WO2016014166A1 - Système et procédé pour inhiber l'effacement d'une partie de secteur de cellules de mémoire flash à grille divisée - Google Patents
Système et procédé pour inhiber l'effacement d'une partie de secteur de cellules de mémoire flash à grille divisée Download PDFInfo
- Publication number
- WO2016014166A1 WO2016014166A1 PCT/US2015/035360 US2015035360W WO2016014166A1 WO 2016014166 A1 WO2016014166 A1 WO 2016014166A1 US 2015035360 W US2015035360 W US 2015035360W WO 2016014166 A1 WO2016014166 A1 WO 2016014166A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- flash memory
- memory cells
- row
- gate
- rows
- Prior art date
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/14—Circuits for erasing electrically, e.g. erase voltage switching circuits
- G11C16/16—Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
- G11C16/0425—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020177004734A KR20170037996A (ko) | 2014-07-22 | 2015-06-11 | 분리형 게이트 플래시 메모리 셀들의 섹터의 일부분의 소거를 억제하는 시스템 및 방법 |
EP15731210.9A EP3172733B1 (fr) | 2014-07-22 | 2015-06-11 | Système et procédé pour inhiber l'effacement d'une partie de secteur de cellules de mémoire flash à grille divisée |
JP2017503134A JP6532522B2 (ja) | 2014-07-22 | 2015-06-11 | スプリットゲートフラッシュメモリセルのセクタの一部分の消去を禁止するシステム及び方法 |
TW104120307A TWI592935B (zh) | 2014-07-22 | 2015-06-24 | 用以抑制抹除分離閘快閃記憶體單元之部分磁區之系統與方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410447574.3A CN105609131A (zh) | 2014-07-22 | 2014-07-22 | 抑制擦除分裂栅闪存存储器单元扇区的部分的系统和方法 |
CN201410447574.3 | 2014-07-22 | ||
US14/486,687 | 2014-09-15 | ||
US14/486,687 US9633735B2 (en) | 2014-07-22 | 2014-09-15 | System and method to inhibit erasing of portion of sector of split gate flash memory cells |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016014166A1 true WO2016014166A1 (fr) | 2016-01-28 |
Family
ID=53484184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2015/035360 WO2016014166A1 (fr) | 2014-07-22 | 2015-06-11 | Système et procédé pour inhiber l'effacement d'une partie de secteur de cellules de mémoire flash à grille divisée |
Country Status (1)
Country | Link |
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WO (1) | WO2016014166A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11973167B2 (en) | 2018-12-21 | 2024-04-30 | Lumileds Llc | Photoresist patterning process supporting two step phosphor-deposition to form an LED matrix array |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5579259A (en) * | 1995-05-31 | 1996-11-26 | Sandisk Corporation | Low voltage erase of a flash EEPROM system having a common erase electrode for two individually erasable sectors |
US5748538A (en) * | 1996-06-17 | 1998-05-05 | Aplus Integrated Circuits, Inc. | OR-plane memory cell array for flash memory with bit-based write capability, and methods for programming and erasing the memory cell array |
US20130223148A1 (en) * | 2012-02-28 | 2013-08-29 | Samsung Electronics Co., Ltd. | Nonvolatile memory device and embedded memory system including the same |
-
2015
- 2015-06-11 WO PCT/US2015/035360 patent/WO2016014166A1/fr active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5579259A (en) * | 1995-05-31 | 1996-11-26 | Sandisk Corporation | Low voltage erase of a flash EEPROM system having a common erase electrode for two individually erasable sectors |
US5748538A (en) * | 1996-06-17 | 1998-05-05 | Aplus Integrated Circuits, Inc. | OR-plane memory cell array for flash memory with bit-based write capability, and methods for programming and erasing the memory cell array |
US20130223148A1 (en) * | 2012-02-28 | 2013-08-29 | Samsung Electronics Co., Ltd. | Nonvolatile memory device and embedded memory system including the same |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11973167B2 (en) | 2018-12-21 | 2024-04-30 | Lumileds Llc | Photoresist patterning process supporting two step phosphor-deposition to form an LED matrix array |
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