WO2016136402A1 - Luminous flux homogenizing mechanism, illuminating optical system, light-receiving optical system, reference optical system, and colorimeter - Google Patents

Abstract

The objective of the present invention is to increase the homogeneity of a reflection coefficient of a diffuse reflecting surface possessed by a luminous flux homogenizing mechanism, and to increase the reflection coefficient of a diffuse reflecting surface possessed by a luminous flux homogenizing mechanism, without making the luminous flux homogenizing mechanism costly. An integrating sphere is provided with a base material and a film. A space is formed in the base material. The inner surface of the base material defines the space. The base material comprises a white resin, and reflects luminous flux. The film is formed by coating a transparent matte coating material onto the inner surface of the base material, and said film causes the luminous flux to diffuse.

Description

Light beam uniformizing mechanism, illumination optical system, light receiving optical system, reference optical system, and colorimeter

The present invention relates to a light flux uniformizing mechanism, an illumination optical system, a light receiving optical system, a reference optical system, and a colorimeter.

A color meter is used to quantitatively measure the color of industrial products, foods, and the like. In a colorimeter, a sample is illuminated with a light beam bundle of illumination light, a light beam bundle of reflected light reflected by the sample or a light beam bundle transmitted through the sample is measured, and a color value is obtained from the measurement result. In a colorimeter, the beam bundle of illumination light, the beam bundle of reflected light, and the like may be made uniform by an integrating sphere. For example, in the geometry of 8 ° direction illumination / diffuse light reception (8 °: d), the beam of illumination light enters the sample surface from a direction that makes an angle of 8 ° with the normal of the sample surface, and in all directions from the sample surface. The light flux of the reflected light that exits is made uniform by the integrating sphere and guided to the light receiving sensor. Also, in the geometry of diffuse illumination and 8 ° direction light reception (d: 8 °), the light beam of the illumination light is made uniform by the integrating sphere and incident on the sample surface from all directions, and from the sample surface to the normal of the sample surface. The bundle of reflected light emitted in the direction of 8 ° is guided to the light receiving sensor.

A spherical space is formed in the integrating sphere that makes the light flux uniform. The inner surface of the integrating sphere defining the spherical space is a white diffuse reflection surface. As a result, the light beam enters the spherical space, diffusely reflects on the inner surface of the integrating sphere while propagating through the spherical space, and exits from the spherical space. The light beam emitted from the spherical space is made uniform by diffuse multiple reflection.

Patent Documents 1 and 2 describe a technique for making the inner surface of an integrating sphere a white diffuse reflection surface.

In the technique described in Patent Document 1, a coating is formed by applying a white matte paint on the inner surface of the base of the integrating sphere. The surface of the coating becomes a diffuse reflection surface.

In the technique described in Patent Document 2, the integrating sphere is made of a white porous material. When the integrating sphere is made of a porous material, a block-like base material is produced by compression molding a powdery raw material, and the integrating sphere having the target shape is obtained by machining the shape of the block-like base material. Is produced. Machining changes the shape. The inner surface of the integrating sphere produced by machining becomes a diffuse reflection surface.

US Pat. No. 3,764,364 Japanese Patent Laid-Open No. 5-118911

When a coating is formed by applying paint, the variation in the coating thickness increases as the coating becomes thicker. For this reason, in the technique described in Patent Document 1, when the coating is thickened, the variation in the thickness of the coating increases, the variation in the reflectance of the diffuse reflection surface increases, and the light flux of the integrating sphere is made uniform. Or the individual difference of the ability to equalize the light flux of the integrating sphere increases. On the other hand, when the coating is made thin, the reflectance of the diffuse reflection surface is reduced, and the integrating sphere efficiency is lowered. In the technique described in Patent Document 2, since the integrating sphere is made of an expensive porous material, the integrating sphere becomes expensive. These problems also occur in a light beam uniformizing mechanism other than an integrating sphere.

The invention described below is made to solve these problems. The problem to be solved by the invention described below is to increase the uniformity of the reflectance of the diffusive reflecting surface of the light beam uniformizing mechanism without making the light beam uniformizing mechanism expensive, and to make the light beam uniform It is to increase the reflectance of the diffuse reflection surface of the mechanism.

The light beam homogenizing mechanism includes a base material and a coating. A space is formed in the substrate. The inner surface of the substrate defines a space. The substrate is made of a white resin and reflects the light beam. The coating is formed by coating a transparent matte paint on the inner surface of the substrate to diffuse the light beam.

な く Without making the beam bundle uniforming mechanism expensive, the uniformity of the reflectance of the diffuse reflecting surface of the beam bundle uniforming mechanism is increased, and the reflectance of the diffuse reflecting surface of the beam bundle uniformizing mechanism is increased.

It is a schematic diagram which shows a color meter. It is sectional drawing which shows a measurement mechanism. It is sectional drawing which shows the light beam separation mechanism and the light-receiving mechanism for reference lights. It is sectional drawing which shows the light receiving mechanism for an integrating sphere and reflected light. It is sectional drawing which shows the light receiving mechanism for an integrating sphere and reflected light. It is sectional drawing which shows another example of a measurement mechanism. It is sectional drawing which shows another example of the light beam separation mechanism and the light-receiving mechanism for reference lights. It is sectional drawing which shows an integrating sphere. It is a graph which shows a spectral reflectance and an equivalent function. It is a graph which shows a spectral reflectance. It is a graph which shows a spectral reflectance. It is a graph which shows a spectral reflectance. It is a graph which shows a spectral reflectance. It is sectional drawing which shows a measurement head. It is sectional drawing which shows another example of a measurement head. It is sectional drawing which shows an illumination mechanism. It is sectional drawing which shows an illumination mechanism.

(1) Outline The schematic diagram of FIG. 1 shows a colorimeter. The schematic diagram of FIG. 2 shows the longitudinal cross section of the measuring mechanism which comprises a color meter. The schematic diagram of FIG. 3 shows a cross section of a light beam separating mechanism and a light receiving mechanism for reference light that constitute the colorimeter. The schematic diagrams of FIGS. 4 and 5 show cross sections of the integrating sphere and the light receiving mechanism for reflected light that constitute the colorimeter. FIG. 5 shows an enlarged view of the vicinity of the light receiving mechanism for reflected light.

1 includes a measurement mechanism 1010 and a controller 1011. The color meter 1000 shown in FIG. As shown in FIGS. 1 and 2, the measurement mechanism 1010 includes an illumination mechanism 1020, an integrating sphere 1021, a light receiving mechanism 1022 for reflected light, and a light receiving mechanism 1023 for reference light. The illumination mechanism 1020 includes a radiation mechanism 1030, a light beam separation mechanism 1031 and an imaging optical system 1032. The radiation mechanism 1030 and the imaging optical system 1032 constitute an illumination optical system. The beam bundle separating mechanism 1031 and the light receiving mechanism 1023 for reference light constitute a reference optical system. The integrating sphere 1021 and the light receiving mechanism 1022 for reflected light constitute a light receiving optical system.

The radiation mechanism 1030 emits a diffused beam. The diffuse beam bundle is a beam bundle made uniform by diffuse reflection, and preferably a beam bundle made uniform by diffuse multiple reflection. The beam bundle separation mechanism 1031 separates the emitted diffuse beam bundle into a beam bundle 1041 for illumination light and a beam bundle 1042 for reference light. The imaging optical system 1032 forms an image of the light beam 1041 of the illumination light. Thereby, the illumination mechanism 1020 illuminates the sample with the light beam 1041 of the illumination light.

The integrating sphere 1021 diffuses and reflects the light beam 1043 of the reflected light reflected by the sample and then guides it to the light receiving mechanism 1022 for the reflected light. The light receiving mechanism 1022 for reflected light receives the reflected light bundle 1043 and outputs the measurement results of the tristimulus values X, Y, and Z of the reflected light. The reference light receiving mechanism 1023 receives the reference light beam 1042 and outputs the measurement results of the tristimulus values X, Y, and Z of the reference light. Thereby, the measurement mechanism 1010 outputs the measurement result of the tristimulus values X, Y, and Z of the reflected light and the measurement result of the tristimulus values X, Y, and Z of the reference light.

The controller 1011 controls the radiation of the diffuse light beam by the radiation mechanism 1030. Further, the controller 1011 acquires the measurement results of the tristimulus values X, Y, and Z of the reflected light and the measurement results of the tristimulus values X, Y, and Z of the reference light, and the tristimulus values X, Y, and Z of the reflected light. The color value is derived from the measurement result. When the color value is derived, correction based on the measurement results of the tristimulus values X, Y and Z of the reference light is performed. This makes the color value less susceptible to illumination light fluctuations.

(2) Radiation mechanism The radiation mechanism 1030 includes a pulse xenon lamp 1050, a reflector 1051, and a diffusion plate 1052. The pulse xenon lamp 1050 emits a light beam. The reflector 1051 diffusely reflects the light beam. The diffusing plate 1052 diffuses the light beam into a diffused beam beam.

The pulse xenon lamp 1050 emits flash light. When flash is emitted, the sample is illuminated with a large amount of light in a short time, improving the signal-to-noise ratio of the measurement. The pulse xenon lamp 1050 may be replaced with another type of light source. For example, the pulse xenon lamp 1050 may be replaced with a tungsten lamp, a light emitting diode, or the like.

The reflector 1051 has a diffuse reflection surface 1060. The reflector 1051 may be replaced with a reflector having a shape that is difficult to say as an umbrella.

When the pulse xenon lamp 1050 emits a light beam, the light beam emitted toward the diffusion plate 1052 is diffused to the diffusion plate 1052 to be a diffusion light beam. The light beam emitted toward the diffuse reflection surface 1060 is diffused and reflected by the diffuse reflection surface 1060 to form a diffuse light beam, and the light beam emitted from the diffuse reflection surface 1060 toward the diffusion plate 1052 is diffused. It is diffused by 1052 and is made into a further uniformed diffused light bundle. Thereby, the light flux emitted from the pulse xenon lamp 1050 is efficiently used.

The pulse xenon lamp 1050 is a discharge lamp. In a discharge lamp, since the discharge path differs for each flash radiation, the flash radiation source differs for each flash radiation. In the radiation mechanism 1030, the light flux emitted from the pulse xenon lamp 1050 is diffusely reflected by the diffuse reflection surface 1060 and diffused by the diffuser plate 1052, so that the diffuse light flux is not easily affected by the flash radiation source.

(3) Ray bundle separating mechanism As shown in FIGS. 2 and 3, the ray bundle separating mechanism 1031 includes a rectangular tubular structure 1070 and an attachment mechanism 1071.

A space 1080 formed in the rectangular tube-shaped structure 1070 is defined on the inner peripheral surface 1090 of the rectangular tube-shaped structure 1070, and has an incident port 1100 at one end and an output port 1101 at the other end. The shape of the cross section perpendicular to the optical axis direction indicated by the arrow 1110 in the space 1080 is a rectangular shape, and is constant even when going in the optical axis direction. The space 1080 extends straight in the optical axis direction and extends from the entrance 1100 to the exit 1101. When the cross-sectional shape of the space 1080 is constant and the space 1080 extends straight, the entire exit port 1101 is seen from the entrance port 1100. When the entire exit port 1101 is seen from the entrance port 1100, there is a light flux that enters the entrance port 1100, travels through the space 1080 without being reflected by the inner peripheral surface 1090, and exits from the exit port 1101. When the cross-sectional shape of the space 1080 is not constant or when the space 1080 does not extend straight, the entire exit port 1101 may not be seen through the entrance port 1100. However, even when a part of the exit port 1101 is seen through the entrance port 1100, there is a light beam that enters the entrance port 1100, travels through the space 1080 without being reflected by the inner peripheral surface 1090, and exits from the exit port 1101. To do. When one position is seen from another position, it means that there is no light shielding object on the straight line connecting one position and the other position, and that the light beam directly reaches the one position from the other position. Say.

The inner peripheral surface 1090 has a diffuse reflection surface 1120. Desirably, the entire inner peripheral surface 1090 is the diffuse reflection surface 1120, but the inner peripheral surface 1090 may have a slight surface that is not the diffuse reflection surface 1120.

The openings 1130, 1131 and 1132 formed in the rectangular tubular structure 1070 have inlets 1140, 1141 and 1142 at one end and outlets 1150, 1151 and 1152 at the other ends, respectively. The inner peripheral surface 1090 of 1070 extends to the outer peripheral surface 1091 of the rectangular tubular structure 1070. The inlets 1140, 1141 and 1142 are in the inner peripheral surface 1090. Outlets 1150, 1151, and 1152 are on the outer peripheral surface 1091. Diffuse reflecting surface 1120 is seen from each of outlets 1150, 1151, and 1152. The openings 1130, 1131 and 1132 extend in a direction perpendicular to the optical axis direction. When the diffuse reflection surface 1120 is seen through each of the exits 1150, 1151, and 1152, the light enters the entrance 1100, travels through the space 1080, and is diffusely reflected by the diffuse reflection surface 1120 while traveling through the space 1080, and the entrances 1140, 1141. And 1142, travel through apertures 1130, 1131, and 1132, and exit from exits 1150, 1151, and 1152. The openings 1130, 1131, and 1132 may be replaced with slit-shaped openings that connect the openings 1130, 1131, and 1132.

The diffused light beam radiated by the radiation mechanism 1030 is incident on the entrance 1100. When the diffused light beam is incident on the incident port 1100, the light beam traveling in the direction of looking through the output port 1101 travels through the space 1080 without being diffusely reflected by the diffuse reflection surface 1120, and is emitted from the output port 1101. Of the light beam 1041. In addition, the light beam traveling in a direction other than the direction through which the exit port 1101 is seen travels through the space 1080 and is diffused and reflected by the diffuse reflection surface 1120 while traveling through the space 1080, and enters the entrances 1140, 1141 and 1142, and the openings 1130, 1131 and Proceeding 1132, the light exits from the exits 1150, 1151, and 1152 to become a light beam 1042 of reference light. When the light beam traveling in a direction other than the direction through which the exit port 1101 is viewed becomes the light beam 1042 of the reference light, the light beam that cannot be the light beam 1041 of the illumination light becomes the light beam 1042 of the reference light, and the light beam of the illumination light The beam bundle 1042 of the reference light is obtained without affecting the light quantity of the bundle 1041.

The light beam that enters the incident port 1100, travels through the space 1080, is diffusely reflected by the diffuse reflection surface 1120 while traveling through the space 1080, and the light beam emitted from the output port 1101 may be part of the light beam 1041 of the illumination light. . This improves the measurement signal-to-noise ratio.

The entrance 1100 is not seen through the exits 1150, 1151 and 1152. When the entrance 1100 is not seen through the exits 1150, 1151 and 1152, the light bundle does not directly reach the exits 1150, 1151 and 1152 from the entrance 1100, and the light bundle 1042 of the reference light is made uniform.

When it is desired to increase the amount of the light beam 1042 of the reference light, the space 1080 is extended in the optical axis direction in order to increase the area of the diffuse reflection surface 1120 seen from the exits 1150, 1151, and 1152. The diameters of 1130, 1131 and 1132 are enlarged. This improves the measurement signal-to-noise ratio. Since the amount of the light beam 1042 of the reference light is proportional to the product of the area of the entrance 1100 and the length of the space 1080 in the optical axis direction, the illumination mechanism 1020 excessively increases the light amount of the light beam 1042 of the reference light. It will never grow.

The square cylindrical structure 1070 may be replaced with another type of structure. For example, the rectangular tubular structure 1070 may be replaced with a cylindrical structure.

A light receiving mechanism 1023 for reference light is attached to the attachment mechanism 1071.

(4) Imaging Optical System The imaging optical system 1032 includes a field stop 1160, an aperture stop 1161, a lens 1162, and a lens barrel 1163 as shown in FIG. The field stop 1160 and the aperture stop 1161 limit the beam bundle 1041 of the illumination light. The lens 1162 forms an image of the light beam 1041 of the illumination light. The lens barrel 1163 supports the field stop 1160, the aperture stop 1161, and the lens 1162. The field stop illuminated by the beam bundle 1041 of the illumination light is adjusted by the field stop 1160. The numerical aperture is adjusted by the aperture stop 1161.

Optical elements other than the field stop 1160, the aperture stop 1161, and the lens 1162 may be added to the imaging optical system 1032. For example, as shown in FIG. 6, a diffusion plate 1164 may be added in front of the aperture stop 1161.

The imaging optical system 1032 may be replaced with a collimating optical system that collimates the light beam 1041 of the illumination light.

(5) Integrating Sphere The integrating sphere 1021 is a hollow spherical structure as shown in FIGS.

The space 1170 formed in the integrating sphere 1021 is defined on the inner surface 1180 of the integrating sphere 1021. The shape of the space 1170 is spherical. A sample window 1190 formed on the integrating sphere 1021 is seen from an illumination window 1191 formed on the integrating sphere 1021. The sample window 1190 and the illumination window 1191 are not seen through the light receiving window 1192 formed in the integrating sphere 1021. An illumination mechanism 1020 is coupled to the illumination window 1191. A light receiving mechanism 1022 for reflected light is attached to the light receiving window 1192.

The inner surface 1180 has a diffuse reflection surface 1200. Desirably, the entire inner surface 1180 is the diffuse reflection surface 1200, but the inner surface 1180 may have a slight surface that is not the diffuse reflection surface 1200.

When the illumination mechanism 1020 emits a light beam 1041 of illumination light, the light beam 1041 of illumination light enters the illumination window 1191, travels through the space 1170 without being reflected by the inner surface 1180, and reaches the sample window 1190. When there is a sample in the sample window 1190, the sample is illuminated by the beam bundle 1041 of the illumination light reaching the sample window 1190, and the sample reflects the beam bundle 1043 of the reflected light. The reflected light bundle 1043 propagates through the space 1170, is diffusely reflected by the diffuse reflection surface 1200 while propagating through the space 1170, and exits from the light receiving window 1192.

(6) Light receiving mechanism for reflected light The light receiving mechanism 1022 for reflected light includes a sensor unit 1210 as shown in FIG.

The sensor unit 1210 includes filters 1220, 1221 and 1222, stops 1230, 1231 and 1232, light receiving sensors 1240, 1241 and 1242, and a structure 1250.

The filters 1220, 1221, and 1222 are inserted into holes 1260, 1261, and 1262 formed in the structure 1250, respectively, and are supported by the structure 1250. The apertures 1230, 1231, and 1232 are inserted into holes 1260, 1261, and 1262 formed in the structure 1250, respectively, and are supported by the structure 1250. The light receiving sensors 1240, 1241, and 1242 are inserted into holes 1260, 1261, and 1262 formed in the structure 1250, respectively, and are supported by the structure 1250.

The diaphragm 1270, the filter 1220, the diaphragm 1230, and the light receiving sensor 1240 formed on the structure 1250 constitute a measurement system that measures the stimulus value X. The diaphragm 1271, the filter 1221, the diaphragm 1231, and the light receiving sensor 1241 formed on the structure 1250 constitute a measurement system that measures the stimulus value Y. The diaphragm 1272, the filter 1222, the diaphragm 1232, and the light receiving sensor 1242 formed in the structure 1250 constitute a measurement system that measures the stimulus value Z.

The common points of the measurement system that measures the stimulus value X, the measurement system that measures the stimulus value Y, and the measurement system that measures the stimulus value Z will be described by taking a measurement system that measures the stimulus value Y as an example.

The aperture 1271, the filter 1221, the aperture 1231, and the light receiving sensor 1241 are arranged in the order described.

When the reflected light beam 1043 enters the hole 1261, the reflected light beam 1043 passes through the aperture 1261 and passes through the aperture 1271, the filter 1221, and the aperture 1231 in the order described. The light receiving sensor 1241 receives the light. The diaphragms 1271 and 1231 limit the beam bundle 1043 of the reflected light. The light receiving sensor 1241 receives the reflected light bundle 1043 and outputs a signal corresponding to the amount of received light. Thereby, the stimulus value Y is measured. By the apertures 1271 and 1231, the incident angle of the reflected light beam 1043 to the filter 1221 is reduced. That is, the reflected light bundle 1043 is incident on the filter 1221 substantially perpendicularly.

The operating angle θ 1 of the sensor unit 1210, that is, the opening angle θ 1 of the light beam passing through the apertures 1271 and 1231, the light beam 1041 of the illumination light incident on the illumination window 1191 is not received by the light receiving sensor 1241 and the reflected light beam The bundle 1043 is set not to be diffusely reflected by the diffuse reflection surface 1200 and received by the light receiving sensor 1241. As a result, the light flux 1043 of the reflected light is uniformly mixed by diffuse reflection and then received by the light receiving sensor 1241. The opening angle θ1 is set large within a range that satisfies this condition, and is set to about 40 °, for example. Thereby, the light flux 1043 of the reflected light is taken in from a wide range of the diffuse reflection surface 1200, and the measurement signal-to-noise ratio is improved.

(7) Light receiving mechanism for reference light The light receiving mechanism 1023 for reference light includes a diffusion plate 1280 and a sensor unit 1281 as shown in FIG.

The diffusion plate 1280 is disposed between the openings 1130, 1131, and 1132 and the sensor unit 1281, and diffuses the light beam 1042 of the reference light.

The sensor unit 1281 includes filters 1290, 1291 and 1292, stops 1300, 1301 and 1302, light receiving sensors 1310, 1311 and 1312, and a structure 1320. In the structure 1320, apertures 1330, 1331 and 1332 are formed, and holes 1340, 1341 and 1342 are formed.

The sensor unit 1281 is the same type as the sensor unit 1210. The sensor unit 1281 being the same type as the sensor unit 1210 reduces the manufacturing cost of the color meter 1000.

When the reference light receiving mechanism 1023 receives the light beam 1042 of the reference light, the diffusion plate 1280 diffuses the light beam 1042 of the reference light. The diffused beam of reference light 1042 is incident on the holes 1340, 1341 and 1342. The diffuser plate 1280 causes a part of the light beam that travels in a direction other than the direction from the outlets 1150, 1151, and 1152 to the light receiving sensors 1310, 1311, and 1312 to the light receiving sensors 1310, 1311, and 1312, thereby improving the measurement signal-to-noise ratio. The

When the sensor unit 1281 is the same type as the sensor unit 1210, the sensor unit 1281 includes the diaphragms 1300, 1301, and 1302 and the diaphragms 1330, 1331, and 1332, so that the light receiving sensors 1310, 1311, and 1312 are connected from the outlets 1150, 1151, and 1152. Installed away. When the light receiving sensors 1310, 1311, and 1312 are installed apart from the outlets 1150, 1151, and 1152, the light flux that goes in a direction other than the direction from the outlets 1150, 1151, and 1152 toward the light receiving sensors 1310, 1311, and 1312 increases. The light flux received by the light receiving sensors 1310, 1311 and 1312 decreases, and the measurement signal-to-noise ratio deteriorates. The diffuser plate 1280 suppresses such a decrease in received light flux.

The sensor unit 1281 may be replaced with a sensor unit that is not the same type as the sensor unit 1210. When the sensor unit 1281 is replaced with a sensor unit that is not the same type as the sensor unit 1210, the sensor unit 1281 is preferably replaced with a sensor unit without an aperture.

The schematic diagram of FIG. 7 shows a cross section of the light beam separation mechanism and the light receiving mechanism for reference light when the sensor unit is replaced with a sensor unit that does not have a diaphragm.

The sensor unit 1350 shown in FIG. 7 includes light receiving sensors 1360, 1361, and 1362 and filters 1370, 1371, and 1372. The light receiving sensors 1360, 1361 and 1362 are installed close to the outlets 1150, 1151 and 1152.

(8) Change of measurement method Each measurement method of the light receiving mechanism 1022 for reflected light and the light receiving mechanism 1023 for reference light may be changed from the tristimulus value method to the spectroscopic method. When the measurement method of the light receiving mechanism 1022 for reflected light and the light receiving mechanism 1023 for reference light is a spectroscopic method, the light receiving mechanism 1022 for reflected light and the light receiving mechanism 1023 for reference light have wavelength dispersion such as a diffraction grating and a prism. Each is equipped with a polychromator equipped with elements. When the measurement method of the light receiving mechanism 1022 for reflected light and the light receiving mechanism 1023 for reference light is changed to the spectroscopic method, the light receiving mechanism 1022 for reflected light and the light receiving mechanism 1023 for reference light each measure a spectral spectrum. The colorimeter becomes a spectrocolorimeter. Colorimeters are broadly classified into colorimeters and spectral colorimeters.

(9) Measurement of transmitted light The light receiving mechanism 1022 for reflected light may be replaced with a light receiving mechanism for transmitted light. The light receiving mechanism for transmitted light receives the light bundle of transmitted light that has passed through the sample, and outputs the measurement results of the tristimulus values X, Y, and Z of the transmitted light.

(10) Controller The controller 1011 is an embedded computer, and performs control by executing firmware. All or part of the control by the controller 1011 may be realized by hardware without software.

The controller 1011 controls the pulse xenon lamp 1050 and causes the pulse xenon lamp 1050 to emit a light beam. Further, the controller 1011 acquires the tristimulus values X, Y and Z of the reflected light from the light receiving sensors 1240, 1241 and 1242, respectively, when the pulse xenon lamp 1050 emits the light bundle, and the tristimulus values of the reference light. X, Y, and Z are acquired from the light receiving sensors 1310, 1311, and 1312, respectively. Furthermore, the controller 1011 derives a color value from the tristimulus values X, Y, and Z of the reflected light. The color values are expressed in Munsell color system, L * a * b * color system, L * C * h color system, Hunter Lab color system, XYZ color system, and the like. When the color value is derived, correction by the tristimulus values X, Y and Z of the reference light is performed.

(11) Beam bundle uniformizing mechanism Each of the reflector 1051, the beam bundle separating mechanism 1031 and the integrating sphere 1021 constitutes a beam bundle uniformizing mechanism. The reflector 1051 makes the light flux emitted by the pulse xenon lamp 1050 uniform. The beam bundle separation mechanism 1031 makes the beam bundle 1042 of the reference light uniform when separating the beam bundle emitted by the radiation mechanism 1030 into the beam bundle 1041 of illumination light and the beam bundle 1042 of reference light. The integrating sphere 1021 makes the reflected light beam 1043 uniform. In the reflector 1051, the light bundle separation mechanism 1031, and the integrating sphere 1021, the light bundle is made uniform by diffusely reflecting or diffusely reflecting the light bundle on the diffuse reflection surfaces 1060, 1120, and 1200, respectively. In the uniformization of the light beam, the change in the intensity of the light beam due to the radiation direction is reduced.

The light beam uniformizing mechanism is configured by forming a film on the inner surface of a base material made of white resin. The coating is formed by painting a transparent matte paint on the inner surface of the substrate.

Hereinafter, the configuration of the light beam uniformizing mechanism will be described using the integrating sphere 1021 as an example.

The schematic diagram of FIG. 8 shows a cross section of the integrating sphere. FIG. 8 shows an enlarged view of the vicinity of the diffuse reflection surface.

The integrating sphere 1021 includes a base material 1400 and coatings 1401 and 1402 as shown in FIG.

A space 1410 is formed in the base material 1400. The space 1410 is spherical. The shape of the space formed in the light flux uniformizing mechanism changes according to the light flux uniformizing mechanism. A space 1410 is defined on the inner surface 1420 of the substrate 1400. The base material 1400 is made of a white resin.

The coating 1401 is formed by coating a transparent matte paint on the inner surface 1420 of the substrate 1400, and diffuses the light beam. A surface 1430 of the coating 1401 is exposed to a space 1170 formed in the integrating sphere 1021. The back surface 1431 of the coating 1401 is in close contact with the inner surface 1420 of the substrate 1400.

The coating film 1402 is formed by coating the outer surface 1421 of the base material 1400 with a paint, and becomes a light shielding film that covers the outer surface 1421 of the base material 1400. The coating 1402 makes it difficult for unnecessary light to enter the space 1410 even when the base material 1400 transmits light. The paint applied to the outer surface 1421 of the substrate 1400 desirably includes black pigment or metal particles. The light shielding property of the coating 1402 is improved by the black pigment or the metal particles. The coating 1402 may be omitted.

The coating 1402 may be replaced with another type of light shielding material. For example, the coating 1402 may be replaced with a light shielding member that contacts the outer surface 1421 of the substrate 1400. The light shielding member is preferably made of a resin containing a black pigment or metal particles. In the case where a light shielding member made of resin is provided, the base material 1400 and the light shielding member may be integrally formed by two-color molding.

When a light beam is incident on the diffuse reflection surface 1200, the incident light beam generally passes through the coating 1401, the light beam that has passed through the coating 1401 is reflected by the substrate 1400, and the reflected light beam passes through the coating 1401. The light beam that has passed through is emitted. There may be a light bundle propagating along a different path. When the light beam passes through the coating 1401, the light beam is diffused. The base material 1400 has a function of reflecting the light beam among the functions of the diffuse reflection surface 1200 that diffusely reflects the light beam. The coating 1401 has a function of diffusing the light bundle among the functions of the diffuse reflection surface 1200 that diffusely reflects the light bundle.

(12) Uniformity of reflectance In the integrating sphere 1021, the base material 1400 has a function of reflecting the light flux, and therefore the film thickness of the coating 1401 does not affect the reflectance of the diffuse reflection surface 1200. For this reason, the reflectance of the diffuse reflection surface 1200 is determined by the reflectance of the inner surface 1420 of the substrate 1400.

In the case where the base material 1400 made of white resin has a function of reflecting the light flux, the dispersion of the reflectance of the inner surface 1420 of the base material 1400 is small and the reflectance of the inner surface 1420 of the base material 1400 is high. The variation in reflectance is small, and the reflectance of the diffuse reflection surface 1200 is high. The reason why the variation in the reflectance of the inner surface 1420 of the substrate 1400 is small and the reflectance of the inner surface 1420 of the substrate 1400 is high is that the substrate 1400 is made of white resin and has a sufficient thickness.

On the other hand, when the coating formed by applying the white paint has a function of reflecting the light beam, the variation in the reflectance of the diffuse reflecting surface is small and the reflectance of the diffuse reflecting surface is high. Cannot be compatible. When the coating formed by applying white paint is thickened, the reflectance of the diffuse reflection surface increases, but the variation in the film thickness of the coating increases and the variation in the reflectance of the diffuse reflection surface increases. . When the coating formed by applying a white paint is thinned, the variation in the coating thickness is reduced and the variation in the reflectance of the diffuse reflecting surface is reduced, but the reflectance of the diffuse reflecting surface is reduced. .

The small variation in the reflectance of the diffuse reflection surface 1200 contributes to increasing the ability of the integrating sphere 1021 to uniformize the light flux. The high reflectance of the diffuse reflection surface 1200 also contributes to increasing the ability of the integrating sphere 1021 to make the light flux uniform. This is because when the reflectance of the diffuse reflection surface 1200 is high, the number of times that the light flux is diffusely reflected can be increased.

When the substrate 1400 is white, since the change due to the wavelength of the reflectance of the inner surface 1420 of the substrate 1400 is small, the change due to the wavelength of the reflectance of the diffuse reflection surface 1200 is small, and the spectral spectrum of the light bundle is the light bundle. Is less affected by the number of times it is diffusely reflected.

The variation in the reflectance of the diffuse reflection surface 1200 includes a variation in one integrating sphere 1021 and a variation among many integrating spheres 1021. When the variation in one integrating sphere 1021 is small, the ability to make the light beam uniform in one integrating sphere 1021 is improved. When the variation between the many integrating spheres 1021 is small, the variation in the ability to uniformize the light flux among the many integrating spheres 1021 becomes small.

When the resin is produced in large quantities using a large amount of raw materials, the dispersion of the mixing ratio of the plurality of raw materials is reduced and the unevenness of mixing of the plurality of raw materials is reduced, so that the resin becomes uniform. On the other hand, when the resin is produced in a small amount using a small amount of raw materials by self-mixing, custom order, etc., the dispersion of the mixing ratio of the plurality of raw materials becomes large, and the mixing unevenness of the plurality of raw materials increases. Becomes uneven. The white resin is uniform because it is produced in large quantities using a large amount of raw materials. When the white resin is uniform, the base material 1400 is uniform, so that the variation in the reflectance of the diffuse reflection surface 1200 is reduced.

(13) Uniformity of diffusivity Transparent matte paint is uniform because it is produced in large quantities using a large amount of raw materials. For this reason, the dispersion | variation in the diffusibility of the film 1401 is small.

(14) Inexpensive production of base material White resin is inexpensive because it is produced in large quantities using a large amount of raw materials. Thereby, the base material 1400 can be manufactured at low cost.

Since the base material 1400 is made of resin, a molded product formed by a mold can be used as the base material 1400 as it is. It is not necessary to change the shape by machining. Thereby, the base material 1400 can be manufactured at low cost.

Since the base material 1400 is made of a resin, it can be manufactured at low cost even when an accessory is provided. The attachment includes a coupling mechanism for coupling other components.

Since the coating 1401 has a function of diffusing the light flux, the inner surface 1420 of the base material 1400 may not be a uniform rough surface or a uniform mirror surface. For this reason, it is not necessary to perform special processing on the molding surface of the mold, and the mold can be manufactured using a general material. Thereby, a metal mold | die can be manufactured cheaply and the base material 1400 can be manufactured cheaply.

(15) Inexpensive formation of coating The function of diffusing the light flux is manifested by the formation of irregularities on the surface 1430 of the coating 1401 by the fine particles contained in the transparent matte paint. Therefore, the diffusibility depends on the unevenness of the surface 1430 of the coating 1401 and does not depend on the thickness of the coating 1401. Even when the coating 1401 is thin, the coating 1401 can have a function of diffusing the light beam.

When the coating film 1401 is thin, the transparent matte paint necessary for forming the coating film 1401 is reduced, so that the coating film 1401 can be formed at low cost.

Since transparent matte paint is in great demand, it is produced in large quantities using a large amount of raw materials. For this reason, transparent matte paint is inexpensive and the coating 1401 can be formed inexpensively.

(16) White resin The white resin includes a base resin, a white pigment, an inorganic filler, and the like. The base resin, white pigment, inorganic filler and the like are mixed uniformly. The white resin is a compounding type in which a white pigment, an inorganic filler and the like are blended with a base resin. Since the paint adheres to the surface of the compounding type white resin without performing any special ground treatment, the coating 1401 is inexpensive when the coating 1401 is formed on the inner surface 1420 of the base material 1400 made of the compounding type white resin. Can be formed.

The compounded white resin may be replaced with a resin that exhibits a white color that is not a compounded type. The white resin is a crystalline resin that is a thermoplastic resin and has a high crystallinity or a large crystal size, and is preferably polystyrene or polyacetal.

The reflectance of the white resin is desirably 60% or more, and more desirably 97% or more. When the reflectance of the white resin is 60% or more, a person recognizes the white resin as white. The reflectance of 60% corresponds to the reflectance of Palegrey, which is the achromatic color closest to White in the BCRA tile used as the reference color sample of the colorimeter.

A reflectance of 97% or more is realized when the white pigment is a titanium oxide powder described later.

When the reflectivity of the inner surface 1420 of the base material 1400 is high, a decrease in the light amount of the light beam when the diffuse reflection surface 1200 diffusely reflects the light beam becomes small, so that the integration with respect to the light amount of the light beam incident on the integrating sphere 1021 is performed. The integrating sphere efficiency, which is the ratio of the amount of light beams emitted from the sphere 1021, increases. When the integrating sphere efficiency is high, the measurement signal-to-noise ratio increases, so that the measurement accuracy increases.

(17) Base resin The base resin is desirably a thermoplastic resin or a thermosetting resin.

Desirably, the thermoplastic resin is an acrylic resin, a polycarbonate resin, or a liquid crystal polymer resin. The acrylic resin is desirably a polymethyl methacrylate resin, such as Acrypet (registered trademark) VH NW401 manufactured by Mitsubishi Rayon Co., Ltd. The polycarbonate resin is, for example, Iupilon (registered trademark) EHR3100 manufactured by Mitsubishi Engineering Plastics. The liquid crystal polymer resin is desirably a liquid crystal polyester resin, for example, SUMIKASUPER LCP manufactured by Sumitomo Chemical Co., Ltd.

Acrylic resin has high light resistance. For this reason, when the base resin is an acrylic resin, the base material 1400 is not easily faded even when the light beam is irradiated for a long time or many times, and the measurement accuracy is not easily lowered over time.

Polycarbonate resin has high heat resistance. Therefore, when the base resin is a polycarbonate resin, the base material 1400 is unlikely to deteriorate even when the temperature rises due to irradiation with a light bundle having a large amount of light. A polycarbonate resin having high light resistance developed for a light emitting diode backlight may be used.

The liquid crystal polymer resin has high heat resistance and high self-extinguishing properties (flame retardant). Therefore, in the case where the base resin is a liquid crystal polymer resin, the base material 1400 is not easily deteriorated even when a light bundle having a large amount of light is irradiated and the temperature rises. The substrate 1400 does not burn even when overheated.

The thermosetting resin is desirably an unsaturated polyester resin or an epoxy resin. The unsaturated polyester resin is, for example, Fulbright CE6000 manufactured by Panasonic Corporation. The epoxy resin is, for example, white mold resin CEL-W-7005 for light-emitting diode reflector manufactured by Hitachi Chemical Co., Ltd. An unsaturated polyester resin or epoxy resin having high light resistance developed for a light emitting diode chip may be used.

(18) White pigment The white pigment is preferably at least one selected from the group consisting of titanium oxide powder, zinc oxide powder, barium sulfate powder, and calcium carbonate powder, and more preferably titanium oxide powder. It is.

Since the refractive index of titanium oxide is high, when the white pigment is a titanium oxide powder, the reflectance of the white resin increases even if the amount of white pigment contained in the white resin is small. Titanium oxide powder is readily available and inexpensive.

Titanium oxide has a problem of absorbing a short wavelength component belonging to a short wavelength region having a wavelength of about 420 nm or less. However, this problem has little effect on the measurement accuracy. This point will be described.

Since titanium oxide absorbs light having energy greater than or equal to the band gap, the reflectance of titanium oxide decreases in the short wavelength region where the wavelength is about 420 nm or less. Since the reflectance of titanium oxide decreases in the short wavelength region, when the white pigment is a titanium oxide powder, the reflectance of the white resin decreases in the short wavelength region as shown in FIG. When the reflectance of the white resin is reduced in the short wavelength range, the short wavelength component contained in the light bundle emitted from the integrating sphere 1021 is reduced, so that the measurement signal-to-noise ratio is reduced in the short wavelength range. When the measurement signal-to-noise ratio decreases in the short wavelength region, the measurement accuracy generally decreases. However, when stimulus values that reflect the color matching functions xbar, ybar, and zbar that reproduce the sensitivity of the eye are required, the measurement accuracy is reduced regardless of whether the measurement method is the spectroscopic method or the tristimulus value method. Almost no problem.

When the measurement method is a spectroscopic method, the spectroscopic spectrum is measured in the visible light wavelength range where the wavelength is approximately 380 to 780 nm, and the product of the spectroscopic spectrum and each of the color matching functions xbar, ybar and zbar is integrated with respect to the wavelength. And tristimulus values are determined. However, since the color matching functions xbar, ybar, and zbar do not become zero in the short wavelength region but take small values, the influence of the short wavelength region of the spectral spectrum on the tristimulus values is small. Since the influence of the short wavelength region of the spectral spectrum on the tristimulus value is small, even when the signal-to-noise ratio of the measurement is decreased in the short wavelength region, the measurement accuracy of the tristimulus value hardly decreases.

When the measurement method is a tristimulus value method, the amount of light flux that has passed through a color filter with a spectral transmittance determined so as to obtain a stimulus value reflecting the color matching functions xbar, ybar, and zbar is measured, Tristimulus values are required. Since the color matching functions xbar, ybar and zbar do not become zero in the short wavelength region but take small values, the color filter hardly transmits the short wavelength component. Since the color filter hardly transmits the short wavelength component, the influence of the short wavelength component on the tristimulus value is small. Since the influence of the short wavelength component on the tristimulus value is small, even when the signal-to-noise ratio of the measurement is lowered in the short wavelength region, the measurement accuracy of the tristimulus value is hardly lowered.

(19) Transparent matte paint When the transparent matte paint is a two-component paint, it contains a main agent (main component resin), a curing agent, a diluent and a matting agent. The main agent, curing agent, diluent and matting agent are mixed uniformly. The transparent matte paint may be a one-component paint. The transparent matte paint may not belong to the category of one-component paint and two-component paint.

(20) Two-component paint The two-component paint includes a main agent (main component resin) and a curing agent. The main agent and the curing agent are provided in an unmixed state with each other and are mixed with each other immediately before painting. When the transparent matte paint is a two-component paint, the mixed liquid of the main agent and the curing agent is coated on the inner surface 1420 of the base material 1400, and a coating film is formed on the inner surface 1420 of the base material 1400. When the main agent and the curing agent chemically react with each other in the coating film, the coating film is cured and a coating film 1401 is formed. The mixed solution may contain a diluent such as thinner. By the diluent, the viscosity of the mixed solution is adjusted to be suitable for coating, and the drying speed of the coating film is adjusted to be suitable for forming the coating film 1401.

When the transparent matte paint is a two-component paint, a complex molecular structure is formed in the film 1401, so the film 1401 is strong and adheres to the ground. For this reason, when the transparent matte paint is a two-component paint, the temperature or humidity fluctuates and the film 1401 expands or contracts, or the film 1401 receives an impact during use or transportation. Hard to damage.

When the two-component paint is classified according to the main agent, the two-component paint is classified into an acrylic resin paint, a urethane resin paint, an epoxy resin paint, a silicon resin paint, a fluororesin paint, and the like. The urethane resin paint includes an acrylic urethane resin paint whose main component is an acrylic resin and whose curing agent is a polyisocyanate resin. The silicone resin paint includes an acrylic silicone resin paint in which an acrylic resin and a silicone resin are co-condensed.

When the two-component paint is an acrylic resin paint, the coating 1401 has high transparency and high light resistance, and therefore, the variation in the transmittance of the coating 1401 does not increase even when the variation in the thickness of the coating 1401 is large. For this reason, when the two-component paint is an acrylic resin paint, the variation in the reflectance of the diffuse reflection surface 1200 does not increase.

When the two-component paint is an acrylic resin paint, the film 1401 has high light resistance, and therefore the film 1401 is hardly yellowed. For this reason, when the two-component paint is an acrylic resin paint, the measurement accuracy is unlikely to decrease even if time passes.

When the two-component paint is a urethane resin paint or an epoxy resin paint, the film 1401 has high heat resistance, and therefore the film 1401 is not easily deteriorated even when a light bundle having a large amount of light is irradiated and the temperature rises. For this reason, when the two-component paint is a urethane resin paint or an epoxy resin paint, the measurement accuracy is unlikely to deteriorate even if time elapses.

When the two-component paint is a silicon resin paint or a fluororesin paint, since the coating 1401 has high contamination resistance, the coating 1401 is formed even when the sample is powder or liquid and the scattered sample enters the space 1170. Keep clean.

(21) Matting agent The matting agent preferably contains one or more types selected from the group consisting of silica fine particles, calcium carbonate fine particles and calcium phosphate fine particles. The matting agent forms a fine unevenness on the surface of the coating 1401 after the matting paint is applied and the coating film is dried, and gives the coating 1401 a function of diffusing the light beam.

The lower limit of the particle diameter of the fine particles is desirably 0.2 μm. The lower limit of the particle diameter of the fine particles of 0.2 μm is about ½ of the lower limit wavelength of the visible light wavelength range in which the wavelength used in the color meter 1000 is 380 to 780 nm. The lower limit of the particle size is selected in this way because, according to Gustav-Me's scattering theory, particles scatter light most efficiently when the particle size is about half the wavelength of light. is there.

The upper limit of the particle diameter of the fine particles is not limited, but is selected to be smaller than the film thickness of the coating 1401.

(22) Film thickness The film thickness of the film 1401 is preferably 100 μm or less, more preferably several tens of μm, and particularly preferably 25 ± 15 μm. When the film thickness of the coating film 1401 is within these ranges, the variation in the film thickness of the coating film 1401 is difficult to increase.

The film thickness of the coating 1401 of 25 μm is standard when the coating 1401 is formed by a single coating. When the thickness of the coating 1401 is 25−15 = 10 μm or more, the coating 1401 is uniformly formed on the inner surface 1420 of the base material 1400, and the coating 1401 is formed in an island shape so that a part of the inner surface 1420 of the base material 1400 is formed. It is possible to avoid that the coating film 1401 is not formed. When the film thickness of the film 1401 is 25 + 15 = 40 μm or less, it can be avoided that the matting agent settles and the surface of the film 1401 is not formed uneven until the coating film is dried. The allowable variation width of ± 15 μm is ± 60% of the target film thickness of 25 μm. Thus, when the allowable variation width is wide, the allowable width of the coating condition is widened, so that the yield rate is improved and the coating 1401 can be formed at a low cost.

(23) Comparison with other diffuse reflection surface forming methods Instead of forming the coating 1401 on the inner surface 1420 of the base material 1400, the texture formed on the molding surface of the mold is transferred to the inner surface of the base material. Alternatively, the diffuse reflection surface can be formed by sandblasting the inner surface of the substrate.

However, when the texture formed on the molding surface of the mold is transferred to the inner surface of the substrate, the texture formed on a portion of the inner surface of the substrate that is nearly parallel to the mold release direction is damaged at the time of mold release. Produce. The problem can be avoided by dividing the integrating sphere into a number of pieces, but such a division prevents the integrating sphere from being inexpensively manufactured. On the other hand, when the coating 1401 is formed on the inner surface 1420 of the substrate 1400, such a problem does not occur.

Also, when the inner surface of the base material is sandblasted, there arises a problem that the diffusibility of the diffuse reflection surface formed due to variations in processing conditions varies. On the other hand, when the coating 1401 is formed on the inner surface 1420 of the substrate 1400, the variation in the film thickness of the coating 1401 due to variations in processing conditions does not affect the diffusibility of the diffusion reflecting surface 1200. Diffusivity is difficult to vary.

(24) Specific examples The graphs in FIGS. 10 and 11 show a case where a transparent matte paint is not applied (white resin + no paint) and a case where a transparent matte paint is applied to form a film (white resin + transparent matte). The spectral reflectance of the white resin is shown for each of the paints 25 μm). FIG. 11 shows an enlarged view of the reflectance range of 90-100% in FIG. The film thickness is 25 nm.

As shown in FIG. 10 and FIG. 11, the spectral reflectance when a transparent matte paint is applied is 96% or more except for a short wavelength region where the wavelength is about 420 nm or less. It is almost the same as the spectral reflectance when not painted. This means that the base material 1400 made of white resin can take a function of reflecting the light beam, and the film thickness of the coating film 1401 formed by applying a transparent matte paint is the reflectance of the diffuse reflection surface 1200. Indicates no effect.

The graphs of FIGS. 12 and 13 show the spectral reflectance of the film formed by applying a white matte paint for each of the film thicknesses of 66 μm, 88 μm, 93 μm, 110 μm, 124 μm, 155 μm and 186 μm. The graph of FIG. 13 shows an enlarged view of the reflectance 85-95% range of FIG. The white matte paint is a mixture of a transparent matte paint and a powder of titanium oxide which is a white pigment.

As shown in FIGS. 12 and 13, when a coating is formed by applying a white matte paint, the dispersion of the coating 1401 greatly affects the reflectance of the diffuse reflection surface 1200. Moreover, in order to make the film thickness of about 90 μm, it is necessary to repeat the coating three times or four times. When coating is repeated three times or four times, the variation of the coating becomes large, and the reflectance of the diffuse reflection surface is greatly affected.

(25) Another Example The schematic diagram of FIG. 14 shows a measurement head.

The measuring head 2000 shown in FIG. 14 is the main part of a handy type colorimeter that employs a diffuse illumination and 0 ° light receiving geometry. The measurement head 2000 includes a pulse xenon lamp 2010, a reflector 2011, a diffuse reflection sphere 2012, a reflected light extraction mechanism 2013, and an optical fiber 2014. In the diffuse reflection sphere 2012, a spherical space 2020 is formed, and a sample window 2040 and an opening 2041 are formed. The space 2020 is defined on the inner surface 2050 of the diffuse reflection sphere 2012. The inner surface 2050 is formed as a diffuse reflection surface by coating a transparent matte paint on the inner surface of the substrate in the same manner as already described. The diffuse reflection sphere 2012 constitutes a light beam uniform mechanism. The pulse xenon lamp 2010, the reflector 2011, and the diffuse reflection sphere 2012 constitute an illumination optical system that illuminates the sample.

When the measurement is performed, the pulse xenon lamp 2010 emits a light beam. The emitted light beam is incident on the space 2020 after being reflected by the reflector 2011 or without being reflected by the reflector 2011. The incident light bundle is diffused and reflected by the inner surface 2050 while being propagated through the space 2020, and is made uniform. A part of the uniformed light bundle becomes a light bundle of illumination light, and illuminates the sample pressed against the sample window 2040. A part of the uniformed light bundle exits from the opening 2041 and becomes a light bundle of reference light. The beam of reflected light reflected by the sample is extracted by the reflected light extraction mechanism 2013 and guided to the light receiving mechanism by the optical fiber 2014. The reflection optical axis of the reflector 2011 is tilted slightly upward from the direction perpendicular to the central axis 2060 of the space 2020. Thereby, the light flux emitted from the pulse xenon lamp 2010 is prevented from reaching the sample window 2040 without being diffusely reflected.

As illustrated in FIG. 15, a milky white acrylic plate 2015 may be provided in the space 2020. The milky white acrylic plate 2015 diffuses the light beam when the light beam propagating through the space 2020 passes through the milky white acrylic plate 2015. The milky white acrylic plate 2015 may be replaced with another type of permeable diffusion slope. For example, the milky white acrylic plate 2015 may be replaced with ground glass.

The schematic diagram of FIG. 16 shows a cross section of the illumination mechanism.

The illumination mechanism 3000 shown in FIG. 16 constitutes an illumination optical system of a color meter. The illumination mechanism 3000 includes a pulse xenon lamp 3010, an integrating sphere 3011, a field stop 3012, a stop 3013, and an imaging optical system 3014. A spherical space 3020 is formed in the integrating sphere 3011, and an exit window 3030 is formed. A space 3020 is defined on the inner surface 3040 of the integrating sphere 3011. The inner surface 3040 is made into a diffuse reflection surface by applying a white matte paint on the inner surface of the substrate in the same manner as already described. The pulse xenon lamp 3010 is disposed in the space 3020. The integrating sphere 3011 constitutes a light flux uniformizing mechanism.

When the illumination mechanism 3000 illuminates the sample 3060, the pulse xenon lamp 3010 emits a light beam. The emitted light bundle propagates through the space 3020, and is diffused and reflected by the inner surface 3040 while being propagated through the space 3020, and is made uniform. The uniformed light beam exits from the exit window 3030. The emitted light bundle is limited by the field stop 3012. The alignment characteristics of the light beam limited by the field stop 3012 are almost complete alignment characteristics of diffused light. The limited light bundle is further limited by the aperture stop 3013. Further, the limited light beam is imaged by the imaging optical system 3014 and illuminates the sample 3060.

The schematic diagram of FIG. 17 shows a cross section of the illumination mechanism.

The illumination mechanism 4000 shown in FIG. 17 constitutes an illumination optical system of a color meter. The illumination mechanism 4000 includes a pulse xenon lamp 4010, a concave mirror 4011, a reflection plate 4012, and a collimating optical system 4013. The reflection plate 4012 is disposed so as to close the open portion 4020 of the concave mirror 4011 in the open portion 4020 of the concave mirror 4011. The reflection surface 4030 of the reflection plate 4012 is opposed to the reflection surface 4040 of the concave mirror 4011. Each of the reflecting surface 4040 of the concave mirror 4011 and the reflecting surface 4030 of the reflecting plate 4012 is made a diffusive reflecting surface by coating a transparent matte paint on the inner surface of the substrate in the same manner as already described. The “inner surface” referred to here means a surface that becomes the inner surface in the composite of the base material of the concave mirror 4011 and the base material of the reflector 4012. A hemispherical space 4060 defined by the reflecting surface 4040 of the concave mirror 4011 and the reflecting surface 4030 of the reflecting plate 4012 is formed. An exit window 4070 is formed in the reflection plate 4012. The pulse xenon lamp 4010 is disposed in the space 4060. A complex composed of the concave mirror 4011 and the reflecting plate 4012 constitutes a light beam uniformizing mechanism.

When the illumination mechanism 4000 illuminates the sample 4080, the pulse xenon lamp 4010 emits a light beam. The emitted light beam propagates in the space 4060, and is diffused and reflected uniformly by the reflecting surface 4040 of the concave mirror 4011 and the reflecting surface 4030 of the reflecting plate 4012 while propagating in the space 4060. The uniformed light beam exits from the exit window 4070. The emitted light bundle is collimated by the collimating optical system 4013 and illuminates the sample 4080.

1000 Colorimeter 1010 Measuring mechanism 1020 Illuminating mechanism 1021 Integrating sphere 1022 Light receiving mechanism for reflected light 1023 Light receiving mechanism for reference light 1030 Radiation mechanism 1031 Beam bundle separating mechanism 1032 Imaging optical system 1050 Pulse xenon lamp 1051 Reflecting umbrella 1070 Square cylindrical shape Structure 1400 Base material 1401 Coating 1402 Coating 2000 Measuring head 2012 Diffuse reflection sphere 3000 Illumination mechanism 3011 Integration sphere 4000 Illumination mechanism 4011 Concave mirror 4012 Reflector

Claims (16)

1. A base is formed with a space, having an inner surface defining the space, made of a white resin, and reflecting the light bundle;
   A coating formed by applying a transparent matte paint on the inner surface and diffusing a light beam;
   A light flux uniformizing mechanism for colorimetry.
2. The light beam homogenizing mechanism according to claim 1, wherein the white resin contains a thermoplastic resin.
3. The light beam uniformizing mechanism according to claim 2, wherein the thermoplastic resin is an acrylic resin, a polycarbonate resin, or a liquid crystal polymer resin.
4. The light beam uniformizing mechanism according to claim 1, wherein the white resin includes a thermosetting resin.
5. The light flux uniformizing mechanism according to claim 4, wherein the thermosetting resin is an unsaturated polyester resin or an epoxy resin.
6. The transparent matte paint contains a matting agent,
   6. The light flux homogenizing mechanism according to claim 1, wherein the matting agent includes at least one selected from the group consisting of silica fine particles, calcium carbonate fine particles, and calcium phosphate fine particles.
7. The substrate has an outer surface;
   The light beam uniformizing mechanism according to any one of claims 1 to 6, further comprising a light shielding member covering the outer surface.
8. The light beam uniformizing mechanism according to claim 7, wherein the light shielding object is a light shielding film formed by coating a paint on the outer surface.
9. The light beam uniformizing mechanism according to claim 7, wherein the light blocking object is a light blocking member that contacts the outer surface.
10. The light beam uniformizing mechanism according to any one of claims 1 to 9, wherein the space is spherical.
11. A light source that emits a bundle of rays;
    The light beam uniformizing mechanism according to any one of claims 1 to 10, which uniformizes the emitted light beam,
    An illumination optical system.
12. An illumination optical system according to claim 11;
    A receiving optical system;
    A colorimeter with
13. The beam bundle uniformizing mechanism according to any one of claims 1 to 10, wherein the beam bundle of reflected light reflected by the sample or the beam bundle of transmitted light that has passed through the sample is made uniform.
    A light receiving mechanism for receiving a uniform light beam of reflected light or a uniform light beam of transmitted light and outputting a measurement result;
    A light receiving optical system.
14. Illumination optics,
    A light receiving optical system according to claim 13;
    A colorimeter with
15. A beam bundle separation mechanism for separating the emitted beam bundle into a bundle of illumination light and a bundle of reference light;
    With
    The light beam separation mechanism comprises any one of the light beam uniformizing mechanisms according to claim 1,
    A reference optical system in which the beam bundle uniformizing mechanism uniformizes the beam bundle of the reference light.
16. Illumination optics,
    The reference optical system of claim 15;
    A receiving optical system;
    A colorimeter with

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