WO2016054950A1 - 一种可生成图案的磁控溅射卷绕镀膜机 - Google Patents

一种可生成图案的磁控溅射卷绕镀膜机 Download PDF

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Publication number
WO2016054950A1
WO2016054950A1 PCT/CN2015/086872 CN2015086872W WO2016054950A1 WO 2016054950 A1 WO2016054950 A1 WO 2016054950A1 CN 2015086872 W CN2015086872 W CN 2015086872W WO 2016054950 A1 WO2016054950 A1 WO 2016054950A1
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Prior art keywords
coating roller
template
wheel
coating
vacuum chamber
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PCT/CN2015/086872
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English (en)
French (fr)
Inventor
姜绶祥
苗大刚
江红
郭荣辉
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香港纺织及成衣研发中心有限公司
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Publication of WO2016054950A1 publication Critical patent/WO2016054950A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Definitions

  • the utility model relates to the technical field of coating equipment, in particular to a magnetron sputtering winding coating machine capable of generating patterns.
  • Vacuum coating is a technique for forming a film material in which atoms or molecules of a coating material are separated from the surface and hit the surface of the object to be plated.
  • Vacuum coating generally refers to the physical deposition of thin films, mainly evaporation coating, ion plating and sputter coating.
  • the magnetron sputtering coating in the sputter coating is widely used because of its good film-bonding fastness, high efficiency, and no pollution.
  • Magnetron sputtering is to perform high-speed sputtering at a low pressure, and it is necessary to effectively increase the ionization rate of the gas.
  • a method of increasing the plasma density to increase the sputtering efficiency by introducing a magnetic field at the surface of the target cathode and utilizing the constraints of the magnetic field on the charged particles.
  • the principle is that the substrate and the target are installed in a vacuum chamber, and positive and negative ions and electrons are formed in the glow discharge of the gas in a low pressure state (10 -3 to 10 -5 Torr).
  • the positive ion bombardment serves as a target for the cathode, and the target atoms are sputtered out to form a thin film on the substrate, thereby realizing various functionalization of the base material.
  • FIG. 1 to 3 are views showing the structure of a coating apparatus in the prior art
  • FIG. 1 is a plan view of a prior art coating apparatus
  • FIG. 2 is a side view of a lower chamber unit in the prior art
  • FIG. 3 is a top view of the prior art.
  • the structure of the coating device in the prior art includes a vacuum chamber 1, a cryogenic unit 5, an upper chamber unit 3, a lower chamber unit 4, and a target vehicle unit 2 is disposed on one side of the vacuum chamber 1
  • the technical vacuum chamber 1 is provided with a winding structure, one side of the vacuum chamber 1 is provided with an upper chamber unit connecting tube, the other side of the vacuum chamber 1 is provided with a lower chamber unit connecting tube, the upper chamber unit connecting tube and the upper chamber unit Flange connection, the lower chamber unit connection pipe is connected to the lower chamber unit flange.
  • the internal structure of the vacuum chamber 1 of the coating device in the prior art is specifically: the central portion of the vacuum chamber 1 is provided with a coating roller, and the two sides of the upper portion of the coating roller are provided with a discharge wheel and a cloth collecting wheel, that is, the textile is discharged from the cloth.
  • the wheel is loosely wound around the coating roller, and a film of metal, metal alloy or other plating material is formed on the surface of the substrate (ie, textile, the same below) by magnetron sputtering, so that the substrate has a specific effect and With film color and light effect.
  • the surface decoration effect of such a coated substrate is monotonous, lacking pattern and color change, and it is difficult to meet the demand for the functionality and aesthetics of the substrate. If it is necessary to increase the pattern and color change, the current solution is to achieve a patterned coating operation by replacing different coating rolls. However, it is difficult to replace the coating roller, and the coating roller hollow pattern is expensive, and the market application prospect is small.
  • the technical problem to be solved by the utility model is that a magnetron sputtering winding coating machine capable of generating a pattern is provided, which solves the problem that the existing coating device needs to replace the coating roller when adding patterns and color changes, and the operation is difficult and the cost is high. problem.
  • a magnetron sputtering winding coating machine capable of generating a pattern, comprising a vacuum chamber, a cryogenic unit, an upper chamber unit and a lower chamber unit, wherein the vacuum chamber is provided with a coating roller, and a side above the coating roller is arranged to receive The cloth wheel and the other side of the coating roller are provided with a cloth discharge wheel.
  • the vacuum chamber further includes:
  • a target cover disposed under the coating roller, a template between the coating roller and the target cover, wherein the template is integrally formed with a plurality of hollow textures, patterns or patterns.
  • the template is pressed by the coating roller and attached to the inner wall of the target cover.
  • the cross section of the target cover is a ring having an arc center angle of 60 to 120 degrees.
  • the vacuum chamber further includes at least three guide rolls, and the template is wound around the outer wall of the at least three guide rolls, The rotation of the guide roller drives the template to move.
  • the vacuum chamber further includes a guide wheel disposed on both sides of the coating roller, between the discharge wheel and the cloth discharge wheel.
  • the cloth is wound around the outer wall of the coating roller by a guide wheel guide and is closely attached to the template, and the coating roller rotates Move the cloth to move.
  • the guide wheels are two groups of three, each set of three guide wheels forming an L-shaped structure, and the lowermost guide wheel and The coating rolls are tangent.
  • the coater further includes at least one target observation window, the target observation window being aligned with the inner wall of the target cover .
  • the coater further includes at least one cooling water outlet.
  • the target cover is fixedly connected with the vacuum chamber, the shaft between the coating roller and the vacuum chamber is connected, the collecting wheel, the discharging wheel and the vacuum chamber The shaft is connected.
  • the template and the cloth move at the same linear velocity.
  • the utility model has the following beneficial effects: the computer controls the rotation speed of the cloth discharge wheel, the cloth collection wheel, the coating roller and the guide roller to synchronize the rotation of the cloth with the template, and realizes the coating operation of different patterns and patterns by replacing different templates.
  • the utility model has the advantages of simple structure and convenient use, and can generate patterns for textiles with low pattern cost.
  • Figure 1 is a plan view of a prior art coating apparatus
  • Figure 2 is a side view of the lower chamber unit of the prior art coating apparatus
  • Figure 3 is a side view of the upper unit of the prior art coating device
  • FIG. 4 is a schematic view showing the structure of a vacuum chamber according to a preferred embodiment of the present invention.
  • Vacuum chamber 2. Target vehicle 3. Upper chamber unit
  • the coating device of the prior art is provided with a coating roller in the middle of the vacuum chamber 1 of the coating device.
  • the two sides of the upper portion of the coating roller are provided with a discharge wheel and a cloth collecting wheel, and the substrate (ie, Textile) is loosened from the discharge wheel and wound on the coating roller.
  • the substrate ie, Textile
  • a film of metal, metal alloy or other plating material is formed on the surface of the substrate to make the substrate have specific effects and have a film.
  • the color and light effect, but the surface decoration effect of this coated substrate is monotonous, lacking pattern and color change, and it is difficult to meet the needs of both the functionality and aesthetics of the substrate.
  • the main innovation of the utility model is that the template 17 located between the coating roller 7 and the target cover 15 is patterned, and the hollow pattern is carved on the template to pass through the target sputtering area at a synchronous speed with the substrate. After the shot is completed, the desired pattern can be obtained; the sputtered target atomic flow passes through the hollowed-out region of the template, deposits on the surface of the substrate, and as the sputtering continues, a nano-film of the target is formed on the surface of the substrate. Due to the difference between the color of the target and the color of the substrate and the specific effects of the interaction between the two, and the special induction effect of the target nano-scale film on light and the environment, the pattern formed on the surface of the substrate is unique.
  • the vacuum chamber 1 is provided with a cloth collecting wheel 6, a coating roller 7, and a cloth discharging wheel 8.
  • the cloth discharge wheel 6 is disposed on one side above the coating roller 7, the cloth discharge wheel 8 is disposed on the other side above the coating roller 7, and the cloth 9 between the cloth discharge wheel 8 and the cloth collection wheel 6 is wound around the coating roller.
  • the vacuum chamber 1 further includes a target cover 15 and a template 17.
  • the target cover 15 is disposed under the coating roller 7, disposed opposite to the coating roller 7, and the inner wall shape of the target cover 15 is adapted to the outer wall of the coating roller 7, and the region between the coating roller 7 and the inner wall of the target cover 15 That is, the target sputtering region described above;
  • the template 17 is located between the coating roller 7 and the target cover 15, that is, located in the target sputtering region, and the template 17 is integrally formed with a plurality of hollow textures, patterns or The pattern, the target atomic flow sputtered from the target cover 15 passes through the hollowed-out region of the template, and is deposited on the surface of the substrate.
  • a nano-film of the target is formed on the surface of the substrate, in order to splash
  • the shooting process can be prepared to proceed quickly, and the template 17 is pressed by the coating roller 7 and attached to the inner wall of the target cover 15.
  • the cross section of the target cover 15 is a ring having an arc angle of 60 degrees to 120 degrees, and the inner wall of the target cover 15 is an inner circle of the ring.
  • the radius is slightly larger than the radius of the coating roller 7, so that the shape of the inner wall of the target cover 15 is adapted to the outer wall of the coating roller 7.
  • the vacuum chamber 1 further includes at least three guide rollers 18 wound around the outer wall of at least three guide rollers 18, and the rotation of the guide rollers 18 drives the template 17 to move.
  • the number of the guide rollers 18 may be three or more than three, for example, four or five, and the template 17 is a seamlessly connected closed structure wound around the outer wall of the guide roller 18, and the number of the guide rollers 18 is three.
  • the template 17 is formed in a triangular shape, and the number of the guide rollers 18 is four, and the template 17 is formed into a quadrangle (for example, a rectangle as shown in Fig. 4), and the number of the guide rollers 18 is five, and the template 17 is formed into a pentagon.
  • the template 17 is not stationary, and the rotation of the guide roller 18 can drive the template 17 to move together, so different textures, patterns or patterns located at different positions on the template 17 can be formed on the surface of the substrate as the template 17 moves. Nanofilms of different shapes of targets.
  • the template 17 is any one of polyimide, polyester, polyethylene, rubber or stainless steel materials, which is thin, tough and slightly elastic. The coating operation of different patterns and patterns can be realized by replacing different templates 17.
  • the vacuum chamber 1 further includes a guide wheel 11 disposed on both sides of the coating roller, and the cloth 9 between the cloth discharge wheel 8 and the cloth collection wheel 6 is guided by the guide wheel 11 It is wound around the outer wall of the coating roller 7 and is in close contact with the template 17, and the rotation of the coating roller 7 causes the cloth 9 to move.
  • the coating roller 7 has a circular cross section, the collecting wheel 6 is disposed on one side above the coating roller 7, and the discharging wheel 8 is disposed on the other side above the coating roller 7, and the diameters of the cloth collecting wheel 6 and the discharging wheel 8 are As the cloth 9 is transferred from the discharge wheel 8 to the take-up wheel 6, it changes between the cloth-distributing wheel 8 and the cloth-receiving wheel 6
  • the cloth 9 can be better attached to the coating roller 7, and is not affected by the change in the diameter of the cloth receiving wheel 6 and the cloth discharging wheel 8, and the guide wheel 11 is required to guide the cloth 9.
  • the guide wheels 11 are two groups of three, each of which has three L-shaped structures, and the lowermost guide wheel 11 is tangent to the coating roller 7.
  • the coating machine further includes at least one target observation window 16 disposed in alignment with the inner wall of the target cover 15, and can be observed through the target observation window 16 at any time.
  • the target observation windows 16 are distributed along the arc of the inner wall of the target cover 15 for complete observation of the coating.
  • the coater further includes at least one cooling water outlet 14.
  • the at least one cooling water outlet 14 is disposed at a lower portion of the target cover 15, and the cooling water entering from the cryogenic unit 5 flows out through the port.
  • the target cover 15 is fixedly coupled to the vacuum chamber 1, and is fixed to the wall surface of the vacuum chamber 1 by, for example, a fixing member such as a bolt provided at both ends of the target cover 15.
  • the coating roller 7 is axially coupled to the vacuum chamber 1, and the coating roller 7 is rotated along the fixed axis.
  • the cloth receiving wheel 6, the cloth discharge wheel 8 and the vacuum chamber 1 are connected to each other and rotate along the respective fixed axes.
  • the template 17 and the cloth 9 move at the same linear velocity, that is, the rotation speed of the cloth discharge wheel 8, the cloth collection wheel 6, the coating roller 7, and the guide roller 18 are controlled by a computer, so that the template 17 is The cloth 9 moves synchronously.
  • the template 17 is pressed by the coating roller 7 to be adhered to the target cover 15, and the cloth 9 discharged from the discharge wheel 8 is adjusted by the guide wheel 11 and pressed under the coating roller 7; the cloth is pressed against the template 17, and is controlled by a computer.
  • the rotation speed of the cloth wheel 8, the cloth collecting wheel 6, the coating roller 7, and the guide roller 18 synchronizes the rotation of the cloth 9 with the template 17, so that the plating operation of different patterns and patterns can be realized by replacing the different templates 17.
  • the transmission of the cloth 9 and the template 17 is controlled by a computer to realize synchronous synchronous transmission of the two.
  • the target in the target cover 15 is placed in parallel with multiple targets, and a target can be sputtered, or different targets can be sputtered at the same time, so that the color of the pattern is more abundant. More selective.
  • the sputtered target atoms or radicals are continuously deposited on the substrate.
  • the template in the utility model is patterned, and the stencil pattern is a hollow pattern designed according to requirements.
  • the principle is similar to the principle of rotary screen printing in printing and dyeing, and the hollow pattern is carved on the stencil made of flexible material.
  • the template passes through the target sputtering region at a synchronous speed between the substrate and the target, and after sputtering is completed, a desired pattern is obtained. In this way, the coating operation of different patterns and patterns can be realized by replacing different templates.

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  • Engineering & Computer Science (AREA)
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Abstract

一种可生成图案的磁控溅射卷绕镀膜机，镀膜机的真空室（1）中包括有：设置于镀膜辊（7）下方的靶材罩（15）、位于镀膜辊（7）和靶材罩（15）之间的模板（17），其中，模板（17）上一体成型地设置有若干镂空状的纹理、图案或花纹，模板（17）被镀膜辊（7）压下并贴紧于靶材罩（15）的内壁上。该镀膜机能够实现布料（9）与模板（17）的转动同步，并通过更换不同的模板（17）实现不同花纹、图案的镀膜操作。

Description

一种可生成图案的磁控溅射卷绕镀膜机 技术领域
本实用新型涉及镀膜设备技术领域，尤其涉及一种可生成图案的磁控溅射卷绕镀膜机。
背景技术
真空镀膜是一种生成薄膜材料的技术，在真空室内镀膜材料的原子或分子从表面离析出来打到被镀物体的表面上。真空镀膜一般是指用物理的方法沉积薄膜，主要有蒸发镀膜、离子镀和溅射镀膜。其中溅射镀膜中的磁控溅射镀膜以其膜基结合牢度好、效率高、无污染等优点被广泛应用。磁控溅射是为了在低气压下进行高速溅射，必须有效地提高气体的离化率。通过在靶阴极表面引入磁场，利用磁场对带电粒子的约束来提高等离子体密度以增加溅射效率的方法。其原理是：把基材和靶材安装于真空室内，在处于低压状态(10-3～10-5乇)气体的辉光放电中形成正、负离子及电子。正离子轰击作为阴极的靶材，使靶材原子被溅射出来，在基材上形成薄膜，从而实现基体材料的各种功能化。
图1～3示出了现有技术中镀膜装置的结构，图1为现有技术镀膜装置的俯视图，图2为现有技术中下室机组的侧视图，图3为现有技术中的上室机组的侧视图，现有技术中的这种镀膜装置的结构包括真空室1、深冷机组5、上室机组3、下室机组4，真空室1的一侧设置靶车机组2，现有技术的真空室1内设置有卷绕结构，真空室1的一侧设置有上室机组连接管，真空室1的另一侧设置下室机组连接管，上室机组连接管与上室机组法兰连接，下室机组连接管与下室机组法兰连接。
现有技术中镀膜装置的真空室1的内部结构具体为：真空室1的中部设置有镀膜辊，镀膜辊的上部的两侧设置有放布轮和收布轮，即纺织品从放布 轮上松开缠绕在镀膜辊上，经过磁控溅射在基材(即纺织品，下同)表面形成一层金属、金属合金或其他镀覆材料的薄膜，使基材具有特定的功效并兼具薄膜的颜色和光效应。但是这种镀膜基材的表面装饰效果单调，缺少图案和色彩变化，难以满足人们对基材的功能性与美观性兼具的需求。如果需要增加图案和色彩变化，目前的解决办法是通过更换不同的镀膜辊实现带有图案的镀膜操作。但是，镀膜辊更换难，给镀膜辊镂空图案造价高，市场应用前景小。
实用新型内容
本实用新型所要解决的技术问题在于：提供了一种可生成图案的磁控溅射卷绕镀膜机，解决现有镀膜装置在增加图案和色彩变化是必须更换镀膜辊、操作难度大、造价高等问题。
本实用新型解决上述问题采用的技术方案为：
提供一种可生成图案的磁控溅射卷绕镀膜机，包括真空室、深冷机组、上室机组、下室机组，所述真空室内设置有镀膜辊、镀膜辊上方的一侧设置有收布轮、镀膜辊上方的另一侧设置有放布轮，
所述真空室中还包括有：
设置于所述镀膜辊下方的靶材罩、位于所述镀膜辊和所述靶材罩之间的模板，其中，所述模板上一体成型的设置有若干镂空状的纹理、图案或花纹，所述模板被镀膜辊压下并贴紧于靶材罩的内壁上。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述靶材罩的截面为弧心角为60度～120度的圆环。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述真空室中还包括有至少3个导辊，所述模板缠绕于所述至少3个导辊的外壁，所述导辊的转动带动所述模板运动。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述真空室中还包括有设置于所述镀膜辊的两侧的导向轮，放布轮与收布轮之间的布料通过导向轮导向缠绕于所述镀膜辊的外壁并紧贴在所述模板上，所述镀膜辊的转 动带动所述布料动。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述导向轮为两组，每组3个，每组的3个导向轮构成L状结构，最下端的导向轮与镀膜辊相切。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述镀膜机还包括有至少一个靶材观察窗，所述靶材观察窗与所述靶材罩的内壁对准设置。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述镀膜机还包括有至少一个冷却水出口。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，靶材罩与真空室之间固定连接，镀膜辊与真空室之间轴连接，收布轮、放布轮与真空室之间轴连接。
在本实用新型的可生成图案的磁控溅射卷绕镀膜机中，所述模板与所述布料运动的线速度相等。
实施本实用新型，具有如下有益效果：通过计算机控制放布轮、收布轮、镀膜辊、导辊的转速，使布料与模板的转动同步，通过更换不同的模板实现不同花纹、图案的镀膜操作，结构简单，使用方便，生成图案成本低的纺织品用可生成图案。
附图说明
为了更清楚地说明本实用新型实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本实用型新的部分实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有技术镀膜装置的俯视图；
图2为现有技术镀膜装置下室机组的侧视图；
图3为现有技术镀膜装置上室机组的侧视图；
图4为本实用新型较佳实施例的真空室内部结构示意图。
附图标识：
1、真空室           2、靶车          3、上室机组
4、下室机组         5、深冷机组      6、收布轮
7、镀膜辊           8、放布轮        9、布料
10、上室机组连接管  11、导向轮       12、下室机组连接管
13、支柱            14、冷却水进出口 15、靶材罩
16、靶材观察窗      17、模板         18、导辊
具体实施方式
下面将结合附图，对本实用新型实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本实用新型一部分实施例，而不是全部的实施例。基于本实用新型中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本实用新型保护的范围。
现有技术的镀膜装置如图1～图3所示，该镀膜装置的真空室1的中部设置有镀膜辊，镀膜辊的上部的两侧设置有放布轮和收布轮，基材(即纺织品)从放布轮上松开缠绕在镀膜辊上，经过磁控溅射在基材表面形成一层金属、金属合金或其他镀覆材料的薄膜，使基材具有特定的功效并兼具薄膜的颜色和光效应，但是这种镀膜基材的表面装饰效果单调，缺少图案和色彩变化，难以满足人们对基材的功能性与美观性兼具的需求。本实用新型的主要创新点在于：位于镀膜辊7和靶材罩15之间的模板17起图案成形作用，模板上雕出镂空花样，以与基材同步的速度通过靶材溅射区域，溅射完成后，即可得到需要的图案；溅射出的靶材原子流穿过模板的镂空区域，沉积于基材表面，随溅射的持续进行，在基材表面形成一层靶材的纳米薄膜，由于靶材颜色与基材颜色的不同和两者相互作用时产生的特定效果，以及靶材纳米级薄膜对光和环境的特殊感应效果，使基材表面形成的图案别具特色。
图4示出了本实用新型较佳实施例的真空室内部结构，如图2所示，与现有技术中一样，真空室1内设置有收布轮6、镀膜辊7、放布轮8，收布轮6设置于镀膜辊7上方的一侧、放布轮8设置于镀膜辊7上方的另一侧，放布轮8与收布轮6之间的布料9缠绕于所述镀膜辊7的外壁上。
在本实施例中，真空室1内还包括有靶材罩15、模板17。靶材罩15设置于镀膜辊7下方，与镀膜辊7正对设置，靶材罩15的内壁形状与镀膜辊7的外壁相适配，镀膜辊7和靶材罩15的内壁之间的区域即为前文所述的靶材溅射区域；模板17位于镀膜辊7和靶材罩15之间，即位于靶材溅射区域，模板17上一体成型的设置有若干镂空状的纹理、图案或花纹，从靶材罩15内溅射出的靶材原子流穿过模板的镂空区域，沉积于基材表面，随溅射的持续进行，在基材表面形成一层靶材的纳米薄膜，为了溅射过程能够准备快速的进行，模板17被镀膜辊7压下并贴紧于靶材罩15的内壁上。
在本实用新型的另一实施例中，靶材罩15的截面为弧心角为60度～120度的圆环，靶材罩15的内壁即为该圆环的内圆，该内圆的半径略大于镀膜辊7的半径，从而实现靶材罩15的内壁形状与镀膜辊7的外壁相适配。
在本实用新型的另一实施例中，真空室1中还包括有至少3个导辊18，模板17缠绕于至少3个导辊18的外壁，导辊18的转动带动模板17运动。导辊18的数量可以为3个，也可以大于3个，例如，4个或者5个，模板17为无缝连接的闭合结构，缠绕于导辊18的外壁，导辊18的数量为3个则模板17形成三角形，导辊18的数量为4个则模板17形成四边形(例如图4中所示的矩形)，导辊18的数量为5个则模板17形成五边形。同时，模板17不是静止不动的，导辊18的转动可以带动模板17一起运动，因此位于模板17上不同位置的不同纹理、图案或花纹，可以随着模板17的运动而在基材表面形成不同形状的靶材纳米薄膜。模板17为聚酰亚胺、聚酯、聚乙烯、橡胶或不锈钢材料中的任意一种，薄、韧且稍具弹性。通过更换不同的模板17即可实现不同花纹、图案的镀膜操作。
在本实用新型的另一实施例中，真空室1中还包括有设置于镀膜辊的两侧的导向轮11，放布轮8与收布轮6之间的布料9通过导向轮11导向后缠绕于所述镀膜辊7的外壁上并紧贴在模板17上，镀膜辊7的转动带动布料9运动。镀膜辊7的截面为圆形，收布轮6设置于镀膜辊7上方的一侧、放布轮8设置于镀膜辊7上方的另一侧，收布轮6和放布轮8的直径会随着布料9从放布轮8转移至收布轮6而发生变化，为了使位于放布轮8与收布轮6之间 的布料9能够更好的贴合镀膜辊7上，不受收布轮6和放布轮8的直径变化的影响，需要设置导向轮11来引导布料9。优选的，导向轮11为两组，每组3个，每组的3个导向轮构成L状结构，最下端的导向轮11与镀膜辊7相切。
在本实用新型的另一实施例中，镀膜机还包括有至少一个靶材观察窗16，靶材观察窗16与靶材罩15的内壁对准设置，透过靶材观察窗16可以随时观察真空室1中的镀膜情况。靶材观察窗16的数量大于3个为最佳，因为靶材罩15的内壁为圆弧形，透过一个靶材观察窗16很难完整观察到整个靶材罩15的内壁，3～5个靶材观察窗16沿着靶材罩15的内壁圆弧分布，以便完整观察镀膜情况。
在本实用新型的另一实施例中，镀膜机还包括有至少一个冷却水出口14。该至少一个冷却水出口14设置于靶材罩15的下部，从深冷机组5进的冷却水经此口流出。
在本实用新型的另一实施例中，靶材罩15与真空室1之间固定连接，例如，通过设置于靶材罩15的两端的螺栓等固定件固定于真空室1的壁面上。镀膜辊7与真空室1之间轴连接，镀膜辊7沿着该固定轴旋转。收布轮6、放布轮8与真空室1之间轴连接，沿着各自的固定轴旋转。
在本实用新型的另一实施例中，模板17与布料9运动的线速度相等，即，通过计算机控制放布轮8、收布轮6、镀膜辊7、导辊18转速，使得模板17与布料9同步运动。模板17被镀膜辊7压下至贴紧在靶材罩15上，放布轮8放出的布料9经过导向轮11调整后压紧在镀膜辊7下；布料紧贴模板17，通过计算机控制放布轮8、收布轮6、镀膜辊7、导辊18转速，使布料9与模板17的转动同步，如此，即可通过更换不同的模板17实现不同花纹、图案的镀膜操作。通过计算机控制布料9与模板17的传动，以实现两者的同步同速传动。
在本实用新型的另一实施例中，靶材罩15内的靶材采用多靶材平行放置，可以溅射一种靶材，也可以同时溅射不同靶材，使图案的颜色更加丰富，选择性更大。
实施本实用新型，溅射出来的靶原子或原子团连续不断的沉积在基材上 形成薄膜，本实用新型中的模板起图案成形作用，镂版图案是根据需求设计的镂空图案，原理类似于印染中圆网印花的原理，在柔性材料制成的镂版上雕出镂空花样，模板在基材与靶材之间，以同步的速度通过靶材溅射区域，溅射完成后，即可得到需要的图案。如此，通过更换不同的模板即可实现不同花纹、图案的镀膜操作。

Claims (9)

  1. 一种可生成图案的磁控溅射卷绕镀膜机，包括真空室(1)、深冷机组(5)、上室机组(3)、下室机组(4)，所述真空室(1)内设置有镀膜辊(7)、镀膜辊(7)上方的一侧设置有收布轮(6)，镀膜辊(7)上方的另一侧设置有放布轮(8)，
    其特征在于，所述真空室(1)中还包括有：
    设置于所述镀膜辊(7)下方的靶材罩(15)、位于所述镀膜辊(7)和所述靶材罩(15)之间的模板(17)，其中，所述模板(17)上一体成型的设置有若干镂空状的纹理、图案或花纹，所述模板(17)被镀膜辊(7)压下并贴紧于靶材罩(15)的内壁上。
  2. 根据权利要求1所述的镀膜机，其特征在于，所述靶材罩(15)的截面为弧心角为60度～120度的圆环。
  3. 根据权利要求1所述的镀膜机，其特征在于，所述真空室1中还包括有至少3个导辊(18)，所述模板(17)缠绕于所述至少3个导辊(18)的外壁，所述导辊(18)的转动带动所述模板(17)运动。
  4. 根据权利要求1所述的镀膜机，其特征在于，所述真空室1中还包括有设置于所述镀膜辊的两侧的导向轮(11)，放布轮(8)与收布轮(6)之间的布料(9)通过导向轮(11)导向缠绕于所述镀膜辊(7)的外壁并紧贴在所述模板(17)上，所述镀膜辊(7)的转动带动所述布料(9)运动。
  5. 根据权利要求1所述的镀膜机，其特征在于，所述导向轮(11)为两组，每组3个，每组的3个导向轮构成L状结构，最下端的导向轮(11)与镀膜辊(7)相切。
  6. 根据权利要求1所述的镀膜机，其特征在于，所述镀膜机还包括有至少一个靶材观察窗(16)，所述靶材观察窗(16)与所述靶材罩(15)的内壁对准设置。
  7. 根据权利要求1所述的镀膜机，其特征在于，所述镀膜机还包括有至少一个冷却水出口(14)。
  8. 根据权利要求1所述的镀膜机，其特征在于，靶材罩(15)与真空室(1)之间固定连接，镀膜辊(7)与真空室(1)之间轴连接，收布轮(6)、放布轮(8)与真空室(1)之间轴连接。
  9. 根据权利要求1所述的镀膜机，其特征在于，所述模板(17)与所述布料(9)运动的线速度相等。
PCT/CN2015/086872 2014-10-09 2015-08-13 一种可生成图案的磁控溅射卷绕镀膜机 WO2016054950A1 (zh)

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