WO2015178301A1 - Conveyance device, and wet processing device - Google Patents
Conveyance device, and wet processing device Download PDFInfo
- Publication number
- WO2015178301A1 WO2015178301A1 PCT/JP2015/064000 JP2015064000W WO2015178301A1 WO 2015178301 A1 WO2015178301 A1 WO 2015178301A1 JP 2015064000 W JP2015064000 W JP 2015064000W WO 2015178301 A1 WO2015178301 A1 WO 2015178301A1
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- WIPO (PCT)
- Prior art keywords
- bearing
- transport
- liquid
- liquid storage
- dust
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G13/00—Roller-ways
- B65G13/11—Roller frames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G39/00—Rollers, e.g. drive rollers, or arrangements thereof incorporated in roller-ways or other types of mechanical conveyors
- B65G39/02—Adaptations of individual rollers and supports therefor
- B65G39/09—Arrangements of bearing or sealing means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G45/00—Lubricating, cleaning, or clearing devices
- B65G45/10—Cleaning devices
- B65G45/22—Cleaning devices comprising fluid applying means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C13/00—Rolls, drums, discs, or the like; Bearings or mountings therefor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
Definitions
- the technology disclosed in this specification relates to a transfer device and a wet process device.
- a wet process device that performs a wet process such as a cleaning process or a resist coating process on the surface of a glass substrate while the glass substrate is transported by a transport device.
- the transfer device provided in the wet process apparatus usually has a shaft-like transfer roller and bearing portions that are arranged at both ends of the transfer roller and rotatably support the transfer roller around its axis in the transfer direction of the glass substrate. It is set as the structure distribute
- Patent Document 1 discloses a wet process apparatus that can prevent such dust and dust generated from the bearing portion of the transport apparatus from adhering to the glass substrate.
- Another object of the present invention is to provide a transfer device and a wet process device that can be suppressed.
- the technology disclosed in this specification includes a conveyance roller that extends in a shaft shape and conveys a conveyance member along a conveyance direction, a bearing portion that rotatably supports the conveyance roller around the axis, and the bearing. And a holding member that has a liquid storage portion and at least a part of a sliding contact portion of the bearing portion is exposed in the liquid storage portion.
- the transport device described above by pouring a liquid such as pure water into the liquid storage part, it is possible to immerse the part exposed in the liquid storage part in the sliding contact part of the bearing part in the liquid.
- the liquid in the liquid storage portion functions as a lubricant for the bearing portion, and it is possible to prevent or suppress the generation of dust or dust at the sliding contact portion of the bearing portion.
- the dust or dust can be washed away from the sliding contact portion by the liquid in the liquid storage portion, and the dust or dust adheres to the transport member. This can be prevented or suppressed.
- the apparatus can be prevented from being enlarged.
- the apparatus it is possible to prevent or suppress the dust generated from the sliding contact portion of the bearing portion from adhering to the conveying member while avoiding an increase in size of the device.
- the bearing portion includes an annular annular portion disposed around an axis of the conveying roller, and a plurality of balls that are interposed between the conveying roller and the annular portion and are slidably supported by the annular portion.
- the sliding contact portion may be a portion that supports the plurality of balls in the annular portion.
- the liquid container may be extended in a groove shape.
- a liquid supply unit that supplies liquid into the liquid storage unit is provided at one end in the extending direction of the liquid storage unit, and the liquid flowing through the liquid storage unit is discharged at the other end in the extending direction of the liquid storage unit.
- a liquid discharge part may be provided.
- the liquid supply unit sequentially supplies new liquid into the liquid storage unit, and the liquid discharged from the surface of the bearing unit is sequentially discharged from the liquid storage unit at the liquid discharge unit.
- the liquid storage portion extends along the transport direction, with the one end disposed on the upstream side in the transport direction and the other end disposed on the downstream side in the transport direction. May be.
- dust or dirt generated at the sliding contact portion of the bearing portion can be sequentially flowed from the upstream side to the downstream side in the transport direction.
- the transport member is a substrate, the transport rollers are arranged in parallel in the transport direction so that the extending direction thereof is orthogonal to the transport direction, and the bearing portions are respectively disposed at both ends of the transport roller. May be.
- Another technique disclosed in the present specification relates to a wet process apparatus including the above-described transport apparatus and a wet process tank that performs a wet process on the substrate transported along the transport direction.
- a wet process such as a cleaning process or a coating process for a substrate
- cleaning water is sprayed onto the surface of the substrate, and the sprayed cleaning water is circulated in the wet process tank and used again as cleaning water.
- dust, dust, or the like flows into the cleaning water
- the dust, dust, or the like tends to adhere to the substrate.
- dust and dirt are caused to flow down from the sliding contact portion of the bearing portion by the liquid in the liquid storage portion, so that it can be prevented or suppressed from flowing out into the cleaning water.
- the wet process referred to in this specification is not limited to the substrate cleaning process and the substrate coating process, and includes other processes such as a dipping process for the substrate.
- a transport apparatus and a wet process apparatus that can prevent or suppress dust and dust generated from a bearing portion from adhering to a transport member while avoiding an increase in size of the apparatus are provided. be able to.
- FIG. 5 is a cross-sectional view taken along line VV in FIG. 4, showing a cross-sectional configuration of a part of the array substrate.
- Block diagram for explaining a processing procedure by each manufacturing apparatus for a glass substrate The side view of the conveying apparatus which concerns on Embodiment 1.
- Plan view of transfer device An enlarged perspective view in which the conveying device is enlarged at the downstream end in the conveying direction.
- FIG. 11 is a cross-sectional view taken along the line XI-XI in FIG. Front view of the bearing portion in a state where pure water is poured into the liquid storage portion
- FIG. FIG. 14 is a cross-sectional view of the XIV-XIV cross section of FIG. 13, and is a cross-sectional view of the vicinity of the bearing portion in a state where pure water is poured into the liquid storage portion Sectional drawing of the conveying apparatus which concerns on Embodiment 3.
- Enlarged perspective view of a part of the transport device In the examples, a table showing detection results of gate insulating film foreign matters and gate insulating film defects before and after application of the present invention. Table showing detection results of interlayer insulating film foreign matter and interlayer insulating film defect before and after application of the present invention in Examples
- a cleaning device 50 (see FIG. 7) that conveys the glass substrate 30A while performing a cleaning process on the surface of the glass substrate 30A in the manufacturing process of the liquid crystal panel 11 that is a component of the liquid crystal display device 10.
- a part of each drawing shows an X-axis, a Y-axis, and a Z-axis, and each axis direction is drawn in a common direction in each drawing. 1, 3, and 5, the upper side of the figure is the upper side (front side) of the liquid crystal display device 10.
- the liquid crystal display device 10 includes a liquid crystal panel 11, an IC chip 17 that is an electronic component that is mounted on the liquid crystal panel 11 and drives the liquid crystal panel 11, and the IC chip 17.
- a control board 19 that supplies various input signals from the outside
- a flexible board 18 that electrically connects the liquid crystal panel 11 and the external control board 19, and a backlight device 14 that is an external light source that supplies light to the liquid crystal panel 11.
- the liquid crystal display device 10 includes front and back external members 15 and 16 for housing and holding the liquid crystal panel 11 and the backlight device 14 assembled to each other.
- An opening 15A for visually recognizing an image displayed on the liquid crystal panel 11 is provided.
- the backlight device 14 includes a chassis 14A having a substantially box shape that opens toward the front side, and a light source (cold cathode tube, LED, organic EL, etc.) not shown disposed in the chassis 14A. And an optical member (not shown) arranged so as to cover the opening of the chassis 14A.
- the optical member has a function of converting light emitted from the light source into planar light. The light that has been planarized through the optical member is incident on the liquid crystal panel 11 and is used to display an image on the liquid crystal panel 11.
- the liquid crystal panel 11 has a vertically long rectangular shape as a whole, and the long side direction coincides with the Y-axis direction of each drawing, and the short side direction corresponds to the X-axis direction of each drawing.
- a display area A1 capable of displaying an image is arranged on the majority thereof, and no image is displayed at a position biased to one end side (the lower side in FIG. 2) in the long side direction.
- Area A2 is arranged.
- An IC chip 17 and a flexible substrate 18 are mounted on a part of the non-display area A2 by pressure-bonding via an anisotropic conductive film (not shown).
- a frame-shaped one-dot chain line that is slightly smaller than a color filter substrate 20 described later forms an outer shape of the display area A 1, and an area outside the one-dot chain line is It is a non-display area A2.
- the liquid crystal panel 11 includes a pair of glass substrates 20 and 30 having excellent translucency, and a liquid crystal layer 11A including liquid crystal molecules that are substances whose optical characteristics change with application of an electric field. It is equipped with.
- the two substrates 20 and 30 constituting the liquid crystal panel 11 are bonded together by a sealing material (not shown) while maintaining a cell gap corresponding to the thickness of the liquid crystal layer 11A.
- the front side (front side) substrate 20 is the color filter substrate 20
- the back side (back side) substrate 30 is the array substrate (an example of a circuit board) 30. As shown in FIG.
- alignment films 11B and 11C for aligning liquid crystal molecules contained in the liquid crystal layer 11A are formed on the inner surfaces of both the substrates 20 and 30, respectively. Further, polarizing plates 11D and 11E are attached to the outer surface sides of the glass substrates 20A and 30A constituting both the substrates 20 and 30, respectively.
- the color filter substrate 20 has a short side dimension substantially the same as that of the array substrate 30, but the long side dimension is smaller than that of the array substrate 30, and one side of the long side direction with respect to the array substrate 30.
- the color filter substrate 20 does not overlap the other end (the lower side shown in FIG. 1) of the array substrate 30 in the long side direction, and both the front and back plate surfaces are exposed to the outside.
- the mounting area for the IC chip 17 and the flexible substrate 18 is secured here.
- the glass substrate 30A constituting the array substrate 30 has the color filter substrate 20 and the polarizing plate 11E bonded to the main portion thereof, and the portion where the mounting area of the IC chip 17 and the flexible substrate 18 is secured is the color filter substrate 20 and It is not superimposed on the polarizing plate 11E.
- a TFT which is a switching element having three electrodes 32A to 32C
- a large number of pixel electrodes 33 made of a transparent conductive film such as a thin film transistor (ITO) 32 and an indium film (ITO) are provided side by side.
- a gate wiring 34 and a source wiring 35 are arranged so as to surround the grid. The gate wiring 34 and the source wiring 35 are connected to the gate electrode 32A and the source electrode 32B of the TFT 32, respectively, and the pixel electrode 33 is connected to the drain electrode 32C of the TFT 32 via a drain wiring (not shown).
- the array substrate 30 is provided with a capacitor wiring 36 that is parallel to the gate wiring 34 and overlaps the pixel electrode 33 in plan view.
- the capacitor wirings 36 are alternately arranged with the gate wirings 34 in the Y-axis direction.
- the gate wiring 34 is disposed between the pixel electrodes 33 adjacent in the Y-axis direction, whereas the capacitor wiring 36 is disposed at a position that substantially crosses the central portion of each pixel electrode 33 in the Y-axis direction.
- the end portion of the array substrate 30 is provided with a terminal portion routed from the gate wiring 34 and the capacitor wiring 36 and a terminal portion routed from the source wiring 35.
- Each signal or reference potential is inputted from the control board 19 shown in FIG. 1, and the drive of the TFT 32 is thereby controlled.
- the color filters are provided side by side.
- the color filter is arranged such that the colored portions 22 exhibiting R (red), G (green), and B (blue) are alternately arranged along the X-axis direction.
- the substantially lattice-shaped light-shielding part (black matrix) 23 for preventing color mixing is formed.
- the light shielding portion 23 is arranged so as to overlap with the gate wiring 34, the source wiring 35, and the capacitor wiring 36 on the array substrate 30 side in a plan view.
- a counter electrode 24 is provided on the surface of each coloring portion 22 and the light shielding portion 23 so as to face the pixel electrode 33 on the array substrate 30 side.
- one display pixel which is a display unit, is configured by the combination of the three colored portions 22 of R (red), G (green), and B (blue) and the three pixel electrodes 33 that face each other. ing.
- the TFT 32 which is a switching element provided on the array substrate 30 will be described in detail.
- the TFT 32 has a structure in which a plurality of films are stacked on the array substrate 30.
- the gate electrode 32A, the gate insulating film 37, the semiconductor film 38, and the source wiring 35 connected to the gate wiring 34 are sequentially connected from the lower layer side (glass substrate 30A side).
- a drain electrode 32C connected to the source electrode 32B and the pixel electrode 33, an interlayer insulating film 39, and a protective film 40 are stacked.
- the gate electrode 32A is made of the same material as the gate wiring 34 and is patterned on the array substrate 30 in the same process as the gate wiring 34, and is made of aluminum (Al), chromium (Cr), tander (Ta), titanium (Ti ), Copper (Cu), or a metal film alone or a laminated film of these metal nitrides.
- the gate insulating film 37 is made of, for example, a silicon oxide film (SiOx), and insulates between the gate electrode 32A and the semiconductor film 38.
- the semiconductor film 38 is made of, for example, amorphous silicon (a-Si) or a transparent amorphous oxide semiconductor (InGaZnOx). One end side is connected to the drain electrode 32C and the other end side is connected to the source electrode 32B. It functions as a channel region for conducting.
- the source electrode 32B and the drain electrode 32C contain the same material as the source wiring 35 and are patterned on the array substrate 30 in the same process as the source wiring 35.
- the source electrode 32B and the drain electrode 32C are configured by laminating first conductive films 32B1 and 32C1 on the lower layer side (semiconductor film 38 side) and second conductive films 32B2 and 32C2 on the upper layer side (interlayer insulating film 39 side).
- the first conductive films 32B1 and 32C1 on the lower layer side are made of amorphous silicon (n + Si) doped with an n-type impurity such as phosphorus (P) at a high concentration, and function as an ohmic contact layer.
- the second conductive films 32B2 and 32C2 on the upper layer side have a two-layer structure in which different metal films are stacked.
- the metal film on the lower layer side is made of titanium (Ti), and the metal film on the upper layer side is aluminum ( Al).
- the above-mentioned source electrode 32B and drain electrode 32C are arranged in an opposing manner with a predetermined interval (opening region) interposed therebetween, so that they are not directly electrically connected to each other.
- the source electrode 32B and the drain electrode 32C are indirectly electrically connected via the semiconductor film 38 on the lower layer side, and the bridge portion between the electrodes 32B and 32C in the semiconductor film 38 is the drain current. Functions as a channel region through which the gas flows.
- the interlayer insulating film 39 is made of, for example, a silicon oxide film (SiOx), and is made of the same material as the gate insulating film 37 described above.
- the protective film 40 is made of an acrylic resin (for example, polymethyl methacrylate resin (PMMA)) or a polyimide resin, which is an organic material. Therefore, the protective film 40 is thicker than the gate insulating film 37 and the interlayer insulating film 39 made of other inorganic materials and functions as a planarizing film.
- PMMA polymethyl methacrylate resin
- each insulating film (gate insulating film 37, interlayer insulating film 39, and protective film 40) in the TFT 32 is formed with a uniform film thickness over the entire area, including the area other than the area where the TFT 32 is formed on the array substrate 30. Has been.
- the manufacturing apparatuses 50 to 56 include a cleaning apparatus 50, a film forming apparatus 51, a cleaning apparatus 50A, a resist coating apparatus 52, an exposure apparatus 53, a developing apparatus 54, a cleaning apparatus 50B, An etching device 55 and a resist stripping device 56 are used.
- the glass substrate 30A constituting the array substrate 30 is subjected to a cleaning process by the cleaning apparatus 50, a film forming process by the film forming apparatus 51, a cleaning process by the cleaning apparatus 50A, a resist coating process by the resist coating apparatus 52, and an exposure apparatus 53.
- the target thin film is formed in a predetermined pattern. Is repeatedly performed for each thin film, whereby the thin films are sequentially stacked.
- the cleaning apparatus 50 supplies the cleaning liquid onto the glass substrate 30A before forming each thin film, thereby cleaning the glass substrate 30A and removing dust and dirt on the glass substrate 30A.
- the film forming apparatus 51 forms the thin film material to be formed so as to have a uniform film thickness with respect to the plate surface of the glass substrate 30A.
- a CVD apparatus, a sputtering apparatus, a vacuum deposition apparatus, or the like is used as the film forming apparatus 51. Thereafter, the substrate is cleaned by the cleaning apparatus 50A in order to remove residual substances and dust accompanying the film formation.
- a photoresist is applied to the material film formed by the film forming device 51 by the resist coating device 52 so as to have a uniform film thickness, and is laminated.
- a positive type or a negative type is used as the photoresist.
- the exposure device 53 irradiates the photoresist applied by the resist coating device 52 with UV light or the like through a photomask having a predetermined pattern, thereby providing a range corresponding to the pattern of the photomask. To expose.
- the developing device 54 supplies the developer onto the plate surface of the glass substrate 30A, thereby developing the photoresist and removing either the exposed area or the non-exposed area.
- the substrate is cleaned by the cleaning device 50B to clean the residue such as the developer, in the etching process
- the region not covered by the remaining photoresist in the material film is etched away by the etching device 55.
- the material film is patterned.
- the etching apparatus 55 specifically, a dry etching apparatus that etches a material film with an etching gas, ions, or radicals, a wet etching apparatus that etches a material film with an etchant, or the like is used.
- the material film is etched by supplying an etching solution onto the plate surface of the glass substrate 30A.
- the resist stripping device 56 supplies a resist stripping solution onto the plate surface of the glass substrate 30A, thereby removing the remaining photoresist.
- the cleaning apparatus is used after the processes by the other manufacturing apparatuses 51 to 56 in addition to the cleaning process before and after the film formation and the cleaning process after development.
- a cleaning process may be performed after the etching process in order to remove residues by dry etching.
- a device is used.
- a process is performed by supplying a liquid onto the glass substrate 30A, specifically, cleaning apparatuses 50, 50A, 50B, a resist coating apparatus 52, a developing apparatus 54, wet etching.
- a common transfer device 60 for transferring the glass substrate 30A is employed for the etching device 55 and the resist stripping device 56 that perform the above.
- cleaning apparatus 50 is demonstrated in detail. 7 to 12, the X-axis direction is the conveyance direction of the glass substrate 30A.
- the left side of the drawing is the upstream side of the conveyance direction, and the right side of the drawing is the downstream side of the conveyance direction.
- FIGS. 7 and 8 the left side of the drawing is the upstream side of the conveyance direction, and the right side of the drawing is the downstream side of the conveyance direction. The In FIGS.
- the upper side of the drawing is the upper side of the conveying device 60
- the lower side of the drawing is the lower side of the conveying device 60.
- the cleaning device 50, the resist coating device 52, the developing device 54, the etching device 55 that performs wet etching, and the resist stripping device 56 are examples of wet process devices.
- the cleaning device 50 includes a cleaning tank (an example of a wet process tank) 50 ⁇ / b> A separated from the external atmosphere, and a transfer device 60 disposed in the cleaning tank 50 ⁇ / b> A.
- the A plurality of nozzles (not shown) for injecting the cleaning liquid onto the glass substrate 30 ⁇ / b> A transported by the transport device 60 are provided above the cleaning tank 50 ⁇ / b> A.
- the cleaning liquid ejected from the nozzle is collected, circulated by a circulation device (not shown), and used again as the cleaning liquid.
- the glass substrate 30 ⁇ / b> A is loaded on the upstream side in the transport direction with the formation surface or the formation scheduled surface of various thin films facing upward, the long side direction is along the X-axis direction, and the short side direction is In the posture along the Y-axis direction, it is transported from the upstream side to the downstream side in the transport direction by the transport device 60 (see arrows in FIGS. 7 and 8).
- the transport device 60 extends in a shaft shape, and includes a plurality of transport rollers 62 that transport the glass substrate 30 ⁇ / b> A along the transport direction, and both end portions of each transport roller 62.
- a bearing portion 64 that supports the bearing portion 64 so as to be rotatable around, and a pair of frames (an example of a holding member) 66 and 67 that are fixed to a predetermined height position and hold the bearing portion 64 are provided.
- the pair of frames 66 and 67 has a shape extending along the conveyance direction of the glass substrate 30 ⁇ / b> A, and has a plurality of concave portions 66 ⁇ / b> A ⁇ b> 1 that are concavely recessed at positions corresponding to the attachment positions of the respective conveyance rollers 62. is doing.
- Each concave portion 66A1 is provided intermittently along the conveyance direction of the glass substrate 30A so as to open upward.
- Each conveyance roller 62 is bridged between a pair of frames 66 and 67, and its extending direction is in a posture along the Y-axis direction, and is arranged in parallel at a predetermined interval along the conveyance direction.
- each transport roller 62 has a metal shaft portion 62A and a plurality of synthetic resin substrate support portions 62B attached to the shaft portion 62A.
- the tip at both ends of the shaft portion 62A is a reduced diameter portion 62A1 that is reduced in diameter from other portions of the shaft portion 62A.
- Each substrate support portion 62B has a disk shape larger in diameter than the shaft portion 62A, and is attached to the shaft portion 62A with a predetermined interval in the extending direction of the transport roller 62.
- the glass substrate 30 ⁇ / b> A is transported along the transport direction while the plate surface opposite to the surface on which various thin films are formed or the surface to be formed is continuously supported by the substrate support portion 62 ⁇ / b> B of the transport roller 62.
- the transport device 60 includes a rotation mechanism 68 for rotating each transport roller 62 around its axis.
- the rotation mechanism 68 is provided on one end side (upper side in the drawing in FIG. 8) in the extending direction of each conveyance roller 62, and includes a plurality of gears.
- the bearing portion 64 is a so-called ball bearing, and is disposed on the outer side of the reduced diameter portion 62 ⁇ / b> A ⁇ b> 1 of the shaft portion 62 ⁇ / b> A of the transport roller 62.
- the bearing portion 64 has an annular metal annular portion 64A and a plurality of metallic balls 64B interposed between the reduced diameter portion 62A1 and the annular portion 64A.
- the bearing portion 64 is held with respect to the frame 66 by the lower portion of the annular portion 64A being bonded and fixed to the concave portions 66A1 of the respective frames 66 and 67. As shown in FIG.
- the annular portion 64 ⁇ / b> A is opposed to the reduced diameter portion 62 ⁇ / b> A ⁇ b> 1 of the shaft portion 62 ⁇ / b> A.
- Example) 64A1 is provided.
- the bearing side recess 64A1 is provided in a groove shape along the annular portion 64A.
- a portion facing the bearing-side recess 64A1 is similarly provided with a groove-like shaft-side recess 62A2 that is recessed inward and into which a part of each ball 64B enters. Yes.
- the shaft side recess 62A2 is provided in a groove shape along the outer periphery of the reduced diameter portion 62A1.
- the balls 64B are slidably supported by the annular portion 64A.
- the bearing portion 64 is in sliding contact with the shaft portion 62A of the transport roller via the ball 64B in each bearing-side recess 64A1.
- each ball 64B slides between the annular portion 64A of the bearing portion 64 and the shaft portion 62A (the reduced diameter portion 62A1) of the conveying roller 62.
- the annular portion 64A does not rotate, and only the transport roller 62 is rotated around its axis by the rotating mechanism 68.
- each frame 66 includes a main body portion 66 ⁇ / b> A that constitutes a main part of the frame 66, an outer plate 66 ⁇ / b> B, and a plurality of inner plates 66 ⁇ / b> C.
- the main body portion 66A is provided with the concave portion 66A1 described above.
- the pair of frames 66 and 67 are partially different from each other.
- a frame 66 hereinafter referred to as “one side” shown in FIG. 7 provided on the other end side in the extending direction of each conveyance roller 62 (the lower side in FIG. Will be described.
- the main body portion 66A constituting one frame 66 extends in a wall shape along the transport direction (X-axis direction), and the thickness in the Y-axis direction of a portion located slightly below the concave portion 66A1 is It is larger than the width dimension of the bearing portion 64 in the Y-axis direction.
- the portion located slightly below the concave portion 66A1 is outside the tip of the reduced diameter portion 62A1 of the shaft portion 62A of the transport roller 62 (left side, transport roller 62 shown in FIG. 11).
- the protruding portion is referred to as “protruding portion 66A2”).
- the outer plate 66B is a transparent synthetic resin plate-like member, and its upper portion is positioned at substantially the same height as the rotation shaft of the transport roller 62 in the vertical direction (Z-axis direction). It is stuck and fixed to the outer surface (left surface shown in FIG. 11) of the protruding portion 66A2.
- the plurality of inner plates 66C are plate-like members, and their upper ends are close to the reduced diameter portion 62A1 of the shaft portion 62A of the conveying roller 62 in the vertical direction, and the lower portion is each of the inner surfaces of the main body portion 66A. Each of them is affixed and fixed at a position corresponding to the concave portion 66A1. As shown in FIGS.
- a slip-off prevention plate 69 (FIGS. 10 and 12) that prevents the bearing portion 64 from being pulled upward from the concave portions 66A1. (The illustration is omitted in each drawing except for).
- the liquid storage part 70 which can store a liquid is formed.
- the plurality of inner plates 66C are arranged in a state where the upper ends thereof are close to the reduced diameter portion 62A1 of the shaft portion 62A of the transport roller 62, so as shown in FIG.
- the portion 70 at least a part of the bearing-side concave portion 64A1 of the bearing portion 64 is exposed.
- the protruding portion 66A2 of the main body portion 66A is provided from the upstream end to the downstream end in the transport direction. For this reason, as shown in FIGS. 7 and 8, the liquid storage portion 70 in one frame 66 extends in a groove shape from the upstream end portion to the downstream end portion in the transport direction.
- a circular supply port (an example of a liquid supply unit) 66 ⁇ / b> A ⁇ b> 3 for supplying a liquid into the liquid storage unit 70 is provided at the upstream end of the main body 66 ⁇ / b> A in the transport direction. It is provided so as to be exposed inside.
- a circular drainage port (an example of a liquid discharger) for discharging the liquid in the liquid container 70 to the outside. 66A4 is exposed in the liquid container 70.
- one end of a supply pipe 72 for supplying a liquid to the supply port 66A3 from the outside of the cleaning device 50 is attached to the supply port 66A3, and the discharge port 66A4 has a discharge port 66A4.
- One end of a discharge pipe 74 for discharging the liquid from the discharge port 66A4 to the outside of the cleaning device 50 is attached.
- pure water W1 is exemplified as an example of the liquid supplied into the liquid storage unit 70 (see FIGS. 7, 8, 11, and 12).
- a part of the bearing-side recess 64 ⁇ / b> A ⁇ b> 1 of the bearing part 64 exposed in the liquid storage part 70 is formed as shown in FIGS. 11 and 12. It will be in the state immersed in the pure water W1.
- the bearing-side concave portion 64A1 of the bearing portion 64 is worn by sliding between the transport roller 62 and the bearing portion 64 due to slip or the like when the transport roller 62 rotates.
- Dust and dust such as rust powder may be generated from the bearing side recess 64A1.
- the bearing side recess 64A1 in one frame 66 in the transport device 60, even when dust or dust such as rust powder is generated in the bearing-side concave portion 64A1 of the bearing portion 64 disposed on the one frame 66 side, liquid is generated.
- the pure water W1 is poured into the housing portion 70, and the bearing-side recess 64A1 in which dust or dust such as rust powder is generated is immersed in the pure water W1 as described above. It is made to flow down from the recess 64A1.
- the dust or dust is transferred to the bearing-side recess as the transport roller 62 rotates.
- the dust and dirt are washed away by the pure water W1 in the liquid storage portion 70.
- the other frame 67 a configuration of a frame 67 (hereinafter, referred to as “the other frame 67”) provided on one end side in the extending direction of each conveyance roller 62 (the upper side in FIG. 8, the side on which the rotation mechanism 68 is provided).
- the liquid storage portion 71 formed in a portion surrounded by the main body portion, the outer plate, and the plurality of inner plates has an upstream side in the transport direction like the one frame 66. It is not provided from the end portion to the downstream end portion, and is formed intermittently along the transport direction.
- the pure water W1 poured into the liquid container 71 does not flow from the upstream side to the downstream side in the transport direction, and is stored in the liquid container 71. It has become so. Even in such a configuration, when pure water W1 is poured into the liquid storage portion 71, the bearing-side concave portion 64A1 of the bearing portion 64 exposed in the liquid storage portion 71 is immersed in the pure water W1. For this reason, when dust or dirt such as rust powder is generated in the bearing side concave portion of the bearing portion arranged on the other frame 67 side, pure water W1 is poured into the liquid storage portion 70, and rust powder or the like is generated. The bearing-side recess in which dust or dust is generated is immersed in the pure water W1 as described above in accordance with the rotation of the transport roller 62, so that the dust or dust is washed away from the bearing-side recess. Yes.
- dust such as rust powder generated from the bearing-side recess 64A1 of the bearing portion 64 may be mixed into the cleaning liquid ejected from the nozzle.
- the cleaning liquid ejected from the nozzles is circulated and used again as the cleaning liquid in the cleaning apparatus 50, in the manufacturing process of the array substrate 30, the cleaning apparatus 50 is replaced with another manufacturing apparatus 51.
- the cleaning liquid mixed with dust or dust may be sprayed onto the glass substrate 30A.
- the cleaning apparatus 50 when used after the process by the other manufacturing apparatuses 51 to 56, dust such as rust powder generated from the bearing-side recess 64A1 is mixed with the cleaning liquid and formed on, for example, the glass substrate 30A.
- the film may adhere to the gate insulating film 37 and the interlayer insulating film 39 and may be detected as a gate insulating film foreign material or an interlayer insulating film foreign material.
- the cleaning apparatus 50 when used after the process by the other manufacturing apparatuses 51 to 56, the above-described gate formed on the glass substrate 30A, for example, with dust or dust generated from the bearing-side recess 64A1 being mixed with the cleaning liquid.
- Attached to the insulating film 37 and the interlayer insulating film 39 and peeled off from the glass substrate 30A together with a part of the gate insulating film 37 and the interlayer insulating film 39 may be detected as a gate insulating film defect or an interlayer insulating film defect. .
- the array substrate 30 in which such foreign matter or defect is detected is regarded as a defective product.
- the pure water W1 is poured into the liquid storage unit 70, so that the bearing side recess 64A1 of the bearing unit 64 is exposed to the liquid storage unit 70.
- the part to be performed can be immersed in the pure water W1.
- the pure water W1 in the liquid storage part 70 functions as a lubricant for the bearing part 64, and it is possible to prevent or suppress the generation of dust and dirt in the bearing-side recess 64A1 of the bearing part 64.
- the dust or dust can be washed away from the bearing-side recess 64A1 by the pure water W1 in the liquid storage portion 70. It is possible to prevent or suppress dust from adhering to the glass substrate 30A. In addition, since the dust and dust can be prevented or suppressed from adhering to the glass substrate 30A only by providing the frames 66 and 67 with the liquid container 70 having the above-described configuration, an increase in the size of the apparatus is avoided. be able to.
- dust and dust generated from the bearing-side recess 64A1 of the bearing portion 64 are prevented from adhering to the glass substrate 30A to be transported while avoiding an increase in size of the device. Or can be suppressed.
- the liquid storage portion 70 provided on the one frame 66 side extends in a groove shape. Further, on one frame 66 side, a supply port 66A3 that supplies pure water W1 into the liquid storage unit 70 is provided at the upstream end in the transport direction (extending direction of the liquid storage unit 70), and downstream in the transport direction. A discharge port 66A4 for discharging the pure water W1 flowing in the liquid storage unit 70 is provided at the side end. With such a configuration, on one frame 66 side, new pure water W1 is sequentially supplied from the supply port 66A3 into the liquid storage portion 70, and dust or dust generated in the bearing-side recess 64A1.
- the pure water W1 that has been washed away is sequentially discharged from the liquid container 70 at the discharge port 66A4. For this reason, dust, dust, and the like generated in the bearing-side recess 64A1 of the bearing portion 64 are effectively generated by the force of the pure water W1 flowing in the groove-shaped liquid storage portion 70 from the upstream side to the downstream side in the transport direction. Can be washed away.
- the pure water W1 in the liquid storage portion 70 flows into the liquid storage portion 70, so that the pure water W1 in the liquid storage portion 70 also functions as a lubricant for the bearing portion 64 configured as a ball bearing. . For this reason, the rotation performance of the conveyance roller 62 rotatably supported by the bearing portion 64 can be maintained in a good state.
- the second embodiment will be described with reference to FIGS. 13 and 14.
- the second embodiment is different from the first embodiment in the configuration of the transport roller 162 in the transport device, the configuration of the bearing unit 164, the support mode of the transport roller 162 by the bearing unit 164, and the holding mode of the bearing unit 164 in the frame 166. ing. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted.
- FIGS. 13 and 14 the parts obtained by adding the numeral 100 to the reference numerals in FIGS. 10 and 11 are the same as the parts described in the first embodiment.
- a bearing portion 164 that is a ball bearing is disposed on the inner side of the shaft portion 162A of the transport roller 162 around the axis. That is, as shown in FIG. 13, the shaft portion 162 ⁇ / b> A of the conveying roller 162 is cylindrical, the inside is hollow, and the whole has a uniform diameter.
- the bearing portion 164 has a cylindrical shape and a shaft portion 162 ⁇ / b> A made of a metal and having a diameter smaller than the inner diameter of the shaft portion 162 ⁇ / b> A of the transport roller 162.
- the cylindrical portion 164A has a groove-like bearing-side recess (an example of a sliding contact portion) that is recessed inward and into which a part of each ball 164B enters, as shown in FIG. 164A1 is provided.
- a groove-like shaft-side concave portion 162A2 that is also recessed inward and into which a part of each ball 164B enters is provided.
- each ball 164B is slidably supported by the columnar portion 164A.
- the bearing portion 164 is in sliding contact with the shaft portion 162A of the conveying roller via the ball 164B in each bearing-side recess 164A1.
- each ball 164B slides between the cylindrical portion 164A of the bearing portion 164 and the shaft portion 162A of the conveying roller 162. By moving, the cylindrical portion 164A does not rotate, and only the transport roller 162 rotates about its axis by a rotation mechanism (not shown).
- the main body 166A constituting the frame 166 extends in a wall shape along the transport direction (X-axis direction) as in the first embodiment.
- the main body 166A has an inner surface (surface to which the cylindrical portion 164A of the bearing portion 164 is bonded) substantially coincides with the upper end of the cylindrical portion 164A, and its outer surface is slightly below the upper end of the cylindrical portion 164A.
- the protruding portion 166A2 protrudes to the outer surface side with a step so as to be located at the center.
- the outer plate 166B is a transparent synthetic resin plate-like member, and its upper end is positioned slightly above the shaft portion 162A of the conveying roller 162 in the vertical direction (Z-axis direction), and the outer surface of the main body portion 166A. It is fixed to the adhesive.
- the plurality of inner plates 166C are plate-like members, and the upper ends thereof are positioned slightly above the upper ends of the columnar portions 164A of the bearing portions 164 in the vertical direction, respectively, on the inner surfaces of the columnar portions 164A of the respective bearing portions 164. Pasted and fixed.
- the conveyance roller 162, the bearing portion 164, and the frame 166 are configured as described above, so that the frame 166 is surrounded by the main body 166A, the outer plate 166B, and the plurality of inner plates 166C. Further, as shown in FIGS. 13 and 14, a liquid storage portion 170 capable of storing a liquid is formed.
- the plurality of inner plates 166C are arranged with their upper ends positioned slightly above the upper ends of the columnar portions 164A of the bearing portions 164. Therefore, as shown in FIG. At least a part of the bearing-side recess 164A1 of the bearing portion 164 is exposed in the housing portion 170.
- the liquid storage unit 170 in the present embodiment extends in a groove shape from the upstream end in the transport direction to the downstream end, and in the transport direction in the main body 166A.
- a supply port is provided at the upstream end, and a discharge port is provided at the downstream end in the conveying direction of the main body 166A.
- a receiving plate 168 positioned below the bearing portion 164 is attached to the main body portion 166A of the frame 166, whereby liquid leaking from the ball 164B positioned below the ball 164B in FIG. ), And the received liquid is discharged from the discharge basin 169 to the outside.
- the pure water W1 is poured into the liquid storage portion 170 as in the first embodiment.
- a portion of the bearing-side concave portion 164A1 of the bearing portion 164 exposed in the liquid storage portion 170 can be immersed in the pure water W1.
- the dust or dust can be washed away from the bearing-side recess 164A1 by the pure water W1 in the liquid storage portion 170.
- the third embodiment will be described with reference to FIGS. 15 and 16.
- the third embodiment is different from the first embodiment in the configuration of the frame 266 in the transport device 260. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted.
- 15 and FIG. 16 the parts obtained by adding the numeral 200 to the reference numerals in FIG. 7 and FIG. 9 are the same as the parts described in the first embodiment.
- the protruding portion of the main body 266A in the frame 266 (approaching outward in a portion located slightly below the concave portion 266A1).
- the partition 266A3 that separates the liquid storage portion 270 is provided between the adjacent concave portions 266A1.
- a plurality of liquid storage portions 270 separated by the partition walls 266A3 along the transport direction are formed so that one liquid storage portion 270 corresponds to one bearing portion 264. Accordingly, at least a part of the bearing-side recess 264A1 of the bearing portion 264 is exposed in each liquid storage portion 270.
- the pure water W1 poured into each liquid storage part 270 is stored in the liquid storage part 270 similarly to the liquid storage part 71 provided on the other frame 67 side in the first embodiment. ing.
- each of the bearing-side recesses 264A1 of the bearing portions 264 exposed in the liquid storage portions 270 is immersed in the pure water W1.
- the dust or dust can be washed away from the bearing-side recess 264A1 by the pure water W1 in the liquid storage portion 270. It is possible to prevent or suppress dust and dust from adhering to the glass substrate 230A that is a conveyance target.
- the dust or dust can be washed away by pure water poured into the liquid storage portion, The dust or dust can be prevented or suppressed from adhering to the glass substrate conveyed by the conveying device.
- the cleaning apparatus used in the manufacturing process of the array substrate has been exemplified.
- the present invention may be applied to a cleaning apparatus used in the manufacturing process of the color filter substrate. In this case, it is possible to prevent or suppress the occurrence of defective products on the color filter substrate due to dust generated from the bearing-side recess.
- pure water is exemplified as an example of the liquid that is poured into the liquid storage unit.
- the liquid that is poured into the liquid storage unit allows dust and dust generated from the bearing-side recess of the bearing unit to flow.
- the liquid is not limited to pure water as long as it has a viscosity that can be dropped.
- the glass substrate is illustrated as an example of the conveyance target member conveyed to the conveyance device, but the conveyance target member conveyed to the conveyance device is not limited to the glass substrate. Even if the conveyance target member is other than the glass substrate, by applying the present invention, it is possible to prevent or suppress dust and dust generated from the bearing-side concave portion of the bearing portion from adhering to the conveyance target member.
- the bearing portion is a ball bearing
- the bearing portion may have a configuration other than the ball bearing. Even in this case, by applying the present invention, it is possible to prevent or suppress the dust generated from the sliding contact portion of the bearing portion from adhering to the conveyance target member.
- the shape and configuration of the liquid storage portion in the holding member can be changed as appropriate.
- the present invention will be specifically described with reference to examples.
- the gate insulating film foreign matter of the gate insulating film formed on the glass substrate, the gate insulating film defect, and the glass substrate Interlayer insulating film foreign matter and interlayer insulating film defects in the interlayer insulating film formed on the top were respectively detected.
- the numerical values in FIG. 17 and FIG. 18 indicate the individual defect rate (ratio of individuals with defective products with respect to the total number of inspected individuals) as a percentage (%).
- the detected gate insulating film foreign matter and gate insulating film defects were greatly reduced before and after the application of the present invention. Therefore, by applying the present invention, it is possible to prevent or suppress the occurrence of foreign substances or gate insulating film defects in the gate insulating film on the array substrate due to dust or dirt generated from the bearing-side concave portion of the bearing portion. I was able to confirm.
- the detected interlayer insulating film foreign matter and interlayer insulating film defect are not significantly changed before and after the application of the present invention, but the interlayer insulating film foreign object is not observed. A large decrease was observed before and after the application of the present invention. Therefore, it can be confirmed that the application of the present invention can prevent or suppress the generation of foreign substances in the interlayer insulating film on the interlayer insulating film on the array substrate due to dust or dust generated from the bearing-side recess of the bearing part. It was.
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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Abstract
This conveyance device is provided with: conveyance rollers (62) which extend like shafts, and which convey glass substrates along a conveyance direction; bearings (64) which support the conveyance rollers (62) such that the conveyance rollers (62) are capable of rotating around axes thereof; and a frame (66) which holds the bearings (64), is provided with a liquid accommodation part (70), and is configured such that a portion of a sliding contact area of each of the bearings (64) is exposed to the inside of the liquid accommodation part (70). A liquid is poured into the liquid accommodation part (70) to immerse, in the liquid, the portions of the sliding contact areas of the bearings (64) exposed to the inside of the liquid accommodation part (70), and dust and dirt can be washed from the sliding contact areas by the liquid inside the liquid accommodation part (70).
Description
本明細書で開示される技術は、搬送装置及びウェットプロセス装置に関する。
The technology disclosed in this specification relates to a transfer device and a wet process device.
従来、液晶表示装置の主要構成部品である液晶パネルの製造過程において、ガラス基板を搬送装置によって搬送しながらガラス基板の表面に洗浄処理やレジスト塗布処理等のウェットプロセスを施すウェットプロセス装置が知られている。ウェットプロセス装置が備える搬送装置は、通常、軸状の搬送ローラと、搬送ローラの両端部に配されて搬送ローラをその軸周りに回転可能に支持する軸受部と、がガラス基板の搬送方向に沿って複数配された構成とされる。
Conventionally, in the manufacturing process of a liquid crystal panel which is a main component of a liquid crystal display device, a wet process device is known that performs a wet process such as a cleaning process or a resist coating process on the surface of a glass substrate while the glass substrate is transported by a transport device. ing. The transfer device provided in the wet process apparatus usually has a shaft-like transfer roller and bearing portions that are arranged at both ends of the transfer roller and rotatably support the transfer roller around its axis in the transfer direction of the glass substrate. It is set as the structure distribute | arranged along along.
このような搬送装置では、搬送ローラの回転時にスリップ等によって搬送ローラと軸受部との間が摺動することで、軸受部の摺接部位が摩耗し、当該摺接部位から錆粉等の塵や埃が発生することがある。その結果、摺接部位から発生した塵や埃等がガラス基板の表面に付着することがある。そこで、例えば下記特許文献1には、搬送装置の軸受部から発生するこのような塵や埃のガラス基板への付着を防止できるウェットプロセス装置が開示されている。
In such a conveying device, sliding between the conveying roller and the bearing portion due to slip or the like during rotation of the conveying roller causes wear of the sliding contact portion of the bearing portion, and dust such as rust powder from the sliding contact portion. And dust may be generated. As a result, dust or dust generated from the sliding contact part may adhere to the surface of the glass substrate. Thus, for example, Patent Document 1 below discloses a wet process apparatus that can prevent such dust and dust generated from the bearing portion of the transport apparatus from adhering to the glass substrate.
(発明が解決しようとする課題)
しかしながら、上記特許文献1で開示されるウェットプロセス装置では、搬送ローラの回転機構をウェット雰囲気外に設けられた外部室に配設するとともに排気手段をこの外部室に設けることで、ウェット雰囲気内のガラス基板に塵や埃が付着することを防止する。このため、このように搬送ローラの回転機構や排気手段を外部室に配設することで、装置が全体として大型化し、また、部品点数が多くなる問題があった。 (Problems to be solved by the invention)
However, in the wet process apparatus disclosed in Patent Document 1, the rotation mechanism of the transport roller is disposed in the external chamber provided outside the wet atmosphere and the exhaust unit is provided in the external chamber, thereby Prevents dust and dirt from adhering to the glass substrate. For this reason, there are problems that the rotation mechanism of the transport roller and the exhaust means are arranged in the external chamber in this way, thereby increasing the size of the apparatus as a whole and increasing the number of parts.
しかしながら、上記特許文献1で開示されるウェットプロセス装置では、搬送ローラの回転機構をウェット雰囲気外に設けられた外部室に配設するとともに排気手段をこの外部室に設けることで、ウェット雰囲気内のガラス基板に塵や埃が付着することを防止する。このため、このように搬送ローラの回転機構や排気手段を外部室に配設することで、装置が全体として大型化し、また、部品点数が多くなる問題があった。 (Problems to be solved by the invention)
However, in the wet process apparatus disclosed in Patent Document 1, the rotation mechanism of the transport roller is disposed in the external chamber provided outside the wet atmosphere and the exhaust unit is provided in the external chamber, thereby Prevents dust and dirt from adhering to the glass substrate. For this reason, there are problems that the rotation mechanism of the transport roller and the exhaust means are arranged in the external chamber in this way, thereby increasing the size of the apparatus as a whole and increasing the number of parts.
本明細書で開示される技術は、上記の課題に鑑みて創作されたものであって、装置の大型化を回避しながら、軸受部から発生した塵や埃が搬送部材に付着することを防止ないし抑制できる搬送装置及びウェットプロセス装置を提供することを目的とする。
The technology disclosed in the present specification has been created in view of the above-described problems, and prevents dust and dirt generated from the bearing portion from adhering to the transport member while avoiding an increase in the size of the apparatus. Another object of the present invention is to provide a transfer device and a wet process device that can be suppressed.
(課題を解決するための手段)
本明細書で開示される技術は、軸状に延在し、搬送部材を搬送方向に沿って搬送する搬送ローラと、前記搬送ローラをその軸周りに回転可能に支持する軸受部と、前記軸受部を保持する保持部材であって、液体収容部を有し、該液体収容部内に前記軸受部の摺接部位の少なくとも一部が露出するものとされた保持部材と、を備える搬送装置に関する。 (Means for solving the problem)
The technology disclosed in this specification includes a conveyance roller that extends in a shaft shape and conveys a conveyance member along a conveyance direction, a bearing portion that rotatably supports the conveyance roller around the axis, and the bearing. And a holding member that has a liquid storage portion and at least a part of a sliding contact portion of the bearing portion is exposed in the liquid storage portion.
本明細書で開示される技術は、軸状に延在し、搬送部材を搬送方向に沿って搬送する搬送ローラと、前記搬送ローラをその軸周りに回転可能に支持する軸受部と、前記軸受部を保持する保持部材であって、液体収容部を有し、該液体収容部内に前記軸受部の摺接部位の少なくとも一部が露出するものとされた保持部材と、を備える搬送装置に関する。 (Means for solving the problem)
The technology disclosed in this specification includes a conveyance roller that extends in a shaft shape and conveys a conveyance member along a conveyance direction, a bearing portion that rotatably supports the conveyance roller around the axis, and the bearing. And a holding member that has a liquid storage portion and at least a part of a sliding contact portion of the bearing portion is exposed in the liquid storage portion.
上記の搬送装置では、液体収容部内に純水等の液体を流し込むことで、軸受部の摺接部位のうち液体収容部内に露出する部位を液体に浸らせることができる。その結果、液体収容部内の液体が軸受部の潤滑剤として機能し、軸受部の摺接部位に塵や埃が発生することを防止ないし抑制することができる。また、軸受部の摺接部位に塵や埃が発生したとしても、液体収容部内の液体によって上記塵や埃を当該摺接部位から流し落とすことができ、上記塵や埃が搬送部材に付着することを防止ないし抑制することができる。また、保持部材に液体収容部を設けるのみで上記塵や埃の搬送部材への付着を防止ないし抑制できるので、装置が大型化することを回避することができる。このように、上記の搬送装置では、装置の大型化を回避しながら、軸受部の摺接部位から発生した塵や埃が搬送部材に付着することを防止ないし抑制することができる。
In the transport device described above, by pouring a liquid such as pure water into the liquid storage part, it is possible to immerse the part exposed in the liquid storage part in the sliding contact part of the bearing part in the liquid. As a result, the liquid in the liquid storage portion functions as a lubricant for the bearing portion, and it is possible to prevent or suppress the generation of dust or dust at the sliding contact portion of the bearing portion. Further, even if dust or dust is generated at the sliding contact portion of the bearing portion, the dust or dust can be washed away from the sliding contact portion by the liquid in the liquid storage portion, and the dust or dust adheres to the transport member. This can be prevented or suppressed. Further, since the dust and the dust can be prevented from adhering to the conveying member only by providing the holding member on the holding member, the apparatus can be prevented from being enlarged. As described above, in the above conveying device, it is possible to prevent or suppress the dust generated from the sliding contact portion of the bearing portion from adhering to the conveying member while avoiding an increase in size of the device.
前記軸受部は、前記搬送ローラの軸周りに配された環状の環状部と、前記搬送ローラと前記環状部との間に介在し、前記環状部によって摺動可能に支持される複数のボールと、を有するボールベアリングであり、前記摺接部位は、前記環状部のうち前記複数のボールを支持する部位であってもよい。
The bearing portion includes an annular annular portion disposed around an axis of the conveying roller, and a plurality of balls that are interposed between the conveying roller and the annular portion and are slidably supported by the annular portion. The sliding contact portion may be a portion that supports the plurality of balls in the annular portion.
この構成によると、軸受部及び摺接部位の具体的な構成を提供することができる。
According to this configuration, a specific configuration of the bearing portion and the sliding contact portion can be provided.
前記液体収容部は溝状に延在するものとされていてもよい。
The liquid container may be extended in a groove shape.
この構成によると、液体収容部に流し込まれた液体が液体収容部の延在方向に沿って流れることになるため、液体の流れによる力によって軸受部の摺接部位に発生した塵や埃等を効果的に流し落とすことができる。
According to this configuration, since the liquid poured into the liquid storage portion flows along the extending direction of the liquid storage portion, dust or dust generated at the sliding contact portion of the bearing portion due to the force of the liquid flow is removed. It can be washed off effectively.
前記液体収容部の延在方向の一端部に前記液体収容部内に液体を供給する液体供給部が設けられ、前記液体収容部の延在方向の他端部に前記液体収容部内を流れる液体を排出する液体排出部が設けられていてもよい。
A liquid supply unit that supplies liquid into the liquid storage unit is provided at one end in the extending direction of the liquid storage unit, and the liquid flowing through the liquid storage unit is discharged at the other end in the extending direction of the liquid storage unit. A liquid discharge part may be provided.
この構成では、液体供給部において液体収容部内に新たな液体が順次供給されるとともに、軸受部の表面の塵や埃を流し落とした液体が液体排出部において液体収容部から順次排出されることで、軸受部の摺接部位に発生した塵や埃等をより効果的に流し落とすことができる。
In this configuration, the liquid supply unit sequentially supplies new liquid into the liquid storage unit, and the liquid discharged from the surface of the bearing unit is sequentially discharged from the liquid storage unit at the liquid discharge unit. Thus, dust or dust generated at the sliding contact portion of the bearing portion can be more effectively washed away.
前記液体収容部は、前記一端部が前記搬送方向の上流側に配されるとともに前記他端部が前記搬送方向の下流側に配された形で、前記搬送方向に沿って延在するものとされていてもよい。
The liquid storage portion extends along the transport direction, with the one end disposed on the upstream side in the transport direction and the other end disposed on the downstream side in the transport direction. May be.
この構成によると、軸受部の摺接部位に発生した塵や埃等を、搬送方向の上流側から下流側に向かって順に流し落とすことができる。
According to this configuration, dust or dirt generated at the sliding contact portion of the bearing portion can be sequentially flowed from the upstream side to the downstream side in the transport direction.
前記搬送部材は基板であり、前記搬送ローラはその延在方向が前記搬送方向と直交する形で該搬送方向に複数が並列配置され、前記軸受部は前記搬送ローラの両端部にそれぞれ配されていてもよい。
The transport member is a substrate, the transport rollers are arranged in parallel in the transport direction so that the extending direction thereof is orthogonal to the transport direction, and the bearing portions are respectively disposed at both ends of the transport roller. May be.
この構成によると、搬送部材として基板を搬送するための搬送装置の具体的な構成を提供することができる。
According to this configuration, it is possible to provide a specific configuration of a transfer device for transferring a substrate as a transfer member.
本明細書で開示される他の技術は、上記の搬送装置と、前記搬送方向に沿って搬送される前記基板にウェットプロセスを施すウェットプロセス槽と、を備えるウェットプロセス装置に関する。
Another technique disclosed in the present specification relates to a wet process apparatus including the above-described transport apparatus and a wet process tank that performs a wet process on the substrate transported along the transport direction.
基板に対する洗浄処理や塗布処理等のウェットプロセスでは、基板の表面に対して洗浄水が噴射され、噴射された洗浄水がウェットプロセス槽内で循環されて再び洗浄水として使用される。このため、洗浄水内に塵や埃等が流出した場合、それらの塵や埃等が基板に付着し易い。上記のウェットプロセス装置では、液体収容部内の液体によって塵や埃が軸受部の摺接部位から流し落とされるため、洗浄水内に塵や埃等が流出することを防止ないし抑制することができる。その結果、ウェットプロセス槽内において軸受部の摺接部位から発生した塵や埃等が基板に付着することを防止ないし抑制することができる。なお、本明細書でいうウェットプロセスは、基板の洗浄処理や基板の塗布処理に限定されず、基板のディップ処理等、他の処理を含む。
In a wet process such as a cleaning process or a coating process for a substrate, cleaning water is sprayed onto the surface of the substrate, and the sprayed cleaning water is circulated in the wet process tank and used again as cleaning water. For this reason, when dust, dust, or the like flows into the cleaning water, the dust, dust, or the like tends to adhere to the substrate. In the above wet process apparatus, dust and dirt are caused to flow down from the sliding contact portion of the bearing portion by the liquid in the liquid storage portion, so that it can be prevented or suppressed from flowing out into the cleaning water. As a result, it is possible to prevent or suppress dust or dirt generated from the sliding contact portion of the bearing portion in the wet process tank from adhering to the substrate. The wet process referred to in this specification is not limited to the substrate cleaning process and the substrate coating process, and includes other processes such as a dipping process for the substrate.
(発明の効果)
本明細書で開示される技術によれば、装置の大型化を回避しながら、軸受部から発生した塵や埃が搬送部材に付着することを防止ないし抑制できる搬送装置及びウェットプロセス装置を提供することができる。 (The invention's effect)
According to the technology disclosed in this specification, a transport apparatus and a wet process apparatus that can prevent or suppress dust and dust generated from a bearing portion from adhering to a transport member while avoiding an increase in size of the apparatus are provided. be able to.
本明細書で開示される技術によれば、装置の大型化を回避しながら、軸受部から発生した塵や埃が搬送部材に付着することを防止ないし抑制できる搬送装置及びウェットプロセス装置を提供することができる。 (The invention's effect)
According to the technology disclosed in this specification, a transport apparatus and a wet process apparatus that can prevent or suppress dust and dust generated from a bearing portion from adhering to a transport member while avoiding an increase in size of the apparatus are provided. be able to.
<実施形態1>
図1から図12を参照して実施形態1を説明する。本実施形態では、液晶表示装置10の構成部品である液晶パネル11の製造過程において、ガラス基板30Aの表面に対して洗浄処理を施しながらガラス基板30Aを搬送する洗浄装置50(図7参照)について例示する。なお、各図面の一部にはX軸、Y軸およびZ軸を示しており、各軸方向が各図面で共通した方向となるように描かれている。また、図1、図3、及び図5では、図の上側を液晶表示装置10の上側(表側)とする。 <Embodiment 1>
The first embodiment will be described with reference to FIGS. In the present embodiment, a cleaning device 50 (see FIG. 7) that conveys theglass substrate 30A while performing a cleaning process on the surface of the glass substrate 30A in the manufacturing process of the liquid crystal panel 11 that is a component of the liquid crystal display device 10. Illustrate. A part of each drawing shows an X-axis, a Y-axis, and a Z-axis, and each axis direction is drawn in a common direction in each drawing. 1, 3, and 5, the upper side of the figure is the upper side (front side) of the liquid crystal display device 10.
図1から図12を参照して実施形態1を説明する。本実施形態では、液晶表示装置10の構成部品である液晶パネル11の製造過程において、ガラス基板30Aの表面に対して洗浄処理を施しながらガラス基板30Aを搬送する洗浄装置50(図7参照)について例示する。なお、各図面の一部にはX軸、Y軸およびZ軸を示しており、各軸方向が各図面で共通した方向となるように描かれている。また、図1、図3、及び図5では、図の上側を液晶表示装置10の上側(表側)とする。 <Embodiment 1>
The first embodiment will be described with reference to FIGS. In the present embodiment, a cleaning device 50 (see FIG. 7) that conveys the
先に液晶表示装置10、及び液晶パネル11の構成について説明する。液晶表示装置10は、図1及び図2に示すように、液晶パネル11と、液晶パネル11に実装されて当該液晶パネル11を駆動する電子部品であるICチップ17と、ICチップ17に対して各種入力信号を外部から供給するコントロール基板19と、液晶パネル11と外部のコントロール基板19とを電気的に接続するフレキシブル基板18と、液晶パネル11に光を供給する外部光源であるバックライト装置14と、を備えている。また、液晶表示装置10は、相互に組み付けた液晶パネル11及びバックライト装置14を収容して保持するための表裏一体の外部部材15,16を備えており、このうち表側の外部部材15には、液晶パネル11に表示された画像を外部から視認させるための開口部15Aが設けられている。
First, the configuration of the liquid crystal display device 10 and the liquid crystal panel 11 will be described. As shown in FIGS. 1 and 2, the liquid crystal display device 10 includes a liquid crystal panel 11, an IC chip 17 that is an electronic component that is mounted on the liquid crystal panel 11 and drives the liquid crystal panel 11, and the IC chip 17. A control board 19 that supplies various input signals from the outside, a flexible board 18 that electrically connects the liquid crystal panel 11 and the external control board 19, and a backlight device 14 that is an external light source that supplies light to the liquid crystal panel 11. And. In addition, the liquid crystal display device 10 includes front and back external members 15 and 16 for housing and holding the liquid crystal panel 11 and the backlight device 14 assembled to each other. An opening 15A for visually recognizing an image displayed on the liquid crystal panel 11 is provided.
バックライト装置14は、図1に示すように、表側に向けて開口した略箱型をなすシャーシ14Aと、シャーシ14A内に配された図示しない光源(冷陰極管、LED、有機EL等)と、シャーシ14Aの開口部を覆う形で配される図示しない光学部材と、を備えている。光学部材は、光源から出射される光を面状の光に変換する等の機能を有している。光学部材を通過して面状となった光は、液晶パネル11に入射し、液晶パネル11において画像を表示するために利用される。
As shown in FIG. 1, the backlight device 14 includes a chassis 14A having a substantially box shape that opens toward the front side, and a light source (cold cathode tube, LED, organic EL, etc.) not shown disposed in the chassis 14A. And an optical member (not shown) arranged so as to cover the opening of the chassis 14A. The optical member has a function of converting light emitted from the light source into planar light. The light that has been planarized through the optical member is incident on the liquid crystal panel 11 and is used to display an image on the liquid crystal panel 11.
液晶パネル11は、図2に示すように、全体として縦長の矩形状をなしており、その長辺方向が各図面のY軸方向と一致し、その短辺方向が各図面のX軸方向と一致している。液晶パネル11では、その大部分に画像を表示可能な表示領域A1が配され、その長辺方向における一方の端部側(図2に示す下側)に偏った位置に画像が表示されない非表示領域A2が配されている。非表示領域A2の一部には、ICチップ17及びフレキシブル基板18が異方性導電膜(不図示)を介した圧着接続によって実装されている。なお、液晶パネル11では、図1に示すように、後述するカラーフィルタ基板20よりも一回り小さな枠状の一点鎖線が表示領域A1の外形をなしており、当該一点鎖線よりも外側の領域が非表示領域A2となっている。
As shown in FIG. 2, the liquid crystal panel 11 has a vertically long rectangular shape as a whole, and the long side direction coincides with the Y-axis direction of each drawing, and the short side direction corresponds to the X-axis direction of each drawing. Match. In the liquid crystal panel 11, a display area A1 capable of displaying an image is arranged on the majority thereof, and no image is displayed at a position biased to one end side (the lower side in FIG. 2) in the long side direction. Area A2 is arranged. An IC chip 17 and a flexible substrate 18 are mounted on a part of the non-display area A2 by pressure-bonding via an anisotropic conductive film (not shown). In the liquid crystal panel 11, as shown in FIG. 1, a frame-shaped one-dot chain line that is slightly smaller than a color filter substrate 20 described later forms an outer shape of the display area A 1, and an area outside the one-dot chain line is It is a non-display area A2.
液晶パネル11は、図3に示すように、透光性に優れた一対のガラス製の基板20、30と、電界印加に伴って光学特性が変化する物質である液晶分子を含む液晶層11Aと、を備えている。液晶パネル11を構成する両基板20,30は、液晶層11Aの厚さ分のセルギャップを維持した状態で図示しないシール材によって貼り合わされている。両基板20,30のうち、表側(正面側)の基板20がカラーフィルタ基板20とされ、裏側(背面側)の基板30がアレイ基板(回路基板の一例)30とされる。両基板20,30の内面側には、図3に示すように、液晶層11Aに含まれる液晶分子を配向させるための配向膜11B,11Cがそれぞれ形成されている。また、両基板20,30を構成するガラス基板20A,30Aの外面側には、それぞれ偏光板11D,11Eが貼り付けられている。
As shown in FIG. 3, the liquid crystal panel 11 includes a pair of glass substrates 20 and 30 having excellent translucency, and a liquid crystal layer 11A including liquid crystal molecules that are substances whose optical characteristics change with application of an electric field. It is equipped with. The two substrates 20 and 30 constituting the liquid crystal panel 11 are bonded together by a sealing material (not shown) while maintaining a cell gap corresponding to the thickness of the liquid crystal layer 11A. Of the two substrates 20, 30, the front side (front side) substrate 20 is the color filter substrate 20, and the back side (back side) substrate 30 is the array substrate (an example of a circuit board) 30. As shown in FIG. 3, alignment films 11B and 11C for aligning liquid crystal molecules contained in the liquid crystal layer 11A are formed on the inner surfaces of both the substrates 20 and 30, respectively. Further, polarizing plates 11D and 11E are attached to the outer surface sides of the glass substrates 20A and 30A constituting both the substrates 20 and 30, respectively.
カラーフィルタ基板20は、図2に示すように、短辺寸法がアレイ基板30とほぼ同等であるものの、長辺寸法がアレイ基板30よりも小さく、アレイ基板30に対して長辺方向についての一方の端部(図2に示す上側)を揃えた状態で貼り合わされている。従って、アレイ基板30のうち長辺方向についての他方の端部(図1に示す下側)は、所定範囲に亘ってカラーフィルタ基板20が重なり合うことがなく、表裏両板面が外部に露出した状態とされており、ここにICチップ17及びフレキシブル基板18の実装領域が確保されている。アレイ基板30を構成するガラス基板30Aは、その主要部分にカラーフィルタ基板20及び偏光板11Eが貼り合わされており、ICチップ17及びフレキシブル基板18の実装領域が確保された部分がカラーフィルタ基板20及び偏光板11Eと非重畳とされている。
As shown in FIG. 2, the color filter substrate 20 has a short side dimension substantially the same as that of the array substrate 30, but the long side dimension is smaller than that of the array substrate 30, and one side of the long side direction with respect to the array substrate 30. Are bonded together with their end portions (upper side shown in FIG. 2) aligned. Therefore, the color filter substrate 20 does not overlap the other end (the lower side shown in FIG. 1) of the array substrate 30 in the long side direction, and both the front and back plate surfaces are exposed to the outside. The mounting area for the IC chip 17 and the flexible substrate 18 is secured here. The glass substrate 30A constituting the array substrate 30 has the color filter substrate 20 and the polarizing plate 11E bonded to the main portion thereof, and the portion where the mounting area of the IC chip 17 and the flexible substrate 18 is secured is the color filter substrate 20 and It is not superimposed on the polarizing plate 11E.
続いてアレイ基板30及びカラーフィルタ基板20における表示領域A1内の構成について説明する。アレイ基板30を構成するガラス基板(基板の一例)30Aの内面側(液晶層11A側)には、図3及び図4に示すように、3つの電極32A~32Cを有するスイッチング素子であるTFT(Thin Film Transistor)32及びITO(Indium Tin Oxide)等の透明導電膜からなる画素電極33が多数個並んで設けられている。これらTFT32及び画素電極33の周りには、図4に示すように、格子状をなすゲート配線34及びソース配線35が取り囲むようにして配設されている。ゲート配線34とソース配線35はそれぞれTFT32のゲート電極32Aとソース電極32Bとに接続され、画素電極33がドレイン配線(不図示)を介してTFT32のドレイン電極32Cに接続されている。
Subsequently, the configuration in the display area A1 of the array substrate 30 and the color filter substrate 20 will be described. On the inner surface side (liquid crystal layer 11A side) of a glass substrate (an example of a substrate) 30A constituting the array substrate 30, as shown in FIGS. 3 and 4, a TFT (which is a switching element having three electrodes 32A to 32C) is provided. A large number of pixel electrodes 33 made of a transparent conductive film such as a thin film transistor (ITO) 32 and an indium film (ITO) are provided side by side. Around the TFT 32 and the pixel electrode 33, as shown in FIG. 4, a gate wiring 34 and a source wiring 35 are arranged so as to surround the grid. The gate wiring 34 and the source wiring 35 are connected to the gate electrode 32A and the source electrode 32B of the TFT 32, respectively, and the pixel electrode 33 is connected to the drain electrode 32C of the TFT 32 via a drain wiring (not shown).
また、アレイ基板30には、ゲート配線34に並行するとともに画素電極33に対して平面に視て重畳する容量配線36が設けられている。容量配線36は、Y軸方向についてゲート配線34と交互に配されている。ゲート配線34がY軸方向に隣り合う画素電極33の間に配されているのに対し、容量配線36は、各画素電極33におけるY軸方向のほぼ中央部を横切る位置に配されている。このアレイ基板30の端部には、ゲート配線34及び容量配線36から引き回された端子部及びソース配線35から引き回された端子部が設けられており、これらの各端子部には、図1に示すコントロール基板19から各信号または基準電位が入力されるようになっており、それによりTFT32の駆動が制御される。
Further, the array substrate 30 is provided with a capacitor wiring 36 that is parallel to the gate wiring 34 and overlaps the pixel electrode 33 in plan view. The capacitor wirings 36 are alternately arranged with the gate wirings 34 in the Y-axis direction. The gate wiring 34 is disposed between the pixel electrodes 33 adjacent in the Y-axis direction, whereas the capacitor wiring 36 is disposed at a position that substantially crosses the central portion of each pixel electrode 33 in the Y-axis direction. The end portion of the array substrate 30 is provided with a terminal portion routed from the gate wiring 34 and the capacitor wiring 36 and a terminal portion routed from the source wiring 35. Each signal or reference potential is inputted from the control board 19 shown in FIG. 1, and the drive of the TFT 32 is thereby controlled.
一方、カラーフィルタ基板20を構成するガラス基板20Aの内面側(液晶層11A側)には、図3に示すように、アレイ基板30の各画素電極33と平面に視て重畳する位置に多数個のカラーフィルタが並んで設けられている。カラーフィルタは、R(赤色),G(緑色),B(青色)を呈する各着色部22がX軸方向に沿って交互に並ぶ配置とされる。カラーフィルタを構成する各着色部22間には、混色を防ぐための略格子状の遮光部(ブラックマトリクス)23が形成されている。遮光部23は、アレイ基板30側のゲート配線34、ソース配線35、及び容量配線36に対して平面に視て重畳する配置とされる。また、各着色部22及び遮光部23の表面には、アレイ基板30側の画素電極33と対向する対向電極24が設けられている。液晶パネル11では、R(赤色),G(緑色),B(青色)の3色の着色部22及びそれらと対向する3つの画素電極33の組によって表示単位である1つの表示画素が構成されている。
On the other hand, on the inner surface side (liquid crystal layer 11A side) of the glass substrate 20A constituting the color filter substrate 20, as shown in FIG. The color filters are provided side by side. The color filter is arranged such that the colored portions 22 exhibiting R (red), G (green), and B (blue) are alternately arranged along the X-axis direction. Between each coloring part 22 which comprises a color filter, the substantially lattice-shaped light-shielding part (black matrix) 23 for preventing color mixing is formed. The light shielding portion 23 is arranged so as to overlap with the gate wiring 34, the source wiring 35, and the capacitor wiring 36 on the array substrate 30 side in a plan view. A counter electrode 24 is provided on the surface of each coloring portion 22 and the light shielding portion 23 so as to face the pixel electrode 33 on the array substrate 30 side. In the liquid crystal panel 11, one display pixel, which is a display unit, is configured by the combination of the three colored portions 22 of R (red), G (green), and B (blue) and the three pixel electrodes 33 that face each other. ing.
ここで、アレイ基板30に設けられたスイッチング素子であるTFT32について詳しく説明する。TFT32は、図4及び図5に示すように、アレイ基板30上に複数の膜を積層した構成とされている。具体的には、図5に示すように、下層側(ガラス基板30A側)から順に、ゲート配線34に接続されたゲート電極32A、ゲート絶縁膜37、半導体膜38、ソース配線35に接続されたソース電極32B及び画素電極33に接続されたドレイン電極32C、層間絶縁膜39、保護膜40が積層されている。
Here, the TFT 32 which is a switching element provided on the array substrate 30 will be described in detail. As shown in FIGS. 4 and 5, the TFT 32 has a structure in which a plurality of films are stacked on the array substrate 30. Specifically, as shown in FIG. 5, the gate electrode 32A, the gate insulating film 37, the semiconductor film 38, and the source wiring 35 connected to the gate wiring 34 are sequentially connected from the lower layer side (glass substrate 30A side). A drain electrode 32C connected to the source electrode 32B and the pixel electrode 33, an interlayer insulating film 39, and a protective film 40 are stacked.
ゲート電極32Aは、ゲート配線34と同一材料からなるとともにゲート配線34と同一工程にてアレイ基板30上にパターニングされており、アルミニウム(Al)、クロム(Cr)、タンデル(Ta)、チタン(Ti)、銅(Cu)等の金属膜単体又はこれらの金属窒化物との積層膜で形成することができる。ゲート絶縁膜37は、例えばシリコン酸化膜(SiOx)からなり、ゲート電極32Aと半導体膜38との間を絶縁する。半導体膜38は、例えばアモルファスシリコン(a-Si)又は透明なアモルファス酸化物半導体(InGaZnOx)からなり、一端側がドレイン電極32Cに、他端側がソース電極32Bにそれぞれ接続されることで、相互間の導通を図るチャネル領域として機能する。
The gate electrode 32A is made of the same material as the gate wiring 34 and is patterned on the array substrate 30 in the same process as the gate wiring 34, and is made of aluminum (Al), chromium (Cr), tander (Ta), titanium (Ti ), Copper (Cu), or a metal film alone or a laminated film of these metal nitrides. The gate insulating film 37 is made of, for example, a silicon oxide film (SiOx), and insulates between the gate electrode 32A and the semiconductor film 38. The semiconductor film 38 is made of, for example, amorphous silicon (a-Si) or a transparent amorphous oxide semiconductor (InGaZnOx). One end side is connected to the drain electrode 32C and the other end side is connected to the source electrode 32B. It functions as a channel region for conducting.
ソース電極32B及びドレイン電極32Cは、ソース配線35と同一材料を含むとともにソース配線35と同一工程にてアレイ基板30上にパターニングされている。ソース電極32B及びドレイン電極32Cは、下層側(半導体膜38側)の第1導電膜32B1,32C1と上層側(層間絶縁膜39側)の第2導電膜32B2,32C2とを積層した構成とされる。下層側の第1導電膜32B1,32C1は、リン(P)等のn型不純物を高濃度にドーピングしたアモルファスシリコン(n+Si)からなり、オーミックコンタクト層として機能する。上層側の第2導電膜32B2,32C2は、異なる金属膜を積層してなる2層構造とされており、そのうち下層側の金属膜がチタン(Ti)からなり、上層側の金属膜がアルミニウム(Al)からなる。
The source electrode 32B and the drain electrode 32C contain the same material as the source wiring 35 and are patterned on the array substrate 30 in the same process as the source wiring 35. The source electrode 32B and the drain electrode 32C are configured by laminating first conductive films 32B1 and 32C1 on the lower layer side (semiconductor film 38 side) and second conductive films 32B2 and 32C2 on the upper layer side (interlayer insulating film 39 side). The The first conductive films 32B1 and 32C1 on the lower layer side are made of amorphous silicon (n + Si) doped with an n-type impurity such as phosphorus (P) at a high concentration, and function as an ohmic contact layer. The second conductive films 32B2 and 32C2 on the upper layer side have a two-layer structure in which different metal films are stacked. The metal film on the lower layer side is made of titanium (Ti), and the metal film on the upper layer side is aluminum ( Al).
上記したソース電極32B及びドレイン電極32Cは、所定の間隔(開口領域)を挟んで対向状に配されているため、相互が直接的には電気的に接続されていない。しかし、ソース電極32B及びドレイン電極32Cは、その下層側の半導体膜38を介して間接的に電気的に接続されており、この半導体膜38における両電極32B,32C間のブリッジ部分が、ドレイン電流が流れるチャネル領域として機能する。
The above-mentioned source electrode 32B and drain electrode 32C are arranged in an opposing manner with a predetermined interval (opening region) interposed therebetween, so that they are not directly electrically connected to each other. However, the source electrode 32B and the drain electrode 32C are indirectly electrically connected via the semiconductor film 38 on the lower layer side, and the bridge portion between the electrodes 32B and 32C in the semiconductor film 38 is the drain current. Functions as a channel region through which the gas flows.
層間絶縁膜39は、例えばシリコン酸化膜(SiOx)からなり、上記したゲート絶縁膜37と同一材料とされる。保護膜40は、有機材料であるアクリル樹脂(例えばポリメタクリル酸メチル樹脂(PMMA))やポリイミド樹脂からなる。従って、この保護膜40は、他の無機材料からなるゲート絶縁膜37、層間絶縁膜39に比べて膜厚が厚いものとされるとともに、平坦化膜として機能する。なお、TFT32における各絶縁膜(ゲート絶縁膜37、層間絶縁膜39及び保護膜40)は、それぞれアレイ基板30においてTFT32の形成領域以外の領域を含みつつ概ね全域に亘って均一な膜厚で形成されている。
The interlayer insulating film 39 is made of, for example, a silicon oxide film (SiOx), and is made of the same material as the gate insulating film 37 described above. The protective film 40 is made of an acrylic resin (for example, polymethyl methacrylate resin (PMMA)) or a polyimide resin, which is an organic material. Therefore, the protective film 40 is thicker than the gate insulating film 37 and the interlayer insulating film 39 made of other inorganic materials and functions as a planarizing film. Note that each insulating film (gate insulating film 37, interlayer insulating film 39, and protective film 40) in the TFT 32 is formed with a uniform film thickness over the entire area, including the area other than the area where the TFT 32 is formed on the array substrate 30. Has been.
上記したTFT32、画素電極33、及び各配線34,35,36等の薄膜をアレイ基板30上に形成するに際しては、既知のフォトリソグラフィ法が用いられ、そのために各種製造装置50~56が用いられている。具体的には、製造装置50~56としては、図6に示すように、洗浄装置50、成膜装置51、洗浄装置50A、レジスト塗布装置52、露光装置53、現像装置54、洗浄装置50B、エッチング装置55、及びレジスト剥離装置56が用いられる。そして、アレイ基板30を構成するガラス基板30Aには、洗浄装置50による洗浄工程、成膜装置51による成膜工程、洗浄装置50Aによる洗浄工程、レジスト塗布装置52によるレジスト塗布工程、露光装置53による露光工程、現像装置54による現像工程、洗浄装置50Bによる洗浄工程、エッチング装置55によるエッチング工程、レジスト剥離装置56によるレジスト剥離工程を経ることで、目的の薄膜が所定のパターンで形成され、この手順を各薄膜について繰り返し行うことで、各薄膜が順に積層されて形成される。
In forming thin films such as the TFT 32, the pixel electrode 33, and the wirings 34, 35, and 36 on the array substrate 30, a known photolithography method is used, and various manufacturing apparatuses 50 to 56 are used for that purpose. ing. Specifically, as shown in FIG. 6, the manufacturing apparatuses 50 to 56 include a cleaning apparatus 50, a film forming apparatus 51, a cleaning apparatus 50A, a resist coating apparatus 52, an exposure apparatus 53, a developing apparatus 54, a cleaning apparatus 50B, An etching device 55 and a resist stripping device 56 are used. The glass substrate 30A constituting the array substrate 30 is subjected to a cleaning process by the cleaning apparatus 50, a film forming process by the film forming apparatus 51, a cleaning process by the cleaning apparatus 50A, a resist coating process by the resist coating apparatus 52, and an exposure apparatus 53. Through the exposure process, the developing process by the developing device 54, the cleaning process by the cleaning device 50B, the etching process by the etching device 55, and the resist stripping step by the resist stripping device 56, the target thin film is formed in a predetermined pattern. Is repeatedly performed for each thin film, whereby the thin films are sequentially stacked.
具体的には、洗浄工程では、洗浄装置50により、各薄膜を形成する前のガラス基板30A上に洗浄液を供給することでガラス基板30Aを洗浄し、ガラス基板30A上の塵や埃等を除去する。成膜工程では、成膜装置51により、形成する薄膜の材料をガラス基板30Aの板面に対して均一な膜厚となるように成膜する。この成膜装置51としては、具体的には、CVD装置、スパッタ装置、真空蒸着装置等が用いられる。その後、成膜に伴う残余物質やゴミを除去するために洗浄装置50Aにより基板を洗浄する。次に、レジスト塗布工程では、レジスト塗布装置52により、成膜装置51によって成膜された材料膜に対してフォトレジストを均一な膜厚となるように塗布して積層形成する。このとき、フォトレジストとしては、ポジ型、またはネガ型のものが用いられる。露光工程では、露光装置53により、レジスト塗布装置52により塗布されたフォトレジストに対して、所定のパターンを有するフォトマスクを介してUV光等を照射することで、フォトマスクのパターンに応じた範囲を露光する。
Specifically, in the cleaning process, the cleaning apparatus 50 supplies the cleaning liquid onto the glass substrate 30A before forming each thin film, thereby cleaning the glass substrate 30A and removing dust and dirt on the glass substrate 30A. To do. In the film forming process, the film forming apparatus 51 forms the thin film material to be formed so as to have a uniform film thickness with respect to the plate surface of the glass substrate 30A. Specifically, as the film forming apparatus 51, a CVD apparatus, a sputtering apparatus, a vacuum deposition apparatus, or the like is used. Thereafter, the substrate is cleaned by the cleaning apparatus 50A in order to remove residual substances and dust accompanying the film formation. Next, in the resist coating step, a photoresist is applied to the material film formed by the film forming device 51 by the resist coating device 52 so as to have a uniform film thickness, and is laminated. At this time, a positive type or a negative type is used as the photoresist. In the exposure process, the exposure device 53 irradiates the photoresist applied by the resist coating device 52 with UV light or the like through a photomask having a predetermined pattern, thereby providing a range corresponding to the pattern of the photomask. To expose.
現像工程では、現像装置54により、ガラス基板30Aの板面上に現像液を供給することで、フォトレジストを現像し、露光領域又は非露光領域のいずれかを除去する。現像液等の残渣物を洗浄すべく洗浄装置50Bにより基板を洗浄した後、エッチング工程では、エッチング装置55により、材料膜のうち残されたフォトレジストによって覆われていない領域をエッチングして除去することで、材料膜をパターニングする。エッチング装置55としては、具体的には、エッチングガスやイオン、ラジカルによって材料膜をエッチングするドライエッチング装置やエッチング液によって材料膜をエッチングするウェットエッチング装置等が用いられる。このうちウェットエッチング装置では、ガラス基板30Aの板面上にエッチング液を供給することで、材料膜をエッチングする。レジスト剥離工程では、レジスト剥離装置56により、ガラス基板30Aの板面上にレジスト剥離液を供給することで、残されたフォトレジストを除去する。
In the developing step, the developing device 54 supplies the developer onto the plate surface of the glass substrate 30A, thereby developing the photoresist and removing either the exposed area or the non-exposed area. After the substrate is cleaned by the cleaning device 50B to clean the residue such as the developer, in the etching process, the region not covered by the remaining photoresist in the material film is etched away by the etching device 55. Thus, the material film is patterned. As the etching apparatus 55, specifically, a dry etching apparatus that etches a material film with an etching gas, ions, or radicals, a wet etching apparatus that etches a material film with an etchant, or the like is used. Among these, in the wet etching apparatus, the material film is etched by supplying an etching solution onto the plate surface of the glass substrate 30A. In the resist stripping step, the resist stripping device 56 supplies a resist stripping solution onto the plate surface of the glass substrate 30A, thereby removing the remaining photoresist.
上記した各製造装置50~56のうち、洗浄装置は、上記した成膜前後の洗浄工程、及び現像後の洗浄工程以外にも、他の製造装置51~56による工程の後で使用される場合がある。具体的には、例えばエッチング装置55としてドライエッチング装置を用いた場合、そのエッチング工程の後にドライエッチングによる残渣物を除去するために洗浄工程を行う場合があり、その洗浄工程においても、上記した洗浄装置が用いられる。
Of the manufacturing apparatuses 50 to 56 described above, the cleaning apparatus is used after the processes by the other manufacturing apparatuses 51 to 56 in addition to the cleaning process before and after the film formation and the cleaning process after development. There is. Specifically, for example, when a dry etching apparatus is used as the etching apparatus 55, a cleaning process may be performed after the etching process in order to remove residues by dry etching. A device is used.
さて、上記した製造装置50~56のうち、ガラス基板30A上に液体を供給して処理を行うもの、具体的には洗浄装置50、50A、50B、レジスト塗布装置52、現像装置54、ウェットエッチングを行うエッチング装置55、及びレジスト剥離装置56には、ガラス基板30Aを搬送するための共通の搬送装置60が採用されている。以下では、洗浄装置50内における搬送装置60の構成について詳しく説明する。なお、図7から図12では、X軸方向がガラス基板30Aの搬送方向とされ、図7及び図8では、図の左側が搬送方向の上流側、図の右側が搬送方向の下流側とされる。また、図7、図8、及び図10から図12では、図の上側を搬送装置60の上側とし、図の下側を搬送装置60の下側とする。また、洗浄装置50、レジスト塗布装置52、現像装置54、ウェットエッチングを行うエッチング装置55、及びレジスト剥離装置56は、それぞれウェットプロセス装置の一例である。
Of the manufacturing apparatuses 50 to 56 described above, a process is performed by supplying a liquid onto the glass substrate 30A, specifically, cleaning apparatuses 50, 50A, 50B, a resist coating apparatus 52, a developing apparatus 54, wet etching. A common transfer device 60 for transferring the glass substrate 30A is employed for the etching device 55 and the resist stripping device 56 that perform the above. Below, the structure of the conveying apparatus 60 in the washing | cleaning apparatus 50 is demonstrated in detail. 7 to 12, the X-axis direction is the conveyance direction of the glass substrate 30A. In FIGS. 7 and 8, the left side of the drawing is the upstream side of the conveyance direction, and the right side of the drawing is the downstream side of the conveyance direction. The In FIGS. 7, 8, and 10 to 12, the upper side of the drawing is the upper side of the conveying device 60, and the lower side of the drawing is the lower side of the conveying device 60. The cleaning device 50, the resist coating device 52, the developing device 54, the etching device 55 that performs wet etching, and the resist stripping device 56 are examples of wet process devices.
洗浄装置50は、図7に示すように、外部雰囲気から隔てられた洗浄槽(ウェットプロセス槽の一例)50Aと、この洗浄槽50A内に配設された搬送装置60と、を備える構成とされる。また、洗浄槽50Aの上側には、搬送装置60によって搬送されるガラス基板30A上に洗浄液を噴射する図示しないノズルが複数設けられている。洗浄装置50では、ノズルから噴射された洗浄液は回収され、図示しない循環装置により循環されて再び洗浄液として使用されるようになっている。洗浄装置50において、ガラス基板30Aは、各種薄膜の形成面又は形成予定面が上側に向けられて搬送方向の上流側に投入され、その長辺方向がX軸方向に沿うとともにその短辺方向がY軸方向に沿った姿勢で、搬送装置60によって搬送方向の上流側から下流側へと搬送される(図7及び図8の矢印参照)。
As shown in FIG. 7, the cleaning device 50 includes a cleaning tank (an example of a wet process tank) 50 </ b> A separated from the external atmosphere, and a transfer device 60 disposed in the cleaning tank 50 </ b> A. The A plurality of nozzles (not shown) for injecting the cleaning liquid onto the glass substrate 30 </ b> A transported by the transport device 60 are provided above the cleaning tank 50 </ b> A. In the cleaning device 50, the cleaning liquid ejected from the nozzle is collected, circulated by a circulation device (not shown), and used again as the cleaning liquid. In the cleaning apparatus 50, the glass substrate 30 </ b> A is loaded on the upstream side in the transport direction with the formation surface or the formation scheduled surface of various thin films facing upward, the long side direction is along the X-axis direction, and the short side direction is In the posture along the Y-axis direction, it is transported from the upstream side to the downstream side in the transport direction by the transport device 60 (see arrows in FIGS. 7 and 8).
搬送装置60は、図7及び図8に示すように、軸状に延在し、ガラス基板30Aを搬送方向に沿って搬送する複数の搬送ローラ62と、各搬送ローラ62の両端部をその軸周りに回転可能に支持する軸受部64と、所定の高さ位置に固定されて軸受部64を保持する一対のフレーム(保持部材の一例)66,67とを備えている。このうち一対のフレーム66,67は、ガラス基板30Aの搬送方向に沿って延在する形状とされ、各搬送ローラ62の取付位置に対応する位置に凹状に凹んでなる複数の凹状部66A1を有している。各凹状部66A1は、上方に開口する形で、ガラス基板30Aの搬送方向に沿って間欠的に設けられている。
As shown in FIG. 7 and FIG. 8, the transport device 60 extends in a shaft shape, and includes a plurality of transport rollers 62 that transport the glass substrate 30 </ b> A along the transport direction, and both end portions of each transport roller 62. A bearing portion 64 that supports the bearing portion 64 so as to be rotatable around, and a pair of frames (an example of a holding member) 66 and 67 that are fixed to a predetermined height position and hold the bearing portion 64 are provided. Among these, the pair of frames 66 and 67 has a shape extending along the conveyance direction of the glass substrate 30 </ b> A, and has a plurality of concave portions 66 </ b> A <b> 1 that are concavely recessed at positions corresponding to the attachment positions of the respective conveyance rollers 62. is doing. Each concave portion 66A1 is provided intermittently along the conveyance direction of the glass substrate 30A so as to open upward.
各搬送ローラ62は、一対のフレーム66,67の間に架け渡され、その延在方向がY軸方向に沿った姿勢で、搬送方向に沿って所定の間隔で並列配置されている。各搬送ローラ62は、図7及び図8に示すように、金属製のシャフト部62Aと、シャフト部62Aに取り付けられた合成樹脂製の複数の基板支持部62Bとを有している。シャフト部62Aの両端部における先端は、図11に示すように、それぞれシャフト部62Aの他の部位より縮径された縮径部62A1とされている。各基板支持部62Bは、シャフト部62Aよりも径大な円板状とされ、搬送ローラ62の延在方向において所定の間隔を空けてシャフト部62Aに取り付けられている。ガラス基板30Aは、各種薄膜の形成面又は形成予定面とは反対側の板面が搬送ローラ62の基板支持部62Bによって継続的に支持されながら、搬送方向に沿って搬送される。なお搬送装置60は、図8に示すように、各搬送ローラ62をその軸周りに回転させるための回転機構68を備えている。回転機構68は、各搬送ローラ62の延在方向の一端側(図8における図面上側)に設けられ、複数のギアを備えて構成される。
Each conveyance roller 62 is bridged between a pair of frames 66 and 67, and its extending direction is in a posture along the Y-axis direction, and is arranged in parallel at a predetermined interval along the conveyance direction. As shown in FIGS. 7 and 8, each transport roller 62 has a metal shaft portion 62A and a plurality of synthetic resin substrate support portions 62B attached to the shaft portion 62A. As shown in FIG. 11, the tip at both ends of the shaft portion 62A is a reduced diameter portion 62A1 that is reduced in diameter from other portions of the shaft portion 62A. Each substrate support portion 62B has a disk shape larger in diameter than the shaft portion 62A, and is attached to the shaft portion 62A with a predetermined interval in the extending direction of the transport roller 62. The glass substrate 30 </ b> A is transported along the transport direction while the plate surface opposite to the surface on which various thin films are formed or the surface to be formed is continuously supported by the substrate support portion 62 </ b> B of the transport roller 62. As shown in FIG. 8, the transport device 60 includes a rotation mechanism 68 for rotating each transport roller 62 around its axis. The rotation mechanism 68 is provided on one end side (upper side in the drawing in FIG. 8) in the extending direction of each conveyance roller 62, and includes a plurality of gears.
軸受部64は、図10に示すように、いわゆるボールベアリングであり、搬送ローラ62のシャフト部62Aにおける縮径部62A1の軸周りの外側に配されている。軸受部64は、環状とされた金属製の環状部64Aと、縮径部62A1と環状部64Aとの間に介在する金属製の複数のボール64Bと、を有している。軸受部64は、環状部64Aの下側部分が各フレーム66,67の凹状部66A1に接着固定されることで、フレーム66に対して保持されている。環状部64Aのうちシャフト部62Aの縮径部62A1と対向する部位には、図11に示すように、内側に窪んでなるとともに各ボール64Bの一部が入り込んだ軸受側凹部(摺接部位の一例)64A1が設けられている。この軸受側凹部64A1は、環状部64Aに沿って溝状に設けられている。一方、シャフト部62Aの縮径部62A1において軸受側凹部64A1と対向する部位には、同様に内側に窪んでなるとともに各ボール64Bの一部が入り込んだ溝状のシャフト側凹部62A2が設けられている。このシャフト側凹部62A2は、縮径部62A1の外周に沿って溝状に設けられている。
As shown in FIG. 10, the bearing portion 64 is a so-called ball bearing, and is disposed on the outer side of the reduced diameter portion 62 </ b> A <b> 1 of the shaft portion 62 </ b> A of the transport roller 62. The bearing portion 64 has an annular metal annular portion 64A and a plurality of metallic balls 64B interposed between the reduced diameter portion 62A1 and the annular portion 64A. The bearing portion 64 is held with respect to the frame 66 by the lower portion of the annular portion 64A being bonded and fixed to the concave portions 66A1 of the respective frames 66 and 67. As shown in FIG. 11, the annular portion 64 </ b> A is opposed to the reduced diameter portion 62 </ b> A <b> 1 of the shaft portion 62 </ b> A. Example) 64A1 is provided. The bearing side recess 64A1 is provided in a groove shape along the annular portion 64A. On the other hand, in the reduced diameter portion 62A1 of the shaft portion 62A, a portion facing the bearing-side recess 64A1 is similarly provided with a groove-like shaft-side recess 62A2 that is recessed inward and into which a part of each ball 64B enters. Yes. The shaft side recess 62A2 is provided in a groove shape along the outer periphery of the reduced diameter portion 62A1.
各ボール64Bが入り込んだ軸受側凹部64A1及びシャフト側凹部62A2が上記のような構成とされていることで、各ボール64Bは、環状部64Aによって摺動可能に支持された状態となっている。換言すれば、軸受部64は、各軸受側凹部64A1において、ボール64Bを介して搬送ローラのシャフト部62Aと摺接している。上述したように軸受部64はフレーム66によって保持されているため、軸受部64の環状部64Aと搬送ローラ62のシャフト部62A(縮径部62A1)との間で各ボール64Bが摺動することで、環状部64Aは回転せず、上記回転機構68によって搬送ローラ62のみがその軸周りに回転するようになっている。
Since the bearing-side recess 64A1 and the shaft-side recess 62A2 into which the balls 64B have entered are configured as described above, the balls 64B are slidably supported by the annular portion 64A. In other words, the bearing portion 64 is in sliding contact with the shaft portion 62A of the transport roller via the ball 64B in each bearing-side recess 64A1. As described above, since the bearing portion 64 is held by the frame 66, each ball 64B slides between the annular portion 64A of the bearing portion 64 and the shaft portion 62A (the reduced diameter portion 62A1) of the conveying roller 62. Thus, the annular portion 64A does not rotate, and only the transport roller 62 is rotated around its axis by the rotating mechanism 68.
各フレーム66,67の構成についてさらに詳しく説明する。各フレーム66は、図11に示すように、フレーム66の主要部分を構成する本体部66Aと、外板66Bと、複数の内板66Cと、を有している。このうち本体部66Aには、上述した凹状部66A1が設けられている。なお、一対のフレーム66,67は、その一部が互いに異なる構成とされる。まず、各搬送ローラ62の延在方向の他端側(図8における図面下側、回転機構68が設けられた側とは反対側)に設けられた図7に示すフレーム66(以下、「一方のフレーム66」と称する)の構成について説明する。
The configuration of each of the frames 66 and 67 will be described in more detail. As shown in FIG. 11, each frame 66 includes a main body portion 66 </ b> A that constitutes a main part of the frame 66, an outer plate 66 </ b> B, and a plurality of inner plates 66 </ b> C. Of these, the main body portion 66A is provided with the concave portion 66A1 described above. The pair of frames 66 and 67 are partially different from each other. First, a frame 66 (hereinafter referred to as “one side”) shown in FIG. 7 provided on the other end side in the extending direction of each conveyance roller 62 (the lower side in FIG. Will be described.
一方のフレーム66を構成する本体部66Aは、搬送方向(X軸方向)に沿って壁状に延在しており、凹状部66A1よりもやや下方に位置する部位のY軸方向における厚みが、軸受部64のY軸方向における幅寸法よりも大きいものとなっている。具体的には、本体部66Aは、凹状部66A1よりもやや下方に位置する部位が、搬送ローラ62におけるシャフト部62Aの縮径部62A1の先端よりも外側(図11で示す左側、搬送ローラ62の延在方向における中心側とは反対側)に迫り出している(以下、この迫り出した部位を「迫り出し部66A2」と称する)。外板66Bは、透明な合成樹脂製の板状部材とされ、上下方向(Z軸方向)においてその上端が搬送ローラ62の回転軸とほぼ同じ高さに位置した状態で、その下側部分が上記迫り出し部66A2の外面(図11で示す左側の面)に貼り付け固定されている。複数の内板66Cは、板状部材とされ、上下方向においてその上端が搬送ローラ62におけるシャフト部62Aの縮径部62A1と近接した状態で、その下側部分が本体部66Aの内面のうち各凹状部66A1と対応する位置にそれぞれ貼り付け固定されている。なお、図10及び図12に示すように、本体部66Aにおける各凹状部66A1の上方には、軸受部64が凹状部66A1から上方に抜けることを防止する抜け防止板69(図10及び図12を除く各図面では図示を省略している)が取り付けられている。
The main body portion 66A constituting one frame 66 extends in a wall shape along the transport direction (X-axis direction), and the thickness in the Y-axis direction of a portion located slightly below the concave portion 66A1 is It is larger than the width dimension of the bearing portion 64 in the Y-axis direction. Specifically, in the main body 66A, the portion located slightly below the concave portion 66A1 is outside the tip of the reduced diameter portion 62A1 of the shaft portion 62A of the transport roller 62 (left side, transport roller 62 shown in FIG. 11). (Hereinafter, the protruding portion is referred to as “protruding portion 66A2”). The outer plate 66B is a transparent synthetic resin plate-like member, and its upper portion is positioned at substantially the same height as the rotation shaft of the transport roller 62 in the vertical direction (Z-axis direction). It is stuck and fixed to the outer surface (left surface shown in FIG. 11) of the protruding portion 66A2. The plurality of inner plates 66C are plate-like members, and their upper ends are close to the reduced diameter portion 62A1 of the shaft portion 62A of the conveying roller 62 in the vertical direction, and the lower portion is each of the inner surfaces of the main body portion 66A. Each of them is affixed and fixed at a position corresponding to the concave portion 66A1. As shown in FIGS. 10 and 12, above the respective concave portions 66A1 in the main body portion 66A, a slip-off prevention plate 69 (FIGS. 10 and 12) that prevents the bearing portion 64 from being pulled upward from the concave portions 66A1. (The illustration is omitted in each drawing except for).
一方のフレーム66が上記のような構成とされることで、当該一方のフレーム66において本体部66Aと外板66Bと複数の内板66Cとによって囲まれる部分には、図9及び図11に示すように、液体を収容可能な液体収容部70が形成されている。ここで、上述したように、複数の内板66Cは、その上端が搬送ローラ62におけるシャフト部62Aの縮径部62A1と近接した状態で配されているので、図11に示すように、液体収容部70内には、軸受部64の軸受側凹部64A1の少なくとも一部が露出するものとされている。なお、一方のフレーム66において、本体部66Aにおける上記迫り出し部66A2は、搬送方向の上流側端部から下流側端部に亘って設けられている。このため、一方のフレーム66における液体収容部70は、図7及び図8に示すように、搬送方向の上流側端部から下流側端部に亘って溝状に延在している。
Since one frame 66 is configured as described above, a portion surrounded by the main body 66A, the outer plate 66B, and the plurality of inner plates 66C in the one frame 66 is shown in FIGS. Thus, the liquid storage part 70 which can store a liquid is formed. Here, as described above, the plurality of inner plates 66C are arranged in a state where the upper ends thereof are close to the reduced diameter portion 62A1 of the shaft portion 62A of the transport roller 62, so as shown in FIG. In the portion 70, at least a part of the bearing-side concave portion 64A1 of the bearing portion 64 is exposed. In one frame 66, the protruding portion 66A2 of the main body portion 66A is provided from the upstream end to the downstream end in the transport direction. For this reason, as shown in FIGS. 7 and 8, the liquid storage portion 70 in one frame 66 extends in a groove shape from the upstream end portion to the downstream end portion in the transport direction.
本体部66Aにおける搬送方向の上流側端部には、図7に示すように、液体収容部70内に液体を供給するための円形の供給口(液体供給部の一例)66A3が液体収容部70内に露出する形で設けられている。一方、本体部66Aにおける搬送方向の下流側端部には、図7及び図9に示すように、液体収容部70内の液体を外部に排出するための円形の排水口(液体排出部の一例)66A4が液体収容部70内に露出する形で設けられている。また、図7に示すように、上記供給口66A3には、洗浄装置50の外部から当該供給口66A3へ液体を供給するための供給管72の一端が取り付けられており、上記排出口66A4には、当該排出口66A4から洗浄装置50の外部へ液体を排出するための排出管74の一端が取り付けられている。このような構成とされることで、一方のフレーム66では、洗浄装置50の外部から供給口66A3を介して液体収容部70内に供給された液体が、液体収容部70内を搬送方向の上流側から下流側に向かって流れ、排出口66A4から洗浄装置50の外部へと排出されるようになっている。なお、上述したように外板66Bは透明とされているので、液体収容部70内に液体が収容された状態では、液体収容部70内の液体を搬送装置60の側方から視認することができる。
As shown in FIG. 7, a circular supply port (an example of a liquid supply unit) 66 </ b> A <b> 3 for supplying a liquid into the liquid storage unit 70 is provided at the upstream end of the main body 66 </ b> A in the transport direction. It is provided so as to be exposed inside. On the other hand, at the downstream end of the main body 66A in the transport direction, as shown in FIGS. 7 and 9, a circular drainage port (an example of a liquid discharger) for discharging the liquid in the liquid container 70 to the outside. 66A4 is exposed in the liquid container 70. As shown in FIG. 7, one end of a supply pipe 72 for supplying a liquid to the supply port 66A3 from the outside of the cleaning device 50 is attached to the supply port 66A3, and the discharge port 66A4 has a discharge port 66A4. One end of a discharge pipe 74 for discharging the liquid from the discharge port 66A4 to the outside of the cleaning device 50 is attached. With such a configuration, in one frame 66, the liquid supplied from the outside of the cleaning device 50 through the supply port 66 </ b> A <b> 3 into the liquid storage unit 70 is upstream in the transport direction in the liquid storage unit 70. It flows from the side toward the downstream side and is discharged from the discharge port 66A4 to the outside of the cleaning device 50. Since the outer plate 66B is transparent as described above, the liquid in the liquid storage unit 70 can be viewed from the side of the transport device 60 when the liquid is stored in the liquid storage unit 70. it can.
本実施形態では、液体収容部70内に供給される液体の一例として純水W1を例示する(図7、図8、図11及び図12参照)。一方のフレーム66では、液体収容部70内に純水W1が流し込まれると、図11及び図12に示すように、液体収容部70内に露出する軸受部64の軸受側凹部64A1の一部が純水W1に浸った状態となる。ここで、本実施形態の搬送装置60では、搬送ローラ62の回転時にスリップ等によって搬送ローラ62と軸受部64との間が摺動することで、軸受部64の軸受側凹部64A1が摩耗し、当該軸受側凹部64A1から錆粉等の塵や埃が発生することがある。この点、搬送装置60における一方のフレーム66では、一方のフレーム66側に配された軸受部64の軸受側凹部64A1に錆粉等の塵や埃が発生した発生した場合であっても、液体収容部70内に純水W1が流し込まれ、錆粉等の塵や埃が発生した軸受側凹部64A1が上述したように純水W1に浸った状態となることで、当該塵や埃が軸受側凹部64A1から流し落とされるようになっている。また、軸受側凹部64A1のうち液体収容部70内に露出する部位以外の部位に上記塵や埃が発生した場合であっても、搬送ローラ62の回転に伴って当該塵や埃が軸受側凹部64Aに沿って液体収容部70内に露出する軸受側凹部64A1の部位まで移動することで、当該塵や埃が液体収容部70内の純水W1によって流し落とされるようになっている。
In the present embodiment, pure water W1 is exemplified as an example of the liquid supplied into the liquid storage unit 70 (see FIGS. 7, 8, 11, and 12). In one frame 66, when pure water W <b> 1 is poured into the liquid storage part 70, a part of the bearing-side recess 64 </ b> A <b> 1 of the bearing part 64 exposed in the liquid storage part 70 is formed as shown in FIGS. 11 and 12. It will be in the state immersed in the pure water W1. Here, in the transport device 60 of the present embodiment, the bearing-side concave portion 64A1 of the bearing portion 64 is worn by sliding between the transport roller 62 and the bearing portion 64 due to slip or the like when the transport roller 62 rotates. Dust and dust such as rust powder may be generated from the bearing side recess 64A1. In this regard, in one frame 66 in the transport device 60, even when dust or dust such as rust powder is generated in the bearing-side concave portion 64A1 of the bearing portion 64 disposed on the one frame 66 side, liquid is generated. The pure water W1 is poured into the housing portion 70, and the bearing-side recess 64A1 in which dust or dust such as rust powder is generated is immersed in the pure water W1 as described above. It is made to flow down from the recess 64A1. Further, even when the dust or dust is generated in a portion of the bearing-side recess 64A1 other than the portion exposed in the liquid storage portion 70, the dust or dust is transferred to the bearing-side recess as the transport roller 62 rotates. By moving to the bearing-side concave portion 64A1 exposed in the liquid storage portion 70 along 64A, the dust and dirt are washed away by the pure water W1 in the liquid storage portion 70.
次に、各搬送ローラ62の延在方向の一端側(図8における図面上側、回転機構68が設けられた側)に設けられたフレーム67(以下、「他方のフレーム67」と称する)の構成について簡単に説明する。他方のフレーム67では、図8に示すように、本体部と外板と複数の内板とによって囲まれる部分に形成される液体収容部71が、一方のフレーム66のように搬送方向の上流側端部から下流側端部に亘って設けられておらず、搬送方向に沿って間欠的に複数形成されている。このため、他方のフレーム67では、液体収容部71内に流し込まれた純水W1が、搬送方向の上流側から下流側に向かって流れるようになっておらず、液体収容部71内に貯留されるようになっている。このような構成であっても、液体収容部71内に純水W1が流し込まれると、液体収容部71内に露出する軸受部64の軸受側凹部64A1が純水W1に浸った状態となる。このため、他方のフレーム67側に配された軸受部の軸受側凹部に錆粉等の塵や埃が発生した発生した場合、液体収容部70内に純水W1が流し込まれ、錆粉等の塵や埃が発生した軸受側凹部が搬送ローラ62の回転に伴って上述したように純水W1に浸った状態となることで、当該塵や埃が軸受側凹部から流し落とされるようになっている。
Next, a configuration of a frame 67 (hereinafter, referred to as “the other frame 67”) provided on one end side in the extending direction of each conveyance roller 62 (the upper side in FIG. 8, the side on which the rotation mechanism 68 is provided). A brief explanation will be given. In the other frame 67, as shown in FIG. 8, the liquid storage portion 71 formed in a portion surrounded by the main body portion, the outer plate, and the plurality of inner plates has an upstream side in the transport direction like the one frame 66. It is not provided from the end portion to the downstream end portion, and is formed intermittently along the transport direction. For this reason, in the other frame 67, the pure water W1 poured into the liquid container 71 does not flow from the upstream side to the downstream side in the transport direction, and is stored in the liquid container 71. It has become so. Even in such a configuration, when pure water W1 is poured into the liquid storage portion 71, the bearing-side concave portion 64A1 of the bearing portion 64 exposed in the liquid storage portion 71 is immersed in the pure water W1. For this reason, when dust or dirt such as rust powder is generated in the bearing side concave portion of the bearing portion arranged on the other frame 67 side, pure water W1 is poured into the liquid storage portion 70, and rust powder or the like is generated. The bearing-side recess in which dust or dust is generated is immersed in the pure water W1 as described above in accordance with the rotation of the transport roller 62, so that the dust or dust is washed away from the bearing-side recess. Yes.
ところで、本実施形態の洗浄装置50では、軸受部64の軸受側凹部64A1から発生した錆粉等の塵や埃がノズルから噴射される洗浄液に混入することがある。そして、上述したように洗浄装置50ではノズルから噴射された洗浄液が循環されて再び洗浄液として使用されるようになっているため、アレイ基板30の製造過程において、洗浄装置50が他の製造装置51~56による工程の後で使用されると、上記塵や埃が混入した洗浄液がガラス基板30A上に噴射されることがある。このため、洗浄装置50が他の製造装置51~56による工程の後で使用される場合、軸受側凹部64A1から発生した錆粉等の塵や埃が洗浄液に紛れて例えばガラス基板30A上に成膜された上記ゲート絶縁膜37や上記層間絶縁膜39に付着し、ゲート絶縁膜異物又は層間絶縁膜異物として検出されることがある。
Incidentally, in the cleaning device 50 of the present embodiment, dust such as rust powder generated from the bearing-side recess 64A1 of the bearing portion 64 may be mixed into the cleaning liquid ejected from the nozzle. As described above, since the cleaning liquid ejected from the nozzles is circulated and used again as the cleaning liquid in the cleaning apparatus 50, in the manufacturing process of the array substrate 30, the cleaning apparatus 50 is replaced with another manufacturing apparatus 51. When used after the steps of .about.56, the cleaning liquid mixed with dust or dust may be sprayed onto the glass substrate 30A. For this reason, when the cleaning apparatus 50 is used after the process by the other manufacturing apparatuses 51 to 56, dust such as rust powder generated from the bearing-side recess 64A1 is mixed with the cleaning liquid and formed on, for example, the glass substrate 30A. The film may adhere to the gate insulating film 37 and the interlayer insulating film 39 and may be detected as a gate insulating film foreign material or an interlayer insulating film foreign material.
また、洗浄装置50が他の製造装置51~56による工程の後で使用される場合、軸受側凹部64A1から発生した塵や埃が洗浄液に紛れて例えばガラス基板30A上に成膜された上記ゲート絶縁膜37や上記層間絶縁膜39に付着し、ゲート絶縁膜37や層間絶縁膜39の一部と共にガラス基板30Aから剥がれることで、ゲート絶縁膜欠損又は層間絶縁膜欠損として検出されることがある。このような異物や欠損が検出されたアレイ基板30は、不良品とされる。この点、上記の洗浄装置50が備える搬送装置60では、上述したように、軸受側凹部64A1から発生した塵や埃が液体収容部70内に流し込まれた純水W1によって流し落とされるため、アレイ基板30の製造過程において、軸受側凹部64A1から発生した塵や埃に起因してアレイ基板30に不良品が発生することが防止ないし抑制される。
Further, when the cleaning apparatus 50 is used after the process by the other manufacturing apparatuses 51 to 56, the above-described gate formed on the glass substrate 30A, for example, with dust or dust generated from the bearing-side recess 64A1 being mixed with the cleaning liquid. Attached to the insulating film 37 and the interlayer insulating film 39 and peeled off from the glass substrate 30A together with a part of the gate insulating film 37 and the interlayer insulating film 39 may be detected as a gate insulating film defect or an interlayer insulating film defect. . The array substrate 30 in which such foreign matter or defect is detected is regarded as a defective product. In this regard, in the transfer device 60 provided in the cleaning device 50, as described above, dust and dirt generated from the bearing-side recess 64A1 are washed away by the pure water W1 that has been poured into the liquid storage portion 70. In the manufacturing process of the substrate 30, it is prevented or suppressed that defective products are generated on the array substrate 30 due to dust or dust generated from the bearing-side recess 64A1.
以上説明したように本実施形態の洗浄装置50が備える搬送装置60では、液体収容部70内に純水W1を流し込むことで、軸受部64の軸受側凹部64A1のうち液体収容部70内に露出する部位を純水W1に浸らせることができる。その結果、液体収容部70内の純水W1が軸受部64の潤滑剤として機能し、軸受部64の軸受側凹部64A1に塵や埃が発生することを防止ないし抑制することができる。また、軸受部64の軸受側凹部64A1に塵や埃が発生したとしても、液体収容部70内の純水W1によって上記塵や埃を当該軸受側凹部64A1から流し落とすことができ、上記塵や埃がガラス基板30A上に付着することを防止ないし抑制することができる。また、フレーム66,67に上記のような構成とされた液体収容部70を設けるのみで上記塵や埃のガラス基板30Aへの付着を防止ないし抑制できるので、装置が大型化することを回避することができる。このように、本実施形態の搬送装置60では、装置の大型化を回避しながら、軸受部64の軸受側凹部64A1から発生した塵や埃が搬送対象であるガラス基板30Aに付着することを防止ないし抑制することができる。
As described above, in the transfer device 60 included in the cleaning device 50 of the present embodiment, the pure water W1 is poured into the liquid storage unit 70, so that the bearing side recess 64A1 of the bearing unit 64 is exposed to the liquid storage unit 70. The part to be performed can be immersed in the pure water W1. As a result, the pure water W1 in the liquid storage part 70 functions as a lubricant for the bearing part 64, and it is possible to prevent or suppress the generation of dust and dirt in the bearing-side recess 64A1 of the bearing part 64. Further, even if dust or dirt is generated in the bearing-side recess 64A1 of the bearing portion 64, the dust or dust can be washed away from the bearing-side recess 64A1 by the pure water W1 in the liquid storage portion 70. It is possible to prevent or suppress dust from adhering to the glass substrate 30A. In addition, since the dust and dust can be prevented or suppressed from adhering to the glass substrate 30A only by providing the frames 66 and 67 with the liquid container 70 having the above-described configuration, an increase in the size of the apparatus is avoided. be able to. As described above, in the transport device 60 of the present embodiment, dust and dust generated from the bearing-side recess 64A1 of the bearing portion 64 are prevented from adhering to the glass substrate 30A to be transported while avoiding an increase in size of the device. Or can be suppressed.
また本実施形態では、一方のフレーム66側に設けられた液体収容部70が溝状に延在するものとされている。さらに、一方のフレーム66側において、搬送方向(液体収容部70の延在方向)の上流側端部に液体収容部70内に純水W1を供給する供給口66A3が設けられ、搬送方向の下流側端部に液体収容部70内を流れる純水W1を排出する排出口66A4が設けられている。このような構成とされていることで、一方のフレーム66側では、供給口66A3から液体収容部70内に新たな純水W1が順次供給されるとともに、軸受側凹部64A1に発生した塵や埃を流し落とした純水W1が排出口66A4において液体収容部70から順次排出される。このため、搬送方向の上流側から下流側に向かって溝状の液体収容部70内を純水W1が流れる力によって、軸受部64の軸受側凹部64A1に発生した塵や埃等を効果的に流し落とすことができる。
In the present embodiment, the liquid storage portion 70 provided on the one frame 66 side extends in a groove shape. Further, on one frame 66 side, a supply port 66A3 that supplies pure water W1 into the liquid storage unit 70 is provided at the upstream end in the transport direction (extending direction of the liquid storage unit 70), and downstream in the transport direction. A discharge port 66A4 for discharging the pure water W1 flowing in the liquid storage unit 70 is provided at the side end. With such a configuration, on one frame 66 side, new pure water W1 is sequentially supplied from the supply port 66A3 into the liquid storage portion 70, and dust or dust generated in the bearing-side recess 64A1. The pure water W1 that has been washed away is sequentially discharged from the liquid container 70 at the discharge port 66A4. For this reason, dust, dust, and the like generated in the bearing-side recess 64A1 of the bearing portion 64 are effectively generated by the force of the pure water W1 flowing in the groove-shaped liquid storage portion 70 from the upstream side to the downstream side in the transport direction. Can be washed away.
また本実施形態では、上述したように軸受部64び軸受側凹部64A1から発生した塵や埃が洗浄液に紛れて搬送対象であるガラス基板30Aに付着することを防止することができる。その結果、アレイ基板30の製造過程において、上記塵や埃に起因してアレイ基板30に不良品が発生することを防止ないし抑制することができる。
Further, in the present embodiment, as described above, it is possible to prevent dust and dust generated from the bearing portion 64 and the bearing-side concave portion 64A1 from being mixed with the cleaning liquid and adhering to the glass substrate 30A to be transported. As a result, it is possible to prevent or suppress the occurrence of defective products on the array substrate 30 due to the dust or dust during the manufacturing process of the array substrate 30.
また本実施形態では、上述したように、液体収容部70内に純水W1を流し込むことで、液体収容部70内の純水W1がボールベアリングとされた軸受部64の潤滑剤としても機能する。このため、軸受部64によって回転可能に支持される搬送ローラ62の回転性能を良好な状態に保つことができる。
In the present embodiment, as described above, the pure water W1 in the liquid storage portion 70 flows into the liquid storage portion 70, so that the pure water W1 in the liquid storage portion 70 also functions as a lubricant for the bearing portion 64 configured as a ball bearing. . For this reason, the rotation performance of the conveyance roller 62 rotatably supported by the bearing portion 64 can be maintained in a good state.
<実施形態2>
図13及び図14を参照して実施形態2を説明する。実施形態2は、搬送装置における搬送ローラ162の構成、軸受部164の構成、軸受部164による搬送ローラ162の支持態様、及びフレーム166における軸受部164の保持態様が実施形態1のものとそれぞれ異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。なお、図13、図14において、それぞれ図10、図11の参照符号に数字100を加えた部位は、実施形態1で説明した部位と同一である。 <Embodiment 2>
The second embodiment will be described with reference to FIGS. 13 and 14. The second embodiment is different from the first embodiment in the configuration of thetransport roller 162 in the transport device, the configuration of the bearing unit 164, the support mode of the transport roller 162 by the bearing unit 164, and the holding mode of the bearing unit 164 in the frame 166. ing. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted. In FIGS. 13 and 14, the parts obtained by adding the numeral 100 to the reference numerals in FIGS. 10 and 11 are the same as the parts described in the first embodiment.
図13及び図14を参照して実施形態2を説明する。実施形態2は、搬送装置における搬送ローラ162の構成、軸受部164の構成、軸受部164による搬送ローラ162の支持態様、及びフレーム166における軸受部164の保持態様が実施形態1のものとそれぞれ異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。なお、図13、図14において、それぞれ図10、図11の参照符号に数字100を加えた部位は、実施形態1で説明した部位と同一である。 <Embodiment 2>
The second embodiment will be described with reference to FIGS. 13 and 14. The second embodiment is different from the first embodiment in the configuration of the
本実施形態の洗浄装置が備える搬送装置では、実施形態1のものと異なり、ボールベアリングとされた軸受部164が、搬送ローラ162のシャフト部162Aの軸周りの内側に配されている。即ち、図13に示すように、搬送ローラ162のシャフト部162Aが筒状とされ、内部が中空とされるとともに、その全体が均一な径となっている。一方、軸受部164は、図13及び図14に示すように、円柱状とされるとともに搬送ローラ162のシャフト部162Aの内径よりも径小とされた金属製の円柱部164Aと、シャフト部162Aと円柱部164Aとの間に介在する金属製の複数のボール164Bと、を有している。軸受部164は、円柱部164Aの外面がフレーム166の本体部166Aにおける内面に接着固定されることで、フレーム166に対して保持されている。円柱部164Aのうちシャフト部162Aと対向する部位には、図14に示すように、内側に窪んでなるとともに各ボール164Bの一部が入り込んだ溝状の軸受側凹部(摺接部位の一例)164A1が設けられている。一方、シャフト部162Aにおいて軸受側凹部164A1と対向する部位には、同様に内側に窪んでなるとともに各ボール164Bの一部が入り込んだ溝状のシャフト側凹部162A2が設けられている。
In the transport device provided in the cleaning device of the present embodiment, unlike the first embodiment, a bearing portion 164 that is a ball bearing is disposed on the inner side of the shaft portion 162A of the transport roller 162 around the axis. That is, as shown in FIG. 13, the shaft portion 162 </ b> A of the conveying roller 162 is cylindrical, the inside is hollow, and the whole has a uniform diameter. On the other hand, as shown in FIGS. 13 and 14, the bearing portion 164 has a cylindrical shape and a shaft portion 162 </ b> A made of a metal and having a diameter smaller than the inner diameter of the shaft portion 162 </ b> A of the transport roller 162. And a plurality of metal balls 164B interposed between the cylindrical portion 164A. The bearing portion 164 is held with respect to the frame 166 by bonding and fixing the outer surface of the cylindrical portion 164 </ b> A to the inner surface of the main body portion 166 </ b> A of the frame 166. As shown in FIG. 14, the cylindrical portion 164A has a groove-like bearing-side recess (an example of a sliding contact portion) that is recessed inward and into which a part of each ball 164B enters, as shown in FIG. 164A1 is provided. On the other hand, in the portion of the shaft portion 162A that faces the bearing-side concave portion 164A1, a groove-like shaft-side concave portion 162A2 that is also recessed inward and into which a part of each ball 164B enters is provided.
各ボール164Bが入り込んだ軸受側凹部164A1及びシャフト側凹部162A2が上記のような構成とされていることで、各ボール164Bは、円柱部164Aによって摺動可能に支持された状態となっている。換言すれば、軸受部164は、各軸受側凹部164A1において、ボール164Bを介して搬送ローラのシャフト部162Aと摺接している。上述したように本実施形態の軸受部164はその円柱部164Aがフレーム166によって保持されているため、軸受部164の円柱部164Aと搬送ローラ162のシャフト部162Aとの間で各ボール164Bが摺動することで、円柱部164Aは回転せず、図示しない回転機構によって搬送ローラ162のみがその軸周りに回転するようになっている。
Since the bearing-side recess 164A1 and the shaft-side recess 162A2 into which the balls 164B have entered are configured as described above, each ball 164B is slidably supported by the columnar portion 164A. In other words, the bearing portion 164 is in sliding contact with the shaft portion 162A of the conveying roller via the ball 164B in each bearing-side recess 164A1. As described above, since the cylindrical portion 164A of the bearing portion 164 of the present embodiment is held by the frame 166, each ball 164B slides between the cylindrical portion 164A of the bearing portion 164 and the shaft portion 162A of the conveying roller 162. By moving, the cylindrical portion 164A does not rotate, and only the transport roller 162 rotates about its axis by a rotation mechanism (not shown).
フレーム166を構成する本体部166Aは、実施形態1と同様に搬送方向(X軸方向)に沿って壁状に延在している。本体部166Aは、その内面(軸受部164の円柱部164Aが接着された面)の上端が当該円柱部164Aの上端とほぼ一致しており、その外面側が当該円柱部164Aの上端よりもやや下方に位置するように段差をなして外面側に迫り出した迫り出し部166A2となっている。外板166Bは、透明な合成樹脂製の板状部材とされ、上下方向(Z軸方向)においてその上端が搬送ローラ162におけるシャフト部162Aよりもやや上方に位置する形で、本体部166Aの外面に接着固定されている。複数の内板166Cは、板状部材とされ、上下方向においてその上端が軸受部164の円柱部164Aの上端よりもやや上方に位置した状態で、各軸受部164の円柱部164Aにおける内面にそれぞれ貼り付け固定されている。
The main body 166A constituting the frame 166 extends in a wall shape along the transport direction (X-axis direction) as in the first embodiment. The main body 166A has an inner surface (surface to which the cylindrical portion 164A of the bearing portion 164 is bonded) substantially coincides with the upper end of the cylindrical portion 164A, and its outer surface is slightly below the upper end of the cylindrical portion 164A. The protruding portion 166A2 protrudes to the outer surface side with a step so as to be located at the center. The outer plate 166B is a transparent synthetic resin plate-like member, and its upper end is positioned slightly above the shaft portion 162A of the conveying roller 162 in the vertical direction (Z-axis direction), and the outer surface of the main body portion 166A. It is fixed to the adhesive. The plurality of inner plates 166C are plate-like members, and the upper ends thereof are positioned slightly above the upper ends of the columnar portions 164A of the bearing portions 164 in the vertical direction, respectively, on the inner surfaces of the columnar portions 164A of the respective bearing portions 164. Pasted and fixed.
本実施形態では、搬送ローラ162、軸受部164、及びフレーム166がそれぞれ上記のような構成とされることで、フレーム166において本体部166Aと外板166Bと複数の内板166Cとによって囲まれる部分に、図13及び図14に示すように、液体を収容可能な液体収容部170が形成されている。ここで、上述したように、複数の内板166Cは、その上端が軸受部164の円柱部164Aの上端よりもやや上方に位置した状態で配されているので、図14に示すように、液体収容部170内には、軸受部164の軸受側凹部164A1の少なくとも一部が露出するものとされている。なお、本実施形態における液体収容部170は、実施形態1と同様に、搬送方向の上流側端部から下流側端部に亘って溝状に延在しており、本体部166Aにおける搬送方向の上流側端部に供給口、本体部166Aにおける搬送方向の下流側端部に排出口がそれぞれ設けられている。また、フレーム166の本体部166Aには、軸受部164の下方に位置する受け板168が取り付けられており、これにより、ボール164Bのうち図14において下側に位置するボール164Bから漏れる液体(洗浄液)を受けることが可能とされ、受けた液体は排出樋169から外部へ排出されるものとなっている。
In the present embodiment, the conveyance roller 162, the bearing portion 164, and the frame 166 are configured as described above, so that the frame 166 is surrounded by the main body 166A, the outer plate 166B, and the plurality of inner plates 166C. Further, as shown in FIGS. 13 and 14, a liquid storage portion 170 capable of storing a liquid is formed. Here, as described above, the plurality of inner plates 166C are arranged with their upper ends positioned slightly above the upper ends of the columnar portions 164A of the bearing portions 164. Therefore, as shown in FIG. At least a part of the bearing-side recess 164A1 of the bearing portion 164 is exposed in the housing portion 170. Note that, similarly to the first embodiment, the liquid storage unit 170 in the present embodiment extends in a groove shape from the upstream end in the transport direction to the downstream end, and in the transport direction in the main body 166A. A supply port is provided at the upstream end, and a discharge port is provided at the downstream end in the conveying direction of the main body 166A. In addition, a receiving plate 168 positioned below the bearing portion 164 is attached to the main body portion 166A of the frame 166, whereby liquid leaking from the ball 164B positioned below the ball 164B in FIG. ), And the received liquid is discharged from the discharge basin 169 to the outside.
以上説明したように本実施形態においても、液体収容部170内に軸受側凹部164A1の少なくとも一部が露出することで、実施形態1と同様に、液体収容部170内に純水W1を流し込むことで、軸受部164の軸受側凹部164A1のうち液体収容部170内に露出する部位を純水W1に浸らせることができる。その結果、軸受部164の軸受側凹部164A1に塵や埃が発生したとしても、液体収容部170内の純水W1によって上記塵や埃を当該軸受側凹部164A1から流し落とすことができ、上記塵や埃が搬送対象であるガラス基板上に付着することを防止ないし抑制することができる。また、搬送方向の上流側から下流側に向かって溝状とされた液体収容部170内を新たな純水W1が順次流れることとなるため、液体収容部170内を純水W1が流れる力によって、軸受部164の軸受側凹部164A1に発生した塵や埃等を効果的に流し落とすことができる。
As described above, also in this embodiment, when at least a part of the bearing-side recess 164A1 is exposed in the liquid storage portion 170, the pure water W1 is poured into the liquid storage portion 170 as in the first embodiment. Thus, a portion of the bearing-side concave portion 164A1 of the bearing portion 164 exposed in the liquid storage portion 170 can be immersed in the pure water W1. As a result, even if dust or dirt is generated in the bearing-side recess 164A1 of the bearing portion 164, the dust or dust can be washed away from the bearing-side recess 164A1 by the pure water W1 in the liquid storage portion 170. It is possible to prevent or suppress dust and dust from adhering to the glass substrate that is the conveyance target. In addition, since the new pure water W1 sequentially flows in the liquid storage portion 170 that has a groove shape from the upstream side to the downstream side in the transport direction, the force of the pure water W1 flowing in the liquid storage portion 170 Thus, dust or dirt generated in the bearing-side recess 164A1 of the bearing portion 164 can be effectively washed away.
<実施形態3>
図15及び図16を参照して実施形態3を説明する。実施形態3は、搬送装置260におけるフレーム266の構成が実施形態1のものとそれぞれ異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。なお、図15、図16において、それぞれ図7、図9の参照符号に数字200を加えた部位は、実施形態1で説明した部位と同一である。 <Embodiment 3>
The third embodiment will be described with reference to FIGS. 15 and 16. The third embodiment is different from the first embodiment in the configuration of theframe 266 in the transport device 260. Since the other configuration is the same as that of the first embodiment, the description of the structure, operation, and effect is omitted. 15 and FIG. 16, the parts obtained by adding the numeral 200 to the reference numerals in FIG. 7 and FIG. 9 are the same as the parts described in the first embodiment.
図15及び図16を参照して実施形態3を説明する。実施形態3は、搬送装置260におけるフレーム266の構成が実施形態1のものとそれぞれ異なっている。その他の構成については実施形態1と同様であるため、構造、作用、及び効果の説明は省略する。なお、図15、図16において、それぞれ図7、図9の参照符号に数字200を加えた部位は、実施形態1で説明した部位と同一である。 <Embodiment 3>
The third embodiment will be described with reference to FIGS. 15 and 16. The third embodiment is different from the first embodiment in the configuration of the
本実施形態の洗浄装置250が備える搬送装置260では、図15及び図16に示すように、フレーム266における本体部266Aの迫り出し部(凹状部266A1よりもやや下方に位置する部位において外側に迫り出した部位)において、隣り合う凹状部266A1の間に液体収容部270を隔てる隔壁266A3がそれぞれ設けられている。その結果、フレーム266では、1つの軸受部264に1つの液体収容部270が対応する形で、搬送方向に沿って隔壁266A3によって隔てられた複数の液体収容部270が形成されている。従って、各液体収容部270内には、軸受部264の軸受側凹部264A1の少なくとも一部が露出した状態となっている。そして、各液体収容部270内に流し込まれた純水W1は、実施形態1における他方のフレーム67側に設けられた液体収容部71と同様に、液体収容部270内に貯留されるようになっている。
In the transfer device 260 provided in the cleaning device 250 of the present embodiment, as shown in FIGS. 15 and 16, the protruding portion of the main body 266A in the frame 266 (approaching outward in a portion located slightly below the concave portion 266A1). The partition 266A3 that separates the liquid storage portion 270 is provided between the adjacent concave portions 266A1. As a result, in the frame 266, a plurality of liquid storage portions 270 separated by the partition walls 266A3 along the transport direction are formed so that one liquid storage portion 270 corresponds to one bearing portion 264. Accordingly, at least a part of the bearing-side recess 264A1 of the bearing portion 264 is exposed in each liquid storage portion 270. And the pure water W1 poured into each liquid storage part 270 is stored in the liquid storage part 270 similarly to the liquid storage part 71 provided on the other frame 67 side in the first embodiment. ing.
本実施形態では、搬送装置260において、上記のように1つの軸受部264に1つの液体収容部270が対応する形で複数の液体収容部270が形成されている場合であっても、各液体収容部270内に純水W1が流し込まれると、各液体収容部270内に露出する軸受部264の軸受側凹部264A1の各々が純水W1に浸った状態となる。このため、各軸受部264の軸受側凹部264A1に塵や埃が発生したとしても、液体収容部270内の純水W1によって上記塵や埃を当該軸受側凹部264A1から流し落とすことができ、上記塵や埃が搬送対象であるガラス基板230A上に付着することを防止ないし抑制することができる。
In the present embodiment, in the transport device 260, even if a plurality of liquid storage portions 270 are formed in a form in which one liquid storage portion 270 corresponds to one bearing portion 264 as described above, When the pure water W1 is poured into the storage portions 270, each of the bearing-side recesses 264A1 of the bearing portions 264 exposed in the liquid storage portions 270 is immersed in the pure water W1. For this reason, even if dust or dust is generated in the bearing-side recess 264A1 of each bearing portion 264, the dust or dust can be washed away from the bearing-side recess 264A1 by the pure water W1 in the liquid storage portion 270. It is possible to prevent or suppress dust and dust from adhering to the glass substrate 230A that is a conveyance target.
上記の各実施形態の変形例を以下に列挙する。
(1)上記の各実施形態では、洗浄装置が備える搬送装置の構成について例示したが、洗浄装置以外でガラス基板に対してウェットプロセスを施す装置、即ちレジスト塗布装置、現像装置、ウェットエッチングを行うエッチング装置、及びレジスト剥離装置の各装置に上述したような液体収容部が設けられた搬送装置を適用してもよい。この場合、各装置において用いる処理液に軸受部の軸軸受側凹部から発生した塵や埃が紛れ込んだとしても、当該塵や埃を液体収容部内に流し込まれた純水によって流し落とすことができ、当該塵や埃が搬送装置によって搬送されるガラス基板上に付着することを防止ないし抑制することができる。 The modifications of the above embodiments are listed below.
(1) In each of the above embodiments, the configuration of the transport device included in the cleaning device has been illustrated, but a device that performs a wet process on the glass substrate other than the cleaning device, that is, a resist coating device, a developing device, and wet etching is performed. You may apply the conveying apparatus provided with the above-mentioned liquid accommodating part in each apparatus of an etching apparatus and a resist peeling apparatus. In this case, even if dust or dust generated from the shaft bearing side recess of the bearing portion is mixed into the processing liquid used in each apparatus, the dust or dust can be washed away by pure water poured into the liquid storage portion, The dust or dust can be prevented or suppressed from adhering to the glass substrate conveyed by the conveying device.
(1)上記の各実施形態では、洗浄装置が備える搬送装置の構成について例示したが、洗浄装置以外でガラス基板に対してウェットプロセスを施す装置、即ちレジスト塗布装置、現像装置、ウェットエッチングを行うエッチング装置、及びレジスト剥離装置の各装置に上述したような液体収容部が設けられた搬送装置を適用してもよい。この場合、各装置において用いる処理液に軸受部の軸軸受側凹部から発生した塵や埃が紛れ込んだとしても、当該塵や埃を液体収容部内に流し込まれた純水によって流し落とすことができ、当該塵や埃が搬送装置によって搬送されるガラス基板上に付着することを防止ないし抑制することができる。 The modifications of the above embodiments are listed below.
(1) In each of the above embodiments, the configuration of the transport device included in the cleaning device has been illustrated, but a device that performs a wet process on the glass substrate other than the cleaning device, that is, a resist coating device, a developing device, and wet etching is performed. You may apply the conveying apparatus provided with the above-mentioned liquid accommodating part in each apparatus of an etching apparatus and a resist peeling apparatus. In this case, even if dust or dust generated from the shaft bearing side recess of the bearing portion is mixed into the processing liquid used in each apparatus, the dust or dust can be washed away by pure water poured into the liquid storage portion, The dust or dust can be prevented or suppressed from adhering to the glass substrate conveyed by the conveying device.
(2)上記の各実施形態では、アレイ基板の製造過程において用いられる洗浄装置を例示したが、カラーフィルタ基板の製造過程に用いられる洗浄装置に本発明を適用してもよい。この場合、軸受側凹部から発生した塵や埃に起因してカラーフィルタ基板に不良品が発生することを防止ないし抑制することができる。
(2) In each of the above embodiments, the cleaning apparatus used in the manufacturing process of the array substrate has been exemplified. However, the present invention may be applied to a cleaning apparatus used in the manufacturing process of the color filter substrate. In this case, it is possible to prevent or suppress the occurrence of defective products on the color filter substrate due to dust generated from the bearing-side recess.
(3)上記の各実施形態では、液体収容部に流し込まれる液体の一例として純水を例示したが、液体収容部に流し込まれる液体は、軸受部の軸受側凹部から発生した塵や埃を流し落とすことができる程度の粘度の液体であればよく、純水に限定されない。
(3) In each of the above embodiments, pure water is exemplified as an example of the liquid that is poured into the liquid storage unit. However, the liquid that is poured into the liquid storage unit allows dust and dust generated from the bearing-side recess of the bearing unit to flow. The liquid is not limited to pure water as long as it has a viscosity that can be dropped.
(4)上記の各実施形態では、搬送装置に搬送される搬送対象部材の一例としてガラス基板を例示したが、搬送装置に搬送される搬送対象部材はガラス基板に限定されない。搬送対象部材がガラス基板以外で合っても、本発明を適用することで、軸受部の軸受側凹部から発生した塵や埃が当該搬送対象部材に付着することを防止ないし抑制することができる。
(4) In each of the above embodiments, the glass substrate is illustrated as an example of the conveyance target member conveyed to the conveyance device, but the conveyance target member conveyed to the conveyance device is not limited to the glass substrate. Even if the conveyance target member is other than the glass substrate, by applying the present invention, it is possible to prevent or suppress dust and dust generated from the bearing-side concave portion of the bearing portion from adhering to the conveyance target member.
(5)上記の各実施形態では、軸受部がボールベアリングとされた構成を例示したが、軸受部がボールベアリング以外の構成とされていてもよい。この場合であっても、本発明を適用することで、軸受部の摺接部位から発生した塵や埃が搬送対象部材に付着することを防止ないし抑制することができる。
(5) In each of the above embodiments, the configuration in which the bearing portion is a ball bearing has been illustrated, but the bearing portion may have a configuration other than the ball bearing. Even in this case, by applying the present invention, it is possible to prevent or suppress the dust generated from the sliding contact portion of the bearing portion from adhering to the conveyance target member.
(6)上記の各実施形態以外にも、保持部材における液体収容部の形状及び構成については、適宜に変更可能である。
(6) In addition to the above embodiments, the shape and configuration of the liquid storage portion in the holding member can be changed as appropriate.
以上、本発明の各実施形態について詳細に説明したが、これらは例示に過ぎず、特許請求の範囲を限定するものではない。特許請求の範囲に記載の技術には、以上に例示した具体例を様々に変形、変更したものが含まれる。
As mentioned above, although each embodiment of this invention was described in detail, these are only illustrations and do not limit a claim. The technology described in the claims includes various modifications and changes of the specific examples illustrated above.
次に、実施例によって本発明を具体的に説明する。実施例では、アレイ基板の製造過程において、洗浄装置が備える搬送装置に対する本発明の適用前後で、ガラス基板上に成膜されたゲート絶縁膜のゲート絶縁膜異物、ゲート絶縁膜欠損、及びガラス基板上に成膜された層間絶縁膜の層間絶縁膜異物、層間絶縁膜欠損をそれぞれ検出した。なお、図17及び図18における数値は、個別不良率(検査を行った総個体数に対する不良品が発生した個体の割合)を百分率(%)で示したものである。
Next, the present invention will be specifically described with reference to examples. In the embodiment, in the manufacturing process of the array substrate, before and after the application of the present invention to the transfer device provided in the cleaning device, the gate insulating film foreign matter of the gate insulating film formed on the glass substrate, the gate insulating film defect, and the glass substrate Interlayer insulating film foreign matter and interlayer insulating film defects in the interlayer insulating film formed on the top were respectively detected. The numerical values in FIG. 17 and FIG. 18 indicate the individual defect rate (ratio of individuals with defective products with respect to the total number of inspected individuals) as a percentage (%).
図17に示すように、検出されたゲート絶縁膜異物及びゲート絶縁膜欠損については、本発明の適用前後で大きな減少が見られた。従って、本発明の適用により、軸受部の軸受側凹部から発生した塵や埃に起因してアレイ基板上のゲート絶縁膜にゲート絶縁膜異物やゲート絶縁膜欠損が発生することを防止ないし抑制できたことが確認できた。
As shown in FIG. 17, the detected gate insulating film foreign matter and gate insulating film defects were greatly reduced before and after the application of the present invention. Therefore, by applying the present invention, it is possible to prevent or suppress the occurrence of foreign substances or gate insulating film defects in the gate insulating film on the array substrate due to dust or dirt generated from the bearing-side concave portion of the bearing portion. I was able to confirm.
また、図18に示すように、検出された層間絶縁膜異物及び層間絶縁膜欠損については、層間絶縁膜欠損については本発明の適用前後で大きな変化は見られないものの、層間絶縁膜異物については本発明の適用前後で大きな減少が見られた。従って、本発明の適用により、軸受部の軸受側凹部から発生した塵や埃に起因してアレイ基板上の層間絶縁膜に層間絶縁膜異物が発生することを防止ないし抑制できたことが確認できた。
In addition, as shown in FIG. 18, the detected interlayer insulating film foreign matter and interlayer insulating film defect are not significantly changed before and after the application of the present invention, but the interlayer insulating film foreign object is not observed. A large decrease was observed before and after the application of the present invention. Therefore, it can be confirmed that the application of the present invention can prevent or suppress the generation of foreign substances in the interlayer insulating film on the interlayer insulating film on the array substrate due to dust or dust generated from the bearing-side recess of the bearing part. It was.
以上の結果より、アレイ基板の製造過程に用いる洗浄装置に本発明を適用することで、軸受部の軸受側凹部から発生した塵や埃に起因してアレイ基板に不良品が発生することを防止ないし抑制できることを確認することができた。
From the above results, by applying the present invention to the cleaning device used in the manufacturing process of the array substrate, it is possible to prevent defective products from being generated on the array substrate due to dust and dirt generated from the bearing side recess of the bearing portion. It was confirmed that it could be suppressed.
10:液晶表示装置、11:液晶パネル、20:カラーフィルタ基板、30:アレイ基板、30A:ガラス基板、37:ゲート絶縁膜、39:層間絶縁膜、50,250:洗浄装置、50A,250A:洗浄槽、60:搬送装置、62,162,262:搬送ローラ、62A,162A,262A:シャフト部、62A1,262A1:縮径部、62B,262B:基板支持部、64,164,262:軸受部、64A,164A:環状部、64A1,164A1,264A1:軸受側凹部、64B,164B,264B:ボール、66,67,166,266:フレーム、66A,166A,266A:本体部、66A3:供給口、66A4:排出口、66B,166B,266B:外板、66C,166C:内板、70,71,170.270:液体収容部、72,272:供給管、74,274:排出管、264A:円柱部、W1:純水
10: liquid crystal display device, 11: liquid crystal panel, 20: color filter substrate, 30: array substrate, 30A: glass substrate, 37: gate insulating film, 39: interlayer insulating film, 50, 250: cleaning device, 50A, 250A: Cleaning tank, 60: transfer device, 62, 162, 262: transfer roller, 62A, 162A, 262A: shaft portion, 62A1, 262A1: reduced diameter portion, 62B, 262B: substrate support portion, 64, 164, 262: bearing portion 64A, 164A: annular part, 64A1, 164A1, 264A1: bearing side recess, 64B, 164B, 264B: ball, 66, 67, 166, 266: frame, 66A, 166A, 266A: main body part, 66A3: supply port, 66A4: discharge port, 66B, 166B, 266B: outer plate, 66C, 166C: inner plate, 70, 71, 170 270: liquid reservoir, 72,272: supply pipe, 74,274: exhaust pipe, 264A: cylinder part, W1: pure water
Claims (7)
- 軸状に延在し、搬送部材を搬送方向に沿って搬送する搬送ローラと、
前記搬送ローラをその軸周りに回転可能に支持する軸受部と、
前記軸受部を保持する保持部材であって、液体収容部を有し、該液体収容部内に前記軸受部の摺接部位の少なくとも一部が露出するものとされた保持部材と、
を備える搬送装置。 A transport roller extending in a shaft shape and transporting the transport member along the transport direction;
A bearing that rotatably supports the transport roller around its axis;
A holding member for holding the bearing portion, the holding member having a liquid storage portion, wherein at least a part of a sliding contact portion of the bearing portion is exposed in the liquid storage portion;
A transport apparatus comprising: - 前記軸受部は、前記搬送ローラの軸周りに配された環状の環状部と、前記搬送ローラと前記環状部との間に介在し、前記環状部によって摺動可能に支持される複数のボールと、を有するボールベアリングであり、
前記摺接部位は、前記環状部のうち前記複数のボールを支持する部位である、請求項1に記載の搬送装置。 The bearing portion includes an annular annular portion disposed around an axis of the conveying roller, and a plurality of balls that are interposed between the conveying roller and the annular portion and are slidably supported by the annular portion. A ball bearing having
The conveying device according to claim 1, wherein the sliding contact portion is a portion that supports the plurality of balls in the annular portion. - 前記液体収容部は溝状に延在するものとされている、請求項1または請求項2に記載の搬送装置。 3. The transport apparatus according to claim 1, wherein the liquid storage portion extends in a groove shape.
- 前記液体収容部の延在方向の一端部に前記液体収容部内に液体を供給する液体供給部が設けられ、前記液体収容部の延在方向の他端部に前記液体収容部内を流れる液体を排出する液体排出部が設けられている、請求項3に記載の搬送装置。 A liquid supply unit that supplies liquid into the liquid storage unit is provided at one end in the extending direction of the liquid storage unit, and the liquid flowing through the liquid storage unit is discharged at the other end in the extending direction of the liquid storage unit. The transport apparatus according to claim 3, further comprising a liquid discharge unit that performs the operation.
- 前記液体収容部は、前記一端部が前記搬送方向の上流側に配されるとともに前記他端部が前記搬送方向の下流側に配された形で、前記搬送方向に沿って延在するものとされている、請求項4に記載の搬送装置。 The liquid storage portion extends along the transport direction, with the one end disposed on the upstream side in the transport direction and the other end disposed on the downstream side in the transport direction. The conveying device according to claim 4, wherein
- 前記搬送部材は基板であり、
前記搬送ローラはその延在方向が前記搬送方向と直交する形で該搬送方向に複数が並列配置され、
前記軸受部は前記搬送ローラの両端部にそれぞれ配されている、請求項1から請求項5のいずれか1項に記載の搬送装置。 The transport member is a substrate;
A plurality of the transport rollers are arranged in parallel in the transport direction so that the extending direction is orthogonal to the transport direction,
The conveying device according to any one of claims 1 to 5, wherein the bearing portions are respectively disposed at both ends of the conveying roller. - 請求項6に記載の搬送装置と、前記搬送方向に沿って搬送される前記基板にウェットプロセスを施すウェットプロセス槽と、を備えるウェットプロセス装置。 A wet process apparatus comprising: the transport apparatus according to claim 6; and a wet process tank that performs a wet process on the substrate transported along the transport direction.
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CN201580023398.3A CN106458459A (en) | 2014-05-21 | 2015-05-15 | Conveyance device, and wet processing device |
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JP2020096087A (en) * | 2018-12-13 | 2020-06-18 | 株式会社荏原製作所 | Substrate cleaning apparatus |
WO2023214508A1 (en) * | 2022-05-02 | 2023-11-09 | 日本電気硝子株式会社 | Glass article manufacturing method and manufacturing device |
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KR102008142B1 (en) * | 2019-03-04 | 2019-08-08 | (주)엠에스솔루션 | Bearing holder |
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JP4426276B2 (en) * | 2003-10-06 | 2010-03-03 | 住友重機械工業株式会社 | Conveying device, coating system, and inspection system |
JP2008082547A (en) * | 2006-08-28 | 2008-04-10 | Ntn Corp | Rolling bearing lubricating method |
CN201654457U (en) * | 2010-05-19 | 2010-11-24 | 北京京东方光电科技有限公司 | Liquid recovery device and developing apparatus |
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JPH10258934A (en) * | 1997-03-17 | 1998-09-29 | Matsushita Electric Ind Co Ltd | Glass substrate carrier device |
WO2014054590A1 (en) * | 2012-10-05 | 2014-04-10 | 旭硝子株式会社 | Roller conveyor, plate body inspecting device, and glass plate manufacturing device |
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JP2020096087A (en) * | 2018-12-13 | 2020-06-18 | 株式会社荏原製作所 | Substrate cleaning apparatus |
JP7157645B2 (en) | 2018-12-13 | 2022-10-20 | 株式会社荏原製作所 | Substrate cleaning equipment |
WO2023214508A1 (en) * | 2022-05-02 | 2023-11-09 | 日本電気硝子株式会社 | Glass article manufacturing method and manufacturing device |
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