を作製するための塗布組成物に表面改質剤として添加し、その組成物を塗膜としたところ、硬化後の膜の表面に、不純物に起因する複数の微小な輝点状の欠陥、いわゆるブツ状欠陥が発生した。このように、高分岐ポリマーを塗布組成物に表面改質剤等として添加する場合は、さらに高いレベル(主として検出限界以下)での不純物の生成を抑制することが求められる。
 本発明は、上記事情に鑑みてなされたものであり、高分岐ポリマーを塗布組成物の添加剤として用いた場合に不溶成分が生じ難く、塗布組成物との相溶性が良好であって、かつその組成物を塗膜とした場合にブツ状欠陥が良好に低減される可溶性架橋型ポリマーの製造方法を提供することを目的とする。
The present inventor, as an example, uses a hyperbranched polymer obtained by the method described in Patent Document 1 as a surface modification to a coating composition for producing a hard coat layer used in an image display device such as a liquid crystal display device. When it was added as an agent and the composition was used as a coating film, a plurality of minute bright spot-like defects, so-called lumpy defects, caused by impurities were generated on the surface of the cured film. Thus, when a highly branched polymer is added to the coating composition as a surface modifier or the like, it is required to suppress the generation of impurities at a higher level (mainly below the detection limit).
The present invention has been made in view of the above circumstances, and when a highly branched polymer is used as an additive for a coating composition, an insoluble component is hardly generated, the compatibility with the coating composition is good, and It is an object of the present invention to provide a method for producing a soluble cross-linked polymer in which, when the composition is used as a coating film, the uneven defects are satisfactorily reduced.
 上記のようなブツ状欠陥は、目的としない副生成物、主として検出限界以下の不純物成分によるものと本発明者らは考えた。そして、この不純物の発生の原因は、還流下の重合反応における温度制御にあるのではないかと推測した。すなわち、還流でモノマー溶液を滴下すると、目的とする高分子が生成する温度ではないところで、混合系の温度が一定になることがあり、その結果、温度が低くなるとより高分子量のポリマーが生成し、温度が高くなると低分子量のポリマーが生成される。そこで、本発明者は、温度制御が良いと考えられていた還流ではなく、非還流法としたところ、意外にも、不純物成分の生成を低減することができ、ブツ状欠陥が抑制できることを見出し、本発明に至った。 The present inventors thought that the above-mentioned lumpy defects were caused by undesired by-products, mainly impurity components below the detection limit. And it was speculated that the cause of the generation of impurities may be temperature control in the polymerization reaction under reflux. That is, when the monomer solution is added dropwise at reflux, the temperature of the mixed system may become constant at a temperature that is not the temperature at which the target polymer is formed, and as a result, a higher molecular weight polymer is formed when the temperature is lowered. As the temperature increases, a low molecular weight polymer is produced. Therefore, the present inventor found that the non-reflux method was used instead of the recirculation method which was thought to have good temperature control. The present invention has been reached.
 本発明の可溶性架橋型ポリマーの製造方法は、分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、第一の有機溶媒中でモノマーA1モルに対して5モル%以上200モル%以下の量の重合開始剤Bの存在下、重合開始剤Bの10時間半減期温度より20℃以上高い温度で非還流下にて重合させる。 In the method for producing a soluble cross-linked polymer of the present invention, the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% to 200 mol with respect to 1 mol of the monomer A in the first organic solvent. In the presence of a polymerization initiator B in an amount of not more than%, the polymerization is carried out under non-refluxing at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B.
 モノマーA、重合開始剤Bおよび第二の有機溶媒を含む溶液を、第一の有機溶媒中へ滴下することによって、モノマーAを重合させてもよい。 The monomer A may be polymerized by dropping a solution containing the monomer A, the polymerization initiator B and the second organic solvent into the first organic solvent.
 溶液中に、分子内にラジカル重合性二重結合を1個有するモノマーCをさらに含んでもよく、この溶液を第一の有機溶媒中へ滴下することにより、モノマーAとモノマーCとを重合させてもよい。 The solution may further contain a monomer C having one radical polymerizable double bond in the molecule, and the monomer A and the monomer C are polymerized by dropping this solution into the first organic solvent. Also good.
 可溶性架橋型ポリマーの重量平均分子量は、ゲル浸透クロマトグラフィーによるポリスチレン換算で1,000~300,000が好ましい。 The weight average molecular weight of the soluble cross-linked polymer is preferably 1,000 to 300,000 in terms of polystyrene by gel permeation chromatography.
 可溶性架橋型ポリマーの重量平均分子量は、ゲル浸透クロマトグラフィーによるポリスチレン換算で1,000~50,000が好ましい。 The weight average molecular weight of the soluble cross-linked polymer is preferably 1,000 to 50,000 in terms of polystyrene by gel permeation chromatography.
 本発明の可溶性架橋型ポリマーの製造方法は、分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、第一の有機溶媒中でモノマーA1モルに対して5モル%以上200モル%以下の量の重合開始剤Bの存在下、重合開始剤Bの10時間半減期温度より20℃以上高い温度で非還流下にて重合させるものである。この方法によれば、不純物の生成を良好に抑制することができる。このため、得られたポリマーを塗布組成物に添加剤として用いた場合、塗布組成物との相溶性が良好であり、ブツ状欠陥が良好に低減された膜を得ることができる。これは、沸点より低い温度で重合する非還流とすることによって、微量の不純物の生成を抑えることができたためと推定する。 In the method for producing a soluble cross-linked polymer of the present invention, the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% to 200 mol with respect to 1 mol of the monomer A in the first organic solvent. Polymerization is carried out in a non-reflux state at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B in the presence of a polymerization initiator B in an amount of% or less. According to this method, the generation of impurities can be suppressed satisfactorily. For this reason, when the obtained polymer is used as an additive in a coating composition, it is possible to obtain a film having good compatibility with the coating composition and having well-formed defects. This is presumed to be because the production of a trace amount of impurities could be suppressed by setting the non-reflux to polymerize at a temperature lower than the boiling point.
 以下、本発明の可溶性架橋型ポリマーの製造方法について説明する。以下の説明は、本発明の代表的な実施形態に基づいてなされることがあるが、本発明はそのような実施態様に限定されるものではない。なお、本明細書において、「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値および上限値として含む範囲を意味する。 Hereinafter, a method for producing the soluble cross-linked polymer of the present invention will be described. The following description may be made based on representative embodiments of the present invention, but the present invention is not limited to such embodiments. In this specification, a numerical range expressed using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
[可溶性架橋型ポリマーの製造方法]
 本発明の可溶性架橋型ポリマーの製造方法は、分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、第一の有機溶媒中で、モノマーA1モルに対して5モル%以上200モル%以下の量の重合開始剤Bの存在下、重合開始剤Bの10時間半減期温度(以下、T10と記載する場合がある。)より20℃以上高い温度(以下、重合温度Tと記載する場合がある。)で非還流下にて重合させるものである。
 非還流下で重合させることによって微量の不純物の生成が抑えられたものと考えられ、その結果、本発明の製造方法により製造された高分岐ポリマーを塗布組成物の添加剤として用いた場合に、塗布組成物との相溶性が良いためブツ状欠陥が抑制された良好な膜表面形状を得ることができる。
 まず、可溶性架橋型ポリマーの製造方法に用いる材料について説明する。
[Method for producing soluble cross-linked polymer]
In the method for producing a soluble cross-linked polymer of the present invention, the monomer A having two or more radical polymerizable double bonds in the molecule is added in an amount of 5 mol% or more to 200 mol% with respect to 1 mol of the monomer A in the first organic solvent. the presence of mol% of the amount of the polymerization initiator B, 10-hour half-life temperature of the polymerization initiator B (hereinafter, may be described as T 10.) from 20 ° C. or higher high temperature (hereinafter, the polymerization temperature T And may be polymerized under non-reflux.
It is considered that the production of a trace amount of impurities was suppressed by polymerization under non-reflux, and as a result, when the hyperbranched polymer produced by the production method of the present invention was used as an additive for a coating composition, Since the compatibility with the coating composition is good, it is possible to obtain a good film surface shape with suppressed irregularities.
First, the material used for the manufacturing method of a soluble bridge | crosslinking type polymer is demonstrated.
(モノマーA)
 モノマーAは、分子内に2個以上のラジカル重合性二重結合を有する多官能モノマーである。
 モノマーAに用いられる多官能モノマーとしては、例えば、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、ネオペンチルグリコール(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、3-メチルペンタンジオールジ(メタ)アクリレート、ジエチレングリコールビスβ-(メタ)アクリロイルオキシプロピネート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、トリ(2-ヒドロキシエチル)イソシアネートジ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、2,3-ビス(メタ)アクリロイルオキシエチルオキシメチル[2.2.1]ヘプタン、ポリ1,2-ブタジエンジ(メタ)アクリレート、1,2-ビス(メタ)アクリロイルオキシメチルヘキサン、ノナエチレングリコールジ(メタ)アクリレート、テトラデカンエチレングリコールジ(メタ)アクリレート、10-デカンジオール(メタ)アクリレート、3,8-ビス(メタ)アクリロイルオキシメチルトリシクロ[5.2.10]デカン、2,2-ビス(4-(メタ)アクリロイルオキシジエトキシフェニル)プロパン、1,4-ビス((メタ)アクリロイルオキシメチル)シクロヘキサン、ヒドロキシピバリン酸エステルネオペンチルグリコールジ(メタ)アクリレート、EO(エチレンオキサイド)変性トリメチロールプロパントリ(メタ)アクリレート、PO(プロピレンオキサイド)変性トリメチロールプロパントリ(メタ)アクリレート、EO変性リン酸トリ(メタ)アクリレート、1,2,3-クロヘキサンテトラメタクリレート、ポリウレタンポリアクリレート、ポリエステルポリアクリレート、カプロラクトン変性トリス(アクリロキシエチル)イソシアヌレート等が挙げられる。
(Monomer A)
Monomer A is a polyfunctional monomer having two or more radically polymerizable double bonds in the molecule.
Examples of the polyfunctional monomer used for the monomer A include 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol (meth) acrylate, and ethylene glycol di (meth) acrylate. ) Acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, 3-methylpentanediol di (meth) acrylate, diethylene glycol bis β- (meth) acryloyloxy Propinate, trimethylolethane tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meta) Acrylate, tri (2-hydroxyethyl) isocyanate di (meth) acrylate, pentaerythritol tetra (meth) acrylate, 2,3-bis (meth) acryloyloxyethyloxymethyl [2.2.1] heptane, poly 1,2 Butadiene di (meth) acrylate, 1,2-bis (meth) acryloyloxymethylhexane, nonaethylene glycol di (meth) acrylate, tetradecane ethylene glycol di (meth) acrylate, 10-decanediol (meth) acrylate, 3, 8-bis (meth) acryloyloxymethyltricyclo [5.2.10] decane, 2,2-bis (4- (meth) acryloyloxydiethoxyphenyl) propane, 1,4-bis ((meth) acryloyloxy Methyl) cyclohexane, Hydroxypivalate ester neopentyl glycol di (meth) acrylate, EO (ethylene oxide) modified trimethylolpropane tri (meth) acrylate, PO (propylene oxide) modified trimethylolpropane tri (meth) acrylate, EO modified triphosphate (meta) ) Acrylate, 1,2,3-chlorohexane tetramethacrylate, polyurethane polyacrylate, polyester polyacrylate, caprolactone-modified tris (acryloxyethyl) isocyanurate, and the like.
 モノマーAは、分子内に3個以上の(メタ)アクリロイル基を有する多官能アクリレート系化合物であってもよい。具体例としては、日本化薬(株)製KAYARAD DPHA、同DPHA-2C、同PET-30、同TMPTA、同TPA-320、同TPA-330、同RP-1040、同T-1420、同D-310、同DPCA-20、同DPCA-30、同DPCA-60、同GPO-303、大阪有機化学工業(株)製V#400、V#36095D等のポリオールと(メタ)アクリル酸のエステル化物を挙げることができる。また紫光UV-1400B、同UV-1700B、同UV-6300B、同UV-7550B、同UV-7600B、同UV-7605B、同UV-7610B、同UV-7620EA、同UV-7630B、同UV-7640B、同UV-6630B、同UV-7000B、同UV-7510B、同UV-7461TE、同UV-3000B、同UV-3200B、同UV-3210EA、同UV-3310EA、同UV-3310B、同UV-3500BA、同UV-3520TL、同UV-3700B、同UV-6100B、同UV-6640B、同UV-2000B、同UV-2010B、同UV-2250EA、同UV-2750B(日本合成化学(株)製)、UL-503LN(共栄社化学(株)製)、ユニディック17-806、同17-813、同V-4030、同V-4000BA(大日本インキ化学工業(株)製)、EB-1290K、EB-220、EB-5129、EB-1830,EB-4358(ダイセルUCB(株)製)、ハイコープAU-2010、同AU-2020((株)トクシキ製)、アロニックスM-1960(東亞合成(株)製)、アートレジンUN-3320HA,UN-3320HC,UN-3320HS、UN-904,HDP-4Tなどの3官能以上のウレタンアクリレート化合物、アロニックスM-8100,M-8030,M-9050(東亞合成(株)製、KBM-8307(ダイセルサイテック(株)製)の3官能以上のポリエステル化合物なども好適に使用することができる。
 モノマーAは、上記の中から、1種類のみを用いてもよいし、2種類以上の混合物を用いてもよい。
Monomer A may be a polyfunctional acrylate compound having three or more (meth) acryloyl groups in the molecule. Specific examples include KAYARAD DPHA, DPHA-2C, PET-30, TMPTA, TPA-320, TPA-330, RP-1040, T-1420, and D from Nippon Kayaku Co., Ltd. -310, DPCA-20, DPCA-30, DPCA-60, GPO-303, Osaka Organic Chemical Industry Co., Ltd. V # 400, V # 36095D, etc. Can be mentioned. Purple light UV-1400B, UV-1700B, UV-6300B, UV-7550B, UV-7600B, UV-7605B, UV-7610B, UV-7620EA, UV-7630B, UV-7630B, UV-7640B UV-6630B, UV-7000B, UV-7510B, UV-7461TE, UV-3000B, UV-3200B, UV-3210EA, UV-3310EA, UV-3310EA, UV-3310B, UV-3500BA UV-3520TL, UV-3700B, UV-6100B, UV-6640B, UV-2000B, UV-2010B, UV-2250EA, UV-2250EA (manufactured by Nippon Synthetic Chemical Co., Ltd.), UL-503LN (manufactured by Kyoeisha Chemical Co., Ltd.), Unidic 17-80 17-813, V-4030, V-4000BA (Dainippon Ink Chemical Co., Ltd.), EB-1290K, EB-220, EB-5129, EB-1830, EB-4358 (Daicel UCB ( Ltd.), High Corp AU-2010, AU-2020 (manufactured by Tokushi Co., Ltd.), Aronix M-1960 (manufactured by Toagosei Co., Ltd.), Art Resin UN-3320HA, UN-3320HC, UN-3320HS, UN Trifunctional urethane acrylate compounds such as -904, HDP-4T, etc., Aronix M-8100, M-8030, M-9050 (manufactured by Toagosei Co., Ltd., KBM-8307 (manufactured by Daicel Cytec Co., Ltd.)) The above polyester compounds and the like can also be suitably used.
Only one type of monomer A may be used from the above, or a mixture of two or more types may be used.
(重合開始剤B)
 本発明の可溶性架橋型ポリマーの製造方法において、重合開始剤Bは、モノマーA1モルに対して5モル%以上200モル%以下の量を存在させる。重合開始剤Bの量を5モル%以上200モル%以下とすることにより、可溶性架橋型ポリマーを、分子量を良好に制御して作製することができる。そして、得られたポリマーを塗布組成物の添加剤として用いた場合、いわゆるブツ状欠陥を良好に低減することができる。
 重合開始剤Bとしては、アゾ重合開始剤、パーオキサイド重合開始剤、およびパーオキサイド重合開始剤と還元剤とを併用したレドックス重合開始剤、および上記の2種以上の混合物等が挙げられる。
(Polymerization initiator B)
In the method for producing a soluble crosslinked polymer of the present invention, the polymerization initiator B is present in an amount of 5 mol% or more and 200 mol% or less with respect to 1 mol of the monomer A. By setting the amount of the polymerization initiator B to 5 mol% or more and 200 mol% or less, it is possible to produce a soluble cross-linked polymer with good molecular weight control. And when the obtained polymer is used as an additive of a coating composition, what is called a dent-like defect can be reduced favorably.
Examples of the polymerization initiator B include an azo polymerization initiator, a peroxide polymerization initiator, a redox polymerization initiator using a peroxide polymerization initiator and a reducing agent in combination, and a mixture of two or more of the above.
 アゾ重合開始剤としては、油溶性アゾ重合開始剤が好ましい。具体的には、2,2’-アゾビスイソブチロニトリル、1,1’-アゾビスシクロヘキサン1-カーボニトリル、2,2’-アゾビス-4-メトキシ-2,4-ジメチルバレロニトリル、2,2’-アゾビス-2,4-ジメチルバレロニトリル、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)、2,2’-アゾビス(2-メチルブチロニトリル)、2,2’-アゾビス(2,4,4-トリメチルペンタン)、ジメチル2,2’-アゾビスイソブチレート、1,1’-アゾビス(1-アセトキシ-1-フェニルエタン)等が挙げられる。
 これらのうちで特に好ましいものは、2,2’-アゾビスイソブチロニトリル、ジメチル2,2’-アゾビスイソブチレートである。
As the azo polymerization initiator, an oil-soluble azo polymerization initiator is preferable. Specifically, 2,2′-azobisisobutyronitrile, 1,1′-azobiscyclohexane 1-carbonitrile, 2,2′-azobis-4-methoxy-2,4-dimethylvaleronitrile, 2 2,2′-azobis-2,4-dimethylvaleronitrile, 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2′-azobis (2-methylbutyronitrile), 2 2,2′-azobis (2,4,4-trimethylpentane), dimethyl 2,2′-azobisisobutyrate, 1,1′-azobis (1-acetoxy-1-phenylethane) and the like.
Of these, 2,2′-azobisisobutyronitrile and dimethyl 2,2′-azobisisobutyrate are particularly preferable.
 パーオキサイド重合開始剤としては、下記油溶性パーオキサイド重合開始剤が好ましく用いられる。
(1)ケトンパーオキサイド(メチルエチルパーオキサイド、メチルイソブチルパーオキサイド、アセチルアセトンパーオキサイド、シクロヘキサノンパーオキサイド等)、
(2)ハイドロパーオキサイド(1,1,3,3-テトラメチルブチルパーオキサイド、クメンヒドロパーオキサイド、t-ブチルハイドロパーオキサイド等)、
(3)ジアシルパーオキサイド(イソブチリルパーオキサイド、ビス-3,5,5-トリメチルヘキサノイルパーオキサイド、ラウロイルパーオキサイド、ベンゾイルパーオキサイド等)、
(4)ジアルキルパーオキサイド(ジクミルパーオキサイド、2,5-ジメチル-2,5-ジ-(t-ブチルペルオキシヘキサン)、1,3-ビス(t-ブチルペルオキシイソプロピル)ベンゼン、t-ブチルクミルパーオキサイド、ジ-t-ブチルパーオキサイド、
 2,5-ジメチル-2,5ジ-(t-ブチルペルオキシ)ヘキセン、トリス(t-ブチルペルオキシ)トリアジン等)、
(5)パーオキシケタール(1,1-ジ-t-ブチルペルオキシ-3,3,5-トリメチルシクロヘキシルパーオキサイド、1,1-ジ-t-ペルオキシシクロヘキサン、2,2-ジ(t-)ブチルペルオキシ)ブタン、4,4-ジ-t-ブチルペルオキシ吉草酸-n-ブチルエステル、2,2-ビス(4,4-ジ-t-ブチルペルオキシシクロヘキシル)プロパン等)、
(6)アルキルパーエステル(1,1,3,3-テトラメチルブチルペルオキシネオデカノエート、α-クミルペルオキシネオデカノエート、t-ブチルペルオキシネオデカノエート、t-ブチルペルオキシネオペンタノエート、t-ブチルペルオキシピバレート、t-ブチルペルオキシピバレート、1,1,3,3-テトラメチルブチルペルオキシ2-エチルヘキサノエート、t-アミルペルオキシ2-エチルヘキサノエート、t-ブチルペルオキシ2-エチルヘキサノエート、t-ブチルペルオキシイソブチレート、ジ-t-ブチルペルオキシヘキサヒドロテトラフタレート、t-アミルペルオキシ3,5,5-トリメチルヘキサノエート、t-ブチルペルオキシ3,5,5-トリメチルヘキサノエート、t-ブチルペルオキシアセテート、t-ブチルパーオキシベンゾエート、ジ-ブチルペルオキシトリメチルアジペート等)、および
(7)パーカーボネート(ジ-3-メトキシブチルペルオキシジカーボネート、ジ-2-エチルヘキシルペルオキシジカーボネート、ビス(4-t-ブチルシクロヘキシル)ペルオキシジカーボネート、ジ-イソプロピルペルオキシジカーボネート、t-ブチルペルオキシイソプロピルカーボネート、t-ブチルペルオキシ2-エチルヘキシルカーボネート、1,6-ビス(t-ブチルペルオキシカルボニロイル)ヘキサン、ジエチレングリコール-ビス(t-ブチルペルオキシカーボネート)等)が挙げられる。
 これらのうちで好ましいものは、(1)ケトンパーオキサイド、(2)ハイドロパーオキサイド、(4)ジアルキルパーオキサイドおよび(6)アルキルパーエステルであり、特に好ましいものは、メチルエチルケトンパーオキサイド、クメンヒドロパーオキサイド、ジ-t-ブチルパーオキサイドおよびt-ブチルパーオキシベンゾエートである。
As the peroxide polymerization initiator, the following oil-soluble peroxide polymerization initiators are preferably used.
(1) ketone peroxide (methyl ethyl peroxide, methyl isobutyl peroxide, acetylacetone peroxide, cyclohexanone peroxide, etc.),
(2) Hydroperoxide (1,1,3,3-tetramethylbutyl peroxide, cumene hydroperoxide, t-butyl hydroperoxide, etc.),
(3) Diacyl peroxide (isobutyryl peroxide, bis-3,5,5-trimethylhexanoyl peroxide, lauroyl peroxide, benzoyl peroxide, etc.),
(4) Dialkyl peroxide (dicumyl peroxide, 2,5-dimethyl-2,5-di- (t-butylperoxyhexane), 1,3-bis (t-butylperoxyisopropyl) benzene, t-butylcumi Ruperoxide, di-t-butyl peroxide,
2,5-dimethyl-2,5di- (t-butylperoxy) hexene, tris (t-butylperoxy) triazine, etc.),
(5) Peroxyketal (1,1-di-t-butylperoxy-3,3,5-trimethylcyclohexyl peroxide, 1,1-di-t-peroxycyclohexane, 2,2-di (t-) butyl Peroxy) butane, 4,4-di-t-butylperoxyvaleric acid-n-butyl ester, 2,2-bis (4,4-di-t-butylperoxycyclohexyl) propane, etc.),
(6) Alkyl perester (1,1,3,3-tetramethylbutylperoxyneodecanoate, α-cumylperoxyneodecanoate, t-butylperoxyneodecanoate, t-butylperoxyneopentanoate Ate, t-butyl peroxypivalate, t-butyl peroxypivalate, 1,1,3,3-tetramethylbutylperoxy 2-ethylhexanoate, t-amylperoxy 2-ethylhexanoate, t-butylperoxy 2-ethylhexanoate, t-butylperoxyisobutyrate, di-t-butylperoxyhexahydrotetraphthalate, t-amylperoxy3,5,5-trimethylhexanoate, t-butylperoxy3,5,5 -Trimethylhexanoate, t-butyl peroxyacetate , T-butylperoxybenzoate, di-butylperoxytrimethyladipate, etc.) and (7) percarbonate (di-3-methoxybutylperoxydicarbonate, di-2-ethylhexylperoxydicarbonate, bis (4-t-butyl) (Cyclohexyl) peroxydicarbonate, di-isopropylperoxydicarbonate, t-butylperoxyisopropylcarbonate, t-butylperoxy-2-ethylhexylcarbonate, 1,6-bis (t-butylperoxycarbonoyl) hexane, diethylene glycol-bis (t -Butyl peroxycarbonate)) and the like.
Among these, preferred are (1) ketone peroxide, (2) hydroperoxide, (4) dialkyl peroxide and (6) alkyl perester, and particularly preferred are methyl ethyl ketone peroxide and cumene hydroperoxide. Oxides, di-t-butyl peroxide and t-butyl peroxybenzoate.
 レドックス重合開始剤としては、油溶性レドックス重合開始剤が用いられる。パーオキサイド重合開始剤としては、例えば、ヒドロペルオキサイド(t-ブチルヒドロキシペルオキサイド、クメンヒドロペルオキサイド等)、過酸化ジアルキル(過酸化ラウロイル等)および過酸化ジアシル(過酸化ベンゾイル等)等の油溶性過酸化物等が挙げられる。還元剤としては、第三アミン(トリエチルアミン、トリブチルアミン等)、ナフテン酸塩、メルカプタン(メルカプトエタノール、ラウリルメルカプタン等)、有機金属化合物(トリエチルアルミニウム、トリエチルホウ素及びジエチル亜鉛等)等の油溶性還元剤等が挙げられる。これらのなかで、パーオキサイド重合開始剤と還元剤の好ましい具体的な組み合わせの例としては、クメンヒドロパーオキサイド-トリエチルアルミニウム、過酸化ベンゾイル-トリエチルアミン等が挙げられる。 An oil-soluble redox polymerization initiator is used as the redox polymerization initiator. Examples of peroxide polymerization initiators include oils such as hydroperoxides (t-butylhydroxyperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (such as lauroyl peroxide), and diacyl peroxides (benzoyl peroxide, etc.). Examples thereof include soluble peroxides. Reducing agents include oil-soluble reducing agents such as tertiary amines (triethylamine, tributylamine, etc.), naphthenates, mercaptans (mercaptoethanol, lauryl mercaptan, etc.), organometallic compounds (triethylaluminum, triethylboron, diethylzinc, etc.) Etc. Among these, examples of preferable specific combinations of the peroxide polymerization initiator and the reducing agent include cumene hydroperoxide-triethylaluminum, benzoyl peroxide-triethylamine and the like.
(有機溶媒)
 本発明の可溶性架橋型ポリマーの製造方法は、分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、第一の有機溶媒中で非還流下にて重合させるものである。
 重合反応に用いる第一の有機溶媒として、以下の有機溶媒が挙げられる。例えば、ベンゼン、トルエン、キシレン、エチルベンゼン、テトラリン等の芳香族炭化水素系溶媒;n-ヘキサン、n-ヘプタン、ミネラルスピリット、シクロヘキサン等の脂肪族又は脂環式炭化水素系溶媒;塩化メチル、臭化メチル、ヨウ化メチル、メチレンジクロライド、クロロホルム、四塩化炭素、トリクロロエチレン、パークロロエチレン、オルトジクロロベンゼン等のハロゲン系溶媒;酢酸エチル、酢酸ブチル、メトキシブチルアセテート、メチルセロソルブアセテート、エチルセロソルブアセテート、プロピレングリコールモノメチルエーテルアセテート等のエステル系又はエステルエーテル系溶媒;ジエチルエーテル、テトラヒドロフラン、1,4-ジオキサン、エチルセロソルブ、ブチルセロソルブ、プロピレングリコールモノメチルエーテル等のエーテル系溶媒;アセトン、メチルエチルケトン、メチルイソブチルケトン、ジ-n-ブチルケトン、シクロヘキサノン等のケトン系溶媒;メタノール、エタノール、n-プロパノール、イソプロパノール、n-ブタノール、イソブタノール、t-ブタノール、2-エチルヘキシルアルコール、ベンジルアルコール、エチレングリコール、プロピレングリコール等のアルコール系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒;ジメチルスルホキシド等のスルホキシド系溶媒、N-メチル-2-ピロリドン等の複素環式化合物系溶媒、並びにこれらの2種以上の混合溶媒が挙げられる。
 これらのうち好ましいのは、芳香族炭化水素系溶媒、ハロゲン系溶媒、エステル系溶媒、エーテル系溶媒、ケトン系溶媒、アルコール系溶媒、アミド系溶媒、スルホキシド系溶媒等である。
(Organic solvent)
In the method for producing a soluble cross-linked polymer of the present invention, the monomer A having two or more radical polymerizable double bonds in the molecule is polymerized in a first organic solvent under non-reflux.
Examples of the first organic solvent used for the polymerization reaction include the following organic solvents. For example, aromatic hydrocarbon solvents such as benzene, toluene, xylene, ethylbenzene, tetralin; aliphatic or alicyclic hydrocarbon solvents such as n-hexane, n-heptane, mineral spirit, cyclohexane; methyl chloride, bromide Halogen solvents such as methyl, methyl iodide, methylene dichloride, chloroform, carbon tetrachloride, trichloroethylene, perchloroethylene, orthodichlorobenzene; ethyl acetate, butyl acetate, methoxybutyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol Ester or ester ether solvents such as monomethyl ether acetate; diethyl ether, tetrahydrofuran, 1,4-dioxane, ethyl cellosolve, butyl cellosolve, propylene glycol Ether solvents such as nomethyl ether; ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, di-n-butyl ketone, cyclohexanone; methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, t-butanol Alcohol solvents such as 2-ethylhexyl alcohol, benzyl alcohol, ethylene glycol and propylene glycol; amide solvents such as N, N-dimethylformamide and N, N-dimethylacetamide; sulfoxide solvents such as dimethyl sulfoxide, N-methyl Examples include heterocyclic compound solvents such as -2-pyrrolidone, and mixed solvents of two or more of these.
Of these, aromatic hydrocarbon solvents, halogen solvents, ester solvents, ether solvents, ketone solvents, alcohol solvents, amide solvents, sulfoxide solvents and the like are preferable.
 中でも、大気圧下において90℃~200℃の沸点を有する有機溶媒を用いることが好ましく、例えばトルエン、キシレン、オルトジクロロベンゼン、酢酸ブチル、ジオキサン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、n-プロパノール、メチルイソブチルケトン、およびシクロヘキサノン等が挙げられる。 Among them, it is preferable to use an organic solvent having a boiling point of 90 ° C. to 200 ° C. under atmospheric pressure, for example, toluene, xylene, orthodichlorobenzene, butyl acetate, dioxane, N, N-dimethylformamide, N, N-dimethylacetamide. Propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, n-propanol, methyl isobutyl ketone, and cyclohexanone.
 有機溶媒の量は、良好に温度制御する観点から、モノマーAの1質量部に対し、好ましくは0.3~100質量部、さらに好ましくは0.5~50質量部である。 The amount of the organic solvent is preferably 0.3 to 100 parts by mass, more preferably 0.5 to 50 parts by mass with respect to 1 part by mass of the monomer A from the viewpoint of good temperature control.
 また、本発明の製造方法は、モノマーA、重合開始剤B、および第二の有機溶媒を含む溶液を、重合開始剤Bの10時間半減期温度T10より20℃以上高い温度Tに保たれた第一の有機溶媒中へ滴下することにより重合させることが好ましい。
 還流下で原料溶液を滴下させると、滴下管の先端が沸点に達した還流液に曝されることになり、滴下管の中で重合が進行し、マトリクスに不溶なポリマーが生成される可能性があるという問題が一方ではあった。しかし、本発明のように非還流下で原料溶液を滴下させることにより、このような問題がないため、不溶成分の生成を抑えることができる。このように、非還流下での重合において滴下法を用いることは、分子量の制御をさらに容易にするものである。
 なお、溶液に用いる第二の溶媒としては、上記有機溶媒を用いることができる。
The manufacturing method of the present invention, the monomer A, the polymerization initiator B, and the solution containing the second organic solvent, kept at a higher temperature T than the 10-hour half-life temperature T 10 20 ° C. or more polymerization initiator B It is preferable to polymerize by dropping into the first organic solvent.
When the raw material solution is dropped under reflux, the tip of the dropping tube is exposed to the refluxing liquid that has reached the boiling point, and polymerization may proceed in the dropping tube, which may generate a polymer insoluble in the matrix. On the other hand there was a problem that there was. However, by dropping the raw material solution under non-refluxing as in the present invention, since there is no such problem, the generation of insoluble components can be suppressed. As described above, the use of the dropping method in the polymerization under non-refluxing makes it easier to control the molecular weight.
In addition, the said organic solvent can be used as a 2nd solvent used for a solution.
(モノマーC)
 本発明の製造方法では、溶液中に、分子内にラジカル重合性二重結合を1個有するモノマーCをさらに含んでもよく、この溶液を第一の有機溶媒中へ滴下することにより、モノマーAとモノマーCとを共重合させてもよい。単官能モノマーと共重合させることにより、ポリマーの分子量分布を安定させることができる。以下、モノマーCとして好ましい具体例を記載する。
 モノマーCの好ましい具体例としては、例えば、スチレン、α-メチルスチレン等のスチレン化合物;アクリロニトリル、メタクリロニトリル等のアクリロニトリル化合物;N-ビニルフォルムアミド等のN-ビニル化合物;(メタ)アクリルアミド、N-メチロール(メタ)アクリルアミド、ジアセトン(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、(メタ)アクリロイルモルホリン、(メタ)アクリルアミド等の(メタ)アクリルアミド化合物;メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、アミル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、オクチル(メタ)アクリレート、t-オクチル(メタ)アクリレート、2-クロロエチル(メタ)アクリレート、2-ブロモエチルアクリレート、4-クロロブチルアクリレート、シアノエチルアクリレート、2-アセトキシエチル(メタ)アクリレート、アセトアセトキシエチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、カルビトール(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、ベンジル(メタ)アクリレート、トリデシル(メタ)アクリレート、2-フェノキシエチル(メタ)アクリレート、グリシジル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ジシクロペンテニルオキシエチル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシプロピル(メタ)アクリレート、2-アクリロイロキシエチルフタル酸、メトキシ-ポリエチレングリコール(メタ)アクリレート、2-アクリロイロキシエチル-2-ヒドロキシエチルフタル酸、2-(2-エトキシエトキシ)エチル(メタ)アクリレート、2-メトキシエチル(メタ)アクリレート、3-メトキシブチル(メタ)アクリレート、エトキシ化フェニル(メタ)アクリレート、2-(メタ)アクリロイロキシエチルコハク酸、ノニルフェノールEO付加物(メタ)アクリレート、フェノキシ-ポリエチレングリコール(メタ)アクリレート、2-(メタ)アクリロイロキシエチルヘキサヒドロフタル酸、ラクトン変性(メタ)アクリレート、ステアリル(メタ)アクリレート、イソアミル(メタ)アクリレート、イソミリスチル(メタ)アクリレート、イソステアリル(メタ)アクリレート、ラクトン変性(メタ)アクリレート等の(メタ)アクリレート化合物;アリルグリシジルエーテル等のアリル化合物;メチルビニルエーテル、エチルビニルエーテル、n-プロピルビニルエーテル、イソプロピルビニルエーテル、n-ブチルビニルエーテル、イソブチルビニルエーテル、t-ブチルビニルエーテル、n-オクタデシルビニルエーテル、2-エチルヘキシルビニルエーテル、n-ノニルビニルエーテル、ドデシルビニルエーテル、オクタデシルビニルエーテル、シクロヘキシルビニルエーテル、シクロヘキシルメチルビニルエーテル、4-メチルシクロヘキシルメチルビニルエーテル、ベンジルビニルエーテル、ジシクロペンテニルビニルエーテル、2-ジシクロペンテノキシエチルビニルエーテル、メトキシエチルビニルエーテル、エトキシエチルビニルエーテル、ブトキシエチルビニルエーテル、メトキシエトキシエチルビニルエーテル、エトキシエトキシエチルビニルエーテル、メトキシポリエチレングリコールビニルエーテル、テトラヒドロフリフリルビニルエーテル、2-ヒドロキシエチルビニルエーテル、2-ヒドロキシプロピルビニルエーテル、4-ヒドロキシブチルビニルエーテル、4-ヒドロキシメチルシクロヘキシルメチルビニルエーテル、ジエチレングリコールモノビニルエーテル、ポリエチレングリコールビニルエーテル、クロルエチルビニルエーテル、クロルブチルビニルエーテル、クロルエトキシエチルビニルエーテル、フェニルエチルビニルエーテル、フェノキシポリエチレングリコールビニルエーテル、シクロヘキサンジメタノールモノビニルエーテル、イソプロペニルエーテル-O-プロピレンカーボネート等のモノビニルエーテル化合物;等が挙げられる。
(Monomer C)
In the production method of the present invention, the solution may further contain a monomer C having one radical polymerizable double bond in the molecule, and by dropping this solution into the first organic solvent, the monomer A and Monomer C may be copolymerized. By copolymerizing with a monofunctional monomer, the molecular weight distribution of the polymer can be stabilized. Hereinafter, preferred specific examples of the monomer C will be described.
Preferable specific examples of the monomer C include, for example, styrene compounds such as styrene and α-methylstyrene; acrylonitrile compounds such as acrylonitrile and methacrylonitrile; N-vinyl compounds such as N-vinylformamide; (meth) acrylamide, N -Methylol (meth) acrylamide, diacetone (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, (meth) acryloylmorpholine, (meth) (Meth) acrylamide compounds such as acrylamide; methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, iso Chill (meth) acrylate, sec-butyl (meth) acrylate, t-butyl (meth) acrylate, amyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, t- Octyl (meth) acrylate, 2-chloroethyl (meth) acrylate, 2-bromoethyl acrylate, 4-chlorobutyl acrylate, cyanoethyl acrylate, 2-acetoxyethyl (meth) acrylate, acetoacetoxyethyl (meth) acrylate, 2-hydroxyethyl (Meth) acrylate, butoxyethyl (meth) acrylate, carbitol (meth) acrylate, cyclohexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, benzyl (Meth) acrylate, tridecyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, glycidyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, Dicyclopentanyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 2-acryloyloxyethylphthalic acid, methoxy-polyethylene glycol (meth) acrylate, 2-acryloyloxyethyl-2-hydroxy Ethylphthalic acid, 2- (2-ethoxyethoxy) ethyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxylated phenyl (meth) acrylate Relate, 2- (meth) acryloyloxyethyl succinic acid, nonylphenol EO adduct (meth) acrylate, phenoxy-polyethylene glycol (meth) acrylate, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, lactone modified (meta ) Acrylate, stearyl (meth) acrylate, isoamyl (meth) acrylate, isomyristyl (meth) acrylate, isostearyl (meth) acrylate, lactone-modified (meth) acrylate and other (meth) acrylate compounds; allyl glycidyl ether and other allyl compounds ; Methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, t-butyl vinyl ether , N-octadecyl vinyl ether, 2-ethylhexyl vinyl ether, n-nonyl vinyl ether, dodecyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, cyclohexyl methyl vinyl ether, 4-methylcyclohexyl methyl vinyl ether, benzyl vinyl ether, dicyclopentenyl vinyl ether, 2-dicyclopenteno Xyethyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, butoxyethyl vinyl ether, methoxyethoxyethyl vinyl ether, ethoxyethoxyethyl vinyl ether, methoxypolyethylene glycol vinyl ether, tetrahydrofurfuryl vinyl ether, 2-hydroxyethyl vinyl ether, 2-hydroxypro Pyrvinyl ether, 4-hydroxybutyl vinyl ether, 4-hydroxymethylcyclohexyl methyl vinyl ether, diethylene glycol monovinyl ether, polyethylene glycol vinyl ether, chloroethyl vinyl ether, chlorobutyl vinyl ether, chloroethoxyethyl vinyl ether, phenylethyl vinyl ether, phenoxypolyethylene glycol vinyl ether, cyclohexanedimethanol And monovinyl ether compounds such as monovinyl ether and isopropenyl ether-O-propylene carbonate;
 さらに、モノマーCは、フッ素原子を有するものであってもよい。フッ素原子を有するモノマーCは、特に界面活性剤および表面改質剤として有用である。フッ素原子を有するモノマーCとして、上記モノマーCの置換基の一部がフッ素に置換されたものを用いることができる。以下に具体例を示す。
 具体例としては、2,2,2-トリフルオロエチル(メタ)アクリレート、2,2,3,3,3-ペンタフルオロプロピル(メタ)アクリレート、2-(パーフルオロブチル)エチル(メタ)アクリレート、2-(パーフルオロヘキシル)エチル(メタ)アクリレート、2-(パーフルオロオクチル)エチル(メタ)アクリレート、2-(パーフルオロデシル)エチル(メタ)アクリレート、2-(パーフルオロ-3-メチルブチル)エチル(メタ)アクリレート、2-(パーフルオロ-5-メチルヘキシル)エチル(メタ)アクリレート、2-(パーフルオロ-7-メチルオクチル)エチル(メタ)アクリレート、1H,1H,3H-テトラフルオロプロピル(メタ)アクリレート、1H,1H,5H-オクタフルオロペンチル(メタ)アクリレート、1H,1H,7H-ドデカフルオロヘプチル(メタ)アクリレート、1H,1H,9H-ヘキサデカフルオロノニル(メタ)アクリレート、1H-1-(トリフオロメチル)トリフルオロエチル(メタ)アクリレート、1H,1H,3H-ヘキサフルオロブチル(メタ)アクリレート、3-パーフルオロブチル-2-ヒドロキシプロピル(メタ)アクリレート、3-パーフルオロヘキシル-2-ヒドロキシプロピル(メタ)アクリレート、3-パーフルオロオクチル-2-ヒドロキシプロピル(メタ)アクリレート、3-(パーフルオロ-3-メチルブチル)-2-ヒドロキシプロピル(メタ)アクリレート、3-(パーフルオロ-5-メチルヘキシル)-2-ヒドロキシプロピル(メタ)アクリレート、3-(パーフルオロ-7-メチルオクチル)-2-ヒドロキシプロピル(メタ)アクリレート等を挙げることができる。
Furthermore, the monomer C may have a fluorine atom. Monomer C having a fluorine atom is particularly useful as a surfactant and a surface modifier. As the monomer C having a fluorine atom, one in which a part of the substituents of the monomer C is substituted with fluorine can be used. Specific examples are shown below.
Specific examples include 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3,3-pentafluoropropyl (meth) acrylate, 2- (perfluorobutyl) ethyl (meth) acrylate, 2- (perfluorohexyl) ethyl (meth) acrylate, 2- (perfluorooctyl) ethyl (meth) acrylate, 2- (perfluorodecyl) ethyl (meth) acrylate, 2- (perfluoro-3-methylbutyl) ethyl (Meth) acrylate, 2- (perfluoro-5-methylhexyl) ethyl (meth) acrylate, 2- (perfluoro-7-methyloctyl) ethyl (meth) acrylate, 1H, 1H, 3H-tetrafluoropropyl (meta) ) Acrylate, 1H, 1H, 5H-octafluoropentyl (meth) a Relate, 1H, 1H, 7H-dodecafluoroheptyl (meth) acrylate, 1H, 1H, 9H-hexadecafluorononyl (meth) acrylate, 1H-1- (trifluoromethyl) trifluoroethyl (meth) acrylate, 1H, 1H, 3H-hexafluorobutyl (meth) acrylate, 3-perfluorobutyl-2-hydroxypropyl (meth) acrylate, 3-perfluorohexyl-2-hydroxypropyl (meth) acrylate, 3-perfluorooctyl-2- Hydroxypropyl (meth) acrylate, 3- (perfluoro-3-methylbutyl) -2-hydroxypropyl (meth) acrylate, 3- (perfluoro-5-methylhexyl) -2-hydroxypropyl (meth) acrylate, 3- (Perfluoro- - it can be exemplified methyl octyl) -2-hydroxypropyl (meth) acrylate.
 次に重合方法について説明する。
(重合方法)
 本発明の可溶性架橋型ポリマーの製造方法は、モノマーAを重合開始剤Bの存在下、非還流にて重合させる。重合反応は常圧、加圧密閉下、または減圧下で行われ、装置および操作の簡便さから常圧下で行うのが好ましい。また、N等の不活性ガス雰囲気下で行うのが好ましい。
Next, the polymerization method will be described.
(Polymerization method)
In the method for producing a soluble cross-linked polymer of the present invention, monomer A is polymerized in the presence of polymerization initiator B in a non-refluxing manner. The polymerization reaction is carried out under normal pressure, under pressure and under pressure, or under reduced pressure, and is preferably carried out under normal pressure in view of simplicity of apparatus and operation. Further, preferably carried out in an atmosphere of inert gas such as N 2.
 本発明の製造方法は、重合開始剤Bの10時間半減期温度T10より20℃以上高い温度Tで非還流下にて重合させるものであるので、第一の有機溶媒は、重合温度Tを超える温度を沸点に有する有機溶媒とする。このような有機溶媒と重合開始剤Bの組み合わせは、上記有機溶媒と重合開始剤Bの具体例から適宜選択可能である。
 有機溶媒の反応圧力下で非還流にて重合することにより、分子量の制御が容易であり、さらには、工業スケールでも安全にポリマーを製造することができる。
Production method of the present invention, since in the 10-hour half-life temperature T 10 than 20 ° C. or more higher than the temperature T of the polymerization initiator B is intended to be polymerized in a non-reflux, the first organic solvent, the polymerization temperature T An organic solvent having a temperature exceeding the boiling point is used. Such a combination of the organic solvent and the polymerization initiator B can be appropriately selected from the specific examples of the organic solvent and the polymerization initiator B.
By polymerizing non-refluxing under the reaction pressure of an organic solvent, the molecular weight can be easily controlled, and furthermore, a polymer can be produced safely even on an industrial scale.
 第一の有機溶媒を、重合開始剤Bの10時間半減期温度T10より20℃以上高い温度Tにすることにより、重合開始剤Bの分解が速やかに進行し、開始剤断片ラジカルと重合物の成長末端ラジカルとの停止反応が停滞することなく進行し、塗布組成物に可溶な分子量に制御することが可能である。 A first organic solvent, by a 10-hour half-life temperature T 10 than 20 ° C. or more higher than the temperature T of the polymerization initiator B, the polymerization initiator decomposition quickly proceeds, the initiator fragment radical polymerization product of B It is possible to control the molecular weight so that the termination reaction with the growth terminal radical proceeds without stagnation and is soluble in the coating composition.
[可溶性架橋型ポリマー]
 本発明の製造方法によって得られる可溶性架橋型ポリマーの重量平均分子量Mwは、ゲル浸透クロマトグラフィーによるポリスチレン換算で1,000~300,000である。塗布組成物との相溶性の観点から1,000~50,000が好ましい。重量平均分子量Mw、および数平均分子量Mnは、後述の実施例に記載の方法で測定することができる。
 また、分子量分布の指標であるMw/Mnは、1.30~10.00が好ましく、1.50~6.00がより好ましい。このような分子量分布であることにより、塗布組成物との相溶性が良く、添加剤として用いた場合、ブツ状欠陥等の塗膜故障を良好に防止することができる。
[Soluble cross-linked polymer]
The weight average molecular weight Mw of the soluble crosslinked polymer obtained by the production method of the present invention is 1,000 to 300,000 in terms of polystyrene by gel permeation chromatography. From the viewpoint of compatibility with the coating composition, 1,000 to 50,000 is preferable. The weight average molecular weight Mw and the number average molecular weight Mn can be measured by the methods described in Examples described later.
Further, Mw / Mn as an index of molecular weight distribution is preferably 1.30 to 10.00, and more preferably 1.50 to 6.00. By having such a molecular weight distribution, compatibility with the coating composition is good, and when used as an additive, coating film failures such as bumpy defects can be satisfactorily prevented.
 本発明の製造方法によって得られる可溶性架橋型ポリマーの具体例を以下に示す。 Specific examples of the soluble crosslinked polymer obtained by the production method of the present invention are shown below.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 なかでも、フッ素原子を有する(1)および(2)のポリマーが、表面改質剤等の添加剤として有用である。 Among them, the polymers (1) and (2) having a fluorine atom are useful as additives such as surface modifiers.
 以下、本発明の実施例について説明する。表1に、合成例および比較合成例で用いる材料およびその配合比、並びに分子量を記載する。 Hereinafter, examples of the present invention will be described. Table 1 lists materials used in the synthesis examples and comparative synthesis examples, their blend ratios, and molecular weights.
(合成例1)
(化合物101の合成例)
 攪拌機、温度計、還流冷却管、および窒素ガス導入管を備えた500ミリリットル容三口フラスコに、シクロヘキサノン60.0gを仕込んで、102℃まで昇温した。次いで、ジビニルベンゼン20.0g(153.6ミリモル)、シクロヘキサノン140.0g及び重合開始剤「V-601」(和光純薬工業(株)製)60.0g(260.6ミリモル)からなる混合溶液を、120分で滴下が完了するように等速で滴下した。滴下完了後、さらに4時間攪拌を続けた後、ヘキサン1000gに再沈し、白色固体を得た。次いで、メチルエチルケトン100gに再溶解し、ヘキサン1000gに再沈した後、得られた固体を減圧乾燥し、本発明のポリマーである化合物101を、30.2g得た。この重合体の重量平均分子量Mwは31,800であった。重量平均分子量Mwおよび数平均分子量Mnは、ゲル浸透クロマトグラフィー(GPC)によりポリスチレン換算で算出した。カラムにはTSKgel SuperHZM-H、TSKgel SuperHZ4000、およびTSKgel SuperHZ200(東ソー社製)を連結したものを用い、キャリアにはテトラヒドロフランを用いた。
(Synthesis Example 1)
(Synthesis Example of Compound 101)
60.0 g of cyclohexanone was charged into a 500 ml three-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen gas inlet tube, and the temperature was raised to 102 ° C. Next, a mixed solution consisting of 20.0 g (153.6 mmol) of divinylbenzene, 140.0 g of cyclohexanone and 60.0 g (260.6 mmol) of a polymerization initiator “V-601” (manufactured by Wako Pure Chemical Industries, Ltd.) Was dropped at a constant speed so that the dropping was completed in 120 minutes. After completion of the dropwise addition, the mixture was further stirred for 4 hours and then reprecipitated in 1000 g of hexane to obtain a white solid. Subsequently, after redissolving in 100 g of methyl ethyl ketone and reprecipitating in 1000 g of hexane, the obtained solid was dried under reduced pressure to obtain 30.2 g of Compound 101 which is a polymer of the present invention. The weight average molecular weight Mw of this polymer was 31,800. The weight average molecular weight Mw and the number average molecular weight Mn were calculated in terms of polystyrene by gel permeation chromatography (GPC). A column to which TSKgel SuperHZM-H, TSKgel SuperHZ4000, and TSKgel SuperHZ200 (manufactured by Tosoh Corporation) were connected was used, and tetrahydrofuran was used as a carrier.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
(合成例2~11)
 モノマー、および配合比をそれぞれ表1のように変更したこと以外は、合成例1と同様にして本発明のポリマーである化合物102~111を合成した。
(Synthesis Examples 2 to 11)
Compounds 102 to 111, which are the polymers of the present invention, were synthesized in the same manner as in Synthesis Example 1 except that the monomers and blending ratios were changed as shown in Table 1.
(比較合成例1~4)
 モノマー、および配合比をそれぞれ表1のように変更したこと以外は、合成例1と同様にして比較合成例のポリマーである化合物H101~H104を合成した。
(Comparative Synthesis Examples 1 to 4)
Compounds H101 to H104, which are polymers of comparative synthesis examples, were synthesized in the same manner as in Synthesis example 1, except that the monomers and blending ratios were changed as shown in Table 1.
 表1中、Tは、滴下される側の有機溶媒の温度、すなわち重合温度を表し、T10は、重合開始剤の10時間半減期温度を表す。T-T10は、これらの差を示す。 In Table 1, T is the temperature of the organic solvent on the side to be dropped, that represents the polymerization temperature, T 10 represents a 10-hour half-life temperature of the polymerization initiator. TT 10 indicates these differences.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1中の略記号は以下の意味を表す。
DVB:ジビニルベンゼン
EGDMA:エチレングリコールジメタクリレート
DCP:トリシクロデカンジメタノールジメタクリレート
MMA:メチルメタクリレート
St:スチレン
V-601:2,2’-アゾビス(2-メチルプロピオン酸)(和光純薬工業(株)製)AIBN:アゾビスイソブチロニトリル
V-40:1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)(和光純薬工業(株)製)
DPE:ジフェニルエチレン
Abbreviations in Table 1 represent the following meanings.
DVB: divinylbenzene EGDMA: ethylene glycol dimethacrylate DCP: tricyclodecane dimethanol dimethacrylate MMA: methyl methacrylate St: styrene V-601: 2,2′-azobis (2-methylpropionic acid) (Wako Pure Chemical Industries, Ltd.) AIBN: Azobisisobutyronitrile V-40: 1,1′-azobis (cyclohexane-1-carbonitrile) (manufactured by Wako Pure Chemical Industries, Ltd.)
DPE: Diphenylethylene
 以下に、本発明のポリマーである化合物102~111、および比較例のポリマーである化合物H101~H104を記載する。
Figure JPOXMLDOC01-appb-C000003
The compounds 102 to 111 that are the polymers of the present invention and the compounds H101 to H104 that are the polymers of the comparative examples are described below.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 表1に示すように、本発明の非還流下で重合させて得られた高分岐ポリマー、例えば、合成例1および合成例3のポリマーは、還流下で重合した比較合成例3および比較合成例1のポリマーとそれぞれ比較して、分子量が小さく、かつ分子量バラつきが小さい。
 また、合成例1と合成例10とから、単官能のモノマーを共重合させることにより、より分子量が小さく、分子量バラつきが小さい高分岐ポリマーを得ることができる。
 また、T-T10が20℃より小さい比較合成例4は、非還流下での重合であっても重量平均分子量が大きく、分子量のバラつきが大きい。
As shown in Table 1, the hyperbranched polymers obtained by polymerization under non-refluxing of the present invention, for example, the polymers of Synthesis Example 1 and Synthesis Example 3, were polymerized under reflux. Comparative Synthesis Example 3 and Comparative Synthesis Example The molecular weight is small and the variation in molecular weight is small compared to each polymer of 1.
Further, from Synthesis Example 1 and Synthesis Example 10, a highly branched polymer having a smaller molecular weight and a smaller molecular weight variation can be obtained by copolymerizing a monofunctional monomer.
Further, Comparative Synthesis Example 4 in which TT 10 is less than 20 ° C. has a large weight average molecular weight and a large variation in molecular weight even when polymerization is performed under non-reflux.
 次に、上記合成例および比較合成例で得られたポリマーを用いて、ハードコート層を作製した。まず、実施例1のハードコート層A-1用の塗布液の調製について説明する。 Next, a hard coat layer was produced using the polymers obtained in the above synthesis examples and comparative synthesis examples. First, preparation of a coating solution for the hard coat layer A-1 of Example 1 will be described.
<ハードコート層A-1用塗布液の調製>
 下記の組成となるように、各成分を混合し、固形分濃度が約55質量%となるハードコート層A-1用塗布液を作製した。
<Preparation of coating solution for hard coat layer A-1>
Each component was mixed so as to have the following composition to prepare a coating solution for hard coat layer A-1 having a solid content concentration of about 55% by mass.
-ハードコート層A-1用塗布液の組成-
 DPHA:KAYARD DPHA(日本化薬(株)製)(6官能)                              29.6質量部
 イルカギュア184:アルキルフェノン系光重合開始剤(BASF(製))
                           2.20質量部
 3,4-エポキシシクロヘキシルメチルメタクリレート:サイクロマーM100((株)ダイセル製、分子量196)
                           13.8質量部
 化合物1                      0.55質量部
 本発明の化合物101(合成例1)           8.3質量部
 Tinuvin928:ベンゾトリアゾール系紫外線吸収剤(BASF(製))
                           0.55質量部
 MEK(メチルエチルケトン)            16.7質量部
 MiBK(メチルイソブチルケトン)         19.8質量部
 酢酸メチル                      8.5質量部
-Composition of coating solution for hard coat layer A-1-
DPHA: KAYARD DPHA (manufactured by Nippon Kayaku Co., Ltd.) (hexafunctional) 29.6 parts by mass Irucagua 184: alkylphenone photopolymerization initiator (BASF (manufactured))
2.20 parts by mass 3,4-epoxycyclohexylmethyl methacrylate: Cyclomer M100 (manufactured by Daicel Corporation, molecular weight 196)
13.8 parts by mass Compound 1 0.55 parts by mass Compound 101 of the present invention (Synthesis Example 1) 8.3 parts by mass Tinuvin 928: Benzotriazole-based ultraviolet absorber (BASF (manufactured))
0.55 parts by mass MEK (methyl ethyl ketone) 16.7 parts by mass MiBK (methyl isobutyl ketone) 19.8 parts by mass Methyl acetate 8.5 parts by mass
 化合物1は、特許第4841935号公報の実施例1記載の方法で合成した。以下に化合物1の構造式を示す。 Compound 1 was synthesized by the method described in Example 1 of Japanese Patent No. 4841935. The structural formula of Compound 1 is shown below.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
<ハードコート層A-2~A-15用の塗布液の調製>
 本発明の化合物101を、化合物102~111またはH101~104に替えたこと以外は上記と同様にして、実施例2~11および比較例1~4のハードコート層A-2~A-15用塗布液を作製した。
<Preparation of coating solution for hard coat layers A-2 to A-15>
For the hard coat layers A-2 to A-15 of Examples 2 to 11 and Comparative Examples 1 to 4, in the same manner as above except that the compound 101 of the present invention was replaced with the compounds 102 to 111 or H101 to 104 A coating solution was prepared.
<ハードコート層の形成>
 ロール形態で巻き出した25μm厚さのトリアセチルセルロースフィルム「TJ25」(富士フイルム製)を支持体とし、ハードコート層A-1~A-15用塗布液を使用し、ハードコートフィルムを作製した。具体的には、支持体上に、特開2006-122889号公報実施例1記載のスロットダイを用いたダイコート法で、搬送速度30m/分の条件で各塗布液を塗布し、60℃で150秒乾燥の後、さらに窒素パージ下酸素濃度約0.1体積%で160W/cmの空冷メタルハライドランプ(アイグラフィックス(株)製)を用いて、照度400mW/cm、照射量500mJ/cmの紫外線を照射して塗布層を硬化させてハードコート層を形成した後、巻き取った。
 作製したハードコートフィルムを下記評価方法で評価した。
<Formation of hard coat layer>
A hard coat film was prepared by using a coating liquid for hard coat layers A-1 to A-15 using a 25 μm-thick triacetyl cellulose film “TJ25” (manufactured by Fuji Film) unwound in a roll form. . Specifically, each coating solution was applied on a support at a conveying speed of 30 m / min by a die coating method using a slot die described in Example 1 of JP-A-2006-122889, and 150 ° C. at 150 ° C. After drying for 2 seconds, using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) with an oxygen concentration of about 0.1% by volume under nitrogen purge, an illuminance of 400 mW / cm 2 and an irradiation amount of 500 mJ / cm 2 The coating layer was cured by irradiating the ultraviolet ray to form a hard coat layer, and then wound up.
The produced hard coat film was evaluated by the following evaluation method.
{ハードコート層の膜厚}
 ハードコート層の膜厚は、接触式の膜厚計を用いて作製したハードコートフィルムの膜厚を測定し、そこから同様に測定した支持体厚みを引いて算出した。ハードコートフィルムの全てにおいて、ハードコート層の膜厚は、6.0μmであった。
{Film thickness of hard coat layer}
The film thickness of the hard coat layer was calculated by measuring the film thickness of a hard coat film produced using a contact-type film thickness meter, and subtracting the thickness of the support measured in the same manner. In all the hard coat films, the film thickness of the hard coat layer was 6.0 μm.
{ハードコート層のブツ状欠陥}
 裏面側から蛍光灯を照射し、ハードコート層塗布面(おもて面)側から透過目視面検、およびハードコート層塗布面側から蛍光灯を照射した反射目視面検にて3m検査し、輝点状の欠陥を採取した。さらに、採取した欠陥を顕微鏡およびラマン/FTIR一体型顕微分光装置(商品名「LabRAM-IR」,Horiba社製)で分析して、欠陥部の組成が、正常部と同一であるものの数をカウントし、その値を3で割って1m当たりのブツ状欠陥の数を算出した。以下の評価基準に基づいて評価した。
{Scratch defect of hard coat layer}
Fluorescent lamp is irradiated from the back side, 3m 2 inspection is performed by transmission visual inspection from the hard coat layer application surface (front surface) side and reflection visual inspection by irradiation of the fluorescent light from the hard coat layer application surface side. A bright spot-like defect was collected. Furthermore, the collected defects are analyzed with a microscope and a Raman / FTIR integrated microspectrometer (trade name “LabRAM-IR”, manufactured by Horiba), and the number of defects having the same composition as the normal part is counted. Then, the value was divided by 3 to calculate the number of bumpy defects per 1 m 2 . Evaluation was made based on the following evaluation criteria.
 (評価基準)
A:ブツ状欠陥が1m当たりに換算し0個である
B:ブツ状欠陥が1m当たりに換算し1~5個発生している
C:ブツ状欠陥が1m当たりに換算し6個以上発生している
(Evaluation criteria)
A: B pimple defects is zero in terms of per 1 m 2: C pimple defects are converted by 1-5 generated per 1 m 2: pimple defects are converted per 1 m 2 6 pieces Has occurred
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 表2に示すように、本発明の可溶性架橋型ポリマーの製造方法により製造されたポリマーは、ハードコート層の表面改質剤として添加した場合、ブツ状欠陥が良好に低減されることがわかった。
 一方、還流下で重合した比較例1~4は、ブツ状欠陥が多いことがわかる。
As shown in Table 2, when the polymer produced by the method for producing the soluble cross-linked polymer according to the present invention was added as a surface modifier for the hard coat layer, it was found that the irregularity of defects was satisfactorily reduced. .
On the other hand, it can be seen that Comparative Examples 1 to 4 polymerized under reflux have a lot of bumpy defects.
 本実施例においては、液晶表示装置に用いるハードコート層について検討しているが、ハードコート層に限られず、高い信頼性が求められる他の光学フィルムを作製する場合にも本発明の製造方法で製造されたポリマーを添加剤として用いることができる。 In this example, the hard coat layer used in the liquid crystal display device is examined. However, the present invention is not limited to the hard coat layer, and the production method of the present invention is also used for producing other optical films that require high reliability. The produced polymer can be used as an additive.
 以上のように、本発明の可溶性架橋型ポリマーの製造方法によれば、不純物の生成が抑制され、マトリクスとの相溶性が良好な高分岐ポリマーを得ることができる。本発明の製造方法により製造されたポリマーを塗布組成物の添加剤として用いた場合、塗布組成物との相溶性が良いため、ブツ状欠陥の発生が抑制された良好な表面形状を有する膜を得ることができる。 As described above, according to the method for producing a soluble cross-linked polymer of the present invention, it is possible to obtain a highly branched polymer that suppresses the generation of impurities and has good compatibility with the matrix. When the polymer produced by the production method of the present invention is used as an additive for a coating composition, the compatibility with the coating composition is good, so that a film having a good surface shape in which the occurrence of bumpy defects is suppressed is formed. Obtainable.

Claims (5)

  1.  分子内に2個以上のラジカル重合性二重結合を有するモノマーAを、第一の有機溶媒中で、前記モノマーA1モルに対して5モル%以上200モル%以下の量の重合開始剤Bの存在下、該重合開始剤Bの10時間半減期温度より20℃以上高い温度で非還流下にて重合させる可溶性架橋型ポリマーの製造方法。 The monomer A having two or more radically polymerizable double bonds in the molecule is added in an amount of 5 to 200 mol% of the polymerization initiator B with respect to 1 mol of the monomer A in the first organic solvent. A method for producing a soluble cross-linked polymer, which is polymerized in the presence of non-refluxing at a temperature 20 ° C. or more higher than the 10-hour half-life temperature of the polymerization initiator B.
  2.  前記モノマーA、前記重合開始剤Bおよび第二の有機溶媒を含む溶液を、前記第一の有機溶媒中へ滴下することにより、前記モノマーAを重合させる請求項1記載の可溶性架橋型ポリマーの製造方法。 The production of the soluble cross-linked polymer according to claim 1, wherein the monomer A is polymerized by dropping a solution containing the monomer A, the polymerization initiator B and the second organic solvent into the first organic solvent. Method.
  3.  前記溶液中に、分子内にラジカル重合性二重結合を1個有するモノマーCをさらに含む請求項2記載の可溶性架橋型ポリマーの製造方法。 The method for producing a soluble cross-linked polymer according to claim 2, further comprising monomer C having one radical polymerizable double bond in the molecule in the solution.
  4.  前記可溶性架橋型ポリマーの重量平均分子量が、ゲル浸透クロマトグラフィーによるポリスチレン換算で1,000~300,000である請求項1から3いずれか1項記載の可溶性架橋型ポリマーの製造方法。 The method for producing a soluble crosslinked polymer according to any one of claims 1 to 3, wherein the weight average molecular weight of the soluble crosslinked polymer is 1,000 to 300,000 in terms of polystyrene by gel permeation chromatography.
  5.  前記可溶性架橋型ポリマーの重量平均分子量が、ゲル浸透クロマトグラフィーによるポリスチレン換算で1,000~50,000である請求項4記載の可溶性架橋型ポリマーの製造方法。 The method for producing a soluble crosslinked polymer according to claim 4, wherein the weight average molecular weight of the soluble crosslinked polymer is 1,000 to 50,000 in terms of polystyrene by gel permeation chromatography.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009155619A (en) * 2007-12-28 2009-07-16 Lion Corp Method of synthesizing hyperbranched polymer, and resist composition
JP2010024330A (en) * 2008-07-17 2010-02-04 Univ Of Tokushima Optical patterning composition using highly branched polymer
WO2010126140A1 (en) * 2009-05-01 2010-11-04 日産化学工業株式会社 Method for producing highly branched polymer
WO2010137724A1 (en) * 2009-05-29 2010-12-02 日産化学工業株式会社 Highly branched fluorinated polymer and resin composition containing same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009155619A (en) * 2007-12-28 2009-07-16 Lion Corp Method of synthesizing hyperbranched polymer, and resist composition
JP2010024330A (en) * 2008-07-17 2010-02-04 Univ Of Tokushima Optical patterning composition using highly branched polymer
WO2010126140A1 (en) * 2009-05-01 2010-11-04 日産化学工業株式会社 Method for producing highly branched polymer
WO2010137724A1 (en) * 2009-05-29 2010-12-02 日産化学工業株式会社 Highly branched fluorinated polymer and resin composition containing same

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