WO2017087475A1 - Process for binding conductive ink to glass - Google Patents

Process for binding conductive ink to glass Download PDF

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Publication number
WO2017087475A1
WO2017087475A1 PCT/US2016/062211 US2016062211W WO2017087475A1 WO 2017087475 A1 WO2017087475 A1 WO 2017087475A1 US 2016062211 W US2016062211 W US 2016062211W WO 2017087475 A1 WO2017087475 A1 WO 2017087475A1
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WO
WIPO (PCT)
Prior art keywords
ink
melting temperature
glass
electrically conductive
low melting
Prior art date
Application number
PCT/US2016/062211
Other languages
French (fr)
Inventor
Jason Jeremy KLEINER
Margaret Kehoe JOYCE
Thomas Wayne JOYCE
Original Assignee
Western Michigan University Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Michigan University Research Foundation filed Critical Western Michigan University Research Foundation
Publication of WO2017087475A1 publication Critical patent/WO2017087475A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C09D1/02Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances alkali metal silicates
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/322Pigment inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/52Electrically conductive inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24Electrically-conducting paints
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • C08K3/042Graphene or derivatives, e.g. graphene oxides

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A method of fabricating electronic device includes depositing ink onto a substrate. The ink includes electrically conductive particles and glass particles in a liquid. The glass particles preferably comprise low melting temperature glass frit (LMTGF). The ink is photonically sintered after it is deposited onto the substrate utilizing a high intensity light source. The use of LMTGF and photonic sintering permits high production rates in a roll-to-roll process.

Description

PROCESS FOR BINDING CONDUCTIVE INK TO GLASS
BACKGROUND OF THE INVENTION
[0001] Printed electronics devices are electrical devices or components that have been produced by a printing process using conductive inks. Examples include electrical contacts, thin film transistors, capacitors, resistors, diodes, antennas, sensors, inductive coils and organic light emitting diodes (OLEDs). Known printed electronics may not provide sufficient adhesion, such that the ink can be easily removed from the substrate.
[0002] One known conductive ink printing process utilizes silver nano ink having a glass frit. The ink is applied to a glass substrate by ink-jet printing, and annealed at high temperatures (400°C or greater). Although the addition of the glass frit may be beneficial to the overall adhesion of the film due to grain growth, the high temperature that is required for the annealing process may limit the usefulness of this process.
[0003] Accordingly, an improved ink and process for printing electronic devices would be beneficial.
BRIEF DESCRIPTION OF THE DRAWINGS
[0004] FIG. 1 is a schematic view of a printing process according to one aspect of the present invention;
[0005] FIG. 2 is a flow chart showing a printing process according to one aspect of the present invention;
[0006] FIG. 3 is a schematic view of a device fabricated utilizing the process of FIG. 2;
[0007] FIG. 4 is an enlarged schematic view of a portion of the device of FIG. 3;
[0008] FIG. 5 is a flow chart showing a method of fabricating an OLED device according to another aspect of the present invention;
[0009] FIG. 6 is a schematic view of a device fabricated utilizing the process of FIG. 5;
[0010] FIG. 7 is flow chart of a process for fabricating a radio-frequency identification
(RFID) device according to another aspect of the present invention; and
[0011] FIG. 8 is a schematic view of a device fabricated utilizing the process of FIG. 7. DETAILED DESCRIPTION
[0012] For purposes of description herein, the terms "upper," "lower," "right," "left,"
"rear," "front," "vertical," "horizontal," and derivatives thereof shall relate to the invention as oriented in FIG. 1. However, it is to be understood that the invention may assume various alternative orientations and step sequences, except where expressly specified to the contrary. It is also to be understood that the specific devices and processes illustrated in the attached drawings, and described in the following
specification, are simply exemplary embodiments of the inventive concepts defined in the appended claims. Hence, specific dimensions and other physical characteristics relating to the embodiments disclosed herein are not to be considered as limiting, unless the claims expressly state otherwise.
[0013] One aspect of the present invention is an ink comprising a liquid solvent, a binder, solid particles comprising a conductive material, and a low melting temperature glass frit (LMTGF). The solvent and binder may be any substance that adequately suspends the conductive material and the LMTGF. A plurality of conductive metal particles (e.g. silver particles) are dispersed in the solvent. A low melting temperature glass frit material is also dispersed in the solvent. The glass frit is preferably in the form of spherical particles having a diameter of about 200 nanometers to 50 microns, or 1 micron to 3 microns. The mass percentage of the glass frit is preferably about 33% or less of the ink.
[0014] It will be understood that inks of the present disclosure are not limited to a
specific composition. For example, the conductive material may comprise gold, copper, silver or graphene. Also, the solvent may comprise water, a high-viscosity organic liquid such as terpineol, or a low viscosity organic liquid such as toluene.
[0015] The LMTGF utilized in the ink may comprise a low-melting temperature glass developed as a low temperature sealant by Hitachi, Ltd. and Hitachi Chemical Co. Ltd. This LMTGF material is available under the trade name VS1307, Available from Hitachi Chemical Co. America. The LMTGF preferably has a melting temperature of about 220- 300°C (or less).
[0016] As discussed in more detail below, an ink according to the present invention is printed on a substrate, and the printed ink is then sintered utilizing a photonic sintering process whereby a pulse of high intensity light from a Xenon bulb is directed onto the ink. This quickly heats the ink to sinter the LMTGF, without significantly heating the substrate upon which the ink is printed. Because photonic sintering occurs very quickly, high production rates can be achieved utilizing a roll-to-roll process.
[0017] With reference to FIG. 1, a printing process/device 1 according to the present invention may utilize a roll of sheet material 4. The sheet material 6 is unrolled from roll 4, and ink is applied by a printer 8. The printer 8 may comprise an ink jet printer or other suitable printing device. The ink 12 then passes under a light 10 to cure the ink 12. The light 10 may comprise a Xenon light source having a high intensity light or other suitable photonic bulb. For example, light source 10 may comprise one or more Xenon bulbs that are able to deliver 20,000 Watts/cm2, wherein about 30% of the energy into the system goes to light. The light source 10 emits a brief pulse of high intensity light that rapidly heats and sinters the ink 12. The light source 10 may provide a light pulse lasting from about 100 to about 1000 milliseconds. The light source 10 is preferably positioned about 0.5 inches to about 4-8 (several) inches from the ink 12 on sheet 6. Because the light from light source 10 has high intensity, yet short duration, thermal equilibrium between the particles of ink 12 and substrate/sheet 6 is never achieved. The result is that the particles are sintered then cooled before any substantial heat transfer to the
substrate/sheet 6 occurs. Following sintering by light source 10, the sheet 6 with cured ink 12A is then rolled onto a reel 14. Alternatively, sheet 6 with cured ink 12A may continue through subsequent printing units (not shown) where additional ink is deposited onto sheet 6 and/or cured ink 12A and cured utilizing additional high intensity light sources (not shown) to form additional functional layers.
[0018] Because the light source 10 cures and sinters the ink very rapidly, the sheet
material 6 can be fed at a relatively high speed. For example, a process according to one aspect of the present invention may utilize a feed rate of 5 to 20 (or more) feet per second. The sheet 6 may be fed at a constant velocity (rate), or the sheet 6 may be fed at a variable rate whereby the sheet 6 slows or stops during the printing and/or sintering steps. Print speeds can be significantly greater than 20 feet per second if a sufficient number and intensity of photonic bulbs are provided to heat and sinter the ink. Thus, the process of the present disclosure can be utilized in roll-to-roll printing/sintering processes having extremely high feed rates. [0019] Testing has shown that a photonic curing process utilizing LMTGF according to the present invention results in significant inter-granular dispersion of the glass between conductive particles (e.g. silver) contained within the ink. This densifies the film, resulting in greater adhesion to the substrate, and lower electrical resistance in the cured ink 12A. Testing has also shown that the photonically sintered ink provides greater adhesion to the substrate relative to conventional sintering processes utilizing high melting temperature glass. Furthermore, testing has shown that the addition of glass frit to the ink reduces the electrical resistance of the ink relative to ink that does not include a glass frit.
[0020] In a preferred embodiment, the sheet or substrate 6 may comprise a thin glass material. However, the substrate or sheet 6 may also comprise plastic, coated paper or other materials. For example, the sheet 6 may comprise a soda lime glass material having a thickness of about 0.125 inches. Alternatively, the substrate 6 may comprise a paper material such as an uncoated free sheet material.
[0021] With further reference to FIGS. 2-4, a device 20 (FIGS. 3 and 4) may be fabricated utilizing a process 22 shown in FIG. 2. Process 22 includes a first step 24 in which conductive material (e.g. ink) including an LMTGF adhesion promoter is printed onto substrates 26A and 26B (FIG. 3). The ink 12 is then photonically sintered/cured as shown at step 28. Electrical conductors 30A and 30B are then attached to the ink 12 by soldering to thereby create a circuit. In the illustrated example, the device 20 includes an electrochromic center layer 32, and the substrates/layers 26A and 26B comprise ITO (Indium Tin Oxide) glass that is adhered to electrochromic center layer 32. The device 20 can therefore form electrochromic glass that changes with respect to light
absorption/reflection when electrical power is applied from a power supply 34.
[0022] The LMTGF utilized in the ink 12 to produce device 20 provides increased
adhesion and maintains the integrity of the electrical contacts during annealing processes such as soldering the ink 12 to the conductors 30A and 30B.
[0023] With further reference to FIG. 5, a process 42 according to another aspect of the present invention includes a first step 44 in which a transport layer 46 (FIG. 6) is printed on a cathode 48. The transport layer 46 may be formed by printing ink comprising LMTGF according to the present invention that is cured at step 50 utilizing photonic curing. At step 52, additional layers of ink comprising LMTGF are printed and cured. The additional layers may comprise an emitting layer 54 and a second transport layer 56. An anode 58 may then formed utilizing the printing and curing steps 44 and 50. The layers may then be adhered to a glass sheet 60, and an electrical power source 62 may be connected to cathode 48 and anode 58 utilizing conductors 64 and 66, respectively. The resulting device 40 comprises an OLED display that emits light 68.
[0024] Photonic curing to produce the OLED display 40 provides for fast curing times
(increased throughput). Furthermore, the increased adhesion from the LMTGF maintains the integrity of the film layers during subsequent printing processes to thereby improved durability.
[0025] With further reference to FIG. 7, a process 72 according to another aspect of the present invention includes a first step 74 in which ink including LMTGF is printed on a substrate 76 to form an RFID 78 (FIG. 8). At step 80, the ink that forms RFID 78 is cured/sintered utilizing photonic curing according to the present invention. The substrate 76 may comprise paper, glass, polymer, or other suitable material. Photonic curing provides for rapid curing, thereby providing an increased throughput.
Furthermore, the LMTGF provides increased adhesion, and maintains the integrity of the RFID. This, in turn, provides for increased durability when handling a device 70, and also provides for longer functionality of RFID 78 and increased production ratio.
[0026] It is to be understood that variations and modifications can be made on the
aforementioned structure without departing from the concepts of the present invention, and further it is to be understood that such concepts are intended to be covered by the following claims unless these claims by their language expressly state otherwise.

Claims

What is claimed is:
1. A method of binding conductive ink to a substrate, the method comprising:
depositing ink onto a substrate surface, wherein the ink comprises a liquid solvent, electrically conductive particles, and low melting temperature glass frit particles; sintering the ink after it is deposited onto the substrate surface by exposing the ink to high intensity light.
2. The method of claim 1, wherein:
the low melting temperature glass frit particles comprise glass having a melting temperature of 300° C or less.
3. The method of claim 1, wherein:
the low melting temperature glass frit particles comprise glass having a melting temperature of 220° C or less.
4. The method of any of claims 1-3, wherein:
the low melting temperature glass frit particles are substantially spherical.
5. The method of any of claims 1-4, wherein:
the low melting temperature glass frit particles have diameters of about 200 nanometers to about 50 microns.
6. The method of any of claims 1-4, wherein:
the low melting temperature glass frit particles have diameters of about 1 micron to about 3 microns.
7. The method of any of claims 1-6, wherein:
the electrically conductive particles comprise metal.
8. The method of any of claims 1-6, wherein:
the electrically conductive particles comprise a non-metallic material.
9. The method of claim 8, wherein:
the electrically conductive particles comprise graphene.
10. The method of any of claims 1-9, wherein:
the substrate comprises a sheet of glass.
11. The method of claim 10, wherein:
the sheet comprises a soda lime glass material having a thickness of about 0.125 inches.
12. The method of any of claims 1-9, wherein:
the substrate comprises a sheet of paper.
13. The method of any of claims 1-12, wherein:
the ink is deposited on the substrate surface by a printing device positioned above the substrate surface.
14. The method of any of claims 1-13, wherein:
the substrate surface comprises an elongated sheet that is fed from a first roll to a second roll, and wherein the ink is deposited onto a portion of the substrate surface between the first and second rolls.
15. The method of any of claims 1-14, wherein:
the ink is deposited while the substrate surface is moving.
16. The method of any of claims 1-15, wherein:
the ink is sintered while the substrate surface is moving.
17. The method of claim 16, wherein:
the substrate surface moves continuously at a rate of about 5 feet per second to about 20 feet per second.
18. The method of any of claims 1-17, wherein:
the high intensity light comprises a pulse of light that is generated by a xenon bulb.
19. The method of any of claims 1-18, including:
electrically coupling a plurality of electrical conductors to the ink after the ink is cured.
20. The method of any of claims 1-19, wherein:
the high intensity light causes inter-granular dispersion of the glass between the electrically conductive particles and provides reduced electrical resistance relative to ink that does not include low melting temperature glass frit particles.
21. The method of any of claims 1-20, including:
depositing ink comprising a liquid solvent, electrically conductive particles, and low melting temperature glass frit particles onto first and second sheets of glass, followed by photonic curing of the ink utilizing high intensity light to form first and second electrically conductive layers on the first and second sheets of glass, respectively; positioning the first and second sheets of glass on opposite sides of an
electrochromic center layer to form layered glass having light absorption and/or reflective properties that change when electrical power is supplied to the first and second electrically conductive layers.
22. The method of any of claims 1-20, wherein:
the substrate surface comprises a cathode surface;
the ink forms a conductive transport layer on the cathode surface when the ink is cured; and including:
depositing ink comprising a liquid solvent, electrically conductive particles, and low melting temperature glass frit particles onto the transport layer, followed by sintering the ink by exposing the ink to high intensity light to form a second conductive layer on the conductive transport layer.
23. The method of claim 22, including:
depositing ink comprising a liquid solvent, electrically conductive particles, and low melting temperature glass frit particles onto the second conductive layer followed by sintering the ink by exposing the ink to high intensity light to form a third conductive layer disposed on the second conductive layer, wherein:
the second conductive layer forms an emitting layer; and
the third conductive layer forms a transport layer.
24. The method of claim 23, including:
depositing ink comprising a liquid solvent, electrically conductive particles, and low melting temperature glass frit particles onto the third conductive layer, followed by sintering the ink by exposing the ink to high intensity light to form an anode; and
adhering the anode and/or the cathode to a layer of light-transmitting material to form an OLED display that emits light.
25. The method of any of claims 1-20, wherein:
the ink forms an RFID device when the ink is cured.
26. An electronic device made by the method of any of claims 1-25.
27. An electronic device comprising:
a non-conductive substrate;
an electrically conductive layer disposed on the substrate, wherein the conductive layer comprises electrically conductive material and glass, the glass having a melting temperature of 300° C or less and wherein the glass is dispersed between regions of electrically conductive material.
28. The electronic device of claim 27, wherein:
the electronic device comprises at least one of electrochromic glass, a light- emitting OLED device, and an RFID device.
PCT/US2016/062211 2015-11-16 2016-11-16 Process for binding conductive ink to glass WO2017087475A1 (en)

Applications Claiming Priority (2)

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US201562255758P 2015-11-16 2015-11-16
US62/255,758 2015-11-16

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020197753A1 (en) * 2019-03-25 2020-10-01 Sinovia Technologies Non-equilibrium thermal curing processes
WO2022151781A1 (en) * 2021-01-12 2022-07-21 惠州市艾比森光电有限公司 Matte solder mask ink, preparation method for led display module, and led display screen

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995026935A1 (en) * 1994-04-05 1995-10-12 The University Of Queensland Coating of substrates
WO2008075263A1 (en) * 2006-12-19 2008-06-26 Koninklijke Philips Electronics N.V. Electrochromic device and photodynamic treatment device comprising such an electrochromic device
US20120132274A1 (en) * 2009-06-22 2012-05-31 Basf Se Process for the production of a structured metallic coating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995026935A1 (en) * 1994-04-05 1995-10-12 The University Of Queensland Coating of substrates
WO2008075263A1 (en) * 2006-12-19 2008-06-26 Koninklijke Philips Electronics N.V. Electrochromic device and photodynamic treatment device comprising such an electrochromic device
US20120132274A1 (en) * 2009-06-22 2012-05-31 Basf Se Process for the production of a structured metallic coating

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LAPSHINOV B. A.: "Tekhnologiya materialov i izdely elektronnoi tekhniki''.", FORMIROVANIE SPAYA STEKLA S METALLOM. METODICHESKIE UKAZANIYA K LABORATORNOI RABOTE PO DISTSIPLINE, 2006, Moskva, pages 4 - 6 , 10 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020197753A1 (en) * 2019-03-25 2020-10-01 Sinovia Technologies Non-equilibrium thermal curing processes
US20200381647A1 (en) * 2019-03-25 2020-12-03 Sinovia Technologies Non-equilibrium thermal curing processes
US11276845B2 (en) 2019-03-25 2022-03-15 Sinovia Technologies Organic light emitting diodes with silver contacts
JP2023062029A (en) * 2019-03-25 2023-05-02 シノヴィア テクノロジーズ Non-equilibrium thermal curing processes
JP7315801B2 (en) 2019-03-25 2023-07-26 シノヴィア テクノロジーズ Non-equilibrium thermosetting process
WO2022151781A1 (en) * 2021-01-12 2022-07-21 惠州市艾比森光电有限公司 Matte solder mask ink, preparation method for led display module, and led display screen

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