WO2016086642A1 - 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 - Google Patents
黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 Download PDFInfo
- Publication number
- WO2016086642A1 WO2016086642A1 PCT/CN2015/081529 CN2015081529W WO2016086642A1 WO 2016086642 A1 WO2016086642 A1 WO 2016086642A1 CN 2015081529 W CN2015081529 W CN 2015081529W WO 2016086642 A1 WO2016086642 A1 WO 2016086642A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- black matrix
- pixel
- light shielding
- sub
- edge
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/04—Function characteristic wavelength independent
Definitions
- the present invention relates to the field of liquid crystal display technology, and in particular, to a black matrix structure and a method for fabricating the same, an array substrate, a color filter substrate, and a display device.
- the pixel is the smallest display unit in the display device, and each pixel includes a plurality of sub-pixels, and color filters of different colors are respectively disposed in the plurality of sub-pixels, so that the plurality of sub-pixels respectively display corresponding colors.
- the pixel can display the corresponding brightness and color.
- the maximum brightness displayed by the sub-pixels is related to the light transmittance of the color filter (determined by factors such as the type and thickness of the color filter) and the area of the open area of the sub-pixel.
- the light transmittance of the color filter in the plurality of sub-pixels and the area of the opening area of the plurality of sub-pixels are the same, so that the maximum brightness displayed by the plurality of sub-pixels in each pixel is the same, thereby avoiding color cast.
- the area of the opening area of each sub-pixel is generally compensated to make the maximum brightness displayed by each sub-pixel the same.
- the sub-pixel G may need to adopt a color filter with a large color saturation (its transmittance) Lower).
- the area of the open area 12 of the sub-pixel R and the sub-pixel B is generally reduced by increasing the line width of the black matrix 15 surrounding the open area 12 in the sub-pixel R and the sub-pixel B, thereby reducing
- the maximum brightness that can be displayed by the sub-pixel R and the sub-pixel B is such that the maximum brightness displayed by each sub-pixel is the same.
- the present invention aims to at least solve one of the technical problems existing in the prior art, and proposes a black matrix structure and a preparation method thereof, an array substrate, a color filter substrate and a display device, wherein the black matrix structure can reduce pixels While the area of the open area is reduced, the probability that the viewer observes the black matrix pattern is reduced, thereby improving the "black line" defect.
- a black matrix structure comprising a first black matrix, and a plurality of predetermined open regions distributed in an array surrounded by lines of the first black matrix, wherein each An opening area is disposed in the predetermined opening area, and at least one of the predetermined opening areas is disposed with a second black matrix, wherein an edge of the light shielding pattern of the second black matrix is adjacent to the opening area; or An edge of the light shielding pattern of the second black matrix is in contact with at least one line edge of the first black matrix, and an edge of the light shielding pattern of the second black matrix is in contact with each line edge of the first black matrix The length is less than the length of the line edge of the first black matrix.
- the second black matrix may include a plurality of light shielding patterns, and the plurality of light shielding patterns may be uniformly disposed within the predetermined opening region.
- the first black matrix and the second black matrix may be formed in one patterning process.
- the predetermined opening area of the sub-pixel having the second black matrix may further include a third black matrix, an edge of the light shielding pattern of the third black matrix and one or more line edges of the first black matrix Contacting, and a length of an edge of the light shielding pattern of the third black matrix contacting at least one line edge of the first black matrix is equal to a length of the at least one line edge of the first black matrix.
- the third black matrix may be formed in the first patterning process with the first black matrix and the second black matrix.
- the light shielding pattern of the second black matrix may be polygonal, circular or elliptical.
- the size of the light shielding pattern of the second black matrix in at least one direction is smaller than the minimum length that can be observed by the human eye.
- the present invention also provides a system for manufacturing the above black matrix structure.
- the method includes the steps of: preparing the first black matrix described above and preparing the second black matrix in at least one predetermined opening region.
- the pattern of the first black matrix and the second black matrix may be formed by one patterning process.
- the preparation method may further include the step of preparing the third black matrix described above in the predetermined opening area in which the second black matrix is prepared.
- the patterns of the first black matrix, the second black matrix, and the third black matrix may be formed by one patterning process.
- the present invention also provides an array substrate comprising the above black matrix structure provided by the present invention.
- the array substrate includes a plurality of pixels, and each of the pixels may include, for example, a red sub-pixel, a green sub-pixel, and a blue sub-pixel, each sub-pixel including a predetermined opening area, and an open area of the green sub-pixel may be equal to In the predetermined opening area, a second black matrix may be disposed in the predetermined opening area of the red sub-pixel and the blue sub-pixel.
- the present invention further provides a color filter substrate comprising the above black matrix structure provided by the present invention.
- the color filter substrate includes a plurality of pixels, and each of the pixels may include, for example, a red sub-pixel, a green sub-pixel, and a blue sub-pixel, each sub-pixel including a predetermined opening area, and an open area of the green sub-pixel may be equal to In the predetermined opening area, a second black matrix may be disposed in the predetermined opening area of the red sub-pixel and the blue sub-pixel.
- the present invention further provides a display device comprising the above array substrate provided by the present invention or the color film substrate provided by the present invention.
- the edges of the light shielding patterns of the second black matrix are adjacent to the opening regions, or the edges of the light shielding patterns of the second black matrix are in contact with at least one line edge of the first black matrix, and
- the length of the edge of the light shielding pattern of the second black matrix contacting each edge of the first black matrix is smaller than the length of the edge of the first black matrix, so that the second black matrix can be avoided from being merged with the first black matrix.
- the black matrix structure prepared by the method for preparing the black matrix structure provided by the present invention can also reduce the probability that the viewer observes the black matrix pattern and the black grain that the viewer sees while reducing the area of the open area of the pixel. "Reducing, so that the "black streak” can be improved.
- the array substrate provided by the present invention adopts the above-mentioned black matrix structure provided by the present invention, and can reduce the probability that the viewer observes the black matrix pattern while reducing the area of the open area of the pixel, and the black that the viewer sees.
- the "print” is reduced, so that the "black streak” can be improved.
- the color film substrate provided by the invention adopts the above-mentioned black matrix structure provided by the invention, and can reduce the probability that the viewer observes the black matrix pattern and the viewer sees the area while reducing the area of the open area of the pixel.
- the black streak is reduced, so that the "black streak" can be improved.
- the display device provided by the invention adopts the above array substrate or color film substrate provided by the invention, and can reduce the probability that the viewer observes the black matrix pattern and the viewer can see while reducing the area of the open area of the pixel.
- the "black streak” is reduced, which can improve the "black streak”.
- FIG. 1 is a schematic view of a conventional black matrix structure
- FIG. 2 is a schematic diagram of a black matrix structure according to an embodiment of the present invention.
- FIG. 3 is a schematic view showing a light shielding pattern of a second black matrix contacting three line edges of a first black matrix
- FIG. 4 is a view showing a light shielding pattern of the second black matrix and a line edge of the first black matrix Schematic diagram of contact;
- FIG. 5 is a schematic view showing that the second black matrix is not in contact with the first black matrix
- FIG. 6 is a schematic view showing a shape of a light shielding pattern of a second black matrix being rectangular or triangular;
- FIG. 7 is a schematic view showing that a shape of a light shielding pattern of a second black matrix is circular
- FIG. 8 is a schematic view showing that a shape of a light shielding pattern of a second black matrix is elliptical
- FIG. 9 is a schematic diagram showing a third black matrix.
- 1 sub-pixel; 10: predetermined open area; 11: first black matrix; 12: open area; 13: second black matrix; 14: third black matrix; 15: black matrix.
- FIG. 2 is a schematic diagram of a black matrix structure according to an embodiment of the present invention.
- the black matrix structure includes a first black matrix 11 and a plurality of predetermined opening regions 10 distributed in an array surrounded by the lines of the first black matrix 11.
- An open area 12 is disposed in each predetermined opening area 10, and a second black matrix 13 is disposed in at least one predetermined opening area 10.
- edges of the light-shielding pattern of the second black matrix 13 are adjacent to the opening region 12, that is, the light-shielding pattern of the second black matrix 13 is not in contact with the first black matrix 11; or the edge of the light-shielding pattern of the second black matrix 13 At least one line edge of a black matrix 11 is in contact, and a length of an edge of the light shielding pattern of the second black matrix 13 contacting at least one line edge of the first black matrix 11 is smaller than a length of the at least one line edge of the first black matrix 11 .
- each pixel includes a plurality of sub-pixels 1, and each predetermined opening area 10 corresponds to one sub-pixel 1.
- each pixel may include a red sub-pixel, a green sub-pixel, and a blue sub-pixel; in the embodiment, the open area of the green sub-pixel may be set equal to its predetermined open area, red sub-pixel and blue, as needed.
- a second black matrix 13 is disposed in a predetermined opening area of the sub-pixel.
- the array substrate includes gate lines, data lines and other signal lines, and pixels. Electrodes and thin film transistors. There is an uncontrolled electric field in the region where the gate lines, data lines, and other signal lines and thin film transistors are located.
- the first black matrix 11 is used to shield the gate lines, the data lines and other signal lines, and the region where the thin film transistors are located, in order to avoid an uncontrolled electric field in the above region from affecting the display effect.
- the "predetermined opening area 10" means an area other than the first black matrix 11 among the respective sub-pixels.
- the second black matrix 13 is disposed in the predetermined opening region 10 of the one or more sub-pixels according to the aperture ratio required for each sub-pixel 1 and the area of the opening region 12, and is determined as needed.
- the sub-pixel G may need to adopt a color filter with a large color saturation (the light transmittance is the lowest), and the transmittance of the sub-pixel R is higher.
- the transmittance of the sub-pixel B is the highest, and the relationship of the area of the opening region to be formed is: the area of the open area of the sub-pixel G > the area of the open area of the sub-pixel R > the area of the open area of the sub-pixel R.
- the area ratio of the specific open area can be calculated and set according to the material type of the black matrix used and the display target.
- the edges of the light shielding patterns of the second black matrix 13 are adjacent to the opening region 12; or the second black matrix 13 is in contact with at least one line edge of the first black matrix 11, and the second black matrix 13
- the length of the edge of the light shielding pattern in contact with each of the line edges of the first black matrix 11 is smaller than the length of the line side of the first black matrix 11. That is, in this embodiment, three cases are specifically included: 1 the second black matrix 13 is in contact with two or more line edges of the first black matrix 11, as shown in FIG. 2 and FIG. 3; At least a part of the light shielding pattern of the matrix 13 is in contact with one line edge of the first black matrix 11, as shown in FIG. 4; 3 the second black matrix 13 is not in contact with any one of the line edges of the first black matrix 11, as shown in FIG. .
- the second black matrix 13 includes a plurality of light shielding patterns, and a plurality of light shielding patterns are spaced apart, and two sides of each light shielding pattern are respectively in contact with two line edges of the first black matrix 11, and each contact The length of the portion is smaller than the length of the line side of the first black matrix 11 to which the contact portion belongs.
- the opening region 12 there is a region between the second black matrix 13 and the first black matrix 11 which is not covered by the light shielding pattern of the black matrix, that is, the opening region 12.
- the first black matrix 11 is in contact with the second black matrix 13, the two are not melted.
- a black matrix having a larger width and area of the light-shielding pattern is formed. Compared with the prior art, this can reduce the probability of the viewer observing the black matrix pattern and reduce the "black streak" seen by the viewer, thereby improving the "black streak” defect.
- the second black matrix 13 includes a light shielding pattern having three branches, and the three branches are respectively in contact with the three line edges of the first black matrix 11, and the length of each contact portion is smaller than the first portion to which the contact portion belongs.
- the second black matrix 13 includes a plurality of light shielding patterns, and a plurality of light shielding patterns are spaced apart, each light shielding pattern is in contact with one line edge of the first black matrix 11, and the length of the contact portion is smaller than that of the contact portion.
- the length of the line side of the first black matrix 11. As can be seen from the figure, the width of the line of the other portions of the first black matrix 11 is not widened except where the first black matrix 11 and the second black matrix 13 are in contact with each other, compared with the prior art.
- the width and area of the blackout pattern of the black matrix formed by the fusion of the first black matrix 11 and the second black matrix 13 are also reduced, which can reduce the "black stripes" seen by the viewer or can reduce the viewer's observation.
- the probability of black matrix graphics can improve the "black grain” bad.
- the second black matrix 13 includes a plurality of light shielding patterns, and a plurality of light shielding patterns are spaced apart, and edges of each of the light shielding patterns are adjacent to the opening region 12, that is, the second black matrix 13 and the first A black matrix 11 is not in contact. It can be determined from this that, as can be seen from FIG. 5, the first black matrix 11 and the second black matrix 13 are not fused together to form a black matrix having a larger width and area of the light-shielding pattern, and thus Compared with the technology, the probability of the viewer observing the black matrix pattern can be reduced, and the "black grain" defect can be improved.
- the edges of the respective light shielding patterns of the second black matrix 13 are disposed adjacent to the opening region 12, or the light shielding pattern of the second black matrix 13 and at least the first black matrix 11 are disposed.
- One line side contacts, and the length of the light shielding pattern of the second black matrix 13 in contact with each line side of the first black matrix 11 is smaller than the length of the line side of the first black matrix 11.
- the second black matrix 13 can be prevented from being fused with the first black matrix 11 to form a black matrix having a larger width and area of the light shielding pattern.
- the width and area of the light-shielding pattern of the black matrix formed by the second black matrix 13 and the first black matrix 11 are reduced. This can reduce the probability of the viewer observing the black matrix pattern and reduce the "black streak" seen by the viewer, thereby improving the "black streak” defect.
- the second black matrix 13 in the predetermined opening region 10 having the second black matrix 13 includes a plurality of light shielding patterns, and the second black matrix 13 includes only one light shielding pattern.
- the width of each of the light shielding patterns of the second black matrix 13 may be made such that the area of the opening region 12 does not change (that is, the area of the light shielding pattern of the second black matrix 13 in the predetermined opening region 10 does not increase). And the area is small, so that the second black matrix 13 is not easily observed by the viewer.
- the plurality of light shielding patterns of the second black matrix 13 are uniformly disposed in the predetermined opening region 10, so that the plurality of light shielding patterns of the second black matrix 13 are prevented from being concentrated in a certain region to cause a viewer. Observed "black lines”.
- the first black matrix 11 and the second black matrix 13 can be formed in one patterning process, so that the process flow for preparing the black matrix structure is not increased, and the production efficiency and the production cost are substantially unchanged.
- the shape of the light shielding pattern of the second black matrix 13 may be a rectangle, as shown in FIG. 2, FIG. 4, and FIG. 5, and may be other polygons such as a triangle, and may also be a circle. , oval and other shapes.
- the shape, the area, and the like of the light shielding pattern of the second black matrix 13 are set according to the distance between the human eye and the display device during use of the display device, so that the human eye does not normally use the distance from the display device.
- the second black matrix 13 is observed.
- the size of the light shielding pattern of the second black matrix 13 in at least one direction is smaller than the minimum length that can be observed by the human eye, so that the viewer does not observe the first range within any distance from the display device.
- the two black matrices 13 completely avoid the occurrence of "black streaks".
- the minimum length that can be observed by the human eye is 0.2 mm.
- the shape of the light-shielding pattern of the second black matrix 13 is a rectangle or a triangle, as shown in FIG. 6, the length of the shortest side of the light-shielding pattern of the second black matrix 13 is smaller than the minimum length that can be observed by the human eye.
- the light shielding pattern of the second black matrix 13 is circular, as shown in FIG. 7, the diameter of the circular light shielding pattern is smaller than the minimum length that can be observed by the human eye; the light shielding pattern of the second black matrix 13 is elliptical.
- the short-axis length of the elliptical shading pattern is smaller than the minimum length that can be observed by the human eye.
- the predetermined open area 10 of the sub-pixel having the second black matrix 13 may further include a third black matrix 14 in the The light shielding pattern of the third black matrix 14 is in contact with one or more line edges of the first black matrix 11, and the length of the light shielding pattern of the third black matrix 14 in contact with at least one line edge of the first black matrix 11 is equal to The length of the at least one line edge of the first black matrix 11 is described.
- the first black matrix 11 and the third black matrix 14 are fused to form a black matrix having a larger width and area of the light-shielding pattern, but a second black matrix 13 is also provided in the predetermined opening region 10.
- the first in the embodiment The width and area of the black matrix of the black matrix formed by merging the black matrix 11 and the third black matrix 14 are smaller than the width and area of the black matrix shading pattern formed in the prior art, so that compared with the prior art, To some extent, the probability of the viewer observing the black matrix pattern is reduced, and the "black streak" observed by the viewer is made small, so that the "black streak” defect can be improved.
- the third black matrix 14 and the first black matrix 11 and the second black matrix 13 are formed in one patterning process, so that the process flow for preparing the black matrix
- the edge of the light shielding pattern of the second black matrix 13 is adjacent to the opening region 12, or the edge of the light shielding pattern of the second black matrix 13 and at least one of the first black matrix 11
- the above arrangement can avoid the second black matrix 13 and the first black matrix 11 being fused to form a black matrix having a larger width and area of the light shielding pattern, or reducing the second black matrix 13 and the first
- the width and area of the black matrix shading pattern formed by the fusion of the black matrix 11 can reduce the probability of the viewer observing the black matrix pattern and the blackness that the viewer sees while reducing the area of the open area 12.
- the "print” is reduced, so that the "black streak" can be improved.
- the present invention also provides an embodiment of a method for preparing a black matrix structure.
- the method for preparing a black matrix structure is used to prepare the black matrix structure provided by the above embodiment of the present invention, which specifically includes preparing a first black matrix. And a step of preparing a second black matrix in at least one predetermined opening area; the prepared first black matrix and second black matrix are as described in the above embodiments of the black matrix structure, and as shown in the corresponding figures.
- the pattern of the first black matrix and the second black matrix is formed by one patterning process, so that the process of preparing the black matrix structure is not increased, and the production efficiency and the production cost are substantially unchanged.
- the method for fabricating the black matrix structure may further include the steps of: preparing a third black matrix in a predetermined opening region of the second black matrix, the third black matrix being prepared as described in the embodiment of the black matrix structure, and As shown in the corresponding figures. Specifically, the patterns of the first black matrix, the second black matrix, and the third black matrix are formed by one patterning process, so that the process flow for preparing the black matrix structure is not increased, and the production efficiency and the production cost are substantially maintained.
- the method for preparing the black matrix structure provides a black matrix structure capable of reducing the area of the open area of the pixel while reducing the probability that the viewer observes the black matrix pattern and the viewer sees The "black streak” is reduced, so that the "black streak” can be improved.
- the present invention further provides an embodiment of an array substrate.
- the array substrate includes the black matrix structure provided by the above embodiment of the present invention.
- the array substrate comprises a plurality of pixels, each pixel comprising a red sub-pixel, a green sub-pixel and a blue sub-pixel, each sub-pixel comprising a predetermined opening area, the open area of the green sub-pixel being equal to the predetermined In the opening area, a second black matrix is disposed in a predetermined opening area of the red sub-pixel and the blue sub-pixel.
- the array substrate provided by the embodiment adopts the black matrix structure provided by the above embodiment of the present invention, and can reduce the probability that the viewer observes the black matrix pattern and the viewer can see while reducing the area of the open area of the pixel.
- the "black streak” is reduced, which can improve the "black streak”.
- the present invention further provides an embodiment of a color filter substrate.
- the color filter substrate includes the black matrix structure provided by the above embodiment of the present invention.
- the color filter substrate comprises a plurality of pixels, each pixel comprising a red sub-pixel, a green sub-pixel and a blue sub-pixel, each sub-pixel comprising a predetermined opening area, the open area of the green sub-pixel being equal to the In the predetermined opening area, a second black matrix is disposed in the predetermined opening area of the red sub-pixel and the blue sub-pixel.
- the color film substrate provided by the embodiment adopts the black matrix structure provided by the above embodiment of the present invention, and can reduce the probability that the viewer observes the black matrix pattern while reducing the area of the open area of the pixel, and enables the viewer to The "black lines” seen are reduced, which can improve the "black lines”.
- the present invention further provides an embodiment of a display device.
- the display device includes the array substrate provided by the above embodiment of the present invention, or includes the foregoing embodiment provided by the present invention.
- Color film substrate is another technical solution.
- the display device provided by the embodiment adopts the array substrate or the color filter substrate provided by the above embodiment of the present invention, and can reduce the probability that the viewer observes the black matrix pattern while reducing the area of the open area of the pixel, and The "black streak” seen by the viewer is reduced, thereby improving the "black streak”.
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (17)
- 一种黑矩阵结构,包括第一黑矩阵、以及由所述第一黑矩阵的线围成的呈阵列分布的多个预定开口区域,其特征在于,每个所述预定开口区域内设置开口区,且至少一个所述预定开口区域内设置有第二黑矩阵,其中,所述第二黑矩阵的遮光图案的边缘各处均与开口区毗邻;或者,所述第二黑矩阵的遮光图案的边缘与所述第一黑矩阵的至少一条线边接触,且所述第二黑矩阵的遮光图案的边缘与所述第一黑矩阵的每条线边接触的长度小于所述第一黑矩阵的该条线边的长度。
- 根据权利要求1所述的黑矩阵结构,其特征在于,所述第二黑矩阵包括多个遮光图案,且所述多个遮光图案在所述预定开口区域内均匀设置。
- 根据权利要求1所述的黑矩阵结构,其特征在于,所述第一黑矩阵和所述第二黑矩阵在一次构图工艺中形成。
- 根据权利要求1所述的黑矩阵结构,其特征在于,具有所述第二黑矩阵的所述预定开口区域内还包括第三黑矩阵,所述第三黑矩阵的遮光图案的边缘与所述第一黑矩阵的一条或多条线边接触,且第三黑矩阵的遮光图案的边缘与所述第一黑矩阵的至少一条线边接触的长度等于所述第一黑矩阵的该至少一条线边的长度。
- 根据权利要求4所述的黑矩阵结构,其特征在于,所述第三黑矩阵与所述第一黑矩阵、所述第二黑矩阵在一次构图工艺中形成。
- 根据权利要求1所述的黑矩阵结构,其特征在于,所述第二黑矩阵的遮光图案为多边形、圆形或椭圆形。
- 根据权利要求1至6中任意一项所述的黑矩阵结构,其特征在于,所述第二黑矩阵的遮光图案在至少一个方向上的尺寸小于人眼所能观察到的最小长度。
- 一种权利要求1所述的黑矩阵结构的制备方法,其特征在于,包括:制备所述第一黑矩阵的步骤和制备所述第二黑矩阵的步骤。
- 根据权利要求8所述的黑矩阵结构的制备方法,其特征在于,所述第二黑矩阵包括多个遮光图案,且所述多个遮光图案在所述预定开口区域内均匀设置。
- 根据权利要求8所述的黑矩阵结构的制备方法,其特征在于,通过一次构图工艺形成所述第一黑矩阵和所述第二黑矩阵的图形。
- 根据权利要求8所述的黑矩阵结构的制备方法,其特征在于,还包括:制备第三黑矩阵的步骤,其中,在具有所述第二黑矩阵的所述预定开口区域内制备第三黑矩阵,所述第三黑矩阵的遮光图案的边缘与所述第一黑矩阵的一条或多条线边接触,且第三黑矩阵的遮光图案的边缘与所述第一黑矩阵的至少一条线边接触的长度等于所述第一黑矩阵的该至少一条线边的长度。
- 根据权利要求11所述的黑矩阵结构的制备方法,其特征在于,通过一次构图工艺形成所述第一黑矩阵、所述第二黑矩阵和所述第三黑矩阵的图形。
- 一种阵列基板,其特征在于,所述阵列基板包括权利要求1至7中任意一项所述的黑矩阵结构。
- 根据权利要求13所述的阵列基板,其特征在于,所述阵列基板包括多个像素,每个所述像素包括红色子像素、绿色子像素和蓝色子像素,每个子像素包括一个预定开口区域,其中,所述绿色子像素的开口区等于所述预定开口区域,所述红色子像素和所述蓝色子像素的所述预定开口区域内设置有第二黑矩阵。
- 一种彩膜基板,其特征在于,所述彩膜基板包括权利要求1至7中任意一项所述的黑矩阵结构。
- 根据权利要求15所述的彩膜基板,其特征在于,所述彩膜基板包括多个像素,每个像素包括红色子像素、绿色子像素和蓝色子像素,每个子像素包括一个预定开口区域,其中,所述绿色子像素的开口区等于所述预定开口区域,所述红色子像素和所述蓝色子像素的预定开口区域内设置有第二黑矩阵。
- 一种显示装置,其特征在于,包括权利要求13或14所述的阵列基板,或者包括权利要求15或16所述的彩膜基板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/891,979 US10274798B2 (en) | 2014-12-01 | 2015-06-16 | Black matrix structure and manufacturing method thereof, array substrate, color filter substrate and display apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410720401.4A CN104375319B (zh) | 2014-12-01 | 2014-12-01 | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 |
CN201410720401.4 | 2014-12-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016086642A1 true WO2016086642A1 (zh) | 2016-06-09 |
Family
ID=52554339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2015/081529 WO2016086642A1 (zh) | 2014-12-01 | 2015-06-16 | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10274798B2 (zh) |
CN (1) | CN104375319B (zh) |
WO (1) | WO2016086642A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104375319B (zh) | 2014-12-01 | 2017-07-25 | 京东方科技集团股份有限公司 | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 |
CN105093818B (zh) * | 2015-08-20 | 2019-07-09 | 京东方科技集团股份有限公司 | 掩模图形的制造方法和掩模图形 |
CN105093669B (zh) * | 2015-10-09 | 2018-09-25 | 京东方科技集团股份有限公司 | 一种彩膜基板及其制作方法、显示面板、显示装置 |
KR102400506B1 (ko) * | 2015-10-30 | 2022-05-23 | 엘지디스플레이 주식회사 | 이형 표시장치 |
CN105527746B (zh) * | 2016-02-15 | 2018-09-04 | 京东方科技集团股份有限公司 | 显示母板及其制作方法、显示装置 |
CN105676519B (zh) * | 2016-04-05 | 2019-05-03 | 京东方科技集团股份有限公司 | 一种黑矩阵、彩膜基板和显示装置 |
US10921634B2 (en) * | 2016-09-21 | 2021-02-16 | Hefei Boe Optoelectronics Technology Co., Ltd. | Display panel and display device |
CN109767736B (zh) * | 2019-03-05 | 2020-12-01 | 重庆京东方光电科技有限公司 | 一种显示面板、显示装置 |
CN109976028B (zh) * | 2019-05-13 | 2022-02-22 | 京东方科技集团股份有限公司 | 黑矩阵、阵列基板、显示装置及显示方法 |
WO2024105838A1 (ja) * | 2022-11-17 | 2024-05-23 | シャープディスプレイテクノロジー株式会社 | 自発光表示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1834753A (zh) * | 2005-03-16 | 2006-09-20 | 大日本印刷株式会社 | 滤色器基板和液晶显示面板 |
CN1892369A (zh) * | 2005-07-06 | 2007-01-10 | 株式会社日立显示器 | 显示装置 |
US20120008073A1 (en) * | 2009-03-19 | 2012-01-12 | Sony Corporation | Liquid crystal display panel |
CN104375319A (zh) * | 2014-12-01 | 2015-02-25 | 京东方科技集团股份有限公司 | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 |
CN204203586U (zh) * | 2014-12-01 | 2015-03-11 | 京东方科技集团股份有限公司 | 黑矩阵结构、阵列基板、彩膜基板及显示装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100357948B1 (ko) * | 1999-11-10 | 2002-10-25 | 삼성에스디아이 주식회사 | 평면형 칼러 음극선관 |
KR100482468B1 (ko) * | 2000-10-10 | 2005-04-14 | 비오이 하이디스 테크놀로지 주식회사 | 프린지 필드 구동 액정 표시 장치 |
JP4398602B2 (ja) * | 2001-05-18 | 2010-01-13 | 株式会社日立製作所 | 液晶表示装置 |
TWI288846B (en) * | 2006-06-16 | 2007-10-21 | Innolux Display Corp | Liquid crystal display |
CN102681247B (zh) * | 2012-04-27 | 2015-04-01 | 京东方科技集团股份有限公司 | 半透半反彩色像素结构、彩膜基板、液晶面板及显示装置 |
KR102290753B1 (ko) * | 2014-09-19 | 2021-08-19 | 삼성디스플레이 주식회사 | 패턴 형성 방법 및 이를 이용한 표시 패널의 제조 방법 |
-
2014
- 2014-12-01 CN CN201410720401.4A patent/CN104375319B/zh active Active
-
2015
- 2015-06-16 US US14/891,979 patent/US10274798B2/en active Active
- 2015-06-16 WO PCT/CN2015/081529 patent/WO2016086642A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1834753A (zh) * | 2005-03-16 | 2006-09-20 | 大日本印刷株式会社 | 滤色器基板和液晶显示面板 |
CN1892369A (zh) * | 2005-07-06 | 2007-01-10 | 株式会社日立显示器 | 显示装置 |
US20120008073A1 (en) * | 2009-03-19 | 2012-01-12 | Sony Corporation | Liquid crystal display panel |
CN104375319A (zh) * | 2014-12-01 | 2015-02-25 | 京东方科技集团股份有限公司 | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 |
CN204203586U (zh) * | 2014-12-01 | 2015-03-11 | 京东方科技集团股份有限公司 | 黑矩阵结构、阵列基板、彩膜基板及显示装置 |
Also Published As
Publication number | Publication date |
---|---|
US10274798B2 (en) | 2019-04-30 |
CN104375319B (zh) | 2017-07-25 |
CN104375319A (zh) | 2015-02-25 |
US20160342049A1 (en) | 2016-11-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2016086642A1 (zh) | 黑矩阵结构及制备方法、阵列基板、彩膜基板及显示装置 | |
US10281760B2 (en) | Color filter substrate and display device | |
US10108042B2 (en) | Display substrate and display apparatus | |
US10514568B2 (en) | Color filter substrate and curved surface display device | |
CN103985738B (zh) | 像素结构和显示装置 | |
US20190011786A1 (en) | Special-shaped display panel and display device | |
US10209413B2 (en) | Color filter substrate, display panel and display device | |
WO2016058326A1 (zh) | 像素结构、显示基板和显示装置 | |
US9870741B2 (en) | Display substrate and display device | |
TWI499851B (zh) | 畫素結構及具有此畫素結構之液晶顯示面板 | |
CN105788470A (zh) | 一种圆形显示屏和圆形显示屏制造方法 | |
CN104375313A (zh) | 液晶显示面板及液晶显示面板的制造方法 | |
TW201835658A (zh) | 顯示面板 | |
US20230258988A1 (en) | Display panel | |
WO2015096439A1 (zh) | 像素单元、显示装置及其驱动方法 | |
WO2018205647A1 (zh) | 阵列基板、显示面板和显示装置 | |
WO2017186095A1 (zh) | 显示面板及其制备方法、显示装置 | |
WO2020238323A1 (zh) | 显示面板及其制作方法、显示装置 | |
US10078241B2 (en) | Liquid crystal display apparatus and color filter thereof | |
US20160161649A1 (en) | Display substrate and manufacturing method thereof, and display device | |
US20160109751A1 (en) | Color Filter, Liquid Crystal Display Apparatus, and Method of Manufacturing Color Filter | |
WO2017161894A1 (en) | Display substrate, manufacturing method thereof, and display apparatus | |
WO2013010457A1 (zh) | 彩色滤光片基板、液晶面板及液晶显示器 | |
CN204203586U (zh) | 黑矩阵结构、阵列基板、彩膜基板及显示装置 | |
CN106324888A (zh) | 掩模板、滤光片的制作方法以及液晶显示面板 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 14891979 Country of ref document: US |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15864672 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
32PN | Ep: public notification in the ep bulletin as address of the adressee cannot be established |
Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 30.10.2017) |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 15864672 Country of ref document: EP Kind code of ref document: A1 |