WO2017018617A1 - Novel compound, photosensitive resin composition containing same, and color filter - Google Patents

Novel compound, photosensitive resin composition containing same, and color filter Download PDF

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Publication number
WO2017018617A1
WO2017018617A1 PCT/KR2015/013609 KR2015013609W WO2017018617A1 WO 2017018617 A1 WO2017018617 A1 WO 2017018617A1 KR 2015013609 W KR2015013609 W KR 2015013609W WO 2017018617 A1 WO2017018617 A1 WO 2017018617A1
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Prior art keywords
formula
substituted
unsubstituted
independently
compound
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PCT/KR2015/013609
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French (fr)
Korean (ko)
Inventor
김선대
최은정
신명엽
최승집
Original Assignee
삼성에스디아이 주식회사
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Priority claimed from KR1020150175993A external-priority patent/KR101808729B1/en
Application filed by 삼성에스디아이 주식회사 filed Critical 삼성에스디아이 주식회사
Publication of WO2017018617A1 publication Critical patent/WO2017018617A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/08Hydrogen atoms or radicals containing only hydrogen and carbon atoms
    • C07D333/10Thiophene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/26Triarylmethane dyes in which at least one of the aromatic nuclei is heterocyclic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Definitions

  • Novel compounds, photosensitive resin compositions and color filters comprising the same
  • the present disclosure relates to a novel compound, a photosensitive resin composition and a color filter including the same.
  • One embodiment is to provide novel compounds.
  • Another embodiment is to provide a photosensitive resin composition comprising the compound.
  • One embodiment provides a compound containing cyanide and an anion, wherein the cation is represented by the following formula (1).
  • R 1 to R 6 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group,
  • R 7 is a substituted or unsubstituted C6 to C20 aryl group
  • X is - ⁇ -, -S- or — NR 8- (R 8 is a hydrogen atom, a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C20 aryl group).
  • X may be -0- or -S-.
  • R 1 to R 4 may be each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
  • the cation may be represented by the following formula (2).
  • R 9 and R 10 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 11 3 ⁇ 4 R 12 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 An aryl group
  • R 13 is a substituted or unsubstituted C6 to C20 aryl group
  • R 14 to R 17 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • nl to n4 are each independently an integer of 0 to 5, 0 ⁇ nl + n2 ⁇ 5, 0 ⁇ n3 + n4 ⁇ 5,
  • X is -0- or -S-.
  • the cation may be represented by any one selected from the group consisting of the following Chemical Formulas 3 to 7.
  • R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 22 is a halogen atom
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group, and ⁇
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • R 18 to R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 22 is a halogen atom
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group, R 22 is a halogen atom,
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • R 27 is a substituted or unsubstituted C6 to C20 aryl group, 'm is an integer from 0 to 2,
  • n5 to n8 are each independently an integer of 0 or 1
  • R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 22 is a halogen atom
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C110 alkyl group
  • R 27 and R 28 are each independently a substituted or unsubstituted C6 to C20 aryl group and m is an integer from 0 to 2,
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • R 18, and R 19 and R 21 are C1 to C20 alkyl groups each independently substituted or unsubstituted, "
  • R 22 is a halogen atom
  • R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • R 28 is a substituted or unsubstituted C6 to C20 aryl group
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • the cation may be represented by the following Chemical Formulas 5-3, 5-4, 5-5, 5-6, 7-6, 7-8, 7-10, 7-12, and 7-17. It may be represented by any one selected from the group consisting of 7-23.
  • the anion may be represented by one selected from the group consisting of Formulas A to F.
  • the compound may be a dye.
  • the dye may be a blue dye.
  • the compound may have a maximum absorbance ') in the wavelength range of 600 nm to 700 nm.
  • the compounds may have a T max in the wavelength range of 400 nm to 500 nm.
  • a photosensitive resin composition comprising the compound.
  • the photosensitive resin composition may further include a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
  • the photosensitive resin composition may further include a pigment.
  • Another embodiment provides a color filter manufactured using the photosensitive vertical composition.
  • the compound according to the embodiment has excellent coloring power and heat resistance, and by using the photosensitive resin composition including the compound, it is possible to prepare a color filter having excellent luminance.
  • substituted to “substituted” means that of the present invention At least one hydrogen atom of the functional group is a halogen atom (F, Br, Cl or I), a hydroxy group, a nitro group, a cyano group, an amino group (NH 2 , NH (R 200 ) or N (R 201 ) (R 202 ) Wherein R 200 , R 201 and R 202 are the same or different and are each independently C1 to C10 alkyl group), amidino group, hydrazine group, hydrazone group, carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted A substituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and a substituted or unsubstitute
  • alkyl group means a C1 to C20 alkyl group, specifically means a C1 to C15 alkyl group
  • 'cycloalkyl group means a C3 to C20 cycloalkyl group, specifically Means a C3 to C18 cycloalkyl group
  • 'alkoxy group means a ci to C20 alkoxy group, specifically means a C1 to C18 alkoxy group
  • aryl group means a C6 to C20 aryl group
  • alkenyl group means a C2 to C20 alkenyl group, specifically means a C2 to C18 alkenyl group, '' alkylene group 'means a C1 to C20 alkylene group
  • arylene group means a C6 to C20 arylene group, and specifically means a C6 to C16 arylene group.
  • Copolymer means a block copolymer or a random copolymer.
  • R 1 to R 6 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group,
  • R 7 is a substituted or unsubstituted C6 to C20 aryl group
  • X is - ⁇ -, -S- or -NR 8- (R 8 is a hydrogen atom, a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C20 aryl group).
  • X may be -0- or -S-.
  • R 1 to R 4 may be each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
  • the triarylmethane dye has the advantage of having a high luminance in the wavelength range of 420 nm to 450 nm, but the solubility in organic solvents such as PGMEA and the like has a disadvantage of poor heat resistance. Attempts have been made to use anions such as naphthalenesulfonic acid and naphthylaminesulfonic acid in the triarylmethane dye to overcome the weak heat resistance, but the heat resistance has not been greatly improved.
  • Compound according to one embodiment includes a cation represented by the formula (1), excellent spectroscopy, compared to a compound used as a conventional colorant, such as triarylmethane compound Characteristics and high molar extinction coefficient, excellent coloring power and heat resistance, cyclonuxanone,
  • the compound according to one embodiment has three rings linked to the central carbon, one of the three rings has an aromatic hetero ring containing a cyano group, and thus a composition comprising a compound according to one embodiment Silver can provide a color filter excellent in brightness and durability.
  • the cation may be represented by the following Chemical Formula 2.
  • R 9 and R 10 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R ′′ and R 12 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
  • R 13 is a substituted or unsubstituted C6 to C20 aryl group
  • R 14 to R 17 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • nl to n4 are each independently an integer of 0 to 5, 0 ⁇ nl + n2 ⁇ 5, 0 ⁇ n3 + n4 ⁇ 5,
  • X is -0- or -S-.
  • nl to n4 may be each independently an integer of 0 or 1.
  • the halogen atom may be F, Cl, Br or I.
  • the cation may be represented by any one selected from the group consisting of the following Chemical Formulas 3 to 7. [Formula 3]
  • R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 22 is a halogen atom
  • R 23 to R 26 are C1 to C10 alkyl groups each independently selected from ring a halogen atom or a substituted or unsubstituted,
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or.
  • Chemical Formula 4 1S and R to R 21 are C1 to C20 alkyl groups each independently substituted or unsubstituted
  • R 22 is a halogen atom
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C 1 to C 10 alkyl group
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group and R 22 is a halogen atom,
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • R 27 is a substituted or unsubstituted C6 to C20 aryl group
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group and R 22 is a halogen atom,
  • R 23 to R 26 each independently represent a halogen atom or a substituted or unsubstituted C110 alkyl group, '
  • R 27 and R 28 are each independently a substituted or unsubstituted C6 to C20 aryl group : m is an integer from 0 to 2,
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group
  • R 22 is a halogen atom
  • R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group
  • R 28 is a substituted or unsubstituted C6 to C20 aryl group
  • n is an integer from 0 to 2
  • n5 to n8 are each independently an integer of 0 or 1
  • X is -0- or -S-.
  • the cation is represented by the following Chemical Formula 3-1, Chemical Formula 3-2, Chemical Formula 4-1 to Chemical Formula 4-3, Chemical Formula 5-1 to Chemical Formula 5-8, Chemical Formula 6-1 to Chemical Formula 6-19, and Chemical Formula 7-1. It may be represented by any one selected from the group consisting of Formula 7-23, but is not limited thereto.
  • the compound according to one embodiment includes an anion, and the anion may be represented by any one selected from the group consisting of Formulas A to F, but is not limited thereto.
  • Compound according to one embodiment is a cation represented by the formula (1)
  • the compound may be a colorant such as a dye such as a blue dye such as a dye having a maximum absorbance ( ⁇ in a wavelength range of 600 nm to 700 nm, such as a wavelength range of 610 nm to 680 nm, such as 610 nm to 650 rnn. may.
  • the compound may be a dye having a T ⁇ in the wavelength range of 400 nm to a wavelength range of 500 nm, for example 420 nm to the 450 nm wavelength range, such as 430 nm to 440 nm.
  • T max is the maximum Permeability may mean.
  • dyes are the most expensive of the components used in color filters. Therefore, in order to achieve a desired effect such as high brightness or high contrast ratio, more expensive dyes have to be used.
  • the compound according to the embodiment as a dye in the color filter, it is possible to achieve excellent color characteristics such as high brightness, high contrast ratio even in a small amount it is possible to reduce the production cost.
  • a photosensitive resin composition including the compound according to the embodiment is provided.
  • the photosensitive resin composition may include a compound, a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent according to the embodiment.
  • the photosensitive resin composition may further include a pigment.
  • the compound according to the embodiment may serve as a colorant such as a dye such as a blue dye in the photosensitive resin composition, and may express excellent color characteristics.
  • the compounds according to the embodiment can be included as 1% to 10% by weight, for example, 3 parts by weight 0/0 to 7 parts by weight 0 /. With respect to the photosensitive resin composition the total amount of the compounds according to the embodiment as eu the range When included, color reproducibility and contrast ratio are excellent.
  • the pigment may include, but is not limited to, a blue pigment, a yellow pigment, a green pigment, a red pigment, a violet pigment, or a combination thereof.
  • the pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
  • the pigment dispersion may include a solid pigment, a solvent and a dispersant for uniformly dispersing the pigment in the solvent.
  • Pigments of the solid is 1 wt. 0/0 to 20 parts by weight 0/0, for example, 8% by weight to 20 parts by weight 0 / with respect to the pigment dispersion the total amount., Such as 15 wt. 0 /. To about 20 wt%, such as 8% to about 15 weight 0/0, for example, 10 parts by weight 0 /. to 20 parts by weight 0 /., such as 10 wt. 0/0 to 15 It may be included in weight percent.
  • a nonionic dispersant As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, or the like may be used.
  • the dispersant include polyalkylene glycols and esters thereof, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, and carboxylic acids. Salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
  • Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,
  • the dispersing agent may comprise from 1% to 20% by weight relative to the total amount of the pigment dispersion.
  • the dispersant is included in the above range, it is possible to maintain an appropriate viscosity to excellent dispersibility of the photosensitive resin composition, thereby maintaining the optical, physical and chemical quality in the product application.
  • Examples of the solvent for forming the pigment dispersion include ethylene glycol acetate,
  • Polyethylene glycol, cyclonucleanone, propylene glycol methyl ether and the like can be used.
  • the pigment dispersion liquid was 5 parts by weight 0/0 and with respect to the photosensitive resin composition, a total amount
  • the pigment dispersion is included in the above range, it is advantageous to secure process margins, and the color reproducibility and contrast ratio are excellent.
  • the binder resin may be an acrylic binder resin, a cardo binder resin, or a combination thereof.
  • the acrylic resin is a copolymer of a crab 1 ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.
  • the first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
  • To the first ethylenically unsaturated monomer may comprise from 5 parts by weight 0/0 to 50% by weight, such as 10 wt. 0 /. To 40% by weight relative to the total amount of the acrylic binder resin.
  • the second ethylenically unsaturated monomer is an aromatic vinyl compound such as styrene, (X-methylstyrene, vinylluene, vinylbenzylmethyl ether; methyl (meth) acrylate,
  • Unsaturated carboxylic acid ester compounds such as cyclonuclear chamber (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate;
  • Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate;
  • Vinyl cyanide compounds such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; These etc. can be mentioned, These can be used individually or in mixture of 2 or more.
  • acrylic binder resin examples include polybenzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate copolymer,
  • the weight average molecular weight of the binder resin may be 3,000 g / mol to 150,000 g / mol, such as 5,000 g / mol to 50,000 g / mol, such as 20,000 g / mol to 30,000 g / mol. have.
  • the weight average molecular weight of the binder resin is within the above range, the physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent when the color filter is manufactured.
  • the acid value of the binder resin may be 15 mgKOH / g to 60 mgKOH / g, such as 20 mgKOH / g to 50 mgKOH / g.
  • the acid value of the binder resin is within the above range, the resolution of the pixel pattern is excellent.
  • the binder resin is the photosensitive resin composition the total amount by weight of 1 0/0 to 30 parts by weight 0 / with respect to the., For example, may be included in one weight 0 /. To 15% by weight.
  • the binder resin is included in the above range, it is excellent in developability and crosslinking property in the production of color filters to obtain excellent surface smoothness.
  • the photopolymerizable compound has at least one ethylenically unsaturated double bond
  • Monofunctional or polyfunctional esters of (meth) acrylic acid can be used.
  • the photopolymerizable compound may have an ethylenically unsaturated double bond, thereby causing sufficient polymerization during exposure in a pattern forming process to form a pattern having excellent heat resistance, light resistance, and chemical resistance.
  • the photopolymerizable compound examples include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, and neopentyl glycol Di (meth) acrylate, 1, 4- butanediol di (meth) acrylate, 1, 6-nucleic acid diol di (meth) acrylate, bisphenol A di (meth) acrylate, pentaerytrie di (meth) acrylic Tetra (meth) acrylate as a pentaerythrite, tetra (meth) acrylate as a pentaerytrile, nucleus (meth) acrylate as a pentaerythrite, di (meth) acrylate, a dipentaeryte Tree to tree (meth) acrylate, dipentaerythr to penta (meth) acrylate,
  • Tri (meth) acrylate Tri (meth) acrylate, tris (meth) acryloyloxyethyl phosphate, and noblepoxy (meth) acrylate.
  • Examples of monofunctional esters of (meth) acrylic acid include, but are not limited to, Aronix M-101® manufactured by Toagosei Kagaku Kogyo Co., Ltd., M-1 1 1®, M-1 14®, etc .; KAYARAD TC- 1 1 OS®, Copper TC-120S®, etc .; The V-158® and V-231 1® by Osaka Yuki Chemical Co., Ltd. are mentioned.
  • difunctional ester of (meth) acrylic acid examples include, but are not limited to, Aronix M-210®, M-240®, M-6200®, manufactured by Toagosei Chemical Industries, Ltd .; KAYARAD HDDA® from Nihon Kayak Co., Ltd., HX-220®, R-604®, etc .; The V-260®, V-312®, and V-335 HP® by Osaka Yuki Chemical Co., Ltd. are mentioned. Trifunctionality of the (meth) acrylic acid
  • ester examples include Aronix M-309®, M-400®, M-405®, M-450®, M-710®, and M-8030 from Toagosei Kagaku Kogyo Co., Ltd. ®, M-8060®, etc .; Nihon
  • V-295®, copper -300®, copper -360®, copper -GPT®, copper -3PA®, and copper-400® by Osaka Yuki Kayaku High School Co., Ltd.
  • the above products can be used alone or in combination of two or more.
  • the photopolymerizable compound may be used by treating with an acid anhydride in order to impart better developability.
  • the photopolymerizable compounds may be included as one weight 0/0 to 15 parts by weight 0/0, for example, increase of 5 0/0 to 10 parts by weight 0 /. Relative to the total photosensitive resin composition.
  • a photopolymerizable compound is contained in the said range, hardening arises at the time of exposure in a pattern formation process, and it is excellent in reliability, and is excellent in developability to an alkaline developing solution.
  • the photopolymerization initiator is generally used in the photosensitive resin composition
  • an acetophenone type compound As an initiator, an acetophenone type compound, a benzophenone type compound, a thioxanthone type compound, a benzoin type compound, a triazine type compound, an oxime type compound, or a combination thereof can be used, for example.
  • acetophenone-based compound examples include 2,2'-diethoxy acetophenone, 2,2'-dibuoxy acetophenone, 2-hydroxy-2-methylpropiophenone, and ⁇ -t-butyltrichloro Acetophenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholine Nopropane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and the like.
  • benzophenone compounds examples include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4 '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like. Can be.
  • thioxanthone compound examples include thioxanthone, 2-methyl thioxanthone,
  • benzoin compound examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal and the like.
  • triazine compound examples include 2,4,6-trichloro-S-triazine, 2-phenyl 4,6-bis (trichloromethyl) -S-triazine, 2- (3 ', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4'-methoxinaphthyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-lryl) -4,6-bis (trichloromethyl) -S-triazine,
  • oxime compounds examples include 0-acyl oxime compounds, 2- ( 0 -benzoyl oxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- ( 0 -acetyl oxime ) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-
  • 3-yl] ethanone, 0-ethoxycarbonyl- ⁇ -oxyamino-1-phenylpropane-1-one and the like can be used.
  • the 0-acyl oxime compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butane- 1-one, 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-0-benzoate, 1- (4-phenylsulfanylphenyl) -octane-1,2-dione 2 -Oxime-0-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oxime-0-acetate and 1-(4-phenylsulfanylphenyl)-butane-1-silver oxime-0- Acetate and the like.
  • the photopolymerization initiator is a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound,
  • a biimidazole type compound etc. can be used.
  • the photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and transferring energy after being excited.
  • photosensitizer examples include tetraethylene glycol bis-3-mercapto propionate and pentaerythritol with tetrakis-3-mercapto propionate and dipentaerythryl tetrakis- 3-mercapto propionate, etc. are mentioned.
  • the photopolymerization initiator is a photosensitive resin composition, a total amount of 0.01% by weight to 10 parts by weight 0 / with respect to the., For example, 0.1 can be included in a weight 0 /. To 5% by weight.
  • the photopolymerization initiator is included in the above range, curing occurs during exposure in the pattern forming process to obtain excellent reliability, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, The fall of the transmittance
  • the solvent may be a compound having a compatibility with the compound, the pigment, the binder resin, the photopolymerizable compound, and the photopolymerization initiator according to one embodiment, but does not react.
  • solvent examples include alcohols such as methanol and ethanol; Dichloroethyl ether, ⁇ -butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, etc.
  • Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether
  • Cellosolve acetates such as methyl cellosolve acetate, ethyl salosolve acetate and diethyl cellosolve acetate
  • Carbyols such as methyl ethyl carbyol and diethyl carbyl, such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether and diethylene glycol diethyl ether
  • Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate
  • Aromatic hydrocarbons such as toluene and xylene
  • Ketones such as 4-methyl-2-pentanone, methyl - ⁇ -propyl ketone, methyl - ⁇ -butyl ketone, methyl - ⁇ -amyl ketone and 2-heptanone; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, - ⁇ -butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxy acetic acid alkyl esters such as methyl oxy acetate, oxy ethyl acetate and oxy butyl acetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic acid alkyl esters such as methyl 3-
  • ethylene glycol is preferably considered in consideration of compatibility and reactivity.
  • Glycol ethers such as monoethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as 2-hydroxy ethyl propionate; Carbyls such as diethylene glycol monomethyl ether; Propylene glycol alkylether acetates such as propylene glycol monomethylether acetate, propylene glycol propylether acetate, etc. may be used.
  • the solvent may be included in a balance, such as 30 weight% 0. ° to 90 weight% based on the total amount of the photosensitive resin composition.
  • a balance such as 30 weight% 0. ° to 90 weight% based on the total amount of the photosensitive resin composition.
  • the photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion to the substrate, etc./
  • Examples of the epoxy compound include a phenol nobulac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
  • the epoxy compound may be included in an amount of 0.01 to 20 parts by weight, such as 0.1 to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. Epoxy When the compound is included in the above range, the adhesiveness, shelf life and the like are excellent.
  • the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
  • a silane coupling agent having a reactive substituent such as a carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
  • silane-coupling agent examples include trimethoxysilyl benzoic acid, ⁇ -methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, ⁇ -isocyanate propyl triethoxysilane, and ⁇ -glycol.
  • Propyl trimethoxysilane, ⁇ - (3,4-epoxycyclonuclear chamber) ethyltrimethoxysilane, and the like may be cited when used. These may be used alone or in combination of two or more thereof.
  • the silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the above range, it is excellent in adhesion and storage property.
  • the photosensitive resin composition may further include a surfactant in order to improve coating properties and prevent defects, if necessary.
  • surfactant examples include, but are not limited to, BM-1000®, BM-1 100® by BM Chemie, Inc .; Dainippon ingki Kagaku Kogyo Co., Ltd. Mechanical pack ⁇ F 142D®, copper F 172®, 173® F copper, copper F 183®. Etc; Prorad FC-135®, Copper FC-170C®, Copper FC-430®, Copper FC- from Sumitomo 3M Co., Ltd.
  • fluorine-based surfactants such as SH-28PA®, copper -190®, copper -193®, SZ-6032® and SF-8428® can be used.
  • the surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight with respect to 100 parts by weight of the photosensitive resin composition.
  • the surfactant is included in the above range, coating uniformity may be secured, stains may not occur, and wetting of the glass substrate may be performed. ) Is excellent.
  • the photosensitive resin composition may be added a certain amount of other additives such as antioxidants, stabilizers, etc. within a range that does not impair the physical properties.
  • a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
  • the pattern forming process in the color filter is as follows.
  • the photosensitive resin composition is spin-coated, slat coated, inkjet onto a supporting substrate Coating by printing or the like; Drying the coated photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film; The exposed photosensitive resin composition film is developed with an aqueous alkali solution to be photosensitive.
  • the precipitate is filtered off using a filter, washed with water and then added to acetonkrile and stirred at 80 ° C for 30 minutes. After lowering the silver to room temperature, the precipitate was filtered and dried to synthesize a compound (15 g, 86%) represented by the following Chemical Formula S-1.
  • PhenylisotWocyanate (100g : 0.73mol) is slowly added dropwise to the reaction product, and the temperature is reduced to 80 ° C and stirred for 3 hours.
  • the temperature is lowered, the solvent is removed, and then extracted with dichloromethane, and washed with 10% HC1 and water, respectively.
  • 200 g of MeOH was added to the resulting solid compound, stirred at 0 ° C. for 30 minutes, and then filtered, thereby synthesizing the compound represented by the following Chemical Formula S-8 (125 g, 68%).
  • the precipitate was filtered through a filter, washed with MeOH and dried to synthesize a compound (27 g, 90%) represented by Chemical Formula S-10.
  • a compound represented by the following Chemical Formula S-16 was synthesized in the same manner as in (3) of Synthesis Example 3 except that 4-chlorophenacyl bromide was used instead of phenacyl bromide.
  • Lithium bis (trifuloromethane) sulfon imide (L2g, 4.2mmol) was added thereto, and 10 g of DMSO was added thereto and stirred at room temperature for 30 minutes (anion exchange process).
  • the reaction is dropped into water to form a precipitate, which is obtained by separating through a filter.
  • the solid compound obtained through the filter was dissolved in 40 g of acetonitrile, and then 3 g of activated carbon was added thereto and stirred for 30 minutes.
  • Activated carbon was removed through a filter, and the filtrate was removed through distillation and dried to obtain a compound (L82g, 83%) represented by the following Chemical Formula P-1. pi]
  • a photosensitive resin composition according to Comparative Example 4 was prepared. Specifically, the photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours. Binder resin and photopolymerizable monomer were added here, and it stirred at room temperature for 2 hours. To this, after the dye was added (optionally, a pigment dispersion), the mixture was stirred at room temperature for 1 hour, other additives (surfactant) were added, and the mixture was stirred at room temperature for 1 hour. The solution was filtered three times to remove impurities to prepare a photosensitive resin composition.
  • Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9
  • Pigment 1 B 15 6 Pigment Dispersion (Sanyo)
  • the compound represented by the formula (P-1 to P-10) is a compound according to an embodiment, the maximum absorption wavelength and the compound represented by the formula (P-1 1)
  • the photosensitive resin composition prepared in Examples 1 to 10 and Comparative Examples 1 to 4 was applied to a glass substrate having a thickness of 1 mm, degreased, and washed for 2 minutes on a hot plate at 90 ° C. Drying to give a coating. Subsequently, the coating film was exposed by using a high pressure mercury lamp having a dominant wavelength of 365 nm. Obtained by drying in a hot air circulation drying furnace of 200 ° C for 5 minutes. The pixel layer was measured using a spectrophotometer (MCPD3000, Otsuka electronic Co., Ltd.) and the results are shown in Table 4 below.
  • MCPD3000 spectrophotometer
  • Comparative Example 4 18015 From Table 4, the photosensitive resin composition of Examples 1 to 10 containing the compound according to one embodiment as a dye shows an excellent contrast ratio than the photosensitive resin composition of Comparative Examples 1 to 4 not containing the compound You can check it.
  • this invention was demonstrated, this invention is not limited to this, A various deformation
  • transformation is possible in the range of a claim, the detailed description of an invention, and the attached drawing, and also this is within the scope of this invention. It is natural to belong.

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Abstract

Provided are: a compound including cations and anions, wherein the cations are represented by a specific formula; a photosensitive resin composition containing the compound; and a color filter manufactured using the photosensitive resin composition.

Description

【명세서】  【Specification】
【발명의 명칭】  [Name of invention]
신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 【기술분야】  Novel compounds, photosensitive resin compositions and color filters comprising the same
본 기재는 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터에 관한 것이다.  The present disclosure relates to a novel compound, a photosensitive resin composition and a color filter including the same.
【배경기술】 Background Art
안료분산액의 안정한 분산상태 및 미세화를 용이하게 학기 위해, 합성을 통해 얻어진 안료를 솔트밀링 등의 공정을 통해, 일정한 크기의 입자 상태를 가지는 안료를 만들기 위해 여러 연구가 진행되고 있다. 또한, 안료의 경우, 입자 크기에서 비롯되는 휘도와 명암비의 한계가 존재하고, 이미지 센서용 컬러 촬상 소자의 경우에는 미세한 패턴 형성을 위해 더 작은 분산입도를 요구하기 때문에, 안료를 단독으로 사용하지 않고, 안료와 염료를 흔합한 하이브리드 형태의 착색제를 이용하여, 휘도, 명암비 등을 물성을 개선하고자 하는 연구도 진행되고 있다.  In order to easily learn the stable dispersion and miniaturization of the pigment dispersion, a number of studies have been conducted to produce a pigment having a particle size of a certain size through a process such as salt milling the pigment obtained through the synthesis. In addition, in the case of pigments, there are limitations of brightness and contrast ratios resulting from the particle size, and in the case of color imaging devices for image sensors, a smaller dispersion particle size is required to form fine patterns, so that the pigments are not used alone. , Research to improve physical properties of brightness, contrast ratio and the like by using a colorant of a hybrid form in which a pigment and a dye are mixed.
그러나 현재까지, 종래 착색제 등과 비교하여, 내열성, 휘도 등의 물성 개선의 효과가 큰 착색제는 보고되고 있지 않다.  However, to date, no colorant having a large effect of improving physical properties such as heat resistance and luminance has been reported as compared with conventional colorants.
따라서, 감광성 수지 조성물의 제조에 사용되는 착색제로 적합한 화합물에 대한 연구가 필요한 실정이다.  Therefore, there is a need for research on a compound suitable as a colorant used in the preparation of the photosensitive resin composition.
【발명의 상세한 설명】 [Detailed Description of the Invention]
【기술적 과제】  [Technical problem]
일 구현예는 신규한 화합물을 제공하기 위한 것이다.  One embodiment is to provide novel compounds.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.  Another embodiment is to provide a photosensitive resin composition comprising the compound.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된  Another embodiment is prepared using the photosensitive resin composition
컬러필터를 제공하기 위한 것이다. 【기술적 해결방법】 일 구현예는 양이은 및 음이온을 포함하는 화합물을 제공하며, 상기 양이온은 하기 화학식 1로 표시된다. To provide a color filter. Technical Solution One embodiment provides a compound containing cyanide and an anion, wherein the cation is represented by the following formula (1).
Figure imgf000003_0001
Figure imgf000003_0001
상기 화학식 1에서,  In Chemical Formula 1,
R1 내지 R6은 각각 독립적으로 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내지 C20 헤테로아릴기이고, R 1 to R 6 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group,
R7은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 7 is a substituted or unsubstituted C6 to C20 aryl group,
X는 -Ο-, -S- 또는— NR8-(R8은 수소 원자, 치환 또는 비치환된 C1 내지 C10 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기)이다. X is -Ο-, -S- or — NR 8- (R 8 is a hydrogen atom, a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C20 aryl group).
상기 X는 -0- 또는 -S- 일 수 있다.  X may be -0- or -S-.
상기 R1 내지 R4는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기일 수 있다. R 1 to R 4 may be each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 양이온은 하기 화학식 2로 표시될 수 있다. The cation may be represented by the following formula (2).
[화학식 2] [Formula 2]
Figure imgf000004_0001
Figure imgf000004_0001
상기 화학식 2에서,  In Chemical Formula 2,
R9 및 R10은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, R11 ¾ R12는 각각 독립적으로 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 9 and R 10 are each independently a substituted or unsubstituted C1 to C20 alkyl group, and R 11 ¾ R 12 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 An aryl group,
R13은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 13 is a substituted or unsubstituted C6 to C20 aryl group,
R14 내지 R17은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 14 to R 17 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
nl 내지 n4는 각각 독립적으로 0 내지 5의 정수이고, 0≤ nl+n2≤ 5 이고, 0≤ n3+n4 < 5 이고,  nl to n4 are each independently an integer of 0 to 5, 0 ≦ nl + n2 ≦ 5, 0 ≦ n3 + n4 <5,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
상기 양이온은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다. The cation may be represented by any one selected from the group consisting of the following Chemical Formulas 3 to 7.
[화학식 3] [Formula 3]
Figure imgf000005_0001
Figure imgf000005_0001
상기 화학식 3에서,  In Chemical Formula 3,
R18, R19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, ᅳ R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group, and ᅳ
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
[화학식 4]  [Formula 4]
Figure imgf000005_0002
Figure imgf000005_0002
상기 화학식 4에서 R18 내지 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, In Chemical Formula 4 R 18 to R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
[화학식 5]  [Formula 5]
Figure imgf000006_0001
Figure imgf000006_0001
상기 화학식 5에서,  In Chemical Formula 5,
R18 및 R19는 각각독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, R22는 할로겐 원자이고, R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
R27은 치환 또는 비치환된 C6 내지 C20 아릴기이고, ' m은 0 내지 2의 정수이고, R 27 is a substituted or unsubstituted C6 to C20 aryl group, 'm is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다. 화학식 6] X is -0- or -S-. [Formula 6]
Figure imgf000007_0001
Figure imgf000007_0001
상기 화학식 6에서, In Chemical Formula 6,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C110 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C110 alkyl group,
R27 및 R28은 각각 독립적으로 치환 또는 비치환된 C6 내지 C20 아릴기이고 m은 0 내지 2의 정수이고, R 27 and R 28 are each independently a substituted or unsubstituted C6 to C20 aryl group and m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고, n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다. X is -0- or -S-.
[화학식 7] [Formula 7]
Figure imgf000007_0002
Figure imgf000007_0002
상기 화학식 7에서 R18, R19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, ' In Chemical Formula 7 R 18, and R 19 and R 21 are C1 to C20 alkyl groups each independently substituted or unsubstituted, "
R22는 할로겐 원자이고,R 22 is a halogen atom,
23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, 2 3 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
R28은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 28 is a substituted or unsubstituted C6 to C20 aryl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
상기 양이온은 하기 화학식 5-3, 화학식 5-4, 화학식 5-5, 화학식 5-6, 화학식 7-6, 화학식 7-8, 화학식 7-10, 화학식 7-12 및 화학식 7-17 내지 화학식 7-23으로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다.  The cation may be represented by the following Chemical Formulas 5-3, 5-4, 5-5, 5-6, 7-6, 7-8, 7-10, 7-12, and 7-17. It may be represented by any one selected from the group consisting of 7-23.
[화학식 5-3]  [Formula 5-3]
Figure imgf000008_0001
Figure imgf000009_0001
Figure imgf000008_0001
Figure imgf000009_0001
Figure imgf000009_0002
Figure imgf000009_0002
[화학식 5_6] [Formula 5_6]
Figure imgf000010_0001
Figure imgf000010_0001
[화학식 7_8]
Figure imgf000011_0001
[Formula 7_8]
Figure imgf000011_0001
[화학식 7-10]
Figure imgf000011_0002
[Formula 7-10]
Figure imgf000011_0002
Figure imgf000012_0001
Figure imgf000012_0002
Figure imgf000012_0003
7-19]
Figure imgf000013_0001
Figure imgf000012_0001
Figure imgf000012_0002
Figure imgf000012_0003
7-19]
Figure imgf000013_0001
[화학식 7-21]
Figure imgf000013_0002
[화학식 7-22]
[Formula 7-21]
Figure imgf000013_0002
[Formula 7-22]
Figure imgf000014_0001
Figure imgf000014_0001
상기 음이온은 하기 화학식 A 내지 화학식 F로 이루어진 군에서 선택된 하나로 표시될 수 있다.  The anion may be represented by one selected from the group consisting of Formulas A to F.
[화학식 A]
Figure imgf000014_0002
[Formula A]
Figure imgf000014_0002
[화학식 Β]  [Formula Β]
Ο Ο
、 - II  、-II
ο 、ᄋ  ο 、 ᄋ
[화학식 c] [Formula c]
PWl 20 '.40 [화학식 D] PW l 2 0 '.40 [Formula D]
SiW,204o4" SiW, 2 0 4 o 4 "
[화학식 E]  [Formula E]
CF3SO3" CF3SO3 "
[화학식 F]  Formula F]
C104 " C10 4 "
상기 화합물은 염료일 수 있다.  The compound may be a dye.
상기 염료는 청색 염료일 수 있다.  The dye may be a blue dye.
상기 화합물은 600 nm 내지 700 nm의 파장범위에서 최대 흡광도 „ )를 가질 수 있다.  The compound may have a maximum absorbance ') in the wavelength range of 600 nm to 700 nm.
상기 화합물은 400 nm 내지 500 nm의 파장범위에서 Tmax를 가질 수 있다. 다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물올 제공한다. 상기 감광성 수지 조성물은 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함할 수 있다. The compounds may have a T max in the wavelength range of 400 nm to 500 nm. Another embodiment provides a photosensitive resin composition comprising the compound. The photosensitive resin composition may further include a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함할 수 있다.  The photosensitive resin composition may further include a pigment.
또 다른 일 구현예는 상기 감광성 수직 조성물을 이용하여 제조되는 컬러필터를 제공한다.  Another embodiment provides a color filter manufactured using the photosensitive vertical composition.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.  Other details of aspects of the invention are included in the following detailed description.
【유리한 효과】 Advantageous Effects
일 구현예에 따른 화합물은 착색력 및 내열성이 뛰어나며 , 상기 화합물을 포함하는 감광성 수지 조성물을 이용하면 휘도가 우수한 컬러필터의 제조가 가능하다.  The compound according to the embodiment has excellent coloring power and heat resistance, and by using the photosensitive resin composition including the compound, it is possible to prepare a color filter having excellent luminance.
【발명의 실시를 위한 최선의 형태】 [Best form for implementation of the invention]
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다.  Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, by which the present invention is not limited and the present invention is defined only by the scope of the claims to be described later.
본 명세서쎄서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자 (F, Br, Cl 또는 I), 히드톡시기, 니트로기, 시아노기, 아미노기 (NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기임), 아미디노기, 하이드라진기, 하이드라존기, 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기 , 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기, 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다. Unless stated otherwise in the present specification, "substituted" to "substituted" means that of the present invention At least one hydrogen atom of the functional group is a halogen atom (F, Br, Cl or I), a hydroxy group, a nitro group, a cyano group, an amino group (NH 2 , NH (R 200 ) or N (R 201 ) (R 202 ) Wherein R 200 , R 201 and R 202 are the same or different and are each independently C1 to C10 alkyl group), amidino group, hydrazine group, hydrazone group, carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted A substituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heterocyclic group. It means.
본 명세서에서 특별한 언급이 없는 한, "알킬기 "란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C1 내지 C15 알킬기를 의미하고, ' '사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, ' '알콕시기"란 ci 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고,"아릴기 "란 C6 내지 C20 아릴기를 의미하고,  Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, specifically means a C1 to C15 alkyl group, and "'cycloalkyl group" means a C3 to C20 cycloalkyl group, specifically Means a C3 to C18 cycloalkyl group, "'alkoxy group" means a ci to C20 alkoxy group, specifically means a C1 to C18 alkoxy group, "aryl group" means a C6 to C20 aryl group,
구체적으로는 C6 내지 C18 아릴기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, ' '알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고 "아릴렌기' '란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다. Specifically, it refers to a C6 to C18 aryl group, "alkenyl group" means a C2 to C20 alkenyl group, specifically means a C2 to C18 alkenyl group, '' alkylene group 'means a C1 to C20 alkylene group In addition, specifically, it means a C1 to C18 alkylene group, "arylene group" means a C6 to C20 arylene group, and specifically means a C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, " (메타)아크릴레이트 "는  Unless stated otherwise in the specification, "(meth) acrylate"
"아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, " (메타)아크릴산"은 "아크릴산"과 "메타크릴산'' 둘 다 가능함을 의미한다. "Acrylate" and "methacrylate" mean that both are possible, and "(meth) acrylic acid" means that both "acrylic acid" and "methacrylic acid" are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 흔합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고,  Unless otherwise defined herein, “combination” means mixed or copolymerized. In addition, "copolymerization" means block copolymerization or random copolymerization,
"공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다. "Copolymer" means a block copolymer or a random copolymer.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합아 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.  Unless otherwise defined in the chemical formulas herein, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded at the position.
본 명세서에서 별도의 정의가 없는 한, " * "는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다. ' 일 구현예는 양이은 및 음이은을 포함하는 화합물을 제공하며, 상기 양이온은 하기 화학식 1로 표시된다. Unless otherwise defined herein, "*" means a moiety connected to the same or different atoms or formulas. 'An embodiment provides a compound comprising positive and negative silver, The cation is represented by the following formula (1).
Figure imgf000017_0001
Figure imgf000017_0001
상기 화학식 1에서,  In Chemical Formula 1,
R1 내지 R6은 각각 독립적으로 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내지 C20 헤테로아릴기이고, R 1 to R 6 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group,
R7은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 7 is a substituted or unsubstituted C6 to C20 aryl group,
X는 -Ο-, -S- 또는 -NR8-(R8은 수소 원자, 치환 또는 비치환된 C1 내지 C10 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기)이다. X is -Ο-, -S- or -NR 8- (R 8 is a hydrogen atom, a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C20 aryl group).
예컨대, 상기 X는 -0- 또는 -S- 일 수 있다.  For example, X may be -0- or -S-.
예컨대, 상기 R1 내지 R4는 각각 독립적으로 치환또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기일 수 있다. For example, R 1 to R 4 may be each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
최근 고휘도 및 고명암비를 가지는 컬러필터를 제조하기 위해서, 안료보다 내구성이 우수한 염료를 합성하고, 상기 염료를 포함하는 조성물을 이용하여, 컬러필터의 고휘도 및 고명암비를 달성하는 연구가 활발하게 진행되고 있다. 상기 염료 중에서도 청색 염료로 알려진 트리아릴메탄 화합물을 이용한 연구가 많이 진행되고 있다. 상기 트리아릴메탄 염료는 420 nm 내지 450 nm의 파장범위에서 높은 휘도를 가지는 장점이 있으나, PGMEA 등의 유기용매에 대한 용해도가 좋지 않으며 내열성 또한 좋지 않은 단점을 가진다. 약한 내열성을 극복하기 위해 트리아릴메탄 염료에 나프탈렌술폰산, 나프틸아민술폰산 등의 음이온을 이용하려는 시도가 있었으나, 내열성이 크게 개선되지는 않았다.  Recently, in order to manufacture a color filter having a high brightness and high contrast ratio, a study to achieve a high brightness and high contrast ratio of a color filter by synthesizing a dye more durable than the pigment, and using the composition containing the dye, have. Among the dyes, studies using a triarylmethane compound known as a blue dye have been in progress. The triarylmethane dye has the advantage of having a high luminance in the wavelength range of 420 nm to 450 nm, but the solubility in organic solvents such as PGMEA and the like has a disadvantage of poor heat resistance. Attempts have been made to use anions such as naphthalenesulfonic acid and naphthylaminesulfonic acid in the triarylmethane dye to overcome the weak heat resistance, but the heat resistance has not been greatly improved.
일 구현예에 따른 화합물은 상기 화학식 1로 표시되는 양이온을 포함하여, 기존 착색제로 사용되는 화합물, 예컨대 트리아릴메탄 화합물 대비, 우수한 분광 특성과 높은 몰흡광계수를 가지며, 착색력 및 내열성이 우수하고, 사이클로핵사논,Compound according to one embodiment includes a cation represented by the formula (1), excellent spectroscopy, compared to a compound used as a conventional colorant, such as triarylmethane compound Characteristics and high molar extinction coefficient, excellent coloring power and heat resistance, cyclonuxanone,
PGMEA 등의 유기용매에 대한 용해도도 우수하다. 특히, 일 구현예에 따른 화합물은 중심 탄소에 세 개의 고리가 연결되는데, 상기 세 개의 고리 중 하나의 고리가 시아노기를 포함하는 방향족 헤테로 고리를 가지므로, 일 구현예에 따른 화합물을 포함하는 조성물은 휘도 및 내구성이 우수한 컬러필터를 제공할 수 있다. 예컨대, 상기 양이온은 하기 화학식 2로 표시될 수 있다. It also has excellent solubility in organic solvents such as PGMEA. In particular, the compound according to one embodiment has three rings linked to the central carbon, one of the three rings has an aromatic hetero ring containing a cyano group, and thus a composition comprising a compound according to one embodiment Silver can provide a color filter excellent in brightness and durability. For example, the cation may be represented by the following Chemical Formula 2.
[화학식 2]  [Formula 2]
Figure imgf000018_0001
Figure imgf000018_0001
상기 화학식 2에서,  In Chemical Formula 2,
R9 및 R10은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 9 and R 10 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R" 및 R12는 각각 독립적으로 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, R ″ and R 12 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group,
R13은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 13 is a substituted or unsubstituted C6 to C20 aryl group,
R14 내지 R17은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 14 to R 17 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
nl 내지 n4는 각각 독립적으로 0 내지 5의 정수이고, 0≤ nl+n2≤ 5 이고, 0 < n3+n4 < 5 이고,  nl to n4 are each independently an integer of 0 to 5, 0 ≦ nl + n2 ≦ 5, 0 <n3 + n4 <5,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
예컨대, 상기 nl 내지 n4는 각각 독립적으로 0 또는 1의 정수일 수 있다. 예컨대, 상기 할로겐 원자는 F, Cl, Br 또는 I 일 수 있다.  For example, the nl to n4 may be each independently an integer of 0 or 1. For example, the halogen atom may be F, Cl, Br or I.
예컨대, 상기 양이온은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다. [화학식 3]For example, the cation may be represented by any one selected from the group consisting of the following Chemical Formulas 3 to 7. [Formula 3]
Figure imgf000019_0001
Figure imgf000019_0001
상기 화학식 3에서,  In Chemical Formula 3,
R18, R19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, And R 23 to R 26 are C1 to C10 alkyl groups each independently selected from ring a halogen atom or a substituted or unsubstituted,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 이다.  X is -0- or.
[화학식 4]  [Formula 4]
Figure imgf000019_0002
Figure imgf000019_0002
상기 화학식 4에서 R1S 내지 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, In Chemical Formula 4 1S and R to R 21 are C1 to C20 alkyl groups each independently substituted or unsubstituted,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각,독립적으로 할로겐 원자 또는 치환 또는 비치환된 C 1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C 1 to C 10 alkyl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
[화학식 5]  [Formula 5]
Figure imgf000020_0001
Figure imgf000020_0001
상기 화학식 5에서,  In Chemical Formula 5,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고 R22는 할로겐 원자이고, R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group and R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
R27은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 27 is a substituted or unsubstituted C6 to C20 aryl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다. [화학식 6] X is -0- or -S-. [Formula 6]
Figure imgf000021_0001
Figure imgf000021_0001
상기 화학식 6에서, In Chemical Formula 6,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고 R22는 할로겐 원자이고, R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group and R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환또는 비치환된 C110 알킬기이고, ' And R 23 to R 26 each independently represent a halogen atom or a substituted or unsubstituted C110 alkyl group, '
R27 및 R28은 각각 독립적으로 치환 또는 비치환된 C6 내지 C20 아릴기이고 : m은 0 내지 2의 정수이고, R 27 and R 28 are each independently a substituted or unsubstituted C6 to C20 aryl group : m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고, n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다. X is -0- or -S-.
[화학식 7] [Formula 7]
Figure imgf000021_0002
Figure imgf000021_0002
상기 화학식 7에서 R18, R19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, In Chemical Formula 7 R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C 10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
R28은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 28 is a substituted or unsubstituted C6 to C20 aryl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
예컨대, 상기 양이온은 하기 화학식 3-1, 화학식 3-2, 화학식 4-1 내지 화학식 4-3, 화학식 5-1 내지 화학식 5-8, 화학식 6-1 내지 화학식 6-19 및 화학식 7-1 내지 화학식 7-23으로 이루어진 군에서 선택된 어느 하나로 표시될 수 있으나, 이에 한정되는 것은 아니다.  For example, the cation is represented by the following Chemical Formula 3-1, Chemical Formula 3-2, Chemical Formula 4-1 to Chemical Formula 4-3, Chemical Formula 5-1 to Chemical Formula 5-8, Chemical Formula 6-1 to Chemical Formula 6-19, and Chemical Formula 7-1. It may be represented by any one selected from the group consisting of Formula 7-23, but is not limited thereto.
[화학식 3-1]  [Formula 3-1]
Figure imgf000022_0001
Figure imgf000023_0001
Figure imgf000024_0001
Figure imgf000025_0001
Figure imgf000022_0001
Figure imgf000023_0001
Figure imgf000024_0001
Figure imgf000025_0001
 
Figure imgf000026_0001
Figure imgf000027_0001
[화학식 5-8]
Figure imgf000028_0001
Figure imgf000026_0001
Figure imgf000027_0001
[Formula 5-8]
Figure imgf000028_0001
Figure imgf000028_0002
Figure imgf000029_0001
Figure imgf000028_0002
Figure imgf000029_0001
Figure imgf000029_0002
Figure imgf000031_0001
[화학식 6-8]
Figure imgf000032_0001
Figure imgf000029_0002
Figure imgf000031_0001
[Formula 6-8]
Figure imgf000032_0001
Figure imgf000032_0002
Figure imgf000033_0001
[화학식 6-12]
Figure imgf000034_0001
Figure imgf000032_0002
Figure imgf000033_0001
[Formula 6-12]
Figure imgf000034_0001
Figure imgf000034_0002
Figure imgf000035_0001
Figure imgf000036_0001
Figure imgf000034_0002
Figure imgf000035_0001
Figure imgf000036_0001
Figure imgf000037_0001
Figure imgf000037_0001
[화학식 6-19]
Figure imgf000037_0002
[화학식 7-1
[Formula 6-19]
Figure imgf000037_0002
[Formula 7-1
Figure imgf000038_0001
Figure imgf000038_0001
Figure imgf000039_0001
Figure imgf000040_0001
Figure imgf000041_0001
Figure imgf000042_0001
[화학식 7-ΙΓ]
Figure imgf000043_0001
Figure imgf000039_0001
Figure imgf000040_0001
Figure imgf000041_0001
Figure imgf000042_0001
[Formula 7-ΙΓ]
Figure imgf000043_0001
Figure imgf000043_0002
Figure imgf000043_0002
Figure imgf000044_0001
Figure imgf000044_0001
[화학식 7-15]
Figure imgf000045_0001
[Formula 7-15]
Figure imgf000045_0001
Figure imgf000045_0002
[화학식 7-17]
Figure imgf000046_0001
Figure imgf000045_0002
[Formula 7-17]
Figure imgf000046_0001
Figure imgf000046_0002
Figure imgf000046_0002
Figure imgf000046_0003
[화학식 7-20]
Figure imgf000047_0001
Figure imgf000046_0003
[Formula 7-20]
Figure imgf000047_0001
[화학식 7-21]
Figure imgf000047_0002
Figure imgf000047_0003
[화학식 7-23]
[Formula 7-21]
Figure imgf000047_0002
Figure imgf000047_0003
[Formula 7-23]
Figure imgf000048_0001
Figure imgf000048_0001
일 구현예에 따른 화합물은 음이온을 포함하며, 상기 음이온은 하기 화학식 A 내지 화학식 F로 이루어진 군에서 선택된 어느 하나로 표 ᅵ될 수 있으나, 이에 한정되는 것은 아니다.  The compound according to one embodiment includes an anion, and the anion may be represented by any one selected from the group consisting of Formulas A to F, but is not limited thereto.
[화학식 A] [Formula A]
Β]  Β]
Figure imgf000048_0003
Figure imgf000048_0003
[화학식 C]  [Formula C]
PW12O40 3-PW 12 O 40 3-
[화학식 D] [Formula D]
SiW!2O40 4" SiW ! 2 O 40 4 "
[화학식 E]  [Formula E]
CF3S03 " CF 3 S0 3 "
[화학식 F]  Formula F]
C104 " C10 4 "
일 구현예에 따른 화합물은 상기 화학식 1로 표시되는 양이온을  Compound according to one embodiment is a cation represented by the formula (1)
포함함으로써, 적은 양으로도 보다 선명한 색의 발현이 가능하여, 착,색제로 사용 휘도나 명암비 등의 색특성이 우수한 디스플레이 소자의 제조가 가능하다. 예컨대 상기 화합물은 착색제, 예컨대 염료, 예컨대 청색 염료, 예컨대 600 nm 내지 700 nm의 파장범위, 예컨대 610 nm 내지 680 nm의 파장범위, 예컨대 610 nm 내지 650 rnn의 파장범위에서 최대 흡광도 (^ 를 가지는 염료일 수 있다. 예컨대, 상기 화합물은 400 nm 내지 500 nm의 파장범위, 예컨대 420 nm 내지 450 nm의 파장범위, 예컨대 430 nm 내지 440 nm의 파장범위에서 T應를 가지는 염료일 수 있다 . Tmax는 최대 투과도를 의미할 수 있다. By virtue of this, the vivid color can be expressed even in a small amount, and the display device can be manufactured excellent in color characteristics such as brightness and contrast ratio used as a coloring agent. for example The compound may be a colorant such as a dye such as a blue dye such as a dye having a maximum absorbance (^ in a wavelength range of 600 nm to 700 nm, such as a wavelength range of 610 nm to 680 nm, such as 610 nm to 650 rnn. may. for example, the compound may be a dye having a T應in the wavelength range of 400 nm to a wavelength range of 500 nm, for example 420 nm to the 450 nm wavelength range, such as 430 nm to 440 nm. T max is the maximum Permeability may mean.
일반적으로, 염료는 컬러필터 내에 사용되는 구성성분 중 가장 고가의 구성성분이다. 그러므로, 원하는 효과, 예컨대 고휘도나 고명암비 등을 달성하기 위해서는 고가의 염료를 더 많이 사용해야 하기 때문에 생산 단가가 상승할 수 밖에 없었다. 그러나, 일 구현예에 따른 화합물을 컬러필터 내 염료로 사용하는 경우, 적은 양으로도 고휘도, 고명암비 등의 우수한 색특성을 달성할 수 있어 생산 단가의 절감이 가능하다.  In general, dyes are the most expensive of the components used in color filters. Therefore, in order to achieve a desired effect such as high brightness or high contrast ratio, more expensive dyes have to be used. However, when using the compound according to the embodiment as a dye in the color filter, it is possible to achieve excellent color characteristics such as high brightness, high contrast ratio even in a small amount it is possible to reduce the production cost.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 화합물을 포함하는 감광성 수지 조성물을 제공한다.  According to another embodiment, a photosensitive resin composition including the compound according to the embodiment is provided.
예컨대, 상기 감광성 수지 조성물은 상기 일 구현예에 따른 화합물, 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 포함할 수 있다.  For example, the photosensitive resin composition may include a compound, a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent according to the embodiment.
예컨대, 상기 감광성 수지 조성물은 안료를 더 포함할 수도 있다.  For example, the photosensitive resin composition may further include a pigment.
상기 일 구현예에 따른 화합물은 감광성 수지 조성물 내에서 착색제, 예컨대 염료, 예컨대 청색 염료로서의 역할을 하여, 우수한 색특성을 발현할 수 있다. 일 구현예에 따른 화합물은 상기 감광성 수지 조성물 총량에 대해' 1 중량 % 내지 10 중량 %, 예컨대 3 중량0 /0 내지 7 중량0 /。로 포함될 수 있다ᅳ 상기 범위로 일 구현예에 따른 화합물이 포함될 경우 색재현율 및 명암비가 우수해진다. The compound according to the embodiment may serve as a colorant such as a dye such as a blue dye in the photosensitive resin composition, and may express excellent color characteristics. The compounds according to the embodiment can be included as 1% to 10% by weight, for example, 3 parts by weight 0/0 to 7 parts by weight 0 /. With respect to the photosensitive resin composition the total amount of the compounds according to the embodiment as eu the range When included, color reproducibility and contrast ratio are excellent.
상기 안료는 청색 안료, 황색 안료, 녹색 안료, 적색 안료, 바이을렛 안료 또는 이들의 조합 등을 포함할 수 있으나 이에 한정되는 것은 아니다. 예컨대 상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.  The pigment may include, but is not limited to, a blue pigment, a yellow pigment, a green pigment, a red pigment, a violet pigment, or a combination thereof. For example, the pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다.  The pigment dispersion may include a solid pigment, a solvent and a dispersant for uniformly dispersing the pigment in the solvent.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량0 /0 내지 20 중량0 /0, 예컨대 8 중량% 내지 20 중량0 /。, 예컨대 15 중량0 /。 내지 20 중량 %, 예컨대 8 중량% 내지 15 중량0 /0, 예컨대 10 중량0 /。 내지 20 중량0 /。, 예컨대 10 중량0 /0 내지 15 중량 %로 포함될 수 있다. Pigments of the solid is 1 wt. 0/0 to 20 parts by weight 0/0, for example, 8% by weight to 20 parts by weight 0 / with respect to the pigment dispersion the total amount., Such as 15 wt. 0 /. To about 20 wt%, such as 8% to about 15 weight 0/0, for example, 10 parts by weight 0 /. to 20 parts by weight 0 /., such as 10 wt. 0/0 to 15 It may be included in weight percent.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물, 알코올알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.  As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, or the like may be used. Specific examples of the dispersant include polyalkylene glycols and esters thereof, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, and carboxylic acids. Salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK- 101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,  Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,
DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182,
DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의 EFKA-47, EFKA- 47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000,Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社와 ΡΒ7Π, ΡΒ821 등이 있다. DISPERBYK-2000, DISPERBYK-2001, and the like; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. of EFKA Chemical Co., Ltd .; Zenspera Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000, and the like; Or Ajinomoto, ΡΒ7Π, ΡΒ821.
상기 분산제는 안료분산액 총량에 대하여 1 중량 % 내지 20 중량%로 ' 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어 감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용 시 광학적, 물리적 및 화학적 품질을 유지할 수 있다. The dispersing agent may comprise from 1% to 20% by weight relative to the total amount of the pigment dispersion. When the dispersant is included in the above range, it is possible to maintain an appropriate viscosity to excellent dispersibility of the photosensitive resin composition, thereby maintaining the optical, physical and chemical quality in the product application.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트,  Examples of the solvent for forming the pigment dispersion include ethylene glycol acetate,
에틸샐로솔브, 프로필렌글리콜 모노메틸에테르아세테이트, 에틸락테이트, Ethyl salosolve, propylene glycol monomethyl ether acetate, ethyl lactate,
폴리에틸렌글리콜, 사이클로핵사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. Polyethylene glycol, cyclonucleanone, propylene glycol methyl ether and the like can be used.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 5 중량0 /0 내지The pigment dispersion liquid was 5 parts by weight 0/0 and with respect to the photosensitive resin composition, a total amount
30 중량%, 예컨대 10 중량% 내지 25 중량0 /。로 포함될 수 있다. 상기 30 weight percent, such as 10 weight percent to 25 weight 0 /. remind
안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다. When the pigment dispersion is included in the above range, it is advantageous to secure process margins, and the color reproducibility and contrast ratio are excellent.
상기 바인더 수지는 아크릴계 바인더 수지, 카도계 바인더 수지 또는 이들의 조합일 수 있다. 상기 아크릴계 수지는 게 1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제 2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지일 수 있다. The binder resin may be an acrylic binder resin, a cardo binder resin, or a combination thereof. The acrylic resin is a copolymer of a crab 1 ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.
상기 제 1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산, 또는 이들의 조합을 들 수 았다.  The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 게 1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량0 /0 내지 50 중량 %, 예컨대 10 중량0 /。 내지 40 중량 %로 포함될 수 있다. To the first ethylenically unsaturated monomer may comprise from 5 parts by weight 0/0 to 50% by weight, such as 10 wt. 0 /. To 40% by weight relative to the total amount of the acrylic binder resin.
상기 제 2 에틸렌성 불포화 단량체는 스티렌, (X-메틸스티렌, 비닐를루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸 (메타)아크릴레이트,  The second ethylenically unsaturated monomer is an aromatic vinyl compound such as styrene, (X-methylstyrene, vinylluene, vinylbenzylmethyl ether; methyl (meth) acrylate,
에틸 (메타)아크릴레이트, 부틸 (메타)아크릴레이트, 2-히드록시에틸 (메타)아크릴레이트, 2-히드록사부틸 (메타)아크릴레이트, 벤질 (메타)아크릴레이트, Ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxysabutyl (meth) acrylate, benzyl (meth) acrylate,
사이클로핵실 (메타)아크릴레이트, 페닐 (메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물 ; 2-아미노에틸 (메타)아크릴레이트 , 2- 디메틸아미노에틸 (메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; Unsaturated carboxylic acid ester compounds such as cyclonuclear chamber (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate;
글리시딜 (메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물;Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate;
(메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 흔합하여 사용할 수 있다. Vinyl cyanide compounds such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; These etc. can be mentioned, These can be used individually or in mixture of 2 or more.
상기 아크릴계 바인더 수지의 구체적인 예로는 폴리벤질메타크릴레이트 공중합체, (메타)아크릴산 /벤질메타크릴레이트 공중합체,  Specific examples of the acrylic binder resin include polybenzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate copolymer,
(메타)아크릴산 /벤질메타크릴레이트 /스티렌 공중합체, (Meth) acrylic acid / benzyl methacrylate / styrene copolymer,
(메타)아크릴산 /벤질메타크릴레이트 /2-히드록시에틸메타크릴레이트 공중합체, (Meth) acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer,
(메타)아크릴산 /벤질메타크릴레이트 /스티렌 /2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.  (Meth) acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, etc. are mentioned, It is not limited to these, These can also be used individually or in combination of 2 or more types.
상기 바인더 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의.물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조 시 가판과의 밀착성이 우수하다. The weight average molecular weight of the binder resin may be 3,000 g / mol to 150,000 g / mol, such as 5,000 g / mol to 50,000 g / mol, such as 20,000 g / mol to 30,000 g / mol. have. When the weight average molecular weight of the binder resin is within the above range, the physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent when the color filter is manufactured.
상기 바인더 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 바인더 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다.  The acid value of the binder resin may be 15 mgKOH / g to 60 mgKOH / g, such as 20 mgKOH / g to 50 mgKOH / g. When the acid value of the binder resin is within the above range, the resolution of the pixel pattern is excellent.
상기 바인더 수지는 상기 감광성 수지 조성물 총량에 대하여 1 중량0 /0 내지 30 중량0 /。, 예컨대 1 중량0 /。 내지 15 중량 %로 포함될 수 있다. 바인더 수지가 상기 범위 내로 포함될 경우, 컬러필터 제조 시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다. The binder resin is the photosensitive resin composition the total amount by weight of 1 0/0 to 30 parts by weight 0 / with respect to the., For example, may be included in one weight 0 /. To 15% by weight. When the binder resin is included in the above range, it is excellent in developability and crosslinking property in the production of color filters to obtain excellent surface smoothness.
상기 광중합성 화합물은 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 The photopolymerizable compound has at least one ethylenically unsaturated double bond
(메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다. Monofunctional or polyfunctional esters of (meth) acrylic acid can be used.
광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.  The photopolymerizable compound may have an ethylenically unsaturated double bond, thereby causing sufficient polymerization during exposure in a pattern forming process to form a pattern having excellent heat resistance, light resistance, and chemical resistance.
광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디 (메타)아크릴레이트, 디에틸렌 글리콜 디 (메타)아크릴레이트, 트리에틸렌 글리콜 디 (메타)아크릴레이트, 프로필렌 글리콜 디 (메타)아크릴레이트, 네오펜틸 글리클 디 (메타)아크릴레이트 , 1,4- 부탄디올 디 (메타)아크릴레이트 , 1 ,6-핵산디올 디 (메타)아크릴레이트, 비스페놀 A 디 (메타)아크릴레이트, 펜타에리트리를 디 (메타)아크릴레이트, 펜타에리트리를 트리 (메타)아크릴레이트, 펜타에리트리를 테트라 (메타)아크릴레이트, 펜타에리트리를 핵사 (메타)아크릴레이트, 디펜타에리트리를 디 (메타)아크릴레이트, 디펜타에리트리를 트리 (메타)아크릴레이트, 디펜타에리트리를 펜타 (메타)아크릴레이트,  Specific examples of the photopolymerizable compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, and neopentyl glycol Di (meth) acrylate, 1, 4- butanediol di (meth) acrylate, 1, 6-nucleic acid diol di (meth) acrylate, bisphenol A di (meth) acrylate, pentaerytrie di (meth) acrylic Tetra (meth) acrylate as a pentaerythrite, tetra (meth) acrylate as a pentaerytrile, nucleus (meth) acrylate as a pentaerythrite, di (meth) acrylate, a dipentaeryte Tree to tree (meth) acrylate, dipentaerythr to penta (meth) acrylate,
디펜타에리트리를 핵사 (메타)아크릴레이트, 비스페놀 A 에폭시 (메타)아크릴레이트, 에틸렌 글리콜 모노메틸에'테르 (메타)아크릴레이트, 트리메틸을 프로판 Dipentaerythritol nucleated (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ' ter (meth) acrylate, trimethyl propane
트리 (메타)아크릴레이트, 트리스 (메타)아크릴로일옥시에틸 포스페이트, 노블락에폭시 (메타)아크릴레이트 등을 들 수 있다. Tri (meth) acrylate, tris (meth) acryloyloxyethyl phosphate, and noblepoxy (meth) acrylate.
광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기  Examples of commercially available products of the photopolymerizable compound are as follows. remind
(메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-101®, 동 M-1 1 1®, 동 M-1 14® 등;.니흔 가야꾸 (주)社의 KAYARAD TC- 1 1 OS®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교 (주)社의 V-158®, V-231 1® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니흔 가야꾸 (주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교 (주)社의 V- 260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 Examples of monofunctional esters of (meth) acrylic acid include, but are not limited to, Aronix M-101® manufactured by Toagosei Kagaku Kogyo Co., Ltd., M-1 1 1®, M-1 14®, etc .; KAYARAD TC- 1 1 OS®, Copper TC-120S®, etc .; The V-158® and V-231 1® by Osaka Yuki Chemical Co., Ltd. are mentioned. Examples of the difunctional ester of (meth) acrylic acid include, but are not limited to, Aronix M-210®, M-240®, M-6200®, manufactured by Toagosei Chemical Industries, Ltd .; KAYARAD HDDA® from Nihon Kayak Co., Ltd., HX-220®, R-604®, etc .; The V-260®, V-312®, and V-335 HP® by Osaka Yuki Chemical Co., Ltd. are mentioned. Trifunctionality of the (meth) acrylic acid
에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060® 등; 니흔 Examples of the ester include Aronix M-309®, M-400®, M-405®, M-450®, M-710®, and M-8030 from Toagosei Kagaku Kogyo Co., Ltd. ®, M-8060®, etc .; Nihon
가야꾸 (주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동 -30®, 동 -60®, 동 -120® 등; KAYARAD TMPTA®, Copper DPCA-20®, Copper -30®, Copper -60®, Copper -120®, etc. manufactured by Kayaku Co., Ltd .;
오사카 유끼 가야꾸 고교 (주)社의 V-295®, 동 -300®, 동 -360®, 동 -GPT®, 동 -3PA®, 동- 400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다. And V-295®, copper -300®, copper -360®, copper -GPT®, copper -3PA®, and copper-400® by Osaka Yuki Kayaku High School Co., Ltd. The above products can be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.  The photopolymerizable compound may be used by treating with an acid anhydride in order to impart better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 1 중량0 /0 내지 15 중량0 /0, 예컨대 5 증량0 /0 내지 10 중량0 /。로 포함될 수 있다. 광중합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 층분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다. The photopolymerizable compounds may be included as one weight 0/0 to 15 parts by weight 0/0, for example, increase of 5 0/0 to 10 parts by weight 0 /. Relative to the total photosensitive resin composition. When a photopolymerizable compound is contained in the said range, hardening arises at the time of exposure in a pattern formation process, and it is excellent in reliability, and is excellent in developability to an alkaline developing solution.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는  The photopolymerization initiator is generally used in the photosensitive resin composition
개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물 또는 이들의 조합을 사용할 수 있다. As an initiator, an acetophenone type compound, a benzophenone type compound, a thioxanthone type compound, a benzoin type compound, a triazine type compound, an oxime type compound, or a combination thereof can be used, for example.
상기 아세토페논계의 화합물의 예로는 , 2,2'-디에톡시 아세토페논, 2,2'-디부록시 아세토페논, 2-히드록시 -2-메틸프로피오페논 , ρ-t-부틸트리클로로 아세토페논, p-t- 부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로 -4-페녹시 아세토페논, 2- 메틸 -1-(4- (메틸티오)페닐) -2-모폴리노프로판 -1-온, 2-벤질 -2-디메틸아미노 -1-(4- 모폴리노페닐) -부탄 -1-온 등을 들 수 있다.  Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibuoxy acetophenone, 2-hydroxy-2-methylpropiophenone, and ρ-t-butyltrichloro Acetophenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholine Nopropane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and the like.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'- 비스 (디메틸 아미노)벤조페논, 4,4'-비스 (디에틸아미노)벤조페논, 4,4'- 디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸 -2-메록시벤조페논 등을 들 수 있다. Examples of the benzophenone compounds include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4 '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like. Can be.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤,  Examples of the thioxanthone compound include thioxanthone, 2-methyl thioxanthone,
이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2- 클로로티오크산톤 등을 들 수 있다. Isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- diisopropyl thioxanthone, 2-chloro thioxanthone, etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.  Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal and the like.
상기 트리아진계 화합물의 예로는 , 2,4,6-트리클로로 -S-트리아진, 2-페닐 4,6- 비스 (트리클로로메틸) -S-트리아진, 2-(3', 4'-디메톡시스티릴) -4,6-비스 (트리클로로메틸) -S- 트리아진, 2-(4'-메특시나프틸 )-4,6-비스 (트리클로로메틸) -S-트리아진, 2-(p-메특시페닐) - 4,6-비스 (트리클로로메틸) -S-트리아진, 2-(p-를릴) -4,6-비스 (트리클로로 메틸) -S-트리아진, Examples of the triazine compound include 2,4,6-trichloro-S-triazine, 2-phenyl 4,6-bis (trichloromethyl) -S-triazine, 2- (3 ', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4'-methoxinaphthyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-lryl) -4,6-bis (trichloromethyl) -S-triazine,
2-비페닐 4,6-비스 (트리클로로 메틸) -S-트리아진, 비스 (트리클로로메틸) -6-스티릴 -S- 트리아진, 2- (나프토 -1-일) -4,6-비스 (트리클로로메틸) -S-트리아진, 2-(4-메톡시나프토 -1- 일)ᅳ 4,6-비스 (트리클로로메틸) -S-트리아진, 2-4-비스 (트리클로로메틸) -6-피페로닐 -S- 트리아진, 2-4-비스 (트리클로로메틸) -6-(4-메특시스티릴) -S-트리아진 등을 들 수 있다. 상기 옥심계 화합물의 예로는 , 0-아실옥심계 화합물 , 2-(0-벤조일옥심) -1-[4- (페닐티오)페닐] -1 ,2-옥탄디온, 1-(0-아세틸옥심) -1-[9-에틸 -6-(2-메틸벤조일) -9H-카르바졸-2-biphenyl 4,6-bis (trichloromethyl) -S-triazine, bis (trichloromethyl) -6-styryl -S-triazine, 2- (naphtho-1-yl) -4, 6-bis (trichloromethyl) -S- triazine, 2- (4-methoxy-naphtho-1-yl) eu 4, 6-bis (trichloromethyl) -S- triazine, 2-4-bis (Trichloromethyl) -6-piperonyl-S-triazine, 2-4-bis (trichloromethyl) -6- (4-mesoxystyryl) -S-triazine, etc. are mentioned. Examples of the oxime compounds include 0-acyl oxime compounds, 2- ( 0 -benzoyl oxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- ( 0 -acetyl oxime ) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-
3-일]에탄온 , 0-에록시카르보닐 -α-옥시아미노 -1-페닐프로판 -1-온 등을 사용할 수 있다. 상기 0-아실옥심계 화합물의 구체적인 예로는 , 1,2-옥탄디온, 2-디메틸아미노 -2-(4- 메틸벤질) -1-(4-모르폴린 -4-일-페닐) -부탄 -1-온, 1-(4-페닐술파닐페닐) -부탄 -1,2-디온 2- 옥심 -0-벤조에이트, 1-(4-페닐술파닐페닐) -옥탄 -1,2-디온 2-옥심 -0-벤조에이트, 1-(4- 페닐술파닐페닐) -옥탄 -1-온옥심 -0-아세테이트 및 1-(4-페닐술파닐페닐) -부탄 -1-은옥심- 0-아세테이트 등을 들 수 있다. 3-yl] ethanone, 0-ethoxycarbonyl-α-oxyamino-1-phenylpropane-1-one and the like can be used. Specific examples of the 0-acyl oxime compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butane- 1-one, 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-0-benzoate, 1- (4-phenylsulfanylphenyl) -octane-1,2-dione 2 -Oxime-0-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oxime-0-acetate and 1-(4-phenylsulfanylphenyl)-butane-1-silver oxime-0- Acetate and the like.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물,  The photopolymerization initiator is a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound,
비이미다졸계 화합물 등을 사용할 수 있다. A biimidazole type compound etc. can be used.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반웅을 일으키는 광 증감제와 함께 사용될 수도 있다.  The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and transferring energy after being excited.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스 -3-머캡토 프로피오네이트, 펜타에리트리를 테트라키스 -3-머캡토 프로피오네이트, 디펜타에리트리를 테트라키스- 3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate and pentaerythritol with tetrakis-3-mercapto propionate and dipentaerythryl tetrakis- 3-mercapto propionate, etc. are mentioned.
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 10 중량0 /。, 예컨대 0.1 중량0 /。 내지 5 중량%로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 층분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반웅 개시제로 인한 투과율의 저하를 막을 수 있다. The photopolymerization initiator is a photosensitive resin composition, a total amount of 0.01% by weight to 10 parts by weight 0 / with respect to the., For example, 0.1 can be included in a weight 0 /. To 5% by weight. When the photopolymerization initiator is included in the above range, curing occurs during exposure in the pattern forming process to obtain excellent reliability, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, The fall of the transmittance | permeability can be prevented.
상기 용매는 일 구현예에 따른 화합물, 상기 안료,상기 바인더 수지, 상기 광중합성 화합물 및 상기 광중합 개시제와의 상용성을 가지되 반웅하지 않는물질들이 사용될 수 있다.  The solvent may be a compound having a compatibility with the compound, the pigment, the binder resin, the photopolymerizable compound, and the photopolymerization initiator according to one embodiment, but does not react.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르 , η- 부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 Examples of the solvent include alcohols such as methanol and ethanol; Dichloroethyl ether, η -butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, etc.
에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 샐로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비롤, 디에틸 카르비를, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비롤류; 프로필렌 글리콜 메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 를루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로핵사논, 4-히드록시-Ethers; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl salosolve acetate and diethyl cellosolve acetate; Carbyols, such as methyl ethyl carbyol and diethyl carbyl, such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Methyl ethyl ketone, cyclonucleanone, 4-hydroxy-
4-메틸 -2-펜타논, 메틸 -η-프로필케톤, 메틸 -η-부틸케톤, 메틸 -η-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산 -η-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메록시 초산 메틸, 메특시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에특시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메록시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에특시 프로피온산 에틸, 3-에록시 프로피온산 메틸 등의 3- 알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피은산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메록시 프로피온산 메틸, 2-메록시 프로피온산 에틸, 2-에록시 프로피온산 에틸, 2-에특시 프로피은산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시 -2-메틸 프로피온산 메틸, 2-옥시 -2-메틸 프로피은산 에틸 등의 2-옥시 -2-메틸 프로피온산 에스테르류, 2-메특시 -2-메틸 프로피은산 메틸, 2-에록시 -2-메틸 프로피온산 에틸 등의 2-알콕시 -2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2- 히드록시 프로피온산 에틸, 2-히드록시 -2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시 -3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한 , Ν-메틸포름아미드 , Ν,Ν-디메틸포름아미드, N- 메틸포름아닐라드, Ν-메틸아세트아미드, Ν,Ν-디메틸아세트아미드 , Ν-메틸피를리돈, 디메틸술폭시드, 벤질에틸에테르, 디핵실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄을, 1-노난올, 벤질알코을, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸 , γ-부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다ᅳ Ketones such as 4-methyl-2-pentanone, methyl -η-propyl ketone, methyl -η-butyl ketone, methyl -η-amyl ketone and 2-heptanone; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, -η-butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxy acetic acid alkyl esters such as methyl oxy acetate, oxy ethyl acetate and oxy butyl acetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic acid alkyl esters such as methyl 3-oxy propionate and ethyl 3-oxypropionate; 3-alkoxy propionic acid alkyl esters such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate and 3-hydroxy methyl propionate; 2-oxy propionic acid alkyl esters such as 2-oxy methyl propionate, 2-oxy ethyl propionate and 2-oxy propionic acid propyl; 2-methoxy 2-alkoxy propionic acid alkyl esters such as methyl propionate, ethyl 2-methoxy propionate, ethyl 2-ethoxy propionate and methyl 2-propyne propionate; 2-oxy-2-methyl propionic acid esters, such as 2-oxy-2-methyl propionate methyl and 2-oxy-2-methyl propionate, 2-methoxy-2-methyl propionate methyl, 2-ethoxy- Monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl propionic acid alkyls such as 2-methyl ethyl propionate; Esters such as 2-hydroxy ethyl propionate, 2-hydroxy-2-methyl ethyl propionate, ethyl hydroxy acetate, and 2-hydroxy-3-methyl butanoate; Ketone acid esters such as ethyl pyruvate, and the like; Ν-methylformamide, Ν, Ν-dimethylformamide, N-methylformanile, Ν-methylacetamide, Ν, Ν-dimethylacetamide , N-methylpyridone, dimethyl sulfoxide, benzyl ethyl ether, dinucleosil ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octane, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid High boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate;
이들 중 좋게는 상용성 및 반응성을 고려하여, 에틸렌 글리콜  Among these, ethylene glycol is preferably considered in consideration of compatibility and reactivity.
모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류 ; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리뽈 모노메틸에테르 등의 카르비를류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류가사용될 수 있다ᅳ Glycol ethers such as monoethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as 2-hydroxy ethyl propionate; Carbyls such as diethylene glycol monomethyl ether; Propylene glycol alkylether acetates such as propylene glycol monomethylether acetate, propylene glycol propylether acetate, etc. may be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 30 중량0 /。 내지 90 중량 %로 포함될 수 있다. 용매가 상기 범위 내로 포함될 경우 상기 감광성 수지 조성물이 적절한 점도를 가짐에 따라 컬러필터 제조 시 공정성이 우수하다. The solvent may be included in a balance, such as 30 weight% 0. ° to 90 weight% based on the total amount of the photosensitive resin composition. When the solvent is included in the above range, as the photosensitive resin composition has an appropriate viscosity, the processability is excellent in manufacturing a color filter.
다른 일 구현예에 따른 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다/  The photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion to the substrate, etc./
상기 에폭시 화합물의 예로는, 페놀 노불락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 Α형 에폭시 화합물, 지환족 에폭시화합물 또는 이들의 조합을 들 수 있다.  Examples of the epoxy compound include a phenol nobulac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
상기 에폭시 화합물은 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 20 중량부, 예컨대 0.1 중량부 내지 10 중량부로 포함될 수 있다. 에폭시 화합물이 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The epoxy compound may be included in an amount of 0.01 to 20 parts by weight, such as 0.1 to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. Epoxy When the compound is included in the above range, the adhesiveness, shelf life and the like are excellent.
또한 상기 감광성 수지 조성물은 기판과의 접착성을 향상시키기 위해 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 등의 반응성 치환기를 갖는 실란 커플링제를 더 포함할 수 있다.  In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
상기 실란—커플링제의 예로는, 트리메록시실릴 벤조산 , γ-메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란 , γ-이소시아네이트 프로필 트리에록시실란 , γ-글리시독시 프로필 트리메톡시실란 , β-(3,4- 에폭시사이클로핵실)에틸트리메록시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 흔합하여 사용할 수 있다.  Examples of the silane-coupling agent include trimethoxysilyl benzoic acid, γ-methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, and γ-glycol. Propyl trimethoxysilane, β- (3,4-epoxycyclonuclear chamber) ethyltrimethoxysilane, and the like may be cited when used. These may be used alone or in combination of two or more thereof.
상기 실란 커플링제는 감광성 수지 조성물 100 증량부에 대하여 0.01 중량부 내지 10 중량부로 포함될 수 있다. 실란 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다.  The silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the above range, it is excellent in adhesion and storage property.
또한 상기 감광성 수지 조성물은 필요에 따라 코팅성 향상 및 결점 생성 방지 효과를 위해 계면 활성제를 더 포함할 수 있다.  In addition, the photosensitive resin composition may further include a surfactant in order to improve coating properties and prevent defects, if necessary.
상기 계면활성제의 예로는, BM Chemie社의 BM-1000®, BM-1 100® 등; 다이 닛폰 잉키 가가꾸 고교 (주)社의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® . 등; .스미토모 스리엠 (주)社의 프로라드 FC- 135®, 동 FC-170C®, 동 FC-430®, 동 FC-Examples of the surfactant include, but are not limited to, BM-1000®, BM-1 100® by BM Chemie, Inc .; Dainippon ingki Kagaku Kogyo Co., Ltd. Mechanical pack社F 142D®, copper F 172®, 173® F copper, copper F 183®. Etc; Prorad FC-135®, Copper FC-170C®, Copper FC-430®, Copper FC- from Sumitomo 3M Co., Ltd.
431® 등; 아사히 그라스 (주)社의 사프론 S-1 12®, 동 S-1 13®, 동 S-131®, 동 S- 141®, 동431® and the like; Asahi Grass Co., Ltd. Saffron S-1 12®, copper S-1 13®, copper S-131®, copper S-141®, copper
S-145® 등; 도레이 실리콘 (주)社의 SH-28PA®, 동 -190®, 동 -193®, SZ-6032®, SF-8428® 등의 명칭으로 시판된고 있는 불소계 계면활성제를 사용할 수 있다. S-145® and the like; Toray Silicone Co., Ltd. commercially available fluorine-based surfactants such as SH-28PA®, copper -190®, copper -193®, SZ-6032® and SF-8428® can be used.
상기 계면활성제는 감광성 수지 조성물 100 중량부에 대하여 0.001 중량부 내지 5 중량부로 사용될 수 있다ᅳ 계면활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, 유리 기판에 대한 습윤성 (wetting)이 우수하다.  The surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight with respect to 100 parts by weight of the photosensitive resin composition. When the surfactant is included in the above range, coating uniformity may be secured, stains may not occur, and wetting of the glass substrate may be performed. ) Is excellent.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.  In addition, the photosensitive resin composition may be added a certain amount of other additives such as antioxidants, stabilizers, etc. within a range that does not impair the physical properties.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다.  According to another embodiment, a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다.  The pattern forming process in the color filter is as follows.
' 상기 감광성 수지 조성물을 지지 기판상에 스핀 코팅, 슬¾ 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건¾하여 감광성 수지 조성물 막을 형성하는 공정 ; 상기 감광성 수지 조성물 막을 노광하는 공정 ; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 '' The photosensitive resin composition is spin-coated, slat coated, inkjet onto a supporting substrate Coating by printing or the like; Drying the coated photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film; The exposed photosensitive resin composition film is developed with an aqueous alkali solution to be photosensitive.
수지막을 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. Manufacturing a resin film; And heat-processing the said photosensitive resin film. Since the process conditions and the like are well known in the art, detailed descriptions thereof will be omitted.
【발명의 실시를 위한 형태】 [Form for implementation of invention]
(실시예)  (Example)
(합성예)  Synthesis Example
합성예 1  Synthesis Example 1
(1) 질소분위기 하에서 4,4'-dichlorobenzophenone(10g, 39.8mmol), (1) Under a nitrogen atmosphere, 4, 4'-dichlorobenzophenone (10g, 39.8mmol),
Pd2(dba)3(220mg, 0.002 mol%), XPhos(230mg, 0.005mol%) 및 sodium t-butoxide(l 1.48g, 1 19.5mmol)을 둥근바닥 플라스크에 넣은 후, 여기에 toluene 50g을 첨가하고, 실온에서 10분간 교반시킨 후, 여기에 2,6-difluoroaniline(10.3g, 79.6mmol)을 첨가한다ᅳ 반웅물의 온도를 80°C로 서서히 올리면서 2시간 동안 교반한다. 반웅이 종결되면 반웅물의 은도를 실온으로 낮춘 뒤, 여기에 isopropanol 50g을 첨가한 후 교반시킨다. 필터를 이용해 침전물을 걸러내고, 물로 세정한 다음, 이를 acetonkrile에 첨가하여 80°C로 30분간 교반시킨다. 실온으로 은도를 낮춘 뒤, 침전물을 필터한 후 건조시켜, 하기 화학식 S-1로 표시되는 화합물 (15g, 86%)을 합성하였다. Pd 2 (dba) 3 (220 mg, 0.002 mol%), XPhos (230 mg, 0.005 mol%) and sodium t-butoxide (l 1.48 g, 1 19.5 mmol) were added to a round bottom flask and 50 g of toluene was added thereto. After stirring for 10 minutes at room temperature, 2,6-difluoroaniline (10.3 g, 79.6 mmol) is added thereto. Stirring for 2 hours while gradually raising the temperature of the reaction product to 80 ° C. When the reaction was completed, the silver content of the reaction product was lowered to room temperature, and then 50 g of isopropanol was added thereto, followed by stirring. The precipitate is filtered off using a filter, washed with water and then added to acetonkrile and stirred at 80 ° C for 30 minutes. After lowering the silver to room temperature, the precipitate was filtered and dried to synthesize a compound (15 g, 86%) represented by the following Chemical Formula S-1.
[화학식 s-1]  [Formula s-1]
Figure imgf000058_0001
Figure imgf000058_0001
Ή NMR (solvent: DMSO-d6): 8.54(s, 2H), 7.60(d, 4H), 7.35-7.15(m, 6H), 6.73(d, 4H). GC-MS: 436 m/z.  NMR (solvent: DMSO-d6): 8.54 (s, 2H), 7.60 (d, 4H), 7.35-7.15 (m, 6H), 6.73 (d, 4H). GC-MS: 436 m / z.
(2) 2,6-difluoroaniline 대신 2,6-dimethylaniline을 사용한 것을 제외하고는, 상기 합성예 1의 (1)과 동일하게 하여, 하기 화학식 S-2로 표시되는 화합물을 합성하였다. S-2] (2) A compound represented by the following Chemical Formula S-2 was synthesized in the same manner as in (1) of Synthesis Example 1 except that 2,6-dimethylaniline was used instead of 2,6-difluoroaniline. S-2]
Figure imgf000059_0001
Figure imgf000059_0001
Ή NMR (solvent: DMSO-d6): 8.05(s, 2H), 7.53(d, 4H), 7.17-7.08(m, 6H), 6.43(d, 4H): 2.14(s, 12H). NMR (solvent: DMSO-d6): 8.05 (s, 2H), 7.53 (d, 4H), 7.17-7.08 (m, 6H), 6.43 (d, 4H) : 2.14 (s, 12H).
GC-MS: 420 mix.  GC-MS: 420 mix.
(3) 2,6-difluoroaniline 대신 2,6-diisopropylanilme을 사용한 것을 제외하고는, 상기 합성예 1의 (1)과 동일하게 하여, 하기 화학식 S-3으로 표시되는 화합물을 합성하였다. 3, except for using 2,6-difluoroaniline instead of 2, 6 -diisopropylanilme, in the same way as in the (1) in Synthesis Example 1, and the product was synthesized with the compound represented by the general formula S-3.
[화학식 S-3]  Formula S-3]
Figure imgf000059_0002
Figure imgf000059_0002
'H NMR (solvent: CDC13): 7.66(d, 4H), 7.35-7.30(m, 2H), 7.23(t, 4H), 6.47-6.45(m, 4H), 5.50(s, 2H), 3.21 -3.12(m, 4H), 1 .14(d, 24H).  'H NMR (solvent: CDC13): 7.66 (d, 4H), 7.35-7.30 (m, 2H), 7.23 (t, 4H), 6.47-6.45 (m, 4H), 5.50 (s, 2H), 3.21- 3.12 (m, 4 H), 1.14 (d, 24 H).
GC-MS: 532 m/z.  GC-MS: 532 m / z.
(4) 2,6-difluoroaniline 대신 N-isopropylaniline을 사용한 것을 제외하고는, 상기 합성예 1의 (1)과 동일하게 하여, 하기 화학식 S-4로 표시되는 화합물을 합성하였다.  (4) A compound represented by the following formula (S-4) was synthesized in the same manner as in (1) of Synthesis Example 1 except that N-isopropylaniline was used instead of 2,6-difluoroaniline.
[ s-4]  [s-4]
Figure imgf000059_0003
Figure imgf000059_0003
Ή NMR (solvent: CDC13): 7.63(d, 4H), 7.46-7.40(m, 4H), 7.36-7.30(m, 2H),그 12(d 4H), 6.54(d, 4H), 4.46-4.33(m, 2H), 1.17(d, 12H). NMR (solvent: CDC1 3 ): 7.63 (d, 4H), 7.46-7.40 (m, 4H), 7.36-7.30 (m, 2H), 12 (d 4H), 6.54 (d, 4H), 4.46- 4.33 (m, 2 H), 1.17 (d, 12 H).
GC-MS : 420 m/z. 합성예 2 GC-MS: 420 m / z. Synthesis Example 2
(1) 질소분위기 하에서 상기 화학식 S-1로 표시되는 화합물 10g(23mmol)을 둥근바닥 플라스크에 넣고, 여기에 DMF 30g을 첨가한 다음, 온도를 10°C로 낮추어 교반시킨다. sodium t-butoxide(7.71g, 68.7 mmo])와 iodoethane(10.7g, 68.7mmol)을 반웅물에 .각각 첨가한 후, 온도를 서서히 실온으로 올리며 2시간 교반시킨다. (1) In a nitrogen atmosphere, 10 g (23 mmol) of the compound represented by Chemical Formula S-1 was placed in a round bottom flask, and 30 g of DMF was added thereto, followed by stirring to lower the temperature to 10 ° C. Sodium t-butoxide (7.71g, 68.7mmo]) and iodoethane (10.7g, 68.7mmol) were added to the counter aunge, respectively. Then, the temperature was gradually raised to room temperature and stirred for 2 hours.
반웅이 종결되면 물 30g을 첨가하여 10분간 교반 후 필터를 이용해 침전물을 걸러내고, 물로 세정한 다음, 이를 acetonitrile에 첨가하여 8( C로 30분간 교반시킨다. 실온으로 온도를 낮춘 뒤 , 침전물을 필터한 후 건조시켜, 하기 화학식 S-5로 표시되는 화합물 (8.2g,736%)을 합성하였다. After the reaction was completed, 30 g of water was added and stirred for 10 minutes, and then the precipitate was filtered using a filter, washed with water, and then added to acetonitrile. The mixture was stirred at 8 (C for 30 minutes. After cooling to room temperature, the precipitate was filtered. After drying, the compound represented by the following Chemical Formula S-5 (8.2 g, 736%) was synthesized.
[ S-5]  [S-5]
Figure imgf000060_0001
Figure imgf000060_0001
H NMR (solvent: DMSO-d6): 7.54(d, 4H), 7.53-7.48(m, 2H), 7.46(t, 4H), 6.65(d, 4H): 3.71(q, 4H), 1.16(t, 6H). H NMR (solvent: DMSO-d6): 7.54 (d, 4H), 7.53-7.48 (m, 2H), 7.46 (t, 4H), 6.65 (d, 4H) : 3.71 (q, 4H), 1.16 (t , 6H).
GC-Mass: 492 m/z.  GC-Mass: 492 m / z.
(2) 상기 화학식 S-1로 표시되는 화합물 대신 상기 화학식 S-2로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 2의 (1)과 동일하게 하여, 하기 화학식 S-6으로 표시되는 화합물을 합성하였다.  (2) Except for using the compound represented by the formula (S-2) instead of the compound represented by the formula (S-1), in the same manner as in (1) of Synthesis Example 2, represented by the formula (S-6) Compounds were synthesized.
S-6]  S-6]
Figure imgf000060_0002
Figure imgf000060_0002
'H NMR (solvent: CDC13): 7.68(s, 4H), 7.15(s, 6H), 3.65(q, 4H), 2.1 1(s, 12H), 1.24(t,'H NMR (solvent: CDC1 3 ): 7.68 (s, 4H), 7.15 (s, 6H), 3.65 (q, 4H), 2.1 1 (s, 12H), 1.24 (t,
6H). 6H).
GC-MS: 476 m/z.  GC-MS: 476 m / z.
(3) 상기 화학식 S-1로 표시되는 화합물 대신 상기 화학식 S-3으로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 2의 (1)과 동일하게 하여, 하기 S-7로 표시되는 화합물을 합성하였다. (3) In the same manner as in (1) of Synthesis Example 2, except that the compound represented by Chemical Formula S-3 was used instead of the compound represented by Chemical Formula S-1, The compound represented by S-7 was synthesize | combined.
s-7]  s-7]
Figure imgf000061_0001
Figure imgf000061_0001
Ή NMR (solvent: CDC13): 7.65(bs, 4H), 7.35(dd, 2H), 7.27(d, 4H), 6.82(bs, 2H): NMR (solvent: CDC1 3 ): 7.65 (bs, 4H), 7.35 (dd, 2H), 7.27 (d, 4H), 6.82 (bs, 2H) :
6.24(bs, 2H), 3.66(q, 4H), 2.96-2.87(m, 4H), 1.29(t, 3H), 1.20(d, 12H), 1.01(d, 12H). 6.24 (bs, 2H), 3.66 (q, 4H), 2.96-2.87 (m, 4H), 1.29 (t, 3H), 1.20 (d, 12H), 1.01 (d, 12H).
GC-MS: 588 m/z. 합성예 3  GC-MS: 588 m / z. Synthesis Example 3
scheme]  scheme]
Figure imgf000061_0002
Figure imgf000061_0002
(1) 등근바닥 플라스크에 sodium ethoxide(75.5g, 1.1 lmol)과 ethanol 250g을 넣은 후, 실온에서 30분간 교반시킨 후, 여기에 ethyl cyanoacetate (100g, 0.887mol)을 (1) Put sodium ethoxide (75.5 g, 1.1 lmol) and ethanol 250 g in the back-bottom flask, stir at room temperature for 30 minutes, and add ethyl cyanoacetate (100 g, 0.887 mol) to it.
반응물에 서서히 첨가한 다음, 실온에서 30분간 교받시킨다. PhenylisotWocyanate (100g: 0.73mol)을 반웅물에 서서히 적하한 후 온도를 80 °C로 을려 3시간돔안 교반시킨다. 반응이 종결되면 온도를 낮춘 후, 용매를 제거한 다음, 이를 dichloromethane을 이용해 추출하고, 10% HC1과 물로 각각 세정한다. 유기용매를 제거한 후 생성된 고체 화합물에 MeOH 200g을 첨가해 , 0°C에서 30분간 교반한 후 이를 필터하여, 하기 화학식 S-8로 표시되는 화합물 (125g, 68%)을 합성하였다. Slowly add to the reaction and then mix for 30 minutes at room temperature. PhenylisotWocyanate (100g : 0.73mol) is slowly added dropwise to the reaction product, and the temperature is reduced to 80 ° C and stirred for 3 hours. When the reaction is completed, the temperature is lowered, the solvent is removed, and then extracted with dichloromethane, and washed with 10% HC1 and water, respectively. After removing the organic solvent, 200 g of MeOH was added to the resulting solid compound, stirred at 0 ° C. for 30 minutes, and then filtered, thereby synthesizing the compound represented by the following Chemical Formula S-8 (125 g, 68%).
[ S-8]  [S-8]
Figure imgf000061_0003
Figure imgf000061_0003
Ή NMR (solvent: CDC13): 1 1.7 (bs, 1H), 7.48-7.39(m, 3H), 7.28-7.25(m, 2H), 4.71(s lH), 4.27(q, 2H), 1.35(t, 3H). NMR (solvent: CDC1 3 ): 1 1.7 (bs, 1H), 7.48-7.39 (m, 3H), 7.28-7.25 (m, 2H), 4.71 (sl), 4.27 (q, 2H), 1.35 ( t, 3H).
GC-MS: 248 m/z. (2) 둥근바닥 플라스크에 NaOH(80.5g, 2.01mol)과 물 300g을 넣은 후 0°C에서 30분간 교반한 다음 상기 합성예 3의 (1)에서 합성한 화학식 S-8로 표시되는 화합물 (50g, 0.201mol)을 첨가한 후, 반웅물을 80°C로 온도를 을려 3시간 동안 교반시킨다. 반웅이 종결되면 온도를 0 °C로 낮춘 후 conc. HCl을 이용해 반웅물을 산성화 (acidify)시킨다 (pH: 약 6). 생성된 침전물을 필터를 통해 걸러내고 물로 세정한 후 건조시켜, 하기 화학식 S-9로 표시되는 화합물 (29g, 82%)을 합성하였다. GC-MS: 248 m / z. (2) After adding NaOH (80.5g, 2.01mol) and 300g of water to a round bottom flask, the mixture was stirred at 0 ° C. for 30 minutes and then the compound represented by Chemical Formula S-8 synthesized in (1) of Synthesis Example 3 ( 50 g, 0.201 mol) is added, and the reaction product is stirred at 80 ° C for 3 hours. When the reaction is terminated, the temperature is lowered to 0 ° C and then conc. Acidify the reaction product with HCl (pH: about 6). The resulting precipitate was filtered through a filter, washed with water and dried to synthesize a compound (29 g, 82%) represented by the following Chemical Formula S-9.
[ S-9]
Figure imgf000062_0001
[S-9]
Figure imgf000062_0001
Ή NMR (solvent: CDC13): 9.42(s, 1H), 7.65(d, 2H), 7.49-7.40(m, 2H), 7.34-7.26(m, 1H), 4.05(s, 2H). NMR (solvent: CDC1 3 ): 9.42 (s, 1H), 7.65 (d, 2H), 7.49-7.40 (m, 2H), 7.34-7.26 (m, 1H), 4.05 (s, 2H).
GC-MS: 176 m/z.  GC-MS: 176 m / z.
(3) 등근바닥 플라스크에 KOH(7.26g, 0.129mol)과 MeOH 200g을 넣고 실온에서 30분간 교반한 후, 여기에 상기 화학식 S-9로 표시되는 화합물 (19g,으 108mol)과 phenacyl bromide(21.5g, 0.108mol)을 각각 첨가한 후, 실은에서 2시간 동안 교반시킨다. 반웅이 종결되면 물 200g을 첨가하고, 실온에서 1시간 교반시킨 후, 생성된  (3) KOH (7.26g, 0.129mol) and 200g of MeOH were added to an isometric bottom flask and stirred at room temperature for 30 minutes, followed by the compound represented by the above formula (S-9) (19g, 108mol) and phenacyl bromide (21.5). g, 0.108 mol) were added, followed by stirring for 2 hours at actual weight. After the reaction was completed, 200 g of water was added, and the resultant was stirred at room temperature for 1 hour, and the resultant
침전물을 필터를 통해 걸러내고 MeOH로 세정 후 건조시켜, 하기 화학식 S-10으로 표시되는 화합물 (27g, 90%)을 합성하였다. The precipitate was filtered through a filter, washed with MeOH and dried to synthesize a compound (27 g, 90%) represented by Chemical Formula S-10.
[화학식 S-10]  [Formula S-10]
Figure imgf000062_0002
Figure imgf000062_0002
Ή NMR (solvent: CDC13): 7.6 l(d, 2H), 7.46-7.36(m, 5H), 7.27(d, 2H), 7.13(t, 1H),MR NMR (solvent: CDC1 3 ): 7.6 l (d, 2H), 7.46-7.36 (m, 5H), 7.27 (d, 2H), 7.13 (t, 1H),
6.98(bs, 1H), 6.50(s, 1H). 6.98 (bs, 1 H), 6.50 (s, 1 H).
GC-MS: 276 m/z.  GC-MS: 276 m / z.
(4) 등근바닥 플라스크에 KOH(5.8g, 0.103mol)과 acetone 170g, 물 80g을 넣고 실온에서 교반시킨 후 여기에 상기 화학식 . S-10으로 표시되는 화합물 (25g,  (4) KOH (5.8 g, 0.103 mol), acetone 170 g, and 80 g of water were added to an isometric bottom flask, followed by stirring at room temperature. Compound represented by S-10 (25 g,
86.1mmol)과 iodoethane(16.1g, 0.l03mol)을 각각 첨가한 후, 50 °C에서 3시간 동안 교반한다. 반응아 종결되면 증류를 통해 acetone을 제거하고, dichloromethane을 이용해 추출하고, 10% HC1 및 sat. sodium thiosulfate를 이용해 세정한다. 유기용매를 제거한 후 건조시켜, 하기 화학식 S-11로 표시되는 화합물 (21g, 80%)을 합성하였다. 86.1mmol) and iodoethane (16.1g, 0.l03mol) were added, and then stirred at 50 ° C. for 3 hours. After the reaction, the acetone is removed by distillation and dichloromethane is removed. Extracted with 10% HC1 and sat. Clean with sodium thiosulfate. The organic solvent was removed and dried to synthesize a compound (21 g, 80%) represented by the following formula S-11.
[화학식 S-1 1]  [Formula S-1 1]
Figure imgf000063_0001
Figure imgf000063_0001
'H NMR (solvent: CDC13): 7.61(d, 2H), 7.59-7.36(m, 5H), 7.24-7.18(m, 3H), 6.65(s, 1H), 4.01(q, 2H), 1.39(t, 3H). 'H NMR (solvent: CDC1 3 ): 7.61 (d, 2H), 7.59-7.36 (m, 5H), 7.24-7.18 (m, 3H), 6.65 (s, 1H), 4.01 (q, 2H), 1.39 (t, 3H).
GC-MS: 304 m/z. 합성예 4  GC-MS: 304 m / z. Synthesis Example 4
(l) phenacyl bromide 대신 2-fluorophenacyl bromide를 사용한 것을 제외하고는 상기 합성예 3의 (3)과 동일하게 하여, 하기 화학식 S-12로 표시되는 화합물을 합성하였다.  (l) A compound represented by the following Chemical Formula S-12 was synthesized in the same manner as in (3) of Synthesis Example 3, except that 2-fluorophenacyl bromide was used instead of phenacyl bromide.
[ s-12]  [s-12]
Figure imgf000063_0002
Figure imgf000063_0002
Ή NMR (solvent: CDC13): 7.58(t, 1H), 7.44-7.37(m, 3H), 7.29(d, 2H), 7.25-7.13(m, 3H), 6.97(bs, 1H), 6.63(s, 1H). NMR (solvent: CDC1 3 ): 7.58 (t, 1H), 7.44-7.37 (m, 3H), 7.29 (d, 2H), 7.25-7.13 (m, 3H), 6.97 (bs, 1H), 6.63 ( s, 1 H).
GC-MS: 294 m/z.  GC-MS: 294 m / z.
(2) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-12로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여, 하기 화학식 S-13으로 표시되는 화합물을 합성하였다. [화 S-13] (2) In the same manner as in (4) of Synthesis Example 3, except that the compound represented by Formula S-12 was used instead of the compound represented by Formula S-10, the compound represented by Formula S-13 Compounds were synthesized. [S-13]
Figure imgf000064_0001
Figure imgf000064_0001
Ή NMR (solvent: CDC13): 7.52(t, IH), 7.49-7.35(m 3H), 7.24-7.17(m, 5H), 6.70(s, IH) 4.02(q, 2H), 1.38(t, 3H). NMR (solvent: CDC1 3 ): 7.52 (t, IH), 7.49-7.35 (m 3H), 7.24-7.17 (m, 5H), 6.70 (s, IH) 4.02 (q, 2H), 1.38 (t, 3H).
GC-MS: 322 m/z.  GC-MS: 322 m / z.
(3) phenacyl bromide 대신 2-chlorophenacyl bromide ¾- 사용한 것을 제외하고는, 상기 합성예 3의 (3)과 동일하게 하여, 하기 화학식 S-14로 표시되는 화합물을 합성하였다.  (3) A compound represented by the following Chemical Formula S-14 was synthesized in the same manner as in (3) of Synthesis Example 3, except that 2-chlorophenacyl bromide ¾- was used instead of phenacyl bromide.
[ S-14] [S-1 4 ]
Figure imgf000064_0002
Figure imgf000064_0002
H NMR (solvent: CDC13): 7.51-7.48(m, IH), 7.43-7.3.2(m, 5H), 7.28(d, IH), 7.13(t, lH), 6.92(bs, lH), 6.53(s, IH). H NMR (solvent: CDC1 3 ): 7.51-7.48 (m, IH), 7.43-7.3.2 (m, 5H), 7.28 (d, IH), 7.13 (t, lH), 6.92 (bs, lH), 6.53 (s, IH).
GC-MS: 310 m/z.  GC-MS: 310 m / z.
(4) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-14로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여, 하기 화학식 S-15로 표시되는 화합물을 합성하였다.  (4) Except for using the compound represented by the formula S-14 instead of the compound represented by the formula S-10, in the same manner as in (4) of Synthesis Example 3, represented by the following formula S-15 Compounds were synthesized.
[화학식 S-15]  [Formula S-15]
Figure imgf000064_0003
'H NMR (solvent: CDC13): 7.48-7.32(m, 6H), 7.31-7.18(m, 3H), 6.58(s, IH), 4.00(q, 2H), 1.36(t, 3H).
Figure imgf000064_0003
'H NMR (solvent: CDC1 3 ): 7.48-7.32 (m, 6H), 7.31-7.18 (m, 3H), 6.58 (s, IH), 4.00 (q, 2H), 1.36 (t, 3H).
GC-MS: 338 m/z.  GC-MS: 338 m / z.
(5) phenacyl bromide 대신 4-chlorophenacyl bromide를 사용한 것을 제외하고는 상기 합성예 3의 (3)과 동일하게 하여, 하기 화학식 S-16으로 표시되는 화합물을 합성하였다.  (5) A compound represented by the following Chemical Formula S-16 was synthesized in the same manner as in (3) of Synthesis Example 3 except that 4-chlorophenacyl bromide was used instead of phenacyl bromide.
[화학식 s-16]  [Formula s-16]
Figure imgf000065_0001
Figure imgf000065_0001
'H NMR (solvent: CDC13): 7.54(d, 2H), 7.43-7.37(m, 4H), 7.27(d, 2H), 7.15(t, IH), 6.98(bs, IH), 6.48(s, IH). 'H NMR (solvent: CDC1 3 ): 7.54 (d, 2H), 7.43-7.37 (m, 4H), 7.27 (d, 2H), 7.15 (t, IH), 6.98 (bs, IH), 6.48 (s , IH).
GC-MS: 310 m/z.  GC-MS: 310 m / z.
(6) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-16으로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여, 하기 화학식 S-17로 표시되는 화합물을 합성하였다.  (6) Except for using the compound represented by the formula (S-16) instead of the compound represented by the formula (S-10), in the same manner as in (4) of Synthesis Example 3, represented by the formula (S-17) Compounds were synthesized.
[화학식 S-17]  [Formula S-17]
Figure imgf000065_0002
Figure imgf000065_0002
H NMR (solvent: CDCI3): 7.47(d, 2H), 7.46-7.35(m, 4H), 7.24-7.18(m, 3H), 6.54(s, IH), 3.96(q, 2H), 1.34(t, 3H). H NMR (solvent: CDCI 3 ): 7.47 (d, 2H), 7.46-7.35 (m, 4H), 7.24-7.18 (m, 3H), 6.54 (s, IH), 3.96 (q, 2H), 1.34 ( t, 3H).
GC-MS: 338 m/z.  GC-MS: 338 m / z.
(7) Phenylisothiocyanate 대신 o-tolylisothiocyanate를 사용한 것을 제외하고는 상기 합성예 3의 (1)과 동일하게 하여, 하기 화학식 S-18로 표시되는 화합물을 합성하였다. [ S-18] (7) A compound represented by the following Chemical Formula S-18 was synthesized in the same manner as in (1) of Synthesis Example 3 except that o-tolylisothiocyanate was used instead of Phenylisothiocyanate. [S-18]
Figure imgf000066_0001
Figure imgf000066_0001
Ή NMR (solvent: CDC13): 11.5(bs, IH), 7.36-7.22(m, 4H), 4.61(s, IH), 4.29(q, 2H), 1.37(t, 3H). NMR (solvent: CDC1 3 ): 11.5 (bs, IH), 7.36-7.22 (m, 4H), 4.61 (s, IH), 4.29 (q, 2H), 1.37 (t, 3H).
GC-MS: 262 m/z.  GC-MS: 262 m / z.
(8) 상기 화학식 S-8로 표시되는 화합물 대신 상기 화학식 S-18로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (2)와 동일하게 하여, 하기 화학식 S-19로 표시되는 화합물을 합성하였다.  (8) Except for using the compound represented by the formula (S-18) instead of the compound represented by the formula (S-8), in the same manner as in (2) of Synthesis Example 3, represented by the formula (S-19) Compounds were synthesized.
[ S-19]  [S-19]
Figure imgf000066_0002
Figure imgf000066_0002
'H NMR (solvent: CDC13): 9.24(bs, IH), 7.43-7.28(m, 4H), 4.08(s, 2H). 'H NMR (solvent: CDC1 3 ): 9.24 (bs, IH), 7.43-7.28 (m, 4H), 4.08 (s, 2H).
GC-MS: 190 m/z.  GC-MS: 190 m / z.
(9) 상기 화학식 S-9로 표시되는 화합물 대신 상기 화학식 S-19로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (3)과 동일하게 하여, 하기 화학식 S-20으로 표시되는 화합물을 합성하였다.  (9) In the same manner as in (3) of Synthesis Example 3, except that the compound represented by the formula S-19 was used instead of the compound represented by the formula S-9, the compound represented by the following formula S-20 Compounds were synthesized.
[화학식 S-20]  Formula S-20
Figure imgf000066_0003
Figure imgf000066_0003
'H NMR (solvent: CDCI3): 7.61 (d, 2H), 7.47-7.38(m, 4H), 7.29-7.24(m, 2H), 7.14(t IH), 6.62(bs, IH), 6.46(s, IH), 2.36(s, 3H). 'H NMR (solvent: CDCI 3 ): 7.61 (d, 2H), 7.47-7.38 (m, 4H), 7.29-7.24 (m, 2H), 7.14 (t IH), 6.62 (bs, IH), 6.46 ( s, IH), 2.36 (s, 3H).
GC-MS: 290 m/z.  GC-MS: 290 m / z.
(10) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-20으로 표시되는 화합물올 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여, 하기 화학식 S-21로 표시되는 화합물을 합성하였다. (10) In the same manner as in (4) of Synthesis Example 3, except that the compound represented by Formula S-20 was used instead of the compound represented by Formula S-10, A compound represented by the following formula S-21 was synthesized.
[ -21]  [-21]
Figure imgf000067_0001
Figure imgf000067_0001
Ή NMR (solvent: CDC13): 7.5 l(d, 2H), 7.41-7.23(m, 7H), 6.27(s, IH), 3.95(q, 2H), 2.28(s, 3H), 1.34(t, 3H). NMR (solvent: CDC1 3 ): 7.5 l (d, 2H), 7.41-7.23 (m, 7H), 6.27 (s, IH), 3.95 (q, 2H), 2.28 (s, 3H), 1.34 (t , 3H).
GC-MS: 318 m/z.  GC-MS: 318 m / z.
(11) Phenylisothiocyanate 대신 o-tolylisothiocyanate를 사용한 것을 제외하고는 상기 합성예 3의 (1)과 동일하게 하였고, phenacyl bromide 대신 2-fluorophenacyl bromide를 사용한 것을 제외하고는, 상기 합성예 3의 (3)과 동일하게 하여, 하기 화학식 S-22로 표시되는 화합물을 합성하였다.  (11) The same as in (1) of Synthesis Example 3 except that o-tolylisothiocyanate was used instead of Phenylisothiocyanate, except that 2-fluorophenacyl bromide was used instead of phenacyl bromide, (3) and In the same manner, a compound represented by the following chemical formula S-22 was synthesized.
S-22]  S-22]
Figure imgf000067_0002
Figure imgf000067_0002
Ή NMR (solvent: CDC13): 7.55(t, IH), 7.46(d, IH), 7.43-7.10(m, 6H), 6.62(s, 1H); 6.56(s, IH), 2.36(s, 3H). NMR (solvent: CDC1 3 ): 7.55 (t, IH), 7.46 (d, IH), 7.43-7.10 (m, 6H), 6.62 (s, 1H) ; 6.56 (s, IH), 2.36 (s, 3H).
GC-MS: 308 m/z.  GC-MS: 308 m / z.
(12) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-22로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여, 하기 화학식 S-23으로 표시되는 화합물을 합성하였다. [ S-23] (12) Except for using the compound represented by the formula (S-22) instead of the compound represented by the formula (S-10), in the same manner as in (4) of Synthesis Example 3, represented by the formula (S-23) Compounds were synthesized. [S-23]
Figure imgf000068_0001
Figure imgf000068_0001
Ή NMR (solvent: CDC13): 7.42(t, 1H), 7.34-7.25(m, 5H), 7.18-7.09(m, 2H), 6.35(s, 1H): .95(q, 2H), 2.28(s, 3H), 1.34(t, 3H). NMR (solvent: CDC1 3 ): 7.42 (t, 1H), 7.34-7.25 (m, 5H), 7.18-7.09 (m, 2H), 6.35 (s, 1H) : .95 (q, 2H), 2.28 (s, 3 H), 1.34 (t, 3 H).
GC-MS: 336 m/z. 합성예 5  GC-MS: 336 m / z. Synthesis Example 5
[전체 scheme]  [Overall scheme]
Figure imgf000068_0002
Figure imgf000068_0002
(1) 등근바닥 플라스크에 ammonium acetate(U .6g, 0.15mol)와 malononitrile(20.8g: 0.315mol)을 넣고 여기에 AcOH 12g, toluene 180g을 넣고 실온에서 교반시키고, 여기에 acetophenone(36g, 0.3mol)을 첨가한 후, 120°C에서 Dean-Stark 반응을 5시간 동안 진행한다ᅳ 반응이 종결되면 실온으로 온도를 낮추고, ethyl acetate를 이용하여 (1) Ammonium acetate (U .6g, 0.15mol) and malononitrile (20.8g : 0.315mol) were added to the isometric bottom flask, 12 g of AcOH and 180 g of toluene were added thereto and stirred at room temperature. ), And then proceed with Dean-Stark reaction for 5 hours at 120 ° C. After the reaction is completed, lower the temperature to room temperature and use ethyl acetate.
추출하고, 10% HC1 및 물을 이용하여 세정한다. 유기용매를 제거한 후, hexane을 이용해 재결정하고 건조하여, 하기 화학식 S-24로 표시되는 화합물 (42g, 83%)을 합성하였다. Extract and wash with 10% HC1 and water. After removing the organic solvent, recrystallized with hexane and dried to synthesize a compound represented by the following formula (S-24) (42g, 83%).
[화학식 S-24] [Formula S-2 4 ]
Figure imgf000068_0003
Figure imgf000068_0003
H NMR (solvent: CDC13): 7.55-7.50(m, 5H), 2.64(s, 3H). H NMR (solvent: CDC1 3 ): 7.55-7.50 (m, 5H), 2.64 (s, 3H).
GC-MS: 168 m/z. (2) 둥근바닥 플라스크에 상기 화학식 S-24로 표시되는 화합물 (33.6g, 0.2mol)과 sulfur powder(7.1g, 0.22mol)를 넣고, ethanol l20g을 첨가하여 교반시킨 후, 여기에 triethylamine (22.2g, 0.22mol)을 첨가하고, 반응은도를 80°C로 올려 2시간 동안 교반시킨다. 반웅이 종결되면 온도를 낮추고 증류를 통하여 용매를 제거한다. GC-MS: 168 m / z. (2) A compound (33.6 g, 0.2 mol) and sulfur powder (7.1 g, 0.22 mol) represented by Chemical Formula S-24 were added to a round bottom flask, and stirred with addition of 20 g of ethanol, followed by triethylamine (22.2). g, 0.22 mol) is added, and the reaction is heated to 80 ° C. and stirred for 2 hours. When the reaction is complete, lower the temperature and remove the solvent by distillation.
Dichloromethane으로 추출하고, 10% HC1과 물로 각각 세정하고 용매를 제거한 다음, column chromatography(ethyl acetate:hexane=l/3)¾- 이용하여 , 하기 화학식 S-25로 표시되는 화합물 (35.7g, 81 %)을 합성하였다. Extract with dichloromethane, wash with 10% HC1 and water, remove solvent, and then use column chromatography (ethyl acetate: hexane = l / 3) ¾- to give the compound represented by the following formula S-25 (35.7g, 81% ) Was synthesized.
[화학식 S-25]  Formula S-25
Figure imgf000069_0001
Figure imgf000069_0001
Ή NMR (solvent: CDC13): 7.56(d, 2H), 7.44-7.32(m, 3H), 6.35(s, 1H), 4.90(s, 1 H).NMR (solvent: CDC1 3 ): 7.56 (d, 2H), 7.44-7.32 (m, 3H), 6.35 (s, 1H), 4.90 (s, 1H).
GC-MS: 200 m/z. GC-MS: 200 m / z.
(3) 둥근바닥 플라스크에 상기 화학식 S-25로 표시되는 화합물 (20g, O. lmol)과 KOH(8.45g, 0.15mol)을 넣고 DMF 100g을 첨가하여 교반시킨 후, 여기에 2- fluoronitrobenzene(21.2g, 0.15mol)을 첨가하고, 실은에서 15시간 동안 교반시킨다. 반웅이 종결되면 ethyl acetate로 추출하고 10% HC1 과 물로 각각 세정한 후, 용매를 제거한다. Hexane을 이용하여 재결정하고 건조하여 , 하기 화학식 S-26으로 표시되는 화합물 (21g, 65%)을 합성하였다.  (3) A compound (20g, O.lmol) and KOH (8.45g, 0.15mol) represented by Chemical Formula S-25 was added to a round bottom flask, and stirred with addition of 100 g of DMF, followed by 2-fluoronitrobenzene (21.2). g, 0.15 mol) is added and stirred for 15 hours at actual weight. When the reaction is complete, the mixture is extracted with ethyl acetate, washed with 10% HC1 and water, and then the solvent is removed. Recrystallization using Hexane and drying to synthesize a compound represented by the following formula S-26 (21g, 65%).
[화학식 S-26]  [Formula S-26]
Figure imgf000069_0002
Figure imgf000069_0002
Ή NMR (solvent: CDC13): 10.0(s, 1H), 8.31(d, 1H), 7.68-7.64(m, 3H), 7.61-7.41(m: 3H), 7.08-7.02(m, 2H). NMR (solvent: CDC1 3 ): 10.0 (s, 1H), 8.31 (d, 1H), 7.68-7.64 (m, 3H), 7.61-7.41 (m : 3H), 7.08-7.02 (m, 2H).
GC-MS: 321 m/z.  GC-MS: 321 m / z.
(4) 상기 화학식 S-10으로 표시되는 화합물 대신 상기 화학식 S-26으로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 3의 (4)와 동일하게 하여 하기 화학식 S-27로 표시되는 화합물을 합성하였다. (4) to the compound of Formula S-26 instead of the compound of the formula S-10 Except for using the compound represented, the compound represented by the following formula (S-27) was synthesized in the same manner as in (4) of Synthesis Example 3.
[화학식 s-27] [Formula s-27]
Figure imgf000070_0001
Figure imgf000070_0001
Ή NMR (solvent: CDC13): 8.05(d, 1H), 7.69(t, 1H), 7.54-7.48(m, 4H), 7.42-7.34(m; 3H), 6.52(s, 1H), 3.93(q, 2H), 1.39(t, 3H). NMR (solvent: CDC1 3 ): 8.05 (d, 1H), 7.69 (t, 1H), 7.54-7.48 (m, 4H), 7.42-7.34 (m ; 3H), 6.52 (s, 1H), 3.93 ( q, 2H), 1.39 (t, 3H).
GC-MS: 349 m/z. 합성예 6  GC-MS: 349 m / z. Synthesis Example 6
(1) 질소 하에서 등근바닥 플라스크에 상기 화학식 S-5로 표시되는  (1) represented by the above formula (S-5) in an isometric bottom flask under nitrogen
화합물 (1.03g, 2.1mmol) 및 상기 화학식 S-8로 표시되는 화합물 (0.64g, 2.1mmol)을 넣은 후, toluene 5g과 POCl3(L29g, 8.4mmoi)을 첨가한 후, 온도를 서서히 110°C로 올리며 5시간 동안 교반한다. 반웅이 종결되면 실은으로 온도를 낮춘 뒤, methyl ethyl ketone(MEK)로 추출하고, 10% NaCl, 물 그리고 10% HC1로 각각 세정한다. 유기층을 제거하고 건조시킨 뒤, Lithium bis(trifuloromethane)sulfon imide(L2g, 4.2mmol)을 첨가하고, 여기에 DMSO 10g을 넣고 30분간 실온에서 교반시킨다 (anion exchange process). 상기 반응물을 물에 dropping 시켜 침전을 형성시키고, 이를 필터를 통해 분리하여 얻어낸다. 필터를 통해 얻어낸 고체 화합물을 acetonitrile 40g에 녹인 후, 여기에 활성탄 3g을 넣어 30분간 교반시킨다. 필터를 통해 활성탄을 제거하고, 여액은 증류를 통해 제거한 후 건조시켜, 하기 화학식 P-1로 표시되는 화합물 (L82g, 83%)을 얻었다. p-i] After adding compound (1.03 g, 2.1 mmol) and compound represented by the above formula (S-8) (0.64 g, 2.1 mmol), 5 g of toluene and POCl 3 (L29 g, 8.4 mmol) were added, and then the temperature was gradually decreased to 110 °. Raise to C and stir for 5 hours. When the reaction was completed, lower the temperature with silver, extract with methyl ethyl ketone (MEK), wash with 10% NaCl, water and 10% HC1, respectively. After the organic layer was removed and dried, Lithium bis (trifuloromethane) sulfon imide (L2g, 4.2mmol) was added thereto, and 10 g of DMSO was added thereto and stirred at room temperature for 30 minutes (anion exchange process). The reaction is dropped into water to form a precipitate, which is obtained by separating through a filter. The solid compound obtained through the filter was dissolved in 40 g of acetonitrile, and then 3 g of activated carbon was added thereto and stirred for 30 minutes. Activated carbon was removed through a filter, and the filtrate was removed through distillation and dried to obtain a compound (L82g, 83%) represented by the following Chemical Formula P-1. pi]
Figure imgf000071_0001
Figure imgf000071_0001
'H NMR (solvent: CDC13): 7.57-7.51(m, 3H), 7.45-7.26(m, 8H), 7.10-7.05(m, 9H) 6.50(bs, 4H), 4.13(q, 2H), 3.75(q, 4H), 1.41(t, 3H), 1.24(t, 6H). 'H NMR (solvent: CDC1 3 ): 7.57-7.51 (m, 3H), 7.45-7.26 (m, 8H), 7.10-7.05 (m, 9H) 6.50 (bs, 4H), 4.13 (q, 2H), 3.75 (q, 4H), 1.41 (t, 3H), 1.24 (t, 6H).
(2) (2)
scheme]  scheme]
Figure imgf000071_0002
Figure imgf000071_0002
화합물을 사용한 것을 제외하고는, 상기 합성예 6의 (1)과 동일하게 하여, 하기 화학식 P-2로 표시되는 화합물을 합성하였다. Except having used the compound, it carried out similarly to (1) of the said synthesis example 6, and synthesize | combined the compound represented by following formula (P-2).
pᅳ 2] p ᅳ 2 ]
Figure imgf000071_0003
Figure imgf000071_0003
Ή NMR (solvent: CDC13): 7.57-7.41 (m, 7H), 7.26-6.87(m, 15H), 5.89(d, 2H), 4.10(q; 2H), 3.72(d, 4H), 2.05(s, 12H), 1.40(t, 3H), 1.24(t, 6H). NMR (solvent: CDC1 3 ): 7.57-7.41 (m, 7H), 7.26-6.87 (m, 15H), 5.89 (d, 2H), 4.10 (q ; 2H), 3.72 (d, 4H), 2.05 ( s, 12H), 1.40 (t, 3H), 1.24 (t, 6H).
(3) 상기 화학식 S-8로 표시되는 화합물 대신 상기 화학식 S-24로 표시되는 화합물을 사용한 것을 제외하고는, 상기 합성예 6의 (1)과 동일하게 하여, 하기 - ζ'ί '(HI '1)69'/, '(HI 'V) -L '(H ¾58"/. '( 'P)S1'8 :( CK) -\u3A\os) H (3) In the same manner as in (1) of Synthesis Example 6, except that the compound represented by Chemical Formula S-24 was used instead of the compound represented by Chemical Formula S-8, - ζ 'ί' (HI ' 1) 69' /, '(HI' V) -L '(. H ¾58 "/' ( 'P) S1' 8 :( CK) - \ u3A \ os) H
Figure imgf000072_0001
Figure imgf000072_0001
Figure imgf000072_0002
Figure imgf000072_0002
[漏 ips [^^] [漏 ips [^^]
Figure imgf000072_0003
Figure imgf000072_0003
"(H9 ¾9Γΐ '(Η£ εε·Ι '(Ht7훼 '(HZ: 'b)00 '(Ht7 'sq) '9 '(H6 ' )907 Π '(Η9 ^ZZ'L -£VL '(HI '^O L- L \HZ 'UI '/ '(HI 'Ρ)8Γ8 :(εΚΧ '-lu^jos) ¾ N " (H9 ¾9Γΐ '(Η £ εε · Ι' (Ht 7 FE '(HZ:' b) 00 '(Ht 7 ' sq) ' 9' (H6 ') 907 Π' (Η9 ^ ZZ ' L-£ VL '(HI' ^ O L- L \ HZ 'UI ' / '(HI' Ρ) 8Γ8 :( ε ΚΧ ' -lu ^ jos) ¾ N
Figure imgf000072_0004
Figure imgf000072_0004
609CT0/Sl0ZaM/X3d .Ϊ98Ϊ0/.Ϊ0Ζ OAV 7.45(m, 6H), 7.23-7.22(m, 4H), 7.1-7.04(m, 9H), 6.45(d, 4H), 4.51-4.41(m, 2H), 3.95(q, 2H) 1.32(t, 3H), 1.18(d, 12H). 609CT0 / Sl0ZaM / X3d .Ϊ98Ϊ0 / .Ϊ0Ζ OAV 7.45 (m, 6H), 7.23-7.22 (m, 4H), 7.1-7.04 (m, 9H), 6.45 (d, 4H), 4.51-4.41 (m, 2H), 3.95 (q, 2H) 1.32 (t , 3H), 1.18 (d, 12H).
(5) (5)
[전체 scheme]  [Overall scheme]
Figure imgf000073_0001
Figure imgf000073_0001
H NMR (solvent: CDC13): 7.51-7.38(m, 12H), 7.20-7.03(m, 12H), 6.42(d, 4H), 4.52- 4.45(m, 2H), 4.08(q, 2H), 1.38(t, 3H), 1.17(d, 12H). H NMR (solvent: CDC1 3 ): 7.51-7.38 (m, 12H), 7.20-7.03 (m, 12H), 6.42 (d, 4H), 4.52- 4.45 (m, 2H), 4.08 (q, 2H), 1.38 (t, 3 H), 1.17 (d, 12 H).
(6) (6)
[전체 scheme]  [Overall scheme]
Figure imgf000073_0002
Figure imgf000073_0002
상기 합성법 등을 참고하여, 상기 전체 scheme에 따라, 하기 화학식 P-6으로 표시되는 화합물을 합성하였다. With reference to the synthesis method, etc., a compound represented by the following Chemical Formula P-6 was synthesized according to the overall scheme.
Figure imgf000074_0001
Figure imgf000074_0001
Ή NMR (solvent: CDC13): 7.58-7.41(m, 12H), 7.24-7.05(m, 1 IH), 6.98(t, IH), 6.79(1 IH), 6.47(d, 4H), 4.55-4.48(m, 2H), 4.10(q, 2H), 1.41(t, 3H), 1.20(d, 12H). NMR (solvent: CDC1 3 ): 7.58-7.41 (m, 12H), 7.24-7.05 (m, 1 IH), 6.98 (t, IH), 6.79 (1 IH), 6.47 (d, 4H), 4.55- 4.48 (m, 2H), 4.10 (q, 2H), 1.41 (t, 3H), 1.20 (d, 12H).
(7) (7)
scheme]  scheme]
Figure imgf000074_0002
Figure imgf000074_0002
'H NMR (solvent: CDC13): 7.61-7.53(m, 3H), 7.49-7.28(m, 8H), 7.19-7.09(m, 6H) 6.96(t, lH), 6.76(t, IH), 6.56(bs, 4H), 4.15(q, 2H), 3.78(q, 4H), 1.43(t, 3H), 1.27(t, 6H). 'H NMR (solvent: CDC1 3 ): 7.61-7.53 (m, 3H), 7.49-7.28 (m, 8H), 7.19-7.09 (m, 6H) 6.96 (t, lH), 6.76 (t, IH), 6.56 (bs, 4H), 4.15 (q, 2H), 3.78 (q, 4H), 1.43 (t, 3H), 1.27 (t, 6H).
(8) scheme] (8) scheme]
Figure imgf000075_0001
Figure imgf000075_0001
상기 합성법 등을 참고하여, 상기 전체 scheme에 따라, 하기 화학식 P-8로 표시되는 화합물을 합성하였다.  By referring to the synthesis method, etc., a compound represented by the following Chemical Formula P-8 was synthesized according to the overall scheme.
P-8]  P-8]
Figure imgf000075_0002
Figure imgf000075_0002
Ή NMR (solvent: CDC13): 7.60-7.43(m, 7H), 7.28-7.17(m, 7H), 7.01-6.94(m, 6H) 6.77(t, 1H), 5.9 l(d, 2H), 4.12(q, 2H), 3.76(q, 4H), 2.07(s, 12H), 1.42(t, 3H), 1.27(ΐ, 6H). NMR (solvent: CDC1 3 ): 7.60-7.43 (m, 7H), 7.28-7.17 (m, 7H), 7.01-6.94 (m, 6H) 6.77 (t, 1H), 5.9 l (d, 2H), 4.12 (q, 2H), 3.76 (q, 4H), 2.07 (s, 12H), 1.42 (t, 3H), 1.27 (ΐ, 6H).
(9) (9)
scheme]  scheme]
Figure imgf000075_0003
Figure imgf000075_0003
상기 합성법 등을 참고하여, 상기 전체 scheme에 따라, 하기 화학식 P-9로 표시되는 화합물을 합성하였다. P-9] By referring to the synthesis method, etc., a compound represented by the following Chemical Formula P-9 was synthesized according to the overall scheme. P-9]
Figure imgf000076_0001
Figure imgf000076_0001
Ή NMR (solvent: CDC13): 7.58-7.40(m, 1 1H), 7.22-7.03(m, 12H), 6.45(d, 4H), 4.53- 4.44(m, 2H), 4.09(q, 2H), 1.39(t, 3H), 1.18(d, 12H). MR NMR (solvent: CDC1 3 ): 7.58-7.40 (m, 1 1H), 7.22-7.03 (m, 12H), 6.45 (d, 4H), 4.53- 4.44 (m, 2H), 4.09 (q, 2H) , 1.39 (t, 3 H), 1.18 (d, 12 H).
(10) 10
scheme]  scheme]
Figure imgf000076_0002
Figure imgf000076_0002
상기 합성법 등을 참고하여, 상기 전체 scheme에 따라, 하기 화학식 P-10으로 표시되는 화합물을 합성하였다.  With reference to the synthesis method, etc., according to the overall scheme, a compound represented by the following formula P-10 was synthesized.
P-10]  P-10]
Figure imgf000076_0003
Figure imgf000076_0003
Ή NMR (solvent: CDC13): 7.59-7.36(m, 8H), 7.30-7.26(m, 3H), 7.20-7.07(m, 8H), 6.53(bs, 4H), 4.14(q, 2H), 3.76(q, 4H), 1.42(t, 3H), 1.26(t, 6H). NMR (solvent: CDC1 3 ): 7.59-7.36 (m, 8H), 7.30-7.26 (m, 3H), 7.20-7.07 (m, 8H), 6.53 (bs, 4H), 4.14 (q, 2H), 3.76 (q, 4H), 1.42 (t, 3H), 1.26 (t, 6H).
(감광성 수지 조성물 제조) (Photosensitive resin composition production)
실시예 1  Example 1
하기 표 1 및 표 2에 기재된 조성으로, 실시예 1 내지 실시예 10 및 비교예 1 내지 비교예 4에 따른 감광성 수지 조성물을 제조하였다. 구체적으로, 용매에 광중합 개시제를 용해시킨 후 2시간 동안 상온에서 교반하였다. 여기에, 바인더 수지 및 광중합성 단량체를 첨가하고, 2시간 동안 상온에서 교반하였다. 여기에, 염료를 첨가 (경우에 따라서는 안료분산액을 첨가)한 후, 1시간 동안 상온에서 교반하고, 기타 첨가제 (계면활성제)를 첨가하고 1시간 동안 상온에서 교반하였다. 상기 용액에 대하여 3회에 걸친 여과를 행하여 불순물을 제거하여 감광성 수지 조성물을 제조하였다. Examples 1 to 10 and Comparative Examples, with the composition shown in Table 1 and Table 2 1 to 4, a photosensitive resin composition according to Comparative Example 4 was prepared. Specifically, the photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours. Binder resin and photopolymerizable monomer were added here, and it stirred at room temperature for 2 hours. To this, after the dye was added (optionally, a pigment dispersion), the mixture was stirred at room temperature for 1 hour, other additives (surfactant) were added, and the mixture was stirred at room temperature for 1 hour. The solution was filtered three times to remove impurities to prepare a photosensitive resin composition.
[표 1] TABLE 1
(단위: 중량 %)  (Unit: weight%)
실시 실시 실시 실시 실시 실시 실시 실시 실시 실시  Conduct Conduct Conduct Conduct Conduct Conduct Conduct Conduct Conduct Conduct
예 예 1 예 2 예 3 예 4 예 5 예 6 예 7 예 8 예 9  Examples Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9
10 바인더  10 binder
10 10 10 10 10 10 10 10 10 10 수지  10 10 10 10 10 10 10 10 10 10 Resin
광중합성  Photopolymerizable
6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 화합물  6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 Compound
광중합  Photopolymerization
0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 개시제  0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Initiator
 Wh
료 5 - - - - - - - - Ryo 5--------
1 One
 Wh
료 - 5 - - - - - - - 착색  Ryo-5-------Coloring
2  2
제 :  My :
 Wh
료 - - 5 - - - - - - - 3  Ryo--5-------3
 Wh
- . - - 5 - - - - - - 료 4 -. --5------ 4
 Wh
료 - - ― - 5 - - ― - - 5  Ryo--―-5--―--5
 Wh
료 - - - - - 5 - - - - 6  Ryo-----5----6
in  in
료 ― - - - - - 5 - - - Ryo ―-----5---
7 7
 Wh
료 - - - - - - ― 5 - - 8  Ryo------― 5--8
3 3
 Wh
료 - - ' - - - - - - 5 - 9 Fee - - '- - - - - - 5-9
 Wh
료 - - - - ᅳ - - - - 5 Ryo----ᅳ----5
10 10
ᄋ 3  ᄋ 3
 Wh
료 - ― ᅳ - - - - - - - Ryo-― ᅳ-------
1 1 1 1
 within
료 - - - - - - - - - ᅳ Ryo---------ᅳ
1 One
용매 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 기타  Solvent 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 77.8 Other
0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 첨가제  0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 0.3 Additive
Total 100.0 100.0 100.0 100.0 100.0 100.0 100,0 100.0 100.0 100.0 [표 2] Total 100.0 100.0 100.0 100.0 100.0 100.0 100,0 100.0 100.0 100.0 TABLE 2
(단위: 중량0 /0) (Unit: weight 0/0)
Figure imgf000079_0001
바인더 수지
Figure imgf000079_0001
Binder resin
아크릴계 바인더 수지 (메타크릴산 /벤질메타크릴레이트 ==. 15/85 (w/w), 중량평균 분자량 = 22,000g/mol, 산가 = 100 mgKOH/g)  Acrylic binder resin (methacrylic acid / benzyl methacrylate ==. 15/85 (w / w), weight average molecular weight = 22,000 g / mol, acid value = 100 mgKOH / g)
착색제  coloring agent
(염료 1) 화학식 P-1로 표시되는 화합물  (Dye 1) Compound represented by Chemical Formula P-1
(염료 2) 화학식 P-2로 표시되는 화합물 ' (Dye 2) a compound represented by the general formula P-2 '
(염료 3) 화학식 P-3으로 표시되는 화합물  (Dye 3) Compound represented by Chemical Formula P-3
(염료 4) 화학식 P-4로 표시되는 화합물  (Dye 4) Compound represented by Chemical Formula P-4
(염료 5) 화학식 P-5로 표시되는 화합물  (Dye 5) Compound represented by Chemical Formula P-5
(염료 6) 화학식 P-6으로 표시되는 화합물  (Dye 6) Compound represented by Chemical Formula P-6
(염료 7) 화학식 P-7로 표시되는 화합물  (Dye 7) Compound represented by Chemical Formula P-7
(염료 8) 화학식 P-8로 표시되는 화합물  (Dye 8) Compound represented by the formula (P-8)
(염료 9) 화학식 P-9로 표시되는 화합물  (Dye 9) Compound represented by Chemical Formula P-9
(염료 10) 화학식 P-10으로 표시되는 화합물  (Dye 10) Compound represented by Chemical Formula P-10
(염료 1 1) 하기 화학식 P-11로 표시되는 화합물 (Win-chemical社, Brilliant Blue (Dye 1 11) A compound represented by the following Chemical Formula P-11 (Win-chemical, Brilliant Blue
FG) [화학식 P-l l] FG) [Formula Pl]
Figure imgf000080_0001
Figure imgf000080_0001
(안료 1) B 15:6 안료분산액 (Sanyo社) Pigment 1 B 15: 6 Pigment Dispersion (Sanyo)
광중합성 화합물  Photopolymerizable compound
디펜타에리트리를핵사아크릴레이트 (DPHA)  Dipentaerythritol Nuclear Acrylate (DPHA)
광중합 개시제  Photopolymerization initiator
옥심계 개시제 (BASF社, OXE-01 )  Oxime initiator (BASF, OXE-01)
용매  menstruum
프로필렌 글리콜 모노메틸 에테르 아세테이트 (PGMEA)  Propylene Glycol Monomethyl Ether Acetate (PGMEA)
기타 첨가제  Other additives
불소계 계면활성제 (DIC社, F-554(10% 희석액 사용)) (평가)  Fluorinated Surfactant (DIC, F-554, using 10% diluent) (Evaluation)
평가 1: 착색력 평가  Evaluation 1: evaluation of coloring power
상기 화학식 P- 1 내지 P-1 1로 표시되는 화합물을 UV-1800 UV-Vis Spectrometer 장비로 최대 흡수 파장 (ληΐίΐχ)을 측정하여, 하기 표 2에 나타내었다. 또한, 상기 화합물 20 mg을 Anone(Cyclohexanone)에 녹여 20 g의 진한 용액을 만든 후, 상기 진한 용액 0.1 g을 다시 10 g이 되도록 묽혀 0.001 중량 %의 묽은 용액을 만든다. 상온에서 상기 0.001 중량%의 용액의 분광을 측정한 후, 하기 수학식 1로부터 몰흡광계수를 계산하여, 하기 표 3에 나타내었다. [수학식 1] Compounds represented by the above formulas P-1 to P-1 1 were measured in a maximum absorption wavelength (ληΐίΐχ) by UV-1800 UV-Vis Spectrometer equipment, and are shown in Table 2 below. Further, 20 mg of the compound is dissolved in Anone (Cyclohexanone) to make 20 g of a thick solution, and then 0.1 g of the concentrated solution is diluted to 10 g again to form a 0.001% by weight dilute solution. After measuring the spectroscopy of the 0.001% by weight of the solution at room temperature, the molar extinction coefficient was calculated from Equation 1 below, and is shown in Table 3 below. [Equation 1]
A = eel  A = eel
(A: 최대 흡광도, e: 몰흡광계수, c: 몰농도 , 1: 광로 길이) (A: maximum absorbance, e: molar extinction coefficient, c: molar concentration, 1: optical path length)
[표 3] TABLE 3
Figure imgf000081_0001
상기 표 3으로부터, 일 구현예에 따른 화합물인 화학식 P-1 내지 P-10으로 표시되는 화합물은, 화학식 P-1 1로 표시되는 화합물과 최대 흡수 파장이
Figure imgf000081_0001
From Table 3, the compound represented by the formula (P-1 to P-10) is a compound according to an embodiment, the maximum absorption wavelength and the compound represented by the formula (P-1 1)
유사하더라도, 보다 우수한 착색력을 가짐을 확인할 수 있다. 평가 2: 명암비 ί콘트라스트ᅵ평가 Even similar, it can be confirmed that it has a better coloring power. Evaluation 2: Contrast Ratio ί Contrast
탈지 세척한 두께 1 mm의 유리 기판 삼에 1 내지 3 의 두께로 상기 실시예 1 내지 10 및 비교예 1 내지 비교예 4에서 제조한 감광성 수지 조성물을 도포하고, 90 °C의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하여 수득하였다. 200 °C의 열풍순환식 건조로 안에서 5분 동안 건조시켜 수득하였다. 화소층은 분광광도계 (MCPD3000, Otsuka electronic社)를 이용하여 명암비를 측정하여 그 결과를 하기 표 4에 나타내었다. The photosensitive resin composition prepared in Examples 1 to 10 and Comparative Examples 1 to 4 was applied to a glass substrate having a thickness of 1 mm, degreased, and washed for 2 minutes on a hot plate at 90 ° C. Drying to give a coating. Subsequently, the coating film was exposed by using a high pressure mercury lamp having a dominant wavelength of 365 nm. Obtained by drying in a hot air circulation drying furnace of 200 ° C for 5 minutes. The pixel layer was measured using a spectrophotometer (MCPD3000, Otsuka electronic Co., Ltd.) and the results are shown in Table 4 below.
[표 4] TABLE 4
명암비  Contrast Ratio
실시예 1 20970  Example 1 20970
실시예 2 21023  Example 2 21023
실시예 3 19231  Example 3 19231
실시예 4 18929  Example 4 18929
실시예 5 21000  Example 5 21000
실시예 6 20568  Example 6 20568
실시예 7 21533  Example 7 21533
실시예 8 19984  Example 8 19984
실시예 9 20631  Example 9 20631
실시예 10 18530  Example 10 18530
비교예 1 1821 1  Comparative Example 1 1821 1
비교예 2 18190  Comparative Example 2 18190
비교예 3 18210  Comparative Example 3 18210
비교예 4 18015 상기 표 4로부터, 일 구현예에 따른 화합물을 염료로 포함한 실시예 1 내지 실시예 10의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1 내지 비교예 4의 감광성 수지 조성물보다 우수한 명암비를 나타냄올 확인할 수 있다. 이상 본 발명에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다. Comparative Example 4 18015 From Table 4, the photosensitive resin composition of Examples 1 to 10 containing the compound according to one embodiment as a dye shows an excellent contrast ratio than the photosensitive resin composition of Comparative Examples 1 to 4 not containing the compound You can check it. As mentioned above, although this invention was demonstrated, this invention is not limited to this, A various deformation | transformation is possible in the range of a claim, the detailed description of an invention, and the attached drawing, and also this is within the scope of this invention. It is natural to belong.

Claims

【청구의 범위】 【청구항 1】 양이온 및 음이은을 포함하고, 상기 양이온은 하기 화학식 1로 표시되는 Claims [Claim 1] Contains a cation and an anionic silver, wherein the cation is represented by the following formula (1)
[화학식 1]  [Formula 1]
Figure imgf000084_0001
Figure imgf000084_0001
상기 화학식 1에서,  In Chemical Formula 1,
R1 내지 R6은 각각 독립적으로 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내 C20 헤테로아릴기이고, R 1 to R 6 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C20 heteroaryl group in C2,
R7은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 7 is a substituted or unsubstituted C6 to C20 aryl group,
X는 -0-, -S- 또는— NR8-(R8은 수소 원자, 치환 또는 비치환된 C1 내지 C10 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기)이다. X is -0-, -S- or — NR 8- (R 8 is a hydrogen atom, a substituted or unsubstituted C1 to C10 alkyl group or a substituted or unsubstituted C6 to C20 aryl group).
【청구항 2】 [Claim 2]
제 1항에 있어서,  The method of claim 1,
상기 X는 -0- 또는 -S-인 화합물.  X is -0- or -S-.
【청구항 3】 [Claim 3]
제 1항에 있어서,  The method of claim 1,
상기 R1 내지 R4는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기인 화합물. R 1 to R 4 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
【청구항 4】 제 1항에 있어서, [Claim 4] The method of claim 1,
상기 양이온은 하기 화학식 2로 표시되는 화합물.  The cation is a compound represented by the following formula (2).
[화학식 2]  [Formula 2]
Figure imgf000085_0001
Figure imgf000085_0001
상기 화학식 2에서,  In Chemical Formula 2,
R9 및 R10은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, Ri i 및 는 각각 독립적으로 수소 원자, 치환 또는 비치환된 ci 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 9 and R 10 are each independently a substituted or unsubstituted C1 to C20 alkyl group, and R ii and are each independently a hydrogen atom, a substituted or unsubstituted ci to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group ego,
R13은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 13 is a substituted or unsubstituted C6 to C20 aryl group,
R14 내지 R17은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 14 to R 17 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
nl 내지 n4는 각각 독립적으로 0 내지 5의 정수이고, 0≤ nl+n2≤ 5 이고, 0 < n3+n4 < 5 이고,  nl to n4 are each independently an integer of 0 to 5, 0 ≦ nl + n2 ≦ 5, 0 <n3 + n4 <5,
X는 -0- 또는 -S- 이다.  X is -0- or -S-.
【청구항 5】 [Claim 5]
제 1항에 있어서,  The method of claim 1,
상기 양이온은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시되는 화합물. [화학식 3]The cation is a compound represented by any one selected from the group consisting of Formula 3 to Formula 7. [Formula 3]
Figure imgf000086_0001
Figure imgf000086_0001
(상기 화학식 3에서, (In Chemical Formula 3,
18, 19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, 1 8 , 19 and R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다)  X is -0- or -S-)
[화학식 4]  [Formula 4]
Figure imgf000086_0002
Figure imgf000086_0002
(상기 화학식 4에서 R18 내지 R21,은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, (In Chemical Formula 4) R 18 to R 21 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R20은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 20 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다)  X is -0- or -S-)
[화학식 5]  [Formula 5]
Figure imgf000087_0001
Figure imgf000087_0001
(상기 화학식 5에서,  (In Chemical Formula 5,
Ris 및 Rig는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고, R22는 할로겐 원자이고, R i s and R ig are each independently a substituted or unsubstituted C1 to C20 alkyl group, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, And R 23 to R 26 are C1 to C10 alkyl groups each independently selected from ring a halogen atom or a substituted or unsubstituted,
R27은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 27 is a substituted or unsubstituted C6 to C20 aryl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다) X is -0- or -S-)
[화학식 6] [Formula 6]
Figure imgf000088_0001
Figure imgf000088_0001
(상기 화학식 6에서,  (In Chemical Formula 6,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고 R22는 할로겐 원자이고, R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group and R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환 또는 비치환된 C110 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C110 alkyl group,
R27 및 R28은 각각 독립적으로 치환 또는 비치환된 C6 내지 C20 아릴기이고 m은 0 내지 2의 정수이고, R 27 and R 28 are each independently a substituted or unsubstituted C6 to C20 aryl group and m is an integer of 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고, n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다) X is -0- or -S-)
[화학식 7] [Formula 7]
Figure imgf000088_0002
Figure imgf000088_0002
(상기 화학식 7에서, R18, R19 및 R21은 각각 독립적으로 치환 또는 비치환된 C1 내자 C20 알킬기이고, (In Chemical Formula 7, R 18 , R 19 and R 21 are each independently a substituted or unsubstituted C1 internal C20 alkyl group,
R22는 할로겐 원자이고, R 22 is a halogen atom,
R23 내지 R26은 각각 독립적으로 할로겐 원자 또는 치환또는 비치환된 C1 내지 C10 알킬기이고, R 23 to R 26 are each independently a halogen atom or a substituted or unsubstituted C1 to C10 alkyl group,
R28은 치환 또는 비치환된 C6 내지 C20 아릴기이고, R 28 is a substituted or unsubstituted C6 to C20 aryl group,
m은 0 내지 2의 정수이고,  m is an integer from 0 to 2,
n5 내지 n8은 각각 독립적으로 0 또는 1의 정수이고,  n5 to n8 are each independently an integer of 0 or 1,
X는 -0- 또는 -S- 이다)  X is -0- or -S-)
【청구항 6】 [Claim 6]
제 1항에 있어서,  The method of claim 1,
상기 양이온은 하기 화학식 5-3, 화학식 5-4, 화학식 5-5, 화학식 5-6, 화학식 7-6, 화학식 7-8, 화학식 7-10, 화학식 7-12 및 화학식 7-17 내지 화학식 7-23으로 이루어진 군에서 선택된 어느 하나로 표시되는 화합물.  The cation may be represented by the following Chemical Formulas 5-3, 5-4, 5-5, 5-6, 7-6, 7-8, 7-10, 7-12, and 7-17. A compound represented by any one selected from the group consisting of 7-23.
[화학식 5-3]  [Formula 5-3]
Figure imgf000089_0001
Figure imgf000090_0001
Figure imgf000089_0001
Figure imgf000090_0001
90
Figure imgf000091_0001
90
Figure imgf000091_0001
Figure imgf000091_0002
Figure imgf000091_0002
Figure imgf000092_0001
[화학식 7-12]
Figure imgf000093_0001
Figure imgf000092_0001
[Formula 7-12]
Figure imgf000093_0001
Figure imgf000093_0002
Figure imgf000093_0003
Figure imgf000094_0001
Figure imgf000094_0002
Figure imgf000094_0003
[ 7-22]
Figure imgf000093_0002
Figure imgf000093_0003
Figure imgf000094_0001
Figure imgf000094_0002
Figure imgf000094_0003
[7-22]
[ 7-23]  [7-23]
Figure imgf000095_0002
Figure imgf000095_0002
【청구항 기ᅵ [Claim Port]
제 1항에 있어서,  The method of claim 1,
상기 음이온은 하기 화학식 A 내지 화학식 F로 이루어진 군에서 선택된 어느 하나로 표시되는 화합물.  The anion is a compound represented by any one selected from the group consisting of Formula A to Formula F.
[화학식 A] [Formula A]
Figure imgf000095_0003
Figure imgf000095_0003
[화학식 B] 95 [Formula B] 95
[화학식 C] [Formula C]
PW12O40 3" PW 12 O 40 3 "
[화학식 D]  [Formula D]
SiW12O40 4" SiW 12 O 40 4 "
[화학식 E]  [Formula E]
CF3SO3" CF3SO3 "
[화학식 F]  Formula F]
C104 " C10 4 "
【청구항 8 ] [Claim 8]
제 1항에 있어서,  The method of claim 1,
상기 화합물은 염료인 화합물.  The compound is a dye.
【청구항 9】 [Claim 9]
거 1 8항에 있어서,  According to claim 18,
상기 염료는 청색 염료인 화합물.  The dye is a blue dye.
【청구항 10】 [Claim 10]
제 1항에 있어서,  The method of claim 1,
상기 화합물은 600 nm 내지 700 nm의 파장범위에서 최대 흡광도 (λ Χ)를 가지는 화합물. The compound has a maximum absorbance (λ Χ ) in the wavelength range of 600 nm to 700 nm.
【청구항 1 1】 [Claim 1 11]
제 1항에 있어서,  The method of claim 1,
상기 화합물은 400 nm 내지 500 nm의 파장범위에서 丁^를 가지는 화합물.  The compound has a compound in the wavelength range of 400 nm to 500 nm.
【청구항 12】 [Claim 12]
게 1항 내지 제 1 1항 중 어느 한 항의 화합물을 포함하는 감광성 수지 조성물.  The photosensitive resin composition containing the compound of any one of Claims 1-1.
【청구항 13】 [Claim 13]
제 12항에 있어서, 상기 감광성 수지 조성물은 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함하는 감광성 수지 조성물. The method of claim 12, The photosensitive resin composition further comprises a binder resin, a photopolymerizable compound, a photopolymerization initiator and a solvent.
【청구항 14] [Claim 14]
제 13항에 있어서,  The method of claim 13,
상기 감광성 수지 조성물은 안료를 더 포함하는 감광^ 수지 조성물. 【청구항 15】  The photosensitive resin composition is a photosensitive resin composition further comprises a pigment. [Claim 15]
제 12항의 감광성 수지 조성물을 이용하여 제조되는 컬러필터 .  The color filter manufactured using the photosensitive resin composition of Claim 12.
PCT/KR2015/013609 2015-07-30 2015-12-11 Novel compound, photosensitive resin composition containing same, and color filter WO2017018617A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08179465A (en) * 1994-12-26 1996-07-12 Konica Corp Silver halide photographic sensitive material and development processing method
JP2011227408A (en) * 2010-04-23 2011-11-10 Toyo Ink Sc Holdings Co Ltd Triallyl methane coloring agent and its usage
KR20140001396A (en) * 2012-06-27 2014-01-07 한국과학기술원 Blind source extraction method in frequency domain and de-mixing system therefor
WO2015041114A1 (en) * 2013-09-17 2015-03-26 富士フイルム株式会社 Curable coloring composition, cured film, color filter, method for manufacturing color filter, solid-state image pickup element, picture display device, and triarylmethane compound
KR20150070957A (en) * 2013-12-17 2015-06-25 스미또모 가가꾸 가부시키가이샤 Dyes and colored curable resin composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08179465A (en) * 1994-12-26 1996-07-12 Konica Corp Silver halide photographic sensitive material and development processing method
JP2011227408A (en) * 2010-04-23 2011-11-10 Toyo Ink Sc Holdings Co Ltd Triallyl methane coloring agent and its usage
KR20140001396A (en) * 2012-06-27 2014-01-07 한국과학기술원 Blind source extraction method in frequency domain and de-mixing system therefor
WO2015041114A1 (en) * 2013-09-17 2015-03-26 富士フイルム株式会社 Curable coloring composition, cured film, color filter, method for manufacturing color filter, solid-state image pickup element, picture display device, and triarylmethane compound
KR20150070957A (en) * 2013-12-17 2015-06-25 스미또모 가가꾸 가부시키가이샤 Dyes and colored curable resin composition

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