WO2015194608A1 - Molding, molding die, and method for producing molding die - Google Patents
Molding, molding die, and method for producing molding die Download PDFInfo
- Publication number
- WO2015194608A1 WO2015194608A1 PCT/JP2015/067524 JP2015067524W WO2015194608A1 WO 2015194608 A1 WO2015194608 A1 WO 2015194608A1 JP 2015067524 W JP2015067524 W JP 2015067524W WO 2015194608 A1 WO2015194608 A1 WO 2015194608A1
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- WIPO (PCT)
- Prior art keywords
- decorative
- molding
- transfer
- mold
- mirror
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C3/00—Processes, not specifically provided for elsewhere, for producing ornamental structures
- B44C3/04—Modelling plastic materials, e.g. clay
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F7/00—Signs, name or number plates, letters, numerals, or symbols; Panels or boards
- G09F7/16—Letters, numerals, or other symbols adapted for permanent fixing to a support
Definitions
- the present invention relates to a molded product that is formed of a transparent material and has a decorative portion such as a character, pattern, or pattern on its surface, a molding die for manufacturing the molded product, and a method for manufacturing the molding die.
- a decorative transfer part with the desired decoration part reversed is used. It is necessary to provide the mold. Here, the flatter the surface roughness of the mold, the higher the transparency of the molded product to be molded. Therefore, it is necessary to finish the entire transfer surface of the mold to a mirror surface. For example, when a concave structure having a decorative portion on the surface of a resin molded product is processed by laser engraving, the surface roughness of the processed surface is deteriorated and becomes cloudy.
- a character, a pattern, a pattern, or the like formed with ink is printed on a mold, and the unevenness of the ink is transferred to an acrylic resin or the like, thereby forming a molded product.
- the decorative part is formed on the surface of the surface without clouding.
- the melted molding material is poured into a molding die, and after the decorative transfer portion of the molding die is transferred, the molding material is cured.
- the decorative transfer part is provided on the transfer surface of the mold, the molding material cannot interfere freely with the mold at the decorative transfer part and cannot be shrunk freely. concentrate. This stress causes a problem that the molded material after curing cannot be released from the mold or that the decorative part may be chipped at the time of release.
- chipping due to this stress tends to be a problem.
- a taper is provided on the decorative transfer part of the mold to make it easy to release, but when the decoration is small, the taper also makes the decoration small and the visibility deteriorates.
- the decorative part can be formed by using the unevenness of the ink so that white turbidity does not occur in the production method described in Patent Document 1, but the ink is printed on a film-like printing substrate, or the printing substrate is formed after molding The trouble of peeling off from the acrylic resin occurs. Further, Patent Document 1 does not describe a problem related to the lack of the decorative portion.
- the object of the present invention is to provide a molded product that is free from cloudiness and chipping even when a decorative portion such as a character, pattern, or pattern is provided on the surface of a transparent material.
- an object of the present invention is to provide a mold for manufacturing the above-mentioned molded product and a method for manufacturing the mold.
- the molded product according to the present invention has a macroscopically mirror-shaped molding surface in a predetermined region, and has a concave or convex shape in a local region on the molding surface within the predetermined region.
- the amount of the step of the decorative portion is smaller than half of the uneven component taking into account the symmetrical shape component from the molding surface.
- the macroscopic shape means that the surface is uneven when viewed microscopically, but is specular when the entire predetermined region is observed.
- the symmetrical shape component means an approximate curve having fine irregularities in the cross section in the predetermined region.
- the level difference of the decorative portion is minute when viewed from the entire molding surface, and the main component of the irregularities on the molding surface is a mirror-like irregular component, that is, a swell component. Therefore, the stress at the time of curing shrinkage is distributed over the entire molding surface and does not concentrate on a specific portion, and the molding material can be released smoothly. Thereby, even if it provides a decoration part in a transparent material, it becomes a molded product without cloudiness and a chip. In particular, even when the molding material is a brittle material such as glass, the decorative portion is not chipped, and the edge of the decorative portion stands, so that even if the step amount of the decorative portion is small, it can be clearly recognized.
- the following conditional expression is satisfied when the step of the decorative portion is ⁇ and the PV value of the surface shape of the molding surface is A1 in the molded product.
- the step amount of the decorative portion is 1 ⁇ m or less. In this case, it is possible to reliably prevent the chipping from occurring at the step portion that forms the contour of the decorative portion.
- the molded product is formed of glass.
- the mold according to the present invention has a macroscopic mirror-like transfer surface in a predetermined region, and has a concave or convex shape in a local region on the transfer surface within the predetermined region.
- the amount of the step of the decorative transfer portion is smaller than half of the uneven component taking into account the symmetrical shape component from the transfer surface.
- the step amount of the decorative transfer portion is minute when viewed from the entire transfer surface, and the main component of the unevenness of the transfer surface is a mirror-like uneven component. Therefore, the stress at the time of curing shrinkage is dispersed over the entire molding surface of the molded product and does not concentrate on a specific portion, and the molding material can be released smoothly.
- the following conditional expression is satisfied when the step of the decorative transfer portion is ⁇ and the PV value of the surface shape of the transfer surface is A1 in the mold.
- the transfer surface has a release treatment layer.
- the release treatment layer is peeled and re-formed, a molding die corresponding to the shape of the decorative portion can be obtained with one base material, and the cost can be reduced.
- the thickness of the release treatment layer is larger than the step amount of the decorative transfer portion.
- the base material of the mold after the release treatment layer is peeled can be in a state where there is no decoration transfer portion.
- a manufacturing method of a mold according to the present invention includes a mirror surface processing step for macroscopically processing a predetermined region of a transfer surface of the mold into a mirror surface, and a transfer in the predetermined region after the mirror surface processing step.
- a mask forming step for forming a mask pattern corresponding to the decoration transfer portion on the surface; and a decoration processing step for etching the exposed portion of the mask pattern by dry etching to form the decoration transfer portion.
- the decorative portion transfer portion can process a surface with a flat surface roughness, and has a mirror surface property equal to or higher than the mirror surface property obtained in the mirror surface processing step. Obtainable. Thereby, the mirror surface state can be maintained over the entire transfer surface.
- a gas cluster ion beam is used in dry etching in the above-described mold manufacturing method.
- a minute processing amount of 1 ⁇ m or less can be aimed at with high accuracy depending on the irradiation time of the gas cluster ion beam.
- Another aspect of the present invention includes a layer forming step of forming a release treatment layer on the mirror-like lower ground before the mask forming step after the mirror finishing step.
- the decorative transfer portion can be formed on the release treatment layer.
- the transfer surface is mirror-finished by mechanical polishing in the mirror-finishing step.
- FIG. 1A is a conceptual perspective view for explaining a molded product according to the first embodiment of the present invention
- FIG. 1B is a conceptual cross-sectional view of the molded product shown in FIG. 1A. It is an expanded sectional view explaining the shaping
- FIG. 3A is a conceptual diagram for explaining the surface shape of the molded article in a specific cross section
- FIG. 3B is a conceptual diagram for explaining the surface shape of FIG. 3A excluding the spherical component
- FIG. 4A is a cross-sectional view illustrating the shape characteristics of the molded product
- FIG. 4B is a cross-sectional view of a transfer surface for molding the molded product shown in FIG. 4A.
- 5A and 5B are diagrams illustrating a molding apparatus used for manufacturing a molded product according to the first embodiment. It is a figure explaining the etching apparatus used for manufacture of the shaping
- the molded product 10 is a transparent or light transmissive member formed by press molding of glass or the like.
- the molded product 10 is a plate-shaped member having a rectangular outline, as shown in FIG. 1B, the center is thick in a specific direction along the cross section, and has a cylindrical or bowl-shaped outer shape.
- region 10n is a cylindrical surface
- the lower surface 10b and the side surface 10c of the molded product 10 are flat surfaces.
- the upper surface 10a and the lower surface 10b are mirror-shaped molding surfaces as they are molded.
- the side surface 10c a mirror-like molding surface at the time of molding can be left, but a polished glass-like process can also be performed.
- the entire upper surface 10a is a mirror surface as the predetermined region, but the region including the decorative portion 10d described later of the upper surface 10a may be a mirror surface.
- the outer edge of the molded product 10 The vicinity need not be mirror-like.
- a decorative portion 10d is formed as a relief-shaped projection pattern from a local region of the cylindrical surface region 10n.
- the decorative portion 10d is a three-dimensional structural portion representing characters, patterns, designs, etc., and has a substantially uniform thickness, for example.
- the thickness or level difference of the decorative portion 10d is, for example, several ⁇ m or less, and preferably 1 ⁇ m or less.
- the thickness of the molded product 10 is about several millimeters.
- the molded article 10 can be used as, for example, a cover glass or other decorative part or decorative article.
- the decorative portion 10d formed on the upper surface 10a of the molded product 10 is extremely low, such as several ⁇ m or less, but is observed as a pattern that is lightly raised by adjusting the angle of light applied to the molded product 10 and the observation direction. For this reason, it is desirable that the molded product 10 is a colorless or colored transparent member.
- the decorative portion 10d provided on the upper surface 10a of the molded product 10 has an edged shape.
- the decorative portion 10d has a side surface 11a corresponding to the contour and a flat surface 11b surrounded by the side surface 11a.
- the side surface 11a rises substantially vertically from the mirror-like peripheral region 10n. If the side surface 11a does not rise substantially perpendicularly from the surrounding area 10n, the step 11a may not be visually recognized due to a small level difference. Further, it can be said that the larger the step amount, the easier the visual recognition of the decorative portion 10d. On the other hand, if the step amount on the side surface 11a is large, press molding becomes difficult.
- the portion that rises substantially vertically has a strong tendency to mesh with a mold (not shown), and when there is a relatively large difference between the thermal expansion coefficient of the mold and the thermal expansion coefficient of the molded article 10, Stress concentrates on the edge of the side surface 11a and chipping is likely to occur, and release is not easy. Therefore, it becomes difficult to manufacture a good product of the molded product 10 or the yield is lowered.
- the setting of the step of the decorative portion 10d has a situation that it is not easy to balance appropriate visibility and ease of manufacture.
- the surfaces 10a and 10b of the molded product 10 are desirably curved surfaces or flat surfaces as designed, but have a slight swell due to the processing accuracy of the mold.
- Such swell is usually set to be extremely small when the molded article 10 is an optical component or the like, but depending on the application, there is a possibility that the allowable value can be increased to some extent. If the swell is sufficiently larger than the fine step of the molded product 10, it becomes difficult for stress to concentrate on the step during molding, the mold product 10 can be easily released, and the decorative portion 10 d of the molded product 10 is not chipped. It is thought that it becomes difficult to occur.
- the inventor of the present application pays attention to this point and devised a molding method and a mold that make it difficult to form a chip during manufacture while making the decorative portion 10d of the molded product 10 easy to see.
- the mold 40 has an upper mold 41 and a lower mold 42.
- a transfer surface 41 a is formed on the upper mold 41, and a transfer surface 42 a is also formed on the lower mold 42.
- the transfer surface 41 a of the upper mold 41 is processed into a mirror surface and has symmetry as a whole, but has a decorative transfer portion 41 d corresponding to the decorative portion 10 d of the molded product 10.
- the transfer surface 42a of the lower mold 42 is processed into a mirror surface and has symmetry as a whole.
- the molten glass GM is filled in a pressed state.
- the molten glass GM is molded into a flat molded product 10, and a decorative portion 10 d corresponding to the decorative transfer portion 41 d is formed on the molded product 10.
- a gap is provided between the upper mold 41 and the lower mold 42. This is because the molded article 10 having the same thickness is molded even if the volume of the molten glass GM varies.
- FIG. 3A corresponds to FIG. 1B and shows the shape of the upper surface 10a of the molded product 10 in an exaggerated manner.
- the upper surface 10a is a cylindrical surface and should be an arc 31 as shown by a dotted line, but actually has a shape having an asymmetric undulation U as shown by a solid line.
- the arc 31 is an approximate R that is a symmetric shape component, and is obtained by fitting the upper surface 10a by, for example, the least square method.
- FIG. 3B is a diagram showing the shape of the upper surface 10a as a deviation from the arc 31 that is an approximate R.
- FIG. 3C is a further enlarged view of FIG. 3B in the vertical direction, in which the undulation U of the upper surface 10a is exaggerated.
- the decorative portion 10d formed on the upper surface 10a protrudes from the surrounding region 10n so as to overlap the undulation U of the upper surface 10a.
- the PV (Peak to Valley) value of the undulation component of the upper surface 10 a is larger than the step amount of the decorative portion 10 d on the upper surface 10 a, that is, the decorative uneven step ⁇ . Since it is difficult for stress to concentrate on the step of the portion 10d, the decorative portion 10d can be prevented from being chipped, the releasability of the molded product 10 can be ensured, and even a fragile material such as glass is formed on the outer periphery of the decorative portion 10d. Chipping is difficult to occur.
- an appropriate range of the decorative unevenness step ⁇ formed on the upper surface 10a of the molded product 10 or the transfer surface 41a of the upper mold 41 will be considered.
- the decorative unevenness ⁇ is smaller than the PV value of the swell component formed on the upper surface 10a of the molded product 10 or the transfer surface 41a of the upper mold 41, the decorative portion 10d is less likely to be chipped.
- the PV value of the surface shape is used instead of the PV value of the swell component.
- the symmetric shape component means an approximate curve having fine unevenness in a cross section in a predetermined region, and is the same as the approximation R described in FIGS. 3A and 3B.
- the decorative unevenness ⁇ formed on the upper surface 10a of the molded product 10 is surely smaller than the PV value of the swell component formed on the upper surface 10a of the molded product 10,
- the mold releasability of the molded product 10 can be ensured at the time of manufacturing the molded product 10, and chipping can be prevented from occurring on the outer periphery of the decorative portion 10d.
- a molding apparatus 100 incorporating the molding die 40 shown in FIG. 2 is an apparatus for pressure molding that directly melts and presses glass as a raw material.
- the molding apparatus 100 includes a control drive device 100a for causing the mold device 60 to perform movement, opening and closing operations, and the like, and a glass droplet forming device 100b ( (See FIG. 5B).
- the mold apparatus 60 includes a first mold 61 on the fixed side and a second mold 62 on the movable side.
- the first molding die 61 has a portion corresponding to the lower die 42 of the molding die 40 shown in FIG. 4 at the tip thereof, and the second molding die 62 corresponds to the upper die 41 of the molding die 40 at the tip thereof. It has a part to do.
- the first molding die 61 is maintained in a fixed state, and the second molding die 62 moves so as to face the first molding die 61 so that the molds are closed so that the two molds 61 and 62 are brought into contact with each other. Done.
- the first mold 61 will be described with reference to FIG. 5A.
- molding die 61 is provided with the lower mold
- the lower mold 42 is cylindrical and has a transfer surface 42a.
- the heater portion 61c provided at the base of the support portion 61b of the first mold 61 incorporates an electric heater 61h for heating the lower die 42 appropriately.
- molding die 62 is provided with the upper mold
- the upper mold 41 of the second mold 62 is cylindrical and has a transfer surface 41a.
- the heater 62c provided at the base of the support 62b of the second mold 62 incorporates an electric heater 62h for appropriately heating the upper mold 41.
- the transfer surface 41a of the second molding die 62 and the transfer surface 42a of the first molding die 61 are arranged coaxially at the time of pressure molding. In addition, an appropriate positional relationship is maintained, such as being separated from each other by a predetermined interval during cooling.
- the control drive device 100a controls the supply of electric power to the electric heaters 61h and 62h and opens and closes the first and second molding dies 61 and 62h for molding the molded product 10 by the mold device 60 or the molding die 40.
- the entire molding apparatus 100 is controlled.
- the second mold 62 driven by the control drive device 100a can move in the horizontal AB direction and can move in the vertical CD direction.
- the second mold 62 is moved to a position above the first mold 61 so that the axes CX1 and CX2 of both molds 61 and 62 coincide with each other.
- the upper transfer surface 41a and the lower transfer surface 42a are made to coincide with each other, and the second mold 62 is lowered and pressed against the first mold 61 with a predetermined force.
- the glass droplet forming apparatus 100 b includes a raw material supply unit 91.
- the raw material supply unit 91 is heated by a heater (not shown) so that the glass in the raw material supply unit 91 is in a molten state, and the molten state of the glass dropped from the nozzle 91a is maintained.
- the raw material supply unit 91 is controlled to move and to drop the molten glass G by the control drive device 100a.
- the raw material supply unit 91 stores molten glass G melted in a crucible (not shown) and the like, and the molten glass G is droplet-shaped molten glass G by discharging the molten glass G from the nozzle 91a at a predetermined timing. This is the portion where the droplet GD is dropped.
- the molten glass droplet GD dropped from the nozzle 91 a of the raw material supply unit 91 is received by the transfer surface 42 a of the lower mold 42.
- the molten glass droplet GD spreads on the transfer surface 42 a of the lower mold 42 provided in the first mold 61 and is cooled.
- the upper mold 41 provided in the second mold 62 is relatively placed on the molten glass on the lower mold 42. To be pressed (molding process).
- the second molding die 62 is moved to a position above the first molding die 61 so that the axes CX1 and CX2 of both the molds 61 and 62 coincide with each other, and as a result, the upper transfer surface 41a and the lower transfer surface 42a. And pressed in a state of facing each other.
- the second mold 62 is heated to a temperature comparable to that of the first mold 61. Thereafter, the temperature of the fused glass between the upper and lower molds 41 and 42 gradually decreases, whereby the molded product 10 as a decorative panel having the upper and lower surfaces 10a and 10b is formed.
- the pressurization of the first molding die 61 and the second molding die 62 is released, and the second molding die 62 is lifted to release the molded product 10 and out of the mold. Take out to (extraction process).
- the upper die 41 is formed into a desired shape by cutting or the like, and has a base surface 41j formed in a mirror shape on the front side.
- the lower ground 41j of the upper mold 41 has a symmetrical shape macroscopically, and is specifically cut into a cylindrical concave surface.
- the base surface 41j has a swell as shown in FIG. 4B microscopically.
- the PV value (vibration width) of such a swell component has a value corresponding to the depth of the decorative transfer portion 41d, and is specifically several ⁇ m or more (for example, 8 ⁇ m).
- the undulation of the lower ground 41j can be forcibly provided by machining control, but may be inevitably generated as machining accuracy.
- the lower ground surface 41j finally becomes a transfer surface 41a having a mirror-like entire surface as a result of finishing processing (mirror processing step).
- macroscopically means that the surface is uneven when viewed finely, but is specular when the entire predetermined region is observed.
- type 41 ie, a mirror surface
- a shallow concave portion having a desired contour is formed on the lower ground 41j of the upper die 41 to form a decorative transfer portion 41d.
- dry etching specifically, a gas cluster ion beam
- Forming a decorative transfer portion 41d having a desired pattern on the transfer surface 41a by forming a mask pattern on the transfer surface 41a after the mirror finishing step (mask forming step) and etching the exposed portion of the mask pattern (Decoration process).
- FIG. 6 shows an example of an etching apparatus for forming the decorative transfer portion 41d on the lower ground 41j or the transfer surface 41a of the upper mold 41.
- the etching apparatus 300 irradiates a gas cluster ion beam (GCIB) for etching the surface of the workpiece WA to be the upper mold 41, and includes an apparatus main body 70, a support apparatus driving unit 81, and a control apparatus. 82.
- GCIB gas cluster ion beam
- the apparatus main body 70 is an apparatus that performs polishing by etching using vacuum technology, and includes a source chamber 71a, an ion chamber 71b, and a process chamber 71c. Each chamber 71a, 71b, 71c is accompanied by an exhaust device 72 including a vacuum pump.
- the source chamber 71a is a part that injects gas into vacuum.
- Gas supplied from the nozzle 73b extending from the gas source 73a is, for example argon gas, oxygen gas, nitrogen gas, SF 6 gas, other helium gas, a carbon dioxide gas of a compound, mixing two or more gases Is also possible.
- a skimmer 73c that partitions the source chamber 71a and the ion chamber 71b has an opening, and selectively passes through a gas cluster on the center side of the high-pressure gas ejected from the nozzle 73b to form a beam. That is, the gas cluster beam B1 is emitted from the source chamber 71a.
- the ion chamber 71b is a part that turns the gas cluster beam B1 into a gas cluster ion beam B2 for polishing.
- the upstream ionization part 74a has a filament.
- the downstream lens unit 74c converts the charged particle beam that has passed through the acceleration unit 74b into a beam that travels substantially parallel along the irradiation axis AX.
- a collimated gas cluster ion beam B2 having a relatively large diameter is emitted from the internal aperture 74f of the ion chamber 71b.
- the internal aperture 74f also has a shutter function, and can turn on / off the gas cluster ion beam B2 at a desired timing.
- Particles constituting the gas cluster ion beam B2 are broken by collision with the workpiece WA by irradiating the workpiece WA, which will be described later, and at that time, the cluster constituent atoms or molecules and the workpiece constituent atoms or molecules And the movement in the horizontal direction becomes significant with respect to the surface of the workpiece WA. Thereby, the protrusions on the surface of the workpiece WA are mainly shaved, and flat ultra-precision polishing at the atomic size becomes possible.
- the process chamber 71c is a part that performs a precision polishing process in the order of submicron or nanometer by colliding the gas cluster ion beam B2 against the workpiece WA, and includes a support device 75.
- the support device 75 includes a stage 75a, supports the workpiece WA on the stage 75a, and adjusts the posture of the workpiece WA with respect to the gas cluster ion beam B2 to a desired state.
- the workpiece WA corresponds to the state before processing the upper mold 41 of the mold 40, that is, before the decoration transfer portion 41d is formed on the transfer surface 41a, and the remaining portion excluding the portion to be the decoration transfer portion 41d.
- a mask MA is formed.
- the control device 82 comprehensively controls the operation of the device main body 70. That is, the control device 82 operates the device main body 70 as appropriate to etch the surface of the workpiece WA to form a recess having a desired depth. This recess corresponds to a decorative transfer portion 41d to be formed on the transfer surface 41a of the upper mold 41.
- the control device 82 directly or indirectly monitors and controls operation states of the gas source 73a, the ionization unit 74a, the acceleration unit 74b, the lens unit 74c, the exhaust device 72, and the like.
- the workpiece WA is fixed on the stage 75a.
- the workpiece WA is an upper mold 41 on which a base surface 41j is formed, and a mirror-like lower ground 41j to be the transfer surface 41a is locally covered with a mask MA.
- the mask MA is formed of a resist or the like and has an opening TH at a position corresponding to the decoration transfer portion 41d.
- the base surface 41j is etched at the opening TH, and the decorative transfer portion 41d can be formed as a recess.
- the depth of the decorative transfer portion 41d is several ⁇ m or less, preferably 1 ⁇ m or less as described above.
- the gas cluster ion beam is suitable for this step because a minute processing amount of 1 ⁇ m or less can be targeted with high accuracy by adjusting the irradiation time or the like.
- a mirror surface can be formed on the decorative transfer portion 41d. That is, the processing roughness by GCIB can be equal to or higher than the polished surface (mirror surface), so that the bottom surface of the decorative transfer portion 41d is a mirror surface.
- the lower ground 41j of the upper mold 41 is ground, smoothness may not be so good.
- the entire transfer surface 41a can be lightly etched with GCIB, and the mirror surface property of the transfer surface 41a can be improved.
- the stepped amount of the decorative portion 10d is minute when viewed from the entire upper surface 10a that is the molding surface, and the main component of the unevenness of the upper surface 10a is a specular uneven component that covers the entire upper surface 10a. Or it becomes a wave
- molded product or the like of the second embodiment is a partial modification of the molded product or the like of the first embodiment, and matters not specifically described are the same as those of the first embodiment.
- FIG. 7 is a diagram for explaining a mold for molding the molded product of the second embodiment, and is a partial modification of FIG. 4B.
- the upper mold 41 is provided with a release treatment layer 41q on the lower ground 141j of the base material 41p.
- a decorative transfer portion 41d is formed on the base surface 41j, which is the surface of the release treatment layer 41q, by dry etching or the like as in the first embodiment. That is, the workpiece WA is set on the stage 75a using the etching apparatus 300 shown in FIG.
- the workpiece WA corresponds to the state in which the release processing layer 41q is formed on the base material 41p of the upper mold 41, and the mask MA is formed on the remaining portion excluding the portion to be the decoration transfer portion 41d. It has become.
- the release treatment layer 41q is, for example, any metal of Cr, Ti, and Al or a compound containing them (for example, TiO 2 , Cr 2 O 3 , TiN, TiAlN), or any of Au, Pt, Ir, and Rh. It is a layer formed of such a noble metal or an alloy containing them (for example, Pt—Ir alloy), and is formed by a chemical or physical film forming method (for example, coating or plating) (layer forming step). The layer forming process is performed after the mirror finishing process described in the first embodiment and before the mask forming process.
- the thickness t of the release treatment layer 41q is larger than the decorative unevenness step ⁇ of the decorative transfer portion 41d. t> ⁇ (5) It has become.
- the thickness t of the release treatment layer 41q is 1 ⁇ m or more, preferably several ⁇ m or more.
- the swell component of the release treatment layer 41q is substantially equal to the lower ground surface 141j of the base material 41p.
- the decoration transfer portion 41d can be easily changed. That is, when the mold release layer 41q is removed by wet etching or the like, the lower ground surface 141j of the base material 41p is exposed, and the base surface 141j has a predetermined undulation.
- the decorative transfer portion 41d having a different pattern is formed by dry etching or the like, a plurality of types of decorative transfer portions 41d can be easily provided on one base material 41p, and cost reduction can be achieved.
- the mold release process layer 41q can also be peeled when this deteriorates. In this case, the life of the upper mold 41 can be made relatively long.
- the entire transfer surface 41a which is the surface of the release treatment layer 41q, can be lightly etched with GCIB, and the mirror surface property of the transfer surface 41a can be improved. it can.
- the upper surface 10a of the molded product 10 is not limited to a cylindrical surface, but may be a flat surface, a spherical surface, a paraboloid, or the like. In this case, a deviation from an ideal surface such as a plane, a spherical surface, or a paraboloid is considered as a swell component.
- the decorative transfer portion 41d is formed only on the upper surface 10a of the molded product 10 has been described. However, by processing the lower mold 42 in the same manner as the upper mold 41, the same pattern or another pattern is formed on the lower surface 10b. The decorative transfer portion 41d can be formed.
- the mask MA for forming the decorative transfer portion 41d on the upper die 41 by etching is not limited to the resist that coats the base surface 41j, but is a metal plate that is arranged away from the upper die 41. May be.
- the decoration transfer portion 41d corresponding to the opening pattern formed on the metal plate can be formed.
- the molded article 10 was formed with glass, you may form with resin.
- the decorative portion 10d is convex, but may be concave.
- the decorative transfer portion 41d of the mold 40 has a convex shape corresponding to the shape of the decorative portion 10d.
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- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
This molding (10) has a top surface (10a) which is a macroscopically mirror-surface-shaped molding surface, a localized area on the top surface (10a) has a decorative part (10d) formed by a concavity, the amount of the height level difference in the decorative part (10d) is less than half of a concave-convex component including a shape component that is symmetric from the top surface (10a), and the stress of setting shrinkage when the molding (10) is molded is therefore dispersed through the entire top surface (10a) without concentrating in a specific portion, and because glass as the molding material is smoothly released from the die, a molding (10) free of cloudiness and cracks can be obtained even if the decorative part (10d) is provided to a transparent material.
Description
本発明は、透明な材料で形成され表面に文字、模様、図柄等の装飾部を有する成形品、当該成形品を製造するための成形型、及び当該成形型の製造方法に関する。
The present invention relates to a molded product that is formed of a transparent material and has a decorative portion such as a character, pattern, or pattern on its surface, a molding die for manufacturing the molded product, and a method for manufacturing the molding die.
装飾パネルとして、透明な材料の表面に文字、模様、図柄等を表した凹凸(装飾部)を有するものをモールド法にて製造する場合、所望の装飾部の形状を反転させた装飾転写部を成形型に設ける必要がある。ここで、成形型の表面粗さが平坦なほど、成形される成形品の透明性が高くなるため、成形型の転写面全域を鏡面に仕上げる必要がある。例えば、レーザー彫刻によって樹脂成形品の表面に装飾部を有する凹構造を加工した場合、加工面の表面粗さが悪くなり、白濁してしまう。しかし、特許文献1に記載の装飾パネルの製造方法では、成形型上にインクによって形成された文字、模様、図柄等を印刷し、そのインクの凹凸をアクリル樹脂等に転写させることで、成形品の表面に装飾部を白濁させることなく形成している。
When manufacturing a decorative panel with irregularities (decorations) representing characters, patterns, designs, etc. on the surface of a transparent material, a decorative transfer part with the desired decoration part reversed is used. It is necessary to provide the mold. Here, the flatter the surface roughness of the mold, the higher the transparency of the molded product to be molded. Therefore, it is necessary to finish the entire transfer surface of the mold to a mirror surface. For example, when a concave structure having a decorative portion on the surface of a resin molded product is processed by laser engraving, the surface roughness of the processed surface is deteriorated and becomes cloudy. However, in the method for manufacturing a decorative panel described in Patent Document 1, a character, a pattern, a pattern, or the like formed with ink is printed on a mold, and the unevenness of the ink is transferred to an acrylic resin or the like, thereby forming a molded product. The decorative part is formed on the surface of the surface without clouding.
モールド成形では、溶けた成形材を成形型に流し込み、成形型の装飾転写部を転写した後、成形材が硬化するという現象が起こる。しかし、成形型の転写面に装飾転写部が設けられていると、成形材は装飾転写部で成形型と干渉して自由に収縮することができず、硬化収縮時の応力が装飾転写部に集中する。この応力によって硬化後の成形材が成形型から離型できなくなる場合や、離型時に装飾部に欠けが発生する場合があり問題となる。ガラスのような脆く欠けやすい成形材を用いるときに、この応力による欠けが問題となりやすい。欠けが発生しないように、成形型の装飾転写部にテーパーを設けて離型しやすい形状にすることが行われているが、装飾が小さい場合、テーパーによって装飾も小さくなり視認性が悪くなる場合がある。特許文献1に記載の製造方法で白濁がおきないようにインクの凸凹を用いて装飾部を形成することができるが、インクをフィルム状の印刷基材に印刷したり、成形後に印刷基材をアクリル樹脂から引きはがす手間が発生してしまう。また、特許文献1には、装飾部の欠けに関する課題について記載されていない。
In mold molding, the melted molding material is poured into a molding die, and after the decorative transfer portion of the molding die is transferred, the molding material is cured. However, if the decorative transfer part is provided on the transfer surface of the mold, the molding material cannot interfere freely with the mold at the decorative transfer part and cannot be shrunk freely. concentrate. This stress causes a problem that the molded material after curing cannot be released from the mold or that the decorative part may be chipped at the time of release. When a molding material such as glass that is brittle and easily chipped is used, chipping due to this stress tends to be a problem. In order to prevent chipping, a taper is provided on the decorative transfer part of the mold to make it easy to release, but when the decoration is small, the taper also makes the decoration small and the visibility deteriorates. There is. The decorative part can be formed by using the unevenness of the ink so that white turbidity does not occur in the production method described in Patent Document 1, but the ink is printed on a film-like printing substrate, or the printing substrate is formed after molding The trouble of peeling off from the acrylic resin occurs. Further, Patent Document 1 does not describe a problem related to the lack of the decorative portion.
本発明は、透明な材料の表面に文字、模様、図柄等の装飾部を設けても、白濁及び欠けがない成形品を提供することを目的とする。
The object of the present invention is to provide a molded product that is free from cloudiness and chipping even when a decorative portion such as a character, pattern, or pattern is provided on the surface of a transparent material.
また、本発明は、上述の成形品を製造するための成形型及び当該成形型の製造方法を提供することを目的とする。
Moreover, an object of the present invention is to provide a mold for manufacturing the above-mentioned molded product and a method for manufacturing the mold.
上記課題を解決するため、本発明に係る成形品は、所定領域で巨視的に鏡面状の成形面を有し、所定領域内であって成形面上の局所的な領域に凹及び凸のいずれかで形成される装飾部を有し、装飾部の段差量は、成形面から対称的な形状成分を加味した凹凸成分の半分より小さい。ここで、巨視的に鏡面状とは、微視的に観察すると凹凸を有するが、所定領域を全体的に観察すると鏡面状であることを意味する。対称的な形状成分とは、上記所定領域内の断面において微細な凹凸をならした近似曲線を意味する。
In order to solve the above problems, the molded product according to the present invention has a macroscopically mirror-shaped molding surface in a predetermined region, and has a concave or convex shape in a local region on the molding surface within the predetermined region. The amount of the step of the decorative portion is smaller than half of the uneven component taking into account the symmetrical shape component from the molding surface. Here, the macroscopic shape means that the surface is uneven when viewed microscopically, but is specular when the entire predetermined region is observed. The symmetrical shape component means an approximate curve having fine irregularities in the cross section in the predetermined region.
上記成形品によれば、装飾部の段差量は成形面全体から見れば微小であり、成形面の凹凸の主成分が鏡面状の凹凸成分すなわちうねり成分となる。そのため、硬化収縮時の応力は成形面全体に分散されて特定の部分に集中することがなくなり、成形材をスムーズに離型することができる。これにより、透明な材料に装飾部を設けても、白濁及び欠けがない成形品となる。特に、成形材がガラスのような脆い材料である場合でも装飾部に欠けが発生しなくなり、装飾部のエッジが立つので、たとえ、装飾部の段差量が小さくても明確に認識できる。
According to the molded product described above, the level difference of the decorative portion is minute when viewed from the entire molding surface, and the main component of the irregularities on the molding surface is a mirror-like irregular component, that is, a swell component. Therefore, the stress at the time of curing shrinkage is distributed over the entire molding surface and does not concentrate on a specific portion, and the molding material can be released smoothly. Thereby, even if it provides a decoration part in a transparent material, it becomes a molded product without cloudiness and a chip. In particular, even when the molding material is a brittle material such as glass, the decorative portion is not chipped, and the edge of the decorative portion stands, so that even if the step amount of the decorative portion is small, it can be clearly recognized.
本発明の具体的な態様又は観点では、上記成形品において、装飾部の段差をΔとし、成形面の表面形状のPV値をA1としたときに、以下の条件式を満足する。
A1/2>Δ In a specific aspect or viewpoint of the present invention, the following conditional expression is satisfied when the step of the decorative portion is Δ and the PV value of the surface shape of the molding surface is A1 in the molded product.
A1 / 2> Δ
A1/2>Δ In a specific aspect or viewpoint of the present invention, the following conditional expression is satisfied when the step of the decorative portion is Δ and the PV value of the surface shape of the molding surface is A1 in the molded product.
A1 / 2> Δ
本発明の別の観点では、装飾部の段差量は、1μm以下である。この場合、装飾部の輪郭を形成する段差部分で欠けが発生することを確実に防止することができる。
In another aspect of the present invention, the step amount of the decorative portion is 1 μm or less. In this case, it is possible to reliably prevent the chipping from occurring at the step portion that forms the contour of the decorative portion.
本発明のさらに別の観点では、成形品は、ガラスで形成される。
In yet another aspect of the present invention, the molded product is formed of glass.
上記課題を解決するため、本発明に係る成形型は、所定領域で巨視的に鏡面状の転写面を有し、所定領域内であって転写面上の局所的な領域に凹及び凸のいずれかで形成される装飾転写部を有し、装飾転写部の段差量は、転写面から対称的な形状成分を加味した凹凸成分の半分より小さい。
In order to solve the above-mentioned problems, the mold according to the present invention has a macroscopic mirror-like transfer surface in a predetermined region, and has a concave or convex shape in a local region on the transfer surface within the predetermined region. The amount of the step of the decorative transfer portion is smaller than half of the uneven component taking into account the symmetrical shape component from the transfer surface.
上記成形型によれば、装飾転写部の段差量は転写面全体から見れば微小であり、転写面の凹凸の主成分が鏡面状の凹凸成分となる。そのため、硬化収縮時の応力は成形品の成形面全体に分散されて特定の部分に集中することがなくなり、成形材をスムーズに離型することができる。
According to the above mold, the step amount of the decorative transfer portion is minute when viewed from the entire transfer surface, and the main component of the unevenness of the transfer surface is a mirror-like uneven component. Therefore, the stress at the time of curing shrinkage is dispersed over the entire molding surface of the molded product and does not concentrate on a specific portion, and the molding material can be released smoothly.
本発明の具体的な態様又は観点では、上記成形型において、装飾転写部の段差をΔとし、転写面の表面形状のPV値をA1としたときに、以下の条件式を満足する。
A1/2>Δ In a specific mode or aspect of the present invention, the following conditional expression is satisfied when the step of the decorative transfer portion is Δ and the PV value of the surface shape of the transfer surface is A1 in the mold.
A1 / 2> Δ
A1/2>Δ In a specific mode or aspect of the present invention, the following conditional expression is satisfied when the step of the decorative transfer portion is Δ and the PV value of the surface shape of the transfer surface is A1 in the mold.
A1 / 2> Δ
本発明の別の観点では、転写面は、離型処理層を有する。この場合、離型処理層を剥離及び再形成すれば、1つの母材で装飾部の形状に応じた成形型を得ることができ、コストを削減することができる。
In another aspect of the present invention, the transfer surface has a release treatment layer. In this case, if the release treatment layer is peeled and re-formed, a molding die corresponding to the shape of the decorative portion can be obtained with one base material, and the cost can be reduced.
本発明のさらに別の観点では、離型処理層の厚さは、装飾転写部の段差量よりも大きい。この場合、離型処理層を剥離した後の成形型の母材を装飾転写部がない状態にすることができる。
In still another aspect of the present invention, the thickness of the release treatment layer is larger than the step amount of the decorative transfer portion. In this case, the base material of the mold after the release treatment layer is peeled can be in a state where there is no decoration transfer portion.
上記課題を解決するため、本発明に係る成形型の製造方法は、成形型の転写面の所定領域を巨視的に鏡面状に加工する鏡面加工工程と、鏡面加工工程後、所定領域内の転写面上に装飾転写部に対応するマスクパターンを形成するマスク形成工程と、マスクパターンの露出部分をドライエッチングによってエッチングし、装飾転写部を形成する装飾加工工程と、を備える。
In order to solve the above-described problems, a manufacturing method of a mold according to the present invention includes a mirror surface processing step for macroscopically processing a predetermined region of a transfer surface of the mold into a mirror surface, and a transfer in the predetermined region after the mirror surface processing step. A mask forming step for forming a mask pattern corresponding to the decoration transfer portion on the surface; and a decoration processing step for etching the exposed portion of the mask pattern by dry etching to form the decoration transfer portion.
上記成形型の製造方法によれば、装飾転写部を形成する前に転写面全域を鏡面状に加工することにより、簡易に装飾転写部の段差量よりも大きい凹凸成分を有する成形面を得ることができる。また、例えばガスクラスターイオンビームを用いることにより、装飾部転写部は、表面粗さが平坦な面を加工することができ、鏡面加工工程で得られた鏡面性と同等かそれ以上の鏡面性を得ることができる。これにより、転写面全域において鏡面状態を保つことができる。
According to the above method for manufacturing a mold, by simply processing the entire transfer surface into a mirror surface before forming the decorative transfer portion, it is possible to easily obtain a molded surface having a concavo-convex component larger than the step amount of the decorative transfer portion. Can do. In addition, for example, by using a gas cluster ion beam, the decorative portion transfer portion can process a surface with a flat surface roughness, and has a mirror surface property equal to or higher than the mirror surface property obtained in the mirror surface processing step. Obtainable. Thereby, the mirror surface state can be maintained over the entire transfer surface.
本発明の具体的な態様又は観点では、上記成形型の製造方法において、ドライエッチングにおいて、ガスクラスターイオンビームを用いる。この場合、ガスクラスターイオンビームの照射時間等によって、1μm以下のような微小な加工量も高精度に狙うことができる。
In a specific embodiment or aspect of the present invention, a gas cluster ion beam is used in dry etching in the above-described mold manufacturing method. In this case, a minute processing amount of 1 μm or less can be aimed at with high accuracy depending on the irradiation time of the gas cluster ion beam.
本発明の別の観点では、鏡面加工工程後、マスク形成工程前に、鏡面状の下地面上に離型処理層を形成する層形成工程を備える。この場合、離型処理層上に装飾転写部を形成することができる。
Another aspect of the present invention includes a layer forming step of forming a release treatment layer on the mirror-like lower ground before the mask forming step after the mirror finishing step. In this case, the decorative transfer portion can be formed on the release treatment layer.
本発明のさらに別の観点では、鏡面加工工程において、転写面は、機械研磨によって鏡面加工される。
In still another aspect of the present invention, the transfer surface is mirror-finished by mechanical polishing in the mirror-finishing step.
〔第1実施形態〕
図1A及び1B等を参照して、本発明の第1実施形態に係る成形品について説明する。 [First Embodiment]
With reference to FIG. 1A and 1B etc., the molded article which concerns on 1st Embodiment of this invention is demonstrated.
図1A及び1B等を参照して、本発明の第1実施形態に係る成形品について説明する。 [First Embodiment]
With reference to FIG. 1A and 1B etc., the molded article which concerns on 1st Embodiment of this invention is demonstrated.
成形品10は、ガラスのプレス成形等によって形成される透明又は光透過性を有する部材である。成形品10は、矩形の輪郭を有する板状の部材であるが、図1Bに示すように、断面に沿った特定方向に関して中央が厚くなっており、円筒又は蒲鉾状の外形を有する。成形品10の上面10aは、全体的な領域10nが円筒面となっており、成形品10の下面10bや側面10cは、平坦面となっている。これらのうち、上面10aと下面10bとは、成形されたままの状態で鏡面状の成形面となっている。側面10cについては、成形時の鏡面状の成形面を残すこともできるが、磨りガラス状の加工を施すこともできる。なお、本実施形態において、所定領域として上面10a全域が鏡面状となっているが、上面10aのうち後述する装飾部10dを含む領域が鏡面状になっていればよく、例えば成形品10の外縁付近については鏡面状でなくてもよい。
The molded product 10 is a transparent or light transmissive member formed by press molding of glass or the like. Although the molded product 10 is a plate-shaped member having a rectangular outline, as shown in FIG. 1B, the center is thick in a specific direction along the cross section, and has a cylindrical or bowl-shaped outer shape. As for the upper surface 10a of the molded product 10, the whole area | region 10n is a cylindrical surface, and the lower surface 10b and the side surface 10c of the molded product 10 are flat surfaces. Among these, the upper surface 10a and the lower surface 10b are mirror-shaped molding surfaces as they are molded. As for the side surface 10c, a mirror-like molding surface at the time of molding can be left, but a polished glass-like process can also be performed. In the present embodiment, the entire upper surface 10a is a mirror surface as the predetermined region, but the region including the decorative portion 10d described later of the upper surface 10a may be a mirror surface. For example, the outer edge of the molded product 10 The vicinity need not be mirror-like.
成形品10の上面10aにおいて、円筒面の領域10nのうち局所的な領域からレリーフ状の突起パターンとして装飾部10dが形成されている。装飾部10dは、文字、模様、図柄等を表した立体的な構造部分であり、例えば略一様な厚みを有する。装飾部10dの厚み又は段差量は、例えば数μm以下であり、好ましくは1μm以下である。なお、成形品10の厚みは数mm程度となっている。
On the upper surface 10a of the molded product 10, a decorative portion 10d is formed as a relief-shaped projection pattern from a local region of the cylindrical surface region 10n. The decorative portion 10d is a three-dimensional structural portion representing characters, patterns, designs, etc., and has a substantially uniform thickness, for example. The thickness or level difference of the decorative portion 10d is, for example, several μm or less, and preferably 1 μm or less. The thickness of the molded product 10 is about several millimeters.
成形品10は、例えばカバーガラスその他の装飾部品又は装飾用品として用いることができる。成形品10の上面10aに形成された装飾部10dは、数μm以下と極めて低いが、成形品10に当てる光の角度や観察方向の調整によって淡く浮き出す模様として観察される。このため、成形品10は、無色又は有色の透明部材であることが望ましい。
The molded article 10 can be used as, for example, a cover glass or other decorative part or decorative article. The decorative portion 10d formed on the upper surface 10a of the molded product 10 is extremely low, such as several μm or less, but is observed as a pattern that is lightly raised by adjusting the angle of light applied to the molded product 10 and the observation direction. For this reason, it is desirable that the molded product 10 is a colorless or colored transparent member.
成形品10の上面10aに設けられた装飾部10dは、エッジの立った形状を有する。つまり、装飾部10dは、輪郭に対応する側面11aと、側面11aに囲まれた平坦面11bとを有する。側面11aは、鏡面状の周囲の領域10nから略垂直に立ち上がっている。仮に側面11aが周囲の領域10nから略垂直に立ち上がっていなければ、その段差が少ないこともあって視覚的に認識できなくなる。また、段差量が大きいほど装飾部10dの視認は容易になると言える。その一方で、側面11aの段差量が大きいと、プレス成形が困難になる。つまり、略垂直に立ち上がる部分は、成形型(不図示)と噛み合う傾向が強く、この成形型の熱膨張係数と成形品10の熱膨張係数とに比較的大きな差がある場合、装飾部10dの側面11aのエッジに応力が集中して欠けが発生しやすくなり、離型も容易でなくなる。そのため、成形品10の良品の製造が困難になり或いは歩留まりが低下する。このように、装飾部10dの段差の設定は、適度な見やすさと製造の容易さとをバランスさせることが容易でないという事情があった。
The decorative portion 10d provided on the upper surface 10a of the molded product 10 has an edged shape. In other words, the decorative portion 10d has a side surface 11a corresponding to the contour and a flat surface 11b surrounded by the side surface 11a. The side surface 11a rises substantially vertically from the mirror-like peripheral region 10n. If the side surface 11a does not rise substantially perpendicularly from the surrounding area 10n, the step 11a may not be visually recognized due to a small level difference. Further, it can be said that the larger the step amount, the easier the visual recognition of the decorative portion 10d. On the other hand, if the step amount on the side surface 11a is large, press molding becomes difficult. That is, the portion that rises substantially vertically has a strong tendency to mesh with a mold (not shown), and when there is a relatively large difference between the thermal expansion coefficient of the mold and the thermal expansion coefficient of the molded article 10, Stress concentrates on the edge of the side surface 11a and chipping is likely to occur, and release is not easy. Therefore, it becomes difficult to manufacture a good product of the molded product 10 or the yield is lowered. As described above, the setting of the step of the decorative portion 10d has a situation that it is not easy to balance appropriate visibility and ease of manufacture.
ところで、成形品10の面10a,10bは、設計通りの曲面又は平面であることが望ましいが、金型の加工精度等に起因して若干の僅かなうねりを有するものとなる。このようなうねりは、成形品10が光学部品等である場合、極めて少なく設定されるのが通常であるが、用途によっては許容値をある程度大きくできる可能性もある。そして、うねりが成形品10の微細な段差よりも十分に大きければ、成形時に段差に応力が集中しにくくなり、成形品10の離型が容易になって成形品10の装飾部10dに欠けが生じにくくなると考えられる。本願発明者は、この点に着目し、成形品10の装飾部10dを見やすいものとしつつ製造に際して欠けが形成されにくくなるような成形方法や成形型を考案した。
Incidentally, the surfaces 10a and 10b of the molded product 10 are desirably curved surfaces or flat surfaces as designed, but have a slight swell due to the processing accuracy of the mold. Such swell is usually set to be extremely small when the molded article 10 is an optical component or the like, but depending on the application, there is a possibility that the allowable value can be increased to some extent. If the swell is sufficiently larger than the fine step of the molded product 10, it becomes difficult for stress to concentrate on the step during molding, the mold product 10 can be easily released, and the decorative portion 10 d of the molded product 10 is not chipped. It is thought that it becomes difficult to occur. The inventor of the present application pays attention to this point and devised a molding method and a mold that make it difficult to form a chip during manufacture while making the decorative portion 10d of the molded product 10 easy to see.
以下、図1A等に示す成形品10を製造するための成形型及び成形装置の一例について具体的に説明する。
Hereinafter, an example of a mold and a molding apparatus for manufacturing the molded product 10 shown in FIG. 1A and the like will be specifically described.
図2に示すように、成形型40は、上型41と下型42とを有する。上型41には、転写面41aが形成され、下型42にも、転写面42aが形成されている。上型41の転写面41aは、鏡面状に加工され、全体として対称性を有するが、成形品10の装飾部10dに対応する装飾転写部41dを有する。下型42の転写面42aは、鏡面状に加工され、全体として対称性を有する。上型41と下型42との間には、溶融ガラスGMがプレスされた状態で充填されている。この溶融ガラスGMは、平板状の成形品10に成形され、成形品10には、装飾転写部41dに対応する装飾部10dが形成される。なお、上型41と下型42との間には隙間を設けている。これは、溶融ガラスGMの体積に変動があっても同様の厚みの成形品10を成形するためである。
As shown in FIG. 2, the mold 40 has an upper mold 41 and a lower mold 42. A transfer surface 41 a is formed on the upper mold 41, and a transfer surface 42 a is also formed on the lower mold 42. The transfer surface 41 a of the upper mold 41 is processed into a mirror surface and has symmetry as a whole, but has a decorative transfer portion 41 d corresponding to the decorative portion 10 d of the molded product 10. The transfer surface 42a of the lower mold 42 is processed into a mirror surface and has symmetry as a whole. Between the upper mold 41 and the lower mold 42, the molten glass GM is filled in a pressed state. The molten glass GM is molded into a flat molded product 10, and a decorative portion 10 d corresponding to the decorative transfer portion 41 d is formed on the molded product 10. A gap is provided between the upper mold 41 and the lower mold 42. This is because the molded article 10 having the same thickness is molded even if the volume of the molten glass GM varies.
図3A~3Cを参照して、成形品10の装飾部10dとして目的とする段差の形成を可能にするような成形品10の表面のうねりについて説明する。図3Aは、図1Bに対応し、成形品10の上面10aの形状を誇張して示した図となっている。上面10aは、円筒面であり、点線で示すような円弧31となるべきところ、実際は、実線で示すように非対称的なうねりUを有する形状となっている。円弧31は、対称的な形状成分である近似Rであり、上面10aを例えば最小自乗法によってフィッティングすることで得られる。図3Bは、上面10aの形状を近似Rである円弧31からの偏差として示した図である。図3Cは、図3Bを縦方向にさらに拡大した図であり、上面10aのうねりUが誇張された状態で示されている。上面10aに形成された装飾部10dは、上面10aのうねりUに重畳する状態で周囲の領域10nから突起している。
With reference to FIGS. 3A to 3C, a description will be given of the undulation of the surface of the molded product 10 that enables the formation of a desired step as the decorative portion 10d of the molded product 10. FIG. FIG. 3A corresponds to FIG. 1B and shows the shape of the upper surface 10a of the molded product 10 in an exaggerated manner. The upper surface 10a is a cylindrical surface and should be an arc 31 as shown by a dotted line, but actually has a shape having an asymmetric undulation U as shown by a solid line. The arc 31 is an approximate R that is a symmetric shape component, and is obtained by fitting the upper surface 10a by, for example, the least square method. FIG. 3B is a diagram showing the shape of the upper surface 10a as a deviation from the arc 31 that is an approximate R. FIG. FIG. 3C is a further enlarged view of FIG. 3B in the vertical direction, in which the undulation U of the upper surface 10a is exaggerated. The decorative portion 10d formed on the upper surface 10a protrudes from the surrounding region 10n so as to overlap the undulation U of the upper surface 10a.
図3Cに示す例では、上面10aのうねり成分のPV(Peak to Valley)値は、上面10aにおける装飾部10dの段差量、つまり装飾凹凸段差Δよりも大きくなり、成形品10の製造時に、装飾部10dの段差に応力が集中しにくくなるので、装飾部10dに欠けを生じさせないで、成形品10の離型性を確保でき、ガラスのような脆い材料であっても装飾部10dの外周に欠けが生じにくいものとなっている。
In the example shown in FIG. 3C, the PV (Peak to Valley) value of the undulation component of the upper surface 10 a is larger than the step amount of the decorative portion 10 d on the upper surface 10 a, that is, the decorative uneven step Δ. Since it is difficult for stress to concentrate on the step of the portion 10d, the decorative portion 10d can be prevented from being chipped, the releasability of the molded product 10 can be ensured, and even a fragile material such as glass is formed on the outer periphery of the decorative portion 10d. Chipping is difficult to occur.
図4A及び4Bを参照して、成形品10の上面10a又は上型41の転写面41aに形成される装飾凹凸段差Δの適正な範囲について考える。図3Cでも説明したように、装飾凹凸段差Δが成形品10の上面10a又は上型41の転写面41aに形成されているうねり成分のPV値よりも小さければ装飾部10dに欠けが生じにくいが、製品上で装飾凹凸段差Δとうねり成分とを区別して計測等を行うことは容易でない。このため、うねり成分のPV値に代えて表面形状のPV値を用いる。表面形状のPV値をA1とし、うねり成分のPV値をA0とした場合、
A1≦A0+Δ、つまりA0≧A1-Δ … (1)
となる。ここで、うねり成分のPV値A0が装飾凹凸段差Δよりも大きいことが前提となっており、
A0>Δ … (2)
が満たされるべきであり、より確実には
A1-Δ>Δ … (3)
が満たされるものとする。つまり、
A1/2>Δ … (4)
が満たされるものとする。すなわち、装飾部10dの段差量は、上面10aから対称的な形状成分を加味した凹凸成分、すなわち表面形状のPV値A1の半分より小さくなっている。ここで、対称的な形状成分とは、所定領域内の断面において微細な凹凸をならした近似曲線を意味しており、図3A及び3Bで説明した近似Rと同意である。上記の式(4)の式を満たす場合、成形品10の上面10aに形成される装飾凹凸段差Δが成形品10の上面10aに形成されているうねり成分のPV値よりも確実に小さくなり、成形品10の製造時に成形品10の離型性を確保でき、装飾部10dの外周に欠けが生じることを防止できる。 With reference to FIGS. 4A and 4B, an appropriate range of the decorative unevenness step Δ formed on theupper surface 10a of the molded product 10 or the transfer surface 41a of the upper mold 41 will be considered. As described with reference to FIG. 3C, if the decorative unevenness Δ is smaller than the PV value of the swell component formed on the upper surface 10a of the molded product 10 or the transfer surface 41a of the upper mold 41, the decorative portion 10d is less likely to be chipped. In addition, it is not easy to perform measurement or the like by distinguishing the decorative uneven step Δ and the swell component on the product. Therefore, the PV value of the surface shape is used instead of the PV value of the swell component. When the PV value of the surface shape is A1, and the PV value of the swell component is A0,
A1 ≦ A0 + Δ, that is, A0 ≧ A1-Δ (1)
It becomes. Here, it is assumed that the PV value A0 of the undulation component is larger than the decorative unevenness step Δ,
A0> Δ (2)
Should be satisfied, and more certainly A1-Δ> Δ (3)
Shall be satisfied. That means
A1 / 2> Δ (4)
Shall be satisfied. That is, the level difference of thedecorative portion 10d is smaller than half of the unevenness component taking into account the symmetrical shape component from the upper surface 10a, that is, the PV value A1 of the surface shape. Here, the symmetric shape component means an approximate curve having fine unevenness in a cross section in a predetermined region, and is the same as the approximation R described in FIGS. 3A and 3B. When the above equation (4) is satisfied, the decorative unevenness Δ formed on the upper surface 10a of the molded product 10 is surely smaller than the PV value of the swell component formed on the upper surface 10a of the molded product 10, The mold releasability of the molded product 10 can be ensured at the time of manufacturing the molded product 10, and chipping can be prevented from occurring on the outer periphery of the decorative portion 10d.
A1≦A0+Δ、つまりA0≧A1-Δ … (1)
となる。ここで、うねり成分のPV値A0が装飾凹凸段差Δよりも大きいことが前提となっており、
A0>Δ … (2)
が満たされるべきであり、より確実には
A1-Δ>Δ … (3)
が満たされるものとする。つまり、
A1/2>Δ … (4)
が満たされるものとする。すなわち、装飾部10dの段差量は、上面10aから対称的な形状成分を加味した凹凸成分、すなわち表面形状のPV値A1の半分より小さくなっている。ここで、対称的な形状成分とは、所定領域内の断面において微細な凹凸をならした近似曲線を意味しており、図3A及び3Bで説明した近似Rと同意である。上記の式(4)の式を満たす場合、成形品10の上面10aに形成される装飾凹凸段差Δが成形品10の上面10aに形成されているうねり成分のPV値よりも確実に小さくなり、成形品10の製造時に成形品10の離型性を確保でき、装飾部10dの外周に欠けが生じることを防止できる。 With reference to FIGS. 4A and 4B, an appropriate range of the decorative unevenness step Δ formed on the
A1 ≦ A0 + Δ, that is, A0 ≧ A1-Δ (1)
It becomes. Here, it is assumed that the PV value A0 of the undulation component is larger than the decorative unevenness step Δ,
A0> Δ (2)
Should be satisfied, and more certainly A1-Δ> Δ (3)
Shall be satisfied. That means
A1 / 2> Δ (4)
Shall be satisfied. That is, the level difference of the
以上は、成形品10又は上型41の特定断面について考えたが、成形品10の任意の断面において同様の条件が成り立つことが望ましく、図3Aの円弧31は、円筒面その他の対称形状成分(又は対称形状成分面)で考えることが厳密である。このような対称形状成分に対する成形品10の上面10a又は上型41の転写面41aの偏差又は面精度として処理することで、装飾凹凸段差Δや凹凸成分のPV値A1の管理の確実性が増す。
Although the above has considered the specific cross section of the molded product 10 or the upper mold 41, it is desirable that the same condition is satisfied in any cross section of the molded product 10, and the arc 31 in FIG. It is strict to think in terms of (or symmetrical shape component surfaces). By treating the deviation or surface accuracy of the upper surface 10a of the molded product 10 or the transfer surface 41a of the upper mold 41 with respect to such a symmetrical shape component, the certainty of the management of the decorative unevenness step Δ and the PV value A1 of the uneven component increases. .
図5Aに示すように、図2に示す成形型40を組み込んだ成形装置100は、原材料であるガラスを溶融して直接プレスする加圧成形のための装置である。成形装置100は、主要な部材である金型装置60の他に、成形品10の製造にあたって金型装置60に移動、開閉動作等を行わせるための制御駆動装置100a、ガラス滴形成装置100b(図5B参照)等をさらに備える。
As shown in FIG. 5A, a molding apparatus 100 incorporating the molding die 40 shown in FIG. 2 is an apparatus for pressure molding that directly melts and presses glass as a raw material. In addition to the mold device 60, which is a main member, the molding apparatus 100 includes a control drive device 100a for causing the mold device 60 to perform movement, opening and closing operations, and the like, and a glass droplet forming device 100b ( (See FIG. 5B).
金型装置60は、固定側の第1成形型61と、可動側の第2成形型62とを備える。第1成形型61は、その先端に図4に示す成形型40のうち下型42に相当する部分を有し、第2成形型62は、その先端に成形型40のうち上型41に相当する部分を有する。成形の際、第1成形型61は固定状態に維持され、第2成形型62は第1成形型61に対向するように移動して、両型61,62を互いに突き合わせるような型閉じが行われる。
The mold apparatus 60 includes a first mold 61 on the fixed side and a second mold 62 on the movable side. The first molding die 61 has a portion corresponding to the lower die 42 of the molding die 40 shown in FIG. 4 at the tip thereof, and the second molding die 62 corresponds to the upper die 41 of the molding die 40 at the tip thereof. It has a part to do. During molding, the first molding die 61 is maintained in a fixed state, and the second molding die 62 moves so as to face the first molding die 61 so that the molds are closed so that the two molds 61 and 62 are brought into contact with each other. Done.
図5Aを参照しつつ第1成形型61について説明する。第1成形型61は、下型42と、支持部61bと、ヒーター部61cとを備える。第1成形型61のうち下型42は円筒状であり、転写面42aを有する。第1成形型61の支持部61bの根元に設けたヒーター部61cには、下型42を適度に加熱するための電気ヒーター61hが内蔵されている。
The first mold 61 will be described with reference to FIG. 5A. The 1st shaping | molding die 61 is provided with the lower mold | type 42, the support part 61b, and the heater part 61c. Of the first mold 61, the lower mold 42 is cylindrical and has a transfer surface 42a. The heater portion 61c provided at the base of the support portion 61b of the first mold 61 incorporates an electric heater 61h for heating the lower die 42 appropriately.
次に、第2成形型62について説明する。第2成形型62は、上型41と、支持部62bと、ヒーター部62cとを備える。第2成形型62のうち上型41は円筒状であり、転写面41aを有する。第2成形型62の支持部62bの根元に設けたヒーター部62cには、上型41を適度に加熱するための電気ヒーター62hが内蔵されている。
Next, the second mold 62 will be described. The 2nd shaping | molding die 62 is provided with the upper mold | type 41, the support part 62b, and the heater part 62c. The upper mold 41 of the second mold 62 is cylindrical and has a transfer surface 41a. The heater 62c provided at the base of the support 62b of the second mold 62 incorporates an electric heater 62h for appropriately heating the upper mold 41.
第2成形型62と第1成形型61とは、加圧成形時において、第2成形型62の転写面41aと、第1成形型61の転写面42aとがそれぞれ同軸に配置され、プレス時及び冷却時に互いに所定間隔だけ離間する等、適切な位置関係を保つものとなっている。
In the second molding die 62 and the first molding die 61, the transfer surface 41a of the second molding die 62 and the transfer surface 42a of the first molding die 61 are arranged coaxially at the time of pressure molding. In addition, an appropriate positional relationship is maintained, such as being separated from each other by a predetermined interval during cooling.
制御駆動装置100aは、金型装置60又は成形型40による成形品10の成形のために、電気ヒーター61h,62hへの給電の制御や、第1成形型61及び第2成形型62の開閉動作等の成形装置100全体の制御を行う。なお、制御駆動装置100aに駆動された第2成形型62は、水平なAB方向に移動可能であるとともに、鉛直のCD方向に移動可能になっている。例えば両型61,62を合わせて型閉じを行う際には、まず第1成形型61の上方位置に第2成形型62を移動させて両型61,62の軸CX1,CX2を一致させ、延いては上側の転写面41aと下側の転写面42aとをそれぞれ一致させ、第2成形型62を降下させて第1成形型61側に所定の力で押し付ける。
The control drive device 100a controls the supply of electric power to the electric heaters 61h and 62h and opens and closes the first and second molding dies 61 and 62h for molding the molded product 10 by the mold device 60 or the molding die 40. The entire molding apparatus 100 is controlled. Note that the second mold 62 driven by the control drive device 100a can move in the horizontal AB direction and can move in the vertical CD direction. For example, when performing mold closing by combining both molds 61 and 62, first, the second mold 62 is moved to a position above the first mold 61 so that the axes CX1 and CX2 of both molds 61 and 62 coincide with each other. As a result, the upper transfer surface 41a and the lower transfer surface 42a are made to coincide with each other, and the second mold 62 is lowered and pressed against the first mold 61 with a predetermined force.
図5Bに示すように、ガラス滴形成装置100bは、原材料供給部91を有する。原材料供給部91は不図示のヒーターにより加熱され、原材料供給部91内のガラスを溶融状態にしており、ノズル91aから滴下されるガラスの溶融状態を維持している。原材料供給部91は、制御駆動装置100aにより移動や溶融ガラスGの滴下タイミングが制御される。
As shown in FIG. 5B, the glass droplet forming apparatus 100 b includes a raw material supply unit 91. The raw material supply unit 91 is heated by a heater (not shown) so that the glass in the raw material supply unit 91 is in a molten state, and the molten state of the glass dropped from the nozzle 91a is maintained. The raw material supply unit 91 is controlled to move and to drop the molten glass G by the control drive device 100a.
原材料供給部91は、不図示の坩堝等で溶融させた溶融ガラスGを溜めており、所定のタイミングで溶融ガラスGをノズル91aから吐出することにより、液滴状の溶融ガラスGである溶融ガラス滴GDを滴下させる部分である。
The raw material supply unit 91 stores molten glass G melted in a crucible (not shown) and the like, and the molten glass G is droplet-shaped molten glass G by discharging the molten glass G from the nozzle 91a at a predetermined timing. This is the portion where the droplet GD is dropped.
以下、成形品10の製造方法の一例について説明する。図5Bに示すように、原材料供給部91のノズル91aから滴下された溶融ガラス滴GDを下型42の転写面42aで受ける。溶融ガラス滴GDは、第1成形型61に設けた下型42の転写面42a上に広がって冷却される。そして、下型42上の溶融ガラスが完全に固化する前であって加圧変形可能な温度の間に、下型42上の溶融ガラスに第2成形型62に設けた上型41を相対的に押圧して成形する(成形工程)。この際、第1成形型61の上方位置に第2成形型62を移動させて両型61,62の軸CX1,CX2を一致させ、延いては上側の転写面41aと下側の転写面42aとを対向させた状態で押圧する。なお、第2成形型62は、第1成形型61と同程度の温度に加熱されている。その後、上下型41,42間の融合ガラスの温度が漸次低下していくことにより、上下面10a,10b等を有する装飾パネルとしての成形品10が成形される。成形品10を十分に冷却した後、第1成形型61及び第2成形型62の加圧を解除して、第2成形型62を上昇させることにより、成形品10を離型し、型外へ取り出す(取出工程)。
Hereinafter, an example of a method for manufacturing the molded product 10 will be described. As shown in FIG. 5B, the molten glass droplet GD dropped from the nozzle 91 a of the raw material supply unit 91 is received by the transfer surface 42 a of the lower mold 42. The molten glass droplet GD spreads on the transfer surface 42 a of the lower mold 42 provided in the first mold 61 and is cooled. Then, before the molten glass on the lower mold 42 is completely solidified and at a temperature at which pressure deformation is possible, the upper mold 41 provided in the second mold 62 is relatively placed on the molten glass on the lower mold 42. To be pressed (molding process). At this time, the second molding die 62 is moved to a position above the first molding die 61 so that the axes CX1 and CX2 of both the molds 61 and 62 coincide with each other, and as a result, the upper transfer surface 41a and the lower transfer surface 42a. And pressed in a state of facing each other. Note that the second mold 62 is heated to a temperature comparable to that of the first mold 61. Thereafter, the temperature of the fused glass between the upper and lower molds 41 and 42 gradually decreases, whereby the molded product 10 as a decorative panel having the upper and lower surfaces 10a and 10b is formed. After the molded product 10 is sufficiently cooled, the pressurization of the first molding die 61 and the second molding die 62 is released, and the second molding die 62 is lifted to release the molded product 10 and out of the mold. Take out to (extraction process).
以下、図2及び図4B等に示す成形型40、特に装飾転写部41dを設けた上型41の製造方法の一例について具体的に説明する。
Hereinafter, an example of a manufacturing method of the forming die 40 shown in FIGS. 2 and 4B, in particular, the upper die 41 provided with the decoration transfer portion 41d will be described in detail.
成形型40のうち、上型41は、切削等によって所望の形状に形成され、鏡面状に形成された下地面41jを表側に有している。上型41の下地面41jは、巨視的には、対称形状を有するものであり、具体的には円筒の凹面に切削加工される。ここで、下地面41jは、微視的には、図4Bに示すようなうねりを有している。このようなうねり成分のPV値(振れ幅)は、装飾転写部41dの深さに対応した値を有し、具体的には数μm以上(例えば8μm)となっている。下地面41jのうねりは、加工制御によって強制的に設けることができるが、加工精度として不可避的に生じるものであってもよい。下地面41jは、仕上げ加工によって最終的には巨視的に全域が鏡面状の転写面41aとなる(鏡面加工工程)。ここで、巨視的に鏡面状とは、微細に観察すると凹凸を有するが、所定領域を全体的に観察すると鏡面状であることを意味する。なお、上型41の下地面41jすなわち鏡面は、切削によって仕上げることもできるが、最後に機械研磨工程を追加することもできる。
Among the molding dies 40, the upper die 41 is formed into a desired shape by cutting or the like, and has a base surface 41j formed in a mirror shape on the front side. The lower ground 41j of the upper mold 41 has a symmetrical shape macroscopically, and is specifically cut into a cylindrical concave surface. Here, the base surface 41j has a swell as shown in FIG. 4B microscopically. The PV value (vibration width) of such a swell component has a value corresponding to the depth of the decorative transfer portion 41d, and is specifically several μm or more (for example, 8 μm). The undulation of the lower ground 41j can be forcibly provided by machining control, but may be inevitably generated as machining accuracy. The lower ground surface 41j finally becomes a transfer surface 41a having a mirror-like entire surface as a result of finishing processing (mirror processing step). Here, macroscopically means that the surface is uneven when viewed finely, but is specular when the entire predetermined region is observed. In addition, although the lower ground 41j of the upper mold | type 41, ie, a mirror surface, can also be finished by cutting, a mechanical polishing process can also be added finally.
その後、上型41の下地面41jには、所望の輪郭を有する浅い凹部が形成され、装飾転写部41dとされる。装飾転写部41dの形成には、例えばドライエッチング(具体的にはガスクラスターイオンビーム)が利用される。鏡面加工工程後の転写面41aに、マスクパターンを形成し(マスク形成工程)、マスクパターンの露出部分をエッチングすることで、転写面41a上に所望のパターンを有する装飾転写部41dを形成することができる(装飾加工工程)。
Thereafter, a shallow concave portion having a desired contour is formed on the lower ground 41j of the upper die 41 to form a decorative transfer portion 41d. For example, dry etching (specifically, a gas cluster ion beam) is used to form the decorative transfer portion 41d. Forming a decorative transfer portion 41d having a desired pattern on the transfer surface 41a by forming a mask pattern on the transfer surface 41a after the mirror finishing step (mask forming step) and etching the exposed portion of the mask pattern (Decoration process).
図6は、上型41の下地面41j又は転写面41aに装飾転写部41dを形成するためのエッチング装置の一例を示す。このエッチング装置300は、上型41となるべき被加工物WA表面のエッチングのためにガスクラスターイオンビーム(GCIB)を照射するものであり、装置本体70と、支持装置駆動部81と、制御装置82とを備える。
FIG. 6 shows an example of an etching apparatus for forming the decorative transfer portion 41d on the lower ground 41j or the transfer surface 41a of the upper mold 41. The etching apparatus 300 irradiates a gas cluster ion beam (GCIB) for etching the surface of the workpiece WA to be the upper mold 41, and includes an apparatus main body 70, a support apparatus driving unit 81, and a control apparatus. 82.
装置本体70は、真空技術を利用してエッチングによる研磨を行う装置であり、ソースチャンバー71aとイオンチャンバー71bとプロセスチャンバー71cとを備える。各チャンバー71a,71b,71cには、真空ポンプを含む排気装置72が付随している。
The apparatus main body 70 is an apparatus that performs polishing by etching using vacuum technology, and includes a source chamber 71a, an ion chamber 71b, and a process chamber 71c. Each chamber 71a, 71b, 71c is accompanied by an exhaust device 72 including a vacuum pump.
ソースチャンバー71aは、ガスを真空中に噴射する部分である。ガス源73aから延びるノズル73bから供給されるガスは、例えばアルゴンガス、酸素ガス、窒素ガス、SF6ガス、ヘリウムガスの他、化合物の炭酸ガス等であり、2種以上のガスを混合することも可能である。ソースチャンバー71aとイオンチャンバー71bとを仕切るスキマー73cは、開口を有し、ノズル73bから噴射された高圧ガスのうち中心側のガスクラスターを選択的に通過させてビーム化する。つまり、ソースチャンバー71aからは、ガスクラスタービームB1が射出される。
The source chamber 71a is a part that injects gas into vacuum. Gas supplied from the nozzle 73b extending from the gas source 73a is, for example argon gas, oxygen gas, nitrogen gas, SF 6 gas, other helium gas, a carbon dioxide gas of a compound, mixing two or more gases Is also possible. A skimmer 73c that partitions the source chamber 71a and the ion chamber 71b has an opening, and selectively passes through a gas cluster on the center side of the high-pressure gas ejected from the nozzle 73b to form a beam. That is, the gas cluster beam B1 is emitted from the source chamber 71a.
イオンチャンバー71bは、ガスクラスタービームB1を研磨用のガスクラスターイオンビームB2にする部分である。イオンチャンバー71bにおいて、上流のイオン化部74aは、フィラメントを有する。このフィラメントからの熱電子をガスクラスタービームB1に衝突させることで、ガスクラスタービームB1を荷電粒子ビームとする。下流のレンズ部74cは、加速部74bを経た荷電粒子ビームを照射軸AXに沿って略平行に進むビームとする。この結果、イオンチャンバー71bの内部アパーチャー74fからは、コリメートされ比較的大きな直径を有するガスクラスターイオンビームB2が射出される。内部アパーチャー74fは、シャッター機能も有しており、ガスクラスターイオンビームB2を所望のタイミングでオン・オフすることができる。
The ion chamber 71b is a part that turns the gas cluster beam B1 into a gas cluster ion beam B2 for polishing. In the ion chamber 71b, the upstream ionization part 74a has a filament. By causing the thermoelectrons from the filament to collide with the gas cluster beam B1, the gas cluster beam B1 is changed to a charged particle beam. The downstream lens unit 74c converts the charged particle beam that has passed through the acceleration unit 74b into a beam that travels substantially parallel along the irradiation axis AX. As a result, a collimated gas cluster ion beam B2 having a relatively large diameter is emitted from the internal aperture 74f of the ion chamber 71b. The internal aperture 74f also has a shutter function, and can turn on / off the gas cluster ion beam B2 at a desired timing.
ガスクラスターイオンビームB2を構成する粒子は、後述する被加工物WAに照射されることによる被加工物WAとの衝突によって壊れ、その際に、クラスター構成原子又は分子と被加工物構成原子又は分子との多体衝突が生じ、被加工物WAの表面に対して水平方向への運動が顕著となる。これにより、被加工物WAの表面における突起が主に削られ、原子サイズでの平坦な超精密研磨が可能となる。
Particles constituting the gas cluster ion beam B2 are broken by collision with the workpiece WA by irradiating the workpiece WA, which will be described later, and at that time, the cluster constituent atoms or molecules and the workpiece constituent atoms or molecules And the movement in the horizontal direction becomes significant with respect to the surface of the workpiece WA. Thereby, the protrusions on the surface of the workpiece WA are mainly shaved, and flat ultra-precision polishing at the atomic size becomes possible.
プロセスチャンバー71cは、被加工物WAに対してガスクラスターイオンビームB2を衝突させてサブミクロン又はナノメートルのオーダーで精密研磨処理する部分であり、支持装置75を備える。支持装置75は、ステージ75aを有し、被加工物WAをステージ75a上に支持してガスクラスターイオンビームB2に対する被加工物WAの姿勢を所望の状態に調整する。被加工物WAは、成形型40の上型41の加工前すなわち転写面41aに装飾転写部41dを形成する前の状態に対応し、装飾転写部41dとなるべき部分を除いた残りの部分にマスクMAを形成したものとなっている。
The process chamber 71c is a part that performs a precision polishing process in the order of submicron or nanometer by colliding the gas cluster ion beam B2 against the workpiece WA, and includes a support device 75. The support device 75 includes a stage 75a, supports the workpiece WA on the stage 75a, and adjusts the posture of the workpiece WA with respect to the gas cluster ion beam B2 to a desired state. The workpiece WA corresponds to the state before processing the upper mold 41 of the mold 40, that is, before the decoration transfer portion 41d is formed on the transfer surface 41a, and the remaining portion excluding the portion to be the decoration transfer portion 41d. A mask MA is formed.
制御装置82は、装置本体70の動作を統括的に制御している。つまり、制御装置82は、装置本体70を適宜動作させて被加工物WAの表面をエッチングし、所望の深さの凹部を形成する。この凹部は、上型41の転写面41aに形成すべき装飾転写部41dに相当する。その他、制御装置82は、ガス源73a、イオン化部74a、加速部74b、レンズ部74c、排気装置72等の動作状態を直接的又は間接的に監視し制御している。
The control device 82 comprehensively controls the operation of the device main body 70. That is, the control device 82 operates the device main body 70 as appropriate to etch the surface of the workpiece WA to form a recess having a desired depth. This recess corresponds to a decorative transfer portion 41d to be formed on the transfer surface 41a of the upper mold 41. In addition, the control device 82 directly or indirectly monitors and controls operation states of the gas source 73a, the ionization unit 74a, the acceleration unit 74b, the lens unit 74c, the exhaust device 72, and the like.
エッチングに際しては、被加工物WAをステージ75a上に固定する。被加工物WAは、下地面41jを形成した上型41であり、転写面41aとなるべき鏡面状の下地面41jがマスクMAによって局所的に覆われている。マスクMAは、レジストその他で形成され装飾転写部41dに対応する位置に開口THを有している。被加工物WAにガスクラスターイオンビームB2を所定時間照射すると、開口THの部分で下地面41jがエッチングされ、凹部として装飾転写部41dを形成することができる。この装飾転写部41dの深さは、上述のように数μm以下、好ましくは1μm以下である。このように、ガスクラスターイオンビームは、照射時間等の調整によって、1μm以下のような微小な加工量も高精度に狙うことができるため、本工程に適している。
During etching, the workpiece WA is fixed on the stage 75a. The workpiece WA is an upper mold 41 on which a base surface 41j is formed, and a mirror-like lower ground 41j to be the transfer surface 41a is locally covered with a mask MA. The mask MA is formed of a resist or the like and has an opening TH at a position corresponding to the decoration transfer portion 41d. When the workpiece cluster WA is irradiated with the gas cluster ion beam B2 for a predetermined time, the base surface 41j is etched at the opening TH, and the decorative transfer portion 41d can be formed as a recess. The depth of the decorative transfer portion 41d is several μm or less, preferably 1 μm or less as described above. As described above, the gas cluster ion beam is suitable for this step because a minute processing amount of 1 μm or less can be targeted with high accuracy by adjusting the irradiation time or the like.
図6に示すエッチング装置300を用いた場合、装飾転写部41dに鏡面を形成できる。つまり、GCIBによる加工粗さは、研磨面(鏡面)と同等かそれ以上とできるので、装飾転写部41dの底面は、鏡面となる。上型41の下地面41jが研削による場合、平滑性があまり良好でない場合もあり得る。この場合、被加工物WAを一旦プロセスチャンバー71c外に取り出してマスクMAを除去するならば、転写面41a全体をGCIBで軽くエッチングすることができ、転写面41aの鏡面性を高めることができる。
When the etching apparatus 300 shown in FIG. 6 is used, a mirror surface can be formed on the decorative transfer portion 41d. That is, the processing roughness by GCIB can be equal to or higher than the polished surface (mirror surface), so that the bottom surface of the decorative transfer portion 41d is a mirror surface. When the lower ground 41j of the upper mold 41 is ground, smoothness may not be so good. In this case, once the workpiece WA is taken out of the process chamber 71c and the mask MA is removed, the entire transfer surface 41a can be lightly etched with GCIB, and the mirror surface property of the transfer surface 41a can be improved.
本実施形態の成形品等によれば、装飾部10dの段差量が成形面である上面10a全体から見れば微小であり、上面10aの凹凸の主成分が上面10a全域に及ぶ鏡面状の凹凸成分又はうねり成分となる。そのため、硬化収縮時の応力は上面10a全体に分散されて特定の部分に集中することがなくなり、成形材であるガラスをスムーズに離型することができる。これにより、透明な材料に装飾部10dを設けても、白濁及び欠けがない成形品10となる。
According to the molded product or the like of the present embodiment, the stepped amount of the decorative portion 10d is minute when viewed from the entire upper surface 10a that is the molding surface, and the main component of the unevenness of the upper surface 10a is a specular uneven component that covers the entire upper surface 10a. Or it becomes a wave | undulation component. Therefore, the stress at the time of curing shrinkage is not dispersed over the entire upper surface 10a and concentrated on a specific portion, and the glass as the molding material can be released smoothly. Thereby, even if the decorative portion 10d is provided on a transparent material, the molded product 10 is free from white turbidity and chipping.
〔第2実施形態〕
以下、本発明に係る第2実施形態の成形品、成形型等について説明する。第2実施形態の成形品等は、第1実施形態の成形品等を一部変更したものであり、特に説明しない事項は、第1実施形態と同様である。 [Second Embodiment]
Hereinafter, a molded product, a mold, and the like according to the second embodiment of the present invention will be described. The molded product or the like of the second embodiment is a partial modification of the molded product or the like of the first embodiment, and matters not specifically described are the same as those of the first embodiment.
以下、本発明に係る第2実施形態の成形品、成形型等について説明する。第2実施形態の成形品等は、第1実施形態の成形品等を一部変更したものであり、特に説明しない事項は、第1実施形態と同様である。 [Second Embodiment]
Hereinafter, a molded product, a mold, and the like according to the second embodiment of the present invention will be described. The molded product or the like of the second embodiment is a partial modification of the molded product or the like of the first embodiment, and matters not specifically described are the same as those of the first embodiment.
図7は、第2実施形態の成形品を成形するための成形型を説明する図であり、図4Bを一部変更したものとなっている。上型41は、母材41pの下地面141j上に離型処理層41qを設けたものである。上型41において、離型処理層41qの表面である下地面41jに第1実施形態と同様のドライエッチング等によって装飾転写部41dが形成されている。つまり、図6に示すエッチング装置300を用い、ステージ75a上に被加工物WAをセットする。この場合、被加工物WAは、上型41の母材41p上に離型処理層41qを形成した状態に対応し、装飾転写部41dとなるべき部分を除いた残りの部分にマスクMAを形成したものとなっている。離型処理層41qは、例えばCr、Ti、及びAlのいずれかの金属若しくはそれらを含む化合物(例えばTiO2、Cr2O3、TiN、TiAlN)、又はAu、Pt、Ir、及びRhのいずれかの貴金属若しくはそれらを含む合金(例えばPt-Ir合金)等で形成される層であり、化学的或いは物理的な成膜法(例えばコート又はメッキ等)によって形成される(層形成工程)。層形成工程は、第1実施形態で説明した鏡面加工工程後、マスク形成工程前に行われる。
FIG. 7 is a diagram for explaining a mold for molding the molded product of the second embodiment, and is a partial modification of FIG. 4B. The upper mold 41 is provided with a release treatment layer 41q on the lower ground 141j of the base material 41p. In the upper die 41, a decorative transfer portion 41d is formed on the base surface 41j, which is the surface of the release treatment layer 41q, by dry etching or the like as in the first embodiment. That is, the workpiece WA is set on the stage 75a using the etching apparatus 300 shown in FIG. In this case, the workpiece WA corresponds to the state in which the release processing layer 41q is formed on the base material 41p of the upper mold 41, and the mask MA is formed on the remaining portion excluding the portion to be the decoration transfer portion 41d. It has become. The release treatment layer 41q is, for example, any metal of Cr, Ti, and Al or a compound containing them (for example, TiO 2 , Cr 2 O 3 , TiN, TiAlN), or any of Au, Pt, Ir, and Rh. It is a layer formed of such a noble metal or an alloy containing them (for example, Pt—Ir alloy), and is formed by a chemical or physical film forming method (for example, coating or plating) (layer forming step). The layer forming process is performed after the mirror finishing process described in the first embodiment and before the mask forming process.
離型処理層41qの厚みtは、装飾転写部41dの装飾凹凸段差Δよりも大きいことが前提となっており、
t>Δ … (5)
となっている。このように、離型処理層41qの厚みtの値を装飾凹凸段差Δよりも大きくすることにより、エッチングによって形成される装飾転写部41dにおいて母材41pの下地面141jが露出することを防止できる。離型処理層41qの厚みtは、具体的には1μm以上、好ましくは数μm以上となっている。なお、離型処理層41qのうねり成分は、母材41pの下地面141jと略等しくなっている。離型処理層41qに形成する装飾凹凸段差Δと、離型処理層41q又は下地面141jのうねり成分PV値A0等との関係は、第1実施形態の場合と同様であるので、詳細な説明は省略する。 It is assumed that the thickness t of therelease treatment layer 41q is larger than the decorative unevenness step Δ of the decorative transfer portion 41d.
t> Δ (5)
It has become. Thus, by making the value of the thickness t of therelease treatment layer 41q larger than the decorative unevenness step Δ, it is possible to prevent the lower ground surface 141j of the base material 41p from being exposed in the decorative transfer portion 41d formed by etching. . Specifically, the thickness t of the release treatment layer 41q is 1 μm or more, preferably several μm or more. The swell component of the release treatment layer 41q is substantially equal to the lower ground surface 141j of the base material 41p. Since the relationship between the decorative unevenness step Δ formed on the release treatment layer 41q and the swell component PV value A0 of the release treatment layer 41q or the base surface 141j is the same as in the first embodiment, a detailed description will be given. Is omitted.
t>Δ … (5)
となっている。このように、離型処理層41qの厚みtの値を装飾凹凸段差Δよりも大きくすることにより、エッチングによって形成される装飾転写部41dにおいて母材41pの下地面141jが露出することを防止できる。離型処理層41qの厚みtは、具体的には1μm以上、好ましくは数μm以上となっている。なお、離型処理層41qのうねり成分は、母材41pの下地面141jと略等しくなっている。離型処理層41qに形成する装飾凹凸段差Δと、離型処理層41q又は下地面141jのうねり成分PV値A0等との関係は、第1実施形態の場合と同様であるので、詳細な説明は省略する。 It is assumed that the thickness t of the
t> Δ (5)
It has become. Thus, by making the value of the thickness t of the
本実施形態のように上型41に離型処理層41qを設けることにより、装飾転写部41dの変更が容易である。つまり、離型処理層41qをウェットエッチング等によって除去すると、母材41pの下地面141jが露出し、この下地面141jは既定のうねりを有するので、この下地面141j上に再度離型処理層41qを形成し、ドライエッチング等によって別パターンの装飾転写部41dを形成すれば、1つの母材41pに複数種類の装飾転写部41dを簡易に設けることができ、コストダウンを達成できる。なお、離型処理層41qは、これが劣化した場合に剥離することもできる。この場合、上型41の寿命を比較的長くすることができる。
As in the present embodiment, by providing the upper mold 41 with the release treatment layer 41q, the decoration transfer portion 41d can be easily changed. That is, when the mold release layer 41q is removed by wet etching or the like, the lower ground surface 141j of the base material 41p is exposed, and the base surface 141j has a predetermined undulation. When the decorative transfer portion 41d having a different pattern is formed by dry etching or the like, a plurality of types of decorative transfer portions 41d can be easily provided on one base material 41p, and cost reduction can be achieved. In addition, the mold release process layer 41q can also be peeled when this deteriorates. In this case, the life of the upper mold 41 can be made relatively long.
なお、離型処理層41qに装飾転写部41dを形成した後、離型処理層41qの表面である転写面41a全体をGCIBで軽くエッチングすることができ、転写面41aの鏡面性を高めることができる。
Note that after the decoration transfer portion 41d is formed on the release treatment layer 41q, the entire transfer surface 41a, which is the surface of the release treatment layer 41q, can be lightly etched with GCIB, and the mirror surface property of the transfer surface 41a can be improved. it can.
以上、実施形態に即して本発明を説明したが、本発明は、上記実施形態に限定されるものではなく、様々な変形が可能である。例えば、成形品10の上面10aは、円筒面に限らず、平面、球面、放物面等とすることができる。この場合、平面、球面、放物面等の理想面からのずれをうねり成分と考えるものとする。
As mentioned above, although this invention was demonstrated according to embodiment, this invention is not limited to the said embodiment, Various deformation | transformation are possible. For example, the upper surface 10a of the molded product 10 is not limited to a cylindrical surface, but may be a flat surface, a spherical surface, a paraboloid, or the like. In this case, a deviation from an ideal surface such as a plane, a spherical surface, or a paraboloid is considered as a swell component.
以上の説明では、成形品10の上面10aにのみ装飾転写部41dを形成する場合について説明したが、下型42も上型41と同様に加工することで、下面10bにも同一パターン又は別パターンの装飾転写部41dを形成することができる。
In the above description, the case where the decorative transfer portion 41d is formed only on the upper surface 10a of the molded product 10 has been described. However, by processing the lower mold 42 in the same manner as the upper mold 41, the same pattern or another pattern is formed on the lower surface 10b. The decorative transfer portion 41d can be formed.
また、上記実施形態において、エッチングによって上型41に装飾転写部41dを形成するためのマスクMAは、下地面41jをコートするレジストに限らず、上型41から離れて配置される金属板であってもよい。この場合、金属板に形成された開口パターンに対応する装飾転写部41dを形成することができる。
In the above embodiment, the mask MA for forming the decorative transfer portion 41d on the upper die 41 by etching is not limited to the resist that coats the base surface 41j, but is a metal plate that is arranged away from the upper die 41. May be. In this case, the decoration transfer portion 41d corresponding to the opening pattern formed on the metal plate can be formed.
また、上記実施形態において、成形品10をガラスで形成したが、樹脂で形成してもよい。
Moreover, in the said embodiment, although the molded article 10 was formed with glass, you may form with resin.
また、上記実施形態において、装飾部10dを凸状としたが、凹形状にしてもよい。この場合、成形型40の装飾転写部41dは、装飾部10dの形状に対応した凸形状となる。
In the above embodiment, the decorative portion 10d is convex, but may be concave. In this case, the decorative transfer portion 41d of the mold 40 has a convex shape corresponding to the shape of the decorative portion 10d.
Claims (12)
- 所定領域で巨視的に鏡面状の成形面を有し、
前記所定領域内であって前記成形面上の局所的な領域に凹及び凸のいずれかで形成される装飾部を有し、
前記装飾部の段差量は、前記成形面から対称的な形状成分を加味した凹凸成分の半分より小さい成形品。 Having a macroscopically shaped molding surface in a predetermined area,
In the predetermined area, having a decorative portion formed in any one of concave and convex in a local area on the molding surface,
The step of the decorative part is a molded product that is smaller than half of the concavo-convex component taking into account the symmetrical shape component from the molding surface. - 前記装飾部の段差をΔとし、前記成形面の表面形状のPV値をA1としたときに、以下の条件式を満足する、請求項1に記載の成形品。
A1/2>Δ The molded article according to claim 1, wherein the following conditional expression is satisfied, where Δ is a step of the decorative portion and A1 is a PV value of the surface shape of the molding surface.
A1 / 2> Δ - 前記装飾部の段差量は、1μm以下である、請求項1及び2のいずれか一項に記載の成形品。 The molded product according to any one of claims 1 and 2, wherein a step amount of the decorative portion is 1 µm or less.
- ガラスで形成される、請求項1から3までのいずれか一項に記載の成形品。 The molded product according to any one of claims 1 to 3, which is formed of glass.
- 所定領域で巨視的に鏡面状の転写面を有し、
前記所定領域内であって前記転写面上の局所的な領域に凹及び凸のいずれかで形成される装飾転写部を有し、
前記装飾転写部の段差量は、前記転写面から対称的な形状成分を加味した凹凸成分の半分より小さい成形型。 It has a macroscopic mirror-like transfer surface in a predetermined area,
A decorative transfer portion formed in one of a concave and a convex in a local area on the transfer surface within the predetermined area;
A molding die in which the step amount of the decorative transfer portion is smaller than half of the concavo-convex component taking into account a symmetrical shape component from the transfer surface. - 前記装飾転写部の段差をΔとし、前記転写面の表面形状のPV値をA1としたときに、以下の条件式を満足する、請求項5に記載の成形型。
A1/2>Δ The mold according to claim 5, wherein the following conditional expression is satisfied, where Δ is a step of the decorative transfer portion and A1 is a PV value of the surface shape of the transfer surface.
A1 / 2> Δ - 前記転写面は、離型処理層を有する、請求項5及び6のいずれか一項に記載の成形型。 The mold according to any one of claims 5 and 6, wherein the transfer surface has a release treatment layer.
- 前記離型処理層の厚さは、前記装飾転写部の段差量よりも大きい、請求項7に記載の成形型。 The mold according to claim 7, wherein a thickness of the release treatment layer is larger than a step amount of the decoration transfer portion.
- 成形型の転写面の所定領域を巨視的に鏡面状に加工する鏡面加工工程と、
前記鏡面加工工程後、前記所定領域内の前記転写面上に装飾転写部に対応するマスクパターンを形成するマスク形成工程と、
前記マスクパターンの露出部分をドライエッチングによってエッチングし、前記装飾転写部を形成する装飾加工工程と、
を備える成形型の製造方法。 A mirror surface processing step for processing a predetermined region of the transfer surface of the molding die into a mirror surface macroscopically;
A mask forming step of forming a mask pattern corresponding to a decorative transfer portion on the transfer surface in the predetermined region after the mirror surface processing step;
Etching the exposed portion of the mask pattern by dry etching to form the decorative transfer portion; and
The manufacturing method of a shaping | molding die provided with. - 前記ドライエッチングにおいて、ガスクラスターイオンビームを用いる、請求項9に記載の成形型の製造方法。 The method for manufacturing a mold according to claim 9, wherein a gas cluster ion beam is used in the dry etching.
- 前記鏡面加工工程後、前記マスク形成工程前に、鏡面状の下地面上に離型処理層を形成する層形成工程を備える、請求項9及び10のいずれか一項に記載の成形型の製造方法。 The manufacturing method of the shaping | molding die as described in any one of Claim 9 and 10 provided with the layer formation process which forms a mold release process layer on the mirror-shaped lower ground after the said mirror-finishing process and before the said mask formation process. Method.
- 前記鏡面加工工程において、前記転写面は、機械研磨によって鏡面加工される、請求項9から11までのいずれか一項に記載の成形型の製造方法。 The method for manufacturing a mold according to any one of claims 9 to 11, wherein, in the mirror finishing step, the transfer surface is mirror finished by mechanical polishing.
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6054819A (en) * | 1983-09-05 | 1985-03-29 | Toshiba Corp | Resin molding die and manufacture thereof |
JP2001348243A (en) * | 2000-06-01 | 2001-12-18 | Noboru Mikami | Method for forming slumping glass |
JP2004352584A (en) * | 2003-05-30 | 2004-12-16 | Matsushita Electric Ind Co Ltd | Mold for shaping and its manufacturing method |
JP2008040322A (en) * | 2006-08-09 | 2008-02-21 | Matsushita Electric Ind Co Ltd | Method for manufacturing antireflection structure |
WO2009127447A1 (en) * | 2008-04-16 | 2009-10-22 | Zignago Vetro S.P.A. | Method and device for mould lubrication in glass article production machines |
JP2013199425A (en) * | 2006-09-05 | 2013-10-03 | Asahi Glass Co Ltd | Method for forming convexoconcave pattern |
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2015
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6054819A (en) * | 1983-09-05 | 1985-03-29 | Toshiba Corp | Resin molding die and manufacture thereof |
JP2001348243A (en) * | 2000-06-01 | 2001-12-18 | Noboru Mikami | Method for forming slumping glass |
JP2004352584A (en) * | 2003-05-30 | 2004-12-16 | Matsushita Electric Ind Co Ltd | Mold for shaping and its manufacturing method |
JP2008040322A (en) * | 2006-08-09 | 2008-02-21 | Matsushita Electric Ind Co Ltd | Method for manufacturing antireflection structure |
JP2013199425A (en) * | 2006-09-05 | 2013-10-03 | Asahi Glass Co Ltd | Method for forming convexoconcave pattern |
WO2009127447A1 (en) * | 2008-04-16 | 2009-10-22 | Zignago Vetro S.P.A. | Method and device for mould lubrication in glass article production machines |
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