WO2016082236A1 - 薄膜晶体管阵列基板及液晶显示装置 - Google Patents

薄膜晶体管阵列基板及液晶显示装置 Download PDF

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Publication number
WO2016082236A1
WO2016082236A1 PCT/CN2014/092913 CN2014092913W WO2016082236A1 WO 2016082236 A1 WO2016082236 A1 WO 2016082236A1 CN 2014092913 W CN2014092913 W CN 2014092913W WO 2016082236 A1 WO2016082236 A1 WO 2016082236A1
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Prior art keywords
measurement line
photoresist
width
line
display area
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English (en)
French (fr)
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马佳星
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors

Definitions

  • the present invention claims the priority of the prior application entitled “Thin-film Transistor Array Substrate and Liquid Crystal Display Device”, filed on Nov. 24, 2014, which is incorporated herein by reference. .
  • the present invention relates to the field of display, and in particular to a thin film transistor array substrate and a liquid crystal display device.
  • the COA (Color on Array) technology is a technique for preparing a color photoresist on a thin film transistor (TFT) Array. It has the advantage of improving the pixel aperture ratio and the quality of a liquid crystal display (LCD). Secondly, the liquid crystal display device prepared by the COA technology has a problem that the color filter (CF) substrate and the TFT substrate are aligned, thereby reducing the difficulty of the cell stage of the liquid crystal display device. However, in the COA technology, there is an overlapping area between two adjacent photoresists in the thin film transistor array substrate, and the size of the overlapping area affects the display effect of the liquid crystal display device.
  • the overlapping area between the adjacent two kinds of photoresists is not easily measured, that is, in the prior art, the thin film transistor array substrate cannot measure the adjacent light in the COA technology.
  • the size of the overlapping area between the resistors, and thus the size of the overlapping area between adjacent photoresists, cannot be improved to improve the display effect of the liquid crystal display device.
  • the present invention provides a thin film transistor array substrate capable of measuring the size of an overlapping region of adjacent photoresists well.
  • a thin film transistor array substrate includes a display area and a frame area disposed around the display area, wherein the display area is provided with a plurality of thin film transistors and a plurality of data lines distributed in an array.
  • the frame area forms a first test pattern, a second test pattern, and a a three test pattern, a distance between the first test pattern and the second test pattern, and a distance between the second test pattern and the third test pattern are greater than two adjacent ones in the display area a distance between the data lines
  • the first test pattern includes a first measurement line, a second measurement line, and a first photoresist, and the first measurement line and the second measurement line are respectively in the display area
  • the first photoresist covers the first measurement line and the second measurement line, and the size of the first photoresist and the first color photoresist in the display area Corresponding to the size;
  • the second test pattern includes a third measurement line, a fourth measurement line, and a second photoresist, the third measurement line is disposed adjacent
  • the width of the overlapping area between the second color photoresist and the third color photoresist in the display area is the sum of the third width and the fourth width.
  • the widths of the first measurement line, the second measurement line, the third measurement line, the fourth measurement line, the fifth measurement line, and the sixth measurement line are the display area One-half the width of the inner data line.
  • the width of the first photoresist exceeding the second measurement line is a width of the first photoresist exceeding a center line of the second measurement line; and the second photoresist is beyond the third measurement line a width of the second photoresist exceeding a width of a center line of the third measurement line; a width of the second photoresist exceeding the fourth measurement line being a second photoresist exceeding the fourth measurement line a width of the center line; a width of the third photoresist exceeding the fifth measurement line is a width of the third line exceeding a center line of the fifth measurement line.
  • the first measurement line, the second measurement line, the third measurement line, and the fourth measurement are formed when a source and a drain of the thin film transistor are formed.
  • the present invention also provides a liquid crystal display device capable of measuring the size of an overlapping region between adjacent photoresists well.
  • a liquid crystal display device comprising a thin film transistor array substrate, the thin film transistor array substrate comprising a display area and a frame area disposed around the display area, wherein the display area is arranged in a plurality of arrays a thin film transistor and a plurality of data lines, forming a first test pattern, a second test pattern, and a third test pattern in the frame region, a distance between the first test pattern and the second test pattern, and the first a distance between the second test pattern and the third test pattern is greater than a distance between two adjacent data lines in the display area, the first test pattern including a first measurement line, a second measurement line, and a a first resistance line, the first measurement line and the second measurement line respectively corresponding to two adjacent data lines in the display area, the first photoresist covering the first measurement line and the a second measurement line, wherein the size of the first photoresist corresponds to a size of the first color photoresist in the display area; the second test pattern includes a third measurement line, a fourth measurement line,
  • the width of the overlapping area between the second color photoresist and the third color photoresist in the display area is the sum of the third width and the fourth width.
  • the first measurement line, the second measurement line, the third measurement line, and the fourth measurement The width of the quantity line, the fifth measurement line, and the sixth measurement line is one-half the width of the data line in the display area.
  • the width of the first photoresist exceeding the second measurement line is a width of the first photoresist exceeding a center line of the second measurement line; and the second photoresist is beyond the third measurement line a width of the second photoresist exceeding a width of a center line of the third measurement line; a width of the second photoresist exceeding the fourth measurement line being a second photoresist exceeding the fourth measurement line a width of the center line; a width of the third photoresist exceeding the fifth measurement line is a width of the third line exceeding a center line of the fifth measurement line.
  • the first measurement line, the second measurement line, the third measurement line, the fourth measurement line, the fifth measurement line, and the sixth measurement line are formed in the thin film transistor. Formed at the source and drain.
  • a first test pattern, a second test pattern, and a third test pattern are disposed in a frame region of the thin film transistor array substrate.
  • the first test pattern, the second test pattern, and the third test pattern respectively include two measurement lines and photoresists, and two measurement lines in each test pattern are respectively adjacent to the display area
  • the photoresist of each test pattern corresponds to the first color photoresist, the second color photoresist and the third color photoresist in the display area a, respectively.
  • the relationship between the first photoresist and the first measurement line and the second measurement line is opposite to the first color photoresist in the display area and the two data lines covered by the first color photoresist Corresponding relationship; the relationship between the second photoresist and the third measurement line and the fourth measurement line and the second color photoresist and the second color photoresist cover in the display area Corresponding to the relationship between the two data lines; the relationship between the third photoresist and the fifth measurement line and the sixth measurement line; and the third color photoresist in the display area and the The relationship between the two data lines covered by the second color photoresist corresponds.
  • the sum of the first width and the second width is obtained by measuring the first width, the second width, the third width, and the fourth width.
  • measuring the width of the overlapping area between the first color photoresist and the second color photoresist in the display area that is not easily measured, and the second color photoresist and the third color light The width of the overlap region between the resistors that is not easily measured is measured so as to subsequently overlap the overlapping region between the adjacent first color photoresist and the second color photoresist and the second color photoresist and the third color light
  • the area of overlap between the resistances is improved.
  • FIG. 1 is a schematic structural view of a thin film transistor array substrate according to a preferred embodiment of the present invention.
  • FIG. 2 is an enlarged schematic view showing a first test pattern, a second test pattern, and a third test pattern in the thin film transistor array substrate of FIG. 1.
  • FIG. 3 is a schematic structural view of a liquid crystal display device according to a preferred embodiment of the present invention.
  • FIG. 1 is a schematic structural diagram of a thin film transistor array substrate according to a preferred embodiment of the present invention
  • FIG. 2 is a first test pattern and a second test pattern in the thin film transistor array substrate of FIG.
  • the thin film transistor array substrate 100 is a thin film transistor array substrate using a COA technology, and in the embodiment, the thin film transistor array substrate 100 includes a thin film transistor array composed of a plurality of thin film transistors 120 and is disposed on the thin film transistor array substrate 100. a color film on the transistor array.
  • the color film comprises a plurality of color film units, each color film unit comprising a first color photoresist (not shown), a second color photoresist (not shown), and a third color photoresist (not shown).
  • the thin film transistor array substrate 100 includes a display area a and a bezel area b disposed around the display area a.
  • a plurality of thin film transistors 120 and a plurality of data lines 130 distributed in an array are disposed in the display area a.
  • the frame area b is a non-display area of the thin film transistor array substrate 100, and the frame area b forms a first test pattern 150, a second test pattern 160, and a third test pattern 170.
  • a distance between the first test pattern 150 and the second test pattern 160, and a distance between the second test pattern 160 and the third test pattern 170 are at least connected in the display area a
  • the distance between the two data lines 130 is greater than the two adjacent data lines 130 in the display area a. The distance between them.
  • the first test pattern 150 includes a first measurement line 151, a second measurement line 152, and a first photoresist 153.
  • the first measurement line 151 and the second measurement line 152 respectively correspond to two adjacent data lines 130 in the display area a
  • the first photoresist 153 covers the first measurement line 151 and The second measurement line 152
  • the size of the first photoresist 153 corresponds to the size of the first color photoresist in the display area a.
  • the relative positional relationship between the first photoresist 153 and the first measurement line 151 and the second measurement line 152 is different from the first color photoresist and the first color photoresist.
  • the relative positional relationship of the two adjacent data lines 130 covered corresponds to each other.
  • the first photoresist 153 is wider than the width of the first measurement line 151 and the first color photoresist is equal to the width of the data line 130 corresponding to the first measurement line 151.
  • a photoresist 153 is beyond the width of the second measurement line 152 and the first color photoresist is equal to a width of the data line 130 corresponding to the second measurement line 152.
  • the second test pattern 160 includes a third measurement line 161, a fourth measurement line 162, and a second photoresist 163.
  • the third measurement line 161 is disposed adjacent to the second measurement line 152, and the third measurement line 161 and the fourth measurement line 162 respectively correspond to two adjacent data lines 130 in the display area a.
  • the second photoresist 163 covers the third measurement line 161 and the fourth measurement line 162, and the size of the second photoresist 163 is different from the size of the second color photoresist in the display area a. correspond.
  • the relative positional relationship between the second photoresist 163 and the third measurement line 161 and the fourth measurement line 162 is different from the second color photoresist and the second color photoresist.
  • the relative positional relationship of the two adjacent data lines 130 covered corresponds to each other.
  • the width of the second photoresist 163 beyond the third measurement line 161 is equal to the width of the data line 130 corresponding to the second color photoresist exceeding the third measurement line 161
  • the second The width of the photoresist 163 beyond the fourth measurement line 162 is equal to the width of the second color photoresist exceeding the data line 130 corresponding to the fourth measurement line 162.
  • the third test pattern 170 includes a fifth measurement line 171, a sixth measurement line 172, and a third photoresist 173.
  • the fifth measurement line 171 is disposed adjacent to the fourth measurement line 162, and the fifth measurement line 171 and the sixth measurement line 172 are respectively associated with two adjacent data lines 130 in the display area a.
  • the third photoresist 173 covers the fifth measurement line 171 and the sixth measurement line, and the size of the third photoresist 173 is different from the size of the third color photoresist in the display area a. correspond.
  • the third photoresist 173 and the fifth measurement line 171 and the sixth measurement line 172 The relative positional relationship corresponds to the relative positional relationship between the third color photoresist and the two adjacent data lines 130 covered by the third color photoresist.
  • the width of the third photoresist 173 beyond the fifth measurement line 171 is equal to the width of the data line 130 corresponding to the third color photoresist exceeding the fifth measurement line 171
  • the third The photoresist 173 exceeds the width of the sixth measurement line 172
  • the third color photoresist exceeds the width of the data line 130 corresponding to the sixth measurement line 172.
  • the width of the first photoresist 153 beyond the second measurement line 152 is a first width W1
  • the width of the second photoresist 163 beyond the third measurement line 161 and the fourth measurement line 162 are respectively
  • the third photoresist 173 exceeding the width of the fifth measurement line 171 is the fourth width W4.
  • the width of the overlapping area between the first color photoresist and the second color photoresist in the display area a is the sum of the first width W1 and the second width W2.
  • the first measurement line 151 and the second measurement line 152 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the first measurement line 151 and the The second measurement lines 152 are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the third measurement line 161 and the fourth measurement line 162 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the third measurement line 161 and the fourth measurement line 162. They are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the fifth measurement line 171 and the sixth measurement line 172 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the fifth measurement line 171 and the sixth measurement line 172. They are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the width of the overlapping area between the second color photoresist and the third color photoresist in the display area a is the sum of the third width W3 and the fourth width W4.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 The width is one-half the width of the data line 130 within the display area a.
  • the width of the first photoresist 153 beyond the second measurement line 152 is specifically the width of the first photoresist 153 beyond the center line of the second measurement line 152.
  • the width of the second photoresist 163 beyond the third measurement line 161 is the width of the second photoresist 163 beyond the center line of the third measurement line 161, and the second photoresist 163 is beyond the fourth
  • the width of the measurement line 162 is the width of the second photoresist 163 beyond the center line of the fourth measurement line 162.
  • the third photoresist 173 extends beyond the width of the fifth measurement line 171 to the third photoresist 173 is beyond the width of the center line of the fifth measurement line 171.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 All are metal wires.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 Both are formed at the source and drain of the thin film transistor 120 to simplify the manufacturing process of the thin film transistor array substrate 100.
  • the first color photoresist, the second color photoresist, and the third color photoresist are any combination of three color photoresists of a red photoresist, a blue photoresist, and a green photoresist.
  • the colors of the first photoresist 151, the second photoresist 163, and the third photoresist 173 are respectively different from the first color photoresist, the second color photoresist, and the The color of the third color photoresist is the same.
  • the first photoresist 151, the second photoresist 163, and the third photoresist 173 may also be combined with the first color photoresist and the second color light.
  • the color of the third color resist is not the same, and may be set to other colors.
  • the present invention provides a first test pattern 150, a second test pattern 160, and a third test pattern 170 in the frame region b of the thin film transistor array substrate 100.
  • the first test pattern 150, the second test pattern 160, and the third test pattern 170 respectively include two measurement lines and photoresists, and two measurement lines in each test pattern respectively correspond to the display area a
  • the adjacent two adjacent data lines 130 correspond to each other, and the photoresist of each test pattern corresponds to the first color photoresist, the second color photoresist, and the third color photoresist in the display area a, respectively.
  • the relationship between the first photoresist 153 and the first measurement line 151 and the second measurement line 152 and the first color photoresist in the display area a and the first color photoresist cover Corresponding to the relationship between the strips of data lines 130; the relationship between the second photoresist 163 and the third measuring line 161 and the fourth measuring line 162 and the second color photoresist in the display area a Corresponding to the relationship between the two data lines 130 covered by the second color photoresist; the relationship between the third photoresist 173 and the fifth measurement line 171 and the sixth measurement line 172
  • the third color photoresist in the display area a corresponds to the relationship between the two data lines 130 covered by the second color photoresist.
  • the sum of the first width and the second width is obtained by measuring the first width, the second width, the third width, and the fourth width.
  • the overlap area between the two color photoresists and the overlap area between the second color photoresist and the third color photoresist are improved.
  • FIG. 3 is a schematic structural diagram of a liquid crystal display device according to a preferred embodiment of the present invention.
  • the liquid crystal display device 10 includes a thin film transistor array substrate 100, a liquid crystal layer 200, and a filter substrate 300.
  • the thin film transistor array substrate 100 is disposed opposite to the filter substrate 300, and the liquid crystal layer 200 is disposed between the thin film transistor array substrate 100 and the filter substrate 300.
  • the thin film transistor array substrate 100 is a thin film transistor array substrate using a COA technology, and in the embodiment, the thin film transistor array substrate 100 includes a thin film transistor array composed of a plurality of thin film transistors 120 and is disposed on the thin film transistor array substrate 100. a color film on the transistor array.
  • the color film includes a plurality of color film units, and each color film unit includes a first color photoresist, a second color photoresist, and a third color photoresist.
  • the thin film transistor array substrate 100 includes a display area a and a bezel area b disposed around the display area a.
  • a plurality of thin film transistors 120 and a plurality of data lines 130 distributed in an array are disposed in the display area a.
  • the frame area b is a non-display area of the thin film transistor array substrate 100, and the frame area b forms a first test pattern 150, a second test pattern 160, and a third test pattern 170. a distance between the first test pattern 150 and the second test pattern 160, and a distance between the second test pattern 160 and the third test pattern 170 are at least connected in the display area a
  • the distance between the two data lines 130 is greater than the distance between the two adjacent data lines 130 in the display area a.
  • the first test pattern 150 includes a first measurement line 151, a second measurement line 152, and a first photoresist 153.
  • the first measurement line 151 and the second measurement line 152 respectively correspond to two adjacent data lines 130 in the display area a
  • the first photoresist 153 covers the first measurement line 151 and The second measurement line 152
  • the size of the first photoresist 153 corresponds to the size of the first color photoresist in the display area a.
  • the relative positional relationship between the first photoresist 153 and the first measurement line 151 and the second measurement line 152 is different from the first color photoresist and the first color photoresist.
  • the relative positional relationship of the two adjacent data lines 130 covered corresponds to each other.
  • the first photoresist 153 exceeds the width of the first measurement line 151 and the first color photoresist exceeds
  • the widths of the data lines 130 corresponding to the first measurement lines 151 are equal, and the width of the first photoresist 153 beyond the second measurement line 152 and the first color photoresist exceed the second measurement line 152.
  • the data lines 130 have the same width.
  • the second test pattern 160 includes a third measurement line 161, a fourth measurement line 162, and a second photoresist 163.
  • the third measurement line 161 is disposed adjacent to the second measurement line 152, and the third measurement line 161 and the fourth measurement line 162 respectively correspond to two adjacent data lines 130 in the display area a.
  • the second photoresist 163 covers the third measurement line 161 and the fourth measurement line 162, and the size of the second photoresist 163 is different from the size of the second color photoresist in the display area a. correspond.
  • the relative positional relationship between the second photoresist 163 and the third measurement line 161 and the fourth measurement line 162 is different from the second color photoresist and the second color photoresist.
  • the relative positional relationship of the two adjacent data lines 130 covered corresponds to each other.
  • the width of the second photoresist 163 beyond the third measurement line 161 is equal to the width of the data line 130 corresponding to the second color photoresist exceeding the third measurement line 161
  • the second The width of the photoresist 163 beyond the fourth measurement line 162 is equal to the width of the second color photoresist exceeding the data line 130 corresponding to the fourth measurement line 162.
  • the third test pattern 170 includes a fifth measurement line 171, a sixth measurement line 172, and a third photoresist 173.
  • the fifth measurement line 171 is disposed adjacent to the fourth measurement line 162, and the fifth measurement line 171 and the sixth measurement line 172 are respectively associated with two adjacent data lines 130 in the display area a.
  • the third photoresist 173 covers the fifth measurement line 171 and the sixth measurement line, and the size of the third photoresist 173 is different from the size of the third color photoresist in the display area a. correspond.
  • the relative positional relationship between the third photoresist 173 and the fifth measurement line 171 and the sixth measurement line 172 is different from the third color photoresist and the third color photoresist.
  • the relative positional relationship of the two adjacent data lines 130 covered corresponds to each other.
  • the width of the third photoresist 173 beyond the fifth measurement line 171 is equal to the width of the data line 130 corresponding to the third color photoresist exceeding the fifth measurement line 171
  • the third The photoresist 173 exceeds the width of the sixth measurement line 172
  • the third color photoresist exceeds the width of the data line 130 corresponding to the sixth measurement line 172.
  • the width of the first photoresist 153 beyond the second measurement line 152 is a first width W1
  • the width of the second photoresist 163 beyond the third measurement line 161 and the fourth measurement line 162 are respectively
  • the third photoresist 173 exceeding the width of the fifth measurement line 171 is the fourth width W4.
  • the width of the overlap region is the sum of the first width W1 and the second width W2.
  • the first measurement line 151 and the second measurement line 152 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the first measurement line 151 and the The second measurement lines 152 are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the third measurement line 161 and the fourth measurement line 162 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the third measurement line 161 and the fourth measurement line 162. They are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the fifth measurement line 171 and the sixth measurement line 172 respectively correspond to two adjacent data lines 130 in the display area a, and refer to the fifth measurement line 171 and the sixth measurement line 172. They are respectively located on extension lines of two adjacent data lines 130 in the display area a.
  • the width of the overlapping area between the second color photoresist and the third color photoresist in the display area a is the sum of the third width W3 and the fourth width W4.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 The width is one-half the width of the data line 130 within the display area a.
  • the width of the first photoresist 153 beyond the second measurement line 152 is specifically the width of the first photoresist 153 beyond the center line of the second measurement line 152.
  • the width of the second photoresist 163 beyond the third measurement line 161 is the width of the second photoresist 163 beyond the center line of the third measurement line 161, and the second photoresist 163 is beyond the fourth
  • the width of the measurement line 162 is the width of the second photoresist 163 beyond the center line of the fourth measurement line 162.
  • the width of the third photoresist 173 beyond the fifth measurement line 171 is the width of the third photoresist 173 beyond the center line of the fifth measurement line 171.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 All are metal wires.
  • the first measurement line 151, the second measurement line 152, the third measurement line 161, the fourth measurement line 162, the fifth measurement line 171, and the sixth measurement line 172 Both are formed at the source and drain of the thin film transistor 120 to simplify the manufacturing process of the thin film transistor array substrate 100.
  • the first color photoresist, the second color photoresist, and the third color photoresist are any combination of three color photoresists of a red photoresist, a blue photoresist, and a green photoresist.
  • the first The colors of the photoresist 151, the second photoresist 163, and the third photoresist 173 are the same as the colors of the first color photoresist, the second color photoresist, and the third color photoresist, respectively.
  • the first photoresist 151, the second photoresist 163, and the third photoresist 173 may also be combined with the first color photoresist and the second color light.
  • the color of the third color resist is not the same, and may be set to other colors.
  • the liquid crystal display device 10 of the present invention provides the first test pattern 150, the second test pattern 160, and the third test pattern 170 in the frame region b of the thin film transistor array substrate 100.
  • the first test pattern 150, the second test pattern 160, and the third test pattern 170 respectively include two measurement lines and photoresists, and two measurement lines in each test pattern respectively correspond to the display area a
  • the adjacent two adjacent data lines 130 correspond to each other, and the photoresist of each test pattern corresponds to the first color photoresist, the second color photoresist, and the third color photoresist in the display area a, respectively.
  • the relationship between the first photoresist 153 and the first measurement line 151 and the second measurement line 152 and the first color photoresist in the display area a and the first color photoresist cover Corresponding to the relationship between the strips of data lines 130; the relationship between the second photoresist 163 and the third measuring line 161 and the fourth measuring line 162 and the second color photoresist in the display area a Corresponding to the relationship between the two data lines 130 covered by the second color photoresist; the relationship between the third photoresist 173 and the fifth measurement line 171 and the sixth measurement line 172
  • the third color photoresist in the display area a corresponds to the relationship between the two data lines 130 covered by the second color photoresist.
  • the sum of the first width and the second width is obtained by measuring the first width, the second width, the third width, and the fourth width.
  • measuring the width of the overlapping area between the first color photoresist and the second color photoresist in the display area a that is not easily measured, and the second color photoresist and the third color The width of the overlap region between the photoresists that is not easily measured is measured so as to subsequently overlap the overlap region between the adjacent first color photoresist and the second color photoresist and the second color photoresist and the third color
  • the area of overlap between the photoresists is improved.

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  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

提供了一种薄膜晶体管阵列基板（100）及液晶显示装置。薄膜晶体管阵列基板（100）包括显示区域（a）及围绕显示区域（a）设置的边框区域（b），显示区域（a）内设置呈阵列状分布的多个薄膜晶体管（120）及多个数据线（130），在边框区域（b）形成第一测试图案（150）、第二测试图案（160）及第三测试图案（170），相邻的测试图案之间的距离大于显示区域（a）内相邻的两条数据线（130）之间的距离，每个测试图案（150，160，170）包括光阻（153，163，173）及两个测试线（151，152，161，162，171，172），每个测试图案（150，160，170）中的光阻（153，163，173）及两个测试线（151，152，161，162，171，172）分别与显示区域（a）中相应颜色的光阻与数据线（130）的尺寸位置关系相对应，通过测量相应测试图案（150，160，170）中的光阻（153，163，173）超出相应测试线（152，161，162，171）的宽度（W1，W2，W3，W4），以得到显示区域（a）内相邻的两个相应颜色的光阻之间的重叠区域。

Description

薄膜晶体管阵列基板及液晶显示装置
本发明要求2014年11月24日递交的发明名称为“薄膜晶体管阵列基板及液晶显示装置”的申请号201410682843.4的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及显示领域，尤其涉及一种薄膜晶体管阵列基板及液晶显示装置。
背景技术
COA(Color on Array)技术是将彩色光阻制备在薄膜晶体管阵列基板阵列(thin film transistor(TFT)Array)上的一种技术。其具有可以提高像素开口率及液晶显示装置(liquid crystal display,LCD)品质的优点。其次，应用COA技术制备的液晶显示装置因为不存在彩色滤光(color filter，CF)基板与TFT基板对位的问题，从而降低液晶显示装置的成盒(cell)阶段的难度。然而，在COA技术中，薄膜晶体管阵列基板中相邻的两种光阻之间会有重叠区域，重叠区域的大小会影响到液晶显示装置的显示效果。因为公共(com)电极金属的干扰，相邻的两种光阻之间的重叠区域不容易被测量，即在现有技术中，薄膜晶体管阵列基板还不能够测量出COA技术中相邻的光阻之间的重叠区域的大小，进而不能够很好地对相邻光阻之间的重叠区域大小进行改进以提高液晶显示装置的显示效果。
发明内容
本发明提供了一种薄膜晶体管阵列基板，所述薄膜晶体管阵列基板能够很好地测量出相邻的光阻的重叠区域的大小。
一种薄膜晶体管阵列基板，所述薄膜晶体管阵列基板包括显示区域及围绕所述显示区域设置的边框区域，所述显示区域内设置呈阵列状分布的多个薄膜晶体管及多个数据线，在所述边框区域形成第一测试图案、第二测试图案及第 三测试图案，所述第一测试图案与所述第二测试图案之间的距离以及所述第二测试图案与所述第三测试图案之间的距离大于所述显示区域内相邻的两条数据线之间的距离，所述第一测试图案包括第一测量线、第二测量线及第一光阻，所述第一测量线及所述第二测量线分别与所述显示区域内两条相邻的数据线相对应，所述第一光阻覆盖所述第一测量线及所述第二测量线，且所述第一光阻的尺寸与所述显示区域内第一颜色光阻的尺寸相对应；所述第二测试图案包括第三测量线、第四测量线及第二光阻，所述第三测量线邻近所述第二测量线设置，所述第三测量线及所述第四测量线分别与所述显示区域内两条相邻的数据线相对应，所述第二光阻覆盖所述第三测量线及所述第四测量线，且所述第二光阻的尺寸与所述显示区域内第二颜色光阻的尺寸相对应；所述第三测试图案包括第五测量线、第六测量线及第三光阻，所述第五测量线邻近所述第四测量线设置，且所述第五测量线及所述第六测量线分别与所述显示区域内两条相邻的数据线相对应，所述第三光阻覆盖所述第五测量线及所述第六测量线，且所述第三光阻的尺寸与所述显示区域内第三颜色光阻的尺寸相对应，所述第一光阻超出所述二测量线的宽度为第一宽度，所述第二光阻超出所述第三测量线及所述第四测量线的宽度分别为第二宽度及第三宽度，所述第三光阻超出所述第五测量线的宽度为第四宽度，则所述显示区域内第一颜色光阻与所述第二颜色光阻之间重叠区域的宽度为所述第一宽度与所述第二宽度之和。
其中，所述显示区域内第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度与所述第四宽度之和。
其中，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线的宽度为所述显示区域内数据线的宽度的二分之一。
其中，所述第一光阻超出所述第二测量线的宽度为所述第一光阻超出所述第二测量线的中线的宽度；所述第二光阻超出所述第三测量线的宽度为所述第二光阻超出所述第三测量线的中线的宽度；所述第二光阻超出所述第四测量线的宽度为所述第二光阻超出所述第四测量线的中线的宽度；所述第三光阻超出所述第五测量线的宽度为所述第三光阻超出所述第五测量线的中线的宽度。
其中，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测 量线、所述第五测量线及所述第六测量线在形成所述薄膜晶体管的源极及漏极时形成。
本发明还提供了一种液晶显示装置，所述液晶显示装置能够很好地测量出相邻光阻之间重叠区域的大小。
一种液晶显示装置，所述液晶显示装置包括薄膜晶体管阵列基板，所述薄膜晶体管阵列基板包括显示区域及围绕所述显示区域设置的边框区域，所述显示区域内设置呈阵列状分布的多个薄膜晶体管及多个数据线，在所述边框区域形成第一测试图案、第二测试图案及第三测试图案，所述第一测试图案与所述第二测试图案之间的距离以及所述第二测试图案与所述第三测试图案之间的距离大于所述显示区域内相邻的两条数据线之间的距离，所述第一测试图案包括第一测量线、第二测量线及第一光阻，所述第一测量线及所述第二测量线分别与所述显示区域内两条相邻的数据线相对应，所述第一光阻覆盖所述第一测量线及所述第二测量线，且所述第一光阻的尺寸与所述显示区域内第一颜色光阻的尺寸相对应；所述第二测试图案包括第三测量线、第四测量线及第二光阻，所述第三测量线邻近所述第二测量线设置，所述第三测量线及所述第四测量线分别与所述显示区域内两条相邻的数据线相对应，所述第二光阻覆盖所述第三测量线及所述第四测量线，且所述第二光阻的尺寸与所述显示区域内第二颜色光阻的尺寸相对应；所述第三测试图案包括第五测量线、第六测量线及第三光阻，所述第五测量线邻近所述第四测量线设置，且所述第五测量线及所述第六测量线分别与所述显示区域内两条相邻的数据线相对应，所述第三光阻覆盖所述第五测量线及所述第六测量线，且所述第三光阻的尺寸与所述显示区域内第三颜色光阻的尺寸相对应，所述第一光阻超出所述二测量线的宽度为第一宽度，所述第二光阻超出所述第三测量线及所述第四测量线的宽度分别为第二宽度及第三宽度，所述第三光阻超出所述第五测量线的宽度为第四宽度，则所述显示区域内第一颜色光阻与所述第二颜色光阻之间重叠区域的宽度为所述第一宽度与所述第二宽度之和。
其中，所述显示区域内第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度与所述第四宽度之和。
其中，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测 量线、所述第五测量线及所述第六测量线的宽度为所述显示区域内数据线的宽度的二分之一。
其中，所述第一光阻超出所述第二测量线的宽度为所述第一光阻超出所述第二测量线的中线的宽度；所述第二光阻超出所述第三测量线的宽度为所述第二光阻超出所述第三测量线的中线的宽度；所述第二光阻超出所述第四测量线的宽度为所述第二光阻超出所述第四测量线的中线的宽度；所述第三光阻超出所述第五测量线的宽度为所述第三光阻超出所述第五测量线的中线的宽度。
其中，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线在形成所述薄膜晶体管的源极及漏极时形成。
本发明的薄膜晶体管阵列基板及液晶显示装置在薄膜晶体管阵列基板的边框区域设置第一测试图案、第二测试图案及第三测试图案。所述第一测试图案、所述第二测试图案及所述第三测试图案分别包括两条测量线及光阻，每个测试图案中的两条测量线分别与所述显示区域内的相邻的两条数据线相对应，每个测试图案的光阻分别与显示区域a内的第一颜色光阻、第二颜色光阻及第三颜色光阻相对应。从而，所述第一光阻与所述第一测量线及所述第二测量线之间的关系与显示区域内第一颜色光阻与所述第一颜色光阻覆盖的两条数据线之间的关系相对应；所述第二光阻与所述第三测量线及所述第四测量线之间的关系与所述显示区域内第二颜色光阻与所述第二颜色光阻覆盖的两条数据线之间的关系相对应；所述第三光阻与所述第五测量线及所述第六测量线之间的关系与所述显示区域内第三颜色光阻与所述第二颜色光阻覆盖的两条数据线之间的关系相对应。由此，通过测量所述第一宽度、所述第二宽度、所述第三宽度及所述第四宽度，得到所述第一宽度与所述第二宽度之和。从而将显示区域内所述第一颜色光阻与所述第二颜色光阻之间不容易被测量的重叠区域的宽度测量出来，以及将所述第二颜色光阻与所述第三颜色光阻之间的不容易被测量出来的重叠区域的宽度测量出来，以便后续对相邻的第一颜色光阻与第二颜色光阻之间的重叠区域以及第二颜色光阻与第三颜色光阻之间的重叠区域进行改进。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明一较佳实施方式的薄膜晶体管阵列基板的结构示意图。
图2为图1中薄膜晶体管阵列基板中的第一测试图案、第二测试图案及第三测试图案放大示意图。
图3为本发明一较佳实施方式的液晶显示装置的结构示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请一并参阅图1及图2，图1为本发明一较佳实施方式的薄膜晶体管阵列基板的结构示意图；图2为图1中薄膜晶体管阵列基板中的第一测试图案、第二测试图案及第三测试图案放大示意图。所述薄膜晶体管阵列基板100为采用COA技术的薄膜晶体管阵列基板，及在本实施方式中，所述薄膜晶体管阵列基板100中包括由多个薄膜晶体管120组成的薄膜晶体管阵列及设置在所述薄膜晶体管阵列上的彩膜。所述彩膜包括多个彩膜单元，每个彩膜单元包括第一颜色光阻(图未示)、第二颜色光阻(图未示)及第三颜色光阻(图未示)。所述薄膜晶体管阵列基板100包括显示区域a及围绕所述显示区域a设置的边框区域b。所述显示区域a内设置呈阵列状分布的多个薄膜晶体管120及多个数据线130。所述边框区域b为所述薄膜晶体管阵列基板100的非显示区域，所述边框区域b形成第一测试图案150、第二测试图案160及第三测试图案170。所述第一测试图案150与所述第二测试图案160之间的距离，以及所述第二测试图案160与所述第三测试图案170之间的距离至少为所述显示区域a内的相连的两条数据线130之间距离大于所述显示区域a内相邻的两条数据线130之 间的距离。
所述第一测试图案150包括第一测量线151、第二测量线152及第一光阻153。所述第一测量线151及所述第二测量线152分别与所述显示区域a内两条相邻的数据线130相对应，所述第一光阻153覆盖所述第一测量线151及所述第二测量线152，且所述第一光阻153的尺寸与所述显示区域a内的第一颜色光阻的尺寸相对应。在本实施方式中，所述第一光阻153与所述第一测量线151及所述第二测量线152的相对位置关系与所述第一颜色光阻和所述第一颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第一光阻153超出所述第一测量线151的宽度与所述第一颜色光阻超出与所述第一测量线151对应的数据线130的宽度相等，所述第一光阻153超出所述第二测量线152的宽度与所述第一颜色光阻超出与所述第二测量线152对应的数据线130的宽度相等。
所述第二测试图案160包括第三测量线161、第四测量线162及第二光阻163。所述第三测量线161邻近所述第二测量线152设置，所述第三测量线161与所述第四测量线162分别与所述显示区域a内两条相邻的数据线130相对应，所述第二光阻163覆盖所述第三测量线161及所述第四测量线162，且所述第二光阻163的尺寸与所述显示区域a内第二颜色光阻的尺寸相对应。在本实施方式中，所述第二光阻163与所述第三测量线161及所述第四测量线162的相对位置关系与所述第二颜色光阻和所述第二颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第二光阻163超出所述第三测量线161的宽度与所述第二颜色光阻超出所述第三测量线161对应的数据线130的宽度相等，所述第二光阻163超出所述第四测量线162的宽度与所述第二颜色光阻超出与所述第四测量线162对应的数据线130的宽度相等。
所述第三测试图案170包括第五测量线171、第六测量线172及第三光阻173。所述第五测量线171邻近所述第四测量线162设置，且所述第五测量线171及所述第六测量线172分别与所述显示区域a内两条相邻的数据线130相对应，所述第三光阻173覆盖所述第五测量线171及所述第六测量线，且所述第三光阻173的尺寸与所述显示区域a内第三颜色光阻的尺寸相对应。在本实施方式中，所述第三光阻173与所述第五测量线171及所述第六测量线172 的相对位置关系与所述第三颜色光阻和所述第三颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第三光阻173超出所述第五测量线171的宽度与所述第三颜色光阻超出所述第五测量线171对应的数据线130的宽度相等，所述第三光阻173超出所述第六测量线172的宽度与所述第三颜色光阻超出与所述第六测量线172对应的数据线130的宽度相等。
所述第一光阻153超出所述第二测量线152的宽度为第一宽度W1，所述第二光阻163超出所述第三测量线161及所述第四测量线162的宽度分别为第二宽度W2及第三宽度W3，所述第三光阻173超出所述第五测量线171的宽度为第四宽度W4。则所述显示区域a内第一颜色光阻与所述第二颜色光阻之间重叠区域的宽度为所述第一宽度W1与所述第二宽度W2之和。
在本实施方式中，所述第一测量线151及所述第二测量线152分别与所述显示区域a内两条相邻的数据线130相对应是指所述第一测量线151及所述第二测量线152分别位于所述显示区域a内两条相邻的数据线130的延长线上。所述第三测量线161与所述第四测量线162分别与所述显示区域a内两条相邻的数据线130相对应是指所述第三测量线161及所述第四测量线162分别位于所述显示区域a内两条相邻的数据线130的延长线上。所述第五测量线171与所述第六测量线172分别与所述显示区域a内两条相邻的数据线130相对应是指所述第五测量线171与所述第六测量线172分别位于所述显示区域a内两条相邻的数据线130的延长线上。
所述显示区域a内所述第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度W3与所述第四宽度W4之和。
优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172的宽度为所述显示区域a内的数据线130的宽度的二分之一。此时，所述第一光阻153超出所述第二测量线152的宽度具体为所述第一光阻153超出所述第二测量线152的中线的宽度。所述第二光阻163超出所述第三测量线161的宽度为所述第二光阻163超出所述第三测量线161的中线的宽度，所述第二光阻163超出所述第四测量线162的宽度为所述第二光阻163超出所述第四测量线162的中线的宽度。所述第三光阻173超出所述第五测量线171的宽度为所述第三光阻 173超出所述第五测量线171的中线的宽度。
优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172均为金属线。优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172均在所述薄膜晶体管120的源极和漏极时形成，以简化所述薄膜晶体管阵列基板100的制造工艺。
所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻为红色光阻、蓝色光阻及绿色光阻这三种颜色光阻的任意组合。在本实施方式中，所述第一光阻151、所述第二光阻163及所述第三光阻173的颜色分别和所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻的颜色相同。可以理解地，在其他实施方式中，所述第一光阻151、所述第二光阻163及所述第三光阻173也可以与所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻的颜色不相同，也可以设置为其他的颜色。
与现有技术相较，本发明在薄膜晶体管阵列基板100的边框区域b设置第一测试图案150、第二测试图案160及第三测试图案170。所述第一测试图案150、所述第二测试图案160及所述第三测试图案170分别包括两条测量线及光阻，每个测试图案中的两条测量线分别与所述显示区域a内的相邻的两条数据线130相对应，每个测试图案的光阻分别与显示区域a内的第一颜色光阻、第二颜色光阻及第三颜色光阻相对应。从而，所述第一光阻153与所述第一测量线151及所述第二测量线152之间的关系与显示区域a内第一颜色光阻与所述第一颜色光阻覆盖的两条数据线130之间的关系相对应；所述第二光阻163与所述第三测量线161及所述第四测量线162之间的关系与所述显示区域a内第二颜色光阻与所述第二颜色光阻覆盖的两条数据线130之间的关系相对应；所述第三光阻173与所述第五测量线171及所述第六测量线172之间的关系与所述显示区域a内第三颜色光阻与所述第二颜色光阻覆盖的两条数据线130之间的关系相对应。由此，通过测量所述第一宽度、所述第二宽度、所述第三宽度及所述第四宽度，得到所述第一宽度与所述第二宽度之和。从而将显示区域a内所述第一颜色光阻与所述第二颜色光阻之间不容易被测量的重叠区域的宽 度测量出来，以及将所述第二颜色光阻与所述第三颜色光阻之间的不容易被测量出来的重叠区域的宽度测量出来，以便后续对相邻的第一颜色光阻与第二颜色光阻之间的重叠区域以及第二颜色光阻与第三颜色光阻之间的重叠区域进行改进。
下面结合图1及图2对本发明液晶显示装置的结构进行介绍。请参阅图3，图3为本发明一较佳实施方式的液晶显示装置的结构示意图。所述液晶显示装置10包括薄膜晶体管阵列基板100、液晶层200及滤光基板300。所述薄膜晶体管阵列基板100与所述滤光基板300相对设置，所述液晶层200设置在所述薄膜晶体管阵列基板100及所述滤光基板300之间。所述薄膜晶体管阵列基板100为采用COA技术的薄膜晶体管阵列基板，及在本实施方式中，所述薄膜晶体管阵列基板100中包括由多个薄膜晶体管120组成的薄膜晶体管阵列及设置在所述薄膜晶体管阵列上的彩膜。所述彩膜包括多个彩膜单元，每个彩膜单元包括第一颜色光阻、第二颜色光阻及第三颜色光阻。
所述薄膜晶体管阵列基板100包括显示区域a及围绕所述显示区域a设置的边框区域b。所述显示区域a内设置呈阵列状分布的多个薄膜晶体管120及多个数据线130。所述边框区域b为所述薄膜晶体管阵列基板100的非显示区域，所述边框区域b形成第一测试图案150、第二测试图案160及第三测试图案170。所述第一测试图案150与所述第二测试图案160之间的距离，以及所述第二测试图案160与所述第三测试图案170之间的距离至少为所述显示区域a内的相连的两条数据线130之间距离大于所述显示区域a内相邻的两条数据线130之间的距离。
所述第一测试图案150包括第一测量线151、第二测量线152及第一光阻153。所述第一测量线151及所述第二测量线152分别与所述显示区域a内两条相邻的数据线130相对应，所述第一光阻153覆盖所述第一测量线151及所述第二测量线152，且所述第一光阻153的尺寸与所述显示区域a内的第一颜色光阻的尺寸相对应。在本实施方式中，所述第一光阻153与所述第一测量线151及所述第二测量线152的相对位置关系与所述第一颜色光阻和所述第一颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第一光阻153超出所述第一测量线151的宽度与所述第一颜色光阻超出与所 述第一测量线151对应的数据线130的宽度相等，所述第一光阻153超出所述第二测量线152的宽度与所述第一颜色光阻超出与所述第二测量线152对应的数据线130的宽度相等。
所述第二测试图案160包括第三测量线161、第四测量线162及第二光阻163。所述第三测量线161邻近所述第二测量线152设置，所述第三测量线161与所述第四测量线162分别与所述显示区域a内两条相邻的数据线130相对应，所述第二光阻163覆盖所述第三测量线161及所述第四测量线162，且所述第二光阻163的尺寸与所述显示区域a内第二颜色光阻的尺寸相对应。在本实施方式中，所述第二光阻163与所述第三测量线161及所述第四测量线162的相对位置关系与所述第二颜色光阻和所述第二颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第二光阻163超出所述第三测量线161的宽度与所述第二颜色光阻超出所述第三测量线161对应的数据线130的宽度相等，所述第二光阻163超出所述第四测量线162的宽度与所述第二颜色光阻超出与所述第四测量线162对应的数据线130的宽度相等。
所述第三测试图案170包括第五测量线171、第六测量线172及第三光阻173。所述第五测量线171邻近所述第四测量线162设置，且所述第五测量线171及所述第六测量线172分别与所述显示区域a内两条相邻的数据线130相对应，所述第三光阻173覆盖所述第五测量线171及所述第六测量线，且所述第三光阻173的尺寸与所述显示区域a内第三颜色光阻的尺寸相对应。在本实施方式中，所述第三光阻173与所述第五测量线171及所述第六测量线172的相对位置关系与所述第三颜色光阻和所述第三颜色光阻下覆盖的两条相邻的数据线130的相对位置关系相对应。举例而言，所述第三光阻173超出所述第五测量线171的宽度与所述第三颜色光阻超出所述第五测量线171对应的数据线130的宽度相等，所述第三光阻173超出所述第六测量线172的宽度与所述第三颜色光阻超出与所述第六测量线172对应的数据线130的宽度相等。
所述第一光阻153超出所述第二测量线152的宽度为第一宽度W1，所述第二光阻163超出所述第三测量线161及所述第四测量线162的宽度分别为第二宽度W2及第三宽度W3，所述第三光阻173超出所述第五测量线171的宽度为第四宽度W4。则所述显示区域a内第一颜色光阻与所述第二颜色光阻之 间重叠区域的宽度为所述第一宽度W1与所述第二宽度W2之和。
在本实施方式中，所述第一测量线151及所述第二测量线152分别与所述显示区域a内两条相邻的数据线130相对应是指所述第一测量线151及所述第二测量线152分别位于所述显示区域a内两条相邻的数据线130的延长线上。所述第三测量线161与所述第四测量线162分别与所述显示区域a内两条相邻的数据线130相对应是指所述第三测量线161及所述第四测量线162分别位于所述显示区域a内两条相邻的数据线130的延长线上。所述第五测量线171与所述第六测量线172分别与所述显示区域a内两条相邻的数据线130相对应是指所述第五测量线171与所述第六测量线172分别位于所述显示区域a内两条相邻的数据线130的延长线上。
所述显示区域a内所述第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度W3与所述第四宽度W4之和。
优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172的宽度为所述显示区域a内的数据线130的宽度的二分之一。此时，所述第一光阻153超出所述第二测量线152的宽度具体为所述第一光阻153超出所述第二测量线152的中线的宽度。所述第二光阻163超出所述第三测量线161的宽度为所述第二光阻163超出所述第三测量线161的中线的宽度，所述第二光阻163超出所述第四测量线162的宽度为所述第二光阻163超出所述第四测量线162的中线的宽度。所述第三光阻173超出所述第五测量线171的宽度为所述第三光阻173超出所述第五测量线171的中线的宽度。
优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172均为金属线。优选地，所述第一测量线151、所述第二测量线152、所述第三测量线161、所述第四测量线162、所述第五测量线171及所述第六测量线172均在所述薄膜晶体管120的源极和漏极时形成，以简化所述薄膜晶体管阵列基板100的制造工艺。
所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻为红色光阻、蓝色光阻及绿色光阻这三种颜色光阻的任意组合。在本实施方式中，所述第一 光阻151、所述第二光阻163及所述第三光阻173的颜色分别和所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻的颜色相同。可以理解地，在其他实施方式中，所述第一光阻151、所述第二光阻163及所述第三光阻173也可以与所述第一颜色光阻、所述第二颜色光阻及所述第三颜色光阻的颜色不相同，也可以设置为其他的颜色。
与现有技术相较，本发明的液晶显示装置10在薄膜晶体管阵列基板100的边框区域b设置第一测试图案150、第二测试图案160及第三测试图案170。所述第一测试图案150、所述第二测试图案160及所述第三测试图案170分别包括两条测量线及光阻，每个测试图案中的两条测量线分别与所述显示区域a内的相邻的两条数据线130相对应，每个测试图案的光阻分别与显示区域a内的第一颜色光阻、第二颜色光阻及第三颜色光阻相对应。从而，所述第一光阻153与所述第一测量线151及所述第二测量线152之间的关系与显示区域a内第一颜色光阻与所述第一颜色光阻覆盖的两条数据线130之间的关系相对应；所述第二光阻163与所述第三测量线161及所述第四测量线162之间的关系与所述显示区域a内第二颜色光阻与所述第二颜色光阻覆盖的两条数据线130之间的关系相对应；所述第三光阻173与所述第五测量线171及所述第六测量线172之间的关系与所述显示区域a内第三颜色光阻与所述第二颜色光阻覆盖的两条数据线130之间的关系相对应。由此，通过测量所述第一宽度、所述第二宽度、所述第三宽度及所述第四宽度，得到所述第一宽度与所述第二宽度之和。从而将显示区域a内所述第一颜色光阻与所述第二颜色光阻之间不容易被测量的重叠区域的宽度测量出来，以及将所述第二颜色光阻与所述第三颜色光阻之间的不容易被测量出来的重叠区域的宽度测量出来，以便后续对相邻的第一颜色光阻与第二颜色光阻之间的重叠区域以及第二颜色光阻与第三颜色光阻之间的重叠区域进行改进。
以上所揭露的仅为本发明一种较佳实施例而已，当然不能以此来限定本发明之权利范围，本领域普通技术人员可以理解实现上述实施例的全部或部分流程，并依本发明权利要求所作的等同变化，仍属于发明所涵盖的范围。

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  1. 一种薄膜晶体管阵列基板，其特征在于，所述薄膜晶体管阵列基板包括显示区域及围绕所述显示区域设置的边框区域，所述显示区域内设置呈阵列状分布的多个薄膜晶体管及多个数据线，在所述边框区域形成第一测试图案、第二测试图案及第三测试图案，所述第一测试图案与所述第二测试图案之间的距离以及所述第二测试图案与所述第三测试图案之间的距离大于所述显示区域内相邻的两条数据线之间的距离，所述第一测试图案包括第一测量线、第二测量线及第一光阻，所述第一测量线及所述第二测量线分别与所述显示区域内两条相邻的数据线相对应，所述第一光阻覆盖所述第一测量线及所述第二测量线，且所述第一光阻的尺寸与所述显示区域内第一颜色光阻的尺寸相对应；所述第二测试图案包括第三测量线、第四测量线及第二光阻，所述第三测量线邻近所述第二测量线设置，所述第三测量线及所述第四测量线分别与所述显示区域内两条相邻的数据线相对应，所述第二光阻覆盖所述第三测量线及所述第四测量线，且所述第二光阻的尺寸与所述显示区域内第二颜色光阻的尺寸相对应；所述第三测试图案包括第五测量线、第六测量线及第三光阻，所述第五测量线邻近所述第四测量线设置，且所述第五测量线及所述第六测量线分别与所述显示区域内两条相邻的数据线相对应，所述第三光阻覆盖所述第五测量线及所述第六测量线，且所述第三光阻的尺寸与所述显示区域内第三颜色光阻的尺寸相对应，所述第一光阻超出所述二测量线的宽度为第一宽度，所述第二光阻超出所述第三测量线及所述第四测量线的宽度分别为第二宽度及第三宽度，所述第三光阻超出所述第五测量线的宽度为第四宽度，则所述显示区域内第一颜色光阻与所述第二颜色光阻之间重叠区域的宽度为所述第一宽度与所述第二宽度之和。
  2. 如权利要求1所述的薄膜晶体管阵列基板，其特征在于，所述显示区域内第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度与所述第四宽度之和。
  3. 如权利要求1所述的薄膜晶体管阵列基板，其特征在于，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线的宽度为所述显示区域内数据线的宽度的二分之一。
  4. 如权利要求3所述的薄膜晶体管阵列基板，其特征在于，所述第一光阻超出所述第二测量线的宽度为所述第一光阻超出所述第二测量线的中线的宽度；所述第二光阻超出所述第三测量线的宽度为所述第二光阻超出所述第三测量线的中线的宽度；所述第二光阻超出所述第四测量线的宽度为所述第二光阻超出所述第四测量线的中线的宽度；所述第三光阻超出所述第五测量线的宽度为所述第三光阻超出所述第五测量线的中线的宽度。
  5. 如权利要求1所述的薄膜晶体管阵列基板，其特征在于，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线在形成所述薄膜晶体管的源极及漏极时形成。
  6. 一种液晶显示装置，所述液晶显示装置包括薄膜晶体管阵列基板，其特征在于，所述薄膜晶体管阵列基板包括显示区域及围绕所述显示区域设置的边框区域，所述显示区域内设置呈阵列状分布的多个薄膜晶体管及多个数据线，在所述边框区域形成第一测试图案、第二测试图案及第三测试图案，所述第一测试图案与所述第二测试图案之间的距离以及所述第二测试图案与所述第三测试图案之间的距离大于所述显示区域内相邻的两条数据线之间的距离，所述第一测试图案包括第一测量线、第二测量线及第一光阻，所述第一测量线及所述第二测量线分别与所述显示区域内两条相邻的数据线相对应，所述第一光阻覆盖所述第一测量线及所述第二测量线，且所述第一光阻的尺寸与所述显示区域内第一颜色光阻的尺寸相对应；所述第二测试图案包括第三测量线、第四测量线及第二光阻，所述第三测量线邻近所述第二测量线设置，所述第三测量线及所述第四测量线分别与所述显示区域内两条相邻的数据线相对应，所述第二光阻覆盖所述第三测量线及所述第四测量线，且所述第二光阻的尺寸与所述显示区域内第二颜色光阻的尺寸相对应；所述第三测试图案包括第五测量线、第 六测量线及第三光阻，所述第五测量线邻近所述第四测量线设置，且所述第五测量线及所述第六测量线分别与所述显示区域内两条相邻的数据线相对应，所述第三光阻覆盖所述第五测量线及所述第六测量线，且所述第三光阻的尺寸与所述显示区域内第三颜色光阻的尺寸相对应，所述第一光阻超出所述二测量线的宽度为第一宽度，所述第二光阻超出所述第三测量线及所述第四测量线的宽度分别为第二宽度及第三宽度，所述第三光阻超出所述第五测量线的宽度为第四宽度，则所述显示区域内第一颜色光阻与所述第二颜色光阻之间重叠区域的宽度为所述第一宽度与所述第二宽度之和。
  7. 如权利要求6所述的液晶显示装置，其特征在于，所述显示区域内第二颜色光阻与所述第三颜色光阻之间的重叠区域的宽度为所述第三宽度与所述第四宽度之和。
  8. 如权利要求6所述的液晶显示装置，其特征在于，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线的宽度为所述显示区域内数据线的宽度的二分之一。
  9. 如权利要求8所述的液晶显示装置，其特征在于，所述第一光阻超出所述第二测量线的宽度为所述第一光阻超出所述第二测量线的中线的宽度；所述第二光阻超出所述第三测量线的宽度为所述第二光阻超出所述第三测量线的中线的宽度；所述第二光阻超出所述第四测量线的宽度为所述第二光阻超出所述第四测量线的中线的宽度；所述第三光阻超出所述第五测量线的宽度为所述第三光阻超出所述第五测量线的中线的宽度。
  10. 如权利要求6所述的液晶显示装置，其特征在于，所述第一测量线、所述第二测量线、所述第三测量线、所述第四测量线、所述第五测量线及所述第六测量线在形成所述薄膜晶体管的源极及漏极时形成。
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