WO2016101350A1 - 彩色滤光片的制作方法 - Google Patents

彩色滤光片的制作方法 Download PDF

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Publication number
WO2016101350A1
WO2016101350A1 PCT/CN2015/070262 CN2015070262W WO2016101350A1 WO 2016101350 A1 WO2016101350 A1 WO 2016101350A1 CN 2015070262 W CN2015070262 W CN 2015070262W WO 2016101350 A1 WO2016101350 A1 WO 2016101350A1
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Prior art keywords
color filter
substrate
black matrix
light shielding
layer
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English (en)
French (fr)
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张瑞军
覃事建
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/436,027 priority Critical patent/US20160370649A1/en
Publication of WO2016101350A1 publication Critical patent/WO2016101350A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a method for fabricating a color filter.
  • the color filter substrate is used to make the display device display a color image.
  • the color filter substrate includes color filter elements disposed at different positions of the substrate, such as a red filter element, a green filter element, and a blue filter element.
  • the process of color filter components generally includes a yellow light process.
  • the temperature of the yellow light process is as high as 200 degrees or more.
  • the color filter substrate of the flexible display device is generally a material using a flexible material as a substrate, such as polyethylene terephthalate (PET) or the like.
  • PET polyethylene terephthalate
  • Tg glass transition temperature of a plastic substrate is usually much lower than the temperature of the yellow light process (for example, the glass transition temperature of polyethylene terephthalate is about 80 degrees). Therefore, the plastic substrate is not suitable for the yellow light process.
  • the color filter layer needs to have a part of the overlap with the black matrix.
  • the purpose of this method is to avoid light leakage, because the color filter layer shrinks when baking, if the color filter is designed.
  • the layer does not coincide with the black matrix, which is likely to cause light leakage defects after baking in the yellow light process.
  • the color filter layer needs to overlap with the black matrix.
  • the area where the color filter layer and the black matrix overlap is higher than the sub-pixel area, forming a “step difference”, which is very important for the subsequent process of the box. Adverse effects can disturb the orientation of the liquid crystal.
  • the technical problem to be solved by the present invention is to provide a method for fabricating a color filter, which makes The color filter has a smooth surface with no steps and prevents light leakage.
  • An embodiment of the present invention provides a method for fabricating a color filter, comprising: applying a light shielding layer on a surface of a substrate; and trenching the light shielding layer to form a black matrix layer and a sub-pixel region,
  • the black matrix includes a bottom surface and a top surface, the bottom surface is attached to the substrate, the top surface is located on a surface of the black matrix away from the substrate, and an area of the bottom surface is smaller than an area of the top surface,
  • the sub-pixel regions are alternately spaced from the black matrix, wherein each of the sub-pixel regions is located between two adjacent black matrices; a color filter layer is formed in the sub-pixel region.
  • the step of applying the light shielding layer on the surface of the substrate comprises: forming a film layer on the substrate by brushing, spraying, or the like, and performing curing treatment by UV light.
  • the film layer has a uniform thickness.
  • the light shielding layer is cut by a water cutting technique to perform grooving of the light shielding layer.
  • the step of forming a color filter layer in the sub-pixel region includes: dropping a pixel resin and performing a curing process by UV light.
  • the thickness of the light shielding layer and the filter layer are the same, so that the surface of the color filter is flat.
  • cross section of the black matrix perpendicular to the substrate is trapezoidal.
  • the substrate is a flexible substrate.
  • a method for fabricating a color filter includes: applying a light shielding layer to a surface of a substrate; and cutting the light shielding layer by a water cutting technique to achieve the light shielding layer Slotting to form a black matrix layer and a sub-pixel region, the black matrix including a bottom surface and a top surface, the bottom surface being attached to the substrate, the top surface being located on a surface of the black matrix away from the substrate, The area of the bottom surface is smaller than the area of the top surface, and the sub-pixel area is alternately spaced from the black matrix, wherein each of the sub-pixel areas is located between two adjacent black matrices; The pixel resin is dropped onto the sub-pixel region, and is cured by UV light to form a color filter layer.
  • the light shielding layer and the filter layer have the same thickness such that the surface of the color filter smooth.
  • cross section of the black matrix perpendicular to the substrate is trapezoidal.
  • the substrate is a flexible substrate.
  • the present invention improves the quality of the substrate by grooving the light shielding layer to form a black matrix layer and a sub-pixel region, and using the low temperature cutting technology to replace the yellow light process in the prior art to achieve the step of grooving.
  • the black matrix includes a bottom surface and a top surface, the bottom surface is attached to the substrate, and the top surface is located on a surface of the black matrix away from the substrate, and an area of the bottom surface is smaller than an area of the top surface.
  • FIG. 1 is a schematic view showing a coating of a light shielding layer on a substrate in a method of fabricating a color filter according to an embodiment of the present invention.
  • FIG. 2 is a schematic view showing the light shielding layer being grooved on the basis of FIG. 1.
  • FIG. 2 is a schematic view showing the light shielding layer being grooved on the basis of FIG. 1.
  • FIG. 3 is a schematic diagram of forming a color filter layer in the sub-pixel region on the basis of FIG. 2.
  • the present invention relates to a method of fabricating a color filter, CF, and Figures 1 through 3 illustrate the steps of the fabrication process.
  • the method for producing a color filter of the present invention comprises the following steps.
  • the light shielding layer is applied to the surface of the substrate as shown in FIG.
  • the substrate is a flexible substrate, and may be a substrate made of a material such as glass, quartz or transparent resin.
  • the surface of the substrate is flat to facilitate coating of the light shielding layer.
  • the step of applying the light shielding layer to the surface of the substrate includes: brushing, spraying, etc.
  • the film is formed on the substrate and then cured by UV light (ie, ultraviolet light).
  • the film layer has a uniform thickness.
  • the light shielding layer is grooved to form a black matrix layer and a sub-pixel region.
  • the invention cuts the light shielding layer by a water cutting technique to realize grooving the light shielding layer. After cutting, a plurality of black matrices are formed, and two adjacent black matrices are spaced apart from each other, and a sub-pixel region is formed between each adjacent two black matrices, that is, the sub-pixel regions are alternately spaced from the black matrix. Moreover, in the process of cutting the light shielding layer, the size of the end surface of the side of each black matrix away from the substrate is made larger than the size of the end surface adjacent to the substrate side by oblique cutting.
  • the cross section perpendicular to the substrate of each black matrix has a trapezoidal shape, which is large and small, and the shape of the black matrix can prevent the color filter from leaking light.
  • the sides of the trapezoidal black matrix are all flat.
  • the side of the black matrix, especially the side adjacent to the sub-pixel region may also be a curved surface, which may be combined by multiple planes, as long as the black matrix is kept away from the substrate.
  • the size of the side end surface is larger than the surface size of the bonded substrate, that is, the effect of preventing light leakage can be achieved.
  • Each black matrix has a specific structure: the black matrix includes a bottom surface and a top surface, the bottom surface is attached to the substrate, and the top surface is located on a surface of the black matrix away from the substrate, and an area of the bottom surface Less than the area of the top surface.
  • Forming the color filter layer in the sub-pixel region specifically includes the steps of: dispensing the pixel resin, and performing curing treatment by UV light.
  • the light shielding layer and the filter layer have the same thickness such that the surface of the color filter is flat.
  • the present invention improves the quality of the substrate by grooving the light shielding layer to form a black matrix layer and a sub-pixel region, and using the low temperature cutting technology to replace the yellow light process in the prior art to achieve the step of grooving.
  • the black matrix includes a bottom surface and a top surface, the bottom surface is attached to the substrate, and the top surface is located on a surface of the black matrix away from the substrate, and an area of the bottom surface is smaller than an area of the top surface.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)

Abstract

一种彩色滤光片的制作方法，包括：将遮光层（20）涂布于基板（10）的表面；对所述遮光层（20）进行开槽，形成黑矩阵层（22）和次像素区域，所述黑矩阵（22）包括底面和顶面，所述底面贴合于所述基板（10），所述顶面位于所述黑矩阵（22）之远离所述基板（10）的表面，所述底面的面积小于所述顶面的面积，所述次像素区域与所述黑矩阵（22）交替间隔设置，其中每个所述次像素区域位于相邻的两个所述黑矩阵（22）之间；在所述次像素区域形成彩色滤光层（40）。通过彩色滤光片的制作方法得到的彩色滤光片表面平整，无段差，且能防止漏光。

Description

彩色滤光片的制作方法
本发明要求2014年12月26日递交的发明名称为“彩色滤光片的制作方法”的申请号201410833241.4的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及液晶显示技术领域，特别是涉及一种彩色滤光片的制作方法。
背景技术
彩色滤光基板是用来使显示装置达到显示彩色影像的目的。彩色滤光基板包括配置在基材不同位置的彩色滤光元件例如红色滤光元件、绿色滤光元件与蓝色滤光元件。彩色滤光元件的制程一般包括黄光制程。黄光制程的温度高达200度以上。软性显示装置之彩色滤光基板一般是使用具有可挠性质的材料作为基材，例如聚对苯二甲酸二乙酯(PET)等等的塑料。然而，塑料基板的玻璃转变温度(Tg)通常是远低于黄光制程的温度(例如，聚对苯二甲酸二乙酯的玻璃转变温度约为80度)。因此，塑料基板并不适用于黄光制程。
在目前工艺制作彩色滤光片时，彩色滤光层需要与黑矩阵有一部分重合区域，该做法的目的是避免漏光，由于彩色滤光层在烘烤时体积会收缩，如果设计时彩色滤光层不与黑矩阵重合，那在黄光制程的烘烤后极易造成漏光缺陷。彩色滤光层需要与黑矩阵有一部分重合的做法虽然避免了漏光，但是彩色滤光层与黑矩阵重合的区域要高于次像素区，形成了“段差”，对后续的对盒工艺有很不利的影响，会扰乱液晶的取向。
发明内容
本发明所要解决的技术问题在于提供一种彩色滤光片的制作方法，使得制 作的彩色滤光片表面平整，无段差，且能防止漏光。
为了实现上述目的，本发明实施方式提供如下技术方案：
本发明一种实施方式中提供一种彩色滤光片的制作方法，包括：将遮光层涂布于基板的表面；对所述遮光层进行开槽，形成黑矩阵层和次像素区域，所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，所述次像素区域与所述黑矩阵交替间隔设置，其中每个所述次像素区域位于相邻的两个所述黑矩阵之间；在所述次像素区域形成彩色滤光层。
其中，将遮光层涂布于基板的表面的步骤包括：通过刷涂、喷涂等方法在所述基板上形成膜层，再通过UV光进行固化处理。
其中，所述膜层厚度均匀。
其中，通过水割技术对所述遮光层进行切割，以实现对所述遮光层进行开槽。
其中，在切割所述遮光层的过程中，用倾斜切割的方法。
其中，在所述次像素区域形成彩色滤光层的步骤包括：滴涂像素树脂，通过UV光进行固化处理。
其中，所述遮光层和所述滤光层的厚度相同，使得所述彩色滤光片的表面平整。
其中，所述黑矩阵的垂直于所述基板的截面呈梯形。
其中，所述基板为柔性基板。
本发明另一种实施方式中提供一种彩色滤光片的制作方法，包括：将遮光层涂布于基板的表面；通过水割技术对所述遮光层进行切割，以实现对所述遮光层进行开槽，形成黑矩阵层和次像素区域，所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，所述次像素区域与所述黑矩阵交替间隔设置，其中每个所述次像素区域位于相邻的两个所述黑矩阵之间；在所述次像素区域滴涂像素树脂，通过UV光进行固化处理，以形成彩色滤光层。
其中，在切割所述遮光层的过程中，用倾斜切割的方法。
其中，所述遮光层和所述滤光层的厚度相同，使得所述彩色滤光片的表面 平整。
其中，所述黑矩阵的垂直于所述基板的截面呈梯形。
其中，所述基板为柔性基板。
本发明通过对所述遮光层进行开槽，形成黑矩阵层和次像素区域，且利用低温切割技术代替现有技术中的黄光制程实现开槽的步骤，提高了基板的质量。所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，通过黑矩阵的上大下小的结构设计，且使得彩色滤光片表面平整，无段差，且能防止漏光。
附图说明
为了更清楚地说明本发明的技术方案，下面将对实施方式中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以如这些附图获得其他的附图。
图1是本发明一种实施方式提供的彩色滤光片的制作方法中在基板上涂布好遮光层的示意图。
图2是在图1的基础上，对所述遮光层进行开槽后的示意图。
图3在图2的基础上，在所述次像素区域形成彩色滤光层的示意图。
具体实施方式
下面将结合本发明实施方式中的附图，对本发明实施方式中的技术方案进行清楚、完整地描述。
本发明涉及一种彩色滤光片，即CF，的制作方法，图1至图3描述了制作的步骤过程。本发明之彩色滤光片的制作方法，包括如下步骤。
将遮光层涂布于基板的表面，如图1所示。具体而言，所述基板为柔性基板，也可以为玻璃、石英、透明树脂等材质的基板。基板的表面平坦，以利于遮光层的涂布。将遮光层涂布于基板的表面的步骤包括：通过刷涂、喷涂等方 法在所述基板上形成膜层，再通过UV光(即紫外光线)进行固化处理。所述膜层厚度均匀。
对所述遮光层进行开槽，形成黑矩阵层和次像素区域。本发明通过水割技术对所述遮光层进行切割，以实现对所述遮光层进行开槽。切割后形成多个黑矩阵，相邻的两个黑矩阵彼此间隔，次像素区域即形成在每相邻的两个黑矩阵之间，即所述次像素区域与所述黑矩阵交替间隔设置。而且，在切割所述遮光层的过程中，用倾斜切割的方法，使得每个黑矩阵的远离基板的一侧的端面尺寸大于贴近基板一侧的端面尺寸。每个黑矩阵的垂直于所述基板的截面呈梯形，上大下小，黑矩阵这样的形状能够防止彩色滤光片漏光。呈梯形的黑矩阵的侧面均为平面，其它的实施方式中，黑矩阵的侧面，特别是与次像素区域邻接的侧面也可以为曲面，可由多段平面组合而成，只要保证黑矩阵远离基板一侧的端面的尺寸大于贴合基板的表面尺寸，即能实现防漏光的效果。
每个黑矩阵具体结构为：所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积。
在所述次像素区域形成彩色滤光层，具体包括如下步骤：滴涂像素树脂，通过UV光进行固化处理。
所述遮光层和所述滤光层的厚度相同，使得所述彩色滤光片的表面平整。
本发明通过对所述遮光层进行开槽，形成黑矩阵层和次像素区域，且利用低温切割技术代替现有技术中的黄光制程实现开槽的步骤，提高了基板的质量。所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，通过黑矩阵的上大下小的结构设计，且使得彩色滤光片表面平整，无段差，且能防止漏光。
以上所述是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也视为本发明的保护范围。

Claims (14)

  1. 一种彩色滤光片的制作方法，其特征在于，包括：
    将遮光层涂布于基板的表面；
    对所述遮光层进行开槽，形成黑矩阵层和次像素区域，所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，所述次像素区域与所述黑矩阵交替间隔设置，其中每个所述次像素区域位于相邻的两个所述黑矩阵之间；
    在所述次像素区域形成彩色滤光层。
  2. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，将遮光层涂布于基板的表面的步骤包括：通过刷涂、喷涂等方法在所述基板上形成膜层，再通过UV光进行固化处理。
  3. 如权利要求2所述的彩色滤光片的制作方法，其特征在于，所述膜层厚度均匀。
  4. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，通过水割技术对所述遮光层进行切割，以实现对所述遮光层进行开槽。
  5. 如权利要求4所述的彩色滤光片的制作方法，其特征在于，在切割所述遮光层的过程中，用倾斜切割的方法。
  6. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，在所述次像素区域形成彩色滤光层的步骤包括：滴涂像素树脂，通过UV光进行固化处理。
  7. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述遮光层和所述滤光层的厚度相同，使得所述彩色滤光片的表面平整。
  8. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述黑矩阵的垂直于所述基板的截面呈梯形。
  9. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述基板为柔性基板。
  10. 一种彩色滤光片的制作方法，其特征在于，包括：
    将遮光层涂布于基板的表面；
    通过水割技术对所述遮光层进行切割，以实现对所述遮光层进行开槽，形 成黑矩阵层和次像素区域，所述黑矩阵包括底面和顶面，所述底面贴合于所述基板，所述顶面位于所述黑矩阵之远离所述基板的表面，所述底面的面积小于所述顶面的面积，所述次像素区域与所述黑矩阵交替间隔设置，其中每个所述次像素区域位于相邻的两个所述黑矩阵之间；
    在所述次像素区域滴涂像素树脂，通过UV光进行固化处理，以形成彩色滤光层。
  11. 如权利要求10所述的彩色滤光片的制作方法，其特征在于，在切割所述遮光层的过程中，用倾斜切割的方法。
  12. 如权利要求10所述的彩色滤光片的制作方法，其特征在于，所述遮光层和所述滤光层的厚度相同，使得所述彩色滤光片的表面平整。
  13. 如权利要求10所述的彩色滤光片的制作方法，其特征在于，所述黑矩阵的垂直于所述基板的截面呈梯形。
  14. 如权利要求10所述的彩色滤光片的制作方法，其特征在于，所述基板为柔性基板。
PCT/CN2015/070262 2014-12-26 2015-01-07 彩色滤光片的制作方法 Ceased WO2016101350A1 (zh)

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