WO2016118071A1 - Procédé de production d'un matériau composite conducteur - Google Patents
Procédé de production d'un matériau composite conducteur Download PDFInfo
- Publication number
- WO2016118071A1 WO2016118071A1 PCT/SE2016/050045 SE2016050045W WO2016118071A1 WO 2016118071 A1 WO2016118071 A1 WO 2016118071A1 SE 2016050045 W SE2016050045 W SE 2016050045W WO 2016118071 A1 WO2016118071 A1 WO 2016118071A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polymer
- solvent
- nanotubes
- dispersion
- film
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 239000002131 composite material Substances 0.000 title description 7
- 229920000642 polymer Polymers 0.000 claims abstract description 46
- 239000002071 nanotube Substances 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims description 57
- 239000002904 solvent Substances 0.000 claims description 45
- 239000000203 mixture Substances 0.000 claims description 26
- 239000002109 single walled nanotube Substances 0.000 claims description 26
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 claims description 24
- 239000006185 dispersion Substances 0.000 claims description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 9
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 8
- 229920000620 organic polymer Polymers 0.000 claims description 7
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 238000005266 casting Methods 0.000 claims description 4
- 238000004528 spin coating Methods 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims 5
- 125000005843 halogen group Chemical group 0.000 claims 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 239000002070 nanowire Substances 0.000 abstract description 6
- 239000000243 solution Substances 0.000 description 17
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 11
- 239000004793 Polystyrene Substances 0.000 description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 10
- 239000004205 dimethyl polysiloxane Substances 0.000 description 9
- 229920002223 polystyrene Polymers 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 229920001940 conductive polymer Polymers 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- 230000037230 mobility Effects 0.000 description 5
- 239000002041 carbon nanotube Substances 0.000 description 4
- 239000002322 conducting polymer Substances 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- -1 poly(3-hexylthiophene-2,5-diyl) Polymers 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000004630 atomic force microscopy Methods 0.000 description 3
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000005325 percolation Methods 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229920000547 conjugated polymer Polymers 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000013086 organic photovoltaic Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
- H10K30/35—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains comprising inorganic nanostructures, e.g. CdSe nanoparticles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a method for producing a conductive or semiconductive material comprising conducting or semiconducting nanotubes or nanowires, and at least an organic macromolecular material (e.g. short molecule, polymer, ... ) which can be processed in solution.
- the invention also relates to the resulting material comprising a conductive or semiconductive nanoscale network made of nanotubes or nanowires.
- Nanotubes and nanowires made of carbon, metal or other
- semiconducting materials have several interesting properties for electronic devices (transistors, solar cells, electrodes, etc . ).
- single walled carbon nanotubes possess high aspect ratio and high charge carrier mobilities, making them very attractive for next generation of carbon based electronic devices.
- a semiconducting polymer such as poly-3-hexylthiophene (P3HT).
- P3HT poly-3-hexylthiophene
- Temperature annealing has also been shown to modify the crystallinity, and the optical and electrical properties of polythiophene polymers.
- semiconductive materials formed by a method comprising low temperatures and being solvent based provide properties which are beneficial for opto-electronic applications using organic semiconductor materials.
- the present invention relates to a method performed at low temperature (ideally room-temperature) and low pressure which provides well defined arrays of nano-engineered nanotube/nanowire networks with much improved charge transport in organic polymers comprising delocalized (conjugated) ⁇ - electrons, such as , for example but not limited to, a P3HT film matrix (Fig. 2).
- the presented invention is controllable, scalable and enables the formation of nano- sized networks with exceptional properties not achieved by other methods. [0004].
- Charge transport in P3HT was enhanced by approximately two orders of magnitude compared to a random network produced by traditional solution based methods and around 4-5 times more compared to our previous results with a thermal method.
- nanotube loadings massively conductive networks due to the nanoscale interconnectivity of the nano-networks, and the improved dispersion of the nanotubes in the solvent.
- the low amount of nanoitubes used reduces bundling, increases transparency and provides an economical solution for electronic applications.
- the method is simple, fast and prevents any unwanted change in materials' properties which may be caused by the use of high temperatures
- CN101328276 discloses a method for providing SWNT composite film the method comprising the use of gum arabicum and a step where the
- the temperature is kept at 70 to 100 degrees C.
- the polymer emulsions used are exemplified as styrene-acrylic emulsions, pure acrylic emulsions and epoxy emulsions.
- the document does not disclose semiconductive polymers comprising monomers containing aromatic moieties.
- P3HT does not to disclosed. The method involves a step with temperatures way above RT.
- CN103739903A discloses high conductivity carbon nanotube rubber composite which is produced by using a latex. The document does not disclose the use of disclose semiconductive polymers comprising monomers containing aromatic moieties. P3HT apperas not to be disclosed.
- CN103073891 discloses a method for the preparation of high- conductivity flexible conductive composite materials.
- the method encompasses a stage where graphene and carbon nano-tube are uniformly dispersed (CNTs) in an aqueous solution and where further resorcinol, formaldehyde and catalyst (sodium carbonate) are added, whereby the reaction temperature is 85°C and the reaction time three days.
- a graphene -CNT-resorcinol-formaldehyde organic gel is formed.
- the CNTs are carbonized in a furnace at a temperature of 900-1000 degrees centigrade.
- the material does not contain CNT.
- the method encompasses high temperature stages. Additionally, P3 does not disclose semiconductive polymers comprising monomers containing aromatic moieties.
- the present invention relates to a method for producing a conductive or semiconductive material comprising nanotubes and at least a first polymer, the method comprising the steps of:
- the invention relates to a method for producing a semiconductive material.
- Said semiconductive material is preferable applied in photovoltaics and Organic Light-Emitting Diodes (OLEDS).
- OLEDS Organic Light-Emitting Diodes
- the invention is also directed to a conductive or semiconductive material obtainable by the method, and a photovoltaic component comprising the semiconductive material with SWNTs and a semiconductive polymer.
- the dispersion comprises nanotubes and at least a first solvent.
- the first solvent can be a mixture of several solvents.
- the first solvent should facilitate the formation of a nanotube dispersion which preferably also exhibits properties facilitating the formation of a film on a substrate. It is preferable if the solvent has fast to moderate evaporating properties.
- the first solvent has a vapour pressure above about 10 mmHg (at 20°C), above about 50 mmHg, above about 100 mmHg, above about 150 mmHg, above about 200 mmHg.
- the properties of the first solvent is adjusted with regard to type of nanotube.
- the first solvent is water, or a carbon based organic solvent, such as dichlorobenzene, chlorobenzene, trichlorobenzene, chloroform, toluene, xylene, dimethylformamide, or a fluorinated solvent or any mixtures of the exemplified solvents.
- the first solvent may also be selected from non-chlorinated hydrocarbons or functionalised non-chlorinated hydrocarbons, such as non- chlorinated hydrocarbons comprising from 1 to 15 carbon atoms, possibly also comprising e.g. one or more hydroxyl groups.
- the dispersion may also comprise a second polymer.
- This second polymer may be the same as the first polymer comprised in the composition.
- the second polymer may also be a different type of polymer with respect to the first polymer.
- first and second polymers are of the same type.
- the presence of a second polymer in the dispersion may facilitate the nanotubes to stay on the substrate during the film forming process.
- the dispersion can have a concentration of nanotubes from about 0.00001 mg/ml up to about 10 mg/ml, suitably from about 0.0001 mg/ml up to about 10 mg/ml, suitably from about 0.0001 mg/ml up to about 5 mg/ml.
- the first polymer of the present method can be selected from inorganic polymers, organic polymers or even mixtures thereof. According to an embodiment the first polymer is selected from organic polymers.
- the first polymer is selected from conducting or semi-conducting polymers (with delocalized ⁇ electrons).
- Semiconducting polymers can be used with this method to produce electronic devices such as photovoltaic components.
- the first polymer is selected from semi-conducting polymers.
- the semi-conducting polymers may be organic polymers comprising delocalized (conjugated) ⁇ - electrons. Delocalized ⁇ - electrons may also be referred to as conjugated ⁇ electrons.
- Conjugated ⁇ - electrons or a conjugated system is a system of overlapping p-orbitals (bridging intervening sigma bonds) with delocalized electrons in compounds with alternating single and multiple, often double, bonds which normally decreases the overall energy of the compound and stability.
- conjugated ⁇ - electrons may comprise heterocyclic aromatic monomers substituted with a moiety providing some steric properties to the overall polymeric network.
- the moiety may be a straight or branched alkyl group, suitably straight alkyl group.
- the polymer comprising delocalized (conjugated) ⁇ - electrons is suitably a polymer comprising heterocyclic aromatic monomers such as alkyl substituted thiophene monomers.
- An example is a polythiophene polymer such as poly(3-hexylthiophene-2,5-diyl) also referred to as P3HT.
- the polymer has suitably an average molecular weight form about 3-300 kg/mol.
- a composition is deposited on the first film.
- the composition comprises the first polymer and at least a second solvent.
- This second solvent may be a mixtures of several solvents. It may also be similar or identical to the first solvent.
- the second solvent will not evaporate too fast.
- the second solvent may have a vapour pressure below about 200 mmHg (at 20°C), below about 150 mmHg, below about 100 mmHg, below about 50 mmHg.
- the properties of the second solvent are chosen such to admitting dispersion of the first polymer and good film formation.
- the second solvent may be selected form any of the exemplified first solvents, such as water, or a carbon based organic solvent, such as dichlorobenzene, chlorobenzene, trichlorobenzene, chloroform, toluene, xylene, dimethylformamide, or a fluorinated solvent or any mixtures of the exemplified solvents.
- the second solvent is a mixture of chloroform and 1 ,2- dichlorobenzene.
- the ratio of chloroform and 1 ,2-dichlorobenzene is in the range of from 95:5 to 60:40 based on weight.
- the composition has a concentration of polymer below 8 wt %, preferably between 1 and 5 wt%.
- the method comprises providing the dispersion and the composition, depositing the dispersion on a substrate thereby forming a first film, depositing the composition on the first film thereby forming a second film and thereafter imprinting the films, while the second film (composition) is still partially wet, with a mold providing patterns (three dimensional structure) in the nano-range, wherein the imprinting is conducted at a temperature below about 50°C.
- the substrate and films are compressed during the imprint.
- the method is conducted a low temperatures, such as below about 45°C, such as below about 40°C, below about 35°C, below about 30°C, such as up to about 10°C.
- semiconducting polymers can been used which are temperature sensitive.
- the films are imprinted.
- the films obtain a specific three
- the three dimensional geometric structure of the film is given by the three dimensional geometric structure of the mold.
- the three dimensional geometric structure of the film has an implication on the properties of the conductive or semiconductive material.
- the term nano range implies a value of any dimensional property such as one dimensional properties e.g. length, diameter, radius from around 1 nm up to around 100 pm.
- the three dimensional geometric structure of the film should exhibit patterns with a height of from about 10 nm up to about 10 pm, suitably from about 30 nm up to about 10 pm.
- the shortest length of the pattern is from 30 nm up to about 10 pm.
- the three dimensional geometric structure of the film has the shape of pillars.
- the pillars preferably have an average cross-section area of from about 10 "18 up to 10 "6 , suitably from about 10 "18 to about 10 "7 , preferably from about 10 "16 to about 10 " 8.
- the pillars have a height of from about 5 nm up to about 10 pm, suitably from about 50 nm up to about 10 pm.
- the pillars have a circular cross-section with a diameter of from 5 * 10 "9 to about 100 * 10 "6 .
- Suitable methods of depositing the dispersion and composition for forming films include spin-coating, drop-casting, spray-coating or blade-coating. [00020].
- the method also comprises imprinting the films with a mold.
- the master molds can be formed by optical lithographical, electron-beam lithography, copolymer self-assembly, colloidal assembly, patterning, anodization techniques, etching, molding or nanoimprinting methods.
- a flexible polymer mold is then replicated from the master mold by casting as described below.
- a 10: 1 mixture of PDMS base and curing agent was degassed in a dessicator under rough vacuum and gently poured onto the silicon master mold, followed by curing in an oven for 5 hours at 150°C.
- the PDMS replica mold was carefully detached and used for further imprinting steps.
- a film of the macromolecular material was spin-coated or drop-casted on the substrate from solution, and was imprinted with the PDMS mold until solid nano- or micro- structures, replicating the mold, have formed and created a solid patterned film.
- the mold is flexible and is fabricated from a material having an elastic Young's modulus below about 1 .8 GPa, suitably below about 1 .5 GPa, more preferably below about 1 .0 GPa.
- Poly(dimethylsiloxane) PDMS is a preferred material of the mold.
- the nanotubes or nanowires can be made of carbon, metal or a semiconducting material, and with a diameter as small as about 0.5 nm, and a length up to 100 microns.
- the nanotubes are Single Wall Carbon Nanotubes (SWNTs).
- SWNTs Single Wall Carbon Nanotubes
- SWNTs can preferably have a diameter of from about 0.5 up to about 2 nm, and a length of from about 50 nm to about 1500nm.
- the substrate can comprise several layers. Usually the substrate comprises at least one layer which can be silicon, conducting oxide, plastic substrate, another organic or inorganic film coating.
- Fig. 1 shows different network configurations : nanoscale network vs. random
- Fig 3 shows mobility data for a conductive polymer as function of nanotube concentration for 3 methods: (the current solvent low temperature method, thermal method, random network).
- Fig 5 shows difference in bundle diameter between the room temprature solvent method and the thermal method.
- the solvent method results in smaller bundles of nanotubes compared to thermal method (18nm vs 23nm) and much less larger bundles, resulting in reduced electrical network resistivity.
- Fig. 6 shows the custom-made solvent imprint chamber
- the samples were patterned using a exible polydimethylsiloxane (PDMS) mold.
- the liquid PDMS solution (Sylgard 182) was mixed in a 10: 1 ratio with its precursor and degasified in a vacuum desiccator.
- the still liquid mix was then poured on a patterned silicon master mold and placed in an oven at 150°C for several hours.
- the cured PDMS was then peeled of the silicon master and used as a flexible mold.
- the imprint chamber is shown in Fig. 2.
- the flexible mold was attached to a moving 2 piston while the sample to be patterned was placed at the bottom of the chamber. A weight was placed on the piston before it is slowly lowered down on the sample at room temperature, adding a low pressure of 1 to 2 bar. Nitrogen then flowed through the chamber in order to dry the polymer film, allowing subsequent demolding of the sample.
- the resulting features were characterized using optical microscopy, atomic force microscopy and scanning electron microscopy.
- the conductivity, and/or charge carrier mobility were extracted from the l/V characteristics. The resulting conductivity data was deduced using voltage applied, current measured and the geometry of the sample measured by electron microscopy and atomic force microscopy characterization, with less than 5% error of measurement. The accuracy of measurement on the current measured and voltage applied were within 1 % each.
- the conductivity of the samples depends strongly on the amount of nanotubes added to the dispersion.
- a conductivity of approximately 0.01 S/m was obtained at low concentration of SWNTs (0.001 wt% of polymer) in the nano-network in polystyrene, whereas the random network gave no current at the same concentration.
- a similar conductivity of 0.01 S/m was obtained in the random network by increasing the concentration of nanotubes by 5000 times. This shows the advantage of the method described in reducing the amount of nanotubes to still obtain good conductivity at very low concentration thanks to the formation of a percolated nanoscale network.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
L'invention concerne un procédé pour produire un matériau conducteur ou semi-conducteur qui comprend des nanotubes ou des nanofils, et au moins un polymère soit isolant soit conducteur qui peut comprendre un électron π délocalisé (conjugué).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1550067 | 2015-01-23 | ||
SE1550067-1 | 2015-01-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016118071A1 true WO2016118071A1 (fr) | 2016-07-28 |
Family
ID=56417469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SE2016/050045 WO2016118071A1 (fr) | 2015-01-23 | 2016-01-25 | Procédé de production d'un matériau composite conducteur |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2016118071A1 (fr) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040110856A1 (en) * | 2002-12-04 | 2004-06-10 | Young Jung Gun | Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
US20040241900A1 (en) * | 2001-09-27 | 2004-12-02 | Jun Tsukamoto | Organic semiconductor material and organic semiconductor element employing the same |
US20060081882A1 (en) * | 2004-10-15 | 2006-04-20 | General Electric Company | High performance field effect transistors comprising carbon nanotubes fabricated using solution based processing |
JP2012135071A (ja) * | 2010-12-20 | 2012-07-12 | National Institute Of Advanced Industrial & Technology | アクチュエータ用複合導電性薄膜、アクチュエータ素子 |
-
2016
- 2016-01-25 WO PCT/SE2016/050045 patent/WO2016118071A1/fr active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040241900A1 (en) * | 2001-09-27 | 2004-12-02 | Jun Tsukamoto | Organic semiconductor material and organic semiconductor element employing the same |
US20040110856A1 (en) * | 2002-12-04 | 2004-06-10 | Young Jung Gun | Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
US20060081882A1 (en) * | 2004-10-15 | 2006-04-20 | General Electric Company | High performance field effect transistors comprising carbon nanotubes fabricated using solution based processing |
JP2012135071A (ja) * | 2010-12-20 | 2012-07-12 | National Institute Of Advanced Industrial & Technology | アクチュエータ用複合導電性薄膜、アクチュエータ素子 |
Non-Patent Citations (4)
Title |
---|
BOULANGER, N. ET AL.: "Nano-engineering of SWNT networks for enhanced charge transport at ultralow nanotube loading", ADVANCED MATERIALS, vol. 26, no. 19, 2014, pages 3111 - 3117 * |
BOULANGER, N. ET AL.: "Nanostructured networks of single wall carbon nanotubes for highly transparent, conductive, and anti-reflective flexible electrodes", APPLIED PHYSICS LETTERS, vol. 103, no. 2, 2013, pages 021116.1 - 021116.5 * |
BOULANGER, N. ET AL.: "SWNT nano-engineered networks strongly increase charge transport in P3HT", NANOSCALE, vol. 6, no. 20, 2014, pages 11633 - 11636 * |
MEIER, R. ET AL.: "Film thickness controllable wet-imprinting of nanoscale channels made of conducting or thermoresponsive polymers", JOURNAL OF MATERIALS CHEMISTRY, vol. 22, no. 1, 2012, pages 192 - 198 * |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101609870B (zh) | 有机太阳能电池和其制造方法 | |
Luo et al. | A simple strategy for high stretchable, flexible and conductive polymer films based on PEDOT: PSS-PDMS blends | |
Min et al. | Organic nanowire fabrication and device applications | |
Liu et al. | Graphene oxide derivatives as hole-and electron-extraction layers for high-performance polymer solar cells | |
Jo et al. | Polymer blends with semiconducting nanowires for organic electronics | |
Liu et al. | On the morphology of polymer‐based photovoltaics | |
Xu et al. | Patterning of conjugated polymers for organic optoelectronic devices | |
Zhao et al. | Highly stable and flexible transparent conductive polymer electrode patterns for large-scale organic transistors | |
Briseno et al. | Self-assembly, molecular packing, and electron transport in n-type polymer semiconductor nanobelts | |
Dang et al. | Controlling the morphology and performance of bulk heterojunctions in solar cells. Lessons learned from the benchmark poly (3-hexylthiophene):[6, 6]-phenyl-C61-butyric acid methyl ester system | |
Ahmad | Organic semiconductors for device applications: current trends and future prospects | |
US6987071B1 (en) | Solvent vapor infiltration of organic materials into nanostructures | |
US20090266418A1 (en) | Photovoltaic devices based on nanostructured polymer films molded from porous template | |
Kymakis et al. | Spin coated carbon nanotubes as the hole transport layer in organic photovoltaics | |
Chan et al. | Highly efficient P3HT: C60 solar cell free of annealing process | |
Zhai et al. | Ordered conjugated polymer nano-and microstructures: Structure control for improved performance of organic electronics | |
Kim et al. | Facile and microcontrolled blade coating of organic semiconductor blends for uniaxial crystal alignment and reliable flexible organic field-effect transistors | |
JP2011082517A (ja) | 電子デバイス、薄膜トランジスタおよび半導体層を形成させるためのプロセス | |
CN102959755A (zh) | 有机薄膜太阳能电池及其制造方法 | |
Kadem et al. | Efficient P3HT: SWCNTs hybrids as hole transport layer in P3HT: PCBM organic solar cells | |
Emrick et al. | Nanoscale assembly into extended and continuous structures and hybrid materials | |
Dabirian et al. | The relationship between nanoscale architecture and charge transport in conjugated nanocrystals bridged by multichromophoric polymers | |
Wu et al. | Ordered organic nanostructures fabricated from anodic alumina oxide templates for organic bulk‐heterojunction photovoltaics | |
Huang et al. | Poly (3-hexylthiophene) nanotubes with tunable aspect ratios and charge transport properties | |
Yu et al. | Fabrication of one-dimensional organic nanomaterials and their optoelectronic applications |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 16740475 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 16740475 Country of ref document: EP Kind code of ref document: A1 |