WO2016119159A1 - Method for preparing monocrystalline - Google Patents

Method for preparing monocrystalline Download PDF

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WO2016119159A1
WO2016119159A1 PCT/CN2015/071800 CN2015071800W WO2016119159A1 WO 2016119159 A1 WO2016119159 A1 WO 2016119159A1 CN 2015071800 W CN2015071800 W CN 2015071800W WO 2016119159 A1 WO2016119159 A1 WO 2016119159A1
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crystal
hours
crucible
mgnb
pyroelectric
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PCT/CN2015/071800
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French (fr)
Chinese (zh)
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罗豪甦
杨林荣
徐海清
李晓兵
赵祥永
王升
王西安
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上海硅酸盐研究所中试基地
中国科学院上海硅酸盐研究所
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Priority to PCT/CN2015/071800 priority Critical patent/WO2016119159A1/en
Publication of WO2016119159A1 publication Critical patent/WO2016119159A1/en

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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • C30B29/32Titanates; Germanates; Molybdates; Tungstates

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  • the invention relates to a method for suppressing crack initiation and cracking of a manganese-doped pyroelectric single crystal, in particular to a method for preparing a manganese-doped lead indium bismuth hydride-lead-magnesium titanate-titanate by a modified Bridgman method
  • the method of lead ternary pyroelectric single crystal belongs to the field of crystal growth technology.
  • Infrared detectors are mainly divided into photon type infrared detectors and thermal infrared detectors.
  • the common photon-type infrared detector mainly uses a narrow band gap semiconductor material represented by mercury cadmium telluride and an optoelectronic semiconductor material represented by gallium arsenide.
  • semiconductor infrared devices generally require low-temperature refrigeration, which is bulky, costly, and consumes a lot of power.
  • the pyroelectric infrared detector developed by the pyroelectric effect of the material has a flat spectral response in the ultraviolet, visible and infrared bands, and has no need for refrigeration, low power consumption, low noise bandwidth, compact structure and convenience.
  • the advantages of carrying and low cost have become one of the most eye-catching focuses in the field of infrared technology.
  • pyroelectric infrared detectors for low cost, low power consumption and miniaturization, pyroelectric infrared detectors are rapidly expanding from the military market to the civilian market, especially in human body detection, fire warning, gas analysis, infrared spectrometers. And the field of infrared thermal imaging has played an important role, while reflecting the huge market potential.
  • the materials currently used in pyroelectric infrared detectors mainly include lead zirconate titanate (PZT), barium titanate (BST) and lead citrate (PST), etc., and the main limitations of materials for pyroelectric unit detectors. Lithium niobate (LiTaO 3 ), triglyceride sulfate (TGS), and the like.
  • PZT lead zirconate titanate
  • BST barium titanate
  • PST lead citrate
  • TGS triglyceride sulfate
  • these traditional materials have shortcomings such as low pyroelectric coefficient, large dielectric loss, and unstable physical properties, which are difficult to meet the application requirements of high-performance pyroelectric infrared detectors and their extended products.
  • the more mature commercial LiTaO 3 infrared detectors have a detection level of only 1 ⁇ 10 8 cm (Hz) 1/2 /W to 4 ⁇ 10 8 cm (Hz) 1/2 /W. Therefore, at the same time, overcoming the shortcomings of the above materials, exploring new pyroelectric materials with high detection value has become an urgent need for the development of uncooled infrared devices.
  • Crystals without cracks or microcracks are important guarantees for the preparation of high-performance pyroelectric detectors.
  • cracks lead to the decrease in the availability of pyroelectric crystals and wafer yield, and on the other hand, pyroelectrics in practical applications. Cracks hidden in the wafer, resulting in cracking of crystal properties, poor performance under service conditions, and low stability.
  • Mn-doped PMNT and PIMNT pyroelectric crystals are easy to form cracks and cracks, which is related to the formation of defects during crystal growth due to the ion distribution caused by the addition of Mn.
  • no publication has publicly reported a process for suppressing the generation and cracking of cracks in manganese-doped pyroelectric single crystals.
  • Patent literature
  • Patent Document 1 Chinese patent CN 1080777C.
  • the invention provides a good quality, non-cracking and crack-free manganese-doped PMNT, Mn-doped PIMNT pyroelectric single crystal prepared by the improved enthalpy drop method, to solve the prior art Mn-doped pyroelectricity
  • the present application reduces the temperature gradient and growth rate to improve uniformity compared to conventional preparation methods, while at the same time suppressing the resulting generation of segregation expansion by reducing the thickness of the crucible.
  • Step 1 Obtain high-purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , PbO, TiO 2 for 20 to 30 hours, and then pre-burn for 5 to 8 hours at 1100 to 1350 degrees Celsius.
  • Starting material for crystal growth
  • Step 2 Fixing the starting material with a crystal of PMNT (lead bismuth magnesium silicate-lead titanate) or PIMNT (lead bismuth indium hydride-lead bismuth magnesium silicate-lead titanate) as a seed crystal
  • PMNT lead bismuth magnesium silicate-lead titanate
  • PIMNT lead bismuth indium hydride-lead bismuth magnesium silicate-lead titanate
  • the seed crystal and the starting material are enclosed in a crucible and then placed in a modified crystal growth furnace (Fig. 3), and the inoculation position is adjusted to a predetermined inoculation temperature and temperature gradient and then started to fall to achieve crystal growth.
  • the temperature gradient of the solid-liquid interface is controlled to be 30 to 70 ° C / cm, and the rate of decline is less than 0.5 mm / hr.
  • a single layer or a double layer of ruthenium having a thickness of 0.8 to 2.0 mm, or a layer of ruthenium having a single layer thickness of 0.1 to 0.5 mm is used as a growth container, or a combination of two layers of different thicknesses is used.
  • the inoculation time of crystal inoculation is 6 to 10 hours.
  • the seed crystal has a length of 30 to 60 mm and a diameter smaller than or equal to the diameter of the grown crystal, and preferably has a seed crystal diameter of 20 to 50 mm.
  • the furnace temperature is controlled at 1250 ⁇ 1500 °C.
  • the material of bismuth is platinum.
  • the second aspect of the present application is also a method for providing high purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , as follows:
  • Step a preparing InNbO 4 : weighing 1:1 to weigh In 2 O 3 and Nb 2 O 5 , mixing for 20 to 30 hours, and then pre-burning at 1100 to 1350 degrees Celsius for 10 to 13 hours to obtain InNbO 4 ,
  • Step b preparing Pb(Mn 1/3 Nb 2/3 )O 3 : molar ratio 1:1 weighs MnO 2 and Nb 2 O 5 , mixes for 20-30 hours, and then in a vacuum atmosphere 900-1100 degrees Celsius The calcination was carried out for 10 to 13 hours to obtain MnNb 2 O 6 .
  • the prepared MnNb 2 O 6 is ground into a powder, and the MnNb 2 O 6 and PbO are accurately weighed by a molar ratio of 1:5 to 6, mixed for 20 to 30 hours, and then calcined at 1100 to 1300 degrees Celsius for 10 to 13 hours.
  • Pb(Mn 1/3 Nb 2/3 )O 3 molar ratio 1:1 weighs MnO 2 and Nb 2 O 5 , mixes for 20-30 hours, and then in a vacuum atmosphere 900-1100 degrees Celsius The calcination was carried out for 10 to 13 hours to obtain MnNb 2 O 6 .
  • the prepared MnNb 2 O 6 is ground into a powder,
  • Step c preparing MgNb 2 O 6 : weighing 1:1 to weigh MgO and Nb 2 O 5 , mixing for 20-30 hours, and then calcining at 900-1100 degrees Celsius for 12-16 hours to obtain MgNb 2 O 6 .
  • the inventors of the present application specifically improve the following: through the step b, the Mn element can be present in the +2 valence state, thereby achieving the purpose of reducing the dielectric properties such as dielectric loss of the material; b, can make the Mn element occupy the B position of the perovskite structure ABO 3 according to the material design requirements, and avoid the erosion of the free lead and manganese during the melting process of the raw material.
  • the raw material is prepared by the synthesis method of the present application, so that the growth precursor exists in the form of pure perovskite phase, especially Pb(Mn 1/3 Nb 2/3 )O 3 , which avoids direct oxidation of the original raw material.
  • Manganese is placed in a growth furnace, and the valence state of manganese ions in manganese oxide at high temperatures and the formation of hetero phases or inclusions in the crystal, resulting in the possibility of crystal cracking, greatly improving the crystal integrity of the crystal.
  • the present invention adopts a single layer or double layer of germanium having a thickness of 0.8 to 2.0 mm, or a thickness of 0.1 to More than 3 layers of 0.5 mm are used as growth vessels, or a combination of two layers of different thicknesses is used.
  • the invention finds that the thickness of the germanium technology can match the stress generated by the growth process of the Mn-doped pyroelectric crystal, on the one hand, the more stress can be released, on the other hand, the stable control of the crystal shape can be realized, and the interface can be avoided. Fluctuations generate macroscopic defects from the place where the crystal is in contact with the crucible wall, and crystal cracks caused by expansion into the interior of the crystal.
  • the key point of the temperature field of the crystal growth furnace used in the present invention is that the temperature gradient of the temperature gradient in the descending direction when the crucible starts to fall is 30 to 70 ° C / cm, and the temperature gradient is too large, which may cause the crystal crystallization process to be easily cracked. Too small will cause polycrystals to appear and cause grain boundary defects.
  • the key point of the crystal growth rate employed in the present invention is that, corresponding to the above temperature gradient, the crystal growth rate used is less than 0.5 mm/hr, which is lower than that of the conventionally grown crystal, which is related to the Mn-doped pyrolysis.
  • the kinetic effect of the manganese-octahedral element in the high-temperature melt is superimposed on the growth interface, thereby avoiding defects such as raw material encapsulation caused by excessive growth rate or cracks formed by unstable growth interface.
  • the seed inoculation time of the crystal inoculation is 6 to 10 hours, thereby effectively eliminating the opportunity for the possible cracks in the seed crystal to diffuse into the newly solidified crystal.
  • Example 1 is a photograph of a crack-free manganese-doped pyroelectric crystal prepared in Example 1, and b) a manganese-doped pyroelectric crystal prepared by a conventional method under strong light;
  • FIG 3 is a schematic view showing the structure of a melting zone of a Mn-doped relaxation ferroelectric single crystal growth furnace.
  • MnO 2 and Nb 2 O 5 were accurately weighed in a molar ratio of 1:1, mixed for 25 hours, and then calcined at 1000 degrees for 12 hours in a vacuum atmosphere to obtain MnNb 2 O 6 .
  • the MnNb 2 O 6 prepared as described above is ground into a powder, and the MnNb 2 O 6 and PbO are accurately weighed at a molar ratio of 1:5, mixed for 25 hours, and then calcined at 1250 degrees for 12 hours to obtain Pb (Mn 1/3 Nb 2 ). /3 )O 3 . (Step b)
  • a crystal of PIMNT (length 50 mm, diameter 30 mm) in the direction of ⁇ 001> is used as a seed crystal in a platinum crucible (the structure is shown in Fig. 3), and the diameter of the crystal growth portion is 75 mm and the thickness is 1 mm;
  • the pre-fired starting material is charged and closed. Then, it was placed in a modified crystal growth furnace, the furnace temperature was controlled at 1400 ° C, the melting time was 5 hours, and the inoculation position was adjusted to reach a predetermined inoculation temperature and temperature gradient, and then began to fall to achieve crystal growth.
  • the temperature gradient of the solid-liquid interface was controlled to be 45 ° C / cm, and the crystal growth rate was 0.4 mm / hr.
  • a pyroelectric single crystal is produced, as shown in FIG.
  • FIG. 1 is a photograph of a) crack-free manganese-doped pyroelectric crystal prepared in Example 1, and b) a manganese-doped pyroelectric crystal prepared by a conventional method under strong light.
  • the crystals prepared by the method provided by the present application avoid the problems of perforation, cracking and the like which may be caused by the conventional preparation method.
  • the surface is smooth, crack-free, crack-like, and the like.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
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  • Metallurgy (AREA)
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  • Inorganic Chemistry (AREA)
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Abstract

A process method for inhibiting the crack formation and cracking of a manganese doped pyroelectric monocrystalline, wherein the chemical composition of the manganese doped pyroelectric monocrystalline is Mn-(1-x-y)Pb(In 1/2Nb 1/2)O 3-yPb(Mg 1/3Nb 2/3)O 3-xPbTiO 3, wherein x=0.35-0.42, y=0.30-0.45, 1-x-y=0.20-0.29, and the doping level of Mn is 0-5.0%. The preparation method for the material is an improved Bridgman method, comprising the processes of synthesizing a raw material, warming and melting, seeding with a crystal seed and crystal growing. The method overcomes the disadvantages of easy crack formation on a crystal and crystal cracking because of the Mn doping in the prior art, and provides an implementation method for preparing a large size pyroelectric monocrystalline with a high quality, and increasing the yield and performance reliability.

Description

一种单晶的制备方法Method for preparing single crystal 技术领域Technical field
本发明涉及一种抑制锰掺杂热释电单晶裂纹产生及开裂的工艺方法,具体说,是涉及一种采用改进的Bridgman法制备锰掺杂铌铟酸铅-铌镁酸铅-钛酸铅三元系热释电单晶的方法,属于晶体生长技术领域。The invention relates to a method for suppressing crack initiation and cracking of a manganese-doped pyroelectric single crystal, in particular to a method for preparing a manganese-doped lead indium bismuth hydride-lead-magnesium titanate-titanate by a modified Bridgman method The method of lead ternary pyroelectric single crystal belongs to the field of crystal growth technology.
技术背景technical background
当今世界各国竞相发展红外探测和成像技术,其应用遍及军事、航天、科研、医疗、工业等众多领域。红外探测器主要分为光子型红外探测器和热型红外探测器两大类。目前常见的光子型红外探测器主要采用以碲镉汞为代表的窄禁带半导体材料和以砷化镓为代表的光电子半导体材料。但半导体红外器件一般需要低温致冷工作,体积大、成本高、功耗大。In the world today, countries are competing to develop infrared detection and imaging technology, which is used in many fields such as military, aerospace, scientific research, medical, industrial and so on. Infrared detectors are mainly divided into photon type infrared detectors and thermal infrared detectors. At present, the common photon-type infrared detector mainly uses a narrow band gap semiconductor material represented by mercury cadmium telluride and an optoelectronic semiconductor material represented by gallium arsenide. However, semiconductor infrared devices generally require low-temperature refrigeration, which is bulky, costly, and consumes a lot of power.
而利用材料热释电效应研制的热释电红外探测器由于其在紫外波段、可见波段、红外波段具有平坦的光谱响应,同时具有无需致冷、功耗低、噪声带宽小、结构紧凑、便于携带、成本低等优点,已经成为当前红外技术领域中最引人瞩目的焦点之一。随着热释电红外探测器向低成本、低功耗及小型化发展,热释电红外探测器正从军用市场向民用市场快速拓展,尤其是在人体探测、火灾预警、气体分析、红外光谱仪以及红外热成像等领域发挥了重要作用,同时体现了巨大的市场潜力。The pyroelectric infrared detector developed by the pyroelectric effect of the material has a flat spectral response in the ultraviolet, visible and infrared bands, and has no need for refrigeration, low power consumption, low noise bandwidth, compact structure and convenience. The advantages of carrying and low cost have become one of the most eye-catching focuses in the field of infrared technology. With the development of pyroelectric infrared detectors for low cost, low power consumption and miniaturization, pyroelectric infrared detectors are rapidly expanding from the military market to the civilian market, especially in human body detection, fire warning, gas analysis, infrared spectrometers. And the field of infrared thermal imaging has played an important role, while reflecting the huge market potential.
目前用于热释电红外探测器的材料主要包括锆钛酸铅(PZT),钛酸锶钡(BST)和钽钪酸铅(PST)等,用于热释电单元探测器件的材料主要局限于钽酸锂(LiTaO3)、硫酸三甘酞(TGS)等。但是,这些传统材料有着热释电系数低、介电损耗大以及物理性能不稳定等缺点,很难满足高性能热释电红外探测器及其延伸产品的应用要求。例如,比较成熟的商用LiTaO3红外探测器的探测率水平仅为1×108cm(Hz)1/2/W至4×108cm(Hz)1/2/W。因此同时克服以上材料的缺点,探索获得高探测优值的新型热释电材料成为 目前发展非制冷红外器件的迫切需求。The materials currently used in pyroelectric infrared detectors mainly include lead zirconate titanate (PZT), barium titanate (BST) and lead citrate (PST), etc., and the main limitations of materials for pyroelectric unit detectors. Lithium niobate (LiTaO 3 ), triglyceride sulfate (TGS), and the like. However, these traditional materials have shortcomings such as low pyroelectric coefficient, large dielectric loss, and unstable physical properties, which are difficult to meet the application requirements of high-performance pyroelectric infrared detectors and their extended products. For example, the more mature commercial LiTaO 3 infrared detectors have a detection level of only 1 × 10 8 cm (Hz) 1/2 /W to 4 × 10 8 cm (Hz) 1/2 /W. Therefore, at the same time, overcoming the shortcomings of the above materials, exploring new pyroelectric materials with high detection value has become an urgent need for the development of uncooled infrared devices.
1996年开始,罗豪甦等人率先用布里奇曼(Bridgman)方法成功生长出弛豫铁电单晶(1-x)Pb(Mg1/3Nb2/3)O3–xPbTiO3铌镁钛酸铅(简称PMNT)(专利文献1)以来。自2003年开始,罗豪甦等人又首先发现了PMNT的优异热释电性能,并开展了大量的相关热释电性能优化和材料工艺研究,陆续制备出具有更低损耗的掺锰PMNT单晶及具有更高使用温度的掺锰PIMNT单晶(直径<两英寸)。Beginning in 1996, Luo Haosu and others first succeeded in the growth of relaxed ferroelectric single crystal (1-x)Pb(Mg 1/3 Nb 2/3 )O 3 -xPbTiO 3铌magnesium titanium by Bridgman method. Lead acid (abbreviated as PMNT) (patent document 1). Since 2003, Luo Haosu and others have first discovered the excellent pyroelectric performance of PMNT, and carried out a large number of related pyroelectric performance optimization and material process research, and successively prepared a manganese-doped PMNT single crystal with lower loss and Manganese-doped PIMNT single crystal (diameter < two inches) with higher service temperature.
无裂纹或微裂纹的晶体是高性能热释电探测器制备的重要保证,裂纹一方面导致生长的热释电晶体的可用率和晶片成品率降低,另一方面导致在实际应用的热释电晶片中隐藏的裂纹、从而导致晶体性能裂化、服役工况下性能变差、稳定性不高。Mn掺杂PMNT、PIMNT热释电晶体极易容易形成开裂、裂纹,这与Mn的加入导致的离子分布会增大晶体生长时缺陷的形成。迄今为止,尚未有出版物公开报道抑制锰掺杂热释电单晶裂纹产生及开裂的工艺方法。Crystals without cracks or microcracks are important guarantees for the preparation of high-performance pyroelectric detectors. On the one hand, cracks lead to the decrease in the availability of pyroelectric crystals and wafer yield, and on the other hand, pyroelectrics in practical applications. Cracks hidden in the wafer, resulting in cracking of crystal properties, poor performance under service conditions, and low stability. Mn-doped PMNT and PIMNT pyroelectric crystals are easy to form cracks and cracks, which is related to the formation of defects during crystal growth due to the ion distribution caused by the addition of Mn. To date, no publication has publicly reported a process for suppressing the generation and cracking of cracks in manganese-doped pyroelectric single crystals.
专利文献:Patent literature:
专利文献1:中国专利CN 1080777C。Patent Document 1: Chinese patent CN 1080777C.
发明概要Summary of invention
本发明提供一种采用改进的坩埚下降法法制备的质量好、不开裂、无裂纹的锰掺杂PMNT、Mn掺杂PIMNT热释电单晶,以解决现有技术中的掺Mn热释电单晶生长中由于Mn掺杂导致的内部裂纹、晶体开裂的问题。The invention provides a good quality, non-cracking and crack-free manganese-doped PMNT, Mn-doped PIMNT pyroelectric single crystal prepared by the improved enthalpy drop method, to solve the prior art Mn-doped pyroelectricity The problem of internal cracks and crystal cracking due to Mn doping in single crystal growth.
总地来说,本申请相较传统制备方法的基础上降低温度梯度和生长速度来提高均匀性,同时通过减小坩埚厚度的方法以期抑制由此带来的分凝扩大化的产生。In general, the present application reduces the temperature gradient and growth rate to improve uniformity compared to conventional preparation methods, while at the same time suppressing the resulting generation of segregation expansion by reducing the thickness of the crucible.
本申请一方面在于提供如下技术方案:An aspect of the present application is to provide the following technical solutions:
一种单晶的制备方法,单晶的化学组成为: Mn-(1-x-y)Pb(In1/2Nb1/2)O3-yPb(Mg1/3Nb2/3)O3-xPbTiO3,其中x=0.35~0.42,y=0.30~0.45,1-x-y=0.20~0.29,Mn的掺杂量为0~5.0%(摩尔百分比),该方法包括:A method for preparing a single crystal, the chemical composition of the single crystal is: Mn-(1-xy)Pb(In 1/2 Nb 1/2 )O 3 -yPb(Mg 1/3 Nb 2/3 )O 3 - xPbTiO 3 , wherein x=0.35-0.42, y=0.30-0.45, 1-xy=0.20-0.29, and the doping amount of Mn is 0-5.0% (molar percentage), the method includes:
步骤1:取得高纯度的Pb(Mn1/3Nb2/3)O3、MgNb2O6与InNbO4、PbO、TiO2混合20~30小时后1100~1350摄氏度预烧5~8小时作为晶体生长的起始物料;Step 1: Obtain high-purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , PbO, TiO 2 for 20 to 30 hours, and then pre-burn for 5 to 8 hours at 1100 to 1350 degrees Celsius. Starting material for crystal growth;
步骤2:以PMNT(铌镁酸铅-钛酸铅)或PIMNT(铌铟酸铅-铌镁酸铅-钛酸铅)晶体作为籽晶固定于坩埚底部,再将所述起始物料装入并封闭坩埚,并将所述坩埚放入晶体生长炉中,且当所述坩埚开始下降时,沿着下降方向的温度梯度在30~70℃/cm,且晶体生长速度小于0.5mm/hr。Step 2: Fixing the starting material with a crystal of PMNT (lead bismuth magnesium silicate-lead titanate) or PIMNT (lead bismuth indium hydride-lead bismuth magnesium silicate-lead titanate) as a seed crystal The crucible was closed and placed in a crystal growth furnace, and when the crucible began to fall, the temperature gradient in the descending direction was 30 to 70 ° C/cm, and the crystal growth rate was less than 0.5 mm/hr.
也就是说,将籽晶及起始物料封闭在坩埚中,然后放入改进的晶体生长炉中(附图3),调节接种位置达到预定的接种温度和温度梯度后开始下降实现晶体生长。控制固液界面温度梯度为30~70℃/cm,下降速率为小于0.5mm/hr。That is, the seed crystal and the starting material are enclosed in a crucible and then placed in a modified crystal growth furnace (Fig. 3), and the inoculation position is adjusted to a predetermined inoculation temperature and temperature gradient and then started to fall to achieve crystal growth. The temperature gradient of the solid-liquid interface is controlled to be 30 to 70 ° C / cm, and the rate of decline is less than 0.5 mm / hr.
其中,坩埚的厚度为0.8~2.0mm的单层或双层坩埚、或采用单层厚度0.1~0.5mm的3层以上坩埚作为生长容器,或采用两个不同范围厚度的坩埚层组合实现。Among them, a single layer or a double layer of ruthenium having a thickness of 0.8 to 2.0 mm, or a layer of ruthenium having a single layer thickness of 0.1 to 0.5 mm is used as a growth container, or a combination of two layers of different thicknesses is used.
其中,晶体接种的熔种时间为6~10小时。Among them, the inoculation time of crystal inoculation is 6 to 10 hours.
其中,籽晶长度为30~60mm,直径小于或等于生长晶体的直径,优选籽晶直径为20~50mm。The seed crystal has a length of 30 to 60 mm and a diameter smaller than or equal to the diameter of the grown crystal, and preferably has a seed crystal diameter of 20 to 50 mm.
其中,当晶体的晶体结构为四方相时,所述籽晶的晶体学方向为[001]。其中,炉温控制在1250~1500℃。Wherein, when the crystal structure of the crystal is a tetragonal phase, the crystallographic direction of the seed crystal is [001]. Among them, the furnace temperature is controlled at 1250 ~ 1500 °C.
其中,坩埚的材料为铂金。Among them, the material of bismuth is platinum.
其中,为了保证晶体的生长,Pb(Mn1/3Nb2/3)O3、MgNb2O6、InNbO4、PbO、TiO2的纯度要求是必须的。一般而言,其纯度需达到99.99%。 Among them, in order to ensure the growth of crystals, the purity requirements of Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 , InNbO 4 , PbO, and TiO 2 are necessary. In general, its purity needs to reach 99.99%.
对于PbO、TiO2,一般市售可得,而对于Pb(Mn1/3Nb2/3)O3、MgNb2O6与InNbO4,由于在市场上并未成熟的制备工艺。故本申请的第二方面,还在于一种提供高纯度Pb(Mn1/3Nb2/3)O3、MgNb2O6与InNbO4的方法,具体如下:For PbO, TiO 2 , it is generally commercially available, and for Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , due to a process that is not mature on the market. Therefore, the second aspect of the present application is also a method for providing high purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , as follows:
步骤a,制备InNbO4:按摩尔比1:1称取In2O3和Nb2O5,混合20~30小时后再在1100~1350摄氏度预烧10~13小时得到InNbO4Step a, preparing InNbO 4 : weighing 1:1 to weigh In 2 O 3 and Nb 2 O 5 , mixing for 20 to 30 hours, and then pre-burning at 1100 to 1350 degrees Celsius for 10 to 13 hours to obtain InNbO 4 ,
步骤b,制备Pb(Mn1/3Nb2/3)O3:按摩尔比1:1称取MnO2和Nb2O5,混合20~30小时后,再在真空气氛下900~1100摄氏度预烧10~13小时得到MnNb2O6。制备得到的MnNb2O6研磨成粉,再按摩尔比1:5~6准确称取MnNb2O6和PbO,混合20~30小时,然后在1100~1300摄氏度度预烧10~13小时得到Pb(Mn1/3Nb2/3)O3Step b, preparing Pb(Mn 1/3 Nb 2/3 )O 3 : molar ratio 1:1 weighs MnO 2 and Nb 2 O 5 , mixes for 20-30 hours, and then in a vacuum atmosphere 900-1100 degrees Celsius The calcination was carried out for 10 to 13 hours to obtain MnNb 2 O 6 . The prepared MnNb 2 O 6 is ground into a powder, and the MnNb 2 O 6 and PbO are accurately weighed by a molar ratio of 1:5 to 6, mixed for 20 to 30 hours, and then calcined at 1100 to 1300 degrees Celsius for 10 to 13 hours. Pb(Mn 1/3 Nb 2/3 )O 3 .
步骤c,制备MgNb2O6:按摩尔比1:1称取MgO和Nb2O5,混合20-30小时后,再在900~1100摄氏度预烧12~16小时得到MgNb2O6Step c, preparing MgNb 2 O 6 : weighing 1:1 to weigh MgO and Nb 2 O 5 , mixing for 20-30 hours, and then calcining at 900-1100 degrees Celsius for 12-16 hours to obtain MgNb 2 O 6 .
在以上这一制备方法中,本申请的发明人具体做出的改进有:通过步骤b,可使得Mn元素以+2价状态存在,从而达到降低材料介电损耗等性能调控的目的;通过步骤b,可使得Mn元素按照材料设计要求占据钙钛矿结构ABO3的B位,避免了游离态的铅和锰在原料熔化过程中对坩埚的侵蚀。In the above preparation method, the inventors of the present application specifically improve the following: through the step b, the Mn element can be present in the +2 valence state, thereby achieving the purpose of reducing the dielectric properties such as dielectric loss of the material; b, can make the Mn element occupy the B position of the perovskite structure ABO 3 according to the material design requirements, and avoid the erosion of the free lead and manganese during the melting process of the raw material.
与现有技术相比,本发明的改进之外在于:The improvement of the present invention is in addition to the prior art:
1)采用本申请的合成法制备原料,使得生长前驱体以纯钙钛矿相的形式存在,尤其是制备成Pb(Mn1/3Nb2/3)O3,避免了直接将原始的原料氧化锰放在生长炉中,在高温情况下锰离子在氧化锰中的价态变化以及在晶体中形成杂相、或包裹体,从而导致晶体产生裂纹的可能性,大幅提高了晶体结晶完整性。1) The raw material is prepared by the synthesis method of the present application, so that the growth precursor exists in the form of pure perovskite phase, especially Pb(Mn 1/3 Nb 2/3 )O 3 , which avoids direct oxidation of the original raw material. Manganese is placed in a growth furnace, and the valence state of manganese ions in manganese oxide at high temperatures and the formation of hetero phases or inclusions in the crystal, resulting in the possibility of crystal cracking, greatly improving the crystal integrity of the crystal.
2)为了减少晶体生长过程中的热应力对晶体压力较大、容易产生裂纹的机制,本发明采用厚度0.8~2.0mm的单层或双层坩埚、或采用厚度0.1~ 0.5mm的3层以上坩埚作为生长容器,或采用两个不同范围厚度的坩埚层组合实现。本发明发现该种厚度的坩埚技术能够与Mn掺杂热释电晶体生长过程产生的应力匹配,一方面能够让较多的应力得到释放,另一方面能够在实现晶体形状的稳定控制,避免界面波动从晶体与坩埚壁接触的地方产生宏观缺陷、并向晶体内部扩展导致的晶体裂纹。2) In order to reduce the mechanism of thermal stress during crystal growth to a large crystal pressure and easy to generate cracks, the present invention adopts a single layer or double layer of germanium having a thickness of 0.8 to 2.0 mm, or a thickness of 0.1 to More than 3 layers of 0.5 mm are used as growth vessels, or a combination of two layers of different thicknesses is used. The invention finds that the thickness of the germanium technology can match the stress generated by the growth process of the Mn-doped pyroelectric crystal, on the one hand, the more stress can be released, on the other hand, the stable control of the crystal shape can be realized, and the interface can be avoided. Fluctuations generate macroscopic defects from the place where the crystal is in contact with the crucible wall, and crystal cracks caused by expansion into the interior of the crystal.
3)本发明采用的晶体生长炉的温场关键之处在于,坩埚开始下降时的温度梯度沿着下降方向的温度梯度在30~70℃/cm,温度梯度太大会导致晶体结晶过程容易开裂,太小会导致多晶出现、产生晶界缺陷。3) The key point of the temperature field of the crystal growth furnace used in the present invention is that the temperature gradient of the temperature gradient in the descending direction when the crucible starts to fall is 30 to 70 ° C / cm, and the temperature gradient is too large, which may cause the crystal crystallization process to be easily cracked. Too small will cause polycrystals to appear and cause grain boundary defects.
4)本发明采用的晶体生长速度的关键之处在于,与上述的温度梯度相对应,采用的晶体生长速度小于0.5mm/hr,比传统生长晶体的速度低,这与Mn掺杂的热释电晶体中,高温熔体中锰氧八面体基元在生长界面叠加的动力学效应有关,从而避免生长速度过快导致的原料包裹、或者生长界面不稳定导致形成的裂纹等缺陷。4) The key point of the crystal growth rate employed in the present invention is that, corresponding to the above temperature gradient, the crystal growth rate used is less than 0.5 mm/hr, which is lower than that of the conventionally grown crystal, which is related to the Mn-doped pyrolysis. In the crystal, the kinetic effect of the manganese-octahedral element in the high-temperature melt is superimposed on the growth interface, thereby avoiding defects such as raw material encapsulation caused by excessive growth rate or cracks formed by unstable growth interface.
5)本发明采用的晶体生长过程中,采用的晶体接种的熔种时间为6~10小时,从而有效消除籽晶中可能的裂纹向新固化生长的晶体扩散的机会。5) In the crystal growth process used in the present invention, the seed inoculation time of the crystal inoculation is 6 to 10 hours, thereby effectively eliminating the opportunity for the possible cracks in the seed crystal to diffuse into the newly solidified crystal.
附图说明DRAWINGS
图1是a)实施例1制备出的无裂纹掺锰热释电晶体,和b)采用传统方法制备的掺锰热释电晶体在强光下的照片;1 is a photograph of a crack-free manganese-doped pyroelectric crystal prepared in Example 1, and b) a manganese-doped pyroelectric crystal prepared by a conventional method under strong light;
图2是制备出的无裂纹掺锰热释电晶体;2 is a prepared crack-free manganese-doped pyroelectric crystal;
图3是Mn掺杂的弛豫铁电单晶生长炉熔区结构示意图。3 is a schematic view showing the structure of a melting zone of a Mn-doped relaxation ferroelectric single crystal growth furnace.
发明内容Summary of the invention
实施例1Example 1
按摩尔比1:1准确称取In2O3和Nb2O5,混合25小时后再在1250度预 烧12小时得到In NbO4。(步骤a)In 2 O 3 and Nb 2 O 5 were accurately weighed in a molar ratio of 1:1, and after mixing for 25 hours, they were calcined at 1250 degrees for 12 hours to obtain In NbO 4 . (Step a)
按摩尔比1:1准确称取MgO和Nb2O5,混合25小时后再在1050度预烧12小时得到MgNb2O6。(步骤c)MgO and Nb 2 O 5 were accurately weighed according to a molar ratio of 1:1, and after mixing for 25 hours, calcination was carried out at 1050 degrees for 12 hours to obtain MgNb 2 O 6 . (Step c)
按摩尔比1:1准确称取MnO2和Nb2O5,混合25小时后,再在真空气氛下1000度预烧12小时得到MnNb2O6MnO 2 and Nb 2 O 5 were accurately weighed in a molar ratio of 1:1, mixed for 25 hours, and then calcined at 1000 degrees for 12 hours in a vacuum atmosphere to obtain MnNb 2 O 6 .
前述制备得到的MnNb2O6研磨成粉,再按摩尔比1:5准确称取MnNb2O6和PbO,混合25小时,然后在1250度预烧12小时得到Pb(Mn1/3Nb2/3)O3。(步骤b)The MnNb 2 O 6 prepared as described above is ground into a powder, and the MnNb 2 O 6 and PbO are accurately weighed at a molar ratio of 1:5, mixed for 25 hours, and then calcined at 1250 degrees for 12 hours to obtain Pb (Mn 1/3 Nb 2 ). /3 )O 3 . (Step b)
按照Mn-(1-x-y)Pb(In1/2Nb1/2)O3-yPb(Mg1/3Nb2/3)O3-xPbTiO3,其中x=0.38,y=0.42,1-x-y=0.20,Mn的掺杂量为1.0%(摩尔百分比)的化学式称取前述制备得到的Pb(Mn1/3Nb2/3)O3、MgNb2O6与InNbO4、PbO、TiO2混合25小时后1200度预烧7小时作为晶体生长的起始物料。According to Mn-(1-xy)Pb(In 1/2 Nb 1/2 )O 3 -yPb(Mg 1/3 Nb 2/3 )O 3 -xPbTiO 3 , where x=0.38, y=0.42,1- Pt(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 and InNbO 4 , PbO, TiO 2 prepared by the above-mentioned preparation of xy=0.20, the doping amount of Mn is 1.0% by mole. After mixing for 25 hours, 1200 degrees was pre-fired for 7 hours as a starting material for crystal growth.
以<001>方向PIMNT或Mn掺杂PIMNT(长度50mm,直径30mm)晶体作为籽晶置于铂金坩埚中(结构如图3所示),晶体生长部分的坩埚直径75毫米,厚度1毫米;再将预烧好的起始物料装入并封闭坩埚。然后放入改进的晶体生长炉中,炉温控制在1400℃,熔种时间为5小时,调节接种位置达到预定的接种温度和温度梯度后开始下降实现晶体生长。控制固液界面温度梯度为45℃/cm,晶体生长速率为0.4mm/hr。最终制得热释电单晶体,如图3所示。A crystal of PIMNT (length 50 mm, diameter 30 mm) in the direction of <001> is used as a seed crystal in a platinum crucible (the structure is shown in Fig. 3), and the diameter of the crystal growth portion is 75 mm and the thickness is 1 mm; The pre-fired starting material is charged and closed. Then, it was placed in a modified crystal growth furnace, the furnace temperature was controlled at 1400 ° C, the melting time was 5 hours, and the inoculation position was adjusted to reach a predetermined inoculation temperature and temperature gradient, and then began to fall to achieve crystal growth. The temperature gradient of the solid-liquid interface was controlled to be 45 ° C / cm, and the crystal growth rate was 0.4 mm / hr. Finally, a pyroelectric single crystal is produced, as shown in FIG.
图1是a)实施例1制备出的无裂纹掺锰热释电晶体,和b)采用传统方法制备的掺锰热释电晶体在强光下的照片。从图1中可知,通过本申请提供的方法制备得到的晶体,避免了传统制备方法所可能带来的穿孔、裂纹等问题。结合图1、2可知,其表面光滑、无裂纹、开裂等现象。 1 is a photograph of a) crack-free manganese-doped pyroelectric crystal prepared in Example 1, and b) a manganese-doped pyroelectric crystal prepared by a conventional method under strong light. As can be seen from Fig. 1, the crystals prepared by the method provided by the present application avoid the problems of perforation, cracking and the like which may be caused by the conventional preparation method. As can be seen from the figures 1 and 2, the surface is smooth, crack-free, crack-like, and the like.

Claims (9)

  1. 一种单晶的制备方法,所述单晶的化学组成为:A method for preparing a single crystal, the chemical composition of the single crystal is:
    Mn-(1-x-y)Pb(In1/2Nb1/2)O3-yPb(Mg1/3Nb2/3)O3-xPbTiO3,其中x=0.35~0.42,y=0.30~0.45,1-x-y=0.20~0.29,Mn的掺杂量为0~5.0%(摩尔百分比),其特征在于,所述方法包括:Mn-(1-xy)Pb(In 1/2 Nb 1/2 )O 3 -yPb(Mg 1/3 Nb 2/3 )O 3 -xPbTiO 3 , where x=0.35~0.42, y=0.30~0.45 , 1-xy=0.20-0.29, the doping amount of Mn is 0-5.0% (molar percentage), characterized in that the method comprises:
    步骤1:取得高纯度的Pb(Mn1/3Nb2/3)O3、MgNb2O6、InNbO4、PbO、TiO2混合20~30小时后1100~1350摄氏度预烧5~8小时作为晶体生长的起始物料;Step 1: Obtain high-purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 , InNbO 4 , PbO, TiO 2 for 20 to 30 hours and then pre-fire for 1 to 8 hours at 1100 to 1350 degrees Celsius. Starting material for crystal growth;
    步骤2:以PMNT或PIMNT晶体或其Mn掺杂晶体作为籽晶固定于坩埚底部,再将所述起始物料装入并封闭坩埚,并将所述坩埚放入晶体生长炉中,其特征在于,Step 2: fixing the PMNT or PIMNT crystal or its Mn-doped crystal as a seed crystal to the bottom of the crucible, loading and closing the crucible, and placing the crucible into a crystal growth furnace, characterized in that ,
    当所述坩埚开始下降时,沿着下降方向的温度梯度在30~70℃/cm,且晶体生长速度小于0.5mm/hr。When the crucible begins to fall, the temperature gradient along the descending direction is 30 to 70 ° C / cm, and the crystal growth rate is less than 0.5 mm / hr.
  2. 如权利要求1所述的制备方法,其中,所述高纯度的Pb(Mn1/3Nb2/3)O3、MgNb2O6、InNbO4、PbO、TiO2的纯度为99.99%。The production method according to claim 1, wherein the purity of the high-purity Pb(Mn 1/3 Nb 2/3 )O 3 , MgNb 2 O 6 , InNbO 4 , PbO, and TiO 2 is 99.99%.
  3. 如权利要求1所述的制备方法,其中,所述步骤1中取得高纯度的In NbO4、Pb(Mn1/3Nb2/3)O3、MgNb2O6的方法分为如下步骤:The production method according to claim 1, wherein the method of obtaining high purity In NbO 4 , Pb(Mn 1/3 Nb 2/3 )O 3 , and MgNb 2 O 6 in the step 1 is as follows:
    步骤a,制备InNbO4:按摩尔比1:1称取In2O3和Nb2O5,混合20~30小时后再在1100~1350摄氏度预烧10~13小时得到InNbO4Step a, preparing InNbO 4 : In 2 O 3 and Nb 2 O 5 are weighed in a molar ratio of 1:1, and mixed for 20 to 30 hours, and then calcined at 1100 to 1350 ° C for 10 to 13 hours to obtain InNbO 4 .
    步骤b,制备Pb(Mn1/3Nb2/3)O3:按摩尔比1:1称取MnO2和Nb2O5,混合20~30小时后,再在真空气氛下900~1100摄氏度预烧10~13小时得到MnNb2O6。制备得到的MnNb2O6研磨成粉,再按摩尔比1:5~6称取MnNb2O6和PbO,混合20~30小时,然后在1100~1300摄氏度度预烧10~13小时得到Pb(Mn1/3Nb2/3)O3Step b, preparing Pb(Mn 1/3 Nb 2/3 )O 3 : molar ratio 1:1 weighs MnO 2 and Nb 2 O 5 , mixes for 20-30 hours, and then in a vacuum atmosphere 900-1100 degrees Celsius The calcination was carried out for 10 to 13 hours to obtain MnNb 2 O 6 . The prepared MnNb 2 O 6 is ground into a powder, and the MnNb 2 O 6 and PbO are weighed by a molar ratio of 1:5 to 6, mixed for 20 to 30 hours, and then calcined at 1100 to 1300 ° C for 10 to 13 hours to obtain Pb. (Mn 1/3 Nb 2/3 )O 3 .
    步骤c,制备MgNb2O6:按摩尔比1:1称取MgO和Nb2O5,混合20-30小时后,再在900~1100摄氏度预烧12~16小时得到MgNb2O6Step c, preparing MgNb 2 O 6 : weighing 1:1 to weigh MgO and Nb 2 O 5 , mixing for 20-30 hours, and then calcining at 900-1100 degrees Celsius for 12-16 hours to obtain MgNb 2 O 6 .
  4. 如权利要求1所述的制备方法,其中,所述坩埚总厚度为0.8~2.0mm。The production method according to claim 1, wherein the total thickness of the crucible is 0.8 to 2.0 mm.
  5. 如权利要求1所述的制备方法,其中,所述晶体接种的熔种时间为6~10小时。The production method according to claim 1, wherein the crystal inoculation has a melting time of 6 to 10 hours.
  6. 如权利要求1所述的制备方法,其中,所述籽晶长度为30~60mm,直径小于或等于生长晶体的直径,优选籽晶直径为20~50mm。The production method according to claim 1, wherein the seed crystal has a length of 30 to 60 mm and a diameter smaller than or equal to a diameter of the grown crystal, and preferably has a seed crystal diameter of 20 to 50 mm.
  7. 如权利要求1所述的方法,其中,当所述晶体的晶体结构为四方相时,所述籽晶的晶体学方向为[001]。The method according to claim 1, wherein when the crystal structure of the crystal is a tetragonal phase, the crystallographic direction of the seed crystal is [001].
  8. 如权利要求1所述的方法,其中,所述炉温控制在1250~1500℃。The method of claim 1 wherein said furnace temperature is controlled between 1250 and 1500 °C.
  9. 如权利要求1所述的方法,其中,所述坩埚的材料为铂金。 The method of claim 1 wherein the material of the crucible is platinum.
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