WO2015076626A1 - Novolac resin, curing agent containing same, and epoxy resin composition, and novolac epoxy resin, preparation method therefor, and epoxy resin composition containing novolac epoxy resin - Google Patents

Novolac resin, curing agent containing same, and epoxy resin composition, and novolac epoxy resin, preparation method therefor, and epoxy resin composition containing novolac epoxy resin Download PDF

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WO2015076626A1
WO2015076626A1 PCT/KR2014/011291 KR2014011291W WO2015076626A1 WO 2015076626 A1 WO2015076626 A1 WO 2015076626A1 KR 2014011291 W KR2014011291 W KR 2014011291W WO 2015076626 A1 WO2015076626 A1 WO 2015076626A1
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epoxy resin
formula
novolak
resin
novolac
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PCT/KR2014/011291
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French (fr)
Korean (ko)
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강현수
이상민
소영수
성상엽
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코오롱인더스트리 주식회사
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Priority claimed from KR1020130143066A external-priority patent/KR101399258B1/en
Priority claimed from KR1020130143056A external-priority patent/KR101472221B1/en
Application filed by 코오롱인더스트리 주식회사 filed Critical 코오롱인더스트리 주식회사
Publication of WO2015076626A1 publication Critical patent/WO2015076626A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28Chemically modified polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols

Definitions

  • the present invention relates to a novolak resin, a curing agent and an epoxy resin composition comprising the same, and more particularly, a novolak resin having a low viscosity while having excellent hygroscopic resistance and high thermal stability at high temperature, a novolak curing agent comprising the same And an epoxy resin composition.
  • the present invention relates to a novolak epoxy resin, a method for producing the same and an epoxy resin composition comprising a novolak epoxy resin, and more particularly, a furnace having a low viscosity and a high thermal stability and high moisture absorption resistance at high temperatures.
  • the present invention relates to a epoxy resin composition comprising a novolak epoxy resin, a method for producing the same, and the novolak epoxy resin.
  • Copper clad laminates (CCL) used for printed circuit boards are made by attaching copper foil to one or both sides of laminated insulating plates composed of various insulating materials and binders. As a result, requirements such as lead-free have been increased, and accordingly, the demand for copper-clad laminates requiring an insulating material having high glass transition temperature characteristics has recently increased considerably.
  • the novolak resin which is conventionally applied as a curing agent, contains a large amount of oligomer product having low polymerization degree in the polymerization process.
  • the component in which two monomers were polymerized has few reactors, and it reduces the hardening density of a final hardened
  • the curing is excessively accelerated, the surface is hardened before the solvent is sufficiently volatilized in the prepreg manufacturing process, so that a large amount of the solvent remains in the prepreg. The glass transition temperature is greatly reduced.
  • the main object of the present invention is to provide a novolak resin having low viscosity and remarkably improved high thermal stability and hygroscopic resistance at a high temperature of 280 ° C. or higher, and a method for producing the same.
  • the present invention also provides a novolak curing agent comprising a low viscosity novolak resin having excellent hygroscopic resistance and high thermal stability at high temperatures.
  • the present invention also provides an epoxy resin composition and a cured product of the epoxy resin composition capable of simultaneously improving hygroscopic resistance and thermal stability at high temperature by including the novolak resin as a curing agent.
  • the main object of the present invention is to provide a novolak epoxy resin and a method for producing the same, which has a low viscosity and remarkably improved high thermal stability and hygroscopicity at a high temperature of 280 ° C or higher.
  • the present invention also provides an epoxy resin composition comprising a novolak epoxy resin having low viscosity while having excellent hygroscopic resistance and high thermal stability at high temperature, and a cured product of the epoxy resin composition.
  • n is an integer of 0 to 5
  • X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  • R is -CH 2-
  • X may be characterized in that -C (CH 3 ) 2 C 6 H 4 OH or -CH 3 .
  • a condensation reaction between the phenolic monomer and the formaldehyde-based monomer under an acid catalyst, the condensation water is removed to a furnace comprising a compound represented by an integer of n 0 to 5 in the formula Synthesizing a volac resin;
  • a heating step of heating and melting a novolak resin obtained from the synthesis step, wherein the novolak resin including a compound represented by an integer of n 0 to 5 in Formula 1 above a softening point;
  • n is an integer of 0 to 5
  • X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  • the high vacuum distillation apparatus in step (c) may be characterized in that it is set to 200 to 280 °C under a pressure of 0.001 to 1.5 mbar.
  • Another embodiment of the present invention provides a novolak curing agent comprising the novolak resin.
  • the epoxy resin provides the epoxy resin composition and the cured product of the epoxy resin composition comprising the novolac curing agent.
  • n is an integer of 0 to 5
  • X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or to be.
  • R is -CH 2-
  • X is -H, Or -CH 3 .
  • the novolak epoxy resin may be characterized in that the PDI is 1.0 to 3.0.
  • the novolak epoxy resin may be characterized in that the melt viscosity at 160 °C 30 to 3,000cps.
  • the novolak epoxy resin may be characterized in that the softening point is 40 to 130 °C.
  • n is an integer of 0 to 5
  • X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or to be.
  • the high vacuum distillation apparatus in the step (c) may be characterized in that it is set to 200 to 280 °C under a pressure of 0.001 to 0.5 mbar.
  • Another embodiment of the present invention provides an epoxy resin composition comprising the novolac epoxy resin and a cured product of the epoxy resin composition.
  • a novolak resin and a novolak epoxy resin having low viscosity and high thermal stability and high hygroscopicity at high temperatures can be easily produced by a simple method, and novolak resin can be used without additional solvent. And it is possible to reduce the viscosity of the novolac epoxy resin can be useful economically, environmentally friendly.
  • Example 1 is a GPC graph of a bisphenol novolak resin obtained in Comparative Example 1-1 and a bisphenol novolak resin obtained in Example 1-1.
  • Example 3 is a GPC graph of a bisphenol novolac epoxy resin obtained in Example 4-1 of the present invention.
  • Example 4 is a GPC graph of a phenol novolac epoxy resin obtained in Example 6-1 of the present invention.
  • n is an integer of 0 to 5
  • X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  • R is -CH 2-
  • X is -C (CH 3 ) 2 C 6 H 4 OH or -CH 3 It is in terms of hygroscopicity and heat resistance and workability desirable.
  • n 0 in which only two monomers are polymerized
  • the novolak resin of the present invention can achieve the improvement of the average number of functional groups in the molecule for improving the curing density required in the final cured product, and high heat resistance without including the polymer region, thereby copper clad laminate (Copper Clad It is possible to suppress the generation of micro-void generated during the manufacture of laminate (CCL) and to exhibit excellent hygroscopic resistance and high thermal stability at high temperature (above 280 ° C).
  • the compatibility of the resin and the wettability to the glass fiber can be improved.
  • the melt viscosity at 180 ° C is preferably 100 to 3,000 cps.
  • PDI is 1.0 to At the same time as 3.0
  • the softening point of 80 ° C or higher prevents the blocking of the resin, that is, the phenomenon of agglomeration in an environment with high temperature to high humidity, such as in summer, and excellent hygroscopicity and high temperature. High thermal stability can be ensured, and by making it 160 degrees C or less, melting of resin can be made easy and workability can be improved.
  • n is an integer of 0 to 5
  • X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  • the method for producing a novolak resin according to the present invention synthesizes a novolak resin of a repeating unit represented by Chemical Formula 1 by condensation reaction between a phenolic monomer and a formaldehyde monomer under an acid catalyst and removal of the condensation water.
  • the synthesis of the novolak resin can be used without limitation, as long as it is a method capable of synthesizing the novolak resin, wherein the acid catalyst is generally not limited to use as long as it is a catalyst that can be used for the synthesis of novolak resin,
  • the reaction time can be carried out for 2 to 6 hours.
  • the temperature and pressure of the high vacuum distillation apparatus are 200 to 280 ° C. and 0.001 to 1.5 mbar, respectively.
  • the temperature of the high vacuum distillation unit is less than 200 ° C., only novolac resin of the appropriate molecular weight cannot be efficiently extracted, and the temperature is 280 ° C. If exceeded, it may cause thermal deformation or deterioration of the novolak resin due to high temperature.
  • the resin of the polymer region may also be separated together, and only novolac resins having an appropriate molecular weight may be taken out. Since only the resin having a molecular weight cannot be efficiently extracted, there is a problem in that separation efficiency is lowered.
  • Such a method for producing a novolak resin according to the present invention can be easily and conveniently produced through the polymerization degree and molecular weight control of the resin, while having excellent hygroscopic resistance and thermal stability, can be used as a low viscosity curing agent.
  • the present invention relates to a novolak curing agent containing the novolak resin.
  • Novolak resins prepared as described above may be particularly useful as novolak curing agents. When used as a novolac curing agent, it may be used alone or in combination with other curing agents.
  • One example of another curing agent is preferably a curing agent, and novolak, cresol novolak, and the like may also be possible. It is preferable to use at least 5% by weight or more of the total curing agent in combination with other curing agents in view of excellent hygroscopic resistance and thermal stability at high temperatures.
  • the epoxy resin In another aspect, the present invention, the epoxy resin; And an epoxy resin composition comprising the novolac curing agent and a cured product of the epoxy resin composition.
  • Epoxy resin composition according to the present invention by containing a novolak of the polymerization degree and molecular weight of the resin as a curing agent, while having a good solvent solubility compared to the conventional epoxy temporary composition, it is possible to balance the excellent hygroscopic resistance and thermal stability at high temperatures have.
  • the epoxy resin may be applied as long as it is a common epoxy resin, preferably an epoxy resin having two or more glycidyl groups and having an epoxy equivalent (EEW) of 150 to 300 g / eq.
  • the epoxy resin composition according to the present invention may include a novolak curing agent in an amount of 5 to 95 wt% based on the total weight of the composition in consideration of hygroscopic resistance, thermal stability, viscosity, and the like. If the novolac curing agent is added in an amount of less than 5% by weight based on the total weight of the composition, the effect is insignificant, and when added in excess of 95% by weight, the degree of curing may decrease.
  • the epoxy resin composition according to the present invention satisfies dimensional stability at high temperature, heat resistance, hygroscopicity, and the like, and is excellent in compatibility with other resins, and is used for sealing materials and moldings used for copper-clad laminates and electronic components used in printed circuit boards. It is possible to provide a cured product that can implement a balanced property suitable for the material, molding materials, adhesives, materials for electrical insulating paint, and the like.
  • n is an integer of 0 to 5
  • X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or to be.
  • Novolak epoxy resin of the present invention in the formula 2 R is -CH 2-
  • X is Or -CH 3 bisphenol novolac epoxy resin, which is preferable in view of workability and thermal properties in the production of copper-clad laminates.
  • n Compared to the conventional novolak epoxy resin having the same weight average molecular weight, by including the content of the compound of 0 to 2.8% by weight or less, or with no weight average molecular weight of 700 to 5,000 g / mol, It is possible to greatly improve the hygroscopic resistance, thermal stability and curing density.
  • an epoxy curing agent such as novolac, imidazole, amine, or the like
  • the novolac epoxy resin of the present invention can achieve the improvement of the average number of functional groups in the molecule for improving the curing density required in the final cured product and high heat resistance without including the polymer region, thereby copper foil laminated plate (Copper) It is possible to suppress the generation of micro-void generated during the production of clad laminate (CCL), and to exhibit excellent hygroscopic resistance and high thermal stability at high temperature (above 280 ° C).
  • PDI polydispersity index
  • the compatibility and wettability with respect to the glass fiber can be improved at the time of varnish blending of the resin.
  • a novolak-based polymer and epiclohydrin monomers under a basic catalyst in a poly / condensation reaction, and remove the condensation water and the salt formed by the integer of n 0 to 5 in the formula Synthesis step of synthesizing a novolac epoxy resin comprising a compound represented by;
  • a heating step of heating and melting a novolak epoxy resin obtained from the synthesis step, the compound represented by an integer of n 0 to 5 in Formula 2, above a softening point;
  • n is an integer of 0 to 5
  • X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or to be.
  • the method for producing an epoxy resin according to the present invention includes a compound of a repeating unit represented by the formula (2) by performing a poly / condensation reaction of a phenol novolak-based polymer and an epichlorohydrin monomer under a basic catalyst and removing the condensation water produced therein.
  • An epoxy resin is synthesized.
  • the step of synthesizing the epoxy resin can be used without limitation as long as it is a method capable of synthesizing the epoxy resin, and preferably, by the poly / condensation reaction of the phenol novolak-based polymer and the epichlorohydrin monomer under a basic catalyst. Can be done. At this time, the polycondensation reaction time may be performed for 2 to 6 hours.
  • Sodium hydroxide (NaOH) may be preferably used as the basic catalyst, and sodium hydroxide used as the catalyst is suitable for discoloration, minimization of by-product generation, and reaction rate of a resin prepared at a concentration of 30 to 60 wt%, and a phenol furnace. It is preferable to use the rockac polymer, the epichlorohydrin monomer and the basic catalyst in a molar ratio of 1: 3.5 to 5.5 mol: 0.9 to 1.5 mol.
  • the synthesized epoxy resin is heated and melted above the softening point so as to be easily introduced into a high vacuum distillation apparatus.
  • the softening point of the phenol epoxy resin is different depending on the epoxy resin, but is generally 40 to 80 °C. Softening points above or below were measured at a temperature rise rate of 2 / min. Using a FP90 instrument from METTLER TOLEDO.
  • the temperature and pressure of the main body of the high vacuum distillation apparatus can be set appropriately.
  • Such a method for producing a novolac epoxy resin according to the present invention can be easily and simply produced through the polymerization degree and molecular weight control of the produced resin, a low viscosity, excellent thermal stability and high moisture resistance at high temperatures.
  • This invention relates to the epoxy resin composition containing the said novolak epoxy resin, and the hardened
  • the epoxy resin composition according to the present invention includes a novolak epoxy resin having a controlled degree of polymerization and a molecular weight, thereby achieving a good solvent solubility compared to conventional epoxy temporary compositions, and achieving improved thermal stability and hygroscopic resistance at a higher temperature. .
  • the epoxy resin composition according to the present invention may include 5 to 95% by weight of novolak epoxy resin, based on the total weight of the composition in consideration of thermal stability, hygroscopicity, viscosity, and the like. If the novolac epoxy resin is added in an amount of less than 5% by weight based on the total weight of the composition, the effect is insignificant, and when it is added in excess of 95% by weight, adhesion characteristics may be lowered.
  • the epoxy resin composition according to the present invention satisfies dimensional stability at high temperature, heat resistance, hygroscopicity, and the like, and has excellent flowability of resin, sealing materials, molding materials, and molds used for copper-clad laminates and electronic components used in printed circuit boards. It is possible to provide a cured product capable of achieving a balance of properties suitable for materials, adhesives, materials for electrical insulating coating, and the like.
  • the bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 200 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolak resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolak resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 180 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 1.25 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 180 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 1.20 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 2-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.7 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 2-1 was heated to 160 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 235 ° C. and a pressure of 1.55 mbar, and operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.50 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.45 mbar, and operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.40 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolak resin obtained in Comparative Example 3-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.70 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • Phenolic obtained in Comparative Example 3-1 The novolak resin was heated to 170 ° C. to make it molten, and then put into a high vacuum distillation apparatus (VTA, Germany) at a temperature of 240 ° C. and a pressure of 1.60 mbar, and operated for 60 minutes.
  • the phenol novolak resin was prepared by removing the molecular weight component.
  • the phenol novolak resin obtained in Comparative Example 3-1 was heated to 180 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.25 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the novolak resin obtained in Comparative Example 3-1 was heated to 180 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.15 mbar, and operated for 60 minutes. Next, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 215 ° C. and a pressure of 1.51 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 195 ° C. and a pressure of 0.51 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.50 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.15 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.40 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.30 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.15 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 190 ° C. and a pressure of 1.65 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.75 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.5 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.45 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 0.3 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 270 ° C. and a pressure of 0.15 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
  • VTA high vacuum distillation apparatus
  • the novolac epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 1.75 mbar, followed by 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the novolac epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 195 ° C. and a pressure of 0.55 mbar, for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.51 mbar, followed by 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.31 mbar, for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • the novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 0.15 mbar for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
  • VTA high vacuum distillation apparatus
  • Polystyrene reduced weight average molecular weight (Mw) and number average molecular weight (Mn) were determined by gel permeation chromatography (GPC) (Waters: Waters707).
  • the polymer to be measured was dissolved in tetrahydrofuran to a concentration of 4000 ppm, and 100 was injected into GPC.
  • the mobile phase of GPC used tetrahydrofuran and was introduced at a flow rate of 1.0 mL / min, and the analysis was performed at 35 ° C.
  • the column connected four Waters HR-05,1,2,4E in series.
  • the detector was measured at 35 ° C using RI and PAD Detecter.
  • PDI polydispersity index
  • GPC Gel permeation chromatography
  • the viscosity of the fully melted resin at 180 ° C. was measured using a Brookfield Viscometer (CAP 2000+).
  • Bisphenol A type Epoxy resin (KOLON INDUSTRY, KES-9361A75) having an epoxy equivalent weight (EEW) of 187 and a curing agent (the novolak resins of the Examples and Comparative Examples) were mixed in an equivalent ratio of 1: 1, and then used as a curing accelerator.
  • Laminates 400 mm x 400 mm x 0.75 mm
  • the varnish and prepreg (the semi-cured varnish in the prepreg) were shaken off. Gel time of making powder) was measured on a hot plate heated to 171 °C (use amount, varnish: 0.2cc, prepreg: 20mg).
  • the gel time of the varnish and the prepreg was measured on a hot plate heated to 171 °C (usage, varnish: 0.2cc, prepreg: 20 mg).
  • the copper-clad laminate obtained in (5) was cut to 6.35 mm ⁇ 6.35 mm ⁇ 0.75 mm (thickness), and the specimens were cut and dried in an oven at 105 ° C. for 2 hours to remove pollutants such as moisture, and then the Z-axis thermal expansion coefficient was measured by a thermal analyzer.
  • TMA TA Instrument Co., Q400
  • the copper-clad laminate obtained in (5) was cut into 50 mm ⁇ 05 mm ⁇ 0.75 mm (thickness) to obtain five specimens, which were then etched (etched) with FeCl 3 to completely peel the copper foil, followed by etching solution and residual water. Water was completely removed and dried in an oven at 105 ° C. for 2 hours to completely remove residual material. After removing the remaining material, put the specimens into a Pressure Cooker Test (PCT) chamber set at 121 ° C and 0.22 MPa, and hold them for 90 minutes. Then, the moisture on the specimens is removed, and the mass change rate before and after moisture absorption is calculated by the following equation. Calculated from 1.
  • PCT Pressure Cooker Test
  • the copper-clad laminate obtained in (5) was cut to 6.35 mm ⁇ 6.35 mm ⁇ 0/75 mm (thickness), and the specimens were cut and dried in an oven at 105 ° C. for 2 hours to remove pollutants such as moisture, and then a thermal analyzer (TMA, TA Instrument Q400) was used. In the measurement, the temperature was raised from 40 ° C. to 288 ° C. at 0 ° C./min, and then the time taken for specimen peeling while maintaining isothermal at 288 ° C. was measured.
  • TMA thermal analyzer
  • 'peeling' means not reversibly returning to its original size after rapid volume expansion, and if the measured value is 10 minutes or more, it is 'good', if it is within 5 minutes, 'normal', and if it is 1 minute or less, Marked as bad.
  • the novolak resin of the embodiment according to the present invention has a low viscosity characteristic compared to the novolak resin of the comparative example, and thermal stability such as low thermal expansion, high glass transition temperature, heat resistance at high temperature and the like. It was confirmed that the hygroscopicity was significantly increased.
  • the bisphenol novolak resins from which the low molecular weights of Examples 1-1 and 1-2 were removed were compared with the phenol novolak resins (Examples 2-1 to 2-3) in measuring glass transition temperature and gel time after curing. It was confirmed that the improvement.
  • n 0 content (% by weight) Mw (g / mol) PDI Melt viscosity (cps) Softening Point (°C) Gel time (sec.) Tg after curing (°C) Thermal stability (T288) CTE (%) Absorption rate (wt%) Comparative Example 6-1 18.56 2300 2.88 1678 65 126 225 Bad 2.58 0.35 Comparative Example 6-2 8.7 2990 2.72 1876 80 118 232 usually 2.57 0.33 Comparative Example 6-3 6.8 3010 2.68 2135 83 121 237 usually 2.58 0.32 Example 4-1 2.8 2945 2.32 2235 95 118 268 Good 2.23 0.23 Example 4-2 1.3 3068 2.28 2356 95 118 272 Good 2.22 0.21 Comparative Example 7-1 13.5 4163 4.04 2376 80.3 116 247 usually 2.76 0.34
  • Example 5-2 1.1 4757 2.87 2888 105 121 292 Good 2.20
  • the novolac epoxy resin of the embodiment has a low viscosity characteristics compared to the epoxy resin of the comparative example, thermal stability such as low thermal expansion, high glass transition temperature, heat resistance at high temperature and moisture absorption resistance This markedly increased.
  • the bisphenol A novolac epoxy resin from which the low molecular weights of Examples 4-1 to 5-3 were removed was added to the phenol novolac epoxy resin (Examples 6-1 to 6-4) and cresol novolac epoxy resin (Example 7). It was confirmed that the glass transition temperature and the gel time measurement after curing were improved from -1 and 7-2).
  • the present invention can easily produce a novolak resin and a novolak epoxy resin having a low viscosity and high thermal stability at high temperature (above 280 ° C.) and excellent hygroscopicity by a simple method, and can be produced without using a solvent. Since the viscosity of the volac epoxy resin can be reduced, it can be economically and environmentally friendly.

Abstract

The present invention relates to a novolac resin, a curing agent containing the same, and an epoxy resin composition, and more specifically, to: a novolac resin of which the degree of polymerization and the molecular weight are controlled to be in specific ranges in order to remarkably improve high thermal stability at a high temperature and moisture resistance while having low viscosity; a novolac curing agent containing the same; and an epoxy resin composition. In addition, the present invention relates to a novolac epoxy resin, a preparation method therefor, and an epoxy resin composition containing the novolac epoxy resin, and more specifically, provides: a novolac epoxy resin of which the degree of polymerization and the molecular weight are controlled to be in specific ranges in order to remarkably improve high thermal stability at a high temperature and moisture resistance while having low viscosity; a preparation method therefor; and an epoxy resin composition containing the novolac epoxy resin.

Description

노볼락 수지, 이를 포함하는 경화제 및 에폭시 수지 조성물과 노볼락 에폭시 수지, 그 제조방법 및 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물Novolak resin, a curing agent and epoxy resin composition comprising the same, and a novolak epoxy resin, a method of manufacturing the same and an epoxy resin composition comprising a novolak epoxy resin
본 발명은 노볼락 수지, 이를 포함하는 경화제 및 에폭시 수지 조성물에 관한 것으로, 보다 상세하게는, 우수한 내흡습성과 고온에서의 높은 열적 안정성을 가지면서 저점도인 노볼락 수지, 이를 포함하는 노볼락 경화제 및 에폭시 수지 조성물에 관한 것이다.The present invention relates to a novolak resin, a curing agent and an epoxy resin composition comprising the same, and more particularly, a novolak resin having a low viscosity while having excellent hygroscopic resistance and high thermal stability at high temperature, a novolak curing agent comprising the same And an epoxy resin composition.
또한, 본 발명은 노볼락 에폭시 수지, 그 제조방법 및 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물에 관한 것으로, 보다 상세하게는, 저점도이면서, 고온에서 높은 열적 안정성과 내흡습성이 크게 개선된 노볼락 에폭시 수지, 그 제조방법 및 상기 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물에 관한 것이다.In addition, the present invention relates to a novolak epoxy resin, a method for producing the same and an epoxy resin composition comprising a novolak epoxy resin, and more particularly, a furnace having a low viscosity and a high thermal stability and high moisture absorption resistance at high temperatures. The present invention relates to a epoxy resin composition comprising a novolak epoxy resin, a method for producing the same, and the novolak epoxy resin.
인쇄회로기판 등에 사용되는 동박적층판(CCL; copper clad laminates)에는 여러 가지 절연 재료 기재와 결합제로 구성된 적층 절연판의 한쪽 면이나 양면에 동박을 붙인 것으로서, 여기에 이용되는 절연 재료에는 최근의 환경 규제에 따라 납을 불포함(Lead-free)해야 하는 등의 요구 사항이 높아지게 되었고, 이에 따라, 높은 유리전이온도 특성을 가지는 절연재료를 요하는 동박적층판에 대한 수요가 최근 상당히 높아지고 있는 추세이다. Copper clad laminates (CCL) used for printed circuit boards are made by attaching copper foil to one or both sides of laminated insulating plates composed of various insulating materials and binders. As a result, requirements such as lead-free have been increased, and accordingly, the demand for copper-clad laminates requiring an insulating material having high glass transition temperature characteristics has recently increased considerably.
또한, 이러한 동박적층판을 제조하기 위해서 기존에 적용하던 아민계 경화제를 대체하는 다관능성 노볼락 경화제 및 노볼락 에폭시 경화제의 적용이 관심을 받고 있다. 다관능성 수지인 노볼락 수지 및 노볼락 에폭시 경화제를 경화제로서 이용하면 높은 경화밀도와 함께 높은 유리전이온도를 얻을 수 있다.In addition, the application of a polyfunctional novolak curing agent and a novolak epoxy curing agent to replace the amine-based curing agent conventionally applied to manufacture such a copper clad laminate is attracting attention. When the novolak resin and the novolak epoxy curing agent which are polyfunctional resins are used as a hardening | curing agent, high glass transition temperature can be obtained with high hardening density.
그러나, 기존에 경화제로 적용되고 있는 노볼락 수지는 그 합성과정에서 중합도가 낮은 올리고머의 생성물이 중합 결과물에 다량 포함되게 된다. 특히 이 중 단량체 2개가 중합된 성분은 반응기가 적어 최종 경화물의 경화밀도를 크게 떨어뜨린다. 또한 높은 반응성으로 인해 경화를 지나치게 촉진시켜 프리프레그 제조 과정에서 용제가 충분히 휘발되기 전에 표면을 경화시켜 많은 양의 용제를 프리프레그 안에 잔존시키기 되며, 떨어진 경화밀도와 잔존하는 용제는 결과적으로 최종 경화물의 유리전이온도를 크게 저하시키게 된다.However, the novolak resin, which is conventionally applied as a curing agent, contains a large amount of oligomer product having low polymerization degree in the polymerization process. In particular, the component in which two monomers were polymerized has few reactors, and it reduces the hardening density of a final hardened | cured material significantly. In addition, due to the high reactivity, the curing is excessively accelerated, the surface is hardened before the solvent is sufficiently volatilized in the prepreg manufacturing process, so that a large amount of the solvent remains in the prepreg. The glass transition temperature is greatly reduced.
또한, 높은 유리전이온도를 얻기 위해서는 분자량과 연화점을 상승시킨 노볼락 수지의 경우 고분자량을 가지는 성분의 특성으로 인해 용제와의 상용성이 저하되고, 점도가 상승하는 특성이 있다. 이로 인해 바니쉬 제조 및 프리프레그 함침 공정이 작업성이 저하되고 용제를 추가하여 점도를 감소시켜야 하는 단점이 있으며, 더욱이, 용제의 추가적인 사용은 경제성 및 환경 오염 측면에서 바람직하지 못하다.In addition, in order to obtain a high glass transition temperature, in the case of a novolak resin having an increased molecular weight and a softening point, compatibility with a solvent may be lowered due to the characteristics of a component having a high molecular weight, and the viscosity may be increased. This has the disadvantage that the varnish manufacturing and prepreg impregnation process has a lower workability and the need to add a solvent to reduce the viscosity, furthermore, the further use of the solvent is undesirable in terms of economics and environmental pollution.
이에 따라, 본 발명자는 출원번호 제2012-0055777호에서 노볼락 수지 중 저분자(n=0)를 5중량% 이하로 제거시켜 고내열성 및 저점도를 가지는 노볼락 수지를 제시하였으나, n=0인 성분을 2.1% 이상 포함하고 있어 280℃ 이상의 고온에서 열적 안정성이 미미하고, 동박적층판(copper clad laminate, CCL) 제조에 있어서 중요한 물성인 내흡습성이 크게 개선되지 않았다.Accordingly, the present inventors have proposed a novolak resin having high heat resistance and low viscosity by removing low molecular weight (n = 0) of the novolak resin to 5 wt% or less in the application number 2012-0055777, but n = 0 Since 2.1% or more of the component is included, thermal stability is insignificant at a high temperature of 280 ° C. or higher, and moisture absorption resistance, which is an important physical property in manufacturing copper clad laminate (CCL), has not been significantly improved.
따라서, 이러한 점들을 개선시킬 수 있는 노볼락 수지의 개발이 필요하다.Therefore, there is a need for the development of a novolak resin that can improve these points.
본 발명의 주된 목적은 저점도이면서, 280℃ 이상의 고온에서 높은 열적 안정성과 내흡습성이 현저히 향상된 노볼락 수지 및 그의 제조방법을 제공하는데 있다.The main object of the present invention is to provide a novolak resin having low viscosity and remarkably improved high thermal stability and hygroscopic resistance at a high temperature of 280 ° C. or higher, and a method for producing the same.
본 발명은 또한, 우수한 내흡습성과 고온에서의 높은 열적 안정성을 가지면서 저점도인 노볼락 수지를 포함하는 노볼락 경화제를 제공하는데 있다.The present invention also provides a novolak curing agent comprising a low viscosity novolak resin having excellent hygroscopic resistance and high thermal stability at high temperatures.
본 발명은 또한, 상기 노볼락 수지를 경화제로 포함함으로써, 내흡습성과 고온에서의 열적 안정성을 동시에 향상시킬 수 있는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물을 제공하는데 있다.The present invention also provides an epoxy resin composition and a cured product of the epoxy resin composition capable of simultaneously improving hygroscopic resistance and thermal stability at high temperature by including the novolak resin as a curing agent.
또한, 본 발명의 주된 목적은 저점도이면서, 280℃ 이상의 고온에서 높은 열적 안정성과 내흡습성이 현저히 향상된 노볼락 에폭시 수지 및 그의 제조방법을 제공하는데 있다.In addition, the main object of the present invention is to provide a novolak epoxy resin and a method for producing the same, which has a low viscosity and remarkably improved high thermal stability and hygroscopicity at a high temperature of 280 ° C or higher.
본 발명은 또한, 우수한 내흡습성과 고온에서의 높은 열적 안정성을 가지면서 저점도인 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물을 제공하는데 있다. The present invention also provides an epoxy resin composition comprising a novolak epoxy resin having low viscosity while having excellent hygroscopic resistance and high thermal stability at high temperature, and a cured product of the epoxy resin composition.
상기의 목적을 달성하기 위하여, 본 발명의 일 구현예는 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지에 있어서, 화학식 1에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 1에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 500 내지 5,500g/mol이고, 다분산 지수가 1.0 내지 3.0이고, 180℃에서의 용융점도가 100 내지 3,000cps이며, 연화점이 80 내지 160℃인 것을 특징으로 하는 노볼락 수지를 제공한다.In order to achieve the above object, one embodiment of the present invention is a novolak resin comprising a compound represented by an integer of n = 0 to 5 in formula 1, 2.8% by weight of a compound of the formula n = 0 It contains below, or without containing a compound of n = 0 in the formula (1), the weight average molecular weight is 500 to 5,500g / mol, polydispersity index is 1.0 to 3.0, melt viscosity at 180 ℃ 100 to 3,000 cps and a softening point of 80 to 160 ° C. to provide a novolak resin.
[화학식 1][Formula 1]
Figure PCTKR2014011291-appb-I000001
Figure PCTKR2014011291-appb-I000001
상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기이다.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
본 발명의 바람직한 일 구현예에서, 상기 화학식 1에서, R은 -CH2- 이며, X는 -C(CH3)2C6H4OH 또는 -CH3인 것을 특징으로 할 수 있다.In a preferred embodiment of the present invention, in formula 1, R is -CH 2- , X may be characterized in that -C (CH 3 ) 2 C 6 H 4 OH or -CH 3 .
본 발명의 다른 구현예는, (a) 페놀계 단량체와 포름알데히드계 단량체를 산촉매하에서 축합 반응시키고, 축합수를 제거하여 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 합성하는 합성단계; (b) 상기 합성단계로부터 수득된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및 (c) 상기 가열단계로부터 용융된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 고진공 증류장치로 투입하여 상기 화학식 1에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 수지의 제조방법을 제공한다.Another embodiment of the present invention, (a) a condensation reaction between the phenolic monomer and the formaldehyde-based monomer under an acid catalyst, the condensation water is removed to a furnace comprising a compound represented by an integer of n = 0 to 5 in the formula Synthesizing a volac resin; (b) a heating step of heating and melting a novolak resin obtained from the synthesis step, wherein the novolak resin including a compound represented by an integer of n = 0 to 5 in Formula 1 above a softening point; And (c) a novolak resin comprising a compound represented by an integer of n = 0 to 5 in the following Chemical Formula 1, melted from the heating step, into a high vacuum distillation apparatus to obtain a compound having n = 0 in Chemical Formula 1 of 2.8. It provides a method for producing a novolak resin comprising an extraction step of removing by weight or less, or completely removed.
[화학식 1][Formula 1]
Figure PCTKR2014011291-appb-I000002
Figure PCTKR2014011291-appb-I000002
상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기이다.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
본 발명의 바람직한 다른 구현예에서, 상기 (c) 단계에서 고진공 증류장치는 0.001 내지 1.5mbar의 압력하에서 200 내지 280℃로 설정하는 것을 특징으로 할 수 있다.In another preferred embodiment of the present invention, the high vacuum distillation apparatus in step (c) may be characterized in that it is set to 200 to 280 ℃ under a pressure of 0.001 to 1.5 mbar.
본 발명의 또 다른 구현예는, 상기 노볼락 수지를 포함하는 노볼락 경화제를 제공한다.Another embodiment of the present invention provides a novolak curing agent comprising the novolak resin.
본 발명의 또 다른 구현예는, 에폭시 수지; 및 상기 노볼락 경화제를 포함하는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물을 제공한다.Another embodiment of the invention, the epoxy resin; And it provides the epoxy resin composition and the cured product of the epoxy resin composition comprising the novolac curing agent.
또한, 본 발명의 일 구현예는 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지에 있어서, 화학식 2에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 2에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 700 내지 5,000g/mol인 것을 특징으로 하는 노볼락 에폭시 수지를 제공한다.In addition, an embodiment of the present invention, in the novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in the formula (2), or less than 2.8% by weight of the compound of the formula (n = 0), or It provides a novolak epoxy resin, characterized in that the weight average molecular weight of 700 to 5,000 g / mol without including a compound of n = 0 in the formula (2).
[화학식 2][Formula 2]
Figure PCTKR2014011291-appb-I000003
Figure PCTKR2014011291-appb-I000003
상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
Figure PCTKR2014011291-appb-I000004
이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
Figure PCTKR2014011291-appb-I000005
이다.
In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
Figure PCTKR2014011291-appb-I000004
X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
Figure PCTKR2014011291-appb-I000005
to be.
본 발명의 바람직한 일 구현예에서, 상기 화학식 2에서, R은 -CH2- 이고, X는 -H,
Figure PCTKR2014011291-appb-I000006
또는 -CH3인 것을 특징으로 할 수 있다.
In a preferred embodiment of the present invention, in formula 2, R is -CH 2- , X is -H,
Figure PCTKR2014011291-appb-I000006
Or -CH 3 .
본 발명의 바람직한 일 구현예에서, 상기 노볼락 에폭시 수지는 PDI가 1.0 내지 3.0인 것을 특징으로 할 수 있다.In a preferred embodiment of the present invention, the novolak epoxy resin may be characterized in that the PDI is 1.0 to 3.0.
본 발명의 바람직한 일 구현예에서, 상기 노볼락 에폭시 수지는 160℃에서의 용융점도가 30 내지 3,000cps인 것을 특징으로 할 수 있다.In a preferred embodiment of the present invention, the novolak epoxy resin may be characterized in that the melt viscosity at 160 ℃ 30 to 3,000cps.
본 발명의 바람직한 일 구현예에서, 상기 노볼락 에폭시 수지는 연화점이 40 내지 130℃인 것을 특징으로 할 수 있다.In a preferred embodiment of the present invention, the novolak epoxy resin may be characterized in that the softening point is 40 to 130 ℃.
본 발명의 다른 구현예는 (a) 노볼락계 중합체와 에피클로하이드린 단량체를 염기성 촉매하에서 중/축합반응시키고, 축합수 및 생성된 염을 제거하여 하기 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 합성하는 합성단계; (b) 상기 합성단계로부터 수득된, 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및 (c) 상기 가열단계로부터 용융된, 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 고진공 증류장치로 투입하여 화학식 2에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 에폭시 수지의 제조방법을 제공한다.Another embodiment of the present invention is (a) poly / condensation reaction of the novolak-based polymer and epiclohydrin monomer under a basic catalyst, the condensation water and the resulting salt is removed by the integer of n = 0 to 5 in the formula Synthesis step of synthesizing a novolac epoxy resin comprising a compound represented by; (b) a heating step of heating and melting a novolak epoxy resin obtained from the synthesis step, the compound represented by an integer of n = 0 to 5 in Formula 2, above a softening point; And (c) a novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in Chemical Formula 2, melted from the heating step, into a high vacuum distillation apparatus to give 2.8 weight of a compound having n = 0 in Chemical Formula 2. It provides a method for producing a novolak epoxy resin comprising an extraction step of removing to less than or completely removed.
[화학식 2][Formula 2]
Figure PCTKR2014011291-appb-I000007
Figure PCTKR2014011291-appb-I000007
상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
Figure PCTKR2014011291-appb-I000008
이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
Figure PCTKR2014011291-appb-I000009
이다.
In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
Figure PCTKR2014011291-appb-I000008
X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
Figure PCTKR2014011291-appb-I000009
to be.
본 발명의 바람직한 다른 구현예에서, 상기 (c) 단계에서 고진공 증류장치는 0.001 내지 0.5mbar의 압력하에서 200 내지 280℃로 설정하는 것을 특징으로 할 수 있다.In another preferred embodiment of the present invention, the high vacuum distillation apparatus in the step (c) may be characterized in that it is set to 200 to 280 ℃ under a pressure of 0.001 to 0.5 mbar.
본 발명의 또 다른 구현예는 상기 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물을 제공한다.Another embodiment of the present invention provides an epoxy resin composition comprising the novolac epoxy resin and a cured product of the epoxy resin composition.
본 발명에 따르면, 저점도이면서 고온(280℃ 이상)에서의 높은 열적 안정성과 내흡습성이 우수한 노볼락 수지 및 노볼락 에폭시 수지를 간단한 방법으로 용이하게 제조할 수 있고, 용제 추가 사용 없이 노볼락 수지 및 노볼락 에폭시 수지의 점도를 감소시킬 수 있어 경제적으로나, 친환경적으로 유용하게 사용할 수 있다.According to the present invention, a novolak resin and a novolak epoxy resin having low viscosity and high thermal stability and high hygroscopicity at high temperatures (above 280 ° C.) can be easily produced by a simple method, and novolak resin can be used without additional solvent. And it is possible to reduce the viscosity of the novolac epoxy resin can be useful economically, environmentally friendly.
도 1은 본 발명의 비교예 1-1에서 수득된 비스페놀 노볼락 수지 및 실시예 1-1에서 수득된 비스페놀 노볼락 수지의 GPC 그래프이다.1 is a GPC graph of a bisphenol novolak resin obtained in Comparative Example 1-1 and a bisphenol novolak resin obtained in Example 1-1.
도 2는 본 발명의 비교예 6-1에서 수득된 비스페놀 노볼락 에폭시 수지의 GPC 그래프이다. 2 is a GPC graph of a bisphenol novolac epoxy resin obtained in Comparative Example 6-1 of the present invention.
도 3은 본 발명의 실시예 4-1에서 수득된 비스페놀 노볼락 에폭시 수지의 GPC 그래프이다. 3 is a GPC graph of a bisphenol novolac epoxy resin obtained in Example 4-1 of the present invention.
도 4는 본 발명의 실시예 6-1에서 수득된 페놀 노볼락 에폭시 수지의 GPC 그래프이다.4 is a GPC graph of a phenol novolac epoxy resin obtained in Example 6-1 of the present invention.
다른 식으로 정의되지 않는 한, 본 명세서에서 사용된 모든 기술적 및 과학적 용어들은 본 발명이 속하는 기술분야에서 숙련된 전문가에 의해서 통상적으로 이해되는 것과 동일한 의미를 가진다. 일반적으로, 본 명세서에서 사용된 명명법 은 본 기술분야에서 잘 알려져 있고 통상적으로 사용되는 것이다.Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In general, the nomenclature used herein is well known and commonly used in the art.
본원 명세서 전체에서, 어떤 부분이 어떤 구성 요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성 요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout this specification, when a part is said to "include" a certain component, it means that it can further include other components, without excluding the other components unless otherwise stated.
본 명세서에서 사용되는 정도의 용어 "약", "실질적으로" 등은 언급된 의미에 고유한 제조 및 물질 허용오차가 제시될 때 그 수치에서 또는 그 수치에 근접한 의미로 사용되고, 본 발명의 이해를 돕기 위해 정확하거나 절대적인 수치가 언급된 개시 내용을 비양심적인 침해자가 부당하게 이용하는 것을 방지하기 위해 사용된다.As used herein, the terms "about", "substantially", and the like, are used at, or in close proximity to, numerical values when manufacturing and material tolerances inherent in the meanings indicated are intended to aid the understanding of the invention. Accurate or absolute figures are used to assist in the prevention of unfair use by unscrupulous infringers.
본 발명은 일 관점에서, 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지에 있어서, 화학식 1에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 1에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 500 ~ 5,500g/mol이고, 다분산 지수가 1.0 내지 3.0이고, 180℃에서의 용융점도가 100 내지 3,000cps이며, 연화점이 80 내지 160℃인 것을 특징으로 하는 노볼락 수지에 관한 것이다.In one aspect, the present invention provides a novolak resin comprising a compound represented by an integer of n = 0 to 5 in formula (1), comprising: 2.8 wt% or less of the compound having n = 0 in formula (1), or Without including a compound having n = 0, the weight average molecular weight is 500 to 5,500 g / mol, the polydispersity index is 1.0 to 3.0, the melt viscosity at 180 ° C. is 100 to 3,000 cps, and the softening point is 80 to 160 It is related with the novolak resin characterized by the above-mentioned.
[화학식 1][Formula 1]
Figure PCTKR2014011291-appb-I000010
Figure PCTKR2014011291-appb-I000010
상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기이다.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
본 발명의 노볼락 수지는 상기 화학식 1에서, R은 -CH2- 이며, X는 -C(CH3)2C6H4OH 또는 -CH3인 것이 내흡습성과 내열성 그리고, 작업성 측면에서 바람직하다.The novolak resin of the present invention, in formula 1, R is -CH 2- , X is -C (CH 3 ) 2 C 6 H 4 OH or -CH 3 It is in terms of hygroscopicity and heat resistance and workability desirable.
최근 전자기기의 소형화, 고기능화 추세에 따른 동박적층판의 경박단소에 해당하는 기술적 요구 조건을 충족시키기 위한 연구가 활발히 진행되고 있으나, 흡습, 열팽창, 고온 안정성 등의 문제로 기술 개발이 더디어지고 있다. 이에, 본 발명에서는 제조된 노볼락 수지의 중합도와 분자량을 특정범위로 조절할 경우, 낮은 점도를 가지면서 내흡습성과 고온(280℃ 이상)에서의 열적 안정성을 크게 향상시킬 수 있음을 확인하고, 본 발명을 완성하게 되었다. Recently, researches to meet the technical requirements corresponding to the thin and thin sections of copper-clad laminates according to the trend of miniaturization and high functionalization of electronic devices have been actively conducted, but technology development has been delayed due to problems such as moisture absorption, thermal expansion, and high temperature stability. Thus, in the present invention, when the polymerization degree and molecular weight of the prepared novolak resin is adjusted to a specific range, it has been confirmed that it can significantly improve the hygroscopic resistance and thermal stability at high temperature (280 ℃ or more) while having a low viscosity, The invention was completed.
보다 구체적으로, 화학식 1로 표시되는 노볼락 수지의 합성 과정에서는 n=0에서 n=5까지의 화합물이 약 10중량% 이상 포함되는 것이 일반적이지만, 본 발명에서는 단량체 2개만이 중합된 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 포함되지 않으면서, 중량평균분자량이 500 ~ 5,500g/mol인 것으로 조절시킴으로써, 동일한 중량평균분자량을 가진 종래의 노볼락 수지에 비교할 때, 내흡습성, 열적 안정성 및 경화밀도를 크게 향상시킬 수 있는 것이다.More specifically, in the process of synthesizing the novolak resin represented by Formula 1, it is common to include about 10% by weight or more of the compound from n = 0 to n = 5, but in the present invention, n = 0 in which only two monomers are polymerized When compared to the conventional novolak resin having the same weight average molecular weight, by adjusting the content of the phosphorus compound to 2.8% by weight or less, or not included, by controlling the weight average molecular weight to 500 to 5,500 g / mol It is possible to greatly improve hygroscopicity, thermal stability and curing density.
특히, 동일한 PDI(단분산 지수)를 가진 종래의 노볼락 수지에 비교할 때, 본 발명에서는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 또는 포함되지 않도록 하여 에폭시 수지와 반응을 완료하여 비 가역적 망상구조를 형성하였을 경우, 상대적으로 미반응 수산기는 적게 생성되고 경화밀도는 향상되고, 이에 따라 자유 부피(Free Volume)는 줄어들며, 경화제와의 상용성이 좋아져서 Micro-void의 생성을 억제시킬 수 있다.In particular, when compared to a conventional novolak resin having the same PDI (monodispersity index), in the present invention, the reaction with the epoxy resin is carried out by including or not containing 2.8% by weight or less of the compound of n = 0. When completed to form a non-reversible network structure, relatively unreacted hydroxyl group is generated relatively, the curing density is improved, the free volume is reduced, and the compatibility with the curing agent is improved to form the micro-void Can be suppressed.
또한, 본 발명의 노볼락 수지는 최종 경화물에서 요구되는 경화밀도 개선을 위한 분자 내 평균 작용기 수의 향상과, 고분자 영역을 포함하지 않고 고내열성을 달성할 수 있으며, 이에 따른 동박적층판(Copper Clad Laminate; CCL) 제조시 발생하는 Micro-void의 생성을 억제시킬 수 있는 동시에, 우수한 내흡습성과 고온(280℃ 이상)에서 높은 열적 안정성을 나타낼 수 있다.In addition, the novolak resin of the present invention can achieve the improvement of the average number of functional groups in the molecule for improving the curing density required in the final cured product, and high heat resistance without including the polymer region, thereby copper clad laminate (Copper Clad It is possible to suppress the generation of micro-void generated during the manufacture of laminate (CCL) and to exhibit excellent hygroscopic resistance and high thermal stability at high temperature (above 280 ° C).
이때, 본 발명의 노볼락 수지는 n=0인 화합물의 함량을 2.8 중량% 이하로 포함시키거나, 또는 포함되지 않도록 함과 동시에 다분산 지수(Polydispersity index; PDI)가 1.0 내지 3.0인 것이 바람직한데, PDI가 1.0 내지 3.0으로 함으로써, 수지의 배합시 상용성 및 유리섬유에 대한 젖음성을 향상시킬 수 있다. 상기 PDI는 1에 근접하는 수준으로 낮을수록 수지의 상용성 및 유리섬유에 대한 젖음성을 더욱 우수하게 할 수 있다.At this time, the novolak resin of the present invention preferably contains or does not contain the content of the compound of n = 0 to 2.8% by weight or less and at the same time the polydispersity index (PDI) is 1.0 to 3.0 When the PDI is 1.0 to 3.0, the compatibility of the resin and the wettability to the glass fiber can be improved. The lower the PDI is to a level close to 1, the more excellent the compatibility of the resin and the wettability to the glass fiber.
또한, 본 발명의 노볼락 수지는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 포함되지 않으면서, 중량평균분자량이 500 내지 5,500g/mol인 것으로 하고, PDI가 1.0 내지 3.0인 것과 동시에, 180℃에서의 용융점도가 100 내지 3,000cps인 것이 바람직한데, 점도가 100cps 이상으로 함으로써, 기재에 함침 또는 도포된 수지가 흘러내리는 것을 방지할 수 있으며, 점도가 3,000cps 이하로 함으로써, 높은 점도로 인한 작업성의 저하 없이 기재에 함침 또는 도포가 가능하도록 할 수 있다.In addition, the novolak resin of the present invention contains a content of the compound of n = 0 to 2.8% by weight or less, with or without a weight average molecular weight of 500 to 5,500g / mol, PDI is 1.0 to 3.0 At the same time, the melt viscosity at 180 ° C is preferably 100 to 3,000 cps. By setting the viscosity to 100 cps or more, the resin impregnated or applied to the substrate can be prevented from flowing down, and the viscosity is set to 3,000 cps or less. It is possible to impregnate or apply the substrate without deteriorating workability due to high viscosity.
또한, 본 발명의 노볼락 수지는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 또는 포함되지 않으면서, 중량평균분자량이 500 내지 5,500g/mol인 것으로 하고, PDI가 1.0 내지 3.0인 것과 동시에, 연화점이 80℃ 이상으로 함으로써, 수지가 블로킹(blocking)되는 현상 즉, 여름철 등과 같이, 온도 내지 습도가 높은 환경에서 덩어리가 되는 현상을 막을 수 있고, 우수한 내흡습성과 고온에서의 높은 열적 안정성을 확보할 수 있으며, 160℃이하로 함으로써, 수지의 용융을 용이하게 하여 작업성을 좋게 할 수 있는 것이다.In addition, the novolak resin of the present invention is a weight average molecular weight of 500 to 5,500 g / mol with or without the content of the compound of n = 0 to 2.8% by weight or less, PDI is 1.0 to At the same time as 3.0, the softening point of 80 ° C or higher prevents the blocking of the resin, that is, the phenomenon of agglomeration in an environment with high temperature to high humidity, such as in summer, and excellent hygroscopicity and high temperature. High thermal stability can be ensured, and by making it 160 degrees C or less, melting of resin can be made easy and workability can be improved.
본 발명은 다른 관점에서, (a) 페놀계 단량체와 포름알데히드계 단량체를 산촉매하에서 축합 반응시키고, 축합수를 제거하여 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 합성하는 합성단계; (b) 상기 합성단계로부터 수득된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및 (c) 상기 가열단계로부터 용융된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 고진공 증류장치로 투입하여 상기 화학식 1에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 수지의 제조방법에 관한 것이다.In another aspect of the present invention, (a) a novolac comprising a compound represented by an integer of n = 0 to 5 in the following Chemical Formula 1 by condensation reaction between a phenolic monomer and a formaldehyde monomer under an acid catalyst, and removal of the condensed water. Synthesis step of synthesizing a resin; (b) a heating step of heating and melting a novolak resin obtained from the synthesis step, wherein the novolak resin including a compound represented by an integer of n = 0 to 5 in Formula 1 above a softening point; And (c) a novolak resin comprising a compound represented by an integer of n = 0 to 5 in the following Chemical Formula 1, melted from the heating step, into a high vacuum distillation apparatus to obtain a compound having n = 0 in Chemical Formula 1 of 2.8. It relates to a method for producing a novolak resin comprising an extraction step of removing by weight or less, or completely removed.
[화학식 1][Formula 1]
Figure PCTKR2014011291-appb-I000011
Figure PCTKR2014011291-appb-I000011
상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기이다.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
본 발명에 따른 화학식 1에서 n=0인 화합물을 2.8 중량% 이하 포함하거나, 또는 화학식 1에서 n=0인 화합물을 포함하지 않는 것을 특징으로 하는 노볼락 수지의 제조방법은, 다음과 같다.Method for producing a novolak resin, characterized in that it contains 2.8 wt% or less of the compound of n = 0 in the formula (1) according to the present invention, or does not contain a compound of n = 0 in formula (1), as follows.
본 발명에 따른 노볼락 수지의 제조방법은 페놀계 단량체와 포름알데히드계 단량체를 산 촉매하에서 축합 반응시키고 축합수를 제거함으로써 화학식 1로 표시되는 반복단위의 노볼락 수지를 합성한다.The method for producing a novolak resin according to the present invention synthesizes a novolak resin of a repeating unit represented by Chemical Formula 1 by condensation reaction between a phenolic monomer and a formaldehyde monomer under an acid catalyst and removal of the condensation water.
본 발명에 있어서, 노볼락 수지의 합성은 노볼락 수지를 합성할 수 있는 방법이면, 제한 없이 사용 가능하고, 이때 산 촉매는 일반적으로 노볼락 수지 합성에 사용할 수 있는 촉매라면 사용에 제한이 없으며, 반응시간은 2 내지 6시간 동안 수행할 수 있다.In the present invention, the synthesis of the novolak resin can be used without limitation, as long as it is a method capable of synthesizing the novolak resin, wherein the acid catalyst is generally not limited to use as long as it is a catalyst that can be used for the synthesis of novolak resin, The reaction time can be carried out for 2 to 6 hours.
이와 같이, 합성단계에서 얻은 화학식 1로 표시되는 반복단위의 노볼락 수지 중, n=0인 화합물을 2.8 중량% 이하로 포함하게 분리시키기 위해, 화학식 1로 표시되는 반복단위의 노볼락 수지를 연화점 이상으로 가열하여 용융시키고, 용융된 화합물을 특정 조건으로 설정된 고진공 증류장치에 투입하여, 화학식 1에서 n=0인 화합물을 2.8중량% 이하로 분리시키는 추출단계를 포함한다. 이상 또는 이하의 연화점은 METTLER TOLEDO사의 FP90 기기를 이용하여 2℃/min.의 승온 속도로 측정하였다.As such, the novolak resin of the repeating unit represented by the formula (1) is softened to separate the compound having n = 0 in 2.8 wt% or less of the novolak resin of the repeating unit represented by the formula (1) obtained in the synthesis step. It is heated and melted above, and the molten compound is put into a high vacuum distillation apparatus set to a specific condition, and the extraction step of separating the compound of n = 0 in the formula (1) to 2.8% by weight or less. Softening point above or below was measured at the temperature increase rate of 2 degree-C / min. Using the FP90 apparatus of METTLER TOLEDO.
상기 추출단계에서는 상기 투입되는 노볼락 수지로부터 화학식 1의 n=0인 화합물을 분리시켜, n=0인 화합물을 완전히 제거하거나, 2.8중량% 이하의 임의의 설정된 중량%로 포함할 수 있도록 고진공 증류장치의 본체의 온도 및 압력을 적절히 설정함으로써, 최종적으로 얻어지는 노볼락 수지에 포함된 n=0인 화합물을 완전히 포함되지 않도록 하거나, 임의의 설정된 농도로 포함되도록 할 수 있는 것이다.In the extraction step, a high vacuum distillation is performed to separate the n = 0 compound of Formula 1 from the introduced novolak resin to completely remove the n = 0 compound, or to include any set weight% of 2.8 wt% or less. By appropriately setting the temperature and pressure of the main body of the apparatus, the compound having n = 0 contained in the finally obtained novolak resin may not be completely contained or may be included at any set concentration.
이때, 고진공 증류장치의 온도 및 압력은 각각 200 내지 280℃와 0.001 내지 1.5mbar로, 고진공 증류장치의 온도가 200℃ 미만인 경우에는 적정 분자량의 노볼락 수지만을 효율적으로 추출할 수 없고, 280℃를 초과하는 경우에는 고온에 의한 노볼락 수지의 열변형이나 열화를 초래할 수 있다.At this time, the temperature and pressure of the high vacuum distillation apparatus are 200 to 280 ° C. and 0.001 to 1.5 mbar, respectively. When the temperature of the high vacuum distillation unit is less than 200 ° C., only novolac resin of the appropriate molecular weight cannot be efficiently extracted, and the temperature is 280 ° C. If exceeded, it may cause thermal deformation or deterioration of the novolak resin due to high temperature.
또한, 고진공 증류장치의 압력이 0.001mbar 미만인 경우, 고분자 영역의 수지도 함께 분리되어 적정 분자량의 노볼락 수지만을 취출할 수 없고, 1.5mbar를 초과하는 경우에는 제조비용이 과다하게 소요되는 동시에 적정 분자량의 수지만을 효율적으로 추출할 수 없어 분리 효율이 낮아지는 문제점이 있다.In addition, when the pressure of the high vacuum distillation apparatus is less than 0.001 mbar, the resin of the polymer region may also be separated together, and only novolac resins having an appropriate molecular weight may be taken out. Since only the resin having a molecular weight cannot be efficiently extracted, there is a problem in that separation efficiency is lowered.
이와 같은 본 발명에 따른 노볼락 수지의 제조방법은 우수한 내흡습성과 열적 안정성을 가지면서, 저점도 경화제로 사용할 수 있는 노볼락 수지를 수지의 중합도와 분자량 제어를 통해 용이하고 간편하게 제조할 수 있다.Such a method for producing a novolak resin according to the present invention can be easily and conveniently produced through the polymerization degree and molecular weight control of the resin, while having excellent hygroscopic resistance and thermal stability, can be used as a low viscosity curing agent.
본 발명은 또 다른 관점에서, 상기 노볼락 수지를 포함하는 노볼락 경화제에 관한 것이다.In still another aspect, the present invention relates to a novolak curing agent containing the novolak resin.
전술된 바와 같이 제조된 노볼락 수지는 특히 노볼락 경화제로 유용할 수 있다. 노볼락 경화제로 사용 시, 이를 단독으로 사용할 수도 있으며, 다른 경화제와 병용할 수 있다. 다른 경화제의 일 예로는 경화제인 것이 바람직하고, 노볼락, 크레졸 노볼락 등도 가능할 수 있다. 다른 경화제와 병용시 전체 경화제 중 적어도 5 중량% 이상을 사용하는 것이 우수한 내흡습성과 고온에서의 열적 안정성 측면에서 바람직하다.Novolak resins prepared as described above may be particularly useful as novolak curing agents. When used as a novolac curing agent, it may be used alone or in combination with other curing agents. One example of another curing agent is preferably a curing agent, and novolak, cresol novolak, and the like may also be possible. It is preferable to use at least 5% by weight or more of the total curing agent in combination with other curing agents in view of excellent hygroscopic resistance and thermal stability at high temperatures.
본 발명은 또 다른 관점에서, 에폭시 수지; 및 상기 노볼락 경화제를 포함하는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물에 관한 것이다.In another aspect, the present invention, the epoxy resin; And an epoxy resin composition comprising the novolac curing agent and a cured product of the epoxy resin composition.
본 발명에 따른 에폭시 수지 조성물은 수지의 중합도와 분자량이 조절된 노볼락를 경화제로 함유시킴으로써, 종래 에폭시 수시 조성물에 비해 좋은 용제 용해성을 가지면서, 우수한 내흡습성과 고온에서의 열적 안정성을 균형있게 구현할 수 있다. 이때, 상기 에폭시 수지는 통상의 에폭시 수지이면 적용가능하고, 바람직하게는 2개 이상의 글리시딜기를 가지며 에폭시 당량(EEW)이 150 내지 300g/eq인 에폭시 수지일 수 있다.Epoxy resin composition according to the present invention by containing a novolak of the polymerization degree and molecular weight of the resin as a curing agent, while having a good solvent solubility compared to the conventional epoxy temporary composition, it is possible to balance the excellent hygroscopic resistance and thermal stability at high temperatures have. In this case, the epoxy resin may be applied as long as it is a common epoxy resin, preferably an epoxy resin having two or more glycidyl groups and having an epoxy equivalent (EEW) of 150 to 300 g / eq.
본 발명에 따른 에폭시 수지 조성물은 내흡습성, 열적 안정성, 점도 등을 고려하여 조성물 총 중량에 대하여, 노볼락 경화제를 5 내지 95 중량%로 포함시킬 수 있다. 만약, 상기 노볼락 경화제가 조성물 전체 중량에 대하여, 5 중량% 미만으로 첨가될 경우, 그 효과가 미비하고, 95 중량%를 초과하여 첨가되는 경우에는 경화도가 저하될 수 있다.The epoxy resin composition according to the present invention may include a novolak curing agent in an amount of 5 to 95 wt% based on the total weight of the composition in consideration of hygroscopic resistance, thermal stability, viscosity, and the like. If the novolac curing agent is added in an amount of less than 5% by weight based on the total weight of the composition, the effect is insignificant, and when added in excess of 95% by weight, the degree of curing may decrease.
본 발명에 따른 에폭시 수지 조성물은 고온에서의 치수 안정성, 내열성, 내흡습성 등을 만족하면서, 다른 수지와의 상용성이 우수하여, 인쇄회로기판에 사용되는 동박적층판이나 전자부품에 사용되는 밀봉재, 성형재, 주형재, 접착제, 전기절연도료용 재료 등에 적합한 특성을 균형있게 구현할 수 있는 경화물을 제공할 수 있다.The epoxy resin composition according to the present invention satisfies dimensional stability at high temperature, heat resistance, hygroscopicity, and the like, and is excellent in compatibility with other resins, and is used for sealing materials and moldings used for copper-clad laminates and electronic components used in printed circuit boards. It is possible to provide a cured product that can implement a balanced property suitable for the material, molding materials, adhesives, materials for electrical insulating paint, and the like.
또한, 본 발명은 일 관점에서, 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지에 있어서, 화학식 2에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 2에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 700 내지 5,000g/mol인 것을 특징으로 하는 노볼락 에폭시 수지에 관한 것이다.In addition, the present invention, in one aspect, in the novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in the formula (2), in the formula (2) comprises 2.8% by weight or less, or The present invention relates to a novolac epoxy resin, wherein the weight average molecular weight is 700 to 5,000 g / mol without including a compound having n = 0 in the formula (2).
[화학식 2][Formula 2]
Figure PCTKR2014011291-appb-I000012
Figure PCTKR2014011291-appb-I000012
상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
Figure PCTKR2014011291-appb-I000013
이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
Figure PCTKR2014011291-appb-I000014
이다.
In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
Figure PCTKR2014011291-appb-I000013
X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
Figure PCTKR2014011291-appb-I000014
to be.
본 발명의 노볼락 에폭시 수지는 상기 화학식 2에서 R이 -CH2-이고, X는
Figure PCTKR2014011291-appb-I000015
또는 -CH3인 비스페놀 노볼락 에폭시 수지로, 동박적층판 제조시 작업성과 열적 특성 측면에서 바람직하다.
Novolak epoxy resin of the present invention in the formula 2 R is -CH 2- , X is
Figure PCTKR2014011291-appb-I000015
Or -CH 3 bisphenol novolac epoxy resin, which is preferable in view of workability and thermal properties in the production of copper-clad laminates.
최근 전자기기의 소형화, 고기능화 추세에 따른 동박적층판의 경박단소에 해당하는 기술적 요구 조건을 충족시키기 위한 연구가 활발히 진행되고 있으나, 흡습, 열팽창, 고온 안정성 등의 문제로 기술 개발이 더디어지고 있다. 이에, 본 발명에서는 제조된 노볼락 에폭시 수지의 중합도와 분자량을 특정범위로 조절할 경우, 낮은 점도를 가지면서 내흡습성과 고온(280℃ 이상)에서의 열적 안정성을 크게 향상시킬 수 있음을 확인하고, 본 발명을 완성하게 되었다.Recently, researches to meet the technical requirements corresponding to the thin and thin sections of copper-clad laminates according to the trend of miniaturization and high functionalization of electronic devices have been actively conducted, but technology development has been delayed due to problems such as moisture absorption, thermal expansion, and high temperature stability. Thus, in the present invention, when the polymerization degree and molecular weight of the prepared novolak epoxy resin is adjusted to a specific range, it has been confirmed that it can significantly improve the hygroscopicity and thermal stability at high temperatures (above 280 ℃) while having a low viscosity, The present invention has been completed.
보다 구체적으로, 화학식 2로 표시되는 노볼락 에폭시 수지의 합성 과정에서는 n=0에서 n=5까지의 화합물이 약 9 중량% 이상 포함되는 것이 일반적이지만, 본 발명에서는 단량체 2개만이 중합된 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 포함되지 않으면서, 중량평균분자량이 700 내지 5,000g/mol인 것으로 함으로써, 동일한 중량평균분자량을 가진 종래의 노볼락 에폭시 수지에 비교할 때, 내흡습성, 열적 안정성 및 경화밀도를 크게 향상시킬 수 있는 것이다.More specifically, in the process of synthesizing the novolac epoxy resin represented by Formula 2, it is common to include about 9% by weight or more of the compound from n = 0 to n = 5, but in the present invention, n = Compared to the conventional novolak epoxy resin having the same weight average molecular weight, by including the content of the compound of 0 to 2.8% by weight or less, or with no weight average molecular weight of 700 to 5,000 g / mol, It is possible to greatly improve the hygroscopic resistance, thermal stability and curing density.
본 발명은 전술된 바와 같이, n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 또는 포함되지 않도록 하여 노볼락, 이미다졸, 아민계 등의 에폭시 경화제와 반응을 완료하여 비 가역적 망상구조를 형성하였을 경우, 상대적으로 미반응 수산기는 적게 생성되고 경화 밀도는 향상되고, 이에 따라 자유부피(Free volume)는 줄어들며, 경화제와의 상용성이 좋아져서 Micro-void의 생성을 억제시킬 수 있다.As described above, the present invention includes a non-reversible network by completing the reaction with an epoxy curing agent such as novolac, imidazole, amine, or the like with or without the content of a compound having n = 0 to 2.8% by weight or less. When the structure is formed, relatively unreacted hydroxyl groups are generated and the curing density is improved, thereby reducing the free volume and improving compatibility with the curing agent, thereby suppressing microvoid production. .
또한, 본 발명의 노볼락 에폭시 수지는 최종 경화물에서 요구되는 경화밀도 개선을 위한 분자 내 평균 작용기 수의 향상과, 고분자 영역을 포함하지 않고 고내열성을 달성할 수 있으며, 이에 따른 동박적층판(Copper Clad Laminate; CCL) 제조시 발생하는 Micro-void의 생성을 억제시킬 수 있는 동시에, 우수한 내흡습성과 고온(280℃ 이상)에서의 높은 열적 안정성을 나타낼 수 있다.In addition, the novolac epoxy resin of the present invention can achieve the improvement of the average number of functional groups in the molecule for improving the curing density required in the final cured product and high heat resistance without including the polymer region, thereby copper foil laminated plate (Copper) It is possible to suppress the generation of micro-void generated during the production of clad laminate (CCL), and to exhibit excellent hygroscopic resistance and high thermal stability at high temperature (above 280 ° C).
이때, 본 발명의 노볼락 에폭시 수지는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 포함되지 않도록 함과 동시에 다분산 지수(Polydispersity index; PDI)가 1.0 내지 3.0인 것이 바람직한데, PDI가 1.0 내지 3.0으로 함으로써, 수지의 바니쉬 배합시 상용성 및 유리섬유에 대한 젖음성을 향상시킬 수 있다. 상기 PDI는 1에 근접하는 수준으로 낮을수록 수지의 상용성 및 유리섬유에 대한 젖음성을 더욱 우수하게 할 수 있다.At this time, the novolak epoxy resin of the present invention preferably contains or does not contain the content of the compound of n = 0 to 2.8% by weight or less and at the same time polydispersity index (PDI) of 1.0 to 3.0 is preferred When PDI is 1.0 to 3.0, the compatibility and wettability with respect to the glass fiber can be improved at the time of varnish blending of the resin. The lower the PDI is to a level close to 1, the more excellent the compatibility of the resin and the wettability to the glass fiber.
또한, 본 발명의 노볼락 에폭시 수지는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 또는 포함되지 않으면서, 중량평균분자량이 700 내지 5,000g/mol인 것으로 하고, PDI가 1.0 내지 3.0인 것과 동시에, 160℃에서의 용융점도가 30 내지 3,000cps인 것이 바람직한데, 점도가 30cps 이상으로 함으로써, 기재에 함침 또는 도포된 수지가 흘러내리는 것을 방지할 수 있고, 점도가 3,000cps 이하로 함으로써, 높은 점도로 인한 작업성의 저하 없이 기재에 함침 또는 도포가 가능하도록 할 수 있다.In addition, the novolak epoxy resin of the present invention is a weight average molecular weight of 700 to 5,000 g / mol with or without the content of the compound of n = 0 or less 2.8% by weight, PDI is 1.0 It is preferable that the melt viscosity at 160 ° C is 30 to 3,000 cps and the viscosity is 30 cps or more, and the resin impregnated or applied to the substrate can be prevented from flowing down, and the viscosity is 3,000 cps or less. By doing so, the substrate can be impregnated or applied without deterioration of workability due to high viscosity.
또한, 본 발명의 노볼락 에폭시 수지는 n=0인 화합물의 함량을 2.8중량% 이하로 포함시키거나, 또는 포함되지 않으면서, 중량평균분자량이 700 내지 5,000g/mol인 것으로 하고, PDI 1.0 내지 3.0인 것과 동시에, 연화점이 40℃ 이상으로 함으로써, 수지가 블로킹(blocking)되는 현상 즉, 여름철 등과 같이, 온도 내지 습도가 높은 환경에서 덩어리가 되는 현상을 막을 수 있고, 높은 내열성을 확보할 수 있으며, 130℃이하로 함으로써, 수지의 용융이 용이하여 작업성을 좋게 할 수 있는 것이다.In addition, the novolak epoxy resin of the present invention is a weight average molecular weight of 700 to 5,000 g / mol with or without the content of the compound of n = 0 to 2.8% by weight or less, PDI 1.0 to At the same time, the softening point of 40 ° C or higher prevents the blocking of the resin, that is, the phenomenon of agglomeration in a high temperature to high humidity environment such as in summer, and ensures high heat resistance. By setting it as 130 degrees C or less, melting of resin is easy and workability can be improved.
본 발명은 다른 관점에서, (a) 노볼락계 중합체와 에피클로하이드린 단량체를 염기성 촉매하에서 중/축합반응시키고, 축합수 및 생성된 염을 제거하여 하기 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 합성하는 합성단계; (b) 상기 합성단계로부터 수득된, 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및 (c) 상기 가열단계로부터 용융된, 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 고진공 증류장치로 투입하여 화학식 2에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 에폭시 수지의 제조방법에 관한 것이다.In another aspect of the present invention, (a) a novolak-based polymer and epiclohydrin monomers under a basic catalyst in a poly / condensation reaction, and remove the condensation water and the salt formed by the integer of n = 0 to 5 in the formula Synthesis step of synthesizing a novolac epoxy resin comprising a compound represented by; (b) a heating step of heating and melting a novolak epoxy resin obtained from the synthesis step, the compound represented by an integer of n = 0 to 5 in Formula 2, above a softening point; And (c) a novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in Chemical Formula 2, melted from the heating step, into a high vacuum distillation apparatus to give 2.8 weight of a compound having n = 0 in Chemical Formula 2. It relates to a method for producing a novolak epoxy resin comprising an extraction step to remove to less than or completely removed.
[화학식 2][Formula 2]
Figure PCTKR2014011291-appb-I000016
Figure PCTKR2014011291-appb-I000016
상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
Figure PCTKR2014011291-appb-I000017
이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
Figure PCTKR2014011291-appb-I000018
이다.
In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
Figure PCTKR2014011291-appb-I000017
X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
Figure PCTKR2014011291-appb-I000018
to be.
본 발명의 화학식 2에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 2에서 n=0인 화합물을 포함하지 않는 것을 특징으로 하는 노볼락 에폭시 수지를 제조하는 방법은 다음과 같다. Method of producing a novolak epoxy resin, characterized in that containing less than 2.8% by weight of the compound of n = 0 in the formula (2), or does not contain a compound of n = 0 in the formula (2) is as follows.
본 발명에 따른 에폭시 수지의 제조방법은 페놀 노볼락계 중합체와 에피클로로하이드린 단량체를 염기성 촉매하에서 중/축합반응시키고, 여기서 생성된 축합수를 제거함으로써 화학식 2로 표시되는 반복단위의 화합물을 포함하는 에폭시 수지를 합성한다.The method for producing an epoxy resin according to the present invention includes a compound of a repeating unit represented by the formula (2) by performing a poly / condensation reaction of a phenol novolak-based polymer and an epichlorohydrin monomer under a basic catalyst and removing the condensation water produced therein. An epoxy resin is synthesized.
이와 같이, 합성단계에서 얻은 화학식 2로 표시되는 반복단위의 화합물 중, n=0인 화합물을 2.8중량% 이하로 포함하게 분리시키기 위해, 화학식 2로 표시되는 반복단위의 화합물을 포함하는 에폭시 수지를 연화점 이상으로 가열하여 용융시키고, 용융된 화합물을 특정 조건으로 설정된 고진공 증류장치에 투입하여, 화학식 2에서 n=0인 화합물을 2.8중량% 이하로 분리시키는 추출단계를 포함한다.In this way, in order to separate the compound of the repeating unit represented by the formula (2) obtained in the synthesis step to include less than 2.8% by weight of the compound of n = 0, an epoxy resin containing the compound of the repeating unit represented by the formula (2) It is heated to a softening point or more, and the molten compound is put into a high vacuum distillation apparatus set to a specific condition, and the extraction step of separating the compound of n = 0 in the formula (2) to 2.8% by weight or less.
본 발명에 있어서, 에폭시 수지의 합성단계는 에폭시 수지를 합성할 수 있는 방법이면, 제한 없이 사용 가능하고, 바람직하게는 염기성 촉매하에서 페놀 노볼락계 중합체와 에피클로로하이드린 단량체의 중/축합반응으로 수행할 수 있다. 이때, 중/축합반응시간은 2 내지 6시간 동안 수행할 수 있다.In the present invention, the step of synthesizing the epoxy resin can be used without limitation as long as it is a method capable of synthesizing the epoxy resin, and preferably, by the poly / condensation reaction of the phenol novolak-based polymer and the epichlorohydrin monomer under a basic catalyst. Can be done. At this time, the polycondensation reaction time may be performed for 2 to 6 hours.
상기 염기성 촉매는 수산화나트륨(NaOH)이 바람직하게 사용될 수 있으며, 촉매로 사용되는 수산화나트륨은 30 내지 60중량% 농도인 것이 제조된 수지의 변색, 부산물 생성 최소화 및 반응속도에 있어서 적합하고, 페놀 노볼락계 중합체, 에피클로로하이드린 단량체 및 염기성 촉매는 몰비로서 1:3.5~5.5몰: 0.9~1.5몰 범위로 사용하는 것이 적합하다.Sodium hydroxide (NaOH) may be preferably used as the basic catalyst, and sodium hydroxide used as the catalyst is suitable for discoloration, minimization of by-product generation, and reaction rate of a resin prepared at a concentration of 30 to 60 wt%, and a phenol furnace. It is preferable to use the rockac polymer, the epichlorohydrin monomer and the basic catalyst in a molar ratio of 1: 3.5 to 5.5 mol: 0.9 to 1.5 mol.
합성 완료 후, 합성된 에폭시 수지는 고진공 증류장치에 용이하게 투입되도록 연화점 이상으로 가열하여 용융시킨다. 이때, 페놀 에폭시 수지의 연화점은 에폭시 수지에 따라 상이하나, 대체적으로 40 내지 80℃이다. 이상 또는 이하의 연화점은 METTLER TOLEDO사의 FP90 기기를 이용하여 2/min.의 승온 속도로 측정하였다.After the synthesis is completed, the synthesized epoxy resin is heated and melted above the softening point so as to be easily introduced into a high vacuum distillation apparatus. At this time, the softening point of the phenol epoxy resin is different depending on the epoxy resin, but is generally 40 to 80 ℃. Softening points above or below were measured at a temperature rise rate of 2 / min. Using a FP90 instrument from METTLER TOLEDO.
이와 같이, 용융된 화학식 2로 표시되는 반복단위의 화합물을 포함하는 에폭시 수지는 고진공 증류장치로 투입되고, 투입된 화학식 2로 표시되는 반복단위의 화합물을 포함하는 에폭시 수지에서 n=0인 화합물을 분리시킬 수 있도록 고진공 증류장치의 본체의 온도 및 압력은 적절히 설정한다. 이때, 고진공 증류장치의 상기 온도 및 압력은 각각 200 내지 280℃ 및 0.001 내지 0.5mbar로, 고진공 증류장치의 온도가 200℃미만인 경우, n=0 에폭시 수지의 분리 효율이 낮아지는 문제점이 있고, 280℃를 초과하는 경우에는 고온에 의한 에폭시 수지의 열변형이나 열화에 따른 문제점이 있으며, 0.001mbar 미만인 경우에는 n=1 이상의 고분자 영역이 같이 분리되는 문제점이 있고, 0.5mbar를 초과하는 경우에는 n=0 에폭시 수지의 분리 효율이 낮아지는 문제점이 있다.As such, the epoxy resin containing the molten repeating compound represented by the formula (2) is introduced into a high vacuum distillation apparatus, and the compound of n = 0 is separated from the epoxy resin containing the compound of the repeating unit represented by the formula (2). The temperature and pressure of the main body of the high vacuum distillation apparatus can be set appropriately. At this time, the temperature and pressure of the high vacuum distillation apparatus is 200 to 280 ℃ and 0.001 to 0.5 mbar, respectively, when the temperature of the high vacuum distillation apparatus is less than 200 ℃, there is a problem that the separation efficiency of n = 0 epoxy resin is lowered, 280 If it exceeds C, there is a problem due to thermal deformation or deterioration of the epoxy resin due to high temperature, if less than 0.001 mbar, there is a problem that n = 1 or more polymer regions are separated together, if n = more than 0.5 mbar 0 There is a problem that the separation efficiency of the epoxy resin is lowered.
이와 같은 본 발명에 따른 노볼락 에폭시 수지의 제조방법은 저점도이면서 고온에서의 열적 안정성과 내흡습성이 우수한 노볼락 에폭시 수지를 제조된 수지의 중합도와 분자량 제어를 통해 용이하고 간편하게 제조할 수 있다.Such a method for producing a novolac epoxy resin according to the present invention can be easily and simply produced through the polymerization degree and molecular weight control of the produced resin, a low viscosity, excellent thermal stability and high moisture resistance at high temperatures.
본 발명은 또 다른 관점에서, 상기 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물 및 상기 에폭시 수지 조성물의 경화물에 관한 것이다.This invention relates to the epoxy resin composition containing the said novolak epoxy resin, and the hardened | cured material of the said epoxy resin composition from another viewpoint.
본 발명에 따른 에폭시 수지 조성물은 중합도와 분자량이 조절된 노볼락 에폭시 수지를 포함함으로써, 종래 에폭시 수시 조성물에 비해 좋은 용제 용해성을 가지면서 보다 향상된 고온에서의 열적 안정성과 내흡습성을 균형있게 구현할 수 있다. The epoxy resin composition according to the present invention includes a novolak epoxy resin having a controlled degree of polymerization and a molecular weight, thereby achieving a good solvent solubility compared to conventional epoxy temporary compositions, and achieving improved thermal stability and hygroscopic resistance at a higher temperature. .
본 발명에 따른 에폭시 수지 조성물은 열적 안정성, 흡습성, 점도 등을 고려하여 조성물 총 중량에 대하여, 노볼락 에폭시 수지를 5 내지 95 중량%로 포함시킬 수 있다. 만약, 상기 노볼락 에폭시 수지가 조성물 전체 중량에 대하여, 5 중량% 미만으로 첨가될 경우, 그 효과가 미비하고, 95 중량%를 초과하여 첨가되는 경우에는 부착 특성 등이 저하될 수 있다.The epoxy resin composition according to the present invention may include 5 to 95% by weight of novolak epoxy resin, based on the total weight of the composition in consideration of thermal stability, hygroscopicity, viscosity, and the like. If the novolac epoxy resin is added in an amount of less than 5% by weight based on the total weight of the composition, the effect is insignificant, and when it is added in excess of 95% by weight, adhesion characteristics may be lowered.
본 발명에 따른 에폭시 수지 조성물은 고온에서의 치수 안정성, 내열성, 내흡습성 등을 만족하면서, 우수한 수지의 흐름성을 가져 인쇄회로기판에 사용되는 동박적층판이나 전자부품에 사용되는 밀봉재, 성형재, 주형재, 접착제, 전기절연도료용 재료 등에 적합한 특성을 균형있게 구현할 수 있는 경화물을 제공할 수 있다.The epoxy resin composition according to the present invention satisfies dimensional stability at high temperature, heat resistance, hygroscopicity, and the like, and has excellent flowability of resin, sealing materials, molding materials, and molds used for copper-clad laminates and electronic components used in printed circuit boards. It is possible to provide a cured product capable of achieving a balance of properties suitable for materials, adhesives, materials for electrical insulating coating, and the like.
이하, 본 발명을 실시예에 의거 상세히 설명하면 다음과 같은바, 본 발명이 이들 실시예에 의해 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by these Examples.
1. 노볼락 수지 제조1. Manufacture of novolac resin
<비교예 1-1: 비스페놀 노볼락 수지 제조(n=0이 20.23중량%임)> <Comparative Example 1-1: Bisphenol Novolak Resin Manufacture (n = 0 is 20.23 wt%)>
원료인 비스페놀-A 단량체 3,200g과 물에 40 중량% 농도로 함유되어 있는 포름알데히드 1,600g을 5L 4구 플라스크에 투입한 다음, 60℃로 가열하여 30분간 교반하여 충분히 혼합하였다. 혼합된 원료에 촉매로서 옥살산 11g을 투입한 다음, 100℃로 승온하여 3시간 동안 반응시키고, 이 반응이 완료된 후 760mmHg에서 축합수를 제거함으로써 비스페놀 A 노볼락 수지(화학식 1에서, R는 -CH2-이고, X는 -C(CH3)2C6H4OH임)를 합성하였다.3,200 g of the raw material bisphenol-A monomer and 1,600 g of formaldehyde contained in a 40 wt% concentration in water were added to a 5 L four-neck flask, heated to 60 ° C., stirred for 30 minutes, and mixed well. 11 g of oxalic acid was added to the mixed raw materials as a catalyst, and then heated to 100 ° C. and reacted for 3 hours. After completion of the reaction, the condensed water was removed at 760 mmHg, whereby bisphenol A novolac resin (In Formula 1, R is -CH 2 -and X is -C (CH 3 ) 2 C 6 H 4 OH).
<비교예 1-2: 비스페놀 노볼락 수지 제조(n=0이 13.08중량%임)><Comparative Example 1-2: Preparation of Bisphenol Novolak Resin (n = 0 is 13.08 wt%)>
비교예 1-1에서 수득된 비스페놀 A 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 200℃이고, 압력이 1.7mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 수지를 제조하였다.The bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 200 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
<비교예 1-3: 비스페놀 노볼락 수지 제조(n=0이 8.13중량%임)>Comparative Example 1-3: Preparation of Bisphenol Novolac Resin (n = 0 is 8.13% by Weight)>
비교예 1-1에서 수득된 비스페놀 A 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 245℃이고, 압력이 1.7mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 수지를 제조하였다.The bisphenol A novolak resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
<비교예 1-4: 비스페놀 노볼락 수지 제조(n=0이 2.89중량%임)><Comparative Example 1-4: Preparation of bisphenol novolak resin (n = 0 is 2.89 wt%)>
비교예 1-1에서 수득된 비스페놀 A 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 245℃이고, 압력이 1.7mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 수지를 제조하였다.The bisphenol A novolak resin obtained in Comparative Example 1-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.7 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
<실시예 1-1: 비스페놀 노볼락 수지 제조(n=0이 2.80중량%임)><Example 1-1: Preparation of bisphenol novolak resin (n = 0 is 2.80 wt%)>
비교예 1-1에서 수득된 비스페놀 A 노볼락 수지를 180℃로 가열하여 용융상태로 만든 뒤, 온도가 255℃이고, 압력이 1.25mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 수지를 제조하였다.The bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 180 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 1.25 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
<실시예 1-2: 비스페놀 노볼락 수지 제조(n=0이 0.51중량%임)><Example 1-2: Preparation of Bisphenol Novolak Resin (n = 0 is 0.51 wt%)>
비교예 1-1에서 수득된 비스페놀 A 노볼락 수지를 180℃로 가열하여 용융상태로 만든 뒤, 온도가 260℃이고, 압력이 1.20mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 수지를 제조하였다. The bisphenol A novolac resin obtained in Comparative Example 1-1 was heated to 180 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 1.20 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac resin.
<비교예 2-1: 페놀 노볼락 수지 제조(n=0이 22중량%임)> <Comparative Example 2-1: Preparation of phenol novolak resin (n = 0 is 22% by weight)>
원료인 페놀 3200g과 물에 40중량% 농도로 포함되어 있는 포름알데히드 1600g을 5L 4구 플라스크에 투입한 후 60℃로 가열하여 30분간 교반하여 충분히 혼합한 후, 혼합된 원료에 촉매로서 옥살산 11g을 투입한 뒤 100℃로 승온하여 3시간 동안 반응시키고, 이 반응이 완료된 후 760mmHg에서 축합수를 제거함으로써 페놀 노볼락 수지(화학식 1에서, R는 -CH2-이고, X는 -H임)를 제조하였다.3200 g of raw material phenol and 1600 g of formaldehyde contained in a concentration of 40% by weight in water were added to a 5L four-necked flask, heated to 60 ° C, stirred for 30 minutes, and thoroughly mixed. 11 g of oxalic acid was used as a catalyst in the mixed raw materials. After the addition, the reaction mixture was heated at 100 ° C. for 3 hours, and after the reaction was completed, phenol novolak resin (in Formula 1, R is —CH 2 — and X is —H) by removing condensed water at 760 mmHg. Prepared.
<비교예 2-2: 페놀 노볼락 수지 제조(n=0이 7.1중량%임)><Comparative Example 2-2: Preparation of phenol novolak resin (n = 0 is 7.1 wt%)>
비교예 2-1에서 얻어진 페놀 노볼락 수지를 160℃로 가열하여 용융상태로 만든 뒤, 온도가 240℃, 압력이 1.7mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 2-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.7 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<비교예 2-3: 페놀 노볼락 수지 제조(n=0이 4.5중량%임)><Comparative Example 2-3: Preparation of phenol novolak resin (n = 0 is 4.5 wt%)>
비교예 2-1에서 얻어진 페놀 노볼락 수지를 160℃로 가열하여 용융상태로 만든 뒤, 온도가 235℃, 압력이 1.55mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 2-1 was heated to 160 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 235 ° C. and a pressure of 1.55 mbar, and operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<실시예 2-1: 페놀 노볼락 수지 제조(n=0이 2.3중량%임)><Example 2-1: Preparation of phenol novolak resin (n = 0 is 2.3% by weight)>
비교예 2-1에서 얻어진 페놀 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 240℃, 압력이 1.50mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.50 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<실시예 2-2: 페놀 노볼락 수지 제조(n=0이 0.7중량%임)><Example 2-2: Preparation of phenol novolak resin (n = 0 is 0.7% by weight)>
비교예 2-1에서 얻어진 페놀 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 240℃, 압력이 1.45mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.45 mbar, and operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<실시예 2-3: 페놀 노볼락 수지 제조(n=0이 0.1중량%임)><Example 2-3: Preparation of phenol novolak resin (n = 0 is 0.1% by weight)>
비교예 2-1에서 얻어진 페놀 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 240℃, 압력이 1.40mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 2-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.40 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<비교예 3-1: 페놀 노볼락 수지 제조(n=0이 12.7중량%임)> <Comparative Example 3-1: Preparation of phenol novolak resin (n = 0 is 12.7 wt%)>
원료인 페놀 3200g과 물에 40중량% 농도로 포함되어 있는 포름알데히드 1800g을 5L 4구 플라스크에 투입한 후 60℃로 가열하여 30분간 교반하여 충분히 혼합한 후, 혼합된 원료에 촉매로서 옥살산 11g을 투입한 뒤 100℃로 승온하여 3시간 동안 반응시키고, 이 반응이 완료된 후 760mmHg에서 축합수를 제거함으로써 페놀 노볼락 수지(화학식 1에서, R는 -CH2-이고, X는 -H임)를 합성하였다.3200 g of raw material phenol and 1800 g of formaldehyde contained in a concentration of 40% by weight in water were added to a 5L four-necked flask, heated to 60 ° C, stirred for 30 minutes, and thoroughly mixed. 11 g of oxalic acid was used as a catalyst in the mixed raw materials. After the addition, the reaction mixture was heated at 100 ° C. for 3 hours, and after the reaction was completed, phenol novolak resin (in Formula 1, R is —CH 2 — and X is —H) by removing condensed water at 760 mmHg. Synthesized.
<비교예 3-2: 페놀Comparative Example 3-2: Phenol 노볼락 수지 제조(n=0이 9.9중량%임)>Novolak Resin Preparation (n = 0 is 9.9 wt%)>
비교예 3-1에서 얻어진 페놀 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 245℃, 압력이 1.70mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 3-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 245 ° C. and a pressure of 1.70 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<비교예 3-3: 페놀 노볼락 수지 제조(n=0이 4.1중량%임)><Comparative Example 3-3: Preparation of phenol novolak resin (n = 0 is 4.1 wt%)>
비교예 3-1에서 얻어진 페놀 노볼락 수지를 170℃로 가열하여 용융상태로 만든 뒤, 온도가 240℃, 압력이 1.60mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.Phenolic obtained in Comparative Example 3-1 The novolak resin was heated to 170 ° C. to make it molten, and then put into a high vacuum distillation apparatus (VTA, Germany) at a temperature of 240 ° C. and a pressure of 1.60 mbar, and operated for 60 minutes. The phenol novolak resin was prepared by removing the molecular weight component.
<실시예 3-1: 페놀Example 3-1: Phenol 노볼락 수지 제조(n=0이 0.9중량%임)>Novolak Resin Preparation (n = 0 is 0.9 wt%)>
비교예 3-1에서 얻어진 페놀 노볼락 수지를 180℃로 가열하여 용융상태로 만든 뒤, 온도가 250℃, 압력이 0.25mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The phenol novolak resin obtained in Comparative Example 3-1 was heated to 180 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.25 mbar, and then operated for 60 minutes. Then, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<실시예 3-2: 페놀 노볼락 수지 제조(n=0이 0.1중량%임)><Example 3-2: Preparation of phenol novolak resin (n = 0 is 0.1% by weight)>
비교예 3-1에서 얻어진 노볼락 수지를 180℃로 가열하여 용융상태로 만든 뒤, 온도가 250℃, 압력이 0.15mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 수지를 제조하였다.The novolak resin obtained in Comparative Example 3-1 was heated to 180 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.15 mbar, and operated for 60 minutes. Next, the low molecular weight component contained in the resin was removed to prepare a phenol novolak resin.
<비교예 4-1: 비스페놀 노볼락 수지 제조(n=0이 15.44중량%임)> <Comparative Example 4-1: Preparation of bisphenol novolak resin (n = 0 is 15.44 wt%)>
원료인 비스페놀-A 단량체 3200g과 물에 40중량% 농도로 포함되어 있는 포름알데히드 1800g을 5L 4구 플라스크에 투입한 후 60℃로 가열하여 30분간 교반하여 충분히 혼합한 후, 혼합된 원료에 촉매로서 옥살산 11g을 투입한 뒤 100℃로 승온하여 3시간 동안 반응시키고, 이 반응이 완료된 후 760mmHg에서 축합수를 제거함으로써 비스페놀 노볼락 수지(화학식 1에서, R는 -CH2-이고, X는 -C(CH3)2C6H4OH임)를 제조하였다.3200 g of raw material bisphenol-A monomer and 1800 g of formaldehyde contained in a 40 wt% concentration in water were added to a 5 L four-neck flask, heated to 60 ° C., stirred for 30 minutes, and sufficiently mixed. 11 g of oxalic acid was added and reacted for 3 hours by raising the temperature to 100 ° C., and after the reaction was completed, the condensed water was removed at 760 mmHg (In formula 1, R is -CH 2 -and X is -C. (CH 3 ) 2 C 6 H 4 OH).
<비교예 5-1: 페놀 노볼락 수지 제조(n=0이 5.53중량%임)> <Comparative Example 5-1: Preparation of phenol novolak resin (n = 0 is 5.53 wt%)>
원료인 페놀을 3200g과 물에 40중량% 농도로 포함되어 있는 포름알데히드 1800g을 5L 4구 플라스크에 투입한 후 60℃로 가열하여 30분간 교반하여 충분히 혼합한 후, 혼합된 원료에 촉매로서 옥살산 11g을 투입한 뒤 100℃로 승온하여 3시간 동안 반응시키고, 이 반응이 완료된 후 760mmHg에서 축합수를 제거함으로써 페놀 노볼락 수지(화학식 1에서, R는 -CH2-이고, X는 -H임)를 제조하였다.1200 g of formaldehyde containing 3200 g of phenol as a raw material and 40% by weight of water was added to a 5L four-necked flask, heated to 60 ° C, stirred for 30 minutes, sufficiently mixed, and then 11 g of oxalic acid as a catalyst to the mixed raw material. After the reaction was heated to 100 ℃ and reacted for 3 hours, after completion of the reaction by removing the condensed water at 760mmHg phenol novolak resin (In Formula 1, R is -CH 2- , X is -H) Was prepared.
2. 노볼락 에폭시 수지 제조2. Manufacture of novolac epoxy resin
<비교예 6-1> 비스페놀 노볼락 에폭시 수지 제조(n=0이 18.56중량%임)<Comparative Example 6-1> Preparation of bisphenol novolac epoxy resin (n = 0 is 18.56 wt%)
비스페놀 A 단량체 1000g와 포르말린(40% 수용액) 230g에 옥살산 3.5g을 첨가하여, 3시간 동안 환류 반응시킨 다음, 온도를 150℃까지 승온하여 물을 탈기하고, 30Torr 이하로 진공 탈기하여 연화점이 117℃인 비스페놀 A 수지를 얻었다. 상기 얻어진 비스페놀 A 수지 500g 및 에피클로로하이드린 1600g을 5L 4구 플라스크에 투입하여 충분히 혼합하고, 80℃에서 NaOH 360g(농도 40중량%)을 2시간 동안 균일 적하한 다음, 미반응된 에피클로하이드린을 진공 탈기하여 완전히 제거하고 MIBK를 투입하여 희석하였다. 반응 종료 후 MIBK 탈기 공정을 거쳐 비스페놀 A 노볼락 에폭시 수지(화학식 2에서, R는 -CH2- 이고, X는
Figure PCTKR2014011291-appb-I000019
임)를 합성하였다.
1000 g of bisphenol A monomer and 230 g of formalin (40% aqueous solution) were added to 3.5 g of oxalic acid, and the mixture was refluxed for 3 hours. The temperature was raised to 150 ° C. to degas the water, and vacuum degassing was carried out to 30 Torr or less. Phosphorus bisphenol A resin was obtained. 500 g of the obtained bisphenol A resin and 1600 g of epichlorohydrin were added to a 5 L four-necked flask, and the mixture was sufficiently mixed. Then, 360 g of NaOH (concentration of 40% by weight) was added dropwise at 80 ° C. for 2 hours, and then unreacted epichloro high The derin was completely removed by vacuum degassing and diluted with MIBK. After completion of the reaction, a bisphenol A novolac epoxy resin (wherein R is -CH 2 -and X is
Figure PCTKR2014011291-appb-I000019
Lim) was synthesized.
이와 같이 합성된 비스페놀 A 노볼락 에폭시 수지의 중합도를 측정하기 위해 겔 침투 크로마토그래피(GPC)를 측정하였다(도 2). Gel permeation chromatography (GPC) was measured to measure the degree of polymerization of the bisphenol A novolac epoxy resin thus synthesized (FIG. 2).
<비교예 6-2> 비스페놀 노볼락 에폭시 수지 제조(n=0이 8.7중량%임)Comparative Example 6-2 Bisphenol Novolac Epoxy Resin Manufacture (n = 0 is 8.7 wt%)
비교예 6-1에서 수득된 비스페놀A 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 215℃, 압력이 1.51mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 215 ° C. and a pressure of 1.51 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<비교예 6-3> 비스페놀 노볼락 에폭시 수지 제조(n=0이 6.8중량%임)<Comparative Example 6-3> Preparation of bisphenol novolac epoxy resin (n = 0 is 6.8 wt%)
비교예 6-1에서 수득된 비스페놀A 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 195℃, 압력이 0.51mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 195 ° C. and a pressure of 0.51 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<실시예 4-1> 비스페놀 노볼락 에폭시 수지 제조(n=0이 2.8중량%임)Example 4-1 Preparation of Bisphenol Novolac Epoxy Resin (n = 0 is 2.8 wt%)
비교예 6-1에서 수득된 비스페놀A 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.50mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.50 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
이와 같이 합성된 비스페놀 A 노볼락 에폭시 수지의 중합도를 측정하기 위해 겔 침투 크로마토그래피(GPC)를 측정하였다(도 3). Gel permeation chromatography (GPC) was measured to measure the polymerization degree of the bisphenol A novolac epoxy resin thus synthesized (FIG. 3).
<실시예 4-2> 비스페놀 노볼락 에폭시 수지 제조(n=0이 1.3중량%임)Example 4-2 Preparation of Bisphenol Novolac Epoxy Resin (n = 0 is 1.3 wt%)
비교예 6-1에서 수득된 비스페놀A 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.15mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 6-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.15 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<비교예 7-1> 비스페놀 노볼락 에폭시 수지 제조(n=0이 13.5중량%임)Comparative Example 7-1 Bisphenol Novolac Epoxy Resin Manufacture (n = 0 is 13.5 wt%)
비스페놀 A 단량체 1000g와 포르말린(40% 수용액) 250g에 옥살산 3.5g을 첨가하여, 3시간 동안 환류 반응시킨 다음, 온도를 150℃까지 승온하여 물을 탈기하고, 30Torr 이하로 진공 탈기하여 연화점이 117℃인 비스페놀 A 수지를 얻었다. 상기 얻어진 비스페놀 A 수지 500g 및 에피클로로하이드린 1600g을 5L 4구 플라스크에 투입하여 충분히 혼합하고, 80℃에서 NaOH 360g(농도: 40wt%)을 2시간 동안 균일 적하한 다음, 미반응된 에피클로하이드린을 진공 탈기하여 완전히 제거하고 MIBK를 투입하여 희석하였다. 반응 종료 후 MIBK 탈기 공정을 거쳐 비스페놀 A 노볼락 에폭시 수지(화학식 2에서, R는 -CH2- 이고, X는
Figure PCTKR2014011291-appb-I000020
임)를 합성하였다.
1000 g of bisphenol A monomer and 250 g of formalin (40% aqueous solution) were added to 3.5 g of oxalic acid, and the mixture was refluxed for 3 hours. The temperature was raised to 150 ° C. to degas the water, and vacuum degassing was carried out to 30 Torr or less. Phosphorus bisphenol A resin was obtained. 500 g of the obtained bisphenol A resin and 1600 g of epichlorohydrin were added to a 5 L four-necked flask, and the mixture was sufficiently mixed, and 360 g of NaOH (concentration: 40 wt%) was uniformly added dropwise at 80 ° C. for 2 hours, followed by unreacted epichlorohi The derin was completely removed by vacuum degassing and diluted with MIBK. After completion of the reaction, a bisphenol A novolac epoxy resin (wherein R is -CH 2 -and X is
Figure PCTKR2014011291-appb-I000020
Lim) was synthesized.
<실시예 5-1> 비스페놀 노볼락 에폭시 수지 제조(n=0이 2.6중량임)<Example 5-1> Bisphenol novolac epoxy resin preparation (n = 0 being 2.6 weight)
비교예 7-1에서 수득된 비스페놀 A 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 250℃, 압력이 0.40mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 160 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.40 mbar, 60 After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<실시예 5-2> 비스페놀 노볼락 에폭시 수지 제조(n=0이 1.1중량%임) Example 5-2 Preparation of Bisphenol Novolac Epoxy Resin (n = 0 is 1.1 wt%)
비교예 7-1에서 수득된 비스페놀 A 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 250℃, 압력이 0.30mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.30 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<실시예 5-3> 비스페놀 노볼락 에폭시 수지 제조(n=0이 0.5중량%임) Example 5-3 Preparation of Bisphenol Novolac Epoxy Resin (n = 0 at 0.5 wt%)
비교예 7-1에서 수득된 비스페놀 A 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.15mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 비스페놀 A 노볼락 에폭시 수지를 제조하였다.The bisphenol A novolac epoxy resin obtained in Comparative Example 7-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.15 mbar. After operating for minutes, the low molecular weight component contained in the resin was removed to prepare a bisphenol A novolac epoxy resin.
<비교예 8-1> 페놀 노볼락 에폭시 수지 제조(n=0이 23.07중량%임)<Comparative Example 8-1> Preparation of phenol novolac epoxy resin (n = 0 is 23.07 wt%)
페놀 노볼락 수지(코오롱인더스트리(주) KPE-F2000, 연화점 78) 500g 및 에피클로로하이드린 1600g을 5L 4구 플라스크에 투입하여 충분히 혼합하고, 80℃에서 NaOH 360g을 2시간 동안 균일 적하한 다음, 미반응된 에피클로하이드린을 진공 탈기하여 완전히 제거하고 MIBK를 투입하여 희석하였다. 반응 종료 후 MIBK 탈기 공정을 거쳐 페놀 노볼락 에폭시 수지(화학식 2에서, R는 -CH2- 이고, X는 -H임)를 합성하였다.500 g of phenol novolak resin (KOLON INDUSTRIAL Co., Ltd., KPE-F2000, softening point 78) and 1600 g of epichlorohydrin were added to a 5 L four-necked flask, and the mixture was sufficiently mixed, and 360 g of NaOH was uniformly added dropwise at 80 ° C. for 2 hours. Unreacted epiclohydrin was completely removed by vacuum degassing and diluted with MIBK. After completion of the reaction, a phenol novolak epoxy resin (in Formula 2, R is -CH 2 -and X is -H) was synthesized through a MIBK degassing step.
<비교예 8-2> 페놀 노볼락 에폭시 수지 제조(n=0이 9.39중량%임)<Comparative Example 8-2> Preparation of phenol novolac epoxy resin (n = 0 is 9.39% by weight)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 150℃로 가열하여 용융상태로 만든 다음, 온도가 190℃, 압력이 1.65mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 190 ° C. and a pressure of 1.65 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
<비교예 8-3> 페놀 노볼락 에폭시 수지 제조(n=0이 3.01중량%임)<Comparative Example 8-3> Preparation of phenol novolac epoxy resin (n = 0 is 3.01% by weight)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 150℃로 가열하여 용융상태로 만든 다음, 온도가 240℃, 압력이 1.75mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 240 ° C. and a pressure of 1.75 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
<실시예 6-1> 페놀 노볼락 에폭시 수지 제조(n=0이 2.8중량%임)<Example 6-1> Preparation of phenol novolac epoxy resin (n = 0 is 2.8 wt%)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 150℃로 가열하여 용융상태로 만든 다음, 온도가 250℃, 압력이 0.5mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 150 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 250 ° C. and a pressure of 0.5 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
이와 같이 합성된 페놀 노볼락 에폭시 수지의 중합도를 측정하기 위해 겔 침투 크로마토그래피(GPC)를 측정하였다(도 4). Gel permeation chromatography (GPC) was measured to measure the degree of polymerization of the phenol novolac epoxy resin thus synthesized (FIG. 4).
<실시예 6-2> 페놀 노볼락 에폭시 수지 제조(n=0이 2.3중량%임)<Example 6-2> Preparation of phenol novolac epoxy resin (n = 0 is 2.3% by weight)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.45mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.45 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
<실시예 6-3> 페놀 노볼락 에폭시 수지 제조(n=0이 1.10중량%임)<Example 6-3> Preparation of phenol novolac epoxy resin (n = 0 is 1.10 wt%)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 260℃, 압력이 0.3mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 0.3 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
<실시예 6-4> 페놀 노볼락 에폭시 수지 제조(n=0이 0.01중량%임)<Example 6-4> Preparation of phenol novolac epoxy resin (n = 0 is 0.01% by weight)
비교예 8-1에서 수득된 페놀 노볼락 에폭시 수지를 160℃로 가열하여 용융상태로 만든 다음, 온도가 270℃, 압력이 0.15mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 페놀 노볼락 에폭시 수지를 제조하였다.The phenol novolac epoxy resin obtained in Comparative Example 8-1 was heated to 160 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 270 ° C. and a pressure of 0.15 mbar, followed by 60 minutes. After the operation, the phenol novolac epoxy resin was prepared by removing the low molecular weight component contained in the resin.
<비교예 9-1> 크레졸 노볼락 에폭시 수지 제조(n=0이 8.3중량%임)Comparative Example 9-1 Cresol Novolac Epoxy Resin Preparation (n = 0 is 8.3 wt%)
크레졸 노볼락 수지(코오롱인더스트리(주) KCE-F3113, 연화점 113℃) 500g 및 에피클로로하이드린 1600g을 5L 4구 플라스크에 투입하여 충분히 혼합하고, 80℃에서 NaOH 360g을 2시간 동안 균일 적하한 다음, 미반응된 에피클로하이드린을 진공 탈기하여 완전히 제거하고 MIBK를 투입하여 희석하였다. 반응 종료 후 MIBK 탈기 공정을 거쳐 크레졸 노볼락 에폭시 수지(화학식 2에서, R는 -CH2- 이고, X는 -CH3임)를 합성하였다.500 g of cresol novolac resin (KOLON INDUSTRIAL Co., Ltd., KCE-F3113, softening point 113 ° C) and 1600 g of epichlorohydrin were added to a 5 L four-necked flask, and the mixture was sufficiently mixed, and 360 g of NaOH was added dropwise at 80 ° C. for 2 hours. Unreacted epichlorohydrin was completely removed by vacuum degassing and diluted with MIBK. After completion of the reaction, a cresol novolac epoxy resin (in Formula 2, R is -CH 2 -and X is -CH 3 ) was synthesized through a MIBK degassing process.
<비교예 9-2> 크레졸 노볼락 에폭시 수지 제조(n=0이 6.6중량%임)Comparative Example 9-2 Cresol Novolac Epoxy Resin Manufacture (n = 0 is 6.6 wt%)
비교예 9-1에서 수득된 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 1.75mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 크레졸 노볼락 에폭시 수지를 제조하였다.The novolac epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 1.75 mbar, followed by 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
<비교예 9-3> 크레졸 노볼락 에폭시 수지 제조(n=0이 4.3중량%임)<Comparative Example 9-3> Manufacture of cresol novolac epoxy resin (n = 0 is 4.3% by weight)
비교예 9-1에서 수득된 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 195℃, 압력이 0.55mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 크레졸 노볼락 에폭시 수지를 제조하였다.The novolac epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be in a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 195 ° C. and a pressure of 0.55 mbar, for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
<비교예 9-4> 크레졸 노볼락 에폭시 수지 제조(n=0이 3.2중량%임)<Comparative Example 9-4> Cresol novolac epoxy resin (n = 0 is 3.2% by weight)
비교예 9-1에서 수득된 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.51mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 크레졸 노볼락 에폭시 수지를 제조하였다.The novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.51 mbar, followed by 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
<실시예 7-1> 크레졸 노볼락 에폭시 수지 제조(n=0이 2.8중량%임)Example 7-1 Cresol Novolac Epoxy Resin Preparation (n = 0 is 2.8 wt%)
비교예 9-1에서 수득된 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 255℃, 압력이 0.31mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 크레졸 노볼락 에폭시 수지를 제조하였다.The novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to a molten state, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 255 ° C. and a pressure of 0.31 mbar, for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
<실시예 7-2> 크레졸 노볼락 에폭시 수지 제조(n=0이 0.10중량%임)Example 7-2 Cresol Novolac Epoxy Resin Preparation (n = 0 is 0.10% by Weight)
비교예 9-1에서 수득된 노볼락 에폭시 수지를 170℃로 가열하여 용융상태로 만든 다음, 온도가 260℃, 압력이 0.15mbar로 설정된 고진공 증류장치(독일 VTA사)에 투입하고, 60분 동안 운전한 다음, 수지에 함유된 저분자량의 성분을 제거하여 크레졸 노볼락 에폭시 수지를 제조하였다.The novolak epoxy resin obtained in Comparative Example 9-1 was heated to 170 ° C. to be molten, and then charged into a high vacuum distillation apparatus (VTA, Germany) having a temperature of 260 ° C. and a pressure of 0.15 mbar for 60 minutes. After operation, a low molecular weight component contained in the resin was removed to prepare a cresol novolac epoxy resin.
<특성평가 방법><Characteristic evaluation method>
(1) 분자량(g/mol) 측정(1) Molecular weight (g / mol) measurement
겔 투과 크로마토그래피(GPC)(Waters: Waters707)에 의해 폴리스티렌 환산 중량평균분자량(Mw) 및 수평균분자량(Mn)을 구하였다. 측정하는 중합체는 4000ppm의 농도가 되도록 테트라히드로푸란에 용해시켜 GPC에 100를 주입하였다. GPC의 이동상은 테트라히드로푸란을 사용하고, 1.0mL/분의 유속으로 유입하였으며, 분석은 35℃에서 수행하였다. 컬럼은 Waters HR-05,1,2,4E 4개를 직렬로 연결하였다. 검출기로는 RI and PAD Detecter를 이용하여 35℃에서 측정하였다. 이때, PDI(다분산 지수)는 측정된 중량평균분자량을 수평균분자량으로 나누어 산출하였다.Polystyrene reduced weight average molecular weight (Mw) and number average molecular weight (Mn) were determined by gel permeation chromatography (GPC) (Waters: Waters707). The polymer to be measured was dissolved in tetrahydrofuran to a concentration of 4000 ppm, and 100 was injected into GPC. The mobile phase of GPC used tetrahydrofuran and was introduced at a flow rate of 1.0 mL / min, and the analysis was performed at 35 ° C. The column connected four Waters HR-05,1,2,4E in series. The detector was measured at 35 ° C using RI and PAD Detecter. At this time, PDI (polydispersity index) was calculated by dividing the measured weight average molecular weight by the number average molecular weight.
(2) n=0인 화합물의 함량측정(2) Determination of the content of the compound of n = 0
겔 투과 크로마토그래피(GPC)(Waters: Waters707)를 이용하여 수지 내 해당 분자량대 면적의 적분 값을 구하여 나머지 분자량대의 상대 면적과의 비로 계산하였다.Gel permeation chromatography (GPC) (Waters: Waters707) was used to calculate the integral value of the corresponding molecular weight band area in the resin and calculated the ratio of the relative molecular weight band to the relative area.
(3) 연화점 측정(3) softening point measurement
Mettler Toledo社제 FP90/FP83HT 기기를 이용하여 2℃/min.의 승온속도로 측정하였다.Using a FP90 / FP83HT instrument manufactured by Mettler Toledo Co., Ltd. was measured at a temperature increase rate of 2 ℃ / min.
(4) 점도 측정 방법(4) viscosity measurement method
Brookfield Viscometer (CAP 2000+)를 사용하여 180℃에서 완전히 용융된 수지의 점도를 측정하였다.The viscosity of the fully melted resin at 180 ° C. was measured using a Brookfield Viscometer (CAP 2000+).
(5) 동박적층판 제조 및 겔(Gel) 시간 측정(5) Copper Clad Laminate Manufacturing and Gel Time Measurement
(5-1) 노볼락 수지 적용(5-1) Novolak Resin Application
에폭시 당량(EEW)이 187인 비스페놀A형 Epoxy 수지(코오롱인더스트리(주), KES-9361A75)와 경화제(각 실시예 및 비교예의 노볼락 수지)를 당량비 1:1로 혼합한 다음, 경화촉진제로서 2E4MZ(2-ethyl-4-methyl-imidazole)을 전체 고형분 중량에 대하여 0.035wt% [에폭시(고형분) + 노볼락 수지(고형분):경화촉진제=99.965:0.035)를 첨가하여 혼합하여 바니쉬를 제조하였다. 그 후, 제조된 바니쉬를 유리섬유에 함침한 다음, 140℃에서 5분간 건조하여 프리프레그를 만들고, 이렇게 제조된 프리프레그 4장을 적층하고 적층된 프리프레그 상하면에 동박을 적층한 후에 프레스하여 동박적층판(400mm×400mm×0.75mm)을 만들었다(프레스 조건: 온도 190℃, 압력 25 kgf/cm2, 공정시간 2시간).또한, 상기 바니쉬와 프리프레그(프리프레그에서 반경화상태의 바니쉬를 털어내어 분말을 만듬)의 Gel 시간은 171℃로 가열된 Hot plate에서 측정하였다(사용량, 바니쉬: 0.2cc, 프리프레그: 20mg).Bisphenol A type Epoxy resin (KOLON INDUSTRY, KES-9361A75) having an epoxy equivalent weight (EEW) of 187 and a curing agent (the novolak resins of the Examples and Comparative Examples) were mixed in an equivalent ratio of 1: 1, and then used as a curing accelerator. 2E4MZ (2-ethyl-4-methyl-imidazole) was mixed with 0.035 wt% [epoxy (solid) + novolak resin (solid): curing accelerator = 99.965: 0.035) based on the total solid weight to prepare a varnish. . Thereafter, the prepared varnish was impregnated with glass fibers, and then dried at 140 ° C. for 5 minutes to form a prepreg. Four prepregs thus prepared were laminated, and the copper foil was laminated on the upper and lower surfaces of the laminated prepreg, followed by pressing to obtain copper foil. Laminates (400 mm x 400 mm x 0.75 mm) were made (press conditions: temperature 190 ° C., pressure 25 kgf / cm 2 , process time 2 hours). The varnish and prepreg (the semi-cured varnish in the prepreg) were shaken off. Gel time of making powder) was measured on a hot plate heated to 171 ℃ (use amount, varnish: 0.2cc, prepreg: 20mg).
(5-2) 노볼락 에폭시 수지 적용(5-2) Novolak epoxy resin application
활성 수소 당량(AHEW)이 106g/eq인 노볼락 수지(코오롱 인더스트리, KPH-F2004M62)와 노볼락계 에폭시 수지(각 실시예 및 비교예의 노볼락 에폭시 수지)를 당량비 1:1로 혼합한 뒤, 경화촉진제로서 2E4MZ(2-ethyl-4-methyl-imidazole)을 전체 고형분 중량에 대하여 0.035wt% [에폭시(고형분)+노볼락 에폭시 수지(고형분):경화촉진제=99.965:0.035)를 첨가하여 혼합하여 바니쉬를 제조하였다. 그 후, 제조된 바니쉬를 유리섬유에 함침한 뒤, 140℃에서 5분간 건조하여 프리프레그를 만들고, 이렇게 제조된 프리프레그 4장을 적층하고 적층된 프리프레그 상하면에 동박을 적층한 뒤 프레스하여 동박적층판을 만들었다(프레스 조건: 온도 190℃, 압력 25 kgf/cm2, 공정시간 2시간).After mixing a novolak resin (Kolon Industries, KPH-F2004M62) with an active hydrogen equivalent weight (AHEW) of 106 g / eq and a novolak-based epoxy resin (the novolak epoxy resins of the Examples and Comparative Examples) in an equivalent ratio of 1: 1, 2E4MZ (2-ethyl-4-methyl-imidazole) was added as a curing accelerator by adding 0.035 wt% [epoxy (solid) + novolac epoxy resin (solid): curing accelerator = 99.965: 0.035) to the total solid weight. Varnishes were prepared. Thereafter, the prepared varnish was impregnated with glass fibers, and then dried at 140 ° C. for 5 minutes to make a prepreg. Four prepregs thus prepared were laminated, and the copper foil was laminated on the upper and lower surfaces of the laminated prepreg, and then pressed to obtain a copper foil. Laminates were made (press conditions: temperature 190 ° C., pressure 25 kgf / cm 2 , process time 2 hours).
상기 바니쉬와 프리프레그(프리프레그에서 반경화상태의 바니쉬를 털어내어 분말을 만듬)의 겔 시간(Gel Time)은 171℃로 가열된 Hot plate에서 측정하였다(사용량, 바니쉬: 0.2cc, 프리프레그: 20mg).The gel time of the varnish and the prepreg (to shake off the semi-hardened varnish from the prepreg to make powder) was measured on a hot plate heated to 171 ℃ (usage, varnish: 0.2cc, prepreg: 20 mg).
(6) 유리전이온도 측정(6) glass transition temperature measurement
(5)에서 수득된 동박적층판에서 무작위로 고체 시료 20mg을 취출한 다음, 시차주사열량계(DSC, TA Instrument社제 Q2000)로 측정하였다(측정부위: 중앙부, 20mg. 측정조건: 질소 분위기, 20/min.의 승온 속도로 250℃까지 승온).20 mg of a solid sample was randomly taken out of the copper-clad laminate obtained in (5), and then measured by a differential scanning calorimeter (DSC, Q2000 manufactured by TA Instrument). (Measurement site: center part, 20 mg.Measurement condition: nitrogen atmosphere, 20 / temperature to 250 ° C. at a rate of min.
(7) Z-axis 열팽창 계수(CET) 측정(7) Z-axis coefficient of thermal expansion (CET)
(5)에서 수득된 동박적층판을 6.35mm×6.35mm×0.75mm(두께)로 측정 시편을 절단하여 105℃ 오븐에서 2시간 건조하여 수분 등의 오염원을 제거한 다음, Z-axis 열팽창 계수를 열분석기(TMA, TA Instrument社 Q400)를 이용하여 측정하였다(측정부위: 중앙부, 6.35mm×6.35mm×0.75mm(두께). 측정조건: 질소 분위기, 10/min.의 승온 속도로 40 ~ 260℃까지 승온).The copper-clad laminate obtained in (5) was cut to 6.35 mm × 6.35 mm × 0.75 mm (thickness), and the specimens were cut and dried in an oven at 105 ° C. for 2 hours to remove pollutants such as moisture, and then the Z-axis thermal expansion coefficient was measured by a thermal analyzer. (Measurement area: 6.35mm × 6.35mm × 0.75mm (thickness)) (TMA, TA Instrument Co., Q400) Measurement conditions: nitrogen atmosphere, temperature increase rate of 10 / min. To 40 ~ 260 ℃ Elevated temperature).
(8) 흡수율 측정(8) absorption rate measurement
(5)에서 수득된 동박적층판을 50mm×05mm×0.75mm(두께)로 절단하여 5개의 시편을 수득한 다음, FeCl3로 에칭(식각)하여 동박을 완전히 박리한 후, 수세로 에칭 용액 및 잔존 물을 완전히 제거하고, 105℃ 오븐에서 2시간 동안 건조시켜 잔존 물질을 완전히 제거하였다. 잔존 물질이 제거된 시편을 각각 편량하여 121℃와 0.22MPa로 설정된 Pressure Cooker Test(PCT) 챔버에 넣고 90분 동안 유지시킨 다음, 시편에 묻은 물기를 제거하고, 수분 흡수 전후의 질량 변화율을 하기 식 1로부터 산출하였다.The copper-clad laminate obtained in (5) was cut into 50 mm × 05 mm × 0.75 mm (thickness) to obtain five specimens, which were then etched (etched) with FeCl 3 to completely peel the copper foil, followed by etching solution and residual water. Water was completely removed and dried in an oven at 105 ° C. for 2 hours to completely remove residual material. After removing the remaining material, put the specimens into a Pressure Cooker Test (PCT) chamber set at 121 ° C and 0.22 MPa, and hold them for 90 minutes. Then, the moisture on the specimens is removed, and the mass change rate before and after moisture absorption is calculated by the following equation. Calculated from 1.
[식 1][Equation 1]
흡수율(%)=(젖은 시편무게-실험 전 시편무게)/실험 전 시편무게Absorption rate (%) = (Wet specimen weight-specimen weight before experiment) / specimen weight before experiment
(9) 내열 안정성 측정(9) Heat stability measurement
(5)에서 수득된 동박적층판을 6.35mm×6.35mm×0/75mm(두께)로 측정 시편을 절단하여 105℃ 오븐에서 2시간 건조하여 수분 등의 오염원을 제거한 다음, 열분석기(TMA, TA Instrument社 Q400)를 이용하여 측정하였다. 측정시, 0℃/min로 40℃에서 288℃까지 승온시킨 다음, 288℃에서 등온으로 유지하면서 시편 박리가 일어나는 시간을 측정하였다. 이때, '박리'란 급격한 부피 팽창 후, 다시 원래의 크기로 가역적으로 복귀되지 않는 것을 의미하고, 측정값이 10분 이상이면 '양호'로, 5분 이내이면 '보통'으로, 1분 이하이면 불량으로 표기하였다.The copper-clad laminate obtained in (5) was cut to 6.35 mm × 6.35 mm × 0/75 mm (thickness), and the specimens were cut and dried in an oven at 105 ° C. for 2 hours to remove pollutants such as moisture, and then a thermal analyzer (TMA, TA Instrument Q400) was used. In the measurement, the temperature was raised from 40 ° C. to 288 ° C. at 0 ° C./min, and then the time taken for specimen peeling while maintaining isothermal at 288 ° C. was measured. In this case, 'peeling' means not reversibly returning to its original size after rapid volume expansion, and if the measured value is 10 minutes or more, it is 'good', if it is within 5 minutes, 'normal', and if it is 1 minute or less, Marked as bad.
표 1
물성 평가
n=0 함량 (중량%) Mw(g/mol) PDI 용융점도(cps) 연화점(℃) Gel 시간(sec.) 경화 후 Tg (℃) CTE(%) 흡수율(wt%) 내열 안정성
비교예 1-1 20.23 2353 2.05 2090 113 138 215 2.58 0.36 불량
비교예 1-2 13.08 2456 1.90 2120 128 136 218 2.57 0.37 보통
비교예 1-3 8.13 2488 1.85 2271 132 130 220 2.60 0.35 보통
비교예 1-4 2.89 2498 1.89 2280 143 129 250 2.67 0.33 보통
실시예 1-1 2.80 2502 1.86 2390 145 128 256 2.28 0.25 양호
실시예 1-2 0.51 2553 1.79 2450 148 127 262 2.23 0.24 양호
비교예 2-1 22 1034 1.42 1580 78 234 128.1 2.46 0.37 불량
비교예 2-2 7.1 1106 1.36 1620 89 241 136.3 2.48 0.36 보통
비교예 2-3 4.5 1135 1.33 1650 98.2 258 148.2 2.49 0.35 보통
실시예 2-1 2.3 1149 1.31 1750 99.1 262 151.2 2.25 0.24 양호
실시예 2-2 0.7 1162 1.29 1760 101 267 154.3 2.24 0.25 양호
실시예 2-3 0.1 1172 1.26 1780 101.5 266 155.7 2.24 0.24 양호
비교예 3-1 12.7 1848 2.03 2120 101 212 153.1 2.49 0.35 불량
비교예 3-2 9.9 1915 1.96 2201 109 219 155.2 2.50 0.24 보통
비교예 3-3 4.1 2059 1.83 2256 117 234 163.3 2.48 0.25 보통
실시예 3-1 0.9 2110 1.7 2356 120.1 239 164.1 2.24 0.24 양호
실시예 3-2 0.1 2150 1.64 2405 121.1 243 165.5 2.13 0.24 양호
비교예 4-1 15.44 2847 3.12 3120 127 128 236 2.68 0.34 보통
비교예 5-1 5.53 12308 7.16 4420 139.8 256 159.2 2.49 0.35 보통
Table 1
Property evaluation
n = 0 content (% by weight) Mw (g / mol) PDI Melt viscosity (cps) Softening point (℃) Gel time (sec.) Tg after curing (℃) CTE (%) Absorption rate (wt%) Heat-resistant stability
Comparative Example 1-1 20.23 2353 2.05 2090 113 138 215 2.58 0.36 Bad
Comparative Example 1-2 13.08 2456 1.90 2120 128 136 218 2.57 0.37 usually
Comparative Example 1-3 8.13 2488 1.85 2271 132 130 220 2.60 0.35 usually
Comparative Example 1-4 2.89 2498 1.89 2280 143 129 250 2.67 0.33 usually
Example 1-1 2.80 2502 1.86 2390 145 128 256 2.28 0.25 Good
Example 1-2 0.51 2553 1.79 2450 148 127 262 2.23 0.24 Good
Comparative Example 2-1 22 1034 1.42 1580 78 234 128.1 2.46 0.37 Bad
Comparative Example 2-2 7.1 1106 1.36 1620 89 241 136.3 2.48 0.36 usually
Comparative Example 2-3 4.5 1135 1.33 1650 98.2 258 148.2 2.49 0.35 usually
Example 2-1 2.3 1149 1.31 1750 99.1 262 151.2 2.25 0.24 Good
Example 2-2 0.7 1162 1.29 1760 101 267 154.3 2.24 0.25 Good
Example 2-3 0.1 1172 1.26 1780 101.5 266 155.7 2.24 0.24 Good
Comparative Example 3-1 12.7 1848 2.03 2120 101 212 153.1 2.49 0.35 Bad
Comparative Example 3-2 9.9 1915 1.96 2201 109 219 155.2 2.50 0.24 usually
Comparative Example 3-3 4.1 2059 1.83 2256 117 234 163.3 2.48 0.25 usually
Example 3-1 0.9 2110 1.7 2356 120.1 239 164.1 2.24 0.24 Good
Example 3-2 0.1 2150 1.64 2405 121.1 243 165.5 2.13 0.24 Good
Comparative Example 4-1 15.44 2847 3.12 3120 127 128 236 2.68 0.34 usually
Comparative Example 5-1 5.53 12308 7.16 4420 139.8 256 159.2 2.49 0.35 usually
상기 표 1에 나타난 바와 같이, 본 발명에 따른 실시예의 노볼락 수지는 비교예의 노볼락 수지에 비해 저점도 특성을 가지면서, 저 열팽창성, 높은 유리전이온도, 고온에서의 내열성 등과 같은 열적 안정성과 내흡습성이 현저히 증가함을 확인할 수 있었다. 또한, 실시예 1-1 및 1-2의 저분자량이 제거된 비스페놀 노볼락 수지가 페놀 노볼락 수지(실시예 2-1 내지 2-3)에 비해 경화 후 유리전이온도 및 겔 시간측정에 있어서 향상됨을 확인할 수 있었다. As shown in Table 1, the novolak resin of the embodiment according to the present invention has a low viscosity characteristic compared to the novolak resin of the comparative example, and thermal stability such as low thermal expansion, high glass transition temperature, heat resistance at high temperature and the like. It was confirmed that the hygroscopicity was significantly increased. In addition, the bisphenol novolak resins from which the low molecular weights of Examples 1-1 and 1-2 were removed were compared with the phenol novolak resins (Examples 2-1 to 2-3) in measuring glass transition temperature and gel time after curing. It was confirmed that the improvement.
표 2
n=0 함량 (중량%) Mw(g/mol) PDI 용융점도 (cps) 연화점 (℃) Gel time(sec.) 경화 후 Tg(℃) 내열 안정성(T288) CTE(%) 흡수율(wt%)
비교예 6-1 18.56 2300 2.88 1678 65 126 225 불량 2.58 0.35
비교예 6-2 8.7 2990 2.72 1876 80 118 232 보통 2.57 0.33
비교예 6-3 6.8 3010 2.68 2135 83 121 237 보통 2.58 0.32
실시예 4-1 2.8 2945 2.32 2235 95 118 268 양호 2.23 0.23
실시예 4-2 1.3 3068 2.28 2356 95 118 272 양호 2.22 0.21
비교예 7-1 13.5 4163 4.04 2376 80.3 116 247 보통 2.76 0.34
실시예 5-1 2.6 4732 2.93 2622 102 121 292 양호 2.21 0.22
실시예 5-2 1.1 4757 2.87 2888 105 121 292 양호 2.20 0.22
실시예 5-3 0.5 4814 2.76 2970 110 120 297 양호 2.20 0.21
비교예 8-1 23.07 1231 1.95 28 46 240 196.3 불량 2.68 0.35
비교예 8-2 9.39 1423 1.78 187 55.6 225 203.5 보통 2.63 0.34
비교예 8-3 3.01 1487 1.70 350 57.1 218 202.5 보통 2.64 0.33
실시예 6-1 2.8 1539 1.66 376 59.1 216 214.5 양호 2.21 0.24
실시예 6-2 2.3 1567 1.58 450 62.1 210 216.4 양호 2.22 0.23
실시예 6-3 1.01 1589 1.58 455 62.1 210 218.4 양호 2.21 0.22
실시예 6-4 0.01 1593 1.56 607 63.1 208 218.7 양호 2.18 0.20
비교예 9-1 8.35 1758 1.90 1876 65 256 225 불량 2.57 0.35
비교예 9-2 6.60 1837 1.98 2135 60 255 228 보통 2.54 0.34
비교예 9-3 4.30 1992 1.93 2245 63 242 232 보통 2.54 0.33
비교예 9-4 3.20 1998 1.91 2367 65 238 234 보통 2.52 0.31
실시예 7-1 2.8 2010 1.81 2569 72 235 257 양호 2.21 0.23
실시예 7-2 0.1 2028 1.81 2658 72 235 259 양호 2.20 0.22
TABLE 2
n = 0 content (% by weight) Mw (g / mol) PDI Melt viscosity (cps) Softening Point (℃) Gel time (sec.) Tg after curing (℃) Thermal stability (T288) CTE (%) Absorption rate (wt%)
Comparative Example 6-1 18.56 2300 2.88 1678 65 126 225 Bad 2.58 0.35
Comparative Example 6-2 8.7 2990 2.72 1876 80 118 232 usually 2.57 0.33
Comparative Example 6-3 6.8 3010 2.68 2135 83 121 237 usually 2.58 0.32
Example 4-1 2.8 2945 2.32 2235 95 118 268 Good 2.23 0.23
Example 4-2 1.3 3068 2.28 2356 95 118 272 Good 2.22 0.21
Comparative Example 7-1 13.5 4163 4.04 2376 80.3 116 247 usually 2.76 0.34
Example 5-1 2.6 4732 2.93 2622 102 121 292 Good 2.21 0.22
Example 5-2 1.1 4757 2.87 2888 105 121 292 Good 2.20 0.22
Example 5-3 0.5 4814 2.76 2970 110 120 297 Good 2.20 0.21
Comparative Example 8-1 23.07 1231 1.95 28 46 240 196.3 Bad 2.68 0.35
Comparative Example 8-2 9.39 1423 1.78 187 55.6 225 203.5 usually 2.63 0.34
Comparative Example 8-3 3.01 1487 1.70 350 57.1 218 202.5 usually 2.64 0.33
Example 6-1 2.8 1539 1.66 376 59.1 216 214.5 Good 2.21 0.24
Example 6-2 2.3 1567 1.58 450 62.1 210 216.4 Good 2.22 0.23
Example 6-3 1.01 1589 1.58 455 62.1 210 218.4 Good 2.21 0.22
Example 6-4 0.01 1593 1.56 607 63.1 208 218.7 Good 2.18 0.20
Comparative Example 9-1 8.35 1758 1.90 1876 65 256 225 Bad 2.57 0.35
Comparative Example 9-2 6.60 1837 1.98 2135 60 255 228 usually 2.54 0.34
Comparative Example 9-3 4.30 1992 1.93 2245 63 242 232 usually 2.54 0.33
Comparative Example 9-4 3.20 1998 1.91 2367 65 238 234 usually 2.52 0.31
Example 7-1 2.8 2010 1.81 2569 72 235 257 Good 2.21 0.23
Example 7-2 0.1 2028 1.81 2658 72 235 259 Good 2.20 0.22
또한, 상기 표 2에 나타난 바와 같이, 실시예의 노볼락 에폭시 수지는 비교예의 에폭시 수지에 비해 저점도 특성을 가지면서, 저 열팽창성, 높은 유리전이온도, 고온에서의 내열성 등과 같은 열적 안정성과 내흡습성이 현저히 증가함을 확인할 수 있었다. 또한, 실시예 4-1 내지 5-3의 저분자량이 제거된 비스페놀 A 노볼락 에폭시 수지가 페놀 노볼락 에폭시 수지(실시예 6-1 내지 6-4) 및 크레졸 노볼락 에폭시 수지(실시예 7-1 및 7-2)보다 경화 후 유리전이온도나, 겔 시간측정에 있어서 향상됨을 확인할 수 있었다.In addition, as shown in Table 2, the novolac epoxy resin of the embodiment has a low viscosity characteristics compared to the epoxy resin of the comparative example, thermal stability such as low thermal expansion, high glass transition temperature, heat resistance at high temperature and moisture absorption resistance This markedly increased. In addition, the bisphenol A novolac epoxy resin from which the low molecular weights of Examples 4-1 to 5-3 were removed was added to the phenol novolac epoxy resin (Examples 6-1 to 6-4) and cresol novolac epoxy resin (Example 7). It was confirmed that the glass transition temperature and the gel time measurement after curing were improved from -1 and 7-2).
본 발명의 단순한 변형 또는 변경은 모두 이 분야의 통상의 지식을 가진 자에 의하여 용이하게 실시될 수 있으며 이러한 변형이나 변경은 모두 본 발명의 영역에 포함되는 것으로 볼 수 있다.All simple modifications or changes of the present invention can be easily carried out by those skilled in the art, and all such modifications or changes can be seen to be included in the scope of the present invention.
본 발명은 저점도이면서 고온(280℃ 이상)에서의 높은 열적 안정성과 내흡습성이 우수한 노볼락 수지 및 노볼락 에폭시 수지를 간단한 방법으로 용이하게 제조할 수 있고, 용제 추가 사용 없이 노볼락 수지 및 노볼락 에폭시 수지의 점도를 감소시킬 수 있어 경제적으로나, 친환경적으로 유용하게 사용할 수 있다.The present invention can easily produce a novolak resin and a novolak epoxy resin having a low viscosity and high thermal stability at high temperature (above 280 ° C.) and excellent hygroscopicity by a simple method, and can be produced without using a solvent. Since the viscosity of the volac epoxy resin can be reduced, it can be economically and environmentally friendly.

Claims (16)

  1. 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지에 있어서, 화학식 1에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 1에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 500 ~ 5,500g/mol이고, 다분산 지수가 1.0 내지 3.0이고, 180℃에서의 용융점도가 100 내지 3,000cps이며, 연화점이 80 내지 160℃인 것을 특징으로 하는 노볼락 수지:A novolak resin comprising a compound represented by an integer of n = 0 to 5 in Formula 1, comprising 2.8% by weight or less of a compound having n = 0 in Formula 1, or a compound having n = 0 in Formula 1 Weight average molecular weight of 500 to 5,500 g / mol, polydispersity index of 1.0 to 3.0, melt viscosity at 180 ° C of 100 to 3,000 cps, and softening point of 80 to 160 ° C. Volac Resin:
    [화학식 1][Formula 1]
    Figure PCTKR2014011291-appb-I000021
    Figure PCTKR2014011291-appb-I000021
    상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기임.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  2. 제1항에 있어서, 상기 화학식 1에서, n은 0 내지 5의 정수이고, R은 -CH2- 이며, X는 -C(CH3)2C6H4OH 또는 -CH3인 것을 특징으로 하는 노볼락 수지.The method of claim 1, wherein in Formula 1, n is an integer of 0 to 5, R is -CH 2- , X is -C (CH 3 ) 2 C 6 H 4 OH or -CH 3 characterized in that Novolak resin.
  3. (a) 페놀계 단량체와 포름알데히드계 단량체를 산촉매하에서 축합 반응시키고, 축합수를 제거하여 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 합성하는 합성단계; (a) a condensation reaction of a phenol-based monomer with a formaldehyde-based monomer under an acid catalyst to remove a condensed water to synthesize a novolak resin including a compound represented by an integer of n = 0 to 5 in Formula 1 below;
    (b) 상기 합성단계로부터 수득된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및(b) a heating step of heating and melting a novolak resin obtained from the synthesis step, wherein the novolak resin including a compound represented by an integer of n = 0 to 5 in Formula 1 above a softening point; And
    (c) 상기 가열단계로부터 용융된, 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 수지를 고진공 증류장치로 투입하여 상기 화학식 1에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 수지의 제조방법:(c) 2.8 weight of a compound having n = 0 in Chemical Formula 1 by injecting a novolak resin containing a compound represented by an integer of n = 0 to 5 in Chemical Formula 1 melted from the heating step into a high vacuum distillation apparatus; Method for producing a novolak resin comprising an extraction step of removing to less than or completely removed:
    [화학식 1][Formula 1]
    Figure PCTKR2014011291-appb-I000022
    Figure PCTKR2014011291-appb-I000022
    상기 화학식 1에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -C10H12-, -O=S=0- 또는 -CH(C6H4OH)-이고, X는 -H, -Br, -C(CH3)2C6H4OH 또는 탄소수 1 내지 12의 알킬기임.In Formula 1 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -C 10 H 12- , -O = S = 0- or -CH (C 6 H 4 OH)-, X is -H, -Br, -C (CH 3 ) 2 C 6 H 4 OH or an alkyl group having 1 to 12 carbon atoms.
  4. 제3항에 있어서, 상기 (c) 단계에서 고진공 증류장치는 0.001 내지 1.5mbar의 압력하에서 200 내지 280℃로 설정하는 것을 특징으로 하는 노볼락 수지의 제조방법.The method of claim 3, wherein in the step (c), the high vacuum distillation apparatus is set at 200 to 280 ° C under a pressure of 0.001 to 1.5 mbar.
  5. 제1항 내지 제2항 중 어느 한 항의 노볼락 수지를 포함하는 노볼락 경화제.The novolak hardener containing the novolak resin of any one of Claims 1-2.
  6. 에폭시 수지; 및 Epoxy resins; And
    제8항의 노볼락 경화제를 포함하는 에폭시 수지 조성물.An epoxy resin composition comprising the novolac curing agent of claim 8.
  7. 제6항의 에폭시 수지 조성물의 경화물.Hardened | cured material of the epoxy resin composition of Claim 6.
  8. 화학식 2에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지에 있어서, 화학식 2에서 n=0인 화합물을 2.8중량% 이하 포함하거나, 또는 화학식 2에서 n=0인 화합물을 포함하지 않으면서, 중량평균분자량이 700~5,000g/mol인 것을 특징으로 하는 노볼락 에폭시 수지:In the novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in the formula (2), in the formula (2) comprising 2.8% by weight or less of the compound or n = 0 in the formula (2) Novolac epoxy resin, characterized in that the weight average molecular weight of 700 ~ 5,000g / mol without including:
    [화학식 2][Formula 2]
    Figure PCTKR2014011291-appb-I000023
    Figure PCTKR2014011291-appb-I000023
    상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
    Figure PCTKR2014011291-appb-I000024
    이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
    Figure PCTKR2014011291-appb-I000025
    임.
    In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
    Figure PCTKR2014011291-appb-I000024
    X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
    Figure PCTKR2014011291-appb-I000025
    being.
  9. 제8항에 있어서, 상기 화학식 2에서, R은 -CH2- 이고, X는 -H,
    Figure PCTKR2014011291-appb-I000026
    또는 -CH3인 것을 특징으로 하는 노볼락 에폭시 수지.
    According to claim 8, In Formula 2, R is -CH 2- , X is -H,
    Figure PCTKR2014011291-appb-I000026
    Or -CH 3 .
  10. 제8항에 있어서, 상기 노볼락 에폭시 수지는 PDI가 1.0 내지 3.0인 것을 특징으로 하는 노볼락 에폭시 수지.The novolac epoxy resin according to claim 8, wherein the novolac epoxy resin has a PDI of 1.0 to 3.0.
  11. 제8항에 있어서, 상기 노볼락 에폭시 수지는 160℃에서의 용융점도가 30 내지 3,000cps인 것을 특징으로 하는 노볼락 에폭시 수지.The novolac epoxy resin according to claim 8, wherein the novolac epoxy resin has a melt viscosity of 30 to 3,000 cps at 160 ° C.
  12. 제8항에 있어서, 상기 노볼락 에폭시 수지는 연화점이 40 내지 130℃인 것을 특징으로 하는 노볼락 에폭시 수지.The novolac epoxy resin of claim 8, wherein the novolac epoxy resin has a softening point of 40 to 130 ° C. 10.
  13. (a) 노볼락계 중합체와 에피클로하이드린 단량체를 염기성 촉매하에서 중/축합반응시키고, 축합수 및 생성된 염을 제거하여 하기 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 합성하는 합성단계; (a) containing a compound represented by an integer of n = 0 to 5 in the following Chemical Formula 1 by performing a poly / condensation reaction of a novolak-based polymer and an epiclohydrin monomer under a basic catalyst, and removing the condensed water and the resulting salt. Synthesizing a novolac epoxy resin;
    (b) 상기 합성단계로부터 수득된 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 연화점 이상으로 가열하여 용융하는 가열단계; 및(b) a heating step of heating and melting a novolak epoxy resin comprising a compound represented by an integer of n = 0 to 5 in Formula 1 obtained from the synthesis step above a softening point; And
    (c) 상기 가열단계로부터 용융된, 화학식 1에서 n=0 내지 5의 정수로 표시되는 화합물을 포함하는 노볼락 에폭시 수지를 고진공 증류장치로 투입하여 상기 화학식 1에서 n=0인 화합물을 2.8중량% 이하로 제거하거나, 완전히 제거하는 추출단계를 포함하는 노볼락 에폭시 수지의 제조방법:(c) 2.8 weight of a compound having n = 0 in Chemical Formula 1 by adding a novolak epoxy resin, which is melted from the heating step, to a high vacuum distillation apparatus including a novolak epoxy resin containing a compound represented by an integer of n = 0 to 5 in Chemical Formula 1; Method for producing a novolac epoxy resin comprising an extraction step of removing to less than or completely removed:
    [화학식 2][Formula 2]
    Figure PCTKR2014011291-appb-I000027
    Figure PCTKR2014011291-appb-I000027
    상기 화학식 2에서 n은 0 내지 5의 정수이고, R은 -CH2-, -C(CH3)2-, -C=O-, -O=S=0- 또는
    Figure PCTKR2014011291-appb-I000028
    이고, X는 -H, -Br, -CF3, 탄소수 1 내지 12의 알킬기 또는
    Figure PCTKR2014011291-appb-I000029
    임.
    In Formula 2 n is an integer of 0 to 5, R is -CH 2- , -C (CH 3 ) 2- , -C = O-, -O = S = 0- or
    Figure PCTKR2014011291-appb-I000028
    X is -H, -Br, -CF 3 , an alkyl group having 1 to 12 carbon atoms or
    Figure PCTKR2014011291-appb-I000029
    being.
  14. 제13항에 있어서, 상기 (c) 단계에서 고진공 증류장치는 0.001 내지 0.5mbar의 압력하에서 200 내지 280℃로 설정하는 것을 특징으로 하는 노볼락 에폭시 수지의 제조방법.The method of claim 13, wherein the high vacuum distillation apparatus in the step (c) is set to 200 to 280 ℃ under a pressure of 0.001 to 0.5 mbar.
  15. 제8항 내지 제12항 중 어느 한 항의 노볼락 에폭시 수지를 포함하는 에폭시 수지 조성물.The epoxy resin composition containing the novolak epoxy resin of any one of Claims 8-12.
  16. 제15항의 에폭시 수지 조성물의 경화물.Hardened | cured material of the epoxy resin composition of Claim 15.
PCT/KR2014/011291 2013-11-22 2014-11-21 Novolac resin, curing agent containing same, and epoxy resin composition, and novolac epoxy resin, preparation method therefor, and epoxy resin composition containing novolac epoxy resin WO2015076626A1 (en)

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KR1020130143056A KR101472221B1 (en) 2013-11-22 2013-11-22 Novolac Resin, Hardener Comprising the Same and Epoxy Resin Composition
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07316266A (en) * 1994-05-26 1995-12-05 Matsushita Electric Works Ltd Epoxy resin molding material for sealing and semiconductor device
JPH08165328A (en) * 1994-12-14 1996-06-25 Toto Kasei Co Ltd Lowly dielectric epoxy resin composition
KR100444348B1 (en) * 1996-02-09 2005-02-24 군에이 가가쿠 고교 가부시끼가이샤 Epoxy Resin, Epoxy Resin Compositions And Cured Its
KR100697256B1 (en) * 2005-07-06 2007-03-22 주식회사 두산 Epoxy resin composition for preparation of printed circuit board, and prepreg and copper laminates made therefrom
JP2009096894A (en) * 2007-10-17 2009-05-07 Showa Highpolymer Co Ltd Low molecular weight novolac resin, method for manufacturing the same, and thermosetting resin composition using the same
KR100995678B1 (en) * 2008-09-01 2010-11-22 주식회사 코오롱 Phenol novolak resin, phenol novolak epoxy resin and epoxy resin composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07316266A (en) * 1994-05-26 1995-12-05 Matsushita Electric Works Ltd Epoxy resin molding material for sealing and semiconductor device
JPH08165328A (en) * 1994-12-14 1996-06-25 Toto Kasei Co Ltd Lowly dielectric epoxy resin composition
KR100444348B1 (en) * 1996-02-09 2005-02-24 군에이 가가쿠 고교 가부시끼가이샤 Epoxy Resin, Epoxy Resin Compositions And Cured Its
KR100697256B1 (en) * 2005-07-06 2007-03-22 주식회사 두산 Epoxy resin composition for preparation of printed circuit board, and prepreg and copper laminates made therefrom
JP2009096894A (en) * 2007-10-17 2009-05-07 Showa Highpolymer Co Ltd Low molecular weight novolac resin, method for manufacturing the same, and thermosetting resin composition using the same
KR100995678B1 (en) * 2008-09-01 2010-11-22 주식회사 코오롱 Phenol novolak resin, phenol novolak epoxy resin and epoxy resin composition

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