WO2016123986A1 - 曝光机自动更换滤波片装置及曝光机 - Google Patents

曝光机自动更换滤波片装置及曝光机 Download PDF

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Publication number
WO2016123986A1
WO2016123986A1 PCT/CN2015/090024 CN2015090024W WO2016123986A1 WO 2016123986 A1 WO2016123986 A1 WO 2016123986A1 CN 2015090024 W CN2015090024 W CN 2015090024W WO 2016123986 A1 WO2016123986 A1 WO 2016123986A1
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Prior art keywords
mirror
exposure machine
filter
clamping jaw
light
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PCT/CN2015/090024
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English (en)
French (fr)
Inventor
袁夏梁
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深圳市华星光电技术有限公司
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Priority to US14/901,058 priority Critical patent/US20160370554A1/en
Publication of WO2016123986A1 publication Critical patent/WO2016123986A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/006—Filter holders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Definitions

  • the invention relates to an automatic replacement filter device and an exposure machine for an exposure machine.
  • the TFT substrate and the CF substrate of the liquid crystal display device require a plurality of exposure processes to form a desired layer during the fabrication process. Exposure by an exposure machine in the prior art. In the exposure process, the filter needs to be replaced according to different factors such as the photoresist characteristics. In the replacement process, the illumination lamp of the exposure machine needs to be turned off first, and then the filter is manually loaded and unloaded after cooling, so that the operation wastes the working time. And the number of lights is turned off more, reducing the life of the light.
  • the invention provides an exposure machine automatic replacement filter device for clamping at least one filter
  • the automatic replacement filter device of the exposure machine comprises a bracket, a rotating shaft mounted on the bracket, a driving component and at least one clamping jaw, at least a clamping jaw for clamping the filter; an outer circumference of the rotating shaft corresponding to the at least one clamping jaw is provided with an extension arm, the at least one clamping jaw is mounted on the extension arm, and the driving element drives the The rotating shaft drives the extension arm to rotate, thereby driving the filter to rotate.
  • clamping jaws are four, and four extending arms are arranged on the rotating shaft.
  • the driving element is a driving motor.
  • the four extension arms are arranged in a cross shape.
  • the invention also provides an exposure machine comprising a microlens array, a plurality of filters and an automatic change filter device of the exposure machine, wherein the automatic replacement filter device of the exposure machine comprises a bracket, a rotating shaft mounted on the bracket, a driving component and At least one jaw, at least one jaw for clamping the filter; the outer circumference of the shaft corresponding to the at least one jaw is provided with an extension arm, and the at least one jaw is mounted on the extension arm
  • the exposure machine automatic replacement filter device is installed in the light-emitting direction of the microlens array, the filter on the clamping jaw is disposed opposite to the microlens array, and the driving component drives the rotating shaft to drive the extension arm Rotating, thereby driving the filter to rotate, to replace the filter corresponding to the microlens array.
  • the driving element is a driving motor.
  • the exposure machine comprises a control device, a collecting mirror, an illumination lamp mounted on the collecting mirror, and a mirror group, wherein the collecting mirror is used for collecting light and transmitting light through the mirror group, wherein the control device uses The microlens array is controlled, the exposure machine automatically replaces the filter device, the collecting mirror and the mirror group work.
  • the concentrating mirror comprises a concentrating surface, and the illuminating surface is provided with a light lamp, and the illuminating light line is condensed and transmitted through the concentrating surface.
  • the mirror group includes a first mirror, a second mirror and a third mirror, the first mirror is opposite to the concentrating surface, and the second mirror receives the first mirror The reflected light transmits light to the third mirror, and the third mirror emits light for exposure.
  • the exposure machine includes a control device and the microlens array between the first mirror and the second mirror, and the filter of the exposure machine is located at the second mirror Between the microlens arrays.
  • the driving shaft 162 is required to drive the extension arm to rotate, thereby driving the filter to rotate, so that the required filter is aligned.
  • the microlens array realizes automatic replacement of the filter to save working time.
  • Figure 1 is a schematic illustration of an exposure machine in accordance with a preferred embodiment of the present invention.
  • FIG 2 is a schematic view of the automatic replacement filter device of the exposure machine of the present invention shown in Figure 1.
  • a preferred embodiment of the present invention provides an automatic replacement filter device for an exposure machine and an exposure machine.
  • the exposure machine is used for exposure of a pattern of a multi-CF substrate or a TFT substrate.
  • the exposure machine automatically replaces the filter device for automatically replacing the filter, and realizing the timely replacement of the filter with different photoresists.
  • the working principle of the exposure machine will be described by taking a CF substrate as an example.
  • FIG. 1 and FIG. 2 wherein the portion indicated by the reference numeral II shown in FIG. 1 is a schematic diagram of the automatic replacement filter device 16 (see FIG. 2) of the exposure machine.
  • the exposure machine includes a table 10 mounted on the CF substrate 20, a control device (not shown), a collecting mirror 12, a mirror group (not shown), a light lamp 13 mounted on the collecting mirror 12, and a microlens.
  • the array 14, the plurality of filters 15, and the exposure machine automatically replace the filter device 16.
  • the collecting mirror 12 is used to collect light and transmit light through the mirror group.
  • the control device is configured to control the operation of the microlens array 14, the exposure machine automatic replacement filter device 16, the collecting mirror 12, and the mirror group.
  • the exposure machine further includes a receiving control device (not shown), a collecting mirror 12, a mirror group (not shown), an illumination lamp 13 mounted on the collecting mirror 12, a microlens array 14,
  • the plurality of filters 15 and the exposure machine automatically replace the housing of the filter device 16 (not shown).
  • the collecting mirror 12 is an arc-shaped structure including a circular arc-shaped collecting surface 121.
  • the illumination lamp 13 is mounted on the concentrating surface 121. The light of the illumination lamp 13 is condensed by the condensing surface 121 and transmitted out of the concentrating mirror 12.
  • the mirror group includes a first mirror 111, a second mirror 112, and a third mirror 113.
  • the first mirror 111 is opposite to the concentrating surface 121, and the second mirror 112 receives the light reflected by the first mirror 111 and transmits the light to the third mirror 113.
  • the three mirrors 113 emit light for exposure.
  • the second mirror 112 has a curved reflective shape. Face 1121.
  • the first mirror 111 and the third mirror 113 are disposed obliquely and parallel to each other.
  • the reflecting surface (shown as a label) of the third mirror 113 faces the surface of the CF substrate where the photoresist is provided.
  • a photomask (not shown) is further disposed between the photoresist of the CF substrate 20 and the third mirror 113.
  • the microlens array 14 is located between the first mirror 111 and the second mirror 112, and the filter is located in the second mirror 112 and the microlens array. Between 14.
  • the automatic change filter device of the exposure machine comprises a bracket 161, a rotating shaft 162 mounted on the bracket 161, a driving component (not shown) and at least one clamping jaw 165.
  • At least one jaw 165 is used to clamp the filter 15.
  • the outer circumference of the rotating shaft 162 is provided with an extending arm 164 corresponding to the at least one clamping claw 165.
  • the at least one clamping jaw 165 is mounted on the extending arm 164, and the driving component drives the rotating shaft 162 to drive the extending arm 164. Rotating, thereby driving the filter 15 to rotate.
  • the jaws 165 are four, and the extension shaft 162 is provided with four extension arms 164. And the four extension arms are disposed in a cross shape on the outer circumferential surface of the rotating shaft.
  • the drive element is a drive motor.
  • the jaws 165 are one for the exposure machine, which is convenient for replacement when the filter needs to be clamped and the filter is not required to be mounted.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

一种用于装夹至少一个滤光片（15）的曝光机自动更换滤波片装置（16）和一种曝光机，所述曝光机自动更换滤波片装置（16）包括支架（161）、装于支架（161）的转轴（162）、驱动元件及至少一个夹爪（165），至少一个夹爪（165）用于装夹所述滤光片（15）；所述转轴（162）外周缘相对应所述至少一个夹爪（165）装有延伸臂（164），所述至少一个夹爪（165）装于延伸臂（164）上，所述驱动元件驱动所述转轴（162）带动所述延伸臂（164）转动，进而带动所述滤光片（15）转动。

Description

曝光机自动更换滤波片装置及曝光机
本发明要求2015年2月4日递交的发明名称为“曝光机自动更换滤波片装置及曝光机”的申请号201510059956.3的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及一种曝光机自动更换滤波片装置及曝光机。
背景技术
液晶显示装置的TFT基板及CF基板在制作过程中需要进行多次曝光处理形成需要的图层。现有技术中的通过曝光机进行曝光。在曝光制程中，根据光阻特性等不同因素需要更换滤光片，在更换过程中需要先对曝光机的光照灯进行熄灯，冷却后再通过手动装卸滤光片，如此操作步进浪费作业时间，而且熄灯次数较多，减少光照灯的使用寿命。
发明内容
本发明的目的在于提供一种节省作业时间的曝光机自动更换滤波片装置及曝光机。
本发明提供一种曝光机自动更换滤波片装置，用于装夹至少一个滤光片，所述曝光机自动更换滤波片装置包括支架、装于支架的转轴、驱动元件及至少一个夹爪，至少一个夹爪用于装夹所述滤光片；所述转轴外周缘相对应所述至少一个夹爪装有延伸臂，所述至少一个夹爪装于延伸臂上，所述驱动元件驱动所述转轴带动所述延伸臂转动，进而带动所述滤光片转动。
其中，所述夹爪为四个，相应所述转轴上装设有四个延伸臂。
其中，所述驱动元件为驱动马达。
其中，所述四个延伸臂呈十字形设置。
本发明还提供一种曝光机，其包括微透镜阵列、多个滤光片及曝光机自动更换滤波片装置，所述曝光机自动更换滤波片装置包括支架、装于支架的转轴、驱动元件及至少一个夹爪，至少一个夹爪用于装夹所述滤光片；所述转轴外周缘相对应所述至少一个夹爪装有延伸臂，所述至少一个夹爪装于延伸臂上，所述曝光机自动更换滤波片装置装于所述微透镜阵列的出光方向，所述夹爪上的滤光片与所述微透镜阵列相对设置，所述驱动元件驱动所述转轴带动所述延伸臂转动，进而带动所述滤光片转动，实现更换相对应所述微透镜阵列的滤光片。
其中，所述驱动元件为驱动马达。
其中，所述曝光机包括控制装置、集光镜、装于所述集光镜的光照灯、及反光镜组，集光镜用于聚光并通过反光镜组传递光线，所述控制装置用于控制所述微透镜阵列、曝光机自动更换滤波片装置、集光镜及反光镜组工作。
其中，所述集光镜包括聚光面，所述聚光面上装有光照灯，光照灯光线通过聚光面聚光及传递。
其中，所述反光镜组包括第一反光镜、第二反光镜及第三反光镜，所述第一反光镜与所述聚光面相对，所述第二反光镜接收所述第一反光镜反射的光线并将光传递给所述第三反光镜，所述第三反光镜发射出曝光所用光线。
其中，所述曝光机包括控制装置与所述微透镜阵列位于所述第一反光镜与所述第二反光镜之间，并且所述曝光机的滤光片位于所述第二反光镜与所述微透镜阵列之间。
本发明所述的曝光机在工作工程中需要更换滤光片时，只需要驱动转轴162带动所述延伸臂转动，进而带动所述滤光片转动，使所述需要的滤光片对准所述微透镜阵列，实现自动更换滤波片，节省作业时间。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明较佳实施例的曝光机的示意图。
图2是图1所示的本发明的曝光机的自动更换滤波片装置示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
本发明佳实施方式提供一种曝光机及曝光机自动更换滤波片装置。所述曝光机用于多CF基板或者TFT基板的图形进行曝光。所述曝光机自动更换滤波片装置用于自动更换滤光片，实现对用不同几班的光阻及时更换滤波片。本实施例中以制造CF基板为例进行说明曝光机工作原理。
请参阅图1与图2，其中，图一所示的标注II所指部分为曝光机自动更换滤波片装置16(见图2)的示意图。所述曝光机包括装在CF基板20的工作台10、控制装置(图未示)、集光镜12、反光镜组(图未标)、装于集光镜12的光照灯13、微透镜阵列14、多个滤光片15及曝光机自动更换滤波片装置16。所述集光镜12用于聚光并通过反光镜组传递光线。所述控制装置用于控制所述微透镜阵列14、曝光机自动更换滤波片装置16、集光镜12及反光镜组工作。
本实施例中，所述曝光机还包括收容控制装置(图未示)、集光镜12、反光镜组(图未标)、装于集光镜12的光照灯13、微透镜阵列14、多个滤光片15及曝光机自动更换滤波片装置16的箱体(图未标)。所述集光镜12为弧形结构，其包括圆弧形的聚光面121。所述聚光面121上装有所述光照灯13。光照灯13的光线通过聚光面121聚光并传递出所述集光镜12。
所述反光镜组包括第一反光镜111、第二反光镜112及第三反光镜113。所述第一反光镜111与所述聚光面121相对，所述第二反光镜112接收所述第一反光镜111反射的光线并将光传递给所述第三反光镜113，所述第三反光镜113发射出曝光所用光线。本实施例中，所述第二反光镜112具有弧形的反光 面1121。所述第一反光镜111与第三反光镜113倾斜设置并相互平行。所述第三反光镜113的反射面(图为标)朝向所述CF基板设有光阻的表面。并且位于CF基板20的光阻与所述第三反光镜113之间还设有光罩治具(图未示)。
本实施例中，所述微透镜阵列14位于所述第一反光镜111与所述第二反光镜112之间，并且所述滤光片位于所述第二反光镜112与所述微透镜阵列14之间。
本实施例中，所述曝光机自动更换滤波片装置包括支架161、装于支架161的转轴162、驱动元件(图未示)及至少一个夹爪165。至少一个夹爪165用于装夹所述滤光片15。所述转轴162外周缘相对应所述至少一个夹爪165装有延伸臂164，所述至少一个夹爪165装于延伸臂164上，所述驱动元件驱动所述转轴162带动所述延伸臂164转动，进而带动所述滤光片15转动。
本实施例中，所述夹爪165为四个，相应所述转轴162上装设有四个延伸臂164。并且所述四个延伸臂呈十字形设置在所述转轴外周面上。所述驱动元件为驱动马达。
在其它实施例中，所述夹爪165为1个，用于曝光机上，在需要装夹所述滤光片和不需要装夹滤光片时方便更换。
本发明所述的曝光机在工作工程中需要更换滤光片15时，只需要驱动转轴162带动所述延伸臂164转动，进而带动所述滤光片15转动，使所述需要的滤光片15对准所述微透镜阵列14，实现自动更换滤波片，节省作业时间。
以上所揭露的仅为本发明较佳实施例而已，当然不能以此来限定本发明之权利范围，本领域普通技术人员可以理解实现上述实施例的全部或部分流程，并依本发明权利要求所作的等同变化，仍属于发明所涵盖的范围。

Claims (10)

  1. 一种曝光机自动更换滤波片装置，用于装夹至少一个滤光片，其中，所述曝光机自动更换滤波片装置包括支架、装于支架的转轴、驱动元件及至少一个夹爪，至少一个夹爪用于装夹所述滤光片；所述转轴外周缘相对应所述至少一个夹爪装有延伸臂，所述至少一个夹爪装于延伸臂上，所述驱动元件驱动所述转轴带动所述延伸臂转动，进而带动所述滤光片转动。
  2. 如权利要求1所述的曝光机自动更换滤波片装置，其中，所述夹爪为四个，相应所述转轴上装设有四个延伸臂。
  3. 如权利要求1所述的曝光机自动更换滤波片装置，其中，所述驱动元件为驱动马达。
  4. 如权利要求3所述的曝光机自动更换滤波片装置，其中，所述四个延伸臂呈十字形设置。
  5. 一种曝光机，其包括微透镜阵列、多个滤光片及曝光机自动更换滤波片装置，其中，所述曝光机自动更换滤波片装置包括支架、装于支架的转轴、驱动元件及至少一个夹爪，至少一个夹爪用于装夹所述滤光片；所述转轴外周缘相对应所述至少一个夹爪装有延伸臂，所述至少一个夹爪装于延伸臂上，所述曝光机自动更换滤波片装置装于所述微透镜阵列的出光方向，所述夹爪上的滤光片与所述微透镜阵列相对设置，所述驱动元件驱动所述转轴带动所述延伸臂转动，进而带动所述滤光片转动，实现更换相对应所述微透镜阵列的滤光片。
  6. 如权利要求5所述的曝光机，其中，所述驱动元件为驱动马达。
  7. 如权利要求6所述的曝光机，其中，所述曝光机包括控制装置、集光镜、装于所述集光镜的光照灯、及反光镜组，集光镜用于聚光并通过反光镜组传递光线，所述控制装置用于控制所述微透镜阵列、曝光机自动更换滤波片装置、集光镜及反光镜组工作。
  8. 如权利要求7所述的曝光机，其中，所述集光镜包括聚光面，所述聚光面上装有光照灯，光照灯光线通过聚光面聚光及传递。
  9. 如权利要求8所述的曝光机，其中，所述反光镜组包括第一反光镜、第二 反光镜及第三反光镜，所述第一反光镜与所述聚光面相对，所述第二反光镜接收所述第一反光镜反射的光线并将光传递给所述第三反光镜，所述第三反光镜发射出曝光所用光线。
  10. 如权利要求9所述的曝光机，其中，所述曝光机包括控制装置与所述微透镜阵列位于所述第一反光镜与所述第二反光镜之间，并且所述曝光机的滤光片位于所述第二反光镜与所述微透镜阵列之间。
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