WO2016110104A1 - 内嵌式触摸屏及显示装置 - Google Patents

内嵌式触摸屏及显示装置 Download PDF

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Publication number
WO2016110104A1
WO2016110104A1 PCT/CN2015/087768 CN2015087768W WO2016110104A1 WO 2016110104 A1 WO2016110104 A1 WO 2016110104A1 CN 2015087768 W CN2015087768 W CN 2015087768W WO 2016110104 A1 WO2016110104 A1 WO 2016110104A1
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WIPO (PCT)
Prior art keywords
self
touch panel
cell touch
wires
capacitance
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Application number
PCT/CN2015/087768
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English (en)
French (fr)
Inventor
包智颖
许睿
赵卫杰
吕振华
李彦辰
陈希
王海生
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/915,954 priority Critical patent/US10191599B2/en
Priority to EP15876607.1A priority patent/EP3244292B1/en
Publication of WO2016110104A1 publication Critical patent/WO2016110104A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04166—Details of scanning methods, e.g. sampling time, grouping of sub areas or time sharing with display driving

Definitions

  • At least one embodiment of the present invention is directed to an in-cell touch screen and display device.
  • the touch screen can be divided into an add-on touch panel, an on-cell touch panel, and an in-cell touch panel according to the composition structure.
  • the external touch screen may be a touch-enabled liquid crystal display formed by separately separating the touch screen from a liquid crystal display (LCD) and then bonding them together.
  • the external touch screen has the disadvantages of high production cost, low light transmittance, and thick module.
  • the in-cell touch panel embeds the touch electrode of the touch screen in the interior of the liquid crystal display, which can reduce the overall thickness of the module, and can greatly reduce the manufacturing cost of the touch screen, and is favored by various panel manufacturers.
  • the In cell touch screen utilizes the principle of mutual capacitance or self-capacitance to detect the touch position of the finger.
  • a plurality of self-capacitance electrodes arranged in the same layer and insulated from each other can be disposed in the touch screen.
  • the capacitance of the respective capacitor electrodes is a fixed value
  • the touch detection chip can determine the touch position by detecting the change of the capacitance value of each capacitor electrode during the touch time period.
  • the capacitance of the human body can only act on the projection capacitance in the mutual capacitance.
  • the touch variation caused by the human body touching the screen is greater than the touch screen produced by the mutual capacitance principle. Therefore, The touch screen relative to the mutual capacitance can effectively improve the signal-to-noise ratio of the touch, thereby improving the accuracy of the touch sensing.
  • At least one embodiment of the present invention provides an in-cell touch panel for solving the problem of uneven display screen due to uneven distribution of via holes in the insulating layer.
  • At least one embodiment of the present invention provides an in-cell touch panel including: an upper substrate and a lower substrate disposed opposite to each other, the side of the upper substrate facing the lower substrate or the lower substrate facing a plurality of independent self-capacitance electrodes on one side of the upper substrate, wires disposed in a different layer from the self-capacitance electrodes and correspondingly electrically connected, and an insulating layer between the self-capacitance electrodes and the wires;
  • the insulating layer is provided with at least one first via hole penetrating the insulating layer in a region where each of the self-capacitance electrodes and the wires overlap, and each of the self-capacitance electrodes passes through a corresponding first via hole and a corresponding one.
  • the wires are electrically connected; the respective capacitor electrodes are provided with a second via hole in a region overlapping the other wires except the corresponding wires and at a position corresponding to the first via holes, the second via holes
  • An orthographic projection of the second via on the lower substrate covers an orthographic projection of the first via on the lower substrate.
  • At least one embodiment of the present invention further provides a display device including the above-described in-cell touch panel provided by the embodiment of the present invention.
  • 1 is a schematic structural view of an in-cell touch panel
  • FIG. 2a is a schematic structural diagram of an in-cell touch panel according to an embodiment of the present invention.
  • FIG. 2b is a cross-sectional structural view of the in-cell touch panel shown in FIG. 2a along the A-A' direction;
  • FIG. 2c is a cross-sectional structural view of the in-cell touch panel shown in FIG. 2a along the B-B' direction;
  • FIG. 2 is a cross-sectional view of an in-cell touch panel according to an embodiment of the present invention.
  • FIG. 3 is a second schematic structural diagram of an in-cell touch panel according to an embodiment of the present invention.
  • 3b is a third schematic structural diagram of an in-cell touch panel according to an embodiment of the present invention.
  • 4a is a schematic diagram of driving timing of an in-cell touch panel according to an embodiment of the present invention.
  • 4b is a second schematic diagram of driving timing of an in-cell touch panel according to an embodiment of the present invention.
  • 5a is a partial top plan view showing a specific structure of an in-cell touch panel according to an embodiment of the present invention.
  • 5b is a cross-sectional structural view of an in-cell touch panel at a first via hole according to an embodiment of the present invention
  • FIG. 5c is a cross-sectional structural diagram of an in-cell touch panel at a first via hole and a second via hole according to an embodiment of the present invention.
  • each film layer in the drawings do not reflect the true scale, and are merely intended to illustrate the present invention.
  • a wire corresponding to the self-capacitance electrode is generally disposed.
  • the wires 1 are located below the self-capacitance electrodes 2, and each of the wires 1 is connected only to the self-capacitance electrode 2 corresponding thereto through the via hole 3, and is not electrically connected to the other self-capacitance electrodes 2.
  • the distribution of the via holes 3 in the entire display panel is uneven, and thus the uniformity of the display surface is affected.
  • the in-cell touch panel includes: an upper substrate 100 and a lower substrate 200 disposed opposite to each other, and the upper substrate 100 faces the lower substrate.
  • the insulating layer is provided with at least one first via hole penetrating the insulating layer in a region where the respective capacitor electrodes and the wires overlap, and the respective capacitor electrodes pass through the corresponding first via holes.
  • the respective capacitor electrodes are provided with a second via hole in a region overlapping the other wires except the corresponding wires, and a position corresponding to the first via hole is provided, and the second via hole is penetrated.
  • the self-capacitance electrode, and the orthographic projection of the second via on the lower substrate covers the orthographic projection of the first via on the lower substrate.
  • the in-cell touch panel ensures that the corresponding vias are electrically connected to the self-capacitance electrodes on the basis of ensuring uniform distribution of the first via holes in the insulating layer, except for the corresponding wires and self-capacitance electrodes of the electrical connection.
  • the capacitor electrode is insulated; thus, on the basis of ensuring the correct connection between the self-capacitance electrode and the wire, the problem of uneven display screen due to uneven distribution of via holes in the insulating layer is solved.
  • the insulating layer between the self-capacitance electrode and the wire may include a plurality of film layers, or may include a film layer, as long as the insulating layer is guaranteed
  • the capacitor electrode and the wire are insulated, and are not limited herein.
  • the shape and size of each of the first via holes may be the same.
  • the shape of the first via hole may be a circle, a square, or any geometric shape, which is not limited herein.
  • the first via hole 04 may be smaller than the width of the wire 02 at the corresponding location.
  • the dimension deviation of the wire is generally larger than that of the self-capacitance electrode at the time of fabrication, and therefore, considering the dimensional deviation and alignment accuracy at the time of fabrication, for example,
  • the aperture of the second via hole 05 may be smaller than the width of the wire 02 at the corresponding position.
  • the in-cell touch screen provided by at least one embodiment of the present invention may further include: disposed in the same layer as each of the wires and with each of the first via holes, in consideration of dimensional deviation and alignment accuracy at the time of fabrication.
  • Corresponding conduction base since the thickness of the wire layer is larger than the thickness of the self-capacitance electrode (the thickness of the self-capacitance electrode layer is 400-600 nm), the critical dimension deviation of the wire layer is larger than the electrode layer, and the orthographic projection of each conduction abutment on the lower substrate Covering the orthographic projection of the second via on the lower substrate; each of the wires is connected to the corresponding self-capacitance electrode through a corresponding conductive base.
  • the extending directions of the wires 02 may be the same.
  • the lengths of the respective wires 02 may be the same.
  • a plurality of mutually independent self-capacitance electrodes 01 are arranged in a matrix; the extension direction of the wires 02 Is the column direction or row direction.
  • the self-capacitance electrode for each self-capacitance electrode, the self-capacitance electrode and the The arrangement of the first via holes in the overlapping region of the wires other than the wires electrically connected by the self-capacitance electrodes, and the arrangement of the first via holes in the overlapping region of the self-capacitance electrodes and the electrically connected wires
  • the cloth rules are the same.
  • the wire 02 in order to ensure the uniformity of the trenches in the insulating layer, as shown in FIGS. 3a and 3b, for each of the wires 02, the wire 02 is intersected.
  • the distance between any adjacent two first vias 04 of the stacked region is the same. This ensures that all the first vias in the in-cell touch panel are evenly distributed, thereby ensuring the uniformity of the display screen.
  • a plurality of mutually independent self-capacitance electrodes are disposed in the same layer.
  • all the patterns of the self-capacitance electrodes can be formed by only one patterning process, which can simplify the process steps and save the preparation cost.
  • the self-capacitance electrode can also be prepared in layers, which is not limited herein.
  • the in-cell touch panel provided by any of the above embodiments of the present invention is applicable to both a twisted nematic (TN) liquid crystal display and an advanced super dimension switch (Adwanced Dimension Switch).
  • ADS twisted nematic
  • HADS high aperture ratio advanced super High-Adwanced Dimension Switch
  • IPS In-Plane Switch
  • the common electrode layer of the plate structure is located below the slit-shaped pixel electrode, that is, the common electrode is located between the lower substrate and the pixel electrode.
  • a passivation layer is further disposed between the common electrode and the pixel electrode.
  • the slit-shaped common electrode is located above the pixel electrode of the plate-like structure, that is, the pixel electrode is located between the lower substrate and the common electrode, and a blunt is also disposed between the pixel electrode and the common electrode.
  • the common electrode layer on the lower substrate may be multiplexed into a self-capacitance electrode.
  • the respective capacitor electrodes may constitute a common electrode layer on the side of the lower substrate facing the upper substrate.
  • the in-cell touch panel may further include a touch detection chip 210.
  • the touch detection chip 210 is configured to load a common electrode signal on the respective capacitor electrodes during the display period, and pass the detection during the touch period. The capacitance values of the respective capacitor electrodes are changed to determine the touch position.
  • the respective capacitor electrodes may have a slit-like electrode structure at a position corresponding to the opening region of the pixel (for example, ITO (indium tin oxide) electrode structure or plate electrode structure, that is, each of the capacitor electrodes includes a slit electrode in the HADS mode, for example, the slit electrode structure is an ITO electrode having a slit in a pixel opening region.
  • ITO indium tin oxide
  • the respective capacitor electrodes include plate electrodes (for example, ITO electrodes) to meet the requirements of the liquid crystal display, and at this time, the self-capacitance electrodes can interact with the human body electric field corresponding to the portion of the slit region of the pixel electrode.
  • ITO electrodes for example, ITO electrodes
  • the self-capacitance electrodes can interact with the human body electric field corresponding to the portion of the slit region of the pixel electrode.
  • the density of the touch screen is usually on the order of millimeters. Therefore, in a specific implementation, the density and the occupied area of the respective capacitor electrodes can be selected according to the required touch density to ensure the required touch density, usually the respective capacitive electrode design. It is a square electrode of about 5mm*5mm.
  • the density of the display is usually on the order of micrometers. Therefore, a self-capacitance electrode generally corresponds to multiple pixels in the display.
  • the touch screen provided by the embodiment of the present invention uses the common electrode layer multiplexing as the self-capacitance electrode
  • touch may be adopted.
  • the display driver chip and the touch detection chip can be integrated into one chip, thereby further reducing the production cost.
  • the time of displaying each frame (V-sync) of the touch screen is divided into a display time period (display) and a touch time period (touch), for example, as shown in FIG. 4a and the driving timing diagram shown in FIG. 4b, the time of displaying one frame of the touch screen is 16.7 ms, 5 ms is selected as the touch time period, and the other 11.7 ms is used as the display time period; of course, according to the processing capability of the IC chip
  • the length of the adjustment of the two is not specifically limited here.
  • a gate scan signal is sequentially applied to each of the gate signal lines G1, G2, ..., G n in the touch screen, and a gray scale signal is applied to the data signal line D, and the respective capacitance electrodes Cx1 ... Cx n
  • the connected touch detection chip respectively applies a common electrode signal to the respective capacitance electrodes Cx1 . . . Cx n to realize a liquid crystal display function.
  • the touch detection chip connected to the respective capacitor electrodes Cx1 . . . Cx n simultaneously applies driving signals to the respective capacitor electrodes Cx1 . . . Cx n while receiving respective capacitors.
  • the feedback signals of the respective capacitor electrodes Cx1 . . . Cx n are respectively received, and are not limited herein.
  • the touch signal is determined by determining whether the touch signal is generated by the analysis of the feedback signal.
  • the in-cell touch panel provided by at least one embodiment of the present invention may further include: a data line located under the self-capacitance electrode; each of the wires and the data line are disposed in the same layer and the same material. .
  • each wire can be prepared in the same layer as the data line, so that no new manufacturing process can be added, only the composition of the corresponding film layer needs to be changed, the process step is simplified, the production cost is saved, and the production cost is improved.
  • the second via hole is disposed in the self-capacitance electrode
  • the second via hole does not affect the deflection of the liquid crystal due to the influence of the surrounding electric field, because the display phase is in the display stage.
  • the common electrode voltage is transmitted on the wire, so the voltage at the second via of the self-capacitance electrode can be compensated by the common voltage on the wire, thereby compensating for the influence of the second via hole and ensuring the uniformity of the display picture.
  • the in-cell touch panel may further include: located on the side of the lower substrate 200 facing the upper substrate 100, or located at The upper substrate 100 faces the black matrix layer 110 on the side of the lower substrate 200; the pattern of each of the wires 02 is located in the region where the pattern of the black matrix layer 110 is located in the orthographic projection of the lower substrate 200; or the pattern of each of the second vias 05 is on the lower substrate 200.
  • the orthographic projections are all located in the area of the pattern of the black matrix layer 110.
  • the wire or the second via is designed between the upper and lower pixels, where a black matrix layer is disposed, and the second via is covered by the black matrix layer, so that the liquid crystal which cannot be normally deflected is covered under the black matrix layer. Further, the influence of the second via hole can be reduced, thereby ensuring the uniformity of the display screen.
  • the width of the wire at the position corresponding to the first via hole is generally wider than that at other positions, which is the same as the technique commonly used in the art, and is not used here. limited.
  • the in-cell touch panel may include a base substrate 10, which is sequentially disposed on the base substrate 10.
  • the first via hole 04 penetrates the passivation layer 16, and the self-capacitance electrode 01 is electrically connected to the corresponding conduction base 021 through the first via hole 04, thereby realizing the self-capacitance electrode 01 and the corresponding wire 02. connection.
  • the self-capacitance electrode 01 is provided with a second via hole 05 at a position corresponding to the first via hole 04, and the second via hole 05 covers the first via hole 04, thereby ensuring the second via hole 05.
  • the self-capacitance electrode 01 and the conduction base 021 are insulated from each other.
  • each film layer on the lower substrate can be fabricated by any patterning process commonly used in the art.
  • a patterning process of 6 times can be used: forming a gate electrode and a gate line. a patterning process; a patterning process for forming an active layer; a patterning process for forming a wire, a data line, and a source/drain electrode; a patterning process for forming a pixel electrode; a patterning process for forming a passivation layer; and a patterning process for forming a common electrode layer.
  • 5 patterning processes, 7 patterning processes or 8 patterning processes may be used, which are not limited herein.
  • At least one embodiment of the present invention further provides a display device including the in-cell touch panel provided by any of the above embodiments of the present invention.
  • the display device may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the display device reference may be made to the above embodiment of the in-cell touch panel, and the repeated description is omitted.
  • An in-cell touch panel and a display device are provided.
  • the insulating layer is provided with at least one first via hole penetrating the insulating layer in a region where the respective capacitor electrodes and the wires overlap, and the respective capacitor electrodes pass the corresponding first a via hole is electrically connected to the corresponding wire, and the respective capacitor electrode is provided with a second via hole in a region overlapping the other wire except the wire corresponding thereto and at a position corresponding to the first via hole,
  • the two vias extend through the self-capacitance electrode, and the orthographic projection of the second via on the lower substrate covers the orthographic projection of the first via on the lower substrate.
  • the in-cell touch panel ensures that the corresponding vias are electrically connected to the self-capacitance electrodes on the basis of ensuring uniform distribution of the first via holes in the insulating layer, except for the corresponding wires and self-capacitance electrodes of the electrical connection.
  • the capacitor electrode is insulated; thus, on the basis of ensuring the correct connection between the self-capacitance electrode and the wire, the problem of uneven display screen due to uneven distribution of via holes in the insulating layer is solved.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种内嵌式触摸屏及显示装置，在该内嵌式触摸屏中，绝缘层(03)在各自电容电极(01)与导线(02)交叠的区域内均设置有至少一个贯穿绝缘层(03)的第一过孔(04)，各自电容电极(01)通过对应的第一过孔(04)与对应的导线(02)电连接，各自电容电极(01)在与除了对应的导线(02)之外的其它的导线(02)交叠的区域内、且与第一过孔(04)对应的位置处设置有第二过孔(05)，第二过孔(05)贯穿自电容电极(01)，且第二过孔(05)在下基板(200)的正投影覆盖第一过孔(04)在下基板(200)上的正投影。该内嵌式触摸屏可解决由于绝缘层(03)中过孔分布不均匀导致的显示画面不均匀的问题。

Description

内嵌式触摸屏及显示装置 技术领域
本发明的至少一个实施例涉及一种内嵌式触摸屏及显示装置。
背景技术
随着显示技术的飞速发展，触摸屏(Touch Screen Panel)已经逐渐遍及人们的生活中。目前，触摸屏按照组成结构可以分为：外挂式触摸屏(Add on Mode Touch Panel)、覆盖表面式触摸屏(On Cell Touch Panel)、以及内嵌式触摸屏(In Cell Touch Panel)。例如，外挂式触摸屏可以是将触摸屏与液晶显示屏(Liquid Crystal Display，LCD)分开生产，然后贴合到一起形成的具有触摸功能的液晶显示屏。外挂式触摸屏存在制作成本较高、光透过率较低、模组较厚等缺点。例如，内嵌式触摸屏将触摸屏的触控电极内嵌在液晶显示屏内部，可以减薄模组整体的厚度，又可以大大降低触摸屏的制作成本，受到各大面板厂家青睐。
目前，内嵌(In cell)式触摸屏是利用互电容或自电容的原理实现检测手指触摸位置。利用自电容的原理可以在触摸屏中设置多个同层设置且相互绝缘的自电容电极，当人体未触碰屏幕时，各自电容电极所承受的电容为一固定值，当人体触碰屏幕时，对应的自电容电极所承受的电容为固定值叠加人体电容，触控侦测芯片在触控时间段通过检测各自电容电极的电容值变化可以判断出触控位置。由于人体电容可以作用于全部自电容，相对于人体电容仅能作用于互电容中的投射电容，由人体碰触屏幕所引起的触控变化量会大于利用互电容原理制作出的触摸屏，因此，相对于互电容的触摸屏能有效提高触控的信噪比，从而提高触控感应的准确性。
发明内容
本发明的至少一个实施例提供了一种内嵌式触摸屏，用以解决由于绝缘层中过孔分布不均匀导致的显示画面不均匀的问题。
本发明的至少一个实施例提供了一种内嵌式触摸屏，其包括：相对设置的上基板和下基板，位于所述上基板面向所述下基板一侧或所述下基板面向 所述上基板一侧的多个相互独立的自电容电极、与各所述自电容电极异层设置且对应电连接的导线、以及位于所述自电容电极与所述导线之间的绝缘层；所述绝缘层在各所述自电容电极与导线交叠的区域内均设置有至少一个贯穿所述绝缘层的第一过孔，各所述自电容电极通过对应的第一过孔与对应的导线电连接；各自电容电极在与除了对应的导线之外的其它的导线交叠的区域内、且与所述第一过孔对应的位置处设置有第二过孔，所述第二过孔贯穿所述自电容电极，且所述第二过孔在所述下基板的正投影覆盖所述第一过孔在所述下基板上的正投影。
本发明的至少一个实施例还提供了一种显示装置，其包括本发明实施例提供的上述内嵌式触摸屏。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为一种内嵌式触摸屏的结构示意图；
图2a为本发明实施例提供的内嵌式触摸屏的结构示意图之一；
图2b为图2a所示的内嵌式触摸屏沿A-A’方向的剖面结构示意图；
图2c为图2a所示的内嵌式触摸屏沿B-B’方向的剖面结构示意图；
图2d为本发明实施例提供的内嵌式触摸屏的剖视示意图；
图3a为本发明实施例提供的内嵌式触摸屏的结构示意图之二；
图3b为本发明实施例提供的内嵌式触摸屏的结构示意图之三；
图4a为本发明实施例提供的内嵌式触摸屏的驱动时序示意图之一；
图4b为本发明实施例提供的内嵌式触摸屏的驱动时序示意图之二；
图5a为本发明实施例提供的内嵌式触摸屏的具体结构的局部俯视示意图；
图5b为本发明实施例提供的内嵌式触摸屏在第一过孔处的剖面结构示意图；
图5c为本发明实施例提供的内嵌式触摸屏在第一过孔和第二过孔处的剖面结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。同样，“一个”、“一”或者“该”等类似词语也不表示数量限制，而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
附图中各膜层的厚度和形状不反映真实比例，目的只是示意说明本发明内容。
在研究中，本申请的发明人注意到，在内嵌式触摸屏中，为了将自电容电极与触控侦测芯片连接，一般会设置与自电容电极对应连接的导线。例如，如图1所示，导线1位于自电容电极2的下方，各导线1仅与与其对应的自电容电极2通过过孔3相连，而与其它自电容电极2是不导通的。但是在这种结构中，整个显示面板中过孔3的分布是不均匀的，因此会影响显示面画的均一性。
本发明的至少一个实施例提供了一种内嵌式触摸屏，如图2a至图2d所示，该内嵌式触摸屏包括：相对设置的上基板100和下基板200，位于上基板100面向下基板200一侧或下基板200面向上基板100一侧的多个相互独立的自电容电极01、与各自电容电极01异层设置且对应电连接的导线02、以及位于自电容电极01与导线02之间的绝缘层03；绝缘层03在各自电容 电极01与导线02交叠的区域内均设置有至少一个贯穿绝缘层03的第一过孔04，各自电容电极01通过对应的第一过孔04与对应的导线02电连接，每条导线02与一个自电容电极01电连接；各自电容电极01在与除了对应的导线02之外的其它的导线02交叠的区域内、且与第一过孔04对应的位置处设置有第二过孔05，第二过孔05贯穿自电容电极01，且第二过孔05在下基板200的正投影覆盖第一过孔04在下基板上的正投影。
本发明实施例提供的上述内嵌式触摸屏中，绝缘层在各自电容电极与导线交叠的区域内均设置有至少一个贯穿绝缘层的第一过孔，各自电容电极通过对应的第一过孔与对应的导线电连接，各自电容电极在与除了对应的导线之外的其它的导线交叠的区域内、且与第一过孔对应的位置处设置有第二过孔，第二过孔贯穿自电容电极，且第二过孔在下基板的正投影覆盖第一过孔在下基板上的正投影。该内嵌式触摸屏在保证绝缘层中第一过孔可以均匀分布的基础上，保证对应的导线与自电容电极电连接，除了电连接的对应的导线与自电容电极之外的其它导线与自电容电极是绝缘的；从而在保证自电容电极与导线正确连接的基础上，解决由于绝缘层中过孔分布不均匀导致的显示画面不均匀的问题。
需要说明的是，在本发明实施例提供的上述内嵌式触摸屏中，自电容电极与导线之间的绝缘层可以包括多层膜层，也可以包括一层膜层，只要该绝缘层保证自电容电极与导线之间是绝缘的即可，在此不作限定。
例如，为了保证显示的均一性，在本发明的至少一个实施例提供的内嵌式触摸屏中，各第一过孔的形状和大小可以均相同。例如，在具体实施时，在本发明实施例提供的上述内嵌式触摸屏中，第一过孔的形状可以为圆形、方形或任何几何形状，在此不作限定。
在具体实施时，考虑到在制作过孔时的尺寸偏差和对位精度，例如，如图2b所示，在本发明的至少一个实施例提供的内嵌式触摸屏中,第一过孔04的孔径可以小于对应位置处导线02的宽度。
在具体实施时，由于导线的厚度一般大于自电容电极的厚度，在制作时，所以导线的尺寸偏差一般会大于自电容电极的，因此，考虑到在制作时的尺寸偏差和对位精度，例如，在本发明的至少一个实施例提供的内嵌式触摸屏中,如图2c所示，第二过孔05的孔径可以小于对应位置处导线02的宽度。
在具体实施时，考虑到在制作时的尺寸偏差和对位精度，例如，本发明的至少一个实施例提供的内嵌式触摸屏还可以包括：与各导线同层设置且与各第一过孔对应的导通基台，由于导线层厚度大于自电容电极厚度(自电容电极层的厚度为400-600nm)，所以导线层关键尺寸偏差大于电极层，且各导通基台在下基板的正投影覆盖第二过孔在下基板的正投影；各导线通过对应的导通基台与对应的自电容电极连接。
例如，为了降低制作难度，以及使导线分布均匀，在本发明的至少一个实施例提供的内嵌式触摸屏中，如图3a和图3b所示，各导线02的延伸方向可以相同。
例如，为了实现等电容设计，在本发明的至少一个实施例提供的嵌式触摸屏中，如图3a和图3b所示，各导线02的长度可以相同。
例如，在本发明的至少一个实施例提供的内嵌式触摸屏中，为了简化制作工艺，如图3a和图3b所示，多个相互独立的自电容电极01呈矩阵排列；导线02的延伸方向为列方向或行方向。
例如，为了保证绝缘层中沟槽(即第一过孔)的均一性，在本发明的至少一个实施例提供的内嵌式触摸屏中，针对每一个自电容电极，位于自电容电极与除了与该自电容电极电连接的导线之外的其它各导线的交叠区域内的第一过孔的排布规律，与自电容电极与电连接的导线的交叠区域内的第一过孔的排布规律相同。
例如，在本发明的至少一个实施例提供的内嵌式触摸屏中，为了保证绝缘层中沟槽的均一性，如图3a和图3b所示，针对每一条导线02，与该导线02有交叠区域的任意相邻两个第一过孔04之间的距离相同。这样保证了内嵌式触摸屏中的所有第一过孔是均匀分布的，从而保证了显示画面的均一性。
例如，为了简化制作工艺，在本发明的至少一个实施例提供的内嵌式触摸屏中，多个相互独立的自电容电极同层设置。这样，只需要通过一次构图工艺就可形成所有自电容电极的图形，能够简化工艺步骤，节省制备成本。当然也可以分层制备自电容电极，在此不做限定。
在具体实施时，本发明的上述任一实施例提供的内嵌式触摸屏，既适用于扭转向列(Twisted Nematic，TN)型液晶显示屏，也适用于高级超维场开关(Adwanced Dimension Switch，ADS)型液晶显示屏、高开口率的高级超 维场开关(High-Adwanced Dimension Switch，HADS)型液晶显示屏和平面内开关(In-Plane Switch，IPS)型液晶显示屏。
例如，在本发明实施例提供的上述内嵌式触摸屏应用于ADS型液晶显示屏时，板状结构的公共电极层位于狭缝状像素电极的下方，即公共电极位于下基板与像素电极之间，并且在公共电极与像素电极之间还设置有钝化层。应用于HADS型液晶显示屏时，狭缝状的公共电极位于板状结构的像素电极的上方，即像素电极位于下基板与公共电极之间，并且在像素电极与公共电极之间还设置有钝化层。
当本发明实施例提供的上述内嵌式触摸屏应用于ADS型或HADS型液晶显示屏时，为了简化制作工艺，以及降低制作成本，可以采用位于下基板上的公共电极层复用为自电容电极的方式，例如，各自电容电极可以组成位于下基板面向上基板一侧的公共电极层。例如，如图2d所示，内嵌式触摸屏还可以包括触控侦测芯片210，触控侦测芯片210配置为在显示时间段对各自电容电极加载公共电极信号，在触控时间段通过检测各自电容电极的电容值变化以判断触控位置。这样，将公共电极层的结构进行变更分割成自电容电极以实现触控功能时，在本领域常用的阵列基板制备工艺的基础上，不需要增加额外的工艺，可以节省生产成本，提高生产效率。
根据上述内嵌式触摸屏具体应用的液晶显示屏的模式，当采用公共电极层复用为各自电容电极时，各自电容电极在与像素的开口区域对应的位置可以具有狭缝状电极结构(例如，ITO(氧化铟锡)电极结构)或板状电极结构，即在HADS模式时各自电容电极包括狭缝状电极，例如，所述狭缝电极结构为在像素开口区域具有狭缝的ITO电极。在ADS模式时，各自电容电极包括板状电极(例如，ITO电极)以满足液晶显示的需求，此时自电容电极可以对应像素电极的狭缝区域的部分与人体电场相互作用。由于ADS模式和HADS模式的液晶显示屏的具体结构均可以采用本领域技术人员常用的技术，在此不再赘述。
一般地，触摸屏的密度通常在毫米级，因此，在具体实施时，可以根据所需的触控密度选择各自电容电极的密度和所占面积以保证所需的触控密度，通常各自电容电极设计为5mm*5mm左右的方形电极。而显示屏的密度通常在微米级，因此，一般一个自电容电极会对应显示屏中的多个像素。
具体地，由于本发明实施例提供的上述触摸屏采用公共电极层复用作为自电容电极的情形中，为了减少显示和触控信号之间的相互干扰，在具体实施时，例如，可以采用触控和显示阶段分时驱动的方式。例如，在具体实施时还可以将显示驱动芯片和触控侦测芯片整合为一个芯片，进一步降低生产成本。
例如：如图4a和图4b所示的驱动时序图中，将触摸屏显示每一帧(V-sync)的时间分成显示时间段(显示)和触控时间段(触控)，例如，如图4a和图4b所示的驱动时序图中触摸屏的显示一帧的时间为16.7ms，选取其中5ms作为触控时间段，其他的11.7ms作为显示时间段；当然也可以根据IC芯片的处理能力适当的调整两者的时长，在此不做具体限定。在显示时间段(显示)，对触摸屏中的每条栅极信号线G1，G2……G n依次施加栅扫描信号，对数据信号线D施加灰阶信号，与各自电容电极Cx1……Cx n连接的触控侦测芯片向各自电容电极Cx1……Cx n分别施加公共电极信号，以实现液晶显示功能。在触控时间段(触控)，如图4a所示，与各自电容电极Cx1……Cx n连接的触控侦测芯片向各自电容电极Cx1……Cx n同时施加驱动信号，同时接收各自电容电极Cx1……Cx n的反馈信号；或者，也可以如图4b所示，与各自电容电极Cx1……Cx n连接的触控侦测芯片向各自电容电极Cx1……Cx n依次施加驱动信号，分别接收各自电容电极Cx1……Cx n的反馈信号，在此不做限定，通过对反馈信号的分析判断是否发生触控，以实现触控功能。
例如，为了简化制作工艺，以及降低制作成本，本发明的至少一个实施例提供的上述内嵌式触摸屏还可以包括：位于自电容电极下方的数据线；各导线与数据线设置为同层同材质。这样，在制备时，可以将各导线与数据线同层制备，从而不用增加新的制备工艺，仅需变更对应的膜层的构图即可实现，简化了工艺步骤，节省了生产成本，提高了生产效率。
本发明实施例提供的上述内嵌式触摸屏，虽然自电容电极中设置有第二过孔，但是第二过孔不会因对周围的电场产生影响而影响液晶的偏转，这是因为在显示阶段，导线上传输的是公共电极电压，所以自电容电极的第二过孔处的电压可以由导线上的公共电压弥补，从而补偿第二过孔产生的影响，保证显示画面的均一性。
例如，为了避免自电容电极上的第二过孔对液晶层带来影响，本发明的至少一个实施例提供的内嵌式触摸屏还可以包括：位于下基板200面向上基板100一侧，或位于上基板100面向下基板200一侧的黑矩阵层110；各导线02的图形在下基板200的正投影均位于黑矩阵层110的图形所在区域内；或各第二过孔05的图形在下基板200的正投影均位于黑矩阵层110的图形所在区域内。这样，将导线或者第二过孔设计在上下两行像素之间，这里设置有黑矩阵层，通过黑矩阵层覆盖住第二过孔，从而将不能正常偏转的液晶覆盖在黑矩阵层下，进一步可以降低第二过孔产生的影响，从而保证显示画面的均一性。
例如，在本发明实施例提供的上述内嵌式触摸屏中，导线一般在与第一过孔对应的位置处的宽度较其它位置处的宽，这与本领域常用的技术中相同，在此不作限定。
下面通过一个具体的实施例说明本发明实施例提供的上述内嵌式触摸屏，例如，如图5a至图5c所示，内嵌式触摸屏可以包括：衬底基板10，依次位于衬底基板10上的栅电极11、栅极绝缘层12、有源层13、同层设置的导线02、导通基台021、源/漏电极14以及数据线17、像素电极层15、钝化层16和由自电容电极01组成的公共电极层001。如图5b所示，第一过孔04贯穿钝化层16，自电容电极01通过第一过孔04与对应的导通基台021电连接，从而实现自电容电极01与对应导线02的电连接。如图5c所示，自电容电极01在与第一过孔04对应的位置处设置有第二过孔05，第二过孔05覆盖第一过孔04，从而保证第二过孔05处的自电容电极01与导通基台021之间相互绝缘。
在具体实施时，本发明实施例提供的上述触摸屏中，可以采用本领域常用的任意一种构图流程制作下基板上的各膜层，例如可以采用6次构图工艺：形成栅电极和栅线的构图工艺；形成有源层的构图工艺；形成导线、数据线和源漏电极的构图工艺；形成像素电极的构图工艺；形成钝化层的构图工艺；以及形成公共电极层的构图工艺。当然也可以根据实际设计，采用5次构图工艺、7次构图工艺或8次构图工艺，在此不做限定。
基于同一发明构思，本发明的至少一个实施例还提供了一种显示装置，其包括本发明上述任一实施例提供的内嵌式触摸屏。
例如，该显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。该显示装置的实施可以参见上述内嵌式触摸屏的实施例，重复之处不再赘述。
本发明实施例提供的一种内嵌式触摸屏及显示装置，绝缘层在各自电容电极与导线交叠的区域内均设置有至少一个贯穿绝缘层的第一过孔，各自电容电极通过对应的第一过孔与对应的导线电连接，各自电容电极在与除了与其对应的导线之外的其它的导线交叠的区域内、且与第一过孔对应的位置处设置有第二过孔，第二过孔贯穿自电容电极，且第二过孔在下基板的正投影覆盖第一过孔在下基板上的正投影。该内嵌式触摸屏在保证绝缘层中第一过孔可以均匀分布的基础上，保证对应的导线与自电容电极电连接，除了电连接的对应的导线与自电容电极之外的其它导线与自电容电极是绝缘的；从而在保证自电容电极与导线正确连接的基础上，解决由于绝缘层中过孔分布不均匀导致的显示画面不均匀的问题。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2015年1月9日递交的中国专利申请第201510012621.6号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (15)

  1. 一种内嵌式触摸屏，包括：相对设置的上基板和下基板，位于所述上基板面向所述下基板一侧或所述下基板面向所述上基板一侧的多个相互独立的自电容电极、与各所述自电容电极异层设置且对应电连接的导线、以及位于所述自电容电极与所述导线之间的绝缘层；其中：
    所述绝缘层在各所述自电容电极与导线交叠的区域内均设置有至少一个贯穿所述绝缘层的第一过孔，各所述自电容电极通过对应的第一过孔与对应的导线电连接；
    各自电容电极在与除了对应的导线之外的其它的导线交叠的区域内、且与所述第一过孔对应的位置处设置有第二过孔，所述第二过孔贯穿所述自电容电极，且所述第二过孔在所述下基板的正投影覆盖所述第一过孔在所述下基板上的正投影。
  2. 如权利要求1所述的内嵌式触摸屏，其中，各所述第一过孔的形状和大小均相同。
  3. 如权利要求1或2所述的内嵌式触摸屏，其中，所述第一过孔的孔径小于对应位置处导线的宽度。
  4. 如权利要求1-3任一项所述的内嵌式触摸屏，其中，所述第二过孔的孔径小于对应位置处导线的宽度。
  5. 如权利要求1-4任一项所述的内嵌式触摸屏，还包括：与各所述导线同层设置且与各所述第一过孔对应的导通基台，且各所述导通基台在所述下基板的正投影覆盖所述第二过孔在所述下基板的正投影；
    各所述导线通过对应的导通基台与对应的自电容电极连接。
  6. 如权利要求1-5任一项所述的内嵌式触摸屏，其中，各所述导线的延伸方向相同。
  7. 如权利要求1-6任一项所述的内嵌式触摸屏，其中，各所述导线长度相同。
  8. 如权利要求1-7任一项所述的内嵌式触摸屏，其中，所述多个相互独立的自电容电极呈矩阵排列；
    所述导线的延伸方向为列方向或行方向。
  9. 如权利要求1-8任一项所述的内嵌式触摸屏，其中，针对每一个自电容电极，位于所述自电容电极与除了电连接的导线之外的其它各导线的交叠区域内的第一过孔的排布规律，与所述自电容电极与电连接的导线的交叠区域内的第一过孔的排布规律相同。
  10. 如权利要求1-9任一项所述的内嵌式触摸屏，其中，针对每一条导线，与所述导线有交叠区域的任意相邻两个第一过孔之间的距离相同。
  11. 如权利要求1-10任一项所述的内嵌式触摸屏，其中，所述多个相互独立的自电容电极同层设置。
  12. 如权利要求11所述的内嵌式触摸屏，其中，各所述自电容电极设置于位于所述下基板面向所述上基板一侧的公共电极层中，所述内嵌式触摸屏还包括：触控侦测芯片；
    所述触控侦测芯片配置为在显示时间段对各所述自电容电极加载公共电极信号，在触控时间段通过检测各所述自电容电极的电容值变化以判断触控位置。
  13. 如权利要求1-12任一项所述的内嵌式触摸屏，还包括：位于所述自电容电极下方的数据线；
    各所述导线与所述数据线设置为同层同材质。
  14. 如权利要求1-13任一项所述的内嵌式触摸屏，还包括：位于所述下基板面向所述上基板一侧，或位于所述上基板面向所述下基板一侧的黑矩阵层；
    各所述导线的图形在所述下基板的正投影均位于所述黑矩阵层的图形所在区域内；或各所述第二过孔的图形在所述下基板的正投影均位于所述黑矩阵层的图形所在区域内。
  15. 一种显示装置，包括如权利要求1-14任一项所述的内嵌式触摸屏。
PCT/CN2015/087768 2015-01-09 2015-08-21 内嵌式触摸屏及显示装置 WO2016110104A1 (zh)

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Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3153956B1 (en) * 2014-05-30 2020-05-06 BOE Technology Group Co., Ltd. Capacitive touch structure, embedded touchscreen, display device and scanning method therefor
CN104503648B (zh) * 2015-01-09 2017-06-09 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN107765488B (zh) * 2015-04-01 2019-12-31 上海天马微电子有限公司 阵列基板、触控显示面板和触控显示装置
CN104965622B (zh) * 2015-04-01 2018-09-28 上海天马微电子有限公司 阵列基板以及显示面板
CN105138184B (zh) * 2015-09-25 2018-06-22 深圳市华星光电技术有限公司 一种内嵌触摸液晶面板及其阵列基板
CN105677076B (zh) 2015-12-28 2018-09-25 上海天马微电子有限公司 触控显示装置、触控显示面板及阵列基板
CN105607325B (zh) * 2016-01-05 2018-09-04 京东方科技集团股份有限公司 触控屏及显示装置
CN105629546A (zh) * 2016-01-19 2016-06-01 深圳市华星光电技术有限公司 触摸面板以及其制造方法
KR20180038603A (ko) * 2016-10-06 2018-04-17 삼성디스플레이 주식회사 터치 스크린 및 이를 구비한 표시 장치
US10871670B2 (en) 2017-02-15 2020-12-22 Sharp Kabushiki Kaisha Display device with position input function
CN106909249B (zh) * 2017-02-24 2020-06-09 厦门天马微电子有限公司 触控显示基板和触控显示装置
JP6849501B2 (ja) * 2017-03-29 2021-03-24 株式会社ジャパンディスプレイ 表示装置
JP2019053116A (ja) 2017-09-13 2019-04-04 シャープ株式会社 位置入力機能付き表示装置
JP2019053117A (ja) * 2017-09-13 2019-04-04 シャープ株式会社 位置入力機能付き表示装置
CN109976047B (zh) * 2018-01-02 2021-03-16 京东方科技集团股份有限公司 触控电极结构、触控基板及制备方法、显示面板及装置
US11216128B2 (en) 2019-02-26 2022-01-04 Beijing Boe Display Technology Co., Ltd. Touch-sensing display substrate, touch-sensing display apparatus, method of operating touch sensing display apparatus, and method of fabricating touch-sensing display substrate
CN110442255B (zh) * 2019-02-26 2021-08-27 京东方科技集团股份有限公司 触控基板及触控显示装置
US11106072B2 (en) * 2019-02-27 2021-08-31 Sharp Kabushiki Kaisha Display device
CN110196521A (zh) * 2019-05-30 2019-09-03 京东方科技集团股份有限公司 阵列基板及其制作方法、显示装置
CN111665999A (zh) * 2020-07-29 2020-09-15 京东方科技集团股份有限公司 显示装置及其自容式触控面板
CN117950526A (zh) * 2020-11-12 2024-04-30 武汉华星光电半导体显示技术有限公司 触控面板和显示装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104020893A (zh) * 2014-05-30 2014-09-03 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN104142772A (zh) * 2014-07-24 2014-11-12 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN104503648A (zh) * 2015-01-09 2015-04-08 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI298613B (en) * 2006-05-19 2008-07-01 Foxconn Advanced Tech Inc Method for manufacturing via holes used in printed circuit boards
CN102650916B (zh) * 2011-02-25 2014-11-26 乐金显示有限公司 集成触摸传感器的显示设备
JP2012221998A (ja) * 2011-04-04 2012-11-12 Toshiba Corp 半導体装置ならびにその製造方法
US9478590B2 (en) * 2012-05-22 2016-10-25 Superc-Touch Corporation In-cell OLED touch display panel structure with metal layer for sensing
US9588368B2 (en) * 2012-07-20 2017-03-07 Shanghai Tianma Micro-electronics Co., Ltd. Touch display panel
CN104049800B (zh) * 2014-05-30 2017-02-15 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN104022127B (zh) * 2014-05-30 2016-10-05 京东方科技集团股份有限公司 一种阵列基板及其制作方法、以及显示装置
CN104102402B (zh) * 2014-06-25 2017-01-25 京东方科技集团股份有限公司 触控基板及显示装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104020893A (zh) * 2014-05-30 2014-09-03 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN104142772A (zh) * 2014-07-24 2014-11-12 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置
CN104503648A (zh) * 2015-01-09 2015-04-08 京东方科技集团股份有限公司 一种内嵌式触摸屏及显示装置

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