WO2017006620A1 - Talbot-lau interferometer - Google Patents

Talbot-lau interferometer Download PDF

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Publication number
WO2017006620A1
WO2017006620A1 PCT/JP2016/064038 JP2016064038W WO2017006620A1 WO 2017006620 A1 WO2017006620 A1 WO 2017006620A1 JP 2016064038 W JP2016064038 W JP 2016064038W WO 2017006620 A1 WO2017006620 A1 WO 2017006620A1
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WIPO (PCT)
Prior art keywords
grating
lattice
zeroth
talbot
axis
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PCT/JP2016/064038
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French (fr)
Japanese (ja)
Inventor
一裕 二瓶
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コニカミノルタ株式会社
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Priority to JP2017527108A priority Critical patent/JP6638728B2/en
Publication of WO2017006620A1 publication Critical patent/WO2017006620A1/en

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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/06—Diaphragms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T7/00—Details of radiation-measuring instruments

Definitions

  • the present invention relates to a Talbot-Lau interferometer.
  • X-ray phase imaging has attracted attention from the viewpoint of reducing the amount of exposure, and for example, X-ray imaging apparatuses using a Talbot-Lau interferometer have been widely implemented.
  • three X-ray metal gratings of a 0th grating, a first grating, and a second grating are used.
  • the zeroth grating is a normal grating used to make a single X-ray source a multi-light source, and X-rays emitted from the single X-ray source are converted into a plurality of X-rays (a plurality of X-rays). Radiation).
  • Patent Document 1 discloses a joint imaging apparatus using a Talbot-Lau interferometer.
  • the 0th grating, the first grating, and the second grating are held in the interferometer main body so as to be movable, so that the 0th grating and the first grating can be adjusted to be parallel to each other and at a predetermined distance.
  • the first grating and the second grating can be adjusted in parallel to each other and at a predetermined distance.
  • the Talbot-Lau interferometer is For example, vibration is received at a place where the Talbot-Lau interferometer is installed, or vibration is received from a subject.
  • the Talbot-Lau interferometer is subject to temperature changes at the location where the Talbot-Lau interferometer is installed.
  • the parallelism and distance between the zeroth and first gratings change, or the parallelism and distance between the first and second gratings change. End up. As a result, the subject may not be captured with a clear image.
  • the present invention has been made in view of the above-described circumstances, and an object thereof is to provide a Talbot-Lau interferometer that can obtain a clearer image of a subject even when subjected to vibration or temperature change. is there.
  • the Talbot-Lau interferometer according to the present invention includes a vibration applying member that applies vibration to the 0th, 1st and 2nd gratings and the 0th grating, and the 0th grating is movable in the first direction. And rotatable about a second axis extending in a second direction orthogonal to the first direction and about a third axis extending in a third direction orthogonal to each of the first and second directions, The first and second gratings are fixed to each other in a state of being parallel to each other at a predetermined distance, the vibration applying member vibrates the zeroth grating in the first direction, and the second Vibrate around the axis and around the third axis. Therefore, the Talbot-Lau interferometer according to the present invention can obtain a clearer image of the subject even when subjected to vibration or temperature change.
  • FIG. 1 is a perspective view of a Talbot-Lau interferometer in the embodiment.
  • FIG. 2 is a block diagram showing the configuration of the Talbot-Lau interferometer of FIG.
  • FIG. 3 is a schematic view of the main part of the Talbot-Lau interferometer of FIG.
  • FIG. 4 is a schematic diagram showing the positional relationship between the X-ray source and the zeroth, first, and second gratings used in the Talbot-Lau interferometer of FIG.
  • FIG. 5 is an enlarged view of a main part of the Talbot-Lau interferometer shown in FIG.
  • FIG. 5A is a side view and
  • FIG. 5B is a top view.
  • FIG. 6 is an enlarged bottom view of the zeroth lattice held by the holding frame.
  • FIG. 7 is an enlarged perspective view of the 0th lattice body included in the 0th lattice.
  • FIG. 8 is a perspective view of the zeroth grid held in the holding frame and the first and second grids stored in the storage member.
  • the first direction is the Z1-Z2 direction
  • the second direction orthogonal to the first direction is the X1-X2 direction
  • the third direction orthogonal to the first direction and the second direction is the Y1-Y2 direction.
  • the Talbot-Lau interferometer 1 in this embodiment includes an interferometer body 10, a 0th grating (G0 grating) 2 and a first grating (G1 grating) held by the interferometer body 10. ) 3 and the second lattice (G2 lattice) 4, a vibration applying member 5 (shown in FIGS. 5 and 6) for applying vibration to the 0th lattice 2, and a storage housing the first lattice 3 and the second lattice 4. And a member 6.
  • the interferometer main body 10 includes a support column 11, an X-ray source 12, an X-ray imaging unit (imaging unit) 13, an X-ray power supply unit 14 that supplies power to the X-ray source 12, and an X-ray imaging unit 13.
  • the X-ray radiation operation in the X-ray source 12 is controlled by controlling the power supply operation of the camera control unit 15 that controls the imaging operation, the processing unit 16 that controls the entire operation of the interferometer body 10, and the X-ray power supply unit 14. And an X-ray control unit 17 to be controlled.
  • the support column 11 includes a support column main body 110 extending in the Z1-Z2 direction (first direction), and an X-ray source holding unit disposed in order from the Z1 side to the Z2 side of the support column main unit 110. It includes a piece 111, a 0th grid holding unit 112, a 0th grid receiving unit 113, an imaging stage 114 and an imaging unit holding unit 115.
  • the X-ray source holding piece 111 protrudes from the support column main body 110 to the X1 side, and holds the X-ray source 12 at the protruding tip.
  • the 0th lattice receiving portion 113 is a plate-like member as shown in FIGS. 3 and 5, and can receive the 0th lattice 2 from the Z2 side. Note that the 0th lattice receiving portion 113 is formed so as not to hinder the progress of X-rays.
  • the imaging stage 114 is a plate-like member as shown in FIG. 3 and protrudes from the support column main body 110 to the X1 side, and the subject S is placed on the upper surface thereof.
  • the subject placement portion of the imaging placement base 114 on which the subject S is placed is configured not to prevent the progress of X-rays.
  • the imaging unit holding unit 115 is a plate-like member and protrudes from the support column main body 110 to the X1 side, and holds the X-ray imaging unit 13.
  • the 0th lattice holding unit 112 will be described later.
  • the X-ray imaging unit 13 includes an imaging unit main body 130 that captures an X-ray image diffracted by the second grating 3, and interference between a first interference pattern 221 and a second interference pattern 613 described later.
  • the detection part 131 which detects this is provided.
  • the imaging unit main body 130 is, for example, a flat panel detector (FPD) including a two-dimensional image sensor in which a thin film layer including a scintillator that absorbs X-ray energy and emits fluorescence is formed on a light receiving surface, or incident photons are photoelectrically detected.
  • FPD flat panel detector
  • the image is converted into electrons on the surface, the electrons are doubled by the microchannel plate, and the image intensifier unit that emits light by colliding the doubled electron group with the phosphor, and the output light of the image intensifier unit are imaged
  • the detection unit 131 is formed on substantially the entire circumference of the imaging unit main body 130.
  • the detection unit 131 detects an interference pattern generated by the interference between the X-rays that have passed through the first interference pattern 211 and the X-rays that have passed through the second interference pattern 613, and the imaging unit main body 130 is based on the interference result.
  • An X-ray image diffracted by the second grating 3 is picked up.
  • the processing unit 16 is a device that controls the overall operation of the Talbot-Lau interferometer 1 by controlling each unit of the Talbot-Lau interferometer 1 according to the function of each unit. As shown in FIG. 2, the image processing unit 161 and the system control unit 162 are functionally provided.
  • the system control unit 162 controls the X-ray emission operation in the X-ray source 12 via the X-ray power source unit 14 by transmitting and receiving control signals to and from the X-ray control unit 17, and the camera control unit 15
  • the imaging operation of the X-ray imaging unit 13 is controlled by transmitting and receiving control signals between the X-ray imaging unit 13 and the X-ray imaging unit 13.
  • X-rays are emitted toward the subject S, an image generated thereby is captured by the X-ray imaging unit 13, and an image signal is input to the processing unit 16 via the camera control unit 15.
  • the system control unit 162 includes a first power supply signal for operating a first piezoelectric element 51 of a vibration applying member 5 described later, a second power supply signal for operating a second piezoelectric element 52 of a vibration applying member 5 described later, and a vibration applying described later.
  • a third power supply signal that operates the third piezoelectric element 53 of the member 5 is output to each of the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53.
  • the image processing unit 161 processes the image signal generated by the X-ray imaging unit 13 and generates an image of the subject S.
  • the 0th grid 2 includes a 0th grid body 21 and a 0th grid holding frame 22 that holds the 0th grid body 21.
  • the zeroth lattice main body 21 has a predetermined thickness (depth) H in the Z1-Z2 direction and extends linearly in the Y1-Y2 direction on a silicon material such as a silicon wafer.
  • a plurality of X-ray transmission parts 212 having the predetermined thickness H and extending in a line in the Y1-Y2 direction and embedded with metal. 211, and the plurality of X-ray absorption units 211 and the plurality of X-ray transmission units 212 are alternately arranged in parallel. For this reason, the plurality of X-ray absorbers 211 are respectively arranged at predetermined intervals in the X1-X2 direction orthogonal to the Y1-Y2 direction.
  • This interval (pitch) P is constant in this embodiment. That is, the plurality of X-ray absorbers 211 are arranged at equal intervals P in the X1-X2 direction.
  • the X-ray absorption unit 211 is plate-shaped or layered, and the plurality of X-ray transmission units 212 are plate-shaped or layered spaces sandwiched between the X-ray absorption units 211 adjacent to each other.
  • the plurality of X-ray absorption units 211 function to absorb X-rays, and the X-ray transmission units 212 function to transmit X-rays.
  • the width W in the X-ray absorber 211 is the length in the X-ray absorber 211 in the third direction, and the thickness H is the length of the X-ray absorber 211 in the first direction.
  • the 0th grid holding frame 22 is formed of a rectangular tube shape arranged on the entire outer periphery of the 0th grid body 21 in this embodiment, and includes a first interference pattern 221. ing.
  • the first interference pattern 221 includes a plurality of slits arranged at equal intervals along each of the X1-X2 direction and the Y1-Y2 direction. Each slit is formed by embedding metal at a predetermined depth in the thickness direction along the Z1-Z2 direction.
  • the 0th lattice 2 formed in this way is movable in the Z1-Z2 direction to the 0th lattice holding portion 112 of the support column 11, and in the X1-X2 direction (second direction). It is rotatably held around an extending X axis (second axis) 2a and around a Y axis (third axis) 2b extending in the Y1-Y2 direction (third direction).
  • the 0th lattice holding part 112 includes a columnar connecting shaft 112a and a substantially U-shaped holding frame 112b.
  • One end of the connecting shaft 112a is connected to the column main body 110, and the other end extends from the column main body 110 to the X1 side.
  • the holding frame 112b includes a rotating shaft 112c formed to face each other.
  • the holding frame 112b is connected to the connecting shaft 112a so as to be movable in the Z1-Z2 direction and rotatable about the connecting shaft 112a.
  • the 0th lattice 2 is rotatably inserted into the rotation shaft 112c of the holding frame 112b, whereby the 0th lattice 2 is movable in the Z1-Z2 direction and the X axis (second axis) 2a.
  • the Y-axis (third axis) 2b it is held by the 0th grid holding part 112 so as to be rotatable.
  • the vibration applying member 5 includes a first piezoelectric element 51, a second piezoelectric element 52, and a third piezoelectric element 53.
  • the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 have substantially the same configuration, and each of the piezoelectric elements 51 to 53 has mechanical energy that expands and contracts input electrical energy, that is, mechanical For example, the electric energy of the input is converted into a mechanical expansion / contraction motion by the piezoelectric effect.
  • Such piezoelectric elements 51 to 53 include, for example, a laminate and a pair of external electrodes.
  • the laminated body is formed by alternately laminating a plurality of thin film (layered) piezoelectric layers made of a piezoelectric material and a thin film (layered) internal electrode layer having conductivity.
  • Each of the plurality of internal electrode layers is configured to face the outside with a pair of outer peripheral side surfaces facing each other.
  • the pair of external electrodes are formed along the stacking direction on the pair of outer peripheral side surfaces of the stacked body, supply the electric energy to the stacked body, and are sequentially connected to the plurality of internal electrodes in turn.
  • piezoelectric material examples include lead zirconate titanate (PZT), crystal, lithium niobate (LiNbO 3 ), potassium tantalate niobate (K (Ta, Nb) O 3 ), and barium titanate (BaTiO 3 ).
  • PZT lead zirconate titanate
  • crystal lithium niobate
  • K (Ta, Nb) O 3 potassium tantalate niobate
  • BaTiO 3 barium titanate
  • Inorganic piezoelectric materials such as lithium tantalate (LiTaO 3 ) and strontium titanate (SrTiO 3 ).
  • the first piezoelectric element 51 is an element for vibrating the zeroth lattice 2 around the X axis 2a by expansion and contraction in the stacking direction (the axial direction of the first piezoelectric element 51), and the zeroth lattice holding frame 22 of the zeroth lattice 2.
  • the first piezoelectric element 51 is activated when it receives the first power supply signal.
  • the second piezoelectric element 52 is an element for vibrating the zeroth lattice 2 around the Y axis 2b by expansion and contraction in the stacking direction (the axial direction of the second piezoelectric element 52), and the zeroth lattice holding frame 22 of the zeroth lattice 2.
  • the second piezoelectric element 52 is activated when receiving the second power feeding signal.
  • the third piezoelectric element 53 is an element for vibrating the zeroth lattice 2 in the Z1-Z2 direction by expansion and contraction in the stacking direction (the axial direction of the third piezoelectric element 53).
  • the third piezoelectric element 53 includes two elements.
  • the third piezoelectric element 53 is arranged between the 0th lattice holding frame 22 of the 0th lattice 2 and the 0th lattice receiving portion 113 of the support column 11 in the Y1 side of the 0th lattice holding frame 22 and in the X1-X2 direction.
  • the third piezoelectric element 53 operates when receiving the third power feeding signal.
  • the vibration imparting member 5 is not limited to a piezoelectric actuator using a piezoelectric material, and can be changed as appropriate.
  • an electrostatic actuator can be used, and can be changed as appropriate.
  • the vibration applying member 5 arranged in this way is covered with the upper cover 17a together with the 0th lattice 2 as shown in FIG.
  • the first grating 3 is a diffraction grating that generates a Talbot effect by X-rays emitted from the X-ray source 12.
  • the first grating 3 has a predetermined thickness (depth) in the Z1-Z2 direction, extends linearly in the Y1-Y2 direction, and is alternately arranged in parallel, like the zeroth grating body 21.
  • a plurality of X-ray absorbing portions and a plurality of X-ray transmitting portions are provided.
  • the first grating 3 is configured so as to satisfy the conditions for causing the Talbot effect, and is a grating sufficiently coarser than the wavelength of X-rays emitted from the X-ray source 12, for example, a grating constant (period of diffraction grating). Is a phase type diffraction grating having an X-ray wavelength of about 20 or more.
  • the first grating 3 may be an amplitude type diffraction grating.
  • the first grating 3 is arranged in parallel with a distance (first distance) L4 that is an integral multiple of the wavelength of the X-ray, as shown in FIG. Is done.
  • the second grating 4 is a transmission-type amplitude diffraction grating that is disposed at a position that is approximately the Talbot distance L2 away from the first grating 3 and that diffracts the X-rays diffracted by the first grating 3. Like the first grating 3, the second grating 4 also has a predetermined thickness (depth) in the Z1-Z2 direction, extends linearly in the X1-X2 direction, and is alternately arranged in parallel. A plurality of X-ray absorbing portions and a plurality of X-ray transmitting portions are provided.
  • the second grating 4 is arranged so as to satisfy the first grating 3 that is a phase type diffraction grating and the following expressions 1 and 2.
  • l ⁇ / (a / (L1 + L2 + L3))
  • Z1 (m + 1/2) ⁇ (d2 / ⁇ )
  • l is the coherence distance
  • ⁇ is the wavelength of X-rays (usually the center wavelength)
  • a is the aperture diameter of the X-ray source 12 in a direction substantially perpendicular to the diffraction member of the diffraction grating.
  • L1 is the distance from the X-ray source 12 to the first diffraction grating 3
  • L2 is the distance (second distance) from the first diffraction grating 3 to the second diffraction grating 4
  • L3 is the first 2 is the distance from the diffraction grating 103 to the X-ray imaging unit 13
  • m is an integer
  • d is the period of the diffraction member (period of the diffraction grating, grating constant, distance between the centers of adjacent diffraction members, the pitch P).
  • the storage member 6 includes a frame portion 61, a temperature sensor 62, and a temperature adjustment member 63.
  • the frame portion 61 includes a side portion 611 and a peripheral edge portion 612, and the inside is sealed by these.
  • the side portion 611 is made of a material that can transmit X-rays, for example, glass.
  • the peripheral edge 612 includes a second interference pattern 613 for causing interference with the first interference pattern 221 of the 0th grating 2 as shown in FIG.
  • the second interference pattern 613 includes a plurality of slits arranged at equal intervals along the X1-X2 direction and the Y1-Y2 direction so as to correspond to the first interference pattern 221. Each slit is formed by embedding metal at a predetermined depth in the thickness direction along the Z1-Z2 direction.
  • the first lattice 3 and the second lattice 4 are fixedly arranged in a parallel state at a predetermined distance from each other and enclosed in the frame portion 61. As shown in FIG. 3, the first lattice 3 and the second lattice 4 enclosed in the frame portion 61 satisfy the above (Formula 1) and Formula (2) on the Z2 side of the imaging stage 114. Has been placed. The first grid 3 and the second grid arranged in this way are covered with a lower cover 17b as shown in FIG.
  • the temperature sensor 62 detects the temperature inside the storage member 6, and in this embodiment, is attached to the inner surface of the frame portion 61 as shown in FIG.
  • the temperature adjustment member 63 is an element that adjusts the temperature inside the storage member 6, and includes, for example, a Peltier element.
  • the temperature adjustment member 63 is attached to the inner surface of the frame portion 61, and adjusts to the set temperature range by raising or lowering the temperature inside the storage member 6 based on the temperature detected by the temperature sensor 62.
  • FIG. 9 is an explanatory diagram of the X-ray imaging unit in a state where the 0th grating and the first grating are parallel to each other with a first distance.
  • FIG. 10 is an explanatory diagram of the X-ray imaging unit in a state in which the 0th grating is rotated around the second axis from the parallel state with respect to the first grating.
  • FIG. 11 is an explanatory diagram of the X-ray imaging unit in a state in which the 0th grating is rotated around the third axis from the parallel state with respect to the first grating.
  • the subject S is placed between the 0th grid 2 and the first grid 3 by placing the subject S on the imaging stage 114.
  • the system control unit 162 of the processing unit 16 emits X-rays toward the subject S.
  • a control signal is output to the X-ray controller 17 for irradiation.
  • the X-ray control unit 17 causes the X-ray power supply unit 14 to supply power to the X-ray source 12, and the X-ray source 12 emits X-rays and irradiates the subject S with X-rays.
  • the system control unit 162 includes a first power supply signal that operates a first piezoelectric element 51 of a vibration applying member 5 described later, a second power supply signal that operates a second piezoelectric element 52 of the vibration applying member 5, and a first power supply signal of the vibration applying member 5.
  • a third power supply signal for operating the third piezoelectric element 53 is transmitted in a superimposed manner to the first piezoelectric element 51, the second piezoelectric element 52 and the third piezoelectric element 53.
  • the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 operate, and the zeroth lattice 2 vibrates in the Z1-Z2 direction, and around the X axis 2a and the Y axis 2b. Vibrate.
  • the irradiated X-rays pass through the first grating 3 through the zeroth grating 2 and the subject S, are diffracted by the first grating 3, and are talvo which is a self-image of the first grating 3 at a position separated by the Talbot distance.
  • An image T is formed.
  • the formed X-ray Talbot image T is diffracted by the second grating 4 to generate moire and form a moire fringe image.
  • the distance between the preset 0th lattice 2 and the first lattice 3 is shifted, or the 0th lattice 2 and the first lattice 3 are not parallel, or the preset first lattice 3 and the second lattice 3 If the distance from 4 is shifted, or the first grating 3 and the second grating 4 are not parallel, the image picked up by the X-ray imaging unit 13 becomes unclear.
  • Such a shift or inclination of the distance between the two lattices 2, 3, 4 adjacent to each other may occur, for example, when the Talbot-Lau interferometer as a whole is subjected to vibrations or temperature changes from the outside.
  • the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 cause the zeroth lattice 2 to vibrate in the Z1-Z2 direction, and around the X axis 2a and the Y axis 2b. Therefore, during the vibration, the 0th grating 2 comes to a position parallel to the first grating 3 with a first distance L4.
  • the vibration frequency of the 0th lattice 2 that vibrates around the X axis 2a by the first piezoelectric element 51 and the vibration frequency of the 0th lattice 2 that vibrates around the Y axis 2b by the second piezoelectric element 52 are mutually prime, that is, mutually By not having a common divisor other than 1, no miso motion (precession motion) or wrinkle motion occurs, and the 0th lattice 2 is parallel to the first lattice 3 during the vibration. The time will come.
  • the first lattice 3 and the second lattice 4 are sealed in the storage member 6 at a predetermined temperature, the first lattice 3 and the second lattice 4 are subjected to vibration and temperature changes from the outside. Are maintained in a parallel state at a second distance from each other. Accordingly, at a position where the 0th grating 2 is parallel to the first grating 3 by a first distance, the first grating 3 and the second grating 4 are parallel to each other by a second distance. .
  • the detection unit 131 detects an interference pattern caused by the interference between the X-rays that have passed through the first interference pattern 211 and the X-rays that have passed through the second interference pattern 613, and the detection result is used as the processing unit 16. Is output to the system control unit 162, and the system control unit 162 instructs the X-ray imaging unit 13 to instruct imaging via the camera control unit 15 when the interference pattern of the detection result of the detection unit 131 is equally spaced. Output a signal.
  • the X-ray imaging unit 13 captures the moiré fringe image 13a at the timing when the interference pattern is equally spaced by the control signal instructing the imaging. Therefore, at that time, the image 13a detected by the X-ray imaging unit 13 is a clear image as shown in FIG.
  • the X-ray imaging unit 13 outputs the image signal of the moire fringe image to the processing unit 16 via the camera control unit 15. This image signal is processed by the image processing unit 161 of the processing unit 16.
  • the second interference pattern 613 is formed on the storage member 6 that stores the first lattice 3 and the second lattice 4, and the first lattice 3 is indirectly second through the storage member 6.
  • the interference pattern 613 is provided, the present invention is not limited to this configuration and can be changed as appropriate.
  • the second interference pattern 613 is directly formed on one or both of the first grating 3 and the second grating 4, so that either one or both of the first grating 3 and the second grating 4 is formed.
  • the second interference pattern 613 may be provided.
  • X-rays are used, but visible light may be used instead of X-rays, and can be changed as appropriate.
  • a Talbot-Lau interferometer includes an interferometer body having an X-ray source that emits X-rays, and a zeroth array arranged in the first direction in order from the X-ray source and held by the interferometer body. Applying vibration to apply vibration to the zeroth lattice such that the lattice, the first lattice, the second lattice, and the zeroth lattice are in parallel with the first lattice with a predetermined first distance in vibration.
  • the zeroth lattice is movable in the first direction and extends in a second direction perpendicular to the first direction, and the zeroth lattice is between the first direction and the second direction.
  • the interferometer body is rotatably held around a third axis extending in a third direction orthogonal to each other, and the first grating and the second grating are parallel to each other with a predetermined second distance from each other.
  • the vibration applying members are fixed to each other, By vibrating the child in the first direction, to and vibrate in each of said second axis and said third axis.
  • the first grating and the second grating are fixed to each other in a state where they are parallel to each other at a second distance, and thus are subject to vibration and temperature change.
  • the first grating and the second grating can maintain a state of being parallel to each other with a second distance.
  • the vibration applying member moves the 0th lattice in the first direction even if the 0th lattice is subjected to vibration or temperature change and the distance between the 0th lattice and the first lattice changes or the parallel state is shifted.
  • the zeroth grid is spaced apart from the first grid by the first distance during the vibration by vibrating so as to rotate around the second axis and around the third axis. Sometimes it comes to the position of the parallel state. Therefore, the Talbot-Lau interferometer can obtain a clearer image of the subject by imaging the subject at that position.
  • a vibration frequency for vibrating the zeroth lattice about the second axis and a vibration frequency for vibrating the zeroth lattice about the third axis are mutually It is prime.
  • the zeroth lattice does not become parallel to the first lattice when a miso-motion (precession) or heel movement occurs. Therefore, as in the above configuration, the vibration frequency rotated about the second axis and the vibration frequency rotated about the third axis are not prime, that is, have no common divisor other than 1.
  • the Talbot-Lau interferometer can prevent mismovement (precession movement) or wrinkle movement.
  • the first grating and the second grating are sealed inside the housing member so that the temperature can be adjusted.
  • the first grating and the second grating are sealed in the housing member so that the temperature can be adjusted. Therefore, the Talbot-Lau interferometer is reliably in a state of being parallel to each other with a second distance. Maintained. Even if the first grid and the second grid are stored in the storage member, the subject is arranged between the 0th grid and the first grid, so that the imaging is not hindered.
  • the first grating further includes an imaging unit on the opposite side of the first grating across the second grating, and the zeroth grating is And a first interference pattern, wherein at least one of the first grating and the second grating interferes with the first interference pattern when the zeroth grating is parallel to the first grating with the first distance therebetween.
  • a second interference pattern wherein the imaging unit includes an imaging unit body and a detection unit that detects the interference, and the imaging unit body interferes with the first interference pattern based on a detection result of the detection unit. The subject is imaged at a timing at which the interference pattern with the second interference pattern is equally spaced.
  • the imaging unit main body captures an image of the subject based on the detection result of the detection unit, it is easy to make the 0th grating parallel to the first grating with a first distance.
  • the subject can be detected and the subject can be easily and reliably imaged in that state.
  • a Talbot-Lau interferometer can be provided.

Abstract

This Talbot-Lau interferometer comprises a zeroth grating, a first grating, a second grating, and a vibration applying member to apply vibration to the zeroth grating. The zeroth grating can move in a first direction and can rotate about a second axis extending in a second direction that is orthogonal to the first direction and about a third axis extending in a third direction that is orthogonal to both the first and the second directions. The first and second gratings are fixed to each other in a state in which the gratings are parallel to each other at a prescribed distance from each other. The vibration applying member vibrates the zeroth grating in the first direction and about each of the second axis and the third axis.

Description

タルボ・ロー干渉計Talbot-Lau interferometer
　本発明は、タルボ・ロー干渉計に関する。 The present invention relates to a Talbot-Lau interferometer.
　近年、被爆量の低減の観点から、Ｘ線位相イメージングが注目されており、例えばタルボ・ロー干渉計を用いたＸ線撮像装置が広く実施されている。タルボ・ロー干渉計を用いたＸ線撮像装置では、第０格子、第１格子および第２格子の３個のＸ線用金属格子が用いられている。この第０格子は、単一のＸ線源をマルチ光源とするために利用される通常の格子であり、前記単一のＸ線源から放射されたＸ線を複数のＸ線（複数のＸ線ビーム）に分けて放射する。これら第１および第２格子は、互いにタルボ距離だけ離間して配置される回折格子である。このようなタルボ・ロー干渉計を用いた装置として、例えば特許文献１に、タルボ・ロー干渉計を用いた関節撮影装置が開示されている。特許文献１では、第０格子、第１格子および第２格子は、干渉計本体に位置移動可能に保持され、これにより、第０格子と第１格子とが互いに平行且つ所定の距離に調整可能、且つ、第１格子と第２格子とが互いに平行且つ所定の距離に調整可能とされている。 In recent years, X-ray phase imaging has attracted attention from the viewpoint of reducing the amount of exposure, and for example, X-ray imaging apparatuses using a Talbot-Lau interferometer have been widely implemented. In an X-ray imaging apparatus using a Talbot-Lau interferometer, three X-ray metal gratings of a 0th grating, a first grating, and a second grating are used. The zeroth grating is a normal grating used to make a single X-ray source a multi-light source, and X-rays emitted from the single X-ray source are converted into a plurality of X-rays (a plurality of X-rays). Radiation). These first and second gratings are diffraction gratings that are spaced apart from each other by a Talbot distance. As an apparatus using such a Talbot-Lau interferometer, for example, Patent Document 1 discloses a joint imaging apparatus using a Talbot-Lau interferometer. In Patent Document 1, the 0th grating, the first grating, and the second grating are held in the interferometer main body so as to be movable, so that the 0th grating and the first grating can be adjusted to be parallel to each other and at a predetermined distance. In addition, the first grating and the second grating can be adjusted in parallel to each other and at a predetermined distance.
　しかしながら、第０格子と第１格子とが互いに平行且つ所定の距離に設定され、また、第１格子と第２格子とも互いに平行且つ所定の距離に設定されても、タルボ・ロー干渉計は、例えばタルボ・ロー干渉計が設置される場所で振動を受け、或いは被験者から振動を受ける。また、タルボ・ロー干渉計は、タルボ・ロー干渉計が設置される場所で温度変化を受ける。このような振動を受け、或いは温度変化を受けると、第０格子と第１格子との平行度や距離が変化し、或いは、第１格子と第２格子との平行度や距離が変化してしまう。その結果、被写体を鮮明な画像で撮像できない場合がある。 However, even if the 0th grating and the first grating are set parallel to each other and at a predetermined distance, and both the first grating and the second grating are set to be parallel to each other and at a predetermined distance, the Talbot-Lau interferometer is For example, vibration is received at a place where the Talbot-Lau interferometer is installed, or vibration is received from a subject. The Talbot-Lau interferometer is subject to temperature changes at the location where the Talbot-Lau interferometer is installed. When subjected to such vibrations or temperature changes, the parallelism and distance between the zeroth and first gratings change, or the parallelism and distance between the first and second gratings change. End up. As a result, the subject may not be captured with a clear image.
特開２０１３－０８５６３１号公報JP 2013-085631 A
　本発明は、上述の事情に鑑みて為された発明であり、その目的は、振動や温度変化を受けても被写体のより鮮明な画像を得ることができるタルボ・ロー干渉計を提供することである。 The present invention has been made in view of the above-described circumstances, and an object thereof is to provide a Talbot-Lau interferometer that can obtain a clearer image of a subject even when subjected to vibration or temperature change. is there.
　本発明にかかるタルボ・ロー干渉計は、第０、第１および第２格子および前記第０格子に振動を付与する振動付与部材を備え、前記第０格子は、前記第１方向に移動可能、且つ、前記第１方向に直交する第２方向に延びる第２軸回り、および、前記第１および第２方向それぞれに直交する第３方向に延びる第３軸回りにそれぞれ回動可能であり、前記第１および第２格子は、互いに所定距離を隔てて互いに平行になった状態で、互いに固定され、前記振動付与部材は、前記第０格子を前記第１方向に振動させ、且つ、前記第２軸回りと前記第３軸回りとのそれぞれに振動させる。したがって、本発明にかかるタルボ・ロー干渉計は、振動や温度変化を受けても被写体のより鮮明な画像を得ることができる。 The Talbot-Lau interferometer according to the present invention includes a vibration applying member that applies vibration to the 0th, 1st and 2nd gratings and the 0th grating, and the 0th grating is movable in the first direction. And rotatable about a second axis extending in a second direction orthogonal to the first direction and about a third axis extending in a third direction orthogonal to each of the first and second directions, The first and second gratings are fixed to each other in a state of being parallel to each other at a predetermined distance, the vibration applying member vibrates the zeroth grating in the first direction, and the second Vibrate around the axis and around the third axis. Therefore, the Talbot-Lau interferometer according to the present invention can obtain a clearer image of the subject even when subjected to vibration or temperature change.
　上記並びにその他の本発明の目的、特徴および利点は、以下の詳細な記載と添付図面から明らかになるであろう。 The above and other objects, features and advantages of the present invention will become apparent from the following detailed description and the accompanying drawings.
実施形態におけるタルボ・ロー干渉計の斜視図である。It is a perspective view of the Talbot low interferometer in an embodiment. 図１に示すタルボ・ロー干渉計の構成を示すブロック図である。It is a block diagram which shows the structure of the Talbot low interferometer shown in FIG. 図１に示すタルボ・ロー干渉計の要部の概略図である。It is the schematic of the principal part of the Talbot low interferometer shown in FIG. 図１に示すタルボ・ロー干渉計に用いられる、Ｘ線源と、第０格子、第１格子および第２格子の位置関係を示す概略図である。It is the schematic which shows the positional relationship of the X-ray source and 0th grating | lattice, 1st grating | lattice, and 2nd grating | lattice used for the Talbot low interferometer shown in FIG. 図１に示すタルボ・ロー干渉計の要部拡大図である。It is a principal part enlarged view of the Talbot low interferometer shown in FIG. 保持枠に保持された状態の第０格子の拡大した底面図である。It is the expanded bottom view of the 0th grating | lattice of the state hold | maintained at the holding frame. 第０格子が有する第０格子本体の拡大斜視図である。It is an expansion perspective view of the 0th lattice main part which the 0th lattice has. 保持枠に保持された状態の第０格子と、収納部材に収納された状態の第１格子および第２格子との斜視図である。It is a perspective view of the 0th grating | lattice of the state hold | maintained at the holding frame, and the 1st grating | lattice and the 2nd grating | lattice of the state accommodated in the storage member. 第０格子と第１格子とが第１距離を隔てて平行になった状態におけるＸ線撮像部の説明図である。It is explanatory drawing of the X-ray imaging part in the state which the 0th grating | lattice and the 1st grating | lattice became in parallel with the 1st distance. 第０格子が第１格子に対して平行状態から第２軸回りに回動した状態におけるＸ線撮像部の説明図である。It is explanatory drawing of the X-ray imaging part in the state which the 0th grating | lattice rotated around the 2nd axis | shaft from the parallel state with respect to the 1st grating | lattice. 第０格子が第１格子に対して平行状態から第３軸回りに回動した状態におけるＸ線撮像部の説明図である。It is explanatory drawing of the X-ray imaging part in the state which the 0th grating | lattice rotated to the periphery of the 3rd axis | shaft from the parallel state with respect to the 1st grating | lattice.
　以下、本発明にかかる実施の一形態を図面に基づいて説明する。なお、各図において同一の符号を付した構成は、同一の構成であることを示し、適宜、その説明を省略する。本明細書において、総称する場合には添え字を省略した参照符号で示し、個別の構成を指す場合には添え字を付した参照符号で示す。 Hereinafter, an embodiment according to the present invention will be described with reference to the drawings. In addition, the structure which attached | subjected the same code | symbol in each figure shows that it is the same structure, The description is abbreviate | omitted suitably. In this specification, when referring generically, it shows with the reference symbol which abbreviate | omitted the suffix, and when referring to an individual structure, it shows with the reference symbol which attached the suffix.
　図１は、実施形態におけるタルボ・ロー干渉計の斜視図である。図２は、図１のタルボ・ロー干渉計の構成を示すブロック図である。図３は、図１のタルボ・ロー干渉計の要部の概略図である。図４は、図１のタルボ・ロー干渉計に用いられる、Ｘ線源と、第０格子、第１格子および第２格子の位置関係を示す概略図である。図５は、図１に示すタルボ・ロー干渉計の要部拡大図である。図５Ａは、側面図であり、図５Ｂは、上面図である。図６は、保持枠に保持された状態の第０格子の拡大した底面図である。図７は、第０格子が有する第０格子本体の拡大斜視図である。図８は、保持枠に保持された状態の第０格子と、収納部材に収納された状態の第１格子および第２格子との斜視図である。なお、第１方向をＺ１－Ｚ２方向とし、第１方向と直交する第２方向をＸ１－Ｘ２方向とし、第１方向および第２方向に直交する第３方向をＹ１－Ｙ２方向として説明する。 FIG. 1 is a perspective view of a Talbot-Lau interferometer in the embodiment. FIG. 2 is a block diagram showing the configuration of the Talbot-Lau interferometer of FIG. FIG. 3 is a schematic view of the main part of the Talbot-Lau interferometer of FIG. FIG. 4 is a schematic diagram showing the positional relationship between the X-ray source and the zeroth, first, and second gratings used in the Talbot-Lau interferometer of FIG. FIG. 5 is an enlarged view of a main part of the Talbot-Lau interferometer shown in FIG. FIG. 5A is a side view and FIG. 5B is a top view. FIG. 6 is an enlarged bottom view of the zeroth lattice held by the holding frame. FIG. 7 is an enlarged perspective view of the 0th lattice body included in the 0th lattice. FIG. 8 is a perspective view of the zeroth grid held in the holding frame and the first and second grids stored in the storage member. In the following description, the first direction is the Z1-Z2 direction, the second direction orthogonal to the first direction is the X1-X2 direction, and the third direction orthogonal to the first direction and the second direction is the Y1-Y2 direction.
　この実施形態におけるタルボ・ロー干渉計１は、図１ないし図４に示すように干渉計本体１０と、干渉計本体１０に保持された第０格子（Ｇ０格子）２、第１格子（Ｇ１格子）３および第２格子（Ｇ２格子）４と、第０格子２に振動を付与する振動付与部材５（図５、図６に図示）と、第１格子３および第２格子４を収納した収納部材６とを備えている。 As shown in FIGS. 1 to 4, the Talbot-Lau interferometer 1 in this embodiment includes an interferometer body 10, a 0th grating (G0 grating) 2 and a first grating (G1 grating) held by the interferometer body 10. ) 3 and the second lattice (G2 lattice) 4, a vibration applying member 5 (shown in FIGS. 5 and 6) for applying vibration to the 0th lattice 2, and a storage housing the first lattice 3 and the second lattice 4. And a member 6.
　干渉計本体１０は、支柱部１１と、Ｘ線源１２と、Ｘ線撮像部（撮像部）１３と、Ｘ線源１２に電源を供給するＸ線電源部１４と、Ｘ線撮像部１３の撮像動作を制御するカメラ制御部１５と、干渉計本体１０の全体動作を制御する処理部１６と、Ｘ線電源部１４の給電動作を制御することによってＸ線源１２におけるＸ線の放射動作を制御するＸ線制御部１７とを備えている。 The interferometer main body 10 includes a support column 11, an X-ray source 12, an X-ray imaging unit (imaging unit) 13, an X-ray power supply unit 14 that supplies power to the X-ray source 12, and an X-ray imaging unit 13. The X-ray radiation operation in the X-ray source 12 is controlled by controlling the power supply operation of the camera control unit 15 that controls the imaging operation, the processing unit 16 that controls the entire operation of the interferometer body 10, and the X-ray power supply unit 14. And an X-ray control unit 17 to be controlled.
　支柱部１１は、図３に示すように、Ｚ１－Ｚ２方向（第１方向）に延された支柱部本体１１０と、支柱部本体１１０のＺ１側からＺ２側に順に配置されたＸ線源保持片１１１、第０格子保持部１１２、第０格子受け部１１３、撮影用載置台１１４および撮像部保持部１１５とを備えている。 As shown in FIG. 3, the support column 11 includes a support column main body 110 extending in the Z1-Z2 direction (first direction), and an X-ray source holding unit disposed in order from the Z1 side to the Z2 side of the support column main unit 110. It includes a piece 111, a 0th grid holding unit 112, a 0th grid receiving unit 113, an imaging stage 114 and an imaging unit holding unit 115.
　Ｘ線源保持片１１１は、支柱部本体１１０からＸ１側に突設されており、その突出先端部にＸ線源１２を保持している。 The X-ray source holding piece 111 protrudes from the support column main body 110 to the X1 side, and holds the X-ray source 12 at the protruding tip.
　第０格子受け部１１３は、図３および図５に示すように板状の部材で、第０格子２をＺ２側から受け得るようになっている。なお、第０格子受け部１１３は、Ｘ線の進行を妨げないように形成されている。 The 0th lattice receiving portion 113 is a plate-like member as shown in FIGS. 3 and 5, and can receive the 0th lattice 2 from the Z2 side. Note that the 0th lattice receiving portion 113 is formed so as not to hinder the progress of X-rays.
　撮影用載置台１１４は、図３に示すように板状の部材で、支柱部本体１１０からＸ１側に突設されており、その上面に、被写体Ｓが載置される。被写体Ｓが載置される撮影用載置台１１４の被写体載置部は、Ｘ線の進行を妨げないようになっている。 The imaging stage 114 is a plate-like member as shown in FIG. 3 and protrudes from the support column main body 110 to the X1 side, and the subject S is placed on the upper surface thereof. The subject placement portion of the imaging placement base 114 on which the subject S is placed is configured not to prevent the progress of X-rays.
　撮像部保持部１１５は、板状の部材で、支柱部本体１１０からＸ１側に突設されており、Ｘ線撮像部１３を保持している。なお、第０格子保持部１１２については、後述する。 The imaging unit holding unit 115 is a plate-like member and protrudes from the support column main body 110 to the X1 side, and holds the X-ray imaging unit 13. The 0th lattice holding unit 112 will be described later.
　Ｘ線撮像部１３は、図９に示すように第２格子３によって回折されたＸ線の像を撮像する撮像部本体１３０と、後述の第１干渉パターン２２１と第２干渉パターン６１３との干渉を検出する検出部１３１を備えている。 As shown in FIG. 9, the X-ray imaging unit 13 includes an imaging unit main body 130 that captures an X-ray image diffracted by the second grating 3, and interference between a first interference pattern 221 and a second interference pattern 613 described later. The detection part 131 which detects this is provided.
　撮像部本体１３０は、例えば、Ｘ線のエネルギーを吸収して蛍光を発するシンチレータを含む薄膜層が受光面上に形成された二次元イメージセンサを備えるフラットパネルディテクタ（ＦＰＤ）や、入射フォトンを光電面で電子に変換し、この電子をマイクロチャネルプレートで倍増し、この倍増された電子群を蛍光体に衝突させて発光させるイメージインテンシファイア部と、イメージインテンシファイア部の出力光を撮像する二次元イメージセンサとを備えるイメージインテンシファイアカメラなどである。 The imaging unit main body 130 is, for example, a flat panel detector (FPD) including a two-dimensional image sensor in which a thin film layer including a scintillator that absorbs X-ray energy and emits fluorescence is formed on a light receiving surface, or incident photons are photoelectrically detected. The image is converted into electrons on the surface, the electrons are doubled by the microchannel plate, and the image intensifier unit that emits light by colliding the doubled electron group with the phosphor, and the output light of the image intensifier unit are imaged An image intensifier camera equipped with a two-dimensional image sensor.
　検出部１３１は、撮像部本体１３０の外周の略全周に形成されている。この検出部１３１が第１干渉パターン２１１を通過したＸ線と第２干渉パターン６１３を通過したＸ線との干渉によって生じた干渉模様を検出し、撮像部本体１３０は、その干渉結果に基いて第２格子３によって回折されたＸ線の像を撮像するようになっている。 The detection unit 131 is formed on substantially the entire circumference of the imaging unit main body 130. The detection unit 131 detects an interference pattern generated by the interference between the X-rays that have passed through the first interference pattern 211 and the X-rays that have passed through the second interference pattern 613, and the imaging unit main body 130 is based on the interference result. An X-ray image diffracted by the second grating 3 is picked up.
　処理部１６は、タルボ・ロー干渉計１の各部を当該各部の機能に応じて制御することによってタルボ・ロー干渉計１全体の動作を制御する装置であり、例えば、マイクロプロセッサおよびその周辺回路を備えて構成され、図２に示すように、機能的に、画像処理部１６１およびシステム制御部１６２を備えている。 The processing unit 16 is a device that controls the overall operation of the Talbot-Lau interferometer 1 by controlling each unit of the Talbot-Lau interferometer 1 according to the function of each unit. As shown in FIG. 2, the image processing unit 161 and the system control unit 162 are functionally provided.
　システム制御部１６２は、Ｘ線制御部１７との間で制御信号を送受信することによってＸ線電源部１４を介してＸ線源１２におけるＸ線の放射動作を制御すると共に、カメラ制御部１５との間で制御信号を送受信することによってＸ線撮像部１３の撮像動作を制御する。システム制御部１６２の制御によって、Ｘ線が被写体Ｓに向けて照射され、これによって生じた像がＸ線撮像部１３によって撮像され、画像信号がカメラ制御部１５を介して処理部１６に入力される。 The system control unit 162 controls the X-ray emission operation in the X-ray source 12 via the X-ray power source unit 14 by transmitting and receiving control signals to and from the X-ray control unit 17, and the camera control unit 15 The imaging operation of the X-ray imaging unit 13 is controlled by transmitting and receiving control signals between the X-ray imaging unit 13 and the X-ray imaging unit 13. Under the control of the system control unit 162, X-rays are emitted toward the subject S, an image generated thereby is captured by the X-ray imaging unit 13, and an image signal is input to the processing unit 16 via the camera control unit 15. The
　システム制御部１６２は、後述の振動付与部材５の第１圧電素子５１を作動させる第１給電信号、後述の振動付与部材５の第２圧電素子５２を作動させる第２給電信号および後述の振動付与部材５の第３圧電素子５３を作動させる第３給電信号を、第１圧電素子５１、第２圧電素子５２および第３圧電素子５３のそれぞれに出力する。 The system control unit 162 includes a first power supply signal for operating a first piezoelectric element 51 of a vibration applying member 5 described later, a second power supply signal for operating a second piezoelectric element 52 of a vibration applying member 5 described later, and a vibration applying described later. A third power supply signal that operates the third piezoelectric element 53 of the member 5 is output to each of the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53.
　画像処理部１６１は、Ｘ線撮像部１３によって生成された画像信号を処理し、被写体Ｓの画像を生成する。 The image processing unit 161 processes the image signal generated by the X-ray imaging unit 13 and generates an image of the subject S.
　次に、第０格子２について説明する。第０格子２は、図６に示すように第０格子本体２１と、第０格子本体２１を保持した第０格子保持枠２２とを備えている。 Next, the 0th lattice 2 will be described. As shown in FIG. 6, the 0th grid 2 includes a 0th grid body 21 and a 0th grid holding frame 22 that holds the 0th grid body 21.
　第０格子本体２１は、図７に示すように、例えばシリコンウェハ等のシリコン素材に、Ｚ１－Ｚ２方向に所定の厚さ（深さ）Ｈを有してＹ１－Ｙ２方向に線状に延びるように形成された複数のＸ線透過部２１２と、前記所定の厚さＨを有して前記Ｙ１－Ｙ２方向に線状に延び金属が埋設されることによって形成された複数のＸ線吸収部２１１とを備え、これら複数のＸ線吸収部２１１と複数のＸ線透過部２１２とは、交互に平行に配設されている。このため、複数のＸ線吸収部２１１は、前記Ｙ１－Ｙ２方向と直交するＸ１－Ｘ２方向に所定の間隔を空けてそれぞれ配設されている。この間隔（ピッチ）Ｐは、本実施形態では、一定とされている。すなわち、複数のＸ線吸収部２１１は、前記Ｘ１－Ｘ２方向に等間隔Ｐでそれぞれ配設されている。本実施形態では、Ｘ線吸収部２１１は、板状または層状であり、複数のＸ線透過部２１２は、互いに隣接するＸ線吸収部２１１に挟まれた板状または層状の空間である。 As shown in FIG. 7, the zeroth lattice main body 21 has a predetermined thickness (depth) H in the Z1-Z2 direction and extends linearly in the Y1-Y2 direction on a silicon material such as a silicon wafer. A plurality of X-ray transmission parts 212 having the predetermined thickness H and extending in a line in the Y1-Y2 direction and embedded with metal. 211, and the plurality of X-ray absorption units 211 and the plurality of X-ray transmission units 212 are alternately arranged in parallel. For this reason, the plurality of X-ray absorbers 211 are respectively arranged at predetermined intervals in the X1-X2 direction orthogonal to the Y1-Y2 direction. This interval (pitch) P is constant in this embodiment. That is, the plurality of X-ray absorbers 211 are arranged at equal intervals P in the X1-X2 direction. In the present embodiment, the X-ray absorption unit 211 is plate-shaped or layered, and the plurality of X-ray transmission units 212 are plate-shaped or layered spaces sandwiched between the X-ray absorption units 211 adjacent to each other.
　これら複数のＸ線吸収部２１１は、Ｘ線を吸収するように機能し、これらＸ線透過部２１２は、Ｘ線を透過するように機能する。Ｘ線吸収部２１１は、例えば仕様に応じて充分にＸ線を吸収することができるように、適宜な厚さＨとされている。Ｘ線は、一般的に透過性が高いので、この結果、Ｘ線吸収部２１１における幅Ｗに対する厚さＨの比（アスペクト比＝厚さ／幅）は、例えば、５以上の高アスペクト比とされている。Ｘ線吸収部２１１における幅Ｗは、前記第３方向におけるＸ線吸収部２１１における長さであり、その厚さＨは、第１方向におけるＸ線吸収部２１１の長さである。 The plurality of X-ray absorption units 211 function to absorb X-rays, and the X-ray transmission units 212 function to transmit X-rays. The X-ray absorption part 211 has an appropriate thickness H so that, for example, X-rays can be sufficiently absorbed according to specifications. Since X-rays are generally highly transmissive, the ratio of the thickness H to the width W (aspect ratio = thickness / width) in the X-ray absorber 211 is, for example, a high aspect ratio of 5 or more. Has been. The width W in the X-ray absorber 211 is the length in the X-ray absorber 211 in the third direction, and the thickness H is the length of the X-ray absorber 211 in the first direction.
　第０格子保持枠２２は、図６に示すように、この実施形態では、第０格子本体２１の外周の全周に配置された四角筒状を呈するものからなり、第１干渉パターン２２１を備えている。第１干渉パターン２２１は、Ｘ１－Ｘ２方向およびＹ１－Ｙ２方向のそれぞれに沿って等間隔に配列された複数個のスリットを備えている。各スリットは、Ｚ１－Ｚ２方向に沿う厚さ方向に所定の深さで金属が埋設されて形成されている。 As shown in FIG. 6, the 0th grid holding frame 22 is formed of a rectangular tube shape arranged on the entire outer periphery of the 0th grid body 21 in this embodiment, and includes a first interference pattern 221. ing. The first interference pattern 221 includes a plurality of slits arranged at equal intervals along each of the X1-X2 direction and the Y1-Y2 direction. Each slit is formed by embedding metal at a predetermined depth in the thickness direction along the Z1-Z2 direction.
　このように形成された第０格子２は、図５に示すように支柱部１１の第０格子保持部１１２に、Ｚ１－Ｚ２方向に移動可能、且つ、Ｘ１－Ｘ２方向（第２方向）に延びるＸ軸（第２軸）２ａ回り、およびＹ１－Ｙ２方向（第３方向）に延びるＹ軸（第３軸）２ｂ回りにそれぞれ回動可能に保持されている。 As shown in FIG. 5, the 0th lattice 2 formed in this way is movable in the Z1-Z2 direction to the 0th lattice holding portion 112 of the support column 11, and in the X1-X2 direction (second direction). It is rotatably held around an extending X axis (second axis) 2a and around a Y axis (third axis) 2b extending in the Y1-Y2 direction (third direction).
　より詳しくは、第０格子保持部１１２は、円柱状の連結軸１１２ａと、略コの字状の保持枠１１２ｂとを備えている。連結軸１１２ａは、一端が支柱部本体１１０に連結され、他端が支柱部本体１１０からＸ１側に延されている。 More specifically, the 0th lattice holding part 112 includes a columnar connecting shaft 112a and a substantially U-shaped holding frame 112b. One end of the connecting shaft 112a is connected to the column main body 110, and the other end extends from the column main body 110 to the X1 side.
　保持枠１１２ｂは、互いに対向するように形成された回動軸１１２ｃを備えている。そして、この保持枠１１２ｂは、連結軸１１２ａに、Ｚ１－Ｚ２方向に移動可能に、且つ連結軸１１２ａ回りに回動自在に連結されている。 The holding frame 112b includes a rotating shaft 112c formed to face each other. The holding frame 112b is connected to the connecting shaft 112a so as to be movable in the Z1-Z2 direction and rotatable about the connecting shaft 112a.
　第０格子２は、保持枠１１２ｂの回動軸１１２ｃに回動自在に嵌挿され、これにより、第０格子２は、Ｚ１－Ｚ２方向に移動可能、且つ、Ｘ軸（第２軸）２ａ回りおよびＹ軸（第３軸）２ｂ回りにそれぞれ回動可能に、第０格子保持部１１２に保持されている。 The 0th lattice 2 is rotatably inserted into the rotation shaft 112c of the holding frame 112b, whereby the 0th lattice 2 is movable in the Z1-Z2 direction and the X axis (second axis) 2a. Around the Y-axis (third axis) 2b, it is held by the 0th grid holding part 112 so as to be rotatable.
　次に、振動付与部材５について説明する。振動付与部材５は、この実施形態では、第１圧電素子５１、第２圧電素子５２および第３圧電素子５３とを備えている。 Next, the vibration imparting member 5 will be described. In this embodiment, the vibration applying member 5 includes a first piezoelectric element 51, a second piezoelectric element 52, and a third piezoelectric element 53.
　これらの第１圧電素子５１、第２圧電素子５２および第３圧電素子５３は、略同じ構成の素子で、各圧電素子５１～５３は、入力の電気エネルギーを、伸縮する機械エネルギー、すなわち、機械的な運動に変換する素子であり、例えば、入力の電気エネルギーを圧電効果によって機械的な伸縮運動に変換する。このような圧電素子５１～５３は、例えば積層体と、一対の外部電極とを備える。 The first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 have substantially the same configuration, and each of the piezoelectric elements 51 to 53 has mechanical energy that expands and contracts input electrical energy, that is, mechanical For example, the electric energy of the input is converted into a mechanical expansion / contraction motion by the piezoelectric effect. Such piezoelectric elements 51 to 53 include, for example, a laminate and a pair of external electrodes.
　積層体は、圧電材料から成る薄膜状（層状）の圧電層と導電性を有する薄膜状（層状）の内部電極層とを交互に複数積層されたものである。複数の内部電極層は、その一部が互いに対向する一対の外周側面で外部に臨むようにそれぞれ構成されている。一対の外部電極は、積層体における前記一対の外周側面上に積層方向に沿って形成され、前記電気エネルギーを積層体に供給し、前記複数の内部電極と順次交互に接続されている。なお、圧電材料は、例えば、チタン酸ジルコン酸鉛（ＰＺＴ）、水晶、ニオブ酸リチウム（ＬｉＮｂＯ３）、ニオブ酸タンタル酸カリウム（Ｋ（Ｔａ，Ｎｂ）Ｏ３）、チタン酸バリウム（ＢａＴｉＯ３）、タンタル酸リチウム（ＬｉＴａＯ３）およびチタン酸ストロンチウム（ＳｒＴｉＯ３）等の無機圧電材料である。 The laminated body is formed by alternately laminating a plurality of thin film (layered) piezoelectric layers made of a piezoelectric material and a thin film (layered) internal electrode layer having conductivity. Each of the plurality of internal electrode layers is configured to face the outside with a pair of outer peripheral side surfaces facing each other. The pair of external electrodes are formed along the stacking direction on the pair of outer peripheral side surfaces of the stacked body, supply the electric energy to the stacked body, and are sequentially connected to the plurality of internal electrodes in turn. Examples of the piezoelectric material include lead zirconate titanate (PZT), crystal, lithium niobate (LiNbO 3 ), potassium tantalate niobate (K (Ta, Nb) O 3 ), and barium titanate (BaTiO 3 ). Inorganic piezoelectric materials such as lithium tantalate (LiTaO 3 ) and strontium titanate (SrTiO 3 ).
　第１圧電素子５１は、積層方向（第１圧電素子５１の軸方向）の伸縮によって第０格子２をＸ軸２ａ回りに振動させるための素子で、第０格子２の第０格子保持枠２２と支柱部１１の第０格子受け部１１３との間における第０格子保持枠２２のＸ１側且つＹ１側の端部に、第０格子保持枠２２と第０格子受け部１１３とのそれぞれに当接するように配置されている。そして、この実施形態では、第１圧電素子５１は、第１給電信号を受信すると作動するようになっている。 The first piezoelectric element 51 is an element for vibrating the zeroth lattice 2 around the X axis 2a by expansion and contraction in the stacking direction (the axial direction of the first piezoelectric element 51), and the zeroth lattice holding frame 22 of the zeroth lattice 2. On the X1 side and the Y1 side end of the 0th lattice holding frame 22 between the 0th lattice receiving portion 113 and the 0th lattice receiving portion 113 of the support column 11, respectively. It is arranged to touch. In this embodiment, the first piezoelectric element 51 is activated when it receives the first power supply signal.
　第２圧電素子５２は、積層方向（第２圧電素子５２の軸方向）の伸縮によって第０格子２をＹ軸２ｂ回りに振動させるための素子で、第０格子２の第０格子保持枠２２と支柱部１１の第０格子受け部１１３との間における第０格子保持枠２２のＸ１側且つＹ２側の端部に、第０格子保持枠２２と第０格子受け部１１３とのそれぞれに当接するように配置されている。そして、この実施形態では、第２圧電素子５２は、第２給電信号を受信すると作動するようになっている。 The second piezoelectric element 52 is an element for vibrating the zeroth lattice 2 around the Y axis 2b by expansion and contraction in the stacking direction (the axial direction of the second piezoelectric element 52), and the zeroth lattice holding frame 22 of the zeroth lattice 2. On the X1 side and the Y2 side end of the 0th lattice holding frame 22 between the 0th lattice receiving portion 113 and the 0th lattice receiving portion 113 of the support column 11, respectively. It is arranged to touch. In this embodiment, the second piezoelectric element 52 is activated when receiving the second power feeding signal.
　第３圧電素子５３は、積層方向（第３圧電素子５３の軸方向）の伸縮によって第０格子２をＺ１－Ｚ２方向に振動させるための素子で、この実施形態では、２個からなる。そして、第３圧電素子５３は、第０格子２の第０格子保持枠２２と支柱部１１の第０格子受け部１１３との間における第０格子保持枠２２のＹ１側且つＸ１－Ｘ２方向の中央部と、上記間における第０格子保持枠２２のＹ２側且つＸ１－Ｘ２方向の中央部とにそれぞれ、第０格子保持枠２２と第０格子受け部１１３とのそれぞれに当接するように配置されている。そして、この実施形態では、第３圧電素子５３は、第３給電信号を受信すると作動するようになっている。なお、振動付与部材５は、圧電材料を用いた圧電方式のアクチュエータの形態のものに限らず、適宜変更でき、例えば静電方式のアクチュエータの形態のものでもよく、適宜変更できる。 The third piezoelectric element 53 is an element for vibrating the zeroth lattice 2 in the Z1-Z2 direction by expansion and contraction in the stacking direction (the axial direction of the third piezoelectric element 53). In this embodiment, the third piezoelectric element 53 includes two elements. The third piezoelectric element 53 is arranged between the 0th lattice holding frame 22 of the 0th lattice 2 and the 0th lattice receiving portion 113 of the support column 11 in the Y1 side of the 0th lattice holding frame 22 and in the X1-X2 direction. Arranged so as to abut each of the 0th grid holding frame 22 and the 0th grid receiving part 113 at the center and the Y2 side of the 0th grid holding frame 22 and the center in the X1-X2 direction between the above. Has been. In this embodiment, the third piezoelectric element 53 operates when receiving the third power feeding signal. The vibration imparting member 5 is not limited to a piezoelectric actuator using a piezoelectric material, and can be changed as appropriate. For example, an electrostatic actuator can be used, and can be changed as appropriate.
　このように配置された振動付与部材５は、図１に示すように第０格子２と共に、上部カバー１７ａで覆われている。 The vibration applying member 5 arranged in this way is covered with the upper cover 17a together with the 0th lattice 2 as shown in FIG.
　次に、第１格子３について説明する。第１格子３は、Ｘ線源１２から放射されたＸ線によってタルボ効果を生じる回折格子である。第１格子３は、図示しないが、第０格子本体２１と同様に、Ｚ１－Ｚ２方向に所定の厚さ（深さ）を有してＹ１－Ｙ２方向に線状に延び交互に平行に配設される複数のＸ線吸収部と複数のＸ線透過部とを備えている。この第１格子３は、タルボ効果を生じる条件を満たすように構成されており、Ｘ線源１２から放射されたＸ線の波長よりも充分に粗い格子、例えば、格子定数（回折格子の周期）がＸ線の波長の約２０以上である位相型回折格子である。なお、第１格子３は、振幅型回折格子であってもよい。 Next, the first lattice 3 will be described. The first grating 3 is a diffraction grating that generates a Talbot effect by X-rays emitted from the X-ray source 12. Although not shown, the first grating 3 has a predetermined thickness (depth) in the Z1-Z2 direction, extends linearly in the Y1-Y2 direction, and is alternately arranged in parallel, like the zeroth grating body 21. A plurality of X-ray absorbing portions and a plurality of X-ray transmitting portions are provided. The first grating 3 is configured so as to satisfy the conditions for causing the Talbot effect, and is a grating sufficiently coarser than the wavelength of X-rays emitted from the X-ray source 12, for example, a grating constant (period of diffraction grating). Is a phase type diffraction grating having an X-ray wavelength of about 20 or more. The first grating 3 may be an amplitude type diffraction grating.
　この第１格子３は、振動を受けない設定温度のもとで、図４に示すように第０格子２とＸ線の波長の整数倍の距離（第１距離）Ｌ４を隔てて平行に配置される。 As shown in FIG. 4, the first grating 3 is arranged in parallel with a distance (first distance) L4 that is an integral multiple of the wavelength of the X-ray, as shown in FIG. Is done.
　次に、第２格子４について説明する。第２格子４は、第１格子３から略タルボ距離Ｌ２離れた位置に配置され、第１格子３によって回折されたＸ線を回折する透過型の振幅型回折格子である。この第２格子４も、第１格子３と同様に、図示しないが、Ｚ１－Ｚ２方向に所定の厚さ（深さ）を有してＸ１－Ｘ２方向に線状に延び交互に平行に配設される複数のＸ線吸収部と複数のＸ線透過部とを備えている。 Next, the second lattice 4 will be described. The second grating 4 is a transmission-type amplitude diffraction grating that is disposed at a position that is approximately the Talbot distance L2 away from the first grating 3 and that diffracts the X-rays diffracted by the first grating 3. Like the first grating 3, the second grating 4 also has a predetermined thickness (depth) in the Z1-Z2 direction, extends linearly in the X1-X2 direction, and is alternately arranged in parallel. A plurality of X-ray absorbing portions and a plurality of X-ray transmitting portions are provided.
　この第２格子４は、位相型回折格子である第１格子３と次の式１および式２を満たすように配置されている。
ｌ＝λ／（ａ／（Ｌ１＋Ｌ２＋Ｌ３））　　　・・・（式１）
Ｚ１＝（ｍ＋１／２）×（ｄ２／λ）　　　・・・（式２）
ここで、ｌは、可干渉距離であり、λは、Ｘ線の波長（通常は中心波長）であり、ａは、回折格子の回折部材にほぼ直交する方向におけるＸ線源１２の開口径であり、Ｌ１は、Ｘ線源１２から第１回折格子３までの距離であり、Ｌ２は、第１回折格子３から第２回折格子４までの距離（第２距離）であり、Ｌ３は、第２回折格子１０３からＸ線撮像部１３までの距離であり、ｍは、整数であり、ｄは、回折部材の周期（回折格子の周期、格子定数、隣接する回折部材の中心間距離、前記ピッチＰ）である。 The second grating 4 is arranged so as to satisfy the first grating 3 that is a phase type diffraction grating and the following expressions 1 and 2.
l = λ / (a / (L1 + L2 + L3)) (Formula 1)
Z1 = (m + 1/2) × (d2 / λ) (Formula 2)
Here, l is the coherence distance, λ is the wavelength of X-rays (usually the center wavelength), and a is the aperture diameter of the X-ray source 12 in a direction substantially perpendicular to the diffraction member of the diffraction grating. Yes, L1 is the distance from the X-ray source 12 to the first diffraction grating 3, L2 is the distance (second distance) from the first diffraction grating 3 to the second diffraction grating 4, and L3 is the first 2 is the distance from the diffraction grating 103 to the X-ray imaging unit 13, m is an integer, d is the period of the diffraction member (period of the diffraction grating, grating constant, distance between the centers of adjacent diffraction members, the pitch P).
　次に、収納部材６について説明する。収納部材６は、図４に示すように枠部６１と、温度センサ６２と、温度調整部材６３とを備えている。 Next, the storage member 6 will be described. As illustrated in FIG. 4, the storage member 6 includes a frame portion 61, a temperature sensor 62, and a temperature adjustment member 63.
　枠部６１は、側部６１１と、周縁部６１２とを備え、これらによって内部を密封状態にしている。側部６１１は、Ｘ線を透過可能な材料、例えばガラスから構成されている。 The frame portion 61 includes a side portion 611 and a peripheral edge portion 612, and the inside is sealed by these. The side portion 611 is made of a material that can transmit X-rays, for example, glass.
　周縁部６１２は、図８に示すように、第０格子２の第１干渉パターン２２１と干渉させるための第２干渉パターン６１３を備えている。第２干渉パターン６１３は、第１干渉パターン２２１と対応するように、Ｘ１－Ｘ２方向およびＹ１－Ｙ２方向それぞれに沿って等間隔に配列された複数個のスリットからなる。各スリットは、Ｚ１－Ｚ２方向に沿う厚さ方向に所定の深さで金属が埋設されて形成されている。 The peripheral edge 612 includes a second interference pattern 613 for causing interference with the first interference pattern 221 of the 0th grating 2 as shown in FIG. The second interference pattern 613 includes a plurality of slits arranged at equal intervals along the X1-X2 direction and the Y1-Y2 direction so as to correspond to the first interference pattern 221. Each slit is formed by embedding metal at a predetermined depth in the thickness direction along the Z1-Z2 direction.
　そして、枠部６１の内部に、第１格子３と第２格子４とが、互いに所定距離を隔てて平行状態で固定的に配置されて封入されている。枠部６１内に封入された第１格子３と第２格子４とは、図３に示すように撮影用載置台１１４のＺ２側に、上記（式１）および式（２）を満たすように配置されている。このように配置された第１格子３と第２格子は、図１に示すように下部カバー１７ｂで覆われている。 The first lattice 3 and the second lattice 4 are fixedly arranged in a parallel state at a predetermined distance from each other and enclosed in the frame portion 61. As shown in FIG. 3, the first lattice 3 and the second lattice 4 enclosed in the frame portion 61 satisfy the above (Formula 1) and Formula (2) on the Z2 side of the imaging stage 114. Has been placed. The first grid 3 and the second grid arranged in this way are covered with a lower cover 17b as shown in FIG.
　温度センサ６２は、収納部材６の内部の温度を検出するもので、この実施形態では、図４に示すように枠部６１の内面に取り付けられている。 The temperature sensor 62 detects the temperature inside the storage member 6, and in this embodiment, is attached to the inner surface of the frame portion 61 as shown in FIG.
　温度調整部材６３は、収納部材６の内部の温度を調整する素子で、例えばペルチェ素子を備えて構成される。温度調整部材６３は、枠部６１の内面に取り付けられており、温度センサ６２の検出温度に基づき、収納部材６の内部の温度を上げまたは下げることで、設定温度範囲に調整する。 The temperature adjustment member 63 is an element that adjusts the temperature inside the storage member 6, and includes, for example, a Peltier element. The temperature adjustment member 63 is attached to the inner surface of the frame portion 61, and adjusts to the set temperature range by raising or lowering the temperature inside the storage member 6 based on the temperature detected by the temperature sensor 62.
　次に、本実施形態のタルボ・ロー干渉計の動作について説明する。図９は、第０格子と第１格子とが第１距離を隔てて平行になった状態におけるＸ線撮像部の説明図である。図１０は、第０格子が第１格子に対して平行状態から第２軸回りに回動した状態におけるＸ線撮像部の説明図である。図１１は、第０格子が第１格子に対して平行状態から第３軸回りに回動した状態におけるＸ線撮像部の説明図である。 Next, the operation of the Talbot-Lau interferometer of this embodiment will be described. FIG. 9 is an explanatory diagram of the X-ray imaging unit in a state where the 0th grating and the first grating are parallel to each other with a first distance. FIG. 10 is an explanatory diagram of the X-ray imaging unit in a state in which the 0th grating is rotated around the second axis from the parallel state with respect to the first grating. FIG. 11 is an explanatory diagram of the X-ray imaging unit in a state in which the 0th grating is rotated around the third axis from the parallel state with respect to the first grating.
　被写体Ｓが撮影用載置台１１４に載置されることによって、被写体Ｓが第０格子２と第１格子３との間に配置される。 The subject S is placed between the 0th grid 2 and the first grid 3 by placing the subject S on the imaging stage 114.
　この状態で、タルボ・ロー干渉計１のユーザ（オペレータ）によって図略の操作部から被写体Ｓの撮像が指示されると、処理部１６のシステム制御部１６２は、被写体Ｓに向けてＸ線を照射すべくＸ線制御部１７に制御信号を出力する。この制御信号によってＸ線制御部１７は、Ｘ線電源部１４にＸ線源１２へ給電させ、Ｘ線源１２は、Ｘ線を放射して被写体Ｓに向けてＸ線を照射する。 In this state, when the user (operator) of the Talbot-Lau interferometer 1 instructs the subject S to capture an image from the operation unit (not shown), the system control unit 162 of the processing unit 16 emits X-rays toward the subject S. A control signal is output to the X-ray controller 17 for irradiation. With this control signal, the X-ray control unit 17 causes the X-ray power supply unit 14 to supply power to the X-ray source 12, and the X-ray source 12 emits X-rays and irradiates the subject S with X-rays.
　システム制御部１６２は、後述の振動付与部材５の第１圧電素子５１を作動させる第１給電信号、振動付与部材５の第２圧電素子５２を作動させる第２給電信号および振動付与部材５の第３圧電素子５３を作動させる第３給電信号を、第１圧電素子５１、第２圧電素子５２および第３圧電素子５３に重畳的に送信する。これにより、第１圧電素子５１、第２圧電素子５２および第３圧電素子５３が作動し、第０格子２は、Ｚ１－Ｚ２方向に振動し、また、Ｘ軸２ａ回りおよびＹ軸２ｂ回りに振動する。 The system control unit 162 includes a first power supply signal that operates a first piezoelectric element 51 of a vibration applying member 5 described later, a second power supply signal that operates a second piezoelectric element 52 of the vibration applying member 5, and a first power supply signal of the vibration applying member 5. A third power supply signal for operating the third piezoelectric element 53 is transmitted in a superimposed manner to the first piezoelectric element 51, the second piezoelectric element 52 and the third piezoelectric element 53. As a result, the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 operate, and the zeroth lattice 2 vibrates in the Z1-Z2 direction, and around the X axis 2a and the Y axis 2b. Vibrate.
　照射されたＸ線は、第０格子２および被写体Ｓを介して第１格子３を通過し、第１格子３によって回折され、タルボ距離だけ離れた位置に第１格子３の自己像であるタルボ像Ｔが形成される。 The irradiated X-rays pass through the first grating 3 through the zeroth grating 2 and the subject S, are diffracted by the first grating 3, and are talvo which is a self-image of the first grating 3 at a position separated by the Talbot distance. An image T is formed.
　この形成されたＸ線のタルボ像Ｔは、第２格子４によって回折され、モアレを生じてモアレ縞の像が形成される。 The formed X-ray Talbot image T is diffracted by the second grating 4 to generate moire and form a moire fringe image.
　その際、予め設定した第０格子２と第１格子３との距離がずれ、または第０格子２と第１格子３とが平行でなくなり、或いは、予め設定した第１格子３と第２格子４との距離がずれ、または第１格子３と第２格子４との平行でなくなると、Ｘ線撮像部１３によって撮像される像が不鮮明になってしまう。 At that time, the distance between the preset 0th lattice 2 and the first lattice 3 is shifted, or the 0th lattice 2 and the first lattice 3 are not parallel, or the preset first lattice 3 and the second lattice 3 If the distance from 4 is shifted, or the first grating 3 and the second grating 4 are not parallel, the image picked up by the X-ray imaging unit 13 becomes unclear.
　例えば、図１０に示すように第０格子２がＸ軸２ａ回りに回動して第１格子３に対して傾いて平行でなくなると、Ｘ線撮像部１３によって撮像される像１３ａが不鮮明になってしまう。また、例えば図１１に示すように第０格子２がＹ軸２ｂ回りに回動して第１格子３に対して傾いて平行でなくなると、Ｘ線撮像部１３によって撮像される像１３ａが不鮮明になってしまう。さらに、図示しないが、第０格子２がＺ１－Ｚ２方向に移動して第１格子３に対する距離がずれると、同様に、Ｘ線撮像部１３によって撮像される像１３ａが不鮮明になってしまう。 For example, as shown in FIG. 10, when the 0-th grating 2 rotates around the X axis 2 a and is inclined and not parallel to the first grating 3, the image 13 a captured by the X-ray imaging unit 13 becomes unclear. turn into. Further, for example, as shown in FIG. 11, when the 0th grating 2 rotates around the Y axis 2b and is not parallel to the first grating 3, the image 13a imaged by the X-ray imaging unit 13 is unclear. Become. Further, although not shown, when the 0-th grating 2 moves in the Z1-Z2 direction and the distance to the first grating 3 is shifted, the image 13a picked up by the X-ray imaging unit 13 is also unclear.
　このような互いに隣接する２つ格子２、３、４の互いの距離のずれまたは傾きは、例えばタルボ・ロー干渉計の全体が外部から振動や温度変化を受けると生じるおそれがある。 Such a shift or inclination of the distance between the two lattices 2, 3, 4 adjacent to each other may occur, for example, when the Talbot-Lau interferometer as a whole is subjected to vibrations or temperature changes from the outside.
　しかし、この実施形態では、第１圧電素子５１、第２圧電素子５２および第３圧電素子５３によって第０格子２が、Ｚ１－Ｚ２方向に振動し、また、Ｘ軸２ａ回りおよびＹ軸２ｂ回りに振動しているため、その振動中に、第０格子２が第１格子３に対して第１距離Ｌ４だけ隔てて平行となる位置にくる。また、第１圧電素子５１によりＸ軸２ａ回りに振動させる第０格子２の振動周波数と第２圧電素子５２によりＹ軸２ｂ回りに振動させる第０格子２の振動周波数とが互いに素、即ち互いに１以外の公約数を持たないようにすることで、ミソスリ運動（歳差運動）または櫓の運動を起こすことがなく、その振動中に、第０格子２が第１格子３に対して平行となるときがくる。 However, in this embodiment, the first piezoelectric element 51, the second piezoelectric element 52, and the third piezoelectric element 53 cause the zeroth lattice 2 to vibrate in the Z1-Z2 direction, and around the X axis 2a and the Y axis 2b. Therefore, during the vibration, the 0th grating 2 comes to a position parallel to the first grating 3 with a first distance L4. In addition, the vibration frequency of the 0th lattice 2 that vibrates around the X axis 2a by the first piezoelectric element 51 and the vibration frequency of the 0th lattice 2 that vibrates around the Y axis 2b by the second piezoelectric element 52 are mutually prime, that is, mutually By not having a common divisor other than 1, no miso motion (precession motion) or wrinkle motion occurs, and the 0th lattice 2 is parallel to the first lattice 3 during the vibration. The time will come.
　第１格子３と第２格子４とは、収納部材６に互いに固定状態で所定温度で封入されているため、第１格子３と第２格子４とは、外部から振動や温度変化を受けても、互いに第２距離を隔てて平行状態に維持される。したがって、第０格子２が第１格子３に対して第１距離だけ隔てて平行となった位置では、第１格子３と第２格子４とが互いに第２距離だけ隔てて平行となっている。 Since the first lattice 3 and the second lattice 4 are sealed in the storage member 6 at a predetermined temperature, the first lattice 3 and the second lattice 4 are subjected to vibration and temperature changes from the outside. Are maintained in a parallel state at a second distance from each other. Accordingly, at a position where the 0th grating 2 is parallel to the first grating 3 by a first distance, the first grating 3 and the second grating 4 are parallel to each other by a second distance. .
　第０格子２が、振動に際して第１格子３に対して設定距離だけ隔てて平行となった位置にくると、第０格子２の第１干渉パターン２２１と収納部材６の第２干渉パターン６１３との干渉模様が等間隔になる。本実施形態では、検出部１３１は、第１干渉パターン２１１を通過したＸ線と第２干渉パターン６１３を通過したＸ線との干渉によって生じた干渉模様を検出し、この検出結果を処理部１６のシステム制御部１６２へ出力し、システム制御部１６２は、この検出部１３１の検出結果の干渉模様が等間隔になると、カメラ制御部１５を介してＸ線撮像部１３へ、撮像を指示する制御信号を出力する。 When the 0th grating 2 comes to a position parallel to the first grating 3 by a set distance during vibration, the first interference pattern 221 of the 0th grating 2 and the second interference pattern 613 of the storage member 6 The interference pattern is equally spaced. In the present embodiment, the detection unit 131 detects an interference pattern caused by the interference between the X-rays that have passed through the first interference pattern 211 and the X-rays that have passed through the second interference pattern 613, and the detection result is used as the processing unit 16. Is output to the system control unit 162, and the system control unit 162 instructs the X-ray imaging unit 13 to instruct imaging via the camera control unit 15 when the interference pattern of the detection result of the detection unit 131 is equally spaced. Output a signal.
　この撮像を指示する制御信号により、Ｘ線撮像部１３は、その干渉模様が等間隔になったタイミングでモアレ縞の像１３ａを撮像する。よって、その際に、Ｘ線撮像部１３で検出される像１３ａは、図９に示すように鮮明な画像になっている。 The X-ray imaging unit 13 captures the moiré fringe image 13a at the timing when the interference pattern is equally spaced by the control signal instructing the imaging. Therefore, at that time, the image 13a detected by the X-ray imaging unit 13 is a clear image as shown in FIG.
　そして、Ｘ線撮像部１３は、モアレ縞の像の画像信号をカメラ制御部１５を介して処理部１６へ出力する。この画像信号は、処理部１６の画像処理部１６１によって処理される。 Then, the X-ray imaging unit 13 outputs the image signal of the moire fringe image to the processing unit 16 via the camera control unit 15. This image signal is processed by the image processing unit 161 of the processing unit 16.
　なお、上記実施形態では、第２干渉パターン６１３は、第１格子３と第２格子４とを収納した収納部材６に形成され、第１格子３が収納部材６を介して間接的に第２干渉パターン６１３を備えたものとされたが、この形態のものに限らず、適宜変更できる。例えば第１格子３と第２格子４との何れか一方または両方に、直接的に第２干渉パターン６１３が形成されることにより、第１格子３と第２格子４との何れか一方または両方に第２干渉パターン６１３を備えたものとしてもよい。 In the above embodiment, the second interference pattern 613 is formed on the storage member 6 that stores the first lattice 3 and the second lattice 4, and the first lattice 3 is indirectly second through the storage member 6. Although the interference pattern 613 is provided, the present invention is not limited to this configuration and can be changed as appropriate. For example, the second interference pattern 613 is directly formed on one or both of the first grating 3 and the second grating 4, so that either one or both of the first grating 3 and the second grating 4 is formed. The second interference pattern 613 may be provided.
　また、上記実施形態では、Ｘ線を用いたが、Ｘ線に代えて可視光を用いてもよく、適宜変更できる。 In the above embodiment, X-rays are used, but visible light may be used instead of X-rays, and can be changed as appropriate.
　本明細書は、上記のように様々な態様の技術を開示しているが、そのうち主な技術を以下に纏める。 This specification discloses various modes of technology as described above, and the main technologies are summarized below.
　一態様に係るタルボ・ロー干渉計は、Ｘ線を放射するＸ線源を有する干渉計本体と、前記Ｘ線源から順に第１方向に沿って配置され前記干渉計本体に保持された第０格子、第１格子および第２格子と、前記第０格子が振動に際して前記第１格子と所定の第１距離を隔てて平行になる位置にくるように前記第０格子に振動を付与する振動付与部材とを備え、前記第０格子は、前記第１方向に移動可能、且つ、前記第１方向に直交する第２方向に延びる第２軸回り、および、前記第１方向と第２方向とのそれぞれに直交する第３方向に延びる第３軸回りにそれぞれ回動可能に前記干渉計本体に保持され、前記第１格子と第２格子とは、互いに所定の第２距離を隔てて互いに平行になった状態で、互いに固定され、前記振動付与部材は、前記第０格子を前記第１方向に振動させ、且つ前記第２軸回りと前記第３軸回りとのそれぞれに振動させる。 A Talbot-Lau interferometer according to an aspect includes an interferometer body having an X-ray source that emits X-rays, and a zeroth array arranged in the first direction in order from the X-ray source and held by the interferometer body. Applying vibration to apply vibration to the zeroth lattice such that the lattice, the first lattice, the second lattice, and the zeroth lattice are in parallel with the first lattice with a predetermined first distance in vibration. The zeroth lattice is movable in the first direction and extends in a second direction perpendicular to the first direction, and the zeroth lattice is between the first direction and the second direction. The interferometer body is rotatably held around a third axis extending in a third direction orthogonal to each other, and the first grating and the second grating are parallel to each other with a predetermined second distance from each other. In this state, the vibration applying members are fixed to each other, By vibrating the child in the first direction, to and vibrate in each of said second axis and said third axis.
　このようなタルボ・ロー干渉計は、第１格子と第２格子とが、互いに第２距離を隔てて互いに平行になった状態で、互いに一体に固定されているため、振動や温度変化を受けても、第１格子と第２格子とは、互いに第２距離を隔てて互いに平行になった状態を維持できる。 In such a Talbot-Lau interferometer, the first grating and the second grating are fixed to each other in a state where they are parallel to each other at a second distance, and thus are subject to vibration and temperature change. However, the first grating and the second grating can maintain a state of being parallel to each other with a second distance.
　第０格子が振動や温度変化を受けて第０格子が第１格子との距離が変化し、或いは、平行状態がずれても、振動付与部材が、第０格子を、前記第１方向に移動させるように振動させ、且つ、第２軸回りと第３軸回りとのそれぞれに回動するように振動させることによって、その振動中に、第０格子が第１格子と第１距離を隔てて平行になった状態の位置にくるときがある。したがって、上記タルボ・ロー干渉計は、その位置で、被写体を撮像すれば被写体のより鮮明な画像を得ることができる。 The vibration applying member moves the 0th lattice in the first direction even if the 0th lattice is subjected to vibration or temperature change and the distance between the 0th lattice and the first lattice changes or the parallel state is shifted. And the zeroth grid is spaced apart from the first grid by the first distance during the vibration by vibrating so as to rotate around the second axis and around the third axis. Sometimes it comes to the position of the parallel state. Therefore, the Talbot-Lau interferometer can obtain a clearer image of the subject by imaging the subject at that position.
　他の一態様では、上述のタルボ・ロー干渉計において、前記第２軸回りに前記第０格子を振動させる振動周波数と前記第３軸回りに前記第０格子を振動させる振動周波数とは、互いに素である。 In another aspect, in the above-described Talbot-Lau interferometer, a vibration frequency for vibrating the zeroth lattice about the second axis and a vibration frequency for vibrating the zeroth lattice about the third axis are mutually It is prime.
　ミソスリ運動（歳差運動）または櫓の運動を起こすと第０格子が第１格子と平行にならない。そこで、上記構成のように、第２軸回りに回動させる振動周波数と第３軸回りに回動させる振動周波数とが互いに素、即ち互いに１以外の公約数を持たないようにすることで、上記タルボ・ロー干渉計は、ミソスリ運動（歳差運動）または櫓の運動を起こすことを防止できる。 と The zeroth lattice does not become parallel to the first lattice when a miso-motion (precession) or heel movement occurs. Therefore, as in the above configuration, the vibration frequency rotated about the second axis and the vibration frequency rotated about the third axis are not prime, that is, have no common divisor other than 1. The Talbot-Lau interferometer can prevent mismovement (precession movement) or wrinkle movement.
　他の一態様では、これら上述のタルボ・ロー干渉計において、前記第１格子と第２格子とは、収納部材の内部に温度調整可能に封入されている。 In another aspect, in the above-described Talbot-Lau interferometer, the first grating and the second grating are sealed inside the housing member so that the temperature can be adjusted.
　このようなタルボ・ロー干渉計は、第１格子と第２格子とが、収納部材の内部に温度調整可能に封入されているため、互いに第２距離を隔てて互いに平行になった状態に確実に維持される。第１格子と第２格子とが収納部材に収納されても、被写体は、第０格子と第１格子との間に配置されるため、撮像に支障をきたすようなことがない。 In such a Talbot-Lau interferometer, the first grating and the second grating are sealed in the housing member so that the temperature can be adjusted. Therefore, the Talbot-Lau interferometer is reliably in a state of being parallel to each other with a second distance. Maintained. Even if the first grid and the second grid are stored in the storage member, the subject is arranged between the 0th grid and the first grid, so that the imaging is not hindered.
　他の一態様では、これら上述のタルボ・ロー干渉計において、前記第１方向における、前記第２格子を挟んで前記第１格子と反対側に、撮像部を、更に備え、前記第０格子は、第１干渉パターンを備え、前記第１格子と第２格子との少なくとも一方は、前記第０格子が前記第１格子と前記第１距離を隔てて平行になると前記第１干渉パターンと干渉する第２干渉パターンを備え、前記撮像部は、撮像部本体と、前記干渉を検出する検出部を備え、前記撮像部本体は、前記検出部の検出結果に基いて、前記第１干渉パターンと干渉する第２干渉パターンとの干渉模様が等間隔になったタイミングで被写体を撮像する。 In another aspect, in the above-described Talbot-Lau interferometer, the first grating further includes an imaging unit on the opposite side of the first grating across the second grating, and the zeroth grating is And a first interference pattern, wherein at least one of the first grating and the second grating interferes with the first interference pattern when the zeroth grating is parallel to the first grating with the first distance therebetween. A second interference pattern, wherein the imaging unit includes an imaging unit body and a detection unit that detects the interference, and the imaging unit body interferes with the first interference pattern based on a detection result of the detection unit. The subject is imaged at a timing at which the interference pattern with the second interference pattern is equally spaced.
　このようなタルボ・ロー干渉計は、検出部の検出結果に基いて撮像部本体が被写体を撮像するため、第０格子が第１格子と第１距離を隔てて平行になった状態を容易に検出でき、その状態で容易に確実に被写体を撮像できる。 In such a Talbot-Lau interferometer, since the imaging unit main body captures an image of the subject based on the detection result of the detection unit, it is easy to make the 0th grating parallel to the first grating with a first distance. The subject can be detected and the subject can be easily and reliably imaged in that state.
　この出願は、２０１５年７月３日に出願された日本国特許出願特願２０１５－１３４２５８を基礎とするものであり、その内容は、本願に含まれるものである。 This application is based on Japanese Patent Application No. 2015-134258 filed on July 3, 2015, the contents of which are included in the present application.
　本発明を表現するために、上述において図面を参照しながら実施形態を通して本発明を適切且つ十分に説明したが、当業者であれば上述の実施形態を変更および／または改良することは容易に為し得ることであると認識すべきである。したがって、当業者が実施する変更形態または改良形態が、請求の範囲に記載された請求項の権利範囲を離脱するレベルのものでない限り、当該変更形態または当該改良形態は、当該請求項の権利範囲に包括されると解釈される。 In order to express the present invention, the present invention has been properly and fully described through the embodiments with reference to the drawings. However, those skilled in the art can easily change and / or improve the above-described embodiments. It should be recognized that this is possible. Therefore, unless the modifications or improvements implemented by those skilled in the art are at a level that departs from the scope of the claims recited in the claims, the modifications or improvements are not covered by the claims. To be construed as inclusive.
　本発明によれば、タルボ・ロー干渉計が提供できる。 According to the present invention, a Talbot-Lau interferometer can be provided.

Claims (4)

  1. 　Ｘ線を放射するＸ線源を有する干渉計本体と、前記Ｘ線源から順に第１方向に沿って配置され前記干渉計本体に保持された第０格子、第１格子および第２格子と、前記第０格子が振動に際して前記第１格子と所定の第１距離を隔てて平行になる位置にくるように前記第０格子に振動を付与する振動付与部材とを備え、
    　前記第０格子は、前記第１方向に移動可能、且つ、前記第１方向に直交する第２方向に延びる第２軸回り、および、前記第１方向と第２方向とのそれぞれに直交する第３方向に延びる第３軸回りにそれぞれ回動可能に前記干渉計本体に保持され、
    　前記第１格子と第２格子とは、互いに所定の第２距離を隔てて互いに平行になった状態で、互いに固定され、
    　前記振動付与部材は、前記第０格子を前記第１方向に振動させ、且つ前記第２軸回りと前記第３軸回りとのそれぞれに振動させる、
    　タルボ・ロー干渉計。     An interferometer body having an X-ray source that emits X-rays, and a zeroth grating, a first grating, and a second grating that are arranged in the first direction in order from the X-ray source and are held by the interferometer body; A vibration imparting member that imparts vibration to the zeroth lattice so that the zeroth lattice is in a position parallel to the first lattice at a predetermined first distance upon vibration,
    The zeroth grating is movable in the first direction and extends around a second axis extending in a second direction orthogonal to the first direction and is orthogonal to each of the first direction and the second direction. Held in the interferometer body so as to be rotatable around a third axis extending in three directions,
    The first grating and the second grating are fixed to each other in a state of being parallel to each other at a predetermined second distance;
    The vibration applying member vibrates the zeroth lattice in the first direction and vibrates around the second axis and around the third axis.
    Talbot-Lau interferometer.
  2. 　前記第２軸回りに前記第０格子を振動させる振動周波数と前記第３軸回りに前記第０格子を振動させる振動周波数とは、互いに素である、
    　請求項１記載のタルボ・ロー干渉計。     The vibration frequency for vibrating the zeroth lattice around the second axis and the vibration frequency for vibrating the zeroth lattice around the third axis are relatively prime.
    The Talbot-Lau interferometer according to claim 1.
  3. 　前記第１格子と第２格子とは、収納部材の内部に温度調整可能に封入されている、
    　請求項１または請求項２に記載のタルボ・ロー干渉計。     The first grid and the second grid are sealed inside the storage member so as to be temperature-adjustable.
    The Talbot-Lau interferometer according to claim 1 or 2.
  4. 　前記第１方向における、前記第２格子を挟んで前記第１格子と反対側に、撮像部を、更に備え、
    　前記第０格子は、第１干渉パターンを備え、
    　前記第１格子と第２格子との少なくとも一方は、前記第０格子が前記第１格子と前記第１距離を隔てて平行になると前記第１干渉パターンと干渉する第２干渉パターンを備え、
    　前記撮像部は、撮像部本体と、前記干渉を検出する検出部を備え、
    　前記撮像部本体は、前記検出部の検出結果に基いて、前記第１干渉パターンと干渉する第２干渉パターンとの干渉模様が等間隔になったタイミングで被写体を撮像する、
    　請求項１ないし請求項３のいずれか１項に記載のタルボ・ロー干渉計。     An imaging unit is further provided on the opposite side of the first grating across the second grating in the first direction,
    The zeroth grating comprises a first interference pattern;
    At least one of the first grating and the second grating includes a second interference pattern that interferes with the first interference pattern when the zeroth grating is parallel to the first grating with the first distance between them,
    The imaging unit includes an imaging unit body and a detection unit that detects the interference,
    The imaging unit main body captures an image of a subject at a timing at which the interference pattern between the first interference pattern and the second interference pattern interferes with each other based on the detection result of the detection unit.
    The Talbot-Lau interferometer according to any one of claims 1 to 3.
PCT/JP2016/064038 2015-07-03 2016-05-11 Talbot-lau interferometer WO2017006620A1 (en)

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