WO2016098516A1 - Substrate housing container - Google Patents

Substrate housing container Download PDF

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Publication number
WO2016098516A1
WO2016098516A1 PCT/JP2015/082380 JP2015082380W WO2016098516A1 WO 2016098516 A1 WO2016098516 A1 WO 2016098516A1 JP 2015082380 W JP2015082380 W JP 2015082380W WO 2016098516 A1 WO2016098516 A1 WO 2016098516A1
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WO
WIPO (PCT)
Prior art keywords
opening
filter
gas
substrate storage
wall
Prior art date
Application number
PCT/JP2015/082380
Other languages
French (fr)
Japanese (ja)
Inventor
稔 冨田
侑矢 成田
Original Assignee
ミライアル株式会社
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Filing date
Publication date
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Publication of WO2016098516A1 publication Critical patent/WO2016098516A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Definitions

  • the present invention relates to a substrate storage container used when storing, storing, transporting, transporting, and the like, a substrate made of a semiconductor wafer or the like.
  • a substrate storage container for storing and transporting a substrate made of a semiconductor wafer
  • a structure including a container main body and a lid is known.
  • the container body has a cylindrical wall part in which an opening part of the container body is formed at one end and the other end is closed.
  • a substrate storage space is formed in the container body.
  • the substrate storage space is formed by being surrounded by a wall portion, and can store a plurality of substrates.
  • the lid can be attached to and detached from the container body opening, and the container body opening can be closed.
  • a front retainer is provided in a portion of the lid that faces the substrate storage space when the container main body opening is closed.
  • the front retainer can support the edges of the plurality of substrates when the container main body opening is closed by the lid.
  • the back substrate support portion is provided on the wall portion so as to be paired with the front retainer.
  • the back side substrate support part can support the edges of a plurality of substrates.
  • the container body is provided with a hydrophobic filter.
  • Gas purge is performed with dry air (hereinafter referred to as purge gas) from which inert gas such as nitrogen or moisture has been removed (1% or less) through the filter to the substrate storage space from the outside of the container body.
  • a cylindrical gas ejection nozzle portion is provided on the substrate storage space side of the filter. The gas ejection nozzle portion extends from the bottom wall of the container main body provided with the filter toward the upper wall facing the bottom wall, and a plurality of ejection ports are formed.
  • the filter and the gas ejection nozzle part are connected by a communication part that allows gas to flow from the filter to the gas ejection nozzle part (see Patent Documents 1 and 2).
  • the communicating portion communicates with the gas from the filter to the gas ejection nozzle portion so as to be able to circulate. For this reason, in order to prevent the gas supplied to the gas ejection nozzle part from leaking, it is ideal that the communication part has a structure in which no opening is formed other than opening the filter and the gas ejection nozzle part.
  • the cleaning water (pure water) is supplied to the cleaning machine before or after using the substrate storage container with the filter, the communication portion, and the gas ejection nozzle portion fixed to the container body. Used, washed and dried.
  • the communication portion has a structure in which the opening is not formed other than the opening to the filter and the gas ejection nozzle portion, the filter is hydrophobic. There is a possibility that a large amount of washing water remains in the communication part.
  • An object of the present invention is to provide a substrate storage container that suppresses cleaning water from remaining in a communication portion.
  • the present invention includes a cylindrical wall portion in which a container body opening is formed at one end and the other end is closed, and a plurality of substrates can be accommodated by the inner surface of the wall, and the container body opening is formed in the container body opening.
  • a container body in which a communicating substrate storage space is formed; a lid that is detachable with respect to the container body opening; and that can close the container body opening; and the outside of the substrate storage space and the container body.
  • An air passage that can communicate with a space; a filter that is disposed in the air passage; and a filter housing that forms the air passage.
  • the air passage is disposed on the wall and is disposed outside the container body through the filter.
  • the gas jet A communication portion that allows gas to flow to the sluice portion, and the air passage has a substrate storage space side opening located in the substrate storage space and an external space side opening located in a space outside the container body And the communication portion has an opening facing wall portion disposed to face the substrate storage space side opening, and gas from the ventilation passage of the filter portion that has collided with the opening facing wall portion.
  • a communication part flow formed by the gas outlet part leading to the gas jet nozzle part, the opening facing wall part and the gas lead part, and for circulating the gas from the vent passage of the filter part to the gas jet nozzle part
  • An outflow suppression wall portion, the extended end portion of the outflow suppression wall portion and the filter portion are spaced apart from each other, and the extended end portion of the outflow suppression wall portion and the filter portion It is related with the board
  • the extended end portion of the outflow suppression wall portion has a drain notch that is recessed toward the opening-facing wall portion.
  • the drain notch is located at a portion of the outflow suppression wall portion closest to one end portion of the container main body in a direction connecting the one end portion and the other end portion of the container main body.
  • the gas lead-out part of the communication part has an opening side part facing part facing the side part of the filter part housing forming the substrate housing space side opening, and the opening side part facing part and the filter part It is preferable that the side portion of the housing has a positional relationship of being spaced apart, and a gap is formed between the opening side portion facing portion and the side portion of the filter portion housing.
  • the gap between the opening side portion facing portion and the side portion of the filter portion housing is opened in a direction from the other end portion of the container main body to one end portion.
  • the opening facing wall portion is inclined so as to be separated from the filter portion as it approaches the gas ejection nozzle portion.
  • FIG. 1 It is sectional drawing which shows the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. It is a downward perspective view which shows the gas ejection nozzle part 91 and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. It is an expansion perspective view which shows the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. It is an expanded sectional view showing filter part 80, gas ejection nozzle part 91, and communication part 93 of substrate storage container 1 concerning an embodiment of the present invention.
  • FIG. 1 is an exploded perspective view showing a state in which a substrate W is stored in a substrate storage container 1 according to an embodiment of the present invention.
  • FIG. 2 is a lower perspective view showing the container body 2 according to the embodiment of the present invention.
  • FIG. 3 is a perspective view showing the container body 2 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 4 is a cross-sectional view showing the container body 2 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 5 is an upper perspective view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 6 is a cross-sectional view showing the filter portion 80, the gas ejection nozzle portion 91, and the communication portion 93 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 7 is a lower perspective view showing the gas ejection nozzle portion 91 and the communication portion 93 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 8 is an enlarged perspective view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention.
  • FIG. 9 is an enlarged cross-sectional view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention.
  • a direction from the container body 2 described later to the lid 3 is defined as the front direction D11, and the opposite direction is defined as the rear direction D12. These are collectively defined as the front-rear direction D1.
  • a direction (upward direction in FIG. 1) from the lower wall 24 to the upper wall 23 to be described later is defined as an upward direction D21, and the opposite direction is defined as a downward direction D22.
  • a direction from the second side wall 26 to be described later to the first side wall 25 (a direction from the lower right to the upper left in FIG. 1) is defined as the left direction D31, and the opposite direction is defined as the right direction D32. Is also defined as a left-right direction D3.
  • the substrate W (see FIG. 1) stored in the substrate storage container 1 is a disk-shaped silicon wafer, glass wafer, sapphire wafer, etc., and is a thin one used in the industry.
  • the substrate W in this embodiment is a silicon wafer having a diameter of 300 mm to 450 mm.
  • the substrate storage container 1 is used as an in-process container for storing a substrate W made of a silicon wafer as described above and transporting it in a process in a factory, or by land transportation means, air transportation means, sea transportation.
  • Used as a shipping container for transporting a substrate by transport means such as a container, a container main body 2, a lid 3, a substrate support plate-like portion 5 as a side substrate support portion, and a back side It has the board
  • the container body 2 has a cylindrical wall portion 20 in which a container body opening 21 is formed at one end and the other end is closed.
  • a substrate storage space 27 is formed in the container body 2.
  • the substrate storage space 27 is formed so as to be surrounded by the wall portion 20.
  • the substrate support plate-shaped portion 5 is disposed in a portion of the wall portion 20 that forms the substrate storage space 27. As shown in FIG. 1, a plurality of substrates W can be stored in the substrate storage space 27.
  • the substrate support plate-like portion 5 is provided on the wall portion 20 so as to form a pair in the substrate storage space 27.
  • the substrate support plate-like portion 5 abuts the edges of the plurality of substrates W to separate the adjacent substrates W at a predetermined interval.
  • the edges of the plurality of substrates W can be supported in a state where they are aligned in parallel.
  • a back side substrate support portion 6 (see FIG. 3 and the like) is provided on the back side of the substrate support plate-like portion 5.
  • the back substrate support 6 is provided on the wall 20 so as to be paired with a front retainer (not shown) in the substrate storage space 27.
  • the back side substrate support portion 6 can support the rear portions of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. It is.
  • the lid 3 can be attached to and detached from the opening peripheral edge 28 (FIG. 1 and the like) forming the container body opening 21 and can close the container body opening 21.
  • the front retainer (not shown) is provided in a portion of the lid 3 that faces the substrate storage space 27 when the container main body opening 21 is closed by the lid 3.
  • the front retainer (not shown) is disposed inside the substrate storage space 27 so as to be paired with the back substrate support portion 6.
  • the front retainer (not shown) supports the front part of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. Is possible.
  • the front retainer (not shown) supports adjacent substrates by supporting the plurality of substrates W in cooperation with the back substrate support 6 when the container body opening 21 is closed by the lid 3.
  • a plurality of substrates W are held in a state where the Ws are separated from each other at a predetermined interval and are arranged in parallel.
  • the substrate storage container 1 is made of a resin such as a plastic material.
  • the resin of the material include polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, and polybutylene.
  • Thermoplastic resins such as terephthalate, polyether ether ketone, and liquid crystal polymer, and alloys thereof are used.
  • conductive substances such as carbon fibers, carbon powder, carbon nanotubes, and conductive polymers are selectively added to the resins of these molding materials.
  • glass fiber, carbon fiber, etc. may be added to resin of these molding materials.
  • the wall portion 20 of the container body 2 includes a back wall 22, an upper wall 23, a lower wall 24, a first side wall 25, and a second side wall 26.
  • the back wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26 are made of the above-described material, and in the present embodiment, are integrally formed of polycarbonate.
  • the first side wall 25 and the second side wall 26 face each other, and the upper wall 23 and the lower wall 24 face each other.
  • the rear end of the upper wall 23, the rear end of the lower wall 24, the rear end of the first side wall 25, and the rear end of the second side wall 26 are all connected to the back wall 22.
  • the front end of the upper wall 23, the front end of the lower wall 24, the front end of the first side wall 25, and the front end of the second side wall 26 have a positional relationship facing the back wall 22 and have a substantially rectangular shape. Opening peripheral edge portion 28 is formed.
  • the opening peripheral edge 28 is provided at one end of the container main body 2, and the back wall 22 is located at the other end of the container main body 2.
  • the outer shape of the container body 2 formed by the outer surface of the wall portion 20 is box-shaped.
  • the inner surface of the wall portion 20, that is, the inner surface of the back wall 22, the inner surface of the upper wall 23, the inner surface of the lower wall 24, the inner surface of the first side wall 25, and the inner surface of the second side wall 26 are surrounded by these. 27 is formed.
  • the container main body opening 21 formed in the opening peripheral edge portion 28 is surrounded by the wall portion 20 and communicates with the substrate storage space 27 formed in the container main body 2. A maximum of 25 substrates W can be stored in the substrate storage space 27.
  • latch engaging recesses 231 ⁇ / b> A and 231 ⁇ / b> B that are recessed toward the outside of the substrate storage space 27 in the portions of the upper wall 23 and the lower wall 24 and in the vicinity of the opening peripheral edge portion 28.
  • 241A, 241B are formed.
  • a total of four latch engaging recesses 231A, 231B, 241A, 241B are formed near the left and right ends of the upper wall 23 and the lower wall 24, one each.
  • ribs 235 ⁇ / b> A and 235 ⁇ / b> B are integrally formed with the upper wall 23 on the outer surface of the upper wall 23.
  • the ribs 235A and 235B increase the rigidity of the container body 2.
  • a top flange 236 is fixed to the central portion of the upper wall 23.
  • the top flange 236 is a member that is a portion that is hung and suspended in the substrate storage container 1 when the substrate storage container 1 is suspended in an AMHS (automatic wafer conveyance system), a PGV (wafer substrate conveyance cart), or the like.
  • two types of through holes 245 and 246 are formed at the four corners of the lower wall 24.
  • the filter unit 80 configured as shown in FIG. 9 is arranged.
  • the filter portion 80 includes an inner opening forming portion 81 as a filter portion housing, a first housing portion 82, a nozzle portion 83, a second housing portion 84, and a filter 85.
  • the inner opening forming portion 81, the first housing portion 82, the nozzle portion 83, and the second housing portion 84 are configured as separate bodies each composed of separate and independent parts. Therefore, the inner side filter part housing part comprised by the inner side opening formation part 81, the 1st housing part 82, and the 2nd housing part 84 is comprised separately from the nozzle part 83.
  • the filter housing that includes the inner opening forming portion 81, the first housing portion 82, the nozzle portion 83, and the second housing portion 84 can ventilate the substrate storage space 27 and the space outside the container body 2.
  • a path 801 is formed.
  • the height of the filter unit 80 in the vertical direction D2 is 29.3 mm.
  • the width of the filter unit 80 (the diameter of the filter unit 80) in the left-right direction D3 is 38 mm.
  • inert gas such as nitrogen or moisture as gas is removed from the space outside the container body 2 to the substrate storage space 27 through the filter 85 (1% or less).
  • dry air hereinafter referred to as “purge gas”
  • purge gas can pass therethrough, and gas can pass through the filter 85 from the substrate storage space 27 to a space outside the container body 2.
  • the inner opening forming portion 81 has a disk shape.
  • a large number of through holes 803 are formed in the inner opening forming portion 81 radially from the center of the inner opening forming portion 81.
  • a large number of through holes 803 form a ventilation path 801.
  • the openings at the upper ends of the numerous through holes 803 are located in the substrate storage space 27 and form a substrate storage space side opening 804 that opens toward an opening facing wall portion 931 of the communication portion 93 described later. Therefore, the ventilation path 801 has a substrate storage space side opening 804.
  • the first housing part 82 has a cylindrical part 821, an end flange part 822, and an upper end wall part 823.
  • the cylindrical part 821 has a cylindrical shape.
  • a male screw portion is threaded on the side surface (outer peripheral surface) of the cylindrical portion 821.
  • a small flange portion 824 is integrally formed with the cylindrical portion 821 at a portion on the side surface of the cylindrical portion 821 and above the male screw portion.
  • the end flange portion 822 is integrally formed with the tubular portion 821 at the upper end portion of the tubular portion 821 above the portion of the tubular portion 821 where the small flange portion 824 exists.
  • An O-ring 201 is disposed between the small flange portion 824 and the end flange portion 822.
  • the O-ring 201 is disposed so as to be sandwiched between the first housing portion 82 and the portion of the lower wall 24 that forms the through hole 245. As a result, the space between the first housing portion 82 and the portion of the lower wall 24 forming the through hole 245 is sealed.
  • the end flange portion 822 has a protrusion 825 extending in the upward direction D21.
  • the protrusion 825 and the recess 815 formed in the annular peripheral edge 811 of the inner opening forming portion 81 are welded by ultrasonic waves, whereby the end flange portion 822 is fixed to the annular peripheral edge 811.
  • the first housing portion 82 is connected to the inner opening forming portion 81 in a positional relationship coaxial with the inner opening forming portion 81.
  • the upper end wall portion 823 is integrally formed with the cylindrical portion 821 so as to close the upper end portion of the cylindrical portion 821, and has a plate shape.
  • a through hole 826 is formed in the upper end wall portion 823, and the purge gas G ⁇ b> 1 can flow through the through hole 826.
  • the nozzle portion 83 has a cylindrical portion 831 and an external protruding portion 832.
  • the cylindrical portion 831 has a cylindrical shape.
  • the outer diameter of the upper part of the cylindrical part 831 is slightly smaller than the inner diameter of the cylindrical part 821 of the first housing part 82.
  • the cylindrical portion 831 of the nozzle portion 83 is positioned coaxially with the cylindrical portion 821 of the first housing portion 82 in the space formed by the inner peripheral surface of the cylindrical portion 821 of the first housing portion 82. Arranged in a relationship.
  • the lower part of the outer peripheral surface of the cylindrical part 831 has an outer diameter small diameter part 833 with a small outer diameter.
  • a lower end portion of the outer diameter small diameter portion 833 constitutes an external protruding portion 832.
  • the external protrusion 832 has a reduced diameter annular plate 835 that protrudes inward in the radial direction of the external protrusion 832.
  • a through hole is formed in the center of the reduced diameter annular plate portion 835, and the through hole constitutes an external space side opening 802.
  • the external space side opening 802 is exposed to a space outside the container body 2 and is connected to a space outside the container body 2.
  • the external space side opening 802 constitutes a ventilation path 801. Therefore, the ventilation path 801 has an external space side opening 802.
  • the second housing part 84 has a cylindrical part 841 and an end inward projecting part 842.
  • the cylindrical portion 841 has a cylindrical shape.
  • the inner diameter of the cylindrical portion 841 is larger than the outer diameter of the cylindrical portion 821 of the first housing portion 82.
  • the first housing part 82 is arranged in a coaxial relationship with the cylindrical part 841 of the second housing part 84 in a space formed by the inner peripheral surface of the cylindrical part 841 of the second housing part 84. .
  • a female screw portion is threaded on the inner peripheral surface of the cylindrical portion 841.
  • the male screw portion of the cylindrical portion 821 of the first housing portion 82 is screwed into the female screw portion.
  • the second housing part 84 is fixed to the first housing part 82.
  • the end inward projecting portion 842 is integrally formed with the lower end portion of the tubular portion 841.
  • the end inward projecting portion 842 projects from the lower end portion of the tubular portion 841 inward in the radial direction of the tubular portion 841, and has an annular plate shape along the inner peripheral surface of the tubular portion 841. Yes.
  • a portion of the nozzle portion 83 and a portion around the outer space side opening 802, that is, the outer protruding portion 832 and the reduced-diameter annular plate portion 835 are end inward protruding portions 842 constituting the lower end portion of the filter outer housing portion.
  • the air passage 801 protrudes in a downward direction D22 which is a direction in which the air passage 801 opens at the external space side opening 802 from the lower end portion of the air. That is, the external projecting portion 832 and the reduced diameter annular plate portion 835 of the nozzle portion 83 project downward in the filter unit 80.
  • the outer protruding portion 832 and the reduced diameter annular plate portion 835 are members other than the nozzle portion 83 constituting the filter portion housing, and are the inner opening forming portion 81, the first housing portion 82, and the second housing portion. It projects downward from any part of 84.
  • polycarbonate with a small outgas generation amount was used for the nozzle part 83.
  • resins such as cycloolefin polymer, polyetherimide, and polyetheretherketone can be used.
  • an elastic member can be used for the nozzle portion 83.
  • a resin such as polybutylene terephthalate or polyethylene, an elastomer such as polyethylene elastomer or polyolefin elastomer, or a rubber material such as silicon rubber or fluorine rubber can be used.
  • the outer projecting portion 832 of the nozzle portion 83 and the lower end surface of the reduced-diameter annular plate portion 835 are roughened by being textured.
  • an O-ring 847 is disposed between the second housing portion 84 and the nozzle portion 83.
  • the O-ring 847 includes an upper surface of the end inward projecting portion 842 of the second housing portion 84, and a step portion formed at a connection position between the upper portion of the tubular portion 831 of the nozzle portion 83 and the outer diameter small diameter portion 833. It is arranged so as to be sandwiched between them. Thus, the portion of the cylindrical portion 831 immediately above the outer diameter small diameter portion 833 is sealed and supported with the second housing portion 84 via the O-ring 847.
  • an air passage 801 is formed by the inner opening forming part 81, the first housing part 82, the nozzle part 83, and the second housing part 84 constituting the filter part housing. More specifically, the air passage 801 continues from the substrate storage space side opening 804 of the through hole 803 of the inner opening forming portion 81 to the outer space side opening 802 of the nozzle portion 83.
  • the filter 85 is made of a hydrophobic material and has a disk shape.
  • the peripheral portion of the filter 85 is fixed to the upper end surface of the cylindrical portion 821 of the first housing portion 82 by heat welding.
  • the filter 85 is disposed in the ventilation path 801.
  • the filter 85 prevents particles and the like from passing through the through hole 803 of the inner opening forming portion 81.
  • the filter 85 is made of a hydrophobic material, and a small amount of cleaning water (pure water) is inhibited from flowing by the filter 85.
  • the substrate storage container 1 includes two gas ejection nozzle portions 91 and two communication portions 93.
  • the two gas ejection nozzle portions 91 have the same shape, and the two communication portions 93 have the same shape. For this reason, only one gas ejection nozzle part 91 and the communication part 93 are demonstrated, and description about the other gas ejection nozzle part 91 and the communication part 93 is abbreviate
  • the gas ejection nozzle unit 91 supplies a purge gas or the like as a gas flowing into the air passage 801 of the filter unit 80 to the substrate storage space 27.
  • the gas ejection nozzle portion 91 has a substantially cylindrical nozzle body 911 that is closed at the upper end and opened at the lower end.
  • the inner diameter of the nozzle body 911 is about 14 mm.
  • the nozzle body 911 is formed with a through-hole 912 that communicates the inside and the outside of the gas ejection nozzle 91.
  • the number of through-holes 912 is the same as the number of substrates W that can be stored in the substrate storage container 1 in the vertical direction D2 from the position near the upper end of the gas ejection nozzle 91 to the position near the lower end. Is formed.
  • two through-holes 912 In the circumferential direction of the gas ejection nozzle portion 91, two through-holes 912 have an arc shape corresponding to approximately a quarter of a circle, and two through-holes 912 are formed over a range of approximately a half circumference. ing.
  • two sets of 25 through-holes 912 formed along the vertical direction D1 are formed in one gas ejection nozzle portion 91 along the circumferential direction of the gas ejection nozzle portion 91.
  • Fifty through holes 912 are formed.
  • the uppermost through hole 912 are 25 substrates W stored in the substrate storage space 27 in the vertical direction D2.
  • the uppermost through hole 912 is located between the substrate W accommodated in the uppermost position and the upper wall 23 in the vertical direction D2.
  • a through hole 912 is not formed between the substrate W stored at the bottom and the lower wall 24, but in this period, a purge gas flowing out from gaps 806 and 807 and a drain notch 936 described later. Gas purge is performed by G1.
  • the lower end portion of the gas ejection nozzle portion 91 has locked portions 913 and 914.
  • the locked portion 914 protrudes from the lower end portion of the gas ejection nozzle portion 91 outward in the radial direction of the gas ejection nozzle portion 91 (left direction in FIG. 9).
  • the locked portion 913 is lowered stepwise in a downward direction D22 from the lower end portion of the gas ejection nozzle portion 91 and protrudes outward in the radial direction of the gas ejection nozzle portion 91 (right direction in FIG. 9).
  • a through hole is formed in a portion of the locked portion 913 that protrudes radially outward (rightward in FIG. 9) of the gas ejection nozzle portion 91.
  • the communication unit 93 communicates from the filter unit 80 to the gas ejection nozzle unit 91 so that gas can be circulated.
  • the communication part 93 includes an opening facing wall part 931, a gas outlet part 941, a communication part flow path 945, and an outflow suppression wall part 935.
  • the opening facing wall portion 931 and the gas outlet portion 941 have an oval shape in plan view. A portion near one end in the longitudinal direction of the oval shape is configured by an opening facing wall portion 931, and the opening facing wall portion 931 is disposed to face the substrate storage space side opening 804 of the filter unit 80. .
  • a portion near the other end in the longitudinal direction of the oval shape is configured by a gas outlet portion 941, and a through-hole penetrating in the vertical direction is formed in the gas outlet portion 941.
  • the opening of the lower end part of the gas ejection nozzle part 91 is connected to the opening of the through hole.
  • a portion in the vicinity of one end portion of the opening facing wall portion 931 has a horizontal plate-like portion.
  • the portion closer to the other end than the horizontal plate-like portion gradually approaches the other end, that is, approaches the opening at the lower end of the gas ejection nozzle 91.
  • the opening facing wall portion 931 includes a first inclined wall 9311 having a gentle inclination and a second inclined wall 9312 having a steeper inclination than the first inclined wall 9311.
  • the opening facing wall portion 931 is positioned in order from the one end side to the other end side (in order from left to right in FIG. 9). With this configuration, the opening facing wall portion 931 guides the purge gas as the gas from the air passage 801 of the filter unit 80 that collides with the opening facing wall portion 931 to the opening at the lower end portion of the gas ejection nozzle portion 91.
  • the first inclined wall 9311 and the second The length L1 to the connection position with the inclined wall 9312 is about 26 mm. Further, the length L2 from one end of the opening facing wall 931 to the right end in FIG. 9 of the second inclined wall 9312 in the same direction is about 34 mm. Further, the width L3 (see FIG. 8) of the opening facing wall portion 931 in the direction orthogonal to the same direction is about 32 mm.
  • the inclination angle A1 of the first inclined wall 9311 with respect to the plane parallel to the front-rear direction D1 and the left-right direction D3 is about 4 °.
  • the inclination angle A2 of the second inclined wall 9312 with respect to the plane parallel to the front-rear direction D1 and the left-right direction D3 is about 28 °.
  • the outflow suppression wall portion 935 extends from the periphery of the opening facing wall portion 931 toward the filter portion 80 and exists along the entire periphery of the opening facing wall portion 931 as shown in FIG. . As shown in FIG. 9 and the like, the extended end portion (lower end portion) of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80 have a spaced apart positional relationship. For this reason, a gap 806 is formed between the extended end portion of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80.
  • the width D1 of the gap 806 in the vertical direction D2 is preferably 0.1 mm to 0.5 mm. This is because if the width D1 is less than 0.1 mm, the cleaning water hardly passes through the gap 806 due to the surface tension of the cleaning water. In addition, if the width D1 is less than 0.1 mm, the lower part of the outflow suppression wall 935 abuts against the inner opening formation part 81 due to product variations, and the board storage container 1 cannot be assembled normally. is there. When the width D1 exceeds 0.5 mm, a large amount of purge gas, which is a gas flowing from the air passage 801 of the filter unit 80, leaks out from the gap 806, and from the through hole 912 of the gas ejection nozzle unit 91.
  • the height L4 from the opening facing wall portion 931 to the extended end (lower end) at one end portion (left end portion in FIG. 9) of the outflow suppression wall portion 935 is about 1.5 mm.
  • the outflow suppression wall portion 935 suppresses the purge gas, which is a gas from the air passage 801 of the filter unit 80 and collides with the opening facing wall portion 931, from leaking from the communication portion channel 945 through the gap 806.
  • the extension end portion (lower end portion) of the outflow suppression wall portion 935 has a drain notch 936 that is recessed in the direction of the opening facing wall portion 931.
  • the drain notch 936 has a rectangular shape and is recessed to reach the opening facing wall portion 931.
  • the drainage notches 936 are positioned at both ends and the center of the arc in the arc-shaped portion at one end of the opening facing wall 931.
  • the drain notch 936 of any one of the arc-shaped ends of one end portion of the opening facing wall portion 931 is a direction connecting the one end portion and the other end portion of the container body 2 as shown in FIG. In the front-rear direction D ⁇ b> 1, the opening facing wall portion 931 is positioned closest to one end portion (close to the front end portion) of the container body 2.
  • the gas outlet portion 941 has an opening side portion facing portion 942.
  • the opening side facing portion 942 faces the side portion of the inner opening forming portion 81 as a filter portion housing that forms the substrate storage space side opening 804. More specifically, as shown in FIG. 7 and the like, the opening side facing portion 942 is substantially U-shaped in a bottom view so as to extend the rear side portion of the lower end portion of the gas ejection nozzle portion 91 downward. It is comprised by the wall part which has a shape. The pair of substantially U-shaped tip portions of the opening side facing portion 942 are separated from each other toward the one end of the opening facing wall 931 (the upper left end of the opening facing wall 931 in FIG. 7).
  • the upper portions of the pair of substantially U-shaped tip portions are integrally formed and connected to the outflow suppression wall portion 935.
  • the inner surface of the rear end portion (the right end portion in FIG. 9) of the gas outlet portion 941 is configured by a rear inclined surface 9411.
  • An angle A3 formed by the rear inclined surface 9411 and a surface parallel to the front-rear direction D1 and the left-right direction D3 is about 120 °.
  • the distance L5 from the lower end of the rear inclined surface 9411 to the axis of the nozzle portion 83 is about 30 mm.
  • the distance L6 from the lower end of the rear inclined surface 9411 to one end of the opening facing wall 931 is about 48 mm.
  • the end portion near the front direction D11 of the opening side facing portion 942 that faces the side portion of the inner opening forming portion 81 closest to the side portion and the side portion of the inner opening forming portion 81 have a spaced apart positional relationship.
  • a gap 807 is formed between them as shown in FIG.
  • the gap 807 is formed on both the near side and the far side shown in FIG. 8, and one of them is a direction (from the other end of the container body 2 toward one end) as shown in FIG. Opening in the forward direction D11).
  • the lower portion of the gas outlet portion 941 is inserted into a positioning recess that is formed adjacent to the through hole 245 of the lower wall 24 of the container body 2 and is recessed in the downward direction D22. It contacts the bottom surface 247 of the recess. By this contact, the opening facing wall portion 931 and the gas outlet portion 941 are supported by the lower wall 24, and between the extended end portion of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80. A gap 806 is secured.
  • the lower end portion of the gas outlet portion 941 is positioned in contact with the bottom surface 247 of the concave portion (not shown), thereby forming a pair of oval shapes configured by the opening facing wall portion 931 and the gas outlet portion 941. As shown in FIGS. 3 and 4, these are fixed to the lower wall 24 in a positional relationship having a substantially “C” shape.
  • a locking portion 943 and a hook portion 944 are provided at the upper end portion of the gas outlet portion 941.
  • the engaging portion 943 extends radially outward of the nozzle body 911 so as to be separated from the gas outlet 941, extends upward 21, and further radially outward of the nozzle body 911 from the gas outlet 941. It extends so as to be separated.
  • the locking portion 943 is inserted into the through-hole of the locked portion 913 and the locked portion 914 is hooked on the hook portion 944, so that the lower end portion of the gas ejection nozzle portion 91 is connected to the upper end portion of the gas outlet portion 941. Fixed.
  • the opening-facing wall portion 931 and the gas outlet portion 941 form a communication portion flow path 945 through which purge gas as a gas from the air passage 801 of the filter portion 80 is circulated to the gas ejection nozzle portion 91.
  • the communication portion flow path 945 communicates the substrate storage space side opening 804 with the internal space of the gas ejection nozzle portion 91.
  • the lid 3 has a substantially rectangular shape that substantially matches the shape of the opening peripheral edge 28 of the container body 2.
  • the lid 3 can be attached to and detached from the opening peripheral edge 28 of the container main body 2, and the lid 3 can close the container main body opening 21 by attaching the lid 3 to the opening peripheral edge 28. .
  • It is the inner surface of the lid 3 (the surface on the back side of the lid 3 shown in FIG. 1), at the position in the rearward direction D12 of the opening peripheral edge 28 when the lid 3 closes the container main body opening 21.
  • An annular seal member 4 is attached to the surface facing the formed stepped portion surface (seal surface 281).
  • the seal member 4 is made of various types of thermoplastic elastomers such as polyester and polyolefin that can be elastically deformed, fluorine rubber, and silicon rubber.
  • the seal member 4 is arranged so as to go around the outer peripheral edge of the lid 3.
  • the seal member 4 When the lid 3 is attached to the opening peripheral edge 28, the seal member 4 is sandwiched between the seal surface 281 and the inner surface of the lid 3 and elastically deformed, and the lid 3 seals the container main body opening 21. Shuts down in a closed state. By removing the lid 3 from the opening peripheral edge 28, the substrate W can be taken into and out of the substrate storage space 27 in the container body 2.
  • the lid 3 is provided with a latch mechanism.
  • the latch mechanism is provided in the vicinity of both left and right ends of the lid 3, and as shown in FIG. 1, two upper latch portions 32A and 32B that can project in the upward direction D21 from the upper side of the lid 3, and the lid 3, two lower latch portions (not shown) that can project in the downward direction D22 from the lower side of 3.
  • the two upper latch portions 32 ⁇ / b> A and 32 ⁇ / b> B are disposed in the vicinity of the left and right ends of the upper side of the lid 3, and the two lower latch portions are disposed in the vicinity of the left and right ends of the lower side of the lid 3.
  • An operation unit 33 is provided on the outer surface of the lid 3.
  • the upper latch portions 32A and 32B and the lower latch portion (not shown) can be protruded from the upper side and the lower side of the lid body 3, It can be set as the state which does not protrude from a lower side.
  • the upper latch portions 32A and 32B protrude from the upper side of the lid body 3 in the upward direction D21, engage with the latch engagement recesses 231A and 231B of the container body 2, and the lower latch portion (not shown) is the lid body.
  • the lid 3 is fixed to the opening peripheral edge portion 28 of the container body 2 by projecting in the downward direction D22 from the lower side of the container 3 and engaging with the latch engagement recesses 241A and 241B of the container body 2.
  • a recess (not shown) that is recessed outward from the substrate storage space 27 is formed inside the lid 3.
  • a front retainer (not shown) is fixedly provided on the concave portion (not shown) and the lid 3 outside the concave portion.
  • the front retainer (not shown) has a front retainer substrate receiving portion (not shown).
  • Two front retainer substrate receiving portions (not shown) are arranged in pairs so as to form a pair with a predetermined interval in the left-right direction D3.
  • the front retainer substrate receiving portions arranged in pairs so as to form a pair in this way are provided in a state where 25 pairs are juxtaposed in the vertical direction D2.
  • the front retainer substrate receiving portion sandwiches and supports the edge of the edge of the substrate W.
  • the gas purge with the purge gas is performed as follows. First, as shown in FIG. 6, the nozzle 83 (see FIG. 9) is connected to the gas supply port opening of the supply nozzle N of the gas supply device that supplies gas to the external space side opening 802 (see FIG. 9). The protruding portion 832 and the reduced diameter annular plate portion 835 are brought into contact with each other. Next, the purge gas G1 is supplied to the external space side opening 802 from the gas supply port opening of the supply nozzle N of the gas supply device. Accordingly, as shown in FIG.
  • the purge gas G ⁇ b> 1 flows into the ventilation path 801, flows through the through hole 803 and the substrate storage space side opening 804, and collides with the opening facing wall portion 931.
  • the purge gas G1 is prevented from leaking outside the communication portion flow path 945 by the outflow suppression wall portion 935, and the purge gas G1 is supplied to the first inclined wall 9311 of the opening facing wall portion 931. And it circulates along the 2nd inclined wall 9312 toward the opening side part opposing part 942.
  • the purge gas G ⁇ b> 1 flows into the internal space of the gas ejection nozzle portion 91 and is ejected from the through hole 912 to the substrate storage space 27.
  • cleaning of the substrate storage container 1 with cleaning water is performed as follows.
  • the substrate storage container 1 is washed with washing water by a washing machine. Specifically, the substrate storage container 1 is in a state where the filter unit 80, the communication unit 93, and the gas ejection nozzle unit 91 are fixed to the container body 2, and before or after using the substrate storage container 1.
  • washing water is used for washing.
  • the filter 85 since the filter 85 has hydrophobicity, cleaning water remains in the communication portion flow path 945.
  • the substrate storage container 1 is arranged in a positional relationship in which the back wall 22 is vertically above the container body opening 21. Then, the gap 806 is in a positional relationship that opens vertically downward. Further, one drainage notch 936 out of the three drainage notches 936 and one gap 807 out of the two gaps 807 are in a positional relationship that opens vertically downward. Therefore, the washing water remaining in the communication portion flow path 945 is discharged from the gap 806, and through the water drain notch 936 and the gap 807, as shown by arrows F1 and F2 in FIG. , The fluid is discharged out of the communication channel 945. Further, hot air is blown onto the container body 2. Thereby, the washing water is dried.
  • the first side wall 25 is positioned vertically downward with respect to the second side wall 26 instead of disposing the back wall 22 vertically above the container body opening 21.
  • the substrate storage container 1 is arranged.
  • the substrate storage container 1 is swiveled around the rotation axis arranged behind the back wall 22.
  • the gap 806, one drain notch 936 out of the three drain notches 936, and one gap 807 out of the two gaps 807 open toward the radial direction outward of the rotating shaft. is doing.
  • the gap 806, one drain notch 936 of the three drain notches 936, and one gap 807 of the two gaps 807 open toward the downstream side in the direction in which the centrifugal force acts.
  • the positional relationship is Therefore, the washing water remaining in the communication portion flow path 945 is discharged from the gap 806, and through the water drain notch 936 and the gap 807, as shown by arrows F1 and F2 in FIG. , The fluid is discharged out of the communication channel 945. Further, hot air is blown onto the container body 2. Thereby, the washing water is dried.
  • the substrate storage container 1 includes the cylindrical wall portion 20 in which the container main body opening 21 is formed at one end and the other end is closed, and a plurality of substrates W are stored by the inner surface of the wall portion 20.
  • a container main body 2 in which a substrate storage space 27 communicating with the container main body opening 21 is formed, and a lid 3 detachable from the container main body opening 21 and capable of closing the container main body opening 21.
  • a ventilation path 801 that allows communication between the substrate storage space 27 and the space outside the container body 2, a filter 85 disposed in the ventilation path 801, and a filter unit housing that forms the ventilation path 801.
  • the base Comprising a gas ejection nozzle portion 91 to be supplied to the accommodating space 27, a communicating portion 93 which communicates to allow flow of gas to the gas ejection nozzle portion 91 from the filter unit 80.
  • the ventilation path 801 has a substrate storage space side opening 804 located in the substrate storage space 27 and an external space side opening located in a space outside the container body 2.
  • the communicating portion 93 includes an opening facing wall portion 931 disposed to face the substrate storage space side opening 804, and a purge gas G1 as a gas from the air passage 801 of the filter portion 80 that collides with the opening facing wall portion 931.
  • a communication part flow formed by the gas outlet part 941 that leads to the gas ejection nozzle part 91, the opening facing wall part 931 and the gas outlet part 941, and distributes the gas from the ventilation path 801 of the filter part 80 to the gas ejection nozzle part 91.
  • a purge gas as a gas from the ventilation path 801 of the filter unit 80 which is a flow path 945 and an outflow suppression wall unit 935 extending from the opening facing wall unit 931 toward the filter unit 80, and collides with the opening facing wall unit 931.
  • G1 has an outflow suppression wall portion 935 that suppresses leakage from the communication portion flow path 945.
  • the extending end portion of the outflow suppression wall portion 935 and the filter portion 80 are spaced apart from each other, and a gap 806 is formed between the extending end portion of the outflow suppression wall portion 935 and the filter portion 80.
  • the extended end portion of the outflow suppression wall portion 935 and the filter portion 80 have a positional relationship that is separated from each other, and there is a gap between the extended end portion of the outflow suppression wall portion 935 and the filter portion 80. Since 806 is formed, the cleaning water can be discharged from the communication portion channel 945 through the gap 806 after the substrate storage container 1 is cleaned with the cleaning water. For this reason, it is possible to prevent the cleaning water from staying in the communication portion 93. As a result, the time required for drying the substrate storage container 1 can be shortened.
  • the extended end portion of the outflow suppression wall portion 935 has a drain notch 936 that is recessed in the direction of the opening facing wall portion 931.
  • the drainage notch 936 is located at the portion of the outflow suppression wall 935 closest to one end of the container main body 2 in the direction connecting the one end and the other end of the container main body 2.
  • the gas outlet portion 941 of the communication portion 93 includes an opening side portion facing portion 942 that faces the side portion of the filter portion housing that forms the substrate storage space side opening 804, and the opening side portion facing portion 942 and the filter portion housing.
  • the side portion is spaced apart from each other, and a gap 807 is formed between the opening side portion facing portion 942 and the side portion of the filter portion housing.
  • the communication portion flow path 945 is connected from the gap 807.
  • the washing water staying in the lower part of the water can be discharged from the communication channel 945. For this reason, it can suppress more reliably that cleaning water retains in the upper part and lower part of the communicating part 93.
  • a gap 807 between the opening side portion facing portion 942 and the side portion of the filter portion housing opens in a direction from the other end portion of the container body 2 to one end portion.
  • the opening facing wall portion 931 is inclined so as to be separated from the filter portion 80 as it approaches the gas ejection nozzle portion 91.
  • the flow of the purge gas can be adjusted so that the inert gas (purge gas), which is the gas from the air passage 801 of the filter unit 80, can smoothly flow to the gas ejection nozzle unit 91. For this reason, it is possible to make the purge gas difficult to leak from the gap 806, the gap 807, and the water drain notch 936.
  • the present invention is not limited to the embodiment described above, and can be modified within the technical scope described in the claims.
  • the shape of the container main body and the lid, the number of substrates that can be stored in the container main body, and the dimensions thereof are the shape of the container main body 2 and the lid 3 in this embodiment, and the number of substrates W that can be stored in the container main body 2.
  • the dimensions are not limited.
  • the configurations of the filter unit, the gas ejection nozzle unit, the communication unit, and the like are not limited to the configurations of the filter unit 80, the gas ejection nozzle unit 91, the communication unit 93, and the like in the present embodiment.
  • the filter unit 80 may have a configuration including a check valve or the like.

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Abstract

The present invention provides a substrate housing container that prevents cleaning water from remaining in a communication part. The communicating part 93 includes: an opening facing wall section 931; a gas lead-out section 941 for guiding, toward a gas jetting nozzle part 91, gas G1 which comes from a ventilation passage 801 of a filter part 80 and collides with the opening facing wall section 931; a communicating part flow passage 945 formed by the opening facing wall section 931 and the gas lead-out section 941 and transferring the gas from the ventilation passage 801 of the filter part 80 toward the gas jetting nozzle part 91; and a leak suppressing wall section 935 which extends from the opening facing wall section 931 toward the filter part 80 and suppresses the gas G1, which comes from the ventilation passage 801 of the filter part 80 and collides with the opening facing wall section 931, from leaking from the communicating part flow passage 945. The extending end of the leak suppressing wall section 935 and the filter part 80 are positioned to be spaced apart from each other, and a gap 806 is formed between the leak suppressing wall section 935 and the filter part 80.

Description

基板収納容器Substrate storage container
 本発明は、半導体ウェーハ等からなる基板を収納、保管、搬送、輸送等する際に使用される基板収納容器に関する。 The present invention relates to a substrate storage container used when storing, storing, transporting, transporting, and the like, a substrate made of a semiconductor wafer or the like.
 半導体ウェーハからなる基板を収納して搬送するための基板収納容器としては、容器本体と蓋体とを備える構成のものが、従来より知られている。 2. Description of the Related Art Conventionally, as a substrate storage container for storing and transporting a substrate made of a semiconductor wafer, a structure including a container main body and a lid is known.
 容器本体は、一端部に容器本体開口部が形成され、他端部が閉塞された筒状の壁部を有する。容器本体内には基板収納空間が形成されている。基板収納空間は、壁部により取り囲まれて形成されており、複数の基板を収納可能である。蓋体は、容器本体開口部に対して着脱可能であり、容器本体開口部を閉塞可能である。 The container body has a cylindrical wall part in which an opening part of the container body is formed at one end and the other end is closed. A substrate storage space is formed in the container body. The substrate storage space is formed by being surrounded by a wall portion, and can store a plurality of substrates. The lid can be attached to and detached from the container body opening, and the container body opening can be closed.
 蓋体の部分であって容器本体開口部を閉塞しているときに基板収納空間に対向する部分には、フロントリテーナが設けられている。フロントリテーナは、蓋体によって容器本体開口部が閉塞されているときに、複数の基板の縁部を支持可能である。また、フロントリテーナと対をなすようにして、奥側基板支持部が壁部に設けられている。奥側基板支持部は、複数の基板の縁部を支持可能である。奥側基板支持部は、蓋体によって容器本体開口部が閉塞されているときに、フロントリテーナと協働して複数の基板を支持することにより、隣接する基板同士を所定の間隔で離間させて並列させた状態で、複数の基板を保持する。 A front retainer is provided in a portion of the lid that faces the substrate storage space when the container main body opening is closed. The front retainer can support the edges of the plurality of substrates when the container main body opening is closed by the lid. Further, the back substrate support portion is provided on the wall portion so as to be paired with the front retainer. The back side substrate support part can support the edges of a plurality of substrates. When the container body opening is closed by the lid, the back side substrate support unit supports a plurality of substrates in cooperation with the front retainer, thereby separating adjacent substrates at a predetermined interval. A plurality of substrates are held in parallel.
 また、容器本体には、疎水性のフィルタが設けられている。フィルタを通して、容器本体の外部から基板収納空間へ、窒素等の不活性ガスあるいは水分を除去(1%以下)したドライエア(以下、パージガスという)で、ガスパージが行われる。フィルタの基板収納空間側には、筒状の気体噴出ノズル部が設けられている。気体噴出ノズル部は、フィルタが設けられている容器本体の底壁から、底壁に対向する上壁に向って延びており、複数の噴出口が形成されている。フィルタと気体噴出ノズル部とは、フィルタから気体噴出ノズル部へ気体を流通可能に連通する連通部によって接続されている(特許文献1~2参照)。 Also, the container body is provided with a hydrophobic filter. Gas purge is performed with dry air (hereinafter referred to as purge gas) from which inert gas such as nitrogen or moisture has been removed (1% or less) through the filter to the substrate storage space from the outside of the container body. A cylindrical gas ejection nozzle portion is provided on the substrate storage space side of the filter. The gas ejection nozzle portion extends from the bottom wall of the container main body provided with the filter toward the upper wall facing the bottom wall, and a plurality of ejection ports are formed. The filter and the gas ejection nozzle part are connected by a communication part that allows gas to flow from the filter to the gas ejection nozzle part (see Patent Documents 1 and 2).
特許第5241607号公報Japanese Patent No. 5241607 特表2011-514014号公報Special table 2011-514014 gazette
 前述のように連通部は、フィルタから気体噴出ノズル部へ気体を流通可能に連通している。このため連通部は、気体噴出ノズル部へ供給する気体が漏れないようにするため、フィルタ及び気体噴出ノズル部に対して開口する以外に、開口が形成されない構造を有することが理想的である。 As described above, the communicating portion communicates with the gas from the filter to the gas ejection nozzle portion so as to be able to circulate. For this reason, in order to prevent the gas supplied to the gas ejection nozzle part from leaking, it is ideal that the communication part has a structure in which no opening is formed other than opening the filter and the gas ejection nozzle part.
 しかし、基板収納容器は、フィルタ、連通部、及び、気体噴出ノズル部が容器本体に固定されたままの状態で、基板収納容器の使用前あるいは使用後に洗浄機において、洗浄水(純水)が用いられて洗浄され、乾燥させられる。前述のように、連通部がフィルタ及び気体噴出ノズル部に対して開口する以外に、開口が形成されない構造を有する場合には、フィルタは疎水性であるため、滞留した洗浄水は、容易にフィルタを通過しないため、連通部に洗浄水が大量に残るおそれがある。 However, in the substrate storage container, the cleaning water (pure water) is supplied to the cleaning machine before or after using the substrate storage container with the filter, the communication portion, and the gas ejection nozzle portion fixed to the container body. Used, washed and dried. As described above, when the communication portion has a structure in which the opening is not formed other than the opening to the filter and the gas ejection nozzle portion, the filter is hydrophobic. There is a possibility that a large amount of washing water remains in the communication part.
 本発明は、連通部に洗浄水が残ることを抑制する基板収納容器を提供することを目的とする。 An object of the present invention is to provide a substrate storage container that suppresses cleaning water from remaining in a communication portion.
 本発明は、一端部に容器本体開口部が形成され他端部が閉塞された筒状の壁部を備え、前記壁部の内面によって、複数の基板を収納可能であり前記容器本体開口部に連通する基板収納空間が形成された容器本体と、前記容器本体開口部に対して着脱可能であり、前記容器本体開口部を閉塞可能な蓋体と、前記基板収納空間と前記容器本体の外部の空間とを連通可能な通気路と、前記通気路に配置されたフィルタと、前記通気路を形成するフィルタ部ハウジングと、を有し、前記壁部に配置され、前記フィルタを通して前記容器本体の外部の空間と前記基板収納空間との間で気体が通過可能なフィルタ部と、前記フィルタ部の前記通気路に流入した気体を、前記基板収納空間に供給する気体噴出ノズル部と、前記フィルタ部から前記気体噴出ノズル部へ気体を流通可能に連通する連通部と、を備え、前記通気路は、前記基板収納空間に位置する基板収納空間側開口と、前記容器本体の外部の空間に位置する外部空間側開口と、を有し、前記連通部は、前記基板収納空間側開口に対向して配置される開口対向壁部と、前記開口対向壁部に衝突した、前記フィルタ部の前記通気路からの気体を、前記気体噴出ノズル部へ導く気体導出部と、前記開口対向壁部と前記気体導出部とにより形成され、前記フィルタ部の前記通気路からの気体を前記気体噴出ノズル部へ流通させる連通部流路と、前記開口対向壁部から前記フィルタ部へ向って延出する流出抑制壁部であって、前記開口対向壁部に衝突した、前記フィルタ部の前記通気路からの気体が、前記連通部流路から漏れ出ることを抑制する流出抑制壁部と、を有し、前記流出抑制壁部の延出端部と、前記フィルタ部とは離間した位置関係を有し、前記流出抑制壁部の延出端部と前記フィルタ部との間には、隙間が形成されている基板収納容器に関する。 The present invention includes a cylindrical wall portion in which a container body opening is formed at one end and the other end is closed, and a plurality of substrates can be accommodated by the inner surface of the wall, and the container body opening is formed in the container body opening. A container body in which a communicating substrate storage space is formed; a lid that is detachable with respect to the container body opening; and that can close the container body opening; and the outside of the substrate storage space and the container body. An air passage that can communicate with a space; a filter that is disposed in the air passage; and a filter housing that forms the air passage. The air passage is disposed on the wall and is disposed outside the container body through the filter. A filter part through which gas can pass between the space and the substrate storage space, a gas ejection nozzle part for supplying the gas flowing into the ventilation path of the filter part to the substrate storage space, and the filter part The gas jet A communication portion that allows gas to flow to the sluice portion, and the air passage has a substrate storage space side opening located in the substrate storage space and an external space side opening located in a space outside the container body And the communication portion has an opening facing wall portion disposed to face the substrate storage space side opening, and gas from the ventilation passage of the filter portion that has collided with the opening facing wall portion. A communication part flow formed by the gas outlet part leading to the gas jet nozzle part, the opening facing wall part and the gas lead part, and for circulating the gas from the vent passage of the filter part to the gas jet nozzle part A flow path and an outflow suppression wall portion extending from the opening-facing wall portion toward the filter portion, wherein gas from the ventilation passage of the filter portion that collides with the opening-facing wall portion is communicated with the communication portion. Suppresses leakage from the flow path An outflow suppression wall portion, the extended end portion of the outflow suppression wall portion and the filter portion are spaced apart from each other, and the extended end portion of the outflow suppression wall portion and the filter portion It is related with the board | substrate storage container in which the clearance gap is formed between.
 また、前記流出抑制壁部の延出端部は、前記開口対向壁部の方向へ窪んだ水抜き切欠きを有することが好ましい。 Moreover, it is preferable that the extended end portion of the outflow suppression wall portion has a drain notch that is recessed toward the opening-facing wall portion.
 また、前記水抜き切欠きは、前記容器本体の一端部と他端部とを結ぶ方向において、最も前記容器本体の一端部寄りの前記流出抑制壁部の部分に位置していることが好ましい。 Further, it is preferable that the drain notch is located at a portion of the outflow suppression wall portion closest to one end portion of the container main body in a direction connecting the one end portion and the other end portion of the container main body.
 また、前記連通部の前記気体導出部は、前記基板収納空間側開口を形成する前記フィルタ部ハウジングの側部に対向する開口側部対向部を有し、前記開口側部対向部と前記フィルタ部ハウジングの側部とは、離間する位置関係を有し、前記開口側部対向部と前記フィルタ部ハウジングの側部との間には、隙間が形成されていることが好ましい。 Further, the gas lead-out part of the communication part has an opening side part facing part facing the side part of the filter part housing forming the substrate housing space side opening, and the opening side part facing part and the filter part It is preferable that the side portion of the housing has a positional relationship of being spaced apart, and a gap is formed between the opening side portion facing portion and the side portion of the filter portion housing.
 また、前記開口側部対向部と前記フィルタ部ハウジングの側部との間の隙間は、前記容器本体の他端部から一端部へと向う方向に開口していることが好ましい。 Further, it is preferable that the gap between the opening side portion facing portion and the side portion of the filter portion housing is opened in a direction from the other end portion of the container main body to one end portion.
 また、前記開口対向壁部は、前記気体噴出ノズル部に近づくほど、前記フィルタ部から離間するように傾斜していることが好ましい。 Further, it is preferable that the opening facing wall portion is inclined so as to be separated from the filter portion as it approaches the gas ejection nozzle portion.
 本発明によれば、連通部に洗浄水が残ることを抑制する基板収納容器を提供することができる。 According to the present invention, it is possible to provide a substrate storage container that suppresses cleaning water from remaining in the communication portion.
本発明の実施形態に係る基板収納容器1に基板Wが収納された様子を示す分解斜視図である。It is a disassembled perspective view which shows a mode that the board | substrate W was accommodated in the substrate storage container 1 which concerns on embodiment of this invention. 本発明の実施形態に係る容器本体2を示す下方斜視図である。It is a downward perspective view which shows the container main body 2 which concerns on embodiment of this invention. 本発明の実施形態に係る基板収納容器1の容器本体2を示す斜視図である。It is a perspective view which shows the container main body 2 of the substrate storage container 1 which concerns on embodiment of this invention. 本発明の実施形態に係る基板収納容器1の容器本体2を示す断面図である。It is sectional drawing which shows the container main body 2 of the substrate storage container 1 which concerns on embodiment of this invention. 本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す上方斜視図である。It is an upper perspective view which shows the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. 本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す断面図である。It is sectional drawing which shows the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. 本発明の実施形態に係る基板収納容器1の気体噴出ノズル部91と、連通部93とを示す下方斜視図である。It is a downward perspective view which shows the gas ejection nozzle part 91 and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. 本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す拡大斜視図である。It is an expansion perspective view which shows the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 which concern on embodiment of this invention. 本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す拡大断面図である。It is an expanded sectional view showing filter part 80, gas ejection nozzle part 91, and communication part 93 of substrate storage container 1 concerning an embodiment of the present invention.
 以下、本発明の実施形態による基板収納容器1について、図面を参照しながら説明する。図1は、本発明の実施形態に係る基板収納容器1に基板Wが収納された様子を示す分解斜視図である。図2は、本発明の実施形態に係る容器本体2を示す下方斜視図である。図3は、本発明の実施形態に係る基板収納容器1の容器本体2を示す斜視図である。図4は、本発明の実施形態に係る基板収納容器1の容器本体2を示す断面図である。図5は、本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す上方斜視図である。 Hereinafter, a substrate storage container 1 according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an exploded perspective view showing a state in which a substrate W is stored in a substrate storage container 1 according to an embodiment of the present invention. FIG. 2 is a lower perspective view showing the container body 2 according to the embodiment of the present invention. FIG. 3 is a perspective view showing the container body 2 of the substrate storage container 1 according to the embodiment of the present invention. FIG. 4 is a cross-sectional view showing the container body 2 of the substrate storage container 1 according to the embodiment of the present invention. FIG. 5 is an upper perspective view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention.
 図6は、本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す断面図である。図7は、本発明の実施形態に係る基板収納容器1の気体噴出ノズル部91と、連通部93とを示す下方斜視図である。図8は、本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す拡大斜視図である。図9は、本発明の実施形態に係る基板収納容器1のフィルタ部80と、気体噴出ノズル部91と、連通部93とを示す拡大断面図である。 FIG. 6 is a cross-sectional view showing the filter portion 80, the gas ejection nozzle portion 91, and the communication portion 93 of the substrate storage container 1 according to the embodiment of the present invention. FIG. 7 is a lower perspective view showing the gas ejection nozzle portion 91 and the communication portion 93 of the substrate storage container 1 according to the embodiment of the present invention. FIG. 8 is an enlarged perspective view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention. FIG. 9 is an enlarged cross-sectional view showing the filter part 80, the gas ejection nozzle part 91, and the communication part 93 of the substrate storage container 1 according to the embodiment of the present invention.
 ここで、説明の便宜上、後述の容器本体2から蓋体3へ向かう方向(図1における右上から左下へ向かう方向)を前方向D11と定義し、その反対の方向を後方向D12と定義し、これらを併せて前後方向D1と定義する。また、後述の下壁24から上壁23へと向かう方向(図1における上方向)を上方向D21と定義し、その反対の方向を下方向D22と定義し、これらを併せて上下方向D2と定義する。また、後述する第2側壁26から第1側壁25へと向かう方向(図1における右下から左上へ向かう方向)を左方向D31と定義し、その反対の方向を右方向D32と定義し、これらを併せて左右方向D3と定義する。 Here, for convenience of explanation, a direction from the container body 2 described later to the lid 3 (direction from the upper right to the lower left in FIG. 1) is defined as the front direction D11, and the opposite direction is defined as the rear direction D12. These are collectively defined as the front-rear direction D1. Further, a direction (upward direction in FIG. 1) from the lower wall 24 to the upper wall 23 to be described later is defined as an upward direction D21, and the opposite direction is defined as a downward direction D22. Define. Further, a direction from the second side wall 26 to be described later to the first side wall 25 (a direction from the lower right to the upper left in FIG. 1) is defined as the left direction D31, and the opposite direction is defined as the right direction D32. Is also defined as a left-right direction D3.
 また、基板収納容器1に収納される基板W(図1参照)は、円盤状のシリコンウェーハ、ガラスウェーハ、サファイアウェーハ等であり、産業に用いられる薄いものである。本実施形態における基板Wは、直径300mm~450mmのシリコンウェーハである。 Further, the substrate W (see FIG. 1) stored in the substrate storage container 1 is a disk-shaped silicon wafer, glass wafer, sapphire wafer, etc., and is a thin one used in the industry. The substrate W in this embodiment is a silicon wafer having a diameter of 300 mm to 450 mm.
 図1に示すように、基板収納容器1は、上述のようなシリコンウェーハからなる基板Wを収納して、工場内の工程において搬送する工程内容器として用いられたり、陸運手段、空運手段、海運手段等の輸送手段により基板を輸送するための出荷容器として用いられたりするものであり、容器本体2と、蓋体3と、側方基板支持部としての基板支持板状部5と、奥側基板支持部6と、蓋体側基板支持部としてのフロントリテーナ(図示せず)とを有している。 As shown in FIG. 1, the substrate storage container 1 is used as an in-process container for storing a substrate W made of a silicon wafer as described above and transporting it in a process in a factory, or by land transportation means, air transportation means, sea transportation. Used as a shipping container for transporting a substrate by transport means such as a container, a container main body 2, a lid 3, a substrate support plate-like portion 5 as a side substrate support portion, and a back side It has the board | substrate support part 6 and the front retainer (not shown) as a cover body side board | substrate support part.
 容器本体2は、一端部に容器本体開口部21が形成され、他端部が閉塞された筒状の壁部20を有する。容器本体2内には基板収納空間27が形成されている。基板収納空間27は、壁部20により取り囲まれて形成されている。壁部20の部分であって基板収納空間27を形成している部分には、基板支持板状部5が配置されている。基板収納空間27には、図1に示すように、複数の基板Wを収納可能である。 The container body 2 has a cylindrical wall portion 20 in which a container body opening 21 is formed at one end and the other end is closed. A substrate storage space 27 is formed in the container body 2. The substrate storage space 27 is formed so as to be surrounded by the wall portion 20. The substrate support plate-shaped portion 5 is disposed in a portion of the wall portion 20 that forms the substrate storage space 27. As shown in FIG. 1, a plurality of substrates W can be stored in the substrate storage space 27.
 基板支持板状部5は、基板収納空間27内において対をなすように壁部20に設けられている。基板支持板状部5は、蓋体3によって容器本体開口部21が閉塞されていないときに、複数の基板Wの縁部に当接することにより、隣接する基板W同士を所定の間隔で離間させて並列させた状態で、複数の基板Wの縁部を支持可能である。基板支持板状部5の奥側には、奥側基板支持部6(図3等参照)が設けられている。 The substrate support plate-like portion 5 is provided on the wall portion 20 so as to form a pair in the substrate storage space 27. When the container body opening 21 is not closed by the lid 3, the substrate support plate-like portion 5 abuts the edges of the plurality of substrates W to separate the adjacent substrates W at a predetermined interval. The edges of the plurality of substrates W can be supported in a state where they are aligned in parallel. A back side substrate support portion 6 (see FIG. 3 and the like) is provided on the back side of the substrate support plate-like portion 5.
 奥側基板支持部6は、基板収納空間27内においてフロントリテーナ(図示せず)と対をなすように壁部20に設けられている。奥側基板支持部6は、蓋体3によって容器本体開口部21が閉塞されているときに、複数の基板Wの縁部に当接することにより、複数の基板Wの縁部の後部を支持可能である。 The back substrate support 6 is provided on the wall 20 so as to be paired with a front retainer (not shown) in the substrate storage space 27. The back side substrate support portion 6 can support the rear portions of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. It is.
 蓋体3は、容器本体開口部21を形成する開口周縁部28(図1等)に対して着脱可能であり、容器本体開口部21を閉塞可能である。フロントリテーナ(図示せず)は、蓋体3の部分であって蓋体3によって容器本体開口部21が閉塞されているときに基板収納空間27に対向する部分に設けられている。フロントリテーナ(図示せず)は、基板収納空間27の内部において奥側基板支持部6と対をなすように配置されている。 The lid 3 can be attached to and detached from the opening peripheral edge 28 (FIG. 1 and the like) forming the container body opening 21 and can close the container body opening 21. The front retainer (not shown) is provided in a portion of the lid 3 that faces the substrate storage space 27 when the container main body opening 21 is closed by the lid 3. The front retainer (not shown) is disposed inside the substrate storage space 27 so as to be paired with the back substrate support portion 6.
 フロントリテーナ(図示せず)は、蓋体3によって容器本体開口部21が閉塞されているときに、複数の基板Wの縁部に当接することにより複数の基板Wの縁部の前部を支持可能である。フロントリテーナ(図示せず)は、蓋体3によって容器本体開口部21が閉塞されているときに、奥側基板支持部6と協働して複数の基板Wを支持することにより、隣接する基板W同士を所定の間隔で離間させて並列させた状態で、複数の基板Wを保持する。以下、各部について、詳細に説明する。 The front retainer (not shown) supports the front part of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. Is possible. The front retainer (not shown) supports adjacent substrates by supporting the plurality of substrates W in cooperation with the back substrate support 6 when the container body opening 21 is closed by the lid 3. A plurality of substrates W are held in a state where the Ws are separated from each other at a predetermined interval and are arranged in parallel. Hereinafter, each part will be described in detail.
 基板収納容器1は、プラスチック材等の樹脂で構成されており、特に説明が無い場合には、その材料の樹脂としては、たとえば、ポリカーボネート、シクロオレフィンポリマー、ポリエーテルイミド、ポリエーテルケトン、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、液晶ポリマーといった熱可塑性樹脂やこれらのアロイ等が用いられている。これらの成形材料の樹脂に導電性を付与する場合には、カーボン繊維、カーボンパウダー、カーボンナノチューブ、導電性ポリマー等の導電性物質が、これらの成形材料の樹脂に選択的に添加される。また、剛性を上げるために、これらの成形材料の樹脂に、ガラス繊維や炭素繊維等が添加されてもよい。 The substrate storage container 1 is made of a resin such as a plastic material. Unless otherwise specified, examples of the resin of the material include polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, and polybutylene. Thermoplastic resins such as terephthalate, polyether ether ketone, and liquid crystal polymer, and alloys thereof are used. When imparting conductivity to the resins of these molding materials, conductive substances such as carbon fibers, carbon powder, carbon nanotubes, and conductive polymers are selectively added to the resins of these molding materials. Moreover, in order to raise rigidity, glass fiber, carbon fiber, etc. may be added to resin of these molding materials.
 図1等に示すように、容器本体2の壁部20は、奥壁22と上壁23と下壁24と第1側壁25と第2側壁26とを有する。奥壁22、上壁23、下壁24、第1側壁25、及び第2側壁26は、上述の材料により構成されており、本実施形態では、ポリカーボネートにより一体成形されて構成されている。 As shown in FIG. 1 and the like, the wall portion 20 of the container body 2 includes a back wall 22, an upper wall 23, a lower wall 24, a first side wall 25, and a second side wall 26. The back wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26 are made of the above-described material, and in the present embodiment, are integrally formed of polycarbonate.
 第1側壁25と第2側壁26とは対向しており、上壁23と下壁24とは対向している。上壁23の後端、下壁24の後端、第1側壁25の後端、及び第2側壁26の後端は、全て奥壁22に接続されている。上壁23の前端、下壁24の前端、第1側壁25の前端、及び第2側壁26の前端は、奥壁22に対向する位置関係を有し、略長方形状をした容器本体開口部21を形成する開口周縁部28を構成する。 The first side wall 25 and the second side wall 26 face each other, and the upper wall 23 and the lower wall 24 face each other. The rear end of the upper wall 23, the rear end of the lower wall 24, the rear end of the first side wall 25, and the rear end of the second side wall 26 are all connected to the back wall 22. The front end of the upper wall 23, the front end of the lower wall 24, the front end of the first side wall 25, and the front end of the second side wall 26 have a positional relationship facing the back wall 22 and have a substantially rectangular shape. Opening peripheral edge portion 28 is formed.
 開口周縁部28は、容器本体2の一端部に設けられており、奥壁22は、容器本体2の他端部に位置している。壁部20の外面により形成される容器本体2の外形は箱状である。壁部20の内面、即ち、奥壁22の内面、上壁23の内面、下壁24の内面、第1側壁25の内面、及び第2側壁26の内面は、これらによって取り囲まれた基板収納空間27を形成している。開口周縁部28に形成された容器本体開口部21は、壁部20により取り囲まれて容器本体2の内部に形成された基板収納空間27に連通している。基板収納空間27には、最大で25枚の基板Wを収納可能である。 The opening peripheral edge 28 is provided at one end of the container main body 2, and the back wall 22 is located at the other end of the container main body 2. The outer shape of the container body 2 formed by the outer surface of the wall portion 20 is box-shaped. The inner surface of the wall portion 20, that is, the inner surface of the back wall 22, the inner surface of the upper wall 23, the inner surface of the lower wall 24, the inner surface of the first side wall 25, and the inner surface of the second side wall 26 are surrounded by these. 27 is formed. The container main body opening 21 formed in the opening peripheral edge portion 28 is surrounded by the wall portion 20 and communicates with the substrate storage space 27 formed in the container main body 2. A maximum of 25 substrates W can be stored in the substrate storage space 27.
 図1に示すように、上壁23及び下壁24の部分であって、開口周縁部28の近傍の部分には、基板収納空間27の外方へ向かって窪んだラッチ係合凹部231A、231B、241A、241Bが形成されている。ラッチ係合凹部231A、231B、241A、241Bは、上壁23及び下壁24の左右両端部近傍に1つずつ、計4つ形成されている。 As shown in FIG. 1, latch engaging recesses 231 </ b> A and 231 </ b> B that are recessed toward the outside of the substrate storage space 27 in the portions of the upper wall 23 and the lower wall 24 and in the vicinity of the opening peripheral edge portion 28. , 241A, 241B are formed. A total of four latch engaging recesses 231A, 231B, 241A, 241B are formed near the left and right ends of the upper wall 23 and the lower wall 24, one each.
 図1に示すように、上壁23の外面においては、リブ235A、235Bが、上壁23と一体成形されて設けられている。リブ235A、235Bは、容器本体2の剛性を高める。また、上壁23の中央部には、トップフランジ236が固定される。トップフランジ236は、AMHS(自動ウェーハ搬送システム)、PGV(ウェーハ基板搬送台車)等において基板収納容器1を吊り下げる際に、基板収納容器1において掛けられて吊り下げられる部分となる部材である。 As shown in FIG. 1, ribs 235 </ b> A and 235 </ b> B are integrally formed with the upper wall 23 on the outer surface of the upper wall 23. The ribs 235A and 235B increase the rigidity of the container body 2. A top flange 236 is fixed to the central portion of the upper wall 23. The top flange 236 is a member that is a portion that is hung and suspended in the substrate storage container 1 when the substrate storage container 1 is suspended in an AMHS (automatic wafer conveyance system), a PGV (wafer substrate conveyance cart), or the like.
 図2に示すように、下壁24の四隅には、2種類の貫通孔245、246が形成されている。貫通孔245、246には、図9に示す構成とされたフィルタ部80が配置されている。 As shown in FIG. 2, two types of through holes 245 and 246 are formed at the four corners of the lower wall 24. In the through holes 245 and 246, the filter unit 80 configured as shown in FIG. 9 is arranged.
 図9に示すようにフィルタ部80は、フィルタ部ハウジングとしての内側開口形成部81、第1ハウジング部82、ノズル部83、及び、第2ハウジング部84と、フィルタ85と、を有している。内側開口形成部81、第1ハウジング部82、ノズル部83、及び、第2ハウジング部84は、それぞれ別個独立した部品により構成された別体で構成されている。従って、内側開口形成部81、第1ハウジング部82、及び、第2ハウジング部84により構成される内部側フィルタ部ハウジング部は、ノズル部83とは別体で構成されている。また、内側開口形成部81、第1ハウジング部82、ノズル部83、第2ハウジング部84により構成されるフィルタ部ハウジングによって、基板収納空間27と容器本体2の外部の空間とを連通可能な通気路801が形成される。上下方向D2におけるフィルタ部80の高さは、29.3mmである。左右方向D3におけるフィルタ部80の幅(フィルタ部80の直径)は38mmである。 As shown in FIG. 9, the filter portion 80 includes an inner opening forming portion 81 as a filter portion housing, a first housing portion 82, a nozzle portion 83, a second housing portion 84, and a filter 85. . The inner opening forming portion 81, the first housing portion 82, the nozzle portion 83, and the second housing portion 84 are configured as separate bodies each composed of separate and independent parts. Therefore, the inner side filter part housing part comprised by the inner side opening formation part 81, the 1st housing part 82, and the 2nd housing part 84 is comprised separately from the nozzle part 83. FIG. In addition, the filter housing that includes the inner opening forming portion 81, the first housing portion 82, the nozzle portion 83, and the second housing portion 84 can ventilate the substrate storage space 27 and the space outside the container body 2. A path 801 is formed. The height of the filter unit 80 in the vertical direction D2 is 29.3 mm. The width of the filter unit 80 (the diameter of the filter unit 80) in the left-right direction D3 is 38 mm.
 図9等に示す構成とされたフィルタ部80においては、フィルタ85を通して容器本体2の外部の空間から基板収納空間27へ気体としての窒素等の不活性ガスあるいは水分を除去(1%以下)したドライエア(以下、パージガスという)等を通過可能であり、また、フィルタ85を通して基板収納空間27から容器本体2の外部の空間へ気体を通過可能である。 In the filter unit 80 configured as shown in FIG. 9 and the like, inert gas such as nitrogen or moisture as gas is removed from the space outside the container body 2 to the substrate storage space 27 through the filter 85 (1% or less). Dry air (hereinafter referred to as “purge gas”) or the like can pass therethrough, and gas can pass through the filter 85 from the substrate storage space 27 to a space outside the container body 2.
 内側開口形成部81は、円盤形状を有している。内側開口形成部81には、内側開口形成部81の中心から放射状に、多数の貫通孔803が形成されている。多数の貫通孔803は、通気路801を構成する。多数の貫通孔803の上端における開口は、基板収納空間27に位置し、後述する連通部93の開口対向壁部931に向って開口する基板収納空間側開口804を形成する。従って、通気路801は、基板収納空間側開口804を有している。 The inner opening forming portion 81 has a disk shape. A large number of through holes 803 are formed in the inner opening forming portion 81 radially from the center of the inner opening forming portion 81. A large number of through holes 803 form a ventilation path 801. The openings at the upper ends of the numerous through holes 803 are located in the substrate storage space 27 and form a substrate storage space side opening 804 that opens toward an opening facing wall portion 931 of the communication portion 93 described later. Therefore, the ventilation path 801 has a substrate storage space side opening 804.
 図9に示すように、第1ハウジング部82は、筒状部821と端部フランジ部822と上端壁部823とを有している。筒状部821は、円筒形状を有している。筒状部821の側面(外周面)には、雄ネジ部が螺刻されている。筒状部821の側面の部分であって雄ネジ部よりも上方の部分には、小フランジ部824が筒状部821と一体成形されて設けられている。端部フランジ部822は、小フランジ部824が存在する筒状部821の部分よりも上方の筒状部821の上端部に、筒状部821と一体成形されて設けられている。 As shown in FIG. 9, the first housing part 82 has a cylindrical part 821, an end flange part 822, and an upper end wall part 823. The cylindrical part 821 has a cylindrical shape. A male screw portion is threaded on the side surface (outer peripheral surface) of the cylindrical portion 821. A small flange portion 824 is integrally formed with the cylindrical portion 821 at a portion on the side surface of the cylindrical portion 821 and above the male screw portion. The end flange portion 822 is integrally formed with the tubular portion 821 at the upper end portion of the tubular portion 821 above the portion of the tubular portion 821 where the small flange portion 824 exists.
 小フランジ部824と端部フランジ部822との間には、Oリング201が配置されている。Oリング201は、第1ハウジング部82と、貫通孔245を形成している下壁24の部分と、の間に、挟まれるようにして、配置されている。これにより、第1ハウジング部82と、貫通孔245を形成している下壁24の部分と、の間がシールされている。 An O-ring 201 is disposed between the small flange portion 824 and the end flange portion 822. The O-ring 201 is disposed so as to be sandwiched between the first housing portion 82 and the portion of the lower wall 24 that forms the through hole 245. As a result, the space between the first housing portion 82 and the portion of the lower wall 24 forming the through hole 245 is sealed.
 端部フランジ部822は、上方向D21へ延びる突部825を有している。突部825と内側開口形成部81の環状周縁部811に形成された凹部815とは、超音波により溶着され、これにより、端部フランジ部822は、環状周縁部811に固定されている。この結果、第1ハウジング部82は、内側開口形成部81と同軸的な位置関係で、内側開口形成部81に接続されている。 The end flange portion 822 has a protrusion 825 extending in the upward direction D21. The protrusion 825 and the recess 815 formed in the annular peripheral edge 811 of the inner opening forming portion 81 are welded by ultrasonic waves, whereby the end flange portion 822 is fixed to the annular peripheral edge 811. As a result, the first housing portion 82 is connected to the inner opening forming portion 81 in a positional relationship coaxial with the inner opening forming portion 81.
 上端壁部823は、筒状部821の上端部を塞ぐように筒状部821と一体成形され、板状を有している。上端壁部823には、貫通孔826が形成されており、貫通孔826にはパージガスG1が流通可能である。 The upper end wall portion 823 is integrally formed with the cylindrical portion 821 so as to close the upper end portion of the cylindrical portion 821, and has a plate shape. A through hole 826 is formed in the upper end wall portion 823, and the purge gas G <b> 1 can flow through the through hole 826.
 図9に示すように、ノズル部83は、筒状部831と外部突出部832とを有している。筒状部831は、円筒形状を有している。筒状部831の上部の外径は、第1ハウジング部82の筒状部821の内径よりも僅かに小さい。これにより、ノズル部83の筒状部831は、第1ハウジング部82の筒状部821の内周面により形成される空間内に、第1ハウジング部82の筒状部821と同軸的な位置関係で配置されている。 As shown in FIG. 9, the nozzle portion 83 has a cylindrical portion 831 and an external protruding portion 832. The cylindrical portion 831 has a cylindrical shape. The outer diameter of the upper part of the cylindrical part 831 is slightly smaller than the inner diameter of the cylindrical part 821 of the first housing part 82. Thereby, the cylindrical portion 831 of the nozzle portion 83 is positioned coaxially with the cylindrical portion 821 of the first housing portion 82 in the space formed by the inner peripheral surface of the cylindrical portion 821 of the first housing portion 82. Arranged in a relationship.
 筒状部831の外周面の下部は、外径が小さい外径小径部833を有している。外径小径部833の下端部は、外部突出部832を構成する。外部突出部832は、外部突出部832の半径方向内方へ突出する縮径環状板部835を有している。縮径環状板部835の中央には、貫通孔が形成されており、貫通孔は、外部空間側開口802を構成する。外部空間側開口802は、容器本体2の外部の空間に露出しており、容器本体2の外部の空間に接続されている。外部空間側開口802は、通気路801を構成する。従って、通気路801は、外部空間側開口802を有している。 The lower part of the outer peripheral surface of the cylindrical part 831 has an outer diameter small diameter part 833 with a small outer diameter. A lower end portion of the outer diameter small diameter portion 833 constitutes an external protruding portion 832. The external protrusion 832 has a reduced diameter annular plate 835 that protrudes inward in the radial direction of the external protrusion 832. A through hole is formed in the center of the reduced diameter annular plate portion 835, and the through hole constitutes an external space side opening 802. The external space side opening 802 is exposed to a space outside the container body 2 and is connected to a space outside the container body 2. The external space side opening 802 constitutes a ventilation path 801. Therefore, the ventilation path 801 has an external space side opening 802.
 図9に示すように、第2ハウジング部84は、筒状部841と、端部内方突出部842とを有している。筒状部841は、円筒形状を有している。筒状部841の内径は、第1ハウジング部82の筒状部821の外径よりも大きい。第1ハウジング部82は、第2ハウジング部84の筒状部841の内周面により形成される空間内に、第2ハウジング部84の筒状部841と同軸的な位置関係で配置されている。 As shown in FIG. 9, the second housing part 84 has a cylindrical part 841 and an end inward projecting part 842. The cylindrical portion 841 has a cylindrical shape. The inner diameter of the cylindrical portion 841 is larger than the outer diameter of the cylindrical portion 821 of the first housing portion 82. The first housing part 82 is arranged in a coaxial relationship with the cylindrical part 841 of the second housing part 84 in a space formed by the inner peripheral surface of the cylindrical part 841 of the second housing part 84. .
 筒状部841の内周面には、雌ネジ部が螺刻されている。雌ネジ部には、第1ハウジング部82の筒状部821の雄ネジ部が螺合する。これにより、第2ハウジング部84は、第1ハウジング部82に固定される。端部内方突出部842は、筒状部841の下端部に一体成形されて設けられている。端部内方突出部842は、筒状部841の下端部から、筒状部841の半径方向内方へ突出しており、筒状部841の内周面に沿った環状の板状を有している。 A female screw portion is threaded on the inner peripheral surface of the cylindrical portion 841. The male screw portion of the cylindrical portion 821 of the first housing portion 82 is screwed into the female screw portion. As a result, the second housing part 84 is fixed to the first housing part 82. The end inward projecting portion 842 is integrally formed with the lower end portion of the tubular portion 841. The end inward projecting portion 842 projects from the lower end portion of the tubular portion 841 inward in the radial direction of the tubular portion 841, and has an annular plate shape along the inner peripheral surface of the tubular portion 841. Yes.
 ノズル部83の部分であって、外部空間側開口802の周囲の部分、即ち、外部突出部832及び縮径環状板部835は、フィルタ外郭ハウジング部の下端部を構成する端部内方突出部842の下端部よりも、通気路801が外部空間側開口802において開口する方向である下方向D22に突出している。即ち、ノズル部83の外部突出部832及び縮径環状板部835は、フィルタ部80において、最も下方に突出している。換言すれば、外部突出部832及び縮径環状板部835は、フィルタ部ハウジングを構成するノズル部83以外の部材である、内側開口形成部81、第1ハウジング部82、及び、第2ハウジング部84のいずれの部分よりも下方へ突出している。 A portion of the nozzle portion 83 and a portion around the outer space side opening 802, that is, the outer protruding portion 832 and the reduced-diameter annular plate portion 835 are end inward protruding portions 842 constituting the lower end portion of the filter outer housing portion. The air passage 801 protrudes in a downward direction D22 which is a direction in which the air passage 801 opens at the external space side opening 802 from the lower end portion of the air. That is, the external projecting portion 832 and the reduced diameter annular plate portion 835 of the nozzle portion 83 project downward in the filter unit 80. In other words, the outer protruding portion 832 and the reduced diameter annular plate portion 835 are members other than the nozzle portion 83 constituting the filter portion housing, and are the inner opening forming portion 81, the first housing portion 82, and the second housing portion. It projects downward from any part of 84.
 ノズル部83には、アウトガス発生量の少ないポリカーボネートを用いた。ポリカーボネート以外には、シクロオレフィンポリマーやポリエーテルイミド、ポリエーテルエーテルケトンなどの樹脂を用いることができる。また、ノズル部83には、弾性部材を用いることもできる。弾性部材としては、例えば、ポリブチレンテレフタレートやポリエチレン等の樹脂やポリエチレンエラストマーやポリオレフィンエラストマー等のエラストマー、シリコンゴムやフッ素ゴム等のゴム材を用いることができる。ノズル部83の外部突出部832及び縮径環状板部835の下端面は、シボ加工が施されて、粗面化されている。 For the nozzle part 83, polycarbonate with a small outgas generation amount was used. In addition to polycarbonate, resins such as cycloolefin polymer, polyetherimide, and polyetheretherketone can be used. In addition, an elastic member can be used for the nozzle portion 83. As the elastic member, for example, a resin such as polybutylene terephthalate or polyethylene, an elastomer such as polyethylene elastomer or polyolefin elastomer, or a rubber material such as silicon rubber or fluorine rubber can be used. The outer projecting portion 832 of the nozzle portion 83 and the lower end surface of the reduced-diameter annular plate portion 835 are roughened by being textured.
 図9に示すように、第2ハウジング部84とノズル部83との間には、Oリング847が配置されている。Oリング847は、第2ハウジング部84の端部内方突出部842の上面と、ノズル部83の筒状部831の上部と外径小径部833との接続位置に形成された段部と、の間に挟まれるようにして、配置されている。これにより、外径小径部833のすぐ上の筒状部831の部分は、Oリング847を介して、第2ハウジング部84との間でシールされて支持されている。 As shown in FIG. 9, an O-ring 847 is disposed between the second housing portion 84 and the nozzle portion 83. The O-ring 847 includes an upper surface of the end inward projecting portion 842 of the second housing portion 84, and a step portion formed at a connection position between the upper portion of the tubular portion 831 of the nozzle portion 83 and the outer diameter small diameter portion 833. It is arranged so as to be sandwiched between them. Thus, the portion of the cylindrical portion 831 immediately above the outer diameter small diameter portion 833 is sealed and supported with the second housing portion 84 via the O-ring 847.
 フィルタ部80においては、フィルタ部ハウジングを構成する内側開口形成部81、第1ハウジング部82、ノズル部83、及び、第2ハウジング部84により、通気路801が形成されている。より具体的には、通気路801は、内側開口形成部81の貫通孔803の基板収納空間側開口804から、ノズル部83の外部空間側開口802まで続いている。 In the filter part 80, an air passage 801 is formed by the inner opening forming part 81, the first housing part 82, the nozzle part 83, and the second housing part 84 constituting the filter part housing. More specifically, the air passage 801 continues from the substrate storage space side opening 804 of the through hole 803 of the inner opening forming portion 81 to the outer space side opening 802 of the nozzle portion 83.
 フィルタ85は、疎水性の材料により構成されており、円盤形状を有している。フィルタ85の周縁部は、第1ハウジング部82の筒状部821の上端面に熱溶着により固定されている。これによりフィルタ85は、通気路801に配置されている。フィルタ85は、内側開口形成部81の貫通孔803をパーティクル等が通過することを阻止する。また、フィルタ85は、疎水性の材料により構成されており、少量の洗浄水(純水)は、フィルタ85によって流通が阻害される。 The filter 85 is made of a hydrophobic material and has a disk shape. The peripheral portion of the filter 85 is fixed to the upper end surface of the cylindrical portion 821 of the first housing portion 82 by heat welding. Thus, the filter 85 is disposed in the ventilation path 801. The filter 85 prevents particles and the like from passing through the through hole 803 of the inner opening forming portion 81. The filter 85 is made of a hydrophobic material, and a small amount of cleaning water (pure water) is inhibited from flowing by the filter 85.
 また、基板収納容器1は、気体噴出ノズル部91と連通部93とを2つずつ備えている。2つの気体噴出ノズル部91は、同一形状を有しており、また、2つの連通部93は、同一形状を有している。このため、一方の気体噴出ノズル部91、連通部93のみについて説明し、他方の気体噴出ノズル部91、連通部93については、説明を省略する。 Also, the substrate storage container 1 includes two gas ejection nozzle portions 91 and two communication portions 93. The two gas ejection nozzle portions 91 have the same shape, and the two communication portions 93 have the same shape. For this reason, only one gas ejection nozzle part 91 and the communication part 93 are demonstrated, and description about the other gas ejection nozzle part 91 and the communication part 93 is abbreviate | omitted.
 気体噴出ノズル部91は、フィルタ部80の通気路801に流入した気体としてのパージガス等を、基板収納空間27に供給する。具体的には、気体噴出ノズル部91は、図5~図7に示すように、上端部が閉塞され、下端部が開口している略円筒形状のノズル部本体911を有している。ノズル部本体911の内径は、14mm程度である。 The gas ejection nozzle unit 91 supplies a purge gas or the like as a gas flowing into the air passage 801 of the filter unit 80 to the substrate storage space 27. Specifically, as shown in FIGS. 5 to 7, the gas ejection nozzle portion 91 has a substantially cylindrical nozzle body 911 that is closed at the upper end and opened at the lower end. The inner diameter of the nozzle body 911 is about 14 mm.
 ノズル部本体911には、気体噴出ノズル部91の内部と外部とを連通する貫通孔912が形成されている。貫通孔912は、気体噴出ノズル部91の上端部近傍の位置から下端部近傍の位置に至るまで、上下方向D2においては、基板収納容器1に収納可能な基板Wの数と同数である25個形成されている。貫通孔912は、気体噴出ノズル部91の周方向おいては、1つの貫通孔912が略4分の1周に相当する円弧形状を有して、略半周分程度の範囲にわたって2つ形成されている。従って、1つの気体噴出ノズル部91には、上下方向D1に沿って形成された25個の貫通孔912の組が、気体噴出ノズル部91の周方向に沿って2組形成されており、計50個の貫通孔912が形成されている。上下方向D2に沿って形成された25個の貫通孔912のうちの、1番上の貫通孔912以外は、全て、上下方向D2において、基板収納空間27に収納された25枚の基板W同士の間に位置している。1番上の貫通孔912は、上下方向D2において、1番上に収納された基板Wと上壁23との間に位置している。1番下に収納された基板Wと下壁24との間には貫通孔912は形成されていないが、この間においては、後述の隙間806、807、及び、水抜き切欠き936から流出するパージガスG1によりガスパージが行われる。 The nozzle body 911 is formed with a through-hole 912 that communicates the inside and the outside of the gas ejection nozzle 91. The number of through-holes 912 is the same as the number of substrates W that can be stored in the substrate storage container 1 in the vertical direction D2 from the position near the upper end of the gas ejection nozzle 91 to the position near the lower end. Is formed. In the circumferential direction of the gas ejection nozzle portion 91, two through-holes 912 have an arc shape corresponding to approximately a quarter of a circle, and two through-holes 912 are formed over a range of approximately a half circumference. ing. Accordingly, two sets of 25 through-holes 912 formed along the vertical direction D1 are formed in one gas ejection nozzle portion 91 along the circumferential direction of the gas ejection nozzle portion 91. Fifty through holes 912 are formed. Of the 25 through holes 912 formed along the vertical direction D2, all but the uppermost through hole 912 are 25 substrates W stored in the substrate storage space 27 in the vertical direction D2. Located between. The uppermost through hole 912 is located between the substrate W accommodated in the uppermost position and the upper wall 23 in the vertical direction D2. A through hole 912 is not formed between the substrate W stored at the bottom and the lower wall 24, but in this period, a purge gas flowing out from gaps 806 and 807 and a drain notch 936 described later. Gas purge is performed by G1.
 気体噴出ノズル部91の下端部は、被係止部913、914を有している。被係止部914は、気体噴出ノズル部91の下端部から、気体噴出ノズル部91の半径方向外方(図9における左方向)へ突出している。被係止部913は、気体噴出ノズル部91の下端部から、階段状に下方向D22へ一段下がり、気体噴出ノズル部91の半径方向外方(図9における右方向)へ突出している。気体噴出ノズル部91の半径方向外方(図9における右方向)へ突出している被係止部913の部分には、貫通孔が形成されている。 The lower end portion of the gas ejection nozzle portion 91 has locked portions 913 and 914. The locked portion 914 protrudes from the lower end portion of the gas ejection nozzle portion 91 outward in the radial direction of the gas ejection nozzle portion 91 (left direction in FIG. 9). The locked portion 913 is lowered stepwise in a downward direction D22 from the lower end portion of the gas ejection nozzle portion 91 and protrudes outward in the radial direction of the gas ejection nozzle portion 91 (right direction in FIG. 9). A through hole is formed in a portion of the locked portion 913 that protrudes radially outward (rightward in FIG. 9) of the gas ejection nozzle portion 91.
 連通部93は、フィルタ部80から気体噴出ノズル部91へ気体を流通可能に連通する。具体的には、連通部93は、開口対向壁部931と、気体導出部941と、連通部流路945と、流出抑制壁部935と、を有している。開口対向壁部931及び気体導出部941は、平面視で長円形状を有している。長円形状の長手方向における一端部寄りの部分は、開口対向壁部931により構成されており、開口対向壁部931は、フィルタ部80の基板収納空間側開口804に対向して配置されている。長円形状の長手方向における他端部寄りの部分は、気体導出部941により構成されており、気体導出部941には、上下方向に貫通する貫通口が形成されている。貫通孔の開口には、気体噴出ノズル部91の下端部の開口が接続されている。 The communication unit 93 communicates from the filter unit 80 to the gas ejection nozzle unit 91 so that gas can be circulated. Specifically, the communication part 93 includes an opening facing wall part 931, a gas outlet part 941, a communication part flow path 945, and an outflow suppression wall part 935. The opening facing wall portion 931 and the gas outlet portion 941 have an oval shape in plan view. A portion near one end in the longitudinal direction of the oval shape is configured by an opening facing wall portion 931, and the opening facing wall portion 931 is disposed to face the substrate storage space side opening 804 of the filter unit 80. . A portion near the other end in the longitudinal direction of the oval shape is configured by a gas outlet portion 941, and a through-hole penetrating in the vertical direction is formed in the gas outlet portion 941. The opening of the lower end part of the gas ejection nozzle part 91 is connected to the opening of the through hole.
 より具体的には、開口対向壁部931の一端部近傍の部分(図9における左端部近傍の部分)は、水平な板状の部分を有している。水平な板状の部分よりも他端部寄りの部分(図9における右端部寄りの部分)は、緩やかに他端部へ近づくほど、即ち、気体噴出ノズル部91の下端部の開口に近づくほど、フィルタ部80から離間するように傾斜している。具体的には、開口対向壁部931は、緩やかな傾斜を有する第1傾斜壁9311と、第1傾斜壁9311よりも急な傾斜を有する第2傾斜壁9312とを有しており、この順で、開口対向壁部931の一端部側から他端部側へ順に(図9の左から右へ順に)位置している。この構成により、開口対向壁部931は、開口対向壁部931に衝突した、フィルタ部80の通気路801からの気体としてのパージガスを、気体噴出ノズル部91の下端部の開口へ導く。 More specifically, a portion in the vicinity of one end portion of the opening facing wall portion 931 (portion in the vicinity of the left end portion in FIG. 9) has a horizontal plate-like portion. The portion closer to the other end than the horizontal plate-like portion (the portion closer to the right end in FIG. 9) gradually approaches the other end, that is, approaches the opening at the lower end of the gas ejection nozzle 91. Inclined to be separated from the filter unit 80. Specifically, the opening facing wall portion 931 includes a first inclined wall 9311 having a gentle inclination and a second inclined wall 9312 having a steeper inclination than the first inclined wall 9311. Thus, the opening facing wall portion 931 is positioned in order from the one end side to the other end side (in order from left to right in FIG. 9). With this configuration, the opening facing wall portion 931 guides the purge gas as the gas from the air passage 801 of the filter unit 80 that collides with the opening facing wall portion 931 to the opening at the lower end portion of the gas ejection nozzle portion 91.
 開口対向壁部931の一端部(図9における左端部)と他端部(図9における右端部)とを結ぶ方向における、開口対向壁部931の一端部から、第1傾斜壁9311と第2傾斜壁9312との接続位置までの長さL1は26mm程度である。また、同方向における、開口対向壁部931の一端部から、第2傾斜壁9312の図9における右端部までの長さL2は、34mm程度である。また、同方向に直交する方向における開口対向壁部931の幅L3(図8参照)は、32mm程度である。また、前後方向D1及び左右方向D3に平行な面に対する第1傾斜壁9311の傾斜角度A1は、4°程度である。前後方向D1及び左右方向D3に平行な面に対する第2傾斜壁9312の傾斜角度A2は、28°程度である。 From the one end part of the opening opposing wall part 931 in the direction connecting the one end part (left end part in FIG. 9) and the other end part (right end part in FIG. 9) of the opening opposing wall part 931, the first inclined wall 9311 and the second The length L1 to the connection position with the inclined wall 9312 is about 26 mm. Further, the length L2 from one end of the opening facing wall 931 to the right end in FIG. 9 of the second inclined wall 9312 in the same direction is about 34 mm. Further, the width L3 (see FIG. 8) of the opening facing wall portion 931 in the direction orthogonal to the same direction is about 32 mm. The inclination angle A1 of the first inclined wall 9311 with respect to the plane parallel to the front-rear direction D1 and the left-right direction D3 is about 4 °. The inclination angle A2 of the second inclined wall 9312 with respect to the plane parallel to the front-rear direction D1 and the left-right direction D3 is about 28 °.
 流出抑制壁部935は、開口対向壁部931の周縁から、フィルタ部80へ向って延出するとともに、図7に示すように、開口対向壁部931の周縁の全体に沿って存在している。図9等に示すように、流出抑制壁部935の延出端部(下端部)と、フィルタ部80の内側開口形成部81とは離間した位置関係を有している。このため、流出抑制壁部935の延出端部とフィルタ部80の内側開口形成部81との間には、隙間806が形成されている。 The outflow suppression wall portion 935 extends from the periphery of the opening facing wall portion 931 toward the filter portion 80 and exists along the entire periphery of the opening facing wall portion 931 as shown in FIG. . As shown in FIG. 9 and the like, the extended end portion (lower end portion) of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80 have a spaced apart positional relationship. For this reason, a gap 806 is formed between the extended end portion of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80.
 上下方向D2における隙間806の幅D1は、0.1mm~0.5mmであることが好ましい。幅D1が0.1mm未満では、洗浄水の表面張力により、洗浄水が隙間806を通過しにくくなるからである。また、幅D1が0.1mm未満では、製品のバラツキで流出抑制壁部935の下部が内側開口形成部81に当接して乗り上げてしまい、正常に基板収納容器1を組み立てることが出来なくなるためである。また、幅D1が0.5mmを超えると、フィルタ部80の通気路801から流通してくる気体であるパージガスが、隙間806から大量に漏れ出てしまい、気体噴出ノズル部91の貫通孔912から十分な量のパージガスを噴出することができなくなるためである。また、流出抑制壁部935の一端部(図9の左端部)における、開口対向壁部931から延出端(下端)までの高さL4は、略1.5mm程度である。流出抑制壁部935は、開口対向壁部931に衝突した、フィルタ部80の通気路801からの気体であるパージガスが、連通部流路945から隙間806を通して漏れ出ることを抑制する。 The width D1 of the gap 806 in the vertical direction D2 is preferably 0.1 mm to 0.5 mm. This is because if the width D1 is less than 0.1 mm, the cleaning water hardly passes through the gap 806 due to the surface tension of the cleaning water. In addition, if the width D1 is less than 0.1 mm, the lower part of the outflow suppression wall 935 abuts against the inner opening formation part 81 due to product variations, and the board storage container 1 cannot be assembled normally. is there. When the width D1 exceeds 0.5 mm, a large amount of purge gas, which is a gas flowing from the air passage 801 of the filter unit 80, leaks out from the gap 806, and from the through hole 912 of the gas ejection nozzle unit 91. This is because a sufficient amount of purge gas cannot be ejected. Further, the height L4 from the opening facing wall portion 931 to the extended end (lower end) at one end portion (left end portion in FIG. 9) of the outflow suppression wall portion 935 is about 1.5 mm. The outflow suppression wall portion 935 suppresses the purge gas, which is a gas from the air passage 801 of the filter unit 80 and collides with the opening facing wall portion 931, from leaking from the communication portion channel 945 through the gap 806.
 流出抑制壁部935の延出端部(下端部)は、開口対向壁部931の方向へ窪んだ水抜き切欠き936を有している。水抜き切欠き936は、図7等に示すように、矩形を有しており、開口対向壁部931に至るまで窪んでいる。水抜き切欠き936は、開口対向壁部931の一端部の弧状の部分において、弧状の両端と中央とにそれぞれ位置している。開口対向壁部931の一端部の弧状の両端のうちのいずれか一方の水抜き切欠き936は、図4等に示すように、容器本体2の一端部と他端部とを結ぶ方向である前後方向D1において、開口対向壁部931の最も容器本体2の一端部寄り(前端部寄り)の部分に位置している。 The extension end portion (lower end portion) of the outflow suppression wall portion 935 has a drain notch 936 that is recessed in the direction of the opening facing wall portion 931. As shown in FIG. 7 and the like, the drain notch 936 has a rectangular shape and is recessed to reach the opening facing wall portion 931. The drainage notches 936 are positioned at both ends and the center of the arc in the arc-shaped portion at one end of the opening facing wall 931. The drain notch 936 of any one of the arc-shaped ends of one end portion of the opening facing wall portion 931 is a direction connecting the one end portion and the other end portion of the container body 2 as shown in FIG. In the front-rear direction D <b> 1, the opening facing wall portion 931 is positioned closest to one end portion (close to the front end portion) of the container body 2.
 気体導出部941は、開口側部対向部942を有している。開口側部対向部942は、基板収納空間側開口804を形成するフィルタ部ハウジングとしての内側開口形成部81の側部に対向する。より具体的には、開口側部対向部942は、図7等に示すように、気体噴出ノズル部91の下端部の後側の部分を下方向へ延長させるような、底面視で略U字状を有する壁部により構成されている。開口対向壁部931の一端部(図7における開口対向壁部931の左上方の端部)に向かうにつれて、開口側部対向部942の略U字状の一対の先端部は、互いに離間するように広がる形状を有しており、略U字状の一対の先端部の上部は、流出抑制壁部935に一体成形されて接続されている。気体導出部941の後端部(図9の右端部)の内面は、図9に示すように、後部傾斜面9411により構成されている。後部傾斜面9411と、前後方向D1及び左右方向D3に平行な面とのなす角A3は、120°程度である。また、後部傾斜面9411の下端からノズル部83の軸心までの距離L5は、30mm程度である。また、後部傾斜面9411の下端から開口対向壁部931の一端部までの距離L6は、48mm程度である。 The gas outlet portion 941 has an opening side portion facing portion 942. The opening side facing portion 942 faces the side portion of the inner opening forming portion 81 as a filter portion housing that forms the substrate storage space side opening 804. More specifically, as shown in FIG. 7 and the like, the opening side facing portion 942 is substantially U-shaped in a bottom view so as to extend the rear side portion of the lower end portion of the gas ejection nozzle portion 91 downward. It is comprised by the wall part which has a shape. The pair of substantially U-shaped tip portions of the opening side facing portion 942 are separated from each other toward the one end of the opening facing wall 931 (the upper left end of the opening facing wall 931 in FIG. 7). The upper portions of the pair of substantially U-shaped tip portions are integrally formed and connected to the outflow suppression wall portion 935. As shown in FIG. 9, the inner surface of the rear end portion (the right end portion in FIG. 9) of the gas outlet portion 941 is configured by a rear inclined surface 9411. An angle A3 formed by the rear inclined surface 9411 and a surface parallel to the front-rear direction D1 and the left-right direction D3 is about 120 °. Further, the distance L5 from the lower end of the rear inclined surface 9411 to the axis of the nozzle portion 83 is about 30 mm. The distance L6 from the lower end of the rear inclined surface 9411 to one end of the opening facing wall 931 is about 48 mm.
 また、内側開口形成部81の側部に最も近接して対向する開口側部対向部942の前方向D11寄りの端部と、内側開口形成部81の側部とは、離間する位置関係を有しており、これらの間には、図8に示すように、隙間807が形成されている。隙間807は、図8に示す手前側と向こう側との両方に形成されているが、そのうちの一方は、図4に示すように、容器本体2の他端部から一端部へと向う方向(前方向D11)に向けて開口している。前後方向D1及び左右方向D3に平行な平面に沿った方向における。 In addition, the end portion near the front direction D11 of the opening side facing portion 942 that faces the side portion of the inner opening forming portion 81 closest to the side portion and the side portion of the inner opening forming portion 81 have a spaced apart positional relationship. A gap 807 is formed between them as shown in FIG. The gap 807 is formed on both the near side and the far side shown in FIG. 8, and one of them is a direction (from the other end of the container body 2 toward one end) as shown in FIG. Opening in the forward direction D11). In a direction along a plane parallel to the front-rear direction D1 and the left-right direction D3.
 気体導出部941の下部は、容器本体2の下壁24の貫通孔245に隣接して形成された、下方向D22へ窪んだ位置決め凹部に挿入されており、気体導出部941の下端部は、当該凹部の底面247に当接している。この当接により、開口対向壁部931及び気体導出部941は、下壁24に支持されており、流出抑制壁部935の延出端部とフィルタ部80の内側開口形成部81との間の隙間806が確保される。また、気体導出部941の下端部は、当該凹部(図示せず)の底面247に当接して位置決めされることにより、開口対向壁部931及び気体導出部941により構成される一対の長円形状は、図3、図4に示すように、略「ハ」の字状をなす位置関係で、下壁24に固定されている。 The lower portion of the gas outlet portion 941 is inserted into a positioning recess that is formed adjacent to the through hole 245 of the lower wall 24 of the container body 2 and is recessed in the downward direction D22. It contacts the bottom surface 247 of the recess. By this contact, the opening facing wall portion 931 and the gas outlet portion 941 are supported by the lower wall 24, and between the extended end portion of the outflow suppression wall portion 935 and the inner opening forming portion 81 of the filter portion 80. A gap 806 is secured. In addition, the lower end portion of the gas outlet portion 941 is positioned in contact with the bottom surface 247 of the concave portion (not shown), thereby forming a pair of oval shapes configured by the opening facing wall portion 931 and the gas outlet portion 941. As shown in FIGS. 3 and 4, these are fixed to the lower wall 24 in a positional relationship having a substantially “C” shape.
 気体導出部941の上端部には、係止部943と、フック部944とが設けられている。係止部943は、ノズル部本体911の半径方向外方へ気体導出部941から離間するように延び、上方向21へ延び、更に、ノズル部本体911の半径方向外方へ気体導出部941から離間するように延びている。被係止部913の貫通孔に係止部943が挿通され、被係止部914がフック部944に掛けられることにより、気体噴出ノズル部91の下端部が、気体導出部941の上端部に固定される。これにより、開口対向壁部931と気体導出部941とによって、フィルタ部80の通気路801からの気体としてのパージガスを気体噴出ノズル部91へ流通させる連通部流路945が形成される。連通部流路945は、基板収納空間側開口804と、気体噴出ノズル部91の内部空間とを連通する。 A locking portion 943 and a hook portion 944 are provided at the upper end portion of the gas outlet portion 941. The engaging portion 943 extends radially outward of the nozzle body 911 so as to be separated from the gas outlet 941, extends upward 21, and further radially outward of the nozzle body 911 from the gas outlet 941. It extends so as to be separated. The locking portion 943 is inserted into the through-hole of the locked portion 913 and the locked portion 914 is hooked on the hook portion 944, so that the lower end portion of the gas ejection nozzle portion 91 is connected to the upper end portion of the gas outlet portion 941. Fixed. As a result, the opening-facing wall portion 931 and the gas outlet portion 941 form a communication portion flow path 945 through which purge gas as a gas from the air passage 801 of the filter portion 80 is circulated to the gas ejection nozzle portion 91. The communication portion flow path 945 communicates the substrate storage space side opening 804 with the internal space of the gas ejection nozzle portion 91.
 図1等に示すように、蓋体3は、容器本体2の開口周縁部28の形状と略一致する略長方形状を有している。蓋体3は容器本体2の開口周縁部28に対して着脱可能であり、開口周縁部28に蓋体3が装着されることにより、蓋体3は、容器本体開口部21を閉塞可能である。蓋体3の内面(図1に示す蓋体3の裏側の面)であって、蓋体3が容器本体開口部21を閉塞しているときの開口周縁部28のすぐ後方向D12の位置に形成された段差の部分の面(シール面281)に対向する面には、環状のシール部材4が取り付けられている。シール部材4は、弾性変形可能なポリエステル系、ポリオレフィン系など各種熱可塑性エラストマー、フッ素ゴム製、シリコンゴム製等により構成されている。シール部材4は、蓋体3の外周縁部を一周するように配置されている。 As shown in FIG. 1 and the like, the lid 3 has a substantially rectangular shape that substantially matches the shape of the opening peripheral edge 28 of the container body 2. The lid 3 can be attached to and detached from the opening peripheral edge 28 of the container main body 2, and the lid 3 can close the container main body opening 21 by attaching the lid 3 to the opening peripheral edge 28. . It is the inner surface of the lid 3 (the surface on the back side of the lid 3 shown in FIG. 1), at the position in the rearward direction D12 of the opening peripheral edge 28 when the lid 3 closes the container main body opening 21. An annular seal member 4 is attached to the surface facing the formed stepped portion surface (seal surface 281). The seal member 4 is made of various types of thermoplastic elastomers such as polyester and polyolefin that can be elastically deformed, fluorine rubber, and silicon rubber. The seal member 4 is arranged so as to go around the outer peripheral edge of the lid 3.
 蓋体3が開口周縁部28に装着されたときに、シール部材4は、シール面281と蓋体3の内面とにより挟まれて弾性変形し、蓋体3は、容器本体開口部21を密閉した状態で閉塞する。開口周縁部28から蓋体3が取り外されることにより、容器本体2内の基板収納空間27に対して、基板Wを出し入れ可能となる。 When the lid 3 is attached to the opening peripheral edge 28, the seal member 4 is sandwiched between the seal surface 281 and the inner surface of the lid 3 and elastically deformed, and the lid 3 seals the container main body opening 21. Shuts down in a closed state. By removing the lid 3 from the opening peripheral edge 28, the substrate W can be taken into and out of the substrate storage space 27 in the container body 2.
 蓋体3においては、ラッチ機構が設けられている。ラッチ機構は、蓋体3の左右両端部近傍に設けられており、図1に示すように、蓋体3の上辺から上方向D21へ突出可能な2つの上側ラッチ部32A、32Bと、蓋体3の下辺から下方向D22へ突出可能な2つの下側ラッチ部(図示せず)と、を備えている。2つの上側ラッチ部32A、32Bは、蓋体3の上辺の左右両端近傍に配置されており、2つの下側ラッチ部は、蓋体3の下辺の左右両端近傍に配置されている。 The lid 3 is provided with a latch mechanism. The latch mechanism is provided in the vicinity of both left and right ends of the lid 3, and as shown in FIG. 1, two upper latch portions 32A and 32B that can project in the upward direction D21 from the upper side of the lid 3, and the lid 3, two lower latch portions (not shown) that can project in the downward direction D22 from the lower side of 3. The two upper latch portions 32 </ b> A and 32 </ b> B are disposed in the vicinity of the left and right ends of the upper side of the lid 3, and the two lower latch portions are disposed in the vicinity of the left and right ends of the lower side of the lid 3.
 蓋体3の外面においては操作部33が設けられている。操作部33を蓋体3の前側から操作することにより、上側ラッチ部32A、32B、下側ラッチ部(図示せず)を蓋体3の上辺、下辺から突出させることができ、また、上辺、下辺から突出させない状態とすることができる。上側ラッチ部32A、32Bが蓋体3の上辺から上方向D21へ突出して、容器本体2のラッチ係合凹部231A、231Bに係合し、且つ、下側ラッチ部(図示せず)が蓋体3の下辺から下方向D22へ突出して、容器本体2のラッチ係合凹部241A、241Bに係合することにより、蓋体3は、容器本体2の開口周縁部28に固定される。 An operation unit 33 is provided on the outer surface of the lid 3. By operating the operation portion 33 from the front side of the lid body 3, the upper latch portions 32A and 32B and the lower latch portion (not shown) can be protruded from the upper side and the lower side of the lid body 3, It can be set as the state which does not protrude from a lower side. The upper latch portions 32A and 32B protrude from the upper side of the lid body 3 in the upward direction D21, engage with the latch engagement recesses 231A and 231B of the container body 2, and the lower latch portion (not shown) is the lid body. The lid 3 is fixed to the opening peripheral edge portion 28 of the container body 2 by projecting in the downward direction D22 from the lower side of the container 3 and engaging with the latch engagement recesses 241A and 241B of the container body 2.
 蓋体3の内側においては、基板収納空間27の外方へ窪んだ凹部(図示せず)が形成されている。凹部(図示せず)及び凹部の外側の蓋体3の部分には、フロントリテーナ(図示せず)が固定されて設けられている。 A recess (not shown) that is recessed outward from the substrate storage space 27 is formed inside the lid 3. A front retainer (not shown) is fixedly provided on the concave portion (not shown) and the lid 3 outside the concave portion.
 フロントリテーナ(図示せず)は、フロントリテーナ基板受け部(図示せず)を有している。フロントリテーナ基板受け部(図示せず)は、左右方向D3に所定の間隔で離間して対をなすようにして2つずつ配置されている。このように対をなすようにして2つずつ配置されたフロントリテーナ基板受け部は、上下方向D2に25対並列した状態で設けられている。基板収納空間27内に基板Wが収納され、蓋体3が閉じられることにより、フロントリテーナ基板受け部は、基板Wの縁部の端縁を挟持して支持する。 The front retainer (not shown) has a front retainer substrate receiving portion (not shown). Two front retainer substrate receiving portions (not shown) are arranged in pairs so as to form a pair with a predetermined interval in the left-right direction D3. The front retainer substrate receiving portions arranged in pairs so as to form a pair in this way are provided in a state where 25 pairs are juxtaposed in the vertical direction D2. When the substrate W is stored in the substrate storage space 27 and the lid 3 is closed, the front retainer substrate receiving portion sandwiches and supports the edge of the edge of the substrate W.
 上述のような基板収納容器1において、パージガスによるガスパージは以下のとおりに行われる。先ず、図6に示すように、外部空間側開口802(図9参照)へ気体を供給する気体供給装置の給気ノズルNの気体供給口開口部に、ノズル部83(図9参照)の外部突出部832及び縮径環状板部835を当接させる。次に、気体供給装置の給気ノズルNの気体供給口開口部から、外部空間側開口802へパージガスG1を供給する。これによりパージガスG1は、図9に示すように、通気路801に流入し、貫通孔803や基板収納空間側開口804を流れ、開口対向壁部931に衝突する。このとき、連通部流路945において、流出抑制壁部935により、パージガスG1が連通部流路945の外部に漏れ出ることが抑えられ、パージガスG1は、開口対向壁部931の第1傾斜壁9311及び第2傾斜壁9312に沿って開口側部対向部942の方へ流通する。そして、パージガスG1は、気体噴出ノズル部91の内部空間に流入し、貫通孔912から基板収納空間27へ噴出される。 In the substrate storage container 1 as described above, the gas purge with the purge gas is performed as follows. First, as shown in FIG. 6, the nozzle 83 (see FIG. 9) is connected to the gas supply port opening of the supply nozzle N of the gas supply device that supplies gas to the external space side opening 802 (see FIG. 9). The protruding portion 832 and the reduced diameter annular plate portion 835 are brought into contact with each other. Next, the purge gas G1 is supplied to the external space side opening 802 from the gas supply port opening of the supply nozzle N of the gas supply device. Accordingly, as shown in FIG. 9, the purge gas G <b> 1 flows into the ventilation path 801, flows through the through hole 803 and the substrate storage space side opening 804, and collides with the opening facing wall portion 931. At this time, in the communication portion flow path 945, the purge gas G1 is prevented from leaking outside the communication portion flow path 945 by the outflow suppression wall portion 935, and the purge gas G1 is supplied to the first inclined wall 9311 of the opening facing wall portion 931. And it circulates along the 2nd inclined wall 9312 toward the opening side part opposing part 942. The purge gas G <b> 1 flows into the internal space of the gas ejection nozzle portion 91 and is ejected from the through hole 912 to the substrate storage space 27.
 次に、基板収納容器1の洗浄水による洗浄は、以下のとおりに行われる。先ず、基板収納容器1を洗浄機により洗浄水を用いて洗浄する。具体的には、基板収納容器1は、フィルタ部80、連通部93、及び、気体噴出ノズル部91が容器本体2に固定されたままの状態で、基板収納容器1の使用前あるいは使用後に、洗浄機において洗浄水が用いられて洗浄される。このときフィルタ85は疎水性を有しているため、連通部流路945内に洗浄水が残留する。 Next, cleaning of the substrate storage container 1 with cleaning water is performed as follows. First, the substrate storage container 1 is washed with washing water by a washing machine. Specifically, the substrate storage container 1 is in a state where the filter unit 80, the communication unit 93, and the gas ejection nozzle unit 91 are fixed to the container body 2, and before or after using the substrate storage container 1. In the washing machine, washing water is used for washing. At this time, since the filter 85 has hydrophobicity, cleaning water remains in the communication portion flow path 945.
 次に、奥壁22を容器本体開口部21に対して鉛直上側とした位置関係で、基板収納容器1は配置される。すると、隙間806が鉛直下方に開口する位置関係となる。また、3つの水抜き切欠き936のうちの1つの水抜き切欠き936、及び、2つの隙間807のうちの1つの隙間807が鉛直下方に向かって開口する位置関係となる。このため、連通部流路945内に残留していた洗浄水は、隙間806から排出されると共に、水抜き切欠き936、及び、隙間807を通して、図4において、矢印F1、F2に示すように、連通部流路945外に排出される。更に、熱風が容器本体2に吹き付けられる。これにより、洗浄水が乾燥させられる。 Next, the substrate storage container 1 is arranged in a positional relationship in which the back wall 22 is vertically above the container body opening 21. Then, the gap 806 is in a positional relationship that opens vertically downward. Further, one drainage notch 936 out of the three drainage notches 936 and one gap 807 out of the two gaps 807 are in a positional relationship that opens vertically downward. Therefore, the washing water remaining in the communication portion flow path 945 is discharged from the gap 806, and through the water drain notch 936 and the gap 807, as shown by arrows F1 and F2 in FIG. , The fluid is discharged out of the communication channel 945. Further, hot air is blown onto the container body 2. Thereby, the washing water is dried.
 また、洗浄機による基板収納容器1の洗浄後に、奥壁22を容器本体開口部21に対して鉛直上側として配置する代わりに、第1側壁25を第2側壁26に対して鉛直下方に位置させるように、基板収納容器1を配置させる。そして、奥壁22よりも後方に配置された回転軸を中心として基板収納容器1を旋回させる。このとき、隙間806、3つの水抜き切欠き936のうちの1つの水抜き切欠き936、及び、2つの隙間807のうちの1つの隙間807は、回転軸の半径方向外方へ向って開口している。即ち、隙間806、3つの水抜き切欠き936のうちの1つの水抜き切欠き936、及び、2つの隙間807のうちの1つの隙間807は、遠心力の働く方向における下流側に向かって開口する位置関係となる。このため、連通部流路945内に残留していた洗浄水は、隙間806から排出されると共に、水抜き切欠き936、及び、隙間807を通して、図4において、矢印F1、F2に示すように、連通部流路945外に排出される。更に、熱風が容器本体2に吹き付けられる。これにより、洗浄水が乾燥させられる。 In addition, after the substrate storage container 1 is cleaned by the cleaning machine, the first side wall 25 is positioned vertically downward with respect to the second side wall 26 instead of disposing the back wall 22 vertically above the container body opening 21. Thus, the substrate storage container 1 is arranged. Then, the substrate storage container 1 is swiveled around the rotation axis arranged behind the back wall 22. At this time, the gap 806, one drain notch 936 out of the three drain notches 936, and one gap 807 out of the two gaps 807 open toward the radial direction outward of the rotating shaft. is doing. In other words, the gap 806, one drain notch 936 of the three drain notches 936, and one gap 807 of the two gaps 807 open toward the downstream side in the direction in which the centrifugal force acts. The positional relationship is Therefore, the washing water remaining in the communication portion flow path 945 is discharged from the gap 806, and through the water drain notch 936 and the gap 807, as shown by arrows F1 and F2 in FIG. , The fluid is discharged out of the communication channel 945. Further, hot air is blown onto the container body 2. Thereby, the washing water is dried.
 上記構成の本実施形態に係る基板収納容器1によれば、以下のような効果を得ることができる。上述のように、基板収納容器1は一端部に容器本体開口部21が形成され他端部が閉塞された筒状の壁部20を備え、壁部20の内面によって、複数の基板Wを収納可能であり容器本体開口部21に連通する基板収納空間27が形成された容器本体2と、容器本体開口部21に対して着脱可能であり、容器本体開口部21を閉塞可能な蓋体3と、基板収納空間27と容器本体2の外部の空間とを連通可能な通気路801と、通気路801に配置されたフィルタ85と、通気路801を形成するフィルタ部ハウジングと、を有し、壁部20に配置され、フィルタ85を通して容器本体2の外部の空間と基板収納空間27との間で気体としてのパージガスG1が通過可能なフィルタ部80と、フィルタ部80の通気路801に流入した気体を、基板収納空間27に供給する気体噴出ノズル部91と、フィルタ部80から気体噴出ノズル部91へ気体を流通可能に連通する連通部93と、を備える。 According to the substrate storage container 1 according to this embodiment having the above-described configuration, the following effects can be obtained. As described above, the substrate storage container 1 includes the cylindrical wall portion 20 in which the container main body opening 21 is formed at one end and the other end is closed, and a plurality of substrates W are stored by the inner surface of the wall portion 20. A container main body 2 in which a substrate storage space 27 communicating with the container main body opening 21 is formed, and a lid 3 detachable from the container main body opening 21 and capable of closing the container main body opening 21. A ventilation path 801 that allows communication between the substrate storage space 27 and the space outside the container body 2, a filter 85 disposed in the ventilation path 801, and a filter unit housing that forms the ventilation path 801. Gas that has flowed through the filter 85 through which the purge gas G1 as a gas can pass between the space outside the container body 2 and the substrate storage space 27 through the filter 85, and the air passage 801 of the filter unit 80 The base Comprising a gas ejection nozzle portion 91 to be supplied to the accommodating space 27, a communicating portion 93 which communicates to allow flow of gas to the gas ejection nozzle portion 91 from the filter unit 80.
 通気路801は、基板収納空間27に位置する基板収納空間側開口804と、容器本体2の外部の空間に位置する外部空間側開口と、を有する。連通部93は、基板収納空間側開口804に対向して配置される開口対向壁部931と、開口対向壁部931に衝突した、フィルタ部80の通気路801からの気体としてのパージガスG1を、気体噴出ノズル部91へ導く気体導出部941と、開口対向壁部931と気体導出部941とにより形成され、フィルタ部80の通気路801からの気体を気体噴出ノズル部91へ流通させる連通部流路945と、開口対向壁部931からフィルタ部80へ向って延出する流出抑制壁部935であって、開口対向壁部931に衝突した、フィルタ部80の通気路801からの気体としてのパージガスG1が、連通部流路945から漏れ出ることを抑制する流出抑制壁部935と、を有する。流出抑制壁部935の延出端部と、フィルタ部80とは離間した位置関係を有し、流出抑制壁部935の延出端部とフィルタ部80との間には、隙間806が形成されている。 The ventilation path 801 has a substrate storage space side opening 804 located in the substrate storage space 27 and an external space side opening located in a space outside the container body 2. The communicating portion 93 includes an opening facing wall portion 931 disposed to face the substrate storage space side opening 804, and a purge gas G1 as a gas from the air passage 801 of the filter portion 80 that collides with the opening facing wall portion 931. A communication part flow formed by the gas outlet part 941 that leads to the gas ejection nozzle part 91, the opening facing wall part 931 and the gas outlet part 941, and distributes the gas from the ventilation path 801 of the filter part 80 to the gas ejection nozzle part 91. A purge gas as a gas from the ventilation path 801 of the filter unit 80, which is a flow path 945 and an outflow suppression wall unit 935 extending from the opening facing wall unit 931 toward the filter unit 80, and collides with the opening facing wall unit 931. G1 has an outflow suppression wall portion 935 that suppresses leakage from the communication portion flow path 945. The extending end portion of the outflow suppression wall portion 935 and the filter portion 80 are spaced apart from each other, and a gap 806 is formed between the extending end portion of the outflow suppression wall portion 935 and the filter portion 80. ing.
 上記構成により、流出抑制壁部935の延出端部と、フィルタ部80とは離間した位置関係を有し、流出抑制壁部935の延出端部とフィルタ部80との間には、隙間806が形成されているため、基板収納容器1を洗浄水によって洗浄した後に、隙間806を通して洗浄水を連通部流路945から排出させることができる。このため、洗浄水が連通部93に滞留することを抑えることができる。この結果、基板収納容器1の乾燥にかかる時間を短縮することができる。 With the above configuration, the extended end portion of the outflow suppression wall portion 935 and the filter portion 80 have a positional relationship that is separated from each other, and there is a gap between the extended end portion of the outflow suppression wall portion 935 and the filter portion 80. Since 806 is formed, the cleaning water can be discharged from the communication portion channel 945 through the gap 806 after the substrate storage container 1 is cleaned with the cleaning water. For this reason, it is possible to prevent the cleaning water from staying in the communication portion 93. As a result, the time required for drying the substrate storage container 1 can be shortened.
 また、流出抑制壁部935の延出端部は、開口対向壁部931の方向へ窪んだ水抜き切欠き936を有する。この構成により、隙間806を通して洗浄水を連通部流路945から排出させることに加え、水抜き切欠き936を通して、洗浄水を連通部流路945から排出させることができる。このため、より確実に、洗浄水が連通部93や流出抑制壁部935に滞留することを抑えることができる。 Also, the extended end portion of the outflow suppression wall portion 935 has a drain notch 936 that is recessed in the direction of the opening facing wall portion 931. With this configuration, the cleaning water can be discharged from the communication channel 945 through the water drain notch 936 in addition to the cleaning water being discharged from the communication channel 945 through the gap 806. For this reason, it can suppress more reliably that cleaning water retains in the communicating part 93 or the outflow suppression wall part 935.
 また、水抜き切欠き936は、容器本体2の一端部と他端部とを結ぶ方向において、最も容器本体2の一端部寄りの流出抑制壁部935の部分に位置している。この構成により、この位置が流出抑制壁部935において最も下方に配置されるように、基板収納容器1が配置されて、基板収納容器1の乾燥が行われたり、この位置が流出抑制壁部935において最も遠心力が作用する下流側に配置されるように、基板収納容器1が配置されて基板収納容器1が回転させられて、基板収納容器1の乾燥が行われたりすることで、流出抑制壁部935の内側の連通部流路945内の滞留した洗浄水を、容易に連通部流路945外部へ排出することができる。 Further, the drainage notch 936 is located at the portion of the outflow suppression wall 935 closest to one end of the container main body 2 in the direction connecting the one end and the other end of the container main body 2. With this configuration, the substrate storage container 1 is placed and the substrate storage container 1 is dried such that this position is located at the lowest position in the outflow suppression wall 935, or this position is the outflow suppression wall 935. The substrate storage container 1 is disposed and rotated so that the substrate storage container 1 is dried so that the substrate storage container 1 is dried so as to be disposed on the downstream side where the centrifugal force acts most. The washing water staying in the communication channel 945 inside the wall 935 can be easily discharged to the outside of the communication channel 945.
 また、連通部93の気体導出部941は、基板収納空間側開口804を形成するフィルタ部ハウジングの側部に対向する開口側部対向部942を有し、開口側部対向部942とフィルタ部ハウジングの側部とは、離間する位置関係を有し、開口側部対向部942とフィルタ部ハウジングの側部との間には、隙間807が形成されている。 Further, the gas outlet portion 941 of the communication portion 93 includes an opening side portion facing portion 942 that faces the side portion of the filter portion housing that forms the substrate storage space side opening 804, and the opening side portion facing portion 942 and the filter portion housing. The side portion is spaced apart from each other, and a gap 807 is formed between the opening side portion facing portion 942 and the side portion of the filter portion housing.
 上記構成により、隙間806、水抜き切欠き936を通して、連通部流路945の上部に滞留している洗浄水を連通部流路945から排出させることに加え、隙間807から、連通部流路945の下部に滞留している洗浄水を連通部流路945から排出させることができる。このため、洗浄水が連通部93の上部及び下部において、滞留することをより確実に抑えることができる。 With the above configuration, in addition to discharging the cleaning water staying in the upper portion of the communication portion flow path 945 through the gap 806 and the drain notch 936, the communication portion flow path 945 is connected from the gap 807. The washing water staying in the lower part of the water can be discharged from the communication channel 945. For this reason, it can suppress more reliably that cleaning water retains in the upper part and lower part of the communicating part 93. FIG.
 また、開口側部対向部942とフィルタ部ハウジングの側部との間の隙間807は、容器本体2の他端部から一端部へと向う方向に開口している。この構成により、隙間807が、下方に向って開口する位置関係とされるように、基板収納容器1が配置されて、基板収納容器1の乾燥が行われたり、隙間807が、遠心力が作用する下流側に向って開口する位置関係とされるように、基板収納容器1が配置されて基板収納容器1が回転させられて、基板収納容器1の乾燥が行われたりすることで、流出抑制壁部935の内側の連通部流路945内の滞留した洗浄水を、容易に連通部流路945外部へ排出することができる。 Further, a gap 807 between the opening side portion facing portion 942 and the side portion of the filter portion housing opens in a direction from the other end portion of the container body 2 to one end portion. With this configuration, the substrate storage container 1 is placed and the substrate storage container 1 is dried so that the gap 807 opens downward, and the centrifugal force acts on the gap 807. The substrate storage container 1 is placed and rotated so that the substrate storage container 1 is dried and the substrate storage container 1 is dried so that the outflow is suppressed. The washing water staying in the communication channel 945 inside the wall 935 can be easily discharged to the outside of the communication channel 945.
 また、開口対向壁部931は、気体噴出ノズル部91に近づくほど、フィルタ部80から離間するように傾斜している。この構成により、フィルタ部80の通気路801からの気体である不活性ガス(パージガス)が、スムーズに気体噴出ノズル部91へ流通することができるように、パージガスの流れを調整することができる。このため、隙間806、隙間807、水抜き切欠き936からパージガスを漏れにくくすることができる。 Further, the opening facing wall portion 931 is inclined so as to be separated from the filter portion 80 as it approaches the gas ejection nozzle portion 91. With this configuration, the flow of the purge gas can be adjusted so that the inert gas (purge gas), which is the gas from the air passage 801 of the filter unit 80, can smoothly flow to the gas ejection nozzle unit 91. For this reason, it is possible to make the purge gas difficult to leak from the gap 806, the gap 807, and the water drain notch 936.
 本発明は、上述した実施形態に限定されることはなく、特許請求の範囲に記載された技術的範囲において変形が可能である。例えば、容器本体及び蓋体の形状や、容器本体に収納可能な基板の枚数、寸法は、本実施形態における容器本体2及び蓋体3の形状や、容器本体2に収納可能な基板Wの枚数、寸法に限定されない。また、フィルタ部、気体噴出ノズル部、連通部等の構成は、本実施形態におけるフィルタ部80、気体噴出ノズル部91、連通部93等の構成に限定されない。例えは、フィルタ部80は、逆止弁等を有する構成であってもよい。 The present invention is not limited to the embodiment described above, and can be modified within the technical scope described in the claims. For example, the shape of the container main body and the lid, the number of substrates that can be stored in the container main body, and the dimensions thereof are the shape of the container main body 2 and the lid 3 in this embodiment, and the number of substrates W that can be stored in the container main body 2. The dimensions are not limited. The configurations of the filter unit, the gas ejection nozzle unit, the communication unit, and the like are not limited to the configurations of the filter unit 80, the gas ejection nozzle unit 91, the communication unit 93, and the like in the present embodiment. For example, the filter unit 80 may have a configuration including a check valve or the like.
1  基板収納容器
2  容器本体
3  蓋体
20  壁部
21  容器本体開口部
27  基板収納空間
80  フィルタ部
81  内側開口形成部(フィルタ部ハウジング部)
82  第1ハウジング部(フィルタ部ハウジング部)
83  ノズル部(フィルタ部ハウジング部)
85  フィルタ
801  通気路
802  外部空間側開口
804  収容空間側収容室開口
806、807  隙間
935  流出抑制壁部
936  水抜き切欠き
941  気体導出部
942  開口側部対向部
945  連通部流路
W  基板
DESCRIPTION OF SYMBOLS 1 Substrate storage container 2 Container main body 3 Lid 20 Wall part 21 Container main body opening part 27 Substrate storage space 80 Filter part 81 Inner opening formation part (filter part housing part)
82 1st housing part (filter part housing part)
83 Nozzle (filter housing)
85 Filter 801 Ventilation path 802 External space side opening 804 Storage space side storage chamber opening 806, 807 Clearance 935 Outflow suppression wall 936 Drain notch 941 Gas outlet 942 Open side facing part 945 Communication channel W Substrate

Claims (6)

  1.  一端部に容器本体開口部が形成され他端部が閉塞された筒状の壁部を備え、前記壁部の内面によって、複数の基板を収納可能であり前記容器本体開口部に連通する基板収納空間が形成された容器本体と、
     前記容器本体開口部に対して着脱可能であり、前記容器本体開口部を閉塞可能な蓋体と、
     前記基板収納空間と前記容器本体の外部の空間とを連通可能な通気路と、前記通気路に配置されたフィルタと、前記通気路を形成するフィルタ部ハウジングと、を有し、前記壁部に配置され、前記フィルタを通して前記容器本体の外部の空間と前記基板収納空間との間で気体が通過可能なフィルタ部と、
     前記フィルタ部の前記通気路に流入した気体を、前記基板収納空間に供給する気体噴出ノズル部と、
     前記フィルタ部から前記気体噴出ノズル部へ気体を流通可能に連通する連通部と、を備え、
     前記通気路は、前記基板収納空間に位置する基板収納空間側開口と、前記容器本体の外部の空間に位置する外部空間側開口と、を有し、
     前記連通部は、前記基板収納空間側開口に対向して配置される開口対向壁部と、前記開口対向壁部に衝突した、前記フィルタ部の前記通気路からの気体を、前記気体噴出ノズル部へ導く気体導出部と、前記開口対向壁部と前記気体導出部とにより形成され、前記フィルタ部の前記通気路からの気体を前記気体噴出ノズル部へ流通させる連通部流路と、前記開口対向壁部から前記フィルタ部へ向って延出する流出抑制壁部であって、前記開口対向壁部に衝突した、前記フィルタ部の前記通気路からの気体が、前記連通部流路から漏れ出ることを抑制する流出抑制壁部と、を有し、
     前記流出抑制壁部の延出端部と、前記フィルタ部とは離間した位置関係を有し、前記流出抑制壁部の延出端部と前記フィルタ部との間には、隙間が形成されている基板収納容器。
    A substrate housing that includes a cylindrical wall portion that is formed with a container body opening at one end and is closed at the other end, and can accommodate a plurality of substrates by the inner surface of the wall and communicate with the container body opening. A container body in which a space is formed;
    A lid that can be attached to and detached from the container body opening, and can close the container body opening;
    An air passage that allows communication between the substrate storage space and the space outside the container body, a filter disposed in the air passage, and a filter portion housing that forms the air passage, and the wall portion. A filter unit that is disposed and allows gas to pass between the space outside the container body and the substrate storage space through the filter;
    A gas ejection nozzle part for supplying the gas flowing into the ventilation path of the filter part to the substrate housing space;
    A communication part that allows gas to flow from the filter part to the gas ejection nozzle part, and
    The air passage has a substrate storage space side opening located in the substrate storage space, and an external space side opening located in a space outside the container body,
    The communication portion includes an opening facing wall portion arranged to face the substrate storage space side opening, and gas from the ventilation passage of the filter portion that collides with the opening facing wall portion, and the gas ejection nozzle portion. Formed by a gas lead-out portion that leads to the opening, the opening facing wall portion and the gas lead-out portion, and a communication portion flow path for flowing gas from the ventilation passage of the filter portion to the gas ejection nozzle portion; An outflow suppression wall portion extending from the wall portion toward the filter portion, and gas from the ventilation passage of the filter portion that collides with the opening facing wall portion leaks from the communication portion flow path. An outflow suppression wall portion for suppressing
    The extended end portion of the outflow suppression wall portion and the filter portion are spaced apart from each other, and a gap is formed between the extended end portion of the outflow suppression wall portion and the filter portion. Substrate storage container.
  2.  前記流出抑制壁部の延出端部は、前記開口対向壁部の方向へ窪んだ水抜き切欠きを有する請求項1に記載の基板収納容器。 The substrate storage container according to claim 1, wherein the extended end portion of the outflow suppression wall portion has a drain notch that is recessed toward the opening-facing wall portion.
  3.  前記水抜き切欠きは、前記容器本体の一端部と他端部とを結ぶ方向において、最も前記容器本体の一端部寄りの前記流出抑制壁部の部分に位置している請求項2に記載の基板収納容器。 The said drain notch is located in the part of the said outflow suppression wall part near the one end part of the said container main body in the direction which connects the one end part and other end part of the said container main body. Substrate storage container.
  4.  前記連通部の前記気体導出部は、前記基板収納空間側開口を形成する前記フィルタ部ハウジングの側部に対向する開口側部対向部を有し、
     前記開口側部対向部と前記フィルタ部ハウジングの側部とは、離間する位置関係を有し、前記開口側部対向部と前記フィルタ部ハウジングの側部との間には、隙間が形成されている請求項1~請求項3のいずれかに記載の基板収納容器。
    The gas outlet part of the communication part has an opening side part facing part facing the side part of the filter part housing that forms the substrate housing space side opening,
    The opening side portion facing portion and the side portion of the filter portion housing have a spaced apart positional relationship, and a gap is formed between the opening side portion facing portion and the side portion of the filter portion housing. The substrate storage container according to any one of claims 1 to 3.
  5.  前記開口側部対向部と前記フィルタ部ハウジングの側部との間の隙間は、前記容器本体の他端部から一端部へと向う方向に開口している請求項4に記載の基板収納容器。 5. The substrate storage container according to claim 4, wherein a gap between the opening side facing part and the side part of the filter part housing opens in a direction from the other end of the container main body to one end.
  6.  前記開口対向壁部は、前記気体噴出ノズル部に近づくほど、前記フィルタ部から離間するように傾斜している請求項1~請求項5のいずれかに記載の基板収納容器。 The substrate storage container according to any one of claims 1 to 5, wherein the opening facing wall portion is inclined so as to be separated from the filter portion as it approaches the gas ejection nozzle portion.
PCT/JP2015/082380 2014-12-18 2015-11-18 Substrate housing container WO2016098516A1 (en)

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TWI720881B (en) * 2018-01-11 2021-03-01 家登精密工業股份有限公司 Quick release purge valve and substrate container using same
JP7032521B2 (en) * 2018-04-25 2022-03-08 ミライアル株式会社 Board storage container

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JP2008282982A (en) * 2007-05-10 2008-11-20 Shin Etsu Polymer Co Ltd Waterproofing plug for substrate storing container, cleaning method for substrate storing container
JP2009105205A (en) * 2007-10-23 2009-05-14 Shin Etsu Polymer Co Ltd Substrate storing container
JP2012195496A (en) * 2011-03-17 2012-10-11 Shin Etsu Polymer Co Ltd Substrate housing container and gas replacing method using the same
JP2013513951A (en) * 2009-12-10 2013-04-22 インテグリス・インコーポレーテッド Porous barrier to obtain purified gas evenly distributed in the microenvironment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008282982A (en) * 2007-05-10 2008-11-20 Shin Etsu Polymer Co Ltd Waterproofing plug for substrate storing container, cleaning method for substrate storing container
JP2009105205A (en) * 2007-10-23 2009-05-14 Shin Etsu Polymer Co Ltd Substrate storing container
JP2013513951A (en) * 2009-12-10 2013-04-22 インテグリス・インコーポレーテッド Porous barrier to obtain purified gas evenly distributed in the microenvironment
JP2012195496A (en) * 2011-03-17 2012-10-11 Shin Etsu Polymer Co Ltd Substrate housing container and gas replacing method using the same

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