WO2014209017A1 - Shower head for electronic device having dispersion pins fabrication, and shower head assembly - Google Patents

Shower head for electronic device having dispersion pins fabrication, and shower head assembly Download PDF

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Publication number
WO2014209017A1
WO2014209017A1 PCT/KR2014/005644 KR2014005644W WO2014209017A1 WO 2014209017 A1 WO2014209017 A1 WO 2014209017A1 KR 2014005644 W KR2014005644 W KR 2014005644W WO 2014209017 A1 WO2014209017 A1 WO 2014209017A1
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WO
WIPO (PCT)
Prior art keywords
intermediate plate
shower head
hole
gas
diffusion
Prior art date
Application number
PCT/KR2014/005644
Other languages
French (fr)
Korean (ko)
Inventor
변철수
정일용
Original Assignee
한국생산기술연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020140077279A external-priority patent/KR101542599B1/en
Application filed by 한국생산기술연구원 filed Critical 한국생산기술연구원
Priority to US14/392,174 priority Critical patent/US10161040B2/en
Publication of WO2014209017A1 publication Critical patent/WO2014209017A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45574Nozzles for more than one gas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45565Shower nozzles

Definitions

  • the present invention relates to a shower head and a shower head assembly for manufacturing an electronic device.
  • the gas must be sufficiently diffused in the shower head in the lateral direction so that the gas can be uniformly sprayed over the entire shower head.
  • the configuration that is installed to protrude upward has been introduced.
  • FIG. 1 to 3 are views for explaining a conventional shower head having a diffusion pin, and the same reference numerals are substantially the same as those already disclosed in Korean Patent Nos. 972801 and 972802.
  • FIG. 1 is a view for explaining an example of a conventional shower head.
  • the interior space of the shower head body 100 is divided into two spatial layers, a diffusion chamber 110 and a distribution chamber 120, by an intermediate plate 150 installed horizontally.
  • a plurality of connection holes 171 are installed in the 150 to penetrate in the vertical direction, and the diffusion pins 160 are inserted into the connection holes 171 to protrude upward.
  • the bottom surface of the body 100 is formed so that the injection hole 170 penetrates.
  • the gas supply unit 130 is installed in the diffusion chamber 110.
  • the gas that enters the longitudinal direction toward the center portion of the diffusion chamber 110 through the gas supply unit 130 impinges on the intermediate plate 150 and diffuses radially in the transverse direction, that is, the central portion to the outward direction.
  • the diffusion pin 160 is intended to allow such a lateral diffusion to occur quickly, and the gap g1 between the upper end of the diffusion pin 160 and the body 100 is relatively larger than the protruding length of the diffusion pin 160. It is more preferable when it is small.
  • the gas supplied into the shower head body 100 is distributed under the diffusion chamber 110 while uniformly spreading in the transverse chamber 110 in the transverse direction within a short time under the influence of the diffusion pin 160 ( 120 is injected evenly through the diffusion pin 160, more evenly distributed in the distribution chamber 120, and then sprayed downward with the substrate (not shown) at an even pressure through the injection hole 170 do.
  • the spacer 180 must be installed in the diffusion chamber 110 so that the gap g1 is constantly maintained and the intermediate plate 150 is stably fixed.
  • the added structure causes a problem that the lateral diffusion of the gas cannot be made quickly and stably.
  • FIG. 2 is a view for explaining another example of the conventional shower head.
  • two intermediate plates are installed as the first intermediate plate 151 and the second intermediate plate 152, so that the internal space of the body 100 is formed from the first diffusion chamber ( 111 is divided into a second diffusion chamber 112 and a distribution chamber 120, and two gas supply units are installed instead of one, unlike in FIG. 1, and the first gas supply unit 131 is a first diffusion chamber 111. ), And the second gas supply unit 132 is installed in the second diffusion chamber 112.
  • Each of the intermediate plates 151 and 152 is formed such that a plurality of connection holes 171 pass through.
  • a plurality of first diffusion pins 161 pass through the second diffusion chamber 112, and then the connection holes 171 of the first intermediate plate 151 are formed.
  • a plurality of second diffusion pins 162 are installed in the other connection hole 171 of the second intermediate plate 152 to penetrate upwardly through the first intermediate plate 151. It is fitted to protrude upward.
  • the first gas supplied to the first diffusion chamber 111 through the first gas supply unit 131 is uniformly laterally in the first diffusion chamber 111 within a short time under the influence of the first diffusion pin 161.
  • the second gas is uniformly introduced into the distribution chamber 120 through the first diffusion pin 161 and is supplied to the second diffusion chamber 112 through the second gas supply unit 132. Under the influence of 162, the diffusion is uniformly spread in the second diffusion chamber 112 laterally within the second diffusion chamber 112 and then uniformly flows into the distribution chamber 120 through the second diffusion pin 162.
  • the first gas and the second gas are evenly mixed with respect to the entire area, and then injected downward through the injection hole 170 at an equal pressure.
  • FIG. 3 is a view for explaining another example of a conventional shower head.
  • the two showerheads of FIG. 2 are stacked up and down, and the upper showerhead is installed so that the injection tube 140 extends downward from the injection hole 170.
  • first gas and the second gas introduced through the upper shower head are evenly distributed in the distribution chamber 120 and then sprayed toward the substrate (not shown) via the spray tube 140 via the lower shower head.
  • the first gas and the second gas introduced through the shower head below may be sprayed evenly in the distribution chamber 120 and then sprayed downward through the injection tube 140.
  • the first gas and the second gas flowing into the upper shower head and the first gas and the second gas flowing into the lower shower head may be of the same kind or different kinds according to a desired specification. .
  • spacers 180, 181, and 182 must be installed to stably fix the intermediate plates 150, 151, and 152, so that gas is diffused into the chambers 110, 111, and 112.
  • the spacers 180, 181, and 182 act as obstacles when the lateral diffusion is performed in the N-side diffusion, and thus the lateral diffusion cannot be made quickly and stably.
  • the body having one surface and a plurality of injection holes are formed through and the other surface facing the one surface; Protruding from the plurality of injection holes on the one side to the other surface side to support the other surface, a gas inlet is formed on one side, and includes a plurality of diffusion pins having a passage connected to the gas inlet therein; And a shower head through which the gas introduced between the and one surface is discharged to the outside of the body through the plurality of injection holes immediately after passing through the gas inlet hole and the passage.
  • the body having one surface formed with a plurality of injection holes and the other surface facing the one surface;
  • a first intermediate plate disposed between the one surface and the other surface and protruding from the first connection hole of the first intermediate plate through which the first connection hole is formed and the first connection hole of the first intermediate plate to the other surface, and having an end portion supporting the other surface;
  • a first diffusion pin having a first passage connected to the first connection hole, wherein a first gas inlet is formed at one side of the second diffusion pin so that the gas introduced between the other surface and the first intermediate plate is
  • a shower head is provided through the first gas inlet hole and the first passage, and is spread between the one surface and the first intermediate plate and then discharged out of the body through the injection hole.
  • the first diffusion pin may be formed to pass through the second intermediate plate.
  • the one surface may be a bottom surface of the interior space of the body, and the other surface may be a ceiling of the interior space of the body.
  • the first gas inlet hole may be formed at the end of the first diffusion pin, and the second gas inlet hole may be formed at the end of the second diffusion pin.
  • a filler sheet for brazing may be installed on the bottom surface, the surface facing the ceiling of the first intermediate plate and the second intermediate plate, and the upper surface of the ceiling.
  • a shower head assembly including the first and second shower heads in which the above-described two shower heads are disposed in the vertical direction, wherein the first shower head is formed on the body of the first shower head.
  • a spray tube extending downward is installed in the cavity, and the second shower head is provided with a shower head assembly in which a guide tube through which the spray tube penetrates in a vertical direction is installed.
  • the body having one surface through which a plurality of injection holes are formed and the other surface facing the one surface;
  • a third intermediate plate disposed between the one surface and the other surface and having a third connection hole formed therethrough;
  • a third diffusion pin protruding from the third connection hole of the third intermediate plate toward the one surface side to support the one surface, and having a third diffusion pin having a third passage connected to the third connection hole therein;
  • a first gas discharge hole is formed at one side of the third diffusion pin so that gas introduced between the other surface and the third intermediate plate passes through the third passage and the first gas discharge hole to the outside of the body through the injection hole.
  • a shower head is provided which is discharged to.
  • the third diffusion pin may be formed to pass through the fourth intermediate plate.
  • a fourth connection hole formed through the fourth intermediate plate and a fourth passage protruding from the fourth connection hole toward the one side, and having an end portion supporting the one surface and having a fourth passage connected to the fourth connection hole therein.
  • a fourth gas diffusion hole wherein a second gas outlet hole is formed at one side of the fourth diffusion pin, and the gas introduced between the third intermediate plate and the fourth intermediate plate is in the fourth passage and the second gas outlet hole.
  • the one surface may be a bottom surface of the interior space of the body, and the other surface may be a ceiling of the interior space of the body.
  • the first gas discharge hole may be formed at the end of the third diffusion pin, and the second gas discharge hole may be formed at the end of the fourth diffusion pin.
  • a filler sheet to be brazed is installed on the ceiling, the bottom facing the bottom surface of the third and fourth intermediate plates, and the bottom surface of the bottom surface, and then the showerhead is braided upside down. Can be.
  • a shower head assembly including third and fourth shower heads having the above-described two shower heads disposed in a vertical direction, wherein the third shower head is formed in a body of the third shower head.
  • An injection tube extending downward in the injection hole is installed, and the fourth shower head is provided with a shower head assembly in which a guide tube through which the injection tube passes in the vertical direction is installed.
  • a diffusion pin installed in the shower head is formed to support a ceiling, a bottom, or an intermediate plate inside the shower head body, so that a separate spacer is not required.
  • the shower head according to an embodiment of the present invention may seal the inside of the shower head more firmly by brazing a gap generated at the installation position of the diffusion pin and the injection tube using the filler sheet.
  • FIG. 1 is a cross-sectional view for explaining an example of a conventional shower head.
  • FIG. 2 is a cross-sectional view for explaining another example of the conventional shower head.
  • FIG 3 is a cross-sectional view for explaining another example of a conventional shower head.
  • FIG. 4 is a cross-sectional view of the shower head according to the first embodiment of the present invention.
  • FIG. 5 is a cross-sectional view of the shower head according to the second embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of the shower head assembly according to the third embodiment of the present invention.
  • FIG. 7 is a sectional view of a shower head according to a fourth embodiment of the present invention.
  • FIG. 8 is a cross-sectional view of the shower head assembly according to the fifth embodiment of the present invention.
  • FIG 4 is a cross-sectional view of the shower head 200 according to the first embodiment of the present invention.
  • the shower head 200 includes a body 210 and a diffusion pin 220.
  • the body 210 has a hexahedron shape, and a gas injection hole 217 is formed in one side thereof, and a plurality of injection holes 213 are formed in the bottom 212 to discharge the gas injected therein. It is formed through. Accordingly, the gas injected into the body 210 may be diffused into the body 210 and then discharged to the outside through the plurality of injection holes 213 formed in the bottom surface 212 of the body 210.
  • a plurality of diffusion pins 220 are installed inside the body 210.
  • Each of the plurality of diffusion pins 220 protrudes upward from the plurality of injection holes 213 in the upper direction, and is formed to support the ceiling 214.
  • a gas inlet hole 223 is formed at an upper end of the diffusion pin 220, and a passage 225 connected to the gas inlet hole 223 is formed in the diffusion pin 220.
  • the passage 225 is connected to the injection hole 213.
  • the gas inlet hole 223 may be made by cutting a part of the end of the diffusion pin 220, or may be made by forming a through hole in the end side.
  • the gas inlet hole 223 is formed at the end of the diffusion pin 220, but the position of the gas inlet hole 223 is not limited thereto, and may be formed in the middle of the diffusion pin 220.
  • the gas introduced into the body 210 through the gas inlet 217 passes through the gas inlet 223 and passes through the diffusion pin 220. 225 is formed to pass.
  • the gas moved along the passage 225 is formed to be discharged to the outside of the body 210 through the injection hole 213.
  • the diffusion pin 220 may be installed in all the injection holes 213 inside the body 210, respectively, it may be possible to be installed only in some of the injection holes (213).
  • the number of diffusion pins, the size of the confidence pin, the size of the gas inlet hole, the passage and the injection hole formed in the diffusion pin is the diffusion speed of the gas flowing into the shower head It may be selected in consideration of the like.
  • shower head according to an embodiment of the present invention is formed so that the upper end supports the ceiling in the state in which the lower end of each of the diffusion pins are supported on the bottom surface, each of the plurality of diffusion pins support the inside of the shower head body and a separate spacer in the body Is not installed. Accordingly, the shower head according to an embodiment of the present invention does not interfere with the gas that the spacer diffuses inside the body.
  • the filler sheet formed with a through hole at the position where the injection hole is formed to seal such a gap ( 216 is placed on the bottom of the body and brazed under appropriate temperature and pressure to install the filler sheet on the bottom of the body.
  • FIG. 5 is a cross-sectional view of the shower head according to the second embodiment of the present invention.
  • the shower head according to the second exemplary embodiment of the present invention with reference to FIG. 5, detailed descriptions of the same components as those of the first exemplary embodiment will be omitted, and descriptions will be given based on the configuration that is different from the first exemplary embodiment.
  • the shower head 300 includes a body 310, a first intermediate plate 320, a second intermediate plate 340, a first diffusion pin 330, and a second diffusion pin 350. ) May be included.
  • the shower head 300 has a rectangular parallelepiped shape similar to that described in the first exemplary embodiment, and a gas injection hole through which gas is injected into one side thereof is formed, and on the bottom 312.
  • the first intermediate plate 320 and the second intermediate plate 340 are formed in the body 310 through which the plurality of injection holes 313 through which the gas injected into the inside is discharged is formed.
  • the shower head 300 includes a first diffusion pin 330 installed between the first intermediate plate 320 and the ceiling 314, the first intermediate plate 320 and the second intermediate plate. It is formed in a structure including a second diffusion pin 350 installed between the plate 340.
  • the first intermediate plate 320 and the second intermediate plate 340 are disposed side by side between the bottom 312 and the ceiling 314 of the body 310.
  • the first gas inlet 319 is formed on one side of the side of the body so that the first gas flows between the first intermediate plate 320 and the second intermediate plate 340, the second intermediate plate 340
  • the second gas injection hole 317 is formed at the other side of the body 310 to allow the second gas to flow between the ceiling and the ceiling 314.
  • the first gas and the second gas may be the same gas or may be different kinds of gases.
  • the first diffusion pin 330 is connected to the plurality of first connection holes 323 formed at the lower end of the first intermediate plate 320, and protrudes upward to form the ceiling 314 of the body 310. It is formed to support).
  • a first gas inlet 333 is formed at an upper end of the first diffusion pin 330, and a first passage 335 is formed inside the first diffusion pin 330 connected to the first gas inlet 333. And a second gas introduced through the first gas inlet 333 may move to the lower space of the first intermediate plate 320 through the first connection hole 323 through the first passage 335.
  • the second gas moved to the lower space of the first intermediate plate 320 is diffused in the lower space of the body 310 and the lower space of the first intermediate plate 320, and thus the lower surface 312 of the body 310. It may be discharged to the outside of the body 310 through the injection hole (313).
  • the first intermediate plate 320 and the second intermediate plate 340 in order to move the first gas introduced between the first intermediate plate 320 and the second intermediate plate 340 to the lower side of the first intermediate plate 320, the first intermediate plate 320 and the second intermediate plate ( The second diffusion pin 350 is installed between the 340.
  • the second diffusion pin 350 has a lower end connected to the plurality of second connection holes 325 formed in the first intermediate plate 320, and protrudes upward, so that the upper end thereof has the second intermediate plate 340. It is formed to support the lower side of the.
  • the first diffusion pin 330 installed in the first intermediate plate 320 is formed to pass through the second intermediate plate 340.
  • a second gas inlet 353 is formed at an upper end of the second diffusion pin 350, and a second passage 355 is formed inside the second diffusion pin 350 connected to the second gas inlet 353.
  • the first gas introduced through the second gas inlet hole 353 may move to the lower space of the first intermediate plate 320 through the second connection hole 325 through the second passage 355. have.
  • the first gas moved to the lower space of the first intermediate plate 320 is diffused in the lower space of the body 310 and the lower space of the first intermediate plate 320, and thus the lower surface 312 of the body 310. It may be discharged to the outside of the body 310 through the injection hole (313).
  • the first gas and the second gas supplied into the space between the first intermediate plate 320 and the bottom 312 of the body 310 may have the bottom 312 of the first intermediate plate 320 and the body 310. After being uniformly mixed in the space therebetween, it may be discharged out of the body through the injection hole (313).
  • the distance between the first intermediate plate and the second intermediate plate formed inside the body may vary depending on the type of gas and the flow rate of the gas to be introduced.
  • the shower head 300 may include a first diffusion pin 330 and a first intermediate plate 320 and a second intermediate plate 340 installed inside the body 310.
  • a second diffusion pin 350 but the lower ends of the first diffusion pin 330 and the second diffusion pin 350 is coupled to the first intermediate plate 320, the first diffusion pin 330 and the second
  • the upper end of the diffusion pin 350 is formed to support the ceiling 314 and the second intermediate plate 340, respectively, so that the first intermediate plate 320 and the second intermediate plate 340 are inside the body 310 without a spacer. Can be firmly supported. Accordingly, the shower head according to the second embodiment of the present invention is not disturbed by the diffusion of gas by the spacer.
  • the shower head 300 according to the second embodiment of the present invention, the upper side of the bottom 312, the upper side of the first intermediate plate 320 and the second intermediate plate 340, and the ceiling 314
  • the filler sheet 316 is installed on the surface facing the outside of the body as described in the first embodiment, so as to form a gap between the diffusion pin and the intermediate plate on which the diffusion pin is installed. It can be sealed.
  • FIG. 6 is a cross-sectional view of the shower head assembly 400 according to the third embodiment of the present invention.
  • the shower head assembly 400 according to the third embodiment of the present invention has a configuration in which two shower heads 300 according to the second embodiment are arranged in the vertical direction as shown in FIG. 6.
  • the shower head located on the upper side is defined as the upper shower head 401, and the shower head located on the lower side is defined and described as the lower shower head 402.
  • the shower head assembly 400 uses the shower head having the same structure as the shower head 300 described in the second embodiment to connect the upper shower head 401 and the lower shower head 402. Can be configured.
  • the gas of the upper shower head 401 may be discharged to the injection hole 313 of the upper shower head 401 through the lower shower head 402 to be discharged to the lower side of the lower shower head 402.
  • the injection hole 360 is installed in the hole 313 so as to extend downward.
  • FIG. 6 only two spray tubes 360 are shown for the sake of simplicity, but a larger number of spray tubes may be installed in the upper shower head 401.
  • the lower shower head 402 has a plurality of guide tubes 370 through which the injection tube 360 connected to the upper shower head 401 penetrates in the vertical direction. Installed through 310.
  • the gas from the upper shower head 401 and the gas from the lower shower head 402 may be injected below the lower shower head 402.
  • the gas injected after entering the upper shower head 401 and the gas injected after entering the lower shower head 402 may be the same, or may be different from each other. It may be set in various ways depending on the type and process.
  • FIG. 7 is a cross-sectional view of the shower head 500 according to the fourth embodiment of the present invention.
  • the shower head 500 may include a body 510, a third intermediate plate 520, a fourth intermediate plate 540, a third diffusion pin 530, and the like. It may include a fourth diffusion pin 550.
  • the shower head 500 according to the fourth embodiment of the present invention has a rectangular parallelepiped shape similar to that described in the second embodiment, and a gas inlet for injecting gas into one side is formed, and the bottom surface 512 has an interior. A plurality of injection holes 513 through which the gas injected into the outlet are discharged are formed.
  • the third intermediate plate 520 and the fourth intermediate plate 540 are formed in the body 510, and the third diffusion pin 530 is installed between the third intermediate plate 520 and the bottom surface 512. And a fourth diffusion pin 550 disposed between the fourth intermediate plate 540 and the bottom surface 512.
  • a third middle plate 520 and a fourth middle plate 540 are disposed side by side between the bottom 512 and the ceiling 514 of the body 510.
  • a third gas inlet 517 is formed at one side of the side of the body to allow the third gas to flow between the third middle plate 520 and the ceiling 514, and the third middle plate 520 and the fourth side.
  • a fourth gas inlet 519 is formed at the other side of the body 510 to allow the fourth gas to flow between the intermediate plates 540.
  • the third gas and the fourth gas may be the same gas or different kinds of gases.
  • the injection hole 513 of the body 510 is moved after being diffused downward of the fourth intermediate plate 540.
  • a third diffusion pin 530 is installed between the third intermediate plate 520 and the bottom 512 of the body 510 so as to be discharged through the third intermediate plate 520.
  • the third diffusion pin 530 is connected to a plurality of third connection holes 523 having an upper end formed in the third intermediate plate 520, and protrudes downward, so that the lower end has a bottom surface of the body 510 ( 512 is formed to support.
  • the third diffusion pin 530 is configured such that the upper end supports the third intermediate plate 520 while the lower end is installed on the bottom 512 of the body 510.
  • a first gas discharge hole 533 is formed at a lower end of the third diffusion pin 530, and a third passage 535 is formed inside the third diffusion pin 530 connected to the third connection hole 523. ) Is formed. Accordingly, the third gas introduced through the third connection hole 523 passes through the third passage 535 and passes through the first gas discharge hole 533 to the lower side of the fourth intermediate plate 540 and the body 510. It may be moved to a space between the bottom surface 512 of the.
  • the gas discharged into the space between the fourth intermediate plate 540 and the bottom surface 512 is diffused in the space and discharged to the outside of the body 510 through the injection hole 513 of the bottom surface 512 of the body 510.
  • the fourth diffusion pin 550 is installed.
  • the fourth diffusion pin 550 is connected to the plurality of fourth connection holes 543 formed at the upper end of the fourth intermediate plate 540 and protrudes downward, and thus the lower end of the fourth diffusion pin 550 is formed on the bottom surface 512 of the body 510. It is formed to be connected to).
  • the fourth diffusion pin 550 is configured such that the upper end supports the fourth intermediate plate 540 while the lower end is installed on the bottom 512 of the body 510. At this time, the third diffusion pin 530 is formed to pass through the fourth intermediate plate 540.
  • a second gas discharge hole 553 is formed at a lower end of the fourth diffusion pin 550, and a fourth passage 555 is formed inside the fourth diffusion pin 550 connected to the fourth connection hole 543. Is formed. Accordingly, the fourth gas introduced through the fourth connection hole 543 passes through the fourth passage 555 and passes through the second gas discharge hole 553 to the lower side of the fourth intermediate plate 540 and the body 510. It may be moved to a space between the bottom surface 512 of the.
  • the gas discharged into the space between the fourth intermediate plate 540 and the bottom surface 512 may be diffused in the space and discharged to the outside of the body through the injection hole 513 of the bottom surface 512 of the body 510. .
  • the third gas and the fourth gas supplied into the space between the fourth intermediate plate 540 and the bottom surface 512 of the body 510 are spaces between the fourth intermediate plate 540 and the bottom surface of the body 510. After uniformly mixed in can be discharged to the outside through the injection hole 513.
  • the shower head 500 according to the fourth embodiment of the present invention may include a third diffusion pin 530 and a third intermediate plate 520 and a fourth intermediate plate 540 installed in the body 510.
  • the fourth diffusion pin 550 is used, but upper ends of the third diffusion pin 530 and the fourth diffusion pin 550 are formed to support the third intermediate plate 520 and the fourth intermediate plate 540, respectively.
  • the third intermediate plate 520 and the fourth intermediate plate 540 may be firmly supported within the body 510 without using the present invention. Accordingly, the shower head according to the fourth embodiment of the present invention is not disturbed by gas diffusion by the spacer.
  • the shower head according to the fourth embodiment of the present invention faces the outside of the body as a lower surface facing the bottom of the ceiling, the first intermediate plate and the second intermediate plate, and the side opposite to the bottom surface
  • the filler sheet 516 may be provided on the surface to seal the gap between the diffusion pin and the intermediate plate on which the diffusion pin is installed.
  • the filler sheet when the filler sheet is to be installed on the ceiling surface, the lower side of the bottom surface, and the lower side surfaces of the first intermediate plate and the second intermediate plate, the filler sheet may be installed while the shower head according to the fourth embodiment is turned over.
  • FIG 8 is a cross-sectional view of the shower head assembly 600 according to the fifth embodiment of the present invention.
  • the shower head assembly 600 according to the fifth embodiment of the present invention is configured to arrange two shower heads 500 according to the fourth embodiment in the vertical direction as shown in FIG. 8.
  • an upper shower head is defined as the upper shower head 601 and a lower shower head is defined as the lower shower head 602.
  • the shower head assembly 600 uses the shower head having the same structure as the shower head 500 described in the fourth embodiment to connect the upper shower head 601 and the lower shower head 602. Can be configured.
  • two shower heads 500 according to the fourth embodiment are arranged in the vertical direction, but the shower heads described in the first and second embodiments may be provided in this way.
  • the gas of the upper shower head 601 may be discharged to the lower portion of the lower shower head 602 through the lower shower head 602 through the gas discharged to the injection hole 513 of the upper shower head 601.
  • the injection hole 513 is installed in the hole 513 to extend downward.
  • the lower shower head 602 has a plurality of guide tubes 580 through which the injection tube 570 connected to the upper shower head 601 may pass through the body (up and down). 510 is installed through.
  • the gas from the upper shower head 601 and the gas from the lower shower head 602 may be injected to the lower side of the lower shower head 602.
  • the gas injected after entering the upper shower head 601 and the gas injected after entering the lower shower head 602 may be the same or different gases, which is a kind of gas used in manufacturing an electronic device. And can be set variously according to the process.
  • the shower head supports the inside of the body by supporting the inside of the body by using a diffusion pin installed in the inside of the body constituting the shower head, or by supporting the intermediate plate.
  • the diffusion of the gas can be made easier by omitting the configuration of the spacer.

Abstract

A shower head is provided. The shower head, according to one exemplary embodiment of the present invention, comprises: a body provided with one side having a plurality of spray holes penetrated therethrough, and the other side facing the one side; and a plurality of first dispersion pins protruding from the plurality of spray holes of the one side to the other side such that end portions thereof support the other side, and having first gas inlet holes on one side thereof and provided with first passages connected to the first gas inlet holes therein, wherein gas introduced between the one side and the other side is immediately discharged to the outside of the body through the plurality of spray holes by passing the first gas inlet holes and the first passages.

Description

확산핀을 가지는 전자소자 제조용 샤워 헤드 및 샤워 헤드 조립체Shower head and shower head assembly for manufacturing electronic devices with diffusion pins
본 발명은 전자소자 제조용 샤워 헤드 및 샤워 헤드 조립체에 관한 것이다. The present invention relates to a shower head and a shower head assembly for manufacturing an electronic device.
반도체소자를 제조하기 위한 웨이퍼나 평판디스플레이를 제조하기 위한 글라스 등과 같은 기판이 대구경화 되면서 기판 전면적에 대한 공정 균일성을 확보하는 것이 중요한 문제로 대두되고 있으며, 이를 해결하여 박막증착 또는 식각 공정 등에서 기체공급수단으로서 샤워헤드(showerhead)가 많이 사용되고 있다. As substrates such as wafers for manufacturing semiconductor devices and glass for manufacturing flat panel displays have become large diameters, it is becoming an important problem to secure process uniformity over the entire surface of the substrate. Showerheads are widely used as supply means.
이 경우 샤워헤드 내에서 기체가 횡방향으로 충분히 확산되어야만 샤워헤드 전면적에 대해서 균일하게 기체가 분사될 수 있는데, 이를 위하여 대한민국 등록특허 제972801호 및 제972802호에는 샤워헤드 내부의 중간판에 확산핀이 상향 돌출되도록 설치되는 구성이 소개된 바 있다. In this case, the gas must be sufficiently diffused in the shower head in the lateral direction so that the gas can be uniformly sprayed over the entire shower head. The configuration that is installed to protrude upward has been introduced.
도 1 내지 도 3은 확산핀을 갖는 종래의 샤워헤드를 설명하기 위한 도면들로서, 상기 대한민국 등록특허 제972801호 및 제972802호에 이미 개시된 것과 참조번호만 다를 뿐 실질적으로 동일한 것이다. 1 to 3 are views for explaining a conventional shower head having a diffusion pin, and the same reference numerals are substantially the same as those already disclosed in Korean Patent Nos. 972801 and 972802.
도 1은 종래의 샤워헤드의 일예를 설명하기 위한 도면이다. 도 1에 도시된 바와 같이 샤워헤드 몸체(100)의 내부공간은 가로로 설치되는 중간판(150)에 의하여 확산실(110)과 분배실(120)이라는 2개의 공간층으로 분할되고, 중간판(150)에는 복수개의 연결구멍(171)이 상하방향으로 관통되게 설치되며 연결구멍(171)에 확산핀(160)이 상향 돌출되도록 끼워진다. 1 is a view for explaining an example of a conventional shower head. As shown in FIG. 1, the interior space of the shower head body 100 is divided into two spatial layers, a diffusion chamber 110 and a distribution chamber 120, by an intermediate plate 150 installed horizontally. A plurality of connection holes 171 are installed in the 150 to penetrate in the vertical direction, and the diffusion pins 160 are inserted into the connection holes 171 to protrude upward.
몸체(100)의 저면에는 분사공(170)이 관통되게 형성된다. 확산실(110)에는 기체공급부(130)가 설치된다. The bottom surface of the body 100 is formed so that the injection hole 170 penetrates. The gas supply unit 130 is installed in the diffusion chamber 110.
기체공급부(130)를 통해 확산실(110)의 중앙부를 향하여 종방향으로 들어온 기체는 중간판(150)에 부딪혀 횡방향으로 즉, 중앙부에서 외측 방향으로 방사상으로 확산된다. The gas that enters the longitudinal direction toward the center portion of the diffusion chamber 110 through the gas supply unit 130 impinges on the intermediate plate 150 and diffuses radially in the transverse direction, that is, the central portion to the outward direction.
확산핀(160)은 이러한 횡방향 확산이 빠르게 이루어지도록 하기 위한 것으로서, 확산핀(160)의 돌출 길이에 비하여 확산핀(160)의 위쪽 끝단과 몸체(100)의 사이의 틈새 (g1)가 상대적으로 작을 경우에 더욱 바람직하다. The diffusion pin 160 is intended to allow such a lateral diffusion to occur quickly, and the gap g1 between the upper end of the diffusion pin 160 and the body 100 is relatively larger than the protruding length of the diffusion pin 160. It is more preferable when it is small.
샤워헤드 몸체(100)의 내부로 공급된 기체는 확산핀(160)의 영향을 받아 짧은 시간 내에 확산실(110) 내에서 횡방향으로 균일하게 확산되면서 확산실(110)의 밑에 있는 분배실(120)로 확산핀(160)을 통하여 균등하게 유입된 후, 분배실(120) 내에서 더욱 균등하게 분배된 후 분사공(170)을 통해 균등한 압력으로 기판(미도시)이 있는 밑쪽으로 분사된다. The gas supplied into the shower head body 100 is distributed under the diffusion chamber 110 while uniformly spreading in the transverse chamber 110 in the transverse direction within a short time under the influence of the diffusion pin 160 ( 120 is injected evenly through the diffusion pin 160, more evenly distributed in the distribution chamber 120, and then sprayed downward with the substrate (not shown) at an even pressure through the injection hole 170 do.
그러나 상술한 종래의 샤워헤드는 틈새 (g1)의 간격을 일정하게 유지하고 중간판(150)이 안정되게 고정되도록 확산실(110) 내에 스페이서(180)가 설치되어야만 하므로, 제조 시 공정이 복잡해지고, 또한 추가된 구조물로 인해 기체의 횡방향 확산이 신속하고 안정되게 이루어지지 못하는 문제가 발생한다. However, in the above-described conventional showerhead, the spacer 180 must be installed in the diffusion chamber 110 so that the gap g1 is constantly maintained and the intermediate plate 150 is stably fixed. In addition, the added structure causes a problem that the lateral diffusion of the gas cannot be made quickly and stably.
도 2는 종래의 샤워헤드의 다른 예를 설명하기 위한 도면이다. 도 2의 경우는 중간판이 하나인 도 1과 달리 중간판이 제1중간판(151) 및 제2중간판(152)으로서 두 개가 설치되어 몸체(100)의 내부공간이 위에서부터 제1확산실(111), 제2확산실(112), 및 분배실(120)로 분할되고, 기체공급부도 도 1과 달리 한 개가 아닌 두 개가 설치되며, 제1기체공급부(131)는 제1확산실(111)에 설치되고, 제2기체공급부(132)는 제2확산실(112)에 설치된다. 2 is a view for explaining another example of the conventional shower head. In the case of FIG. 2, unlike the one of the intermediate plate of FIG. 1, two intermediate plates are installed as the first intermediate plate 151 and the second intermediate plate 152, so that the internal space of the body 100 is formed from the first diffusion chamber ( 111 is divided into a second diffusion chamber 112 and a distribution chamber 120, and two gas supply units are installed instead of one, unlike in FIG. 1, and the first gas supply unit 131 is a first diffusion chamber 111. ), And the second gas supply unit 132 is installed in the second diffusion chamber 112.
각 중간판(151, 152)에는 복수개의 연결구멍(171)이 관통되게 형성된다. 제2중간판(152)의 일부 연결구멍(171)에는 복수개의 제1확산핀(161)이 제2확산실(112)을 통과한 후 제1중간판(151)의 연결구멍(171)을 관통하여 제1중간판(151)의 위로 상향 돌출되도록 설치되고, 제2중간판(152)의 다른 일부 연결구멍(171)에는 복수개의 제2확산핀(162)이 제2중간판(152)의 위로 상향 돌출되도록 끼워진다. Each of the intermediate plates 151 and 152 is formed such that a plurality of connection holes 171 pass through. In some connection holes 171 of the second intermediate plate 152, a plurality of first diffusion pins 161 pass through the second diffusion chamber 112, and then the connection holes 171 of the first intermediate plate 151 are formed. A plurality of second diffusion pins 162 are installed in the other connection hole 171 of the second intermediate plate 152 to penetrate upwardly through the first intermediate plate 151. It is fitted to protrude upward.
제1기체공급부(131)를 통해서 제1확산실(111)로 공급된 제1기체는 제1확산핀(161)의 영향을 받아 짧은 시간 내에 제1확산실(111) 내에서 횡방향으로 균일하게 확산되면서 제1확산핀(161)을 통하여 분배실(120)로 균등하게 유입되고, 제2기체공급부(132)를 통해서 제2확산실(112)로 공급된 제2기체는 제2확산핀(162)의 영향을 받아 짧은 시간 내에 제2확산실(112) 내에서 횡방향으로 균일하게 확산된 뒤 제2확산핀(162)을 통하여 분배실(120)로 균등하게 유입된다. The first gas supplied to the first diffusion chamber 111 through the first gas supply unit 131 is uniformly laterally in the first diffusion chamber 111 within a short time under the influence of the first diffusion pin 161. The second gas is uniformly introduced into the distribution chamber 120 through the first diffusion pin 161 and is supplied to the second diffusion chamber 112 through the second gas supply unit 132. Under the influence of 162, the diffusion is uniformly spread in the second diffusion chamber 112 laterally within the second diffusion chamber 112 and then uniformly flows into the distribution chamber 120 through the second diffusion pin 162.
이로 인해 분배실(120)에서는 제1기체와 제2기체가 전면적에 대해서 균등하게 혼합된 후 분사공(170)을 통하여 균등한 압력으로 밑쪽으로 분사된다. For this reason, in the distribution chamber 120, the first gas and the second gas are evenly mixed with respect to the entire area, and then injected downward through the injection hole 170 at an equal pressure.
그러나 이 경우 또한 도 1의 경우와 마찬가지로 중간판(150)이 안정되게 고정되도록 제1확산실(111)과 제2확산실(112) 내에 스페이서(181, 182)가 설치되어야 하는 문제가 있다. However, in this case, as in the case of FIG. 1, there is a problem that spacers 181 and 182 must be installed in the first diffusion chamber 111 and the second diffusion chamber 112 so that the intermediate plate 150 is stably fixed.
도 3은 종래의 샤워헤드의 또 다른 예를 설명하기 위한 도면이다. 도 3의 경우는 도 2의 샤워헤드 두 개가 상하로 적층된 구조를 취하면서, 위에 있는 샤워헤드에는 분사공(170)에서 분사튜브(140)가 밑으로 뻗어 나오도록 설치되며, 밑에 있는 샤워헤드에는 위에 있는 샤워헤드의 분사튜브(140)가 관통하여 지나갈 수 있도록 안내관(145)이 설치된다. 3 is a view for explaining another example of a conventional shower head. In the case of FIG. 3, the two showerheads of FIG. 2 are stacked up and down, and the upper showerhead is installed so that the injection tube 140 extends downward from the injection hole 170. There is a guide tube 145 is installed so that the injection tube 140 of the showerhead to pass through.
그러면 위에 있는 샤워헤드를 통해 유입된 제1기체 및 제2기체는 분배실(120)에서 균등하게 분배된 후 분사튜브(140)를 통하여 밑에 있는 샤워헤드를 경유하여 기판(미도시)쪽으로 분사되고, 아래에 있는 샤워헤드를 통해 유입된 제1기체 및 제2기체는 분배실(120)에서 균등하게 분사된 후 마찬가지로 분사튜브(140)를 통해 밑으로 분사될 수 있다. Then, the first gas and the second gas introduced through the upper shower head are evenly distributed in the distribution chamber 120 and then sprayed toward the substrate (not shown) via the spray tube 140 via the lower shower head. The first gas and the second gas introduced through the shower head below may be sprayed evenly in the distribution chamber 120 and then sprayed downward through the injection tube 140.
이 때 위에 있는 샤워헤드에 유입되는 제1기체 및 제2기체와 밑에 있는 샤워헤드에 유입되는 제1기체 및 제2기체는 원하는 스펙에 따라 같은 종류의 것일 수도 있고, 서로 다른 종류의 것일 수도 있다. At this time, the first gas and the second gas flowing into the upper shower head and the first gas and the second gas flowing into the lower shower head may be of the same kind or different kinds according to a desired specification. .
그러나 이 또한 도 2에서와 마찬가지로 스페이서(181, 182)가 설치되어야 하는 것은 마찬가지이다. However, this also applies to the spacers 181 and 182, as in FIG.
상술한 바와 같이 종래의 샤워헤드의 경우, 중간판(150, 151, 152)을 안정되게 고정시키기 위하여 스페이서(180, 181, 182)가 설치되어야만 하며, 따라서 기체가 확산실(110, 111, 112)에서 횡방향 확산을 할 때 스페이서(180, 181, 182)가 장애물 역할을 하여 횡방향 확산이 신속하고 안정되게 이루어지지 못하는 문제점을 갖는다.As described above, in the case of the conventional shower head, spacers 180, 181, and 182 must be installed to stably fix the intermediate plates 150, 151, and 152, so that gas is diffused into the chambers 110, 111, and 112. The spacers 180, 181, and 182 act as obstacles when the lateral diffusion is performed in the N-side diffusion, and thus the lateral diffusion cannot be made quickly and stably.
본 발명의 일 실시예에 따르면, 확산핀의 설치 이점을 살리면서 스페이서를 별도로 설치할 필요가 없는 샤워 헤드를 제공하고자 한다. According to one embodiment of the present invention, to provide a shower head that does not need to install a spacer separately while taking advantage of the installation of the diffusion pin.
본 발명의 일 측면에 따르면, 복수의 분사공이 관통 형성된 일면 및 상기 일면에 대향하는 타면을 구비한 몸체; 상기 일면의 상기 복수의 분사공으로부터 상기 타면 측으로 돌출되어 단부가 상기 타면을 지지하며, 일측에 기체 유입공이 형성되고 내부에 상기 기체 유입공과 연결된 통로를 구비한 복수의 확산핀을 포함하며, 상기 타면과 상기 일면 사이로 유입된 기체가 상기 기체 유입공 및 상기 통로를 지나 바로 상기 복수의 분사공을 통하여 상기 몸체의 외부로 배출되는 샤워 헤드가 제공된다. According to an aspect of the invention, the body having one surface and a plurality of injection holes are formed through and the other surface facing the one surface; Protruding from the plurality of injection holes on the one side to the other surface side to support the other surface, a gas inlet is formed on one side, and includes a plurality of diffusion pins having a passage connected to the gas inlet therein; And a shower head through which the gas introduced between the and one surface is discharged to the outside of the body through the plurality of injection holes immediately after passing through the gas inlet hole and the passage.
본 발명의 다른 측면에 따르면, 복수의 분사공이 관통 형성된 일면 및 상기 일면에 대향하는 타면을 구비한 몸체; 상기 일면과 상기 타면 사이에 배치되며 제 1 연결 구멍이 관통 형성된 제 1 중간판 및 상기 제 1 중간판의 상기 제 1 연결 구멍으로부터 상기 타면 측으로 돌출되되 단부가 상기 타면을 지지하도록 형성되며, 내부에 상기 제 1 연결 구멍과 연결된 제 1 통로를 구비한 제 1 확산핀을 포함하며, 상기 제 2 확산핀의 일측에 제 1 기체 유입공이 형성되어 상기 타면과 상기 제 1 중간판 사이로 유입된 기체가 상기 제 1 기체 유입공 및 상기 제 1 통로를 지나 상기 일면과 상기 제 1 중간판 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체 외부로 배출되는 샤워 헤드가 제공된다. According to another aspect of the invention, the body having one surface formed with a plurality of injection holes and the other surface facing the one surface; A first intermediate plate disposed between the one surface and the other surface and protruding from the first connection hole of the first intermediate plate through which the first connection hole is formed and the first connection hole of the first intermediate plate to the other surface, and having an end portion supporting the other surface; And a first diffusion pin having a first passage connected to the first connection hole, wherein a first gas inlet is formed at one side of the second diffusion pin so that the gas introduced between the other surface and the first intermediate plate is A shower head is provided through the first gas inlet hole and the first passage, and is spread between the one surface and the first intermediate plate and then discharged out of the body through the injection hole.
이 때, 상기 제 1 중간판 및 상기 타면 사이에 배치되는 제 2 중간판을 더 포함하며, 상기 제 1 확산핀은 상기 제 2 중간판을 관통하도록 형성될 수 있다. At this time, further comprising a second intermediate plate disposed between the first intermediate plate and the other surface, the first diffusion pin may be formed to pass through the second intermediate plate.
이 때, 상기 제 1 중간판에 관통 형성되는 제 2 연결 구멍 및 상기 제 2 연결 구멍으로부터 상기 제 2 중간판 측으로 돌출 형성되되 단부가 상기 제 2 중간판을 지지하며 내부에 상기 제 2 연결 구멍과 연결된 제 2 통로를 구비한 제 2 확산핀을 더 포함하며, 상기 제 2 확산핀의 일측에 제 2 기체 유입공이 형성되어, 상기 제 1 중간판과 상기 제 2 중간판 사이로 유입된 기체가 상기 제 2 기체 유입공 및 상기 제 2 통로를 지나 상기 일면과 상기 제 1 중간판 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체 외부로 배출될 수 있다. At this time, the second connecting hole formed through the first intermediate plate and protruding from the second connecting hole toward the second intermediate plate, the end of which supports the second intermediate plate and the second connecting hole therein and And a second diffusion pin having a second passage connected thereto, wherein a second gas inlet is formed at one side of the second diffusion pin so that the gas introduced between the first intermediate plate and the second intermediate plate After passing through the second gas inlet hole and the second passageway between the one surface and the first intermediate plate may be discharged to the outside of the body through the injection hole.
이 때, 상기 일면은 상기 몸체 내부 공간의 저면이며, 상기 타면은 상기 몸체 내부 공간의 천장일 수 있다. In this case, the one surface may be a bottom surface of the interior space of the body, and the other surface may be a ceiling of the interior space of the body.
이 때, 상기 제 1 기체 유입공은 상기 제 1 확산핀의 단부에 형성되며, 상기 제 2 기체 유입공은 상기 제 2 확산핀의 단부에 형성될 수 있다. In this case, the first gas inlet hole may be formed at the end of the first diffusion pin, and the second gas inlet hole may be formed at the end of the second diffusion pin.
이 때, 상기 저면, 상기 제 1 중간판 및 상기 제 2 중간판의 상기 천장을 향하는 면 및 상기 천정의 윗면 에 브레이징 처리할 필러 시트가 설치될 수 있다. In this case, a filler sheet for brazing may be installed on the bottom surface, the surface facing the ceiling of the first intermediate plate and the second intermediate plate, and the upper surface of the ceiling.
본 발명의 다른 측면에 따르면, 전술한 샤워 헤드 2개가 상하 방향으로 배치된 제 1 및 제 2 샤워 헤드를 포함하는 샤워 헤드 조립체로서, 상기 제 1 샤워 헤드에는 상기 제 1 샤워 헤드의 몸체에 형성된 분사공에 하측 방향으로 연장된 분사 튜브가 설치되며, 상기 제 2 샤워 헤드에는 상기 분사 튜브가 상하 방향으로 관통하는 안내 관이 설치되는 샤워 헤드 조립체가 제공된다. According to another aspect of the present invention, a shower head assembly including the first and second shower heads in which the above-described two shower heads are disposed in the vertical direction, wherein the first shower head is formed on the body of the first shower head. A spray tube extending downward is installed in the cavity, and the second shower head is provided with a shower head assembly in which a guide tube through which the spray tube penetrates in a vertical direction is installed.
본 발명의 또 다른 측면에 따르면, 복수의 분사공이 관통 형성되는 일면 및 상기 일면에 대향하는 타면을 구비한 몸체; 상기 일면과 상기 타면 사이에 배치되며 제 3 연결 구멍이 관통 형성되는 제 3 중간판; 상기 제 3 중간판의 상기 제 3 연결 구멍으로부터 상기 일면 측으로 돌출되어 단부가 상기 일면을 지지하도록 형성되며, 내부에 상기 제 3 연결 구멍과 연결된 제 3 통로를 구비한 제 3 확산핀을 포함하며, 상기 제 3 확산핀의 일측에 제 1 기체 배출공이 형성되어 상기 타면과 상기 제 3 중간판 사이로 유입된 기체가 상기 제 3 통로 및 상기 제 1 기체 배출공을 지나 상기 분사공을 통하여 상기 몸체의 외부로 배출되는 샤워 헤드가 제공된다. According to another aspect of the invention, the body having one surface through which a plurality of injection holes are formed and the other surface facing the one surface; A third intermediate plate disposed between the one surface and the other surface and having a third connection hole formed therethrough; A third diffusion pin protruding from the third connection hole of the third intermediate plate toward the one surface side to support the one surface, and having a third diffusion pin having a third passage connected to the third connection hole therein; A first gas discharge hole is formed at one side of the third diffusion pin so that gas introduced between the other surface and the third intermediate plate passes through the third passage and the first gas discharge hole to the outside of the body through the injection hole. A shower head is provided which is discharged to.
이 때, 상기 제 3 중간판 및 상기 일면 사이에 배치되는 제 4 중간판을 더 포함하며, 상기 제 3 확산핀은 상기 제 4 중간판을 관통하도록 형성될 수 있다. At this time, further comprising a fourth intermediate plate disposed between the third intermediate plate and the one surface, the third diffusion pin may be formed to pass through the fourth intermediate plate.
이 때, 상기 제 4 중간판에 관통 형성된 제 4 연결 구멍 및 상기 제 4 연결 구멍으로부터 상기 일면 측으로 돌출되어 단부가 상기 일면을 지지하며 내부에 상기 제 4 연결 구멍과 연결된 제 4 통로를 구비한 제 4 확산핀을 포함하며, 상기 제 4 확산핀의 일측에 제 2 기체 배출공이 형성되어, 상기 제 3 중간판 및 상기 제 4 중간판 사이로 유입된 기체가 상기 제 4 통로 및 상기 제 2 기체 배출공을 지나 상기 제 4 중간판 및 상기 일면 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체의 외부로 배출되며, 상기 제 1 기체 배출공을 지나온 기체도 상기 제 4 중간판 및 상기 일면 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체의 외부로 배출될 수 있다. In this case, a fourth connection hole formed through the fourth intermediate plate and a fourth passage protruding from the fourth connection hole toward the one side, and having an end portion supporting the one surface and having a fourth passage connected to the fourth connection hole therein. And a fourth gas diffusion hole, wherein a second gas outlet hole is formed at one side of the fourth diffusion pin, and the gas introduced between the third intermediate plate and the fourth intermediate plate is in the fourth passage and the second gas outlet hole. After passing through the fourth intermediate plate and the one surface and is discharged to the outside of the body through the injection hole, the gas passing through the first gas discharge hole is also diffused between the fourth intermediate plate and the one surface Then it may be discharged to the outside of the body through the injection hole.
이 때, 상기 일면은 상기 몸체 내부 공간의 저면이며, 상기 타면은 상기 몸체 내부 공간의 천장일 수 있다. In this case, the one surface may be a bottom surface of the interior space of the body, and the other surface may be a ceiling of the interior space of the body.
이 때, 상기 제 1 기체 배출공은 상기 제 3 확산핀의 단부에 형성되며, 상기 제 2 기체 배출공은 상기 제 4 확산핀의 단부에 형성될 수 있다. In this case, the first gas discharge hole may be formed at the end of the third diffusion pin, and the second gas discharge hole may be formed at the end of the fourth diffusion pin.
이 때, 상기 천장, 그리고 상기 제 3 중간판 및 상기 제 4 중간판의 상기 저면을 향하는 면, 그리고 상기 저면의 아래 면에 브레이징 처리할 필러 시트가 설치되고 이후 샤워헤드를 아래 위를 뒤집어서 브레이징할 수 있다. At this time, a filler sheet to be brazed is installed on the ceiling, the bottom facing the bottom surface of the third and fourth intermediate plates, and the bottom surface of the bottom surface, and then the showerhead is braided upside down. Can be.
본 발명의 또 다른 측면에 따르면, 전술한 샤워 헤드 2개가 상하 방향으로 배치된 제 3 및 제 4 샤워 헤드를 포함하는 샤워 헤드 조립체로서, 상기 제 3 샤워 헤드에는 상기 제 3 샤워 헤드의 몸체에 형성된 분사공에 하측 방향으로 연장된 분사 튜브가 설치되며, 상기 제 4 샤워 헤드에는 상기 분사 튜브가 상하 방향으로 관통하는 안내 관이 설치되는 샤워 헤드 조립체가 제공된다. According to still another aspect of the present invention, a shower head assembly including third and fourth shower heads having the above-described two shower heads disposed in a vertical direction, wherein the third shower head is formed in a body of the third shower head. An injection tube extending downward in the injection hole is installed, and the fourth shower head is provided with a shower head assembly in which a guide tube through which the injection tube passes in the vertical direction is installed.
본 발명의 일 실시예에 따른 샤워 헤드는, 샤워 헤드 내부에 설치되는 확산핀이 샤워 헤드 몸체 내부의 천정, 바닥 또는 중간판을 지지하도록 형성됨으로써 별도의 스페이서가 필요 없다. In the shower head according to the exemplary embodiment of the present invention, a diffusion pin installed in the shower head is formed to support a ceiling, a bottom, or an intermediate plate inside the shower head body, so that a separate spacer is not required.
본 발명의 일 실시예에 따른 샤워 헤드는, 확산핀 및 분사 튜브의 설치 위치에 생기는 틈새를 필러 시트를 이용하여 브레이징 처리함으로써 샤워 헤드 내부를 보다 견고하게 밀봉시킬 수 있다. The shower head according to an embodiment of the present invention may seal the inside of the shower head more firmly by brazing a gap generated at the installation position of the diffusion pin and the injection tube using the filler sheet.
도 1은 종래의 샤워헤드의 일 예를 설명하기 위한 단면도이다. 1 is a cross-sectional view for explaining an example of a conventional shower head.
도 2는 종래의 샤워헤드의 다른 예를 설명하기 위한 단면도이다. 2 is a cross-sectional view for explaining another example of the conventional shower head.
도 3은 종래의 샤워헤드의 또 다른 예를 설명하기 위한 단면도이다. 3 is a cross-sectional view for explaining another example of a conventional shower head.
도 4는 본 발명의 제 1 실시예에 따른 샤워 헤드의 단면도이다. 4 is a cross-sectional view of the shower head according to the first embodiment of the present invention.
도 5는 본 발명의 제 2 실시예에 따른 샤워 헤드의 단면도이다. 5 is a cross-sectional view of the shower head according to the second embodiment of the present invention.
도 6은 본 발명의 제 3 실시예에 따른 샤워 헤드 조립체의 단면도이다. 6 is a cross-sectional view of the shower head assembly according to the third embodiment of the present invention.
도 7은 본 발명의 제 4 실시예에 따른 샤워 헤드의 단면도이다. 7 is a sectional view of a shower head according to a fourth embodiment of the present invention.
도 8은 본 발명의 제 5 실시예에 따른 샤워 헤드 조립체의 단면도이다. 8 is a cross-sectional view of the shower head assembly according to the fifth embodiment of the present invention.
이하, 첨부한 도면을 참고로 하여 본 발명의 실시예에 대하여 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였다. Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention.
도 4는 본 발명의 제 1 실시예에 따른 샤워 헤드(200)의 단면도이다. 4 is a cross-sectional view of the shower head 200 according to the first embodiment of the present invention.
도 4를 참조하면, 본 발명의 제 1 실시예에 따른 샤워 헤드(200)는 몸체(210) 및 확산핀(220)을 포함한다. Referring to FIG. 4, the shower head 200 according to the first embodiment of the present invention includes a body 210 and a diffusion pin 220.
몸체(210)는 육면체 형상으로 이루어지며, 일측부에 내부로 기체가 주입되는 기체 주입구(217)가 형성되고, 저면(212)에는 내부로 주입된 기체가 배출되는 복수의 분사공(213)이 관통 형성된다. 이에 따라 몸체(210) 내부로 주입된 기체는 몸체(210) 내부에서 확산된 후 몸체(210)의 저면(212)에 형성된 복수의 분사공(213)을 통하여 외부로 배출될 수 있다. The body 210 has a hexahedron shape, and a gas injection hole 217 is formed in one side thereof, and a plurality of injection holes 213 are formed in the bottom 212 to discharge the gas injected therein. It is formed through. Accordingly, the gas injected into the body 210 may be diffused into the body 210 and then discharged to the outside through the plurality of injection holes 213 formed in the bottom surface 212 of the body 210.
본 발명의 일 실시예에 따르면 몸체(210)의 내부에는 복수의 확산핀(220)이 설치된다. 복수의 확산핀(220) 각각은 복수의 분사공(213)으로부터 도 4에서 볼 때 상측 방향으로 돌출되어 상단부가 천장(214)을 지지하도록 형성된다. According to an embodiment of the present invention, a plurality of diffusion pins 220 are installed inside the body 210. Each of the plurality of diffusion pins 220 protrudes upward from the plurality of injection holes 213 in the upper direction, and is formed to support the ceiling 214.
이 때, 확산핀(220)의 상단부에는 기체 유입공(223)이 형성되고, 확산핀(220)의 내부에는 기체 유입공(223)과 연결된 통로(225)가 형성된다. 통로(225)는 분사공(213)에 연결된다. In this case, a gas inlet hole 223 is formed at an upper end of the diffusion pin 220, and a passage 225 connected to the gas inlet hole 223 is formed in the diffusion pin 220. The passage 225 is connected to the injection hole 213.
이 때, 기체 유입공(223)은 확산핀(220)의 단부 일부를 절개하여 이루어질 수 있으며, 또는 단부 측부에 관통 구멍을 형성하여 이루어질 수 있다. At this time, the gas inlet hole 223 may be made by cutting a part of the end of the diffusion pin 220, or may be made by forming a through hole in the end side.
본 실시예에서는 기체 유입공(223)이 확산핀(220)의 단부에 형성된 구성을 예시하였으나, 기체 유입공(223)의 위치가 이에 제한되는 것은 아니며, 확산핀(220)의 중간에 형성될 수도 있을 것이다. In the present exemplary embodiment, the gas inlet hole 223 is formed at the end of the diffusion pin 220, but the position of the gas inlet hole 223 is not limited thereto, and may be formed in the middle of the diffusion pin 220. Could be
이에 따라 본 발명의 제 1 실시예에 따른 샤워 헤드(200)는 기체 주입구(217)를 통하여 몸체(210) 내부로 유입된 기체가 기체 유입공(223)을 통하여 확산핀(220) 내부의 통로(225)를 지나도록 형성된다. Accordingly, in the shower head 200 according to the first embodiment of the present invention, the gas introduced into the body 210 through the gas inlet 217 passes through the gas inlet 223 and passes through the diffusion pin 220. 225 is formed to pass.
통로(225)를 따라 이동된 기체는 분사공(213)을 통하여 몸체(210)의 외부로 배출되도록 형성된다. 이 때, 확산핀(220)은 몸체(210) 내부의 모든 분사공(213)에 각각 설치될 수 있으나, 일부의 분사공(213)에만 설치되는 것도 가능할 것이다. The gas moved along the passage 225 is formed to be discharged to the outside of the body 210 through the injection hole 213. At this time, the diffusion pin 220 may be installed in all the injection holes 213 inside the body 210, respectively, it may be possible to be installed only in some of the injection holes (213).
이 때, 본 발명의 일 실시예에 따른 샤워 헤드에 있어서, 확산핀의 수, 확신핀의 크기, 확산핀에 형성된 기체 유입공, 통로 및 분사공의 크기는 샤워 헤드 내로 유입되는 기체의 확산 속도 등을 고려하여 선택될 수 있다. At this time, in the shower head according to an embodiment of the present invention, the number of diffusion pins, the size of the confidence pin, the size of the gas inlet hole, the passage and the injection hole formed in the diffusion pin is the diffusion speed of the gas flowing into the shower head It may be selected in consideration of the like.
본 발명의 일 실시예에 따른 샤워 헤드는 확산핀 각각의 하단부가 저면에 지지된 상태에서 상단부가 천장을 지지하도록 형성되어 복수의 확산핀 각각이 샤워 헤드 몸체 내부를 지지하며 몸체 내부에 별도의 스페이서가 설치되지 않는다. 이에 따라 본 발명의 일 실시예에 따른 샤워 헤드는 스페이서가 몸체 내부에서 확산되는 기체를 방해하지 않는다. Shower head according to an embodiment of the present invention is formed so that the upper end supports the ceiling in the state in which the lower end of each of the diffusion pins are supported on the bottom surface, each of the plurality of diffusion pins support the inside of the shower head body and a separate spacer in the body Is not installed. Accordingly, the shower head according to an embodiment of the present invention does not interfere with the gas that the spacer diffuses inside the body.
한편, 본 발명의 일 실시예에 따르면, 샤워 헤드 몸체의 저면 상부에는 확산핀과 분사공 사이에 틈새가 존재할 수 있으므로, 이와 같은 틈새를 밀봉하기 위하여 분사공이 형성된 위치에 관통 구멍이 형성된 필러 시트(216)를 몸체의 저면 상에 위치시킨 상태에서 적당한 온도 및 압력 하에서 브레이징 처리하여 필러 시트를 몸체의 저면 상에 설치한다. On the other hand, according to an embodiment of the present invention, since there may be a gap between the diffusion pin and the injection hole in the upper portion of the bottom of the shower head body, the filler sheet formed with a through hole at the position where the injection hole is formed to seal such a gap ( 216 is placed on the bottom of the body and brazed under appropriate temperature and pressure to install the filler sheet on the bottom of the body.
도 5는 본 발명의 제 2 실시예에 따른 샤워 헤드의 단면도이다. 도 5를 참조하여 본 발명의 제 2 실시예에 따른 샤워 헤드를 설명함에 있어 제 1 실시예와 동일한 구성에 대하여는 상세한 설명을 생략하도록 하고, 제 1 실시예와 구별되는 구성을 중심으로 설명한다. 5 is a cross-sectional view of the shower head according to the second embodiment of the present invention. In describing the shower head according to the second exemplary embodiment of the present invention with reference to FIG. 5, detailed descriptions of the same components as those of the first exemplary embodiment will be omitted, and descriptions will be given based on the configuration that is different from the first exemplary embodiment.
본 발명의 제 2 실시예에 따른 샤워 헤드(300)는 몸체(310), 제 1 중간판(320), 제 2 중간판(340), 제 1 확산핀(330) 및 제 2 확산핀(350)을 포함할 수 있다. The shower head 300 according to the second embodiment of the present invention includes a body 310, a first intermediate plate 320, a second intermediate plate 340, a first diffusion pin 330, and a second diffusion pin 350. ) May be included.
본 발명의 제 2 실시예에 따른 샤워 헤드(300)는 제 1 실시예에서 설명한 바와 유사하게 직육면체 형상으로 이루어지며, 일측부에 내부로 기체가 주입되는 기체 주입구가 형성되고, 저면(312)에는 내부로 주입된 기체가 배출되는 복수의 분사공(313)이 관통 형성된 몸체(310) 내부에 제 1 중간판(320) 및 제 2 중간판(340)이 형성된다. The shower head 300 according to the second exemplary embodiment of the present invention has a rectangular parallelepiped shape similar to that described in the first exemplary embodiment, and a gas injection hole through which gas is injected into one side thereof is formed, and on the bottom 312. The first intermediate plate 320 and the second intermediate plate 340 are formed in the body 310 through which the plurality of injection holes 313 through which the gas injected into the inside is discharged is formed.
또한, 제 2 실시예에 따른 샤워 헤드(300)는 제 1 중간판(320)과 천장(314) 사이에 설치되는 제 1 확산핀(330)과, 제 1 중간판(320) 및 제 2 중간판(340) 사이에 설치되는 제 2 확산핀(350)을 포함하는 구조로 형성된다. In addition, the shower head 300 according to the second embodiment includes a first diffusion pin 330 installed between the first intermediate plate 320 and the ceiling 314, the first intermediate plate 320 and the second intermediate plate. It is formed in a structure including a second diffusion pin 350 installed between the plate 340.
보다 상세히, 도 5에서 볼 때 몸체(310)의 저면(312)과 천장(314) 사이에는 제 1 중간판(320) 및 제 2 중간판(340)이 서로 나란하게 배치된다. In more detail, as shown in FIG. 5, the first intermediate plate 320 and the second intermediate plate 340 are disposed side by side between the bottom 312 and the ceiling 314 of the body 310.
이 때, 제 1 중간판(320) 및 제 2 중간판(340) 사이로 제 1 기체가 유입될 수 있도록 제 1 기체 주입구(319)가 몸체의 측면 일측에 형성되고, 제 2 중간판(340)과 천장(314) 사이로 제 2 기체가 유입될 수 있도록 제 2 기체 주입구(317)가 몸체(310)의 측면 타측에 형성된다. At this time, the first gas inlet 319 is formed on one side of the side of the body so that the first gas flows between the first intermediate plate 320 and the second intermediate plate 340, the second intermediate plate 340 The second gas injection hole 317 is formed at the other side of the body 310 to allow the second gas to flow between the ceiling and the ceiling 314.
이 때, 제 1 기체 및 제 2 기체는 동일한 기체일 수도 있고, 서로 다른 종류의 기체일 수도 있다. In this case, the first gas and the second gas may be the same gas or may be different kinds of gases.
제 2 기체가 제 2 중간판(340)과 천장(314) 사이의 공간으로 유입된 상태에서, 제 1 중간판(320)의 하측으로 이동되어 확산된 후 몸체(310)의 분사공(313)을 통하여 배출될 수 있도록 제 1 중간판(320)과 천장(314) 사이에는 제 1 확산핀(330)이 설치된다. In the state where the second gas is introduced into the space between the second intermediate plate 340 and the ceiling 314, the injection hole 313 of the body 310 after being diffused and moved downward of the first intermediate plate 320. A first diffusion pin 330 is installed between the first intermediate plate 320 and the ceiling 314 to be discharged through.
제 1 확산핀(330)은 하측 단부가 제 1 중간판(320)에 형성된 복수의 제 1 연결 구멍(323)에 연결되며, 상측 방향으로 돌출 형성되어 상측 단부가 몸체(310)의 천장(314)을 지지하도록 형성된다. The first diffusion pin 330 is connected to the plurality of first connection holes 323 formed at the lower end of the first intermediate plate 320, and protrudes upward to form the ceiling 314 of the body 310. It is formed to support).
제 1 확산핀(330)의 상측 단부에는 제 1 기체 유입공(333)이 형성되며, 제 1 기체 유입공(333)과 연결된 제 1 확산핀(330)의 내부에는 제 1 통로(335)가 형성되어, 제 1 기체 유입공(333)을 통하여 유입된 제 2 기체가 제 1 통로(335)를 지나 제 1 연결 구멍(323)을 통하여 제 1 중간판(320)의 하측 공간으로 이동될 수 있다. A first gas inlet 333 is formed at an upper end of the first diffusion pin 330, and a first passage 335 is formed inside the first diffusion pin 330 connected to the first gas inlet 333. And a second gas introduced through the first gas inlet 333 may move to the lower space of the first intermediate plate 320 through the first connection hole 323 through the first passage 335. have.
이와 같이 제 1 중간판(320)의 하측 공간으로 이동된 제 2 기체는 몸체(310) 저면(312)과 제 1 중간판(320)의 하측 공간 내에서 확산되어 몸체(310) 저면(312)의 분사공(313)을 통하여 몸체(310) 외부로 배출될 수 있다. As described above, the second gas moved to the lower space of the first intermediate plate 320 is diffused in the lower space of the body 310 and the lower space of the first intermediate plate 320, and thus the lower surface 312 of the body 310. It may be discharged to the outside of the body 310 through the injection hole (313).
한편, 제 1 중간판(320)과 제 2 중간판(340) 사이로 유입된 제 1 기체를 제 1 중간판(320)의 하측으로 이동시키기 위하여 제 1 중간판(320)과 제 2 중간판(340) 사이에 제 2 확산핀(350)이 설치된다. Meanwhile, in order to move the first gas introduced between the first intermediate plate 320 and the second intermediate plate 340 to the lower side of the first intermediate plate 320, the first intermediate plate 320 and the second intermediate plate ( The second diffusion pin 350 is installed between the 340.
제 2 확산핀(350)은 하측 단부가 제 1 중간판(320)에 형성된 복수의 제 2 연결 구멍(325)에 연결되며, 상측 방향으로 돌출 형성되어, 상측 단부가 제 2 중간판(340)의 하측면을 지지하도록 형성된다. The second diffusion pin 350 has a lower end connected to the plurality of second connection holes 325 formed in the first intermediate plate 320, and protrudes upward, so that the upper end thereof has the second intermediate plate 340. It is formed to support the lower side of the.
이 때, 제 1 중간판(320)에 설치되는 제 1 확산핀(330)은 제 2 중간판(340)을 관통하도록 형성된다. At this time, the first diffusion pin 330 installed in the first intermediate plate 320 is formed to pass through the second intermediate plate 340.
제 2 확산핀(350)의 상측 단부에는 제 2 기체 유입공(353)이 형성되며, 제 2 기체 유입공(353)과 연결된 제 2 확산핀(350)의 내부에는 제 2 통로(355)가 형성되어, 제 2 기체 유입공(353)을 통하여 유입된 제 1 기체가 제 2 통로(355)를 지나 제 2 연결 구멍(325)을 통하여 제 1 중간판(320)의 하측 공간으로 이동될 수 있다. A second gas inlet 353 is formed at an upper end of the second diffusion pin 350, and a second passage 355 is formed inside the second diffusion pin 350 connected to the second gas inlet 353. The first gas introduced through the second gas inlet hole 353 may move to the lower space of the first intermediate plate 320 through the second connection hole 325 through the second passage 355. have.
이와 같이 제 1 중간판(320)의 하측 공간으로 이동된 제 1 기체는 몸체(310) 저면(312)과 제 1 중간판(320)의 하측 공간 내에서 확산되어 몸체(310) 저면(312)의 분사공(313)을 통하여 몸체(310) 외부로 배출될 수 있다. As described above, the first gas moved to the lower space of the first intermediate plate 320 is diffused in the lower space of the body 310 and the lower space of the first intermediate plate 320, and thus the lower surface 312 of the body 310. It may be discharged to the outside of the body 310 through the injection hole (313).
이에 따라, 제 1 중간판(320)과 몸체(310)의 저면(312) 사이 공간으로 공급된 제 1 기체 및 제 2 기체는 제 1 중간판(320)과 몸체(310)의 저면(312) 사이의 공간에서 균일하게 혼합된 후 분사공(313)을 통하여 몸체 외부로 배출될 수 있다. Accordingly, the first gas and the second gas supplied into the space between the first intermediate plate 320 and the bottom 312 of the body 310 may have the bottom 312 of the first intermediate plate 320 and the body 310. After being uniformly mixed in the space therebetween, it may be discharged out of the body through the injection hole (313).
본 발명의 제 2 실시예에 있어서, 몸체 내부에 형성되는 제 1 중간판 및 제 2 중간판 사이의 거리, 제 1 중간판 및 저면 사이의 거리, 제 2 중간판 및 천장 사이의 거리 등은 유입되는 기체의 종류 및 유입되는 기체의 유량 등에 따라 달라질 수 있다. In the second embodiment of the present invention, the distance between the first intermediate plate and the second intermediate plate formed inside the body, the distance between the first intermediate plate and the bottom surface, the distance between the second intermediate plate and the ceiling, etc. It may vary depending on the type of gas and the flow rate of the gas to be introduced.
본 발명의 제 2 실시예에 따른 샤워 헤드(300)는 몸체(310) 내부에 설치되는 제 1 중간판(320) 및 제 2 중간판(340)을 지지하기 위하여 제 1 확산핀(330) 및 제 2 확산핀(350)을 사용하되 제 1 확산핀(330) 및 제 2 확산핀(350)의 하측 일단이 제 1 중간판(320)에 결합되고, 제 1 확산핀(330) 및 제 2 확산핀(350)의 상단부가 각각 천장(314) 및 제 2 중간판(340)을 지지하도록 형성됨으로써 스페이서가 없이도 제 1 중간판(320) 및 제 2 중간판(340)이 몸체(310) 내부에서 견고하게 지지될 수 있다. 이에 따라 본 발명의 제 2 실시예에 따른 샤워 헤드는 스페이서에 의하여 기체의 확산이 방해를 받지 않는다. The shower head 300 according to the second exemplary embodiment of the present invention may include a first diffusion pin 330 and a first intermediate plate 320 and a second intermediate plate 340 installed inside the body 310. Using a second diffusion pin 350, but the lower ends of the first diffusion pin 330 and the second diffusion pin 350 is coupled to the first intermediate plate 320, the first diffusion pin 330 and the second The upper end of the diffusion pin 350 is formed to support the ceiling 314 and the second intermediate plate 340, respectively, so that the first intermediate plate 320 and the second intermediate plate 340 are inside the body 310 without a spacer. Can be firmly supported. Accordingly, the shower head according to the second embodiment of the present invention is not disturbed by the diffusion of gas by the spacer.
한편, 본 발명의 제 2 실시예에 따른 샤워 헤드(300)는 저면(312)의 상측면, 제 1 중간판(320) 및 제 2 중간판(340)의 상측면, 그리고 상기 천장(314)의 반대 편에 해당하는 면으로서 상기 몸체의 외부와 마주하는 면에 제 1 실시예에서 설명한 바와 유사하게 필러 시트(316)가 설치되어, 확산핀과 확산핀이 설치되는 중간판 사이 등의 틈새를 밀봉할 수 있다. On the other hand, the shower head 300 according to the second embodiment of the present invention, the upper side of the bottom 312, the upper side of the first intermediate plate 320 and the second intermediate plate 340, and the ceiling 314 The filler sheet 316 is installed on the surface facing the outside of the body as described in the first embodiment, so as to form a gap between the diffusion pin and the intermediate plate on which the diffusion pin is installed. It can be sealed.
도 6은 본 발명의 제 3 실시예에 따른 샤워 헤드 조립체(400)의 단면도이다. 6 is a cross-sectional view of the shower head assembly 400 according to the third embodiment of the present invention.
도 6을 참조하여, 본 발명의 제 3 실시예에 따른 샤워 헤드 조립체(400)를 설명함에 있어 전술한 실시예와 동일한 구성에 대하여는 상세한 설명을 생략하도록 하고, 전술한 실시예와 구별되는 구성을 중심으로 제 3 실시예에 대하여 설명한다. Referring to FIG. 6, in the description of the shower head assembly 400 according to the third embodiment of the present invention, detailed descriptions of the same components as those of the above-described embodiments will be omitted, and configurations different from those of the above-described embodiments will be omitted. The third embodiment will be described mainly.
본 발명의 제 3 실시예에 따른 샤워 헤드 조립체(400)는 제 2 실시예에 따른 샤워 헤드(300) 2개를 도 6에서 알 수 있는 바와 같이 상하 방향으로 배치한 구성이다. The shower head assembly 400 according to the third embodiment of the present invention has a configuration in which two shower heads 300 according to the second embodiment are arranged in the vertical direction as shown in FIG. 6.
이 때, 상측에 위치되는 샤워 헤드를 상부 샤워 헤드(401)로 규정하고, 하측에 위치되는 샤워 헤드를 하부 샤워 헤드(402)로 규정하여 설명한다. At this time, the shower head located on the upper side is defined as the upper shower head 401, and the shower head located on the lower side is defined and described as the lower shower head 402.
본 발명의 제 3 실시예에 따른 샤워 헤드 조립체(400)는 제 2 실시예에서 설명한 샤워 헤드(300)와 동일한 구조의 샤워 헤드를 이용하여 상부 샤워 헤드(401) 및 하부 샤워 헤드(402)를 구성할 수 있다. The shower head assembly 400 according to the third embodiment of the present invention uses the shower head having the same structure as the shower head 300 described in the second embodiment to connect the upper shower head 401 and the lower shower head 402. Can be configured.
이 때, 상부 샤워 헤드(401)의 분사공(313)으로 배출된 기체가 하부 샤워 헤드(402)를 관통하여 하부 샤워 헤드(402)의 하측으로 배출될 수 있도록 상부 샤워 헤드(401)의 분사공(313)에는 분사 튜브(360)가 하측 방향으로 연장되도록 설치된다. At this time, the gas of the upper shower head 401 may be discharged to the injection hole 313 of the upper shower head 401 through the lower shower head 402 to be discharged to the lower side of the lower shower head 402. The injection hole 360 is installed in the hole 313 so as to extend downward.
도 6에서는 도면의 간략화를 위하여 2개의 분사 튜브(360) 만을 도시하였으나, 상부 샤워 헤드(401)에는 그 보다 많은 수의 분사 튜브가 설치될 수 있다. In FIG. 6, only two spray tubes 360 are shown for the sake of simplicity, but a larger number of spray tubes may be installed in the upper shower head 401.
한편, 본 발명의 제 3 실시예에 따르면, 하부 샤워 헤드(402)에는 상부 샤워 헤드(401)에 연결된 분사 튜브(360)가 관통할 수 있는 복수의 안내관(370)이 상하 방향으로 몸체(310)를 관통하여 설치된다. Meanwhile, according to the third exemplary embodiment of the present invention, the lower shower head 402 has a plurality of guide tubes 370 through which the injection tube 360 connected to the upper shower head 401 penetrates in the vertical direction. Installed through 310.
이에 따라 상부 샤워 헤드(401)로부터 나온 기체와 하부 샤워 헤드(402)로부터 나온 기체가 하부 샤워 헤드(402)의 하측으로 분사될 수 있다. Accordingly, the gas from the upper shower head 401 and the gas from the lower shower head 402 may be injected below the lower shower head 402.
상부 샤워 헤드(401)로 유입된 후 분사되는 기체와 하부 샤워 헤드(402)로 유입된 후 분사되는 기체는 동일할 수 도 있으나, 서로 다른 기체일 수도 있으며, 이는 전자 소자 제조시 사용되는 기체의 종류 및 공정에 따라 다양하게 설정될 수 있다. The gas injected after entering the upper shower head 401 and the gas injected after entering the lower shower head 402 may be the same, or may be different from each other. It may be set in various ways depending on the type and process.
도 7은 본 발명의 제 4 실시예에 따른 샤워 헤드(500)의 단면도이다. 7 is a cross-sectional view of the shower head 500 according to the fourth embodiment of the present invention.
도 7을 참조하면, 본 발명의 제 4 실시예에 따른 샤워 헤드(500)는 몸체(510), 제 3 중간판(520), 제 4 중간판(540), 제 3 확산핀(530) 및 제 4 확산핀(550)을 포함할 수 있다. Referring to FIG. 7, the shower head 500 according to the fourth embodiment of the present invention may include a body 510, a third intermediate plate 520, a fourth intermediate plate 540, a third diffusion pin 530, and the like. It may include a fourth diffusion pin 550.
본 발명의 제 4 실시예에 따른 샤워 헤드(500)는 제 2 실시예에서 설명한 바와 유사하게 직육면체 형상으로 이루어지며, 일측에 내부로 기체가 주입되는 기체 주입구가 형성되고, 저면(512)에는 내부로 주입된 기체가 배출되는 복수의 분사공(513)이 관통 형성된다. The shower head 500 according to the fourth embodiment of the present invention has a rectangular parallelepiped shape similar to that described in the second embodiment, and a gas inlet for injecting gas into one side is formed, and the bottom surface 512 has an interior. A plurality of injection holes 513 through which the gas injected into the outlet are discharged are formed.
그리고, 몸체(510) 내부에는 제 3 중간판(520) 및 제 4 중간판(540)이 형성되고, 제 3 중간판(520)과 저면(512) 사이에 설치되는 제 3 확산핀(530)과, 제 4 중간판(540)과 저면(512) 사이에 설치되는 제 4 확산핀(550)을 포함하는 구조로 이루어진다. The third intermediate plate 520 and the fourth intermediate plate 540 are formed in the body 510, and the third diffusion pin 530 is installed between the third intermediate plate 520 and the bottom surface 512. And a fourth diffusion pin 550 disposed between the fourth intermediate plate 540 and the bottom surface 512.
보다 상세히, 도 7에서 볼 때 몸체(510)의 저면(512)과 천장(514) 사이에는 제 3 중간판(520) 및 제 4 중간판(540)이 서로 나란하게 배치된다. In more detail, as shown in FIG. 7, a third middle plate 520 and a fourth middle plate 540 are disposed side by side between the bottom 512 and the ceiling 514 of the body 510.
이 때, 제 3 중간판(520) 및 천장(514) 사이로 제 3 기체가 유입될 수 있도록 제 3 기체 주입구(517)가 몸체의 측면 일측에 형성되고, 제 3 중간판(520)과 제 4 중간판(540) 사이에 제 4 기체가 유입될 수 있도록 제 4 기체 주입구(519)가 몸체(510)의 측면 타측에 형성된다. In this case, a third gas inlet 517 is formed at one side of the side of the body to allow the third gas to flow between the third middle plate 520 and the ceiling 514, and the third middle plate 520 and the fourth side. A fourth gas inlet 519 is formed at the other side of the body 510 to allow the fourth gas to flow between the intermediate plates 540.
이 때, 제 3 기체 및 제 4 기체는 동일한 기체일 수도 있고 서로 다른 종류의 기체일 수도 있다. In this case, the third gas and the fourth gas may be the same gas or different kinds of gases.
제 3 기체가 제 3 중간판(520)과 천장(514) 사이의 공간으로 유입된 상태에서, 제 4 중간판(540)의 하측으로 이동되어 확산된 후 몸체(510)의 분사공(513)을 통하여 배출될 수 있도록 제 3 중간판(520)과 몸체(510)의 저면(512) 사이에는 제 3 확산핀(530)이 설치된다. In the state where the third gas is introduced into the space between the third intermediate plate 520 and the ceiling 514, the injection hole 513 of the body 510 is moved after being diffused downward of the fourth intermediate plate 540. A third diffusion pin 530 is installed between the third intermediate plate 520 and the bottom 512 of the body 510 so as to be discharged through the third intermediate plate 520.
제 3 확산핀(530)은 상측 단부가 제 3 중간판(520)에 형성된 복수의 제 3 연결 구멍(523)에 연결되며, 하측 방향으로 돌출 형성되어, 하측 단부가 몸체(510)의 저면(512)을 지지하도록 형성된다. The third diffusion pin 530 is connected to a plurality of third connection holes 523 having an upper end formed in the third intermediate plate 520, and protrudes downward, so that the lower end has a bottom surface of the body 510 ( 512 is formed to support.
이에 따라 제 3 확산핀(530)은 하측 단부가 몸체(510)의 저면(512)에 설치된 상태에서 상측 단부가 제 3 중간판(520)을 지지하도록 구성된다. Accordingly, the third diffusion pin 530 is configured such that the upper end supports the third intermediate plate 520 while the lower end is installed on the bottom 512 of the body 510.
이 때, 제 3 확산핀(530)의 하측 단부에는 제 1 기체 배출공(533)이 형성되며, 제 3 연결 구멍(523)과 연결된 제 3 확산핀(530)의 내부에는 제 3 통로(535)가 형성된다. 이에 따라, 제 3 연결 구멍(523)을 통하여 유입된 제 3 기체는 제 3 통로(535)를 지나 제 1 기체 배출공(533)을 통하여 제 4 중간판(540)의 하측과 몸체(510)의 저면(512) 사이의 공간으로 이동될 수 있다. In this case, a first gas discharge hole 533 is formed at a lower end of the third diffusion pin 530, and a third passage 535 is formed inside the third diffusion pin 530 connected to the third connection hole 523. ) Is formed. Accordingly, the third gas introduced through the third connection hole 523 passes through the third passage 535 and passes through the first gas discharge hole 533 to the lower side of the fourth intermediate plate 540 and the body 510. It may be moved to a space between the bottom surface 512 of the.
이와 같이 제 4 중간판(540) 및 저면(512) 사이의 공간으로 배출된 기체는 그 공간에서 확산되어 몸체(510) 저면(512)의 분사공(513)을 통하여 몸체(510) 외부로 배출될 수 있다. As such, the gas discharged into the space between the fourth intermediate plate 540 and the bottom surface 512 is diffused in the space and discharged to the outside of the body 510 through the injection hole 513 of the bottom surface 512 of the body 510. Can be.
한편, 제 3 중간판(520)과 제 4 중간판(540) 사이로 유입된 제 4 기체를 제 4 중간판(540)의 하측으로 이동시키기 위하여 제 4 중간판(540) 및 저면(512) 사이에는 제 4 확산핀(550)이 설치된다. Meanwhile, between the fourth intermediate plate 540 and the bottom surface 512 to move the fourth gas introduced between the third intermediate plate 520 and the fourth intermediate plate 540 to the lower side of the fourth intermediate plate 540. The fourth diffusion pin 550 is installed.
제 4 확산핀(550)은 상측 단부가 제 4 중간판(540)에 형성된 복수의 제 4 연결 구멍(543)에 연결되며 하측 방향으로 돌출 형성되어, 하측 단부가 몸체(510)의 저면(512)에 연결되도록 형성된다. The fourth diffusion pin 550 is connected to the plurality of fourth connection holes 543 formed at the upper end of the fourth intermediate plate 540 and protrudes downward, and thus the lower end of the fourth diffusion pin 550 is formed on the bottom surface 512 of the body 510. It is formed to be connected to).
이에 따라 제 4 확산핀(550)은 하측 단부가 몸체(510)의 저면(512)에 설치된 상태에서 상측 단부가 제 4 중간판(540)을 지지하도록 구성된다. 이 때, 제 3 확산핀(530)은 제 4 중간판(540)을 관통하도록 형성된다. Accordingly, the fourth diffusion pin 550 is configured such that the upper end supports the fourth intermediate plate 540 while the lower end is installed on the bottom 512 of the body 510. At this time, the third diffusion pin 530 is formed to pass through the fourth intermediate plate 540.
한편, 제 4 확산핀(550)의 하측 단부에는 제 2 기체 배출공(553)이 형성되며, 제 4 연결 구멍(543)과 연결된 제 4 확산핀(550)의 내부에는 제 4 통로(555)가 형성된다. 이에 따라, 제 4 연결 구멍(543)을 통하여 유입된 제 4 기체는 제 4 통로(555)를 지나 제 2 기체 배출공(553)을 통하여 제 4 중간판(540)의 하측과 몸체(510)의 저면(512) 사이의 공간으로 이동될 수 있다. Meanwhile, a second gas discharge hole 553 is formed at a lower end of the fourth diffusion pin 550, and a fourth passage 555 is formed inside the fourth diffusion pin 550 connected to the fourth connection hole 543. Is formed. Accordingly, the fourth gas introduced through the fourth connection hole 543 passes through the fourth passage 555 and passes through the second gas discharge hole 553 to the lower side of the fourth intermediate plate 540 and the body 510. It may be moved to a space between the bottom surface 512 of the.
이와 같이 제 4 중간판(540) 및 저면(512) 사이의 공간으로 배출된 기체는 그 공간에서 확산되어 몸체(510) 저면(512)의 분사공(513)을 통하여 몸체 외부로 배출될 수 있다. As such, the gas discharged into the space between the fourth intermediate plate 540 and the bottom surface 512 may be diffused in the space and discharged to the outside of the body through the injection hole 513 of the bottom surface 512 of the body 510. .
이에 따라, 제 4 중간판(540)과 몸체(510)의 저면(512) 사이 공간으로 공급된 제 3 기체 및 제 4 기체는 제 4 중간판(540)과 몸체(510)의 저면 사이의 공간에서 균일하게 혼합된 후 분사공(513)을 통하여 몸체 외부로 배출될 수 있다. Accordingly, the third gas and the fourth gas supplied into the space between the fourth intermediate plate 540 and the bottom surface 512 of the body 510 are spaces between the fourth intermediate plate 540 and the bottom surface of the body 510. After uniformly mixed in can be discharged to the outside through the injection hole 513.
본 발명의 제 4 실시예에 따른 샤워 헤드(500)는 몸체(510) 내부에 설치되는 제 3 중간판(520) 및 제 4 중간판(540)을 지지하기 위하여 제 3 확산핀(530) 및 제 4 확산핀(550)을 사용하되 제 3 확산핀(530) 및 제 4 확산핀(550)의 상단부가 각각 제 3 중간판(520) 및 제 4 중간판(540)을 지지하도록 형성됨으로써 스페이서가 없이도 제 3 중간판(520) 및 제 4 중간판(540)이 몸체(510) 내부에서 견고하게 지지될 수 있다. 이에 따라 본 발명의 제 4 실시예에 따른 샤워 헤드는 스페이서에 의하여 기체의 확산이 방해를 받지 않는다. The shower head 500 according to the fourth embodiment of the present invention may include a third diffusion pin 530 and a third intermediate plate 520 and a fourth intermediate plate 540 installed in the body 510. The fourth diffusion pin 550 is used, but upper ends of the third diffusion pin 530 and the fourth diffusion pin 550 are formed to support the third intermediate plate 520 and the fourth intermediate plate 540, respectively. The third intermediate plate 520 and the fourth intermediate plate 540 may be firmly supported within the body 510 without using the present invention. Accordingly, the shower head according to the fourth embodiment of the present invention is not disturbed by gas diffusion by the spacer.
한편, 본 발명의 제 4 실시예에 따른 샤워 헤드는 천장, 제 1 중간판 및 제 2 중간판의 저면을 향하는 하측면, 그리고 상기 저면의 반대 편에 해당하는 면으로서 상기 몸체의 외부와 마주하는 면에 제 1 실시예에서 설명한 바와 유사하게 필러 시트(516)가 설치되어, 확산핀과 확산핀이 설치되는 중간판 사이 등의 틈새를 밀봉할 수 있다. On the other hand, the shower head according to the fourth embodiment of the present invention faces the outside of the body as a lower surface facing the bottom of the ceiling, the first intermediate plate and the second intermediate plate, and the side opposite to the bottom surface The filler sheet 516 may be provided on the surface to seal the gap between the diffusion pin and the intermediate plate on which the diffusion pin is installed.
이 때, 천장면, 저면의 하측면, 제 1 중간판 및 제 2 중간판의 하측면에 필러 시트를 설치하고자 하는 경우 제 4 실시예에 따른 샤워 헤드를 뒤집은 상태에서 필러 시트를 설치할 수 있다. At this time, when the filler sheet is to be installed on the ceiling surface, the lower side of the bottom surface, and the lower side surfaces of the first intermediate plate and the second intermediate plate, the filler sheet may be installed while the shower head according to the fourth embodiment is turned over.
도 8은 본 발명의 제 5 실시예에 따른 샤워 헤드 조립체(600)의 단면도이다. 8 is a cross-sectional view of the shower head assembly 600 according to the fifth embodiment of the present invention.
도 8을 참조하여, 본 발명의 제 5 실시예에 따른 샤워 헤드 조립체(600)를 설명함에 있어 전술한 실시예와 동일한 구성에 대하여는 상세한 설명을 생략하도록 하고, 전술한 실시예와 구별되는 구성을 중심으로 제 5 실시예에 대하여 설명한다. Referring to FIG. 8, in describing the shower head assembly 600 according to the fifth embodiment of the present invention, detailed descriptions of the same components as those of the above-described embodiments will be omitted, and configurations different from those of the above-described embodiments will be omitted. The fifth embodiment will be mainly described.
본 발명의 제 5 실시예에 따른 샤워 헤드 조립체(600)는 제 4 실시예에 따른 샤워 헤드(500) 2개를 도 8에서 알 수 있는 바와 같이 상하 방향으로 배치한 구성이다. The shower head assembly 600 according to the fifth embodiment of the present invention is configured to arrange two shower heads 500 according to the fourth embodiment in the vertical direction as shown in FIG. 8.
이 때, 상측에 위치되는 샤워 헤드를 상부 샤워 헤드(601)로 규정하고, 하측에 위치되는 샤워 헤드를 하부 샤워 헤드(602)로 규정하여 설명한다. At this time, an upper shower head is defined as the upper shower head 601 and a lower shower head is defined as the lower shower head 602.
본 발명의 제 5 실시예에 따른 샤워 헤드 조립체(600)는 제 4 실시예에서 설명한 샤워 헤드(500)와 동일한 구조의 샤워 헤드를 이용하여 상부 샤워 헤드(601) 및 하부 샤워 헤드(602)를 구성할 수 있다. The shower head assembly 600 according to the fifth embodiment of the present invention uses the shower head having the same structure as the shower head 500 described in the fourth embodiment to connect the upper shower head 601 and the lower shower head 602. Can be configured.
이 때, 제 5 실시예에서는 제 4 실시예에 따른 샤워 헤드(500) 2개를 상하 방향으로 배치하였으나, 제 1 및 제 2 실시예에서 설명한 샤워 헤드를 이와 같이 설치하는 것도 가능할 것이다.At this time, in the fifth embodiment, two shower heads 500 according to the fourth embodiment are arranged in the vertical direction, but the shower heads described in the first and second embodiments may be provided in this way.
이 때, 상부 샤워 헤드(601)의 분사공(513)으로 배출된 기체가 하부 샤워 헤드(602)를 관통하여 하부 샤워 헤드(602)의 하측으로 배출될 수 있도록 상부 샤워 헤드(601)의 분사공(513)에는 분사 튜브(570)가 하측 방향으로 연장되도록 설치된다. At this time, the gas of the upper shower head 601 may be discharged to the lower portion of the lower shower head 602 through the lower shower head 602 through the gas discharged to the injection hole 513 of the upper shower head 601. The injection hole 513 is installed in the hole 513 to extend downward.
도 8에서는 도면의 간략화를 위하여 2개의 분사 튜브(570) 만을 도시하였으나, 상부 샤워 헤드(601)에는 그 보다 많은 수의 분사 튜브가 설치될 수 있다. In FIG. 8, only two spray tubes 570 are shown for the sake of simplicity, but a larger number of spray tubes may be installed in the upper shower head 601.
한편, 본 발명의 제 5 실시예에 따르면, 하부 샤워 헤드(602)에는 상부 샤워 헤드(601)에 연결된 분사 튜브(570)가 관통할 수 있는 복수의 안내관(580)이 상하 방향으로 몸체(510)를 관통하여 설치된다. Meanwhile, according to the fifth embodiment of the present invention, the lower shower head 602 has a plurality of guide tubes 580 through which the injection tube 570 connected to the upper shower head 601 may pass through the body (up and down). 510 is installed through.
이에 따라 상부 샤워 헤드(601)로부터 나온 기체와 하부 샤워 헤드(602)로부터 나온 기체가 하부 샤워 헤드(602)의 하측으로 분사될 수 있다. 상부 샤워 헤드(601)로 유입된 후 분사되는 기체와 하부 샤워 헤드(602)로 유입된 후 분사되는 기체는 동일할 수 도 있고 서로 다른 기체일 수도 있는데, 이는 전자 소자 제조시 사용되는 기체의 종류 및 공정에 따라 다양하게 설정될 수 있다. Accordingly, the gas from the upper shower head 601 and the gas from the lower shower head 602 may be injected to the lower side of the lower shower head 602. The gas injected after entering the upper shower head 601 and the gas injected after entering the lower shower head 602 may be the same or different gases, which is a kind of gas used in manufacturing an electronic device. And can be set variously according to the process.
이상에서 설명한 바와 같은 본 발명의 여러 실시예에 따른 샤워 헤드는 샤워 헤드를 구성하는 몸체의 내부에 설치되는 확산핀을 이용하여 몸체 내부를 지지하거나, 중간판을 지지하도록 구성함으로써 몸체 내부를 지지하는 스페이서의 구성을 생략하여 기체의 확산이 보다 용이하게 이루어질 수 있다. The shower head according to various embodiments of the present invention as described above supports the inside of the body by supporting the inside of the body by using a diffusion pin installed in the inside of the body constituting the shower head, or by supporting the intermediate plate. The diffusion of the gas can be made easier by omitting the configuration of the spacer.

Claims (15)

  1. 복수의 분사공이 관통 형성된 일면 및 상기 일면에 대향하는 타면을 구비한 몸체;A body having one surface through which a plurality of injection holes are formed and the other surface facing the one surface;
    상기 일면의 상기 복수의 분사공으로부터 상기 타면 측으로 돌출되어 단부가 상기 타면을 지지하며, 일측에 기체 유입공이 형성되고 내부에 상기 기체 유입공과 연결된 통로를 구비한 복수의 확산핀을 포함하며, A plurality of diffusion pins protruding from the plurality of injection holes of the one surface to the other surface side to support the other surface, and having a gas inlet hole formed at one side thereof and having a passage connected to the gas inlet hole therein;
    상기 타면과 상기 일면 사이로 유입된 기체가 상기 기체 유입공 및 상기 통로를 지나 바로 상기 복수의 분사공을 통하여 상기 몸체의 외부로 배출되는 샤워 헤드. And a gas introduced between the other surface and the one surface is discharged to the outside of the body through the plurality of injection holes through the gas inlet and the passage.
  2. 복수의 분사공이 관통 형성된 일면 및 상기 일면에 대향하는 타면을 구비한 몸체;A body having one surface through which a plurality of injection holes are formed and the other surface facing the one surface;
    상기 일면과 상기 타면 사이에 배치되며 제 1 연결 구멍이 관통 형성된 제 1 중간판 및A first intermediate plate disposed between the one surface and the other surface and having a first connection hole formed therethrough;
    상기 제 1 중간판의 상기 제 1 연결 구멍으로부터 상기 타면 측으로 돌출되되 단부가 상기 타면을 지지하도록 형성되며, 내부에 상기 제 1 연결 구멍과 연결된 제 1 통로를 구비한 제 1 확산핀을 포함하며, A first diffusion pin protruding from the first connection hole of the first intermediate plate toward the other surface and having an end portion supporting the other surface, the first diffusion pin having a first passage connected to the first connection hole therein;
    상기 제 1 확산핀의 일측에 제 1 기체 유입공이 형성되어 상기 타면과 상기 제 1 중간판 사이로 유입된 기체가 상기 제 1 기체 유입공 및 상기 제 1 통로를 지나 상기 일면과 상기 제 1 중간판 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체 외부로 배출되는 샤워 헤드. A first gas inlet hole is formed at one side of the first diffusion pin such that gas introduced between the other surface and the first intermediate plate passes through the first gas inlet hole and the first passageway between the one surface and the first intermediate plate. The shower head is diffused in and discharged out of the body through the injection hole.
  3. 제 2 항에 있어서, The method of claim 2,
    상기 제 1 중간판 및 상기 타면 사이에 배치되는 제 2 중간판을 더 포함하며, Further comprising a second intermediate plate disposed between the first intermediate plate and the other surface,
    상기 제 1 확산핀은 상기 제 2 중간판을 관통하도록 형성되는 샤워 헤드. The first diffusion pin is formed to penetrate the second intermediate plate.
  4. 제 3 항에 있어서,The method of claim 3, wherein
    상기 제 1 중간판에 관통 형성되는 제 2 연결 구멍 및 A second connecting hole formed through the first intermediate plate and
    상기 제 2 연결 구멍으로부터 상기 제 2 중간판 측으로 돌출 형성되되 단부가 상기 제 2 중간판을 지지하며 내부에 상기 제 2 연결 구멍과 연결된 제 2 통로를 구비한 제 2 확산핀을 더 포함하며, A second diffusion pin protruding from the second connection hole toward the second intermediate plate and having a second passage connected to the second intermediate plate at an end thereof and supporting the second intermediate plate;
    상기 제 2 확산핀의 일측에 제 2 기체 유입공이 형성되어, 상기 제 1 중간판과 상기 제 2 중간판 사이로 유입된 기체가 상기 제 2 기체 유입공 및 상기 제 2 통로를 지나 상기 일면과 상기 제 1 중간판 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체 외부로 배출되는 샤워 헤드. A second gas inlet hole is formed at one side of the second diffusion pin, and the gas introduced between the first intermediate plate and the second intermediate plate passes through the second gas inlet hole and the second passage, and the one surface and the second passage. 1 Shower head is discharged to the outside of the body through the injection hole after being diffused between the intermediate plate.
  5. 제 4항에 있어서, The method of claim 4, wherein
    상기 일면은 상기 몸체 내부 공간의 저면이며, The one surface is the bottom surface of the inner space of the body,
    상기 타면은 상기 몸체 내부 공간의 천장인 샤워 헤드. The other side is a shower head ceiling of the body interior space.
  6. 제 4 항에 있어서, The method of claim 4, wherein
    상기 제 1 기체 유입공은 상기 제 1 확산핀의 단부에 형성되며, The first gas inlet is formed at the end of the first diffusion pin,
    상기 제 2 기체 유입공은 상기 제 2 확산핀의 단부에 형성되는, 샤워 헤드. The second gas inlet hole is formed in the end of the second diffusion pin, the shower head.
  7. 제 5 항에 있어서, The method of claim 5,
    상기 저면, 상기 제 1 중간판 및 상기 제 2 중간판의 상기 천장을 향하는 면 및 상기 천정의 윗면 에 브레이징 처리할 필러 시트가 설치되는, 샤워 헤드. And a filler sheet to be brazed on the bottom surface, a surface facing the ceiling of the first and second intermediate plates, and an upper surface of the ceiling.
  8. 제 1 항 내지 제 7 항 중 어느 한 항에 따른 샤워 헤드 2개가 상하 방향으로 배치된 제 1 및 제 2 샤워 헤드를 포함하는 샤워 헤드 조립체로서, A shower head assembly comprising first and second shower heads in which two shower heads according to any one of claims 1 to 7 are disposed in a vertical direction.
    상기 제 1 샤워 헤드에는 상기 제 1 샤워 헤드의 몸체에 형성된 분사공에 하측 방향으로 연장된 분사 튜브가 설치되며, The first shower head is provided with a spray tube extending in the downward direction in the injection hole formed in the body of the first shower head,
    상기 제 2 샤워 헤드에는 상기 분사 튜브가 상하 방향으로 관통하는 안내 관이 설치되는 샤워 헤드 조립체. Shower head assembly is provided in the second shower head is a guide tube through which the injection tube penetrates in the vertical direction.
  9. 복수의 분사공이 관통 형성되는 일면 및 상기 일면에 대향하는 타면을 구비한 몸체;A body having one surface through which a plurality of injection holes are formed and the other surface facing the one surface;
    상기 일면과 상기 타면 사이에 배치되며 제 3 연결 구멍이 관통 형성되는 제 3 중간판;A third intermediate plate disposed between the one surface and the other surface and having a third connection hole formed therethrough;
    상기 제 3 중간판의 상기 제 3 연결 구멍으로부터 상기 일면 측으로 돌출되어 단부가 상기 일면을 지지하도록 형성되며, 내부에 상기 제 3 연결 구멍과 연결된 제 3 통로를 구비한 제 3 확산핀을 포함하며, A third diffusion pin protruding from the third connection hole of the third intermediate plate toward the one surface side to support the one surface, and having a third diffusion pin having a third passage connected to the third connection hole therein;
    상기 제 3 확산핀의 일측에 제 1 기체 배출공이 형성되어 상기 타면과 상기 제 3 중간판 사이로 유입된 기체가 상기 제 3 통로 및 상기 제 1 기체 배출공을 지나 상기 분사공을 통하여 상기 몸체의 외부로 배출되는 샤워 헤드. A first gas discharge hole is formed at one side of the third diffusion pin so that gas introduced between the other surface and the third intermediate plate passes through the third passage and the first gas discharge hole to the outside of the body through the injection hole. Shower head discharged to.
  10. 제 9 항에 있어서, The method of claim 9,
    상기 제 3 중간판 및 상기 일면 사이에 배치되는 제 4 중간판을 더 포함하며, Further comprising a fourth intermediate plate disposed between the third intermediate plate and the one surface,
    상기 제 3 확산핀은 상기 제 4 중간판을 관통하도록 형성되는 샤워 헤드. The third diffusion pin is a shower head formed to penetrate the fourth intermediate plate.
  11. 제 10 항에 있어서, The method of claim 10,
    상기 제 4 중간판에 관통 형성된 제 4 연결 구멍 및A fourth connecting hole formed through the fourth intermediate plate and
    상기 제 4 연결 구멍으로부터 상기 일면 측으로 돌출되어 단부가 상기 일면을 지지하며 내부에 상기 제 4 연결 구멍과 연결된 제 4 통로를 구비한 제 4 확산핀을 포함하며, A fourth diffusion pin protruding from the fourth connection hole toward the one surface side and having an end portion supporting the one surface and having a fourth passage connected to the fourth connection hole therein;
    상기 제 4 확산핀의 일측에 제 2 기체 배출공이 형성되어, 상기 제 3 중간판 및 상기 제 4 중간판 사이로 유입된 기체가 상기 제 4 통로 및 상기 제 4 기체 배출공을 지나 상기 제 4 중간판 및 상기 일면 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체의 외부로 배출되며, 상기 제 1 기체 배출공을 지나온 기체도 상기 제 4 중간판 및 상기 일면 사이에서 확산된 후 상기 분사공을 통하여 상기 몸체의 외부로 배출되는 샤워 헤드. A second gas discharge hole is formed at one side of the fourth diffusion pin, and the gas introduced between the third intermediate plate and the fourth intermediate plate passes through the fourth passage and the fourth gas discharge hole, and the fourth intermediate plate. And after being diffused between the one surface and discharged to the outside of the body through the injection hole, the gas passing through the first gas discharge hole is also diffused between the fourth intermediate plate and the one surface and then through the injection hole. Shower head discharged to the outside of the body.
  12. 제 11 항에 있어서, The method of claim 11,
    상기 일면은 상기 몸체 내부 공간의 저면이며, The one surface is the bottom surface of the inner space of the body,
    상기 타면은 상기 몸체 내부 공간의 천장인 샤워 헤드. The other side is a shower head ceiling of the body interior space.
  13. 제 11 항에 있어서, The method of claim 11,
    상기 제 1 기체 배출공은 상기 제 3 확산핀의 단부에 형성되며, The first gas discharge hole is formed at the end of the third diffusion pin,
    상기 제 2 기체 배출공은 상기 제 4 확산핀의 단부에 형성되는, 샤워 헤드. The second gas outlet hole is formed in the end of the fourth diffusion pin, the shower head.
  14. 제 12 항에 있어서, The method of claim 12,
    상기 천장, 그리고 상기 제 3 중간판 및 상기 제 4 중간판의 상기 저면을 향하는 면, 그리고 상기 저면의 아래면에 브레이징 처리할 필러 시트가 설치되는, 샤워 헤드. And a filler sheet to be brazed on the ceiling and the bottom facing the bottom of the third and fourth intermediate plates and the bottom of the bottom.
  15. 제 9 항 내지 제 14 항 중 어느 한 항에 따른 샤워 헤드 2개가 상하 방향으로 배치된 제 3 및 제 4 샤워 헤드를 포함하는 샤워 헤드 조립체로서, A shower head assembly comprising third and fourth shower heads in which two shower heads according to any one of claims 9 to 14 are disposed in a vertical direction.
    상기 제 3 샤워 헤드에는 상기 제 3 샤워 헤드의 몸체에 형성된 분사공에 하측 방향으로 연장된 분사 튜브가 설치되며, The third shower head is provided with a spray tube extending downward in the spray hole formed in the body of the third shower head,
    상기 제 4 샤워 헤드에는 상기 분사 튜브가 상하 방향으로 관통하는 안내 관이 설치되는 샤워 헤드 조립체. The fourth shower head shower head assembly is provided with a guide tube through which the injection tube penetrates in the vertical direction.
PCT/KR2014/005644 2013-06-26 2014-06-25 Shower head for electronic device having dispersion pins fabrication, and shower head assembly WO2014209017A1 (en)

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KR1020140077279A KR101542599B1 (en) 2013-06-26 2014-06-24 Showerhead and showerhead structure for manufacturing an electronic device having a diffusion fin

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010099168A (en) * 2001-09-07 2001-11-09 이경하 Vertical chemical vapor deposition of heating suscpetor and shower head jet
KR20070036985A (en) * 2005-09-30 2007-04-04 주식회사 에이디피엔지니어링 Apparatus for processing substrate with plasma
KR20070112354A (en) * 2007-09-21 2007-11-23 주식회사 피에조닉스 Semiconductor device fabrication equipment with showerhead
KR20090011978A (en) * 2007-07-27 2009-02-02 주식회사 아이피에스 Showerhead and semiconductor processing apparatus having same
KR101064210B1 (en) * 2009-06-01 2011-09-14 한국생산기술연구원 A showerhead for film depositing vacuum equipments

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010099168A (en) * 2001-09-07 2001-11-09 이경하 Vertical chemical vapor deposition of heating suscpetor and shower head jet
KR20070036985A (en) * 2005-09-30 2007-04-04 주식회사 에이디피엔지니어링 Apparatus for processing substrate with plasma
KR20090011978A (en) * 2007-07-27 2009-02-02 주식회사 아이피에스 Showerhead and semiconductor processing apparatus having same
KR20070112354A (en) * 2007-09-21 2007-11-23 주식회사 피에조닉스 Semiconductor device fabrication equipment with showerhead
KR101064210B1 (en) * 2009-06-01 2011-09-14 한국생산기술연구원 A showerhead for film depositing vacuum equipments

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