WO2015182551A1 - Produit optique, lentille de caméra, et filtre de caméra - Google Patents

Produit optique, lentille de caméra, et filtre de caméra Download PDF

Info

Publication number
WO2015182551A1
WO2015182551A1 PCT/JP2015/064919 JP2015064919W WO2015182551A1 WO 2015182551 A1 WO2015182551 A1 WO 2015182551A1 JP 2015064919 W JP2015064919 W JP 2015064919W WO 2015182551 A1 WO2015182551 A1 WO 2015182551A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
film
adjacent
examples
layers
Prior art date
Application number
PCT/JP2015/064919
Other languages
English (en)
Japanese (ja)
Inventor
高橋　清久
加藤　祐史
Original Assignee
東海光学株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東海光学株式会社 filed Critical 東海光学株式会社
Publication of WO2015182551A1 publication Critical patent/WO2015182551A1/fr

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00—Filters or other obturators specially adapted for photographic purposes

Definitions

  • the present invention relates to an optical product having an optical multilayer film, a camera lens, and a camera filter.
  • the thing of the following patent document 1 is known as a plastic lens which improved durability, such as tear resistance and sufficient hardness.
  • the lens of Patent Document 1 includes an antireflection layer in which a low refractive index film and a high refractive index film are alternately laminated on the surface of a hard coat layer on a lens substrate, and the low refractive index film is formed of silicon oxide.
  • This is a film (SiO 2 )
  • the high refractive index film is a silicon nitride film (Si 3 N 4 ), and is laminated so as to form a total of 4 to 5 layers.
  • the antireflection layer of Patent Document 1 is a layer in which 4-5 layers of silicon oxide films and silicon nitride films are alternately stacked, and there is room for further improvement in antireflection properties and durability against visible light. Yes. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an optical product, a camera lens, and a camera filter that have higher durability performance while having sufficient antireflection performance.
  • the invention according to claim 1 is an optical product, wherein an optical multilayer film is formed on one side or both sides of a substrate, and the optical multilayer film has an outermost layer oxidized. It has a structure of 11 layers or more in which a silicon oxide film and a silicon nitride film are alternately laminated in a state of being a silicon film, and the physical film thickness of the outermost layer is 30 nm or more and 75 nm or less, and is adjacent to the outermost layer.
  • the physical film thickness of the first adjacent layer, which is a layer to be performed, is 2 nm or more and 10 nm or less.
  • the invention described in claim 2 is the above invention, wherein the layer is adjacent to the first adjacent layer and is the The physical thickness of the second adjacent layer that is not a surface layer is 10 nm or more and 50 nm or less.
  • the invention described in claim 3 is a camera lens, using the optical product of the present invention, wherein the substrate is It is a camera lens base.
  • the invention described in claim 4 is a camera filter, and uses the optical product of the above invention, The substrate is a filter substrate for a camera.
  • 6 is a graph showing the spectral reflectance distribution in the visible region in Comparative Example 1-1 (6-layer film), Comparative Example 1-2 (7-layer film), and Comparative Example 1-3 (8-layer film).
  • 6 is a graph showing spectral reflectance distributions in the visible region in Comparative Example 1-4 (9-layer film), Comparative Example 1-5 (10-layer film), and Example 1-1 (11-layer film).
  • 6 is a graph showing the spectral reflectance distribution in the visible region in Example 1-2 (12-layer film), Example 1-3 (13-layer film), and Example 1-4 (14-layer film).
  • Example 1-5 15-layer film
  • Example 1-6 (16-layer film), Example 1-7 (17-layer film), and Example 1-8 (18-layer film)
  • It is a graph which shows reflectance distribution.
  • 6 is a graph of maximum reflectance and average reflectance in the visible region of Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5.
  • Comparative Example 2-1 11 layer film 1)
  • Example 2-1 11 layer film 2)
  • Example 2-2 11 layer film 3
  • Example 2-3 (11 layer film 4
  • Example 6 is a graph showing the spectral reflectance distribution in the visible region in 2-4 (11 layer film 5) and Comparative Example 2-2 (11 layer film 6).
  • Example 2-3 (18 layer film 1), Example 2-5 (18 layer film 2), Example 2-6 (18 layer film 3), Example 2-7 (18 layer film 4), Example 6 is a graph showing the spectral reflectance distribution in the visible region in 2-8 (18-layer film 5) and Comparative Example 2-4 (11-layer film 6).
  • an optical multilayer film is formed on one side or both sides of the substrate.
  • the substrate may be made of any material, and preferably has translucency.
  • the base material include glass and resin.
  • One or a plurality of intermediate films including a hard coat film may be disposed between the substrate and the optical multilayer film, and an antifouling film may be provided on the optical multilayer film (air side).
  • a surface film may be formed.
  • the optical multilayer film appropriately satisfies the following requirements.
  • the optical multilayer film When the optical multilayer film is formed on both sides, preferably all the films satisfy the following requirements, and more preferably all the films have the same laminated structure.
  • the optical multilayer film has a multilayer structure of 11 layers or more in which low refractive index layers and high refractive index layers are alternately laminated.
  • the outermost layer (outer side, air side, side far from the substrate), that is, the outermost layer is a low refractive index layer, and its adjacent layers (the layer adjacent to the outermost layer, the first adjacent layer) are high refractive index layers.
  • a low refractive index layer and a high refractive index layer are alternately arranged.
  • the low refractive index layer is formed into a film using silicon oxide
  • the high refractive index layer is formed into a film using silicon nitride.
  • the silicon oxide is preferably silicon dioxide (SiO 2 ).
  • the physical thickness of the outermost layer (low refractive index layer, silicon oxide film) is 30 nm (nanometer) or more and 75 nm or less, and the first adjacent layer (high refractive index layer, silicon nitride film) that is the adjacent layer is The physical film thickness is 2 nm or more and 10 nm or less.
  • the maximum reflectance or average reflectance for light having a wavelength in the visible region (for example, 400 nm to 700 nm) is not satisfactory. It will be enough. Specifically, the condition that the maximum reflectance for visible light is 0.7% or less and the average reflectance is 0.6% or less is not satisfied. On the other hand, if the outermost layer is less than 30 nm, or the physical film thickness of the first adjacent layer is less than 2 nm, the hardness cannot be obtained sufficiently, and scratches are easily formed, resulting in insufficient laceration resistance.
  • the physical film thickness of the next adjacent layer is 10 nm or more and 50 nm or less.
  • the second adjacent layer is a low refractive index layer and is a silicon oxide film.
  • the physical film thickness of the second adjacent layer is less than 10 nm, sufficient hardness cannot be obtained, and scratches are easily formed, resulting in laceration resistance. Not enough.
  • the physical film thickness of the second adjacent layer exceeds 50 nm, it is impossible to obtain a further preferable low maximum visible reflectance or average reflectance for visible light.
  • the optical multilayer film is preferably formed by a vacuum deposition method, a sputtering method, or the like.
  • the base is preferably a camera lens base or a camera filter base
  • the optical product is a camera lens or a camera lens filter attached to the front part thereof.
  • the substrate is a resin
  • it is more susceptible to scratching than glass.
  • the optical multilayer film is higher than that of the resin. Therefore, in the state of the substrate as it is, light is reflected from the resin.
  • the optical multilayer film is added, the reflection of light is suppressed. Especially in camera lenses, camera lens filters, etc., it is considered that the sufficient prevention of light reflection is a prerequisite for performance.
  • the above optical products can satisfy the conditions. It becomes. Further, when the substrate is glass, it is less likely to be scratched than the resin, but by providing the optical multilayer film on the surface, the tear resistance can be further improved and the durability can be further improved. In the case of camera lenses, camera filters, etc., which are designed for outdoor use or high-end products, there is a case where high-level durability that lasts excellent antireflection properties is required. Optical products can meet such demands.
  • Examples and comparative examples were prepared by forming optical multilayer films having different structures on both surfaces of each of the same substrates.
  • Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5 were manufactured in order to grasp the difference in characteristics mainly due to the change in the number of layers of the optical multilayer film.
  • Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 were produced in order to grasp the difference in characteristics mainly due to the change in the physical film thickness of the outermost layer of the optical multilayer film and the adjacent layer. did.
  • Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5 Each of the substrates in Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5 is a standard camera filter substrate having a diameter of 74 millimeters (mm) and a thickness of 2.0 mm. It is a flat disk made of transparent white plate glass, and its refractive index is 1.56.
  • an optical multilayer film described below was formed on both surfaces of the substrate.
  • the optical multilayer film has the same film structure on both sides in the same substrate.
  • the number of layers of the optical multilayer film on each surface of the substrate is different from each other.
  • Layer to 18 layers and 6 to 10 layers As shown in the following Table 1, the number of layers of the optical multilayer film on each surface of the substrate is different from each other. Layer to 18 layers and 6 to 10 layers.
  • the layer closest to the substrate corresponds to a row having 1 layer, and the outermost layer is a row having 6 to 10 layers in order of Comparative Examples 1-1 to 1-5.
  • the lines corresponding to the number of layers 11 to 18 are sequentially corresponded.
  • the numbers in the rows with 1 to 18 layers indicate the physical film thickness (nm), “H” attached to the right of the number indicates a high refractive index layer (silicon nitride film), and “L” It shows that it is a low refractive index layer (silicon oxide film).
  • Each of the optical multilayer films of Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5 is an optical multilayer film in which a low refractive index layer and a high refractive index layer are alternately deposited.
  • the refractive index layer is formed using a silicon oxide film (SiO 2 ), and the high refractive index layer is formed using a silicon nitride film (Si 3 N 4 ).
  • the outermost layer is a low refractive index layer.
  • the refractive index of the silicon oxide film is the same in Examples 1-1 to 1-8 to Comparative Examples 1-1 to 1-5, and the refractive index of the silicon nitride film is also the same.
  • the optical multilayer films of Examples 1-1 to 1-8 to Comparative Examples 1-1 to 1-5 were all formed by vacuum deposition.
  • FIG. 1 to 4 show the reflectance distribution in the visible region of Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5.
  • Table 1 the maximum reflectance (%) and average reflectance (%) in the spectral reflectance distribution in the visible region (wavelength region of 400 nm to 700 nm) are shown.
  • FIG. 5 shows a graph of the maximum reflectance and the average reflectance of Examples 1-1 to 1-8 and Comparative Examples 1-1 to 1-5. According to these charts (particularly FIG. 5), in Examples 1-1 to 1-8 in which the number of layers is 11 or more, the maximum reflectance with respect to visible light is 0.7% or less and the average reflectance is 0. .6% or less is satisfied, and reflection is sufficiently prevented.
  • Comparative Examples 1-1 to 1-5 in which the number of layers is 10 or less, the conditions are not satisfied, and sufficient antireflection performance cannot be obtained.
  • Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 were prepared in the same manner as Example 1-1 except for the difference in the number of layers and the physical film thickness of each layer. In Examples 2-1 to 2-4 and Comparative Examples 2-1 to 2-2, the number of layers was 11 (per one side). Examples 2-5 to 2-8 and Comparative Examples 2-3 to 2- 4 has 18 layers.
  • the layer structures and the like according to Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 are shown in the following Table 2, which is the same as Table 1.
  • the physical film thickness of the 10th row is 15.00 nm and exceeds 10 nm, and the physical layer thickness of the second adjacent layer (9 rows) below it is 9.82 nm and less than 10 nm. Therefore, even if the number of layers is 11 or more, the maximum reflectance and the average reflectance do not satisfy the above conditions.
  • the physical film thickness of the outermost layer is in the range of 30 to 75 nm at 69.99 nm
  • the physical thickness of the first adjacent layer is Since the film thickness exceeds 10 nm at 15.00 nm, even if the number of layers is 11 or more, the maximum reflectance and average reflectance in the visible region do not satisfy the above conditions.
  • the number of layers is 11 or more, and the physical film thickness of the outermost layer is in the range of 30 to 70 nm. Since the physical film thickness of the first adjacent layer is in the range of 2 to 10 nm, the maximum reflectance and average reflectance in the visible region satisfy the above conditions, and sufficient antireflection can be obtained.
  • Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 a test on hardness or laceration resistance was performed by a pencil method (JIS-K5600-5-4) according to JIS standards. . That is, a pencil having various hardnesses is applied to each surface of Examples 2-1 to 2-8 and Comparative Examples 2-1 to 2-4 with a predetermined pressing force, and a visible scratch is attached. I investigated whether or not.
  • the types of pencil hardness were 7H, 8H, 9H, and 10H. Table 3 below shows the results of the test. “ ⁇ ” indicates that no scratch was found even after the application of the pencil, and “X” indicates that a scratch was found in the applied portion of the pencil.
  • silicon oxide films and silicon nitride films are alternately arranged so that the outermost layer is a silicon oxide film and the first adjacent layer adjacent thereto is
  • the number of layers is 11 or more
  • the physical film thickness of the outermost layer is in the range of 30 nm to 75 nm
  • the physical film thickness of the first adjacent layer is 2 nm to 10 nm.
  • the maximum reflectance with respect to visible light is 0.7% or less and the average reflectance is 0.6% or less, and a sufficient antireflection function can be imparted.
  • an optical multilayer film in which silicon oxide films and silicon nitride films are alternately arranged so that the outermost layer is a silicon oxide film and the first adjacent layer is a silicon nitride film is provided.
  • the physical film thickness of the outermost layer is in the range of 30 nm to 75 nm and the physical film thickness of the first adjacent layer is in the range of 2 nm to 10 nm, a 10H pencil The durability can be increased to the extent that no scratches are attached.
  • the physical film thickness of the second adjacent layer adjacent to the first adjacent layer is 10 nm to 50 nm. If it is within the range, it is possible to secure even more sufficient antireflection performance or durability performance.
  • the optical multilayer film of the embodiment can be formed on various substrates. For example, it can be formed on a glass lens base made of glass or synthetic resin, and a spectacle lens (including no degree) having excellent anti-reflection performance for visible light can be manufactured. Further, by forming the optical multilayer film on the windshield substrate, it is possible to produce a watch windshield having the same characteristics as in the examples. Furthermore, a camera lens having the same characteristics as in the embodiment can be produced by applying the optical multilayer film to the camera lens substrate.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Lens Barrels (AREA)

Abstract

Le problème décrit par l'invention est de fournir un produit optique ayant un niveau supérieur de durabilité, tout en ayant une performance antireflet adéquate. Selon la solution de l'invention, dans ce produit optique, un film optique multicouche est formé sur une ou les deux surfaces d'une base. Le film optique multicouche a une structure d'au moins 11 couches, dans laquelle des films d'oxyde de silicium et des films de nitrure de silicium sont stratifiés alternativement, avec un film d'oxyde de silicium comme la couche le plus à l'extérieur. L'épaisseur de film physique de la couche le plus à l'extérieur est de 30 à 75 nm (inclus), et l'épaisseur de film physique d'une première couche adjacente, qui est la couche adjacente à la couche le plus à l'extérieur, est de 2 a 10 nm.
PCT/JP2015/064919 2014-05-29 2015-05-25 Produit optique, lentille de caméra, et filtre de caméra WO2015182551A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-111571 2014-05-29
JP2014111571A JP2015225305A (ja) 2014-05-29 2014-05-29 光学製品、カメラレンズ、及びカメラ用フィルタ

Publications (1)

Publication Number Publication Date
WO2015182551A1 true WO2015182551A1 (fr) 2015-12-03

Family

ID=54698879

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/064919 WO2015182551A1 (fr) 2014-05-29 2015-05-25 Produit optique, lentille de caméra, et filtre de caméra

Country Status (2)

Country Link
JP (1) JP2015225305A (fr)
WO (1) WO2015182551A1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11121728A (ja) * 1997-10-14 1999-04-30 Sony Corp 固体撮像素子
JP2006258414A (ja) * 2005-02-17 2006-09-28 Nippon Electric Glass Co Ltd 炉内部観察装置及び炉内部観察方法
WO2013183457A1 (fr) * 2012-06-08 2013-12-12 旭硝子株式会社 Elément optique

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11121728A (ja) * 1997-10-14 1999-04-30 Sony Corp 固体撮像素子
JP2006258414A (ja) * 2005-02-17 2006-09-28 Nippon Electric Glass Co Ltd 炉内部観察装置及び炉内部観察方法
WO2013183457A1 (fr) * 2012-06-08 2013-12-12 旭硝子株式会社 Elément optique

Also Published As

Publication number Publication date
JP2015225305A (ja) 2015-12-14

Similar Documents

Publication Publication Date Title
KR102392445B1 (ko) 내스크래치성 화학 강화 유리 기재 및 이의 용도
TWI645212B (zh) Anti-glare and anti-reflection member and manufacturing method thereof
US20160306194A1 (en) Optical product, and spectacle lens and spectacles
US9069125B2 (en) Optical product and method for manufacturing same
TWI787766B (zh) 光學積層體及物品
WO2003074440A2 (fr) Substrat transparent a revetement antireflets ayant proprietes de resistance a l'abrasion
KR102306310B1 (ko) 감시 윈도우 등에 사용하기 위한 코팅된 물품 및 그의 제조 방법
JP2008096828A (ja) 光学物品の製造方法とその光学物品
US20060245056A1 (en) Thin-film structure with counteracting layer
JP5976363B2 (ja) 光学部材
US9651713B2 (en) Optical product and spectacle plastic lens
JP2014065169A (ja) 展示物カバー用ガラスフィルム積層体
WO2015182551A1 (fr) Produit optique, lentille de caméra, et filtre de caméra
TWI582469B (zh) 圖案非可見性優異的透明導電性光學片
JP2017206392A (ja) ガラス物品
JP2017032852A (ja) 反射防止膜及び光学部品
TW202229929A (zh) 光學積層體及物品
JPWO2008133136A1 (ja) 反射鏡
WO2017002965A1 (fr) Produit optique, lentille en plastique et verres de lunettes
KR20170028190A (ko) 차량용 디스플레이의 글래스 또는 필름 코팅층 및 그 코팅방법
WO2020251060A1 (fr) Élément optique
CN211263829U (zh) 等效虚设层抗反射镀膜
WO2023195500A1 (fr) Substrat transparent fixé à un film antireflet et dispositif d'affichage d'image
KR20240009721A (ko) 긁힘 방지 기능을 갖는 반사 방지 코팅 및 그것을 갖는 렌즈
JP2016061792A (ja) 光学製品及びレンズ用フィルタ

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15799579

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15799579

Country of ref document: EP

Kind code of ref document: A1