WO2017043873A1 - Blue light absorption film - Google Patents

Blue light absorption film Download PDF

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WO2017043873A1
WO2017043873A1 PCT/KR2016/010043 KR2016010043W WO2017043873A1 WO 2017043873 A1 WO2017043873 A1 WO 2017043873A1 KR 2016010043 W KR2016010043 W KR 2016010043W WO 2017043873 A1 WO2017043873 A1 WO 2017043873A1
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group
independently
formula
sio
epoxy
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PCT/KR2016/010043
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French (fr)
Korean (ko)
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윤영민
신성건
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주식회사 동진쎄미켐
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments

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  • the present invention relates to a blue light absorbing film, and in particular, excellent blue light absorbing effect from various display devices can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, Increases the antifouling, anti-fingerprint, thermal stability, glossiness and surface hardness improvement effects.
  • the light absorption of blue light in the 400-470 nm wavelength, which is harmful to the human body is very high, but the blue light in the 470-500 nm wavelength, which is beneficial to the human body, is highly effective.
  • the light absorption for the relatively low relates to a film, a coating composition and a compound included therein which can bring a more beneficial effect on the human body.
  • UV and visible light may damage the human retina and pigment cell epithelium, but the human retina has a short wavelength (UV area) of less than 295 nm in the cornea, less than 400 nm.
  • the short wavelength of is absorbed by the lens, and the human retina is exposed only to electromagnetic waves (visible light) in the 400-760 nm band and a few IR bands.
  • Blue light (blue light) is a strong energy of blue light from various display devices, but it is reported that it is invisible but can rapidly increase the free radicals of the eye and damage visual cells by up to 80%.
  • Dry eye, and sleep disorders especially retinal and cellular damage in 400-450 nm (wavelength 1 region), and melatonin (sleep induction hormone) in 450-470 nm (wavelength 2 region). It adversely affects the human body such as suppression, arousal, and heart rate increase, but 470-500 nm (wavelength 3 region) has been reported to be useful for treating sleep disorders and depression.
  • the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint , Heat stability, glossiness and surface hardness improvement effect can be increased.
  • the light absorption power of blue light in the wavelength range of 400-470 nm, which is harmful to the human body is very high, but the light absorption power of blue light in the wavelength range of 470-500 nm, which is beneficial to the human body, is very high. Is a relatively low object to provide a blue light absorbing film that can bring a more beneficial effect on the human body.
  • the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, fingerprint resistance, thermal stability, gloss characteristics and It is possible to increase the surface hardness improvement effect, especially the light absorption of blue light in the wavelength range of 400-470 nm, which is harmful to the human body, is very high, while the light absorption power of the blue light in the wavelength range of 470-500 nm, which is beneficial to the human body, is relatively low. It provides a coating composition that can bring a beneficial effect.
  • the present invention to achieve the above object
  • the present invention provides a film containing a blue light absorbing compound represented by the formula (1).
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; C 1 -C 40 alkyl groups which are unsubstituted or substituted with deuterium, halogen, amine groups, epoxy groups, (meth) acryl groups, siol groups, isocyanate groups, nitrile groups, nitro groups, and phenyl groups; C 2 -C 40 alkenyl group; C 1 ⁇ C 40 Alkoxy group; C 3 -C 40 cycloalkyl group; C 3 ⁇ C 40 Heterocycloalkyl group; C 6 -C 40 aryl group; C 3 ⁇ C 40 heteroaryl group; An aralkyl group of C
  • the present invention provides a coating composition comprising a blue light absorbing compound represented by the formula (1).
  • the present invention provides a blue light absorbing compound represented by the formula (1).
  • Film according to the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, gloss Properties and surface hardness improving effect can be increased.
  • the light absorption of the blue light of 400-470 nm wavelength harmful to the human body is very high, but the light absorption of the blue light of the wavelength 470-500 nm beneficial to the human body is relatively low can bring a more beneficial effect on the human body.
  • FIG. 1 is a graph showing the results of measuring blue light absorption in a 400-500 nm region of a blue light absorbing film according to Examples and Comparative Examples of the present invention.
  • the present invention provides a film comprising a blue light absorbing compound represented by Formula 1 below:
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ⁇ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ⁇ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or a C 3 ⁇ C 40 aral
  • R 3 is a C 1 ⁇ C 40 alkyl group which is unsubstituted or substituted with hydrogen, deuterium, halogen, amine group, epoxy group, (meth) acryl group, siol group, isocyanate group, nitrile group, nitro group, phenyl group or C 2 ⁇ C 40 alkenyl group or C 1 ⁇ C 40 alkoxy group or C 3 ⁇ C 40 cycloalkyl group or C 3 ⁇ C 40 heterocycloalkyl group or C 6 ⁇ C 40 aryl group or C 3 ⁇ C 40 may be a heteroaryl group or a C 3 ⁇ C 40 aralkyl group or C 3 ⁇ aryloxy group or a C 3 ⁇ C 40 aryl group between all of the C 40.
  • the compound is indole-3-acetamide, indole-3-carboxaldehyde, indole-3-carbinol And indole-3-thiocarboxamide, 2- (2-aminophenyl) indole and 2- (2-aminophenyl) indole.
  • the compounds may be used by mixing two or more kinds.
  • the compound according to the present invention has a property of absorbing blue light in the 400 to 500 nm region.
  • the compound has a very high light absorption of blue light of 400-450 nm (first wavelength region) and 450-470 nm (second wavelength region) harmful to the human body, while 470-500 nm (third wavelength region) beneficial to the human body. ),
  • the light absorption of blue light is relatively low.
  • the ratio of the average light absorption of 400-470 nm of light and the average light absorption of 470-500 nm of light of the compound is 2- It may be 5, and for the same reason, the compound of the present invention may be more advantageous to the human body when applied to the blue light absorbing film.
  • Blue light absorbing film according to the present invention includes a compound represented by the formula (1), the compound may be included in the film substrate, or included as a separate coating layer, or may be included in the coating layer formed on one or both sides of the substrate
  • the coating layer may be a hard coating layer.
  • the hard coating layer may be formed of a coating composition including the compound represented by Formula 1 and a silsesquioxane resin. When the silsesquioxane resin is included, hard coating of the film may be performed at the same time.
  • the silsesquioxane , , And It may be silsesquioxane including at least one of, or And It may be a silsesquioxane containing, or may be silsesquioxane represented by any one of the following Formulas 2 to 10.
  • Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
  • R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ⁇ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ⁇ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group
  • the silsesquioxane composite polymer represented by Formula 2 is a silsesquioxane composite polymer represented by Formula 2
  • R 1 , R 2 , R 16 , D, a and d are the same as defined in Chemical Formulas 2 to 11.
  • the pH of the reaction solution of the first step of the present invention in the method for preparing the formulas 2 to 7 is 9 to 11.5, the pH of the reaction solution of the second step is 2 to 4, the reaction solution of the third step The pH is 8 to 11.5, and the pH of the reaction solution in the fourth step of introducing Ee is 1.5 to 4.
  • the pH of the reaction solution in the fourth step of introducing Ee is 1.5 to 4.
  • a second step of stirring A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after each two-step reaction; Condensing and connecting two or more substances obtained through the three steps under basic conditions; A fifth step of adding an acidic catalyst to the reactor for introducing [D] d (OR 13 ) 2 after the fourth step to adjust the reaction solution to acid, followed by adding and stirring an organic silane compound; And a sixth step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the five step reaction.
  • the pH of the reaction solution of the first step is 9 to 11.5, the pH of the reaction solution of the second step is 2 to 4, the pH of the reaction solution of the third step in the method for preparing the polymer of Formula 8 to 10 Is 8 to 11.5, the pH of the reaction solution of the fourth step is 9 to 11.5, the pH of the reaction solution of the fifth step is 2 to 4, 8 to 11.5 of the reaction solution of the sixth step, and Ee is introduced.
  • PH of the reaction solution of the seventh step is 1.5 to 4.
  • the terminal may further include a repeating unit of [E] e.
  • a mixed catalyst of two or more basic catalysts is specifically used as a basic catalyst, and neutralized and acidified with an acidic catalyst to induce rehydrolysis, and again two or more basic catalysts. Acidity and basicity can be continuously controlled in one reactor by proceeding to basic condensation using a mixed catalyst of.
  • the basic catalyst may be prepared by appropriately combining two or more materials selected from a metal based catalyst and an amine based catalyst selected from the group consisting of Li, Na, K, Ca and Ba.
  • the amine basic catalyst may be tetramethylammonium hydroxide (TMAH)
  • the metallic basic catalyst may be potassium hydroxide (KOH) or sodium bicarbonate (NaHCO 3 ).
  • the content of each component may be arbitrarily adjusted at a ratio of 10 to 90:10 to 90 parts by weight of the amine based catalyst and the metal based catalyst.
  • the reactivity between the functional group and the catalyst may be minimized during hydrolysis, and thus, the defects of organic functional groups such as Si-OH or Si-alkoxy may be significantly reduced, thereby freely controlling the degree of condensation.
  • the acidic catalyst may be used without limitation so long as it is an acidic material commonly used in the art, for example, may be used a general acidic material such as HCl, H 2 SO 4 , HNO 3 , CH 3 COOH, Organic acids such as latic acid, tartaric acid, maleic acid and citric acid can also be applied.
  • the organic solvent may be used without limitation as long as it is an organic solvent commonly used in the art, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol , Alcohols such as cellosolves, ketones such as lactate, acetone, methyl (isobutyl) ethyl ketone, glycols such as ethylene glycol, furan systems such as tetrahydrofuran, dimethylformamide, dimethylacetamide, N Polar solvents such as methyl-2-pyrrolidone, as well as hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, Various solvents, such as acronitrile,
  • Organosilanes comprising R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 can be used Specifically, the organic silane compound containing a phenyl group or an amino group having an effect of improving the chemical resistance of the silsesquioxane composite polymer to improve the non-swelling property, or the curing density of the composite polymer to increase the mechanical strength and hardness of the cured layer An organic silane compound containing an epoxy group or a (meth) acryl group having an effect of improving can be used.
  • organosilane compound examples include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, (3 -Glycidoxy propyl) dimethyl ethoxy silane, 3- (methacryloxy) propyl trimethoxy silane, 3, 4- epoxy butyl trimethoxy silane, 3, 4- epoxy butyl triethoxy silane, 2- (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltriethoxysilane, vinyltriethoxysilane, vinyltri-t-butoxy Silane, vinyltriisobutoxysilane, vinyltriisopropoxysilane, vinyltriphenoxysilane, phenyltriethoxysilane,
  • the silsesquioxane of the present invention can be adjusted to 1 to 99.9% or more of condensation in order to secure excellent storage stability to obtain a wide range of applications. That is, the content of the alkoxy group (OR) bonded to the terminal and central Si can be adjusted from 50% to 0.01% with respect to the entire bonding group.
  • the physical properties of the substrate including the surface hardness can be further improved.
  • the weight average molecular weight of the silsesquioxane may be 1,000 to 500,000, specifically 1,000 to 80,000, and more specifically 2,000 to 50,000. In this case, the processability and physical properties of the silsesquioxane can be improved simultaneously.
  • the coating composition of the present invention may be coated alone as a solvent-free type when the silsesquioxane composite polymer is a liquid, and may be configured to include an organic solvent in the case of a solid phase.
  • the coating composition may further include an initiator or a curing agent.
  • the coating composition is a compound represented by Formula 1; Silsesquioxane composite polymer represented by any one of Formulas 2 to 10; It may include an organic solvent, an initiator commonly used in the art that is compatible with the composite polymer, and optionally further include additives such as curing agents, plasticizers, sunscreens, and other functional additives, such as curability, heat resistance, UV protection, a plasticizing effect, etc. can be improved.
  • the blue light absorbing compound represented by Formula 1 is specifically included in 0.001 to 10% by weight, and more specifically 0.1 to 5% by weight. Within the above range, it has an excellent blue light absorption and satisfies the resistance to yellowing while maintaining transparency of the film, and also has excellent compatibility with silsesquioxane, thereby further improving the physical properties of the hard coating of the film. .
  • the silsesquioxane composite polymer may include 5 to 90 wt% of the coating composition. If within the above range can further improve the mechanical properties of the cured film of the coating composition.
  • the coating composition may further include an organic solvent, and as the organic solvent, alcohols such as methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, cellosolve, lactate, acetone, methyl (isobutyl Ketones such as ethyl ketone, glycols such as ethylene glycol, furan compounds such as tetrahydrofuran, polar solvents such as dimethylformamide, dimethylacetamide and N-methyl-2-pyrrolidone, as well as hexane and cyclohexane Cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, methylene chloride, octadecylamine, aniline, dimethyl sulfoxide, benzyl alcohol, etc.
  • organic solvent such
  • the initiator or the curing agent may be appropriately selected and used according to the organic functional group contained in the silsesquioxane composite polymer.
  • an organic system capable of post-curing such as an unsaturated hydrocarbon, a siol system, an epoxy system, an amine system, or an isocyanate group
  • various curing using heat or light is possible.
  • the change due to heat or light can be achieved in the polymer itself, and the curing step can be achieved by diluting with the organic solvent as described above.
  • various initiators may be used, and the initiator may be included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total composition, and when included in an amount within the above range, Permeability and coating stability can be satisfied at the same time.
  • the hardener may be included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total composition.
  • the present invention may further include additives such as UV absorbers, antioxidants, antifoaming agents, leveling agents, water repellents, flame retardants, and adhesion improving agents for the purpose of improving hardness, strength, durability, formability, etc. through a curing process or a post reaction.
  • additives such as UV absorbers, antioxidants, antifoaming agents, leveling agents, water repellents, flame retardants, and adhesion improving agents for the purpose of improving hardness, strength, durability, formability, etc. through a curing process or a post reaction.
  • Such additives are not particularly limited in use, but may be appropriately added within a range that does not impair the properties of the film, that is, properties such as flexibility, light transmittance, heat resistance, hardness and strength.
  • Each of the additives is preferably included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total weight of the composition.
  • the film base material may be a transparent film
  • specific examples of the film include COC (Cyclic olefin copolymer), PAc (Polyacrylate), PC (Polycarbonate), PE (Polyethylene), PEEK (Polyetheretherketone), PEI (Polyetherimide) , Polyethylenenaphthalate (PEN), Polyethersulfone (PES), Polyethylene terephtalate (PET), Polyimide (PI), Polyolefin (PO), Polymethylmethacrylate (PMMA), Polysulfone (PSF), Polyvinylalcohol (PVA), Polyvinylcinnamate (acetyl) acetyl TAC , Polysilicon (Poly Silicone), polyurethane (Polyurethane) and epoxy resin (Epoxy Resin) film of the material selected from the group consisting of can be used.
  • the material may be composed of a single layer or two or more layers having different characteristics of the same material, and may
  • a method for coating the coating composition on a transparent film is known as spin coating, bar coating, slit coating, dip coating, natural coating, reverse coating, roll coating, spin coating, curtain coating, spray coating, gravure coating, and the like.
  • photocuring or thermosetting can be appropriately selected and applied according to the functional group of the composite polymer.
  • the curing temperature is 80 to 120 °C
  • the curing may be photocuring
  • the photocuring may be ultraviolet curing, specifically, it may be cured to 200mJ to 2000mJ using a UV lamp. .
  • the film of the present invention may further perform the step of aging.
  • the aging step may be aged between 50 to 100 °C, the time may be about 3 to 48 hours.
  • the coating layer is stably generated, and the adhesion between the film and the coating layer can be further improved, and the surface of the coating layer has excellent surface hardness, transparency, scratch resistance, water repellency, antifouling properties, fingerprint resistance, and thermal stability. And gloss characteristics.
  • the coating thickness of the coating composition may be arbitrarily adjusted, specifically 0.01 to 500 um, more specifically 0.1 to 300 um, even more specifically 1 to 100 um range. Within this range, the excellent blue light absorbency can satisfy the yellowing phenomenon of the film at the same time, the film surface can not only stably secure the surface hardness of 7H or more, but also exhibits excellent physical properties in the film surface properties.
  • the blue light absorbing film according to the present invention includes a blue light absorbing compound represented by the formula (1), so that the average light absorption of 400-470 nm (first wavelength range + second wavelength range) is 30 to 70% (transmittance is 30 to 70%).
  • 70% the average light absorption of 470-500 nm (third wavelength region) may be 40 to 20% (transmittance of 60 to 80%), more specifically, the light absorption of the first wavelength region is 50 To 85% (transmittance of 15 to 50%), the light absorption of the second wavelength region may be 65 to 35% (transmittance of 35 to 65%), the light absorption of the third wavelength region is 40 to 20 % (Transmittance of 60 to 80%).
  • the ratio of the average light absorption rate between the wavelength ranges (the light absorption rate in the wavelength 1 + 2 region / the light absorption rate in the wavelength 3 region) has 2-5 to absorb as much of the blue light as harmful to the human body.
  • the blue light which is beneficial to the human body, is relatively absent and more advantageous to the human body.
  • the blue light absorbing film of the present invention may be applied to a display device.
  • the display device may be a smartphone, a tablet PC, a notebook PC, an AIO (All-In-One) PC, an LCD monitor, a TV, an advertisement board, or a touch panel. It may be a flexible smart device (wearable smart device) that requires the flexibility of the film.
  • the form of the film included in the display device is not particularly limited, and may be, for example, in the form of a window cover film or a protective film.
  • the display device according to the present invention includes a blue light absorbing film to prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, It is possible to increase the glossiness and surface hardness enhancement effect.
  • the light absorption power of blue light of 400-470 nm wavelength which is harmful to human body is very high while the light absorption power of blue light of 470-500 nm wavelength which is beneficial to human body is relatively low. It can have a more beneficial effect on the human body.
  • ECHETMS is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane
  • GPTMS is Glycidoxypropytrimethoxysilane
  • MAPTMS is (methacryloyloxy) propyltrimethoxysilane
  • PTMS is Phenyltrimethoxysilane
  • MTMS is Methyltrimethoxysilane
  • ECHETMDS is Di (epoxycyclohexyethyl) Di (glycidoxypropyl) tetramethoxy disiloxane
  • MAPTMDS stands for Di (methacryloyloxy) propy
  • PTMDS stands for Di (phenyl) tetramethoxy disiloxane
  • MTMDS stands for Di (Methyl) tetramethoxy disiloxane.
  • a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
  • KOH Potassium hydroxide
  • TMAH tetramethylammonium hydroxide
  • Example 1-a To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, 1 part by weight of the catalyst prepared in Example 1-a was added dropwise, followed by stirring at room temperature for 1 hour, and then 2 20 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 15 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 5 hours.
  • the mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having the same linear structure as the formula (11) has a molecular weight of 8,000 styrene.
  • Example 1-b To the mixed solution of Example 1-b 0.36% by weight of HCl aqueous solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 °C 30 minutes. Thereafter, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise at one time to achieve stable hydrolysis. After stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to adjust the pH of the mixed solution in a basic state. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer. A small amount of sample was taken and analyzed by H-NMR and IR to confirm the residual ratio of methoxy.
  • the coating composition prepared in 1-d was coated on a PC (i-components, Glastic 0.5T) film to a thickness of 30 um, and then cured to prepare a blue light absorbing film.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 In order to prepare a composite polymer having a D-A-D structure, the following examples were used, and a coating composition was prepared by a method similar to that described in Example 1 above. Preparation of the catalyst and the linear structure was used in the same manner as in Example 1-a and 1-b, and then to produce a continuous D-A-D structure was carried out by the following method.
  • Example 1-b To the mixed solution of Example 1-b 0.36% by weight of HCl aqueous solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 °C 30 minutes. Thereafter, 25 parts by weight, which is 5 times the amount of Diphenyltetramethoxydisiloxane used in Example 1-b, was added dropwise at one time to achieve stable hydrolysis, and after stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer.
  • silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 2 below. At this time, the manufacturing method was equally applied to the method used in Example 2.
  • Example 2 Except for using the silsesquioxane composite polymer prepared in Example 2, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 In order to prepare an E-A-D composite polymer, the following examples were used, and a coating composition was prepared by a method similar to that described in Example 1 above. Preparation of the catalyst and the linear structure was used in the same manner as in Example 1, and then to produce the E-A-D structure was carried out by the following method.
  • Example 1-c To the AD mixture obtained in Example 1-c, 20 parts by weight of methylene chloride were added dropwise without further purification, 5 parts by weight of 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted to have an acidity, and the temperature was adjusted to 30 at 4 ° C. Stirred for a minute. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
  • Example 3-a After preparing the organic layer of the resultant obtained in Example 3-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 3-a in progress, to achieve stable hydrolysis, and after stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (4). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • Example 3-b After the reaction mixture was obtained in Example 3-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum pressure. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 4 was obtained along with various byproducts by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was.
  • the molecular weight was 17,000 in terms of styrene
  • n value was 4-6
  • the results of formula (4) are as follows.
  • silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 3 below. In this case, the method used in Example 3 was equally applied.
  • Example 3 Except for using the silsesquioxane composite polymer prepared in Example 3, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • a continuous hydrolysis and condensation were carried out step by step to prepare a composite polymer having an A-B-D structure, and a coating composition was prepared by a method similar to that described in Example 1.
  • a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
  • KOH Potassium hydroxide
  • TMAH tetramethylammonium hydroxide
  • Example 4-a To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, 0.5 parts by weight of the catalyst prepared in Example 4-a were added dropwise, followed by stirring at room temperature for 1 hour, and then 2 10 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 20 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 2 hours.
  • the mixed solution was stirred and washed twice to remove the catalyst and impurities, and then filtered, and then linear silsesquioxane containing 0.1 mmol / g or less of the alkoxy group remaining through 1 H-NMR analysis. This was then used to introduce the cage into the continuous reaction.
  • XRD analysis confirmed that the overall structure is a linear structure through the XRD analysis. As a result of measuring the molecular weight, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 6,000 styrene.
  • Example 4-b To the mixture of Example 4-b in progress, 0.36 wt% HCl aqueous solution was added dropwise very slowly to 5 parts by weight, the pH was adjusted to have acidity, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, 5 parts by weight of DiPhenyltetramethoxydisiloxane was added dropwise, and after stirring for 1 hour, 5 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state. At this time, it could be confirmed that the cage-type structure was formed and introduced into the polymer chain separately from the linear structure. It was made.
  • the terminal was converted into a cage structure using a trifunctional monomer.
  • 100 parts by weight of the material obtained in Example 4-c was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state.
  • the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (5). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 5 was obtained without various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was.
  • the molecular weight was obtained in the styrene conversion value of 12,000, the n value of X was 4-6, the n value of Y was 4-6, in particular in the formula 5 results are as follows.
  • silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 4 below. In this case, the method used in Example 4 was equally applied.
  • Example 4 Except for using the silsesquioxane composite polymer prepared in Example 4 to prepare a coating composition mutatis mutandis Example 1-d and then coated and cured on a PC substrate as in Example 1-e to absorb blue light A film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 The following method was used to prepare a composite polymer having a D-A-B-D structure, and a coating composition was prepared by the same method as in Example 1.
  • Example 4-b To the mixture of Example 4-b in progress, 0.36 wt% HCl aqueous solution was added dropwise very slowly to 5 parts by weight, the pH was adjusted to have acidity, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, the amount of diphenyltetramethoxydisiloxane was prepared by adding 5 parts by weight to 25 parts by weight, which is 5 times the amount of Example 4-b, and after stirring for 1 hour, 5 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic pH of the mixed solution. Was adjusted.
  • Example 5-a After the organic layer of the resultant obtained in Example 5-a was prepared without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 100 parts by weight of the material obtained in Example 5-a was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state.
  • the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in formula (6). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 6 was obtained without various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 16,000, the n value of X was 4-6, the n value of Y was 4-6.
  • silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 5 below. At this time, the manufacturing method was equally applied to the method used in Example 5.
  • the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light.
  • a film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 To prepare a composite polymer having an E-A-B-D structure, the following method was used, and a coating composition was prepared by the same method as in Example 1.
  • Example 4-c 20 parts by weight of methylene chloride was added dropwise to the mixture obtained in Example 4-c, 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, the pH was adjusted to have an acidity, and 30 minutes at a temperature of 4 ° C. Stirred. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
  • Example 6-a After the organic layer of the resultant obtained in Example 6-a was prepared without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 6-a in progress at a time to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (7). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • Example 6-b the reaction mixture was obtained, washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 7 was obtained along with various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was.
  • the molecular weight was obtained in the styrene conversion value of 21,000, n value of X was 4-6, n value of Y was 4-6.
  • silsesquioxane composite polymer was prepared by applying the monomers described in Table 6 below. At this time, the manufacturing method was equally applied to the method used in Example 6.
  • the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light.
  • a film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Synthesis step was carried out step by step, hydrolysis and condensation step by step, to prepare a coating composition in the same manner as in Example 1.
  • a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
  • KOH Potassium hydroxide
  • TMAH tetramethylammonium hydroxide
  • Example 7-a To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, 1 part by weight of the catalyst prepared in Example 7-a was added dropwise, and stirred at room temperature for 1 hour, followed by 2 20 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 15 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 5 hours.
  • the mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 6,000 styrene.
  • Example 7-a To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, 0.5 parts by weight of the catalyst prepared in Example 7-a were added dropwise, followed by stirring at room temperature for 1 hour, and then 2 10 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 20 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 2 hours.
  • the mixed solution was stirred and washed twice to remove the catalyst and impurities, and then filtered, and then linear silsesquioxane containing 0.1 mmol / g or less of the alkoxy group remaining through 1 H-NMR analysis. This was then used to introduce the cage into the continuous reaction.
  • XRD analysis confirmed that the overall structure is a linear structure through the XRD analysis. As a result of measuring the molecular weight, it was confirmed that the silsesquioxane having a linear structure had a molecular weight in terms of 8,000 styrene.
  • Example 7-a catalyst To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 5 parts by weight of tetrahydrofuran, and 10 parts by weight of the prepared Example 7-a catalyst were added dropwise, followed by stirring at room temperature for 1 hour. 20 parts by weight of the 7-b precursor and the 7-c precursor were added dropwise, and 10 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 24 hours. The mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 15,000 styrene.
  • Example 7-d 0.36% by weight of HCl solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 °C 30 minutes. Thereafter, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise at a time to achieve stable hydrolysis. After stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer. A small amount of sample was taken and analyzed by H-NMR and IR to confirm the residual ratio of methoxy.
  • the terminal was converted into a cage structure using a trifunctional monomer.
  • 100 parts by weight of the material obtained in Example 7-e was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state.
  • the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer. However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • the obtained solid material was filtered, and it was confirmed that the polymer was obtained without various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was.
  • the molecular weight was a styrene conversion value of 24,000
  • the n value of X was 4-6
  • the n value of Y was 4-6.
  • silsesquioxane composite polymer was prepared by applying the monomers described in Table 7 below. At this time, the manufacturing method was equally applied to the method used in Example 7.
  • Example 7 Except for using the silsesquioxane composite polymer prepared in Example 7, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 In order to prepare a composite polymer having a D-A-B-A-D structure, the following examples were used, and a coating composition was prepared by the same method as in Example 1.
  • Example 7-d 15 parts by weight of 0.36 wt% HCl aqueous solution was added dropwise very slowly to the mixed solution of Example 7-d, which was adjusted to have an acidic pH, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, the amount of diphenyltetramethoxydisiloxane was prepared by adding 25 parts by weight, which is 5 times the amount of Example 7-e, and added dropwise at once, and after stirring for 1 hour, 20 parts by weight of the catalyst prepared in Example 7-a was added again to give a basic pH of the mixed solution. Was adjusted.
  • the terminal was converted into a cage structure using a trifunctional monomer.
  • 100 parts by weight of the material obtained in Example 8-a was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state.
  • the cage-type polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in formula (9). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Formula 9 was obtained without various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 36,000, the n value of X was 4-6, the n value of Y was 4-6.
  • silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 8 below. At this time, the manufacturing method was equally applied to the method used in Example 8.
  • Example 8 Except for using the silsesquioxane composite polymer prepared in Example 8, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • Example 1 In order to prepare a composite polymer having an E-A-B-A-D structure, the following examples were used, and a coating composition was prepared by the same method as in Example 1.
  • Example 7-g To the mixture obtained in Example 7-g, 20 parts by weight of methylene chloride were added dropwise without further purification, 5 parts by weight of an aqueous 0.36% by weight HCl solution was added dropwise, the pH was adjusted to have an acidity, and 30 minutes at a temperature of 4 ° C. Stirred. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
  • Example 9-a After preparing the organic layer of the resultant obtained in Example 9-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 9-a in progress at a time to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer. However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
  • Example 9-b After the reaction mixture was obtained in Example 9-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
  • the obtained solid material was filtered, and it was confirmed that the polymer of Formula 10 was obtained along with various by-products by vacuum reduction.
  • the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was.
  • the molecular weight was obtained in the styrene conversion value of 28,000, the n value of X was 4-6, the n value of Y was 4-6.
  • silsesquioxane composite polymer was prepared by applying the monomers described in Table 9 below. In this case, the method used in Example 9 was equally applied.
  • the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light.
  • a film was prepared.
  • the blue light absorbing film has excellent resistance to yellowing and blue light absorption.
  • the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
  • the coating film was prepared in the same manner as in Example 9 except that the blue light absorbing compound was not included and coated in Example 9.
  • a film was prepared in the same manner as in Example 9, except that the blue light absorbing compound was used as the benzophenol in Example 9.
  • a film was prepared in the same manner as in Example 9, except that the blue light absorbing compound was used as the benzotriazole in Example 9.
  • the coating composition prepared in Example 9 was coated on PET 188 um (Toray Industries, Inc.) to prepare a blue light absorbing film.
  • the blue light absorbing film was prepared by varying the content of the blue light absorbing compound to measure the degree of yellowing phenomenon (Yellowish b *) and blue light transmittance, and are shown in Table 10 below.
  • the degree of yellowing (Yellowish b *) was measured by U-4100 (spectrophotometer), and the blue light transmittance was measured by NDH5000 (turbidimeter). The lower the transmittance, the better the blue light absorption.
  • the blue light absorbing film of the present invention contained 0.001 to 10% by weight of the blue light absorbing compound, it was confirmed that the blue light absorbance and the yellowing phenomenon were excellent at the same time.
  • the blue light absorbing film according to the present invention has an average light absorption of 30 to 70% (transmittance of 30 to 70%) of 400 to 470 nm (first wavelength range + second wavelength range).
  • the average light absorption of 470-500 nm (third wavelength region) is 40 to 20% (transmittance of 60 to 80%), more specifically, the light absorption of the first wavelength region is 50 to 85% (transmittance of 15 to 50%), the light absorption of the second wavelength region is 65 to 35% (35-65% transmittance), and the light absorption of the third wavelength region is 40 to 20% (60-80% transmittance).
  • the ratio of average light absorption between wavelength ranges has 2-5 so that blue light harmful to human body is absorbed as much as possible, and blue light which is beneficial to human body is relatively absorbed. It was confirmed that it is very advantageous to the human body when applied as a protective film of the display device.
  • Film according to the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, gloss Properties and surface hardness improving effect can be increased.
  • the light absorption of the blue light of 400-470 nm wavelength harmful to the human body is very high, but the light absorption of the blue light of the wavelength 470-500 nm beneficial to the human body is relatively low can bring a more beneficial effect on the human body.

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Abstract

The present invention relates to a blue light absorption film and, specifically, to a film and a compound contained in the film, wherein: the film has an excellent effect of absorbing the blue light that comes out from various display devices, thereby preventing deterioration of eyesight, eye damage, and sleep disorder; the film has excellent resistance to yellowing; the film increases effects of improving scratch resistance, water repellency, antifouling, anti-fingerprinting, thermal stability, gloss, and surface hardness; and especially, the film has a very high absorption power for a blue light of 400-470 nm wavelength band, which is harmful to the human body, but a relatively low absorption power for a blue light of 470-500 nm wavelength band, which is beneficial to the human body, and thus can give a beneficial effect to the human body.

Description

청색광 흡수 필름Blue light absorbing film
본 발명은 청색광 흡수 필름에 관한 것으로, 특히 각종 디스플레이 기기에서 나오는 청색광 흡수효과가 우수하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시키며, 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있는 필름, 코팅조성물 및 이에 포함되는 화합물에 관한 것이다.The present invention relates to a blue light absorbing film, and in particular, excellent blue light absorbing effect from various display devices can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, Increases the antifouling, anti-fingerprint, thermal stability, glossiness and surface hardness improvement effects. In particular, the light absorption of blue light in the 400-470 nm wavelength, which is harmful to the human body, is very high, but the blue light in the 470-500 nm wavelength, which is beneficial to the human body, is highly effective. The light absorption for the relatively low relates to a film, a coating composition and a compound included therein which can bring a more beneficial effect on the human body.
디스플레이에서는 다양한 파장대의 빛이 발생하며, 이중 UV와 가시광선이 인간의 망막 및 색소세포상피에 손상을 줄 수도 있지만, 인간의 망막은 295 nm 이하의 단파장(UV 영역)을 각막에서, 400 nm미만의 단파장을 수정체에서 흡수하며, 인간의 망막은 400-760nm 대역의 전자기파(가시광선) 및 약간의 IR 대역에만 노출되어 있다.In the display, light of various wavelengths is generated, and double UV and visible light may damage the human retina and pigment cell epithelium, but the human retina has a short wavelength (UV area) of less than 295 nm in the cornea, less than 400 nm. The short wavelength of is absorbed by the lens, and the human retina is exposed only to electromagnetic waves (visible light) in the 400-760 nm band and a few IR bands.
청색광(블루라이트)은 각종 디스플레이 기기에서 나오는 푸른빛의 강한 에너지로, 눈에 보이지는 않지만 눈의 활성산소를 급격히 증가시켜 시각 세포를 최대 80%까지 손상시킬 수 있음이 보고되고 있으며, 또한 시력저하, 안구건조증, 수면장애 등을 유발할 수 있으며, 특히 400-450 nm(파장 1영역)의 경우 망막손상, 세포손상을 유발하며, 450-470 nm(파장 2영역)의 경우 멜라토닌(수면 유도 호르몬) 억제, 각성, 심박수 증가 등의 인체에 악영향을 미치며, 다만, 470-500 nm(파장 3 영역)의 경우 수면장애 및 우울증 치료에 도움이 된다고 보고되고 있다.Blue light (blue light) is a strong energy of blue light from various display devices, but it is reported that it is invisible but can rapidly increase the free radicals of the eye and damage visual cells by up to 80%. , Dry eye, and sleep disorders, especially retinal and cellular damage in 400-450 nm (wavelength 1 region), and melatonin (sleep induction hormone) in 450-470 nm (wavelength 2 region). It adversely affects the human body such as suppression, arousal, and heart rate increase, but 470-500 nm (wavelength 3 region) has been reported to be useful for treating sleep disorders and depression.
이를 해결하기 위하여 살리실산(
Figure PCTKR2016010043-appb-I000001
)계 화합물, 벤조페논(
Figure PCTKR2016010043-appb-I000002
)
To solve this, salicylic acid (
Figure PCTKR2016010043-appb-I000001
) Compound, benzophenone (
Figure PCTKR2016010043-appb-I000002
)
계 화합물, 벤조트리아졸(
Figure PCTKR2016010043-appb-I000003
)계 화합물 또는 시아노아크릴레이트계 화합물을 이용하여 청색광을 흡수하고 하는 시도가 있었으나, 필름의 황변현상 심하게 발생하며, 청색광 차단효과가 크지 않은 문제점이 있었으며, 이에 대한 대책이 시급한 실정이다.
System compound, benzotriazole (
Figure PCTKR2016010043-appb-I000003
Attempts have been made to absorb blue light using a) -based compound or cyanoacrylate-based compound, but the yellowing phenomenon of the film is severe, and there is a problem that the blue light blocking effect is not large, and countermeasures are urgently needed.
상기와 같은 문제점을 해결하기 위해 본 발명은 청색광 흡수효과가 우수하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시킬 수 있으며, 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있는 청색광 흡수필름을 제공하는 것을 목적으로 한다.In order to solve the above problems, the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint , Heat stability, glossiness and surface hardness improvement effect can be increased. Especially, the light absorption power of blue light in the wavelength range of 400-470 nm, which is harmful to the human body, is very high, but the light absorption power of blue light in the wavelength range of 470-500 nm, which is beneficial to the human body, is very high. Is a relatively low object to provide a blue light absorbing film that can bring a more beneficial effect on the human body.
또한 본 발명은 청색광 흡수효과가 우수하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시킬 수 있으며, 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있는 코팅조성물을 제공한다.In addition, the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, fingerprint resistance, thermal stability, gloss characteristics and It is possible to increase the surface hardness improvement effect, especially the light absorption of blue light in the wavelength range of 400-470 nm, which is harmful to the human body, is very high, while the light absorption power of the blue light in the wavelength range of 470-500 nm, which is beneficial to the human body, is relatively low. It provides a coating composition that can bring a beneficial effect.
또한, 본 발명은 청색광 흡수에 유용한 화합물을 제공하는 것을 목적으로 한다.It is also an object of the present invention to provide a compound useful for absorbing blue light.
상기 목적을 달성하기 위해 본 발명은 The present invention to achieve the above object
또한 본 발명은 상기 화학식 1로 표시되는 청색광 흡수 화합물을 포함하는 필름을 제공한다.In another aspect, the present invention provides a film containing a blue light absorbing compound represented by the formula (1).
[화학식 1][Formula 1]
Figure PCTKR2016010043-appb-I000004
Figure PCTKR2016010043-appb-I000004
상기 화학식 1에서, In Chemical Formula 1,
R1, R2, R3, R4, R5, R6, R7, R8, R9 는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기; C2~C40의 알케닐기; C1~C40의 알콕시기; C3~C40의 시클로알킬기; C3~C40의 헤테로시클로알킬기; C6~C40의 아릴기; C3~C40의 헤테로아릴기; C3~C40의 아르알킬기; C3~C40의 아릴옥시기; 또는 C3~C40의 아릴사이올기이다.R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; C 1 -C 40 alkyl groups which are unsubstituted or substituted with deuterium, halogen, amine groups, epoxy groups, (meth) acryl groups, siol groups, isocyanate groups, nitrile groups, nitro groups, and phenyl groups; C 2 -C 40 alkenyl group; C 1 ~ C 40 Alkoxy group; C 3 -C 40 cycloalkyl group; C 3 ~ C 40 Heterocycloalkyl group; C 6 -C 40 aryl group; C 3 ~ C 40 heteroaryl group; An aralkyl group of C 3 ~ C 40; C 3 -C 40 aryloxy group; Or an C 3 to C 40 arylcyol group.
또한 본 발명은 상기 화학식 1로 표시되는 청색광 흡수 화합물을 포함하는 코팅조성물을 제공한다.In another aspect, the present invention provides a coating composition comprising a blue light absorbing compound represented by the formula (1).
또한 본 발명은 상기 화학식 1로 표시되는 청색광 흡수 화합물을 제공한다.In another aspect, the present invention provides a blue light absorbing compound represented by the formula (1).
본 발명에 따른 필름은 청색광 흡수효과가 우수하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시킬 수 있다. 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있다.Film according to the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, gloss Properties and surface hardness improving effect can be increased. In particular, the light absorption of the blue light of 400-470 nm wavelength harmful to the human body is very high, but the light absorption of the blue light of the wavelength 470-500 nm beneficial to the human body is relatively low can bring a more beneficial effect on the human body.
도 1은 본 발명의 실시예 및 비교예에 따른 청색광 흡수필름의 400-500 nm 영역의 청색광 흡수율을 측정한 결과그래프이다.1 is a graph showing the results of measuring blue light absorption in a 400-500 nm region of a blue light absorbing film according to Examples and Comparative Examples of the present invention.
아래에서는 첨부한 도면을 참고로 하여 본 발명에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. Hereinafter, the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout the specification, when a part is said to "include" a certain component, it means that it can further include other components, without excluding other components unless specifically stated otherwise.
이하 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명은 하기 화학식 1로 표시되는 청색광 흡수 화합물을 포함하는 필름을 제공한다:The present invention provides a film comprising a blue light absorbing compound represented by Formula 1 below:
[화학식 1][Formula 1]
Figure PCTKR2016010043-appb-I000005
Figure PCTKR2016010043-appb-I000005
상기 화학식 1에서, In Chemical Formula 1,
R1, R2, R3, R4, R5, R6, R7, R8, R9는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이다. 구체적으로 상기 R3가 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기인 것이 좋다.R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or a C 3 ~ C 40 aralkyl group or C 3 ~ C 40 aryloxy group or a C 3 ~ C 40 aryl olgi between the. Specifically, R 3 is a C 1 ~ C 40 alkyl group which is unsubstituted or substituted with hydrogen, deuterium, halogen, amine group, epoxy group, (meth) acryl group, siol group, isocyanate group, nitrile group, nitro group, phenyl group or C 2 ~ C 40 alkenyl group or C 1 ~ C 40 alkoxy group or C 3 ~ C 40 cycloalkyl group or C 3 ~ C 40 heterocycloalkyl group or C 6 ~ C 40 aryl group or C 3 ~ C 40 may be a heteroaryl group or a C 3 ~ C 40 aralkyl group or C 3 ~ aryloxy group or a C 3 ~ C 40 aryl group between all of the C 40.
더욱 구체적으로 구체적으로 상기 화합물은 인돌-3-아세트아미드(Indole-3-acetamide), 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)을 들 수 있다. 상기 화합물들은 2종 이상 혼합하여 사용될 수도 있다. More specifically, the compound is indole-3-acetamide, indole-3-carboxaldehyde, indole-3-carbinol And indole-3-thiocarboxamide, 2- (2-aminophenyl) indole and 2- (2-aminophenyl) indole. The compounds may be used by mixing two or more kinds.
본 발명에 따른 화합물은 400 내지 500 nm 영역대의 청색광을 흡수하는 성질을 가진다. 특히 상기 화합물은 인체에 해로운 400-450 nm(제1파장 영역) 및 450-470 nm(제2파장 영역)의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm(제3파장 영역)의 청색광에 대한 광흡수력은 상대적으로 낮다. 구체적으로 상기 화합물의 400-470 nm의 광에 대한 평균 광흡수율과 470-500 nm의 광에 대한 평균 광흡수율의 비율(파장 1+2영역의 광흡수율/파장 3 영역의 광흡수율)이 2-5일 수 있으며, 상기와 같은 이유로 본 발명의 화합물은 청색광 흡수필름에 적용 시 인체에 더욱 유리하게 적용될 수 있다. The compound according to the present invention has a property of absorbing blue light in the 400 to 500 nm region. In particular, the compound has a very high light absorption of blue light of 400-450 nm (first wavelength region) and 450-470 nm (second wavelength region) harmful to the human body, while 470-500 nm (third wavelength region) beneficial to the human body. ), The light absorption of blue light is relatively low. Specifically, the ratio of the average light absorption of 400-470 nm of light and the average light absorption of 470-500 nm of light of the compound (light absorption of wavelength 1 + 2 / light absorption of wavelength 3) is 2- It may be 5, and for the same reason, the compound of the present invention may be more advantageous to the human body when applied to the blue light absorbing film.
본 발명에 따른 청색광 흡수 필름은 상기 화학식 1로 표시되는 화합물을 포함하는 바, 상기 화합물은 필름 기재에 포함되거나, 별도의 코팅층으로 구비되어 포함되거나, 기재의 일면 또는 양면에 형성되는 코팅층에 포함될 수 있으며, 구체적으로는 상기 코팅층은 하드코팅층일 수 있다. Blue light absorbing film according to the present invention includes a compound represented by the formula (1), the compound may be included in the film substrate, or included as a separate coating layer, or may be included in the coating layer formed on one or both sides of the substrate In particular, the coating layer may be a hard coating layer.
상기 하드코팅층은 본 발명은 상기 화학식 1로 표시되는 화합물 및 실세스퀴옥산 수지를 포함하는 코팅조성물로 형성할 수 있다. 실세스퀴옥산 수지를 포함할 경우 필름의 하드코팅을 동시에 수행할 수 있다.The hard coating layer may be formed of a coating composition including the compound represented by Formula 1 and a silsesquioxane resin. When the silsesquioxane resin is included, hard coating of the film may be performed at the same time.
상기 실세스퀴옥산은
Figure PCTKR2016010043-appb-I000006
,
Figure PCTKR2016010043-appb-I000007
,
Figure PCTKR2016010043-appb-I000008
Figure PCTKR2016010043-appb-I000009
중에서 적어도 하나를 포함하는 실세스퀴옥산일 수 있으며, 또는,
Figure PCTKR2016010043-appb-I000010
Figure PCTKR2016010043-appb-I000011
를 포함하는 실세스퀴옥산일 수 있으며, 또는, 하기 화학식 2 내지 10 중 어느 하나로 표시되는 실세스퀴옥산일 수 있다.
The silsesquioxane
Figure PCTKR2016010043-appb-I000006
,
Figure PCTKR2016010043-appb-I000007
,
Figure PCTKR2016010043-appb-I000008
And
Figure PCTKR2016010043-appb-I000009
It may be silsesquioxane including at least one of, or
Figure PCTKR2016010043-appb-I000010
And
Figure PCTKR2016010043-appb-I000011
It may be a silsesquioxane containing, or may be silsesquioxane represented by any one of the following Formulas 2 to 10.
[화학식 2][Formula 2]
Figure PCTKR2016010043-appb-I000012
Figure PCTKR2016010043-appb-I000012
[화학식 3][Formula 3]
Figure PCTKR2016010043-appb-I000013
Figure PCTKR2016010043-appb-I000013
[화학식 4][Formula 4]
Figure PCTKR2016010043-appb-I000014
Figure PCTKR2016010043-appb-I000014
[화학식 5][Formula 5]
Figure PCTKR2016010043-appb-I000015
Figure PCTKR2016010043-appb-I000015
[화학식 6][Formula 6]
Figure PCTKR2016010043-appb-I000016
Figure PCTKR2016010043-appb-I000016
[화학식 7][Formula 7]
Figure PCTKR2016010043-appb-I000017
Figure PCTKR2016010043-appb-I000017
[화학식 8][Formula 8]
Figure PCTKR2016010043-appb-I000018
Figure PCTKR2016010043-appb-I000018
[화학식 9][Formula 9]
Figure PCTKR2016010043-appb-I000019
Figure PCTKR2016010043-appb-I000019
[화학식 10][Formula 10]
Figure PCTKR2016010043-appb-I000020
Figure PCTKR2016010043-appb-I000020
상기에서, A는In the above, A is
Figure PCTKR2016010043-appb-I000021
이고, B는
Figure PCTKR2016010043-appb-I000022
이고,
Figure PCTKR2016010043-appb-I000021
And B is
Figure PCTKR2016010043-appb-I000022
ego,
D는
Figure PCTKR2016010043-appb-I000023
이고, E는
Figure PCTKR2016010043-appb-I000024
이며,
D is
Figure PCTKR2016010043-appb-I000023
And E is
Figure PCTKR2016010043-appb-I000024
Is,
Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며, a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고, 구체적으로는 a는 3 내지 1000이고, d는 1 내지 500일 수 있으며, 더욱 구체적으로는 a는 5 내지 300이고, d는 2 내지 100일 수 있으며, b는 각각 독립적으로 1 내지 500의 정수이며, e는 각각 독립적으로 1 또는 2이며, 구체적으로 1일 수 있으며, n은 각각 독립적으로 1 내지 20의 정수이며, 구체적으로는 3 내지 10일 수 있다. 상기에서 표시되지는 않았지만, 각각의 사슬단위 사이에는 실세스퀴옥산 복합고분자에 적용가능한 공지의 사슬단위가 더욱 포함될 수 있다. R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or A C 3 to C 40 aralkyl group or a C 3 to C 40 aryloxy group or a C 3 to C 40 arylthiol group, a and d are each independently an integer of 1 to 100,000, specifically a is 3 To 1000, d may be 1 to 500, more specifically a is 5 to 300, d may be 2 to 100, b is each independently an integer of 1 to 500, e is each independently 1 or 2, specifically may be 1, n is each independently an integer of 1 to 20, Specifically, it may be 3 to 10. Although not indicated above, a known chain unit applicable to the silsesquioxane composite polymer may be further included between each chain unit.
상기 화학식 2로 표시되는 실세스퀴옥산 복합 고분자는 The silsesquioxane composite polymer represented by Formula 2 is
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [D]d(OR2)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계를 포함하여 제조될 수 있다.Mixing a basic catalyst and an organic solvent in a reactor and then adding an organic silane compound and condensing to prepare Chemical Formula 11; And a second step of adding an acidic catalyst to the reactor to adjust the reaction solution to acidic acid and then adding and stirring an organic silane compound to introduce a [D] d (OR 2 ) 2 structure into Chemical Formula 11 after the first step. step; And a third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the two steps.
[화학식 11][Formula 11]
Figure PCTKR2016010043-appb-I000025
Figure PCTKR2016010043-appb-I000025
상기 식에서 R1, R2, R16, D, a 및 d는 화학식 2 내지 11에서 정의한 바와 같다.Wherein R 1 , R 2 , R 16 , D, a and d are the same as defined in Chemical Formulas 2 to 11.
본 발명의 상기 화학식 3으로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by Formula 3 of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 상기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [D]d(OR3)2 및 [D]d(OR4)2 구조를 화학식 3과 같이 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 과량의 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 제3단계 반응을 거쳐, 단독으로 생성되는 부산물인 cage 구조를 재결정으로 제거하여주는 정제단계를 진행하여 제조될 수 있다.A first step of preparing Chemical Formula 11 by mixing a basic catalyst and an organic solvent in a reactor and then adding and condensing an organic silane compound; And adding an acidic catalyst to the reactor to introduce the [D] d (OR 3 ) 2 and [D] d (OR 4 ) 2 structures into the formula (11) after the first step as in the formula ( 3 ). A second step of adding and stirring an excess of the organic silane compound after the adjustment; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the second step; And through a third step of the reaction, it can be prepared by proceeding to the purification step to remove the cage structure as a by-product generated by recrystallization.
본 발명의 상기 화학식 4로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by Formula 4 of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 상기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [D]d(OR5)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 상기 제3단계 이후에 복합고분자의 말단에 [E]eX2 구조를 도입하여 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 제4단계를 포함하여 제조될 수 있다.A first step of preparing Chemical Formula 11 by mixing a basic catalyst and an organic solvent in a reactor and then adding and condensing an organic silane compound; And a second step of adding an acidic catalyst to the reactor to adjust the reaction solution to acidic acid and then adding and stirring an organic silane compound to introduce a [D] d (OR 5 ) 2 structure into Chemical Formula 11 after the first step. step; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the second step; And a fourth step of introducing an [E] eX 2 structure at the end of the composite polymer into the reactor after the third step, converting the reaction solution into an acidic atmosphere, and mixing and stirring the organosilane compound. Can be prepared.
본 발명의 상기 화학식 5로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by the formula (5) of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합도를 조절하여 상기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [B]b 구조 및 [D]d(OR7)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계를 포함하여 제조될 수 있다.A first step of preparing Chemical Formula 11 by mixing a basic catalyst and an organic solvent in a reactor, adding an organic silane compound, and adjusting the degree of condensation; And after the first step, an acidic catalyst is added to the reactor to introduce the [B] b structure and the [D] d (OR 7 ) 2 structure into the formula (11), and the reaction solution is acidified to adjust the organic silane compound. A second step of adding and stirring; And a third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the two steps.
본 발명의 상기 화학식 6으로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by the formula (6) of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 상기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [B]b 구조 및 [D]d(OR8)2, [D]d(OR9)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 과량의 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 제3단계; 및 제3단계 이후 재결정과 필터과정을 통하여, 단독 cage 생성 구조를 제거하는 제4단계를 포함하여 제조될 수 있다.A first step of preparing Chemical Formula 11 by mixing a basic catalyst and an organic solvent in a reactor and then adding and condensing an organic silane compound; And adding an acidic catalyst to the reactor to introduce the [B] b structure, the [D] d (OR 8 ) 2 , and the [D] d (OR 9 ) 2 structure into the chemical formula 11 after the first step. A second step of adding and stirring an excess of the organic silane compound after adjusting to acidity; And a third step of converting the reaction solution into basic by adding a basic catalyst to the reactor after the second step; And a fourth step of removing the single cage generation structure through recrystallization and filtering after the third step.
본 발명의 상기 화학식 7로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by the formula (7) of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 상기 화학식 11을 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 11에 [B]b 구조 및 [D]d(OR10)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 상기 제3단계 이후에 복합고분자의 말단에 [E]eX2 구조를 도입하여 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 제4단계를 포함하여 제조될 수 있다.A first step of preparing Chemical Formula 11 by mixing a basic catalyst and an organic solvent in a reactor and then adding and condensing an organic silane compound; And after the first step, an acidic catalyst is added to the reactor to introduce the [B] b structure and the [D] d (OR 10 ) 2 structure into the formula (11), and the reaction solution is acidified to adjust the organic silane compound. A second step of adding and stirring; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the second step; And a fourth step of introducing an [E] eX 2 structure at the end of the composite polymer into the reactor after the third step, converting the reaction solution into an acidic atmosphere, and mixing and stirring the organosilane compound. Can be prepared.
구체적으로 상기 화학식 2 내지 7을 제조하는 방법에서 본 발명의 제1단계의 반응액의 pH는 9 내지 11.5이고, 제2단계의 반응액의 pH는 2 내지 4 이고, 제3단계의 반응액의 pH는 8 내지 11.5 이고, Ee을 도입하는 제4단계의 반응액의 pH는 1.5 내지 4 이다. 상기 범위 내인 경우 제조되는 실세스퀴옥산 복합 고분자의 수율이 높을 뿐만 아니라 제조된 실세스퀴옥산 복합 고분자의 기계적 물성을 향상시킬 수 있다.Specifically, the pH of the reaction solution of the first step of the present invention in the method for preparing the formulas 2 to 7 is 9 to 11.5, the pH of the reaction solution of the second step is 2 to 4, the reaction solution of the third step The pH is 8 to 11.5, and the pH of the reaction solution in the fourth step of introducing Ee is 1.5 to 4. Within the above range, not only the yield of the silsesquioxane composite polymer prepared is high, but also the mechanical properties of the manufactured silsesquioxane composite polymer can be improved.
본 발명의 상기 화학식 8로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by the formula (8) of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합도가 조절된 두 가지 형태의 상기 화학식 11을 제조하는 1단계; 상기 1단계에서 얻어진 화학식 11에 [B]b 구조 및 [D]d(OR12)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 각각의 2단계 반응 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 상기 3단계를 통해 얻어진 2가지 이상의 물질을 염기성 조건에서 축합하여 연결하는 4단계를 포함하여 제조될 수 있다.Mixing a basic catalyst and an organic solvent in a reactor, followed by adding an organosilane compound and preparing two types of Chemical Formula 11 in which the degree of condensation is controlled; In order to introduce the structure [B] b and the structure [D] d (OR 12 ) 2 to the formula (11) obtained in step 1, the reaction solution was adjusted to acid by adding an acidic catalyst to the reactor, and then an organic silane compound was added. A second step of stirring; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after each two-step reaction; And four steps of condensing and connecting two or more materials obtained through the three steps under basic conditions.
본 발명의 상기 화학식 9로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by the formula (9) of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합도가 조절된 두 가지 형태의 상기 화학식 11을 제조하는 1단계; 상기 1단계에서 얻어진 화학식 11에 [B]b 구조, [D]d(OR14)2 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 각각의 2단계 반응 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 상기 3단계를 통해 얻어진 2가지 이상의 물질을 염기성 조건에서 축합하여 연결하는 4단계; 상기 4단계 이후 [D]d(OR13)2를 도입하기 위한 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제5단계; 및 상기 5단계 반응 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제6단계를 포함하여 제조될 수 있다.Mixing a basic catalyst and an organic solvent in a reactor, followed by adding an organosilane compound and preparing two types of Chemical Formula 11 in which the degree of condensation is controlled; In order to introduce the [B] b structure and the [D] d (OR 14 ) 2 structure into the formula (11) obtained in step 1, the reaction solution was adjusted to acid by adding an acidic catalyst to the reactor, and then an organic silane compound was added. A second step of stirring; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after each two-step reaction; Condensing and connecting two or more substances obtained through the three steps under basic conditions; A fifth step of adding an acidic catalyst to the reactor for introducing [D] d (OR 13 ) 2 after the fourth step to adjust the reaction solution to acid, followed by adding and stirring an organic silane compound; And a sixth step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the five step reaction.
본 발명의 상기 화학식 10으로 표시되는 실세스퀴옥산 복합 고분자는 Silsesquioxane composite polymer represented by Formula 10 of the present invention
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합도가 조절된 두 가지 형태의 상기 화학식 11을 제조하는 1단계; 상기 1단계에서 얻어진 화학식 11에 [B]b 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 각각의 2단계반응 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 상기 3단계를 통해 얻어진 2가지 이상의 화합물을 염기성 조건에서 축합하여 연결하는 4단계; 상기 제4단계 이후 [D]d(OR5)2를 도입하기 위한 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제5단계; 상기 5단계 반응 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제6단계; 상기 제6단계 이후에 복합고분자의 말단에 [E]eX2 구조를 도입하여 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 제7단계를 포함하여 제조될 수 있다.Mixing a basic catalyst and an organic solvent in a reactor, followed by adding an organosilane compound and preparing two types of Chemical Formula 11 in which the degree of condensation is controlled; A second step of adding an acidic catalyst to the reactor to adjust the reaction solution to acidic acid in order to introduce the structure [B] b to the formula (11) obtained in step 1, and then adding and stirring an organic silane compound; A third step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after each two step reaction; Condensing and connecting two or more compounds obtained through the three steps in basic conditions; A fifth step of adding an acidic catalyst to a reactor for introducing [D] d (OR 5 ) 2 to adjust the reaction solution to acidic acid after the fourth step, and then adding and stirring an organic silane compound; A sixth step of performing a condensation reaction by converting the reaction solution into basic by adding a basic catalyst to the reactor after the five step reaction; Including the seventh step of introducing the [E] eX 2 structure to the end of the composite polymer after the sixth step to convert the reaction solution into an acidic atmosphere by mixing the organic silane compound by stirring the acidic catalyst into the reactor Can be prepared.
구체적으로 상기 화학식 8 내지 10의 고분자를 제조하는 방법에서 제1단계의 반응액의 pH는 9 내지 11.5 이고, 제2단계의 반응액의 pH는 2 내지 4 이고, 제3단계의 반응액의 pH는 8 내지 11.5이고, 제4단계의 반응액의 pH는 9 내지 11.5이고, 제5단계의 반응액의 pH는 2 내지 4이고, 제6단계의 반응액의 8 내지 11.5이고, Ee를 도입하는 제7단계의 반응액의 pH는 1.5 내지 4이다. 상기 범위 내인 경우 제조되는 실세스퀴옥산 복합 고분자의 수율이 높을 뿐만 아니라 제조된 실세스퀴옥산 복합 고분자의 기계적 물성을 향상시킬 수 있다.Specifically, the pH of the reaction solution of the first step is 9 to 11.5, the pH of the reaction solution of the second step is 2 to 4, the pH of the reaction solution of the third step in the method for preparing the polymer of Formula 8 to 10 Is 8 to 11.5, the pH of the reaction solution of the fourth step is 9 to 11.5, the pH of the reaction solution of the fifth step is 2 to 4, 8 to 11.5 of the reaction solution of the sixth step, and Ee is introduced. PH of the reaction solution of the seventh step is 1.5 to 4. Within the above range, not only the yield of the silsesquioxane composite polymer prepared is high, but also the mechanical properties of the manufactured silsesquioxane composite polymer can be improved.
또한 필요한 경우 각각의 복합 고분자에 [B]b 구조 및 [D]d(OR)2 구조를 더욱 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 단계; 및 상기 단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 단계를 통하여 복합 고분자 내에 [B]b 반복단위를 더욱 포함할 수 있다.If necessary, in order to further introduce the [B] b structure and the [D] d (OR) 2 structure to each of the composite polymers, an acidic catalyst was added to the reactor to adjust the reaction solution to acidic acid, and then an organic silane compound was added. Stirring; And [B] b repeating units in the composite polymer through the step of performing a condensation reaction by adding a basic catalyst to the reactor and converting the reaction solution to basic after the above step.
또한 필요한 경우 각각의 복합 고분자의 말단에 [E]eX2 구조를 도입하기 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 단계를 포함하여 복합 고분자의 말단에 [E]e의 반복단위를 더욱 포함할 수 있다.In addition, by converting the reaction solution was added an acid catalyst to the reactor in order to introduce a [E] eX 2 structure at the ends of each of the composite polymer, if necessary with an acidic atmosphere, and comprising the step of stirring a mixture of an organosilane compound of the composite polymer The terminal may further include a repeating unit of [E] e.
상기 실세스퀴옥산 복합 고분자의 제조방법에서는 염기성 촉매로서 구체적으로는 2종 이상의 염기성 촉매의 혼합촉매를 사용하고, 이를 산성 촉매로 중화 및 산성화하여 재 가수분해를 유도하며, 다시 2종 이상의 염기성 촉매의 혼합촉매를 이용하여 염기성으로 축합을 진행함으로써 하나의 반응기내에서 산도와 염기도를 연속적으로 조절할 수 있다.In the method for preparing the silsesquioxane composite polymer, a mixed catalyst of two or more basic catalysts is specifically used as a basic catalyst, and neutralized and acidified with an acidic catalyst to induce rehydrolysis, and again two or more basic catalysts. Acidity and basicity can be continuously controlled in one reactor by proceeding to basic condensation using a mixed catalyst of.
이때, 상기 염기성 촉매는 Li, Na, K, Ca 및 Ba 으로 이루어진 군에서 선택된 금속계 염기성 촉매 및 아민계 염기성 촉매에서 선택되는 2종 이상의 물질을 적절히 조합하여 제조될 수 있다. 구체적으로는 상기 아민계 염기성 촉매가 테트라메틸암모늄 하이드록시드(TMAH)이고, 금속계 염기성 촉매가 포타슘 하이드록시드(KOH) 또는 중탄산나트륨 (NaHCO3)일 수 있다. 상기 혼합촉매에서 각 성분의 함량은 구체적으로는 아민계 염기성 촉매와 금속계 염기성 촉매의 비율이 10 내지 90: 10 내지 90 중량부의 비율에서 임의로 조절할 수 있다. 상기 범위 내인 경우 가수분해시 관능기와 촉매와의 반응성을 최소화시킬 수 있으며, 이로 인해 Si-OH 또는 Si-알콕시 등의 유기 관능기의 결함이 현저히 감소하여 축합도를 자유로이 조절할 수 있는 장점이 있다. 또한, 상기 산성 촉매로는 당분야에서 통상적으로 사용하는 산성 물질이라면 제한 없이 사용될 수 있으며, 예를 들어, HCl, H2SO4, HNO3, CH3COOH 등의 일반 산성물질을 사용할 수 있고, 또한 latic acid, tartaric acid, maleic acid, citric acid 등의 유기계 산성물질도 적용할 수 있다.In this case, the basic catalyst may be prepared by appropriately combining two or more materials selected from a metal based catalyst and an amine based catalyst selected from the group consisting of Li, Na, K, Ca and Ba. Specifically, the amine basic catalyst may be tetramethylammonium hydroxide (TMAH), and the metallic basic catalyst may be potassium hydroxide (KOH) or sodium bicarbonate (NaHCO 3 ). In the mixed catalyst, the content of each component may be arbitrarily adjusted at a ratio of 10 to 90:10 to 90 parts by weight of the amine based catalyst and the metal based catalyst. Within the above range, the reactivity between the functional group and the catalyst may be minimized during hydrolysis, and thus, the defects of organic functional groups such as Si-OH or Si-alkoxy may be significantly reduced, thereby freely controlling the degree of condensation. In addition, the acidic catalyst may be used without limitation so long as it is an acidic material commonly used in the art, for example, may be used a general acidic material such as HCl, H 2 SO 4 , HNO 3 , CH 3 COOH, Organic acids such as latic acid, tartaric acid, maleic acid and citric acid can also be applied.
본 발명의 상기 실세스퀴옥산 복합 고분자의 제조방법에서 상기 유기용매는 당분야에서 통상적으로 사용하는 유기용매라면 제한 없이 사용될 수 있으며, 예를 들어, 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜, 셀로솔브계 등의 알코올류, 락테이트계, 아세톤, 메틸(아이소부틸)에틸케톤 등의 케톤류, 에틸렌글리콜 등의 글리콜류, 테트라하이드로퓨란 등의 퓨란계, 디메틸포름아미드, 디메틸아세트아미드, N-메틸-2-피롤리돈 등의 극성용매 뿐 아니라, 헥산, 사이클로헥산, 사이클로헥사논, 톨루엔, 자일렌, 크레졸, 클로로포름, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크로니트릴, 메틸렌클로라이드, 옥타데실아민, 아닐린, 디메틸설폭사이드, 벤질알콜 등 다양한 용매를 사용할 수 있다.In the method for preparing the silsesquioxane composite polymer of the present invention, the organic solvent may be used without limitation as long as it is an organic solvent commonly used in the art, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol , Alcohols such as cellosolves, ketones such as lactate, acetone, methyl (isobutyl) ethyl ketone, glycols such as ethylene glycol, furan systems such as tetrahydrofuran, dimethylformamide, dimethylacetamide, N Polar solvents such as methyl-2-pyrrolidone, as well as hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, Various solvents, such as acronitrile, methylene chloride, octadecylamine, aniline, dimethylsulfoxide, benzyl alcohol, can be used.
또한, 상기 유기 실란계 화합물로는 본 발명의 실세스퀴옥산 복합 고분자인 화학식 2 내지 10의 R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22를 포함하는 유기 실란이 사용될 수 있으며, 구체적으로 실세스퀴옥산 복합 고분자의 내화학성을 증가시켜 비팽윤성을 향상시키는 효과가 있는 페닐기 또는 아미노기를 포함하는 유기 실란 화합물, 또는 복합 고분자의 경화 밀도를 증가시켜 경화층의 기계적 강도 및 경도를 향상시키는 효과가 있는 에폭시기 또는 (메타)아크릴기를 포함하는 유기 실란 화합물을 사용할 수 있다.In addition, as the organosilane-based compound of the silsesquioxane composite polymer of the present invention R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , Organosilanes comprising R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 can be used Specifically, the organic silane compound containing a phenyl group or an amino group having an effect of improving the chemical resistance of the silsesquioxane composite polymer to improve the non-swelling property, or the curing density of the composite polymer to increase the mechanical strength and hardness of the cured layer An organic silane compound containing an epoxy group or a (meth) acryl group having an effect of improving can be used.
상기 유기 실란계 화합물의 구체적인 예로는 (3-글리시드옥시프로필)트리메톡시실란, (3-글리시드옥시프로필)트리에톡시실란, (3-글리시드옥시프로필)메틸디메톡시실란, (3-글리시드옥시프로필)디메틸에톡시실란, 3-(메타아크릴옥시)프로필트리메톡시실란, 3,4-에폭시부틸트리메톡시실란, 3,4-에폭시부틸트리에톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리에톡시실란, 아미노프로필트리에톡시실란, 비닐트리에톡시실란, 비닐트리-t-부톡시실란, 비닐트리이소부톡시실란, 비닐트리이소프로폭시실란, 비닐트리페녹시실란, 페닐트리에톡시실란, 페닐트리메톡시실란, 아미노프로필트리메톡시실란, N-페닐-3-아미노프로필트리메톡시실란, 디메틸테트라메톡시실록산, 디페닐테트라메톡시실록산 등을 들 수 있으며, 이들 중 1종 단독으로 또는 2종 이상을 병용하여 사용할 수도 있다. 최종 제조되는 조성물의 물성을 위하여 2종 이상을 혼합하여 사용하는 것이 보다 유리하다.Specific examples of the organosilane compound include (3-glycidoxypropyl) trimethoxysilane, (3-glycidoxypropyl) triethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, (3 -Glycidoxy propyl) dimethyl ethoxy silane, 3- (methacryloxy) propyl trimethoxy silane, 3, 4- epoxy butyl trimethoxy silane, 3, 4- epoxy butyl triethoxy silane, 2- (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyltriethoxysilane, vinyltriethoxysilane, vinyltri-t-butoxy Silane, vinyltriisobutoxysilane, vinyltriisopropoxysilane, vinyltriphenoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane, aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltrimeth Methoxysilane, dimethyl tetramethoxysiloxane, diphenyltetramethoxysiloxane, etc. are mentioned, You may use individually by 1 type or in combination of 2 or more types. It is more advantageous to use two or more kinds in combination for physical properties of the final composition.
본 발명의 상기 실세스퀴옥산은 우수한 보관 안정성을 확보하여 폭넓은 응용성을 얻기 위해, 축합도가 1 내지 99.9% 이상으로 조절될 수 있다. 즉, 말단 및 중앙의 Si에 결합된 알콕시 그룹(OR)의 함량이 전체 결합기에 대해 50%에서 0.01%까지 조절될 수 있다.The silsesquioxane of the present invention can be adjusted to 1 to 99.9% or more of condensation in order to secure excellent storage stability to obtain a wide range of applications. That is, the content of the alkoxy group (OR) bonded to the terminal and central Si can be adjusted from 50% to 0.01% with respect to the entire bonding group.
또한, 반복단위 [B]b 또는 [E]e의 함유량을 조절함으로써 표면경도를 포함한 기재의 물성을 더욱 향상시킬 수 있다.In addition, by adjusting the content of the repeating unit [B] b or [E] e, the physical properties of the substrate including the surface hardness can be further improved.
상기 실세스퀴옥산의 중량평균분자량은 1,000 내지 500,000이고, 구체적으로는 1,000 내지 80,000이며, 더욱 구체적으로는 2,000 내지 50,000일 수 있다. 이 경우 실세스퀴옥산의 가공성 및 물리적 특성을 동시에 향상시킬 수 있다.The weight average molecular weight of the silsesquioxane may be 1,000 to 500,000, specifically 1,000 to 80,000, and more specifically 2,000 to 50,000. In this case, the processability and physical properties of the silsesquioxane can be improved simultaneously.
본 발명의 상기 코팅조성물은 실세스퀴옥산 복합고분자가 액상인 경우 무용제 타입으로 단독으로 코팅이 가능하며, 고상인 경우 유기용매를 포함하여 구성될 수 있다. 또한 코팅 조성물은 개시제 또는 경화제를 더욱 포함할 수 있다.The coating composition of the present invention may be coated alone as a solvent-free type when the silsesquioxane composite polymer is a liquid, and may be configured to include an organic solvent in the case of a solid phase. In addition, the coating composition may further include an initiator or a curing agent.
구체적으로 상기 코팅조성물은 화학식 1로 표시되는 화합물; 상기 화학식 2 내지 10 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자; 상기 복합 고분자와 상용성이 있는 당분야에서 통상적으로 사용하는 유기용매, 개시제를 포함할 수 있으며, 선택적으로 경화제, 가소제, 자외선 차단제, 기타 기능성 첨가제 등의 첨가제를 추가로 포함하여 경화성, 내열특성, 자외선차단, 가소 효과 등을 향상시킬 수 있다.Specifically, the coating composition is a compound represented by Formula 1; Silsesquioxane composite polymer represented by any one of Formulas 2 to 10; It may include an organic solvent, an initiator commonly used in the art that is compatible with the composite polymer, and optionally further include additives such as curing agents, plasticizers, sunscreens, and other functional additives, such as curability, heat resistance, UV protection, a plasticizing effect, etc. can be improved.
본 발명의 코팅 조성물에 있어서 화학식 1로 표시되는 청색광 흡수 화합물은 구체적으로 0.001 내지 10 중량%로 포함하는 것이며, 더욱 구체적으로는 0.1 내지 5 중량%로 포함하는 것이다. 상기 범위 내인 경우 우수한 청색광 흡수율을 가지고 필름의 투명성을 유지하면서 황변현상에 대한 내성을 동시에 만족시킬 있으며, 또한 실세스퀴옥산과의 상용성이 우수하여 필름의 하드코팅의 물성을 더욱 향상시킬 수 있다.In the coating composition of the present invention, the blue light absorbing compound represented by Formula 1 is specifically included in 0.001 to 10% by weight, and more specifically 0.1 to 5% by weight. Within the above range, it has an excellent blue light absorption and satisfies the resistance to yellowing while maintaining transparency of the film, and also has excellent compatibility with silsesquioxane, thereby further improving the physical properties of the hard coating of the film. .
상기 실세스퀴옥산 복합 고분자는 코팅 조성물에 5 내지 90 중량%를 포함할 수 있다. 상기 범위 내인 경우 코팅 조성물의 경화막의 기계적 물성을 더욱 향상시킬 수 있다.The silsesquioxane composite polymer may include 5 to 90 wt% of the coating composition. If within the above range can further improve the mechanical properties of the cured film of the coating composition.
또한 상기 코팅 조성물은 유기용매를 더욱 포함할 수 있으며, 상기 유기용매로는 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜, 셀로솔브계 등의 알코올류, 락테이트계, 아세톤, 메틸(아이소부틸)에틸케톤 등의 케톤류, 에틸렌글리콜 등의 글리콜 류, 테트라하이드로퓨란 등의 퓨란계, 디메틸포름아미드, 디메틸아세트아미드, N-메틸-2-피롤리돈 등의 극성용매 뿐 아니라, 헥산, 사이클로헥산, 사이클로헥사논, 톨루엔, 자일렌, 크레졸, 클로로포름, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크로니트릴, 메틸렌클로라이드, 옥타데실아민, 아닐린, 디메틸설폭사이드, 벤질알콜 등 다양한 용매를 이용할 수 있으나, 이에 제한되지는 않는다. 상기 유기용매의 양은 복합고분자, 개시제, 및 선택적으로 추가되는 첨가제를 제외한 잔량으로 포함된다. 구체적으로 95 중량% 이하의 양으로 포함될 수 있다.In addition, the coating composition may further include an organic solvent, and as the organic solvent, alcohols such as methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, cellosolve, lactate, acetone, methyl (isobutyl Ketones such as ethyl ketone, glycols such as ethylene glycol, furan compounds such as tetrahydrofuran, polar solvents such as dimethylformamide, dimethylacetamide and N-methyl-2-pyrrolidone, as well as hexane and cyclohexane Cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, methylene chloride, octadecylamine, aniline, dimethyl sulfoxide, benzyl alcohol, etc. Various solvents may be used, but are not limited thereto. The amount of the organic solvent is included in the remaining amount excluding the composite polymer, the initiator, and optionally added additives. Specifically, it may be included in an amount of 95% by weight or less.
또한 본 발명의 코팅 조성물에 있어서 상기 개시제 또는 경화제는 실세스퀴옥산 복합 고분자에 포함된 유기관능기에 따라 적절히 선택하여 사용할 수 있다.In the coating composition of the present invention, the initiator or the curing agent may be appropriately selected and used according to the organic functional group contained in the silsesquioxane composite polymer.
구체적인 예로서 상기 유기관능기에 불포화 탄화수소, 사이올계, 에폭시계, 아민계, 이소시아네이트계 등의 후경화가 가능한 유기계가 도입될 경우, 열 또는 광을 이용한 다양한 경화가 가능하다. 이때 열 또는 광에 의한 변화를 고분자 자체 내에서 도모할 수 있고, 상기와 같은 유기용매에 희석함으로써 경화공정을 도모할 수 있다. As a specific example, when an organic system capable of post-curing such as an unsaturated hydrocarbon, a siol system, an epoxy system, an amine system, or an isocyanate group is introduced into the organic functional group, various curing using heat or light is possible. At this time, the change due to heat or light can be achieved in the polymer itself, and the curing step can be achieved by diluting with the organic solvent as described above.
또한 본 발명에서는 복합 고분자의 경화 및 후 반응을 위하여, 다양한 개시제를 사용할 수 있으며, 상기 개시제는 조성물 총중량 100 중량부에 대하여 0.01-10 중량부로 포함될 수 있으며, 상기 범위 내의 함량으로 포함될 때, 경화 후 투과도 및 코팅안정성을 동시에 만족시킬 수 있다.In addition, in the present invention, for curing and post-reaction of the composite polymer, various initiators may be used, and the initiator may be included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total composition, and when included in an amount within the above range, Permeability and coating stability can be satisfied at the same time.
상기 경화제는 조성물 총중량 100 중량부에 대하여 0.01-10 중량부로 포함될 수 있다.The hardener may be included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total composition.
본 발명에서는 또한 경화공정 또는 후반응을 통한 경도, 강도, 내구성, 성형성 등을 개선하는 목적으로 자외선 흡수제, 산화 방지제, 소포제, 레벨링제, 발수제, 난연제, 접착개선제 등의 첨가제를 추가로 포함할 수 있다. 이러한 첨가제는 그 사용에 있어 특별하게 제한은 없으나 필름의 특성 즉, 유연성, 투광성, 내열성, 경도, 강도 등의 물성을 해치지 않는 범위 내에서 적절히 첨가할 수 있다. 상기 첨가제는 각각 독립적으로 조성물 총중량100 중량부에 대하여 0.01-10 중량부로 포함되는 것이 좋다.The present invention may further include additives such as UV absorbers, antioxidants, antifoaming agents, leveling agents, water repellents, flame retardants, and adhesion improving agents for the purpose of improving hardness, strength, durability, formability, etc. through a curing process or a post reaction. Can be. Such additives are not particularly limited in use, but may be appropriately added within a range that does not impair the properties of the film, that is, properties such as flexibility, light transmittance, heat resistance, hardness and strength. Each of the additives is preferably included in an amount of 0.01-10 parts by weight based on 100 parts by weight of the total weight of the composition.
또한 본 발명에서 상기 필름기재는 투명필름일 수 있으며, 구체적인 필름의 예로는 COC(Cyclic olefin copolymer), PAc(Polyacrylate), PC(Polycarbonate), PE(Polyethylene), PEEK (Polyetheretherketone), PEI(Polyetherimide), PEN(Polyethylenenaphthalate), PES(Polyethersulfone), PET(Polyethyleneterephtalate), PI(Polyimide), PO(Polyolefin), PMMA(Polymethylmethacrylate), PSF(Polysulfone), PVA(Polyvinylalcohol), PVCi(Polyvinylcinnamate), TAC(Triacetylcellulose), 폴리실리콘(Poly Silicone), 폴리우레탄(Polyurethane) 및 에폭시 수지(Epoxy Resin)로 이루어진 군으로부터 선택되는 소재의 필름을 사용할 수 있다. 상기 소재로 단층 또는 동일 소재의 특성이 다른 2층 이상으로 구성될 수 있으며, 또한 공압출을 통하여 2종 이상의 플라스틱이 혼합된 투명필름일 수도 있다.In addition, in the present invention, the film base material may be a transparent film, and specific examples of the film include COC (Cyclic olefin copolymer), PAc (Polyacrylate), PC (Polycarbonate), PE (Polyethylene), PEEK (Polyetheretherketone), PEI (Polyetherimide) , Polyethylenenaphthalate (PEN), Polyethersulfone (PES), Polyethylene terephtalate (PET), Polyimide (PI), Polyolefin (PO), Polymethylmethacrylate (PMMA), Polysulfone (PSF), Polyvinylalcohol (PVA), Polyvinylcinnamate (acetyl) acetyl TAC , Polysilicon (Poly Silicone), polyurethane (Polyurethane) and epoxy resin (Epoxy Resin) film of the material selected from the group consisting of can be used. The material may be composed of a single layer or two or more layers having different characteristics of the same material, and may also be a transparent film in which two or more plastics are mixed through coextrusion.
본 발명에 있어서, 상기 코팅 조성물을 투명필름 위에 코팅하는 방법은 스핀코팅, 바코팅, 슬릿코팅, 딥 코팅, 내츄럴 코팅, 리버스 코팅, 롤 코팅, 스핀코팅, 커텐코팅, 스프레이 코팅, 그라비어 코팅 등 공지된 방법 중에서 당업자가 임의로 선택하여 적용할 수 있다. 경화방법에 있어도 광경화 또는 열경화를 복합고분자의 관능기에 따라 적절하게 선택하여 적용할 수 있다. 구체적으로 열경화의 경우 경화온도는 80 내지 120 ℃이며, 또한 상기 경화는 광경화일 수 있으며, 상기 광경화는 자외선 경화일 수 있고, 구체적으로는 UV 램프를 이용하여 200mJ 내지 2000mJ로 경화할 수 있다. In the present invention, a method for coating the coating composition on a transparent film is known as spin coating, bar coating, slit coating, dip coating, natural coating, reverse coating, roll coating, spin coating, curtain coating, spray coating, gravure coating, and the like. Those skilled in the art can arbitrarily select and apply among the methods. Also in the curing method, photocuring or thermosetting can be appropriately selected and applied according to the functional group of the composite polymer. Specifically, in the case of thermal curing, the curing temperature is 80 to 120 ℃, and the curing may be photocuring, the photocuring may be ultraviolet curing, specifically, it may be cured to 200mJ to 2000mJ using a UV lamp. .
또한 본 발명의 필름은 에이징하는 단계를 더욱 실행할 수 있다. 상기 에이징 단계는 50 내지 100 ℃ 사이에서 에이징할 수 있으며, 시간은 3 내지 48시간 정도로 할 수 있다. 상기 에이징 단계를 통하여 코팅층이 안정적으로 생성되며, 필름과 코팅층의 접착력이 더욱 향상될 수 있으며, 코팅층의 표면이 우수한 우수한 표면경도, 투명성, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성 및 광택특성을 갖도록 할 수 있다.In addition, the film of the present invention may further perform the step of aging. The aging step may be aged between 50 to 100 ℃, the time may be about 3 to 48 hours. Through the aging step, the coating layer is stably generated, and the adhesion between the film and the coating layer can be further improved, and the surface of the coating layer has excellent surface hardness, transparency, scratch resistance, water repellency, antifouling properties, fingerprint resistance, and thermal stability. And gloss characteristics.
본 발명에서 상기 코팅 조성물의 코팅 두께는 임의로 조절 가능하며, 구체적으로 0.01 내지 500 um이며, 더욱 구체적으로는 0.1 내지 300 um, 더더욱 구체적으로는 1 내지 100 um 범위가 좋다. 상기 범위 내인 경우 우수한 청색광 흡수도 필름의 황변현상에 내성을 동시에 만족시킬 수 있으며, 필름표면이 7H 이상의 표면경도를 안정적으로 확보할 수 있을 뿐만 아니라 필름 표면 특성에 있어서도 우수한 물성을 나타낸다. In the present invention, the coating thickness of the coating composition may be arbitrarily adjusted, specifically 0.01 to 500 um, more specifically 0.1 to 300 um, even more specifically 1 to 100 um range. Within this range, the excellent blue light absorbency can satisfy the yellowing phenomenon of the film at the same time, the film surface can not only stably secure the surface hardness of 7H or more, but also exhibits excellent physical properties in the film surface properties.
본 발명에 따른 청색광 흡수 필름은 화학식 1로 표시되는 청색광 흡수 화합물을 포함함으로써 400-470 nm(제1파장 영역대 + 제2파장 영역대)의 평균 광흡수율이 30 내지 70%(투과율이 30 내지 70%)일 수 있으며, 470-500 nm(제3파장 영역)의 평균 광흡수율이 40 내지 20%(투과율이 60 내지 80%)일 수 있으며, 더욱 구체적으로 제1파장 영역의 광흡수는 50 내지 85%(투과율이 15 내지 50%)일 수 있으며, 제2파장 영역의 광흡수는 65 내지 35%(투과율이 35 내지 65%)일 수 있으며, 제3파장 영역의 광흡수는 40 내지 20%(투과율이 60 내지 80%)일 수 있다. 본 발명의 청색광 흡수 필름은 파장 영역간의 평균 광흡수율의 비율(파장 1+2영역의 광흡수율/파장 3 영역의 광흡수율)이 2-5를 가짐으로써 인체에 유해한 청색광은 가급적 많이 흡수하고, 인체에 유익한 청색광은 비교적 흡수를 하지 않아 인체에 더욱 유리하다.The blue light absorbing film according to the present invention includes a blue light absorbing compound represented by the formula (1), so that the average light absorption of 400-470 nm (first wavelength range + second wavelength range) is 30 to 70% (transmittance is 30 to 70%). 70%), the average light absorption of 470-500 nm (third wavelength region) may be 40 to 20% (transmittance of 60 to 80%), more specifically, the light absorption of the first wavelength region is 50 To 85% (transmittance of 15 to 50%), the light absorption of the second wavelength region may be 65 to 35% (transmittance of 35 to 65%), the light absorption of the third wavelength region is 40 to 20 % (Transmittance of 60 to 80%). In the blue light absorbing film of the present invention, the ratio of the average light absorption rate between the wavelength ranges (the light absorption rate in the wavelength 1 + 2 region / the light absorption rate in the wavelength 3 region) has 2-5 to absorb as much of the blue light as harmful to the human body. The blue light, which is beneficial to the human body, is relatively absent and more advantageous to the human body.
본 발명의 상기 청색광 흡수 필름은 디스플레이 기기에 적용될 수 있으며, 구체적으로 상기 디스플레이 기기는 스마트폰, 테블릿 PC, 노트북 PC, AIO(All-In-One) PC, LCD 모니터, TV, 광고판 또는 터치패널일 수 있으며, 필름의 유연성을 요구하는 플렉시블 스마트 기기(웨어러블 스마트 기기)일 수도 있다.The blue light absorbing film of the present invention may be applied to a display device. Specifically, the display device may be a smartphone, a tablet PC, a notebook PC, an AIO (All-In-One) PC, an LCD monitor, a TV, an advertisement board, or a touch panel. It may be a flexible smart device (wearable smart device) that requires the flexibility of the film.
상기 디스플레이기 기기에 포함되는 상기 필름의 형태는 특별히 한정되지 않으며, 일예로 윈도우 커버 필름 또는 보호필름의 형태일 수 있다. 본 발명에 따른 디스플레이 기기는 청색광 흡수필름을 포함하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시킬 수 있으며, 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있다.The form of the film included in the display device is not particularly limited, and may be, for example, in the form of a window cover film or a protective film. The display device according to the present invention includes a blue light absorbing film to prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, It is possible to increase the glossiness and surface hardness enhancement effect. Especially, the light absorption power of blue light of 400-470 nm wavelength which is harmful to human body is very high while the light absorption power of blue light of 470-500 nm wavelength which is beneficial to human body is relatively low. It can have a more beneficial effect on the human body.
이하, 본 발명의 이해를 돕기 위하여 구체적인 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, specific examples are provided to help understanding of the present invention, but the following examples are merely to illustrate the present invention, and the scope of the present invention is not limited to the following examples.
하기 본 발명의 실시예에서 ECHETMS는 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS는 Glycidoxypropytrimethoxysilane, MAPTMS는 (methacryloyloxy)propyltrimethoxysilane, PTMS는 Phenyltrimethoxysilane, MTMS는 Methyltrimethoxysilane, ECHETMDS는 Di(epoxycyclohexyethyl) tetramethoxy disiloxane, GPTMDS는 Di(glycidoxypropyl) tetramethoxy disiloxane, MAPTMDS는 Di(methacryloyloxy)propy, PTMDS는 Di(phenyl) tetramethoxy disiloxane, MTMDS는 Di(Methyl) tetramethoxy disiloxane을 의미한다.In the embodiment of the present invention, ECHETMS is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, GPTMS is Glycidoxypropytrimethoxysilane, MAPTMS is (methacryloyloxy) propyltrimethoxysilane, PTMS is Phenyltrimethoxysilane, MTMS is Methyltrimethoxysilane, and ECHETMDS is Di (epoxycyclohexyethyl) Di (glycidoxypropyl) tetramethoxy disiloxane, MAPTMDS stands for Di (methacryloyloxy) propy, PTMDS stands for Di (phenyl) tetramethoxy disiloxane, and MTMDS stands for Di (Methyl) tetramethoxy disiloxane.
실시예 1Example 1 : 실세스퀴옥산 A-D 구조 복합 고분자의 합성 및 코팅조성물의 제조Synthesis of Silsesquioxane A-D Structured Polymer and Preparation of Coating Composition
합성단계는 아래와 같이, 연속가수분해 및 축합을 단계적으로 진행하였다. In the synthesis step, continuous hydrolysis and condensation were carried out step by step as follows.
[실시예 1-a] 촉매의 제조Example 1-a Preparation of Catalyst
염기도 조절을 위하여, Tetramethylammonium hydroxide (TMAH) 25 중량% 수용액에 10 중량% Potassium hydroxide (KOH) 수용액을 혼합하여 촉매 1a를 준비하였다.In order to adjust the basicity, a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
[실시예 1-b] 선형 실세스퀴옥산 구조의 합성Example 1-b Synthesis of Linear Silsesquioxane Structure
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 15 중량부, 상기 실시예 1-a에서 제조된 촉매 1 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 20중량부를 적가하고, 다시 테트라하이드로류란을 15 중량부 적가하여 5시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, IR 분석을 통하여 말단기에 생성된 SI-OH 관능기를 확인할 수 있었으며(3200 cm-1), 분자량을 측정한 결과, 화학식 11구조와 같은 선형구조의 실세스퀴옥산이 8,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다.To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, 1 part by weight of the catalyst prepared in Example 1-a was added dropwise, followed by stirring at room temperature for 1 hour, and then 2 20 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 15 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 5 hours. The mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having the same linear structure as the formula (11) has a molecular weight of 8,000 styrene.
[실시예 1-c] 연속적 cage 구조의 생성Example 1-c Generation of a continuous cage structure
상기 실시예 1-b 혼합용액에 0.36 중량% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 Diphenyltetramethoxydisiloxane 5 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 1시간 교반 후 실시예 1-a에서 제조된 촉매를 7 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형고분자와는 별도로 alkoxy가 열려있는 D구조의 전구체가 형성된다. 소량의 샘플을 적취하여, H-NMR과 IR로 분석하여 methoxy의 잔존율을 확인한 후, 잔존율이 20% 일 때, 0.36 중량% HCl 수용액을 10 중량부 천천히 적가하여, pH를 산성으로 조절해 주었다. 이후 Phenyltrimethoxysilane 1 중량부를 한번에 적가하여 15분간 교반 후, 1-a에서 제조된 촉매 20 중량부를 첨가하였다. 4시간의 혼합교반 이후, 확인결과 고분자내에 cage 형태의 고분자가 생성됨을 확인 할 수 있었다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합 교반 이후, 일부를 적취하여 29Si-NMR을 통해 분석한 결과 phenyl기를 이용해 도입된 구조의 분석피크가 날카로운 형태의 2개로 나타나고 별도로 잔존하는 부산물 없이 화학식 2와 같은 A-D 고분자가 50% 이상 제조되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 11,000으로 측정되었으며, n 값은 4-6이었다. 29Si-NMR (CDCl3) δ To the mixed solution of Example 1-b 0.36% by weight of HCl aqueous solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 30 minutes. Thereafter, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise at one time to achieve stable hydrolysis. After stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to adjust the pH of the mixed solution in a basic state. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer. A small amount of sample was taken and analyzed by H-NMR and IR to confirm the residual ratio of methoxy. When the residual ratio was 20%, 10 parts by weight of 0.36 wt% HCl aqueous solution was slowly added dropwise to adjust the pH to acidic. gave. Thereafter, 1 part by weight of Phenyltrimethoxysilane was added dropwise at a time, stirred for 15 minutes, and then 20 parts by weight of the catalyst prepared in 1-a was added. After 4 hours of mixing and stirring, it was confirmed that cage type polymer was formed in the polymer. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in vacuo so that the entire reactant was converted into an aqueous solution mixture. After 4 hours of mixing and agitation, part of the sample was collected and analyzed by 29 Si-NMR. As a result, analytical peaks of the structure introduced using the phenyl group appeared as two sharp forms. It was confirmed that the above was manufactured. In addition, the styrene reduced molecular weight was measured to 11,000, n value was 4-6. 29 Si-NMR (CDCl 3 ) δ
[실시예 1-d] 코팅 조성물 제조Example 1-d Preparation of Coating Composition
상기 실시예 1-c에서 수득한 실세스퀴옥산 복합 고분자 20 g, 청색광 흡수 화합물로 인돌-3-아세트아미드(Indole-3-acetamide) 3 g, 에탄올 77 g, 광경화 Irgure 개시제 0.5 g, BYK社 실록산첨가제 0.05 g을 균일하게 혼합하여 코팅 조성물을 제조하였다.20 g of the silsesquioxane composite polymer obtained in Example 1-c, 3 g of indole-3-acetamide as a blue light absorbing compound, 77 g of ethanol, 0.5 g of photocurable irrure initiator, BYK 0.05 g of the siloxane additive was uniformly mixed to prepare a coating composition.
[실시예 1-e] 코팅Example 1-e Coating
PC(i-components사, Glastic 0.5T) 필름에 상기 1-d에서 제조한 코팅 조성물을 30 um의 두께로 코팅한 후, 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.The coating composition prepared in 1-d was coated on a PC (i-components, Glastic 0.5T) film to a thickness of 30 um, and then cured to prepare a blue light absorbing film. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
또한, 하기 표 1에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 1-b, 1-c, 1-d 및 1-e에서 사용한 방법을 대등하게 적용하였다. In addition, the monomers described in Table 1 were applied to produce a silsesquioxane composite polymer and a coating composition. In this case, the method used in Examples 1-b, 1-c, 1-d, and 1-e was equally applied.
표 1
실시방법No. 1-b 방법적용 단량체 1-c 방법적용 단량체 분자량(Mw)
전구체 cage도입
1 ECHETMS PTMDS PTMS 11,000
1-1 PTMS PTMDS PTMS 8,000
1-2 MTMS MTMDS MTMS 48,000
1-3 GPTMS GPTMDS GPTMS 25,000
1-4 MAPTMS MAPTMDS MAPTMS 21,000
1-5 ECHETMS ECHETMDS ECHETMS 3,000
1-6 ECHETMS MTMDS MTMS 9,000
1-7 ECHETMS GPTMDS GPTMS 11,000
1-8 ECHETMS MAPTMDS MAPTMS 18,000
1-9 PTMS ECHETMDS ECHETMS 36,000
1-10 PTMS MTMDS MTMS 120,000
1-11 PTMS GPTMDS GPTMS 11,000
1-12 PTMS MAPTMDS MAPTMS 110,000
1-13 MTMS ECHETMDS ECHETMS 18,000
1-14 MTMS PTMDS PTMS 5,000
1-15 MTMS GPTMDS GPTMS 80,000
1-16 MTMS MAPTMDS MAPTMS 35,000
1-17 GPTMS ECHETMDS ECHETMS 7,000
1-18 GPTMS PTMDS PTMS 120,000
1-19 GPTMS MTMDS MTMS 100,000
1-20 GPTMS MAPTMDS MAPTMS 4,000
1-21 MAPTMS ECHETMDS ECHETMS 35,000
1-22 MAPTMS PTMDS PTMS 2,800
1-23 MAPTMS MTMDS MTMS 8,000
1-24 MAPTMS GPTMDS GPTMS 180,000
Table 1
Method of implementation 1-b Method Applicable Monomer 1-c method applied monomer Molecular Weight (Mw)
Precursor Introduction of cage
One ECHETMS PTMDS PTMS 11,000
1-1 PTMS PTMDS PTMS 8,000
1-2 MTMS MTMDS MTMS 48,000
1-3 GPTMS GPTMDS GPTMS 25,000
1-4 MAPTMS MAPTMDS MAPTMS 21,000
1-5 ECHETMS ECHETMDS ECHETMS 3,000
1-6 ECHETMS MTMDS MTMS 9,000
1-7 ECHETMS GPTMDS GPTMS 11,000
1-8 ECHETMS MAPTMDS MAPTMS 18,000
1-9 PTMS ECHETMDS ECHETMS 36,000
1-10 PTMS MTMDS MTMS 120,000
1-11 PTMS GPTMDS GPTMS 11,000
1-12 PTMS MAPTMDS MAPTMS 110,000
1-13 MTMS ECHETMDS ECHETMS 18,000
1-14 MTMS PTMDS PTMS 5,000
1-15 MTMS GPTMDS GPTMS 80,000
1-16 MTMS MAPTMDS MAPTMS 35,000
1-17 GPTMS ECHETMDS ECHETMS 7,000
1-18 GPTMS PTMDS PTMS 120,000
1-19 GPTMS MTMDS MTMS 100,000
1-20 GPTMS MAPTMDS MAPTMS 4,000
1-21 MAPTMS ECHETMDS ECHETMS 35,000
1-22 MAPTMS PTMDS PTMS 2,800
1-23 MAPTMS MTMDS MTMS 8,000
1-24 MAPTMS GPTMDS GPTMS 180,000
실시예 2Example 2 : 실세스퀴옥산 D-A-D 구조 복합 고분자의 합성Synthesis of Silsesquioxane D-A-D Structured Polymer
D-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였으며, 상기 실시예 1에 기재된 방법과 대등한 방법으로 코팅 조성물을 제조하였다. 촉매 및 선형구조의 제조는 실시예 1-a 및 1-b의 방법을 동일하게 사용하였으며, 이후 연속적 D-A-D 구조를 생성하기 위하여 아래의 방법으로 제조를 실시하였다.In order to prepare a composite polymer having a D-A-D structure, the following examples were used, and a coating composition was prepared by a method similar to that described in Example 1 above. Preparation of the catalyst and the linear structure was used in the same manner as in Example 1-a and 1-b, and then to produce a continuous D-A-D structure was carried out by the following method.
[실시예 2-a] 과량의 연속적 cage 구조의 생성Example 2-a Generation of Excess Continuous Cage Structure
상기 실시예 1-b 혼합용액에 0.36 중량% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 실시예 1-b에서 사용된 Diphenyltetramethoxydisiloxane의 5배인 25 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 1시간 교반 후 실시예 1-a에서 제조된 촉매를 7 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형고분자와는 별도로 alkoxy가 열려있는 D구조의 전구체가 형성된다. 소량의 샘플을 적취하여, H-NMR과 IR로 분석하여 methoxy의 잔존율을 확인한 후, 잔존율이 20% 일 때, 0.36 중량% HCl 수용액을 10 중량부 천천히 적가하여, pH를 산성으로 조절해 주었다. 이후 Phenyltrimethoxysilane 1 중량부를 한번에 적가하여 15분간 교반 후, 1-a에서 제조된 촉매 20 중량부를 첨가하였다. 4시간의 혼합교반 이후, 확인결과 고분자내에 cage 형태의 고분자가 생성됨을 확인 할 수 있었다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합 교반 이후, 일부를 적취하여 29Si-NMR을 통해 분석한 결과 phenyl기를 이용해 도입된 구조의 분석피크가 날카로운 형태의 2개로 나타나고 별도로 잔존하는 부산물 없이 D-A-D 고분자가 제조되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 14,000으로 측정되었으며, n 값은 4-6이었다. 또한, Si-NMR 분석에서 A-D구조와는 달리 A구조의 말단에서 보이던 -68ppm 근방의 피크가 사라져, A구조의 말단이 D구조로 모두 변환되어 D-A-D구조로 생성됨을 확인 하였다. 29Si-NMR (CDCl3) δ -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad)To the mixed solution of Example 1-b 0.36% by weight of HCl aqueous solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 30 minutes. Thereafter, 25 parts by weight, which is 5 times the amount of Diphenyltetramethoxydisiloxane used in Example 1-b, was added dropwise at one time to achieve stable hydrolysis, and after stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer. A small amount of sample was taken and analyzed by H-NMR and IR to confirm the residual ratio of methoxy. When the residual ratio was 20%, 10 parts by weight of 0.36 wt% HCl aqueous solution was slowly added dropwise to adjust the pH to acidic. gave. Thereafter, 1 part by weight of Phenyltrimethoxysilane was added dropwise at a time, stirred for 15 minutes, and then 20 parts by weight of the catalyst prepared in 1-a was added. After 4 hours of mixing and stirring, it was confirmed that cage type polymer was formed in the polymer. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in vacuo so that the entire reactant was converted into an aqueous solution mixture. After 4 hours of mixing and agitation, a portion was taken and analyzed by 29 Si-NMR, and the analysis peak of the structure introduced using the phenyl group appeared as two sharp forms, and it was confirmed that the DAD polymer was prepared without any remaining by-products. In addition, the styrene reduced molecular weight was measured as 14,000, n value was 4-6. In addition, unlike the AD structure in the Si-NMR analysis, the peak around -68ppm, which was seen at the end of the A structure, disappeared, and the end of the A structure was converted into the D structure, thereby confirming that the DAD structure was generated. 29 Si-NMR (CDCl 3 ) δ -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
또한, 하기 표 2에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 2에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 2 below. At this time, the manufacturing method was equally applied to the method used in Example 2.
표 2
실시방법No. 1-b 방법적용 단량체 2-a 방법적용 단량체 분자량(Mw)
전구체 cage도입
2 ECHETMS PTMDS PTMS 14,000
2-1 PTMS PTMDS PTMS 9,000
2-2 MTMS MTMDS MTMS 52,000
2-3 GPTMS GPTMDS GPTMS 30,000
2-4 MAPTMS MAPTMDS MAPTMS 24,000
2-5 ECHETMS ECHETMDS ECHETMS 6,000
2-6 ECHETMS MTMDS MTMS 12,000
2-7 ECHETMS GPTMDS GPTMS 13,000
2-8 ECHETMS MAPTMDS MAPTMS 21,000
2-9 PTMS ECHETMDS ECHETMS 38,000
2-10 PTMS MTMDS MTMS 150,000
2-11 PTMS GPTMDS GPTMS 18,000
2-12 PTMS MAPTMDS MAPTMS 123,000
2-13 MTMS ECHETMDS ECHETMS 23,000
2-14 MTMS PTMDS PTMS 9,000
2-15 MTMS GPTMDS GPTMS 91,000
2-16 MTMS MAPTMDS MAPTMS 41,000
2-17 GPTMS ECHETMDS ECHETMS 12,000
2-18 GPTMS PTMDS PTMS 131,000
2-19 GPTMS MTMDS MTMS 110,000
2-20 GPTMS MAPTMDS MAPTMS 6,000
2-21 MAPTMS ECHETMDS ECHETMS 38,000
2-22 MAPTMS PTMDS PTMS 5,000
2-23 MAPTMS MTMDS MTMS 12,000
2-24 MAPTMS GPTMDS GPTMS 192,000
TABLE 2
Method of implementation 1-b Method Applicable Monomer 2-a method applied monomer Molecular Weight (Mw)
Precursor Introduction of cage
2 ECHETMS PTMDS PTMS 14,000
2-1 PTMS PTMDS PTMS 9,000
2-2 MTMS MTMDS MTMS 52,000
2-3 GPTMS GPTMDS GPTMS 30,000
2-4 MAPTMS MAPTMDS MAPTMS 24,000
2-5 ECHETMS ECHETMDS ECHETMS 6,000
2-6 ECHETMS MTMDS MTMS 12,000
2-7 ECHETMS GPTMDS GPTMS 13,000
2-8 ECHETMS MAPTMDS MAPTMS 21,000
2-9 PTMS ECHETMDS ECHETMS 38,000
2-10 PTMS MTMDS MTMS 150,000
2-11 PTMS GPTMDS GPTMS 18,000
2-12 PTMS MAPTMDS MAPTMS 123,000
2-13 MTMS ECHETMDS ECHETMS 23,000
2-14 MTMS PTMDS PTMS 9,000
2-15 MTMS GPTMDS GPTMS 91,000
2-16 MTMS MAPTMDS MAPTMS 41,000
2-17 GPTMS ECHETMDS ECHETMS 12,000
2-18 GPTMS PTMDS PTMS 131,000
2-19 GPTMS MTMDS MTMS 110,000
2-20 GPTMS MAPTMDS MAPTMS 6,000
2-21 MAPTMS ECHETMDS ECHETMS 38,000
2-22 MAPTMS PTMDS PTMS 5,000
2-23 MAPTMS MTMDS MTMS 12,000
2-24 MAPTMS GPTMDS GPTMS 192,000
상기 실시예 2에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 2, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 3Example 3 : 실세스퀴옥산 E-A-D 구조 복합 고분자의 합성: Synthesis of Silsesquioxane E-A-D Structured Composite Polymer
E-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였으며, 상기 실시예 1에 기재된 방법과 대등한 방법으로 코팅 조성물을 제조하였다. 촉매 및 선형구조의 제조는 실시예 1의 방법을 동일하게 사용하였으며, 이후 E-A-D 구조를 생성하기 위하여 아래의 방법으로 제조를 실시하였다.In order to prepare an E-A-D composite polymer, the following examples were used, and a coating composition was prepared by a method similar to that described in Example 1 above. Preparation of the catalyst and the linear structure was used in the same manner as in Example 1, and then to produce the E-A-D structure was carried out by the following method.
[실시예 3-a] 사슬 말단 E구조의 생성Example 3-a Generation of Chain Terminal E Structure
실시예 1-c 에서 얻어진 A-D 혼합물에 별도의 정제 없이 메틸렌크로라이드 20 중량부를 적가하고, 0.36 중량% HCl 수용액을 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 dimethyltetramethoxysilane 1 중량부를 한번에 적가하였다. 이때, 아직 분자구조 내에서 가수분해되지 않고 존재하던 부분들이 용매와 분리된 산성 수용액 층에서 가수분해물로 쉽게 변환되며, 생성된 별도의 반응물과 유기용매 층에서 축합되어 말단단위에 E가 도입되었다. 5시간의 교반 후, 반응의 교반을 정지하고 상온으로 반응기의 온도를 조절 하였다. To the AD mixture obtained in Example 1-c, 20 parts by weight of methylene chloride were added dropwise without further purification, 5 parts by weight of 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted to have an acidity, and the temperature was adjusted to 30 at 4 ° C. Stirred for a minute. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
[실시예 3-b] 말단 E 구조에 cage 도입Example 3-b Introduction of a Cage to the Terminal E Structure
상기 실시예 3-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 반응이 진행 중인 실시예 3-a 혼합용액에 Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 24시간 교반 후 실시예 1-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, E 구조 말단에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 4와 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After preparing the organic layer of the resultant obtained in Example 3-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 3-a in progress, to achieve stable hydrolysis, and after stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (4). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 3-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 3-c] Removal of By-products by Precipitation and Recrystallization, Obtaining the Result
상기 실시예 3-b에서 반응이 완료된 혼합물을 얻어낸 후, 증류수를 이용하여 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. After the reaction mixture was obtained in Example 3-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum pressure. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 4의 고분자를 여러 부산물과 함께 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 17,000이었으며, n 값은 4-6이었으며, 특히 화학식 4의 결과는 다음과 같다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 4 was obtained along with various byproducts by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was 17,000 in terms of styrene, n value was 4-6, in particular, the results of formula (4) are as follows.
29Si-NMR (CDCl3) δ -68.2, -71.8(sharp). -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ −68.2, −71.8 (sharp). -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
또한, 하기 표 3에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 3에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 3 below. In this case, the method used in Example 3 was equally applied.
표 3
실시방법No. 1-b 방법적용 단량체 1-c 방법적용 단량체 3-a방법적용 단량체 3-b방법적용단량체 Mw
전구체 cage도입
3 ECHETMS PTMDS PTMS MTMDS MAPTMS 17,000
3-1 ECHETMS ECHETMDS ECHETMS ECHETMDS ECHETMS 12,000
3-2 PTMS PTMDS PTMS PTMDS PTMS 18,000
3-3 MTMS MTMDS MTMS MTMDS MTMS 59,000
3-4 GPTMS ECHETMDS ECHETMS GPTMDS GPTMS 41,000
3-5 MAPTMS MAPTMDS MAPTMS MAPTMDS MAPTMS 31,000
3-6 ECHETMS ECHETMDS ECHETMS PTMDS PTMS 16,000
3-7 ECHETMS ECHETMDS ECHETMS MTMDS MTMS 12,000
3-8 ECHETMS ECHETMDS ECHETMS GPTMDS GPTMS 16,000
3-9 ECHETMS ECHETMDS ECHETMS MAPTMDS MAPTMS 92,000
3-10 ECHETMS PTMDS PTMS ECHETMDS ECHETMS 25,000
3-11 ECHETMS MTMDS MTMS ECHETMDS ECHETMS 38,000
3-12 ECHETMS GPTMDS GPTMS ECHETMDS ECHETMS 56,000
3-13 ECHETMS MAPTMDS MAPTMS ECHETMDS ECHETMS 97,000
3-14 PTMS PTMDS PTMS ECHETMDS ECHETMS 24,000
3-15 PTMS PTMDS PTMS MTMDS MTMS 31,000
3-16 PTMS PTMDS PTMS ECHETMDS ECHETMS 21,000
3-17 PTMS PTMDS PTMS MAPTMDS MAPTMS 64,000
3-18 PTMS ECHETMDS ECHETMS PTMDS PTMS 120,000
3-19 PTMS MTMDS MTMS PTMDS PTMS 210,000
3-20 PTMS GPTMDS GPTMS PTMDS PTMS 23,000
3-21 PTMS MAPTMDS MAPTMS PTMDS PTMS 160,000
3-22 MTMS MTMDS MTMS ECHETMDS ECHETMS 63,000
3-23 MTMS MTMDS MTMS PTMDS PTMS 52,000
3-24 MTMS MTMDS MTMS GPTMDS GPTMS 73,000
3-25 MTMS MTMDS MTMS MAPTMDS MAPTMS 98,000
3-26 MTMS ECHETMDS ECHETMS MTMDS MTMS 41,000
3-27 MTMS PTMDS PTMS MTMDS MTMS 15,000
3-28 MTMS GPTMDS GPTMS MTMDS MTMS 110,000
3-29 MTMS MAPTMDS MAPTMS MTMDS MTMS 45,000
3-30 GPTMS GPTMDS GPTMS ECHETMDS ECHETMS 35,000
3-31 GPTMS GPTMDS GPTMS PTMDS PTMS 33,000
3-32 GPTMS GPTMDS GPTMS MTMDS MTMS 48,000
3-33 GPTMS GPTMDS GPTMS MAPTMDS MAPTMS 29,000
3-34 GPTMS ECHETMDS ECHETMS GPTMDS GPTMS 19,000
3-35 GPTMS PTMDS PTMS GPTMDS GPTMS 156,000
3-36 GPTMS MTMDS MTMS GPTMDS GPTMS 116,000
3-37 GPTMS MAPTMDS MAPTMS GPTMDS GPTMS 12,000
3-38 MAPTMS MAPTMDS MAPTMS ECHETMDS ECHETMS 31,000
3-39 MAPTMS MAPTMDS MAPTMS PTMDS PTMS 28,000
3-40 MAPTMS MAPTMDS MAPTMS MTMDS MTMS 35,000
3-41 MAPTMS MAPTMDS MAPTMS GPTMDS GPTMS 31,000
3-42 MAPTMS ECHETMDS ECHETMS MAPTMDS MAPTMS 57,000
3-43 MAPTMS PTMDS PTMS MAPTMDS MAPTMS 9,000
3-44 MAPTMS MTMDS MTMS MAPTMDS MAPTMS 19,000
3-45 MAPTMS GPTMDS GPTMS MAPTMDS MAPTMS 213,000
TABLE 3
Method of implementation 1-b Method Applicable Monomer 1-c method applied monomer 3-a method applied monomer 3-b method applied monomer Mw
Precursor Introduction of cage
3 ECHETMS PTMDS PTMS MTMDS MAPTMS 17,000
3-1 ECHETMS ECHETMDS ECHETMS ECHETMDS ECHETMS 12,000
3-2 PTMS PTMDS PTMS PTMDS PTMS 18,000
3-3 MTMS MTMDS MTMS MTMDS MTMS 59,000
3-4 GPTMS ECHETMDS ECHETMS GPTMDS GPTMS 41,000
3-5 MAPTMS MAPTMDS MAPTMS MAPTMDS MAPTMS 31,000
3-6 ECHETMS ECHETMDS ECHETMS PTMDS PTMS 16,000
3-7 ECHETMS ECHETMDS ECHETMS MTMDS MTMS 12,000
3-8 ECHETMS ECHETMDS ECHETMS GPTMDS GPTMS 16,000
3-9 ECHETMS ECHETMDS ECHETMS MAPTMDS MAPTMS 92,000
3-10 ECHETMS PTMDS PTMS ECHETMDS ECHETMS 25,000
3-11 ECHETMS MTMDS MTMS ECHETMDS ECHETMS 38,000
3-12 ECHETMS GPTMDS GPTMS ECHETMDS ECHETMS 56,000
3-13 ECHETMS MAPTMDS MAPTMS ECHETMDS ECHETMS 97,000
3-14 PTMS PTMDS PTMS ECHETMDS ECHETMS 24,000
3-15 PTMS PTMDS PTMS MTMDS MTMS 31,000
3-16 PTMS PTMDS PTMS ECHETMDS ECHETMS 21,000
3-17 PTMS PTMDS PTMS MAPTMDS MAPTMS 64,000
3-18 PTMS ECHETMDS ECHETMS PTMDS PTMS 120,000
3-19 PTMS MTMDS MTMS PTMDS PTMS 210,000
3-20 PTMS GPTMDS GPTMS PTMDS PTMS 23,000
3-21 PTMS MAPTMDS MAPTMS PTMDS PTMS 160,000
3-22 MTMS MTMDS MTMS ECHETMDS ECHETMS 63,000
3-23 MTMS MTMDS MTMS PTMDS PTMS 52,000
3-24 MTMS MTMDS MTMS GPTMDS GPTMS 73,000
3-25 MTMS MTMDS MTMS MAPTMDS MAPTMS 98,000
3-26 MTMS ECHETMDS ECHETMS MTMDS MTMS 41,000
3-27 MTMS PTMDS PTMS MTMDS MTMS 15,000
3-28 MTMS GPTMDS GPTMS MTMDS MTMS 110,000
3-29 MTMS MAPTMDS MAPTMS MTMDS MTMS 45,000
3-30 GPTMS GPTMDS GPTMS ECHETMDS ECHETMS 35,000
3-31 GPTMS GPTMDS GPTMS PTMDS PTMS 33,000
3-32 GPTMS GPTMDS GPTMS MTMDS MTMS 48,000
3-33 GPTMS GPTMDS GPTMS MAPTMDS MAPTMS 29,000
3-34 GPTMS ECHETMDS ECHETMS GPTMDS GPTMS 19,000
3-35 GPTMS PTMDS PTMS GPTMDS GPTMS 156,000
3-36 GPTMS MTMDS MTMS GPTMDS GPTMS 116,000
3-37 GPTMS MAPTMDS MAPTMS GPTMDS GPTMS 12,000
3-38 MAPTMS MAPTMDS MAPTMS ECHETMDS ECHETMS 31,000
3-39 MAPTMS MAPTMDS MAPTMS PTMDS PTMS 28,000
3-40 MAPTMS MAPTMDS MAPTMS MTMDS MTMS 35,000
3-41 MAPTMS MAPTMDS MAPTMS GPTMDS GPTMS 31,000
3-42 MAPTMS ECHETMDS ECHETMS MAPTMDS MAPTMS 57,000
3-43 MAPTMS PTMDS PTMS MAPTMDS MAPTMS 9,000
3-44 MAPTMS MTMDS MTMS MAPTMDS MAPTMS 19,000
3-45 MAPTMS GPTMDS GPTMS MAPTMDS MAPTMS 213,000
상기 실시예 3에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 3, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 4Example 4 : A-B-D 구조 복합 실세스퀴옥산 고분자의 합성: Synthesis of A-B-D Structured Composite Silsesquioxane Polymer
합성단계는 아래와 같이, 연속가수분해 및 축합을 단계적으로 진행하여 A-B-D구조의 복합 고분자를 제조하였으며, 상기 실시예 1에 기재된 방법과 대등한 방법으로 코팅 조성물을 제조하였다.In the synthesis step, a continuous hydrolysis and condensation were carried out step by step to prepare a composite polymer having an A-B-D structure, and a coating composition was prepared by a method similar to that described in Example 1.
[실시예 4-a] 가수분해 및 축합 반응을 위한 촉매의 제조Example 4-a Preparation of Catalysts for Hydrolysis and Condensation Reactions
염기도 조절을 위하여, Tetramethylammonium hydroxide (TMAH) 25 wt% 수용액에 10 wt% Potassium hydroxide (KOH) 수용액을 혼합하여 촉매 1a를 준비하였다.To adjust the basicity, a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
[실시예 4-b] 선형 실세스퀴옥산 구조의 합성 (A-B전구체의 합성)Example 4-b Synthesis of Linear Silsesquioxane Structure (Synthesis of A-B Precursor)
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 40 중량부, 상기 실시예 4-a에서 제조된 촉매 0.5 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 10 중량부를 적가하고, 다시 테트라하이드로류란을 20 중량부 적가하여 2시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, 1H-NMR 분석을 통하여 잔존하는 alkoxy group이 0.1 mmol/g 이하로 잔존하고 있는 선형 실세스퀴옥산을 얻어 내었고, 이는 이후 cage를 연속반응으로 도입하는데 이용되는 부분이다. 선형 구조의 형태 분석은 XRD 분석을 통해 전체적인 구조가 선형구조체임을 확인하였다. 분자량을 측정한 결과, 선형구조의 실세스퀴옥산이 6,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다. To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, 0.5 parts by weight of the catalyst prepared in Example 4-a were added dropwise, followed by stirring at room temperature for 1 hour, and then 2 10 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 20 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 2 hours. The mixed solution was stirred and washed twice to remove the catalyst and impurities, and then filtered, and then linear silsesquioxane containing 0.1 mmol / g or less of the alkoxy group remaining through 1 H-NMR analysis. This was then used to introduce the cage into the continuous reaction. XRD analysis confirmed that the overall structure is a linear structure through the XRD analysis. As a result of measuring the molecular weight, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 6,000 styrene.
1H-NMR (CDCl3) δ 3.7, 3.4, 3.3(broad), 3.1, 2.8, 2.6, 1.5(broad), 0.6. 1 H-NMR (CDCl 3 ) δ 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6.
[실시예 4-c] 사슬 내 cage 구조의 생성을 위한 pH 변환 반응 (B,D 구조의 도입)[Example 4-c] pH conversion reaction for generation of cage structure in chain (introduction of B, D structure)
반응이 진행 중인 실시예 4-b 혼합용액에 0.36 wt% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 DiPhenyltetramethoxydisiloxane 5 중량부를 한번에 적가하여, 1시간 교반 후 실시예 4-a에서 제조된 촉매를 5 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형구조체와는 별도로 cage 형태의 구조체가 생성되어 고분자 사슬에 도입됨을 확인 할 수 있었으며, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합교반 이후, 일부를 적취하여 29Si-NMR 및 1H-NMR 을 통해 분석한 결과 B 구조내에 존재하는 alkoxy group의 양이 0.025 mmol/g으로 변화되어 B 와 D의 반복단위가 약 5:5 비율로 도입되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 10,000으로 측정되었다. 또한, cage형 구조가 도입되었음에도, 고분자의 GPC 형태에서 단독 cage형 물질의 분자량 분포를 찾아볼 수 없으므로, cage구조가 연속반응을 통해 고분자 사슬에 잘 도입되었음을 확인할 수 있었다.To the mixture of Example 4-b in progress, 0.36 wt% HCl aqueous solution was added dropwise very slowly to 5 parts by weight, the pH was adjusted to have acidity, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, 5 parts by weight of DiPhenyltetramethoxydisiloxane was added dropwise, and after stirring for 1 hour, 5 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state. At this time, it could be confirmed that the cage-type structure was formed and introduced into the polymer chain separately from the linear structure. It was made. After 4 hours of mixing, some of the alkoxy groups in the B structure were changed to 0.025 mmol / g as a result of partial extraction and analysis by 29 Si-NMR and 1 H-NMR. It was confirmed that the ratio was introduced at 5: 5. In addition, the styrene reduced molecular weight was measured to 10,000. In addition, although the cage type structure was introduced, the molecular weight distribution of the single cage type material was not found in the GPC form of the polymer, and thus the cage structure was well introduced into the polymer chain through the continuous reaction.
1H-NMR (CDCl3) δ 7.5, 7.2, 3.7, 3.4, 3.3(broad), 3.1, 2.8, 2.6, 1.5(broad), 0.6. 29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)
[실시예 4-d] B 구조내 X도입 (B,D 구조의 도입)[Example 4-d] X introduction into B structure (introduction of B and D structure)
상기 실시예 4-c에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 실시예 4-c에서 얻어진 물질 100 중량부를 50 중량부의 테트라하이드로퓨란에 녹인 후, 5 중량부의 증류수를 넣어 혼합용액을 제조하였다. 이후 제조된 혼합용액에 0.36 wt% HCl 10 중량부를 첨가하고 10분간 교반 후, Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하였다. 24시간 교반 후 실시예 4-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, B 구조의 X 부분에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 5와 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After preparing the organic layer of the resultant obtained in Example 4-c without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 100 parts by weight of the material obtained in Example 4-c was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state. At this time, the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (5). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 4-e] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 4-e] Removal of By-products by Precipitation and Recrystallization, Obtained Result
상기 실시예 4-d에서 반응이 완료된 혼합물에 메틸렌크로라이드 200 중량부를 넣어, 증류수와 함께 분별 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. 200 parts by weight of methylene chloride was added to the mixture in which the reaction was completed in Example 4-d, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum reduction. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 5의 고분자가 여러 부산물 없이 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 12,000의 값을 얻을 수 있었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었으며, 특히 화학식 5의 결과는 다음과 같다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 5 was obtained without various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 12,000, the n value of X was 4-6, the n value of Y was 4-6, in particular in the formula 5 results are as follows.
29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -81.5(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)
또한, 하기 표 4에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 4에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 4 below. In this case, the method used in Example 4 was equally applied.
표 4
실시방법No. 4-b 방법적용 단량체 4-c 방법적용 단량체 4-d 방법적용 단량체 분자량(Mw)
4 ECHETMS PTMDS MTMS 12,000
4-1 PTMS PTMDS PTMS 15,000
4-2 MTMS MTMDS MTMS 16,000
4-3 GPTMS GPTMDS GPTMS 56,000
4-4 MAPTMS MAPTMDS MAPTMS 9,500
4-5 ECHETMS ECHETMDS ECHETMS 7,500
4-6 ECHETMS MTMDS MTMS 16,000
4-7 ECHETMS GPTMDS GPTMS 23,000
4-8 ECHETMS MAPTMDS MAPTMS 9,500
4-9 PTMS ECHETMDS ECHETMS 72,000
4-10 PTMS MTMDS MTMS 68,000
4-11 PTMS GPTMDS GPTMS 11,000
4-12 PTMS MAPTMDS MAPTMS 110,000
4-13 MTMS ECHETMDS ECHETMS 23,000
4-14 MTMS PTMDS PTMS 9,500
4-15 MTMS GPTMDS GPTMS 64,000
4-16 MTMS MAPTMDS MAPTMS 12,000
4-17 GPTMS ECHETMDS ECHETMS 8,000
4-18 GPTMS PTMDS PTMS 451,000
4-19 GPTMS MTMDS MTMS 320,000
4-20 GPTMS MAPTMDS MAPTMS 15,000
4-21 MAPTMS ECHETMDS ECHETMS 45,000
4-22 MAPTMS PTMDS PTMS 351,000
4-23 MAPTMS MTMDS MTMS 14,000
4-24 MAPTMS GPTMDS GPTMS 160,000
Table 4
Method of implementation 4-b method applied monomer 4-c method applied monomer 4-d method applied monomer Molecular Weight (Mw)
4 ECHETMS PTMDS MTMS 12,000
4-1 PTMS PTMDS PTMS 15,000
4-2 MTMS MTMDS MTMS 16,000
4-3 GPTMS GPTMDS GPTMS 56,000
4-4 MAPTMS MAPTMDS MAPTMS 9,500
4-5 ECHETMS ECHETMDS ECHETMS 7,500
4-6 ECHETMS MTMDS MTMS 16,000
4-7 ECHETMS GPTMDS GPTMS 23,000
4-8 ECHETMS MAPTMDS MAPTMS 9,500
4-9 PTMS ECHETMDS ECHETMS 72,000
4-10 PTMS MTMDS MTMS 68,000
4-11 PTMS GPTMDS GPTMS 11,000
4-12 PTMS MAPTMDS MAPTMS 110,000
4-13 MTMS ECHETMDS ECHETMS 23,000
4-14 MTMS PTMDS PTMS 9,500
4-15 MTMS GPTMDS GPTMS 64,000
4-16 MTMS MAPTMDS MAPTMS 12,000
4-17 GPTMS ECHETMDS ECHETMS 8,000
4-18 GPTMS PTMDS PTMS 451,000
4-19 GPTMS MTMDS MTMS 320,000
4-20 GPTMS MAPTMDS MAPTMS 15,000
4-21 MAPTMS ECHETMDS ECHETMS 45,000
4-22 MAPTMS PTMDS PTMS 351,000
4-23 MAPTMS MTMDS MTMS 14,000
4-24 MAPTMS GPTMDS GPTMS 160,000
상기 실시예 4에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 4 to prepare a coating composition mutatis mutandis Example 1-d and then coated and cured on a PC substrate as in Example 1-e to absorb blue light A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 5Example 5 : D-A-B-D 구조 복합 실세스퀴옥산 고분자의 합성: Synthesis of D-A-B-D Structured Composite Silsesquioxane Polymer
D-A-B-D구조의 복합 고분자를 제조하기 위하여 아래의 방법을 이용하였으며, 상기 실시예 1과 대등한 방법으로 코팅 조성물을 제조하였다.The following method was used to prepare a composite polymer having a D-A-B-D structure, and a coating composition was prepared by the same method as in Example 1.
[실시예 5-a] D구조의 과량 생성을 위한 pH 변환 반응 (B,D 구조의 도입)Example 5-a pH Conversion Reaction for Excess Production of D Structure (Introduction of B, D Structure)
반응이 진행 중인 실시예 4-b 혼합용액에 0.36 wt% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 Diphenyltetramethoxydisiloxane의 양을 실시예 4-b의 5배인 25 중량부로 준비하여 한번에 적가하고, 1시간 교반 후 실시예 1-a에서 제조된 촉매를 5 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 반응 완료 후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합교반 이후, 일부를 적취하여 29Si-NMR 및 1H-NMR 을 통해 분석한 결과 B 구조내에 존재하는 alkoxy group의 양이 0.012 mmol/g으로 변화되고 B 와 D의 반복단위가 약 1:9 비율로 도입되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 24,000으로 측정되었다. 또한, cage형 구조가 도입되었음에도, 고분자의 GPC 형태에서 단독 cage형 물질의 분자량 분포를 찾아볼 수 없으므로, cage구조가 연속반응을 통해 고분자 사슬에 잘 도입되었음을 확인할 수 있었다.To the mixture of Example 4-b in progress, 0.36 wt% HCl aqueous solution was added dropwise very slowly to 5 parts by weight, the pH was adjusted to have acidity, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, the amount of diphenyltetramethoxydisiloxane was prepared by adding 5 parts by weight to 25 parts by weight, which is 5 times the amount of Example 4-b, and after stirring for 1 hour, 5 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic pH of the mixed solution. Was adjusted. After completion of the reaction, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in vacuo so that the entire reactant was converted into an aqueous solution mixture. After 4 hours of mixing, some of them were collected and analyzed by 29 Si-NMR and 1 H-NMR. The amount of alkoxy groups in the B structure was changed to 0.012 mmol / g and the repeating units of B and D were about It was confirmed that the 1: 9 ratio was introduced. In addition, styrene conversion molecular weight was measured as 24,000. In addition, although the cage type structure was introduced, the molecular weight distribution of the single cage type material was not found in the GPC form of the polymer, and thus the cage structure was well introduced into the polymer chain through the continuous reaction.
1H-NMR (CDCl3) δ 7.5, 7.2, 3.7, 3.4, 3.3(broad), 3.1, 2.8, 2.6, 1.5(broad), 0.6. 29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)
[실시예 5-b] B 구조내 X도입 (B,D 구조의 도입)[Example 5-b] X Introduction in B Structure (Introduction of B, D Structure)
상기 실시예 5-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 실시예 5-a에서 얻어진 물질 100 중량부를 50 중량부의 테트라하이드로퓨란에 녹인 후, 5 중량부의 증류수를 넣어 혼합용액을 제조하였다. 이후 제조된 혼합용액에 0.36 wt% HCl 10 중량부를 첨가하고 10분간 교반 후, Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하였다. 24시간 교반 후 실시예 4-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, B 구조의 X 부분에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 6과 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After the organic layer of the resultant obtained in Example 5-a was prepared without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 100 parts by weight of the material obtained in Example 5-a was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was added again to adjust the pH of the mixed solution in a basic state. At this time, the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in formula (6). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 5-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 5-c] Removal of By-products by Precipitation and Recrystallization
상기 실시예 5-b에서 반응이 완료된 혼합물에 메틸렌크로라이드 200 중량부를 넣어, 증류수와 함께 분별 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. 200 parts by weight of methylene chloride was added to the mixture in which the reaction was completed in Example 5-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum pressure. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 6의 고분자가 여러 부산물 없이 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 16,000의 값을 얻을 수 있었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 6 was obtained without various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 16,000, the n value of X was 4-6, the n value of Y was 4-6.
29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -81.5(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)
또한, 하기 표 5에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 5에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 5 below. At this time, the manufacturing method was equally applied to the method used in Example 5.
표 5
실시방법No. 4-b 방법적용 단량체 4-a 방법적용 단량체 5-b 방법적용 단량체 분자량(Mw)
2 ECHETMS PTMDS MTMS 16,000
5-1 PTMS PTMDS PTMS 19,000
5-2 MTMS MTMDS MTMS 20,000
5-3 GPTMS GPTMDS GPTMS 63,000
5-4 MAPTMS MAPTMDS MAPTMS 12,000
5-5 ECHETMS ECHETMDS ECHETMS 14,500
5-6 ECHETMS MTMDS MTMS 19,000
5-7 ECHETMS GPTMDS GPTMS 25,000
5-8 ECHETMS MAPTMDS MAPTMS 11,500
5-9 PTMS ECHETMDS ECHETMS 78,000
5-10 PTMS MTMDS MTMS 79,000
5-11 PTMS GPTMDS GPTMS 15,000
5-12 PTMS MAPTMDS MAPTMS 124,000
5-13 MTMS ECHETMDS ECHETMS 30,000
5-14 MTMS PTMDS PTMS 12,000
5-15 MTMS GPTMDS GPTMS 64,000
5-16 MTMS MAPTMDS MAPTMS 13,000
5-17 GPTMS ECHETMDS ECHETMS 12,000
5-18 GPTMS PTMDS PTMS 631,000
5-19 GPTMS MTMDS MTMS 421,000
5-20 GPTMS MAPTMDS MAPTMS 18,000
5-21 MAPTMS ECHETMDS ECHETMS 65,000
2-22 MAPTMS PTMDS PTMS 425,000
5-23 MAPTMS MTMDS MTMS 25,000
5-24 MAPTMS GPTMDS GPTMS 213,000
Table 5
Method of implementation 4-b method applied monomer 4-a method applied monomer 5-b method applied monomer Molecular Weight (Mw)
2 ECHETMS PTMDS MTMS 16,000
5-1 PTMS PTMDS PTMS 19,000
5-2 MTMS MTMDS MTMS 20,000
5-3 GPTMS GPTMDS GPTMS 63,000
5-4 MAPTMS MAPTMDS MAPTMS 12,000
5-5 ECHETMS ECHETMDS ECHETMS 14,500
5-6 ECHETMS MTMDS MTMS 19,000
5-7 ECHETMS GPTMDS GPTMS 25,000
5-8 ECHETMS MAPTMDS MAPTMS 11,500
5-9 PTMS ECHETMDS ECHETMS 78,000
5-10 PTMS MTMDS MTMS 79,000
5-11 PTMS GPTMDS GPTMS 15,000
5-12 PTMS MAPTMDS MAPTMS 124,000
5-13 MTMS ECHETMDS ECHETMS 30,000
5-14 MTMS PTMDS PTMS 12,000
5-15 MTMS GPTMDS GPTMS 64,000
5-16 MTMS MAPTMDS MAPTMS 13,000
5-17 GPTMS ECHETMDS ECHETMS 12,000
5-18 GPTMS PTMDS PTMS 631,000
5-19 GPTMS MTMDS MTMS 421,000
5-20 GPTMS MAPTMDS MAPTMS 18,000
5-21 MAPTMS ECHETMDS ECHETMS 65,000
2-22 MAPTMS PTMDS PTMS 425,000
5-23 MAPTMS MTMDS MTMS 25,000
5-24 MAPTMS GPTMDS GPTMS 213,000
상기 실시예 5에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 5, the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 6Example 6 : 실세스퀴옥산 E-A-B-D 구조 복합 고분자의 합성: Synthesis of Silsesquioxane E-A-B-D Structured Composite Polymer
E-A-B-D구조의 복합 고분자를 제조하기 위하여 아래의 방법을 이용하였으며, 상기 실시예 1과 대등한 방법으로 코팅 조성물을 제조하였다.To prepare a composite polymer having an E-A-B-D structure, the following method was used, and a coating composition was prepared by the same method as in Example 1.
[실시예 6-a] 사슬 말단 E구조의 생성Example 6-a Generation of Chain Terminal E Structure
실시예 4-c 에서 얻어진 혼합물에 별도의 정제 없이 메틸렌크로라이드 20 중량부를 적가하고, 0.36 중량% HCl 수용액을 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 dimethyltetramethoxysilane 1 중량부를 한번에 적가하였다. 이때, 아직 분자구조 내에서 가수분해되지 않고 존재하던 부분들이 용매와 분리된 산성 수용액 층에서 가수분해물로 쉽게 변환되며, 생성된 별도의 반응물과 유기용매 층에서 축합되어 말단단위에 E가 도입되었다. 5시간의 교반 후, 반응의 교반을 정지하고 상온으로 반응기의 온도를 조절 하였다. 20 parts by weight of methylene chloride was added dropwise to the mixture obtained in Example 4-c, 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, the pH was adjusted to have an acidity, and 30 minutes at a temperature of 4 ° C. Stirred. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
[실시예 6-b] B구조 및 말단 E 구조의 X에 cage 도입[Example 6-b] Cage introduction into X of B structure and terminal E structure
상기 실시예 6-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 반응이 진행 중인 실시예 6-a 혼합용액에 Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 24시간 교반 후 실시예 1-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, E 구조 말단에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 7과 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After the organic layer of the resultant obtained in Example 6-a was prepared without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 6-a in progress at a time to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer as shown in the formula (7). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 6-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 6-c] Removal of By-products by Precipitation and Recrystallization
상기 실시예 6-b에서 반응이 완료된 혼합물을 얻어낸 후, 증류수를 이용하여 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. In Example 6-b, the reaction mixture was obtained, washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 7의 고분자를 여러 부산물과 함께 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 21,000의 값을 얻을 수 있었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Chemical Formula 7 was obtained along with various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 21,000, n value of X was 4-6, n value of Y was 4-6.
29Si-NMR (CDCl3) δ -68.2, -71.8(sharp). -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ −68.2, −71.8 (sharp). -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
또한, 하기 표 6에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 6에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer was prepared by applying the monomers described in Table 6 below. At this time, the manufacturing method was equally applied to the method used in Example 6.
표 6
실시방법No. 4-b 방법적용 단량체 4-c 방법적용 단량체 6-a방법적용 단량체 6-b방법적용단량체 Mw
6 ECHETMS PTMDS MTMDS MAPTMS 21,000
6-1 ECHETMS ECHETMDS ECHETMDS ECHETMS 18,000
6-2 PTMS PTMDS PTMDS PTMS 19,000
6-3 MTMS MTMDS MTMDS MTMS 31,000
6-4 GPTMS ECHETMDS GPTMDS GPTMS 63,000
6-5 MAPTMS MAPTMDS MAPTMDS MAPTMS 125,000
6-6 ECHETMS ECHETMDS PTMDS PTMS 18,000
6-7 ECHETMS ECHETMDS MTMDS MTMS 14,000
6-8 ECHETMS ECHETMDS GPTMDS GPTMS 20,000
6-9 ECHETMS ECHETMDS MAPTMDS MAPTMS 91,000
6-10 ECHETMS PTMDS ECHETMDS ECHETMS 18,000
6-11 ECHETMS MTMDS ECHETMDS ECHETMS 121,000
6-12 ECHETMS GPTMDS ECHETMDS ECHETMS 80,000
6-13 ECHETMS MAPTMDS ECHETMDS ECHETMS 112,000
6-14 PTMS PTMDS ECHETMDS ECHETMS 35,000
6-15 PTMS PTMDS MTMDS MTMS 91,000
6-16 PTMS PTMDS ECHETMDS ECHETMS 45,000
6-17 PTMS PTMDS MAPTMDS MAPTMS 75,000
6-18 PTMS ECHETMDS PTMDS PTMS 140,000
6-19 PTMS MTMDS PTMDS PTMS 220,000
6-20 PTMS GPTMDS PTMDS PTMS 51,000
6-21 PTMS MAPTMDS PTMDS PTMS 73,000
6-22 MTMS MTMDS ECHETMDS ECHETMS 69,000
6-23 MTMS MTMDS PTMDS PTMS 51,000
6-24 MTMS MTMDS GPTMDS GPTMS 91,000
6-25 MTMS MTMDS MAPTMDS MAPTMS 128,000
6-26 MTMS ECHETMDS MTMDS MTMS 68,000
6-27 MTMS PTMDS MTMDS MTMS 45,000
6-28 MTMS GPTMDS MTMDS MTMS 265,000
6-29 MTMS MAPTMDS MTMDS MTMS 105,000
6-30 GPTMS GPTMDS ECHETMDS ECHETMS 101,000
6-31 GPTMS GPTMDS PTMDS PTMS 95,000
6-32 GPTMS GPTMDS MTMDS MTMS 73,000
6-33 GPTMS GPTMDS MAPTMDS MAPTMS 51,000
6-34 GPTMS ECHETMDS GPTMDS GPTMS 31,000
6-35 GPTMS PTMDS GPTMDS GPTMS 315,000
6-36 GPTMS MTMDS GPTMDS GPTMS 125,000
6-37 GPTMS MAPTMDS GPTMDS GPTMS 45,000
6-38 MAPTMS MAPTMDS ECHETMDS ECHETMS 94,000
6-39 MAPTMS MAPTMDS PTMDS PTMS 35,000
6-40 MAPTMS MAPTMDS MTMDS MTMS 80,000
6-41 MAPTMS MAPTMDS GPTMDS GPTMS 83,000
6-42 MAPTMS ECHETMDS MAPTMDS MAPTMS 74,000
6-43 MAPTMS PTMDS MAPTMDS MAPTMS 10,000
6-44 MAPTMS MTMDS MAPTMDS MAPTMS 65,000
6-45 MAPTMS GPTMDS MAPTMDS MAPTMS 418,000
Table 6
Method of implementation 4-b method applied monomer 4-c method applied monomer 6-a method applied monomer 6-b method applied monomer Mw
6 ECHETMS PTMDS MTMDS MAPTMS 21,000
6-1 ECHETMS ECHETMDS ECHETMDS ECHETMS 18,000
6-2 PTMS PTMDS PTMDS PTMS 19,000
6-3 MTMS MTMDS MTMDS MTMS 31,000
6-4 GPTMS ECHETMDS GPTMDS GPTMS 63,000
6-5 MAPTMS MAPTMDS MAPTMDS MAPTMS 125,000
6-6 ECHETMS ECHETMDS PTMDS PTMS 18,000
6-7 ECHETMS ECHETMDS MTMDS MTMS 14,000
6-8 ECHETMS ECHETMDS GPTMDS GPTMS 20,000
6-9 ECHETMS ECHETMDS MAPTMDS MAPTMS 91,000
6-10 ECHETMS PTMDS ECHETMDS ECHETMS 18,000
6-11 ECHETMS MTMDS ECHETMDS ECHETMS 121,000
6-12 ECHETMS GPTMDS ECHETMDS ECHETMS 80,000
6-13 ECHETMS MAPTMDS ECHETMDS ECHETMS 112,000
6-14 PTMS PTMDS ECHETMDS ECHETMS 35,000
6-15 PTMS PTMDS MTMDS MTMS 91,000
6-16 PTMS PTMDS ECHETMDS ECHETMS 45,000
6-17 PTMS PTMDS MAPTMDS MAPTMS 75,000
6-18 PTMS ECHETMDS PTMDS PTMS 140,000
6-19 PTMS MTMDS PTMDS PTMS 220,000
6-20 PTMS GPTMDS PTMDS PTMS 51,000
6-21 PTMS MAPTMDS PTMDS PTMS 73,000
6-22 MTMS MTMDS ECHETMDS ECHETMS 69,000
6-23 MTMS MTMDS PTMDS PTMS 51,000
6-24 MTMS MTMDS GPTMDS GPTMS 91,000
6-25 MTMS MTMDS MAPTMDS MAPTMS 128,000
6-26 MTMS ECHETMDS MTMDS MTMS 68,000
6-27 MTMS PTMDS MTMDS MTMS 45,000
6-28 MTMS GPTMDS MTMDS MTMS 265,000
6-29 MTMS MAPTMDS MTMDS MTMS 105,000
6-30 GPTMS GPTMDS ECHETMDS ECHETMS 101,000
6-31 GPTMS GPTMDS PTMDS PTMS 95,000
6-32 GPTMS GPTMDS MTMDS MTMS 73,000
6-33 GPTMS GPTMDS MAPTMDS MAPTMS 51,000
6-34 GPTMS ECHETMDS GPTMDS GPTMS 31,000
6-35 GPTMS PTMDS GPTMDS GPTMS 315,000
6-36 GPTMS MTMDS GPTMDS GPTMS 125,000
6-37 GPTMS MAPTMDS GPTMDS GPTMS 45,000
6-38 MAPTMS MAPTMDS ECHETMDS ECHETMS 94,000
6-39 MAPTMS MAPTMDS PTMDS PTMS 35,000
6-40 MAPTMS MAPTMDS MTMDS MTMS 80,000
6-41 MAPTMS MAPTMDS GPTMDS GPTMS 83,000
6-42 MAPTMS ECHETMDS MAPTMDS MAPTMS 74,000
6-43 MAPTMS PTMDS MAPTMDS MAPTMS 10,000
6-44 MAPTMS MTMDS MAPTMDS MAPTMS 65,000
6-45 MAPTMS GPTMDS MAPTMDS MAPTMS 418,000
상기 실시예 6에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 6, the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 7Example 7 : 실세스퀴옥산 A-B-A-D 구조 복합 고분자의 합성Synthesis of Silsesquioxane A-B-A-D Structured Polymer
합성단계는 아래와 같이, 연속가수분해 및 축합을 단계적으로 진행하였으며, 상기 실시예 1과 대등한 방법으로 코팅 조성물을 제조하였다.Synthesis step was carried out step by step, hydrolysis and condensation step by step, to prepare a coating composition in the same manner as in Example 1.
[실시예 7-a] 촉매의 제조Example 7-a Preparation of Catalyst
염기도 조절을 위하여, Tetramethylammonium hydroxide (TMAH) 25 중량% 수용액에 10 중량% Potassium hydroxide (KOH) 수용액을 혼합하여 촉매 1a를 준비하였다.In order to adjust the basicity, a catalyst 1a was prepared by mixing 10 wt% aqueous Potassium hydroxide (KOH) solution with 25 wt% aqueous tetramethylammonium hydroxide (TMAH).
[실시예 7-b] 선형 실세스퀴옥산 합성 (A 전구체)Example 7-b Linear Silsesquioxane Synthesis (A Precursor)
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 15 중량부, 상기 실시예 7-a에서 제조된 촉매 1 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 20 중량부를 적가하고, 다시 테트라하이드로류란을 15 중량부 적가하여 5시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, IR 분석을 통하여 말단기에 생성된 SI-OH 관능기를 확인할 수 있었으며(3200 cm-1), 분자량을 측정한 결과, 선형구조의 실세스퀴옥산이 6,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다.To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, 1 part by weight of the catalyst prepared in Example 7-a was added dropwise, and stirred at room temperature for 1 hour, followed by 2 20 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 15 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 5 hours. The mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 6,000 styrene.
[실시예 7-c] 선형 실세스퀴옥산 구조의 합성 (A-B전구체의 합성)Example 7-c Synthesis of Linear Silsesquioxane Structures (Synthesis of A-B Precursors)
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 40 중량부, 상기 실시예 7-a에서 제조된 촉매 0.5 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 10 중량부를 적가하고, 다시 테트라하이드로류란을 20 중량부 적가하여 2시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, 1H-NMR 분석을 통하여 잔존하는 alkoxy group이 0.1 mmol/g 이하로 잔존하고 있는 선형 실세스퀴옥산을 얻어 내었고, 이는 이후 cage를 연속반응으로 도입하는데 이용되는 부분이다. 선형 구조의 형태 분석은 XRD 분석을 통해 전체적인 구조가 선형구조체임을 확인하였다. 분자량을 측정한 결과, 선형구조의 실세스퀴옥산이 8,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다. To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, 0.5 parts by weight of the catalyst prepared in Example 7-a were added dropwise, followed by stirring at room temperature for 1 hour, and then 2 10 parts by weight of-(3,4-epoxycyclohexyl) ethyltrimethoxysilane was added dropwise, and 20 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 2 hours. The mixed solution was stirred and washed twice to remove the catalyst and impurities, and then filtered, and then linear silsesquioxane containing 0.1 mmol / g or less of the alkoxy group remaining through 1 H-NMR analysis. This was then used to introduce the cage into the continuous reaction. XRD analysis confirmed that the overall structure is a linear structure through the XRD analysis. As a result of measuring the molecular weight, it was confirmed that the silsesquioxane having a linear structure had a molecular weight in terms of 8,000 styrene.
[실시예 7-d] 선형 실세스퀴옥산 구조의 합성 (A-B-A전구체의 합성)Example 7-d Synthesis of Linear Silsesquioxane Structure (Synthesis of A-B-A Precursor)
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 5 중량부, 제조된 실시예 7-a 촉매를 10 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 실시예 7-b 전구체와 7-c 전구체를 20 중량부씩 각각 적가하고, 다시 테트라하이드로류란을 10 중량부 적가하여 24시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, IR 분석을 통하여 말단기에 생성된 SI-OH 관능기를 확인할 수 있었으며(3200 cm-1), 분자량을 측정한 결과, 선형구조의 실세스퀴옥산이 15,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다.To a dried flask equipped with a cooling tube and a stirrer, 5 parts by weight of distilled water, 5 parts by weight of tetrahydrofuran, and 10 parts by weight of the prepared Example 7-a catalyst were added dropwise, followed by stirring at room temperature for 1 hour. 20 parts by weight of the 7-b precursor and the 7-c precursor were added dropwise, and 10 parts by weight of tetrahydroleuran was added dropwise thereto, followed by further stirring for 24 hours. The mixed solution during stirring was collected and washed twice to remove the catalyst and impurities, and after filtering, the SI-OH functional group formed at the terminal group was confirmed by IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that the silsesquioxane having a linear structure had a molecular weight of 15,000 styrene.
1H-NMR (CDCl3) δ 3.7, 3.4, 3.3(broad), 3.1, 2.8, 2.6, 1.5(broad), 0.6. 1 H-NMR (CDCl 3 ) δ 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6.
[실시예 7-e] 연속적 cage 구조의 생성 (D 구조의 도입)Example 7-e Generation of Continuous Cage Structure (Introduction of D Structure)
상기 실시예 7-d 혼합용액에 0.36 중량% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 Diphenyltetramethoxydisiloxane 5 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 1시간 교반 후 실시예 7-a에서 제조된 촉매를 7 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형고분자와는 별도로 alkoxy가 열려있는 D구조의 전구체가 형성된다. 소량의 샘플을 적취하여, H-NMR과 IR로 분석하여 methoxy의 잔존율을 확인한 후, 잔존율이 10% 일 때, 0.36 중량% HCl 수용액을 10 중량부 천천히 적가하여, pH를 산성으로 조절해 주었다. 이후 Phenyltrimethoxysilane 1 중량부를 한번에 적가하여 15분간 교반 후, 1-a에서 제조된 촉매 20 중량부를 첨가하였다. 4시간의 혼합교반 이후, 확인결과 고분자내에 cage 형태의 고분자가 생성됨을 확인 할 수 있었다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합 교반 이후, 일부를 적취하여 29Si-NMR을 통해 분석한 결과 phenyl기를 이용해 도입된 구조의 분석피크가 날카로운 형태의 2개로 나타나고 별도로 잔존하는 부산물 없이 고분자가 제조되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 18,000으로 측정되었다.To the mixed solution of Example 7-d 0.36% by weight of HCl solution was added very slowly 5 parts by weight, the pH was adjusted to have an acid, and stirred at a temperature of 4 30 minutes. Thereafter, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise at a time to achieve stable hydrolysis. After stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state. At this time, a precursor of the D structure in which alkoxy is opened is formed separately from the linear polymer. A small amount of sample was taken and analyzed by H-NMR and IR to confirm the residual ratio of methoxy. When the residual ratio was 10%, 10 parts by weight of 0.36 wt% aqueous HCl solution was slowly added dropwise to adjust the pH to acidic. gave. Thereafter, 1 part by weight of Phenyltrimethoxysilane was added dropwise at a time, stirred for 15 minutes, and then 20 parts by weight of the catalyst prepared in 1-a was added. After 4 hours of mixing and stirring, it was confirmed that cage type polymer was formed in the polymer. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in vacuo so that the entire reactant was converted into an aqueous solution mixture. After 4 hours of mixing and agitation, a portion was taken and analyzed by 29 Si-NMR, and the analysis peak of the structure introduced using the phenyl group appeared as two sharp forms, and it was confirmed that the polymer was prepared without any remaining by-products. In addition, styrene conversion molecular weight was measured as 18,000.
29Si-NMR (CDCl3) δ -68.2, -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ -68.2, -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
[실시예 7-f] B 구조내 X도입 (A-B-A-D구조의 완성)[Example 7-f] X introduction in B structure (completion of A-B-A-D structure)
상기 실시예 7-e에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 실시예 7-e에서 얻어진 물질 100 중량부를 50 중량부의 테트라하이드로퓨란에 녹인후, 5 중량부의 증류수를 넣어 혼합용액을 제조하였다. 이후 제조된 혼합용액에 0.36 wt% HCl 10 중량부를 첨가하고 10분간 교반 후, Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하였다. 24시간 교반 후 실시예 7-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, B 구조의 X 부분에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After preparing the organic layer of the resultant obtained in Example 7-e without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 100 parts by weight of the material obtained in Example 7-e was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state. At this time, the cage-shaped polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer. However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 7-g] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 7-g] Removal of by-products by precipitation and recrystallization, yield of the result
상기 실시예 7-f에서 반응이 완료된 혼합물에 메틸렌크로라이드 200 중량부를 넣어, 증류수와 함께 분별 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. 200 parts by weight of methylene chloride was added to the mixture in which the reaction was completed in Example 7-f, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum reduction. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 고분자가 여러 부산물 없이 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 24,000의 값이었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer was obtained without various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was a styrene conversion value of 24,000, the n value of X was 4-6, the n value of Y was 4-6.
또한, 하기 표 7에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 7에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer was prepared by applying the monomers described in Table 7 below. At this time, the manufacturing method was equally applied to the method used in Example 7.
표 7
실시방법No. 7-b,c 방법적용 단량체 7-e 방법적용 단량체 7-f 방법적용 단량체 분자량(Mw)
7 ECHETMS PTMDS MTMS 24,000
7-1 PTMS PTMDS PTMS 11,000
7-2 MTMS MTMDS MTMS 13,000
7-3 GPTMS GPTMDS GPTMS 23,000
7-4 MAPTMS MAPTMDS MAPTMS 14,500
7-5 ECHETMS ECHETMDS ECHETMS 12,500
7-6 ECHETMS MTMDS MTMS 53,000
7-7 ECHETMS GPTMDS GPTMS 11,000
7-8 ECHETMS MAPTMDS MAPTMS 9,000
7-9 PTMS ECHETMDS ECHETMS 48,000
7-10 PTMS MTMDS MTMS 90,000
7-11 PTMS GPTMDS GPTMS 32,000
7-12 PTMS MAPTMDS MAPTMS 150,000
7-13 MTMS ECHETMDS ECHETMS 17,000
7-14 MTMS PTMDS PTMS 38,500
7-15 MTMS GPTMDS GPTMS 15,000
7-16 MTMS MAPTMDS MAPTMS 17,000
7-17 GPTMS ECHETMDS ECHETMS 6,000
7-18 GPTMS PTMDS PTMS 18,000
7-19 GPTMS MTMDS MTMS 457,000
7-20 GPTMS MAPTMDS MAPTMS 16,000
7-21 MAPTMS ECHETMDS ECHETMS 97,000
7-22 MAPTMS PTMDS PTMS 951,000
7-23 MAPTMS MTMDS MTMS 15,000
7-24 MAPTMS GPTMDS GPTMS 12,000
TABLE 7
Method of implementation 7-b, c method applied monomer 7-e method applied monomer 7-f method applied monomer Molecular Weight (Mw)
7 ECHETMS PTMDS MTMS 24,000
7-1 PTMS PTMDS PTMS 11,000
7-2 MTMS MTMDS MTMS 13,000
7-3 GPTMS GPTMDS GPTMS 23,000
7-4 MAPTMS MAPTMDS MAPTMS 14,500
7-5 ECHETMS ECHETMDS ECHETMS 12,500
7-6 ECHETMS MTMDS MTMS 53,000
7-7 ECHETMS GPTMDS GPTMS 11,000
7-8 ECHETMS MAPTMDS MAPTMS 9,000
7-9 PTMS ECHETMDS ECHETMS 48,000
7-10 PTMS MTMDS MTMS 90,000
7-11 PTMS GPTMDS GPTMS 32,000
7-12 PTMS MAPTMDS MAPTMS 150,000
7-13 MTMS ECHETMDS ECHETMS 17,000
7-14 MTMS PTMDS PTMS 38,500
7-15 MTMS GPTMDS GPTMS 15,000
7-16 MTMS MAPTMDS MAPTMS 17,000
7-17 GPTMS ECHETMDS ECHETMS 6,000
7-18 GPTMS PTMDS PTMS 18,000
7-19 GPTMS MTMDS MTMS 457,000
7-20 GPTMS MAPTMDS MAPTMS 16,000
7-21 MAPTMS ECHETMDS ECHETMS 97,000
7-22 MAPTMS PTMDS PTMS 951,000
7-23 MAPTMS MTMDS MTMS 15,000
7-24 MAPTMS GPTMDS GPTMS 12,000
상기 실시예 7에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 7, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 8Example 8 : D-A-B-A-D 구조 복합 실세스퀴옥산 고분자의 합성: Synthesis of D-A-B-A-D Structured Composite Silsesquioxane Polymers
D-A-B-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였으며, 상기 실시예 1과 대등한 방법으로 코팅 조성물을 제조하였다.In order to prepare a composite polymer having a D-A-B-A-D structure, the following examples were used, and a coating composition was prepared by the same method as in Example 1.
[실시예 8-a] D구조의 과량 생성을 위한 pH 변환 반응 Example 8-a pH Conversion Reaction for Excess Production of D Structure
반응이 진행 중인 실시예 7-d 혼합용액에 0.36 wt% HCl 수용액을 매우 천천히 15 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 Diphenyltetramethoxydisiloxane의 양을 실시예 7-e의 5배인 25 중량부로 준비하여 한번에 적가하고, 1시간 교반 후 실시예 7-a에서 제조된 촉매를 20 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 반응 완료 후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합교반 이후, 일부를 적취하여 29Si-NMR 및 1H-NMR 을 통해 분석한 결과 B 구조내에 존재하는 alkoxy group의 양이 0.006 mmol/g으로 변화되고 B 와 D의 반복단위가 약 5:5 비율로 도입되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 32,000으로 측정되었다. 또한, cage형 구조가 도입되었음에도, 고분자의 GPC 형태에서 단독 cage형 물질의 분자량 분포를 찾아볼 수 없으므로, cage구조가 연속반응을 통해 고분자 사슬에 잘 도입되었음을 확인할 수 있었다.15 parts by weight of 0.36 wt% HCl aqueous solution was added dropwise very slowly to the mixed solution of Example 7-d, which was adjusted to have an acidic pH, and stirred at a temperature of 4 ° C. for 30 minutes. Thereafter, the amount of diphenyltetramethoxydisiloxane was prepared by adding 25 parts by weight, which is 5 times the amount of Example 7-e, and added dropwise at once, and after stirring for 1 hour, 20 parts by weight of the catalyst prepared in Example 7-a was added again to give a basic pH of the mixed solution. Was adjusted. After completion of the reaction, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in vacuo so that the entire reactant was converted into an aqueous solution mixture. After 4 hours of mixing, some of them were collected and analyzed by 29 Si-NMR and 1 H-NMR. The amount of alkoxy groups in the B structure was changed to 0.006 mmol / g and the repeating units of B and D were about It was confirmed that the ratio was introduced at 5: 5. In addition, styrene conversion molecular weight was measured as 32,000. In addition, although the cage type structure was introduced, the molecular weight distribution of the single cage type material was not found in the GPC form of the polymer, and thus the cage structure was well introduced into the polymer chain through the continuous reaction.
1H-NMR (CDCl3) δ 7.5, 7.2, 3.7, 3.4, 3.3(broad), 3.1, 2.8, 2.6, 1.5(broad), 0.6. 29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)
[실시예 8-b] B 구조내 X도입Example 8-b Introducing X in B Structure
상기 실시예 8-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 실시예 8-a에서 얻어진 물질 100 중량부를 50 중량부의 테트라하이드로퓨란에 녹인 후, 5 중량부의 증류수를 넣어 혼합용액을 제조하였다. 이후 제조된 혼합용액에 0.36 wt% HCl 10 중량부를 첨가하고 10분간 교반 후, Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하였다. 24시간 교반 후 실시예 7-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, B 구조의 X 부분에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 9와 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After preparing the organic layer of the resultant obtained in Example 8-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 100 parts by weight of the material obtained in Example 8-a was dissolved in 50 parts by weight of tetrahydrofuran, and then 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% HCl was added to the prepared solution, followed by stirring for 10 minutes, and then 3 parts by weight of Methyltrimethoxysilane were added dropwise at once to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to adjust the pH of the mixed solution in a basic state. At this time, the cage-type polymer is introduced to the X portion of the B structure, the reaction proceeds continuously in the reactor to form a polymer as shown in formula (9). However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 8-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 8-c] Removal of By-products by Precipitation and Recrystallization
상기 실시예 8-b에서 반응이 완료된 혼합물에 메틸렌크로라이드 200 중량부를 넣어, 증류수와 함께 분별 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. 200 parts by weight of methylene chloride was added to the mixture in which the reaction was completed in Example 8-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum reduction. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 9의 고분자가 여러 부산물 없이 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 36,000의 값을 얻을 수 있었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Formula 9 was obtained without various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 36,000, the n value of X was 4-6, the n value of Y was 4-6.
29Si-NMR (CDCl3) δ -72.5(broad), -81.1(sharp), -80.8(sharp), -79.9(sharp), -81.5(sharp), -82.5(broad) 29 Si-NMR (CDCl 3 ) δ -72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)
또한, 하기 표 8에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자 및 코팅 조성물을 제조하였다. 이때 제조 방법은 상기 실시예 8에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer and the coating composition were prepared by applying the monomers described in Table 8 below. At this time, the manufacturing method was equally applied to the method used in Example 8.
표 8
실시방법No. 7-b,c 방법적용 단량체 8-a 방법적용 단량체 8-b 방법적용 단량체 분자량(Mw)
8 ECHETMS PTMDS MTMS 36,000
8-1 PTMS PTMDS PTMS 14,000
8-2 MTMS MTMDS MTMS 18,000
8-3 GPTMS GPTMDS GPTMS 27,000
8-4 MAPTMS MAPTMDS MAPTMS 19,500
8-5 ECHETMS ECHETMDS ECHETMS 19,500
8-6 ECHETMS MTMDS MTMS 58,000
8-7 ECHETMS GPTMDS GPTMS 19,000
8-8 ECHETMS MAPTMDS MAPTMS 12,000
8-9 PTMS ECHETMDS ECHETMS 53,000
8-10 PTMS MTMDS MTMS 113,000
8-11 PTMS GPTMDS GPTMS 42,000
8-12 PTMS MAPTMDS MAPTMS 173,000
8-13 MTMS ECHETMDS ECHETMS 19,000
8-14 MTMS PTMDS PTMS 45,000
8-15 MTMS GPTMDS GPTMS 32,000
8-16 MTMS MAPTMDS MAPTMS 34,000
8-17 GPTMS ECHETMDS ECHETMS 12,000
8-18 GPTMS PTMDS PTMS 24,000
8-19 GPTMS MTMDS MTMS 486,000
8-20 GPTMS MAPTMDS MAPTMS 32,000
8-21 MAPTMS ECHETMDS ECHETMS 181,000
8-22 MAPTMS PTMDS PTMS 981,000
8-23 MAPTMS MTMDS MTMS 21,000
8-24 MAPTMS GPTMDS GPTMS 20,000
Table 8
Method of implementation 7-b, c method applied monomer 8-a Method Applicable Monomer 8-b Method Applicable Monomer Molecular Weight (Mw)
8 ECHETMS PTMDS MTMS 36,000
8-1 PTMS PTMDS PTMS 14,000
8-2 MTMS MTMDS MTMS 18,000
8-3 GPTMS GPTMDS GPTMS 27,000
8-4 MAPTMS MAPTMDS MAPTMS 19,500
8-5 ECHETMS ECHETMDS ECHETMS 19,500
8-6 ECHETMS MTMDS MTMS 58,000
8-7 ECHETMS GPTMDS GPTMS 19,000
8-8 ECHETMS MAPTMDS MAPTMS 12,000
8-9 PTMS ECHETMDS ECHETMS 53,000
8-10 PTMS MTMDS MTMS 113,000
8-11 PTMS GPTMDS GPTMS 42,000
8-12 PTMS MAPTMDS MAPTMS 173,000
8-13 MTMS ECHETMDS ECHETMS 19,000
8-14 MTMS PTMDS PTMS 45,000
8-15 MTMS GPTMDS GPTMS 32,000
8-16 MTMS MAPTMDS MAPTMS 34,000
8-17 GPTMS ECHETMDS ECHETMS 12,000
8-18 GPTMS PTMDS PTMS 24,000
8-19 GPTMS MTMDS MTMS 486,000
8-20 GPTMS MAPTMDS MAPTMS 32,000
8-21 MAPTMS ECHETMDS ECHETMS 181,000
8-22 MAPTMS PTMDS PTMS 981,000
8-23 MAPTMS MTMDS MTMS 21,000
8-24 MAPTMS GPTMDS GPTMS 20,000
상기 실시예 8에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 8, the coating composition was prepared by mutatis mutandis of Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
실시예 9Example 9 : 실세스퀴옥산 E-A-B-A-D 구조 복합 고분자의 합성: Synthesis of Silsesquioxane E-A-B-A-D Structured Polymer
E-A-B-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였으며, 상기 실시예 1과 대등한 방법으로 코팅 조성물을 제조하였다.In order to prepare a composite polymer having an E-A-B-A-D structure, the following examples were used, and a coating composition was prepared by the same method as in Example 1.
[실시예 9-a] 사슬 말단 E구조의 생성Example 9-a Generation of Chain Terminal E Structure
실시예 7-g 에서 얻어진 혼합물에 별도의 정제 없이 메틸렌크로라이드 20 중량부를 적가하고, 0.36 중량% HCl 수용액을 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 dimethyltetramethoxysilane 1 중량부를 한번에 적가하였다. 이때, 아직 분자구조 내에서 가수분해되지 않고 존재하던 부분들이 용매와 분리된 산성 수용액 층에서 가수분해물로 쉽게 변환되며, 생성된 별도의 반응물과 유기용매 층에서 축합되어 말단단위에 E가 도입되었다. 5시간의 교반 후, 반응의 교반을 정지하고 상온으로 반응기의 온도를 조절 하였다. To the mixture obtained in Example 7-g, 20 parts by weight of methylene chloride were added dropwise without further purification, 5 parts by weight of an aqueous 0.36% by weight HCl solution was added dropwise, the pH was adjusted to have an acidity, and 30 minutes at a temperature of 4 ° C. Stirred. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise. At this time, the portion that was not yet hydrolyzed in the molecular structure is easily converted into a hydrolyzate in the acidic aqueous solution layer separated from the solvent, and condensed in the resulting separate reactant and organic solvent layer to introduce E into the end unit. After stirring for 5 hours, stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
[실시예 9-b] B구조 및 말단 E 구조의 X에 cage 도입Example 9-b Introducing cage to X of B structure and terminal E structure
상기 실시예 9-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 반응이 진행 중인 실시예 9-a 혼합용액에 Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 24시간 교반 후 실시예 7-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, E 구조 말단에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다. After preparing the organic layer of the resultant obtained in Example 9-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 9-a in progress at a time to achieve stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was added again to give a basic state. PH of the mixed solution was adjusted. At this time, the cage-type polymer is introduced to the end of the E structure, the reaction proceeds continuously in the reactor to form a polymer. However, since it is obtained with other byproducts, a separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum to prepare a tablet.
[실시예 9-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 9-c] Removal of By-products by Precipitation and Recrystallization
상기 실시예 9-b에서 반응이 완료된 혼합물을 얻어낸 후, 증류수를 이용하여 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. After the reaction mixture was obtained in Example 9-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum. Thereafter, the precipitate was precipitated twice in methanol, and the unreacted monomer was removed, and the tetrahydrofuran and the aqueous solution were dissolved in 30 parts by weight in a solvent mixed at a weight ratio of 9.5: 0.5, and stored at a temperature of -20 ° C for 2 days. This is to facilitate the recrystallization of the material that is not introduced into the polymer, and closed by the cage structure, so that purification can be easily performed.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 10의 고분자를 여러 부산물과 함께 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 28,000의 값을 얻을 수 있었으며, X의 n 값은 4-6이었으며, Y의 n 값은 4-6이었다.After the recrystallization process, the obtained solid material was filtered, and it was confirmed that the polymer of Formula 10 was obtained along with various by-products by vacuum reduction. In addition, when comparing the GPC results with the NMR results, it can be seen that the composite polymers can be obtained without any problem in view of the fact that the sharp form of the cage forms without the low molecular weight obtained in each stage of polymer growth. there was. At this time, the molecular weight was obtained in the styrene conversion value of 28,000, the n value of X was 4-6, the n value of Y was 4-6.
또한, 하기 표 9에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 9에서 사용한 방법을 대등하게 적용하였다.In addition, the silsesquioxane composite polymer was prepared by applying the monomers described in Table 9 below. In this case, the method used in Example 9 was equally applied.
표 9
실시방법No. 7-b,c 방법적용 단량체 7-e 방법적용 단량체 9-a방법적용 단량체 9-b방법적용단량체 Mw
9 ECHETMS PTMDS MTMDS MAPTMS 28,000
9-1 ECHETMS ECHETMDS ECHETMDS ECHETMS 24,000
9-2 PTMS PTMDS PTMDS PTMS 21,000
9-3 MTMS MTMDS MTMDS MTMS 36,000
9-4 GPTMS ECHETMDS GPTMDS GPTMS 62,000
9-5 MAPTMS MAPTMDS MAPTMDS MAPTMS 153,000
9-6 ECHETMS ECHETMDS PTMDS PTMS 24,000
9-7 ECHETMS ECHETMDS MTMDS MTMS 19,000
9-8 ECHETMS ECHETMDS GPTMDS GPTMS 26,000
9-9 ECHETMS ECHETMDS MAPTMDS MAPTMS 99,000
9-10 ECHETMS PTMDS ECHETMDS ECHETMS 21,000
9-11 ECHETMS MTMDS ECHETMDS ECHETMS 142,000
9-12 ECHETMS GPTMDS ECHETMDS ECHETMS 70,000
9-13 ECHETMS MAPTMDS ECHETMDS ECHETMS 72,000
9-14 PTMS PTMDS ECHETMDS ECHETMS 15,000
9-15 PTMS PTMDS MTMDS MTMS 51,000
9-16 PTMS PTMDS ECHETMDS ECHETMS 85,000
9-17 PTMS PTMDS MAPTMDS MAPTMS 95,000
9-18 PTMS ECHETMDS PTMDS PTMS 160,000
9-19 PTMS MTMDS PTMDS PTMS 240,000
9-20 PTMS GPTMDS PTMDS PTMS 56,000
9-21 PTMS MAPTMDS PTMDS PTMS 71,000
9-22 MTMS MTMDS ECHETMDS ECHETMS 81,000
9-23 MTMS MTMDS PTMDS PTMS 63,000
9-24 MTMS MTMDS GPTMDS GPTMS 121,000
9-25 MTMS MTMDS MAPTMDS MAPTMS 153,000
9-26 MTMS ECHETMDS MTMDS MTMS 82,000
9-27 MTMS PTMDS MTMDS MTMS 63,000
9-28 MTMS GPTMDS MTMDS MTMS 310,000
9-29 MTMS MAPTMDS MTMDS MTMS 125,000
9-30 GPTMS GPTMDS ECHETMDS ECHETMS 97,000
9-31 GPTMS GPTMDS PTMDS PTMS 45,000
9-32 GPTMS GPTMDS MTMDS MTMS 61,000
9-33 GPTMS GPTMDS MAPTMDS MAPTMS 52,000
9-34 GPTMS ECHETMDS GPTMDS GPTMS 37,000
9-35 GPTMS PTMDS GPTMDS GPTMS 365,000
9-36 GPTMS MTMDS GPTMDS GPTMS 85,000
9-37 GPTMS MAPTMDS GPTMDS GPTMS 75,000
9-38 MAPTMS MAPTMDS ECHETMDS ECHETMS 144,000
9-39 MAPTMS MAPTMDS PTMDS PTMS 85,000
9-40 MAPTMS MAPTMDS MTMDS MTMS 60,000
9-41 MAPTMS MAPTMDS GPTMDS GPTMS 53,000
9-42 MAPTMS ECHETMDS MAPTMDS MAPTMS 12,000
9-43 MAPTMS PTMDS MAPTMDS MAPTMS 10,000
9-44 MAPTMS MTMDS MAPTMDS MAPTMS 32,000
9-45 MAPTMS GPTMDS MAPTMDS MAPTMS 231,000
Table 9
Method of implementation 7-b, c method applied monomer 7-e method applied monomer 9-a method applied monomer 9-b method applied monomer Mw
9 ECHETMS PTMDS MTMDS MAPTMS 28,000
9-1 ECHETMS ECHETMDS ECHETMDS ECHETMS 24,000
9-2 PTMS PTMDS PTMDS PTMS 21,000
9-3 MTMS MTMDS MTMDS MTMS 36,000
9-4 GPTMS ECHETMDS GPTMDS GPTMS 62,000
9-5 MAPTMS MAPTMDS MAPTMDS MAPTMS 153,000
9-6 ECHETMS ECHETMDS PTMDS PTMS 24,000
9-7 ECHETMS ECHETMDS MTMDS MTMS 19,000
9-8 ECHETMS ECHETMDS GPTMDS GPTMS 26,000
9-9 ECHETMS ECHETMDS MAPTMDS MAPTMS 99,000
9-10 ECHETMS PTMDS ECHETMDS ECHETMS 21,000
9-11 ECHETMS MTMDS ECHETMDS ECHETMS 142,000
9-12 ECHETMS GPTMDS ECHETMDS ECHETMS 70,000
9-13 ECHETMS MAPTMDS ECHETMDS ECHETMS 72,000
9-14 PTMS PTMDS ECHETMDS ECHETMS 15,000
9-15 PTMS PTMDS MTMDS MTMS 51,000
9-16 PTMS PTMDS ECHETMDS ECHETMS 85,000
9-17 PTMS PTMDS MAPTMDS MAPTMS 95,000
9-18 PTMS ECHETMDS PTMDS PTMS 160,000
9-19 PTMS MTMDS PTMDS PTMS 240,000
9-20 PTMS GPTMDS PTMDS PTMS 56,000
9-21 PTMS MAPTMDS PTMDS PTMS 71,000
9-22 MTMS MTMDS ECHETMDS ECHETMS 81,000
9-23 MTMS MTMDS PTMDS PTMS 63,000
9-24 MTMS MTMDS GPTMDS GPTMS 121,000
9-25 MTMS MTMDS MAPTMDS MAPTMS 153,000
9-26 MTMS ECHETMDS MTMDS MTMS 82,000
9-27 MTMS PTMDS MTMDS MTMS 63,000
9-28 MTMS GPTMDS MTMDS MTMS 310,000
9-29 MTMS MAPTMDS MTMDS MTMS 125,000
9-30 GPTMS GPTMDS ECHETMDS ECHETMS 97,000
9-31 GPTMS GPTMDS PTMDS PTMS 45,000
9-32 GPTMS GPTMDS MTMDS MTMS 61,000
9-33 GPTMS GPTMDS MAPTMDS MAPTMS 52,000
9-34 GPTMS ECHETMDS GPTMDS GPTMS 37,000
9-35 GPTMS PTMDS GPTMDS GPTMS 365,000
9-36 GPTMS MTMDS GPTMDS GPTMS 85,000
9-37 GPTMS MAPTMDS GPTMDS GPTMS 75,000
9-38 MAPTMS MAPTMDS ECHETMDS ECHETMS 144,000
9-39 MAPTMS MAPTMDS PTMDS PTMS 85,000
9-40 MAPTMS MAPTMDS MTMDS MTMS 60,000
9-41 MAPTMS MAPTMDS GPTMDS GPTMS 53,000
9-42 MAPTMS ECHETMDS MAPTMDS MAPTMS 12,000
9-43 MAPTMS PTMDS MAPTMDS MAPTMS 10,000
9-44 MAPTMS MTMDS MAPTMDS MAPTMS 32,000
9-45 MAPTMS GPTMDS MAPTMDS MAPTMS 231,000
상기 실시예 9에서 제조한 실세스퀴옥산 복합고분자를 사용한 것을 제외하고는 실시예 1-d를 준용하여 코팅조성물을 제조한 후 실시예 1-e에서와 같이 PC 기재에 코팅 후 경화시켜 청색광 흡수필름을 제조하였다. 상기 청색광 흡수필름은 황변현상에 내한 내성 및 청색광 흡수율이 우수하였다. 또한 청색광 흡수 화합물을 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 및 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)로 변경하여 실시한 경우에도 인돌-3-아세트아미드를 사용하였을 때와 대등한 우수한 청색광 흡수율 및 황변현상에 대한 내성을 나타내었다.Except for using the silsesquioxane composite polymer prepared in Example 9, the coating composition was prepared in accordance with Example 1-d, and then coated and cured on a PC substrate as in Example 1-e to absorb blue light. A film was prepared. The blue light absorbing film has excellent resistance to yellowing and blue light absorption. In addition, the blue light absorbing compound may be selected from indole-3-carboxaldehyde, indole-3-carbinol, indole-3-thiocarboxamide, And 2- (2-aminophenyl) indole showed excellent blue light absorption and yellowing resistance comparable to when indole-3-acetamide was used. It was.
비교예 1Comparative Example 1
상기 실시예 9에서 청색광 흡수 화합물을 포함하지 않고, 코팅한 것을 제외하고는 실시예 9와 동일하게 코팅필름을 제조하였다.The coating film was prepared in the same manner as in Example 9 except that the blue light absorbing compound was not included and coated in Example 9.
비교예 2Comparative Example 2
상기 실시예 9에서 청색광 흡수 화합물을 벤조페놀로 사용한 것을 제외하고는 실시예 9와 동일하게 필름을 제조하였다.A film was prepared in the same manner as in Example 9, except that the blue light absorbing compound was used as the benzophenol in Example 9.
비교예 3Comparative Example 3
상기 실시예 9에서 청색광 흡수 화합물을 벤조트리아졸로 사용한 것을 제외하고는 실시예 9와 동일하게 필름을 제조하였다.A film was prepared in the same manner as in Example 9, except that the blue light absorbing compound was used as the benzotriazole in Example 9.
청색광 흡수 화합물 함량에 따른 필름의 물성 평가Evaluation of Properties of Film According to Blue Light Absorption Compound Content
실시예 9에서 제조한 코팅조성물을 PET 188 um(도레이사)에 코팅하여 청색광 흡수 필름을 제조하였다. 또한 청색광 흡수 화합물의 함량을 달리하여 청색광 흡수 필름을 제조하여 황변현상(Yellowish b*)의 정도 및 청색광 투과도를 측정하여 하기 표 10에 나타내었다.The coating composition prepared in Example 9 was coated on PET 188 um (Toray Industries, Inc.) to prepare a blue light absorbing film. In addition, the blue light absorbing film was prepared by varying the content of the blue light absorbing compound to measure the degree of yellowing phenomenon (Yellowish b *) and blue light transmittance, and are shown in Table 10 below.
하기에서 황변현상(Yellowish b*)의 정도는 U-4100(spectrophotometer)로 측정하였으며, 청색광 투과도는 NDH5000(탁도계)으로 측정하였다. 투과율이 낮을수록 우수한 청색광 흡수율을 나타낸다. In the following, the degree of yellowing (Yellowish b *) was measured by U-4100 (spectrophotometer), and the blue light transmittance was measured by NDH5000 (turbidimeter). The lower the transmittance, the better the blue light absorption.
표 10
인돌화합물 함량
중량% 0 0.001 0.1 0.5 1 3 5 7 10 15
투과율(%) 89 51 47 46 43 38 35 32 30 22
Yellowish b* 0.40 0.40 0.41 0.42 0.49 0.54 0.64 0.75 0.82 1.89
Table 10
Indole Compound Content
weight%
0 0.001 0.1 0.5 One 3 5 7 10 15
Transmittance (%) 89 51 47 46 43 38 35 32 30 22
Yellowish b * 0.40 0.40 0.41 0.42 0.49 0.54 0.64 0.75 0.82 1.89
상기 표 10에 나타나는 바와 같이 본 발명의 청색광 흡수 필름은 청색광 흡수 화합물을 0.001 내지 10 중량% 포함할 경우 청색광 흡수율과 황변현상에 대한 내성이 동시에 우수함을 확인할 수 있었다.As shown in Table 10, when the blue light absorbing film of the present invention contained 0.001 to 10% by weight of the blue light absorbing compound, it was confirmed that the blue light absorbance and the yellowing phenomenon were excellent at the same time.
청색광 흡수 화합물에 따른 필름의 물성 평가Evaluation of physical properties of film according to blue light absorbing compound
실시예 9 및 비교예 1 내지 3에서 제조한 청색광 흡수 필름의 황변현상(Yellowish b*)의 정도 및 청색광 투과도를 측정하여 도 1 및 하기 표 11에 나타내었다.The degree of yellowing phenomenon (Yellowish b *) and the blue light transmittance of the blue light absorbing films prepared in Example 9 and Comparative Examples 1 to 3 were measured and shown in FIG. 1 and Table 11 below.
표 11
코팅 Yellowish b*
비교예 1 0.52
비교예 2 5.98
비교예 3 3.87
실시예 9 0.98
Table 11
coating Yellowish b *
Comparative Example 1 0.52
Comparative Example 2 5.98
Comparative Example 3 3.87
Example 9 0.98
상기 도 1 및 표 11에 나타나는 바와 같이 본 발명의 청색광 흡수 화합물을 사용한 경우 벤조페놀 또는 벤조트리아졸에 비하여 현저히 우수한 청색광 흡수율과 황변현상에 대한 내성이 동시에 우수함을 확인할 수 있었다.As shown in FIG. 1 and Table 11, when the blue light absorbing compound of the present invention was used, it was confirmed that the blue light absorption rate and the yellowing phenomenon were significantly superior to benzophenol or benzotriazole.
또한 도 1에서 나타나는 바와 같이 본 발명에 따른 청색광 흡수 필름은 400-470 nm(제1파장 영역대 + 제2파장 영역대)의 평균 광흡수율이 30 내지 70%(투과율이 30 내지 70%)이며, 470-500 nm(제3파장 영역)의 평균 광흡수율이 40 내지 20%(투과율이 60 내지 80%)이며, 더욱 구체적으로 제1파장 영역의 광흡수는 50 내지 85%(투과율이 15 내지 50%)이며, 제2파장 영역의 광흡수는 65 내지 35%(투과율이 35 내지 65%)이며, 제3파장 영역의 광흡수는 40 내지 20%(투과율이 60 내지 80%)을 나타내었으며, 파장 영역간의 평균 광흡수율의 비율(파장 1+2영역의 광흡수율/파장 3 영역의 광흡수율)이 2-5를 가짐으로써 인체에 유해한 청색광은 가급적 많이 흡수하고, 인체에 유익한 청색광은 비교적 흡수를 하지 않아 디스플레이 기기의 보호필름으로 적용시 인체에 매우 유리함을 확인할 수 있었다.In addition, as shown in FIG. 1, the blue light absorbing film according to the present invention has an average light absorption of 30 to 70% (transmittance of 30 to 70%) of 400 to 470 nm (first wavelength range + second wavelength range). , The average light absorption of 470-500 nm (third wavelength region) is 40 to 20% (transmittance of 60 to 80%), more specifically, the light absorption of the first wavelength region is 50 to 85% (transmittance of 15 to 50%), the light absorption of the second wavelength region is 65 to 35% (35-65% transmittance), and the light absorption of the third wavelength region is 40 to 20% (60-80% transmittance). In addition, the ratio of average light absorption between wavelength ranges (light absorption rate in wavelength 1 + 2 area / light absorption area in wavelength 3 area) has 2-5 so that blue light harmful to human body is absorbed as much as possible, and blue light which is beneficial to human body is relatively absorbed. It was confirmed that it is very advantageous to the human body when applied as a protective film of the display device.
본 발명에 따른 필름은 청색광 흡수효과가 우수하여 시력저하, 안구손상, 수면장애를 예방할 수 있으며, 황변현상에 대한 내성이 뛰어나며, 내스크레치성, 발수특성, 방오특성, 내지문성, 열안정성, 광택특성 및 표면 경도 향상 효과를 증가시킬 수 있다. 특히 인체에 유해한 400-470 nm 파장대의 청색광에 대한 광흡수력은 매우 높은 반면 인체에 유익한 470-500 nm 파장대의 청색광에 대한 광흡수력은 상대적으로 낮아 더욱 인체에 유익한 효과를 가져올 수 있다.Film according to the present invention is excellent in the blue light absorption effect can prevent vision loss, eye damage, sleep disorders, excellent resistance to yellowing phenomenon, scratch resistance, water repellent properties, antifouling properties, anti-fingerprint, thermal stability, gloss Properties and surface hardness improving effect can be increased. In particular, the light absorption of the blue light of 400-470 nm wavelength harmful to the human body is very high, but the light absorption of the blue light of the wavelength 470-500 nm beneficial to the human body is relatively low can bring a more beneficial effect on the human body.

Claims (17)

  1. 하기 화학식 1로 표시되는 청색광 흡수 화합물을 포함하는 필름:A film comprising a blue light absorbing compound represented by Formula 1 below:
    [화학식 1][Formula 1]
    Figure PCTKR2016010043-appb-I000026
    Figure PCTKR2016010043-appb-I000026
    상기 화학식 1에서, In Chemical Formula 1,
    R1, R2, R3, R4, R5, R6, R7, R8, R9는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이다. R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or a C 3 ~ C 40 aralkyl group or C 3 ~ C 40 aryloxy group or a C 3 ~ C 40 aryl olgi between the.
  2. 제1항에 있어서,The method of claim 1,
    상기 청색광 흡수 화합물을 하드코팅층에 포함하는 필름.A film comprising the blue light absorbing compound in a hard coating layer.
  3. 제2항에 있어서,The method of claim 2,
    상기 하드코팅층은 실세스퀴옥산 수지를 포함하는 필름.The hard coating layer is a film containing a silsesquioxane resin.
  4. 제3항에 있어서,The method of claim 3,
    상기 실세스퀴옥산은
    Figure PCTKR2016010043-appb-I000027
    ,
    Figure PCTKR2016010043-appb-I000028
    ,
    Figure PCTKR2016010043-appb-I000029
    Figure PCTKR2016010043-appb-I000030
    중에서 적어도 하나를 포함하는 필름: 상기 A는
    The silsesquioxane
    Figure PCTKR2016010043-appb-I000027
    ,
    Figure PCTKR2016010043-appb-I000028
    ,
    Figure PCTKR2016010043-appb-I000029
    And
    Figure PCTKR2016010043-appb-I000030
    A film comprising at least one of: wherein A is
    Figure PCTKR2016010043-appb-I000031
    이고, B는
    Figure PCTKR2016010043-appb-I000032
    이고,
    Figure PCTKR2016010043-appb-I000031
    And B is
    Figure PCTKR2016010043-appb-I000032
    ego,
    D는
    Figure PCTKR2016010043-appb-I000033
    이고, E는
    Figure PCTKR2016010043-appb-I000034
    이며,
    D is
    Figure PCTKR2016010043-appb-I000033
    And E is
    Figure PCTKR2016010043-appb-I000034
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며, R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,a and d are each independently an integer of 1 to 100,000,
    b는 각각 독립적으로 1 내지 500의 정수이며,b are each independently an integer of 1 to 500,
    e는 각각 독립적으로 1 또는 2이며,e are each independently 1 or 2,
    n은 각각 독립적으로 1 내지 20의 정수이다.n is independently an integer of 1-20.
  5. 제3항에 있어서,The method of claim 3,
    상기 실세스퀴옥산은
    Figure PCTKR2016010043-appb-I000035
    Figure PCTKR2016010043-appb-I000036
    를 포함하는 필름:
    The silsesquioxane
    Figure PCTKR2016010043-appb-I000035
    And
    Figure PCTKR2016010043-appb-I000036
    Film containing:
    상기 B는
    Figure PCTKR2016010043-appb-I000037
    이고, D는
    Figure PCTKR2016010043-appb-I000038
    이며,
    B is
    Figure PCTKR2016010043-appb-I000037
    And D is
    Figure PCTKR2016010043-appb-I000038
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R17, R18, R19, R21및 R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며,R 17 , R 18 , R 19 , R 21 and R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    b는 각각 독립적으로 1 내지 500의 정수이고, d는 각각 독립적으로 1 내지 100,000의 정수이며, n은 각각 독립적으로 1 내지 20의 정수이다.b is each independently an integer of 1 to 500, d is each independently an integer of 1 to 100,000, n is each independently an integer of 1 to 20.
  6. 제3항에 있어서,The method of claim 3,
    상기 실세스퀴옥산은 하기 화학식 2 내지 10 중 어느 하나로 표시되는 필름:The silsesquioxane is a film represented by any one of the following Chemical Formulas 2 to 10:
    [화학식 2][Formula 2]
    Figure PCTKR2016010043-appb-I000039
    Figure PCTKR2016010043-appb-I000039
    [화학식 3][Formula 3]
    Figure PCTKR2016010043-appb-I000040
    Figure PCTKR2016010043-appb-I000040
    [화학식 4][Formula 4]
    Figure PCTKR2016010043-appb-I000041
    Figure PCTKR2016010043-appb-I000041
    [화학식 5][Formula 5]
    Figure PCTKR2016010043-appb-I000042
    Figure PCTKR2016010043-appb-I000042
    [화학식 6][Formula 6]
    Figure PCTKR2016010043-appb-I000043
    Figure PCTKR2016010043-appb-I000043
    [화학식 7][Formula 7]
    Figure PCTKR2016010043-appb-I000044
    Figure PCTKR2016010043-appb-I000044
    [화학식 8][Formula 8]
    Figure PCTKR2016010043-appb-I000045
    Figure PCTKR2016010043-appb-I000045
    [화학식 9][Formula 9]
    Figure PCTKR2016010043-appb-I000046
    Figure PCTKR2016010043-appb-I000046
    [화학식 10][Formula 10]
    Figure PCTKR2016010043-appb-I000047
    Figure PCTKR2016010043-appb-I000047
    상기 화학식 2 내지 10에서, A는In Formulas 2 to 10, A is
    Figure PCTKR2016010043-appb-I000048
    이고, B는
    Figure PCTKR2016010043-appb-I000049
    이고,
    Figure PCTKR2016010043-appb-I000048
    And B is
    Figure PCTKR2016010043-appb-I000049
    ego,
    D는
    Figure PCTKR2016010043-appb-I000050
    이고, E는
    Figure PCTKR2016010043-appb-I000051
    이며,
    D is
    Figure PCTKR2016010043-appb-I000050
    And E is
    Figure PCTKR2016010043-appb-I000051
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며, R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,a and d are each independently an integer of 1 to 100,000,
    b는 각각 독립적으로 1 내지 500의 정수이며,b are each independently an integer of 1 to 500,
    e는 각각 독립적으로 1 또는 2이며,e are each independently 1 or 2,
    n은 각각 독립적으로 1 내지 20의 정수이고,n are each independently an integer of 1 to 20,
    상기 각각의 사슬단위 사이에는 실세스퀴옥산에 적용가능한 공지의 사슬단위가 더욱 포함될 수 있다.Between each chain unit may further include a known chain unit applicable to the silsesquioxane.
  7. 제1항에 있어서,The method of claim 1,
    상기 필름은 400-470 nm의 광에 대한 평균 광흡수율이 30 내지 70%인 필름.The film has an average light absorption of 30 to 70% for light of 400-470 nm.
  8. 제1항에 있어서,The method of claim 1,
    상기 필름은 400-470 nm의 광에 대한 평균 광흡수율과 470-500 nm의 광에 대한 평균 광흡수율의 비율(파장 1+2영역의 광흡수율/파장 3 영역의 광흡수율)이 2-5인 필름.The film has a ratio of average light absorption for light of 400-470 nm and average light absorption for light of 470-500 nm (light absorption in wavelength 1 + 2 / light absorption in wavelength 3). film.
  9. 제1항에 있어서,The method of claim 1,
    상기 필름은 디스플레이 보호용인 필름.The film is a film for display protection.
  10. 하기 화학식 1로 표시되는 청색광 흡수 화합물 및 실세스퀴옥산 수지를 포함하는 코팅조성물:A coating composition comprising a blue light absorbing compound represented by Formula 1 and a silsesquioxane resin:
    [화학식 1][Formula 1]
    Figure PCTKR2016010043-appb-I000052
    Figure PCTKR2016010043-appb-I000052
    상기 화학식 1에서, In Chemical Formula 1,
    R1, R2, R3, R4, R5, R6, R7, R8, R9는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이다.R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or a C 3 ~ C 40 aralkyl group or C 3 ~ C 40 aryloxy group or a C 3 ~ C 40 aryl olgi between the.
  11. 제10항에 있어서,The method of claim 10,
    상기 화학식 1의 화합물을 0.001 내지 10 중량%, 상기 실세스퀴옥산 수지를 5 내지 90 중량% 및 잔량의 용매를 포함하는 코팅조성물.Coating composition comprising 0.001 to 10% by weight of the compound of Formula 1, 5 to 90% by weight of the silsesquioxane resin and the remaining amount of the solvent.
  12. 제10항에 있어서,The method of claim 10,
    상기 실세스퀴옥산은
    Figure PCTKR2016010043-appb-I000053
    ,
    Figure PCTKR2016010043-appb-I000054
    ,
    Figure PCTKR2016010043-appb-I000055
    Figure PCTKR2016010043-appb-I000056
    중에서 적어도 하나를 포함하는 코팅조성물:
    The silsesquioxane
    Figure PCTKR2016010043-appb-I000053
    ,
    Figure PCTKR2016010043-appb-I000054
    ,
    Figure PCTKR2016010043-appb-I000055
    And
    Figure PCTKR2016010043-appb-I000056
    Coating composition comprising at least one of:
    상기 A는
    Figure PCTKR2016010043-appb-I000057
    이고, B는
    Figure PCTKR2016010043-appb-I000058
    이고,
    A is
    Figure PCTKR2016010043-appb-I000057
    And B is
    Figure PCTKR2016010043-appb-I000058
    ego,
    D는
    Figure PCTKR2016010043-appb-I000059
    이고, E는
    Figure PCTKR2016010043-appb-I000060
    이며,
    D is
    Figure PCTKR2016010043-appb-I000059
    And E is
    Figure PCTKR2016010043-appb-I000060
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며, R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,a and d are each independently an integer of 1 to 100,000,
    b는 각각 독립적으로 1 내지 500의 정수이며,b are each independently an integer of 1 to 500,
    e는 각각 독립적으로 1 또는 2이며,e are each independently 1 or 2,
    n은 각각 독립적으로 1 내지 20의 정수이다.n is independently an integer of 1-20.
  13. 상기 실세스퀴옥산은
    Figure PCTKR2016010043-appb-I000061
    Figure PCTKR2016010043-appb-I000062
    를 포함하는 필름:
    The silsesquioxane
    Figure PCTKR2016010043-appb-I000061
    And
    Figure PCTKR2016010043-appb-I000062
    Film containing:
    상기 B는
    Figure PCTKR2016010043-appb-I000063
    이고, D는
    Figure PCTKR2016010043-appb-I000064
    이며,
    B is
    Figure PCTKR2016010043-appb-I000063
    And D is
    Figure PCTKR2016010043-appb-I000064
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R17, R18, R19, R21및 R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며,R 17 , R 18 , R 19 , R 21 and R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    b는 각각 독립적으로 1 내지 500의 정수이고, d는 각각 독립적으로 1 내지 100,000의 정수이며, n은 각각 독립적으로 1 내지 20의 정수이다.b is each independently an integer of 1 to 500, d is each independently an integer of 1 to 100,000, n is each independently an integer of 1 to 20.
  14. 제10항에 있어서,The method of claim 10,
    상기 실세스퀴옥산은 하기 화학식 2 내지 10 중 어느 하나로 표시되는 코팅조성물:The silsesquioxane is a coating composition represented by any one of the following Chemical Formulas 2 to 10:
    [화학식 2][Formula 2]
    Figure PCTKR2016010043-appb-I000065
    Figure PCTKR2016010043-appb-I000065
    [화학식 3][Formula 3]
    Figure PCTKR2016010043-appb-I000066
    Figure PCTKR2016010043-appb-I000066
    [화학식 4][Formula 4]
    Figure PCTKR2016010043-appb-I000067
    Figure PCTKR2016010043-appb-I000067
    [화학식 5][Formula 5]
    Figure PCTKR2016010043-appb-I000068
    Figure PCTKR2016010043-appb-I000068
    [화학식 6][Formula 6]
    Figure PCTKR2016010043-appb-I000069
    Figure PCTKR2016010043-appb-I000069
    [화학식 7][Formula 7]
    Figure PCTKR2016010043-appb-I000070
    Figure PCTKR2016010043-appb-I000070
    [화학식 8][Formula 8]
    Figure PCTKR2016010043-appb-I000071
    Figure PCTKR2016010043-appb-I000071
    [화학식 9][Formula 9]
    Figure PCTKR2016010043-appb-I000072
    Figure PCTKR2016010043-appb-I000072
    [화학식 10][Formula 10]
    Figure PCTKR2016010043-appb-I000073
    Figure PCTKR2016010043-appb-I000073
    상기 화학식 2 내지 10에서,In Chemical Formulas 2 to 10,
    A는
    Figure PCTKR2016010043-appb-I000074
    이고, B는
    Figure PCTKR2016010043-appb-I000075
    이고,
    A is
    Figure PCTKR2016010043-appb-I000074
    And B is
    Figure PCTKR2016010043-appb-I000075
    ego,
    D는
    Figure PCTKR2016010043-appb-I000076
    이고, E는
    Figure PCTKR2016010043-appb-I000077
    이며,
    D is
    Figure PCTKR2016010043-appb-I000076
    And E is
    Figure PCTKR2016010043-appb-I000077
    Is,
    Y는 각각 독립적으로 O, NR21 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Each Y is independently O, NR 21 or [(SiO 3/2 R) 4 + 2n O], at least one is [(SiO 3/2 R) 4 + 2n O],
    X는 각각 독립적으로 R22 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,Each X is independently R 22 or [(SiO 3/2 R) 4 + 2n R], at least one is [(SiO 3/2 R) 4 + 2n R],
    R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이며, R, R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8, R 9, R 10, R 11, R 12, R 13, R 14, R 15, R 16, R 17 , R 18 , R 19 , R 20 , R 21 , R 22 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or C 3 ~ C 40 Aralkyl group or C 3 ~ C 40 An aryloxy group or C 3 ~ C 40 An arylsilol group,
    a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,a and d are each independently an integer of 1 to 100,000,
    b는 각각 독립적으로 1 내지 500의 정수이며,b are each independently an integer of 1 to 500,
    e는 각각 독립적으로 1 또는 2이며,e are each independently 1 or 2,
    n은 각각 독립적으로 1 내지 20의 정수이고,n are each independently an integer of 1 to 20,
    상기 각각의 사슬단위 사이에는 실세스퀴옥산에 적용가능한 공지의 사슬단위가 더욱 포함될 수 있다.Between each chain unit may further include a known chain unit applicable to the silsesquioxane.
  15. 하기 화학식 1로 표시되는 400-500 nm 영역의 청색광을 흡수하는 화합물:A compound absorbing blue light in the 400-500 nm region represented by Formula 1 below:
    [화학식 1][Formula 1]
    Figure PCTKR2016010043-appb-I000078
    Figure PCTKR2016010043-appb-I000078
    상기 화학식 1에서, In Chemical Formula 1,
    R1, R2, R3, R4, R5, R6, R7, R8, R9는 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 수소, 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기 또는 C1~C40의 알콕시기 또는 C3~C40의 시클로알킬기 또는 C3~C40의 헤테로시클로알킬기 또는 C6~C40의 아릴기 또는 C3~C40의 헤테로아릴기 또는 C3~C40의 아르알킬기 또는 C3~C40의 아릴옥시기 또는 C3~C40의 아릴사이올기이다. R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 are each independently hydrogen; heavy hydrogen; halogen; Amine groups; Epoxy groups; Cyclohexyl epoxy group; (Meth) acryl group; Siol group; Isocyanate group; Nitrile group; Nitro group; Phenyl group; Hydrogen, deuterium, a halogen, an amine group, an epoxy group, (meth) acrylic group, between olgi, isocyanate group, nitrile group, nitro group, C 1 ~ is optionally substituted by a phenyl C 40 alkyl group or a C 2 ~ C 40 of Alkenyl group or C 1 to C 40 alkoxy group or C 3 to C 40 cycloalkyl group or C 3 to C 40 heterocycloalkyl group or C 6 to C 40 aryl group or C 3 to C 40 heteroaryl group or a C 3 ~ C 40 aralkyl group or C 3 ~ C 40 aryloxy group or a C 3 ~ C 40 aryl olgi between the.
  16. 제15항에 있어서,The method of claim 15,
    상기 화합물은 인돌-3-아세트아미드(Indole-3-acetamide), 인돌-3-카르복알데히드(indole-3-carboxaldehyde), 인돌-3-카비놀(indole-3-carbinol), 인돌-3-씨오카르복아미드(indole-3-thiocarboxamide), 2-(2-아미노페닐)인돌(2-(2-aminophenyl)indole)인 화합물.The compound is indole-3-acetamide, indole-3-carboxaldehyde, indole-3-carbinol, indole-3- Compound that is ciocarboxamide (indole-3-thiocarboxamide), 2- (2-aminophenyl) indole.
  17. 제15항에 있어서,The method of claim 15,
    화합물의 400-470 nm의 광에 대한 평균 광흡수율과 470-500 nm의 광에 대한 평균 광흡수율의 비율(파장 1+2영역의 광흡수율/파장 3 영역의 광흡수율)이 2-5인 화합물.Compounds having a ratio of average light absorption for 400-470 nm light and average light absorption for light 470-500 nm (light absorption in wavelength 1 + 2 / light absorption in wavelength 3) are 2-5 .
PCT/KR2016/010043 2015-09-07 2016-09-07 Blue light absorption film WO2017043873A1 (en)

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