WO2015105274A1 - Hard coating for cutting tool - Google Patents

Hard coating for cutting tool Download PDF

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WO2015105274A1
WO2015105274A1 PCT/KR2014/011415 KR2014011415W WO2015105274A1 WO 2015105274 A1 WO2015105274 A1 WO 2015105274A1 KR 2014011415 W KR2014011415 W KR 2014011415W WO 2015105274 A1 WO2015105274 A1 WO 2015105274A1
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layer
ticn
tic
hard coating
cutting tool
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PCT/KR2014/011415
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French (fr)
Korean (ko)
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이동열
안진우
김경일
염진희
조성훈
안선용
이성구
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한국야금 주식회사
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers

Definitions

  • the present invention relates to a hard film for cutting tools formed on a cutting tool based on a cemented carbide or cermet, more specifically, an MT-TiCN layer, a bonding layer, and alumina (Al 2 O 3 ) on the base material.
  • This is a hard film laminated in the order of) layer, by controlling the bonding relationship between the grain boundaries of the grains forming the MT-TiCN layer by improving the adhesion to the alumina (Al 2 O 3 ) layer located on the MT-TiCN layer.
  • the present invention relates to a hard coating which can reduce the peeling of the edge portion of the hard coating during cutting, thereby extending the life of the cutting tool.
  • the TiCN thin film which has been widely used in hard coatings for cutting tools based on cemented carbide or cermet, is formed by reacting at a high temperature of about 1000 ° C. using reaction gases such as TiCl 4 , CH 4 and N 2 . Carbon (C) diffuses from the cemented carbide base material into the TiCN thin film, and a brittle hard phase such as Co 3 W 3 C or Co 6 W 6 C is formed at the interface between the base material and the TiCN thin film, thereby reducing the toughness of the cutting tool. .
  • reaction gases such as TiCl 4 , CH 4 and N 2 .
  • Carbon (C) diffuses from the cemented carbide base material into the TiCN thin film, and a brittle hard phase such as Co 3 W 3 C or Co 6 W 6 C is formed at the interface between the base material and the TiCN thin film, thereby reducing the toughness of the cutting tool. .
  • a method of forming a TiCN layer (hereinafter referred to as an 'MT-TiCN layer') using MTCVD (hereinafter referred to as 'MTCVD') has been proposed.
  • Diffusion of carbon from the cemented carbide substrate when the TiCN thin film is formed by lowering the deposition temperature to about 750-850 ° C. using CH 3 CN as a source of TiCl 4 , carbon (C) and nitrogen (N).
  • the TiCN thin film formed after coating is characterized by having not only wear resistance but also toughness.
  • the MT-TiCN layer is commercially available in a multi-layered structure in which an oxide such as an alumina layer is formed after forming a bonding layer thereon, and is widely used in cutting tools for turning and milling.
  • US Patent No. 6,652,913 discloses a crystal grain size (particle size) of a TiCN thin film having a columnar crystal structure by doping CO gas during MTCVD TiCN thin film formation. ) Is proposed to refine the hardness to about 0.5 ⁇ m level to improve hardness.
  • the method improves the mechanical properties due to the miniaturization of the TiCN layer, but improve the wear resistance of the cutting tool, of the bonding force between the top layer of alumina (Al 2 O 3) and MT-TiCN layer away, cutting the alumina layer
  • the tool life is reduced due to partial peeling, and there is a certain limit to improving the tool life only by atomizing the MT-TiCN layer.
  • An object of the present invention in forming the MT-TiCN layer by forming a fine MT-TiCN layer to improve the mechanical properties of the MT-TiCN layer and at the same time to control the binding relationship of the grain boundary constituting the MT-TiCN layer, MT- It is to provide a hard film for cutting tools that can improve the bonding strength with the ⁇ -Al 2 O 3 layer, which is the upper layer of the TiCN layer, and improve the life of the cutting tool.
  • hard coatings for cutting tools which occupy 70% or more of the sum of ⁇ 9 type, ⁇ 11 type, ⁇ 15 type, and ⁇ 23 type grain boundary lengths.
  • x + y + z 1, x ⁇ 0, y ⁇ 0, z> 0) layers, and an ⁇ -Al 2 O 3 layer formed thereon.
  • the ⁇ -Al 2 O 3 layer may have a thickness of about 1 ⁇ m to about 15 ⁇ m.
  • the grain boundaries of the particulate MT-TiCN layer constituting the hard coating according to the present invention are controlled so that ⁇ 3 type is the main, and the grain-bound MT-TiCN layer with the grain boundaries controlled as described above not only improves mechanical properties due to grain refinement, The bonding force with the ⁇ -Al 2 O 3 layer formed thereon is improved, and the life of the cutting tool can be extended.
  • 3 is a photograph after evaluation of cutting performance of the insert with the hard film according to the embodiment.
  • the “carbide alloy” means a sintered body sintered including a WC powder and a binding metal powder such as Co and Ni, and may include other components other than the above components.
  • Ceramic means a sintered body sintered including TiCN powder and a binding metal powder such as Co, Ni, and other components other than the above components may also be included.
  • 'MT-TiCN layer' is a TiCN layer formed by using MTCVD (Moderate Temperature Chemical Vapor Deposition). When TiCN layer is formed, it is deposited temperature using CH 3 CN as a source of TiCl 4 , carbon (C) and nitrogen (N). It refers to a thin film formed by lowering to about 750 ⁇ 850 °C level.
  • MTCVD Mode Temperature Chemical Vapor Deposition
  • grain boundary' means that each of the constituent atoms consisting of Ti, C, and N at the grain boundary is determined by EBSD analysis.
  • lattice points consisting of Ti, C, and N at the grain boundary.
  • lattice points that do not share constituent atoms between the constituent atom shared lattice points as shown in FIG. 1. It means a grain boundary having the form of n constituent atomic covalent lattice points.
  • the present inventors have studied to improve the mechanical properties of the MT-TiCN layer and at the same time improve the bonding strength with the ⁇ -Al 2 O 3 layer formed on the top, applying the conventional atomization technology of the MT-TiCN layer and At the same time, when the ⁇ 3 type of grain boundary is adjusted to 70% or more of the total grain boundary, the bonding strength between the fine MT-TiCN layer and the ⁇ -Al 2 O 3 layer formed on the upper side is improved, which can extend the life of the cutting tool even more. It has been found that the present invention can be achieved.
  • the wear resistance is lowered.
  • the thickness 1-20 micrometers is preferable.
  • the thickness of the ⁇ -Al 2 O 3 layer is less than 1 ⁇ m, the wear resistance is not sufficient, and when the thickness of the ⁇ -Al 2 O 3 layer is less than 15 ⁇ m, peeling easily occurs, 1 to 15 ⁇ m is preferable.
  • the hard coating according to the present invention may be applied to a base material made of a cemented carbide, cermet, or ceramic.
  • a base material made of a cemented carbide, cermet, or ceramic In an embodiment of the present invention, an insert made of cemented carbide is used.
  • fine MT-TiCN consisting of columnar crystals is deposited on the TiN layer.
  • Conditions for forming the particulate columnar MT-TiCN layer include 0-10vol% N 2 , 7-10vol% TiCl 4 , 1-3vol% CH 3 CN, 1-3vol% HCl, 1-3vol% BCl 3 , Reaction gas consisting of the remaining H 2 was deposited at a temperature of 830 ⁇ 900 °C at a pressure of 70 mbar to form an MT-TiCN layer of about 7 ⁇ m thickness.
  • the bonding layer is composed of 75vol% H 2 , 19vol% N 2 , 3.0vol% CH 4 , 2.0vol% CO, 1.5vol% TiCl 4 Using the reaction gas at about 1000 °C deposition pressure is formed under the conditions of 100 ⁇ 150mbar, as a result of forming a TiCNO layer of about 0.5 ⁇ m thickness.
  • the deposition temperature is 1000 ⁇ 1010 °C
  • deposition pressure 50 ⁇ 75mbar process conditions about 78vol% H 2 , 3.5vol% CO 2 , 0.3vol% H 2 S
  • a reaction layer consisting of 3 to 5 vol% HCl and 2.5 vol% AlCl 3 was introduced to form an alumina layer having a columnar structure and an alpha phase with a thickness of 4 ⁇ m.
  • the hard coating according to the comparative example was prepared in the same manner as in Example, except for the composition and process conditions of MT-TiCN.
  • the formation of MT-TiCN used a method of forming a general MT-TiCN layer. Specifically, the reaction gas consisting of 10 ⁇ 40vol% N 2 , 5 ⁇ 7vol% TiCl 4 , 1 ⁇ 3vol% CH 3 CN, the remaining H 2 at a pressure of 100mbar at this time deposition temperature is 850 ⁇ 900 °C thickness 7 A ⁇ m MT-TiCN layer was formed.
  • Table 1 Psalter Percentage of the length of the ⁇ 3 type grain boundary in the sum of the lengths of ⁇ 3, ⁇ 5, ⁇ 7, ⁇ 9, ⁇ 11, ⁇ 15, and ⁇ 23 type grain boundaries.
  • the ratio of the grain size of the ⁇ 3 type grain boundary occupies more than 70%
  • the comparative example In the MT-TiCN layer of the hard coating the ratio of the grain length of the ⁇ 3 type grains to the total sum was less than 50%.
  • the MT-TiCN layer according to the embodiment of the present invention can improve the bonding strength with the ⁇ -Al 2 O 3 layer formed on the upper side, by the improved bonding strength, the hard film according to the present invention is conventional The life of the cutting tool can be extended compared to the film.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The present invention relates to a hard coating in which an MT-TiCN layer, a binding layer, and an alumina (Al2O3) layer are sequentially laminated on a base material, wherein the hard coating can improve mechanical properties of the MT-TiCN layer and enhance the adhesion with the alumina (Al2O3) layer positioned above the MT-TiCN layer by controlling the microstructure of the MT-TiCN layer, and thus, the hard coating formed on a surface of the cutting tool can increase the lifespan of the cutting tool and reduce the delamination of an edge portion of the cutting tool. The hard coating according to the present invention is formed on a base material made of cemented carbide or cermet, and has a multilayer structure including a TiCxNy (x+y=1, x>0, y>0) layer with a thickness of 1 to 20 μm, wherein, in the TiCxNy (x+y=1, x>0, y>0) layer measured by EBSD, the length of Σ3 grain boundaries accounts for 70% or more of a sum of the lengths of Σ3, Σ5, Σ7, Σ9, Σ11, Σ15, and Σ23 grain boundaries.

Description

절삭공구용 경질 피막Hard Film for Cutting Tools
본 발명은 초경합금 또는 써멧(cermet)를 모재로 한 절삭공구 상에 형성되는 절삭공구용 경질 피막에 관한 것으로, 보다 상세하게는 상기 모재 상에 MT-TiCN층, 결합층, 알루미나(Al2O3)층의 순으로 적층 형성한 경질 피막으로, MT-TiCN층을 구성하는 결정립의 결정립계의 결합관계를 제어하여 MT-TiCN층의 상부에 위치한 알루미나(Al2O3)층과의 밀착도를 향상시킴으로써, 절삭 가공 시 경질 피막의 인선부의 박리를 감소시킬 수 있어 절삭공구의 수명을 연장시킬 수 있는 경질 피막에 관한 것이다.The present invention relates to a hard film for cutting tools formed on a cutting tool based on a cemented carbide or cermet, more specifically, an MT-TiCN layer, a bonding layer, and alumina (Al 2 O 3 ) on the base material. This is a hard film laminated in the order of) layer, by controlling the bonding relationship between the grain boundaries of the grains forming the MT-TiCN layer by improving the adhesion to the alumina (Al 2 O 3 ) layer located on the MT-TiCN layer. In addition, the present invention relates to a hard coating which can reduce the peeling of the edge portion of the hard coating during cutting, thereby extending the life of the cutting tool.
초경합금 또는 써멧을 모재로 하는 절삭공구용 경질 피막에 널리 사용되어 온 TiCN 박막은 TiCl4, CH4 및 N2와 같은 반응가스들을 이용하여 약 1000℃ 정도의 고온에서 반응시켜 형성하는데, 이 과정에서 초경합금 모재로부터 탄소(C)가 TiCN 박막으로 확산하여 모재와 TiCN 박막의 계면에 Co3W3C 또는 Co6W6C 등과 같은 취성이 강한 경질상이 형성되어 절삭공구의 인성을 저하시키는 문제점이 있었다.The TiCN thin film, which has been widely used in hard coatings for cutting tools based on cemented carbide or cermet, is formed by reacting at a high temperature of about 1000 ° C. using reaction gases such as TiCl 4 , CH 4 and N 2 . Carbon (C) diffuses from the cemented carbide base material into the TiCN thin film, and a brittle hard phase such as Co 3 W 3 C or Co 6 W 6 C is formed at the interface between the base material and the TiCN thin film, thereby reducing the toughness of the cutting tool. .
이러한 문제점을 해결하기 위해서 MTCVD(Moderate Temperature Chemical Vapor Deposition, 이하 'MTCVD'라 함)를 이용한 TiCN층(이하, 'MT-TiCN층'이라 함)의 형성 방법이 제안되었는데, 이 방법은 TiCN 형성 시, TiCl4와 탄소(C), 질소(N)의 소스로 CH3CN을 사용하여 증착 온도를 약 750~850℃ 수준으로 낮춤으로써 TiCN 박막을 형성할 때, 초경합금 모재로부터 탄소(C)가 확산되는 것을 억제하여 취성이 강한 Co3W3C 또는 Co6W6C 과 같은 경질상이 생성되는 것을 억제함으로써, 코팅 후 형성된 TiCN 박막이 내마모성뿐만 아니라 인성을 갖도록 한데 특징이 있다.In order to solve this problem, a method of forming a TiCN layer (hereinafter referred to as an 'MT-TiCN layer') using MTCVD (hereinafter referred to as 'MTCVD') has been proposed. Diffusion of carbon from the cemented carbide substrate when the TiCN thin film is formed by lowering the deposition temperature to about 750-850 ° C. using CH 3 CN as a source of TiCl 4 , carbon (C) and nitrogen (N). By suppressing the formation of hard phases such as Co 3 W 3 C or Co 6 W 6 C, which are brittle, the TiCN thin film formed after coating is characterized by having not only wear resistance but also toughness.
이러한 MT-TiCN층은 그 위에 결합층을 형성한 후 알루미나층과 같은 산화물을 형성한 다층구조로 상용화되어 최근 선삭 및 밀링용 절삭공구에 보편적으로 사용되고 있다.The MT-TiCN layer is commercially available in a multi-layered structure in which an oxide such as an alumina layer is formed after forming a bonding layer thereon, and is widely used in cutting tools for turning and milling.
한편, 절삭 가공 중에는 절삭공구(인서트)와 가공물 간의 마찰로 인하여 박막의 마모와 함께 열이 발생하는데, 모재로부터 MT-TiCN층, 결합층, 알루미나 (Al2O3)층과 같은 순서의 적층 구조를 갖는 다층박막에서 최상층인 알루미나(Al2O3)가 절삭 가공을 통해 완전히 마모된 후에는 MT-TiCN층의 내마모성이 떨어져 쉽게 마모되어 공구수명이 짧은 문제점이 있다.On the other hand, during cutting, heat is generated along with wear of the thin film due to friction between the cutting tool (insert) and the workpiece, and the laminated structure in the same order as the MT-TiCN layer, the bonding layer, and the alumina (Al 2 O 3 ) layer from the base material. After the alumina (Al 2 O 3 ), which is the uppermost layer in the multilayer thin film having abrasion, is completely worn through the cutting process, the wear resistance of the MT-TiCN layer is poor, so that the tool life is short.
이와 같은 문제점을 해결하기 위해서 많은 연구들이 진행되어왔으며, 그 일례로, 미국 등록특허 공보 제6,652,913호에는 CO 가스를 MTCVD TiCN 박막 형성 중에 도핑 함으로써 주상정의 결정구조를 갖는 TiCN 박막의 결정 입자 크기(입경)를 약 0.5㎛ 수준으로 미세화하여 경도를 향상시키는 방법이 제시되어 있다.Many studies have been conducted to solve this problem. For example, US Patent No. 6,652,913 discloses a crystal grain size (particle size) of a TiCN thin film having a columnar crystal structure by doping CO gas during MTCVD TiCN thin film formation. ) Is proposed to refine the hardness to about 0.5 μm level to improve hardness.
이 방법에 의하면, TiCN층의 미세화로 인해 기계적 특성이 향상되어, 절삭공구의 내마모성이 향상되나, 최상층인 알루미나(Al2O3)와 MT-TiCN층 간의 결합력이 떨어져, 절삭가공 중 알루미나층이 부분적으로 박리되어 공구수명이 저하하는 문제점이 있어서, 상기한 MT-TiCN층의 미립화만으로는 공구수명을 향상시키는데 일정한 한계가 있다.According to the method, it improves the mechanical properties due to the miniaturization of the TiCN layer, but improve the wear resistance of the cutting tool, of the bonding force between the top layer of alumina (Al 2 O 3) and MT-TiCN layer away, cutting the alumina layer There is a problem in that the tool life is reduced due to partial peeling, and there is a certain limit to improving the tool life only by atomizing the MT-TiCN layer.
본 발명의 과제는 MT-TiCN층을 형성함에 있어서, 미립 MT-TiCN층을 형성하여 MT-TiCN층의 기계적 특성을 높이면서 동시에 MT-TiCN층을 구성하는 결정립계의 결합관계를 조절함으로써, MT-TiCN층의 상부층인 α-Al2O3층과의 결합력을 향상시켜, 절삭공구의 수명을 개선할 수 있는 절삭공구용 경질피막을 제공하는 것이다.An object of the present invention in forming the MT-TiCN layer, by forming a fine MT-TiCN layer to improve the mechanical properties of the MT-TiCN layer and at the same time to control the binding relationship of the grain boundary constituting the MT-TiCN layer, MT- It is to provide a hard film for cutting tools that can improve the bonding strength with the α-Al 2 O 3 layer, which is the upper layer of the TiCN layer, and improve the life of the cutting tool.
상기 과제를 해결하기 위해 본 발명은, 초경합금 또는 써멧의 모재에 형성되며, 두께 1~20㎛의 MT-TiCxNy(x+y=1,x>0,y>0)층을 포함하는 다층 구조로 이루어지고, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층은 EBSD로 측정한 Σ3 타입의 결정립계의 길이가 Σ3 타입, Σ5 타입, Σ7 타입, Σ9 타입, Σ11 타입, Σ15 타입 및 Σ23 타입 결정립계 길이의 합에서 70% 이상을 차지하는 절삭공구용 경질 피막을 제공한다.In order to solve the above problems, the present invention is formed on a base material of cemented carbide or cermet, and includes a layer of MT-TiC x N y (x + y = 1, x> 0, y> 0) having a thickness of 1 to 20 µm. The multilayer structure, wherein the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer has a length of Σ 3 type grain boundary measured by EBSD, Σ 3 type, Σ 5 type, Σ 7 type, Provided are hard coatings for cutting tools, which occupy 70% or more of the sum of Σ9 type, Σ11 type, Σ15 type, and Σ23 type grain boundary lengths.
바람직하게, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 결정립경은 1㎛ 이하, 보다 바람직하게 0.7㎛ 이하일 수 있다.Preferably, the grain size of the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer may be 1 μm or less, more preferably 0.7 μm or less.
또한, 상기 경질 피막은, 최내측에 형성되며 등축정 구조를 가지고 0.5~2㎛의 두께를 가지는 TiCxNyOz(x+y+z=1,x≥0,y≥0,z≥0)층과, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층 상부에 형성되며 1.5㎛ 이하의 두께를 가지는 Ti(Al)CxNyOz(x+y+z=1,x≥0,y≥0,z>0)층과, 그 상부에 형성되는 α-Al2O3 층을 포함할 수 있다.In addition, the hard film is formed on the innermost side and has an equiaxed crystal structure and has a thickness of 0.5 ~ 2㎛ TiC x N y O z (x + y + z = 1, x ≥ 0, y ≥ 0, z ≥ 0) layer and Ti (Al) C x N y O z (formed on the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer and having a thickness of 1.5 μm or less). x + y + z = 1, x ≧ 0, y ≧ 0, z> 0) layers, and an α-Al 2 O 3 layer formed thereon.
상기 α-Al2O3 층의 두께는 1~15㎛일 수 있다.The α-Al 2 O 3 layer may have a thickness of about 1 μm to about 15 μm.
본 발명에 따른 경질 피막을 구성하는 미립 MT-TiCN층의 결정립계는 Σ3 타입이 주를 이루도록 제어되어 있고, 이와 같이 결정립계가 제어된 미립 MT-TiCN층은 결정립 미세화로 인한 기계적 특성의 향상은 물론, 그 상부에 형성되는 α-Al2O3층과의 결합력이 향상되어, 절삭공구의 수명을 연장시킬 수 있다.The grain boundaries of the particulate MT-TiCN layer constituting the hard coating according to the present invention are controlled so that Σ3 type is the main, and the grain-bound MT-TiCN layer with the grain boundaries controlled as described above not only improves mechanical properties due to grain refinement, The bonding force with the α-Al 2 O 3 layer formed thereon is improved, and the life of the cutting tool can be extended.
도 1은 EBSD 분석에 의한 결정립계 타입을 설명하기 위한 도면이다.BRIEF DESCRIPTION OF THE DRAWINGS It is a figure for demonstrating the grain boundary type by EBSD analysis.
도 2는 비교예에 따른 경질 피막이 형성된 인써트의 절삭 성능 평가 후의 사진이다.2 is a photograph after evaluation of cutting performance of the insert with the hard film according to the comparative example.
도 3은 실시예에 따른 경질 피막이 형성된 인써트의 절삭 성능 평가 후의 사진이다.3 is a photograph after evaluation of cutting performance of the insert with the hard film according to the embodiment.
이하, 첨부 도면을 참조하여 본 발명의 바람직한 실시예들을 상세히 설명한다. 그러나 다음에 예시하는 본 발명의 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 다음에 상술하는 실시예들에 한정되는 것은 아니다. 본 발명의 실시예들은 당 업계에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위하여 제공되어지는 것이다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, embodiments of the present invention illustrated in the following may be modified in many different forms, the scope of the present invention is not limited to the embodiments described in the following. Embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art.
이하의 설명에서 하기의 용어들은 다음과 같이 정의된다.In the following description, the following terms are defined as follows.
'초경 합금'이란, WC 분말과 Co, Ni과 같은 결합성 금속 분말을 포함하여 소결한 소결체를 의미하며, 상기 성분 외의 다른 성분도 포함될 수 있다.The “carbide alloy” means a sintered body sintered including a WC powder and a binding metal powder such as Co and Ni, and may include other components other than the above components.
'써멧(cermet)'이란, TiCN 분말과 Co, Ni과 같은 결합성 금속 분말을 포함하여 소결한 소결체를 의미하며, 상기 성분 외의 다른 성분도 포함될 수 있다."Cermet" means a sintered body sintered including TiCN powder and a binding metal powder such as Co, Ni, and other components other than the above components may also be included.
'MT-TiCN층'은 MTCVD(Moderate Temperature Chemical Vapor Deposition)를 이용하여 형성된 TiCN층으로 TiCN층 형성 시, TiCl4와 탄소(C), 질소(N)의 소스로 CH3CN을 사용하여 증착 온도를 약 750~850℃ 수준으로 낮추어 형성한 박막을 의미한다.'MT-TiCN layer' is a TiCN layer formed by using MTCVD (Moderate Temperature Chemical Vapor Deposition). When TiCN layer is formed, it is deposited temperature using CH 3 CN as a source of TiCl 4 , carbon (C) and nitrogen (N). It refers to a thin film formed by lowering to about 750 ~ 850 ℃ level.
'Σn+1 타입(여기서, n=2,4,6,8,10,14,22임) 결정립계'란, EBSD 분석을 통해, 결정립 계면에서 Ti, C, N으로 이루어진 구성 원자의 각각이 상기 결정립 상호간에 하나의 구성 원자를 공유하는 격자점(구성 원자 공유 격자점)의 분포를 산출할 때, 도 1에 도시된 바와 같이, 상기 구성 원자 공유 격자점 사이에 구성 원자를 공유하지 않는 격자점이 n개 존재하는 구성 원자 공유 격자점 형태를 갖는 결정립계를 의미한다.'Σn + 1 type (where n = 2,4,6,8,10,14,22) grain boundary' means that each of the constituent atoms consisting of Ti, C, and N at the grain boundary is determined by EBSD analysis. When calculating the distribution of lattice points (constituent atom shared lattice points) that share one constituent atom between grains, as shown in FIG. 1, lattice points that do not share constituent atoms between the constituent atom shared lattice points, as shown in FIG. 1. It means a grain boundary having the form of n constituent atomic covalent lattice points.
본 발명자들은 MT-TiCN층의 기계적 특성을 향상시킴과 동시에 상부에 형성되는 α-Al2O3층과의 접합력을 향상시키기 위해 연구한 결과, 종래의 MT-TiCN층의 미립화 기술을 적용함과 동시에 결정립계 중 Σ3 타입이 전체 결정립계에서 70% 이상이 되도록 조절할 경우, 미립 MT-TiCN층과 상부에 형성되는 α-Al2O3층과의 접합력이 향상되어, 절삭공구의 수명을 보다 더 연장할 수 있음을 밝혀내고 본 발명에 이르게 되었다.The present inventors have studied to improve the mechanical properties of the MT-TiCN layer and at the same time improve the bonding strength with the α-Al 2 O 3 layer formed on the top, applying the conventional atomization technology of the MT-TiCN layer and At the same time, when the Σ3 type of grain boundary is adjusted to 70% or more of the total grain boundary, the bonding strength between the fine MT-TiCN layer and the α-Al 2 O 3 layer formed on the upper side is improved, which can extend the life of the cutting tool even more. It has been found that the present invention can be achieved.
본 발명에 따른 경질 피막은, 초경합금 또는 써멧(cermet)으로 이루어진 모재 상에 형성되며, 상기 경질 피막은 두께 1~20㎛의 MT-TiCxNy(x+y=1,x>0,y>0)층을 포함하는 다층 구조로 이루어지고, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층은 EBSD로 측정한 Σ3 타입의 결정립계의 길이가 Σ3, Σ5, Σ7, Σ9, Σ11, Σ15 및 Σ23 타입 결정립계 길이의 합에서 70% 이상을 차지하는 것을 특징으로 한다.The hard film according to the present invention is formed on a base material made of cemented carbide or cermet, and the hard film is MT-TiC x N y (x + y = 1, x> 0, y having a thickness of 1 to 20 μm. > 0) layer, wherein the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer has a length of? 3 type grain boundary measured by EBSD. It is characterized by occupying 70% or more of the sum of Σ5, Σ7, Σ9, Σ11, Σ15 and Σ23 type grain boundary lengths.
상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 두께가 1㎛ 미만일 경우 내마모 특성이 저하되고, 20㎛ 초과일 경우 쉽게 박막의 박리가 발생하기 때문에, 그 두께는 1~20㎛가 바람직하다.When the thickness of the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer is less than 1 μm, the wear resistance is lowered. As for the thickness, 1-20 micrometers is preferable.
또한, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층은 주상정(columnar) 구조로 이루어지고, 평균입경은 1㎛ 이하, 보다 바람직하게는 0.8㎛ 이하인 것이 바람직하다.In addition, the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer has a columnar structure, and the average particle diameter is 1 μm or less, more preferably 0.8 μm or less. It is preferable.
상기 MT-TiCxNy(x+y=1,x>0,y>0)층과 모재 사이에는 등축정 구조를 가지며 0.5~2㎛의 두께를 가지는 TiCxNyOz(x+y+z=1,x≥0,y≥0,z≥0)층이 형성될 수 있으며, 상기 TiCxNyOz층의 두께가 0.5㎛ 미만일 경우 모재 계면의 탈탄에 의한 박막 밀착도가 저하되고, 2㎛ 초과일 경우 전체 박막에서 차지하는 비율이 증가하여 내마모 특성이 저하하기 때문에 0.5~2㎛가 바람직하다.TiC x N y O z (x + y) having an equiaxed crystal structure and a thickness of 0.5 to 2 μm between the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer and the base material + z = 1, x≥0, y≥0, z≥0) layer can be formed, when the thickness of the TiC x N y O z layer is less than 0.5㎛ thin film adhesion due to decarburization of the base material interface is reduced In the case of more than 2 µm, 0.5 to 2 µm is preferable because the proportion of the entire thin film increases and the wear resistance decreases.
상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 상부에는 알루미나층을 형성하기 위하여 1.5㎛ 이하의 두께를 가지는 Ti(Al)CxNyOz (x+y+z=1,x≥0,y≥0,z>0)층이 형성될 수 있다.In order to form an alumina layer on the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer, Ti (Al) C x N y O z ( x + y + z = 1, x ≧ 0, y ≧ 0, z> 0) layers may be formed.
상기 Ti(Al)CxNyOz (x+y+z=1,x≥0,y≥0,z>0)층의 상부에는 내마모층인 α-Al2O3층이 형성될 수 있으며, 상기 α-Al2O3층의 두께는 1㎛ 미만일 경우 내마모 특성이 충분하지 않고, 15㎛ 초과일 경우 박리가 쉽게 발생하므로, 1~15㎛가 바람직하다.An α-Al 2 O 3 layer, which is a wear resistant layer, is formed on the Ti (Al) C x N y O z (x + y + z = 1, x≥0, y≥0, z> 0) layer. When the thickness of the α-Al 2 O 3 layer is less than 1 μm, the wear resistance is not sufficient, and when the thickness of the α-Al 2 O 3 layer is less than 15 μm, peeling easily occurs, 1 to 15 μm is preferable.
이하에서는 바람직한 실시예를 통하여 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail with reference to preferred embodiments.
[실시예]EXAMPLE
본 발명에 따른 경질 피막은, 초경 합금, 서멧(cermet) 또는 세라믹 등으로 이루어진 모재에 적용될 수 있는데, 본 발명의 실시예에서는 초경합금으로 제조된 인써트를 사용하였다.The hard coating according to the present invention may be applied to a base material made of a cemented carbide, cermet, or ceramic. In an embodiment of the present invention, an insert made of cemented carbide is used.
본 발명의 실시예에서는 먼저, 초경합금으로 이루어진 모재 표면에 LPCVD법을 사용하여, 증착온도 900℃, 증착압력 100~200mbar의 공정조건에서, 약 60~70vol% H2, 10~20vol% N2, 0~5vol% CH4, 5~15vol% TiCl4 조건으로 최내측에 등축정(equiaxed) 구조로 이루어지며 0.5~3㎛의 두께를 가지는 TiN층을 형성하였다.In the embodiment of the present invention, first, using the LPCVD method on the surface of the base material made of cemented carbide, at a process temperature of 900 ℃, deposition pressure 100 ~ 200 mbar, about 60 ~ 70vol% H 2 , 10 ~ 20vol% N 2 , A TiN layer having a thickness of 0.5 to 3 μm was formed in an innermost equiaxed structure under the condition of 0 to 5 vol% CH 4 and 5 to 15 vol% TiCl 4 .
다음으로, 상기 TiN층 상에 주상정으로 이루어진 미립 MT-TiCN을 증착시킨다. 미립 주상정 MT-TiCN층을 형성하기 위한 조건으로는, 0~10vol% N2, 7~10vol% TiCl4, 1~3vol% CH3CN, 1~3vol% HCl, 1~3vol% BCl3, 나머지 H2 로 이루어진 반응가스를 70mbar의 압력으로 830~900℃ 온도 조건에서 증착하여 두께 약 7㎛의 MT-TiCN층을 형성하였다.Next, fine MT-TiCN consisting of columnar crystals is deposited on the TiN layer. Conditions for forming the particulate columnar MT-TiCN layer include 0-10vol% N 2 , 7-10vol% TiCl 4 , 1-3vol% CH 3 CN, 1-3vol% HCl, 1-3vol% BCl 3 , Reaction gas consisting of the remaining H 2 was deposited at a temperature of 830 ~ 900 ℃ at a pressure of 70 mbar to form an MT-TiCN layer of about 7㎛ thickness.
상기 MT-TiCN층 상에는 알루미나층을 형성하기 위한 결합층을 형성하는데, 상기 결합층은 75vol% H2, 19vol% N2, 3.0vol% CH4, 2.0vol% CO, 1.5vol% TiCl4 로 이루어진 반응가스를 사용하여 약 1000℃에서 증착압력은 100~150mbar의 조건으로 형성하며, 그 결과 두께 약 0.5㎛의 TiCNO층이 형성되었다.On the MT-TiCN layer to form a bonding layer for forming an alumina layer, the bonding layer is composed of 75vol% H 2 , 19vol% N 2 , 3.0vol% CH 4 , 2.0vol% CO, 1.5vol% TiCl 4 Using the reaction gas at about 1000 ℃ deposition pressure is formed under the conditions of 100 ~ 150mbar, as a result of forming a TiCNO layer of about 0.5㎛ thickness.
상기 TiCNO층 상에는 알파-알루미나층을 형성하는데, 이때 증착온도는 1000~1010℃, 증착압력 50~75mbar의 공정조건에서, 약 78vol% H2, 3.5vol% CO2, 0.3vol% H2S, 3~5vol% HCl, 2.5vol% AlCl3 로 이루어진 반응가스를 유입하여 주상정 조직과 알파상을 가지는 알루미나층을 4㎛ 두께로 형성하였다.On the TiCNO layer to form an alpha-alumina layer, the deposition temperature is 1000 ~ 1010 ℃, deposition pressure 50 ~ 75mbar process conditions, about 78vol% H 2 , 3.5vol% CO 2 , 0.3vol% H 2 S, A reaction layer consisting of 3 to 5 vol% HCl and 2.5 vol% AlCl 3 was introduced to form an alumina layer having a columnar structure and an alpha phase with a thickness of 4 μm.
그리고 그 상부에 인써트 마모정도를 육안으로 쉽게 확인하기 위해, 증착온도 900~1000℃, 증착압력 100~600mbar의 공정조건에서, 약 60~70vol% H2, 20~35vol% N2, 0~5vol% CH4, 6~10vol% TiCl4 조건으로 1㎛ 이하의 TiN층을 형성하였다.And in order to easily check the wear of the insert on the upper part, in the process conditions of the deposition temperature 900 ~ 1000 ℃, deposition pressure 100 ~ 600mbar, about 60 ~ 70vol% H 2 , 20 ~ 35vol% N 2 , 0 ~ 5vol TiN layer of 1 μm or less was formed under% CH 4 , 6˜10 vol% TiCl 4 .
[비교예][Comparative Example]
비교예에 따른 경질 피막은 MT-TiCN의 조성 및 공정 조건을 제외하고는, 실시예와 동일한 방법으로 제조되었다. MT-TiCN의 형성은 일반적인 MT-TiCN층을 형성하는 방법을 사용하였다. 구체적으로, 10~40vol% N2, 5~7vol% TiCl4, 1~3vol% CH3CN, 나머지 H2로 이루어진 반응가스를 100mbar의 압력으로 이때 증착 온도는 850~900℃로 하여 두께 약 7㎛의 MT-TiCN층을 형성하였다.The hard coating according to the comparative example was prepared in the same manner as in Example, except for the composition and process conditions of MT-TiCN. The formation of MT-TiCN used a method of forming a general MT-TiCN layer. Specifically, the reaction gas consisting of 10 ~ 40vol% N 2 , 5 ~ 7vol% TiCl 4 , 1 ~ 3vol% CH 3 CN, the remaining H 2 at a pressure of 100mbar at this time deposition temperature is 850 ~ 900 ℃ thickness 7 A μm MT-TiCN layer was formed.
MT-TiCN층의 미세조직Microstructure of MT-TiCN Layer
본 발명의 실시예 및 비교예에 따라 제조된 경질피막은 MT-TiCN층을 제외하고는 동일하게 형성되었으므로, EBSD 분석을 통해 MT-TiCN층을 구성하는 결정립계의 종류를 분석하였으며, 그 결과는 하기 표 1과 같았다.Since the hard coatings prepared according to the Examples and Comparative Examples of the present invention were formed in the same manner except for the MT-TiCN layer, the types of grain boundaries constituting the MT-TiCN layer were analyzed by EBSD analysis. It was as Table 1.
표 1
시편 Σ3, Σ5, Σ7, Σ9, Σ11, Σ15 및 Σ23 타입 결정립계 길이의 합에서 Σ3 타입의 결정립계의 길이가 차지하는 비율 (%)
실시예 72
비교예 38
Table 1
Psalter Percentage of the length of the Σ3 type grain boundary in the sum of the lengths of Σ3, Σ5, Σ7, Σ9, Σ11, Σ15, and Σ23 type grain boundaries.
Example 72
Comparative example 38
상기 표 1에서 확인되는 바와 같이, 본 발명의 실시예에 따른 경질 피막의 MT-TiCN층의 경우, Σ3 타입의 결정립계의 길이가 전체 길이의 합에서 차지하는 비율이 70%를 상회하는데 비해, 비교예에 따른 경질 피막의 MT-TiCN층은 Σ3 타입의 결정립계의 길이가 전체 길이의 합에서 차지하는 비율이 50% 미만으로 나타났다.As shown in Table 1, in the case of the MT-TiCN layer of the hard film according to the embodiment of the present invention, the ratio of the grain size of the Σ3 type grain boundary occupies more than 70%, the comparative example In the MT-TiCN layer of the hard coating, the ratio of the grain length of the Σ3 type grains to the total sum was less than 50%.
경질피막의 절삭성능 평가Evaluation of Cutting Performance of Hard Films
이상과 같은 MT-TiCN층의 결정립계의 종류가 경질 피막의 절삭성능에 미치는 영향을 확인하기 위하여, 아래와 같은 절삭시험을 수행하였다.In order to confirm the effect of the type of grain boundary of the MT-TiCN layer as described above on the cutting performance of the hard film, the following cutting test was performed.
- 피삭재: SCM440 (합금강)Workpiece: SCM440 (alloy steel)
- 절삭속도: 280m/minCutting speed: 280m / min
- 이송(공급): 0.25 mm/revFeed (feed): 0.25 mm / rev
- 절삭깊이: 2.0 mm-Depth of cut: 2.0 mm
- 절삭 인서트 형상: CNMG120408-VMCutting insert geometry: CNMG120408-VM
- 평가방법: 상기 조건에서 6분간 절삭을 실시 한 후 인선부의 박리 여부를 평가-Evaluation method: After cutting for 6 minutes under the above conditions, evaluating whether the edge portion peeled
도 2 및 도 3은 각각 비교예에 따른 경질 피막과 실시예에 따른 경질 피막을 형성하여 절삭시험을 수행한 결과를 나타낸 사진이다.2 and 3 are photographs showing the results of the cutting test by forming the hard film according to the comparative example and the hard film according to the embodiment, respectively.
도 2에 보이는 바와 같이, 기존의 MT-TiCN층을 구비한 경질 피막의 경우, 6분 가공 후 인선 상면의 박막 일부가 박리되는 현상을 나타내었다. 이에 비해, 도 3에 보이는 바와 같이, 본 발명의 실시예에 따른 MT-TiCN층을 구비한 경질 피막의 경우, 6분 가공을 한 후에도 인선 상면에 박막이 박리되는 현상이 전혀 관찰되지 않았다.As shown in FIG. 2, in the case of the hard film having the existing MT-TiCN layer, a part of the thin film on the upper surface of the edge line was peeled off after 6 minutes of processing. On the other hand, as shown in FIG. 3, in the case of the hard film having the MT-TiCN layer according to the embodiment of the present invention, no phenomenon of peeling the thin film on the upper surface of the edge line was observed even after 6 minutes of processing.
즉, 본 발명의 실시예에 따른 MT-TiCN층은 상부에 형성되는 α-Al2O3 층과의 결합력을 향상시킬 수 있으며, 이와 같이 향상된 결합력에 의해, 본 발명에 따른 경질 피막은 종래의 피막에 비해 절삭공구의 수명을 연장할 수 있게 된다.That is, the MT-TiCN layer according to the embodiment of the present invention can improve the bonding strength with the α-Al 2 O 3 layer formed on the upper side, by the improved bonding strength, the hard film according to the present invention is conventional The life of the cutting tool can be extended compared to the film.

Claims (4)

  1. 초경합금 또는 써멧(cermet)으로 이루어진 모재 상에 형성되는 경질 피막으로,Hard coating formed on the base material consisting of cemented carbide or cermet,
    상기 경질 피막은 두께 1~20㎛의 MT-TiCxNy(x+y=1,x>0,y>0)층을 포함하는 다층 구조로 이루어지고, The hard film is made of a multi-layered structure including a layer of MT-TiC x N y (x + y = 1, x> 0, y> 0) having a thickness of 1 ~ 20㎛,
    상기 MT-TiCxNy(x+y=1,x>0,y>0)층은 EBSD로 측정한 Σ3 타입의 결정립계의 길이가 Σ3, Σ5, Σ7, Σ9, Σ11, Σ15 및 Σ23 타입 결정립계 길이의 합에서 70% 이상을 차지하는 절삭공구용 경질 피막.The MT-TiC x N y (x + y = 1, x> 0, y> 0) layer has a length of Σ3 type grain boundaries measured by EBSD of Σ3, Σ5, Σ7, Σ9, Σ11, Σ15 and Σ23 type grain boundaries. Hard coating for cutting tools, which accounts for more than 70% of the total length.
  2. 제1항에 있어서,The method of claim 1,
    상기 경질 피막은, 상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 하부에 형성되며 등축정 구조를 가지고 0.5~2㎛의 두께를 가지는 TiCxNyOz(x+y+z=1,x≥0,y≥0,z≥0)층과,The hard coating, the MT-TiC x N y (x + y = 1, x> 0, y> 0) is formed on the lower layer of TiC x N y has a thickness of 0.5 ~ 2㎛ it has a polygonal normal structure O z (x + y + z = 1, x≥0, y≥0, z≥0) layer,
    상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 상부에 형성되며 1.5㎛ 이하의 두께를 가지는 Ti(Al)CxNyOz(x+y+z=1,x≥0,y≥0,z>0)층과,Ti (Al) C x N y O z (x + y +) formed on top of the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer and having a thickness of 1.5 μm or less z = 1, x≥0, y≥0, z> 0) layer,
    상기 Ti(Al)CxNyOz(x+y+z=1,x≥0,y≥0,z>0)층의 상부에 형성되는 α-Al2O3층을 구비하는 것을 특징으로 하는 절삭공구용 피막.And an α-Al 2 O 3 layer formed on top of the Ti (Al) C x N y O z (x + y + z = 1, x ≧ 0, y ≧ 0, z> 0) layer. Cutting tool film.
  3. 제2항에 있어서,The method of claim 2,
    상기 α-Al2O3층은 주상정 구조를 가지고 그 두께는 1~15㎛인 것을 특징으로 하는 절삭공구용 피막.The α-Al 2 O 3 layer has a columnar top structure, the thickness of the cutting tool film, characterized in that 1 to 15㎛.
  4. 제1항에 있어서,The method of claim 1,
    상기 MT-TiCxNy(x+y=1,x>0,y>0)층의 결정립경은 1㎛ 이하인 것을 특징으로 하는 절삭공구용 피막.The grain size of the cutting tool, characterized in that the grain size of the MT-TiC x N y (x + y = 1, x> 0, y> 0) layer is 1㎛ or less.
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