WO2016013501A1 - Cleaning device - Google Patents

Cleaning device Download PDF

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Publication number
WO2016013501A1
WO2016013501A1 PCT/JP2015/070483 JP2015070483W WO2016013501A1 WO 2016013501 A1 WO2016013501 A1 WO 2016013501A1 JP 2015070483 W JP2015070483 W JP 2015070483W WO 2016013501 A1 WO2016013501 A1 WO 2016013501A1
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WO
WIPO (PCT)
Prior art keywords
cleaning liquid
glass substrate
cleaning
nozzles
plate
Prior art date
Application number
PCT/JP2015/070483
Other languages
French (fr)
Japanese (ja)
Inventor
原田 吉典
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP2016535907A priority Critical patent/JP6240777B2/en
Publication of WO2016013501A1 publication Critical patent/WO2016013501A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Definitions

  • the technology disclosed in this specification relates to a cleaning apparatus.
  • a cleaning device that sprays a cleaning liquid onto a glass substrate while transporting the glass substrate by a transport device and cleans the surface of the glass substrate.
  • the transport devices provided in this type of cleaning device in a so-called horizontal transport type device that transports a glass substrate so that its plate surface is along the transport direction, the cleaning liquid sprayed on the glass substrate stays on the glass substrate. There is. When the cleaning liquid stays on the glass substrate in this way, foreign matters such as dust and dirt peeled off from the glass substrate by the cleaning liquid may adhere to the glass substrate again and accumulate.
  • Patent Document 1 discloses a cleaning device that prevents the cleaning liquid from staying on the plate-like material conveyed by the conveying device.
  • the plurality of showers that spray the cleaning liquid are bent in a V shape in a direction from the upstream side to the downstream side in the transport direction of the plate-like body in the direction along the plate surface of the plate-like body. They are arranged in parallel. For this reason, the cleaning liquid sprayed from each shower flows toward the end face of the plate-like body in contact with the surface of the plate-like board in a V shape, thereby preventing the cleaning liquid from staying on the surface of the plate-like body. It can be done.
  • An object of the present invention is to provide a cleaning device that can be used.
  • the technology disclosed in this specification includes a transport device that transports a plate-like body so that the plate surface thereof is along the transport direction, and a direction orthogonal to the transport direction among directions along the plate surface of the plate-like body.
  • a plurality of nozzles that are arranged in parallel in a straight line and that spray a cleaning liquid onto the plate-like body that is transported by the transport device, wherein at least a part of the cleaning liquid that is sprayed onto the plate-like body
  • the present invention relates to a cleaning apparatus including a plurality of nozzles that inject the cleaning liquid toward both end portions in the orthogonal direction of the plate-like body.
  • the cleaning liquid is sprayed from the plurality of nozzles so that at least a part of the cleaning liquid sprayed on the plate-shaped body is directed to both end portions in the orthogonal direction of the plate-shaped body. For this reason, even if the cleaning liquid stays on the transported plate-like body, the cleaning liquid stayed on the plate-like body by the cleaning liquid sprayed from the nozzles becomes plate-like from both ends in the orthogonal direction of the plate-like body. Washed away outside the body. As a result, it is possible to suppress foreign matters contained in the cleaning liquid staying on the plate-like body from reattaching to the plate-like body.
  • the plurality of nozzles are arranged in parallel in a straight line
  • the plurality of nozzles are arranged in parallel in a shape other than a straight line (for example, a shape bent in a V shape) in the manufacturing process of the cleaning apparatus.
  • a plurality of nozzles can be arranged in a simple process compared to the configuration.
  • the above-described cleaning device can be manufactured by a simple process, and can prevent foreign matters from re-adhering on the transported plate-like body.
  • the spraying direction of the cleaning liquid from at least two nozzles of the plurality of nozzles may be inclined with respect to a plane perpendicular to the plate surface of the plate-like body.
  • the nozzle having the inclined cleaning liquid injection direction has a larger inclination angle with respect to the orthogonal plane of the cleaning liquid injection direction as approaching both end sides of the plate-like body in the orthogonal direction. May be.
  • the cleaning liquid tends to stay as it approaches the both ends of the plate-like body in the orthogonal direction. According to the above configuration, since the inclination angle of the spraying direction of the cleaning liquid sprayed onto the plate-like body becomes larger as it approaches the side where the cleaning liquid tends to stay on the plate-like body, the cleaning liquid staying on the plate-like body is reduced. It can be effectively washed off the outside of the plate-like body.
  • the cleaning liquid spraying force may be increased as the nozzle in which the cleaning liquid spraying direction is inclined approaches the both ends of the plate-like body in the orthogonal direction.
  • the cleaning apparatus may further include a plurality of cleaning nozzles in which the spray direction of the cleaning liquid is along the plane, and the plurality of nozzles are arranged downstream of the plurality of cleaning nozzles in the transport direction. May be.
  • the cleaning liquid sprayed from the cleaning nozzle onto the plate-like body hits the plate-like body without being inclined with respect to the plane, the plate-like body conveyed along the conveyance direction is washed.
  • the nozzle can be effectively cleaned. After that, the cleaning liquid staying on the plate-like body can be poured out of the plate-like body by a plurality of nozzles.
  • FIG. 5 is a cross-sectional view taken along the line VV in FIG. 4, showing a cross-sectional configuration of a part of the array substrate.
  • Top view of cleaning equipment Front view of the branch pipe located upstream in the transport direction Transmission plan view of the branch pipe section located upstream in the transport direction Front view of the branch pipe located on the most downstream side in the transport direction
  • Perspective view of the branch pipe portion located on the most downstream side in the transport direction The top view which shows typically the aspect by which the foreign material on a glass substrate is discharged
  • the front view of the branch pipe part which concerns on Embodiment 2 located in the most downstream side of a conveyance direction The front view of the branch pipe part which concerns on Embodiment 3 located in the most downstream side of a conveyance direction
  • Embodiment 1 will be described with reference to FIGS.
  • a cleaning process is performed on the surface of the glass substrate 30A while conveying the glass substrate (an example of a plate-like body) 30A.
  • the cleaning device 50 (see FIG. 7) will be exemplified.
  • a part of each drawing shows an X-axis, a Y-axis, and a Z-axis, and each axis direction is drawn in a common direction in each drawing. 1, 3, and 5, the upper side of the figure is the upper side (front side) of the liquid crystal display device 10.
  • the liquid crystal display device 10 includes a liquid crystal panel 11, an IC chip 17 that is an electronic component that is mounted on the liquid crystal panel 11 and drives the liquid crystal panel 11, and the IC chip 17.
  • a control board 19 that supplies various input signals from the outside
  • a flexible board 18 that electrically connects the liquid crystal panel 11 and the external control board 19, and a backlight device 14 that is an external light source that supplies light to the liquid crystal panel 11.
  • the liquid crystal display device 10 includes front and back external members 15 and 16 for housing and holding the liquid crystal panel 11 and the backlight device 14 assembled to each other.
  • An opening 15A for visually recognizing an image displayed on the liquid crystal panel 11 is provided.
  • the backlight device 14 includes a chassis 14A having a substantially box shape that opens toward the front side, and a light source (cold cathode tube, LED, organic EL, etc.) not shown disposed in the chassis 14A. And an optical member (not shown) arranged so as to cover the opening of the chassis 14A.
  • the optical member has a function of converting light emitted from the light source into planar light. The light that has been planarized through the optical member is incident on the liquid crystal panel 11 and is used to display an image on the liquid crystal panel 11.
  • the liquid crystal panel 11 has a vertically long rectangular shape as a whole, and the long side direction coincides with the Y-axis direction of each drawing, and the short side direction corresponds to the X-axis direction of each drawing.
  • a display area A1 capable of displaying an image is arranged on the majority thereof, and no image is displayed at a position biased to one end side (the lower side in FIG. 2) in the long side direction.
  • Area A2 is arranged.
  • An IC chip 17 and a flexible substrate 18 are mounted on a part of the non-display area A2 by pressure-bonding via an anisotropic conductive film (not shown).
  • a frame-shaped one-dot chain line that is slightly smaller than a color filter substrate 20 described later forms an outer shape of the display area A 1, and an area outside the one-dot chain line is It is a non-display area A2.
  • the liquid crystal panel 11 includes a pair of glass substrates 20 and 30 having excellent translucency, and a liquid crystal layer 11A including liquid crystal molecules that are substances whose optical characteristics change with application of an electric field. It is equipped with.
  • the two substrates 20 and 30 constituting the liquid crystal panel 11 are bonded together by a sealing material (not shown) while maintaining a cell gap corresponding to the thickness of the liquid crystal layer 11A.
  • the front side (front side) substrate 20 is the color filter substrate 20
  • the back side (back side) substrate 30 is the array substrate (an example of a circuit board) 30. As shown in FIG.
  • alignment films 11B and 11C for aligning liquid crystal molecules contained in the liquid crystal layer 11A are formed on the inner surfaces of both the substrates 20 and 30, respectively. Further, polarizing plates 11D and 11E are attached to the outer surface sides of the glass substrates 20A and 30A constituting both the substrates 20 and 30, respectively.
  • the color filter substrate 20 has a short side dimension substantially the same as that of the array substrate 30, but the long side dimension is smaller than that of the array substrate 30, and one side of the long side direction with respect to the array substrate 30.
  • the color filter substrate 20 does not overlap the other end (the lower side shown in FIG. 1) of the array substrate 30 in the long side direction, and both the front and back plate surfaces are exposed to the outside.
  • the mounting area for the IC chip 17 and the flexible substrate 18 is secured here.
  • the glass substrate 30A constituting the array substrate 30 has the color filter substrate 20 and the polarizing plate 11E bonded to the main portion thereof, and the portion where the mounting area of the IC chip 17 and the flexible substrate 18 is secured is the color filter substrate 20 and It is not superimposed on the polarizing plate 11E.
  • a TFT which is a switching element having three electrodes 32A to 32C
  • a large number of pixel electrodes 33 made of a transparent conductive film such as a thin film transistor (ITO) 32 and an indium film (ITO) are provided side by side.
  • a gate wiring 34 and a source wiring 35 are arranged so as to surround the grid. The gate wiring 34 and the source wiring 35 are connected to the gate electrode 32A and the source electrode 32B of the TFT 32, respectively, and the pixel electrode 33 is connected to the drain electrode 32C of the TFT 32 via a drain wiring (not shown).
  • the array substrate 30 is provided with a capacitor wiring 36 that is parallel to the gate wiring 34 and overlaps the pixel electrode 33 in plan view.
  • the capacitor wirings 36 are alternately arranged with the gate wirings 34 in the Y-axis direction.
  • the gate wiring 34 is disposed between the pixel electrodes 33 adjacent in the Y-axis direction, whereas the capacitor wiring 36 is disposed at a position that substantially crosses the central portion of each pixel electrode 33 in the Y-axis direction.
  • the end portion of the array substrate 30 is provided with a terminal portion routed from the gate wiring 34 and the capacitor wiring 36 and a terminal portion routed from the source wiring 35.
  • Each signal or reference potential is inputted from the control board 19 shown in FIG. 1, and the drive of the TFT 32 is thereby controlled.
  • the color filters are provided side by side.
  • the color filter is arranged such that the colored portions 22 exhibiting R (red), G (green), and B (blue) are alternately arranged along the X-axis direction.
  • the substantially lattice-shaped light-shielding part (black matrix) 23 for preventing color mixing is formed.
  • the light shielding portion 23 is arranged so as to overlap with the gate wiring 34, the source wiring 35, and the capacitor wiring 36 on the array substrate 30 side in a plan view.
  • a counter electrode 24 is provided on the surface of each coloring portion 22 and the light shielding portion 23 so as to face the pixel electrode 33 on the array substrate 30 side.
  • one display pixel which is a display unit, is configured by the combination of the three colored portions 22 of R (red), G (green), and B (blue) and the three pixel electrodes 33 that face each other. ing.
  • the TFT 32 which is a switching element provided on the array substrate 30 will be described in detail.
  • the TFT 32 has a structure in which a plurality of films are stacked on the array substrate 30.
  • the gate electrode 32A, the gate insulating film 37, the semiconductor film 38, and the source wiring 35 connected to the gate wiring 34 are sequentially connected from the lower layer side (glass substrate 30A side).
  • a drain electrode 32C connected to the source electrode 32B and the pixel electrode 33, an interlayer insulating film 39, and a protective film 40 are stacked.
  • the gate electrode 32A is made of the same material as the gate wiring 34 and is patterned on the array substrate 30 in the same process as the gate wiring 34, and is made of aluminum (Al), chromium (Cr), tander (Ta), titanium (Ti ), Copper (Cu), or a metal film alone or a laminated film of these metal nitrides.
  • the gate insulating film 37 is made of, for example, a silicon oxide film (SiOx), and insulates between the gate electrode 32A and the semiconductor film 38.
  • the semiconductor film 38 is made of, for example, amorphous silicon (a-Si) or a transparent amorphous oxide semiconductor (InGaZnOx). One end side is connected to the drain electrode 32C and the other end side is connected to the source electrode 32B. It functions as a channel region for conducting.
  • the source electrode 32B and the drain electrode 32C contain the same material as the source wiring 35 and are patterned on the array substrate 30 in the same process as the source wiring 35.
  • the source electrode 32B and the drain electrode 32C are configured by laminating first conductive films 32B1 and 32C1 on the lower layer side (semiconductor film 38 side) and second conductive films 32B2 and 32C2 on the upper layer side (interlayer insulating film 39 side).
  • the first conductive films 32B1 and 32C1 on the lower layer side are made of amorphous silicon (n + Si) doped with an n-type impurity such as phosphorus (P) at a high concentration, and function as an ohmic contact layer.
  • the second conductive films 32B2 and 32C2 on the upper layer side have a two-layer structure in which different metal films are stacked.
  • the metal film on the lower layer side is made of titanium (Ti), and the metal film on the upper layer side is aluminum ( Al).
  • the above-mentioned source electrode 32B and drain electrode 32C are arranged in an opposing manner with a predetermined interval (opening region) interposed therebetween, so that they are not directly electrically connected to each other.
  • the source electrode 32B and the drain electrode 32C are indirectly electrically connected via the semiconductor film 38 on the lower layer side, and the bridge portion between the electrodes 32B and 32C in the semiconductor film 38 is the drain current. Functions as a channel region through which the gas flows.
  • the interlayer insulating film 39 is made of, for example, a silicon oxide film (SiOx), and is made of the same material as the gate insulating film 37 described above.
  • the protective film 40 is made of an acrylic resin (for example, polymethyl methacrylate resin (PMMA)) or a polyimide resin, which is an organic material. Therefore, the protective film 40 is thicker than the gate insulating film 37 and the interlayer insulating film 39 made of other inorganic materials and functions as a planarizing film.
  • PMMA polymethyl methacrylate resin
  • each insulating film (gate insulating film 37, interlayer insulating film 39, and protective film 40) in the TFT 32 is formed with a uniform film thickness over the entire area, including the area other than the area where the TFT 32 is formed on the array substrate 30. Has been.
  • a known photolithography method is used, and various manufacturing apparatuses 50 to 56 are used for that purpose. ing. Specifically, as the manufacturing apparatuses 50 to 56, as shown in FIG. 6, a cleaning apparatus 50, a film forming apparatus 51, a resist coating apparatus 52, an exposure apparatus 53, a developing apparatus 54, an etching apparatus 55, and a resist stripping apparatus. 56 is used.
  • the glass substrate 30A constituting the array substrate 30 is subjected to a cleaning process by the cleaning apparatus 50, a film forming process by the film forming apparatus 51, a resist coating process by the resist coating apparatus 52, an exposure process by the exposure apparatus 53, and a developing apparatus 54
  • a cleaning process by the cleaning apparatus 50 a film forming process by the film forming apparatus 51
  • a resist coating process by the resist coating apparatus 52 an exposure process by the exposure apparatus 53
  • a developing apparatus 54 Through the development process, the etching process by the etching device 55, and the resist peeling process by the resist stripping device 56, the target thin film is formed in a predetermined pattern. By repeating this procedure for each thin film, the thin films are sequentially stacked. To be formed.
  • the glass substrate 30A is cleaned by spraying the cleaning liquid onto the glass substrate 30A before forming each thin film by the cleaning device 50, and foreign matter such as dust and dust on the glass substrate 30A. Remove.
  • the film forming apparatus 51 forms the thin film material to be formed so as to have a uniform film thickness with respect to the plate surface of the glass substrate 30A.
  • a CVD apparatus, a sputtering apparatus, a vacuum deposition apparatus, or the like is used as the film forming apparatus 51.
  • a photoresist is applied to the material film formed by the film forming device 51 by the resist coating device 52 so as to have a uniform film thickness, and is laminated.
  • the exposure device 53 irradiates the photoresist applied by the resist coating device 52 with UV light or the like through a photomask having a predetermined pattern, thereby providing a range corresponding to the pattern of the photomask. To expose.
  • the developing device 54 supplies the developer onto the plate surface of the glass substrate 30A, thereby developing the photoresist and removing either the exposed area or the non-exposed area.
  • the material film is patterned by etching and removing the region of the material film that is not covered with the remaining photoresist by the etching apparatus 55.
  • the etching apparatus 55 specifically, a dry etching apparatus that etches a material film with an etching gas, ions, or radicals, a wet etching apparatus that etches a material film with an etchant, or the like is used.
  • the material film is etched by supplying an etching solution onto the plate surface of the glass substrate 30A.
  • the resist stripping device 56 supplies a resist stripping solution onto the plate surface of the glass substrate 30A, thereby removing the remaining photoresist.
  • the cleaning apparatus 50 may be used after the processes by the other manufacturing apparatuses 51 to 56 in addition to the cleaning process before film formation. Specifically, a cleaning process may be performed after the film forming process by the film forming apparatus 51 in order to remove residual substances and dust accompanying the film formation, and the cleaning apparatus 50 is used in the cleaning process. In addition to this, for example, when a dry etching apparatus is used as the etching apparatus 55, a cleaning process may be performed after the etching process in order to remove residues by dry etching. A device 50 is used.
  • the cleaning device 50 is provided with a cleaning tank 50A separated from the external atmosphere, a transfer device 60 disposed in the cleaning tank 50A, and nozzles 70 and 72 described later. And a plurality of pipes 80. 7 to 13, the X-axis direction is the conveyance direction (front-rear direction) of the glass substrate 30A, the Y-axis direction is the left-right direction (width direction of the glass substrate 30A to be conveyed), and the Z-axis direction is The vertical direction of the cleaning device 50 is used. 7 and 8, the left side of the figure is the upstream side in the transport direction, and the right side of the figure is the downstream side in the transport direction.
  • the glass substrate 30A is thrown to the upstream side in the transport direction with the thin film formation surface or the formation scheduled surface facing upward, and the long side direction is along the X-axis direction and the short side direction. Is transported from the upstream side to the downstream side in the transport direction by the transport device 60 in a posture along the Y-axis direction (see arrows in FIGS. 7 and 8).
  • the transport device 60 extends in a shaft shape, and includes a plurality of transport rollers 62 that transport the glass substrate 30 ⁇ / b> A along the transport direction, and both end portions of each transport roller 62.
  • a bearing portion 64 that supports the bearing portion 64 rotatably and a pair of frames 66 that are fixed at a predetermined height position and hold the bearing portion 64 are provided.
  • the pair of frames 66 has a shape extending along the conveyance direction of the glass substrate 30 ⁇ / b> A, and has a plurality of concave portions 66 ⁇ / b> A ⁇ b> 1 that are recessed in positions corresponding to the attachment positions of the respective conveyance rollers 62. Yes.
  • Each concave portion 66A is provided intermittently along the conveyance direction of the glass substrate 30A so as to open upward.
  • Each conveyance roller 62 is bridged between a pair of frames 66, and the extending direction thereof is in a posture along the Y-axis direction, and is arranged in parallel at a predetermined interval along the conveyance direction.
  • Each conveyance roller 62 is rotated around its axis by a rotation mechanism (not shown).
  • each transport roller 62 has a metal shaft portion 62A and a plurality of synthetic resin substrate support portions 62B attached to the shaft portion 62A.
  • Each substrate support portion 62B has a disk shape larger in diameter than the shaft portion 62A, and is attached to the shaft portion 62A with a predetermined interval in the extending direction of the transport roller 62.
  • the glass substrate 30 ⁇ / b> A is transported along the transport direction while the plate surface opposite to the thin film formation surface or the surface to be formed is continuously supported by the substrate support portion 62 ⁇ / b> B of the transport roller 62.
  • the bearing portion 64 is a so-called ball bearing, and is disposed outside the periphery of the shaft at both ends in the extending direction of the shaft portion 62 ⁇ / b> A of the transport roller 62.
  • the lower portion of the bearing portion 64 is held and fixed to the frame 66 by being bonded and fixed to the concave portion 66 ⁇ / b> A of each frame 66.
  • the transport device 60 includes one additional roller 68 disposed on the upper side of the transport roller 62 so as to face one transport roller 62 disposed on the downstream side in the transport direction. ing.
  • the upper roller 68 has the same configuration as that of the transport roller 62, and the rotation mechanism thereof is the same as that of the transport roller 62.
  • the upper roller 68 is configured to send the glass substrate 30A to the downstream side in the conveying direction in a form in which the glass substrate 30A is sandwiched between the upper roller 68 and the opposite conveying roller 62.
  • each pipe 80 includes a main pipe portion 80A extending along the transport direction, and a plurality of branch pipe portions 80B branching from the main pipe portion 80A and extending along the left-right direction. ing.
  • the main pipe portion 80A of each pipe 80 is located on one end side in the left-right direction of the transfer device, and the branch pipe portion 80B of each pipe 80 extends from one end side to the other end side in the left-right direction of the transfer device. Further, in each pipe 80, the intervals in the transport direction of the branch pipe portions 80B are substantially equal.
  • each branch pipe portion 80B of each pipe 80 a plurality of nozzles 70 and 72 for injecting the cleaning liquid onto the glass substrate 30A conveyed by the conveying device 60 are linearly formed in a direction perpendicular to the conveying direction (Y-axis direction). Installed in parallel.
  • the plurality of nozzles 70 and 72 are intermittently provided at substantially equal intervals in each branch pipe portion 80B, and the number of nozzles 70 and 72 in each branch pipe portion 80B and the arrangement of the nozzles 70 and 72 are both equal. It is supposed to be.
  • the cleaning liquid is supplied to a main pipe portion 80A of each pipe 80 from a supply pipe (not shown).
  • the cleaning liquid supplied to the main pipe portion 80A flows to each branch pipe portion 80B and is ejected from the nozzles 70 and 72.
  • Most of the plurality of nozzles 70 and 72 are vertical nozzles (an example of a cleaning nozzle) that sprays the cleaning liquid straight downward so as to be perpendicular to the plate surface of the glass substrate 30 ⁇ / b> A conveyed by the conveying device 60. 70.
  • the chain line in FIG. 9 and the alternate long and short dash line in FIG. 10 indicate the ejection range of the cleaning liquid ejected from each vertical nozzle 70.
  • the cleaning liquid sprayed from the vertical nozzle 70 is sprayed from the spray nozzle of the vertical nozzle 70 toward the glass substrate 30 ⁇ / b> A so as to spread in the left-right direction with a slight inclination. Further, as shown in FIGS.
  • the cleaning liquid sprayed from each vertical nozzle 70 has a spray range that overlaps with the spray range of the adjacent cleaning liquid on both sides in the left-right direction. For this reason, when the glass substrate 30A conveyed by the conveying device 60 passes directly under the branch pipe portion 80B to which the vertical nozzle 70 is attached, the portion of the plate surface of the glass substrate 30A located directly under the branch pipe portion 80B. Is applied to the cleaning liquid over the entire width direction.
  • the nozzles 70 and 72 attached to the branch pipe portion 80B located on the most downstream side in the transport direction three nozzles 72 located on one end side in the left-right direction and 3 located on the other end side in the left-right direction.
  • the two nozzles 72 are inclined nozzles 72 that inject the cleaning liquid downward so as to hit the plate surface of the glass substrate 30 ⁇ / b> A conveyed by the conveying device 60 from an oblique direction.
  • the chain line in FIG. 11 and the alternate long and short dash line in FIG. 12 indicate the ejection range of the cleaning liquid ejected from each vertical nozzle 70 and each inclined nozzle 72. As shown in FIGS.
  • the cleaning liquid sprayed from the tilt nozzle 72 is sprayed from the spray port of the tilt nozzle 72 toward the glass substrate 30A so as to spread in the front-rear direction in a slightly tilted form.
  • the spray direction D1 of the cleaning liquid is inclined with respect to a plane P1 orthogonal to the plate surface of the glass substrate 30A being conveyed (see FIGS. 11 and 13).
  • the spraying direction of the cleaning liquid is set along the plane P1.
  • the inclined nozzle 72 has a configuration in which an extension nozzle 72 ⁇ / b> A that is bent and extended in a substantially crank shape is attached to the injection port of the vertical nozzle 70 that is slightly inclined upstream in the transport direction. Is done.
  • the extension nozzle 72A is attached in such a posture that its injection port is directed to both end portions in the left-right direction of the glass substrate 30A. For this reason, the cleaning liquid sprayed onto the glass substrate 30A from the inclined nozzle 72 is directed toward both end portions in the left-right direction of the glass substrate 30A.
  • FIG. 11 the inclined nozzle 72
  • the jetting direction is inclined so that the cleaning liquid to be jetted is directed to the right end side of the glass substrate 30A, and the position is on the left end side of the drawing.
  • the injection direction is inclined so that the cleaning liquid to be injected is directed to the left end side of the glass substrate 30A.
  • the cleaning liquid ejection direction by the inclined nozzle 72 is slightly inclined to the upstream side in the transport direction as compared with the cleaning liquid ejection direction by the vertical nozzle 70 (see FIG. 7).
  • each branch pipe portion 80B Since the inclined nozzle 72 attached to each branch pipe portion 80B has the above-described configuration, as schematically shown in FIG. 14, dust, dust, etc. on the glass substrate 30A conveyed by the conveying device 60
  • the foreign matter R1 is caused to flow down from the both end sides in the left-right direction of the glass substrate 30A to the outside of the glass substrate 30A by the cleaning liquid ejected from the inclined nozzle 72 (see the arrow shown in FIG. 14). For this reason, it is prevented or suppressed that the cleaning liquid stays at both end portions in the left-right direction of the glass substrate 30A, and the foreign matter R1 peeled off from the glass substrate 30A by the cleaning liquid is prevented from adhering again on the glass substrate 30A. It is supposed to be suppressed.
  • the cleaning liquid sprayed from the nozzles 70 and 72 is collected, circulated by a circulation device (not shown), and used again as the cleaning liquid.
  • a circulation device not shown
  • the cleaning liquid mixed with the foreign matter R1 may be sprayed onto the glass substrate 30A.
  • the cleaning apparatus 50 is used after the steps of the other manufacturing apparatuses 51 to 56, if the cleaning liquid stays on the glass substrate 30A, the foreign matter R1 mixed in the cleaning liquid is formed on the glass substrate 30A.
  • the gate insulating film 37 or the interlayer insulating film 39 may adhere to the gate insulating film 37 or the interlayer insulating film 39 and peel off from the glass substrate 30A together with a part of the gate insulating film 37 or the interlayer insulating film 39, and may be detected as a gate insulating film defect or an interlayer insulating film defect. .
  • the array substrate 30 in which such a defect is detected is regarded as a defective product.
  • the cleaning liquid is prevented or suppressed from staying on the glass substrate 30A as described above, the foreign matter R1 contained in the reused cleaning liquid is prevented from flowing into the gate insulating film 37 on the glass substrate 30A.
  • adhesion to the interlayer insulating film 39 or the like is prevented or suppressed.
  • the gate insulating film defect of the gate insulating film 37 formed on the glass substrate 30A and the film formed on the glass substrate 30A are formed.
  • deletion of the interlayer insulation film 39 is shown, respectively.
  • the horizontal axis in the graph of FIG. 15 indicates how many pattern defects (the gate insulating film defect and the interlayer insulating film defect) generated per one array substrate 30 occur, and the vertical axis indicates the pattern.
  • the frequency of occurrence of each defect is shown as a percentage (%).
  • the line connecting the circle marks indicates before application of the cleaning apparatus 50 according to the present embodiment
  • the line connected with the square marks indicates after application of the cleaning apparatus 50 according to the present embodiment.
  • the number of occurrences of pattern defects exceeding 60 is much lower after application than before application of the cleaning apparatus 50 according to the present embodiment. Therefore, by applying the cleaning device 50 of this embodiment, the cleaning liquid is prevented or suppressed from staying on the surface of the glass substrate 30A, and pattern defects are generated due to the reattachment of the foreign matter R1 on the glass substrate 30A. The number has been reduced.
  • the cleaning device 50 is disposed on both ends in the left-right direction.
  • the total six inclined nozzles 72 are inclined with respect to a plane orthogonal to the plate surface of the glass substrate 30A to which the cleaning liquid is ejected. Accordingly, the cleaning liquid is sprayed from the six inclined nozzles 72 onto the glass substrate 30A so as to be directed to both end portions in the left-right direction of the glass substrate 30A being conveyed.
  • the nozzles 70 and 72 attached to the pipes 80 are arranged in parallel with the branch pipe portions 80B of the pipes 80.
  • a plurality of nozzles 70 and 72 are formed in a simple process compared to a configuration in which the plurality of nozzles 70 and 72 are arranged in parallel to a shape other than a straight shape (for example, a shape bent in a V shape). Nozzles 70 and 72 can be arranged.
  • the inclined nozzle 72 is arranged downstream of the vertical nozzle 70 in the transport direction, and the plane P1 in which the cleaning liquid ejecting direction by the vertical nozzle 70 is orthogonal to the plate surface of the glass substrate 30A to be transported. It is along.
  • the cleaning liquid sprayed from the vertical nozzle 70 onto the glass substrate 30A hits the glass substrate 30A without being inclined with respect to the plane P1, so that it is transported along the transport direction.
  • the glass substrate 30 ⁇ / b> A to be formed can be effectively cleaned by the vertical nozzle 70 before reaching the lower side of the inclined nozzle 72.
  • the inclined nozzle 72 is arranged on the most downstream side in the transport direction, and the cleaning liquid is ejected from the tilt nozzle 72 so as to be inclined with respect to the plate surface of the glass substrate 30A.
  • the cleaning liquid from the inclined nozzle 72 may enter between the glass substrate 30A and the transport roller 62, and the glass substrate 30A may slide in the plate surface direction.
  • the glass substrate 30A is sandwiched between the transport roller 62 and the addition roller 68 on the downstream side in the transport direction, and the glass substrate 30A is sent out further downstream in the transport direction. The substrate 30A is prevented or suppressed from sliding on the transport roller 62 in the plate surface direction.
  • the three nozzles 72, 173, 174 located on one end side in the left-right direction and the three nozzles 72, 173, 174 located on the other end side in the left-right direction are respectively inclined nozzles 72, 173, 174.
  • the two inclined nozzles 72 located on the inner side are the same as the inclined nozzles 72 of the first embodiment.
  • the extension nozzle 173A is inclined further outward.
  • the two inclined nozzles 173 are configured such that the spraying direction of the cleaning liquid is further inclined by about 5 ° to the outer side than the inclined nozzle 72 similar to that of the first embodiment with respect to the plane P1 described above.
  • the two inclined nozzles 174 respectively positioned outside the two inclined nozzles 173, that is, the two inclined nozzles 174 respectively positioned at both ends in the left-right direction of the branch pipe portion 80B have the extended nozzle 174A on the outer side. Tilted.
  • the two inclined nozzles 173 are configured such that the spraying direction of the cleaning liquid is further inclined by about 10 ° to the outer side than the inclined nozzle 72 similar to that of the first embodiment with respect to the plane P1 described above. .
  • the inclination angle with respect to the plane P1 in the spray direction of the cleaning liquid by the inclined nozzles 72, 173, and 174 becomes larger as approaching the both end portions in the left-right direction of the branch pipe portion 80B.
  • the cleaning liquid tends to stay as it approaches the both end portions in the left-right direction of the glass substrate 30 ⁇ / b> A.
  • each of the inclined nozzles 72, 173, and 174 is configured as described above, so that the cleaning liquid that is sprayed onto the glass substrate 30A as it approaches the side where the cleaning liquid tends to stay on the glass substrate 30A. Therefore, the cleaning liquid staying on the glass substrate 30A can be effectively poured from both ends of the glass substrate 30A in the left-right direction to the outside of the glass substrate 30A.
  • the three nozzles 72, 275 and 276 located on one end side in the left-right direction and the three nozzles 72, 275 and 276 located on the other end side in the left-right direction are inclined nozzles 72, 275 and 276, respectively. Is done.
  • the two inclined nozzles 72 located on the inner side are the same as the inclined nozzles 72 of the first embodiment.
  • the two inclined nozzles 275 located on the outer sides of the inclined nozzles 72 similar to those in the first embodiment have the same spraying force of the cleaning liquid sprayed from the extension nozzles 275A as that in the first embodiment.
  • the two inclined nozzles 275 positioned outside the two inclined nozzles 275 that is, the two inclined nozzles 276 respectively positioned at both ends in the left-right direction of the branch pipe portion 80B are ejected from the extension nozzle 276A.
  • the spraying force of the cleaning liquid is larger than the spraying force of the inclined nozzle 275 located inside the cleaning liquid.
  • the cleaning liquid ejection force by the inclined nozzles 72, 275, and 276 is increased as approaching the both end portions in the left-right direction of the branch pipe portion 80 B.
  • the inclined nozzle is configured by attaching the extension nozzle to the vertical nozzle.
  • the inclined nozzle may be arranged in a straight line, The configuration and the injection mode are not limited.
  • the glass substrate is exemplified as an example of the plate-like body conveyed by the conveying device of the cleaning device.
  • the plate-like body on which the cleaning liquid from the inclined nozzle is ejected is not limited to the glass substrate. .

Abstract

A cleaning device (50) is provided with: a transporting device (60) which transports a glass substrate (30A) in such a way that the plate surface of the glass substrate (30A) extends in the transporting direction; and a plurality of inclined nozzles (72) which are disposed parallel to one another in a straight line in a direction orthogonal to the transporting direction, from among the directions in which the plate surface of the glass substrate (30A) extends, and which spray a cleaning liquid onto the glass substrate (30A) being transported by means of the transporting device (60). The plurality of inclined nozzles (72) spray the cleaning liquid in such a way that at least a portion of the cleaning liquid sprayed onto the glass substrate (30A) is directed toward the two end portions of the glass substrate (30A) in said orthogonal direction.

Description

洗浄装置Cleaning device
 本明細書で開示される技術は、洗浄装置に関する。 The technology disclosed in this specification relates to a cleaning apparatus.
 従来、液晶表示装置の主要構成部品である液晶パネルの製造過程において、ガラス基板を搬送装置によって搬送しながらガラス基板上に洗浄液を噴射し、ガラス基板の表面を洗浄する洗浄装置が知られている。この種の洗浄装置が備える搬送装置のうち、ガラス基板をその板面が搬送方向に沿うように搬送するいわゆる水平搬送タイプのものでは、ガラス基板上に噴射した洗浄液がガラス基板上に滞留することがある。このようにガラス基板上に洗浄液が滞留すると、洗浄液によってガラス基板から剥離された塵や埃等の異物がガラス基板上に再び付着し、蓄積されることがある。 2. Description of the Related Art Conventionally, in a manufacturing process of a liquid crystal panel which is a main component of a liquid crystal display device, a cleaning device is known that sprays a cleaning liquid onto a glass substrate while transporting the glass substrate by a transport device and cleans the surface of the glass substrate. . Among the transport devices provided in this type of cleaning device, in a so-called horizontal transport type device that transports a glass substrate so that its plate surface is along the transport direction, the cleaning liquid sprayed on the glass substrate stays on the glass substrate. There is. When the cleaning liquid stays on the glass substrate in this way, foreign matters such as dust and dirt peeled off from the glass substrate by the cleaning liquid may adhere to the glass substrate again and accumulate.
 そこで下記特許文献1には、搬送装置によって搬送される板状体上への洗浄液の滞留防止を図った洗浄装置が開示されている。この洗浄装置では、洗浄液を噴射する複数のシャワーが、板状体の板面に沿った方向のうち板状体の搬送方向の上流側から下流側に向かう方向にV字型に屈曲した形状に並列して配されている。このため、各シャワーから噴射される洗浄液は板状板の表面に対してV字型にあたって板状体の端面側に向かって流れ、これにより、板状体の表面に洗浄液が滞留することを防止できるようになっている。 Therefore, the following Patent Document 1 discloses a cleaning device that prevents the cleaning liquid from staying on the plate-like material conveyed by the conveying device. In this cleaning apparatus, the plurality of showers that spray the cleaning liquid are bent in a V shape in a direction from the upstream side to the downstream side in the transport direction of the plate-like body in the direction along the plate surface of the plate-like body. They are arranged in parallel. For this reason, the cleaning liquid sprayed from each shower flows toward the end face of the plate-like body in contact with the surface of the plate-like board in a V shape, thereby preventing the cleaning liquid from staying on the surface of the plate-like body. It can be done.
特開2003-136025号公報Japanese Patent Laid-Open No. 2003-136025
(発明が解決しようとする課題)
 しかしながら、上記特許文献1で開示される洗浄装置では、上述したように洗浄液を噴射する複数のシャワーがV字型に並列して配されるため、洗浄装置の製造過程において、複数のシャワーを配する工程が複雑となる虞がある。また、複数のシャワーをV字型に並列して配するためにV字型に屈曲した配管を用意する必要がある。
(Problems to be solved by the invention)
However, in the cleaning device disclosed in Patent Document 1, a plurality of showers for injecting the cleaning liquid are arranged in parallel in a V shape as described above, and thus a plurality of showers are arranged in the manufacturing process of the cleaning device. There is a possibility that the process of performing becomes complicated. Moreover, in order to arrange a plurality of showers in parallel with the V shape, it is necessary to prepare a pipe bent into the V shape.
 本明細書で開示される技術は、上記の課題に鑑みて創作されたものであって、簡単な工程で製造することができ、搬送される板状体上に異物が再付着することを抑制できる洗浄装置を提供することを目的とする。 The technology disclosed in this specification has been created in view of the above-described problems, and can be manufactured by a simple process, and suppresses the reattachment of foreign matter on a plate-like body to be conveyed. An object of the present invention is to provide a cleaning device that can be used.
(課題を解決するための手段)
 本明細書で開示される技術は、板状体をその板面が搬送方向に沿うように搬送する搬送装置と、前記板状体の板面に沿った方向のうち前記搬送方向と直交する方向に直線状に並列して配され、前記搬送装置により搬送される前記板状体上に洗浄液を噴射する複数のノズルであって、前記板状体上に噴射される前記洗浄液の少なくとも一部が前記板状体の前記直交する方向における両端部側に向かうように前記洗浄液を噴射する複数のノズルと、を備える洗浄装置に関する。
(Means for solving the problem)
The technology disclosed in this specification includes a transport device that transports a plate-like body so that the plate surface thereof is along the transport direction, and a direction orthogonal to the transport direction among directions along the plate surface of the plate-like body. A plurality of nozzles that are arranged in parallel in a straight line and that spray a cleaning liquid onto the plate-like body that is transported by the transport device, wherein at least a part of the cleaning liquid that is sprayed onto the plate-like body The present invention relates to a cleaning apparatus including a plurality of nozzles that inject the cleaning liquid toward both end portions in the orthogonal direction of the plate-like body.
 上記の洗浄装置では、板状体上に噴射される洗浄液の少なくとも一部が板状体の上記直交する方向における両端部側に向かうように複数のノズルから洗浄液が噴射される。このため、搬送される板状体上に洗浄液が滞留したとしても、ノズルから噴射される洗浄液によって、板状体上に滞留した洗浄液が、板状体の上記直交する方向における両端部から板状体の外側に流し落とされる。その結果、板状体上に滞留した洗浄液に含まれる異物が板状体に再付着することを抑制することができる。 In the above-described cleaning apparatus, the cleaning liquid is sprayed from the plurality of nozzles so that at least a part of the cleaning liquid sprayed on the plate-shaped body is directed to both end portions in the orthogonal direction of the plate-shaped body. For this reason, even if the cleaning liquid stays on the transported plate-like body, the cleaning liquid stayed on the plate-like body by the cleaning liquid sprayed from the nozzles becomes plate-like from both ends in the orthogonal direction of the plate-like body. Washed away outside the body. As a result, it is possible to suppress foreign matters contained in the cleaning liquid staying on the plate-like body from reattaching to the plate-like body.
 さらに、複数のノズルが直線状に並列して配されるため、洗浄装置の製造過程において、複数のノズルが直線状以外の形状(例えばV字型に屈曲した形状)に並列して配される構成と比べて簡単な工程で複数のノズルを配することができる。以上のように、上記の洗浄装置は、簡単な工程で製造することができ、搬送される板状体上に異物が再付着することを抑制することができる。 Further, since the plurality of nozzles are arranged in parallel in a straight line, the plurality of nozzles are arranged in parallel in a shape other than a straight line (for example, a shape bent in a V shape) in the manufacturing process of the cleaning apparatus. A plurality of nozzles can be arranged in a simple process compared to the configuration. As described above, the above-described cleaning device can be manufactured by a simple process, and can prevent foreign matters from re-adhering on the transported plate-like body.
 上記の洗浄装置において、前記複数のノズルのうち少なくとも2つのノズルの前記洗浄液の噴射方向が、前記板状体の板面と直交する平面に対して傾けられていてもよい。 In the above-described cleaning apparatus, the spraying direction of the cleaning liquid from at least two nozzles of the plurality of nozzles may be inclined with respect to a plane perpendicular to the plate surface of the plate-like body.
 この構成によると、板状体上に噴射される洗浄液の少なくとも一部が板状体の直交する方向における両端部側に向かうようにするためのノズルの具体的な構成を提供することができる。 According to this configuration, it is possible to provide a specific configuration of the nozzle for causing at least a part of the cleaning liquid sprayed on the plate-like body to go to both end portions in the direction orthogonal to the plate-like body.
 上記の洗浄装置において、前記洗浄液の噴射方向が傾けられたノズルは、前記板状体の前記直交する方向における両端部側に近づくにつれて、前記洗浄液の噴射方向の前記直交する平面に対する傾き角度が大きくなるものとされてもよい。 In the above-described cleaning apparatus, the nozzle having the inclined cleaning liquid injection direction has a larger inclination angle with respect to the orthogonal plane of the cleaning liquid injection direction as approaching both end sides of the plate-like body in the orthogonal direction. May be.
 搬送装置によって搬送される板状体上では、板状体の上記直交する方向における両端部側に近づくほど、洗浄液が滞留し易い。上記の構成によると、板状体上のうち洗浄液が滞留し易い側に近づくほど板状体上に噴射される洗浄液の噴射方向の傾き角度が大きくなるので、板状体上に滞留した洗浄液を板状体の外側に効果的に流し落とすことができる。 On the plate-like body transported by the transport device, the cleaning liquid tends to stay as it approaches the both ends of the plate-like body in the orthogonal direction. According to the above configuration, since the inclination angle of the spraying direction of the cleaning liquid sprayed onto the plate-like body becomes larger as it approaches the side where the cleaning liquid tends to stay on the plate-like body, the cleaning liquid staying on the plate-like body is reduced. It can be effectively washed off the outside of the plate-like body.
 上記の洗浄装置において、前記洗浄液の噴射方向が傾けられたノズルは、前記板状体の前記直交する方向における両端部側に近づくにつれて、前記洗浄液の噴射力が大きくなるものとされてもよい。 In the above-described cleaning apparatus, the cleaning liquid spraying force may be increased as the nozzle in which the cleaning liquid spraying direction is inclined approaches the both ends of the plate-like body in the orthogonal direction.
 この構成によると、板状体上のうち洗浄液が滞留し易い側に近づくほど板状体上に噴射される洗浄液の噴射力が大きくなるので、板状体上に滞留した洗浄液を板状体の外側に効果的に流し落とすことができる。 According to this configuration, since the spraying force of the cleaning liquid sprayed onto the plate-like body increases as it approaches the side where the cleaning liquid tends to stay on the plate-like body, the cleaning liquid staying on the plate-like body is removed. It can be effectively washed out to the outside.
 上記の洗浄装置において、前記洗浄液の噴射方向が前記平面に沿うものとされた複数の洗浄用ノズルをさらに備え、前記複数のノズルが前記複数の洗浄用ノズルよりも前記搬送方向の下流側に配されていてもよい。 The cleaning apparatus may further include a plurality of cleaning nozzles in which the spray direction of the cleaning liquid is along the plane, and the plurality of nozzles are arranged downstream of the plurality of cleaning nozzles in the transport direction. May be.
 この構成によると、洗浄用ノズルから板状体上に噴射された洗浄液が上記平面に対して傾かない形で板状体に当たることとなるので、搬送方向に沿って搬送される板状体を洗浄用ノズルによって効果的に洗浄することができる。そして、その後に、板状体上に滞留した洗浄液を複数のノズルによって板状体の外側に流し落とすことができる。 According to this configuration, since the cleaning liquid sprayed from the cleaning nozzle onto the plate-like body hits the plate-like body without being inclined with respect to the plane, the plate-like body conveyed along the conveyance direction is washed. The nozzle can be effectively cleaned. After that, the cleaning liquid staying on the plate-like body can be poured out of the plate-like body by a plurality of nozzles.
(発明の効果)
 本明細書で開示される技術によれば、簡単な工程で製造することができ、搬送される板状体上に異物が再付着することを抑制できる洗浄装置を提供することができる。
(The invention's effect)
According to the technology disclosed in the present specification, it is possible to provide a cleaning device that can be manufactured by a simple process and that can prevent foreign matters from re-adhering on a transported plate-like body.
液晶表示装置を長辺方向に沿って切断した断面の概略断面図Schematic cross-sectional view of a cross section of a liquid crystal display device cut along the long side direction 液晶パネルの概略平面図Schematic plan view of a liquid crystal panel 液晶パネルの断面構成を示す概略断面図Schematic sectional view showing the sectional structure of the liquid crystal panel 液晶パネルを構成するアレイ基板における表示領域の平面構成を示す平面図The top view which shows the plane structure of the display area in the array substrate which comprises a liquid crystal panel 図4のV-V断面の断面図であって、アレイ基板の一部の断面構成を示す断面図FIG. 5 is a cross-sectional view taken along the line VV in FIG. 4, showing a cross-sectional configuration of a part of the array substrate. ガラス基板に対する各製造装置による処理手順を説明するためのブロック図Block diagram for explaining a processing procedure by each manufacturing apparatus for a glass substrate 実施形態1に係る洗浄装置の側面図Side view of the cleaning apparatus according to the first embodiment. 洗浄装置の平面図Top view of cleaning equipment 搬送方向の上流側に位置する分岐管部の正面図Front view of the branch pipe located upstream in the transport direction 搬送方向の上流側に位置する分岐管部の透過平面図Transmission plan view of the branch pipe section located upstream in the transport direction 搬送方向の最も下流側に位置する分岐管部の正面図Front view of the branch pipe located on the most downstream side in the transport direction 搬送方向の最も下流側に位置する分岐管部の透過平面図Permeation plan view of the branch pipe located on the most downstream side in the transport direction 搬送方向の最も下流側に位置する分岐管部の斜視図Perspective view of the branch pipe portion located on the most downstream side in the transport direction ガラス基板上の異物がガラス基板外へ排出される態様を模式的に示す平面図The top view which shows typically the aspect by which the foreign material on a glass substrate is discharged | emitted out of a glass substrate 実施形態1に係る洗浄装置の適用前後におけるパターン欠陥の検出結果を示すグラフThe graph which shows the detection result of the pattern defect before and behind application of the cleaning apparatus which concerns on Embodiment 1. 搬送方向の最も下流側に位置する実施形態2に係る分岐管部の正面図The front view of the branch pipe part which concerns on Embodiment 2 located in the most downstream side of a conveyance direction 搬送方向の最も下流側に位置する実施形態3に係る分岐管部の正面図The front view of the branch pipe part which concerns on Embodiment 3 located in the most downstream side of a conveyance direction
 <実施形態1>
 図1から図15を参照して実施形態1を説明する。本実施形態では、液晶表示装置10の構成部品である液晶パネル11の製造過程において、ガラス基板(板状体の一例)30Aを搬送しながら、当該ガラス基板30Aの表面に対して洗浄処理を施す洗浄装置50(図7参照)について例示する。なお、各図面の一部にはX軸、Y軸およびZ軸を示しており、各軸方向が各図面で共通した方向となるように描かれている。また、図1、図3、及び図5では、図の上側を液晶表示装置10の上側(表側)とする。
<Embodiment 1>
Embodiment 1 will be described with reference to FIGS. In the present embodiment, in the manufacturing process of the liquid crystal panel 11 that is a component of the liquid crystal display device 10, a cleaning process is performed on the surface of the glass substrate 30A while conveying the glass substrate (an example of a plate-like body) 30A. The cleaning device 50 (see FIG. 7) will be exemplified. A part of each drawing shows an X-axis, a Y-axis, and a Z-axis, and each axis direction is drawn in a common direction in each drawing. 1, 3, and 5, the upper side of the figure is the upper side (front side) of the liquid crystal display device 10.
 先に液晶表示装置10、及び液晶パネル11の構成について説明する。液晶表示装置10は、図1及び図2に示すように、液晶パネル11と、液晶パネル11に実装されて当該液晶パネル11を駆動する電子部品であるICチップ17と、ICチップ17に対して各種入力信号を外部から供給するコントロール基板19と、液晶パネル11と外部のコントロール基板19とを電気的に接続するフレキシブル基板18と、液晶パネル11に光を供給する外部光源であるバックライト装置14と、を備えている。また、液晶表示装置10は、相互に組み付けた液晶パネル11及びバックライト装置14を収容して保持するための表裏一体の外部部材15,16を備えており、このうち表側の外部部材15には、液晶パネル11に表示された画像を外部から視認させるための開口部15Aが設けられている。 First, the configuration of the liquid crystal display device 10 and the liquid crystal panel 11 will be described. As shown in FIGS. 1 and 2, the liquid crystal display device 10 includes a liquid crystal panel 11, an IC chip 17 that is an electronic component that is mounted on the liquid crystal panel 11 and drives the liquid crystal panel 11, and the IC chip 17. A control board 19 that supplies various input signals from the outside, a flexible board 18 that electrically connects the liquid crystal panel 11 and the external control board 19, and a backlight device 14 that is an external light source that supplies light to the liquid crystal panel 11. And. In addition, the liquid crystal display device 10 includes front and back external members 15 and 16 for housing and holding the liquid crystal panel 11 and the backlight device 14 assembled to each other. An opening 15A for visually recognizing an image displayed on the liquid crystal panel 11 is provided.
 バックライト装置14は、図1に示すように、表側に向けて開口した略箱型をなすシャーシ14Aと、シャーシ14A内に配された図示しない光源(冷陰極管、LED、有機EL等)と、シャーシ14Aの開口部を覆う形で配される図示しない光学部材と、を備えている。光学部材は、光源から出射される光を面状の光に変換する等の機能を有している。光学部材を通過して面状となった光は、液晶パネル11に入射し、液晶パネル11において画像を表示するために利用される。 As shown in FIG. 1, the backlight device 14 includes a chassis 14A having a substantially box shape that opens toward the front side, and a light source (cold cathode tube, LED, organic EL, etc.) not shown disposed in the chassis 14A. And an optical member (not shown) arranged so as to cover the opening of the chassis 14A. The optical member has a function of converting light emitted from the light source into planar light. The light that has been planarized through the optical member is incident on the liquid crystal panel 11 and is used to display an image on the liquid crystal panel 11.
 液晶パネル11は、図2に示すように、全体として縦長の矩形状をなしており、その長辺方向が各図面のY軸方向と一致し、その短辺方向が各図面のX軸方向と一致している。液晶パネル11では、その大部分に画像を表示可能な表示領域A1が配され、その長辺方向における一方の端部側(図2に示す下側)に偏った位置に画像が表示されない非表示領域A2が配されている。非表示領域A2の一部には、ICチップ17及びフレキシブル基板18が異方性導電膜(不図示)を介した圧着接続によって実装されている。なお、液晶パネル11では、図1に示すように、後述するカラーフィルタ基板20よりも一回り小さな枠状の一点鎖線が表示領域A1の外形をなしており、当該一点鎖線よりも外側の領域が非表示領域A2となっている。 As shown in FIG. 2, the liquid crystal panel 11 has a vertically long rectangular shape as a whole, and the long side direction coincides with the Y-axis direction of each drawing, and the short side direction corresponds to the X-axis direction of each drawing. Match. In the liquid crystal panel 11, a display area A1 capable of displaying an image is arranged on the majority thereof, and no image is displayed at a position biased to one end side (the lower side in FIG. 2) in the long side direction. Area A2 is arranged. An IC chip 17 and a flexible substrate 18 are mounted on a part of the non-display area A2 by pressure-bonding via an anisotropic conductive film (not shown). In the liquid crystal panel 11, as shown in FIG. 1, a frame-shaped one-dot chain line that is slightly smaller than a color filter substrate 20 described later forms an outer shape of the display area A 1, and an area outside the one-dot chain line is It is a non-display area A2.
 液晶パネル11は、図3に示すように、透光性に優れた一対のガラス製の基板20、30と、電界印加に伴って光学特性が変化する物質である液晶分子を含む液晶層11Aと、を備えている。液晶パネル11を構成する両基板20,30は、液晶層11Aの厚さ分のセルギャップを維持した状態で図示しないシール材によって貼り合わされている。両基板20,30のうち、表側(正面側)の基板20がカラーフィルタ基板20とされ、裏側(背面側)の基板30がアレイ基板(回路基板の一例)30とされる。両基板20,30の内面側には、図3に示すように、液晶層11Aに含まれる液晶分子を配向させるための配向膜11B,11Cがそれぞれ形成されている。また、両基板20,30を構成するガラス基板20A,30Aの外面側には、それぞれ偏光板11D,11Eが貼り付けられている。 As shown in FIG. 3, the liquid crystal panel 11 includes a pair of glass substrates 20 and 30 having excellent translucency, and a liquid crystal layer 11A including liquid crystal molecules that are substances whose optical characteristics change with application of an electric field. It is equipped with. The two substrates 20 and 30 constituting the liquid crystal panel 11 are bonded together by a sealing material (not shown) while maintaining a cell gap corresponding to the thickness of the liquid crystal layer 11A. Of the two substrates 20, 30, the front side (front side) substrate 20 is the color filter substrate 20, and the back side (back side) substrate 30 is the array substrate (an example of a circuit board) 30. As shown in FIG. 3, alignment films 11B and 11C for aligning liquid crystal molecules contained in the liquid crystal layer 11A are formed on the inner surfaces of both the substrates 20 and 30, respectively. Further, polarizing plates 11D and 11E are attached to the outer surface sides of the glass substrates 20A and 30A constituting both the substrates 20 and 30, respectively.
 カラーフィルタ基板20は、図2に示すように、短辺寸法がアレイ基板30とほぼ同等であるものの、長辺寸法がアレイ基板30よりも小さく、アレイ基板30に対して長辺方向についての一方の端部(図2に示す上側)を揃えた状態で貼り合わされている。従って、アレイ基板30のうち長辺方向についての他方の端部(図1に示す下側)は、所定範囲に亘ってカラーフィルタ基板20が重なり合うことがなく、表裏両板面が外部に露出した状態とされており、ここにICチップ17及びフレキシブル基板18の実装領域が確保されている。アレイ基板30を構成するガラス基板30Aは、その主要部分にカラーフィルタ基板20及び偏光板11Eが貼り合わされており、ICチップ17及びフレキシブル基板18の実装領域が確保された部分がカラーフィルタ基板20及び偏光板11Eと非重畳とされている。 As shown in FIG. 2, the color filter substrate 20 has a short side dimension substantially the same as that of the array substrate 30, but the long side dimension is smaller than that of the array substrate 30, and one side of the long side direction with respect to the array substrate 30. Are bonded together with their end portions (upper side shown in FIG. 2) aligned. Therefore, the color filter substrate 20 does not overlap the other end (the lower side shown in FIG. 1) of the array substrate 30 in the long side direction, and both the front and back plate surfaces are exposed to the outside. The mounting area for the IC chip 17 and the flexible substrate 18 is secured here. The glass substrate 30A constituting the array substrate 30 has the color filter substrate 20 and the polarizing plate 11E bonded to the main portion thereof, and the portion where the mounting area of the IC chip 17 and the flexible substrate 18 is secured is the color filter substrate 20 and It is not superimposed on the polarizing plate 11E.
 続いてアレイ基板30及びカラーフィルタ基板20における表示領域A1内の構成について説明する。アレイ基板30を構成するガラス基板(基板の一例)30Aの内面側(液晶層11A側)には、図3及び図4に示すように、3つの電極32A~32Cを有するスイッチング素子であるTFT(Thin Film Transistor)32及びITO(Indium Tin Oxide)等の透明導電膜からなる画素電極33が多数個並んで設けられている。これらTFT32及び画素電極33の周りには、図4に示すように、格子状をなすゲート配線34及びソース配線35が取り囲むようにして配設されている。ゲート配線34とソース配線35はそれぞれTFT32のゲート電極32Aとソース電極32Bとに接続され、画素電極33がドレイン配線(不図示)を介してTFT32のドレイン電極32Cに接続されている。 Subsequently, the configuration in the display area A1 of the array substrate 30 and the color filter substrate 20 will be described. On the inner surface side (liquid crystal layer 11A side) of a glass substrate (an example of a substrate) 30A constituting the array substrate 30, as shown in FIGS. 3 and 4, a TFT (which is a switching element having three electrodes 32A to 32C) is provided. A large number of pixel electrodes 33 made of a transparent conductive film such as a thin film transistor (ITO) 32 and an indium film (ITO) are provided side by side. Around the TFT 32 and the pixel electrode 33, as shown in FIG. 4, a gate wiring 34 and a source wiring 35 are arranged so as to surround the grid. The gate wiring 34 and the source wiring 35 are connected to the gate electrode 32A and the source electrode 32B of the TFT 32, respectively, and the pixel electrode 33 is connected to the drain electrode 32C of the TFT 32 via a drain wiring (not shown).
 また、アレイ基板30には、ゲート配線34に並行するとともに画素電極33に対して平面に視て重畳する容量配線36が設けられている。容量配線36は、Y軸方向についてゲート配線34と交互に配されている。ゲート配線34がY軸方向に隣り合う画素電極33の間に配されているのに対し、容量配線36は、各画素電極33におけるY軸方向のほぼ中央部を横切る位置に配されている。このアレイ基板30の端部には、ゲート配線34及び容量配線36から引き回された端子部及びソース配線35から引き回された端子部が設けられており、これらの各端子部には、図1に示すコントロール基板19から各信号または基準電位が入力されるようになっており、それによりTFT32の駆動が制御される。 Further, the array substrate 30 is provided with a capacitor wiring 36 that is parallel to the gate wiring 34 and overlaps the pixel electrode 33 in plan view. The capacitor wirings 36 are alternately arranged with the gate wirings 34 in the Y-axis direction. The gate wiring 34 is disposed between the pixel electrodes 33 adjacent in the Y-axis direction, whereas the capacitor wiring 36 is disposed at a position that substantially crosses the central portion of each pixel electrode 33 in the Y-axis direction. The end portion of the array substrate 30 is provided with a terminal portion routed from the gate wiring 34 and the capacitor wiring 36 and a terminal portion routed from the source wiring 35. Each signal or reference potential is inputted from the control board 19 shown in FIG. 1, and the drive of the TFT 32 is thereby controlled.
 一方、カラーフィルタ基板20を構成するガラス基板20Aの内面側(液晶層11A側)には、図3に示すように、アレイ基板30の各画素電極33と平面に視て重畳する位置に多数個のカラーフィルタが並んで設けられている。カラーフィルタは、R(赤色),G(緑色),B(青色)を呈する各着色部22がX軸方向に沿って交互に並ぶ配置とされる。カラーフィルタを構成する各着色部22間には、混色を防ぐための略格子状の遮光部(ブラックマトリクス)23が形成されている。遮光部23は、アレイ基板30側のゲート配線34、ソース配線35、及び容量配線36に対して平面に視て重畳する配置とされる。また、各着色部22及び遮光部23の表面には、アレイ基板30側の画素電極33と対向する対向電極24が設けられている。液晶パネル11では、R(赤色),G(緑色),B(青色)の3色の着色部22及びそれらと対向する3つの画素電極33の組によって表示単位である1つの表示画素が構成されている。 On the other hand, on the inner surface side (liquid crystal layer 11A side) of the glass substrate 20A constituting the color filter substrate 20, as shown in FIG. The color filters are provided side by side. The color filter is arranged such that the colored portions 22 exhibiting R (red), G (green), and B (blue) are alternately arranged along the X-axis direction. Between each coloring part 22 which comprises a color filter, the substantially lattice-shaped light-shielding part (black matrix) 23 for preventing color mixing is formed. The light shielding portion 23 is arranged so as to overlap with the gate wiring 34, the source wiring 35, and the capacitor wiring 36 on the array substrate 30 side in a plan view. A counter electrode 24 is provided on the surface of each coloring portion 22 and the light shielding portion 23 so as to face the pixel electrode 33 on the array substrate 30 side. In the liquid crystal panel 11, one display pixel, which is a display unit, is configured by the combination of the three colored portions 22 of R (red), G (green), and B (blue) and the three pixel electrodes 33 that face each other. ing.
 ここで、アレイ基板30に設けられたスイッチング素子であるTFT32について詳しく説明する。TFT32は、図4及び図5に示すように、アレイ基板30上に複数の膜を積層した構成とされている。具体的には、図5に示すように、下層側(ガラス基板30A側)から順に、ゲート配線34に接続されたゲート電極32A、ゲート絶縁膜37、半導体膜38、ソース配線35に接続されたソース電極32B及び画素電極33に接続されたドレイン電極32C、層間絶縁膜39、保護膜40が積層されている。 Here, the TFT 32 which is a switching element provided on the array substrate 30 will be described in detail. As shown in FIGS. 4 and 5, the TFT 32 has a structure in which a plurality of films are stacked on the array substrate 30. Specifically, as shown in FIG. 5, the gate electrode 32A, the gate insulating film 37, the semiconductor film 38, and the source wiring 35 connected to the gate wiring 34 are sequentially connected from the lower layer side (glass substrate 30A side). A drain electrode 32C connected to the source electrode 32B and the pixel electrode 33, an interlayer insulating film 39, and a protective film 40 are stacked.
 ゲート電極32Aは、ゲート配線34と同一材料からなるとともにゲート配線34と同一工程にてアレイ基板30上にパターニングされており、アルミニウム(Al)、クロム(Cr)、タンデル(Ta)、チタン(Ti)、銅(Cu)等の金属膜単体又はこれらの金属窒化物との積層膜で形成することができる。ゲート絶縁膜37は、例えばシリコン酸化膜(SiOx)からなり、ゲート電極32Aと半導体膜38との間を絶縁する。半導体膜38は、例えばアモルファスシリコン(a-Si)又は透明なアモルファス酸化物半導体(InGaZnOx)からなり、一端側がドレイン電極32Cに、他端側がソース電極32Bにそれぞれ接続されることで、相互間の導通を図るチャネル領域として機能する。 The gate electrode 32A is made of the same material as the gate wiring 34 and is patterned on the array substrate 30 in the same process as the gate wiring 34, and is made of aluminum (Al), chromium (Cr), tander (Ta), titanium (Ti ), Copper (Cu), or a metal film alone or a laminated film of these metal nitrides. The gate insulating film 37 is made of, for example, a silicon oxide film (SiOx), and insulates between the gate electrode 32A and the semiconductor film 38. The semiconductor film 38 is made of, for example, amorphous silicon (a-Si) or a transparent amorphous oxide semiconductor (InGaZnOx). One end side is connected to the drain electrode 32C and the other end side is connected to the source electrode 32B. It functions as a channel region for conducting.
 ソース電極32B及びドレイン電極32Cは、ソース配線35と同一材料を含むとともにソース配線35と同一工程にてアレイ基板30上にパターニングされている。ソース電極32B及びドレイン電極32Cは、下層側(半導体膜38側)の第1導電膜32B1,32C1と上層側(層間絶縁膜39側)の第2導電膜32B2,32C2とを積層した構成とされる。下層側の第1導電膜32B1,32C1は、リン(P)等のn型不純物を高濃度にドーピングしたアモルファスシリコン(n+Si)からなり、オーミックコンタクト層として機能する。上層側の第2導電膜32B2,32C2は、異なる金属膜を積層してなる2層構造とされており、そのうち下層側の金属膜がチタン(Ti)からなり、上層側の金属膜がアルミニウム(Al)からなる。 The source electrode 32B and the drain electrode 32C contain the same material as the source wiring 35 and are patterned on the array substrate 30 in the same process as the source wiring 35. The source electrode 32B and the drain electrode 32C are configured by laminating first conductive films 32B1 and 32C1 on the lower layer side (semiconductor film 38 side) and second conductive films 32B2 and 32C2 on the upper layer side (interlayer insulating film 39 side). The The first conductive films 32B1 and 32C1 on the lower layer side are made of amorphous silicon (n + Si) doped with an n-type impurity such as phosphorus (P) at a high concentration, and function as an ohmic contact layer. The second conductive films 32B2 and 32C2 on the upper layer side have a two-layer structure in which different metal films are stacked. The metal film on the lower layer side is made of titanium (Ti), and the metal film on the upper layer side is aluminum ( Al).
 上記したソース電極32B及びドレイン電極32Cは、所定の間隔(開口領域)を挟んで対向状に配されているため、相互が直接的には電気的に接続されていない。しかし、ソース電極32B及びドレイン電極32Cは、その下層側の半導体膜38を介して間接的に電気的に接続されており、この半導体膜38における両電極32B,32C間のブリッジ部分が、ドレイン電流が流れるチャネル領域として機能する。 The above-mentioned source electrode 32B and drain electrode 32C are arranged in an opposing manner with a predetermined interval (opening region) interposed therebetween, so that they are not directly electrically connected to each other. However, the source electrode 32B and the drain electrode 32C are indirectly electrically connected via the semiconductor film 38 on the lower layer side, and the bridge portion between the electrodes 32B and 32C in the semiconductor film 38 is the drain current. Functions as a channel region through which the gas flows.
 層間絶縁膜39は、例えばシリコン酸化膜(SiOx)からなり、上記したゲート絶縁膜37と同一材料とされる。保護膜40は、有機材料であるアクリル樹脂(例えばポリメタクリル酸メチル樹脂(PMMA))やポリイミド樹脂からなる。従って、この保護膜40は、他の無機材料からなるゲート絶縁膜37、層間絶縁膜39に比べて膜厚が厚いものとされるとともに、平坦化膜として機能する。なお、TFT32における各絶縁膜(ゲート絶縁膜37、層間絶縁膜39及び保護膜40)は、それぞれアレイ基板30においてTFT32の形成領域以外の領域を含みつつ概ね全域に亘って均一な膜厚で形成されている。 The interlayer insulating film 39 is made of, for example, a silicon oxide film (SiOx), and is made of the same material as the gate insulating film 37 described above. The protective film 40 is made of an acrylic resin (for example, polymethyl methacrylate resin (PMMA)) or a polyimide resin, which is an organic material. Therefore, the protective film 40 is thicker than the gate insulating film 37 and the interlayer insulating film 39 made of other inorganic materials and functions as a planarizing film. Note that each insulating film (gate insulating film 37, interlayer insulating film 39, and protective film 40) in the TFT 32 is formed with a uniform film thickness over the entire area, including the area other than the area where the TFT 32 is formed on the array substrate 30. Has been.
 上記したTFT32、画素電極33、及び各配線34,35,36等の薄膜をアレイ基板30上に形成するに際しては、既知のフォトリソグラフィ法が用いられ、そのために各種製造装置50~56が用いられている。具体的には、製造装置50~56としては、図6に示すように、洗浄装置50、成膜装置51、レジスト塗布装置52、露光装置53、現像装置54、エッチング装置55、及びレジスト剥離装置56が用いられる。そして、アレイ基板30を構成するガラス基板30Aには、洗浄装置50による洗浄工程、成膜装置51による成膜工程、レジスト塗布装置52によるレジスト塗布工程、露光装置53による露光工程、現像装置54による現像工程、エッチング装置55によるエッチング工程、レジスト剥離装置56によるレジスト剥離工程を経ることで、目的の薄膜が所定のパターンで形成され、この手順を各薄膜について繰り返し行うことで、各薄膜が順に積層されて形成される。 In forming thin films such as the TFT 32, the pixel electrode 33, and the wirings 34, 35, and 36 on the array substrate 30, a known photolithography method is used, and various manufacturing apparatuses 50 to 56 are used for that purpose. ing. Specifically, as the manufacturing apparatuses 50 to 56, as shown in FIG. 6, a cleaning apparatus 50, a film forming apparatus 51, a resist coating apparatus 52, an exposure apparatus 53, a developing apparatus 54, an etching apparatus 55, and a resist stripping apparatus. 56 is used. The glass substrate 30A constituting the array substrate 30 is subjected to a cleaning process by the cleaning apparatus 50, a film forming process by the film forming apparatus 51, a resist coating process by the resist coating apparatus 52, an exposure process by the exposure apparatus 53, and a developing apparatus 54 Through the development process, the etching process by the etching device 55, and the resist peeling process by the resist stripping device 56, the target thin film is formed in a predetermined pattern. By repeating this procedure for each thin film, the thin films are sequentially stacked. To be formed.
 具体的には、洗浄工程では、洗浄装置50により、各薄膜を形成する前のガラス基板30A上に洗浄液を噴射することでガラス基板30Aを洗浄し、ガラス基板30A上の塵や埃等の異物を除去する。成膜工程では、成膜装置51により、形成する薄膜の材料をガラス基板30Aの板面に対して均一な膜厚となるように成膜する。この成膜装置51としては、具体的には、CVD装置、スパッタ装置、真空蒸着装置等が用いられる。レジスト塗布工程では、レジスト塗布装置52により、成膜装置51によって成膜された材料膜に対してフォトレジストを均一な膜厚となるように塗布して積層形成する。このとき、フォトレジストとしては、ポジ型、またはネガ型のものが用いられる。露光工程では、露光装置53により、レジスト塗布装置52により塗布されたフォトレジストに対して、所定のパターンを有するフォトマスクを介してUV光等を照射することで、フォトマスクのパターンに応じた範囲を露光する。 Specifically, in the cleaning step, the glass substrate 30A is cleaned by spraying the cleaning liquid onto the glass substrate 30A before forming each thin film by the cleaning device 50, and foreign matter such as dust and dust on the glass substrate 30A. Remove. In the film forming process, the film forming apparatus 51 forms the thin film material to be formed so as to have a uniform film thickness with respect to the plate surface of the glass substrate 30A. Specifically, as the film forming apparatus 51, a CVD apparatus, a sputtering apparatus, a vacuum deposition apparatus, or the like is used. In the resist coating process, a photoresist is applied to the material film formed by the film forming device 51 by the resist coating device 52 so as to have a uniform film thickness, and is laminated. At this time, a positive type or a negative type is used as the photoresist. In the exposure process, the exposure device 53 irradiates the photoresist applied by the resist coating device 52 with UV light or the like through a photomask having a predetermined pattern, thereby providing a range corresponding to the pattern of the photomask. To expose.
 現像工程では、現像装置54により、ガラス基板30Aの板面上に現像液を供給することで、フォトレジストを現像し、露光領域又は非露光領域のいずれかを除去する。エッチング工程では、エッチング装置55により、材料膜のうち残されたフォトレジストによって覆われていない領域をエッチングして除去することで、材料膜をパターニングする。エッチング装置55としては、具体的には、エッチングガスやイオン、ラジカルによって材料膜をエッチングするドライエッチング装置やエッチング液によって材料膜をエッチングするウェットエッチング装置等が用いられる。このうちウェットエッチング装置では、ガラス基板30Aの板面上にエッチング液を供給することで、材料膜をエッチングする。レジスト剥離工程では、レジスト剥離装置56により、ガラス基板30Aの板面上にレジスト剥離液を供給することで、残されたフォトレジストを除去する。 In the developing step, the developing device 54 supplies the developer onto the plate surface of the glass substrate 30A, thereby developing the photoresist and removing either the exposed area or the non-exposed area. In the etching process, the material film is patterned by etching and removing the region of the material film that is not covered with the remaining photoresist by the etching apparatus 55. As the etching apparatus 55, specifically, a dry etching apparatus that etches a material film with an etching gas, ions, or radicals, a wet etching apparatus that etches a material film with an etchant, or the like is used. Among these, in the wet etching apparatus, the material film is etched by supplying an etching solution onto the plate surface of the glass substrate 30A. In the resist stripping step, the resist stripping device 56 supplies a resist stripping solution onto the plate surface of the glass substrate 30A, thereby removing the remaining photoresist.
 上記した各製造装置50~56のうち、洗浄装置50は、上記した成膜前の洗浄工程以外にも、他の製造装置51~56による工程の後で使用される場合がある。具体的には、成膜装置51による成膜工程の後に、成膜に伴う残余物質やゴミを除去するために洗浄工程を行う場合があり、その洗浄工程において洗浄装置50が用いられる。これ以外にも、例えばエッチング装置55としてドライエッチング装置を用いた場合、そのエッチング工程の後にドライエッチングによる残渣物を除去するために洗浄工程を行う場合があり、その洗浄工程においても、上記した洗浄装置50が用いられる。 Of the manufacturing apparatuses 50 to 56 described above, the cleaning apparatus 50 may be used after the processes by the other manufacturing apparatuses 51 to 56 in addition to the cleaning process before film formation. Specifically, a cleaning process may be performed after the film forming process by the film forming apparatus 51 in order to remove residual substances and dust accompanying the film formation, and the cleaning apparatus 50 is used in the cleaning process. In addition to this, for example, when a dry etching apparatus is used as the etching apparatus 55, a cleaning process may be performed after the etching process in order to remove residues by dry etching. A device 50 is used.
 続いて洗浄装置50の構成について詳しく説明する。洗浄装置50は、図7及び図8に示すように、外部雰囲気から隔てられた洗浄槽50Aと、この洗浄槽50A内に配設された搬送装置60と、後述するノズル70,72が取り付けられた複数の配管80と、を備える構成とされる。なお、図7~図13では、X軸方向がガラス基板30Aの搬送方向(前後方向)とされ、Y軸方向が左右方向(搬送されるガラス基板30Aの幅方向)とされ、Z軸方向が洗浄装置50の上下方向とされる。また、図7及び図8では、図の左側が搬送方向の上流側、図の右側が搬送方向の下流側とされる。洗浄装置50において、ガラス基板30Aは、薄膜の形成面又は形成予定面が上側に向けられた状態で搬送方向の上流側に投入され、その長辺方向がX軸方向に沿うとともにその短辺方向がY軸方向に沿った姿勢で、搬送装置60によって搬送方向の上流側から下流側へと搬送される(図7及び図8の矢印参照)。 Subsequently, the configuration of the cleaning apparatus 50 will be described in detail. As shown in FIGS. 7 and 8, the cleaning device 50 is provided with a cleaning tank 50A separated from the external atmosphere, a transfer device 60 disposed in the cleaning tank 50A, and nozzles 70 and 72 described later. And a plurality of pipes 80. 7 to 13, the X-axis direction is the conveyance direction (front-rear direction) of the glass substrate 30A, the Y-axis direction is the left-right direction (width direction of the glass substrate 30A to be conveyed), and the Z-axis direction is The vertical direction of the cleaning device 50 is used. 7 and 8, the left side of the figure is the upstream side in the transport direction, and the right side of the figure is the downstream side in the transport direction. In the cleaning apparatus 50, the glass substrate 30A is thrown to the upstream side in the transport direction with the thin film formation surface or the formation scheduled surface facing upward, and the long side direction is along the X-axis direction and the short side direction. Is transported from the upstream side to the downstream side in the transport direction by the transport device 60 in a posture along the Y-axis direction (see arrows in FIGS. 7 and 8).
 先に搬送装置60の構成について説明する。搬送装置60は、図7及び図8に示すように、軸状に延在し、ガラス基板30Aを搬送方向に沿って搬送する複数の搬送ローラ62と、各搬送ローラ62の両端部をその軸周りに回転可能に支持する軸受部64と、所定の高さ位置に固定されて軸受部64を保持する一対のフレーム66とを備えている。このうち一対のフレーム66は、ガラス基板30Aの搬送方向に沿って延在する形状とされ、各搬送ローラ62の取付位置に対応する位置に凹状に凹んでなる複数の凹状部66A1を有している。各凹状部66Aは、上方に開口する形で、ガラス基板30Aの搬送方向に沿って間欠的に設けられている。 First, the configuration of the transfer device 60 will be described. As shown in FIG. 7 and FIG. 8, the transport device 60 extends in a shaft shape, and includes a plurality of transport rollers 62 that transport the glass substrate 30 </ b> A along the transport direction, and both end portions of each transport roller 62. A bearing portion 64 that supports the bearing portion 64 rotatably and a pair of frames 66 that are fixed at a predetermined height position and hold the bearing portion 64 are provided. Among these, the pair of frames 66 has a shape extending along the conveyance direction of the glass substrate 30 </ b> A, and has a plurality of concave portions 66 </ b> A <b> 1 that are recessed in positions corresponding to the attachment positions of the respective conveyance rollers 62. Yes. Each concave portion 66A is provided intermittently along the conveyance direction of the glass substrate 30A so as to open upward.
 各搬送ローラ62は、一対のフレーム66の間に架け渡され、その延在方向がY軸方向に沿った姿勢で、搬送方向に沿って所定の間隔で並列配置されている。各搬送ローラ62は、図示しない回転機構によってその軸周りに回転されるようになっている。各搬送ローラ62は、図7及び図8に示すように、金属製のシャフト部62Aと、シャフト部62Aに取り付けられた合成樹脂製の複数の基板支持部62Bとを有している。各基板支持部62Bは、シャフト部62Aよりも径大な円板状とされ、搬送ローラ62の延在方向において所定の間隔を空けてシャフト部62Aに取り付けられている。ガラス基板30Aは、薄膜の形成面又は形成予定面とは反対側の板面が搬送ローラ62の基板支持部62Bによって継続的に支持されながら、搬送方向に沿って搬送される。 Each conveyance roller 62 is bridged between a pair of frames 66, and the extending direction thereof is in a posture along the Y-axis direction, and is arranged in parallel at a predetermined interval along the conveyance direction. Each conveyance roller 62 is rotated around its axis by a rotation mechanism (not shown). As shown in FIGS. 7 and 8, each transport roller 62 has a metal shaft portion 62A and a plurality of synthetic resin substrate support portions 62B attached to the shaft portion 62A. Each substrate support portion 62B has a disk shape larger in diameter than the shaft portion 62A, and is attached to the shaft portion 62A with a predetermined interval in the extending direction of the transport roller 62. The glass substrate 30 </ b> A is transported along the transport direction while the plate surface opposite to the thin film formation surface or the surface to be formed is continuously supported by the substrate support portion 62 </ b> B of the transport roller 62.
 軸受部64は、いわゆるボールベアリングであり、搬送ローラ62のシャフト部62Aの延在方向の両端部において、軸周りの外側に配されている。軸受部64は、その下側部分が各フレーム66の凹状部66Aに接着固定されることで、フレーム66に対して保持されている。なお、搬送装置60は、図7に示すように、搬送方向の下流側に配された一つの搬送ローラ62と対向する形で当該搬送ローラ62の上側に配された一つの上乗せローラ68を備えている。この上乗せローラ68は、搬送ローラ62と同様の構成であり、その回転機構についても搬送ローラ62と同様とされる。この上乗せローラ68は、対向する搬送ローラ62との間にガラス基板30Aを挟み込んだ形で当該ガラス基板30Aを搬送方向の下流側に送り出すものとされる。このように対向する一対のローラ62,68の間にガラス基板30Aを挟み込むことで、ガラス基板30Aがその板面方向に滑ることを防止ないし抑制することができる。 The bearing portion 64 is a so-called ball bearing, and is disposed outside the periphery of the shaft at both ends in the extending direction of the shaft portion 62 </ b> A of the transport roller 62. The lower portion of the bearing portion 64 is held and fixed to the frame 66 by being bonded and fixed to the concave portion 66 </ b> A of each frame 66. As shown in FIG. 7, the transport device 60 includes one additional roller 68 disposed on the upper side of the transport roller 62 so as to face one transport roller 62 disposed on the downstream side in the transport direction. ing. The upper roller 68 has the same configuration as that of the transport roller 62, and the rotation mechanism thereof is the same as that of the transport roller 62. The upper roller 68 is configured to send the glass substrate 30A to the downstream side in the conveying direction in a form in which the glass substrate 30A is sandwiched between the upper roller 68 and the opposite conveying roller 62. By sandwiching the glass substrate 30A between the pair of rollers 62 and 68 opposed to each other in this way, the glass substrate 30A can be prevented or suppressed from sliding in the plate surface direction.
 次に配管80の構成について説明する。各配管80は、図8に示すように、搬送方向に沿って延在する主管部80Aと、主管部80Aから分岐して左右方向に沿って延在する複数の分岐管部80Bと、を備えている。各配管80の主管部80Aは搬送装置の左右方向における一端側に位置しており、各配管80の分岐管部80Bは搬送装置の左右方向における一端側から他端側に至るまで伸びている。また、各配管80において、各分岐管部80Bの搬送方向における間隔は略等しいものとされる。各配管80における各分岐管部80Bには、搬送装置60によって搬送されるガラス基板30A上に洗浄液を噴射する複数のノズル70,72が搬送方向と直交する方向(Y軸方向)に直線状に並列した形で取り付けられている。複数のノズル70,72は、各分岐管部80Bにおいて略等間隔で間欠的に設けられており、各分岐管部80Bにおけるノズル70,72の数、及びノズル70,72の配置はいずれも等しいものとされる。なお、各配管80の主管部80Aには、図示しない供給管から洗浄液が供給されるようになっている。主管部80Aに供給された洗浄液は、各分岐管部80Bまで流れて各ノズル70,72から噴射される。 Next, the configuration of the piping 80 will be described. As shown in FIG. 8, each pipe 80 includes a main pipe portion 80A extending along the transport direction, and a plurality of branch pipe portions 80B branching from the main pipe portion 80A and extending along the left-right direction. ing. The main pipe portion 80A of each pipe 80 is located on one end side in the left-right direction of the transfer device, and the branch pipe portion 80B of each pipe 80 extends from one end side to the other end side in the left-right direction of the transfer device. Further, in each pipe 80, the intervals in the transport direction of the branch pipe portions 80B are substantially equal. In each branch pipe portion 80B of each pipe 80, a plurality of nozzles 70 and 72 for injecting the cleaning liquid onto the glass substrate 30A conveyed by the conveying device 60 are linearly formed in a direction perpendicular to the conveying direction (Y-axis direction). Installed in parallel. The plurality of nozzles 70 and 72 are intermittently provided at substantially equal intervals in each branch pipe portion 80B, and the number of nozzles 70 and 72 in each branch pipe portion 80B and the arrangement of the nozzles 70 and 72 are both equal. It is supposed to be. Note that the cleaning liquid is supplied to a main pipe portion 80A of each pipe 80 from a supply pipe (not shown). The cleaning liquid supplied to the main pipe portion 80A flows to each branch pipe portion 80B and is ejected from the nozzles 70 and 72.
 複数のノズル70,72の大部分は、搬送装置60によって搬送されるガラス基板30Aの板面に対して垂直に当たるように下方に向かって真っすぐに洗浄液を噴射する垂直ノズル(洗浄用ノズルの一例)70とされる。ここで、図9における鎖線、及び図10における一点鎖線は、各垂直ノズル70から噴射される洗浄液の噴射範囲を示している。図9及び図10に示すように、垂直ノズル70から噴射される洗浄液は、やや傾いた形で左右方向に拡がるように垂直ノズル70の噴射口からガラス基板30A側に向かって噴射される。また、図9及び図10に示すように、各垂直ノズル70から噴射される洗浄液は、その噴射範囲が左右方向の両側において隣り合う洗浄液の噴射範囲と重なり合うものとされる。このため、搬送装置60によって搬送されるガラス基板30Aは、垂直ノズル70が取り付けられた分岐管部80Bの直下を通過する際、分岐管部80Bの直下に位置するガラス基板30Aの板面の部位が幅方向の全域に亘って洗浄液に当たるようになっている。 Most of the plurality of nozzles 70 and 72 are vertical nozzles (an example of a cleaning nozzle) that sprays the cleaning liquid straight downward so as to be perpendicular to the plate surface of the glass substrate 30 </ b> A conveyed by the conveying device 60. 70. Here, the chain line in FIG. 9 and the alternate long and short dash line in FIG. 10 indicate the ejection range of the cleaning liquid ejected from each vertical nozzle 70. As shown in FIGS. 9 and 10, the cleaning liquid sprayed from the vertical nozzle 70 is sprayed from the spray nozzle of the vertical nozzle 70 toward the glass substrate 30 </ b> A so as to spread in the left-right direction with a slight inclination. Further, as shown in FIGS. 9 and 10, the cleaning liquid sprayed from each vertical nozzle 70 has a spray range that overlaps with the spray range of the adjacent cleaning liquid on both sides in the left-right direction. For this reason, when the glass substrate 30A conveyed by the conveying device 60 passes directly under the branch pipe portion 80B to which the vertical nozzle 70 is attached, the portion of the plate surface of the glass substrate 30A located directly under the branch pipe portion 80B. Is applied to the cleaning liquid over the entire width direction.
 一方、搬送方向の最も下流側に位置する分岐管部80Bに取り付けられた各ノズル70,72のうち、左右方向の一端側に位置する3つのノズル72と左右方向の他端側に位置する3つのノズル72は、搬送装置60によって搬送されるガラス基板30Aの板面に対して斜め方向から当たるように下方に向かって洗浄液を噴射する傾斜ノズル72とされる。ここで、図11における鎖線、及び図12における一点鎖線は、各垂直ノズル70及び各傾斜ノズル72から噴射される洗浄液の噴射範囲を示している。図9及び図10に示すように、傾斜ノズル72から噴射される洗浄液は、やや傾いた形で前後方向に拡がるように傾斜ノズル72の噴射口からガラス基板30A側に向かって噴射される。詳しくは、傾斜ノズル72では、洗浄液の噴射方向D1が、搬送されるガラス基板30Aの板面と直交する平面P1に対して傾けられている(図11及び図13参照)。これに対し上記垂直ノズル70は、洗浄液の噴射方向がこの平面P1に沿うものとされる。 On the other hand, among the nozzles 70 and 72 attached to the branch pipe portion 80B located on the most downstream side in the transport direction, three nozzles 72 located on one end side in the left-right direction and 3 located on the other end side in the left-right direction. The two nozzles 72 are inclined nozzles 72 that inject the cleaning liquid downward so as to hit the plate surface of the glass substrate 30 </ b> A conveyed by the conveying device 60 from an oblique direction. Here, the chain line in FIG. 11 and the alternate long and short dash line in FIG. 12 indicate the ejection range of the cleaning liquid ejected from each vertical nozzle 70 and each inclined nozzle 72. As shown in FIGS. 9 and 10, the cleaning liquid sprayed from the tilt nozzle 72 is sprayed from the spray port of the tilt nozzle 72 toward the glass substrate 30A so as to spread in the front-rear direction in a slightly tilted form. Specifically, in the inclined nozzle 72, the spray direction D1 of the cleaning liquid is inclined with respect to a plane P1 orthogonal to the plate surface of the glass substrate 30A being conveyed (see FIGS. 11 and 13). On the other hand, in the vertical nozzle 70, the spraying direction of the cleaning liquid is set along the plane P1.
 傾斜ノズル72の構成及び傾斜ノズル72による洗浄液の噴射態様についてさらに詳しく説明する。傾斜ノズル72は、図11及び図13に示すように、搬送方向の上流側にわずかに傾けられた垂直ノズル70の噴射口に、略クランク状に屈曲して伸びる延長ノズル72Aを取り付けた構成とされる。延長ノズル72Aは、その噴射口がガラス基板30Aの左右方向における両端部側に向けられた姿勢で取り付けられている。このため、傾斜ノズル72からガラス基板30A上に噴射される洗浄液は、ガラス基板30Aの左右方向における両端部側に向かうようになっている。詳しくは、図12において、図の右端側に位置する3つの傾斜ノズル72では、噴射される洗浄液がガラス基板30Aの右端部側に向かうように噴射方向が傾いており、図の左端側に位置する3つの傾斜ノズル72では、噴射される洗浄液がガラス基板30Aの左端部側に向かうように噴射方向が傾いている。また、傾斜ノズル72による洗浄液の噴射方向は、垂直ノズル70による洗浄液の噴射方向に比べて、搬送方向の上流側にわずかに傾いている(図7参照)。 The configuration of the inclined nozzle 72 and the manner of spraying the cleaning liquid by the inclined nozzle 72 will be described in more detail. As shown in FIGS. 11 and 13, the inclined nozzle 72 has a configuration in which an extension nozzle 72 </ b> A that is bent and extended in a substantially crank shape is attached to the injection port of the vertical nozzle 70 that is slightly inclined upstream in the transport direction. Is done. The extension nozzle 72A is attached in such a posture that its injection port is directed to both end portions in the left-right direction of the glass substrate 30A. For this reason, the cleaning liquid sprayed onto the glass substrate 30A from the inclined nozzle 72 is directed toward both end portions in the left-right direction of the glass substrate 30A. Specifically, in FIG. 12, in the three inclined nozzles 72 located on the right end side of the drawing, the jetting direction is inclined so that the cleaning liquid to be jetted is directed to the right end side of the glass substrate 30A, and the position is on the left end side of the drawing. In the three inclined nozzles 72, the injection direction is inclined so that the cleaning liquid to be injected is directed to the left end side of the glass substrate 30A. Further, the cleaning liquid ejection direction by the inclined nozzle 72 is slightly inclined to the upstream side in the transport direction as compared with the cleaning liquid ejection direction by the vertical nozzle 70 (see FIG. 7).
 各分岐管部80Bに取り付けられた傾斜ノズル72が上記のような構成とされることで、図14に模式的に示すように、搬送装置60によって搬送されるガラス基板30A上の塵や埃等の異物R1は、傾斜ノズル72から噴射される洗浄液によってガラス基板30Aの左右方向における両端部側から当該ガラス基板30Aの外側に流し落とされる(図14に示す矢印参照)。このため、ガラス基板30Aの左右方向における両端部側に洗浄液が滞留することが防止ないし抑制され、洗浄液によってガラス基板30A上から剥離された異物R1がガラス基板30A上に再び付着することが防止ないし抑制されるようになっている。 Since the inclined nozzle 72 attached to each branch pipe portion 80B has the above-described configuration, as schematically shown in FIG. 14, dust, dust, etc. on the glass substrate 30A conveyed by the conveying device 60 The foreign matter R1 is caused to flow down from the both end sides in the left-right direction of the glass substrate 30A to the outside of the glass substrate 30A by the cleaning liquid ejected from the inclined nozzle 72 (see the arrow shown in FIG. 14). For this reason, it is prevented or suppressed that the cleaning liquid stays at both end portions in the left-right direction of the glass substrate 30A, and the foreign matter R1 peeled off from the glass substrate 30A by the cleaning liquid is prevented from adhering again on the glass substrate 30A. It is supposed to be suppressed.
 ところで、洗浄装置50では、各ノズル70,72から噴射された洗浄液は回収され、図示しない循環装置により循環されて再び洗浄液として使用される。アレイ基板30の製造過程において、洗浄装置50が他の製造装置51~56による工程の後で使用されると、上記異物R1が混入した洗浄液がガラス基板30A上に噴射されることがある。このため、洗浄装置50が他の製造装置51~56による工程の後で使用される場合、ガラス基板30A上に洗浄液が滞留すると、洗浄液に混入した異物R1がガラス基板30A上に成膜された上記ゲート絶縁膜37や上記層間絶縁膜39に付着し、ゲート絶縁膜37や層間絶縁膜39の一部と共にガラス基板30Aから剥がれ、ゲート絶縁膜欠損又は層間絶縁膜欠損として検出されることがある。このような欠損が検出されたアレイ基板30は、不良品とされる。これに対し本実施形態では、上記のようにガラス基板30A上に洗浄液が滞留することが防止ないし抑制されるため、再利用される洗浄液に含まれる異物R1がガラス基板30A上のゲート絶縁膜37や層間絶縁膜39等に付着することが防止ないし抑制されるようになっている。 Incidentally, in the cleaning device 50, the cleaning liquid sprayed from the nozzles 70 and 72 is collected, circulated by a circulation device (not shown), and used again as the cleaning liquid. In the manufacturing process of the array substrate 30, when the cleaning device 50 is used after the steps by the other manufacturing devices 51 to 56, the cleaning liquid mixed with the foreign matter R1 may be sprayed onto the glass substrate 30A. For this reason, when the cleaning apparatus 50 is used after the steps of the other manufacturing apparatuses 51 to 56, if the cleaning liquid stays on the glass substrate 30A, the foreign matter R1 mixed in the cleaning liquid is formed on the glass substrate 30A. It may adhere to the gate insulating film 37 or the interlayer insulating film 39 and peel off from the glass substrate 30A together with a part of the gate insulating film 37 or the interlayer insulating film 39, and may be detected as a gate insulating film defect or an interlayer insulating film defect. . The array substrate 30 in which such a defect is detected is regarded as a defective product. On the other hand, in the present embodiment, since the cleaning liquid is prevented or suppressed from staying on the glass substrate 30A as described above, the foreign matter R1 contained in the reused cleaning liquid is prevented from flowing into the gate insulating film 37 on the glass substrate 30A. In addition, adhesion to the interlayer insulating film 39 or the like is prevented or suppressed.
 ここで図15のグラフに、本実施形態に係る洗浄装置50の適用前後において、ガラス基板30A上に成膜されたゲート絶縁膜37のゲート絶縁膜欠損、及びガラス基板30A上に成膜された層間絶縁膜39の層間絶縁膜欠損をそれぞれ検出した結果を示す。なお、図15のグラフにおける横軸は1枚のアレイ基板30当たりに発生したパターン欠陥(上記ゲート絶縁膜欠損及び上記層間絶縁膜欠損)が何箇所発生したのかを示しており、縦軸はパターン欠陥の発生数毎にその発生頻度を百分率(%)で示している。また、丸印を結んだ線は本実施形態に係る洗浄装置50の適用前を示しており、四角印を結んだ線は本実施形態に係る洗浄装置50の適用後を示している。図15のグラフに示すように、パターン欠陥の発生数が60を超えるものについては、本実施形態に係る洗浄装置50の適用前よりも適用後の方が大きく下回っている。従って、本実施形態の洗浄装置50を適用することにより、ガラス基板30Aの表面に洗浄液が滞留することが防止ないし抑制されており、ガラス基板30A上への異物R1の再付着によるパターン欠陥の発生数が低減されている。 Here, in the graph of FIG. 15, before and after the application of the cleaning apparatus 50 according to the present embodiment, the gate insulating film defect of the gate insulating film 37 formed on the glass substrate 30A and the film formed on the glass substrate 30A are formed. The result of having detected the interlayer insulation film defect | deletion of the interlayer insulation film 39 is shown, respectively. Note that the horizontal axis in the graph of FIG. 15 indicates how many pattern defects (the gate insulating film defect and the interlayer insulating film defect) generated per one array substrate 30 occur, and the vertical axis indicates the pattern. The frequency of occurrence of each defect is shown as a percentage (%). Further, the line connecting the circle marks indicates before application of the cleaning apparatus 50 according to the present embodiment, and the line connected with the square marks indicates after application of the cleaning apparatus 50 according to the present embodiment. As shown in the graph of FIG. 15, the number of occurrences of pattern defects exceeding 60 is much lower after application than before application of the cleaning apparatus 50 according to the present embodiment. Therefore, by applying the cleaning device 50 of this embodiment, the cleaning liquid is prevented or suppressed from staying on the surface of the glass substrate 30A, and pattern defects are generated due to the reattachment of the foreign matter R1 on the glass substrate 30A. The number has been reduced.
 以上説明したように本実施形態に係る洗浄装置50では、搬送方向の最も下流側に位置する分岐管部80Bに取り付けられた複数のノズル70,72のうち、左右方向の両端部側に配された計6つの傾斜ノズル72について、洗浄液の噴射方向が搬送されるガラス基板30Aの板面と直交する平面に対して傾けられている。これにより、これらの6つの傾斜ノズル72から、搬送されるガラス基板30Aの左右方向の両端部側に向かうようにガラス基板30A上に洗浄液が噴射される。このため、搬送されるガラス基板30A上に洗浄液が滞留したとしても、傾斜ノズル72から噴射される洗浄液によって、ガラス基板30A上に滞留した洗浄液が、ガラス基板30Aの左右方向の両端部からガラス基板30Aの外側に流し落とされる。その結果、ガラス基板30A上に滞留した洗浄液に含まれる異物R1がガラス基板30Aに再付着することを抑制することができる。 As described above, in the cleaning device 50 according to the present embodiment, among the plurality of nozzles 70 and 72 attached to the branch pipe portion 80B located on the most downstream side in the transport direction, the cleaning device 50 is disposed on both ends in the left-right direction. The total six inclined nozzles 72 are inclined with respect to a plane orthogonal to the plate surface of the glass substrate 30A to which the cleaning liquid is ejected. Accordingly, the cleaning liquid is sprayed from the six inclined nozzles 72 onto the glass substrate 30A so as to be directed to both end portions in the left-right direction of the glass substrate 30A being conveyed. For this reason, even if the cleaning liquid stays on the transported glass substrate 30A, the cleaning liquid stayed on the glass substrate 30A by the cleaning liquid sprayed from the inclined nozzle 72 is removed from both ends in the left-right direction of the glass substrate 30A. It is washed off to the outside of 30A. As a result, it is possible to suppress the foreign matter R1 contained in the cleaning liquid staying on the glass substrate 30A from reattaching to the glass substrate 30A.
 さらに、本実施形態に係る洗浄装置50において、各配管80に取り付けられる各ノズル70,72は、各配管80の分岐管部80Bに直線状に並列した形で配される。このため、洗浄装置50の製造過程において、複数のノズル70,72が直線状以外の形状(例えばV字型に屈曲した形状)に並列して配される構成と比べて簡単な工程で複数のノズル70,72を配することができる。 Furthermore, in the cleaning device 50 according to the present embodiment, the nozzles 70 and 72 attached to the pipes 80 are arranged in parallel with the branch pipe portions 80B of the pipes 80. For this reason, in the manufacturing process of the cleaning apparatus 50, a plurality of nozzles 70 and 72 are formed in a simple process compared to a configuration in which the plurality of nozzles 70 and 72 are arranged in parallel to a shape other than a straight shape (for example, a shape bent in a V shape). Nozzles 70 and 72 can be arranged.
 また本実施形態では、傾斜ノズル72が垂直ノズル70よりも搬送方向の下流側に配されており、垂直ノズル70による洗浄液の噴射方向が、搬送されるガラス基板30Aの板面と直交する平面P1に沿っている。このような構成とされていることで、垂直ノズル70からガラス基板30A上に噴射された洗浄液が上記平面P1に対して傾かない形でガラス基板30Aに当たることとなるので、搬送方向に沿って搬送されるガラス基板30Aを傾斜ノズル72の下方に至るまでの間に垂直ノズル70によって効果的に洗浄することができる。 In the present embodiment, the inclined nozzle 72 is arranged downstream of the vertical nozzle 70 in the transport direction, and the plane P1 in which the cleaning liquid ejecting direction by the vertical nozzle 70 is orthogonal to the plate surface of the glass substrate 30A to be transported. It is along. With such a configuration, the cleaning liquid sprayed from the vertical nozzle 70 onto the glass substrate 30A hits the glass substrate 30A without being inclined with respect to the plane P1, so that it is transported along the transport direction. The glass substrate 30 </ b> A to be formed can be effectively cleaned by the vertical nozzle 70 before reaching the lower side of the inclined nozzle 72.
 ところで本実施形態では、傾斜ノズル72が搬送方向の最も下流側に配されており、傾斜ノズル72からガラス基板30Aの板面に対して傾いた形で洗浄液が噴射されるので、搬送方向の下流側において傾斜ノズル72からの洗浄液がガラス基板30Aと搬送ローラ62との間に入り込み、ガラス基板30Aがその板面方向に滑る虞がある。この点、本実施形態では、搬送方向の下流側において、搬送ローラ62と上乗せローラ68との間にガラス基板30Aが挟み込まれ、搬送方向のさらに下流側に当該ガラス基板30Aが送り出されるため、ガラス基板30Aが搬送ローラ62上をその板面方向に滑ることが防止ないし抑制されるようになっている。 By the way, in this embodiment, the inclined nozzle 72 is arranged on the most downstream side in the transport direction, and the cleaning liquid is ejected from the tilt nozzle 72 so as to be inclined with respect to the plate surface of the glass substrate 30A. On the side, the cleaning liquid from the inclined nozzle 72 may enter between the glass substrate 30A and the transport roller 62, and the glass substrate 30A may slide in the plate surface direction. In this regard, in this embodiment, the glass substrate 30A is sandwiched between the transport roller 62 and the addition roller 68 on the downstream side in the transport direction, and the glass substrate 30A is sent out further downstream in the transport direction. The substrate 30A is prevented or suppressed from sliding on the transport roller 62 in the plate surface direction.
 <実施形態2>
 図16を参照して実施形態2を説明する。実施形態2は、傾斜ノズル72,173,174の噴射態様が実施形態1のものと異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。本実施形態の洗浄装置では、図16に示すように、実施形態1と同様に、搬送方向の最も下流側に位置する分岐管部80Bに取り付けられた複数のノズル70,72,173,174のうち、左右方向の一端側に位置する3つのノズル72,173,174と左右方向の他端側に位置する3つのノズル72,173,174がそれぞれ傾斜ノズル72,173,174とされる。このうち内側(分岐管部80Bの左右方向における中央側)にそれぞれ位置する2つの傾斜ノズル72は、実施形態1の傾斜ノズル72と同様のものとなっている。
<Embodiment 2>
The second embodiment will be described with reference to FIG. In the second embodiment, the injection mode of the inclined nozzles 72, 173 and 174 is different from that of the first embodiment. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted. In the cleaning apparatus of this embodiment, as shown in FIG. 16, as in Embodiment 1, a plurality of nozzles 70, 72, 173, 174 attached to the branch pipe portion 80 </ b> B located on the most downstream side in the transport direction are used. Among them, the three nozzles 72, 173, 174 located on one end side in the left-right direction and the three nozzles 72, 173, 174 located on the other end side in the left-right direction are respectively inclined nozzles 72, 173, 174. Of these, the two inclined nozzles 72 located on the inner side (the center side in the left-right direction of the branch pipe portion 80B) are the same as the inclined nozzles 72 of the first embodiment.
 一方、実施形態1と同様の傾斜ノズル72の外側(分岐管部80Bの左右方向における両端部側)にそれぞれ位置する2つの傾斜ノズル173は、その延長ノズル173Aがより外側に傾けられている。具体的には、これら2つの傾斜ノズル173は、洗浄液の噴射方向が、上述した平面P1に対して実施形態1と同様の傾斜ノズル72よりも外側にさらに略5°傾いた構成となっている。さらに、この2つの傾斜ノズル173の外側にそれぞれ位置する2つの傾斜ノズル174、即ち、分岐管部80Bの左右方向における両端にそれぞれ位置する2つの傾斜ノズル174は、その延長ノズル174Aがより外側に傾けられている。具体的には、これら2つの傾斜ノズル173は、洗浄液の噴射方向が、上述した平面P1に対して実施形態1と同様の傾斜ノズル72よりも外側にさらに略10°傾いた構成となっている。 On the other hand, as for the two inclined nozzles 173 respectively located outside the inclined nozzle 72 (both ends in the left-right direction of the branch pipe portion 80B) as in the first embodiment, the extension nozzle 173A is inclined further outward. Specifically, the two inclined nozzles 173 are configured such that the spraying direction of the cleaning liquid is further inclined by about 5 ° to the outer side than the inclined nozzle 72 similar to that of the first embodiment with respect to the plane P1 described above. . Furthermore, the two inclined nozzles 174 respectively positioned outside the two inclined nozzles 173, that is, the two inclined nozzles 174 respectively positioned at both ends in the left-right direction of the branch pipe portion 80B, have the extended nozzle 174A on the outer side. Tilted. Specifically, the two inclined nozzles 173 are configured such that the spraying direction of the cleaning liquid is further inclined by about 10 ° to the outer side than the inclined nozzle 72 similar to that of the first embodiment with respect to the plane P1 described above. .
 このように本実施形態では、分岐管部80Bの左右方向における両端部側に近づくにつれて、傾斜ノズル72,173,174による洗浄液の噴射方向の上記平面P1に対する傾き角度が大きくなるものとされる。ここで、搬送装置によって搬送されるガラス基板30A上では、ガラス基板30Aの左右方向における両端部側に近づくほど、洗浄液が滞留し易い。本実施形態では、各傾斜ノズル72,173,174が上記のような構成とされていることで、ガラス基板30A上のうち洗浄液が滞留し易い側に近づくほどガラス基板30A上に噴射される洗浄液の噴射方向の傾き角度が大きくなるので、ガラス基板30A上に滞留した洗浄液を、ガラス基板30Aの左右方向における両端部から当該ガラス基板30Aの外側に効果的に流し落とすことができる。 Thus, in this embodiment, the inclination angle with respect to the plane P1 in the spray direction of the cleaning liquid by the inclined nozzles 72, 173, and 174 becomes larger as approaching the both end portions in the left-right direction of the branch pipe portion 80B. Here, on the glass substrate 30 </ b> A transported by the transport device, the cleaning liquid tends to stay as it approaches the both end portions in the left-right direction of the glass substrate 30 </ b> A. In the present embodiment, each of the inclined nozzles 72, 173, and 174 is configured as described above, so that the cleaning liquid that is sprayed onto the glass substrate 30A as it approaches the side where the cleaning liquid tends to stay on the glass substrate 30A. Therefore, the cleaning liquid staying on the glass substrate 30A can be effectively poured from both ends of the glass substrate 30A in the left-right direction to the outside of the glass substrate 30A.
 <実施形態3>
 図17を参照して実施形態3を説明する。実施形態3は、傾斜ノズル72,275,276の噴射態様が実施形態1及び実施形態2のものと異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。本実施形態の洗浄装置では、図17に示すように、実施形態1及び実施形態2と同様に、搬送方向の最も下流側に位置する分岐管部80Bに取り付けられた複数のノズル70,72,275,276のうち、左右方向の一端側に位置する3つのノズル72,275,276と左右方向の他端側に位置する3つのノズル72,275,276がそれぞれ傾斜ノズル72,275,276とされる。このうち内側(分岐管部80Bの左右方向における中央側)にそれぞれ位置する2つの傾斜ノズル72は、実施形態1の傾斜ノズル72と同様のものとなっている。
<Embodiment 3>
The third embodiment will be described with reference to FIG. In the third embodiment, the injection modes of the inclined nozzles 72, 275, and 276 are different from those in the first and second embodiments. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted. In the cleaning apparatus of this embodiment, as shown in FIG. 17, as in Embodiments 1 and 2, a plurality of nozzles 70, 72, attached to the branch pipe portion 80 </ b> B located on the most downstream side in the transport direction. Among the nozzles 275 and 276, the three nozzles 72, 275 and 276 located on one end side in the left-right direction and the three nozzles 72, 275 and 276 located on the other end side in the left-right direction are inclined nozzles 72, 275 and 276, respectively. Is done. Of these, the two inclined nozzles 72 located on the inner side (the center side in the left-right direction of the branch pipe portion 80B) are the same as the inclined nozzles 72 of the first embodiment.
 一方、実施形態1と同様の傾斜ノズル72の外側にそれぞれ位置する2つの傾斜ノズル275は、その延長ノズル275Aから噴射される洗浄液の噴射力が、実施形態1と同様の傾斜ノズル72の噴射力よりも大きいものとされる。さらに、この2つの傾斜ノズル275の外側にそれぞれ位置する2つの傾斜ノズル275、即ち、分岐管部80Bの左右方向における両端にそれぞれ位置する2つの傾斜ノズル276は、その延長ノズル276Aから噴射される洗浄液の噴射力が、その内側にそれぞれ位置する上記傾斜ノズル275の噴射力よりも大きいものとされる。 On the other hand, the two inclined nozzles 275 located on the outer sides of the inclined nozzles 72 similar to those in the first embodiment have the same spraying force of the cleaning liquid sprayed from the extension nozzles 275A as that in the first embodiment. Larger than Further, the two inclined nozzles 275 positioned outside the two inclined nozzles 275, that is, the two inclined nozzles 276 respectively positioned at both ends in the left-right direction of the branch pipe portion 80B are ejected from the extension nozzle 276A. The spraying force of the cleaning liquid is larger than the spraying force of the inclined nozzle 275 located inside the cleaning liquid.
 このように本実施形態では、分岐管部80Bの左右方向における両端部側に近づくにつれて、傾斜ノズル72,275,276による洗浄液の噴射力が大きくなるものとされる。このような構成とされていることで、搬送されるガラス基板30A上のうち洗浄液が滞留し易い側(ガラス基板30Aの左右方向における両端部側)に近づくほどガラス基板30A上に噴射される洗浄液の噴射力が大きくなるので、ガラス基板30A上に滞留した洗浄液を、ガラス基板30Aの左右方向における両端部から当該ガラス基板30Aの外側に効果的に流し落とすことができる。 As described above, in the present embodiment, the cleaning liquid ejection force by the inclined nozzles 72, 275, and 276 is increased as approaching the both end portions in the left-right direction of the branch pipe portion 80 B. With such a configuration, the cleaning liquid sprayed onto the glass substrate 30A as it approaches the side on which the cleaning liquid is likely to stay (both ends in the left-right direction of the glass substrate 30A) on the transported glass substrate 30A. Therefore, the cleaning liquid staying on the glass substrate 30A can be effectively poured from the both ends in the left-right direction of the glass substrate 30A to the outside of the glass substrate 30A.
 上記の各実施形態の変形例を以下に列挙する。
(1)上記の各実施形態では、搬送方向の最も下流側に位置する分岐管部にのみ傾斜ノズルが取り付けられた構成を例示したが、傾斜ノズルが取り付けられる位置については限定されない。傾斜ノズルが搬送方向の上流側に配されてもよいし、傾斜ノズルが搬送方向の途中に配されてもよい。
The modifications of the above embodiments are listed below.
(1) In each of the above embodiments, the configuration in which the inclined nozzle is attached only to the branch pipe portion located on the most downstream side in the transport direction is exemplified, but the position where the inclined nozzle is attached is not limited. The inclined nozzle may be arranged on the upstream side in the conveyance direction, or the inclined nozzle may be arranged in the middle of the conveyance direction.
(2)上記の各実施形態では、洗浄装置が計6つの傾斜ノズルを備える構成を例示したが、傾斜ノズルの数については限定されない。 (2) In each of the above embodiments, the configuration in which the cleaning device includes a total of six inclined nozzles is illustrated, but the number of inclined nozzles is not limited.
(3)上記の各実施形態では、傾斜ノズルが垂直ノズルに延長ノズルを取り付けた構成とされた例を示したが、傾斜ノズルは直線状に並列した形で配されればよく、傾斜ノズルの構成及び噴射態様については限定されない。 (3) In each of the above-described embodiments, an example in which the inclined nozzle is configured by attaching the extension nozzle to the vertical nozzle is shown. However, the inclined nozzle may be arranged in a straight line, The configuration and the injection mode are not limited.
(4)上記の各実施形態では、洗浄装置の搬送装置によって搬送される板状体の一例としてガラス基板を例示したが、傾斜ノズルからの洗浄液が噴射される板状体はガラス基板に限定されない。 (4) In each of the above embodiments, the glass substrate is exemplified as an example of the plate-like body conveyed by the conveying device of the cleaning device. However, the plate-like body on which the cleaning liquid from the inclined nozzle is ejected is not limited to the glass substrate. .
 以上、本発明の各実施形態について詳細に説明したが、これらは例示に過ぎず、特許請求の範囲を限定するものではない。特許請求の範囲に記載の技術には、以上に例示した具体例を様々に変形、変更したものが含まれる。 As mentioned above, although each embodiment of this invention was described in detail, these are only illustrations and do not limit a claim. The technology described in the claims includes various modifications and changes of the specific examples illustrated above.
 10:液晶表示装置、11:液晶パネル、14:バックライト装置、20:カラーフィルタ基板、30:アレイ基板、30A:ガラス基板、37:ゲート絶縁膜、39:層間絶縁膜、50:洗浄装置、50A:洗浄槽、60:搬送装置、62:搬送ローラ、66:フレーム、68:上乗せローラ、70:垂直ノズル、72,173,174,275,276:傾斜ノズル、72A,173A,174A,275A,276A:延長ノズル、80:配管、80A:主管部、80B:分岐管部、D1:(傾斜ノズルからの洗浄液の)噴射方向、P1:(搬送されるガラス基板と直交する)平面、R1:異物 10: liquid crystal display device, 11: liquid crystal panel, 14: backlight device, 20: color filter substrate, 30: array substrate, 30A: glass substrate, 37: gate insulating film, 39: interlayer insulating film, 50: cleaning device, 50A: Cleaning tank, 60: Conveying device, 62: Conveying roller, 66: Frame, 68: Overhead roller, 70: Vertical nozzle, 72, 173, 174, 275, 276: Inclined nozzle, 72A, 173A, 174A, 275A, 276A: Extension nozzle, 80: Piping, 80A: Main pipe section, 80B: Branch pipe section, D1: Injection direction of cleaning liquid from the inclined nozzle, P1: Plane (perpendicular to the glass substrate being conveyed), R1: Foreign matter

Claims (5)

  1.  板状体をその板面が搬送方向に沿うように搬送する搬送装置と、
     前記板状体の板面に沿った方向のうち前記搬送方向と直交する方向に直線状に並列して配され、前記搬送装置により搬送される前記板状体上に洗浄液を噴射する複数のノズルであって、前記板状体上に噴射される前記洗浄液の少なくとも一部が前記板状体の前記直交する方向における両端部側に向かうように前記洗浄液を噴射する複数のノズルと、
     を備える洗浄装置。
    A transport device for transporting the plate-like body so that its plate surface is along the transport direction;
    A plurality of nozzles that are arranged in parallel in a straight line in a direction orthogonal to the transport direction among the directions along the plate surface of the plate-like body, and inject a cleaning liquid onto the plate-like body that is transported by the transport device And a plurality of nozzles for injecting the cleaning liquid so that at least a part of the cleaning liquid to be injected on the plate-shaped body is directed to both end portions in the orthogonal direction of the plate-shaped body;
    A cleaning device comprising:
  2.  前記複数のノズルのうち少なくとも2つのノズルの前記洗浄液の噴射方向が、前記板状体の板面と直交する平面に対して傾けられている、請求項1に記載の洗浄装置。 The cleaning apparatus according to claim 1, wherein a spraying direction of the cleaning liquid of at least two nozzles among the plurality of nozzles is inclined with respect to a plane orthogonal to a plate surface of the plate-like body.
  3.  前記洗浄液の噴射方向が傾けられたノズルは、前記板状体の前記直交する方向における両端部側に近づくにつれて、前記洗浄液の噴射方向の前記直交する平面に対する傾き角度が大きくなるものとされる、請求項2に記載の洗浄装置。 The nozzle inclined in the direction in which the cleaning liquid is sprayed has an inclination angle with respect to the orthogonal plane in the direction in which the cleaning liquid is sprayed as it approaches the both ends of the plate-like body in the orthogonal direction. The cleaning apparatus according to claim 2.
  4.  前記洗浄液の噴射方向が傾けられたノズルは、前記板状体の前記直交する方向における両端部側に近づくにつれて、前記洗浄液の噴射力が大きくなるものとされる、請求項2または請求項3に記載の洗浄装置。 The nozzle with the inclined spraying direction of the cleaning liquid increases the spraying force of the cleaning liquid as it approaches the both end sides in the orthogonal direction of the plate-like body. The cleaning device described.
  5.  前記洗浄液の噴射方向が前記平面に沿うものとされた複数の洗浄用ノズルをさらに備え、
     前記複数のノズルが前記複数の洗浄用ノズルよりも前記搬送方向の下流側に配されている、請求項2から請求項4のいずれか1項に記載の洗浄装置。
    A plurality of cleaning nozzles, wherein the cleaning liquid is sprayed along the plane;
    The cleaning apparatus according to any one of claims 2 to 4, wherein the plurality of nozzles are arranged downstream of the plurality of cleaning nozzles in the transport direction.
PCT/JP2015/070483 2014-07-24 2015-07-17 Cleaning device WO2016013501A1 (en)

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