WO2015072241A1 - Photoelectric conversion element module and method for manufacturing photoelectric conversion element module - Google Patents

Photoelectric conversion element module and method for manufacturing photoelectric conversion element module Download PDF

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Publication number
WO2015072241A1
WO2015072241A1 PCT/JP2014/076461 JP2014076461W WO2015072241A1 WO 2015072241 A1 WO2015072241 A1 WO 2015072241A1 JP 2014076461 W JP2014076461 W JP 2014076461W WO 2015072241 A1 WO2015072241 A1 WO 2015072241A1
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Prior art keywords
electrode
inter
main body
photoelectric conversion
connection
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PCT/JP2014/076461
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French (fr)
Japanese (ja)
Inventor
大介 新延
坂井 裕一
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三菱電機株式会社
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Priority to JP2015547681A priority Critical patent/JPWO2015072241A1/en
Publication of WO2015072241A1 publication Critical patent/WO2015072241A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/05Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
    • H01L31/0504Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
    • H01L31/0516Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module specially adapted for interconnection of back-contact solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/022441Electrode arrangements specially adapted for back-contact solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells

Definitions

  • the present invention relates to a photoelectric conversion element module and a method for manufacturing the photoelectric conversion element module, and more particularly to an inter-element connection structure.
  • a plurality of light receiving elements having a positive electrode and a negative electrode provided on the non-light-receiving surface side are provided side by side without providing an electrode on the light-receiving surface side, and the positive electrode of one light receiving element and the negative electrode of the adjacent light receiving element are interconnected.
  • a light receiving element module connected by an inter-element connection body called as a so-called element connecting body.
  • the light receiving element may be referred to as an element or a photoelectric conversion element.
  • an interelement connection body is generally used in order to electrically connect the positive electrode formed on the back surface of the first light receiving element and the negative electrode formed on the back surface of the adjacent second light receiving element.
  • the connection method using the inter-element connection body is not only for the light receiving element, but also for all photoelectric conversion elements in which a positive electrode and a negative electrode are provided as element electrodes on the non-light-receiving surface or non-light-emitting surface side without providing an electrode on the light-receiving or light-emitting surface side. Applicable.
  • the photoelectric conversion element since there is no electrode on the light receiving surface or the light emitting surface of the light receiving element, a light receiving area and a light emitting area can be secured. Further, the inter-element connection body does not cover the light receiving surface of the light receiving element. Therefore, the shape of the inter-element connection body and the element electrode can be increased, and the resistance for collecting current in the light receiving element and the resistance for connecting the elements can be reduced. Therefore, there is an advantage that the conversion efficiency between light and electricity, that is, the photoelectric conversion efficiency is excellent.
  • the inter-element connection body generally, an entire surface of a highly conductive metal such as a copper (Cu) foil is coated with solder.
  • the inter-element connection body is placed on the positive electrode or the negative electrode, which is an element electrode made of a metal such as silver (Ag), and heated, and the inter-element connection body and the element electrode are partially or over the entire length. And are connected by a conductive member such as solder.
  • a large number of elongated linear electrodes called grid electrodes are collectively connected to a bus electrode or a current extraction electrode at the end of the element. Some of the current extraction electrodes are interconnected using inter-element connectors.
  • a large number of elongated linear electrodes collect power generation current to the end of the element, and current flows from the end to the adjacent element through the inter-element connector.
  • Patent Document 2 for example, a solar cell element in which positive and negative grid electrodes are formed in a two-layer structure on an element via an insulating layer to form an element electrode has been proposed.
  • the electrode area per projected area of the element can be increased as compared with Patent Document 1, and as a result of the increase in the electrode area, the current collecting resistance with respect to the received light current is reduced, and the power loss due to the resistance can be reduced. it can.
  • the current collecting resistance can be reduced by increasing the thickness or height of the element electrode, but the warpage of the element increases due to the difference in thermal expansion coefficient between the element and the electrode material.
  • a resin sheet in which a metal electrode having a pattern equivalent to the positive electrode and the negative electrode on the back surface of the element is provided on the element on which the device electrode including the positive electrode and the negative electrode is formed on the back surface of the element.
  • a light receiving element module is also disclosed in which element electrodes between a plurality of elements are connected using metal electrodes on a resin sheet as inter-element connectors and current extraction electrodes.
  • an element electrode composed of a positive electrode and a negative electrode is formed on the back surface of a cell of a light receiving element in a two-layer structure, and an inter-element connection line overlaps the element electrode and is disposed over the entire element.
  • a solar cell module is also disclosed in which the current collecting resistance with respect to the photocurrent is reduced by increasing the total area of the element electrodes, and the power loss due to the resistance is reduced.
  • Patent Document 1 since the positional relationship between the positive electrode and the negative electrode on the plane is constant, a string formed by a plurality of elements is created, and a portion that connects the strings, that is, a folded portion of the string It is necessary to arrange and connect a conductor between the strings at the (end portion). Therefore, the ratio of the area of the part other than the element occupying the module area is increased, and resistance between the strings is added, so that there is a problem that the photoelectric conversion efficiency as a module cannot be improved.
  • the element electrode is formed directly on the semiconductor substrate, there is a problem that the metal diffuses in the semiconductor substrate depending on the type of electrode metal constituting the element electrode or the element structure, and the photoelectric conversion efficiency is lowered.
  • Patent Document 2 the positive and negative electrodes of the element are formed in two layers, and the structure is complicated. Therefore, in manufacturing the device, the number of processes and time are required, and although one electrode covers the entire back surface of the device, it is difficult to increase the thickness of the electrode on the device to sufficiently reduce the current collecting resistance. There is a problem that power loss due to resistance cannot be made sufficiently small. In addition, in the structure of the element, it is necessary to collect the generated current by the electrode on the element up to the end of the element when modularizing, and there is a problem that the resistance loss at the time of current collection is relatively large.
  • the element electrode is formed directly on the semiconductor substrate, there is a problem in that the metal diffuses into the semiconductor substrate depending on the electrode metal or element structure constituting the element electrode, thereby reducing the photoelectric conversion efficiency.
  • the thickness of the element electrode formed directly on the element increases, warpage occurs in the light receiving element with the inter-element connection body due to the difference in thermal expansion coefficient between the metal inter-element connection body and the light receiving element substrate. There has been a problem that it cannot be sealed in a planar shape without damaging the element.
  • a metal electrode formed by firing a paste containing a commonly used glass component is used as an element electrode, a high temperature is required during firing, and increasing the electrode area and thickness increases warping of the element. There was a problem. The cause of this warpage is caused not only by the element electrode and the element substrate, but also by the difference in the coefficient of thermal expansion between the inter-element connector and the element substrate.
  • Patent Document 3 a resin film in which a metal pattern is formed is used as an inter-element connection without forming a current extraction electrode and a bus electrode on the element. It was necessary to align with the electrode on the element. Therefore, in the module structure of Patent Document 3, the interval necessary for preventing a short circuit between the positive electrode and the negative electrode is not only the positional accuracy between the element electrode and the semiconductor substrate, but also the alignment accuracy between the element and the resin film. Also depends.
  • Patent Document 4 since the positive and negative electrodes are formed on the back surface of the light receiving element in a two-layer structure, and the inter-element connector overlaps the element electrode and is disposed on the entire element, current collection for photocurrent is performed. Resistance is reduced.
  • the electrode pitch is preferably smaller than the diffusion length of minority carriers in the semiconductor element substrate. For example, in the case of a silicon substrate, although it depends on the specific resistance, it is about 2 mm or less.
  • Patent Document 5 and Patent Document 6 includes a method in which a metal material is melted and connected by a heating means such as a laser. Is also disclosed.
  • Patent Document 7 also proposes a light receiving element in which a first electrical contact and a second electrical contact that are insulated and separated by a passivation film are provided on one surface side of a wafer.
  • Patent Documents 8 and 9 also propose a light receiving element module using a wiring board in which a wiring corresponding to the element electrode is formed for the back surface taking type light receiving element.
  • Non-Patent Document 1 proposes a structure in which an electrode having the other polarity is directly contacted with a semiconductor substrate through a thin inorganic insulating layer formed on the semiconductor substrate on a semiconductor layer having one polarity. Yes.
  • the resistance loss is large and the thickness of the element electrode is necessary. There is.
  • the warpage of the light receiving element increases due to the difference in thermal expansion coefficient between the element electrode and inter-element connection body and the light receiving element substrate.
  • the warp of the light receiving element is particularly large, and there is a problem that the element string cannot be sealed in a planar shape.
  • the current collecting electrode is thick and the distance between the positive and negative current collecting electrodes is wide, the distance that carriers flow in the plane in the device before reaching the current collecting electrode becomes longer, increasing the current collecting resistance or the carrier.
  • the current collection efficiency decreases due to the deactivation, and the power generation efficiency decreases. Therefore, it is necessary to narrow the electrode interval or electrode width, and when forming positive and negative electrodes separately, it is necessary to improve the positional accuracy of both.
  • the metal is electrically short-circuited with the element substrate through the pinhole of the passivation film, or the metal diffuses into the element substrate.
  • the metal acts as a recombination center and a loss occurs in photoelectric conversion efficiency.
  • the present invention has been made in view of the above, and an object thereof is to obtain a photoelectric conversion element module that is excellent in photoelectric conversion efficiency and easy to manufacture.
  • a photoelectric conversion element module includes a back connection type photoelectric conversion element having first and second element electrodes having different polarities on the back side from a conductive plate. And connected by an inter-element connector.
  • the first and second element electrodes are arranged in a plane, and the second element electrode includes a current extraction electrode connected to the inter-element connection portion and a plurality of current collecting electrodes connected to the current extraction electrode.
  • the current collecting electrode of the element electrode has a portion that intersects and connects with the inter-element connection portion on the back surface of the semiconductor substrate, and the first element electrode has a plurality of regions separated by the inter-element connection portion. .
  • the body part of the inter-element connection body has a plate shape, and the width of the body part is wider than the width of the inter-element connection part, and is in contact with the second element electrode on the back surface of the photoelectric conversion element through an insulating layer. Is electrically insulated from the first element electrode, and the inter-element connection portion of the inter-element connection body electrically connected to the main body is adjacent to the second element electrode of the adjacent element. Directly connected to the current extraction electrode.
  • a photoelectric conversion element module that is excellent in photoelectric conversion efficiency and easy to manufacture can be obtained.
  • FIG. 3 is a plan view of the light receiving element module according to the first embodiment when viewed from the light receiving surface side, and a module forming member such as a sealing material is omitted for easy understanding. It is the top view which looked at the light receiving element module by Embodiment 1 from the back surface side, and module forming members, such as a sealing material, are omitted for easy understanding FIG.
  • FIG. 2 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module used in Embodiment 1, and shows a state before connecting the inter-element connection body between the element and the inter-element connection;
  • the figure which shows the state which looked at the light receiving element connected to the body from the back side 2A and 2B are diagrams of a light receiving element with an inter-element connection body used in Embodiment 1 as viewed from the back side, where FIG. 1A is a plan view, FIG. 1B is a cross-sectional view taken along line CD in FIGS. 1C is a cross-sectional view taken along the line EF in FIGS. 1 and 2, and FIG.
  • FIG. 4D is a cross-sectional view taken along the line GH in FIGS. 1 and 2 for easy understanding. Module forming members such as are omitted
  • FIGS. 1 and 2 The figure which shows the pattern of the contact bonding layer in the light receiving element module of Embodiment 1.
  • 2 is a diagram illustrating an inter-element connection body used in the light-receiving element module according to Embodiment 1, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c) is ( It is KL sectional drawing of a), (b), (c) shows the state in which the adhesive layer was formed in order to facilitate understanding It is a figure which shows an example of the positional relationship of the light receiving element of Embodiment 1, and an adhesive layer, (a) is a top view, (b) is the light receiving element of (a), and the connection between elements of an interelement connection body The top view which shows the state which mounted
  • FIG. 3 is a cross-sectional view showing the light-receiving element module according to the first embodiment, and shows a cross section AB in FIGS. It is the top view which looked at the light receiving element module by Embodiment 2 from the back surface side, and module forming members, such as a sealing material, are omitted for easy understanding
  • the perspective view which shows typically the positional relationship with the light receiving element which comprises the light receiving element module used in Embodiment 2, and an inter-element connection body, The state before connecting an inter-element connection body is set to an element and an inter-element connection body.
  • FIG. 6 is a diagram illustrating an inter-element connection body used in the light-receiving element module according to Embodiment 2, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c) is ( KL sectional view of a), (d) is an M 1 -N 1 sectional view of (a), and (e) is an M 2 -N 2 sectional view of (a). Sectional drawing which shows the light receiving element module of Embodiment 2.
  • FIG. 6 is a diagram showing a modification of the inter-element connection body used in the light receiving element module according to Embodiment 2, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c). (A) is a KL sectional view, (d) is an M 1 -N 1 sectional view of (a), and (e) is an M 2 -N 2 sectional view of (a).
  • the figure which shows the modification of the light receiving element with a connection body between elements The figure which shows the modification of the light receiving element with a connection body between elements
  • the perspective view which shows the modification of the connection body between elements used in Embodiment 1,2.
  • Plan view 25A is a cross-sectional view of a light receiving element with an inter-element connection body according to a fourth embodiment, where FIG. 25A is a cross-sectional view corresponding to the position of a line segment 6A-6B in FIG. 25A, and FIG. (A) A sectional view corresponding to the position of the line segment 6C-6D in FIG. 25, (c) is a sectional view corresponding to the position of the line segment 6E-6F in FIG.
  • the top view which showed from the back side the light-receiving element with the connection body between elements used as the modification of Embodiment 4 The top view which showed from the back side the light-receiving element with the connection body between elements used as the modification of Embodiment 4 Plan view on the element back surface side showing the pattern of the conductive region on the element surface of the element used in the fourth embodiment, in which the electrode on the semiconductor substrate has the opposite polarity to the conductive region in the semiconductor substrate under the electrode
  • Embodiments of a photoelectric conversion element module and a method for manufacturing a photoelectric conversion element module according to the present invention will be described below with reference to the drawings.
  • this invention is not limited to the following description, In the range which does not deviate from the summary of this invention, it can change suitably.
  • the scale of each member may be different from the actual scale for easy understanding. The same applies between the drawings.
  • the same components in the embodiments are denoted by the same reference numerals, and the components described in one embodiment are not described in detail in another embodiment.
  • a light receiving element is described as an example of a photoelectric conversion element.
  • various light emitting elements such as a light emitting element using a direct transition type GaAs as a semiconductor substrate and having a double heterojunction structure at a junction are also described. Applicable.
  • FIG. 1 and 2 are plan views of the light receiving element module according to Embodiment 1 as viewed from the light receiving surface side and the back surface side.
  • FIG. 3 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module.
  • the light receiving element module 1 according to the first embodiment is configured by connecting back connection type light receiving elements 10a to 10f in series.
  • each light receiving element is identified by the position of each light receiving element, it is set to 10a to 10f, and the light receiving element alone is collectively referred to as 10.
  • the light receiving elements 10 are electrically connected by an inter-element connection body 30 made of a conductive plate to form a linear element row, that is, a string, and an element composed of a main body portion 32 and an inter-element connection portion 31 between the strings. It is electrically connected by the inter-connection body 30.
  • FIG. 4 (a) shows a plan view of the light receiving element with an inter-element connection body used in Embodiment 1, as viewed from the back side.
  • 4B is a cross-sectional view taken along the line CD of FIGS. 1 and 2
  • FIG. 4C is a cross-sectional view taken along the line EF of FIGS. 1 and 2
  • FIG. 4D is a cross-sectional view taken along the lines of FIGS. FIG.
  • module forming members such as inter-element connectors and sealing materials are omitted for easy understanding.
  • a plurality of current collecting electrodes 14 and the back surface of the light receiving element 10 are arranged such that the second element electrode, which is a positive electrode, is arranged in parallel at regular intervals. It is composed of two current extraction electrodes 15 having intersections in the same plane, and an inter-element connection portion 31 is mounted along the two current extraction electrodes 15.
  • the main body portion 32 is in direct contact with the linear electrode 12 constituting the first element electrode which is a negative electrode, which is disposed in a plane without having an overlapping portion overlapping the second element electrode. ing.
  • a first element electrode is formed on the element to constitute an element electrode.
  • the main body 32 is widely distributed and connected to the entire surface of the linear electrode 12 and the main body 32 by the electrical connection body 21 while being insulated from the element electrodes other than the linear electrodes 12.
  • the pattern arrangement of the element electrode and the inter-element connection body 30 reduces the current collection distance on the inter-element connection body 30 and the element electrode, and increases the light absorptance by reflection of the element transmitted light by the main body 32 or the like. Can do.
  • the current extraction electrode 15 is formed on the non-light-receiving surface side and an electrode shadow by the current extraction electrode 15 cannot be formed. Therefore, it is preferable that the number of the current extraction electrodes 15 is large. From the viewpoint of productivity, it is better that the number is smaller, so that the number can be 4-16, for example.
  • the element electrode refers to an electrode formed on the light receiving element 10 such as the linear electrode 12, the current extraction electrode of the linear electrode 12, the current collecting electrode 14, the current extraction electrode 15 of the current collecting electrode 14, and the like.
  • the first and second element electrodes having two polarities constitute a single-layer structure and do not have overlapping portions, but are arranged in a plane.
  • the light receiving element 10 of the present embodiment does not have the current extraction electrode of the linear electrode 12 which is the first element electrode.
  • the current collecting electrode 14 in the second element electrode which is an element electrode having a polarity that is not directly connected to the main body portion 32 of the inter-element connector 30 is connected to the current extraction electrodes 15 that are cross-connected to each other.
  • the current extraction electrode 15 is directly connected to the inter-element connection portion 31 of the inter-element connector 30.
  • the first element electrode divided by the discontinuous part by the second element electrode is directly connected to the main body part 32 of the inter-element connector 30.
  • the current extraction electrode 15 is efficiently collected by the highly conductive inter-element connection portion 31 and the current extraction electrode 15, so that most of the current collecting resistance between the elements is the collecting electrode 14.
  • the distance from the current extraction electrode 15 to the current extraction electrode 15 is sufficient. Similar to the back electrode of the light receiving element having electrodes on both sides, the current extraction electrode 15 is distributed at the position where the surface of the element is divided. Therefore, the current collecting distance in the element electrode is the same as the passivation film on both sides. It is equivalent to the current collection distance of the back surface electrode of the light receiving element which has an element electrode. This means that the current collecting distance is at most about half or less than that of a conventional back-connected light receiving element having a current extraction electrode at the end of the element. If the conductor resistance of the element electrode is not different from the usual, it is half. It means that the current collecting resistance can be less than about.
  • the present embodiment relates to a back connection type light receiving element. Since the electrode shadow area does not increase even if the electrode area increases, the number of current extraction electrodes 15 and inter-element connection portions 31 can be arbitrarily increased. . Accordingly, by increasing the number of current extraction electrodes 15 and inter-element connection portions 31 to n, the current collection distance and the current collection resistance can be reduced to about 1 ⁇ 2 n, and the current collection distance in the element electrode having a large resistance can be reduced. It has the effect that it can be made shorter than the back surface electrode of the light receiving element which has an electrode on both surfaces normally.
  • the current collecting resistance by the element electrode is only the thickness of the first element electrode, and the resistance is greatly reduced. It becomes possible to do. Note that the current collecting resistance can be significantly reduced by adjusting the area ratio of the area occupied by the first and second element electrodes on the back surface of the element so that the wiring resistance between them is as small as possible. Since the width of the main body is wider than the width of the inter-element connection portion, it can be directly connected to a wider range of the first element electrodes and the current collecting resistance can be reduced.
  • the width of the body part of the inter-element connection body is wide, the thickness can be reduced while keeping the conductor resistance of the inter-element connection body low, so the difference in coefficient of thermal expansion between the element substrate and the inter-element part.
  • the advantage is that the warpage of the element due to the above can be reduced, the strength of the element can be kept high, and damage can be prevented.
  • the number of inter-element connection sections can be increased, and as a result, the projected area of the inter-element connection section with respect to the elements can be increased. It is possible to reduce the warpage of the device, to keep the strength of the device high, and to prevent breakage.
  • the direct connection means an electrical connection with a low resistance such as a connection through a conductive adhesive layer such as a solder layer or a connection by welding, or a close connection by electrostatic bonding.
  • the current lead line 38 is connected to the light receiving element 10, and although not shown, the light receiving element row is sealed with the sealing material 22. ing.
  • the sealing structure will be described later.
  • the semiconductor substrate 11 is covered with the front-side main surface material 23 on the outer side of the sealing material 22 as shown in the cross section AB of FIGS. 1 and 2 in FIG.
  • a part of the two current lead lines 38 exits the sealing material 22 and the back side main surface material 25 from the holes formed in the back side main surface material 25 and the back surface side sealing material 22. It becomes a state.
  • the current lead line 38 coming out from the sealing material 22 is connected to a conductor in the junction box so that it can be taken out of the light receiving element module 1 through a cable connected to the junction box.
  • the frame and the junction box are not shown for easy viewing.
  • the structure of the light receiving element module 1 in which the light receiving elements 10 are connected by the interelement connecting bodies 30 will be described, then the structure of the light receiving elements 10 will be described, and the interelement connecting bodies 30 for connecting the light receiving elements 10 to each other. The structure of will be described.
  • the light receiving element module 1 includes light receiving elements 10a to 10f and an inter-element connection body 30 that connects the light receiving elements 10a to 10f.
  • the inter-element connector 30 is connected to the back connection type light receiving elements 10a to 10f having the first and second element electrodes on the back side, and the main body 32 covers almost the entire back surface of the light receiving elements 10a to 10f.
  • an inter-element connection portion 31 connected to the main body portion 32 and connected to the second element electrode of the adjacent light receiving element.
  • the linear electrodes 12 as the first element electrodes and the collecting electrodes 14 as the second element electrodes of the light receiving elements 10a to 10f include parallel portions arranged alternately so as to be parallel to each other at a constant interval.
  • the second element electrode includes a current extraction electrode 15 that intersects the parallel collecting electrode 14.
  • the main body 32 is formed of a light reflector having high reflectivity with respect to light transmitted through the light receiving element 10 on the surface of the portion other than the connection point or the connection region with the first element electrode of the light receiving element 10.
  • the main body 32 is selectively connected directly to the linear electrode 12 that is the first element electrode of the light receiving elements 10a to 10f, and is an insulating layer for the current collecting electrode 14 that is the second element electrode. It arrange
  • the reflection portion is constituted by the adhesive layer 26 between the main body 32 and the light receiving elements 10a to 10f, and the first element electrode including the linear electrode 12 and the current collecting electrode 14 are provided. Reflected light is incident on the light receiving elements 10a to 10f through the gap between the second element electrodes provided with the photoelectric conversion efficiency.
  • FIG. 5 shows the shape of the adhesive layer 26 in the module state.
  • the inter-element connection portion 31 is connected to the main body portion 32 and is adjacent thereto. It is connected to a current extraction electrode 15 that is a second element electrode of the light receiving element 10.
  • the second element electrode intersects with the current collecting electrode 14 at both ends of the line segment of the current collecting electrode 14 at a length of about 1/4 of the line segment, that is, on the current collecting electrode 14. Since the current extraction electrode 15 is arranged so as to have a crossing portion with respect to the current electrode 14, the current collection distance from the second element electrode to the inter-element connector is extremely short, and the current collection is performed efficiently. Electricity is made.
  • the main body 32 is selectively connected directly to the linear electrode 12 and is disposed on the current collecting electrode 14 via an adhesive layer 26 that is an insulating layer, except for the slit S portion. Cover the entire back side.
  • the current extraction electrode 15 divides the linear electrode 12 as the first element electrode at two locations in the longitudinal direction of the linear electrode 12, and is arranged so as to intersect the longitudinal direction of the current extraction electrode 15 at the division portion. Has been. As described above, although the linear electrode 12 is divided, the current collecting distance to the inter-element connector 30 is the thickness of the linear electrode 12 because it is in direct contact with the main body 32 of the inter-element connector 30. It is only a part, almost equal to 0, and the conductive resistance is very low.
  • the light receiving element 10 of the first embodiment is a thin plate-like pn junction having a rectangular planar shape and a thickness of, for example, 0.05 to 0.5 mm.
  • the semiconductor substrate 11 is provided.
  • the rectangle here means a quadrangular shape having two sets of parallel sides perpendicular to each other.
  • a substrate having a shape in which a part of the corner is cut off is used.
  • Those that are slightly deformed, including the above shapes, are also included in the rectangle.
  • an example of a shape in which a part of a square corner is cut off is shown, but a rectangular shape may be formed by dividing this into half.
  • a linear electrode 12 as an element electrode of one polarity, a collecting electrode 14 as an electrode of the other polarity, A current extraction electrode 15 of the current collecting electrode 14 is formed.
  • a part of the linear electrode 12 is electrically connected to the substrate through an opening of a passivation film (not shown) of the element substrate, but the other part of the electrode is in contact with the passivation film and reflects light transmitted through the element. Therefore, the material of the linear electrode 12 mainly includes a material having a high light reflectance in a wide wavelength range of metals such as aluminum (Al), nickel, tin, copper, silver, gold, a mixture thereof, and an alloy.
  • a metallic material to form a reflective metal layer.
  • a barrier layer that suppresses the reaction with the metal material or the reflective metal layer as the second layer on the reflective metal layer, the electric conduction in the linear electrode 12 can be improved.
  • metals such as nickel, tin, copper, silver, titanium tungsten (TiW), mixtures and alloys of the above materials, and laminates of the above materials can be used.
  • the material constituting the element electrode itself may include additives such as a resin component or a glass component in addition to metal, and a conductive adhesive may be used.
  • a translucent electrode formed by a translucent conductive film such as indium oxide And a laminate of metal layers such as aluminum, silver, and gold may be used.
  • the outermost layer of the laminated body of the linear electrodes 12 it is preferable to use a material suitable for connecting to the inter-element connector 30 when modularizing.
  • a material suitable for connecting to the inter-element connector 30 when modularizing, it is preferable to use a metal having solder bonding properties such as copper, tin, and silver.
  • the linear electrode 12 and the current collecting electrode 14 of the first embodiment are electrodes that collect electric charges generated by photocarrier generation from the semiconductor substrate 11 and collect current, and are arranged at appropriate intervals.
  • the pattern of the linear electrode 12 is a junction formed by doping, a heterojunction, or a straight line extending in a certain direction with a width of about 0.05 to 1 mm, for example.
  • the shape portions are arranged in parallel with the direction orthogonal to the extending direction of the electrodes with a period of 0.2 to 2.5 mm to constitute a parallel portion.
  • the pattern of the collector electrode 14 also varies depending on the element structure, such as whether it is a junction formed by impurity doping or a heterojunction, but for example, a linear shape extending in a certain direction with a width of about 0.2 to 2 mm
  • the portions are arranged in parallel with a direction orthogonal to the extending direction of the electrodes with a period of 0.2 to 2.5 mm to constitute a parallel portion.
  • the widths of the linear electrode 12, the current collecting electrode 14, and the current extraction electrode 15, which are element electrodes, need not be the same, and are designed according to the current collecting distance or the minority carrier diffusion length of the substrate.
  • the collecting electrodes 14 are widely distributed on the back surface side and have a function of collecting current to the current extracting electrode 15.
  • the current collecting electrode 14 can be composed of, for example, a material mainly composed of a conductor such as aluminum, silver, copper, nickel, tin, a mixture thereof, an alloy, and a laminate thereof.
  • the current extraction electrode 15 is connected to the current collecting electrode 14 of one polarity, and functions as a current extraction electrode that extracts the current collected by the current collecting electrode 14 to the outside of the light receiving element 10.
  • the current extraction electrode 15 may be formed in a separate process, but is often formed in the same process as the current collecting electrode 14, and similarly contains mainly aluminum, silver, copper, nickel, and tin.
  • the electrodes such as the current extraction electrode 15 may contain additives such as glass frit and resin.
  • the current collected by the current collecting electrode 14 is taken out to the outside of the element through the current extracting electrode 15 and the inter-element connector 30.
  • the electrode height of the electrodes may be the same height among the linear electrode 12, the current collecting electrode 14, and the current extraction electrode 15, but a case where the height is different in the first embodiment will be described.
  • the current extraction electrode has the same height as the linear electrode.
  • the height of the electrode of the linear electrode 12 in FIGS. 4 (a) to 4 (d) is the current extraction.
  • the height of the collector electrode 14 and the current extraction electrode 15 is preferably about 5 to 50 ⁇ m.
  • the case where it forms in the thin linear form as the linear electrode 12 is shown here, it does not need to be linear and may be an electrode group formed by separating a plurality of dotted electrodes.
  • the main body portion 32 of the inter-element connector 30 and the linear electrode 12 can be directly connected, there is no need to provide a current extraction electrode on the first element electrode side. Also good.
  • a current extraction electrode connected to the first element electrode side that is, the linear electrode 12 of one polarity may be separately provided.
  • the current extraction electrode is connected to the main body 32 of the inter-element connector 30 and functions to extract the current collected by the linear electrode 12 to the outside of the light receiving element 10.
  • intersection includes that in which the inter-element connection portion 31 is arranged so as to intersect the point-like electrode or the current collecting electrode when the point-like electrode group is viewed as a line.
  • a collection of point-like electrodes exists as the current extraction electrode 15 so as to have an intersection with the linear current collection electrode 14, covers the current extraction electrode 15, and contacts the linear current collection electrode 14.
  • the inter-element connection portion 31 of the inter-element connector 30 may be formed.
  • the linear electrode 12 may also have a dot shape, and the light transmitting electrode may be a flat metal electrode formed on the light transmitting electrode.
  • the current collecting electrode 14 may not be orthogonal to the current extraction electrode 15 or the inter-element connection body 31, and the inter-element connection body 30 arranged approximately in parallel with the direction in which the string extends, There should be a pattern in which there is an electrode for collecting current on the device up to the connection body 30.
  • the second element electrode side does not have to be formed separately from the current collecting electrode 14 as the current extraction electrode 15, and the pattern of the entire element electrode is the first element electrode and the second element electrode having different polarities. It is sufficient that they are separated.
  • the element electrode may have a laminated structure of a translucent conductive film and a metal electrode which are insulated between the negative electrode and the positive electrode and formed on the entire surface excluding the inter-electrode region.
  • a translucent electrode such as indium oxide may be formed on the outermost layer on the non-light-receiving surface side on the passivation film such as an amorphous silicon film on the semiconductor element, and one electrode portion and the other electrode portion A structure in which indium oxides are electrically separated from each other can be obtained.
  • a linear electrode 12, a collecting electrode 14, and a current extraction electrode 15 are formed on the respective laminated films of the translucent conductive layer and the impurity-doped amorphous silicon film.
  • an n-type amorphous silicon film as a passivation film on the light receiving surface side and an amorphous silicon nitride film or a high refractive index film such as titanium dioxide formed as a reflection preventing film by a thin film process such as sputtering or CVD. are stacked.
  • the element surface is inactivated, that is, passivated.
  • a heterojunction solar produced by an amorphous silicon film formed on a single crystal silicon substrate and a semiconductor material such as microcrystalline silicon, gallium arsenide, or aluminum gallium arsenide Examples thereof include a battery, or a single crystal silicon solar cell that is passivated with a passivation film such as a silicon oxide film, a silicon nitride film, or aluminum oxide.
  • the element structure is not particularly limited, for example, in the case of a light receiving element using a heterojunction, as the semiconductor substrate 11, an intrinsic amorphous silicon film having a thickness of about 5 nm is formed on both surfaces of a single crystal n-type silicon substrate. Further, a p-type amorphous silicon film and an n-type amorphous silicon film are laminated on one surface of the single crystal n-type silicon substrate on which an intrinsic amorphous silicon film is formed.
  • a p-type amorphous silicon film is formed on an electrode portion of one polarity, for example, a portion where the current collecting electrode 14 and the current extraction electrode 15 are formed, and a linear electrode which is an electrode portion of the other polarity
  • An n-type amorphous silicon film is formed in a portion where 12 is formed.
  • the electrodes can be electrically insulated, and an intrinsic amorphous silicon film or an insulating film such as a silicon oxide film can be formed between the p layer and the n layer.
  • Translucent electrodes that are insulated from each other are formed on the p layer and the n layer, and a current collecting electrode 14, a current extraction electrode 15, and a linear electrode 12 are formed on the translucent electrode, respectively.
  • the semiconductor junction region formed on the surface of the light receiving element 10 may be formed by impurity element implantation called thermal diffusion of impurities or ion implantation.
  • a passivation film is formed on the surface of the semiconductor substrate 11, but the description is omitted in the drawings of this specification except when attention is paid to the passivation film, and only the semiconductor substrate 11 is described in the drawing. ing.
  • the light receiving element 10 of the present embodiment may be a light receiving element using not only a heterojunction but also a homojunction formed by diffusing a dopant.
  • a dopant for example, single crystal n-type silicon is used as the semiconductor substrate 11, and the collector electrode 14 and the current extraction electrode 15 that are in contact with a p-type semiconductor region formed by thermal diffusion of boron are used as positive electrodes, and phosphorus is thermally diffused.
  • the linear electrode 12 in contact with the n-type semiconductor region thus formed operates as a negative electrode.
  • the separation distance or pitch of the p-type semiconductor region can be made finer, and the hole diffusion length is rate-limiting.
  • the carrier movement distance to the p-type semiconductor region can be reduced, and the carrier collection efficiency in the device can be further increased.
  • the separation distance between the semiconductor substrate 11 and the n-type semiconductor region forming the pn junction is small in order to reduce the distance of carrier movement in the p-type substrate where the electrons are rate-limiting. It is preferable to make it small.
  • the inter-element connector 30 is connected to the current extraction electrode 15 as shown in FIGS. 6A to 6C, FIGS. 7A to 7C, and FIG.
  • the main body portion 32 has a complementary shape to the inter-element connection portion 31 and covers the entire back surface of the element substrate except the region where the inter-element connection portion 31 is arranged and its periphery and the vicinity of the outer periphery of the element substrate.
  • FIG. 6 (b) and 6 (c) are the IJ cross-sectional view and the KL cross-sectional view of FIG. 6 (a), respectively, in which a part of the module is taken out by one repeating unit of the string.
  • FIG. 6C shows the adhesive layer 26.
  • the inter-element connection portion 31 formed integrally with the main body portion 32 is composed of a flexible conductive foil, and on the one hand, one of the element electrodes, for example, a linear electrode which is a first element electrode 12 and the current extraction electrode 15 are selectively connected to each other, and are in contact with the current extraction electrode 15 that is the second element electrode of the adjacent light receiving element 10.
  • the current collecting electrode 14 as the second element electrode is also formed in a stripe shape at a constant interval, that is, in a linear shape spaced apart in parallel, and has two current extraction electrodes 15 intersecting the current collecting electrode 14.
  • the inter-element connection portion 31 is in contact with the current extraction electrode 15. Therefore, since the short-distance connection is made to the inter-element connection portion 31 having a low resistance in the substrate in-plane direction, the current collection distance of the second element electrode can be reduced, and the current collection resistance can be reduced. .
  • the current extraction electrode 15 is exposed from the opening of the adhesive layer 26 in the vicinity of the second electrode from the element end of the current collecting electrode 14, that is, from the upper part in each figure.
  • the drawings are described so that regions to be formed are formed. However, in reality, depending on the number of current extraction electrodes 15 on the element, when the element substrate is 156 mm square, a region corresponding to the current extraction electrode 15 is formed from a portion of about 5 to 50 mm from the end of the element substrate. Is done.
  • the length range of the current extraction electrode 15 is determined mainly by the conductor resistance of the current extraction electrode 15.
  • the inter-element connection portion 31 of the inter-element connection body 30 generally has a lower resistance than the current extraction electrode 15. From the viewpoint, it is preferable that the connection length between the inter-element connection portion 31 and the current extraction electrode 15 is long. On the other hand, it does not have to be as long as the element. When the number of current extraction electrodes 15 is large, the electrode cross-sectional area is large, and the resistance is sufficiently low, the inter-element connection portion 31 can be shortened.
  • the inter-element connection portion 31 When the inter-element connection portion 31 is shortened, the warpage of the element with the inter-element connection body due to the difference in thermal expansion coefficient between the element substrate and the inter-element connection portion 31 can be reduced.
  • the fact that the actual connection length between the inter-element connection portion 31 of the inter-element connection body 30 and the current extraction electrode 15 is not limited to the illustration is the same in the present embodiment as well as the following embodiments. .
  • the main body portion 32 has a slit S having a shape corresponding to the inter-element connection portion 31 and has a complementary shape with the inter-element connection portion 31. Since the inter-element connection portion 31 of the adjacent inter-element connection body 30 is disposed in the slit S of the main body portion 32, not only positioning is easy, but also a step is reduced. By applying the adhesive layer 26 made of an insulating resin to the side surface of the inter-element connection portion 31 in advance, a short circuit with the main body portion 32 of the adjacent inter-element connection body 30 can be prevented. 7A to 7C between the current extraction electrode 15 and the light receiving element 10 excluding the connection point between the main body 32 and the linear electrode 12 and the main body 32 of the inter-element connector 30.
  • an adhesive layer 26 made of an insulating resin is filled.
  • the adhesive layer 26 is formed on the module back surface side of the inter-element connection portion 31.
  • the inter-element connector 31 may be sealed by covering it with the adhesive layer 26.
  • the adhesive layer 26 made of an insulating resin may have light scattering particles.
  • FIG. 8 shows an example of a pattern shape when the inter-element connector 30 is formed by punching.
  • the inter-element connection portion 31 and the main body portion 32 are complementary.
  • the linear electrode 12 which is the first element electrode on the light receiving elements 10a to 10f.
  • the main body portion 32 which is a planar shape portion of the inter-element connector 30 over the entire area of the semiconductor substrate 11.
  • the inter-element connecting portion 31 intersects one of the element electrodes, for example, the current collecting electrode 14 that is the second element electrode. Are connected selectively along the current extraction electrode 15 of the second polarity element electrode. Therefore, as compared with the case where the current extraction electrode portion is only at the end portion of the element substrate as in Patent Document 1, the second element electrode that is the element electrode connected to the semiconductor substrate 11 is connected to the element connection element 30. Since the connection distance to the connection portion 31 is short and a conductor having the same or similar area as the light receiving elements 10a to 10f can be used, resistance loss is small.
  • the transmitted light that has passed through the light receiving elements 10a to 10f can be reflected and re-entered to the light receiving element 1, so that the light transmission loss can be reduced and the light receiving element module 1 having a high power generation output with respect to the installation area can be obtained. it can.
  • the inter-element connection body 30 is formed of a metal conductive plate, that is, a continuous body, and has the same or similar size as the inter-element connection portion 31 that connects the elements and the light receiving element 10. And it is comprised from the main-body part 32 which is a planar conductor part connected to the back surface side of the light receiving element 10 of an equivalent shape.
  • the inter-element connection body 30 can be manufactured very easily, for example, by punching a copper foil.
  • the inter-element connector 30 of the present embodiment is formed from a base material obtained by simply cutting a metal, for example, an element in which a positive electrode and a negative electrode are insulated from each other and sandwiched between resin sheets as in Patent Document 3 It can be manufactured at a lower cost than an inter-connection body.
  • a low resistance conductive plate such as copper or aluminum is preferably used as the substrate, and a conductive adhesive layer such as solder plating is formed on the substrate.
  • copper foil is used as the body portion 32 of the inter-element connection body 30 having flexibility and the inter-element connection section 31 of the inter-element connection body 30, but in the first embodiment, the integrated structure is continuous. It may not be a metal foil.
  • a metal film deposited on a polyimide film, a metal particle-containing resin, a metal particle group formed by drying a printing paste, a film to which a metal sintered body is connected, or a conductor such as a foil can be used as the main body portion 32 and the inter-element connection portion 31.
  • the inter-element connection portion 31 and the main body portion 32 may be configured from different parts.
  • the inter-element connection portion 31 and the main body portion 32 are formed as separate structures, the inter-element connection portion 31 and the main body portion 32 are connected via the electric connection body 21 or the second electric connection body made of another material. Is done.
  • the inter-element connection body 30 is formed as a separate structure of the main body part 32 for light reflection and the inter-element connection part 31, it is easy to manufacture, and the same element as the inside of the string at the string end of the module It has the advantage that an inter-connector can be used.
  • inter-element connection body 30 is formed as a separate structure of the main body portion 32 for light reflection and the inter-element connection section 31, different materials can be used, and the strength of the element with the inter-element connection body can be increased. Conductivity, connectivity, and light utilization efficiency can be improved.
  • the height by which the first element electrode of the light receiving element protrudes toward the inter-element connection body than the second element electrode can be adjusted as necessary, the height difference between the first and second element electrodes can be adjusted.
  • the connection portion between the element electrode and the main body portion 32 of the inter-element connection body 30 and the insulating portion between the inter-element connection section 31 can be separated, and in the substrate plane when the inter-element connection body 30 is connected to the element This has the advantage that precise alignment in the direction of several hundreds of micrometers is unnecessary.
  • the main body portion 32 of the inter-element connection body 30 may be formed of a conductive foil, for example, a copper foil flat plate, or may be used by pressing the flat plate in advance to form a concavo-convex shape.
  • the main body portion 32 has an uneven shape, the main body 32 of the interelement connection body 30 in the portion of the other collector electrode 14 and current extraction electrode 15 with respect to the main body portion 32 of the portion roughly corresponding to the one linear electrode 12.
  • the portion 32 becomes a recessed shape, that is, a concave portion, and the portion corresponding to the linear electrode 12 becomes a relatively protruding shape, that is, a convex portion.
  • the convex part on the inter-element connector 30 side means protruding from the element substrate, and the concave part means being further away from the element substrate.
  • the convex part and the concave part do not necessarily have to be formed corresponding to the positions of the linear electrode 12 and the collecting electrode 14, respectively, and if the concave and convex interval is formed narrower than the element electrode pitch, the protruding linear shape It can be set as the structure where the convex part of the main-body part 32 is connected with respect to the electrode 12, This eliminates the need for precise alignment.
  • the size of the main body portion 32 of the inter-element connector 30 is such that it can cover the outer peripheral portion of the linear electrode 12 on the element of FIG.
  • the end portion of the body portion 32 of the body 30 is fixed, and the bondability can be improved. Therefore, in FIG. 4A, the linear electrode 12 has an electrode pattern that comes outside the collecting electrode 14. In addition to the pattern of FIG. 4A, the linear electrode 12 may be formed so as to further surround the inner side of the outer periphery of the element substrate.
  • the light receiving element 10 In connection between the inter-element connection body 30 and the element electrode, the light receiving element 10 has the linear electrode 12 as the first element electrode and the collector electrode 14 as the second element electrode on the same surface, that is, the negative electrode Therefore, it is necessary to insulate between the electrodes.
  • a gap may be used as an insulating layer between the main body 32 and the collecting electrode 14, but in order to improve the reliability, FIG. 4 (a) to FIG.
  • an adhesive layer 26 is formed so as to mainly cover the current collecting electrode 14 except for only a part of the current extraction electrode 15 of the light receiving element and to expose most of the linear electrode 12 to the outside. .
  • the adhesive layer 26 may partially overlap the linear electrode 12.
  • the main body portion 32 when the main body portion 32 has irregularities, it may be formed between the convex portion and the linear electrode 12 as long as it is a concave portion and part of the main body portion 32 in the connection portion with the linear electrode 12.
  • the adhesive layer 26 When forming the adhesive layer 26, the adhesive layer 26 is formed thicker than a predetermined gap between the main body 32 and the semiconductor substrate 11, and the main body 32 is pressed against the semiconductor substrate 11 after the adhesive layer 26 is formed.
  • a method of spreading the adhesive layer 26 in the lateral direction can be used.
  • the width of the adhesive layer 26 is formed to be narrower than the line width of the current collecting electrode 14, spreads when the main body 32 is connected, and has a shape as shown in FIG.
  • the inter-element connection Main portions other than the soldered portion between the body 30 and the light receiving element 10 are bonded by the adhesive layer 26.
  • resin such as ethylene vinyl acetate (EVA), epoxy containing filler, polyimide, or the like can be used.
  • EVA ethylene vinyl acetate
  • the adhesive layer 26 may have a light reflection or light scattering function.
  • ethylene vinyl acetate containing a high concentration of inorganic particles such as titanium dioxide particles of about several hundred nm can be used.
  • the size of the inorganic particles used here is preferably smaller than about half of the distance between the current collecting electrode 14 and the inter-element connection body 30 after the light receiving element 10 and the inter-element connection body 30 are connected. In order to impart the property, it is preferable to set the particle size to be about half the wavelength of the light to be scattered.
  • the adhesive layer 26 connects the inter-element connection body 30 and the light receiving element 10
  • the adhesive layer 26 must adhere between the inter-element connection body 30 and the light receiving element 10 without any gap.
  • the adhesive layer 26 may cover the element electrode, but may not be in contact with the main body 32 of the inter-element connection body.
  • the main body part 32 of 30 may be covered but may not be in contact with the element electrode.
  • an epoxy resin precursor is applied in advance to the back surface side of the light receiving element 10, except for the linear electrode 12, and bonded to the main body portion 32 of the interelement connection body 30. Heat and cool. Then, by melting the solder once to electrically connect the main body portion 32 of the inter-element connector 30 and the linear electrode 12 on the light receiving element, the epoxy resin as the adhesive layer 26 is polymerized and cured, whereby the element The main body portion 32 of the inter-connection body 30 and the light receiving element 10a can be bonded.
  • the polymerization temperature of the precursor of the adhesive layer 26 or the softening point of the insulating resin is the same as the melting point of the electrical connector 21 or The same or higher is preferable.
  • a solder such as a bismuth solder that melts at a relatively low temperature is used as the electrical connection body 21.
  • an insulating resin such as a resin reinforced with a reinforcing agent such as polyimide or glass fiber is preferably used.
  • a thing with a viscosity and low fluidity is preferable as an epoxy resin precursor. Further, as described in Patent Document 10, for example, a method of curing the adhesive layer in two steps is also applicable.
  • heating is performed while bonding the main body portion 32 of the inter-element connection body 30 that does not have the electrical connection body 21 and the back surface side of the light receiving element 10 on which the solder layer is formed on the linear electrode 12. Thereafter, the body portion 32 of the inter-element connector 30 and the light receiving element 10a can be bonded by cooling.
  • bonding first, the solder is once melted to electrically connect the main body portion 32 of the inter-element connector 30 and the linear electrode 12 on the element. And after supplying an epoxy resin precursor between the main-body part 32 and the element back surface of the interelement connection body 30 bonded together using a capillary phenomenon, it heats again, and an epoxy monomer is superposed
  • the melting point of the electrical connection body 21 is equal to or higher than the polymerization temperature or softening point of the adhesive layer 26.
  • the adhesive layer 26 may be cured in advance before connecting the inter-element connector 30. In the above case, the adhesive layer 26 is bonded to the current collecting electrode 14 out of the element substrate and the element electrode. Thus, the linear electrode 12 and the main body 32 of the inter-element connector 30 are not bonded.
  • a contact heat source such as a hot plate, a non-contact heat source such as an air heater, a laser, or an infrared lamp can be used.
  • the adhesive layer 26 By making the adhesive layer 26 have the above-described structure, the electrical connection between the linear electrode 12 and the body portion 32 of the inter-element connector 30 is not disturbed, while the current collecting electrode 14 and the body portion 32 of the inter-element connector 30 are Can keep the insulation between.
  • the current collecting electrode 14 When maintaining the insulation between the current collecting electrode 14 and the main body portion 32 of the inter-element connector 30, the current collecting electrode 14 is mainly covered as the adhesive layer 26, and the linear electrode 12 and the current extraction electrode 15 are large.
  • a resin film having a shape that does not cover the portion can also be used as a material.
  • a resin having a shape equivalent to that of the current collecting electrode 14 is applied and dried on the main body 32 of the inter-element connector 30 in advance, and a solder paste is applied to a portion other than the resin application region. It is good also as the electrical connection body 21 of the linear electrode 12 and the inter-element connection body 30 on the back surface.
  • the melting point of the electrical connection body 33 used in subsequent processes such as the process of connecting the current lead line 38 to the main body 32 of the inter-element connection body 30 is the same as that of the linear electrode 12.
  • a lower one than the melting point of the electrical connection body 21 used in the connection step with the inter-element connection body 30 is preferable because it does not cause a positional shift accompanying remelting of the electrical connection body 21.
  • connection bodies having different melting points for example, when the inter-element connection portion 31 and the main body portion 32 of adjacent elements are formed from different members, the inter-element connection body 32 and the linear connection body are formed.
  • the connection with the electrode 12 is performed using an electrical connection body having a high melting temperature, and when the string is formed after the connection, the inter-element connection portion 31 of the inter-element connection body 30, the current extraction electrode 15, and the adjacent one.
  • an electric connection body having a lower melting temperature so as not to cause misalignment.
  • the combination of high and low melting temperatures depending on the location of the electrical connector may be reversed from the above according to the order of manufacture.
  • the flow temperature or melting temperature of the adhesive layer 26 is preferably higher than the melting point of the electrical connection body 21.
  • the electrical connection body 21 specifically, a silver-silver solder, a conductive adhesive, and a conductive tape can be used.
  • the electrical connection body 21 is formed on almost the entire surface of one side of the inter-element connection body 30 (FIGS. 4 (b) to 4 (d)), but the inter-element connection body itself is like a tin foil. As a low melting point metal, it may also serve as an electrical connector.
  • the electrical connector 21 is preferably made of a material having as high a light reflectance as possible.
  • the electrical connection body 21 is formed only at a portion where the element electrode and the inter-element connection body 30 are connected between the electrodes. It is preferable.
  • the portion where the electrodes are connected mainly refers to the overlapping portion of the inter-element connector 30, the current extraction electrode 15 and the linear electrode 12.
  • the main body portion 32 and the inter-element connection portion 31 of the inter-element connector 30 shown in FIGS. 6A to 6C are connected to the element electrode on the back surface of the light-receiving element.
  • the light receiving element with an inter-element connection body having the back surface shown in FIG. As shown in FIG. 2, the end portion of the linear electrode 12 should be visible from the slit S of the main body portion 32, but is omitted in FIG. 7C.
  • FIG. 7C the element part with the inter-element connection body seen through the main body part 32 is drawn, and the main body part 32 of the inter-element connection body 30 is a region where the main body part 32 is arranged by a dotted line. It is shown.
  • the element electrode forming portion is externally covered when the linear electrode 12 and the current extraction electrode 15 are covered with the metal of the main body portion 32 or the resin made of the adhesive layer 26. This is preferable because the intrusion of moisture is reduced and the reliability and durability are improved.
  • the linear electrode 12 and the current extraction electrode 15 which are element electrodes are hidden by the main body 32 and the adhesive layer 26 and are not exposed on the surface of the light receiving element 10. It may be.
  • the position of the main body portion 32 of the inter-element connection body 30 is indicated by a dotted line, and the main body portion 32 itself of the inter-element connection body 30 is transmitted to describe the structure on the back side of the element. .
  • the inter-element connection body 30 can be manufactured, for example, by punching a copper foil.
  • the main body portion 32 and the inter-element connection portion 31 do not have to be integrally formed.
  • the inter-element connection portion 31 and the main body portion 32 are formed of different members, and solder or conductive adhesive It may be connected later by, for example.
  • the inter-element connection body 30 is integrally formed using the conductor.
  • the inter-element connection portion 31 and the main body portion 32 may be formed in the same manner and connected later with solder or a conductive adhesive.
  • the thickness of the inter-element connection body 30 can be set to 0.01 to 1 mm, for example.
  • the inter-element connection portion 31 or the main body portion 32 may be thinned by punching or rolling.
  • the main body portion 32 of the inter-element connector 30 may have an uneven portion or a cutout portion other than the through hole and the slit S.
  • the main body portion 32 of the inter-element connection body 30 has a through hole, a slit, or other cutout portion, by supplying the adhesive layer 26 in a fluid state at a temperature lower than the melting temperature of the electrical connection body 21, Since the adhesive layer 26 enters between the body portion 32 of the inter-element connector 30 through the through hole, slit, or cutout formed in the body portion 32 of the inter-element connector 30, there is an advantage that it is easy to encapsulate. is there.
  • FIG. 20 shows an element electrode in which an electrical connection body 21 made of a solder plating layer by selective plating is formed.
  • FIG. 21 shows a structure in which an electrical connection body 21 made of a solder plating layer is formed on the entire surface of the main body portion 32 of the inter-element connection body 30.
  • the light-receiving element 10 having the first and second element electrodes is formed on the back side, and the inter-element connection body 30 is selectively and directly connected to the first element electrode.
  • the second element electrode is mounted via an insulating layer so as to be disposed via an insulating adhesive layer.
  • a linear electrode 12 that is a first element electrode and a second element electrode are provided on the back side of the semiconductor substrate 11 that constitutes the light receiving element 10.
  • a current collecting electrode 14 and a current extraction electrode 15 are formed.
  • the inter-element connection portion 31 of the inter-element connection body 30 is connected to the current extraction electrode 15 formed on the back surface of the light receiving element 10 via the electric connection body 21, and the main body portion 32 is different from the light receiving element 10.
  • the linear electrode 12 formed on the back surface side of the element 10 electrical connection between two adjacent light receiving elements 10 is achieved, and an element string is formed.
  • a string in which the light receiving elements 10a, 10b, and 10c are linearly connected is formed.
  • the linear string formed by the light receiving elements 10a, 10b, and 10c and the linear string formed by the light receiving elements 10d, 10e, and 10f are connected by solder or a conductive adhesive, so that FIG.
  • the element arrangement of the light receiving element module 1 in which the two string rows shown in 2 are connected in series is formed.
  • the light receiving elements 10 a and 10 f serving as the terminal portions of the light receiving element module 1 are connected to a current drawing line 38 for extracting current from the light receiving element module 1.
  • the shape of the inter-element connection body 30 of the light receiving elements 10a and 10f is different from that of the other light receiving elements 10b to 10b.
  • the shape is different from that of 10e.
  • the current extraction line 38 is connected to the current extraction electrode 15 portion, and in the light receiving element 10f, the current extraction line 38 is connected to the main body portion 32 of the inter-element connection body 30 through the electric connection body 21, thereby enabling external connection. ing. Further, in the present embodiment, the positional relationship between the main body portion 32 of the inter-element connection body 30 and the inter-element connection portion 31 of the inter-element connection body 30 is different between the string end and the inside of the string.
  • sheet-like sealing material 22 such as an ethylene vinyl acetate resin sheet is provided on the front surface side and the back surface side of the light receiving element array including the two rows of strings illustrated in FIGS. 1 and 2.
  • the surface side main surface material 23 such as glass is bonded to the front surface side, that is, the light receiving surface side through the sealing material 22, and the back surface side main surface such as a weather-resistant polyethylene terephthalate resin sheet is bonded to the back surface side.
  • the face material 25 is bonded.
  • connection portion of the substrate itself with the linear electrode 12 and the vicinity of the connection portion protrude from the current collecting electrode 14 and the current extraction electrode 15. It is good also as a structure to do.
  • connection portion between the element substrate and the linear electrode 12 and the element substrate in the vicinity of the connection portion project from the connection portion between the element substrate and the current collecting electrode 14 and the current extraction electrode 15,
  • the height difference between the polarity electrode and the other polarity electrode is increased by the height difference on the substrate.
  • the light receiving element module 1 is configured by taking the structure from the cut through the junction box to the back surface.
  • the light-receiving element module structure shown in FIGS. 1, 2, and 9 can be obtained by sealing the light-receiving surface side and the back surface side of the element string row created as described above with a sealing material and a main surface material. It becomes.
  • a sheet-like ethylene vinyl acetate resin or the like is sealed on the front side and back side of the light receiving element array composed of two rows of strings shown in FIGS. 1 and 2.
  • a stop material 22 is disposed, and a front-side main surface material 23 such as glass is disposed on the front surface side through the sealing material 22, and a back-surface side main material such as a weather-resistant polyethylene terephthalate resin sheet is disposed on the back surface side.
  • a face material 25 is disposed.
  • the collector electrode 14 and the current extraction electrode 15 that are the second element electrodes are positive electrodes, and the area of the second element electrode is that of the linear electrode 12 that is the first element electrode. It is larger than the area.
  • the minority carriers are transferred to the pn junction when the area of the pn junction is larger than the area of the nn + junction. The rate of arrival and contribution to power generation is increased, and therefore the current extraction efficiency and power generation efficiency are increased.
  • the reflector is formed directly on the substrate, so that the light utilization efficiency is increased.
  • the inter-element connection body 30 can be formed of separate parts for the connection area between the reflector and the electrical connection body, materials suitable for each can be used, and the element electrode having excellent reflectivity and connectivity And an element having an element electrode.
  • the reflective layer includes not only a layer made of a reflective material but also a scattering layer.
  • the first element electrode protrudes toward the main body 32 of the inter-element connector 30 compared to the second element electrode, a precise difference can be obtained by providing a difference in height between the element electrodes.
  • the main body 32 can be connected only to the element electrode of one polarity without requiring alignment.
  • the insulation is high, the thickness of the laminated portion of the inter-element connection body 30 is small, bending and warping are small, and the strength of the elements and strings is high. Can keep.
  • a light receiving element module having a small current collecting resistance and excellent photoelectric conversion efficiency and power generation output can be obtained.
  • the slit S of the main body portion 32 and the inter-element connection portion 31 have a complementary shape, so that the main body portion 32 has the shape of the inter-element connection portion 31 of the inter-element connection body 30. Is cut out to form a slit S.
  • the inter-element connection body 30 is attached to the light receiving element while the main body portion 32 has the slit S.
  • the inter-element connection portion 31 enters the slit S so that the inter-element connection is achieved.
  • the portion 31 and the main body portion 32 are structured not to overlap. Therefore, there is an advantage that the insulating property between the inter-element connection portion 31 and the main body portion 32 is excellent without performing precise alignment.
  • the inter-element connection portion 31 and the main body portion 32 are stacked as in the second embodiment, it is necessary to form the adhesive layer 26 between the inter-element connection portion 31 and the main body portion 32. . Note that the current collection resistance between the elements can be further reduced by reducing the interval Q between the main body portions 32 in FIG. 8 within a range in which the reliability can be maintained.
  • the slit S of the main body and the inter-element connection part 31 are formed so as to have a complementary shape, so that there is little waste of material, and it is accurately formed by punching. can do.
  • alignment is unnecessary and connection is possible by connecting the inter-element connector 30 to one of the electrodes in a self-aligning manner, so that no margin is required.
  • the distance between the electrodes can be reduced. Therefore, according to the first embodiment, it is possible to obtain a photoelectric conversion element module such as a light receiving element module that is excellent in conversion efficiency and highly reliable without causing a short circuit.
  • the minority carrier diffusion length must be longer than the distance between the device electrodes.
  • the electrode pitch of the device electrodes is smaller than the minority carrier diffusion length in the semiconductor device substrate. Is preferred. Therefore, an example of the electrode pitch in the case of a silicon substrate is about 1 mm.
  • a substrate having a size of about 150 mm square it is necessary to align the inter-element connector 30 with high accuracy with respect to about 300 element electrodes having two polarities.
  • the electrodes With high precision so that they do not contact each other and to be connected to the electrode of the other electrode, and to insulate from the electrode of the other polarity, which requires cost and time. For example, if an alignment mark is placed on the element for high-precision alignment, it is necessary to introduce a process for forming the alignment mark. If the alignment mark is formed of a silver electrode, silver is required for the alignment mark.
  • the cost of the apparatus is increased by having a highly accurate alignment mechanism.
  • the photoelectric conversion efficiency may decrease at the alignment mark portion.
  • the linear electrode 12 and the current collecting electrode 14 are orthogonal to the string. Therefore, the distance that the element electrode on the element electrode extends to the inter-element connection body 30 that runs parallel to the string is 1 / 2n of the element size, and the current collecting resistance on the element electrode is reduced.
  • n is the number of buses, that is, current extraction electrodes.
  • a light receiving element module composed of a plurality of light receiving elements electrically connects elements with a metal inter-element connection body.
  • the heat between the metal inter-element connection body and the element electrode and the light receiving element substrate is not limited. Due to the difference in the expansion coefficient, the light receiving element with the inter-element connection body may be warped. When the thickness of the inter-element connection body and the element electrode formed directly on the element increases, the light reception with the inter-element connection body is caused by the difference in thermal expansion coefficient between the metal inter-element connection body and the element electrode and the light receiving element substrate. The element is warped, and it is difficult to seal the element in a planar shape without damaging the element.
  • the inter-element inter-connection bodies on both sides are similar to a light receiving element having electrodes on both sides. Therefore, the warpage of the light-receiving element with the inter-element connection body is particularly large, which may make it difficult to seal the element string in a planar shape.
  • the layout of the element electrodes is highly flexible, the number of element electrode buses and the number of inter-element connection portions 31 of the inter-element connection body 30 can be arbitrarily set, and the number Can increase the area of the body part of the inter-element connection body, the inter-element connection part of the inter-element connection body, and the current extraction electrode without increasing the width of the current extraction electrode, that is, the bus electrode.
  • the thickness of the connection body can be reduced. As a result, the current collecting resistance can be lowered and the warpage of the element can be reduced.
  • the warpage increases according to the size of the element, the thermal expansion coefficient of the electrode, the ratio of the plate thickness, the Young's modulus, and the temperature.
  • the warping is reduced by making the element electrode as thin as possible so that the inter-element connector can collect current. Since the connection temperature of the inter-element connection body is low and the width of the main body portion is wide in this embodiment mode, it can be made thinner than a general inter-element connection body and warpage can be reduced.
  • a silver electrode having high rarity is often used as a device electrode as a metal having high conductivity in a solar cell.
  • the structure of the present invention is used, it is difficult to be affected by an increase in resistance of the device electrode.
  • the conductivity may be low. Therefore, materials other than silver can be used, and the amount of metal used for the device electrode can be reduced.
  • the amount of metal used for the device electrode can be reduced, it is possible to reduce the amount of silver to be used when manufacturing a solar cell, and it is possible to save resources and reduce costs. Have.
  • the inter-element connection portion 31 and the main body portion 32 are formed to have the same thickness.
  • the main body 32 may be thin. It is possible to easily process the main body 32 by thinning it by a method such as punching.
  • the first element electrode is directly connected to the main body of the inter-element connector made of a conductive plate, so that the current collection distance on the element is substantially zero, and the second element electrode is the intermediate portion.
  • the extraction electrodes are arranged so as to have crossing portions and the inter-element connection portions are connected along the extraction electrodes, thereby reducing the current collection distance on the elements.
  • the element electrodes are arranged in a plane and the second element electrodes are crossed.
  • the current extraction electrode 15 or the inter-element connection portion 31 of one electrode is connected to the current collecting electrode 14. It is good also as a structure made to cross
  • the current extraction electrode 15 and the inter-element connection portion 31 between the two poles It is not necessary to match the number and position of the current extraction electrodes of the other polarity electrode, and the resistance in the element electrode portion can be reduced. This is an effect obtained by making the electrodes of two polarities into a layer structure and crossing the current extraction electrode 15 or the inter-element connection portion 31 of one electrode with the current collecting electrode 14.
  • FIG. FIG. 10 is a plan view of the light receiving element module according to the second embodiment as viewed from the back side.
  • FIG. 11 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module used in the second embodiment.
  • FIG. 12A is a plan view showing an inter-element connection body used in the light receiving element module according to Embodiment 2, and FIG. 12B, FIG. 12C, FIG. 12D, and FIG. These are the IJ sectional view, KL sectional view, M 1 -N 1 sectional view, and M 2 -N 2 sectional view of FIG.
  • the M 1 -N 1 cross-sectional view shows a cross section through the portion where the collecting electrode 14 exists
  • the M 2 -N 2 cross-sectional view shows a cross section through the portion where the linear electrode 12 exists.
  • the inter-element connection body in the module state is taken out by one repeating unit of the string, and in FIG. 12 (b), FIG. 12 (c), FIG. 12 (d), and FIG.
  • the adhesive layer 26 is shown so that the positional relationship of the adhesive layer 26 when the connection body 30 and the element are connected can be understood.
  • the illustration of the frame and the junction box is omitted for easy viewing.
  • 12 (a) to 12 (e) are diagrams schematically showing electrode patterns, and the actual number of electrodes is larger than that of the drawings.
  • the inter-element connection body 30 of the present embodiment like the inter-element connection body 30 of the light-receiving element module described in the first embodiment, has a back connection type light reception having first and second element electrodes on the back surface side.
  • the elements 10a to 10f are connected.
  • the inter-element connection portion 31 is made of a flexible conductor foil.
  • the main-body part 32 which covers the whole back surface of a light receiving element, and the element connection part connected to the back surface of the main body part 32, and connected to the 2nd element electrode of an adjacent light receiving element. 31.
  • the main body 32 of the inter-element connection body 30 and the inter-element connection section 31 are connected by an electrical connection body. When connecting the main body part 32 of the inter-element connection body 30 and the inter-element connection part 31, they may be directly connected by spot welding, thermocompression bonding or the like without using an electrical connection body.
  • the main body 32 does not have a slit S, that is, a notch, and differs from the first embodiment in that it covers the entire semiconductor substrate 11 constituting the light receiving element 10. Furthermore, the point that the main-body part 32 and the inter-element connection part 31 of the inter-element connection body 30 are comprised from two separate components differs. Other parts are the same as those in the first embodiment, and the description thereof is omitted here.
  • FIG. 12A is a view of the inter-element connection body 30 as viewed from the back side, and the inter-element connection portion 31 is connected to the back surface of the main body portion 32.
  • the inter-element connection portion 31 is closer to the element side than the main body portion 32, the inter-element connection portion 31, the current extraction electrode 15, and the inter-element connection portion 31 are located closer to the back side of the module than the main body portion 32. Can prevent short circuit.
  • the adhesive layer 26 exists on the light receiving surface side of the main body 32 of the inter-element connector 30, and the inter-element connection
  • the body portion 32 of the body 30 and the inter-element connection portion 31 are insulated.
  • the portion other than O 31 in the KL cross section shown in FIG. 12C and the M 1 -N 1 cross section in FIG. 12E has a portion where the insulating layer 26 does not exist selectively.
  • the portion where the insulating layer 26 is not provided on the light receiving surface side of the main body 32 of the inter-element connector 30 is connected to the linear electrode 12 that is an element electrode via the electrical connector 21.
  • the inter-element connection portion 31 connected to the adjacent light receiving element is located at the concave portion O 31 , and is insulated from the main body portion 32 of the inter-element connection body 30 by the insulating layer 26. Is done.
  • the inter-element connection portion 31 connected to the main body portion 32 selectively connected to the linear electrode 12 (and current extraction electrode) which is one of the element electrodes is connected to the second light receiving element 10 of the adjacent light receiving element 10. This is in contact with the current extraction electrode 15 which is an element electrode.
  • the collector electrode 14 as the second element electrode is also formed in a stripe shape, that is, a linear shape at a constant interval, and has two current extraction electrodes 15 that intersect the collector electrode 14. Since the inter-element connection portion 31 is in contact with the current extraction electrode 15, the current collection distance of the second element electrode can be reduced, so that the current collection resistance can be reduced.
  • the main body portion 32 of the inter-element connection body 30 and a part of the inter-element connection section 31 of the adjacent inter-element connection body 30 are located on the light receiving element 10. , And a portion stacked on the element and electrically connected. Therefore, in the case of the second embodiment, the laminated structure portion of the inter-element connection portion 31 of the inter-element connection body 30 -the main body portion 32 of the inter-element connection body 30 -the inter-element connection portion 31 of the inter-element connection body 30 is formed. Come out.
  • the inter-element connection portion 31 of the inter-element connection body 30 has a structure that does not overlap the main body portion 32 of the inter-element connection body 30 on the same element.
  • the inter-element connection portion 31 overlaps the main body portion 32. That is, the inter-element connection portion 31 of the inter-element connection body 30 is connected to almost the entire current extraction electrode 15, and the main body portion 32 of the inter-element connection body 30 is formed on the back side of the same element via the adhesive layer 26. Further, the inter-element connection portion 31 is stacked on the partial region on the back side of the main body portion 32 via the electrical connection body 33.
  • the main body portion 32 When the inter-element connection portion 31 is laminated on the main body portion 32, the main body portion 32 is formed in the laminated portion with the inter-element connection portion 31 on the current extraction electrode 15, as shown by ⁇ and ⁇ portions in FIG.
  • the shape protrudes from the main body portion 32 other than the laminated portion to the element back side, that is, the non-light receiving surface side of the module.
  • the inter-element connection portion 31 and The connection length with the current extraction electrode 15 can be increased, and the current collection resistance at the current collection electrode 14 and the current extraction electrode 15 is reduced.
  • the inter-element connection portion 31 is connected over the entire area of the current extraction electrode 15, and the inter-element connection portion 31 extends to the ⁇ portion as compared with the case where only the current extraction electrode 15 is provided. Accordingly, the current collecting resistance can be made smaller than that of the element module of the first embodiment.
  • the overlapping portion is a factor that causes a short circuit when, for example, the electrical connection body 21 has a protruding portion. Therefore, it is preferable to reduce the overlap depending on the material of the electrical connection body 21, as in the first embodiment. When it has a notch part, an overlap part can be reduced. Further, in the first embodiment, there is no inter-element connection portion 31 of the inter-element connection body 30 at the portion where the main body portion 32 and the current extraction electrode 15 overlap, so that the elements are not connected to each other. Therefore, the inter-element connection portion 31 and the planar main body portion 32 do not overlap each other, and the insulation is improved.
  • the inter-element connection portion 31, the main body portion 32, the linear electrode 12, and the current extraction electrode 15 of the inter-element connection body 30 are connected by an electrical connection body.
  • an electrical connection body In the second embodiment, as shown in FIG. 13, between the back side of the main body portion 32 of the inter-element connection body 30 and the inter-element connection section 31, and between the current extraction electrode 15 and the inter-element connection body 30.
  • the inter-connection portion 31 is connected by a second electrical connection body 33, and the back side of the main body portion 32 of the inter-element connection body 30 and the linear electrode 12 are connected by an electrical connection body 21.
  • the same material or different ones may be used.
  • the inter-element connection section 31, the main body section 32, and the wire of the inter-element connection body 30 may be used.
  • Different electrical connectors may be formed in all the portions of the electrode 12 and the current extraction electrode 15.
  • the electrical connection body 21 may be used for the connection part
  • the electrical connection body 33 may be used for the connection part between the element connection part 31 and the main body part 32 of the electrical connection body. You may combine arbitrarily with a body. It is also possible to form the electrical connection body 33 in the most part of the inter-element connection portion 31 and form the electrical connection body 21 only in the portion connected to the main body portion 32 of the inter-element connection body 30.
  • the melting temperatures of the electrical connection bodies 21 and 33 may be different so that the element electrodes and the inter-element connection bodies 31 do not come off during heating to connect the elements to form a string.
  • the electrical connection body 33 has a lower melting temperature than the electrical connection body 21.
  • connection part by the body 21 can hold a place without melting, there is an advantage that it is easy to create a string.
  • the combination of the location where the electrical connector is used and the melting temperature may be reversed according to the order of manufacture.
  • the electrical connection body tin silver solder, tin bismuth solder, metal tin solder or the like can be used.
  • the main body portion 32 of the inter-element connection body 30 covers the entire surface of the light receiving element, the reflection by the main body portion 32 can be achieved even if the adhesive layer 26 is not particularly scattering. Thus, sufficient light absorption in the element is realized. Therefore, since the main body surface of the portion other than the connection point of the light receiving element 10 to the first element electrode, that is, the connection region, only needs to be formed of a light reflector having high reflectivity with respect to the light transmitted through the light receiving element. Is also simplified. Reflected light enters the light receiving elements 10a to 10f through the gap between the linear electrode 12 as the first element electrode and the collecting electrode 14 as the second element electrode, and the photoelectric conversion efficiency can be increased. In particular, it is effective when the back surface side of the element such as the back side main surface material 25 uses a material having low light reflectivity, such as a black material, for the purpose of blackening the appearance of the light receiving element module.
  • a material having low light reflectivity such as a black material
  • FIGS. 14 (a) to 14 (c) the inter-element connection is shown in FIGS. 14 (a) to 14 (c).
  • the slit S may be formed in the main body portion 32 so as to coincide with the inter-element connection portion 31.
  • FIG. 14A is a plan view showing an inter-element connection body used in the light-receiving element module according to Embodiment 2, and FIGS. 14B, 14C, 14D, and 14E. These are the IJ sectional view, KL sectional view, M 1 -N 1 sectional view, and M 2 -N 2 sectional view of FIG.
  • the M 1 -N 1 sectional view shows a portion where the collecting electrode 14 exists.
  • the M 2 -N 2 sectional view is a portion showing a portion where the linear electrode 12 exists.
  • 14 (a) to 14 (e) show the inter-element connection body 30 in a module state in which one repeating unit of the string is taken out, and descriptions of peripheral members such as a module sealing material and a light receiving element are omitted.
  • FIGS. 14 (b), 14 (c), 14 (d), and 14 (e) the positional relationship of the adhesive layer 26 when the inter-element connector 30 and the element are connected is known.
  • the adhesive layer 26 is described. Specifically, in the M 1 -N 1 cross section of FIG.
  • the linear electrode 12 which is the other of the element electrodes in the portion not having the adhesive layer 26 indicated by the O 12 portion is the inter-element connector.
  • the current collecting electrode 14 is one of the element electrodes by the adhesive layer 26 between the elements. 14C.
  • the collector electrode 14 is insulated from the main body 32 of the inter-element connection body by the adhesive layer 26 in the portion having the adhesive layer 26.
  • the linear electrode 12 is connected to the body portion 32 of the inter-element connection body via the electrical connection body 21 in a portion where the adhesive layer 26 is not provided.
  • the inter-element connection portion 31 of the inter-element connector 30 is connected to almost the entire current extraction electrode 15 connected to the current collecting electrode 14, and the adhesive layer 26 is interposed on the back side on the same element.
  • a main body portion 32 of the inter-element connection body 30 is formed, and the inter-element connection portion 31 is laminated on a part of the back surface side of the main body portion 32 via the electric connection body 33.
  • the device electrodes are not shown.
  • the inter-element connection portion 31, the main body portion 32, and the adjacent inter-element connection portion 31 are stacked as shown in FIG. 13, the inter-element connection portion 31, the main body portion 32, When adjacent inter-element connection portions 31 are not stacked, the ⁇ portion, which is a stacked portion in FIG. 13, disappears, and the inter-element connection portion 31 is stacked with the main body portion 32 only in the vicinity of the ⁇ portion.
  • the inter-element connection section 31 of the inter-element connection body 30 and the main body section 32 of the inter-element connection body 30 are made of different parts. The same as in the first embodiment.
  • inter-element connection portion 31 and the main body portion 32 are formed of different members, unlike the first embodiment, an inter-element connection body having a shape different from that of the inter-element connection body inside the string is provided at the end of the string. It has the advantage that it is not necessary to use it. Moreover, after connecting the main-body part 32, the inter-element connection part 31 can be connected, and as the process of connecting the main-body part 32 which is the element back part of the inter-element connection body 30 to an element, and the process of forming a string There is an advantage that the step of connecting the inter-element connection portion 31 of the inter-element connection body 30 to the element is easily performed separately.
  • the material and the plate thickness can be appropriately selected.
  • the inter-element connection portion 31 may have a lower resistance than the main body portion. In order to achieve low resistance, it is preferable to increase the plate thickness or to use a material having a small specific resistance.
  • a cut part is made and a cut part is formed by raising the part of the cut part. It is formed.
  • the cut-and-raised portion may be cut and raised and molded along the main body portion, or may be in an upright state.
  • the element electrode pattern can be appropriately changed in any of the structures of the first and second embodiments other than the pattern shown in FIG. 4A.
  • FIGS. It can be a pattern. That is, in the case of the element electrode structure shown in FIGS. 15 and 16, the current extraction electrode 15 of one polarity does not cross the element and the current extraction electrode 13 of the other polarity is formed.
  • the element connection portion 31 of the element connection body 30 on one side of the adjacent elements is connected to the current extraction electrode 15.
  • the inter-element connection portion 31 of the inter-element connection body 30 on the other adjacent side is connected to the main body portion 32 of the inter-element connection body 30 that covers the current extraction electrode 13 and the current collecting electrode 14. Accordingly, the inter-element connection portions 31 of the two adjacent inter-element connection bodies 30 are not stacked. 15 and 16, the main body portion 32 of the inter-element connector 30 is directly connected to the element in a wide area without the adhesive layer 26, and the current extraction electrode 15 on one polarity Since the inter-element connection portion 31 is directly connected, the adhesion between the inter-element connection body 30 and the element electrode can be improved, and a light receiving element module having excellent reliability can be obtained.
  • the outer peripheral portion is surrounded by the linear electrode 12 so that the main body portion 32 of the inter-element connector 30 at the element end can be fixed to the element. This is not the case when a layer having good adhesion between the layer 26 and the main body portion 32 of the inter-element connector 30 is used, and the current collecting electrode 14 can be arranged on the outermost periphery. Can reach the outermost periphery to increase the charge collection efficiency at the end of the device.
  • the current extraction electrode 15 has a continuous linear shape.
  • the current extraction electrode 15 does not have to be continuously formed.
  • island-shaped electrodes are separated and intermittent. It may be formed. Even in the case where the island-shaped electrodes are intermittently formed, the inter-element connection portion 31 of the inter-element connector 30 is connected to each island-shaped electrode portion, so that conduction between the island-shaped electrodes separated from each other is achieved. Can be taken. In the case where the island-shaped electrode is intermittently formed, the amount of electrode material used can be reduced.
  • the main body portion 32 of the inter-element connection body 30 is formed by pressing a conductive foil, for example, a copper foil in advance so as to have an uneven shape, thereby improving the adhesion with the element electrode of the light receiving element or warping of the element. Can be reduced.
  • it may be formed into a concave-convex shape having a concave portion 32R and a convex portion 32P that intersect with the element electrode as shown in a perspective view in FIG. 17 at an angle, for example, 45 degrees. .
  • the main body 32 is electrically connected to the linear electrode 12 and the current extraction electrode of one electrode through the electric connection body 21, and is insulated from the current collecting electrode 14 of the other electrode by the adhesive layer 26.
  • the main body portion 32 of the inter-element connection body 30 in the portion of the current collecting electrode 14 and the current extraction electrode 15 corresponds to the module light receiving portion with respect to the main body portion 32 corresponding to the one linear electrode 12.
  • a concave portion having a shape recessed with respect to the surface side may be formed, and a convex portion having a shape protruding relatively to the module light-receiving surface side may be provided in a portion corresponding to the linear electrode 12.
  • the body portion 32 of the inter-element connector 30 preferably has a convex portion indicated by 32P and a concave portion indicated by 32R in FIG. 17, and uses a flexible conductor.
  • a flexible conductor is used as the main body portion 32 of the inter-element connector 30, and the conductor is not directly fixed to the light receiving element 10 in a portion other than a part of the electrically connected region.
  • the main body portion 32 of the inter-element connector 30 is deformed in a portion not connected to the light-receiving element 10, and light reception caused by a difference in thermal expansion coefficient between the light-receiving element substrate and the main body portion 32 of the inter-element connector 30. The deformation of the element 10 and the stress on the light receiving element 10 can be relaxed.
  • the adhesive layer 26 functions as an insulating layer for the inter-element connection body 30, and relaxes stress by fixing the space between the light receiving element 10 and the inter-element connection body 30 and functioning as a deformable layer. It also functions as a layer.
  • the pattern of the convex portion of the main body portion 32 of the inter-element connector 30 can be a shape in which the concave and convex portions on the stripe intersect.
  • the uneven portions can be formed with a pitch of 0.1 to 5 mm, for example.
  • the description of the concave and convex portions of the main body portion 32 of the inter-element connector 30 is omitted. It is preferable to use the connection body 30 having the concavo-convex portions 32R and 32P because warpage of the element can be reduced.
  • the main body 32 may be formed into a flat plate shape, and irregularities may be formed in the joining process with the light receiving element. Further, as shown in FIG. 19A described later, it is preferable from the viewpoint of reducing the wiring resistance that all the convex portions 32P of the inter-element connector 30 are connected to the linear electrode 12.
  • the linear electrode 12 and the convex part 32P of the main body part 32 of the inter-element connector 30 may not correspond one-to-one.
  • the conductivity may be lowered by reducing the thickness of the main body 32.
  • the photoelectric conversion efficiency decreases due to resistance loss when current flows from the light receiving element 10 to the adjacent light receiving element 10 due to a decrease in conductivity of the main body 32, although not shown, the main body 32 of the inter-element connector 30 is not shown.
  • the inter-element connection portions 31 are constituted by two per string. However, as shown in FIG. 18, four inter-element connection portions 31 are formed.
  • the number of connection portions 31 may be larger.
  • a larger number of bus electrodes, that is, current extraction electrodes has an advantage that the current collection distance of the current collecting electrode 14 is shortened and the current collecting resistance can be reduced.
  • an example of the electrode width in the case of an n-type silicon substrate having a specific resistance of about 1-10 ⁇ ⁇ cm is preferably about 1.5 mm or less.
  • the thickness of the inter-element connection portion 31 of the inter-element connection body 30 is equal to or less than that of the semiconductor element substrate. Is preferred.
  • the main body portion 32 of the inter-element connection body 30 and the linear electrode 12 of the light receiving element 10 are connected by the electrical connection body 21, and the inter-element connection section 31 of the inter-element connection body 30 and the inter-element connection.
  • the main body portion 32 that is the element back portion of the connection body 30, the inter-element connection portion 31 of the inter-element connection body 30, and the current extraction electrode 15 are connected by an electric connection body 33.
  • the inter-element connectors 21 and 33 are not shown.
  • the melting temperature or bonding temperature of the electrical connecting members 21 and 33 is set so that the inter-element connecting portion 31 between the element electrode and the inter-element connecting body does not come off during heating or bonding to connect the elements to form a string.
  • the connecting body 33 has a lower melting temperature or bonding temperature.
  • a conductive connection member such as tin-silver solder, tin bismuth solder, or a conductive adhesive can be used.
  • the material of the electrical connection body 33 As the material of the electrical connection body 33, the lower the temperature required for forming the electrical connection body part, the light receiving element when the temperature is lowered to room temperature after joining the connection body and the element back part of the inter-element connection body 30 The stress to the main body 32 is reduced, and therefore a light receiving element module with less warpage of the light receiving element 10 and excellent strength and long-term reliability can be obtained, which is more preferable. Note that the combination of the location where the electrical connection body is used and the melting temperature may be reversed according to the order of manufacture.
  • FIGS. 3 and 4 (a), 7 (a), 7 (b), 7 (c), 11, 15, 16, and 18, the linear electrode 12, the current collecting electrode 14, and the adhesive layer are used. Although only about 10 are described in the X direction, 26 is a diagram schematically described, and the number of electrodes may be different from the actual one.
  • Embodiment 3 As a third embodiment of the present invention, another example of a light receiving element with an inter-element connector will be described.
  • a light receiving element used in the first and second embodiments and the modification thereof a light receiving element having a junction formed by impurity doping may be used in addition to the heterojunction light receiving element.
  • a light receiving element as shown in FIGS. 19A to 19C can be used. Although it is preferable to have unevenness called texture on the light receiving surface side of the substrate, the unevenness of the substrate is omitted in FIGS. 19A to 19C of this embodiment.
  • FIG. 19A is a cross-sectional view of a light receiving element with an inter-element connection body according to the present embodiment
  • FIG. 19B is an enlarged cross-sectional view of a portion A in FIG. 19A
  • c) is an enlarged sectional view of a portion B in FIG.
  • a linear electrode 12 as a first element electrode and a collecting electrode 14 as a second element electrode are formed on the first passivation film 18a.
  • a contact with the element substrate is formed in the first opening 12h and the second opening 14h, and the linear electrode 12 is formed so as to protrude from the collecting electrode 14.
  • the current collecting electrode 14 abuts on the main body 32 through the adhesive layer 26 to achieve mechanical connection.
  • the inter-element connection portion 31 cannot be seen, but the inter-element connection portion 31 is connected to the current extraction electrode 15 in the same manner as shown in FIG. Abutting and connected.
  • the semiconductor substrate 11 a single crystal n-type silicon substrate is used, and the light receiving surface of the semiconductor substrate 11 has an n-type doped region 17 which is an n-type diffusion layer formed by phosphorus diffusion as a surface electric field layer 17S.
  • a third passivation film 18c made of an amorphous silicon nitride film is formed by laminating a silicon oxide film and the second passivation film 18b as the second passivation film 18b that also serves as an antireflection film on the surface side.
  • a p-type doped region 16 formed by phosphorus diffusion and p-type doped region 16 is formed in a portion of the substrate corresponding to the positive electrode and negative electrode of the element electrode. Except for the connection point between the device electrode and the device substrate, almost the entire surface including the surfaces of the n-type doped region 17 and the p-type doped region 16 is covered with the first passivation film 18a.
  • the first passivation film 18a a stacked body of a silicon oxide film and an amorphous silicon nitride film is used.
  • the first opening 12h and the second opening 14h are formed in the first passivation film 18a, and the metal electrode is connected to the n-type doped region 17 and the p-type.
  • the contact with the doped region 16 serves to extract current from the substrate.
  • the first and second openings 12h and 14h of the negative electrode and the positive electrode are on the same cross section, but the pitch between the openings is actually different. Therefore, the openings of the positive electrode and the negative electrode are not always formed depending on the element cross section. Further, the unevenness of the main body 32 of the inter-element connector 30 may not be formed at the same interval as the electrode pitch. Further, not all the protrusions 32P of the inter-element connector 30 need to be connected to the element electrodes, and if one connection point is generated with respect to the continuous linear electrode 12 on the element. Good.
  • Electrodes such as the linear electrode 12, the collecting electrode 14 and the current extraction electrode 15 are formed of a multilayer film as shown in FIGS. 19 (a) to 19 (c).
  • the p-type doped region 16 is formed on the electrode portion of one polarity, for example, the portion where the current extraction electrode 15 of the collecting electrode 14 and the collecting electrode 14 is formed, and the linear electrode 12 which is the other polarity electrode portion.
  • An n-type doped region 17 is formed.
  • the linear electrode 12 that is an element electrode has a four-layer structure of a negative electrode first layer 12a, a negative electrode second layer 12b, a negative electrode third layer 12c, and a negative electrode fourth layer 12d. The Further, as shown in FIG.
  • the current collecting electrode 14 and the current extraction electrode 15 have a three-layer structure of a positive electrode first layer 14a, a positive electrode second layer 14b, and a positive electrode third layer 14c.
  • both the positive electrode and the negative electrode aluminum having low contact resistance and high reflectivity is directly formed on the substrate, and titanium tungsten (TiW), copper, silver, tin, or the like is laminated on the aluminum.
  • TiW titanium tungsten
  • both the positive electrode and the negative electrode are formed with aluminum having high reflectivity directly on the substrate, so that the reflectivity is extremely good.
  • aluminum of about 40 nm is formed on the back surface of the element as a reflective layer by vapor deposition or the like, and heated to about 400 ° C. in a nitrogen gas atmosphere containing about 3% of hydrogen to form aluminum and silicon.
  • the contact resistance with the substrate can be reduced.
  • an electrode can be created by laminating other metal electrodes on the aluminum layer by thin film formation such as vapor deposition and electroplating.
  • the linear electrode 12 is a negative electrode
  • the current collecting electrode 14 and the current extraction electrode 15 are positive electrodes.
  • the negative electrode is connected to n-type doped region 17 and the positive electrode is connected to p-type doped region 16.
  • the width of the p-type doped region 16 is larger than the width of the n-type doped region 17.
  • the area of the pn junction is larger than the area of the n + n junction, although the photogenerated carrier reaches the pn junction and contributes to the power generation, there is an effect that the reverse may be possible depending on the combination of the passivation films.
  • the area of the p-type doped region may be preferably small.
  • the p-type doped region 16 may be on the linear electrode 12 side.
  • the element electrode formed in the element has a positive electrode and a negative electrode on the same surface of the element, it is preferable to take a structure that ensures insulation between the positive and negative electrodes.
  • the current collector electrode 14 of the element electrode shown in FIG. 19A is mainly covered with an adhesive layer 26 which is an insulating layer, and the linear electrode 12 and Insulated.
  • the insulating layer may include a void containing gas, but in the third embodiment, the adhesive layer 26 is formed so that most of the linear electrode 12 is exposed to the outside and mainly covers the collecting electrode 14. In the module state, as shown in FIG.
  • the current collecting electrode 14 and the body portion 32 of the inter-element connection body 30 are mainly insulated, and most of the linear electrodes 12 are inter-element connection bodies.
  • the main body unit 32 is connected to the main body unit 30.
  • the adhesive layer 26 is formed. When forming the adhesive layer 26, the adhesive layer 26 may partially overlap the linear electrode 12. Further, when the main body portion 32 has the slit S, the inter-element connection portion 31 may not be covered with the adhesive layer 26.
  • the adhesive layer 26 When forming the adhesive layer 26, the adhesive layer 26 is once formed thicker than a predetermined gap between the main body portion 32 and the semiconductor substrate 11, and after the formation, the main body portion 32 is pressed against the semiconductor substrate 11. A method of spreading 26 in the lateral direction can be used. In the case of the above method, the width of the adhesive layer 26 formed before the main body portion 32 is crimped is formed to be narrower than the distance between the linear electrodes 12.
  • the adhesive layer 26 has a function of insulating not only between the element electrodes on the same substrate but also between the inter-element connection body 30 and the element electrode.
  • the inter-element connection body is the same as in the first embodiment.
  • the inter-element connection portion 31 of the inter-element connection body 30 also has a function of insulating between the main body portion 32 of the device, the inter-element connection portion 31 of the inter-element connection body 30, and the element end portion of the current extraction electrode 15. Further, it has a function of improving the insulation between the current collecting electrode 14 of the light receiving element 10 and the main body 32 of the inter-element connector 30.
  • the adhesive layer 26 is sandwiched between the main body portion 32 of the inter-element connector 30 and the semiconductor substrate 11 that is the light receiving element substrate. Therefore, by setting the thermal expansion coefficient of the adhesive layer 26 to an intermediate value between the semiconductor substrate 11 and the inter-element connection body 30, the expansion coefficient difference between the semiconductor substrate 11 and the main body portion 32 of the inter-element connection body 30 is caused. The resulting warp or stress can be relaxed in the adhesive layer 26.
  • the main body portion 32 of the inter-element connector 30 is not flat but has a concavo-convex structure, and even if the concavo-convex portion is deformed, warping or stress generated in the device due to a difference in expansion coefficient can be reduced in the adhesive layer 26. It has the advantage of being able to.
  • the pattern of the concavo-convex structure of the main body portion 32 of the inter-element connector 30 the pattern shown in FIG. 17, the shape where the concavo-convex portions on the stripe intersect, or the like can be used.
  • the light receiving element 10 can use a member having a thickness larger than that in which the electrode layer is formed directly on the back of the element as the main body portion 32 of the inter-element connector 30. It has the advantage that it can be set as a light receiving element with low resistance. The effect is particularly great in an element having a large element area.
  • the inter-element connector 30 is made of a plate-like conductor such as a metal having an expansion coefficient close to that of the semiconductor substrate, such as Invar or Kovar bonded with copper. Alternatively, a soft material such as one having metal particles in the resin can be used.
  • the adhesive layer 26 is made of resin such as ethylene vinyl acetate, polyimide or epoxy containing filler, glass frit, SiO 2 film formed by CVD, silicon nitride film or other inorganic film or resin and inorganic particles. A complex of the above can be used.
  • the filler is also used as a regulator for bringing the thermal expansion coefficient closer to the light receiving element.
  • the main body portion 32 of the inter-element connection body 30 is made of, for example, a conductive foil.
  • a tin-silver solder is formed on one surface and press processing, Thomson processing that is processing using a simple die, or the like is performed.
  • the main body portion 32 and the inter-element connection portion 31 of the inter-connection body 30 can be formed separately or integrally.
  • the main-body part 32 of the inter-element connection body 30 has flexibility.
  • the thickness of the main body 32 of the inter-element connector 30 is, for example, 0.001 to 1.0 mm.
  • the height difference of the formed irregularities can be set to about 0.01 to 0.5 mm, for example.
  • two adjacent light receiving elements 10 connected by the inter-element connector 30 are arranged with a slight gap therebetween, and in the gap portion, the inter-element connection portion 31, the light receiving surface of the light receiving element 10, and the back side main surface material 25. And how it looks from the light receiving surface side is different. Therefore, if necessary, the outer appearance of the gap portion is substantially the same as that of the other back side main surface material 25 portion by applying a paint to the light receiving surface side of the inter-element connection portion 31 or attaching a light shielding tape. Can be the same.
  • inter-element connection portion 31 of the inter-element connection body 30 is connected to the current extraction electrode 15 formed on the back surface of the light receiving element 10, and the other end is connected to the main body portion 32 of the adjacent inter-element connection body 30.
  • the main body 32 is connected to the linear electrode 12 on the element formed on the back surface side of the light receiving element 10 different from the light receiving element 10 and achieves electrical connection between two adjacent light receiving elements 10.
  • the inter-element connection body 30, the current extraction electrode 15 of the light receiving element 10 and the linear electrode 12 of another light receiving element are connected by a conductive thin film such as the electrical connection body 21 and the electrical connection body 33.
  • the inter-element connection portion 31 of the inter-element connection body 30 and the main body portion 32 of the inter-element connection body 30 are configured from different parts, and the main body portion 32 and the inter-element connection portion 31 are connected,
  • the inter-element connection portion 31 may also be connected by the electrical connection body 21 or the electrical connection body 33.
  • the melting temperatures of the electrical connection bodies 21 and 33 may be different so that the element electrodes and the inter-element connection bodies 30 do not come off during heating to connect the elements to form a string. In the case of the above-described structure, it is preferable that the melting temperature or the connection temperature at the portion where the connection process is performed later is lowered according to the manufacturing process.
  • the electrical connectors 21 and 33 tin silver solder, tin bismuth solder, or the like can be used.
  • the material of the electrical connection body 21 the lower the temperature required for forming the electrical connection body 21 portion, the light receiving element when the temperature is lowered to room temperature after joining the connection body and the body portion 32 of the inter-element connection body 30. Therefore, it is preferable to use a material that can be formed at the lowest possible temperature including the electrical connection body 33 because it is preferable to obtain a light receiving element module that has less warpage of the light receiving element and is excellent in strength and long-term reliability. preferable.
  • a conductive resin containing metal particles or a resin material can be used in addition to a conductive thin film such as solder.
  • the electrical connection body 21 that electrically connects the linear electrode 12 and the inter-element connection body 30 is provided on the entire surface of the inter-element connection portion 31 of the inter-element connection body 30 and the element side of the main body portion 32 of the inter-element connection body 30.
  • the surface may be covered widely, for example, as shown in FIG. 20 which will be described later by immersing an element with an element electrode in a molten solder bath, the current collecting electrode 14, the current extraction electrode 15 and the linear electrode are self-aligned. You may form a solder layer only in the connection part with the connection body 30 between elements on 12 element electrodes.
  • the electrical connection body 21 exists on the electrode and the electrical connection body 21 formed on the main body portion 32 may be omitted.
  • the main body 32 since the main body 32 only needs to be thin, there is an advantage that warpage and stress due to a difference in thermal expansion coefficient between the element and the inter-element connector 30 can be reduced.
  • the electrical connection body 21 made of a solder plating layer covers the entire surface on the element side of the main body 32, and the electrical connection body 21 in the wavelength region where the light absorption coefficient of the light receiving element 10 is small.
  • the light reflectance is not high, it is preferable to reflect light by including a light reflector or scatterer such as titanium dioxide particles in the adhesive layer 26.
  • the light reflector not only particles but also a dielectric laminated film, for example, a reflective film such as a dielectric multilayer film in which SiO 2 and TiO 2 are laminated can be used on the back of the element.
  • the region where the light absorption coefficient of the light receiving element 10 is small is a wavelength region of approximately 900 nm to 1300 nm when the light receiving element is made of silicon and a substrate having a thickness of about 200 micrometers is used, for example.
  • the thickness of the substrate is as thin as several tens of micrometers, it is preferable that the reflectance of the material on the back surface side of the element is high even in the shorter wavelength region.
  • the element electrodes such as the linear electrode 12 and the current collecting electrode 14 do not need to be a single metal layer, and nickel and tin are plated by plating as a surface layer for connection with the main body portion 32 of the inter-element connector 30. It may be formed on the surface of the underlying layer such as copper. Not only the element electrode part but also the main body 32 of the inter-element connector 30 may be plated to improve the connectivity with the electrical connector 21.
  • an aluminum foil is used as the main body portion 32 of the inter-element connection body 30, nickel and tin are formed by plating as a surface layer on the surface of the main body portion 32 on the element electrode side, and a tin-silver solder layer is formed as the electric connection body 21.
  • the pattern of the convex portions of the main body portion 32 of the inter-element connector 30 may be a shape in which stripe-shaped uneven portions intersect.
  • the electrical connection body 21 is mainly formed only on the element electrode, and the inter-element connection is performed only at a part of one of the element electrodes.
  • the electrode When connected to the convex portion of the body 30, the electrode is composed of a plurality of layers, and when the first layer functions as a reflective layer and the layer outside the reflective layer mainly bears electric conduction, the linear electrode 12 constituting the element electrode 20 to 23 are shown as modified examples 5, 6 and 7, respectively, in which the heights of the collector electrode 14 and the collector electrode 14 are the same.
  • the solder layer as the electrical connection body 21 is self-aligned on the linear electrode 12 and the current collecting electrode 14 that are element electrodes. It is formed.
  • the electrode of one electrode and the electrode of the other electrode are made of different materials, or only the surface of the current collecting electrode 14 is covered with an inorganic material, so that only one electrode is covered. You may make it solder.
  • coated the mixture of a metal particle and resin other than solder may be used.
  • the other parts are the same as those in the first embodiment shown in FIGS. 4B to 4D, and thus the description thereof is omitted, but the same parts are denoted by the same reference numerals.
  • the main body portion 32 and the inter-element connection portion 31 may be composed of different parts and may have different thicknesses.
  • the electrical connection body 21 By forming the electrical connection body 21 by selective plating using solder, the electrical connection body 21 is formed mainly only in the portion where the element electrode is present. Therefore, even if the electrical connection body 21 having a low reflectance is used, the electrical connection body 21 is electrically connected. Light absorption by the body 21 is small, and there is an advantage that light can be reflected by the main body portion 32 of the inter-element connection body 30.
  • the main body portion 32 does not have to have the electrical connection body 21 and the main body portion 32 having a large area. It is not necessary to form the electrical connection body 21 in the whole.
  • a silver electrode having a high rarity as a metal having high conductivity is often used as a device electrode in a solar cell.
  • the device electrode can reduce the amount of metal used. Therefore, there is an advantage that the amount of silver can be reduced for use in manufacturing a solar cell, and resource saving and cost reduction can be achieved.
  • the electrical connection body 21 may not be used.
  • the electrical connection body 21 and the second connection body 30 are melted by using a low melting point metal or the like as the main body portion 32 of the inter-element connection body 30.
  • the electrical connection body 33 may be used instead.
  • the electrical connector 21 made of a solder layer may be formed on the entire surface of the main body 32 as shown in FIG. Further, as shown in FIG. 21, the size of the uneven structure on the inter-element connector 30 may be larger than that of the element electrode. Further, the pitch of the concavo-convex structure may be wider than the pitch of the element electrodes. Further, in FIG. 21, the width of the concave portion of the main body of the concavo-convex structure toward the light receiving surface is narrower than the width of the linear electrode 12 that is the first element electrode, so that the connection can be easily made without alignment. be able to.
  • the width of the widest portion that is concave toward the light receiving surface is made narrower than the width of the linear electrode 12 that is the first element electrode, thereby preventing the linear electrode 12 from entering the concave portion. be able to.
  • a reflective layer 52 made of an aluminum layer having a high reflectivity is directly formed on the entire surface by, for example, vacuum deposition, and titanium tungsten is laminated on the reflective layer 52 by sputtering deposition or the like, and soldered. Copper which is easy to perform is formed on titanium tungsten, and the reflective layer 52 which is a reflector, the linear electrode 12 which is an electric conductor, and the current collecting electrode 14 are separately formed.
  • the other parts are the same as those in the first embodiment shown in FIGS. 4B to 4D, and thus the description thereof is omitted, but the same parts are denoted by the same reference numerals.
  • This has the advantage that an electrode structure that is highly reflective but easy to solder can be formed. Moreover, the usage-amount of noble metals, such as silver, can be reduced.
  • the reflective layer 52 is preferably formed over the entire surface of the semiconductor substrate 11, but it may be formed over the entire surface.
  • the pattern of the element electrodes on the substrate is different from the conventional one, and the current flowing out of the element substrate reaches the inter-element connection portion 31.
  • the average distance that the current needs to flow through the current collecting electrode 14 in the in-plane direction of the current is, for example, in accordance with the number n of the bus electrodes, that is, the current extraction electrodes 15 or the inter-element connection portions 31 of the inter-element connection body.
  • the length of the semiconductor substrate 11 in the Y direction is about 1 ⁇ 2n of the length in the Y direction, and the current collecting resistance on the element electrode can be greatly reduced. Since it is smaller than the resistance due to the element electrode, the resistance of the entire module can be reduced.
  • the current collecting resistance of one silver grid electrode having a width of 100 ⁇ m, a height of 10 ⁇ m, and a length of 150 mm is 1. Whereas it is about 6 ⁇ , it can be reduced to about 0.2 ⁇ by using two bus electrodes.
  • the average distance that the current needs to flow through the linear electrode 12 in the in-plane direction of the substrate in order to reach the main body 32 of the inter-element connector 30 is the convex portion of the inter-element connector 30.
  • the photoelectric conversion element module including the light receiving element module excellent in photoelectric conversion efficiency can be obtained.
  • the main body part with the inter-element connection body Since the resistance of 32 is sufficiently smaller than the device electrode, the current collecting resistance per one can be reduced to about 0.2 ⁇ .
  • the advantage is the same for the thermal resistance for heat dissipation from the element, and it is possible to obtain a light receiving element module having high heat dissipation and keeping the element temperature low, resulting in excellent photoelectric conversion efficiency.
  • the current collecting electrode and the extraction electrode constitute a cross-connecting portion so that the current collecting distance in the planar arrangement is as small as possible, and the inter-element connector 30 is provided.
  • the current collecting resistance on the element electrode can be reduced, and the amount of metal used for the element electrode can be reduced. Therefore, there is an advantage that resource saving and cost reduction can be achieved.
  • the adhesive layer 26 is formed on the current collecting electrode 14 on one substrate in advance, thereby performing high-accuracy alignment during modularization.
  • the inter-element connector 30 can be connected only to the linear electrode 12 having the other polarity. Therefore, the fine alignment between the inter-element connector 30 and the element, which is necessary in the conventional light receiving element module, is unnecessary, and the electrode pitch of the element electrodes can be reduced without depending on the alignment accuracy. it can.
  • an alignment mark for improving the alignment accuracy is not required on the element, a photoelectric conversion efficiency reduction region caused by the alignment mark does not occur in the light receiving element. Therefore, it is possible to manufacture a light receiving element module having a narrower electrode pitch while having the advantages of a light receiving element module having a low internal resistance, high carrier collection efficiency, and excellent photoelectric conversion efficiency.
  • the inter-element connection body 30 made of a copper foil having a high reflectance with respect to light having a certain wavelength that transmits a small light absorption coefficient of the silicon substrate. Since the main body portion 32 is provided on the back of the element and only the adhesive layer 26 having a high light-transmitting property is mainly provided between the element and the main body portion 32 of the inter-element connector 30, light having a wavelength of about 900 nm to 1300 nm is used.
  • the element electrode portion can be covered with metal and resin, moisture reaching the element electrode portion from the ambient environment of the light receiving element can be reduced. Therefore, a short circuit due to migration of element electrodes or an increase in resistance due to an electrochemical reaction can be prevented, and the light receiving element module is excellent in photoelectric conversion efficiency and long-term reliability. This is particularly important in the case of a light-receiving element having a small distance between the positive electrode and the negative electrode and high photoelectric conversion efficiency.
  • the inter-element connector 30 in order to connect the inter-element connector 30 to the element when modularization is performed, the inter-element connector 30 may be connected so as to match the back surface of the element.
  • high-accuracy alignment that is the same as or similar to the distance between the p region and n region in the element as in Patent Document 4 is unnecessary when modularized, and the number of alignments is reduced compared to the conventional module. Can do. Therefore, the alignment accuracy can be increased as a result of reducing the number of alignments.
  • the adhesive layer 26 may be formed prior to the connection of the inter-element connector 30.
  • the alignment is performed, but also the alignment of the adhesive layer 26 is completely covered with one electrode and a part of the other electrode. Therefore, it is not necessary that the alignment be highly accurate.
  • the back side electrode that contributes to the current collection in the element is formed, the back surface reflecting film that reflects the light transmitted through the element, and the inter-element connection body 30 that connects the elements are reduced. Since it can be formed by the number of steps, a light receiving element and a light receiving element module excellent in photoelectric conversion efficiency can be manufactured by fewer steps.
  • the module structure of the present invention is a structure that can prevent the situation where the currents between the light receiving elements do not coincide with each other as in the prior art.
  • the distance between the inter-element electrodes is small, the connection resistance between the elements is small, and the light transmitted through the element is reflected without performing highly accurate alignment.
  • the conductive resistance in the element is reduced. Since it can reduce, it has the effect that the light receiving element module excellent in the electric power generation output can be manufactured. According to the above embodiment, the light lost through transmission between the linear electrode 12 as the element electrode and the current collecting electrode 14 is reflected by the main body 32 of the inter-element connector 30 and enters the element. Accordingly, light transmission loss can be reduced, and the light receiving element module 1 having excellent photoelectric conversion efficiency can be manufactured.
  • the light transmitted between the linear electrode 12 and the collector electrode 14 on the substrate is reflected by the main body 32 of the inter-element connection body 30 due to the gain obtained.
  • the photoelectric flow rate changes.
  • the photoelectric flow rate is evaluated after the main body portion 32 of the inter-element connector 30 is connected to the element, and a module can be created by combining those with the same photoelectric flow rate.
  • the generated current value of the light receiving element 10 can be matched.
  • the light receiving element module of the above embodiment has an advantage that the situation where the currents between the light receiving elements do not coincide with each other can be prevented.
  • the second embodiment unlike the first embodiment, it is not necessary to change the shape of the inter-element connection body between the string end and the inside of the string. Since it is only necessary to rotate the inter-element connection body by 90 degrees and connect it, there is an advantage that the process of forming the module can be simplified. Further, since it is not necessary to newly provide an interstring connection body at the end of the string, the area occupied by modules other than the elements can be reduced. In the present embodiment, elements other than elements are inter-string connectors. Therefore, there is an advantage that a module having an excellent power generation amount per area can be obtained.
  • FIG. 24 is a plan view of a light receiving element with an inter-element connector constituting the light receiving element module according to the fourth embodiment as viewed from the back side.
  • FIG. 24 shows a module in which a light receiving element with an inter-element connection body is taken out by one repeating unit, and a linear electrode as an element electrode when the inter-element connection body 30 and the light receiving element 10 are connected. 12, the adhesive layer 26 or the sealing material 22, the light receiving surface side main surface material 23, and the back surface side main surface material 25 are omitted so that the positional relationship between the electrode 12 and the current collecting electrode 14 can be understood.
  • the main body portion 32 is divided into five parts, and four current extraction electrode connection portions 31 b of inter-element connection portions are provided between the main body portions 32.
  • the strip-shaped main body portion 32 and the current extraction electrode connection portion 31b are juxtaposed.
  • One end of the main body 32 is connected to the current extraction electrode connection 31b connected to the adjacent cell via the inter-element portion 31a.
  • the four current extraction electrode connection portions 31b are connected to an inter-element portion 31a connected to the main body portion 32 connected to an adjacent cell on the lower side of the drawing, not shown. That is, in this embodiment, both the element electrode and the inter-element connector 30 have a structure in which members having different polarities do not overlap on the element.
  • FIG. 25B shows a plan view excluding only the main body 32 and the insulating layer 26 of the inter-element connector.
  • FIGS. 26A to 26C are views of 6A-6B in a state where the main body portion 32 and the inter-element connection portion 31 of the inter-element connection body 30 are connected to the light receiving element 10 of FIGS. 24 and 25B.
  • FIG. 6 is a cross-sectional view when a light receiving element with an inter-element connection body is cut off along each line segment of 6C-6D and 6E-6F.
  • the inter-element connection body 30 of the present embodiment like the inter-element connection body 30 of the light-receiving element module described in the first embodiment, has a back connection type light reception having first and second element electrodes on the back surface side.
  • the elements 10a to 10f are connected.
  • the inter-element connection portion 31 of the inter-element connection body 30 and the main body portion 32 of the inter-element connection body 30 are both made of a conductive foil having flexibility. Then, as shown in FIG.
  • a main body portion 32 that covers almost the entire surface excluding the current extraction electrode 15 on the back surface of the light receiving element 10, and a current extraction electrode connection portion 31b of an inter-element connection portion connected to the current extraction electrode 15
  • the inter-element portion 31a of the inter-element connection body 30 connected between the back surface of the main body portion 32 and the current extraction electrode connection portion 31b of the inter-element connection portion 31.
  • the main body part 32 of the inter-element connector 30, the inter-element part 31 a of the inter-element connector 30, and the current extraction electrode connection part 31 b of the inter-element connector 30 are connected by the electrical connector 21 or 33.
  • they may be directly connected by spot welding, thermocompression bonding or the like without using an electrical connection body.
  • the main body portion 32 does not have a slit S, that is, a notch, is divided into five strips, and covers the entire semiconductor substrate 11 constituting the light receiving element except for the current extraction electrode 15. Different from 1. Furthermore, the main part 32 of the interelement connection body 30, the interelement part 31a, and the electric current extraction electrode connection part 31b differ in the point comprised from the components of three separate units. Other portions are the same as those in the first and second embodiments, and the description thereof is omitted here.
  • FIG. 24, FIG. 25 (a), FIG. 25 (b) is the figure which looked at the connection body 30 between elements from the back side of the module.
  • the inter-element portion 31a of the inter-element connector 30 connected to the main body 32 selectively connected to the linear electrode 12 which is one of the element electrodes is the second element of the adjacent light receiving element 10. It contacts the current extraction electrode connection portion 31b of the inter-element connector 30 connected to the current extraction electrode 15 that is an electrode.
  • current collecting electrodes 14 as second element electrodes are also formed in a stripe shape (linear shape) at regular intervals, and four current extraction electrodes 15 intersecting the current collecting electrodes 14. Is formed. Since the current extraction electrode connection portion 31b of the inter-element connector 30 is in contact with the current extraction electrode 15, the current collection distance of the second element electrode can be reduced, so that the current collection resistance is reduced. be able to.
  • resin sealing is performed to obtain a light receiving element module.
  • the body portion 32 of the inter-element connector 30 located on the light receiving element 10 is formed on the current extraction electrode 15. Therefore, the current extraction electrode connection portion 31b of the inter-element connection body 30 can be connected to the entire current extraction electrode 15 on the element, and the current collector on the current extraction electrode 15 can be connected. The resistance can be reduced, and a short circuit between the main body 32 and the current extraction electrode connection part 31b of the inter-element connector 30 can be prevented.
  • a portion where the current extraction electrode connection portion 31 is not connected to the current extraction electrode 15 is generated, and a portion where the current collecting resistance is increased on the current extraction electrode 15 is more reliably prevented. be able to. Further, the possibility that the insulating property is lowered in the laminated portion portion of the current extraction electrode 15 and the main body portion 32 can be more reliably suppressed in the present embodiment than in the case of the first embodiment.
  • the inter-element connection portion 31 of the inter-element connection body 30 formed on the current extraction electrode 15 and the main body on the inter-element connection portion 31.
  • the adhesive layer 26 made of an insulating layer
  • the portion corresponding to the laminated structure portion formed by the inter-element connection portion 31 of the inter-element connection body 30, the main body portion 32 of the inter-element connection body 30, and the inter-element connection portion 31 of the inter-element connection body 30 is provided. Can be eliminated.
  • the current extraction electrode 15 and the current extraction electrode connection portion 31b of the inter-element connection body 30 and the main body portion 32 are arranged in parallel and separated from each other, so that they are insulated in advance, have high reliability, and have a new insulating layer.
  • a module can be easily created without the need to provide a module.
  • the inter-element connection portion 31 of the inter-element connection body 30 has a structure that does not overlap with the main body portion 32 of the inter-element connection body 30 on the same element.
  • the inter-element connection portion 31 overlaps the main body portion 32.
  • the main body 32 in the fourth embodiment is connected between the elements by the amount of the laminated portion of the current extraction electrode connecting portion 31b and the main body 32 of the inter-element connector 30 on the current extraction electrode 15. The thickness of the light receiving element with the body is reduced.
  • the inter-element connection section 31, the main body section 32, the linear electrode 12, and the current extraction electrode 15 of the inter-element connection body 30 are connected by an electric connection body.
  • between the body part 32 and the inter-element part 31a of the inter-element connection body 30, and between the current extraction electrode connection part 31b of the inter-element connection body and the inter-element part 31a of the inter-element connection body 30. are connected by a second electrical connection body 33 (not shown), between the main body portion 32 of the inter-element connection body 30 and the linear electrode 12, and between the current extraction electrode 15 and the current extraction electrode of the inter-element connection body.
  • the connection part 31b is connected by an electrical connection body 21.
  • the same material or different ones may be used.
  • the inter-element connection section 31, the main body section 32, and the linear electrode 12 of the inter-element connection body 30 may be used.
  • a different electrical connection body may be formed in each part of the current extraction electrode 15.
  • the electrical connection body 21 is connected to the connection portion between the current extraction electrode connection portions 31b of the body 30, the inter-element connection portion 30a of the inter-element connection body 30 and the main body portion 32 of the electrical connection body, and the inter-element connection.
  • the electrical connection body 33 can be used for the connection portion between the inter-element portion 31 a of the body 30 and the current extraction electrode connection portion 31 b of the inter-element connection body 30.
  • the electrical connection body 21 is formed so as to cover the entire surface of the inter-element connection section 31 on the inter-element connection section 31.
  • the electrical connection body 21 can be formed only in the portion connected to the element electrode.
  • the type of the electrical connection body and the formation site of each electrical connection body may be arbitrarily combined, but the connection portion between the element electrode and the inter-element connection body so that the heating time of the element substrate is short and the heating temperature is low. It is good to use separately in the connection part between the connection body between elements, and the connection body between elements. For example, the melting temperatures of the electrical connectors 21 and 33 are different so that the element electrode and the body portion 31 of the inter-element connector 30 are not detached from the element electrode when heating is performed to connect the elements to form a string. It may be.
  • connection temperature of the electrical connection body 33 when the connection temperature of the electrical connection body 33 is higher than the connection temperature of the electrical connection body 21, the Connection between the inter-element part 31a of the connection body 30 and the main body part 32 of the electric connection body and "between the inter-element part 31a of the inter-element connection body 30 and the current extraction electrode connection part 31b of the inter-element connection body 30" Are connected by the electric connection body 33, and then “between the main body portion 32 of the electric connection body and the linear electrode 12” and “the current extraction electrode 15 and the current extraction electrode connection section 31b of the inter-element connection body 30”.
  • the electrical connection body 33 having a higher connection temperature is less affected by heat even in the subsequent connection of the electrical connection body 21, so that the string can be easily formed.
  • the advantage of being able to A When the connection temperature of the electrical connection body 33 is lower than the connection temperature of the electrical connection body 21, it is preferable to reverse the order of connection by each electrical connection body.
  • the electrical connection body 33 can have a lower melting temperature than the electrical connection body 21.
  • the melting temperature of the electrical connection body 33 is lower than that of the electrical connection body 21, when connecting each part by the electrical connection body, the electrical connection body 21 is first melted at a high temperature, and the current extraction electrode 15 and the element are connected.
  • the inter-connection portion 31 and the inter-element connection portion 31 and the main body portion 32 are connected, and then the main body portion 32 and the linear electrode are heated at a temperature at which the electric connection body 33 does not melt and the electric connection body 33 melts. 12 is advantageous in that it is easy to create a string because the former electrical connector connecting portion can be held without melting during the latter heating.
  • the combination of the location where the electrical connection body is used and the melting temperature may be reversed in the second embodiment according to the order of manufacture.
  • the electrical connector tin silver solder, tin bismuth solder, metallic tin, or the like can be used.
  • heating means such as a laser as described in prior art documents such as Patent Documents 5 to 6 in addition to solder or conductive adhesive The metal material may be melted and connected.
  • the main body 32 of the inter-element connector 30 has a recess 32R and a protrusion indicated by a dotted line in the figure.
  • a portion 32P is provided.
  • the convex portion 32P protruding to the light receiving surface side is larger than the gap between the protruding element electrodes 12, or the interval between the concave portions 32R that are concave to the light receiving surface side, that is, the width is the width of the linear electrode 12 that is the element electrode. If smaller, the main body portion 32 of the inter-element connector 30 contacts the linear electrode 12 that is an element electrode.
  • the main electrode 32 and the linear electrode 12 are not contacted with the collector electrode 14 which is an element electrode having a polarity opposite to that of the main body 32 of the inter-element connector 30 without alignment. Can only be connected with. Further, the width of the cross section of the convex portion 32P, which is a portion that protrudes toward the light receiving surface, is wider than the gap between the second element electrodes, that is, the linear electrodes 12, so that the main body portion 32 is a linear shape that is an element electrode. The electrode 12 is securely connected to the electrode 12.
  • the widths of the convex portions 32P in the X and Y directions are larger than the gaps in the X and Y directions between the linear electrodes 12 which are element electrodes. It is preferable that the distances in the X and Y directions of the recess 32R are smaller than the widths in the X and Y directions of the linear electrode 12 itself that is an element electrode.
  • the light-receiving element module having the repeating unit shown in FIG. 27 uses the main body portion 32 of the inter-element connection body 30 having the concave portions 32R and the convex portions 32P.
  • the deformation of the part 32 is facilitated, the warp of the light receiving element with the inter-element connection body can be reduced and the strength can be increased, and the body part 32 and the element electrode of the inter-element connection body 30 can be obtained without alignment.
  • 12 has the advantage that only 12 can be connected.
  • the adhesive layer 26 made of an insulating layer is formed on the current extraction electrode 15. Even if it does not form, it has the advantage that the short circuit between the main-body part 32 and the electric current extraction electrode 15 on the same element can be prevented. Accordingly, the number of steps for forming the insulating layer can be reduced.
  • FIG. 28 is a diagram showing a modification of the light receiving element module constituting the solar cell module according to Embodiment 4.
  • the strip-shaped main body portion 32 protrudes from the semiconductor substrate 11 constituting the element substrate of the light receiving device, and the inter-element portion 31a is made of a metal foil orthogonal to the main body portion 32.
  • the current extraction electrode connection part 31b of the inter-element connector 30 connected to the adjacent cell is connected to the inter-element part 31a.
  • Other parts are the same as those in the fourth embodiment.
  • the configuration of the inter-element portion is simpler than that of the fourth embodiment, and can be slightly downsized.
  • the inter-element portion 31a of the inter-element connection body 30 used in the fourth embodiment and the modified examples 8 and 9 and the main body portion 32 can be integrally formed. Although it is easy to handle by forming it integrally, the alignment accuracy may be severe.
  • Modification 10 29, 30, and 31 are diagrams showing a light receiving element module according to a modification of the fourth embodiment, in which a light receiving element having element electrodes on the semiconductor substrate having a polarity opposite to that in the semiconductor substrate is used. It is the top view which shows the pattern of the conductive area
  • the modified example 10 while the contact area between the semiconductor layer that becomes the recombination center of the carrier and the metal electrode is reduced, the distance to the inter-element connector 30 is minimized, and the current has a large plate thickness and low resistance.
  • the configuration is such that it flows through the inter-element connection body.
  • FIG. 29 is a diagram showing the in-plane distribution of the semiconductor region on the substrate surface on the back surface side of the semiconductor substrate, which is described not only for the inter-element connector 30 and the module member such as the sealing material but also for the passivation film or electrode.
  • FIG. 29 shows that the surface of the semiconductor substrate 11 is a semiconductor layer different from the semiconductor substrate 11 but is not formed.
  • the p-type doped region 16 the lightly doped n-type doped region 17a, and the heavily doped n-type doped region 17b. Indicates that a conductive region different from the semiconductor substrate 11 itself is formed on the surface.
  • FIG. 29 shows that the surface of the semiconductor substrate 11 is a semiconductor layer different from the semiconductor substrate 11 but is not formed.
  • the lightly doped n-type doped region 17a, and the heavily doped n-type doped region 17b Indicates that a conductive region different from the semiconductor substrate 11 itself is formed on the surface.
  • the passivation film 18 a covers the semiconductor substrate 11 constituting the element substrate, and the point electrode 12 ⁇ / b> D, the current collecting electrode 14, and the current extraction electrode 15, which are element electrodes, are formed in portions other than the region covered with the passivation film 18 a. It is formed so as to be juxtaposed on the back surface side of the semiconductor substrate 11.
  • 31 is a cross-sectional view taken along 6G-6H in FIG. FIG.
  • 31 shows a string cross section in a state where elements are connected by an inter-element connector 30, and a passivation film on the light receiving surface side, a module sealing material, a light receiving surface material, and a back surface protective material are omitted.
  • a photoelectric conversion element uses an internal photoelectric effect of a semiconductor substrate. Since the semiconductor substrate 11 used for the photoelectric conversion element has a relatively low conductivity, the resistance loss increases when the distance through which the current flows in the semiconductor substrate 11 is long. In addition, if the distance that the minority carriers move in the semiconductor substrate 11 is long, the extraction current to the outside of the semiconductor decreases due to the deactivation of the photogenerated carriers. Therefore, a general photoelectric conversion element has a structure in which conductivity in the in-plane direction is ensured by forming a metal electrode or a translucent electrode on the semiconductor substrate 11.
  • the structure is widely distributed throughout the semiconductor substrate surface while being spaced apart at a certain distance so that the electrode does not cover the entire semiconductor substrate in consideration of light loss due to the electrode shadow.
  • the structure in which the electrodes are widely distributed refers to a structure in which the electrodes in contact with the semiconductor substrate are distributed over the entire surface of the semiconductor substrate at intervals equal to or less than the diffusion length of minority carriers in the substrate.
  • the semiconductor substrate is much lower in conductivity than the metal, so that in the part where there is no electrode, the semiconductor substrate up to the element electrode in addition to the thickness of the element until the current flows through the element and reaches the electrode part It is preferable to reduce the distance between the device electrodes because the resistance itself increases and the resistance loss in the substrate increases. On the other hand, since the recombination speed of the carrier is increased at the portion where the semiconductor and the metal are in contact with each other, it is preferable that the contact area between the element electrode and the semiconductor is small. Therefore, the distance between the element electrodes has an optimum value.
  • the element structure of the back connection type photoelectric conversion element there are generally an MWT (Metal Wrap Through) cell, an EWT (Emitter Wrap Through) cell, and an IBC (Inter-digit Back-contact) cell.
  • MWT Metal Wrap Through
  • EWT emitter Wrap Through
  • IBC Inter-digit Back-contact
  • the light receiving element module of the present embodiment is mainly intended for an element structure having no element electrode on the light receiving surface, it can also be applied to an element having an element electrode on the light receiving surface.
  • element electrodes having two different polarities such as IBC cells and EWT cells
  • IBC cells and EWT cells need to be widely distributed while being separated only on one surface, wiring becomes complicated.
  • a structure in which element electrodes are connected to a wiring board facing comb-like wiring electrodes as in Patent Document 8 to collect current, or a method in which element electrodes are multilayered as in Patent Document 9 has been proposed. I came.
  • heat treatment is performed at about 200 to 400 ° C.
  • Non-Patent Document 1 describes that the leakage current between the two electrodes increases because the semiconductor layer and the metal having different potentials are short-circuited through each other. In this case, there is a problem that the photoelectric conversion efficiency is significantly lowered due to an increase in the leakage current, and the reliability of the element module is lost, for example, the element generates heat during the reverse bias and the sealing material melts. .
  • pinholes serving as metal diffusion paths are conspicuously generated in a passivation film on a semiconductor substrate having an uneven surface such as a solar cell, and thus the above-described problems are likely to occur.
  • a plate or foil that can stand on the metal electrode is used, even if there is a pinhole in the insulating film, it is not possible for the metal to follow the fine pinhole formed in the insulating film.
  • the thicker insulating layer 26 is formed on the passivation film 18a, the metal material is prevented from penetrating the passivation film 18a from portions other than the first opening 12h and the second opening 14h which are contact holes. It becomes possible.
  • Non-Patent Document 1 proposes a structure in which an electrode having the other polarity is directly in contact with a semiconductor layer having one polarity via a thin inorganic insulating layer formed on the semiconductor substrate.
  • a portion where metal is directly formed on the semiconductor substrate through a pinhole existing in the insulating film is generated, so that the metal diffused from the electrode onto the semiconductor layer having one polarity has a different potential from the semiconductor layer Since the metal is short-circuited, the decrease in photoelectric conversion efficiency becomes remarkable.
  • the above problem occurs because the semiconductor substrate and the electrode metal are in close contact with each other over only a thin insulating film, and the metal is heated to a high temperature on the semiconductor substrate having a large area.
  • the above problem is more prominent as the element area is larger.
  • the thick insulating layer 26 made of the resin layer is formed, the problem as in Non-Patent Document 1 can be avoided, and the photoelectric conversion efficiency can be improved. Can be planned.
  • the element electrode is directly contacted on the semiconductor substrate via an insulating film or a passivation film formed directly on the semiconductor substrate, and the element electrode is connected to the extraction wiring of the wiring portion.
  • the metal constituting the element electrode diffuses in the insulating layer by high temperature treatment for reducing contact resistance, diffuses into the semiconductor substrate, and functions as a recombination center.
  • Patent Document 2 has a problem in that a barrier layer is formed to prevent metal diffusion and the number of steps increases due to multilayering.
  • a metal foil having a large area and low resistance is provided on the main body portion 32 of the inter-element connection body 30 which is a conductor that does not directly contact the semiconductor substrate 11.
  • the current extraction electrode 15 and the point-like electrode 12D, which are element electrodes, and the current extraction part 31b and the main body part 32 of the inter-element connector 30 are taken at a relatively low temperature by using a joining member such as solder.
  • a joining member such as solder.
  • the body does not follow and the metal does not come into contact with the semiconductor substrate. Therefore, a short circuit from the inter-element connection body to the element substrate or the electrode having the opposite polarity hardly occurs.
  • the region in which the metal constituting the device electrode is in direct contact with the semiconductor substrate of the light receiving device that is the power generation device is limited to the low resistance semiconductor region to which the dopant is added at a relatively high concentration. be able to.
  • the insulating property can be improved by forming a sufficiently thick insulating layer 26 using a resin such as a polyimide resin which is less likely to cause pinholes.
  • the light receiving element module According to the present embodiment, even if there is a pinhole in an insulating film such as a passivation film on the element substrate, recombination in the semiconductor due to metal diffusion or the element electrode and vice versa. There is an advantage that short circuit between the semiconductor layers having the polarities is difficult to occur. By suppressing the short circuit as described above, heat generation due to leakage current is suppressed and photoelectric conversion efficiency is improved.
  • the semiconductor region in FIG. 29 is an n-type conductive layer and is a low-concentration n-type doped region 17a and a high-concentration n-type doped region 17b
  • the current extraction electrode 15 that is an element electrode and the same element
  • the inter-element connection portion 31b of the upper inter-element connection body 30 becomes a negative electrode in a light irradiation state
  • the point-like electrode 12D that is an element electrode on the same element and the main body portion 32 of the inter-element connection body 30 become a positive electrode.
  • the main body 32 is a positive electrode, as shown in FIG.
  • the element substrate having a relatively positive potential is directly above the semiconductor substrate 11 and the heavily doped n-type doped region 17b, which are element substrates having a negative potential.
  • the main body 32 of the connection body 30 is in an adjacent state via the insulating layer 26, the metal is not in direct contact with the semiconductor substrate and the connection temperature is low, so that high insulation can be obtained.
  • the electrical connection body 21 can exist only in the electrical conduction portion of the element electrode, and the main body portion 32 of the inter-element connection body 30 does not directly contact the semiconductor substrate 11. High insulation can be obtained. Therefore, copper, which is a good conductor with good solderability, is used as an electrode material for easily reducing the resistance in the device. Generally, it is used for device electrodes and is a rare resource, such as silver. Can be reduced.
  • the metal is in contact with the semiconductor substrate 11 in a low-concentration p-type doped region, that is, the p-type diffusion layer which is the p-type doped region 16, but a relatively high-concentration dopant is in contact with the metal as in the present embodiment. Since the influence of recombination by the metal is small when it exists in the semiconductor substrate in contact with the semiconductor substrate 11, the metal constituting the point electrode 12 ⁇ / b> D is in contact with the semiconductor substrate 11 through the p-type doped region 16 in the present embodiment. As compared with the case where a metal is present in a portion other than the p-type doped region 16, this is not a big problem.
  • the element electrode of Patent Documents 1 and 2 bears current collection
  • the element electrode itself needs a thickness to reduce the current collection resistance in the element plane.
  • a process for increasing the thickness of the element electrode by vacuum deposition, plating, or the like is necessary, if the light receiving element module of the present embodiment described in the first to fourth embodiments is used, the element of one pole The electrodes are not thick and have the advantage that the number of steps can be reduced because the resistance in the element substrate surface can be reduced at the same time as the elements are connected.
  • the metal vapor deposition film is not formed in an island shape due to a crack or a shape change caused by a volume change due to swelling of the resin insulation layer depending on the use environment of the module.
  • the conductivity of the metal film in the in-plane direction of the element is lowered due to continuous or peeling from the insulating layer.
  • the metal thin film is oxidized by moisture or the like and the conductivity is lowered.
  • the inter-element connection body used in each embodiment is a continuous metal film that can be self-supported, it is difficult to break, and the inter-element connection body on the back surface of the element is kept highly conductive. Has the advantage of being able to.
  • Patent Documents 8 and 9 since there are two polar electrodes on the same surface, alignment between the positive and negative element electrodes and the positive and negative inter-element connectors cannot be performed with high accuracy. Short circuit occurs between the positive and negative electrodes, and the photoelectric conversion efficiency of the module is greatly reduced. Therefore, it is necessary that the positive and negative element electrodes and the inter-element connector have a one-to-one correspondence, and it is necessary to align the electrode interval between the positive and negative inter-element connectors and the element electrodes. Therefore, the distance necessary to prevent a short circuit between the positive electrode and the negative electrode between the element electrode and the inter-element connector is not only the positional accuracy of the element electrode but also the alignment between the element and the insulating layer made of a resin film or the like.
  • the distance between the positive electrode and the negative electrode is limited by the alignment accuracy between the element and the inter-element connector.
  • the distance between the positive electrode and the negative electrode of the element electrode is long, the distance until the carriers generated in the element substrate reach the electrode between the positive electrode and the negative electrode is long. Therefore, the photoelectric conversion efficiency decreases due to resistance loss and carrier deactivation.
  • the specific separation distance that is, the pitch of the contact portion between the element electrode and the semiconductor substrate is preferably smaller than the minority carrier diffusion length in the semiconductor element substrate, and the resistance of the substrate, the minority carrier diffusion length of the substrate, and the semiconductor
  • the thickness is approximately 0.05 mm to 2 mm, although it depends on the method of forming the bond.
  • Patent Document 4 In the case where a substrate having a size of about 150 mm square is used with the above electrode spacing, in Patent Document 4, about 100 inter-element connection bodies including the positive electrode and the negative electrode are arranged accurately so that adjacent inter-element connection bodies do not contact each other. There is a problem that it is necessary to connect to the device electrode, and it is necessary to insulate between the electrodes having different polarities, which requires the number of processes and time. Also in Patent Document 3, there is a problem that the alignment accuracy is lowered due to thermal contraction of the resin sheet, or a marking process for alignment is required.
  • a narrower pitch of the connecting portion between the metal electrode and the semiconductor (or translucent electrode) can reduce the current collecting resistance, which is preferable for improving the photoelectric conversion efficiency. Therefore, in the present invention, the fine alignment between the inter-element connection body and the element, which is necessary at the time of creating the module in the conventional light receiving element module, is unnecessary, and the electrode of the element electrode does not depend on the alignment accuracy.
  • the pitch can be narrowed, the distance between the positive and negative electrodes can be narrowed, and the light receiving element module having excellent photoelectric conversion efficiency can be produced by a simple structure and method.
  • the inter-element connection body is limited to a metal acting as a dopant in the semiconductor substrate.
  • a conductive bonding member such as solder or conductive adhesive
  • various metal or other conductive materials can be combined and used as an inter-element connection body and an element electrode.
  • it has an advantage that a module excellent in productivity and resource saving can be manufactured.
  • the inter-element connection body and the element electrode can be used as an electrode only in an area up to about the same as the element area.
  • the inter-element connection body and the element electrode can be combined to use an area approximately twice the element area as the electrode.
  • the inter-element connection body is composed of a metal foil or a metal plate, it has extremely low resistance compared to the element electrode formed on the element, so that the overall module resistance can be reduced and the inter-element connection body thickness is generally reduced. Since it can be made thinner than a typical inter-element connection body, there is an advantage that the stress generated in the element due to a connecting process such as soldering can be reduced.
  • each width of the body portion of the inter-element connection body is wider than the width of the inter-element portion of the inter-element connection body, and is widely distributed on the semiconductor substrate. Since it is possible to cover almost the entire area of the linear electrode 12 or the dotted electrode 12 which is the element electrode, there is an advantage that the current collecting resistance in the element substrate surface can be lowered.
  • the inter-element connection body is connected for each light receiving element, and when the light receiving element is replaced, the light receiving element is removed from the inter-element connection body and a new element is attached again. Therefore, the waste of the light receiving element can be reduced.
  • the light receiving element formed by impurity diffusion into the silicon substrate is described as an example.
  • the present invention can be applied to all types of photoelectric conversion elements such as a junction light receiving element and a light emitting element.
  • the solar cell of the use which does not condense was described in the said embodiment, you may use for the solar cell which has a condensing system.
  • the size of the element is made smaller, the space between the elements is expanded, and the light receiving surface material is not a flat plate glass, but a translucent member having a lens corresponding to each element may be used.
  • the basic structure is the same as that described in the embodiment.
  • the light receiving element module according to the present embodiment does not include electrodes on the light receiving surface side and can have a uniform appearance, it has high designability and is used for an external mounting element such as a power source for a watch or a light receiving sensor. You can also.
  • the second element electrode having one polarity is divided into two parts, ie, a current extraction electrode 15 and a current collecting electrode 14. is doing.
  • the current extraction electrode 15 is an element electrode formed on the element, and indicates a part of the element electrode whose main purpose is to be connected to the inter-element connector.
  • the current collecting electrode 14 is not connected to the inter-element connection body, but is connected to the current extraction electrode, and is an element electrode for collecting current up to the current extraction electrode on the semiconductor substrate surface.
  • Patent Document 12 there is a structure in which a bus electrode is not formed as an electrode on an element, and a tab electrode, that is, an inter-element connector is directly connected to the finger electrode.
  • a portion of the finger electrode that is in direct contact with the inter-element connection body is used as a current extraction electrode, and a portion of the finger electrode that is not in contact with the inter-element connection body is a current collection electrode. It is also possible to apply a light receiving element module having an inter-element connection body according to each embodiment to a light receiving element substrate having no so-called bus electrode.
  • the element electrode structure is not limited to the above-described embodiment, and can be applied to, for example, a device having another type of element electrode structure that is in direct contact with a semiconductor and connected to the current collecting electrode. It is.
  • the 1st element electrode mainly has only a current collection electrode is handled, since it connects with the main-body part of an inter-element connection body, it functions as a current extraction electrode. Also have.
  • the first element electrode may also have a current extraction electrode in addition to the current collecting electrode.
  • the device structure to be used may be a back-connection type device structure, and the junction formed in the device is arbitrary. Can be used.
  • the light emitting element not only a pn junction but also a double heterojunction junction of GaN and GaInN may be used.
  • the term “direct contact” means that the contact is made with a low contact resistance, including a contact through a conductive member such as a plating layer or a conductive adhesive.
  • the configuration described in the above embodiment shows an example of the content of the present invention, and can be combined with another technique, and a part of the configuration can be used without departing from the gist of the present invention. It can be omitted or changed.
  • 1 light receiving element module 10, 10a to 10f light receiving element, 11 semiconductor substrate, 12 linear electrode, 12D dotted electrode, 12h first opening, 12a negative electrode first layer, 12b negative electrode second layer, 12c negative electrode third Layer, 12d negative electrode fourth layer, 13 current extraction electrode, 14h second opening, 14 current collecting electrode, 14a positive electrode first layer, 14b positive electrode second layer, 14c positive electrode third layer, 15 current extraction electrode, 16p Type doped region, 17 n type doped region, 17a high concentration n type doped region, 17b low concentration n type doped region, 17S surface electric field layer, 18a first passivation film, 18b second passivation film, 18c third passivation film, 21 Electrical connection body, 22 sealing material, 23 front side main surface material, 25 back side main surface material, 26 adhesive layer Insulating layer), 30 inter-element connection body, 31 inter-element connection section, 31a inter-element connection section, 31b current extraction electrode connection section, 32 main body section, 32P convex section, 32R concave section, 33

Abstract

A back-connection type photoelectric conversion element comprises, on the back surface: a linear electrode (12) that serves as a first element electrode; and a collector electrode (14) and a current extraction electrode (15), which serve as a second element electrode. The extraction electrode of the second element electrode is arranged so as to have a portion intersecting with the second element electrode in the middle part thereof. The first and second element electrodes are arranged side by side so as not to overlap each other on the back surface, and a plurality of back-connection type photoelectric conversion elements are connected by means of an inter-element connector (30) that is configured of a main body part (32) and an inter-element connection part (31). The main body part (32) is selectively and directly connected to the first element electrode, while having an adhesive layer (26) that serves as an insulating layer interposed between itself and the second element electrode. The main body part (32) covers the whole back surface of the photoelectric conversion element other than a part of the second electrode. The inter-element connection part (31) is connected to the main body part (32) and is connected to the second element electrode of an adjacent photoelectric conversion element, while being arranged along the current extraction electrode (15), which is the extraction electrode of the second element electrode. Due to this configuration, there can be obtained a photoelectric conversion element module which can be manufactured easily and has excellent photoelectric conversion efficiency.

Description

光電変換素子モジュール及び光電変換素子モジュールの製造方法Photoelectric conversion element module and method for manufacturing photoelectric conversion element module
 本発明は、光電変換素子モジュール及び光電変換素子モジュールの製造方法に係り、特に、素子間接続構造に関する。 The present invention relates to a photoelectric conversion element module and a method for manufacturing the photoelectric conversion element module, and more particularly to an inter-element connection structure.
 従来、受光面側に電極を設けることなく、非受光面側に正極と負極を設けた受光素子が縦横に複数並設され、1つの受光素子の正極と隣接する受光素子の負極とをインターコネクタとよばれる素子間接続体で接続した受光素子モジュールが開示されている。以下、受光素子を素子あるいは光電変換素子ということもある。 Conventionally, a plurality of light receiving elements having a positive electrode and a negative electrode provided on the non-light-receiving surface side are provided side by side without providing an electrode on the light-receiving surface side, and the positive electrode of one light receiving element and the negative electrode of the adjacent light receiving element are interconnected. There is disclosed a light receiving element module connected by an inter-element connection body called as a so-called element connecting body. Hereinafter, the light receiving element may be referred to as an element or a photoelectric conversion element.
 上記受光素子モジュールでは、一般に第1の受光素子の裏面に形成された正極と隣接する第2の受光素子の裏面に形成された負極とを電気的に接続するために、素子間接続体で素子間が接続される。素子間接続体を用いた接続方式は受光素子だけでなく、受光または発光面側に電極を設けることなく非受光面または非発光面側に正極と負極を素子電極として設けた光電変換素子全般に適用可能である。上記光電変換素子では、受光素子の受光面あるいは発光面に電極がないため、受光面積及び発光面積を確保することができる。また、素子間接続体は、受光素子の受光面を覆うことがない。従って、素子間接続体及び素子電極の形状を太くすることができ、受光素子内を集電する抵抗及び素子間を接続するための抵抗を小さくすることができる。従って、光-電気相互間の変換効率すなわち光電変換効率に優れるという利点がある。 In the light receiving element module, in order to electrically connect the positive electrode formed on the back surface of the first light receiving element and the negative electrode formed on the back surface of the adjacent second light receiving element, an interelement connection body is generally used. Are connected. The connection method using the inter-element connection body is not only for the light receiving element, but also for all photoelectric conversion elements in which a positive electrode and a negative electrode are provided as element electrodes on the non-light-receiving surface or non-light-emitting surface side without providing an electrode on the light-receiving or light-emitting surface side. Applicable. In the photoelectric conversion element, since there is no electrode on the light receiving surface or the light emitting surface of the light receiving element, a light receiving area and a light emitting area can be secured. Further, the inter-element connection body does not cover the light receiving surface of the light receiving element. Therefore, the shape of the inter-element connection body and the element electrode can be increased, and the resistance for collecting current in the light receiving element and the resistance for connecting the elements can be reduced. Therefore, there is an advantage that the conversion efficiency between light and electricity, that is, the photoelectric conversion efficiency is excellent.
 素子間接続体としては一般的に銅(Cu)箔等の導電性の高い金属の全面をはんだ被覆したものが用いられる。素子間接続体の接続においては、銀(Ag)等の金属からなる素子電極である正極または負極上に素子間接続体を配置して加熱し、部分的もしくは全長にわたり素子間接続体と素子電極とを圧着し、はんだ等の導電性部材により接続する。 As the inter-element connection body, generally, an entire surface of a highly conductive metal such as a copper (Cu) foil is coated with solder. In the connection of the inter-element connection body, the inter-element connection body is placed on the positive electrode or the negative electrode, which is an element electrode made of a metal such as silver (Ag), and heated, and the inter-element connection body and the element electrode are partially or over the entire length. And are connected by a conductive member such as solder.
 背面接続型の受光素子モジュールとしては、例えば特許文献1のように、素子電極としてグリッド電極と呼ばれる多数の細長い線状電極が、素子の端部でバス電極あるいは電流取出し電極へとまとめて接続され、電流取出し電極に対して、素子間接続体を用いて相互接続されたものがある。上記受光素子モジュールでは、多数の細長い線状電極で発電電流を素子の端部まで集電し、当該端部から素子間接続体を通じて隣接する素子へ電流が流れる。 As a back connection type light receiving element module, for example, as in Patent Document 1, a large number of elongated linear electrodes called grid electrodes are collectively connected to a bus electrode or a current extraction electrode at the end of the element. Some of the current extraction electrodes are interconnected using inter-element connectors. In the light receiving element module, a large number of elongated linear electrodes collect power generation current to the end of the element, and current flows from the end to the adjacent element through the inter-element connector.
 また、例えば特許文献2のように、素子上で、正と負のグリッド電極を、絶縁層を介して2層構造で形成し、素子電極とした太陽電池素子も提案されている。上記構造では、特許文献1に比べて素子の投影面積あたりの電極面積を増大することができ、電極面積増大の結果として受光電流に対する集電抵抗が低減され、抵抗による電力損失を小さくすることができる。 Also, as in Patent Document 2, for example, a solar cell element in which positive and negative grid electrodes are formed in a two-layer structure on an element via an insulating layer to form an element electrode has been proposed. In the above structure, the electrode area per projected area of the element can be increased as compared with Patent Document 1, and as a result of the increase in the electrode area, the current collecting resistance with respect to the received light current is reduced, and the power loss due to the resistance can be reduced. it can.
 この他には素子電極の厚みすなわち高さを増大することによっても集電抵抗を減らす事ができるが、素子との電極材料との熱膨張率の違いから、素子の反りが大きくなってしまうために素子電極の厚みを増大するには困難があった。これに対し、例えば特許文献3のように、正極と負極からなる素子電極が素子裏面に形成された素子に対して、素子裏面の正極と負極と同等のパターンの金属電極を設けた樹脂シートを配置し、樹脂シート上の金属電極を素子間接続体兼電流取出し電極として複数の素子間の素子電極を接続した受光素子モジュールも開示されている。 In addition to this, the current collecting resistance can be reduced by increasing the thickness or height of the element electrode, but the warpage of the element increases due to the difference in thermal expansion coefficient between the element and the electrode material. However, it has been difficult to increase the thickness of the device electrode. On the other hand, for example, as in Patent Document 3, a resin sheet in which a metal electrode having a pattern equivalent to the positive electrode and the negative electrode on the back surface of the element is provided on the element on which the device electrode including the positive electrode and the negative electrode is formed on the back surface of the element. A light receiving element module is also disclosed in which element electrodes between a plurality of elements are connected using metal electrodes on a resin sheet as inter-element connectors and current extraction electrodes.
 また、例えば特許文献4のように、受光素子のセルの裏面に正極と負極からなる素子電極が2層構造で成膜形成され、素子間接続線が素子電極と重なって素子全体に配置され、素子電極の延べ面積を増大することで光電流に対する集電抵抗を低減し、抵抗による電力損失を小さくした太陽電池モジュールも開示されている。 Further, for example, as in Patent Document 4, an element electrode composed of a positive electrode and a negative electrode is formed on the back surface of a cell of a light receiving element in a two-layer structure, and an inter-element connection line overlaps the element electrode and is disposed over the entire element. A solar cell module is also disclosed in which the current collecting resistance with respect to the photocurrent is reduced by increasing the total area of the element electrodes, and the power loss due to the resistance is reduced.
 特許文献1の素子構造では、多数の細長い線状電極が素子の端部まで発電電流を集電し、素子の端部でバス電極あるいは電流取出し電極へとまとめて接続される。そして、バス電極あるいは電流取出し電極に素子間接続体を接続し、素子間接続体を通じて隣接する素子へ電流が流れる。しかし、上記素子の構造では、発電電流を素子の端部まで線状電極によって集電する必要があり、集電時の抵抗損失が比較的大きいという問題がある。上記問題は特に、素子面積が大きい太陽電池において顕著である。また、特許文献1では、素子電極の正極と負極の平面上での位置関係が一定であるため、複数の素子によって形成されるストリングを作成し、ストリング間を接続する部分、即ちストリングの折り返し部分(端部)において、ストリング間に導体を配置して接続する必要がある。従って、モジュール面積に占める素子以外の部分の面積の割合が大きくなり、また、ストリング間部分での抵抗も付加され、モジュールとしての光電変換効率の向上をはかることができないという問題があった。また、素子電極を半導体基板上に直に形成するため、素子電極を構成する電極金属の種類あるいは素子構造によっては半導体基板内に金属が拡散し、光電変換効率を低下させるという問題があった。 In the element structure of Patent Document 1, a large number of elongated linear electrodes collect generated current up to the end of the element, and are connected together to the bus electrode or current extraction electrode at the end of the element. Then, the inter-element connection body is connected to the bus electrode or the current extraction electrode, and a current flows to the adjacent element through the inter-element connection body. However, in the structure of the element, it is necessary to collect the generated current to the end of the element by the linear electrode, and there is a problem that the resistance loss at the time of current collection is relatively large. The above problem is particularly remarkable in a solar cell having a large element area. Further, in Patent Document 1, since the positional relationship between the positive electrode and the negative electrode on the plane is constant, a string formed by a plurality of elements is created, and a portion that connects the strings, that is, a folded portion of the string It is necessary to arrange and connect a conductor between the strings at the (end portion). Therefore, the ratio of the area of the part other than the element occupying the module area is increased, and resistance between the strings is added, so that there is a problem that the photoelectric conversion efficiency as a module cannot be improved. In addition, since the element electrode is formed directly on the semiconductor substrate, there is a problem that the metal diffuses in the semiconductor substrate depending on the type of electrode metal constituting the element electrode or the element structure, and the photoelectric conversion efficiency is lowered.
 また、特許文献2では、素子の正と負の電極が2層にわかれて形成されており、構造が複雑である。従って素子の製造に際して、工程数と時間がかかり、一方の電極が素子の裏面全面を覆っているものの、素子上で電極の厚みを増大させて十分な集電抵抗の低減を図るのは困難であり、抵抗による電力損失を十分に小さくすることができないという問題があった。また、上記素子の構造では、モジュール化する際に発電電流を素子の端部まで素子上の電極によって集電する必要があり、集電時の抵抗損失が比較的大きいという問題がある。また、素子電極を半導体基板上に直に形成するため、素子電極を構成する電極金属あるいは素子構造によっては半導体基板内に金属が拡散し、光電変換効率を低下させるという問題があった。また、素子上に直接形成される素子電極の厚みが増えると、金属製の素子間接続体と受光素子基板との熱膨張率の違いから、素子間接続体付きの受光素子には反りが生じ、素子を破損させることなく平面形状に封止することができないという問題があった。特に一般的に用いられているガラス成分を含むペーストを焼成して形成する金属電極を素子電極に用いた場合、焼成時に高温が必要であり、電極面積及び厚みを増大すると素子の反りが大きくなるという問題があった。この反りの原因は、素子電極と素子基板との間だけでなく、素子間接続体と素子基板との間の熱膨張率の差によっても生じる。 In Patent Document 2, the positive and negative electrodes of the element are formed in two layers, and the structure is complicated. Therefore, in manufacturing the device, the number of processes and time are required, and although one electrode covers the entire back surface of the device, it is difficult to increase the thickness of the electrode on the device to sufficiently reduce the current collecting resistance. There is a problem that power loss due to resistance cannot be made sufficiently small. In addition, in the structure of the element, it is necessary to collect the generated current by the electrode on the element up to the end of the element when modularizing, and there is a problem that the resistance loss at the time of current collection is relatively large. In addition, since the element electrode is formed directly on the semiconductor substrate, there is a problem in that the metal diffuses into the semiconductor substrate depending on the electrode metal or element structure constituting the element electrode, thereby reducing the photoelectric conversion efficiency. In addition, when the thickness of the element electrode formed directly on the element increases, warpage occurs in the light receiving element with the inter-element connection body due to the difference in thermal expansion coefficient between the metal inter-element connection body and the light receiving element substrate. There has been a problem that it cannot be sealed in a planar shape without damaging the element. In particular, when a metal electrode formed by firing a paste containing a commonly used glass component is used as an element electrode, a high temperature is required during firing, and increasing the electrode area and thickness increases warping of the element. There was a problem. The cause of this warpage is caused not only by the element electrode and the element substrate, but also by the difference in the coefficient of thermal expansion between the inter-element connector and the element substrate.
 特許文献3では、素子上には電流取出し電極、バス電極を形成することなく、素子間接続体として金属パターンが形成された樹脂フィルムを用いており、モジュール化の際に素子間接続体と受光素子上の電極との位置あわせを行う必要があった。従って、特許文献3のモジュール構造では、正極と負極の間の短絡を防ぐために必要な間隔は、素子電極と半導体基板との位置精度のみではなく、素子と樹脂フィルムとの間の位置あわせ精度にも依存する。 In Patent Document 3, a resin film in which a metal pattern is formed is used as an inter-element connection without forming a current extraction electrode and a bus electrode on the element. It was necessary to align with the electrode on the element. Therefore, in the module structure of Patent Document 3, the interval necessary for preventing a short circuit between the positive electrode and the negative electrode is not only the positional accuracy between the element electrode and the semiconductor substrate, but also the alignment accuracy between the element and the resin film. Also depends.
 さらにまた、特許文献4では、正と負の電極が2層構造で受光素子裏面に形成されており、素子間接続体が素子電極と重なって素子全体に配置されるため、光電流に対する集電抵抗が低減される。しかし、特許文献4では素子電極の一列と素子間接続体の1本が一対一で対応する必要があるため、素子間接続体の間隔を電極間ピッチに合わせる必要がある。電極ピッチは半導体素子基板内の少数キャリアの拡散長よりも小さいことが好ましく、例えばシリコン基板の場合は比抵抗にも依るが2mm以下程度となる。従って、150mm角程度の大きさの基板を使用する場合で、70本程度の素子間接続体を隣接する素子間接続体が互いに接触しないように精度よくならべて素子電極に接続する必要があることになり、更に、他方の極性の電極とは絶縁する必要があり、位置あわせの工程が多く発生し、正極と負極との素子電極の位置あわせ、レイアウトが難しいという問題があった。 Furthermore, in Patent Document 4, since the positive and negative electrodes are formed on the back surface of the light receiving element in a two-layer structure, and the inter-element connector overlaps the element electrode and is disposed on the entire element, current collection for photocurrent is performed. Resistance is reduced. However, in Patent Document 4, since one row of element electrodes and one inter-element connection body need to correspond one-to-one, it is necessary to adjust the interval between the inter-element connection bodies to the inter-electrode pitch. The electrode pitch is preferably smaller than the diffusion length of minority carriers in the semiconductor element substrate. For example, in the case of a silicon substrate, although it depends on the specific resistance, it is about 2 mm or less. Therefore, when using a substrate having a size of about 150 mm square, it is necessary to arrange about 70 inter-element connection bodies accurately and connect them to the element electrodes so that adjacent inter-element connection bodies do not contact each other. Furthermore, there is a problem that it is necessary to insulate from the electrode of the other polarity, many alignment steps occur, and it is difficult to align and layout the element electrodes of the positive electrode and the negative electrode.
 また、受光素子等の素子と素子間接続体との間の接続方法として、特許文献5、特許文献6等の先行技術文献には、レーザー等の加熱手段で金属材料を溶融させて接続する方法も開示されている。 Further, as a connection method between an element such as a light receiving element and an inter-element connection body, a prior art document such as Patent Document 5 and Patent Document 6 includes a method in which a metal material is melted and connected by a heating means such as a laser. Is also disclosed.
 また、特許文献7では、ウエハの一方の面側に、パッシベーション膜で絶縁分離された第1電気接点と、第2電気接点とを設けた受光素子も提案されている。 Patent Document 7 also proposes a light receiving element in which a first electrical contact and a second electrical contact that are insulated and separated by a passivation film are provided on one surface side of a wafer.
 さらにまた、特許文献8,9では、裏面取出し型の受光素子に対し、素子電極に符合する配線を形成した配線板を用いた受光素子モジュールも提案されている。 Furthermore, Patent Documents 8 and 9 also propose a light receiving element module using a wiring board in which a wiring corresponding to the element electrode is formed for the back surface taking type light receiving element.
 また、特許文献10では、太陽電池セルの電極間及び配線シートの配線間の少なくとも一方に固定樹脂を設置した後に、固定樹脂を第1の硬化状態とし、その後、導電性物質を含む接合部材を設置し、太陽電池セルと配線シートとを重ね合わせて、第1の硬化状態の固定樹脂を軟化し、再度硬化して第2の硬化状態とする配線シート付き太陽電池セルの製造方法も提案されている。 Moreover, in patent document 10, after installing fixing resin in at least one between the electrodes of a photovoltaic cell, and between the wiring of a wiring sheet, fixing resin is made into the 1st hardening state, Then, the joining member containing an electroconductive substance is used. A method of manufacturing a solar cell with a wiring sheet is also proposed in which the solar cell and the wiring sheet are superposed to soften the fixed resin in the first cured state and re-cured into the second cured state. ing.
 また、例えば非特許文献1では、一方の極性を有する半導体層上に他方の極性の電極が半導体基板上に形成された薄い無機絶縁層を介して、半導体基板に直接接触する構造も提案されている。 For example, Non-Patent Document 1 proposes a structure in which an electrode having the other polarity is directly contacted with a semiconductor substrate through a thin inorganic insulating layer formed on the semiconductor substrate on a semiconductor layer having one polarity. Yes.
特表2010-521811号公報Japanese translation of PCT publication 2010-521811 特開2001-189475号公報JP 2001-189475 A 特開2010-245399号公報JP 2010-245399 A 特開2009-206366号公報JP 2009-206366 A 米国特許2004-0097062号明細書US 2004-2004062 Specification 国際公開第2012-171968号明細書International Publication No. 2012-171968 Specification 特表2008-519438号公報Special table 2008-519438 特開2011-151262号公報JP 2011-151262 A 特開2012-151240号公報JP 2012-151240 A 特開2012-99569号公報JP 2012-99569 A 国際公開第2008-113741号明細書International Publication No. 2008-1113741 Specification 特開2012-28806号公報JP 2012-28806 A
 以上のように、従来の素子構造では、グリッド電極、線状電極等の集電電極から電流取出し部までの距離が比較的長いため、抵抗損失が大きく、素子電極の厚みが必要であるという問題がある。素子電極あるいは素子間接続体の厚みが厚い場合、素子電極及び素子間接続体と受光素子基板との熱膨張率の違いから受光素子の反りが大きくなるが、特に、素子の片面にのみに素子電極が形成される背面接続型受光素子モジュールにおいては、受光素子の反りが特に大きくなり、素子ストリングを平面状に封止することができないという問題があった。 As described above, in the conventional element structure, since the distance from the current collecting portion such as the grid electrode and the linear electrode to the current extraction portion is relatively long, the resistance loss is large and the thickness of the element electrode is necessary. There is. When the thickness of the element electrode or inter-element connection body is large, the warpage of the light receiving element increases due to the difference in thermal expansion coefficient between the element electrode and inter-element connection body and the light receiving element substrate. In the back connection type light receiving element module in which the electrode is formed, the warp of the light receiving element is particularly large, and there is a problem that the element string cannot be sealed in a planar shape.
 また、集電電極が太く、正と負の集電電極の間隔が広い場合はキャリアが集電電極に到達するまでに素子内を平面方向に流れる距離が長くなり、集電抵抗の増大あるいはキャリア失活により集電効率が低下し、発電効率が低下する。従って、電極間隔あるいは電極幅を狭くする必要があり、正と負の電極を別個に形成する場合は、両者の位置精度を向上させる必要がある。 In addition, when the current collecting electrode is thick and the distance between the positive and negative current collecting electrodes is wide, the distance that carriers flow in the plane in the device before reaching the current collecting electrode becomes longer, increasing the current collecting resistance or the carrier. The current collection efficiency decreases due to the deactivation, and the power generation efficiency decreases. Therefore, it is necessary to narrow the electrode interval or electrode width, and when forming positive and negative electrodes separately, it is necessary to improve the positional accuracy of both.
 また、電極金属が素子基板上のパッシベーション膜等の絶縁膜上に直接形成される構造では、金属がパッシベーション膜のピンホールを通して素子基板と電気的に短絡する、あるいは、金属が素子基板内に拡散して再結合中心として作用し、光電変換効率に損失を生じるという問題があった。 In the structure in which the electrode metal is directly formed on an insulating film such as a passivation film on the element substrate, the metal is electrically short-circuited with the element substrate through the pinhole of the passivation film, or the metal diffuses into the element substrate. Thus, there is a problem that it acts as a recombination center and a loss occurs in photoelectric conversion efficiency.
 また、正と負の電極間は絶縁する必要があるため正と負の電極の間に隙間があいている。正と負の電極間の隙間は光を反射するものが無いため、隙間の部分に入射した光の一部は素子を透過して逃げてしまい、光の利用効率が悪く、光電変換効率に損失を生じるという問題があった。 Also, since it is necessary to insulate between the positive and negative electrodes, there is a gap between the positive and negative electrodes. Since there is no gap between the positive and negative electrodes that reflects light, part of the light incident on the gap is transmitted through the element and escapes, resulting in poor light utilization efficiency and loss in photoelectric conversion efficiency. There was a problem that caused.
 本発明は、上記に鑑みてなされたものであって、光電変換効率に優れ、製造の容易な光電変換素子モジュールを得ることを目的とする。 The present invention has been made in view of the above, and an object thereof is to obtain a photoelectric conversion element module that is excellent in photoelectric conversion efficiency and easy to manufacture.
 上述した課題を解決し、目的を達成するために、本発明の光電変換素子モジュールは、背面側に極性の異なる第1及び第2の素子電極を有する背面接続型の光電変換素子を導電板からなる素子間接続体によって接続して構成される。第1及び第2の素子電極は平面配置され、第2の素子電極が素子間接続部に接続される電流取出し電極と電流取出し電極に接続される複数の集電電極とから構成され、第2の素子電極の集電電極は、半導体基板の背面上で素子間接続部と交差して接続する部分を有し、第1の素子電極は、素子間接続部によって分断された複数の領域を有する。素子間接続体の本体部は板状であり、本体部の幅は素子間接続部の幅よりも広く、光電変換素子裏面の第2の素子電極とは絶縁層を介して当接して電気的には絶縁されるとともに、第1の素子電極とは直接電気的に接続され、本体部と電気的に接続された素子間接続体の素子間接続部が隣接する素子の第2の素子電極の電流取出し電極と直接接続される。 In order to solve the above-described problems and achieve the object, a photoelectric conversion element module according to the present invention includes a back connection type photoelectric conversion element having first and second element electrodes having different polarities on the back side from a conductive plate. And connected by an inter-element connector. The first and second element electrodes are arranged in a plane, and the second element electrode includes a current extraction electrode connected to the inter-element connection portion and a plurality of current collecting electrodes connected to the current extraction electrode. The current collecting electrode of the element electrode has a portion that intersects and connects with the inter-element connection portion on the back surface of the semiconductor substrate, and the first element electrode has a plurality of regions separated by the inter-element connection portion. . The body part of the inter-element connection body has a plate shape, and the width of the body part is wider than the width of the inter-element connection part, and is in contact with the second element electrode on the back surface of the photoelectric conversion element through an insulating layer. Is electrically insulated from the first element electrode, and the inter-element connection portion of the inter-element connection body electrically connected to the main body is adjacent to the second element electrode of the adjacent element. Directly connected to the current extraction electrode.
 本発明によれば、光電変換効率に優れ、製造の容易な光電変換素子モジュールを得ることができる。 According to the present invention, a photoelectric conversion element module that is excellent in photoelectric conversion efficiency and easy to manufacture can be obtained.
実施の形態1による受光素子モジュールを受光面側から見た平面図であり、理解を容易にするために封止材等のモジュール形成部材は省略FIG. 3 is a plan view of the light receiving element module according to the first embodiment when viewed from the light receiving surface side, and a module forming member such as a sealing material is omitted for easy understanding. 実施の形態1による受光素子モジュールを裏面側から見た平面図であり、理解を容易にするために封止材等のモジュール形成部材は省略It is the top view which looked at the light receiving element module by Embodiment 1 from the back surface side, and module forming members, such as a sealing material, are omitted for easy understanding 実施の形態1で用いられる受光素子モジュールを構成する受光素子及び素子間接続体との位置関係を模式的に示す斜視図であり、素子間接続体を接続する前の状態を素子と素子間接続体に接続された受光素子を裏面側から見た状態を示す図FIG. 2 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module used in Embodiment 1, and shows a state before connecting the inter-element connection body between the element and the inter-element connection; The figure which shows the state which looked at the light receiving element connected to the body from the back side 実施の形態1で用いられる素子間接続体付き受光素子を裏面側から見た図であり、(a)は、平面図、(b)は、図1及び図2のC-D断面図、(c)は、図1及び図2のE-F断面図、(d)は、図1及び図2のG-H断面図であり、理解を容易にするために素子間接続体、封止材等のモジュール形成部材は省略2A and 2B are diagrams of a light receiving element with an inter-element connection body used in Embodiment 1 as viewed from the back side, where FIG. 1A is a plan view, FIG. 1B is a cross-sectional view taken along line CD in FIGS. 1C is a cross-sectional view taken along the line EF in FIGS. 1 and 2, and FIG. 4D is a cross-sectional view taken along the line GH in FIGS. 1 and 2 for easy understanding. Module forming members such as are omitted 実施の形態1の受光素子モジュールにおける接着層のパターンを示す図The figure which shows the pattern of the contact bonding layer in the light receiving element module of Embodiment 1. 実施の形態1の受光素子モジュールに用いられる素子間接続体を示す図であり、(a)は、平面図、(b)は、(a)のI-J断面図、(c)は、(a)のK-L断面図であり、(b),(c)では、理解を容易にするために接着層を形成した状態を示す2 is a diagram illustrating an inter-element connection body used in the light-receiving element module according to Embodiment 1, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c) is ( It is KL sectional drawing of a), (b), (c) shows the state in which the adhesive layer was formed in order to facilitate understanding 実施の形態1の受光素子と接着層との位置関係の一例を示す図であり、(a)は、平面図、(b)は、(a)の受光素子に素子間接続体の素子間接続部を装着した状態を示す平面図、(c)は、(b)の受光素子にさらに素子間接続体の本体部を装着した状態を示す平面図It is a figure which shows an example of the positional relationship of the light receiving element of Embodiment 1, and an adhesive layer, (a) is a top view, (b) is the light receiving element of (a), and the connection between elements of an interelement connection body The top view which shows the state which mounted | wore the mounting | wearing part, (c) is a top view which shows the state which mounted | wore the light receiving element of (b) with the main-body part of the connection element between elements further. 実施の形態1で用いられる素子間接続体の配置を示す図The figure which shows arrangement | positioning of the connection body between elements used in Embodiment 1. 実施の形態1の受光素子モジュールを示す断面図であり、図1,図2のA-B断面を示すFIG. 3 is a cross-sectional view showing the light-receiving element module according to the first embodiment, and shows a cross section AB in FIGS. 実施の形態2による受光素子モジュールを裏面側から見た平面図であり、理解を容易にするために封止材等のモジュール形成部材は省略It is the top view which looked at the light receiving element module by Embodiment 2 from the back surface side, and module forming members, such as a sealing material, are omitted for easy understanding 実施の形態2で用いられる受光素子モジュールを構成する受光素子及び素子間接続体との位置関係を模式的に示す斜視図、素子間接続体を接続する前の状態を素子と素子間接続体に接続された受光素子を裏面側から見た状態を示す図The perspective view which shows typically the positional relationship with the light receiving element which comprises the light receiving element module used in Embodiment 2, and an inter-element connection body, The state before connecting an inter-element connection body is set to an element and an inter-element connection body. The figure which shows the state which looked at the connected light receiving element from the back side 実施の形態2の受光素子モジュールに用いられる素子間接続体を示す図であり、(a)は、平面図、(b)は、(a)のI-J断面図、(c)は、(a)のK-L断面図、(d)は、(a)のM1-N1断面図、(e)は、(a)のM2-N2断面図FIG. 6 is a diagram illustrating an inter-element connection body used in the light-receiving element module according to Embodiment 2, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c) is ( KL sectional view of a), (d) is an M 1 -N 1 sectional view of (a), and (e) is an M 2 -N 2 sectional view of (a). 実施の形態2の受光素子モジュールを示す断面図Sectional drawing which shows the light receiving element module of Embodiment 2. 実施の形態2の受光素子モジュールに用いられる素子間接続体の変形例を示す図であり、(a)は、平面図、(b)は、(a)のI-J断面図、(c)は、(a)のK-L断面図、(d)は、(a)のM1-N1断面図、(e)は、(a)のM2-N2断面図FIG. 6 is a diagram showing a modification of the inter-element connection body used in the light receiving element module according to Embodiment 2, wherein (a) is a plan view, (b) is a cross-sectional view taken along line IJ in (a), and (c). (A) is a KL sectional view, (d) is an M 1 -N 1 sectional view of (a), and (e) is an M 2 -N 2 sectional view of (a). 素子間接続体付き受光素子の変形例を示す図The figure which shows the modification of the light receiving element with a connection body between elements 素子間接続体付き受光素子の変形例を示す図The figure which shows the modification of the light receiving element with a connection body between elements 実施の形態1、2で用いられる素子間接続体の変形例を示す斜視図The perspective view which shows the modification of the connection body between elements used in Embodiment 1,2. 実施の形態1、2で用いられる素子間接続体の変形例を示す図The figure which shows the modification of the connection body between elements used in Embodiment 1,2. 実施の形態3の受光素子を示す図であり、(a)は、断面図、(b)は、(a)の要部拡大図、(c)は、(a)の要部拡大図It is a figure which shows the light receiving element of Embodiment 3, (a) is sectional drawing, (b) is the principal part enlarged view of (a), (c) is the principal part enlarged view of (a). 受光素子の変形例を示す断面図Sectional drawing which shows the modification of a light receiving element 受光素子の変形例を示す断面図Sectional drawing which shows the modification of a light receiving element 受光素子の変形例を示す断面図Sectional drawing which shows the modification of a light receiving element 受光素子の変形例を示す断面図Sectional drawing which shows the modification of a light receiving element 実施の形態4の素子間接続体付き受光素子を裏側から示した平面図The top view which showed the light receiving element with the connection body between elements of Embodiment 4 from the back side 実施の形態4の受光素子を裏側から示した図であり、(a)は、平面図、(b)は(a)に素子間接続体の素子間接続部が電流取出し電極に接続した状態を示す平面図It is the figure which showed the light receiving element of Embodiment 4 from the back side, (a) is a top view, (b) is the state which the element connection part of the element connection body connected to the current extraction electrode in (a). Plan view 実施の形態4の素子間接続体付き受光素子の断面図であり、(a)は、図25(a)中6A-6Bの線分の位置に相当する断面図、(b)は、図25(a)中6C-6Dの線分の位置に相当する断面図、(c)は、図25(a)中6E-6Fの線分の位置に相当する断面図25A is a cross-sectional view of a light receiving element with an inter-element connection body according to a fourth embodiment, where FIG. 25A is a cross-sectional view corresponding to the position of a line segment 6A-6B in FIG. 25A, and FIG. (A) A sectional view corresponding to the position of the line segment 6C-6D in FIG. 25, (c) is a sectional view corresponding to the position of the line segment 6E-6F in FIG. 実施の形態4の変形例となる素子間接続体付き受光素子を裏側から示した平面図The top view which showed from the back side the light-receiving element with the connection body between elements used as the modification of Embodiment 4 実施の形態4の変形例となる素子間接続体付き受光素子を裏側から示した平面図The top view which showed from the back side the light-receiving element with the connection body between elements used as the modification of Embodiment 4 実施の形態4に用いる、半導体基板上の電極が電極下の半導体基板内の導電領域と逆の極性を有する素子の、素子表面の導電領域のパターンを示す素子裏面側の平面図Plan view on the element back surface side showing the pattern of the conductive region on the element surface of the element used in the fourth embodiment, in which the electrode on the semiconductor substrate has the opposite polarity to the conductive region in the semiconductor substrate under the electrode 実施の形態4の素子を素子裏面側からみた平面図The top view which looked at the element of Embodiment 4 from the element back surface side 実施の形態4の受光素子モジュールを図30の6A-6B部分に相当する断面図Sectional view of the light-receiving element module according to Embodiment 4 corresponding to the 6A-6B portion of FIG.
 以下に、本発明にかかる光電変換素子モジュール及び光電変換素子モジュールの製造方法の実施の形態を、図面を用いて説明する。なお、本発明は以下の記述に限定されるものではなく、本発明の要旨を逸脱しない範囲において適宜変更可能である。また、図面においては、理解の容易のため、各部材の縮尺が実際とは異なる場合がある。各図面間においても同様である。さらに、実施の形態において同じ構成要素は同じ符号を付し、ある実施の形態において説明した構成要素については、別の実施の形態において詳細な説明を略している。本実施の形態では、光電変換素子として受光素子を例示して説明するが、半導体基板として直接遷移型のGaAsを用い、接合にダブルへテロジャンクション構造を有する発光素子等、種々の発光素子にも適用可能である。 Embodiments of a photoelectric conversion element module and a method for manufacturing a photoelectric conversion element module according to the present invention will be described below with reference to the drawings. In addition, this invention is not limited to the following description, In the range which does not deviate from the summary of this invention, it can change suitably. In the drawings, the scale of each member may be different from the actual scale for easy understanding. The same applies between the drawings. Furthermore, the same components in the embodiments are denoted by the same reference numerals, and the components described in one embodiment are not described in detail in another embodiment. In this embodiment, a light receiving element is described as an example of a photoelectric conversion element. However, various light emitting elements such as a light emitting element using a direct transition type GaAs as a semiconductor substrate and having a double heterojunction structure at a junction are also described. Applicable.
 実施の形態1.
 図1及び2は、実施の形態1による受光素子モジュールを受光面側及び裏面側から見た平面図である。図3は、同受光素子モジュールを構成する受光素子及び素子間接続体との位置関係を模式的に示す斜視図である。実施の形態1の受光素子モジュール1は、図1及び図2に示すように、背面接続型の受光素子10a~10fがひとつながりに直列に接続されて構成されている。ここでは、各受光素子を各受光素子の位置で識別する際には10a~10fとするとともに、受光素子単体としては総称して10としている。各受光素子10間は、導電板からなる素子間接続体30によって電気的に接続され、直線状の素子列すなわちストリングが形成され、ストリング間は本体部32と素子間接続部31とからなる素子間接続体30によって電気的に接続される。
Embodiment 1 FIG.
1 and 2 are plan views of the light receiving element module according to Embodiment 1 as viewed from the light receiving surface side and the back surface side. FIG. 3 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module. As shown in FIGS. 1 and 2, the light receiving element module 1 according to the first embodiment is configured by connecting back connection type light receiving elements 10a to 10f in series. Here, when each light receiving element is identified by the position of each light receiving element, it is set to 10a to 10f, and the light receiving element alone is collectively referred to as 10. The light receiving elements 10 are electrically connected by an inter-element connection body 30 made of a conductive plate to form a linear element row, that is, a string, and an element composed of a main body portion 32 and an inter-element connection portion 31 between the strings. It is electrically connected by the inter-connection body 30.
 図4(a)に実施の形態1で用いられる素子間接続体付き受光素子を裏面側から見た平面図を示す。図4(b)は、図1及び図2のC-D断面図、図4(c)は、図1及び図2のE-F断面図、図4(d)は、図1及び図2のG-H断面図である。なお図4では理解を容易にするために素子間接続体、封止材等のモジュール形成部材は省略している。本実施の形態では、受光素子10背面に形成される素子電極のうち、正極である第2の素子電極を、一定の間隔で平行に配列された複数本の集電電極14と受光素子10背面上の同一平面内で交差部をもつ2本の電流取出し電極15とで構成し、かかる2本の電流取出し電極15に沿って、素子間接続部31を装着する。そして第2の素子電極に対して、積層して重なり合う部分を持たず、平面配置された、負極である第1の素子電極を構成する線状電極12に対しては本体部32が直接接触している。 FIG. 4 (a) shows a plan view of the light receiving element with an inter-element connection body used in Embodiment 1, as viewed from the back side. 4B is a cross-sectional view taken along the line CD of FIGS. 1 and 2, FIG. 4C is a cross-sectional view taken along the line EF of FIGS. 1 and 2, and FIG. 4D is a cross-sectional view taken along the lines of FIGS. FIG. In FIG. 4, module forming members such as inter-element connectors and sealing materials are omitted for easy understanding. In the present embodiment, among the element electrodes formed on the back surface of the light receiving element 10, a plurality of current collecting electrodes 14 and the back surface of the light receiving element 10 are arranged such that the second element electrode, which is a positive electrode, is arranged in parallel at regular intervals. It is composed of two current extraction electrodes 15 having intersections in the same plane, and an inter-element connection portion 31 is mounted along the two current extraction electrodes 15. The main body portion 32 is in direct contact with the linear electrode 12 constituting the first element electrode which is a negative electrode, which is disposed in a plane without having an overlapping portion overlapping the second element electrode. ing.
 すなわち、複数本の集電電極14と、これに交差接続する2本の電流取出し電極15との形成された領域を除き、また集電電極14と電流取出し電極15とから離間して、裏面全体に第1の素子電極が形成されて素子電極を構成する。そして、本体部32が線状電極12以外の素子電極とは絶縁した状態で、電気接続体21によって線状電極12と本体部32の面全体で広く分布して接続されている。素子電極と素子間接続体30とのパターン配置により、素子間接続体30と素子電極上での集電距離を低減し、かつ本体部32等による素子透過光の反射により光吸収率を高めることができる。本実施の形態における受光素子10は非受光面側に電流取出し電極15が形成されており電流取出し電極15による電極影ができないため、電流取出し電極15の本数は多い方が好ましく、一方で製造上の生産性の観点からは本数が少ない方がよいため、例えば4-16本とすることができる。以下において素子電極とは、線状電極12、線状電極12の電流取出し電極、集電電極14、集電電極14の電流取出し電極15等、受光素子10上に形成される電極を指すものとする。本実施の形態では、2つの極性を持つ第1及び第2の素子電極が単層構造を構成して重なり合う部分を持たず、平面配置されている。 That is, except for the region where the plurality of current collecting electrodes 14 and the two current extraction electrodes 15 cross-connected thereto are formed, and separated from the current collection electrode 14 and the current extraction electrode 15, the entire back surface A first element electrode is formed on the element to constitute an element electrode. The main body 32 is widely distributed and connected to the entire surface of the linear electrode 12 and the main body 32 by the electrical connection body 21 while being insulated from the element electrodes other than the linear electrodes 12. The pattern arrangement of the element electrode and the inter-element connection body 30 reduces the current collection distance on the inter-element connection body 30 and the element electrode, and increases the light absorptance by reflection of the element transmitted light by the main body 32 or the like. Can do. In the light receiving element 10 in the present embodiment, the current extraction electrode 15 is formed on the non-light-receiving surface side and an electrode shadow by the current extraction electrode 15 cannot be formed. Therefore, it is preferable that the number of the current extraction electrodes 15 is large. From the viewpoint of productivity, it is better that the number is smaller, so that the number can be 4-16, for example. In the following, the element electrode refers to an electrode formed on the light receiving element 10 such as the linear electrode 12, the current extraction electrode of the linear electrode 12, the current collecting electrode 14, the current extraction electrode 15 of the current collecting electrode 14, and the like. To do. In the present embodiment, the first and second element electrodes having two polarities constitute a single-layer structure and do not have overlapping portions, but are arranged in a plane.
 本実施の形態の受光素子10は第1の素子電極である線状電極12の電流取出し電極をもたない。また、素子間接続体30の本体部32と直接接続されない極性の素子電極である第2の素子電極における集電電極14は、互いに交差接続する電流取出し電極15に接続される。そして電流取出し電極15が、素子間接続体30の素子間接続部31に直接接続される。一方、第2の素子電極により不連続部を持ち分断された第1の素子電極は、素子間接続体30の本体部32に直接接続される。 The light receiving element 10 of the present embodiment does not have the current extraction electrode of the linear electrode 12 which is the first element electrode. Further, the current collecting electrode 14 in the second element electrode which is an element electrode having a polarity that is not directly connected to the main body portion 32 of the inter-element connector 30 is connected to the current extraction electrodes 15 that are cross-connected to each other. The current extraction electrode 15 is directly connected to the inter-element connection portion 31 of the inter-element connector 30. On the other hand, the first element electrode divided by the discontinuous part by the second element electrode is directly connected to the main body part 32 of the inter-element connector 30.
 上記構成により、第2の素子電極側では、導電性の高い素子間接続部31及び電流取出し電極15によって効率よく集電されることで、素子間の集電抵抗の大部分は集電電極14から電流取出し電極15までの距離分だけで済む。通例の両面に電極を有する受光素子の裏面電極と同様、電流取出し電極15が素子の表面上を分割する位置に分布するため、素子電極内での集電距離は、通例の両面にパッシベーション膜と素子電極とを有する受光素子の裏面電極の集電距離と同等である。これは素子端部に電流取出し電極を有する通例の背面接続型の受光素子に比べて最大でも半分程度以下の集電距離にすることを意味し、素子電極の導体抵抗が通例と変わらなければ半分程度以下の集電抵抗とすることができることを意味する。 With the above configuration, on the second element electrode side, current is efficiently collected by the highly conductive inter-element connection portion 31 and the current extraction electrode 15, so that most of the current collecting resistance between the elements is the collecting electrode 14. The distance from the current extraction electrode 15 to the current extraction electrode 15 is sufficient. Similar to the back electrode of the light receiving element having electrodes on both sides, the current extraction electrode 15 is distributed at the position where the surface of the element is divided. Therefore, the current collecting distance in the element electrode is the same as the passivation film on both sides. It is equivalent to the current collection distance of the back surface electrode of the light receiving element which has an element electrode. This means that the current collecting distance is at most about half or less than that of a conventional back-connected light receiving element having a current extraction electrode at the end of the element. If the conductor resistance of the element electrode is not different from the usual, it is half. It means that the current collecting resistance can be less than about.
 さらに、本実施の形態は背面接続型受光素子に関するものであり電極面積が増えても電極影面積は増えないため、電流取出し電極15及び素子間接続部31の本数を任意に増大することができる。従って、電流取出し電極15及び素子間接続部31をn本に増大することにより集電距離及び集電抵抗を1/2n程度までに低減することができ、抵抗が大きい素子電極における集電距離を通例の両面に電極を有する受光素子の裏面電極のよりも短くすることができるという効果を有する。 Furthermore, the present embodiment relates to a back connection type light receiving element. Since the electrode shadow area does not increase even if the electrode area increases, the number of current extraction electrodes 15 and inter-element connection portions 31 can be arbitrarily increased. . Accordingly, by increasing the number of current extraction electrodes 15 and inter-element connection portions 31 to n, the current collection distance and the current collection resistance can be reduced to about ½ n, and the current collection distance in the element electrode having a large resistance can be reduced. It has the effect that it can be made shorter than the back surface electrode of the light receiving element which has an electrode on both surfaces normally.
 一方、第1の素子電極側は、素子間接続体30の本体部32に直接接続されることで、素子電極による集電抵抗は第1の素子電極の厚み分のみとなり、抵抗を大幅に低減することが可能となる。なお、素子裏面での第1及び第2の素子電極の占有面積は、両者の配線抵抗ができるだけ小さくなるように、面積比を調整することで、集電抵抗を大幅に低減することができる。本体部の幅は、素子間接続部の幅よりも広いことでより広範囲の第1の素子電極に直接接続し、集電抵抗を低減することができる。 On the other hand, since the first element electrode side is directly connected to the main body 32 of the inter-element connector 30, the current collecting resistance by the element electrode is only the thickness of the first element electrode, and the resistance is greatly reduced. It becomes possible to do. Note that the current collecting resistance can be significantly reduced by adjusting the area ratio of the area occupied by the first and second element electrodes on the back surface of the element so that the wiring resistance between them is as small as possible. Since the width of the main body is wider than the width of the inter-element connection portion, it can be directly connected to a wider range of the first element electrodes and the current collecting resistance can be reduced.
 また、素子間接続体の本体部の幅が広いことによって、素子間接続体の導体抵抗を低く保ったまま厚みを低減することができるため、素子基板と素子間部との熱膨張率の違いによる素子の反りを低減し、素子の強度を高く保ち、破損を防ぐことができるという利点を有する。このことは素子間接続部についても同様であり、本実施の形態の構成により、素子間接続部の本数を増大することができ、この結果素子間接続部の素子に対する投影面積を増大することができ、素子の反りを低減し、素子の強度を高く保ち、破損を防ぐことができるという利点を有する。両面に素子間接続体が接続される素子に比べて、一方の面のみに素子間接続体が接続される背面接続型の素子モジュールにおいては素子基板と素子間接続体との熱膨張率差による反りは大きいが、本実施の形態の構成を用いることにより、反りを低減することができる。なお、ここで直接接続とは、はんだ層等の導電性接着層を介して接続されるものあるいは溶着等により接続されるもの、静電接合による密着接続等低抵抗での電気的接続をいうものとする。 In addition, since the width of the body part of the inter-element connection body is wide, the thickness can be reduced while keeping the conductor resistance of the inter-element connection body low, so the difference in coefficient of thermal expansion between the element substrate and the inter-element part The advantage is that the warpage of the element due to the above can be reduced, the strength of the element can be kept high, and damage can be prevented. The same applies to the inter-element connection section. With the configuration of the present embodiment, the number of inter-element connection sections can be increased, and as a result, the projected area of the inter-element connection section with respect to the elements can be increased. It is possible to reduce the warpage of the device, to keep the strength of the device high, and to prevent breakage. Compared with the element where the inter-element connection body is connected to both sides, in the back connection type element module where the inter-element connection body is connected to only one surface, the thermal expansion coefficient difference between the element substrate and the inter-element connection body Although the warp is large, the warp can be reduced by using the structure of this embodiment. Here, the direct connection means an electrical connection with a low resistance such as a connection through a conductive adhesive layer such as a solder layer or a connection by welding, or a close connection by electrostatic bonding. And
 なお、図1及び図2において、ひとつながりの素子列の末端の受光素子10では電流引き出し線38が受光素子10に接続され、図示を省略するが受光素子列が封止材22によって封止されている。封止構造については後述する。半導体基板11は図9に、図1及び図2のA-B断面を示すように、封止材22の外側を表面側主面材23で覆われている。2本の電流引き出し線38の一部が、裏面側主面材25及び裏面側の封止材22に形成された孔の部分から、封止材22と裏面側主面材25の外に出た状態となる。封止材22から出た電流引き出し線38は、ジャンクションボックス中の導線と接続されて、ジャンクションボックスに接続されたケーブルを通じて受光素子モジュール1の外部に取り出せるようにする。図1,2では見易さのために、フレーム、ジャンクションボックスの図示を省略している。 1 and 2, in the light receiving element 10 at the end of the connected element row, the current lead line 38 is connected to the light receiving element 10, and although not shown, the light receiving element row is sealed with the sealing material 22. ing. The sealing structure will be described later. The semiconductor substrate 11 is covered with the front-side main surface material 23 on the outer side of the sealing material 22 as shown in the cross section AB of FIGS. 1 and 2 in FIG. A part of the two current lead lines 38 exits the sealing material 22 and the back side main surface material 25 from the holes formed in the back side main surface material 25 and the back surface side sealing material 22. It becomes a state. The current lead line 38 coming out from the sealing material 22 is connected to a conductor in the junction box so that it can be taken out of the light receiving element module 1 through a cable connected to the junction box. In FIGS. 1 and 2, the frame and the junction box are not shown for easy viewing.
 以下では、まず、受光素子10を素子間接続体30で接続した受光素子モジュール1の構造について説明した後、受光素子10の構造について説明し、そして受光素子10間を接続する素子間接続体30の構造について説明する。 In the following, first, the structure of the light receiving element module 1 in which the light receiving elements 10 are connected by the interelement connecting bodies 30 will be described, then the structure of the light receiving elements 10 will be described, and the interelement connecting bodies 30 for connecting the light receiving elements 10 to each other. The structure of will be described.
 本実施の形態の受光素子モジュール1は、図1~3に示すように、受光素子10a~10fと受光素子10a~10f間を接続する素子間接続体30とで構成される。素子間接続体30は、背面側に第1及び第2の素子電極を有する背面接続型の受光素子10a~10fを接続するもので、受光素子10a~10fの背面のほぼ全体を覆う本体部32と、本体部32に接続され、隣接する受光素子の第2の素子電極に接続される素子間接続部31とを備える。受光素子10a~10fの第1の素子電極としての線状電極12及び第2の素子電極としての集電電極14は、一定の間隔で互いに平行となるように交互に配置された平行部を含む。そして第2の素子電極は平行部の集電電極14と交差する電流取出し電極15を含む。本体部32は受光素子10の第1の素子電極との接続点あるいは接続領域以外の部分の表面は受光素子10を透過する光に対して高反射性をもつ光反射体からなることが好ましい。また本体部32は、受光素子10a~10fの第1の素子電極である線状電極12に選択的に直接接続されるとともに、第2の素子電極である集電電極14には絶縁層である接着層26を介して配置される。そして後述するように、接着層26に散乱性粒子を分散させる。これにより、本体部32による反射に加え、本体部32と受光素子10a~10fの間に接着層26で反射部を構成し、線状電極12を備えた第1の素子電極、集電電極14を備えた第2の素子電極の隙間から受光素子10a~10fに反射光が入射し、光電変換効率を高めることができる。図5にモジュール状態における接着層26の形状を示す。 As shown in FIGS. 1 to 3, the light receiving element module 1 according to the present embodiment includes light receiving elements 10a to 10f and an inter-element connection body 30 that connects the light receiving elements 10a to 10f. The inter-element connector 30 is connected to the back connection type light receiving elements 10a to 10f having the first and second element electrodes on the back side, and the main body 32 covers almost the entire back surface of the light receiving elements 10a to 10f. And an inter-element connection portion 31 connected to the main body portion 32 and connected to the second element electrode of the adjacent light receiving element. The linear electrodes 12 as the first element electrodes and the collecting electrodes 14 as the second element electrodes of the light receiving elements 10a to 10f include parallel portions arranged alternately so as to be parallel to each other at a constant interval. . The second element electrode includes a current extraction electrode 15 that intersects the parallel collecting electrode 14. It is preferable that the main body 32 is formed of a light reflector having high reflectivity with respect to light transmitted through the light receiving element 10 on the surface of the portion other than the connection point or the connection region with the first element electrode of the light receiving element 10. The main body 32 is selectively connected directly to the linear electrode 12 that is the first element electrode of the light receiving elements 10a to 10f, and is an insulating layer for the current collecting electrode 14 that is the second element electrode. It arrange | positions through the contact bonding layer 26. FIG. Then, as will be described later, the scattering particles are dispersed in the adhesive layer 26. Thereby, in addition to the reflection by the main body 32, the reflection portion is constituted by the adhesive layer 26 between the main body 32 and the light receiving elements 10a to 10f, and the first element electrode including the linear electrode 12 and the current collecting electrode 14 are provided. Reflected light is incident on the light receiving elements 10a to 10f through the gap between the second element electrodes provided with the photoelectric conversion efficiency. FIG. 5 shows the shape of the adhesive layer 26 in the module state.
 そして、本実施の形態の素子間接続体付き受光素子では、図3及び4図(a)~(d)に示すように、素子間接続部31は、本体部32に連設され、隣接する受光素子10の第2の素子電極である電流取出し電極15に接続される。第2の素子電極は、集電電極14と、集電電極14の線分の両端からそれぞれ線分の約1/4の長さの部分で交わるように、すなわち、集電電極14上で集電電極14に対して交差部をもつように配された電流取出し電極15とで構成されているため第2の素子電極から素子間接続体までの集電距離は極めて短いものとなり、効率よく集電がなされる。さらに本体部32は、線状電極12に選択的に直接接続されるとともに、集電電極14には絶縁層である接着層26を介して配置され、スリットSの部分を除いて、受光素子10の背面側の全体を覆う。また電流取出し電極15は、第1の素子電極である線状電極12を、当該線状電極12の長手方向に2箇所で分断し、分断部で電流取出し電極15の長手方向と交差して配置されている。上述したように、線状電極12は分断されているが、素子間接続体30の本体部32に直接当接しているため、素子間接続体30までの集電距離は線状電極12の厚み部分のみであり、ほとんど0に等しく、導電抵抗は極めて低い。 In the light receiving element with an inter-element connection body according to the present embodiment, as shown in FIGS. 3 and 4 (a) to (d), the inter-element connection portion 31 is connected to the main body portion 32 and is adjacent thereto. It is connected to a current extraction electrode 15 that is a second element electrode of the light receiving element 10. The second element electrode intersects with the current collecting electrode 14 at both ends of the line segment of the current collecting electrode 14 at a length of about 1/4 of the line segment, that is, on the current collecting electrode 14. Since the current extraction electrode 15 is arranged so as to have a crossing portion with respect to the current electrode 14, the current collection distance from the second element electrode to the inter-element connector is extremely short, and the current collection is performed efficiently. Electricity is made. Further, the main body 32 is selectively connected directly to the linear electrode 12 and is disposed on the current collecting electrode 14 via an adhesive layer 26 that is an insulating layer, except for the slit S portion. Cover the entire back side. In addition, the current extraction electrode 15 divides the linear electrode 12 as the first element electrode at two locations in the longitudinal direction of the linear electrode 12, and is arranged so as to intersect the longitudinal direction of the current extraction electrode 15 at the division portion. Has been. As described above, although the linear electrode 12 is divided, the current collecting distance to the inter-element connector 30 is the thickness of the linear electrode 12 because it is in direct contact with the main body 32 of the inter-element connector 30. It is only a part, almost equal to 0, and the conductive resistance is very low.
 実施の形態1の受光素子10は、図3及び図4(a)に示すように、基板の平面形状が矩形で、厚さが例えば0.05~0.5mmの薄板状の、pn接合を有する半導体基板11によって構成される。ここでの矩形とは、互いに垂直となる2組の平行な辺を有する四角形形状を意味する。特に、単結晶を用いた受光素子10では、円柱の単結晶インゴットから矩形の基板を形成する際に、円形から矩形に切り落とされて無駄となる部分を減らすために、図4(a)に示すような角の一部が切り落とされた形状の基板が使用されることが多い。上記形状も含め若干変形したものも矩形のなかに含まれる。図では、正方形の角の一部が切り落とされた形状の例を示したが、これを半分に割ることで長方形形状をなすものであってもよい。 As shown in FIG. 3 and FIG. 4A, the light receiving element 10 of the first embodiment is a thin plate-like pn junction having a rectangular planar shape and a thickness of, for example, 0.05 to 0.5 mm. The semiconductor substrate 11 is provided. The rectangle here means a quadrangular shape having two sets of parallel sides perpendicular to each other. In particular, in the light receiving element 10 using a single crystal, when forming a rectangular substrate from a cylindrical single crystal ingot, in order to reduce a portion that is cut off from a circle to a rectangle and is wasted, as shown in FIG. In many cases, a substrate having a shape in which a part of the corner is cut off is used. Those that are slightly deformed, including the above shapes, are also included in the rectangle. In the figure, an example of a shape in which a part of a square corner is cut off is shown, but a rectangular shape may be formed by dividing this into half.
 図4(a)~(d)に示すように、受光素子10の裏面側の領域には、一方の極性の素子電極として線状電極12が、他方の極性の電極として集電電極14と、集電電極14の電流取出し電極15とが形成されている。線状電極12の一部は、素子基板の図示しないパッシベーション膜の開口部を通じて基板と導通するが、これ以外の部分の電極がパッシベーション膜と接触する部分としては、素子を透過した光を反射することが好ましいため線状電極12の素材としてはアルミニウム(Al)、ニッケル、錫、銅、銀、金等の金属、その混合体及び合金の広い波長範囲において光反射率が高い材料を主に含んだ金属材料を用い、反射金属層とすることが好ましい。反射金属層の上に2層目として金属材料あるいは反射金属層との反応を抑制するバリア層を積層していくことにより線状電極12における電気伝導を向上させることができ、反射金属層との反応を抑制するための材料としては、ニッケル、錫、銅、銀、チタンタングステン(TiW)等の金属、上記材料の混合体及び合金及び上記材料の積層体を用いることができる。上記素子電極自体を構成する材料としては金属以外にも樹脂成分あるいはガラス成分等の添加剤を含んでも良く、導電性接着剤等を使用してもよい。素子電極構成材料以外にも、例えばアモルファスシリコンと単結晶シリコンとのヘテロ接合によって半導体接合が形成された受光素子の場合は、インジウム酸化物等の透光性導電膜によって形成される透光性電極とアルミニウム、銀、金等の金属層を積層したものを用いてもよい。 As shown in FIGS. 4A to 4D, in the region on the back surface side of the light receiving element 10, a linear electrode 12 as an element electrode of one polarity, a collecting electrode 14 as an electrode of the other polarity, A current extraction electrode 15 of the current collecting electrode 14 is formed. A part of the linear electrode 12 is electrically connected to the substrate through an opening of a passivation film (not shown) of the element substrate, but the other part of the electrode is in contact with the passivation film and reflects light transmitted through the element. Therefore, the material of the linear electrode 12 mainly includes a material having a high light reflectance in a wide wavelength range of metals such as aluminum (Al), nickel, tin, copper, silver, gold, a mixture thereof, and an alloy. It is preferable to use a metallic material to form a reflective metal layer. By laminating a barrier layer that suppresses the reaction with the metal material or the reflective metal layer as the second layer on the reflective metal layer, the electric conduction in the linear electrode 12 can be improved. As a material for suppressing the reaction, metals such as nickel, tin, copper, silver, titanium tungsten (TiW), mixtures and alloys of the above materials, and laminates of the above materials can be used. The material constituting the element electrode itself may include additives such as a resin component or a glass component in addition to metal, and a conductive adhesive may be used. In addition to the element electrode constituent material, for example, in the case of a light receiving element in which a semiconductor junction is formed by heterojunction of amorphous silicon and single crystal silicon, a translucent electrode formed by a translucent conductive film such as indium oxide And a laminate of metal layers such as aluminum, silver, and gold may be used.
 上記線状電極12の積層体の最外層としては、モジュール化する際に素子間接続体30と接続するために適した材料を用いることが好ましい。例えば、はんだを用いて素子と素子間接続体30を接続する場合は、銅、錫、銀等のはんだ接合性を有する金属を用いることが好ましい。 As the outermost layer of the laminated body of the linear electrodes 12, it is preferable to use a material suitable for connecting to the inter-element connector 30 when modularizing. For example, when the element and the inter-element connector 30 are connected using solder, it is preferable to use a metal having solder bonding properties such as copper, tin, and silver.
 本実施の形態1の線状電極12と集電電極14は、光キャリア生成により生じる電荷を半導体基板11から取り出すとともに集電する電極であり、各々が適当な間隔をおいて配設される。線状電極12のパターンは、ドーピングによって形成される接合であるかヘテロ接合であるか、あるいは基板抵抗等によっても異なるが、例えば0.05~1mm程度の幅で一定の方向に延在する直線形状部が、0.2~2.5mmの周期で電極の延在方向とは直交する方向に平行に配列され、平行部を構成する。集電電極14のパターンも、不純物ドーピングによって形成される接合であるかヘテロ接合であるか等、素子構造によって異なるが、例えば0.2~2mm程度の幅で一定の方向に延在する直線形状部が、0.2~2.5mmの周期で電極の延在方向とは直交する方向に平行に配列され、平行部を構成する。素子電極である線状電極12、集電電極14、電流取出し電極15の幅は同じである必要はなく、集電距離あるいは基板の少数キャリア拡散長に応じて設計される。 The linear electrode 12 and the current collecting electrode 14 of the first embodiment are electrodes that collect electric charges generated by photocarrier generation from the semiconductor substrate 11 and collect current, and are arranged at appropriate intervals. The pattern of the linear electrode 12 is a junction formed by doping, a heterojunction, or a straight line extending in a certain direction with a width of about 0.05 to 1 mm, for example. The shape portions are arranged in parallel with the direction orthogonal to the extending direction of the electrodes with a period of 0.2 to 2.5 mm to constitute a parallel portion. The pattern of the collector electrode 14 also varies depending on the element structure, such as whether it is a junction formed by impurity doping or a heterojunction, but for example, a linear shape extending in a certain direction with a width of about 0.2 to 2 mm The portions are arranged in parallel with a direction orthogonal to the extending direction of the electrodes with a period of 0.2 to 2.5 mm to constitute a parallel portion. The widths of the linear electrode 12, the current collecting electrode 14, and the current extraction electrode 15, which are element electrodes, need not be the same, and are designed according to the current collecting distance or the minority carrier diffusion length of the substrate.
 また、集電電極14は、裏面側に広く分布して設けられ、電流を電流取出し電極15まで集める機能を有する。集電電極14は、例えばアルミニウム、銀、銅、ニッケル、錫等の導電体を主成分とする材料とその混合物、合金物、及びこれらを積層したものによって構成することができる。電流取出し電極15は、一方の極性の集電電極14と接続され、集電電極14で集電した電流を受光素子10の外部に取り出す電流取出し電極として機能する。電流取出し電極15については、別工程で形成されることもあるが、集電電極14と同一工程で形成されることが多く、同様に、アルミニウム、銀、銅、ニッケル、錫を、主に含んだ金属材料及び金属材料の積層体からなることが好ましい。電流取出し電極15等の電極にはガラスフリット、樹脂等の添加剤が含まれていてもよい。上記集電電極14で集電された電流は、電流取出し電極15及び素子間接続体30を介して素子の外部に取り出される。 Further, the collecting electrodes 14 are widely distributed on the back surface side and have a function of collecting current to the current extracting electrode 15. The current collecting electrode 14 can be composed of, for example, a material mainly composed of a conductor such as aluminum, silver, copper, nickel, tin, a mixture thereof, an alloy, and a laminate thereof. The current extraction electrode 15 is connected to the current collecting electrode 14 of one polarity, and functions as a current extraction electrode that extracts the current collected by the current collecting electrode 14 to the outside of the light receiving element 10. The current extraction electrode 15 may be formed in a separate process, but is often formed in the same process as the current collecting electrode 14, and similarly contains mainly aluminum, silver, copper, nickel, and tin. It is preferably made of a metal material and a laminate of metal materials. The electrodes such as the current extraction electrode 15 may contain additives such as glass frit and resin. The current collected by the current collecting electrode 14 is taken out to the outside of the element through the current extracting electrode 15 and the inter-element connector 30.
 上記電極の電極高さは、線状電極12、集電電極14、及び電流取出し電極15の間で同じ高さであってもよいが、本実施の形態1では異なる高さとなる場合について述べる。なお、線状電極12と同一極性の電流取出し電極がある場合は電流取出し電極も線状電極と同一高さとする。線状電極12と、集電電極14及び電流取出し電極15との間で高さが異なる場合、図4(a)~図4(d)の線状電極12の電極の高さは、電流取出し電極15の本数にもよるが、10~100μm程度とすることが好ましい。集電電極14、電流取出し電極15の電極の高さは、5~50μm程度とすることが好ましい。 The electrode height of the electrodes may be the same height among the linear electrode 12, the current collecting electrode 14, and the current extraction electrode 15, but a case where the height is different in the first embodiment will be described. When there is a current extraction electrode having the same polarity as that of the linear electrode 12, the current extraction electrode has the same height as the linear electrode. When the heights of the linear electrode 12 and the current collecting electrode 14 and the current extraction electrode 15 are different, the height of the electrode of the linear electrode 12 in FIGS. 4 (a) to 4 (d) is the current extraction. Although it depends on the number of electrodes 15, it is preferably about 10 to 100 μm. The height of the collector electrode 14 and the current extraction electrode 15 is preferably about 5 to 50 μm.
 なお、ここでは、線状電極12として細い線状に形成される場合を示しているが、線状である必要はなく、複数の点状電極が離間してなる電極群であってもよい。また、本実施の形態の構造では、素子間接続体30の本体部32と線状電極12とを直に接続することができるため、第1の素子電極側については電流取出し電極を設けなくてもよい。あるいはまた、第1の素子電極側すなわち、一方の極性の線状電極12と接続される電流取出し電極を別途設けてもよい。この場合、電流取出し電極は素子間接続体30の本体部32と接続され、線状電極12で集電した電流を受光素子10の外部に取り出すように機能する。 In addition, although the case where it forms in the thin linear form as the linear electrode 12 is shown here, it does not need to be linear and may be an electrode group formed by separating a plurality of dotted electrodes. Further, in the structure of the present embodiment, since the main body portion 32 of the inter-element connector 30 and the linear electrode 12 can be directly connected, there is no need to provide a current extraction electrode on the first element electrode side. Also good. Alternatively, a current extraction electrode connected to the first element electrode side, that is, the linear electrode 12 of one polarity may be separately provided. In this case, the current extraction electrode is connected to the main body 32 of the inter-element connector 30 and functions to extract the current collected by the linear electrode 12 to the outside of the light receiving element 10.
 交差するとは、点状電極の集合体を線とみたときに、素子間接続部31が点状電極あるいは集電電極の集合体と交差するように配置されるものも含むものとする。例えば、線状の集電電極14と交差部をもつように、点状の電極の集合体が電流取出し電極15として存在し、電流取出し電極15を覆い、線状の集電電極14に接触するように素子間接続体30の素子間接続部31が形成されていてもよい。また、線状電極12も点状形状でも良く、その他にも透光性電極は平面状で透光性電極の上に形成される金属電極を点状にしてもよい。また、集電電極14は、電流取出し電極15あるいは素子間接続体31と直交していなくてもよく、ストリングが延在する方向とおおよそ平行に配置される素子間接続体30と、当該素子間接続体30まで素子上を集電する電極があるようなパターンがあればよい。また、第2の素子電極側についても特に電流取出し電極15として集電電極14と別に形成しなくてもよく、素子電極全体のパターンは、極性の異なる第1の素子電極と第2の素子電極とに分離されていればよい。 The term “intersecting” includes that in which the inter-element connection portion 31 is arranged so as to intersect the point-like electrode or the current collecting electrode when the point-like electrode group is viewed as a line. For example, a collection of point-like electrodes exists as the current extraction electrode 15 so as to have an intersection with the linear current collection electrode 14, covers the current extraction electrode 15, and contacts the linear current collection electrode 14. Thus, the inter-element connection portion 31 of the inter-element connector 30 may be formed. Moreover, the linear electrode 12 may also have a dot shape, and the light transmitting electrode may be a flat metal electrode formed on the light transmitting electrode. Further, the current collecting electrode 14 may not be orthogonal to the current extraction electrode 15 or the inter-element connection body 31, and the inter-element connection body 30 arranged approximately in parallel with the direction in which the string extends, There should be a pattern in which there is an electrode for collecting current on the device up to the connection body 30. Also, the second element electrode side does not have to be formed separately from the current collecting electrode 14 as the current extraction electrode 15, and the pattern of the entire element electrode is the first element electrode and the second element electrode having different polarities. It is sufficient that they are separated.
 また、これ以外にも素子電極は、負極と正極の間で絶縁され、電極間領域を除く全面に形成された透光性導電膜と金属電極との積層構造であってもよい。半導体素子上のアモルファスシリコン膜等のパッシベーション膜の上の非受光面側の最外層にはインジウム酸化物等の透光性電極が形成されていてもよく、一方の電極部分と他方の電極部分の間でインジウム酸化物間を電気的に分離させた構造とすることができる。それぞれの透光性導電層及び不純物ドープアモルファスシリコン膜の積層膜上に線状電極12、集電電極14、電流取出し電極15が形成される。一方で、受光面側にはパッシベーション膜としてn型アモルファスシリコン膜、また、反射防止膜としてスパッタ法、CVD法等の薄膜プロセスで成膜されるアモルファスシリコン窒化膜もしくは二酸化チタン等の高屈折率膜が積層して形成される。 In addition to this, the element electrode may have a laminated structure of a translucent conductive film and a metal electrode which are insulated between the negative electrode and the positive electrode and formed on the entire surface excluding the inter-electrode region. A translucent electrode such as indium oxide may be formed on the outermost layer on the non-light-receiving surface side on the passivation film such as an amorphous silicon film on the semiconductor element, and one electrode portion and the other electrode portion A structure in which indium oxides are electrically separated from each other can be obtained. A linear electrode 12, a collecting electrode 14, and a current extraction electrode 15 are formed on the respective laminated films of the translucent conductive layer and the impurity-doped amorphous silicon film. On the other hand, an n-type amorphous silicon film as a passivation film on the light receiving surface side, and an amorphous silicon nitride film or a high refractive index film such as titanium dioxide formed as a reflection preventing film by a thin film process such as sputtering or CVD. Are stacked.
 本実施の形態の受光素子10は、電流取出し効率を上げるためには少数キャリアの拡散長を素子電極間の距離よりも長くする必要がある。従って、素子表面は不活性化すなわちパッシベーションされていることが好ましい。素子表面が不活性化された素子構造の例として、単結晶シリコン基板上に形成されたアモルファスシリコン膜と微結晶シリコン、あるいはガリウムヒ素、アルミニウムガリウムヒ素等の半導体材料によって作成されるヘテロ接合型太陽電池、あるいはシリコン酸化膜、シリコン窒化膜、酸化アルミニウム等のパッシベーション膜でパッシベーションされた単結晶シリコン太陽電池が挙げられる。素子構造としては特に限定されるものではないが、例えばヘテロ接合を用いた受光素子の場合、半導体基板11としては、単結晶n型シリコン基板の両面に5nm程度の厚みの真性アモルファスシリコン膜が形成され、さらに真性アモルファスシリコン膜が形成された単結晶n型シリコン基板の一方の面にそれぞれp型アモルファスシリコン膜及びn型アモルファスシリコン膜が積層される。ヘテロ接合を用いた受光素子の場合、一方の極性の電極部分、例えば集電電極14、電流取出し電極15が形成される部分にp型アモルファスシリコン膜、他方の極性の電極部分である線状電極12が形成される部分にn型アモルファスシリコン膜が形成される。そして、上記電極の間には電気的に絶縁され、p層とn層との間は、真性アモルファスシリコン膜、あるいはシリコン酸化膜等の絶縁膜が形成された構造をとることができる。上記p層、n層の上には、それぞれ互いに絶縁された透光性電極が形成され、透光性電極の上にそれぞれ集電電極14、電流取出し電極15及び線状電極12が形成される。また上記受光素子10の表面に形成される半導体の接合領域は不純物の熱拡散あるいはイオンインプランテーションとよばれる不純物元素の打ち込みによって形成されていてもよい。上記半導体基板11の表面にはパッシベーション膜が形成されているが、特にパッシベーション膜に注目する場合以外は本明細書の図中では記載を省略しており、図中では半導体基板11とのみ記載している。 In the light receiving element 10 of the present embodiment, it is necessary to make the minority carrier diffusion length longer than the distance between the element electrodes in order to increase the current extraction efficiency. Therefore, it is preferable that the element surface is inactivated, that is, passivated. As an example of an element structure in which the element surface is inactivated, a heterojunction solar produced by an amorphous silicon film formed on a single crystal silicon substrate and a semiconductor material such as microcrystalline silicon, gallium arsenide, or aluminum gallium arsenide Examples thereof include a battery, or a single crystal silicon solar cell that is passivated with a passivation film such as a silicon oxide film, a silicon nitride film, or aluminum oxide. Although the element structure is not particularly limited, for example, in the case of a light receiving element using a heterojunction, as the semiconductor substrate 11, an intrinsic amorphous silicon film having a thickness of about 5 nm is formed on both surfaces of a single crystal n-type silicon substrate. Further, a p-type amorphous silicon film and an n-type amorphous silicon film are laminated on one surface of the single crystal n-type silicon substrate on which an intrinsic amorphous silicon film is formed. In the case of a light receiving element using a heterojunction, a p-type amorphous silicon film is formed on an electrode portion of one polarity, for example, a portion where the current collecting electrode 14 and the current extraction electrode 15 are formed, and a linear electrode which is an electrode portion of the other polarity An n-type amorphous silicon film is formed in a portion where 12 is formed. The electrodes can be electrically insulated, and an intrinsic amorphous silicon film or an insulating film such as a silicon oxide film can be formed between the p layer and the n layer. Translucent electrodes that are insulated from each other are formed on the p layer and the n layer, and a current collecting electrode 14, a current extraction electrode 15, and a linear electrode 12 are formed on the translucent electrode, respectively. . The semiconductor junction region formed on the surface of the light receiving element 10 may be formed by impurity element implantation called thermal diffusion of impurities or ion implantation. A passivation film is formed on the surface of the semiconductor substrate 11, but the description is omitted in the drawings of this specification except when attention is paid to the passivation film, and only the semiconductor substrate 11 is described in the drawing. ing.
 なお、本実施の形態の受光素子10は、ヘテロ接合だけでなく、ドーパントを拡散して形成されたホモ接合を用いた受光素子でもよい。例えば、半導体基板11として単結晶n型シリコンを用い、ボロンが熱拡散されることによって形成されたp型半導体領域にコンタクトする集電電極14、電流取出し電極15を正極とし、リンが熱拡散されることによって形成されたn型半導体領域にコンタクトする線状電極12が負極として動作する。このようなヘテロ接合あるいはホモ接合を有する背面接続型受光素子に本実施の形態の構成を用いることで、p型半導体領域の離間距離あるいはピッチをより細かくとることができ、ホールの拡散長が律速となるp型半導体領域までのキャリアの移動距離を小さくすることができ、素子内でのキャリア収集効率をより大きくすることができる。 In addition, the light receiving element 10 of the present embodiment may be a light receiving element using not only a heterojunction but also a homojunction formed by diffusing a dopant. For example, single crystal n-type silicon is used as the semiconductor substrate 11, and the collector electrode 14 and the current extraction electrode 15 that are in contact with a p-type semiconductor region formed by thermal diffusion of boron are used as positive electrodes, and phosphorus is thermally diffused. The linear electrode 12 in contact with the n-type semiconductor region thus formed operates as a negative electrode. By using the configuration of the present embodiment for a back-connected light receiving element having such a heterojunction or a homojunction, the separation distance or pitch of the p-type semiconductor region can be made finer, and the hole diffusion length is rate-limiting. As a result, the carrier movement distance to the p-type semiconductor region can be reduced, and the carrier collection efficiency in the device can be further increased.
 一方、p型基板を用いた場合には、電子が律速となるp型基板中のキャリアの移動距離を小さくするために、半導体基板11とpn接合を形成するn型半導体領域間の離間距離が小さくなるように構成するのが好ましい。 On the other hand, when a p-type substrate is used, the separation distance between the semiconductor substrate 11 and the n-type semiconductor region forming the pn junction is small in order to reduce the distance of carrier movement in the p-type substrate where the electrons are rate-limiting. It is preferable to make it small.
 また、本実施の形態では、素子間接続体30は、図6(a)~(c)、図7(a)~(c)及び図8に示すように、電流取出し電極15に接続される素子間接続部31と、受光素子10の裏面の全体を覆い、線状電極12に当接すると共に集電電極14に対しては接着層26を介して離間して配置される本体部32とで構成されている。本体部32は、素子間接続部31と相補形状をなしており、素子間接続部31の配される領域とその周辺及び素子基板の外周近辺を除く素子基板の裏面全体を覆っており、素子間接続体30の本体部の幅が広いため、厚みがなくても十分に抵抗を低減できるようになっている。なお本体部の幅は素子間領域にある素子間接続部よりも広い。図6(b)及び図6(c)は図6(a)のI-J断面図及びK-L断面図であるが、モジュールの状態の一部をストリングの繰り返し単位ひとつ分で取り出したもので、図6(c)では接着層26を記載している。そして本体部32と一体的に形成された素子間接続部31が可撓性を有する導電体箔で構成され、一方では、素子電極のうちの一方、例えば第1の素子電極である線状電極12及び電流取出し電極15に選択的に接続され、他方では、隣接する受光素子10の第2の素子電極である電流取出し電極15に当接している。第2の素子電極である集電電極14も一定の間隔でストライプ状すなわち離間して並列する線状に形成されており、集電電極14と交差する2本の電流取出し電極15を有しており、電流取出し電極15に沿って素子間接続部31が当接している。したがって、基板面内方向における抵抗の低い素子間接続部31まで短距離で接続されるため、第2の素子電極の集電距離を小さくすることができ、集電抵抗の低減をはかることができる。 Further, in the present embodiment, the inter-element connector 30 is connected to the current extraction electrode 15 as shown in FIGS. 6A to 6C, FIGS. 7A to 7C, and FIG. An inter-element connection portion 31 and a main body portion 32 that covers the entire back surface of the light receiving element 10, abuts against the linear electrode 12, and is separated from the current collecting electrode 14 via an adhesive layer 26. It is configured. The main body portion 32 has a complementary shape to the inter-element connection portion 31 and covers the entire back surface of the element substrate except the region where the inter-element connection portion 31 is arranged and its periphery and the vicinity of the outer periphery of the element substrate. Since the width | variety of the main-body part of the connection body 30 is wide, even if there is no thickness, resistance can fully be reduced. The width of the main body is wider than the inter-element connection portion in the inter-element region. 6 (b) and 6 (c) are the IJ cross-sectional view and the KL cross-sectional view of FIG. 6 (a), respectively, in which a part of the module is taken out by one repeating unit of the string. FIG. 6C shows the adhesive layer 26. The inter-element connection portion 31 formed integrally with the main body portion 32 is composed of a flexible conductive foil, and on the one hand, one of the element electrodes, for example, a linear electrode which is a first element electrode 12 and the current extraction electrode 15 are selectively connected to each other, and are in contact with the current extraction electrode 15 that is the second element electrode of the adjacent light receiving element 10. The current collecting electrode 14 as the second element electrode is also formed in a stripe shape at a constant interval, that is, in a linear shape spaced apart in parallel, and has two current extraction electrodes 15 intersecting the current collecting electrode 14. The inter-element connection portion 31 is in contact with the current extraction electrode 15. Therefore, since the short-distance connection is made to the inter-element connection portion 31 having a low resistance in the substrate in-plane direction, the current collection distance of the second element electrode can be reduced, and the current collection resistance can be reduced. .
 なお、図5、図7(a)~(c)では集電電極14の素子端部から2本目付近すなわち各図中上部から電流取出し電極15が接着層26の開口部から露出するように該当する領域が形成されるように図面が記載されている。しかしながら、実際には、素子上の電流取出し電極15の本数にも依るが、素子基板が156mm角の場合、素子基板端部から5~50mm程度の部分から電流取出し電極15に該当する領域が形成される。 5 and 7A to 7C, the current extraction electrode 15 is exposed from the opening of the adhesive layer 26 in the vicinity of the second electrode from the element end of the current collecting electrode 14, that is, from the upper part in each figure. The drawings are described so that regions to be formed are formed. However, in reality, depending on the number of current extraction electrodes 15 on the element, when the element substrate is 156 mm square, a region corresponding to the current extraction electrode 15 is formed from a portion of about 5 to 50 mm from the end of the element substrate. Is done.
 電流取出し電極15の長さの範囲については、主に電流取出し電極15の導体抵抗によってきまる。素子間接続体30の素子間接続部31の長さに関しては、一般的に電流取出し電極15よりもより素子間接続体30の素子間接続部31の方が低抵抗であるため、抵抗低減の観点からは素子間接続部31と電流取出し電極15との接続長さが長い方が好ましい。一方で、素子と同程度の長さである必要はない。電流取出し電極15の本数が多く、また、電極断面積が大きく、抵抗が十分に低い場合は、素子間接続部31を短くすることができる。素子間接続部31を短くした場合は、素子基板と素子間接続部31との間の熱膨張率の違いによる素子間接続体付き素子の反りを低減することができる。上記素子間接続体30の素子間接続部31と電流取出し電極15との実際の接続長さが図示に限るものではないことは本実施の形態のみならず、以降の実施の形態でも同様である。 The length range of the current extraction electrode 15 is determined mainly by the conductor resistance of the current extraction electrode 15. Regarding the length of the inter-element connection portion 31 of the inter-element connection body 30, the inter-element connection portion 31 of the inter-element connection body 30 generally has a lower resistance than the current extraction electrode 15. From the viewpoint, it is preferable that the connection length between the inter-element connection portion 31 and the current extraction electrode 15 is long. On the other hand, it does not have to be as long as the element. When the number of current extraction electrodes 15 is large, the electrode cross-sectional area is large, and the resistance is sufficiently low, the inter-element connection portion 31 can be shortened. When the inter-element connection portion 31 is shortened, the warpage of the element with the inter-element connection body due to the difference in thermal expansion coefficient between the element substrate and the inter-element connection portion 31 can be reduced. The fact that the actual connection length between the inter-element connection portion 31 of the inter-element connection body 30 and the current extraction electrode 15 is not limited to the illustration is the same in the present embodiment as well as the following embodiments. .
 また、本体部32は、素子間接続部31に対応する形状を有するスリットSを有し、素子間接続部31との間で相補的形状を有する。本体部32のスリットSに、隣接する素子間接続体30の素子間接続部31が配されるため、位置決めが容易であるだけでなく、段差が低減される。素子間接続部31の側面に絶縁性樹脂からなる接着層26をあらかじめ塗布しておくことにより、隣接する素子間接続体30の本体部32との短絡を防ぐことができる。電流取出し電極15及び、本体部32と線状電極12との接続点を除く受光素子10と素子間接続体30の本体部32との間に、図7(a)~図7(c)に示すように、絶縁性樹脂からなる接着層26が充填されている。その一方で、図4(c),図4(d)、図7(b)に示されるように、本実施の形態では素子間接続部31のモジュール裏面側には接着層26が形成されていないが、素子間接続体31を接着層26で覆うことにより封止してもよい。また、絶縁性樹脂からなる接着層26は光散乱性粒子を有していてもよい。図8は素子間接続体30を打ち抜きにより形成した場合のパターン形状の一例を示す。素子間部接続部31と本体部32とが相補状をなす。 The main body portion 32 has a slit S having a shape corresponding to the inter-element connection portion 31 and has a complementary shape with the inter-element connection portion 31. Since the inter-element connection portion 31 of the adjacent inter-element connection body 30 is disposed in the slit S of the main body portion 32, not only positioning is easy, but also a step is reduced. By applying the adhesive layer 26 made of an insulating resin to the side surface of the inter-element connection portion 31 in advance, a short circuit with the main body portion 32 of the adjacent inter-element connection body 30 can be prevented. 7A to 7C between the current extraction electrode 15 and the light receiving element 10 excluding the connection point between the main body 32 and the linear electrode 12 and the main body 32 of the inter-element connector 30. As shown, an adhesive layer 26 made of an insulating resin is filled. On the other hand, as shown in FIG. 4C, FIG. 4D, and FIG. 7B, in this embodiment, the adhesive layer 26 is formed on the module back surface side of the inter-element connection portion 31. However, the inter-element connector 31 may be sealed by covering it with the adhesive layer 26. Further, the adhesive layer 26 made of an insulating resin may have light scattering particles. FIG. 8 shows an example of a pattern shape when the inter-element connector 30 is formed by punching. The inter-element connection portion 31 and the main body portion 32 are complementary.
 従って、素子間接続体30を用いて背面接続型の受光素子10a~10fを接続してなる受光素子モジュール1においては、少なくとも受光素子10a~10f上の第1の素子電極である線状電極12は、受光素子の主面上に広く分布し、素子間接続体30の平面形状部分である本体部32に対して半導体基板11の全域にわたって接続される。 Therefore, in the light receiving element module 1 in which the back connection type light receiving elements 10a to 10f are connected using the inter-element connection body 30, at least the linear electrode 12 which is the first element electrode on the light receiving elements 10a to 10f. Are widely distributed on the main surface of the light receiving element and are connected to the main body portion 32 which is a planar shape portion of the inter-element connector 30 over the entire area of the semiconductor substrate 11.
 本実施の形態の素子間接続体30、受光素子10及び受光素子モジュール1によれば、素子間接続部31が、素子電極のうちの一方例えば第2の素子電極である集電電極14に交差して設けられた第2の極性の素子電極の電流取出し電極15に沿って選択的に接続されている。従って、特許文献1のような電流取出し電極部分が素子基板の端部にしかない場合に比べて、半導体基板11と接続される素子電極である第2の素子電極から素子間接続体30の素子間接続部31までの接続距離が短い上、受光素子10a~10fと同じあるいは同程度の面積の導電体を用いることができるために抵抗ロスが小さい。また素子上に箔と同程度の抵抗となる導電体を形成する場合は、コストと時間がかかり、電極断面積を大きくして抵抗を小さくすることが難しい線状電極12及び集電電極14の集電距離を減らすことができる点で特に利点がある。また、受光素子10a~10fを透過した透過光を反射させて、受光素子1に再入射させることができ、光透過ロスを低減でき、設置面積に対する発電出力の高い受光素子モジュール1を得ることができる。 According to the inter-element connector 30, the light receiving element 10, and the light receiving element module 1 of the present embodiment, the inter-element connecting portion 31 intersects one of the element electrodes, for example, the current collecting electrode 14 that is the second element electrode. Are connected selectively along the current extraction electrode 15 of the second polarity element electrode. Therefore, as compared with the case where the current extraction electrode portion is only at the end portion of the element substrate as in Patent Document 1, the second element electrode that is the element electrode connected to the semiconductor substrate 11 is connected to the element connection element 30. Since the connection distance to the connection portion 31 is short and a conductor having the same or similar area as the light receiving elements 10a to 10f can be used, resistance loss is small. Further, when a conductor having a resistance equivalent to that of a foil is formed on the element, it takes cost and time, and it is difficult to increase the cross-sectional area of the electrode to reduce the resistance. This is particularly advantageous in that the current collection distance can be reduced. In addition, the transmitted light that has passed through the light receiving elements 10a to 10f can be reflected and re-entered to the light receiving element 1, so that the light transmission loss can be reduced and the light receiving element module 1 having a high power generation output with respect to the installation area can be obtained. it can.
 本実施の形態では、素子間接続体30は、金属製の導電板すなわち、連続体で構成され、素子間を接続する素子間接続部31と、受光素子10と同じあるいは同程度の大きさでかつ同等の形状の受光素子10の裏面側に接続される平面状の導電体部分である本体部32とから構成されている。素子間接続体30は、たとえば銅箔を打ち抜き加工することによって極めて容易に製造することができる。本実施の形態の素子間接続体30は、単なる金属を切りぬいた基材から形成されているため、例えば特許文献3のような正極と負極が互いに絶縁されて樹脂シート内に挟み込まれた素子間接続体に比べて安価に製造可能である。基体としては銅あるいはアルミニウム等の低抵抗の導電板を用いるのが好ましく、基材上にはんだめっき等の導電性接着層を形成して使用する。ここでは可撓性を有する素子間接続体30の本体部32及び素子間接続体30の素子間接続部31として銅箔を用いているが、本実施の形態1においては一体構造の連続的な金属箔でなくてもよい。例えばポリイミドフィルム上に蒸着された金属膜であったり、金属粒子含有樹脂、印刷ペーストを乾燥することによって形成される金属微粒子群、金属焼結体等が接続されてなる膜あるいは箔等の導電体を本体部32及び素子間接続部31として用いることができる。 In the present embodiment, the inter-element connection body 30 is formed of a metal conductive plate, that is, a continuous body, and has the same or similar size as the inter-element connection portion 31 that connects the elements and the light receiving element 10. And it is comprised from the main-body part 32 which is a planar conductor part connected to the back surface side of the light receiving element 10 of an equivalent shape. The inter-element connection body 30 can be manufactured very easily, for example, by punching a copper foil. Since the inter-element connector 30 of the present embodiment is formed from a base material obtained by simply cutting a metal, for example, an element in which a positive electrode and a negative electrode are insulated from each other and sandwiched between resin sheets as in Patent Document 3 It can be manufactured at a lower cost than an inter-connection body. A low resistance conductive plate such as copper or aluminum is preferably used as the substrate, and a conductive adhesive layer such as solder plating is formed on the substrate. Here, copper foil is used as the body portion 32 of the inter-element connection body 30 having flexibility and the inter-element connection section 31 of the inter-element connection body 30, but in the first embodiment, the integrated structure is continuous. It may not be a metal foil. For example, a metal film deposited on a polyimide film, a metal particle-containing resin, a metal particle group formed by drying a printing paste, a film to which a metal sintered body is connected, or a conductor such as a foil Can be used as the main body portion 32 and the inter-element connection portion 31.
 また、素子間接続部31と本体部32とを別の部品から構成してもよい。素子間接続部31と本体部32とを別体構造とした場合、素子間接続部31と本体部32とが電気接続体21もしくは別の材料からなる第2の電気接続体を経由して接続される。素子間接続体30を、光反射のための本体部32と、素子間接続部31との個別構造として形成した場合は、製造が容易で、かつモジュールのストリング端部においてもストリング内部と同じ素子間接続体を使用することができるという利点を有する。また、素子間接続体30を、光反射のための本体部32と、素子間接続部31との個別構造として形成すれば、異なる材料を用いることができ、素子間接続体付き素子の強度と導電性と接続性と光利用効率を高めることができる。 Further, the inter-element connection portion 31 and the main body portion 32 may be configured from different parts. When the inter-element connection portion 31 and the main body portion 32 are formed as separate structures, the inter-element connection portion 31 and the main body portion 32 are connected via the electric connection body 21 or the second electric connection body made of another material. Is done. In the case where the inter-element connection body 30 is formed as a separate structure of the main body part 32 for light reflection and the inter-element connection part 31, it is easy to manufacture, and the same element as the inside of the string at the string end of the module It has the advantage that an inter-connector can be used. Further, if the inter-element connection body 30 is formed as a separate structure of the main body portion 32 for light reflection and the inter-element connection section 31, different materials can be used, and the strength of the element with the inter-element connection body can be increased. Conductivity, connectivity, and light utilization efficiency can be improved.
 また、必要に応じて受光素子の第1の素子電極は第2の素子電極よりも素子間接続体側に突出させる高さを調整することができるため、第1及び第2の素子電極の高低差によって素子電極と素子間接続体30の本体部32との接続部と、素子間接続部31との絶縁部を分離することができ、素子間接続体30を素子に接続する際の基板面内方向の数百マイクロメートル程度単位の精密な位置合わせが不要であるという利点を有する。 Moreover, since the height by which the first element electrode of the light receiving element protrudes toward the inter-element connection body than the second element electrode can be adjusted as necessary, the height difference between the first and second element electrodes can be adjusted. Thus, the connection portion between the element electrode and the main body portion 32 of the inter-element connection body 30 and the insulating portion between the inter-element connection section 31 can be separated, and in the substrate plane when the inter-element connection body 30 is connected to the element This has the advantage that precise alignment in the direction of several hundreds of micrometers is unnecessary.
 素子間接続体30の本体部32は、導電体箔、例えば銅箔の平板で構成してもよいが、平板をあらかじめプレスして、凹凸形状に成型して用いるようにしてもよい。本体部32を凹凸形状とする場合、一方の線状電極12とおおよそ対応する部分の本体部32に対して、他方の集電電極14及び電流取出し電極15の部分における素子間接続体30の本体部32は引っ込んだ形状つまり凹部となり、線状電極12に対応する部分においては相対的に突出した形状つまり凸部となる。ここで、素子間接続体30側の凸部とは、素子基板に対して突出していることを意味し、凹部とは、素子基板に対してより離間していることを意味する。凸部と凹部はそれぞれ線状電極12と集電電極14の位置にかならずしも対応して形成されてなくても良く、凹凸の間隔を素子電極ピッチよりも狭く形成しておけば、突出した線状電極12に対して本体部32の凸部が接続される構造とすることができ、これによって精密な位置あわせが不要となる。 The main body portion 32 of the inter-element connection body 30 may be formed of a conductive foil, for example, a copper foil flat plate, or may be used by pressing the flat plate in advance to form a concavo-convex shape. When the main body portion 32 has an uneven shape, the main body 32 of the interelement connection body 30 in the portion of the other collector electrode 14 and current extraction electrode 15 with respect to the main body portion 32 of the portion roughly corresponding to the one linear electrode 12. The portion 32 becomes a recessed shape, that is, a concave portion, and the portion corresponding to the linear electrode 12 becomes a relatively protruding shape, that is, a convex portion. Here, the convex part on the inter-element connector 30 side means protruding from the element substrate, and the concave part means being further away from the element substrate. The convex part and the concave part do not necessarily have to be formed corresponding to the positions of the linear electrode 12 and the collecting electrode 14, respectively, and if the concave and convex interval is formed narrower than the element electrode pitch, the protruding linear shape It can be set as the structure where the convex part of the main-body part 32 is connected with respect to the electrode 12, This eliminates the need for precise alignment.
 また、素子間接続体30の本体部32の大きさとしては、図4(a)の素子上の線状電極12の外周部までを覆うことができる程度の大きさとすることにより、素子間接続体30の本体部32の端部が固定されることになり、接合性を高めることができる。従って、図4(a)では線状電極12が集電電極14よりも外側に来る電極パターンとなっている。線状電極12は、図4(a)のパターンに加えてさらに素子基板外周のすぐ内側を囲うように形成されていてもよい。 Further, the size of the main body portion 32 of the inter-element connector 30 is such that it can cover the outer peripheral portion of the linear electrode 12 on the element of FIG. The end portion of the body portion 32 of the body 30 is fixed, and the bondability can be improved. Therefore, in FIG. 4A, the linear electrode 12 has an electrode pattern that comes outside the collecting electrode 14. In addition to the pattern of FIG. 4A, the linear electrode 12 may be formed so as to further surround the inner side of the outer periphery of the element substrate.
(素子間接続体と素子電極との間の接続方法)
 そして素子間接続体30と素子電極との間の接続に際して、受光素子10は、同一面に第1の素子電極である線状電極12及び第2の素子電極である集電電極14、すなわち負極と正極を有するため、電極間を絶縁する必要がある。電極間の絶縁のためには本体部32と集電電極14の間の絶縁層としては空隙を用いる等してもよいが、より信頼性を向上させるために図4(a)~図4(d)に示すように、受光素子の電流取出し電極15の一部のみを除き、主に集電電極14を覆い、線状電極12の大部分は外部に露出するように接着層26を形成する。なお、接着層26は線状電極12の上に一部重なってもよい。例えば、本体部32が凹凸を有する場合、線状電極12との接続部にある本体部32上の凹部及び一部であれば凸部と線状電極12との間に形成されてもよい。接着層26の形成に際しては、本体部32と半導体基板11との間の予定されるギャップよりも厚く接着層26を形成しておき、接着層26形成後に本体部32を半導体基板11に押しつけて接着層26を横方向に広げる方法を用いることができる。上記方法を用いる場合、接着層26の幅は集電電極14の線幅より細く形成され、本体部32が接続される際に広がり、図4(c)のような形状になる。
(Connection method between element connection body and element electrode)
In connection between the inter-element connection body 30 and the element electrode, the light receiving element 10 has the linear electrode 12 as the first element electrode and the collector electrode 14 as the second element electrode on the same surface, that is, the negative electrode Therefore, it is necessary to insulate between the electrodes. For insulation between the electrodes, a gap may be used as an insulating layer between the main body 32 and the collecting electrode 14, but in order to improve the reliability, FIG. 4 (a) to FIG. As shown in d), an adhesive layer 26 is formed so as to mainly cover the current collecting electrode 14 except for only a part of the current extraction electrode 15 of the light receiving element and to expose most of the linear electrode 12 to the outside. . The adhesive layer 26 may partially overlap the linear electrode 12. For example, when the main body portion 32 has irregularities, it may be formed between the convex portion and the linear electrode 12 as long as it is a concave portion and part of the main body portion 32 in the connection portion with the linear electrode 12. When forming the adhesive layer 26, the adhesive layer 26 is formed thicker than a predetermined gap between the main body 32 and the semiconductor substrate 11, and the main body 32 is pressed against the semiconductor substrate 11 after the adhesive layer 26 is formed. A method of spreading the adhesive layer 26 in the lateral direction can be used. When the above method is used, the width of the adhesive layer 26 is formed to be narrower than the line width of the current collecting electrode 14, spreads when the main body 32 is connected, and has a shape as shown in FIG.
 以上のように、受光素子10と素子間接続体30との間に高い接着強度を付与するとともに集電電極14と素子間接続体30の本体部32の間を絶縁するために、素子間接続体30と受光素子10との間のはんだ付けされている部分以外の主な部分は接着層26によって接着される。具体的にはエチレンビニルアセテート(EVA)、フィラーを含むエポキシ、ポリイミド等の樹脂を用いることができるが、素子を透過した光を素子間接続体で反射させて再度素子へ入射させるために、できる限り素子透過光の吸収がないものを用いることが好ましい。また、上記目的のために接着層26は光反射あるいは光散乱機能を有していてもよい。接着層26としては、数百nm程度の二酸化チタン粒子等の無機粒子を高濃度に含むエチレンビニルアセテートを用いることができる。ここで用いられる無機粒子のサイズは、受光素子10と素子間接続体30を接続した後の集電電極14と素子間接続体30との間の距離の半分程度より小さい方が好ましく、光散乱性を付与するためには、散乱したい光の波長の半分程度の大きさの粒径とすることが好ましい。 As described above, in order to provide a high adhesive strength between the light receiving element 10 and the inter-element connector 30 and to insulate between the collector electrode 14 and the main body 32 of the inter-element connector 30, the inter-element connection Main portions other than the soldered portion between the body 30 and the light receiving element 10 are bonded by the adhesive layer 26. Specifically, resin such as ethylene vinyl acetate (EVA), epoxy containing filler, polyimide, or the like can be used. However, it is possible to reflect the light transmitted through the element by the inter-element connector and to enter the element again. It is preferable to use one that does not absorb the element transmitted light. For the above purpose, the adhesive layer 26 may have a light reflection or light scattering function. As the adhesive layer 26, ethylene vinyl acetate containing a high concentration of inorganic particles such as titanium dioxide particles of about several hundred nm can be used. The size of the inorganic particles used here is preferably smaller than about half of the distance between the current collecting electrode 14 and the inter-element connection body 30 after the light receiving element 10 and the inter-element connection body 30 are connected. In order to impart the property, it is preferable to set the particle size to be about half the wavelength of the light to be scattered.
 ここでは、接着層26が素子間接続体30と受光素子10との間を接続する例を記載したが、接着層26は素子間接続体30と受光素子10との間を隙間無く接着しなければならないわけではなく、例えば、絶縁性を高めるために接着層26が素子電極を覆っている一方で素子間接続体の本体部32とは接触していなくても良く、逆に素間接続体30の本体部32を覆っている一方で素子電極とは接触していなくてもよい。 Here, an example in which the adhesive layer 26 connects the inter-element connection body 30 and the light receiving element 10 is described, but the adhesive layer 26 must adhere between the inter-element connection body 30 and the light receiving element 10 without any gap. For example, in order to enhance insulation, the adhesive layer 26 may cover the element electrode, but may not be in contact with the main body 32 of the inter-element connection body. The main body part 32 of 30 may be covered but may not be in contact with the element electrode.
 接着層26の形成方法としては、あらかじめ受光素子10の裏面側に、線状電極12を除く部分に、エポキシ樹脂前駆体を塗布しておき、素子間接続体30の本体部32と貼り合わせながら加熱、冷却する。そして、はんだを一度溶融して素子間接続体30の本体部32と受光素子上の線状電極12とを電気的に接続すると共に接着層26としてのエポキシ樹脂を重合、硬化させることにより、素子間接続体30の本体部32と受光素子10aとを接着することができる。上記エポキシ樹脂を重合、硬化させることにより本体部32と受光素子10aとを接着する場合、接着層26の前駆体の重合温度あるいは絶縁性樹脂の軟化点が、電気接続体21の融点と同じあるいは同程度あるいは、より高い方が好ましい。電気接続体21の融点が接着層26を構成する絶縁性樹脂の軟化点よりも高いものとするためには、電気接続体21として比較的低温で溶融するビスマス系のはんだ等のはんだを用い、接着層26としてポリイミド、ガラス繊維等の強化剤で強化された樹脂等の絶縁性樹脂を用いることが好ましい。また、上記プロセスにおいては、エポキシ樹脂前駆体としては粘度があり、流動性が低いものが好ましい。また、例えば特許文献10に記載されているように、2回に分けて接着層を硬化させる、等の方法も適用可能である。 As a method for forming the adhesive layer 26, an epoxy resin precursor is applied in advance to the back surface side of the light receiving element 10, except for the linear electrode 12, and bonded to the main body portion 32 of the interelement connection body 30. Heat and cool. Then, by melting the solder once to electrically connect the main body portion 32 of the inter-element connector 30 and the linear electrode 12 on the light receiving element, the epoxy resin as the adhesive layer 26 is polymerized and cured, whereby the element The main body portion 32 of the inter-connection body 30 and the light receiving element 10a can be bonded. When the main body 32 and the light receiving element 10a are bonded by polymerizing and curing the epoxy resin, the polymerization temperature of the precursor of the adhesive layer 26 or the softening point of the insulating resin is the same as the melting point of the electrical connector 21 or The same or higher is preferable. In order to make the melting point of the electrical connection body 21 higher than the softening point of the insulating resin constituting the adhesive layer 26, a solder such as a bismuth solder that melts at a relatively low temperature is used as the electrical connection body 21. As the adhesive layer 26, an insulating resin such as a resin reinforced with a reinforcing agent such as polyimide or glass fiber is preferably used. Moreover, in the said process, a thing with a viscosity and low fluidity is preferable as an epoxy resin precursor. Further, as described in Patent Document 10, for example, a method of curing the adhesive layer in two steps is also applicable.
 また上記方法以外においても、例えば、電気接続体21を有しない素子間接続体30の本体部32と、線状電極12上にはんだ層が形成された受光素子10の裏面側を貼り合わせながら加熱後、冷却することにより、素子間接続体30の本体部32と受光素子10aとを接着することができる。接着に際してはまず、はんだを一度溶融して素子間接続体30の本体部32と素子上の線状電極12とを電気的に接続する。そして、貼り合わされた素子間接続体30の本体部32と素子裏面の間に毛細管現象を利用してエポキシ樹脂前駆体を供給したのちに再度加熱してエポキシモノマーを重合、硬化させる。はんだによる貼り合わせ後にエポキシ樹脂前駆体を供給し再度加熱して重合させる場合、電気接続体21の融点が、接着層26の重合温度あるいは軟化点と同程度あるいは、より高い方が好ましい。また、上記の場合のエポキシ前駆体としては粘度が低く、流動性が高いものが好ましい。また、接着層26は、素子間接続体30を接続するまえにあらかじめ硬化させておいても良く、上記の場合、接着層26は素子基板及び素子電極のうち集電電極14と接着される一方で、線状電極12と素子間接続体30の本体部32とは接着されない状態となる。上記接続の際に用いる熱源には、ホットプレート等の接触熱源、エアヒーター、レーザー、赤外線ランプ等の非接触熱源を用いることが出来る。 In addition to the above method, for example, heating is performed while bonding the main body portion 32 of the inter-element connection body 30 that does not have the electrical connection body 21 and the back surface side of the light receiving element 10 on which the solder layer is formed on the linear electrode 12. Thereafter, the body portion 32 of the inter-element connector 30 and the light receiving element 10a can be bonded by cooling. When bonding, first, the solder is once melted to electrically connect the main body portion 32 of the inter-element connector 30 and the linear electrode 12 on the element. And after supplying an epoxy resin precursor between the main-body part 32 and the element back surface of the interelement connection body 30 bonded together using a capillary phenomenon, it heats again, and an epoxy monomer is superposed | polymerized and hardened. In the case where the epoxy resin precursor is supplied after being bonded by soldering and heated to be polymerized again, it is preferable that the melting point of the electrical connection body 21 is equal to or higher than the polymerization temperature or softening point of the adhesive layer 26. Moreover, as an epoxy precursor in said case, a thing with a low viscosity and high fluidity | liquidity is preferable. Further, the adhesive layer 26 may be cured in advance before connecting the inter-element connector 30. In the above case, the adhesive layer 26 is bonded to the current collecting electrode 14 out of the element substrate and the element electrode. Thus, the linear electrode 12 and the main body 32 of the inter-element connector 30 are not bonded. As the heat source used for the connection, a contact heat source such as a hot plate, a non-contact heat source such as an air heater, a laser, or an infrared lamp can be used.
 接着層26を上記構造にすることによって線状電極12と素子間接続体30の本体部32の電気的接続を妨げない一方で、集電電極14と素子間接続体30の本体部32との間の絶縁を保つことができる。 By making the adhesive layer 26 have the above-described structure, the electrical connection between the linear electrode 12 and the body portion 32 of the inter-element connector 30 is not disturbed, while the current collecting electrode 14 and the body portion 32 of the inter-element connector 30 are Can keep the insulation between.
 上述した集電電極14と素子間接続体30の本体部32との間の絶縁を保つ際に、接着層26として主に集電電極14を覆い、線状電極12と電流取出し電極15の大部分を覆わない形状の樹脂フィルムを材料として用いることもできる。あるいは、あらかじめ素子間接続体30の本体部32に集電電極14と同等の形状の樹脂を塗布及び乾燥しておき、樹脂塗布領域以外の部分にはんだペーストを塗布しておいて、はんだペーストを裏面の線状電極12と素子間接続体30との電気接続体21としてもよい。裏面の線状電極12と素子間接続体30との間の電気接続体21と、電流引き出し線38と素子間接続体30との間の電気接続体とで異なる材料を用いる場合、線状電極12と素子間接続体30との接続工程以降、電流引き出し線38を素子間接続体30の本体部32に接続する工程等の後続工程に用いる電気接続体33の融点は、線状電極12と素子間接続体30との接続工程で用いられた上記電気接続体21の融点に対して、より低い方が電気接続体21の再溶融に伴う位置ずれを生じずにすむため好ましい。 When maintaining the insulation between the current collecting electrode 14 and the main body portion 32 of the inter-element connector 30, the current collecting electrode 14 is mainly covered as the adhesive layer 26, and the linear electrode 12 and the current extraction electrode 15 are large. A resin film having a shape that does not cover the portion can also be used as a material. Alternatively, a resin having a shape equivalent to that of the current collecting electrode 14 is applied and dried on the main body 32 of the inter-element connector 30 in advance, and a solder paste is applied to a portion other than the resin application region. It is good also as the electrical connection body 21 of the linear electrode 12 and the inter-element connection body 30 on the back surface. When different materials are used for the electrical connection body 21 between the linear electrode 12 on the back surface and the inter-element connection body 30 and the electrical connection body between the current lead line 38 and the inter-element connection body 30, the linear electrode 12 and the inter-element connection body 30 and subsequent steps, the melting point of the electrical connection body 33 used in subsequent processes such as the process of connecting the current lead line 38 to the main body 32 of the inter-element connection body 30 is the same as that of the linear electrode 12. A lower one than the melting point of the electrical connection body 21 used in the connection step with the inter-element connection body 30 is preferable because it does not cause a positional shift accompanying remelting of the electrical connection body 21.
 また、異なる溶融点を有する複数の電気接続体を用いて、例えば隣接する素子の素子間接続部31と本体部32とを別の部材から形成する場合には、素子間接続体32と線状電極12との接続には溶融温度が高い電気接続体を用いて接続しておき、接続後にストリングを形成する際に素子間接続体30の素子間接続部31と電流取出し電極15及び、隣接する素子の素子間接続体30の素子間接続部31と本体部32との接続には溶融温度のより低い電気接続体を用いることにより位置ずれ等を生じずにすむため好ましい。電気接続体の部位による溶融温度の高低の組み合わせは製造の順番に従って上記とは逆にしてもよい。また、一方で接着層26を電気接続体よりも先に接着する場合は、接着層26の流動温度あるいは溶融温度は電気接続体21の融点より高くするのが好ましい。接着層26の流動温度あるいは溶融温度を電気接続体21の融点より高くすることにより、接着工程で、接着層26を溶融温度以下に保つことで、流動、再溶融等が生じるのを防ぐことができる。 In addition, when a plurality of electrical connection bodies having different melting points are used, for example, when the inter-element connection portion 31 and the main body portion 32 of adjacent elements are formed from different members, the inter-element connection body 32 and the linear connection body are formed. The connection with the electrode 12 is performed using an electrical connection body having a high melting temperature, and when the string is formed after the connection, the inter-element connection portion 31 of the inter-element connection body 30, the current extraction electrode 15, and the adjacent one. For the connection between the inter-element connection portion 31 of the inter-element connection body 30 of the element and the main body portion 32, it is preferable to use an electric connection body having a lower melting temperature so as not to cause misalignment. The combination of high and low melting temperatures depending on the location of the electrical connector may be reversed from the above according to the order of manufacture. On the other hand, when the adhesive layer 26 is bonded prior to the electrical connection body, the flow temperature or melting temperature of the adhesive layer 26 is preferably higher than the melting point of the electrical connection body 21. By making the flow temperature or melting temperature of the adhesive layer 26 higher than the melting point of the electrical connector 21, it is possible to prevent the flow, remelting, etc. from occurring by keeping the adhesive layer 26 below the melting temperature in the bonding step. it can.
 また、電気接続体21としては、具体的には錫銀系はんだ、導電性接着剤、導電性テープを用いることができる。電気接続体21は、本実施の形態1では素子間接続体30の片面のおおよそ全面に形成されている(図4(b)~4(d))が、素子間接続体自体を錫箔のような低融点金属として電気接続体との役割を兼ねてもよい。素子間接続体30の素子側の全面、あるいは両面の全面を覆う場合、電気接続体21は、光の反射率がなるべく高い材料であることが好ましい。素子間接続体30の反射率が電気接続体21の反射率よりも高い場合は、電気接続体21は素子電極と素子間接続体30とが各電極間が接続される部分にだけ形成されることが好ましい。各電極間が接続される部分とは主に素子間接続体30と電流取出し電極15及び線状電極12との重ね合わせ部分を意味する。 Moreover, as the electrical connection body 21, specifically, a silver-silver solder, a conductive adhesive, and a conductive tape can be used. In the first embodiment, the electrical connection body 21 is formed on almost the entire surface of one side of the inter-element connection body 30 (FIGS. 4 (b) to 4 (d)), but the inter-element connection body itself is like a tin foil. As a low melting point metal, it may also serve as an electrical connector. When covering the entire surface on the element side of the inter-element connector 30 or the entire surface of both surfaces, the electrical connector 21 is preferably made of a material having as high a light reflectance as possible. When the reflectance of the inter-element connection body 30 is higher than the reflectance of the electrical connection body 21, the electrical connection body 21 is formed only at a portion where the element electrode and the inter-element connection body 30 are connected between the electrodes. It is preferable. The portion where the electrodes are connected mainly refers to the overlapping portion of the inter-element connector 30, the current extraction electrode 15 and the linear electrode 12.
 以上のようにして、受光素子裏面の素子電極には図6(a)~図6(c)に示す素子間接続体30の本体部32及び素子間接続部31が接続され、図7(c)に示す裏面を有する素子間接続体付き受光素子となる。図2に示したように、本体部32のスリットSから、線状電極12の端部が見えているはずであるが、図7(c)では、省略している。また、図7(c)では、本体部32を透視した素子間接続体付きの素子の状態で描かれており、素子間接続体30の本体部32は点線で本体部32の配置される領域が示されている。本実施の形態のようなスリットSを有する構造では、線状電極12、電流取出し電極15が本体部32の金属あるいは接着層26からなる樹脂で覆われている方が外部から素子電極形成部への水分の浸入が少なくなり、信頼性及び耐久性が向上するため好ましい。変形例として、図2に示した例と異なり、素子電極である線状電極12、電流取出し電極15が本体部32及び接着層26に隠れて受光素子10の表面にでていない状態になるようにしてもよい。なお、図7(c)では点線で素子間接続体30の本体部32の位置を記載し、素子間接続体30の本体部32自体は透過させて素子の裏面側の構造を記載している。 As described above, the main body portion 32 and the inter-element connection portion 31 of the inter-element connector 30 shown in FIGS. 6A to 6C are connected to the element electrode on the back surface of the light-receiving element. The light receiving element with an inter-element connection body having the back surface shown in FIG. As shown in FIG. 2, the end portion of the linear electrode 12 should be visible from the slit S of the main body portion 32, but is omitted in FIG. 7C. Further, in FIG. 7C, the element part with the inter-element connection body seen through the main body part 32 is drawn, and the main body part 32 of the inter-element connection body 30 is a region where the main body part 32 is arranged by a dotted line. It is shown. In the structure having the slits S as in the present embodiment, the element electrode forming portion is externally covered when the linear electrode 12 and the current extraction electrode 15 are covered with the metal of the main body portion 32 or the resin made of the adhesive layer 26. This is preferable because the intrusion of moisture is reduced and the reliability and durability are improved. As a modification, unlike the example shown in FIG. 2, the linear electrode 12 and the current extraction electrode 15 which are element electrodes are hidden by the main body 32 and the adhesive layer 26 and are not exposed on the surface of the light receiving element 10. It may be. In FIG. 7C, the position of the main body portion 32 of the inter-element connection body 30 is indicated by a dotted line, and the main body portion 32 itself of the inter-element connection body 30 is transmitted to describe the structure on the back side of the element. .
 なお、本実施の形態1では素子間接続体30は、例えば銅箔を打ち抜き加工することによって製造することができる。本体部32と、素子間接続部31とは一体的に構成されていなければならないわけではなく、素子間接続部31と、本体部32とは別の部材で形成し、はんだあるいは導電性接着剤等によりあとで接続してもよい。例えばポリイミドフィルム上に蒸着された金属膜、金属粒子含有樹脂、印刷ペーストを乾燥することによって形成される金属微粒子群あるいは金属焼結体が素子電極と同じパターン形状に接続されてなる膜あるいは箔等の導電体を用いて素子間接続体30を一体的に形成する。あるいは素子間接続部31と、本体部32とをそれぞれ同様に形成し、はんだあるいは導電性接着剤によりあとで接続してもよい。 In the first embodiment, the inter-element connection body 30 can be manufactured, for example, by punching a copper foil. The main body portion 32 and the inter-element connection portion 31 do not have to be integrally formed. The inter-element connection portion 31 and the main body portion 32 are formed of different members, and solder or conductive adhesive It may be connected later by, for example. For example, a metal film deposited on a polyimide film, a resin containing metal particles, a metal fine particle group formed by drying a printing paste, or a film or foil in which a metal sintered body is connected in the same pattern shape as the element electrode The inter-element connection body 30 is integrally formed using the conductor. Alternatively, the inter-element connection portion 31 and the main body portion 32 may be formed in the same manner and connected later with solder or a conductive adhesive.
 素子間接続体30の厚さとして、例えば0.01~1mmとすることができる。なお、打ち抜き加工により、素子間接続体30を一体成型した後、素子間接続部31あるいは本体部32をパンチ加工、圧延加工により薄肉化してもよい。 The thickness of the inter-element connection body 30 can be set to 0.01 to 1 mm, for example. In addition, after the inter-element connection body 30 is integrally formed by punching, the inter-element connection portion 31 or the main body portion 32 may be thinned by punching or rolling.
 また、図6(a)、図6(b)、図6(c)に示した、素子間接続体30の本体部32の凹凸部については記載を省略しているが、実際には本実施の形態1において素子間接続体30の本体部32が凹凸部あるいは、貫通孔、スリットS以外の切り抜き部を有するものを用いてもよい。素子間接続体30の本体部32が、貫通孔、スリットあるいはそれ以外の切り抜き部を有する場合、電気接続体21の溶融温度よりも低い温度で接着層26を流動状態にして供給することにより、素子間接続体30の本体部32に形自体成された貫通孔、スリットあるいは切り抜き部から接着層26が素子間接続体30の本体部32との間に侵入するため、封入し易いという利点がある。 In addition, although the description of the concavo-convex portion of the main body portion 32 of the inter-element connector 30 shown in FIGS. 6A, 6B, and 6C is omitted, in practice this embodiment In the first embodiment, the main body portion 32 of the inter-element connector 30 may have an uneven portion or a cutout portion other than the through hole and the slit S. When the main body portion 32 of the inter-element connection body 30 has a through hole, a slit, or other cutout portion, by supplying the adhesive layer 26 in a fluid state at a temperature lower than the melting temperature of the electrical connection body 21, Since the adhesive layer 26 enters between the body portion 32 of the inter-element connector 30 through the through hole, slit, or cutout formed in the body portion 32 of the inter-element connector 30, there is an advantage that it is easy to encapsulate. is there.
 また、素子間接続体30の本体部32が凹凸部を有する場合、後述する図20及び図21に示すように、素子間接続体30のすべての凸部が線状電極12と接続されている必要はなく、少なくとも素子上のひとつながりの線状電極12に対して一箇所の凸部が接していればよいため、見る断面によっては全ての本体部32の凸部が線状電極12と素子間接続体30と接続されていなくてもよい。図20は素子電極に選択めっきによるはんだめっき層からなる電気接続体21を形成したものを示す。はんだめっき層は、電解めっきを用いて、表面に露呈する素子電極表面にのみ選択的に形成される。図21は素子間接続体30の本体部32の全面にはんだめっき層からなる電気接続体21を形成したものを示す。 Moreover, when the main-body part 32 of the connection body 30 between elements has an uneven | corrugated | grooved part, as shown in FIG.20 and FIG.21 mentioned later, all the convex parts of the connection body 30 between elements are connected with the linear electrode 12. FIG. It is not necessary, and it is sufficient that at least one convex part is in contact with the linear electrode 12 connected to the element. Therefore, depending on the cross section to be seen, the convex parts of all the main body parts 32 may be connected to the linear electrode 12 and the element. It may not be connected to the inter-connection body 30. FIG. 20 shows an element electrode in which an electrical connection body 21 made of a solder plating layer by selective plating is formed. The solder plating layer is selectively formed only on the surface of the device electrode exposed on the surface by electrolytic plating. FIG. 21 shows a structure in which an electrical connection body 21 made of a solder plating layer is formed on the entire surface of the main body portion 32 of the inter-element connection body 30.
 実施の形態1の受光素子モジュール1の製造は、背面側に第1及び第2の素子電極を有する受光素子10を形成し、素子間接続体30を、第1の素子電極に選択的に直接接続されるとともに、第2の素子電極には絶縁性の接着層を介して配置されるように、絶縁層を介して装着することで実施される。図1及び図2、図7(c)に示すように、受光素子10を構成する半導体基板11の裏面側には、第1の素子電極である線状電極12と、第2の素子電極である集電電極14及び電流取出し電極15とが形成されている。素子間接続体30の素子間接続部31は、受光素子10の裏面に形成された電流取出し電極15と電気接続体21を介して接続され、本体部32は上記受光素子10とは別の受光素子10の裏面側に形成された線状電極12に接続されることによって、隣接する2つの受光素子10間の電気的接続を達成し、素子ストリングが形成される。 In the manufacture of the light-receiving element module 1 according to the first embodiment, the light-receiving element 10 having the first and second element electrodes is formed on the back side, and the inter-element connection body 30 is selectively and directly connected to the first element electrode. In addition to being connected, the second element electrode is mounted via an insulating layer so as to be disposed via an insulating adhesive layer. As shown in FIGS. 1, 2, and 7 (c), a linear electrode 12 that is a first element electrode and a second element electrode are provided on the back side of the semiconductor substrate 11 that constitutes the light receiving element 10. A current collecting electrode 14 and a current extraction electrode 15 are formed. The inter-element connection portion 31 of the inter-element connection body 30 is connected to the current extraction electrode 15 formed on the back surface of the light receiving element 10 via the electric connection body 21, and the main body portion 32 is different from the light receiving element 10. By being connected to the linear electrode 12 formed on the back surface side of the element 10, electrical connection between two adjacent light receiving elements 10 is achieved, and an element string is formed.
 素子間接続体30を用いて受光素子10間を接続していくことによって、図1及び図2に示すように、受光素子10a,10b,10cが直線状に繋がったストリングが形成される。受光素子10a,10b,10cによって形成される直線状のストリングと、受光素子10d,10e,10fによって形成される直線状のストリングとを、はんだあるいは導電性接着剤によって接続することによって、図1,2に示した2つのストリング列が直列に接続される受光素子モジュール1の素子配列が形成される。 By connecting the light receiving elements 10 using the inter-element connection body 30, as shown in FIGS. 1 and 2, a string in which the light receiving elements 10a, 10b, and 10c are linearly connected is formed. The linear string formed by the light receiving elements 10a, 10b, and 10c and the linear string formed by the light receiving elements 10d, 10e, and 10f are connected by solder or a conductive adhesive, so that FIG. The element arrangement of the light receiving element module 1 in which the two string rows shown in 2 are connected in series is formed.
 受光素子モジュール1の終端部となる受光素子10a,10fは、受光素子モジュール1から電流を取り出すための電流引き出し線38に接続される。 The light receiving elements 10 a and 10 f serving as the terminal portions of the light receiving element module 1 are connected to a current drawing line 38 for extracting current from the light receiving element module 1.
 また、モジュールを構成する素子の終端部にモジュールの電流引き出し線38がはんだあるいは導電性接着剤で接続されるため、受光素子10a,10fの素子間接続体30の形状が他の受光素子10b~10eのものとは異なる形状となる。 In addition, since the module current lead wire 38 is connected to the terminal portion of the element constituting the module by solder or conductive adhesive, the shape of the inter-element connection body 30 of the light receiving elements 10a and 10f is different from that of the other light receiving elements 10b to 10b. The shape is different from that of 10e.
 受光素子10aでは電流取出し電極15部分に電流引き出し線38が、受光素子10fでは素子間接続体30の本体部32に電流引き出し線38が、電気接続体21を通じて接続され、外部接続が可能となっている。また、本実施の形態ではストリング端部とストリング内部とで、素子間接続体30の本体部32と素子間接続体30の素子間接続部31との位置関係が異なっている。 In the light receiving element 10a, the current extraction line 38 is connected to the current extraction electrode 15 portion, and in the light receiving element 10f, the current extraction line 38 is connected to the main body portion 32 of the inter-element connection body 30 through the electric connection body 21, thereby enabling external connection. ing. Further, in the present embodiment, the positional relationship between the main body portion 32 of the inter-element connection body 30 and the inter-element connection portion 31 of the inter-element connection body 30 is different between the string end and the inside of the string.
 そして、ストリングを形成した後、樹脂封止がなされる。図9に断面図を示すように、図1と図2に示す2列のストリングからなる受光素子配列の表面側と裏面側には、エチレンビニルアセテート樹脂シート等のシート状の封止材22が配置され、封止材22を介して、表面側すなわち受光面側にはガラス等の表面側主面材23が接着され、裏面側には、耐候性のポリエチレンテレフタラート樹脂シート等の裏面側主面材25が接着される。 Then, after forming the string, resin sealing is performed. As shown in the cross-sectional view of FIG. 9, sheet-like sealing material 22 such as an ethylene vinyl acetate resin sheet is provided on the front surface side and the back surface side of the light receiving element array including the two rows of strings illustrated in FIGS. 1 and 2. The surface side main surface material 23 such as glass is bonded to the front surface side, that is, the light receiving surface side through the sealing material 22, and the back surface side main surface such as a weather-resistant polyethylene terephthalate resin sheet is bonded to the back surface side. The face material 25 is bonded.
 図9においては、素子基板の裏面が平坦である場合を記載したが、基板自体の線状電極12との接続部及び接続部の近辺が、集電電極14、電流取出し電極15に対して突出する構造としてもよい。素子基板と線状電極12との接続部及び接続部の近辺の素子基板自体が、素子基板と集電電極14、電流取出し電極15との接続部に対して突出する構造とした場合、一方の極性の電極と他方の極性の電極の高低差が基板上の高低差分だけ増大する。 In FIG. 9, the case where the back surface of the element substrate is flat is described, but the connection portion of the substrate itself with the linear electrode 12 and the vicinity of the connection portion protrude from the current collecting electrode 14 and the current extraction electrode 15. It is good also as a structure to do. When the connection portion between the element substrate and the linear electrode 12 and the element substrate in the vicinity of the connection portion project from the connection portion between the element substrate and the current collecting electrode 14 and the current extraction electrode 15, The height difference between the polarity electrode and the other polarity electrode is increased by the height difference on the substrate.
 また、表面側主面材23と裏面側主面材25で挟まれた構造を金属等の強化体によるフレームで支持がなされ、電流引き出し線38が封止材22と裏面側主面材25の切れ目からジャンクションボックスを介して裏面に取り出された構造となり、受光素子モジュール1を構成している。 Further, the structure sandwiched between the front-side main surface material 23 and the back-side main surface material 25 is supported by a frame made of a reinforcing body such as a metal, and the current lead line 38 is formed between the sealing material 22 and the back-side main surface material 25. The light receiving element module 1 is configured by taking the structure from the cut through the junction box to the back surface.
 以上のようにして作成された素子ストリング列の受光面側と裏面側を封止材及び主面材によって封止することで図1,2及び図9に示す受光素子モジュール構造を得ることが可能となる。 The light-receiving element module structure shown in FIGS. 1, 2, and 9 can be obtained by sealing the light-receiving surface side and the back surface side of the element string row created as described above with a sealing material and a main surface material. It becomes.
 図1と図2では、図示を省略しているが、図1と図2に示す2列のストリングからなる受光素子配列の表面側と裏面側には、シート状のエチレンビニルアセテート樹脂等の封止材22が配置され、封止材22を介して、表面側にはガラス等の表面側主面材23が配置され、裏面側には、耐候性のポリエチレンテレフタラート樹脂シート等の裏面側主面材25が配置されている。 Although not shown in FIGS. 1 and 2, a sheet-like ethylene vinyl acetate resin or the like is sealed on the front side and back side of the light receiving element array composed of two rows of strings shown in FIGS. 1 and 2. A stop material 22 is disposed, and a front-side main surface material 23 such as glass is disposed on the front surface side through the sealing material 22, and a back-surface side main material such as a weather-resistant polyethylene terephthalate resin sheet is disposed on the back surface side. A face material 25 is disposed.
 なお、実施の形態1で説明した背面接続型の受光素子の場合、基板のライフタイムの高いものを用いる必要があり、シリコン基板としてはn基板が適している。本実施の形態では、第2の素子電極である集電電極14及び電流取出し電極15を正の電極としており、第2の素子電極の面積が、第1の素子電極である線状電極12の面積よりも大きくなっている。上記構造の場合で、p層領域での再結合がn層領域での再結合よりも大き過ぎない場合、pn接合の面積がnn接合の面積よりも大きい方が、少数キャリアがpn接合へたどり着き、発電に寄与する割合が高くなり、従って、電流取出し効率、及び発電効率が高くなる。 In the case of the back connection type light receiving element described in the first embodiment, it is necessary to use a substrate having a long lifetime, and an n substrate is suitable as the silicon substrate. In the present embodiment, the collector electrode 14 and the current extraction electrode 15 that are the second element electrodes are positive electrodes, and the area of the second element electrode is that of the linear electrode 12 that is the first element electrode. It is larger than the area. In the case of the above structure, when the recombination in the p-layer region is not too large than the recombination in the n-layer region, the minority carriers are transferred to the pn junction when the area of the pn junction is larger than the area of the nn + junction. The rate of arrival and contribution to power generation is increased, and therefore the current extraction efficiency and power generation efficiency are increased.
 また、第1及び第2の素子電極に反射性層を用いることにより、反射体が基板上に直に形成されるため光の利用効率が高くなる。素子間接続体30は反射体と電気接続体との接続領域とを別の部品から構成することができるため、それぞれに適した材料を用いることができ、反射性と接続性に優れた素子電極、及び素子電極を有する素子とすることができる。ここで反射性層とは反射材で構成された層だけでなく散乱性の層も含むこととする。 In addition, by using a reflective layer for the first and second element electrodes, the reflector is formed directly on the substrate, so that the light utilization efficiency is increased. Since the inter-element connection body 30 can be formed of separate parts for the connection area between the reflector and the electrical connection body, materials suitable for each can be used, and the element electrode having excellent reflectivity and connectivity And an element having an element electrode. Here, the reflective layer includes not only a layer made of a reflective material but also a scattering layer.
 また、第1の素子電極が第2の素子電極に比べて、素子間接続体30の本体部32に向かって突出しているようにすれば、素子電極間の高低差をつけることにより、精密な位置あわせを要することなく、本体部32を一方の極性の素子電極のみに接続することができる。 In addition, if the first element electrode protrudes toward the main body 32 of the inter-element connector 30 compared to the second element electrode, a precise difference can be obtained by providing a difference in height between the element electrodes. The main body 32 can be connected only to the element electrode of one polarity without requiring alignment.
 また、素子間接続体30の素子間同士で重なりがないため、絶縁性が高く、素子間接続体30の積層部の厚みが少なく、曲げ、反りが小さくてすみ、素子、ストリングの強度を高く保つことができる。また、集電抵抗が小さく、光電変換効率、発電出力に優れた受光素子モジュールを得ることができる。 Further, since there is no overlap between the elements of the inter-element connection body 30, the insulation is high, the thickness of the laminated portion of the inter-element connection body 30 is small, bending and warping are small, and the strength of the elements and strings is high. Can keep. In addition, a light receiving element module having a small current collecting resistance and excellent photoelectric conversion efficiency and power generation output can be obtained.
 さらにまた、本実施の形態では、本体部32のスリットSと素子間接続部31とが相補的な形状をなすため、素子間接続体30の素子間接続部31の部分の形状に本体部32が切り取られ、スリットSを形成している。そして本体部32がスリットSを有する形状のまま素子間接続体30を受光素子に装着するが、図8及び図9に示すように、スリットSに素子間接続部31が入り込むことによって素子間接続部31と本体部32が重ならない構造となる。従って、精密な位置合わせを行うことなく素子間接続部31と本体部32との間の絶縁性に優れるという利点を有する。この他に、実施の形態2のように、素子間接続部31と本体部32が積層される場合、素子間接続部31と本体部32との間には接着層26を形成する必要がある。なお、図8中の本体部32同士の間隔Qは、信頼性を維持可能な範囲で小さくすることで、より素子間の集電抵抗を小さくすることができる。 Furthermore, in the present embodiment, the slit S of the main body portion 32 and the inter-element connection portion 31 have a complementary shape, so that the main body portion 32 has the shape of the inter-element connection portion 31 of the inter-element connection body 30. Is cut out to form a slit S. The inter-element connection body 30 is attached to the light receiving element while the main body portion 32 has the slit S. As shown in FIGS. 8 and 9, the inter-element connection portion 31 enters the slit S so that the inter-element connection is achieved. The portion 31 and the main body portion 32 are structured not to overlap. Therefore, there is an advantage that the insulating property between the inter-element connection portion 31 and the main body portion 32 is excellent without performing precise alignment. In addition, when the inter-element connection portion 31 and the main body portion 32 are stacked as in the second embodiment, it is necessary to form the adhesive layer 26 between the inter-element connection portion 31 and the main body portion 32. . Note that the current collection resistance between the elements can be further reduced by reducing the interval Q between the main body portions 32 in FIG. 8 within a range in which the reliability can be maintained.
 また、図8及び図9に示すように、本体部のスリットSと素子間接続部31とが相補的な形状をなすように形成することで、材料の無駄も少なく、打ち抜きにより、精度よく形成することができる。また実装に際しては、前述したように、位置あわせが不要で素子間接続体30を一方の電極に対して自己整合的に接続することにより接続可能であるため、マージンが不要であり、素子電極の電極間距離を狭くすることができる。従って本実施の形態1によれば、変換効率に優れるとともに、短絡のおそれもなく信頼性の高い受光素子モジュール等の光電変換素子モジュールを得ることができる。また電流取出し効率を上げるためには少数キャリアの拡散長を素子電極間の距離よりも長くする必要があり、逆に素子電極の電極ピッチは半導体素子基板内の少数キャリアの拡散長よりも小さいことが好ましい。従って、シリコン基板の場合の電極ピッチの一例としては1mm程度となる。150mm角程度の大きさの基板を使用する場合、2つの極性の素子電極300本程度に対して素子間接続体30を高精度に位置あわせする必要が生じる。互いに接触しないように精度よくならべて素子電極に接続する必要があり、他方の極性の電極とは絶縁する必要があり、コストと時間がかかるという問題があった。例えば、高精度の位置あわせのために素子にアライメントマークをいれる場合、アライメントマークを形成する工程を導入する必要があり、アライメントマークが銀電極で形成される場合はアライメントマークの分だけ銀が必要になり、また、高精度の位置あわせ機構を有する分だけ装置コストもかかる。これ以外にもアライメントマーク部で光電変換効率が低下する場合もある。 Also, as shown in FIGS. 8 and 9, the slit S of the main body and the inter-element connection part 31 are formed so as to have a complementary shape, so that there is little waste of material, and it is accurately formed by punching. can do. In mounting, as described above, alignment is unnecessary and connection is possible by connecting the inter-element connector 30 to one of the electrodes in a self-aligning manner, so that no margin is required. The distance between the electrodes can be reduced. Therefore, according to the first embodiment, it is possible to obtain a photoelectric conversion element module such as a light receiving element module that is excellent in conversion efficiency and highly reliable without causing a short circuit. In order to increase the current extraction efficiency, the minority carrier diffusion length must be longer than the distance between the device electrodes. Conversely, the electrode pitch of the device electrodes is smaller than the minority carrier diffusion length in the semiconductor device substrate. Is preferred. Therefore, an example of the electrode pitch in the case of a silicon substrate is about 1 mm. When a substrate having a size of about 150 mm square is used, it is necessary to align the inter-element connector 30 with high accuracy with respect to about 300 element electrodes having two polarities. There is a problem that it is necessary to arrange the electrodes with high precision so that they do not contact each other and to be connected to the electrode of the other electrode, and to insulate from the electrode of the other polarity, which requires cost and time. For example, if an alignment mark is placed on the element for high-precision alignment, it is necessary to introduce a process for forming the alignment mark. If the alignment mark is formed of a silver electrode, silver is required for the alignment mark. In addition, the cost of the apparatus is increased by having a highly accurate alignment mechanism. In addition, the photoelectric conversion efficiency may decrease at the alignment mark portion.
 さらにまた、電流取出し電極15がストリング延在方向と平行となるように配置することにより、線状電極12と集電電極14はストリングと直交することになる。従って、ストリングと平行に走る素子間接続体30まで素子電極上の素子電極が延在する距離が素子の大きさの1/2nになり、素子電極上の集電抵抗が小さくなる構造となる。ここでnはバスすなわち電流取出し電極の本数である。ストリング端部では素子を90度回転させることにより、ストリング間接続体が不要となり、素子以外がモジュールに占める面積を減らすことができ、面積あたりの発電量に優れたモジュールを得ることができる。 Furthermore, by arranging the current extraction electrode 15 so as to be parallel to the string extending direction, the linear electrode 12 and the current collecting electrode 14 are orthogonal to the string. Therefore, the distance that the element electrode on the element electrode extends to the inter-element connection body 30 that runs parallel to the string is 1 / 2n of the element size, and the current collecting resistance on the element electrode is reduced. Here, n is the number of buses, that is, current extraction electrodes. By rotating the element 90 degrees at the end of the string, an inter-string connector is not necessary, and the area occupied by the module other than the element can be reduced, and a module excellent in power generation per area can be obtained.
 また、複数の受光素子からなる受光素子モジュールは一般的に素子間を金属製の素子間接続体で電気的に接続するが、金属製の素子間接続体及び素子電極と受光素子基板との熱膨張率の違いから、素子間接続体付きの受光素子には反りが生じることがあった。素子上に直接形成される素子間接続体及び素子電極の厚みが増えると、金属製の素子間接続体及び素子電極と受光素子基板との熱膨張率の違いから、素子間接続体付きの受光素子には反りが生じ、素子を破損させることなく平面形状に封止することが困難となる。特に一般的に用いられているガラス成分を含むペーストを焼成して形成する金属電極を素子電極に用いた場合、焼成時に高温が必要であり、電極面積及び厚みを増大すると素子の反りが大きくなる。特に、素子の片面にのみ素子間接続体が接続される背面接続型素子を封止して形成される受光素子モジュールにおいては、両面に電極を有する受光素子のように両面の素子間接続体間で釣り合いを取ることができないため、素子間接続体付きの受光素子の反りが特に大きくなり、このために素子ストリングを平面形状に封止することが困難となる場合がある。 In general, a light receiving element module composed of a plurality of light receiving elements electrically connects elements with a metal inter-element connection body. However, the heat between the metal inter-element connection body and the element electrode and the light receiving element substrate is not limited. Due to the difference in the expansion coefficient, the light receiving element with the inter-element connection body may be warped. When the thickness of the inter-element connection body and the element electrode formed directly on the element increases, the light reception with the inter-element connection body is caused by the difference in thermal expansion coefficient between the metal inter-element connection body and the element electrode and the light receiving element substrate. The element is warped, and it is difficult to seal the element in a planar shape without damaging the element. In particular, when a metal electrode formed by firing a paste containing a commonly used glass component is used as an element electrode, a high temperature is required during firing, and increasing the electrode area and thickness increases warping of the element. . In particular, in a light receiving element module formed by sealing a back connection type element in which an inter-element connection body is connected to only one side of the element, the inter-element inter-connection bodies on both sides are similar to a light receiving element having electrodes on both sides. Therefore, the warpage of the light-receiving element with the inter-element connection body is particularly large, which may make it difficult to seal the element string in a planar shape.
 このような反りの問題は背面接続型素子においては極めて深刻である。反りを低減するには素子基板と素子電極との接続面積を小さくし、素子間接続体と素子電極の厚みを減らす必要があるが、厚みを減らすと素子間接続体と素子電極の抵抗が増大する。また、素子電極の幅が少数キャリアの拡散長にくらべて広くなるとキャリアの収集効率が低下する。しかし、本実施の形態の構成によれば、素子電極のレイアウトに自由度が高く、素子電極のバス本数及び素子間接続体30の素子間接続部31の数を任意にすることができ、本数を増大することによって、電流取出し電極すなわちバス電極の幅を増大することなく素子間接続体の本体部、素子間接続体の素子間接続部及び電流取出し電極の面積を増大することができ、素子間接続体の厚みを減らすことができる。この結果、集電抵抗を低下させかつ、素子の反りを低減することができる。素子上に電極を形成した場合では、素子の大きさ、電極の熱膨張率、板厚の比率、ヤング率、温度に応じて反りが大きくなる。素子電極を成膜し得る限り薄くして、素子間接続体が集電を担うようにすることで、反りが小さくなる。素子間接続体の接続温度が低く、本実施の形態では本体部の幅が広いために一般的な素子間接続体よりも薄くすることができ、反りを小さくすることができる。 Such a warpage problem is extremely serious in the back connection type element. To reduce warpage, it is necessary to reduce the connection area between the element substrate and the element electrode and reduce the thickness of the inter-element connection body and the element electrode. However, if the thickness is reduced, the resistance between the inter-element connection body and the element electrode increases. To do. Further, when the width of the device electrode is wider than the diffusion length of minority carriers, the carrier collection efficiency decreases. However, according to the configuration of the present embodiment, the layout of the element electrodes is highly flexible, the number of element electrode buses and the number of inter-element connection portions 31 of the inter-element connection body 30 can be arbitrarily set, and the number Can increase the area of the body part of the inter-element connection body, the inter-element connection part of the inter-element connection body, and the current extraction electrode without increasing the width of the current extraction electrode, that is, the bus electrode. The thickness of the connection body can be reduced. As a result, the current collecting resistance can be lowered and the warpage of the element can be reduced. In the case where an electrode is formed on the element, the warpage increases according to the size of the element, the thermal expansion coefficient of the electrode, the ratio of the plate thickness, the Young's modulus, and the temperature. The warping is reduced by making the element electrode as thin as possible so that the inter-element connector can collect current. Since the connection temperature of the inter-element connection body is low and the width of the main body portion is wide in this embodiment mode, it can be made thinner than a general inter-element connection body and warpage can be reduced.
 また、太陽電池には導電率の高い金属として素子電極に希少性の高い銀電極がよく使用されるが、本発明の構造を用いれば素子電極の抵抗上昇の影響を受けにくい為、素子電極の導電率が低くてもよい。したがって、銀以外の材料を用いることができる共に、素子電極に使用する金属量を減らすことができる。上述したように素子電極に使用する金属量を減らすことができるため、太陽電池を製造する際に使用するに銀の量を減らすことができ、省資源、低コスト化することができるという利点を有する。 In addition, a silver electrode having high rarity is often used as a device electrode as a metal having high conductivity in a solar cell. However, if the structure of the present invention is used, it is difficult to be affected by an increase in resistance of the device electrode. The conductivity may be low. Therefore, materials other than silver can be used, and the amount of metal used for the device electrode can be reduced. As described above, since the amount of metal used for the device electrode can be reduced, it is possible to reduce the amount of silver to be used when manufacturing a solar cell, and it is possible to save resources and reduce costs. Have.
 さらにまた、前記実施の形態1では、素子間接続部31と本体部32は同一の厚さとなるように形成したが、例えば図9において、表面の平坦化を図るべく、素子間接続部31よりも本体部32が薄肉となるようにしてもよい。パンチング等の方法により、本体部32を薄肉化することで容易に加工することが可能である。 Furthermore, in the first embodiment, the inter-element connection portion 31 and the main body portion 32 are formed to have the same thickness. However, for example, in FIG. Alternatively, the main body 32 may be thin. It is possible to easily process the main body 32 by thinning it by a method such as punching.
 本発明によれば、第1の素子電極は導電板からなる素子間接続体の本体部に直接接続することで素子上での集電距離をほぼゼロとし、第2の素子電極は、中間部で交差部を持つように取出し電極を配し、取出し電極に沿って素子間接続部を接続することで、素子上での集電距離を低減する。これにより、集電抵抗と素子の反りを大幅に低減することができ、設置面積に対する発電出力に優れた受光素子モジュールを得ることができる、という効果を奏する。また、製造に要する時間が短く、多様な電極材料を使用でき、低コスト、簡便な方法で低抵抗の電極を得ることができる。 According to the present invention, the first element electrode is directly connected to the main body of the inter-element connector made of a conductive plate, so that the current collection distance on the element is substantially zero, and the second element electrode is the intermediate portion. In this case, the extraction electrodes are arranged so as to have crossing portions and the inter-element connection portions are connected along the extraction electrodes, thereby reducing the current collection distance on the elements. Thereby, current collection resistance and the curvature of an element can be reduced significantly, and there exists an effect that the light receiving element module excellent in the electric power generation output with respect to an installation area can be obtained. Further, the time required for the production is short, and various electrode materials can be used, and a low-resistance electrode can be obtained by a low cost and simple method.
 なお、前記実施の形態では素子電極を平面配置し、第2の素子電極を交差させた構造としたが、一方の極の電極の電流取り出し電極15もしくは素子間接続部31を集電電極14と交差させる構成としてもよい。従来の受光素子モジュールにおいては、両極の電流取出し電極及び素子間接続部の位置及び本数を合わせる必要があったが、上記構成によれば両極間の電流取出し電極15及び素子間接続部31と、他方の極性の電極の電流取出し電極の数及び位置とを合わせなくてもよくなり、素子電極部分における抵抗を低減することができる。これは、2つの極性の電極を層構造とし、一方の極の電極の電流取出し電極15もしくは素子間接続部31を集電電極14と交差させることによって得られる効果である。 In the above embodiment, the element electrodes are arranged in a plane and the second element electrodes are crossed. However, the current extraction electrode 15 or the inter-element connection portion 31 of one electrode is connected to the current collecting electrode 14. It is good also as a structure made to cross | intersect. In the conventional light receiving element module, it is necessary to match the positions and the number of the current extraction electrodes and the inter-element connection portions of both poles, but according to the above configuration, the current extraction electrode 15 and the inter-element connection portion 31 between the two poles, It is not necessary to match the number and position of the current extraction electrodes of the other polarity electrode, and the resistance in the element electrode portion can be reduced. This is an effect obtained by making the electrodes of two polarities into a layer structure and crossing the current extraction electrode 15 or the inter-element connection portion 31 of one electrode with the current collecting electrode 14.
 実施の形態2.
 図10は本実施の形態2の受光素子モジュールを裏面側から見た平面図である。図11は、実施の形態2で用いられる受光素子モジュールを構成する受光素子及び素子間接続体との位置関係を模式的に示す斜視図である。図12(a)は、実施の形態2の受光素子モジュールに用いられる素子間接続体を示す平面図、図12(b)、図12(c)、図12(d)及び図12(e)は、図12(a)のI-J断面図、K-L断面図、M1-N1断面図及びM2-N2断面図である。M1-N1断面図は、集電電極14の存在する部分をとおる断面を示し、M2-N2断面図は、線状電極12の存在する部分をとおる断面を示す部分である。ここでは、モジュールの状態の素子間接続体をストリングの繰り返し単位ひとつ分で取り出したもので、図12(b)、図12(c)、図12(d)、図12(e)では素子間接続体30と素子とが接続された際の接着層26の位置関係が分かるように接着層26を記載している。図10では、見易さのため、フレーム、ジャンクションボックスの図示を省略している。なお、図12(a)~12(e)は電極パターンを模式的に記載した図であり、実際の電極本数は図面よりも多い。
Embodiment 2. FIG.
FIG. 10 is a plan view of the light receiving element module according to the second embodiment as viewed from the back side. FIG. 11 is a perspective view schematically showing a positional relationship between a light receiving element and an inter-element connection body constituting the light receiving element module used in the second embodiment. FIG. 12A is a plan view showing an inter-element connection body used in the light receiving element module according to Embodiment 2, and FIG. 12B, FIG. 12C, FIG. 12D, and FIG. These are the IJ sectional view, KL sectional view, M 1 -N 1 sectional view, and M 2 -N 2 sectional view of FIG. The M 1 -N 1 cross-sectional view shows a cross section through the portion where the collecting electrode 14 exists, and the M 2 -N 2 cross-sectional view shows a cross section through the portion where the linear electrode 12 exists. Here, the inter-element connection body in the module state is taken out by one repeating unit of the string, and in FIG. 12 (b), FIG. 12 (c), FIG. 12 (d), and FIG. The adhesive layer 26 is shown so that the positional relationship of the adhesive layer 26 when the connection body 30 and the element are connected can be understood. In FIG. 10, the illustration of the frame and the junction box is omitted for easy viewing. 12 (a) to 12 (e) are diagrams schematically showing electrode patterns, and the actual number of electrodes is larger than that of the drawings.
 本実施の形態の素子間接続体30は、前記実施の形態1で説明した受光素子モジュールの素子間接続体30と同様、背面側に第1及び第2の素子電極を有する背面接続型の受光素子10a~10fを接続するものである。素子間接続部31は、可撓性を有する導電体箔で構成される。そして図12(b)に示すように、受光素子の背面全体を覆う本体部32と、本体部32の背面に接続され、隣接する受光素子の第2の素子電極に接続される素子間接続部31とを備える。素子間接続体30の本体部32と素子間接続部31とは電気接続体によって接続されている。素子間接続体30の本体部32と素子間接続部31とを接続するにあたって、電気接続体を用いることなく、スポット溶接、熱圧着等で直接的に接続されていてもよい。 The inter-element connection body 30 of the present embodiment, like the inter-element connection body 30 of the light-receiving element module described in the first embodiment, has a back connection type light reception having first and second element electrodes on the back surface side. The elements 10a to 10f are connected. The inter-element connection portion 31 is made of a flexible conductor foil. And as shown in FIG.12 (b), the main-body part 32 which covers the whole back surface of a light receiving element, and the element connection part connected to the back surface of the main body part 32, and connected to the 2nd element electrode of an adjacent light receiving element. 31. The main body 32 of the inter-element connection body 30 and the inter-element connection section 31 are connected by an electrical connection body. When connecting the main body part 32 of the inter-element connection body 30 and the inter-element connection part 31, they may be directly connected by spot welding, thermocompression bonding or the like without using an electrical connection body.
 また、本実施の形態において、本体部32はスリットSすなわち切欠きを持たず、受光素子10を構成する半導体基板11全体を覆っている点で前記実施の形態1と異なる。さらに、素子間接続体30の本体部32と素子間接続部31が個別の2つの部品から構成されている点が異なる。他の部分については前記実施の形態1と同様であり、ここでは説明を省略する。ここで図12(a)は、素子間接続体30を背面から見た図であり、素子間接続部31は本体部32の背面に接続されている。素子間接続部31が本体部32よりも素子側にある場合に比べ、素子間接続部31が本体部32よりもモジュールの背面側にあるほうが、素子間接続部31と、電流取出し電極15との短絡を防ぐことができる。 Further, in the present embodiment, the main body 32 does not have a slit S, that is, a notch, and differs from the first embodiment in that it covers the entire semiconductor substrate 11 constituting the light receiving element 10. Furthermore, the point that the main-body part 32 and the inter-element connection part 31 of the inter-element connection body 30 are comprised from two separate components differs. Other parts are the same as those in the first embodiment, and the description thereof is omitted here. Here, FIG. 12A is a view of the inter-element connection body 30 as viewed from the back side, and the inter-element connection portion 31 is connected to the back surface of the main body portion 32. Compared with the case where the inter-element connection portion 31 is closer to the element side than the main body portion 32, the inter-element connection portion 31, the current extraction electrode 15, and the inter-element connection portion 31 are located closer to the back side of the module than the main body portion 32. Can prevent short circuit.
 図12(b)のI-J断面及び図12(d)のM1-N1断面では、素子間接続体30の本体部32の受光面側には接着層26が存在し、素子間接続体30の本体部32と素子間接続部31とは絶縁される。その一方で、図12(c)に示すK-L断面及び図12(e)のM1-N1断面のO31以外の部分においては、絶縁層26が選択的に存在しない部分を有し、素子間接続体30の本体部32の受光面側に絶縁層26がない部分では電気接続体21を介して素子電極である線状電極12と接続される。図12(d),12(e)の凹部O31の部分には隣接する受光素子に接続される素子間接続部31が位置し、絶縁層26によって素子間接続体30の本体部32と絶縁される。 In the IJ cross section of FIG. 12B and the M 1 -N 1 cross section of FIG. 12D, the adhesive layer 26 exists on the light receiving surface side of the main body 32 of the inter-element connector 30, and the inter-element connection The body portion 32 of the body 30 and the inter-element connection portion 31 are insulated. On the other hand, the portion other than O 31 in the KL cross section shown in FIG. 12C and the M 1 -N 1 cross section in FIG. 12E has a portion where the insulating layer 26 does not exist selectively. The portion where the insulating layer 26 is not provided on the light receiving surface side of the main body 32 of the inter-element connector 30 is connected to the linear electrode 12 that is an element electrode via the electrical connector 21. 12 (d) and 12 (e), the inter-element connection portion 31 connected to the adjacent light receiving element is located at the concave portion O 31 , and is insulated from the main body portion 32 of the inter-element connection body 30 by the insulating layer 26. Is done.
 そして素子電極のうちの一方の電極である線状電極12(及び電流取出し電極)に選択的に接続された本体部32と接続された素子間接続部31が、隣接する受光素子10の第2の素子電極である電流取出し電極15に当接している。第2の素子電極である集電電極14も一定の間隔でストライプ状すなわち線状をなして形成されており、集電電極14と交差する2本の電流取出し電極15を有している。電流取出し電極15に沿って素子間接続部31が当接しているため、第2の素子電極の集電距離を小さくすることができるため、集電抵抗の低減をはかることができる。 Then, the inter-element connection portion 31 connected to the main body portion 32 selectively connected to the linear electrode 12 (and current extraction electrode) which is one of the element electrodes is connected to the second light receiving element 10 of the adjacent light receiving element 10. This is in contact with the current extraction electrode 15 which is an element electrode. The collector electrode 14 as the second element electrode is also formed in a stripe shape, that is, a linear shape at a constant interval, and has two current extraction electrodes 15 that intersect the collector electrode 14. Since the inter-element connection portion 31 is in contact with the current extraction electrode 15, the current collection distance of the second element electrode can be reduced, so that the current collection resistance can be reduced.
 本実施の形態についても前記実施の形態1の受光素子モジュールと同様、樹脂封止がなされ、図13に断面図を示す受光素子モジュールが得られる。本実施の形態2では、図13に示すように受光素子10上に位置する、素子間接続体30の本体部32と、隣接する素子間接続体30の素子間接続部31の一部とが、素子上で積層され、電気的に接続される部分を有する。従って、本実施の形態2の場合には、素子間接続体30の素子間接続部31-素子間接続体30の本体部32-素子間接続体30の素子間接続部31という積層構造部分ができてくる。本体部32と素子間接続部31との積層構造を含む場合は、実施の形態1にくらべて図13中のα部分において素子間接続部31が積層されている部分の長さの分だけ、電流取りだし電極15と素子間接続部31とが接続される長さが長くなり、集電電極14から素子間接続体30の素子間接続部31に到達するまでの水平距離が短くなるため、素子端部での素子電極上の集電抵抗を小さくすることができるという利点を有する。 Also in the present embodiment, as in the light receiving element module of the first embodiment, resin sealing is performed, and a light receiving element module whose sectional view is shown in FIG. 13 is obtained. In the second embodiment, as shown in FIG. 13, the main body portion 32 of the inter-element connection body 30 and a part of the inter-element connection section 31 of the adjacent inter-element connection body 30 are located on the light receiving element 10. , And a portion stacked on the element and electrically connected. Therefore, in the case of the second embodiment, the laminated structure portion of the inter-element connection portion 31 of the inter-element connection body 30 -the main body portion 32 of the inter-element connection body 30 -the inter-element connection portion 31 of the inter-element connection body 30 is formed. Come out. When including the laminated structure of the main body part 32 and the inter-element connection part 31, as much as the length of the part where the inter-element connection part 31 is laminated in the α part in FIG. The length of the connection between the current extraction electrode 15 and the inter-element connection portion 31 is increased, and the horizontal distance from the current collecting electrode 14 to the inter-element connection portion 31 of the inter-element connection body 30 is shortened. This has the advantage that the current collecting resistance on the device electrode at the end can be reduced.
 実施の形態1においては、電流取出し電極15の部分において、素子間接続体30の素子間接続部31が同一素子上の素子間接続体30の本体部32と重ならない構造となっているが、本実施の形態2では、素子間接続部31が本体部32と重なっている。つまり電流取出し電極15のおおよそ全体に素子間接続体30の素子間接続部31が接続され、同一素子上の背面側に接着層26を介して素子間接続体30の本体部32が形成され、さらに本体部32の背面側の一部領域に対して電気接続体33を介して素子間接続部31が積層される構造となる。本体部32に素子間接続部31が積層される場合、本体部32は、図13中β、γ部分に示すように、電流取出し電極15の上の素子間接続部31との積層部分において、積層部分以外の本体部32よりも素子裏側すなわちモジュールの非受光面側に突出した形状となる。 In the first embodiment, in the portion of the current extraction electrode 15, the inter-element connection portion 31 of the inter-element connection body 30 has a structure that does not overlap the main body portion 32 of the inter-element connection body 30 on the same element. In the second embodiment, the inter-element connection portion 31 overlaps the main body portion 32. That is, the inter-element connection portion 31 of the inter-element connection body 30 is connected to almost the entire current extraction electrode 15, and the main body portion 32 of the inter-element connection body 30 is formed on the back side of the same element via the adhesive layer 26. Further, the inter-element connection portion 31 is stacked on the partial region on the back side of the main body portion 32 via the electrical connection body 33. When the inter-element connection portion 31 is laminated on the main body portion 32, the main body portion 32 is formed in the laminated portion with the inter-element connection portion 31 on the current extraction electrode 15, as shown by β and γ portions in FIG. The shape protrudes from the main body portion 32 other than the laminated portion to the element back side, that is, the non-light receiving surface side of the module.
 実施の形態2のように、同一素子上の素子間接続部31と素子間接続体30の本体部32とが接着層26をはさんで重なり合う部分を有する構造の場合、素子間接続部31と電流取出し電極15との接続長さが長くでき、集電電極14及び電流取出し電極15での集電抵抗が小さくなるという利点を有する。具体的には、図13中α部分では、電流取出し電極15の全域にわたって素子間接続部31を接続しており、電流取出し電極15しかない場合に比べα部分に素子間接続部31が延伸する分だけ、実施の形態1の素子モジュールよりも集電抵抗を小さくすることが出来る。 In the case of a structure having a portion where the inter-element connection portion 31 on the same element and the main body portion 32 of the inter-element connection body 30 overlap with the adhesive layer 26 sandwiched as in the second embodiment, the inter-element connection portion 31 and The connection length with the current extraction electrode 15 can be increased, and the current collection resistance at the current collection electrode 14 and the current extraction electrode 15 is reduced. Specifically, in the portion α in FIG. 13, the inter-element connection portion 31 is connected over the entire area of the current extraction electrode 15, and the inter-element connection portion 31 extends to the α portion as compared with the case where only the current extraction electrode 15 is provided. Accordingly, the current collecting resistance can be made smaller than that of the element module of the first embodiment.
 一方で、重なり部分は、例えば、電気接続体21に突起部がある場合等に短絡する要因となるため、電気接続体21の材料によっては低減することが好ましく、実施の形態1のように切り欠き部を有する場合は重なり部分を低減できる。さらに実施の形態1では、本体部32と電流取出し電極15の重なる部分において素子間接続体30の素子間接続部31がなく、電流取出し電極15に接続されないようにすることによって、素子間を接続する素子間接続部31と面状の本体部32とが重ならないようになり、絶縁性を向上させている。 On the other hand, the overlapping portion is a factor that causes a short circuit when, for example, the electrical connection body 21 has a protruding portion. Therefore, it is preferable to reduce the overlap depending on the material of the electrical connection body 21, as in the first embodiment. When it has a notch part, an overlap part can be reduced. Further, in the first embodiment, there is no inter-element connection portion 31 of the inter-element connection body 30 at the portion where the main body portion 32 and the current extraction electrode 15 overlap, so that the elements are not connected to each other. Therefore, the inter-element connection portion 31 and the planar main body portion 32 do not overlap each other, and the insulation is improved.
 上記素子間接続体30の素子間接続部31、本体部32、及び線状電極12、電流取出し電極15は、電気接続体によって接続される。本実施の形態2においては、図13に示すように素子間接続体30の本体部32の背面側と素子間接続部31との間、及び、電流取出し電極15と素子間接続体30の素子間接続部31との間は第2の電気接続体33で接続され、素子間接続体30の本体部32の背面側と線状電極12との間は電気接続体21で接続されている。 The inter-element connection portion 31, the main body portion 32, the linear electrode 12, and the current extraction electrode 15 of the inter-element connection body 30 are connected by an electrical connection body. In the second embodiment, as shown in FIG. 13, between the back side of the main body portion 32 of the inter-element connection body 30 and the inter-element connection section 31, and between the current extraction electrode 15 and the inter-element connection body 30. The inter-connection portion 31 is connected by a second electrical connection body 33, and the back side of the main body portion 32 of the inter-element connection body 30 and the linear electrode 12 are connected by an electrical connection body 21.
 電気接続体21と電気接続体33としては、同じ材質のもの、あるいは、それぞれに異なるものを使用しても良く、更に、素子間接続体30の素子間接続部31、本体部32、及び線状電極12と電流取出し電極15の各部位すべてに異なる電気接続体を形成してもよい。また、互いに異なる電気接続体21と電気接続体33とを用いる部位の組み合わせとしては、例えば電気接続体30の本体部32-線状電極12間、電流取出し電極15-素子間接続部31間の接続部には電気接続体21を、素子間接続部31-電気接続体の本体部32間との接続部には電気接続体33を用いるようにしてもよく、接続するための部位と電気接続体とは任意に組み合わせてよい。なお、素子間接続部31の大部分には電気接続体33を形成し、素子間接続体30の本体部32と接続する部分だけ電気接続体21を形成することも可能である。 As the electrical connection body 21 and the electrical connection body 33, the same material or different ones may be used. Furthermore, the inter-element connection section 31, the main body section 32, and the wire of the inter-element connection body 30 may be used. Different electrical connectors may be formed in all the portions of the electrode 12 and the current extraction electrode 15. Further, as a combination of parts using different electrical connection bodies 21 and electrical connection bodies 33, for example, between the main body portion 32 of the electrical connection body 30 and the linear electrode 12 and between the current extraction electrode 15 and the inter-element connection portion 31. The electrical connection body 21 may be used for the connection part, and the electrical connection body 33 may be used for the connection part between the element connection part 31 and the main body part 32 of the electrical connection body. You may combine arbitrarily with a body. It is also possible to form the electrical connection body 33 in the most part of the inter-element connection portion 31 and form the electrical connection body 21 only in the portion connected to the main body portion 32 of the inter-element connection body 30.
 素子間を接続してストリングを形成するために加熱する際に素子電極と素子間接続体31が外れないように、電気接続体21及び33の溶融温度は異なっていてもよく、実施の形態2の場合、電気接続体33のほうが電気接続体21よりも溶融温度を低くする。電気接続体によって各部位を接続する際に、はじめに電気接続体21を高温で溶融させて、電流取出し電極15と素子間接続部31、及び素子間接続部31と本体部32を接続する。そして、次に電気接続体21が溶融せずに電気接続体33が溶融する温度で加熱して本体部32と線状電極12とを接続することにより、後者の加熱の際に前者の電気接続体21による接続部が溶融せずに場所を保持することができるため、ストリングを作成し易いという利点がある。電気接続体が使用される場所と溶融温度の高低の組み合わせは製造の順番に従って上記とは逆にしてもよい。電気接続体としては、錫銀系はんだ、錫ビスマス系はんだ、金属錫等のはんだを用いることができる。 The melting temperatures of the electrical connection bodies 21 and 33 may be different so that the element electrodes and the inter-element connection bodies 31 do not come off during heating to connect the elements to form a string. In this case, the electrical connection body 33 has a lower melting temperature than the electrical connection body 21. When each part is connected by the electrical connection body, the electrical connection body 21 is first melted at a high temperature to connect the current extraction electrode 15 and the inter-element connection section 31, and the inter-element connection section 31 and the main body section 32. Then, the former electrical connection is performed during the latter heating by connecting the main body 32 and the linear electrode 12 by heating at a temperature at which the electrical connection body 33 melts without melting the electrical connection body 21. Since the connection part by the body 21 can hold a place without melting, there is an advantage that it is easy to create a string. The combination of the location where the electrical connector is used and the melting temperature may be reversed according to the order of manufacture. As the electrical connection body, tin silver solder, tin bismuth solder, metal tin solder or the like can be used.
 本実施の形態の受光素子モジュール1によれば、受光素子全面を素子間接続体30の本体部32が覆っているため、特に接着層26に散乱性をもたせなくても、本体部32による反射により、素子内での十分な光吸収が実現される。従って、受光素子10の第1の素子電極との接続点すなわち接続領域以外の部分の本体部表面を、受光素子を透過する光に対する反射性が高い光反射体で形成するだけでよいため、構造も簡略化される。第1の素子電極である線状電極12及び第2の素子電極である集電電極14の隙間から受光素子10a~10fに反射光が入射し、光電変換効率を高めることができる。特に、受光素子モジュールの外観を黒色とする等の目的で、裏面側主面材25等の素子背面側が黒色材料等の光反射性が低い材料を用いる場合に、有効である。 According to the light receiving element module 1 of the present embodiment, since the main body portion 32 of the inter-element connection body 30 covers the entire surface of the light receiving element, the reflection by the main body portion 32 can be achieved even if the adhesive layer 26 is not particularly scattering. Thus, sufficient light absorption in the element is realized. Therefore, since the main body surface of the portion other than the connection point of the light receiving element 10 to the first element electrode, that is, the connection region, only needs to be formed of a light reflector having high reflectivity with respect to the light transmitted through the light receiving element. Is also simplified. Reflected light enters the light receiving elements 10a to 10f through the gap between the linear electrode 12 as the first element electrode and the collecting electrode 14 as the second element electrode, and the photoelectric conversion efficiency can be increased. In particular, it is effective when the back surface side of the element such as the back side main surface material 25 uses a material having low light reflectivity, such as a black material, for the purpose of blackening the appearance of the light receiving element module.
 変形例1.
 なお、素子間接続体30の素子間接続部31と本体部32とが別の部材から構成されている実施の形態2の構成においても、図14(a)~図14(c)に素子間接続体の変形例1を示すように、本体部32に素子間接続部31に符合するようにスリットSを形成してもよい。図14(a)は、実施の形態2の受光素子モジュールに用いられる素子間接続体を示す平面図、図14(b)、図14(c)、図14(d)及び図14(e)は、図14(a)のI-J断面図、K-L断面図、M1-N1断面図及びM2-N2断面図である。M1-N1断面図は、集電電極14の存在する部分を示す。M2-N2断面図は、線状電極12の存在する部分を示す部分である。図14(a)~(e)の図はモジュールの状態の素子間接続体30をストリングの繰り返し単位ひとつ分を取り出したものでありモジュール封止材、受光素子等の周辺部材の記載を省略しているが、図14(b)、図14(c)、図14(d)、図14(e)では素子間接続体30と素子とが接続された際の接着層26の位置関係が分かるように接着層26を記載している。具体的には、図14(d)のM1-N1断面においてはO12部分で示される接着層26を有しない部分において素子電極の内の他方である線状電極12が素子間接続体30の本体部32と電気接続体21を介して接続され、図14(e)のM2-N2断面においては、接着層26によって素子電極の内の一方である集電電極14が素子間接続体の本体部32と絶縁され、図14(c)のK-L断面においては、接着層26を有する部分では接着層26によって集電電極14が素子間接続体の本体部32と絶縁される一方で、接着層26を有しない部分において線状電極12が素子間接続体の本体部32と電気接続体21を介して接続される。スリットSが形成されている以外は、前記実施の形態2と同様であるため、ここでは説明を省略するが、同一部位には同一符号を付した。変形例1の場合、集電電極14に接続される電流取出し電極15のおおよそ全体に素子間接続体30の素子間接続部31が接続され、同一素子上の背面側に接着層26を介して素子間接続体30の本体部32が形成され、さらに本体部32の背面側の一部に電気接続体33を介して素子間接続部31が積層される構造となる。なお図14(a)~(e)では、素子電極は図示を省略している。
Modification 1
In the configuration of the second embodiment in which the inter-element connection portion 31 and the main body portion 32 of the inter-element connection body 30 are made of different members, the inter-element connection is shown in FIGS. 14 (a) to 14 (c). As shown in Modification 1 of the connection body, the slit S may be formed in the main body portion 32 so as to coincide with the inter-element connection portion 31. FIG. 14A is a plan view showing an inter-element connection body used in the light-receiving element module according to Embodiment 2, and FIGS. 14B, 14C, 14D, and 14E. These are the IJ sectional view, KL sectional view, M 1 -N 1 sectional view, and M 2 -N 2 sectional view of FIG. 14 (a). The M 1 -N 1 sectional view shows a portion where the collecting electrode 14 exists. The M 2 -N 2 sectional view is a portion showing a portion where the linear electrode 12 exists. 14 (a) to 14 (e) show the inter-element connection body 30 in a module state in which one repeating unit of the string is taken out, and descriptions of peripheral members such as a module sealing material and a light receiving element are omitted. However, in FIGS. 14 (b), 14 (c), 14 (d), and 14 (e), the positional relationship of the adhesive layer 26 when the inter-element connector 30 and the element are connected is known. Thus, the adhesive layer 26 is described. Specifically, in the M 1 -N 1 cross section of FIG. 14D, the linear electrode 12 which is the other of the element electrodes in the portion not having the adhesive layer 26 indicated by the O 12 portion is the inter-element connector. In the cross section M 2 -N 2 of FIG. 14E, the current collecting electrode 14 is one of the element electrodes by the adhesive layer 26 between the elements. 14C. In the KL cross section of FIG. 14C, the collector electrode 14 is insulated from the main body 32 of the inter-element connection body by the adhesive layer 26 in the portion having the adhesive layer 26. On the other hand, the linear electrode 12 is connected to the body portion 32 of the inter-element connection body via the electrical connection body 21 in a portion where the adhesive layer 26 is not provided. Since it is the same as that of the said Embodiment 2 except the slit S being formed, although description is abbreviate | omitted here, the same code | symbol was attached | subjected to the same site | part. In the case of the first modification, the inter-element connection portion 31 of the inter-element connector 30 is connected to almost the entire current extraction electrode 15 connected to the current collecting electrode 14, and the adhesive layer 26 is interposed on the back side on the same element. A main body portion 32 of the inter-element connection body 30 is formed, and the inter-element connection portion 31 is laminated on a part of the back surface side of the main body portion 32 via the electric connection body 33. 14A to 14E, the device electrodes are not shown.
 図13のように素子間接続部31、本体部32、隣接する素子間接続部31が積層される部分を有する場合に比べて、スリットSを有し、素子間接続部31、本体部32、隣接する素子間接続部31が積層されない場合は、図13中の積層部分であるγ部がなくなり、素子間接続部31が本体部32と積層されるのはα部付近のみとなる。なお、変形例1のスリットを有する素子間接続体30を有する構造では、素子間接続体30の素子間接続部31と素子間接続体30の本体部32とが別の部品からなる以外は前記実施の形態1と同様である。このため、図14に示した変形例1の構成によれば、素子間接続体30の素子間接続部31と本体部32とに別の部材あるいは異なる厚みのものを用いることができるという実施の形態2の効果に加え、図9に近い構成になることによって本体部32がモジュール背面側に突出した形状である図13中β部に相当する部分を低減することができ、平坦性を維持し、絶縁性を高めることができる。 Compared to the case where the inter-element connection portion 31, the main body portion 32, and the adjacent inter-element connection portion 31 are stacked as shown in FIG. 13, the inter-element connection portion 31, the main body portion 32, When adjacent inter-element connection portions 31 are not stacked, the γ portion, which is a stacked portion in FIG. 13, disappears, and the inter-element connection portion 31 is stacked with the main body portion 32 only in the vicinity of the α portion. Note that, in the structure having the inter-element connection body 30 having the slits of the modified example 1, the inter-element connection section 31 of the inter-element connection body 30 and the main body section 32 of the inter-element connection body 30 are made of different parts. The same as in the first embodiment. For this reason, according to the structure of the modification 1 shown in FIG. 14, another member or the thing of different thickness can be used for the element connection part 31 and the main-body part 32 of the element connection body 30. In addition to the effect of the second aspect, the configuration close to that of FIG. 9 can reduce the portion corresponding to the β portion in FIG. 13 in which the main body portion 32 protrudes to the module back side, thereby maintaining flatness. Insulation can be improved.
 更に、素子間接続部31と本体部32が別の部材から構成されるため、実施の形態1とは異なり、ストリング端部においてもストリング内部の素子間接続体と異なる形状の素子間接続体を使用する必要がなくなるという利点を有する。また、本体部32を接続した後から素子間接続部31を接続することができ、素子間接続体30の素子裏部である本体部32を素子に接続する工程と、ストリングを形成する工程としての素子間接続体30の素子間接続部31を素子に接続する工程とを分けて実施し易くなるという利点を有する。 Furthermore, since the inter-element connection portion 31 and the main body portion 32 are formed of different members, unlike the first embodiment, an inter-element connection body having a shape different from that of the inter-element connection body inside the string is provided at the end of the string. It has the advantage that it is not necessary to use it. Moreover, after connecting the main-body part 32, the inter-element connection part 31 can be connected, and as the process of connecting the main-body part 32 which is the element back part of the inter-element connection body 30 to an element, and the process of forming a string There is an advantage that the step of connecting the inter-element connection portion 31 of the inter-element connection body 30 to the element is easily performed separately.
 また、実施の形態2においては、本体部32と素子間接続部31とを別の部品から構成しているため、材料及び板厚については適宜選択可能である。素子間接続部31が本体部よりも低抵抗となるようにしてもよい。低抵抗とするためには板厚を厚くするあるいは、比抵抗の小さい材料で形成するのが好ましい。素子間接続体30の素子間接続部31としては、厚み0.2mm、幅1mmから2mm程度の銅の平板を用い、素子間接続体30の本体部32としては厚み0.02mm、素子と同程度の大きさの銅の箔をスリットS形状に打ち抜いたものを用いることができる。 Further, in the second embodiment, since the main body 32 and the inter-element connection portion 31 are configured from different parts, the material and the plate thickness can be appropriately selected. The inter-element connection portion 31 may have a lower resistance than the main body portion. In order to achieve low resistance, it is preferable to increase the plate thickness or to use a material having a small specific resistance. As the inter-element connection portion 31 of the inter-element connection body 30, a copper flat plate having a thickness of 0.2 mm and a width of about 1 mm to 2 mm is used, and the main body portion 32 of the inter-element connection body 30 is 0.02 mm in thickness and the same as the element. It is possible to use a copper foil of a certain size punched into a slit S shape.
 なお、本体部32と素子間接続部31とを同一部材で形成する場合には、切れ目をいれておき、切れ目の部分を起こすことにより、切起こし部を形成し、切り起こしの結果スリットSが形成される。別部材で形成する場合は、切起こし部は切起こして本体部に沿うように成型してもよいし、起立状態としてもよい。 In addition, when forming the main-body part 32 and the inter-element connection part 31 with the same member, a cut part is made and a cut part is formed by raising the part of the cut part. It is formed. In the case of forming with a separate member, the cut-and-raised portion may be cut and raised and molded along the main body portion, or may be in an upright state.
 変形例2.
 以下実施の形態1,2の変形例について説明する。まず、素子電極のパターンとしては、実施の形態1,2いずれの構造においても、図4(a)に示したパターン以外にも適宜変更可能であり、例えば、図15,図16に示すようなパターンとすることができる。つまり、図15,図16に示す素子電極構造の場合は、一方の極性の電流取出し電極15が素子を横断しきらずに、他方の極性の電流取出し電極13が形成される。変形例2の素子電極構造を持つ受光素子の場合、モジュール化する際には、隣接する素子のうちの一方の側の素子間接続体30の素子間接続部31が電流取出し電極15に接続される。そして、隣接する他方の側の素子間接続体30の素子間接続部31が電流取出し電極13及び集電電極14の上を覆う素子間接続体30の本体部32の上に接続される。従って、隣接する2つの素子間接続体30の素子間接続部31が積層されない構造となる。図15,16中の電流取出し電極13部分において、接着層26を介さずに素子間接続体30の本体部32が広い面積で直接的に素子と接続され、一方の極性の電流取出し電極15上に直に素子間接続部31が接続されるため、素子間接続体30と素子電極との密着性を高めることができ、信頼性に優れた受光素子モジュールを得ることができる。また、電流取出し電極13の部分には素子間接続体30の素子間接続部31がなく、電流取出し電極13の部分では素子間接続体30の本体部32が他の線状電極12との接続部と同程度の高さとなるため、実施の形態1と同様に素子間接続体30の本体部32を一部の素子端部の電極上でモジュール裏側方向へ突出するように曲げる必要がなくなる。従って、素子間接続体30の本体部32と素子基板である半導体基板11との間の接続が容易になるという利点を有する。
Modification 2
Hereinafter, modifications of the first and second embodiments will be described. First, the element electrode pattern can be appropriately changed in any of the structures of the first and second embodiments other than the pattern shown in FIG. 4A. For example, as shown in FIGS. It can be a pattern. That is, in the case of the element electrode structure shown in FIGS. 15 and 16, the current extraction electrode 15 of one polarity does not cross the element and the current extraction electrode 13 of the other polarity is formed. In the case of the light receiving element having the element electrode structure of the modified example 2, when the module is formed, the element connection portion 31 of the element connection body 30 on one side of the adjacent elements is connected to the current extraction electrode 15. The The inter-element connection portion 31 of the inter-element connection body 30 on the other adjacent side is connected to the main body portion 32 of the inter-element connection body 30 that covers the current extraction electrode 13 and the current collecting electrode 14. Accordingly, the inter-element connection portions 31 of the two adjacent inter-element connection bodies 30 are not stacked. 15 and 16, the main body portion 32 of the inter-element connector 30 is directly connected to the element in a wide area without the adhesive layer 26, and the current extraction electrode 15 on one polarity Since the inter-element connection portion 31 is directly connected, the adhesion between the inter-element connection body 30 and the element electrode can be improved, and a light receiving element module having excellent reliability can be obtained. Further, there is no inter-element connection portion 31 of the inter-element connection body 30 in the portion of the current extraction electrode 13, and the main body portion 32 of the inter-element connection body 30 is connected to the other linear electrode 12 in the portion of the current extraction electrode 13. Therefore, it is not necessary to bend the main body portion 32 of the inter-element connector 30 so as to protrude toward the back side of the module on the electrodes at the end portions of the elements as in the first embodiment. Therefore, there is an advantage that the connection between the main body portion 32 of the inter-element connector 30 and the semiconductor substrate 11 as the element substrate is facilitated.
 また、上記のいずれの電極パターンにおいても外周部を線状電極12で囲うことで、素子端部の素子間接続体30の本体部32を素子に固定することができるという利点を有するが、接着層26と素子間接続体30の本体部32との間の密着性がよいものを用いる場合はこの限りではなく、集電電極14が最外周に来るようにすることもでき、集電電極14が最外周まで到達することで、素子端部の電荷収集効率を上げることができる。 Further, in any of the electrode patterns described above, the outer peripheral portion is surrounded by the linear electrode 12 so that the main body portion 32 of the inter-element connector 30 at the element end can be fixed to the element. This is not the case when a layer having good adhesion between the layer 26 and the main body portion 32 of the inter-element connector 30 is used, and the current collecting electrode 14 can be arranged on the outermost periphery. Can reach the outermost periphery to increase the charge collection efficiency at the end of the device.
 また、上記のいずれの電極パターンにおいても電流取出し電極15がひとつながりの直線的な形状となっているが、連続的に形成されている必要はなく、例えば島状の電極が離間して断続的に形成されていてもよい。島状の電極が断続的に形成された構造の場合でも、素子間接続体30の素子間接続部31が各島状の電極部分に接続されることによって、離間した各島状電極間の導通をとることができる。島状の電極が断続的に形成された構造の場合、電極材料の使用量を低減することができる。 In any of the above electrode patterns, the current extraction electrode 15 has a continuous linear shape. However, the current extraction electrode 15 does not have to be continuously formed. For example, island-shaped electrodes are separated and intermittent. It may be formed. Even in the case where the island-shaped electrodes are intermittently formed, the inter-element connection portion 31 of the inter-element connector 30 is connected to each island-shaped electrode portion, so that conduction between the island-shaped electrodes separated from each other is achieved. Can be taken. In the case where the island-shaped electrode is intermittently formed, the amount of electrode material used can be reduced.
 変形例3.
 また、素子間接続体30の本体部32は、導電体箔、例えば銅箔をあらかじめプレスして、凹凸形状とすることで、受光素子の素子電極との密着性を良好にしたり、素子の反りを低減することができる。変形例として、図17に斜視図を示すような素子電極に対して斜め、例えば45度の角度をなして交差するような凹部32R、凸部32Pをもつような凹凸形状に成型してもよい。本体部32は、一方の電極の線状電極12及び電流取出し電極とは電気接続体21を通じて導通され、他方の電極の集電電極14とは接着層26によって絶縁される。
Modification 3
Further, the main body portion 32 of the inter-element connection body 30 is formed by pressing a conductive foil, for example, a copper foil in advance so as to have an uneven shape, thereby improving the adhesion with the element electrode of the light receiving element or warping of the element. Can be reduced. As a modification, it may be formed into a concave-convex shape having a concave portion 32R and a convex portion 32P that intersect with the element electrode as shown in a perspective view in FIG. 17 at an angle, for example, 45 degrees. . The main body 32 is electrically connected to the linear electrode 12 and the current extraction electrode of one electrode through the electric connection body 21, and is insulated from the current collecting electrode 14 of the other electrode by the adhesive layer 26.
 上記構成の他にも、一方の線状電極12と対応する部分の本体部32に対して、集電電極14及び電流取出し電極15の部分において、素子間接続体30の本体部32はモジュール受光面側に対して引っ込んだ形状である凹部となり、線状電極12と対応する部分においては、相対的にモジュール受光面側に対して飛び出した形状である凸部としてもよい。 In addition to the above configuration, the main body portion 32 of the inter-element connection body 30 in the portion of the current collecting electrode 14 and the current extraction electrode 15 corresponds to the module light receiving portion with respect to the main body portion 32 corresponding to the one linear electrode 12. A concave portion having a shape recessed with respect to the surface side may be formed, and a convex portion having a shape protruding relatively to the module light-receiving surface side may be provided in a portion corresponding to the linear electrode 12.
 素子間接続体30の本体部32は、図17中の32Pで示される凸部及び32Rで示される凹部を有し、可撓性を有する導電体を用いるのが好ましい。素子間接続体30の本体部32として可撓性を有する導電体を用い、導電体が一部の電気的に接続される領域以外の部分においては受光素子10に直接固定されない構造とする。これにより、受光素子10と接続されていない部分において素子間接続体30の本体部32が変形し、受光素子基板と素子間接続体30の本体部32との間の熱膨張率差によって生じる受光素子10の変形及び受光素子10への応力を緩和することができる。以上のようにして、受光素子10の反りが少なく強度及び長期信頼性及び生産性に優れた素子間接続体付き受光素子10及び受光素子モジュール1を得ることができるという効果を有する。素子間接続体30に対して、接着層26は絶縁層として機能するとともに、受光素子10と素子間接続体30との間を固定するとともに変形可能な層として機能することにより、応力を緩和する層としても機能する。図17に示した構造の他、素子間接続体30の本体部32の凸部のパターンとしては、ストライプ上の凹凸部が交差した形状とすることができる。凹凸部は例えば0.1から5mmピッチで形成することができる。 The body portion 32 of the inter-element connector 30 preferably has a convex portion indicated by 32P and a concave portion indicated by 32R in FIG. 17, and uses a flexible conductor. A flexible conductor is used as the main body portion 32 of the inter-element connector 30, and the conductor is not directly fixed to the light receiving element 10 in a portion other than a part of the electrically connected region. As a result, the main body portion 32 of the inter-element connector 30 is deformed in a portion not connected to the light-receiving element 10, and light reception caused by a difference in thermal expansion coefficient between the light-receiving element substrate and the main body portion 32 of the inter-element connector 30. The deformation of the element 10 and the stress on the light receiving element 10 can be relaxed. As described above, there is an effect that the light receiving element 10 and the light receiving element module 1 with an inter-element connection body that have less warpage of the light receiving element 10 and excellent in strength, long-term reliability, and productivity can be obtained. The adhesive layer 26 functions as an insulating layer for the inter-element connection body 30, and relaxes stress by fixing the space between the light receiving element 10 and the inter-element connection body 30 and functioning as a deformable layer. It also functions as a layer. In addition to the structure shown in FIG. 17, the pattern of the convex portion of the main body portion 32 of the inter-element connector 30 can be a shape in which the concave and convex portions on the stripe intersect. The uneven portions can be formed with a pitch of 0.1 to 5 mm, for example.
 図4(b),図4(c),図4(d)では、素子間接続体30の本体部32の凹凸部については記載を省略しているが実際には実施の形態1において素子間接続体30が凹凸部32R,32Pを有するものを用いるほうが素子の反りが低減でき、好ましい。本体部32を平板状に成型し、受光素子との接合工程で凹凸が形成されるようにしてもよい。また、後述する図19(a)に示すように、素子間接続体30のすべての凸部32P全体が線状電極12と接続されているのが配線抵抗の低減という観点からは、好ましい。しかしながら、素子間接続体30のすべての凸部32P全体が線状電極12と接続されている必要もなく、少なくとも素子上のひとつながりの線状電極12に対して一箇所の接続点が生じていればよいため、とる断面によっては線状電極12と素子間接続体30の本体部32の凸部32Pが一対一で対応していない場合がある。 In FIG. 4B, FIG. 4C, and FIG. 4D, the description of the concave and convex portions of the main body portion 32 of the inter-element connector 30 is omitted. It is preferable to use the connection body 30 having the concavo- convex portions 32R and 32P because warpage of the element can be reduced. The main body 32 may be formed into a flat plate shape, and irregularities may be formed in the joining process with the light receiving element. Further, as shown in FIG. 19A described later, it is preferable from the viewpoint of reducing the wiring resistance that all the convex portions 32P of the inter-element connector 30 are connected to the linear electrode 12. However, it is not necessary that all the protrusions 32P of the inter-element connector 30 are connected to the linear electrode 12, and at least one connection point is generated with respect to the continuous linear electrode 12 on the element. Therefore, depending on the cross section taken, the linear electrode 12 and the convex part 32P of the main body part 32 of the inter-element connector 30 may not correspond one-to-one.
 素子間接続体30の本体部32に可撓性をもたせるために、本体部32の厚みを薄くすることで、導電性が低くなる場合がある。本体部32の導電性の低下のため受光素子10から隣接する受光素子10へと電流が流れる際に抵抗損失により光電変換効率が低下する場合、図示しないが素子間接続体30の本体部32の非受光面側に外側部分として導電体を積層することも可能である。本体部32に導電体を積層することによって、外側部分が導電体として働き、素子のモジュール化時の光電変換効率の低下を抑制することができる。 In order to make the main body 32 of the inter-element connector 30 flexible, the conductivity may be lowered by reducing the thickness of the main body 32. When the photoelectric conversion efficiency decreases due to resistance loss when current flows from the light receiving element 10 to the adjacent light receiving element 10 due to a decrease in conductivity of the main body 32, although not shown, the main body 32 of the inter-element connector 30 is not shown. It is also possible to laminate a conductor as an outer portion on the non-light receiving surface side. By laminating the conductor on the main body 32, the outer portion functions as a conductor, and a decrease in photoelectric conversion efficiency when the element is modularized can be suppressed.
 変形例4.
 また、前記実施の形態1,2では、素子間接続部31は1ストリングあたりに2本で構成したが、図18に示すように、4本の素子間接続部31を形成する等、素子間接続部31の本数はもっと多くてもよい。バス電極すなわち電流取出し電極の本数は、多い方が、集電電極14の集電距離が短くなり、集電抵抗が低減できるという利点を有する。また電流取出し効率を上げるためには素子電極間の距離を少数キャリアの拡散長よりも長くする必要があり、バス幅すなわち電流取出し電極幅を半導体素子基板内の少数キャリアの拡散長よりも細くすることが好ましい。従って、1-10Ω・cm程度の比抵抗のn型シリコン基板の場合の電極幅の一例としては1.5mm程度以下が好ましい。また、素子の反りを低減するために、電気接続体21の溶融温度が300℃程度の場合、素子間接続体30の素子間接続部31の厚みも半導体素子基板と同等以下の厚みであることが好ましい。
Modification 4
Further, in the first and second embodiments, the inter-element connection portions 31 are constituted by two per string. However, as shown in FIG. 18, four inter-element connection portions 31 are formed. The number of connection portions 31 may be larger. A larger number of bus electrodes, that is, current extraction electrodes has an advantage that the current collection distance of the current collecting electrode 14 is shortened and the current collecting resistance can be reduced. In order to increase the current extraction efficiency, it is necessary to make the distance between the device electrodes longer than the minority carrier diffusion length, and make the bus width, that is, the current extraction electrode width narrower than the minority carrier diffusion length in the semiconductor element substrate. It is preferable. Accordingly, an example of the electrode width in the case of an n-type silicon substrate having a specific resistance of about 1-10 Ω · cm is preferably about 1.5 mm or less. Further, in order to reduce the warpage of the element, when the melting temperature of the electrical connection body 21 is about 300 ° C., the thickness of the inter-element connection portion 31 of the inter-element connection body 30 is equal to or less than that of the semiconductor element substrate. Is preferred.
 また、本変形例では素子間接続体30の本体部32と、受光素子10の線状電極12とは、電気接続体21で接続され、素子間接続体30の素子間接続部31と素子間接続体30の素子裏部分である本体部32、及び、素子間接続体30の素子間接続部31、電流取出し電極15とは電気接続体33によって接続される。図18では素子間接続体21,33の図示を省略している。素子間を接続してストリングを形成するために加熱あるいは接着する際に素子電極と素子間接続体の素子間接続部31が外れないように、電気接続体21及び33の溶融温度あるいは接着温度は異なっていてもよい。素子間を接続してストリングを形成するために加熱する際に素子電極と本体部32が素子電極から外れないようにするためには、素子間接続部31と電流取出し電極15とを接続する電気接続体33のほうが溶融温度あるいは接着温度が低くなるようにする。電気接続体33としては、錫銀はんだ、錫ビスマスはんだ、導電性接着剤等の導電性の接続部材を用いることができる。上記電気接続体33の材料としては、電気接続体部分を形成する際に必要な温度が低いほうが、接続体接合後に室温まで温度を下げた際の受光素子及び素子間接続体30の素子裏部分である本体部32への応力が低下し、したがって、受光素子10の反りが少なく強度及び長期信頼性に優れた受光素子モジュールを得ることができ、より好ましい。なお、上記電気接続体が使用される場所と溶融温度の高低の組み合わせは製造の順番に従って上記とは逆にしてもよい。 Further, in this modification, the main body portion 32 of the inter-element connection body 30 and the linear electrode 12 of the light receiving element 10 are connected by the electrical connection body 21, and the inter-element connection section 31 of the inter-element connection body 30 and the inter-element connection. The main body portion 32 that is the element back portion of the connection body 30, the inter-element connection portion 31 of the inter-element connection body 30, and the current extraction electrode 15 are connected by an electric connection body 33. In FIG. 18, the inter-element connectors 21 and 33 are not shown. The melting temperature or bonding temperature of the electrical connecting members 21 and 33 is set so that the inter-element connecting portion 31 between the element electrode and the inter-element connecting body does not come off during heating or bonding to connect the elements to form a string. May be different. In order to prevent the element electrode and the main body part 32 from being detached from the element electrode when heating is performed to connect the elements to form a string, the electric connection for connecting the element connection part 31 and the current extraction electrode 15 is performed. The connecting body 33 has a lower melting temperature or bonding temperature. As the electrical connection body 33, a conductive connection member such as tin-silver solder, tin bismuth solder, or a conductive adhesive can be used. As the material of the electrical connection body 33, the lower the temperature required for forming the electrical connection body part, the light receiving element when the temperature is lowered to room temperature after joining the connection body and the element back part of the inter-element connection body 30 The stress to the main body 32 is reduced, and therefore a light receiving element module with less warpage of the light receiving element 10 and excellent strength and long-term reliability can be obtained, which is more preferable. Note that the combination of the location where the electrical connection body is used and the melting temperature may be reversed according to the order of manufacture.
 なお、前述したように、図3,4(a),7(a),7(b),7(c),11,15,16,18において線状電極12、集電電極14、接着層26はX方向に10本程度しか記載されていないが、上記図面は模式的に記載された図であり、電極本数は実際のものとは異なる場合もある。 As described above, in FIGS. 3 and 4 (a), 7 (a), 7 (b), 7 (c), 11, 15, 16, and 18, the linear electrode 12, the current collecting electrode 14, and the adhesive layer are used. Although only about 10 are described in the X direction, 26 is a diagram schematically described, and the number of electrodes may be different from the actual one.
 実施の形態3.
 次に、本発明の実施の形態3として、素子間接続体付き受光素子の他の例について説明する。本実施の形態1,2及びその変形例で用いられる受光素子としては、ヘテロ接合受光素子以外にも不純物ドーピングにより接合を形成した受光素子でもよい。上記受光素子の構造としては図19(a)~図19(c)に示すような受光素子を用いることができる。基板の受光面側にテクスチャと呼ばれる凹凸を有しているのが好ましいが、本実施の形態の図19(a)~図19(c)では基板の凹凸を省略して記載している。図19(a)は、本実施の形態の素子間接続体付き受光素子の断面図であり、図19(b)は、図19(a)の部分Aの拡大断面図であり、図19(c)は、図19(a)の部分Bの拡大断面図である。
Embodiment 3 FIG.
Next, as a third embodiment of the present invention, another example of a light receiving element with an inter-element connector will be described. As a light receiving element used in the first and second embodiments and the modification thereof, a light receiving element having a junction formed by impurity doping may be used in addition to the heterojunction light receiving element. As the structure of the light receiving element, a light receiving element as shown in FIGS. 19A to 19C can be used. Although it is preferable to have unevenness called texture on the light receiving surface side of the substrate, the unevenness of the substrate is omitted in FIGS. 19A to 19C of this embodiment. 19A is a cross-sectional view of a light receiving element with an inter-element connection body according to the present embodiment, and FIG. 19B is an enlarged cross-sectional view of a portion A in FIG. 19A. c) is an enlarged sectional view of a portion B in FIG.
 本実施の形態の素子間接続体付き受光素子10は、第1の素子電極である線状電極12と、第2の素子電極である集電電極14とが第1パッシベーション膜18aに形成された第1の開口部12h、第2の開口部14hにおいて素子基板とコンタクトを形成すると共に、線状電極12が集電電極14よりも突出して、形成されている。そして線状電極12は素子間接続体30の本体部32の凸部32Pで線状電極12に当接し、直接電気的接続を達成する。一方、集電電極14は接着層26を介して本体部32に当接し、機械的接続を達成する。図19(a)~図19(c)に示す断面では素子間接続部31が見えないが、実施の形態1において図9に示したのと同様に素子間接続部31は電流取出し電極15に当接して接続される。半導体基板11としては、単結晶n型シリコン基板が用いられ、半導体基板11の受光面には表面電界層17Sとしてリン拡散によって形成されたn型拡散層である、n型ドープ領域17を有する。そして、表面側の反射防止膜を兼ねた第2パッシベーション膜18bとして酸化シリコン膜、第2パッシベーション膜18bに積層して、アモルファスシリコン窒化膜からなる第3パッシベーション膜18cが形成されている。裏面側には、素子電極の正極と負極に対応する部分の基板内に、リン拡散によって形成されたとボロン拡散によって形成されたp型ドープ領域16とを有する。そして、素子電極と素子基板との接続点を除き、n型ドープ領域17及びp型ドープ領域16の表面を含むほぼ全面が第1パッシベーション膜18aで覆われている。第1パッシベーション膜18aとしてはシリコン酸化膜及びアモルファスシリコン窒化膜の積層体が用いられる。n型ドープ領域17とp型ドープ領域16の一部においては第1パッシベーション膜18aに第1の開口部12h、第2の開口部14hが形成され、金属電極がn型ドープ領域17とp型ドープ領域16と接触することにより基板から電流を取り出す役割を果たす。 In the light receiving element 10 with the inter-element connection body of the present embodiment, a linear electrode 12 as a first element electrode and a collecting electrode 14 as a second element electrode are formed on the first passivation film 18a. A contact with the element substrate is formed in the first opening 12h and the second opening 14h, and the linear electrode 12 is formed so as to protrude from the collecting electrode 14. And the linear electrode 12 contact | abuts to the linear electrode 12 in the convex part 32P of the main-body part 32 of the inter-element connection body 30, and achieves an electrical connection directly. On the other hand, the current collecting electrode 14 abuts on the main body 32 through the adhesive layer 26 to achieve mechanical connection. In the cross sections shown in FIGS. 19A to 19C, the inter-element connection portion 31 cannot be seen, but the inter-element connection portion 31 is connected to the current extraction electrode 15 in the same manner as shown in FIG. Abutting and connected. As the semiconductor substrate 11, a single crystal n-type silicon substrate is used, and the light receiving surface of the semiconductor substrate 11 has an n-type doped region 17 which is an n-type diffusion layer formed by phosphorus diffusion as a surface electric field layer 17S. A third passivation film 18c made of an amorphous silicon nitride film is formed by laminating a silicon oxide film and the second passivation film 18b as the second passivation film 18b that also serves as an antireflection film on the surface side. On the back surface side, a p-type doped region 16 formed by phosphorus diffusion and p-type doped region 16 is formed in a portion of the substrate corresponding to the positive electrode and negative electrode of the element electrode. Except for the connection point between the device electrode and the device substrate, almost the entire surface including the surfaces of the n-type doped region 17 and the p-type doped region 16 is covered with the first passivation film 18a. As the first passivation film 18a, a stacked body of a silicon oxide film and an amorphous silicon nitride film is used. In part of the n-type doped region 17 and the p-type doped region 16, the first opening 12h and the second opening 14h are formed in the first passivation film 18a, and the metal electrode is connected to the n-type doped region 17 and the p-type. The contact with the doped region 16 serves to extract current from the substrate.
 なお、図19(a)~図19(c)に示した受光素子では負極と正極の第1及び第2の開口部12h,14hが同一断面上にあるが、実際は、各開口部間のピッチが異なるため、素子断面により正極と負極の開口部が形成されているとは限らない。また、素子間接続体30の本体部32が有する凹凸に関しても電極ピッチと同じ間隔で形成されていなくてもよい。また、素子間接続体30のすべての凸部32Pが素子電極と接続されていなければならないわけではなく、素子上のひとつながりの線状電極12に対して一箇所の接続点が生じていればよい。 In the light receiving element shown in FIGS. 19 (a) to 19 (c), the first and second openings 12h and 14h of the negative electrode and the positive electrode are on the same cross section, but the pitch between the openings is actually different. Therefore, the openings of the positive electrode and the negative electrode are not always formed depending on the element cross section. Further, the unevenness of the main body 32 of the inter-element connector 30 may not be formed at the same interval as the electrode pitch. Further, not all the protrusions 32P of the inter-element connector 30 need to be connected to the element electrodes, and if one connection point is generated with respect to the continuous linear electrode 12 on the element. Good.
 線状電極12、集電電極14及び電流取出し電極15等の電極が図19(a)~図19(c)に示すように多層膜で形成される。ここでは、一方の極性の電極部分、例えば集電電極14、集電電極14の電流取出し電極15が形成される部分にp型ドープ領域16、他方の極性の電極部分である線状電極12にn型ドープ領域17が形成されている。素子電極である線状電極12は、図19(c)に示すように、負極第1層12a、負極第2層12b、負極第3層12c、負極第4層12dの4層構造で構成される。また集電電極14、電流取出し電極15としては、図19(b)に示すように、正極第1層14a、正極第2層14b、正極第3層14cの3層構造で構成される。正極、負極のいずれも接触抵抗が小さく反射率の高いアルミニウムが基板上に直接形成され、アルミニウムの上にチタンタングステン(TiW)、銅、銀、錫等が積層形成される。以上のように正極、負極のいずれも反射率の高いアルミニウムが基板上に直接形成されていることで、反射性が極めて良好なものとなっている。実際の製造では、例えば、反射層として40nm程度のアルミニウムを蒸着等により素子の裏面に形成しておき、3%程度の水素を含む窒素ガス雰囲気下で400℃程度に加熱することによりアルミニウムとシリコン基板との間の接触抵抗を低下させることができる。そして、アルミニウム層の上から蒸着、電気めっき等の薄膜形成により他の金属電極を積層して電極を作成していくことができる。 Electrodes such as the linear electrode 12, the collecting electrode 14 and the current extraction electrode 15 are formed of a multilayer film as shown in FIGS. 19 (a) to 19 (c). Here, the p-type doped region 16 is formed on the electrode portion of one polarity, for example, the portion where the current extraction electrode 15 of the collecting electrode 14 and the collecting electrode 14 is formed, and the linear electrode 12 which is the other polarity electrode portion. An n-type doped region 17 is formed. As shown in FIG. 19C, the linear electrode 12 that is an element electrode has a four-layer structure of a negative electrode first layer 12a, a negative electrode second layer 12b, a negative electrode third layer 12c, and a negative electrode fourth layer 12d. The Further, as shown in FIG. 19B, the current collecting electrode 14 and the current extraction electrode 15 have a three-layer structure of a positive electrode first layer 14a, a positive electrode second layer 14b, and a positive electrode third layer 14c. In both the positive electrode and the negative electrode, aluminum having low contact resistance and high reflectivity is directly formed on the substrate, and titanium tungsten (TiW), copper, silver, tin, or the like is laminated on the aluminum. As described above, both the positive electrode and the negative electrode are formed with aluminum having high reflectivity directly on the substrate, so that the reflectivity is extremely good. In actual manufacturing, for example, aluminum of about 40 nm is formed on the back surface of the element as a reflective layer by vapor deposition or the like, and heated to about 400 ° C. in a nitrogen gas atmosphere containing about 3% of hydrogen to form aluminum and silicon. The contact resistance with the substrate can be reduced. And an electrode can be created by laminating other metal electrodes on the aluminum layer by thin film formation such as vapor deposition and electroplating.
 電極として本実施の形態3では線状電極12を負極とし、集電電極14及び電流取出し電極15を正極とする。負極はn型ドープ領域17と接続するとともに正極はp型ドープ領域16と接続する。図19(a)~図19(c)ではp型ドープ領域16の幅がn型ドープ領域17の幅よりも大きい。実施の形態1でも説明したように、p型ドープ領域16とn型ドープ領域17に対する表面パッシベーションの効果が同等である場合は、pn接合の面積がn+n接合の面積よりも大きい方が、光生成キャリアがpn接合にたどり着き、発電に寄与する割合が高くなるという効果があるが、パッシベーション膜の組み合わせによってはこの逆でもよい。例えば、SiO2のようにp層に対するパッシベーション能力の低い材料がパッシベーション膜として使用されている場合は、p型ドープ領域の面積が小さいほうがよい場合がある。p型ドープ領域16の面積が小さいほうがよい場合はp型ドープ領域16を線状電極12側にしてもよい。 In the third embodiment, the linear electrode 12 is a negative electrode, and the current collecting electrode 14 and the current extraction electrode 15 are positive electrodes. The negative electrode is connected to n-type doped region 17 and the positive electrode is connected to p-type doped region 16. In FIG. 19A to FIG. 19C, the width of the p-type doped region 16 is larger than the width of the n-type doped region 17. As described in the first embodiment, when the surface passivation effect on the p-type doped region 16 and the n-type doped region 17 is the same, the area of the pn junction is larger than the area of the n + n junction, Although the photogenerated carrier reaches the pn junction and contributes to the power generation, there is an effect that the reverse may be possible depending on the combination of the passivation films. For example, when a material having a low passivation ability for the p layer, such as SiO 2 , is used as the passivation film, the area of the p-type doped region may be preferably small. When the area of the p-type doped region 16 is preferably small, the p-type doped region 16 may be on the linear electrode 12 side.
 上記素子に形成される素子電極は、素子の同一面に正極と負極を有するため、正と負の電極間の絶縁を確実にする構造をとることが好ましい。正と負の電極間の絶縁を確実にするために、図19(a)に示す素子電極の主に集電電極14上は、絶縁層である接着層26で覆われ、線状電極12と絶縁される。絶縁層としては気体を含む空隙等を含んでもよいが、本実施の形態3では、線状電極12の大部分は外部に露出し主に集電電極14を覆うように接着層26を形成し、モジュール状態では図19(a)に示すように、主に集電電極14と素子間接続体30の本体部32との間を絶縁するとともに、線状電極12の大部分は素子間接続体30の本体部32と接続された状態にする。図には記載されていないが、電流取出し電極15に素子間接続部31を接続した後に、素子間接続部31の上及び、電流取出し電極15の端部の一部のみを除き、図9あるいは図13に示すように接着層26を形成する。接着層26を形成する際、接着層26は線状電極12の上に一部重なってもよい。また、本体部32にスリットSを有する場合は、接着層26で素子間接続部31を覆わなくてもよい。 Since the element electrode formed in the element has a positive electrode and a negative electrode on the same surface of the element, it is preferable to take a structure that ensures insulation between the positive and negative electrodes. In order to ensure insulation between the positive and negative electrodes, the current collector electrode 14 of the element electrode shown in FIG. 19A is mainly covered with an adhesive layer 26 which is an insulating layer, and the linear electrode 12 and Insulated. The insulating layer may include a void containing gas, but in the third embodiment, the adhesive layer 26 is formed so that most of the linear electrode 12 is exposed to the outside and mainly covers the collecting electrode 14. In the module state, as shown in FIG. 19A, the current collecting electrode 14 and the body portion 32 of the inter-element connection body 30 are mainly insulated, and most of the linear electrodes 12 are inter-element connection bodies. The main body unit 32 is connected to the main body unit 30. Although not shown in the figure, after connecting the inter-element connection portion 31 to the current extraction electrode 15, except for the part on the inter-element connection portion 31 and a part of the end of the current extraction electrode 15, FIG. As shown in FIG. 13, the adhesive layer 26 is formed. When forming the adhesive layer 26, the adhesive layer 26 may partially overlap the linear electrode 12. Further, when the main body portion 32 has the slit S, the inter-element connection portion 31 may not be covered with the adhesive layer 26.
 接着層26の形成に際しては、いったん本体部32と半導体基板11との間で予定されるギャップよりも厚く接着層26を形成しておき、形成後に本体部32を半導体基板11に押しつけて接着層26を横方向に広げる方法を用いることができる。上記方法の場合、本体部32を圧着する前に形成される接着層26の幅は線状電極12間の離間距離より細く形成される。接着層26は同一基板上の素子電極間のみならず、素子間接続体30と素子電極の間も絶縁する機能を有し、実施の形態1と同様に本実施の形態3では素子間接続体30の本体部32と、素子間接続体30の素子間接続部31及び電流取出し電極15の素子端部との間を絶縁する機能も有する。また、受光素子10の集電電極14と素子間接続体30の本体部32との間の絶縁性を高める機能を有する。 When forming the adhesive layer 26, the adhesive layer 26 is once formed thicker than a predetermined gap between the main body portion 32 and the semiconductor substrate 11, and after the formation, the main body portion 32 is pressed against the semiconductor substrate 11. A method of spreading 26 in the lateral direction can be used. In the case of the above method, the width of the adhesive layer 26 formed before the main body portion 32 is crimped is formed to be narrower than the distance between the linear electrodes 12. The adhesive layer 26 has a function of insulating not only between the element electrodes on the same substrate but also between the inter-element connection body 30 and the element electrode. In the third embodiment, the inter-element connection body is the same as in the first embodiment. 30 also has a function of insulating between the main body portion 32 of the device, the inter-element connection portion 31 of the inter-element connection body 30, and the element end portion of the current extraction electrode 15. Further, it has a function of improving the insulation between the current collecting electrode 14 of the light receiving element 10 and the main body 32 of the inter-element connector 30.
 以上のように本実施の形態3では、実施の形態1と同様、素子間接続体30の本体部32と受光素子基板である半導体基板11との間に接着層26が挟まれる構造である。従って、接着層26の熱膨張率を半導体基板11と素子間接続体30との中間値とすることにより、半導体基板11と素子間接続体30の本体部32との間での膨張係数差によって生じる反りあるいは応力を接着層26において緩和することができるという利点を有する。また、素子間接続体30の本体部32は平坦ではなく凹凸構造を有しており、凹凸部が変形することによっても膨張係数差によって素子に生じる反りあるいは応力を接着層26において緩和することができるという利点を有する。当該素子間接続体30の本体部32の凹凸構造のパターンとしては図17に示したもの、ストライプ上の凹凸部が交差した形状等を用いることができる。従って、本実施の形態3の受光素子10は、素子間接続体30の本体部32として素子裏に直に電極層が形成されるよりも厚みのある部材を使用することができるため、集電抵抗の小さい受光素子とすることができるという利点を有する。特に素子面積が大きい素子において効果が大きい。また、素子基板と素子間接続体30の膨張係数の違いを緩和するため、素子間接続体30は銅を張り合わせたインバー、コバール等の、膨脹係数が半導体基板と近い金属等の板状導体を用いるあるいは、樹脂中に金属粒子を有するもの等の柔らかい材料を用いることもできる。 As described above, in the third embodiment, as in the first embodiment, the adhesive layer 26 is sandwiched between the main body portion 32 of the inter-element connector 30 and the semiconductor substrate 11 that is the light receiving element substrate. Therefore, by setting the thermal expansion coefficient of the adhesive layer 26 to an intermediate value between the semiconductor substrate 11 and the inter-element connection body 30, the expansion coefficient difference between the semiconductor substrate 11 and the main body portion 32 of the inter-element connection body 30 is caused. The resulting warp or stress can be relaxed in the adhesive layer 26. Further, the main body portion 32 of the inter-element connector 30 is not flat but has a concavo-convex structure, and even if the concavo-convex portion is deformed, warping or stress generated in the device due to a difference in expansion coefficient can be reduced in the adhesive layer 26. It has the advantage of being able to. As the pattern of the concavo-convex structure of the main body portion 32 of the inter-element connector 30, the pattern shown in FIG. 17, the shape where the concavo-convex portions on the stripe intersect, or the like can be used. Therefore, the light receiving element 10 according to the third embodiment can use a member having a thickness larger than that in which the electrode layer is formed directly on the back of the element as the main body portion 32 of the inter-element connector 30. It has the advantage that it can be set as a light receiving element with low resistance. The effect is particularly great in an element having a large element area. Further, in order to alleviate the difference in expansion coefficient between the element substrate and the inter-element connector 30, the inter-element connector 30 is made of a plate-like conductor such as a metal having an expansion coefficient close to that of the semiconductor substrate, such as Invar or Kovar bonded with copper. Alternatively, a soft material such as one having metal particles in the resin can be used.
 以上のように、集電電極14と素子間接続体30の本体部32との間、電流取出し電極15と素子間接続体30の本体部32との間、集電電極14と線状電極12との間を絶縁するために、素子間接続体30の本体部32と受光素子10上の電極との間のはんだ付けされている部分以外の部分は接着層26によって絶縁される。接着層26としては、具体的にはエチレンビニルアセテート、ポリイミドあるいはフィラーを含むエポキシ等の樹脂等やガラスフリット、CVDで成膜されたSiO2膜、シリコン窒化膜等の無機膜あるいは樹脂と無機粒子の複合体等を用いることができる。ただし、受光素子10を透過した光を素子間接続体30で反射させて再度受光素子10に入射させるために、できる限り光の吸収がないものを用いることが好ましい。また、フィラーは熱膨張係数を受光素子に近づけるための調整剤としても用いられる。 As described above, between the current collecting electrode 14 and the main body portion 32 of the inter-element connector 30, between the current extraction electrode 15 and the main body portion 32 of the inter-element connector 30, the current collecting electrode 14 and the linear electrode 12. In order to insulate between the two, a portion other than the soldered portion between the main body portion 32 of the inter-element connector 30 and the electrode on the light receiving element 10 is insulated by the adhesive layer 26. Specifically, the adhesive layer 26 is made of resin such as ethylene vinyl acetate, polyimide or epoxy containing filler, glass frit, SiO 2 film formed by CVD, silicon nitride film or other inorganic film or resin and inorganic particles. A complex of the above can be used. However, in order to reflect the light transmitted through the light receiving element 10 by the inter-element connector 30 and to enter the light receiving element 10 again, it is preferable to use light that does not absorb light as much as possible. The filler is also used as a regulator for bringing the thermal expansion coefficient closer to the light receiving element.
 素子間接続体30の本体部32は、例えば導電体箔からなり、例えば一方の面に錫銀はんだを形成しておきプレス加工、簡易的な型を用いた加工であるトムソン加工等により、素子間接続体30の本体部32及び素子間接続部31を別々に、あるいは一体的に形成することができる。また、あらかじめ図19(a)のような凹凸形状を有していてもよく、例えば銅箔をあらかじめプレス加工等の加工により凹凸をもたせておけばよい。また、素子間接続体30の本体部32は可撓性を有することが好ましい。 The main body portion 32 of the inter-element connection body 30 is made of, for example, a conductive foil. For example, a tin-silver solder is formed on one surface and press processing, Thomson processing that is processing using a simple die, or the like is performed. The main body portion 32 and the inter-element connection portion 31 of the inter-connection body 30 can be formed separately or integrally. Moreover, you may have an uneven | corrugated shape like Fig.19 (a) beforehand, for example, what is necessary is just to give an unevenness | corrugation to copper foil previously by processes, such as press work. Moreover, it is preferable that the main-body part 32 of the inter-element connection body 30 has flexibility.
 素子間接続体30の本体部32の厚さとして、例えば0.001~1.0mmとする。形成されている凹凸の高低差は例えば0.01~0.5mm程度とすることができる。また、素子間接続体30で接続される隣接する2つの受光素子10は若干の間隔を開けて配置され、隙間部分では素子間接続部31、受光素子10の受光面、裏面側主面材25とで受光面側からの見え方が異なる。従って、必要であれば隙間部分だけ素子間接続部31の受光面側に塗料を塗布する、あるいは遮光テープを貼る等の方法により、隙間部分の外観を他の裏面側主面材25部分とほぼ同じにすることができる。 The thickness of the main body 32 of the inter-element connector 30 is, for example, 0.001 to 1.0 mm. The height difference of the formed irregularities can be set to about 0.01 to 0.5 mm, for example. Further, two adjacent light receiving elements 10 connected by the inter-element connector 30 are arranged with a slight gap therebetween, and in the gap portion, the inter-element connection portion 31, the light receiving surface of the light receiving element 10, and the back side main surface material 25. And how it looks from the light receiving surface side is different. Therefore, if necessary, the outer appearance of the gap portion is substantially the same as that of the other back side main surface material 25 portion by applying a paint to the light receiving surface side of the inter-element connection portion 31 or attaching a light shielding tape. Can be the same.
 素子間接続体30の素子間接続部31は、一方の端が受光素子10の裏面に形成された電流取出し電極15と接続され、他方の端は隣接する素子間接続体30の本体部32に接続される。本体部32は上記受光素子10とは別の受光素子10の裏面側に形成された素子上の線状電極12に接続され、隣接する2つの受光素子10間の電気的接続を達成する。素子間接続体30と、受光素子10の電流取出し電極15と別の受光素子の線状電極12とは、電気接続体21、電気接続体33等の導体薄膜で接続される。素子間接続体30の素子間接続部31と素子間接続体30の本体部32とを別の部品から構成し、本体部32と素子間接続部31とを接続する場合は、本体部32と素子間接続部31との間も電気接続体21あるいは電気接続体33によって接続してもよい。素子間を接続してストリングを形成するために加熱する際に素子電極と素子間接続体30が外れないように、電気接続体21及び33の溶融温度は異なっていてもよい。上記構造の場合製造工程に応じて接続工程が後になる部分の溶融温度あるいは接続温度が低くなるようにするのが好ましい。電気接続体21及び33としては、錫銀はんだ、錫ビスマスはんだ等を用いることができる。電気接続体21の材料としては、電気接続体21部分を形成する際に必要な温度が低いほうが、接続体接合後に室温まで温度を下げた際の受光素子及び素子間接続体30の本体部32への応力が低下し、受光素子の反りが少なく強度及び長期信頼性に優れた受光素子モジュールを得ることができ、好ましいため、電気接続体33も含めて極力低温で形成できる材料を用いることが好ましい。電気接続体21及び33の材料としては、はんだ等の導体薄膜以外にも金属粒子あるいは樹脂材料を含有する導電性樹脂等を用いることができる。 One end of the inter-element connection portion 31 of the inter-element connection body 30 is connected to the current extraction electrode 15 formed on the back surface of the light receiving element 10, and the other end is connected to the main body portion 32 of the adjacent inter-element connection body 30. Connected. The main body 32 is connected to the linear electrode 12 on the element formed on the back surface side of the light receiving element 10 different from the light receiving element 10 and achieves electrical connection between two adjacent light receiving elements 10. The inter-element connection body 30, the current extraction electrode 15 of the light receiving element 10 and the linear electrode 12 of another light receiving element are connected by a conductive thin film such as the electrical connection body 21 and the electrical connection body 33. When the inter-element connection portion 31 of the inter-element connection body 30 and the main body portion 32 of the inter-element connection body 30 are configured from different parts, and the main body portion 32 and the inter-element connection portion 31 are connected, The inter-element connection portion 31 may also be connected by the electrical connection body 21 or the electrical connection body 33. The melting temperatures of the electrical connection bodies 21 and 33 may be different so that the element electrodes and the inter-element connection bodies 30 do not come off during heating to connect the elements to form a string. In the case of the above-described structure, it is preferable that the melting temperature or the connection temperature at the portion where the connection process is performed later is lowered according to the manufacturing process. As the electrical connectors 21 and 33, tin silver solder, tin bismuth solder, or the like can be used. As the material of the electrical connection body 21, the lower the temperature required for forming the electrical connection body 21 portion, the light receiving element when the temperature is lowered to room temperature after joining the connection body and the body portion 32 of the inter-element connection body 30. Therefore, it is preferable to use a material that can be formed at the lowest possible temperature including the electrical connection body 33 because it is preferable to obtain a light receiving element module that has less warpage of the light receiving element and is excellent in strength and long-term reliability. preferable. As a material for the electrical connectors 21 and 33, a conductive resin containing metal particles or a resin material can be used in addition to a conductive thin film such as solder.
 線状電極12と素子間接続体30とを電気的に接続する電気接続体21は、素子間接続体30の素子間接続部31の全面と素子間接続体30の本体部32の素子側の面を広く覆っていてもよいが、例えば素子電極付きの素子を溶融はんだ槽に浸漬して後述する図20に示すように、自己整合的に集電電極14、電流取出し電極15及び線状電極12等の素子電極上の素子間接続体30との接続部分だけにはんだ層を形成してもよい。接続部分だけに選択的にはんだ層を形成する場合、電極上に電気接続体21が存在し、本体部32上に形成される電気接続体21が無くてもよいため、電気接続体21を含めた本体部32の厚みが薄くて済むため、素子と素子間接続体30との熱膨張係数差による反り及び応力を低減できるという利点を有する。また、図21に示すようにはんだめっき層からなる電気接続体21が本体部32の素子側の面全体を覆っており、かつ受光素子10の光吸収係数が小さい波長領域における電気接続体21の光反射率が高くない場合は、接着層26に二酸化チタン粒子等の光反射体あるいは散乱体を含ませて光を反射させることが好ましい。光反射体としては粒子のみでなく、誘電体積層膜、例えばSiO2とTiO2を積層させた誘電体多層膜等の反射膜を素子裏に成膜したものを使用することができる。なお、受光素子10の光吸収係数が小さい領域とは、例えば受光素子がシリコンからなり、200マイクロメートル程度の厚みの基板を用いた場合、おおよそ900nmから1300nmの波長領域である。基板の厚みが数十マクロメートル程度まで薄い場合は、より短波長側の波長領域でも素子裏面側の材料の反射率が高いことが好ましい。 The electrical connection body 21 that electrically connects the linear electrode 12 and the inter-element connection body 30 is provided on the entire surface of the inter-element connection portion 31 of the inter-element connection body 30 and the element side of the main body portion 32 of the inter-element connection body 30. Although the surface may be covered widely, for example, as shown in FIG. 20 which will be described later by immersing an element with an element electrode in a molten solder bath, the current collecting electrode 14, the current extraction electrode 15 and the linear electrode are self-aligned. You may form a solder layer only in the connection part with the connection body 30 between elements on 12 element electrodes. In the case where the solder layer is selectively formed only on the connection portion, the electrical connection body 21 exists on the electrode and the electrical connection body 21 formed on the main body portion 32 may be omitted. In addition, since the main body 32 only needs to be thin, there is an advantage that warpage and stress due to a difference in thermal expansion coefficient between the element and the inter-element connector 30 can be reduced. Further, as shown in FIG. 21, the electrical connection body 21 made of a solder plating layer covers the entire surface on the element side of the main body 32, and the electrical connection body 21 in the wavelength region where the light absorption coefficient of the light receiving element 10 is small. When the light reflectance is not high, it is preferable to reflect light by including a light reflector or scatterer such as titanium dioxide particles in the adhesive layer 26. As the light reflector, not only particles but also a dielectric laminated film, for example, a reflective film such as a dielectric multilayer film in which SiO 2 and TiO 2 are laminated can be used on the back of the element. The region where the light absorption coefficient of the light receiving element 10 is small is a wavelength region of approximately 900 nm to 1300 nm when the light receiving element is made of silicon and a substrate having a thickness of about 200 micrometers is used, for example. When the thickness of the substrate is as thin as several tens of micrometers, it is preferable that the reflectance of the material on the back surface side of the element is high even in the shorter wavelength region.
 また、線状電極12、集電電極14等の素子電極は単一の金属層である必要はなく、素子間接続体30の本体部32との接続を担う表面層としてめっきによってニッケル及び錫が銅等の下地層表面に形成されていてもよい。素子電極部分のみではなく素子間接続体30の本体部32もめっきを施して電気接続体21との接続性を向上させてもよい。例として、例えば素子間接続体30の本体部32としてアルミ箔を用い、本体部32の素子電極側の面の表面層としてめっきによってニッケル及び錫が形成され、電気接続体21として錫銀はんだ層が主に素子間接続体30と素子電極との間の部分に形成されたものでもよい。上記以外にも、素子間接続体30の本体部32の凸部のパターンとしては、ストライプ状の凹凸部が交差した形状等とすることができる。 Further, the element electrodes such as the linear electrode 12 and the current collecting electrode 14 do not need to be a single metal layer, and nickel and tin are plated by plating as a surface layer for connection with the main body portion 32 of the inter-element connector 30. It may be formed on the surface of the underlying layer such as copper. Not only the element electrode part but also the main body 32 of the inter-element connector 30 may be plated to improve the connectivity with the electrical connector 21. As an example, for example, an aluminum foil is used as the main body portion 32 of the inter-element connection body 30, nickel and tin are formed by plating as a surface layer on the surface of the main body portion 32 on the element electrode side, and a tin-silver solder layer is formed as the electric connection body 21. May be formed mainly in a portion between the inter-element connector 30 and the element electrode. In addition to the above, the pattern of the convex portions of the main body portion 32 of the inter-element connector 30 may be a shape in which stripe-shaped uneven portions intersect.
 実施の形態3の素子間接続体付き受光素子における、素子電極の更なる変形例として、主に素子電極上にのみ電気接続体21が形成され、一方の素子電極の一部でのみ素子間接続体30の凸部と接続される場合、電極が複数層からなり一層目が反射層として働き当該反射層よりも外側の層が電気伝導を主に担う場合、素子電極を構成する線状電極12と集電電極14の高さが同じ場合をそれぞれ変形例5,6,7として図20~図23に示す。 As a further modification of the element electrode in the light receiving element with the inter-element connection body according to the third embodiment, the electrical connection body 21 is mainly formed only on the element electrode, and the inter-element connection is performed only at a part of one of the element electrodes. When connected to the convex portion of the body 30, the electrode is composed of a plurality of layers, and when the first layer functions as a reflective layer and the layer outside the reflective layer mainly bears electric conduction, the linear electrode 12 constituting the element electrode 20 to 23 are shown as modified examples 5, 6 and 7, respectively, in which the heights of the collector electrode 14 and the collector electrode 14 are the same.
 変形例5.
 図20に示す素子構造では、例えば受光素子を溶融はんだ槽に浸漬させることにより、素子電極である線状電極12、集電電極14の上に電気接続体21としてのはんだ層を自己整合的に形成させたものである。なお、はんだ層を自己整合的に形成する際、一方の極の電極と他方の極の電極を異なる材料としたり、集電電極14の表面だけ無機物で覆われるようにして、一方の電極にのみはんだがつくようにしてもよい。また、電気接続体21としては、はんだ以外にも金属粒子と樹脂の混合物を塗布したもの等を用いてもよい。他部については図4(b)~図4(d)に示した前記実施の形態1と同様であるため説明を省略するが同一部位には同一符号を付した。
Modification 5
In the element structure shown in FIG. 20, for example, by immersing the light receiving element in a molten solder bath, the solder layer as the electrical connection body 21 is self-aligned on the linear electrode 12 and the current collecting electrode 14 that are element electrodes. It is formed. When forming the solder layer in a self-aligning manner, the electrode of one electrode and the electrode of the other electrode are made of different materials, or only the surface of the current collecting electrode 14 is covered with an inorganic material, so that only one electrode is covered. You may make it solder. Moreover, as the electrical connection body 21, what apply | coated the mixture of a metal particle and resin other than solder may be used. The other parts are the same as those in the first embodiment shown in FIGS. 4B to 4D, and thus the description thereof is omitted, but the same parts are denoted by the same reference numerals.
 ただし、本体部32と素子間接続部31とは別の部品から構成され、厚みが異なっていてもよい。はんだを用いた選択めっきにより電気接続体21を形成することにより、主に素子電極がある部分にのみ電気接続体21が形成されるため、反射率の低い電気接続体21を用いても電気接続体21による光の吸収が少なく、素子間接続体30の本体部32で光を反射することができるようになるという利点を有する。 However, the main body portion 32 and the inter-element connection portion 31 may be composed of different parts and may have different thicknesses. By forming the electrical connection body 21 by selective plating using solder, the electrical connection body 21 is formed mainly only in the portion where the element electrode is present. Therefore, even if the electrical connection body 21 having a low reflectance is used, the electrical connection body 21 is electrically connected. Light absorption by the body 21 is small, and there is an advantage that light can be reflected by the main body portion 32 of the inter-element connection body 30.
 また、本変形例のように電流取出し電極15及び線状電極12に電気接続体が形成される場合、本体部32は電気接続体21を有しなくても良く、広い面積を有する本体部32の全体に電気接続体21を形成しなくて良くなる。一般的に、例えば太陽電池には導電率の高い金属として希少性の高い銀電極が素子電極によく使用されるが、本実施の形態によれば素子間接続体30が導電を担うため素子電極に使用する金属量を減らすことができる。従って、太陽電池を製造する際に使用するに銀の量を減らすことができ、省資源、低コスト化することができるという利点を有する。 Further, when the electrical connection body is formed on the current extraction electrode 15 and the linear electrode 12 as in this modification, the main body portion 32 does not have to have the electrical connection body 21 and the main body portion 32 having a large area. It is not necessary to form the electrical connection body 21 in the whole. In general, for example, a silver electrode having a high rarity as a metal having high conductivity is often used as a device electrode in a solar cell. However, according to the present embodiment, since the inter-element connection body 30 is responsible for conductivity, the device electrode Can reduce the amount of metal used. Therefore, there is an advantage that the amount of silver can be reduced for use in manufacturing a solar cell, and resource saving and cost reduction can be achieved.
 また、電気接続体21は用いなくても良く、例えば素子間接続体30の本体部32として低融点金属等を用いて素子間接続体30自身を溶融させることにより電気接続体21及び第2の電気接続体33の代わりとしてもよい。 Further, the electrical connection body 21 may not be used. For example, the electrical connection body 21 and the second connection body 30 are melted by using a low melting point metal or the like as the main body portion 32 of the inter-element connection body 30. The electrical connection body 33 may be used instead.
 なお、さらなる変形例として、反射率の高い電気接続体21を用いる場合には図21に示すように、本体部32全面にはんだ層からなる電気接続体21を形成してもよい。また、図21に示すように素子間接続体30上の凹凸構造の大きさについても素子電極よりも大きくてもよい。また、凹凸構造のピッチについても素子電極のピッチよりも広くてよい。また図21において、本体部の凹凸構造の受光面側へ凹となる部分の幅が、第1の素子電極である線状電極12の幅よりも狭いことで、位置合わせなしに容易に接続することができる。受光面側へ凹となる部分の最も広い部分の幅が、第1の素子電極である線状電極12の幅よりも狭くなるようにすることで、線状電極12が凹部に入り込むのを防ぐことができる。本体部の凹凸構造の受光面側へ凸となる部分の、断面の幅が、第1の素子電極間の間隙よりも広くすることで、位置合わせなしに確実に接続することができる。 As a further modification, when using the electrical connector 21 having a high reflectivity, the electrical connector 21 made of a solder layer may be formed on the entire surface of the main body 32 as shown in FIG. Further, as shown in FIG. 21, the size of the uneven structure on the inter-element connector 30 may be larger than that of the element electrode. Further, the pitch of the concavo-convex structure may be wider than the pitch of the element electrodes. Further, in FIG. 21, the width of the concave portion of the main body of the concavo-convex structure toward the light receiving surface is narrower than the width of the linear electrode 12 that is the first element electrode, so that the connection can be easily made without alignment. be able to. The width of the widest portion that is concave toward the light receiving surface is made narrower than the width of the linear electrode 12 that is the first element electrode, thereby preventing the linear electrode 12 from entering the concave portion. be able to. By making the width of the cross section of the convex portion of the concavo-convex structure of the main body portion to the light receiving surface side wider than the gap between the first element electrodes, it is possible to reliably connect without alignment.
 変形例6.
 図22に示す素子構造では、例えば真空蒸着により反射率の高いアルミニウム層からなる反射層52が全面に直接形成され、反射層52上にチタンタングステンがスパッタ蒸着等により積層して形成され、はんだ付けの行い易い銅がチタンタングステンの上に形成されており、反射体である反射層52と電気導電体である線状電極12、集電電極14を分けて形成している。他部については図4(b)~図4(d)に示した前記実施の形態1と同様であるため説明を省略するが同一部位には同一符号を付した。これにより、反射性が高い一方ではんだ付けが容易な電極構造を形成することができるという利点を有する。また、銀等の貴金属の使用量を減らすことができる。なお反射層52は半導体基板11の全面に形成されるのが好ましいが、おおむね全面わたって形成されればよい。
Modification 6
In the element structure shown in FIG. 22, a reflective layer 52 made of an aluminum layer having a high reflectivity is directly formed on the entire surface by, for example, vacuum deposition, and titanium tungsten is laminated on the reflective layer 52 by sputtering deposition or the like, and soldered. Copper which is easy to perform is formed on titanium tungsten, and the reflective layer 52 which is a reflector, the linear electrode 12 which is an electric conductor, and the current collecting electrode 14 are separately formed. The other parts are the same as those in the first embodiment shown in FIGS. 4B to 4D, and thus the description thereof is omitted, but the same parts are denoted by the same reference numerals. This has the advantage that an electrode structure that is highly reflective but easy to solder can be formed. Moreover, the usage-amount of noble metals, such as silver, can be reduced. The reflective layer 52 is preferably formed over the entire surface of the semiconductor substrate 11, but it may be formed over the entire surface.
 変形例7.
 図23に示す素子構造では、一方の極と他方の極の素子電極の高さが同じであるが、一方の電極がある部分で素子間接続体30の本体部32の凸部32Pが位置合わせされて存在するため、素子間接続体30は素子上の一方の電極にのみ接続されるようにしている。他部については図4(b)~図4(d)に示した前記実施の形態1と同様であるため説明を省略するが同一部位には同一符号を付した。かかる構成によれば、素子電極の高さが一定であるため、素子を製造する工程が簡易化可能であるが、一方で素子と素子間接続体30の間で位置合わせが必要となる。
Modification 7
In the element structure shown in FIG. 23, the heights of the element electrodes of one pole and the other pole are the same, but the protrusion 32P of the main body part 32 of the inter-element connector 30 is aligned at the part where one electrode is present. Therefore, the inter-element connector 30 is connected to only one electrode on the element. The other parts are the same as those in the first embodiment shown in FIGS. 4B to 4D, and thus the description thereof is omitted, but the same parts are denoted by the same reference numerals. According to such a configuration, since the height of the element electrode is constant, the process of manufacturing the element can be simplified. However, alignment between the element and the inter-element connector 30 is required.
 以上説明してきたように、本発明の実施の形態1~3による受光素子モジュール1では、基板上の素子電極のパターンが従来と異なり、素子基板中から流れ出る電流が、素子間接続部31に到達するまでに集電電極14を電流が基板面内方向に流れる必要がある平均距離は、バス電極つまり電流取出し電極15あるいは素子間接続体の素子間接続部31の本数nに応じて例えば図4(a)中のY方向の半導体基板11のY方向の長さのおよそ1/2nでよくなり、素子電極上の集電抵抗を大幅に小さくすることができ、素子間接続体30の抵抗は素子電極による抵抗よりも小さいため、モジュール全体の抵抗を小さくすることができる。 As described above, in the light receiving element module 1 according to the first to third embodiments of the present invention, the pattern of the element electrodes on the substrate is different from the conventional one, and the current flowing out of the element substrate reaches the inter-element connection portion 31. The average distance that the current needs to flow through the current collecting electrode 14 in the in-plane direction of the current is, for example, in accordance with the number n of the bus electrodes, that is, the current extraction electrodes 15 or the inter-element connection portions 31 of the inter-element connection body. In (a), the length of the semiconductor substrate 11 in the Y direction is about ½n of the length in the Y direction, and the current collecting resistance on the element electrode can be greatly reduced. Since it is smaller than the resistance due to the element electrode, the resistance of the entire module can be reduced.
 具体的には、例えば一般的な太陽電池の素子サイズである156mmの基板上の場合、幅100マイクロメートル、高さ10マイクロメートル、150mm長さの銀グリッド電極1本の集電抵抗が1.6Ω程度であるのに対し、バス電極を2本とすることにより0.2Ω程度に低減することができる。 Specifically, for example, on a substrate of 156 mm, which is a common solar cell element size, the current collecting resistance of one silver grid electrode having a width of 100 μm, a height of 10 μm, and a length of 150 mm is 1. Whereas it is about 6Ω, it can be reduced to about 0.2Ω by using two bus electrodes.
 他方の極性の電極については、素子間接続体30の本体部32に到達するために電流が線状電極12内を基板面内方向に流れる必要がある平均距離は素子間接続体30の凸部32PのY方向の断面の間隔、あるいは図20及び21のように凸部と電極が1対1で対応していない場合では、素子間接続体30の凸部32PのY方向の断面の間隔と線状電極12間の間隔との最小公倍数程度となり、こちらも素子電極上の集電抵抗を大幅に小さくすることができる。おおむね電極の高さ方向の距離あるいは電極の厚みに相当する部分が集電抵抗となるだけであることにより、素子サイズのより大きいものをモジュールに使用しても電気抵抗による集電ロスを低減することができ、光電変換効率に優れた受光素子モジュールをはじめとする光電変換素子モジュールを得ることができるという利点を有する。 For the other polarity electrode, the average distance that the current needs to flow through the linear electrode 12 in the in-plane direction of the substrate in order to reach the main body 32 of the inter-element connector 30 is the convex portion of the inter-element connector 30. The interval of the cross section in the Y direction of 32P or the interval of the cross section in the Y direction of the convex portion 32P of the inter-element connector 30 when the convex portion and the electrode do not correspond one-to-one as shown in FIGS. This is about the least common multiple of the distance between the linear electrodes 12, and the current collecting resistance on the element electrode can be greatly reduced. In general, only the portion corresponding to the distance in the height direction of the electrode or the thickness of the electrode becomes the current collecting resistance, thereby reducing the current collecting loss due to the electric resistance even if a device having a larger element size is used in the module. The photoelectric conversion element module including the light receiving element module excellent in photoelectric conversion efficiency can be obtained.
 具体的には、例えば、高さ10マイクロメートルの銀グリッド電極と15mm間隔で30マイクロメートル程度の厚みの銅からなる素子間接続体の本体部と接続する場合、素子間接続体との本体部32の抵抗は素子電極に比べて十分に小さいため、1本あたりの集電抵抗は0.2Ω程度に低減することができる。当該利点は素子からの放熱のための熱抵抗についても同様であり、放熱性を高く、素子温度を低く保つことができ、結果として光電変換効率に優れた受光素子モジュールを得ることができるという利点を有する。以上のように、本実施の形態によれば、素子電極は、平面配置でできるだけ集電距離を小さくするように、集電電極と取出し電極が交差接続部を構成するとともに、素子間接続体30が導電を担うことにより、素子電極上の集電抵抗を小さくすることができ、素子電極に使用する金属量を減らすことができるため、省資源、低コスト化することができるという利点を有する。 Specifically, for example, when connecting to a body part of an inter-element connection body composed of a silver grid electrode having a height of 10 micrometers and copper having a thickness of about 30 micrometers at 15 mm intervals, the main body part with the inter-element connection body Since the resistance of 32 is sufficiently smaller than the device electrode, the current collecting resistance per one can be reduced to about 0.2Ω. The advantage is the same for the thermal resistance for heat dissipation from the element, and it is possible to obtain a light receiving element module having high heat dissipation and keeping the element temperature low, resulting in excellent photoelectric conversion efficiency. Have As described above, according to the present embodiment, the current collecting electrode and the extraction electrode constitute a cross-connecting portion so that the current collecting distance in the planar arrangement is as small as possible, and the inter-element connector 30 is provided. By taking charge, the current collecting resistance on the element electrode can be reduced, and the amount of metal used for the element electrode can be reduced. Therefore, there is an advantage that resource saving and cost reduction can be achieved.
 また、実施の形態1~3による受光素子モジュール1においては、接着層26をあらかじめ一方の基板上の集電電極14上に形成しておくことにより、モジュール化時における高精度な位置あわせを行うことなく、素子間接続体30を、他方の極性を持つ線状電極12にのみ接続することができるという利点を有する。従って、従来の受光素子モジュールでは必要であった素子間接続体30と素子との間の細かな位置あわせが不必要となり、位置あわせ精度に依存することなく素子電極の電極ピッチを狭くすることができる。また、位置あわせ精度を良くするためのアライメントマークを素子上に必要としないため、アライメントマークに起因する光電変換効率低下領域を受光素子内に生じない。従って、内部抵抗が小さく、キャリア収集効率が高く、光電変換効率に優れた受光素子モジュールであるという利点を有するとともに、より狭い電極ピッチをもつ受光素子モジュールを製造することができる。 Further, in the light receiving element module 1 according to the first to third embodiments, the adhesive layer 26 is formed on the current collecting electrode 14 on one substrate in advance, thereby performing high-accuracy alignment during modularization. Without having this, there is an advantage that the inter-element connector 30 can be connected only to the linear electrode 12 having the other polarity. Therefore, the fine alignment between the inter-element connector 30 and the element, which is necessary in the conventional light receiving element module, is unnecessary, and the electrode pitch of the element electrodes can be reduced without depending on the alignment accuracy. it can. In addition, since an alignment mark for improving the alignment accuracy is not required on the element, a photoelectric conversion efficiency reduction region caused by the alignment mark does not occur in the light receiving element. Therefore, it is possible to manufacture a light receiving element module having a narrower electrode pitch while having the advantages of a light receiving element module having a low internal resistance, high carrier collection efficiency, and excellent photoelectric conversion efficiency.
 また、実施の形態1~3による受光素子モジュール1では、シリコン基板の光吸収係数が小さく透過させてしまう一部の波長の光に対して反射率が高い銅箔からなる素子間接続体30の本体部32を素子裏に有し、素子と素子間接続体30の本体部32の間には主に透光性の高い接着層26があるのみであるため、900nmから1300nm程度の波長の光が素子の裏面まで透過しても、素子間接続体30の本体部32によって再度素子に光を入射させることができるため、光の損失が小さくなり、光電変換効率に優れた受光素子モジュールを得ることができるという利点を有する。 Further, in the light receiving element module 1 according to the first to third embodiments, the inter-element connection body 30 made of a copper foil having a high reflectance with respect to light having a certain wavelength that transmits a small light absorption coefficient of the silicon substrate. Since the main body portion 32 is provided on the back of the element and only the adhesive layer 26 having a high light-transmitting property is mainly provided between the element and the main body portion 32 of the inter-element connector 30, light having a wavelength of about 900 nm to 1300 nm is used. Even if the light is transmitted to the back surface of the element, light can be incident on the element again by the main body 32 of the inter-element connector 30, so that the light loss is reduced and a light receiving element module having excellent photoelectric conversion efficiency is obtained. Has the advantage of being able to.
 また、実施の形態1~3による受光素子モジュールは、素子電極部分を金属と樹脂とで覆うことができるため、受光素子の周囲環境から素子電極部分に到達する水分を低減することができる。したがって、素子電極のマイグレーションによる短絡あるいは電気化学反応による抵抗増大を防ぐことができ、光電変換効率及び長期信頼性に優れた受光素子モジュールであるという利点を有する。これは特に、正極と負極の電極間距離が小さい、光電変換効率が高い受光素子の場合に重要である。 In the light receiving element modules according to Embodiments 1 to 3, since the element electrode portion can be covered with metal and resin, moisture reaching the element electrode portion from the ambient environment of the light receiving element can be reduced. Therefore, a short circuit due to migration of element electrodes or an increase in resistance due to an electrochemical reaction can be prevented, and the light receiving element module is excellent in photoelectric conversion efficiency and long-term reliability. This is particularly important in the case of a light-receiving element having a small distance between the positive electrode and the negative electrode and high photoelectric conversion efficiency.
 また、実施の形態1~3においては、モジュール化を行う際に素子間接続体30を素子に接続するためには素子の裏面に合うようにして素子間接続体30を接続すればよい。例えば特許文献4のような素子内のp領域とn領域間間隔と同じあるいは同程度の高精度な位置あわせはモジュール化時に不必要であり、従来のモジュールに比べて位置あわせの回数を減らすことができる。従って、位置あわせの回数を減らした結果として位置あわせ精度を上げることができる。なお、接着層26の形成を素子間接続体30の接続に先立ち行う場合もある。接着層26の形成を素子間接続体30の接続に先立ち行う場合は、位置あわせを行っているが、接着層26の位置あわせについてもどちらかの電極を完全に覆うとともに他方の電極の一部を露出できればよいため、位置あわせは高精度である必要はない。 In the first to third embodiments, in order to connect the inter-element connector 30 to the element when modularization is performed, the inter-element connector 30 may be connected so as to match the back surface of the element. For example, high-accuracy alignment that is the same as or similar to the distance between the p region and n region in the element as in Patent Document 4 is unnecessary when modularized, and the number of alignments is reduced compared to the conventional module. Can do. Therefore, the alignment accuracy can be increased as a result of reducing the number of alignments. Note that the adhesive layer 26 may be formed prior to the connection of the inter-element connector 30. When the formation of the adhesive layer 26 is performed prior to the connection of the inter-element connector 30, the alignment is performed, but also the alignment of the adhesive layer 26 is completely covered with one electrode and a part of the other electrode. Therefore, it is not necessary that the alignment be highly accurate.
 実施の形態1~3は、素子内での集電に寄与する裏面側電極を形成するとともに、素子を透過した光を反射する裏面反射膜、素子間を接続する素子間接続体30をより少ない工程数で形成することができるので、より少ない工程によって光電変換効率に優れた受光素子及び受光素子モジュールを製造することができる。 In the first to third embodiments, the back side electrode that contributes to the current collection in the element is formed, the back surface reflecting film that reflects the light transmitted through the element, and the inter-element connection body 30 that connects the elements are reduced. Since it can be formed by the number of steps, a light receiving element and a light receiving element module excellent in photoelectric conversion efficiency can be manufactured by fewer steps.
 実施の形態1~3では、素子間接続体30の本体部32を素子に接続した上で光電流量を評価して、光電流量が一致するものを組みあわせてモジュールを作成できるため、各受光素子10の発電電流値を一致させることができる。その結果、ストリングには他の受光素子10に比して著しく低い発電電流値を有する受光素子10がないので、受光素子モジュール1の発電効率を従来に比して高めることができる。従って、本発明のモジュール構造は従来のように、受光素子間の電流が一致しないような状況を生じなくすることができる構造である。 In the first to third embodiments, since the photoelectric flow rate is evaluated after the main body portion 32 of the inter-element connection body 30 is connected to the element, and a module can be created by combining those having the same photoelectric flow rate, each light receiving element Ten generated current values can be matched. As a result, since the string does not have the light receiving element 10 having a significantly lower power generation current value than the other light receiving elements 10, the power generation efficiency of the light receiving element module 1 can be increased as compared with the conventional one. Therefore, the module structure of the present invention is a structure that can prevent the situation where the currents between the light receiving elements do not coincide with each other as in the prior art.
 以上のように、本実施の形態1~3によれば、高精度な位置あわせを行うことなく、素子間電極の距離が小さく、素子間の接続抵抗が小さいとともに、素子を透過した光を反射させて有効に利用でき、光電変換効率に優れた受光素子、及びモジュールを得ることができる。 As described above, according to the first to third embodiments, the distance between the inter-element electrodes is small, the connection resistance between the elements is small, and the light transmitted through the element is reflected without performing highly accurate alignment. Thus, it is possible to obtain a light receiving element and a module that can be effectively used and have excellent photoelectric conversion efficiency.
 また、素子上での集電に基板上の線状電極12、集電電極14のみならず素子間接続体30の素子間接続部31及び本体部32が寄与するため、素子内の導電抵抗を低減できるため、発電出力に優れた受光素子モジュールを製造することができるという効果を有する。上記実施の形態によれば、素子電極である線状電極12と集電電極14との間を透過して失われる光が、素子間接続体30の本体部32によって反射され、素子に入射することにより光透過損失の低減が可能となり、光電変換効率に優れた受光素子モジュール1を製造することができる。 In addition, since not only the linear electrode 12 and the collector electrode 14 on the substrate but also the inter-element connection portion 31 and the main body portion 32 of the inter-element connection body 30 contribute to the current collection on the element, the conductive resistance in the element is reduced. Since it can reduce, it has the effect that the light receiving element module excellent in the electric power generation output can be manufactured. According to the above embodiment, the light lost through transmission between the linear electrode 12 as the element electrode and the current collecting electrode 14 is reflected by the main body 32 of the inter-element connector 30 and enters the element. Accordingly, light transmission loss can be reduced, and the light receiving element module 1 having excellent photoelectric conversion efficiency can be manufactured.
 以上のような反射体が素子裏面にある場合、基板上の線状電極12と集電電極14との間を透過する光が素子間接続体30の本体部32によって反射されて得られる利得により、光電流量は変化する。しかし、上記実施の形態によれば、素子間接続体30の本体部32を素子に接続した上で光電流量を評価して、光電流量が一致するものを組みあわせてモジュールを作成できるため、各受光素子10の発電電流値を一致させることができる。その結果、ストリングには他の受光素子10に比して著しく低い発電電流値を有する受光素子10がないので、受光素子モジュール1の発電効率を高めることができる。従って、上記実施の形態の受光素子モジュールは、受光素子間の電流が一致しないような状況を生じなくすることができるという利点を有する。 When the reflector as described above is on the back surface of the element, the light transmitted between the linear electrode 12 and the collector electrode 14 on the substrate is reflected by the main body 32 of the inter-element connection body 30 due to the gain obtained. The photoelectric flow rate changes. However, according to the above embodiment, the photoelectric flow rate is evaluated after the main body portion 32 of the inter-element connector 30 is connected to the element, and a module can be created by combining those with the same photoelectric flow rate. The generated current value of the light receiving element 10 can be matched. As a result, since the string does not have the light receiving element 10 having a significantly lower power generation current value than the other light receiving elements 10, the power generation efficiency of the light receiving element module 1 can be increased. Therefore, the light receiving element module of the above embodiment has an advantage that the situation where the currents between the light receiving elements do not coincide with each other can be prevented.
 本実施の形態2では、実施の形態1とは異なり、ストリング端部とストリング内部とで素子間接続体の形状を変える必要がない。素子間接続体の向きを90度回転させて接続すればいいだけであるため、モジュールを形成する工程を簡便にすることができるという利点を有する。また、ストリング端部においてストリング間接続体を新たに設ける必要がないため、素子以外がモジュールに占める面積を減らすことができる。本実施の形態では素子以外とはストリング間接続体である。したがって、面積あたりの発電量に優れたモジュールを得ることができるという利点を有する。 In the second embodiment, unlike the first embodiment, it is not necessary to change the shape of the inter-element connection body between the string end and the inside of the string. Since it is only necessary to rotate the inter-element connection body by 90 degrees and connect it, there is an advantage that the process of forming the module can be simplified. Further, since it is not necessary to newly provide an interstring connection body at the end of the string, the area occupied by modules other than the elements can be reduced. In the present embodiment, elements other than elements are inter-string connectors. Therefore, there is an advantage that a module having an excellent power generation amount per area can be obtained.
実施の形態4.
 図24は本実施の形態4の受光素子モジュールを構成する素子間接続体付き受光素子を裏面側から見た平面図である。図24は、モジュールの状態の素子間接続体付き受光素子を繰り返し単位のひとつ分だけ取り出したもので、素子間接続体30と受光素子10とが接続された際の素子電極である線状電極12と集電電極14の位置関係が分かるように接着層26あるいは封止材22、受光面側主面材23,裏面側主面材25を省略して記載している。本実施の形態の受光素子モジュールでは、本体部32が5分割されており、本体部32の間に素子間接続部の電流取出し電極接続部31bが4本設けられており、受光素子10上で短冊状の本体部32と電流取出し電極接続部31bとが、並置されている。そして本体部32の一端側が素子間部31aを介して隣接セルに接続された電流取出し電極接続部31bに接続されている。一方、4本の電流取出し電極接続部31bは、図示しない、紙面下側の隣接セルに接続された本体部32に接続された素子間部31aに接続される。つまり本実施の形態では、素子電極、素子間接続体30のいずれも素子上では、極性の異なる部材が重畳しない構造となっている。
Embodiment 4 FIG.
FIG. 24 is a plan view of a light receiving element with an inter-element connector constituting the light receiving element module according to the fourth embodiment as viewed from the back side. FIG. 24 shows a module in which a light receiving element with an inter-element connection body is taken out by one repeating unit, and a linear electrode as an element electrode when the inter-element connection body 30 and the light receiving element 10 are connected. 12, the adhesive layer 26 or the sealing material 22, the light receiving surface side main surface material 23, and the back surface side main surface material 25 are omitted so that the positional relationship between the electrode 12 and the current collecting electrode 14 can be understood. In the light receiving element module according to the present embodiment, the main body portion 32 is divided into five parts, and four current extraction electrode connection portions 31 b of inter-element connection portions are provided between the main body portions 32. The strip-shaped main body portion 32 and the current extraction electrode connection portion 31b are juxtaposed. One end of the main body 32 is connected to the current extraction electrode connection 31b connected to the adjacent cell via the inter-element portion 31a. On the other hand, the four current extraction electrode connection portions 31b are connected to an inter-element portion 31a connected to the main body portion 32 connected to an adjacent cell on the lower side of the drawing, not shown. That is, in this embodiment, both the element electrode and the inter-element connector 30 have a structure in which members having different polarities do not overlap on the element.
 素子間接続体30と受光素子10上の電極の位置関係を示すために、図24の素子間接続体付き受光素子から素子間接続体30全てを除いた平面図を図25(a)に、素子間接続体の本体部32及び絶縁層26のみを除いた平面図を図25(b)に示す。図26(a)~(c)は、図24及び図25(b)の受光素子10に素子間接続体30の本体部32及び素子間接続部31が接続された状態における、6A-6B、6C-6D、6E-6Fの各線分で素子間接続体付き受光素子を切り取った場合の断面図である。 In order to show the positional relationship between the inter-element connection body 30 and the electrodes on the light-receiving element 10, a plan view of the light-receiving element with inter-element connection body in FIG. FIG. 25B shows a plan view excluding only the main body 32 and the insulating layer 26 of the inter-element connector. FIGS. 26A to 26C are views of 6A-6B in a state where the main body portion 32 and the inter-element connection portion 31 of the inter-element connection body 30 are connected to the light receiving element 10 of FIGS. 24 and 25B. FIG. 6 is a cross-sectional view when a light receiving element with an inter-element connection body is cut off along each line segment of 6C-6D and 6E-6F.
 本実施の形態の素子間接続体30は、前記実施の形態1で説明した受光素子モジュールの素子間接続体30と同様、背面側に第1及び第2の素子電極を有する背面接続型の受光素子10a~10fを接続するものである。素子間接続体30の素子間接続部31と素子間接続体30の本体部32は、いずれも可撓性を有する導電体箔で構成される。そして、図24に示すように、受光素子10の背面の電流取出し電極15を除くほぼ全体を覆う本体部32と、電流取出し電極15に接続される素子間接続部の電流取出し電極接続部31bと、本体部32の背面と素子間接続部31の電流取出し電極接続部31bとの間に接続される素子間接続体30の素子間部31aと、を備える。 The inter-element connection body 30 of the present embodiment, like the inter-element connection body 30 of the light-receiving element module described in the first embodiment, has a back connection type light reception having first and second element electrodes on the back surface side. The elements 10a to 10f are connected. The inter-element connection portion 31 of the inter-element connection body 30 and the main body portion 32 of the inter-element connection body 30 are both made of a conductive foil having flexibility. Then, as shown in FIG. 24, a main body portion 32 that covers almost the entire surface excluding the current extraction electrode 15 on the back surface of the light receiving element 10, and a current extraction electrode connection portion 31b of an inter-element connection portion connected to the current extraction electrode 15 The inter-element portion 31a of the inter-element connection body 30 connected between the back surface of the main body portion 32 and the current extraction electrode connection portion 31b of the inter-element connection portion 31.
 素子間接続体30の本体部32と素子間接続体30の素子間部31a及び素子間接続体30の電流取出し電極接続部31bとは電気接続体21もしくは33によって接続されている。素子間接続体30の本体部32と素子間部31aとを接続するにあたって、電気接続体を用いることなく、スポット溶接、熱圧着等で直接的に接続されていてもよい。 The main body part 32 of the inter-element connector 30, the inter-element part 31 a of the inter-element connector 30, and the current extraction electrode connection part 31 b of the inter-element connector 30 are connected by the electrical connector 21 or 33. When connecting the main body part 32 of the inter-element connection body 30 and the inter-element part 31a, they may be directly connected by spot welding, thermocompression bonding or the like without using an electrical connection body.
 また、本体部32はスリットSすなわち切欠きを持たず、短冊状に5分割されており、電流取出し電極15を除いて受光素子を構成する半導体基板11全体を覆っている点で前記実施の形態1と異なる。さらに、素子間接続体30の本体部32と素子間部31aと電流取出し電極接続部31bとが個別の3つの単位の部品から構成されている点が異なる。他の部分については前記実施の形態1及び2と同様であり、ここでは説明を省略する。 Further, the main body portion 32 does not have a slit S, that is, a notch, is divided into five strips, and covers the entire semiconductor substrate 11 constituting the light receiving element except for the current extraction electrode 15. Different from 1. Furthermore, the main part 32 of the interelement connection body 30, the interelement part 31a, and the electric current extraction electrode connection part 31b differ in the point comprised from the components of three separate units. Other portions are the same as those in the first and second embodiments, and the description thereof is omitted here.
 ここで、図24、図25(a)、図25(b)は、素子間接続体30をモジュールの背面側から見た図である。素子電極のうちの一方の電極である線状電極12に選択的に接続された本体部32と接続された素子間接続体30の素子間部31aが、隣接する受光素子10の第2の素子電極である電流取出し電極15に接続された素子間接続体30の電流取出し電極接続部31bに当接している。受光素子10には、第2の素子電極である集電電極14も一定の間隔でストライプ状(線状)をなして形成されており、集電電極14と交差する4本の電流取出し電極15が形成されている。電流取出し電極15に沿って素子間接続体30の電流取出し電極接続部31bが当接しているため、第2の素子電極の集電距離を小さくすることができるため、集電抵抗の低減をはかることができる。 Here, FIG. 24, FIG. 25 (a), FIG. 25 (b) is the figure which looked at the connection body 30 between elements from the back side of the module. The inter-element portion 31a of the inter-element connector 30 connected to the main body 32 selectively connected to the linear electrode 12 which is one of the element electrodes is the second element of the adjacent light receiving element 10. It contacts the current extraction electrode connection portion 31b of the inter-element connector 30 connected to the current extraction electrode 15 that is an electrode. In the light receiving element 10, current collecting electrodes 14 as second element electrodes are also formed in a stripe shape (linear shape) at regular intervals, and four current extraction electrodes 15 intersecting the current collecting electrodes 14. Is formed. Since the current extraction electrode connection portion 31b of the inter-element connector 30 is in contact with the current extraction electrode 15, the current collection distance of the second element electrode can be reduced, so that the current collection resistance is reduced. be able to.
 本実施の形態についても前記実施の形態1または2の受光素子モジュールと同様、樹脂封止がなされ、受光素子モジュールが得られる。本実施の形態4では、図24、図25(a)及び(b)に示すように、受光素子10上に位置する素子間接続体30の本体部32が電流取出し電極15上に形成されておらず本体部32との重なり部が生じないため、素子間接続体30の電流取出し電極接続部31bを素子上の電流取出し電極15全体と接続することができ、電流取出し電極15上の集電抵抗を小さくすることができるとともに本体部32と素子間接続体30の電流取出し電極接続部31bとの間の短絡を防ぐことができるという利点を有する。すなわち、実施の形態1に比べ、電流取出し電極15に対して電流取出し電極接続部31が接続しない部分が生じ、電流取出し電極15上で集電抵抗が大きくなる部分が生じるのをより確実に防ぐことができる。また、電流取出し電極15と本体部32との積層部部分で絶縁性が低下する可能性についても本実施の形態では実施の形態1の場合に比べより確実に抑制することができる。 Also in the present embodiment, similar to the light receiving element module of the first or second embodiment, resin sealing is performed to obtain a light receiving element module. In the fourth embodiment, as shown in FIGS. 24, 25 (a) and 25 (b), the body portion 32 of the inter-element connector 30 located on the light receiving element 10 is formed on the current extraction electrode 15. Therefore, the current extraction electrode connection portion 31b of the inter-element connection body 30 can be connected to the entire current extraction electrode 15 on the element, and the current collector on the current extraction electrode 15 can be connected. The resistance can be reduced, and a short circuit between the main body 32 and the current extraction electrode connection part 31b of the inter-element connector 30 can be prevented. That is, as compared with the first embodiment, a portion where the current extraction electrode connection portion 31 is not connected to the current extraction electrode 15 is generated, and a portion where the current collecting resistance is increased on the current extraction electrode 15 is more reliably prevented. be able to. Further, the possibility that the insulating property is lowered in the laminated portion portion of the current extraction electrode 15 and the main body portion 32 can be more reliably suppressed in the present embodiment than in the case of the first embodiment.
 実施の形態2においても図12(b)及び図13に示すように、電流取出し電極15上に形成された素子間接続体30の素子間接続部31と、素子間接続部31の上の本体部32との間を絶縁層からなる接着層26で絶縁する必要があったが、本実施の形態4においては、電流取出し電極15上に素子間接続体30の本体部32が存在しないため、実施の形態2では存在した素子間接続体30の素子間接続部31と、素子間接続体30の本体部32と、素子間接続体30の素子間接続部31とによる積層構造部分にあたる部分をなくすことができる。従って電流取出し電極15及び素子間接続体30の電流取出し電極接続部31bと本体部32とは、並置されて離間されていることから、あらかじめ絶縁されており、信頼性が高く、新たに絶縁層を設ける必要がなく簡便にモジュールを作成できるという利点を有する。 Also in the second embodiment, as shown in FIGS. 12B and 13, the inter-element connection portion 31 of the inter-element connection body 30 formed on the current extraction electrode 15 and the main body on the inter-element connection portion 31. Although it was necessary to insulate between the part 32 with the adhesive layer 26 made of an insulating layer, in the fourth embodiment, since the main body part 32 of the inter-element connector 30 does not exist on the current extraction electrode 15, In the second embodiment, the portion corresponding to the laminated structure portion formed by the inter-element connection portion 31 of the inter-element connection body 30, the main body portion 32 of the inter-element connection body 30, and the inter-element connection portion 31 of the inter-element connection body 30 is provided. Can be eliminated. Therefore, the current extraction electrode 15 and the current extraction electrode connection portion 31b of the inter-element connection body 30 and the main body portion 32 are arranged in parallel and separated from each other, so that they are insulated in advance, have high reliability, and have a new insulating layer. There is an advantage that a module can be easily created without the need to provide a module.
 実施の形態4においては、電流取出し電極15の部分において、素子間接続体30の素子間接続部31が同一素子上の素子間接続体30の本体部32と重ならない構造となっているが、実施の形態2では、素子間接続部31が本体部32と重なっている。これに対し、本実施の形態4における本体部32は、電流取出し電極15の上において素子間接続体30の電流取出し電極接続部31bと本体部32との積層部分がない分だけ、素子間接続体付き受光素子の厚みが低減した形状となる。 In the fourth embodiment, in the current extraction electrode 15, the inter-element connection portion 31 of the inter-element connection body 30 has a structure that does not overlap with the main body portion 32 of the inter-element connection body 30 on the same element. In the second embodiment, the inter-element connection portion 31 overlaps the main body portion 32. On the other hand, the main body 32 in the fourth embodiment is connected between the elements by the amount of the laminated portion of the current extraction electrode connecting portion 31b and the main body 32 of the inter-element connector 30 on the current extraction electrode 15. The thickness of the light receiving element with the body is reduced.
 素子間接続体30の素子間接続部31、本体部32、及び線状電極12、電流取出し電極15は、電気接続体によって接続される。本実施の形態4においては、素子間接続体30の本体部32と素子間部31aとの間、及び、素子間接続体の電流取出し電極接続部31bと素子間接続体30の素子間部31aとの間は図示しない第2の電気接続体33で接続され、素子間接続体30の本体部32と線状電極12との間、及び、電流取出し電極15と素子間接続体の電流取出し電極接続部31bとの間は電気接続体21で接続されている。 The inter-element connection section 31, the main body section 32, the linear electrode 12, and the current extraction electrode 15 of the inter-element connection body 30 are connected by an electric connection body. In the fourth embodiment, between the body part 32 and the inter-element part 31a of the inter-element connection body 30, and between the current extraction electrode connection part 31b of the inter-element connection body and the inter-element part 31a of the inter-element connection body 30. Are connected by a second electrical connection body 33 (not shown), between the main body portion 32 of the inter-element connection body 30 and the linear electrode 12, and between the current extraction electrode 15 and the current extraction electrode of the inter-element connection body. The connection part 31b is connected by an electrical connection body 21.
 電気接続体21と33としては、同じ材質のもの、あるいは、それぞれに異なるものを使用しても良く、更に、素子間接続体30の素子間接続部31、本体部32、及び線状電極12と電流取出し電極15の各部位すべてに異なる電気接続体を形成してもよい。例えば、異なる電気接続体21と33とを用いる部位の組み合わせとして本実施の形態4では、「電気接続体の本体部32-線状電極12間」、及び、「電流取出し電極15-素子間接続体30の電流取出し電極接続部31b間」の接続部には電気接続体21を、「素子間接続体30の素子間部31a-電気接続体の本体部32間」、及び、「素子間接続体30の素子間部31a-素子間接続体30の電流取出し電極接続部31b間」との接続部には電気接続体33を用いることができる。上記構成の場合、電気接続体21の形成領域としては、例えば、素子間接続部31上においては素子間接続部31の全面を覆うように電気接続体21を形成し、素子間接続体30の本体部32に対しては素子電極と接続する部分だけに電気接続体21が形成されるようにすることができる。 As the electrical connection bodies 21 and 33, the same material or different ones may be used. Furthermore, the inter-element connection section 31, the main body section 32, and the linear electrode 12 of the inter-element connection body 30 may be used. A different electrical connection body may be formed in each part of the current extraction electrode 15. For example, as a combination of parts using different electrical connection bodies 21 and 33, in the fourth embodiment, “between the main body portion 32 of the electrical connection body and the linear electrode 12” and “connection between the current extraction electrode 15 and the element” The electrical connection body 21 is connected to the connection portion between the current extraction electrode connection portions 31b of the body 30, the inter-element connection portion 30a of the inter-element connection body 30 and the main body portion 32 of the electrical connection body, and the inter-element connection. The electrical connection body 33 can be used for the connection portion between the inter-element portion 31 a of the body 30 and the current extraction electrode connection portion 31 b of the inter-element connection body 30. In the case of the above configuration, as the formation region of the electrical connection body 21, for example, the electrical connection body 21 is formed so as to cover the entire surface of the inter-element connection section 31 on the inter-element connection section 31. With respect to the main body 32, the electrical connection body 21 can be formed only in the portion connected to the element electrode.
 電気接続体の種類とそれぞれの電気接続体の形成部位とは任意に組み合わせてよいが、素子基板の加熱時間が短くかつ加熱温度が低くなるように素子電極と素子間接続体との接続部分と、素子間接続体と素子間接続体との間の接続部分とで分けて用いるとよい。例えば、素子間を接続してストリングを形成するために加熱する際に素子電極と素子間接続体30の本体部31が素子電極から外れないように、電気接続体21及び33の溶融温度は異なっていてもよい。前記本実施の形態4での電気接続体21と33との使用部位の組み合わせの場合、電気接続体33の接続温度を電気接続体21の接続温度よりも高くした場合では、事前に「素子間接続体30の素子間部31a-電気接続体の本体部32間」、及び、「素子間接続体30の素子間部31a-素子間接続体30の電流取出し電極接続部31b間」との接続部を電気接続体33で接続しておいてから、「電気接続体の本体部32-線状電極12間」、及び、「電流取出し電極15-素子間接続体30の電流取出し電極接続部31b間」の接続を電気接続体21で実施することにより、後の工程である電気接続体21の接続においてもより接続温度の高い電気接続体33は熱による影響を受けにくいためストリングの形成を容易に行えるという利点がある。電気接続体33の接続温度を電気接続体21の接続温度よりも低くした場合では、各電気接続体による接続の順番を逆にする方が好ましい。 The type of the electrical connection body and the formation site of each electrical connection body may be arbitrarily combined, but the connection portion between the element electrode and the inter-element connection body so that the heating time of the element substrate is short and the heating temperature is low. It is good to use separately in the connection part between the connection body between elements, and the connection body between elements. For example, the melting temperatures of the electrical connectors 21 and 33 are different so that the element electrode and the body portion 31 of the inter-element connector 30 are not detached from the element electrode when heating is performed to connect the elements to form a string. It may be. In the case of the combination of the use parts of the electrical connection bodies 21 and 33 in the fourth embodiment, when the connection temperature of the electrical connection body 33 is higher than the connection temperature of the electrical connection body 21, the Connection between the inter-element part 31a of the connection body 30 and the main body part 32 of the electric connection body and "between the inter-element part 31a of the inter-element connection body 30 and the current extraction electrode connection part 31b of the inter-element connection body 30" Are connected by the electric connection body 33, and then “between the main body portion 32 of the electric connection body and the linear electrode 12” and “the current extraction electrode 15 and the current extraction electrode connection section 31b of the inter-element connection body 30”. By performing the “inter-connection” with the electrical connection body 21, the electrical connection body 33 having a higher connection temperature is less affected by heat even in the subsequent connection of the electrical connection body 21, so that the string can be easily formed. The advantage of being able to A. When the connection temperature of the electrical connection body 33 is lower than the connection temperature of the electrical connection body 21, it is preferable to reverse the order of connection by each electrical connection body.
 例えば、実施の形態2の場合、電気接続体33の方が電気接続体21よりも溶融温度を低くすることができる。電気接続体33の方が電気接続体21よりも溶融温度を低くする場合、電気接続体によって各部位を接続する際に、はじめに電気接続体21を高温で溶融させて、電流取出し電極15と素子間接続部31、及び、素子間接続部31と本体部32を接続し、次に電気接続体21が溶融せずに電気接続体33が溶融する温度で加熱して本体部32と線状電極12とを接続することにより、後者の加熱の際に前者の電気接続体接続部が溶融せずに場所を保持することができるため、ストリングを作成し易いという利点がある。電気接続体が使用される場所と溶融温度の高低の組み合わせは、実施の形態2においても製造の順番に従って上記とは逆にしてもよい。電気接続体としては、錫銀系はんだ、錫ビスマス系はんだ、金属錫等を用いることができる。受光素子等の素子と素子間接続体との間の接続には、はんだあるいは導電性接着剤以外にも特許文献5~6等の先行技術文献に記載されているように、レーザー等の加熱手段で金属材料を溶融させて接続してもよい。 For example, in the case of the second embodiment, the electrical connection body 33 can have a lower melting temperature than the electrical connection body 21. When the melting temperature of the electrical connection body 33 is lower than that of the electrical connection body 21, when connecting each part by the electrical connection body, the electrical connection body 21 is first melted at a high temperature, and the current extraction electrode 15 and the element are connected. The inter-connection portion 31 and the inter-element connection portion 31 and the main body portion 32 are connected, and then the main body portion 32 and the linear electrode are heated at a temperature at which the electric connection body 33 does not melt and the electric connection body 33 melts. 12 is advantageous in that it is easy to create a string because the former electrical connector connecting portion can be held without melting during the latter heating. The combination of the location where the electrical connection body is used and the melting temperature may be reversed in the second embodiment according to the order of manufacture. As the electrical connector, tin silver solder, tin bismuth solder, metallic tin, or the like can be used. For connection between an element such as a light receiving element and an inter-element connector, heating means such as a laser as described in prior art documents such as Patent Documents 5 to 6 in addition to solder or conductive adhesive The metal material may be melted and connected.
変形例8.
 次に本実施の形態4の変形例について説明する、図27に示す変形例の受光素子モジュールにおいては、素子間接続体30の本体部32に凹部32Rと図中に点線の囲みで示される凸部32Pが設けられている。受光面側に突出する凸部32Pが突出している素子電極12間の間隙よりも大きい場合、あるいは、受光面側に凹となる凹部32Rの間隔すなわち幅が素子電極である線状電極12の幅よりも小さい場合、素子間接続体30の本体部32は素子電極である線状電極12につきあたる。従って、素子間接続体30の本体部32と逆の極性の素子電極である集電電極14と接触しないため、位置合わせをしなくても素子間接続体30の本体部32と線状電極12とのみを接続することができる。また、受光面側へ凸となる部分である凸部32Pの断面の幅が、第2の素子電極すなわち線状電極12間の間隙よりも広いことで、本体部32は素子電極である線状電極12に確実につきあたり接続する。
Modification 8
Next, a modification of the fourth embodiment will be described. In the light receiving element module of the modification shown in FIG. 27, the main body 32 of the inter-element connector 30 has a recess 32R and a protrusion indicated by a dotted line in the figure. A portion 32P is provided. When the convex portion 32P protruding to the light receiving surface side is larger than the gap between the protruding element electrodes 12, or the interval between the concave portions 32R that are concave to the light receiving surface side, that is, the width is the width of the linear electrode 12 that is the element electrode. If smaller, the main body portion 32 of the inter-element connector 30 contacts the linear electrode 12 that is an element electrode. Accordingly, the main electrode 32 and the linear electrode 12 are not contacted with the collector electrode 14 which is an element electrode having a polarity opposite to that of the main body 32 of the inter-element connector 30 without alignment. Can only be connected with. Further, the width of the cross section of the convex portion 32P, which is a portion that protrudes toward the light receiving surface, is wider than the gap between the second element electrodes, that is, the linear electrodes 12, so that the main body portion 32 is a linear shape that is an element electrode. The electrode 12 is securely connected to the electrode 12.
 図25(b)に示したような平行な細線電極を有する受光素子10においては、凸部32PのX及びY方向の幅は素子電極である線状電極12間のX及びY方向の間隙よりも大きい、もしくは、凹部32RのX,Yのそれぞれの方向の間隔は、素子電極である線状電極12自体のX及びY方向の幅よりもそれぞれ小さいことが好ましい。上記構成とした結果、図27に示す繰り返し単位を有する受光素子モジュールは、凹部32Rと凸部32Pとを有する素子間接続体30の本体部32を使用することにより、素子間接続体30の本体部32の変形が容易になり、素子間接続体付き受光素子の反りを低減するとともに強度を増加させることができるとともに、位置合わせをしなくても素子間接続体30の本体部32と素子電極12とのみを接続することができるという利点を有する。 In the light receiving element 10 having parallel thin wire electrodes as shown in FIG. 25B, the widths of the convex portions 32P in the X and Y directions are larger than the gaps in the X and Y directions between the linear electrodes 12 which are element electrodes. It is preferable that the distances in the X and Y directions of the recess 32R are smaller than the widths in the X and Y directions of the linear electrode 12 itself that is an element electrode. As a result of the above configuration, the light-receiving element module having the repeating unit shown in FIG. 27 uses the main body portion 32 of the inter-element connection body 30 having the concave portions 32R and the convex portions 32P. The deformation of the part 32 is facilitated, the warp of the light receiving element with the inter-element connection body can be reduced and the strength can be increased, and the body part 32 and the element electrode of the inter-element connection body 30 can be obtained without alignment. 12 has the advantage that only 12 can be connected.
 本実施の形態の受光素子モジュール1によれば、受光素子全面を素子間接続体30の本体部32が電流取出し電極15を覆っていないため、電流取出し電極15上に絶縁層からなる接着層26を形成しなくても、同一素子上の本体部32と電流取出し電極15との間の短絡を防ぐことができるという利点を有する。従って、絶縁層を形成する工程を減らすこともできる。 According to the light receiving element module 1 of the present embodiment, since the main body portion 32 of the inter-element connector 30 does not cover the current extraction electrode 15 on the entire surface of the light receiving element, the adhesive layer 26 made of an insulating layer is formed on the current extraction electrode 15. Even if it does not form, it has the advantage that the short circuit between the main-body part 32 and the electric current extraction electrode 15 on the same element can be prevented. Accordingly, the number of steps for forming the insulating layer can be reduced.
変形例9.
 図28は、実施の形態4の太陽電池モジュールを構成する受光素子モジュールの変形例を示す図である。図28に示す変形例の受光素子モジュールにおいては、短冊状の本体部32が受光素子の素子基板を構成する半導体基板11よりも突出し、素子間部31aは本体部32に直交する金属箔からなる。そして当該素子間部31aに、隣接セルに接続される素子間接続体30の電流取出し電極接続部31bが接続される。他部については前記実施の形態4と同様である。
Modification 9
FIG. 28 is a diagram showing a modification of the light receiving element module constituting the solar cell module according to Embodiment 4. In the light receiving element module of the modified example shown in FIG. 28, the strip-shaped main body portion 32 protrudes from the semiconductor substrate 11 constituting the element substrate of the light receiving device, and the inter-element portion 31a is made of a metal foil orthogonal to the main body portion 32. . And the current extraction electrode connection part 31b of the inter-element connector 30 connected to the adjacent cell is connected to the inter-element part 31a. Other parts are the same as those in the fourth embodiment.
 上記構成によれば、素子間部の構成が、実施の形態4に比べてシンプルであり、若干小型化が可能である。なお、実施の形態4、変形例8及び9で用いられる素子間接続体30の素子間部31aと、本体部32とは一体形成することも可能である。一体形成することで取扱いは容易となるが、位置合わせ精度が厳しくなる場合もある。 According to the above configuration, the configuration of the inter-element portion is simpler than that of the fourth embodiment, and can be slightly downsized. The inter-element portion 31a of the inter-element connection body 30 used in the fourth embodiment and the modified examples 8 and 9 and the main body portion 32 can be integrally formed. Although it is easy to handle by forming it integrally, the alignment accuracy may be severe.
変形例10.
 図29,30,31は、本実施の形態4の変形例の受光素子モジュールを示す図であり、半導体基板上の素子電極が半導体基板内と逆の極性を有する受光素子を用いた場合の半導体基板の導電領域のパターンと電極の位置を示す平面図と平面図と断面図である。変形例10では、キャリアの再結合中心となる半導体層と金属電極との接触面積を小さくする一方で、素子間接続体30までの距離を最小限に抑え、電流は、板厚が大きく低抵抗の素子間接続体内を流れるようにした構成である。図29は半導体基板裏面側の基板表面における半導体領域の面内分布を示す図であり、素子間接続体30、封止材等のモジュール部材だけでなくパッシベーション膜、あるいは電極を除いて記載している。図29において半導体基板11表面に半導体基板11と異なる半導体層であるが形成されていないことを示しており、p型ドープ領域16、低濃度n型ドープ領域17a、高濃度n型ドープ領域17bについては半導体基板11そのものとは異なる導電領域が表面に形成されていることを示している。図30は素子電極までを含めた素子のみを裏面側からみた図であり、一方の極性の素子電極に点状電極12Dを用いた受光素子10の素子電極のパターンを示す平面図である。図30では、パッシベーション膜18aが素子基板を構成する半導体基板11を覆い、パッシベーション膜18aで被覆された領域以外の部分に素子電極である点状電極12D、集電電極14、電流取出し電極15が半導体基板11の裏面側に並置されるように形成されている。図31は図30の6G-6Hの断面図である。図31は、素子を素子間接続体30で接続した状態のストリング断面を示しており、受光面側のパッシベーション膜、モジュールの封止材、受光面材、裏面保護材は記載を省略している。
Modification 10
29, 30, and 31 are diagrams showing a light receiving element module according to a modification of the fourth embodiment, in which a light receiving element having element electrodes on the semiconductor substrate having a polarity opposite to that in the semiconductor substrate is used. It is the top view which shows the pattern of the conductive area | region of a board | substrate, and the position of an electrode, a top view, and sectional drawing. In the modified example 10, while the contact area between the semiconductor layer that becomes the recombination center of the carrier and the metal electrode is reduced, the distance to the inter-element connector 30 is minimized, and the current has a large plate thickness and low resistance. The configuration is such that it flows through the inter-element connection body. FIG. 29 is a diagram showing the in-plane distribution of the semiconductor region on the substrate surface on the back surface side of the semiconductor substrate, which is described not only for the inter-element connector 30 and the module member such as the sealing material but also for the passivation film or electrode. Yes. FIG. 29 shows that the surface of the semiconductor substrate 11 is a semiconductor layer different from the semiconductor substrate 11 but is not formed. About the p-type doped region 16, the lightly doped n-type doped region 17a, and the heavily doped n-type doped region 17b. Indicates that a conductive region different from the semiconductor substrate 11 itself is formed on the surface. FIG. 30 is a view of only the element including the element electrode as viewed from the back side, and is a plan view showing the pattern of the element electrode of the light receiving element 10 using the point-like electrode 12D as the element electrode of one polarity. In FIG. 30, the passivation film 18 a covers the semiconductor substrate 11 constituting the element substrate, and the point electrode 12 </ b> D, the current collecting electrode 14, and the current extraction electrode 15, which are element electrodes, are formed in portions other than the region covered with the passivation film 18 a. It is formed so as to be juxtaposed on the back surface side of the semiconductor substrate 11. 31 is a cross-sectional view taken along 6G-6H in FIG. FIG. 31 shows a string cross section in a state where elements are connected by an inter-element connector 30, and a passivation film on the light receiving surface side, a module sealing material, a light receiving surface material, and a back surface protective material are omitted. .
 一般的に、光電変換素子は半導体基板の内部光電効果を利用する。光電変換素子に用いられる半導体基板11は導電性が比較的低いため、半導体基板11内を電流が流れる距離が長いと抵抗損失が増大する。また、半導体基板11内を少数キャリアが移動する距離が長いと光生成キャリアの失活により半導体外部への取出し電流が低下する。従って、一般的な光電変換素子は金属電極あるいは透光性電極を半導体基板11上に形成することによって面内方向の導電性を確保する構造となっている。金属電極を面内方向の導電に用いる場合では、電極影による光損失を考慮して電極が半導体基板全体を覆わないようにある間隔で離間しながら半導体基板面内全体に広く分布する構造となる。ここで、電極が広く分布する構造というのは、基板中の少数キャリアの拡散長以下の間隔で半導体基板と接触する電極が半導体基板一面にわたって分布する構造をいう。上記構造においては、半導体基板は金属よりも導電性がはるかに低いため、電極がない部分では電流が素子内を流れて電極部分まで到達するまでに素子の厚みに加えて素子電極までの半導体基板自体の抵抗が加わり、基板内での抵抗損失が大きくなるため、素子電極間の距離を狭めることが好ましい。一方で、半導体と金属が接触する部分ではキャリアの再結合速度が大きくなるため、素子電極と半導体との接触面積は小さい方が好ましいため、素子電極間の距離は最適値を有する。 Generally, a photoelectric conversion element uses an internal photoelectric effect of a semiconductor substrate. Since the semiconductor substrate 11 used for the photoelectric conversion element has a relatively low conductivity, the resistance loss increases when the distance through which the current flows in the semiconductor substrate 11 is long. In addition, if the distance that the minority carriers move in the semiconductor substrate 11 is long, the extraction current to the outside of the semiconductor decreases due to the deactivation of the photogenerated carriers. Therefore, a general photoelectric conversion element has a structure in which conductivity in the in-plane direction is ensured by forming a metal electrode or a translucent electrode on the semiconductor substrate 11. In the case where the metal electrode is used for in-plane conduction, the structure is widely distributed throughout the semiconductor substrate surface while being spaced apart at a certain distance so that the electrode does not cover the entire semiconductor substrate in consideration of light loss due to the electrode shadow. . Here, the structure in which the electrodes are widely distributed refers to a structure in which the electrodes in contact with the semiconductor substrate are distributed over the entire surface of the semiconductor substrate at intervals equal to or less than the diffusion length of minority carriers in the substrate. In the above structure, the semiconductor substrate is much lower in conductivity than the metal, so that in the part where there is no electrode, the semiconductor substrate up to the element electrode in addition to the thickness of the element until the current flows through the element and reaches the electrode part It is preferable to reduce the distance between the device electrodes because the resistance itself increases and the resistance loss in the substrate increases. On the other hand, since the recombination speed of the carrier is increased at the portion where the semiconductor and the metal are in contact with each other, it is preferable that the contact area between the element electrode and the semiconductor is small. Therefore, the distance between the element electrodes has an optimum value.
 背面接続型の光電変換素子の素子構造としては、一般的に、MWT(Metal Wrap Through)セル、EWT(Emitter Wrap Through)セル、IBC(Inter-digit Back-contact)セルといったものがある。上記セルのうち、IBCセルとEWTセルでは、受光面には電極がないため、裏面一面に正と負の両極が離間しながら共に広く分布する必要がある。これに対し、MWTセルにおいては、受光面側にグリッド電極を有するため、電極影が生じるものの、裏面側には正極と負極どちらかだけが広く分布していればよいため、裏面側の素子電極構造は相対的に単純になる。従って、本実施の形態の受光素子モジュールは受光面に素子電極を有しない素子構造が主な対象であるが、受光面に素子電極を有する素子にも適用可能である。IBCセル、EWTセルのように異なる2つの極性の素子電極が一つの面のみに離間しながら広く分布する必要がある場合、配線は複雑になる。従来は、特許文献8のように櫛歯状の配線電極を対向させた配線基板に素子電極を接続して集電する構造あるいは特許文献9のように素子電極を多層化する方法が堤案されてきた。しかし、素子電極を半導体基板に対して抵抗が小さくなるように形成するためには、例えば金属を蒸着した後に5~30分の200~400℃程度の加熱処理を行うあるいは、ガラスフリットを含有するペーストを印刷した後で400~900℃程度の加熱処理を行う等の、高温の熱処理が必要である。熱処理を行う際、例えば図19(a)、19(b)のようなパッシベーション膜を有する受光素子においては、コンタクトホールである第1の開口12hと第2の開口14h以外の部分から金属材料がパッシベーション膜18aを拡散して突き抜けて、あるいはパッシベーション膜に偶然形成されたピンホールを通して半導体基板に到達する。このような場合、金属が半導体内で再結合中心として働き、受光素子の光電変換効率が低下するという問題があった。特に、例えば図31の16,17a,17bのような拡散層領域が形成されていない半導体内の導電率が低い領域に金属が存在する場合、金属が再結合中心として強く働く。 As the element structure of the back connection type photoelectric conversion element, there are generally an MWT (Metal Wrap Through) cell, an EWT (Emitter Wrap Through) cell, and an IBC (Inter-digit Back-contact) cell. Among the above cells, in the IBC cell and the EWT cell, since there is no electrode on the light receiving surface, both the positive and negative electrodes need to be widely distributed on the back surface while being separated. On the other hand, since the MWT cell has a grid electrode on the light receiving surface side, an electrode shadow is generated, but only the positive electrode or the negative electrode needs to be widely distributed on the back surface side. The structure is relatively simple. Therefore, although the light receiving element module of the present embodiment is mainly intended for an element structure having no element electrode on the light receiving surface, it can also be applied to an element having an element electrode on the light receiving surface. When element electrodes having two different polarities, such as IBC cells and EWT cells, need to be widely distributed while being separated only on one surface, wiring becomes complicated. Conventionally, a structure in which element electrodes are connected to a wiring board facing comb-like wiring electrodes as in Patent Document 8 to collect current, or a method in which element electrodes are multilayered as in Patent Document 9 has been proposed. I came. However, in order to form the element electrode so as to reduce the resistance with respect to the semiconductor substrate, for example, after metal deposition, heat treatment is performed at about 200 to 400 ° C. for 5 to 30 minutes, or glass frit is contained. High-temperature heat treatment such as heat treatment at about 400 to 900 ° C. is required after printing the paste. When performing heat treatment, for example, in a light receiving element having a passivation film as shown in FIGS. 19A and 19B, a metal material is formed from portions other than the first opening 12h and the second opening 14h which are contact holes. The semiconductor film reaches the semiconductor substrate by diffusing through the passivation film 18a or through a pinhole formed accidentally in the passivation film. In such a case, there is a problem that the metal acts as a recombination center in the semiconductor and the photoelectric conversion efficiency of the light receiving element is lowered. In particular, when a metal exists in a region having a low conductivity in a semiconductor in which a diffusion layer region such as 16, 17a, and 17b in FIG. 31 is not formed, the metal acts strongly as a recombination center.
 さらにまた、一方の極性の電極が半導体基板上に形成された薄い無機絶縁層を介して他方の極性を有する半導体領域上に形成される構造の場合、金属の拡散あるいは絶縁膜に存在するピンホールを通じて異なる電位を有する半導体層と金属とが短絡してしまうため、両極間のリーク電流が増大することが非特許文献1に記載されている。この場合、リーク電流が増大することにより光電変換効率の低下が顕著になるとともに、逆バイアス時には素子が発熱して封止材が溶融する等の素子モジュールの信頼性が失われるという問題があった。また特に、金属の拡散経路となるピンホールは太陽電池のような凹凸の表面を有する半導体基板上のパッシベーション膜において顕著に生じるため、上記のような問題が生じ易かった。本実施の形態では、金属電極に自立可能な板あるいは箔を使用するため、絶縁膜にピンホールがあっても金属が絶縁膜に形成される微細なピンホールに追従して入っていくことはなく、半導体基板あるいは素子電極へ直接接触せず、2つの極間での短絡、あるいは半導体基板への金属の拡散を生じさせずに、低抵抗の素子間接続体30で電流搬送を行うことができるという利点がある。また、パッシベーション膜18a上にさらに厚い絶縁層26を形成しているため、コンタクトホールである第1の開口12hと第2の開口14h以外の部分から金属材料がパッシベーション膜18aを突き抜けるのを抑制することが可能となる。 Furthermore, in the case of a structure in which one polar electrode is formed on a semiconductor region having the other polarity through a thin inorganic insulating layer formed on the semiconductor substrate, metal diffusion or pinholes existing in the insulating film Non-Patent Document 1 describes that the leakage current between the two electrodes increases because the semiconductor layer and the metal having different potentials are short-circuited through each other. In this case, there is a problem that the photoelectric conversion efficiency is significantly lowered due to an increase in the leakage current, and the reliability of the element module is lost, for example, the element generates heat during the reverse bias and the sealing material melts. . In particular, pinholes serving as metal diffusion paths are conspicuously generated in a passivation film on a semiconductor substrate having an uneven surface such as a solar cell, and thus the above-described problems are likely to occur. In this embodiment, since a plate or foil that can stand on the metal electrode is used, even if there is a pinhole in the insulating film, it is not possible for the metal to follow the fine pinhole formed in the insulating film. In addition, it is possible to carry current by the low-resistance inter-element connection body 30 without causing direct contact with the semiconductor substrate or the element electrode, without causing a short circuit between the two electrodes, or causing metal diffusion to the semiconductor substrate. There is an advantage that you can. Further, since the thicker insulating layer 26 is formed on the passivation film 18a, the metal material is prevented from penetrating the passivation film 18a from portions other than the first opening 12h and the second opening 14h which are contact holes. It becomes possible.
 さらに、例えば非特許文献1では、一方の極性を有する半導体層上に他方の極性の電極が半導体基板上に形成された薄い無機絶縁層を介して、直接接触する構造が提案されている。上記構造の場合、絶縁膜に存在するピンホールを通じて半導体基板上に直接金属が形成される部分が生じるため、電極から一方の極性を有する半導体層上に拡散した金属が異なる電位を有する半導体層と金属とが短絡してしまうため、光電変換効率の低下は顕著になる。上記問題は、薄い絶縁膜のみを介して広い面積で半導体基板と電極金属が密着し、広い面積の半導体基板上で金属を高温に加熱してしまうために生じる。さらに、上記問題は素子面積が大きいほど顕著に生じるという問題があった。これに対し、上記変形例及び本実施の形態では、樹脂層からなる厚い絶縁層26を形成しているため、非特許文献1のような問題は回避することができ、光電変換効率の向上を図ることができる。 Further, for example, Non-Patent Document 1 proposes a structure in which an electrode having the other polarity is directly in contact with a semiconductor layer having one polarity via a thin inorganic insulating layer formed on the semiconductor substrate. In the case of the above structure, a portion where metal is directly formed on the semiconductor substrate through a pinhole existing in the insulating film is generated, so that the metal diffused from the electrode onto the semiconductor layer having one polarity has a different potential from the semiconductor layer Since the metal is short-circuited, the decrease in photoelectric conversion efficiency becomes remarkable. The above problem occurs because the semiconductor substrate and the electrode metal are in close contact with each other over only a thin insulating film, and the metal is heated to a high temperature on the semiconductor substrate having a large area. Further, the above problem is more prominent as the element area is larger. On the other hand, in the modified example and the present embodiment, since the thick insulating layer 26 made of the resin layer is formed, the problem as in Non-Patent Document 1 can be avoided, and the photoelectric conversion efficiency can be improved. Can be planned.
 また、特許文献2のように、半導体基板上に直に形成された絶縁膜あるいはパッシベーション膜を介して素子電極が半導体基板上に直接接触され、当該素子電極が配線部の取出し配線と接続される素子構造においては接触抵抗を低減するための高温処理によって素子電極を構成する金属が絶縁層を拡散していき、半導体基板内へ拡散し、再結合中心として働く可能性がある。上記理由により、特許文献2では、金属の拡散を防ぐためにバリア層を形成し、多層化により工程が増えるという問題があった。 Further, as in Patent Document 2, the element electrode is directly contacted on the semiconductor substrate via an insulating film or a passivation film formed directly on the semiconductor substrate, and the element electrode is connected to the extraction wiring of the wiring portion. In the element structure, there is a possibility that the metal constituting the element electrode diffuses in the insulating layer by high temperature treatment for reducing contact resistance, diffuses into the semiconductor substrate, and functions as a recombination center. For the above reasons, Patent Document 2 has a problem in that a barrier layer is formed to prevent metal diffusion and the number of steps increases due to multilayering.
 これに対し、本実施の形態4では図31に示すように、大部分が直接半導体基板11と接しない導電体である素子間接続体30の本体部32に大面積で低抵抗の金属箔を用い、はんだ等の接合部材により比較的低い温度で素子電極である電流取出し電極15及び点状電極12Dと素子間接続体30の電流取出し部31b及び本体部32との間の導通をとる。以上のように、特許文献2,7においては素子電極を素子基板に対して積層して形成する際にピンホールあるいは熱拡散を通じて素子電極間での短絡が生じうるのに対し、本実施の形態においては絶縁膜あるいは素子基板上に金属を直接形成する構造ではなくあとから別体として導電性の板状体である金属箔を低温で接続する構造であるため、ピンホールに対して素子間接続体が追従せず、金属が半導体基板に接触せず、従って素子間接続体から素子基板あるいは逆極性の電極への短絡が生じにくい。さらに、発電素子である受光素子の半導体基板に対して素子電極を構成する金属が直接接触する領域をドーパントが比較的高濃度に添加された低抵抗半導体領域のみに限定して存在するようにすることができる。そしてさらに、ピンホールの生じにくい、ポリイミド樹脂等の樹脂を用いて十分に厚みのある絶縁層26を形成することにより絶縁性を向上させることもできる。 On the other hand, in the fourth embodiment, as shown in FIG. 31, a metal foil having a large area and low resistance is provided on the main body portion 32 of the inter-element connection body 30 which is a conductor that does not directly contact the semiconductor substrate 11. The current extraction electrode 15 and the point-like electrode 12D, which are element electrodes, and the current extraction part 31b and the main body part 32 of the inter-element connector 30 are taken at a relatively low temperature by using a joining member such as solder. As described above, in Patent Documents 2 and 7, when the element electrodes are stacked on the element substrate, a short circuit may occur between the element electrodes through pinholes or thermal diffusion. Is a structure in which metal foil, which is a conductive plate-like body, is connected at a low temperature, instead of a structure in which metal is directly formed on an insulating film or element substrate. The body does not follow and the metal does not come into contact with the semiconductor substrate. Therefore, a short circuit from the inter-element connection body to the element substrate or the electrode having the opposite polarity hardly occurs. Further, the region in which the metal constituting the device electrode is in direct contact with the semiconductor substrate of the light receiving device that is the power generation device is limited to the low resistance semiconductor region to which the dopant is added at a relatively high concentration. be able to. Further, the insulating property can be improved by forming a sufficiently thick insulating layer 26 using a resin such as a polyimide resin which is less likely to cause pinholes.
 以上のように、本実施の形態の受光素子モジュールでは、素子基板上のパッシベーション膜等の絶縁膜にピンホールがあったとしても、金属の拡散による半導体中の再結合あるいは、素子電極とその逆の極性を有する半導体層との間の短絡が生じにくいという利点を有する。以上のように短絡を抑制することにより、漏れ電流による発熱を抑制するとともに光電変換効率が向上する。 As described above, in the light receiving element module according to the present embodiment, even if there is a pinhole in an insulating film such as a passivation film on the element substrate, recombination in the semiconductor due to metal diffusion or the element electrode and vice versa. There is an advantage that short circuit between the semiconductor layers having the polarities is difficult to occur. By suppressing the short circuit as described above, heat generation due to leakage current is suppressed and photoelectric conversion efficiency is improved.
 具体的には、図29中の半導体領域がn型導電層であって、低濃度n型ドープ領域17a、高濃度n型ドープ領域17bである場合、素子電極である電流取出し電極15及び同一素子上の素子間接続体30の素子間接続部31bは光照射状態で負極となり、同一素子上の素子電極である点状電極12Dと素子間接続体30の本体部32が正極となる。本体部32を正極とした場合、図31に示すように、負の電位となる素子基板である半導体基板11及び高濃度n型ドープ領域17bの直上に、相対的に正の電位となる素子間接続体30の本体部32が絶縁層26を介して隣接する状態となるが、半導体基板に対して金属が直に接触せず、接続温度も低いため、高い絶縁性を得ることができるという利点を有する。 Specifically, when the semiconductor region in FIG. 29 is an n-type conductive layer and is a low-concentration n-type doped region 17a and a high-concentration n-type doped region 17b, the current extraction electrode 15 that is an element electrode and the same element The inter-element connection portion 31b of the upper inter-element connection body 30 becomes a negative electrode in a light irradiation state, and the point-like electrode 12D that is an element electrode on the same element and the main body portion 32 of the inter-element connection body 30 become a positive electrode. In the case where the main body 32 is a positive electrode, as shown in FIG. 31, the element substrate having a relatively positive potential is directly above the semiconductor substrate 11 and the heavily doped n-type doped region 17b, which are element substrates having a negative potential. Although the main body 32 of the connection body 30 is in an adjacent state via the insulating layer 26, the metal is not in direct contact with the semiconductor substrate and the connection temperature is low, so that high insulation can be obtained. Have
 特に、銅を電極として使用する場合は、銅はシリコン中に拡散し易いため、銅の拡散部分で短絡あるいはキャリアの再結合が非常に生じ易いという問題があった。これに対して本実施の形態においては、電気接続体21を素子電極の電気導通部にのみ存在するようにでき、また、素子間接続体30の本体部32も直接半導体基板11と接触しないため、高い絶縁性を得ることができる。従って、はんだ付け性が良好な良導体である銅を、簡便に素子内での抵抗を低減するための電極材料として使用し、一般的に素子電極に用いられ、稀少資源である銀等の使用量を低減することができるという利点を有する。 In particular, when copper is used as an electrode, since copper easily diffuses into silicon, there is a problem that a short circuit or carrier recombination is very likely to occur at the copper diffusion portion. On the other hand, in the present embodiment, the electrical connection body 21 can exist only in the electrical conduction portion of the element electrode, and the main body portion 32 of the inter-element connection body 30 does not directly contact the semiconductor substrate 11. High insulation can be obtained. Therefore, copper, which is a good conductor with good solderability, is used as an electrode material for easily reducing the resistance in the device. Generally, it is used for device electrodes and is a rare resource, such as silver. Can be reduced.
 なお、金属は半導体基板11とは低濃度のp型ドープ領域すなわちp型ドープ領域16であるp型拡散層と接しているが、本実施の形態のように比較的高濃度のドーパントが金属と接する半導体基板中に存在する場合、金属による再結合の影響は小さいため、本実施の形態において点状電極12Dを構成する金属がp型ドープ領域16を介して半導体基板11と接していることは、p型ドープ領域16以外の部分に対して金属が存在する場合に比べて大きな問題にならない。 Note that the metal is in contact with the semiconductor substrate 11 in a low-concentration p-type doped region, that is, the p-type diffusion layer which is the p-type doped region 16, but a relatively high-concentration dopant is in contact with the metal as in the present embodiment. Since the influence of recombination by the metal is small when it exists in the semiconductor substrate in contact with the semiconductor substrate 11, the metal constituting the point electrode 12 </ b> D is in contact with the semiconductor substrate 11 through the p-type doped region 16 in the present embodiment. As compared with the case where a metal is present in a portion other than the p-type doped region 16, this is not a big problem.
 さらにまた、上記の問題以外にも、特許文献1、2等の素子電極が集電を担う構造では、素子面内の集電抵抗を低減するには素子電極自体に厚みが必要であるため、真空蒸着、めっき等により素子電極の厚みを増大する工程が必要であったが、以上の実施の形態1~4に記される、本実施の形態の受光素子モジュールを用いれば一方の極の素子電極には厚みがいらず、また、素子間を接続すると同時に素子基板面内の抵抗を低減できるため工程数を低減することができるという利点を有する。また、特許文献2のようなポリイミド絶縁層と金属蒸着膜の組み合わせにおいては、モジュールの使用環境によって、樹脂絶縁層の膨潤等による体積変化に伴うひび割れあるいは形状変化によって金属蒸着膜が島状に非連続的になったり、絶縁層から剥離し、素子面内方向の金属膜の導電性が低下する恐れがあった。また、蒸着金属膜が薄い場合、水分等により金属薄膜が酸化し導電率が低下するという問題があった。これに対し、各実施の形態で用いられる素子間接続体には自立可能な厚膜の金属の連続体を用いているため、破断しにくく、素子裏面の素子間接続体の導電性を高く保つことができるという利点を有する。 Furthermore, in addition to the above problem, in the structure in which the element electrode of Patent Documents 1 and 2 bears current collection, the element electrode itself needs a thickness to reduce the current collection resistance in the element plane. Although a process for increasing the thickness of the element electrode by vacuum deposition, plating, or the like is necessary, if the light receiving element module of the present embodiment described in the first to fourth embodiments is used, the element of one pole The electrodes are not thick and have the advantage that the number of steps can be reduced because the resistance in the element substrate surface can be reduced at the same time as the elements are connected. Further, in the combination of the polyimide insulating layer and the metal vapor deposition film as in Patent Document 2, the metal vapor deposition film is not formed in an island shape due to a crack or a shape change caused by a volume change due to swelling of the resin insulation layer depending on the use environment of the module. There is a possibility that the conductivity of the metal film in the in-plane direction of the element is lowered due to continuous or peeling from the insulating layer. In addition, when the deposited metal film is thin, there is a problem that the metal thin film is oxidized by moisture or the like and the conductivity is lowered. On the other hand, since the inter-element connection body used in each embodiment is a continuous metal film that can be self-supported, it is difficult to break, and the inter-element connection body on the back surface of the element is kept highly conductive. Has the advantage of being able to.
 また、上記の問題とは別に、特許文献8、9のような素子電極に対して素子基板の面のほぼ全面にわたって素子間接続体を接続する従来の背面接続型の受光素子モジュールにおいては、素子間を接続する際に位置あわせが必要であり、また、素子間を接続する際の位置あわせ精度よりも電極素子の正極と負極間の間隔を狭くすることができないという問題があった。 In addition to the above problems, in the conventional back connection type light receiving element module in which the inter-element connection body is connected to the element electrode as in Patent Documents 8 and 9 over almost the entire surface of the element substrate, There is a problem that alignment is necessary when connecting the electrodes, and that the interval between the positive electrode and the negative electrode of the electrode element cannot be narrower than the alignment accuracy when connecting the devices.
 特許文献8、9では、同一面に2つの極性の電極が存在するために、正極と負極の素子電極と正極と負極の素子間接続体との間での位置あわせを高精度に行えない場合、正と負の電極間で短絡が生じ、モジュールの光電変換効率が大きく低下する。従って、正極と負極の素子電極と素子間接続体とが一対一で対応する必要があり、正と負の素子間接続体の電極間隔と素子の電極間とを位置合わせる必要がある。従って、素子電極と素子間接続体との間の正極-負極間の短絡を防ぐために必要な間隔は素子電極の位置精度のみではなく、素子と樹脂フィルム等からなる絶縁層との間の位置あわせ精度にも依存し、正電極と負電極の間の距離は素子と素子間接続体との間の位置あわせ精度によって制限される。正負極間での短絡を防ぐために、素子電極の正電極と負電極の間の距離が長い場合、正電極と負電極の間素子基板内で生成したキャリアが電極に到達するまでの距離が長くなるため、抵抗損失及びキャリアの失活により光電変換効率が低下してしまう。 In Patent Documents 8 and 9, since there are two polar electrodes on the same surface, alignment between the positive and negative element electrodes and the positive and negative inter-element connectors cannot be performed with high accuracy. Short circuit occurs between the positive and negative electrodes, and the photoelectric conversion efficiency of the module is greatly reduced. Therefore, it is necessary that the positive and negative element electrodes and the inter-element connector have a one-to-one correspondence, and it is necessary to align the electrode interval between the positive and negative inter-element connectors and the element electrodes. Therefore, the distance necessary to prevent a short circuit between the positive electrode and the negative electrode between the element electrode and the inter-element connector is not only the positional accuracy of the element electrode but also the alignment between the element and the insulating layer made of a resin film or the like. Depending on the accuracy, the distance between the positive electrode and the negative electrode is limited by the alignment accuracy between the element and the inter-element connector. In order to prevent a short circuit between the positive and negative electrodes, when the distance between the positive electrode and the negative electrode of the element electrode is long, the distance until the carriers generated in the element substrate reach the electrode between the positive electrode and the negative electrode is long. Therefore, the photoelectric conversion efficiency decreases due to resistance loss and carrier deactivation.
 逆に、光電変換効率向上のためには位置あわせ精度を向上させる必要があり、工程が増大する。具体的な素子電極と半導体基板との接触部分の離間距離すなわちピッチとしては、半導体素子基板内の少数キャリアの拡散長よりも小さいことが好ましく、基板の抵抗、基板の少数キャリア拡散長及び半導体の接合を形成する方法にも依存するが、例えばパッシベーション膜付きのシリコン基板ではおおよそ0.05mmから2mm程度となる。上記電極間隔で、150mm角程度の大きさの基板を使用する場合、特許文献4では正極及び負極あわせて素子間接続体100本程度を隣接する素子間接続体が互いに接触しないように精度よく並べて素子電極に接続する必要があり、更に異なる極性の各電極間は絶縁する必要があり、工程数と時間がかかるという問題があった。特許文献3においても、樹脂シートの熱収縮により位置あわせ精度が低下したり、位置あわせのためのマーキング工程が必要になったりするという問題があった。 Conversely, in order to improve the photoelectric conversion efficiency, it is necessary to improve the alignment accuracy, which increases the number of processes. The specific separation distance, that is, the pitch of the contact portion between the element electrode and the semiconductor substrate is preferably smaller than the minority carrier diffusion length in the semiconductor element substrate, and the resistance of the substrate, the minority carrier diffusion length of the substrate, and the semiconductor For example, in the case of a silicon substrate with a passivation film, the thickness is approximately 0.05 mm to 2 mm, although it depends on the method of forming the bond. In the case where a substrate having a size of about 150 mm square is used with the above electrode spacing, in Patent Document 4, about 100 inter-element connection bodies including the positive electrode and the negative electrode are arranged accurately so that adjacent inter-element connection bodies do not contact each other. There is a problem that it is necessary to connect to the device electrode, and it is necessary to insulate between the electrodes having different polarities, which requires the number of processes and time. Also in Patent Document 3, there is a problem that the alignment accuracy is lowered due to thermal contraction of the resin sheet, or a marking process for alignment is required.
 表面再結合速度の小さいパッシベーション膜で素子の表面が覆われ、素子電極部分においても再結合速度が小さい場合、特に、金属電極が透光性電極を介して半導体基板上に形成されるヘテロ接合型の太陽電池の場合は、金属電極と半導体(あるいは透光性電極)との接続部分のピッチはより狭い方が集電抵抗を低減でき、光電変換効率向上に好ましい。従って、本発明では、従来の受光素子モジュールではモジュール作成時に必要であった素子間接続体と素子との間の細かな位置あわせが不必要となり、位置あわせ精度に依存することなく素子電極の電極ピッチを狭くすることができ、正と負の電極間の間隔を狭くすることができ、簡便な構造及び方法によって光電変換効率に優れる受光素子モジュールを作成できるという利点を有する。 When the surface of the element is covered with a passivation film having a low surface recombination speed and the recombination speed is low even in the element electrode part, in particular, a heterojunction type in which a metal electrode is formed on a semiconductor substrate via a translucent electrode In the case of the solar cell, a narrower pitch of the connecting portion between the metal electrode and the semiconductor (or translucent electrode) can reduce the current collecting resistance, which is preferable for improving the photoelectric conversion efficiency. Therefore, in the present invention, the fine alignment between the inter-element connection body and the element, which is necessary at the time of creating the module in the conventional light receiving element module, is unnecessary, and the electrode of the element electrode does not depend on the alignment accuracy. The pitch can be narrowed, the distance between the positive and negative electrodes can be narrowed, and the light receiving element module having excellent photoelectric conversion efficiency can be produced by a simple structure and method.
 また、特許文献6のように素子基板と素子間接続体とをレーザーで直接接合する場合、素子間接続体は半導体基板内でドーパントとして作用する金属に限られるという問題があったが、本実施の形態によれば、はんだ、導電性接着剤等の導電性の接合部材を使用することによって種々の金属等の導電体を組み合わせて素子間接続体及び素子電極として使用することができ、耐久性、生産性、省資源性に優れたモジュールを製造できるという利点を有する。 In addition, when the element substrate and the inter-element connection body are directly joined by laser as in Patent Document 6, the inter-element connection body is limited to a metal acting as a dopant in the semiconductor substrate. According to the embodiment, by using a conductive bonding member such as solder or conductive adhesive, various metal or other conductive materials can be combined and used as an inter-element connection body and an element electrode. In addition, it has an advantage that a module excellent in productivity and resource saving can be manufactured.
 また、特許文献1においては、素子間接続体と素子電極をあわせて素子面積とほぼ同程度までの面積しか電極として使用することができないが、本実施の形態によれば、2層の素子間接続体をもつ電極取出し構造とすることにより素子間接続体と素子電極をあわせて素子面積のおおよそ倍の面積を電極として使用することができる。さらに素子間接続体は金属箔あるいは金属板で構成されるため、素子上に形成される素子電極に比べ極めて低抵抗であり、モジュール全体の抵抗を低減できると共に、素子間接続体の厚みを一般的な素子間接続体に比べて、薄くすることができるため、はんだ付け等の接続工程によって素子に生じる応力が小さくて済むという利点を有する。 Further, in Patent Document 1, the inter-element connection body and the element electrode can be used as an electrode only in an area up to about the same as the element area. By adopting an electrode extraction structure having a connection body, the inter-element connection body and the element electrode can be combined to use an area approximately twice the element area as the electrode. Furthermore, since the inter-element connection body is composed of a metal foil or a metal plate, it has extremely low resistance compared to the element electrode formed on the element, so that the overall module resistance can be reduced and the inter-element connection body thickness is generally reduced. Since it can be made thinner than a typical inter-element connection body, there is an advantage that the stress generated in the element due to a connecting process such as soldering can be reduced.
 また、特許文献4あるいは特許文献11と比較した場合は、素子間接続体の本体部の各幅が、素子間接続体の素子間部の幅よりも広く、半導体基板上に広く分布した第1の素子電極である線状電極12あるいは点状電極12のほぼ全域を覆うことができるため、素子基板面内の集電抵抗を低くすることができるという利点を有する。 Further, when compared with Patent Document 4 or Patent Document 11, each width of the body portion of the inter-element connection body is wider than the width of the inter-element portion of the inter-element connection body, and is widely distributed on the semiconductor substrate. Since it is possible to cover almost the entire area of the linear electrode 12 or the dotted electrode 12 which is the element electrode, there is an advantage that the current collecting resistance in the element substrate surface can be lowered.
 また、本発明の方法を用いれば受光素子毎に素子間接続体を接続していき、受光素子を交換する場合には、受光素子を素子間接続体から外して再度新たな素子をつけることができるため、受光素子の無駄を少なくすることができる。 Further, when the method of the present invention is used, the inter-element connection body is connected for each light receiving element, and when the light receiving element is replaced, the light receiving element is removed from the inter-element connection body and a new element is attached again. Therefore, the waste of the light receiving element can be reduced.
 以上の実施の形態ではシリコン基板への不純物拡散によって作成した受光素子を例に記載したが、アモルファスシリコンと単結晶シリコンとのヘテロ接合太陽電池、半導体基板としてGaAs等の化合物半導体基板を用いたヘテロ接合受光素子、ひいては発光素子等、光電変換素子全般にわたって適用可能である。また、上記実施の形態では集光しない用途の太陽電池について記載したが、集光系を有する太陽電池に用いてもよい。集光系を有する太陽電池の場合は、素子のサイズをより小さくし、素子間を広げて、受光面材は平坦な板ガラスではなく、素子毎に対応するレンズをもつ透光部材を用いればよく、基本的な構造は実施の形態で説明した構造と変わらない。また、本実施の形態の受光素子モジュールは受光面側に電極を含まないため一様な外観とすることができるため、意匠性が高く、時計用電源等あるいは受光センサー等の外部取付け素子に用いることもできる。 In the above embodiment, the light receiving element formed by impurity diffusion into the silicon substrate is described as an example. However, the heterojunction solar cell of amorphous silicon and single crystal silicon, and the heterojunction using a compound semiconductor substrate such as GaAs as the semiconductor substrate. The present invention can be applied to all types of photoelectric conversion elements such as a junction light receiving element and a light emitting element. Moreover, although the solar cell of the use which does not condense was described in the said embodiment, you may use for the solar cell which has a condensing system. In the case of a solar cell having a condensing system, the size of the element is made smaller, the space between the elements is expanded, and the light receiving surface material is not a flat plate glass, but a translucent member having a lens corresponding to each element may be used. The basic structure is the same as that described in the embodiment. In addition, since the light receiving element module according to the present embodiment does not include electrodes on the light receiving surface side and can have a uniform appearance, it has high designability and is used for an external mounting element such as a power source for a watch or a light receiving sensor. You can also.
 また、前記実施の形態においては、例えば図4(d)に示したように、一方の極性をもつ第2の素子電極は電流取出し電極15と集電電極14との2つの部分に分けて記載している。電流取出し電極15とは、素子上に形成される素子電極であって、素子間接続体と接続することを主な目的とする素子電極の一部分を指す。また、集電電極14は素子間接続体と接続されない一方で電流取出し電極と接続され、半導体基板面上で電流取出し電極まで電流を集電することを目的とした素子電極である。例えば、特許文献12に示すように、素子上の電極としてバス電極が形成されておらず、フィンガー電極に直接タブ電極すなわち素子間接続体が接続されている構造もある。上記構造ではフィンガー電極のうち直接素子間接続体と接触している部分を電流取出し電極とし、フィンガー電極のうち素子間接続体と接触していない部分を集電電極とし、電流取出し電極15のようないわゆるバス電極を持たない受光素子基板に対して各実施の形態の構成の素子間接続体を持つ受光素子モジュールを適用することも可能である。 In the embodiment, for example, as shown in FIG. 4D, the second element electrode having one polarity is divided into two parts, ie, a current extraction electrode 15 and a current collecting electrode 14. is doing. The current extraction electrode 15 is an element electrode formed on the element, and indicates a part of the element electrode whose main purpose is to be connected to the inter-element connector. The current collecting electrode 14 is not connected to the inter-element connection body, but is connected to the current extraction electrode, and is an element electrode for collecting current up to the current extraction electrode on the semiconductor substrate surface. For example, as shown in Patent Document 12, there is a structure in which a bus electrode is not formed as an electrode on an element, and a tab electrode, that is, an inter-element connector is directly connected to the finger electrode. In the above structure, a portion of the finger electrode that is in direct contact with the inter-element connection body is used as a current extraction electrode, and a portion of the finger electrode that is not in contact with the inter-element connection body is a current collection electrode. It is also possible to apply a light receiving element module having an inter-element connection body according to each embodiment to a light receiving element substrate having no so-called bus electrode.
 さらにまた、素子電極構造については前述した実施の形態に限定されることなく、例えば半導体と直に接触して集電電極に接続される、別の種類の素子電極構造をもつものにも適用可能である。また、前記実施の形態においては、第1の素子電極は主に集電電極のみを有する場合を扱うが、素子間接続体の本体部と接続されるため、機能としては電流取出し電極としての機能も有する。第1の素子電極においても集電電極とは別に電流取出し電極を有していてもよい。 Furthermore, the element electrode structure is not limited to the above-described embodiment, and can be applied to, for example, a device having another type of element electrode structure that is in direct contact with a semiconductor and connected to the current collecting electrode. It is. Moreover, in the said embodiment, although the case where the 1st element electrode mainly has only a current collection electrode is handled, since it connects with the main-body part of an inter-element connection body, it functions as a current extraction electrode. Also have. The first element electrode may also have a current extraction electrode in addition to the current collecting electrode.
 また、本発明は素子電極と素子間接続体、両者の間の接続構造に関するものであるため、用いる素子構造としては背面接続型の素子構造であればよく、素子内に形成される接合は任意のものでよい。例えば発光素子に関してはpn接合のみでなくGaNとGaInNによるダブルヘテロジャンクション接合等を用いたものであってもよい。 In addition, since the present invention relates to a device electrode and an inter-element connection body, and a connection structure between them, the device structure to be used may be a back-connection type device structure, and the junction formed in the device is arbitrary. Can be used. For example, regarding the light emitting element, not only a pn junction but also a double heterojunction junction of GaN and GaInN may be used.
 また、本発明において、直接接触するとは、めっき層、導電性接着剤等の導電性部材を介して接触するものを含み、接触抵抗の小さい状態で接触することをいう。 Further, in the present invention, the term “direct contact” means that the contact is made with a low contact resistance, including a contact through a conductive member such as a plating layer or a conductive adhesive.
 以上の実施の形態に示した構成は、本発明の内容の一例を示すものであり、別の技術と組み合わせることも可能であるし、本発明の要旨を逸脱しない範囲で、構成の一部を省略、変更することも可能である。 The configuration described in the above embodiment shows an example of the content of the present invention, and can be combined with another technique, and a part of the configuration can be used without departing from the gist of the present invention. It can be omitted or changed.
 1 受光素子モジュール、10,10a~10f 受光素子、11 半導体基板、12 線状電極、12D 点状電極、12h 第1の開口部、12a 負極第1層、12b 負極第2層、12c 負極第3層、12d 負極第4層、13 電流取出し電極、14h 第2の開口部、14 集電電極、14a 正極第1層、14b 正極第2層、14c 正極第3層、15 電流取出し電極、16 p型ドープ領域、17 n型ドープ領域、17a 高濃度n型ドープ領域、17b 低濃度n型ドープ領域、17S 表面電界層、18a 第1パッシベーション膜、18b 第2パッシベーション膜、18c 第3パッシベーション膜、21 電気接続体、22 封止材、23 表面側主面材、25 裏面側主面材、26 接着層(あるいは絶縁層)、30 素子間接続体、31 素子間接続部、31a 素子間部、31b 電流取出し電極接続部、32 本体部、32P 凸部、32R 凹部、33 第2の電気接続体、38 電流引き出し線、52 反射層。 1 light receiving element module, 10, 10a to 10f light receiving element, 11 semiconductor substrate, 12 linear electrode, 12D dotted electrode, 12h first opening, 12a negative electrode first layer, 12b negative electrode second layer, 12c negative electrode third Layer, 12d negative electrode fourth layer, 13 current extraction electrode, 14h second opening, 14 current collecting electrode, 14a positive electrode first layer, 14b positive electrode second layer, 14c positive electrode third layer, 15 current extraction electrode, 16p Type doped region, 17 n type doped region, 17a high concentration n type doped region, 17b low concentration n type doped region, 17S surface electric field layer, 18a first passivation film, 18b second passivation film, 18c third passivation film, 21 Electrical connection body, 22 sealing material, 23 front side main surface material, 25 back side main surface material, 26 adhesive layer Insulating layer), 30 inter-element connection body, 31 inter-element connection section, 31a inter-element connection section, 31b current extraction electrode connection section, 32 main body section, 32P convex section, 32R concave section, 33 second electrical connection body, 38 current extraction Line, 52 reflective layer.

Claims (20)

  1.  半導体基板の背面側に極性の異なる第1及び第2の素子電極を有する、背面接続型の光電変換素子と、
     本体部と、前記本体部に接続される素子間接続部とを備え、前記光電変換素子を隣接する光電変換素子に接続する導電板からなる素子間接続体とを備えた光電変換素子モジュールであって、
     前記第1及び第2の素子電極は平面配置され、
     前記第2の素子電極は、前記素子間接続部と接続される電流取出し電極と前記電流取出し電極に接続される複数の集電電極とから構成され、
     前記第2の素子電極の集電電極は、前記半導体基板の背面上で前記素子間接続部と交差して接続する部分を有し、
     前記第1の素子電極は、前記素子間接続部によって分断された複数の領域を有し、
     前記素子間接続体の本体部は板状であり、前記本体部の幅は、前記素子間接続部の幅よりも広く、前記光電変換素子裏面の前記第1の素子電極とは直接電気的に接続されるとともに、前記第2の素子電極とは絶縁され、
     前記本体部と電気的に接続された素子間接続体の素子間接続部が隣接配置される光電変換素子の第2の素子電極の電流取出し電極と直接接続されたこと、
    を特徴とする光電変換素子モジュール。
    A back connection type photoelectric conversion element having first and second element electrodes having different polarities on the back side of the semiconductor substrate;
    A photoelectric conversion element module comprising a main body part and an inter-element connection part connected to the main body part, and comprising an inter-element connection body made of a conductive plate for connecting the photoelectric conversion element to an adjacent photoelectric conversion element. And
    The first and second element electrodes are arranged in a plane,
    The second element electrode is composed of a current extraction electrode connected to the inter-element connection portion and a plurality of current collecting electrodes connected to the current extraction electrode,
    The collector electrode of the second element electrode has a portion that crosses and connects to the inter-element connection portion on the back surface of the semiconductor substrate,
    The first element electrode has a plurality of regions divided by the inter-element connection portion,
    The body part of the inter-element connection body has a plate shape, and the width of the body part is wider than the width of the inter-element connection part, and is directly electrically connected to the first element electrode on the back surface of the photoelectric conversion element. And is insulated from the second element electrode,
    The inter-element connection portion of the inter-element connection body electrically connected to the main body portion is directly connected to the current extraction electrode of the second element electrode of the photoelectric conversion element that is adjacently disposed,
    A photoelectric conversion element module.
  2.  前記第2の素子電極は、前記半導体基板の背面上の同一面内で交差して接続する部分を有し、
     前記第1の素子電極は、前記第2の素子電極によって分断された複数の領域を有し、
     前記素子間接続部が、前記第2の素子電極の電流取出し電極に沿って配置され、前記電流取出し電極に直接接続されること、
    を特徴とする請求項1に記載の光電変換素子モジュール。
    The second element electrode has a portion that intersects and connects in the same plane on the back surface of the semiconductor substrate,
    The first element electrode has a plurality of regions divided by the second element electrode,
    The inter-element connection portion is disposed along a current extraction electrode of the second element electrode, and is directly connected to the current extraction electrode;
    The photoelectric conversion element module according to claim 1.
  3.  前記本体部は、前記素子間接続部の形状に対応した切欠きを有し、前記素子間接続部と相補的形状をなすこと、
    を特徴とする請求項1または2に記載の光電変換素子モジュール。
    The main body has a notch corresponding to the shape of the inter-element connection portion, and has a complementary shape with the inter-element connection portion;
    The photoelectric conversion element module according to claim 1 or 2.
  4.  同一光電変換素子上に位置する、素子間接続体の本体部と、隣接する素子の素子間接続体の素子間接続部とが、同一平面上に並置されたこと、
    を特徴とする請求項1から3のいずれか1項に記載の光電変換素子モジュール。
    The body part of the inter-element connection body located on the same photoelectric conversion element and the inter-element connection part of the inter-element connection body of the adjacent elements are juxtaposed on the same plane,
    The photoelectric conversion element module according to any one of claims 1 to 3, wherein:
  5.  前記第2の素子電極は、一定の間隔で互いに平行にグリッド状に配置された集電電極と、前記集電電極と交わり前記集電電極を相互接続する電流取出し電極とで構成され、
     前記第1の素子電極は、前記第2の素子電極によって分断された複数の領域で構成されたこと、
    を特徴とする請求項1から4のいずれか1項に記載の光電変換素子モジュール。
    The second element electrode includes a collecting electrode arranged in a grid parallel to each other at a constant interval, and a current extraction electrode that intersects the collecting electrode and interconnects the collecting electrode.
    The first element electrode is composed of a plurality of regions divided by the second element electrode;
    The photoelectric conversion element module according to claim 1, wherein:
  6.  前記本体部は前記第2の素子電極とは絶縁層を介して当接し、
     前記絶縁層が樹脂層であること、
    を特徴とする請求項1から5のいずれか1項に記載の光電変換素子モジュール。
    The main body abuts on the second element electrode through an insulating layer,
    The insulating layer is a resin layer;
    The photoelectric conversion element module according to any one of claims 1 to 5, wherein:
  7.  前記素子間接続体の本体部が金属板であり、
     前記本体部は、前記第1の素子電極と、はんだあるいは導電性接着剤により接続されること、
    を特徴とする請求項1から6のいずれか1項に記載の光電変換素子モジュール。
    The body part of the inter-element connection body is a metal plate,
    The main body is connected to the first element electrode by solder or conductive adhesive;
    The photoelectric conversion element module according to claim 1, wherein:
  8.  前記金属板は銅箔であり、
     前記本体部は、前記第1の素子電極とはんだにより接続されること、
    を特徴とする請求項7に記載の光電変換素子モジュール。
    The metal plate is a copper foil,
    The body is connected to the first element electrode by solder;
    The photoelectric conversion element module according to claim 7.
  9.  前記本体部の基材が、銅またはアルミニウムであること、
    を特徴とする請求項1から8のいずれか1項に記載の光電変換素子モジュール。
    The base material of the main body is copper or aluminum;
    The photoelectric conversion element module according to claim 1, wherein:
  10.  前記第2の素子電極の表面が、前記第1の素子電極の表面よりも前記半導体基板側にある請求項1から9のいずれか1項に記載の光電変換素子モジュール。 The photoelectric conversion element module according to any one of claims 1 to 9, wherein a surface of the second element electrode is closer to the semiconductor substrate than a surface of the first element electrode.
  11.  前記半導体基板は、第1導電型のシリコン基板であり、
     前記第1の素子電極は前記シリコン基板内に形成された第1導電型半導体領域に接続され、
     前記第2の素子電極は前記シリコン基板内に形成された第2導電型半導体領域に接続され、
     前記第1導電型半導体領域表面は前記第2導電型半導体領域よりも高い位置に形成された請求項1から10のいずれか1項に記載の光電変換素子モジュール。
    The semiconductor substrate is a first conductivity type silicon substrate;
    The first element electrode is connected to a first conductivity type semiconductor region formed in the silicon substrate,
    The second element electrode is connected to a second conductivity type semiconductor region formed in the silicon substrate,
    11. The photoelectric conversion element module according to claim 1, wherein the surface of the first conductivity type semiconductor region is formed at a position higher than the second conductivity type semiconductor region.
  12.  前記半導体基板は、n型シリコン基板であり、
     前記第1の素子電極は、前記n型シリコン基板内に形成され、前記n型シリコン基板内よりも高濃度のn+型半導体領域に接続され、
     前記第2の素子電極は、前記n型シリコン基板内に形成されたp型半導体領域に接続され、
     前記p型半導体領域表面は、前記n+型半導体領域よりも高い位置に形成されたこと、
    を特徴とする請求項1から10のいずれか1項に記載の光電変換素子モジュール。
    The semiconductor substrate is an n-type silicon substrate;
    The first element electrode is formed in the n-type silicon substrate and connected to an n + type semiconductor region having a higher concentration than in the n-type silicon substrate,
    The second element electrode is connected to a p-type semiconductor region formed in the n-type silicon substrate,
    The p-type semiconductor region surface is formed at a position higher than the n + -type semiconductor region;
    The photoelectric conversion element module according to claim 1, wherein:
  13.  前記素子間接続体の前記本体部と前記第2導電型半導体領域との間に絶縁性の樹脂層を有すること、
    を特徴とする請求項12に記載の光電変換素子モジュール。
    Having an insulating resin layer between the main body of the inter-element connector and the second conductive semiconductor region;
    The photoelectric conversion element module according to claim 12.
  14.  前記第1及び第2の素子電極上の素子間接続体との接続領域のみに、選択的に電気接続体が形成されること、
    を特徴とする請求項1から13のいずれか1項に記載の光電変換素子モジュール。
    An electrical connection is selectively formed only in a connection region with the inter-element connection on the first and second element electrodes;
    The photoelectric conversion element module according to claim 1, wherein:
  15.  前記素子間接続体の本体部は、凹凸構造を有すること、
    を特徴とする請求項1から14のいずれか1項に記載の光電変換素子モジュール。
    The main body of the inter-element connector has an uneven structure;
    The photoelectric conversion element module according to claim 1, wherein:
  16.  前記本体部の凹凸構造の受光面側へ凹となる部分の幅が、前記第1の素子電極の幅よりも狭いこと、
    を特徴とする請求項15に記載の光電変換素子モジュール。
    The width of the concave portion on the light receiving surface side of the concavo-convex structure of the main body is narrower than the width of the first element electrode;
    The photoelectric conversion element module according to claim 15.
  17.  前記本体部の凹凸構造の受光面側へ凸となる部分の断面の幅が、前記第1の素子電極間の間隙よりも広いこと、
    を特徴とする前記請求項15または16に記載の光電変換素子モジュール。
    The width of the cross section of the convex portion toward the light receiving surface of the concavo-convex structure of the main body is wider than the gap between the first element electrodes;
    The photoelectric conversion element module according to claim 15 or 16, wherein:
  18.  半導体基板の背面側に極性の異なる第1及び第2の素子電極を有する、背面接続型の光電変換素子と、
     本体部と、前記本体部に接続される素子間接続部とを備え、前記光電変換素子を、隣接する光電変換素子に接続する、導電板からなる素子間接続体とを備えた光電変換素子モジュールであって、
     前記第1及び第2の素子電極は平面配置され、
     前記第2の素子電極は、電流取出し電極と前記電流取出し電極に接続される複数の集電電極とから構成され、
     前記第2の素子電極は、前記半導体基板の背面上の同一面内で交差して接続する部分を有し、
     前記第1の素子電極は、前記電流取出し電極によって分断された複数の領域を有し、
     前記素子間接続体は、
     複数の短冊状体に分割され、前記第1の素子電極に当接する本体部と、
     前記本体部の間に配され、前記電流取出し電極に当接する短冊状の金属板からなる電流取出し電極接続部と、
     前記電流取出し電極接続部及び前記本体部に一端を接続され、他端を隣接セルの本体部及び電流取出し電極接続部に接続される、素子間部とで構成されたこと、
    を特徴とする光電変換素子モジュール。
    A back connection type photoelectric conversion element having first and second element electrodes having different polarities on the back side of the semiconductor substrate;
    A photoelectric conversion element module comprising a main body portion and an inter-element connection portion connected to the main body portion, and comprising an inter-element connection body made of a conductive plate for connecting the photoelectric conversion element to an adjacent photoelectric conversion element. Because
    The first and second element electrodes are arranged in a plane,
    The second element electrode includes a current extraction electrode and a plurality of current collecting electrodes connected to the current extraction electrode.
    The second element electrode has a portion that intersects and connects in the same plane on the back surface of the semiconductor substrate,
    The first element electrode has a plurality of regions divided by the current extraction electrode,
    The inter-element connector is
    A main body divided into a plurality of strips and abutting against the first element electrode;
    A current extraction electrode connecting portion made of a strip-shaped metal plate disposed between the main body portions and in contact with the current extraction electrode;
    One end is connected to the current extraction electrode connection portion and the main body portion, and the other end is connected to the main body portion and current extraction electrode connection portion of an adjacent cell, and is configured with an inter-element portion.
    A photoelectric conversion element module.
  19.  半導体基板の背面側に、重なりあう部分を持たず平面配置された、極性の異なる第1及び第2の素子電極を有するとともに、
     前記第2の素子電極は、電流取出し電極と前記電流取出し電極に接続される複数の集電電極とから構成され、
     前記第2の素子電極は、同一面内で交差して接続する部分を有し、
     前記第1の素子電極は、前記電流取出し電極によって分断された複数の領域を有する、背面接続型の光電変換素子を形成する工程と、
     本体部と、前記本体部に接続される素子間部とを備えた素子間接続体を形成する工程と、
     前記素子間接続体の本体部が、前記光電変換素子裏面の前記第1の素子電極とは直接電気的に接続するとともに、前記第2の素子電極とは絶縁層を介して当接して電気的に絶縁し、
     前記本体部と電気的に接続された素子間接続体の素子間接続部を隣接配置される光電変換素子の第2の素子電極の電流取出し電極と直接接続し、
     前記光電変換素子を、隣接する光電変換素子に接続する工程とを含む、
    ことを特徴とする光電変換素子モジュールの製造方法。
    On the back side of the semiconductor substrate, there are first and second element electrodes having different polarities arranged in a plane without overlapping portions,
    The second element electrode includes a current extraction electrode and a plurality of current collecting electrodes connected to the current extraction electrode.
    The second element electrode has a portion that intersects and connects in the same plane,
    A step of forming a back connection type photoelectric conversion element, wherein the first element electrode has a plurality of regions separated by the current extraction electrode;
    Forming an inter-element connection body including a main body portion and an inter-element portion connected to the main body portion;
    The body part of the inter-element connection body is directly electrically connected to the first element electrode on the back surface of the photoelectric conversion element, and is in contact with the second element electrode through an insulating layer to be electrically connected. Insulate and
    Directly connecting the inter-element connection portion of the inter-element connection body electrically connected to the main body portion with the current extraction electrode of the second element electrode of the photoelectric conversion element disposed adjacently,
    Connecting the photoelectric conversion element to an adjacent photoelectric conversion element,
    A method for producing a photoelectric conversion element module, comprising:
  20.  前記接続する工程に先立ち、
     素子電極上に電解めっきにより金属を選択的に堆積する選択めっき工程を含むこと、
    を特徴とする請求項19に記載の光電変換素子モジュールの製造方法。
    Prior to the connecting step,
    Including a selective plating step of selectively depositing metal on the device electrode by electrolytic plating;
    The method for producing a photoelectric conversion element module according to claim 19.
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