WO2016147751A1

WO2016147751A1 - Laser beam intensity distribution measurement device and laser beam intensity distribution measurement method

Info

Publication number: WO2016147751A1
Application number: PCT/JP2016/053798
Authority: WO
Inventors: 直之森宮; 直哉吉田; 尚樹岡本; 庸男歳桃; 鳥居　尚之; 山本　次郎
Original assignee: 日産自動車株式会社
Priority date: 2015-03-13
Filing date: 2016-02-09
Publication date: 2016-09-22
Also published as: JP2016170104A; JP6576061B2

Abstract

[Problem] Provided is a laser beam intensity distribution measurement device with which the intensity distribution of a laser beam can be sufficiently measured even in the case of a laser beam in an oblique incidence state having an optical path that is deflected from the optical axis. [Solution] This laser beam L intensity distribution measurement device 100 is a device that measures the intensity distribution of a laser beam. A measurement part 130 is disposed so as to face the optical axis C of the laser beam and measures the intensity distribution of the laser beam which is shone on a detection region 131a. A first adjustment part (collimating part 120M) of an adjustment part collimates and propagates the laser beam. A second adjustment part (condenser part 120N) of the adjustment part is disposed downstream of the collimating part along the optical axis, and brings the laser beam close to the optical axis and propagates the laser beam. The adjustment part adjusts the angle formed between the laser beam and the optical axis to be relatively small so as to propagate, toward the detection region, the laser beam which is deflected from the optical axis and propagated.

Description

Laser beam intensity distribution measuring apparatus and laser beam intensity distribution measuring method

The present invention relates to a laser beam intensity distribution measuring method and a laser beam intensity distribution measuring apparatus embodying the measuring method.

Conventionally, there is an apparatus for measuring the intensity distribution of a laser beam (for example, see Patent Document 1).

JP 2008-128987 A

In the configuration as described in Patent Document 1, it is difficult to sufficiently measure the intensity distribution of the laser beam depending on the oblique incidence state in which the optical path is deflected from the optical axis.

The present invention has been made in order to solve the above-described problems, and a laser beam intensity distribution measuring method capable of sufficiently measuring the intensity distribution of a laser beam whose optical path is deflected from the optical axis and is obliquely incident. It is another object of the present invention to provide a laser beam intensity distribution measuring method that embodies the intensity distribution measuring method.

The laser beam intensity distribution measuring apparatus according to the present invention that achieves the above object is an apparatus for measuring the intensity distribution of a laser beam. The intensity distribution measuring apparatus has a measuring unit and an adjusting unit. The measurement unit is arranged to face the optical axis of the laser beam and measures the intensity distribution of the laser beam irradiated on the detection region. The adjustment unit includes a first adjustment unit and a second adjustment unit. The first adjustment unit collimates and propagates the laser beam. The second adjustment unit is disposed downstream of the first adjustment unit along the optical axis and propagates the laser beam while being close to the optical axis. The adjustment unit adjusts the angle formed with the optical axis to be relatively small so that the laser beam deflected from the optical axis and propagates toward the detection region.

The laser beam intensity distribution measuring method according to the present invention that achieves the above object is a method for measuring the intensity distribution of a laser beam. The laser beam intensity distribution measurement method is adjusted so that the angle formed with the optical axis is relatively small by collimating the laser beam propagating from the optical axis and then propagating it close to the optical axis. However, there is a step of measuring the intensity distribution by irradiating a detection region provided facing the optical axis.

It is a perspective view which shows the principal part of the intensity distribution measuring apparatus of the laser beam which concerns on embodiment. It is a figure which shows optical systems, such as an adjustment part of an intensity distribution measuring apparatus. It is a block diagram which shows a laser oscillator in addition to an intensity distribution measuring apparatus. It is a block diagram which shows a laser oscillator in addition to the attenuation | damping part and measurement part of an intensity distribution measuring apparatus. It is a side view which shows the state which integrated the intensity distribution measuring apparatus in the manufacturing line. It is a figure which shows typically the structure which detects the position of the beam waist of the laser beam L by the detection part of an intensity distribution measuring apparatus. It is a flowchart which shows the control which optimizes the intensity distribution (diameter) of a laser beam automatically by an intensity distribution measuring apparatus. It is a flowchart which shows the control which optimizes the intensity distribution (spot diameter) of a laser beam automatically before mass production or during mass production by an intensity distribution measuring apparatus.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted. The sizes and ratios of the members in the drawings are exaggerated for convenience of explanation and may be different from the actual sizes and ratios.

The optical path refers to the path of each laser beam that propagates while being scanned by an optical element such as a galvanometer mirror. The optical axis is an axis connecting the light source and the center of the detection region, and particularly refers to the central axis of the laser beam in a state where scanning by an optical element such as a galvano mirror is not performed. The state where the optical path of the laser beam is deflected from the optical axis refers to a state where the laser beam propagates with a predetermined angle shifted from the central axis.

In the present embodiment, the intensity distribution measuring apparatus 100 is an apparatus that measures the intensity distribution of a laser beam L that is scanned and processed in a processing region of a workpiece (for example, a workpiece 10 that requires fine processing) on a manufacturing line. . The intensity distribution measuring device 100 corresponds to an embodiment of the intensity distribution measuring method. The intensity distribution measuring apparatus 100 can also be used as an apparatus for measuring the intensity distribution of the laser beam L in a laboratory or the like.

First, the configuration of the intensity distribution measuring apparatus 100 will be described with reference to FIGS.

FIG. 1 is a perspective view showing a main part of an intensity distribution measuring apparatus 100 for a laser beam L according to an embodiment. FIG. 2 is a diagram illustrating an optical system such as the adjusting unit 120 of the intensity distribution measuring apparatus 100. FIG. 3 is a block diagram showing a laser oscillator 200 in addition to the intensity distribution measuring apparatus 100. FIG. 4 is a block diagram showing the laser oscillator 200 in addition to the attenuation unit 110 and the measurement unit 130 of the intensity distribution measuring apparatus 100. FIG. 5 is a side view showing a state in which the intensity distribution measuring apparatus 100 is incorporated in a production line. FIG. 6 is a diagram schematically illustrating a configuration in which the position of the beam waist of the laser beam L is detected by the detection unit 170 of the intensity distribution measuring apparatus 100.

The intensity distribution measuring apparatus 100 includes an attenuation unit 110, an adjustment unit 120, a measurement unit 130, a display unit 140, an operation unit 150, a housing unit 160, a detection unit 170, and a control unit 180.

As shown in FIGS. 1, 3, and 4, the attenuation unit 110 is disposed upstream of the measurement unit 130 along the optical axis C and attenuates the intensity of the laser beam L.

The attenuating unit 110 includes a first sampling prism 111, a water cooling damper 112, and a second sampling prism from the upstream side of the optical axis C (laser oscillator 200 side) to the downstream side (detector 131 side of the measuring unit 130). 113, air-cooled damper 114, first reflecting mirror 115, second reflecting mirror 116, first neutral density filter 117A, second neutral density filter 117B, third neutral density filter 117C, and fourth neutral density filter 117D. Each component is disposed. The first sampling prism 111 is disposed on the upstream side of the collimating portion 120M and adjacent to the collimating portion 120M. The second sampling prism 113 to the fourth neutral density filter 117D are disposed in a region between the collimator 120M and the capacitor 120N.

The first sampling prism 111 attenuates the intensity of the laser beam L. The laser beam L derived from the laser oscillator 200 is incident on the first sampling prism 111. The first sampling prism 111 propagates a part (for example, 90%) of the laser beam L to the water-cooled damper 112 while transmitting it from the interface to the outside, and reflects a part (for example, 10%) of the laser beam L at the interface. Propagate toward the second sampling prism 113. The first sampling prism 111 reflects the laser beam L propagating toward the workpiece 10 in a direction along the processing region (welding region) of the workpiece 10. The first sampling prism 111 is made of prism-shaped glass. The prism-shaped slope corresponds to the interface.

The water-cooled damper 112 is for attenuating the liquid by irradiating the liquid with the laser beam L transmitted from the interface of the first sampling prism 111 to the outside. The water cooling damper 112 is adjacent to the first sampling prism 111. The water-cooled damper 112 is made of, for example, metal and is formed in a box shape having a cavity inside. The water-cooled damper 112 is configured to be sealed with a plate-shaped window material that is transparent with respect to light having the wavelength of the laser beam L in a state where water is housed therein. The water cooling damper 112 attenuates the laser beam L by water cooling by irradiating the water stored therein while introducing the laser beam L from the window material.

The second sampling prism 113 further attenuates the intensity of the laser beam L attenuated by the first sampling prism 111. The second sampling prism 113 is disposed to face the first sampling prism 111 in the direction along the processing region (welding region) of the workpiece 10. The laser beam L reflected at the interface of the first sampling prism 111 (which has been attenuated to about 10% by the first sampling prism 111) is incident on the second sampling prism 113. The second sampling prism 113 transmits a part (eg, 90%) of the laser beam L to the air-cooled damper 114 while transmitting it from the interface to the outside, and reflects a part (eg, 10%) of the laser beam L at the interface. Propagate toward the first reflecting mirror 115. Similar to the first sampling prism 111, the second sampling prism 113 is made of prism-shaped glass. The prism-shaped slope corresponds to the interface.

The air-cooled damper 114 attenuates the gas by irradiating the gas with the laser beam L transmitted from the interface of the second sampling prism 113 to the outside. The air cooling damper 114 is adjacent to the second sampling prism 113. The air-cooled damper 114 is made of, for example, metal and is formed in a box shape having a cavity inside. The air-cooled damper 114 can be formed from copper or aluminum having excellent thermal conductivity, or a copper alloy or aluminum alloy having a certain strength. The air-cooled damper 114 attenuates the laser beam L while performing multiple reflection of the laser beam L by a cavity between the second sampling prism 113 and the air-cooling damper 114.

The first reflecting mirror 115 reflects the laser beam L and changes its optical axis C. The first reflecting mirror 115 is disposed to face the second sampling prism 113 in the direction along the processing region (welding region) of the workpiece 10. The first reflecting mirror 115 propagates the laser beam L propagated from the second sampling prism 113 toward the second reflecting mirror 116 while reflecting the laser beam L toward the direction along the surface of the workpiece 10. The first reflecting mirror 115 turns the optical axis C of the laser beam L 90 degrees. The first reflecting mirror 115 is configured, for example, by depositing a metal such as aluminum on one surface of a prism-shaped glass. In the first reflecting mirror 115, the surface on which the metal is deposited becomes the reflecting surface of the laser beam L. By configuring the first reflecting mirror 115 with a prism shape, it is easier to adjust the angle with reference to the shape (one of the three corners is a right angle) as compared with the case of configuring the first reflecting mirror 115 with a plate shape.

The second reflection mirror 116 reflects the laser beam L and changes its optical axis C. The second reflecting mirror 116 is disposed to face the first neutral density filter 117 </ b> A in the direction along the processing area (welding area) of the workpiece 10. The second reflecting mirror 116 reflects the laser beam L propagated from the first reflecting mirror 115 in the direction along the surface of the workpiece 10 and applies it to the first neutral density filter 117A to the fourth neutral density filter 117D. Propagate toward. The second reflecting mirror 116 turns back the optical axis C of the laser beam L by 90 °. The second reflection mirror 116 has the same specifications as the first reflection mirror 115.

The first neutral density filter 117A, the second neutral density filter 117B, the third neutral density filter 117C, and the fourth neutral density filter 117D adjust the intensity of the laser beam L in accordance with the light resistance characteristics of the detector 131. is there. The first neutral density filter 117 </ b> A is disposed to face the second reflection mirror 116 in the direction along the plane of the workpiece 10. The first neutral density filter 117A to the fourth neutral density filter 117D are disposed between the second reflection mirror 116 and the capacitor unit 120N at a constant interval. The first neutral density filter 117A to the fourth neutral density filter 117D finely adjust the intensity of the laser beam L significantly attenuated by the first sampling prism 111 and the second sampling prism 113.

When the first neutral density filter 117A to the fourth neutral density filter 117D are configured as a so-called reflection type, as an example, the reflectance of a plate-shaped window material that is transparent with respect to the light of the wavelength of the laser beam L is several tens% to A film on which several percent of a reflective film (for example, a thin film made of chromium) is deposited is used. On the other hand, when the first neutralization filter 117A to the fourth neutralization filter 117D are configured as so-called absorption types, as an example, a window material containing an absorber that absorbs light of the wavelength of the laser beam L at a certain ratio. Is used. As the first neutral density filter 117A to the fourth neutral density filter 117D, filters having different attenuation ratios such as 90%, 50%, 10%, and 1% are used. The first neutral density filter 117A to the fourth neutral density filter 117D are opposed (directly opposed) to the optical axis C so as to be orthogonal to the optical axis C. A plurality of neutral density filters may be used as in the embodiment, or only one may be used. The neutral density filter can easily attenuate the laser beam L to an arbitrary intensity by using a combination of a plurality of neutral density filters. That is, the intensity of the laser beam L can be finely adjusted by the first neutral density filter 117A to the fourth neutral density filter 117D without changing the configuration of the first sampling prism 111 and the second sampling prism 113.

As shown in FIGS. 1 to 3, the adjusting unit 120 relatively reduces the angle formed with the optical axis C so that the laser beam L propagating from the optical axis C is propagated toward the detection region 131a. adjust.

The adjusting unit 120 includes a first adjusting unit (for example, a collimating unit 120M) and a second adjusting unit (for example, a capacitor unit 120N).

The collimator 120M propagates the laser beam L toward the detector 131 in a parallel light state along the optical axis C or in a state close to parallel light. The infinity correction section is realized by the collimator 120M. The collimating unit 120M is configured by an objective

lens including lenses

121, 122, 123, and 124. As such an objective lens, one used in a microscope or the like can be applied. The collimator 120M is incorporated in, for example, a narrow space of the production line, and propagates the laser beam L in a direction along the processing region (welding region) of the workpiece 10 in order to prevent interference with the workpiece 10. By selecting an objective lens whose numerical aperture is, for example, NA = 0.3 or more, the laser beam L scanned by the galvano mirror 211 can be sufficiently condensed and propagated to the detection region 131a. .

The capacitor unit 120N propagates the laser beam L toward the detector 131 in the condensed light state while bringing the laser beam L close to the optical axis C. The capacitor unit 120N is disposed on the downstream side along the optical axis C from the collimating unit 120M. The condenser unit 120N is configured by an imaging

lens including lenses

125, 126, 127, and 128. As such an imaging lens, one used in a microscope or the like can be applied. The condenser unit 120N is configured so that the angle of the laser beam L can be corrected by an imaging lens. Further, the focal length of the imaging lens including the

lenses

125, 126, 127, and 128 is configured to be equal to the focal length of the laser beam L to the workpiece 10 placed on the welding table 221 in the production line, for example. By doing so, the measurement of the laser beam L by the measurement unit 130 can be performed in a state where the profiler of the laser beam L at the time of laser welding is accurately reproduced.

As shown in FIGS. 1 to 4, the measuring unit 130 is arranged to face the optical axis C of the laser beam L, and measures the intensity distribution of the laser beam L irradiated to the detection region 131a.

The measuring unit 130 includes a detector 131. The detector 131 is disposed on the most downstream side along the optical axis C. The detection area 131a of the detector 131 is composed of a CCD or a CMOS, and is opposed (facing directly) to the optical axis C so as to be orthogonal to the optical axis C. The detector 131 can be a camera type. The detector 131 may be a scanner type using a knife edge method, a scanner type using a slit method, or a scanner type using a pinhole method. For example, in the case where a scanner type scanner type is used as the detector 131, the laser beam L is made incident while the slit provided in front of the photodetector is rotated. In the detector 131, when the laser beam L that has passed through the slit is incident on the detector, an electromotive force is generated, and the intensity of the laser beam L is detected as the magnitude of the current value. The detector 131 detects the distribution of the laser beam L based on the position of the slit.

Here, the detection accuracy of the detector 131 generally depends on the incident angle of the laser beam L. The detector 131 can detect the intensity distribution of the laser beam L with the highest accuracy when the laser beam L is perpendicularly incident on the detection region 131a. That is, the laser beam L which is deflected from the optical axis C and propagates is adjusted by the adjustment unit 120 so that the angle formed with the optical axis C is relatively small, and the laser beam L is nearly perpendicular to the detection region 131a. , The intensity distribution of the laser beam L can be accurately detected.

The display unit 140 displays the intensity distribution of the laser beam L measured by the measurement unit 130, as shown in FIGS.

The display unit 140 includes a monitor 141. The monitor 141 is connected to the detector 131 of the measurement unit 130. The monitor 141 receives and displays the intensity distribution data of the laser beam L obtained by the detector 131. For example, an operator on the production line performs optical adjustment while visually observing the intensity distribution of the laser beam L with the monitor 141. The monitor 141 represents, for example, the intensity of the laser beam L on the vertical axis and the distribution of the laser beam L on the horizontal axis (two axes). The monitor 141 displays the intensity distribution of the laser beam L in a three-dimensional manner, displays the bird's-eye view from the upper side to the lower side, or displays it from the side.

As shown in FIGS. 3 and 5, the operation unit 150 adjusts the changing unit 210 of the laser oscillator 200 based on the measurement result of the intensity distribution of the laser beam L by the measurement unit 130 to reduce the diameter of the laser beam L. .

The operation unit 150 includes a control circuit 151. The control circuit 151 is electrically connected to the rectilinear stage 213 of the changing unit 210 of the laser oscillator 200. Here, the changing unit 210 is provided on the laser oscillator 200 side, and changes the position along the optical axis C of the galvano mirror 211 that reflects the laser beam L to the upstream side or the downstream side. The laser beam L derived from the laser oscillator 200 is reflected by the galvanometer mirror 211, passes through the fθ lens 212, and propagates to the first sampling prism 111. The fθ lens 212 makes the scanning speed of the laser beam L by the galvanometer mirror 211 constant. The control circuit 151 receives the measurement result of the intensity distribution of the laser beam L from the measurement unit 130 and controls the straight stage 213 based on the received measurement result so that the diameter of the laser beam L is minimized. The position along the optical axis C of 211 is adjusted.

As shown in FIGS. 3 and 5, the housing unit 160 supports each component of the intensity distribution measuring apparatus 100 and fills the interior connected to the laser oscillator 200 with an inert gas.

The housing unit 160 includes a support base 161, a drive stage 162, and a nozzle 163. The support base 161 supports each constituent member such as the attenuation unit 110, the adjustment unit 120, and the measurement unit 130 in a fixed state. The drive stage 162 mounts the support stand 161 and moves the support stand 161. The drive stage 162 retracts the support base 161 from the optical path K of the laser beam L so as not to interfere with the workpiece 10 while the workpiece 10 is welded by the laser beam L derived from the laser oscillator 200. On the other hand, the drive stage 162 causes the support base 161 to enter the optical path K of the laser beam L when the workpiece 10 is not welded by the laser oscillator 200 and the intensity distribution of the laser beam L is measured. The nozzle 163 eliminates oxygen while replacing the atmosphere of the optical path K of the laser beam L with an inert gas (assist gas), thereby preventing the surface of the optical member from being burned due to the oxygen. The nozzle 163 is disposed between the laser oscillator 200 and the first optical element (the most upstream side of the optical system) of the attenuation unit 110. The nozzle 163 does not need to have a shape that is isolated from the outside and satisfies the hermetically sealed state. At least the inert gas is circulated so that the region adjacent to the laser oscillator 200 and the intensity distribution measuring device 100 is filled with the inert gas. What is necessary is just to be the structure to do.

The detection unit 170 detects the position of the beam waist of the laser beam L as shown in FIG.

The detection unit 170 includes a reference table 171 and a probe 172. The position of the upper surface of the reference table 171 is finely adjusted in advance so as to coincide with the focal position of the fθ lens 212 along the optical axis C. That is, the position of the upper surface of the reference table 171 and the focal position of the fθ lens 212 are adjacent to each other along the normal direction of the optical axis C. The reference number 171 is moved together with the fθ lens 212 by the linear stage 213. That is, the position of the upper surface of the reference table 171 and the focal position of the fθ lens 212 always coincide with the optical axis C. The probe 172 moves closer to and away from the upper surface of the reference table 171, and transmits the position when contacting the upper surface of the reference table 171 to the controller of the control unit 180.

The probe 172 is normally separated from the reference base 171 as shown in FIG. As shown in FIG. 6B, the probe 172 transmits its position to the controller 181 while moving away from and approaching the reference table 171. As described above, when the position of the beam waist of the laser beam L derived from the laser oscillator 200 is detected, the reference table 171 correlated with the focal position of the fθ lens 212 can be used. Therefore, it is not necessary to bring the probe 172 into contact with the fθ lens 212 which is an optical member and requires handling, and is difficult to detect the position in a narrow place. Further, it is not necessary to bring the probe 172 into contact with the antireflection film which is deposited on the surface of the fθ lens 212 and easily peels off.

As shown in FIGS. 1 and 3, the control unit 180 controls the changing unit 210 of the laser oscillator 200 via the operation unit 150 in addition to the control of the measurement unit 130 and the display unit 140.

The control unit 180 includes a controller 181. The controller 181 includes a ROM, a CPU, and a RAM. A ROM (Read Only Memory) stores a control program for the intensity distribution measuring apparatus 100 and the changing unit 210 of the laser oscillator 200 and ideal intensity distribution data that serves as a reference for the laser beam L. A plurality of control programs are stored in the ROM. For example, the control program is a program for adjusting the changing unit 210 so that the diameter of the laser beam L is reduced based on the measurement result of the intensity distribution of the laser beam L by the measuring unit 130. A CPU (Central Processing Unit) executes a control program. A RAM (Random Access Memory) temporarily stores data on the intensity distribution of the laser beam L measured by the detector 131.

Next, a method of using the intensity distribution measuring apparatus 100 will be described with reference to FIGS.

FIG. 7 is a flowchart showing control for automatically optimizing the intensity distribution (diameter) of the laser beam L by the intensity distribution measuring apparatus 100. FIG. 8 is a flowchart showing control for automatically optimizing the intensity distribution (diameter) of the laser beam L by the intensity distribution measuring apparatus 100 before mass production or during mass production.

A method for automatically optimizing the diameter of the laser beam L by the intensity distribution measuring apparatus 100 will be described with reference to FIG.

In step S111, in order to measure the diameter of the laser beam L, the power source of the intensity distribution measuring apparatus 100 is turned on, and the optimization of the diameter of the laser beam L is started based on the control of the control unit 180. The process proceeds from step S111 to step S112.

In step S112, the control unit 180 first causes the support base 161 to enter the optical path K of the laser beam L by the drive stage 162 of the housing unit 160. The support base 161 supports the constituent members such as the attenuation unit 110, the adjustment unit 120, and the measurement unit 130. Next, the control unit 180 causes the laser oscillator 200 to derive the laser beam L and causes the detector 131 of the measurement unit 130 to detect the diameter of the laser beam L. Thereafter, the process proceeds from step S112 to step S113.

In step S113, the control unit 180 determines whether the diameter of the laser beam L detected by the detector 131 is equal to the predetermined reference value diameter by the CPU of the controller 181. The reference value data is stored in the ROM of the controller 181. Thereafter, the process proceeds from step S113 to step S114 (when the diameter of the laser beam L is equal to the reference value) or step S131 (when the diameter of the laser beam L is not equal to the reference value).

In step S114, the control unit 180 moves the galvanometer mirror 211 toward the upstream side or the downstream side of the optical axis C by the operation unit 150 based on the determination that the diameter of the laser beam L is equal to the reference value in step S113. Move it a certain distance. Thereafter, the process proceeds from step S114 to step S115.

In step S115, as in step S112, the control unit 180 causes the laser oscillator 200 to derive the laser beam L and causes the detector 131 of the measurement unit 130 to measure the diameter of the laser beam L. Thereafter, the process proceeds from step S115 to step S116.

In step S116, as in step S113, the control unit 180 determines whether the diameter of the laser beam L detected by the detector 131 is equal to a predetermined reference value diameter by the CPU of the controller 181. . Thereafter, the process proceeds from step S116 to step S117 (when the diameter of the laser beam L is equal to the reference value) or step S121 (when the diameter of the laser beam L is not equal to the reference value).

In step S117, the control unit 180 causes the operation unit 150 to move the galvanometer mirror 211 back along the optical axis C in the reverse direction by a half of a predetermined distance. For example, on the production line, the galvanometer mirror 211 is scanned (rotated and driven) on the basis of the moved position, and laser welding of the workpiece 10 by the laser oscillator 200 is performed. Thereafter, the process proceeds from step S117 to step S118.

In step S121, following step S116, the control unit 180 causes the operation unit 150 to move the galvano mirror 211 toward the upstream side or downstream side of the optical axis C in the direction opposite to step S114 by twice a fixed distance. Let That is, the galvanometer mirror 211 is moved by a certain distance along the optical axis C in the direction opposite to the direction in step S114 with reference to the position in step S113. Thereafter, the process proceeds from step S121 to step S113.

In step S131, following step S113, the control unit 180 causes the operation unit 150 to move the galvanometer mirror 211 by a certain distance along the optical axis C. Thereafter, the process proceeds from step S131 to step S132.

In step S132, as in step S112, the control unit 180 causes the laser oscillator 200 to derive the laser beam L and causes the detector 131 of the measurement unit 130 to measure the diameter of the laser beam L. Thereafter, the process proceeds from step S132 to step S133.

In step S133, the control unit 180 determines whether the diameter of the laser beam L detected by the detector 131 is equal to or less than the latest measured value by the CPU of the controller 181. Thereafter, the process proceeds from step S133 to step S113 (when the diameter of the laser beam L is equal to or smaller than the latest measured value) or step S141 (when the diameter of the laser beam L is larger than the latest measured value).

In step S141, following step S133, the control unit 180 moves the galvano mirror 211 toward the upstream side or the downstream side of the optical axis C by the operation unit 150 in the direction opposite to that in step S131 by twice a fixed distance. Let Thereafter, the process proceeds from step S141 to step S132.

In step S118, continuing from step S117, the power of the intensity distribution measuring apparatus 100 is turned off, and the control for automatically optimizing the diameter of the laser beam L by the control unit 180 is ended.

A method for automatically optimizing the diameter of the laser beam L during mass production by the intensity distribution measuring apparatus 100 will be described with reference to FIG.

In step S201, in order to measure the diameter of the laser beam L, the intensity distribution measuring apparatus 100 is turned on, and the control unit 180 performs control to automatically optimize the diameter of the laser beam L before mass production or during mass production. Start. “Before mass production” corresponds to, for example, a case where a production line is inspected before starting business. For example, during mass production, it corresponds to a case where in the welding process of the workpiece 10, a piece that does not satisfy the standard is continuously generated.

In step S202, when the power of the intensity distribution measuring apparatus 100 is turned on, the control unit 180 waits until the welding of the workpiece 10 is completed when the workpiece 10 is welded by the laser oscillator 200. That is, it waits until one cycle of welding is completed. The work 10 and the jig are arranged at predetermined positions by the loader. The workpiece 10 is laser-welded by the laser oscillator 200 in a state where the workpiece 10 is placed on the welding table 221 and a mask 222 for preventing adhesion of spatter and the like is disposed on the workpiece 10. After the table on which the workpiece 10 is placed slides, the laser beam L is scanned by the galvanometer mirror 211, and laser welding of the workpiece 10 is performed. In laser welding, in order to integrate the anode side metal separator and the cathode side metal separator, the outer peripheral edge of each other and the uneven portion called the active area are welded. During the conveyance of the workpiece 10 that has been welded, the next workpiece 10 is welded. When the one cycle of the laser welding is completed, the control unit 180 stops the operation of the laser oscillator 200 and causes the support base 161 to enter the optical path K of the laser beam L by the drive stage 162 of the housing unit 160. The support base 161 supports the constituent members of the attenuation unit 110, the adjustment unit 120, and the measurement unit 130.

In step S203, the control unit 180 adjusts the position along the optical axis C of the galvanometer mirror 211 based on the measurement result of the laser beam L by the detector 131. The adjustment by the control unit 180 corresponds to S112 to S141 described above with reference to FIG.

In step S204, the support base 161 is separated from the optical path K of the laser beam L by the drive stage 162 of the housing unit 160. The welding of the workpiece 10 is resumed by the laser oscillator 200.

In step S205, the power of the intensity distribution measuring apparatus 100 is turned off, and the control for automatically optimizing the diameter of the laser beam L by the control unit 180 before mass production or during mass production is completed.

According to the intensity distribution measuring apparatus 100 for the laser beam L according to the above-described embodiment, the following effects can be obtained.

The laser beam L intensity distribution measuring apparatus 100 is an apparatus for measuring the intensity distribution of the laser beam L. The intensity distribution measuring apparatus 100 includes a measurement unit 130 and an adjustment unit 120. The measurement unit 130 is disposed to face the optical axis C of the laser beam L, and measures the intensity distribution of the laser beam L irradiated to the detection region 131a. The adjusting unit 120 includes a first adjusting unit (for example, a collimating unit 120M) and a second adjusting unit (for example, a capacitor unit 120N). The collimator 120M collimates and propagates the laser beam L. The condenser unit 120N is disposed downstream of the collimating unit 120M along the optical axis C, and propagates the laser beam L while being close to the optical axis C. The adjustment unit 120 adjusts the angle formed with the optical axis C to be relatively small so that the laser beam L that is deflected from the optical axis C and propagates toward the detection region 131a.

The intensity distribution measuring method of the laser beam L is a method of measuring the intensity distribution of the laser beam L. In the intensity distribution measurement method of the laser beam L, the angle formed with the optical axis C is made relatively small by collimating the laser beam L propagating from the optical axis and then propagating the laser beam L close to the optical axis. The intensity distribution is measured by irradiating the detection region 131a provided opposite to the optical axis C while adjusting.

According to the laser beam L intensity distribution measuring apparatus 100 and the laser beam L intensity distribution measuring method configured as described above, the laser beam L in which the optical path K is deflected from the optical axis C and irradiated onto the workpiece 10 by oblique incidence. Even so, the laser beam L can be propagated in a parallel light state along the optical axis C or in a state close to parallel light. For this reason, the intensity distribution measuring apparatus 100 for the laser beam L and the intensity distribution measuring method for the laser beam L have the intensity of the laser beam L even if the distance from the laser oscillator 200 to the detection region 131a is arbitrarily set. The distribution can be measured without removing it from the detection region. Therefore, the intensity distribution measuring apparatus 100 can sufficiently measure the intensity distribution of the laser beam L.

Further, according to the laser beam L intensity distribution measuring apparatus 100 and the laser beam L intensity distribution measuring method configured as described above, the measurement accuracy of the intensity distribution of the laser beam L depends on the incident angle with respect to the detection region 131a. Even if it is a case, it can measure with high precision. In general, the detector 131 is disposed so as to face (directly face) the optical axis C so that the incident angle of the laser beam L with respect to the detection region 131a of the detector 131 is parallel to the optical axis C. When the configuration is close to incidence, the measurement accuracy of the intensity distribution of the laser beam L is increased.

The intensity distribution measuring apparatus 100 of the laser beam L is an apparatus that measures the intensity distribution of the laser beam L. The intensity distribution measuring apparatus 100 includes a measurement unit 130, an adjustment unit 120, and an attenuation unit 110. The measurement unit 130 is disposed to face the optical axis C of the laser beam L, and measures the intensity distribution of the laser beam L irradiated to the detection region 131a. The adjustment unit 120 adjusts the angle formed with the optical axis C to be relatively small so that the laser beam L that is deflected from the optical axis C and propagates toward the detection region 131a. The attenuation unit 110 is disposed upstream of the measurement unit 130 along the optical axis C, and attenuates the intensity of the laser beam L. The laser beam L intensity distribution measurement method measures the intensity distribution of the laser beam L. Is the method. The method of measuring the intensity distribution of the laser beam L is provided so as to face the optical axis C while adjusting the angle formed with the optical axis C to be attenuated by attenuating the laser beam L that is deflected from the optical axis and propagating. A step of irradiating the detected region 131a and measuring the intensity distribution.

According to the laser beam L intensity distribution measuring apparatus 100 and the laser beam L intensity distribution measuring method configured as described above, the laser beam L in which the optical path K is deflected from the optical axis C and irradiated onto the workpiece 10 by oblique incidence. Even so, the intensity distribution of the output of the laser beam L at the time of actual use can be accurately measured, and the intensity distribution can be measured without removing it from the detection region. Therefore, the intensity distribution measuring apparatus 100 can sufficiently measure the intensity distribution of the laser beam L. The laser beam L becomes unstable when its output is lowered from the rated value, and its intensity distribution changes. Therefore, it is important to measure the intensity distribution of the laser beam L at the output in actual use without being restricted by the configuration of the measurement unit 130.

The laser beam L intensity distribution measuring apparatus 100 is an apparatus that measures the intensity distribution of the laser beam L to be scanned and processed in a processing region of a workpiece (for example, the workpiece 10) on a production line. The intensity distribution measuring apparatus 100 includes a measurement unit 130 and an adjustment unit 120. The measurement unit 130 is disposed to face the optical axis C of the laser beam L, and measures the intensity distribution of the laser beam L irradiated to the detection region 131a. The adjustment unit 120 adjusts the angle formed with the optical axis C to be relatively small so that the laser beam L that is deflected from the optical axis C and propagates toward the detection region 131a.

The intensity distribution measuring method of the laser beam L is a method of measuring the intensity distribution of the laser beam L to be processed by being scanned on the processing region of the workpiece (for example, the workpiece 10) on the production line. The method of measuring the intensity distribution of the laser beam L is provided so as to face the optical axis C while adjusting the angle of the laser beam L, which is deflected from the optical axis and propagates, with the optical axis C to be relatively small. A step of irradiating the detection region 131a to measure the intensity distribution;

According to the laser beam L intensity distribution measuring apparatus 100 and the laser beam L intensity distribution measuring method configured as described above, the laser beam L in which the optical path K is deflected from the optical axis C and irradiated onto the workpiece 10 by oblique incidence. Even so, the intensity distribution of the laser beam L can be measured without removing it from the detection region. Therefore, the intensity distribution measuring apparatus 100 can sufficiently measure the intensity distribution of the laser beam L in a state where it is incorporated in the production line.

Furthermore, the adjustment unit 120 may include a first adjustment unit (collimator unit 120M) and a second adjustment unit (capacitor unit 120N). The first adjusting unit (collimating unit 120M) collimates and propagates the laser beam L. The second adjustment unit (capacitor unit 120N) is disposed downstream of the collimator unit 120M along the optical axis C, and propagates the laser beam L while being close to the optical axis C.

According to the intensity distribution measuring apparatus 100 configured as described above, the collimator 120M can propagate the laser beam L in a parallel light state along the optical axis C or in a state close to the parallel light. It can be configured without depending on the distance from the oscillator 200 to the detection region 131a. That is, the intensity distribution measuring apparatus 100 does not need to sufficiently shorten the distance from the laser oscillator 200 to the detection region 131a, and can arbitrarily set the total length along the optical axis C of the adjustment unit 120. Further, the capacitor portion 120N can relatively reduce the angle formed between the optical axis C and the laser beam L that is deflected from the optical axis C and propagates.

Furthermore, the intensity distribution measuring apparatus 100 can be configured to include an attenuation unit 110. The attenuation unit 110 is disposed upstream of the measurement unit 130 along the optical axis C, and attenuates the intensity of the laser beam L.

According to the intensity distribution measuring apparatus 100 configured as described above, the attenuation unit 110 can sufficiently measure the intensity distribution of the laser beam L without causing the measurement unit 130 to be damaged due to the output of the laser beam L. Therefore, it is possible to accurately measure the intensity distribution of the laser beam L at the output during actual use. The laser beam L becomes unstable when its output is lowered from the rated value, and its intensity distribution changes. Therefore, it is important to measure the intensity distribution of the laser beam L at the output in actual use without being restricted by the configuration of the measurement unit 130.

Furthermore, the attenuating unit 110 may be configured to include an optical member that is transparent at least for the light having the wavelength of the laser beam L. The optical member attenuates a part of the laser beam L while being transmitted from the interface to the outside, and propagates the laser beam L toward the detection region 131a while reflecting a part of the laser beam L at the interface.

According to the intensity distribution measuring apparatus 100 configured as described above, the laser beam L can be propagated toward the detection region 131a while being sufficiently attenuated by the optical member having a simple specification. Therefore, it is not necessary to lower the output of the laser beam L, and the intensity distribution of the laser beam L at the output in actual use can be measured with high accuracy.

Furthermore, the attenuation unit 110 can be configured to irradiate at least one of a liquid and a gas with the laser beam L transmitted to the outside from the interface of the optical member.

According to the intensity distribution measuring apparatus 100 configured as described above, the laser beam L can be effectively and satisfactorily provided by a simple configuration in which at least one of the liquid and the gas is irradiated and attenuated with the laser beam L that is not propagated to the detection region 131a. Can be attenuated.

Furthermore, the adjustment unit 120 can be configured to propagate the laser beam L toward the detection region 131a while reflecting the laser beam L.

According to the intensity distribution measuring apparatus 100 configured as described above, the configuration from the laser oscillator 200 to the detection region 131a need not be provided in a straight line by reflecting the laser beam L so as to be folded back. It can be arranged sufficiently according to the layout of the laboratory or the like. The reflection direction of the laser beam L by the adjusting unit 120 may be a direction along the vertical direction in addition to the horizontal direction in order to avoid interference with equipment in a production line, a laboratory, or the like.

Furthermore, the adjustment unit 120 can be configured to propagate the laser beam L propagating toward the workpiece 10 toward the detection region 131a while reflecting the laser beam L in the direction along the processing region (welding region) of the workpiece 10. .

According to the intensity distribution measuring apparatus 100 configured as described above, the intensity distribution of the laser beam L can be adjusted without interfering with the workpiece 10 by reflecting the laser beam L in the direction along the workpiece 10. it can. That is, the intensity distribution measuring apparatus 100 can measure the intensity distribution of the laser beam L using an empty space in the production line, laboratory, or the like without significantly changing the configuration of the production line, laboratory, or the like. .

In particular, according to the intensity distribution measuring apparatus 100 configured in this way, for example, a region that has been abandoned because it is difficult to arrange in a relatively small space, such as processing of the workpiece 10 (laser welding), is sufficiently sufficient. It can be arranged and used.

Furthermore, the intensity distribution measuring apparatus 100 can be configured to include an operation unit 150. The operation unit 150 is electrically connected to a change unit 210 that is provided on the laser oscillator 200 side and changes the optical path K of the laser beam L. The operation unit 150 adjusts the changing unit 210 based on the measurement result of the intensity distribution of the laser beam L by the measurement unit 130 so that the diameter of the laser beam L is reduced.

According to the intensity distribution measuring apparatus 100 configured as described above, the adjustment of the changing unit by the operation unit 150 allows the adjustment of the laser beam L in a short time without depending on the skill level of the operator who operates the laser oscillator 200. It can be carried out with a certain accuracy. That is, the intensity distribution measuring apparatus 100 can adjust the intensity distribution of the laser beam L without stopping the mass production process for a long time. In other words, the operation unit 150 can maintain the machining accuracy of the workpiece (workpiece 10) by the laser oscillator 200 constant.

In particular, according to the intensity distribution measuring apparatus 100 configured as described above, the intensity distribution of the laser beam L is measured in real time in a state where the workpiece 10 is processed (laser welding) in a production line, a laboratory, or the like. By adjusting the distribution, the measurement result can be quickly fed back to the laser welding of the workpiece 10.

Furthermore, after the changing unit 210 of the laser oscillator 200 includes a reflecting member (galvano mirror 211) for reflecting the laser beam L, the operation unit 150 adjusts the position of the galvano mirror 211 along the optical axis C. can do.

According to the intensity distribution measuring apparatus 100 configured as described above, the intensity distribution of the laser beam L can be adjusted efficiently and reliably by adjusting the position of the galvano mirror 211 along the optical axis C by the operation unit 150. Can do.

Furthermore, the intensity distribution measuring apparatus 100 can be configured to include a housing portion 160. The casing 160 replaces the atmosphere of the optical path K of the laser beam L with an inert gas.

According to the intensity distribution measuring apparatus 100 configured as described above, the inert gas (assist gas) of the housing unit 160 can sufficiently prevent the component members from being burned due to the laser beam L. In particular, the intensity distribution measuring apparatus 100 effectively burns in the surface of the optical member due to the oxygen by removing, for example, oxygen while introducing an inert gas in the optical path of the laser beam L that covers a wide range with scanning. Can be prevented. Therefore, the intensity distribution measuring apparatus 100 can accurately measure the intensity distribution of the laser beam L.

Furthermore, the intensity distribution measuring apparatus 100 can be configured to include a display unit 140. The display unit 140 displays the intensity distribution of the laser beam L measured by the measurement unit 130.

According to the intensity distribution measuring apparatus 100 configured as described above, the display unit 140 allows the operator to perform optical adjustment while visually observing the intensity distribution of the laser beam L. Therefore, the adjustment can be performed easily and with constant accuracy. It can be carried out.

Further, the intensity distribution measuring apparatus 100 is adjacent to the position of the beam waist of the laser beam L along the normal direction of the optical axis C and the focal position of the optical element (fθ lens 212) that receives the focused laser beam. It can be set as the structure which provides the detection part 170 detected based on the position of the suitable reference | standard stand 171. FIG.

According to the intensity distribution measuring apparatus 100 configured as described above, the reference table can be obtained without contacting the fθ lens 212 which is an optical member and requires handling, and is difficult to detect the position in a narrow place. Through 171, the position of the beam waist of the laser beam L can be detected very accurately.

In addition, the present invention can be variously modified based on the configuration described in the claims, and these are also within the scope of the present invention.

For example, in the present embodiment, the intensity distribution measuring apparatus 100 has been described as a configuration for measuring the intensity distribution of the laser beam L used for welding the workpiece. However, the present invention is not limited to such a configuration, and the intensity distribution measuring apparatus 100 measures the intensity distribution of the printing laser beam L that marks a production number or the like on the surface of the workpiece as an example. It may be configured. That is, the intensity distribution measuring apparatus 100 is not limited to its use as long as it measures the intensity distribution of the laser beam L that performs some processing on the workpiece.

In the present embodiment, the adjustment unit 120 of the intensity distribution measuring apparatus 100 causes the first adjustment unit (collimating unit 120M) to propagate the laser beam L along the optical axis C in the state of parallel light, and the second The description has been given of the configuration in which the laser beam L is propagated while being close to the optical axis C by the adjusting unit (condenser unit 120N). However, the present invention is not limited to such a configuration. For example, the intensity distribution measuring apparatus 100 causes the laser beam L propagating at a constant angle to the optical axis C to be along the optical axis C. A configuration in which the light is directly adjusted so that an angle formed with the optical axis is small without using parallel light may be employed.

In the present embodiment, the attenuation unit 110 of the intensity distribution measuring apparatus 100 has been described as a configuration using an optical member such as a prism having a triangular cross section. However, the configuration is not limited to such a configuration, and the attenuation unit 110 can attenuate the intensity distribution of the laser beam L by various configurations.

In particular, when the attenuation unit 110 is configured as the so-called reflection type described in the present embodiment, for example, a plate-shaped window material that is transparent in the light of the wavelength of the laser beam L can be used as the optical member. . That is, the optical member is not limited to a prism, and may be a plate-like bulk. In the case of such a configuration, the optical member attenuates while transmitting most of the laser beam L, and propagates toward the measuring unit 130 while reflecting a part of the laser beam L. In the case of such a configuration (example), the optical member can be made inexpensive.

Similarly, as another example, the attenuation unit 110 deposits a reflective film (for example, a thin film made of chromium) having a reflectance of several percent on a plate-like window member that is transparent with respect to light having the wavelength of the laser beam L. It can be set as the structure to be used. In the case of such a configuration (other example), the reflectance of the optical member can be accurately defined. The reflection-type attenuation unit 110 is applied when the intensity of the laser beam L is relatively high in consideration of the heat resistance of a transparent optical material in the light of the wavelength of the laser beam L.

Furthermore, when the attenuation unit 110 is configured as a so-called absorption type, for example, a window material containing an absorbing material that absorbs light of the wavelength of the laser beam L at a certain ratio is used as an optical member. it can. In such a configuration, the optical member absorbs and attenuates most of the laser beam L, and propagates toward the measuring unit 130 while reflecting a very small part of the laser beam L. The transmission type attenuation unit 110 is applied when the intensity of the laser beam L is relatively small in consideration of the heat resistance of a transparent optical material in the light of the wavelength of the laser beam L.

Further, in the present embodiment, the configuration has been described in which the attenuation unit 110 performs water cooling and air cooling on the laser beam L in order to attenuate the laser beam L that is not propagated toward the measurement unit 130. However, the present invention is not limited to such a configuration, and the attenuation unit 110 may attenuate the laser beam L that is not propagated toward the measurement unit 130, for example, only by water cooling. As another example, the attenuation unit 110 may attenuate the laser beam L that is not propagated toward the measurement unit 130 in the order of air cooling and water cooling.

Further, in this embodiment, the attenuation unit 110 in addition to the adjustment unit 120 propagates the laser beam L toward the detection region 131a while reflecting the laser beam L so as to be bent. Since it comprises in this way, the intensity distribution measuring apparatus 100 can fully be arrange | positioned according to layouts, such as a manufacturing line and a laboratory.

This application is based on Japanese Patent Application No. 2015-050985 filed on March 13, 2015, the disclosure of which is incorporated by reference as a whole.

10 Workpiece (work piece),
100 intensity distribution measuring device,
110 attenuation part,
111 first sampling prism;
112 Water-cooled damper,
113 second sampling prism;
114 Air-cooled damper,
115 first reflecting mirror,
116 second reflection mirror,
117A first neutral density filter,
117B second neutral density filter,
117C third neutral density filter,
117D fourth neutral density filter,
120 adjustment unit,
120M collimating part (first adjusting part),
120N capacitor unit (second adjusting unit),
121, 122, 123, 124 lenses (objective lenses),
125, 126, 127, 128 lenses (imaging lenses),
130 measuring unit,
131 detectors,
131a detection area,
140 display unit,
141 monitor,
150 operation unit,
151 control circuit,
160 body part,
161 support base,
162 drive stage,
163 nozzles,
170 detector,
171 Reference platform,
172 probe,
180 control unit,
181 controller,
200 laser oscillator,
210 Change part,
211 Galvano mirror (reflective member),
212 fθ lens,
213 Straight stage,
221 welding table,
222 mask,
C optical axis,
K optical path,
L Laser beam.

Claims

An apparatus for measuring the intensity distribution of a laser beam,
A measurement unit that is arranged opposite to the optical axis of the laser beam and measures the intensity distribution of the laser beam irradiated to the detection region;
A first adjustment unit that collimates and propagates the laser beam; and a second adjustment unit that is disposed downstream of the first adjustment unit along the optical axis and propagates the laser beam in proximity to the optical axis; And an adjustment unit that adjusts an angle formed with the optical axis to be relatively small so that the laser beam propagating while being deflected from the optical axis is propagated toward the detection region. measuring device.
An apparatus for measuring the intensity distribution of a laser beam,
A measurement unit that is arranged opposite to the optical axis of the laser beam and measures the intensity distribution of the laser beam irradiated to the detection region;
An adjustment unit that adjusts the angle formed with the optical axis to be relatively small so that the laser beam that is deflected from the optical axis propagates toward the detection region;
An apparatus for measuring an intensity distribution of a laser beam, comprising: an attenuator disposed upstream of the measuring unit along the optical axis and attenuating the intensity of the laser beam.
An apparatus for measuring the intensity distribution of a laser beam scanned in a processing region of a workpiece to be processed in a production line,
A measurement unit that is arranged opposite to the optical axis of the laser beam and measures the intensity distribution of the laser beam irradiated to the detection region;
An apparatus for measuring an intensity distribution of a laser beam, comprising: an adjustment unit that adjusts an angle formed with the optical axis to be relatively small so that the laser beam deflected from the optical axis and propagates toward the detection region.
The adjustment unit is arranged on the downstream side along the optical axis with respect to the first adjustment unit for collimating and propagating the laser beam, and propagates the laser beam while being close to the optical axis. The apparatus for measuring an intensity distribution of a laser beam according to claim 2, further comprising a second adjustment unit.
5. The intensity of the laser beam according to claim 1, further comprising an attenuating unit that is disposed upstream of the measuring unit along the optical axis and attenuates the intensity of the laser beam. Distribution measuring device.
The attenuation unit includes an optical member that is transparent at least in the light of the wavelength of the laser beam,
5. The optical member attenuates a part of the laser beam while being transmitted from the interface to the outside, and propagates toward the detection region while reflecting a part of the laser beam at the interface. 6. The apparatus for measuring the intensity distribution of a laser beam according to any one of 5 above.
7. The laser beam intensity distribution measuring apparatus according to claim 6, wherein the attenuation unit irradiates at least one of a liquid and a gas with the laser beam transmitted to the outside from the interface of the optical member and attenuates the laser beam.
The laser beam intensity distribution measuring apparatus according to any one of claims 1 to 7, wherein the adjustment unit propagates the laser beam toward the detection region while reflecting the laser beam.
The adjustment unit causes the laser beam propagating toward the workpiece to propagate toward the detection region while reflecting the laser beam in a direction along the machining region of the workpiece. An apparatus for measuring the intensity distribution of a laser beam according to claim 1.
Provided on the laser oscillator side and electrically connected to a changing unit that changes the optical path of the laser beam, and based on the measurement result of the intensity distribution of the laser beam by the measuring unit, the diameter of the laser beam is reduced. The laser beam intensity distribution measuring apparatus according to any one of claims 1 to 9, further comprising an operation unit for adjusting the changing unit.
The changing unit includes a reflecting member that reflects the laser beam,
The laser beam intensity distribution measuring apparatus according to claim 10, wherein the operation unit adjusts a position along the optical axis of the reflecting member.
The laser beam intensity distribution measuring apparatus according to any one of claims 1 to 11, further comprising a housing portion that replaces an atmosphere of an optical path of the laser beam with an inert gas.
13. The laser beam intensity distribution measuring apparatus according to claim 1, further comprising a display unit that displays the intensity distribution of the laser beam measured by the measuring unit.
A detector that detects the position of the beam waist of the laser beam based on the position of a reference base adjacent to the focal position of the optical element that receives the focused laser beam and the normal direction of the optical axis; The laser beam intensity distribution measuring apparatus according to any one of claims 1 to 13.
A method for measuring the intensity distribution of a laser beam, comprising:
Provided facing the optical axis while adjusting the angle formed with the optical axis to be relatively small by collimating the laser beam propagating from the optical axis and propagating the laser beam close to the optical axis. A method for measuring the intensity distribution of a laser beam, comprising the step of irradiating the detected region to measure the intensity distribution.
A method for measuring the intensity distribution of a laser beam, comprising:
The intensity distribution is measured by irradiating the detection area provided opposite to the optical axis while adjusting the angle of the laser beam that is deflected from the optical axis to be attenuated and made relatively small. A method for measuring the intensity distribution of a laser beam comprising the step of: