WO2016145685A1 - Procédé de fabrication de substrat de filtre coloré, substrat de filtre coloré, et panneau d'affichage à cristaux liquides - Google Patents

Procédé de fabrication de substrat de filtre coloré, substrat de filtre coloré, et panneau d'affichage à cristaux liquides Download PDF

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Publication number
WO2016145685A1
WO2016145685A1 PCT/CN2015/075815 CN2015075815W WO2016145685A1 WO 2016145685 A1 WO2016145685 A1 WO 2016145685A1 CN 2015075815 W CN2015075815 W CN 2015075815W WO 2016145685 A1 WO2016145685 A1 WO 2016145685A1
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WIPO (PCT)
Prior art keywords
layer
black matrix
region
substrate
sub
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PCT/CN2015/075815
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English (en)
Chinese (zh)
Inventor
谢畅
Original Assignee
深圳市华星光电技术有限公司
武汉华星光电技术有限公司
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Publication of WO2016145685A1 publication Critical patent/WO2016145685A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel.
  • the principle of the RGBW liquid crystal display technology is to use a white (W) Subpixels are added to traditional RGB consisting of three colors: red (R), green (G), and blue (B).
  • the corresponding sub-pixel imaging technique is then applied to better arrange the sub-pixels in a manner that humans see the image. This ensures that images that are not visible to the human eye are generated without loss of display power and brightness.
  • the RGBW sub-pixel imaging technique individually addresses each sub-pixel and adds a white sub-pixel to the permutation mode to form an RGBW pixel design that is more traditional than RGB
  • the pixel-designed display should be brighter and have a higher resolution.
  • Transmittance and brightness are increased because more backlights can be illuminated by larger and semi-transparent W sub-pixels instead of being obscured by the tight arrangement of smaller red, green, and blue sub-pixels used by RGB stripes. .
  • white sub-pixels an increase in white luminance is achieved without an increase in power consumption. Therefore, the advantages of RGBW technology are to improve the utilization of backlight brightness, save power, reduce cost, and achieve higher brightness levels without reducing resolution or increasing power consumption. Therefore, RGBW LCD screens will become more and more widely used.
  • FIG. 1 is a schematic structural diagram of a color film substrate provided by the prior art.
  • the OC covers the W sub-pixel portion and a recessed area appears.
  • the surface of the recessed area is not flat, so that after the rubbing treatment of the alignment layer, the orientation layer may have a non-uniformity of rubbing orientation, which may cause light leakage problems; and the surface of the alignment layer is not flat and may contact the orientation layer.
  • the liquid crystal molecules have poor fluidity, which in turn causes problems such as chromatic aberration of compression.
  • An object of the present invention is to provide a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel, which can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage caused by RGBW pixels, and effectively improving the problem of chromatic aberration of pressing.
  • a method for fabricating a color filter substrate comprising:
  • the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
  • an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a The thickness of the first OC layer of the W sub-pixel region is the same
  • a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the step of coating the second OC layer on the substrate comprises:
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a method for fabricating a color filter substrate comprises:
  • the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
  • RGB color resist layer Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film is the same as a thickness of the first OC layer of the W sub-pixel region ;
  • a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region is the same.
  • the first OC layer is patterned to retain the first OC layer of the W sub-pixel region, and the first OC layer of other regions
  • the steps of removing are specifically included:
  • the step of coating the second OC layer on the substrate comprises:
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a color film substrate comprising:
  • a substrate comprising a color film region, a W sub-pixel region, and a black matrix region
  • a first OC layer disposed on the W sub-pixel region on the substrate
  • a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a liquid crystal display panel comprising: an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate;
  • the color film substrate comprises:
  • a substrate comprising a color film region, a W sub-pixel region, and a black matrix region
  • a first OC layer disposed on the W sub-pixel region on the substrate
  • a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
  • the present invention firstly fabricates a first OC layer in a W sub-pixel region, and ensures that the R, G, and B color resist layers are consistent with the thickness of the first OC layer of the W sub-pixel region, so that the final coating is performed at the end. After the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 1 is a schematic structural view of a color filter substrate provided by the prior art
  • FIG. 2 is a schematic flowchart of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 3 is an exploded perspective view showing a structure of a color filter substrate obtained in a process of fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention.
  • the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as the thickness of the first OC layer of the W sub-pixel region.
  • the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 2 is a schematic diagram of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 3 is a color film obtained in the process of fabricating a color filter substrate according to an embodiment of the present invention
  • Schematic diagram of the decomposition of the substrate structure For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the method for fabricating the color film substrate mainly includes the following steps:
  • step S101 a substrate is provided, the substrate including a color film area, a W sub-pixel area, and a black matrix area;
  • the substrate provided may be a glass substrate, the substrate includes a color film region for forming an RGB color film, a W sub-pixel region for forming a white sub-pixel, and a black matrix for forming Black matrix area.
  • step S102 coating a first OC layer on the substrate
  • a first OC layer is applied over the entire surface of the substrate.
  • step S103 the first OC layer is patterned, and the first OC layer of the W sub-pixel region is reserved, and the first OC layers of other regions are removed;
  • the first OC layer is subjected to a process operation such as exposure, development, and etching, and the first OC layer of the W sub-pixel region is retained, and the first OC layer of other regions is retained. All removed.
  • step S104 depositing a black matrix layer on the substrate
  • the thickness of the deposited black matrix layer is the same as the thickness of the first OC layer of the W sub-pixel region.
  • step S105 the black matrix layer is patterned to retain the black matrix layer of the black matrix region, and the black matrix layers of other regions are removed;
  • the black matrix layer is subjected to a process operation such as exposure, development, and etching, and the black matrix layer of the black matrix region is retained, and the black matrix layers of other regions are removed.
  • step S106 an RGB color resist layer is coated on the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film and the first of the W sub-pixel regions The thickness of the OC layer is the same;
  • a second OC layer is integrally coated on the substrate, specifically, on the RGB color resist layer of the color film region, on the black matrix layer of the black matrix region. And coating the second OC layer on the first OC layer of the W sub-pixel region.
  • one pixel of the color film substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • step S108 a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the transparent metal layer may be composed of ITO.
  • the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as that of the W sub-pixel region.
  • the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600.
  • the substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed.
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same.
  • the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • an embodiment of the present invention further provides a liquid crystal display panel.
  • the liquid crystal display panel includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate.
  • the color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600.
  • the substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same.
  • the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • the method for fabricating a color filter substrate, the color filter substrate, and the liquid crystal display panel provided by the embodiments of the present invention firstly fabricate a first OC layer in the W sub-pixel region, and ensure the R, G, and B color resist layers.
  • the thickness of the first OC layer of the W sub-pixel region is identical, such that after the final application of the second OC layer, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)

Abstract

L'invention concerne un procédé de fabrication d'un substrat de filtre coloré consistant à : former un motif sur une première couche OC (200) en conservant la première couche OC (200) d'une région de sous-pixels W ; former un motif sur une couche matrice noire (300) en conservant la couche matrice noire (300) de la région de couche matrice noire ; former un filtre coloré RVB sur la région de filtre coloré d'un substrat (100), le filtre coloré RVB ayant la même épaisseur que la première couche OC (200) de la région de sous-pixels W ; appliquer une seconde couche OC (500) sur le substrat (100) ; déposer une couche métallique transparente (600) sur la seconde couche OC (500). Le procédé de fabrication décrit empêche l'apparition d'évidements sur la région de sous-pixel W.
PCT/CN2015/075815 2015-03-18 2015-04-02 Procédé de fabrication de substrat de filtre coloré, substrat de filtre coloré, et panneau d'affichage à cristaux liquides WO2016145685A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510117726.8 2015-03-18
CN201510117726.8A CN104793391B (zh) 2015-03-18 2015-03-18 一种彩膜基板的制作方法、彩膜基板以及液晶显示面板

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CN107015399B (zh) * 2017-05-11 2020-04-24 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置及其制作方法
CN107272294B (zh) 2017-07-10 2020-08-18 华南师范大学 一种电控智能窗及制备方法、光调节方法
CN107247359A (zh) 2017-07-20 2017-10-13 京东方科技集团股份有限公司 一种显示基板、显示面板及显示装置
CN107591430A (zh) * 2017-09-14 2018-01-16 深圳市华星光电半导体显示技术有限公司 彩膜基板的制作方法
CN107505761B (zh) * 2017-09-18 2020-06-12 惠科股份有限公司 彩色滤光器以及液晶显示面板的制作方法
CN107505760B (zh) * 2017-09-18 2020-06-12 惠科股份有限公司 阵列基板的像素结构以及液晶显示面板
CN110618554A (zh) * 2019-09-26 2019-12-27 厦门天马微电子有限公司 一种彩膜基板、显示面板及显示装置
CN115480421A (zh) * 2022-10-19 2022-12-16 信利(仁寿)高端显示科技有限公司 一种cf基板及其制作方法

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