WO2015052906A1 - Filtration device - Google Patents

Filtration device Download PDF

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WO2015052906A1
WO2015052906A1 PCT/JP2014/005068 JP2014005068W WO2015052906A1 WO 2015052906 A1 WO2015052906 A1 WO 2015052906A1 JP 2014005068 W JP2014005068 W JP 2014005068W WO 2015052906 A1 WO2015052906 A1 WO 2015052906A1
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treated water
filtration
water
pump
treated
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PCT/JP2014/005068
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French (fr)
Japanese (ja)
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崇史 橋本
伸浩 青木
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メタウォーター株式会社
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D29/00Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62Regenerating the filter material in the filter
    • B01D29/66Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D65/00Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/02Membrane cleaning or sterilisation ; Membrane regeneration
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2201/00Details relating to filtering apparatus
    • B01D2201/20Pressure-related systems for filters
    • B01D2201/204Systems for applying vacuum to filters
    • B01D2201/206Systems for applying vacuum to filters by the weight of the liquid in a tube, e.g. siphon, barometric leg
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2321/00Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
    • B01D2321/04Backflushing

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

This filtration device is provided with: a filtration unit having a filtration material; a pump; piping for water to be treated, the piping connecting the discharge opening of the pump and the filtration unit; a treated-water storage tank having a treated-water flow outlet; treated-water piping for connecting the treated-water storage tank and the filtration unit at a position below the treated-water flow outlet; a siphon pipe having one end connected to the piping for water to be treated and the other end located below the vertical position of the treated-water flow outlet, the siphon pipe being extended vertically upward to a position higher than the position of the treated-water flow outlet by a predetermined distance; a control unit for controlling the drive and stop of the pump; a reverse cleaning start detection means for detecting the start of reverse cleaning of the filtration material, the start of reverse cleaning being initiated by the formation of a siphon; and a reverse cleaning completion detection means for detecting the timing of the completion of the reverse cleaning.

Description

ろ過装置Filtration device
 本発明は、ろ過装置に関し、特に、サイホン管を利用した逆洗機構を備えるろ過装置に関するものである。 The present invention relates to a filtration device, and more particularly to a filtration device having a backwashing mechanism using a siphon tube.
 飲料水などの浄水を得るためには、ろ過処理を含む種々の水処理が行われることが一般的である。なかでも、ろ過膜に水を通して、水中の懸濁物質やコロイドを物理的に分離する膜ろ過装置は、利便性が高く、上水施設等で頻繁に用いられている。一方、膜ろ過装置は、ろ過の過程でろ過膜が汚れて目詰まりするため、定期的な洗浄やろ過膜自体の交換が必要である。この定期的な洗浄には物理洗浄と薬品洗浄があり、物理洗浄には、ろ過方向とは逆の方向から膜ろ過水等の清浄水をろ過膜に通水してろ過膜を逆洗する方法がある。 In order to obtain purified water such as drinking water, various water treatments including filtration treatment are generally performed. Among them, a membrane filtration device that physically separates suspended substances and colloids in water by passing water through the filtration membrane is highly convenient and is frequently used in water supply facilities. On the other hand, in the membrane filtration device, the filtration membrane becomes dirty and clogged in the process of filtration, and therefore it is necessary to periodically clean and replace the filtration membrane itself. This regular cleaning includes physical cleaning and chemical cleaning. In physical cleaning, clean water such as membrane filtration water is passed through the filtration membrane from the direction opposite to the filtration direction, and the filtration membrane is back-washed. There is.
 ここで、特に発展途上国などにおいては、低コストで容易に浄水を製造する観点から、装置構造が簡素で運転管理が容易なろ過装置が求められている。そのため、ろ過膜等のろ過材を逆洗する逆洗機構についても、装置構造の簡素化および運転管理の容易化が求められている。 Here, particularly in developing countries and the like, from the viewpoint of easily producing purified water at a low cost, a filtration device with a simple device structure and easy operation management is required. Therefore, the backwashing mechanism for backwashing filter media such as filtration membranes is also required to simplify the device structure and facilitate the operation management.
 このような要求に対し、従来、ろ過装置においてろ過材が所定の目詰まり状態に到達すると自動的に作動し、ろ過材を逆洗してろ過機能を回復することができるサイホン式逆洗装置を備えるろ過装置が提案されてきた(例えば、特許文献1参照)。特許文献1に記載のサイホン式逆洗装置を備えるろ過装置によれば、ろ過材を収容したろ過槽と、ろ過槽内のろ過材に対して上方から原水を供給する原水供給管と、ろ過槽の上方に形成されてろ過水を逆洗水として貯留する逆洗水貯留槽と、ろ過材よりも上方でろ過槽に連通するサイホン管とを備えているので、ろ過材部分での圧力損失(差圧)が所定値に達すると、自動的にサイホンが形成されて逆洗水貯留槽内のろ過水がろ過槽内およびサイホン管を通って外部へと流れる。従って、特許文献1に記載のサイホン式逆洗装置を備えるろ過装置によれば、簡素な装置構成でろ過材を自動的に逆洗することができる。 In response to such demands, a siphon-type backwash device that automatically operates when the filter media reaches a predetermined clogged state in a filtration device and can restore the filtration function by backwashing the filter media is conventionally provided. A filtration device provided has been proposed (see, for example, Patent Document 1). According to the filtration device provided with the siphon-type backwash device described in Patent Document 1, a filtration tank containing the filtration material, a raw water supply pipe for supplying raw water from above to the filtration material in the filtration tank, and a filtration tank Is provided with a backwash water storage tank that is formed above and stores filtered water as backwash water, and a siphon tube that communicates with the filter tank above the filter medium. When the pressure difference reaches a predetermined value, a siphon is automatically formed, and the filtrate in the backwash water storage tank flows to the outside through the filter tank and the siphon tube. Therefore, according to the filtration device provided with the siphon type backwash device described in Patent Document 1, the filter medium can be automatically backwashed with a simple device configuration.
特開昭58-14911号公報JP 58-14911 A
 ここで、特許文献1に記載のろ過装置は、ろ過材に対して上方から原水を供給し、重力を利用してろ過を行う重力ろ過装置である。そして、重力ろ過を用いた特許文献1に記載のろ過装置では、サイホンが形成される前(即ち、ろ過中)は、サイホン管内の水位と、ろ過槽内の水位とが等しくなるので、原水供給管をサイホン管の頂部よりも上方に配置する必要があると共に、ろ過材の上部に十分なスペースが必要であった。そのため、特許文献1に記載のサイホン式逆洗装置を用いたろ過装置には、設置場所が限定されるという問題があった。 Here, the filtration device described in Patent Document 1 is a gravity filtration device that supplies raw water to the filter medium from above and performs filtration using gravity. And in the filtration apparatus of patent document 1 using gravity filtration, since the water level in a siphon pipe | tube and the water level in a filtration tank become equal before a siphon is formed (namely, during filtration), raw water supply It was necessary to arrange the tube above the top of the siphon tube, and sufficient space was required above the filter medium. Therefore, the filtration device using the siphon type backwash device described in Patent Document 1 has a problem that the installation place is limited.
 このような設置場所の問題に対し、本発明者らは、ろ過方式を重力ろ過方式とせずに、ポンプを用いて加圧した原水をろ過材に供給してろ過を行うことで、原水供給管の設置位置の限定やろ過材の上部のスペースの確保を不要とすることに着想した。しかし、本発明者らが更に検討を進めた結果、サイホン式逆洗装置を備えるろ過装置においてポンプを使用した場合には、ポンプから供給された大量の原水がサイホン形成時にサイホン管内を流れてしまい、効果的に逆洗を行うことができないという問題が生じることが明らかになった。 In response to such a problem of installation location, the present inventors do not use a gravity filtration method as a filtration method, but supply raw water pressurized with a pump to a filter medium to perform filtration, thereby providing a raw water supply pipe. The idea was to make it unnecessary to limit the installation position of the filter and to secure the space above the filter medium. However, as a result of further investigation by the present inventors, when a pump is used in a filtration device equipped with a siphon-type backwash device, a large amount of raw water supplied from the pump flows in the siphon tube when the siphon is formed. It has become clear that there is a problem that the backwashing cannot be performed effectively.
 そこで、本発明は、原水をポンプにより汲み上げてろ過材を通過させる構成と、サイホン式の逆洗機構とを併用した、装置構造が簡素で運転管理が容易なろ過装置において、効率的な逆洗を可能とすることを目的とする。 In view of this, the present invention provides an efficient backwashing in a filtration device that has a simple device structure and easy operation management, using a configuration in which raw water is pumped up by a pump and passed through a filter medium and a siphon type backwashing mechanism. It aims to make it possible.
 この発明は、上記課題を有利に解決することを目的とするものであり、本発明のろ過装置は、ろ過材により内部が一次側領域と二次側領域とに区分され、被処理水をろ過材でろ過して処理水を得るろ過部と、前記一次側領域に前記被処理水を送出するポンプと、前記ポンプの吐出口と前記一次側領域とを接続する被処理水配管と、鉛直方向の位置が前記ろ過部よりも上方であり、前記ろ過材でろ過されて前記二次側領域から流出した前記処理水を貯留する処理水貯留槽と、前記処理水貯留槽に設けられた処理水流出口と、前記処理水流出口よりも下方で前記処理水貯留槽と前記二次側領域とを接続する処理水配管と、一端が前記ポンプと前記ろ過部との間で前記被処理水配管に接続され、他端が前記処理水流出口の鉛直方向位置よりも下方に位置し、前記一端と前記他端との間で前記処理水流出口の位置よりも鉛直方向に所定の高さだけ高い位置まで立ち上げられたサイホン管と、前記ポンプの駆動および停止を制御する制御部と、を備え、前記サイホン管を介したサイホンの形成により前記処理水を用いて前記ろ過材を逆洗可能であり、前記サイホン管を介したサイホンの形成による前記ろ過材の逆洗開始を検知する逆洗開始検知手段と、逆洗の終了タイミングを検知する逆洗終了検知手段とを更に備え、前記制御部は、前記逆洗開始検知手段の検知結果に基づいて前記ポンプを停止し、前記逆洗終了検知手段の検知結果に基づいて前記ポンプを再び駆動することを特徴とする。このように、原水をポンプにより汲み上げてろ過材を通過させる構成と、サイホン式の逆洗機構とを併用した装置構造において、逆洗開始検知手段の検知結果に基づいてポンプを停止し、逆洗終了検知手段の検知結果に基づいてポンプを再び駆動することにより、装置構造が簡素で運転管理が容易なろ過装置において、効率的な逆洗を実現することができる。 An object of the present invention is to advantageously solve the above problems, and the filtration device of the present invention is divided into a primary side region and a secondary side region by a filter medium, and filters the treated water. A filtration unit for filtering treated material to obtain treated water, a pump for delivering the treated water to the primary region, a treated water pipe connecting the discharge port of the pump and the primary region, and a vertical direction Is located above the filtration unit, and is treated with the treatment medium and stored in the treated water storage tank. An outlet, a treated water pipe connecting the treated water storage tank and the secondary region below the treated water outlet, and one end connected to the treated water pipe between the pump and the filtration unit The other end is below the vertical position of the treated water outlet A siphon pipe that is positioned and raised up to a position that is vertically higher than the position of the treated water outlet between the one end and the other end by a predetermined height, and a control that controls driving and stopping of the pump The filter medium can be backwashed using the treated water by forming a siphon through the siphon tube, and the backwashing of the filter medium is started by forming the siphon through the siphon tube. Further comprising backwashing start detecting means for detecting and backwashing end detecting means for detecting end timing of backwashing, and the control unit stops the pump based on a detection result of the backwashing start detecting means, The pump is driven again based on the detection result of the backwashing end detection means. In this way, in the device structure in which the raw water is pumped by the pump and the filter medium is passed and the siphon type backwash mechanism is used in combination, the pump is stopped based on the detection result of the backwash start detection means, and the backwash is performed. By driving the pump again based on the detection result of the end detection means, efficient backwashing can be realized in a filtration device with a simple device structure and easy operation management.
 ここで、本発明のろ過装置では、前記逆洗開始検知手段および逆洗終了検知手段が、前記サイホン管の鉛直方向上端位置よりも前記他端側に配置されたフロースイッチであることが好ましい。このような構成とすることで、サイホン管内の水の流れの有無を利用してサイホンの形成および破壊を確実に検知することができる。従って、逆洗開始時にポンプを確実に停止するとともに、逆洗終了後にポンプを確実に駆動してろ過を再開することができるからである。 Here, in the filtration device of the present invention, it is preferable that the backwashing start detecting means and the backwashing end detecting means are flow switches arranged on the other end side with respect to the upper end position in the vertical direction of the siphon tube. With such a configuration, it is possible to reliably detect the formation and destruction of the siphon using the presence or absence of the flow of water in the siphon tube. Therefore, the pump can be reliably stopped at the start of backwashing, and the filtration can be resumed by reliably driving the pump after completion of backwashing.
 また、本発明のろ過装置では、前記ろ過部は、一端が前記一次側領域に接続された空気抜き配管と、前記空気抜き配管に設けられた空気抜き弁とを有することが好ましい。このような構成とすることで、サイホンの形成により逆洗中にろ過部内の水が排出された場合であっても、逆洗終了後にろ過を円滑に再開することが可能となる。 In the filtration device of the present invention, it is preferable that the filtration unit has an air vent pipe having one end connected to the primary side region and an air vent valve provided in the air vent pipe. With such a configuration, even when water in the filtration unit is discharged during backwashing due to the formation of siphons, it is possible to smoothly resume filtration after the end of backwashing.
 また、本発明のろ過装置では、前記ポンプは出力調整手段を有することが好ましい。このような構成とすることで、逆洗後にろ過を再開する際にポンプの出力を徐々に上昇させて、ウォーターハンマーにより被処理水配管やろ過部などが損傷することを回避することができる。 In the filtration device of the present invention, it is preferable that the pump has an output adjusting means. By setting it as such a structure, when restarting filtration after backwashing, the output of a pump can be raised gradually and it can avoid that a to-be-processed water piping, a filtration part, etc. are damaged by a water hammer.
 本発明によれば、原水をポンプにより汲み上げてろ過材を通過させる構成と、サイホン式の逆洗機構とを併用した、装置構造が簡素で運転管理が容易なろ過装置において、効率的な逆洗を可能とすることができる。 According to the present invention, an efficient backwashing is achieved in a filtration device that uses a structure in which raw water is pumped by a pump and passes through a filter medium, and a siphon type backwashing mechanism in combination with a simple device structure and easy operation management. Can be made possible.
本発明に従う代表的なろ過装置の概略構成を示す図である。It is a figure which shows schematic structure of the typical filtration apparatus according to this invention. (A)~(G)は、図1に示すろ過装置の運転状態を説明する図である。(A)-(G) are the figures explaining the driving | running state of the filtration apparatus shown in FIG.
 以下、本発明のろ過装置を、図面に基づき詳細に説明する。
<ろ過装置>
 図1に示すろ過装置100は、第1ポンプ(P1)10、ろ過部20、処理水貯留槽30、及びサイホン管40を備える。ろ過装置100は、第1ポンプ10を介して河川や井戸、湖沼等の水源500から汲み上げた原水(被処理水)をろ過部20においてろ過して、得られた処理水(浄水)を処理水貯留槽30に貯留する。原水は、河川や井戸、湖沼に限らず、ろ過して浄水を得ることが可能な被処理水が得られる水源から汲み上げることができる。
Hereinafter, the filtration device of the present invention is explained in detail based on a drawing.
<Filtration device>
A filtration device 100 shown in FIG. 1 includes a first pump (P1) 10, a filtration unit 20, a treated water storage tank 30, and a siphon tube 40. The filtration device 100 filters raw water (treated water) pumped from a water source 500 such as a river, a well, or a lake through the first pump 10 in the filtration unit 20, and treats the obtained treated water (purified water) with treated water. Store in the storage tank 30. The raw water is not limited to rivers, wells, and lakes, but can be pumped from a water source from which treated water that can be purified by filtration is obtained.
 第1ポンプ10は、ろ過部20の一次側領域に被処理水を送出する。ろ過部20は、ろ過材により内部が一次側領域と二次側領域とに区分され、一次側領域から導入した被処理水を、ろ過材を介して二次側領域に流入させてろ過して処理水を得るように機能する。ろ過材としては、ろ過膜などの既知のろ過材を用いることができる。ろ過膜としては、例えばセラミック膜を使用することができる。セラミック膜は、高強度、高信頼性、高い運転安定性、及び長寿命等の利点を有する。 The first pump 10 sends the water to be treated to the primary side region of the filtration unit 20. The filtration unit 20 is divided into a primary side region and a secondary side region by a filter medium, and the water to be treated introduced from the primary side region flows into the secondary side region through the filter medium and is filtered. It functions to obtain treated water. As the filter medium, a known filter medium such as a filter membrane can be used. As the filtration membrane, for example, a ceramic membrane can be used. The ceramic membrane has advantages such as high strength, high reliability, high operational stability, and long life.
 処理水貯留槽30は、鉛直方向の位置がろ過部20よりも上方であり、ろ過材でろ過されて二次側領域から流出した処理水を貯留する。さらに、処理水貯留槽30は処理水流出口31を有しており、処理水貯留槽30では、一定以上の処理水が貯蔵されて水位が処理水流出口31に至ると、処理水が処理水流出口31から流出する。処理水流出口31の鉛直方向の位置は、任意に定めることができるが、後に詳細に説明するろ過材の逆洗時に逆洗水として使用する処理水の量を十分に確保することができる位置とすることができる。 The treated water storage tank 30 has a position in the vertical direction above the filtration unit 20, and stores treated water that has been filtered by the filter medium and has flowed out of the secondary region. Furthermore, the treated water storage tank 30 has a treated water outlet 31, and when the treated water storage tank 30 stores a certain level or more of treated water and the water level reaches the treated water outlet 31, the treated water flows into the treated water outlet. 31 flows out. The position in the vertical direction of the treated water outlet 31 can be arbitrarily determined, and a position that can sufficiently secure the amount of treated water used as backwash water when backwashing the filter medium described in detail later. can do.
 さらに、ろ過装置100は、取水管51、被処理水配管52、処理水配管53、及びろ過水配管54を備える。取水管51の一端は、水源500から被処理水を取水可能に配置され、例えば、水源500中に配置される。取水管51の他端は第1ポンプ10の吸込口に接続される。被処理水配管52は、ろ過部20の一次側領域と第1ポンプ10の吐出口とを接続する。処理水配管53は、処理水貯留槽30とろ過部20の二次側領域とを、処理水流出口31よりも下方で接続する。即ち、処理水配管53と処理水貯留槽30との接続部の鉛直方向位置は、処理水流出口31よりも下方である。ろ過水配管54は、一端が処理水流出口31に接続されている。 Furthermore, the filtration device 100 includes a water intake pipe 51, a treated water pipe 52, a treated water pipe 53, and a filtered water pipe 54. One end of the water intake pipe 51 is arranged so that the water to be treated can be taken from the water source 500, for example, in the water source 500. The other end of the intake pipe 51 is connected to the suction port of the first pump 10. The treated water pipe 52 connects the primary side region of the filtration unit 20 and the discharge port of the first pump 10. The treated water pipe 53 connects the treated water storage tank 30 and the secondary region of the filtration unit 20 below the treated water outlet 31. That is, the vertical position of the connecting portion between the treated water pipe 53 and the treated water storage tank 30 is lower than the treated water outlet 31. One end of the filtrate water pipe 54 is connected to the treated water outlet 31.
 ここで、ろ過装置100は、取水管51に接続された、取水管51内の被処理水に対して凝集剤を添加する凝集剤供給手段を備えることもできる。凝集剤供給手段は、凝集剤供給槽81、凝集剤供給管82、ポンプ(P)、及び弁により構成され得る。被処理水に対して凝集剤を添加すれば、ろ過部20でのろ過を効率的に行うことができる。 Here, the filtration apparatus 100 can also include a flocculant supply means that is connected to the water intake pipe 51 and adds a flocculant to the water to be treated in the water intake pipe 51. The flocculant supply means may be constituted by a flocculant supply tank 81, a flocculant supply pipe 82, a pump (P), and a valve. If a flocculant is added with respect to to-be-processed water, the filtration in the filtration part 20 can be performed efficiently.
 また、被処理水配管52は、ラインミキサ521を備えても良い。ラインミキサ521は、サイホン管40と被処理水配管52との接続部と、第1ポンプ10の吐出口との間に配置され、内部を通過する流体を混合するように機能する。ラインミキサ521を設ければ、凝集剤供給手段を用いて供給した凝集剤と被処理水とを良好に混合することができる。 Moreover, the water pipe 52 to be treated may include a line mixer 521. The line mixer 521 is disposed between the connection portion between the siphon pipe 40 and the water pipe 52 to be treated and the discharge port of the first pump 10 and functions to mix the fluid passing through the inside. If the line mixer 521 is provided, the flocculant supplied using the flocculant supply means and the water to be treated can be mixed well.
 さらに、ろ過装置100は、ろ過部20へと供給する被処理水の流量を調整するための流量調整用配管57を有していてもよい。流量調整用配管57は、一端が被処理水配管52に接続され、他端が取水管51に接続されてなる。ろ過装置100では、流量調整用配管57に流れ込む被処理水の水量を調整することにより、第1ポンプ10からろ過部20へと供給する被処理水の流量を調整する。なお、流量調整用配管57は、図示しない弁を有し、当該弁の開度を種々調節することにより流量調整用配管57に流入する被処理水の水量を変化させることができる。 Furthermore, the filtration device 100 may have a flow rate adjustment pipe 57 for adjusting the flow rate of the water to be treated supplied to the filtration unit 20. One end of the flow rate adjusting pipe 57 is connected to the treated water pipe 52 and the other end is connected to the water intake pipe 51. In the filtration apparatus 100, the flow rate of the water to be treated supplied from the first pump 10 to the filtration unit 20 is adjusted by adjusting the amount of the water to be treated flowing into the flow rate adjusting pipe 57. The flow rate adjusting pipe 57 has a valve (not shown), and the amount of water to be treated flowing into the flow rate adjusting pipe 57 can be changed by variously adjusting the opening degree of the valve.
 ここで、被処理水配管52には、後に詳細に説明するろ過材の逆洗時に被処理水の逆流を防止するための逆流防止弁(図示しない)が設けられていてもよい。逆流防止弁は、第1ポンプ10の吐出口と、被処理水配管52とサイホン管40との接続部との間に配置することができる。なお、上述した流量調整用配管57を設ける場合には、逆流防止弁は、流量調整用配管57と被処理水配管52との接続部と、被処理水配管52とサイホン管40との接続部との間に配置する。 Here, the to-be-treated water pipe 52 may be provided with a backflow prevention valve (not shown) for preventing the backflow of the to-be-treated water during backwashing of the filter medium, which will be described in detail later. The backflow prevention valve can be disposed between the discharge port of the first pump 10 and the connection portion between the treated water pipe 52 and the siphon pipe 40. In the case where the above-described flow rate adjustment pipe 57 is provided, the backflow prevention valve includes a connection part between the flow rate adjustment pipe 57 and the treated water pipe 52 and a connection part between the treated water pipe 52 and the siphon pipe 40. Place between.
 なお、ろ過装置100によりろ過したろ過水を飲用に供する場合等においては、処理水配管53は消毒剤供給手段を有しても良い。消毒剤は、例えば塩素化合物である。この場合、消毒剤供給手段は、消毒剤供給槽61、消毒剤供給管62、ポンプ(P)、及び弁により構成され得る。 In addition, when using the filtered water filtered with the filtration apparatus 100 for drinking etc., the treated water piping 53 may have a disinfectant supply means. The disinfectant is, for example, a chlorine compound. In this case, the disinfectant supply means may be constituted by a disinfectant supply tank 61, a disinfectant supply pipe 62, a pump (P), and a valve.
 サイホン管40は、一端が第1ポンプ10の吐出口とろ過部20との間で被処理水配管52に接続され、他端が処理水流出口31の鉛直方向位置よりも下方に位置する。そして、サイホン管40は、一端と他端との間で、処理水流出口31の位置よりも鉛直方向に所定の高さだけ高い位置まで立ち上げられている。 One end of the siphon tube 40 is connected to the treated water pipe 52 between the discharge port of the first pump 10 and the filtration unit 20, and the other end is positioned below the vertical position of the treated water outlet 31. The siphon tube 40 is raised between one end and the other end to a position that is higher than the position of the treated water outlet 31 by a predetermined height in the vertical direction.
 そのため、このろ過装置100では、ろ過部20における圧力損失がない、即ち、ろ過材によるろ過前後の圧力差(差圧)がない場合には、サイホン管40内の水位と、ろ過材よりも二次側領域側の処理水の水位とが等しくなる。一方、被処理水中に含まれる懸濁物質やコロイド等の閉塞物質により、ろ過中にろ過膜が徐々に目詰まりし、差圧が発生すると、サイホン管40内の水位が、処理水の水位よりも差圧分だけ高くなる。即ち、サイホン管40内の水位は、差圧の増加に応じて徐々に上昇する。そして、サイホン管40内の被処理水がサイホン管40の鉛直方向上端位置(サイホン管40の頂部、あるいは、サイホン管40の鉛直方向最高位置ともいう)を越えて他端側に越流し、サイホン管40の一端と他端との間でサイホン管40内に水が満たされると、ろ過材よりも二次側領域側(例えば、処理水貯留槽30)と、サイホン管40の他端との間で、サイホン管40を介してサイホンが形成される。具体的には、処理水貯留槽30、処理水配管53、ろ過部20、及び被処理水配管52を経た水流がサイホン管40に流入して、途切れることなくサイホン管40の鉛直方向上端位置を通ってサイホン管40から流出する。これにより、処理水貯留槽30内に貯留された処理水は、ろ過部20を逆流してサイホン管40の他端まで流れ、ろ過材を逆洗する。このようにして、ろ過装置100では、ろ過膜に目詰まりした閉塞物質を除去して、ろ過膜のろ過性能を回復することができる。なお、サイホン管40の他端は、逆洗水を排出するための排出用配管55に接続されてもよい。 Therefore, in this filtration device 100, when there is no pressure loss in the filtration unit 20, that is, when there is no pressure difference (differential pressure) before and after filtration by the filter medium, the water level in the siphon tube 40 and the filter medium are two. The water level of the treated water on the secondary region side becomes equal. On the other hand, when the filtration membrane is gradually clogged during filtration due to suspended substances and colloidal substances contained in the water to be treated and a differential pressure is generated, the water level in the siphon tube 40 is higher than the water level of the treated water. Also increases by the differential pressure. That is, the water level in the siphon tube 40 gradually rises as the differential pressure increases. Then, the water to be treated in the siphon tube 40 overflows to the other end side beyond the vertical upper end position of the siphon tube 40 (also referred to as the top of the siphon tube 40 or the highest vertical position of the siphon tube 40). When the siphon tube 40 is filled with water between one end and the other end of the tube 40, the secondary region side (for example, the treated water storage tank 30) with respect to the filter medium and the other end of the siphon tube 40 In between, a siphon is formed through the siphon tube 40. Specifically, the water flow that passes through the treated water storage tank 30, the treated water pipe 53, the filtration unit 20, and the treated water pipe 52 flows into the siphon pipe 40, and the vertical upper end position of the siphon pipe 40 is set without interruption. And flows out of the siphon tube 40. Thereby, the treated water stored in the treated water storage tank 30 flows back to the other end of the siphon tube 40 through the filtration unit 20 and backwashes the filter medium. Thus, in the filtration apparatus 100, the clogging substance clogged in the filtration membrane can be removed, and the filtration performance of the filtration membrane can be recovered. Note that the other end of the siphon tube 40 may be connected to a discharge pipe 55 for discharging backwash water.
 ここで、サイホン管40を立ち上げる高さは、例えば、ろ過性能と差圧との関係を考慮して決定した、逆洗を開始する差圧の大きさに対応した高さであって、処理水貯留槽30の処理水流出口31の高さより高ければ良い。
 また、サイホン管40の他端の鉛直方向位置は、逆洗時にろ過部20を流れる逆洗水の量(逆洗水量)及び逆洗を駆動する圧力(逆洗駆動圧)を規定する。従って、原理的には、サイホン管40の他端の鉛直方向位置は、処理水貯留槽30内における水位よりも低く、最低限の逆洗水量及び逆洗駆動圧を確保することができる位置である。逆洗水量は、例えば、ろ過膜を用いて構成されたろ過部20を用いる場合には、単位膜面積あたり0.5リットル以上とすることが実用的に好ましい。さらに、逆洗駆動圧は大きい方が好ましいため、処理水貯留槽30内における水位とサイホン管40の他端の鉛直方向位置との差が大きい方が好ましい。このため、サイホン管40の他端の鉛直方向位置は、処理水貯留槽30よりも下側であることが好ましく、ろ過部20よりも下側であることが更に好ましく、ろ過装置100の下部、特に、鉛直方向最下部にサイホン管40の他端を配置することが好ましい。十分な逆洗水量及び逆洗駆動圧を確保することができるからである。なお、図示例では、サイホン管40の他端はろ過部20よりも下側に位置している。従って、サイホンが形成されると、サイホンブレーカーなどを用いて人為的にサイホンを破壊しない限り、ろ過部20内の水は全て流出する。ちなみに、逆洗終了時にろ過部20内の水が全て流出していることは必須ではなく、本願における「逆洗」とは、ろ過部20内において二次側領域から一次側領域に処理水が逆流することを指す。
Here, the height at which the siphon tube 40 is raised is, for example, determined in consideration of the relationship between the filtration performance and the differential pressure, and is a height corresponding to the magnitude of the differential pressure at which backwashing is started. What is necessary is just to be higher than the height of the treated water outflow port 31 of the water storage tank 30.
The vertical position of the other end of the siphon tube 40 defines the amount of backwash water (backwash water amount) that flows through the filtration unit 20 during backwashing and the pressure that drives backwashing (backwash drive pressure). Therefore, in principle, the vertical position of the other end of the siphon tube 40 is lower than the water level in the treated water storage tank 30, and a position where a minimum backwash water amount and backwash drive pressure can be secured. is there. For example, when using the filtration part 20 comprised using the filtration membrane, it is practically preferable that the amount of backwash water is 0.5 liter or more per unit membrane area. Furthermore, since it is preferable that the backwash driving pressure is large, it is preferable that the difference between the water level in the treated water storage tank 30 and the vertical position of the other end of the siphon tube 40 is large. Therefore, the vertical position of the other end of the siphon tube 40 is preferably lower than the treated water storage tank 30, more preferably lower than the filtration unit 20, and the lower part of the filtration device 100, In particular, it is preferable to arrange the other end of the siphon tube 40 at the lowermost part in the vertical direction. This is because a sufficient amount of backwash water and backwash drive pressure can be secured. In the illustrated example, the other end of the siphon tube 40 is located below the filtering unit 20. Therefore, when the siphon is formed, all the water in the filtering unit 20 flows out unless the siphon is artificially destroyed using a siphon breaker or the like. Incidentally, it is not essential that all the water in the filtration unit 20 has flowed out at the end of the backwashing, and “backwashing” in the present application means that the treated water flows from the secondary region to the primary region in the filtration unit 20. Refers to backflow.
 なお、サイホン管40は、サイホン管40内を上昇した水がサイホン管40の鉛直方向上端位置付近を通って他端側へと流れる際に、サイホン管40内を流れる水流が途切れないような構造となっている。例えば、サイホン管40は、サイホン管40の鉛直方向上端位置付近において、管径が細くなっている。また、逆洗流速は、逆洗駆動圧、逆洗時のサイホン管40内の圧力損失、及びろ過部20のろ過膜閉塞の度合により決定される。このため、逆洗流速を確保する観点から、サイホン管の内径は、逆洗時のサイホン管40内の圧力損失を最小に抑えることができる内径であることが好ましい。 Note that the siphon tube 40 has a structure that prevents the flow of water flowing in the siphon tube 40 from being interrupted when the water that has risen in the siphon tube 40 flows through the vicinity of the upper end position in the vertical direction of the siphon tube 40 to the other end side. It has become. For example, the siphon tube 40 has a small diameter in the vicinity of the upper end position in the vertical direction of the siphon tube 40. The backwash flow rate is determined by the backwash driving pressure, the pressure loss in the siphon tube 40 during backwashing, and the degree of filtration membrane blockage of the filtration unit 20. For this reason, from the viewpoint of ensuring the backwash flow rate, the inner diameter of the siphon tube is preferably an inner diameter that can minimize the pressure loss in the siphon tube 40 during backwashing.
 なお、上述のように、第1ポンプ10の吐出口と、被処理水配管52とサイホン管40との接続部との間、より具体的には、流量調整用配管57と被処理水配管52との接続部と、被処理水配管52とサイホン管40との接続部との間に逆流防止弁が設けられている場合には、逆洗水が水源500側に流入することはないため、逆洗中にサイホン管内の水流を途切れにくくすることができる。あるいは、逆流防止弁を設けず、被処理水配管52及び取水管51の管径をサイホン管40よりも大きく設計した場合には、サイホン管40内の被処理水がサイホン管40の頂部を越えて他端側に越流することをもって逆洗が開始し、逆洗開始後、逆洗水を主として被処理水配管52及び取水管51を通じて水源500側に流出させることにより逆洗を完了することもできる。 In addition, as mentioned above, between the discharge port of the 1st pump 10, and the connection part of the to-be-processed water piping 52 and the siphon pipe 40, more specifically, the flow volume adjustment pipe 57 and the to-be-processed water piping 52 are used. In the case where a backflow prevention valve is provided between the connection portion between the water supply pipe 52 and the siphon pipe 40, the backwash water does not flow into the water source 500 side. It is possible to make it difficult to interrupt the water flow in the siphon tube during backwashing. Alternatively, when the backflow prevention valve is not provided and the diameters of the treated water pipe 52 and the intake pipe 51 are designed larger than the siphon pipe 40, the treated water in the siphon pipe 40 exceeds the top of the siphon pipe 40. The backwashing is started by flowing over to the other end side, and after the backwashing starts, the backwashing is completed by allowing the backwash water to flow mainly to the water source 500 side through the treated water pipe 52 and the intake pipe 51. You can also.
 さらに、ろ過装置100は、第1ポンプ10の駆動および停止を制御する制御部70と、サイホン管40を介したサイホンの形成によるろ過材の逆洗開始を検知する逆洗開始検知手段、及び逆洗の終了タイミングを検知する逆洗終了検知手段を備える。 Furthermore, the filtration device 100 includes a control unit 70 that controls the driving and stopping of the first pump 10, backwashing start detection means that detects the start of backwashing of the filter medium due to formation of the siphon through the siphon tube 40, and reverse Back washing end detection means for detecting the washing end timing is provided.
 制御部70は、逆洗開始検知手段の検知結果(即ち、サイホンの形成による逆洗開始の検知)に基づいて第1ポンプ10を停止する。逆洗開始検知手段によりサイホン管40を介したサイホンの形成を検知して、制御部70が第1ポンプ10を停止することで、逆洗中に第1ポンプ10が被処理水を送出して逆洗を阻害することがないようにし、十分な逆洗流速で逆洗を実施することができる。
 なお、制御部70は、任意に、凝集剤供給手段のポンプや消毒剤供給手段のポンプの駆動および停止を、第1ポンプ10と連動させて制御する。
 また、制御部70は、逆洗終了検知手段の検知結果(即ち、逆洗の終了時期の検知)に基づいて第1ポンプ10を再び駆動する。逆洗終了検知手段により逆洗の終了タイミングを検知して、逆洗終了後に制御部70が第1ポンプ10を駆動することで、ろ過を再開することができる。
The control part 70 stops the 1st pump 10 based on the detection result (namely, detection of the backwashing start by siphon formation) of the backwashing start detection means. The backwashing start detecting means detects the formation of the siphon through the siphon tube 40, and the control unit 70 stops the first pump 10, so that the first pump 10 delivers the water to be treated during backwashing. The backwashing can be carried out at a sufficient backwashing flow rate so as not to hinder backwashing.
The controller 70 arbitrarily controls the driving and stopping of the pump of the flocculant supply unit and the pump of the disinfectant supply unit in conjunction with the first pump 10.
Moreover, the control part 70 drives the 1st pump 10 again based on the detection result (namely, detection of the end time of backwashing) of the backwashing end detection means. Filtration can be restarted by detecting the end timing of backwashing by the backwashing end detection means and driving the first pump 10 after the backwashing is completed.
 ここで、逆洗開始検知手段及び逆洗終了検知手段としては、サイホン管40の鉛直方向上端位置よりも他端側(図示例では、処理水貯留槽30の処理水流出口31の鉛直方向位置よりも下方)に配置されたフロースイッチ41を用いることができる。フロースイッチ41は、一定範囲の流速及び流量の水流の有無を検知することができるスイッチである。
 サイホン形成時には、サイホン管40の鉛直方向上端位置よりも他端側に水が連続して流れ、サイホン破壊時には、サイホン管40の鉛直方向上端位置よりも他端側への水の流れが止まる。そのため、サイホン管40の鉛直方向上端位置よりも他端側に配置されたフロースイッチ41を用いれば、サイホンの形成および破壊、即ち、逆洗の開始および終了を確実に検知することができる。なお、フロースイッチ41における流速及び流量の検出閾値は、サイホン管40を介してサイホンが形成されたことを確実に検出できるように、適宜設定することができる。
Here, as the backwash start detection means and the backwash end detection means, the other end side of the siphon tube 40 in the vertical direction upper end position (in the illustrated example, from the vertical position of the treated water outlet 31 of the treated water storage tank 30). Also, a flow switch 41 arranged on the lower side can be used. The flow switch 41 is a switch that can detect the presence or absence of a water flow having a certain range of flow velocity and flow rate.
When the siphon is formed, water continuously flows to the other end side from the upper end position in the vertical direction of the siphon tube 40. When the siphon is broken, the flow of water from the upper end position in the vertical direction of the siphon tube 40 to the other end side stops. Therefore, if the flow switch 41 disposed on the other end side of the siphon tube 40 in the vertical direction is used, it is possible to reliably detect the formation and destruction of the siphon, that is, the start and end of backwashing. Note that the flow velocity and flow rate detection thresholds in the flow switch 41 can be set as appropriate so that the siphon can be reliably detected via the siphon tube 40.
 なお、逆洗終了検知手段としてフロースイッチ41を用いる場合、制御部70は、フロースイッチ41で構成される逆洗終了検知手段が一定範囲の流速及び流量の水流がないことを検出(即ち、逆洗の終了タイミングを検知)した後、所定時間経過後に第1ポンプ10を駆動するように制御することができる。ここで、所定時間は、例えば30秒である。このように制御部70を構成することにより、逆洗の終了を確実にして、効率的にろ過を再開することが可能となる。 When the flow switch 41 is used as the backwashing end detecting means, the control unit 70 detects that the backwashing end detecting means constituted by the flow switch 41 does not have a flow rate and flow rate within a certain range (that is, reverse It is possible to control the first pump 10 to be driven after a predetermined time has elapsed after detecting the end timing of washing. Here, the predetermined time is, for example, 30 seconds. By configuring the control unit 70 in this way, it is possible to ensure the end of backwashing and to efficiently resume filtration.
 なお、本発明のろ過装置では、逆洗開始検知手段及び逆洗終了検知手段として、フロースイッチ以外に、処理水貯留槽30に取りつけられたレベルスイッチを用いてもよい。具体的には、サイホン形成時には、処理水貯留槽30内の処理水の水位が減少するので、処理水貯留槽30内の水位の減少を検知することで、サイホンの形成による逆洗の開始を検知してもよい。また、処理水貯留槽30内の水位が所定の水位まで減少したタイミングや、処理水貯留槽30内の水位の減少が停止したタイミングを、逆洗終了タイミングとして検知してもよい。ここで、処理水貯留槽30内の水位が所定の水位まで減少したタイミングで逆洗を終了する場合には、サイホン管40にサイホンブレーカー(図示しない)を設けておき、処理水貯留槽30内の水位が所定の水位に達した時点でサイホンブレーカーを起動させることにより、逆洗を終了させることができる。 In addition, in the filtration apparatus of this invention, you may use the level switch attached to the treated water storage tank 30 other than a flow switch as a backwash start detection means and a backwash completion detection means. Specifically, when the siphon is formed, the water level of the treated water in the treated water storage tank 30 is decreased, and therefore the backwashing by the siphon formation is started by detecting the decrease in the water level in the treated water storage tank 30. It may be detected. Further, the timing at which the water level in the treated water storage tank 30 decreases to a predetermined water level, or the timing at which the decrease in the water level in the treated water storage tank 30 stops may be detected as the backwash end timing. Here, when the backwashing is finished at the timing when the water level in the treated water storage tank 30 decreases to a predetermined water level, a siphon breaker (not shown) is provided in the siphon tube 40 and the treated water storage tank 30 Backwashing can be terminated by activating the siphon breaker when the water level reaches a predetermined water level.
 ここで、サイホン管40の他端の鉛直方向位置がろ過部20よりも下側の場合、逆洗終了後は、ろ過部20の一次側領域及び二次側領域内は空気で満たされており、また、ろ過部20内のろ過材は湿っている。このため、逆洗終了後に第1ポンプ10を再駆動させて被処理水を送出しても、ろ過部20の一次側領域及び被処理水配管52内の空気がろ過材を経て抜けにくく、被処理水がろ過材を通過するのに時間がかかり、また、ろ過材に被処理水を迅速に通過させるために第1ポンプ10のポンプ圧力を高くする等の対策が必要となる。このため、効率的にろ過を再開することができない虞がある。そこで、ろ過部20は、一端が一次側領域に接続された空気抜き配管56と、空気抜き配管56に設けられた空気抜き弁561とを有することが好ましい。空気抜き配管56の他端は、例えばサイホン管が接続された排出用配管55に接続される。このように、空気抜き配管56及び空気抜き弁561を設けることで、ろ過再開時には空気抜き弁561を開いてろ過装置100内の空気を抜きつつ被処理水を一次側領域に送水し、一次側領域が被処理水で置換された後に空気抜き弁561を閉じることで、効率的にろ過を再開することができる。なお、空気抜き弁561の動作は、制御部70により制御することができる。また、空気抜き配管56をエアベントとして構成することも勿論可能である。 Here, when the vertical position of the other end of the siphon tube 40 is below the filtering unit 20, the primary side region and the secondary side region of the filtering unit 20 are filled with air after the backwashing is completed. Moreover, the filter medium in the filtration unit 20 is moist. For this reason, even if the first pump 10 is re-driven after the backwashing is finished and the water to be treated is sent out, the primary side region of the filtration unit 20 and the water in the water pipe 52 to be treated are difficult to escape through the filter medium. It takes time for the treated water to pass through the filter medium, and measures such as increasing the pump pressure of the first pump 10 are required to allow the treated water to pass through the filter medium quickly. For this reason, there exists a possibility that filtration cannot be restarted efficiently. Therefore, the filtration unit 20 preferably includes an air vent pipe 56 having one end connected to the primary side region, and an air vent valve 561 provided in the air vent pipe 56. The other end of the air vent pipe 56 is connected to a discharge pipe 55 to which, for example, a siphon pipe is connected. In this way, by providing the air vent pipe 56 and the air vent valve 561, when the filtration is resumed, the air vent valve 561 is opened to feed the water to be treated to the primary side area while venting the air in the filtration device 100, and the primary side area is covered. Filtration can be efficiently restarted by closing the air vent valve 561 after replacement with treated water. Note that the operation of the air vent valve 561 can be controlled by the control unit 70. It is of course possible to configure the air vent pipe 56 as an air vent.
 また、サイホン管40の他端の鉛直方向位置がろ過部20よりも下側の場合や、被処理水配管52よりも下側の場合、逆洗終了後は、ろ過部20内や被処理水配管52内が空気で満たされる。そのため、第1ポンプ10は、例えばインバーターにより構成される出力調整手段(図示しない)を有することが好ましい。これにより、逆洗後にろ過を再開する際に、ポンプの吐出圧力を徐々に上昇させて、ウォーターハンマーによりろ過装置が損傷することを回避することができる。 In addition, when the vertical position of the other end of the siphon tube 40 is below the filtration unit 20 or below the treated water pipe 52, after the backwashing is finished, the filtration unit 20 and the treated water are treated. The inside of the pipe 52 is filled with air. Therefore, it is preferable that the 1st pump 10 has an output adjustment means (not shown) comprised, for example with an inverter. Thereby, when resuming filtration after backwashing, it is possible to gradually increase the discharge pressure of the pump and avoid damage to the filtration device due to the water hammer.
<ろ過装置の動作>
 図1に示すろ過装置100は、図2(A)~(G)に示すような運転状態で動作する。図2(A)~(G)においては、明確のため、ろ過装置100における、第1ポンプ10、被処理水配管52、ろ過部20、処理水配管53、処理水貯留槽30、処理水流出口31、サイホン管40、及び逆洗開始検知手段を構成するフロースイッチ41のみを図示し、残りの構成は図示を省略する。また、ろ過部20では、ろ過部内に存在する水の水位の変化の理解を容易にするため、ろ過部内に存在する水量を図示した。なお、以下、逆洗開始検知手段を構成するフロースイッチ41は逆洗終了検知手段としても機能するものとして説明する。
<Operation of filtration device>
The filtration device 100 shown in FIG. 1 operates in an operation state as shown in FIGS. 2 (A) to (G). 2A to 2G, for the sake of clarity, the first pump 10, the treated water pipe 52, the filtration unit 20, the treated water pipe 53, the treated water storage tank 30, and the treated water outlet in the filtration device 100 are shown. 31, only the siphon tube 40 and the flow switch 41 constituting the backwashing start detecting means are illustrated, and the remaining components are not shown. Moreover, in the filtration part 20, in order to make an understanding of the change of the water level which exists in a filtration part easy, the amount of water which exists in a filtration part was illustrated. In the following description, it is assumed that the flow switch 41 constituting the backwashing start detecting means also functions as backwashing end detecting means.
 図2(A)は、ろ過装置100のろ過中の状態を示す図である。この状態においては、第1ポンプ10より送出された被処理水の水流は、被処理水配管52を経てろ過部20の一次側領域に流入し、ろ過材を経て処理水となって二次側領域に流入し、処理水配管53を通って処理水貯留槽30に貯留される。処理水貯留槽30内の水位が処理水流出口31と同レベルまで上昇すると、処理水流出口31から処理水が流出する。ろ過中に、被処理水配管52を流れる被処理水の水流の一部はサイホン管40に流入し、サイホン管40内の水位は徐々に上昇する。
 図2(B)は、逆洗を開始する直前のろ過装置100の状態を示す図である。この状態においては、サイホン管40内の水位は、ろ過部20における圧力損失の増加(差圧の上昇)によりサイホン管40の鉛直方向上端位置まで上昇している。その後、フロースイッチ41により一定範囲の流速及び流量の水流が検出されると、制御部は第1ポンプ10を停止する。
FIG. 2A is a diagram illustrating a state during filtration of the filtration device 100. In this state, the water flow of the treated water sent from the first pump 10 flows into the primary side region of the filtration unit 20 through the treated water piping 52 and becomes treated water through the filter medium on the secondary side. It flows into the region and is stored in the treated water storage tank 30 through the treated water pipe 53. When the water level in the treated water storage tank 30 rises to the same level as the treated water outlet 31, the treated water flows out from the treated water outlet 31. During the filtration, a part of the water flow of the water to be treated that flows through the water pipe 52 to be treated flows into the siphon tube 40, and the water level in the siphon tube 40 gradually rises.
FIG. 2B is a diagram illustrating a state of the filtration device 100 immediately before starting backwashing. In this state, the water level in the siphon tube 40 rises to the upper end position in the vertical direction of the siphon tube 40 due to an increase in pressure loss (an increase in differential pressure) in the filtration unit 20. Thereafter, when the flow switch 41 detects a water flow having a predetermined range of flow velocity and flow rate, the control unit stops the first pump 10.
 図2(C)は、逆洗開始直後のろ過装置100の状態を示す図である。この状態においては、サイホン管40内の被処理水はサイホン管40の頂部を越えて越流し、処理水貯留槽30の処理水流出口31よりも鉛直方向で低い位置まで達している。
 図2(D)は、逆洗中のろ過装置100の状態を示す図である。この状態においては、処理水貯留槽30から流出した処理水が、処理水配管53、ろ過部20、及び被処理水配管52を経てサイホン管40に流入して、サイホン管40から流出している。このとき、第1ポンプ10は停止状態である。
 図2(E)も、逆洗中のろ過装置100の状態を示す図である。この状態において、処理水貯留槽30内に貯留されていた処理水は全て流出し、ろ過部20内に低水位で存在するのみである。
 図2(F)は、逆洗終了間際のろ過装置100の状態を示す図である。この状態の直後に、逆洗終了検知手段を兼ねるフロースイッチ41が、一定範囲の流速及び流量の水流が無いことを検出する。その後、一定時間経過後に、制御部は第1ポンプ10を駆動するように制御し、ろ過を再開する。
FIG. 2C is a diagram illustrating a state of the filtration device 100 immediately after the start of backwashing. In this state, the water to be treated in the siphon tube 40 overflows beyond the top of the siphon tube 40 and reaches a position lower in the vertical direction than the treated water outlet 31 of the treated water storage tank 30.
Drawing 2 (D) is a figure showing the state of filtration device 100 under backwashing. In this state, the treated water flowing out from the treated water storage tank 30 flows into the siphon tube 40 through the treated water pipe 53, the filtering unit 20, and the treated water pipe 52, and flows out from the siphon tube 40. . At this time, the first pump 10 is in a stopped state.
FIG. 2E is also a diagram showing the state of the filtration device 100 during backwashing. In this state, all of the treated water stored in the treated water storage tank 30 flows out and only exists in the filtration unit 20 at a low water level.
FIG. 2 (F) is a diagram showing the state of the filtration device 100 just before the end of backwashing. Immediately after this state, the flow switch 41, which also serves as a backwashing end detection means, detects that there is no water flow having a certain range of flow velocity and flow rate. Thereafter, after a predetermined time has elapsed, the control unit controls to drive the first pump 10 and restarts filtration.
 図2(G)は、ろ過再開直後のろ過装置100の状態を示す図である。この状態においては、第1ポンプ10より送出された被処理水の水流は、被処理水配管52を経てろ過部20の一次側領域に流入する。ここで、上述したとおり、逆洗後のろ過部20及び被処理水配管52等は空気で満たされており、またろ過部20内のろ過材は湿っており、空気がろ過材を経て抜けにくく、被処理水を効率的にろ過することができない虞がある。このため、図1に示したような空気抜き配管56及び空気抜き弁561を設けて、ろ過装置100から空気を抜くように、ろ過装置100を構成することが有利である。この場合、制御部は、第1ポンプ10の駆動再開後に空気抜き弁561を開き、ろ過再開後所定時間の間は開いた状態として空気を抜き、その後空気抜き弁561を閉じる。空気抜き弁561を開放状態とする所定時間は、第1ポンプ10の送水速度に依存するが、例えば、ろ過再開後20~180秒である。ちなみに、ろ過再開後にろ過部20内に被処理水を流入させる段階において、空気抜き配管56を開放したままにして、空気抜き配管56から被処理水を流出させることにより、ろ過部20の一次側に残留した堆積物を排除するように構成することも可能である。この場合、空気抜き弁561を180秒間よりも長い時間にわたって開放させておくことも可能である。 FIG. 2 (G) is a diagram showing the state of the filtration device 100 immediately after resumption of filtration. In this state, the water flow of the treated water sent from the first pump 10 flows into the primary region of the filtration unit 20 through the treated water pipe 52. Here, as described above, the filtering unit 20 and the water pipe 52 to be treated after backwashing are filled with air, and the filtering material in the filtering unit 20 is moist, and it is difficult for air to escape through the filtering material. There is a possibility that the water to be treated cannot be efficiently filtered. For this reason, it is advantageous to provide the air vent pipe 56 and air vent valve 561 as shown in FIG. In this case, the control unit opens the air vent valve 561 after resuming the driving of the first pump 10, vents the air in an open state for a predetermined time after resuming filtration, and then closes the air vent valve 561. The predetermined time for opening the air vent valve 561 depends on the water supply speed of the first pump 10, but is, for example, 20 to 180 seconds after resumption of filtration. Incidentally, in the stage where the treated water is allowed to flow into the filtration unit 20 after resumption of filtration, the treated water is allowed to flow out from the air vent pipe 56 while leaving the air vent pipe 56 open, so that it remains on the primary side of the filtration unit 20. It is also possible to configure so as to eliminate the accumulated deposits. In this case, the air vent valve 561 can be opened for a time longer than 180 seconds.
 以上、一例を用いて本発明のろ過装置及びかかるろ過装置の動作方法について説明したが、本発明のろ過装置及びろ過装置の動作方法は、上記一例に限定されることはなく、適宜変更を加えることができる。
 例えば、図1ではろ過部を1つのみ示したが、ろ過装置において、複数のろ過部を備えることももちろん可能である。これにより、ろ過水量を増加させることができる。
As mentioned above, although the filtering apparatus of this invention and the operation | movement method of this filtration apparatus were demonstrated using an example, the operation | movement method of the filtration apparatus and filtration apparatus of this invention is not limited to the said example, and adds suitably. be able to.
For example, although only one filtration unit is shown in FIG. 1, it is of course possible to provide a plurality of filtration units in the filtration device. Thereby, the amount of filtered water can be increased.
 本発明のろ過装置は、原水をポンプにより汲み上げてろ過材を通過させる構成と、サイホン式の逆洗機構とを併用した構成を採用したため装置構造が簡素で運転管理が容易なだけでなく、効率的な逆洗が可能である。 The filtration device of the present invention adopts a configuration in which raw water is pumped up by a pump and the filter medium is passed through and a siphon-type backwash mechanism is used in combination, so that the device structure is simple and operation management is easy, as well as efficiency. Backwashing is possible.
10:第1ポンプ(P1)
20:ろ過部
30:処理水貯留槽
31:処理水流出口
40:サイホン管
41:フロースイッチ
51:取水管
52:被処理水配管
53:処理水配管
54:ろ過水配管
55:排出用配管
56:空気抜き配管
57:流量調整用配管
61:消毒剤供給槽
62:消毒剤供給管
70:制御部
81:凝集剤供給槽
82:凝集剤供給管
100:ろ過装置
521:ラインミキサ
561:空気抜き弁
10: First pump (P1)
20: Filtration unit 30: Treated water storage tank 31: Treated water outlet 40: Siphon pipe 41: Flow switch 51: Intake pipe 52: Treated water pipe 53: Treated water pipe 54: Filtered water pipe 55: Drain pipe 56: Air vent pipe 57: Flow rate adjusting pipe 61: Disinfectant supply tank 62: Disinfectant supply pipe 70: Control unit 81: Flocculant supply tank 82: Flocculant supply pipe 100: Filtration device 521: Line mixer 561: Air vent valve

Claims (4)

  1.  ろ過材により内部が一次側領域と二次側領域とに区分され、被処理水をろ過材でろ過して処理水を得るろ過部と、
     前記一次側領域に前記被処理水を送出するポンプと、
     前記ポンプの吐出口と前記一次側領域とを接続する被処理水配管と、
     鉛直方向の位置が前記ろ過部よりも上方であり、前記ろ過材でろ過されて前記二次側領域から流出した前記処理水を貯留する処理水貯留槽と、
     前記処理水貯留槽に設けられた処理水流出口と、
     前記処理水流出口よりも下方で前記処理水貯留槽と前記二次側領域とを接続する処理水配管と、
     一端が前記ポンプと前記ろ過部との間で前記被処理水配管に接続され、他端が前記処理水流出口の鉛直方向位置よりも下方に位置し、前記一端と前記他端との間で前記処理水流出口の位置よりも鉛直方向に所定の高さだけ高い位置まで立ち上げられたサイホン管と、
     前記ポンプの駆動および停止を制御する制御部と、
    を備え、
     前記サイホン管を介したサイホンの形成により前記処理水を用いて前記ろ過材を逆洗可能であり、
     前記サイホン管を介したサイホンの形成による前記ろ過材の逆洗開始を検知する逆洗開始検知手段と、逆洗の終了タイミングを検知する逆洗終了検知手段とを更に備え、
     前記制御部は、前記逆洗開始検知手段の検知結果に基づいて前記ポンプを停止し、前記逆洗終了検知手段の検知結果に基づいて前記ポンプを再び駆動することを特徴とする、ろ過装置。
    The inside is divided into a primary side region and a secondary side region by the filtering material, and a filtration unit that obtains treated water by filtering the treated water with the filtering material,
    A pump that delivers the treated water to the primary region;
    A treated water pipe connecting the discharge port of the pump and the primary side region;
    A treated water storage tank that stores the treated water that is filtered by the filter medium and flows out from the secondary side region, the vertical position being above the filtration unit;
    A treated water outlet provided in the treated water storage tank;
    A treated water pipe connecting the treated water storage tank and the secondary region below the treated water outlet;
    One end is connected to the treated water pipe between the pump and the filtration unit, the other end is located below the vertical position of the treated water outlet, and the one end and the other end A siphon tube raised to a position that is higher than the position of the treated water outlet by a predetermined height in the vertical direction;
    A control unit for controlling driving and stopping of the pump;
    With
    The filter medium can be backwashed using the treated water by forming a siphon through the siphon tube,
    A backwash start detecting means for detecting the backwash start of the filter medium due to the formation of the siphon through the siphon tube, and a backwash end detecting means for detecting the backwash end timing;
    The said control part stops the said pump based on the detection result of the said backwash start detection means, and drives the said pump again based on the detection result of the said backwash completion detection means, The filtration apparatus characterized by the above-mentioned.
  2.  前記逆洗開始検知手段および逆洗終了検知手段が、前記サイホン管の鉛直方向上端位置よりも前記他端側に配置されたフロースイッチであることを特徴とする、請求項1に記載のろ過装置。 2. The filtration device according to claim 1, wherein the backwashing start detection unit and the backwashing end detection unit are a flow switch arranged on the other end side with respect to a vertical upper end position of the siphon tube. .
  3.  前記ろ過部は、
     一端が前記一次側領域に接続された空気抜き配管と、
     前記空気抜き配管に設けられた空気抜き弁とを有することを特徴とする、請求項1又は2に記載のろ過装置。
    The filtration unit is
    An air vent pipe having one end connected to the primary region;
    It has an air vent valve provided in the said air vent piping, The filtration apparatus of Claim 1 or 2 characterized by the above-mentioned.
  4.  前記ポンプは出力調整手段を有することを特徴とする、請求項1~3の何れか一項に記載のろ過装置。 The filtration device according to any one of claims 1 to 3, wherein the pump has output adjusting means.
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CN105536323A (en) * 2016-02-26 2016-05-04 江苏大学 Automatic back-flush mesh filter

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6391110A (en) * 1986-10-03 1988-04-21 Fuji Electric Co Ltd Rapid filter
JPH02211203A (en) * 1989-02-10 1990-08-22 Fuji Electric Co Ltd Rapid filtering apparatus
JP2001340708A (en) * 2000-06-05 2001-12-11 Akihisa Minato Equipment and process for filtration
JP2008229302A (en) * 2007-03-22 2008-10-02 Shoei:Kk Hair catcher with back-washing function, and sterilizing system using the same
JP2008248787A (en) * 2007-03-30 2008-10-16 Kubota Corp Method for operating hydraulic turbine
JP2012086141A (en) * 2010-10-19 2012-05-10 Yanmar Co Ltd Filter

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4941483Y1 (en) * 1970-03-10 1974-11-14
JPS5129586B2 (en) * 1972-08-16 1976-08-26
JPH0231123Y2 (en) * 1985-02-08 1990-08-22
JPS62237916A (en) * 1986-04-07 1987-10-17 Kurita Water Ind Ltd Method for backwashing filter
JPH01249111A (en) * 1988-03-31 1989-10-04 Hayakawa Kogyo Kk Filtration treatment device
JP2819185B2 (en) * 1990-06-01 1998-10-30 株式会社鶴見製作所 Water supply control device
JP2002263647A (en) * 2001-03-12 2002-09-17 Fuji Electric Co Ltd Water treatment method and device
JP2008104898A (en) * 2006-10-23 2008-05-08 Sanyo Electric Co Ltd Apparatus for regenerating solution to be treated
JP2012040473A (en) * 2010-08-16 2012-03-01 Yanmar Co Ltd Filter

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6391110A (en) * 1986-10-03 1988-04-21 Fuji Electric Co Ltd Rapid filter
JPH02211203A (en) * 1989-02-10 1990-08-22 Fuji Electric Co Ltd Rapid filtering apparatus
JP2001340708A (en) * 2000-06-05 2001-12-11 Akihisa Minato Equipment and process for filtration
JP2008229302A (en) * 2007-03-22 2008-10-02 Shoei:Kk Hair catcher with back-washing function, and sterilizing system using the same
JP2008248787A (en) * 2007-03-30 2008-10-16 Kubota Corp Method for operating hydraulic turbine
JP2012086141A (en) * 2010-10-19 2012-05-10 Yanmar Co Ltd Filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105536323A (en) * 2016-02-26 2016-05-04 江苏大学 Automatic back-flush mesh filter

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