WO2017057241A1 - Organic el element and organic el element manufacturing method - Google Patents

Organic el element and organic el element manufacturing method Download PDF

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Publication number
WO2017057241A1
WO2017057241A1 PCT/JP2016/078200 JP2016078200W WO2017057241A1 WO 2017057241 A1 WO2017057241 A1 WO 2017057241A1 JP 2016078200 W JP2016078200 W JP 2016078200W WO 2017057241 A1 WO2017057241 A1 WO 2017057241A1
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WO
WIPO (PCT)
Prior art keywords
organic
layer
adhesive
hygroscopic
sealing
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PCT/JP2016/078200
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French (fr)
Japanese (ja)
Inventor
匡哉 下河原
進一 森島
真人 赤對
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住友化学株式会社
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Publication of WO2017057241A1 publication Critical patent/WO2017057241A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Definitions

  • the present invention relates to an organic EL element and a method for manufacturing the organic EL element.
  • organic EL elements for example, those described in Patent Document 1 and Patent Document 2 are known.
  • a first electrode layer, an organic functional layer, a second electrode layer, and a protective layer are laminated in this order on a substrate.
  • a sealing layer containing a hygroscopic material is provided so as to cover the protective layer.
  • the organic EL element described in Patent Document 2 includes a step of obtaining a sealing member in which an insulating layer and an adhesive layer are formed on a sealing substrate, a step of forming an insulating layer removing portion in the insulating layer and the adhesive layer, and an insulation
  • the step of filling the resin removal part with a resin containing a hygroscopic agent, the step of bonding the sealing member to the electronic element, and the state in which the sealing substrate and the electronic element are bonded together are irradiated with ultraviolet rays to give the resin. And a step of curing.
  • the protective layer is provided in order to suppress the chemical component of the sealing layer from entering the organic functional layer and reacting the chemical component with the organic functional layer.
  • the protective layer is formed by, for example, CVD (chemical vapor deposition).
  • CVD chemical vapor deposition
  • An object of one aspect of the present invention is to provide an organic EL element capable of improving productivity and a method for manufacturing the organic EL element in a configuration including a hygroscopic portion.
  • An organic EL device includes a support substrate, an organic EL portion that is disposed on the support substrate, and is formed by stacking a first electrode layer, an organic functional layer, and a second electrode layer,
  • An organic EL element comprising a sealing member that seals an EL portion and a hygroscopic portion having hygroscopicity, wherein the sealing member has adhesive properties and has a viscosity that covers the organic EL portion and the hygroscopic portion.
  • An adhesive portion and a sealing substrate disposed on the adhesive portion, and the moisture absorption portion is outside the organic EL portion and orthogonal to the lamination direction when viewed from the lamination direction of the organic EL portion.
  • the adhesive part is at least between the moisture absorbing part and the organic EL part, between the moisture absorbing part and the sealing substrate, and the moisture absorbing part. And the end portion in the orthogonal direction of the adhesive portion.
  • the moisture absorbing portion is spaced apart from the organic EL portion at a predetermined interval in a direction outside the organic EL portion and perpendicular to the stacking direction when viewed from the stacking direction of the organic EL portion.
  • the adhesive part is at least between the hygroscopic part and the organic EL part, between the hygroscopic part and the sealing substrate, and between the hygroscopic part and the end of the adhesive part in the orthogonal direction. Is provided.
  • the adhesive component can suppress the chemical component of the hygroscopic portion from entering the organic functional layer.
  • the organic EL element since it is not necessary to provide a protective layer between the moisture absorption part and the organic functional layer, a process for forming the protective layer is not required in the manufacturing process. Further, since the hygroscopic portion is covered, the sealing member can be bonded after the hygroscopic portion is formed on the support substrate side. Therefore, highly accurate positioning is not required when the sealing member and the organic EL part are bonded together. Therefore, this organic EL element can improve productivity in the structure provided with a moisture absorption part.
  • the support substrate may have flexibility.
  • the distance between the inner surface of the moisture absorption part and the organic EL part may be 0.5 mm or more and 10 mm or less. Thereby, the moisture absorption function of the moisture in a moisture absorption part can be effectively exhibited with respect to an organic EL part.
  • the thickness of the hygroscopic part may be 1/2 or less of the thickness of the adhesive part. If the thickness of the hygroscopic part is too thick relative to the thickness of the adhesive part, the hygroscopic part cannot be properly covered with the adhesive part. By setting the thickness of the hygroscopic part to 1 ⁇ 2 or less of the thickness of the adhesive part, the hygroscopic part can be appropriately covered with the adhesive part.
  • the organic EL element manufacturing method includes an organic EL part forming step of forming an organic EL part by laminating a first electrode layer, an organic functional layer, and a second electrode layer on a support substrate; A hygroscopic part forming step for forming a hygroscopic part having a hygroscopic property at a predetermined distance from the organic EL part in a direction perpendicular to the laminating direction outside the organic EL part as viewed from the laminating direction of the organic EL part; A sealing step of sticking a sealing member having an adhesive base having a stopping base material and adhesive properties to the organic EL portion, and covering the exposed portions of the organic EL portion and the moisture absorbing portion with the adhesive portion And including.
  • the hygroscopic portion is not formed on the sealing member, it is not necessary to perform highly accurate alignment when the sealing member is bonded to the organic EL portion. Therefore, in this manufacturing method, productivity can be improved in the configuration including the hygroscopic portion.
  • the support substrate has flexibility
  • the organic EL portion forming step, the moisture absorption portion forming step, and the sealing step are continuously supported from the support substrate wound on the unwinding roll. This is performed during the process of winding the substrate on a winding roll.
  • each process is implemented by what is called a roll-to-roll system. Therefore, each process can be performed efficiently and productivity can be improved.
  • the moisture absorption part may be formed by a printing method. Thereby, a moisture absorption part can be accurately formed in a predetermined position.
  • the sealing member and the organic EL part may be bonded together by applying pressure in a heated state.
  • the adhesion part of the sealing member which contacts an organic EL part hardens
  • the sealing substrate may be a thermoplastic resin.
  • a sealing base material can be made to follow the shape of an organic EL part by applying heat to a sealing base material.
  • productivity can be improved in a configuration including a moisture absorption part.
  • FIG. 1 is a cross-sectional view of an organic EL element according to an embodiment.
  • FIG. 2 is a cross-sectional view taken along line II-II in FIG.
  • FIG. 3 is a diagram schematically showing a method for manufacturing an organic EL element by a roll-to-roll method.
  • FIG. 4 is a diagram illustrating a manufacturing process of the sealing member.
  • FIG. 5 is a diagram illustrating a sealing process.
  • FIG. 6 is a diagram showing a sealing process by a roll-to-roll method.
  • FIG. 7 is a cross-sectional view of an organic EL element according to another embodiment.
  • the organic EL element 1 includes a support substrate 3, an anode layer (first electrode layer) 5, a light emitting layer (organic functional layer) 7, a cathode layer (second electrode layer) 9, The hygroscopic part 11, the adhesive part 13, and the sealing substrate 15 are provided.
  • the anode layer 5, the light emitting layer 7, and the cathode layer 9 constitute an organic EL unit 17.
  • the adhesive portion 13 and the sealing substrate 15 constitute a sealing member 19.
  • the support substrate 3 is made of a resin that is transparent to visible light (light having a wavelength of 400 nm to 800 nm).
  • the support substrate 3 is a film-like substrate (flexible substrate, flexible substrate).
  • the thickness of the support substrate 3 is, for example, not less than 30 ⁇ m and not more than 500 ⁇ m.
  • the support substrate 3 is, for example, a plastic film.
  • the material of the support substrate 3 is, for example, polyethersulfone (PES); polyester resin such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN); polyolefin resin such as polyethylene (PE), polypropylene (PP), or cyclic polyolefin; Polyamide resin; Polycarbonate resin; Polystyrene resin; Polyvinyl alcohol resin; Saponified ethylene-vinyl acetate copolymer; Polyacrylonitrile resin; Acetal resin; Polyimide resin;
  • the material of the support substrate 3 is preferably a polyester resin or a polyolefin resin, and particularly preferably polyethylene terephthalate or polyethylene naphthalate because of its high heat resistance, low coefficient of linear expansion and low manufacturing cost among the above resins. Moreover, these resin may be used individually by 1 type, and may be used in combination of 2 or more type.
  • a moisture barrier layer may be disposed on one main surface 3 a of the support substrate 3.
  • the other main surface 3b of the support substrate 3 is a light emitting surface.
  • the support substrate 3 may be a thin film glass.
  • the anode layer 5 is disposed on one main surface 3 a of the support substrate 3.
  • an electrode layer showing optical transparency is used.
  • a thin film of metal oxide, metal sulfide, metal or the like having high electrical conductivity can be used, and a thin film having high light transmittance is preferably used.
  • a thin film made of indium oxide, zinc oxide, tin oxide, indium tin oxide (abbreviated as ITO), indium zinc oxide (abbreviated as IZO), gold, platinum, silver, copper, or the like is used.
  • a thin film made of ITO, IZO, or tin oxide is preferably used.
  • an organic transparent conductive film such as polyaniline and derivatives thereof, polythiophene and derivatives thereof may be used.
  • the thickness of the anode layer 5 can be determined in consideration of light transmittance, electrical conductivity, and the like.
  • the thickness of the anode layer 5 is usually 10 nm to 10 ⁇ m, preferably 20 nm to 1 ⁇ m, and more preferably 50 nm to 500 nm.
  • Examples of the method for forming the anode layer 5 include a vacuum deposition method, a sputtering method, an ion plating method, a plating method, and a coating method.
  • the light emitting layer 7 is disposed on one main surface 3 a of the anode layer 5 and the support substrate 3.
  • the light emitting layer 7 is usually formed of an organic substance that mainly emits fluorescence and / or phosphorescence or the organic substance and a dopant that assists the organic substance.
  • the dopant is added, for example, in order to improve the luminous efficiency or change the emission wavelength.
  • the organic substance contained in the light emitting layer 7 may be a low molecular compound or a high molecular compound. Examples of the light emitting material constituting the light emitting layer 7 include known dye materials, metal complex materials, polymer materials, and dopant materials.
  • dye material examples include cyclopentamine and derivatives thereof, tetraphenylbutadiene and derivatives thereof, triphenylamine and derivatives thereof, oxadiazole and derivatives thereof, pyrazoloquinoline and derivatives thereof, distyrylbenzene and derivatives thereof, and distyryl.
  • Metal complex materials examples include rare earth metals such as Tb, Eu, and Dy, or Al, Zn, Be, Pt, Ir, and the like as a central metal, and an oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, and quinoline structure. And the like.
  • metal complexes include metal complexes having light emission from triplet excited states such as iridium complexes and platinum complexes, aluminum quinolinol complexes, benzoquinolinol beryllium complexes, benzoxazolyl zinc complexes, benzothiazole zinc complexes, azomethyl zinc complexes, A porphyrin zinc complex, a phenanthroline europium complex, etc. can be mentioned.
  • Polymer material examples include polyparaphenylene vinylene and derivatives thereof, polythiophene and derivatives thereof, polyparaphenylene and derivatives thereof, polysilane and derivatives thereof, polyacetylene and derivatives thereof, polyfluorene and derivatives thereof, polyvinylcarbazole and derivatives thereof, Examples thereof include materials obtained by polymerizing dye materials and metal complex materials.
  • Dopant material for light emitting layer examples include perylene and derivatives thereof, coumarin and derivatives thereof, rubrene and derivatives thereof, quinacridone and derivatives thereof, squalium and derivatives thereof, porphyrin and derivatives thereof, styryl dyes, tetracene and derivatives thereof, pyrazolone and derivatives thereof. Derivatives, decacyclene and its derivatives, phenoxazone and its derivatives, and the like.
  • the thickness of the light emitting layer 7 is usually about 2 nm to 200 nm.
  • the light emitting layer 7 is formed, for example, by a coating method using a coating liquid (for example, ink) containing the above light emitting material.
  • the solvent of the coating solution containing the light emitting material is not limited as long as it dissolves the light emitting material.
  • the cathode layer 9 is disposed on one main surface 3 a of the light emitting layer 7 and the support substrate 3.
  • the cathode layer 9 is electrically connected to the extraction electrode 9a.
  • the extraction electrode 9 a is disposed on one main surface 3 a of the support substrate 3.
  • the extraction electrode 9a is arranged at a predetermined interval from the anode layer 5 in the X direction.
  • the thickness of the extraction electrode 9 a is equal to the thickness of the anode layer 5. Examples of the material of the extraction electrode 9a include the same material as that of the anode layer 5.
  • an alkali metal, an alkaline earth metal, a transition metal, a Group 13 metal of the periodic table, or the like can be used.
  • the material of the cathode layer 9 include lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium. 1 type or more of gold, silver, platinum, copper, manganese, titanium, cobalt, nickel, tungsten, tin, etc. Or an alloy thereof, graphite, or a graphite intercalation compound.
  • alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, calcium-aluminum alloys, and the like. it can.
  • a transparent conductive electrode made of a conductive metal oxide, a conductive organic substance, or the like can be used.
  • examples of the conductive metal oxide include indium oxide, zinc oxide, tin oxide, ITO, and IZO
  • examples of the conductive organic substance include polyaniline and derivatives thereof, polythiophene and derivatives thereof, and the like.
  • the cathode layer 9 may be formed with nanostructures, such as silver nanoparticle or silver nanostructures, such as silver nanowire.
  • the cathode layer 9 may be comprised by the laminated body which laminated
  • the thickness of the cathode layer 9 is set in consideration of electric conductivity and durability.
  • the thickness of the cathode layer 9 is usually 10 nm to 10 ⁇ m, preferably 20 nm to 1 ⁇ m, and more preferably 50 nm to 500 nm.
  • Examples of the method for forming the cathode layer 9 include a vacuum deposition method, a sputtering method, and a laminating method and a coating method in which a metal thin film is thermocompression bonded.
  • the moisture absorption part 11 is a desiccant that captures moisture.
  • the moisture absorption part 11 may capture oxygen or the like in addition to moisture.
  • the hygroscopic portion 11 is disposed on the extraction electrode 9 a of the anode layer 5 and the cathode layer 9.
  • the hygroscopic portion 11 has a frame as viewed from the Z direction (see FIG. 1) (the stacking direction in which the anode layer 5, the light emitting layer 7 and the cathode layer 9 are stacked in the organic EL portion 17). It has a shape. That is, the hygroscopic part 11 is disposed so as to surround the organic EL part 17.
  • the hygroscopic part 11 is located outside the organic EL part 17 in the XY direction which is a direction orthogonal to the stacking direction.
  • illustration of the adhesion part 13 is abbreviate
  • the moisture absorption part 11 is arranged at a predetermined distance from the organic EL part 17. Specifically, as shown in FIG. 1, the distance D between the inner surface 11a of the hygroscopic part 11 and the organic EL part 17 is 0.5 mm or more and 10 mm or less, preferably 1 mm or more and 3 mm or less. .
  • the hygroscopic part 11 is covered with an adhesive part 13.
  • the hygroscopic part 11 is covered with an adhesive part 13 other than the surface in contact with the anode layer 5 or the extraction electrode 9a (cathode layer 9).
  • the cross section of the hygroscopic portion 11 has a rectangular shape
  • the inner side surface 11 a, the outer side surface 11 b, and the upper surface 11 c are covered with the adhesive portion 13.
  • Adhesive part 13, moisture absorbing part 11, adhesive part 13 and organic EL part 17 (light emitting layer 7, cathode layer 9), adhesive part 13, moisture absorbing part 11 and adhesive part 13 are arranged in this order.
  • the adhesive portion 13 is disposed between the moisture absorbing portion 11 and the organic EL portion 17.
  • the thickness T1 of the hygroscopic portion 11 is thinner than the thickness T2 of the adhesive portion 13.
  • the thickness T1 of the hygroscopic part 11 is 1 ⁇ 2 or less of the thickness T2 of the adhesive part 13, preferably 1/10 or less of the thickness T2 of the adhesive part 13.
  • the moisture absorbing part 11 is formed by curing a liquid getter material that is a precursor of the moisture absorbing part 11.
  • the liquid getter material contains a crosslinkable compound (curing component) having a photoreactive group.
  • the moisture absorption part 11 is formed by applying a liquid getter material to the adhesive bonding part 13, performing an ultraviolet ray (UV) irradiation process after application formation, and curing the liquid getter material.
  • Examples of the method for forming the hygroscopic portion 11 include printing methods such as an inkjet printing method and a dispenser method.
  • the liquid getter material may contain a crosslinkable compound having a thermally reactive group. In this case, the liquid getter material is cured by heat treatment.
  • the hygroscopic part 11 preferably contains at least one kind of a porous substance such as an organometallic compound, a metal oxide, or zeolite as a liquid getter material.
  • a porous substance such as an organometallic compound, a metal oxide, or zeolite as a liquid getter material.
  • the metal constituting the organometallic compound and the metal oxide preferably contains at least one of aluminum, calcium, and barium.
  • organoaluminum compounds, calcium oxide, and the like are more preferable because the water rehydration rate is high.
  • the hygroscopic part 11 may contain a binder, and in particular, may contain at least one of acrylic resin, epoxy resin, styrene resin, olefin resin, and amide resin.
  • the hygroscopic part 11 is made of a light transmissive material such as a getter material or a binder as described above, and the total light transmittance of visible light of the hygroscopic part 11 may be 50% or more. Further, the difference between the light refractive index of the moisture absorbing portion 11 and the light refractive index of the support substrate 3 may be 0.2 or less.
  • the shape of the moisture absorption part 11 may be a sheet.
  • the sheet getter material is affixed to the adhesive portion 13.
  • the sheet getter material may be a hygroscopic cured product, or may be cured by being subjected to heat treatment or UV irradiation treatment after being attached to the adhesive portion 13.
  • the moisture absorption speed of the moisture absorption part 11 is preferably 1 wt% / h or more in an environment of a humidity of 24 ° C. and a humidity of 55% RH.
  • the adhesive portion 13 is used for adhering the sealing substrate 15 to the organic EL portion 17 and the hygroscopic portion 11.
  • the adhesive portion 13 is disposed so as to cover the organic EL portion 17.
  • the adhesive portion 13 is made of a photocurable or thermosetting acrylate resin, or a photocurable or thermosetting epoxy resin.
  • a photocurable or thermosetting acrylate resin or a photocurable or thermosetting epoxy resin.
  • Other commonly used resin films that can be fused with an impulse sealer such as ethylene vinyl acetate copolymer (EVA), polypropylene (PP) film, polyethylene (PE) film, polybutadiene (PB) film, etc. You can also A thermoplastic resin can also be used.
  • the adhesion between the organic EL portion 17 and the adhesive portion 13 is high, and the organic EL portion 17 is caused by significant heat shrinkage of the adhesive and stress on the organic EL portion 17.
  • Adhesives that are highly effective in exfoliating, generating components that adversely affect the organic EL portion 17 from the adhesive portion 13, and having high barrier properties and suppressing generation / growth of dark spots are preferable.
  • the thickness of the adhesive portion 13 is preferably 1 ⁇ m to 200 ⁇ m, more preferably 10 ⁇ m to 100 ⁇ m, and even more preferably 30 ⁇ m to 60 ⁇ m. If this thickness is extremely thin, the unevenness on the surface of the organic EL portion 17 or the mixed dust cannot be embedded sufficiently, and they tend to cause mechanical stress on the organic EL material and cause dark spots. On the other hand, when this thickness is remarkably thick, it is easily affected by moisture entering from the end face of the adhesive portion 13. However, when the amount of adhesive applied is too large, tunneling, seepage, crimping, etc. may occur.
  • the moisture content of the adhesive portion 13 is preferably 300 ppm or less (weight basis).
  • Examples of the method for forming the adhesive portion 13 include a hot melt lamination method.
  • the hot melt lamination method is a method in which a hot melt adhesive is melted and an adhesive layer is coated on a support, and the thickness of the adhesive layer can be generally set in a wide range of 1 ⁇ m to 50 ⁇ m.
  • EVA ethylene ethyl acrylate copolymer
  • polyethylene butyl rubber, etc.
  • EVA ethylene ethyl acrylate copolymer
  • a tackifier, wax or the like is added as a plasticizer.
  • an extrusion laminating method is a method in which a resin melted at a high temperature is coated on a support with a die, and the thickness of the adhesive layer can generally be set in a wide range of 10 to 50 ⁇ m.
  • LDPE low density polyethylene
  • EVA EVA
  • PP polypropylene
  • the sealing substrate 15 is disposed on the uppermost portion (on the adhesive bonding portion 13) in the organic EL element 1.
  • the sealing substrate 15 may be a metal foil, a barrier film in which a barrier functional layer is formed on the front surface or back surface of a transparent plastic film, or both surfaces thereof, a thin film glass having flexibility, or a metal layer having barrier properties laminated on a plastic film. It has a gas barrier function, particularly a moisture barrier function.
  • the sealing substrate 15 is preferably a thermoplastic resin.
  • As the metal foil copper, aluminum, and stainless steel are preferable from the viewpoint of barrier properties.
  • the thickness of the metal foil is preferably as thick as possible from the viewpoint of suppressing pinholes, but is preferably 15 ⁇ m to 50 ⁇ m from the viewpoint of flexibility.
  • the organic EL unit 17 includes a step of forming the anode layer 5 on the dried support substrate 3 (anode layer forming step S02), a step of forming the light emitting layer 7 on the anode layer 5 (light emitting layer forming step S03), and light emission.
  • the step of forming the cathode layer 9 on the layer 7 is performed in this order.
  • the moisture absorbing portion 11 is formed (moisture absorbing portion forming step S05).
  • the moisture absorption part 11 can be formed by the formation method illustrated in the description of the moisture absorption part 11. And after forming the moisture absorption part 11, the organic EL part 17 and the sealing member 19 are bonded together, and the process (sealing process S06) which coat
  • a roll-to-roll method can be adopted as conceptually shown in FIG.
  • the organic EL element 1 is manufactured by the roll-to-roll method
  • the long flexible support substrate 3 stretched between the unwinding roll 30A and the winding roll 30B is continuously transported by the transport roller 31.
  • a method for forming the sealing member 19 to be bonded to the organic EL portion 17 in the sealing step S06 will be described.
  • the sealing base material 15 is a flexible base material
  • a roll-to-roll method can be adopted for forming the sealing member 19.
  • the sealing member 19 is manufactured by the roll-to-roll method, the long flexible sealing substrate 15 stretched between the unwinding roll and the winding roll is continuously conveyed by the conveying roller.
  • the adhesive portion 13 may be formed on the sealing substrate 15.
  • the adhesive portion 13 is formed on one surface of the sealing substrate 15 shown in FIG.
  • the adhesive portion 13 can be formed by the formation method exemplified in the description of the adhesive portion 13.
  • the sealing member 19 is formed.
  • the sealing member 19 formed as described above is subjected to a dehydration process before being bonded to the organic EL portion 17 formed on the support substrate 3.
  • the sealing substrate 15 of the sealing member 19 is heated.
  • an apparatus for heating the sealing substrate 15 an apparatus that irradiates the sealing substrate 15 with infrared rays, an apparatus that supplies hot air, a heating roller that contacts the sealing substrate 15, an oven, and the like can be used.
  • the dehydration treatment of the sealing substrate 15 is preferably performed in a nitrogen atmosphere.
  • the organic EL portion 17 and the sealing member 19 are bonded together as shown in FIG.
  • the exposed moisture absorbing portion 11 inner side surface 11 a, outer side surface 11 b, upper surface 11 c
  • the adhesive portion 13 of the sealing member 19 is covered with the adhesive portion 13 of the sealing member 19.
  • the organic EL portion 17 and the sealing member 19 formed on the support substrate 3 are bonded together as shown in FIG. Thereby, the support substrate 3 and the sealing member 19 pass between the heating rollers 32a and 32b. As a result, pressure is applied to the support substrate 3 and the sealing member 19 while being heated by the heating rollers 32a and 32b.
  • the adhesive portion 13 is thermally cured, and the adhesive portion 13 and the organic EL portion 17 are in close contact with each other.
  • the sealing base material 15 having thermoplasticity, it is plastically deformed by being heated, and the sealing base material 15 follows the shape of the organic EL portion 17.
  • the adhesive portion 13 is formed between the moisture absorbing portion 11 (inner side surface 11a) and the organic EL portion 17, as shown in FIG. 11 (upper surface 11 c) and the sealing substrate 15, and between the hygroscopic portion 11 and the end portions 13 a and 13 b in the X direction of the adhesive portion 13. As a result, the adhesive portion 13 covers the entire hygroscopic portion 11. Thus, as shown in FIG. 1, the organic EL element 1 is manufactured.
  • the moisture absorption unit 11 is outside the organic EL unit 17 and orthogonal to the stacking direction when viewed from the stacking direction (Z direction) of the organic EL unit 17.
  • the organic EL unit 17 is disposed at a predetermined interval.
  • the adhesive portion 13 includes the moisture absorbing portion 11 and the organic EL portion 17, the moisture absorbing portion 11 and the sealing substrate 15, and the moisture absorbing portion 11 and the end portions 13 a and 13 b of the adhesive portion 13. It is provided between.
  • the adhesive part 13 prevents the chemical component of the hygroscopic part 11 from entering the light emitting layer 7. it can. Therefore, in the organic EL element 1, since it is not necessary to provide a protective layer between the moisture absorption part 11 and the light emitting layer 7, in the manufacturing process, the process of forming a protective layer is not required. Moreover, since the moisture absorption part 11 is covered, the sealing member 19 can be bonded after the moisture absorption part 11 is formed on the support substrate 3 side. Therefore, when the sealing member 19 and the organic EL portion 17 are bonded together, high-precision positioning is not required. Therefore, the organic EL element 1 can improve productivity in the configuration including the hygroscopic portion 11.
  • the distance between the inner surface 11a of the moisture absorption part 11 and the organic EL part 17 is 0.5 mm or more and 10 mm or less.
  • the thickness T1 of the hygroscopic portion 11 is 1 ⁇ 2 or less of the thickness T2 of the adhesive portion 13. If the thickness T1 of the hygroscopic part 11 is too thick relative to the thickness T2 of the adhesive part, the hygroscopic part 11 cannot be properly covered by the adhesive part 13. By setting the thickness T1 of the hygroscopic part 11 to be equal to or less than 1 ⁇ 2 of the thickness T2 of the adhesive part 13, the hygroscopic part 11 can be appropriately covered by the adhesive part 13.
  • the present invention is not limited to the above-described embodiment, and various modifications can be made.
  • positioned between the anode layer 5 and the cathode layer 9 was illustrated.
  • the configuration of the organic functional layer is not limited to this.
  • the organic functional layer may have the following configuration.
  • Anode layer / light emitting layer / cathode layer (b) Anode layer / hole injection layer / light emitting layer / cathode layer (c) Anode layer / hole injection layer / light emitting layer / electron injection layer / cathode layer (d) Anode layer / hole injection layer / light emitting layer / electron transport layer / electron injection layer / cathode layer (e) Anode layer / hole injection layer / hole transport layer / light emitting layer / cathode layer (f) anode layer / hole Injection layer / hole transport layer / light emitting layer / electron injection layer / cathode layer (g) anode layer / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode layer (h) anode Layer / light emitting layer / electron injection layer / cathode layer (i) anode layer / light emitting layer / light
  • the hole injection layer As the materials for the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer, known materials can be used.
  • Each of the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer can be formed by, for example, a coating method in the same manner as the light emitting layer 7.
  • the organic EL element 1 may have a single light emitting layer 7 or may have two or more light emitting layers 7.
  • the layer structure shown to the following (j) can be mentioned, for example.
  • the two (structural unit A) layer structures may be the same or different.
  • the charge generation layer is a layer that generates holes and electrons by applying an electric field.
  • Examples of the charge generation layer include a thin film made of vanadium oxide, ITO, molybdenum oxide, or the like.
  • Examples of the configuration of the organic EL element having three or more light emitting layers include the layer configuration shown in the following (k). Can do. (K) Anode layer / (structural unit B) x / (structural unit A) / cathode layer
  • (Structural unit B) x represents a stacked body in which (Structural unit B) is stacked in x stages.
  • a plurality of (structural units B) may have the same or different layer structure.
  • the organic EL element may be configured by directly laminating a plurality of light emitting layers 7 without providing a charge generation layer.
  • an example in which the anode layer 5 is formed on the support substrate 3 by the roll-to-roll method has been described as an example.
  • the anode layer 5 is formed in advance on the support substrate 3, and the support substrate 3 on which the long anode layer 5 stretched between the unwinding roll 30A and the winding roll 30B is continuously conveyed.
  • Each process related to the manufacture of the organic EL element 1 may be performed while being conveyed by the roller 31.
  • the moisture absorbing portion 11 has a rectangular frame shape.
  • the hygroscopic portion 11 ⁇ / b> A may be provided intermittently.
  • the distance D between the inner surface 11Aa of the hygroscopic part 11A and the organic EL part 17 is 0.5 mm or more and 10 mm or less, preferably 1 mm or more and 3 mm or less.
  • the shape of the moisture absorption part is not limited to a rectangular shape.

Abstract

This organic EL element 1 comprises a sealing member 19, which comprises an adhesive portion 13 that has adhesion properties and that covers an organic EL portion 17 and a moisture absorption portion 11, and a sealing substrate 15 that is arranged over the adhesive portion 13. Seen from the direction of lamination of the organic EL portion 17, the moisture absorption portion 11 is arranged to the outside of the organic EL portion 17 and at a prescribed gap from the organic EL portion 17 in a direction perpendicular to the direction of lamination. The adhesive portion 13 is provided at least between the moisture absorption portion 11 and the organic EL portion 17, between the moisture absorption portion 11 and the sealing substrate 15, and between the moisture absorption portion 11 and the ends 13a, 13b of the adhesive portion 13 in the aforementioned perpendicular direction.

Description

有機EL素子及び有機EL素子の製造方法ORGANIC EL ELEMENT AND METHOD FOR PRODUCING ORGANIC EL ELEMENT
 本発明は、有機EL素子及び有機EL素子の製造方法に関する。 The present invention relates to an organic EL element and a method for manufacturing the organic EL element.
 従来の有機EL素子としては、例えば、特許文献1及び特許文献2に記載されたものが知られている。特許文献1に記載の有機EL素子は、基板上に、第1電極層と、有機機能層と、第2電極層と、保護層とがこの順番で積層されている。特許文献1に記載の有機EL素子では、保護層を覆うように、吸湿材を含有する封止層が設けられている。 As conventional organic EL elements, for example, those described in Patent Document 1 and Patent Document 2 are known. In the organic EL element described in Patent Document 1, a first electrode layer, an organic functional layer, a second electrode layer, and a protective layer are laminated in this order on a substrate. In the organic EL element described in Patent Document 1, a sealing layer containing a hygroscopic material is provided so as to cover the protective layer.
 特許文献2に記載の有機EL素子は、封止基材上に絶縁層及び粘着層を形成した封止部材を得る工程と、絶縁層及び粘着層に絶縁層除去部を形成する工程と、絶縁性除去部に吸湿剤を含有する樹脂を充填する工程と、封止部材を電子素子に貼り合わせる工程と、封止基材と電子素子とを貼り合わせた状態で、紫外線を照射して樹脂を硬化させる工程と、を含んで製造されている。 The organic EL element described in Patent Document 2 includes a step of obtaining a sealing member in which an insulating layer and an adhesive layer are formed on a sealing substrate, a step of forming an insulating layer removing portion in the insulating layer and the adhesive layer, and an insulation The step of filling the resin removal part with a resin containing a hygroscopic agent, the step of bonding the sealing member to the electronic element, and the state in which the sealing substrate and the electronic element are bonded together are irradiated with ultraviolet rays to give the resin. And a step of curing.
特開平8-236271号公報JP-A-8-236271 特開2011-222333号公報JP 2011-222333 A
 特許文献1に記載の有機EL素子では、封止層の化学成分が有機機能層に侵入してその化学成分と有機機能層とが反応することを抑制するために上記保護層を設けている。保護層は、例えば、CVD(化学気相成長)等によって形成される。このように、特許文献1に記載の有機EL素子は、その製造工程において保護層の形成工程が必要となるため、生産性が良くない。 In the organic EL element described in Patent Document 1, the protective layer is provided in order to suppress the chemical component of the sealing layer from entering the organic functional layer and reacting the chemical component with the organic functional layer. The protective layer is formed by, for example, CVD (chemical vapor deposition). As described above, the organic EL element described in Patent Document 1 has a poor productivity because a protective layer forming step is required in the manufacturing process.
 特許文献2に記載の有機EL素子の製造工程では、封止基材と電子素子とを貼り合わせるときに、絶縁性除去部に充填された樹脂が電子素子を囲うように、位置決めを行う必要がある。そのため、特許文献2に記載の有機EL素子は、封止基材と電子素子とを貼り合わせる工程において高度な位置合わせが要求されるため、その工程に時間を要し、生産性が良くない。 In the manufacturing process of the organic EL element described in Patent Document 2, when the sealing substrate and the electronic element are bonded together, it is necessary to perform positioning so that the resin filled in the insulating removal portion surrounds the electronic element. is there. For this reason, the organic EL element described in Patent Document 2 requires a high degree of alignment in the process of bonding the sealing substrate and the electronic element, so that the process takes time and the productivity is not good.
 本発明の一側面は、吸湿部を備える構成において、生産性の向上を図ることができる有機EL素子及び有機EL素子の製造方法を提供することを目的とする。 An object of one aspect of the present invention is to provide an organic EL element capable of improving productivity and a method for manufacturing the organic EL element in a configuration including a hygroscopic portion.
 本発明の一側面に係る有機EL素子は、支持基板と、当該支持基板上に配置され、第1電極層、有機機能層及び第2電極層が積層されて形成された有機EL部と、有機EL部を封止する封止部材と、吸湿性を有する吸湿部と、を備える有機EL素子であって、封止部材は、粘接着性を有すると共に有機EL部及び吸湿部を被覆する粘接着部と、粘接着部上に配置された封止基材と、を有し、吸湿部は、有機EL部の積層方向から見て、有機EL部の外側で且つ積層方向に直交する方向において有機EL部と所定の間隔をあけて配置されており、粘接着部は、少なくとも、吸湿部と有機EL部との間、吸湿部と封止基材との間、及び、吸湿部と当該粘接着部における上記直交する方向の端部との間に設けられている。 An organic EL device according to one aspect of the present invention includes a support substrate, an organic EL portion that is disposed on the support substrate, and is formed by stacking a first electrode layer, an organic functional layer, and a second electrode layer, An organic EL element comprising a sealing member that seals an EL portion and a hygroscopic portion having hygroscopicity, wherein the sealing member has adhesive properties and has a viscosity that covers the organic EL portion and the hygroscopic portion. An adhesive portion and a sealing substrate disposed on the adhesive portion, and the moisture absorption portion is outside the organic EL portion and orthogonal to the lamination direction when viewed from the lamination direction of the organic EL portion. It is arranged at a predetermined interval from the organic EL part in the direction, and the adhesive part is at least between the moisture absorbing part and the organic EL part, between the moisture absorbing part and the sealing substrate, and the moisture absorbing part. And the end portion in the orthogonal direction of the adhesive portion.
 本発明の一側面に係る有機EL素子では、吸湿部は、有機EL部の積層方向から見て、有機EL部の外側で且つ積層方向に直交する方向において有機EL部と所定の間隔をあけて配置されている。粘接着部は、少なくとも、吸湿部と有機EL部との間、吸湿部と封止基材との間、及び、吸湿部と当該粘接着部における直交する方向の端部との間に設けられている。このように、有機EL素子では、吸湿部が粘接着部によって全体が被覆されているため、吸湿部の化学成分が有機機能層に侵入することを粘接着部によって抑制できる。したがって、有機EL素子では、吸湿部と有機機能層との間に保護層を設ける必要がないため、その製造工程において、保護層を形成する工程を必要としない。また、吸湿部が被覆される構成のため、吸湿部を支持基板側に形成した後に、封止部材を貼り合わせることができる。そのため、封止部材と有機EL部との貼り合わせの際、高精度な位置決めが要求されない。したがって、この有機EL素子は、吸湿部を備える構成において、生産性の向上を図ることができる。 In the organic EL element according to one aspect of the present invention, the moisture absorbing portion is spaced apart from the organic EL portion at a predetermined interval in a direction outside the organic EL portion and perpendicular to the stacking direction when viewed from the stacking direction of the organic EL portion. Has been placed. The adhesive part is at least between the hygroscopic part and the organic EL part, between the hygroscopic part and the sealing substrate, and between the hygroscopic part and the end of the adhesive part in the orthogonal direction. Is provided. Thus, in the organic EL element, since the hygroscopic portion is entirely covered with the adhesive portion, the adhesive component can suppress the chemical component of the hygroscopic portion from entering the organic functional layer. Therefore, in the organic EL element, since it is not necessary to provide a protective layer between the moisture absorption part and the organic functional layer, a process for forming the protective layer is not required in the manufacturing process. Further, since the hygroscopic portion is covered, the sealing member can be bonded after the hygroscopic portion is formed on the support substrate side. Therefore, highly accurate positioning is not required when the sealing member and the organic EL part are bonded together. Therefore, this organic EL element can improve productivity in the structure provided with a moisture absorption part.
 一実施形態においては、支持基板は可撓性を有していてもよい。 In one embodiment, the support substrate may have flexibility.
 一実施形態においては、吸湿部の内側面と有機EL部との間の距離が0.5mm以上10mm以下であってもよい。これにより、吸湿部における水分の吸湿機能を有機EL部に対して効果的に発揮させることができる。 In one embodiment, the distance between the inner surface of the moisture absorption part and the organic EL part may be 0.5 mm or more and 10 mm or less. Thereby, the moisture absorption function of the moisture in a moisture absorption part can be effectively exhibited with respect to an organic EL part.
 一実施形態においては、吸湿部の厚みは、粘接着部の厚みの1/2以下であってもよい。吸湿部の厚みが粘接着部の厚みに対して厚すぎると、粘接着部によって吸湿部を適切に被覆できない。吸湿部の厚みを、粘接着部の厚みの1/2以下とすることにより、粘接着部によって吸湿部を適切に被覆できる。 In one embodiment, the thickness of the hygroscopic part may be 1/2 or less of the thickness of the adhesive part. If the thickness of the hygroscopic part is too thick relative to the thickness of the adhesive part, the hygroscopic part cannot be properly covered with the adhesive part. By setting the thickness of the hygroscopic part to ½ or less of the thickness of the adhesive part, the hygroscopic part can be appropriately covered with the adhesive part.
 本発明の一側面に係る有機EL素子の製造方法は、支持基板上に、第1電極層、有機機能層及び第2電極層を積層して有機EL部を形成する有機EL部形成工程と、有機EL部の積層方向から見て有機EL部の外側で且つ積層方向に直交する方向において有機EL部と所定の間隔をあけて、吸湿性を有する吸湿部を形成する吸湿部形成工程と、封止基材及び粘接着性を有する粘接着部を備える封止部材を有機EL部に貼り合わせ、有機EL部及び吸湿部において露出している部分を粘接着部により被覆する封止工程と、を含む。 The organic EL element manufacturing method according to one aspect of the present invention includes an organic EL part forming step of forming an organic EL part by laminating a first electrode layer, an organic functional layer, and a second electrode layer on a support substrate; A hygroscopic part forming step for forming a hygroscopic part having a hygroscopic property at a predetermined distance from the organic EL part in a direction perpendicular to the laminating direction outside the organic EL part as viewed from the laminating direction of the organic EL part; A sealing step of sticking a sealing member having an adhesive base having a stopping base material and adhesive properties to the organic EL portion, and covering the exposed portions of the organic EL portion and the moisture absorbing portion with the adhesive portion And including.
 本発明の一側面に係る有機EL素子の製造方法では、有機EL部の積層方向から見て有機EL部の外側で且つ積層方向に直交する方向において有機EL部と所定の間隔をあけて、吸湿性を有する吸湿部を形成する。そして、封止部材を有機EL部に貼り合わせ、有機EL部及び吸湿部において露出している部分を粘接着部により被覆する。この製造方法では、吸湿部と有機EL部との間に保護層を設ける必要がないため、保護層を形成する工程を必要としない。また、吸湿部を封止部材に形成しないため、封止部材を有機EL部に貼り合わせるときに、高度精度な位置合わせを行う必要がない。したがって、この製造方法では、吸湿部を備える構成において、生産性の向上を図ることができる。 In the method of manufacturing an organic EL element according to one aspect of the present invention, moisture absorption is performed at a predetermined interval from the organic EL unit in the direction outside the organic EL unit and perpendicular to the stacking direction when viewed from the stacking direction of the organic EL unit. Forming a hygroscopic part having the property. And a sealing member is bonded together to an organic EL part, and the part exposed in the organic EL part and a moisture absorption part is coat | covered with an adhesive part. In this manufacturing method, since it is not necessary to provide a protective layer between the moisture absorption part and the organic EL part, a process for forming the protective layer is not required. Further, since the hygroscopic portion is not formed on the sealing member, it is not necessary to perform highly accurate alignment when the sealing member is bonded to the organic EL portion. Therefore, in this manufacturing method, productivity can be improved in the configuration including the hygroscopic portion.
 一実施形態においては、支持基板は可撓性を有し、有機EL部形成工程、吸湿部形成工程及び封止工程は、巻出しロールに巻き取られた支持基板から連続的に送り出された支持基板を、巻取りロールに巻き取る過程中に行われる。この場合、いわゆるロールツーロール方式で各工程が実施されることになる。したがって、各工程を効率良く行うことができ、生産性の向上が図れる。 In one embodiment, the support substrate has flexibility, and the organic EL portion forming step, the moisture absorption portion forming step, and the sealing step are continuously supported from the support substrate wound on the unwinding roll. This is performed during the process of winding the substrate on a winding roll. In this case, each process is implemented by what is called a roll-to-roll system. Therefore, each process can be performed efficiently and productivity can be improved.
 一実施形態においては、吸湿部は、印刷法で形成されてもよい。これにより、吸湿部を所定の位置に正確に形成できる。 In one embodiment, the moisture absorption part may be formed by a printing method. Thereby, a moisture absorption part can be accurately formed in a predetermined position.
 一実施形態においては、封止部材と有機EL部とを、加熱した状態で圧力を加えて貼り合わせてもよい。これにより、有機EL部に接触する封止部材の粘接着部が硬化するため、粘接着部と有機EL部とを密着させることができる。 In one embodiment, the sealing member and the organic EL part may be bonded together by applying pressure in a heated state. Thereby, since the adhesion part of the sealing member which contacts an organic EL part hardens | cures, an adhesion part and an organic EL part can be stuck.
 一実施形態においては、封止基材は、熱可塑性樹脂であってもよい。これにより、封止基材に熱を加えることにより、有機EL部の形状に封止基材を追従させることができる。 In one embodiment, the sealing substrate may be a thermoplastic resin. Thereby, a sealing base material can be made to follow the shape of an organic EL part by applying heat to a sealing base material.
 本発明の一側面によれば、吸湿部を備える構成において、生産性の向上を図ることができる。 According to one aspect of the present invention, productivity can be improved in a configuration including a moisture absorption part.
図1は、一実施形態に係る有機EL素子の断面図である。FIG. 1 is a cross-sectional view of an organic EL element according to an embodiment. 図2は、図1におけるII-II線に沿った断面図である。FIG. 2 is a cross-sectional view taken along line II-II in FIG. 図3は、ロールツーロール方式による有機EL素子の製造方法を模式的に示す図である。FIG. 3 is a diagram schematically showing a method for manufacturing an organic EL element by a roll-to-roll method. 図4は、封止部材の製造工程を示す図である。FIG. 4 is a diagram illustrating a manufacturing process of the sealing member. 図5は、封止工程を示す図である。FIG. 5 is a diagram illustrating a sealing process. 図6は、ロールツーロール方式による封止工程を示す図である。FIG. 6 is a diagram showing a sealing process by a roll-to-roll method. 図7は、他の実施形態に係る有機EL素子の断面図である。FIG. 7 is a cross-sectional view of an organic EL element according to another embodiment.
 以下、添付図面を参照して、本発明の好適な実施形態について詳細に説明する。なお、図面の説明において同一又は相当要素には同一符号を付し、重複する説明は省略する。以下では、図1又は図2において「X方向」、「Y方向」、「Z方向」を定義し、各方向を説明に用いる。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same or equivalent elements will be denoted by the same reference numerals, and redundant description will be omitted. In the following, “X direction”, “Y direction”, and “Z direction” are defined in FIG. 1 or FIG. 2, and each direction is used for the description.
 図1に示されるように、有機EL素子1は、支持基板3と、陽極層(第1電極層)5と、発光層(有機機能層)7と、陰極層(第2電極層)9と、吸湿部11と、粘接着部13と、封止基材15と、を備えている。陽極層5、発光層7及び陰極層9は、有機EL部17を構成している。粘接着部13及び封止基材15は、封止部材19を構成している。 As shown in FIG. 1, the organic EL element 1 includes a support substrate 3, an anode layer (first electrode layer) 5, a light emitting layer (organic functional layer) 7, a cathode layer (second electrode layer) 9, The hygroscopic part 11, the adhesive part 13, and the sealing substrate 15 are provided. The anode layer 5, the light emitting layer 7, and the cathode layer 9 constitute an organic EL unit 17. The adhesive portion 13 and the sealing substrate 15 constitute a sealing member 19.
[支持基板]
 支持基板3は、可視光(波長400nm~800nmの光)に対して透光性を有する樹脂から構成されている。支持基板3は、フィルム状の基板(フレキシブル基板、可撓性を有する基板)である。支持基板3の厚さは、例えば、30μm以上500μm以下である。
[Support substrate]
The support substrate 3 is made of a resin that is transparent to visible light (light having a wavelength of 400 nm to 800 nm). The support substrate 3 is a film-like substrate (flexible substrate, flexible substrate). The thickness of the support substrate 3 is, for example, not less than 30 μm and not more than 500 μm.
 支持基板3は、例えば、プラスチックフィルムである。支持基板3の材料は、例えば、ポリエーテルスルホン(PES);ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)等のポリエステル樹脂;ポリエチレン(PE)、ポリプロピレン(PP)、環状ポリオレフィン等のポリオレフィン樹脂;ポリアミド樹脂;ポリカーボネート樹脂;ポリスチレン樹脂;ポリビニルアルコール樹脂;エチレン-酢酸ビニル共重合体のケン化物;ポリアクリロニトリル樹脂;アセタール樹脂;ポリイミド樹脂;エポキシ樹脂を含む。 The support substrate 3 is, for example, a plastic film. The material of the support substrate 3 is, for example, polyethersulfone (PES); polyester resin such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN); polyolefin resin such as polyethylene (PE), polypropylene (PP), or cyclic polyolefin; Polyamide resin; Polycarbonate resin; Polystyrene resin; Polyvinyl alcohol resin; Saponified ethylene-vinyl acetate copolymer; Polyacrylonitrile resin; Acetal resin; Polyimide resin;
 支持基板3の材料は、上記樹脂の中でも、耐熱性が高く、線膨張率が低く、かつ、製造コストが低いことから、ポリエステル樹脂、ポリオレフィン樹脂が好ましく、ポリエチレンテレフタレート、ポリエチレンナフタレートが特に好ましい。また、これらの樹脂は、1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 The material of the support substrate 3 is preferably a polyester resin or a polyolefin resin, and particularly preferably polyethylene terephthalate or polyethylene naphthalate because of its high heat resistance, low coefficient of linear expansion and low manufacturing cost among the above resins. Moreover, these resin may be used individually by 1 type, and may be used in combination of 2 or more type.
 支持基板3の一方の主面3a上には、水分バリア層(バリア層)が配置されていてもよい。支持基板3の他方の主面3bは、発光面である。なお、支持基板3は、薄膜ガラスであってもよい。 A moisture barrier layer (barrier layer) may be disposed on one main surface 3 a of the support substrate 3. The other main surface 3b of the support substrate 3 is a light emitting surface. The support substrate 3 may be a thin film glass.
[陽極層]
 陽極層5は、支持基板3の一方の主面3a上に配置されている。陽極層5には、光透過性を示す電極層が用いられる。光透過性を示す電極としては、電気伝導度の高い金属酸化物、金属硫化物及び金属等の薄膜を用いることができ、光透過率の高い薄膜が好適に用いられる。例えば酸化インジウム、酸化亜鉛、酸化スズ、インジウムスズ酸化物(Indium Tin Oxide:略称ITO)、インジウム亜鉛酸化物(Indium Zinc Oxide:略称IZO)、金、白金、銀、及び銅等からなる薄膜が用いられ、これらの中でもITO、IZO、又は酸化スズからなる薄膜が好適に用いられる。
[Anode layer]
The anode layer 5 is disposed on one main surface 3 a of the support substrate 3. For the anode layer 5, an electrode layer showing optical transparency is used. As the electrode exhibiting light transmittance, a thin film of metal oxide, metal sulfide, metal or the like having high electrical conductivity can be used, and a thin film having high light transmittance is preferably used. For example, a thin film made of indium oxide, zinc oxide, tin oxide, indium tin oxide (abbreviated as ITO), indium zinc oxide (abbreviated as IZO), gold, platinum, silver, copper, or the like is used. Among these, a thin film made of ITO, IZO, or tin oxide is preferably used.
 陽極層5として、ポリアニリン及びその誘導体、ポリチオフェン及びその誘導体等の有機物の透明導電膜を用いてもよい。 As the anode layer 5, an organic transparent conductive film such as polyaniline and derivatives thereof, polythiophene and derivatives thereof may be used.
 陽極層5の厚さは、光の透過性、電気伝導度等を考慮して決定することができる。陽極層5の厚さは、通常、10nm~10μmであり、好ましくは20nm~1μmであり、さらに好ましくは50nm~500nmである。 The thickness of the anode layer 5 can be determined in consideration of light transmittance, electrical conductivity, and the like. The thickness of the anode layer 5 is usually 10 nm to 10 μm, preferably 20 nm to 1 μm, and more preferably 50 nm to 500 nm.
 陽極層5の形成方法としては、真空蒸着法、スパッタリング法、イオンプレーティング法、メッキ法及び塗布法等を挙げることができる。 Examples of the method for forming the anode layer 5 include a vacuum deposition method, a sputtering method, an ion plating method, a plating method, and a coating method.
[発光層]
 発光層7は、陽極層5及び支持基板3の一方の主面3a上に配置されている。発光層7は、通常、主として蛍光及び/又はりん光を発光する有機物又は該有機物と、これを補助するドーパントと、から形成される。ドーパントは、例えば、発光効率の向上、又は、発光波長を変化させるために加えられる。発光層7に含まれる有機物は、低分子化合物であってもよいし、高分子化合物であってもよい。発光層7を構成する発光材料としては、例えば、公知の色素系材料、金属錯体系材料、高分子系材料、ドーパント材料を挙げることができる。
[Light emitting layer]
The light emitting layer 7 is disposed on one main surface 3 a of the anode layer 5 and the support substrate 3. The light emitting layer 7 is usually formed of an organic substance that mainly emits fluorescence and / or phosphorescence or the organic substance and a dopant that assists the organic substance. The dopant is added, for example, in order to improve the luminous efficiency or change the emission wavelength. The organic substance contained in the light emitting layer 7 may be a low molecular compound or a high molecular compound. Examples of the light emitting material constituting the light emitting layer 7 include known dye materials, metal complex materials, polymer materials, and dopant materials.
(色素材料)
 色素材料としては、例えばシクロペンダミン及びその誘導体、テトラフェニルブタジエン及びその誘導体、トリフェニルアミン及びその誘導体、オキサジアゾール及びその誘導体、ピラゾロキノリン及びその誘導体、ジスチリルベンゼン及びその誘導体、ジスチリルアリーレン及びその誘導体、ピロール及びその誘導体、チオフェン化合物、ピリジン化合物、ペリノン及びその誘導体、ペリレン及びその誘導体、オリゴチオフェン及びその誘導体、オキサジアゾールダイマー、ピラゾリンダイマー、キナクリドン及びその誘導体、クマリン及びその誘導体等を挙げることができる。
(Dye material)
Examples of the dye material include cyclopentamine and derivatives thereof, tetraphenylbutadiene and derivatives thereof, triphenylamine and derivatives thereof, oxadiazole and derivatives thereof, pyrazoloquinoline and derivatives thereof, distyrylbenzene and derivatives thereof, and distyryl. Arylene and derivatives thereof, pyrrole and derivatives thereof, thiophene compounds, pyridine compounds, perinone and derivatives thereof, perylene and derivatives thereof, oligothiophene and derivatives thereof, oxadiazole dimer, pyrazoline dimer, quinacridone and derivatives thereof, coumarin and derivatives thereof Etc.
(金属錯体材料)
 金属錯体材料としては、例えばTb、Eu、Dy等の希土類金属、又はAl、Zn、Be、Pt、Ir等を中心金属に有し、オキサジアゾール、チアジアゾール、フェニルピリジン、フェニルベンゾイミダゾール、キノリン構造等を配位子に有する金属錯体を挙げることができる。金属錯体としては、例えばイリジウム錯体、白金錯体等の三重項励起状態からの発光を有する金属錯体、アルミニウムキノリノール錯体、ベンゾキノリノールベリリウム錯体、ベンゾオキサゾリル亜鉛錯体、ベンゾチアゾール亜鉛錯体、アゾメチル亜鉛錯体、ポルフィリン亜鉛錯体、フェナントロリンユーロピウム錯体等を挙げることができる。
(Metal complex materials)
Examples of metal complex materials include rare earth metals such as Tb, Eu, and Dy, or Al, Zn, Be, Pt, Ir, and the like as a central metal, and an oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, and quinoline structure. And the like. Examples of metal complexes include metal complexes having light emission from triplet excited states such as iridium complexes and platinum complexes, aluminum quinolinol complexes, benzoquinolinol beryllium complexes, benzoxazolyl zinc complexes, benzothiazole zinc complexes, azomethyl zinc complexes, A porphyrin zinc complex, a phenanthroline europium complex, etc. can be mentioned.
(高分子材料)
 高分子材料としては、例えばポリパラフェニレンビニレン及びその誘導体、ポリチオフェン及びその誘導体、ポリパラフェニレン及びその誘導体、ポリシラン及びその誘導体、ポリアセチレン及びその誘導体、ポリフルオレン及びその誘導体、ポリビニルカルバゾール及びその誘導体、上記色素材料、金属錯体材料を高分子化した材料等を挙げることができる。
(Polymer material)
Examples of the polymer material include polyparaphenylene vinylene and derivatives thereof, polythiophene and derivatives thereof, polyparaphenylene and derivatives thereof, polysilane and derivatives thereof, polyacetylene and derivatives thereof, polyfluorene and derivatives thereof, polyvinylcarbazole and derivatives thereof, Examples thereof include materials obtained by polymerizing dye materials and metal complex materials.
(発光層用ドーパント材料)
 発光層用ドーパント材料としては、例えばペリレン及びその誘導体、クマリン及びその誘導体、ルブレン及びその誘導体、キナクリドン及びその誘導体、スクアリウム及びその誘導体、ポルフィリン及びその誘導体、スチリル色素、テトラセン及びその誘導体、ピラゾロン及びその誘導体、デカシクレン及びその誘導体、フェノキサゾン及びその誘導体等を挙げることができる。
(Dopant material for light emitting layer)
Examples of the dopant material for the light emitting layer include perylene and derivatives thereof, coumarin and derivatives thereof, rubrene and derivatives thereof, quinacridone and derivatives thereof, squalium and derivatives thereof, porphyrin and derivatives thereof, styryl dyes, tetracene and derivatives thereof, pyrazolone and derivatives thereof. Derivatives, decacyclene and its derivatives, phenoxazone and its derivatives, and the like.
 発光層7の厚さは、通常約2nm~200nmである。発光層7は、例えば、上記のような発光材料を含む塗布液(例えばインク)を用いる塗布法により形成される。発光材料を含む塗布液の溶媒としては、発光材料を溶解するものであれば、限定されない。 The thickness of the light emitting layer 7 is usually about 2 nm to 200 nm. The light emitting layer 7 is formed, for example, by a coating method using a coating liquid (for example, ink) containing the above light emitting material. The solvent of the coating solution containing the light emitting material is not limited as long as it dissolves the light emitting material.
[陰極層]
 陰極層9は、発光層7及び支持基板3の一方の主面3a上に配置されている。陰極層9は、引出電極9aに電気的に接続されている。引出電極9aは、支持基板3の一方の主面3aに配置されている。引出電極9aは、X方向において陽極層5と所定の間隔をあけて配置されている。引出電極9aの厚みは、陽極層5の厚みと同等である。引出電極9aの材料としては、陽極層5と同様の材料を挙げることができる。
[Cathode layer]
The cathode layer 9 is disposed on one main surface 3 a of the light emitting layer 7 and the support substrate 3. The cathode layer 9 is electrically connected to the extraction electrode 9a. The extraction electrode 9 a is disposed on one main surface 3 a of the support substrate 3. The extraction electrode 9a is arranged at a predetermined interval from the anode layer 5 in the X direction. The thickness of the extraction electrode 9 a is equal to the thickness of the anode layer 5. Examples of the material of the extraction electrode 9a include the same material as that of the anode layer 5.
 陰極層9の材料としては、例えばアルカリ金属、アルカリ土類金属、遷移金属及び周期表第13族金属等を用いることができる。陰極層9の材料としては、例えばリチウム、ナトリウム、カリウム、ルビジウム、セシウム、ベリリウム、マグネシウム、カルシウム、ストロンチウム、バリウム、アルミニウム、スカンジウム、バナジウム、亜鉛、イットリウム、インジウム、セリウム、サマリウム、ユーロピウム、テルビウム、イッテルビウム等の金属、前記金属のうちの2種以上の合金、前記金属のうちの1種以上と、金、銀、白金、銅、マンガン、チタン、コバルト、ニッケル、タングステン、錫のうちの1種以上との合金、又はグラファイト若しくはグラファイト層間化合物等が用いられる。合金の例としては、マグネシウム-銀合金、マグネシウム-インジウム合金、マグネシウム-アルミニウム合金、インジウム-銀合金、リチウム-アルミニウム合金、リチウム-マグネシウム合金、リチウム-インジウム合金、カルシウム-アルミニウム合金等を挙げることができる。 As a material of the cathode layer 9, for example, an alkali metal, an alkaline earth metal, a transition metal, a Group 13 metal of the periodic table, or the like can be used. Examples of the material of the cathode layer 9 include lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium. 1 type or more of gold, silver, platinum, copper, manganese, titanium, cobalt, nickel, tungsten, tin, etc. Or an alloy thereof, graphite, or a graphite intercalation compound. Examples of alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, calcium-aluminum alloys, and the like. it can.
 また、陰極層9としては、例えば、導電性金属酸化物及び導電性有機物等からなる透明導電性電極を用いることができる。 Moreover, as the cathode layer 9, for example, a transparent conductive electrode made of a conductive metal oxide, a conductive organic substance, or the like can be used.
 具体的には、導電性金属酸化物として酸化インジウム、酸化亜鉛、酸化スズ、ITO、及びIZOを挙げることができ、導電性有機物としてポリアニリン及びその誘導体、ポリチオフェン及びその誘導体等を挙げることができる。また、陰極層9は、銀ナノパーティクル、又は、銀ナノワイヤー等の銀ナノ構造体等のナノ構造体で形成されていてもよい。なお、陰極層9は、2層以上を積層した積層体で構成されていてもよい。なお、電子注入層が陰極層9として用いられる場合もある。 Specifically, examples of the conductive metal oxide include indium oxide, zinc oxide, tin oxide, ITO, and IZO, and examples of the conductive organic substance include polyaniline and derivatives thereof, polythiophene and derivatives thereof, and the like. Moreover, the cathode layer 9 may be formed with nanostructures, such as silver nanoparticle or silver nanostructures, such as silver nanowire. In addition, the cathode layer 9 may be comprised by the laminated body which laminated | stacked two or more layers. An electron injection layer may be used as the cathode layer 9 in some cases.
 陰極層9の厚さは、電気伝導度、耐久性を考慮して設定される。陰極層9の厚さは、通常、10nm~10μmであり、好ましくは20nm~1μmであり、さらに好ましくは50nm~500nmである。 The thickness of the cathode layer 9 is set in consideration of electric conductivity and durability. The thickness of the cathode layer 9 is usually 10 nm to 10 μm, preferably 20 nm to 1 μm, and more preferably 50 nm to 500 nm.
 陰極層9の形成方法としては、例えば真空蒸着法、スパッタリング法、また金属薄膜を熱圧着するラミネート法及び塗布法等を挙げることができる。 Examples of the method for forming the cathode layer 9 include a vacuum deposition method, a sputtering method, and a laminating method and a coating method in which a metal thin film is thermocompression bonded.
[吸湿部]
 吸湿部11は、水分を捕獲する乾燥材である。吸湿部11は、水分の他に、酸素等を捕獲してもよい。吸湿部11は、陽極層5及び陰極層9の引出電極9a上に配置されている。図2に示されるように、吸湿部11は、Z方向(図1参照)(有機EL部17において陽極層5、発光層7及び陰極層9が積層されている積層方向)から見て、枠状を呈している。すなわち、吸湿部11は、有機EL部17を囲うように配置されている。吸湿部11は、積層方向に直交する方向であるXY方向において、有機EL部17の外側に位置している。なお、図2においては、粘接着部13の図示を省略している。
[Hygroscopic part]
The moisture absorption part 11 is a desiccant that captures moisture. The moisture absorption part 11 may capture oxygen or the like in addition to moisture. The hygroscopic portion 11 is disposed on the extraction electrode 9 a of the anode layer 5 and the cathode layer 9. As shown in FIG. 2, the hygroscopic portion 11 has a frame as viewed from the Z direction (see FIG. 1) (the stacking direction in which the anode layer 5, the light emitting layer 7 and the cathode layer 9 are stacked in the organic EL portion 17). It has a shape. That is, the hygroscopic part 11 is disposed so as to surround the organic EL part 17. The hygroscopic part 11 is located outside the organic EL part 17 in the XY direction which is a direction orthogonal to the stacking direction. In addition, in FIG. 2, illustration of the adhesion part 13 is abbreviate | omitted.
 吸湿部11は、有機EL部17と所定の距離をあけて配置されている。具体的には、図1に示されるように、吸湿部11の内側面11aと有機EL部17との間の距離Dは、0.5mm以上10mm以下であり、好ましくは1mm以上3mm以下である。 The moisture absorption part 11 is arranged at a predetermined distance from the organic EL part 17. Specifically, as shown in FIG. 1, the distance D between the inner surface 11a of the hygroscopic part 11 and the organic EL part 17 is 0.5 mm or more and 10 mm or less, preferably 1 mm or more and 3 mm or less. .
 吸湿部11は、粘接着部13に被覆されている。吸湿部11は、陽極層5又は引出電極9a(陰極層9)と当接する面以外の部分が粘接着部13に覆われている。例えば、図1に示されるように、吸湿部11の断面が矩形状を呈している場合には、内側面11a、外側面11b及び上面11cが粘接着部13に覆われている。これにより、有機EL素子1では、図1に示されるように、Z方向の所定の高さ位置で、支持基板3の端部13aから端部13bに向かってX方向に沿って見たときに、粘接着部13、吸湿部11、粘接着部13及び有機EL部17(発光層7、陰極層9)、粘接着部13、吸湿部11及び粘接着部13の順番で配置されている。つまり、有機EL素子1では、吸湿部11と有機EL部17との間には、粘接着部13が配置されている。 The hygroscopic part 11 is covered with an adhesive part 13. The hygroscopic part 11 is covered with an adhesive part 13 other than the surface in contact with the anode layer 5 or the extraction electrode 9a (cathode layer 9). For example, as shown in FIG. 1, when the cross section of the hygroscopic portion 11 has a rectangular shape, the inner side surface 11 a, the outer side surface 11 b, and the upper surface 11 c are covered with the adhesive portion 13. Thereby, when the organic EL element 1 is viewed along the X direction from the end portion 13a of the support substrate 3 toward the end portion 13b at a predetermined height position in the Z direction, as shown in FIG. , Adhesive part 13, moisture absorbing part 11, adhesive part 13 and organic EL part 17 (light emitting layer 7, cathode layer 9), adhesive part 13, moisture absorbing part 11 and adhesive part 13 are arranged in this order. Has been. That is, in the organic EL element 1, the adhesive portion 13 is disposed between the moisture absorbing portion 11 and the organic EL portion 17.
 吸湿部11の厚みT1は、粘接着部13の厚みT2よりも薄い。吸湿部11の厚みT1は、粘接着部13の厚みT2の1/2以下、好ましくは粘接着部13の厚みT2の1/10以下である。 The thickness T1 of the hygroscopic portion 11 is thinner than the thickness T2 of the adhesive portion 13. The thickness T1 of the hygroscopic part 11 is ½ or less of the thickness T2 of the adhesive part 13, preferably 1/10 or less of the thickness T2 of the adhesive part 13.
 吸湿部11は、吸湿部11の前駆体である液体ゲッター材を硬化させて形成される。液体ゲッター材は、光反応性基を有する架橋性化合物(硬化成分)を含んでいる。吸湿部11は、粘接着部13に液体ゲッター材が塗布されて、塗布形成後、紫外線(UV)照射処理を行い、液体ゲッター材を硬化させて形成される。吸湿部11の形成方法の例としては、インクジェットプリント法、ディスペンサー法等の印刷法が挙げることができる。また、液体ゲッター材は、熱反応性基を有する架橋性化合物を含んでいてもよい。この場合、液体ゲッター材は、加熱処理により硬化させる。 The moisture absorbing part 11 is formed by curing a liquid getter material that is a precursor of the moisture absorbing part 11. The liquid getter material contains a crosslinkable compound (curing component) having a photoreactive group. The moisture absorption part 11 is formed by applying a liquid getter material to the adhesive bonding part 13, performing an ultraviolet ray (UV) irradiation process after application formation, and curing the liquid getter material. Examples of the method for forming the hygroscopic portion 11 include printing methods such as an inkjet printing method and a dispenser method. Further, the liquid getter material may contain a crosslinkable compound having a thermally reactive group. In this case, the liquid getter material is cured by heat treatment.
 吸湿部11は、液体ゲッター材として少なくとも有機金属化合物、金属酸化物、ゼオライト等の多孔質物質、のうちの1種類を含んでいることが好ましい。さらに、有機金属化合物と金属酸化物を構成する金属は、少なくともアルミニウム、カルシウム、バリウムの少なくとも1種類を含んでいることが好ましい。特に有機アルミニウム化合物や酸化カルシウム等は、水分の補水速度が速いため、さらに好ましい。 The hygroscopic part 11 preferably contains at least one kind of a porous substance such as an organometallic compound, a metal oxide, or zeolite as a liquid getter material. Furthermore, the metal constituting the organometallic compound and the metal oxide preferably contains at least one of aluminum, calcium, and barium. In particular, organoaluminum compounds, calcium oxide, and the like are more preferable because the water rehydration rate is high.
 また、吸湿部11は、バインダーを含んでいてもよく、特にアクリル系樹脂、エポキシ系樹脂、スチレン系樹脂、オレフィン系樹脂、及び、アミド系樹脂のうちの少なくとも1種を含んでいてもよい。 Further, the hygroscopic part 11 may contain a binder, and in particular, may contain at least one of acrylic resin, epoxy resin, styrene resin, olefin resin, and amide resin.
 また、吸湿部11は、上記のようなゲッター材やバインダー等の光透過性を有する材料からなり、吸湿部11の可視光の全光線透過率は、50%以上であってもよい。また、吸湿部11の光屈折率と支持基板3の光屈折率との差は、0.2以下であってもよい。 Further, the hygroscopic part 11 is made of a light transmissive material such as a getter material or a binder as described above, and the total light transmittance of visible light of the hygroscopic part 11 may be 50% or more. Further, the difference between the light refractive index of the moisture absorbing portion 11 and the light refractive index of the support substrate 3 may be 0.2 or less.
 吸湿部11の形状は、シートでもよい。シートゲッター材は、粘接着部13に貼付される。シートゲッター材は、吸湿性硬化物であってもよいし、粘接着部13に貼付された後に、加熱処理又はUV照射処理を行い、硬化させてもよい。 The shape of the moisture absorption part 11 may be a sheet. The sheet getter material is affixed to the adhesive portion 13. The sheet getter material may be a hygroscopic cured product, or may be cured by being subjected to heat treatment or UV irradiation treatment after being attached to the adhesive portion 13.
 吸湿部11の吸湿速度は、湿度24℃、湿度55%RHの環境下において、1wt%/h以上であることが好ましい。 The moisture absorption speed of the moisture absorption part 11 is preferably 1 wt% / h or more in an environment of a humidity of 24 ° C. and a humidity of 55% RH.
[粘接着部]
 粘接着部13は、封止基材15を有機EL部17及び吸湿部11に接着させるために用いられるものである。粘接着部13は、有機EL部17を覆うように配置されている。
[Adhesive part]
The adhesive portion 13 is used for adhering the sealing substrate 15 to the organic EL portion 17 and the hygroscopic portion 11. The adhesive portion 13 is disposed so as to cover the organic EL portion 17.
 粘接着部13は、具体的には、光硬化性又は熱硬化性のアクリレート樹脂、或いは、光硬化性又は熱硬化性のエポキシ樹脂から構成される。その他一般に使用されるインパルスシーラーで融着可能な樹脂フィルム、例えばエチレン酢酸ビニルコポリマー(EVA)、ポリプロピレン(PP)フィルム、ポリエチレン(PE)フィルム、ポリブタジエン(PB)フィルム等の熱融着性フィルムを使用することもできる。また、熱可塑性樹脂も使用することができる。 Specifically, the adhesive portion 13 is made of a photocurable or thermosetting acrylate resin, or a photocurable or thermosetting epoxy resin. Other commonly used resin films that can be fused with an impulse sealer, such as ethylene vinyl acetate copolymer (EVA), polypropylene (PP) film, polyethylene (PE) film, polybutadiene (PB) film, etc. You can also A thermoplastic resin can also be used.
 粘接着部13に用いられる接着材としては、有機EL部17と粘接着部13との接着性が高く、また、著しい接着材熱収縮、有機EL部17へのストレスによる有機EL部17の剥離、粘接着部13からの有機EL部17へ悪影響を及ぼす成分の発生、及びバリア性が高くダークスポットの発生・成長を抑制する効果が高い接着材が好ましい。 As an adhesive used for the adhesive portion 13, the adhesion between the organic EL portion 17 and the adhesive portion 13 is high, and the organic EL portion 17 is caused by significant heat shrinkage of the adhesive and stress on the organic EL portion 17. Adhesives that are highly effective in exfoliating, generating components that adversely affect the organic EL portion 17 from the adhesive portion 13, and having high barrier properties and suppressing generation / growth of dark spots are preferable.
 粘接着部13の厚さは、好ましくは1μm~200μm、より好ましくは10μm~100μm、さらに好ましくは30μm~60μmである。この厚さが著しく薄いと、有機EL部17表面の凹凸又は混入した塵埃を十分埋め込むことができず、それらが有機EL材料に機械的なストレスを与えダークスポットの原因となりやすい。一方、この厚さが著しく厚いと、粘接着部13の端面から侵入する水分の影響を受けやすい。ただし、接着剤の塗設量が多すぎる場合には、トンネル、浸み出し、縮緬皺等が発生することがある。粘接着部13の含有水分量は、300ppm以下(重量基準)であることが好ましい。 The thickness of the adhesive portion 13 is preferably 1 μm to 200 μm, more preferably 10 μm to 100 μm, and even more preferably 30 μm to 60 μm. If this thickness is extremely thin, the unevenness on the surface of the organic EL portion 17 or the mixed dust cannot be embedded sufficiently, and they tend to cause mechanical stress on the organic EL material and cause dark spots. On the other hand, when this thickness is remarkably thick, it is easily affected by moisture entering from the end face of the adhesive portion 13. However, when the amount of adhesive applied is too large, tunneling, seepage, crimping, etc. may occur. The moisture content of the adhesive portion 13 is preferably 300 ppm or less (weight basis).
 粘接着部13を形成する方法としては、例えば、ホットメルトラミネーション法が挙げられる。ホットメルトラミネーション法とは、ホットメルト接着剤を溶融し支持体に接着層を塗設する方法であり、接着層の厚さを一般に1μm~50μmと広い範囲で設定可能な方法である。ホットメルトラミネーション法で一般に使用される接着剤のベースレジンとしては、EVA、エチレンエチルアクリレートコポリマー(EEA)、ポリエチレン、ブチルラバー等が使用され、ロジン、キシレン樹脂、テルペン系樹脂、スチレン系樹脂等が粘着付与剤として、ワックス等が可塑剤として添加される。 Examples of the method for forming the adhesive portion 13 include a hot melt lamination method. The hot melt lamination method is a method in which a hot melt adhesive is melted and an adhesive layer is coated on a support, and the thickness of the adhesive layer can be generally set in a wide range of 1 μm to 50 μm. EVA, ethylene ethyl acrylate copolymer (EEA), polyethylene, butyl rubber, etc. are used as the base resin of the adhesive generally used in the hot melt lamination method, and rosin, xylene resin, terpene resin, styrene resin, etc. As a tackifier, wax or the like is added as a plasticizer.
 また、粘接着部13を形成する方法としては、例えば、エクストルージョンラミネート法が挙げられる。エクストルージョンラミネート法とは、高温で溶融した樹脂をダイスにより支持体上に塗設する方法であり、接着層の厚さを一般に10~50μmと広い範囲で設定可能な方法である。エクストルージョンラミネート法に使用される樹脂としては一般に、低密度ポリエチレン(LDPE)、EVA、PP等が使用される。 Further, as a method of forming the adhesive portion 13, for example, an extrusion laminating method can be mentioned. The extrusion laminating method is a method in which a resin melted at a high temperature is coated on a support with a die, and the thickness of the adhesive layer can generally be set in a wide range of 10 to 50 μm. Generally, low density polyethylene (LDPE), EVA, PP or the like is used as a resin used in the extrusion laminating method.
[封止部材]
 封止基材15は、有機EL素子1において最上部(粘接着部13上)に配置されている。封止基材15は、金属ホイル、透明なプラスチックフィルムの表面若しくは裏面又はその両面にバリア機能層を形成したバリアフィルム、或いはフレキブル性を有する薄膜ガラス、プラスチックフィルム上にバリア性を有する金属積層させたフィルム等からなり、ガスバリア機能、特に水分バリア機能を有する。封止基材15は、熱可塑性樹脂であることが好ましい。金属ホイルとしては、バリア性の観点から、銅、アルミニウム、ステンレスが好ましい。金属ホイルの厚みとしては、ピンホール抑制の観点から厚い程好ましいが、フレキシブル性の観点も考慮すると15μm~50μmが好ましい。
[Sealing member]
The sealing substrate 15 is disposed on the uppermost portion (on the adhesive bonding portion 13) in the organic EL element 1. The sealing substrate 15 may be a metal foil, a barrier film in which a barrier functional layer is formed on the front surface or back surface of a transparent plastic film, or both surfaces thereof, a thin film glass having flexibility, or a metal layer having barrier properties laminated on a plastic film. It has a gas barrier function, particularly a moisture barrier function. The sealing substrate 15 is preferably a thermoplastic resin. As the metal foil, copper, aluminum, and stainless steel are preferable from the viewpoint of barrier properties. The thickness of the metal foil is preferably as thick as possible from the viewpoint of suppressing pinholes, but is preferably 15 μm to 50 μm from the viewpoint of flexibility.
[有機EL素子の製造方法]
 続いて、上記構成を有する有機EL素子1の製造方法について説明する。
[Method of manufacturing organic EL element]
Then, the manufacturing method of the organic EL element 1 which has the said structure is demonstrated.
 有機EL素子1を製造する場合、最初に、支持基板3を加熱し、乾燥させる(基板乾燥工程S01)。その後、乾燥された支持基板3上に、有機EL部17を形成する(有機EL部形成工程)。有機EL部17は、乾燥された支持基板3上に陽極層5を形成する工程(陽極層形成工程S02)、陽極層5上に発光層7を形成する工程(発光層形成工程S03)、発光層7上に陰極層9を形成する工程(陰極層形成工程S04)をこの順に実施する。有機EL部17を形成する場合、各層は、各層の説明の際に例示した形成方法で形成し得る。 When manufacturing the organic EL element 1, first, the support substrate 3 is heated and dried (substrate drying step S01). Then, the organic EL part 17 is formed on the dried support substrate 3 (organic EL part formation process). The organic EL unit 17 includes a step of forming the anode layer 5 on the dried support substrate 3 (anode layer forming step S02), a step of forming the light emitting layer 7 on the anode layer 5 (light emitting layer forming step S03), and light emission. The step of forming the cathode layer 9 on the layer 7 (cathode layer forming step S04) is performed in this order. When forming the organic EL part 17, each layer can be formed with the formation method illustrated in the description of each layer.
 有機EL部17を形成した後、吸湿部11を形成する(吸湿部形成工程S05)。吸湿部11は、吸湿部11の説明の際に例示した形成方法で形成し得る。そして、吸湿部11を形成した後、有機EL部17と封止部材19とを貼り合わせて、有機EL部17を封止部材19で被覆する工程(封止工程S06)を実施する。 After forming the organic EL portion 17, the moisture absorbing portion 11 is formed (moisture absorbing portion forming step S05). The moisture absorption part 11 can be formed by the formation method illustrated in the description of the moisture absorption part 11. And after forming the moisture absorption part 11, the organic EL part 17 and the sealing member 19 are bonded together, and the process (sealing process S06) which coat | covers the organic EL part 17 with the sealing member 19 is implemented.
 支持基板3が可撓性基板である形態では、図3に概念的に示すように、ロールツーロール方式が採用され得る。ロールツーロール方式で有機EL素子1を製造する場合、巻出しロール30Aと巻取りロール30Bとの間に張り渡された長尺の可撓性の支持基板3を連続的に搬送ローラ31で搬送しながら、支持基板3の乾燥、有機EL部17を構成する各層の形成及び吸湿部11の形成を行ってもよい。なお、吸湿部形成工程S05以降の工程のみを、ロールツーロール方式で行ってもよい。 In a form in which the support substrate 3 is a flexible substrate, a roll-to-roll method can be adopted as conceptually shown in FIG. When the organic EL element 1 is manufactured by the roll-to-roll method, the long flexible support substrate 3 stretched between the unwinding roll 30A and the winding roll 30B is continuously transported by the transport roller 31. However, you may dry the support substrate 3, formation of each layer which comprises the organic EL part 17, and formation of the moisture absorption part 11. FIG. In addition, you may perform only the process after moisture absorption part formation process S05 by a roll-to-roll system.
 封止工程S06において有機EL部17に貼り合わされる封止部材19を形成する方法について説明する。封止基材15が可撓性基材である形態では、封止部材19の形成にロールツーロール方式が採用され得る。ロールツーロール方式で封止部材19を製造する場合、巻出しロールと巻取りロールとの間に張り渡された長尺の可撓性の封止基材15を連続的に搬送ローラで搬送しながら、粘接着部13を封止基材15に形成してもよい。 A method for forming the sealing member 19 to be bonded to the organic EL portion 17 in the sealing step S06 will be described. In the form in which the sealing base material 15 is a flexible base material, a roll-to-roll method can be adopted for forming the sealing member 19. When the sealing member 19 is manufactured by the roll-to-roll method, the long flexible sealing substrate 15 stretched between the unwinding roll and the winding roll is continuously conveyed by the conveying roller. However, the adhesive portion 13 may be formed on the sealing substrate 15.
 封止部材19の製造工程では、図4(a)に示される封止基材15の一面上に、図4(b)に示されるように、粘接着部13を形成する。粘接着部13は、粘接着部13の説明の際に例示した形成方法で形成し得る。以上により、封止部材19が形成される。 In the manufacturing process of the sealing member 19, as shown in FIG. 4B, the adhesive portion 13 is formed on one surface of the sealing substrate 15 shown in FIG. The adhesive portion 13 can be formed by the formation method exemplified in the description of the adhesive portion 13. Thus, the sealing member 19 is formed.
 以上のように形成された封止部材19は、支持基板3上に形成された有機EL部17に貼り合わされる前に、脱水処理が実施される。脱水処理では、封止部材19の封止基材15を加熱する。封止基材15を加熱する装置としては、封止基材15に赤外線を照射する装置、熱風を供給する装置、封止基材15に接触する加熱ローラ、オーブン等を使用することができる。封止基材15の脱水処理は、窒素雰囲気で行われることが好ましい。 The sealing member 19 formed as described above is subjected to a dehydration process before being bonded to the organic EL portion 17 formed on the support substrate 3. In the dehydration process, the sealing substrate 15 of the sealing member 19 is heated. As an apparatus for heating the sealing substrate 15, an apparatus that irradiates the sealing substrate 15 with infrared rays, an apparatus that supplies hot air, a heating roller that contacts the sealing substrate 15, an oven, and the like can be used. The dehydration treatment of the sealing substrate 15 is preferably performed in a nitrogen atmosphere.
 封止工程S06では、図5に示されるように、有機EL部17と封止部材19とを貼り合わせる。これにより、露出している吸湿部11(内側面11a,外側面11b,上面11c)を封止部材19の粘接着部13で被覆する。ロールツーロール方式では、支持基板3を搬送しながら、図6に示されるように、支持基板3上に形成された有機EL部17と封止部材19とを貼り合わせる。これにより、支持基板3と封止部材19とは、加熱ローラ32a,32bの間を通過する。これにより、支持基板3及び封止部材19は、加熱ローラ32a,32bによって、加熱されつつ圧力が付与される。これにより、粘接着部13が熱硬化し、粘接着部13と有機EL部17とが密着する。また、熱可塑性を有する封止基材15の場合、加熱されることにより塑性変形し、封止基材15が有機EL部17の形状に追従する。 In the sealing step S06, the organic EL portion 17 and the sealing member 19 are bonded together as shown in FIG. As a result, the exposed moisture absorbing portion 11 (inner side surface 11 a, outer side surface 11 b, upper surface 11 c) is covered with the adhesive portion 13 of the sealing member 19. In the roll-to-roll method, the organic EL portion 17 and the sealing member 19 formed on the support substrate 3 are bonded together as shown in FIG. Thereby, the support substrate 3 and the sealing member 19 pass between the heating rollers 32a and 32b. As a result, pressure is applied to the support substrate 3 and the sealing member 19 while being heated by the heating rollers 32a and 32b. As a result, the adhesive portion 13 is thermally cured, and the adhesive portion 13 and the organic EL portion 17 are in close contact with each other. In the case of the sealing base material 15 having thermoplasticity, it is plastically deformed by being heated, and the sealing base material 15 follows the shape of the organic EL portion 17.
 有機EL部17と封止部材19とが貼り合わされると、粘接着部13は、図1に示されるように、吸湿部11(内側面11a)と有機EL部17との間、吸湿部11(上面11c)と封止基材15との間、及び、吸湿部11と粘接着部13におけるX方向の端部13a,13bとの間に設けられる。これにより、粘接着部13は、吸湿部11の全体を被覆する。以上により、図1に示されるように、有機EL素子1が製造される。 When the organic EL portion 17 and the sealing member 19 are bonded together, the adhesive portion 13 is formed between the moisture absorbing portion 11 (inner side surface 11a) and the organic EL portion 17, as shown in FIG. 11 (upper surface 11 c) and the sealing substrate 15, and between the hygroscopic portion 11 and the end portions 13 a and 13 b in the X direction of the adhesive portion 13. As a result, the adhesive portion 13 covers the entire hygroscopic portion 11. Thus, as shown in FIG. 1, the organic EL element 1 is manufactured.
 以上説明したように、本実施形態に係る有機EL素子1は、吸湿部11は、有機EL部17の積層方向(Z方向)から見て、有機EL部17の外側で且つ積層方向に直交する方向(XY方向)において有機EL部17と所定の間隔をあけて配置されている。粘接着部13は、吸湿部11と有機EL部17との間、吸湿部11と封止基材15との間、及び、吸湿部11と粘接着部13の端部13a,13bとの間に設けられている。このように、有機EL素子1では、吸湿部11が粘接着部13によって全体が被覆されているため、吸湿部11の化学成分が発光層7に侵入することを粘接着部13によって抑制できる。したがって、有機EL素子1では、吸湿部11と発光層7との間に保護層を設ける必要がないため、その製造工程において、保護層を形成する工程を必要としない。また、吸湿部11が被覆される構成のため、吸湿部11を支持基板3側に形成した後に、封止部材19を貼り合わせることができる。そのため、封止部材19と有機EL部17との貼り合わせの際、高精度な位置決めが要求されない。したがって、この有機EL素子1は、吸湿部11を備える構成において、生産性の向上を図ることができる。 As described above, in the organic EL element 1 according to the present embodiment, the moisture absorption unit 11 is outside the organic EL unit 17 and orthogonal to the stacking direction when viewed from the stacking direction (Z direction) of the organic EL unit 17. In a direction (XY direction), the organic EL unit 17 is disposed at a predetermined interval. The adhesive portion 13 includes the moisture absorbing portion 11 and the organic EL portion 17, the moisture absorbing portion 11 and the sealing substrate 15, and the moisture absorbing portion 11 and the end portions 13 a and 13 b of the adhesive portion 13. It is provided between. Thus, in the organic EL element 1, since the hygroscopic part 11 is entirely covered with the adhesive part 13, the adhesive part 13 prevents the chemical component of the hygroscopic part 11 from entering the light emitting layer 7. it can. Therefore, in the organic EL element 1, since it is not necessary to provide a protective layer between the moisture absorption part 11 and the light emitting layer 7, in the manufacturing process, the process of forming a protective layer is not required. Moreover, since the moisture absorption part 11 is covered, the sealing member 19 can be bonded after the moisture absorption part 11 is formed on the support substrate 3 side. Therefore, when the sealing member 19 and the organic EL portion 17 are bonded together, high-precision positioning is not required. Therefore, the organic EL element 1 can improve productivity in the configuration including the hygroscopic portion 11.
 本実施形態では、吸湿部11の内側面11aと有機EL部17との間の距離が0.5mm以上10mm以下である。これにより、吸湿部11における水分の吸湿機能を有機EL部17に対して効果的に発揮させることができる。 In this embodiment, the distance between the inner surface 11a of the moisture absorption part 11 and the organic EL part 17 is 0.5 mm or more and 10 mm or less. Thereby, the moisture absorption function of the moisture in the moisture absorption part 11 can be exhibited with respect to the organic EL part 17 effectively.
 本実施形態では、吸湿部11の厚みT1は、粘接着部13の厚みT2の1/2以下である。吸湿部11の厚みT1が粘接着部の厚みT2に対して厚すぎると、粘接着部13によって吸湿部11を適切に被覆できない。吸湿部11の厚みT1を、粘接着部13の厚みT2の1/2以下とすることにより、粘接着部13によって吸湿部11を適切に被覆できる。 In this embodiment, the thickness T1 of the hygroscopic portion 11 is ½ or less of the thickness T2 of the adhesive portion 13. If the thickness T1 of the hygroscopic part 11 is too thick relative to the thickness T2 of the adhesive part, the hygroscopic part 11 cannot be properly covered by the adhesive part 13. By setting the thickness T1 of the hygroscopic part 11 to be equal to or less than ½ of the thickness T2 of the adhesive part 13, the hygroscopic part 11 can be appropriately covered by the adhesive part 13.
 なお、本発明は上記した本実施形態に限定されることなく種々の変形が可能である。例えば、上記実施形態では、陽極層5と陰極層9との間に発光層7が配置された有機EL素子1を例示した。しかし、有機機能層の構成はこれに限定されない。有機機能層は、以下の構成を有していてもよい。 The present invention is not limited to the above-described embodiment, and various modifications can be made. For example, in the said embodiment, the organic EL element 1 with which the light emitting layer 7 was arrange | positioned between the anode layer 5 and the cathode layer 9 was illustrated. However, the configuration of the organic functional layer is not limited to this. The organic functional layer may have the following configuration.
(a)陽極層/発光層/陰極層
(b)陽極層/正孔注入層/発光層/陰極層
(c)陽極層/正孔注入層/発光層/電子注入層/陰極層
(d)陽極層/正孔注入層/発光層/電子輸送層/電子注入層/陰極層
(e)陽極層/正孔注入層/正孔輸送層/発光層/陰極層
(f)陽極層/正孔注入層/正孔輸送層/発光層/電子注入層/陰極層
(g)陽極層/正孔注入層/正孔輸送層/発光層/電子輸送層/電子注入層/陰極層
(h)陽極層/発光層/電子注入層/陰極層
(i)陽極層/発光層/電子輸送層/電子注入層/陰極層
ここで、記号「/」は、記号「/」を挟む各層が隣接して積層されていることを示す。上記(a)に示す構成は、上記実施形態における有機EL素子1の構成を示している。
(A) Anode layer / light emitting layer / cathode layer (b) Anode layer / hole injection layer / light emitting layer / cathode layer (c) Anode layer / hole injection layer / light emitting layer / electron injection layer / cathode layer (d) Anode layer / hole injection layer / light emitting layer / electron transport layer / electron injection layer / cathode layer (e) Anode layer / hole injection layer / hole transport layer / light emitting layer / cathode layer (f) anode layer / hole Injection layer / hole transport layer / light emitting layer / electron injection layer / cathode layer (g) anode layer / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode layer (h) anode Layer / light emitting layer / electron injection layer / cathode layer (i) anode layer / light emitting layer / electron transport layer / electron injection layer / cathode layer Here, the symbol “/” is adjacent to each layer sandwiching the symbol “/”. Indicates that they are stacked. The configuration shown in (a) above shows the configuration of the organic EL element 1 in the above embodiment.
 正孔注入層、正孔輸送層、電子輸送層及び電子注入層のそれぞれの材料は、公知の材料を用いることができる。正孔注入層、正孔輸送層、電子輸送層及び電子注入層のそれぞれは、例えば、発光層7と同様に塗布法により形成できる。 As the materials for the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer, known materials can be used. Each of the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer can be formed by, for example, a coating method in the same manner as the light emitting layer 7.
 有機EL素子1は、単層の発光層7を有していてもよいし、2層以上の発光層7を有していてもよい。上記(a)~(i)の層構成のうちのいずれか1つにおいて、陽極層5と陰極層9との間に配置された積層構造を「構造単位A」とすると、2層の発光層7を有する有機EL素子の構成として、例えば、下記(j)に示す層構成を挙げることができる。2個ある(構造単位A)の層構成は互いに同じであっても、異なっていてもよい。
(j)陽極層/(構造単位A)/電荷発生層/(構造単位A)/陰極層
The organic EL element 1 may have a single light emitting layer 7 or may have two or more light emitting layers 7. In any one of the above layer configurations (a) to (i), when the laminated structure disposed between the anode layer 5 and the cathode layer 9 is “structural unit A”, two light emitting layers As a structure of the organic EL element which has 7, the layer structure shown to the following (j) can be mentioned, for example. The two (structural unit A) layer structures may be the same or different.
(J) Anode layer / (structural unit A) / charge generation layer / (structural unit A) / cathode layer
 ここで電荷発生層とは、電界を印加することにより、正孔と電子とを発生する層である。電荷発生層としては、例えば酸化バナジウム、ITO、酸化モリブデン等からなる薄膜を挙げることができる。 Here, the charge generation layer is a layer that generates holes and electrons by applying an electric field. Examples of the charge generation layer include a thin film made of vanadium oxide, ITO, molybdenum oxide, or the like.
 また「(構造単位A)/電荷発生層」を「構造単位B」とすると、3層以上の発光層を有する有機EL素子の構成として、例えば、以下の(k)に示す層構成を挙げることができる。
(k)陽極層/(構造単位B)x/(構造単位A)/陰極層
When “(structural unit A) / charge generation layer” is “structural unit B”, examples of the configuration of the organic EL element having three or more light emitting layers include the layer configuration shown in the following (k). Can do.
(K) Anode layer / (structural unit B) x / (structural unit A) / cathode layer
 記号「x」は、2以上の整数を表し、「(構造単位B)x」は、(構造単位B)がx段積層された積層体を表す。また複数ある(構造単位B)の層構成は同じでも、異なっていてもよい。 Symbol “x” represents an integer of 2 or more, and “(Structural unit B) x” represents a stacked body in which (Structural unit B) is stacked in x stages. A plurality of (structural units B) may have the same or different layer structure.
 電荷発生層を設けずに、複数の発光層7を直接的に積層させて有機EL素子を構成してもよい。 The organic EL element may be configured by directly laminating a plurality of light emitting layers 7 without providing a charge generation layer.
 上記実施形態では、ロールツーロール方式により、支持基板3上に陽極層5を形成する形態を一例に説明した。しかし、支持基板3上に陽極層5を予め形成し、巻出しロール30Aと巻取りロール30Bとの間に張り渡された長尺の陽極層5が形成された支持基板3を連続的に搬送ローラ31で搬送しながら、有機EL素子1の製造に係る各工程を実施してもよい。 In the above embodiment, an example in which the anode layer 5 is formed on the support substrate 3 by the roll-to-roll method has been described as an example. However, the anode layer 5 is formed in advance on the support substrate 3, and the support substrate 3 on which the long anode layer 5 stretched between the unwinding roll 30A and the winding roll 30B is continuously conveyed. Each process related to the manufacture of the organic EL element 1 may be performed while being conveyed by the roller 31.
 上記実施形態では、図2に示されるように、吸湿部11が長方形の枠状を呈している形態を一例に説明した。しかし、図7に示されるように、吸湿部11Aは、間欠的に設けられてもよい。図7に示されるように、吸湿部11Aの内側面11Aaと有機EL部17との間の距離Dは、0.5mm以上10mm以下であり、好ましくは1mm以上3mm以下である。また、吸湿部の形状は、矩形状に限定されない。 In the above-described embodiment, as illustrated in FIG. 2, an example in which the moisture absorbing portion 11 has a rectangular frame shape has been described. However, as shown in FIG. 7, the hygroscopic portion 11 </ b> A may be provided intermittently. As shown in FIG. 7, the distance D between the inner surface 11Aa of the hygroscopic part 11A and the organic EL part 17 is 0.5 mm or more and 10 mm or less, preferably 1 mm or more and 3 mm or less. Moreover, the shape of the moisture absorption part is not limited to a rectangular shape.
 以上、本発明の種々の実施形態について説明した。しかしながら、本発明は上述した種々の実施形態に限定されず、本発明の趣旨を逸脱しない範囲で種々の変形が可能である。 The various embodiments of the present invention have been described above. However, the present invention is not limited to the various embodiments described above, and various modifications can be made without departing from the spirit of the present invention.
 1…有機EL素子、3…支持基板、5…陽極層(第1電極層)、7…発光層(有機機能層)、9…陰極層(第2電極層)、11…吸湿部、13…粘接着部、15…封止基材、17…有機EL部、19…封止部材。 DESCRIPTION OF SYMBOLS 1 ... Organic EL element, 3 ... Support substrate, 5 ... Anode layer (1st electrode layer), 7 ... Light emitting layer (organic functional layer), 9 ... Cathode layer (2nd electrode layer), 11 ... Hygroscopic part, 13 ... Adhesive part, 15 ... sealing substrate, 17 ... organic EL part, 19 ... sealing member.

Claims (9)

  1.  支持基板と、当該支持基板上に配置され、第1電極層、有機機能層及び第2電極層が積層されて形成された有機EL部と、前記有機EL部を封止する封止部材と、吸湿性を有する吸湿部と、を備える有機EL素子であって、
     前記封止部材は、粘接着性を有すると共に前記有機EL部及び前記吸湿部を被覆する粘接着部と、前記粘接着部上に配置された封止基材と、を有し、
     前記吸湿部は、前記有機EL部の積層方向から見て、前記有機EL部の外側で且つ前記積層方向に直交する方向において前記有機EL部と所定の間隔をあけて配置されており、
     前記粘接着部は、少なくとも、前記吸湿部と前記有機EL部との間、前記吸湿部と前記封止基材との間、及び、前記吸湿部と当該粘接着部における前記直交する方向の端部との間に設けられている、有機EL素子。
    A support substrate, an organic EL part disposed on the support substrate and formed by laminating the first electrode layer, the organic functional layer, and the second electrode layer; a sealing member for sealing the organic EL part; An organic EL element comprising a hygroscopic portion having hygroscopicity,
    The sealing member has adhesive properties that have adhesive properties and covers the organic EL portion and the moisture absorbing portion, and a sealing substrate disposed on the adhesive properties portion,
    The moisture absorption part is disposed at a predetermined interval from the organic EL part in a direction perpendicular to the lamination direction outside the organic EL part as seen from the lamination direction of the organic EL part,
    The adhesive portion is at least between the moisture absorbing portion and the organic EL portion, between the moisture absorbing portion and the sealing substrate, and in the orthogonal direction in the moisture absorbing portion and the adhesive portion. Organic EL element provided between the end of
  2.  前記支持基板は可撓性を有する、請求項1に記載の有機EL素子。 The organic EL element according to claim 1, wherein the support substrate is flexible.
  3.  前記吸湿部の内側面と前記有機EL部との間の距離が0.5mm以上10mm以下である、請求項1又は2に記載の有機EL素子。 The organic EL element according to claim 1 or 2, wherein a distance between an inner surface of the hygroscopic part and the organic EL part is 0.5 mm or more and 10 mm or less.
  4.  前記吸湿部の厚みは、前記粘接着部の厚みの1/2以下である、請求項1~3のいずれか一項に記載の有機EL素子。 The organic EL element according to any one of claims 1 to 3, wherein a thickness of the hygroscopic portion is 1/2 or less of a thickness of the adhesive portion.
  5.  支持基板上に、第1電極層、有機機能層及び第2電極層を積層して有機EL部を形成する有機EL部形成工程と、
     前記有機EL部の積層方向から見て前記有機EL部の外側で且つ前記積層方向に直交する方向において前記有機EL部と所定の間隔をあけて、吸湿性を有する吸湿部を形成する吸湿部形成工程と、
     封止基材及び粘接着性を有する粘接着部を備える封止部材を前記有機EL部に貼り合わせ、前記有機EL部及び前記吸湿部において露出している部分を前記粘接着部により被覆する封止工程と、を含む、有機EL素子の製造方法。
    An organic EL part forming step of forming an organic EL part by laminating a first electrode layer, an organic functional layer and a second electrode layer on a support substrate;
    Forming a hygroscopic part that forms a hygroscopic part having a hygroscopic property at a predetermined interval from the organic EL part in a direction perpendicular to the laminating direction outside the organic EL part as viewed from the laminating direction of the organic EL part Process,
    A sealing member provided with a sealing substrate and an adhesive part having adhesiveness is bonded to the organic EL part, and the exposed part in the organic EL part and the moisture absorbing part is bonded to the adhesive part. A method for producing an organic EL element, comprising: a sealing step for covering.
  6.  前記支持基板は可撓性を有し、
     前記有機EL部形成工程、前記吸湿部形成工程及び前記封止工程は、巻出しロールに巻き取られた前記支持基板から連続的に送り出された前記支持基板を、巻取りロールに巻き取る過程中に行われる、請求項5に記載の有機EL素子の製造方法。
    The support substrate has flexibility,
    The organic EL portion forming step, the moisture absorbing portion forming step, and the sealing step are in the process of winding the support substrate continuously fed from the support substrate wound on the unwinding roll onto the winding roll. The manufacturing method of the organic EL element of Claim 5 performed by this.
  7.  前記吸湿部は、印刷法で形成される、請求項5又は6に記載の有機EL素子の製造方法。 The said moisture absorption part is a manufacturing method of the organic EL element of Claim 5 or 6 formed by the printing method.
  8.  前記封止部材と前記有機EL部とを、加熱した状態で圧力を加えて貼り合わせる、請求項5~7のいずれか一項に記載の有機EL素子の製造方法。 The method for producing an organic EL element according to any one of claims 5 to 7, wherein the sealing member and the organic EL part are bonded together by applying pressure in a heated state.
  9.  前記封止基材は、熱可塑性樹脂である、請求項8に記載の有機EL素子の製造方法。 The method for manufacturing an organic EL element according to claim 8, wherein the sealing substrate is a thermoplastic resin.
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